TW201829644A - Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition - Google Patents

Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition Download PDF

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TW201829644A
TW201829644A TW106136324A TW106136324A TW201829644A TW 201829644 A TW201829644 A TW 201829644A TW 106136324 A TW106136324 A TW 106136324A TW 106136324 A TW106136324 A TW 106136324A TW 201829644 A TW201829644 A TW 201829644A
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resin composition
photosensitive resin
formula
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TWI746671B (en
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松本直純
大內康秀
石川達郎
黒子麻祐美
塩田大
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日商東京應化工業股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • C09B67/0066—Aqueous dispersions of pigments containing only dispersing agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B5/00—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings
    • C09B5/62—Cyclic imides or amidines of peri-dicarboxylic acids of the anthracene, benzanthrene, or perylene series
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • C09B67/0069—Non aqueous dispersions of pigments containing only a solvent and a dispersing agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0084—Dispersions of dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/761—Biomolecules or bio-macromolecules, e.g. proteins, chlorophyl, lipids or enzymes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
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  • Optics & Photonics (AREA)
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  • Biophysics (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Epoxy Resins (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)

Abstract

Provided are a coloring agent dispersion giving a photosensitive resin composition which includes a favorably dispersed pigment and is capable of forming a cured film having a small amount of gas generated when the coloring agent dispersion is mixed with the photosensitive resin composition, the photosensitive resin composition including the concerned coloring agent dispersion, a cured product of the concerned photosensitive resin composition, an organic electroluminescent (EL) device including the concerned cured product, a method of forming a pattern using the above-mentioned photosensitive resin composition, and a method of preparing the photosensitive resin composition using the above-mentioned coloring agent dispersion. The coloring agent dispersion of the present invention contains a coloring agent (E) comprising a pigment (E1) and a dispersant (E2), wherein the dispersant (E2) including a silsesquioxane compound of a specific structure is used in the coloring agent dispersion.

Description

著色劑分散液、感光性樹脂組合物、硬化物、有機EL元件、圖案之形成方法、及感光性樹脂組合物之製造方法Colorant dispersion liquid, photosensitive resin composition, cured product, organic EL element, method for forming pattern, and method for producing photosensitive resin composition

本發明係關於一種著色劑分散液、包含該著色劑分散液之感光性樹脂組合物、該感光性樹脂組合物之硬化物、具備該硬化物之有機EL(Electroluminescence，電致發光)元件、使用上述感光性樹脂組合物之圖案之形成方法、及使用上述著色劑分散液之感光性樹脂組合物之製造方法。The present invention relates to a colorant dispersion liquid, a photosensitive resin composition containing the colorant dispersion liquid, a cured product of the photosensitive resin composition, and an organic EL (Electroluminescence) element including the cured product. A method for forming a pattern of the photosensitive resin composition and a method for producing a photosensitive resin composition using the colorant dispersion liquid.

一直以來，有機EL顯示元件、或彩色濾光片、有機TFT(thin-film transistor，薄膜電晶體)陣列等光學元件係藉由於基板上形成包圍像素之障壁(間隔壁)後，於障壁所圍成之區域內設置各種功能層而製造。作為形成此種障壁之簡易方法，已知藉由使用感光性樹脂組合物之光微影法形成障壁之方法(參照專利文獻1等)。 [先前技術文獻] [專利文獻] [專利文獻1]國際公開第2013/069789號說明書Optical elements such as organic EL display elements, color filters, and organic TFT (thin-film transistor) arrays have been formed by barriers (partition walls) surrounding pixels formed on a substrate. It is manufactured by providing various functional layers in the completed area. As a simple method for forming such a barrier, a method for forming a barrier by a photolithography method using a photosensitive resin composition is known (see Patent Document 1 and the like). [Prior Art Literature] [Patent Literature] [Patent Literature 1] International Publication No. 2013/069789

[發明所欲解決之問題] 然而，根據專利文獻1記載之方法，於形成能夠用作障壁之硬化膜之情形時，存在自硬化膜產生之氣體量變多之擔憂。有機EL元件中，障壁係設置成與ITO等電極層、或發光層接觸。進而，若電極層或發光層受到自障壁產生之氣體之污染，則存在促進該等劣化之擔憂。 因此，業界期望能夠形成產生氣體量較少之硬化膜之感光性樹脂組合物。 使感光性樹脂組合物硬化而成之硬化膜之所以產生氣體之原因有多種，作為原因之一，可列舉感光性樹脂組合物所含之各種成分之分解。 關於該方面，認為形成用作障壁之硬化膜所使用之感光性樹脂組合物通常含有包含經分散劑分散之顏料之著色劑分散液，分散劑乃導致分解而產生氣體之因素之一。 因此，期待藉由改變著色劑分散液所含之分散劑而抑制自硬化膜產生氣體。 另一方面，既然是顏料分散液，當然要求顏料分散液維持顏料之良好分散。 本發明係鑒於上述課題而成者，其目的在於提供一種著色劑分散液、包含該著色劑分散液之感光性樹脂組合物、該感光性樹脂組合物之硬化物、具備該硬化物之有機EL元件、使用上述感光性樹脂組合物之圖案之形成方法、及使用上述著色劑分散液之感光性樹脂組合物之製造方法；上述著色劑分散液包含經良好分散之顏料，於調配至感光性樹脂組合物中之情形時提供能夠形成產生氣體量較少之硬化膜之感光性樹脂組合物。 [解決問題之技術手段] 本發明者等人為了解決上述課題，經過努力研究，結果發現，藉由於含有包含顏料(E1)與分散劑(E2)之著色劑(E)之著色劑分散液中，使用包含特定結構之倍半矽氧烷化合物之分散劑(E2)，可解決上述課題，從而完成本發明。具體而言，本發明提供以下者。 本發明之第1態樣係一種著色劑分散液，其係包含著色劑(E)者， 著色劑(E)包含顏料(E1)與分散劑(E2)，且 分散劑(E2)包含具有下述式(e2a)： [化1](式(e2a)中，Re1 為1價有機基) 所表示之結構單元之倍半矽氧烷化合物。 本發明之第2態樣係一種感光性樹脂組合物，其包含鹼溶性樹脂(A)、光聚合性單體(B)、光聚合起始劑(C)、及第1態樣之著色劑分散液。 本發明之第3態樣係一種硬化物，其係使第2態樣之感光性樹脂組合物硬化而成。 本發明之第4態樣係一種有機EL元件，其具備第3態樣之硬化物。 本發明之第5態樣係一種圖案之形成方法，其包括如下步驟：藉由塗佈第2態樣之感光性樹脂組合物而形成塗佈膜； 位置選擇性地對塗佈膜進行曝光；及 將經曝光之塗佈膜進行顯影。 本發明之第6態樣係一種感光性樹脂組合物之製造方法，其係製造第2態樣之感光性樹脂組合物之方法，包括如下步驟： 藉由使顏料(E1)於分散劑(E2)之存在下分散於液中而準備著色劑分散液；及 將著色劑分散液、鹼溶性樹脂(A)、光聚合性單體(B)、及光聚合起始劑(C)進行混合。 [發明之效果] 根據本發明，可提供一種能夠形成產生氣體量較少之硬化膜之感光性樹脂組合物、使用上述感光性樹脂組合物所形成之硬化膜及有機EL元件中之發光層之劃分用障壁、具備上述障壁之有機EL元件用基板及有機EL元件、使用上述感光性樹脂組合物之硬化膜及有機EL元件中之發光層之劃分用障壁之製造方法、及使用具備上述障壁之有機EL元件用基板之有機EL元件之製造方法。[Problems to be Solved by the Invention] However, according to the method described in Patent Document 1, when a cured film that can be used as a barrier is formed, there is a concern that the amount of gas generated from the cured film increases. In the organic EL device, the barrier is provided in contact with an electrode layer such as ITO or a light-emitting layer. Further, if the electrode layer or the light-emitting layer is contaminated by a gas generated from the barrier ribs, there is a concern that such deterioration is promoted. Therefore, the industry desires a photosensitive resin composition capable of forming a cured film with a small amount of gas. There are various reasons why a cured film formed by curing the photosensitive resin composition generates gas. As one of the reasons, decomposition of various components contained in the photosensitive resin composition can be cited. In this regard, it is considered that the photosensitive resin composition used to form a cured film used as a barrier rib usually contains a colorant dispersion liquid containing a pigment dispersed with a dispersant, and the dispersant is one of the factors that cause decomposition to generate gas. Therefore, it is expected to suppress the generation of gas from the cured film by changing the dispersant contained in the colorant dispersion liquid. On the other hand, since it is a pigment dispersion liquid, it is of course required that the pigment dispersion liquid maintains a good dispersion of the pigment. The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a toner dispersion liquid, a photosensitive resin composition containing the colorant dispersion liquid, a cured product of the photosensitive resin composition, and an organic EL including the cured material. Element, method for forming pattern using the photosensitive resin composition, and method for manufacturing photosensitive resin composition using the colorant dispersion liquid; the colorant dispersion liquid contains a well-dispersed pigment, and is formulated into the photosensitive resin In the case of the composition, a photosensitive resin composition capable of forming a cured film having a small amount of generated gas is provided. [Technical means to solve the problem] In order to solve the above-mentioned problems, the present inventors have made diligent research, and as a result, have found that the colorant dispersion By using a dispersant (E2) containing a silsesquioxane compound having a specific structure, the above-mentioned problems can be solved, thereby completing the present invention. Specifically, the present invention provides the following. A first aspect of the present invention is a colorant dispersion, which includes a colorant (E), the colorant (E) includes a pigment (E1) and a dispersant (E2), and the dispersant (E2) includes Formula (e2a): [化 1] (In formula (e2a), R e1 is a monovalent organic group.) A silsesquioxane compound represented by a structural unit. A second aspect of the present invention is a photosensitive resin composition comprising an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a coloring agent according to the first aspect. Dispersions. A third aspect of the present invention is a cured product obtained by curing the photosensitive resin composition of the second aspect. A fourth aspect of the present invention is an organic EL device including a hardened body of the third aspect. A fifth aspect of the present invention is a method for forming a pattern, which includes the following steps: forming a coating film by coating the photosensitive resin composition of the second aspect; and exposing the coating film selectively in position; And the exposed coating film is developed. The sixth aspect of the present invention is a method for producing a photosensitive resin composition, which is a method for producing the second aspect of the photosensitive resin composition, and includes the following steps: By disposing the pigment (E1) in a dispersant (E2) The colorant dispersion is prepared by dispersing in a liquid in the presence of); and mixing the colorant dispersion, the alkali-soluble resin (A), the photopolymerizable monomer (B), and the photopolymerization initiator (C). [Effects of the Invention] According to the present invention, it is possible to provide a photosensitive resin composition capable of forming a cured film having a small amount of generated gas, a cured film formed using the photosensitive resin composition, and a light emitting layer in an organic EL element. Dividing barriers, substrates for organic EL elements and organic EL elements provided with the barriers, manufacturing methods of dividing barriers using the cured film of the photosensitive resin composition and light-emitting layers in the organic EL elements, and using the barriers with the barriers A method of manufacturing an organic EL element for a substrate for an organic EL element.

以下，基於較佳實施形態而對本發明進行說明。再者，本說明書中之「～」只要無特別說明，則表示以上(下限值)至以下(上限值)。 ≪著色劑分散液≫ 著色劑分散液包含著色劑(E)。著色劑(E)包含顏料(E1)與分散劑(E2)。 分散劑(E2)包含具有下述式(e2a)： [化2](式(e2a)中，Re1 為1價有機基) 所表示之結構單元之倍半矽氧烷化合物。 該著色劑分散液由於包含上述分散劑(E2)，故而可使顏料良好地分散。又，對於使用含有上述包含分散劑(E2)之著色劑分散液之感光性樹脂組合物所形成之硬化物而言，抑制氣體之產生。 以下，對著色劑分散液所含之成分、與著色劑分散液之製造方法進行說明。 ＜著色劑(E)＞ 著色劑分散液包含著色劑(E)。著色劑(E)必須包含顏料(E1)與分散劑(E2)。 著色劑(E)除包含顏料(E1)以外，視需要亦可包含染料作為著色成分。該染料自公知材料之中適當選擇即可。 作為染料，例如可列舉：偶氮染料、金屬錯合鹽偶氮染料、蒽醌染料、三苯基甲烷染料、染料、花青染料、萘醌染料、醌亞胺染料、次甲基染料、酞菁染料等。 又，關於該等染料，可藉由色澱化(造鹽化)使之分散於有機溶劑等，而使其含有於著色劑(E)中。 除該等染料以外，亦可較佳地使用例如日本專利特開2013-225132號公報、日本專利特開2014-178477號公報、日本專利特開2013-137543號公報、日本專利特開2011-38085號公報、日本專利特開2014-197206號公報等中記載之染料等。 又，該等染料亦可與下述顏料(E1)(例如，苝系顏料、內醯胺系顏料、AgSn合金微粒子等)組合使用。 [顏料(E1)] 作為顏料(E1)，並無特別限定，較佳為使用例如於色料索引(C.I.；The Society of Dyers and Colourists社發行)中分類為顏料(Pigment)之化合物，具體而言，如下所述之標註色料索引(C.I.)編號者。 作為可較佳使用之黃色顏料之例，可列舉：C.I.顏料黃1(以下，「C.I.顏料黃」相同，僅記載編號)、3、11、12、13、14、15、16、17、20、24、31、53、55、60、61、65、71、73、74、81、83、86、93、95、97、98、99、100、101、104、106、108、109、110、113、114、116、117、119、120、125、126、127、128、129、137、138、139、147、148、150、151、152、153、154、155、156、166、167、168、175、180、及185。 作為可較佳使用之橙色顏料之例，可列舉：C.I.顏料橙1(以下，「C.I.顏料橙」相同，僅記載編號)、5、13、14、16、17、24、34、36、38、40、43、46、49、51、55、59、61、63、64、71、及73。 作為可較佳使用之紫色顏料之例，可列舉：C.I.顏料紫1(以下，「C.I.顏料紫」相同，僅記載編號)、19、23、29、30、32、36、37、38、39、40、及50。 作為可較佳使用之紅色顏料之例，可列舉：C.I.顏料紅1(以下，「C.I.顏料紅」相同，僅記載編號)2、3、4、5、6、7、8、9、10、11、12、14、15、16、17、18、19、21、22、23、30、31、32、37、38、40、41、42、48：1、48：2、48：3、48：4、49：1、49：2、50：1、52：1、53：1、57、57：1、57：2、58：2、58：4、60：1、63：1、63：2、64：1、81：1、83、88、90：1、97、101、102、104、105、106、108、112、113、114、122、123、144、146、149、150、151、155、166、168、170、171、172、174、175、176、177、178、179、180、185、187、188、190、192、193、194、202、206、207、208、209、215、216、217、220、223、224、226、227、228、240、242、243、245、254、255、264、及265。 作為可較佳使用之藍色顏料之例，可列舉：C.I.顏料藍1(以下，「C.I.顏料藍」相同，僅記載編號)、2、15、15：3、15：4、15：6、16、22、60、64、及66。 作為可較佳使用之上述其他色相之顏料之例，可列舉：C.I.顏料綠7、C.I.顏料綠36、C.I.顏料綠37等綠色顏料，C.I.顏料棕23、C.I.顏料棕25、C.I.顏料棕26、C.I.顏料棕28等棕色顏料，C.I.顏料黑1、C.I.顏料黑7等黑色顏料。 又，著色劑分散液亦可包含遮光劑作為著色劑(E)。包含遮光劑之著色劑分散液適於製備用於形成液晶顯示面板中之黑矩陣或黑管柱隔片、或者形成有機EL元件中之發光層之劃分用障壁之感光性樹脂組合物。 使用含有包含下述分散劑(E2)之著色劑分散液之感光性樹脂組合物所形成之硬化物其產生之氣體較少。 因此，使用含有包含分散劑(E2)之著色劑分散液之感光性樹脂組合物所形成之障壁不易對有機EL元件中之有機發光材料(發光層)或電極產生損害。並且，於障壁包含遮光劑之情形時，容易防止有機EL元件內發生內部反射或不必要之光進入至有機EL元件內。 根據以上記述，包含遮光劑與分散劑(E2)之感光性樹脂組合物可尤佳地用於形成有機EL元件中之發光層之劃分用障壁。 於著色劑(E)包含遮光劑作為顏料(E1)之情形時，作為遮光劑，較佳為使用黑色顏料或紫色顏料。作為黑色顏料或紫色顏料之例，可列舉：碳黑、苝系顏料、內醯胺系顏料、鈦黑、銅、鐵、錳、鈷、鉻、鎳、鋅、鈣、銀等之金屬氧化物、複合氧化物、金屬硫化物、金屬硫酸鹽或金屬碳酸鹽等不論是有機物或無機物之各種顏料。 作為碳黑，可使用煙囪黑、爐黑、熱黑、燈黑等公知碳黑。又，亦可使用樹脂被覆碳黑。 作為碳黑，亦較佳為實施有導入酸性基之處理之碳黑。對碳黑導入之酸性基係顯示出基於布忍斯特(Bronsted)定義之酸性之官能基。作為酸性基之具體例，可列舉：羧基、磺酸基、磷酸基等。導入至碳黑中之酸性基亦可形成鹽。與酸性基形成鹽之陽離子於無損本發明之目的之範圍內無特別限定。作為陽離子之例，可列舉：各種金屬離子、含氮化合物之陽離子、銨離子等，較佳為鈉離子、鉀離子、鋰離子等鹼金屬離子、或銨離子。 以上說明之實施有導入酸性基之處理之碳黑之中，就達成使用感光性樹脂組合物所形成之遮光性之硬化膜之高電阻的觀點而言，較佳為具有選自由羧酸基、羧酸鹽基、磺酸基、及磺酸鹽基所組成之群中之1種以上之官能基的碳黑。 對碳黑導入酸性基之方法並無特別限定。作為導入酸性基之方法，例如可列舉以下之方法。 1)藉由使用濃硫酸、發煙硫酸、氯磺酸等之直接取代法、或使用亞硫酸鹽、亞硫酸氫鹽等之間接取代法，對碳黑導入磺酸基之方法。 2)使具有胺基及酸性基之有機化合物與碳黑進行重氮偶合之方法。 3)使具有鹵素原子及酸性基之有機化合物與具有羥基之碳黑藉由威廉姆遜(Williamson)醚化法而反應之方法。 4)使具有鹵代羰基及經保護基保護之酸性基之有機化合物與具有羥基之碳黑進行反應之方法。 5)使用具有鹵代羰基及經保護基保護之酸性基之有機化合物，對碳黑進行弗瑞德-克來福特(Friedel-Crafts)反應後進行去保護之方法。 該等方法之中，就酸性基之導入處理之容易性及安全性之方面而言，較佳為方法2)。作為方法2)中所使用之具有胺基及酸性基之有機化合物，較佳為於芳香族基上鍵結有胺基與酸性基之化合物。作為此種化合物之例，可列舉：如磺胺酸之胺基苯磺酸、或如4-胺基苯甲酸之胺基苯甲酸。 對碳黑導入之酸性基之莫耳數於無損本發明之目的之範圍內無特別限定。對碳黑導入之酸性基之莫耳數相對於碳黑100 g，較佳為1 mmol以上且200 mmol以下，更佳為5 mmol以上且100 mmol以下。 亦可利用樹脂對導入有酸性基之碳黑實施被覆處理。於使用含有包含經樹脂被覆之碳黑之著色劑分散液之感光性樹脂組合物之情形時，容易形成遮光性及絕緣性優異、表面反射率較低之遮光性硬化物。 再者，藉由樹脂之被覆處理，尤其不會對使用感光性樹脂組合物所形成之遮光性硬化物之介電常數產生不良影響。作為可用於被覆碳黑之樹脂之例，可列舉：酚樹脂、三聚氰胺樹脂、二甲苯樹脂、鄰苯二甲酸二烯丙酯樹脂、甘酞樹脂、環氧樹脂、烷基苯樹脂等熱硬化性樹脂，或聚苯乙烯、聚碳酸酯、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、改性聚苯醚、聚碸、聚對伸苯基對苯二甲醯胺、聚醯胺醯亞胺、聚醯亞胺、聚胺基雙順丁烯二醯亞胺、聚醚碸、聚苯碸、聚芳酯、聚醚醚酮等熱塑性樹脂。關於樹脂對碳黑之被覆量，相對於碳黑與樹脂之合計質量，較佳為1質量%以上且30質量%以下。 又，作為遮光劑，亦較佳為苝系顏料。作為苝系顏料之具體例，可列舉：下述式(e-1)所表示之苝系顏料、下述式(e-2)所表示之苝系顏料、及下述式(e-3)所表示之苝系顏料。關於市售品，可較佳地使用BASF公司製造之製品名K0084及K0086、或顏料黑21、30、31、32、33及34等作為苝系顏料。 [化3]式(e-1)中，Re11 及Re12 分別獨立地表示碳原子數1以上且3以下之伸烷基，Re13 及Re14 分別獨立地表示氫原子、羥基、甲氧基、或乙醯基。 [化4]式(e-2)中，Re15 及Re16 分別獨立地表示碳原子數1以上且7以下之伸烷基。 [化5]式(e-3)中，Re17 及Re18 分別獨立地為氫原子、碳原子數1以上且22以下之烷基，亦可包含N、O、S或P之雜原子。於Re17 及Re18 為烷基之情形時，該烷基可為直鏈狀，亦可為支鏈狀。 上述式(e-1)所表示之化合物、式(e-2)所表示之化合物、及式(e-3)所表示之化合物可採用例如日本專利特開昭62-1753號公報、日本專利特公昭63-26784號公報中記載之方法合成。即，以苝-3,5,9,10-四羧酸或其二酐與胺類作為原料，於水或有機溶劑中進行加熱反應。進而，使所獲得之粗製物於硫酸中再沈澱、或者於水、有機溶劑或該等之混合溶劑中再結晶，藉此可獲得目標物。 為了使苝系顏料良好地分散於著色劑分散液中，苝系顏料之平均粒徑較佳為10 nm以上且1000 nm以下。 又，亦可包含內醯胺系顏料作為遮光劑。作為內醯胺系顏料，例如可列舉下述式(e-4)所表示之化合物。 [化6]式(e-4)中，Xe1 表示雙鍵，作為幾何異構物，分別獨立為E體或Z體，Re19 分別獨立地表示氫原子、甲基、硝基、甲氧基、溴原子、氯原子、氟原子、羧基、或磺基，Re20 分別獨立地表示氫原子、甲基、或苯基，Re21 分別獨立地表示氫原子、甲基、或氯原子。 式(e-4)所表示之化合物可單獨使用或將2種以上組合使用。 就式(e-4)所表示之化合物之易製造性之方面而言，Re19 較佳為鍵結於二氫吲哚酮環之6位，Re21 較佳為鍵結於二氫吲哚酮環之4位。就相同觀點而言，Re19 、Re20 、及Re21 較佳為氫原子。 關於式(e-4)所表示之化合物，作為幾何異構物而存在EE體、ZZ體、EZ體，可為該等中之單獨任一種之化合物，亦可為該等幾何異構物之混合物。 式(e-4)所表示之化合物可藉由例如國際公開第2000/24736號、國際公開第2010/081624號中記載之方法進行製造。 為了使內醯胺系顏料良好地分散於著色劑分散液中，內醯胺系顏料之平均粒徑較佳為10 nm以上且1000 nm以下。 又，作為著色劑，亦可使用金屬粒子。 此種金屬粒子較佳為由金屬形成、或由金屬與金屬化合物形成，尤佳為由金屬形成。金屬粒子可以組合之形式包含分別為2種以上之金屬或金屬化合物。 金屬粒子尤其較佳為包含選自由長週期表(IUPAC 1991)之第4週期、第5週期、及第6週期所組成之群中之金屬作為主成分。又，金屬粒子較佳為包含選自由第2～14族所組成之群中之金屬作為主成分，更佳為包含選自由第2族、第8族、第9族、第10族、第11族、第12族、第13族、及第14族所組成之群中之金屬作為主成分。作為金屬粒子，進而較佳為第4週期、第5週期、或第6週期且第2族、第10族、第11族、第12族、或第14族之金屬之粒子。 作為金屬粒子所含之金屬之較佳例，可列舉選自銅、銀、金、鉑、鈀、鎳、錫、鈷、銠、銥、鉄、鈣、釕、鋨、錳、鉬、鎢、鈮、鉭、鈦、鉍、銻、鉛、及該等之合金中之至少1種。該等金屬之中，較佳為銅、銀、金、鉑、鈀、鎳、錫、鈷、銠、鈣、銥、及該等之合金，更佳為選自銅、銀、金、鉑、鈀、錫、鈣、及該等之合金中之至少1種，尤佳為選自銅、銀、金、鉑、錫、及該等之合金中之至少1種。 又，此種金屬粒子可取芯-殼結構。 以上列舉之金屬粒子之中，可較佳地使用包含以銀錫(AgSn)合金為主成分之微粒子(以下稱為「AgSn合金微粒子」)之無機顏料作為遮光劑。該AgSn合金微粒子只要AgSn合金為主成分即可，亦可包含例如Ni、Pd、Au等其他金屬成分。 該AgSn合金微粒子之平均粒徑較佳為1 nm以上且300 nm以下。 AgSn合金於以化學式AgxSn表示之情形時，可獲得化學上穩定之AgSn合金之x之範圍為1≦x≦10，可同時實現化學穩定性與黑色度之x之範圍為3≦x≦4。 此處，若於上述x之範圍內求出AgSn合金中之Ag之質量比，則於 x＝1之情形時，Ag/AgSn＝0.4762 x＝3之情形時，3・Ag/Ag3Sn＝0.7317 x＝4之情形時，4・Ag/Ag4Sn＝0.7843 x＝10之情形時，10・Ag/Ag10Sn＝0.9008。 因此，關於該AgSn合金，於含有47.6質量%以上且90質量%以下之Ag之情形時，於化學上穩定，於含有73.17質量%以上且78.43質量%以下之Ag之情形時，可相對於Ag量而有效實現化學穩定性與黑色度。 該AgSn合金微粒子可採用通常之微粒子合成法製作。作為微粒子合成法，可列舉：氣相反應法、噴霧熱分解法、霧化法、液相反應法、冷凍乾燥法、水熱合成法等。 AgSn合金微粒子之絕緣性較高，但根據使用著色劑分散液所製備之感光性樹脂組合物之用途，亦可利用絕緣膜被覆表面以進一步提高絕緣性。作為此種絕緣膜之材料，宜為金屬氧化物或有機高分子化合物。 作為金屬氧化物，適宜使用具有絕緣性之金屬氧化物，例如氧化矽(silica)、氧化鋁(alumina)、氧化鋯(zirconia)、氧化釔(yttria)、氧化鈦(titania)等。 又，作為有機高分子化合物，適宜使用具有絕緣性之樹脂，例如聚醯亞胺、聚醚、聚丙烯酸酯、聚胺化合物等。 為了充分提高AgSn合金微粒子之表面之絕緣性，絕緣膜之膜厚較佳為1 nm以上且100 nm以下，更佳為5 nm以上且50 nm以下。 絕緣膜可藉由表面改質技術或表面鍍膜技術容易地形成。尤其若使用四乙氧基矽烷、三乙醇鋁等烷氧化物，則可於相對低溫下形成膜厚均勻之絕緣膜，因此較佳。 作為遮光劑，可單獨使用上述苝系顏料、內醯胺系顏料、AgSn合金微粒子，亦可將該等組合使用。 另外，基於調整色調之目的等，遮光劑可一併包含上述黑色顏料或紫色顏料與紅、藍、綠、黃等色相之色素。黑色顏料或紫色顏料以外之其他色相之色素可自公知色素中適當選擇。例如作為黑色顏料或紫色顏料以外之其他色相之色素，可使用上述各種顏料。黑色顏料或紫色顏料以外之其他色相之色素之使用量相對於遮光劑之總質量而較佳為15質量%以下，更佳為10質量%以下。 又，無機顏料與有機顏料可分別單獨使用或將2種以上併用，於併用之情形時，相對於無機顏料與有機顏料之總量100質量份，有機顏料較佳為於10質量份以上且80質量份以下之範圍內使用，更佳為於20質量份以上且40質量份以下之範圍內使用。 關於著色劑分散液中之顏料(E1)之量，相對於著色劑分散液之全部固形物成分之質量，較佳為30質量%以上且95質量%以下，更佳為40質量%以上且90質量%以下，進而較佳為50質量%以上且85質量%以下。 藉由使用相對於著色劑分散液之全部固形物成分之質量為此種範圍內之量之顏料(E1)，容易使顏料(E1)良好地分散於著色劑分散液中。 ＜分散劑(E2)＞ 著色劑分散液一併包含上述顏料(E1)與分散劑(E2)。於分散劑(E2)之作用下，顏料(E1)良好地分散於著色劑分散液中。 分散劑(E2)包含具有下述式(e2a)： [化7](式(e2a)中，Re1 為1價有機基) 所表示之結構單元之倍半矽氧烷化合物。 作為倍半矽氧烷化合物之一般結構，熟知的有籠型、不完全籠型、梯型、無規型等。用作分散劑(E2)之倍半矽氧烷化合物之結構並無特別限定，可為籠型、不完全籠型、梯型、無規型等先前已知之任意結構。 該倍半矽氧烷化合物藉由倍半矽氧烷結構而具有良好之顏料分散效果。 又，倍半矽氧烷化合物具有化學穩定性或熱穩定性。因此，使用含有包含上述倍半矽氧烷化合物作為分散劑(E2)之著色劑分散液之感光性樹脂組合物所形成之硬化物其由分散劑(E2)引起之氣體產生可得到抑制。 倍半矽氧烷化合物較佳為包含選自芳香族基、醯胺鍵、及胺基甲酸酯鍵中之1種以上。該等基或鍵一般而言為對顏料用之分散劑賦予分散效果之化學結構。因此，包含選自芳香族基、醯胺鍵、及胺基甲酸酯鍵中之1種以上之倍半矽氧烷化合物就容易使顏料良好地分散之方面而言更佳。 倍半矽氧烷化合物中，芳香族基、醯胺鍵、或胺基甲酸酯鍵之存在位置可為式(e2a)所表示之結構單元中之Re1 所表示之有機基中，亦可為式(e2a)所表示之結構單元以外之位置。該位置較佳為式(e2a)所表示之結構單元中之Re1 所表示之有機基中。 例如，倍半矽氧烷化合物能夠與下述式(e2a-1)或(e2a-2)所表示之結構單元進行鍵結。下述式(e2a-1)或(e2a-2)所表示之結構單元中，於Re0 為有機基之情形時，該有機基可包含選自芳香族基、醯胺鍵、及胺基甲酸酯鍵中之1種以上。 [化8](式(e2a-1)及(e2a-2)中，Re0 分別獨立地為氫原子、或1價有機基。於Re0 為有機基之情形時，該有機基與下述Re1 相同) 於式(e2a)中之Re1 為有機基之情形時，其碳原子數並無特別限定。碳原子數例如較佳為1以上且50以下，更佳為1以上且30以下，尤佳為1以上且20以下。有機基之結構可為直鏈狀，亦可為支鏈狀，亦可為環狀，亦可為該等結構之組合結構。有機基亦可具有1個以上之不飽和鍵。有機基亦可包含雜原子。作為雜原子，可列舉：鹵素原子、氧原子、硫原子、氮原子、磷原子等。 作為有機基之較佳例，可列舉：烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、飽和脂肪族醯氧基、烷氧基羰基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、經1個或2個有機基取代之胺基等。 作為該等基可具有之取代基，可列舉：碳原子數1以上且20以下之烷基、碳原子數1以上且20以下之烷氧基、碳原子數3以上且10以下之環烷基、碳原子數3以上且10以下之環烷氧基、碳原子數2以上且20以下之飽和脂肪族醯基、碳原子數2以上且20以下之烷氧基羰基、碳原子數2以上且20以下之飽和脂肪族醯氧基、苯基、苯氧基、苯硫基、苯甲醯基、苯氧基羰基、苯甲醯氧基、碳原子數7以上且20以下之苯基烷基、萘基、萘氧基、萘甲醯基、萘氧基羰基、萘甲醯氧基、碳原子數11以上且20以下之萘基烷基、雜環基、雜環基羰基、胺基、經1個或2個碳原子數1以上且20以下之有機基取代之胺基、硝基、羥基、鹵素原子、氰基、羧基等。 式(e2a)中，Re1 為1價有機基。該有機基較佳為下述式(e2a-I)： -Xe -Be -Ye -COOH・・・(e2a-I) 所表示之基、或下述式(e2a-II)： -Ze -Ae ・・・(e2-II) 所表示之基。 式(e2a-I)中，Xe 為單鍵、碳原子數1以上且6以下之伸烷基、碳原子數6以上且12以下之伸芳基、或-Re6 -NH-Re7 -所表示之基。 Re6 及Re7 分別獨立地為碳原子數1以上且3以下之伸烷基。 Ye 為2價環式有機基、或碳原子數1以上且20以下之鏈狀脂肪族烴基。 Be 為-NH-CO-、-CO-NH-、-NH-CO-O-、-O-CO-NH-、或-NH-CO-NH-。 Xe 及Ye 可分別獨立地經選自由(甲基)丙烯醯氧基、乙烯基、及含環氧基之有機基所組成之群中之1種以上之基取代。 Ze 為單鍵、碳原子數1以上且6以下之伸烷基、或碳原子數6以上且12以下之伸芳基。 Ae 為(甲基)丙烯醯氧基、乙烯基、或含環氧基之有機基。 倍半矽氧烷化合物較佳為具有包含式(e2a-I)所表示之基作為Re1 之結構單元(A)作為式(e2a)所表示之結構單元。 於倍半矽氧烷化合物具有結構單元(A)，且倍半矽氧烷化合物中之全部之上述結構單元(A)中，Re1 均未經(甲基)丙烯醯氧基、乙烯基、或含環氧基之有機基取代之情形時，倍半矽氧烷化合物較佳為必須具有上述式(e2a)所表示且包含上述式(e2a-II)所表示之基作為Re1 之結構單元(B)。 作為Xe 中之碳原子數1以上且6以下之伸烷基，具體而言，例如可列舉：亞甲基、乙烷-1,2-二基、乙烷-1,1-二基、丙烷-1,3-二基、丙烷-1,2-二基、丁烷-1,4-二基、戊烷-1,5-二基、己烷-1,6-二基等。 Xe 中之伸芳基之碳原子數為6以上且12以下，較佳為6以上且10以下。 作為伸芳基之較佳具體例，可列舉：伸鄰苯基、伸間苯基、伸對苯基、萘-1,4-二基、萘-1,5-二基、萘-2,6-二基、聯苯-4,4'-二基等。 作為-Re6 -NH-Re7 -，具體而言，例如可列舉：-CH2 -NH-CH2 -、-(CH2 )2 -NH-(CH2 )2 -、-(CH2 )3 -NH-(CH2 )3 -、-CH2 -NH-(CH2 )2 -、-(CH2 )2 -NH-CH2 -、-(CH2 )2 -NH-(CH2 )3 -、-(CH2 )3 -NH-(CH2 )2 -、-CH2 -NH-(CH2 )3 -、-(CH2 )3 -NH-CH2 -等。 Ye 中之2價環式有機基可為自芳香族環去除2個氫原子所得之基，亦可為自脂肪族環去除2個氫原子所得之基。 於Ye 為包含芳香族環之2價基之情形時，作為2價環式有機基，較佳為自可具有碳原子數1或2之取代基之碳原子數6以上且10以下之芳香族環去除2個氫原子所得之基。作為碳原子數6以上且10以下之芳香族環之較佳例，可列舉：苯環、萘環、甲基苯環、二甲基苯環等。 於Ye 為包含脂肪族環之2價基之情形時，作為2價環式有機基，較佳為自碳原子數5以上且16以下之脂肪族環去除2個氫原子所得之基。作為碳原子數5以上且16以下之脂肪族環之較佳例，可列舉：環戊烷環、環己烷環、環庚烷環、環辛烷環、環壬烷環、環癸烷環、二環戊二烯環、降烷環、降烯環、立方烷(cubane)環、籃烷(basketane)環等。 於Ye 為碳原子數1以上且20以下之鏈狀脂肪族烴基之情形時，該鏈狀脂肪族烴基可為直鏈狀，亦可為支鏈狀，可為飽和烴基，亦可為不飽和烴基。 作為碳原子數1以上且20以下之鏈狀脂肪族烴基之較佳例，可列舉：亞甲基、乙烷-1,2-二基、乙烷-1,1-二基、丙烷-1,3-二基、丙烷-1,2-二基、丙烷-1,3-二基、丙烷-1,2-二基、伸乙烯基、(2-辛烯基)伸乙基、(2,4,6-三甲基-2-壬烯基)伸乙基等伸烷基、具有雙鍵之伸烷基或具有碳原子數1以上且9以下之支鏈之伸烷基。 式(e2a-II)中，作為Ze 為碳原子數1以上且6以下之伸烷基之情形時之較佳例，可列舉：亞甲基、乙烷-1,2-二基、乙烷-1,1-二基、丙烷-1,3-二基、丙烷-1,2-二基、丁烷-1,4-二基、戊烷-1,5-二基、己烷-1,6-二基等。 Ze 中之伸芳基之碳原子數為6以上且12以下，較佳為6以上且10以下。 作為伸芳基之較佳具體例，可列舉：伸鄰苯基、伸間苯基、伸對苯基、萘-1,4-二基、萘-1,5-二基、萘-2,6-二基、聯苯-4,4'-二基等。 式(e2a-II)中，Ae 為(甲基)丙烯醯氧基、乙烯基、或含環氧基之有機基。作為含環氧基之有機基，並無特別限定，例如可列舉：環氧乙烷基、縮水甘油基、及縮水甘油氧基等。 作為式(e2a-I)所表示之基之具體例，例如可列舉Xe 、Be 、Ye 為下表1所示之組合之基。表1中之Ye 具有兩個鍵結鍵。Ye 利用兩個鍵結鍵中之一個與羧基鍵結，利用另一個與Be 鍵結。關於表1中之Be ，亦與Ye 同樣地與Xe 、Ye 鍵結。 [表1] 作為式(e2a-II)所表示之基之具體例，例如可列舉Ze 及Ae 為下表2所示之組合之基。 [表2] 倍半矽氧烷化合物較佳為包含下述式(e2b)所表示之結構單元(a)與下式(e2c)所表示之結構單元(b)。 [化9](式(e2b)中，Re2 表示上述式(e2a-I)所表示之基。式(e2a-I)所表示之基中之Xe 及Ye 不具有(甲基)丙烯醯氧基、乙烯基、及含環氧基之有機基中之任一個基作為取代基。 式(e2c)中，Re3 表示上述式(e2a-II)所表示之基) 作為倍半矽氧烷化合物，例如可列舉含有下述式(e2d)所表示之結構單元(c)之倍半矽氧烷化合物。 [化10](式(e2d)中，Re4 表示上述式(e2a-I)所表示之基，式(e2a-I)所表示之基中之Xe 及Ye 之至少一者具有選自由(甲基)丙烯醯氧基、乙烯基、及含環氧基之有機基所組成之群中之至少1種基作為取代基) 倍半矽氧烷化合物除上述結構單元以外，亦可進而含有下述式(e2e)所表示之結構單元(d)。 [化11](式(e2e)中，Re5 表示碳原子數1以上且12以下之烷基、碳原子數6以上且12以下之芳基、或碳原子數7以上且12以下之芳烷基) 於Re5 為烷基之情形時，例如較佳為甲基、乙基、及正丙基。於Re5 為芳基、或芳烷基之情形時，例如較佳為苯基、苄基、甲苯基、二甲苯基、及萘基。 倍半矽氧烷化合物中，較佳為上述結構單元之中含有至少1個具有式(e2a-I)所表示之基之結構單元。倍半矽氧烷化合物中，於無論哪個結構單元中之式(e2a-I)所表示之基均未經(甲基)丙烯醯氧基、乙烯基、及含環氧基之有機基之任一個取代之情形時，倍半矽氧烷化合物較佳為含有至少1個具有式(e2a-I)所表示之基之結構單元。 倍半矽氧烷化合物中，含有選自由(甲基)丙烯醯氧基、乙烯基、及含環氧基之有機基所組成之群中之至少1種基之結構單元之量較佳為10莫耳%以上，更佳為30莫耳%以上。 倍半矽氧烷化合物中，作為結構單元之含有比，於含有結構單元(a)及結構單元(b)之情形時，(a)：(b)之莫耳比較佳為20：80～80：20。 於倍半矽氧烷化合物含有結構單元(d)之情形時，其含量較佳為10莫耳%以上且80莫耳%以下。 倍半矽氧烷化合物中之倍半矽氧烷骨架係具有通常經過如以三烷氧基矽烷之水解、縮合反應為代表之步驟而生成之通式(RSiO3/2 )n的聚矽氧烷骨架。 通常獲得之倍半矽氧烷化合物之重量平均分子量Mw之範圍為1000以上且10000以下。較佳為1500以上且5000以下。 關於用作原料之三烷氧基矽烷，例如於倍半矽氧烷化合物具有上述結構單元(a)～(d)之情形時，可使用具有相應R取代基之三烷氧基矽烷。可於形成倍半矽氧烷骨架後利用適宜試劑進行修飾而形成所需R取代基。 例如，作為R取代基為(甲基)丙烯醯基之取代三烷氧基矽烷，可列舉：3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三乙氧基矽烷等。該等可單獨使用1種，亦可將2種以上併用。該等之中，就反應性之觀點而言，較佳為3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷。 作為R取代基為芳基或碳原子數1以上且12以下之烷基之取代三烷氧基矽烷，例如可列舉：甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、己基三甲氧基矽烷、己基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、1-萘基三甲氧基矽烷、1-萘基三乙氧基矽烷、對甲氧基苯基三甲氧基矽烷、對甲氧基苯基三乙氧基矽烷等。該等可單獨使用1種，亦可將2種以上併用。該等之中，就耐熱性、反應性之觀點而言，較佳為甲基三甲氧基矽烷、乙基三甲氧基矽烷、苯基三甲氧基矽烷。 於形成倍半矽氧烷骨架後需利用適宜試劑進行修飾而形成所需R取代基，為此，例如預先對倍半矽氧烷導入胺基，修飾該胺基而成為醯胺酸即可。為了對倍半矽氧烷導入胺基，只要使用取代基為胺基之三烷氧基矽烷即可。 作為倍半矽氧烷骨架之製造方法，可列舉對原料三烷氧基矽烷進行水解、縮合之方法。例如作為水解、共縮合之條件，可採用公知條件。於進行水解、共縮合時亦可使用觸媒。作為觸媒，可列舉：氫氧化四丁基銨、氫氧化苄基三甲基銨、氫氧化苄基三乙基銨、氫氧化四甲基銨、氫氧化四丁基銨、鹽酸、硫酸、甲酸、草酸。作為反應條件，例如可列舉：1小時以上且10小時以下、25℃以上且100℃以下。 分散劑(E2)亦可於無損本發明之目的之範圍內與以上說明之倍半矽氧烷化合物以外之其他分散劑組合使用。作為可與倍半矽氧烷化合物一併使用之分散劑，可列舉：聚伸乙基亞胺系、聚胺基甲酸酯樹脂系、丙烯酸系樹脂系等之高分子分散劑。 於將分散劑(E2)與倍半矽氧烷化合物以外之其他分散劑組合使用之情形時，分散劑(E2)中之具有式(e2a)所表示之結構單元之倍半矽氧烷化合物之含量較佳為10質量%以上，更佳為20質量%以上，尤佳為30質量%以上，進而40質量%以上。 另一方面，分散劑(E2)中之具有式(e2a)所表示之結構單元之倍半矽氧烷化合物之含量之上限並無特別限制，例如可設為100質量%以下，亦可設為95質量%以下。 關於以上說明之分散劑(E2)之使用量，相對於著色劑分散液之全部固形物成分之質量，較佳為5質量%以上且70質量%以下，更佳為10質量%以上且60質量%以下，尤佳為15質量%以上且50質量%以下。 又，關於分散劑(E2)之使用量，相對於顏料(E1)100質量份，較佳為10質量份以上且90質量份以下，更佳為20質量份以上且80質量份以下。 ＜分散介質＞ 著色劑分散液通常包含用以使著色劑(E)分散之分散介質。分散介質之種類並無特別限定，典型而言為有機溶劑。 關於作為著色劑分散液中之分散介質而使用之有機溶劑，例如可列舉：乙二醇單甲醚、乙二醇單乙醚、乙二醇正丙醚、乙二醇單正丁基醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丙醚、丙二醇單正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇單甲醚、三丙二醇單乙醚等(聚)伸烷基二醇單烷基醚類；乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等(聚)伸烷基二醇單烷基醚乙酸酯類；二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚、四氫呋喃等其他醚類；甲基乙基酮、環己酮、2-庚酮、3-庚酮等酮類；2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷基酯類；2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、乙酸3-甲基-3-甲氧基丁酯、丙酸3-甲基-3-甲氧基丁酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-側氧丁酸乙酯等其他酯類；甲苯、二甲苯等芳香族烴類；N-甲基吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺類等。該等有機溶劑可單獨使用或將2種以上組合使用。 上述有機溶劑之中，丙二醇單甲醚、乙二醇單甲醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、二乙二醇二甲醚、二乙二醇甲基乙醚、環己酮、乙酸3-甲氧基丁酯由於對下述鹼溶性樹脂、光聚合性單體、及光聚合起始劑顯示出優異之溶解性，並且可優化上述著色劑之分散性，因此較佳，尤佳為使用丙二醇單甲醚乙酸酯、乙酸3-甲氧基丁酯。 關於著色劑分散液中之分散介質之含量，只要為能夠使著色劑(E)良好地分散之範圍，則並無特別限定。分散介質之量較佳為使著色劑分散液之固形物成分濃度成為1質量%以上且50質量%以下之量，更佳為使著色劑分散液之固形物成分濃度成為5質量%以上且30質量%以下之量。 ＜著色劑分散液之製造方法＞ 著色劑分散液可利用三輥磨機、球磨機、砂磨機等攪拌機或混練裝置對顏料(E1)、分散劑(E2)、視需要之染料等其他成分、及分散介質進行混合(分散、混練)，視需要利用例如口徑5 μm左右之膜濾器等過濾器進行過濾而製造。 認為於著色劑分散液之製造中，藉由將顏料(E1)與分散劑(E2)一起於攪拌機或混練裝置中進行混合(分散、混練)，而使顏料(E1)與分散劑(E2)之間發生相互作用，從而獲得良好之顏料分散之效果。 根據上述方法進行顏料(E1)之分散處理後，可對所獲得之分散液加以濃縮、或使用所需溶劑加以稀釋，藉此將著色劑分散液之固形物成分濃度調整為所需濃度。 ≪感光性樹脂組合物≫ 感光性樹脂組合物包含鹼溶性樹脂(A)、光聚合性單體(B)、光聚合起始劑(C)、及上述著色劑分散液。 具備上述構成之感光性樹脂組合物能夠形成氣體產生得到抑制之硬化膜。 以下，對感光性樹脂組合物之必須或任意之成分、與感光性樹脂組合物之製備方法進行說明。 ＜著色劑分散液＞ 作為著色劑分散液，使用上述分散液。關於著色劑分散液之使用量，只要感光性樹脂組合物以所需之色相、色濃度被著色，則並無特別限定。 著色劑分散液之使用量較佳為使顏料(E1)之量相對於感光性樹脂組合物之全部固形物成分之質量，成為5質量%以上且80質量%以下之量，更佳為成為25質量%以上且60質量%以下之量，尤佳為成為30質量%以上且55質量%以下之量。 ＜鹼溶性樹脂(A)＞ 感光性樹脂組合物包含鹼溶性樹脂(A)(本說明書中亦記為「(A)成分」)。 此處，本說明書中，所謂鹼溶性樹脂(A)係指分子內具備具有鹼溶性之官能基(例如，酚性羥基、羧基、磺酸基等)之樹脂。 作為鹼溶性樹脂(A)，可無特別限制地使用先前以來於感光性樹脂組合物中所調配之鹼溶性樹脂。 就容易抑制自使用感光性樹脂組合物所形成之硬化物產生氣體之方面而言，鹼溶性樹脂(A)較佳為包含(A1)具有酚酞基(cardo)結構之樹脂(以下亦記為「(A1)酚酞基樹脂」)。 於本實施形態之感光性樹脂組合物包含(A1)酚酞基樹脂之情形時，尤其對於能夠形成氣體產生得到抑制之硬化物之方面而言，雖然尚不確定，但認為存在以下之影響。 即，首先，(A1)酚酞基樹脂具有酚酞基結構之大體積。 另一方面，於使用感光性樹脂組合物形成硬化膜時，於(A1)酚酞基樹脂與光聚合性單體(B)或下述1分子中具備複數個環氧基或氧雜環丁基之多官能交聯性化合物(D)之間發生交聯。 認為該等影響相互作用，而於使用感光性樹脂組合物形成硬化物時，對具備感光性樹脂組合物之硬化物之積層結構體進行加工而形成各種元件時，及使用具備感光性樹脂組合物之硬化物之各種元件等時，抑制自硬化物產生氣體。 (A1)具有酚酞基骨架之樹脂只要為特定之具有鹼溶性之樹脂，則並無特別限定。所謂酚酞基骨架係指於構成第1環狀結構之1個環碳原子上鍵結有第2環狀結構與第3環狀結構之骨架。再者，第2環狀結構與第3環狀結構可為同一結構，亦可為不同結構。 作為酚酞基骨架之代表例，可列舉於茀環之9位之碳原子上鍵結有2個芳香環(例如苯環)之骨架。 作為(A1)具有酚酞基結構之樹脂，並無特別限定，可使用先前公知之樹脂。其中，較佳為下述式(a-1)所表示之樹脂。 [化12] (a-1) 式(a-1)中，Xa 表示下述式(a-2)所表示之基。m1表示0以上且20以下之整數。 [化13]上述式(a-2)中，Ra1 分別獨立地表示氫原子、碳原子數1以上且6以下之烴基、或鹵素原子，Ra2 分別獨立地表示氫原子或甲基，Ra3 分別獨立地表示直鏈或支鏈之伸烷基，m2表示0或1，Wa 表示下述式(a-3)所表示之基。 [化14]式(a-2)中，作為Ra3 ，較佳為碳原子數1以上且20以下之伸烷基，更佳為碳原子數1以上且10以下之伸烷基，尤佳為碳原子數1以上且6以下之伸烷基，最佳為乙烷-1,2-二基、丙烷-1,2-二基、及丙烷-1,3-二基。 式(a-3)中之環A表示可與芳香族環縮合且可具有取代基之脂肪族環。脂肪族環可為脂肪族烴環，亦可為脂肪族雜環。 作為脂肪族環，可列舉：單環烷烴、聯環烷烴、三環烷烴、四環烷烴等。 具體而言，可列舉：環戊烷、環己烷、環庚烷、環辛烷等單環烷烴、或金剛烷、降烷、異烷、三環癸烷、四環十二烷。 可縮合於脂肪族環上之芳香族環可為芳香族烴環，亦可為芳香族雜環，較佳為芳香族烴環。具體而言，較佳為苯環、及萘環。 作為式(a-3)所表示之2價基之較佳例，可列舉下述基。 [化15]式(a-1)中之2價基Xa 係藉由使提供殘基Za 之四羧酸二酐與下式(a-2a)所表示之二醇化合物進行反應而導入至(A1)酚酞基樹脂中。 [化16]式(a-2a)中，Ra1 、Ra2 、Ra3 、及m2如式(a-2)中之說明。式(a-2a)中之環A如式(a-3)中之說明。 式(a-2a)所表示之二醇化合物例如可藉由以下之方法製造。 首先，視需要根據常規方法將下述式(a-2b)所表示之二醇化合物所具有之酚性羥基中之氫原子取代為-Ra3 -OH所表示之基後，使用表氯醇等進行縮水甘油基化，而獲得下述式(a-2c)所表示之環氧化合物。 繼而，使式(a-2c)所表示之環氧化合物與丙烯酸或甲基丙烯酸進行反應，藉此獲得式(a-2a)所表示之二醇化合物。 式(a-2b)及式(a-2c)中，Ra1 、Ra3 、及m2如式(a-2)中之說明。式(a-2b)及式(a-2c)中之環A如式(a-3)中之說明。 再者，式(a-2a)所表示之二醇化合物之製造方法並不限定於上述方法。 [化17]作為式(a-2b)所表示之二醇化合物之較佳例，可列舉以下之二醇化合物。 [化18]上述式(a-1)中，Ra0 為氫原子或-CO-Ya -COOH所表示之基。此處，Ya 表示自二羧酸酐去除酸酐基(-CO-O-CO-)所得之殘基。作為二羧酸酐之例，可列舉：順丁烯二酸酐、琥珀酸酐、伊康酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基內亞甲基四氫鄰苯二甲酸酐、氯橋酸酐、甲基四氫鄰苯二甲酸酐、戊二酸酐等。 又，上述式(a-1)中，Za 表示自四羧酸二酐去除2個酸酐基所得之殘基。作為四羧酸二酐之例，可列舉：下述式(a-4)所表示之四羧酸二酐、均苯四甲酸二酐、二苯甲酮四羧酸二酐、聯苯四羧酸二酐、聯苯醚四羧酸二酐等。 又，上述式(a-1)中，m表示0以上且20以下之整數。 [化19](式(a-4)中，Ra4 、Ra5 、及Ra6 分別獨立地表示選自由氫原子、碳原子數1以上且10以下之烷基及氟原子所組成之群中之1種，m3表示0以上且12以下之整數) 作為式(a-4)中之Ra4 可選擇之烷基為碳原子數1以上且10以下之烷基。若烷基所具備之碳原子數為該範圍，則可進一步提高所獲得之羧酸酯之耐熱性。於Ra4 為烷基之情形時，其碳原子數就容易獲得耐熱性優異之酚酞基樹脂之方面而言，較佳為1以上且6以下，更佳為1以上且5以下，進而較佳為1以上且4以下，尤佳為1以上且3以下。 於Ra4 為烷基之情形時，該烷基可為直鏈狀，亦可為支鏈狀。 作為式(a-4)中之Ra4 ，就容易獲得耐熱性優異之酚酞基樹脂之方面而言，更佳為分別獨立地為氫原子或碳原子數1以上且10以下之烷基。式(a-4)中之Ra4 更佳為氫原子、甲基、乙基、正丙基或異丙基，尤佳為氫原子或甲基。 式(a-4)中之複數個Ra4 就容易製備高純度之四羧酸二酐之方面而言，較佳為相同之基。 式(a-4)中之m3表示0以上且12以下之整數。藉由將m3之值設為12以下，可容易地精製四羧酸二酐。 就四羧酸二酐易於精製之方面而言，m3之上限較佳為5，更佳為3。 就四羧酸二酐之化學穩定性之方面而言，m3之下限較佳為1，更佳為2。 式(a-4)中之m3尤佳為2或3。 式(a-4)中之作為Ra5 、及Ra6 可選擇之碳原子數1以上且10以下之烷基與作為Ra4 可選擇之碳原子數1以上且10以下之烷基相同。 Ra5 、及Ra6 就四羧酸二酐易於精製之方面而言，較佳為氫原子、或碳原子數1以上且10以下(較佳為1以上且6以下、更佳為1以上且5以下、進而較佳為1以上且4以下、尤佳為1以上且3以下)之烷基，尤佳為氫原子或甲基。 作為式(a-4)所表示之四羧酸二酐，例如可列舉：降烷-2-螺-α-環戊酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐(別名「降烷-2-螺-2'-環戊酮-5'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐」)、甲基降烷-2-螺-α-環戊酮-α'-螺-2''-(甲基降烷)-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環己酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐(別名「降烷-2-螺-2'-環己酮-6'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐」)、甲基降烷-2-螺-α-環己酮-α'-螺-2''-(甲基降烷)-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環丙酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環丁酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環庚酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環辛酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環壬酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環癸酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環十一酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環十二酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環十三酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環十四酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-環十五酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-(甲基環戊酮)-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐、降烷-2-螺-α-(甲基環己酮)-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐等。 (A1)酚酞基樹脂之重量平均分子量較佳為1000以上且40000以下，更佳為2000以上且30000以下。藉由設為上述範圍，不僅可獲得良好之顯影性，且可獲得充分之耐熱性、膜強度。 作為鹼溶性樹脂(A)，亦較佳為使用(A2)丙烯酸系樹脂。(A2)丙烯酸系樹脂可單獨使用，亦可與其他鹼溶性樹脂組合使用。 基於使用(A1)酚酞基樹脂之上述優點，於將(A2)丙烯酸系樹脂與其他鹼溶性樹脂組合使用之情形時，較佳為將(A2)丙烯酸系樹脂與(A1)酚酞基樹脂組合使用。 作為(A2)丙烯酸系樹脂，使用包含源自(甲基)丙烯酸之結構單元、及/或源自(甲基)丙烯酸酯之結構單元之樹脂。(甲基)丙烯酸係丙烯酸、或甲基丙烯酸。(甲基)丙烯酸酯係以下述式(a-5)表示，只要無損本發明之目的，則並無特別限定。 [化20]上述式(a-5)中，Ra7 為氫原子或甲基，Ra8 為一價有機基。該有機基亦可於該有機基中包含雜原子等烴基以外之鍵或取代基。又，該有機基可為直鏈狀、支鏈狀、環狀之任意形狀。 作為Ra8 之有機基中之烴基以外之取代基，只要無損本發明之效果，則並無特別限定，可列舉：鹵素原子、羥基、巰基、硫基、氰基、異氰基、氰酸基、異氰酸基、硫氰酸基、異硫氰酸基、矽烷基、矽烷醇基、烷氧基、烷氧基羰基、胺甲醯基、硫代胺甲醯基、硝基、亞硝基、羧基、羧酸酯基、醯基、醯氧基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦酸基、羥基亞胺基、烷基醚基、烷基硫醚基、芳基醚基、芳基硫醚基、胺基(-NH2 、-NHR、-NRR'：R及R'分別獨立地表示烴基)等。上述取代基所含之氫原子可被取代為烴基。又，上述取代基所含之烴基可為直鏈狀、支鏈狀、及環狀之任意形狀。 作為Ra8 ，較佳為烷基、芳基、芳烷基、或雜環基。該等基可經鹵素原子、羥基、烷基、或雜環基取代。又，於該等基包含伸烷基部分之情形時，伸烷基部分可被醚鍵、硫醚鍵、酯鍵中斷。 於烷基為直鏈狀或支鏈狀之情形時，其碳原子數較佳為1以上且20以下，更佳為1以上且15以下，尤佳為1以上且10以下。作為烷基之較佳例，可列舉：甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、第二戊基、第三戊基、正己基、正庚基、正辛基、異辛基、第二辛基、第三辛基、正壬基、異壬基、正癸基、異癸基等。 於烷基為脂環式基、或包含脂環式基之基之情形時，作為烷基所含之較佳之脂環式基，可列舉：環戊基、及環己基等單環之脂環式基，或金剛烷基、降基、異基、三環壬基、三環癸基、及四環十二烷基等多環之脂環式基。 又，(A2)丙烯酸系樹脂中，亦可進而使(甲基)丙烯酸、及(甲基)丙烯酸酯以外之其他化合物進行聚合。作為此種其他化合物，可列舉：(甲基)丙烯醯胺類、不飽和羧酸類、烯丙基化合物、乙烯醚類、乙烯酯類、苯乙烯類等。該等化合物可單獨使用或將2種以上組合使用。 作為(甲基)丙烯醯胺類，可列舉：(甲基)丙烯醯胺、N-烷基(甲基)丙烯醯胺、N-芳基(甲基)丙烯醯胺、N,N-二烷基(甲基)丙烯醯胺、N,N-二芳基(甲基)丙烯醯胺、N-甲基-N-苯基(甲基)丙烯醯胺、N-羥基乙基-N-甲基(甲基)丙烯醯胺等。 作為不飽和羧酸類，可列舉：丁烯酸等單羧酸；順丁烯二酸、反丁烯二酸、檸康酸、中康酸、伊康酸等二羧酸；該等二羧酸之酸酐等。 作為烯丙基化合物，可列舉：乙酸烯丙酯、己酸烯丙酯、辛酸烯丙酯、月桂酸烯丙酯、棕櫚酸烯丙酯、硬脂酸烯丙酯、苯甲酸烯丙酯、乙醯乙酸烯丙酯、乳酸烯丙酯等烯丙酯類；烯丙氧基乙醇等。 作為乙烯醚類，可列舉：己基乙烯醚、辛基乙烯醚、癸基乙烯醚、乙基己基乙烯醚、甲氧基乙基乙烯醚、乙氧基乙基乙烯醚、氯乙基乙烯醚、1-甲基-2,2-二甲基丙基乙烯醚、2-乙基丁基乙烯醚、羥基乙基乙烯醚、二乙二醇乙烯醚、二甲基胺基乙基乙烯醚、二乙基胺基乙基乙烯醚、丁基胺基乙基乙烯醚、苄基乙烯醚、四氫糠基乙烯醚等烷基乙烯醚；乙烯基苯醚、乙烯基甲苯醚、乙烯基氯苯醚、乙烯基-2,4-二氯苯醚、乙烯基萘基醚、乙烯基鄰胺苯甲醚等乙烯基芳基醚等。 作為乙烯酯類，可列舉：丁酸乙烯酯、異丁酸乙烯酯、乙酸乙烯基三甲酯、乙酸乙烯基二乙酯、特戊酸乙烯酯、己酸乙烯酯、氯乙酸乙烯酯、二氯乙酸乙烯酯、甲氧基乙酸乙烯酯、丁氧基乙酸乙烯酯、乙酸乙烯基苯酯、乙醯乙酸乙烯酯、乳酸乙烯酯、丁酸乙烯基-β-苯酯、苯甲酸乙烯酯、水楊酸乙烯酯、氯苯甲酸乙烯酯、四氯苯甲酸乙烯酯、萘甲酸乙烯酯等。 作為苯乙烯類，可列舉：苯乙烯；甲基苯乙烯、二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、二乙基苯乙烯、異丙基苯乙烯、丁基苯乙烯、己基苯乙烯、環己基苯乙烯、癸基苯乙烯、苄基苯乙烯、氯甲基苯乙烯、三氟甲基苯乙烯、乙氧基甲基苯乙烯、乙醯氧基甲基苯乙烯等烷基苯乙烯；甲氧基苯乙烯、4-甲氧基-3-甲基苯乙烯、二甲氧基苯乙烯等烷氧基苯乙烯；氯苯乙烯、二氯苯乙烯、三氯苯乙烯、四氯苯乙烯、五氯苯乙烯、溴苯乙烯、二溴苯乙烯、碘苯乙烯、氟苯乙烯、三氟苯乙烯、2-溴-4-三氟甲基苯乙烯、4-氟-3-三氟甲基苯乙烯等鹵代苯乙烯等。 (A2)丙烯酸系樹脂中之源自(甲基)丙烯酸之結構單元之量與源自(甲基)丙烯酸酯之結構單元之量係於無損本發明之目的之範圍內無特別限定。關於(A2)丙烯酸系樹脂中之源自(甲基)丙烯酸之結構單元之量，相對於丙烯酸系樹脂之質量，較佳為5質量%以上且50質量%以下，更佳為10質量%以上且30質量%以下。又，關於(A2)丙烯酸系樹脂中之源自(甲基)丙烯酸酯之結構單元之量，相對於丙烯酸系樹脂之質量，較佳為10質量%以上且95質量%以下，更佳為30質量%以上且90質量%以下。 (A2)丙烯酸系樹脂中之源自(甲基)丙烯酸之結構單元之量與源自(甲基)丙烯酸酯之結構單元之量的合計係於無損本發明之目的之範圍內無特別限定，相對於(A2)丙烯酸系樹脂之質量，較佳為5質量%以上且100質量%以下，更佳為10質量%以上且100質量%以下。 (A2)丙烯酸系樹脂之重量平均分子量較佳為2000以上且200000以下，更佳為5000以上且30000以下。藉由設為上述範圍，存在感光性樹脂組合物之膜形成能與曝光後之顯影性容易實現均衡之傾向。 於使用(A1)酚酞基樹脂作為鹼溶性樹脂(A)之情形時，(A1)酚酞基樹脂之質量於鹼溶性樹脂(A)之質量中所占之比率較佳為50質量%以上，更佳為70質量%以上，進而較佳為80質量%以上，尤佳為90質量%以上，最佳為100質量%。 關於鹼溶性樹脂(A)之含量，相對於將下述有機溶劑(S)之質量排除在外之感光性樹脂組合物之質量(全部固形物成分)，較佳為20質量%以上且85質量%以下，更佳為25質量%以上且75質量%以下。藉由設為上述範圍，能夠形成不易產生氣體之硬化膜，容易獲得顯影性優異之感光性樹脂組合物。 ＜光聚合性單體(B)＞ 作為光聚合性單體(B)，可較佳地使用具有乙烯性不飽和基之單體。該具有乙烯性不飽和基之單體包括單官能單體與多官能單體。 作為單官能單體，可列舉：(甲基)丙烯醯胺、羥甲基(甲基)丙烯醯胺、甲氧基甲基(甲基)丙烯醯胺、乙氧基甲基(甲基)丙烯醯胺、丙氧基甲基(甲基)丙烯醯胺、丁氧基甲氧基甲基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥基甲基(甲基)丙烯醯胺、(甲基)丙烯酸、反丁烯二酸、順丁烯二酸、順丁烯二酸酐、伊康酸、伊康酸酐、檸康酸、檸康酸酐、丁烯酸、2-丙烯醯胺-2-甲基丙磺酸、第三丁基丙烯醯胺磺酸、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸2-苯氧基-2-羥基丙酯、鄰苯二甲酸2-(甲基)丙烯醯氧基-2-羥基丙酯、甘油單(甲基)丙烯酸酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3-四氟丙酯、鄰苯二甲酸衍生物之半(甲基)丙烯酸酯等。該等單官能單體可單獨使用或將2種以上組合使用。 另一方面，作為多官能單體，可列舉：乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、2,2-雙(4-(甲基)丙烯醯氧基二乙氧基苯基)丙烷、2,2-雙(4-(甲基)丙烯醯氧基聚乙氧基苯基)丙烷、(甲基)丙烯酸2-羥基-3-(甲基)丙烯醯氧基丙酯、乙二醇二縮水甘油醚二(甲基)丙烯酸酯、二乙二醇二縮水甘油醚二(甲基)丙烯酸酯、鄰苯二甲酸二縮水甘油酯二(甲基)丙烯酸酯、甘油三丙烯酸酯、甘油聚縮水甘油醚聚(甲基)丙烯酸酯、(甲基)丙烯酸胺基甲酸酯(即，甲苯二異氰酸酯、三甲基六亞甲基二異氰酸酯或六亞甲基二異氰酸酯等與(甲基)丙烯酸2-羥基乙酯之反應物)、亞甲基雙(甲基)丙烯醯胺、(甲基)丙烯醯胺亞甲醚、多元醇與N-羥甲基(甲基)丙烯醯胺之縮合物等多官能單體、或三丙烯醯基縮甲醛等。該等多官能單體可單獨使用或將2種以上組合使用。 該等具有乙烯性不飽和基之單體之中，就存在提高感光性樹脂組合物對基板之密接性、感光性樹脂組合物於硬化後之強度的傾向之方面而言，較佳為3官能以上之多官能單體，更佳為4官能以上之多官能單體，進而較佳為5官能以上之多官能單體。 關於光聚合性單體(B)於組合物中之含量，相對於將下述有機溶劑(S)之質量排除在外之感光性樹脂組合物之質量(全部固形物成分)，較佳為1質量%以上且50質量%以下，更佳為5質量%以上且40質量%以下。藉由設為上述範圍，存在感度、顯影性、解像性容易實現均衡之傾向。 ＜光聚合起始劑(C)＞ 作為光聚合起始劑(C)，並無特別限定，可使用先前公知之光聚合起始劑。 作為光聚合起始劑(C)，具體而言，可列舉：1-羥基環己基苯基酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-[4-(2-羥基乙氧基)苯基]-2-羥基-2-甲基-1-丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、1-(4-十二烷基苯基)-2-羥基-2-甲基丙烷-1-酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、雙(4-二甲基胺基苯基)酮、2-甲基-1-[4-(甲硫基)苯基]-2-啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-啉基苯基)-丁烷-1-酮、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]乙酮,1-(O-乙醯基肟)、(9-乙基-6-硝基-9H-咔唑-3-基)[4-(2-甲氧基-1-甲基乙氧基)-2-甲基苯基]甲酮-O-乙醯基肟、2-(苯甲醯氧基亞胺基)-1-[4-(苯硫基)苯基]-1-辛酮、2,4,6-三甲基苯甲醯基二苯基氧化膦、4-苯甲醯基-4'-甲基二甲硫醚、4-二甲基胺基苯甲酸、4-二甲基胺基苯甲酸甲酯、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸丁酯、4-二甲基胺基苯甲酸2-乙基己酯、4-二甲基胺基苯甲酸2-異戊酯、苯偶醯-β-甲氧基乙基縮醛、苯偶醯二甲基縮酮、1-苯基-1,2-丙二酮-2-(O-乙氧基羰基)肟、鄰苯甲醯苯甲酸甲酯、2,4-二乙基9-氧硫、2-氯9-氧硫、2,4-二甲基9-氧硫、1-氯-4-丙氧基9-氧硫、硫、2-氯硫、2,4-二乙基硫、2-甲基硫、2-異丙基硫、2-乙基蒽醌、八甲基蒽醌、1,2-苯并蒽醌、2,3-二苯基蒽醌、偶氮二異丁腈、過氧化苯甲醯、氫過氧化異丙苯、2-巰基苯并咪唑、2-巰基苯并㗁唑、2-巰基苯并噻唑、2-(鄰氯苯基)-4,5-二(間甲氧基苯基)咪唑基二聚物、二苯甲酮、2-氯二苯甲酮、p,p'-雙二甲基胺基二苯甲酮、4,4'-雙二乙基胺基二苯甲酮、4,4'-二氯二苯甲酮、3,3-二甲基-4-甲氧基二苯甲酮、苯偶醯、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香正丁醚、安息香異丁醚、安息香丁醚、苯乙酮、2,2-二乙氧基苯乙酮、對二甲基苯乙酮、對二甲基胺基苯丙酮、二氯苯乙酮、三氯苯乙酮、對第三丁基苯乙酮、對二甲基胺基苯乙酮、對第三丁基三氯苯乙酮、對第三丁基二氯苯乙酮、α,α-二氯-4-苯氧基苯乙酮、9-氧硫、2-甲基9-氧硫、2-異丙基9-氧硫、二苯并環庚酮、4-二甲基胺基苯甲酸戊酯、9-苯基吖啶、1,7-雙-(9-吖啶基)庚烷、1,5-雙-(9-吖啶基)戊烷、1,3-雙-(9-吖啶基)丙烷、對甲氧基三、2,4,6-三(三氯甲基)均三、2-甲基-4,6-雙(三氯甲基)均三、2-[2-(5-甲基呋喃-2-基)乙烯基]-4,6-雙(三氯甲基)均三、2-[2-(呋喃-2-基)乙烯基]-4,6-雙(三氯甲基)均三、2-[2-(4-二乙基胺基-2-甲基苯基)乙烯基]-4,6-雙(三氯甲基)均三、2-[2-(3,4-二甲氧基苯基)乙烯基]-4,6-雙(三氯甲基)均三、2-(4-甲氧基苯基)-4,6-雙(三氯甲基)均三、2-(4-乙氧基苯乙烯基)-4,6-雙(三氯甲基)均三、2-(4-正丁氧基苯基)-4,6-雙(三氯甲基)均三、2,4-雙-三氯甲基-6-(3-溴-4-甲氧基)苯基均三、2,4-雙-三氯甲基-6-(2-溴-4-甲氧基)苯基均三、2,4-雙-三氯甲基-6-(3-溴-4-甲氧基)苯乙烯基苯基均三、2,4-雙-三氯甲基-6-(2-溴-4-甲氧基)苯乙烯基苯基均三等。該等光聚合起始劑可單獨使用或將2種以上組合使用。 該等之中，就感度方面而言，尤佳為使用肟系光聚合起始劑。肟系光聚合起始劑之中，作為尤佳者，可列舉：O-乙醯基-1-[6-(2-甲基苯甲醯基)-9-乙基-9H-咔唑-3-基]乙酮肟、1-[9-乙基-6-(吡咯-2-基羰基)-9H-咔唑-3-基]乙酮,1-(O-乙醯基肟)、及1-[4-(苯硫基)-1,2-辛二酮,2-(O-苯甲醯基肟)]。 作為光聚合起始劑，又，亦較佳為使用下述式(c1)所表示之肟系化合物。 [化21](Rc1 為選自由1價有機基、胺基、鹵素、硝基、及氰基所組成之群中之基， n1為0以上且4以下之整數， n2為0、或1， Rc2 為可具有取代基之苯基、或可具有取代基之咔唑基， Rc3 為氫原子、或碳原子數1以上且6以下之烷基) 式(c1)中，Rc1 於無損本發明之目的之範圍內無特別限定，可自各種有機基中適當選擇。作為Rc1 為有機基之情形時之較佳例，可列舉：烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、飽和脂肪族醯氧基、烷氧基羰基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、胺基、經1個或2個有機基取代之胺基、啉-1-基、及哌-1-基、鹵素、硝基、及氰基等。於n1為2以上且4以下之整數之情形時，Rc1 可相同亦可不同。又，取代基之碳原子數不包括取代基所進而具有之取代基之碳原子數。 於Rc1 為烷基之情形時，較佳為碳原子數1以上且20以下，更佳為碳原子數1以上且6以下。又，於Rc1 為烷基之情形時，可為直鏈，亦可為支鏈。作為Rc1 為烷基之情形時之具體例，可列舉：甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、第二戊基、第三戊基、正己基、正庚基、正辛基、異辛基、第二辛基、第三辛基、正壬基、異壬基、正癸基、及異癸基等。又，於Rc1 為烷基之情形時，烷基可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷基之例，可列舉：甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙氧基乙氧基乙基、及甲氧基丙基等。 於Rc1 為烷氧基之情形時，較佳為碳原子數1以上且20以下，更佳為碳原子數1以上且6以下。又，於Rc1 為烷氧基之情形時，可為直鏈，亦可為支鏈。作為Rc1 為烷氧基之情形時之具體例，可列舉：甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基、正戊氧基、異戊氧基、第二戊氧基、第三戊氧基、正己氧基、正庚氧基、正辛氧基、異辛氧基、第二辛氧基、第三辛氧基、正壬氧基、異壬氧基、正癸氧基、及異癸氧基等。又，於Rc1 為烷氧基之情形時，烷氧基可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷氧基之例，可列舉：甲氧基乙氧基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙氧基乙氧基乙氧基、及甲氧基丙氧基等。 於Rc1 為環烷基、或環烷氧基之情形時，較佳為碳原子數3以上且10以下，更佳為碳原子數3以上且6以下。作為Rc1 為環烷基之情形時之具體例，可列舉：環丙基、環丁基、環戊基、環己基、環庚基、及環辛基等。作為Rc1 為環烷氧基之情形時之具體例，可列舉：環丙氧基、環丁氧基、環戊氧基、環己氧基、環庚氧基、及環辛氧基等。 於Rc1 為飽和脂肪族醯基、或飽和脂肪族醯氧基之情形時，較佳為碳原子數2以上且20以下，更佳為碳原子數2以上且7以下。作為Rc1 為飽和脂肪族醯基之情形時之具體例，可列舉：乙醯基、丙醯基、正丁醯基、2-甲基丙醯基、正戊醯基、2,2-二甲基丙醯基、正己醯基、正庚醯基、正辛醯基、正壬醯基、正癸醯基、正十一碳醯基、正十二碳醯基、正十三碳醯基、正十四碳醯基、正十五碳醯基、及正十六碳醯基等。作為Rc1 為飽和脂肪族醯氧基之情形時之具體例，可列舉：乙醯氧基、丙醯氧基、正丁醯氧基、2-甲基丙醯氧基、正戊醯氧基、2,2-二甲基丙醯氧基、正己醯氧基、正庚醯氧基、正辛醯氧基、正壬醯氧基、正癸醯氧基、正十一碳醯氧基、正十二碳醯氧基、正十三碳醯氧基、正十四碳醯氧基、正十五碳醯氧基、及正十六碳醯氧基等。 於Rc1 為烷氧基羰基之情形時，較佳為碳原子數2以上且20以下，更佳為碳原子數2以上且7以下。作為Rc1 為烷氧基羰基之情形時之具體例，可列舉：甲氧基羰基、乙氧基羰基、正丙氧基羰基、異丙氧基羰基、正丁氧基羰基、異丁氧基羰基、第二丁氧基羰基、第三丁氧基羰基、正戊氧基羰基、異戊氧基羰基、第二戊氧基羰基、第三戊氧基羰基、正己氧基羰基、正庚氧基羰基、正辛氧基羰基、異辛氧基羰基、第二辛氧基羰基、第三辛氧基羰基、正壬氧基羰基、異壬氧基羰基、正癸氧基羰基、及異癸氧基羰基等。 於Rc1 為苯基烷基之情形時，較佳為碳原子數7以上且20以下，更佳為碳原子數7以上且10以下。又，於Rc1 為萘基烷基之情形時，較佳為碳原子數11以上且20以下，更佳為碳原子數11以上且14以下。作為Rc1 為苯基烷基之情形時之具體例，可列舉：苄基、2-苯基乙基、3-苯基丙基、及4-苯基丁基。作為Rc1 為萘基烷基之情形時之具體例，可列舉：α-萘基甲基、β-萘基甲基、2-(α-萘基)乙基、及2-(β-萘基)乙基。於Rc1 為苯基烷基、或萘基烷基之情形時，Rc1 可進而於苯基、或萘基上具有取代基。 於Rc1 為雜環基之情形時，雜環基為包含1個以上之N、S、O之5員或6員之單環，或者為該單環彼此、或該單環與苯環縮合而成之雜環基。於雜環基為縮合環之情形時，環數至多為3。作為構成該雜環基之雜環，可列舉：呋喃、噻吩、吡咯、㗁唑、異㗁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡、嘧啶、嗒、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲哚、苯并咪唑、苯并三唑、苯并㗁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞、㖕啉、及喹㗁啉等。於Rc1 為雜環基之情形時，雜環基可進而具有取代基。 於Rc1 為經1個或2個有機基取代之胺基之情形時，作為有機基之較佳例，可列舉：碳原子數1以上且20以下之烷基、碳原子數3以上且10以下之環烷基、碳原子數2以上且20以下之飽和脂肪族醯基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之碳原子數7以上且20以下之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之碳原子數11以上且20以下之萘基烷基、及雜環基等。該等較佳之有機基之具體例與Rc1 相同。作為經1個或2個有機基取代之胺基之具體例，可列舉：甲基胺基、乙基胺基、二乙基胺基、正丙基胺基、二正丙基胺基、異丙基胺基、正丁基胺基、二正丁基胺基、正戊基胺基、正己基胺基、正庚基胺基、正辛基胺基、正壬基胺基、正癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、正丁醯基胺基、正戊醯基胺基、正己醯基胺基、正庚醯基胺基、正辛醯基胺基、正癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基、及β-萘甲醯基胺基等。 作為Rc1 所含之苯基、萘基及雜環基進而具有取代基之情形時之取代基，可列舉：碳原子數1以上且6以下之烷基、碳原子數1以上且6以下之烷氧基、碳原子數2以上且7以下之飽和脂肪族醯基、碳原子數2以上且7以下之烷氧基羰基、碳原子數2以上且7以下之飽和脂肪族醯氧基、具有碳原子數1以上且6以下之烷基之單烷基胺基、具有碳原子數1以上且6以下之烷基之二烷基胺基、啉-1-基、哌-1-基、鹵素、硝基、及氰基等。於Rc1 所含之苯基、萘基及雜環基進而具有取代基之情形時，該取代基之數量於無損本發明之目的之範圍內無限定，較佳為1以上且4以下。於Rc1 所含之苯基、萘基及雜環基具有複數個取代基之情形時，複數個取代基可相同亦可不同。 Rc1 之中，就化學上穩定、或立體阻礙較小、容易合成肟酯化合物等方面而言，較佳為選自由碳原子數1以上且6以下之烷基、碳原子數1以上且6以下之烷氧基、及碳原子數2以上且7以下之飽和脂肪族醯基所組成之群中之基，更佳為碳原子數1以上且6以下之烷基，尤佳為甲基。 關於Rc1 於苯基上之鍵結位置，於將Rc1 所鍵結之苯基中，苯基與肟酯化合物之主骨架之鍵結鍵之位置設為1位、甲基之位置設為2位的情形時，較佳為4位、或5位，更佳為5位。又，n1較佳為0以上且3以下之整數，更佳為0以上且2以下之整數，尤佳為0、或1。 Rc2 為可具有取代基之苯基、或可具有取代基之咔唑基。又，於Rc2 為可具有取代基之咔唑基之情形時，可將咔唑基上之氮原子取代為碳原子數1以上且6以下之烷基。 Rc2 中，苯基或咔唑基所具有之取代基於無損本發明之目的之範圍內無特別限定。作為苯基或咔唑基於碳原子上可具有之較佳之取代基之例，可列舉：碳原子數1以上且20以下之烷基、碳原子數1以上且20以下之烷氧基、碳原子數3以上且10以下之環烷基、碳原子數3以上且10以下之環烷氧基、碳原子數2以上且20以下之飽和脂肪族醯基、碳原子數2以上且20以下之烷氧基羰基、碳原子數2以上且20以下之飽和脂肪族醯氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯硫基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯氧基、可具有取代基之碳原子數7以上且20以下之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯氧基、可具有取代基之碳原子數11以上且20以下之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、胺基、經1個或2個有機基取代之胺基、啉-1-基、及哌-1-基、鹵素、硝基、及氰基等。 於Rc2 為咔唑基之情形時，作為咔唑基於氮原子上可具有之較佳之取代基之例，可列舉：碳原子數1以上且20以下之烷基、碳原子數3以上且10以下之環烷基、碳原子數2以上且20以下之飽和脂肪族醯基、碳原子數2以上且20以下之烷氧基羰基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之碳原子數7以上且20以下之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之碳原子數11以上且20以下之萘基烷基、可具有取代基之雜環基、及可具有取代基之雜環基羰基等。該等取代基之中，較佳為碳原子數1以上且20以下之烷基，更佳為碳原子數1以上且6以下之烷基，尤佳為乙基。 關於苯基、或咔唑基可具有之取代基之具體例，烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯氧基、可具有取代基之苯基烷基、可具有取代基之萘基烷基、可具有取代基之雜環基、及經1個或2個有機基取代之胺基係與Rc1 相同。 Rc2 中，作為苯基或咔唑基所具有之取代基所含之苯基、萘基及雜環基進而具有取代基之情形時之取代基之例，可列舉：碳原子數1以上且6以下之烷基；碳原子數1以上且6以下之烷氧基；碳原子數2以上且7以下之飽和脂肪族醯基；碳原子數2以上且7以下之烷氧基羰基；碳原子數2以上且7以下之飽和脂肪族醯氧基；苯基；萘基；苯甲醯基；萘甲醯基；經選自由碳原子數1以上且6以下之烷基、啉-1-基、哌-1-基及苯基所組成之群中之基取代的苯甲醯基；具有碳原子數1以上且6以下之烷基之單烷基胺基；具有碳原子數1以上且6以下之烷基之二烷基胺基；啉-1-基；哌-1-基；鹵素；硝基；氰基。於苯基或咔唑基所具有之取代基所含之苯基、萘基及雜環基進而具有取代基之情形時，該取代基之數量於無損本發明之目的之範圍內無限定，較佳為1以上且4以下。於苯基、萘基及雜環基具有複數個取代基之情形時，複數個取代基可相同亦可不同。 Rc2 之中，就容易獲得感度優異之光聚合起始劑之方面而言，較佳為下述式(c2)、或(c3)所表示之基，更佳為下述式(c2)所表示之基，尤佳為下述式(c2)所表示且A為S之基。 [化22](Rc4 為選自由1價有機基、胺基、鹵素、硝基、及氰基所組成之群中之基，A為S或O，n3為0以上且4以下之整數) [化23](Rc5 及Rc6 分別為1價有機基) 於式(c2)中之Rc4 為有機基之情形時，可於無損本發明之目的之範圍內選擇各種有機基。作為式(c2)中Rc4 為有機基之情形時之較佳例，可列舉：碳原子數1以上且6以下之烷基；碳原子數1以上且6以下之烷氧基；碳原子數2以上且7以下之飽和脂肪族醯基；碳原子數2以上且7以下之烷氧基羰基；碳原子數2以上且7以下之飽和脂肪族醯氧基；苯基；萘基；苯甲醯基；萘甲醯基；經選自由碳原子數1以上且6以下之烷基、啉-1-基、哌-1-基及苯基所組成之群中之基取代的苯甲醯基；具有碳原子數1以上且6以下之烷基之單烷基胺基；具有碳原子數1以上且6以下之烷基之二烷基胺基；啉-1-基；哌-1-基；鹵素；硝基；氰基。 Rc4 之中，較佳為苯甲醯基；萘甲醯基；經選自由碳原子數1以上且6以下之烷基、啉-1-基、哌-1-基及苯基所組成之群中之基取代的苯甲醯基；硝基。更佳為苯甲醯基；萘甲醯基；2-甲基苯基羰基；4-(哌-1-基)苯基羰基；4-(苯基)苯基羰基。 又，式(c2)中，n3較佳為0以上且3以下之整數，更佳為0以上且2以下之整數，尤佳為0、或1。於n3為1之情形時，Rc4 之鍵結位置較佳為相對於Rc4 所鍵結之苯基與氧原子或硫原子鍵結之鍵結鍵而為對位。 式(c3)中之Rc5 可於無損本發明之目的之範圍內選擇各種有機基。作為Rc5 之較佳例，可列舉：碳原子數1以上且20以下之烷基、碳原子數3以上且10以下之環烷基、碳原子數2以上且20以下之飽和脂肪族醯基、碳原子數2以上且20以下之烷氧基羰基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之碳原子數7以上且20以下之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之碳原子數11以上且20以下之萘基烷基、可具有取代基之雜環基、及可具有取代基之雜環基羰基等。 Rc5 之中，較佳為碳原子數1以上且20以下之烷基，更佳為碳原子數1以上且6以下之烷基，尤佳為乙基。 式(c3)中之Rc6 於無損本發明之目的之範圍內無特別限定，可自各種有機基中選擇。關於適宜作為Rc6 之基之具體例，可列舉：碳原子數1以上且20以下之烷基、可具有取代基之苯基、可具有取代基之萘基、及可具有取代基之雜環基。作為Rc6 ，該等基之中，更佳為可具有取代基之苯基，尤佳為2-甲基苯基。 作為Rc4 、Rc5 或Rc6 所含之苯基、萘基及雜環基進而具有取代基之情形時之取代基，可列舉：碳原子數1以上且6以下之烷基、碳原子數1以上且6以下之烷氧基、碳原子數2以上且7以下之飽和脂肪族醯基、碳原子數2以上且7以下之烷氧基羰基、碳原子數2以上且7以下之飽和脂肪族醯氧基、具有碳原子數1以上且6以下之烷基之單烷基胺基、具有碳原子數1以上且6以下之烷基之二烷基胺基、啉-1-基、哌-1-基、鹵素、硝基、及氰基等。於Rc4 、Rc5 或Rc6 所含之苯基、萘基及雜環基進而具有取代基之情形時，該取代基之數量於無損本發明之目的之範圍內無限定，較佳為1以上且4以下。於Rc4 、Rc5 或Rc6 所含之苯基、萘基及雜環基具有複數個取代基之情形時，複數個取代基可相同亦可不同。 式(c1)中之Rc3 為氫原子、或碳原子數1以上且6以下之烷基。作為Rc3 ，較佳為甲基、或乙基，更佳為甲基。 式(c1)所表示之肟酯化合物之中，作為特別適宜之化合物，可列舉下述PI-1～PI-42。 [化24][化25][化26][化27][化28][化29]又，作為光聚合起始劑，亦較佳為下述式(c4)所表示之肟酯化合物。 [化30](Rc7 為氫原子、硝基或1價有機基，Rc8 及Rc9 分別為可具有取代基之鏈狀烷基、可具有取代基之環狀有機基、或氫原子，Rc8 與Rc9 亦可相互鍵結而形成環，Rc10 為1價有機基，Rc11 為氫原子、可具有取代基之碳原子數1以上且11以下之烷基、或可具有取代基之芳基，n4為0以上且4以下之整數，n5為0或1) 此處，作為用以製造式(c4)之肟酯化合物之肟化合物，宜為下式(c5)所表示之化合物。 [化31](Rc7 、Rc8 、Rc9 、Rc10 、n4、及n5與式(c4)中相同) 式(c4)及(c5)中，Rc7 為氫原子、硝基或1價有機基。於式(c4)中之茀環上，Rc7 鍵結於與鍵結於-(CO)n5 -所表示之基上之6員芳香環不同的6員芳香環。式(c4)中，Rc7 於茀環上之鍵結位置並無特別限定。於式(c4)所表示之化合物具有1個以上之Rc7 之情形時，就式(c4)所表示之化合物之易合成性等而言，較佳為1個以上之Rc7 中之1個鍵結於茀環中之2位。於Rc7 為複數個之情形時，複數個Rc7 可相同亦可不同。 於Rc7 為有機基之情形時，Rc7 於無損本發明之目的之範圍內無特別限定，自各種有機基中適當選擇。作為Rc7 為有機基之情形時之較佳例，可列舉：烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、飽和脂肪族醯氧基、烷氧基羰基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、經1個或2個有機基取代之胺基、啉-1-基、及哌-1-基等。 於Rc7 為烷基之情形時，烷基之碳原子數較佳為1以上且20以下，更佳為1以上且6以下。又，於Rc7 為烷基之情形時，可為直鏈，亦可為支鏈。作為Rc7 為烷基之情形時之具體例，可列舉：甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、第二戊基、第三戊基、正己基、正庚基、正辛基、異辛基、第二辛基、第三辛基、正壬基、異壬基、正癸基、及異癸基等。又，於Rc7 為烷基之情形時，烷基可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷基之例，可列舉：甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙氧基乙氧基乙基、及甲氧基丙基等。 於Rc7 為烷氧基之情形時，烷氧基之碳原子數較佳為1以上且20以下，更佳為1以上且6以下。又，於Rc7 為烷氧基之情形時，可為直鏈，亦可為支鏈。作為Rc7 為烷氧基之情形時之具體例，可列舉：甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基、正戊氧基、異戊氧基、第二戊氧基、第三戊氧基、正己氧基、正庚氧基、正辛氧基、異辛氧基、第二辛氧基、第三辛氧基、正壬氧基、異壬氧基、正癸氧基、及異癸氧基等。又，於Rc7 為烷氧基之情形時，烷氧基可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷氧基之例，可列舉：甲氧基乙氧基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙氧基乙氧基乙氧基、及甲氧基丙氧基等。 於Rc7 為環烷基或環烷氧基之情形時，環烷基或環烷氧基之碳原子數較佳為3以上且10以下，更佳為3以上且6以下。作為Rc7 為環烷基之情形時之具體例，可列舉：環丙基、環丁基、環戊基、環己基、環庚基、及環辛基等。作為Rc7 為環烷氧基之情形時之具體例，可列舉：環丙氧基、環丁氧基、環戊氧基、環己氧基、環庚氧基、及環辛氧基等。 於Rc7 為飽和脂肪族醯基或飽和脂肪族醯氧基之情形時，飽和脂肪族醯基或飽和脂肪族醯氧基之碳原子數較佳為2以上且21以下，更佳為2以上且7以下。作為Rc7 為飽和脂肪族醯基之情形時之具體例，可列舉：乙醯基、丙醯基、正丁醯基、2-甲基丙醯基、正戊醯基、2,2-二甲基丙醯基、正己醯基、正庚醯基、正辛醯基、正壬醯基、正癸醯基、正十一碳醯基、正十二碳醯基、正十三碳醯基、正十四碳醯基、正十五碳醯基、及正十六碳醯基等。作為Rc7 為飽和脂肪族醯氧基之情形時之具體例，可列舉：乙醯氧基、丙醯氧基、正丁醯氧基、2-甲基丙醯氧基、正戊醯氧基、2,2-二甲基丙醯氧基、正己醯氧基、正庚醯氧基、正辛醯氧基、正壬醯氧基、正癸醯氧基、正十一碳醯氧基、正十二碳醯氧基、正十三碳醯氧基、正十四碳醯氧基、正十五碳醯氧基、及正十六碳醯氧基等。 於Rc7 為烷氧基羰基之情形時，烷氧基羰基之碳原子數較佳為2以上且20以下，更佳為2以上且7以下。作為Rc7 為烷氧基羰基之情形時之具體例，可列舉：甲氧基羰基、乙氧基羰基、正丙氧基羰基、異丙氧基羰基、正丁氧基羰基、異丁氧基羰基、第二丁氧基羰基、第三丁氧基羰基、正戊氧基羰基、異戊氧基羰基、第二戊氧基羰基、第三戊氧基羰基、正己氧基羰基、正庚氧基羰基、正辛氧基羰基、異辛氧基羰基、第二辛氧基羰基、第三辛氧基羰基、正壬氧基羰基、異壬氧基羰基、正癸氧基羰基、及異癸氧基羰基等。 於Rc7 為苯基烷基之情形時，苯基烷基之碳原子數較佳為7以上且20以下，更佳為7以上且10以下。又，於Rc7 為萘基烷基之情形時，萘基烷基之碳原子數較佳為11以上且20以下，更佳為11以上且14以下。作為Rc7 為苯基烷基之情形時之具體例，可列舉：苄基、2-苯基乙基、3-苯基丙基、及4-苯基丁基。作為Rc7 為萘基烷基之情形時之具體例，可列舉：α-萘基甲基、β-萘基甲基、2-(α-萘基)乙基、及2-(β-萘基)乙基。於Rc7 為苯基烷基、或萘基烷基之情形時，Rc7 可進而於苯基、或萘基上具有取代基。 於Rc7 為雜環基之情形時，雜環基為包含1個以上之N、S、O之5員或6員之單環，或者為該單環彼此、或該單環與苯環縮合而成之雜環基。於雜環基為縮合環之情形時，環數至多為3。雜環基可為芳香族基(雜芳基)，亦可為非芳香族基。作為構成該雜環基之雜環，可列舉：呋喃、噻吩、吡咯、㗁唑、異㗁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡、嘧啶、嗒、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲哚、苯并咪唑、苯并三唑、苯并㗁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞、㖕啉、喹㗁啉、哌啶、哌、啉、哌啶、四氫吡喃、及四氫呋喃等。於Rc7 為雜環基之情形時，雜環基可進而具有取代基。 於Rc7 為雜環基羰基之情形時，雜環基羰基所含之雜環基與Rc7 為雜環基之情形時相同。 於Rc7 為經1個或2個有機基取代之胺基之情形時，作為有機基之較佳例，可列舉：碳原子數1以上且20以下之烷基、碳原子數3以上且10以下之環烷基、碳原子數2以上且21以下之飽和脂肪族醯基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之碳原子數7以上且20以下之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之碳原子數11以上且20以下之萘基烷基、及雜環基等。該等較佳之有機基之具體例與Rc7 相同。作為經1個或2個有機基取代之胺基之具體例，可列舉：甲基胺基、乙基胺基、二乙基胺基、正丙基胺基、二正丙基胺基、異丙基胺基、正丁基胺基、二正丁基胺基、正戊基胺基、正己基胺基、正庚基胺基、正辛基胺基、正壬基胺基、正癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、正丁醯基胺基、正戊醯基胺基、正己醯基胺基、正庚醯基胺基、正辛醯基胺基、正癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基、及β-萘甲醯基胺基等。 作為Rc7 所含之苯基、萘基及雜環基進而具有取代基之情形時之取代基，可列舉：碳原子數1以上且6以下之烷基、碳原子數1以上且6以下之烷氧基、碳原子數2以上且7以下之飽和脂肪族醯基、碳原子數2以上且7以下之烷氧基羰基、碳原子數2以上且7以下之飽和脂肪族醯氧基、具有碳原子數1以上且6以下之烷基之單烷基胺基、具有碳原子數1以上且6以下之烷基之二烷基胺基、啉-1-基、哌-1-基、鹵素、硝基、及氰基等。於Rc7 所含之苯基、萘基及雜環基進而具有取代基之情形時，該取代基之數量於無損本發明之目的之範圍內無限定，較佳為1以上且4以下。於Rc7 所含之苯基、萘基及雜環基具有複數個取代基之情形時，複數個取代基可相同亦可不同。 以上說明之基中，作為Rc7 ，若為硝基、或Rc12 -CO-所表示之基，則存在感度提高之傾向，從而較佳。Rc12 於無損本發明之目的之範圍內無特別限定，可自各種有機基中選擇。關於適宜作為Rc12 之基之例，可列舉：碳原子數1以上且20以下之烷基、可具有取代基之苯基、可具有取代基之萘基、及可具有取代基之雜環基。作為Rc12, 該等基之中，尤佳為2-甲基苯基、噻吩-2-基、及α-萘基。 又，若Rc7 為氫原子，則存在透明性變得良好之傾向，從而較佳。再者，若Rc7 為氫原子且Rc10 為下述式(c4a)或(c4b)所表示之基，則存在透明性變得更良好之傾向。 式(c4)中，Rc8 及Rc9 分別為可具有取代基之鏈狀烷基、可具有取代基之環狀有機基、或氫原子。Rc8 與Rc9 亦可相互鍵結而形成環。該等基之中，作為Rc8 及Rc9 ，較佳為可具有取代基之鏈狀烷基。於Rc8 及Rc9 為可具有取代基之鏈狀烷基之情形時，鏈狀烷基可為直鏈烷基，亦可為支鏈烷基。 於Rc8 及Rc9 為不具有取代基之鏈狀烷基之情形時，鏈狀烷基之碳原子數較佳為1以上且20以下，更佳為1以上且10以下，尤佳為1以上且6以下。作為Rc8 及Rc9 為鏈狀烷基之情形時之具體例，可列舉：甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、第二戊基、第三戊基、正己基、正庚基、正辛基、異辛基、第二辛基、第三辛基、正壬基、異壬基、正癸基、及異癸基等。又，於Rc8 及Rc9 為烷基之情形時，烷基可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷基之例，可列舉：甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙氧基乙氧基乙基、及甲氧基丙基等。 於Rc8 及Rc9 為具有取代基之鏈狀烷基之情形時，鏈狀烷基之碳原子數較佳為1以上且20以下，更佳為1以上且10以下，尤佳為1以上且6以下。於該情形時，取代基之碳原子數不包括於鏈狀烷基之碳原子數內。具有取代基之鏈狀烷基較佳為直鏈狀。 烷基可具有之取代基於無損本發明之目的之範圍內無特別限定。作為取代基之較佳例，可列舉：氰基、鹵素原子、環狀有機基、及烷氧基羰基。作為鹵素原子，可列舉：氟原子、氯原子、溴原子、碘原子。該等之中，較佳為氟原子、氯原子、溴原子。作為環狀有機基，可列舉：環烷基、芳香族烴基、雜環基。作為環烷基之具體例，與Rc7 為環烷基之情形時之較佳例相同。作為芳香族烴基之具體例，可列舉：苯基、萘基、聯苯基、蒽基、及菲基等。作為雜環基之具體例，與Rc7 為雜環基之情形時之較佳例相同。於Rc7 為烷氧基羰基之情形時，烷氧基羰基所含之烷氧基可為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。烷氧基羰基所含之烷氧基之碳原子數較佳為1以上且10以下，更佳為1以上且6以下。 於鏈狀烷基具有取代基之情形時，取代基之數量並無特別限定。取代基之較佳數量根據鏈狀烷基之碳原子數而變化。取代基之數量典型而言為1以上且20以下，較佳為1以上且10以下，更佳為1以上且6以下。 於Rc8 及Rc9 為環狀有機基之情形時，環狀有機基可為脂環式基，亦可為芳香族基。作為環狀有機基，可列舉：脂肪族環狀烴基、芳香族烴基、雜環基。於Rc8 及Rc9 為環狀有機基之情形時，環狀有機基可具有之取代基與Rc8 及Rc9 為鏈狀烷基之情形時相同。 於Rc8 及Rc9 為芳香族烴基之情形時，芳香族烴基較佳為苯基，或較佳為由複數個苯環經由碳-碳鍵鍵結形成之基，或較佳為由複數個苯環縮合形成之基。於芳香族烴基為苯基、或者為由複數個苯環鍵結或縮合形成之基之情形時，芳香族烴基所含之苯環之環數並無特別限定，較佳為3以下，更佳為2以下，尤佳為1。作為芳香族烴基之較佳之具體例，可列舉：苯基、萘基、聯苯基、蒽基、及菲基等。 於Rc8 及Rc9 為脂肪族環狀烴基之情形時，脂肪族環狀烴基可為單環式，亦可為多環式。脂肪族環狀烴基之碳原子數並無特別限定，較佳為3以上且20以下，更佳為3以上且10以下。作為單環式之環狀烴基之例，可列舉：環丙基、環丁基、環戊基、環己基、環庚基、環辛基、降基、異基、三環壬基、三環癸基、四環十二烷基、及金剛烷基等。 於Rc8 及Rc9 為雜環基之情形時，雜環基為包含1個以上之N、S、O之5員或6員之單環，或者為該單環彼此、或該單環與苯環縮合而成之雜環基。於雜環基為縮合環之情形時，環數至多為3。雜環基可為芳香族基(雜芳基)，亦可為非芳香族基。作為構成該雜環基之雜環，可列舉：呋喃、噻吩、吡咯、㗁唑、異㗁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡、嘧啶、嗒、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲哚、苯并咪唑、苯并三唑、苯并㗁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞、㖕啉、喹㗁啉、哌啶、哌、啉、哌啶、四氫吡喃、及四氫呋喃等。 Rc8 與Rc9 亦可相互鍵結而形成環。包含Rc8 與Rc9 所形成之環的基較佳為亞環烷基。於Rc8 與Rc9 鍵結形成亞環烷基之情形時，構成亞環烷基之環較佳為5員環～6員環，更佳為5員環。 於Rc8 與Rc9 鍵結形成之基為亞環烷基之情形時，亞環烷基亦可與1個以上之其他環進行縮合。作為可與亞環烷基縮合之環之例，可列舉：苯環、萘環、環丁烷環、環戊烷環、環己烷環、環庚烷環、環辛烷環、呋喃環、噻吩環、吡咯環、吡啶環、吡環、及嘧啶環等。 以上說明之Rc8 及Rc9 之中，作為較佳基之例，可列舉式-A1 -A2 所表示之基。式中，可列舉：A1 為直鏈伸烷基，A2 為烷氧基、氰基、鹵素原子、鹵化烷基、環狀有機基、或烷氧基羰基。 A1 之直鏈伸烷基之碳原子數較佳為1以上且10以下，更佳為1以上且6以下。於A2 為烷氧基之情形時，烷氧基可為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。烷氧基之碳原子數較佳為1以上且10以下，更佳為1以上且6以下。於A2 為鹵素原子之情形時，較佳為氟原子、氯原子、溴原子、碘原子，更佳為氟原子、氯原子、溴原子。於A2 為鹵化烷基之情形時，鹵化烷基所含之鹵素原子較佳為氟原子、氯原子、溴原子、碘原子，更佳為氟原子、氯原子、溴原子。鹵化烷基可為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。於A2 為環狀有機基之情形時，環狀有機基之例與Rc8 及Rc9 以取代基之形式所具有之環狀有機基相同。於A2 為烷氧基羰基之情形時，烷氧基羰基之例與Rc8 及Rc9 以取代基之形式所具有之烷氧基羰基相同。 作為Rc8 及Rc9 之較佳之具體例，可列舉：乙基、正丙基、正丁基、正己基、正庚基、及正辛基等烷基；2-甲氧基乙基、3-甲氧基正丙基、4-甲氧基正丁基、5-甲氧基正戊基、6-甲氧基正己基、7-甲氧基正庚基、8-甲氧基正辛基、2-乙氧基乙基、3-乙氧基正丙基、4-乙氧基正丁基、5-乙氧基正戊基、6-乙氧基正己基、7-乙氧基正庚基、及8-乙氧基正辛基等烷氧基烷基；2-氰基乙基、3-氰基正丙基、4-氰基正丁基、5-氰基正戊基、6-氰基正己基、7-氰基正庚基、及8-氰基正辛基等氰基烷基；2-苯基乙基、3-苯基正丙基、4-苯基正丁基、5-苯基正戊基、6-苯基正己基、7-苯基正庚基、及8-苯基正辛基等苯基烷基；2-環己基乙基、3-環己基正丙基、4-環己基正丁基、5-環己基正戊基、6-環己基正己基、7-環己基正庚基、8-環己基正辛基、2-環戊基乙基、3-環戊基正丙基、4-環戊基正丁基、5-環戊基正戊基、6-環戊基正己基、7-環戊基正庚基、及8-環戊基正辛基等環烷基烷基；2-甲氧基羰基乙基、3-甲氧基羰基正丙基、4-甲氧基羰基正丁基、5-甲氧基羰基正戊基、6-甲氧基羰基正己基、7-甲氧基羰基正庚基、8-甲氧基羰基正辛基、2-乙氧基羰基乙基、3-乙氧基羰基正丙基、4-乙氧基羰基正丁基、5-乙氧基羰基正戊基、6-乙氧基羰基正己基、7-乙氧基羰基正庚基、及8-乙氧基羰基正辛基等烷氧基羰基烷基；2-氯乙基、3-氯正丙基、4-氯正丁基、5-氯正戊基、6-氯正己基、7-氯正庚基、8-氯正辛基、2-溴乙基、3-溴正丙基、4-溴正丁基、5-溴正戊基、6-溴正己基、7-溴正庚基、8-溴正辛基、3,3,3-三氟丙基、及3,3,4,4,5,5,5-七氟正戊基等鹵化烷基。 作為Rc8 及Rc9 ，上述之中，較佳為乙基、正丙基、正丁基、正戊基、2-甲氧基乙基、2-氰基乙基、2-苯基乙基、2-環己基乙基、2-甲氧基羰基乙基、2-氯乙基、2-溴乙基、3,3,3-三氟丙基、及3,3,4,4,5,5,5-七氟正戊基。 作為Rc10 之較佳之有機基之例，與Rc7 同樣地，可列舉：烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、經1個或2個有機基取代之胺基、啉-1-基、及哌-1-基等。該等基之具體例與針對Rc7 所說明者相同。又，作為Rc10 ，亦較佳為環烷基烷基、芳香環上可具有取代基之苯氧基烷基、芳香環上可具有取代基之苯硫基烷基。苯氧基烷基及苯硫基烷基可具有之取代基與Rc7 所含之苯基可具有之取代基相同。 有機基之中，作為Rc10 ，較佳為烷基、環烷基、可具有取代基之苯基、或環烷基烷基、芳香環上可具有取代基之苯硫基烷基。作為烷基，較佳為碳原子數1以上且20以下之烷基，更佳為碳原子數1以上且8以下之烷基，尤佳為碳原子數1以上且4以下之烷基，最佳為甲基。可具有取代基之苯基之中，較佳為甲基苯基，更佳為2-甲基苯基。環烷基烷基所含之環烷基之碳原子數較佳為5以上且10以下，更佳為5以上且8以下，尤佳為5或6。環烷基烷基所含之伸烷基之碳原子數較佳為1以上且8以下，更佳為1以上且4以下，尤佳為2。環烷基烷基之中，較佳為環戊基乙基。芳香環上可具有取代基之苯硫基烷基所含之伸烷基之碳原子數較佳為1以上且8以下，更佳為1以上且4以下，尤佳為2。芳香環上可具有取代基之苯硫基烷基之中，較佳為2-(4-氯苯硫基)乙基。 又，作為Rc10 ，亦較佳為-A3 -CO-O-A4 所表示之基。A3 為2價有機基，較佳為2價烴基，較佳為伸烷基。A4 為1價有機基，較佳為1價烴基。 於A3 為伸烷基之情形時，伸烷基可為直鏈狀，亦可為支鏈狀，較佳為直鏈狀。於A3 為伸烷基之情形時，伸烷基之碳原子數較佳為1以上且10以下，更佳為1以上且6以下，尤佳為1以上且4以下。 作為A4 之較佳例，可列舉：碳原子數1以上且10以下之烷基、碳原子數7以上且20以下之芳烷基、及碳原子數6以上且20以下之芳香族烴基。作為A4 之較佳之具體例，可列舉：甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、正己基、苯基、萘基、苄基、苯乙基、α-萘基甲基、及β-萘基甲基等。 作為-A3 -CO-O-A4 所表示之基之較佳之具體例，可列舉：2-甲氧基羰基乙基、2-乙氧基羰基乙基、2-正丙氧基羰基乙基、2-正丁氧基羰基乙基、2-正戊氧基羰基乙基、2-正己氧基羰基乙基、2-苄氧基羰基乙基、2-苯氧基羰基乙基、3-甲氧基羰基正丙基、3-乙氧基羰基正丙基、3-正丙氧基羰基正丙基、3-正丁氧基羰基正丙基、3-正戊氧基羰基正丙基、3-正己氧基羰基正丙基、3-苄氧基羰基正丙基、及3-苯氧基羰基正丙基等。 以上對Rc10 進行了說明，作為Rc10 ，較佳為下述式(c4a)或(c4b)所表示之基。 [化32](式(c4a)及(c4b)中，Rc13 及Rc14 分別為有機基，n6為0以上且4以下之整數，於Rc13 及R8 存在於苯環上之鄰接位置之情形時，Rc13 與Rc14 可相互鍵結而形成環，n7為1以上且8以下之整數，n8為1以上且5以下之整數，n9為0以上且(n8＋3)以下之整數，Rc15 為有機基) 關於式(c4a)中之Rc13 及Rc14 之有機基之例與Rc7 相同。作為Rc13 ，較佳為烷基或苯基。於Rc13 為烷基之情形時，其碳原子數較佳為1以上且10以下，更佳為1以上且5以下，尤佳為1以上且3以下，最佳為1。即，Rc13 最佳為甲基。於Rc13 與Rc14 鍵結而形成環之情形時，該環可為芳香族環，亦可為脂肪族環。作為式(c4a)所表示之基中之Rc13 與Rc14 形成環之基之較佳例，可列舉：萘-1-基、或1,2,3,4-四氫萘-5-基等。上述式(c4a)中，n6為0以上且4以下之整數，較佳為0或1，更佳為0。 上述式(c4b)中，Rc15 為有機基。作為有機基，可列舉與關於Rc7 所說明之有機基相同之基。有機基之中，較佳為烷基。烷基可為直鏈狀，亦可為支鏈狀。烷基之碳原子數較佳為1以上且10以下，更佳為1以上且5以下，尤佳為1以上且3以下。作為Rc15 ，可較佳地例示：甲基、乙基、丙基、異丙基、丁基等，該等之中，更佳為甲基。 上述式(c4b)中，n8為1以上且5以下之整數，較佳為1以上且3以下之整數，更佳為1或2。上述式(c4b)中，n9為0以上且(n8＋3)以下，較佳為0以上且3以下之整數，更佳為0以上且2以下之整數，尤佳為0。上述式(c4b)中，n7為1以上且8以下之整數，較佳為1以上且5以下之整數，更佳為1以上且3以下之整數，尤佳為1或2。 式(c4)中，Rc11 為氫原子、可具有取代基之碳原子數1以上且11以下之烷基、或可具有取代基之芳基。作為Rc11 為烷基之情形時可具有之取代基，可較佳地例示：苯基、萘基等。又，作為Rc7 為芳基之情形時可具有之取代基，可較佳地例示：碳原子數1以上且5以下之烷基、烷氧基、鹵素原子等。 式(c4)中，作為Rc11 ，可較佳地例示：氫原子、甲基、乙基、正丙基、異丙基、正丁基、苯基、苄基、甲基苯基、萘基等，該等之中，更佳為甲基或苯基。 作為式(c4)所表示之化合物之較佳具體例，可列舉以下之PI-43～PI-83。 [化33][化34]關於光聚合起始劑(C)之含量，相對於將下述有機溶劑(S)之質量排除在外之感光性樹脂組合物之質量(全部固形物成分)，較佳為0.5質量%以上且30質量%以下，更佳為1質量%以上且20質量%以下。藉由將光聚合起始劑(C)之含量設為上述範圍，可獲得不易產生圖案形狀不良之感光性樹脂組合物。 又，亦可對光聚合起始劑(C)組合光起始助劑。作為光起始助劑，可列舉：三乙醇胺、甲基二乙醇胺、三異丙醇胺、4-二甲基胺基苯甲酸甲酯、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸異戊酯、4-二甲基胺基苯甲酸2-乙基己酯、苯甲酸2-二甲基胺基乙酯、N,N-二甲基對甲苯胺、4,4'-雙(二甲基胺基)二苯甲酮、9,10-二甲氧基蒽、2-乙基-9,10-二甲氧基蒽、9,10-二乙氧基蒽、2-乙基-9,10-二乙氧基蒽、2-巰基苯并噻唑、2-巰基苯并㗁唑、2-巰基苯并咪唑、2-巰基-5-甲氧基苯并噻唑、3-巰基丙酸、3-巰基丙酸甲酯、季戊四醇四巰基乙酸酯、3-巰基丙酸酯等硫醇化合物等。該等光起始助劑可單獨使用或將2種以上組合使用。 ＜多官能交聯性化合物(D)＞ 感光性樹脂組合物較佳為包含多官能交聯性化合物(D)。多官能交聯性化合物(D)係於1分子中具備複數個環氧基或氧雜環丁基之交聯性之化合物。 又，多官能交聯性化合物(D)之環氧當量或氧雜環丁基當量較佳為50 g/eq以上且350 g/eq以下。 藉由感光性樹脂組合物包含具有此種範圍之環氧當量或氧雜環丁基當量之多官能交聯性化合物，而於使用感光性樹脂組合物形成硬化膜時，鹼溶性樹脂(A)緊密交聯，特別容易抑制自硬化膜產生氣體。 又，就該效果更顯著之方面而言，多官能交聯性化合物(D)之環氧當量或氧雜環丁基當量更佳為60 g/eq以上且320 g/eq以下，進而較佳為70 g/eq以上且300 g/eq以下，尤佳為75 g/eq以上且280 g/eq以下。 就形成硬化膜時之交聯反應性之方面而言，多官能交聯性化合物(D)較佳為包含每1分子中具有2個以上之環氧基之環氧化合物，更佳為包含每1分子中具有3個以上之環氧基之環氧化合物。 多官能交聯性化合物(D)中，每1分子中具有2個以上之環氧基之環氧化合物之含量較佳為50質量%以上，更佳為70質量%以上，進而較佳為80質量%以上，尤佳為90質量%以上，最佳為100質量%。 作為多官能交聯性化合物(D)，只要環氧當量或氧雜環丁基當量為特定範圍內，則可使用先前各種硬化性組合物中所調配之多官能環氧化合物或多官能氧雜環丁烷化合物。 多官能交聯性化合物(D)所含之多官能環氧化合物或多官能氧雜環丁烷化合物之分子量於無損本發明之目的之範圍內無特別限定。多官能環氧化合物或多官能氧雜環丁烷化合物之分子量就立體阻礙較少、容易使鹼溶性樹脂(A)之分子鏈間高效率地交聯之方面而言，較佳為5000以下，更佳為4500以下，尤佳為4000以下。 該分子量之下限值無特別限定，例如為150以上。 多官能交聯性化合物(D)可為包含芳香族基之化合物，亦可為不含芳香族基之化合物。就容易獲得能夠形成氣體產生較少之硬化物之感光性樹脂組合物之方面而言，多官能交聯性化合物(D)較佳為不含芳香族基之化合物。 作為較佳之多官能交聯性化合物(D)之一例，可列舉具有脂環式環氧基之多官能之脂環式環氧化合物。作為該脂環式環氧化合物之具體例，可列舉：2-(3,4-環氧環己基-5,5-螺-3,4-環氧)環己烷間二㗁烷、己二酸雙(3,4-環氧環己基甲基)酯、己二酸雙(3,4-環氧-6-甲基環己基甲基)酯、3',4'-環氧-6'-甲基環己烷羧酸3,4-環氧-6-甲基環己酯、ε-己內酯改性3',4'-環氧環己烷羧酸3,4-環氧環己基甲酯、三甲基己內酯改性3',4'-環氧環己烷羧酸3,4-環氧環己基甲酯、β-甲基-δ-戊內酯改性3',4'-環氧環己烷羧酸3,4-環氧環己基甲酯、亞甲基雙(3,4-環氧環己烷)、乙二醇之二(3,4-環氧環己基甲基)醚、伸乙基雙(3,4-環氧環己烷羧酸酯)、及具有三環氧化癸烯基之多官能環氧化合物、或下述式(d1-1)～(d1-5)所表示之化合物。 該等脂環式環氧化合物可單獨使用，亦可將2種以上混合使用。 [化35](式(d1-1)中，Z表示單鍵或連結基(具有1個以上之原子之二價基)。Rd1 ～Rd18 分別獨立地為選自由氫原子、鹵素原子、及有機基所組成之群中之基) 作為連結基Z，例如可列舉：選自由2價烴基、-O-、-O-CO-、-S-、-SO-、-SO2 -、-CBr2 -、-C(CBr3 )2 -、-C(CF3 )2 -、及-Rd19 -O-CO-所組成之群中之2價基及由該等複數個鍵結而成之基等。 關於作為連結基Z之二價烴基，例如可列舉：碳原子數1以上且18以下之直鏈狀或支鏈狀之伸烷基、二價脂環式烴基等。作為碳原子數1以上且18以下之直鏈狀或支鏈狀之伸烷基，例如可列舉：亞甲基、甲基亞甲基、二甲基亞甲基、二亞甲基、三亞甲基等。作為上述二價脂環式烴基，例如可列舉：1,2-伸環戊基、1,3-伸環戊基、亞環戊基、1,2-伸環己基、1,3-伸環己基、1,4-伸環己基、亞環己基等伸環烷基(包括亞環烷基)等。 Rd19 為碳原子數1以上且8以下之伸烷基，較佳為亞甲基或伸乙基。 [化36](式(d1-2)中，Rd1 ～Rd12 為選自由氫原子、鹵素原子、及有機基所組成之群中之基) [化37](式(d1-3)中，Rd1 ～Rd10 為選自由氫原子、鹵素原子、及有機基所組成之群中之基。Rd2 及Rd8 可相互鍵結) [化38](式(d1-4)中，Rd1 ～Rd12 為選自由氫原子、鹵素原子、及有機基所組成之群中之基。Rd2 及Rd10 可相互鍵結) [化39](式(d1-5)中，Rd1 ～Rd12 為選自由氫原子、鹵素原子、及有機基所組成之群中之基) 式(d1-1)～(d1-5)中，於Rd1 ～Rd18 為有機基之情形時，有機基於無損本發明之目的之範圍內無特別限定，可為烴基，亦可為包含碳原子與鹵素原子之基，亦可為包含碳原子及氫原子以及如鹵素原子、氧原子、硫原子、氮原子、矽原子之雜原子之類的基。作為鹵素原子之例，可列舉：氯原子、溴原子、碘原子、及氟原子等。 作為有機基，較佳為烴基、包含碳原子、氫原子及氧原子之基、鹵化烴基、包含碳原子、氧原子及鹵素原子之基、包含碳原子、氫原子、氧原子及鹵素原子之基。於有機基為烴基之情形時，烴基可為芳香族烴基，亦可為脂肪族烴基，亦可為包含芳香族骨架與脂肪族骨架之基。有機基之碳原子數較佳為1以上且20以下，更佳為1以上且10以下，尤佳為1以上且5以下。 作為烴基之具體例，可列舉：甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、正己基、正庚基、正辛基、2-乙基己基、正壬基、正癸基、正十一烷基、正十三烷基、正十四烷基、正十五烷基、正十六烷基、正十七烷基、正十八烷基、正十九烷基、及正二十烷基等鏈狀烷基；乙烯基、1-丙烯基、2-正丙烯基(烯丙基)、1-正丁烯基、2-正丁烯基、及3-正丁烯基等鏈狀烯基；環丙基、環丁基、環戊基、環己基、及環庚基等環烷基；苯基、鄰甲苯基、間甲苯基、對甲苯基、α-萘基、β-萘基、聯苯-4-基、聯苯-3-基、聯苯-2-基、蒽基、及菲基等芳基；苄基、苯乙基、α-萘基甲基、β-萘基甲基、α-萘基乙基、及β-萘基乙基等芳烷基。 鹵化烴基之具體例如下：氯甲基、二氯甲基、三氯甲基、溴甲基、二溴甲基、三溴甲基、氟甲基、二氟甲基、三氟甲基、2,2,2-三氟乙基、五氟乙基、七氟丙基、全氟丁基、及全氟戊基、全氟己基、全氟庚基、全氟辛基、全氟壬基、及全氟癸基等鹵化鏈狀烷基；2-氯環己基、3-氯環己基、4-氯環己基、2,4-二氯環己基、2-溴環己基、3-溴環己基、及4-溴環己基等鹵化環烷基；2-氯苯基、3-氯苯基、4-氯苯基、2,3-二氯苯基、2,4-二氯苯基、2,5-二氯苯基、2,6-二氯苯基、3,4-二氯苯基、3,5-二氯苯基、2-溴苯基、3-溴苯基、4-溴苯基、2-氟苯基、3-氟苯基、4-氟苯基等鹵化芳基；2-氯苯基甲基、3-氯苯基甲基、4-氯苯基甲基、2-溴苯基甲基、3-溴苯基甲基、4-溴苯基甲基、2-氟苯基甲基、3-氟苯基甲基、4-氟苯基甲基等鹵化芳烷基。 包含碳原子、氫原子及氧原子之基之具體例如下：羥基甲基、2-羥基乙基、3-羥基正丙基、及4-羥基正丁基等羥基鏈狀烷基；2-羥基環己基、3-羥基環己基、及4-羥基環己基等鹵化環烷基；2-羥基苯基、3-羥基苯基、4-羥基苯基、2,3-二羥基苯基、2,4-二羥基苯基、2,5-二羥基苯基、2,6-二羥基苯基、3,4-二羥基苯基、及3,5-二羥基苯基等羥基芳基；2-羥基苯基甲基、3-羥基苯基甲基、及4-羥基苯基甲基等羥基芳烷基；甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基、正戊氧基、正己氧基、正庚氧基、正辛氧基、2-乙基己氧基、正壬氧基、正癸氧基、正十一烷氧基、正十三烷氧基、正十四烷氧基、正十五烷氧基、正十六烷氧基、正十七烷氧基、正十八烷氧基、正十九烷氧基、及正二十烷氧基等鏈狀烷氧基；乙烯氧基、1-丙烯氧基、2-正丙烯氧基(烯丙氧基)、1-正丁烯氧基、2-正丁烯氧基、及3-正丁烯氧基等鏈狀烯氧基；苯氧基、鄰甲苯氧基、間甲苯氧基、對甲苯氧基、α-萘氧基、β-萘氧基、聯苯-4-基氧基、聯苯-3-基氧基、聯苯-2-基氧基、蒽氧基、及菲氧基等芳氧基；苄氧基、苯乙氧基、α-萘基甲氧基、β-萘基甲氧基、α-萘基乙氧基、及β-萘基乙氧基等芳烷氧基；甲氧基甲基、乙氧基甲基、正丙氧基甲基、2-甲氧基乙基、2-乙氧基乙基、2-正丙氧基乙基、3-甲氧基正丙基、3-乙氧基正丙基、3-正丙氧基正丙基、4-甲氧基正丁基、4-乙氧基正丁基、及4-正丙氧基正丁基等烷氧基烷基；甲氧基甲氧基、乙氧基甲氧基、正丙氧基甲氧基、2-甲氧基乙氧基、2-乙氧基乙氧基、2-正丙氧基乙氧基、3-甲氧基正丙氧基、3-乙氧基正丙氧基、3-正丙氧基正丙氧基、4-甲氧基正丁氧基、4-乙氧基正丁氧基、及4-正丙氧基正丁氧基等烷氧基烷氧基；2-甲氧基苯基、3-甲氧基苯基、及4-甲氧基苯基等烷氧基芳基；2-甲氧基苯氧基、3-甲氧基苯氧基、及4-甲氧基苯氧基等烷氧基芳氧基；甲醯基、乙醯基、丙醯基、丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、及癸醯基等脂肪族醯基；苯甲醯基、α-萘甲醯基、及β-萘甲醯基等芳香族醯基；甲氧基羰基、乙氧基羰基、正丙氧基羰基、正丁氧基羰基、正戊氧基羰基、正己基羰基、正庚氧基羰基、正辛氧基羰基、正壬氧基羰基、及正癸氧基羰基等鏈狀烷氧基羰基；苯氧基羰基、α-萘氧基羰基、及β-萘氧基羰基等芳氧基羰基；甲醯氧基、乙醯氧基、丙醯氧基、丁醯氧基、戊醯氧基、己醯氧基、庚醯氧基、辛醯氧基、壬醯氧基、及癸醯氧基等脂肪族醯氧基；苯甲醯氧基、α-萘甲醯氧基、及β-萘甲醯氧基等芳香族醯氧基。 Rd1 ～Rd18 較佳為分別獨立地為選自由氫原子、鹵素原子、碳原子數1以上且5以下之烷基、及碳原子數1以上且5以下之烷氧基所組成之群中之基，尤其就容易形成機械特性優異之硬化膜之方面而言，更佳為Rd1 ～Rd18 均為氫原子。 式(d1-2)～(d1-5)中，Rd1 ～Rd12 與式(d1-1)中之Rd1 ～Rd12 相同。式(d1-2)及式(d1-4)中，作為Rd2 及Rd10 相互鍵結之情形時所形成之2價基，例如可列舉：-CH2 -、-C(CH3 )2 -。式(d1-3)中，作為Rd2 及Rd8 相互鍵結之情形時所形成之2價基，例如可列舉：-CH2 -、-C(CH3 )2 -。 式(d1-1)所表示之脂環式環氧化合物之中，作為化合物之較佳具體例，可列舉：下述式(d1-1a)、式(d1-1b)及式(d1-1c)所表示之脂環式環氧化合物、或2,2-雙(3,4-環氧環己烷-1-基)丙烷[＝2,2-雙(3,4-環氧環己基)丙烷]等。 [化40]式(d1-2)所表示之脂環式環氧化合物之中，作為化合物之較佳具體例，可列舉：下述式(d1-2a)所表示之聯環壬二烯二環氧化物、或二環壬二烯二環氧化物等。 [化41]式(d1-3)所表示之脂環式環氧化合物之中，作為化合物之較佳具體例，可列舉：S螺[3-氧雜三環[3.2.1.02,4 ]辛烷-6,2'-環氧乙烷]等。 式(d1-4)所表示之脂環式環氧化合物之中，作為化合物之較佳具體例，可列舉：二氧化4-乙烯基環己烯、二氧化二戊烯、二氧化檸檬烯、1-甲基-4-(3-甲基環氧乙烷-2-基)-7-氧雜聯環[4.1.0]庚烷等。 式(d1-5)所表示之脂環式環氧化合物之中，作為化合物之較佳具體例，可列舉：1,2,5,6-二環氧環辛烷等。 作為以上說明之脂環式環氧化合物以外之可較佳地用作多官能交聯性化合物(D)之環氧化合物之例，可列舉：雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、雙酚AD型環氧樹脂、萘型環氧樹脂、及聯苯型環氧樹脂等二官能環氧樹脂；苯酚酚醛清漆型環氧樹脂、溴化苯酚酚醛清漆型環氧樹脂、鄰甲酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、及雙酚AD酚醛清漆型環氧樹脂等酚醛清漆環氧樹脂；二環戊二烯型酚樹脂之環氧化物等環式脂肪族環氧樹脂；萘型酚樹脂之環氧化物等芳香族環氧樹脂；9,9-雙[4-(縮水甘油氧基)苯基]-9H-茀、9,9-雙[4-[2-(縮水甘油氧基)乙氧基]苯基]-9H-茀、9,9-雙[4-[2-(縮水甘油氧基)乙基]苯基]-9H-茀、9,9-雙[4-(縮水甘油氧基)-3-甲基苯基]-9H-茀、9,9-雙[4-(縮水甘油氧基)-3,5-二甲基苯基]-9H-茀、及9,9-雙(6-縮水甘油氧基萘-2-基)-9H-茀等含環氧基之茀化合物；二聚酸縮水甘油酯、及三縮水甘油酯等縮水甘油酯型環氧樹脂；四縮水甘油基胺基二苯基甲烷、三縮水甘油基對胺基苯酚、四縮水甘油基間苯二甲胺、及四縮水甘油基雙胺基甲基環己烷等縮水甘油基胺型環氧樹脂；異氰尿酸三縮水甘油酯等雜環式環氧樹脂；間苯三酚三縮水甘油醚、三羥基聯苯基三縮水甘油醚、三羥基苯基甲烷三縮水甘油醚、甘油三縮水甘油醚、2-[4-(2,3-環氧丙氧基)苯基]-2-[4-[1,1-雙[4-(2,3-環氧丙氧基)苯基]乙基]苯基]丙烷、及1,3-雙[4-[1-[4-(2,3-環氧丙氧基)苯基]-1-[4-[1-[4-(2,3-環氧丙氧基)苯基]-1-甲基乙基]苯基]乙基]苯氧基]-2-丙醇等三官能型環氧樹脂；四羥基苯基乙烷四縮水甘油醚、四縮水甘油基二苯甲酮、雙間苯二酚四縮水甘油醚、及四縮水甘油氧基聯苯基等四官能型環氧樹脂；2,2-雙(羥基甲基)-1-丁醇之1,2-環氧-4-(2-環氧乙烷基)環己烷加成物。2,2-雙(羥基甲基)-1-丁醇之1,2-環氧-4-(2-環氧乙烷基)環己烷加成物之相關市售品為EHPE-3150(Daicel公司製造)。 作為可較佳地用作多官能交聯性化合物(D)之氧雜環丁烷化合物，可列舉：雙-1-乙基-3-氧雜環丁基甲醚、1,4-雙-3-乙基氧雜環丁烷-3-基甲氧基甲基苯等二官能以上之氧雜環丁烷化合物。 進而，下述式(d1-6)所表示之化合物可較佳地用作多官能交聯性化合物(D)。 [化42](式(d1-6)中，Rd20 ～Rd22 為直鏈狀、支鏈狀或環狀之伸烷基、伸芳基、-O-、-C(=O)-、-NH-及包含該等之組合之基，分別可相同亦可不同。E1 ～E3 為選自由環氧基、氧雜環丁基、乙烯性不飽和基、烷氧基矽烷基、異氰酸基、封端異氰酸基、硫醇基、羧基、羥基及琥珀酸酐基所組成之群中之至少1種取代基或氫原子。其中，E1 ～E3 中之至少2個為選自由環氧基及氧雜環丁基所組成之群中之至少1種) 式(d1-6)中，Rd20 與E1 、Rd21 與E2 、及Rd22 與E3 所表示之基較佳為例如至少兩者分別為下述式(d1-6a)所表示之基，更佳為各者均為下述式(d1-6a)所表示之基。一化合物上鍵結之複數個式(d1-6a)所表示之基較佳為相同之基。 -L-Cd (d1-6a) (式(d1-6a)中，L為直鏈狀、支鏈狀或環狀之伸烷基、伸芳基、-O-、-C(=O)-、-NH-及包含該等之組合之基，Cd 為選自由環氧基及氧雜環丁基所組成之群中之至少1種。式(d1-6a)中，L與Cd 可鍵結而形成環狀結構) 式(d1-6a)中，關於作為L之直鏈狀、支鏈狀或環狀之伸烷基，較佳為碳原子數1以上且10以下之伸烷基。又，關於作為L之伸芳基，較佳為碳原子數5以上且10以下之伸芳基。式(d1-6a)中，L較佳為直鏈狀之碳原子數1以上且3以下之伸烷基、伸苯基、-O-、-C(=O)-、-NH-及包含該等之組合之基，較佳為亞甲基等直鏈狀之碳原子數1以上且3以下之伸烷基及伸苯基之至少1種、或包含該等與-O-、-C(=O)-及NH-之至少1種之組合的基。 式(d1-6a)中，作為L與Cd 鍵結而形成環狀結構之情形，例如支鏈狀伸烷基與環氧基鍵結而形成環狀結構(脂環結構且具有環氧基之結構)之情形，可列舉下述式(d1-6b)或(d1-6c)所表示之有機基。 [化43](式(d1-6b)中，Rd23 為氫原子或甲基) 以下，作為式(d1-6)所表示之化合物之例，例示具有選自由環氧乙烷基、氧雜環丁基、及脂環式環氧基所組成之群中之至少1種基之環氧化合物之例，但並不限定於該等。 [化44]又，作為可較佳地用作多官能交聯性化合物(D)之化合物，可列舉分子內具有2個以上之縮水甘油基之矽氧烷化合物(以下亦簡記為「矽氧烷化合物」)。 矽氧烷化合物係分子內具有由矽氧烷鍵(Si-O-Si)構成之矽氧烷骨架、與2個以上之縮水甘油基的化合物。 作為矽氧烷化合物中之矽氧烷骨架，例如可列舉環狀矽氧烷骨架或聚矽氧烷骨架(例如，直鏈狀或支鏈狀之聚矽氧(直鏈狀或支鏈狀聚矽氧烷)、或者籠型或梯型之聚倍半矽氧烷等)等。 作為矽氧烷化合物，其中，較佳為具有下述式(d1-7)所表示之環狀矽氧烷骨架之化合物(以下有時稱為「環狀矽氧烷」)。 [化45]式(d1-7)中，Rd24 、及Rd25 表示含有縮水甘油基之一價基或烷基。其中，式(d1-7)所表示之化合物中之x1個Rd24 及x1個Rd25 之中，至少2個為含有縮水甘油基之一價基。又，式(d1-7)中之x1表示3以上之整數。再者，式(d1-7)所表示之化合物中之Rd24 、Rd25 可相同亦可不同。又，複數個Rd24 可相同亦可不同。複數個Rd25 亦可相同亦可不同。 作為上述含有縮水甘油基之一價基，較佳為-D-O-Rd26 所表示之縮水甘油醚基[D表示伸烷基，Rd26 表示縮水甘油基]。作為上述D(伸烷基)，例如可列舉：亞甲基、甲基亞甲基、二甲基亞甲基、二亞甲基、三亞甲基等碳原子數1以上且18以下之直鏈狀或支鏈狀之伸烷基等。 作為上述烷基，例如可列舉：甲基、乙基、丙基、異丙基等碳原子數1以上且18以下(較佳為碳原子數1以上且6以下、尤佳為碳原子數1以上且3以下)之直鏈狀或支鏈狀之烷基。 式(d1-7)中之x1表示3以上之整數。x1就形成硬化膜時之交聯反應性優異之方面而言，較佳為3以上且6以下之整數。 矽氧烷化合物於分子內具有之縮水甘油基之數量為2個以上。縮水甘油基之數量就形成硬化膜時之交聯反應性優異之方面而言，較佳為2個以上且6個以下，尤佳為2個以上且4個以下。 感光性樹脂組合物除含有式(d1-7)所表示之矽氧烷化合物以外，亦可含有：含脂環式環氧基之環狀矽氧烷、日本專利特開2008-248169號公報中記載之含脂環式環氧基之聚矽氧樹脂、及日本專利特開2008-19422號公報中記載之1分子中具有至少2個環氧官能性基之有機聚倍半矽氧烷樹脂等具有矽氧烷骨架之化合物。 作為矽氧烷化合物，更具體而言，可列舉下述式所表示之分子內具有2個以上之縮水甘油基之環狀矽氧烷等。又，作為矽氧烷化合物，例如可使用商品名「X-40-2670」、「X-40-2701」、「X-40-2728」、「X-40-2738」、「X-40-2740」(以上由信越化學工業公司製造)等市售品。 [化46]關於多官能交聯性化合物(D)之含量，相對於將下述有機溶劑(S)之質量排除在外之感光性樹脂組合物之質量(全部固形物成分)，較佳為1質量%以上且40質量%以下，更佳為3質量%以上且30質量%以下。藉由將多官能交聯性化合物(D)之含量設為上述範圍，容易獲得能夠形成氣體產生較少之硬化膜之感光性樹脂組合物。 感光性樹脂組合物中之鹼溶性樹脂(A)之含量[g]與多官能交聯性化合物(D)之含量[g]之比較佳為15：1～0.5：1之範圍內，更佳為10：1～1：1之範圍內，進而較佳為8：1～2：1之範圍內。藉由以該範圍內之比率使用鹼溶性樹脂(A)與多官能交聯性化合物(D)，尤其容易獲得能夠形成氣體產生較少之硬化膜之感光性樹脂組合物。 ＜氟系樹脂(F)＞ 感光性樹脂組合物亦可包含氟系樹脂(F)(以下亦稱為「(F)成分」)。於感光性樹脂組合物含有氟系樹脂(F)之情形時，對使用感光性樹脂組合物所形成之硬化膜賦予撥液性。 例如，於具備使用感光性樹脂組合物所形成之障壁之有機EL元件用基板上，於由障壁所劃分之區域內藉由噴墨法等印刷法形成發光層之情形時，藉由障壁排斥墨水，可防止墨水附著於障壁上或於向由障壁圍成之區域內注入墨水時與鄰接之像素發生墨水之混合。 氟系樹脂(F)只要為含有氟原子且可對使用感光性樹脂組合物所形成之硬化膜賦予撥液性之樹脂，則並無特別限定。氟系樹脂(F)可為包含氟原子之單體之均聚物、或包含氟原子之單體與不含氟原子之單體之共聚物。 作為氟系樹脂(F)之較佳例，可列舉至少使(f1)具有乙烯性不飽和基及氟原子之單體與(f2)(甲基)丙烯酸進行共聚合而獲得之共聚物。於使用此種氟系樹脂(F)之情形時，使用感光性樹脂組合物而容易形成撥液性優異之硬化膜、尤其是撥液性優異之有機EL元件用障壁。 ((f1)具有乙烯性不飽和基及氟原子之單體) 具有乙烯性不飽和基及氟原子之單體(以下亦稱為「(f1)單體」)只要具有乙烯性不飽和基與氟原子，則並無特別限定。作為此種(f1)單體，可列舉下式(f1-1)所表示之化合物等。該等(f1)單體可單獨使用或將2種以上組合使用。 [化47]式(f1-1)中，X1 及X2 分別獨立地表示氫原子或氟原子，X3 表示氫原子、氟原子、甲基、或全氟甲基，X4 及X5 表示氫原子、氟原子、或全氟甲基。Rf表示碳原子數1以上且40以下之含氟烷基或碳原子數2以上且100以下之具有醚鍵之含氟烷基，a表示0以上且3以下之整數，b及c分別獨立地表示0或1。於Rf為含氟烷基之情形時，碳原子數較佳為2以上且20以下，更佳為3以上且10以下，尤佳為4以上且6以下。於Rf為具有醚鍵之含氟烷基之情形時，碳原子數較佳為2以上且50以下，更佳為3以上且20以下，尤佳為4以上且6以下。 自(f1)單體衍生之單元之含量相對於氟系樹脂(F)之質量而較佳為30質量%以上80質量%以下、更佳為40質量%以上60質量%以下之範圍。於將氟系樹脂(F)中之自(f1)單體衍生之單元之含量設為上述範圍之情形時，存在由感光性樹脂組合物容易形成撥液性優異之硬化膜，感光性樹脂組合物中之氟系樹脂(F)與其他成分之相溶性變得良好之傾向。 又，(f1)單體較佳為具有-(CF2 )t F(t＝1以上且10以下)所表示之基。t更佳為1以上且8以下，進而較佳為2以上且6以下。於(f1)單體具有上述基之情形時，由感光性樹脂組合物容易形成撥液性優異之硬化膜。 ＜(f2)(甲基)丙烯酸＞ 氟系樹脂(F)為了提高感光性樹脂組合物之顯影性，較佳為包含源自具有羧基之單體即(f2)(甲基)丙烯酸之單元。 源自(f2)(甲基)丙烯酸之單元之含量相對於氟系樹脂(F)之質量而較佳為0.1質量%以上且20質量%以下。於將氟系樹脂(F)中之源自(f2)(甲基)丙烯酸之單元之含量設為上述範圍之情形時，容易獲得能夠形成顯影性良好且撥液性優異之硬化膜之感光性樹脂組合物。 視需要亦可於氟系樹脂(F)上共聚合上述(f1)單體及(f2)單體以外之其他單體。作為此種其他單體，可列舉以下記述之各種單體。 ((f3)具有乙烯性不飽和基及環氧基之單體) 氟系樹脂(F)較佳為進而使具有乙烯性不飽和基及環氧基之單體(以下亦稱為「(f3)單體」)進行共聚合而獲得之共聚物。藉由使(f3)單體進行共聚合，可進一步提高由感光性樹脂組合物所形成之硬化膜之撥液性。 作為(f3)單體，可列舉：(甲基)丙烯酸縮水甘油酯、下述式(f3-1)～(f3-3)所表示之脂環式環氧化合物、使(甲基)丙烯酸之羧基與二官能以上之環氧化合物之環氧基反應獲得之單體、使側鏈具有羥基或羧基之丙烯酸系單體之羥基或羧基與二官能以上之環氧化合物之環氧基反應獲得之單體等。其中，較佳為(甲基)丙烯酸縮水甘油酯。該等(f3)單體可單獨使用或將2種以上組合使用。 [化48]式(f3-1)、(f3-2)、(f3-3)中，Rf0 表示氫原子或碳原子數1以上且6以下之烷基，Rf1 表示氫原子或甲基，u表示1以上且10以下之整數，v及w分別獨立地表示1以上且3以下之整數。 於氟系樹脂(F)包含源自(f3)單體之單元之情形時，氟系樹脂(F)中之該單元之含量相對於氟系樹脂(F)之質量而較佳為1質量%以上且40質量%以下，更佳為5質量%以上且15質量%以下。於將氟系樹脂(F)中之源自(f3)單體之單元之含量設為上述範圍之情形時，容易獲得能夠形成撥液性良好之硬化膜之感光性樹脂組合物。 ((f4)具有式(f4-1)所表示之結構之單體) 氟系樹脂(F)較佳為進而使具有乙烯性不飽和基及下述式(f4-1)所表示之結構之單體(以下亦稱為「(f4)單體」)進行共聚合而獲得之共聚物。藉由使(f4)單體進行共聚合，容易獲得顯影性優異之感光性樹脂組合物，可提高感光性樹脂組合物中之氟系樹脂(F)與其他成分之相溶性。 [化49](f4)單體更佳為具有乙烯性不飽和基及下述式(f4-2)所表示之結構。 [化50]式(f4-1)、(f4-2)中，Rf2 表示碳原子數1以上且5以下之伸烷基，可為直鏈狀亦可為支鏈狀。其中，較佳為碳原子數1以上且3以下之伸烷基，最佳為伸乙基。Rf3 表示氫原子、羥基、或可具有取代基之碳原子數1以上且20以下之烷基，可為直鏈狀亦可為支鏈狀。其中，較佳為碳原子數1以上且3以下之烷基，最佳為甲基。作為上述取代基，可列舉：羧基、羥基、碳原子數1以上且5以下之烷氧基等。x表示1以上之整數，較佳為1以上且60以下之整數，更佳為1以上且12以下之整數。 作為此種(f4)單體，可列舉下述式(f4-3)所表示之化合物等。該等(f4)單體可單獨使用或將2種以上組合使用。 [化51]式(f4-3)中，Rf4 表示氫原子或甲基。Rf2 、Rf3 、x與上述式(f4-1)、(f4-2)中同義。 自(f4)單體衍生之單元之含量相對於氟系樹脂(F)之質量而較佳為1質量%以上且40質量%以下、更佳為5質量%以上且25質量%以下之範圍。藉由設為上述範圍，存在感光性樹脂組合物之顯影性、或感光性樹脂組合物中之氟系樹脂(F)與其他成分之相溶性變得良好之傾向，從而較佳。 ((f5)具有矽原子之單體) 氟系樹脂(F)較佳為進而使具有矽原子之單體(以下亦稱為「(f5)單體」)進行共聚合而獲得之共聚物。(f5)單體只要具有乙烯性不飽和基及鍵結於矽原子上之至少1個烷氧基，則並無特別限定。藉由使該(f5)單體進行共聚合，可進一步提高由感光性樹脂組合物所形成之硬化膜之撥液性。 作為此種(f5)單體，可列舉下述式(f5-1)所表示之化合物等。該等(f5)單體可單獨使用或將2種以上組合使用。 [化52]式(f5-1)中，Rf5 表示氫原子或碳原子數1以上且10以下之烷基，較佳為氫原子或甲基。Rf6 表示碳原子數1以上且20以下之伸烷基或伸苯基，較佳為碳原子數1以上且10以下之伸烷基。Rf7 、Rf8 分別獨立地表示碳原子數1以上且10以下之烷基或苯基，較佳為碳原子數1以上且3以下之烷基。於Si上鍵結有複數個Rf7 之情形時，該複數個Rf7 可相同亦可不同。又，於Si上鍵結有複數個(ORf8 )之情形時，該複數個(ORf8 )可相同亦可不同。p為0或1，較佳為1。q為1以上且3以下之整數，較佳為2或3，更佳為3。 自(f5)單體衍生之單元之含量相對於氟系樹脂(F)之質量而較佳為20質量%以下、更佳為10質量%以下之範圍。藉由設為上述範圍，存在撥液性及與感光性樹脂組合物之其他成分之相溶性變得良好之傾向，從而較佳。 作為上述單體以外之其他單體，可使用具有乙烯性不飽和基之各種單體，其中，較佳為丙烯酸系單體。作為丙烯酸系單體之較佳例，可列舉：甲基丙烯酸2-羥基乙酯(HEMA)、N-羥基甲基丙烯醯胺(N-MAA)、甲基丙烯酸甲酯(MAA)、甲基丙烯酸環己酯(CHMA)、甲基丙烯酸異酯(IBMA)等。氟系樹脂(F)中之源自該等其他單體之單元之含量相對於氟系樹脂(F)之質量而較佳為0質量%以上且25質量%以下。 作為使(f1)單體及(f2)單體以及視需要之其他單體進行反應而獲得共聚物之方法，可使用公知方法。 氟系樹脂(F)之質量平均分子量較佳為2000以上且50000以下，更佳為5000以上且20000以下。藉由將氟系樹脂(F)之質量平均分子量設為2000以上，可提高由感光性樹脂組合物所形成之硬化膜之耐熱性及強度，又，藉由設為50000以下，可提高感光性樹脂組合物之顯影性。 關於感光性樹脂組合物中之氟系樹脂(F)之含量，相對於將下述有機溶劑(S)之質量排除在外之感光性樹脂組合物之質量(全部固形物成分)，較佳為0.1質量%以上且10質量%以下，更佳為0.2質量%以上且5質量%以下。於感光性樹脂組合物以此種量含有氟系樹脂(F)之情形時，可優化感光性樹脂組合物之感度、顯影性及解像性，且容易對使用感光性樹脂組合物所形成之硬化膜賦予良好之撥液性。 ＜有機溶劑(S)＞ 感光性樹脂組合物為了改善塗佈性或調整黏度，較佳為包含有機溶劑(S)。 作為有機溶劑(S)，具體而言，可列舉：乙二醇單甲醚、乙二醇單乙醚、乙二醇單正丙醚、乙二醇單正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丙醚、丙二醇單正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇單甲醚、三丙二醇單乙醚等(聚)伸烷基二醇單烷基醚類；乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯(PGMEA)、丙二醇單乙醚乙酸酯等(聚)伸烷基二醇單烷基醚乙酸酯類；二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚、四氫呋喃等其他醚類；甲基乙基酮、環己酮、2-庚酮、3-庚酮等酮類；2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷基酯類；2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、乙酸3-甲氧基丁酯、乙酸3-甲基-3-甲氧基丁酯、丙酸3-甲基-3-甲氧基丁酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-側氧丁酸乙酯等其他酯類；甲苯、二甲苯等芳香族烴類；N-甲基-2-吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基異丁基醯胺、N,N-二乙基乙醯胺、N,N-二乙基甲醯胺、N-甲基己內醯胺、1,3-二甲基-2-咪唑啶酮、吡啶、及N,N,N',N'-四甲基脲等含氮極性有機溶劑等。 該等之中，較佳為伸烷基二醇單烷基醚類、伸烷基二醇單烷基醚乙酸酯類、上述其他醚類、乳酸烷基酯類、上述其他酯類，更佳為伸烷基二醇單烷基醚乙酸酯類、上述其他醚類、上述其他酯類。 又，就各成分之溶解性或著色劑(E)之分散性等方面而言，有機溶劑(S)亦較佳為包含含氮極性有機溶劑。 該等溶劑可單獨使用或將2種以上組合使用。 有機溶劑(S)之含量並無特別限定，於能夠於基板等上進行塗佈之濃度範圍內，根據塗佈膜厚而適當設定。感光性樹脂組合物之黏度較佳為5 cp以上且500 cp以下，更佳為10 cp以上且50 cp以下，進而較佳為20 cp以上且30 cp以下。又，固形物成分濃度較佳為5質量%以上且75質量%，更佳為10質量%以上且60質量%以下，進而較佳為15質量%以上且45質量%以下。 ＜其他成分＞ 感光性樹脂組合物視需要可含有界面活性劑、密接性提高劑、熱聚合抑制劑、消泡劑、矽烷偶合劑等添加劑。各添加劑均可使用先前公知者。 感光性樹脂組合物就容易形成形狀良好、且對基板之密接性優異之硬化膜之方面而言，較佳為包含矽烷偶合劑。作為矽烷偶合劑，可無特別限制地使用先前已知之矽烷偶合劑。 作為界面活性劑，可列舉：陰離子系、陽離子系、非離子系等之化合物，作為熱聚合抑制劑，可列舉：氫醌、氫醌單乙醚等，作為消泡劑，可列舉：聚矽氧系、氟系化合物等。 ＜感光性樹脂組合物之製造方法＞ 關於以上說明之感光性樹脂組合物，只要為可將鹼溶性樹脂(A)、光聚合性單體(B)、光聚合起始劑(C)、著色劑分散液、及視需要之其他任意成分以感光性樹脂組合物之固形物成分濃度成為所需值之方式均勻混合之方法，則並無特別限定。 較佳之製造方法包括如下步驟： 藉由使上述顏料(E1)於上述分散劑(E2)之存在下分散於分散介質中而準備上述著色劑分散液； 將所獲得之著色劑分散液、鹼溶性樹脂(A)、光聚合性單體(B)、及光聚合起始劑(C)進行混合。 關於準備著色劑分散液之步驟，如以上說明之著色劑分散液之製造方法。 關於將著色劑分散液、鹼溶性樹脂(A)、光聚合性單體(B)、及光聚合起始劑(C)混合之步驟，只要為可將該等成分均勻混合之方法，則並無特別限定。 於感光性樹脂組合物包含有機溶劑(S)之情形時，該等成分可同時或分批被添加至有機溶劑(S)中。於將該等感光性樹脂組合物之成分分批添加至有機溶劑(S)之情形時，各成分之添加順序並無特別限定。 於將著色劑分散液、鹼溶性樹脂(A)、光聚合性單體(B)、及光聚合起始劑(C)混合時，視需要將該等成分以外之任意成分與該等成分一起進行混合。 將分別為特定量之上述各成分混合後，利用攪拌機均勻地進行混合，藉此獲得感光性樹脂組合物。再者，亦可使用過濾器進行過濾以使所獲得之感光性樹脂組合物變得更均勻。 ≪硬化物、及有機EL元件≫ 對以上說明之感光性樹脂組合物進行曝光、或曝光後進行加熱而使之硬化，藉此形成硬化物。 典型而言，使使用感光性樹脂組合物所形成之塗佈膜硬化而形成硬化物。 作為硬化物之用途，可列舉絕緣膜。於感光性樹脂組合物包含著色劑(E)之情形時，形成經著色之絕緣膜。尤其於著色劑(E)為遮光劑之情形時，形成遮光性之絕緣膜。 作為遮光性之黑色絕緣膜之較佳例，可列舉各種圖像顯示裝置用面板所具備之黑矩陣中之黑色間隔壁或黑管柱隔片。 又，於感光性樹脂組合物包含RGB等彩色之著色劑(E)之情形時，於經黑矩陣劃分之區域形成經著色之膜形態之硬化物而可製造彩色濾光片。 例如上述黑矩陣、或包含作為硬化物之彩色硬化膜之彩色濾光片適用於各種顯示裝置。 又，如上所述，自該硬化物產生之氣體較少。因此，使用感光性樹脂組合物所形成之硬化物適宜用作有機EL元件中之發光層之劃分用障壁。 障壁係以和ITO等電極層與包含有機發光材料之發光層接觸之方式形成於有機EL元件用基板上。藉由利用障壁對發光層進行劃分而形成像素。此處，電極層或發光層若受到自障壁產生之包含各種成分之氣體之污染，則有促進劣化之擔憂。 然而，認為若應用使用以上說明之感光性樹脂組合物所形成之硬化膜作為障壁，則抑制自障壁產生氣體，因此電極層或發光層不易劣化，有機EL元件之耐久性提高。即，可期待具備使用以上說明之感光性樹脂組合物所形成之硬化膜作為障壁之有機EL元件具有優異之耐久性。 又，具備使用以上說明之感光性樹脂組合物所形成之障壁之基板可用作有機EL元件用基板。若使用該有機EL元件用基板，則可製造電極層或發光層之劣化得到抑制之耐久性優異之有機EL元件。 ≪硬化物之製造方法≫ 作為硬化物之製造方法，只要為可使感光性樹脂組合物之薄膜中之光聚合性單體(B)聚合之方法，則並無特別限定。為了使光聚合性單體(B)聚合而通常進行曝光。 又，於感光性樹脂組合物包含多官能交聯性化合物(D)之情形時，為了使鹼溶性樹脂(A)與多官能交聯性化合物(D)進行交聯反應，較佳為對經曝光或未曝光之感光性樹脂組合物之薄膜進行加熱。 作為硬化物之較佳製造方法，可列舉包括如下步驟之方法： 藉由塗佈感光性樹脂組合物而形成塗佈膜；及 對塗佈膜進行曝光。 有機EL元件等各種圖像顯示元件中，於形成經著色之膜形態之硬化物之情形時，硬化物多經圖案化。 於形成經圖案化之硬化物之情形時，典型而言，採用包括如下步驟之方法： 藉由塗佈感光性樹脂組合物而形成塗佈膜； 位置選擇性地對塗佈膜進行曝光；及 將經曝光之塗佈膜進行顯影。 為了使用感光性樹脂組合物形成硬化膜，於根據硬化膜之用途而選擇之基板上塗佈感光性樹脂組合物而形成塗佈膜。塗佈膜之形成方法並無特別限定，例如可使用輥式塗佈機、反向塗佈機、棒式塗佈機等接觸轉印型塗佈裝置、或旋轉塗佈機(旋轉式塗佈裝置)、淋幕式平面塗裝機等非接觸型塗佈裝置進行。 所塗佈之感光性樹脂組合物視需要經過乾燥而構成塗佈膜。乾燥方法並無特別限定，例如可列舉：(1)利用加熱板於80℃以上且120℃以下、較佳為90℃以上且100℃以下之溫度下乾燥60秒以上且120秒以下之方法，(2)於室溫下放置數小時～數天之方法，(3)於溫風加熱器或紅外線加熱器中放置數十分鐘～數小時而去除溶劑之方法等。 繼而，對塗佈膜進行曝光。曝光係照射紫外線、準分子雷射光等活性能量線而進行。曝光例如可藉由隔著負型光罩進行曝光之方法等位置選擇性地進行。照射之能量線量根據感光性樹脂組合物之組成而異，例如較佳為40 mJ/cm2 以上且200 mJ/cm2 以下左右。 於塗佈膜經位置選擇性地曝光之情形時，利用顯影液將曝光後之膜進行顯影，藉此形成所需之圖案形狀。顯影方法並無特別限定，例如可採用浸漬法、噴射法等。顯影液根據感光性樹脂組合物之組成而適當選擇。作為顯影液，例如可使用氫氧化鈉、氫氧化鉀、碳酸鈉、氨、四級銨鹽等鹼性水溶液。 於感光性樹脂組合物包含多官能交聯性化合物(D)之情形時，較佳為繼而對經曝光之塗佈膜、或顯影後之經圖案化之塗佈膜進行加熱，而形成硬化物。 該硬化係藉由加熱使鹼溶性樹脂(A)與多官能交聯性化合物(D)進行交聯反應。因此，為了進行硬化，對經曝光之塗佈膜、或顯影後之經圖案化之塗佈膜進行烘烤。 烘烤溫度只要可使硬化良好地進行，則並無特別限定，較佳為180℃以上且280℃以下，更佳為190℃以上且260℃以下。 如上般進行烘烤，藉此獲得於加熱下硬化之感光性樹脂組合物之硬化物。 ≪製造有機EL元件中之發光層之劃分用障壁之方法≫ 製造有機EL元件中之發光層之劃分用障壁之方法只要為能夠於有機EL元件用基板上之特定位置製造障壁之方法，則無特別限定。 作為較佳方法，可列舉包括如下步驟之方法： 藉由塗佈感光性樹脂組合物而於有機EL元件用基板上形成塗佈膜； 位置選擇性地對塗佈膜中與障壁之位置對應之部位進行曝光； 將經曝光之塗佈膜進行顯影；及 視需要藉由加熱使經顯影之塗佈膜硬化。 作為基板之典型例，可列舉於主面之一側之與發光層形成部位對應之部位具備包含ITO等之透明電極層(陽極)的透明基板。 障壁係以與透明電極層之端部連接、且包圍發光層形成區域之方式形成。 關於對有機EL元件用基板塗佈感光性樹脂組合物之方法、位置選擇性地對塗佈膜中與障壁之位置對應之部位進行曝光之方法、將經曝光之塗佈膜進行顯影之方法、使經顯影之塗佈膜硬化之方法，與上文針對硬化膜之製造方法所說明之方法相同。 藉由以上說明之方法，獲得於有機EL元件用基板之特定位置具備發光層之劃分用障壁之基板。 ≪有機EL元件之製造方法≫ 使用以上說明之具備包含感光性樹脂組合物之硬化物之障壁的有機EL元件用基板，製造有機EL元件。 該方法包括於有機EL元件用基板中之由障壁所劃分之區域內形成發光層的步驟。 具備障壁之有機EL元件用基板於由障壁所劃分之區域內露出包含ITO等之透明電極層(陽極)。 典型方法係於電極層(陽極)上積層電洞傳輸層。繼而，於電洞傳輸層上依序積層電子傳輸層與電極層(陰極)，而製造有機EL元件。視需要進而適當組合TFT或彩色濾光片等。 於由障壁所劃分之區域內形成電洞傳輸層、發光層、電子傳輸層等之方法並無特別限定，可為蒸鍍法或印刷法。就層形成用材料之損耗較少、或容易於特定位置快速形成所需膜厚之層之方面而言，較佳為印刷法，作為印刷法，尤佳為噴墨法。 藉由以上方法製造之有機EL元件由於具備氣體產生較少之障壁，故而抑制電極層或發光層之劣化，耐久性優異。 [實施例] 以下，揭示實施例而更具體地說明本發明，但本發明之範圍並不限定於該等實施例。 [製備例1] 使3-胺基丙基三甲氧基矽烷(0.027莫耳)、及六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐之混合物(MH700G，新日本理化公司製造)(0.027莫耳)溶解於甲基異丁基酮24 g，於室溫下攪拌1小時。藉由氣相層析法確認MH700G消失後，蒸餾去除甲基異丁基酮，獲得下述3種矽烷化合物之混合物。 [化53]向具備攪拌裝置及溫度計之反應容器內添加甲基異丁基酮100 g、氫氧化四甲基銨之濃度20質量%之水溶液7.4 g(氫氧化四甲基銨0.02莫耳)、及蒸餾水20.8 g(1.49莫耳)。 繼而，於40～45℃下緩慢地向反應容器內添加藉由上述方法獲得之矽烷化合物之混合物68.7 g(0.20莫耳)、3-丙烯醯氧基丙基三甲氧基矽烷46.9 g(0.20莫耳)、及苯基三甲氧基矽烷29.7 g(0.10莫耳)後，將反應容器之內容物於同一溫度下攪拌3小時而進行反應。 反應時，向反應容器內添加甲基異丁基酮100 g，繼而，向反應容器內逐次添加蒸餾水50 g，反覆水洗有機層直至水層之pH值變為約7。 對洗淨之有機層添加碳酸鈉而使之乾燥後，過濾有機層。自經過濾之有機層蒸餾去除甲基異丁基酮，獲得包含以下結構單元(i)～(v)之用作分散劑(E2)之倍半矽氧烷化合物。 倍半矽氧烷中，結構單元(i)～(iii)之合計含量為40莫耳%，結構單元(iv)之含量為40莫耳%，結構單元(v)之含量為20莫耳%。 [化54][製備例2] 將下述式所表示之環氧化合物275 g(0.5莫耳，環氧當量292)、2,6-二第三丁基-4-甲基苯酚100 mg及丙烯酸72 g連同觸媒一起添加至1500 mL四口燒瓶中，一面向其中以25 mL/min之速度吹送空氣一面於90～100℃下進行加熱溶解。 [化55]繼而，於溶液白濁之狀態下緩慢升溫，加熱至120℃而使之完全溶解。此時，溶液已逐漸變得透明黏稠，但仍繼續攪拌。於此期間，測定酸值，持續加熱攪拌直至酸值未達1.0 mgKOH/g。酸值達到目標值需12小時。繼而，冷卻至室溫，獲得無色透明且固體狀之下式結構之雙酚茀型環氧丙烯酸酯。 [化56]繼而，對如此獲得之上述雙酚茀型環氧丙烯酸酯347.4 g(0.5莫耳)添加丙二醇單甲醚乙酸酯650 g而使之溶解後，混合下述式(b1)-1之化合物(以下亦記為化合物(b1)-1)(0.25莫耳)以及觸媒，緩慢升溫，於130℃下反應4小時。 再者，化合物(b1)-1為下述式所表示之四羧酸二酐(降烷-2-螺-α-環戊酮-α'-螺-2''-降烷-5,5'',6,6''-四羧酸二酐)。 [化57]確認酸酐基消失後，混合1,2,3,6-四氫鄰苯二甲酸酐30 g，於90℃下反應6小時，獲得由雙酚茀型環氧丙烯酸酯與酸酐(化合物(b1)-1)所生成之作為酚酞基樹脂之樹脂A1。酸酐之消失係藉由IR光譜進行確認。 [實施例1] 將內醯胺系顏料75質量份(「Irgaphor」(註冊商標)黑S0100CF：BASF公司製造)、製備例1中獲得之倍半矽氧烷化合物15質量份、及胺基甲酸酯系分散劑10質量份以固形物成分濃度成為20質量%之方式添加至丙二醇單甲醚乙酸酯後，進行分散處理，獲得著色劑分散液。 針對所獲得之著色劑分散液，依據以下基準而評價顏料之分散性。將評價結果記於表3。 ○：於室溫下靜置1週亦未確認到顏料之沈澱。 ×：於室溫下靜置1週時確認到顏料之沈澱。 將所獲得之著色劑分散液225質量份(顏料與分散劑之合計45質量份)、製備例2中獲得之樹脂A1(鹼溶性樹脂(A))30質量份、二季戊四醇六丙烯酸酯(光聚合性單體(B))7質量份、下述結構之肟酯化合物(光聚合起始劑(C))8質量份、及下述D1(多官能交聯性化合物(D))10質量份進行混合，再次以固形物成分濃度成為20質量%之方式添加丙二醇單甲醚乙酸酯，獲得感光性樹脂組合物。 [化58]使用所獲得之感光性樹脂組合物，藉由以下方法，評價自硬化物之氣體產生情況。 ＜氣體產生評價＞ 於10 cm×10 cm之玻璃基板上塗佈感光性樹脂組合物後，於100℃下乾燥120秒而形成塗佈膜。 繼而，利用使用高壓水銀燈之曝光機，以曝光量50 mJ/cm2 對塗佈膜進行全面曝光。 將經曝光之塗佈膜於230℃下進行30分鐘之後烘烤，獲得膜厚2 μm之硬化膜。 使用所形成之硬化膜作為試樣，藉由安裝有Purge&Trap Sampler(加熱脫附裝置)之氣相層析質譜法(P&T-GC/MS)，評價產生氣體量。測定與氣體之定量係按照下述(i)～(iii)之順序進行。 (i)氣體產生與向二次吸附管之捕集 將1 mg之硬化膜裝入一次捕集管內，使用加熱脫附裝置(Perkin Elmer製造：Tarbo Matrix ATD)，於230℃下加熱10分鐘，使脫離出之氣體吸附於二次捕集管。 (ii)GC/MS分析 將二次捕集管於250℃下加熱1分鐘，利用GC/MS(Agilent Technologies公司製造：7890B(GC)、5977AMSD(MS))對脫離出之氣體進行分析。 (iii)定量分析 根據樹脂組合物經PT-GC/MS分析獲得之圖中之各峰面積而進行定量。具體而言，將所檢測出之釋氣之波峰之合計面積%定為評價值。 基於所獲得之評價值(合計面積%)，根據下述基準而評價產生氣體量。若為3～5之評價，則表示氣體產生量較少。將評價結果記於表1。 5：評價值之值未達1.0E8 。 4：評價值之值為1.0E8 以上且未達2.5E8 。 3：評價值之值為2.5E8 以上且未達5.0E8 。 2：評價值之值為5.0E8 以上且未達1.0E9 。 1：評價值之值為1.0E9 以上。 [比較例1～3] 將分散劑變為表3記載之分散劑，除此以外，藉由與實施例1相同之方式製備著色劑分散液與感光性樹脂組合物。 針對所獲得之著色劑分散液與感光性樹脂組合物，藉由與實施例1相同之方式評價顏料之分散性、與自硬化膜之氣體產生情況。將該等之評價結果記於表3。 再者，比較例3由於最初便無法使顏料良好地分散，故而未進行有關氣體產生情況之評價。 [實施例2、比較例4] 於實施例2中，使用平均粒徑200～300 nm之銀錫合金微粒子代替實施例1中使用之內醯胺系顏料作為顏料，獲得著色劑分散液。 又，針對所獲得之著色劑分散液，藉由與實施例1相同之方式評價分散性，另外於製備感光性樹脂組合物後，進行氣體產生評價。 於比較例4中，使用平均粒徑200～300 nm之銀錫合金微粒子代替比較例2中使用之內醯胺系顏料作為顏料，獲得著色劑分散液。 又，針對所獲得之著色劑分散液，藉由與實施例1相同之方式評價分散性，另外於製備感光性樹脂組合物後，進行氣體產生評價。 [表3] 根據表3，由實施例可知，若使用包含特定結構之倍半矽氧烷化合物之分散劑使顏料分散而製備著色劑分散液，則不僅實現顏料之良好分散，且顯著抑制自使用所獲得之著色劑分散液而製備之感光性樹脂組合物之硬化物產生氣體。 另一方面，由比較例1～4可知，於未使用特定結構之倍半矽氧烷化合物作為分散劑之情形時，最初便無法使顏料良好地分散，或者即便可使顏料良好地分散，亦幾乎無法抑制自感光性樹脂組合物產生氣體。Hereinafter, the present invention will be described based on preferred embodiments. In addition, "~" in this specification means the above (lower limit value) to the following (upper limit value) unless there is particular notice. ≪Colorant Dispersion Liquid≫ The colorant dispersion liquid contains a colorant (E). The colorant (E) includes a pigment (E1) and a dispersant (E2). The dispersant (E2) contains the following formula (e2a): (In formula (e2a), R e1 It is a silsesquioxane compound having a structural unit represented by a monovalent organic group. Since this colorant dispersion liquid contains the said dispersing agent (E2), a pigment can be disperse | distributed favorably. Moreover, the hardened | cured material formed using the photosensitive resin composition containing the said toner dispersion liquid containing a dispersing agent (E2) suppresses generation | occurrence | production of gas. Hereinafter, the components contained in a colorant dispersion liquid and the manufacturing method of a coloring agent dispersion liquid are demonstrated. <Colorant (E)> The colorant dispersion liquid contains a colorant (E). The colorant (E) must contain a pigment (E1) and a dispersant (E2). In addition to the pigment (E1), the colorant (E) may contain a dye as a coloring component, if necessary. The dye may be appropriately selected from known materials. Examples of the dye include azo dyes, metal complex salt azo dyes, anthraquinone dyes, triphenylmethane dyes, Dyes, cyanine dyes, naphthoquinone dyes, quinone imine dyes, methine dyes, phthalocyanine dyes, and the like. These dyes can be contained in a colorant (E) by dispersing them in an organic solvent or the like by lake formation (salinization). In addition to these dyes, for example, Japanese Patent Laid-Open No. 2013-225132, Japanese Patent Laid-Open No. 2014-178477, Japanese Patent Laid-Open No. 2013-137543, and Japanese Patent Laid-Open No. 2011-38085 can be preferably used. Dyes and the like described in Japanese Patent Publication No. 2014-197206 and the like. These dyes can also be used in combination with the following pigments (E1) (for example, fluorene-based pigments, lactam-based pigments, and AgSn alloy fine particles). [Pigment (E1)] The pigment (E1) is not particularly limited, and it is preferable to use, for example, a compound classified as a pigment in the colorant index (issued by The Society of Dyers and Colourists), specifically, In other words, the colorant index (CI) number is described below. Examples of yellow pigments that can be preferably used include: CI Pigment Yellow 1 (hereinafter, "CI Pigment Yellow" is the same, and only the number is described), 3, 11, 12, 13, 14, 15, 16, 17, 20 , 24, 31, 53, 55, 60, 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110 , 113, 114, 116, 117, 119, 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167 , 168, 175, 180, and 185. Examples of orange pigments that can be preferably used include: CI Pigment Orange 1 (hereinafter, "CI Pigment Orange" is the same, and only the number is described), 5, 13, 14, 16, 17, 24, 34, 36, 38 , 40, 43, 46, 49, 51, 55, 59, 61, 63, 64, 71, and 73. Examples of purple pigments that can be preferably used include: CI Pigment Violet 1 (hereinafter, "CI Pigment Violet" is the same, and only the number is described), 19, 23, 29, 30, 32, 36, 37, 38, 39 , 40, and 50. Examples of red pigments that can be preferably used include: CI Pigment Red 1 (hereinafter, "CI Pigment Red" is the same, and only the number is described) 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48: 1, 48: 2, 48: 3, 48: 4, 49: 1, 49: 2, 50: 1, 52: 1, 53: 1, 57, 57: 1, 57: 2, 58: 2, 58: 4, 60: 1, 63: 1, 63: 2, 64: 1, 81: 1, 83, 88, 90: 1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 192, 193, 194, 202, 206, 207, 208, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 242, 243, 245, 254, 255, 264, and 265. Examples of blue pigments that can be preferably used include: CI Pigment Blue 1 (hereinafter, "CI Pigment Blue" is the same, and only the number is described), 2, 15, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, and 66. Examples of the pigments of the other hue that can be preferably used include green pigments such as CI Pigment Green 7, CI Pigment Green 36, CI Pigment Green 37, CI Pigment Brown 23, CI Pigment Brown 25, CI Pigment Brown 26, Brown pigments such as CI Pigment Brown 28, black pigments such as CI Pigment Black 1, CI Pigment Black 7. The colorant dispersion liquid may contain a light-shielding agent as the colorant (E). The colorant dispersion liquid containing a light-shielding agent is suitable for preparing a photosensitive resin composition for forming a black matrix or a black column spacer in a liquid crystal display panel, or forming a partitioning barrier for a light-emitting layer in an organic EL element. The hardened | cured material formed by using the photosensitive resin composition containing the coloring agent dispersion liquid containing the following dispersing agent (E2) produces less gas. Therefore, a barrier formed by using a photosensitive resin composition containing a coloring agent dispersion liquid containing a dispersant (E2) is unlikely to cause damage to an organic light emitting material (light emitting layer) or an electrode in an organic EL element. In addition, when the barrier rib contains a light-shielding agent, it is easy to prevent internal reflection or unnecessary light from entering the organic EL element. According to the above description, the photosensitive resin composition containing a light-shielding agent and a dispersant (E2) is particularly preferably used to form a barrier for dividing a light-emitting layer in an organic EL element. When the colorant (E) contains a light-shielding agent as the pigment (E1), it is preferable to use a black pigment or a purple pigment as the light-shielding agent. Examples of black pigments or purple pigments include carbon black, fluorene-based pigments, lactam-based pigments, titanium black, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, silver, and other metal oxides. , Complex oxides, metal sulfides, metal sulfates or metal carbonates, regardless of whether they are organic or inorganic pigments. As the carbon black, known carbon blacks such as chimney black, furnace black, heat black, and lamp black can be used. Alternatively, a resin-coated carbon black may be used. The carbon black is also preferably a carbon black to which a treatment for introducing an acidic group is performed. The acidic group introduced into carbon black shows an acidic functional group based on the definition of Bronsted. Specific examples of the acidic group include a carboxyl group, a sulfonic acid group, and a phosphate group. Acidic groups introduced into carbon black may also form salts. The cation which forms a salt with an acidic group is not specifically limited in the range which does not impair the objective of this invention. Examples of the cation include various metal ions, cations of nitrogen-containing compounds, ammonium ions, and the like, and alkali metal ions such as sodium ion, potassium ion, and lithium ion, or ammonium ion are preferred. Among the carbon blacks treated with the introduction of an acidic group as described above, from the viewpoint of achieving high resistance of the light-shielding cured film formed by using the photosensitive resin composition, it is preferable to have a material selected from the group consisting of a carboxylic acid group, Carbon black having one or more functional groups in a group consisting of a carboxylate group, a sulfonic acid group, and a sulfonic acid group. The method for introducing an acidic group into carbon black is not particularly limited. Examples of the method for introducing an acidic group include the following methods. 1) A method of introducing a sulfonic acid group into carbon black by a direct substitution method using concentrated sulfuric acid, oleum, chlorosulfonic acid, or the like, or an indirect substitution method using sulfite, bisulfite, or the like. 2) A method for diazo coupling of an organic compound having an amine group and an acid group with carbon black. 3) A method in which an organic compound having a halogen atom and an acidic group and a carbon black having a hydroxyl group are reacted by a Williamson etherification method. 4) A method of reacting an organic compound having a halogenated carbonyl group and an acid group protected by a protecting group with a carbon black having a hydroxyl group. 5) A method of deprotecting carbon black by using Friedel-Crafts reaction with an organic compound having a halogenated carbonyl group and an acid group protected by a protecting group. Among these methods, method 2) is preferred in terms of ease and safety of the introduction treatment of the acidic group. The organic compound having an amine group and an acidic group used in the method 2) is preferably a compound in which an amine group and an acidic group are bonded to an aromatic group. Examples of such a compound include amine sulfonic acid such as sulfanilic acid, or amine benzoic acid such as 4-aminobenzoic acid. The mole number of the acid group introduced into the carbon black is not particularly limited as long as the purpose of the present invention is not impaired. The molar number of the acidic group introduced into carbon black is preferably 1 mmol or more and 200 mmol or less, more preferably 5 mmol or more and 100 mmol or less, relative to 100 g of carbon black. Carbon black to which an acidic group has been introduced may be coated with a resin. When a photosensitive resin composition containing a toner-coated toner dispersion liquid containing a resin-coated carbon black is used, a light-shielding hardened material having excellent light-shielding properties and insulation properties and low surface reflectance is easily formed. Furthermore, the coating treatment of the resin does not particularly adversely affect the dielectric constant of the light-shielding hardened material formed by using the photosensitive resin composition. Examples of the resin that can be used for coating carbon black include thermosetting properties such as phenol resin, melamine resin, xylene resin, diallyl phthalate resin, glycine resin, epoxy resin, and alkylbenzene resin. Resin, or polystyrene, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene ether, polyfluorene, polyparaphenylene terephthalamide, Thermoplastic resins such as polyamidofluorene imine, polyamidoimine, polyaminobiscisbutenediamidoimide, polyetherfluorene, polyphenylenefluorene, polyarylate, and polyetheretherketone. The coating amount of the resin to carbon black is preferably 1% by mass or more and 30% by mass or less based on the total mass of the carbon black and the resin. Moreover, as a light-shielding agent, a fluorene type pigment is also preferable. Specific examples of the fluorene-based pigment include a fluorene-based pigment represented by the following formula (e-1), a fluorene-based pigment represented by the following formula (e-2), and the following formula (e-3) Represents a perylene pigment. As for commercially available products, the product names K0084 and K0086 manufactured by BASF, or pigment blacks 21, 30, 31, 32, 33, and 34 can be preferably used as the fluorene-based pigment. [Chemical 3] In formula (e-1), R e11 And R e12 Each independently represents an alkylene group having 1 or more and 3 or less carbon atoms, R e13 And R e14 Each independently represents a hydrogen atom, a hydroxyl group, a methoxy group, or an acetamido group. [Chemical 4] In formula (e-2), R e15 And R e16 Each independently represents an alkylene group having 1 to 7 carbon atoms. [Chemical 5] In formula (e-3), R e17 And R e18 Each is independently a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, and may also include a hetero atom of N, O, S, or P. In R e17 And R e18 In the case of an alkyl group, the alkyl group may be linear or branched. The compound represented by the formula (e-1), the compound represented by the formula (e-2), and the compound represented by the formula (e-3) can be, for example, Japanese Patent Laid-Open No. 62-1753 or Japanese Patent It was synthesized by the method described in Japanese Patent Publication No. 63-26784. That is, hydrazone-3,5,9,10-tetracarboxylic acid or its dianhydride and amines are used as raw materials, and a heating reaction is performed in water or an organic solvent. Furthermore, the target product can be obtained by reprecipitating the obtained crude product in sulfuric acid or recrystallizing it in water, an organic solvent, or a mixed solvent of these. In order to disperse the fluorene-based pigment in the colorant dispersion liquid, the average particle diameter of the fluorene-based pigment is preferably from 10 nm to 1,000 nm. Moreover, a fluorenamine pigment may be contained as a light-shielding agent. Examples of the lactamamine pigments include compounds represented by the following formula (e-4). [Chemical 6] In formula (e-4), X e1 Represents a double bond. As geometric isomers, they are independently E-form or Z-form. R e19 Each independently represents a hydrogen atom, a methyl group, a nitro group, a methoxy group, a bromine atom, a chlorine atom, a fluorine atom, a carboxyl group or a sulfo group, e20 Each independently represents a hydrogen atom, a methyl group, or a phenyl group, R e21 Each independently represents a hydrogen atom, a methyl group, or a chlorine atom. The compound represented by formula (e-4) can be used alone or in combination of two or more kinds. In terms of easy manufacturability of the compound represented by formula (e-4), R e19 Preferably, it is bonded to the 6-position of the indolinone ring, R e21 It is preferably bonded to the 4-position of the indolinone ring. From the same perspective, R e19 , R e20 , And R e21 A hydrogen atom is preferred. Regarding the compound represented by the formula (e-4), the EE form, the ZZ form, and the EZ form exist as geometric isomers, and may be any one of these compounds, or may be the geometric isomers. mixture. The compound represented by the formula (e-4) can be produced, for example, by a method described in International Publication No. 2000/24736 and International Publication No. 2010/081624. In order to disperse the lactamamine pigment in the colorant dispersion liquid, the average particle diameter of the lactamamine pigment is preferably 10 nm or more and 1000 nm or less. Further, as the colorant, metal particles may be used. Such metal particles are preferably formed of a metal or a metal and a metal compound, and more preferably formed of a metal. The metal particles may include two or more metals or metal compounds in combination. The metal particles particularly preferably contain, as a main component, a metal selected from the group consisting of the fourth period, the fifth period, and the sixth period of the long periodic table (IUPAC 1991). The metal particles preferably contain a metal selected from the group consisting of Groups 2 to 14 as a main component, and more preferably include a metal particle selected from the group consisting of Group 2, Group 8, Group 9, Group 10, and Group 11. Groups, 12th, 13th, and 14th group metal as the main component. As the metal particles, particles of a metal of the 4th, 5th, or 6th period and the 2nd, 10th, 11th, 12th, or 14th group are more preferable. Preferred examples of the metal contained in the metal particles include copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium, osmium, calcium, ruthenium, osmium, manganese, molybdenum, tungsten, At least one of niobium, tantalum, titanium, bismuth, antimony, lead, and alloys thereof. Among these metals, copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, calcium, iridium, and alloys thereof are more preferred, and copper, silver, gold, platinum, At least one of palladium, tin, calcium, and alloys thereof, and more preferably at least one of copper, silver, gold, platinum, tin, and alloys thereof. Moreover, such a metal particle may take a core-shell structure. Among the metal particles enumerated above, an inorganic pigment containing fine particles containing silver-tin (AgSn) alloy as a main component (hereinafter referred to as "AgSn alloy fine particles") can be preferably used as a light-shielding agent. The AgSn alloy fine particles only need to be an AgSn alloy as a main component, and may also include other metal components such as Ni, Pd, and Au. The average particle diameter of the AgSn alloy fine particles is preferably 1 nm to 300 nm. When the AgSn alloy is represented by the chemical formula AgxSn, the range of x that can obtain chemically stable AgSn alloy is 1 ≦ x ≦ 10, and the range of x that can achieve both chemical stability and blackness is 3 ≦ x ≦ 4. Here, if the mass ratio of Ag in the AgSn alloy is determined within the above range of x, when x = 1, when Ag / AgSn = 0.4762 x = 3, 3 · Ag / Ag3Sn = 0.7317 x In the case of = 4, 4 · Ag / Ag4Sn = 0.7843 x = 10, in the case of 10 · Ag / Ag10Sn = 0.9008. Therefore, the AgSn alloy is chemically stable when it contains 47.6 mass% to 90 mass% of Ag, and when it contains 73.17 mass% to 78.43 mass% of Ag, it can be compared with Ag. It can effectively achieve chemical stability and blackness. The AgSn alloy fine particles can be produced by a general fine particle synthesis method. Examples of the microparticle synthesis method include a gas phase reaction method, a spray thermal decomposition method, an atomization method, a liquid phase reaction method, a freeze-drying method, and a hydrothermal synthesis method. The AgSn alloy particles have high insulation properties, but depending on the use of the photosensitive resin composition prepared by using a colorant dispersion liquid, the surface may be covered with an insulating film to further improve the insulation properties. As the material of such an insulating film, a metal oxide or an organic polymer compound is preferable. As the metal oxide, a metal oxide having insulation properties such as silica, alumina, zirconia, yttria, titanium oxide, or the like is suitably used. In addition, as the organic polymer compound, a resin having insulation properties such as polyimide, polyether, polyacrylate, polyamine compound, or the like is suitably used. In order to sufficiently improve the surface insulation of the AgSn alloy particles, the film thickness of the insulating film is preferably 1 nm or more and 100 nm or less, and more preferably 5 nm or more and 50 nm or less. The insulating film can be easily formed by surface modification technology or surface coating technology. In particular, if an alkoxide such as tetraethoxysilane or aluminum triethanolate is used, an insulating film having a uniform film thickness can be formed at a relatively low temperature, which is preferable. As the light-shielding agent, the aforementioned fluorene-based pigment, lactam-based pigment, and AgSn alloy fine particles may be used alone, or these may be used in combination. In addition, for the purpose of adjusting hue, etc., the light-shielding agent may include the above-mentioned black pigment or purple pigment together with pigments of red, blue, green, and yellow hue. A pigment of a hue other than a black pigment or a purple pigment can be appropriately selected from known pigments. For example, as a pigment of a hue other than a black pigment or a purple pigment, the above-mentioned various pigments can be used. The use amount of the pigment of the hue other than the black pigment or the purple pigment is preferably 15% by mass or less, and more preferably 10% by mass or less with respect to the total mass of the light-shielding agent. In addition, the inorganic pigment and the organic pigment may be used alone or in combination of two or more kinds. In the case of the combined use, the organic pigment is preferably 10 parts by mass or more and 80 parts by mass relative to the total amount of the inorganic pigment and the organic pigment. It is used within the range of less than or equal to parts by mass, and more preferably within the range of not less than 20 parts by mass and not more than 40 parts by mass. The amount of the pigment (E1) in the colorant dispersion liquid is preferably 30% by mass or more and 95% by mass or less, more preferably 40% by mass or more and 90% by mass with respect to the mass of the total solid content of the colorant dispersion solution. Mass% or less, more preferably 50 mass% or more and 85 mass% or less. By using the pigment (E1) in an amount within this range with respect to the total solid component content of the colorant dispersion liquid, the pigment (E1) is easily dispersed in the colorant dispersion liquid. <Dispersant (E2)> The colorant dispersion liquid contains the pigment (E1) and the dispersant (E2) together. The pigment (E1) is well dispersed in the colorant dispersion liquid under the action of the dispersant (E2). The dispersant (E2) contains the following formula (e2a): (In formula (e2a), R e1 It is a silsesquioxane compound having a structural unit represented by a monovalent organic group. As a general structure of a silsesquioxane compound, a cage type, an incomplete cage type, a ladder type, and a random type are well known. The structure of the silsesquioxane compound used as the dispersant (E2) is not particularly limited, and may be any previously known structure such as a cage type, an incomplete cage type, a ladder type, and a random type. The silsesquioxane compound has a good pigment dispersion effect through the silsesquioxane structure. The silsesquioxane compound is chemically or thermally stable. Therefore, a hardened product formed by using a photosensitive resin composition containing a coloring agent dispersion liquid containing the above-mentioned silsesquioxane compound as a dispersant (E2) can suppress gas generation by the dispersant (E2). The silsesquioxane compound preferably contains one or more selected from the group consisting of an aromatic group, a fluorene bond, and a urethane bond. These groups or bonds are generally chemical structures that impart a dispersion effect to a dispersant for a pigment. Therefore, a silsesquioxane compound containing one or more selected from the group consisting of an aromatic group, an amido bond, and a urethane bond is more preferable in that the pigment is easily dispersed. In the silsesquioxane compound, an aromatic group, a amine bond, or a urethane bond may exist at the position R in the structural unit represented by the formula (e2a). e1 The organic group represented may be a position other than the structural unit represented by formula (e2a). This position is preferably R in the structural unit represented by formula (e2a) e1 In the organic group indicated. For example, the silsesquioxane compound can be bonded to a structural unit represented by the following formula (e2a-1) or (e2a-2). In the structural unit represented by the following formula (e2a-1) or (e2a-2), R is e0 In the case of an organic group, the organic group may include one or more selected from the group consisting of an aromatic group, a amine bond, and a urethane bond. [Chemical 8] (In formulae (e2a-1) and (e2a-2), R e0 Each is independently a hydrogen atom or a monovalent organic group. In R e0 When it is an organic group, the organic group and R e1 Same) R in formula (e2a) e1 In the case of an organic group, the number of carbon atoms is not particularly limited. The number of carbon atoms is, for example, preferably 1 or more and 50 or less, more preferably 1 or more and 30 or less, and even more preferably 1 or more and 20 or less. The structure of the organic group may be linear, branched, or cyclic, or a combination of these structures. The organic group may have one or more unsaturated bonds. Organic groups may also contain heteroatoms. Examples of the hetero atom include a halogen atom, an oxygen atom, a sulfur atom, a nitrogen atom, and a phosphorus atom. Preferred examples of the organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, and an optionally substituted group. Phenyl, phenoxy which may have a substituent, benzamyl which may have a substituent, phenoxycarbonyl which may have a substituent, benzamyloxy which may have a substituent, phenyl which may have a substituent Alkyl group, naphthyl group which may have a substituent, naphthyloxy group which may have a substituent, naphthylmethyl group which may have a substituent, naphthyloxycarbonyl group which may have a substituent, naphthylmethyloxy group which may have a substituent , A naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, an amine group substituted with one or two organic groups, and the like. Examples of the substituent that these groups may have include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and a cycloalkyl group having 3 to 10 carbon atoms. , A cycloalkoxy group having 3 or more and 10 carbon atoms, a saturated aliphatic fluorenyl group having 2 or more and 20 carbon atoms, an alkoxycarbonyl group having 2 or more and 20 carbon atoms, and 2 or more and carbon atoms Saturated aliphatic fluorenyloxy, phenyl, phenoxy, phenylthio, benzamidine, phenoxycarbonyl, benzophenoxy, phenylalkyl having 7 or more and 20 or less carbon atoms , Naphthyl, naphthyloxy, naphthylmethyl, naphthyloxycarbonyl, naphthylmethyloxy, naphthylalkyl having 11 or more and 20 carbon atoms, heterocyclyl, heterocyclylcarbonyl, amino, An amine group, a nitro group, a hydroxyl group, a halogen atom, a cyano group, a carboxyl group, etc. substituted with one or two organic groups having 1 to 20 carbon atoms. In formula (e2a), R e1 It is a monovalent organic group. The organic group is preferably the following formula (e2a-I): -X e -B e -Y e -COOH ・ ・ ・ (e2a-I), or the following formula (e2a-II): -Z e -A e ・ ・ ・ The base indicated by (e2-II). In formula (e2a-I), X e Is a single bond, an alkylene group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, or -R e6 -NH-R e7 -The indicated base. R e6 And R e7 Each is independently an alkylene group having 1 to 3 carbon atoms. Y e It is a divalent cyclic organic group or a chain aliphatic hydrocarbon group having 1 to 20 carbon atoms. B e It is -NH-CO-, -CO-NH-, -NH-CO-O-, -O-CO-NH-, or -NH-CO-NH-. X e And Y e Each of them may be independently substituted with one or more types of groups selected from the group consisting of (meth) acrylfluorenyloxy, vinyl, and epoxy-containing organic groups. Z e It is a single bond, an alkylene group having 1 to 6 carbon atoms, or an alkylene group having 6 to 12 carbon atoms. A e It is (meth) acrylic fluorenyloxy, vinyl, or epoxy-containing organic group. The silsesquioxane compound preferably has a group containing a group represented by the formula (e2a-I) as R e1 The structural unit (A) is the structural unit represented by the formula (e2a). In a silsesquioxane compound having a structural unit (A), and all of the above-mentioned structural units (A) in the silsesquioxane compound, R e1 In the case where none of the (meth) acrylic fluorenyloxy, vinyl, or epoxy-containing organic groups is substituted, the silsesquioxane compound must preferably have the formula (e2a) and include The base represented by (e2a-II) is R e1 Structural unit (B). As X e The alkylene group having 1 to 6 carbon atoms in the specific example includes, for example, methylene, ethane-1,2-diyl, ethane-1,1-diyl, and propane-1. , 3-diyl, propane-1,2-diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, and the like. X e The carbon number of the arylene group is 6 or more and 12 or less, and preferably 6 or more and 10 or less. Preferred specific examples of the arylene group include: arylene, m-phenylene, p-phenylene, naphthalene-1,4-diyl, naphthalene-1,5-diyl, naphthalene-2, 6-diyl, biphenyl-4,4'-diyl, etc. As -R e6 -NH-R e7 -, Specifically, for example: -CH 2 -NH-CH 2 -,-(CH 2 ) 2 -NH- (CH 2 ) 2 -,-(CH 2 ) 3 -NH- (CH 2 ) 3 -, -CH 2 -NH- (CH 2 ) 2 -,-(CH 2 ) 2 -NH-CH 2 -,-(CH 2 ) 2 -NH- (CH 2 ) 3 -,-(CH 2 ) 3 -NH- (CH 2 ) 2 -, -CH 2 -NH- (CH 2 ) 3 -,-(CH 2 ) 3 -NH-CH 2 -Wait. Y e The divalent cyclic organic group may be a group obtained by removing two hydrogen atoms from an aromatic ring or a group obtained by removing two hydrogen atoms from an aliphatic ring. In Y e In the case of a divalent group containing an aromatic ring, the divalent ring organic group is preferably removed from an aromatic ring having 6 or more and 10 or less carbon atoms which may have a substituent having 1 or 2 carbon atoms. A radical derived from 2 hydrogen atoms. Preferred examples of the aromatic ring having 6 to 10 carbon atoms include a benzene ring, a naphthalene ring, a methylbenzene ring, a dimethylbenzene ring, and the like. In Y e When it is a divalent group containing an aliphatic ring, the divalent cyclic organic group is preferably a group obtained by removing two hydrogen atoms from an aliphatic ring having 5 to 16 carbon atoms. Preferred examples of the aliphatic ring having 5 to 16 carbon atoms include a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a cyclononane ring, and a cyclodecane ring. , Dicyclopentadiene ring, norbornane ring, norbornene ring, cubane ring, basketane ring and the like. In Y e In the case of a chain aliphatic hydrocarbon group having 1 to 20 carbon atoms, the chain aliphatic hydrocarbon group may be linear or branched, and may be a saturated hydrocarbon group or an unsaturated hydrocarbon group. Preferred examples of the chain aliphatic hydrocarbon group having 1 to 20 carbon atoms include methylene, ethane-1,2-diyl, ethane-1,1-diyl, and propane-1. , 3-diyl, propane-1,2-diyl, propane-1,3-diyl, propane-1,2-diyl, vinylidene, (2-octenyl) ethylidene, (2 , 4,6-trimethyl-2-nonenyl) alkylene such as ethylidene, alkylene having double bonds, or alkylene having branched chain having 1 to 9 carbon atoms. In formula (e2a-II), as Z e Preferred examples in the case of an alkylene group having 1 to 6 carbon atoms include methylene, ethane-1,2-diyl, ethane-1,1-diyl, and propane- 1,3-diyl, propane-1,2-diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, and the like. Z e The carbon number of the arylene group is 6 or more and 12 or less, and preferably 6 or more and 10 or less. Preferred specific examples of the arylene group include: arylene, m-phenylene, p-phenylene, naphthalene-1,4-diyl, naphthalene-1,5-diyl, naphthalene-2, 6-diyl, biphenyl-4,4'-diyl, etc. In formula (e2a-II), A e It is (meth) acrylic fluorenyloxy, vinyl, or epoxy-containing organic group. The epoxy group-containing organic group is not particularly limited, and examples thereof include ethylene oxide group, glycidyl group, and glycidyloxy group. Specific examples of the base represented by the formula (e2a-I) include X e , B e , Y e It is the basis of the combination shown in Table 1 below. Y in Table 1 e Has two bond keys. Y e Use one of the two bonds to the carboxyl group and the other to the B e Bonding. About B in Table 1 e , Also with Y e Same as X e , Y e Bonding. [Table 1] Specific examples of the base represented by the formula (e2a-II) include, for example, Z e And A e It is the basis of the combination shown in Table 2 below. [Table 2] The silsesquioxane compound preferably includes a structural unit (a) represented by the following formula (e2b) and a structural unit (b) represented by the following formula (e2c). [Chemical 9] (In formula (e2b), R e2 The group represented by the above formula (e2a-I). X in the base represented by formula (e2a-I) e And Y e None of the (meth) acrylic fluorenyloxy, vinyl, and epoxy-containing organic groups is used as a substituent. In formula (e2c), R e3 Representing the group represented by the formula (e2a-II)) Examples of the silsesquioxane compound include a silsesquioxane compound containing a structural unit (c) represented by the following formula (e2d). [Chemical 10] (In formula (e2d), R e4 Represents the base represented by the above formula (e2a-I), and X in the base represented by the formula (e2a-I) e And Y e At least one of which has at least one group selected from the group consisting of (meth) acryloxy, vinyl, and epoxy-containing organic groups as a substituent) a silsesquioxane compound except the above structure In addition to the unit, a structural unit (d) represented by the following formula (e2e) may be further contained. [Chemical 11] (In formula (e2e), R e5 Represents an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, or an aralkyl group having 7 to 12 carbon atoms) in R e5 In the case of an alkyl group, for example, methyl, ethyl, and n-propyl are preferred. In R e5 When it is an aryl group or an aralkyl group, for example, a phenyl group, a benzyl group, a tolyl group, a xylyl group, and a naphthyl group are preferred. In the silsesquioxane compound, it is preferable that the structural unit contains at least one structural unit having a group represented by the formula (e2a-I). In the silsesquioxane compound, the group represented by the formula (e2a-I) in any of the structural units is free of any of (meth) acryloxy, vinyl, and epoxy-containing organic groups. In the case of one substitution, the silsesquioxane compound preferably contains at least one structural unit having a group represented by the formula (e2a-I). In the silsesquioxane compound, the amount of the structural unit containing at least one kind of group selected from the group consisting of (meth) acrylic fluorenyloxy, vinyl, and epoxy-containing organic groups is preferably 10 Molar% or more, more preferably 30 Molars or more. The content ratio of the structural unit in the silsesquioxane compound is 20:80 to 80 when the structural unit (a) and the structural unit (b) are contained. : 20. When the silsesquioxane compound contains the structural unit (d), its content is preferably 10 mol% or more and 80 mol% or less. The silsesquioxane skeleton of the silsesquioxane compound has a general formula (RSiO) which is generally generated through steps such as hydrolysis and condensation reactions of trialkoxysilane. 3/2 ) n polysiloxane skeleton. The weight average molecular weight Mw of the obtained silsesquioxane compound is usually in the range of 1,000 or more and 10,000 or less. It is preferably 1500 or more and 5,000 or less. As for the trialkoxysilane used as a raw material, for example, when a silsesquioxane compound has the above-mentioned structural units (a) to (d), a trialkoxysilane having a corresponding R substituent can be used. After forming the silsesquioxane skeleton, it can be modified with a suitable reagent to form the desired R substituent. Examples of the substituted trialkoxysilanes in which the R substituent is a (meth) acrylfluorenyl group include 3-methacryloxypropyltrimethoxysilane and 3-methacrylmethyloxypropyl Triethoxysilane, 3-propenyloxypropyltrimethoxysilane, 3-propenyloxypropyltriethoxysilane, and the like. These may be used individually by 1 type, and may use 2 or more types together. Among these, from the viewpoint of reactivity, 3-methacryloxypropyltrimethoxysilane and 3-propenyloxypropyltrimethoxysilane are preferred. Examples of the substituted trialkoxysilane in which the R substituent is an aryl group or an alkyl group having 1 to 12 carbon atoms include methyltrimethoxysilane, methyltriethoxysilane, and ethyltrimethoxy Silane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, phenyltrimethoxysilane, phenyl Triethoxysilane, 1-naphthyltrimethoxysilane, 1-naphthyltriethoxysilane, p-methoxyphenyltrimethoxysilane, p-methoxyphenyltriethoxysilane, and the like. These may be used individually by 1 type, and may use 2 or more types together. Among these, from the viewpoints of heat resistance and reactivity, methyltrimethoxysilane, ethyltrimethoxysilane, and phenyltrimethoxysilane are preferred. After forming the silsesquioxane skeleton, it is necessary to modify it with a suitable reagent to form the desired R substituent. For this purpose, for example, an amine group is introduced into the silsesquioxane in advance, and the amine group can be modified to form amidine. In order to introduce an amine group into the silsesquioxane, it is sufficient to use a trialkoxysilane in which the substituent is an amine group. Examples of a method for producing a silsesquioxane skeleton include a method of hydrolyzing and condensing a trialkoxysilane as a raw material. For example, as conditions for hydrolysis and co-condensation, known conditions can be adopted. Catalysts can also be used for hydrolysis and co-condensation. Examples of the catalyst include tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, benzyltriethylammonium hydroxide, tetramethylammonium hydroxide, tetrabutylammonium hydroxide, hydrochloric acid, sulfuric acid, Formic acid, oxalic acid. Examples of the reaction conditions include 1 hour to 10 hours, 25 ° C to 100 ° C. The dispersant (E2) can also be used in combination with other dispersants other than the silsesquioxane compound described above within a range that does not impair the object of the present invention. Examples of the dispersant that can be used together with the silsesquioxane compound include polymer dispersants such as polyethylenimine, polyurethane resin, and acrylic resin. When a dispersant (E2) is used in combination with a dispersant other than a silsesquioxane compound, the dispersant (E2) has a structure of the silsesquioxane compound having a structural unit represented by the formula (e2a). The content is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and further 40% by mass or more. On the other hand, the upper limit of the content of the silsesquioxane compound having the structural unit represented by the formula (e2a) in the dispersant (E2) is not particularly limited, and may be, for example, 100% by mass or less. 95% by mass or less. Regarding the amount of the dispersant (E2) described above, it is preferably 5 mass% or more and 70 mass% or less, more preferably 10 mass% or more and 60 mass relative to the mass of the total solid content of the colorant dispersion liquid. % Or less, particularly preferably 15% by mass or more and 50% by mass or less. Moreover, the usage-amount of a dispersing agent (E2) is 100 mass parts or more and 90 mass parts or less with respect to 100 mass parts of pigment (E1), More preferably, it is 20 mass parts or more and 80 mass parts or less. <Dispersion medium> The colorant dispersion liquid usually contains a dispersion medium for dispersing the colorant (E). The type of the dispersion medium is not particularly limited, and is typically an organic solvent. Examples of the organic solvent used as a dispersion medium in the colorant dispersion liquid include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol n-propyl ether, ethylene glycol mono-n-butyl ether, and diethyl ether. Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether Propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol Monoethyl ethers and other (poly) alkylene glycol monoalkyl ethers; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol (Poly) alkylene glycol monoalkyl ether acetates such as alcohol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; diethylene glycol dimethyl ether, diethylene glycol Methyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone Ketones; alkyl lactates such as methyl 2-hydroxypropionate and ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, 3- Ethyl methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, 2-hydroxy-3-methylbutanoic acid Methyl ester, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate , Isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, Other esters such as ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxobutyrate; aromatic hydrocarbons such as toluene and xylene; N-methyl Pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide and other amidines. These organic solvents can be used alone or in combination of two or more. Among the above organic solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, and diethylene glycol methyl ester Diethyl ether, cyclohexanone, and 3-methoxybutyl acetate show excellent solubility in the following alkali-soluble resins, photopolymerizable monomers, and photopolymerization initiators, and can optimize the dispersibility of the colorants Therefore, it is preferable to use propylene glycol monomethyl ether acetate and 3-methoxybutyl acetate. The content of the dispersion medium in the colorant dispersion liquid is not particularly limited as long as it is a range in which the colorant (E) can be well dispersed. The amount of the dispersion medium is preferably an amount such that the solid content concentration of the colorant dispersion is 1% by mass or more and 50% by mass or less, and more preferably, the solid content concentration of the colorant dispersion is 5% by mass or more and 30%. Amount below mass%. <Manufacturing method of colorant dispersion liquid> The colorant dispersion liquid can be blended with a three-roller mill, a ball mill, a sand mill, or a kneading device to the pigment (E1), dispersant (E2), and other components such as dyes, It is produced by mixing (dispersing, kneading) with a dispersion medium, and filtering with a filter such as a membrane filter having a diameter of about 5 μm, if necessary. In the production of a colorant dispersion liquid, it is considered that the pigment (E1) and the dispersant (E2) are mixed (dispersed, kneaded) in a mixer or a kneading device together with the dispersant (E2). Interactions occur to obtain good pigment dispersion. After dispersing the pigment (E1) according to the method described above, the obtained dispersion liquid can be concentrated or diluted with a desired solvent, thereby adjusting the solid content concentration of the colorant dispersion liquid to a desired concentration. ≪Photosensitive resin composition≫ The photosensitive resin composition includes an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and the colorant dispersion liquid. The photosensitive resin composition having the above-mentioned structure can form a cured film with suppressed gas generation. In the following, essential or arbitrary components of the photosensitive resin composition and a method for preparing the photosensitive resin composition will be described. <Colorant Dispersion Liquid> As the colorant dispersion liquid, the above-mentioned dispersion liquid is used. The amount of the colorant dispersion liquid is not particularly limited as long as the photosensitive resin composition is colored in a desired hue and color density. The used amount of the colorant dispersion liquid is preferably such that the amount of the pigment (E1) is 5 mass% or more and 80 mass% or less, more preferably 25% with respect to the mass of the total solid content of the photosensitive resin composition. The amount is more than 60% by mass, and more preferably the amount is not less than 30% by mass and not more than 55% by mass. <Alkali-soluble resin (A)> The photosensitive resin composition contains an alkali-soluble resin (A) (it is also described as "(A) component" in this specification). Herein, in the present specification, the alkali-soluble resin (A) refers to a resin having a functional group (for example, a phenolic hydroxyl group, a carboxyl group, and a sulfonic acid group) having an alkali-soluble functional group in the molecule. As the alkali-soluble resin (A), an alkali-soluble resin that has been previously formulated in a photosensitive resin composition can be used without particular limitation. The alkali-soluble resin (A) preferably contains (A1) a resin having a phenolphthalo group (cardo) structure (hereinafter also referred to as "" (A1) phenolphthalein-based resin "). When the photosensitive resin composition of this embodiment contains (A1) a phenolphthalein-based resin, although it is uncertain about the point which can form the hardened | cured material whose gas generation is suppressed, the following influence is considered to exist. That is, first, the (A1) phenolphthalein-based resin has a large volume of a phenolphthalein-based structure. On the other hand, when a cured film is formed using a photosensitive resin composition, a plurality of epoxy groups or oxetanyl groups are provided in (A1) a phenolphthalein-based resin and a photopolymerizable monomer (B) or one molecule described below Crosslinking occurs between the multifunctional crosslinkable compounds (D). These effects are considered to interact with each other. When a cured product is formed using the photosensitive resin composition, a laminated structure including the cured product of the photosensitive resin composition is processed to form various elements, and the photosensitive resin composition is used. In the case of various elements and the like of the cured product, gas generation from the cured product is suppressed. (A1) The resin having a phenolphthalein group skeleton is not particularly limited as long as it is a specific alkali-soluble resin. The phenolphthalein skeleton refers to a skeleton in which a second cyclic structure and a third cyclic structure are bonded to one ring carbon atom constituting the first cyclic structure. The second cyclic structure and the third cyclic structure may be the same structure or different structures. As a representative example of a phenolphthalein skeleton, a skeleton having two aromatic rings (for example, a benzene ring) bonded to a carbon atom at the 9-position of a fluorene ring can be mentioned. (A1) The resin having a phenolphthalein group structure is not particularly limited, and a conventionally known resin can be used. Among them, a resin represented by the following formula (a-1) is preferred. [Chemical 12] (a-1) In formula (a-1), X a A base represented by the following formula (a-2). m1 represents an integer from 0 to 20. [Chemical 13] In the above formula (a-2), R a1 Each independently represents a hydrogen atom, a hydrocarbon group having 1 to 6 carbon atoms, or a halogen atom, R a2 Each independently represents a hydrogen atom or a methyl group, and R a3 Each independently represents a linear or branched alkylene, m2 represents 0 or 1, W a A base represented by the following formula (a-3). [Chemical 14] In formula (a-2), as R a3 It is preferably an alkylene group having 1 to 20 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, particularly preferably an alkylene group having 1 to 6 carbon atoms, and most preferably Preferred are ethane-1,2-diyl, propane-1,2-diyl, and propane-1,3-diyl. The ring A in the formula (a-3) represents an aliphatic ring which can be condensed with an aromatic ring and which may have a substituent. The aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocyclic ring. Examples of the aliphatic ring include a monocycloalkane, a bicycloalkane, a tricycloalkane, and a tetracycloalkane. Specific examples include monocycloalkanes such as cyclopentane, cyclohexane, cycloheptane, and cyclooctane; or adamantane, norane, isoane, tricyclodecane, and tetracyclododecane. The aromatic ring which can be condensed on the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and is preferably an aromatic hydrocarbon ring. Specifically, a benzene ring and a naphthalene ring are preferable. Preferred examples of the divalent base represented by the formula (a-3) include the following groups. [Chemical 15] Divalent radical X in formula (a-1) a By providing residue Z a The tetracarboxylic dianhydride reacts with a diol compound represented by the following formula (a-2a) and is introduced into the (A1) phenolphthalein-based resin. [Chemical 16] In formula (a-2a), R a1 , R a2 , R a3 , And m2 are as described in formula (a-2). The ring A in formula (a-2a) is as described in formula (a-3). The diol compound represented by the formula (a-2a) can be produced, for example, by the following method. First, if necessary, a hydrogen atom in a phenolic hydroxyl group of the diol compound represented by the following formula (a-2b) is substituted with -R according to a conventional method. a3 After the group represented by -OH, glycidylation is performed using epichlorohydrin or the like to obtain an epoxy compound represented by the following formula (a-2c). Then, an epoxy compound represented by the formula (a-2c) is reacted with acrylic acid or methacrylic acid to obtain a diol compound represented by the formula (a-2a). In formula (a-2b) and formula (a-2c), R a1 , R a3 , And m2 are as described in formula (a-2). The ring A in formula (a-2b) and formula (a-2c) is as described in formula (a-3). In addition, the manufacturing method of the diol compound represented by Formula (a-2a) is not limited to the said method. [Chemical 17] Preferred examples of the diol compound represented by the formula (a-2b) include the following diol compounds. [Chemical 18] In the above formula (a-1), R a0 Hydrogen atom or -CO-Y a -The base represented by COOH. Here, Y a Residue obtained by removing an acid anhydride group (-CO-O-CO-) from a dicarboxylic anhydride. Examples of the dicarboxylic anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methylidene. Tetrahydrophthalic anhydride, chlorobridged anhydride, methyltetrahydrophthalic anhydride, glutaric anhydride, etc. In the above formula (a-1), Z a Residue obtained by removing two acid anhydride groups from tetracarboxylic dianhydride. Examples of the tetracarboxylic dianhydride include tetracarboxylic dianhydride, pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, and biphenyltetracarboxylic acid represented by the following formula (a-4). Acid dianhydride, diphenyl ether tetracarboxylic dianhydride, etc. In the formula (a-1), m represents an integer of 0 to 20. [Chemical 19] (In formula (a-4), R a4 , R a5 , And R a6 Each independently represents one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom, and m3 represents an integer of 0 to 12) as Formula (a-4) R a4 An optional alkyl group is an alkyl group having 1 to 10 carbon atoms. When the number of carbon atoms in the alkyl group is within this range, the heat resistance of the obtained carboxylic acid ester can be further improved. In R a4 In the case of an alkyl group, the number of carbon atoms is preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, and even more preferably 1 or more in terms of easily obtaining a phenolphthalein-based resin having excellent heat resistance. It is 4 or less, particularly preferably 1 or more and 3 or less. In R a4 In the case of an alkyl group, the alkyl group may be linear or branched. As R in formula (a-4) a4 From the viewpoint of easily obtaining a phenolphthalein-based resin having excellent heat resistance, it is more preferably a hydrogen atom or an alkyl group having 1 or more and 10 or less carbon atoms, each independently. R in formula (a-4) a4 More preferably, it is a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, or an isopropyl group, and even more preferably a hydrogen atom or a methyl group. Plural R in formula (a-4) a4 In terms of easy production of high-purity tetracarboxylic dianhydride, the same group is preferred. M3 in formula (a-4) represents an integer of 0 or more and 12 or less. By setting the value of m3 to 12 or less, tetracarboxylic dianhydride can be easily purified. In terms of the ease of purification of tetracarboxylic dianhydride, the upper limit of m3 is preferably 5 and more preferably 3. In terms of the chemical stability of the tetracarboxylic dianhydride, the lower limit of m3 is preferably 1, and more preferably 2. M3 in formula (a-4) is particularly preferably 2 or 3. R in formula (a-4) a5 , And R a6 Alkyl groups having 1 to 10 carbon atoms and R a4 The selectable alkyl groups having 1 to 10 carbon atoms are the same. R a5 , And R a6 The tetracarboxylic dianhydride is easily purified, preferably a hydrogen atom or a carbon number of 1 or more and 10 or less (preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, and further preferably (1 or more and 4 or less, particularly preferably 1 or more and 3 or less), and particularly preferably a hydrogen atom or a methyl group. Examples of the tetracarboxylic dianhydride represented by the formula (a-4) include norbane-2-spiro-α-cyclopentanone-α'-spiro-2 ''-norbane-5,5 '' , 6,6 ''-tetracarboxylic dianhydride (alias `` norane-2-spiro-2'-cyclopentanone-5'-spiro-2 ''-norane-5,5 '', 6,6 `` -Tetracarboxylic dianhydride ''), methylnorane-2-spiro-α-cyclopentanone-α'-spiro-2 ''-(methylnorane) -5,5 '', 6, 6``-tetracarboxylic dianhydride, norkan-2-spiro-α-cyclohexanone-α'-spiro-2 ''-norcan-5,5 '', 6,6 ''-tetracarboxylic acid Dianhydride (alias `` norane-2-spiro-2'-cyclohexanone-6'-spiro-2 ''-norane-5,5 '', 6,6 ''-tetracarboxylic dianhydride '') , Methylnorane-2-spiro-α-cyclohexanone-α'-spiro-2 ''-(methylnorane) -5,5 '', 6,6 ''-tetracarboxylic dianhydride, Norbane-2-spiro-α-cycloacetone-α'-spiro-2 ''-norbane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbane-2-spiro-α -Cyclobutanone-α'-spiro-2 ''-norane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norane-2-spiro-α-cycloheptanone-α ' -Spiro-2 ''-norane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norane-2-spiro-α-cyclooctanone-α'-spiro-2 ''- Norbane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbane-2-spiro-α-cyclononanone-α'-spiro-2 ''-norbane-5,5 '',6,6''-tetracarboxylic dianhydride, norbane-2-spiro-α-cyclodecanone-α'-spiro-2''-norbane-5,5'',6,6'' -Tetracarboxylic Dianhydride, norbane-2-spiro-α-cycloundecone-α'-spiro-2 ''-norbane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norbane- 2-spiro-α-cyclododecanone-α'-spiro-2 ''-norane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norane-2-spiro-α- Cyclotridecanone-α'-spiro-2 ''-norane-5,5 '', 6,6 ''-tetracarboxylic dianhydride, norane-2-spiro-α-cyclotetradecanone-α '-Spiro-2''-norborne-5,5'',6,6''-tetracarboxylic dianhydride, norane-2-spiro-α-cyclopentadecanone-α'-spiro-2''-Norane-5,5'',6,6''-tetracarboxylic dianhydride, norane-2-spiro-α- (methylcyclopentanone) -α'-spiro-2''-nor -5,5 '', 6,6 ''-tetracarboxylic dianhydride, norane-2-spiro-α- (methylcyclohexanone) -α'-spiro-2 ''-norcan-5 , 5 '', 6,6 ''-tetracarboxylic dianhydride, etc. (A1) The weight average molecular weight of the phenolphthalein-based resin is preferably 1,000 or more and 40,000 or less, and more preferably 2,000 or more and 30,000 or less. By setting it as the said range, not only favorable developability can be acquired, but sufficient heat resistance and film strength can be acquired. As the alkali-soluble resin (A), it is also preferable to use (A2) an acrylic resin. (A2) The acrylic resin may be used alone or in combination with other alkali-soluble resins. Based on the above advantages of using (A1) phenolphthalein-based resin, when (A2) acrylic resin is used in combination with other alkali-soluble resins, it is preferable to use (A2) acrylic resin in combination with (A1) phenolphthalein-based resin. . As the (A2) acrylic resin, a resin containing a structural unit derived from (meth) acrylic acid and / or a structural unit derived from (meth) acrylate is used. (Meth) acrylic acrylic acid or methacrylic acid. The (meth) acrylate is represented by the following formula (a-5), and is not particularly limited as long as the object of the present invention is not impaired. [Chemical 20] In the above formula (a-5), R a7 Is a hydrogen atom or a methyl group, R a8 Is a monovalent organic group. The organic group may include a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may have any of a linear shape, a branched shape, and a cyclic shape. As R a8 The substituent other than the hydrocarbon group in the organic group is not particularly limited as long as the effect of the present invention is not impaired, and examples thereof include a halogen atom, a hydroxyl group, a mercapto group, a sulfur group, a cyano group, an isocyano group, a cyano group, and an isocyanate Acid group, thiocyanate group, isothiocyanate group, silane group, silanol group, alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamyl group, nitro group, nitroso group, carboxyl group , Carboxylate, fluorenyl, fluorenyloxy, sulfinyl, sulfo, sulfonate, phosphine, phosphine, phosphino, phosphono, hydroxyimine, alkyl ether, Alkyl sulfide group, aryl ether group, aryl sulfide group, amine group (-NH 2 , -NHR, -NRR ': R and R' each independently represent a hydrocarbon group) or the like. The hydrogen atom contained in the substituent may be substituted with a hydrocarbon group. In addition, the hydrocarbon group contained in the substituent may have any of a linear shape, a branched shape, and a cyclic shape. As R a8 Is preferably an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group. These groups may be substituted with a halogen atom, a hydroxyl group, an alkyl group, or a heterocyclic group. Further, in the case where these groups include an alkylene moiety, the alkylene moiety may be interrupted by an ether bond, a thioether bond, or an ester bond. When the alkyl group is linear or branched, the number of carbon atoms is preferably 1 or more and 20 or less, more preferably 1 or more and 15 or less, and even more preferably 1 or more and 10 or less. Preferable examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, and isopentyl , Second pentyl, third pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, second octyl, third octyl, n-nonyl, isononyl, n-decyl, isodecyl Base etc. When the alkyl group is an alicyclic group or a group containing an alicyclic group, examples of the preferable alicyclic group contained in the alkyl group include monocyclic alicyclic groups such as cyclopentyl and cyclohexyl. Formula, or polycyclic alicyclic groups such as adamantyl, noryl, isoyl, tricyclononyl, tricyclodecyl, and tetracyclododecyl. In the (A2) acrylic resin, compounds other than (meth) acrylic acid and (meth) acrylic acid ester may be polymerized. Examples of such other compounds include (meth) acrylamide, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, and styrenes. These compounds can be used alone or in combination of two or more. Examples of (meth) acrylamide include (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-diamine Alkyl (meth) acrylamide, N, N-diaryl (meth) acrylamide, N-methyl-N-phenyl (meth) acrylamide, N-hydroxyethyl-N- Methyl (meth) acrylamide and the like. Examples of the unsaturated carboxylic acids include monocarboxylic acids such as butenoic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; and these dicarboxylic acids Acid anhydride and so on. Examples of the allyl compound include allyl acetate, allyl hexanoate, allyl octoate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, Allyl acetate, such as allyl acetate, allyl lactate; allyloxyethanol, etc. Examples of vinyl ethers include hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, dimethylamino ethyl vinyl ether, di Alkyl vinyl ethers such as ethylamino ethyl vinyl ether, butyl amino ethyl vinyl ether, benzyl vinyl ether, and tetrahydrofurfuryl vinyl ether; vinyl phenyl ether, vinyl toluene ether, vinyl chlorophenyl ether , Vinyl aryl ethers such as vinyl-2,4-dichlorophenyl ether, vinyl naphthyl ether, vinyl o-anisole and the like. Examples of vinyl esters include vinyl butyrate, vinyl isobutyrate, vinyl trimethyl acetate, vinyl diethyl acetate, vinyl pivalate, vinyl hexanoate, vinyl chloroacetate, and Vinyl chloroacetate, vinyl methoxyacetate, vinyl butoxyacetate, vinyl phenyl acetate, ethyl acetate, vinyl lactate, vinyl butyrate-beta-phenyl ester, vinyl benzoate, Vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, vinyl naphthalate and the like. Examples of the styrenes include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, Alkyl such as hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxymethylstyrene, ethoxymethylstyrene, etc. Styrene; alkoxystyrene such as methoxystyrene, 4-methoxy-3-methylstyrene, dimethoxystyrene; chlorostyrene, dichlorostyrene, trichlorostyrene, Tetrachlorostyrene, pentachlorostyrene, bromostyrene, dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, 4-fluoro-3 -Halostyrene such as trifluoromethylstyrene. (A2) The amount of the (meth) acrylic acid-derived structural unit and the amount of the (meth) acrylic acid-derived structural unit in the acrylic resin are not particularly limited as long as the object of the present invention is not impaired. The amount of the structural unit derived from (meth) acrylic acid in the (A2) acrylic resin is preferably 5 mass% or more and 50 mass% or less, and more preferably 10 mass% or more, relative to the mass of the acrylic resin. And 30% by mass or less. The amount of structural units derived from (meth) acrylate in the (A2) acrylic resin is preferably 10% by mass or more and 95% by mass or less, more preferably 30% by mass relative to the mass of the acrylic resin. At least 90% by mass. (A2) The total amount of the (meth) acrylic acid-derived structural unit and the (meth) acrylic acid-derived structural unit in the acrylic resin is not particularly limited as long as the object of the present invention is not impaired, The mass of (A2) acrylic resin is preferably 5 mass% or more and 100 mass% or less, and more preferably 10 mass% or more and 100 mass% or less. (A2) The weight average molecular weight of the acrylic resin is preferably 2,000 or more and 200,000 or less, and more preferably 5,000 or more and 30,000 or less. By setting it as the said range, there exists a tendency for the film formation of the photosensitive resin composition to be easy to balance with the developability after exposure. When (A1) a phenolphthalein-based resin is used as the alkali-soluble resin (A), the ratio of the mass of the (A1) phenolphthalein-based resin to the mass of the alkali-soluble resin (A) is preferably 50% by mass or more, more It is preferably 70% by mass or more, more preferably 80% by mass or more, particularly preferably 90% by mass or more, and most preferably 100% by mass. The content of the alkali-soluble resin (A) is preferably 20% by mass or more and 85% by mass based on the mass (all solid content) of the photosensitive resin composition excluding the mass of the organic solvent (S) described below. Hereinafter, it is more preferably 25% by mass or more and 75% by mass or less. By setting it as the said range, the hardened film which does not generate gas easily can be formed, and the photosensitive resin composition excellent in developability can be obtained easily. <Photopolymerizable monomer (B)> As the photopolymerizable monomer (B), a monomer having an ethylenically unsaturated group can be preferably used. The monomer having an ethylenically unsaturated group includes a monofunctional monomer and a polyfunctional monomer. Examples of the monofunctional monomer include (meth) acrylamide, hydroxymethyl (meth) acrylamide, methoxymethyl (meth) acrylamide, and ethoxymethyl (methyl) Acrylamide, propoxymethyl (meth) acrylamide, butoxymethoxymethyl (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N-hydroxymethyl (Meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, butyl Enoic acid, 2-acrylamido-2-methylpropanesulfonic acid, tertiary butylacrylamidosulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate , 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2 (meth) acrylic acid 2 -Hydroxybutyl, 2-phenoxy-2-hydroxypropyl (meth) acrylate, 2- (meth) acryloxy-2-hydroxypropyl phthalate, glycerol mono (meth) acrylic acid Ester, tetrahydrofurfuryl (meth) acrylate, dimethylaminoethyl (meth) acrylate, (meth) propylene Glycidyl acid ester, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate, half (methyl) of phthalic acid derivatives ) Acrylate, etc. These monofunctional monomers can be used alone or in combination of two or more. On the other hand, examples of the polyfunctional monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, and propylene glycol di (Meth) acrylate, polypropylene glycol di (meth) acrylate, butanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate Base) acrylate, trimethylolpropane tri (meth) acrylate, glycerol di (meth) acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol Di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2,2- Bis (4- (meth) acryloxydiethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxypolyethoxyphenyl) propane, (methyl) 2-hydroxy-3- (meth) acrylic acid oxypropyl acrylate, ethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglylation Glyceryl ether di (meth) acrylate, diglycidyl phthalate di (meth) acrylate, glycerol triacrylate, glycerol polyglycidyl ether poly (meth) acrylate, (meth) acrylate Carbamate (that is, a reaction product of toluene diisocyanate, trimethylhexamethylene diisocyanate, hexamethylene diisocyanate, and the like with 2-hydroxyethyl (meth) acrylate), methylenebis (methyl Polyfunctional monomers such as acrylamide, (meth) acrylamide methylene ether, polycondensates of polyhydric alcohols and N-methylol (meth) acrylamide, or triacrylacetal. These polyfunctional monomers can be used alone or in combination of two or more kinds. Among these monomers having an ethylenically unsaturated group, trifunctional is preferred in terms of the tendency to improve the adhesion of the photosensitive resin composition to the substrate and the strength of the photosensitive resin composition after curing. The above-mentioned polyfunctional monomer is more preferably a 4-functional or more polyfunctional monomer, and even more preferably a 5-functional or more polyfunctional monomer. The content of the photopolymerizable monomer (B) in the composition is preferably 1 mass relative to the mass (all solid content) of the photosensitive resin composition excluding the mass of the organic solvent (S) described below. % Or more and 50% by mass or less, more preferably 5% by mass or more and 40% by mass or less. By setting it as the said range, there exists a tendency for sensitivity, developability, and resolution to be easily balanced. <Photopolymerization initiator (C)> The photopolymerization initiator (C) is not particularly limited, and a conventionally known photopolymerization initiator can be used. Specific examples of the photopolymerization initiator (C) include 1-hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, and 1- [4- (2-hydroxyethoxy) phenyl] -2-hydroxy-2-methyl-1-propane-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane 1-one, 1- (4-dodecylphenyl) -2-hydroxy-2-methylpropane-1-one, 2,2-dimethoxy-1,2-diphenylethane -1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-olinylpropane-1-one, 2- Benzyl-2-dimethylamino-1- (4-olinylphenyl) -butane-1-one, 1- [9-ethyl-6- (2-methylbenzylidene)- 9H-carbazol-3-yl] ethanone, 1- (O-acetamidooxime), (9-ethyl-6-nitro-9H-carbazol-3-yl) [4- (2-methyl Oxy-1-methylethoxy) -2-methylphenyl] methanone-O-acetamidooxime, 2- (benzyloxyimino) -1- [4- (phenylthio Phenyl) phenyl] -1-octanone, 2,4,6-trimethylbenzylidene diphenylphosphine oxide, 4-benzylidene-4'-methyldimethylsulfide, 4-bis Methylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino Benzyl 2-ethylhexyl ester, 2-dimethylamyl 4-dimethylaminobenzoate, benzoin-β-methoxyethyl acetal, benzoin dimethyl ketal, 1-phenyl- 1,2-propanedione-2- (O-ethoxycarbonyl) oxime, methyl o-benzoamidinebenzoate, 2,4-diethyl 9-oxosulfide , 2-chloro9-oxysulfur 2,4-dimethyl 9-oxosulfur , 1-chloro-4-propoxy9-oxysulfur ,sulfur 2-chlorosulfur 2,4-diethylsulfur 2-methylsulfur 2-isopropylsulfur , 2-ethylanthraquinone, octamethylanthraquinone, 1,2-benzoanthraquinone, 2,3-diphenylanthraquinone, azobisisobutyronitrile, benzamidine peroxide, isoperhydroperoxide Propylbenzene, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-bis (m-methoxyphenyl) imidazolyl Polymer, benzophenone, 2-chlorobenzophenone, p, p'-bisdimethylaminobenzophenone, 4,4'-bisdiethylaminobenzophenone, 4, 4'-Dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, benzoin, benzoin, benzoin methyl ether, benzoin ether, benzoin isopropyl ether, benzoin n-butyl ether , Benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminophenylacetone, dichloroacetophenone, tris Chloroacetophenone, p-third butyl acetophenone, p-dimethylaminoacetophenone, p-third butyl trichloroacetophenone, p-third butyl dichloroacetophenone, α, α- Dichloro-4-phenoxyacetophenone, 9-oxysulfur 2-methyl 9-oxysulfur , 2-isopropyl 9-oxysulfur , Dibenzocycloheptanone, 4-dimethylaminopentyl benzoate, 9-phenylacridine, 1,7-bis- (9-acridyl) heptane, 1,5-bis- ( 9-acridyl) pentane, 1,3-bis- (9-acridyl) propane, p-methoxytri, 2,4,6-tri (trichloromethyl) tris, 2-methyl -4,6-bis (trichloromethyl) tris, 2- [2- (5-methylfuran-2-yl) vinyl] -4,6-bis (trichloromethyl) tris, 2 -[2- (furan-2-yl) vinyl] -4,6-bis (trichloromethyl) tris, 2- [2- (4-diethylamino-2-methylphenyl) Vinyl] -4,6-bis (trichloromethyl) tris, 2- [2- (3,4-dimethoxyphenyl) vinyl] -4,6-bis (trichloromethyl) Mesitylene, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) mesitylene, 2- (4-ethoxystyryl) -4,6-bis (trichloro (Methyl) mesitylene, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) mesitylene, 2,4-bis-trichloromethyl-6- (3-bromo 4-methoxy) phenyl mesitylene, 2,4-bis-trichloromethyl-6- (2-bromo-4-methoxy) phenyl mesitylene, 2,4-bis-trichloromethyl 6- (3-bromo-4-methoxy) styrylphenyl mesitylene, 2,4-bis-trichloromethyl-6- (2-bromo-4-methoxy) styryl Phenyl are all third-class. These photopolymerization initiators can be used alone or in combination of two or more. Among these, in terms of sensitivity, it is particularly preferable to use an oxime-based photopolymerization initiator. Among the oxime-based photopolymerization initiators, particularly preferred ones include O-ethylfluorenyl-1- [6- (2-methylbenzylidene) -9-ethyl-9H-carbazole- 3-yl] ethanone oxime, 1- [9-ethyl-6- (pyrrole-2-ylcarbonyl) -9H-carbazol-3-yl] ethanone, 1- (O-acetamidooxime), And 1- [4- (phenylthio) -1,2-octanedione, 2- (O-benzylideneoxime)]. As the photopolymerization initiator, it is also preferable to use an oxime-based compound represented by the following formula (c1). [Chemical 21] (R c1 Is a group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, n1 is an integer of 0 to 4 and n2 is 0 or 1, R c2 Is a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent, R c3 Is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms) In formula (c1), R c1 There is no restriction | limiting in particular in the range which does not impair the objective of this invention, It can select suitably from various organic groups. As R c1 In the case of an organic group, examples include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, saturated aliphatic fluorenyl, alkoxycarbonyl, and Substituent phenyl, phenoxy which may have a substituent, benzamidine which may have a substituent, phenoxycarbonyl which may have a substituent, benzamyloxy which may have a substituent, may have a substituent Phenylalkyl, naphthyl which may have a substituent, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthyl which may have a substituent Alkoxy, naphthylalkyl which may have a substituent, heterocyclic group which may have a substituent, amine group, amine group substituted with 1 or 2 organic groups, phosphono-1-yl, and pipe-1- Group, halogen, nitro, and cyano. When n1 is an integer of 2 or more and 4 or less, R c1 It can be the same or different. The number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent which the substituent further has. In R c1 In the case of an alkyl group, the number of carbon atoms is preferably 1 or more and 20 or less, and more preferably the number of carbon atoms is 1 or more and 6 or less. Again, in R c1 In the case of an alkyl group, it may be a straight chain or a branched chain. As R c1 Specific examples in the case of an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, iso Pentyl, second pentyl, third pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, second octyl, third octyl, n-nonyl, isononyl, n-decyl, And isodecyl. Again, in R c1 In the case of an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propoxyethyl Oxyethyl, and methoxypropyl. In R c1 When it is an alkoxy group, it is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. Again, in R c1 When it is an alkoxy group, it may be straight chain or branched. As R c1 Specific examples in the case of an alkoxy group include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, second butoxy, and third Butoxy, n-pentyloxy, isopentyloxy, second pentyloxy, third pentyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, isooctyloxy, second octyloxy , Third octyloxy, n-nonyloxy, isononyloxy, n-decyloxy, and isodecyloxy. Again, in R c1 In the case of an alkoxy group, the alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, methoxyethoxyethoxy, ethoxyethoxyethoxy , Propoxyethoxyethoxy, and methoxypropoxy. In R c1 When it is a cycloalkyl group or a cycloalkoxy group, it is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less. As R c1 Specific examples in the case of a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. As R c1 Specific examples when it is a cycloalkoxy group include cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, and cyclooctyloxy. In R c1 In the case of a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyl group, the number of carbon atoms is preferably 2 or more and 20 or less, and more preferably the number of carbon atoms is 2 or more and 7 or less. As R c1 Specific examples in the case of a saturated aliphatic fluorenyl group include ethyl fluorenyl, propyl fluorenyl, n-butyl fluorenyl, 2-methylpropyl fluorenyl, n-pentyl fluorenyl, and 2,2-dimethylpropanyl , N-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-dodecyl, n-tetradecyl , N-fifteen carbon fluorenyl, and n-hexadecyl fluorenyl. As R c1 Specific examples in the case of saturated aliphatic fluorenyloxy include ethoxyl, propylfluorenyl, n-butylfluorenyloxy, 2-methylpropylfluorenyloxy, n-pentylfluorenyloxy, 2, 2-dimethylpropoxyl, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy, n-decylfluorenyloxy, n-undecylfluorenyloxy, n-dodecyloxy Carbofluorenyloxy, n-tridecylfluorenyloxy, n-tetradecylfluorenyloxy, n-pentadecafluorenyloxy, and n-hexadecylfluorenyloxy. In R c1 When it is an alkoxycarbonyl group, it is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. As R c1 Specific examples in the case of an alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, isopropoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, and Dibutoxycarbonyl, third butoxycarbonyl, n-pentoxycarbonyl, isopentoxycarbonyl, second pentoxycarbonyl, third pentoxycarbonyl, n-hexyloxycarbonyl, n-heptyloxycarbonyl, N-octyloxycarbonyl, isooctyloxycarbonyl, second octyloxycarbonyl, third octyloxycarbonyl, n-nonoxycarbonyl, isononyloxycarbonyl, n-decyloxycarbonyl, and isodecyloxycarbonyl Wait. In R c1 When it is a phenylalkyl group, 7 or more and 20 or less carbon atoms are preferable, and 7 or more and 10 or less carbon atoms are more preferable. Again, in R c1 When it is a naphthylalkyl group, it is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less. As R c1 Specific examples in the case of a phenylalkyl group include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. As R c1 Specific examples in the case of a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β-naphthyl) ethyl base. In R c1 In the case of phenylalkyl or naphthylalkyl, R c1 It may further have a substituent on a phenyl group or a naphthyl group. In R c1 When the heterocyclic group is a heterocyclic group, the heterocyclic group is a monocyclic ring containing five or six members of one or more N, S, and O, or is formed by condensing the monocyclic rings with each other or the monocyclic ring with a benzene ring. Heterocyclyl. In the case where the heterocyclic group is a condensed ring, the number of rings is at most 3. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyridine, pyrimidine, and , Benzofuran, benzothiophene, indole, isoindole, indole, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinoline Oxazoline, phthaloline, oxoline, and quinoline. In R c1 In the case of a heterocyclic group, the heterocyclic group may further have a substituent. In R c1 In the case of an amine group substituted with one or two organic groups, preferred examples of the organic group include an alkyl group having 1 to 20 carbon atoms, and a ring having 3 to 10 carbon atoms. Alkyl group, saturated aliphatic fluorenyl group having 2 or more and 20 carbon atoms, phenyl group which may have a substituent group, benzamidine group which may have a substituent group, and a carbon number group which may have a substituent group of 7 or more and 20 or less A phenylalkyl group, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthylalkyl group which may have a substituent having 11 or more and 20 carbon atoms, and a heterocyclic group. Specific examples of these preferred organic groups and R c1 the same. Specific examples of the amino group substituted with one or two organic groups include methylamino, ethylamino, diethylamino, n-propylamino, di-n-propylamino, iso Propylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n-nonylamino, n-decyl Amino, phenylamino, naphthylamino, ethynylamino, propionylamino, n-butylfluorenylamino, n-pentamylamino, n-hexylfluorenylamino, n-heptanylamino, N-octylamidinylamino, n-decamidinylamino, benzamidineamino, α-naphthylmethylamino, β-naphthylmethylamino, and the like. As R c1 Examples of the substituent when the phenyl, naphthyl, and heterocyclic group contained further have a substituent include an alkyl group having 1 to 6 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms. , Saturated aliphatic fluorenyl group having 2 or more and 7 carbon atoms, alkoxycarbonyl group having 2 or more and 7 carbon atoms, saturated aliphatic fluorenyl group having 2 or more and 7 carbon atoms, having carbon number Monoalkylamino group of an alkyl group of 1 or more and 6 or less, dialkylamino group of an alkyl group having 1 or more and 6 or less carbon atoms, chloro-1-yl, pipe-1-yl, halogen, nitro , And cyano. In R c1 When the phenyl, naphthyl, and heterocyclic group contained further has a substituent, the number of the substituent is not limited within a range that does not impair the object of the present invention, and is preferably 1 or more and 4 or less. In R c1 When the contained phenyl, naphthyl, and heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. R c1 Among them, in terms of chemical stability, small steric hindrance, and easy synthesis of an oxime ester compound, it is preferably selected from an alkyl group having 1 to 6 carbon atoms, and an alkyl group having 1 to 6 carbon atoms. The group in the group consisting of an alkoxy group and a saturated aliphatic fluorenyl group having 2 or more and 7 or less carbon atoms is more preferably an alkyl group having 1 or more and 6 carbon atoms, particularly preferably a methyl group. About R c1 At the bonding position on the phenyl group, c1 Among the phenyl groups to be bonded, when the position of the bond between the phenyl group and the main skeleton of the oxime ester compound is set to the 1 position and the position of the methyl group is set to the 2 position, the 4 or 5 position is preferred. It is more preferably 5 places. In addition, n1 is preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and even more preferably 0 or 1. R c2 A phenyl group which may have a substituent, or a carbazolyl group which may have a substituent. Again, in R c2 In the case of a carbazolyl group which may have a substituent, the nitrogen atom on the carbazolyl group may be substituted with an alkyl group having 1 to 6 carbon atoms. R c2 Here, the substitution of the phenyl or carbazolyl group is not particularly limited within a range that does not impair the object of the present invention. Examples of preferable substituents which the phenyl or carbazole may have based on a carbon atom include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and a carbon atom. A cycloalkyl group having 3 or more and 10 or less, a cycloalkoxy group having 3 or more and 10 carbon atoms, a saturated aliphatic fluorenyl group having 2 or more and 20 carbon atoms, an alkane having 2 or more and 20 carbon atoms An oxycarbonyl group, a saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, and a substituent A benzamidine group, a phenoxycarbonyl group which may have a substituent, a benzamyloxy group which may have a substituent, a phenylalkyl group having 7 or more and 20 or less carbon atoms, and a substituent Naphthyl, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthylmethyloxy which may have a substituent, carbon which may have a substituent A naphthylalkyl group having 11 or more and 20 atoms or less, a heterocyclic group which may have a substituent, Heterocyclic carbonyl groups, amine groups having substituents, amine groups substituted with 1 or 2 organic groups, phenan-1-yl, and pipe-1-yl, halogen, nitro, and cyano groups. In R c2 In the case of a carbazolyl group, examples of a preferable substituent which the carbazole may have based on a nitrogen atom include an alkyl group having 1 to 20 carbon atoms, and a ring having 3 to 10 carbon atoms. Alkyl, saturated aliphatic fluorenyl group having 2 or more and 20 carbon atoms, alkoxycarbonyl group having 2 or more and 20 carbon atoms, phenyl group which may have a substituent, benzamidine group which may have a substituent, A phenoxycarbonyl group which may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, and a substituent A naphthyloxycarbonyl group of a phenyl group, a naphthylalkyl group having a carbon number of 11 or more and 20 or less, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, and the like. Among these substituents, an alkyl group having 1 to 20 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an ethyl group is particularly preferred. Specific examples of the substituent which the phenyl group or carbazolyl group may have, alkyl group, alkoxy group, cycloalkyl group, cycloalkoxy group, saturated aliphatic fluorenyl group, alkoxycarbonyl group, saturated aliphatic fluorenyl group , A phenylalkyl group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, and an amino group substituted with 1 or 2 organic groups and R c1 the same. R c2 Examples of the substituent in the case where the phenyl, naphthyl, and heterocyclic group contained in the substituent included in the phenyl or carbazolyl group further have a substituent include carbon atoms of 1 or more and 6 or less Alkyl groups; alkoxy groups having 1 to 6 carbon atoms; saturated aliphatic fluorenyl groups having 2 to 7 carbon atoms; alkoxycarbonyl groups having 2 to 7 carbon atoms; 2 carbon atoms Saturated aliphatic fluorenyloxy groups of above and below 7; phenyl; naphthyl; benzamidine; naphthylmethyl; selected from alkyl, phenyl-1-yl, piperidine containing 1 to 6 carbon atoms A benzamidine group substituted with a group consisting of a -1-yl group and a phenyl group; a monoalkylamine group having an alkyl group having 1 to 6 carbon atoms; a group having 1 to 6 carbon atoms Alkyl dialkylamino; phen-1-yl; pipe-1--1-yl; halogen; nitro; cyano. In the case where the phenyl, naphthyl, and heterocyclic group contained in the substituent of the phenyl or carbazolyl group further has a substituent, the number of the substituent is not limited within a range that does not impair the object of the present invention, It is preferably 1 or more and 4 or less. When a phenyl group, a naphthyl group and a heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. R c2 Among them, from the viewpoint of easily obtaining a photopolymerization initiator having excellent sensitivity, the base represented by the following formula (c2) or (c3) is preferred, and the base represented by the following formula (c2) is more preferred The group is particularly preferably a group represented by the following formula (c2) and A is S. [Chemical 22] (R c4 Is a group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, A is S or O, and n3 is an integer of 0 to 4) [Chem. 23] (R c5 And R c6 Are each a monovalent organic group) R in formula (c2) c4 When it is an organic group, various organic groups can be selected within the range which does not impair the objective of this invention. As R in formula (c2) c4 In the case of an organic group, preferable examples include an alkyl group having 1 to 6 carbon atoms; an alkoxy group having 1 to 6 carbon atoms; and a saturated fat having 2 to 7 carbon atoms. Group fluorenyl groups; alkoxycarbonyl groups having 2 or more and 7 carbon atoms; saturated aliphatic fluorenyl groups having 2 or more and 7 carbon atoms; phenyl; naphthyl; benzamyl; naphthylmethyl; A benzamyl group substituted by a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a phenyl-1-yl group, a piperin-1-yl group and a phenyl group; a benzamidine group having a carbon number of 1 or more and Monoalkylamino group of an alkyl group of 6 or less; a dialkylamino group of an alkyl group having a carbon number of 1 or more and 6 or less; chloro-1-yl; pipe-1-yl; halogen; nitro; cyano . R c4 Among them, a benzamidine group is preferred; a naphthylmethyl group is selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a phenyl-1-yl group, a piperidin-1-yl group, and a phenyl group; -Substituted benzamidine; nitro. More preferred are benzamidine; naphthylmethyl; 2-methylphenylcarbonyl; 4- (piperidin-1-yl) phenylcarbonyl; 4- (phenyl) phenylcarbonyl. In formula (c2), n3 is preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and even more preferably 0 or 1. When n3 is 1, R c4 The bond position is preferably relative to R c4 The bonded phenyl group is bonded to the oxygen atom or sulfur atom to form a para bond. R in formula (c3) c5 Various organic groups can be selected within a range that does not impair the object of the present invention. As R c5 Preferable examples include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, and a carbon atom. Alkoxycarbonyl group of 2 or more and 20 or less, phenyl group which may have a substituent, benzamidine group which may have a substituent, phenoxycarbonyl group which may have a substituent, carbon number 7 which may have a substituent And a phenylalkyl group of 20 or less, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent, 11 or more and 20 or less carbon atoms which may have a substituent A naphthylalkyl group, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, and the like. R c5 Among these, an alkyl group having 1 to 20 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an ethyl group is particularly preferred. R in formula (c3) c6 There is no restriction | limiting in particular in the range which does not impair the objective of this invention, It can select from various organic groups. About suitable as R c6 Specific examples of the group include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R c6 Among these groups, a phenyl group which may have a substituent is more preferable, and a 2-methylphenyl group is particularly preferable. As R c4 , R c5 Or R c6 Examples of the substituent when the phenyl, naphthyl, and heterocyclic group contained further have a substituent include an alkyl group having 1 to 6 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms. , Saturated aliphatic fluorenyl group having 2 or more and 7 carbon atoms, alkoxycarbonyl group having 2 or more and 7 carbon atoms, saturated aliphatic fluorenyl group having 2 or more and 7 carbon atoms, having carbon number Monoalkylamino group of an alkyl group of 1 or more and 6 or less, dialkylamino group of an alkyl group having 1 or more and 6 or less carbon atoms, chloro-1-yl, pipe-1-yl, halogen, nitro , And cyano. In R c4 , R c5 Or R c6 When the phenyl, naphthyl, and heterocyclic group contained further has a substituent, the number of the substituent is not limited within a range that does not impair the object of the present invention, and is preferably 1 or more and 4 or less. In R c4 , R c5 Or R c6 When the contained phenyl, naphthyl, and heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. R in formula (c1) c3 It is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. As R c3 Is preferably a methyl group or an ethyl group, and more preferably a methyl group. Among the oxime ester compounds represented by the formula (c1), particularly suitable compounds include the following PI-1 to PI-42. [Chemical 24] [Chemical 25] [Chemical 26] [Chemical 27] [Chemical 28] [Chemical 29] The photopolymerization initiator is also preferably an oxime ester compound represented by the following formula (c4). [Chemical 30] (R c7 Hydrogen atom, nitro or monovalent organic group, R c8 And R c9 Are a linear alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, R c8 With R c9 Can also be bonded to each other to form a ring, R c10 Is a monovalent organic group, R c11 Is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms that may have a substituent, or an aryl group that may have substituents, n4 is an integer of 0 to 4 and n5 is 0 or 1) Here, as The oxime compound used to produce the oxime ester compound of formula (c4) is preferably a compound represented by the following formula (c5). [Chemical 31] (R c7 , R c8 , R c9 , R c10 , N4, and n5 are the same as in formula (c4)) In formulas (c4) and (c5), R c7 It is a hydrogen atom, a nitro group, or a monovalent organic group. On the 茀 ring in formula (c4), R c7 Bonded to and bonded to-(CO) n5 -The 6-membered aromatic ring on the base shown is different from the 6-membered aromatic ring. In formula (c4), R c7 The position of the bond on the ring is not particularly limited. The compound represented by formula (c4) has one or more R c7 In this case, in terms of the ease of synthesis of the compound represented by formula (c4), one or more R's are preferred. c7 One of them is bonded to two of the rings. In R c7 In case of plural, plural R c7 It can be the same or different. In R c7 In the case of an organic group, R c7 There is no restriction | limiting in particular in the range which does not impair the objective of this invention, It is suitably selected from various organic groups. As R c7 In the case of an organic group, examples include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, saturated aliphatic fluorenyl, alkoxycarbonyl, and Substituent phenyl, phenoxy which may have a substituent, benzamidine which may have a substituent, phenoxycarbonyl which may have a substituent, benzamyloxy which may have a substituent, may have a substituent Phenylalkyl, naphthyl which may have a substituent, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthyl which may have a substituent Alkoxy, naphthylalkyl which may have a substituent, heterocyclyl which may have a substituent, heterocyclylcarbonyl which may have a substituent, amino group substituted with one or two organic groups, phenoline-1- And piperidin-1-yl. In R c7 In the case of an alkyl group, the number of carbon atoms in the alkyl group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. Again, in R c7 In the case of an alkyl group, it may be a straight chain or a branched chain. As R c7 Specific examples in the case of an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, iso Pentyl, second pentyl, third pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, second octyl, third octyl, n-nonyl, isononyl, n-decyl, And isodecyl. Again, in R c7 In the case of an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propoxyethyl Oxyethyl, and methoxypropyl. In R c7 In the case of an alkoxy group, the number of carbon atoms in the alkoxy group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. Again, in R c7 When it is an alkoxy group, it may be straight chain or branched. As R c7 Specific examples in the case of an alkoxy group include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, second butoxy, and third Butoxy, n-pentyloxy, isopentyloxy, second pentyloxy, third pentyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, isooctyloxy, second octyloxy , Third octyloxy, n-nonyloxy, isononyloxy, n-decyloxy, and isodecyloxy. Again, in R c7 In the case of an alkoxy group, the alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, methoxyethoxyethoxy, ethoxyethoxyethoxy , Propoxyethoxyethoxy, and methoxypropoxy. In R c7 When it is a cycloalkyl group or a cycloalkoxy group, the carbon number of the cycloalkyl group or the cycloalkoxy group is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less. As R c7 Specific examples in the case of a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. As R c7 Specific examples when it is a cycloalkoxy group include cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, and cyclooctyloxy. In R c7 In the case of a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyl group, the number of carbon atoms of the saturated aliphatic fluorenyl group or the saturated aliphatic fluorenyl group is preferably 2 or more and 21 or less, more preferably 2 or more and 7 or less . As R c7 Specific examples in the case of a saturated aliphatic fluorenyl group include ethyl fluorenyl, propyl fluorenyl, n-butyl fluorenyl, 2-methylpropyl fluorenyl, n-pentyl fluorenyl, and 2,2-dimethylpropanyl , N-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-dodecyl, n-tetradecyl , N-fifteen carbon fluorenyl, and n-hexadecyl fluorenyl. As R c7 Specific examples in the case of saturated aliphatic fluorenyloxy include ethoxyl, propylfluorenyl, n-butylfluorenyloxy, 2-methylpropylfluorenyloxy, n-pentylfluorenyloxy, 2, 2-dimethylpropoxyl, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy, n-decylfluorenyloxy, n-undecylfluorenyloxy, n-dodecyloxy Carbofluorenyloxy, n-tridecylfluorenyloxy, n-tetradecylfluorenyloxy, n-pentadecafluorenyloxy, and n-hexadecylfluorenyloxy. In R c7 When it is an alkoxycarbonyl group, the carbon number of the alkoxycarbonyl group is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. As R c7 Specific examples in the case of an alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, isopropoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, and Dibutoxycarbonyl, third butoxycarbonyl, n-pentoxycarbonyl, isopentoxycarbonyl, second pentoxycarbonyl, third pentoxycarbonyl, n-hexyloxycarbonyl, n-heptyloxycarbonyl, N-octyloxycarbonyl, isooctyloxycarbonyl, second octyloxycarbonyl, third octyloxycarbonyl, n-nonoxycarbonyl, isononyloxycarbonyl, n-decyloxycarbonyl, and isodecyloxycarbonyl Wait. In R c7 In the case of a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less. Again, in R c7 In the case of a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less. As R c7 Specific examples in the case of a phenylalkyl group include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. As R c7 Specific examples in the case of a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β-naphthyl) ethyl base. In R c7 In the case of phenylalkyl or naphthylalkyl, R c7 It may further have a substituent on a phenyl group or a naphthyl group. In R c7 When the heterocyclic group is a heterocyclic group, the heterocyclic group is a monocyclic ring containing five or six members of one or more N, S, and O, or is formed by condensing the monocyclic rings with each other or the monocyclic ring with a benzene ring. Heterocyclyl. In the case where the heterocyclic group is a condensed ring, the number of rings is at most 3. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyridine, pyrimidine, and , Benzofuran, benzothiophene, indole, isoindole, indole, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinoline Oxazoline, phthaloline, oxoline, quinoline, piperidine, piperidine, phthaloline, piperidine, tetrahydropyran, and tetrahydrofuran. In R c7 In the case of a heterocyclic group, the heterocyclic group may further have a substituent. In R c7 In the case of a heterocyclylcarbonyl group, the heterocyclic group contained in the heterocyclylcarbonyl group and R c7 The same applies to the case of a heterocyclic group. In R c7 In the case of an amine group substituted with one or two organic groups, preferred examples of the organic group include an alkyl group having 1 to 20 carbon atoms, and a ring having 3 to 10 carbon atoms. Alkyl groups, saturated aliphatic fluorenyl groups having 2 or more and 21 carbon atoms, phenyl groups which may have a substituent, benzamidine groups which may have a substituent, and carbon atoms which may have a substituent of 7 or more and 20 or less A phenylalkyl group, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthylalkyl group which may have a substituent having 11 or more and 20 carbon atoms, and a heterocyclic group. Specific examples of these preferred organic groups and R c7 the same. Specific examples of the amino group substituted with one or two organic groups include methylamino, ethylamino, diethylamino, n-propylamino, di-n-propylamino, iso Propylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n-nonylamino, n-decyl Amino, phenylamino, naphthylamino, ethynylamino, propionylamino, n-butylfluorenylamino, n-pentamylamino, n-hexylfluorenylamino, n-heptanylamino, N-octylamidinylamino, n-decamidinylamino, benzamidineamino, α-naphthylmethylamino, β-naphthylmethylamino, and the like. As R c7 Examples of the substituent when the phenyl, naphthyl, and heterocyclic group contained further have a substituent include an alkyl group having 1 to 6 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms. , Saturated aliphatic fluorenyl group having 2 or more and 7 carbon atoms, alkoxycarbonyl group having 2 or more and 7 carbon atoms, saturated aliphatic fluorenyl group having 2 or more and 7 carbon atoms, having carbon number Monoalkylamino group of an alkyl group of 1 or more and 6 or less, dialkylamino group of an alkyl group having 1 or more and 6 or less carbon atoms, chloro-1-yl, pipe-1-yl, halogen, nitro , And cyano. In R c7 When the phenyl, naphthyl, and heterocyclic group contained further has a substituent, the number of the substituent is not limited within a range that does not impair the object of the present invention, and is preferably 1 or more and 4 or less. In R c7 When the contained phenyl, naphthyl, and heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. In the above description, as R c7 , If it is nitro, or R c12 The base represented by -CO- has a tendency to increase sensitivity, which is preferable. R c12 There is no restriction | limiting in particular in the range which does not impair the objective of this invention, It can select from various organic groups. About suitable as R c12 Examples of the group include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R c12, Among these groups, 2-methylphenyl, thien-2-yl, and α-naphthyl are particularly preferred. Also, if R c7 A hydrogen atom is preferable because it tends to have good transparency. Furthermore, if R c7 Is a hydrogen atom and R c10 It is a base represented by the following formula (c4a) or (c4b), and there exists a tendency for transparency to become more favorable. In formula (c4), R c8 And R c9 They are a linear alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom. R c8 With R c9 They may also be bonded to each other to form a ring. Among these bases, as R c8 And R c9 Is preferably a linear alkyl group which may have a substituent. In R c8 And R c9 In the case of a linear alkyl group which may have a substituent, the linear alkyl group may be a linear alkyl group or a branched alkyl group. In R c8 And R c9 In the case of a linear alkyl group having no substituent, the number of carbon atoms of the linear alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and even more preferably 1 or more and 6 or less. As R c8 And R c9 Specific examples in the case of a linear alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, and n-pentyl , Isopentyl, second pentyl, third pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, second octyl, third octyl, n-nonyl, isononyl, n-decyl And isodecyl. Again, in R c8 And R c9 In the case of an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propoxyethyl Oxyethyl, and methoxypropyl. In R c8 And R c9 In the case of a linear alkyl group having a substituent, the number of carbon atoms of the linear alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and even more preferably 1 or more and 6 or less. In this case, the number of carbon atoms of the substituent is not included in the number of carbon atoms of the chain alkyl group. The linear alkyl group having a substituent is preferably linear. The substitution which an alkyl group may have is not specifically limited in the range which does not impair the objective of this invention. Preferable examples of the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom, a chlorine atom, and a bromine atom are preferred. Examples of the cyclic organic group include a cycloalkyl group, an aromatic hydrocarbon group, and a heterocyclic group. As a specific example of a cycloalkyl group, R is c7 In the case of a cycloalkyl group, a preferable example is the same. Specific examples of the aromatic hydrocarbon group include phenyl, naphthyl, biphenyl, anthracenyl, and phenanthryl. Specific examples of heterocyclic groups c7 In the case of a heterocyclic group, preferable examples are the same. In R c7 In the case of an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group contained in the alkoxycarbonyl group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less. When a linear alkyl group has a substituent, the number of substituents is not specifically limited. The preferred number of substituents varies depending on the number of carbon atoms in the chain alkyl group. The number of substituents is typically 1 or more and 20 or less, preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less. In R c8 And R c9 In the case of a cyclic organic group, the cyclic organic group may be an alicyclic group or an aromatic group. Examples of the cyclic organic group include an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclic group. In R c8 And R c9 In the case of a cyclic organic group, the substituent which the cyclic organic group may have and R c8 And R c9 The same applies to the case of a linear alkyl group. In R c8 And R c9 In the case of an aromatic hydrocarbon group, the aromatic hydrocarbon group is preferably a phenyl group, or a group formed by a plurality of benzene rings via a carbon-carbon bond, or a group formed by a condensation of a plurality of benzene rings. . When the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensing a plurality of benzene rings, the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited, but is preferably 3 or less, more preferably It is 2 or less, and particularly preferably 1. Preferred specific examples of the aromatic hydrocarbon group include phenyl, naphthyl, biphenyl, anthracenyl, and phenanthryl. In R c8 And R c9 In the case of an aliphatic cyclic hydrocarbon group, the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic. The number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, but is preferably 3 or more and 20 or less, and more preferably 3 or more and 10 or less. Examples of the monocyclic cyclic hydrocarbon group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, noryl, isoyl, tricyclononyl, and tricyclic Decyl, tetracyclododecyl, and adamantyl. In R c8 And R c9 When the heterocyclic group is a heterocyclic group, the heterocyclic group is a monocyclic ring containing five or six members of one or more N, S, and O, or is formed by condensing the monocyclic rings with each other or the monocyclic ring with a benzene ring. Heterocyclyl. In the case where the heterocyclic group is a condensed ring, the number of rings is at most 3. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyridine, pyrimidine, and , Benzofuran, benzothiophene, indole, isoindole, indole, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinoline Oxazoline, phthaloline, oxoline, quinoline, piperidine, piperidine, phthaloline, piperidine, tetrahydropyran, and tetrahydrofuran. R c8 With R c9 They may also be bonded to each other to form a ring. Contains R c8 With R c9 The ring group to be formed is preferably a cycloalkylene group. In R c8 With R c9 In the case of bonding to form a cycloalkylene group, the ring constituting the cycloalkylene group is preferably a 5-membered ring to a 6-membered ring, and more preferably a 5-membered ring. In R c8 With R c9 When the bond-forming group is a cycloalkylene group, the cycloalkylene group may be condensed with one or more other rings. Examples of the ring condensable with a cycloalkylene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a furan ring, Thiophene ring, pyrrole ring, pyridine ring, pyridine ring, and pyrimidine ring. R described above c8 And R c9 Among them, as an example of a preferable basis, formula -A 1 -A 2 The indicated base. In the formula: A 1 For straight chain alkylene, A 2 It is an alkoxy group, a cyano group, a halogen atom, a halogenated alkyl group, a cyclic organic group, or an alkoxycarbonyl group. A 1 The number of carbon atoms of the straight chain alkylene group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less. At A 2 In the case of an alkoxy group, the alkoxy group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less. At A 2 When it is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are preferable, and a fluorine atom, a chlorine atom, and a bromine atom are more preferable. At A 2 In the case of a halogenated alkyl group, the halogen atom contained in the halogenated alkyl group is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, more preferably a fluorine atom, a chlorine atom, or a bromine atom. The halogenated alkyl group may be linear or branched, and is preferably linear. At A 2 In the case of a cyclic organic group, examples of cyclic organic groups and R c8 And R c9 The cyclic organic groups possessed by the substituents are the same. At A 2 In the case of an alkoxycarbonyl group, examples of the alkoxycarbonyl group and R c8 And R c9 The alkoxycarbonyl group in the form of a substituent is the same. As R c8 And R c9 Preferred specific examples include: alkyl groups such as ethyl, n-propyl, n-butyl, n-hexyl, n-heptyl, and n-octyl; 2-methoxyethyl, 3-methoxy-n-propyl 4-methoxy-n-butyl, 5-methoxy-n-pentyl, 6-methoxy-n-hexyl, 7-methoxy-n-heptyl, 8-methoxy-n-octyl, 2-ethoxy Ethyl, 3-ethoxy-n-propyl, 4-ethoxy-n-butyl, 5-ethoxy-n-pentyl, 6-ethoxy-n-hexyl, 7-ethoxy-n-heptyl, and 8 -Alkoxyalkyl groups such as ethoxy n-octyl; 2-cyanoethyl, 3-cyano-n-propyl, 4-cyano-n-butyl, 5-cyano-n-pentyl, 6-cyano-n-hexyl Cyanoalkyl such as methyl, 7-cyano-n-heptyl, and 8-cyano-n-octyl; 2-phenylethyl, 3-phenyl-n-propyl, 4-phenyl-n-butyl, 5-benzene Phenyl alkyl groups such as n-pentyl, 6-phenyl-n-hexyl, 7-phenyl-n-heptyl, and 8-phenyl-n-octyl; 2-cyclohexylethyl, 3-cyclohexyl-n-propyl, 4 -Cyclohexyl-n-butyl, 5-cyclohexyl-n-pentyl, 6-cyclohexyl-n-hexyl, 7-cyclohexyl-n-heptyl, 8-cyclohexyl-n-octyl, 2-cyclopentylethyl, 3-cyclopentyl N-propyl, 4-cyclopentyl-n-butyl, 5-cyclopentyl Cycloalkylalkyl such as pentyl, 6-cyclopentyl-n-hexyl, 7-cyclopentyl-n-heptyl, and 8-cyclopentyl-n-octyl; 2-methoxycarbonylethyl, 3-methoxy Carbonyl n-propyl, 4-methoxycarbonyl n-butyl, 5-methoxycarbonyl n-pentyl, 6-methoxycarbonyl n-hexyl, 7-methoxycarbonyl n-heptyl, 8-methoxycarbonyl N-octyl, 2-ethoxycarbonylethyl, 3-ethoxycarbonyl-n-propyl, 4-ethoxycarbonyl-n-butyl, 5-ethoxycarbonyl-n-pentyl, 6-ethoxycarbonyl-n-hexyl Alkoxycarbonylalkyl such as 7-ethoxycarbonyl-n-heptyl, and 8-ethoxycarbonyl-n-octyl; 2-chloroethyl, 3-chloro-n-propyl, 4-chloro-n-butyl, 5-chloro-n-pentyl, 6-chloro-n-hexyl, 7-chloro-n-heptyl, 8-chloro-n-octyl, 2-bromoethyl, 3-bromo-n-propyl, 4-bromo-n-butyl, 5-bromo N-pentyl, 6-bromo-n-hexyl, 7-bromo-n-heptyl, 8-bromo-n-octyl, 3,3,3-trifluoropropyl, and 3,3,4,4,5,5,5- Halogenated alkyl such as heptafluoron-pentyl. As R c8 And R c9 Among the above, ethyl, n-propyl, n-butyl, n-pentyl, 2-methoxyethyl, 2-cyanoethyl, 2-phenylethyl, and 2-cyclohexylethyl are preferred. Methyl, 2-methoxycarbonylethyl, 2-chloroethyl, 2-bromoethyl, 3,3,3-trifluoropropyl, and 3,3,4,4,5,5,5-hepta Fluoro-n-pentyl. As R c10 Examples of preferred organic groups, with R c7 Similarly, an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, a saturated aliphatic fluorenyl group, a phenyl group which may have a substituent, and Substituent phenoxy group, benzamyl group which may have a substituent group, phenoxycarbonyl group which may have a substituent group, benzamyloxy group which may have a substituent group, phenylalkyl group which may have a substituent group, may have Substituted naphthyl, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthylmethyloxy which may have a substituent, may have a substituent Naphthylalkyl, heterocyclic group which may have a substituent, heterocyclic carbonyl group which may have a substituent, amine group substituted with 1 or 2 organic groups, phosphon-1-yl, and pipe-1-yl Wait. Specific examples of these bases and R c7 The explanations are the same. Again, as R c10 It is also preferably a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylthioalkyl group which may have a substituent on the aromatic ring. Substituents which phenoxyalkyl and phenylthioalkyl can have and R c7 The phenyl groups contained may have the same substituents. Among organic groups, as R c10 Is preferably an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, or a phenylthioalkyl group which may have a substituent on the aromatic ring. The alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, and particularly preferably an alkyl group having 1 to 4 carbon atoms. Preferred is methyl. Among the phenyl groups which may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms in the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and even more preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and even more preferably 2. Among the cycloalkylalkyl groups, cyclopentylethyl is preferred. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and even more preferably 2. Among the phenylthioalkyl groups which may have a substituent on the aromatic ring, 2- (4-chlorophenylthio) ethyl is preferred. Again, as R c10 , Preferably -A 3 -CO-OA 4 The indicated base. A 3 It is a divalent organic group, preferably a divalent hydrocarbon group, and more preferably an alkylene group. A 4 It is a monovalent organic group, and a monovalent hydrocarbon group is preferable. At A 3 In the case of an alkylene group, the alkylene group may be linear or branched, and is preferably linear. At A 3 In the case of an alkylene group, the number of carbon atoms of the alkylene group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and even more preferably 1 or more and 4 or less. As A 4 Preferred examples include an alkyl group having 1 to 10 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an aromatic hydrocarbon group having 6 to 20 carbon atoms. As A 4 Preferred specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, n-hexyl, phenyl , Naphthyl, benzyl, phenethyl, α-naphthylmethyl, and β-naphthylmethyl. As-A 3 -CO-OA 4 Preferable specific examples of the represented group include 2-methoxycarbonylethyl, 2-ethoxycarbonylethyl, 2-n-propoxycarbonylethyl, 2-n-butoxycarbonylethyl , 2-n-pentyloxycarbonylethyl, 2-n-hexyloxycarbonylethyl, 2-benzyloxycarbonylethyl, 2-phenoxycarbonylethyl, 3-methoxycarbonyl n-propyl, 3- Ethoxycarbonyl n-propyl, 3-n-propoxycarbonyl-n-propyl, 3-n-butoxycarbonyl-n-propyl, 3-n-pentoxycarbonyl-n-propyl, 3-n-hexyloxycarbonyl-n-propyl , 3-benzyloxycarbonyl-n-propyl, and 3-phenoxycarbonyl-n-propyl. Above for R c10 Clarified as R c10 Is preferably a base represented by the following formula (c4a) or (c4b). [Chemical 32] (In formulae (c4a) and (c4b), R c13 And R c14 Are organic groups, n6 is an integer from 0 to 4 c13 And R 8 In the case of adjacent positions on the benzene ring, R c13 With R c14 Can be bonded to each other to form a ring, n7 is an integer from 1 to 8 and n8 is an integer from 1 to 5 and n9 is an integer from 0 to (n8 + 3). R c15 Is an organic group) About R in formula (c4a) c13 And R c14 Examples of Organic Groups and R c7 the same. As R c13 Is preferably an alkyl group or a phenyl group. In R c13 In the case of an alkyl group, the number of carbon atoms is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, even more preferably 1 or more and 3 or less, and most preferably 1. That is, R c13 Most preferred is methyl. In R c13 With R c14 When a ring is formed by bonding, the ring may be an aromatic ring or an aliphatic ring. As R in the base represented by formula (c4a) c13 With R c14 Preferable examples of the ring-forming group include naphthalen-1-yl or 1,2,3,4-tetrahydronaphthalen-5-yl. In the formula (c4a), n6 is an integer of 0 or more and 4 or less, preferably 0 or 1, and more preferably 0. In the above formula (c4b), R c15 Is organic. Examples of the organic group include those related to R c7 The illustrated organic groups are the same. Among the organic groups, an alkyl group is preferred. The alkyl group may be linear or branched. The number of carbon atoms of the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and even more preferably 1 or more and 3 or less. As R c15 It can be preferably exemplified by methyl, ethyl, propyl, isopropyl, butyl, etc. Among these, methyl is more preferable. In the formula (c4b), n8 is an integer of 1 or more and 5 or less, preferably an integer of 1 or more and 3 or less, and more preferably 1 or 2. In the formula (c4b), n9 is 0 or more and (n8 + 3) or less, preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and even more preferably 0. In the formula (c4b), n7 is an integer of 1 or more and 8 or less, preferably an integer of 1 or more and 5 or less, more preferably an integer of 1 or more and 3 or less, and particularly preferably 1 or 2. In formula (c4), R c11 It is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. As R c11 In the case of an alkyl group, a substituent which may be possessed is preferably exemplified by phenyl, naphthyl and the like. Again, as R c7 In the case where it is an aryl group, a substituent which may be included is preferably exemplified by an alkyl group having 1 to 5 carbon atoms, an alkoxy group, a halogen atom, and the like. In formula (c4), as R c11 Can be better exemplified: hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, phenyl, benzyl, methylphenyl, naphthyl, etc., among these, more preferable Methyl or phenyl. Preferred specific examples of the compound represented by formula (c4) include PI-43 to PI-83 below. [Chemical 33] [Chem 34] The content of the photopolymerization initiator (C) is preferably 0.5% by mass or more and 30% by mass relative to the mass of the photosensitive resin composition (all solid content components) excluding the mass of the organic solvent (S) described below. Mass% or less, more preferably 1 mass% or more and 20 mass% or less. By setting the content of the photopolymerization initiator (C) to the above range, a photosensitive resin composition that is less likely to cause pattern shape defects can be obtained. Moreover, a photoinitiator can also be combined with a photoinitiator (C). Examples of the photoinitiator include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Isoamyl dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N, N-dimethyl-p-toluidine, 4,4'-bis (dimethylamino) benzophenone, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxy Anthracene, 2-ethyl-9,10-diethoxyanthracene, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-5-methoxybenzene Thiol compounds such as benzothiazole, 3-mercaptopropionic acid, methyl 3-mercaptopropionate, pentaerythritol tetramercaptoacetate, 3-mercaptopropionate, and the like. These photoinitiators can be used alone or in combination of two or more. <Multifunctional crosslinkable compound (D)> The photosensitive resin composition preferably contains a polyfunctional crosslinkable compound (D). The polyfunctional crosslinkable compound (D) is a compound having crosslinkability of a plurality of epoxy groups or oxetanyl groups in one molecule. The epoxy equivalent or oxetan equivalent of the polyfunctional crosslinkable compound (D) is preferably 50 g / eq or more and 350 g / eq or less. When the photosensitive resin composition contains a polyfunctional crosslinkable compound having an epoxy equivalent or an oxetanyl equivalent in such a range, when the photosensitive resin composition is used to form a cured film, the alkali-soluble resin (A) Tight cross-linking makes it particularly easy to suppress gas generation from the cured film. Moreover, in terms of the effect being more significant, the epoxy equivalent or oxetan equivalent of the polyfunctional crosslinkable compound (D) is more preferably 60 g / eq or more and 320 g / eq or less, and more preferably It is 70 g / eq or more and 300 g / eq or less, particularly preferably 75 g / eq or more and 280 g / eq or less. In terms of cross-linking reactivity when forming a cured film, the polyfunctional cross-linkable compound (D) preferably contains an epoxy compound having two or more epoxy groups per molecule, and more preferably contains An epoxy compound having three or more epoxy groups in one molecule. In the polyfunctional crosslinkable compound (D), the content of the epoxy compound having two or more epoxy groups per molecule is preferably 50% by mass or more, more preferably 70% by mass or more, and even more preferably 80%. More than mass%, particularly preferably more than 90% by mass, and most preferably 100% by mass. As the polyfunctional crosslinkable compound (D), as long as the epoxy equivalent or oxetanyl equivalent is within a specific range, a polyfunctional epoxy compound or a polyfunctional oxa compound previously formulated in various hardening compositions can be used. Cyclobutane compounds. The molecular weight of the polyfunctional epoxy compound or polyfunctional oxetane compound contained in the polyfunctional crosslinkable compound (D) is not particularly limited as long as the object of the present invention is not impaired. The molecular weight of the polyfunctional epoxy compound or polyfunctional oxetane compound is preferably 5,000 or less in terms of less steric hindrance and easy to efficiently crosslink molecular chains of the alkali-soluble resin (A). It is more preferably 4500 or less, and particularly preferably 4000 or less. The lower limit of the molecular weight is not particularly limited, and is, for example, 150 or more. The polyfunctional crosslinkable compound (D) may be a compound containing an aromatic group or a compound containing no aromatic group. The polyfunctional crosslinkable compound (D) is preferably a compound that does not contain an aromatic group, from the viewpoint of easily obtaining a photosensitive resin composition capable of forming a cured product with less gas generation. As an example of a preferable polyfunctional crosslinking compound (D), the polyfunctional alicyclic epoxy compound which has an alicyclic epoxy group is mentioned. Specific examples of the alicyclic epoxy compound include 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexanedioxane and hexanedioxane. Bis (3,4-epoxycyclohexylmethyl) acid ester, bis (3,4-epoxy-6-methylcyclohexylmethyl) adipate, 3 ', 4'-epoxy-6' -Methylcyclohexanecarboxylic acid 3,4-epoxy-6-methylcyclohexyl ester, ε-caprolactone modified 3 ', 4'-epoxycyclohexanecarboxylic acid 3,4-epoxy ring Hexyl methyl ester, trimethyl caprolactone modified 3 ', 4'-epoxycyclohexanecarboxylic acid 3,4-epoxy cyclohexyl methyl ester, β-methyl-δ-valerolactone modified 3' , 4'-epoxycyclohexanecarboxylic acid 3,4-epoxycyclohexyl methyl ester, methylene bis (3,4-epoxycyclohexane), ethylene glycol bis (3,4-epoxy Cyclohexylmethyl) ether, ethylene bis (3,4-epoxycyclohexanecarboxylate), and a polyfunctional epoxy compound having a triepoxydecenyl group, or the following formula (d1-1) To the compound represented by (d1-5). These alicyclic epoxy compounds may be used alone or in combination of two or more. [Chemical 35] (In formula (d1-1), Z represents a single bond or a linking group (a divalent group having one or more atoms). R d1 ~ R d18 And each is independently a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group) as the linking group Z, and examples thereof include: -, -SO-, -SO 2 -, -CBr 2 -, -C (CBr 3 ) 2 -, -C (CF 3 ) 2 -, And -R d19 Divalent bases in the group consisting of -O-CO- and bases formed by a plurality of these bonds. Examples of the divalent hydrocarbon group as the linking group Z include a linear or branched alkylene group having 1 to 18 carbon atoms, and a divalent alicyclic hydrocarbon group. Examples of the linear or branched alkylene group having 1 to 18 carbon atoms include methylene, methylmethylene, dimethylmethylene, dimethylene, and trimethylene. Base etc. Examples of the divalent alicyclic hydrocarbon group include 1,2-cyclopentyl, 1,3-cyclopentyl, cyclopentylene, 1,2-cyclohexyl, and 1,3-cyclohexyl. Hexyl, 1,4-cyclohexyl, cyclohexylene and other cycloalkyl (including cycloalkylene) and the like. R d19 It is an alkylene group having 1 to 8 carbon atoms, and is preferably a methylene group or an ethylidene group. [Chemical 36] (In formula (d1-2), R d1 ~ R d12 Is a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group) [Chem. 37] (In formula (d1-3), R d1 ~ R d10 It is a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group. R d2 And R d8 Can be bonded to each other) [Chem 38] (In formula (d1-4), R d1 ~ R d12 It is a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group. R d2 And R d10 Can be bonded to each other) [Chem 39] (In formula (d1-5), R d1 ~ R d12 Is a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group) In the formulae (d1-1) to (d1-5), in R d1 ~ R d18 In the case of an organic group, the organic group is not particularly limited within a range that does not impair the object of the present invention, and may be a hydrocarbon group, a group including a carbon atom and a halogen atom, or a group including a carbon atom and a hydrogen atom, and a halogen atom, for example. , Oxygen atom, sulfur atom, nitrogen atom, hetero atom of silicon atom and the like. Examples of the halogen atom include a chlorine atom, a bromine atom, an iodine atom, and a fluorine atom. The organic group is preferably a hydrocarbon group, a group containing a carbon atom, a hydrogen atom, and an oxygen atom, a halogenated hydrocarbon group, a group containing a carbon atom, an oxygen atom, and a halogen atom, and a group containing a carbon atom, a hydrogen atom, an oxygen atom, and a halogen atom. . When the organic group is a hydrocarbon group, the hydrocarbon group may be an aromatic hydrocarbon group, an aliphatic hydrocarbon group, or a group including an aromatic skeleton and an aliphatic skeleton. The number of carbon atoms of the organic group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and even more preferably 1 or more and 5 or less. Specific examples of the hydrocarbon group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, n-hexyl, and n-heptyl , N-octyl, 2-ethylhexyl, n-nonyl, n-decyl, n-undecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, Chain alkyl groups such as n-heptadecyl, n-octadecyl, n-decadecyl, and n-icosyl; vinyl, 1-propenyl, 2-n-propenyl (allyl), 1 -Alkenyl groups such as n-butenyl, 2-n-butenyl, and 3-n-butenyl; cycloalkyl, cyclobutyl, cyclopentyl, cyclohexyl, and cycloheptyl; Phenyl, o-tolyl, m-tolyl, p-tolyl, α-naphthyl, β-naphthyl, biphenyl-4-yl, biphenyl-3-yl, biphenyl-2-yl, anthryl, and Aryl groups such as phenanthryl; aralkyl groups such as benzyl, phenethyl, α-naphthylmethyl, β-naphthylmethyl, α-naphthylethyl, and β-naphthylethyl. Specific examples of the halogenated hydrocarbon group are as follows: chloromethyl, dichloromethyl, trichloromethyl, bromomethyl, dibromomethyl, tribromomethyl, fluoromethyl, difluoromethyl, trifluoromethyl, 2 , 2,2-trifluoroethyl, pentafluoroethyl, heptafluoropropyl, perfluorobutyl, and perfluoropentyl, perfluorohexyl, perfluoroheptyl, perfluorooctyl, perfluorononyl, And halogenated chain alkyl groups such as perfluorodecyl; 2-chlorocyclohexyl, 3-chlorocyclohexyl, 4-chlorocyclohexyl, 2,4-dichlorocyclohexyl, 2-bromocyclohexyl, 3-bromocyclohexyl And halogenated cycloalkyl such as 4-bromocyclohexyl; 2-chlorophenyl, 3-chlorophenyl, 4-chlorophenyl, 2,3-dichlorophenyl, 2,4-dichlorophenyl, 2 2,5-dichlorophenyl, 2,6-dichlorophenyl, 3,4-dichlorophenyl, 3,5-dichlorophenyl, 2-bromophenyl, 3-bromophenyl, 4-bromo Halogenated aryl groups such as phenyl, 2-fluorophenyl, 3-fluorophenyl, 4-fluorophenyl; 2-chlorophenylmethyl, 3-chlorophenylmethyl, 4-chlorophenylmethyl, 2 -Bromophenylmethyl, 3-bromophenylmethyl, 4-bromophenylmethyl, 2-fluorophenylmethyl, 3-fluorophenylmethyl, 4-fluorophenylmethyl, etc. base. Specific examples of the group containing a carbon atom, a hydrogen atom, and an oxygen atom are as follows: a hydroxy chain alkyl group such as hydroxymethyl, 2-hydroxyethyl, 3-hydroxy-n-propyl, and 4-hydroxy-n-butyl; 2-hydroxy Halogenated cycloalkyl such as cyclohexyl, 3-hydroxycyclohexyl, and 4-hydroxycyclohexyl; 2-hydroxyphenyl, 3-hydroxyphenyl, 4-hydroxyphenyl, 2,3-dihydroxyphenyl, 2, Hydroxyaryl groups such as 4-dihydroxyphenyl, 2,5-dihydroxyphenyl, 2,6-dihydroxyphenyl, 3,4-dihydroxyphenyl, and 3,5-dihydroxyphenyl; 2- Hydroxyaralkyl such as hydroxyphenylmethyl, 3-hydroxyphenylmethyl, and 4-hydroxyphenylmethyl; methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy , Isobutoxy, second butoxy, third butoxy, n-pentoxy, n-hexyloxy, n-heptyloxy, n-octyloxy, 2-ethylhexyloxy, n-nonyloxy, N-decyloxy, n-undecyloxy, n-tridecyloxy, n-tetradecyloxy, n-pentadecyloxy, n-hexadecyloxy, n-heptadecyloxy, n-octadecyloxy Chain alkoxy groups such as alkoxy, n-nonadecanyloxy, and n-eicosyloxy; vinyloxy, 1-propenyloxy Alkenyl, 2-n-propenyloxy (allyloxy), 1-n-butenyloxy, 2-n-butenyloxy, and 3-n-butenyloxy; alkenyloxy; phenoxy, O-tolyloxy, m-tolyloxy, p-tolyloxy, α-naphthyloxy, β-naphthyloxy, biphenyl-4-yloxy, biphenyl-3-yloxy, biphenyl-2- Aryloxy, anthryloxy, and phenanthryloxy; benzyloxy, phenethyloxy, α-naphthylmethoxy, β-naphthylmethoxy, α-naphthylethoxy, And aralkyloxy groups such as β-naphthylethoxy; methoxymethyl, ethoxymethyl, n-propoxymethyl, 2-methoxyethyl, 2-ethoxyethyl, 2 -N-propoxyethyl, 3-methoxy-n-propyl, 3-ethoxy-n-propyl, 3-n-propoxy-n-propyl, 4-methoxy-n-butyl, 4-ethoxy Alkoxyalkyl groups such as n-butyl and 4-n-propoxyn-butyl; methoxymethoxy, ethoxymethoxy, n-propoxymethoxy, 2-methoxyethoxy Methyl, 2-ethoxyethoxy, 2-n-propoxyethoxy, 3-methoxy-n-propoxy, 3-ethoxy-n-propoxy, 3-n-propoxy-n-propoxy Methyl, 4-methoxy-n-butoxy, 4-ethoxy-n-butoxy , And alkoxyalkoxy groups such as 4-n-propoxyn-butoxy group; alkoxyaryl groups such as 2-methoxyphenyl, 3-methoxyphenyl, and 4-methoxyphenyl ; Alkoxy aryloxy groups such as 2-methoxyphenoxy, 3-methoxyphenoxy, and 4-methoxyphenoxy; formamyl, ethylamyl, propionyl, butylamyl, Aliphatic fluorenyl groups such as pentamyl, hexamethylene, heptyl, octyl, nonyl, and decyl; aromatic benzyl, α-naphthyl, and β-naphthyl Fluorenyl; methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, n-butoxycarbonyl, n-pentoxycarbonyl, n-hexylcarbonyl, n-heptyloxycarbonyl, n-octyloxycarbonyl, n-nonoxy Chain alkoxycarbonyl groups such as carbonyl and n-decoxycarbonyl; aryloxycarbonyl groups such as phenoxycarbonyl, α-naphthyloxycarbonyl, and β-naphthyloxycarbonyl; formamyloxy, acetamyloxy Aliphatic alkoxy groups such as propyl, propionyloxy, butyryloxy, pentyloxy, hexamethyleneoxy, heptyloxy, octyloxy, nonyloxy, and decyloxy; benzene Aromatic groups such as formamyloxy, α-naphthylmethyloxy, and β-naphthylmethyloxy Group. R d1 ~ R d18 It is preferably a group independently selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, in particular, In terms of easy formation of a cured film having excellent mechanical properties, R is more preferred d1 ~ R d18 All are hydrogen atoms. In the formulae (d1-2) to (d1-5), R d1 ~ R d12 And R in formula (d1-1) d1 ~ R d12 the same. In formula (d1-2) and formula (d1-4), as R d2 And R d10 Examples of divalent radicals formed in the case of mutual bonding include -CH 2 -, -C (CH 3 ) 2 -. In formula (d1-3), as R d2 And R d8 Examples of divalent radicals formed in the case of mutual bonding include -CH 2 -, -C (CH 3 ) 2 -. Among the alicyclic epoxy compounds represented by the formula (d1-1), preferred specific examples of the compound include the following formula (d1-1a), (d1-1b), and (d1-1c) ), An alicyclic epoxy compound, or 2,2-bis (3,4-epoxycyclohexane-1-yl) propane [= 2,2-bis (3,4-epoxycyclohexyl) Propane] and so on. [Chemical 40] Among the alicyclic epoxy compounds represented by the formula (d1-2), preferable specific examples of the compound include a bicyclononadiene diepoxide represented by the following formula (d1-2a), Or bicyclononadiene diepoxide and the like. [Chemical 41] Among the alicyclic epoxy compounds represented by the formula (d1-3), as preferable specific examples of the compound, S-spiro [3-oxatricyclo [3.2.1.0] 2,4 ] Octane-6,2'-ethylene oxide] and the like. Among the alicyclic epoxy compounds represented by the formula (d1-4), preferred specific examples of the compound include 4-vinylcyclohexene dioxide, dipentene dioxide, limonene dioxide, and 1 -Methyl-4- (3-methyloxiran-2-yl) -7-oxabicyclo [4.1.0] heptane and the like. Among the alicyclic epoxy compounds represented by the formula (d1-5), preferred specific examples of the compound include 1,2,5,6-diepoxycyclooctane and the like. Examples of the epoxy compound other than the alicyclic epoxy compound that can be preferably used as the polyfunctional crosslinkable compound (D) include bisphenol A-type epoxy resin and bisphenol F-type ring. Epoxy resin, bisphenol S epoxy resin, bisphenol AD epoxy resin, naphthalene epoxy resin, and biphenyl epoxy resin; bifunctional epoxy resin; phenol novolac epoxy resin, brominated phenol Novolac epoxy resins such as novolac epoxy resin, o-cresol novolac epoxy resin, bisphenol A novolac epoxy resin, and bisphenol AD novolac epoxy resin; dicyclopentadiene type Cycloaliphatic epoxy resins such as epoxide of phenol resin; aromatic epoxy resins such as epoxide of naphthalene phenol resin; 9,9-bis [4- (glycidyloxy) phenyl] -9H- Hydrazone, 9,9-bis [4- [2- (glycidyloxy) ethoxy] phenyl] -9H-fluorene, 9,9-bis [4- [2- (glycidyloxy) ethyl ] Phenyl] -9H-fluorene, 9,9-bis [4- (glycidyloxy) -3-methylphenyl] -9H-fluorene, 9,9-bis [4- (glycidyloxy) -3,5-dimethylphenyl] -9H-fluorene, and 9,9-bis (6-glycidyloxynaphthalen-2-yl) -9H-fluorene, etc. Epoxy-containing fluorene compounds; glycidyl-type epoxy resins such as glycidyl dimer and triglycidyl; tetraglycidylaminodiphenylmethane, triglycidyl-p-aminophenol, Glycidyl metaxylylenediamine and tetraglycidyl bisaminomethylcyclohexane and other glycidylamine-type epoxy resins; heterocyclic epoxy resins such as isocyanuric acid triglycidyl ester; Phenol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, glycerol triglycidyl ether, 2- [4- (2,3-glycidoxy) phenyl ] -2- [4- [1,1-bis [4- (2,3-glycidoxy) phenyl] ethyl] phenyl] propane, and 1,3-bis [4- [1- [4- (2,3-glycidoxy) phenyl] -1- [4- [1- [4- (2,3-glycidoxy) phenyl] -1-methylethyl ] Phenyl] ethyl] phenoxy] -2-propanol and other trifunctional epoxy resins; tetrahydroxyphenylethane tetraglycidyl ether, tetraglycidyl benzophenone, bisresorcinol tetra Four-functional epoxy resins such as glycidyl ether and tetraglycidyloxybiphenyl; 1,2-epoxy-4- (2-, 2-bis (hydroxymethyl) -1-butanol) Ethylene oxide) cyclohexane adduct. A related commercial product of 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol is EHPE-3150 ( (Made by Daicel). Examples of the oxetane compound that can be preferably used as the polyfunctional crosslinkable compound (D) include bis-1-ethyl-3-oxetanyl methyl ether and 1,4-bis-3- Dioxane compounds such as ethyloxetane-3-ylmethoxymethylbenzene and the like. Furthermore, the compound represented by the following formula (d1-6) can be preferably used as a polyfunctional crosslinkable compound (D). [Chemical 42] (In formula (d1-6), R d20 ~ R d22 Linear, branched, or cyclic alkylene, arylene, -O-, -C (= O)-, -NH-, and groups containing combinations thereof may be the same or different . E 1 ~ E 3 It is selected from the group consisting of epoxy group, oxetanyl group, ethylenically unsaturated group, alkoxysilyl group, isocyanate group, blocked isocyanate group, thiol group, carboxyl group, hydroxyl group, and succinic anhydride group. At least one substituent or hydrogen atom in the group. Where E 1 ~ E 3 At least two of them are at least one selected from the group consisting of epoxy and oxetanyl) In formula (d1-6), R d20 With E 1 , R d21 With E 2 , And R d22 With E 3 The bases represented are preferably, for example, at least two bases represented by the following formula (d1-6a), and more preferably each is a base represented by the following formula (d1-6a). The plural bases represented by formula (d1-6a) bonded to a compound are preferably the same base. -LC d (d1-6a) (In the formula (d1-6a), L is a linear, branched or cyclic alkylene, arylene, -O-, -C (= O)-, -NH- And a base containing a combination of these, C d It is at least one selected from the group consisting of an epoxy group and an oxetanyl group. In formula (d1-6a), L and C d (It can be bonded to form a cyclic structure.) In formula (d1-6a), the linear, branched, or cyclic alkylene group as L is preferably an alkylene group having 1 to 10 carbon atoms. base. Further, as the arylene group as L, an arylene group having 5 to 10 carbon atoms is preferred. In the formula (d1-6a), L is preferably a linear alkylene group having 1 to 3 carbon atoms, a phenylene group, -O-, -C (= O)-, -NH- and The combination of these is preferably at least one of an alkylene group and a phenylene group having a linear carbon number of 1 or more and 3 or less, or a combination of -O- and -C (= O)-and NH- is a combination of at least one kind. In formula (d1-6a), as L and C d When a cyclic structure is formed by bonding, for example, when a branched alkylene group and an epoxy group are bonded to form a cyclic structure (alicyclic structure and structure having an epoxy group), the following formula (d1 -6b) or (d1-6c). [Chemical 43] (In formula (d1-6b), R d23 Is a hydrogen atom or a methyl group) As an example of the compound represented by the formula (d1-6), a group selected from the group consisting of an oxiranyl group, an oxetanyl group, and an alicyclic epoxy group is exemplified. Examples of the epoxy compound having at least one kind among them are not limited thereto. [Chemical 44] Moreover, as a compound which can be used suitably as a polyfunctional crosslinkable compound (D), the siloxane compound which has two or more glycidyl group in a molecule | numerator (henceforth abbreviated as "siloxane compound") is mentioned. . A siloxane compound is a compound having a siloxane skeleton composed of a siloxane bond (Si-O-Si) and two or more glycidyl groups in a molecule. Examples of the siloxane skeleton in the siloxane compound include a cyclic siloxane skeleton or a polysiloxane skeleton (for example, a linear or branched polysiloxane (linear or branched polysiloxane) Siloxane), or cage or ladder-type polysilsesquioxane, etc.). As the siloxane compound, a compound having a cyclic siloxane skeleton represented by the following formula (d1-7) (hereinafter sometimes referred to as a "cyclic siloxane") is preferred. [Chemical 45] In formula (d1-7), R d24 , And R d25 Denotes a monovalent or alkyl group containing glycidyl. Among them, x1 R in the compound represented by formula (d1-7) d24 And x1 R d25 Among them, at least two are glycidyl-containing monovalent groups. In addition, x1 in Formula (d1-7) represents an integer of 3 or more. In addition, R in the compound represented by formula (d1-7) d24 , R d25 It can be the same or different. Also, plural R d24 It can be the same or different. Plural R d25 It may be the same or different. As the above-mentioned glycidyl-containing monovalent group, -DOR is preferred d26 Glycidyl ether group [D represents alkylene, R d26 For glycidyl]. Examples of the D (alkylene) include straight chains having 1 or more and 18 or less carbon atoms such as methylene, methylmethylene, dimethylmethylene, dimethylene, and trimethylene. Shaped or branched alkylene etc. Examples of the alkyl group include a carbon number of 1 or more and 18 or less (such as methyl, ethyl, propyl, and isopropyl) (preferably 1 or more and 6 or less, particularly preferably 1 or more). Above and below 3) straight-chain or branched alkyl groups. X1 in the formula (d1-7) represents an integer of 3 or more. x1 is preferably an integer of 3 or more and 6 or less in terms of excellent crosslinking reactivity when forming a cured film. The number of glycidyl groups in the siloxane compound in the molecule is two or more. The number of glycidyl groups is preferably 2 or more and 6 or less, and particularly preferably 2 or more and 4 or less, in terms of excellent crosslinking reactivity when forming a cured film. The photosensitive resin composition may contain, in addition to the siloxane compound represented by the formula (d1-7), an alicyclic epoxy-containing cyclic siloxane, and Japanese Patent Laid-Open No. 2008-248169 The alicyclic epoxy-containing polysiloxane resins described therein, and the organic polysilsesquioxane resins having at least two epoxy functional groups in one molecule described in Japanese Patent Laid-Open No. 2008-19422, etc. A compound with a siloxane skeleton. Specific examples of the siloxane compound include cyclic siloxanes having two or more glycidyl groups in the molecule represented by the following formula. As the siloxane compound, for example, trade names "X-40-2670", "X-40-2701", "X-40-2728", "X-40-2738", "X-40- 2740 "(above manufactured by Shin-Etsu Chemical Industry Co., Ltd.) and other commercially available products. [Chemical 46] The content of the polyfunctional crosslinkable compound (D) is preferably 1% by mass or more based on the mass of the photosensitive resin composition (all solid content components) excluding the mass of the organic solvent (S) described below and 40% by mass or less, more preferably 3% by mass or more and 30% by mass or less. By setting the content of the polyfunctional crosslinkable compound (D) to the above range, it is easy to obtain a photosensitive resin composition capable of forming a cured film with less gas generation. The content [g] of the alkali-soluble resin (A) in the photosensitive resin composition and the content [g] of the polyfunctional cross-linking compound (D) are preferably within a range of 15: 1 to 0.5: 1, and more preferably It is in the range of 10: 1 to 1: 1, and more preferably in the range of 8: 1 to 2: 1. By using the alkali-soluble resin (A) and the polyfunctional crosslinkable compound (D) at a ratio within this range, it is particularly easy to obtain a photosensitive resin composition capable of forming a cured film with less gas generation. <Fluorine-based resin (F)> The photosensitive resin composition may contain a fluorine-based resin (F) (hereinafter also referred to as "(F) component"). When the photosensitive resin composition contains a fluorine-based resin (F), liquid-repellency is imparted to a cured film formed using the photosensitive resin composition. For example, when a light-emitting layer is formed by a printing method such as an inkjet method on a substrate for an organic EL element including a barrier formed using a photosensitive resin composition, the barrier is used to repel ink. , Can prevent ink from adhering to the barrier or mixing ink with adjacent pixels when ink is injected into the area surrounded by the barrier. The fluorine-based resin (F) is not particularly limited as long as it is a resin containing a fluorine atom and capable of imparting liquid repellency to a cured film formed using a photosensitive resin composition. The fluorine-based resin (F) may be a homopolymer of a monomer containing a fluorine atom, or a copolymer of a monomer containing a fluorine atom and a monomer not containing a fluorine atom. Preferred examples of the fluorine-based resin (F) include copolymers obtained by copolymerizing at least (f1) a monomer having an ethylenically unsaturated group and a fluorine atom with (f2) (meth) acrylic acid. When such a fluorine-based resin (F) is used, a cured film having excellent liquid repellency is easily formed using a photosensitive resin composition, and particularly a barrier for an organic EL element having excellent liquid repellency. ((f1) a monomer having an ethylenically unsaturated group and a fluorine atom) A monomer having an ethylenically unsaturated group and a fluorine atom (hereinafter also referred to as "(f1) monomer") as long as it has an ethylenically unsaturated group and The fluorine atom is not particularly limited. Examples of such (f1) monomers include compounds represented by the following formula (f1-1). These (f1) monomers can be used individually or in combination of 2 or more types. [Chemical 47] In formula (f1-1), X 1 And X 2 Each independently represents a hydrogen atom or a fluorine atom, X 3 Represents a hydrogen atom, a fluorine atom, a methyl group, or a perfluoromethyl group, X 4 And X 5 Represents a hydrogen atom, a fluorine atom, or a perfluoromethyl group. Rf represents a fluorine-containing alkyl group having 1 to 40 carbon atoms or a fluorine-containing alkyl group having an ether bond with 2 to 100 carbon atoms, a represents an integer of 0 to 3, and b and c are independently Represents 0 or 1. When Rf is a fluorine-containing alkyl group, the number of carbon atoms is preferably 2 or more and 20 or less, more preferably 3 or more and 10 or less, and even more preferably 4 or more and 6 or less. When Rf is a fluorine-containing alkyl group having an ether bond, the number of carbon atoms is preferably 2 or more and 50 or less, more preferably 3 or more and 20 or less, and even more preferably 4 or more and 6 or less. The content of the unit derived from the (f1) monomer is preferably in a range of 30% by mass or more and 80% by mass or less, more preferably 40% by mass or more and 60% by mass or less with respect to the mass of the fluororesin (F). When the content of the unit derived from the (f1) monomer in the fluorine-based resin (F) is set to the above range, a cured film having excellent liquid repellency is easily formed from the photosensitive resin composition, and the photosensitive resin combination may be formed. The fluorine resin (F) in the material tends to have good compatibility with other components. The (f1) monomer preferably has-(CF 2 ) t F (t = 1 or more and 10 or less). t is more preferably 1 or more and 8 or less, and still more preferably 2 or more and 6 or less. When the (f1) monomer has the above-mentioned group, a cured film excellent in liquid repellency is easily formed from the photosensitive resin composition. <(F2) (meth) acrylic acid> In order to improve the developability of the photosensitive resin composition, the fluorine resin (F) preferably contains a unit derived from (f2) (meth) acrylic acid, which is a monomer having a carboxyl group. The content of the unit derived from (f2) (meth) acrylic acid is preferably from 0.1% by mass to 20% by mass based on the mass of the fluororesin (F). When the content of the unit derived from (f2) (meth) acrylic acid in the fluororesin (F) is set to the above range, it is easy to obtain a photosensitivity capable of forming a hardened film with good developability and excellent liquid repellency Resin composition. If necessary, a monomer other than the (f1) monomer and the (f2) monomer may be copolymerized on the fluororesin (F). Examples of such other monomers include various monomers described below. ((f3) a monomer having an ethylenically unsaturated group and an epoxy group) The fluorine-based resin (F) is preferably a monomer having an ethylenically unsaturated group and an epoxy group (hereinafter also referred to as "(f3 ) A copolymer obtained by copolymerizing the monomers "). By copolymerizing the (f3) monomer, the liquid repellency of the cured film formed from the photosensitive resin composition can be further improved. Examples of the (f3) monomer include glycidyl (meth) acrylate, alicyclic epoxy compounds represented by the following formulae (f3-1) to (f3-3), and (meth) acrylic acid A monomer obtained by the reaction of a carboxyl group with an epoxy group of a difunctional epoxy compound or higher, or a hydroxyl group or an carboxyl group of an acrylic monomer having a hydroxyl group or a carboxyl group in a side chain and an epoxy group of a difunctional epoxy compound Monomer and so on. Among these, glycidyl (meth) acrylate is preferable. These (f3) monomers can be used individually or in combination of 2 or more types. [Chemical 48] In the formulae (f3-1), (f3-2), and (f3-3), R f0 Represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R f1 Represents a hydrogen atom or a methyl group, u represents an integer of 1 or more and 10 or less, and v and w each independently represent an integer of 1 or more and 3 or less. When the fluorine-based resin (F) contains a unit derived from (f3) monomer, the content of the unit in the fluorine-based resin (F) is preferably 1% by mass relative to the mass of the fluorine-based resin (F). The amount is more than 40% by mass, and more preferably 5% by mass or more and 15% by mass or less. When the content of the unit derived from the (f3) monomer in the fluorine-based resin (F) is set to the above range, it is easy to obtain a photosensitive resin composition capable of forming a cured film with good liquid repellency. ((f4) A monomer having a structure represented by the formula (f4-1)) The fluorine-based resin (F) preferably has an ethylenically unsaturated group and a structure represented by the following formula (f4-1) A copolymer obtained by copolymerizing a monomer (hereinafter also referred to as "(f4) monomer"). By copolymerizing the (f4) monomer, a photosensitive resin composition having excellent developability is easily obtained, and the compatibility between the fluorine-based resin (F) and other components in the photosensitive resin composition can be improved. [Chemical 49] (f4) The monomer more preferably has an ethylenically unsaturated group and a structure represented by the following formula (f4-2). [Chemical 50] In formulas (f4-1) and (f4-2), R f2 It represents an alkylene group having 1 to 5 carbon atoms, and may be linear or branched. Among them, an alkylene group having 1 to 3 carbon atoms is preferred, and an alkylene group is most preferred. R f3 A hydrogen atom, a hydroxyl group, or an alkyl group having 1 to 20 carbon atoms which may have a substituent may be linear or branched. Among these, an alkyl group having 1 to 3 carbon atoms is preferred, and a methyl group is most preferred. Examples of the substituent include a carboxyl group, a hydroxyl group, and an alkoxy group having 1 to 5 carbon atoms. x represents an integer of 1 or more, preferably an integer of 1 or more and 60 or less, and more preferably an integer of 1 or more and 12 or less. Examples of such (f4) monomers include compounds represented by the following formula (f4-3). These (f4) monomers can be used individually or in combination of 2 or more types. [Chemical 51] In formula (f4-3), R f4 Represents a hydrogen atom or a methyl group. R f2 , R f3 And x are synonymous with the above formulae (f4-1) and (f4-2). The content of the unit derived from the (f4) monomer is preferably in a range of 1% by mass or more and 40% by mass or less, more preferably in a range of 5% by mass or more and 25% by mass or less with respect to the mass of the fluororesin (F). By setting it as the said range, the developability of a photosensitive resin composition or the compatibility of the fluorine-type resin (F) with another component in a photosensitive resin composition tends to become favorable, and it is preferable. ((f5) monomer having a silicon atom) The fluorine-based resin (F) is preferably a copolymer obtained by copolymerizing a monomer having a silicon atom (hereinafter also referred to as "(f5) monomer"). (f5) The monomer is not particularly limited as long as it has an ethylenically unsaturated group and at least one alkoxy group bonded to a silicon atom. By copolymerizing the (f5) monomer, the liquid repellency of the cured film formed from the photosensitive resin composition can be further improved. Examples of such (f5) monomers include compounds represented by the following formula (f5-1). These (f5) monomers can be used individually or in combination of 2 or more types. [Chemical 52] In formula (f5-1), R f5 A hydrogen atom or an alkyl group having 1 to 10 carbon atoms, preferably a hydrogen atom or a methyl group. R f6 It represents an alkylene group or a phenylene group having a carbon number of 1 or more and 20 or less, and preferably an alkylene group having a carbon number of 1 or more and 10 or less. R f7 , R f8 Each independently represents an alkyl group or a phenyl group having 1 to 10 carbon atoms, preferably an alkyl group having 1 to 3 carbon atoms. Plural R bonded to Si f7 In the case, the plural R f7 It can be the same or different. In addition, a plurality of (OR f8 ), The plural (OR f8 ) Can be the same or different. p is 0 or 1, preferably 1. q is an integer of 1 or more and 3 or less, preferably 2 or 3, and more preferably 3. The content of the unit derived from the (f5) monomer is preferably in a range of 20% by mass or less, more preferably 10% by mass or less with respect to the mass of the fluororesin (F). By setting it as the said range, liquid repellency and compatibility with other components of a photosensitive resin composition tend to become favorable, and it is preferable. As other monomers other than the above-mentioned monomers, various monomers having an ethylenically unsaturated group can be used. Among them, acrylic monomers are preferred. Preferred examples of the acrylic monomer include 2-hydroxyethyl methacrylate (HEMA), N-hydroxymethacrylamide (N-MAA), methyl methacrylate (MAA), and methyl Cyclohexyl acrylate (CHMA), isomethacrylate (IBMA), etc. The content of the units derived from these other monomers in the fluororesin (F) is preferably 0% by mass or more and 25% by mass or less with respect to the mass of the fluororesin (F). As a method of obtaining a copolymer by reacting (f1) monomer and (f2) monomer and other monomers as needed, a well-known method can be used. The mass average molecular weight of the fluorine-based resin (F) is preferably 2,000 or more and 50,000 or less, and more preferably 5,000 or more and 20,000 or less. By setting the mass average molecular weight of the fluorine-based resin (F) to 2,000 or more, the heat resistance and strength of the cured film formed from the photosensitive resin composition can be improved, and by 50,000 or less, the photosensitivity can be improved. The developability of the resin composition. The content of the fluorine-based resin (F) in the photosensitive resin composition is preferably 0.1 relative to the mass (total solid content) of the photosensitive resin composition excluding the mass of the organic solvent (S) described below. Mass% or more and 10 mass% or less, more preferably 0.2 mass% or more and 5 mass% or less. When the photosensitive resin composition contains the fluorine-based resin (F) in such an amount, the sensitivity, developability, and resolvability of the photosensitive resin composition can be optimized, and the resin formed by using the photosensitive resin composition can be easily used. The hardened film imparts good liquid repellency. <Organic solvent (S)> The photosensitive resin composition preferably contains an organic solvent (S) in order to improve coating properties or adjust viscosity. Specific examples of the organic solvent (S) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, and diethylene glycol monomethyl ether. , Diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, Propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. (poly ) Alkylene glycol monoalkyl ethers; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate (Poly) alkylene glycol monoalkyl ether acetates such as esters, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate; diethylene glycol dimethyl ether, diethylene glycol methyl Diethyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and other ketones; methyl 2-hydroxypropionate, 2- Alkyl lactates such as ethyl hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxy Methyl propionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutyrate, 3-methoxybutyl acetate, acetic acid 3-methyl-3-methoxybutyl, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate Ester, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate , N-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxobutyrate, etc .; aromatic hydrocarbons such as toluene, xylene; N-methyl-2-pyrrole Pyridone, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylisobutylamidine, N, N-diethylacetamide, N , N-diethylformamidine, N-methylcaprolactam, 1,3-dimethyl-2-imidazolidinone, pyridine, and N, N, N ', N'-tetramethylurea Isopolarity Organic solvents and so on. Among these, alkylene glycol monoalkyl ethers, alkylene glycol monoalkyl ether acetates, the other ethers, alkyl lactate, and the other esters are more preferable. These are alkylene glycol monoalkyl ether acetates, the other ethers, and the other esters. The organic solvent (S) also preferably contains a nitrogen-containing polar organic solvent in terms of the solubility of each component and the dispersibility of the colorant (E). These solvents can be used alone or in combination of two or more. The content of the organic solvent (S) is not particularly limited, and is appropriately set in accordance with the thickness of the coating film within a concentration range in which coating can be performed on a substrate or the like. The viscosity of the photosensitive resin composition is preferably 5 cp or more and 500 cp or less, more preferably 10 cp or more and 50 cp or less, and still more preferably 20 cp or more and 30 cp or less. The solid component concentration is preferably 5 mass% or more and 75 mass%, more preferably 10 mass% or more and 60 mass% or less, and still more preferably 15 mass% or more and 45 mass% or less. <Other components> The photosensitive resin composition may contain additives, such as a surfactant, an adhesive improvement agent, a thermal polymerization inhibitor, a defoamer, and a silane coupling agent, as needed. Each of the additives may be a previously known one. The photosensitive resin composition preferably contains a silane coupling agent from the viewpoint of easily forming a cured film with a good shape and excellent adhesion to the substrate. As the silane coupling agent, a previously known silane coupling agent can be used without particular limitation. Examples of the surfactant include anionic, cationic, and nonionic compounds. Examples of the thermal polymerization inhibitor include hydroquinone and hydroquinone monoethyl ether. Examples of the antifoaming agent include polysiloxane. And fluorine compounds. <The manufacturing method of a photosensitive resin composition> About the photosensitive resin composition demonstrated above, if it is an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and coloring, The method of uniformly mixing the agent dispersion liquid and other optional components as necessary so that the solid content component concentration of the photosensitive resin composition becomes a desired value is not particularly limited. A preferred manufacturing method includes the following steps: preparing the above-mentioned colorant dispersion by dispersing the above-mentioned pigment (E1) in a dispersion medium in the presence of the above-mentioned dispersant (E2); and dispersing the obtained colorant dispersion and alkali-solubility The resin (A), the photopolymerizable monomer (B), and the photopolymerization initiator (C) are mixed. The steps for preparing the colorant dispersion liquid are as described above for the method for producing a colorant dispersion liquid. Regarding the step of mixing the colorant dispersion liquid, the alkali-soluble resin (A), the photopolymerizable monomer (B), and the photopolymerization initiator (C), as long as the method can uniformly mix these components, There is no particular limitation. When the photosensitive resin composition contains an organic solvent (S), these components may be added to the organic solvent (S) simultaneously or in batches. When the components of these photosensitive resin compositions are added to the organic solvent (S) in batches, the order of adding the components is not particularly limited. When mixing a colorant dispersion liquid, an alkali-soluble resin (A), a photopolymerizable monomer (B), and a photopolymerization initiator (C), if necessary, any component other than these components together with these components Mix. A specific amount of each of the above components is mixed and then uniformly mixed with a stirrer to obtain a photosensitive resin composition. Furthermore, it is also possible to perform filtration using a filter to make the obtained photosensitive resin composition more uniform. ≪Hardened Product and Organic EL Element≫ The photosensitive resin composition described above is exposed or heated to harden after exposure to form a cured product. Typically, a coating film formed using a photosensitive resin composition is cured to form a cured product. Examples of the use of the cured product include an insulating film. When the photosensitive resin composition contains a colorant (E), a colored insulating film is formed. In particular, when the colorant (E) is a light-shielding agent, a light-shielding insulating film is formed. As a preferable example of the light-shielding black insulating film, there can be mentioned a black partition wall or a black column spacer in a black matrix provided in a panel for various image display devices. When the photosensitive resin composition contains a coloring agent (E) such as RGB, a color filter can be produced by forming a colored film-shaped hardened material in a region divided by a black matrix. For example, the black matrix described above or a color filter including a color cured film as a cured material is suitable for various display devices. As described above, less gas is generated from the hardened material. Therefore, the hardened | cured material formed using the photosensitive resin composition is suitable as a barrier for division of the light emitting layer in an organic EL element. The barrier ribs are formed on a substrate for an organic EL element so as to be in contact with an electrode layer such as ITO and a light emitting layer containing an organic light emitting material. Pixels are formed by dividing the light emitting layer using a barrier. Here, if the electrode layer or the light-emitting layer is contaminated by a gas containing various components generated from the barrier ribs, there is a concern that deterioration may be promoted. However, it is considered that if a cured film formed using the photosensitive resin composition described above is used as a barrier, the generation of gas from the barrier is suppressed, so that the electrode layer or the light emitting layer is not easily deteriorated, and the durability of the organic EL element is improved. That is, an organic EL device having a cured film formed using the photosensitive resin composition described above as a barrier can be expected to have excellent durability. In addition, a substrate provided with a barrier rib formed using the photosensitive resin composition described above can be used as a substrate for an organic EL element. By using this substrate for an organic EL element, it is possible to produce an organic EL element having excellent durability with suppressed degradation of the electrode layer or the light emitting layer. ≫Manufacturing method of hardened material The manufacturing method of the hardened material is not particularly limited as long as it is a method of polymerizing the photopolymerizable monomer (B) in the film of the photosensitive resin composition. In order to polymerize a photopolymerizable monomer (B), it exposes normally. When the photosensitive resin composition contains a polyfunctional crosslinkable compound (D), in order to perform a cross-linking reaction between the alkali-soluble resin (A) and the polyfunctional crosslinkable compound (D), it is preferred that The film of the exposed or unexposed photosensitive resin composition is heated. As a preferable manufacturing method of a hardened | cured material, the method which includes the following steps: Forming a coating film by apply | coating a photosensitive resin composition; and exposing a coating film. In various image display elements such as an organic EL element, when a hardened substance in the form of a colored film is formed, the hardened substance is often patterned. In the case of forming a patterned hardened body, typically, a method including the following steps is used: forming a coating film by applying a photosensitive resin composition; position-selectively exposing the coating film; and The exposed coating film is developed. In order to form a cured film using the photosensitive resin composition, a photosensitive resin composition is applied to a substrate selected according to the use of the cured film to form a coating film. The method for forming the coating film is not particularly limited, and for example, a contact transfer coating device such as a roll coater, a reverse coater, or a bar coater, or a spin coater (spin coat) can be used. Equipment), non-contact coating equipment such as curtain-type flat coating machines. The applied photosensitive resin composition is dried as necessary to form a coating film. The drying method is not particularly limited, and examples include: (1) a method of drying at a temperature of 80 ° C or higher and 120 ° C or lower, preferably 90 ° C or higher and 100 ° C or lower by using a hot plate for 60 seconds or longer and 120 seconds or lower, (2) A method of leaving at room temperature for several hours to several days, (3) A method of removing the solvent by leaving it in a warm air heater or an infrared heater for several tens of minutes to several hours. Then, the coating film is exposed. The exposure is performed by irradiating active energy rays such as ultraviolet rays and excimer laser light. The exposure can be performed selectively, for example, by a method such as exposure through a negative mask. The amount of energy rays to be irradiated varies depending on the composition of the photosensitive resin composition, and is preferably 40 mJ / cm, for example. 2 Above 200 mJ / cm 2 About the following. When the coating film is selectively exposed through a position, the exposed film is developed with a developing solution, thereby forming a desired pattern shape. The developing method is not particularly limited, and for example, a dipping method, a jet method, or the like can be used. The developing solution is appropriately selected depending on the composition of the photosensitive resin composition. As the developing solution, for example, an alkaline aqueous solution such as sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, or a quaternary ammonium salt can be used. When the photosensitive resin composition contains a polyfunctional crosslinkable compound (D), it is preferable to heat the exposed coating film or the patterned coating film after development to form a cured product. . This curing system causes a crosslinking reaction between the alkali-soluble resin (A) and the polyfunctional crosslinkable compound (D) by heating. Therefore, in order to harden, the exposed coating film or the patterned coating film after development is baked. The baking temperature is not particularly limited as long as the curing can be performed well, and is preferably 180 ° C or higher and 280 ° C or lower, and more preferably 190 ° C or higher and 260 ° C or lower. By baking as described above, a cured product of the photosensitive resin composition that is cured by heating is obtained. ≫Method for manufacturing barrier for dividing light-emitting layer in organic EL element≫ Method for manufacturing barrier for dividing light-emitting layer in organic EL element As long as it is a method capable of manufacturing barrier at a specific position on a substrate for an organic EL element, there is no Specially limited. As a preferred method, a method including the following steps may be mentioned: forming a coating film on a substrate for an organic EL element by applying a photosensitive resin composition; positionally selectively corresponding to the position of the barrier film in the coating film The part is exposed; the exposed coating film is developed; and if necessary, the developed coating film is hardened by heating. As a typical example of the substrate, a transparent substrate including a transparent electrode layer (anode) including ITO or the like at a portion corresponding to the light-emitting layer forming portion on one side of the main surface may be mentioned. The barrier ribs are formed so as to be connected to the ends of the transparent electrode layer and surround the light-emitting layer formation region. A method for applying a photosensitive resin composition to a substrate for an organic EL element, a method for positionally selectively exposing a portion corresponding to a position of a barrier in a coating film, a method for developing the exposed coating film, The method for hardening the developed coating film is the same as the method described above for the method for manufacturing a cured film. By the method described above, a substrate having a partition barrier for a light-emitting layer at a specific position of the substrate for an organic EL element is obtained. ≫Manufacturing method of organic EL element≫ An organic EL element is manufactured using the substrate for an organic EL element provided with the barrier ribs including the cured material of the photosensitive resin composition described above. The method includes a step of forming a light emitting layer in a region divided by a barrier rib in a substrate for an organic EL element. A substrate for an organic EL element having a barrier rib exposes a transparent electrode layer (anode) containing ITO or the like in a region divided by the barrier rib. A typical method is to build a hole transport layer on the electrode layer (anode). Then, an electron transport layer and an electrode layer (cathode) are sequentially laminated on the hole transport layer to manufacture an organic EL element. If necessary, a TFT, a color filter, and the like are appropriately combined. A method for forming a hole transporting layer, a light emitting layer, an electron transporting layer, etc. in the area divided by the barrier ribs is not particularly limited, and may be a vapor deposition method or a printing method. A printing method is preferable in terms of less loss of the material for forming a layer, or a layer with a desired film thickness being easily formed at a specific position, and the inkjet method is particularly preferable as the printing method. Since the organic EL element manufactured by the above method has barriers that generate less gas, it suppresses deterioration of the electrode layer or the light-emitting layer, and has excellent durability. [Examples] Hereinafter, the present invention will be described more specifically with reference to examples, but the scope of the present invention is not limited to these examples. [Preparation Example 1] 3-Aminopropyltrimethoxysilane (0.027 mole) and a mixture of hexahydrophthalic anhydride and methylhexahydrophthalic anhydride (MH700G, manufactured by Shinnippon Physicochemical Co., Ltd.) ) (0.027 mole) was dissolved in 24 g of methyl isobutyl ketone and stirred at room temperature for 1 hour. After confirming the disappearance of MH700G by gas chromatography, methyl isobutyl ketone was distilled off to obtain a mixture of the following three silane compounds. [Chem 53] To a reaction vessel equipped with a stirring device and a thermometer, 100 g of methyl isobutyl ketone, 7.4 g of an aqueous solution of 20% by mass of tetramethylammonium hydroxide (tetramethylammonium hydroxide 0.02 mol), and distilled water 20.8 were added. g (1.49 moles). Then, 68.7 g (0.20 mole) of the silane compound mixture obtained by the above method and 46.9 g of 3-propenyloxypropyltrimethoxysilane (0.20 mole) were slowly added to the reaction vessel at 40 to 45 ° C. Ear), and 29.7 g (0.10 mole) of phenyltrimethoxysilane, the contents of the reaction vessel were stirred at the same temperature for 3 hours to perform a reaction. During the reaction, 100 g of methyl isobutyl ketone was added to the reaction vessel, and then 50 g of distilled water was successively added to the reaction vessel, and the organic layer was washed with water repeatedly until the pH of the aqueous layer became about 7. The washed organic layer was dried by adding sodium carbonate, and then the organic layer was filtered. Methyl isobutyl ketone was distilled off from the filtered organic layer to obtain a silsesquioxane compound used as a dispersant (E2) including the following structural units (i) to (v). In silsesquioxane, the total content of structural units (i) to (iii) is 40 mol%, the content of structural unit (iv) is 40 mol%, and the content of structural unit (v) is 20 mol%. . [Chemical 54] [Preparation Example 2] 275 g (0.5 mole, epoxy equivalent 292) of epoxy compound represented by the following formula, 100 mg of 2,6-di-tert-butyl-4-methylphenol, and 72 g of acrylic acid were added together The catalyst was added to a 1500 mL four-necked flask, and the solution was heated and dissolved at 90 to 100 ° C while blowing air at a rate of 25 mL / min. [Chem 55] Then, the solution was slowly heated while the solution was cloudy, and heated to 120 ° C. to completely dissolve it. At this point, the solution had gradually become transparent and viscous, but continued to stir. During this period, the acid value was measured, and heating and stirring were continued until the acid value did not reach 1.0 mgKOH / g. It takes 12 hours for the acid value to reach the target value. Then, it cooled to room temperature, and obtained the colorless and transparent bisphenol fluorene type epoxy acrylate of the following structure. [Chemical 56] Then, 650 g of propylene glycol monomethyl ether acetate was added to 347.4 g (0.5 mol) of the bisphenol fluorene type epoxy acrylate thus obtained and dissolved, and then the compound of the following formula (b1) -1 was mixed ( Hereinafter, it is also referred to as compound (b1) -1) (0.25 mol) and a catalyst. The temperature was gradually raised, and the reaction was performed at 130 ° C for 4 hours. The compound (b1) -1 is a tetracarboxylic dianhydride (norbane-2-spiro-α-cyclopentanone-α'-spiro-2 ''-norbane-5,5 represented by the following formula: '', 6,6 ''-tetracarboxylic dianhydride). [Chemical 57] After confirming the disappearance of the acid anhydride group, 30 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C for 6 hours to obtain a bisphenol fluorene epoxy acrylate and an acid anhydride (compound (b1) -1) Resin A1 as a phenolphthalein-based resin. The disappearance of the acid anhydride was confirmed by IR spectrum. [Example 1] 75 parts by mass of a linamine compound ("Irgaphor" (registered trademark) black S0100CF: manufactured by BASF Corporation), 15 parts by mass of a silsesquioxane compound obtained in Preparation Example 1, and aminomethyl 10 parts by mass of the acid ester-based dispersant was added to propylene glycol monomethyl ether acetate so that the solid component concentration became 20% by mass, and then subjected to a dispersion treatment to obtain a colorant dispersion liquid. With respect to the obtained colorant dispersion liquid, the dispersibility of the pigment was evaluated according to the following criteria. The evaluation results are shown in Table 3. ○: No pigment precipitation was observed even after standing at room temperature for one week. ×: Pigmentation was confirmed when left standing at room temperature for 1 week. 225 parts by mass of the obtained colorant dispersion liquid (45 parts by mass of the pigment and the dispersant in total), 30 parts by mass of the resin A1 (alkali-soluble resin (A)) obtained in Preparation Example 2, and dipentaerythritol hexaacrylate (light 7 parts by mass of polymerizable monomer (B)), 8 parts by mass of oxime ester compound (photopolymerization initiator (C)) of the following structure, and 10 parts by mass of D1 (multifunctional crosslinkable compound (D)) below Parts were mixed, and propylene glycol monomethyl ether acetate was added again so that solid content concentration might become 20 mass%, and the photosensitive resin composition was obtained. [Chem 58] Using the obtained photosensitive resin composition, the gas generation from the cured product was evaluated by the following method. <Gas generation evaluation> After coating a photosensitive resin composition on a glass substrate of 10 cm × 10 cm, it was dried at 100 ° C. for 120 seconds to form a coating film. Then, using an exposure machine using a high-pressure mercury lamp, the exposure was 50 mJ / cm 2 Full exposure of the coating film. The exposed coating film was baked at 230 ° C. for 30 minutes, and a cured film having a film thickness of 2 μm was obtained. Using the formed cured film as a sample, the amount of generated gas was evaluated by gas chromatography mass spectrometry (P & T-GC / MS) equipped with a Purge & Trap Sampler (heating desorption device). The measurement and gas quantification are performed in the following order (i) to (iii). (i) Gas generation and capture to the secondary adsorption tube. 1 mg of the hardened film was charged into the primary capture tube, and heated at 230 ° C for 10 minutes using a thermal desorption device (Tarbo Matrix ATD manufactured by Perkin Elmer). , So that the released gas is adsorbed on the secondary trap. (ii) GC / MS analysis The secondary trap was heated at 250 ° C. for 1 minute, and the released gas was analyzed by GC / MS (manufactured by Agilent Technologies: 7890B (GC), 5977AMSD (MS)). (iii) Quantitative analysis Quantitative analysis was performed based on the area of each peak in the graph obtained by PT-GC / MS analysis of the resin composition. Specifically, the total area% of the peaks of the detected outgassing was set as the evaluation value. Based on the obtained evaluation value (total area%), the amount of generated gas was evaluated based on the following criteria. An evaluation of 3 to 5 indicates that the amount of generated gas is small. The evaluation results are shown in Table 1. 5: The value of the evaluation value does not reach 1.0E 8 . 4: The value of the evaluation value is 1.0E 8 Above and below 2.5E 8 . 3: The evaluation value is 2.5E 8 Above and below 5.0E 8 . 2: The evaluation value is 5.0E 8 Above and below 1.0E 9 . 1: The value of the evaluation value is 1.0E 9 the above. [Comparative Examples 1 to 3] A colorant dispersion liquid and a photosensitive resin composition were prepared in the same manner as in Example 1 except that the dispersant was changed to the dispersant described in Table 3. With respect to the obtained toner dispersion liquid and photosensitive resin composition, the dispersibility of the pigment and the gas generation of the self-curing film were evaluated in the same manner as in Example 1. These evaluation results are shown in Table 3. Furthermore, Comparative Example 3 did not evaluate the gas generation situation because the pigment could not be dispersed well in the first place. [Example 2 and Comparative Example 4] In Example 2, silver-tin alloy fine particles having an average particle diameter of 200 to 300 nm were used instead of the lactamamine-based pigment used in Example 1 as a pigment to obtain a colorant dispersion liquid. The dispersibility of the obtained toner dispersion liquid was evaluated in the same manner as in Example 1, and after the photosensitive resin composition was prepared, gas generation evaluation was performed. In Comparative Example 4, silver-tin alloy microparticles having an average particle diameter of 200 to 300 nm were used instead of the lactamamine-based pigment used in Comparative Example 2 as a pigment to obtain a colorant dispersion liquid. The dispersibility of the obtained toner dispersion liquid was evaluated in the same manner as in Example 1, and after the photosensitive resin composition was prepared, gas generation evaluation was performed. [table 3] According to Table 3, it can be known from the examples that if a pigment dispersant is prepared by dispersing a pigment using a dispersant containing a silsesquioxane compound having a specific structure, not only the pigment is well dispersed, but the pigment obtained from use is significantly suppressed. The hardened | cured material of the photosensitive resin composition prepared from a colorant dispersion liquid produces gas. On the other hand, from Comparative Examples 1 to 4, when a silsesquioxane compound having a specific structure is not used as a dispersant, the pigment cannot be dispersed well at first, or even if the pigment is well dispersed, It is almost impossible to suppress the generation of gas from the photosensitive resin composition.

Claims (17)

一種著色劑分散液，其係包含著色劑(E)者， 上述著色劑(E)包含顏料(E1)與分散劑(E2)，且 上述分散劑(E2)包含具有下述式(e2a)： [化1](式(e2a)中，Re1 為1價有機基) 所表示之結構單元之倍半矽氧烷化合物。A colorant dispersion liquid comprising a colorant (E), the colorant (E) includes a pigment (E1) and a dispersant (E2), and the dispersant (E2) includes a formula (e2a) having the following formula: [Chemical 1] (In formula (e2a), R e1 is a monovalent organic group.) A silsesquioxane compound represented by a structural unit. 如請求項1之著色劑分散液，其中上述倍半矽氧烷化合物包含選自芳香族基、醯胺鍵、及胺基甲酸酯鍵中之1種以上。The toner dispersion liquid according to claim 1, wherein the silsesquioxane compound contains at least one selected from the group consisting of an aromatic group, an amido bond, and a carbamate bond. 如請求項1或2之著色劑分散液，其中上述Re1 包含選自芳香族基、醯胺鍵、及胺基甲酸酯鍵中之1種以上。The toner dispersion liquid according to claim 1 or 2, wherein the R e1 contains at least one selected from the group consisting of an aromatic group, a amine bond, and a urethane bond. 如請求項1或2之著色劑分散液，其中上述Re1 為下述式(e2a-I)： -Xe -Be -Ye -COOH・・・(e2a-I) 所表示之基、或下述式(e2a-II)： -Ze -Ae ・・・(e2a-II) 所表示之基， Xe 為單鍵、碳原子數1以上且6以下之伸烷基、碳原子數6以上且12以下之伸芳基、或-Re6 -NH-Re7 -所表示之基， Re6 及Re7 分別獨立地為碳原子數1以上且3以下之伸烷基， Ye 為2價環式有機基、或碳原子數1～20之鏈狀脂肪族烴基， Be 為-NH-CO-、-CO-NH-、-NH-CO-O-、-O-CO-NH-、或-NH-CO-NH-， Xe 及Ye 可分別獨立地經選自由(甲基)丙烯醯氧基、乙烯基、及含環氧基之有機基所組成之群中之1種以上之基取代， Ze 為單鍵、碳原子數1～6之伸烷基、或碳原子數6以上且12以下之伸芳基， Ae 為(甲基)丙烯醯氧基、乙烯基、或含環氧基之有機基， 倍半矽氧烷化合物具有包含上述式(e2a-I)所表示之基作為上述Re1 之結構單元(A)作為上述式(e2a)所表示之結構單元， 於倍半矽氧烷化合物中之全部之上述結構單元(A)中，上述Re1 均未經(甲基)丙烯醯氧基、乙烯基、或含環氧基之有機基取代之情形時，上述倍半矽氧烷化合物必須具有上述式(e2a)所表示且包含上述式(e2c)所表示之基作為上述Re1 之結構單元(B)。For example, the toner dispersion liquid of claim 1 or 2, wherein the above-mentioned R e1 is the following formula (e2a-I): -X e -B e -Y e -COOH ... The base represented by (e2a-I), Or the following formula (e2a-II): -Z e -A e ... (e2a-II), X e is a single bond, an alkylene group having a carbon number of 1 or more and 6 or less, a carbon atom An aryl group having a number of 6 or more and 12 or less, or a group represented by -R e6 -NH-R e7- , R e6 and R e7 are each independently an alkylene group having 1 or more and 3 carbon atoms, Y e It is a divalent cyclic organic group or a chain aliphatic hydrocarbon group having 1 to 20 carbon atoms, and Be is -NH-CO-, -CO-NH-, -NH-CO-O-, -O-CO- the group consisting of NH-, or -NH-CO-NH-, X e and Y e may be independently selected from the group consisting of warp (meth) Bing Xixi group, vinyl group, and an organic group containing epoxy groups in the One or more types of substituents, Z e is a single bond, an alkylene group having 1 to 6 carbon atoms, or an arylene group having 6 to 12 carbon atoms, and A e is (meth) acryloxy, A vinyl group or an epoxy-containing organic group, and the silsesquioxane compound has a structural unit (A) containing the group represented by the above formula (e2a-I) as the above-mentioned R e1 as the above-mentioned In the structural unit represented by the formula (e2a), in all the above-mentioned structural units (A) in the silsesquioxane compound, the above-mentioned R e1 is not (meth) acrylic acid, vinyl, or ring-containing When an organic group of an oxygen group is substituted, the silsesquioxane compound must have a group represented by the formula (e2a) and include the group represented by the formula (e2c) as the structural unit (B) of the R e1 . 如請求項1或2之著色劑分散液，其中上述顏料(E1)之含量相對於上述著色劑分散液之全部固形物成分之質量為30質量%以上且95質量%以下。For example, the colorant dispersion liquid of claim 1 or 2, wherein the content of the pigment (E1) is 30% by mass or more and 95% by mass or less with respect to the mass of the total solid component of the colorant dispersion solution. 如請求項1或2之著色劑分散液，其中上述分散劑(E2)之量相對於上述著色劑分散液之全部固形物成分之質量為5質量%以上且70質量%以下。For example, the colorant dispersion liquid of claim 1 or 2, wherein the amount of the dispersant (E2) is 5 mass% or more and 70 mass% or less with respect to the mass of the solid content of the colorant dispersion liquid. 如請求項1或2之著色劑分散液，其中上述顏料(E1)包含遮光劑。The colorant dispersion liquid according to claim 1 or 2, wherein the pigment (E1) contains a light-shielding agent. 一種感光性樹脂組合物，其包含鹼溶性樹脂(A)、光聚合性單體(B)、光聚合起始劑(C)、及如請求項1或2之著色劑分散液。A photosensitive resin composition comprising an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a toner dispersion liquid according to claim 1 or 2. 如請求項8之感光性樹脂組合物，其中上述顏料(E1)之含量相對於上述感光性樹脂組合物之全部固形物成分之質量為5質量%以上且80質量%以下。The photosensitive resin composition according to claim 8, wherein the content of the pigment (E1) is 5 mass% or more and 80 mass% or less with respect to the mass of the total solid component of the photosensitive resin composition. 如請求項8之感光性樹脂組合物，其中上述鹼溶性樹脂(A)包含具有酚酞基骨架之樹脂。The photosensitive resin composition according to claim 8, wherein the alkali-soluble resin (A) contains a resin having a phenolphthalein group skeleton. 如請求項10之感光性樹脂組合物，其中上述具有酚酞基(cardo)骨架之樹脂為下式(a-1)： [化2](式(a-1)中，Xa 表示下述式(a-2)： [化3]所表示之基，上述式(a-2)中，Ra1 分別獨立地表示氫原子、碳原子數1以上且6以下之烴基、或鹵素原子，Ra2 分別獨立地表示氫原子或甲基，Ra3 分別獨立地表示直鏈或支鏈之伸烷基，m2表示0或1，Wa 表示下述式(a-3)： [化4]所表示之基，上述式(a-3)中之環A表示可與芳香族環縮合且可具有取代基之脂肪族環，Ra0 為氫原子或-CO-Ya -COOH所表示之基，Ya 表示自二羧酸酐去除酸酐基所得之2價殘基，Za 表示自四羧酸二酐去除2個酸酐基所得之4價殘基；又，式(a-1)中，m1表示0以上且20以下之整數) 所表示之樹脂。The photosensitive resin composition according to claim 10, wherein the resin having a phenolphthalo group (cardo) skeleton is the following formula (a-1): [化 2] (In the formula (a-1), X a represents the following formula (a-2): In the formula (a-2), R a1 each independently represents a hydrogen atom, a hydrocarbon group having 1 to 6 carbon atoms, or a halogen atom, and R a2 each independently represents a hydrogen atom or a methyl group, R a3 independently represents a linear or branched alkylene, m2 represents 0 or 1, and W a represents the following formula (a-3): [化 4] The group represented by ring A in the formula (a-3) represents an aliphatic ring which can be condensed with an aromatic ring and may have a substituent, and R a0 is a group represented by a hydrogen atom or -CO-Y a -COOH , Y a represents a divalent residue obtained by removing an acid anhydride group from a dicarboxylic anhydride, and Z a represents a tetravalent residue obtained by removing two acid anhydride groups from a tetracarboxylic dianhydride; and, in formula (a-1), m1 Resin represented by an integer from 0 to 20). 如請求項8之感光性樹脂組合物，其包含1分子中具備複數個環氧基或氧雜環丁基之多官能交聯性化合物(D)，且 上述多官能交聯性化合物(D)之環氧當量或氧雜環丁基當量為50 g/eq以上且350 g/eq以下。The photosensitive resin composition according to claim 8, comprising a polyfunctional crosslinkable compound (D) having a plurality of epoxy groups or oxetanyl groups in one molecule, and the polyfunctional crosslinkable compound (D) The epoxy equivalent or oxetanyl equivalent is 50 g / eq or more and 350 g / eq or less. 如請求項12之感光性樹脂組合物，其中上述多官能交聯性化合物(D)包含每1分子中具有2個以上之環氧基之環氧化合物。The photosensitive resin composition according to claim 12, wherein the polyfunctional crosslinkable compound (D) includes an epoxy compound having two or more epoxy groups per molecule. 一種硬化物，其係使如請求項8至13中任一項之感光性樹脂組合物硬化而成。A cured product obtained by curing the photosensitive resin composition according to any one of claims 8 to 13. 一種有機EL元件，其具備如請求項14之硬化物。An organic EL element including the cured product as claimed in claim 14. 一種圖案之形成方法，其包括如下步驟： 藉由塗佈如請求項8至13中任一項之感光性樹脂組合物而形成塗佈膜； 位置選擇性地對上述塗佈膜進行曝光；及 將經曝光之上述塗佈膜進行顯影。A method for forming a pattern, comprising the steps of: forming a coating film by coating the photosensitive resin composition according to any one of claims 8 to 13; positionally selectively exposing the coating film; and The exposed coating film is developed. 一種感光性樹脂組合物之製造方法，其係製造如請求項8至13中任一項之感光性樹脂組合物之方法，且包括如下步驟： 藉由使上述顏料(E1)於上述分散劑(E2)之存在下分散於液中而準備上述著色劑分散液；及 將上述著色劑分散液、上述鹼溶性樹脂(A)、上述光聚合性單體(B)、及上述光聚合起始劑(C)進行混合。A method for producing a photosensitive resin composition, which is a method for producing the photosensitive resin composition according to any one of claims 8 to 13, and includes the following steps: by applying the pigment (E1) to the dispersant ( E2) dispersing in a liquid to prepare the colorant dispersion; and dispersing the colorant dispersion, the alkali-soluble resin (A), the photopolymerizable monomer (B), and the photopolymerization initiator. (C) Mixing.
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