TW201821449A - Photosensitive composition, cured film, light-emitting layer for light-emitting display element, light-emitting display element, and method for forming light-emitting layer in which molecules of photopolymerization initiator (C) are controlled to a specific degree of polarization in the photosensitive composition - Google Patents

Photosensitive composition, cured film, light-emitting layer for light-emitting display element, light-emitting display element, and method for forming light-emitting layer in which molecules of photopolymerization initiator (C) are controlled to a specific degree of polarization in the photosensitive composition Download PDF

Info

Publication number
TW201821449A
TW201821449A TW106130274A TW106130274A TW201821449A TW 201821449 A TW201821449 A TW 201821449A TW 106130274 A TW106130274 A TW 106130274A TW 106130274 A TW106130274 A TW 106130274A TW 201821449 A TW201821449 A TW 201821449A
Authority
TW
Taiwan
Prior art keywords
group
light
photosensitive composition
substituent
carbon atoms
Prior art date
Application number
TW106130274A
Other languages
Chinese (zh)
Other versions
TWI739899B (en
Inventor
片野彰
Original Assignee
日商東京應化工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東京應化工業股份有限公司 filed Critical 日商東京應化工業股份有限公司
Publication of TW201821449A publication Critical patent/TW201821449A/en
Application granted granted Critical
Publication of TWI739899B publication Critical patent/TWI739899B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/62—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing gallium, indium or thallium
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a cured film exhibiting a high internal quantum efficiency without impairing the properties originally possessed by a quantum dot, a cured film obtained by curing the photosensitive resin composition, and a light-emitting layer for a light-emitting display element, a light-emitting display element comprising the light-emitting layer, and a method for forming a light-emitting layer using the above-described photosensitive resin composition. SOLUTION: A photopolymerization initiator (C) whose molecule is controlled to a specific degree of polarization in a photosensitive composition comprising an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), and a quantum dot (D).

Description

感光性組成物、硬化膜、發光顯示元件用之發光層、發光顯示元件及發光層之形成方法Photosensitive composition, cured film, light-emitting layer for light-emitting display element, light-emitting display element, and method for forming light-emitting layer

[0001] 本發明關於含有量子點之感光性組成物、使該感光性組成物硬化而形成的硬化膜、及發光顯示元件用之發光層、具備該發光層之發光顯示元件、與使用了前述之感光性組成物之發光層之形成方法。[0001] The present invention relates to a photosensitive composition containing quantum dots, a cured film formed by curing the photosensitive composition, a light-emitting layer for a light-emitting display element, a light-emitting display element including the light-emitting layer, and the use of the foregoing. A method for forming a light-emitting layer of a photosensitive composition.

[0002] 一直以來，為了對電子加以局限而形成的極小的粒（點（dot））被稱為量子點，已進行了其在各種領域中的應用研究。於此，1個量子點的大小為直徑數納米至數十納米，約由1萬個原子構成。 　　[0003] 對於所述量子點而言，藉由改變其尺寸（改變帶隙），可改變發出之螢光的顏色（發光波長）（波長轉換）。因此，近年來，針對量子點，正在深入進行以波長轉換材料之形式應用於顯示元件之研究（參見專利文獻1及2）。 [先前技術文獻] [專利文獻] 　　[0004] 　　[專利文獻1]：日本特開2006-216560號公報 　　[專利文獻2]：日本特開2008-112154號公報[0002] Conventionally, extremely small particles (dots) formed to confine electrons are called quantum dots, and their application research in various fields has been performed. Here, the size of a quantum dot is several nanometers to several tens of nanometers in diameter, and is composed of about 10,000 atoms. [0003] For the quantum dot, by changing its size (changing the band gap), the color (luminous wavelength) (wavelength conversion) of the emitted fluorescent light can be changed. Therefore, in recent years, research on quantum dots being applied to display elements in the form of wavelength conversion materials is being conducted intensively (see Patent Documents 1 and 2). [Prior Art Document] [Patent Document] [0004] [Patent Document 1]: Japanese Patent Laid-Open No. 2006-216560 [Patent Document 2]: Japanese Patent Laid-Open No. 2008-112154

[發明所欲解決之課題] 　　[0005] 通常，對於各種顯示元件中包含的構件而言，由於極微細並且需要精密的位置控制，因此，往往使用感光性組成物而利用光刻法形成。因此，期望包含量子點的具有波長轉換功能之膜亦可使用感光性組成物而利用光刻法形成。 　　[0006] 例如，顯示元件中，作為可用於形成構成濾色器（color filter）之黑色矩陣或RGB等之著色膜的感光性組成物，通常使用包含鹼可溶性樹脂、光聚合性化合物、光聚合起始劑、與著色劑之感光性組成物。 　　認為經由將上述感光性組成物中包含的著色劑替換成量子點，可得到可形成包含量子點之硬化膜之感光性組成物。 　　[0007] 然而，本申請之發明人經研究發現，在使用包含鹼可溶性樹脂、光聚合性化合物、光聚合起始劑、與量子點之感光性組成物時，根據量子點之種類或使用量之不同，往往無法形成顯示所期望的內部量子效率之硬化膜。 　　[0008] 本發明之目的在於提供可在不損害量子點本來具有的特性的情況下形成顯示高內部量子效率的硬化膜之感光性樹脂組成物、使該感光性組成物硬化而形成的硬化膜、及發光顯示元件用之發光層、具備該發光層之發光顯示元件、與使用了前述的感光性組成物之發光層之形成方法。 [用以解決課題之手段] 　　[0009] 本申請之發明人發現，經由在包含鹼可溶性樹脂（A）、光聚合性化合物（B）、光聚合起始劑（C）、與量子點（D）之感光性組成物中、使用分子被控制為特定的極化程度的光聚合起始劑（C），可解決上述的課題，從而完成了本發明。 　　[0010] 本發明之第1態樣為感光性組成物，其包含鹼可溶性樹脂（A）、光聚合性化合物（B）、光聚合起始劑（C）、與量子點（D）， 　　光聚合起始劑（C）包含下述化合物，對於所述化合物而言，依據擴展休克爾法算出的、分子內的正性部分電荷（partial charge）的最大值為0.500以下，負性部分電荷的最小值為-0.500以上。 　　[0011] 本發明之第2態樣為硬化膜，其係將第1態樣之感光性組成物硬化而形成的。 　　[0012] 本發明之第3態樣為發光顯示元件用之發光層，其係將第1態樣之感光性組成物硬化而形成的。 　　[0013] 本發明之第4態樣為發光顯示元件，其具備第3態樣之發光層。 　　[0014] 本發明之第5態樣為發光層之形成方法，所述方法包含下述步驟： 　　將第1態樣之感光性組成物塗佈於基板上而形成塗佈膜之步驟，與 　　將塗佈膜曝光之步驟。 [發明之效果] 　　[0015] 依據本發明，可提供可在不損害量子點本來具有的特性的情況下形成顯示高內部量子效率之硬化膜之感光性樹脂組成物、使該感光性組成物硬化而形成之硬化膜、及發光顯示元件用之發光層、具備該發光層之發光顯示元件、與使用了前述的感光性組成物之發光層之形成方法。[Problems to be Solved by the Invention] 000 [0005] Generally, members included in various display elements are extremely fine and require precise position control. Therefore, they are often formed by a photolithography method using a photosensitive composition. Therefore, it is desirable that a film having a wavelength conversion function including quantum dots can also be formed by a photolithography method using a photosensitive composition. [0006] For example, in a display element, as a photosensitive composition that can be used to form a black matrix constituting a color filter or a coloring film such as RGB, an alkali-soluble resin, a photopolymerizable compound, and photopolymerization are generally used. A photosensitive composition of an initiator and a coloring agent. It is believed that by replacing the coloring agent contained in the photosensitive composition with quantum dots, a photosensitive composition capable of forming a cured film containing quantum dots can be obtained. [0007] However, the inventors of the present application have found through research that when a photosensitive composition containing an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a quantum dot is used, the amount or amount of the quantum dot is used. In contrast, a hardened film exhibiting a desired internal quantum efficiency is often not formed. [0008] An object of the present invention is to provide a photosensitive resin composition capable of forming a cured film exhibiting a high internal quantum efficiency without impairing the inherent characteristics of a quantum dot, and a cured film formed by curing the photosensitive composition. And a method for forming a light-emitting layer for a light-emitting display element, a light-emitting display element including the light-emitting layer, and a light-emitting layer using the aforementioned photosensitive composition. [Means to Solve the Problem] 000 [0009] The inventors of the present application have found that by including alkali-soluble resin (A), photopolymerizable compound (B), photopolymerization initiator (C), and quantum dots (D In the photosensitive composition, a photopolymerization initiator (C) whose molecules are controlled to a specific degree of polarization can solve the above-mentioned problems, and completed the present invention. [0010] A first aspect of the present invention is a photosensitive composition including an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), and a quantum dot (D), and a photocatalyst. The polymerization initiator (C) contains the following compounds. For the compounds, the maximum value of the positive partial charge in the molecule calculated according to the extended Shockel method is 0.500 or less, and the value of the negative partial charge is The minimum value is -0.500 or more. [0011] The second aspect of the present invention is a cured film, which is formed by curing the photosensitive composition of the first aspect. [0012] A third aspect of the present invention is a light-emitting layer for a light-emitting display element, which is formed by curing the photosensitive composition of the first aspect. [0013] A fourth aspect of the present invention is a light-emitting display element, which includes a light-emitting layer according to the third aspect. [0014] A fifth aspect of the present invention is a method for forming a light-emitting layer, which includes the following steps: (1) a step of applying the photosensitive composition of the first aspect to a substrate to form a coating film, and The step of exposing the coating film. [Effects of the Invention] [0015] According to the present invention, it is possible to provide a photosensitive resin composition capable of forming a cured film exhibiting a high internal quantum efficiency without impairing the inherent characteristics of the quantum dot, and hardening the photosensitive composition. The formed hardened film, a light-emitting layer for a light-emitting display element, a light-emitting display element including the light-emitting layer, and a method for forming a light-emitting layer using the aforementioned photosensitive composition.

[用以實施本發明之最佳形態] 　　[0017] ≪感光性組成物≫ 　　感光性組成物包含鹼可溶性樹脂（A）、光聚合性化合物（B）、光聚合起始劑（C）、與量子點（D）。 　　此處，光聚合起始劑（C）包含下述化合物，對於所述化合物而言，依據擴展休克爾法算出的、分子內的正性部分電荷的最大值為0.500以下，負性部分電荷的最小值為-0.500以上。 　　感光性組成物經由包含滿足上述與部分電荷有關的條件的光聚合起始劑（C），從而可在不損害量子點本來具有的特性的情況下形成顯示高內部量子效率的硬化膜。 　　以下，對感光性組成物的必需成分或任選成分、與感光性組成物的調製方法進行說明。 　　[0018] ＜鹼可溶性樹脂（A）＞ 　　感光性組成物包含鹼可溶性樹脂（A）。 　　此處，本說明書中，（A）鹼可溶性樹脂係指，在分子內含有具備鹼可溶性之官能團（例如，酚式羥基、羧基、磺酸基等）的樹脂。 　　鹼可溶性樹脂（A）之種類沒有特別限制，可使用以往在感光性組成物中摻合的各種鹼可溶性樹脂。 　　以下，作為鹼可溶性樹脂（A）的較佳之具體例，對具有卡多（Cardo）構造的樹脂（A1）、丙烯酸系樹脂（A2）、與酚醛清漆（Novolac）樹脂（A3）進行說明。 　　[0019] [具有卡多（Cardo）構造之樹脂（A1）] 　　感光性組成物中可包含具有卡多（Cardo）構造之樹脂（A1）（以下，亦記為卡多「Cardo樹脂（A1）」）作為鹼可溶性樹脂（A）。 　　[0020] 作為卡多（Cardo）樹脂（A1），可使用在其構造中具有卡多（Cardo）骨架、且具有所期望的鹼可溶性的樹脂。卡多（Cardo）骨架係指，在構成第1環狀構造之1個環碳原子上鍵結第2環狀結構與第3環狀結構而成的骨架。尚，第2環狀構造與第3環狀結構可為相同的結構，亦可為不同的結構。 　　作為卡多（Cardo）骨架的代表例，可舉出在芴環的9位的碳原子上鍵結2個芳香環（例如苯環）而成的骨架。 　　[0021] 作為卡多（Cardo）樹脂（A1），沒有特別限制，可使用現有已知的樹脂。其中，較佳下述式（a-1）表示的樹脂。 　　[化1]（式（a-1）中，Xa 表示下述式（a-2）表示之基。m1表示0~20之整數） 　　[0022] 　　[化2]（式（a-2）中，Ra1 各自獨立地表示氫原子、碳原子數為1~6之烴基、或鹵素原子，Ra2 各自獨立地表示氫原子或甲基，Ra3 各自獨立地表示直鏈或支鏈的亞烷基，m2表示0或1，Wa 表示下述式（a-3）表示之基） 　　[0023] 　　[化3]（式（a-3）中的環A表示可與芳香族環縮合、亦可具有取代基之脂肪族環。脂肪族環可為脂肪族烴環，亦可為脂肪族雜環）。 　　[0024] 式（a-2）中，作為Ra3 ，較佳碳原子數為1~20的亞烷基，更佳碳原子數為1~10的亞烷基，特別較佳碳原子數為1~6的亞烷基，最佳乙烷-1,2-二基、丙烷-1,2-二基、及丙烷1,3-二基。 　　[0025] 關於式（a-3）中之環A，作為脂肪族環，可舉出單環烷烴、雙環烷烴、三環烷烴、四環烷烴等。 　　具體而言，可舉出單環烷烴、雙環烷烴、三環烷烴、四環烷烴等單環烷烴、金剛烷、降冰片烷、異冰片烷、三環癸烷、四環十二烷。 　　可與脂肪族環縮合之芳香族環可為芳香族烴環，亦可為芳香族雜環，較佳芳香族烴環。具體而言，較佳苯環及萘環。 　　[0026] 作為式（a-3）表示之2價基的較佳的例子，可舉出下述之基。 　　[化4][0027] 式（a-1）中之2價基Xa 可藉由使提供殘基Za 之四羧酸二酐與下式（a-2a）表示之二元醇化合物反應從而被導入至（A1）卡多（Cardo）樹脂中。 　　[化5][0028] 式（a-2a）中，Ra1 、Ra2 、Ra3 、及m2與針對式（a-2）所作的說明相同。關於式（a-2a）中的環A，與針對式（a-3）所作的說明相同。 　　[0029] 式（a-2a）表示之二元醇化合物例如可利用以下的方法製造。 　　首先，根據需要，依據常規方法，將下述式（a-2b）表示之二元醇化合物所具有的酚式羥基中的氫原子取代為-Ra3 -OH表示之基，然後，使用表氯醇等進行縮水甘油基化，得到下述式（a-2c）表示之環氧化合物。 　　接下來，藉由使式（a-2c）表示的環氧化合物與丙烯酸或甲基丙烯酸反應，從而得到式（a-2a）表示之二元醇化合物。 　　式（a-2b）及式（a-2c）中，Ra1 、Ra3 、及m2與針對式（a-2）所作的說明相同。關於式（a-2b）及式（a-2c）中之環A，與針對式（a-3）所作的說明相同。 　　尚，式（a-2a）表示之二元醇化合物的製造方法不限於上述的方法。 　　[化6][0030] 作為式（a-2b）表示之二元醇化合物的較佳的例子，可舉出以下的二元醇化合物。 　　[化7][0031] 上述式（a-1）中，Ra0 為氫原子或-CO-Ya -COOH表示之基。此處，Ya 表示從二羧酸酐中除去酸酐基（-CO-O-CO-）而得到的殘基。作為二羧酸酐之例子，可舉出馬來酸酐、琥珀酸酐、衣康酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基內亞甲基四氫鄰苯二甲酸酐、氯菌酸酐（chlorendic anhydride）、甲基四氫鄰苯二甲酸酐、戊二酸酐等。 　　[0032] 另外，上述式（a-1）中，Za 表示從四羧酸二酐中除去2個酸酐基而得到的殘基。作為四羧酸二酐的例子，可舉出下述式（a-4）表示之四羧酸二酐、均苯四甲酸二酐、二苯甲酮四甲酸二酐、聯苯四甲酸二酐、二苯基醚四甲酸二酐等。 　　另外，上述式（a-1）中，m表示0~20之整數。 　　[0033] 　　[化8]（式（a-4）中，Ra4 、Ra5 、及Ra6 各自獨立地表示選自由氫原子、碳原子數為1~10的烷基及氟原子組成之群中之1種，m3表示0~12之整數）。 　　[0034] 可選作式（a-4）中之Ra4 的烷基為碳原子數為1~10之烷基。藉由將烷基所具備之碳原子數設定為上述範圍，可進一步提高得到之羧酸酯的耐熱性。Ra4 為烷基時，從容易得到耐熱性較佳之卡多（Cardo）樹脂方面考慮，其碳原子數較佳為1~6，更佳為1~5，進一步較佳為1~4，特別佳為1~3。 　　Ra4 為烷基時，該烷基可為直鏈狀，亦可為支鏈狀。 　　[0035] 作為式（a-4）中的Ra4 ，從容易得到耐熱性較佳之卡多（Cardo）樹脂方面考慮，各自獨立地更佳為氫原子或碳原子數為1~10之烷基。式（a-4）中的Ra4 更佳為氫原子、甲基、乙基、正丙基或異丙基，特別較佳為氫原子或甲基。 　　從容易調製高純度之四羧酸二酐方面考慮，式（a-4）中的多個Ra4 較佳為相同的基。 　　[0036] 式（a-4）中之m3表示0~12的整數。經由使m3的值為12以下，可使得四羧酸二酐的純化容易進行。 　　從容易進行四羧酸二酐的純化方面考慮，m3的上限較佳為5，更佳為3。 　　從四羧酸二酐的化學穩定性的方面考慮，m3的下限較佳為1，更佳為2。 　　式（a-4）中的m3特別較佳為2或3。 　　[0037] 可選作式（a-4）中的Ra5 及Ra6 的碳原子數為1~10的烷基與可選作Ra4 的碳原子數為1~10的烷基同樣。 　　從容易進行四羧酸二酐的純化方面考慮，Ra5 及Ra6 較佳為氫原子、或碳原子數為1~10（較佳1~6、更佳1~5、進一步較佳1~4、特別佳1~3）之烷基，特別較佳為氫原子或甲基。 　　[0038] 作為式（a-4）表示之四羧酸二酐，可舉出例如降冰片烷-2-螺-α-環戊酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐（別名為「降冰片烷-2-螺-2’-環戊酮-5’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐」）、甲基降冰片烷-2-螺-α-環戊酮-α’-螺-2’’-（甲基降冰片烷）-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環己酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐（別名為「降冰片烷-2-螺-2’-環己酮-6’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐」）、甲基降冰片烷-2-螺-α-環己酮-α’-螺-2’’-（甲基降冰片烷）-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環丙酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環丁酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環庚酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環辛酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環壬酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環癸酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環十一烷酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環十二烷酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環十三烷酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環十四烷酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-環十五烷酮-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-（甲基環戊酮）-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐、降冰片烷-2-螺-α-（甲基環己酮）-α’-螺-2’’-降冰片烷-5,5’’,6,6’’-四甲酸二酐等。 　　[0039] 卡多（Cardo）樹脂（A1）之重量平均分子量較佳為1000~40000，更佳為2000~30000。經由為上述的範圍，從而能在得到良好的顯影性的同時得到充分的耐熱性、膜強度。 　　[0040] [丙烯酸系樹脂（A2）] 　　作為鹼可溶性樹脂（A），亦可較佳使用丙烯酸系樹脂（A2）。使用丙烯酸系樹脂（A2）時，藉由適當調整單體之種類、構成單位之比率等，從而能容易地調整感光性組成物的各種特性。 　　[0041] 作為丙烯酸系樹脂（A2），可使用包含來自（甲基）丙烯酸的構成單位及/或來自（甲基）丙烯酸酯等其他單體的構成單位的丙烯酸系樹脂。（甲基）丙烯酸為丙烯酸或甲基丙烯酸。（甲基）丙烯酸酯為下述式（a-5）表示的物質，沒有特別限制，只要不妨礙本發明的目的即可。 　　[化9][0042] 上述式（a-5）中，Ra7 為氫原子或甲基，Ra8 為1價的有機基。對於該有機基而言，可在該有機基中包含雜原子等烴基以外的鍵或取代基。另外，該有機基可為直鏈狀、支鏈狀、環狀中之任一者。 　　[0043] 作為Ra8 的有機基中的烴基以外的取代基，沒有特別限制，只要不損害本發明的效果即可，可舉出鹵素原子、羥基、巰基、硫醚基（sulfide group）、氰基、異氰基、氰酸酯基、異氰酸酯基、硫氰酸酯基、異硫氰酸酯基、甲矽烷基、矽烷醇基、烷氧基、烷氧基羰基、氨基甲醯基、硫代氨基甲醯基、硝基、亞硝基、羧基、羧酸鹽/酯基（carboxylate group）、醯基、醯基氧基、亞磺基、磺基、磺酸鹽/酯基（sulfonato group）、膦基（phosphino group）、氧膦基（phosphinyl group）、膦醯基、膦酸鹽/酯基（phosphonato group）、羥基亞氨基、烷基醚基、烷基硫醚基、芳基醚基、芳基硫醚基、胺基（-NH2 、-NHR、-NRR’：R及R’各自獨立地表示烴基）等。上述取代基中包含的氫原子可被烴基取代。另外，上述取代基中包含的烴基可為直鏈狀、支鏈狀、及環狀中的任一者。 　　[0044] 作為Ra8 ，較佳烷基、芳基、芳烷基、或雜環基，此等基可被鹵素原子、羥基、烷基、或雜環基取代。另外，此等基包含亞烷基部分時，亞烷基部分可被醚鍵、硫醚鍵、酯鍵中斷。 　　[0045] 烷基為直鏈狀或支鏈狀時，其碳原子數較佳為1~20，更佳為1~15，特別佳為1~10。作為較佳的烷基的例子，可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、異戊基、仲戊基、叔戊基、正己基、正庚基、正辛基、異辛基、仲辛基、叔辛基、正壬基、異壬基、正癸基、異癸基等。 　　[0046] 烷基為脂環式基或包含脂環式基之基時，作為烷基中包含的較佳的脂環式基，可舉出環戊基及環己基等單環的脂環式基、金剛烷基、降冰片基、異冰片基、三環壬基、三環癸基及四環十二烷基等多環之脂環式基。 　　[0047] 式（a-5）表示之化合物亦較佳為在Ra8 中具有環氧基的含有環氧基的不飽和化合物。 　　作為式（a-5）表示之含有環氧基的不飽和化合物之較佳的例子，可舉出（甲基）丙烯酸縮水甘油酯、（甲基）丙烯酸2-甲基縮水甘油酯、（甲基）丙烯酸3,4-環氧丁酯、（甲基）丙烯酸6,7-環氧庚酯等（甲基）丙烯酸環氧烷基酯類；α-乙基丙烯酸縮水甘油酯、α-正丙基丙烯酸縮水甘油酯、α-正丁基丙烯酸縮水甘油酯、α-乙基丙烯酸6,7-環氧庚酯等α-烷基丙烯酸環氧烷基酯類；等。此等中，從共聚反應性、硬化後的樹脂的強度等方面考慮，較佳（甲基）丙烯酸縮水甘油酯、（甲基）丙烯酸2-甲基縮水甘油酯、及（甲基）丙烯酸6,7-環氧庚酯。此等含有環氧基之不飽和化合物可單獨使用或組合2種以上而使用。 　　[0048] 另外，丙烯酸系樹脂（A2）可為聚合有（甲基）丙烯酸酯以外的單體的樹脂。作為這樣的單體，可舉出（甲基）丙烯醯胺類、不飽和羧酸類、烯丙基化合物、乙烯基醚類、乙烯基酯類、苯乙烯類等。此等單體可單獨使用或組合2種以上而使用。 　　[0049] 作為（甲基）丙烯醯胺類，可舉出（甲基）丙烯醯胺、N-烷基（甲基）丙烯醯胺、N-芳基（甲基）丙烯醯胺、N,N-二烷基（甲基）丙烯醯胺、N,N-芳基（甲基）丙烯醯胺、N-甲基-N-苯基（甲基）丙烯醯胺、N-羥基乙基-N-甲基（甲基）丙烯醯胺等。 　　[0050] 作為不飽和羧酸類，可舉出巴豆酸等單羧酸；馬來酸、富馬酸、檸康酸、中康酸、衣康酸等二羧酸；此等二羧酸之酐；等。 　　[0051] 作為烯丙基化合物，可舉出乙酸烯丙酯、己酸烯丙酯、辛酸烯丙酯、月桂酸烯丙酯、棕櫚酸烯丙酯、硬脂酸烯丙酯、苯甲酸烯丙酯、乙醯乙酸烯丙酯、乳酸烯丙酯等烯丙基酯類；烯丙氧基乙醇；等。 　　[0052] 作為乙烯基醚類，可舉出己基乙烯基醚、辛基乙烯基醚、癸基乙烯基醚、乙基己基乙烯基醚、甲氧基乙基乙烯基醚、乙氧基乙基乙烯基醚、氯乙基乙烯基醚、1-甲基-2,2-二甲基丙基乙烯基醚、2-乙基丁基乙烯基醚、羥基乙基乙烯基醚、二乙二醇乙烯基醚、二甲基胺基乙基乙烯基醚、二乙基胺基乙基乙烯基醚、丁基胺基乙基乙烯基醚、苄基乙烯基醚、四氫糠基乙烯基醚等烷基乙烯基醚；乙烯基苯基醚、乙烯基甲苯基醚、乙烯基氯苯基醚、乙烯基-2,4-二氯苯基醚、乙烯基萘基醚、乙烯基蒽基醚等乙烯基芳基醚；等。 　　[0053] 作為乙烯基酯類，可舉出丁酸乙烯酯、異丁酸乙烯酯、三甲基乙酸乙烯酯、二乙基乙酸乙烯酯、戊酸乙烯酯、己酸乙烯酯、氯乙酸乙烯酯、二氯乙酸乙烯酯、甲氧基乙酸乙烯酯、丁氧基乙酸乙烯酯、苯基乙酸乙烯酯、乙醯乙酸乙烯酯、乳酸乙烯酯、β-苯基丁酸乙烯酯、苯甲酸乙烯酯、水楊酸乙烯酯、氯苯甲酸乙烯酯、四氯苯甲酸乙烯酯、萘甲酸乙烯酯等。 　　[0054] 作為苯乙烯類，可舉出苯乙烯；甲基苯乙烯、二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、二乙基苯乙烯、異丙基苯乙烯、丁基苯乙烯、己基苯乙烯、環己基苯乙烯、癸基苯乙烯、苄基苯乙烯、氯甲基苯乙烯、三氟甲基苯乙烯、乙氧基甲基苯乙烯、乙醯氧基甲基苯乙烯等烷基苯乙烯；甲氧基苯乙烯、4-甲氧基-3-甲基苯乙烯、二甲氧基苯乙烯等烷氧基苯乙烯；氯苯乙烯、二氯苯乙烯、三氯苯乙烯、四氯苯乙烯、五氯苯乙烯、溴苯乙烯、二溴苯乙烯、碘苯乙烯、氟苯乙烯、三氟苯乙烯、2-溴-4-三氟甲基苯乙烯、4-氟-3-三氟甲基苯乙烯等鹵代苯乙烯；等。 　　[0055] 對於（A3）丙烯酸系樹脂中之來自（甲基）丙烯酸之構成單位之量與來自其他單體的構持單位的量而言，只要在不妨礙本發明的目的的範圍內，就沒有特別限制。（A3）丙烯酸系樹脂中的來自（甲基）丙烯酸的構成單位的量相對於丙烯酸系樹脂的質量而言較佳為5~50質量%，更佳為10~30質量%。 　　[0056] 丙烯酸系樹脂（A2）的重量平均分子量較佳為2000~50000，更佳為5000~30000。經由為上述的範圍，存在容易得到感光性組成物之膜形成能力、曝光後之顯影性的均衡性的傾向。 　　[0057] [酚醛清漆（Novolac）樹脂（A3）] 　　鹼可溶性樹脂（A）可包含酚醛清漆（Novolac）樹脂（A3）。鹼可溶性樹脂（A）包含酚醛清漆（Novolac）樹脂（A3）時，容易形成不易因加熱而變形之耐熱性良好的硬化膜。 　　[0058] 作為酚醛清漆（Novolac）樹脂（A3），可使用以往在感光性組成物中摻合之各種酚醛清漆（Novolac）樹脂。作為酚醛清漆（Novolac）樹脂（A3），較佳在酸催化劑下使具有酚式羥基之芳香族化合物（以下，簡稱為「酚類」）與醛類進行加成縮合而得到之酚醛清漆（Novolac）樹脂。 　　[0059] （酚類） 　　作為在製作（A1）酚醛清漆（Novolac）樹脂時使用的酚類，可舉出例如苯酚；鄰甲酚、間甲酚、對甲酚等甲酚類；2,3-二甲苯酚、2,4-二甲苯酚、2,5-二甲苯酚、2,6-二甲苯酚、3,4-二甲苯酚、3,5-二甲苯酚等二甲苯酚類；鄰乙基苯酚、間乙基苯酚、對乙基苯酚等乙基酚類；2-異丙基苯酚、3-異丙基苯酚、4-異丙基苯酚、鄰丁基苯酚、間丁基苯酚、對丁基苯酚、以及對叔丁基苯酚等烷基酚類；2,3,5-三甲基苯酚、及3,4,5-三甲基苯酚等三烷基酚類；間苯二酚、鄰苯二酚、對苯二酚、對苯二酚單甲基醚、連苯三酚、及間苯三酚等多元酚類；烷基間苯二酚、烷基鄰苯二酚、及烷基對苯二酚等烷基多元酚類（所有烷基的碳原子數均為1以上4以下）；α-萘酚；β-萘酚；羥基聯苯（hydroxydiphenyl）；以及雙酚A等。此等酚類可單獨使用，亦可組合使用2種以上。 　　[0060] 此等酚類中，較佳間甲酚及對甲酚，更佳併用間甲酚及對甲酚。這種情況下，可藉由調整兩者的摻合比例，來調節使用感光性組成物形成之硬化膜的耐熱性等各特性。 　　間甲酚與對甲酚的摻合比例沒有特別限制，以間甲酚/對甲酚的莫耳比計，較佳為3/7以上8/2以下。經由以上述範圍的比率使用間甲酚及對甲酚，從而容易得到可形成耐熱性較佳的硬化膜之感光性組成物。 　　[0061] 另外，併用間甲酚與2,3,5-三甲基苯酚而製造的酚醛清漆（Novolac）樹脂亦為較佳的。使用這樣的酚醛清漆（Novolac）樹脂的情況下，特別容易得到可形成不易因後烘烤時的加熱而過度流動之硬化膜的感光性組成物。 　　間甲酚與2,3,5-三甲基苯酚的摻合比例沒有特別限制，以間甲酚/2,3,5-三甲基苯酚之莫耳比計，較佳為70/30以上95/5以下。 　　[0062] （醛類） 　　作為製作酚醛清漆（Novolac）樹脂（A3）時使用的醛類，可舉出例如甲醛、多聚甲醛（paraformaldehyde）、糠醛、苯甲醛、硝基苯甲醛、及乙醛等。此等醛類可單獨使用，亦可組合使用2種以上。 　　[0063] （酸催化劑） 　　作為製作酚醛清漆（Novolac）樹脂（A3）時使用的酸催化劑，可舉出例如鹽酸、硫酸、硝酸、磷酸、及亞磷酸等無機酸類；甲酸、草酸、乙酸、二乙基硫酸、及對甲苯磺酸等有機酸類；以及乙酸鋅等金屬鹽類等。此等酸催化劑可單獨使用，亦可組合使用2種以上。 　　[0064] （分子量） 　　對於酚醛清漆（Novolac）樹脂（A3）之依據聚苯乙烯換算的重量平均分子量（Mw；以下，亦簡稱為「重量平均分子量」）而言，從使用感光性組成物形成的硬化膜對於因加熱而導致的流動的耐性的觀點考慮，作為下限值，較佳為2000，更佳為5000，特別佳為10000，進一步較佳為15000，最佳為20000，作為上限值，較佳為50000，更佳為45000，進一步較佳為40000，最佳為35000。 　　[0065] 作為酚醛清漆（Novolac）樹脂（A3），可將至少2種依據聚苯乙烯換算之重量平均分子量不同的酚醛清漆（Novolac）樹脂組合使用。經由將重量平均分子量大小不同之酚醛清漆（Novolac）樹脂組合使用，可獲得感光性組成物的顯影性、與使用感光性組成物形成之硬化膜的耐熱性的均衡性。 　　[0066] 相對於感光性組成物的固體含量整體的質量而言，鹼可溶性樹脂（A）的含量較佳為10~70質量%，更佳為15~55質量%。經由為上述的範圍，從而容易得到顯影性較佳的感光性組成物。 　　[0067] ＜（B）光聚合性化合物＞ 　　感光性組成物包含（B）光聚合性化合物。作為（B）光聚合性化合物，較佳具有烯鍵式不飽和基之單體。所述單體包含單官能單體與多官能單體。 　　[0068] 作為單官能單體，可舉出（甲基）丙烯醯胺、羥甲基（甲基）丙烯醯胺、甲氧基甲基（甲基）丙烯醯胺、乙氧基甲基（甲基）丙烯醯胺、丙氧基甲基（甲基）丙烯醯胺、丁氧基甲氧基甲基（甲基）丙烯醯胺、N-羥甲基（甲基）丙烯醯胺、N-羥基甲基（甲基）丙烯醯胺、（甲基）丙烯酸、富馬酸、馬來酸、馬來酸酐、衣康酸、衣康酸酐、檸康酸、檸康酸酐、巴豆酸、2-丙烯醯胺基-2-甲基丙磺酸、叔丁基丙烯醯胺磺酸、（甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（甲基）丙烯酸丁酯、（甲基）丙烯酸2-乙基己酯、（甲基）丙烯酸環己酯、（甲基）丙烯酸2-羥基乙酯、（甲基）丙烯酸2-羥基丙酯、（甲基）丙烯酸2-羥基丁酯、（甲基）丙烯酸2-苯氧基-2-羥基丙酯、鄰苯二甲酸2-（甲基）丙烯醯基氧基-2-羥基丙酯、甘油單（甲基）丙烯酸酯、（甲基）丙烯酸四氫糠基酯、（甲基）丙烯酸二甲基胺基乙酯、（甲基）丙烯酸縮水甘油酯、（甲基）丙烯酸2,2,2-三氟乙酯、（甲基）丙烯酸2,2,3,3-四氟丙酯、鄰苯二甲酸衍生物的（甲基）丙烯酸半酯等。此等單官能單體可單獨使用或組合2種以上而使用。 　　[0069] 另一方面，作為多官能單體，可舉出乙二醇二（甲基）丙烯酸酯、二乙二醇二（甲基）丙烯酸酯、四乙二醇二（甲基）丙烯酸酯、丙二醇二（甲基）丙烯酸酯、聚丙二醇二（甲基）丙烯酸酯、丁二醇二（甲基）丙烯酸酯、新戊二醇二（甲基）丙烯酸酯、1,6-己二醇二（甲基）丙烯酸酯、三羥甲基丙烷三（甲基）丙烯酸酯、甘油二（甲基）丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、季戊四醇二（甲基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯、季戊四醇四（甲基）丙烯酸酯、二季戊四醇五（甲基）丙烯酸酯、二季戊四醇六（甲基）丙烯酸酯、2,2-雙（4-（甲基）丙烯醯氧基二乙氧基苯基）丙烷、2,2-雙（4-（甲基）丙烯醯氧基聚乙氧基苯基）丙烷、（甲基）丙烯酸2-羥基-3-（甲基）丙烯醯基氧基丙酯、乙二醇二縮水甘油基醚二（甲基）丙烯酸酯、二乙二醇二縮水甘油基醚二（甲基）丙烯酸酯、鄰苯二甲酸二縮水甘油酯二（甲基）丙烯酸酯、甘油三丙烯酸酯、甘油多縮水甘油基醚多（甲基）丙烯酸酯、胺基甲酸酯（甲基）丙烯酸酯（urethane(meth)acrylate）（即，甲苯二異氰酸酯、三甲基六亞甲基二異氰酸酯、或六亞甲基二異氰酸酯等與（甲基）丙烯酸2-羥基乙酯的反應物）、亞甲基雙（甲基）丙烯醯胺、（甲基）丙烯醯胺亞甲基醚、多元醇與N-羥甲基（甲基）丙烯醯胺的縮合物等多官能單體、1,3,5-三丙烯醯基六氫-1,3,5-三嗪（triacrylformal）等。此等多官能單體可單獨使用或組合2種以上而使用。 　　[0070] 此等具有烯鍵式不飽和基之單體中，從存在提高感光性組成物對基板的密著性、感光性組成物之硬化後的強度的傾向的方面考慮，較佳3官能以上的多官能單體，更佳4官能以上之多官能單體，進一步較佳5官能以上的多官能單體。 　　[0071] 關於（B）光聚合性化合物在感光性組成物中的含量，相對於感光性組成物之固體含量整體的質量而言，較佳為1~50質量%，更佳為5~40質量%。經由為上述的範圍，從而存在容易得到敏感度、顯影性、解析度之均衡性的傾向。 　　[0072] ＜光聚合起始劑（C）＞ 　　感光性組成物包含光聚合起始劑（C）。光聚合起始劑（C）包含下述化合物，對於所述化合物而言，依據擴展休克爾法算出的、分子內的正性部分電荷的最大值為0.500以下，負性部分電荷的最小值為-0.500以上。 　　光聚合起始劑（C）包含滿足與分子內的部分電荷有關的上述條件的化合物時，容易在不損害後述的量子點（D）的特性的情況下形成內部量子效率高之硬化膜。 　　[0073] 分子內的部分電荷可使用能基於擴展休克爾法計算分子內的電荷的偏向的軟體來計算。 　　具體而言，藉由使用ChemBio3D Ultra version 12.0（CambridgeSoft公司製），可計算分子內的電荷的偏向，更詳細而言，用該ChemBio3D Ultra version 12.0繪製物件物質的化學構造，從在其中搭載的計算程式中，執行“Extend-Huckel”，計算構成原子的電荷的偏向。 　　本說明書中，將利用上述的軟體得到的值定義為電荷（部分電荷）的值。 　　另外，所謂電荷的偏向，依據以下的說明。例如，針對化合物內的特定的原子，將其基態作為0時，該原子的電荷（部分電荷）為+0.5係指：該原子中減少+0.5個電子的電荷，該原子的電荷偏向於正側。 　　[0074] 使用包含光聚合起始劑與量子點的感光性組成物形成硬化膜時，存在硬化膜中的內部量子效率低於本來所期待的內部量子效率的情況。 　　其原因雖然尚不確定，但推測光聚合起始劑的分子內的電荷的偏向大為原因之一。 　　作為光聚合起始劑而公知的化合物中，分子內的電荷的偏向大的化合物有很多。如上所述，認為分子內的電荷的偏向大的化合物會導致與量子點的材料發生相互作用。 　　由此認為，使用包含光聚合起始劑與量子點的感光性組成物形成硬化膜時，會導致難以形成顯示所期望的內部量子效率的硬化膜這樣的結果。 　　[0075] 另一方面，認為光聚合起始劑（C）包含分子內的正性部分電荷的最大值為特定值以下、負性部分電荷的最小值為特定值以上的化合物時，不易在光聚合起始劑（C）與量子點（D）之間產生影響。結果，推測使用本申請發明相關之感光性組成物時，容易形成可合適地應用於發光顯示元件用發光層的、內部量子效率良好的硬化膜。 　　[0076] 在不妨礙本發明的目的的範圍內，光聚合起始劑（C）亦可包含分子內的部分電荷不滿足上述規定條件的化合物。 　　對於光聚合起始劑（C）中的、分子內的部分電荷滿足上述規定條件的化合物的含量而言，典型地，較佳為70質量%以上，更佳為80質量%以上，特別較佳為90質量%以上，最佳為100質量%。 　　[0077] 作為分子內的部分電荷滿足上述規定條件的光聚合起始劑的具體例，可舉出2-（苯甲醯基氧基亞氨基）-1-[4-（苯基硫基）苯基]-1-辛酮（例如，作為OXE-01（BASF公司製）而在市場上銷售）及下述式（CX）表示之肟酯化合物。 　　[化10][0078] 尚，以上的化合物群的分子內的部分電荷如下所示。 　　[表1] [0079] 為了參考，作為市售的公知之光聚合起始劑中的、分子內的正性部分電荷的最大值與負性部分電荷的最小值不滿足前述規定條件的具體例，可舉出：二苯基（2,4,6-三甲氧基苯甲醯基）氧化膦（例如，作為Lucirin TPO（BASF公司製）而在市場上銷售）、2-苄基-2-二甲基胺基-1-（4-嗎啉代（morpholino）苯基）-1-丁酮（例如，作為Irgacure 369（BASF公司製）而在市場上銷售。）、4-甲氧基苯乙烯基雙（三氯甲基）均三嗪（例如，作為三嗪PMS（日本Siber Hegner公司製）而在市場上銷售。）、O-乙醯基-1-[6-（2-甲基苯甲醯基）-9-乙基-9H-哢唑-3-基]乙酮肟（例如，作為OXE-02（BASF公司製）而在市場上銷售）、及下述式（CY）表示的肟酯化合物（例如，作為NCI-831（ADEKA公司製）而在市場上銷售）。 　　由上述可知，雖然是作為光聚合起始劑而公知的化合物，但分子內的正性部分電荷的最大值與負性部分電荷的最小值亦不一定滿足上述規定條件。 　　[化11][0080] 尚，關於部分電荷不在特定的數值範圍內的市售的化合物群的分子內的部分電荷，如下所示。 　　[表2] [0081] 尚，從感光性組成物的敏感度方面考慮，光聚合起始劑（C）較佳為肟酯化合物。 　　肟酯化合物中，從存在分子內的正性部分電荷的最大值小、負性部分電荷的最小值大的傾向的方面考慮，較佳具有＞C=N-O-CO-Rc0 表示之肟酯基的化合物。尚，上述的式中的Rc0 為碳原子數為1~6之脂肪族烴基。 　　Rc0 可為直鏈狀烷基，亦可為支鏈狀烷基，亦可以為環烷基，還可為組合地包含環丙基甲基這樣的脂肪族烴環與鏈狀烴基之基。 　　作為Rc0 的脂肪族烴基較佳為碳原子數為1~6的烷基，更佳為甲基及乙基，特別較佳為甲基。 　　[0082] 以上，具體說明了分子內的部分電荷滿足上述規定條件的光聚合起始劑（C），但亦較佳使用算出分子內的部分電荷、並以是否滿足上述規定條件為基準而從後述的式（c1）表示的肟酯化合物及後述的式（c4）表示的肟酯化合物中選擇的化合物作為光聚合起始劑（C）。 　　對於由式（c1）表示之肟酯化合物及後述之式（c4）表示的肟酯化合物所成之群包含的化合物而言，存在依據擴展休克爾法算出的分子內的正性部分電荷之最大值小、負性部分電荷之最小值大的傾向。 　　另外，式（c1）表示之肟酯化合物及後述之式（c4）表示的肟酯化合物從容易得到敏感度良好的感光性組成物方面考慮亦為較佳的。 　　[0083] 以下，對式（c1）表示之肟酯化合物進行說明。 　　[化12]（Rc1 為選自由1價的有機基、胺基、鹵素、硝基、及氰基所成之群中之基， 　　n1為0~4的整數， 　　n2為0或1， 　　Rc2 為可具有取代基之苯基或可具有取代基的哢唑基， 　　Rc3 為氫原子或碳原子數為1~6的烷基。） 　　尚，從存在分子內之正性部分電荷的最大值小、負性部分電荷之最小值大的傾向的方面考慮，Rc2 較佳為可以具有取代基的苯基。 　　[0084] 式（c1）中，Rc1 在不妨礙本發明的目的的範圍內沒有特別限制，可從各種有機基中適當選擇。作為Rc1 為有機基時的較佳的例子，可舉出烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、飽和脂肪族醯基氧基、烷氧基羰基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、胺基、被1個或2個有機基取代之胺基、嗎啉-1-基、及呱嗪-1-基、鹵素、硝基、及氰基等。n1為2~4的整數時，Rc1 可相同亦可不同。另外，取代基的碳原子數中不包含取代基進一步具有的取代基的碳原子數。 　　[0085] Rc1 為烷基時，碳原子數較佳為1~20，碳原子數更佳為1~6。另外，Rc1 為烷基時，可為直鏈，亦可為支鏈。作為Rc1 為烷基時的具體例，可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、異戊基、仲戊基、叔戊基、正己基、正庚基、正辛基、異辛基、仲辛基、叔辛基、正壬基、異壬基、正癸基、及異癸基等。另外，Rc1 為烷基時，烷基可在碳鏈中包含醚鍵（-O-）。作為在碳鏈中具有醚鍵的烷基的例子，可舉出甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基、及甲氧基丙基等。 　　[0086] Rc1 為烷氧基時，碳原子數較佳為1~20，碳原子數更佳為1~6。另外，Rc1 為烷氧基時，可為直鏈，亦可為支鏈。作為Rc1 為烷氧基時的具體例，可舉出甲氧基、乙氧基、正丙基氧基、異丙基氧基、正丁基氧基、異丁基氧基、仲丁基氧基、叔丁基氧基、正戊基氧基、異戊基氧基、仲戊基氧基、叔戊基氧基、正己基氧基、正庚基氧基、正辛基氧基、異辛基氧基、仲辛基氧基、叔辛基氧基、正壬基氧基、異壬基氧基、正癸基氧基、及異癸基氧基等。另外，Rc1 為烷氧基時，烷氧基可在碳鏈中包含醚鍵（-O-）。作為在碳鏈中具有醚鍵的烷氧基的例子，可舉出甲氧基乙氧基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙基氧基乙氧基乙氧基、及甲氧基丙基氧基等。 　　[0087] Rc1 為環烷基或環烷氧基時，碳原子數較佳為3~10，碳原子數更佳為3~6。作為Rc1 為環烷基時的具體例，可舉出環丙基、環丁基、環戊基、環己基、環庚基、及環辛基等。作為Rc1 為環烷氧基時的具體例，可舉出環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環庚基氧基、及環辛基氧基等。 　　[0088] Rc1 為飽和脂肪族醯基或飽和脂肪族醯基氧基時，碳原子數較佳為2~20，碳原子數更佳為2~7。作為Rc1 為飽和脂肪族醯基時的具體例，可舉出乙醯基、丙醯基、正丁醯基、2-甲基丙醯基、正戊醯基、2,2-二甲基丙醯基、正己醯基、正庚醯基、正辛醯基、正壬醯基、正癸醯基、正十一烷醯基、正十二烷醯基、正十三烷醯基、正十四烷醯基、正十五烷醯基、及正十六烷醯基等。作為Rc1 為飽和脂肪族醯基氧基時的具體例，可舉出乙醯基氧基、丙醯基氧基、正丁醯基氧基、2-甲基丙醯基氧基、正戊醯基氧基、2,2-二甲基丙醯基氧基、正己醯基氧基、正庚醯基氧基、正辛醯基氧基、正壬醯基氧基、正癸醯基氧基、正十一烷醯基氧基、正十二烷醯基氧基、正十三烷醯基氧基、正十四烷醯基氧基、正十五烷醯基氧基、及正十六烷醯基氧基等。 　　[0089] Rc1 為烷氧基羰基時，碳原子數較佳為2~20，碳原子數更佳為2~7。作為Rc1 為烷氧基羰基時的具體例，可舉出甲氧基羰基、乙氧基羰基、正丙基氧基羰基、異丙基氧基羰基、正丁基氧基羰基、異丁基氧基羰基、仲丁基氧基羰基、叔丁基氧基羰基、正戊基氧基羰基、異戊基氧基羰基、仲戊基氧基羰基、叔戊基氧基羰基、正己基氧基羰基、正庚基氧基羰基、正辛基氧基羰基、異辛基氧基羰基、仲辛基氧基羰基、叔辛基氧基羰基、正壬基氧基羰基、異壬基氧基羰基、正癸基氧基羰基、及異癸基氧基羰基等。 　　[0090] Rc1 為苯基烷基時，碳原子數較佳為7~20，碳原子數更佳為7~10。另外，Rc1 為萘基烷基時，碳原子數較佳為11~20，碳原子數更佳為11~14。作為Rc1 為苯基烷基時的具體例，可舉出苄基、2-苯基乙基、3-苯基丙基、及4-苯基丁基。作為Rc1 為萘基烷基時的具體例，可舉出α-萘基甲基、β-萘基甲基、2-（α-萘基）乙基、及2-（β-萘基）乙基。Rc1 為苯基烷基或萘基烷基時，Rc1 可在苯基或萘基上進一步具有取代基。 　　[0091] Rc1 為雜環基時，雜環基為包含1個以上的N、S、O的五元或六元的單環，或者為所述單環彼此縮合、或所述單環與苯環縮合而成的雜環基。雜環基為縮合環時，環數為3以下。作為構成所述雜環基的雜環，可舉出呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪（indolizine）、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、哢唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪、噌啉、及喹喔啉等。Rc1 為雜環基時，雜環基可進一步具有取代基。 　　[0092] Rc1 為被1個或2個有機基取代的胺基時，關於有機基的較佳的例子，可舉出碳原子數為1~20的烷基、碳原子數為3~10的環烷基、碳原子數為2~20的飽和脂肪族醯基、可具有取代基的苯基、可具有取代基的苯甲醯基、可具有取代基的碳原子數為7~20的苯基烷基、可具有取代基的萘基、可具有取代基的萘甲醯基、可具有取代基的碳原子數為11~20的萘基烷基、及雜環基等。此等較佳的有機基的具體例與Rc1 同樣。作為被1個或2個有機基取代的胺基的具體例，可舉出甲基胺基、乙基胺基、二乙基胺基、正丙基胺基、二正丙基胺基、異丙基胺基、正丁基胺基、二正丁基胺基、正戊基胺基、正己基胺基、正庚基胺基、正辛基胺基、正壬基胺基、正癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、正丁醯基胺基、正戊醯基胺基、正己醯基胺基、正庚醯基胺基、正辛醯基胺基、正癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基、及β-萘甲醯基胺基等。 　　[0093] 作為Rc1 中包含的苯基、萘基、及雜環基進一步具有取代基時的取代基，可舉出碳原子數為1~6之烷基、碳原子數為1~6之烷氧基、碳原子數為2~7之飽和脂肪族醯基、碳原子數為2~7之烷氧基羰基、碳原子數為2~7之飽和脂肪族醯基氧基、具有碳原子數為1~6之烷基的單烷基胺基、具有碳原子數為1~6之烷基的二烷基胺基、嗎啉-1-基、呱嗪-1-基、鹵素、硝基、及氰基等。Rc1 中包含的苯基、萘基、及雜環基進一步具有取代基時，該取代基的數目在不妨礙本發明的目的的範圍內沒有限制，較佳為1~4。Rc1 中包含的苯基、萘基、及雜環基具有多個取代基時，多個取代基可以相同亦可以不同。 　　[0094] Rc1 中，從化學穩定、空間位阻小、容易合成肟酯化合物等方面考慮，較佳為選自由碳原子數為1~6之烷基、碳原子數為1~6之烷氧基、及碳原子數為2~7之飽和脂肪族醯基所成之群中之基，更佳為碳原子數為1~6的烷基，特別較佳為甲基。 　　[0095] 針對Rc1 所鍵結的苯基，在將苯基與肟酯化合物之主骨架的化學鍵的位置作為1位、將甲基的位置作為2位元的情況下，Rc1 在苯基上鍵結的位置較佳為4位或5位，更佳為5位。另外，n1較佳為0~3的整數，更佳為0~2的整數，特別較佳為0或1。 　　[0096] Rc2 為可具有取代基之苯基、或可具有取代基之哢唑基。另外，Rc2 為可具有取代基之哢唑基時，哢唑基上之氮原子可被碳原子數為1~6的烷基取代。 　　Rc2 中，苯基或哢唑基所具有的取代基在不妨礙本發明的目的的範圍內沒有特別限制。作為苯基或哢唑基可在碳原子上具有的較佳的取代基的例子，可舉出碳原子數為1~20之烷基、碳原子數為1~20之烷氧基、碳原子數為3~10的環烷基、碳原子數為3~10的環烷氧基、碳原子數為2~20之飽和脂肪族醯基、碳原子數為2~20之烷氧基羰基、碳原子數為2~20之飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯基硫基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之碳原子數為7~20的苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之碳原子數為11~20的萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、胺基、被1個或2個有機基取代的胺基、嗎啉-1-基、及呱嗪-1-基、鹵素、硝基、及氰基等。 　　[0097] Rc2 為哢唑基時，作為哢唑基可在氮原子上具有的較佳的取代基的例子，可舉出碳原子數為1~20之烷基、碳原子數為3~10之環烷基、碳原子數為2~20之飽和脂肪族醯基、碳原子數為2~20之烷氧基羰基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之碳原子數為7~20的苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基的碳原子數為11~20之萘基烷基、可具有取代基之雜環基、及可具有取代基之雜環基羰基等。此等取代基中，較佳碳原子數為1~20的烷基，更佳碳原子數為1~6的烷基，特別較佳乙基。 　　[0098] 對於苯基或哢唑基可具有的取代基的具體例而言，關於烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基烷基、可具有取代基之雜環基、及被1個或2個有機基取代之胺基，與Rc1 同樣。 　　[0099] Rc2 中，作為苯基或哢唑基所具有的取代基中包含的苯基、萘基、及雜環基進一步具有取代基時的取代基的例子，可舉出碳原子數為1~6之烷基；碳原子數為1~6之烷氧基；碳原子數為2~7之飽和脂肪族醯基；碳原子數為2~7之烷氧基羰基；碳原子數為2~7之飽和脂肪族醯基氧基；苯基；萘基；苯甲醯基；萘甲醯基；被選自由碳原子數為1~6的烷基、嗎啉-1-基、呱嗪-1-基、及苯基所成之群中之基取代的苯甲醯基；具有碳原子數為1~6的烷基的單烷基胺基；具有碳原子數為1~6的烷基的二烷基胺基；嗎啉-1-基；呱嗪-1-基；鹵素；硝基；氰基。苯基或哢唑基所具有的取代基中包含的苯基、萘基、及雜環基進一步具有取代基時，該取代基的數目在不妨礙本發明的目的的範圍內沒有限制，較佳為1~4。苯基、萘基、及雜環基具有多個取代基時，多個取代基可以相同亦可以不同。 　　[0100] Rc2 中，從容易得到敏感度較佳的光聚合起始劑方面考慮，較佳為下述式（c2）、或（c3）表示之基，更佳為下述式（c2）表示之基，特別較佳為A為S的下述式（c2）表示之基。 　　[0101] 　　[化13]（Rc4 為選自由1價之有機基、胺基、鹵素、硝基、及氰基所成之群中之基，A為S或O，n3為0~4的整數） 　　[化14]（Rc5 及Rc6 各自為1價之有機基） 　　[0102] 式（c2）中的Rc4 為有機基時，可在不妨礙本發明的目的的範圍內從各種有機基中選擇。作為式（c2）中Rc4 為有機基時的較佳的例子，可舉出碳原子數為1~6之烷基；碳原子數為1~6之烷氧基；碳原子數為2~7之飽和脂肪族醯基；碳原子數為2~7之烷氧基羰基；碳原子數為2~7之飽和脂肪族醯基氧基；苯基；萘基；苯甲醯基；萘甲醯基；被選自由碳原子數為1~6之烷基、嗎啉-1-基、呱嗪-1-基、及苯基所成之群中之基取代的苯甲醯基；具有碳原子數為1~6的烷基之單烷基胺基；具有碳原子數為1~6的烷基之二烷基胺基；嗎啉-1-基；呱嗪-1-基；鹵素；硝基；氰基。 　　[0103] Rc4 中，較佳為苯甲醯基；萘甲醯基；被選自由碳原子數為1~6之烷基、嗎啉-1-基、呱嗪-1-基、及苯基所成之群中之基取代的苯甲醯基；硝基，更佳為苯甲醯基；萘甲醯基；2-甲基苯基羰基；4-（呱嗪-1-基）苯基羰基；4-（苯基）苯基羰基。 　　[0104] 另外，式（c2）中，n3較佳為0~3的整數，更佳為0~2的整數，特別較佳為0或1。n3為1時，Rc4 的鍵結位置較佳為：相對於Rc4 所鍵結的苯基與氧原子或硫原子鍵結的化學鍵為對位。 　　[0105] 式（c3）中的Rc5 可在不妨礙本發明的目的的範圍內從各種有機基中選擇。作為Rc5 的較佳的例子，可舉出碳原子數為1~20之烷基、碳原子數為3~10之環烷基、碳原子數為2~20之飽和脂肪族醯基、碳原子數為2~20之烷氧基羰基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之碳原子數為7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之碳原子數為11~20的萘基烷基、可具有取代基之雜環基、及可具有取代基之雜環基羰基等。 　　Rc5 中，較佳為碳原子數為1~20之烷基，更佳為碳原子數為1~6之烷基，特別較佳為乙基。 　　式（c3）中的Rc6 在不妨礙本發明的目的的範圍內沒有特別限制，可從各種有機基中選擇。作為適於作為Rc6 的基之具體例，可舉出碳原子數為1~20之烷基、可具有取代基之苯基、可具有取代基之萘基、及可具有取代基之雜環基。作為Rc6 ，更佳此等基中的可具有取代基的苯基，特別較佳2-甲基苯基。 　　[0106] 作為Rc4 、Rc5 、或Rc6 中包含之苯基、萘基、及雜環基進一步具有取代基時之取代基，可舉出碳原子數為1~6之烷基、碳原子數為1~6之烷氧基、碳原子數為2~7之飽和脂肪族醯基、碳原子數為2~7之烷氧基羰基、碳原子數為2~7之飽和脂肪族醯基氧基、具有碳原子數為1~6之烷基的單烷基胺基、具有碳原子數為1~6的烷基的二烷基胺基、嗎啉-1-基、呱嗪-1-基、鹵素、硝基、及氰基等。Rc4 、Rc5 、或Rc6 中包含之苯基、萘基、及雜環基進一步具有取代基時，該取代基的數目在不妨礙本發明的目的的範圍內沒有限制，較佳為1~4。Rc4 、Rc5 、或Rc6 中包含的苯基、萘基、及雜環基具有多個取代基時，多個取代基可以相同亦可以不同。 　　[0107] 式（c1）中的Rc3 為氫原子、或碳原子數為1~6的烷基。作為Rc3 ，較佳為甲基或乙基，更佳為甲基。 　　[0108] 式（c1）表示之肟酯化合物之群中，例如，較佳下述的式（CZ1）表示的化合物。對於該式（CZ1）表示的化合物而言，分子內的正性部分電荷的最大值為0.019，負性部分電荷的最小值為-0.004。 　　[化15][0109] 接下來，對下述式（c4）表示之肟酯化合物進行說明。 　　[化16]（Rc7 為氫原子、硝基或1價之有機基，Rc8 及Rc9 各自為可具有取代基之鏈狀烷基、可具有取代基之環狀有機基、或氫原子，Rc8 與Rc9 可相互鍵結而形成環，Rc10 為1價的有機基，Rc11 為氫原子、可具有取代基之碳原子數為1~11的烷基、或可以具有取代基的芳基，n4為0~4的整數，n5為0或1）。 　　[0110] 此處，作為用於製造式（c4）之肟酯化合物的肟化合物，較佳下式（c5）表示的化合物。 　　[0111] 　　[化17]（Rc7 、Rc8 、Rc9 、Rc10 、n4、及n5與式（c4）同樣。） 　　[0112] 式（c4）及（c5）中，Rc7 為氫原子、硝基或1價之有機基。Rc7 在式（c4）中的芴環上鍵結於與-(CO)n5 -表示的基所鍵結的六元芳香環不同的六元芳香環。式（c4）中，Rc7 在芴環上的鍵結位置沒有特別限制。式（c4）表示的化合物具有1個以上的Rc7 時，從容易合成式（c4）表示的化合物等方面考慮，較佳1個以上的Rc7 中的1個鍵結於芴環中的2位。Rc7 為多個時，多個Rc7 可以相同亦可以不同。 　　[0113] Rc7 為有機基時，Rc7 在不妨礙本發明的目的的範圍內沒有特別限制，可從各種有機基中適當選擇。作為Rc7 為有機基時的較佳的例子，可舉出烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、飽和脂肪族醯基氧基、烷氧基羰基、可具有取代基的苯基、可具有取代基的苯氧基、可以具有取代基的苯甲醯基、可具有取代基的苯氧基羰基、可具有取代基的苯甲醯基氧基、可具有取代基的苯基烷基、可具有取代基的萘基、可具有取代基的萘氧基、可具有取代基的萘甲醯基、可具有取代基的萘氧基羰基、可具有取代基的萘甲醯基氧基、可具有取代基的萘基烷基、可具有取代基的雜環基、可具有取代基的雜環基羰基、被1個或2個有機基取代之胺基、嗎啉-1-基、及呱嗪-1-基等。 　　[0114] Rc7 為烷基時，烷基的碳原子數較佳為1~20，更佳為1~6。另外，Rc7 為烷基時，可為直鏈，亦可為支鏈。作為Rc7 為烷基時的具體例，可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、異戊基、仲戊基、叔戊基、正己基、正庚基、正辛基、異辛基、仲辛基、叔辛基、正壬基、異壬基、正癸基、及異癸基等。另外，Rc7 為烷基時，烷基可在碳鏈中包含醚鍵（-O-）。作為在碳鏈中具有醚鍵之烷基的例子，可舉出甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基、及甲氧基丙基等。 　　[0115] Rc7 為烷氧基時，烷氧基的碳原子數較佳為1~20，更佳為1~6。另外，Rc7 為烷氧基時，可為直鏈，亦可為支鏈。作為Rc7 為烷氧基時的具體例，可舉出甲氧基、乙氧基、正丙基氧基、異丙基氧基、正丁基氧基、異丁基氧基、仲丁基氧基、叔丁基氧基、正戊基氧基、異戊基氧基、仲戊基氧基、叔戊基氧基、正己基氧基、正庚基氧基、正辛基氧基、異辛基氧基、仲辛基氧基、叔辛基氧基、正壬基氧基、異壬基氧基、正癸基氧基、及異癸基氧基等。另外，Rc7 為烷氧基時，烷氧基可在碳鏈中包含醚鍵（-O-）。作為在碳鏈中具有醚鍵的烷氧基的例子，可舉出甲氧基乙氧基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙基氧基乙氧基乙氧基、及甲氧基丙基氧基等。 　　[0116] Rc7 為環烷基或環烷氧基時，環烷基或環烷氧基的碳原子數較佳為3~10，更佳為3~6。作為Rc7 為環烷基時的具體例，可舉出環丙基、環丁基、環戊基、環己基、環庚基、及環辛基等。作為Rc7 為環烷氧基時的具體例，可舉出環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環庚基氧基、及環辛基氧基等。 　　[0117] Rc7 為飽和脂肪族醯基或飽和脂肪族醯基氧基時，飽和脂肪族醯基或飽和脂肪族醯基氧基的碳原子數較佳為2~21，更佳為2~7。作為Rc7 為飽和脂肪族醯基時的具體例，可舉出乙醯基、丙醯基、正丁醯基、2-甲基丙醯基、正戊醯基、2,2-二甲基丙醯基、正己醯基、正庚醯基、正辛醯基、正壬醯基、正癸醯基、正十一烷醯基、正十二烷醯基、正十三烷醯基、正十四烷醯基、正十五烷醯基、及正十六烷醯基等。作為Rc7 為飽和脂肪族醯基氧基時的具體例，可舉出乙醯基氧基、丙醯基氧基、正丁醯基氧基、2-甲基丙醯基氧基、正戊醯基氧基、2,2-二甲基丙醯基氧基、正己醯基氧基、正庚醯基氧基、正辛醯基氧基、正壬醯基氧基、正癸醯基氧基、正十一烷醯基氧基、正十二烷醯基氧基、正十三烷醯基氧基、正十四烷醯基氧基、正十五烷醯基氧基、及正十六烷醯基氧基等。 　　[0118] Rc7 為烷氧基羰基時，烷氧基羰基的碳原子數較佳為2~20，更佳為2~7。作為Rc7 為烷氧基羰基時的具體例，可舉出甲氧基羰基、乙氧基羰基、正丙基氧基羰基、異丙基氧基羰基、正丁基氧基羰基、異丁基氧基羰基、仲丁基氧基羰基、叔丁基氧基羰基、正戊基氧基羰基、異戊基氧基羰基、仲戊基氧基羰基、叔戊基氧基羰基、正己基氧基羰基、正庚基氧基羰基、正辛基氧基羰基、異辛基氧基羰基、仲辛基氧基羰基、叔辛基氧基羰基、正壬基氧基羰基、異壬基氧基羰基、正癸基氧基羰基、及異癸基氧基羰基等。 　　[0119] Rc7 為苯基烷基時，苯基烷基的碳原子數較佳為7~20，更佳為7~10。另外，Rc7 為萘基烷基時，萘基烷基的碳原子數較佳為11~20，更佳為11~14。作為Rc7 為苯基烷基時的具體例，可舉出苄基、2-苯基乙基、3-苯基丙基、及4-苯基丁基。作為Rc7 為萘基烷基時的具體例，可舉出α-萘基甲基、β-萘基甲基、2-（α-萘基）乙基、及2-（β-萘基）乙基。Rc7 為苯基烷基、或萘基烷基時，Rc7 可在苯基或萘基上進一步具有取代基。 　　[0120] Rc7 為雜環基時，雜環基為包含1個以上的N、S、O的五元或六元的單環，或者為所述單環彼此縮合、或所述單環與苯環縮合而成的雜環基。雜環基為縮合環時，環數為3以下。雜環基可以為芳香族基（雜芳基），亦可以為非芳香族基。作為構成所述雜環基之雜環，可舉出呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、哢唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪、噌啉、喹喔啉、呱啶、呱嗪、嗎啉、呱啶、四氫吡喃、及四氫呋喃等。Rc7 為雜環基時，雜環基可以進一步具有取代基。 　　[0121] Rc7 為雜環基羰基時，雜環基羰基中包含的雜環基與Rc7 為雜環基時同樣。 　　[0122] Rc7 為被1個或2個有機基取代的胺基時，關於有機基的較佳的例子，可舉出碳原子數為1~20之烷基、碳原子數為3~10之環烷基、碳原子數為2~21之飽和脂肪族醯基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之碳原子數為7~20的苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之碳原子數為11~20之萘基烷基、及雜環基等。此等較佳之有機基的具體例與Rc7 同樣。作為被1個或2個有機基取代之胺基的具體例，可舉出甲基胺基、乙基胺基、二乙基胺基、正丙基胺基、二正丙基胺基、異丙基胺基、正丁基胺基、二正丁基胺基、正戊基胺基、正己基胺基、正庚基胺基、正辛基胺基、正壬基胺基、正癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、正丁醯基胺基、正戊醯基胺基、正己醯基胺基、正庚醯基胺基、正辛醯基胺基、正癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基、及β-萘甲醯基胺基等。 　　[0123] 作為Rc7 中包含的苯基、萘基、及雜環基進一步具有取代基時的取代基，可舉出碳原子數為1~6之烷基、碳原子數為1~6之烷氧基、碳原子數為2~7之飽和脂肪族醯基、碳原子數為2~7之烷氧基羰基、碳原子數為2~7之飽和脂肪族醯基氧基、具有碳原子數為1~6的烷基之單烷基胺基、具有碳原子數為1~6之烷基的二烷基胺基、嗎啉-1-基、呱嗪-1-基、鹵素、硝基、及氰基等。 　　Rc7 中包含的苯基、萘基、及雜環基進一步具有取代基時，該取代基的數目在不妨礙本發明的目的的範圍內沒有限制，較佳為1~4。Rc7 中包含的苯基、萘基、及雜環基具有多個取代基時，多個取代基可以相同亦可以不同。 　　[0124] 在以上說明的基中，作為Rc7 ，為硝基或Rc12 -CO-表示的基時，存在敏感度提高的傾向，是較佳的。Rc12 在不妨礙本發明的目的的範圍內沒有特別限制，可從各種有機基中選擇。作為適於作為Rc12 的基的例子，可舉出碳原子數為1~20之烷基、可具有取代基之苯基、可具有取代基之萘基、及可具有取代基之雜環基。此等基中，作為Rc12 ，特別較佳2-甲基苯基、噻吩-2-基、及α-萘基。 　　另外，Rc7 為氫原子時，存在透明性變得良好的傾向，為較佳的。尚，Rc7 為氫原子且Rc10 為後述的式（c4a）或（c4b）表示的基時，存在透明性變得更良好的傾向。 　　[0125] 式（c4）中，Rc8 及Rc9 各自為可具有取代基之鏈狀烷基、可具有取代基的環狀有機基、或氫原子。Rc8 與Rc9 可相互鍵結而形成環。此等基中，作為Rc8 及Rc9 ，較佳可以具有取代基之鏈狀烷基。Rc8 及Rc9 為可具有取代基之鏈狀烷基時，鏈狀烷基可為直鏈烷基，亦可為支鏈烷基。 　　[0126] Rc8 及Rc9 為不具有取代基之鏈狀烷基時，鏈狀烷基之碳原子數較佳為1~20，更佳為1~10，特別較佳為1~6。作為Rc8 及Rc9 為鏈狀烷基時的具體例，可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、異戊基、仲戊基、叔戊基、正己基、正庚基、正辛基、異辛基、仲辛基、叔辛基、正壬基、異壬基、正癸基、及異癸基等。另外，Rc8 及Rc9 為烷基時，烷基可在碳鏈中包含醚鍵（-O-）。作為在碳鏈中具有醚鍵的烷基的例子，可舉出甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基、及甲氧基丙基等。 　　[0127] Rc8 及Rc9 為具有取代基的鏈狀烷基時，鏈狀烷基之碳原子數較佳為1~20，更佳為1~10，特別較佳為1~6。這種情況下，鏈狀烷基的碳原子數中不包含取代基之碳原子數。具有取代基之鏈狀烷基較佳為直鏈狀。 　　烷基可具有的取代基在不妨礙本發明的目的的範圍內沒有特別限制。作為取代基的較佳的例子，可舉出氰基、鹵素原子、環狀有機基、及烷氧基羰基。作為鹵素原子，可舉出氟原子、氯原子、溴原子、碘原子。此等中，較佳氟原子、氯原子、溴原子。作為環狀有機基，可舉出環烷基、芳香族烴基、雜環基。作為環烷基的具體例，與Rc7 為環烷基時的較佳的例子同樣。作為芳香族烴基的具體例，可舉出苯基、萘基、聯苯基、蒽基、及菲基等。作為雜環基的具體例，與Rc7 為雜環基時的較佳的例子同樣。Rc7 為烷氧基羰基時，烷氧基羰基中包含的烷氧基可以為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。烷氧基羰基中包含的烷氧基的碳原子數較佳為1~10，更佳為1~6。 　　[0128] 鏈狀烷基具有取代基時，取代基的數目沒有特別限制。較佳的取代基的數目根據鏈狀烷基的碳原子數而改變。典型地，取代基的數目為1~20，較佳為1~10，更佳為1~6。 　　[0129] Rc8 及Rc9 為環狀有機基時，環狀有機基可為脂環式基，亦可以為芳香族基。作為環狀有機基，可舉出脂肪族環狀烴基、芳香族烴基、雜環基。Rc8 及Rc9 為環狀有機基時，環狀有機基可具有的取代基與Rc8 及Rc9 為鏈狀烷基時同樣。 　　[0130] Rc8 及Rc9 為芳香族烴基時，芳香族烴基較佳為：苯基、或多個苯環介由碳-碳鍵鍵結而形成之基、或多個苯環縮合而形成的基。芳香族烴基為苯基、或多個苯環鍵結或縮合而形成的基時，芳香族烴基中包含的苯環的環數沒有特別限制，較佳為3以下，更佳為2以下，特別較佳為1。作為芳香族烴基的較佳的具體例，可舉出苯基、萘基、聯苯基、蒽基、及菲基等。 　　[0131] Rc8 及Rc9 為脂肪族環狀烴基時，脂肪族環狀烴基可為單環式，亦可以為多環式。脂肪族環狀烴基之碳原子數沒有特別限制，較佳為3~20，更佳為3~10。作為單環式的環狀烴基的例子，可舉出環丙基、環丁基、環戊基、環己基、環庚基、環辛基、降冰片基、異冰片基、三環壬基、三環癸基、四環十二烷基、及金剛烷基等。 　　[0132] Rc8 及Rc9 為雜環基時，雜環基為包含1個以上的N、S、O的五元或六元之單環，或者為所述單環彼此縮合、或所述單環與苯環縮合而成的雜環基。雜環基為縮合環時，環數為3以下。雜環基可為芳香族基（雜芳基），亦可為非芳香族基。作為構成所述雜環基的雜環，可舉出呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、哢唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪、噌啉、喹喔啉、呱啶、呱嗪、嗎啉、呱啶、四氫吡喃、及四氫呋喃等。 　　[0133] Rc8 與Rc9 可相互鍵結而形成環。包含Rc8 與Rc9 形成的環的基較佳為環烷叉基（cycloalkylidene group）。Rc8 與Rc9 鍵結而形成環烷叉基時，構成環烷叉基的環較佳為五元環~六元環，更佳為五元環。 　　[0134] Rc8 與Rc9 鍵結而形成的基為環烷叉基時，環烷叉基可與1個以上的其他環縮合。作為可與環烷叉基縮合的環的例子，可舉出苯環、萘環、環丁烷環、單環烷烴環、雙環烷烴環、三環烷烴環、四環烷烴環、呋喃環、噻吩環、吡咯環、吡啶環、吡嗪環、及嘧啶環等。 　　[0135] 以上說明之Rc8 及Rc9 中，作為較佳的基的例子，可舉出式-A1 -A2 表示之基。式中，A1 為直鏈亞烷基，A2 為烷氧基、氰基、鹵素原子、鹵代烷基、環狀有機基、或烷氧基羰基。 　　[0136] A1 之直鏈亞烷基的碳原子數較佳為1~10，更佳為1~6。A2 為烷氧基時，烷氧基可為直鏈狀，亦可為支鏈狀，較佳直鏈狀。烷氧基的碳原子數較佳為1~10，更佳為1~6。A2 為鹵素原子時，較佳為氟原子、氯原子、溴原子、碘原子，更佳為氟原子、氯原子、溴原子。A2 為鹵代烷基時，鹵代烷基中包含之鹵素原子較佳為氟原子、氯原子、溴原子、碘原子，更佳為氟原子、氯原子、溴原子。鹵代烷基可為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。A2 為環狀有機基時，環狀有機基的例子與Rc8 及Rc9 作為取代基而具有的環狀有機基同樣。A2 為烷氧基羰基時，烷氧基羰基的例子與Rc8 及Rc9 作為取代基而具有的烷氧基羰基同樣。 　　[0137] 作為Rc8 及Rc9 的較佳之具體例，可舉出乙基、正丙基、正丁基、正己基、正庚基、及正辛基等烷基；2-甲氧基乙基、3-甲氧基正丙基、4-甲氧基正丁基、5-甲氧基正戊基、6-甲氧基正己基、7-甲氧基正庚基、8-甲氧基正辛基、2-乙氧基乙基、3-乙氧基正丙基、4-乙氧基正丁基、5-乙氧基正戊基、6-乙氧基正己基、7-乙氧基正庚基、及8-乙氧基正辛基等烷氧基烷基；2-氰基乙基、3-氰基正丙基、4-氰基正丁基、5-氰基正戊基、6-氰基正己基、7-氰基正庚基、及8-氰基正辛基等氰基烷基；2-苯基乙基、3-苯基正丙基、4-苯基正丁基、5-苯基正戊基、6-苯基正己基、7-苯基正庚基、及8-苯基正辛基等苯基烷基；2-環己基乙基、3-環己基正丙基、4-環己基正丁基、5-環己基正戊基、6-環己基正己基、7-環己基正庚基、8-環己基正辛基、2-環戊基乙基、3-環戊基正丙基、4-環戊基正丁基、5-環戊基正戊基、6-環戊基正己基、7-環戊基正庚基、及8-環戊基正辛基等環烷基烷基；2-甲氧基羰基乙基、3-甲氧基羰基正丙基、4-甲氧基羰基正丁基、5-甲氧基羰基正戊基、6-甲氧基羰基正己基、7-甲氧基羰基正庚基、8-甲氧基羰基正辛基、2-乙氧基羰基乙基、3-乙氧基羰基正丙基、4-乙氧基羰基正丁基、5-乙氧基羰基正戊基、6-乙氧基羰基正己基、7-乙氧基羰基正庚基、及8-乙氧基羰基正辛基等烷氧基羰基烷基；2-氯乙基、3-氯正丙基、4-氯正丁基、5-氯正戊基、6-氯正己基、7-氯正庚基、8-氯正辛基、2-溴乙基、3-溴正丙基、4-溴正丁基、5-溴正戊基、6-溴正己基、7-溴正庚基、8-溴正辛基、3,3,3-三氟丙基、及3,3,4,4,5,5,5-七氟正戊基等鹵代烷基。 　　[0138] 作為Rc8 及Rc9 ，上述中較佳的基為乙基、正丙基、正丁基、正戊基、2-甲氧基乙基、2-氰基乙基、2-苯基乙基、2-環己基乙基、2-甲氧基羰基乙基、2-氯乙基、2-溴乙基、3,3,3-三氟丙基、及3,3,4,4,5,5,5-七氟正戊基。 　　[0139] 作為Rc10 的較佳之有機基的例子，與Rc7 同樣，可舉出烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、被1個或2個有機基取代之胺基、嗎啉-1-基、及呱嗪-1-基等。此等基的具體例與針對Rc7 而說明的例子同樣。另外，作為Rc10 ，還較佳環烷基烷基、可在芳香環上具有取代基的苯氧基烷基、可在芳香環上具有取代基的苯基硫基烷基。苯氧基烷基及苯基硫基烷基可具有的取代基與Rc7 中包含的苯基可具有的取代基同樣。 　　[0140] 有機基中，作為Rc10 ，較佳烷基、環烷基、可具有取代基之苯基、或環烷基烷基、可在芳香環上具有取代基的苯基硫基烷基。作為烷基，較佳碳原子數為1~20的烷基，更佳碳原子數為1~8的烷基，特別較佳碳原子數為1~4之烷基，最佳甲基。可具有取代基之苯基中，較佳甲基苯基，更佳2-甲基苯基。環烷基烷基中包含的環烷基的碳原子數較佳為5~10，更佳為5~8，特別較佳為5或6。環烷基烷基中包含的亞烷基之碳原子數較佳為1~8，更佳為1~4，特別較佳為2。環烷基烷基中，較佳環戊基乙基。可在芳香環上具有取代基之苯基硫基烷基中包含的亞烷基的碳原子數較佳為1~8，更佳為1~4，特別較佳為2。可在芳香環上具有取代基的苯基硫基烷基中，較佳為2-（4-氯苯基硫基）乙基。 　　[0141] 另外，作為Rc10 ，還較佳-A3 -CO-O-A4 表示之基。A3 為2價之有機基，較佳為2價之烴基，較佳為亞烷基。A4 為1價的有機基，較佳為1價之烴基。 　　[0142] A3 為亞烷基時，亞烷基可為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。A3 為亞烷基時，亞烷基之碳原子數較佳為1~10，更佳為1~6，特別較佳為1~4。 　　[0143] 作為A4 的較佳的例子，可舉出碳原子數為1~10之烷基、碳原子數為7~20之芳烷基、及碳原子數為6~20之芳香族烴基。作為A4 之較佳的具體例，可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、正己基、苯基、萘基、苄基、苯乙基、α-萘基甲基、及β-萘基甲基等。 　　[0144] 作為-A3 -CO-O-A4 表示之基的較佳的具體例，可舉出2-甲氧基羰基乙基、2-乙氧基羰基乙基、2-正丙基氧基羰基乙基、2-正丁基氧基羰基乙基、2-正戊基氧基羰基乙基、2-正己基氧基羰基乙基、2-苄基氧基羰基乙基、2-苯氧基羰基乙基、3-甲氧基羰基正丙基、3-乙氧基羰基正丙基、3-正丙基氧基羰基正丙基、3-正丁基氧基羰基正丙基、3-正戊基氧基羰基正丙基、3-正己基氧基羰基正丙基、3-苄基氧基羰基正丙基、及3-苯氧基羰基正丙基等。 　　[0145] 以上，對Rc10 進行了說明，作為Rc10 ，較佳下述式（c4a）或（c4b）表示之基。 　　[化18]（式（c4a）及（c4b）中，Rc13 及Rc14 各自為有機基，n6為0~4之整數，Rc13 及R8 存在於苯環上的相鄰的位置時，Rc13 與Rc14 可相互鍵結而形成環，n7為1~8的整數，n8為1~5的整數，n9為0~（n8+3）的整數，Rc15 為有機基）。 　　[0146] 式（c4a）中之Rc13 及Rc14 中的有機基的例子與Rc7 同樣。作為Rc13 ，較佳烷基或苯基。Rc13 為烷基時，其碳原子數較佳為1~10，更佳為1~5，特別較佳為1~3，最佳為1。即，Rc13 最較佳為甲基。Rc13 與Rc14 鍵結而形成環時，該環可為芳香族環，亦可為脂肪族環。作為Rc13 與Rc14 形成了環的式（c4a）表示的基的較佳的例子，可舉出萘-1-基、1,2,3,4-四氫萘-5-基等。上述式（c4a）中，n6為0~4的整數，較佳為0或1，更佳為0。 　　[0147] 上述式（c4b）中，Rc15 為有機基。作為有機基，可舉出與針對Rc7 而說明的有機基同樣之基。有機基中，較佳烷基。烷基可為直鏈狀，亦可為支鏈狀。烷基的碳原子數較佳為1~10，更佳為1~5，特別較佳為1~3。作為Rc15 ，可較佳例舉甲基、乙基、丙基、異丙基、丁基等，此等中，更佳為甲基。 　　[0148] 上述式（c4b）中，n8為1~5的整數，較佳為1~3的整數，更佳為1或2。上述式（c4b）中，n9為0~（n8+3），較佳為0~3的整數，更佳為0~2的整數，特別較佳為0。上述式（c4b）中，n7為1~8之整數，較佳為1~5之整數，更佳為1~3之整數，特別較佳為1或2。 　　[0149] 式（c4）中，Rc11 為氫原子、可具有取代基的碳原子數為1~11的烷基、或可具有取代基的芳基。作為Rc11 為烷基時可具有的取代基，可較佳例舉苯基、萘基等。另外，作為Rc7 為芳基時可具有的取代基，可較佳例舉碳原子數為1~5的烷基、烷氧基、鹵素原子等。 　　[0150] 式（c4）中，作為Rc11 ，可較佳例舉氫原子、甲基、乙基、正丙基、異丙基、正丁基、苯基、苄基、甲基苯基、萘基等，此等中，更佳甲基或苯基。 　　[0151] 式（c4）表示之化合物可利用包含下述步驟的方法來製造，所述步驟為：將上述的式（c5）表示的化合物中包含的肟基（＞C=N-OH）轉化為＞C=N-O-CORc11 表示的肟酯基。Rc11 與式（c4）中的Rc11 同樣。 　　[0152] 肟基（＞C=N-OH）向＞C=N-O-CORc11 表示的肟酯基的轉化可通過使上述的式（c5）表示的化合物與醯化劑反應而進行。 　　作為提供-CORc11 表示的醯基之醯化劑，可舉出(Rc11 CO)2 O表示之酸酐、Rc11 COHal（Hal為鹵素原子）表示之醯鹵。 　　[0153] 式（c4）表示之化合物中，較佳下述之式（CZ2）表示的化合物。對於該式（CZ2）表示的化合物而言，分子內之正性部分電荷之最大值為0.024，負性部分電荷之最小值為-0.129。 　　[化19][0154] 關於光聚合起始劑（C），其化合物的分子內的正性部分電荷的最大值較佳為0.350以下，更佳為0.200以下，進一步較佳為0.150以下，特別較佳為0.100以下，特別更佳為0.050以下。 　　關於光聚合起始劑（C），其化合物的分子內的負性部分電荷的最小值較佳為-0.350以上，更佳為-0.200以上，進一步較佳為-0.150以上，特別較佳為-0.100以上，特別更佳為-0.050以上。 　　經由將分子內的正性部分電荷及負性部分電荷設定為這樣的範圍，從而能進一步提高樹脂膜之的量子點的量子效率。 　　[0155] 相對於感光性組成物之固體含量整體的質量而言，光聚合起始劑（C）的含量較佳為0.5~30質量%，更佳為1~20質量%。經由使光聚合起始劑（C）的含量為上述的範圍，從而可得到敏感度良好、不易發生圖案形狀不良的感光性組成物。 　　[0156] 另外，可將光聚合起始劑（C）與光引發助劑組合。作為光引發助劑，可舉出三乙醇胺、甲基二乙醇胺、三異丙醇胺、4-二甲基胺基苯甲酸甲酯、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸異戊酯、4-二甲基胺基苯甲酸2-乙基己酯、苯甲酸2-二甲基胺基乙酯、N,N-二甲基對甲苯胺、4,4’-雙（二甲基胺基）二苯甲酮、9,10-二甲氧基蒽、2-乙基-9,10-二甲氧基蒽、9,10-二乙氧基蒽、2-乙基-9,10-二乙氧基蒽、2-巰基苯并噻唑、2-巰基苯并噁唑、2-巰基苯并咪唑、2-巰基-5-甲氧基苯并噻唑、3-巰基丙酸、3-巰基丙酸甲酯、季戊四醇四巰基乙酸酯、3-巰基丙酸酯等硫醇化合物等。此等光引發助劑可單獨使用或組合2種以上而使用。 　　[0157] ＜量子點（D）＞ 　　感光性組成物不僅包含上述的光聚合起始劑（C），還包含量子點（D）。經由使光聚合起始劑（C）的分子內的部分電荷滿足上述規定條件，從而可使用感光性組成物形成相對於激發光而言的螢光量子效率高的硬化膜。 　　[0158] 量子點（D）只要是發揮作為量子點的功能的微粒即可，其構造、其構成成分沒有特別限制。 　　從同時實現安全性、與使用感光性組成物形成的硬化膜的良好的發光特性的觀點考慮，量子點（D）較佳不含有Cd、Pb作為構成成分、而是包含In及/或Si等作為構成成分，更佳包含In。即，量子點（D）較佳含有包含In的化合物。 　　[0159] 從使用感光性組成物容易形成發光特性良好的硬化膜方面考慮，量子點（D）較佳包含選自由第2族元素、第12族元素、第13族元素、第14族元素、第15族元素、及第16族元素所成之群中之至少2種元素。 　　[0160] 關於適合作為量子點（D）的構成成分的元素之具體例，可舉出Be、Mg、Ca、Sr、Ba、Cu、Ag、Au、Zn、B、Al、Ga、In、Tl、C、Si、Ge、Sn、N、P、As、Sb、Bi、O、S、Se、Te、及Po。 　　量子點（D）較佳由包含選自上述較佳元素所成之群中之至少2種以上的元素的化合物形成。 　　[0161] 從作為發光顯示器用發光層的發光特性的觀點考慮，量子點（D）較佳包含選自由在500~600nm的波長區域具有螢光極大值的化合物（D1）、及在600~700nm的波長區域具有螢光極大值的化合物（D2）所成之群中之1種以上，更佳由選自由化合物（D1）及化合物（D2）所成之群中之1種以上形成。 　　[0162] 包含選自由上述的化合物（D1）及化合物（D2）所成之群中之1種以上化合物的量子點（D）在500~600nm的波長區域及600~700nm的波長區域中的至少一方的區域中具有螢光極大值。 　　結果，若使用包含所述量子點（D）之感光性組成物，則可形成適於作為使用可見區域的光進行圖像顯示的發光顯示元件的發光層之硬化膜。 　　[0163] 以上說明的量子點（D）中，含有包含In作為構成成分的化合物的量子點是較佳的。另外，含有Si化合物的量子點亦為較佳的。 　　[0164] 量子點（D）之構造可為由1種化合物形成的均質結構，亦可為由2種以上化合物形成的複合結構。在複合結構的情況下，量子點（D）中的2種以上化合物的包含方式沒有特別限制。 　　作為包含2種以上化合物的量子點（D），較佳核被1層以上的殼層被覆而成的核-殼構造的量子點，更佳核被1層殼層被覆而成的核殼構造的量子點。 　　[0165] 對於核-殼結構的量子點而言，核被由與核材料不同的材質形成的殼層被覆。例如，藉由用帶隙更大的半導體被覆核的半導體，從而可將經由光激發而生成的激子（電子-空穴對）局限在核內。 　　因此，可降低量子點的表面的無輻射躍遷的概率，發光的量子收率、與螢光特性的穩定性提高。 　　[0166] 關於量子點（D）的較佳的具體例，作為核-殼型的量子點（D），可舉出InP/ZnS、CuInS2 /ZnS、及（ZnS/AgInS2 ）固溶體/ZnS。 　　作為不具有殼層的均質結構型的量子點（D）之較佳的具體例，可舉出AgInS2 及摻雜有Zn的AgInS2 。 　　尚，上述中，核-殼型之量子點（D）的材質以（核的材質）/（殼層的材質）的形式記載。 　　對於上述的量子點（D）而言，可將2種以上組合使用，亦可將核-殼型的量子點（D）與均質結構型的量子點（D）組合使用。 　　[0167] 量子點（D）的平均粒徑只要在能作為量子點發揮功能的範圍內即可，沒有特別限制，較佳為0.5~20nm，更較佳為1.0~10nm。 　　具有上述範圍內的平均粒徑的量子點（D）不僅發揮量子局限效應、作為量子點良好地發揮功能，而且容易調製，具有穩定的螢光特性。 　　尚，量子點（D）之平均粒徑例如可藉由下述方式定義：將量子點（D）的分散液塗佈於基板上並進行乾燥，將揮發成分除去，然後用透射型電子顯微鏡（TEM）對該表面進行觀察。典型地，可以經由TEM圖像的圖像分析而得到的各粒子的等效圓直徑的數平均直徑的形式，來定義該平均粒徑。 　　[0168] 量子點（D）的形狀沒有特別限制。作為量子點（D）的形狀的例子，可舉出球狀、橢球狀、圓柱狀、多角柱狀、圓盤狀、及多面體狀等。 　　此等中，從處理的容易性、獲得的容易性的觀點考慮，較佳為球狀。 　　[0169] 量子點（D）之製造方法沒有特別限制。可將利用公知的各種方法製造的量子點作為量子點（D）使用。 　　作為量子點（D）之製造方法，例如，可採用在配位性的有機溶劑中將有機金屬化合物熱分解的方法。 　　另外，核-殼結構型的量子點（D）可利用下述方法製造：在藉由反應而形成均質的核後，在經分散的核的存在下，使殼層的前體進行反應而形成殼層的方法。 　　尚，亦可使用市售的各種量子點（D）。 　　[0170] 相對於感光性組成物之固體含量整體的質量而言，量子點（D）的含量較佳為3~80質量%，更佳為5~70質量%。經由使量子點（D）的含量為上述的範圍，從而容易得到能形成內部量子效率高、可合適地作為發光顯示元件中的發光層來使用的硬化膜之感光性組成物。 　　[0171] ＜有機溶劑（S）＞ 　　為了改善塗佈性、調節黏度，感光性組成物較佳包含有機溶劑（S）。 　　[0172] 作為有機溶劑（S），具體而言，可舉出乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單正丙基醚、乙二醇單正丁基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單正丙基醚、二乙二醇單正丁基醚、三乙二醇單甲基醚、三乙二醇單乙基醚、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單正丙基醚、丙二醇單正丁基醚、二丙二醇單甲基醚、二丙二醇單乙基醚、二丙二醇單正丙基醚、二丙二醇單正丁基醚、三丙二醇單甲基醚、三丙二醇單乙基醚等（聚）亞烷基二醇單烷基醚類；乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、二乙二醇單甲基醚乙酸酯、二乙二醇單乙基醚乙酸酯、丙二醇單甲基醚乙酸酯（PGMEA）、丙二醇單乙基醚乙酸酯等（聚）亞烷基二醇單烷基醚乙酸酯類；二乙二醇二甲基醚、二乙二醇甲基乙基醚、二乙二醇二乙基醚、四氫呋喃等其他醚類；甲基乙基酮、環己酮、2-庚酮、3-庚酮等酮類；2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷基酯類；2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、乙酸3-甲氧基丁酯、乙酸3-甲基-3-甲氧基丁酯、丙酸3-甲基-3-甲氧基丁酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、乙酸苄酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸乙酯等其他酯類；甲苯、二甲苯等芳香族烴類；N-甲基-2-吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基異丁基醯胺、N,N-二乙基乙醯胺、N,N-二乙基甲醯胺、N-甲基己內醯胺、1,3-二甲基-2-咪唑啉酮、吡啶、及N,N,N’,N’-四甲基脲等含氮極性有機溶劑；等。 　　[0173] 此等中，較佳亞烷基二醇單烷基醚類、亞烷基二醇單烷基醚乙酸酯類、上述的其他醚類、乳酸烷基酯類、上述的其他酯類，更佳亞烷基二醇單烷基醚乙酸酯類、上述的其他醚類、乙酸苄酯等上述的其他酯類。 　　另外，從各成分的溶解性等方面考慮，有機溶劑（S）還較佳包含含氮極性有機溶劑。作為含氮極性有機溶劑，可使用N,N,N’,N’-四甲基脲等。 　　此等溶劑可單獨使用或組合2種以上而使用。 　　[0174] 有機溶劑（S）的含量沒有特別限制，以可在基板等上進行塗佈的濃度、根據塗佈膜厚而適當設定。感光性組成物的黏度較佳為1~300cp，更佳為3~200cp，進一步較佳為5~100cp。另外，固體含量濃度較佳為5~100質量%，更佳為10~75質量%。 　　[0175] ＜其他成分＞ 　　根據需要，可在感光性組成物中含有界面活性劑、密著性提高劑、熱聚合抑制劑、消泡劑、矽烷偶合劑、調平劑（leveling agent）等添加劑。所有添加劑均可使用現有已知的物質。 　　從容易形成形狀良好、對基板的密著性較佳之硬化膜方面考慮，感光性組成物較佳包含矽烷偶合劑。作為矽烷偶合劑，可沒有特別限制地使用現有已知的物質。 　　作為界面活性劑，可舉出陰離子系、陽離子系、非離子系等的化合物，作為熱聚合抑制劑，可舉出氫醌、氫醌單乙基醚等，作為消泡劑，可舉出聚矽氧烷系、氟系化合物等。 　　[0176] ＜感光性組成物之調製方法＞ 　　以上說明之感光性組成物可經由將分別為規定量的上述各成分混合後、用攪拌機均勻混合而得到。尚，為了使得到的混合物更均勻，可使用過濾器進行過濾。 　　尚，量子點（D）亦可以分散於一部分有機溶劑（S）中而得到的分散液的形式用於調製感光性組成物。 　　[0177] ≪硬化膜之製造方法≫ 　　作為硬化膜之製造方法，可沒有特別限制地採用使用包含光聚合性化合物（B）的感光性組成物的、現有已知的硬化膜的製造方法。 　　[0178] 作為硬化膜之較佳的製造方法，可舉出包含下述步驟的方法： 　　塗佈上述的感光性組成物而形成塗佈膜的步驟；與 　　將塗佈膜曝光的步驟。 　　[0179] 為了使用感光性組成物形成硬化膜，首先，將感光性組成物塗佈於根據硬化膜的用途而選擇的基板上從而形成塗佈膜。塗佈膜的形成方法沒有特別限制，可使用例如輥塗機、逆式塗佈機、棒塗機等接觸轉印型塗佈裝置或旋塗機（旋轉式塗佈裝置）、簾流式塗佈機（curtain flow coater）等非接觸型塗佈裝置進行。 　　[0180] 塗佈的感光性組成物根據需要而被乾燥，構成塗佈膜。乾燥方法沒有特別限制，例如，可舉出下述方法：（1）用加熱板，於80~120°C、較佳90~100°C的溫度，進行60~120秒乾燥的方法；（2）於室溫放置數小時~數天的方法；（3）放入至熱風加熱器或紅外線加熱器中數十分鐘~數小時而除去溶劑的方法；等。 　　[0181] 接下來對塗佈膜進行曝光。曝光可經由照射紫外線、准分子雷射等活性能量射線而進行。曝光可對塗佈膜的整面進行，亦可利用例如隔著負型的掩模進行曝光的方法等而位置選擇性地進行。 　　照射的能量射線量根據感光性組成物的組成的不同而不同，例如為40~200mJ/cm2 左右。 　　尚，在對塗佈膜整面進行曝光時，可形成具有與塗佈膜的形狀對應的形狀的未經圖案化的硬化膜。 　　[0182] 在以位置選擇性方式將塗佈膜曝光時，經由利用顯影液將曝光後的膜顯影，從而將未曝光部溶解於顯影液而將其除去，形成經圖案化的硬化膜。顯影方法沒有特別限制，可使用例如浸漬法、噴霧法等。顯影液可根據感光性組成物的組成而適當選擇。作為顯影液，可使用例如氫氧化鈉、氫氧化鉀、碳酸鈉、氨、季銨鹽等（TMAH等）鹼性的水溶液。 　　[0183] 接下來，針對經圖案化的硬化膜，根據需要可進行烘烤（後烘烤）。烘烤溫度沒有特別限制，較佳為150~250°C，更佳為1800~230°C。典型地，烘烤時間為5~90分鐘，較佳為10~60分鐘。 　　藉由依據上述方式進行烘烤，可得到感光性組成物的硬化膜。 　　[0184] 如上所述地形成的包含量子點（D）之硬化膜的內部量子效率較佳，可作為發光顯示元件中的發光層而合適地使用。 　　[0185] ≪發光顯示元件及發光層≫ 　　以下，對具有上述的硬化膜作為發光層的發光顯示元件進行說明。 　　發光顯示元件可利用下述波長轉換基板構成，所述波長轉換基板將使用上述的感光性組成物形成的硬化膜用作發光層。 　　圖1為示意性地表示典型的發光顯示元件的結構的剖視圖。 　　[0186] 發光顯示元件100具有：在基板12上設置發光層13（13a、13b、13c）與黑色矩陣14而構成的波長轉換基板11；與在波長轉換基板11上介由接著劑層15而貼合的光源基板18。 　　[0187] 基板12由玻璃、石英、或透明樹脂（例如，透明聚醯亞胺、聚萘二甲酸乙二醇酯、聚對苯二甲酸乙二醇酯、聚對苯二甲酸丁二醇酯、環狀烯烴系樹脂膜等）等形成。 　　[0188] 波長轉換基板11中的發光層13為使上述的感光性組成物硬化而形成的硬化膜。發光層13較佳經由使用上述的感光性組成物利用光刻法進行圖案化而形成。 　　發光層13較佳依據上述的硬化膜的製造方法形成。 　　[0189] 波長轉換基板11經由各發光層13含有的量子點（D）的作用而對光源基板18中的激發光源17發出的激發光進行波長轉換、從而發出所期望的波長的螢光。 　　[0190] 對於波長轉換基板11的構成而言，發光層13a、發光層13b與發光層13c分別包含不同的量子點（D），可發出不同的螢光。 　　例如，波長轉換基板11可依據下述方式構成：發光層13a將激發光轉換為紅色的光，發光層13b將激發光轉換為綠色的光，發光層13c將激發光轉換為藍色的光。 　　這種情況下，為了使發光層13a、13b及13c分別具有所期望的螢光特性，在用於形成發光層13a、13b及13c的3種感光性組成物中，分別對量子點（D）的種類加以選擇。 　　[0191] 而且，經由使用分別包含不同的量子點（D）的3種感光性組成物，反覆實施上述的硬化膜的製造方法，從而依次形成發光層13a、發光層13b、及發光層13c。 　　如上所述地操作，在基板12上形成發光層13，可得到波長轉換基板11。 　　[0192] 波長轉換基板11中的發光層13的厚度較佳為100nm~100μm，更佳為1μm~100μm。 　　經由使發光層13的厚度在上述範圍內，從而使發光層13充分吸收激發光，由此可得到高的光轉換效率，因此，發光顯示元件的亮度較佳。從發光顯示元件的亮度特別良好方面考慮，發光層13的厚度較佳為1μm以上。 　　[0193] 在基板12上的各發光層13之間，配置有黑色矩陣14。黑色矩陣14可經由使用遮光性的已知材料依據已知方法進行圖案化而形成。 　　尚，黑色矩陣14不是波長轉換基板11中的必需的構成要素，亦可為不在波長轉換基板11上設置黑色矩陣14的構成。 　　[0194] 接著劑層15可利用使後述的波長的紫外光或藍色光透過的已知的接著劑形成。 　　尚，接著劑層15並非必須如圖1所示那樣以在基板12上被覆發光層13a、13b及13c的整面的方式設置，亦可僅設置在波長轉換基板11的周圍。 　　[0195] 光源基板18具有基板16、與被配置在基板16的波長轉換基板11這側的光源17。從光源17分別發出作為激發光的紫外光或藍色光。 　　作為光源17，沒有特別限制，可使用用已知的材料、已知的製造方法製作的各種發光源。較佳可使用已知構造的發射紫外光的有機EL元件及發射藍色光的有機EL元件等。 　　作為紫外光，較佳在波長為360~435nm的範圍內具有主發光峰的光。作為藍色光，較佳在波長為435~480nm的範圍內具有主發光峰的光。 　　為了使各射出光入射至相對的發光層13，光源17具有指向性為較佳的。 　　[0196] 對於發光顯示元件100而言，從光源17a、17b及17c射出的激發光的波長經由與此等光源分別相對的發光層13a、13b、及13c中包含的3種量子點（D）而被轉換。 　　如此，從光源17發出的激發光分別被轉換為所期望的波長的可見光而用於顯示。 　　[0197] 發光顯示元件100中，設置了發光層13a的部分構成進行紅色顯示的次像元（subpixel）。即，波長轉換基板11中的發光層13a將從光源基板18的相對的光源17a發出的激發光轉換為紅色。 　　另外，設置了發光層13b的部分構成進行綠色顯示的次像元。即，發光層13b將從光源基板18的相對的光源17b發出的激發光轉換為綠色。 　　此外，設置了發光層13c的部分構成進行藍色顯示的次像元。即，發光層13c將從光源基板18的相對的光源17c發出的激發光轉換為藍色。 　　[0198] 發光顯示元件100利用具有發光層13a的次像元、具有發光層13b的次像元、及具有發光層13c的次像元這3種，構成了作為構成圖像的最小單位的1個圖元。 　　[0199] 具有以上構成的發光顯示元件100可分別控制具有發光層13a的次像元、具有發光層13b的次像元、及具有發光層13c的次像元而發出紅色、綠色及藍色的光。 　　而且，控制各個包含3種次像元的1個圖元而發出紅色、綠色及藍色的光，進行全彩色的顯示。 　　[0200] 發光顯示元件中，可在發光層13與基板12之間設置濾色器（未圖示）。 　　具體而言，在發光層13a與基板12之間設置紅色的濾色器，在發光層13b與基板12之間設置綠色的濾色器，在發光層13c與基板12之間設置藍色的濾色器。 　　經由在以上說明的發光顯示元件中設置濾色器，從而可提高顯示的顏色的純度。此處，亦可將在液晶顯示元件等公知的圖像顯示元件中使用的濾色器應用於發光顯示元件100。 實施例 　　[0201] 以下，示出實施例進一步具體地說明本發明，但本發明的範圍不受此等實施例的限制。 　　[0202] [實施例及比較例] 　　實施例及比較例中，使用了以下的材料。 　　作為鹼可溶性樹脂（A），使用了甲基丙烯酸縮水甘油酯/甲基丙烯酸/苯乙烯/甲基丙烯酸（莫耳比：40/20/20/20）的共聚物。鹼可溶性樹脂的重量平均分子量為7000。 　　作為光聚合性化合物（B），使用了二季戊四醇六丙烯酸酯。 　　作為光聚合起始劑（C），在實施例中使用下述的C-1，在比較例中使用下述的C-2。 　　作為矽烷偶合劑，使用了3-環氧丙氧基丙基三甲氧基矽烷（KBM-403，信越聚矽氧烷公司製）。 　　作為調平劑，使用了BYK-310（BYK-Chemie公司製）。 [化20][0203] 關於光聚合起始劑（C），對於上述的C-1而言，依據擴展休克爾法算出的、分子內的正性部分電荷的最大值為0.019，負性部分電荷的最小值為-0.004。 　　對於上述的C-1而言，分子內的正性部分電荷的最大值為0.115，負性部分電荷的最小值為-0.825。 　　[0204] 作為量子點（D），使用了包含由InP形成的核與由ZnS形成的殼層的核-殼型結構的量子點。 　　所述量子點（D）參照Journal of American Chemical Society. 2007, 129, 15432-15433中記載的方法得到。 　　對於量子點（D）而言，以在包含丙二醇單甲基醚50質量%、二乙二醇甲基乙基醚40質量%、及環己酮10質量%的混合溶劑中分散量子點（D）而成的固體含量濃度為12質量%的分散液的形式用於感光性組成物的調製。 　　[0205] 以固體含量濃度成為25質量%的方式，將鹼可溶性樹脂（A）59質量份、光聚合性化合物（B）31.2質量份、光聚合起始劑（C）5.8質量份、矽烷偶合劑2質量份、與調平劑2質量份溶解於包含丙二醇單甲基醚50質量%、二乙二醇甲基乙基醚40質量%、及環己酮10質量%的混合溶劑中而得到溶液。 　　以1：1的體積比將得到的溶液與量子點的分散液混合，得到實施例的感光性組成物。 　　另外，將光聚合性化合物（B）的使用量變更為35質量份，並且將光聚合起始劑（C）的使用量變更為2質量，除此之外，與實施例同樣地操作，得到感光性組成物。 　　[0206] 使用得到的感光性組成物，分別依據以下的方法確認了量子效率。結果，確認了實施例的量子效率的值相對於比較例的量子效率的值而言為3.6倍的數值。 ＜量子效率評估方法＞ 　　針對實施例及比較例中得到的液態的感光性組成物，使用量子效率測定系統（QE-2000，大塚電子公司製），在室溫條件下測定量子效率。 　　[0207] 根據上文可知，包含依據擴展休克爾法算出的分子內的正性部分電荷的最大值為0.500以下、負性部分電荷的最小值為-0.500以上的化合物作為光聚合起始劑（C）的實施例的感光性組成物的量子效率較佳，與此相對，包含不滿足規定的條件的光聚合起始劑（C）的感光性組成物的量子效率差。 　　尚，使用量子效率較佳感光性組成物形成的硬化膜的量子效率亦較佳是不言自明的。[Best Mode for Carrying Out the Invention] ≪Photosensitive composition≪ The photosensitive composition contains an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), and Quantum dot (D). Here, the photopolymerization initiator (C) includes the following compounds. For the compounds, the maximum value of the positive partial charge in the molecule calculated by the extended Hockel method is 0.500 or less, and The minimum value is -0.500 or more. The photosensitive composition includes a photopolymerization initiator (C) that satisfies the conditions related to the partial charge described above, so that a cured film having a high internal quantum efficiency can be formed without impairing the characteristics inherent to the quantum dot. Hereinafter, an essential component or an optional component of the photosensitive composition and a method for preparing the photosensitive composition will be described. [0018] <Alkali-soluble resin (A)> The photosensitive composition contains an alkali-soluble resin (A). Herein, in this specification, (A) an alkali-soluble resin means a resin which contains an alkali-soluble functional group (for example, a phenolic hydroxyl group, a carboxyl group, a sulfonic acid group, etc.) in a molecule | numerator. The type of the alkali-soluble resin (A) is not particularly limited, and various alkali-soluble resins conventionally blended in a photosensitive composition can be used. Hereinafter, as a preferable specific example of the alkali-soluble resin (A), a resin (A1) having a Cardo structure, an acrylic resin (A2), and a novolac resin (A3) will be described. [Resin (A1) having Cardo Structure] The photosensitive composition may include resin (A1) having a Cardo structure (hereinafter, also referred to as “Cardo resin (A1)” ") As an alkali-soluble resin (A). [0020] As the Cardo resin (A1), a resin having a Cardo skeleton in its structure and having a desired alkali solubility can be used. The Cardo skeleton refers to a skeleton in which a second ring structure and a third ring structure are bonded to one ring carbon atom constituting the first ring structure. The second cyclic structure and the third cyclic structure may be the same structure or different structures. A representative example of the Cardo skeleton includes a skeleton in which two aromatic rings (for example, a benzene ring) are bonded to a carbon atom at the 9-position of a fluorene ring. [0021] The Cardo resin (A1) is not particularly limited, and conventionally known resins can be used. Among them, a resin represented by the following formula (a-1) is preferred. [Chemical 1] (In formula (a-1), X a A base represented by the following formula (a-2). m1 represents an integer from 0 to 20) [0022] [化 2] (In formula (a-2), R a1 Each independently represents a hydrogen atom, a hydrocarbon group having 1 to 6 carbon atoms, or a halogen atom, R a2 Each independently represents a hydrogen atom or a methyl group, R a3 Each independently represents a linear or branched alkylene group, m2 represents 0 or 1, W a Represents a group represented by the following formula (a-3)) [0023] (Ring A in formula (a-3) represents an aliphatic ring which may be condensed with an aromatic ring or may have a substituent. The aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocyclic ring). [0024] In the formula (a-2), as R a3 , Preferably an alkylene group having 1 to 20 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, particularly preferably an alkylene group having 1 to 6 carbon atoms, and most preferably ethane-1 , 2-diyl, propane-1,2-diyl, and propane 1,3-diyl. [0025] As the ring A in the formula (a-3), examples of the aliphatic ring include monocycloalkanes, bicycloalkanes, tricycloalkanes, and tetracycloalkanes. Specific examples include monocycloalkanes such as monocycloalkanes, bicycloalkanes, tricycloalkanes, and tetracycloalkanes, adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. The aromatic ring which can be condensed with the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and an aromatic hydrocarbon ring is preferred. Specifically, a benzene ring and a naphthalene ring are preferred. [0026] As a preferable example of the divalent base represented by the formula (a-3), the following bases can be mentioned. [Chemical 4] The divalent radical X in formula (a-1) a Residue Z can be provided by a The tetracarboxylic dianhydride is reacted with a glycol compound represented by the following formula (a-2a) to be introduced into (A1) Cardo resin. [Chemical 5] [0028] In the formula (a-2a), R a1 , R a2 , R a3 , And m2 are the same as those described for the formula (a-2). The ring A in the formula (a-2a) is the same as that described for the formula (a-3). [0029] The glycol compound represented by the formula (a-2a) can be produced, for example, by the following method. First, if necessary, a hydrogen atom in a phenolic hydroxyl group of the diol compound represented by the following formula (a-2b) is substituted with -R according to a conventional method. a3 The group represented by -OH is then glycidylated using epichlorohydrin or the like to obtain an epoxy compound represented by the following formula (a-2c). Next, the epoxy compound represented by formula (a-2c) is reacted with acrylic acid or methacrylic acid to obtain a glycol compound represented by formula (a-2a). In formula (a-2b) and formula (a-2c), R a1 , R a3 , And m2 are the same as those described for the formula (a-2). The ring A in the formula (a-2b) and the formula (a-2c) is the same as that described for the formula (a-3). The method for producing the glycol compound represented by the formula (a-2a) is not limited to the method described above. [Chemical 6] [0030] Preferred examples of the glycol compound represented by the formula (a-2b) include the following glycol compounds. [Chemical 7] [0031] In the formula (a-1), R a0 Hydrogen atom or -CO-Y a -COOH represents a base. Here, Y a The residue obtained by removing an acid anhydride group (-CO-O-CO-) from a dicarboxylic anhydride. Examples of the dicarboxylic anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methylmethylenetetrahydrogen. Phthalic anhydride, chlorendic anhydride, methyltetrahydrophthalic anhydride, glutaric anhydride, etc. [0032] In the above formula (a-1), Z a Residue obtained by removing two acid anhydride groups from tetracarboxylic dianhydride. Examples of the tetracarboxylic dianhydride include tetracarboxylic dianhydride, pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride represented by the following formula (a-4). , Diphenyl ether tetracarboxylic dianhydride, etc. In the formula (a-1), m represents an integer of 0 to 20. [Chem. 8] (In formula (a-4), R a4 , R a5 , And R a6 Each independently represents one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom, and m3 represents an integer of 0 to 12). [0034] R in the alternative formula (a-4) a4 The alkyl group is an alkyl group having 1 to 10 carbon atoms. By setting the number of carbon atoms in the alkyl group to the above range, the heat resistance of the obtained carboxylic acid ester can be further improved. R a4 When it is an alkyl group, from the viewpoint of easily obtaining a Cardo resin with better heat resistance, the number of carbon atoms is preferably 1 to 6, more preferably 1 to 5, even more preferably 1 to 4, and particularly preferably 1 ~ 3. R a4 When it is an alkyl group, the alkyl group may be linear or branched. R as in formula (a-4) a4 From the viewpoint of easy availability of Cardo resin with better heat resistance, each independently is preferably a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. R in formula (a-4) a4 More preferred is a hydrogen atom, methyl, ethyl, n-propyl or isopropyl, and particularly preferred is a hydrogen atom or methyl. Considering that it is easy to prepare a high-purity tetracarboxylic dianhydride, a plurality of R in the formula (a-4) a4 The same group is preferred. [0036] m3 in the formula (a-4) represents an integer of 0 to 12. By setting the value of m3 to 12 or less, purification of tetracarboxylic dianhydride can be easily performed. From the viewpoint of facilitating the purification of tetracarboxylic dianhydride, the upper limit of m3 is preferably 5 and more preferably 3. From the viewpoint of the chemical stability of tetracarboxylic dianhydride, the lower limit of m3 is preferably 1, and more preferably 2. M3 in formula (a-4) is particularly preferably 2 or 3. [0037] Alternatively, R in formula (a-4) a5 And R a6 Alkyl groups with 1 to 10 carbon atoms and optionally R a4 The alkyl group having 1 to 10 carbon atoms is the same. From the viewpoint of easy purification of tetracarboxylic dianhydride, R a5 And R a6 Preferred is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (preferably 1 to 6, more preferably 1 to 5, more preferably 1 to 4, and particularly preferably 1 to 3), particularly preferably a hydrogen atom. Or methyl. [0038] Examples of the tetracarboxylic dianhydride represented by the formula (a-4) include norbornane-2-spiro-α-cyclopentanone-α'-spiro-2 ''-norbornane-5 , 5 '', 6,6 ''-tetracarboxylic dianhydride (aliased as "norbornane-2-spiro-2'-cyclopentanone-5'-spiro-2" -norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride ''), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2 ''-(methylnorbornane) -5 , 5``, 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2 ''-norbornane-5,5 '', 6 , 6 ''-tetracarboxylic dianhydride (aliased as "norbornane-2-spiro-2'-cyclohexanone-6'-spiro-2 ''-norbornane-5,5 '', 6,6 '' -Tetracarboxylic dianhydride ''), methylnorbornane-2-spiro-α-cyclohexanone-α'-spiro-2 ''-(methylnorbornane) -5,5 '', 6 , 6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cycloacetone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic acid Dianhydride, norbornane-2-spiro-α-cyclobutanone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane -2-spiro-α-cycloheptanone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α -Cyclooctanone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic acid Anhydride, norbornane-2-spiro-α-cyclononone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane- 2-spiro-α-cyclodecanone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α- Cycloundecone-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclododecane Keto-α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclotridecanone-α ' -Spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclotetradecanone-α'-spiro-2 `` -Norbornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopentadecanone-α'-spiro-2 ''-nor Bornane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α- (methylcyclopentanone) -α'-spiro-2 ''-norbornane -5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbornane-2-spiro-α- (methylcyclohexanone) -α'-spiro-2 ''-norbornane-5 , 5 '', 6,6 ''-tetracarboxylic dianhydride, etc. [0039] The weight average molecular weight of Cardo resin (A1) is preferably 1,000 to 40,000, and more preferably 2,000 to 30,000. When the content is in the above range, sufficient heat resistance and film strength can be obtained while obtaining good developability. [Acrylic Resin (A2)] As the alkali-soluble resin (A), an acrylic resin (A2) can also be preferably used. When an acrylic resin (A2) is used, various characteristics of the photosensitive composition can be easily adjusted by appropriately adjusting the type of monomer, the ratio of constituent units, and the like. [0041] As the acrylic resin (A2), an acrylic resin containing a constituent unit derived from (meth) acrylic acid and / or a constituent unit derived from other monomers such as (meth) acrylate can be used. (Meth) acrylic acid is acrylic acid or methacrylic acid. The (meth) acrylate is a substance represented by the following formula (a-5), and is not particularly limited as long as it does not hinder the object of the present invention. [Chemical 9] [0042] In the above formula (a-5), R a7 Is a hydrogen atom or a methyl group, R a8 It is a monovalent organic group. The organic group may include a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be any of linear, branched, and cyclic. [0043] As R a8 The substituents other than the hydrocarbon group in the organic group are not particularly limited as long as the effects of the present invention are not impaired. Examples thereof include a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, Cyanate, isocyanate, thiocyanate, isothiocyanate, silyl, silanol, alkoxy, alkoxycarbonyl, carbamoyl, thiocarbamyl, Nitro, nitroso, carboxyl, carboxylate group, fluorenyl, fluorenyloxy, sulfinyl, sulfo, sulfonato group, phosphino group), phosphinyl group, phosphino group, phosphonato group, hydroxyimino group, alkyl ether group, alkyl sulfide group, aryl ether group, aryl sulfide Group, amine group (-NH 2 , -NHR, -NRR ': R and R' each independently represent a hydrocarbon group) and the like. The hydrogen atom contained in the substituent may be substituted with a hydrocarbon group. The hydrocarbon group included in the substituent may be any of a linear, branched, and cyclic group. [0044] As R a8 Preferably, it is an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group, and these groups may be substituted with a halogen atom, a hydroxyl group, an alkyl group, or a heterocyclic group. In addition, when these groups include an alkylene moiety, the alkylene moiety may be interrupted by an ether bond, a thioether bond, or an ester bond. [0045] When the alkyl group is linear or branched, the number of carbon atoms is preferably 1 to 20, more preferably 1 to 15, and particularly preferably 1 to 10. Examples of preferred alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, Sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-nonyl, isononyl, n-decyl, isodecyl and the like. [0046] When the alkyl group is an alicyclic group or a group containing an alicyclic group, examples of preferred alicyclic groups included in the alkyl group include monocyclic alicyclic groups such as cyclopentyl and cyclohexyl. Polycyclic cycloaliphatic radicals, such as ammonyl, adamantyl, norbornyl, isobornyl, tricyclononyl, tricyclodecyl and tetracyclododecyl. The compound represented by formula (a-5) is also preferably R a8 An epoxy-containing unsaturated compound having an epoxy group. Preferred examples of the epoxy group-containing unsaturated compound represented by the formula (a-5) include glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, and (formyl) Alkyl) (3,4-epoxybutyl acrylate, 6,7-epoxyheptyl (meth) acrylate, etc. (meth) acrylic alkylene oxides; α-ethyl glycidyl ester, α-n Α-alkyl acrylate alkylene oxides such as glycidyl acrylate, α-n-butyl acrylate, 6-ethylheptyl acrylate, and the like; and the like. Among these, from the viewpoints of copolymerization reactivity and strength of the cured resin, glycidyl (meth) acrylate, 2-methyl glycidyl (meth) acrylate, and (meth) acrylic acid 6 are preferred. , 7-epoxyheptyl ester. These unsaturated compounds containing an epoxy group can be used individually or in combination of 2 or more types. [0048] The acrylic resin (A2) may be a resin in which monomers other than (meth) acrylate are polymerized. Examples of such monomers include (meth) acrylamide, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, and styrenes. These monomers can be used alone or in combination of two or more. [0049] Examples of the (meth) acrylamide include (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-dialkyl (meth) acrylamide, N, N-aryl (meth) acrylamide, N-methyl-N-phenyl (meth) acrylamide, N-hydroxyethyl- N-methyl (meth) acrylamide and the like. [0050] Examples of unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; anhydrides of these dicarboxylic acids ;Wait. [0051] Examples of the allyl compound include allyl acetate, allyl hexanoate, allyl octoate, allyl laurate, allyl palmitate, allyl stearate, and allyl benzoate. Allyl esters such as propyl ester, allyl acetate, allyl lactate; allyloxyethanol; etc. [0052] Examples of vinyl ethers include hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, and ethoxyethyl Vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol Vinyl ether, dimethylamino ethyl vinyl ether, diethylamino ethyl vinyl ether, butylamino ethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether, etc. Alkyl vinyl ether; vinyl phenyl ether, vinyl tolyl ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl ether, vinyl naphthyl ether, vinyl anthryl ether, etc. Vinyl aryl ether; etc. [0053] Examples of vinyl esters include vinyl butyrate, vinyl isobutyrate, trimethyl vinyl acetate, diethyl vinyl acetate, vinyl valerate, vinyl hexanoate, and vinyl chloroacetate. Ester, vinyl dichloroacetate, vinyl methoxyacetate, vinyl butoxyacetate, phenyl vinyl acetate, vinyl acetate, vinyl lactate, beta-phenyl butyrate, vinyl benzoate Esters, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, vinyl naphthalate and the like. [0054] Examples of styrenes include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butyl Styrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxymethylstyrene, ethoxymethylbenzene Alkylstyrenes such as ethylene; alkoxystyrenes such as methoxystyrene, 4-methoxy-3-methylstyrene, and dimethoxystyrene; chlorostyrene, dichlorostyrene, trichloro Styrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, 4- Halostyrene such as fluoro-3-trifluoromethylstyrene; etc. [0055] As for the amount of the constituent units derived from (meth) acrylic acid and the amount of constituent units derived from other monomers in the (A3) acrylic resin, as long as it is within a range that does not prevent the object of the present invention, There are no particular restrictions. (A3) The amount of the constituent units derived from (meth) acrylic acid in the acrylic resin is preferably 5 to 50% by mass, and more preferably 10 to 30% by mass based on the mass of the acrylic resin. [0056] The weight average molecular weight of the acrylic resin (A2) is preferably 2,000 to 50,000, and more preferably 5,000 to 30,000. When it is in the said range, there exists a tendency for the balance of the film-forming ability of a photosensitive composition, and the developability after exposure to become easy. [Novolac resin (A3)] The alkali-soluble resin (A) may include a Novolac resin (A3). When the alkali-soluble resin (A) contains a novolac resin (A3), it is easy to form a cured film with good heat resistance that is not easily deformed by heating. [0058] As the novolac resin (A3), various novolac resins conventionally blended with a photosensitive composition can be used. As the novolac resin (A3), a novolac (Novolac) obtained by subjecting an aromatic compound having a phenolic hydroxyl group (hereinafter simply referred to as "phenols") to addition condensation with an aldehyde under an acid catalyst is preferred. ) Resin. [0059] (Phenols) Examples of the phenols used in producing the (A1) novolac resin include phenol; cresols such as o-cresol, m-cresol, and p-cresol; 2,3 -Xylenols such as xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol; Ethylphenols such as o-ethylphenol, m-ethylphenol, p-ethylphenol; 2-isopropylphenol, 3-isopropylphenol, 4-isopropylphenol, o-butylphenol, m-butylphenol , P-butylphenol, and p-tert-butylphenol and other alkyl phenols; 2,3,5-trimethylphenol, and 3,4,5-trimethylphenol and other trialkylphenols; m-phenylene Polyphenols such as phenol, catechol, hydroquinone, hydroquinone monomethyl ether, pyrogallol, and resorcinol; alkylresorcinol, alkylcatechol, And alkyl polyphenols such as alkyl hydroquinone (all alkyl groups have a carbon number of 1 to 4); α-naphthol; β-naphthol; hydroxydiphenyl; and bisphenol A Wait. These phenols may be used alone or in combination of two or more. [0060] Among these phenols, m-cresol and p-cresol are preferred, and m-cresol and p-cresol are more preferably used in combination. In this case, various characteristics such as the heat resistance of the cured film formed using the photosensitive composition can be adjusted by adjusting the blending ratio of the two. The blending ratio of m-cresol and p-cresol is not particularly limited, and it is preferably 3/7 or more and 8/2 or less in terms of the molar ratio of m-cresol / p-cresol. By using m-cresol and p-cresol at a ratio in the above range, a photosensitive composition capable of forming a cured film with better heat resistance is easily obtained. [0061] In addition, a novolac resin produced by using m-cresol and 2,3,5-trimethylphenol in combination is also preferable. When using such a novolac resin, it is particularly easy to obtain a photosensitive composition that can form a cured film that is less likely to flow excessively by heating during post-baking. The blending ratio of m-cresol and 2,3,5-trimethylphenol is not particularly limited. Based on the molar ratio of m-cresol / 2,3,5-trimethylphenol, it is preferably 70/30 or more. Below 95/5. (Aldehydes) Examples of the aldehydes used in the production of Novolac resin (A3) include formaldehyde, paraformaldehyde, furfural, benzaldehyde, nitrobenzaldehyde, and acetaldehyde. Wait. These aldehydes may be used alone or in combination of two or more. (Acid catalyst) Examples of the acid catalyst used in the production of Novolac resin (A3) include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and phosphorous acid; formic acid, oxalic acid, acetic acid, and dicarboxylic acid. Organic acids such as ethyl sulfuric acid and p-toluenesulfonic acid; and metal salts such as zinc acetate. These acid catalysts may be used alone or in combination of two or more kinds. (Molecular Weight) The polystyrene-equivalent weight average molecular weight (Mw; hereinafter, also simply referred to as “weight average molecular weight”) of the novolac resin (A3) is formed by using a photosensitive composition From the viewpoint of the resistance of the cured film to flow due to heating, the lower limit value is preferably 2000, more preferably 5000, particularly preferably 10,000, even more preferably 15,000, most preferably 20,000, and an upper limit. The value is preferably 50,000, more preferably 45,000, still more preferably 40,000, and most preferably 35,000. [0065] As the novolac resin (A3), at least two novolac resins having different weight average molecular weights based on polystyrene conversion can be used in combination. By using Novolac resins having different weight average molecular weights in combination, it is possible to obtain a balance between the developability of the photosensitive composition and the heat resistance of the cured film formed using the photosensitive composition. [0066] The content of the alkali-soluble resin (A) is preferably 10 to 70% by mass, and more preferably 15 to 55% by mass, relative to the mass of the solid content of the photosensitive composition as a whole. By setting it as the said range, it becomes easy to obtain the photosensitive composition with favorable developability. [0067] <(B) Photopolymerizable Compound> The photosensitive composition contains (B) a photopolymerizable compound. The (B) photopolymerizable compound is preferably a monomer having an ethylenically unsaturated group. The monomer includes a monofunctional monomer and a polyfunctional monomer. [0068] Examples of the monofunctional monomer include (meth) acrylamide, hydroxymethyl (meth) acrylamide, methoxymethyl (meth) acrylamide, and ethoxymethyl ( Methacrylamide, propoxymethyl (meth) acrylamide, butoxymethoxymethyl (meth) acrylamide, N-methylol (meth) acrylamide, N -Hydroxymethyl (meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2 -Acrylamido-2-methylpropanesulfonic acid, tert-butylacrylamidosulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, (meth) ) 2-ethylhexyl acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate , 2-phenoxy-2-hydroxypropyl (meth) acrylate, 2- (meth) propenyloxy-2-hydroxypropyl phthalate, glycerol mono (meth) acrylate, ( (Meth) acrylic Tetrahydrofurfurate, dimethylaminoethyl (meth) acrylate, glycidyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, (meth) acrylic acid 2,2,3,3-tetrafluoropropyl ester, (meth) acrylic acid half ester of phthalic acid derivatives, etc. These monofunctional monomers can be used alone or in combination of two or more. [0069] On the other hand, examples of the polyfunctional monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, and tetraethylene glycol di (meth) acrylate. Propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, butanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexanediol Di (meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerol di (meth) acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate Ester, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2 , 2-bis (4- (meth) acryloxydiethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxyethoxypolyethoxyphenyl) propane, ( 2-hydroxy-3- (meth) acrylic acid (meth) acrylic acid Propyloxypropyl ester, ethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, phthalic acid diglycidyl bis (methyl) Base) acrylate, glycerol triacrylate, glycerol polyglycidyl ether poly (meth) acrylate, urethane (meth) acrylate (ie, toluene diisocyanate, triglyceride Reactants of methylhexamethylene diisocyanate or hexamethylene diisocyanate with 2-hydroxyethyl (meth) acrylate), methylenebis (meth) acrylamide, (meth) propylene Polyfunctional monomers such as fluorenamine methylene ether, polycondensates of polyhydric alcohols and N-hydroxymethyl (meth) acrylamide, 1,3,5-tripropenylhexahydro-1,3,5- Triazine (triacrylformal) and so on. These polyfunctional monomers can be used alone or in combination of two or more. [0070] Among these monomers having an ethylenically unsaturated group, trifunctional is preferred in terms of the tendency to increase the adhesion of the photosensitive composition to the substrate and the strength after curing of the photosensitive composition. The above-mentioned polyfunctional monomer is more preferably a polyfunctional monomer having 4 or more functions, and still more preferably a polyfunctional monomer having 5 or more functions. [0071] The content of the (B) photopolymerizable compound in the photosensitive composition is preferably 1 to 50% by mass, more preferably 5 to 40, relative to the mass of the solid content of the photosensitive composition as a whole. quality%. By being in the above-mentioned range, there is a tendency that the balance between sensitivity, developability, and resolution is easily obtained. [0072] <Photopolymerization Initiator (C)> The photosensitive composition contains a photopolymerization initiator (C). The photopolymerization initiator (C) contains the following compounds. For the compounds, the maximum value of the positive partial charge in the molecule calculated by the extended Hockel method is 0.500 or less, and the minimum value of the negative partial charge is -0.500 or more. When the photopolymerization initiator (C) contains a compound that satisfies the above-mentioned conditions regarding partial charge in the molecule, it is easy to form a hardened film with high internal quantum efficiency without impairing the characteristics of the quantum dot (D) described later. [0073] The partial charge in the molecule can be calculated using software capable of calculating the bias of the charge in the molecule based on the extended Hockel method. Specifically, by using ChemBio3D Ultra version 12.0 (manufactured by CambridgeSoft), it is possible to calculate the bias of the charge in the molecule. More specifically, the chemical structure of the object substance is drawn using this ChemBio3D Ultra version 12.0, and the calculation carried in it In the program, execute "Extend-Huckel" to calculate the deflection of the charges that make up the atom. In this specification, a value obtained using the software described above is defined as a value of a charge (partial charge). Note that the so-called bias of electric charges is based on the following description. For example, when the ground state of a specific atom in a compound is 0, the charge (partial charge) of the atom is +0.5 means that the charge of this atom is reduced by +0.5 electrons, and the charge of the atom is biased to the positive side . [0074] When a cured film is formed using a photosensitive composition containing a photopolymerization initiator and a quantum dot, the internal quantum efficiency in the cured film may be lower than the internal quantum efficiency originally expected. Although the reason for this is uncertain, it is presumed that the bias of the charge in the molecule of the photopolymerization initiator is largely one of the reasons. Among the compounds known as photopolymerization initiators, there are many compounds having a large bias in the charge in the molecule. As described above, a compound having a large bias in the charge in the molecule is considered to cause interaction with the material of the quantum dot. From this, it is considered that when a cured film is formed using a photosensitive composition containing a photopolymerization initiator and a quantum dot, the result is that it is difficult to form a cured film exhibiting a desired internal quantum efficiency. [0075] On the other hand, when the photopolymerization initiator (C) contains a compound in which the maximum value of the positive partial charge in the molecule is a specific value or less and the minimum value of the negative partial charge is a specific value or more, it is believed that There is an influence between the polymerization initiator (C) and the quantum dot (D). As a result, it is presumed that when the photosensitive composition according to the invention of the present application is used, it is easy to form a cured film having a good internal quantum efficiency that can be suitably applied to a light-emitting layer for a light-emitting display element. [0076] As long as the object of the present invention is not hindered, the photopolymerization initiator (C) may include a compound whose partial charge in the molecule does not satisfy the above-mentioned predetermined conditions. The content of the compound in the photopolymerization initiator (C) whose partial charge in the molecule satisfies the above-mentioned conditions is typically preferably 70% by mass or more, more preferably 80% by mass or more, and particularly preferably It is 90% by mass or more, and most preferably 100% by mass. [0077] Specific examples of the photopolymerization initiator whose partial charge in the molecule satisfies the above-mentioned predetermined conditions include 2- (benzylideneoxyimino) -1- [4- (phenylthio) Phenyl] -1-octanone (for example, commercially available as OXE-01 (manufactured by BASF)) and an oxime ester compound represented by the following formula (CX). [Chemical 10] [0078] The partial charges in the molecule of the above compound group are shown below. [Table 1] [0079] For reference, specific examples of commercially available known photopolymerization initiators in which the maximum value of the positive partial charge and the minimum value of the negative partial charge in the molecule do not satisfy the aforementioned predetermined conditions may be given. : Diphenyl (2,4,6-trimethoxybenzyl) phosphine oxide (for example, sold on the market as Lucirin TPO (manufactured by BASF)), 2-benzyl-2-dimethylamine -1- (4-morpholinophenyl) -1-butanone (for example, sold on the market as Irgacure 369 (manufactured by BASF).), 4-methoxystyryl bis ( Trichloromethyl) Mesazine (for example, sold on the market as Triazine PMS (manufactured by Siber Hegner, Japan).), O-Ethyl-1- [6- (2-methylbenzyl) ) -9-ethyl-9H-oxazol-3-yl] ethanone oxime (for example, commercially available as OXE-02 (manufactured by BASF)), and an oxime ester compound represented by the following formula (CY) (For example, it is marketed as NCI-831 (made by ADEKA)). From the above, it can be seen that although it is a known compound as a photopolymerization initiator, the maximum value of the positive partial charge and the minimum value of the negative partial charge in the molecule do not necessarily satisfy the above-mentioned predetermined conditions. [Chemical 11] [0080] The partial charge in the molecule of a commercially available compound group whose partial charge is not within a specific numerical range is as follows. [Table 2] [0081] In view of the sensitivity of the photosensitive composition, the photopolymerization initiator (C) is preferably an oxime ester compound. In the oxime ester compound, from the viewpoint of the tendency that the maximum value of the positive partial charge in the molecule is small and the minimum value of the negative partial charge is large, it is preferable to have> C = NO-CO-R c0 A oxime ester-based compound. Yet, R in the above formula c0 It is an aliphatic hydrocarbon group having 1 to 6 carbon atoms. R c0 The alkyl group may be a linear alkyl group, a branched alkyl group, or a cycloalkyl group, and may be a group containing an aliphatic hydrocarbon ring such as a cyclopropylmethyl group and a chain hydrocarbon group in combination. As R c0 The aliphatic hydrocarbon group is preferably an alkyl group having 1 to 6 carbon atoms, more preferably a methyl group and an ethyl group, and particularly preferably a methyl group. [0082] The photopolymerization initiator (C) in which the partial charge in the molecule satisfies the above-mentioned predetermined conditions has been specifically described. However, it is also preferable to use the calculation of the partial charge in the molecule and determine whether the partial charge in the molecule satisfies the above-mentioned predetermined conditions. A compound selected from the oxime ester compound represented by the formula (c1) described later and the oxime ester compound represented by the formula (c4) described later serves as a photopolymerization initiator (C). For compounds included in the group consisting of the oxime ester compound represented by the formula (c1) and the oxime ester compound represented by the formula (c4) described later, there is the largest positive partial charge in the molecule calculated by the extended Hockel method. The value tends to be small and the minimum value of the negative partial charge is large. In addition, the oxime ester compound represented by formula (c1) and the oxime ester compound represented by formula (c4) described later are also preferable from the viewpoint of easily obtaining a photosensitive composition having good sensitivity. [0083] Hereinafter, the oxime ester compound represented by the formula (c1) will be described. [Chemical 12] (R c1 Is a group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, n1 is an integer of 0 to 4, n2 is 0 or 1, and R c2 Is a phenyl group which may have a substituent or an oxazolyl group which may have a substituent, R c3 It is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. From the viewpoint of the tendency that the maximum value of the positive partial charge in the molecule is small and the minimum value of the negative partial charge is large, R c2 A phenyl group which may have a substituent is preferable. [0084] In formula (c1), R c1 There is no restriction | limiting in particular in the range which does not prevent the objective of this invention, It can select suitably from various organic groups. As R c1 Examples of organic groups include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, saturated aliphatic fluorenyloxy, alkoxycarbonyl, and Substituted phenyl group, phenoxy group which may have a substituent, benzamyl group which may have a substituent, phenoxycarbonyl group which may have a substituent, benzamyloxy group which may have a substituent, may have a substituent Phenylalkyl group, naphthyl group which may have substituent, naphthyloxy group which may have substituent, naphthylmethyl group which may have substituent, naphthyloxycarbonyl group which may have substituent, naphthalene which may have substituent Formamyloxy, naphthylalkyl which may have a substituent, heterocyclic group which may have a substituent, amine group, amine group substituted with one or two organic groups, morpholin-1-yl, and fluorene Azine-1-yl, halogen, nitro, and cyano. When n1 is an integer from 2 to 4, R c1 It can be the same or different. The number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent which the substituent further has. R c1 In the case of an alkyl group, the number of carbon atoms is preferably 1 to 20, and the number of carbon atoms is more preferably 1 to 6. In addition, R c1 When it is an alkyl group, it may be linear or branched. As R c1 Specific examples when it is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, and sec Amyl, tert-amyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-nonyl, isononyl, n-decyl, and isodecyl, etc. In addition, R c1 In the case of an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl, and methoxypropyl. R c1 When it is an alkoxy group, the number of carbon atoms is preferably 1 to 20, and the number of carbon atoms is more preferably 1 to 6. In addition, R c1 When it is an alkoxy group, it may be linear or branched. As R c1 Specific examples when it is an alkoxy group include methoxy, ethoxy, n-propyloxy, isopropyloxy, n-butyloxy, isobutyloxy, sec-butyloxy, Tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, isooctyl Oxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isononyloxy, n-decyloxy, and isodecyloxy. In addition, R c1 When it is an alkoxy group, the alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, methoxyethoxyethoxy, and ethoxyethoxyethoxy Groups, propyloxyethoxyethoxy, and methoxypropyloxy. R c1 When it is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms is preferably 3 to 10, and the number of carbon atoms is more preferably 3 to 6. As R c1 Specific examples when it is a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. As R c1 Specific examples when it is a cycloalkoxy group include cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, and cyclooctyloxy. R c1 When it is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, the number of carbon atoms is preferably 2 to 20, and the number of carbon atoms is more preferably 2 to 7. As R c1 Specific examples in the case of a saturated aliphatic fluorenyl group include ethenyl, propionyl, n-butylfluorenyl, 2-methylpropanyl, n-pentamyl, 2,2-dimethylpropanyl, and n-hexane Fluorenyl, n-heptanyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecanyl, n Pentadecylfluorenyl, and n-hexadecylfluorenyl. As R c1 Specific examples when it is a saturated aliphatic fluorenyloxy group include ethenyloxy, propionyloxy, n-butylfluorenyloxy, 2-methylpropylfluorenyloxy, n-pentamyloxy, 2,2-dimethylpropanyloxy, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy, n-decylfluorenyloxy, n-undecanefluorenyl Oxy, n-dodecylfluorenyloxy, n-tridecylfluorenyloxy, n-tetradecanylfluorenyloxy, n-pentadecanylfluorenyloxy, n-hexadecylfluorenyloxy, etc. . R c1 When it is an alkoxycarbonyl group, the number of carbon atoms is preferably 2 to 20, and the number of carbon atoms is more preferably 2 to 7. As R c1 Specific examples when it is an alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, n-propyloxycarbonyl, isopropyloxycarbonyl, n-butyloxycarbonyl, and isobutyloxycarbonyl , Sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert-pentyloxycarbonyl, n-hexyloxycarbonyl, n- Heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxycarbonyl, n-nonyloxycarbonyl, isononyloxycarbonyl, n-decyl Carbonyloxy, isodecyloxycarbonyl, and the like. R c1 When it is a phenylalkyl group, the number of carbon atoms is preferably 7 to 20, and the number of carbon atoms is more preferably 7 to 10. In addition, R c1 In the case of a naphthylalkyl group, the number of carbon atoms is preferably 11 to 20, and the number of carbon atoms is more preferably 11 to 14. As R c1 Specific examples in the case of phenylalkyl include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. As R c1 Specific examples when it is a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β-naphthyl) ethyl. R c1 When phenylalkyl or naphthylalkyl, R c1 It may further have a substituent on a phenyl group or a naphthyl group. R c1 When it is a heterocyclic group, the heterocyclic group is a five- or six-membered monocyclic ring containing one or more N, S, and O, or the monocyclic ring is condensed with each other, or the monocyclic ring and a benzene ring are condensed. Heterocyclyl. When the heterocyclic group is a condensed ring, the number of rings is 3 or less. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, and pyrimidine , Pyridazine, benzofuran, benzothiophene, indole, isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, oxazole, purine, quinoline , Isoquinoline, quinazoline, phthalazine, perylene, and quinoxaline. R c1 When it is a heterocyclic group, the heterocyclic group may further have a substituent. R c1 When the amine group is substituted with one or two organic groups, preferable examples of the organic group include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, A saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, a phenyl group which may have a substituent, a benzamidine group which may have a substituent, a phenylalkyl group which may have 7 to 20 carbon atoms in a substituent, A naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, a heterocyclic group, and the like. Specific examples of these preferred organic groups and R c1 same. Specific examples of the amino group substituted with one or two organic groups include methylamino, ethylamino, diethylamino, n-propylamino, di-n-propylamino, iso Propylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n-nonylamino, n-decyl Amino, phenylamino, naphthylamino, ethynylamino, propionylamino, n-butylfluorenylamino, n-pentamylamino, n-hexylfluorenylamino, n-heptanylamino, N-octylamidinylamino, n-decamidinylamino, benzamidineamino, α-naphthylmethylamino, β-naphthylmethylamino, and the like. [0093] As R c1 The phenyl, naphthyl, and heterocyclic group contained in the substituent further have a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a carbon atom. A saturated aliphatic fluorenyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic fluorenyloxy group having 2 to 7 carbon atoms, and 1 to 6 carbon atoms. Alkyl monoalkylamino groups, dialkylamino groups having alkyl groups having 1 to 6 carbon atoms, morpholin-1-yl, pyrazin-1-yl, halogen, nitro, cyano, etc. . R c1 When the phenyl group, naphthyl group, and heterocyclic group contained further have a substituent, the number of the substituent is not limited as long as it does not hinder the object of the present invention, and is preferably 1 to 4. R c1 When a phenyl group, a naphthyl group, and a heterocyclic group included in the group have a plurality of substituents, the plurality of substituents may be the same or different. R c1 In terms of chemical stability, small steric hindrance, and easy synthesis of oxime ester compounds, it is preferably selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and carbon. The group in the group formed by a saturated aliphatic fluorene group having 2 to 7 atoms is more preferably an alkyl group having 1 to 6 carbon atoms, and particularly preferably a methyl group. With respect to R c1 When the bonded phenyl group has the position of the chemical bond between the phenyl group and the main skeleton of the oxime ester compound as the 1-position and the position of the methyl group as the 2-position, R c1 The position of the bond on the phenyl group is preferably the 4- or 5-position, and more preferably the 5-position. In addition, n1 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1. R c2 It is a phenyl group which may have a substituent, or an oxazolyl group which may have a substituent. In addition, R c2 When it is an oxazolyl group which may have a substituent, the nitrogen atom on the oxazolyl group may be substituted with an alkyl group having 1 to 6 carbon atoms. R c2 Here, the substituent which a phenyl group or an oxazolyl group has is not specifically limited in the range which does not prevent the objective of this invention. Examples of preferred substituents which a phenyl or oxazolyl group may have on a carbon atom include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and a carbon atom. A cycloalkyl group having 3 to 10 carbon atoms, a cycloalkoxy group having 3 to 10 carbon atoms, a saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, A saturated aliphatic fluorenyloxy group having 2 to 20 carbon atoms, a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, and a benzyl group which may have a substituent Fluorenyl, phenoxycarbonyl which may have a substituent, benzamyloxy which may have a substituent, phenylalkyl having 7 to 20 carbon atoms which may have a substituent, and naphthyl which may have a substituent , Naphthyloxy group which may have a substituent, naphthylmethyl group which may have a substituent, naphthyloxycarbonyl group which may have a substituent, naphthylmethyloxy group which may have a substituent, and number of carbon atoms which may have a substituent A naphthylalkyl group of 11 to 20, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, an amine group, an amine group substituted with one or two organic groups, -1-yl and piperazine-1-yl, halogen, nitro, cyano and the like. R c2 In the case of an oxazolyl group, examples of preferable substituents which the oxazolyl group may have on the nitrogen atom include an alkyl group having 1 to 20 carbon atoms and a cycloalkyl group having 3 to 10 carbon atoms. Saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, alkoxycarbonyl group having 2 to 20 carbon atoms, phenyl group which may have a substituent, benzamidine group which may have a substituent, may have a substituent A phenoxycarbonyl group, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthyloxy group which may have a substituent A carbonyl group, a naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, and the like. Among these substituents, an alkyl group having 1 to 20 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an ethyl group is particularly preferred. Specific examples of the substituent which the phenyl or oxazolyl group may have include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, alkoxycarbonyl, and saturated An aliphatic fluorenyloxy group, a phenylalkyl group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, and an amine group substituted with one or two organic groups, With R c1 same. R c2 Examples of the substituent when the phenyl, naphthyl, and heterocyclic group included in the substituent included in the phenyl or oxazolyl group further have a substituent include alkane having 1 to 6 carbon atoms Alkoxy groups with 1 to 6 carbon atoms; saturated aliphatic fluorenyl groups with 2 to 7 carbon atoms; alkoxycarbonyl groups with 2 to 7 carbon atoms; saturated with 2 to 7 carbon atoms Aliphatic fluorenyloxy; phenyl; naphthyl; benzamyl; naphthylmethyl; selected from alkyl groups having 1 to 6 carbon atoms, morpholin-1-yl, and fluorazin-1-yl And phenyl groups in the group formed by benzyl groups; monoalkylamine groups having alkyl groups having 1 to 6 carbon atoms; dioxane groups having alkyl groups having 1 to 6 carbon atoms Ylamino; morpholin-1-yl; pyrazin-1-yl; halogen; nitro; cyano. When a phenyl group, a naphthyl group, and a heterocyclic group included in a substituent of a phenyl or oxazolyl group further have a substituent, the number of such substituents is not limited as long as it does not prevent the object of the present invention, and it is preferred It is 1 ~ 4. When a phenyl group, a naphthyl group, and a heterocyclic group have multiple substituents, the multiple substituents may be the same or different. R c2 Among them, from the viewpoint of easily obtaining a photopolymerization initiator with better sensitivity, a base represented by the following formula (c2) or (c3) is preferred, and a base represented by the following formula (c2) is more preferred, and particularly The group represented by the following formula (c2) in which A is S is preferred. [Chem. 13] (R c4 A group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, where A is S or O, and n3 is an integer of 0 to 4) [Chem. 14] (R c5 And R c6 Each is a monovalent organic group) [0102] R in formula (c2) c4 When it is an organic group, it can select from various organic groups within the range which does not prevent the objective of this invention. As R in formula (c2) c4 When the organic group is a preferable example, an alkyl group having 1 to 6 carbon atoms; an alkoxy group having 1 to 6 carbon atoms; a saturated aliphatic fluorenyl group having 2 to 7 carbon atoms; Alkoxycarbonyl groups having 2 to 7 carbon atoms; saturated aliphatic fluorenyloxy groups having 2 to 7 carbon atoms; phenyl; naphthyl; benzamyl; naphthylmethyl; selected from carbon atoms 1 to 6 alkyl, morpholin-1-yl, fluorazin-1-yl, and phenyl groups substituted with a benzamidine group in a group of phenyl groups; alkanes having 1 to 6 carbon atoms A monoalkylamino group of a radical; a dialkylamino group of an alkyl group having 1 to 6 carbon atoms; a morpholin-1-yl group; a pyrazin-1-yl group; a halogen group; a nitro group; a cyano group. R c4 Among them, a benzamidine group is preferred; a naphthylmethyl group is selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a hydrazine-1-yl group, and a phenyl group; A benzamidine group substituted in a nitro group; a nitro group, more preferably a benzamidine group; a naphthylmethyl amidino group; a 2-methylphenylcarbonyl group; a 4- (fluorazin-1-yl) phenylcarbonyl group; 4- (Phenyl) phenylcarbonyl. [0104] In formula (c2), n3 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1. When n3 is 1, R c4 The bonding position of is preferably relative to R c4 The chemical bond of the bonded phenyl group with an oxygen atom or a sulfur atom is a para position. R in formula (c3) c5 It can be selected from various organic groups within a range that does not hinder the object of the present invention. As R c5 Preferable examples include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, and a carbon number of Alkoxycarbonyl group of 2 to 20, phenyl group which may have a substituent, benzamidine group which may have a substituent, phenoxycarbonyl group which may have a substituent, and 7 to 20 carbon atoms which may have a substituent Phenylalkyl, naphthyl, which may have a substituent, naphthylmethyl, which may have a substituent, naphthyloxycarbonyl, which may have a substituent, and naphthylalkyl having 11 to 20 carbon atoms, which may have a substituent , A heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, and the like. R c5 Among them, an alkyl group having 1 to 20 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an ethyl group is particularly preferred. R in formula (c3) c6 There is no restriction | limiting in particular in the range which does not prevent the objective of this invention, It can select from various organic groups. As suitable as R c6 Specific examples of the group include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R c6 Among these groups, a phenyl group which may have a substituent is more preferable, and a 2-methylphenyl group is particularly preferable. R c4 , R c5 , Or R c6 The phenyl, naphthyl, and heterocyclic group contained in the substituent further have a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a carbon atom. A saturated aliphatic fluorenyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic fluorenyloxy group having 2 to 7 carbon atoms, and 1 to 6 carbon atoms. Alkyl monoalkylamino groups, dialkylamino groups having alkyl groups having 1 to 6 carbon atoms, morpholin-1-yl, pyrazin-1-yl, halogen, nitro, and cyano groups . R c4 , R c5 , Or R c6 When the phenyl group, naphthyl group, and heterocyclic group contained further have a substituent, the number of the substituent is not limited as long as it does not hinder the object of the present invention, and is preferably 1 to 4. R c4 , R c5 , Or R c6 When a phenyl group, a naphthyl group, and a heterocyclic group included in the group have a plurality of substituents, the plurality of substituents may be the same or different. R in formula (c1) c3 It is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. As R c3 Is preferably methyl or ethyl, and more preferably methyl. In the group of oxime ester compounds represented by formula (c1), for example, compounds represented by the following formula (CZ1) are preferred. For the compound represented by the formula (CZ1), the maximum value of the positive partial charge in the molecule is 0.019, and the minimum value of the negative partial charge is -0.004. [Chemical 15] [0109] Next, an oxime ester compound represented by the following formula (c4) will be described. [Chemical 16] (R c7 A hydrogen atom, a nitro group or a monovalent organic group, R c8 And R c9 Each is a linear alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, R c8 With R c9 Can be bonded to each other to form a ring, R c10 Is a monovalent organic group, R c11 Is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent, n4 is an integer of 0 to 4, and n5 is 0 or 1). [0110] Here, as the oxime compound for producing the oxime ester compound of the formula (c4), a compound represented by the following formula (c5) is preferred. [Chem. 17] (R c7 , R c8 , R c9 , R c10 , N4, and n5 are the same as in formula (c4). [0112] In the formulae (c4) and (c5), R c7 It is a hydrogen atom, a nitro group, or a monovalent organic group. R c7 The 与 ring in formula (c4) is bonded to-(CO) n5 The six-membered aromatic ring to which the group represented by-is different from the six-membered aromatic ring. In formula (c4), R c7 The position of the bond on the ring is not particularly limited. The compound represented by formula (c4) has one or more R c7 In this case, from the viewpoint of easily synthesizing a compound represented by the formula (c4), one or more R's are preferred. c7 One of them is bonded to two positions in the ring. R c7 When multiple, multiple R c7 It can be the same or different. R c7 When organic, R c7 There is no restriction | limiting in particular in the range which does not prevent the objective of this invention, It can select suitably from various organic groups. As R c7 Examples of organic groups include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, saturated aliphatic fluorenyloxy, alkoxycarbonyl, and Substituted phenyl group, phenoxy group which may have a substituent, benzamidine group which may have a substituent, phenoxycarbonyl group which may have a substituent, benzamyloxy group which may have a substituent, may have a substituent Phenylalkyl, naphthyl which may have a substituent, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthalene which may have a substituent Formamyloxy, naphthylalkyl which may have a substituent, heterocyclyl which may have a substituent, heterocyclylcarbonyl which may have a substituent, amino group substituted with one or two organic groups, morpholine -1-yl, and pyrazin-1-yl and the like. R c7 When it is an alkyl group, the number of carbon atoms of the alkyl group is preferably 1 to 20, and more preferably 1 to 6. In addition, R c7 When it is an alkyl group, it may be linear or branched. As R c7 Specific examples when it is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, and sec Amyl, tert-amyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-nonyl, isononyl, n-decyl, and isodecyl, etc. In addition, R c7 In the case of an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl, and methoxypropyl. R c7 When it is an alkoxy group, the number of carbon atoms of the alkoxy group is preferably 1 to 20, and more preferably 1 to 6. In addition, R c7 When it is an alkoxy group, it may be linear or branched. As R c7 Specific examples when it is an alkoxy group include methoxy, ethoxy, n-propyloxy, isopropyloxy, n-butyloxy, isobutyloxy, sec-butyloxy, Tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, isooctyl Oxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isononyloxy, n-decyloxy, and isodecyloxy. In addition, R c7 When it is an alkoxy group, the alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, methoxyethoxyethoxy, and ethoxyethoxyethoxy Groups, propyloxyethoxyethoxy, and methoxypropyloxy. R c7 When it is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms of the cycloalkyl group or the cycloalkoxy group is preferably 3 to 10, and more preferably 3 to 6. As R c7 Specific examples when it is a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. As R c7 Specific examples when it is a cycloalkoxy group include cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, and cyclooctyloxy. R c7 When it is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, the number of carbon atoms of the saturated aliphatic fluorenyl group or saturated aliphatic fluorenyloxy group is preferably 2 to 21, more preferably 2 to 7. As R c7 Specific examples in the case of a saturated aliphatic fluorenyl group include ethenyl, propionyl, n-butylfluorenyl, 2-methylpropanyl, n-pentamyl, 2,2-dimethylpropanyl, and n-hexane Fluorenyl, n-heptanyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecanyl, n Pentadecylfluorenyl, and n-hexadecylfluorenyl. As R c7 Specific examples when it is a saturated aliphatic fluorenyloxy group include ethenyloxy, propionyloxy, n-butylfluorenyloxy, 2-methylpropylfluorenyloxy, n-pentamyloxy, 2,2-dimethylpropanyloxy, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy, n-decylfluorenyloxy, n-undecanefluorenyl Oxy, n-dodecylfluorenyloxy, n-tridecylfluorenyloxy, n-tetradecanylfluorenyloxy, n-pentadecanylfluorenyloxy, n-hexadecylfluorenyloxy, etc. . R c7 When it is an alkoxycarbonyl group, the number of carbon atoms of the alkoxycarbonyl group is preferably 2 to 20, and more preferably 2 to 7. As R c7 Specific examples when it is an alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, n-propyloxycarbonyl, isopropyloxycarbonyl, n-butyloxycarbonyl, and isobutyloxycarbonyl , Sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert-pentyloxycarbonyl, n-hexyloxycarbonyl, n- Heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxycarbonyl, n-nonyloxycarbonyl, isononyloxycarbonyl, n-decyl Carbonyloxy, isodecyloxycarbonyl, and the like. R c7 When it is a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7 to 20, and more preferably 7 to 10. In addition, R c7 When it is a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11-20, and more preferably 11-14. As R c7 Specific examples in the case of phenylalkyl include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. As R c7 Specific examples when it is a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β-naphthyl) ethyl. R c7 When phenylalkyl or naphthylalkyl, R c7 It may further have a substituent on a phenyl group or a naphthyl group. R c7 When it is a heterocyclic group, the heterocyclic group is a five- or six-membered monocyclic ring containing one or more N, S, and O, or the monocyclic ring is condensed with each other, or the monocyclic ring and a benzene ring are condensed. Heterocyclyl. When the heterocyclic group is a condensed ring, the number of rings is 3 or less. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, and pyrimidine , Pyridazine, benzofuran, benzothiophene, indole, isoindole, indazine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, oxazole, purine, quinoline, isoquine Phthaloline, quinazoline, phthalazine, oxoline, quinoxaline, pyridine, pyrazine, morpholine, pyridine, tetrahydropyran, and tetrahydrofuran. R c7 When it is a heterocyclic group, the heterocyclic group may further have a substituent. R c7 When heterocyclylcarbonyl, the heterocyclyl contained in heterocyclylcarbonyl and R c7 The same applies to a heterocyclic group. R c7 When the amine group is substituted with one or two organic groups, preferable examples of the organic group include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, A saturated aliphatic fluorenyl group having 2 to 21 carbon atoms, a phenyl group which may have a substituent, a benzamidine group which may have a substituent, a phenylalkyl group which may have 7 to 20 carbon atoms, A naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthylalkyl group which may have a substituent having 11 to 20 carbon atoms, a heterocyclic group, and the like. Specific examples of these preferred organic groups and R c7 same. Specific examples of the amine group substituted with one or two organic groups include methylamino, ethylamino, diethylamino, n-propylamino, di-n-propylamino, iso Propylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n-nonylamino, n-decyl Amino, phenylamino, naphthylamino, ethynylamino, propionylamino, n-butylfluorenylamino, n-pentamylamino, n-hexylfluorenylamino, n-heptanylamino, N-octylamidinylamino, n-decamidinylamino, benzamidineamino, α-naphthylmethylamino, β-naphthylmethylamino, and the like. R c7 The phenyl, naphthyl, and heterocyclic group contained in the substituent further have a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a carbon atom. Saturated aliphatic fluorenyl groups having 2 to 7 carbon atoms, alkoxycarbonyl groups having 2 to 7 carbon atoms, saturated aliphatic fluorenyloxy groups having 2 to 7 carbon atoms, and those having 1 to 6 carbon atoms Monoalkylamino groups of alkyl groups, dialkylamino groups of alkyl groups having 1 to 6 carbon atoms, morpholin-1-yl, pyrazin-1-yl, halogen, nitro, and cyano groups . R c7 When the phenyl group, naphthyl group, and heterocyclic group contained further have a substituent, the number of the substituent is not limited as long as it does not hinder the object of the present invention, and is preferably 1 to 4. R c7 When a phenyl group, a naphthyl group, and a heterocyclic group included in the group have a plurality of substituents, the plurality of substituents may be the same or different. [0124] In the group described above, as R c7 , For nitro or R c12 The base time represented by -CO- tends to increase sensitivity, which is preferred. R c12 There is no restriction | limiting in particular in the range which does not prevent the objective of this invention, It can select from various organic groups. As suitable as R c12 Examples of the group include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. In these bases, as R c12 Of these, 2-methylphenyl, thien-2-yl, and α-naphthyl are particularly preferred. In addition, R c7 When it is a hydrogen atom, transparency tends to become favorable, and it is preferable. Shang, R c7 Is a hydrogen atom and R c10 When it is a base represented by Formula (c4a) or (c4b) mentioned later, there exists a tendency for transparency to become more favorable. [0125] In the formula (c4), R c8 And R c9 Each is a linear alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom. R c8 With R c9 They can be bonded to each other to form a ring. In these bases, as R c8 And R c9 A chain alkyl group which may have a substituent is preferred. R c8 And R c9 When it is a linear alkyl group which may have a substituent, the linear alkyl group may be a linear alkyl group or a branched alkyl group. R c8 And R c9 When it is a chain alkyl group having no substituent, the number of carbon atoms of the chain alkyl group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. As R c8 And R c9 Specific examples in the case of a linear alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl , Sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, t-octyl, n-nonyl, isononyl, n-decyl, and isodecyl. In addition, R c8 And R c9 In the case of an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl, and methoxypropyl. R c8 And R c9 When it is a linear alkyl group having a substituent, the number of carbon atoms of the linear alkyl group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. In this case, the number of carbon atoms of the chain alkyl group does not include the number of carbon atoms of the substituent. The linear alkyl group having a substituent is preferably linear. The substituent which an alkyl group may have is not specifically limited in the range which does not prevent the objective of this invention. Preferable examples of the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom, a chlorine atom, and a bromine atom are preferred. Examples of the cyclic organic group include a cycloalkyl group, an aromatic hydrocarbon group, and a heterocyclic group. As a specific example of a cycloalkyl group, R is c7 The same applies to the case where it is a cycloalkyl group. Specific examples of the aromatic hydrocarbon group include phenyl, naphthyl, biphenyl, anthracenyl, and phenanthryl. As a specific example of a heterocyclic group, c7 The preferred examples in the case of a heterocyclic group are the same. R c7 When it is an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group contained in the alkoxycarbonyl group is preferably 1 to 10, and more preferably 1 to 6. [0128] When the linear alkyl group has a substituent, the number of the substituent is not particularly limited. The number of preferred substituents varies depending on the number of carbon atoms of the chain alkyl group. Typically, the number of substituents is 1 to 20, preferably 1 to 10, and more preferably 1 to 6. R c8 And R c9 When it is a cyclic organic group, the cyclic organic group may be an alicyclic group or an aromatic group. Examples of the cyclic organic group include an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclic group. R c8 And R c9 When it is a cyclic organic group, the substituent which the cyclic organic group may have and R c8 And R c9 The same applies to a linear alkyl group. R c8 And R c9 When it is an aromatic hydrocarbon group, the aromatic hydrocarbon group is preferably a phenyl group or a group formed by condensing a benzene ring through a carbon-carbon bond or a group formed by condensing a plurality of benzene rings. When the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensing a plurality of benzene rings, the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited, but is preferably 3 or less, more preferably 2 or less, and particularly It is preferably 1. Preferred specific examples of the aromatic hydrocarbon group include phenyl, naphthyl, biphenyl, anthracenyl, and phenanthryl. R c8 And R c9 When it is an aliphatic cyclic hydrocarbon group, the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic. The number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, but is preferably 3 to 20, and more preferably 3 to 10. Examples of the monocyclic cyclic hydrocarbon group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, norbornyl, isobornyl, tricyclononyl, Tricyclodecyl, tetracyclododecyl, and adamantyl. R c8 And R c9 When it is a heterocyclic group, the heterocyclic group is a five- or six-membered monocyclic ring containing one or more N, S, and O, or the monocyclic ring is condensed with each other, or the monocyclic ring and a benzene ring are condensed. Heterocyclyl. When the heterocyclic group is a condensed ring, the number of rings is 3 or less. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, and pyrimidine , Pyridazine, benzofuran, benzothiophene, indole, isoindole, indazine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, oxazole, purine, quinoline, isoquine Phthaloline, quinazoline, phthalazine, oxoline, quinoxaline, pyridine, pyrazine, morpholine, pyridine, tetrahydropyran, and tetrahydrofuran. R c8 With R c9 They can be bonded to each other to form a ring. Contains R c8 With R c9 The formed ring group is preferably a cycloalkylidene group. R c8 With R c9 When bonding to form a cycloalkylidene group, the ring constituting the cycloalkylidene group is preferably a five-membered ring to a six-membered ring, and more preferably a five-membered ring. R c8 With R c9 When the group formed by bonding is a cycloalkylidene group, the cycloalkylidene group may be condensed with one or more other rings. Examples of the ring condensable with a cycloalkylidene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a monocycloalkane ring, a bicycloalkane ring, a tricycloalkane ring, a tetracycloalkane ring, a furan ring, and thiophene. Ring, pyrrole ring, pyridine ring, pyrazine ring, and pyrimidine ring. R described above c8 And R c9 As an example of a preferable group, formula -A can be given. 1 -A 2 The base of representation. Where A 1 Is a straight-chain alkylene group, A 2 It is an alkoxy group, a cyano group, a halogen atom, a haloalkyl group, a cyclic organic group, or an alkoxycarbonyl group. [0136] A 1 The number of carbon atoms of the straight-chain alkylene group is preferably 1 to 10, and more preferably 1 to 6. A 2 When it is an alkoxy group, the alkoxy group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group is preferably 1 to 10, and more preferably 1 to 6. A 2 When it is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are preferable, and a fluorine atom, a chlorine atom, and a bromine atom are more preferable. A 2 When it is a halogenated alkyl group, the halogen atom contained in the halogenated alkyl group is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, and more preferably a fluorine atom, a chlorine atom, or a bromine atom. The haloalkyl group may be linear or branched, and is preferably linear. A 2 When it is a cyclic organic group, examples of the cyclic organic group and R c8 And R c9 The same applies to the cyclic organic group which is included as a substituent. A 2 In the case of alkoxycarbonyl, examples of alkoxycarbonyl are the same as R c8 And R c9 The same applies to the alkoxycarbonyl group as a substituent. R c8 And R c9 Preferred specific examples include alkyl groups such as ethyl, n-propyl, n-butyl, n-hexyl, n-heptyl, and n-octyl; 2-methoxyethyl, 3-methoxy-n-propyl 4-methoxy-n-butyl, 5-methoxy-n-pentyl, 6-methoxy-n-hexyl, 7-methoxy-n-heptyl, 8-methoxy-n-octyl, 2-ethoxy Ethyl, 3-ethoxy-n-propyl, 4-ethoxy-n-butyl, 5-ethoxy-n-pentyl, 6-ethoxy-n-hexyl, 7-ethoxy-n-heptyl, and 8 -Alkoxyalkyl groups such as ethoxy n-octyl; 2-cyanoethyl, 3-cyano-n-propyl, 4-cyano-n-butyl, 5-cyano-n-pentyl, 6-cyano-n-hexyl Cyanoalkyl such as methyl, 7-cyano-n-heptyl, and 8-cyano-n-octyl; 2-phenylethyl, 3-phenyl-n-propyl, 4-phenyl-n-butyl, 5-benzene Phenyl alkyl groups such as n-pentyl, 6-phenyl-n-hexyl, 7-phenyl-n-heptyl, and 8-phenyl-n-octyl; 2-cyclohexylethyl, 3-cyclohexyl-n-propyl, 4 -Cyclohexyl-n-butyl, 5-cyclohexyl-n-pentyl, 6-cyclohexyl-n-hexyl, 7-cyclohexyl-n-heptyl, 8-cyclohexyl-n-octyl, 2-cyclopentylethyl, 3-cyclopentyl N-propyl, 4-cyclopentyl-n-butyl, 5-cyclopentyl-n Cycloalkylalkyl such as 6-cyclopentyl-n-hexyl, 7-cyclopentyl-n-heptyl, and 8-cyclopentyl-n-octyl; 2-methoxycarbonylethyl, 3-methoxycarbonyl N-propyl, 4-methoxycarbonyl-n-butyl, 5-methoxycarbonyl-n-pentyl, 6-methoxycarbonyl-n-hexyl, 7-methoxycarbonyl-n-heptyl, 8-methoxycarbonyl-n- Octyl, 2-ethoxycarbonylethyl, 3-ethoxycarbonyl-n-propyl, 4-ethoxycarbonyl-n-butyl, 5-ethoxycarbonyl-n-pentyl, 6-ethoxycarbonyl-n-hexyl , 7-ethoxycarbonyl-n-heptyl, and 8-ethoxycarbonyl-n-octyl, such as alkoxycarbonylalkyl; 2-chloroethyl, 3-chloro-n-propyl, 4-chloro-n-butyl, 5 -Chloro-n-pentyl, 6-chloro-n-hexyl, 7-chloro-n-heptyl, 8-chloro-n-octyl, 2-bromoethyl, 3-bromo-n-propyl, 4-bromo-n-butyl, 5-bromo-n-butyl Amyl, 6-bromo-n-hexyl, 7-bromo-n-heptyl, 8-bromo-n-octyl, 3,3,3-trifluoropropyl, and 3,3,4,4,5,5,5-hepta Haloalkyl such as fluoro-n-pentyl. R c8 And R c9 The preferred groups in the above are ethyl, n-propyl, n-butyl, n-pentyl, 2-methoxyethyl, 2-cyanoethyl, 2-phenylethyl, 2-cyclohexylethyl Methyl, 2-methoxycarbonylethyl, 2-chloroethyl, 2-bromoethyl, 3,3,3-trifluoropropyl, and 3,3,4,4,5,5,5-hepta Fluoro-n-pentyl. R c10 Examples of preferred organic groups, with R c7 Similarly, alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, alkoxycarbonyl, saturated aliphatic fluorenyloxy, phenyl which may have a substituent, and A phenoxy group of a substituent, a benzamyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzamyloxy group which may have a substituent, a phenylalkyl group which may have a substituent, Naphthyl with a substituent, naphthyloxy with a substituent, naphthylmethyl with a substituent, naphthyloxycarbonyl with a substituent, naphthylmethyl with a substituent, and Substituted naphthylalkyl, heterocyclic group which may have a substituent, heterocyclic carbonyl group which may have a substituent, amine group substituted with one or two organic groups, morpholin-1-yl, and hydrazine -1-yl, etc. Specific examples of these bases c7 The illustrated example is the same. In addition, as R c10 Also preferred are cycloalkylalkyl, phenoxyalkyl which may have a substituent on the aromatic ring, and phenylthioalkyl which may have a substituent on the aromatic ring. Substituents which phenoxyalkyl and phenylthioalkyl can have and R c7 The substituents which may be included in the phenyl group included are the same. In the organic group, as R c10 Preferred are alkyl, cycloalkyl, phenyl which may have a substituent, or cycloalkylalkyl, and phenylthioalkyl which may have a substituent on the aromatic ring. The alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a methyl group. Among the phenyl groups which may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 to 10, more preferably 5 to 8, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 to 8, more preferably 1 to 4, and particularly preferably 2. Of the cycloalkylalkyl groups, cyclopentylethyl is preferred. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 to 8, more preferably 1 to 4, and even more preferably 2. Among the phenylthioalkyl groups which may have a substituent on the aromatic ring, 2- (4-chlorophenylthio) ethyl is preferred. In addition, as R c10 , Also better -A 3 -CO-OA 4 The base of representation. A 3 It is a divalent organic group, preferably a divalent hydrocarbon group, and more preferably an alkylene group. A 4 It is a monovalent organic group, and a monovalent hydrocarbon group is preferable. [0142] A 3 When it is an alkylene group, the alkylene group may be linear or branched, and is preferably linear. A 3 When it is an alkylene group, the number of carbon atoms of the alkylene group is preferably 1 to 10, more preferably 1 to 6, and particularly preferably 1 to 4. [0143] As A 4 Preferable examples include an alkyl group having 1 to 10 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an aromatic hydrocarbon group having 6 to 20 carbon atoms. As A 4 Preferred specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, phenyl, Naphthyl, benzyl, phenethyl, α-naphthylmethyl, and β-naphthylmethyl. As -A 3 -CO-OA 4 Preferable specific examples of the represented group include 2-methoxycarbonylethyl, 2-ethoxycarbonylethyl, 2-n-propyloxycarbonylethyl, 2-n-butyloxycarbonyl Ethyl, 2-n-pentyloxycarbonylethyl, 2-n-hexyloxycarbonylethyl, 2-benzyloxycarbonylethyl, 2-phenoxycarbonylethyl, 3-methoxycarbonyln Propyl, 3-ethoxycarbonyl n-propyl, 3-n-propyloxycarbonyl n-propyl, 3-n-butyloxycarbonyl n-propyl, 3-n-pentyloxycarbonyl n-propyl, 3 -N-hexyloxycarbonyl-n-propyl, 3-benzyloxycarbonyl-n-propyl, 3-phenoxycarbonyl-n-propyl, and the like. [0145] Above, for R c10 Clarified as R c10 Preferably, a base represented by the following formula (c4a) or (c4b). [Chemical 18] (In formulae (c4a) and (c4b), R c13 And R c14 Each is an organic group, n6 is an integer from 0 to 4, R c13 And R 8 When it exists in adjacent positions on the benzene ring, R c13 With R c14 Can be bonded to each other to form a ring, n7 is an integer from 1 to 8, n8 is an integer from 1 to 5, n9 is an integer from 0 to (n8 + 3), R c15 Is organic). R in formula (c4a) c13 And R c14 Examples of organic radicals in R with c7 same. As R c13 , Preferably alkyl or phenyl. R c13 In the case of an alkyl group, the number of carbon atoms is preferably 1 to 10, more preferably 1 to 5, particularly preferably 1 to 3, and most preferably 1. That is, R c13 Most preferred is methyl. R c13 With R c14 When bonded to form a ring, the ring may be an aromatic ring or an aliphatic ring. As R c13 With R c14 Preferable examples of the group represented by the formula (c4a) in which a ring is formed include naphthalen-1-yl, 1,2,3,4-tetrahydronaphthalen-5-yl, and the like. In the formula (c4a), n6 is an integer of 0 to 4, preferably 0 or 1, and more preferably 0. [0147] In the above formula (c4b), R c15 Is organic. Examples of the organic group include c7 The organic groups described are the same. Among the organic groups, an alkyl group is preferred. The alkyl group may be linear or branched. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3. As R c15 A methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, and the like can be preferably exemplified. Among these, a methyl group is more preferable. [0147] In the formula (c4b), n8 is an integer of 1 to 5, preferably an integer of 1 to 3, and more preferably 1 or 2. In the above formula (c4b), n9 is 0 to (n8 + 3), preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0. In the above formula (c4b), n7 is an integer of 1 to 8, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, and particularly preferably 1 or 2. In formula (c4), R c11 It is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. As R c11 Examples of the substituent which may be possessed when it is an alkyl group include a phenyl group and a naphthyl group. In addition, as R c7 As the substituent which may be possessed when it is an aryl group, an alkyl group having 1 to 5 carbon atoms, an alkoxy group, a halogen atom and the like can be preferably exemplified. In formula (c4), as R c11 Preferred examples include hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, phenyl, benzyl, methylphenyl, naphthyl, etc. Among these, methyl is more preferable Or phenyl. The compound represented by formula (c4) can be produced by a method comprising the step of converting an oxime group (> C = N-OH) contained in the compound represented by the above formula (c5) For ＞ C = NO-COR c11 Represents an oxime ester group. R c11 And R in formula (c4) c11 same. Oxime group (> C = N-OH) to> C = NO-COR c11 The conversion of the represented oxime ester group can be performed by reacting the compound represented by the above formula (c5) with a halogenating agent. Available as -COR c11 Examples of the amidinating agents represented by (R c11 CO) 2 Anhydride represented by O, R c11 COHal (Hal is a halogen atom) is a halogen. Among the compounds represented by the formula (c4), compounds represented by the following formula (CZ2) are preferred. For the compound represented by the formula (CZ2), the maximum value of the positive partial charge in the molecule is 0.024, and the minimum value of the negative partial charge is -0.129. [Chemical 19] [0154] Regarding the photopolymerization initiator (C), the maximum value of the positive partial charge in the molecule of the compound is preferably 0.350 or less, more preferably 0.200 or less, still more preferably 0.150 or less, and particularly preferably 0.100. Hereinafter, it is particularly preferably 0.050 or less. As for the photopolymerization initiator (C), the minimum value of the negative partial charge in the molecule of the compound is preferably -0.350 or more, more preferably -0.20 or more, still more preferably -0.150 or more, and particularly preferably- 0.100 or more, particularly preferably -0.050 or more. By setting the positive partial charge and the negative partial charge in the molecule in such a range, the quantum efficiency of the quantum dots in the resin film can be further improved. [0155] The content of the photopolymerization initiator (C) is preferably 0.5 to 30% by mass, and more preferably 1 to 20% by mass, relative to the mass of the solid content of the photosensitive composition as a whole. When the content of the photopolymerization initiator (C) is within the above range, a photosensitive composition having good sensitivity and less likely to cause defective pattern shapes can be obtained. [0156] In addition, a photopolymerization initiator (C) may be combined with a photoinitiation adjuvant. Examples of the photoinitiator include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, and 4-diamine. Isoamyl methylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N, N-dimethyl-p-toluidine, 4 , 4'-bis (dimethylamino) benzophenone, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxy Anthracene, 2-ethyl-9,10-diethoxyanthracene, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-5-methoxybenzo Thiol compounds such as thiazole, 3-mercaptopropionic acid, methyl 3-mercaptopropionate, pentaerythritol tetramercaptoacetate, 3-mercaptopropionate, and the like. These photoinitiation adjuvants can be used alone or in combination of two or more. [0157] <Quantum Dot (D)> The photosensitive composition includes not only the photopolymerization initiator (C) described above but also a quantum dot (D). By making the partial charge in the molecule of the photopolymerization initiator (C) satisfy the above-mentioned predetermined conditions, a cured composition having a high fluorescence quantum efficiency with respect to excitation light can be formed using a photosensitive composition. [0158] The quantum dot (D) may be any fine particle that functions as a quantum dot, and its structure and constituent components are not particularly limited. From the viewpoint of achieving both safety and good light emission characteristics of a cured film formed using a photosensitive composition, the quantum dots (D) preferably do not contain Cd and Pb as constituent components, but include In and / or Si, etc. As the constituent component, In is more preferably contained. That is, the quantum dot (D) preferably contains a compound containing In. [0159] From the viewpoint of easily forming a cured film with good light emission characteristics using a photosensitive composition, the quantum dot (D) preferably contains a group selected from a group 2 element, a group 12 element, a group 13 element, a group 14 element, Group 15 elements and at least two elements in a group formed by group 16 elements. Specific examples of the element suitable as a constituent of the quantum dot (D) include Be, Mg, Ca, Sr, Ba, Cu, Ag, Au, Zn, B, Al, Ga, In, and T1. , C, Si, Ge, Sn, N, P, As, Sb, Bi, O, S, Se, Te, and Po. The quantum dot (D) is preferably formed of a compound containing at least two elements selected from the group consisting of the above-mentioned preferred elements. [0161] From the viewpoint of the light-emitting characteristics of the light-emitting layer for a light-emitting display, the quantum dot (D) preferably contains a compound (D1) selected from a compound having a fluorescence maximum in a wavelength region of 500 to 600 nm, and 600 to 700 nm One or more members of the group consisting of the compound (D2) having a fluorescence maximum in the wavelength region, more preferably one or more members selected from the group consisting of the compound (D1) and the compound (D2). [0162] a quantum dot (D) including one or more compounds selected from the group consisting of the above-mentioned compound (D1) and compound (D2) in at least a wavelength region of 500 to 600 nm and a wavelength region of 600 to 700 nm One region has a fluorescence maximum. As a result, when the photosensitive composition containing the quantum dot (D) is used, a cured film of a light emitting layer suitable as a light emitting display element for displaying images using light in a visible region can be formed. [0163] Among the quantum dots (D) described above, a quantum dot containing a compound containing In as a constituent is preferable. In addition, quantum dots containing Si compounds are also preferred. [0164] The structure of the quantum dot (D) may be a homogeneous structure formed of one kind of compound, or a composite structure formed of two or more kinds of compounds. In the case of a composite structure, the manner of inclusion of two or more compounds in the quantum dot (D) is not particularly limited. As a quantum dot (D) containing two or more compounds, a core-shell structured quantum dot having a core covered with one or more shells is preferable, and a core-shell structure covered with a single shell is more preferable. Quantum dots. [0165] For a quantum dot with a core-shell structure, the core is covered with a shell layer formed of a material different from the core material. For example, by covering a core semiconductor with a semiconductor having a larger band gap, excitons (electron-hole pairs) generated by photoexcitation can be confined within the core. Therefore, the probability of non-radiative transition on the surface of the quantum dot can be reduced, and the quantum yield of light emission and the stability of the fluorescence characteristics can be improved. [0166] As a preferable specific example of the quantum dot (D), examples of the core-shell type quantum dot (D) include InP / ZnS and CuInS. 2 / ZnS, and (ZnS / AgInS 2 ) Solid solution / ZnS. A preferred specific example of a homogeneous structure type quantum dot (D) without a shell layer is AgInS. 2 And Zn-doped AgInS 2 . In the above, the material of the core-shell type quantum dot (D) is described as (the material of the core) / (the material of the shell). The above-mentioned quantum dots (D) may be used in combination of two or more kinds, or a core-shell type quantum dot (D) and a homogeneous structure type quantum dot (D) may be used in combination. [0167] The average particle diameter of the quantum dot (D) is not particularly limited as long as it is within a range capable of functioning as a quantum dot, and is preferably 0.5 to 20 nm, and more preferably 1.0 to 10 nm. The quantum dot (D) having an average particle diameter within the above range not only exerts a quantum confinement effect and functions well as a quantum dot, but also is easy to modulate and has stable fluorescent characteristics. The average particle diameter of the quantum dots (D) can be defined, for example, by applying a dispersion of the quantum dots (D) on a substrate and drying them, removing volatile components, and then using a transmission electron microscope ( TEM) to observe the surface. Typically, the average particle diameter can be defined in the form of the number-average diameter of the equivalent circle diameter of each particle obtained through image analysis of a TEM image. [0168] The shape of the quantum dot (D) is not particularly limited. Examples of the shape of the quantum dot (D) include a spherical shape, an ellipsoidal shape, a cylindrical shape, a polygonal columnar shape, a disc shape, and a polyhedron shape. Among these, a spherical shape is preferable from a viewpoint of ease of handling and availability. [0169] The manufacturing method of the quantum dot (D) is not particularly limited. As the quantum dot (D), a quantum dot manufactured by various known methods can be used. As a method for producing the quantum dot (D), for example, a method of thermally decomposing an organometallic compound in a coordinated organic solvent can be adopted. In addition, a core-shell structure type quantum dot (D) can be produced by forming a homogeneous core by a reaction, and then forming a precursor of the shell by reacting in the presence of a dispersed core. Shell method. Alternatively, various commercially available quantum dots (D) may be used. [0170] The content of the quantum dots (D) is preferably 3 to 80% by mass, and more preferably 5 to 70% by mass with respect to the mass of the solid content of the photosensitive composition as a whole. By setting the content of the quantum dots (D) within the above range, it is easy to obtain a photosensitive composition capable of forming a cured film having a high internal quantum efficiency and which can be suitably used as a light emitting layer in a light emitting display element. [0171] <Organic Solvent (S)> In order to improve coating properties and adjust viscosity, the photosensitive composition preferably contains an organic solvent (S). [0172] Specific examples of the organic solvent (S) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, and ethylene glycol mono-n-butyl ether. , Diethylene glycol monomethyl ether, Diethylene glycol monoethyl ether, Diethylene glycol mono-n-propyl ether, Diethylene glycol mono-n-butyl ether, Triethylene glycol monomethyl ether, Triethyl Glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono (Poly) alkylene glycol monoalkyl ethers such as n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, and tripropylene glycol monoethyl ether; ethylene glycol monomethyl ether acetic acid Ester, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol (Poly) alkylene glycol monoalkyl ether acetates such as monoethyl ether acetate; diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl Ether, tetrahydrofuran Other ethers such as lan; methyl ketones, cyclohexanone, 2-heptanone, and 3-heptanone; ketones such as methyl 2-hydroxypropionate and ethyl 2-hydroxypropionate ; Ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropionate Ethyl acetate, ethyl ethoxylate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate Ester, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isoamyl acetate , Benzyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, Other esters such as ethyl acetate, ethyl acetate, ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene; N-methyl-2-pyrrolidone, N, N-dimethyl Methylformamide, N, N-dimethylacetamide, N, N-dimethylisobutylamidine, N, N-diethylacetamide, N, N-diamine Methylformamide, N-methylcaprolactam, 1,3-dimethyl-2-imidazolinone, pyridine, and N, N, N ', N'-tetramethylurea and other polar organic nitrogen Solvents; etc. Among these, alkylene glycol monoalkyl ethers, alkylene glycol monoalkyl ether acetates, other ethers described above, alkyl lactates, and other esters described above are preferred. More preferred are the above-mentioned other esters such as alkylene glycol monoalkyl ether acetates, the above-mentioned other ethers, benzyl acetate, and the like. In addition, from the standpoint of the solubility of each component, the organic solvent (S) preferably contains a nitrogen-containing polar organic solvent. As the nitrogen-containing polar organic solvent, N, N, N ', N'-tetramethylurea and the like can be used. These solvents can be used alone or in combination of two or more. [0174] The content of the organic solvent (S) is not particularly limited, and is appropriately set depending on the thickness of the coating film at a concentration at which coating can be performed on a substrate or the like. The viscosity of the photosensitive composition is preferably 1 to 300 cp, more preferably 3 to 200 cp, and still more preferably 5 to 100 cp. The solid content concentration is preferably 5 to 100% by mass, and more preferably 10 to 75% by mass. [Other Components] Additives such as a surfactant, an adhesion improving agent, a thermal polymerization inhibitor, a defoaming agent, a silane coupling agent, and a leveling agent may be contained in the photosensitive composition as necessary. . All additives can use existing known substances. The photosensitive composition preferably contains a silane coupling agent from the viewpoint of easily forming a cured film having a good shape and good adhesion to the substrate. As the silane coupling agent, conventionally known substances can be used without particular limitation. Examples of the surfactant include anionic, cationic, and non-ionic compounds. Examples of the thermal polymerization inhibitor include hydroquinone and hydroquinone monoethyl ether. Examples of the antifoaming agent include polymer Siloxane-based, fluorine-based compounds, etc. [0176] <Method for preparing photosensitive composition> The photosensitive composition described above can be obtained by mixing each of the above-mentioned respective components in a predetermined amount and then uniformly mixing them with a blender. Still, in order to make the obtained mixture more homogeneous, it may be filtered using a filter. In addition, the quantum dots (D) may be used in the form of a dispersion liquid obtained by dispersing them in a part of the organic solvent (S) to prepare a photosensitive composition. [0177] ≫Method for Producing Hardened Film≫ As a method for producing a cured film, a conventionally known method for producing a cured film using a photosensitive composition containing a photopolymerizable compound (B) can be used without particular limitation. [0178] As a preferable method for producing a cured film, a method including the steps of: a step of applying the photosensitive composition described above to form a coating film; and a step of exposing the coating film. [0179] In order to form a cured film using the photosensitive composition, first, the photosensitive composition is coated on a substrate selected according to the use of the cured film to form a coating film. The method for forming the coating film is not particularly limited, and for example, a contact transfer type coating device such as a roll coater, a reverse coater, or a bar coater, a spin coater (rotary coater), or a curtain coater can be used It is performed by a non-contact coating device such as a curtain flow coater. [0180] The applied photosensitive composition is dried as necessary to constitute a coating film. The drying method is not particularly limited, and for example, the following methods may be mentioned: (1) a method of drying with a hot plate at a temperature of 80 to 120 ° C, preferably 90 to 100 ° C for 60 to 120 seconds; (2) ) A method of leaving it at room temperature for several hours to several days; (3) A method of removing the solvent by placing it in a hot air heater or an infrared heater for tens of minutes to several hours; and so on. [0181] Next, the coating film is exposed. The exposure can be performed by irradiating active energy rays such as ultraviolet rays and excimer lasers. The exposure may be performed on the entire surface of the coating film, or may be performed in a position-selective manner using, for example, a method of performing exposure through a negative mask. The amount of energy rays to be irradiated varies depending on the composition of the photosensitive composition, for example, 40 to 200 mJ / cm 2 about. When the entire surface of the coating film is exposed, an unpatterned cured film having a shape corresponding to the shape of the coating film can be formed. [0182] When the coating film is exposed in a position-selective manner, the unexposed portion is dissolved in the developing solution and removed by developing the exposed film with a developing solution to form a patterned cured film. The developing method is not particularly limited, and for example, a dipping method, a spray method, or the like can be used. The developer can be appropriately selected depending on the composition of the photosensitive composition. As the developing solution, for example, an alkaline aqueous solution (such as TMAH) such as sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, and a quaternary ammonium salt can be used. [0183] Next, the patterned cured film may be baked (post-baked) as necessary. The baking temperature is not particularly limited, but is preferably 150 to 250 ° C, and more preferably 1800 to 230 ° C. Typically, the baking time is 5 to 90 minutes, preferably 10 to 60 minutes. By performing the baking in the above manner, a cured film of the photosensitive composition can be obtained. [0184] The internal quantum efficiency of the cured film including the quantum dot (D) formed as described above is better, and it can be suitably used as a light emitting layer in a light emitting display element. [0185] (Light-Emitting Display Element and Light-Emitting Layer) Hereinafter, a light-emitting display element having the above-mentioned cured film as a light-emitting layer will be described. The light-emitting display element can be configured using a wavelength conversion substrate that uses a cured film formed using the above-mentioned photosensitive composition as a light-emitting layer. FIG. 1 is a cross-sectional view schematically showing a structure of a typical light-emitting display element. [0186] The light-emitting display element 100 includes a wavelength conversion substrate 11 including a light-emitting layer 13 (13a, 13b, 13c) and a black matrix 14 on the substrate 12, and a wavelength conversion substrate 11 via an adhesive layer 15. Laminated light source substrate 18. [0187] The substrate 12 is made of glass, quartz, or a transparent resin (for example, transparent polyimide, polyethylene naphthalate, polyethylene terephthalate, polybutylene terephthalate). , Cyclic olefin resin film, etc.). [0188] The light-emitting layer 13 in the wavelength conversion substrate 11 is a cured film formed by curing the above-mentioned photosensitive composition. The light emitting layer 13 is preferably formed by patterning using a photosensitive method using the above-mentioned photosensitive composition. The light emitting layer 13 is preferably formed in accordance with the above-mentioned method for producing a cured film. [0189] The wavelength conversion substrate 11 performs wavelength conversion on the excitation light emitted from the excitation light source 17 in the light source substrate 18 through the action of the quantum dots (D) contained in each light emitting layer 13, thereby emitting fluorescent light of a desired wavelength. [0190] Regarding the configuration of the wavelength conversion substrate 11, the light-emitting layer 13a, the light-emitting layer 13b, and the light-emitting layer 13c each contain different quantum dots (D), and can emit different fluorescent light. For example, the wavelength conversion substrate 11 may be configured as follows: the light emitting layer 13 a converts excitation light into red light, the light emitting layer 13 b converts excitation light into green light, and the light emitting layer 13 c converts excitation light into blue light. In this case, in order to make the light-emitting layers 13a, 13b, and 13c have desired fluorescent characteristics, the quantum dots (D) are respectively used in three types of photosensitive compositions for forming the light-emitting layers 13a, 13b, and 13c. To choose from. [0191] Furthermore, the light-emitting layer 13a, the light-emitting layer 13b, and the light-emitting layer 13c are sequentially formed by repeatedly performing the above-mentioned method for manufacturing a cured film by using three types of photosensitive compositions each containing different quantum dots (D). By operating as described above, the light-emitting layer 13 is formed on the substrate 12 to obtain a wavelength conversion substrate 11. [0192] The thickness of the light emitting layer 13 in the wavelength conversion substrate 11 is preferably 100 nm to 100 μm, and more preferably 1 μm to 100 μm. By making the thickness of the light-emitting layer 13 within the above range, the light-emitting layer 13 can sufficiently absorb the excitation light, thereby obtaining high light conversion efficiency, and therefore, the brightness of the light-emitting display element is better. In view of the particularly good brightness of the light-emitting display element, the thickness of the light-emitting layer 13 is preferably 1 μm or more. [0193] Between each light emitting layer 13 on the substrate 12, a black matrix 14 is arranged. The black matrix 14 can be formed by patterning according to a known method using a known material that is light-shielding. The black matrix 14 is not an essential component in the wavelength conversion substrate 11, and may be a configuration in which the black matrix 14 is not provided on the wavelength conversion substrate 11. [0194] The adhesive layer 15 can be formed using a known adhesive that transmits ultraviolet light or blue light having a wavelength described later. Note that the adhesive layer 15 does not need to be provided so as to cover the entire surface of the light emitting layers 13a, 13b, and 13c as shown in FIG. 1, and may be provided only around the wavelength conversion substrate 11. [0195] The light source substrate 18 includes a substrate 16 and a light source 17 disposed on the wavelength conversion substrate 11 side of the substrate 16. Ultraviolet light or blue light, which is excitation light, is emitted from the light source 17, respectively. The light source 17 is not particularly limited, and various light-emitting sources manufactured using known materials and known manufacturing methods can be used. It is preferable to use an organic EL element that emits ultraviolet light, an organic EL element that emits blue light, and the like having a known structure. The ultraviolet light is preferably light having a main emission peak in a wavelength range of 360 to 435 nm. The blue light is preferably light having a main emission peak in a wavelength range of 435 to 480 nm. In order to make each emitted light enter the opposite light-emitting layer 13, it is preferable that the light source 17 has directivity. [0196] In the light-emitting display element 100, the wavelengths of the excitation light emitted from the light sources 17a, 17b, and 17c pass through three kinds of quantum dots (D) included in the light-emitting layers 13a, 13b, and 13c which are opposed to the light sources. While being converted. In this way, the excitation light emitted from the light source 17 is converted into visible light of a desired wavelength and used for display. [0197] In the light-emitting display element 100, a portion in which the light-emitting layer 13a is provided constitutes a subpixel that performs red display. That is, the light emitting layer 13 a in the wavelength conversion substrate 11 converts the excitation light emitted from the light source 17 a opposite to the light source substrate 18 into red. In addition, a portion where the light emitting layer 13b is provided constitutes a sub-pixel that performs green display. That is, the light emitting layer 13 b converts the excitation light emitted from the light source 17 b facing the light source substrate 18 to green. In addition, a portion where the light emitting layer 13c is provided constitutes a sub-pixel that performs blue display. That is, the light emitting layer 13 c converts the excitation light emitted from the light source 17 c facing the light source substrate 18 into blue. [0198] The light-emitting display element 100 uses three types of sub-pixels having a light-emitting layer 13a, sub-pixels having a light-emitting layer 13b, and sub-pixels having a light-emitting layer 13c to constitute 1 as a minimum unit constituting an image. Primitives. [0199] The light-emitting display element 100 having the above configuration can control the sub-pixels having the light-emitting layer 13a, the sub-pixels having the light-emitting layer 13b, and the sub-pixels having the light-emitting layer 13c to emit red, green, and blue. Light. In addition, one pixel including three types of sub-pixels is controlled to emit red, green, and blue light, and a full-color display is performed. [0200] In the light-emitting display element, a color filter (not shown) may be provided between the light-emitting layer 13 and the substrate 12. Specifically, a red color filter is provided between the light emitting layer 13a and the substrate 12, a green color filter is provided between the light emitting layer 13b and the substrate 12, and a blue filter is provided between the light emitting layer 13c and the substrate 12. Color device. By providing a color filter in the light-emitting display element described above, the purity of the displayed color can be improved. Here, a color filter used in a known image display element such as a liquid crystal display element may be applied to the light-emitting display element 100. EXAMPLES [0201] Hereinafter, the present invention will be described more specifically by showing examples, but the scope of the present invention is not limited by these examples. [Examples and Comparative Examples] In the examples and comparative examples, the following materials were used. As the alkali-soluble resin (A), a copolymer of glycidyl methacrylate / methacrylic acid / styrene / methacrylic acid (Molar ratio: 40/20/20/20) was used. The weight-average molecular weight of the alkali-soluble resin was 7,000. As the photopolymerizable compound (B), dipentaerythritol hexaacrylate was used. As a photopolymerization initiator (C), the following C-1 was used in the Example, and the following C-2 was used in the comparative example. As the silane coupling agent, 3-glycidoxypropyltrimethoxysilane (KBM-403, manufactured by Shin-Etsu Polysiloxane Co., Ltd.) was used. As a leveling agent, BYK-310 (manufactured by BYK-Chemie) was used. [Chemical 20] [0203] As for the photopolymerization initiator (C), for the above-mentioned C-1, the maximum value of the positive partial charge in the molecule calculated by the extended Hockel method is 0.019, and the minimum value of the negative partial charge is 0.019. It is -0.004. For the above-mentioned C-1, the maximum value of the positive partial charge in the molecule is 0.115, and the minimum value of the negative partial charge is -0.825. [0204] As the quantum dot (D), a quantum dot having a core-shell structure including a core formed of InP and a shell formed of ZnS was used. The quantum dot (D) is obtained by referring to a method described in Journal of American Chemical Society. 2007, 129, 15432-15433. The quantum dots (D) are dispersed in a mixed solvent containing 50% by mass of propylene glycol monomethyl ether, 40% by mass of diethylene glycol methylethyl ether, and 10% by mass of cyclohexanone (D ) Is used to prepare a photosensitive composition in the form of a dispersion having a solid content concentration of 12% by mass. [0205] so that the solid content concentration becomes 25% by mass, 59 parts by mass of the alkali-soluble resin (A), 31.2 parts by mass of the photopolymerizable compound (B), 5.8 parts by mass of the photopolymerization initiator (C), and silane coupling 2 parts by mass of the mixture and 2 parts by mass of the leveling agent were obtained by dissolving in a mixed solvent containing 50% by mass of propylene glycol monomethyl ether, 40% by mass of diethylene glycol methylethyl ether, and 10% by mass of cyclohexanone. Solution. The obtained solution was mixed with the quantum dot dispersion in a volume ratio of 1: 1 to obtain the photosensitive composition of the example. Moreover, except having changed the usage-amount of a photopolymerizable compound (B) into 35 mass parts, and changed the usage-amount of a photo-polymerization initiator (C) into 2 masses, it carried out similarly to Example, and obtained Photosensitive composition. [0206] Using the obtained photosensitive composition, the quantum efficiency was confirmed by the following methods, respectively. As a result, it was confirmed that the value of the quantum efficiency of the example was 3.6 times the value of the quantum efficiency of the comparative example. <Quantum efficiency evaluation method> The quantum efficiency was measured at room temperature using the quantum efficiency measurement system (QE-2000, manufactured by Otsuka Electronics Co., Ltd.) about the liquid photosensitive composition obtained in the Example and the comparative example. [0207] According to the above, it is known that a compound containing a maximum positive partial charge in the molecule calculated by the extended Hockel method is 0.500 or less and a minimum negative charge is -0.500 or more as a photopolymerization initiator ( The quantum efficiency of the photosensitive composition of the example C) is better, whereas the quantum efficiency of the photosensitive composition containing a photopolymerization initiator (C) that does not satisfy the predetermined conditions is poor. It is self-evident that the quantum efficiency of the cured film formed using the photosensitive composition having a better quantum efficiency is also preferable.

[0208][0208]

100‧‧‧發光顯示元件100‧‧‧light-emitting display element

11‧‧‧波長轉換基板11‧‧‧ Wavelength Conversion Substrate

12‧‧‧基板12‧‧‧ substrate

13‧‧‧發光層13‧‧‧Light-emitting layer

14‧‧‧黑色矩陣14‧‧‧ Black Matrix

15‧‧‧接著劑層15‧‧‧ Adhesive layer

16‧‧‧基板16‧‧‧ substrate

17‧‧‧光源17‧‧‧ light source

18‧‧‧光源基板18‧‧‧ light source substrate

[0016] [圖1]為示意性地表示典型的發光顯示元件之截面構成之圖。[0016] FIG. 1 is a diagram schematically showing a cross-sectional configuration of a typical light-emitting display element.

Claims (9)

一種感光性組成物，其係包含鹼可溶性樹脂（A）、光聚合性化合物（B）、光聚合起始劑（C），與量子點（D）， 　　前述光聚合起始劑（C）包含下述化合物，對於所述化合物而言，依據擴展休克爾法(Extended Hückel method)算出的、分子內的正性部分電荷的最大值為0.500以下，負性部分電荷的最小值為-0.500以上。A photosensitive composition comprising an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), and a quantum dot (D). The aforementioned photopolymerization initiator (C) contains For the following compounds, the maximum value of the positive partial charge in the molecule calculated by the Extended Hückel method is 0.500 or less, and the minimum value of the negative partial charge is -0.500 or more. 如請求項1之感光性組成物，其中，前述光聚合起始劑（C）為具有＞C=N-O-CO-Rc0 表示的肟酯基之化合物，前述Rc0 為碳原子數為1~6之脂肪族烴基。The photosensitive composition according to claim 1, wherein the photopolymerization initiator (C) is a compound having an oxime ester group represented by> C = NO-CO-R c0 , and the R c0 is a carbon number of 1 to 6 aliphatic hydrocarbon group. 如請求項1或2之感光性組成物，其中，前述量子點（D）包含選自由第2族元素、第12族元素、第13族元素、第14族元素、第15族元素，及第16族元素所成群中之至少2種元素。The photosensitive composition according to claim 1 or 2, wherein the quantum dot (D) comprises a member selected from the group consisting of a group 2 element, a group 12 element, a group 13 element, a group 14 element, a group 15 element, and a At least two elements in a group of 16 group elements. 如請求項1~3中任一項之感光性組成物，其中，前述量子點（D）含有包含In的化合物。The photosensitive composition according to any one of claims 1 to 3, wherein the quantum dot (D) contains a compound containing In. 一種硬化膜，其係將請求項1~4中任一項之感光性組成物硬化而成。A cured film obtained by curing the photosensitive composition according to any one of claims 1 to 4. 一種發光顯示元件用之發光層，其係將請求項1~4中任一項之感光性組成物硬化而成。A light-emitting layer for a light-emitting display element, which is obtained by curing the photosensitive composition according to any one of claims 1 to 4. 一種發光顯示元件，其係具備請求項6之發光層。A light-emitting display element including the light-emitting layer of claim 6. 一種發光層之形成方法，前述方法包含下述步驟： 　　將請求項1~4中任一項之感光性組成物塗佈於基板上而形成塗佈膜的步驟，與 　　將前述塗佈膜曝光之步驟。A method for forming a light-emitting layer, the method includes the following steps: a step of applying the photosensitive composition of any one of claims 1 to 4 on a substrate to form a coating film, and exposing the coating film step. 如請求項8之發光層之形成方法，所述方法包含下述步驟： 　　以位置選擇性方式將前述塗佈膜曝光， 　　進而，將經曝光之前述塗佈膜顯影。As claimed in claim 8, the method for forming a light emitting layer includes the following steps: exposing the aforementioned coating film in a position-selective manner, and further developing the exposed aforementioned coating film.
TW106130274A 2016-11-30 2017-09-05 Photosensitive composition, cured film, light-emitting layer for light-emitting display element, light-emitting display element and method for forming light-emitting layer TWI739899B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016233274A JP6856367B2 (en) 2016-11-30 2016-11-30 A method for forming a photosensitive composition, a cured film, a light emitting layer for a light emitting display element, a light emitting display element, and a light emitting layer.
JP2016-233274 2016-11-30

Publications (2)

Publication Number Publication Date
TW201821449A true TW201821449A (en) 2018-06-16
TWI739899B TWI739899B (en) 2021-09-21

Family

ID=62227643

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106130274A TWI739899B (en) 2016-11-30 2017-09-05 Photosensitive composition, cured film, light-emitting layer for light-emitting display element, light-emitting display element and method for forming light-emitting layer

Country Status (4)

Country Link
JP (1) JP6856367B2 (en)
KR (1) KR102461588B1 (en)
CN (1) CN108121158B (en)
TW (1) TWI739899B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102554285B1 (en) * 2017-02-03 2023-07-10 동우 화인켐 주식회사 Quantum Dot Dispersion, Self Emission Type Photosensitive Resin Composition, Color Filter and Display Device
JP7011055B2 (en) 2017-10-27 2022-01-26 サムスン エスディアイ カンパニー，リミテッド Quantum dot-containing composition, quantum dot manufacturing method and color filter
JP7087775B2 (en) * 2018-07-26 2022-06-21 Dic株式会社 Ink composition, light conversion layer and color filter
US12035584B2 (en) 2018-09-07 2024-07-09 Sharp Kabushiki Kaisha Display device and method for manufacturing display device
WO2020059143A1 (en) * 2018-09-21 2020-03-26 シャープ株式会社 Light emitting element, light emitting device, and method for manufacturing light emitting element
JP7371432B2 (en) * 2018-10-12 2023-10-31 東洋インキＳｃホールディングス株式会社 Ink composition, laminate using the composition, light wavelength conversion layer, light wavelength conversion member, and color filter
KR102296792B1 (en) * 2019-02-01 2021-08-31 삼성에스디아이 주식회사 Non-solvent type curable composition, curing layer using the same, color filter including the curing layer, display device and manufacturing method of the curing layer
CN111752099B (en) * 2019-03-29 2022-03-22 常州强力电子新材料股份有限公司 Photosensitive resin composition, application thereof, color filter and image display device
KR102360987B1 (en) 2019-04-24 2022-02-08 삼성에스디아이 주식회사 Curable composition including quantum dot, resin layer using the same and display device
KR102504790B1 (en) 2019-07-26 2023-02-27 삼성에스디아이 주식회사 Quantum dot, curable composition comprising the same, curing layer using the composition, color filter including the curing layer, display device
JP7569213B2 (en) * 2019-12-26 2024-10-17 住友化学株式会社 Photosensitive composition
CN111679355A (en) * 2020-06-10 2020-09-18 Tcl华星光电技术有限公司 Quantum dot polaroid, display substrate and display device
JP2024054521A (en) * 2022-10-05 2024-04-17 信越化学工業株式会社 Photosensitive resin composition, photosensitive resin film, pattern formation method, and light-emitting element

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100682928B1 (en) 2005-02-03 2007-02-15 삼성전자주식회사 Energy downconversion film and quantum dot film comprising quantum dot
GB2442505A (en) 2006-10-04 2008-04-09 Sharp Kk A display with a primary light source for illuminating a nanophosphor re-emission material
KR101817378B1 (en) * 2010-12-20 2018-01-11 아사히 가라스 가부시키가이샤 Photosensitive resin composition, partition wall, color filter, and organic el element
JP6427876B2 (en) * 2013-12-27 2018-11-28 Jsr株式会社 Radiation sensitive resin composition, cured film, light emitting element, and method for forming light emitting layer
JP6171927B2 (en) * 2013-12-25 2017-08-02 Jsr株式会社 Radiation sensitive resin composition, cured film, light emitting element, and method for forming light emitting layer
KR102316002B1 (en) * 2014-02-18 2021-10-21 에이지씨 가부시키가이샤 Negative photosensitive resin composition, resin cured film, partition wall, and optical element
JP6254280B2 (en) * 2014-07-15 2017-12-27 東京応化工業株式会社 Compound
CN106795228B (en) * 2014-09-05 2019-08-30 住友化学株式会社 Solidification compound
JP6299546B2 (en) * 2014-09-25 2018-03-28 Jsr株式会社 Curable resin composition, cured film, wavelength conversion film, light emitting element, and method for forming light emitting layer
JP6764636B2 (en) * 2014-10-08 2020-10-07 東京応化工業株式会社 Radiation-sensitive resin composition, pattern manufacturing method, transparent insulating film, and display device
KR102116971B1 (en) * 2015-01-23 2020-06-02 삼성디스플레이 주식회사 Photosensitive resin composition and display device
JP6195584B2 (en) * 2015-02-04 2017-09-13 東京応化工業株式会社 Colorant dispersion, photosensitive resin composition containing the same, and dispersion aid
JP6436838B2 (en) * 2015-03-27 2018-12-12 東京応化工業株式会社 Photosensitive resin composition
JP6497251B2 (en) * 2015-07-17 2019-04-10 Jsr株式会社 Cured film forming composition, cured film, light emitting display element, cured film forming method and dispersion
KR101840347B1 (en) * 2016-10-26 2018-03-20 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter and image display device produced using the same

Also Published As

Publication number Publication date
KR102461588B1 (en) 2022-11-02
KR20180062406A (en) 2018-06-08
CN108121158A (en) 2018-06-05
JP6856367B2 (en) 2021-04-07
CN108121158B (en) 2022-07-22
TWI739899B (en) 2021-09-21
JP2018091924A (en) 2018-06-14

Similar Documents

Publication Publication Date Title
TWI739899B (en) Photosensitive composition, cured film, light-emitting layer for light-emitting display element, light-emitting display element and method for forming light-emitting layer
TW201829644A (en) Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition
JP6374595B1 (en) Photosensitive resin composition, cured film, display device, and pattern forming method
TW201826027A (en) Photosensitive resin composition, cured film, color filter and manufacturing method of cured film
CN111240156A (en) Photosensitive resin composition, method for producing patterned cured film, and patterned cured film
TWI738910B (en) Resin composition, black matrix, display device, and manufacturing method of black matrix
TW201817717A (en) Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element
JP2018185512A (en) Photosensitive resin composition for forming black column spacer, black column spacer, display device and method for forming black column spacer
TW201902942A (en) Method for forming patterned cured film photosensitive composition dry film and method for producing plated shaped article
KR102537532B1 (en) Resin Composition, Cured Film, Color Filter, and Preparing Method of Cured Film
JP2021102725A (en) Resin composition, cured product, and siloxane modified (meth)acrylic resin
TW202138396A (en) Photosensitive composition, method of producing patterned cured film, and patterned cured film capable of forming a cured product having low dielectric constant and excellently patterned
TW202128782A (en) Photosensitive composition, cured product, and method for producing cured product
TW201635029A (en) Black photosensitive resin composition, black matrix and image display device comprising thereof
TW202024792A (en) Photosensitive resin composition, method for producing a patterned cured film, and cured film
JP6705661B2 (en) Carboxylate-containing composition
JP7560954B2 (en) Photosensitive composition, method for producing patterned cured film, and patterned cured film
JP2018060136A (en) Photosensitive resin composition, cured film, color filter, and method for producing cured film
TW202146373A (en) Photosensitive composition, cured product, manufacturing method of cured product, and photopolymerizable composition containing an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C) and a solvent (S)
JP2024018491A (en) Photosensitive composition, method for producing patterned cured product, patterned cured product, and black matrix
JP2023097940A (en) photosensitive composition
TW202131101A (en) Photosensitive composition, cured product, and method for producing cured product
WO2023127402A1 (en) Photosensitive composition, cured product, and method for producing patterned cured film
JP2022013302A (en) Photosensitive composition, cured product, method for producing cured film, and resin
JP2023147017A (en) photosensitive composition