CN108020994B - Lighting device - Google Patents

Lighting device Download PDF

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Publication number
CN108020994B
CN108020994B CN201610932743.1A CN201610932743A CN108020994B CN 108020994 B CN108020994 B CN 108020994B CN 201610932743 A CN201610932743 A CN 201610932743A CN 108020994 B CN108020994 B CN 108020994B
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Prior art keywords
led light
light source
illumination
led
light beam
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CN201610932743.1A
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CN108020994A (en
Inventor
田毅强
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention discloses a lighting device, comprising: the LED light energy generating unit, the light beam integrating and homogenizing unit and the light beam relay and transmission unit are arranged along the light propagation direction; the LED light energy generation unit comprises a plurality of groups of LED light source assemblies and a convergence mirror group, the LED light source assemblies are distributed along an optical axis in a rotational symmetry manner, each group of LED light source assemblies can move along the optical axis in a radial direction, and an object plane of the convergence mirror group is located at a light outlet end of each LED light source assembly. The LED lamp can be coupled with light sources with various wavelengths by arranging a plurality of groups of LED light source components to directly form an off-axis illumination mode; compared with the traditional multi-wavelength mercury lamp scheme, the invention has the advantages of more compact structure, high energy utilization rate and lower energy consumption; the LED light source component can move along the radial direction of the optical axis, and the adjustment of the coherence factor of illumination is realized.

Description

Lighting device
Technical Field
The invention relates to the technical field of photoetching, in particular to an illuminating device.
Background
Microlithography in semiconductor fabrication uses an optical system to precisely project and expose a pattern on a reticle onto a photoresist-coated silicon wafer.
In order to further enhance the resolution capability of the exposure system, increase the focal depth and enlarge the process window, off-axis illumination (OAI) technology has been widely adopted in scanning exposure systems. Conventional off-axis illumination includes annular illumination, dipole illumination, quadrupole illumination, etc., and different off-axis illumination pupil distributions are selected primarily according to the particular mask pattern.
With the development of the LED light source technology, the power of the LED light source is closer to the requirement of high power and high intensity in the modern semiconductor industry, and the LED light source has a great application prospect. The LED light source generally includes a substrate, an LED wick on the substrate, and a packaging resin outside the LED wick. The LED light source has the characteristics of small volume, long service life and easy control of emergent light power. Under different use scenes, the LED light source meets the requirements by using different energy collecting and light homogenizing devices.
For the lithography system, due to the monochromaticity of the LED light source, light with different wavelengths meeting the exposure conditions of the lithography process needs to be coupled into the optical system, but the coupling mode adopted in the prior art is not only complex in structure but also causes energy loss to the light source, which affects the lithography effect.
Disclosure of Invention
The invention provides an illuminating device, which aims to solve the problems of difficult off-axis illumination coupling and large energy loss of a light source in the prior art.
To solve the above technical problem, the present invention provides an illumination device, including: the LED light energy generating unit, the light beam integrating and homogenizing unit and the light beam relay and transmission unit are arranged along the light propagation direction; the LED light energy generation unit comprises a plurality of groups of LED light source assemblies and a convergence mirror group, the LED light source assemblies are distributed along an optical axis in a rotational symmetry manner, each group of LED light source assemblies can move along the optical axis in a radial direction, and an object plane of the convergence mirror group is located at a light outlet end of each LED light source assembly.
Preferably, the LED light source assembly includes an LED light source and a light beam collimating device, and a light beam emitted from the LED light source is collimated by the light beam collimating device and then projected to the converging mirror group.
Preferably, the beam collimator adopts an off-axis parabolic reflector, and the LED light source is placed at the focal point of the off-axis parabolic reflector.
Preferably, the angular distribution of the radiation of the LED light source is lambertian.
Preferably, the LED light source is a single light source or an array of LED light sources.
Preferably, the light beam integrating and dodging unit adopts a dodging integrator rod, and the dodging integrator rod is located on an image surface of the converging mirror group.
Preferably, the light beam relay transmission unit adopts a relay lens group, and an object surface of the relay lens group is located on a light emergent surface of the dodging integrator rod.
Preferably, the wavelengths of the light beams emitted by the multiple groups of LED light source components are the same or different.
Preferably, the LED light source assemblies are provided with four groups, and the four groups of LED light source assemblies are rotationally and symmetrically distributed along the optical axis.
Compared with the prior art, the invention has the following advantages:
1. the LED lamp can be coupled with light sources with various wavelengths by arranging a plurality of groups of LED light source components to directly form an off-axis illumination mode;
2. compared with the traditional multi-wavelength mercury lamp scheme, the invention has the advantages of more compact structure, high energy utilization rate and lower energy consumption;
3. the LED light source assembly can move along the optical axis in the radial direction, so that the adjustment of a coherent factor of illumination is realized;
4. the invention has the advantages of simple structure, low control difficulty, high safety, convenient installation and debugging and low cost.
Drawings
FIG. 1 is a schematic view of an illumination device according to the present invention;
FIG. 2 is a schematic structural diagram of an LED light source assembly in the lighting device according to the present invention;
FIG. 3 is a diagram illustrating a distribution of light beams reflected by an LED light source assembly in the illumination apparatus according to the present invention;
FIG. 4 is a schematic diagram of the distribution of light beams emitted from 4 groups of LED light sources and off-axis parabolic reflectors in the illumination device according to the present invention;
FIG. 5 is a schematic diagram of the pupil distribution of a light beam after passing through a dodging integrator rod in the illumination apparatus of the present invention;
FIG. 6 is a schematic structural diagram of the illumination device according to the present invention after the LED light source assembly is radially adjusted;
FIG. 7 is a schematic diagram showing the distribution of light beams emitted from 4 groups of LED light sources and off-axis parabolic reflectors after the coherence factor is changed according to the present invention;
FIG. 8 is a schematic diagram of the pupil distribution of a light beam passing through a dodging integrator rod after the coherence factor is changed in the present invention.
Shown in the figure: 10-LED light source, 20-off-axis parabolic reflector, 30-converging lens group, 40-uniform light integrating rod and 50-relay lens group.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. It is to be noted that the drawings are in simplified form and are not to precise scale, which is provided for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
As shown in fig. 1, the present invention provides an illumination device comprising: the LED light energy generating unit, the light beam integrating and homogenizing unit and the light beam relay transmitting unit are sequentially arranged along the light propagation direction; the LED light energy generating unit includes four sets of LED light source assemblies and a converging lens assembly 30, the sets of LED light source assemblies are rotationally and symmetrically distributed along an optical axis, each set of LED light source assembly can move along a radial direction of the optical axis, and an object plane of the converging lens assembly 30 is located at a light emitting end of the LED light source assembly.
Specifically, the wavelengths of the light beams emitted by the multiple groups of LED light source assemblies may be the same or different. Referring to fig. 1 and 2, the LED light source assembly includes an LED light source 10 and a beam collimating device. Further, the angular distribution of the LED light sources 10 is lambertian, and the LED light sources 10 may be a single light source or an array of LED light sources, so as to increase the system illumination. The light beam collimating device adopts an off-axis parabolic reflector 20, each LED light source 10 is placed at the focus position of the corresponding off-axis parabolic reflector 20, the reflecting surface of the off-axis parabolic reflector 20 is a paraboloid but not a rotationally symmetric reflector, and the light emitting direction of the LED light source 10 is not the vertex of the paraboloid, so that only a part of the paraboloid is needed, the angle of the light beam reflected by the off-axis parabolic reflector 20 is small, the light beam emitted by the corresponding LED light source 10 can be conveniently collimated, and the collimated light beam is coupled into a light beam integral dodging unit by using a converging mirror group 30.
In this embodiment, the number of the LED light sources 10 and the off-axis parabolic reflectors 20 is 4, the distributions are rotationally symmetric along the optical axis direction, a quadrupole pupil illumination mode can be formed, and four wavelengths of 436nm, 405nm, 365nm and 248nm or 1 or more of them can be fused. But there may be more than four sets, and more or fewer LED light sources 10 and off-axis parabolic reflectors 20 may be arranged along the optical axis direction to form a wider variety of illumination pupil distributions, as desired.
The light beam integrating and homogenizing unit adopts a homogenizing light integrating rod 40, the homogenizing light integrating rod 40 is positioned on an image surface of the converging mirror group 30, the light beam relay transmission unit adopts a relay mirror group 50, and an object surface of the relay mirror group 50 is positioned at an outlet end of the homogenizing light integrating rod 40. Specifically, the four groups of LED light sources 10 and the off-axis parabolic reflector 20 form quadrupole illumination capable of changing coherence factors on a pupil plane of the illumination system, so as to improve the focal depth of the lithography machine. And then the uniform light beams are converged to the inlet end of the uniform light integration rod 40 through the converging lens group 30, the uniform light integration rod 40 performs uniform light on the light beams, a uniform illumination view field is formed at the outlet end of the uniform light integration rod 40, the uniform illumination view field is amplified by the relay lens group 50, and a multi-wavelength quadrupole illumination view field with uniformity meeting requirements is formed on a relay image surface.
Preferably, as shown in fig. 6, by controlling the LED light source 10 and the off-axis parabolic mirror 20 to move radially along the optical axis, the energy distribution of the illumination pupil is changed, and the coherence factor of the quadrupole illumination is changed.
Specifically, the light beams emitted from a single group of LED light sources 10 and the off-axis parabolic reflector 20 are distributed as shown in fig. 3, and the light beams emitted from 4 groups of LED light sources 10 and the off-axis parabolic reflector 20 are shown in fig. 4, i.e. a quadrupole illumination mode is formed. The pupil distribution of the light beam exiting after passing through the integrator rod 40 is shown in fig. 5, forming a quadrupole illumination mode. In a specific using process, the focal length of the converging lens group 30 can be optimized according to requirements, so that a quadrupole illumination coherence factor meeting the requirements is obtained. If the wavelengths of the 4 groups of LED light sources 10 are different, the 4 groups of light beams with different wavelengths can be coupled together, so that the fusion of multiple wavelengths is realized.
Referring to fig. 6, if each set of LED light sources 10 and off-axis parabolic reflector 20 are controlled to move radially along the optical axis, the energy distribution of the illumination pupil is changed, changing the coherence factor of the quadrupole illumination. Specifically, after the coherence factor of the quadrupole illumination is changed, the beam distribution of the 4 groups of LED light sources 10 and the off-axis parabolic reflector 20 is as shown in fig. 7, and the coherence factor is further increased. Further, when the coherence factor of the quadrupole illumination is changed, the pupil distribution of the light beam exiting after passing through the integrator rod 40 is as shown in fig. 8, and the coherence factor is further increased.
It will be apparent to those skilled in the art that various changes and modifications may be made in the invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.

Claims (8)

1. An illumination device, comprising: the LED light energy generating unit, the light beam integrating and homogenizing unit and the light beam relay and transmission unit are arranged along the light propagation direction; the LED light energy generation unit comprises a plurality of groups of LED light source assemblies and a converging lens group, the plurality of groups of LED light source assemblies are rotationally and symmetrically distributed along an optical axis, each group of LED light source assemblies can move along the radial direction of the optical axis, an object surface of the converging lens group is positioned at a light outlet end of each LED light source assembly, the LED light source assemblies move along the radial direction of the optical axis, and light beams emitted by the LED light source assemblies pass through the light beam integrating and homogenizing unit to change a coherent factor of illumination; the wavelengths of the light beams emitted by the LED light source assemblies are the same or different, and when the wavelengths of the light beams emitted by the LED light source assemblies are different, the light beams with different wavelengths are coupled together by the converging mirror group; and the LED light source assembly forms multi-pole illumination capable of changing coherence factors on a pupil plane of the illumination system, the converging mirror group converges the multi-pole illumination to the light beam integration and dodging unit to form a uniform illumination view field, and the uniform illumination view field is amplified through the light beam relay transmission unit to form a multi-pole illumination view field with uniformity meeting requirements and multiple wavelengths.
2. The illumination device as claimed in claim 1, wherein the LED light source assembly comprises an LED light source and a light beam collimating device, and the light beam emitted from the LED light source is collimated by the light beam collimating device and then projected to the converging mirror group.
3. The illumination device as claimed in claim 2, wherein the beam collimating device is an off-axis parabolic reflector, and the LED light source is disposed at a focal point of the off-axis parabolic reflector.
4. A lighting device as recited in claim 2, wherein said LED light source has a lambertian angular distribution of radiation.
5. A lighting device as recited in claim 2, wherein said LED light source is a single light source or an array of LED light sources.
6. The illumination device as claimed in claim 1, wherein said beam integrating integrator is an integrator rod, and said integrator rod is located at the image plane of said collection mirror group.
7. The illumination device as claimed in claim 6, wherein the light beam relay unit employs a relay lens group, and an object plane of the relay lens group is located on a light-emitting surface of the integrator rod.
8. The illumination device as recited in claim 1, wherein four sets of said LED light source modules are provided, said four sets of said LED light source modules being rotationally symmetric about the optical axis.
CN201610932743.1A 2016-10-31 2016-10-31 Lighting device Active CN108020994B (en)

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CN115469515A (en) * 2022-10-27 2022-12-13 中国科学院光电技术研究所 Ultraviolet light-emitting diode exposure device and system

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CN101551594A (en) * 2009-04-30 2009-10-07 中国科学院上海光学精密机械研究所 System and method for detecting odd aberration of projection objective of photoetching machine based on dipolar illumination
CN102129173A (en) * 2010-01-12 2011-07-20 上海微电子装备有限公司 Photoetching machine projection objective lens wave aberration field measurement method
CN102298273A (en) * 2011-08-25 2011-12-28 中国科学院上海光学精密机械研究所 Aerial image sensor angle response measurement method based on two-pole illumination

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US7070301B2 (en) * 2003-11-04 2006-07-04 3M Innovative Properties Company Side reflector for illumination using light emitting diode
KR20080099446A (en) * 2007-05-09 2008-11-13 주식회사 하이닉스반도체 Exposure apparatus for manufacturing semiconductor device
CN102566294A (en) * 2010-12-28 2012-07-11 上海微电子装备有限公司 Photoetching lamp optical system
JP5806479B2 (en) * 2011-02-22 2015-11-10 キヤノン株式会社 Illumination optical system, exposure apparatus, and device manufacturing method
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Publication number Priority date Publication date Assignee Title
CN101551594A (en) * 2009-04-30 2009-10-07 中国科学院上海光学精密机械研究所 System and method for detecting odd aberration of projection objective of photoetching machine based on dipolar illumination
CN102129173A (en) * 2010-01-12 2011-07-20 上海微电子装备有限公司 Photoetching machine projection objective lens wave aberration field measurement method
CN102298273A (en) * 2011-08-25 2011-12-28 中国科学院上海光学精密机械研究所 Aerial image sensor angle response measurement method based on two-pole illumination

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