TW202030504A - Prism, optical device, method for manufacturing prism, and method for manufacturing package device - Google Patents

Prism, optical device, method for manufacturing prism, and method for manufacturing package device Download PDF

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TW202030504A
TW202030504A TW108144674A TW108144674A TW202030504A TW 202030504 A TW202030504 A TW 202030504A TW 108144674 A TW108144674 A TW 108144674A TW 108144674 A TW108144674 A TW 108144674A TW 202030504 A TW202030504 A TW 202030504A
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layer
adhesive film
layers
thickness
layer portion
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山口義正
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日商日本電氣硝子股份有限公司
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Abstract

Provided is a prism such that the accuracy with which the prism is positioned is effectively increased. The prism is characterized by including a prism body 2 which has a bottom face 2a and an inclined face 2b that is connected to the bottom face 2a, and an adhesion film 3 which is provided on the bottom face 2a, wherein the adhesion film 3 has a first layer portion that is positioned on a most prism body 2 side and a second layer portion 6 that is stacked directly or indirectly on the first layer portion 5, and the second layer portion 6 includes at least one of an Au layer and a Sn layer.

Description

稜鏡、光裝置、稜鏡之製造方法及封裝裝置之製造方法Manufacturing method of optical device, optical device, manufacturing method of optical device, and manufacturing method of packaging device

本發明係關於一種稜鏡、光裝置、稜鏡之製造方法及封裝裝置之製造方法。The present invention relates to a method for manufacturing a beam, an optical device, a method for manufacturing a beam, and a packaging device.

近年來,顯示器、汽車之頭燈或投影機等用途中,廣泛使用用於使來自光源之光反射或折射之稜鏡。下述之專利文獻1中揭示有包含此種稜鏡之光裝置之一例。專利文獻1中,於包含半導體碟片之安裝基板上配置有雷射晶片及稜鏡。雷射晶片及稜鏡藉由焊料接合於安裝基板。 先前技術文獻 專利文獻In recent years, in applications such as displays, car headlights, or projectors, there has been widespread use for reflecting or refracting light from a light source. The following Patent Document 1 discloses an example of an optical device including such a scallop. In Patent Document 1, a laser chip and a laser beam are arranged on a mounting substrate including a semiconductor disc. The laser chip and the beam are joined to the mounting substrate by solder. Prior art literature Patent literature

[專利文獻1]日本專利特開2000-091688號公報[Patent Document 1] Japanese Patent Laid-Open No. 2000-091688

[發明所欲解決之問題][The problem to be solved by the invention]

光裝置中,由於需要以較高之精度調整光路之方向,故對於稜鏡之接合配置要求較高之位置精度。然而,於將光出射至稜鏡之光源使用高輸出之LD(Laser Diode,雷射二極體)等之情形時,若使用包含樹脂之接著劑將稜鏡接合配置於安裝基板等,則有接著劑發生軟化,產生稜鏡之位置偏移之虞。另一方面,如專利文獻1中所記載般之使用焊料之安裝,由於伴隨有焊料全體之熔融流動,故有於安裝之前後產生稜鏡之高度方向之位置偏移之虞。因此,對於如專利文獻1中所記載般之稜鏡,於將其接合配置於安裝基板等之情形時,較難充分地提高位置精度。又,即便於組裝之作業性或成本等方面亦存在問題。In the optical device, since it is necessary to adjust the direction of the light path with higher accuracy, a higher position accuracy is required for the joint arrangement of the 稜鏡. However, when a high-output LD (Laser Diode) is used as the light source that emits light to the beam, if a resin-containing adhesive is used to connect the beam to the mounting substrate, etc. The adhesive is softened, causing the risk of shifting the position of the nail. On the other hand, the mounting using solder as described in Patent Document 1 is accompanied by the melt flow of the solder as a whole, so there is a risk of a position shift in the height direction before and after mounting. Therefore, it is relatively difficult to sufficiently improve the positional accuracy when bonding and arranging it on a mounting board or the like, as described in Patent Document 1. Moreover, there are problems even in terms of workability and cost of assembly.

本發明之目的在於提供一種可有效地提高光裝置中之位置精度之稜鏡及使用該稜鏡之光裝置以及稜鏡之製造方法及封裝裝置之製造方法。 [解決問題之技術手段]The object of the present invention is to provide an optical device that can effectively improve the position accuracy of the optical device, the optical device using the optical device, the manufacturing method of the optical device, and the manufacturing method of the packaging device. [Technical means to solve the problem]

本發明之稜鏡之特徵在於具備:稜鏡本體,其具有底面及連接於底面之斜面;及密接膜,其設置於底面;且密接膜具有位於稜鏡本體側之第1層部分、與直接或間接地積層於第1層部分上之第2層部分,且第2層部分包含Au層及Sn層中之至少一層。The characteristic of the scallop of the present invention is that it has: a scallop body having a bottom surface and an inclined surface connected to the bottom surface; and an adhesive film disposed on the bottom surface; and the adhesive film has a first layer part on the side of the scallop body, and a direct Or the second layer part is indirectly laminated on the first layer part, and the second layer part includes at least one of the Au layer and the Sn layer.

較佳為,於第2層部分中, Au層及Sn層交替地積層。Preferably, in the second layer portion, Au layers and Sn layers are alternately laminated.

較佳為,第2層部分具有Au層及Sn層之兩者,且於Au層與Sn層之間設置有包含Au及Sn之合金之Au-Sn層。Preferably, the second layer portion has both an Au layer and a Sn layer, and an Au-Sn layer including an alloy of Au and Sn is arranged between the Au layer and the Sn layer.

於密接膜之積層方向上,於將遠離稜鏡本體之側設為外側時,第2層部分之最外層較佳為Au層。In the lamination direction of the adhesive film, when the side away from the main body of the scallop is set to the outside, the outermost layer of the second layer portion is preferably an Au layer.

較佳為,第2層部分具有複數個Au層及複數個Sn層之兩者,Au層及Sn層交替地積層,且第2層部分具有應力緩和層,於應力緩和層為複數個Au層中之一層之情形時,應力緩和層之厚度與其他Au層之平均厚度不同,於應力緩和層為複數個Sn層中之一層之情形時,應力緩和層之厚度與其他Sn層之平均厚度不同。於該情形時,應力緩和層之厚度更較佳為其他Au層或其他Sn層之平均厚度之1/2以上、5倍以下。又,應力緩和層之厚度更佳為其他Au層或其他Sn層之平均厚度之1/5以上、1/2以下。Preferably, the second layer part has a plurality of Au layers and a plurality of Sn layers, the Au layers and Sn layers are alternately laminated, and the second layer part has a stress relaxation layer, and the stress relaxation layer is a plurality of Au layers In the case of one of the layers, the thickness of the stress relaxation layer is different from the average thickness of other Au layers. When the stress relaxation layer is one of a plurality of Sn layers, the thickness of the stress relaxation layer is different from the average thickness of other Sn layers . In this case, the thickness of the stress relaxation layer is more preferably 1/2 or more and 5 times or less of the average thickness of other Au layers or other Sn layers. In addition, the thickness of the stress relaxation layer is more preferably 1/5 or more and 1/2 or less of the average thickness of other Au layers or other Sn layers.

較佳為,於密接膜之積層方向上,於將遠離稜鏡本體之側設為外側時,第2層部分之最外層為第2層部分中最薄之層。於該情形時,第2層部分中,更佳為越位於外側之層則越薄Preferably, in the lamination direction of the adhesive film, when the side away from the main body is set to the outside, the outermost layer of the second layer portion is the thinnest layer in the second layer portion. In this case, in the second layer, it is more preferable that the layer on the outside is thinner

較佳為,第2層部分具有複數個Au層及複數個Sn層之兩者,複數個Au層之厚度互為相同,且複數個Sn層之厚度越位於外側則越厚。Preferably, the second layer portion has both of a plurality of Au layers and a plurality of Sn layers, and the thickness of the plurality of Au layers is the same as each other, and the thickness of the plurality of Sn layers is thicker the outside.

較佳為,第2層部分具有複數個Au層及複數個Sn層之兩者,複數個Au層之厚度越位於外側則越薄,且複數個Sn層之厚度互為相同。Preferably, the second layer portion has both of a plurality of Au layers and a plurality of Sn layers, and the thickness of the plurality of Au layers becomes thinner as they are located outside, and the thickness of the plurality of Sn layers is the same.

第2層部分中之Au層及Sn層之合計層數較佳為3層以上、99層以下。於該情形時,第2層部分中之Au層及Sn層之合計層數更佳為15層以上、35層以下。The total number of Au layers and Sn layers in the second layer portion is preferably 3 layers or more and 99 layers or less. In this case, the total number of layers of the Au layer and the Sn layer in the second layer portion is more preferably 15 layers or more and 35 layers or less.

密接膜之全體厚度較佳為1 μm以上、10 μm以下。The overall thickness of the adhesive film is preferably 1 μm or more and 10 μm or less.

第2層部分具有Au層及Sn層之兩者,於將第2層部分中之Au之重量之合計設為MA 、將Sn之重量之合計設為MS 、將Au之重量相對於Au及Sn之重量之合計之比率設為MA /(MA +MS )時,比率MA /(MA +MS )較佳為0.65以上、0.78以下,更佳為0.60以上、0.75以下。The second layer part has both an Au layer and a Sn layer. In the second layer part, the total weight of Au is M A , the total weight of Sn is M S , and the weight of Au is relative to Au the ratio of the total weight of Sn and the set of M A / (M A + M S) , the ratio M A / (M A + M S) is preferably 0.65 or more and 0.78 or less, more preferably 0.60 or more and 0.75 or less.

本發明之另一態樣中之稜鏡係安裝於封裝體者,其具備:稜鏡本體,其具有底面及連接於底面之斜面;及密接膜,其設置於底面;且密接膜具有位於稜鏡本體側之第1層部分、與直接或間接地積層於第1層部分上之第2層部分,且第2層部分係包含Au及Sn之合金之Au-Sn層,密接膜之第2層部分之厚度為2.5 μm以上、5.9 μm以下。In another aspect of the present invention, the bead is installed in a package, and it has: a bead body having a bottom surface and an inclined surface connected to the bottom surface; and an adhesive film provided on the bottom surface; and the adhesive film has an edge The first layer part of the mirror body side and the second layer part directly or indirectly laminated on the first layer part, and the second layer part is the Au-Sn layer containing the alloy of Au and Sn, and the second layer of the adhesive film The thickness of the layer is 2.5 μm or more and 5.9 μm or less.

較佳為,於密接膜之積層方向上,於將遠離稜鏡本體之側設為外側時,密接膜具有作為密接膜之最外層且積層於第2層部分上之最外層部分,且最外層部分係Au層。Preferably, in the lamination direction of the adhesive film, when the side far from the main body of the adhesive film is set to the outside, the adhesive film has the outermost layer as the outermost layer of the adhesive film and is laminated on the second layer, and the outermost layer Part is Au layer.

於密接膜之積層方向上,於將遠離稜鏡本體之側設為外側時,密接膜之最外層之算術平均粗糙度Ra較佳為0.20 μm以下。In the layering direction of the adhesive film, when the side away from the main body of the adhesive film is set to the outside, the arithmetic average roughness Ra of the outermost layer of the adhesive film is preferably 0.20 μm or less.

第1層部分較佳為Cr層或Ti層或Ta膜。The first layer portion is preferably a Cr layer, Ti layer, or Ta film.

密接膜較佳為進而具有積層於第1層部分與第2層部分之間之中間層部分。於該情形時,中間層部分更佳為Ni層、Pt層、Pd層、Ni-Cr混合層或將該等組合而成之合金層。The adhesive film preferably further has an intermediate layer portion laminated between the first layer portion and the second layer portion. In this case, the intermediate layer part is more preferably a Ni layer, a Pt layer, a Pd layer, a Ni-Cr mixed layer, or an alloy layer formed by combining them.

稜鏡本體具有上表面,上表面較佳為與底面對向,且連接於斜面。The main body has an upper surface, and the upper surface preferably faces the bottom surface and is connected to the inclined surface.

較佳為於稜鏡本體之斜面設置有反射膜。又,較佳為於稜鏡本體之斜面及上表面設置有反射膜。Preferably, a reflective film is provided on the inclined surface of the main body. Furthermore, it is preferable to provide a reflective film on the inclined surface and upper surface of the main body.

本發明之光裝置之特徵在於具備:上述稜鏡;光學元件,其將光出射至稜鏡或接收來自稜鏡之光;及封裝體,其收容稜鏡及光學元件;且稜鏡藉由密接膜接合於封裝體。The optical device of the present invention is characterized by comprising: the above-mentioned beam; an optical element which emits light to the beam or receives light from the beam; and a package body which houses the beam and the optical element; The film is bonded to the package body.

本發明之稜鏡之製造方法之特徵在於,其係具備於具有底面及連接於底面之斜面之稜鏡本體之底面設置密接膜的步驟者,且設置密接膜之步驟包含:於底面形成包含金屬材料之第1層部分之步驟;及直接或間接地將包含金屬材料之第2層部分積層於第1層部分上之步驟;且第1層部分與第2層部分包含互不相同之成分之金屬材料,第2層部分包含Au層及Sn層中之至少一層。The manufacturing method of the 稜鏡 of the present invention is characterized in that it is provided with a step of arranging an adhesive film on the bottom surface of the 稜鏡 body having a bottom surface and an inclined surface connected to the bottom surface, and the step of arranging the adhesion film includes: The step of the first layer part of the material; and the step of directly or indirectly laminating the second layer part containing the metal material on the first layer part; and the first layer part and the second layer part contain mutually different components The metal material, the second layer part includes at least one of an Au layer and a Sn layer.

本發明之封裝裝置之製造方法之特徵在於具備:準備上述稜鏡之步驟;準備具有與稜鏡之接著面之封裝體之步驟;以密接膜抵接於封裝體之接著面之方式,使稜鏡與封裝體抵接之步驟;及對密接膜進行加熱,使稜鏡與封裝體接合之步驟。The manufacturing method of the packaging device of the present invention is characterized by the step of preparing the above-mentioned ridge; the step of preparing the package body with the bonding surface to the ridge; and the bonding film abuts on the bonding surface of the package body to make the edge The step of abutting the mirror with the package body; and the step of heating the adhesive film to bond the stalk and the package body.

較佳為,於封裝體之接著面形成有Au膜,且以密接膜全體不會熔融之溫度進行加熱,使稜鏡與封裝體接合。 [發明之效果]Preferably, an Au film is formed on the bonding surface of the package, and the adhesive film is heated at a temperature at which the entire adhesive film does not melt to bond the scallop to the package. [Effects of Invention]

根據本發明之稜鏡、光裝置、稜鏡之製造方法及封裝裝置之製造方法,可有效地提高稜鏡之位置精度。According to the invention, the optical device, the manufacturing method of the optical device, and the manufacturing method of the packaging device can effectively improve the position accuracy of the optical device.

以下,對較佳之實施形態進行說明。但,以下之實施形態係單純之例示,本發明不受以下實施形態限定。又,各圖式中,存在實質上具有相同功能之構件以相同符號來參照之情形。Hereinafter, preferred embodiments will be described. However, the following embodiments are merely examples, and the present invention is not limited to the following embodiments. In addition, in each drawing, there are cases in which members having substantially the same function are referred to with the same symbols.

(稜鏡) (第1實施形態) 圖1係本發明之第1實施形態之稜鏡之剖視圖。如圖1所示,稜鏡1具備稜鏡本體2、密接膜3、及反射膜4。稜鏡本體2具有大致梯形之剖面形狀。稜鏡本體2具有底面2a、連接於底面2a之斜面2b、及與底面2a對向且連接於斜面2b之上表面2c。再者,稜鏡本體2之剖面形狀不限定於大致梯形,亦可為大致三角形等。本實施形態中,稜鏡本體2包含適當之玻璃材料。(稜鏡) (First Embodiment) Figure 1 is a cross-sectional view of the first embodiment of the present invention. As shown in FIG. 1, the bead 1 includes a bead main body 2, an adhesion film 3, and a reflective film 4. The main body 2 has a generally trapezoidal cross-sectional shape. The main body 2 has a bottom surface 2a, an inclined surface 2b connected to the bottom surface 2a, and an upper surface 2c opposite to the bottom surface 2a and connected to the inclined surface 2b. Furthermore, the cross-sectional shape of the main body 2 is not limited to a substantially trapezoidal shape, and may be substantially triangular or the like. In this embodiment, the main body 2 contains a suitable glass material.

於稜鏡本體2之底面2a設置有密接膜3。於稜鏡本體2之斜面2b設置有反射膜4。稜鏡1藉由密接膜3接合於光裝置或封裝裝置中之安裝基板或封裝體等。An adhesive film 3 is provided on the bottom surface 2 a of the main body 2. A reflective film 4 is provided on the inclined surface 2b of the main body 2 of the 稜鏡. The ridge 1 is bonded to the mounting substrate or package body of the optical device or the packaging device through the adhesive film 3.

圖2係表示第1實施形態之稜鏡之密接膜附近之放大剖視圖。如圖2所示,密接膜3係複數個金屬層之積層體。具體而言,密接膜3具有位於最靠近稜鏡本體2側之第1層部分5、與積層於第1層部分5上之第2層部分6。本實施形態中,第2層部分6直接地積層於第1層部分5上。再者,第2層部分6亦可介隔其他層而間接地積層於第1層部分5上。Fig. 2 is an enlarged cross-sectional view showing the vicinity of the adhesive film of 稜鏡 in the first embodiment. As shown in FIG. 2, the adhesive film 3 is a laminate of a plurality of metal layers. Specifically, the adhesive film 3 has a first layer portion 5 located on the side closest to the main body 2 and a second layer portion 6 laminated on the first layer portion 5. In this embodiment, the second layer portion 6 is directly laminated on the first layer portion 5. Furthermore, the second layer portion 6 may be laminated on the first layer portion 5 indirectly via other layers.

第1層部分5係Cr層。當然,第1層部分5只要於密接膜3之各層中與稜鏡本體2之密接性相對性較高即可,不限定於Cr層。例如,第1層部分5亦可為Ti層或者Ta層。The first layer is a 5-series Cr layer. Of course, the first layer portion 5 only needs to have a relatively high adhesiveness with the main body 2 of the adhesive film 3, and is not limited to the Cr layer. For example, the first layer portion 5 may also be a Ti layer or a Ta layer.

再者,本發明中,於各金屬層容許少量雜質或添加物。具體而言,Cr層係包含95重量%以上Cr之金屬層。又,Ti層係包含95重量%以上Ti之金屬層。又,Ta層係包含95重量%以上Ta之金屬層。Cr、Ti、Ta作為與玻璃之密接層發揮功能,若Cr、Ti、Ta之含量係上述範圍,則不會損害本發明之效果。Furthermore, in the present invention, a small amount of impurities or additives are allowed in each metal layer. Specifically, the Cr layer is a metal layer containing 95% by weight or more of Cr. In addition, the Ti layer is a metal layer containing 95% by weight or more of Ti. In addition, the Ta layer is a metal layer containing 95% by weight or more of Ta. Cr, Ti, and Ta function as an adhesive layer with glass, and if the content of Cr, Ti, and Ta is within the above range, the effect of the present invention will not be impaired.

本實施形態中,第2層部分6係依序積層有第1層6a、第2層6b、第3層6c、第4層6d及第5層6e而成之積層體。此處,於密接膜3之積層方向上,將稜鏡本體2側設為內側,將遠離稜鏡本體2之側設為外側。第2層部分6中,第5層6e係最外層。In this embodiment, the second layer portion 6 is a layered body in which a first layer 6a, a second layer 6b, a third layer 6c, a fourth layer 6d, and a fifth layer 6e are sequentially laminated. Here, in the lamination direction of the adhesive film 3, the side of the scallop main body 2 is set to the inside, and the side away from the scallop main body 2 is set to the outside. In the second layer portion 6, the fifth layer 6e is the outermost layer.

第1層6a係Au層,第2層6b係Sn層,第3層6c係Au層,第4層6d係Sn層,作為最外層之第5層6e係Au層。第2層部分6中,Au層及Sn層交替地積層。再者,第2層部分6包含Au層及Sn層中之至少一層即可,層數不限定於上述。The first layer 6a is an Au layer, the second layer 6b is an Sn layer, the third layer 6c is an Au layer, and the fourth layer 6d is an Sn layer, and the fifth layer 6e is an Au layer as the outermost layer. In the second layer portion 6, Au layers and Sn layers are alternately laminated. In addition, the second layer portion 6 may include at least one of an Au layer and a Sn layer, and the number of layers is not limited to the above.

再者,本發明中,Au層係包含95重量%以上Au之金屬層。又,Sn層係包含95重量%以上Sn之金屬層。根據Au或Sn之精製程度,會引起雜質混入至金屬層。作為雜質,例如以Fe、Cr、Ni等為代表,但若Au及Sn各者之含量係上述範圍,則不會損害本發明之效果。Furthermore, in the present invention, the Au layer contains a metal layer of 95% by weight or more Au. In addition, the Sn layer is a metal layer containing 95% by weight or more of Sn. Depending on the degree of refinement of Au or Sn, impurities may be mixed into the metal layer. The impurities are represented by Fe, Cr, Ni, etc., but if the content of each of Au and Sn is in the above range, the effect of the present invention will not be impaired.

反射膜4例如包含高折射率膜及低折射率膜交替地積層而成之介電體多層膜。作為高折射率膜之材料,例如可列舉TiO2 、Ta2 O5 、ZrO2 或HfO2 。作為低折射率膜之材料,例如可列舉SiO2 或MgF2 。又,亦可使用金屬膜作為反射膜4。反射膜4可設置於稜鏡本體2之斜面2b之至少一部分,例如,亦可設置於斜面2b之整個面。藉由於斜面2b設置有反射膜4,從而可使自光源出射之光較佳地反射。再者,稜鏡1亦並非必須具有反射膜4。The reflective film 4 includes, for example, a dielectric multilayer film in which a high refractive index film and a low refractive index film are alternately laminated. As the material of the high refractive index film, for example, TiO 2 , Ta 2 O 5 , ZrO 2 or HfO 2 can be cited. As the material of the low refractive index film, for example, SiO 2 or MgF 2 can be cited. In addition, a metal film may also be used as the reflective film 4. The reflective film 4 can be provided on at least a part of the inclined surface 2b of the main body 2, for example, on the entire surface of the inclined surface 2b. Since the inclined surface 2b is provided with the reflective film 4, the light emitted from the light source can be better reflected. Furthermore, the reflection film 4 is not required to be included in the 稜鏡1.

密接膜3及反射膜4例如可藉由利用濺鍍法或真空蒸鍍法等積層各層而形成。The adhesion film 3 and the reflective film 4 can be formed by laminating each layer by, for example, a sputtering method or a vacuum evaporation method.

本實施形態之特徵在於,設置於稜鏡本體2之底面2a之密接膜3具有第1層部分5、與包含Au層及Sn層中之至少一層之第2層部分6。藉此,可有效地提高光裝置中之稜鏡1之位置精度。以下,對於其詳情進行說明。The feature of this embodiment is that the adhesive film 3 provided on the bottom surface 2a of the main body 2 has a first layer portion 5 and a second layer portion 6 including at least one of an Au layer and a Sn layer. In this way, the position accuracy of the pin 1 in the optical device can be effectively improved. The details will be described below.

本實施形態之稜鏡1可於不伴隨密接膜3全體之熔融流動之情況下接合於封裝體等。具體而言,如圖9所示,首先,將稜鏡1載置於封裝體等。具體而言,將稜鏡1載置於封裝體等中之使稜鏡1接著之接著面。此時,於載置稜鏡1之部分(本實施形態中係封裝體之內表面)較佳為設置有Au膜等金屬膜作為用以輔助與密接膜3之接合之輔助層。其次,於密接膜3全體不會發生熔融之溫度對稜鏡1之密接膜3進行加熱。加熱之溫度無特別限定,例如,只要於300℃以上、350℃以下進行加熱即可。藉由密接膜3之加熱,於Au層及Sn層中使金屬相互擴散而使密接膜3合金化。此時,作為封裝體內表面之金屬膜之Au膜與密接膜3之最外層之Au層相互擴散而接著,構成密接膜3之Au層及Sn層亦相互擴散而合金化。藉此,使密接膜3與封裝體等之金屬膜一體化,將稜鏡1接合於封裝體等。如此一來,例如可較佳地製造封裝裝置等。或者,可將光裝置中所使用之稜鏡1搭載於封裝體等。The ridge 1 of the present embodiment can be joined to a package or the like without the melt flow of the entire adhesive film 3. Specifically, as shown in FIG. 9, first, the 稜鏡 1 is placed on a package or the like. Specifically, the bonding surface 1 is placed in a package or the like to adhere the bonding surface 1. At this time, it is preferable to provide a metal film such as an Au film as an auxiliary layer for assisting the bonding with the adhesion film 3 on the portion where the nail 1 is placed (the inner surface of the package in this embodiment). Next, the adhesive film 3 of the ridge 1 is heated at a temperature at which the entire adhesive film 3 does not melt. The heating temperature is not particularly limited, and for example, it may be heated at 300°C or higher and 350°C or lower. By heating the adhesive film 3, metals are mutually diffused in the Au layer and the Sn layer, and the adhesive film 3 is alloyed. At this time, the Au film, which is the metal film on the inner surface of the package, and the Au layer of the outermost layer of the adhesion film 3 are mutually diffused, and then the Au layer and the Sn layer constituting the adhesion film 3 are also mutually diffused and alloyed. Thereby, the adhesive film 3 is integrated with the metal film such as the package, and the scallop 1 is bonded to the package and the like. In this way, for example, a packaging device can be manufactured preferably. Alternatively, the optical device 1 used in the optical device may be mounted on a package or the like.

如此,由於不會伴隨密接膜3全體之熔融,故於稜鏡1之接合之前後,密接膜3之厚度不易變化,從而不易產生稜鏡本體2之高度方向之位置偏移。同樣地,由於不會伴隨密接膜3全體之熔融,故於稜鏡1之接合之前後,亦不易產生稜鏡本體2之水平方向之位置偏移。因此,可有效地提高稜鏡1之位置精度。又,於封裝體之組裝步驟中,由於可省略先前之焊料之塗佈步驟,即僅將具有密接膜3之稜鏡1載置於封裝體等即可,故可提高作業性或成本效率。In this way, since the melting of the entire adhesive film 3 is not accompanied, the thickness of the adhesive film 3 does not change easily before and after the bonding of the adhesive film 1, so that the positional deviation of the height direction of the adhesive film body 2 is unlikely to occur. Similarly, since the entire adhesive film 3 is not melted, it is not easy to cause the horizontal position shift of the main body 2 before and after the joining of the main body 1. Therefore, the position accuracy of 稜鏡1 can be effectively improved. In addition, in the assembling step of the package, since the previous solder coating step can be omitted, that is, it is only necessary to place the scallop 1 with the adhesive film 3 on the package, etc., thereby improving workability and cost efficiency.

進而,與包含樹脂之接著劑不同,密接膜3包含金屬。因此,不易產生因水分或氧氣而造成之劣化或因光而造成之劣化,可提高可靠性。除此以外,由於於稜鏡1與封裝體等之接合後不會產生氣體,故於反射膜4或後述之光學元件74不易附著雜質,從而不易產生反射率或透過率之劣化。Furthermore, unlike the adhesive agent containing resin, the adhesive film 3 contains metal. Therefore, deterioration due to moisture or oxygen or deterioration due to light is less likely to occur, and reliability can be improved. In addition, since no gas is generated after the bonding of the ridge 1 and the package, etc., impurities are not likely to adhere to the reflective film 4 or the optical element 74 described later, and the reflectance or transmittance is not easily deteriorated.

再者,上述中,例示有以將稜鏡1載置於封裝體之狀態進行加熱而接合之情形,若為稜鏡1之密接膜3與封裝體之接著面抵接之狀態,則進行接合時之封裝體及稜鏡1之形狀或狀態不限於上述。例如,可為於稜鏡1上載置封裝體之態樣,亦可為將抵接狀態之稜鏡1與封裝體以夾具裝置等夾持之狀態。Furthermore, in the above, there is an exemplified case of heating and bonding in a state where the scallop 1 is placed on the package. If the adhesive film 3 of the scallop 1 is in contact with the adhesive surface of the package, then bonding is performed. The shape or state of the package body and the frame 1 are not limited to the above. For example, it may be a state in which the package body is placed on the ridge 1, or a state in which the ridge 1 and the package in a contact state are clamped by a clamp device or the like.

密接膜3中,Au層及Sn層較佳為交替地積層。藉此,於進行安裝時,可於Au層及Sn層中更確實地使金屬相互擴散,從而可更確實地使Au層及Sn層合金化。因此,於將稜鏡1安裝於封裝體等時,可更確實地提高密接膜3之接合力。In the adhesive film 3, the Au layer and the Sn layer are preferably laminated alternately. As a result, during mounting, metals can be more reliably interdiffused in the Au layer and the Sn layer, and the Au layer and the Sn layer can be alloyed more reliably. Therefore, when mounting the ridge 1 to a package or the like, the bonding force of the adhesive film 3 can be improved more reliably.

密接膜3全體厚度較佳為1 μm以上,更佳為3 μm以上。藉此,可更充分地提高接合力。密接膜3全體厚度較佳為10 μm以下,更佳為5 μm以下。於該情形時,可使安裝時金屬相互擴散之各層變薄。藉此,可縮短於密接膜3之各層中用以使金屬以不會引起剝離之程度相互擴散所需之時間,從而可縮短密接膜3之合金化之時間。因此,可更提高生產性。又,由於藉由所使用之密接膜3較薄,稜鏡本體2之高度方向之位置偏移變小,因此可更進一步有效地提高稜鏡1之位置精度。The thickness of the entire adhesive film 3 is preferably 1 μm or more, more preferably 3 μm or more. Thereby, the joining force can be improved more sufficiently. The thickness of the entire adhesive film 3 is preferably 10 μm or less, more preferably 5 μm or less. In this case, the layers of metal interdiffusion during installation can be thinned. Thereby, the time required for the mutual diffusion of metals in each layer of the adhesion film 3 to the extent that does not cause peeling can be shortened, and the time for alloying of the adhesion film 3 can be shortened. Therefore, productivity can be further improved. In addition, since the adhesive film 3 used is thinner, the positional deviation of the height direction of the scallop body 2 becomes smaller, so that the position accuracy of the scallop 1 can be further effectively improved.

密接膜3之第2層部分6中之Au層及Sn層之合計層數較佳為3層以上,更佳為15層以上。藉此,可更進一步使第2層部分6中之各層之厚度變薄。因此,於進行安裝時,可更進一步縮短密接膜3之合金化之時間,可更進一步提高生產性。The total number of layers of the Au layer and the Sn layer in the second layer portion 6 of the adhesive film 3 is preferably 3 layers or more, more preferably 15 layers or more. Thereby, the thickness of each layer in the second layer portion 6 can be further reduced. Therefore, during installation, the time for alloying the adhesive film 3 can be further shortened, and the productivity can be further improved.

第2層部分6中之Au層及Sn層之合計層數較佳為99層以下。若考慮到生產性,則更佳為39層以下,進而佳為35層以下。於第2層部分6之層數過多之情形時,各層變得過薄,故有難以形成各層之虞。The total number of Au layers and Sn layers in the second layer portion 6 is preferably 99 layers or less. In consideration of productivity, it is more preferably 39 layers or less, and still more preferably 35 layers or less. When the number of layers of the second layer portion 6 is too large, each layer becomes too thin, and it may be difficult to form each layer.

第2層部分6亦可具有積層於Au層與Sn層之間,且包含Au及Sn之合金之Au-Sn層。於該情形時,於進行安裝時,可更進一步有效地縮短密接膜3之合金化之時間,可更進一步有效地提高生產性。再者,Au-Sn層可使用真空蒸鍍法或濺鍍法,藉由2源蒸鍍或2源濺鍍而於短時間形成。The second layer portion 6 may also have an Au-Sn layer laminated between the Au layer and the Sn layer and including an alloy of Au and Sn. In this case, it is possible to further effectively shorten the alloying time of the adhesive film 3 during installation, and to further effectively improve the productivity. Furthermore, the Au-Sn layer can be formed in a short time by two-source evaporation or two-source sputtering using a vacuum evaporation method or a sputtering method.

再者,Au-Sn層可藉由於形成密接膜3時使相鄰之Au層及Sn層之一部分合金化而形成。例如,可於濺鍍法或真空蒸鍍法等適當條件下,藉由將Au層與Sn層積層時之能量使Au層及Sn層之一部分合金化而形成Au-Sn層。Furthermore, the Au-Sn layer can be formed by alloying a part of the adjacent Au layer and Sn layer when the adhesive film 3 is formed. For example, the Au-Sn layer can be formed by alloying a part of the Au layer and the Sn layer by the energy when the Au layer and the Sn layer are laminated under appropriate conditions such as a sputtering method or a vacuum evaporation method.

第2層部分6中之最外層較佳為Au層。藉此,於安裝時,與封裝體等相接之最外層不易發生氧化,可更確實地提高接合力。The outermost layer in the second layer portion 6 is preferably an Au layer. As a result, during mounting, the outermost layer in contact with the package body is less likely to be oxidized, and the bonding force can be improved more reliably.

此處,將密接膜3中之Au之重量之合計設為MA ,將Sn之重量之合計設為MS ,將Au之重量相對於Au及Sn之重量之合計之比率設為MA /(MA +MS )。此時,比率MA /(MA +MS )較佳為大於0.78、小於0.82,特佳為0.8。於該情形時,可將Au及Sn之熔點(共晶溫度)設為280℃左右,可於低溫下使密接膜3合金化。因此,可於低溫下將稜鏡1接合於封裝體等。Here, let the total weight of Au in the adhesive film 3 be M A , let the total weight of Sn be M S , and let the ratio of the weight of Au to the total weight of Au and Sn be M A / (M A + M S ). At this time, the ratio M A /(M A +M S ) is preferably greater than 0.78 and less than 0.82, particularly preferably 0.8. In this case, the melting point (eutectic temperature) of Au and Sn can be set to about 280°C, and the adhesion film 3 can be alloyed at a low temperature. Therefore, it is possible to bond the 稜鏡 1 to the package or the like at a low temperature.

此處,如上所述,較佳為於安裝稜鏡1之封裝體等形成有Au膜等金屬膜。於將稜鏡1接合於封裝體等之形成有Au膜之部分時,產生自該Au膜向密接膜3之Au之夾裹。因此,於合金化後之密接膜3之Au之重量之比率MA /(MA +MS )較合金化前變大。因此,於此種情形時,密接膜3中之Au之重量之比率MA /(MA +MS )較佳為0.60以上、0.78以下,更佳為0.68以上、0.75以下。藉由將合金化前之密接膜3之比率MA /(MA +MS )設為上述範圍內,可使Au膜及密接膜3之合金化後之密接膜3之比率MA /(MA +MS )為大於0.78、小於0.82之範圍內。藉此,可將Au及Sn之熔點(共晶溫度)設為280℃左右,可於低溫下使密接膜3合金化。因此,可更確實地於低溫下將稜鏡1接合於封裝體等。Here, as described above, it is preferable that a metal film such as an Au film is formed on the package or the like on which the frame 1 is mounted. When bonding the 稜鏡 1 to the portion where the Au film is formed, such as a package, the Au film is sandwiched to the adhesion film 3. Therefore, the weight ratio M A /(M A +M S ) of the adhesive film 3 after alloying becomes larger than that before alloying. Therefore, in this case, the ratio M A /(M A +M S ) of the weight of Au in the adhesive film 3 is preferably 0.60 or more and 0.78 or less, and more preferably 0.68 or more and 0.75 or less. By setting the ratio M A /(M A +M S ) of the adhesive film 3 before alloying within the above range, the ratio of the Au film and the adhesive film 3 after alloying M A /(M A + M S ) is greater than 0.78 and less than 0.82. Thereby, the melting point (eutectic temperature) of Au and Sn can be set to about 280°C, and the adhesion film 3 can be alloyed at a low temperature. Therefore, it is possible to more surely bond the 稜鏡 1 to the package or the like at a low temperature.

如本實施形態般,稜鏡本體2較佳為具有與底面2a對向且連接於斜面2b之上表面2c。於該情形時,由於使稜鏡1移動時易夾持稜鏡,故可容易地安裝稜鏡1。再者,稜鏡本體2並非必須具有上表面2c,亦可為剖面形狀係大致三角形等。As in the present embodiment, the main body 2 preferably has an upper surface 2c opposite to the bottom surface 2a and connected to the inclined surface 2b. In this case, since it is easy to hold the bead 1 when moving the bead 1, the bead 1 can be easily installed. Furthermore, the main body 2 does not have to have an upper surface 2c, and the cross-sectional shape may be substantially triangular or the like.

(第2實施形態) 圖3係表示本發明之第2實施形態之稜鏡之密接膜附近之放大剖視圖。如圖3所示,本實施形態之稜鏡11於在密接膜13之第2層部分16中越位於外側之層則越薄之點,與第1實施形態不同。具體而言,於將第1層16a之厚度設為Ta 、將第2層16b之厚度設為Tb 、將第3層16c之厚度設為Tc 、將第4層16d之厚度設為Td 、將第5層16e之厚度設為Te 時,滿足Ta >Tb >Tc >Td >Te 。除上述以外之點,本實施形態之稜鏡11具有與第1實施形態之稜鏡1同樣之構成。(Second Embodiment) Fig. 3 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the scallop in the second embodiment of the present invention. As shown in FIG. 3, the ridge 11 of this embodiment differs from the first embodiment in that the layer located on the outer side of the second layer portion 16 of the adhesive film 13 becomes thinner. Specifically, in the thickness of the first layer 1 16a is set to T a, the thickness of the second layer 2 16b is set to T b, the thickness of the layer 3 16c to T c, the thickness of the fourth layer 16d to T d , when the thickness of the fifth layer 16e is set to T e , it satisfies T a > T b > T c > T d > T e . Except for the above-mentioned points, the 稜鏡 11 of this embodiment has the same structure as the 稜鏡 1 of the first embodiment.

即便於本實施形態中,亦可與第1實施形態同樣地,於不會伴隨密接膜13之熔融之情況下將稜鏡11接合於封裝體等。因此,可有效地提高稜鏡11之位置精度。Even in this embodiment, as in the first embodiment, the scallop 11 can be bonded to the package or the like without the melting of the adhesive film 13. Therefore, the position accuracy of the 稜鏡 11 can be effectively improved.

此外,由於第5層16e係最外層,故與第5層16e相鄰之層僅為位於內側之第4層16d。因此,於使密接膜13合金化時,於第3層16c或第4層16d中產生經由外側及內側之兩面之相互擴散,但於第5層16e中產生僅經由內側之面之相互擴散。此處,本實施形態中,第5層16e係於第2層部分16中最薄之層。因此,由於可有效地縮短於第5層16e中進行合金化所需之相互擴散之時間,故可更確實地使第5層16e合金化,且可縮短合金化之時間。因此,可更確實地使密接膜13合金化,可更確實地提高接合力,且可提高生產性。In addition, since the fifth layer 16e is the outermost layer, the layer adjacent to the fifth layer 16e is only the fourth layer 16d located inside. Therefore, when the adhesion film 13 is alloyed, the third layer 16c or the fourth layer 16d generates mutual diffusion through both the outer and inner surfaces, but the fifth layer 16e generates mutual diffusion only through the inner surface. Here, in this embodiment, the fifth layer 16e is the thinnest layer in the second layer portion 16. Therefore, since the interdiffusion time required for alloying in the fifth layer 16e can be effectively shortened, the fifth layer 16e can be alloyed more reliably, and the alloying time can be shortened. Therefore, the adhesion film 13 can be alloyed more reliably, the bonding force can be improved more reliably, and the productivity can be improved.

除此以外,於密接膜13之第2層部分16中越位於外側之層則越薄。藉此,即便使第5層16e變薄,亦可更確實地使除第5層16e以外之層合金化。因此,可更進一步確實地使密接膜13合金化,可更進一步確實地提高接合力。In addition, in the second layer portion 16 of the adhesive film 13, the layer located on the outside becomes thinner. Thereby, even if the fifth layer 16e is made thin, the layers other than the fifth layer 16e can be alloyed more reliably. Therefore, the adhesion film 13 can be alloyed more reliably, and the bonding force can be improved more reliably.

再者,於第2層部分16中,亦可為第5層16e為最薄之層,且至少2層為相同厚度。第2層部分16之各層之厚度之關係亦可為Ta ≧Tb ≧Tc ≧Td >TeFurthermore, in the second layer portion 16, the fifth layer 16e may be the thinnest layer, and at least two layers have the same thickness. The relationship between the thickness of each layer of the second layer portion 16 can also be T a ≧T b ≧T c ≧T d >T e .

(第3實施形態) 圖4係表示本發明之第3實施形態之稜鏡之密接膜附近之放大剖視圖。密接膜之各層之厚度可自第1實施形態中之厚度如下述般變更。例如,本實施形態之稜鏡21亦可設為下述構成:於密接膜23之第2層部分26中,複數個Au層之厚度互為相同,且複數個Sn層之厚度為越位於外側則越厚。具體而言,於將第1層26a之厚度設為Ta 、將第2層26b之厚度設為Tb 、將第3層26c之厚度設為Tc 、將第4層26d之厚度設為Td 、將第5層26e之厚度設為Te 時,Au層之厚度為Ta =Tc =Te ,Sn層之厚度為Tb <Td 。上述以外之點中,本實施形態之稜鏡21具有與第1實施形態之稜鏡1同樣之構成。(Third Embodiment) Fig. 4 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the scallop in the third embodiment of the present invention. The thickness of each layer of the adhesive film can be changed from the thickness in the first embodiment as follows. For example, the 稜鏡 21 of this embodiment can also be configured as follows: in the second layer portion 26 of the adhesive film 23, the thickness of the plurality of Au layers is the same as each other, and the thickness of the plurality of Sn layers is located on the outer side The thicker. Specifically, in the thickness of the first layer 1 26a is set to T a, the thickness of the second layer 2 26b is set to T b, the thickness of the layer 3 26c to T c, the thickness of the fourth layer 26d to T d , when the thickness of the fifth layer 26e is set to T e , the thickness of the Au layer is T a =T c =T e , and the thickness of the Sn layer is T b <T d . In points other than the above, the 稜鏡 21 of the present embodiment has the same configuration as the 稜鏡 1 of the first embodiment.

即便於本實施形態中,亦可與第1實施形態同樣地,於不會伴隨密接膜23全體之熔融流動之情況下將稜鏡21接合於封裝體等。又,於密接膜23已合金化時,相較於內側,可提高外側之Sn之重量比,可更進一步有效地提高稜鏡21之位置精度。Even in this embodiment, as in the first embodiment, the scallop 21 can be joined to the package or the like without being accompanied by the melt flow of the entire adhesive film 23. In addition, when the adhesion film 23 is alloyed, the weight ratio of Sn on the outer side can be increased compared to the inner side, and the position accuracy of the stalk 21 can be further effectively improved.

(第4實施形態) 圖5係表示本發明之第4實施形態之稜鏡之密接膜附近之放大剖視圖。密接膜之各層之厚度可自第1實施形態中之厚度如下述般變更。例如,本實施形態之稜鏡31亦可設為下述構成:於密接膜33之第2層部分36中,複數個Au層之厚度係越位於外側則越薄,且複數個Sn層之厚度互為相同。具體而言,於將第1層36a之厚度設為Ta 、將第2層36b之厚度設為Tb 、將第3層36c之厚度設為Tc 、將第4層36d之厚度設為Td 、將第5層36e之厚度設為Te 時,Au層之厚度為Ta >Tc >Te ,Sn層之厚度為Tb =Td 。除上述以外之點,本實施形態之稜鏡31具有與第1實施形態之稜鏡1同樣之構成。(Fourth Embodiment) Fig. 5 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the scallop in the fourth embodiment of the present invention. The thickness of each layer of the adhesive film can be changed from the thickness in the first embodiment as follows. For example, the 稜鏡 31 of the present embodiment can also be configured as follows: In the second layer portion 36 of the adhesive film 33, the thickness of the plurality of Au layers becomes thinner as the outer side, and the thickness of the plurality of Sn layers They are the same. Specifically, in the thickness of the first layer 1 36a is set to T a, the thickness of the second layer 2 36b is set to T b, the thickness of the layer 3 36c to T c, the thickness of the fourth layer 36d to when T d, the thickness of the fifth layer 36e is set to T e, the thickness of the Au layer as T a> T c> T e , the thickness of the Sn layer is T b = T d. Except for the above-mentioned points, the 稜鏡 31 of the present embodiment has the same configuration as the 稜鏡 1 of the first embodiment.

即便於本實施形態中,亦可與第1實施形態同樣地,於不會伴隨密接膜33全體之熔融流動之情況下將稜鏡31接合於封裝體等。又,於密接膜33已合金化時,相較於內側,可提高外側之Sn之重量比,可更進一步有效地提高稜鏡31之位置精度。Even in this embodiment, as in the first embodiment, the scallop 31 can be bonded to the package or the like without being accompanied by the melt flow of the entire adhesive film 33. In addition, when the adhesion film 33 is alloyed, the weight ratio of Sn on the outer side can be increased compared to the inner side, and the position accuracy of the stalk 31 can be further effectively improved.

(第5實施形態) 圖6係表示本發明之第5實施形態之稜鏡之密接膜附近之放大剖視圖。如圖6所示,本實施形態之稜鏡41於密接膜43具有積層於第1層部分5與第2層部分6之間之中間層部分47之點,與第1實施形態不同。除上述以外之點,本實施形態之稜鏡41具有與第1實施形態之稜鏡1同樣之構成。(Fifth Embodiment) Fig. 6 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the scallop in the fifth embodiment of the present invention. As shown in FIG. 6, the adhesive film 43 of the present embodiment has an intermediate layer portion 47 laminated between the first layer portion 5 and the second layer portion 6 in the adhesive film 43, which is different from the first embodiment. Except for the above-mentioned points, the 稜鏡 41 of the present embodiment has the same configuration as the 稜鏡 1 of the first embodiment.

本實施形態中,第2層部分6介隔中間層部分47間接地積層於第1層部分5上。藉由密接膜43具有中間層部分47,第2層部分6之金屬不易擴散於第1層部分5。因此,密接膜43不易自稜鏡本體2剝離。In this embodiment, the second layer portion 6 is indirectly laminated on the first layer portion 5 via the intermediate layer portion 47. Since the adhesive film 43 has the intermediate layer portion 47, the metal of the second layer portion 6 is not easily diffused in the first layer portion 5. Therefore, the adhesive film 43 is not easily peeled off from the main body 2.

中間層部分47較佳為Ni層、Pt層、Pd層、Ni-Cr混合層或使該等組合而成之合金層。藉此,第2層部分6之金屬更進一步不易擴散於第1層部分5,密接膜43更進一步不易自稜鏡本體2剝離。The intermediate layer portion 47 is preferably a Ni layer, a Pt layer, a Pd layer, a Ni-Cr mixed layer, or an alloy layer formed by combining them. Thereby, the metal of the second layer portion 6 is further less likely to diffuse in the first layer portion 5, and the adhesive film 43 is further less likely to be peeled off from the main body 2.

再者,本發明中,Ni層係包含90重量%以上Ni之金屬層。又,Pt層係包含90重量%以上Pt之金屬層。又,Pd層係包含90重量%以上Pd之金屬層。該等作為障壁層發揮功能,認為藉由包含90重量%以上Ni、Pt、Pd或者其合金層,可發揮作為障壁層之功能。Furthermore, in the present invention, the Ni layer is a metal layer containing 90% by weight or more Ni. In addition, the Pt layer is a metal layer containing 90% by weight or more of Pt. In addition, the Pd layer is a metal layer containing 90% by weight or more of Pd. These functions as a barrier layer, and it is considered that by containing 90% by weight or more of Ni, Pt, Pd, or an alloy layer thereof, it can function as a barrier layer.

除此以外,與第1實施形態同樣地,可於不會伴隨密接膜43全體之熔融流動之情況下將稜鏡41接合於封裝體等。因此,可有效地提高稜鏡41之位置精度。Except for this, as in the first embodiment, it is possible to bond the scallop 41 to the package or the like without being accompanied by the melt flow of the entire adhesive film 43. Therefore, the position accuracy of the 稜鏡 41 can be effectively improved.

(第6實施形態) 圖7係本發明之第6實施形態之稜鏡之剖視圖。如圖7所示,本實施形態之稜鏡51於反射膜4設置於稜鏡本體2之斜面2b及上表面2c之點,與第1實施形態不同。具體而言,反射膜4自斜面2b至上表面2c連續地設置。除上述以外之點,本實施形態之稜鏡51具有與第1實施形態之稜鏡1同樣之構成。(The sixth embodiment) Fig. 7 is a cross-sectional view of a scorpion in the sixth embodiment of the present invention. As shown in FIG. 7, the ridge 51 of this embodiment is different from the first embodiment at the point where the reflective film 4 is provided on the inclined surface 2 b and the upper surface 2 c of the ridge body 2. Specifically, the reflective film 4 is continuously provided from the inclined surface 2b to the upper surface 2c. Except for the points described above, the ridge 51 of the present embodiment has the same configuration as the ridge 1 of the first embodiment.

即便於本實施形態中,由於具有與第1實施形態同樣之密接膜3,故亦可有效地提高稜鏡51之位置精度。Even in this embodiment, since it has the same adhesive film 3 as that of the first embodiment, the position accuracy of the ridge 51 can be effectively improved.

較理想為一面藉由攝影機對稜鏡51之位置進行視認,一面實施稜鏡51之安裝。藉此,可提高稜鏡51之位置精度。進而,本實施形態中,反射膜4設置於稜鏡本體2之上表面2c。藉此,藉由反射膜4將光向攝影機側反射。因此,可提高稜鏡51之亮度,可容易地藉由攝影機對稜鏡51進行視認。因此,可更確實地進行稜鏡51之位置確認,可更確實地提高稜鏡51之位置精度。It is more ideal to visually recognize the position of the ridge 51 with a camera, and implement the installation of the ridge 51 at the same time. In this way, the position accuracy of the 稜鏡 51 can be improved. Furthermore, in this embodiment, the reflective film 4 is provided on the upper surface 2c of the main body 2. Thereby, the light is reflected toward the camera side by the reflective film 4. Therefore, the brightness of the scallop 51 can be increased, and the scallop 51 can be easily visualized by the camera. Therefore, it is possible to more reliably confirm the position of the pinhole 51, and it is possible to more reliably improve the position accuracy of the pinhole 51.

本實施形態中,反射膜4設置於稜鏡本體2之上表面2c之整個面。當然,反射膜4亦可設置於上表面2c之一部分。圖8所示之第6實施形態之變化例之稜鏡61中,反射膜4自稜鏡本體2之斜面到達至上表面2c之一部分。即便於該情形時,亦可於安裝時,更確實地進行位置確認,可更確實地提高稜鏡61之位置精度。In this embodiment, the reflective film 4 is provided on the entire surface of the upper surface 2c of the main body 2. Of course, the reflective film 4 can also be provided on a part of the upper surface 2c. In the ridge 61 of the modified example of the sixth embodiment shown in FIG. 8, the reflective film 4 reaches a part of the upper surface 2c from the inclined surface of the ridge body 2. Even in this case, the position can be confirmed more reliably at the time of installation, and the position accuracy of 稜鏡61 can be improved more reliably.

圖7所示之稜鏡51中,斜面2b及上表面2c之反射膜4一體地設置。再者,設置於斜面2b之反射膜4與設置於上表面2c之反射膜4亦可為不同體。In the ridge 51 shown in FIG. 7, the inclined surface 2b and the reflective film 4 of the upper surface 2c are integrally provided. Furthermore, the reflective film 4 provided on the inclined surface 2b and the reflective film 4 provided on the upper surface 2c may also be different bodies.

(光裝置) (第7實施形態) 圖9係本發明之第7實施形態之光裝置之剖視圖。如圖9所示,光裝置70具備第1實施形態之稜鏡1、光學元件74、及收容稜鏡1及光學元件74之封裝體75。(Light device) (The seventh embodiment) Fig. 9 is a cross-sectional view of an optical device according to a seventh embodiment of the present invention. As shown in FIG. 9, the optical device 70 includes the optical element 1, an optical element 74 of the first embodiment, and a package 75 that houses the optical element 1 and the optical element 74.

本實施形態中,光學元件74係將光出射至稜鏡1之光源。光源無特別限定,可使用例如LD或LED(Light Emitting Diode,發光二極體)等。再者,光學元件74亦可為接收來自稜鏡1之光之受光元件。In this embodiment, the optical element 74 emits light to the light source of the beam 1. The light source is not particularly limited, and, for example, LD or LED (Light Emitting Diode) can be used. Furthermore, the optical element 74 may also be a light-receiving element that receives light from the beam 1.

封裝體75係具有底部76及配置於底部76上之側壁部77之容器狀之構件。封裝體75例如包含陶瓷材料,具體而言包含氧化鋁或氮化鋁等。底部76具有安裝面76a。於底部76之安裝面76a上配置有光學元件74及稜鏡1。側壁部77具有內表面77a及外表面。於底部76之安裝面76a及側壁部77之內表面77a設置有金屬膜78。具體的而言,本實施形態中,金屬膜78係Au膜。再者,金屬膜78不限定於Au膜。The package body 75 is a container-shaped member having a bottom 76 and a side wall 77 disposed on the bottom 76. The package 75 includes, for example, a ceramic material, specifically, aluminum oxide, aluminum nitride, or the like. The bottom 76 has a mounting surface 76a. The mounting surface 76a of the bottom 76 is provided with the optical element 74 and the optical element 1. The side wall 77 has an inner surface 77a and an outer surface. A metal film 78 is provided on the mounting surface 76 a of the bottom 76 and the inner surface 77 a of the side wall 77. Specifically, in this embodiment, the metal film 78 is an Au film. In addition, the metal film 78 is not limited to an Au film.

稜鏡1藉由密接膜3接合於封裝體75之安裝面76a。光學元件74無特別限定,例如亦可藉由焊料等接合於安裝面76a。The 稜鏡 1 is bonded to the mounting surface 76 a of the package body 75 by the adhesive film 3. The optical element 74 is not particularly limited. For example, it may be joined to the mounting surface 76a by solder or the like.

封裝體75亦並非必須具有金屬膜78。當然,封裝體75較佳為如本實施形態般具有金屬膜78。藉由使稜鏡1之密接膜3與金屬膜78合金化,可更確實且有效地提高稜鏡1與封裝體75間之接合力。此種構成尤其對於稜鏡1與封裝體75之熱膨脹率差相對較大之情形有效。The package body 75 does not necessarily have the metal film 78 either. Of course, the package body 75 preferably has the metal film 78 as in the present embodiment. By alloying the adhesion film 3 of the metal film 1 and the metal film 78, the bonding force between the metal film 1 and the package body 75 can be improved more reliably and effectively. Such a configuration is particularly effective when the difference in thermal expansion coefficient between the core 1 and the package body 75 is relatively large.

金屬膜78較佳為Au膜。藉此,金屬膜78不易發生氧化。因此,於製造光裝置70時,可更確實地提高稜鏡1與封裝體75間之接合力。The metal film 78 is preferably an Au film. Thereby, the metal film 78 is unlikely to be oxidized. Therefore, when the optical device 70 is manufactured, the bonding force between the horn 1 and the package body 75 can be improved more reliably.

本實施形態中,於底部76之安裝面76a之整個面及側壁部77之內表面77a設置有金屬膜78。當然,金屬膜78只要至少設置於配置稜鏡1之部分即可。In this embodiment, a metal film 78 is provided on the entire surface of the mounting surface 76 a of the bottom 76 and the inner surface 77 a of the side wall 77. Of course, the metal film 78 only needs to be provided at least on the part where the frame 1 is arranged.

於封裝體75之側壁部77上,以將光學元件74及稜鏡1密封之方式設置有蓋體79。蓋體79無特別限定,本實施形態中係玻璃蓋。On the side wall 77 of the package body 75, a cover 79 is provided in a manner of sealing the optical element 74 and the scallop 1. The lid body 79 is not particularly limited, and in this embodiment, it is a glass lid.

蓋體79與封裝體75之接合方法無特別限定,本實施形態中,例如藉由SnNi接合進行接合。於該情形時,由於於接合後不易產生氣體,故於稜鏡1之反射膜4不易附著雜質,不易產生反射率之劣化。上述接合方法係一例,亦可藉由SnAg接合、SnAgCu接合進行接合。The method of joining the lid 79 and the package 75 is not particularly limited. In this embodiment, the joining is performed by, for example, SnNi joining. In this case, since gas is not likely to be generated after bonding, impurities are not easily attached to the reflective film 4 of the 稜鏡 1, and the reflectance is not easily deteriorated. The bonding method described above is an example, and bonding may be performed by SnAg bonding or SnAgCu bonding.

如圖9所示,自光學元件74出射之光A於稜鏡1反射,並通過蓋體79向光裝置70外出射。As shown in FIG. 9, the light A emitted from the optical element 74 is reflected on the light beam 1 and exits the light device 70 through the cover 79.

由於光裝置70具有第1實施形態之稜鏡1,故可有效地提高光裝置70中之稜鏡1之位置精度。Since the optical device 70 has the ridge 1 of the first embodiment, the position accuracy of the ridge 1 in the optical device 70 can be effectively improved.

光裝置70可使用於多晶片。多晶片例如具備安裝基板、與配置於安裝基板上之複數個光裝置70。由於多晶片之光裝置具有第1實施形態之稜鏡1,故即便於多晶片中,亦可有效地提高稜鏡1之位置精度。The optical device 70 can be used for multiple wafers. The multi-chip includes, for example, a mounting substrate and a plurality of optical devices 70 arranged on the mounting substrate. Since the multi-chip optical device has the ridge 1 of the first embodiment, even in a multi-chip, the position accuracy of the ridge 1 can be effectively improved.

(稜鏡) (第8實施形態) 圖10係第8實施形態之稜鏡之剖視圖。如圖10所示,本實施形態之稜鏡於密接膜83A之第2層部分86A具有應力緩和層87A之點,與第1實施形態不同。具體而言,應力緩和層87A相當於作為複數個Au層中之一層之第3層。除上述以外之點,本實施形態之稜鏡具有與第1實施形態之稜鏡1同樣之構成。(稜鏡) (Eighth Embodiment) Fig. 10 is a cross-sectional view of the eighth embodiment. As shown in FIG. 10, the second embodiment of this embodiment is different from the first embodiment in that the second layer portion 86A of the adhesion film 83A has a stress relaxation layer 87A. Specifically, the stress relaxation layer 87A corresponds to the third layer which is one of the Au layers. Except for the above-mentioned points, the 稜鏡 of this embodiment has the same structure as the 稜鏡 1 of the first embodiment.

應力緩和層87A之厚度與作為其他Au層之第1層6a及第5層6e之平均厚度不同。更具體而言,應力緩和層87A之厚度厚於第2層部分86A中之其他Au層之平均厚度。The thickness of the stress relaxation layer 87A is different from the average thickness of the first layer 6a and the fifth layer 6e which are other Au layers. More specifically, the thickness of the stress relaxation layer 87A is thicker than the average thickness of the other Au layers in the second layer portion 86A.

此處,Au層與Sn層具有相互逆向之應力。於第2層部分之Au層及Sn層中之一者之應力大於另一者之應力之情形時,於將稜鏡接合於封裝體時,對封裝體施加應力。第2層部分中之Au層及Sn層之層越多,則應力越大。Here, the Au layer and the Sn layer have stresses in opposite directions. When the stress of one of the Au layer and the Sn layer of the second layer portion is greater than the stress of the other, stress is applied to the package when bonding the stalk to the package. The more Au and Sn layers in the second layer portion, the greater the stress.

與此相對,本實施形態中,第2層部分86A具有應力緩和層87A。藉此,可使複數個Au層之應力之合計與複數個Sn層之應力之合計之大小關係接近於相等關係。因此,可緩和於安裝稜鏡時施加於封裝體之應力。因此,稜鏡不易自封裝體剝離。In contrast, in this embodiment, the second layer portion 86A has a stress relaxation layer 87A. Thereby, the magnitude relationship between the sum of the stresses of the plurality of Au layers and the sum of the stresses of the plurality of Sn layers can be close to an equal relationship. Therefore, the stress applied to the package body during mounting can be relieved. Therefore, it is not easy to peel off from the package.

藉由密接膜83A具有應力緩和層87A,可將Au層之應力之合計調整至較大,故本實施形態適合於Sn層之應力之合計較大之情形。應力緩和層87A之厚度較佳為其他Au層之平均厚度之1/2以上、5倍以下。藉此,於將稜鏡安裝於封裝體等時,可有效地緩和施加於封裝體等之應力,可有效地抑制稜鏡自封裝體等剝離。Since the adhesion film 83A has the stress relaxation layer 87A, the total stress of the Au layer can be adjusted to be larger, so this embodiment is suitable for the case where the total stress of the Sn layer is larger. The thickness of the stress relaxation layer 87A is preferably 1/2 or more and 5 times or less of the average thickness of other Au layers. As a result, when mounting the screw on the package, etc., the stress applied to the package can be effectively relieved, and the peeling of the screw from the package can be effectively suppressed.

例如,亦可使除應力緩和層87A以外之複數個Au層之厚度均勻,且使複數個Sn層之厚度均勻。於該情形時,於形成密接膜93時,只要僅使應力緩和層87A之厚度與其他Au層之厚度不同即可。因此,可簡化製造步驟。因此,可提高生產性,且稜鏡不易自封裝體等剝離。當然,除應力緩和層87A以外之複數個Au層之厚度及複數個Sn層之厚度亦可不均勻。For example, the thickness of the Au layers other than the stress relaxation layer 87A can be made uniform, and the thickness of the Sn layers can be made uniform. In this case, when forming the adhesive film 93, only the thickness of the stress relaxation layer 87A may be different from the thickness of other Au layers. Therefore, the manufacturing steps can be simplified. Therefore, productivity can be improved, and it is not easy to peel from the package or the like. Of course, the thickness of the Au layers and the thickness of the Sn layers other than the stress relaxation layer 87A may also be uneven.

進而,即便於本實施形態中,亦可與第1實施形態同樣地,於不會伴隨密接膜83A之熔融之情況下將稜鏡接合於封裝體等。因此,可有效地提高稜鏡之位置精度。Furthermore, even in this embodiment, as in the first embodiment, it is possible to bond the scallop to the package or the like without the melting of the adhesive film 83A. Therefore, it can effectively improve the position accuracy of 稜鏡.

以下,表示有僅應力緩和層之構成與本實施形態不同之第9~第11實施形態。即便於第9~第11實施形態中,亦可與本實施形態同樣地,有效地提高稜鏡之位置精度,且稜鏡不易自封裝體等剝離。Hereinafter, there are shown the ninth to eleventh embodiments that differ only in the structure of the stress relaxation layer from this embodiment. Even in the ninth to eleventh embodiments, as in the present embodiment, the position accuracy of the scallops can be effectively improved, and the scallops are not easily peeled from the package or the like.

(第9實施形態) 圖11係第9實施形態之稜鏡之剖視圖。如圖11所示,即便於本實施形態中,密接膜83B之第2層部分86B中之應力緩和層87B,亦相當於作為複數個Au層中之一層之第3層。應力緩和層87B之厚度薄於第2層部分86A中之除應力緩和層87B以外之Au層之平均厚度。(Ninth Embodiment) Figure 11 is a cross-sectional view of the ninth embodiment. As shown in FIG. 11, even in this embodiment, the stress relaxation layer 87B in the second layer portion 86B of the adhesive film 83B corresponds to the third layer which is one of the plurality of Au layers. The thickness of the stress relaxation layer 87B is thinner than the average thickness of the Au layer in the second layer portion 86A except for the stress relaxation layer 87B.

藉由密接膜83B具有應力緩和層87B,可將Au層之應力之合計向較小之方調整,故本實施形態適合於Sn層之應力之合計較小之情形。應力緩和層87B之厚度較佳為其他Au層之平均厚度之1/5以上、1/2以下,更佳為1/5以上、1/4以下。藉此,於將稜鏡安裝於封裝體等時,可有效地緩和施加於封裝體等之應力,可有效地抑制稜鏡自封裝體等剝離。Since the adhesion film 83B has the stress relaxation layer 87B, the total stress of the Au layer can be adjusted to a smaller side, so this embodiment is suitable for the case where the total stress of the Sn layer is smaller. The thickness of the stress relaxation layer 87B is preferably 1/5 or more and 1/2 or less of the average thickness of other Au layers, more preferably 1/5 or more and 1/4 or less. As a result, when mounting the screw on the package, etc., the stress applied to the package can be effectively relieved, and the peeling of the screw from the package can be effectively suppressed.

(第10實施形態) 圖12係第10實施形態之稜鏡之剖視圖。如圖12所示,本實施形態之密接膜83C之第2層部分86C中之應力緩和層87C,相當於作為複數個Sn層中之一層之第4層。應力緩和層87C之厚度厚於第2層部分86C中之除應力緩和層87C以外之Sn層之平均厚度。(Tenth Embodiment) Fig. 12 is a cross-sectional view of the tenth embodiment of the 稜鏡. As shown in FIG. 12, the stress relaxation layer 87C in the second layer portion 86C of the adhesive film 83C of this embodiment corresponds to the fourth layer which is one of the plural Sn layers. The thickness of the stress relaxation layer 87C is thicker than the average thickness of the Sn layer in the second layer portion 86C except for the stress relaxation layer 87C.

藉由密接膜83C具有應力緩和層87C,可將Sn層之應力之合計向較大之方調整,故本實施形態適合於Au層之應力之合計較大之情形。應力緩和層87C之厚度較佳為其他Sn層之平均厚度之1/2以上、5倍以下。藉此,於將稜鏡安裝於封裝體等時,可有效地緩和施加於封裝體等之應力,可有效地抑制稜鏡自封裝體等剝離。Since the adhesion film 83C has the stress relaxation layer 87C, the total stress of the Sn layer can be adjusted to the larger side, so this embodiment is suitable for the case where the total stress of the Au layer is larger. The thickness of the stress relaxation layer 87C is preferably 1/2 or more and 5 times or less of the average thickness of other Sn layers. As a result, when mounting the screw on the package, etc., the stress applied to the package can be effectively relieved, and the peeling of the screw from the package can be effectively suppressed.

(第11實施形態) 圖13係第11實施形態之稜鏡之剖視圖。如圖13所示,即便於本實施形態,密接膜83D之第2層部分86D中之應力緩和層87D,亦相當於作為複數個Sn層中之一層之第4層。應力緩和層87D之厚度薄於第2層部分86D中之除應力緩和層87D以外之Sn層之平均厚度。(Eleventh embodiment) Figure 13 is a cross-sectional view of the eleventh embodiment. As shown in FIG. 13, even in this embodiment, the stress relaxation layer 87D in the second layer portion 86D of the adhesive film 83D corresponds to the fourth layer which is one of the plurality of Sn layers. The thickness of the stress relaxation layer 87D is thinner than the average thickness of the Sn layer in the second layer portion 86D except for the stress relaxation layer 87D.

藉由密接膜83D具有應力緩和層87D,可將Sn層之應力之合計向較小之方調整,故本實施形態適合於Au層之應力之合計較小之情形。應力緩和層87D之厚度較佳為其他Sn層之平均厚度之1/5以上、1/2以下,更佳為1/5以上、1/3以下。藉此,於將稜鏡安裝於封裝體等時,可有效地緩和施加於封裝體等之應力,可有效地抑制稜鏡自封裝體等剝離。Since the adhesion film 83D has the stress relaxation layer 87D, the total stress of the Sn layer can be adjusted to a smaller side, so this embodiment is suitable for the case where the total stress of the Au layer is smaller. The thickness of the stress relaxation layer 87D is preferably 1/5 or more and 1/2 or less of the average thickness of other Sn layers, more preferably 1/5 or more and 1/3 or less. As a result, when mounting the screw on the package, etc., the stress applied to the package can be effectively relieved, and the peeling of the screw from the package can be effectively suppressed.

上述各實施形態中,表示密接膜之第2層部分具有Au層及Sn層中之至少一層之例。再者,密接膜之第2層部分中,Au層及Sn層亦可合金化。以下表示該例。In each of the foregoing embodiments, the second layer portion of the adhesive film has at least one of an Au layer and a Sn layer. Furthermore, in the second layer portion of the adhesive film, the Au layer and the Sn layer may also be alloyed. This example is shown below.

(第12實施形態) 圖14係第12實施形態之稜鏡之剖視圖。如圖14所示,本實施形態於第2層部分96係包含Au及Sn之合金之Au-Sn層之點及密接膜93具有最外層部分98之點,與第1實施形態不同。最外層部分98積層於第2層部分96上。最外層部分98係Au層。除上述以外之點,本實施形態之稜鏡91具有與第1實施形態之稜鏡1同樣之構成。(12th embodiment) Figure 14 is a cross-sectional view of the twelfth embodiment. As shown in FIG. 14, this embodiment differs from the first embodiment in that the second layer portion 96 is an Au-Sn layer of an alloy of Au and Sn and the adhesive film 93 has the outermost portion 98. The outermost layer portion 98 is laminated on the second layer portion 96. The outermost portion 98 is an Au layer. Except for the above-mentioned points, the 稜鏡 91 of this embodiment has the same structure as the 稜鏡 1 of the first embodiment.

於形成密接膜93之第2層部分96時,例如只要將Au層及Sn層交替地積層,其次對積層之Au層及Sn層進行加熱即可。藉此,藉由使Au層及Sn層合金化,可形成第2層部分96。When forming the second layer portion 96 of the adhesive film 93, for example, the Au layer and the Sn layer are alternately laminated, and then the laminated Au layer and the Sn layer may be heated. Thereby, the second layer portion 96 can be formed by alloying the Au layer and the Sn layer.

本實施形態中,最外層部分98係密接膜93之最外層。最外層部分98例如可藉由濺鍍法或真空蒸鍍法等形成。再者,密接膜93亦可不具有最外層部分98。於該情形時,與其他第1實施形態等同樣地,第2層部分之最外層係密接膜之最外層。再者,具體而言,如本實施形態般,於第2層部分96係Au-Sn層,且不具有最外層部分98之情形時,Au-Sn層係最外層。In this embodiment, the outermost layer portion 98 is the outermost layer of the adhesive film 93. The outermost layer portion 98 can be formed by, for example, a sputtering method or a vacuum evaporation method. Furthermore, the adhesive film 93 may not have the outermost layer portion 98. In this case, the outermost layer of the second layer portion is the outermost layer of the adhesive film, similarly to the other first embodiment. Furthermore, specifically, as in this embodiment, when the second layer portion 96 is an Au-Sn layer and does not have the outermost portion 98, the Au-Sn layer is the outermost layer.

稜鏡91與其他實施形態之稜鏡同樣地被安裝於封裝體等。即便於本實施形態中,亦可於不會伴隨密接膜93全體之熔融流動之情況下將稜鏡91接合於封裝體等。因此,可有效地提高稜鏡91之位置精度。The pin 91 is mounted on the package and the like in the same way as the pin of the other embodiments. Even in this embodiment, it is possible to bond the scallop 91 to the package or the like without being accompanied by the melt flow of the entire adhesive film 93. Therefore, the accuracy of the position of the 稜鏡 91 can be effectively improved.

密接膜93之第2層部分96之厚度較佳為2.5 μm以上、5.9 μm以下。藉此,於將稜鏡91安裝於封裝體等時,可充分地提高密接膜93之接合力。再者,第1層部分之厚度較佳為0.1以上、0.5 μm以下。密接膜之全體厚度較佳為3 μm以上、6 μm以下。The thickness of the second layer portion 96 of the adhesive film 93 is preferably 2.5 μm or more and 5.9 μm or less. Thereby, when mounting the ridge 91 to a package or the like, the bonding force of the adhesive film 93 can be sufficiently improved. Furthermore, the thickness of the first layer portion is preferably 0.1 or more and 0.5 μm or less. The overall thickness of the adhesive film is preferably 3 μm or more and 6 μm or less.

如本實施形態般密接膜93較佳為具有最外層部分98。本實施形態中,於作為Au-Sn層之第2層部分96上積層有作為Au層之最外層部分98。於該情形時,於安裝時與封裝體等相接之部分係最外層部分98。因此,於安裝時,密接膜93不易發生氧化,可更確實地提高密接膜93之接合力。It is preferable that the adhesive film 93 has the outermost layer part 98 like this embodiment. In this embodiment, the outermost layer portion 98 as the Au layer is laminated on the second layer portion 96 as the Au-Sn layer. In this case, the part that is in contact with the package body during installation is the outermost part 98. Therefore, during installation, the adhesion film 93 is less likely to be oxidized, and the adhesion force of the adhesion film 93 can be improved more reliably.

即便於本實施形態中,亦可與第5實施形態同樣地於第1層部分5與第2層部分96之間積層有中間層部分。藉此,第2層部分96之金屬不易擴散於第1層部分5。因此,密接膜93不易自稜鏡本體2剝離。Even in this embodiment, as in the fifth embodiment, an intermediate layer portion may be laminated between the first layer portion 5 and the second layer portion 96. Thereby, the metal of the second layer portion 96 is not easily diffused in the first layer portion 5. Therefore, the adhesive film 93 is not easily peeled off from the main body 2.

(第13實施形態) 圖15係第13實施形態之稜鏡之剖視圖。如圖15所示,本實施形態於在稜鏡本體2之底面2a與斜面2b之稜線設置有保護膜105之點,與第1實施形態不同。除上述以外之點,本實施形態之稜鏡具有與第1實施形態之稜鏡1同樣之構成。(13th embodiment) Fig. 15 is a cross-sectional view of the thirteenth embodiment. As shown in FIG. 15, this embodiment is different from the first embodiment at the point where a protective film 105 is provided on the ridge line between the bottom surface 2a and the inclined surface 2b of the main body 2. Except for the above-mentioned points, the 稜鏡 of this embodiment has the same structure as the 稜鏡 1 of the first embodiment.

保護膜105與反射膜4一體地設置。保護膜105連接於密接膜3。再者,保護膜105並非必須連接於密接膜3。保護膜105例如可藉由濺鍍法或真空蒸鍍法等形成。如本實施形態般,於保護膜105與反射膜4一體之情形時,亦可將保護膜105與反射膜4同時形成。The protective film 105 is provided integrally with the reflective film 4. The protective film 105 is connected to the adhesive film 3. Furthermore, the protective film 105 does not necessarily need to be connected to the adhesive film 3. The protective film 105 can be formed by, for example, a sputtering method, a vacuum evaporation method, or the like. As in this embodiment, when the protective film 105 and the reflective film 4 are integrated, the protective film 105 and the reflective film 4 may be formed at the same time.

當然,保護膜105亦可作為與反射膜4之不同體設置。或者,保護膜105亦可與密接膜3一體地設置。於該情形時,保護膜105可連接於反射膜4,或亦可不連接於反射膜4。於保護膜105與密接膜3一體之情形時,保護膜105具有與密接膜3同樣之複數層中之至少一層。Of course, the protective film 105 can also be provided as a different body from the reflective film 4. Alternatively, the protective film 105 may be provided integrally with the adhesive film 3. In this case, the protective film 105 may be connected to the reflective film 4 or may not be connected to the reflective film 4. When the protective film 105 and the adhesive film 3 are integrated, the protective film 105 has at least one of the same plural layers as the adhesive film 3.

藉由稜鏡具有保護膜105,不易於稜鏡本體2產生缺陷。保護膜105較佳為連接於反射膜4及密接膜3之兩者。藉此,更進一步不易於稜鏡本體2產生缺陷。With the protective film 105, the main body 2 is not prone to defects. The protective film 105 is preferably connected to both the reflective film 4 and the adhesive film 3. Thereby, it is further less likely to cause defects in the main body 2.

即便於本實施形態中,亦可與第1實施形態同樣地,於不會伴隨密接膜3熔融之情況下將稜鏡接合於封裝體等。因此,可有效地提高稜鏡之位置精度。Even in this embodiment, as in the first embodiment, the scallop can be bonded to the package or the like without the adhesion film 3 melting. Therefore, it can effectively improve the position accuracy of 稜鏡.

(接合力之評價) 圖1所示之第1實施形態之稜鏡1中,使作為密接膜3之最外層之第2層部分6之最外層之算術平均粗糙度Ra不同,確認與封裝體之接合性。再者,密接膜3之最外層設為Au層。具體而言,於將最外層之算術平均粗糙度Ra設為Ra時,滿足Ra≦0.05、0.05<Ra≦0.09、0.09<Ra≦0.15、0.15<Ra≦0.20。再者,本說明書中之算術平均粗糙度Ra基於JIS(Japanese Industrial Standards,日本工業標準) B 0601:2013。(Evaluation of bonding force) In the first embodiment shown in Fig. 1, the arithmetic average roughness Ra of the outermost layer of the second layer part 6, which is the outermost layer of the adhesive film 3, is different, and the adhesion with the package is confirmed. In addition, the outermost layer of the adhesive film 3 is an Au layer. Specifically, when the arithmetic mean roughness Ra of the outermost layer is set to Ra, Ra≦0.05, 0.05<Ra≦0.09, 0.09<Ra≦0.15, and 0.15<Ra≦0.20 are satisfied. Furthermore, the arithmetic average roughness Ra in this specification is based on JIS (Japanese Industrial Standards) B 0601:2013.

於接合性之確認中,使用具有經Au鍍覆之部分之氮化鋁基板作為封裝體。藉由加熱至約320℃而將稜鏡1接合於氮化鋁基板之經Au鍍覆之部分。其後,自稜鏡1之側面施加力。具體而言,對稜鏡1施加力直至稜鏡1之密接膜3自氮化鋁基板剝離、或稜鏡本體2自密接膜3剝離、或者不產生剝離而係稜鏡本體2被破壞為止。於使算術平均粗糙度Ra不同之各情形時,分別進行15次接合性之確認。將結果示於表1。In the confirmation of bonding, an aluminum nitride substrate with a portion plated with Au was used as the package. The Au-plated portion of the aluminum nitride substrate was bonded to the aluminum nitride substrate by heating to about 320°C. After that, force is applied from the side of 稜鏡1. Specifically, force is applied to the ridge 1 until the adhesive film 3 of the ridge 1 peels from the aluminum nitride substrate, or the ridge body 2 peels from the adhesive film 3, or the ridge body 2 is broken without peeling. In each case where the arithmetic average roughness Ra is different, the bondability is checked 15 times. The results are shown in Table 1.

表1中,接合性之評價係◎為最高,○為第二高,△為最低。所謂「未剝離」係指密接膜3未自封裝體剝離,包含稜鏡本體2被破壞之情形或稜鏡本體2自密接膜3剝離之情形。所謂「一部分剝離」係指密接膜3之一部分自封裝體剝離。In Table 1, ⊚ is the highest, ◯ is the second highest, and △ is the lowest. The so-called "unpeeled" means that the adhesive film 3 has not been peeled off from the package, and includes the case where the main body 2 is destroyed or the case where the main body 2 is peeled from the adhesive film 3. The term "partial peeling" means that a part of the adhesive film 3 is peeled from the package.

[表1] Ra[μm] 結果 評價 Ra≦0.05 未剝離:100% 0.05<Ra≦0.09 未剝離:50%,一部分剝離:50% 0.09<Ra≦0.15 未剝離:25%,一部分剝離:75% 0.15<Ra≦0.20 未剝離:10%以下,一部分剝離:90%以上 [Table 1] Ra[μm] result Evaluation Ra≦0.05 Unstripped: 100% 0.05<Ra≦0.09 Unpeeled: 50%, partly peeled: 50% 0.09<Ra≦0.15 Unpeeled: 25%, partly peeled: 75% 0.15<Ra≦0.20 Unpeeled: 10% or less, partly peeled: 90% or more

如表1所示,可知於使密接膜3之最外層之算術平均粗糙度Ra不同之任一情形時,均為「未剝離」或「一部分剝離」,密接膜3未完全自封裝體剝離。進而,可知最外層之算術平均粗糙度Ra之值越小,則「未剝離」之比率越大。As shown in Table 1, it can be seen that in any case where the arithmetic average roughness Ra of the outermost layer of the adhesive film 3 is different, it is "not peeled" or "partially peeled", and the adhesive film 3 is not completely peeled from the package. Furthermore, it can be seen that the smaller the value of the arithmetic mean roughness Ra of the outermost layer, the larger the ratio of "unpeeled".

密接膜3之最外層之算術平均粗糙度Ra較佳為0.20 μm以下,更佳為0.15 μm以下,進而佳為0.09 μm以下,特佳為0.05 μm以下。藉此,於安裝時,可更進一步有效地提高封裝體等與密接膜93之密接性。因此,可更進一步有效地提高接合力。The arithmetic average roughness Ra of the outermost layer of the adhesive film 3 is preferably 0.20 μm or less, more preferably 0.15 μm or less, still more preferably 0.09 μm or less, and particularly preferably 0.05 μm or less. Thereby, at the time of mounting, the adhesion between the package and the like and the adhesion film 93 can be further effectively improved. Therefore, the joining force can be further effectively improved.

同樣地,圖14所示之第12實施形態中,即便於密接膜93未具有最外層部分98之情形時,亦較佳為作為密接膜93最外層之第2層部分96之算術平均粗糙度Ra為上述範圍內。藉此,可更進一步有效地提高接合力。Similarly, in the twelfth embodiment shown in FIG. 14, even when the adhesive film 93 does not have the outermost portion 98, it is preferable to be the arithmetic average roughness of the second layer portion 96 of the outermost layer of the adhesive film 93 Ra is within the above range. Thereby, the joining force can be further effectively improved.

(應力之評價) 對稜鏡密接膜之應力之大小進行評價。如圖16所示,將於兩側面對向之方向上延伸之稜鏡之母材91A貼附於切割片。其次,沿著單點鏈線I-I,對稜鏡之母材91A進行切割而將之單片化。再者,單片化後之稜鏡具有與圖14所示之第12實施形態之稜鏡同樣之構成。於密接膜93之相對於封裝體之應力較大之情形時,由於單片化時應力被解除時之衝擊較大,故稜鏡易剝離。因此,剝離之比率越大,則密接膜93之應力越大。(Evaluation of stress) Evaluate the stress of the adhesive film. As shown in FIG. 16, the base material 91A of the scallop extending in the direction of the two sides is attached to the cutting sheet. Next, along the single-point chain line I-I, the base material 91A of the scallop is cut into individual pieces. In addition, the singularized scallop has the same structure as that of the twelfth embodiment shown in FIG. 14. In the case where the stress of the adhesive film 93 with respect to the package body is large, since the impact when the stress is released during singulation is large, the scallop is easy to peel off. Therefore, the greater the rate of peeling, the greater the stress of the adhesive film 93.

應力之評價係使密接膜93之第2層部分96之厚度等不同,於條件1~條件4下進行。具體而言,於條件1中,將第2層部分96之厚度設為3 μm,於條件2~4中,將第2層部分96之厚度設為6 μm。進而,於條件3及條件4中,於將稜鏡之母材91A貼附於切割片之前進行加熱處理。具體而言,條件3中,於氮氣氛圍下以200℃進行2小時加熱處理。條件4中,於氮氣氛圍下以200℃進行5小時加熱處理。將應力之大小之評價結果示於表2。The evaluation of the stress was performed under Condition 1 to Condition 4 by varying the thickness of the second layer portion 96 of the adhesive film 93. Specifically, in Condition 1, the thickness of the second layer portion 96 is set to 3 μm, and in Conditions 2 to 4, the thickness of the second layer portion 96 is set to 6 μm. Furthermore, in Condition 3 and Condition 4, heat treatment is performed before attaching the base material 91A of the scallop to the dicing sheet. Specifically, in condition 3, heat treatment was performed at 200°C for 2 hours under a nitrogen atmosphere. In condition 4, heat treatment was performed at 200°C for 5 hours in a nitrogen atmosphere. Table 2 shows the evaluation results of the magnitude of stress.

表2中,於◎之情形時應力最小,○為第二小,△為最大。In Table 2, the stress is the smallest in the case of ◎, ○ is the second smallest, and △ is the largest.

[表2] Au-Sn層之厚度[μm] 加熱處理 剝離率 評價 3 - 10~30% 6 - 30~50% 6 氮氣氛圍下200℃/2 h 20~40% 6 氮氣氛圍下200℃/5 h 0~5% [Table 2] Thickness of Au-Sn layer [μm] Heat treatment Peel rate Evaluation 3 - 10~30% 6 - 30~50% 6 200℃/2 h under nitrogen atmosphere 20~40% 6 200℃/5 h under nitrogen atmosphere 0~5%

如表2所示,於條件1~條件4下,稜鏡91自封裝體之剝離均被抑制為50%以下。進而,若比較第2層部分96之厚度不同之條件1及條件2,則第2層部分96較薄之條件1中,應力更進一步小。如此,可知若第2層部分96越薄,則密接膜93之應力越小。密接膜93之第2層部分96之厚度較佳為6 μm以下,更佳為3 μm以下。藉此,可更進一步減小應力。As shown in Table 2, under Condition 1 to Condition 4, the peeling of 稜鏡91 from the package was suppressed to 50% or less. Furthermore, comparing condition 1 and condition 2 in which the thickness of the second layer portion 96 is different, the stress is further reduced in condition 1 where the second layer portion 96 is thinner. Thus, it can be seen that the thinner the second layer portion 96 is, the smaller the stress of the adhesive film 93 is. The thickness of the second layer portion 96 of the adhesive film 93 is preferably 6 μm or less, more preferably 3 μm or less. Thereby, the stress can be further reduced.

若比較第2層部分96之厚度相同之條件2及條件3,則於將稜鏡之母材91A貼附於切割片之前進行加熱處理之條件3中,應力更進一步小。進而,若比較第2層部分96之厚度相同,且進行上述加熱處理之條件3及條件4,則上述加熱處理之時間較長之條件4中,應力更進一步小。如此,可知上述加熱處理之時間越長,則越可抑制應力。較佳為於將稜鏡貼附於切割片之前進行加熱處理,上述加熱處理較佳為進行2小時至6小時左右。藉此,可更進一步有效地抑制應力。Comparing Condition 2 and Condition 3 where the thickness of the second layer portion 96 is the same, condition 3 where the heat treatment is performed before attaching the base material 91A of the scallop to the dicing sheet, the stress is even smaller. Furthermore, if the thickness of the second layer portion 96 is the same, and the conditions 3 and 4 of the heat treatment are performed, the stress is further reduced in the condition 4 where the heat treatment time is longer. In this way, it can be seen that the longer the time of the heating treatment, the more the stress can be suppressed. It is preferable to perform heating treatment before attaching the scallop to the dicing sheet, and the heating treatment is preferably performed for about 2 to 6 hours. Thereby, the stress can be further effectively suppressed.

1:稜鏡 2:稜鏡本體 2a:底面 2b:斜面 2c:上表面 3:密接膜 4:反射膜 5:第1層部分 6:第2層部分 6a:第1層 6b:第2層 6c:第3層 6d:第4層 6e:第5層 11:稜鏡 13:密接膜 16:第2層部分 16a:第1層 16b:第2層 16c:第3層 16d:第4層 16e:第5層 21:稜鏡 23:密接膜 26:第2層部分 26a:第1層 26b:第2層 26c:第3層 26d:第4層 26e:第5層 31:稜鏡 33:密接膜 36:第2層部分 36a:第1層 36b:第2層 36c:第3層 36d:第4層 36e:第5層 41:稜鏡 43:密接膜 47:中間層部分 51:稜鏡 61:稜鏡 70:光裝置 74:光學元件 75:封裝體 76:底部 76a:安裝面 77:側壁部 77a:內表面 78:金屬膜 79:蓋體 83A:密接膜 83B:密接膜 83C:密接膜 83D:密接膜 86A:第2層部分 86B:第2層部分 86C:第2層部分 86D:第2層部分 87A:應力緩和層 87B:應力緩和層 87C:應力緩和層 87D:應力緩和層 91:稜鏡 91A:稜鏡之母材 93:密接膜 96:第2層部分 98:最外層部分 105:保護膜 1: 稜鏡 2: 稜鏡 body 2a: bottom surface 2b: inclined plane 2c: upper surface 3: Adhesive film 4: reflective film 5: Layer 1 part 6: Layer 2 part 6a: layer 1 6b: Layer 2 6c: layer 3 6d: layer 4 6e: layer 5 11: 鏡 13: Adhesive film 16: Layer 2 part 16a: layer 1 16b: Layer 2 16c: layer 3 16d: layer 4 16e: layer 5 21: 稜鏡 23: Adhesive film 26: Layer 2 part 26a: Level 1 26b: Layer 2 26c: layer 3 26d: layer 4 26e: layer 5 31: 鏡 33: Adhesive film 36: Layer 2 part 36a: Level 1 36b: Layer 2 36c: layer 3 36d: layer 4 36e: layer 5 41: 稜鏡 43: Adhesive film 47: middle layer part 51: Secret 61: Secret 70: Light Device 74: optical components 75: package body 76: bottom 76a: mounting surface 77: side wall 77a: inner surface 78: metal film 79: Lid 83A: Adhesive film 83B: Adhesive film 83C: Adhesive film 83D: Adhesive film 86A: Layer 2 part 86B: Layer 2 part 86C: Layer 2 part 86D: Layer 2 part 87A: Stress relaxation layer 87B: Stress relaxation layer 87C: Stress relaxation layer 87D: Stress relaxation layer 91: Secret 91A: The base material of 稜鏡 93: Adhesive film 96: Layer 2 part 98: The outermost part 105: Protective film

圖1係本發明之第1實施形態之稜鏡之剖視圖。 圖2係表示本發明之第1實施形態之稜鏡之密接膜附近之放大剖視圖。 圖3係表示本發明之第2實施形態之稜鏡之密接膜附近之放大剖視圖。 圖4係表示本發明之第3實施形態之稜鏡之密接膜附近之放大剖視圖。 圖5係表示本發明之第4實施形態之稜鏡之密接膜附近之放大剖視圖。 圖6係表示本發明之第5實施形態之稜鏡之密接膜附近之放大剖視圖。 圖7係本發明之第6實施形態之稜鏡之剖視圖。 圖8係本發明之第6實施形態之變化例之稜鏡之剖視圖。 圖9係本發明之第7實施形態之光裝置之剖視圖。 圖10係本發明之第8實施形態之稜鏡之剖視圖。 圖11係本發明之第9實施形態之稜鏡之剖視圖。 圖12係本發明之第10實施形態之稜鏡之剖視圖。 圖13係本發明之第11實施形態之稜鏡之剖視圖。 圖14係本發明之第12實施形態之稜鏡之剖視圖。 圖15係本發明之第13實施形態之稜鏡之剖視圖。 圖16係使用於應力之評價之稜鏡之母材之剖視圖。Figure 1 is a cross-sectional view of the first embodiment of the present invention. Fig. 2 is an enlarged cross-sectional view showing the vicinity of the adhesive film of 稜頡 in the first embodiment of the present invention. Fig. 3 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the 稜頡 in the second embodiment of the present invention. Fig. 4 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the 稜頡 in the third embodiment of the present invention. Fig. 5 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the scallop in the fourth embodiment of the present invention. Fig. 6 is an enlarged cross-sectional view showing the vicinity of the adhesive film of the scallop in the fifth embodiment of the present invention. Fig. 7 is a cross-sectional view of a scorpion in the sixth embodiment of the present invention. Fig. 8 is a cross-sectional view of a modified example of the sixth embodiment of the present invention. Fig. 9 is a cross-sectional view of an optical device according to a seventh embodiment of the present invention. Fig. 10 is a cross-sectional view of an eighth embodiment of the present invention. Figure 11 is a cross-sectional view of the ninth embodiment of the present invention. Figure 12 is a cross-sectional view of the tenth embodiment of the present invention. Figure 13 is a cross-sectional view of the eleventh embodiment of the present invention. Figure 14 is a cross-sectional view of the twelfth embodiment of the present invention. Fig. 15 is a cross-sectional view of the thirteenth embodiment of the present invention. Figure 16 is a cross-sectional view of the base material used for stress evaluation.

Claims (28)

一種稜鏡,其具備: 稜鏡本體,其具有底面及連接於上述底面之斜面;及 密接膜,其設置於上述底面;且 上述密接膜具有位於上述稜鏡本體側之第1層部分、與直接或間接地積層於上述第1層部分上之第2層部分, 上述第2層部分包含Au層及Sn層中之至少一層。A kind of 騜鏡, which has: The main body of the 稜鏡, which has a bottom surface and an inclined surface connected to the bottom surface; and The adhesive film is arranged on the bottom surface; and The adhesive film has a first layer portion located on the side of the main body of the 稜鏡, and a second layer portion directly or indirectly laminated on the first layer portion, The second layer portion includes at least one of an Au layer and a Sn layer. 如請求項1之稜鏡,其中於上述第2層部分中,上述Au層及上述Sn層交替地積層。Such as claim 1, wherein in the second layer portion, the Au layer and the Sn layer are alternately stacked. 如請求項1或2之稜鏡,其中上述第2層部分具有上述Au層及上述Sn層之兩者,於上述Au層與上述Sn層之間設置有包含Au及Sn之合金之Au-Sn層。Such as claim 1 or 2, wherein the second layer portion has both the Au layer and the Sn layer, and Au-Sn containing an alloy of Au and Sn is arranged between the Au layer and the Sn layer Floor. 如請求項1至3中任一項之稜鏡,其中於上述密接膜之積層方向上,於將遠離上述稜鏡本體之側設為外側時,上述第2層部分之最外層係上述Au層。Such as any one of claims 1 to 3, wherein in the lamination direction of the adhesive film, when the side away from the main body of the adhesive film is set to the outside, the outermost layer of the second layer part is the Au layer . 如請求項2至4中任一項之稜鏡,其中上述第2層部分具有複數個上述Au層及複數個上述Sn層之兩者,上述Au層及上述Sn層交替地積層, 上述第2層部分具有應力緩和層, 於上述應力緩和層為上述複數個Au層中之一層之情形時,上述應力緩和層之厚度與其他上述Au層之平均厚度不同, 於上述應力緩和層為上述複數個Sn層中之一層之情形時,上述應力緩和層之厚度與其他上述Sn層之平均厚度不同。According to any one of claims 2 to 4, wherein the second layer part has a plurality of the Au layers and a plurality of the Sn layers, and the Au layers and the Sn layers are alternately laminated, The above-mentioned second layer part has a stress relaxation layer, When the stress relaxation layer is one of the plurality of Au layers, the thickness of the stress relaxation layer is different from the average thickness of the other Au layers, When the stress relaxation layer is one of the plurality of Sn layers, the thickness of the stress relaxation layer is different from the average thickness of the other Sn layers. 如請求項5之稜鏡,其中上述應力緩和層之厚度為其他上述Au層或其他上述Sn層之平均厚度之1/2以上、5倍以下。Such as claim 5, wherein the thickness of the stress relaxation layer is more than 1/2 and less than 5 times the average thickness of the other Au layers or the other Sn layers. 如請求項5之稜鏡,其中上述應力緩和層之厚度為其他上述Au層或其他上述Sn層之平均厚度之1/5以上、1/2以下。Such as claim 5, wherein the thickness of the stress relaxation layer is more than 1/5 and less than 1/2 of the average thickness of the other Au layers or the other Sn layers. 如請求項1至4中任一項之稜鏡,其中於上述密接膜之積層方向上,於將遠離上述稜鏡本體之側設為外側時,上述第2層部分之最外層於上述第2層部分中為最薄之層。Such as the ridge of any one of claims 1 to 4, wherein in the lamination direction of the adhesive film, when the side away from the main body of the ridge is set to the outside, the outermost layer of the second layer part is on the second The thinnest layer in the layer part. 如請求項8之稜鏡,其中於上述第2層部分中,越位於外側之層則越薄。Such as claim 8, in which the layer on the outside of the second layer is thinner. 如請求項4之稜鏡,其中上述第2層部分具有複數個上述Au層及複數個上述Sn層之兩者,上述複數個Au層之厚度互為相同,且上述複數個Sn層之厚度為越位於外側則越厚。For example, the 稜鏡 of claim 4, wherein the second layer portion has a plurality of the Au layers and a plurality of the Sn layers, the thickness of the plurality of Au layers is the same as each other, and the thickness of the plurality of Sn layers is The thicker it is on the outside. 如請求項4之稜鏡,其中上述第2層部分具有複數個上述Au層及複數個上述Sn層之兩者,上述複數個Au層之厚度係越位於外側則越薄,且上述複數個Sn層之厚度互為相同。For example, the 稜鏡 of claim 4, wherein the second layer portion has a plurality of the Au layers and a plurality of the Sn layers, and the thickness of the plurality of Au layers is thinner as the outer side, and the plurality of Sn The thickness of the layers are the same. 如請求項1至11中任一項之稜鏡,其中上述第2層部分中之上述Au層及上述Sn層之合計層數為3層以上、99層以下。For example, according to any one of claims 1 to 11, the total number of layers of the Au layer and the Sn layer in the second layer part is 3 layers or more and 99 layers or less. 如請求項12之稜鏡,其中上述第2層部分中之上述Au層及上述Sn層之合計層數為15層以上、35層以下。For example, in claim 12, the total number of layers of the Au layer and the Sn layer in the second layer portion is 15 layers or more and 35 layers or less. 如請求項1至13中任一項之稜鏡,其中上述密接膜之全體厚度為1 μm以上、10 μm以下。According to any one of claims 1 to 13, wherein the overall thickness of the adhesive film is 1 μm or more and 10 μm or less. 如請求項1至14中任一項之稜鏡,其中上述第2層部分具有上述Au層及上述Sn層之兩者, 於將上述第2層部分中之Au之重量之合計設為MA 、將Sn之重量之合計設為MS 、將Au之重量相對於Au及Sn之重量之合計之比率設為MA /(MA +MS )時,比率MA /(MA +MS )為0.60以上、0.78以下。For example, in the 稜鏡 of any one of claims 1 to 14, wherein the second layer portion has both the Au layer and the Sn layer, and the total weight of Au in the second layer portion is set to M A 、When the total weight of Sn is set to M S , and the ratio of the weight of Au to the total weight of Au and Sn is set to M A /(M A +M S ), the ratio M A /(M A +M S ) It is 0.60 or more and 0.78 or less. 一種稜鏡,其係安裝於封裝體者,且具備: 稜鏡本體,其具有底面及連接於上述底面之斜面;及 密接膜,其設置於上述底面;且 上述密接膜具有位於上述稜鏡本體側之第1層部分、與直接或間接地積層於上述第1層部分上之第2層部分, 上述第2層部分係包含Au及Sn之合金之Au-Sn層, 上述密接膜之上述第2層部分之厚度為2.5 μm以上、5.9 μm以下。A kind of 鏡, which is installed in the package body, and has: The main body of the 稜鏡, which has a bottom surface and an inclined surface connected to the bottom surface; and The adhesive film is arranged on the bottom surface; and The adhesive film has a first layer portion located on the side of the main body of the 稜鏡, and a second layer portion directly or indirectly laminated on the first layer portion, The second layer is an Au-Sn layer containing an alloy of Au and Sn, The thickness of the second layer portion of the adhesive film is 2.5 μm or more and 5.9 μm or less. 如請求項16之稜鏡,其中於上述密接膜之積層方向上,於將遠離上述稜鏡本體之側設為外側時,上述密接膜具有作為上述密接膜之最外層且積層於上述第2層部分上之最外層部分, 上述最外層部分係Au層。Such as claim 16, wherein in the lamination direction of the adhesive film, when the side away from the main body of the adhesive film is set to the outside, the adhesive film has the outermost layer as the adhesive film and is laminated on the second layer The outermost part on the part, The outermost part described above is an Au layer. 如請求項1至17中任一項之稜鏡,其中於上述密接膜之積層方向上,於將遠離上述稜鏡本體之側設為外側時,上述密接膜之最外層之算術平均粗糙度Ra為0.20 μm以下。Such as any one of claims 1 to 17, wherein in the lamination direction of the adhesive film, when the side away from the body of the adhesive film is set to the outside, the arithmetic average roughness Ra of the outermost layer of the adhesive film It is 0.20 μm or less. 如請求項1至18中任一項之稜鏡,其中上述第1層部分係Cr層或Ti層或Ta層。According to any one of claims 1 to 18, the first layer is a Cr layer, Ti layer, or Ta layer. 如請求項1至19中任一項之稜鏡,其中上述密接膜進而具有積層於上述第1層部分與上述第2層部分之間之中間層部分。According to any one of claims 1 to 19, wherein the adhesive film further has an intermediate layer portion laminated between the first layer portion and the second layer portion. 如請求項20之稜鏡,其中上述中間層部分係Ni層、Pt層、Pd層、Ni-Cr混合層或將該等組合而成之合金層。For example, in claim 20, the intermediate layer is part of Ni layer, Pt layer, Pd layer, Ni-Cr mixed layer or alloy layer formed by combining them. 如請求項1至21中任一項之稜鏡,其中上述稜鏡本體具有上表面, 上述上表面與上述底面對向,且連接於上述斜面。For example, the 稜鏡 of any one of claims 1 to 21, wherein the 騜鏡 body has an upper surface, The upper surface faces the bottom surface and is connected to the inclined surface. 如請求項1至22中任一項之稜鏡,其中於上述稜鏡本體之上述斜面設置有反射膜。For example, the bevel of any one of claims 1-22, wherein a reflective film is provided on the inclined surface of the bevel body. 如請求項22之稜鏡,其中於上述稜鏡本體之上述斜面及上述上表面設置有反射膜。Such as claim 22, wherein a reflective film is provided on the inclined surface and the upper surface of the main body. 一種光裝置,其具備: 如請求項1至24中任一項之稜鏡; 光學元件,其將光出射至上述稜鏡或接收來自上述稜鏡之光;及 封裝體,其收容上述稜鏡及上述光學元件;且 上述稜鏡藉由上述密接膜接合於上述封裝體。An optical device including: Such as any one of claims 1 to 24: 稜鏡; An optical element that emits light to the above-mentioned ridge or receives light from the above-mentioned ridge; and A package that contains the above-mentioned ridge and the above-mentioned optical element; and The above-mentioned nipple is bonded to the above-mentioned package by the above-mentioned adhesive film. 一種稜鏡之製造方法,其係具備於具有底面及連接於上述底面之斜面之稜鏡本體之上述底面設置密接膜的步驟者;且 設置上述密接膜之步驟包含:於上述底面形成包含金屬材料之第1層部分之步驟;及直接或間接地將包含金屬材料之第2層部分積層於上述第1層部分上之步驟;且 上述第1層部分與上述第2層部分包含互不相同之成分之金屬材料, 上述第2層部分包含Au層及Sn層中之至少一層。A method for manufacturing a scallop, which is provided with the step of arranging an adhesive film on the bottom surface of the scallop body having a bottom surface and an inclined surface connected to the bottom surface; and The step of providing the adhesive film includes: forming a first layer portion including a metal material on the bottom surface; and directly or indirectly laminating a second layer portion including a metal material on the first layer portion; and The first layer portion and the second layer portion contain metal materials of different compositions, The second layer portion includes at least one of an Au layer and a Sn layer. 一種封裝裝置之製造方法,其具備: 準備如請求項1至24中任一項之稜鏡之步驟; 準備具有與上述稜鏡之接著面之封裝體之步驟; 以上述密接膜抵接於上述封裝體之上述接著面之方式,使上述稜鏡與上述封裝體抵接之步驟;及 對上述密接膜進行加熱,使上述稜鏡與上述封裝體接合之步驟。A manufacturing method of a packaging device, which includes: Prepare the steps of any one of claims 1 to 24; The step of preparing a package body with the bonding surface to the above-mentioned ridge; The step of contacting the scallop with the packaging body in such a way that the adhesive film abuts against the adhesive surface of the packaging body; and The step of heating the adhesive film to join the ridge and the package. 如請求項27之封裝裝置之製造方法,其中於上述封裝體之上述接著面形成有Au膜, 以上述密接膜全體不會熔融之溫度進行上述加熱,使上述稜鏡與上述封裝體接合。The method of manufacturing a package device of claim 27, wherein an Au film is formed on the bonding surface of the package body, The heating is performed at a temperature at which the entire adhesive film does not melt, and the scallop is joined to the package.
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