CN100559277C - A kind of lithography illuminating system - Google Patents
A kind of lithography illuminating system Download PDFInfo
- Publication number
- CN100559277C CN100559277C CNB200610117989XA CN200610117989A CN100559277C CN 100559277 C CN100559277 C CN 100559277C CN B200610117989X A CNB200610117989X A CN B200610117989XA CN 200610117989 A CN200610117989 A CN 200610117989A CN 100559277 C CN100559277 C CN 100559277C
- Authority
- CN
- China
- Prior art keywords
- microlens array
- illuminating system
- plane
- lithography
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Lithography illuminating system provided by the invention relates to the illuminator that is used for the semiconductor lithography machine.Described lithography illuminating system comprises successively: light source is used to produce illuminating bundle; The pupil Shaping Module receives the illuminating bundle that light source produces, and is formed with the illuminating bundle of specific sectional shape; The microlens array module receives the illuminating bundle from the pupil Shaping Module, and forms the illuminating bundle with the trapezoidal light distribution of one dimension; And condenser, receive illuminating bundle, and the illuminating bundle after will assembling projects on the illuminated field from the microlens array module; Wherein, the microlens array module comprises at least two microlens arrays and two pairs of edge of a knife arrays.Lithography illuminating system of the present invention is simple in structure, transmitance is high, can produce the trapezoidal light distribution illuminated field of one dimension that adjustable size saved and satisfied heart requirement far away.Lithography illuminating system of the present invention can be used on the litho machine of 248nm, 193nm or other wavelength.
Description
Technical field
The invention belongs to the micro-lithography field, relate to the illuminator that is used for the semiconductor lithography machine, particularly a kind of lithography illuminating system that contains the astigmatism lenticular lens elements.
Background technology
Photoetching process (also claiming the micro-lithography method) is used for producing the semiconductor devices.Photoetching process is used the light of various wavelength, as ultraviolet (UV), dark UV, visible light etc., produces meticulous pattern in semiconductor device design.Many kinds of semiconductor devices can both be used the photoetching technique manufacturing, as diode, triode and integrated circuit.
In process for fabrication of semiconductor device, in order to reach the requirement of litho machine dosage control, usually need the illuminated field of the trapezoidal light distribution of illuminator formation one dimension of scanning photoetching machine, also need to change the size of illuminated field to adapt to different process conditions and semiconductor wafer sizes.Fig. 1 has shown the trapezoidal light distribution illuminated field 10 of typical one dimension, and it has even light distribution 11 on one dimension (x) direction, has trapezoidal light distribution 12 on another dimension (y) direction of quadrature with it.
Fig. 2 has shown the method for the trapezoidal light distribution illuminated field of generation one dimension that generally uses at present.At first, produce an even illuminated field 20,, make illuminated field weaken gradually, and on the out of focus face, place the edge of a knife 21,22 by mediad edge light intensity then with even illuminated field 20 out of focus.On the xz plane, the edge of a knife 21 is in the light at the out of focus face, because the light at edge is blocked, makes illuminated field have even light distribution on the x direction; On the yz plane, the edge of a knife 22 is not in the light, and has therefore caused illuminated field to have trapezoidal light distribution on the y direction by out of focus, thereby has obtained required trapezoidal light distribution illuminated field.One big shortcoming of this method is that the edge of a knife 21,22 is in the light and can causes optical energy loss, also can reduce the transmitance of system simultaneously.
Except above-mentioned out of focus method, SVG company has disclosed a kind of lithography illuminating system that produces the trapezoidal light distribution illuminated field of one dimension in U.S. Pat 5631721.Shown in Fig. 3 (a), this illuminator comprises: light source 31, beam adjuster 32, many focuses array element 33, condenser 34,35, two edges of a knife of array optical element 36,37, astigmatism relay lens 38, and mask 39.Expanded bundle behind the light process beam adjuster 32 that light source 31 sends, the too much focus array element 33 of warp forms a plurality of secondary souces again.Array optical element 35 after utilizing condenser 34 and being positioned at condenser 34 can project secondary souce on 36 planes equably.The array optical element 35 here can be a diffraction optical element, also can be microlens array, and its effect is the beam angle distribution that is used for changing emergent light, promptly changes the light illumination mode of illuminator.
Fig. 3 (b) is the detailed structure of Fig. 3 (a) illuminator latter half, and in this illuminator, astigmatism relay lens 38 comprises two cylindrical lens (not shown)s, therefore, has 36 and 37 two planes with illuminated field 39 conjugation.Wherein 36 planes are in x direction and illuminated field 39 conjugation, and 37 planes are in y direction and illuminated field 39 conjugation.Because from the even illumination of light beam 36 planes of array optical element 35 outgoing, therefore 36 planes have even light distribution, 37 planes have trapezoidal light distribution (because relative 36 plane spaces in 37 planes separate).Like this, on the image planes 39 of astigmatism relay lens 38, obtained the trapezoidal light distribution of one dimension.
One big shortcoming of said lighting system is to use relay lens 38 could obtain the trapezoidal light distribution illuminated field 39 of big or small continuously adjustable one dimension, and the use of relay lens 38 has reduced the transmitance of illuminator, has increased the complicacy of system architecture.
In addition, in the photoetching making of semiconductor devices, also require illuminator to have variable light illumination mode, to satisfy different photoetching demands; Partial coherence with continuous variable makes the external diameter of illuminator pupil and internal diameter size adjustable continuously; And has an illuminated field that satisfies heart requirement far away.For this reason, press for a kind of simple in structure, transmitance is high, and can meet the lithography illuminating system of above-mentioned various performance requirements.
Summary of the invention
The object of the present invention is to provide a kind of lithography illuminating system, its optical texture is simple, system's transmitance height, can not only produce the trapezoidal light distribution illuminated field of one dimension that adjustable size saved and satisfied heart requirement far away, and multiple light illumination mode can be provided, simultaneously, the partial coherence that has continuous variable.
The object of the present invention is achieved like this: a kind of lithography illuminating system, its substantive distinguishing features are that described lithography illuminating system comprises successively: light source is used to produce illuminating bundle; The pupil Shaping Module receives the illuminating bundle that described light source produces, and forms the illuminating bundle with specific sectional shape; The microlens array module receives the illuminating bundle from described pupil Shaping Module, and forms the illuminating bundle with the trapezoidal light distribution of one dimension; And condenser, receive illuminating bundle, and the illuminating bundle after will assembling projects on the illuminated field from described microlens array module; Wherein, described microlens array module comprises at least two microlens arrays and two pairs of edge of a knife arrays.
In above-mentioned lithography illuminating system, the wavelength of the illuminating bundle that described light source produces is 248nm, 193nm, 157nm or 126nm.
In above-mentioned lithography illuminating system, described pupil Shaping Module is an aperture diaphragm.
In above-mentioned lithography illuminating system, described pupil Shaping Module also comprises the mixed light element.
In above-mentioned lithography illuminating system, described pupil Shaping Module comprises: beam expander, mixed light element and diaphragm.
In above-mentioned lithography illuminating system, described specific sectional shape is circle, annular, bipolar or four utmost point shapes.
In above-mentioned lithography illuminating system, described at least two microlens arrays all have two-dimentional microtrabeculae face structure.
In above-mentioned lithography illuminating system, in described at least two microlens arrays, comprise an astigmatism microlens array and a heart adjusting microlens array far away, described astigmatism microlens array does not overlap in the aperture diaphragm position on xz plane and yz plane, and the described heart far away is regulated microlens array and made the outgoing beam heart far away.
In above-mentioned lithography illuminating system, described two pairs of edge of a knife arrays lay respectively on the aperture diaphragm face on described astigmatism microlens array xz plane and yz plane.
In above-mentioned lithography illuminating system, the front focal plane that the described heart far away is regulated microlens array overlaps with the aperture diaphragm on described astigmatism microlens array xz plane or yz plane, promptly overlaps with one of two pairs of edge of a knife arrays.
In above-mentioned lithography illuminating system, every pair of edge of a knife array is made up of two edge of a knife array boards, and every edge of a knife array board has the identical logical light pattern of several sizes.
In above-mentioned lithography illuminating system, the logical light pattern of described two pairs of edge of a knife arrays is mutually orthogonal, by changing the relative position of two edge of a knife array boards in every pair of edge of a knife array, can control the size of x direction and y directional lighting field respectively.
In above-mentioned lithography illuminating system, the front focal plane of described condenser overlaps with the back focal plane that the described heart far away is regulated microlens array.
In above-mentioned lithography illuminating system, the position that the front focal plane of described condenser and the described heart far away are regulated microlens array overlaps or in its vicinity.
In above-mentioned lithography illuminating system, described illuminated field is the rectangular field with the trapezoidal light distribution of one dimension, and it has even light distribution on the one dimension direction, has trapezoidal light distribution on another dimension direction of quadrature with it.
Another program of the present invention provides a kind of lithography illuminating system, and its substantive distinguishing features is that described lithography illuminating system comprises successively: light source is used to produce illuminating bundle; The pupil Shaping Module receives the illuminating bundle that described light source produces, and forms the illuminating bundle with specific sectional shape; Astigmatism lenticule unit receives the illuminating bundle from described pupil Shaping Module, and makes illuminating bundle produce specific astigmatism; Two pairs of edge of a knife arrays; The heart far away is regulated microlens array, makes the outgoing beam heart far away; And condenser, receive from the light beam of described microlens array and project on the illuminated field.
In above-mentioned lithography illuminating system, described astigmatism lenticule unit comprises a thick lens array, and its former and later two surfaces all have two-dimentional microtrabeculae face structure.
In above-mentioned lithography illuminating system, the front surface of described thick lens array is divided into a plurality of secondary souces with incident beam, and makes incident beam in the inner convergence of described thick lens array, and the back focal plane of the front surface of described thick lens array is the object plane of rear surface.
In above-mentioned lithography illuminating system, the rear surface of described thick lens array has the astigmatism function, and its aperture diaphragm position on xz plane and yz plane does not overlap.
In above-mentioned lithography illuminating system, described astigmatism lenticule unit comprises two microlens arrays, order according to light process successively, above-mentioned two microlens arrays are respectively first microlens array and second microlens array, and above-mentioned two microlens arrays all have two-dimentional microtrabeculae face structure.
In above-mentioned lithography illuminating system, order according to light process successively, the back focal plane of first microlens array overlaps with the object plane of second microlens array, and second microlens array has the astigmatism function, and its aperture diaphragm position on xz plane and yz plane does not overlap.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
1. lithography illuminating system of the present invention has adopted the microlens array module with astigmatism lenticular lens elements, need not to be in the light and to obtain the illuminated field of the trapezoidal light distribution of one dimension by the edge of a knife, the energy loss of having avoided the edge of a knife to be in the light and to cause has improved the transmitance of illuminator greatly.
2. the present invention makes the present invention no longer need to adopt relay lens, thereby has simplified the structure of illuminator by edge of a knife array is placed the microlens array inside modules, has reduced manufacturing cost.
3. the present invention has adopted special edge of a knife array design, regulates clear aperature by the relative motion of two edge of a knife array boards in every pair of edge of a knife array, thereby changes the size of illuminated field.Very little distance just can obviously change the size of illuminated field because edge of a knife array board only need relatively move, and therefore, can reduce the movement velocity of the edge of a knife, thereby improves the stability of system works, has also reduced the difficulty of edge of a knife motion design.
4. the present invention regulates lenticule by the heart far away is set in the microlens array module, makes the chief ray of outgoing beam be parallel to optical axis, has guaranteed to incide the disposition far away of illuminated field light.
5. pupil apparatus for shaping of the present invention has adopted elements such as diffraction optics module and axicon, makes lithography illuminating system conversion to go out multiple light illumination mode, and has continuously adjustable illumination coherence, thereby satisfy different photoetching demands.
Description of drawings
The concrete structure of lithography illuminating system of the present invention is provided by following embodiment and accompanying drawing.
Fig. 1 is the light intensity synoptic diagram of the trapezoidal light distribution illuminated field of one dimension;
Fig. 2 is for obtaining the synoptic diagram of the trapezoidal light distribution illuminated field of one dimension in the prior art by out of focus, the method that is in the light;
Fig. 3 is used to obtain the structure and the light distribution synoptic diagram of the lithography illuminating system of the trapezoidal light distribution illuminated field of one dimension for SVG company;
Fig. 4 is the structured flowchart of lithography illuminating system of the present invention;
Fig. 5 is the structure and the light path synoptic diagram of the microlens array module of one embodiment of the invention;
Fig. 6 (a)-(d) has provided several typical implementation of microlens array module;
Fig. 7 is the adoptable two-dimentional microtrabeculae face structural representation of microlens array of the present invention;
Fig. 8 is the structural representation of edge of a knife array;
Fig. 9 is the concrete structure synoptic diagram of the lithography illuminating system of another embodiment of the present invention.
Embodiment
Below will be described in further detail lithography illuminating system of the present invention, hereinafter alleged " axially " all represented the direction along optical axis.
As shown in Figure 4, lithography illuminating system of the present invention comprises from the object side to image side successively: light source 100, be used to produce the illuminating bundle of specific wavelength, as: 248nm, 193nm, 157nm, 126nm etc.; Pupil Shaping Module 200 receives the illuminating bundle from light source 100, forms the illuminating bundle with specific sectional shape; Microlens array module 300 receives the illuminating bundle from pupil Shaping Module 200, and forms the illuminating bundle with the trapezoidal light distribution of one dimension; And condenser 400, receive illuminating bundle, and the illuminating bundle after will assembling projects on the illuminated field 500 from microlens array module 300.Wherein, microlens array module 300 comprises at least two microlens arrays and two pairs of edge of a knife array (not shown)s.
Behind the light beam process pupil Shaping Module 200 that light source 100 produces, the xsect of light beam (pupil) shape is shaped to the required shape of illuminator, as: circle, annular, bipolar, four utmost point shapes etc.The effect of pupil Shaping Module 200 is the shapes that change the illuminating bundle xsect, and makes light distribution satisfy certain homogeneity.
The simplest pupil Shaping Module 200 can be an aperture diaphragm, and the shape of its clear aperture has determined the shape of beam cross-section.Complicated any pupil Shaping Module 200 also comprises the mixed light element, and it blocks out required cross sectional shape after light beam is mixed again.Typical pupil Shaping Module 200 comprises beam expander, mixed light element and diaphragm usually, and after being mixed by the mixed light element through the light beam that expands bundle, its cross section has even light distribution, blocks out the pupil with given shape through diaphragm again.
The outgoing beam of pupil Shaping Module 200 continues through behind microlens array module 300, the condenser 400, finally forms the trapezoidal light distribution of one dimension on illuminated field 500.
Fig. 5 is a kind of structure and the light path synoptic diagram thereof of microlens array module 300 of the present invention.This microlens array module 300 is made up of 310,330,360 and two pairs of edge of a knife arrays 340,350 of three microlens arrays.Wherein, the back focal plane of first microlens array 310 overlaps with the object plane of second microlens array 330, and second microlens array 330 (astigmatism microlens array) has the astigmatism function, and its aperture diaphragm position on xz plane and yz plane does not overlap.Two pairs of edge of a knife arrays 340,350 place respectively on the aperture diaphragm face on the second microlens array 330xz plane and yz plane, the front focal plane of the 3rd microlens array 360 overlaps with the aperture diaphragm face on the second microlens array 330xz plane or yz plane, promptly overlaps with one of two pairs of edge of a knife arrays 340,350.
Fig. 5 (a) and Fig. 5 (b) show the light path of second microlens array 330 on xz and yz plane respectively.Incide on first microlens array 310 with the outer directional light of axle on the axle, form several secondary souces on the back focal plane 320 of first microlens array 310, these secondary souces also are positioned on the object plane of second microlens array 330 simultaneously.Because the astigmatism effect of second microlens array 330 makes the pupil plane of secondary souce separate with the y direction in the x direction.The two pairs of edge of a knife arrays 340 and 350 lay respectively at secondary souce on the pupil plane of x direction and y direction, and their effect is respectively to change the size of illuminated field 500 on x direction and y direction.Owing to there is astigmatism, make to look from 350 faces, 340 out of focus, light has just formed the trapezoidal light distribution of one dimension on 350 like this.The front focal plane of (heart far away is regulated microlens array) overlaps with 350 because the 3rd microlens array 360, has guaranteed that axle is gone up and has been parallel to optical axis during spool outer chief ray outgoing, and therefore, the 3rd microlens array 360 has guaranteed the disposition far away of outgoing beam.
Fig. 5 is a simple embodiment of microlens array module 300 of the present invention, and in fact, microlens array module 300 of the present invention can have multiple implementation.Some typical implementations see also Fig. 6 (a)-(d).
Situation shown in Fig. 6 (a) is corresponding with Fig. 5: first and second microlens arrays 310,330 have been formed astigmatism lenticule unit, because second microlens array 310 has the astigmatism function, its aperture diaphragm in x direction and y direction (corresponding 340 and 350 positions) does not overlap, thereby has formed the trapezoidal light distribution of one dimension on 350.The two pairs of edge of a knife arrays 340 and 350 place the aperture diaphragm place of the second microlens array 310x direction and y direction respectively, the front focal plane that the heart far away is regulated microlens array 360 overlaps (or overlap with the placement location of edge of a knife array 340) with the placement location of edge of a knife array 350, it has guaranteed the disposition far away of outgoing beam.
Fig. 6 (b) has shown the another kind of structure of microlens array module 300, wherein, the placement relation of 310,330,360 and two pairs of edge of a knife arrays 340,350 of three microlens arrays is as follows: the object plane with second microlens array 330 of astigmatism function overlaps with the back focal plane (secondary souce face) 320 of first microlens array 310, because the astigmatism effect, second microlens array 330 does not overlap at the aperture diaphragm face of x direction and y direction.The aperture diaphragm place of the second microlens array x direction and y direction places a pair of edge of a knife array 340 or 350 respectively.Second microlens array 330 is imaged onto the 3rd microlens array 360 residing positions with secondary souce face 320.At this moment, the 3rd microlens array 360 is equivalent to field lens, is positioned on picture side's conjugate plane of secondary souce face 320.Make its front focal plane overlap (or overlap with edge of a knife array 340) with edge of a knife array 350 by the appropriate design focal length, then the 3rd microlens array 360 can guarantee the heart far away of outgoing beam.
Because field lens not only can be positioned on the image planes, also can be positioned near the image planes, therefore, the position of the 3rd microlens array 360 also can be positioned near picture side's conjugate plane of secondary souce face 320 among Fig. 6 (b).
Situation shown in Fig. 6 (c) is similar to Fig. 6 (a), just microlens array 310 and 330 is united two into one, and only adopts a thick lens array 380 to constitute astigmatism lenticule unit.Thick lens array 380 is thicker microlens array plates, and its former and later two surfaces 381,382 all have two-dimentional microtrabeculae face structure.The front surface 381 of thick lens array 380 is identical with the function of aforementioned first microlens array 310, and this front surface 381 does not produce astigmatism, and the light that therefore incides thick lens array 380 is assembled at portion 390 places within it.The back focal plane 390 of thick lens array 380 front surfaces 381 is object planes of rear surface 382, the light beam of 382 outgoing is limited by edge of a knife array 340 and 350 respectively at the clear aperture of xz direction and yz direction from the rear surface, the rear surface 382 of thick lens array 380 is identical with the function of aforementioned second microlens array 330, can produce astigmatism.Because the astigmatism effect of thick lens array 380 rear surfaces 382, edge of a knife array 340 and 350 placement location are separated from each other.Behind the light beam process heart adjusting far away microlens array 360 by edge of a knife array 340,350, light beam heart outgoing far away after assembling through condenser 400, has formed the trapezoidal light distribution of required one dimension again on illuminated field 500.
Situation is similar to Fig. 6 (b) shown in Fig. 6 (d), just adopts thick lens array 380 to replace microlens array 310 and 330.The front surface 381 of thick lens array 380 is identical with 310 functions, and rear surface 382 is identical with 330 functions, and therefore, light path and Fig. 6 (b) of the whole microlens array module 300 of Fig. 6 (d) are basic identical.Among the figure, microlens array 360 uses as field lens, and its effect remains and guarantees the light path outgoing heart far away.
Comprehensive four kinds of implementations shown in Figure 6 as can be known, the microlens array module 300 of lithography illuminating system of the present invention has two kinds of basic models: a kind of is to adopt three microlens arrays to constitute, shown in Fig. 6 (a) and (b); Another kind is to adopt two microlens arrays to constitute, shown in Fig. 6 (c), (d).Yet Fig. 6 only is that several typical light paths realize signal, can not contain whole implementations of microlens array module 300 of the present invention.Every microlens array module 300 based on above-mentioned principle all should be within protection scope of the present invention.
Fig. 7 has shown the adoptable two-dimentional microtrabeculae face structure of microlens array of the present invention, and wherein, the structure shown in Fig. 7 (a)-(c) is applicable to aforesaid microlens array 310,330 and 360, and each microlens array all can adopt one of these three kinds of structures.Fig. 7 (a) accomplishes two-dimentional microtrabeculae face structure on the same surface of material; Fig. 7 (b) respectively does one dimension microtrabeculae face structure in the front and rear surfaces of material; Fig. 7 (c) constitutes two-dimentional microtrabeculae face array with two one dimension microtrabeculae face arrays.Structure shown in Fig. 7 (d) is applicable to aforementioned thick lens array 380, is equivalent to superimposed the forming of structure shown in two Fig. 7 (a).Therefore, in fact thick lens array 380 has replaced the combination of microlens array 310 and 330 on function.
Here it should be noted that this microlens array should comprise two one dimension lenticular lens elements at least so if some microlens arrays have adopted the structure shown in Fig. 7 (c).
Employed two pairs of edge of a knife arrays 340,350 have special structure in the microlens array module 300 of the present invention, as shown in Figure 8.Fig. 8 (a) shows the structure of edge of a knife array 340, and it is actually by two onesize edge of a knife array boards 341 and 342 forms.Every edge of a knife array board 341,342 has the identical logical light pattern of several sizes, and in embodiments of the invention, these logical light patterns are rectangular openings.The number of rectangular opening is identical with lenticular line number in the microlens array module 300, and each rectangular opening is corresponding one by one with every capable lenticule.When two edge of a knife array boards 341,342. during, can change the clear aperature of light beam, thereby the size of control illuminated field y direction makes the illuminated field size adjustable continuously in the y direction in the y direction along the relative motion of y direction.
Fig. 8 (b) shows the structure of edge of a knife array 350, and it also is made up of two onesize edge of a knife array boards 351 and 352.Offer the identical rectangular opening of several sizes on the every edge of a knife array board 351,352, the perforate direction quadrature of its perforate direction and edge of a knife array 340.The number of rectangular opening is identical with lenticular columns in the microlens array module 300, and each hole is corresponding one by one with every row lenticule.When two boards during, can change the clear aperature of light beam, thereby the size of control illuminated field x direction makes the illuminated field size adjustable continuously in the x direction in the x direction along the relative motion of x direction.
Fig. 9 is the concrete structure synoptic diagram of the lithography illuminating system of another embodiment of the present invention.In present embodiment, light beam that LASER Light Source 100 is sent is expanded bundle through beam expander 210 backs, pass through diffraction optics module 220 again after, form the light distribution (corresponding different light illumination modes) of given shape in the far field.The front focal plane of zoom lens 230 overlaps with diffraction optics module 220, and zoom lens 230 can be regulated the size of illumination iris external diameter continuously.The axicon 240 that is positioned at zoom lens 230 back is used for changing continuously the internal diameter of illumination iris and the size of external diameter.So just realized that the coherence of illuminator under different light illumination modes is adjustable.
Part after the axicon 240 is identical with the structure among Fig. 5.First microlens array 310 in the microlens array module 300 is positioned on the emergent pupil face of zoom lens 230 and axicon 240, incide first microlens array 310 with the outer directional light of axle on the axle, form a plurality of secondary souces on its back focal plane 320, these secondary souces also are positioned on the object plane of second microlens array 330 simultaneously.Because the astigmatism effect of second microlens array 330 makes the pupil plane of secondary souce separate with the y direction in the x direction.The two pairs of edge of a knife arrays 340 and 350 lay respectively at secondary souce on the pupil plane of x direction and y direction, and their effect is to change the size of illuminated field 500 in x direction and y direction respectively.Owing to there is an astigmatism, make from 350 and look, 340 out of focus, light has just formed the trapezoidal light distribution of one dimension on 350 like this.The front focal plane of the 3rd microlens array 360 overlaps with 350, like this, has just guaranteed that axle is gone up and be parallel to optical axis during the outer chief ray outgoing of axle that promptly the 3rd microlens array 360 has guaranteed the disposition far away of outgoing beam.
Converged on the mask (illuminated field) 500 by condenser 400 from the light of microlens array module 300 outgoing, just formed the illuminated field 500 of required one dimension trapezoidal profile.
It is pointed out that in Fig. 9 module 300,400,500 can use any implementation among Fig. 6 (a)-(d) to replace.
The present invention adopts structure shown in Figure 4 to produce the trapezoidal illuminated field of one dimension, present relatively existing illuminator has been done following improvement: pupil Shaping Module 200 is placed the front end of illuminator, and light source 100 directly produces required pupil shape (light illumination modes that correspondence is different) by pupil Shaping Module 200 backs; Adopted Fig. 5 and shown in Figure 6 by at least two microlens arrays and two pairs of microlens array modules 300 that edge of a knife array constitutes; Contain the astigmatism lenticular lens elements in the microlens array module 300; Microlens array module 300 integral body are placed the front end of condenser 400; The edge of a knife array 340,350 that is used for changing the illuminated field size is positioned over microlens array module 300; In microlens array module 300, add the heart far away that guarantees outgoing beam disposition far away and regulated microlens array 360; Adopted edge of a knife array 340,350 to control illuminated field 500 sizes of x direction and y direction respectively with special construction.
By above-mentioned improvement, the present invention has saved the relay lens 38 that generally adopts in the prior art (Fig. 2), has reduced the complicacy of lighting system structure, has improved the transmitance of illuminator.
Lamp optical system of the present invention both can be used for the photoetching illumination optical, also can be used for other illumination optical fields.
Claims (27)
1, a kind of lithography illuminating system is characterized in that, described lithography illuminating system comprises successively:
Light source is used to produce illuminating bundle;
The pupil Shaping Module receives the illuminating bundle that described light source produces, and forms the illuminating bundle with specific sectional shape;
The microlens array module receives the illuminating bundle from described pupil Shaping Module, and forms the illuminating bundle with the trapezoidal light distribution of one dimension; And
Condenser receive the illuminating bundle from described microlens array module, and the illuminating bundle after will assembling projects on the illuminated field;
Wherein, described microlens array module comprises at least two microlens arrays and two pairs of edge of a knife arrays.
2, lithography illuminating system as claimed in claim 1 is characterized in that: the wavelength of the illuminating bundle that described light source produces is 248nm, 193nm, 157nm or 126nm.
3, lithography illuminating system as claimed in claim 1 is characterized in that: described pupil Shaping Module is an aperture diaphragm.
4, lithography illuminating system as claimed in claim 3 is characterized in that: described pupil Shaping Module also comprises the mixed light element.
5, lithography illuminating system as claimed in claim 1 is characterized in that, described pupil Shaping Module comprises: beam expander, mixed light element and diaphragm.
6, lithography illuminating system as claimed in claim 1 is characterized in that: described specific sectional shape is circle, annular, bipolar or four utmost point shapes.
7, lithography illuminating system as claimed in claim 1 is characterized in that: described at least two microlens arrays all have two-dimentional microtrabeculae face structure.
8, lithography illuminating system as claimed in claim 1, it is characterized in that: in described at least two microlens arrays, comprise an astigmatism microlens array and a heart adjusting microlens array far away, described astigmatism microlens array does not overlap in the aperture diaphragm position on xz plane and yz plane, and the described heart far away is regulated microlens array and made the outgoing beam heart far away.
9, lithography illuminating system as claimed in claim 8 is characterized in that: described two pairs of edge of a knife arrays lay respectively on the aperture diaphragm on described astigmatism microlens array xz plane and yz plane.
10, lithography illuminating system as claimed in claim 8 is characterized in that: the front focal plane that the described heart far away is regulated microlens array overlaps with the aperture diaphragm on described astigmatism microlens array xz plane or yz plane.
11, lithography illuminating system as claimed in claim 1 is characterized in that: every pair of edge of a knife array is made up of two edge of a knife array boards, and every edge of a knife array board has the identical logical light pattern of several sizes.
12, lithography illuminating system as claimed in claim 11, it is characterized in that: the logical light pattern of described two pairs of edge of a knife arrays is mutually orthogonal, by changing the relative position of two edge of a knife array boards in every pair of edge of a knife array, control the size of x direction and y directional lighting field respectively.
13, lithography illuminating system as claimed in claim 8 is characterized in that: the front focal plane of described condenser overlaps with the back focal plane that the described heart far away is regulated microlens array.
14, lithography illuminating system as claimed in claim 8 is characterized in that: the position that the front focal plane of described condenser and the described heart far away are regulated microlens array overlaps or in its vicinity.
15, lithography illuminating system as claimed in claim 1, it is characterized in that: described illuminated field is the rectangular field with the trapezoidal light distribution of one dimension, it has even light distribution on the one dimension direction, have trapezoidal light distribution on another dimension direction of quadrature with it.
16, a kind of lithography illuminating system is characterized in that, described lithography illuminating system comprises successively:
Light source is used to produce illuminating bundle;
The pupil Shaping Module receives the illuminating bundle that described light source produces, and forms the illuminating bundle with specific sectional shape;
Astigmatism lenticule unit receives the illuminating bundle from described pupil Shaping Module, and makes illuminating bundle produce specific astigmatism;
Two pairs of edge of a knife arrays;
The heart far away is regulated microlens array, makes the outgoing beam heart far away; And
Condenser, reception is regulated the light beam of microlens array from the described heart far away and is projected on the illuminated field.
17, lithography illuminating system as claimed in claim 16 is characterized in that: described astigmatism lenticule unit comprises a thick lens array, and its former and later two surfaces all have two-dimentional microtrabeculae face structure.
18, lithography illuminating system as claimed in claim 17 is characterized in that: the front surface of described thick lens array is divided into a plurality of secondary souces with incident beam, and makes incident beam in the inner convergence of described thick lens array.
19, lithography illuminating system as claimed in claim 17 is characterized in that: the back focal plane of the front surface of described thick lens array is the object plane of rear surface.
20, lithography illuminating system as claimed in claim 17 is characterized in that: the rear surface of described thick lens array has the astigmatism function, and its aperture diaphragm position on xz plane and yz plane does not overlap.
21, lithography illuminating system as claimed in claim 20, it is characterized in that: described two pairs of edge of a knife arrays lay respectively at the rear surface of described thick lens array on the aperture diaphragm face on xz plane and yz plane, are respectively applied for the clear aperture of control x direction and y direction.
22, lithography illuminating system as claimed in claim 20 is characterized in that: the front focal plane that the described heart far away is regulated microlens array and the rear surface of described thick lens array on the xz plane or the aperture diaphragm on yz plane overlap.
23, lithography illuminating system as claimed in claim 16, it is characterized in that: described astigmatism lenticule unit comprises two microlens arrays, order according to light process successively, above-mentioned two microlens arrays are respectively first microlens array and second microlens array, and above-mentioned two microlens arrays all have two-dimentional microtrabeculae face structure.
24, lithography illuminating system as claimed in claim 23 is characterized in that: according to the order of light process successively, the back focal plane of first microlens array overlaps with the object plane of second microlens array.
25, lithography illuminating system as claimed in claim 23 is characterized in that: according to the order of light process successively, second microlens array has the astigmatism function, and its aperture diaphragm face position on xz plane and yz plane does not overlap.
26, lithography illuminating system as claimed in claim 25 is characterized in that: described two pairs of edge of a knife arrays lay respectively on the aperture diaphragm face on described second microlens array xz plane and yz plane.
27, lithography illuminating system as claimed in claim 25 is characterized in that: the front focal plane that the described heart far away is regulated microlens array overlaps with the aperture diaphragm on described second microlens array xz plane or yz plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610117989XA CN100559277C (en) | 2006-11-03 | 2006-11-03 | A kind of lithography illuminating system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610117989XA CN100559277C (en) | 2006-11-03 | 2006-11-03 | A kind of lithography illuminating system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910145868XA Division CN101587302B (en) | 2006-11-03 | 2006-11-03 | Photoetching illuminating system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101174093A CN101174093A (en) | 2008-05-07 |
| CN100559277C true CN100559277C (en) | 2009-11-11 |
Family
ID=39422674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200610117989XA Active CN100559277C (en) | 2006-11-03 | 2006-11-03 | A kind of lithography illuminating system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100559277C (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101320216B (en) * | 2008-06-18 | 2010-06-09 | 上海微电子装备有限公司 | Reshaping structure of micro-photoetching illumination iris |
| DE102010035111A1 (en) * | 2010-08-23 | 2012-02-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Lighting unit and apparatus for lithographic exposure |
| CN103163741B (en) * | 2011-12-14 | 2014-12-17 | 上海微电子装备有限公司 | A measurement method for the optimum position of a variable gap of a lithographic machine |
| CN103092006B (en) * | 2013-01-25 | 2015-02-18 | 中国科学院上海光学精密机械研究所 | Lithography illumination system |
| CN103207530B (en) * | 2013-03-22 | 2014-12-17 | 中国科学院上海光学精密机械研究所 | Pupil reshaping optical system of lithography machine and generation method of off-axis illumination mode |
| CN103217872B (en) * | 2013-04-19 | 2015-05-13 | 中国科学院上海光学精密机械研究所 | Detection device and detection method of micro-lens array for photoetching machine |
| CN103412465B (en) * | 2013-07-01 | 2015-04-15 | 中国科学院上海光学精密机械研究所 | Illuminating system of step scanning projection mask aligner |
| CN103616801B (en) * | 2013-10-28 | 2016-01-13 | 东莞科视自动化科技有限公司 | A kind of PCB surface ink exposes preparation method and the equipment of special high evenness light source |
| CN106814548A (en) * | 2015-11-30 | 2017-06-09 | 上海微电子装备有限公司 | Free pupil illumination method and illuminator |
| CN105589300A (en) * | 2016-01-07 | 2016-05-18 | 中国科学院上海光学精密机械研究所 | Illuminating system for photoetching |
| US11512836B2 (en) * | 2016-01-26 | 2022-11-29 | Ams Sensors Singapore Pte. Ltd. | Multi-mode illumination module and related method |
| US10768343B2 (en) * | 2016-02-01 | 2020-09-08 | Ams Sensors Singapore Pte. Ltd. | Illumination modules and optoelectronic systems |
| CN105744129B (en) * | 2016-02-29 | 2017-12-12 | 清华大学深圳研究生院 | A kind of telecentric light detected with Yu Haiyang tiny organism and camera system |
| CN108803244B (en) * | 2017-04-27 | 2021-06-18 | 上海微电子装备（集团）股份有限公司 | Illumination device and illumination method and photoetching machine |
| CN109343226A (en) * | 2018-11-22 | 2019-02-15 | 常州英诺激光科技有限公司 | A kind of optical system that laser facula is converted to uniform alignment hot spot |
-
2006
- 2006-11-03 CN CNB200610117989XA patent/CN100559277C/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101174093A (en) | 2008-05-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100559277C (en) | A kind of lithography illuminating system | |
| CN101587302B (en) | Photoetching illuminating system | |
| CN100547489C (en) | A kind of lamp optical system that is used for micro-lithography | |
| CN1774675B (en) | Optical element for a lighting system | |
| KR100305657B1 (en) | Illumination system and exposure apparatus having the same | |
| CN103097955B (en) | The illuminator of microlithography projection exposure device | |
| CN101681123B (en) | Illumination optical system, exposure apparatus, and device manufacturing method | |
| CN101384966B (en) | Illumination system for a microlithographic projection exposure apparatus | |
| US4682885A (en) | Illumination apparatus | |
| US6583937B1 (en) | Illuminating system of a microlithographic projection exposure arrangement | |
| EP2950145B1 (en) | Illumination system for lithography | |
| JP6493584B2 (en) | Illumination optical unit for EUV projection lithography | |
| KR101545766B1 (en) | Illumination system for sizing focused spots of a patterning system for maskless lithography | |
| KR20070100964A (en) | Optical integrator, illumination optical device, exposure device, and exposure method | |
| CN1879062A (en) | Illumination system for a microlithography projection exposure installation | |
| GB2125983A (en) | Illuminating apparatus | |
| CN102436152B (en) | Deep-ultraviolet lithography illumination system | |
| CN103412465B (en) | Illuminating system of step scanning projection mask aligner | |
| EP2583141B1 (en) | Illumination optical system for microlithography and projection exposure system with an illumination optical system of this type | |
| CN102890425B (en) | Illumination optics device, exposure device and manufacturing method | |
| US5891806A (en) | Proximity-type microlithography apparatus and method | |
| CN102221785A (en) | Photolithographic illumination device using mercury lamp light source | |
| CN101819385B (en) | Exposing method and device manufacturing method | |
| CN103926804B (en) | A kind of even smooth unit of chirp formula compound eye for deep-ultraviolet lithography illumination system | |
| CN103092000A (en) | EUVL (Extreme Ultraviolet Lithography) compound eye dodging off-axis Illumination system and method for realizing off-axis Illumination |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |