TWI721433B - Light emitting device and exposing equipment having the same - Google Patents

Light emitting device and exposing equipment having the same Download PDF

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TWI721433B
TWI721433B TW108117752A TW108117752A TWI721433B TW I721433 B TWI721433 B TW I721433B TW 108117752 A TW108117752 A TW 108117752A TW 108117752 A TW108117752 A TW 108117752A TW I721433 B TWI721433 B TW I721433B
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light
light source
emitting device
concave mirror
reflective surface
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TW108117752A
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TW202043924A (en
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黃國政
林宇軒
周俊翰
林奕成
楊智仲
邱柏凱
鄭源傑
楊之逸
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財團法人國家實驗研究院
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Abstract

The light emitting device of the present invention includes a light homogenizer, a first concave mirror, and a light source module. The light homogenizer includes a light inlet end and a light outlet end. The first concave mirror is disposed in one side of the light homogenizer and has a first reflecting face facing the light inlet end. The light source module and the light homogenizer are disposed in the same side of the first concave mirror, wherein the light source module includes a plurality of light source devices. Each light source device includes a second concave mirror and a light source. The second concave mirror includes a second reflecting face facing the first reflecting face. The light source is disposed on the second reflecting face and emits a light source light. The light source light emitted to the second reflecting face is reflected to the first reflecting face by the second reflecting face, be reflected to the light inlet end by the first reflecting face, and enters the light homogenizer to be homogenized, wherein a homogenized light is emitted from the light outlet end.

Description

發光裝置以及具有此發光裝置的曝光設備Light-emitting device and exposure equipment with the light-emitting device

本發明係關於一種發光裝置以及具有此發光裝置的曝光設備。The present invention relates to a light-emitting device and exposure equipment with the light-emitting device.

目前於半導體產業中,大部分微影設備的光源都是高壓汞燈,因單一高壓汞燈即能產生相當高的輻射通量,並有相當狹窄的短波長頻寬,這些優點能夠提升微影成品的良率與降低光學系統設計的難度,但高壓汞燈較不節能、出光角度過大與頻譜過寬等問題,因此有許多人轉而開發LED的曝光微影設備,但LED本身有許多缺點需要被克服,例如:出光角度過大、單位面積發光效率不足與無法緊密排列等問題。At present, in the semiconductor industry, most of the light sources of lithography equipment are high-pressure mercury lamps. Because a single high-pressure mercury lamp can generate a relatively high radiant flux and has a relatively narrow short-wavelength bandwidth, these advantages can improve the lithography The yield rate of the finished product and the difficulty of optical system design are reduced. However, the high-pressure mercury lamp is less energy-saving, the angle of light is too large, and the spectrum is too wide. Therefore, many people turn to the development of LED exposure lithography equipment, but the LED itself has many disadvantages Need to be overcome, such as: excessive light angle, insufficient luminous efficiency per unit area, and inability to arrange closely.

本發明的目的在於提供一種發光裝置,可供曝光設備使用,具有節能、高耦合效率、可自由調控出光角度、多頻譜同時傳遞等優點。The purpose of the present invention is to provide a light-emitting device, which can be used by exposure equipment, and has the advantages of energy saving, high coupling efficiency, free control of light emission angle, simultaneous transmission of multiple spectrums, and the like.

本發明的另一目的在於提供一種曝光設備,具有節能、高耦合效率、可自由調控出光角度、多頻譜同時傳遞等優點。Another object of the present invention is to provide an exposure equipment that has the advantages of energy saving, high coupling efficiency, free control of the light exit angle, and simultaneous transmission of multiple spectrums.

本發明之發光裝置包含光場勻化元件、第一凹面鏡、以及光源模組。光場勻化元件具有入光端以及出光端。第一凹面鏡設置於光場勻化元件的一側,具有第一反射面朝向入光端。光源模組與光場勻化元件設置於第一凹面鏡的同一側,包含複數個光源裝置。每一光源裝置包含第二凹面鏡以及光源。第二凹面鏡具有朝向第一反射面之第二反射面。光源設置於第二反射面上,發出光源光線。其中,射至第二反射面之光源光線,經由第二反射面反射至第一反射面,再經由第一反射面反射至入光端,進入光場勻化元件中進行勻化,而後出光端射出勻化光線。The light-emitting device of the present invention includes a light field homogenization element, a first concave mirror, and a light source module. The light field homogenization element has a light input end and a light output end. The first concave mirror is arranged on one side of the light field homogenization element, and has a first reflective surface facing the light incident end. The light source module and the light field homogenization element are arranged on the same side of the first concave mirror and include a plurality of light source devices. Each light source device includes a second concave mirror and a light source. The second concave mirror has a second reflective surface facing the first reflective surface. The light source is arranged on the second reflecting surface and emits light from the light source. Wherein, the light from the light source that hits the second reflective surface is reflected to the first reflective surface via the second reflective surface, and then reflected to the light entrance end via the first reflective surface, enters the light field homogenization element for homogenization, and then exits the light end Emit a homogenized light.

在本發明的實施例中,發光裝置進一步包含光路徑改變裝置設置在第一凹面鏡及光源模組之間,其中射至第二反射面之光源光線,經由第二反射面反射並通過光路徑改變裝置,經由光路徑改變裝置改變光路徑以射至第一反射面。In an embodiment of the present invention, the light emitting device further includes a light path changing device arranged between the first concave mirror and the light source module, wherein the light from the light source that hits the second reflecting surface is reflected by the second reflecting surface and changes through the light path. The device changes the light path through the light path changing device so as to reach the first reflecting surface.

在本發明的實施例中,光路徑改變裝置包含複數個數目與複數個光源裝置相同之光學元件。In an embodiment of the present invention, the light path changing device includes a plurality of optical elements with the same number as the plurality of light source devices.

在本發明的實施例中,複數個光學元件位於同一平面。In the embodiment of the present invention, a plurality of optical elements are located on the same plane.

在本發明的實施例中,光學元件包含凸透鏡。In an embodiment of the present invention, the optical element includes a convex lens.

在本發明的實施例中,光學元件包含透鏡陣列。In an embodiment of the present invention, the optical element includes a lens array.

在本發明的實施例中,複數個光源裝置環繞光場勻化元件。In the embodiment of the present invention, a plurality of light source devices surround the light field homogenization element.

在本發明的實施例中,光源模組進一步包含環形基板,複數個光源裝置平均設置於環形基板之一側。In an embodiment of the present invention, the light source module further includes a ring-shaped substrate, and a plurality of light source devices are evenly arranged on one side of the ring-shaped substrate.

在本發明的實施例中,本發明的曝光設備包含上述發光裝置以及光線調整裝置。光線調整裝置設置於出光端外側,供調整勻化光線滿足曝光需求。In an embodiment of the present invention, the exposure equipment of the present invention includes the above-mentioned light emitting device and a light adjusting device. The light adjusting device is arranged on the outer side of the light emitting end to adjust the homogenized light to meet the exposure demand.

在本發明的實施例中,曝光設備進一步包含具有被曝光面之曝光平台,其中曝光需求為勻化光線在被曝光面上之均勻性偏差值小於±3%。In an embodiment of the present invention, the exposure device further includes an exposure platform having an exposed surface, wherein the exposure requirement is that the uniformity deviation of the homogenized light on the exposed surface is less than ±3%.

如圖1A及1B所示的實施例,本發明之發光裝置900包含光場勻化元件100、第一凹面鏡200、以及光源模組300。光場勻化元件100具有入光端110以及出光端120。其中,光場勻化元件100包含例如擴散元件或光纖等,功用在於將由入光端110進入的光線勻化後由出光端120射出。在較佳實施例中,光場勻化元件100為圓柱形元件,光線由入光端110進入勻化,並於出光端120射出。進一步而言,在較佳實施例中,出光端120形成面光源。然而在不同實施例中,光場勻化元件100也可以是方形或其他幾何形狀。As shown in the embodiment shown in FIGS. 1A and 1B, the light-emitting device 900 of the present invention includes a light field homogenization element 100, a first concave mirror 200, and a light source module 300. The light field homogenization element 100 has a light input end 110 and a light output end 120. Among them, the light field homogenization element 100 includes, for example, a diffusion element or an optical fiber, etc., and its function is to homogenize the light entering from the light input end 110 and then emit it from the light output end 120. In a preferred embodiment, the light field homogenization element 100 is a cylindrical element, and the light enters the homogenization end 110 from the light entrance end 110 and exits the light exit end 120. Furthermore, in a preferred embodiment, the light emitting end 120 forms a surface light source. However, in different embodiments, the light field homogenization element 100 may also have a square shape or other geometric shapes.

如圖1A及1B所示的實施例,第一凹面鏡200設置於光場勻化元件100的一側,具有第一反射面210朝向入光端110。換言之,第一凹面鏡200之凹面部分具有反射效果,且朝向入光端110。第一凹面鏡210之功用在於將射至第一反射面210的光線反射至入光端110。以較佳實施例而言,入光端110位於第一凹面鏡200的焦點,沿平行於第一凹面鏡200之中軸201之方向射入的光線會被第一反射面210反射至入光端110。As shown in the embodiment shown in FIGS. 1A and 1B, the first concave mirror 200 is disposed on one side of the light field homogenization element 100 and has a first reflective surface 210 facing the light incident end 110. In other words, the concave portion of the first concave mirror 200 has a reflection effect and faces the light incident end 110. The function of the first concave mirror 210 is to reflect the light incident on the first reflective surface 210 to the light incident end 110. In a preferred embodiment, the light incident end 110 is located at the focal point of the first concave mirror 200, and light incident in a direction parallel to the central axis 201 of the first concave mirror 200 will be reflected by the first reflecting surface 210 to the light incident end 110.

如圖1A及1B所示的實施例,光源模組300與光場勻化元件100設置於第一凹面鏡200的同一側。以不同角度觀之,第一反射面210同時朝向光源模組300及光場勻化元件100。光源模組300包含複數個光源裝置310。每一光源裝置310包含第二凹面鏡311以及光源312。第二凹面鏡311具有朝向第一反射面210之第二反射面313。光源312設置於第二反射面313上,發出光源光線。其中,光源312較佳設置於第二凹面鏡311之焦點,藉以使其發出之光源光線經第二反射面313反射後,沿平行於第二凹面鏡311之中軸314之方向前進。其中,第二凹面鏡311之中軸314較佳平行於第一凹面鏡200之中軸201。As shown in the embodiment shown in FIGS. 1A and 1B, the light source module 300 and the light field homogenization element 100 are arranged on the same side of the first concave mirror 200. Viewed from different angles, the first reflective surface 210 faces the light source module 300 and the light field homogenization element 100 at the same time. The light source module 300 includes a plurality of light source devices 310. Each light source device 310 includes a second concave mirror 311 and a light source 312. The second concave mirror 311 has a second reflective surface 313 facing the first reflective surface 210. The light source 312 is disposed on the second reflecting surface 313 and emits light from the light source. Wherein, the light source 312 is preferably arranged at the focal point of the second concave mirror 311, so that the light emitted from the light source is reflected by the second reflective surface 313 and then travels in a direction parallel to the middle axis 314 of the second concave mirror 311. The center axis 314 of the second concave mirror 311 is preferably parallel to the center axis 201 of the first concave mirror 200.

以較佳實施例而言,複數個光源裝置310環繞光場勻化元件100。其中,光源模組300進一步包含環形基板320,複數個光源裝置310平均設置於環形基板320之一側。光源312較佳為發光二極體(Light-emitting diode, LED)可達到節能的效果,環形基板320為環形的電路板。然而在不同實施例中,根據製造、設計或使用需求,光源312可使用LED以外的發光源,環形基板320可為其他形狀。In a preferred embodiment, a plurality of light source devices 310 surround the light field homogenization element 100. The light source module 300 further includes a ring-shaped substrate 320, and a plurality of light source devices 310 are evenly arranged on one side of the ring-shaped substrate 320. The light source 312 is preferably a light-emitting diode (LED) to achieve energy saving effect, and the ring-shaped substrate 320 is a ring-shaped circuit board. However, in different embodiments, the light source 312 may use a light source other than LEDs, and the ring substrate 320 may have other shapes according to manufacturing, design, or use requirements.

如圖1C所示的實施例,光源312發出之光源光線410射至第二反射面313(參見圖1B)後,經第二反射面313反射,沿平行於第二凹面鏡311之中軸314之方向前進至第一反射面210,再經由第一反射面210反射至入光端110,進入光場勻化元件100中進行勻化,而後出光端120射出勻化光線420。As shown in the embodiment shown in FIG. 1C, the light source light 410 emitted by the light source 312 hits the second reflecting surface 313 (see FIG. 1B), and is reflected by the second reflecting surface 313 along a direction parallel to the middle axis 314 of the second concave mirror 311 Proceed to the first reflecting surface 210, and then reflected to the light entrance end 110 via the first reflecting surface 210, enter the light field homogenization element 100 for homogenization, and then the light exit end 120 emits homogenized light 420.

如圖2A及2B所示的實施例,發光裝置900進一步包含光路徑改變裝置500設置在第一凹面鏡200及光源模組300之間,其中射至第二反射面313之光源光線410,經由第二反射面313反射並通過光路徑改變裝置500,經由光路徑改變裝置500改變光路徑以射至第一反射面210。如圖2C所示,以較佳實施例而言,光源光線410通過光路徑改變裝置500後,其光路徑被光路徑改變裝置500改變為平行於第一凹面鏡200之中軸201。換言之,對於光源312未設置於第二凹面鏡311之焦點,導致發出之光源光線410實質上相對於第二凹面鏡311之中軸314為發散之實施例,可透過光路徑改變裝置500將光源光線410之光路徑改變為平行於第一凹面鏡200之中軸201,從而提高其到達入光端110的可能。2A and 2B shown in the embodiment, the light emitting device 900 further includes a light path changing device 500 disposed between the first concave mirror 200 and the light source module 300, wherein the light source light 410 incident on the second reflective surface 313 passes through the first concave mirror 200 and the light source module 300. The two reflective surfaces 313 reflect and pass through the light path changing device 500, and the light path is changed through the light path changing device 500 to be emitted to the first reflective surface 210. As shown in FIG. 2C, in a preferred embodiment, after the light source light 410 passes through the light path changing device 500, its light path is changed by the light path changing device 500 to be parallel to the center axis 201 of the first concave mirror 200. In other words, for the embodiment in which the light source 312 is not set at the focal point of the second concave mirror 311, the emitted light source light 410 is substantially divergent with respect to the center axis 314 of the second concave mirror 311, the light source light 410 can be transmitted through the light path changing device 500 The light path is changed to be parallel to the middle axis 201 of the first concave mirror 200, thereby increasing the possibility of reaching the light incident end 110.

如圖2A及2B所示的實施例,光路徑改變裝置500較佳包含數目與光源裝置310相同之光學元件510。光學元件510較佳位於同一平面。在此實施例中,光學元件510為凸透鏡,然而在不同實施例中,光學元件510可為例如透鏡陣列等具有光聚集效果的元件。As shown in the embodiment shown in FIGS. 2A and 2B, the light path changing device 500 preferably includes the same number of optical elements 510 as the light source device 310. The optical elements 510 are preferably located on the same plane. In this embodiment, the optical element 510 is a convex lens. However, in different embodiments, the optical element 510 may be an element having a light-gathering effect such as a lens array.

進一步而言,光源模組300包含複數個光源裝置310,而個別光源裝置310所出射之光束可藉由第二凹面鏡311來控制其出光角度與行進方向,第一凹面鏡200則可將自第二凹面鏡311出射之光束高效率耦合進入光場勻化元件100中,從而產生均勻面光源。其中,光源模組300可基於製造、使用或設計需求而有不同設置。如圖3所示的不同實施例,光源裝置310之設置數量可減少為三個。又例如,光源裝置310之輸出功率可個別調整,透過相互補償之方式使最終端輸出光場具有高均勻度之效能。另一方面,第一凹面鏡200及第二凹面鏡311兩組曲面反射鏡之使用,可提升光源耦合效率與導引光束方向來優化設備空間。例如,為了增加出光端之光線強度而增加光源裝置310之數量時,第一凹面鏡200之面積可對應加大以充分反射光源裝置310發出之光線。基於上述,發光裝置具有節能、高耦合效率、可自由調控出光角度、多頻譜同時傳遞等優點。Furthermore, the light source module 300 includes a plurality of light source devices 310, and the light beam emitted by the individual light source device 310 can be controlled by the second concave mirror 311 to control its light output angle and traveling direction, and the first concave mirror 200 can separate the light beam from the second concave mirror 311. The light beam emitted from the concave mirror 311 is efficiently coupled into the light field homogenization element 100, thereby generating a uniform surface light source. Among them, the light source module 300 can have different settings based on manufacturing, use, or design requirements. As shown in the different embodiments shown in FIG. 3, the number of light source devices 310 can be reduced to three. For another example, the output power of the light source device 310 can be adjusted individually, so that the final output light field has a high uniformity performance through mutual compensation. On the other hand, the use of two sets of curved mirrors of the first concave mirror 200 and the second concave mirror 311 can improve the coupling efficiency of the light source and guide the beam direction to optimize the equipment space. For example, when the number of light source devices 310 is increased in order to increase the light intensity of the light emitting end, the area of the first concave mirror 200 can be correspondingly enlarged to fully reflect the light emitted by the light source device 310. Based on the above, the light-emitting device has the advantages of energy saving, high coupling efficiency, free control of the light output angle, and simultaneous transmission of multiple spectrums.

如圖4所示的實施例,本發明的曝光設備800包含發光裝置900以及光線調整裝置600。光線調整裝置600設置於出光端120外側,供調整勻化光線滿足曝光需求。其中,曝光設備800進一步包含具有被曝光面710之曝光平台700,其中曝光需求為勻化光線在被曝光面710上之均勻性偏差值小於±3%。更具體而言,光線調整裝置600可包含反射鏡和透鏡,由出光端120射出之勻化光線可藉由光線調整裝置600調整行進方向並聚焦在被曝光面710上供曝光使用。As shown in the embodiment shown in FIG. 4, the exposure equipment 800 of the present invention includes a light emitting device 900 and a light adjusting device 600. The light adjusting device 600 is arranged outside the light emitting end 120 for adjusting the homogenized light to meet the exposure requirements. Wherein, the exposure device 800 further includes an exposure platform 700 having an exposed surface 710, wherein the exposure requirement is that the uniformity deviation of the homogenized light on the exposed surface 710 is less than ±3%. More specifically, the light adjusting device 600 may include a mirror and a lens, and the homogenized light emitted from the light emitting end 120 can be adjusted in the traveling direction by the light adjusting device 600 and focused on the exposed surface 710 for exposure.

雖然前述的描述及圖式已揭示本發明之較佳實施例,必須瞭解到各種增添、許多修改和取代可能使用於本發明較佳實施例,而不會脫離如所附申請專利範圍所界定的本發明原理之精神及範圍。熟悉本發明所屬技術領域之一般技藝者將可體會,本發明可使用於許多形式、結構、佈置、比例、材料、元件和組件的修改。因此,本文於此所揭示的實施例應被視為用以說明本發明,而非用以限制本發明。本發明的範圍應由後附申請專利範圍所界定,並涵蓋其合法均等物,並不限於先前的描述。Although the foregoing description and drawings have disclosed the preferred embodiment of the present invention, it must be understood that various additions, many modifications and substitutions may be used in the preferred embodiment of the present invention without departing from the scope of the attached patent application. The spirit and scope of the principles of the present invention. Those skilled in the art to which the present invention belongs will be able to appreciate that the present invention can be used for many modifications of forms, structures, arrangements, proportions, materials, elements and components. Therefore, the embodiments disclosed herein should be considered to illustrate the present invention, rather than to limit the present invention. The scope of the present invention should be defined by the scope of the attached patent application, and cover its legal equivalents, and is not limited to the previous description.

100:光場勻化元件 110:入光端 120:出光端 200:第一凹面鏡 201:第一凹面鏡之中軸 210:第一反射面 300:光源模組 310:光源裝置 311:第二凹面鏡 312:光源 313:第二反射面 314:第二凹面鏡之中軸 320:環形基板 410:光源光線 420:勻化光線 500:光路徑改變裝置 510:光學元件 600:光線調整裝置 610:反射鏡 611:透鏡 700:曝光平台 800:曝光設備 900:發光裝置100: Light field homogenization element 110: light end 120: light end 200: The first concave mirror 201: The middle axis of the first concave mirror 210: first reflecting surface 300: light source module 310: Light source device 311: The second concave mirror 312: light source 313: second reflective surface 314: The middle axis of the second concave mirror 320: Ring substrate 410: light source light 420: Homogenize the light 500: Light path changing device 510: optical components 600: light adjustment device 610: Mirror 611: lens 700: Exposure Platform 800: Exposure equipment 900: Light-emitting device

圖1A至1C為本發明發光裝置的實施例示意圖。1A to 1C are schematic diagrams of embodiments of the light-emitting device of the present invention.

圖2A至2C為本發明發光裝置包含光路徑改變裝置的實施例示意圖。2A to 2C are schematic diagrams of embodiments of the light-emitting device of the present invention including the light path changing device.

圖3為本發明發光裝置的不同實施例示意圖。Fig. 3 is a schematic diagram of different embodiments of the light-emitting device of the present invention.

圖4為本發明曝光設備的實施例示意圖。Fig. 4 is a schematic diagram of an embodiment of the exposure equipment of the present invention.

(無)(no)

100:光場勻化元件 100: Light field homogenization element

110:入光端 110: light end

120:出光端 120: light end

200:第一凹面鏡 200: The first concave mirror

210:第一反射面 210: first reflecting surface

300:光源模組 300: light source module

310:光源裝置 310: Light source device

311:第二凹面鏡 311: The second concave mirror

312:光源 312: light source

313:第二反射面 313: second reflecting surface

320:環形基板 320: Ring substrate

500:光路徑改變裝置 500: Light path changing device

510:光學元件 510: optical components

900:發光裝置 900: Light-emitting device

Claims (10)

一種發光裝置,包含: 一光場勻化元件,具有一入光端以及一出光端; 一第一凹面鏡,設置於該光場勻化元件一側,具有一第一反射面朝向該入光端; 一光源模組,與該光場勻化元件設置於該第一凹面鏡的同一側,包含複數個光源裝置,每一光源裝置包含: 一第二凹面鏡,具有一朝向該第一反射面之第二反射面; 一光源,設置於該第二反射面上,發出一光源光線; 其中,射至該第二反射面之該光源光線,經由該第二反射面反射至該第一反射面,再經由該第一反射面反射至該入光端,進入該光場勻化元件中進行勻化,而後該出光端射出一勻化光線。A light emitting device, comprising: A light field homogenization element with a light input end and a light output end; A first concave mirror, arranged on one side of the light field homogenization element, with a first reflecting surface facing the light incident end; A light source module, which is arranged on the same side of the first concave mirror as the light field homogenization element, includes a plurality of light source devices, and each light source device includes: A second concave mirror having a second reflecting surface facing the first reflecting surface; A light source, which is arranged on the second reflecting surface and emits light from a light source; Wherein, the light from the light source irradiated to the second reflective surface is reflected to the first reflective surface via the second reflective surface, and then reflected to the light incident end via the first reflective surface, and enters the light field homogenization element Homogenization is performed, and then a homogenized light is emitted from the light-emitting end. 如請求項1所述的發光裝置,進一步包含一光路徑改變裝置設置在該第一凹面鏡及該光源模組之間,其中射至該第二反射面之該光源光線,經由該第二反射面反射並通過該光路徑改變裝置,經由該光路徑改變裝置改變光路徑以射至該第一反射面。The light-emitting device according to claim 1, further comprising a light path changing device provided between the first concave mirror and the light source module, wherein the light from the light source irradiated to the second reflective surface passes through the second reflective surface Reflect and pass through the light path changing device, and change the light path through the light path changing device to reach the first reflecting surface. 如請求項2所述的發光裝置,其中該光路徑改變裝置包含複數個數目與該複數個光源裝置相同之光學元件。The light emitting device according to claim 2, wherein the light path changing device includes a plurality of optical elements the same number as the plurality of light source devices. 如請求項3所述的發光裝置,其中該複數個光學元件位於同一平面。The light-emitting device according to claim 3, wherein the plurality of optical elements are located on the same plane. 如請求項3所述的發光裝置,其中該光學元件包含凸透鏡。The light-emitting device according to claim 3, wherein the optical element includes a convex lens. 如請求項3所述的發光裝置,其中該光學元件包含透鏡陣列。The light-emitting device according to claim 3, wherein the optical element includes a lens array. 如請求項1所述的發光裝置,其中該複數個光源裝置環繞該光場勻化元件。The light emitting device according to claim 1, wherein the plurality of light source devices surround the light field homogenization element. 如請求項7所述的發光裝置,其中該光源模組進一步包含一環形基板,該複數個光源裝置平均設置於該環形基板之一側。The light-emitting device according to claim 7, wherein the light source module further includes a ring-shaped substrate, and the plurality of light source devices are evenly arranged on one side of the ring-shaped substrate. 一種曝光設備,包含: 如請求項1至8任一項所述的發光裝置; 一光線調整裝置,設置於該出光端外側,供調整該勻化光線滿足一曝光需求。An exposure equipment, including: The light-emitting device according to any one of claims 1 to 8; A light adjusting device is arranged outside the light emitting end for adjusting the homogenized light to meet an exposure requirement. 如請求項9所述的曝光設備,進一步包含一具有一被曝光面之曝光平台,其中該曝光需求為該勻化光線在該被曝光面上之均勻性偏差值小於±3%。The exposure equipment according to claim 9, further comprising an exposure platform having an exposed surface, wherein the exposure requirement is that the uniformity deviation of the homogenized light on the exposed surface is less than ±3%.
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Publication number Priority date Publication date Assignee Title
CN108803244A (en) * 2017-04-27 2018-11-13 上海微电子装备(集团)股份有限公司 Lighting device and means of illumination and a kind of litho machine

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108803244A (en) * 2017-04-27 2018-11-13 上海微电子装备(集团)股份有限公司 Lighting device and means of illumination and a kind of litho machine

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