TW202013754A - 半導體裝置封裝件及其使用方法 - Google Patents

半導體裝置封裝件及其使用方法 Download PDF

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Publication number
TW202013754A
TW202013754A TW108118752A TW108118752A TW202013754A TW 202013754 A TW202013754 A TW 202013754A TW 108118752 A TW108118752 A TW 108118752A TW 108118752 A TW108118752 A TW 108118752A TW 202013754 A TW202013754 A TW 202013754A
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TW
Taiwan
Prior art keywords
glass substrate
semiconductor device
conductive
optical detector
optical
Prior art date
Application number
TW108118752A
Other languages
English (en)
Chinese (zh)
Inventor
維吉爾 奧拉羅
布倫特 拉森
Original Assignee
美商Ｔｔ電子公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商Ｔｔ電子公司 filed Critical 美商Ｔｔ電子公司
Publication of TW202013754A publication Critical patent/TW202013754A/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261—Processes for packaging MEMS devices
    • B81C1/00317—Packaging optical devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/93—Interconnections
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0006—Interconnects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/804—Containers or encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/50—Encapsulations or containers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0109—Bonding an individual cap on the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0172—Seals
    • B81C2203/019—Seals characterised by the material or arrangement of seals between parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/03—Bonding two components
    • B81C2203/033—Thermal bonding
    • B81C2203/036—Fusion bonding

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Micromachines (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
TW108118752A 2018-06-01 2019-05-30 半導體裝置封裝件及其使用方法 TW202013754A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/995,510 2018-06-01
US15/995,510 US10693020B2 (en) 2018-06-01 2018-06-01 Semiconductor device package and method for use thereof

Publications (1)

Publication Number Publication Date
TW202013754A true TW202013754A (zh) 2020-04-01

Family

ID=68693249

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108118752A TW202013754A (zh) 2018-06-01 2019-05-30 半導體裝置封裝件及其使用方法

Country Status (5)

Country Link
US (1) US10693020B2 (https=)
EP (1) EP3804478A4 (https=)
JP (1) JP2021525956A (https=)
TW (1) TW202013754A (https=)
WO (1) WO2019231919A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113200509B (zh) * 2021-04-08 2024-10-11 日月光半导体制造股份有限公司 电子元件及半导体封装装置
CN113200510B (zh) * 2021-04-29 2024-10-11 日月光半导体制造股份有限公司 半导体结构

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6140144A (en) * 1996-08-08 2000-10-31 Integrated Sensing Systems, Inc. Method for packaging microsensors
EP1041628A3 (en) * 1999-03-29 2008-05-28 Interuniversitair Microelektronica Centrum Vzw An image sensor ball grid array package and the fabrication thereof
JP4603231B2 (ja) * 2002-07-19 2010-12-22 パナソニック電工株式会社 火災感知器
JP2005045034A (ja) * 2003-07-22 2005-02-17 Nippon Aleph Corp フォトインタラプタ用光学装置
CA2468924A1 (en) * 2004-01-14 2005-07-14 Laser Diagnostic Instruments International Inc. A device and method for non-contact sensing of low-concentration and trace substances
US7442570B2 (en) * 2005-03-18 2008-10-28 Invensence Inc. Method of fabrication of a AL/GE bonding in a wafer packaging environment and a product produced therefrom
JP2009042469A (ja) * 2007-08-08 2009-02-26 Sharp Corp 光モジュール、光モジュールの製造方法、光モジュールを用いて構成された光・電子複合回路、およびその製造方法
US8809923B2 (en) * 2008-02-06 2014-08-19 Omnivision Technologies, Inc. Backside illuminated imaging sensor having a carrier substrate and a redistribution layer
JP2010021219A (ja) * 2008-07-09 2010-01-28 Nec Schott Components Corp パッケージングデバイス装置およびパッケージ用ベース部材
US20100289104A1 (en) * 2009-05-14 2010-11-18 Optopac Co., Ltd. Photosensor package
KR100976812B1 (ko) * 2010-02-08 2010-08-20 옵토팩 주식회사 전자 소자 패키지 및 그 제조 방법
KR100976813B1 (ko) * 2010-04-23 2010-08-20 옵토팩 주식회사 전자 소자 패키지 및 그 제조 방법
US8659148B2 (en) * 2010-11-30 2014-02-25 General Electric Company Tileable sensor array
US8476087B2 (en) * 2011-04-21 2013-07-02 Freescale Semiconductor, Inc. Methods for fabricating sensor device package using a sealing structure
US20130050227A1 (en) * 2011-08-30 2013-02-28 Qualcomm Mems Technologies, Inc. Glass as a substrate material and a final package for mems and ic devices
US8824706B2 (en) * 2011-08-30 2014-09-02 Qualcomm Mems Technologies, Inc. Piezoelectric microphone fabricated on glass
WO2013062533A1 (en) * 2011-10-25 2013-05-02 Intel Corporation Interposer for hermetic sealing of sensor chips and for their integration with integrated circuit chips
US9368429B2 (en) * 2011-10-25 2016-06-14 Intel Corporation Interposer for hermetic sealing of sensor chips and for their integration with integrated circuit chips
JP6027828B2 (ja) * 2012-09-14 2016-11-16 国立大学法人東北大学 素子の実装方法および光モジュールの製造方法
JP2017022056A (ja) * 2015-07-14 2017-01-26 日本放送協会 基板処理方法及びパッケージの気密封止方法
JP6246879B1 (ja) * 2016-09-20 2017-12-13 株式会社東芝 光半導体モジュール及びその製造方法

Also Published As

Publication number Publication date
US10693020B2 (en) 2020-06-23
WO2019231919A8 (en) 2021-02-11
JP2021525956A (ja) 2021-09-27
EP3804478A1 (en) 2021-04-14
WO2019231919A1 (en) 2019-12-05
EP3804478A4 (en) 2022-03-09
US20190371944A1 (en) 2019-12-05

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