TW201940417A - 含碳質膜之護膜及含碳質膜之護膜之製造方法 - Google Patents

含碳質膜之護膜及含碳質膜之護膜之製造方法 Download PDF

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Publication number
TW201940417A
TW201940417A TW108108008A TW108108008A TW201940417A TW 201940417 A TW201940417 A TW 201940417A TW 108108008 A TW108108008 A TW 108108008A TW 108108008 A TW108108008 A TW 108108008A TW 201940417 A TW201940417 A TW 201940417A
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TW
Taiwan
Prior art keywords
film
carbonaceous film
carbonaceous
thickness
less
Prior art date
Application number
TW108108008A
Other languages
English (en)
Chinese (zh)
Inventor
川島雄樹
村上睦明
Original Assignee
日商鐘化股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商鐘化股份有限公司 filed Critical 日商鐘化股份有限公司
Publication of TW201940417A publication Critical patent/TW201940417A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW108108008A 2018-03-14 2019-03-11 含碳質膜之護膜及含碳質膜之護膜之製造方法 TW201940417A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-047078 2018-03-14
JP2018047078A JP2021076620A (ja) 2018-03-14 2018-03-14 炭素質膜を含むペリクル及び炭素質膜を含むペリクルの製造方法

Publications (1)

Publication Number Publication Date
TW201940417A true TW201940417A (zh) 2019-10-16

Family

ID=67908112

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108108008A TW201940417A (zh) 2018-03-14 2019-03-11 含碳質膜之護膜及含碳質膜之護膜之製造方法

Country Status (3)

Country Link
JP (1) JP2021076620A (fr)
TW (1) TW201940417A (fr)
WO (1) WO2019176410A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220244634A1 (en) * 2021-01-29 2022-08-04 Taiwan Semiconductor Manufacturing Co., Ltd. Network type pellicle membrane and method for forming the same
WO2023008532A1 (fr) 2021-07-30 2023-02-02 信越化学工業株式会社 Film de pellicule, pellicule, plaque originale d'exposition à pellicule, procédé d'exposition, procédé de fabrication de semi-conducteur et procédé de fabrication de panneau d'affichage à cristaux liquides
JP7528393B1 (ja) 2024-03-29 2024-08-05 住友化学株式会社 カーボンナノチューブ集合体、カーボンナノチューブ分散液、導電材料、電極、二次電池、平面状集合体、フィルター、電磁波シールド及び極端紫外線用ペリクル

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101707763B1 (ko) * 2013-05-24 2017-02-16 미쯔이가가꾸가부시끼가이샤 펠리클 및 이것을 포함하는 ｅｕｖ 노광 장치
KR101648139B1 (ko) * 2013-08-21 2016-08-12 한화케미칼 주식회사 그래핀, 그래핀의 제조 방법, 및 제조 장치
JP6326056B2 (ja) * 2013-09-30 2018-05-16 三井化学株式会社 ペリクル膜、それを用いたペリクル、露光原版および露光装置、ならびに半導体装置の製造方法
WO2015178250A1 (fr) * 2014-05-19 2015-11-26 三井化学株式会社 Film pelliculaire, pellicule, plaque originale d'exposition, dispositif d'exposition, et procédé de fabrication de dispositif à semi-conducteur
KR101813185B1 (ko) * 2016-06-30 2018-01-30 삼성전자주식회사 포토마스크용 펠리클 및 이를 포함하는 노광 장치

Also Published As

Publication number Publication date
WO2019176410A1 (fr) 2019-09-19
JP2021076620A (ja) 2021-05-20

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