CN108020994A - A kind of lighting device - Google Patents

A kind of lighting device Download PDF

Info

Publication number
CN108020994A
CN108020994A CN201610932743.1A CN201610932743A CN108020994A CN 108020994 A CN108020994 A CN 108020994A CN 201610932743 A CN201610932743 A CN 201610932743A CN 108020994 A CN108020994 A CN 108020994A
Authority
CN
China
Prior art keywords
led light
light source
source component
lighting device
microscope group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201610932743.1A
Other languages
Chinese (zh)
Other versions
CN108020994B (en
Inventor
田毅强
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Micro Electronics Equipment Co Ltd
Original Assignee
Shanghai Micro Electronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to CN201610932743.1A priority Critical patent/CN108020994B/en
Publication of CN108020994A publication Critical patent/CN108020994A/en
Application granted granted Critical
Publication of CN108020994B publication Critical patent/CN108020994B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

Abstract

The invention discloses a kind of lighting device, including：LED light energy generating unit, the light beam set along optical propagation direction integrates even light unit and light beam relaying transfer unit；Wherein, the LED light energy generating unit includes multigroup LED light source component and convergence microscope group, multigroup LED light source component is symmetrical along optical axis rotation, and LED light source component described in every group can be moved radially along the optical axis, the object plane of the convergence microscope group is located at the light extraction end of the LED light source component.The present invention can couple the light source of multi-wavelength, directly form off-axis illumination pattern by setting multigroup LED light source component；Relative to traditional multi-wavelength mercury lamp scheme, structure of the present invention is compacter, and capacity usage ratio is high, and energy consumption is relatively low；The LED light source component can be moved radially along the optical axis, realize the adjusting to the coherence factor of illumination.

Description

A kind of lighting device
Technical field
The present invention relates to technical field of lithography, more particularly to a kind of lighting device.
Background technology
Microlithography technology in semiconductor manufacturing is exactly that the figure on mask is accurately projected exposure using optical system Light is on the silicon chip of coated photoresist.
In order to further enhance the resolution capability of exposure system, depth of focus is improved, increases process window, in scan exposure system In taken off-aixs illumination (off-axis illumination, OAI) extensively.Traditional off-axis illumination includes annular Illumination, the illumination of two poles and quadrupole illuminating etc., mainly select different off-axis illumination pupils point according to specific mask pattern Cloth.
With the development of LED light source technology, it is high-power high-strength that the power of LED light source becomes closer to modern semiconductors industry The demand of degree, LED light source have very big application prospect.LED light source generally comprises substrate, there is LED lamp, LED lamp on substrate It is potting resin outside.LED light source has the characteristics that small, long lifespan, outgoing luminous power are easily controllable.In different usage scenarios Under, LED light source carrys out meet demand by using different collection of energy and light balancing device.
For etching system, since the monochromaticjty of LED light source is, it is necessary to the difference that will meet photoetching process conditions of exposure The optical coupling of wavelength is into optical system, and the coupled modes that the prior art uses, not only complicated but also can be to light source energy Amount causes damages, and influences lithographic results.
The content of the invention
The present invention provides a kind of lighting device, to solve off-axis illumination coupling difficulty in the prior art, energy of light source loss The problem of big.
In order to solve the above technical problems, the present invention provides a kind of lighting device, including：The LED set along optical propagation direction Luminous energy generating unit, light beam integrate even light unit and light beam relaying transfer unit；Wherein, the LED light energy generating unit includes Multigroup LED light source component and convergence microscope group, multigroup LED light source component is symmetrical along optical axis rotation, and LED described in every group Light source assembly can be moved radially along the optical axis, and the object plane of the convergence microscope group is located at the light extraction end of the LED light source component.
Preferably, the LED light source component includes LED light source and beam collimation device, the light beam that LED light source is sent passes through The convergence microscope group is projected after the beam collimation device collimation.
Preferably, the beam collimation device uses off-axis parabolic mirror, the LED light source is positioned over off-axis throwing The focal position of parabolic mirror.
Preferably, the Electric dipole radiation of the LED light source is lambertian distribution.
Preferably, the LED light source is single source or LED light source array.
Preferably, the light beam, which integrates even light unit, uses even smooth integrating rod, the even smooth integrating rod is located at the remittance In the image planes of poly- microscope group.
Preferably, the light beam relaying transfer unit is located at even light using relaying microscope group, the object plane of the relaying microscope group The light-emitting surface of integrating rod.
Preferably, the light beam wavelength that multigroup LED light source component is sent is identical or different.
Preferably, the LED light source component is provided with four groups, four groups of LED light source components are symmetrical along optical axis rotation Distribution.
Compared with prior art, the present invention has the following advantages：
1st, the present invention can couple the light source of multi-wavelength, directly form off-axis illumination by setting multigroup LED light source component Pattern；
2nd, relative to traditional multi-wavelength mercury lamp scheme, structure of the present invention is compacter, and capacity usage ratio is high, energy consumption compared with It is low；
3rd, the LED light source component can be moved radially along the optical axis, realize the adjusting to the coherence factor of illumination；
4th, structure of the invention is simple, control difficulty is low, it is safe, be easily installed and debug, it is and of low cost.
Brief description of the drawings
Fig. 1 is a kind of structure diagram of lighting device of the present invention；
Fig. 2 is the structure diagram of LED light source component in lighting device of the invention；
Fig. 3 is the beam distribution figure that LED light source component reflects in lighting device of the invention；
Fig. 4 is that 4 groups of LED light sources and the beam distribution of off-axis parabolic mirror outgoing are illustrated in lighting device of the invention Figure；
Fig. 5 is pupil distribution schematic diagram of the light beam after even smooth integrating rod in lighting device of the invention；
Fig. 6 is the structure diagram for carrying out the lighting device after radial direction adjustment in the present invention to LED light source component；
Fig. 7 is to change 4 groups of LED light sources and the beam distribution of off-axis parabolic mirror outgoing after coherence factor in the present invention Schematic diagram；
Fig. 8 is pupil distribution schematic diagram of the light beam after even smooth integrating rod after change coherence factor in the present invention.
Shown in figure：10-LED light sources, 20- off-axis parabolic mirrors, 30- convergences microscope group, the even smooth integrating rods of 40-, 50- Relay microscope group.
Embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, below in conjunction with the accompanying drawings to the present invention Embodiment be described in detail.It should be noted that attached drawing of the present invention uses using simplified form and non-essence Accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
As shown in Figure 1, the present invention provides a kind of lighting device, including：The LED light set gradually along optical propagation direction can be sent out Raw unit, light beam integrate even light unit and light beam relaying transfer unit；Wherein, the LED light energy generating unit includes four groups of LED Light source assembly and convergence microscope group 30, multigroup LED light source component is distributed along optical axis direction rotational symmetry, and LED described in every group Light source assembly can be moved radially along the optical axis, and the object plane of the convergence microscope group 30 is located at the light extraction of the LED light source component End.
Specifically, multigroup LED light source component send the wavelength of light beam can be identical, can not also be identical.With reference to Fig. 1 And Fig. 2, the LED light source component include LED light source 10 and beam collimation device.Further, the angle of the LED light source 10 point Cloth is lambertian distribution, and the LED light source 10 can be single source or LED light source array, and then can increase system Illumination.The beam collimation device uses off-axis parabolic mirror 20, and each LED light source 10 is positioned over corresponding off-axis parabolic The focal position of face speculum 20, reflecting surface of off-axis parabolic mirror 20 itself is parabola, but is not rotational symmetry The speculum of formula, the light emission direction of LED light source 10 is not paraboloidal vertex, so a paraboloidal part is only needed, and from The beam angle very little that off-axis parabolic mirror 20 reflects, the light beam that easily can be emitted corresponding LED light source 10 Collimated, and integrated the light beam coupling after collimation to light beam in even light unit using microscope group 30 is converged.
It should be noted that in the present embodiment, LED light source 10 and the quantity of off-axis parabolic mirror 20 are respectively 4 groups, Be distributed as along optical axis direction rotational symmetry be distributed, quadrupole pupil illumination pattern can be formed, and can merge 436nm, 405nm, Tetra- kinds of wavelength of 365nm, 248nm or it is therein one or more.But it is not may only have four groups, can according to demand, will be more Or less LED light source 10 is arranged with off-axis parabolic mirror 20 along optical axis direction, forms a greater variety of illumination lights Pupil is distributed.
The light beam integrates even light unit and uses even smooth integrating rod 40, and the even smooth integrating rod 40 is positioned at convergence microscope group 30 In image planes, the light beam relaying transfer unit is located at even smooth integrating rod using relaying microscope group 50, the object plane of the relaying microscope group 50 40 port of export.Specifically, four groups of LED light sources 10 and the shape on the pupil plane of lighting system of off-axis parabolic mirror 20 Into the quadrupole illuminating that can change coherence factor, litho machine depth of focus is lifted.Afterwards even light integration is converged to by converging microscope group 30 The arrival end of rod 40, the even smooth integrating rod 40 carry out even light to light beam, and Uniform Illumination is formed in even smooth 40 port of export of integrating rod Visual field, the relaying microscope group 50 amplify Uniform Illumination visual field, and the multi-wavelength met the requirements in relaying image planes formation uniformity Quadrupole illuminating visual field.
Preferably, as shown in fig. 6, by controlling LED light source 10 and radial direction of the off-axis parabolic mirror group 20 along optical axis It is mobile, then it can change the Energy distribution of illumination iris, change the coherence factor of quadrupole illuminating.
Specifically, the beam distribution that single group LED light source 10 is emitted with off-axis parabolic mirror 20 is as shown in figure 3,4 groups The light beam that LED light source 10 is emitted with off-axis parabolic mirror 20 is then as shown in figure 4, form quadrupole illuminating pattern.Light beam The pupil for the light beam being emitted after even smooth integrating rod 40 is distributed as shown in figure 5, foring quadrupole illuminating pattern.Specifically used mistake Cheng Zhong, according to demand, can optimize the focal length of convergence microscope group 30, the quadrupole illuminating coherence factor to be suited the requirements.If 4 groups The wavelength of LED light source 10 is different, you can by the light beam coupling of 4 groups of different wave lengths together, realizes the fusion of multi-wavelength.
Referring to Fig. 6, if controlling each group of LED light source 10 to be moved radially with off-axis parabolic mirror 20 along optical axis, The Energy distribution of illumination iris can be changed, change the coherence factor of quadrupole illuminating.Specifically, the coherence factor of quadrupole illuminating is changed Afterwards, the beam distribution that 4 groups of LED light sources 10 are emitted with off-axis parabolic mirror 20 is as shown in fig. 7, coherence factor further increases Greatly.Further, after the coherence factor for changing quadrupole illuminating, the pupil distribution for the light beam being emitted after even smooth integrating rod 40 As shown in figure 8, coherence factor further increases.
Obviously, those skilled in the art can carry out invention spirit of the various modification and variations without departing from the present invention And scope.If in this way, these modifications and changes of the present invention belong to the claims in the present invention and its equivalent technologies scope it Interior, then the present invention is also intended to including these modification and variations.

Claims (9)

  1. A kind of 1. lighting device, it is characterised in that including：LED light energy generating unit, the light beam integration set along optical propagation direction Even light unit and light beam relaying transfer unit；Wherein, the LED light energy generating unit includes multigroup LED light source component and convergence Microscope group, multigroup LED light source component is symmetrical along optical axis rotation, and LED light source component described in every group can be along the light Axial and radial moves, and the object plane of the convergence microscope group is located at the light extraction end of the LED light source component.
  2. 2. a kind of lighting device as claimed in claim 1, it is characterised in that the LED light source component includes LED light source and light Beam collimator part, the light beam that LED light source is sent project the convergence microscope group after beam collimation device collimation.
  3. 3. a kind of lighting device as claimed in claim 2, it is characterised in that the beam collimation device uses off axis paraboloid mirror Speculum, the LED light source are positioned over the focal position of off-axis parabolic mirror.
  4. 4. a kind of lighting device as claimed in claim 2, it is characterised in that the Electric dipole radiation of the LED light source is lambert Distribution.
  5. 5. a kind of lighting device as claimed in claim 2, it is characterised in that the LED light source is single source or LED light Source array.
  6. 6. a kind of lighting device as claimed in claim 1, it is characterised in that the light beam is integrated even light unit and accumulated using even light Divide rod, the even smooth integrating rod is in the image planes of the convergence microscope group.
  7. 7. a kind of lighting device as claimed in claim 6, it is characterised in that the light beam relaying transfer unit uses relay lens Group, the object plane of the relaying microscope group are located at the light-emitting surface of even smooth integrating rod.
  8. A kind of 8. lighting device as claimed in claim 1, it is characterised in that the light beam that multigroup LED light source component is sent Wavelength is identical or different.
  9. 9. a kind of lighting device as claimed in claim 1, it is characterised in that the LED light source component is provided with four groups, four groups The LED light source component is symmetrical along optical axis rotation.
CN201610932743.1A 2016-10-31 2016-10-31 Lighting device Active CN108020994B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610932743.1A CN108020994B (en) 2016-10-31 2016-10-31 Lighting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610932743.1A CN108020994B (en) 2016-10-31 2016-10-31 Lighting device

Publications (2)

Publication Number Publication Date
CN108020994A true CN108020994A (en) 2018-05-11
CN108020994B CN108020994B (en) 2020-01-24

Family

ID=62069793

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610932743.1A Active CN108020994B (en) 2016-10-31 2016-10-31 Lighting device

Country Status (1)

Country Link
CN (1) CN108020994B (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1879228A (en) * 2003-11-04 2006-12-13 3M创新有限公司 Side reflector for illumination using light emitting diode
KR20080099446A (en) * 2007-05-09 2008-11-13 주식회사 하이닉스반도체 Exposure apparatus for manufacturing semiconductor device
CN101551594A (en) * 2009-04-30 2009-10-07 中国科学院上海光学精密机械研究所 Detection system and method of lithography machine projection lens odd chromatic aberration based on two-stage illumination
CN102129173A (en) * 2010-01-12 2011-07-20 上海微电子装备有限公司 Photoetching machine projection objective lens wave aberration field measurement method
CN102298273A (en) * 2011-08-25 2011-12-28 中国科学院上海光学精密机械研究所 Aerial image sensor angle response measurement method based on two-pole illumination
CN102566294A (en) * 2010-12-28 2012-07-11 上海微电子装备有限公司 Photoetching lamp optical system
TW201237566A (en) * 2011-02-22 2012-09-16 Canon Kk Illumination optical system, exposure apparatus, and method of manufacturing device
CN104169800A (en) * 2012-03-14 2014-11-26 卡尔蔡司Smt有限责任公司 Illumination optical unit for a projection exposure apparatus

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1879228A (en) * 2003-11-04 2006-12-13 3M创新有限公司 Side reflector for illumination using light emitting diode
KR20080099446A (en) * 2007-05-09 2008-11-13 주식회사 하이닉스반도체 Exposure apparatus for manufacturing semiconductor device
CN101551594A (en) * 2009-04-30 2009-10-07 中国科学院上海光学精密机械研究所 Detection system and method of lithography machine projection lens odd chromatic aberration based on two-stage illumination
CN102129173A (en) * 2010-01-12 2011-07-20 上海微电子装备有限公司 Photoetching machine projection objective lens wave aberration field measurement method
CN102566294A (en) * 2010-12-28 2012-07-11 上海微电子装备有限公司 Photoetching lamp optical system
TW201237566A (en) * 2011-02-22 2012-09-16 Canon Kk Illumination optical system, exposure apparatus, and method of manufacturing device
CN102298273A (en) * 2011-08-25 2011-12-28 中国科学院上海光学精密机械研究所 Aerial image sensor angle response measurement method based on two-pole illumination
CN104169800A (en) * 2012-03-14 2014-11-26 卡尔蔡司Smt有限责任公司 Illumination optical unit for a projection exposure apparatus

Also Published As

Publication number Publication date
CN108020994B (en) 2020-01-24

Similar Documents

Publication Publication Date Title
CN108803244B (en) Illumination device and illumination method and photoetching machine
CN104460242B (en) A kind of extreme ultraviolet photolithographic illuminator based on free form surface formula diaphragm compound eye
CN101221281B (en) Full reflection projection optical system
CN105589302A (en) Ultraviolet light exposure system capable of emitting light in parallel and exposure machine
CN105974742B (en) Lamp optical system, exposure sources and the method for manufacturing article
CN102221785A (en) Photolithographic illumination device using mercury lamp light source
CN104483816B (en) A kind of class critical illumination system for extreme ultraviolet photolithographic
TW201109856A (en) Lithographic apparatus and method
CN107450274B (en) Lamp optical system and the lithographic equipment for using the lamp optical system
CN103105737B (en) Use the lithographic equipment of the multiple light courcess of splicing
CN105805609A (en) LED light source illuminating system
CN108050429A (en) A kind of multispectral light path light source illuminating apparatus altogether of LED
CN108020994A (en) A kind of lighting device
CN101586748A (en) Illuminating apparatus
JP2014195048A (en) Illumination optical system, exposure equipment, and method of manufacturing device
CN207674203U (en) A kind of multispectral light path light source illuminating apparatus altogether of LED
KR102182430B1 (en) Light source device and exposure apparatus including the same
CN102650410A (en) Stage follow spot lamp
TW201827933A (en) Free pupil illumination method and illumination system which obtains a desired energy distribution on a pupil plane by modulating the power of exit light of each LED light source of an LED array light source
WO2017092719A2 (en) Free pupil illumination method and illumination system
TW202036165A (en) LED lighting device and exposure machine capable of improving the productivity and yield of edge exposure, and saving the cost of spare parts
CN109240046A (en) A kind of direct write exposure machine LED illumination System
CN104834762A (en) COB type LED reflector design method
CN103163739A (en) Ultraviolet LED lighting device
KR20150122028A (en) UV exposuring apparatus with alignment

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant