KR102612692B1 - Illumination optical system, exposure apparatus, and method of manufacturing article - Google Patents

Abstract

[Project] Provide an advantageous technology to make light with an energy density according to the lighting mode incident on an optical integrator.
[Solution] An illumination optical system that illuminates a surface to be illuminated using light from a light source includes a generator that diffracts light from the light source and generates a light intensity distribution selected from a plurality of types of light intensity distributions on the pupil plane; , an optical integrator disposed on an optical path between the generating unit and the illuminated surface, and a light transmitting member disposed on an optical path between the generating unit and the optical integrator, the plurality of types. The light intensity distribution includes a first light intensity distribution and a second light intensity distribution having different distribution shapes in the pupil plane, and the light transmitting member is configured to generate the first light intensity distribution and the second light intensity distribution. When generating a light intensity distribution, it includes a first area through which light commonly transmits, and a second area other than the first area, and the first area includes a divergence portion whose degree of light divergence is higher than that of the second area. do.

Description

Illumination optical system, exposure apparatus, and method of manufacturing articles {ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE}

The present invention relates to an illumination optical system, an exposure apparatus using the same, and a method for manufacturing an article.

In an exposure apparatus that illuminates an original plate with an illumination optical system and projects the original pattern onto a substrate through a projection optical system, progress has been made in increasing the output of the light source in order to improve throughput. However, increasing the output of the light source may accelerate the decline in the initial performance of the optical element used in the exposure apparatus. Patent Document 1 proposes arranging a scattering structure that scatters light in an optical path in an illumination optical system.

Patent Document 1: Patent No. 4933671 Publication

In the exposure apparatus, various illumination modes such as large σ illumination, small σ illumination, quadrupole illumination, etc. can be used depending on the type of circuit pattern formed on the original plate. However, depending on the illumination mode, the size of the light intensity distribution in the pupil plane may be reduced, and in an illumination optical system that diffracts light from a light source to generate a desired light intensity distribution in the pupil plane, the light intensity distribution Depending on the reduction, the energy density of light may increase. In this case, light with high energy density is incident on a part of the optical integrator, and the decrease in initial performance in that part is further accelerated, so it is expected to reduce the energy density of the light. On the other hand, in the method described in Patent Document 1, since the diffusion structure is disposed throughout the optical path regardless of the illumination mode, the energy density of light is reduced even in illumination modes in which there is no need to reduce the energy density of light, resulting in image (image) ), the illuminance may decrease.

Therefore, the purpose is to provide an advantageous technology for making light with an energy density according to the illumination mode incident on the optical integrator.

In order to achieve the above object, an illumination optical system as one aspect of the present invention is an illumination optical system that illuminates a surface to be illuminated using light from a light source, diffracts the light from the light source, and selects one of a plurality of types of light intensity distribution. A generator for generating a selected light intensity distribution on the pupil plane, an optical integrator disposed on an optical path between the generator and the illuminated surface, and an optical integrator disposed on the optical path between the generator and the optical integrator. It includes an arranged light transmitting member, wherein the plurality of types of light intensity distributions include a first light intensity distribution and a second light intensity distribution having different distribution shapes on the pupil plane, and the light transmitting member includes: When generating the first light intensity distribution and when generating the second light intensity distribution, it includes a first area through which light transmits in common, and a second area other than the first area, wherein the first area has a wide It is characterized in that it includes a divergence portion whose degree of divergence is higher than that of the second region.

Other objects or other aspects of the present invention will be elucidated by preferred embodiments described below with reference to the accompanying drawings.

According to the present invention, for example, an advantageous technology can be provided because light with an energy density according to the illumination mode is incident on the optical integrator.

[Figure 1] A schematic diagram showing the configuration of an exposure apparatus.
[Figure 2] A diagram showing an example of the configuration of a light-transmitting member.
[Figure 3] A diagram showing an example of the configuration of a light-transmitting member.
[Figure 4] A diagram showing a modified example of a light transmitting member.
[Figure 5] A diagram showing a modified example of a light transmitting member.
[Figure 6] A diagram showing a modified example of a light transmitting member.
[Figure 7] A diagram showing a modified example of a light transmitting member.
[Figure 8] A diagram showing a modified example of a light transmitting member.
[Figure 9] A diagram showing a modified example of a light transmitting member.

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Meanwhile, the following embodiments do not limit the invention according to the scope of the patent claims. Although a plurality of features are described in the embodiment, it is not limited that all of these plural features are essential to the invention, and the plural features may be arbitrarily combined. Furthermore, in the accompanying drawings, the same reference numerals are attached to the same or the same components, and duplicate descriptions are omitted.

<First embodiment>

The exposure apparatus 100 of the first embodiment according to the present invention will be described. 1 is a schematic diagram showing the configuration of the exposure apparatus 100 of this embodiment. The exposure apparatus 100 includes an illumination optical system IL that illuminates the original plate M using the light flux from the light source 1, a projection optical system PO that projects the pattern of the original M illuminated by the illumination optical system IL onto the substrate W, and a control unit. Includes CNT. The control unit CF is composed of a computer including CPU and memory, for example, and controls each part of the exposure apparatus 100 (controls the process of exposing the substrate W). Here, as the original plate M, for example, a mask or a reticle can be used, and as the substrate W, for example, a wafer or a glass plate (liquid crystal substrate) can be used.

The light source 1 generates and emits a luminous flux (light). As the light source 1, for example, an excimer laser or a mercury lamp can be used. Recently, with the miniaturization and high integration of circuit patterns in semiconductor integrated circuits, an excimer laser such as a KRF laser (248 nm) or an ABF laser (193 nm) that emits short-wavelength laser light can be used as the light source 1. Additionally, the guidance optical system 2 is installed between the light source 1 and the illumination optical system IL, and guides the light flux emitted from the light source 1 to the illumination optical system IL. In the case of this embodiment, the light beam emitted from the guidance optical system 2 is reflected by the mirror 3 and enters the illumination optical system IL through the parallel flat plate 4.

The illumination optical system IL includes, for example, an exit angle preservation optical element 5, a generating unit 6 having a diffractive optical element 6a, a condenser lens 7, a light blocking member 9, and a prism unit. (10) may be included. In addition, the illumination optical system IL may further include a zoom lens unit 11, a light transmission member 12, a multi-beam forming part 13, an aperture 14, and a condenser lens 15.

The emission angle preserving optical element 5 is installed on the optical path on the light source 1 side of the generating unit 6 (that is, between the generating unit 6 and the induction optical system 2). The emission angle preservation optical element 5 includes an optical integrator such as a microlens array or a fiber bundle, and guides the light flux from the light source 1 to the generating unit 6 while keeping its divergence angle constant.

The generating unit 6 includes a diffractive optical element 6a disposed on the optical path between the exit angle preserving optical element 5 and the condenser lens 7, and the light source 1 is generated by the diffractive optical element 6a. ) diffracts the light flux from the source to generate the desired light intensity distribution. The diffractive optical element 6a is disposed on a surface conjugate with the original plate M, which is the illuminated surface, or on a surface in a Fourier transform relationship with the pupil plane of the illumination optical system IL. And, the diffractive optical element 6a distributes the light intensity of the light flux from the light source 1 on the pupil plane of the illumination optical system IL, which is the pupil plane of the projection optical system PO, and on the pupil plane of the illumination optical system IL. is converted by the diffraction effect to form the desired light intensity distribution. The light intensity distribution (illumination shape) formed on the pupil plane of the projection optical system PO in this way is sometimes called an effective light source. Here, as the diffraction optical element 6a, a computer generated hologram (GCH) designed with a computer so that a desired diffraction pattern is obtained on the diffraction pattern surface may be used.

In the case of this embodiment, the generating unit 6 includes a plurality of diffractive optical elements 6a, and selects a light intensity distribution from a plurality of types by switching the diffractive optical elements 6a disposed on the optical path. A light intensity distribution is created in the pupil plane. That is, the generating unit 6 can be configured to change the light intensity distribution in the pupil plane by changing the diffractive optical element 6a disposed on the optical path. For example, a plurality of diffractive optical elements 6a are each mounted in a plurality of slots in a turret, and the turret is rotated to switch the diffractive optical elements 6a disposed on the optical path (i.e. One of the plurality of diffractive optical elements 6a is selectively placed on the optical path). Accordingly, the light intensity distribution generated in the pupil plane can be changed. Here, the plurality of diffractive optical elements 6a are aligned with each other so that the illuminated surface (disk M) can be illuminated in various illumination modes such as small σ illumination, large σ illumination, annular illumination, dipole illumination, and quadrupole illumination. It is configured to generate different types of light intensity distributions in the pupil plane.

The condenser lens 7 is installed on the optical path between the diffraction optical element 6a (generation unit 6) and the prism unit 10, and condenses the light beam diffracted by the diffraction optical element 6a, and performs Fourier transformation. A diffraction pattern is formed on surface 8. The Fourier transform surface 8 is a surface located between the multi-beam forming portion 13 (optical integrator) and the diffractive optical element 6a, and is in an optical Fourier transform relationship with the diffractive optical element 6a. Therefore, if the diffraction optical element 6a is changed, the shape of the diffraction pattern formed on the Fourier transform surface 8 can be changed.

The light blocking member 9 is disposed on or near the Fourier transform surface 8. The light blocking member 9 may include, for example, an aperture, a blade, or a filter. In the case of this embodiment, a plurality of light blocking members 9 are installed in the illumination optical system IL. The plurality of light blocking members 9 are each mounted in a plurality of slots in the turret, and by rotating the turret, one of the plurality of light blocking members 9 can be selectively placed on the optical path.

The prism unit 10 and the zoom lens unit 11 are installed on the optical path between the light blocking member 9 and the multi-beam forming portion 13 (optical integrator), and the light intensity formed on the Fourier transform surface 8 It functions as a zoom optical system that expands distribution. The prism unit 10 can guide the circuit pattern (light intensity distribution) formed on the Fourier transform surface 8 to the zoom lens unit 11 by adjusting the rotation ratio and the like. In addition, the zoom lens unit 11 is installed on the optical path between the prism unit 10 and the multi-beam forming portion 13, and adjusts the σ value of the diffraction pattern formed on the Fourier transform surface 8 to create a multi-beam beam. It can be guided to the forming part 13.

The multi-beam forming portion 13 (optical integrator) is disposed on the optical path between the generating portion 6 and the original plate M, which is the illuminated surface. In the case of this embodiment, the multi-beam forming portion 13 is disposed on the optical path between the zoom lens unit 11 and the condenser lens 15, and produces light according to a diffraction pattern in which the annulus ratio, aperture angle, and σ value are adjusted. , a plurality of secondary light sources are formed and guided to the condenser lens 15. The multi-beam forming portion 13 may include a fly's eye lens as an optical integrator, but instead of or in addition to the fly's eye lens, it may include other optical integrators such as optical pipes, diffractive optical elements, or microlens arrays. You can do it.

The condenser lens 15 is installed on the optical path between the multi-beam forming portion 13 and the disk M. Accordingly, the plurality of light beams derived from the multi-beam forming unit 13 are converged to illuminate the disk M in an overlapping manner, and the disk M can be illuminated uniformly. Here, an aperture 14 may be installed between the multi-beam forming portion 13 and the condenser lens 15.

Additionally, a half mirror 16 is installed at the rear end of the condenser lens 15, and a part of the light flux from the condenser lens 15 is guided to the detection unit 18 through the optical system 17. The detection unit 18 includes a sensor that detects the intensity of incident light. Accordingly, the control unit CT can control the exposure amount of the substrate W with high precision based on the detection result from the detection unit 18.

The original plate M is installed between the condenser lens 15 and the projection optical system PO, and has a circuit pattern to be transferred onto the substrate. The disk M is held and driven by a disk stage (not shown). The projection optical system PO is installed between the original plate M and the substrate W, and maintains the original plate M and the substrate W in an optically conjugate relationship. The substrate W is held and driven by a substrate stage (not shown). In the exposure apparatus 100 configured in this way, a pattern on the substrate can be formed by projecting the pattern of the original plate M illuminated by the illumination optical system IL onto the substrate W by the projection optical system PO.

[Configuration of light transmitting member]

In the exposure apparatus 100 of this embodiment, by changing the diffractive optical element 6a disposed on the optical path in the generating unit 6, large σ illumination or small σ illumination is provided depending on the type of circuit pattern of the original plate M. Various lighting modes such as lighting and multipole lighting can be used. However, depending on the illumination mode, for example, small σ lighting or quadrupole lighting, the illumination area of the light in the pupil plane may be reduced, and the light from the light source is diffracted to generate the desired light intensity distribution in the pupil plane. In this method, the energy density of light may increase as the illumination area is reduced. In this case, light with high energy density is locally incident on a part of the optical integrator (multi-beam forming part 13), and the decrease in initial material performance in that part is further accelerated compared to other parts. It is expected to reduce the energy density of light.

Therefore, in the exposure apparatus 100 of the present embodiment, the light-transmitting member 12 partially (locally) having a diverging portion 20 that emits light includes a generating portion 6 (diffraction optical element 6a) and It is disposed on the optical path between the multi-beam forming portion 13 (optical integrator). In the example shown in Fig. 1, the light transmitting member 12 is disposed on the optical path between the multi-beam forming portion 13 and the zoom lens unit 11. Here, the divergence of light specifically means that the diameter of the light flux incident on the multi-beam forming portion 13 is larger than the diameter of the light flux incident on the light transmitting member 12, in other words, the diameter of the light flux is set to be larger. The beam of light is emitted to enlarge it. The divergence of light is sometimes called “expansion of the angular distribution of light” or “diffusion of light.”

Next, the specific structure of the light-transmitting member 12 will be explained with reference to FIGS. 2 and 3. FIG. 2 is a diagram showing an example of the configuration of the light transmitting member 12 of the present embodiment, as seen from the multi-beam forming portion 13. Additionally, FIG. 3A shows a perspective view of the light-transmitting member 12 of the present embodiment, and FIG. 3B shows a cross-sectional view (a cross-sectional view taken along the line A-A in FIG. 3A) of the light-transmitting member 12 of the present embodiment.

For example, it is assumed that a plurality of types of light intensity distributions formed on the pupil plane by the generating unit 6 include a first light intensity distribution and a second light intensity distribution with different distribution shapes on the pupil plane. . When the area in the pupil plane is smaller in the first light intensity distribution than the second light intensity distribution, the light intensity distribution for small σ illumination and multipole illumination is applied as the first light intensity distribution, and the second light intensity distribution is applied. As, the light intensity distribution during large σ lighting can be applied.

In this case, as shown in FIG. 2, the light transmitting member 12 includes a first area 12a through which light commonly transmits when the first light intensity distribution is generated and when the second light intensity distribution is generated. , includes a second area 12b other than the first area. In addition, the divergence unit 20, which has a higher degree of light divergence than the second region 12b, is installed in the first region 12a. Here, Figure 2 shows an example in which the entire first area 12a functions as the diverging portion 20. In addition, in Figure 2, when the size of the light intensity distribution generated in the pupil plane is maximized (e.g., when the light intensity distribution for large σ illumination is taken), the area that transmits the light transmitting member 12 is It is indicated by a dashed line.

In the case of this embodiment, the diverging portion 20 (first region 12a) of the light transmitting member 12 may be configured as a concave lens with negative power, as shown in FIG. 3, but, for example, A configuration in which a plurality of convex lenses are arranged may be used. Additionally, the second region 12b may have a planar shape (i.e., a parallel planar shape) so as to transmit light without emitting it, and may be configured to transmit light without emitting it. In the example shown in Figure 3, the diverging portion 20 is composed of one concave lens, but it is not limited thereto, and may be composed of an array of a plurality of concave lenses as shown in Figure 4, and the second It may be configured to have a surface roughness greater than that of the region 12b. Furthermore, the emitting portion 20 may be composed of a computer-generated hologram (CGH).

[Effects when using light-transmitting members]

Next, the effect of using the light-transmitting member 12 configured as described above will be explained. The above-described light-transmitting member 12 is configured to assume application to small σ lighting of NA 0.50 and σ 0.20, and the light-transmitting member 12 is used under the conditions of small σ lighting (NA 0.50, σ 0.20). When doing so, the energy density given to the optical integrator was calculated. As a result, it was confirmed that when the light-transmitting member 12 of the present embodiment was used, the energy density was 69% compared to the case where the light-transmitting member 12 was not used, and that the effect of reducing the energy density was obtained. .

In addition, the ratio of the top surface illuminance when the light transmitting member 12 is used (top surface illuminance ratio) to the top surface illuminance when the light transmitting member 12 is not in use is a calculation result as shown in Table 1 below. It has become. Table 1 shows the calculation results of the top surface illumination ratio under the first condition of NA 0.50 and σ 0.20, the second condition of NA 0.86 and σ 0.40, and the third condition of NA 0.86 and σ 0.93. In Table 1, for comparison, the case where the diffusion structure is disposed throughout the optical path regardless of the illumination mode (prior art), as described in Patent Document 1, is also shown.

lighting mode NA 0.50, σ 0.20 NA 0.86, σ 0.40 NA 0.86, σ 0.93 This embodiment 80% 98.3% 99.7% prior art 80% 80% 80%

As shown in Table 1, when the light transmitting member 12 of the present embodiment is used, under the first condition of NA 0.50 and σ 0.20, the top surface illumination ratio becomes 80%, as in the prior art, and the energy density is reduced. I know that the effect is being achieved. On the other hand, the top surface roughness ratio under the second condition of NA 0.86 and σ 0.40 was 98.3%, and under the third condition of NA 0.86 and σ 0.93, the top surface roughness ratio was 99.7%. This shows that compared to the prior art, the decrease in top surface illumination due to the use of the light transmitting member 12 can be suppressed (alleviated).

[Area of radiating part]

Next, the area of the diverging portion 20 in the light transmitting member 12 will be described. The divergence section 20 may be designed so that, in the entire exposure apparatus 100, the energy density is such that a decrease in initial reproduction performance is acceptable when the illumination NA is approximately one-third the size of the maximum illumination NA. . Therefore, when the ratio of the area of the effective diameter to the light intensity distribution in the pupil plane at the time of maximum illumination is 11% or less, taking into account the decrease in initial performance due to energy density, the above-mentioned light transmission member ( It becomes necessary to apply 12) and operate the device by reducing the energy density. The conditions for NA and σ of the projection optical system for the maximum effective light source are, for example, NA 0.86 and σ 0.95. Here, the ratio is, in other words, the ratio of the area illuminated by the optical integrator to the area of the maximum effective light source in the optical integrator, or the maximum area through which light can transmit the light transmitting member 12. It can also be said to be the ratio of the area of the diverging portion 20. In short, the light transmitting member 12 is preferably configured so that the emitting portion 20 has an area of 11% or less with respect to the maximum area through which light can transmit the light transmitting member 12.

As described above, the light-transmitting member 12 partially (locally) having a diverging portion 20 that emits light includes a generating portion 6 (diffractive optical element 6a) and a multi-beam forming portion 13 ( It is placed on the optical path between the optical integrator. Accordingly, light with an energy density depending on the illumination mode is incident on the optical integrator, and the increase in energy density and decrease in top surface illumination due to the change in illumination mode can be reduced.

<Second Embodiment>

A second embodiment according to the present invention will be described. In the first embodiment, the configuration of the light transmitting member 12 was explained assuming the application of small σ lighting of NA 0.50 and σ 0.20, but the lighting mode is not limited to small σ lighting, and the lighting mode you want to use The configuration of the diverging portion 20 of the light transmitting member 12 may be changed accordingly. In addition, below, an example in which the entire first area 12a functions as the diverging portion 20 will be described.

For example, when applying dipole lighting, a first area 12a is located in the light transmitting member 12, as shown by hatching in FIG. 5, and the radiating part 20 is located in the first area 12a. ) is installed. In addition, when quadrupole lighting is applied, in the light transmitting member 12, a first area 12a is located as shown by hatching in FIG. 6, and a diverging portion 20 is located in the first area 12a. It is installed.

Additionally, as shown in FIG. 7, the emitting portion 20 may be configured to have a plurality of portions with different degrees of light divergence. In the example shown in Figure 7, the emitting portion 20 is divided into two portions 20a and 20b with different degrees of light divergence, but it is not limited to two portions and may be divided into three or more portions. .

In addition, in the above example, the diverging part 20 has a circular shape, but if there are restrictions when manufacturing the diverging part 20, the diverging part 20 is shaped into a rectangular shape, as shown in FIG. 8. It can be done in any shape. Furthermore, as shown in Fig. 9, the rectangular-shaped diverging portion 20 may be rotated. This is useful when there is an effect of suppressing illumination unevenness by differentiating the orientation of the rectangular diverging portion 20 from the rectangular orientation of the fly's eye lens as an optical integrator. Additionally, as another method for suppressing illuminance unevenness due to the interaction with the orientation of the periodic structure of the fly's eye lens, the orientation of the period of the diffracted light by the diffraction optical element 6a and the periodic structure of the fly's eye lens are used. The diffractive optical element 6a may be rotated to change the orientation. Here, as described above, a plurality of light transmitting members 12 may be provided in the exposure apparatus 100 so that the dimensions of the diverging portions 20 are different from each other, and may be configured to be switched according to the selected light intensity.

<Embodiment of manufacturing method of article>

The method of manufacturing an article according to an embodiment of the present invention is also suitable for manufacturing articles such as micro devices such as semiconductor devices or elements having a micro structure. The manufacturing method of the article of this embodiment includes the steps of forming a latent image pattern on a photosensitive agent applied to a substrate (a step of exposing the substrate) using the above-mentioned exposure apparatus, and developing (processing) the substrate on which the latent image pattern was formed through this step. ) includes the process. Moreover, this manufacturing method includes other well-known processes (oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). Compared to the conventional method, the manufacturing method of the product of this embodiment is advantageous in at least one of product performance, quality, productivity, and production code.

(Other examples)

The present invention provides a program that realizes one or more functions of the above-described embodiments to a system or device through a network or storage medium, and one or more processors in a computer of the system or device reads and executes the program. It is also feasible through processing. Additionally, it can also be realized by a circuit (for example, ASIC) that realizes one or more functions.

The invention is not limited to the above embodiments, and various changes and modifications are possible without departing from the spirit and scope of the invention. Therefore, the claims are attached to clarify the scope of the invention.

6: generating unit, 6a: diffractive optical element, 12: light transmission member, 12a: first area, 12b: second area, 13: multi-beam forming unit, 20: diverging unit, 100: exposure device

Claims (13)

It is an illumination optical system that illuminates the illuminated surface using light from a light source,
a generator that diffracts light from the light source to generate a light intensity distribution on the pupil plane according to an illumination mode selected to illuminate the illuminated surface among a plurality of types of illumination modes;
an optical integrator disposed on an optical path between the generating unit and the illuminated surface;
It includes a light-transmitting member disposed on an optical path between the generating unit and the optical integrator,
The plurality of types of illumination modes include a first illumination mode and a second illumination mode with different illumination areas in the pupil plane, and the illumination area in the first illumination mode is smaller than that in the second illumination mode. ,
The light transmitting member includes a first area through which light commonly transmits in the first lighting mode and the second lighting mode, and a second area other than the first area,
The first area is an illumination optical system including a divergence portion where the degree of light divergence is higher than that of the second area.
According to claim 1,
An illumination optical system, characterized in that the second region is configured to transmit light without emitting it.
According to claim 2,
An illumination optical system, characterized in that the second region has a planar shape.
According to claim 1,
The generating unit includes a plurality of diffractive optical elements and is configured to change the illumination mode by changing the light intensity distribution in the pupil plane by switching the diffractive optical elements disposed on the optical path. lighting optical system.
According to claim 1,
An illumination optical system, wherein a plurality of the light transmitting members are installed so that the dimensions of the emitting portions are different from each other, and are switched according to a selected illumination mode.
According to claim 1,
An illumination optical system, wherein the diverging portion has an area of 11% or less with respect to the maximum area through which light can transmit through the light-transmitting member.
According to claim 1,
An illumination optical system, characterized in that the diverging portion has a plurality of portions with different degrees of light divergence.
According to claim 1,
An illumination optical system, wherein the diverging portion has a circular shape.
According to claim 1,
An illumination optical system, wherein the diverging portion has a rectangular shape.
According to claim 1,
An illumination optical system, wherein the first illumination mode and the second illumination mode have different areas of light intensity distribution in the pupil plane.
According to claim 10,
The first illumination mode includes at least one of small σ illumination and multipole illumination,
The second illumination mode includes large σ illumination.
An exposure device that exposes a substrate,
An illumination optical system according to any one of claims 1 to 11 for illuminating an original plate,
An exposure apparatus comprising a projection optical system that projects the pattern of the original plate onto a substrate.
An exposure process of exposing a substrate using the exposure apparatus according to claim 12,
Including a processing process for processing the substrate exposed in the exposure process,
A method of manufacturing an article, characterized in that an article is manufactured from the substrate processed in the processing process.

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