JP2021064467A - Manufacturing method of substrate for organic el panel, substrate for organic el panel and negative photosensitive resin composition - Google Patents

Abstract

To provide: a manufacturing method of a substrate for an organic EL panel, capable of forming a bank on a substrate using a photosensitive resin composition containing lactam pigments while achieving both a cross sectional shape of a rectangular or forward taper shape and a suppression in residue generation after development; a substrate for an organic EL panel, capable of being manufactured by the manufacturing method; and a negative photosensitive resin composition suitably used in the manufacturing method.SOLUTION: In a manufacturing method of a substrate for an organic EL panel, a negative photosensitive resin composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C) and lactam pigments (D1) is used as a material for forming a bank, and a resin with a specific structure including a part substituted with a fluorine atom in a predetermined position is used as the alkali-soluble resin (A).SELECTED DRAWING: None

Description

The present invention relates to a method for producing a substrate for an organic EL panel, a substrate for an organic EL panel, and a negative photosensitive resin composition.

Conventionally, an organic EL display element has been manufactured by forming a light-shielding bank (partition wall) surrounding a pixel on a substrate and then laminating various functional layers in a region surrounded by the bank. As a method for easily forming such a bank, a method of forming a bank by a photolithography method using a photosensitive resin composition containing a light-shielding agent such as a black pigment is known (Patent Document 1).

In addition, the material of the bank may be required to have electrical insulation. In such a case, it is known that a lactam pigment is blended with the material of the bank as a light-shielding agent having excellent electrical insulation for the purpose of forming a bank having excellent electrical insulation (Patent Document 2).

International Publication No. 2018/181311 JP-A-2019-45659

By the way, in terms of ease of laminating functional layers and image quality of organic EL display elements, in a bank containing a lactam pigment as described in Patent Document 2, the cross-sectional shape of the bank is rectangular or ordered. It is desirable to have a tapered shape. Here, the cross-sectional shape of the bank having a forward taper shape means that the angle formed by the surface of the bank and the surface of the board in contact with the bank is an acute angle in the vicinity of the substrate.
For such a forward taper shape, as a component contained in the photosensitive resin composition used for forming the bank, a material having low solubility in a developing solution is selected within a range in which the photosensitive resin composition can be developed. Easy to form.
On the other hand, when a material having low solubility in a developing solution is selected as a constituent component of the photosensitive resin composition, a residue is likely to be generated after development.

As described above, in forming the bank, there is a trade-off relationship between the formation of a rectangular or forward-tapered cross section and the suppression of the generation of residue after development, and it is difficult to achieve both.

The present invention has been made in view of the above problems, and the cross-sectional shape is rectangular or forward-tapered by using a photosensitive resin composition containing a lactam pigment, and the generation of residues after development is generated. A method for manufacturing an organic EL panel substrate, which can form a bank on the substrate while achieving both suppression, and an organic EL panel substrate that can be manufactured by the above-mentioned manufacturing method, are suitably used in the above-mentioned manufacturing method. It is an object of the present invention to provide a negative type photosensitive resin composition.

As a result of intensive studies, the present inventors have used alkali-soluble resin (A), photopolymerizable monomer (B), photopolymerization initiator (C), and light-shielding agent (D) as materials for bank formation. By using a negative photosensitive composition containing the lactam pigment (D1) of the above, and using a resin having a specific structure as the alkali-soluble resin (A), which has a portion substituted with a fluorine atom at a predetermined position. We have found that the above problems can be solved, and have arrived at the present invention.

（式（ａ−１）中、Ｘ^ａは、下記式（ａ−２）：

で表される基を示し、ｔ１は０以上２０以下の整数を示し、
式（ａ−２）中、Ｒ^ａ１は、それぞれ独立に水素原子、炭素原子数１以上６以下の炭化水素基、又はハロゲン原子を示し、Ｒ^ａ２は、それぞれ独立に水素原子又はメチル基を示し、Ｒ^ａ３は、それぞれ独立に直鎖又は分岐鎖のアルキレン基を示し、ｔ２は、それぞれ独立に０又は１を示し、Ｗ^ａは、下記式（ａ−３）：

で表される基を示し、
式（ａ−３）中の環Ａは、芳香族環と縮合していてもよく置換基を有していてもよい脂肪族環を示し、
Ｒ^ａ０は、−ＣＯ−Ｙ^ａ−ＣＯＯＨで表される基を示し、Ｙ^ａは、ジカルボン酸無水物から酸無水物基を除いた残基を示し、
Ｚ^ａは、テトラカルボン酸二無水物から２個の酸無水物基を除いた残基を示し、
２つのＹ^ａ及びｔ１個のＺ^ａからなる群を構成するＹ^ａ又はＺ^ａの少なくとも１つがフッ素原子を含む。） A first aspect of the present invention is a method for manufacturing a substrate for an organic EL panel, which comprises a patterned black light-shielding film containing a lactam pigment (D1) as a light-shielding agent (D) as a bank on the surface thereof.
A negative photosensitive resin composition containing a light-shielding agent (D) and capable of alkaline development is applied onto a substrate to form a coating film.
The coating film is exposed in a regioselective manner according to the pattern shape of the black light-shielding film.
Developing the exposed coating film with an alkaline developer and
Post-development post-baking includes forming a patterned black light-shielding film with a pattern shape angle of 30 degrees or more and 90 degrees or less.
As the negative photosensitive resin composition, a composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a light-shielding agent (D) was used.
The alkalization-soluble resin (A) is a production method containing a resin represented by the following formula (a-1).

(In the formula (a-1), ^Xa is the following formula (a-2):

Indicates a group represented by, and t1 indicates an integer of 0 or more and 20 or less.
In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, t2 each independently represent 0 or 1, ^{W a} is the following formula (a3):

Indicates a group represented by
Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride,
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride,
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} single including fluorine atoms. )

（式（ａ−１）中、Ｘ^ａは、下記式（ａ−２）：

で表される基を示し、ｔ１は０以上２０以下の整数を示し、
式（ａ−２）中、Ｒ^ａ１は、それぞれ独立に水素原子、炭素原子数１以上６以下の炭化水素基、又はハロゲン原子を示し、Ｒ^ａ２は、それぞれ独立に水素原子又はメチル基を示し、Ｒ^ａ３は、それぞれ独立に直鎖又は分岐鎖のアルキレン基を示し、ｔ２は、それぞれ独立に０又は１を示し、Ｗ^ａは、下記式（ａ−３）：

で表される基を示し、
式（ａ−３）中の環Ａは、芳香族環と縮合していてもよく置換基を有していてもよい脂肪族環を示し、
Ｒ^ａ０は、−ＣＯ−Ｙ^ａ−ＣＯＯＨで表される基を示し、Ｙ^ａは、ジカルボン酸無水物から酸無水物基を除いた残基を示し、
Ｚ^ａは、テトラカルボン酸二無水物から２個の酸無水物基を除いた残基を示し、
２つのＹ^ａ及びｔ１個のＺ^ａからなる群を構成するＹ^ａ又はＺ^ａの少なくとも１つがフッ素原子を含む。）
である。 A second aspect of the present invention is a substrate for an organic EL panel provided with a patterned black light-shielding film containing a lactam pigment (D1) as a light-shielding agent (D) as a bank on the surface thereof.
The pattern shape angle of the cross section of the bank satisfies 30 degrees or more and 90 degrees or less.
The black light-shielding film comprises a cured product of a negative photosensitive resin composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a light-shielding agent (D).
The alkalized soluble resin (A) is a substrate for an organic EL panel containing a resin represented by the following formula (a-1).

(In the formula (a-1), ^Xa is the following formula (a-2):

Indicates a group represented by, and t1 indicates an integer of 0 or more and 20 or less.
In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, t2 each independently represent 0 or 1, ^{W a} is the following formula (a3):

Indicates a group represented by
Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride,
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride,
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} single including fluorine atoms. )
Is.

（式（ａ−１）中、Ｘ^ａは、下記式（ａ−２）：

で表される基を示し、ｔ１は０以上２０以下の整数を示し、
式（ａ−２）中、Ｒ^ａ１は、それぞれ独立に水素原子、炭素原子数１以上６以下の炭化水素基、又はハロゲン原子を示し、Ｒ^ａ２は、それぞれ独立に水素原子又はメチル基を示し、Ｒ^ａ３は、それぞれ独立に直鎖又は分岐鎖のアルキレン基を示し、ｔ２は、それぞれ独立に０又は１を示し、Ｗ^ａは、下記式（ａ−３）：

で表される基を示し、
式（ａ−３）中の環Ａは、芳香族環と縮合していてもよく置換基を有していてもよい脂肪族環を示し、
Ｒ^ａ０は、−ＣＯ−Ｙ^ａ−ＣＯＯＨで表される基を示し、Ｙ^ａは、ジカルボン酸無水物から酸無水物基を除いた残基を示し、
Ｚ^ａは、テトラカルボン酸二無水物から２個の酸無水物基を除いた残基を示し、
２つのＹ^ａ及びｔ１個のＺ^ａからなる群を構成するＹ^ａ又はＺ^ａの少なくとも１つがフッ素原子を含む。） A third aspect of the present invention is used for forming a black light-shielding film as a bank in the method for manufacturing a substrate for an organic EL panel having a patterned black light-shielding film as a bank on the surface thereof according to the first aspect. It is a negative type photosensitive resin composition to be obtained.
Contains an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a light-shielding agent (D).
The light-shielding agent (D) contains a lactam pigment (D1) and contains
The alkalized soluble resin (A) is a negative photosensitive resin composition containing a resin represented by the following formula (a-1).

(In the formula (a-1), ^Xa is the following formula (a-2):

Indicates a group represented by, and t1 indicates an integer of 0 or more and 20 or less.
In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, t2 each independently represent 0 or 1, ^{W a} is the following formula (a3):

Indicates a group represented by
Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride,
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride,
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} single including fluorine atoms. )

According to the present invention, a photosensitive resin composition containing a lactam pigment is used to bank on a substrate while achieving both a rectangular or forward-tapered cross-sectional shape and suppression of the generation of residues after development. Provided are a method for producing a substrate for an organic EL panel capable of forming a substrate, a substrate for an organic EL panel that can be produced by the above-mentioned production method, and a negative photosensitive resin composition preferably used in the above-mentioned production method. can do.

It is a figure which shows typically the cross-sectional shape in the pattern width direction of the bank which has the cross-sectional shape of a forward taper.

≪Manufacturing method of substrate for organic EL panel≫
The method for manufacturing an organic EL panel substrate is a method for producing an organic EL panel substrate having a patterned black light-shielding film containing a lactam pigment (D1) as a light-shielding agent (D) as a bank on the surface thereof.
The manufacturing method is
A negative photosensitive resin composition containing a light-shielding agent (D) and capable of alkaline development is applied onto a substrate to form a coating film.
The coating film is exposed in a regioselective manner according to the pattern shape of the black light-shielding film.
Developing the exposed coating film with an alkaline developer and
This includes forming a patterned black light-shielding film having a pattern shape angle of 30 degrees or more and 90 degrees or less by post-baking after development.

In the above method, a light-shielding agent (D) containing an alkali-soluble resin (A) containing a resin having a specific structure, a photopolymerizable monomer (B), a photopolymerization initiator (C), and a lactam pigment (D1). ) And the composition contained in) are used as a negative photosensitive resin composition for bank formation, so that the cross-sectional shape is rectangular or forward-tapered, and the generation of residues after development is suppressed at the same time. Can be done.

Hereinafter, each step included in the method for manufacturing a substrate for an organic EL panel will be described. Hereinafter, forming a coating film using a negative photosensitive resin composition will be referred to as a “coating film forming step”. Regioselective exposure of the coating film is referred to as an "exposure process". Developing the exposed coating film is referred to as a "development process". Forming a black light-shielding curtain made from a pattern by post-baking after development is referred to as a "black light-shielding film forming step".

<Coating film forming process>
In the coating film forming step, a negative type photosensitive resin composition containing a light-shielding agent (D) and capable of alkaline development is applied onto a substrate to form a coating film.
The type of the substrate is not particularly limited, and various substrates used as the bank forming substrate can be appropriately used in the production of the substrate for the organic EL panel.

A negative photosensitive resin composition is applied to the above substrate. The negative photosensitive resin composition will be described in detail later. The negative photosensitive resin composition will also be referred to as "photosensitive composition" below.

In the coating film forming step, for example, a photosensitive composition is coated using a contact transfer type coating device such as a roll coater, a reverse coater, or a bar coater, or a non-contact type coating device such as a spinner (rotary coating device) or a curtain flow coater. , The coating film is formed on the substrate, and if necessary, the solvent is removed by drying (pre-baking) to form a coating film.

The film thickness of the coating film is not particularly limited. The film thickness of the coating film is appropriately determined in consideration of the size of the bank formed on the substrate. The film thickness of the black light-shielding film formed as a bank is preferably 0.2 μm or more, more preferably 0.3 μm or more and 10 μm or less, further preferably 0.4 μm or more and 5 μm or less, and particularly preferably 0.5 μm or more and 2 μm or less.

<Exposure process>
In the exposure step, the coating film formed in the coating film forming step is regioselectively exposed according to the pattern shape of the black light-shielding film.

In the exposure step, ArF excimer laser coating film, KrF excimer laser, _{F 2} excimer laser, extreme ultraviolet (EUV), vacuum ultraviolet (VUV), electron beams, X-rays, soft X-ray, i-ray, g-line, h-line The coating film is exposed by irradiating with radiation or electromagnetic waves such as. Exposure to the coating film is regioselective via a negative mask. Exposure dose varies depending on the composition of the photosensitive composition, preferably for example, about 10 mJ / cm ² or more 600 mJ / cm ² or less.

<Development process>
In the developing step, the coating film exposed in the exposure step is developed with an alkaline developer.
In the developing step, the exposed coating film is developed with a developing solution to form a black cured film patterned in a desired shape. The developing method is not particularly limited, and a dipping method, a spraying method, or the like can be used. Specific examples of the developing solution include aqueous solutions of sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salts and the like.

When the photosensitive composition described later contains the alkali-soluble resin (A) having a specific structure, the generation of residues after development is suppressed.

<Black light-shielding film forming process>
In the black light-shielding film forming step, a patterned black light-shielding film having a pattern shape angle of 30 degrees or more and 90 degrees or less is formed by post-baking after development. By forming a black light-shielding film using a photosensitive composition containing an alkali-soluble resin (A) having a specific structure described later, the pattern shape angle of the black light-shielding curtain after post-baking is set to 30 degrees or more and 90 or less. Can be done.

The pattern shape angle will be described with reference to FIG. FIG. 1 shows a schematic cross-sectional view of a substrate for an organic EL panel provided with a black light-shielding film 10 on a substrate 90a. In FIG. 1, the pattern shape angle is an angle θ formed by the surface of the substrate 90a and the surface of the black light-shielding film 10 in the vicinity of the substrate 90a in the vicinity of the surface of the substrate 90a.

The pattern shape angle can be adjusted, for example, by adjusting at least one of the following conditions i) to v).
i) Content of alkali-soluble resin (A) in the photosensitive composition ii) Content of photopolymerizable monomer (B) in the photosensitive composition ii) Content of the light-shielding agent (D) in the photosensitive composition Amount iv) Development time v) Post-bake temperature and / or time after development

The temperature of the post-bake after development is preferably 80 ° C. or higher and 250 ° C. or lower, and more preferably 100 ° C. or higher and 230 ° C. or lower. The post-baking time after development is preferably 5 minutes or more and 60 minutes or less, and more preferably 10 minutes or more and 30 minutes or less.

<Negative photosensitive resin composition>
The photosensitive composition, which is a negative photosensitive resin composition, contains an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a light-shielding agent (D). Hereinafter, essential and arbitrary components contained in the photosensitive composition will be described.

[Alkali-soluble resin (A)]
The photosensitive composition contains an alkali-soluble resin (A). The alkali-soluble resin (A) is not particularly limited except that it contains a resin represented by the following formula (a-1). The alkali-soluble resin may consist only of the resin represented by the following formula (a-1), or may be a combination of the resin represented by the following formula (a-1) and another resin.
Here, in the present specification, the alkali-soluble resin (A) refers to a resin having a functional group having alkali solubility in the molecule. The functional group having alkali solubility is, for example, a phenolic hydroxyl group, a carboxy group, a sulfonic acid group or the like.

で表される基を示す。ｔ１は０以上２０以下の整数を示す。 In the formula (a-1), X ^a is the following formula (a-2):

Indicates a group represented by. t1 represents an integer of 0 or more and 20 or less.

In the formula (a-2), ^Ra1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom. ^Ra2 independently represents a hydrogen atom or a methyl group. ^Ra3 independently represents a linear or branched alkylene group. t2 independently represents 0 or 1, respectively.

で表される基を示す。 W ^a is represented by the following formula (a-3):

Indicates a group represented by.

Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride.
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride.
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} include fluorine atom.

The resin represented by the above formula (a-1) has a cardo structure in its structure. The cardo structure refers to a structure in which a second cyclic structure and a third cyclic structure are bonded to one ring carbon atom constituting the first cyclic structure. The second annular structure and the third annular structure may have the same structure or different structures.
A typical example of the cardo structure is a structure in which two aromatic rings (for example, a benzene ring) are bonded to a carbon atom at the 9-position of the fluorene ring.
Hereinafter, the resin represented by the formula (a-1) is also referred to as “fluorinated cardo resin”.

(Fluorinated cardo resin)
The fluorinated cardo resin is a resin represented by the above formula (a-1). Wherein ^{(a-1), X} a is a group represented by the above formula (a-2).

In the formula (a-2), ^{as Ra3} , an alkylene group having 1 to 20 carbon atoms is preferable, an alkylene group having 1 to 10 carbon atoms is more preferable, and an alkylene group having 1 to 6 carbon atoms is preferable. Is particularly preferable, and ethane-1,2-diyl group, propane-1,2-diyl group, and propane1,3-diyl group are most preferable.

Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent. The aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocycle.
Examples of the aliphatic ring include monocycloalkane, bicycloalkane, tricycloalkane, tetracycloalkane and the like.
Specific examples thereof include monocycloalkanes such as cyclopentane, cyclohexane, cycloheptane and cyclooctane, and adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.
The aromatic ring that may be condensed with the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic heterocycle, and an aromatic hydrocarbon ring is preferable. Specifically, a benzene ring and a naphthalene ring are preferable.

Preferable examples of the divalent group represented by the formula (a-3) include the following groups.

^{The divalent group X a} in the formula (a-1) is a cardo by reacting a tetracarboxylic dianhydride giving the residue Z ^a with a diol compound represented by the following formula (a-2a). It is introduced into the resin (a-1).

In the formula (a-2a), R ^a1 , R ^a2 , R ^a3 , and t2 are as described in the formula (a-2). The ring A in the formula (a-2a) is as described in the formula (a-3).

The diol compound represented by the formula (a-2a) can be produced, for example, by the following method.
First, the hydrogen atom in the phenolic hydroxyl group of the diol compound represented by the following formula (a-2b) is replaced with a group represented by ^{−R a3 −OH according to a conventional method, if necessary.} Glysidylation is performed with epichlorohydrin or the like to obtain an epoxy compound represented by the following formula (a-2c).
Then, the epoxy compound represented by the formula (a-2c) is reacted with acrylic acid or methacrylic acid to obtain a diol compound represented by the formula (a-2a).
In formulas (a-2b) and (a-2c), ^Ra1 , ^Ra3 , and t2 are as described for formula (a-2). The ring A in the formula (a-2b) and the formula (a-2c) is as described in the formula (a-3).
The method for producing the diol compound represented by the formula (a-2a) is not limited to the above method.

Preferable examples of the diol compound represented by the formula (a-2b) include the following diol compounds.

In the formula ^{(a-1), R a0} is a group represented by ^-CO-Y a -COOH. Here, ^{Y a} represents the residue obtained by removing dicarboxylic acid anhydride from the acid anhydride group (-CO-O-CO-).
Further, at least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} include fluorine atom.

If Y ^a contains no fluorine atom, examples of the dicarboxylic acid anhydride to give Y ^a, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, Examples thereof include methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride, methyltetrahydrophthalic anhydride and glutaric anhydride.

If Y ^a contains no fluorine atoms, the dicarboxylic acid to give Y ^a, examples of the dicarboxylic acid anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydride A compound in which one or more fluorine atoms or fluorine-containing substituents are introduced into a dicarboxylic acid anhydride such as hexahydrophthalic acid, methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride, methyltetrahydrophthalic anhydride, phthalic anhydride, etc. Can be mentioned.

Examples of the fluorine-containing substituent include a fluorinated alkyl group such as a trifluoromethyl group, a difluoromethyl group, a monofluoromethyl group, a pentafluoroethyl group, a 2,2,2-trifluoroethyl group, and a trifluoromethoxy group. Fluorinated alkoxy groups such as difluoromethoxy group, monofluoromethoxy group, pentafluoroethoxy group, and 2,2,2-trifluoroethoxy group, 4-fluorophenyl group, 3-fluorophenyl group, and 2-fluorophenyl. Examples thereof include a fluorinated aryl group such as a group.

Specific examples of the dicarboxylic anhydride to give Y ^a where Y ^a is containing fluorine atoms, 3-fluoro-anhydride, 4-fluoro anhydride, 4,5-difluoro-phthalic anhydride, tetrafluoro anhydride Acid, tetrafluorophthalic anhydride, 3- (4-fluorophenyl) dihydrofuran-2,5-dione, 3- (3-fluorophenyl) dihydrofuran-2,5-dione, 3- (2-fluorophenyl) Examples thereof include dihydrofuran-2,5-dione and N- (2,5-dioxotetrahydro-3-furanyl) -4-fluorobenzamide.

As the dicarboxylic acid anhydride to give Y ^a, it may be used singly or may be used in combination of two or more kinds. When ^a plurality of types of dicarboxylic acid anhydrides giving Ya are used, a dicarboxylic acid anhydride containing no fluorine atom and a dicarboxylic acid anhydride containing no fluorine atom may be used in combination.

Further, in the above formula ^(a-1), Z a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride. ^{Examples of the tetracarboxylic dianhydride giving Za when Z a} does not contain ^a fluorine atom include a tetracarboxylic dianhydride represented by the following formula (a-4), a pyromellitic dianhydride, and the like. Examples thereof include benzophenone tetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, and biphenyl ether tetracarboxylic dianhydride. Of these, pyromellitic dianhydride or biphenyltetracarboxylic dianhydride is preferable, and pyromellitic dianhydride is preferable because it has a wide development process margin.

式（ａ−４）中、Ｒ^ａ４、Ｒ^ａ５、及びＲ^ａ６は、それぞれ独立に、水素原子、炭素原子数１以上１０以下のアルキル基及びフッ素原子からなる群より選択される１種を示し、ｔ３は、０以上１２以下の整数を示す。

In formula (a-4), R ^a4 , R ^a5 , and R ^a6 each independently represent one selected from the group consisting of a hydrogen atom, an alkyl group having 1 or more and 10 or less carbon atoms, and a fluorine atom. , T3 represent an integer of 0 or more and 12 or less.

^{The alkyl group that can be selected as Ra4} in the formula (a-4) is an alkyl group having 1 or more and 10 or less carbon atoms. By setting the number of carbon atoms contained in the alkyl group in this range, the heat resistance of the obtained carboxylic acid ester can be further improved. When R ^a4 is an alkyl group, the number of carbon atoms thereof is preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, and further preferably 1 or more and 4 or less, from the viewpoint that a cardo resin having excellent heat resistance can be easily obtained. 1 or more and 3 or less are particularly preferable.
When R ^a4 is an alkyl group, the alkyl group may be linear or branched.

^{As R a4} in the formula (a-4), a hydrogen atom or an alkyl group having 1 or more and 10 or less carbon atoms is more preferable independently from the viewpoint that a cardo resin having excellent heat resistance can be easily obtained. ^{R a4} in the formula (a-4) is more preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group or an isopropyl group, and particularly preferably a hydrogen atom or a methyl group.
^{The plurality of Ra4s} in the formula (a-4) are preferably the same group because it is easy to prepare a high-purity tetracarboxylic dianhydride.

T3 in the formula (a-4) represents an integer of 0 or more and 12 or less. Purification of the tetracarboxylic dianhydride can be facilitated by setting the value of t3 to 12 or less.
The upper limit of t3 is preferably 5 and more preferably 3 because the tetracarboxylic dianhydride can be easily purified.
From the viewpoint of the chemical stability of the tetracarboxylic dianhydride, the lower limit of t3 is preferably 1 and more preferably 2.
2 or 3 is particularly preferable for t3 in the formula (a-4).

The alkyl groups having 1 or more and 10 or less carbon atoms that can be selected as ^{R a5} and R ^a6 in the formula (a-4) are the same as the alkyl groups having 1 or more and 10 or less carbon atoms that can be selected as ^{R a4.} ..
R ^a5 and R ^a6 have a hydrogen atom or a carbon atom number of 1 or more and 10 or less (preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, because the tetracarboxylic dianhydride can be easily purified. More preferably, it is 1 or more and 4 or less, particularly preferably 1 or more and 3 or less), and it is particularly preferable that it is a hydrogen atom or a methyl group.

Examples of the tetracarboxylic acid dianhydride represented by the formula (a-4) include norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride (also known as "norbornane-2-spir-2'-cyclopentanone-5'-spiro-2"-norbornane-5,5'', 6,6'' -Tetracarboxylic acid dianhydride "), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-(methylnorbornane) -5,5", 6,6 "-tetra Norbornane dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride (also known as "norbornane-" 2-Spiro-2'-Cyclohexanone-6'-Spiro-2 "-norbornane-5,5", 6,6 "-tetracarboxylic acid dianhydride"), methylnorbornane-2-spiro-α- Cyclohexanone-α'-spiro-2''- (methylnorbornane) -5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclopropanol-α'- Spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclobutanone-α'-spiro-2''-norbornane-5, 5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cycloheptanone-α'-spiro-2''-norbornane-5,5'', 6,6' '-Tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclooctanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride , Norbornane-2-spiro-α-cyclononanonone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclodecanone -Α'-Spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cycloundecanone-α'-spiro-2' '-Norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride, Norbornane-2-spiro-α-cyclododecanone-α'-Spyro-2''-norbornane-5,5' ', 6, 6''-Tetracarboxylic acid dianhydride, Norbornane Nan-2-spiro-α-cyclotridecanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α- Cyclotetradecanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclopentadecanone-α' -Spiro-2 "-norbornane-5,5", 6,6 "-tetracarboxylic acid dianhydride, norbornane-2-spiro-α- (methylcyclopentanone) -α'-spiro-2' '-Norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride, Norbornane-2-spiro-α- (methylcyclohexanone) -α'-Spiro-2''-norbornane-5,5 '', 6,6''-Tetracarboxylic acid dianhydride and the like can be mentioned.

Specific examples of the tetracarboxylic dianhydride that gives ^{Z a when Z a contains a} fluorine atom include the following compounds.

In the above equation (a-1), t1 represents an integer of 0 or more and 20. t1 is preferably an integer of 1 or more and 20 or less. And the effect of formation of a good cross-sectional shape of the bank, since it is easy to obtain the effect of suppressing the occurrence of development residue, if t1 is 1 to 20 integer, at least one of the t1 amino Z ^a It preferably contains a fluorine atom.

And the effect of formation of a good cross-sectional shape of the bank, since it is easy to obtain the effect of suppressing the occurrence of development residue, residues containing fluorine atom as Z ^a is have a fluorinated aliphatic hydrocarbon group preferable. The number of carbon atoms of the fluorinated aliphatic hydrocarbon group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, further preferably 1 or more and 4 or less, and particularly preferably 1 or 2. Examples of the fluorinated aliphatic hydrocarbon group include a linear fluorinated alkyl group, a branched chain fluorinated alkyl group, and a fluorinated cycloalkyl group. Among these, a linear fluorinated alkyl group and a branched chain fluorinated alkyl group are preferable, and a linear fluorinated alkyl group is more preferable.

Preferable specific examples of the linear fluorinated alkyl group include a trifluoromethyl group, a difluoromethyl group, a monofluoromethyl group, a pentafluoroethyl group, a 2,2,2-trifluoroethyl group and the like.

The weight average molecular weight of the fluorinated cardo resin is preferably 1000 or more and 40,000 or less, more preferably 1500 or more and 30,000 or less, and further preferably 2000 or more and 10000 or less. Within the above range, it is possible to obtain sufficient heat resistance and mechanical strength of the black light-shielding film while obtaining good developability.

The content of the fluorinated cardo resin in the alkali-soluble resin (A) is not particularly limited as long as it does not impair the object of the present invention. The preferable range of the mass of the fluorinated cardo resin with respect to the mass of the alkali-soluble resin (A) is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and further preferably 90% by mass or more. More preferably, 100% by mass is particularly preferable.

(Cardo resins other than fluorinated cardo resins)
The alkali-soluble resin (A) may contain, as a resin other than the fluorinated cardo resin, another cardo resin that does not correspond to the fluorinated cardo resin represented by the formula (a-1).
As the other cardo resin, in the formula (a-1), all of Y ^a is replaced with residue in which an acid anhydride group is excluded from a dicarboxylic acid anhydride containing no fluorine atom, all Z ^a fluorine Examples thereof include compounds in which atom-free tetracarboxylic acid dianhydrides are substituted with residues obtained by removing two acid anhydride groups.
The preferred weight average molecular weight of the other cardo resins described above is the same as that of the fluorinated cardo resin.

(Novolac resin)
The alkali-soluble resin (A) may contain a novolak resin from the viewpoint of suppressing an excessive heat flow of the black cured film due to heating during post-baking.
As the novolak resin, various novolak resins conventionally blended in the photosensitive composition can be used. As the novolak resin, a resin obtained by addition-condensing an aromatic compound having a phenolic hydroxyl group (hereinafter, simply referred to as "phenols") and aldehydes under an acid catalyst is preferable.

-Phenols Examples of phenols used in producing novolak resin include phenols; cresols such as o-cresol, m-cresol, and p-cresol; 2,3-xylenol, 2,4-xylenol, and 2 , 5-Xylenol, 2,6-Xylenol, 3,4-Xylenol, 3,5-Xylenol and other xylenols; o-ethylphenol, m-ethylphenol, p-ethylphenol and other ethylphenols; 2-isopropyl Alkylphenols such as phenol, 3-isopropylphenol, 4-isopropylphenol, o-butylphenol, m-butylphenol, p-butylphenol, and p-tert-butylphenol; 2,3,5-trimethylphenol, and 3,4,5 -Trialkylphenols such as trimethylphenol; polyhydric phenols such as resorcinol, catechol, hydroquinone, hydroquinone monomethyl ether, pyrogallol, and fluoroglycinol; alkyl polyhydric phenols such as alkylresorcin, alkylcatechol, and alkylhydroquinone (any of them) The alkyl group of is also having 1 or more and 4 or less carbon atoms.); Α-naphthol; β-naphthol; hydroxydiphenyl; and bisphenol A and the like. These phenols may be used alone or in combination of two or more.

Among these phenols, m-cresol and p-cresol are preferable, and it is more preferable to use m-cresol and p-cresol in combination. In this case, various characteristics such as heat resistance of the bank formed by using the photosensitive composition can be adjusted by adjusting the blending ratio of both.
The blending ratio of m-cresol and p-cresol is not particularly limited, but the molar ratio of m-cresol / p-cresol is preferably 3/7 or more and 8/2 or less. By using m-cresol and p-cresol in a ratio within such a range, it is easy to obtain a photosensitive composition capable of forming a bank having excellent heat resistance.

A novolak resin produced by using m-cresol and 2,3,5-trimethylphenol in combination is also preferable. When such a novolak resin is used, it is particularly easy to obtain a photosensitive composition capable of forming a black light-shielding film that is difficult to flow excessively by heating during post-baking.
The blending ratio of m-cresol and 2,3,5-trimethylphenol is not particularly limited, but the molar ratio of m-cresol / 2,3,5-trimethylphenol is preferably 70/30 or more and 95/5 or less.

-Aldehydes Examples of the aldehydes used in producing the novolak resin include formaldehyde, paraformaldehyde, furfural, benzaldehyde, nitrobenzaldehyde, acetaldehyde and the like. These aldehydes may be used alone or in combination of two or more.

-Acid catalyst Examples of the acid catalyst used in producing the novolak resin include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and phosphoric acid; formic acid, oxalic acid, acetic acid, diethyl sulfate, and paratoluene. Examples include organic acids such as sulfonic acid; and metal salts such as zinc acetate. These acid catalysts may be used alone or in combination of two or more.

-Molecular weight The polystyrene-equivalent weight average molecular weight (Mw; hereinafter, also simply referred to as "weight average molecular weight") of the novolak resin is the lower limit from the viewpoint of resistance to the flow due to heating of the bank formed by using the photosensitive composition. As a value, 2000 is preferable, 5000 is more preferable, 10000 is particularly preferable, 15000 is further preferable, 20000 is most preferable, 50000 is preferable as an upper limit value, 45000 is more preferable, 40,000 is further preferable, and 35000 is most preferable.

As the novolak resin, at least two kinds of resins having different polystyrene-equivalent weight average molecular weights can be used in combination. By using a combination of resins having different weight average molecular weights, it is possible to balance the developability of the photosensitive composition and the heat resistance of the cured film formed by using the photosensitive composition.

(Modified epoxy resin)
The alkali-soluble resin (A) has an epoxy compound (a-3a) and an unsaturated group-containing carboxylic acid (a-) because it realizes higher flow resistance during baking and easily imparts high water resistance to the bank. It may contain a polybasic acid anhydride (a-3c) adduct of the reaction product with 3b). Such an adduct is also referred to as "modified epoxy resin".
In the specification of the present application and the scope of claims, a compound corresponding to the above definition and not corresponding to the above-mentioned fluorinated cardo resin and other cardo resins is referred to as a modified epoxy resin.

Hereinafter, the epoxy compound (a-3a), the unsaturated group-containing carboxylic acid (a-3b), and the polybasic acid anhydride (a-3c) will be described.

-Epoxy compound (a-3a)
The epoxy compound (a-3a) is not particularly limited as long as it is a compound having an epoxy group, and may be an aromatic epoxy compound having an aromatic group or an aliphatic epoxy compound containing no aromatic group. Often, aromatic epoxy compounds having an aromatic group are preferred.
The epoxy compound (a-3a) may be a monofunctional epoxy compound or a bifunctional or higher functional epoxy compound, and a polyfunctional epoxy compound is preferable.

Specific examples of the epoxy compound (a-3a) include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AD type epoxy resin, naphthalene type epoxy resin, and biphenyl type epoxy resin. Functional epoxy resin; glycidyl ester type epoxy resin such as dimer acid glycidyl ester and triglycidyl ester; tetraglycidyl aminodiphenylmethane, triglycidyl-p-aminophenol, tetraglycidyl metaxylylene diamine, tetraglycidyl bisaminomethylcyclohexane and the like. Glycidylamine type epoxy resin; heterocyclic epoxy resin such as triglycidyl isocyanurate; fluoroglycinol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, glycerin triglycidyl ether, 2- [4- (2,3-Epoxy propoxy) phenyl] -2- [4- [1,1-bis [4- (2,3-epoxy propoxy) phenyl] ethyl] phenyl] propane, and 1,3-bis [4- [1- [4- (2,3-epoxypropoxy) phenyl] -1- [4- [1- [4- (2,3-epoxypropoxy) phenyl] -1-methylethyl] phenyl] ethyl] phenoxy] Trifunctional epoxy resins such as -2-propanol; tetrafunctional epoxy resins such as tetrahydroxyphenylethane tetraglycidyl ether, tetraglycidyl benzophenone, bisresorcinol tetraglycidyl ether, and tetraglycidoxybiphenyl can be mentioned.

Further, as the epoxy compound (a-3a), an epoxy compound having a biphenyl skeleton is preferable.
The epoxy compound having a biphenyl skeleton preferably has at least one biphenyl skeleton represented by the following formula (a-3a-1) in the main chain.
The epoxy compound having a biphenyl skeleton is preferably a polyfunctional epoxy compound having two or more epoxy groups.
By using an epoxy compound having a biphenyl skeleton, it is easy to obtain a photosensitive composition capable of forming a cured film having an excellent balance between sensitivity and developability and excellent adhesion to a substrate.

（式（ａ−３ａ−１）中、Ｒ^ａ７は、それぞれ独立に、水素原子、炭素原子数１以上１２以下のアルキル基、ハロゲン原子、又は置換基を有してもよいフェニル基であり、ｊは１以上４以下の整数である。）

(In the formula (a-3a-1), R ^a7 is a phenyl group which may independently have a hydrogen atom, an alkyl group having 1 or more and 12 or less carbon atoms, a halogen atom, or a substituent. j is an integer of 1 or more and 4 or less.)

When R ^a7 is an alkyl group having 1 or more carbon atoms and 12 or less carbon atoms, specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group and sec-butyl. Group, tert-butyl group, n-pentyl group, isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert- Examples thereof include an octyl group, an n-nonyl group, an isononyl group, an n-decyl group, an isodecyl group, an n-undecyl group, and an n-dodecyl group.

When R ^a7 is a halogen atom, specific examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

When R ^a7 is a phenyl group which may have a substituent, the number of substituents on the phenyl group is not particularly limited. The number of substituents on the phenyl group is 0 to 5, preferably 0 or 1.
Examples of substituents are an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aliphatic acyl group having 2 to 4 carbon atoms, a halogen atom, a cyano group, and a nitro group. The group is mentioned.

（式（ａ−３ａ−２）中、Ｒ^ａ７及びｊは、式（ａ−３ａ−１）と同様であり、ｋは括弧内の構成単位の平均繰り返し数であって０以上１０以下である。） The epoxy compound (a-3a) having a biphenyl skeleton represented by the above formula (a-3a-1) is not particularly limited, and examples thereof include an epoxy compound represented by the following formula (a-3a-2). be able to.

(In the formula (a-3a-2), R ^a7 and j are the same as those in the formula (a-3a-1), and k is the average number of repetitions of the structural units in parentheses, which is 0 or more and 10 or less. .)

（式（ａ−３ａ−３）中、ｋは、式（ａ−３ａ−２）と同様である。） Among the epoxy compounds represented by the formula (a-3a-2), it is particularly easy to obtain a photosensitive composition having an excellent balance between sensitivity and developability, and therefore, it is represented by the following formula (a-3a-3). Compounds are preferred.

(In the formula (a-3a-3), k is the same as the formula (a-3a-2).)

-Unsaturated group-containing carboxylic acid (a-3b)
In preparing the modified epoxy resin, the epoxy compound (a-3a) is reacted with the unsaturated group-containing carboxylic acid (a-3b).
As the unsaturated group-containing carboxylic acid (a-3b), a monocarboxylic acid containing a reactive unsaturated double bond such as an acrylic group or a methacrylic group in the molecule is preferable. Examples of such unsaturated group-containing carboxylic acids include acrylic acid, methacrylic acid, β-styrylacrylic acid, β-flufurylacrylic acid, α-cyanocinnamic acid, and cinnamic acid. Further, the unsaturated group-containing carboxylic acid (a-3b) may be used alone or in combination of two or more.

The epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) can be reacted by a known method. As a preferable reaction method, for example, the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) are mixed with a tertiary amine such as triethylamine or benzylethylamine, dodecyltrimethylammonium chloride, tetramethylammonium chloride, or the like. Examples thereof include a method of reacting in an organic solvent at a reaction temperature of 50 ° C. or higher and 150 ° C. or lower for several hours to several tens of hours using a quaternary ammonium salt such as tetraethylammonium chloride or benzyltriethylammonium chloride, pyridine, or triphenylphosphine as a catalyst. Be done.

The ratio of the amounts used in the reaction of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) is the epoxy equivalent of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b). The ratio of a-3b) to the carboxylic acid equivalent is usually preferably 1: 0.5 to 1: 2, more preferably 1: 0.8 to 1: 1.25, and 1: 0.9 to 1: 1. .1 is particularly preferable.
When the ratio of the amount of the epoxy compound (a-3a) used and the amount of the unsaturated group-containing carboxylic acid (a-3b) used is 1: 0.5 to 1: 2 in the above equivalent ratio, the crosslinking efficiency Is preferable because it tends to improve.

-Polybasic acid anhydride (a-3c)
Polybasic acid anhydride (a-3c) is an anhydride of a carboxylic acid having two or more carboxyl groups.
The polybasic acid anhydride (a-3c) is not particularly limited, and for example, phthalic anhydride, succinic anhydride, phthalic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride are used. Phthalic anhydride, methyltetrahydrophthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic dianhydride, 3-methylhexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, 3-ethylhexa Hydrophthalic anhydride, 4-ethylhexahydrophthalic anhydride, tetrahydrophthalic anhydride, 3-methyltetrahydrophthalic anhydride, 4-methyltetrahydrophthalic anhydride, 3-ethyltetrahydrophthalic anhydride, 4-ethyltetrahydrophthalic anhydride , The compound represented by the following formula (a-3c-1), and the compound represented by the following formula (a-3c-2) can be mentioned. Further, the polybasic acid anhydride (a-3c) may be used alone or in combination of two or more.

式（ａ−３ｃ−２）中、Ｒ^ａ８は、炭素原子数１以上１０以下の置換基を有してもよいアルキレン基を示す。

In the formula (a-3c-2), R ^a8 represents an alkylene group which may have a substituent having 1 or more and 10 or less carbon atoms.

The polybasic acid anhydride (a-3c) is preferably a compound having two or more benzene rings because it is easy to obtain a photosensitive composition having an excellent balance between sensitivity and developability. Further, the polybasic acid anhydride (a-3c) contains at least one of the compound represented by the above formula (a-3c-1) and the compound represented by the above formula (a-3c-2). Is more preferable.

The method of reacting the epoxy compound (a-3a) with the unsaturated group-containing carboxylic acid (a-3b) and then the polybasic acid anhydride (a-3c) can be appropriately selected from known methods.
The amount ratio used is the number of moles of OH groups in the component after the reaction between the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b), and the polybasic acid anhydride (a-3c). ), The equivalent ratio of the acid anhydride groups is usually 1: 1 to 1: 0.1, preferably 1: 0.8 to 1: 0.2. Within the above range, it is easy to obtain a photosensitive composition having good developability.

The acid value of the modified epoxy resin is preferably 10 mgKOH / g or more and 150 mgKOH / g or less, and more preferably 70 mgKOH / g or more and 110 mgKOH / g or less in terms of resin solid content. Sufficient solubility in a developing solution can be obtained by setting the acid value of the resin to 10 mgKOH / g or more, and sufficient curability can be obtained by setting the acid value to 150 mgKOH / g or less to improve the surface property. Can be good.

The weight average molecular weight of the modified epoxy resin is preferably 1000 or more and 40,000 or less, and more preferably 2000 or more and 30,000 or less. When the weight average molecular weight is 1000 or more, it is easy to form a cured film having excellent heat resistance and strength. Further, when it is 40,000 or less, it is easy to obtain a photosensitive composition showing sufficient solubility in a developing solution.

(Acrylic resin)
Acrylic resins are also preferable as components constituting the alkali-soluble resin (A) together with the fluorinated cardo resin.
As the acrylic resin, a resin containing a structural unit derived from (meth) acrylic acid and / or a structural unit derived from another monomer such as (meth) acrylic acid ester can be used. The (meth) acrylic acid is acrylic acid or methacrylic acid. The (meth) acrylic acid ester is a compound represented by the following formula (a-4-1), and is not particularly limited as long as the object of the present invention is not impaired.

In the above formula (a-4-1), R ^a9 is a hydrogen atom or a methyl group, and R ^a10 is a monovalent organic group. This organic group may contain a bond or a substituent other than the hydrocarbon group such as a hetero atom in the organic group. Further, the organic group may be linear, branched or cyclic.

The substituent other than a hydrocarbon group in the organic group R ^a10, the effect is not particularly limited as long as they do not impair the present invention, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group , Isocyanato group, thiocyanato group, isothiocyanato group, silyl group, silanol group, alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxy group, carboxylate group, acyl group, acyloxy group, sulfino Group, sulfo group, sulfonate group, phosphino group, phosphinyl group, phosphono group, phosphonato group, hydroxyimino group, alkyl ether group, alkyl thioether group, aryl ether group, aryl thioether group, amino group (-NH ₂ , -NHR, -NRR': R and R'independently indicate a hydrocarbon group) and the like. The hydrogen atom contained in the above substituent may be substituted with a hydrocarbon group. The hydrocarbon group contained in the substituent may be linear, branched or cyclic.

The organic group as R ^a10 is acryloyloxy group, methacryloyloxy group, an epoxy group, may have a reactive functional group such as oxetanyl group.
Acyl groups having unsaturated double bonds, such as acryloyloxy groups and metaacryloyloxy groups, are, for example, acrylic acid or methacryl in at least a part of the epoxy groups in an acrylic resin containing a structural unit having an epoxy group. It can be produced by reacting an unsaturated carboxylic acid such as an acid.

R ^a10 is preferably an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group, and these groups may be substituted with a halogen atom, a hydroxyl group, an alkyl group, or a heterocyclic group. When these groups contain an alkylene moiety, the alkylene moiety may be interrupted by an ether bond, a thioether bond, or an ester bond.

When the alkyl group is linear or branched, the number of carbon atoms of the alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 15 or less, and particularly preferably 1 or more and 10 or less. Examples of suitable alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, isopentyl group, sec. -Pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, Examples thereof include an isodecyl group.

When the alkyl group is an alicyclic group or a group containing an alicyclic group, suitable alicyclic groups contained in the alkyl group include a cyclopentyl group, a monocyclic alicyclic group such as a cyclohexyl group, and the like. , Adamantyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, tetracyclododecyl group and other polycyclic alicyclic groups.

The compound represented by the formula (a-4-1) is, in a case having a chain groups having an epoxy group as R ^a10, specific examples of the compound represented by the formula (a-4-1) is, Examples thereof include (meth) acrylic acid epoxyalkyl esters such as glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, and 6,7-epoxyheptyl (meth) acrylate. ..

Further, the compound represented by the formula (a-4-1) may be an alicyclic epoxy group-containing (meth) acrylic acid ester. The alicyclic group constituting the alicyclic epoxy group may be monocyclic or polycyclic. Examples of the monocyclic alicyclic group include a cyclopentyl group and a cyclohexyl group. Examples of the polycyclic alicyclic group include a norbornyl group, an isobornyl group, a tricyclononyl group, a tricyclodecyl group, a tetracyclododecyl group and the like.

Specific examples of the case where the compound represented by the formula (a-4-1) is an alicyclic epoxy group-containing (meth) acrylic acid ester include the following formulas (a-4-1a) to (a-4). Examples thereof include the compound represented by -1o). Among these, in order to keep the developability within an appropriate range, the compounds represented by the following formulas (a-4-1a) to (a-4-1e) are preferable, and the following formula (a-4-1a) is preferable. )-(A-4-1c) are more preferable.

In the above ^{formulas, R a20} represents a hydrogen atom or a methyl ^{group, R a21} represents a divalent aliphatic saturated hydrocarbon group having 1 to 6 carbon ^{atoms, R a22} is 2 having 1 to 10 carbon atoms It indicates a valent hydrocarbon group, and t indicates an integer of 0 or more and 10 or less. As ^Ra21 , a linear or branched alkylene group, for example, a methylene group, an ethylene group, a propylene group, a tetramethylene group, an ethylethylene group, a pentamethylene group, or a hexamethylene group is preferable. ^{Examples of Ra22} include a methylene group, an ethylene group, a propylene group, a tetramethylene group, an ethylethylene group, a pentamethylene group, a hexamethylene group, a phenylene group, a cyclohexylene group, and -CH ₂ -Ph-CH _2- (Ph is (Indicating a phenylene group) is preferable.

Further, the acrylic resin may be a copolymer obtained by further polymerizing a monomer other than the (meth) acrylic acid ester. Examples of the monomer other than the (meth) acrylic acid ester include (meth) acrylamides, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, styrenes and the like. These monomers can be used alone or in combination of two or more.

Examples of (meth) acrylamides include (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-dialkyl (meth) acrylamide, N, N-aryl (meth) acrylamide, and N. Examples thereof include -methyl-N-phenyl (meth) acrylamide and N-hydroxyethyl-N-methyl (meth) acrylamide.

Examples of unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; and anhydrides of these dicarboxylic acids.

Examples of the allyl compound include allyl esters such as allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate, and allyl lactate; allyloxyethanol; and the like. Can be mentioned.

Examples of vinyl ethers include hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethyl hexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether and hydroxyethyl vinyl ether. , Diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether and other alkyl vinyl ethers; vinyl phenyl ether, vinyl trill ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl ether. , Vinyl aryl ethers such as vinyl naphthyl ethers and vinyl anthranyl ethers; and the like.

Examples of vinyl esters include vinyl butyrate, vinyl isobutyrate, vinyl trimethyl acetate, vinyl diethyl acetate, vinyl ballerate, vinyl caproate, vinyl chloro acetate, vinyl dichloro acetate, vinyl methoxy acetate, vinyl butoxy acetate, and vinyl phenyl. Examples thereof include acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenylbutyrate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, vinyl naphthoate and the like.

Styrenes include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxy. Alkylstyrene such as methylstyrene and acetoxymethylstyrene; alkoxystyrene such as methoxystyrene, 4-methoxy-3-methylstyrene and dimethoxystyrene; chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, Examples thereof include halostyrene such as dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, and 4-fluoro-3-trifluoromethylstyrene.

The amount of the structural unit derived from (meth) acrylic acid and the amount of the structural unit derived from other monomers in the acrylic resin are not particularly limited as long as the object of the present invention is not impaired. The amount of the structural unit derived from (meth) acrylic acid in the acrylic resin is preferably 5% by mass or more and 50% by mass or less, and more preferably 10% by mass or more and 30% by mass or less with respect to the mass of the acrylic resin. ..

When the acrylic resin has a structural unit having an unsaturated double bond, the amount of the structural unit having an unsaturated double bond in the acrylic resin is preferably 1% by mass or more and 50% by mass or less, and 1% by mass. More than 30% by mass is more preferable, and 1% by mass or more and 20% by mass or less is particularly preferable.
Since the acrylic resin contains a structural unit having an unsaturated double bond in an amount within the above range, the acrylic resin can be incorporated into the cross-linking reaction at the time of exposure and homogenized in the black light-shielding film, so that the heat resistance of the bank is high. Effective for improving properties and mechanical properties.

The weight average molecular weight of the acrylic resin is preferably 2000 or more and 50,000 or less, and more preferably 3000 or more and 30,000 or less. Within the above range, the film-forming ability of the photosensitive composition and the developability after exposure tend to be easily balanced.

The content of the alkali-soluble resin (A) is preferably 10% by mass or more and 65% by mass or less, and preferably 15% by mass or more and 50% by mass or less, based on the total mass of the solid content of the photosensitive composition. More preferable. Within the above range, it is easy to obtain a photosensitive composition having excellent developability.

<Photopolymerizable monomer (B)>
As the photopolymerizable monomer (B), a compound having an ethylenically unsaturated double bond can be preferably used. Preferable examples of the compound having an ethylenically unsaturated double bond include a monofunctional monomer and a polyfunctional monomer.

Examples of the monofunctional monomer include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, butoxymethoxymethyl (meth) acrylamide, and N-methylol ( Meta) acrylamide, N-hydroxymethyl (meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-acrylamide- 2-Methylpropanesulfonic acid, tert-butylacrylamide sulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl (Meta) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-phenoxy-2-hydroxypropyl (meth) acrylate, 2- (meth) acryloyloxy-2-hydroxypropylphthalate, Glycerin mono (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, glycidyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2 , 3,3-Tetrafluoropropyl (meth) acrylate, half (meth) acrylate of phthalic acid derivative and the like. These monofunctional monomers can be used alone or in combination of two or more.

On the other hand, as the polyfunctional monomer, 1,3-butanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol Di (meth) acrylate, 1,10-decanediol di (meth) acrylate, 1,12-dodecanediol di (meth) acrylate, ethoxylated hexanediol di (meth) acrylate, tricyclodecanedimethanol di (meth) acrylate , 2-Hydroxy-3- (meth) acryloyloxypropyl (meth) acrylate, dipentaerythritol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, dipropylene glycol di (meth) ) Acrylic, tripropylene glycol di (meth) acrylate, ethoxylated neopentyl glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, poly (ethylene-propylene) glycol di (meth) acrylate, polytetramethylene glycol di () Meta) acrylate, ethoxylated bisphenol A di (meth) acrylate, propoxylated bisphenol A di (meth) acrylate, propoxylated ethoxylated bisphenol A di (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate , Tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, butylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexane glycol di (Meta) acrylate, Trimethylol Propanetri (meth) acrylate, Glycerindi (meth) acrylate, Pentaerythritol triacrylate, Pentaerythritol tetraacrylate, Dipentaerythritol pentaacrylate, Dipentaerythritol hexaacrylate, Pentaerythritol di (meth) acrylate , Pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2,2-bis (4- (meth) acryloxidiethoxy) Feni Le) Propane, 2,2-bis (4- (meth) acryloxypolyethoxyphenyl) propane, 2-hydroxy-3- (meth) acryloyloxypropyl (meth) acrylate, ethylene glycol diglycidyl ether di (meth) acrylate , Diethylene glycol diglycidyl ether di (meth) acrylate, diglycidyl phthalate di (meth) acrylate, glycerin triacrylate, glycerin polyglycidyl ether poly (meth) acrylate, urethane (meth) acrylate (ie, tolylene diisocyanate, trimethylhexa) Methylenediisocyanate or hexamethylenediisocyanate and other reaction product of 2-hydroxyethyl (meth) acrylate), methylenebis (meth) acrylamide, (meth) acrylamide Methylene ether, polyhydric alcohol and N-methylol (meth) acrylamide condensation Things, triacrylic formal, 2,4,6-trioxohexahydro-1,3,5-triazine-1,3,5-trisethanol triacrylate, and 2,4,6-trioxohexahydro-1, Examples thereof include 3,5-triazine-1,3,5-trisethanoldiacrylate. These polyfunctional monomers can be used alone or in combination of two or more.

Among these compounds having an ethylenically unsaturated double bond, a bifunctional or higher functional monomer is preferable from the viewpoint of obtaining a photosensitive composition that provides a black light-shielding film having excellent strength and adhesion to a substrate. .. Among these, a polyfunctional monomer having trifunctionality or higher is particularly preferable. For example, pentaerythritol tetra (meth) acrylate (tetrafunctional monomer), dipentaerythritol penta (meth) acrylate (pentafunctional monomer), and dipentaerythritol hexa (meth) acrylate (hexafunctional monomer) are preferably used.
From the viewpoint of controlling the glass transition point (Tg), a monofunctional monomer or a bifunctional monomer may be used in combination with a polyfunctional monomer having trifunctionality or higher, and among these, 1,6-hexanediol di (meth) may be used. Acrylate is preferred.

The content of the photopolymerizable monomer (B) in the photosensitive composition is preferably 1% by mass or more and 50% by mass or less, and 5% by mass or more and 40% by mass or less, based on the total mass of the solid content of the photosensitive composition. Is more preferable. Within the above range, it tends to be easy to balance sensitivity, developability, and resolution.

<Photopolymerization initiator (C)>
The photopolymerization initiator (C) is not particularly limited, and conventionally known photopolymerization initiators can be used.

Specifically, as the photopolymerization initiator (C), 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2-hydroxyethoxy) phenyl] -2-Hydroxy-2-methyl-1-propane-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- (4-dodecylphenyl) -2- Hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4- (methylthio) Phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane-1-one, O-acetyl-1- [6- (2- (2-) Methylbenzoyl) -9-ethyl-9H-carbazole-3-yl] etanone oxime, (9-ethyl-6-nitro-9H-carbazole-3-yl) [4- (2-methoxy-1-methylethoxy) -2-Methylphenyl] Metanon O-acetyloxime, 2- (benzoyloxyimino) -1- [4- (phenylthio) phenyl] -1-octanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 4-benzoyl -4'-Methyldimethylsulfide, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino-2-ethylhexyl benzoic acid, 4-Dimethylamino-2-isoamyl benzoic acid, benzyl-β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propandion-2- (O-ethoxycarbonyl) oxime, methyl o-benzoyl benzoate , 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene , 2-Isopropylthioxanthene, 2-ethylanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylanthraquinone, azobisisobutyronitrile, benzoylperoxide, cumenehydroperoxide, 2-mercaptobenzoimi Dazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) -imidazolyl dimer, benzophenone, 2-chlorobenzophenone, p, p' -Bisdimethylaminobenzophenone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, Benzoin-n-butyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, p. -Dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, α, α-dichloro-4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosverone, pentyl- 4-Dimethylaminobenzoate, 9-phenylaclydin, 1,7-bis- (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) pentane, 1,3-bis- (9-acridinyl) propane, p-methoxytriazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-) 2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (fran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4, 6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis ( Trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) Lu) -s-triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-bromo-4) -Methoxy) Phenyl-s-Triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) styrylphenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-) Bromo-4-methoxy) styrylphenyl-s-triazine and the like can be mentioned. These photopolymerization initiators can be used alone or in combination of two or more.

Among these, it is particularly preferable to use an oxime-based photopolymerization initiator in terms of sensitivity. Among the oxime-based photopolymerization initiators, particularly preferable ones are O-acetyl-1- [6- (2-methylbenzoyl) -9-ethyl-9H-carbazole-3-yl] etanone oxime and etanone. , 1- [9-ethyl-6- (pyrrole-2-ylcarbonyl) -9H-carbazol-3-yl], 1- (O-acetyloxime), and 2- (benzoyloxyimino) -1- [4 -(Phenylthio) phenyl] -1-octanone can be mentioned.

（式（ｃ１）中、Ｒ^１は、１価の有機基であり、Ｒ^２は、置換基を有してもよい炭化水素基、又は置換基を有してもよいヘテロシクリル基であり、Ｒ^３は、１価の有機基であり、Ｒ^４は、１価の有機基であり、Ｒ^５、及びＲ^６はそれぞれ独立に、置換基を有してもよいベンゼン環、又は置換基を有してもよいナフタレン環であり、ｍ１、ｍ２、及びｍ３はそれぞれ０又は１である。）
で表され、下記（１）〜（３）：
（１）Ｒ^１が−ＯＲ^７で表される基を含み、Ｒ^７がハロゲノアルキル基である。
（２）ｍ２が１であり、Ｒ^４が−ＯＲ^７で表される基を含み、Ｒ^７がハロゲノアルキル基である。
（３）Ｒ^３が置換基を有してもよい分岐鎖状アルキル基である。
のうちの少なくとも１つの条件を満たす化合物である。 As the photopolymerization initiator, it is also preferable to use an oxime compound represented by the following formula (c1).

(In the formula (c1), R ¹ is a monovalent organic group, R ² is a hydrocarbon group which may have a substituent, or a heterocyclyl group which may have a substituent, and R ³ is a monovalent organic group, R ⁴ is a monovalent organic group, and R ⁵ and R ⁶ each independently have a benzene ring or a substituent which may have a substituent. It is a naphthalene ring which may be used, and m1, m2, and m3 are 0 or 1, respectively.)
It is represented by the following (1) to (3):
(1) R ¹ contains a group represented by −OR ^{7 , and R 7} is a halogenoalkyl group.
(2) m @ 2 is 1, includes the ^{groups R 4} is represented by -OR ^{7, R 7} is halogenoalkyl group.
(3) R ³ is a branched chain alkyl group which may have a substituent.
It is a compound that satisfies at least one of the above conditions.

In the formula (c1), R ⁵ and R ⁶ are a benzene ring which may have a substituent or a naphthalene ring which may have a substituent.
A ring containing a nitrogen atom bonded to R ³ shown in the formula (c1), and a benzene ring, or a naphthalene ring, any carbon of the benzene ring, or a naphthalene ring - fused by sharing carbon bond ..
Therefore, in the formula (c1), the ring containing the nitrogen atom bonded to ^{R 3} is composed of a nitrogen atom, two carbon atoms derived from ^{R 5} , and two carbon atoms derived from ^{R 6.} It is a 5-membered ring as an atom.
That is, the compound represented by the formula (c1) has a ^{tricyclic to 5-cyclic fused ring composed of R 5} and R ⁶ and the above-mentioned 5-membered ring as a central skeleton.

When R ⁵ and / or R ⁶ is a naphthalene ring, the form of condensation between the above-mentioned 5-membered ring containing a nitrogen atom bonded to ^{R 3 and the naphthalene ring is not particularly limited.}
When ^{at least one of R 5} and R ⁶ is a naphthalene ring, the ^{condensed ring composed of R 5} and R ⁶ and the above-mentioned 5-membered ring containing a nitrogen atom bonded to ^{R 3 is any of the following.} You may.

When ^{the benzene ring or naphthalene ring as R 5} and R ⁶ has a substituent, the type and number of the substituent are not particularly limited as long as the object of the present invention is not impaired.
Preferable examples of the substituent are an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a saturated aliphatic acyl group having 2 to 7 carbon atoms, and 2 or more carbon atoms. It has an alkoxycarbonyl group of 7 or less, a saturated aliphatic acyloxy group having 2 or more and 7 or less carbon atoms, a monoalkylamino group having an alkyl group of 1 or more and 6 or less carbon atoms, and an alkyl group having 1 or more and 6 or less carbon atoms. Examples thereof include a dialkylamino group, a morpholin-1-yl group, a piperazin-1-yl group, a halogen atom, a cyano group and the like.
When ^{the benzene ring or naphthalene ring as R 5} and R ⁶ has a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, and is preferably 1 or more and 4 or less. When there are a plurality of substituents, the plurality of substituents may be the same or different.

When R ⁵ has a substituent, the substituent contained in R ⁵ may ^{be bonded to R 1} or R ³ to form a ring.
Also, if R ⁶ has a substituent, the substituents R ⁶ has, or may be R ³ are bonded to form a ring.

The ring formed by bonding the substituent of ^{R 5 and R 1} may be a hydrocarbon ring or a heterocycle. The hetero atom contained in the heterocycle is not particularly limited. Preferred heteroatoms include N, O, S and the like.
The ring formed by bonding ^{R 3} with the substituents of ^{R 5} and / or R ⁶ may contain other heteroatoms in addition to the nitrogen atom bonded to ^{R 3.} The hetero atom contained in the heterocycle is not particularly limited. Preferred heteroatoms include N, O, S and the like.

（式（ｃ１−１−ａ）〜（ｃ１−１−ｈ）において、Ｒ^１、Ｒ^２、Ｒ^４、ｍ１、ｍ２、及びｍ３は式（ｃ１）と同様であり、Ｒ^８は、アルキル基である。）
で表される化合物が好ましい。 When the ^{substituent of R 5} or the substituent of R ⁶ and R ³ are bonded to form a ring, the compound represented by the formula (c1) is represented by the following formula (c1-1-a). ~ (C1-1-h):

(In formulas (c1-1-a) to (c1-1-h), R ¹ , R ² , R ⁴ , m1, m2, and m3 are the same as in formula (c1), and R ⁸ is an alkyl group. Is.)
The compound represented by is preferable.

The alkyl group as R ⁸ may be linear or branched. The ^{number of carbon atoms of the alkyl group as R 7} is not particularly limited, and is preferably 1 or more and 20 or less, and more preferably 1 or more and 10 or less.

（式（ｃ１−１−ｉ）〜（ｃ１−１−ｌ）において、Ｒ^２、Ｒ^３、Ｒ^４、ｍ２、及びｍ３は式（ｃ１）と同様であり、Ｒ^８は、炭素原子数１以上２０以下のアルキル基である。）
で表される化合物が好ましい。Ｒ^８としてのアルキル基は、直鎖状であっても、分岐鎖状であってもよい。 When the substituent of ^{R 5 and R 1} are bonded to form a ring, m1 is preferably 0 in the formula (c1). In this case, the compound represented by the formula (c1) is represented by the following formulas (c1-1-i) to (c1-1-l):

(In formulas (c1-1-i) to (c1-1-l), R ² , R ³ , R ⁴ , m2, and m3 are the same as in formula (c1), and R ⁸ has 1 carbon atom. It is an alkyl group of 20 or more.)
The compound represented by is preferable. The alkyl group as R ⁸ may be linear or branched.

（式（ｃ１−Ｉ）〜（ｃ１−ＩＶ）において、Ｒ^１、Ｒ^２、Ｒ^３、Ｒ^４、ｍ１、ｍ２、及びｍ３は式（ｃ１）と同様である。）
で表される化合物が好ましく、式（ｃ１−ＩＩ）、又は式（ｃ１−ＩＩＩ）で表される化合物がより好ましく、式（ｃ１−ＩＩＩ）で表される化合物が特に好ましい。 More preferred combination of ^{R 5} and ^{R 6} as described in consideration, as the compound represented by the formula (c1), the following equation (c1-I) ~ (c1 -IV):

(In the formula (c1-I) ~ (c1 -IV), R 1, R 2, R 3, R 4, m1, m2, and m3 are the same as the formula (c1).)
The compound represented by the formula (c1-II) or the compound represented by the formula (c1-III) is more preferable, and the compound represented by the formula (c1-III) is particularly preferable.

As the compounds represented by the above formulas (c1-I) to (c1-IV), the compounds represented by the following formulas (c1-I-a) to (c1-IV-a) are preferable, and the compounds represented by the following formulas (c1-IV-a) are preferable. The compound represented by II-a) or the formula (c1-III-a) is more preferable, and the compound represented by the formula (c1-III-a) is particularly preferable.

As the compounds represented by the above formulas (c1-I-a) to (c1-IV-a), the compounds represented by the following formulas (c1-I-b) to (c1-IV-b) are preferable. The compound represented by the formula (c1-II-b) or the formula (c1-III-b) is more preferable, and the compound represented by the formula (c1-III-b) is particularly preferable.

Examples of a monovalent organic group suitable as R ¹ include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, and a substituent. A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a benzoyloxy which may have a substituent. A group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, and a substituent. It has a naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent. Examples thereof include a heterocyclylcarbonyl group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like.

When R ¹ is an alkyl group, the number of carbon atoms of the alkyl group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ¹ is an alkyl group, it may be a straight chain or a branched chain. Specific examples of the case where R ¹ is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group. , Isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, Examples thereof include an n-decyl group and an isodecyl group. When R ¹ is an alkyl group, the alkyl group may contain an ether bond (−O−) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.

When R ¹ is an alkoxy group, the number of carbon atoms of the alkoxy group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ¹ is an alkoxy group, it may be a straight chain or a branched chain. Specific examples of the case where R ¹ is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group and n. -Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Trt-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ¹ is an alkoxy group, the alkoxy group may contain an ether bond (−O−) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, a methoxypropyloxy group and the like.

When R ¹ is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms of the cycloalkyl group or cycloalkoxy group is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less. Specific examples of the case where R ¹ is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like. Specific examples of the case where R ¹ is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, a cyclooctyloxy group and the like.

When R ¹ is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms of the saturated aliphatic acyl group or the saturated aliphatic acyloxy group is preferably 2 or more and 21 or less, and more preferably 2 or more and 7 or less. Specific examples of the case where R ¹ is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group and n. -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca Examples thereof include a noyl group and an n-hexadecanoyl group. Specific examples of the case where R ¹ is a saturated aliphatic acyloxy group include an acetyloxy group, a propanoyloxy group, an n-butanoyloxy group, a 2-methylpropanoyloxy group, an n-pentanoyloxy group, 2, 2-Dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group and the like can be mentioned.

When R ¹ is an alkoxycarbonyl group, the number of carbon atoms of the alkoxycarbonyl group is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. Specific examples of the case where R ¹ is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl. Oxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group Group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, isononyloxycarbonyl group, n-decyloxycarbonyl group, and Examples thereof include an isodecyloxycarbonyl group.

When R ¹ is a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less. When R ¹ is a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less. Specific examples of the case where R ¹ is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples of the case where R ¹ is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2- (α-naphthyl) ethyl group, and 2- (β-naphthyl) ethyl group. .. R ¹ is a phenyl group, or when it is naphthyl alkyl group, R ¹ may have a substituent on the phenyl group, or naphthyl group.

When R ¹ is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed. Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocycle constituting the heterocyclyl group include furan, thiophene, pyrrole, oxazole, isooxazole, thiazole, thiazazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol. Examples thereof include isoindole, indridin, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxalin. When R ¹ is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When R ¹ is a heterocyclyl carbonyl group, the heterocyclyl group contained in the heterocyclyl carbonyl group is the same as when R ¹ is a heterocyclyl group.

When R ¹ is an amino group substituted with 1 or 2 organic groups, suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and the like. Saturated aliphatic acyl group having 2 or more and 21 or less carbon atoms, phenyl group which may have a substituent, benzoyl group which may have a substituent, and 7 or more and 20 carbon atoms which may have a substituent. The following phenylalkyl groups, naphthyl groups which may have substituents, naphthoyl groups which may have substituents, naphthylalkyl groups which may have substituents and have 11 to 20 carbon atoms, and heterocyclyl. The group etc. can be mentioned. Specific examples of these preferred organic groups are similar to those for R ^1. Specific examples of the amino group substituted with the organic group 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, an isopropylamino group, and an n-. Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naftylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- Examples thereof include a decanoylamino group, a benzoylamino group, an α-naphthoylamino group, and a β-naphthoylamino group.

When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R 1} further have a substituent, the substituents include an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms. Saturated aliphatic acyl group with 2 to 7 carbon atoms, alkoxycarbonyl group with 2 to 7 carbon atoms, saturated aliphatic acyloxy group with 2 to 7 carbon atoms, alkyl group with 1 to 6 carbon atoms Examples thereof include a monoalkylamino group having, a dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like. When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R 1} further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, and is preferably 1 or more and 4 or less. When ^{the phenyl group, the naphthyl group, and the heterocyclyl group contained in R 1} have a plurality of substituents, the plurality of substituents may be the same or different.

Further, as R ¹ , a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylthioalkyl group which may have a substituent on the aromatic ring are also preferable. The substituents that the phenoxyalkyl group and the phenylthioalkyl group may have are the same as the substituents that the phenyl group contained ^{in R 1 may have.}

Among the monovalent organic groups, R ¹ may have an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, or a substituent on the aromatic ring. A good phenylthioalkyl group is preferred. As the alkyl group, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, an alkyl group having 1 to 4 carbon atoms is particularly preferable, and a methyl group is the most preferable. preferable. Among the phenyl groups that may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the cycloalkylalkyl groups, a cyclopentylethyl group is preferable. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the phenylthioalkyl groups that may have a substituent on the aromatic ring, a 2- (4-chlorophenylthio) ethyl group is preferable.

As described above, the compounds represented by the formula (c1) are described in the following (1) to (3):
(1) R ¹ contains a group represented by −OR ^{7 , and R 7} is a halogenoalkyl group.
(2) m @ 2 is 1, includes the ^{groups R 4} is represented by -OR ^{7, R 7} is halogenoalkyl group.
(3) R ³ is a branched chain alkyl group which may have a substituent.
At least one of these conditions must be met.
Therefore, R ¹ is preferably substituted with a substituent represented by ^{−OR 7.} R ⁷ is a halogenoalkyl group. R ¹ is, when substituted with a group represented by -OR ^7, contained in R1, the number of the group represented by -OR ⁷ is not particularly limited. R ¹ is, when substituted with a group represented by -OR ^7, contained in ^{R 1,} the number of the group represented by -OR ⁷ is preferably 1 or 2, and more preferably 1.
^{Further, the number of groups represented by −OR 7} contained in the compound represented by the formula (c1) is preferably 1 or 2, and more preferably 1.

Examples of the halogen atom contained in the halogenoalkyl group include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. The halogenoalkyl group may contain one kind of halogen atom or may contain two or more kinds of halogen atoms in combination.
The number of halogen atoms contained in the halogenoalkyl group is not particularly limited as long as the object of the present invention is not impaired. The number of halogen atoms contained in the halogenoalkyl group is preferably 1 or more, more preferably 2 or more, and particularly preferably 3 or more. The upper limit of the number of halogen atoms contained in the halogenoalkyl group is preferably 7 or less, preferably 6 or less, in that the compound represented by the formula (c1) has good compatibility with other components in the photosensitive composition. The following is more preferable, and 5 or less is particularly preferable.
Further, the number of halogen atoms contained in the compound represented by the formula (c1) is also preferably 1 or more, more preferably 2 or more, particularly preferably 3 or more, preferably 7 or less, more preferably 6 or less, and 5 or less. Is particularly preferable.

The number of carbon atoms of the halogenoalkyl group is not particularly limited as long as the object of the present invention is not impaired. The number of carbon atoms of the halogenoalkyl group is preferably 1 or more, more preferably 2 or more, and particularly preferably 3 or more. The upper limit of the number of carbon atoms of the halogenoalkyl group is preferably 10 or less, more preferably 7 or less, and particularly preferably 5 or less.
As the halogenoalkyl group, a fluorinated alkyl group is particularly preferable. Preferred specific examples of the halogenoalkyl group are 2,2,3,3-tetrafluoropropyl group, 2,2,2-trifluoroethyl group, 3,3,3-trifluoropropyl group, 2,2,3. , 3,3-Pentafluoropropyl group, 2,2,3,3,4,5,5-octafluoropentyl group and the like. Among these, 2,2,3,3-tetrafluoropropyl group is preferable because the compound represented by the formula (c1) can be easily produced.

（式（ｃ１−０１）中、Ｒ^７は前述の通りであり、Ｒ^９は、Ｒ^１としてのフェニル基が有してもよい置換基であり、ｍ４は１又は２であり、ｍ４＋ｍ５は１以上５以下の整数である。）
で表される基が好ましい。
Ｒ^９としては、炭素原子数１以上６以下のアルキル基、及び炭素原子数１以上６以下のアルコキシ基が好ましく、炭素原子数１以上６以下のアルキル基がより好ましく、メチル基、及びエチル基がさらに好ましく、メチル基が特に好ましい。
ｍ５は１であるのが好ましい。 The halogenoalkyl been substituted with groups as R ^1, 1 or 2 phenyl group substituted by halogenoalkyl group. Specifically, it has been substituted with halogeno-alkyl group as R ¹ the following formula (C1-01):

(In the formula (c1-01), R ⁷ is as described above, R ⁹ is a ^{substituent that the phenyl group as R 1} may have, m 4 is 1 or 2, and m4 + m 5 is 1. It is an integer of 5 or more.)
The group represented by is preferable.
As R ⁹ , an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms are preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and a methyl group and an ethyl group are preferable. Is more preferable, and a methyl group is particularly preferable.
m5 is preferably 1.

（式（ｃ１−０２）中、Ｒ^１、Ｒ^２、Ｒ^３、Ｒ^４、Ｒ^５、Ｒ^６、ｍ１、ｍ２、及びｍ３は式（ｃ１）と同様であり、Ｒ^１０は、２価の有機基である。）
で表される基であってもよい。 Further, R ¹ is expressed by the following equation (c1-02):

(In formula (c1-02), R ¹ , R ² , R ³ , R ⁴ , R ⁵ , R ⁶ , m1, m2, and m3 are the same as in formula (c1), and R ¹⁰ is divalent. It is an organic group.)
It may be a group represented by.

The ^{divalent organic group as R 10} is not particularly limited as long as it does not impair the object of the present invention. A suitable example of the divalent organic group as R ¹⁰ is an alcandiyl group having 1 or more and 10 or less carbon atoms (for example, methylene group, ethane-1,2-diyl group, propane-1,3-diyl group). , Butane-1,4-diyl group, etc.), and arylene group (p-phenylene group, m-phenylene group, o-phenylene group, 1,1'-biphenyl-4,4'diyl group, etc.).

Specific examples of the compound represented by the formula (c1) when R ¹ is a group represented by the above formula (c1-02) include a compound of the following formula.

^{Among R 1} described above, the group represented by the following formula is preferable.

In formula (c1), R ² is a hydrocarbon group which may have a substituent or a heterocyclyl group which may have a substituent. As the hydrocarbon group which may have a substituent, an alkyl group which may have a substituent and has 1 or more and 11 or less carbon atoms, or an aryl group which may have a substituent is preferable. As the aryl group, a phenyl group and a naphthyl group are preferable, and a phenyl group is preferable. As the ^{substituent which may be possessed when R 2} is an alkyl group, a phenyl group, a naphthyl group and the like are preferably exemplified. Further, ^{as the substituent which may be possessed when R 2} is an aryl group, an alkyl group having 1 or more and 5 or less carbon atoms, an alkoxy group, a halogen atom and the like are preferably exemplified.

When R ² is a heterocyclyl group, the heterocyclyl group may be an aliphatic heterocyclic group or an aromatic heterocyclic group. When R ² is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed. Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. Examples of the heterocycle constituting such a heterocyclyl group include furan, thiophene, pyrrole, oxazole, isooxazole, thiazole, thiaxazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol. Isoindole, indridin, benzimidazole, benzotriazol, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxalin, piperazine, piperazine, morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. Be done.
When R ² is a heterocyclyl group, examples of the substituent that the heterocyclyl group may have include a hydroxyl group, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, a cyano group, a nitro group and the like.

The R ^2, a methyl group, a phenyl group, and a thienyl group, and more preferably methyl group.

In formula (c1), R ³ is a monovalent organic group. R ³ can be selected from various organic groups as long as it does not interfere with the object of the present invention. Preferable examples of R ³ include an alkyl group which may have a substituent having 1 or more and 20 or less carbon atoms, a cycloalkyl group which may have a substituent having 3 or more and 20 or less carbon atoms, and a carbon atom. A saturated aliphatic acyl group which may have a substituent of 2 or more and 20 or less, an alkoxycarbonyl group which may have a substituent of 2 or more and 20 or less of carbon atoms, and a phenyl group which may have a substituent. , A benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a phenylalkyl group which may have a substituent and has 7 to 20 carbon atoms, and a substituent. May have a naphthyl group, a naphthyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, a naphthylalkyl group which may have a substituent and has 11 to 20 carbon atoms, and a substituent. Examples thereof include a heterocyclyl group which may have a group and a heterocyclylcarbonyl group which may have a substituent.

Among the R ^3, preferably an alkyl group having 1 to 20 carbon atoms. The alkyl group may be linear or branched. Solubility in the photosensitive composition from the viewpoint of good of the compound represented by formula (c1), the number of carbon atoms in the alkyl group as R ³ is 2 or more, more preferably 5 or more, 7 The above is particularly preferable. Further, in the photosensitive composition, and a compound represented by the formula (c1), from the viewpoint compatibility with other components is good, the number of carbon atoms in the alkyl group as R ³ is 15 or less Is preferable, and 10 or less is more preferable.

When R ³ has a substituent, suitable examples of the substituent include a hydroxyl group, an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and 2 to 20 carbon atoms. The aliphatic acyl group, an aliphatic acyloxy group having 2 or more and 20 or less carbon atoms, a phenoxy group, a benzoyl group, a benzoyloxy group, _{and a group represented by −PO (OR) 2} (R is 1 or more and 6 or less carbon atoms). Alkyl group), halogen atom, cyano group, heterocyclyl group and the like. A good example of a heterocyclyl group as a substituent is similar to a good example of a heterocyclyl group as ^{R 2.}

As described above, the compounds represented by the formula (c1) are described in the following (1) to (3):
(1) R ¹ contains a group represented by −OR ^{7 , and R 7} is a halogenoalkyl group.
(2) m @ 2 is 1, includes the ^{groups R 4} is represented by -OR ^{7, R 7} is halogenoalkyl group.
(3) R ³ is a branched chain alkyl group which may have a substituent.
At least one of these conditions must be met.
Therefore, ^{it is preferable that R 3} is a branched chain alkyl group which may have a substituent.

（式（ｃ１−０３）中、Ｒ^１、Ｒ^２、Ｒ^４、Ｒ^５、Ｒ^６、ｍ１、ｍ２、及びｍ３は式（ｃ１）と同様であり、Ｒ^１１は２価の有機基である。） As the ^{R 3,} the following formula (c1-03):

(In formula (c1-03), R ¹ , R ² , R ⁴ , R ⁵ , R ⁶ , m1, m2, and m3 are the same as in formula (c1), and R ¹¹ is a divalent organic group. .)

The ^{divalent organic group as R 11} is not particularly limited as long as it does not interfere with the object of the present invention. A suitable example of the divalent organic group as R ¹¹ is an alcandiyl group having 1 or more and 10 or less carbon atoms (for example, methylene group, ethane-1,2-diyl group, propane-1,3-diyl group). , Butane-1,4-diyl, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1,7-diyl group, octane-1,8-diyl group, etc.), arylene group ( p-phenylene group, m-phenylene group, o-phenylene group, 1,1'-biphenyl-4,4'diyl group, etc.) can be mentioned.

Also, the following group is also preferred as the divalent organic group as R ^11. In the following formula, R ¹² is an alkylene group having 1 to 20 carbon atoms. The alkylene group represented by R ^12, a methylene group, ethane-1,2-diyl group, propane-1,3-diyl, butane-1,4-diyl, pentane-1,5-diyl group, hexane -1 , 6-Diyl group, heptane-1,7-diyl group, and octane-1,8-diyl group are preferred.

Specific examples of the compound represented by the formula (c1) when R ³ is a group represented by the above formula (c1-03) include a compound of the following formula.

Above as a preferred embodiment of ^{R 3} described, a methyl group, an ethyl group, n- propyl group, an isopropyl group, n- butyl group, isobutyl group, sec- butyl group, tert- butyl group, n- pentyl group, Examples thereof include isopentyl group, neopentyl group, pentan-3-yl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, and 2-ethylhexyl group.
As ^{described above, since a branched alkyl group is preferable as R 3} , among the above alkyl groups, an isopropyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an isopentyl group, a neopentyl group, and a pentan-3 -Il group, sec-pentyl group, tert-pentyl group, and 2-ethylhexyl group are preferable.
Further, an n-octyl group and a 2-ethylhexyl group are preferable, and a 2-ethylhexyl group is more preferable, from the viewpoint of good solubility of the compound represented by the formula (c1) in the photosensitive composition.

^{R 4} in the formula (c1) is a monovalent organic group. Examples of the monovalent organic group as ^{R 4} include groups similar to the monovalent ^{organic group as R 1.}

R ^{4 _{is, R 4 - (CO) m3}} - group represented by and bonded to the main skeleton of the compound represented by the formula (c1). R 4 _^- (CO) m3 ^- Specific preferable examples of the group represented by include groups represented by the following formula. In the following formula, m3 is 1 or 0 as in the formula (c1).

The above ^R 4 - _{(CO) m3} - in the preferred examples of the group represented by the 1,3,5-trimethyl benzoyl group is particularly preferred.

As described above, the compounds represented by the formula (c1) are described in the following (1) to (3):
(1) R ¹ contains a group represented by −OR ^{7 , and R 7} is a halogenoalkyl group.
(2) m @ 2 is 1, includes the ^{groups R 4} is represented by -OR ^{7, R 7} is halogenoalkyl group.
(3) R ³ is a branched chain alkyl group which may have a substituent.
At least one of these conditions must be met.
Therefore, R ⁴ is preferably substituted with a substituent represented by ^{−OR 7.} R ⁷ is a halogenoalkyl group. R ⁷ is as described above.

The halogenoalkyl been substituted with groups as R ^4, 1 or 2 phenyl group substituted by halogenoalkyl group. More specifically, as in the halogenoalkyl group group substituted with as R ^1, preferably a group represented by the formula (C1-01) above.

（式（ｃ１−０４）中、Ｒ^１、Ｒ^３、Ｒ^５、Ｒ^６、ｍ１、ｍ２、及びｍ３は、式（ｃ１）と同一であり、Ｒ^１３は、２価の有機基である。）
で表される基も好ましい。 As the ^{R 4,} the following formula (c1-04):

(In formula (c1-04), R ¹ , R ³ , R ⁵ , R ⁶ , m1, m2, and m3 are the same as in formula (c1), and R ¹³ is a divalent organic group. )
The group represented by is also preferable.

The ^{divalent organic group as R 13} is not particularly limited as long as it does not impair the object of the present invention. A suitable example of the divalent organic group as R ¹³ is an alcandiyl group having 1 or more and 10 or less carbon atoms (for example, methylene group, ethane-1,2-diyl group, propane-1,3-diyl group). , Butane-1,4-diyl, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1,7-diyl group, octane-1,8-diyl group, etc.), arylene group ( p-phenylene group, m-phenylene group, o-phenylene group, 1,1'-biphenyl-4,4'diyl group, etc.) can be mentioned.

Also, the following group is also preferred as the divalent organic group as R ^13. In the following formula, R ¹³ is an alkylene group having 1 to 20 carbon atoms which may be substituted with a halogen atom. Examples ^{of the alkylene group as R 14} include a methylene group, an ethane-1,2-diyl group, a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, and a hexane-1. , 6-Diyl group, heptane-1,7-diyl group, and octane-1,8-diyl group are preferred.
Also, all of the hydrogen atoms are halogen atoms in these alkylene groups, in particular been substituted with a fluorine atom is preferred as R ^14.

In formula (c1), m1, m2, and m3 are all 0 or 1. As m1, 0 is preferable. 1 is preferable as m2, and 1 is preferable as m3.

Preferred specific examples of the compound represented by the formula (c1) described above include the following compounds.

As described above, the compounds represented by the formula (c1) are described in the following (1) to (3):
(1) R ¹ contains a group represented by −OR ^{7 , and R 7} is a halogenoalkyl group.
(2) m @ 2 is 1, includes the ^{groups R 4} is represented by -OR ^{7, R 7} is halogenoalkyl group.
(3) R ³ is a branched chain alkyl group which may have a substituent.
At least one of these conditions must be met. If this condition is satisfied, two or more different compounds may be mixed and used as the photopolymerization initiator (C).

（式（ｃ２）中、ＣＲは、下記式（ｃ２ａ）又は下記式（ｃ２ｂ）：

で表される基であり、Ｒ^ｃ１は水素原子、ニトロ基又は１価の有機基であり、Ｒ^ｃ２及びＲ^ｃ３は、それぞれ、置換基を有してもよい鎖状アルキル基、置換基を有してもよい鎖状アルコキシ基、置換基を有してもよい環状有機基、又は水素原子であり、Ｒ^ｃ２とＲ^ｃ３とは相互に結合して環を形成してもよく、Ｒ^ｃ４は１価の有機基であり、Ｒ^ｃ５は、水素原子、置換基を有してもよい炭素原子数１以上２０以下の脂肪族炭化水素基、又は置換基を有してもよいアリール基であり、ｎ１は０以上４以下の整数であり、ｎ２は０又は１である。）
で表される化合物である。
式（ｃ２）で表されるオキシムエステル化合物の合成や入手の容易性や、Ｒ^ｃ２及びＲ^ｃ３の選択により、オキシムエステル化合物の特性を調整しやすい点等から、式（ｃ２）中のＣＲとしては、式（ｃ２ａ）で表される基が好ましい。 As the oxime ester compound, a compound represented by the following formula (c2) is also preferable.

(In the formula (c2), CR is the following formula (c2a) or the following formula (c2b):

R ^c1 is a hydrogen atom, a nitro group or a monovalent organic group, and R ^c2 and R ^c3 are chain alkyl groups and substituents which may have a substituent, respectively. It is a chain alkoxy group that may have, a cyclic organic group that may have a substituent, or a hydrogen atom, and R ^c2 and R ^c3 may be bonded to each other to form a ring, or R ^c4. Is a monovalent organic group, and R ^c5 is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, or an aryl group which may have a substituent. Yes, n1 is an integer greater than or equal to 0 and less than or equal to 4, and n2 is 0 or 1. )
It is a compound represented by.
As the CR in the formula (c2), the characteristics of the oxime ester compound can be easily adjusted by selecting ^{R c2} and R ^c3 , and the ease of synthesizing and obtaining the oxime ester compound represented by the formula (c2). Is preferably a group represented by the formula (c2a).

で示される構造中の＊で示される位置に結合するのが好ましい。Ｒ^ｃ１が複数である場合、複数のＲ^ｃ１は同一であっても異なっていてもよい。 In the group represented by the formula (c2a) or the formula (c2b), which is the CR in the formula (c2), R ^c1 is a hydrogen atom, a nitro group or a monovalent organic group. R ^c1 is on the fused ring in formula (c2a) or formula _{(c2b), - (CO)} n2 - the aromatic ring bonded to the group represented by is coupled to a different 6-membered aromatic ring. In the formula (c2a) or the formula (c2b), ^{the binding position of R c1} is not particularly limited. When the compound represented by formula (c2) has one or more R ^c1, since such that the synthesis of compounds of formula (c2) is easy, one of the one or more R ^c1, following Formula (c2a-1) and formula (c2b-1):

It is preferable to connect to the position indicated by * in the structure indicated by. If R ^c1 is more, the plurality of R ^c1 may be the same or different.

When R ^c1 is an organic group, R ^c1 is not particularly limited as long as it does not interfere with the object of the present invention, and is appropriately selected from various organic groups. Preferable examples of the case where R ^c1 is an organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, a saturated aliphatic acyloxy group, an alkoxycarbonyl group and a substituent. A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a benzoyloxy which may have a substituent. A group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, and a substituent. It has a naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent. Examples thereof include a heterocyclylcarbonyl group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like.

When R ^c1 is an alkyl group, the number of carbon atoms of the alkyl group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ^c1 is an alkyl group, it may be a straight chain or a branched chain. Specific examples of the case where R ^c1 is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group. , Isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, Examples thereof include an n-decyl group and an isodecyl group. When R ^c1 is an alkyl group, the alkyl group may contain an ether bond (−O−) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.

When R ^c1 is an alkoxy group, the number of carbon atoms of the alkoxy group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ^c1 is an alkoxy group, it may be a straight chain or a branched chain. Specific examples of the case where R ^c1 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group and n. -Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Trt-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ^c1 is an alkoxy group, the alkoxy group may contain an ether bond (−O−) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, a methoxypropyloxy group and the like.

When R ^c1 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms of the cycloalkyl group or cycloalkoxy group is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less. Specific examples of the case where R ^c1 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like. Specific examples of the case where R ^c1 is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, a cyclooctyloxy group and the like.

When R ^c1 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms of the saturated aliphatic acyl group or the saturated aliphatic acyloxy group is preferably 2 or more and 21 or less, and more preferably 2 or more and 7 or less. Specific examples of the case where R ^c1 is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group and n. -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca Examples thereof include a noyl group and an n-hexadecanoyl group. Specific examples of the case where R ^c1 is a saturated aliphatic acyloxy group include an acetyloxy group, a propanoyloxy group, an n-butanoyloxy group, a 2-methylpropanoyloxy group, an n-pentanoyloxy group, 2, 2-Dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group and the like can be mentioned.

When R ^c1 is an alkoxycarbonyl group, the number of carbon atoms of the alkoxycarbonyl group is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. Specific examples of the case where R ^c1 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl. Oxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group Group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, isononyloxycarbonyl group, n-decyloxycarbonyl group, and Examples thereof include an isodecyloxycarbonyl group.

When R ^c1 is a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less. When R ^c1 is a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less. Specific examples of the case where R ^c1 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples of the case where R ^c1 is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2- (α-naphthyl) ethyl group, and 2- (β-naphthyl) ethyl group. .. When R ^c1 is a phenylalkyl group or a naphthylalkyl group, ^Rc1 may further have a substituent on the phenyl group or the naphthyl group.

When R ^c1 is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed. Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocycle constituting such a heterocyclyl group include furan, thiophene, pyrrole, oxazole, isooxazole, thiazole, thiaxazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol. Isoindole, indridin, benzimidazole, benzotriazol, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxalin, piperazine, piperazine, morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. Be done. When R ^c1 is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When R ^c1 is a heterocyclylcarbonyl group, the heterocyclyl group contained in the heterocyclylcarbonyl group is the same as when ^Rc1 is a heterocyclyl group.

When R ^c1 is an amino group substituted with 1 or 2 organic groups, suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and the like. Saturated aliphatic acyl group having 2 or more and 21 or less carbon atoms, phenyl group which may have a substituent, benzoyl group which may have a substituent, and 7 or more and 20 carbon atoms which may have a substituent. The following phenylalkyl groups, naphthyl groups which may have substituents, naphthoyl groups which may have substituents, naphthylalkyl groups which may have substituents and have 11 to 20 carbon atoms, and heterocyclyl. The group etc. can be mentioned. Specific examples of these suitable organic groups are the same as for R ^c1 . Specific examples of the amino group substituted with the organic group 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, an isopropylamino group, and an n-. Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naftylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- Examples thereof include a decanoylamino group, a benzoylamino group, an α-naphthoylamino group, and a β-naphthoylamino group.

When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c1} further have a substituent, the substituents include an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms. Saturated aliphatic acyl group with 2 to 7 carbon atoms, alkoxycarbonyl group with 2 to 7 carbon atoms, saturated aliphatic acyloxy group with 2 to 7 carbon atoms, alkyl group with 1 to 6 carbon atoms Examples thereof include a monoalkylamino group having, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, and a cyano group. When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c1} further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, but is preferably 1 or more and 4 or less. When ^{the phenyl group, the naphthyl group, and the heterocyclyl group contained in R c1} have a plurality of substituents, the plurality of substituents may be the same or different.

Among the groups described above, as R ^c1 , a nitro group or ^{a group represented by R c6-} CO− tends to improve the sensitivity and is preferable. R ^c6 is not particularly limited as long as it does not interfere with the object of the present invention, and can be selected from various organic groups. Examples of a suitable group as R ^c6 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent. Heterocyclyl groups may be mentioned. Among these groups, 2-methylphenyl group, thiophen-2-yl group, and α-naphthyl group are particularly preferable as R ^c6.

In the formula (c2a), R ^c2 and R ^c3 have a chain alkyl group which may have a substituent, a chain alkoxy group which may have a substituent, and a cyclic group which may have a substituent, respectively. It is an organic group or a hydrogen atom. R ^c2 and R ^c3 may be coupled to each other to form a ring. Among these groups, as R ^c2 and R ^c3 , a chain alkyl group which may have a substituent is preferable. When R ^c2 and R ^c3 are chain alkyl groups which may have a substituent, the chain alkyl group may be a linear alkyl group or a branched chain alkyl group.

When R ^c2 and R ^c3 are chain alkyl groups having no substituent, the number of carbon atoms of the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. preferable. Specific examples of cases where R ^c2 and R ^c3 are chain alkyl groups include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. , N-Pentyl group, Isopentyl group, sec-Pentyl group, tert-Pentyl group, n-Hexyl group, n-Heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl Examples thereof include a group, an isononyl group, an n-decyl group, and an isodecyl group. When R ^c2 and R ^c3 are alkyl groups, the alkyl group may contain an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.

When R ^c2 and R ^c3 are chain alkyl groups having a substituent, the number of carbon atoms of the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. .. In this case, the number of carbon atoms of the substituent is not included in the number of carbon atoms of the chain alkyl group. The chain alkyl group having a substituent is preferably linear.
The substituent that the alkyl group may have is not particularly limited as long as it does not impair the object of the present invention. Preferable examples of the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Among these, a fluorine atom, a chlorine atom and a bromine atom are preferable. Examples of the cyclic organic group include a cycloalkyl group, an aromatic hydrocarbon group, and a heterocyclyl group. Specific examples of the cycloalkyl group are the same as in the preferred example when ^{R c1 is a cycloalkyl group.} Specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, a phenanthryl group and the like. Specific examples of the heterocyclyl group are the same as in the preferred example when ^{R c1 is a heterocyclyl group.} When R ^c1 is an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, preferably linear. The number of carbon atoms of the alkoxy group contained in the alkoxycarbonyl group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.

When the chain alkyl group has a substituent, the number of the substituent is not particularly limited. The number of preferred substituents depends on the number of carbon atoms in the chain alkyl group. The number of substituents is typically 1 or more and 20 or less, preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.

When R ^c2 and R ^c3 are chain alkoxy groups having no substituent, the number of carbon atoms of the chain alkoxy group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. preferable. Specific examples of cases where R ^c2 and R ^c3 are chain alkoxy groups include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, and a tert. -Butyloxy group, n-pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, Examples thereof include sec-octyloxy group, tert-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ^c2 and R ^c3 are alkoxy groups, the alkoxy group may contain an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, a methoxypropyloxy group and the like.
When R ^c2 and R ^c3 are chain alkoxy groups having a substituent, the substituents that the alkoxy group may have are the same as when R ^c2 and R ^c3 are chain alkyl groups.

When R ^c2 and R ^c3 are cyclic organic groups, the cyclic organic group may be an alicyclic group or an aromatic group. Examples of the cyclic organic group include an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclyl group. When R ^c2 and R ^c3 are cyclic organic groups, the substituents that the cyclic organic group may have are the same as when R ^c2 and R ^c3 are chain alkyl groups.

When R ^c2 and R ^c3 are aromatic hydrocarbon groups, is the aromatic hydrocarbon group a phenyl group or a group formed by bonding a plurality of benzene rings via a carbon-carbon bond? , It is preferable that the group is formed by condensing a plurality of benzene rings. When the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensing a plurality of benzene rings, the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited. 3 or less is preferable, 2 or less is more preferable, and 1 is particularly preferable. Preferred specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, a phenanthryl group and the like.

When R ^c2 and R ^c3 are aliphatic cyclic hydrocarbon groups, the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic. The number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, but is preferably 3 or more and 20 or less, and more preferably 3 or more and 10 or less. Examples of monocyclic cyclic hydrocarbon groups include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, Examples thereof include a tetracyclododecyl group and an adamantyl group.

When R ^c2 and R ^c3 are heterocyclyl groups, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, such monocyclic rings, or between such monocyclic rings and a benzene ring. Is a heterocyclyl group condensed with. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocycle constituting such a heterocyclyl group include furan, thiophene, pyrrole, oxazole, isooxazole, thiazole, thiaxazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol. Isoindole, indridin, benzimidazole, benzotriazol, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxalin, piperazine, piperazine, morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. Be done.

R ^c2 and R ^c3 may be coupled to each other to form a ring. The group composed of the ring formed by ^{R c2} and R ^{c3 is preferably a cycloalkylidene group.} When R ^c2 and R ^c3 are combined to form a cycloalkylidene group, the ring constituting the cycloalkylidene group is preferably a 5-membered ring to a 6-membered ring, and more preferably a 5-membered ring.

When ^{the group formed by bonding R c2} and R ^c3 is a cycloalkylidene group, the cycloalkylidene group may be condensed with one or more other rings. Examples of rings that may be fused with a cycloalkylene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a furan ring, a thiophene ring, a pyrrole ring, and a pyridine. Rings, pyrazine rings, pyrimidine rings and the like can be mentioned.

Examples of suitable groups among ^{R c2} and R ^c3 described above include groups represented by the ^{formula −A 1} −A ^2. In the formula, A ¹ is a linear alkylene group, and A ² is an alkoxy group, a cyano group, a halogen atom, an alkyl halide group, a cyclic organic group, or an alkoxycarbonyl group.

The ^{number of carbon atoms of the linear alkylene group of A 1} is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less. When A ² is an alkoxy group, the alkoxy group may be linear or branched, preferably linear. The number of carbon atoms of the alkoxy group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less. When A ² is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom, a chlorine atom and a bromine atom are more preferable. When A ² is an alkyl halide group, the halogen atom contained in the alkyl halide group is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and more preferably a fluorine atom, a chlorine atom or a bromine atom. The alkyl halide group may be linear or branched, preferably linear. When A ² is a cyclic organic group, examples of the cyclic organic group are the same as those of the cyclic organic group that ^{R c2} and R ^{c3 have as substituents.} When A ² is an alkoxycarbonyl group, examples of the alkoxycarbonyl group are similar to those of the alkoxycarbonyl group that ^{R c2} and R ^{c3 have as substituents.}

Preferable specific examples of R ^c2 and R ^c3 are alkyl groups such as ethyl group, n-propyl group, n-butyl group, n-hexyl group, n-heptyl group, and n-octyl group; 2-methoxyethyl. Group, 3-methoxy-n-propyl group, 4-methoxy-n-butyl group, 5-methoxy-n-pentyl group, 6-methoxy-n-hexyl group, 7-methoxy-n-heptyl group, 8-methoxy -N-octyl group, 2-ethoxyethyl group, 3-ethoxy-n-propyl group, 4-ethoxy-n-butyl group, 5-ethoxy-n-pentyl group, 6-ethoxy-n-hexyl group, 7- Alkyl alkyl groups such as ethoxy-n-heptyl group and 8-ethoxy-n-octyl group; 2-cyanoethyl group, 3-cyano-n-propyl group, 4-cyano-n-butyl group, 5-cyano-n Cyanalkyl groups such as −pentyl group, 6-cyano-n-hexyl group, 7-cyano-n-heptyl group, and 8-cyano-n-octyl group; 2-phenylethyl group, 3-phenyl-n-propyl Phenyl such as group, 4-phenyl-n-butyl group, 5-phenyl-n-pentyl group, 6-phenyl-n-hexyl group, 7-phenyl-n-heptyl group, and 8-phenyl-n-octyl group. Alkyl group; 2-cyclohexylethyl group, 3-cyclohexyl-n-propyl group, 4-cyclohexyl-n-butyl group, 5-cyclohexyl-n-pentyl group, 6-cyclohexyl-n-hexyl group, 7-cyclohexyl-n -Heptyl group, 8-cyclohexyl-n-octyl group, 2-cyclopentylethyl group, 3-cyclopentyl-n-propyl group, 4-cyclopentyl-n-butyl group, 5-cyclopentyl-n-pentyl group, 6-cyclopentyl- Cycloalkylalkyl groups such as n-hexyl group, 7-cyclopentyl-n-heptyl group, and 8-cyclopentyl-n-octyl group; 2-methoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl group, 4-methoxy Carbonyl-n-butyl group, 5-methoxycarbonyl-n-pentyl group, 6-methoxycarbonyl-n-hexyl group, 7-methoxycarbonyl-n-heptyl group, 8-methoxycarbonyl-n-octyl group, 2-ethoxy Carbonyl ethyl group, 3-ethoxycarbonyl-n-propyl group, 4-ethoxycarbonyl-n-butyl group, 5-ethoxycarbonyl-n-pentyl group, 6-ethoxycarbonyl-n-hexyl group, 7-etoki An alkoxycarbonylalkyl group such as a sicarbonyl-n-heptyl group and an 8-ethoxycarbonyl-n-octyl group; 2-chloroethyl group, 3-chloro-n-propyl group, 4-chloro-n-butyl group, 5- Chloro-n-pentyl group, 6-chloro-n-hexyl group, 7-chloro-n-heptyl group, 8-chloro-n-octyl group, 2-bromoethyl group, 3-bromo-n-propyl group, 4- Bromo-n-butyl group, 5-bromo-n-pentyl group, 6-bromo-n-hexyl group, 7-bromo-n-heptyl group, 8-bromo-n-octyl group, 3,3,3-tri Examples thereof include a fluoropropyl group and an alkyl halide group such as 3,3,4,4,5,5,5-heptafluoro-n-pentyl group.

Among the above-mentioned suitable groups as R ^c2 and R ^c3 are ethyl group, n-propyl group, n-butyl group, n-pentyl group, 2-methoxyethyl group, 2-cyanoethyl group, 2-phenylethyl group, 2-Cyclohexylethyl group, 2-methoxycarbonylethyl group, 2-chloroethyl group, 2-bromoethyl group, 3,3,3-trifluoropropyl group, and 3,3,4,5,5,5-hepta It is a fluoro-n-pentyl group.

Examples of suitable organic groups for R ^c4 include alkyl groups, alkoxy groups, cycloalkyl groups, cycloalkoxy groups, saturated aliphatic acyl groups, alkoxycarbonyl groups, saturated aliphatic acyloxy groups and substituents ^{, as in R c1.} A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a substituent. A good benzoyloxy group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, A naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent. Examples thereof include a heterocyclylcarbonyl group which may have a group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like. Specific examples of these groups are similar to those described for ^{R c1.} Further, as R ^c4 , a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylthioalkyl group which may have a substituent on the aromatic ring are also preferable. The substituents that the phenoxyalkyl group and the phenylthioalkyl group may have are the same as the substituents that the phenyl group contained ^{in R c1 may have.}

Among the organic groups, R ^c4 includes an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, and a phenylthio which may have a substituent on the aromatic ring. Alkyl groups are preferred. As the alkyl group, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, an alkyl group having 1 to 4 carbon atoms is particularly preferable, and a methyl group is the most preferable. preferable. Among the phenyl groups that may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the cycloalkylalkyl groups, a cyclopentylethyl group is preferable. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the phenylthioalkyl groups that may have a substituent on the aromatic ring, a 2- (4-chlorophenylthio) ethyl group is preferable.

^As the ^{R c4,} the group represented by -A 3 ^{-CO-O-A 4} are also preferred. A ³ is a divalent organic group, preferably a divalent hydrocarbon group, and preferably an alkylene group. A ⁴ is a monovalent organic group, preferably a monovalent hydrocarbon group.

When A ³ is an alkylene group, the alkylene group may be linear or branched, preferably linear. When A ³ is an alkylene group, the number of carbon atoms of the alkylene group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 4 or less.

Preferable examples of A ^4, alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a cycloalkylalkyl group of 4 to 10 carbon atoms, 7 carbon atoms or more Examples thereof include an aralkyl group having 20 or less carbon atoms and an aromatic hydrocarbon group having 6 to 20 carbon atoms. Specific preferable examples of A ⁴ is methyl group, ethyl group, n- propyl group, an isopropyl group, n- butyl group, isobutyl group, sec- butyl group, tert- butyl group, n- pentyl group, n- hexyl Examples thereof include a group, a phenyl group, a naphthyl group, a benzyl group, a phenethyl group, an α-naphthylmethyl group, a β-naphthylmethyl group and the like.

Preferable specific examples of the group represented by −A ³ −CO—O—A ⁴ include 2-methoxycarbonylethyl group, 2-ethoxycarbonylethyl group, 2-n-propyloxycarbonylethyl group, 2-n. -Butyloxycarbonylethyl group, 2-n-pentyloxycarbonylethyl group, 2-n-hexyloxycarbonylethyl group, 2-benzyloxycarbonylethyl group, 2-phenoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl Group, 3-ethoxycarbonyl-n-propyl group, 3-n-propyloxycarbonyl-n-propyl group, 3-n-butyloxycarbonyl-n-propyl group, 3-n-pentyloxycarbonyl-n-propyl group , 3-n-hexyloxycarbonyl-n-propyl group, 3-benzyloxycarbonyl-n-propyl group, 3-phenoxycarbonyl-n-propyl group and the like.

（式（ｃ２−ａ）及び（ｃ２−ｂ）中、Ｒ^ｃ７及びＲ^ｃ８はそれぞれ有機基であり、ｎ３は０以上４以下の整数であり、Ｒ^ｃ７及びＲ^ｃ８がベンゼン環上の隣接する位置に存在する場合、Ｒ^ｃ７とＲ^ｃ８とが互いに結合して環を形成してもよく、ｎ４は１以上８以下の整数であり、ｎ５は１以上５以下の整数であり、ｎ６は０以上（ｎ５＋３）以下の整数であり、Ｒ^ｃ９は有機基である。） ^Having described ^{R c4,} as the ^{R c4,} preferably a group represented by the following formula (c2-a) or (c2-b).

(In formulas (c2-a) and (c2-b), R ^c7 and R ^c8 are organic groups, respectively, n3 is an integer of 0 or more and 4 or less, and R ^c7 and R ^c8 are adjacent to each other on the benzene ring. When present at the position, R ^c7 and R ^c8 may be combined with each other to form a ring, n4 is an integer of 1 or more and 8 or less, n5 is an integer of 1 or more and 5 or less, and n6 is 0. It is an integer equal to or less than (n5 + 3), and R ^c9 is an organic group.)

Examples of organic groups for ^{R c7} and R ^{c8 in} formula (c2-a) are similar to ^{R c1.} As R ^c7 , an alkyl group or a phenyl group is preferable. When R ^c7 is an alkyl group, the number of carbon atoms thereof is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, particularly preferably 1 or more and 3 or less, and most preferably 1. That is, R ^c7 is most preferably a methyl group. When R ^c7 and R ^c8 combine to form a ring, the ring may be an aromatic ring or an aliphatic ring. Preferable examples of the group represented by the formula (c2-a) in which R ^c7 and R ^c8 form a ring include a naphthalene-1-yl group and 1,2,3. Examples thereof include 4-tetrahydronaphthalene-5-yl group. In the above formula (c2-a), n3 is an integer of 0 or more and 4 or less, preferably 0 or 1, and more preferably 0.

In the above formula (c2-b), R ^c9 is an organic group. Examples of the organic group include groups similar to the organic group described for ^{R c1.} Among the organic groups, an alkyl group is preferable. The alkyl group may be linear or branched. The number of carbon atoms of the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and particularly preferably 1 or more and 3 or less. As R ^c9 , a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group and the like are preferably exemplified, and among these, a methyl group is more preferable.

In the above formula (c2-b), n5 is an integer of 1 or more and 5 or less, preferably an integer of 1 or more and 3 or less, and more preferably 1 or 2. In the above formula (c2-b), n6 is 0 or more (n5 + 3) or less, an integer of 0 or more and 3 or less is preferable, an integer of 0 or more and 2 or less is more preferable, and 0 is particularly preferable. In the above formula (c2-b), n4 is an integer of 1 or more and 8 or less, an integer of 1 or more and 5 or less is preferable, an integer of 1 or more and 3 or less is more preferable, and 1 or 2 is particularly preferable.

In the formula (c2), R ^c5 is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, or an aryl group which may have a substituent. Examples of the substituent that R ^c5 may have when it is an aliphatic hydrocarbon group include a phenyl group and a naphthyl group. Further, ^{as the substituent which may be possessed when R c1} is an aryl group, an alkyl group having 1 or more and 5 or less carbon atoms, an alkoxy group, a halogen atom and the like are preferably exemplified.

In the formula (c2), R ^c5 includes a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a 2-cyclopentylethyl group, a 2-cyclobutylethyl group, and a cyclohexylmethyl group. Phenyl group, benzyl group, methylphenyl group, naphthyl group and the like are preferably exemplified, and among these, methyl group or phenyl group is more preferable.

Preferable specific examples of the compound represented by the formula (c2) include the following compounds.

As described above, the photosensitive composition preferably contains an oxime ester compound as the photopolymerization initiator (C). Oxime ester compounds have an excellent ability to absorb ultraviolet rays and generate radicals. Therefore, the oxime ester compound has high sensitivity, and even when a high-concentration light-shielding agent (D) is contained, the photosensitive composition can be sufficiently cured with a small amount of exposure. In the case of a photosensitive composition containing a large amount of the light-shielding agent (D), when the optical density of the film forming the photosensitive composition is 3, the ultraviolet exposure amount in the deep layer portion is larger than the ultraviolet exposure amount in the surface layer portion (outermost surface). Although quite small, the oxime ester compound can generate radicals even at such relatively low UV exposures and can cure the photosensitive composition well.

Further, when the light-shielding agent (D) described later is blended in the photosensitive composition at a high concentration, the primary aggregate (aggregate) of the light-shielding agent (D) is inevitably formed in the coating film made of the photosensitive composition. Occurs. However, when a photosensitive composition containing an oxime ester compound is used as the photopolymerization initiator (C), the photopolymerization initiator (C) generates radicals when irradiated with ultraviolet rays even in a small gap where aggregates are complicatedly overlapped. ..
As a result, the cured product of the photosensitive composition is not only excellent in adhesion to the substrate and electrical resistivity (insulation property) in an environment of normal temperature and humidity and atmospheric pressure, but also the cured product is in a high temperature, high humidity and high pressure environment. Adhesion to the substrate and electrical resistivity (insulation) are unlikely to decrease even when exposed to. Durability in a high temperature, high humidity and high pressure environment can be confirmed by a so-called PCT test (pressure cooker test).
Therefore, in an organic EL display panel using a bank made of a cured product of a photosensitive composition containing an oxime ester compound, particularly an oxime ester compound represented by the formula (c1), even when the usage environment is high temperature or high humidity. , Performance is unlikely to deteriorate.

As the photopolymerization initiator (C), an oxime ester compound and a photopolymerization initiator other than the oxime ester compound may be used in combination. In this case, the ratio of the mass of the oxime ester compound to the total mass of the photopolymerization initiator (C) is preferably 20% by mass or more, more preferably 30% by mass or more, even more preferably 35% by mass or more, and 40% by mass. The above is particularly preferable.

As the photopolymerization initiator other than the oxime ester compound, for example, an aminoalkylphenone-based photopolymerization initiator can be preferably used.
A preferable example of the aminoalkylphenone-based photopolymerization initiator is a compound represented by the following formula (c3-1).

In the formula (c3-1), R ^c01 is a linear, branched chain or cyclic alkyl group having 1 to 12 carbon atoms.
R ^c02 and R ^c03 are independently hydrogen atoms, alkyl groups having 1 to 12 carbon atoms, cycloalkyl groups having 3 to 12 carbon atoms, or benzyl groups. The alkyl group as R ^c02 or R ^c03 may be linear or branched.
R ^c04 , R ^c05 , R ^c07 , and R ^c08 independently have a hydrogen atom, a halogen atom, an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or a carbon atom. It is an alkoxy group having a number of 1 or more and 4 or less. The alkyl and alkoxy groups as R ^c04 , R ^c05 , R ^c07 , and R ^{c08 may be linear or branched.}
R ^c06 is a hydrogen atom, a halogen atom, an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms. The alkyl group and alkoxy group as R ^{c06 may be linear or branched chain. Further} , the alkyl group, cycloalkyl group, and alkoxy group as R c06 may be substituted with one or more substituents. The substituent is at least one selected from the group consisting of a hydroxyl group and an alkoxy group having 1 or more and 4 or less carbon atoms. The alkoxy group as a substituent in R ^{c06 may be linear or branched.}

Suitable specific examples when R ^c01 is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-. Examples thereof include a pentyl group, an n-hexyl group, an n-heptyl group, an n-octyl group, an n-nonyl group, an n-decyl group, an n-undecyl group, and an n-dodecyl group. Among these, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, and n-hexyl group are preferable. Ethyl groups are more preferred.

Suitable specific examples when R ^c01 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclononyl group, a cyclodecyl group, a cycloundecyl group, and Cyclododecyl group can be mentioned.

A suitable specific example when R ^c02 and R ^c03 are an alkyl group or a cycloalkyl group is the same as a preferable specific example when R ^c01 is an alkyl group or a cycloalkyl group. ^Examples of R c02 and R ^c03 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group and n-hexyl group. The n-heptyl group and the n-octyl group are preferable, and the methyl group is more preferable.

Specific examples of cases where R ^c04 , R ^c05 , R ^c07 , and R ^c08 are halogen atoms include chlorine atom, iodine atom, bromine atom, and fluorine atom.
Preferable specific examples when R ^c04 , R ^c05 , R ^c07 , and R ^c08 are alkyl groups or cycloalkyl groups are the same as preferred specific examples when R ^c01 is an alkyl group or cycloalkyl group. ..
Specific examples of cases where R ^c04 , R ^c05 , R ^c07 , and R ^c08 are alkoxy groups include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, and sec. -Butyloxy group and tert-butyloxy group can be mentioned.
As R ^c04 , R ^c05 , R ^c07 , and R ^c08 , hydrogen is used because the sensitivity and depth of focus of the photosensitive composition are good and it is easy to form a cured film having good adhesion to the substrate. Atoms, methyl groups, and ethyl groups are preferred, with hydrogen atoms being more preferred.

Specific example of R ^c06 is halogen atom, an alkyl group, a cycloalkyl group, or an alkoxy ^{group, R c04, R c05, R} c07, and ^{R c08} is halogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group This is the same as the specific example in the case of.
When ^{the alkyl group, cycloalkyl group, and alkoxy group as R c06} are substituted with one or more substituents, the substituent is preferably a hydroxyl group and a methoxy group.

Suitable specific examples of R ^c06 include hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, and the like. n-hexyl group, n-heptyl group, n-octyl group, n-decyl group, n-dodecyl group, hydroxymethyl group, 2-hydroxyethyl group, methoxymethyl group, 2-methoxyethyl group, methoxy group, ethoxy group , N-propyloxy group, isopropyloxy group, n-butyloxy group, hydroxymethoxy group, 2-hydroxyethoxy group, methoxymethoxy group, 2-methoxyethoxy group and the like are preferable, and hydrogen atom, methyl group and ethyl group are preferable. More preferable.

R ^c01 is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, or an n-hexyl group. ^c02 is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, Or it is an n-octyl group, and R ^c03 is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, n. -Hexyl group, n-heptyl group, n-octyl group, etc., R ^c04 is a hydrogen atom, a methyl group, or an ethyl group, and R ^c05 is a hydrogen atom, a methyl group, or an ethyl group. It is preferable ^{that R c07} is a hydrogen atom, a methyl group, or an ethyl group, R ^c08 is a hydrogen atom, a methyl group, or an ethyl group, and R ^c06 is a methyl group or a hydrogen atom.

Examples of the aminoalkylphenone-based compound represented by the formula (c3-1) include 2-benzyl-2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one (for example, Ciba. IRGACURE369 manufactured by Specialty Chemicals, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one (for example, manufactured by Ciba Specialty Chemicals). IRGACURE379), 2- (4-ethylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- (4-isopropylbenzyl) -2- (dimethylamino)- 1- (4-morpholinophenyl) butane-1-one, 2- (4-n-butylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- (4-Isobutylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- (4-n-dodecylbenzyl) -2- (dimethylamino) -1-( 4-morpholinophenyl) butane-1-one, 2- (3,4-dimethylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- (4-) Methoxybenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- (4-ethoxybenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) ) Butane-1-one, 2- (4-hydroxymethylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- [4- (2-hydroxyethoxy) Benzyl] -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- [4- (2-methoxyethoxy) benzyl] -2- (dimethylamino) -1- (4) -Morphorinophenyl) butane-1-one, 2- (4-isopropylbenzyl) -2-[(n-butyl) (methyl) amino] -1- (4-morpholinophenyl) butane-1-one, 2 -(4-n-Butylbenzyl) -2-[(n-butyl) (methyl) amino] -1- (4-morpholinophenyl) butane-1-one, 2- (4-isopropylbenzyl) -2- (Dimethylamino) -1- (4-morpholinophenyl) pentane-1-one, 2- (4-isobutylbenzyl) -2-[(n) -Butyl) (methyl) amino]] -1- (4-morpholinophenyl) pentane-1-one, 2- (4-n-butyloxybenzyl) -2-[(n-butyl) (methyl) amino] -1- (4-morpholinophenyl) pentane-1-one, 2- (4-methylbenzyl) -2- [di (n-octyl) amino] -1- (4-morpholinophenyl) hexane-1- On and 2- (4-n-dodecylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) octane-1-one and the like can be mentioned.
Of these, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butane-1-one is preferable.

When an aminoalkylphenone-based photopolymerization initiator is combined with the oxime ester compound, it is easy to control the cross-sectional shape of the bank formed by using the photosensitive composition.
This is because the aminoalkylphenone-based photopolymerization initiator tends to generate photopolymerization radicals relatively on the surface layer portion of the photosensitive composition (the surface facing the exposed light and its vicinity), and the oxime ester. It is considered that the compound tends to generate a photopolymerization radical even in a relatively deep portion of the photosensitive composition. This tendency becomes more pronounced as the film thickness of the photosensitive composition becomes thicker, but it is also observed even at a thin film thickness of 1 μm or less.
Further, as a secondary effect of using the aminoalkylphenone-based photopolymerization initiator together with the oxime ester compound, the overall sensitivity is improved, and a cured product of the photosensitive composition can be obtained with a small exposure amount. Further, when an aminoalkylphenone-based photopolymerization initiator is used together with the oxime ester compound, the straightness of the line edge and the adhesion to the substrate are good, and it is easy to form a bank with few pattern defects.

In the photosensitive composition, when the photopolymerization initiator (C) contains an oxime ester compound and an aminoalkylphenone-based photopolymerization initiator, the mass of the oxime ester compound and the mass of the aminoalkylphenone-based photopolymerization initiator. The ratio of the mass of the aminoalkylphenone-based photopolymerization initiator to the total is preferably 20% by mass or more and 75% by mass or less, more preferably 25% by mass or more and 70% by mass or less, and 30% by mass or more and 60% by mass or less. Is particularly preferable. The oxime ester compound is added to the photosensitive composition so that the mixing ratio of the oxime ester compound when forming a thick cured film is higher than the mixing ratio of the oxime ester compound when forming a thin cured film. Is desirable.

The content of the photopolymerization initiator (C) in the photosensitive composition is not particularly limited as long as it does not impair the object of the present invention. The content of the photopolymerization initiator (C) is preferably 0.1% by mass or more and 50% by mass or less, and more preferably 0.3% by mass or more and 30% by mass or less with respect to the mass of the solid content of the photosensitive composition. , 0.5% by mass or more and 20% by mass, particularly preferably the following. By using the photopolymerization initiator (C) in an amount within such a range, the photopolymerization initiator (C) can be used without impairing the mechanical properties, solvent resistance, chemical resistance, etc. of the cured product. It is easy to obtain the desired effect.

<Shading agent (D)>
The photosensitive composition contains a light-shielding agent (D). The light-shielding agent (D) essentially contains a lactam pigment (D1). Since the photosensitive composition contains the lactam pigment (D1) as the light-shielding agent (D), it is excellent in light-shielding property and easily forms a bank having a high resistance value.

[Lactam pigment (D1)]
The lactam pigment (D1) is not particularly limited as long as it is a pigment recognized by those skilled in the art as a lactam compound. Examples of the lactam pigment (D1) include compounds represented by the following formula (d-1).

In formula (d-1), X ^d represents a double bond and is independently an E-form or Z-form as a geometric isomer, and R ^d1 is independently a hydrogen atom, a methyl group, a nitro group, or a methoxy. Indicates a group, a bromine atom, a chlorine atom, a fluorine atom, a carboxy group, or a sulfo group. R ^d2 independently represents a hydrogen atom, a methyl group, or a phenyl group. R ^d3 independently represents a hydrogen atom, a methyl group, or a chlorine atom.
The compound represented by the formula (d-1) can be used alone or in combination of two or more.
R ^d1 is preferably bonded to the 6-position of the dihydroindron ring because the compound represented by the formula (d-1) can be easily produced, and R ^d3 is bonded to the 4-position of the dihydroindron ring. It is preferable to do so. From the same viewpoint, R ^d1 , R ^d2 , and R ^d3 are preferably hydrogen atoms.
The compound represented by the formula (d-1) has an EE form, a ZZ form, and an EZ form as geometric isomers, but may be a single compound of any one of these, or these geometric isomers. May be a mixture of.
The compound represented by the formula (d-1) can be produced, for example, by the methods described in International Publication No. 2000/24736 and International Publication No. 2010/081624.

In order to satisfactorily disperse the lactam pigment (D1) in the photosensitive composition, the average particle size of the lactam pigment is preferably 10 nm or more and 1000 nm or less.

[Carbon black (D2)]
The photosensitive composition may contain carbon black (D2) together with the lactam pigment (D1) as long as the object of the present invention is not impaired.
As the carbon black (D2), various carbon blacks conventionally used as a light-shielding agent can be used. Specifically, as the carbon black, known carbon blacks such as channel black, furnace black, thermal black, and lamp black can be used. One type of carbon black (D2) may be used alone, or two or more types may be used in combination.

The carbon black (D2) is preferably subjected to a surface treatment selected from a coating treatment with an organic substance and a treatment for introducing an acidic group.
By using the above surface-treated carbon black (D2) and a lactam pigment (D1) in combination, a photosensitive composition is used to obtain a fine line pattern that has low reflectance from the substrate side and adheres to the substrate. Can be formed.

The average primary particle size of the untreated carbon black (D2) is preferably 5 nm or more and 60 nm or less, more preferably 10 nm or more and 50 nm or less, and particularly preferably 20 nm or more and 45 nm or less. Here, the average primary particle size means an arithmetic mean value of the primary particle size obtained by observing 1500 carbon black primary particles with an electron microscope. If the average primary particle size of carbon black is too small, agglutination is likely to occur, the stability of the mill base is deteriorated, and dispersion at a high concentration is difficult. On the other hand, if the average primary particle size of carbon black is excessive, shape defects are likely to occur in the cured film formed by using the photosensitive composition, and a cured film having a rough surface is likely to be formed.

The DBP oil absorption of untreated carbon black (D2) is preferably 100 mL / 100 g or less. Here, the DBP oil absorption amount means the capacity of dibutyl phthalate (DBP) absorbed by 100 g of carbon black (JIS6217). If the amount of DBP oil absorbed by the untreated carbon black is excessive, the viscosity of the photosensitive composition is increased, the coatability is deteriorated, and the OD and resistance value of the cured film are likely to decrease.

The pH value of the untreated carbon black (D2) is preferably 2 or more and 10 or less, more preferably 5 or more and 9 or less, and particularly preferably 4 or more and 8 or less. Here, the pH value means a value obtained by measuring a mixed solution of carbon black (D2) and distilled water with a glass electrode pH meter (JIS6221). If the pH value of the untreated carbon black (D2) is too low, the stability of the surface-treated carbon black (D2) tends to deteriorate, and if the pH value is excessive, film peeling tends to occur.

The ash content of untreated carbon black (D2) is preferably 1.0% or less. The specific surface area of the untreated carbon black (D2) ^{is preferably 20 m 2} / g or more and 300 m ² / g or less.
If the ash content is excessive, the resistance value of the black light-shielding film tends to decrease. If the specific surface area is too small, the shape of the black light-shielding film is likely to be defective, and if it is too large, a large amount of dispersant, resin, dye, etc. is required, which is disadvantageous in terms of the production cost of surface-treated carbon black.

The coating treatment with an organic substance may be a treatment in which at least a part of the surface of untreated carbon black (D2) is coated with an organic substance. As long as the desired effect is obtained, the entire surface of carbon black (D2) does not have to be coated with an organic substance.
The organic substance is not particularly limited as long as it is a substance that can be physically or chemically bonded to the surface of carbon black (D2). Preferred examples of organic substances include resins, waxes, fats and oils, long-chain fatty acids, dyes, and coupling agents such as silane coupling agents.

Among the above organic substances, resins and dyes are preferable because they are easily available and coated.

The method of coating the untreated carbon black (D2) with the resin is not particularly limited.
Examples of the coating method include a method of coating carbon black (D2) particles with a resin solution, a dispersion containing resin fine particles, or an emulsion, and then removing the solvent from the coating layer.
When coating with a curable resin, the monomer or the uncured resin precursor is attached to the surface of the carbon black (D2) particles, and then the monomer is polymerized or uncured. The resin precursor may be cured. In this case, by coating the particles of carbon black (D2) with a solution of the monomer or the uncured resin precursor, the monomer or the uncured resin precursor is combined with the carbon black (D2). It is preferable to attach it to the surface of the particles. Further, if necessary, a polymerization initiator or a curing agent may be used together with the monomer or the uncured resin precursor.

After dispersing carbon black (D2) particles in a matrix made of resin, the resin containing carbon black (D2) particles is finely pulverized to produce carbon black (D2) coated with the resin. You can also.

The thickness of the resin coating layer in the resin-coated carbon black (D2) is preferably 0.5 nm or more and 50 nm or less.

The electrical resistivity of carbon black (D2) coated with a resin as a dry powder, that is, the so-called powder resistance, is preferably 0.5 Ω · cm or more and 50 Ω · cm or less.
When a photosensitive composition containing carbon black (D2) coated with such a resin is used, it is easy to form a black light-shielding film having high volume resistivity and excellent adhesion to a substrate and light-shielding property.

Examples of resins that can be used for coating untreated carbon black (D2) include thermoplastic resins such as phenol resins, melamine resins, xylene resins, diallyl phthalate resins, glyptal resins, epoxy resins, alkylbenzene resins, and polystyrene. Thermoplastic resins such as polycarbonate, polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene oxide, polysulphon, polyparaphenylene terephthalamide, polyamideimide, polyimide, polyaminobismaleimide, polyether sulfopolyphenylensulphon, polyarylate, polyether ether ketone, etc. Can be mentioned. Of these, epoxy resin is particularly preferably used.

The carbon black (D2) that has been subjected to the treatment for introducing an acidic group, which will be described later, may be coated with an organic substance.

It is preferable that the untreated carbon black (D2) is subjected to an oxidation treatment before being coated with the dye, and at least one kind of functional group generated by the oxidation treatment is present on the surface thereof, and a plurality of kinds of oxidation treatments are performed. It is more preferable that two or more kinds of functional groups generated by the oxidation treatment are present on the surface thereof.
The untreated carbon black that has not been subjected to the oxidation treatment has no functional groups generated by the oxidation treatment on the surface or has an insufficient number of the functional groups. Therefore, the resulting dye-coated carbon black (D2). ) Cannot be sufficiently dispersed, and it is difficult to form a high-resistance black light-shielding film.
Examples of such an oxidation treatment include a method using ozone gas, nitric acid, sodium hypochlorite, hydrogen peroxide, nitric oxide gas, nitrogen dioxide gas, anhydrous sulfuric acid, fluorine gas, concentrated sulfuric acid, nitric acid, and various peroxides. Be done.
Functional groups produced by the oxidation treatment include hydroxyl groups, oxo groups, hydroperoxy groups, carbonyl groups, carboxy groups, peroxycarboxylic acid groups, aldehyde groups, ketone groups, nitro groups, nitroso groups, amide groups, imide groups and sulfonic acids. Examples thereof include a group, a sulfinic acid group, a sulfenic acid group, a thiocarboxylic acid group, a chlorosyl group, a chloryl group, a perchloryl group, an iodosyl group, and an iodil group.

The dye used for producing the carbon black (D2) coated with the dye is not particularly limited as long as it is a dye that can be adsorbed on the surface of the carbon black, and is a known basic dye, acid dye, or direct dye. , Reactive dyes and the like can be used.
Anionic or nonionic dyes are used because the sulfone group and carboxy group interact with the functional group on carbon black, the amino group reacts with the alkali-soluble resin, and the dye can be insolubilized with a sulfuric acid band or the like. It can be used more preferably.
From the viewpoint of easily forming a cured film having a high light-shielding property, it is preferable to use a dark-colored dye close to black.

Specific examples of such dyes include Food Black No. 1. Food Black No. 2. Food Red No. 40, Food Blue No. 1. Food Yellow No. Food dyes such as 7; Bernacid Red 2BMN, BASFID Black X34 (BASF X-34) (BASF), Kayanol Red 3BL (Nippon Kayaku Company), Dermacarbon 2GT (Sandoz) 175, BASF Basacid Black SE 0228, Basacid Black X34 (BASF X-34) (BASF X-34), Basacid Blue 750 (BASF), Bernacid Red (Bemcolors, PougeBac. Acid dyes of each color, such as SE 0228 (BASF); Pontamine Brilliant Bond Blue A and other Pontamine Brillant Bond Blue A and other Pontamine® dyes (Bayer Chemical, Corporate) GTF Presscake (Sandoz, Inc.); Cartasol Yellow GTF Liquid Special 110 (Sandoz, Inc.); Yellow Shade 16948 (Tricon), Detect Brick Direct Deep Black, Carta Black 2GT (manufactured by Sandoz, Inc.), Sirius Super Yellow GD 167, Cartasol Brilliant Yellow 4GF (manufactured by Sandoz); Dyezol Black RN Quad (manufactured by JCJ), Pontamine Brilliant Bond Blue, Berncolor A. et al. Y. Direct dyes of each color such as 34; Cibacron Brilliant Red 3B-A (Reactive Red 4) (Aldrich Chemical, Milwaukee, WI), Drimalene Brilliant Red X-2B (Reactive Red) X-2B (Reactive Red) Levafix Brilliant Red E-4B, Levafix Brilliant Red F-6BA, and similar Levafix® days Dyestar L. et al. P. (Charlotte, NC) dyes, Procion Red H8B (Reactive Red 31) (JCI America) and other color reactive dyes; Neozapon Red 492 (BASF), Orasol Red G (BASF) , Aizen Spiron RedC-BH (manufactured by Hodogaya Chemical Company), Spirit Fast Yellow 3G, Aizen Spiron Yellow C-GNH (manufactured by Hodogaya Chemical Company), manufactured by Aizen Spiron Yellow C-GNF (manufactured by Hodogaya Chemical Company) , Savinyl Black RLS (manufactured by Sandoz), Orasol Blue GN (manufactured by BASF), Luxol BlueMBSN (manufactured by Morton-Thiokol), Morfast Black Concentrate A (manufactured by Morton-Tiocol), etc. These may be used alone or in combination of two or more.

The content of the dye in the dye-coated carbon black (D2) is preferably 0.5% by mass or more and 10% by mass or less, and 1% by mass or more and 7 by mass or more, based on the total mass of the coated carbon black (D2). More preferably, it is 1% by mass or less, and particularly preferably 1% by mass or more and 5% by mass or less. If the content of the dye is too small, the coating of carbon black (D2) is insufficient, so that it is difficult to form a cured film having high resistance. If the content of the dye is excessive, the excess dye inhibits the dispersion of the dye-coated carbon black (D2), and the thickening of the photosensitive composition and the dye-coated carbon black (D2) Aggregation is likely to occur.

In the dye-coated carbon black (D2), the dye present on the surface of the dye-coated carbon black (D2) is preferably raked with a metal or a metal salt.
By such rake formation, the dye is fixed to the surface of carbon black (D2) via a metal or a metal salt or the above-mentioned functional group generated by the oxidation treatment, and the dye is hard to be separated from the surface of carbon black (D2). ..
Therefore, when the dye is raked, it is difficult for the dye to elute and it is easy to form a cured film having a high OD.
Examples of the metal or metal salt used for such rake formation include aluminum, magnesium, calcium, strontium, barium or manganese, or hydrochlorides and sulfates thereof. These metals or metal salts can be used alone or in combination of two or more.
The amount of the metal or metal salt added for rake formation is preferably 0.3 times mol or more, more preferably 0.5 times mol or more, and particularly preferably 0.8 times mol or more with respect to the dye.
If the amount of the metal or metal salt added is too small, the dye is not sufficiently fixed and easily separated from the surface of the carbon black (D2), the stability of the mill base is poor, and the resistance value is also lowered, which is not preferable.

Next, a method for producing carbon black (D2) coated with a dye will be described. First, the raw material carbon black (D2) is mixed with water (carbon black prepared by appropriately mixing ion-exchanged water with tap water so that the electrical conductivity becomes constant; the same applies hereinafter) to form a slurry for a predetermined time. The carbon black (D2) is washed by heating and stirring, and after cooling, it is washed again with water. Next, water is added to the obtained carbon black (D2) to form a slurry again, the above-mentioned oxidizing agent is added, and the mixture is stirred at a predetermined temperature for a predetermined time to oxidize the surface of the carbon black (D2) and wash with water. .. The oxidation treatment is carried out a plurality of times as necessary by changing the type of the oxidizing agent. Next, the obtained oxidized carbon black (D2) was mixed with water to form a slurry again, and the dye was added so as to have the above-mentioned predetermined content with respect to the carbon black (D2) coated with the target dye. Add and stir at 40-90 ° C. for 1-5 hours to adsorb and coat the surface of carbon black (D2) with the dye. Further, an equimolar amount of the above-mentioned metal or metal salt is added to the added dye, and the mixture is stirred at 30 to 70 ° C. for 1 to 5 hours to rake the dye with the metal or metal salt on the surface of carbon black (D2). Fix the dye. Then, by cooling this, washing it with water, and filtering and drying it, carbon black (D2) coated with a target dye can be obtained.

The acidic group introduced into carbon black (D2) by the treatment for introducing an acidic group is a functional group exhibiting acidity according to Bronsted's definition. Specific examples of the acidic group include a carboxy group, a sulfonic acid group, a phosphoric acid group and the like. The acidic group introduced into the carbon black may form a salt. The cation forming a salt with the acidic group is not particularly limited as long as the object of the present invention is not impaired. Examples of the cation include various metal ions, cations of nitrogen-containing compounds, ammonium ions and the like, and alkali metal ions such as sodium ion, potassium ion and lithium ion, and ammonium ion are preferable.

Among the carbon blacks (D2) that have been subjected to the treatment for introducing the acidic groups described above, the carboxylic acid groups are used from the viewpoint of achieving high resistance of the light-shielding cured film formed by using the photosensitive composition. Carbon black (D2) having one or more functional groups selected from the group consisting of a carboxylic acid base, a sulfonic acid group, and a sulfonic acid base is preferable.

The method for introducing an acidic group into untreated carbon black (D2) is not particularly limited. Examples of the method for introducing an acidic group include the following methods.
1) A method of introducing a sulfonic acid group into untreated carbon black (D2) by a direct substitution method using concentrated sulfuric acid, fuming sulfuric acid, chlorosulfonic acid or the like, or an indirect substitution method using sulfite, hydrogen sulfite or the like.
2) A method of diazo-coupling an organic compound having an amino group and an acidic group with untreated carbon black (D2).
3) A method of reacting an organic compound having a halogen atom and an acidic group with untreated carbon black (D2) having a hydroxyl group by Williamson's etherification method.
4) A method of reacting an organic compound having a halocarbonyl group and an acidic group protected by a protecting group with untreated carbon black (D2) having a hydroxyl group.
5) A method of deprotecting untreated carbon black (D2) after conducting a Friedel-Crafts reaction using an organic compound having a halocarbonyl group and an acidic group protected by a protecting group.
6) The method for performing the above-mentioned oxidation treatment.

Among these methods, method 2) is preferable because the process of introducing an acidic group is easy and safe. As the organic compound having an amino group and an acidic group used in the method 2), a compound in which an amino group and an acidic group are bonded to an aromatic group is preferable. Examples of such compounds include aminobenzenesulfonic acids such as sulfanilic acid and aminobenzoic acids such as 4-aminobenzoic acid.

The number of moles of acidic groups introduced into untreated carbon black (D2) is not particularly limited as long as the object of the present invention is not impaired. The number of moles of acidic groups introduced into the untreated carbon black (D2) is preferably 1 mmol or more and 200 mmol or less, and more preferably 5 mmol or more and 100 mmol or less with respect to 100 g of carbon black (D2).

When the light-shielding agent (D) contains other light-shielding agents other than lactam pigment (D1) and carbon black (D2), the other light-shielding agents include, for example, untreated carbon black, perylene pigment, and silver. Fine particles mainly composed of tin (AgSn) alloy, metal oxides such as titanium black, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium and silver, composite oxides, metal sulfides, metal sulfates or Various pigments such as metal carbonates, regardless of whether they are organic or inorganic, can be mentioned.

In the photosensitive composition, the light-shielding agent (D) may contain a dye as long as the object of the present invention is not impaired. This dye may be appropriately selected from known materials.
Examples of dyes applicable to the photosensitive composition include azo dyes, metal complex salt azo dyes, anthraquinone dyes, triphenylmethane dyes, xanthene dyes, cyanine dyes, naphthoquinone dyes, quinoneimine dyes, methine dyes, phthalocyanine dyes and the like. be able to.
Further, these dyes can be raked (chlorinated) to be dispersed in an organic solvent or the like, and this can be used as a light-shielding agent (D).
In addition to these dyes, for example, Japanese Patent Application Laid-Open No. 2013-225132, Japanese Patent Application Laid-Open No. 2014-178477, Japanese Patent Application Laid-Open No. 2013-137543, Japanese Patent Application Laid-Open No. 2011-38085, Japanese Patent Application Laid-Open No. 2014-197206, etc. The dyes and the like described can also be preferably used.

From the viewpoint of good light-shielding property of the bank, the ratio of the mass of the lactam pigment (D1) to the total mass of the light-shielding agent (D) is preferably 70% by mass or more, more preferably 80% by mass or more, and 90% by mass. The above is more preferable, and 100% by mass or more is particularly preferable.

The form of the light-shielding agent (D) such as a lactam pigment (D1) and carbon black (D2) that has been subjected to a predetermined treatment used for preparing the photosensitive composition is not particularly limited. The light-shielding agent (D) may be used as a powder or as a dispersion. The light-shielding agent (D) is preferably used as a dispersion for the preparation of the photosensitive composition.
As the dispersion liquid, a dispersion liquid containing two or more kinds of light-shielding agents (D) may be used. Further, two or more kinds of dispersion liquids containing different kinds of light-shielding agents may be used.

Examples of the dispersion medium include organic solvents such as propylene glycol monomethyl ether acetate, cellosolve acetate, 3-methoxybutyl acetate, methoxypropyl acetate, 2-methoxyethyl acetate 3-ethoxyethyl propionate, and propylene glycol monomethyl ether propionate. Or water or the like can be used.

Even if a dispersant is added to the light-shielding agent (D) in order to stabilize the dispersion of the light-shielding agent (D) in the dispersion liquid and to improve the dispersibility of the light-shielding agent (D) in the photosensitive composition. Good.
As the dispersant, it is preferable to use a polymer dispersant such as a polyethyleneimine-based dispersant, a urethane-based dispersant, or an acrylic resin-based dispersant. Among these dispersants, urethane-based dispersion is preferable from the viewpoint of resistance to generation of residue after development.
In addition, corrosive gas due to the dispersant may be generated from the cured film. Therefore, it is also an example of a preferable embodiment that the light-shielding agent (D) is dispersed without using a dispersant.
When the light-shielding agent (D) contains a dispersant, the proportion of the dispersant in the light-shielding agent (D) is, for example, 5% by mass or more and 60% by mass or less, preferably 20% by mass or more and 50% by mass or less.

The viscosity of the dispersion liquid of the light-shielding agent (D) is not particularly limited. The viscosity of the dispersion is preferably 3 mPa · s or more and 200 mPa · s or less as a value measured at 25 ° C. by a cone plate type viscometer.

The particle size of the light-shielding agent (D) in the dispersion is preferably 80 nm or more and 300 nm or less as the dispersion average particle size. The dispersed average particle size can be measured using a laser diffraction type particle size distribution system.

The total amount of the light-shielding agent (D) in the photosensitive composition can be appropriately selected as long as the object of the present invention is not impaired. The total content of the light-shielding agent (D) in the photosensitive composition is typically 45% by mass or less, preferably 0.1% by mass or more and 30% by mass or less, based on the total mass of the photosensitive composition. Is preferable, and 1% by mass or more and 20% by mass or less is more preferable. As long as the photosensitive composition can be used to form a cured film having a sufficiently high light-shielding property, the upper limit of the total content of the light-shielding agent (D) with respect to the total mass of the solid content of the photosensitive composition is 90. It may be 5% by mass or less, 85% by mass or less, and 75% by mass or less. The lower limit is, for example, 15% by mass or more, preferably 20% by mass or more, and more preferably 40% by mass or more.
In this specification, the amount of the light-shielding agent (D) described above can be defined as a value including the amount of the dispersant present together with the light-shielding agent (D).

<Other ingredients (E)>
Hereinafter, any component as other components will be described below. The amount of the other component (E) added is not particularly limited. Other components (E) can be used in an amount within a range that does not impair the object of the present invention.

[Surface conditioner]
By reducing the surface tension of the photosensitive composition, the surface conditioner suppresses the occurrence of surface defects and appearance defects (non-uniform distribution of pigments) due to non-uniform distribution of pigments. Specifically, polydimethylsiloxane, polyether-modified polysiloxane, polymethylalkylsiloxane, polysiloxane modified with an aralkyl group or a polyester chain, and the like can be preferably used.

[Adhesion improver]
Known coupling agents such as silane coupling agents, titanate coupling agents, and aluminate coupling agents can be used. Of these, a silane coupling agent can be preferably used from the viewpoint of enhancing the adhesion to the glass substrate.

The photosensitive composition may contain various additives other than the above, if necessary. Specifically, sensitizers, curing accelerators, photocrosslinkers, photosensitizers, dispersion aids, fillers, antioxidants, UV absorbers, anti-aggregation agents, thermal polymerization inhibitors, defoamers, Examples include surfactants, chain transfer agents, photoinitiator aids, solvents and the like. As any of the additives, conventionally known ones can be used.

Examples of the surfactant include anionic compounds, cationic compounds, nonionic compounds and the like.
Examples of the thermal polymerization inhibitor include hydroquinone, hydroquinone monoethyl ether and the like.
Examples of the defoaming agent include silicone-based compounds and fluorine-based compounds.
Examples of the chain transfer agent include mercaptan compounds, halogen compounds, quinone compounds, α-methylstyrene dimers and the like. By containing the chain transfer agent, the pattern shape (particularly, the CD change of the hole pattern and the exposure margin) can be satisfactorily controlled. Of these, 2,4-diphenyl-4-methyl-1-pentene (α-methylstyrene dimer) is preferable because it can reduce sublimation, coloring, and odor in addition to the above effects.
Examples of the photoinitiator aid include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 4-dimethylaminobenzoic acid. 2-Ethylhexyl, 2-dimethylaminoethyl benzoate, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (commonly known as Michelers ketone), 4,4'-bis (diethylamino) benzophenone, 9,10 Examples thereof include −dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl-9,10-diethoxyanthracene. These photoinitiator aids may be used alone or in combination of two or more.

<Solvent (S)>
The photosensitive composition preferably contains a solvent (S) for dilution. Examples of the solvent (S) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol mono-n-. Propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether , Dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. (poly) Alkylene glycol monoalkyl ethers; (poly) alkylene glycols such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate. Monoalkyl ether acetates; Other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran; Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; Methyl 2-hydroxypropionate, 2 Lactate alkyl esters such as ethyl hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate , Ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, acetate n-propyl, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, pyruvate Other esters such as ethyl acid, n-propyl pyruvate, methyl acetoacetamide, ethyl acetoacetate, ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene; N-methylpyrrolidone, N, N-dimethyl Examples thereof include amides such as formamide and N, N-dimethylacetamide. These solvents may be used alone or in combination of two or more.

Among the above solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate (GPMEA), propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether (MEDG), cyclohexanone, 3-methoxybutyl acetate. (MBA) is preferable because it exhibits excellent solubility in the above-mentioned photopolymerization initiator (C), and it is particularly preferable to use propylene glycol monomethyl ether acetate or 3-methoxybutyl acetate.
The content of the solvent (S) is preferably such that the solid content concentration of the photosensitive composition is 1% by mass or more and 50% by mass or less, and more preferably 5% by mass or more and 40% by mass or less.

<< Preparation method of photosensitive composition >>
The photosensitive composition is prepared by uniformly stirring and mixing each of the above components, and uniformly dissolving and dispersing them. At the time of mixing, it may be mixed with a stirrer such as a roll mill, a ball mill or a sand mill. If necessary, it can be prepared by filtering with a filter such as a 2 μm membrane filter.

Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.

[Preparation Example 1]
In a 500 mL four-necked flask, 235 g of bisphenol fluoride type epoxy resin (epoxy equivalent 235), 110 mg of tetramethylammonium chloride, 100 mg of 2,6-di-tert-butyl-4-methylphenol, and 72.0 g of acrylic acid were charged. , While blowing air at a rate of 25 mL / min, heated to 90 ° C. or higher and 100 ° C. or lower to dissolve the flask. Next, the temperature of the solution was gradually raised while the solution was cloudy, and the solution was heated to 120 ° C. to completely dissolve the solution. At this time, the solution gradually became transparent and viscous, but stirring was continued as it was. During this period, the acid value was measured, and heating and stirring were continued until the acid value became less than 1.0 mgKOH / g. It took 12 hours for the acid value to reach the target value. Then, it was cooled to room temperature to obtain a colorless transparent solid bisphenol fluorene type epoxy acrylate represented by the following formula.

Next, 600 g of 3-methoxybutyl acetate was added to 307.0 g of the above-mentioned bisphenol fluorene type epoxy acrylate thus obtained and dissolved, and then 4,4'-(hexafluoroisopropyridene) diphthalic anhydride 121. 5 g and 1 g of tetraethylammonium bromide were mixed, the temperature was gradually raised, and the reaction was carried out at 110 to 115 ° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to make the cardo resin (R-1) alkaline. Obtained as a soluble resin (A). The disappearance of the acid anhydride group was confirmed by the IR spectrum.

[Preparation Example 2]
Changing the amount of 4,4'-(hexafluoroisopropyridene) diphthalic anhydride used from 121.5 g to 60.9 g, and pyromerit with 4,4'-(hexafluoroisopropyridene) diphthalic anhydride A resin (R-2), which is a cardo resin, was obtained as an alkali-soluble resin (A) in the same manner as in Preparation Example 1, except that 29.9 g of an acid dianhydride was used.

[Preparation Example 3]
Preparation Example 1 except that 121.5 g of 4,4'-(hexafluoroisopropyridene) diphthalic anhydride is changed to 37.3 g of 1,4-di (trifluoromethyl) pyromellitic dianhydride. In the same manner as above, the resin (R-3) which is a cardo resin was obtained as the alkali-soluble resin (A).

[Preparation Example 4]
It contains a fluorine atom in the same manner as in Preparation Example 1, except that 121.5 g of 4,4'-(hexafluoroisopropylidene) diphthalic anhydride is changed to 80.5 g of 4,4'-biphthalic anhydride. A resin (R-4), which is a non-cardo resin, was obtained as an alkali-soluble resin (A).

[Examples 1 to 3 and Comparative Examples 1 to 2]
In Examples and Comparative Examples, a copolymer of resins R-1 to R-4 obtained in Preparation Examples 1 to 4 and methacrylic acid and benzyl methacrylate (molar ratio: methacrylic acid / benzyl methacrylate = 83/17, Resin R-5 having Mw: about 10,000) was used as the alkali-soluble resin (A).

In Examples and Comparative Examples, dipentaerythritol hexaacrylate was used as the photopolymerizable monomer (B).

In Examples and Comparative Examples, the oxime ester compound represented by the following formula was used as the photopolymerization initiator (C).

In Examples and Comparative Examples, a compound represented by the following formula, which is a lactam pigment (D1), was used as a light-shielding agent (D).

In Examples and Comparative Examples, a mixed solvent composed of 80% by mass of propylene glycol monomethyl ether acetate and 20% by mass of 3-methoxybutyl acetate was used as the solvent (S).

33.4 parts by mass of the alkali-soluble resins (A) ((A) component) of the types shown in Table 1 and the photopolymerizable monomer (B) ((B) components) in the amounts shown in Table 1 below, respectively. ) 14.6 parts by mass, photopolymerization initiator (C) ((C) component) 5.0 parts by mass, and light-shielding agent (D) ((D) component) 46.9 parts by mass (light-shielding agent (D)) 50% by mass of the compounded amount is a urethane-based dispersant), and 0.1 part by mass of BYK-310 (manufactured by Big Chemie Japan Co., Ltd.) composed of polyester-modified polydimethylsiloxane as a surface conditioner, and solid content concentration. Was dissolved and dispersed in the solvent (S) so as to have a mass content of 15% by mass to obtain a photosensitive composition of each Example and Comparative Example.

Using the photosensitive compositions of Examples 1 to 3 and Comparative Examples 1 and 2, the cross-sectional shape of the pattern and the presence or absence of residue were evaluated according to the following method.

The photosensitive compositions obtained in each Example and Comparative Example were applied onto a glass substrate having a thickness of 100 × 100 mm and 0.7 mm using a spin coater, and then the coating film was prebaked at 90 ° C. for 120 seconds.
Next, using the exposure apparatus TME150RTO (manufactured by Topcon), the entire surface of the coating film was exposed to the optimum exposure amount (Eop) through a mask (ultraviolet exposure with an ultrahigh pressure mercury lamp).
After the exposure, development was carried out under the conditions of 25 ° C. and 60 seconds using an aqueous solution of tetramethylammonium hydroxide having a concentration of 2.38% by mass as a developing solution.
The exposed coating film after development was post-baked at 230 ° C. for 30 minutes to form a pattern of a black light-shielding film having a film thickness of 1 μm as a bank.

The obtained glass substrate with a bank was observed with an electron microscope to confirm the presence or absence of residue after development. When a large amount of residue was confirmed, it was judged as x, when a small amount of residue was confirmed, it was judged as Δ, and when no residue was confirmed, it was judged as 〇.
In addition, the cross section of the formed bank was observed with an electron microscope to obtain an electron microscope image. From the acquired image, the pattern shape angle, which is the angle formed by the surface of the glass substrate and the surface near the glass substrate of the bank, was obtained. When the pattern shape angle was more than 90 degrees, it was judged as x, and when it was 30 degrees or more and 90 degrees or less, it was judged as 〇. In each of the examples and comparative examples, the pattern shape angle was 30 degrees or more.
The results of these evaluations are shown in Table 1.

According to Table 1, an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a lactam pigment (D1) as a light-shielding agent (D) are contained, and the alkali-soluble resin ( As A), a bank pattern is formed on the substrate by using the negative photosensitive resin composition of the example containing a fluorinated cardo resin having a specific structure, which comprises a portion substituted with a fluorine atom at a predetermined position. In this case, it can be seen that the cross-sectional shape of the bank is rectangular or forward-tapered, and the generation of residue after development can be suppressed at the same time.
On the other hand, while containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a lactam pigment (D1) as a light-shielding agent (D), the alkali-soluble resin ( As A), when a bank is formed by using a non-fluorinated cardo resin or a negative photosensitive resin composition of Comparative Examples 1 to 3 containing an acrylic resin, the desired bank cross-sectional shape and after development It can be seen that it is not possible to suppress the generation of the residue of the above.

Claims (7)

A method for manufacturing a substrate for an organic EL panel, which comprises a patterned black light-shielding film containing a lactam pigment (D1) as a light-shielding agent (D) as a bank on the surface thereof.
A negative photosensitive resin composition containing a light-shielding agent (D) and capable of alkaline development is applied onto the substrate to form a coating film.
The coating film is regioselectively exposed according to the pattern shape of the black light-shielding film.
To develop the exposed coating film with an alkaline developer,
Post-development post-baking includes forming a patterned black light-shielding film with a pattern shape angle of 30 degrees or more and 90 degrees or less.
As the negative photosensitive resin composition, a composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and the light-shielding agent (D) is used.
A production method, wherein the alkalized soluble resin (A) contains a resin represented by the following formula (a-1).

(In the formula (a-1), ^Xa is the following formula (a-2):

Indicates a group represented by, and t1 indicates an integer of 0 or more and 20 or less.
In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, t2 each independently represent 0 or 1, ^{W a} is the following formula (a3):

Indicates a group represented by
Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride,
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride,
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} single including fluorine atoms. ) Wherein t1 is 1 to 20 integer, at least one of the t1 amino Z ^a include fluorine atom, a manufacturing method according to claim 1. Wherein said residue containing fluorine atom as Z ^a has a fluorinated aliphatic hydrocarbon group, The method according to claim 2. The production method according to any one of claims 1 to 3, wherein the lactam pigment (D1) is a compound represented by the following formula (d-1).

(In the formula (d-1), X ^d represents a double bond, and R ^d1 independently represents a hydrogen atom, a methyl group, a nitro group, a methoxy group, a bromine atom, a chlorine atom, a fluorine atom, and a carboxy group. Or a sulfo group, R ^d2 independently represents a hydrogen atom, a methyl group, or a phenyl group, and R ^d3 independently represents a hydrogen atom, a methyl group, or a chlorine atom.) The production method according to any one of claims 1 to 4, wherein the negative photosensitive resin composition contains a urethane-based dispersant. A substrate for an organic EL panel provided with a patterned black light-shielding film containing a lactam pigment (D1) as a light-shielding agent (D) as a bank on the surface thereof.
The pattern shape angle of the cross section of the bank satisfies 30 degrees or more and 90 degrees or less.
The black light-shielding film comprises a cured product of a negative photosensitive resin composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and the light-shielding agent (D). ,
A substrate for an organic EL panel, wherein the alkalized soluble resin (A) contains a resin represented by the following formula (a-1).

(In the formula (a-1), ^Xa is the following formula (a-2):

Indicates a group represented by, and t1 indicates an integer of 0 or more and 20 or less.
In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, t2 each independently represent 0 or 1, ^{W a} is the following formula (a3):

Indicates a group represented by
Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride,
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride,
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} single including fluorine atoms. ) It is used for forming the black light-shielding film as the bank in the method for manufacturing a substrate for an organic EL panel provided on the surface of the patterned black light-shielding film as a bank according to any one of claims 1 to 5. Negative photosensitive resin composition
Contains an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a light-shielding agent (D).
The light-shielding agent (D) contains a lactam pigment (D1).
A negative photosensitive resin composition, wherein the alkalized soluble resin (A) contains a resin represented by the following formula (a-1).

(In the formula (a-1), ^Xa is the following formula (a-2):

Indicates a group represented by, and t1 indicates an integer of 0 or more and 20 or less.
In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, t2 each independently represent 0 or 1, ^{W a} is the following formula (a3):

Indicates a group represented by
Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
R ^a0 represents a group represented by ^{-CO-Y a} -COOH, Y a represents the residue obtained by removing the acid anhydride group from a dicarboxylic acid anhydride,
Z ^a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride,
At least one of ^{Y a} or ^{Z a} constituting the group consisting of two ^{Y a} and t1 one ^{Z a} single including fluorine atoms. )

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