TW201919453A - Printed circuit board and method for manufacturing the same - Google Patents
Printed circuit board and method for manufacturing the same Download PDFInfo
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- TW201919453A TW201919453A TW107113328A TW107113328A TW201919453A TW 201919453 A TW201919453 A TW 201919453A TW 107113328 A TW107113328 A TW 107113328A TW 107113328 A TW107113328 A TW 107113328A TW 201919453 A TW201919453 A TW 201919453A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4697—Manufacturing multilayer circuits having cavities, e.g. for mounting components
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/025—Abrading, e.g. grinding or sand blasting
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Abstract
Description
以下說明是有關於一種印刷電路板及其製造方法。The following description relates to a printed circuit board and a method of manufacturing the same.
順應與資訊技術領域中已變得越來越多功能化、更輕、更薄且更小的行動電話及其他電子設備相關聯的技術要求,對在板中插入積體電路、半導體晶片、或例如主動裝置及被動裝置等各種電子組件的需求增加。近年來,已開發出各種在板中嵌置組件的方法。Adapting to the technical requirements associated with mobile phones and other electronic devices that have become more versatile, lighter, thinner and smaller in the information technology field, inserting integrated circuits, semiconductor wafers, or Demand for various electronic components such as active devices and passive devices has increased. In recent years, various methods of embedding components in panels have been developed.
形成各種空腔結構以將各種組件插入基底中。因此,需要各種加工技術。此外,亦需要一種防止電路由於加工而受到損壞的技術。Various cavity structures are formed to insert various components into the substrate. Therefore, various processing techniques are required. In addition, there is a need for a technique that prevents damage to the circuit due to processing.
美國專利第7886433號闡述一種製造嵌置有組件的印刷電路板的方法的實例。An example of a method of manufacturing a printed circuit board with components embedded is described in U.S. Patent No. 7,882,433.
提供本發明內容是為了以簡化形式引入下文在實施方式中所進一步闡述的一系列概念。本發明內容並非旨在辨識所主張主題的關鍵特徵或本質特徵,亦並非旨在用於幫助確定所主張主題的範圍。The Summary is provided to introduce a selection of concepts in the <Desc/Clms Page number> This Summary is not intended to identify key features or essential features of the claimed subject matter.
以下說明是欲提供一種印刷電路板及一種可精確地加工空腔結構而不在形成其中插入有電子組件的所述空腔結構的製程中損壞電路的製造所述印刷電路板的方法。The following description is intended to provide a printed circuit board and a method of manufacturing the printed circuit board that can accurately process the cavity structure without damaging the circuit in the process of forming the cavity structure in which the electronic component is inserted.
根據本發明的態樣,提供一種印刷電路板,所述印刷電路板包括:第一絕緣層;電路圖案,形成於所述第一絕緣層上且在所述第一絕緣層的一個表面上被暴露出;第二絕緣層,積層於所述第一絕緣層的一個表面上且具有暴露出所述電路圖案的空腔區域;以及絕緣體圖案,具有夾置於所述第一絕緣層與所述第二絕緣層之間的一個表面及自所述空腔區域的底表面突出且沿所述空腔區域的邊界形成的另一表面。According to an aspect of the present invention, a printed circuit board is provided, the printed circuit board including: a first insulating layer; a circuit pattern formed on the first insulating layer and on one surface of the first insulating layer Exposing; a second insulating layer laminated on one surface of the first insulating layer and having a cavity region exposing the circuit pattern; and an insulator pattern having the first insulating layer interposed therebetween One surface between the second insulating layers and another surface protruding from the bottom surface of the cavity region and formed along a boundary of the cavity region.
根據本發明的另一態樣,提供一種製造印刷電路板的方法,所述方法包括:在第一絕緣層的一個表面上形成電路圖案;在所述第一絕緣層上形成空腔區域的邊界並沿所述邊界形成絕緣體圖案;形成覆蓋所述空腔區域的保護層;在所述第一絕緣層的一個表面上形成第二絕緣層;沿所述絕緣體圖案移除所述第二絕緣層以形成所述空腔區域;以及移除所述保護層以暴露出所述電路圖案。According to another aspect of the present invention, a method of manufacturing a printed circuit board is provided, the method comprising: forming a circuit pattern on one surface of a first insulating layer; forming a boundary of a cavity region on the first insulating layer Forming an insulator pattern along the boundary; forming a protective layer covering the cavity region; forming a second insulating layer on one surface of the first insulating layer; removing the second insulating layer along the insulator pattern Forming the cavity region; and removing the protective layer to expose the circuit pattern.
提供以下詳細說明是為了幫助讀者獲得對本文中所述方法、設備、及/或系統的全面理解。然而,對於此項技術中具有通常知識者而言,本文中所述方法、設備、及/或系統的各種改變、潤飾、及等效形式將顯而易見。本文中所述操作順序僅為實例,且並非僅限於本文中所提及的該些操作順序,而是如對於此項技術中具有通常知識者而言將顯而易見,除必定以特定次序出現的操作以外,均可有所改變。此外,為提高清晰性及明確性,可省略對對於此項技術中具有通常知識者而言眾所習知的功能及構造的說明。The following detailed description is provided to assist the reader in a comprehensive understanding of the methods, devices, and/or systems described herein. Various modifications, adaptations, and equivalents of the methods, devices, and/or systems described herein will be apparent to those skilled in the art. The order of operations described herein is merely an example, and is not limited to the order of operations referred to herein, but will be apparent to those of ordinary skill in the art, except where the operations must occur in a particular order. Other than that, it can be changed. In addition, descriptions of well-known functions and constructions of those skilled in the art can be omitted for clarity and clarity.
本文中所述特徵可被實施為不同形式,且不應被解釋為僅限於本文中所述實例。確切而言,提供本文中所述實例是為了使此揭露內容將透徹及完整,並將向此項技術中具有通常知識者傳達本發明的全部範圍。Features described herein can be implemented in different forms and should not be construed as being limited to the examples described herein. Rather, the examples described herein are provided to be thorough and complete, and the full scope of the present invention will be conveyed to those of ordinary skill in the art.
除非另有定義,否則本文中所使用的全部用語(包括技術用語及科學用語)的含義均與其被本發明所屬技術中具有通常知識者所通常理解的含義相同。在常用字典中所定義的任何用語應被解釋為具有與在相關技術的上下文中的含義相同的含義,且除非另有明確定義,否則不應將其解釋為具有理想化或過於正式的含義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning meaning meaning Any term defined in a commonly used dictionary should be interpreted as having the same meaning as in the context of the related art, and should not be construed as having an idealized or overly formal meaning unless explicitly defined otherwise.
無論圖號如何,將對相同的或對應的組件給定相同的參考編號,且將不再對相同的或對應的組件予以贅述。在本發明的說明通篇中,當闡述特定相關傳統技術確定與本發明的觀點無關時,將省略有關詳細說明。在闡述各種組件時可使用例如「第一(first)」及「第二(second)」等用語,但以上組件不應僅限於以上用語。以上用語僅用於區分各個組件。在附圖中,可誇大、省略、或簡要示出一些組件,且組件的尺寸未必反映該些組件的實際尺寸。Regardless of the figure number, the same or corresponding components will be given the same reference numerals, and the same or corresponding components will not be described again. Throughout the description of the present invention, the detailed description will be omitted when it is stated that the specific related conventional techniques are not related to the viewpoint of the present invention. Terms such as "first" and "second" may be used in the description of various components, but the above components should not be limited to the above terms. The above terms are only used to distinguish between components. In the figures, some components may be exaggerated, omitted, or briefly shown, and the dimensions of the components do not necessarily reflect the actual dimensions of the components.
在下文中,將參照附圖來詳細闡述本發明的特定實施例。印刷電路板及電子組件封裝 Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings. Printed circuit board and electronic component package
圖1示出印刷電路板的實例。圖2及圖3示出印刷電路板的空腔區域的實例的放大圖。Figure 1 shows an example of a printed circuit board. 2 and 3 show enlarged views of an example of a cavity area of a printed circuit board.
參照圖1及圖2,根據實例的印刷電路板包括第一絕緣層10、電路圖案15、第二絕緣層20、及絕緣體圖案40。Referring to FIGS. 1 and 2, a printed circuit board according to an example includes a first insulating layer 10, a circuit pattern 15, a second insulating layer 20, and an insulator pattern 40.
第一絕緣層10使形成於內層或外層上的電路圖案15電性絕緣。第一絕緣層10可由樹脂材料製成。第一絕緣層10可包含例如環氧樹脂等熱固樹脂及/或例如聚醯亞胺(polyimide,PI)等熱塑樹脂,且可以預浸料(prepreg,PPG)或增層膜(build-up film)的形式形成。The first insulating layer 10 electrically insulates the circuit pattern 15 formed on the inner or outer layer. The first insulating layer 10 may be made of a resin material. The first insulating layer 10 may include a thermosetting resin such as an epoxy resin and/or a thermoplastic resin such as polyimide (PI), and may be a prepreg (PPG) or a buildup film (build- The form of up film) is formed.
電路圖案15形成於第一絕緣層10中且是由可傳輸電性訊號的金屬(例如銅)形成。電路圖案15可形成於第一絕緣層10的一個表面、另一表面、或內側上。舉例而言,電路圖案15可包括通孔及接墊,所述通孔穿透第一絕緣層10以將第一絕緣層10的一個表面連接至另一表面,所述接墊形成於第一絕緣層10的一個表面或另一表面上且連接至所述通孔。The circuit pattern 15 is formed in the first insulating layer 10 and is formed of a metal (for example, copper) that can transmit an electrical signal. The circuit pattern 15 may be formed on one surface, the other surface, or the inner side of the first insulating layer 10. For example, the circuit pattern 15 may include a via hole penetrating the first insulating layer 10 to connect one surface of the first insulating layer 10 to the other surface, and the pad is formed on the first surface One surface or the other surface of the insulating layer 10 is connected to the through hole.
參照圖1及圖2,在第一絕緣層10的一個表面上形成有具有嵌置於第一絕緣層10中的結構的電路圖案16。舉例而言,嵌置電路圖案16可具有嵌置跡線基底的電路結構,其中在所述基底中嵌置有精細電路。嵌置跡線結構中的精細電路圖案16可能夠應對欲被插入空腔區域C中的電子組件的精細接墊。Referring to FIGS. 1 and 2, a circuit pattern 16 having a structure embedded in the first insulating layer 10 is formed on one surface of the first insulating layer 10. For example, the embedded circuit pattern 16 may have a circuit structure in which a trace substrate is embedded, in which a fine circuit is embedded in the substrate. The fine circuit pattern 16 in the embedded trace structure can be capable of handling the fine pads of the electronic components to be inserted into the cavity region C.
第二絕緣層20積層於第一絕緣層10的一個表面上以使電路圖案15電性絕緣且第二絕緣層20的一部分被穿透以形成空腔區域C。第二絕緣層20是由與第一絕緣層10相似的材料以預浸料或增層膜的形式形成。第二絕緣層20亦可由另一材料形成或藉由另一方法形成。第二絕緣層20形成有用於暴露出嵌置電路圖案16的貫穿孔(through hole)22。在藉由貫穿孔22形成的空腔區域C中插入有電子組件,且所插入的所述電子組件可連接至嵌置電路圖案16。The second insulating layer 20 is laminated on one surface of the first insulating layer 10 to electrically insulate the circuit pattern 15 and a portion of the second insulating layer 20 is penetrated to form the cavity region C. The second insulating layer 20 is formed of a material similar to the first insulating layer 10 in the form of a prepreg or a buildup film. The second insulating layer 20 may also be formed of another material or formed by another method. The second insulating layer 20 is formed with a through hole 22 for exposing the embedded circuit pattern 16. An electronic component is inserted into the cavity region C formed by the through hole 22, and the inserted electronic component can be connected to the embedded circuit pattern 16.
參照圖1及圖2,具有貫穿孔22的第二絕緣層20積層於第一絕緣層10的一個表面上,使得空腔區域C可被形成為以第一絕緣層10的所述一個表面作為底部且以第二絕緣層20的貫穿孔22的壁表面作為表面壁。Referring to FIGS. 1 and 2, a second insulating layer 20 having a through hole 22 is laminated on one surface of the first insulating layer 10 such that the cavity region C may be formed to be the one surface of the first insulating layer 10 as The wall surface of the through hole 22 of the bottom and the second insulating layer 20 serves as a surface wall.
在第二絕緣層20上形成有第三絕緣層30,且形成有連續地穿透第二絕緣層20及第三絕緣層30的貫穿孔22及32以將空腔區域C形成為深的。A third insulating layer 30 is formed on the second insulating layer 20, and through holes 22 and 32 that continuously penetrate the second insulating layer 20 and the third insulating layer 30 are formed to form the cavity region C deep.
印刷電路板可更包括導電柱35,導電柱35藉由穿透第二絕緣層20及第三絕緣層30連接至電路圖案15。舉例而言,銅製柱35可接合至電路圖案15的接墊17。藉由使用導電柱35,可輕易地與具有疊層封裝(package on the package,POP)結構的封裝中的另一基底進行電性連接。The printed circuit board may further include a conductive post 35 connected to the circuit pattern 15 by penetrating the second insulating layer 20 and the third insulating layer 30. For example, the copper posts 35 can be bonded to the pads 17 of the circuit pattern 15. By using the conductive post 35, it is easy to electrically connect to another substrate in a package having a package on the package (POP) structure.
另一方面,空腔區域C可具有朝第一絕緣層10變窄的形狀。當貫穿孔22及32是藉由雷射或鑽孔(drilling)而形成於第二絕緣層20或第三絕緣層30中時,空腔區域C的邊界B可如圖2中所示實質上垂直。亦即,空腔區域C的內壁可以垂直壁的形式形成。On the other hand, the cavity region C may have a shape that is narrowed toward the first insulating layer 10. When the through holes 22 and 32 are formed in the second insulating layer 20 or the third insulating layer 30 by laser or drilling, the boundary B of the cavity region C may be substantially as shown in FIG. vertical. That is, the inner wall of the cavity region C may be formed in the form of a vertical wall.
另一方面,當貫穿孔22 '及32 '是藉由噴砂加工(sand blast processing)而形成於第二絕緣層20或第三絕緣層30中時,空腔區域C的邊界B如圖3中所示被形成為傾斜的。亦即,可形成其中空腔區域C的內壁朝下變窄的結構。On the other hand, when the through holes 22' and 32' are formed in the second insulating layer 20 or the third insulating layer 30 by sand blast processing, the boundary B of the cavity region C is as shown in FIG. The illustration is formed to be inclined. That is, a structure in which the inner wall of the cavity region C is narrowed downward can be formed.
參照圖1,第一絕緣層10的另一表面或第三絕緣層30的一個表面可為印刷電路板的外層,且在所述外層上可另外形成有阻焊層(solder resist layer)50及60。導電柱35或電路圖案15的一部分可經由阻焊層50及60的開口暴露出以電性連接至外部環境。Referring to FIG. 1, the other surface of the first insulating layer 10 or one surface of the third insulating layer 30 may be an outer layer of a printed circuit board, and a solder resist layer 50 may be additionally formed on the outer layer. 60. A portion of the conductive post 35 or circuit pattern 15 may be exposed through the openings of the solder mask layers 50 and 60 to electrically connect to the external environment.
絕緣體圖案40被形成為使得一個表面夾置於第一絕緣層10與第二絕緣層20之間且另一表面延伸至空腔區域C中以自空腔區域C的底表面突出。絕緣體圖案40形成於第一絕緣層10的一個表面上且延伸至空腔區域C中且因此具有自空腔區域C的底表面突出的形狀。The insulator pattern 40 is formed such that one surface is sandwiched between the first insulating layer 10 and the second insulating layer 20 and the other surface extends into the cavity region C to protrude from the bottom surface of the cavity region C. The insulator pattern 40 is formed on one surface of the first insulating layer 10 and extends into the cavity region C and thus has a shape protruding from the bottom surface of the cavity region C.
參照圖2及圖3,絕緣體圖案40的一端位於第一絕緣層10與第二絕緣層20之間且另一端設置於空腔區域C的底表面之上。絕緣體圖案40可沿空腔區域C的邊界B形成於第一絕緣層10的一個表面上。更具體而言,絕緣體圖案40形成於其中空腔區域C的邊界B(其中作為空腔內壁的貫穿孔22及32的壁表面延伸的假想表面)與第一絕緣層10的一個表面交匯的位置處。沿空腔區域C的邊界B形成的絕緣體圖案40可具有閉合回路結構且第一絕緣體層10及電路圖案15的一部分可被朝內暴露出。Referring to FIGS. 2 and 3, one end of the insulator pattern 40 is located between the first insulating layer 10 and the second insulating layer 20 and the other end is disposed above the bottom surface of the cavity region C. The insulator pattern 40 may be formed on one surface of the first insulating layer 10 along the boundary B of the cavity region C. More specifically, the insulator pattern 40 is formed at a boundary B of the cavity region C in which an imaginary surface extending as a wall surface of the through holes 22 and 32 of the inner wall of the cavity meets with one surface of the first insulating layer 10. Location. The insulator pattern 40 formed along the boundary B of the cavity region C may have a closed loop structure and a portion of the first insulator layer 10 and the circuit pattern 15 may be exposed inward.
舉例而言,當空腔區域C是以六面體形狀形成時,絕緣體圖案40是以矩形框架形式形成於第一絕緣層10上,且第一絕緣層10及嵌置電路圖案16的作為空腔區域C的底部的一個表面可暴露至所述矩形框架的內側。For example, when the cavity region C is formed in a hexahedral shape, the insulator pattern 40 is formed on the first insulating layer 10 in the form of a rectangular frame, and the first insulating layer 10 and the embedded circuit pattern 16 serve as a cavity. A surface of the bottom of the region C may be exposed to the inner side of the rectangular frame.
參照圖12,可形成有絕緣體圖案40 '以覆蓋電路圖案15的至少一部分。舉例而言,絕緣體圖案40 '可具有其中絕緣體圖案40 '的一部分接觸嵌置電路圖案16的上表面的結構。Referring to FIG. 12, an insulator pattern 40' may be formed to cover at least a portion of the circuit pattern 15. For example, the insulator pattern 40' may have a structure in which a portion of the insulator pattern 40' contacts the upper surface of the embedded circuit pattern 16.
絕緣體圖案40可由感光樹脂形成,使得可輕易地且選擇性地在第一絕緣體層10的一個表面上形成絕緣體圖案40。舉例而言,可藉由沿空腔區域C的邊界B向第一絕緣層10的一個表面選擇性地塗覆感光樹脂並將所得物固化來輕易地形成絕緣體圖案40。The insulator pattern 40 may be formed of a photosensitive resin so that the insulator pattern 40 can be easily and selectively formed on one surface of the first insulator layer 10. For example, the insulator pattern 40 can be easily formed by selectively applying a photosensitive resin to one surface of the first insulating layer 10 along the boundary B of the cavity region C and curing the resultant.
此外,絕緣體圖案40可由不同於第二絕緣層20的材料的材料形成。舉例而言,絕緣體圖案40可由具有較其中形成有貫穿孔22及32的第二絕緣層20或第三絕緣層30高的耐磨性或者較第二絕緣層20或第三絕緣層30高的粗糙度的材料形成。因此,當貫穿孔22及32是藉由噴砂加工而形成於第二絕緣層20或第三絕緣層30中時,絕緣體圖案40可充當加工的止擋件(stopper)。隨後將闡述噴砂及止擋件功能的細節。製造印刷電路板的方法 Further, the insulator pattern 40 may be formed of a material different from the material of the second insulating layer 20. For example, the insulator pattern 40 may have higher wear resistance than the second insulating layer 20 or the third insulating layer 30 in which the through holes 22 and 32 are formed or higher than the second insulating layer 20 or the third insulating layer 30. Roughness of the material is formed. Therefore, when the through holes 22 and 32 are formed in the second insulating layer 20 or the third insulating layer 30 by sandblasting, the insulator pattern 40 can serve as a processed stopper. Details of the function of the blasting and stoppers will be explained later. Method of manufacturing a printed circuit board
圖4至圖11是示出在製造印刷電路板的方法中使用的示例性製程的剖視圖。4 through 11 are cross-sectional views showing an exemplary process used in a method of manufacturing a printed circuit board.
根據本發明實施例的製造印刷電路板的方法包括:在第一絕緣層10上形成電路圖案15;形成絕緣體圖案40;形成保護層45;形成第二絕緣層;形成空腔區域C;以及移除保護層45。A method of manufacturing a printed circuit board according to an embodiment of the present invention includes: forming a circuit pattern 15 on a first insulating layer 10; forming an insulator pattern 40; forming a protective layer 45; forming a second insulating layer; forming a cavity region C; In addition to the protective layer 45.
所述在第一絕緣層10上形成電路圖案15包括在第一絕緣層10的一個表面上形成電路圖案15。亦可在第一絕緣層10的另一表面或內側上形成電路圖案15。電路圖案15可包括嵌置電路圖案16,且嵌置電路圖案16可具有嵌置跡線基底的電路結構,其中在所述基底中嵌置有精細電路。嵌置跡線結構的精細電路可應對電子組件的精細接墊。Forming the circuit pattern 15 on the first insulating layer 10 includes forming a circuit pattern 15 on one surface of the first insulating layer 10. The circuit pattern 15 may also be formed on the other surface or the inner side of the first insulating layer 10. The circuit pattern 15 may include a buried circuit pattern 16, and the embedded circuit pattern 16 may have a circuit structure in which a trace substrate is embedded, in which a fine circuit is embedded in the substrate. The fine circuit of the embedded trace structure can handle the fine pads of the electronic components.
參照圖4,可在具有釋放層(release layer)的載體基底5的兩個表面上形成第一絕緣層10及電路圖案15。舉例而言,可藉由鍍覆(plating)形成金屬層,且可藉由選擇性蝕刻(selective etching)來實行圖案化製程(patterning process)。另外,可藉由向載體基底5的釋放層上塗覆導電金屬材料且接著實行圖案化製程等來形成電路圖案15。圖案化製程可為蓋孔製程(tenting process)、改良型半加成製程(modified semi-additive process,MSAP)製程、或半加成製程(semi-additive process,SAP)製程。Referring to FIG. 4, a first insulating layer 10 and a circuit pattern 15 may be formed on both surfaces of a carrier substrate 5 having a release layer. For example, a metal layer can be formed by plating, and a patterning process can be performed by selective etching. In addition, the circuit pattern 15 can be formed by coating a conductive metal material on the release layer of the carrier substrate 5 and then performing a patterning process or the like. The patterning process can be a tenting process, a modified semi-additive process (MSAP) process, or a semi-additive process (SAP) process.
在載體基底5上形成電路圖案15之後,可將第一絕緣層10按壓並積層於載體基底5上以在第一絕緣層10中嵌置電路圖案15。此時,第一絕緣層10可為半固化預浸料。可向載體基底5塗覆絕緣樹脂以形成用於嵌置電路圖案15的第一絕緣層10。另一方面,可在積層於載體基底5上的第一絕緣層10的內表面或另一表面上另外形成電路圖案15。此時,放置於載體基底5上的電路圖案15可具有由第一絕緣層10環繞的嵌置結構。After the circuit pattern 15 is formed on the carrier substrate 5, the first insulating layer 10 may be pressed and laminated on the carrier substrate 5 to embed the circuit pattern 15 in the first insulating layer 10. At this time, the first insulating layer 10 may be a semi-cured prepreg. The carrier substrate 5 may be coated with an insulating resin to form the first insulating layer 10 for embedding the circuit pattern 15. On the other hand, the circuit pattern 15 may be additionally formed on the inner surface or the other surface of the first insulating layer 10 laminated on the carrier substrate 5. At this time, the circuit pattern 15 placed on the carrier substrate 5 may have an embedded structure surrounded by the first insulating layer 10.
參照圖5,當自載體基底5分離上面形成有電路圖案15的第一絕緣層10時,電路圖案15可具有被暴露至第一絕緣層10的一個表面的嵌置電路圖案16。當在第一絕緣層10的接觸載體基底5的一個表面上形成有晶種層(seed layer)時,可藉由蝕刻移除所述晶種層以暴露出嵌置於第一絕緣層10的一個表面中的電路圖案16。Referring to FIG. 5, when the first insulating layer 10 on which the circuit pattern 15 is formed is separated from the carrier substrate 5, the circuit pattern 15 may have the embedded circuit pattern 16 exposed to one surface of the first insulating layer 10. When a seed layer is formed on one surface of the first insulating layer 10 contacting the carrier substrate 5, the seed layer may be removed by etching to expose the embedded in the first insulating layer 10. A circuit pattern 16 in one surface.
所述形成絕緣體圖案40可包括在第一絕緣層10上設定空腔區域C的邊界B並沿邊界B形成絕緣體圖案40。此時,絕緣體圖案40可由與第二絕緣層20的材料不同的材料形成。舉例而言,絕緣體圖案40可由具有較隨後欲積層的第二絕緣層20或第三絕緣層30高的耐磨性或者較第二絕緣層20或第三絕緣層30高的粗糙度的材料形成。因此,當貫穿孔22及32是藉由噴砂加工而形成於第二絕緣層20或第三絕緣層30中時,絕緣體圖案40可充當加工的止擋件。The forming the insulator pattern 40 may include setting the boundary B of the cavity region C on the first insulating layer 10 and forming the insulator pattern 40 along the boundary B. At this time, the insulator pattern 40 may be formed of a material different from that of the second insulating layer 20. For example, the insulator pattern 40 may be formed of a material having a higher wear resistance than the second insulating layer 20 or the third insulating layer 30 to be subsequently laminated or a higher roughness than the second insulating layer 20 or the third insulating layer 30. . Therefore, when the through holes 22 and 32 are formed in the second insulating layer 20 or the third insulating layer 30 by sandblasting, the insulator pattern 40 can serve as a processed stopper.
參照圖6,可在第一絕緣層10的一個表面上在空腔區域C的邊界B上形成絕緣體圖案40。具體而言,可設定空腔區域C的邊界(B,上面欲形成空腔內壁的假想表面),且可在其中邊界B與第一絕緣層10的一個表面交匯的位置處形成絕緣體圖案40。沿空腔區域C的邊界B形成的絕緣體圖案40可具有閉合回路結構,且第一絕緣層10及電路圖案15的一部分可被朝內暴露出。舉例而言,當空腔區域C是以六面體形狀形成時,絕緣體圖案40可以矩形框架形式形成於第一絕緣層10上,且第一絕緣層10及電路圖案15的作為空腔區域C的底部的一個表面可被暴露至所述矩形框架的內側。Referring to FIG. 6, an insulator pattern 40 may be formed on the boundary B of the cavity region C on one surface of the first insulating layer 10. Specifically, the boundary of the cavity region C (B, the imaginary surface on which the inner wall of the cavity is to be formed) may be set, and the insulator pattern 40 may be formed at a position where the boundary B meets one surface of the first insulating layer 10 . The insulator pattern 40 formed along the boundary B of the cavity region C may have a closed loop structure, and a portion of the first insulating layer 10 and the circuit pattern 15 may be exposed inward. For example, when the cavity region C is formed in a hexahedral shape, the insulator pattern 40 may be formed on the first insulating layer 10 in the form of a rectangular frame, and the first insulating layer 10 and the circuit pattern 15 as the cavity region C One surface of the bottom may be exposed to the inner side of the rectangular frame.
絕緣體圖案40可由感光樹脂形成,使得可輕易地且選擇性地在第一絕緣體層10的一個表面上形成絕緣體圖案40。舉例而言,可藉由沿空腔區域C的邊界B向第一絕緣層10的一個表面選擇性地塗覆感光樹脂並將所得物固化來輕易地形成絕緣體圖案40。The insulator pattern 40 may be formed of a photosensitive resin so that the insulator pattern 40 can be easily and selectively formed on one surface of the first insulator layer 10. For example, the insulator pattern 40 can be easily formed by selectively applying a photosensitive resin to one surface of the first insulating layer 10 along the boundary B of the cavity region C and curing the resultant.
所述形成保護層45可包括在加工後續空腔區域C的步驟中形成保護空腔區域C的底部的臨時保護層45。舉例而言,保護層45可覆蓋空腔區域C的底部以保護嵌置電路圖案16。保護層45可由與電路圖案15的材料不同的材料製成。The forming the protective layer 45 may include forming a temporary protective layer 45 that protects the bottom of the cavity region C in the step of processing the subsequent cavity region C. For example, the protective layer 45 may cover the bottom of the cavity region C to protect the embedded circuit pattern 16. The protective layer 45 may be made of a material different from that of the circuit pattern 15.
參照圖7,可將由絕緣材料形成的覆蓋空腔區域C的底部的保護層45貼合至第一絕緣層10的一個表面。此時,保護層45交疊形成於空腔區域C的邊界B處的絕緣體圖案40可為較佳的,藉此完全地覆蓋空腔區域C的底部。保護層45可有效地防止嵌置電路圖案16在隨後欲闡述的加工空腔區域C的步驟中受到損壞。具體而言,由於嵌置跡線結構的精細電路圖案16具有非常小的厚度及寬度,因此精細電路圖案16可能因加工中的小誤差而受到嚴重損壞。因此,當空腔區域C的電路圖案15被保護層45覆蓋時,製造印刷電路板的可靠性及效率可提高。Referring to FIG. 7, a protective layer 45 formed of an insulating material covering the bottom of the cavity region C may be attached to one surface of the first insulating layer 10. At this time, it is preferable that the protective layer 45 overlaps the insulator pattern 40 formed at the boundary B of the cavity region C, thereby completely covering the bottom of the cavity region C. The protective layer 45 can effectively prevent the embedded circuit pattern 16 from being damaged in the step of processing the cavity region C to be described later. In particular, since the fine circuit pattern 16 of the embedded trace structure has a very small thickness and width, the fine circuit pattern 16 may be severely damaged by a small error in processing. Therefore, when the circuit pattern 15 of the cavity region C is covered by the protective layer 45, the reliability and efficiency of manufacturing the printed circuit board can be improved.
所述形成第二絕緣層20可包括在第一絕緣層10的一個表面上形成第二絕緣層20。第二絕緣層20可由與第一絕緣層10相似的材料以預浸料或增層膜的形式形成。第二絕緣層20亦可由另一材料形成或藉由另一方法形成。The forming the second insulating layer 20 may include forming the second insulating layer 20 on one surface of the first insulating layer 10. The second insulating layer 20 may be formed of a material similar to the first insulating layer 10 in the form of a prepreg or a buildup film. The second insulating layer 20 may also be formed of another material or formed by another method.
參照圖8,可在第一絕緣層10的一個表面上積層嵌置有絕緣體圖案40及保護層45的第二絕緣層20。可在第二絕緣層20上進一步積層第三絕緣層30。此時,可另外形成經由第二絕緣層20及第三絕緣層30連接至電路圖案15的導電柱35。舉例而言,可將銅製柱35接合至電路圖案15的接墊。Referring to FIG. 8, a second insulating layer 20 in which an insulator pattern 40 and a protective layer 45 are embedded may be laminated on one surface of the first insulating layer 10. The third insulating layer 30 may be further laminated on the second insulating layer 20. At this time, the conductive pillars 35 connected to the circuit pattern 15 via the second insulating layer 20 and the third insulating layer 30 may be additionally formed. For example, the copper posts 35 can be bonded to the pads of the circuit pattern 15.
所述形成空腔區域C可包括沿絕緣體圖案40移除第二絕緣層20以形成空腔區域C。換言之,沿所設定空腔區域C的邊界B移除第二絕緣層20。The forming the cavity region C may include removing the second insulating layer 20 along the insulator pattern 40 to form the cavity region C. In other words, the second insulating layer 20 is removed along the boundary B of the set cavity area C.
具體而言,藉由在第二絕緣層20中形成貫穿孔22來形成具有其中可插入及安排電子組件等的凹槽結構(concave groove structure)的空腔區域C。當在第二絕緣層20上形成第三絕緣層30時,可形成連續地穿透第二絕緣層20及第三絕緣層30的貫穿孔22及32。藉由經由貫穿孔22及32暴露出保護層45,可將在移除隨後將闡述的保護層45之後暴露出的嵌置電路圖案16電性連接至電子組件。Specifically, a cavity region C having a concave groove structure in which an electronic component or the like can be inserted and formed is formed by forming the through hole 22 in the second insulating layer 20. When the third insulating layer 30 is formed on the second insulating layer 20, the through holes 22 and 32 that continuously penetrate the second insulating layer 20 and the third insulating layer 30 may be formed. By exposing the protective layer 45 through the through holes 22 and 32, the embedded circuit pattern 16 exposed after removing the protective layer 45 to be described later can be electrically connected to the electronic component.
此時,可藉由用於選擇性地移除第二絕緣層(20)的噴砂加工來實行對空腔區域C的加工。At this time, the processing of the cavity region C can be performed by sandblasting for selectively removing the second insulating layer (20).
參照圖9,當加工空腔區域C時,絕緣體圖案40可充當用於限制加工深度的止擋件。舉例而言,藉由噴砂加工來實行對空腔區域C的加工,且充當噴砂的止擋件的絕緣體圖案40可由具有較第二絕緣層20或第三絕緣層30高的耐磨性及較第二絕緣層20或第三絕緣層30高的粗糙度的材料形成。Referring to FIG. 9, when the cavity region C is processed, the insulator pattern 40 may serve as a stopper for limiting the processing depth. For example, the processing of the cavity region C is performed by sandblasting, and the insulator pattern 40 serving as a stopper for sand blasting may have higher wear resistance than the second insulating layer 20 or the third insulating layer 30 and A material having a high roughness of the second insulating layer 20 or the third insulating layer 30 is formed.
噴砂加工是一種其中藉由自噴嘴噴出研磨劑(abrasive)來修剪或切割工件表面的加工方法。過去,砂是與研磨劑一起噴射,其因而被命名為噴砂。現在,可使用例如陶瓷粉末(例如鋁土(氧化鋁)或碳化矽)、玻璃珠、塑膠粉末等各種顆粒作為研磨劑。存在另種類型的噴砂:濕法噴砂(wet sand blast),將研磨劑與水混合並接著將其自噴嘴噴出;以及乾法噴砂(dry sand blast),僅加工研磨劑並接著利用空氣將其自噴嘴噴出。Sandblasting is a processing method in which the surface of a workpiece is trimmed or cut by spraying an abrasive from a nozzle. In the past, sand was sprayed with abrasives, which was thus named sandblasting. Now, various particles such as ceramic powder (for example, alumina (alumina) or tantalum carbide), glass beads, plastic powder, or the like can be used as the abrasive. There is another type of blasting: wet sand blast, mixing the abrasive with water and then ejecting it from the nozzle; and dry sand blast, processing only the abrasive and then using air to treat it Sprayed from the nozzle.
在此實施例中,形成選擇性地覆蓋第三絕緣層30的未經加工部分的加工障壁層70。藉由噴砂加工來加工第二絕緣層20及第三絕緣層30以暴露出絕緣體圖案40及保護層45的上部。此時,由於絕緣體圖案40是由具有高耐磨性或高粗糙度的材料製成,因此絕緣體圖案40因噴砂而造成的磨損或切割相較於第二絕緣體層20及第三絕緣體層30而言更少。此使得即便充分地實行噴砂直至在空腔區域C的中心部分處暴露出保護層45,仍可防止空腔區域C的邊界B部分受到損壞。In this embodiment, the process barrier layer 70 that selectively covers the unprocessed portion of the third insulating layer 30 is formed. The second insulating layer 20 and the third insulating layer 30 are processed by sandblasting to expose the upper portions of the insulator pattern 40 and the protective layer 45. At this time, since the insulator pattern 40 is made of a material having high wear resistance or high roughness, the insulator pattern 40 is worn or cut by sandblasting compared to the second insulator layer 20 and the third insulator layer 30. Less words. This makes it possible to prevent the boundary B portion of the cavity region C from being damaged even if sandblasting is sufficiently performed until the protective layer 45 is exposed at the central portion of the cavity region C.
所述移除保護層45可包括藉由移除保護層45來暴露出嵌置電路圖案16。視所使用的材料而定,可藉由化學方法或物理方法來輕易地移除保護層45。The removing the protective layer 45 may include exposing the embedded circuit pattern 16 by removing the protective layer 45. The protective layer 45 can be easily removed by chemical or physical methods depending on the materials used.
參照圖10,可自第一絕緣層10移除由絕緣材料製成的保護層45。Referring to FIG. 10, a protective layer 45 made of an insulating material may be removed from the first insulating layer 10.
參照圖11,第一絕緣層10的另一表面或第三絕緣層30的一個表面可為印刷電路板的外層,且可在所述外層上另外形成阻焊層50及60。導電柱35及電路圖案15的一部分可經由阻焊層50及60的開口暴露出以電性連接至外部環境。Referring to FIG. 11, the other surface of the first insulating layer 10 or one surface of the third insulating layer 30 may be an outer layer of a printed circuit board, and solder resist layers 50 and 60 may be additionally formed on the outer layer. The conductive pillars 35 and a portion of the circuit pattern 15 may be exposed through the openings of the solder resist layers 50 and 60 to be electrically connected to the external environment.
對於熟習此項技術者而言將顯而易見,在不背離隨附申請專利範圍中所提及的本發明的精神的條件下,可進行對組件的各種潤飾及添加、或者進行對組件的添加。應理解,本發明並非僅限於此,且在不背離本發明的範圍的條件下可對其作出各種改變及潤飾。It will be apparent to those skilled in the art that various modifications and additions to the components, or additions to the components, can be made without departing from the spirit of the invention as set forth in the appended claims. It is to be understood that the invention is not limited thereto, and various changes and modifications may be made thereto without departing from the scope of the invention.
5‧‧‧載體基底5‧‧‧ Carrier substrate
10‧‧‧第一絕緣層10‧‧‧First insulation
15‧‧‧電路圖案15‧‧‧ circuit pattern
16‧‧‧電路圖案/精細電路圖案/嵌置電路圖案16‧‧‧Circuit pattern/fine circuit pattern/embedded circuit pattern
17‧‧‧接墊17‧‧‧ pads
20‧‧‧第二絕緣層20‧‧‧Second insulation
22、22 '、32、32 '‧‧‧貫穿孔22, 22 ', 32, 32 '‧‧‧through holes
30‧‧‧第三絕緣層30‧‧‧third insulation
35‧‧‧導電柱/銅製柱35‧‧‧ Conductive column / copper column
40、40 '‧‧‧絕緣體圖案40, 40 '‧‧‧Insulator pattern
45‧‧‧保護層45‧‧‧Protective layer
50、60‧‧‧阻焊層50, 60‧‧‧ solder mask
70‧‧‧加工障壁層70‧‧‧Processing barrier layer
B‧‧‧邊界B‧‧‧ border
C‧‧‧空腔區域C‧‧‧Cavity area
圖1示出印刷電路板的實例。 圖2及圖3示出印刷電路板的空腔區域的實例的放大圖。 圖4至圖11是示出在製造圖1所示印刷電路板的方法中使用的示例性製程的剖視圖。 圖12示出印刷電路板的另一實例。 在所有圖式及詳細說明通篇中,相同的參考編號指代相同的組件。圖式可能未必按比例繪製,且為清晰、說明及方便起見,可誇大圖式中的組件的相對大小、比例、及繪示。Figure 1 shows an example of a printed circuit board. 2 and 3 show enlarged views of an example of a cavity area of a printed circuit board. 4 through 11 are cross-sectional views showing an exemplary process used in the method of manufacturing the printed circuit board shown in Fig. 1. Figure 12 shows another example of a printed circuit board. Throughout the drawings and the detailed description, the same reference numerals refer to the same components. The drawings may not necessarily be drawn to scale, and the relative size, proportion, and depiction of the components in the drawings may be exaggerated for clarity, description, and convenience.
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KR10-2017-0148634 | 2017-11-09 | ||
KR1020170148634A KR102501905B1 (en) | 2017-11-09 | 2017-11-09 | Printed circuit board and method for manufacturing the same |
??10-2017-0148634 | 2017-11-09 |
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TW201919453A true TW201919453A (en) | 2019-05-16 |
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JP (1) | JP7434685B2 (en) |
KR (1) | KR102501905B1 (en) |
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CN114026969A (en) * | 2019-06-24 | 2022-02-08 | Lg 伊诺特有限公司 | Printed circuit board and package substrate including the same |
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JP7398881B2 (en) | 2019-05-07 | 2023-12-15 | キヤノン株式会社 | Electronic equipment and its control method |
US12089325B2 (en) | 2019-06-04 | 2024-09-10 | Lg Innotek Co., Ltd. | Printed circuit board |
KR102710005B1 (en) * | 2019-10-21 | 2024-09-26 | 엘지이노텍 주식회사 | Circuit board |
KR20220135762A (en) | 2021-03-31 | 2022-10-07 | 삼성전기주식회사 | Printed circuit board |
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JPH0719970B2 (en) * | 1988-05-09 | 1995-03-06 | 日本電気株式会社 | Method for manufacturing multilayer printed wiring board |
KR100633850B1 (en) * | 2005-09-22 | 2006-10-16 | 삼성전기주식회사 | Method for manufacturing a substrate with cavity |
JP2007226158A (en) | 2006-02-27 | 2007-09-06 | Asahi Kasei Electronics Co Ltd | Dry film resist |
JP4935139B2 (en) | 2006-03-28 | 2012-05-23 | 大日本印刷株式会社 | Multilayer printed wiring board |
KR100836651B1 (en) | 2007-01-16 | 2008-06-10 | 삼성전기주식회사 | Chip embedded pcb and manufacturing method thereof |
JP4940124B2 (en) * | 2007-12-27 | 2012-05-30 | 京セラSlcテクノロジー株式会社 | Wiring board manufacturing method |
JPWO2010140214A1 (en) * | 2009-06-02 | 2012-11-15 | ソニーケミカル&インフォメーションデバイス株式会社 | Manufacturing method of multilayer printed wiring board |
JP5254274B2 (en) * | 2010-05-18 | 2013-08-07 | 欣興電子股▲ふん▼有限公司 | Circuit board |
JP2013207006A (en) * | 2012-03-28 | 2013-10-07 | Toppan Printing Co Ltd | Wiring board with through electrode and manufacturing method of the same |
KR20140019689A (en) * | 2012-08-07 | 2014-02-17 | 삼성전기주식회사 | Printed circuit board and method of manufacturing the same |
JP6294024B2 (en) * | 2013-07-30 | 2018-03-14 | 京セラ株式会社 | Wiring board and mounting structure using the same |
JP6332668B2 (en) * | 2014-03-19 | 2018-05-30 | 新光電気工業株式会社 | WIRING BOARD, MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR DEVICE |
KR102435126B1 (en) * | 2015-10-28 | 2022-08-24 | 삼성전기주식회사 | Printed circuit board and method for manufacturing the same |
KR102466204B1 (en) * | 2015-12-16 | 2022-11-11 | 삼성전기주식회사 | Printed circuit board and method of manufacturing the same |
KR101726568B1 (en) * | 2016-02-24 | 2017-04-27 | 대덕전자 주식회사 | Method of manufacturing printed circuit board |
-
2017
- 2017-11-09 KR KR1020170148634A patent/KR102501905B1/en active IP Right Grant
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2018
- 2018-04-13 JP JP2018077500A patent/JP7434685B2/en active Active
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Cited By (2)
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CN114026969A (en) * | 2019-06-24 | 2022-02-08 | Lg 伊诺特有限公司 | Printed circuit board and package substrate including the same |
US11842893B2 (en) | 2019-06-24 | 2023-12-12 | Lg Innotek Co., Ltd. | Printed circuit board and package substrate including same |
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KR102501905B1 (en) | 2023-02-21 |
JP2019087722A (en) | 2019-06-06 |
KR20190052852A (en) | 2019-05-17 |
TWI820021B (en) | 2023-11-01 |
JP7434685B2 (en) | 2024-02-21 |
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