TW201813127A - Manufacturing method of light emitting diode chip and light emitting diode chip comprising a wafer preparation step, a transparent substrate processing step, an integration step and a cutting step - Google Patents

Abstract

This invention provides a manufacturing method of a light emitting diode chip capable of obtaining the light emitting diode chip with sufficient luminance. The manufacturing method of the light emitting diode chip is characterized by comprising a wafer preparation step, a transparent substrate processing step, an integration step and a cutting step. The wafer preparation step is to prepare for a wafer, wherein the wafer is provided with a lamination layer with a plurality of semiconductor layers comprising light emitting layers on a transparent substrate for crystal growth, and LED circuits are respectively formed in respective regions divided by a plurality of intercrossed cutting predetermined lines on the obverse side of the lamination layer; the transparent substrate processing step is to form a plurality of recesses corresponding to the respective LED circuits of the wafer on the obverse side of the transparent substrate; the integration step is to attach the obverse side of the transparent substrate to the reverse side of the wafer to form an integrated wafer after carrying out the transparent substrate processing step; and the cutting step is to cut off the wafer and the transparent substrate along the cutting predetermined lines so as to cut the integrated wafer into light emitting diode chips.

Description

Manufacturing method of light emitting diode wafer and light emitting diode wafer

FIELD OF THE INVENTION The present invention relates to a method for manufacturing a light emitting diode wafer and a light emitting diode wafer.

BACKGROUND OF THE INVENTION On the front surface of a substrate for crystal growth such as a sapphire substrate, a GaN substrate, and a SiC substrate, a multilayer body layer formed by laminating a plurality of n-type semiconductor layers, light-emitting layers, and p-type semiconductor layers is formed, and on the multilayer body layers A wafer in which a plurality of light emitting elements such as LEDs (Light Emitting Diodes) are formed in an area defined by a plurality of intersecting division lines is cut along the division line and divided into The light-emitting element wafers are one by one, and the divided light-emitting element wafers are widely used in various electric devices such as mobile phones, personal computers, and lighting equipment.

Since the light emitted from the light-emitting layer of the light-emitting element wafer is isotropic, even if it is irradiated to the inside of the substrate for crystal growth, the light is emitted from the back and sides of the substrate. However, since the light that has been irradiated to the inside of the substrate has an incident angle above the critical angle at the interface with the air layer, the light is totally reflected on the interface and is enclosed inside the substrate. Since it is emitted from the substrate to the outside, there is a problem that the brightness of the light emitting element wafer is reduced.

In order to solve this problem, Japanese Patent Laid-Open No. 2014-175354 has described a light-emitting diode (LED) that is formed on the substrate in order to prevent the light emitted from the light-emitting layer from being enclosed inside the substrate. A transparent member is attached to the back of the lens to increase brightness. Prior Art Literature Patent Literature

Patent Document 1: Japanese Patent Laid-Open No. 2014-175354

SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, in the light-emitting diode disclosed in Patent Document 1, although the brightness can be slightly increased by attaching a transparent member to the back surface of the substrate, there is still a problem that sufficient brightness cannot be obtained.

The present invention has been made in view of such points, and an object thereof is to provide a method for manufacturing a light emitting diode wafer and a light emitting diode wafer capable of obtaining sufficient brightness. Means to solve the problem

According to the invention described in claim 1, a method for manufacturing a light emitting diode wafer can be provided. The method for manufacturing the light emitting diode wafer includes: a wafer preparation step, preparing a wafer, and the wafer is crystallized. A growth substrate has a laminated body layer, and an LED circuit is formed in each of the areas defined by a plurality of predetermined division lines crossing each other on the front side of the laminated body layer. The laminated body layer is formed with a plurality of layers including a light emitting layer. A semiconductor layer; a transparent substrate processing step, forming a plurality of depressions corresponding to each LED circuit of the wafer on the front surface of the transparent substrate; an integration step, after implementing the transparent substrate processing step, attaching the front surface of the transparent substrate to the A back surface of the wafer to form an integrated wafer; and a slicing step of cutting the wafer and the transparent substrate together along the predetermined division line to divide the integrated wafer into individual light emitting diode wafers.

Preferably, the cross-sectional shape of the depression formed in the transparent substrate processing step is any one of a triangle, a quadrangle, or a circle. Preferably, the depressions formed in the transparent substrate processing step are formed by any one of etching, sandblasting, and laser.

Preferably, the transparent substrate is formed of any one of transparent ceramic, optical glass, sapphire, and transparent resin, and in the integration step, the transparent substrate is adhered to the wafer using a transparent adhesive.

According to the invention described in claim 5, it is possible to provide a light-emitting diode wafer including a light-emitting diode in which an LED circuit is formed on a front surface, and a transparent film attached to a back surface of the light-emitting diode. A member, and a depression is formed on an attachment surface of the transparent member and the light emitting diode. Invention effect

Since the light-emitting diode wafer of the present invention has a recess formed on the front surface of the transparent member attached to the back surface of the LED, in addition to increasing the surface area of the transparent member, it is also made incident from the light-emitting layer of the LED and incident. The light reaching the transparent member is complicatedly refracted in the recessed portion, so that the ratio of light having an incident angle above the critical angle at the interface between the transparent member and the air layer when emitted from the transparent member is reduced, and the light emitted from the transparent member The amount of light is increased and the brightness of the light emitting diode wafer is increased.

Embodiments for Carrying Out the Invention Embodiments of the present invention will be described in detail below with reference to the drawings. Referring to FIG. 1, a front perspective view of an optical element wafer (hereinafter sometimes referred to as a wafer) 11 is shown.

The optical element wafer 11 is formed by laminating an epitaxial layer (laminated body layer) 15 such as gallium nitride (GaN) on the sapphire substrate 13. The optical element wafer 11 includes a front surface 11 a on which the crystal film layer 15 is laminated, and a back surface 11 b on which the sapphire substrate 13 is exposed.

Here, although the sapphire substrate 13 is used as the substrate for crystal growth in the optical element wafer 11 of this embodiment, a GaN substrate, a SiC substrate, or the like may be used instead of the sapphire substrate 13.

The laminated body layer (crystal film layer) 15 is an n-type semiconductor layer (for example, an n-type GaN layer), a semiconductor layer (for example, an InGaN layer) that becomes a light-emitting layer, and holes are formed by sequentially making electrons a majority carrier. A carrier p-type semiconductor layer (for example, a p-type GaN layer) is formed by crystal film growth.

The sapphire substrate 13 has a thickness of, for example, 100 μm, and the laminated body layer 15 has a thickness of, for example, 5 μm. The laminated body layer 15 is divided into a plurality of predetermined division lines 17 formed in a grid pattern to form a plurality of LED circuits 19. The wafer 11 includes a front surface 11 a on which the LED circuit 19 is formed, and a back surface 11 b on which the sapphire substrate 13 is exposed.

According to the method for manufacturing a light-emitting diode wafer according to the embodiment of the present invention, first, a wafer preparation step of preparing an optical element wafer 11 as shown in FIG. 1 is performed. Further, a transparent substrate processing step is performed. The transparent substrate processing step is to form a plurality of depressions on the front surface 21 a of the transparent substrate 21 to be attached to the back surface 11 b of the wafer 11 corresponding to the LED circuit 19.

In this transparent substrate processing step, for example, as shown in FIG. 2 (A), a mask 2 having a plurality of holes 4 corresponding to the LED circuit 19 of the wafer 11 is used. As shown in FIG. 2 (B), the holes 4 of the mask 2 are attached to the front surface 21 a of the transparent substrate 21 so as to correspond to the LED circuits 19 of the wafer 11.

Then, a triangular recess (corresponding to the shape of the hole 4 of the mask 2 as shown in FIG. 2 (C)) is formed on the front surface 21a of the transparent substrate 21 by wet etching or plasma etching. Recessed part) 5.

It can also be made: by changing the shape of the hole 4 of the mask 2 to a quadrangle or a circle, a rectangular recess 5A as shown in FIG. 2 (D) is formed on the front surface 21a of the transparent substrate 21, or as shown in FIG. 2 A circular recess 5B is formed on the front surface 21a of the transparent substrate 21 as shown in (E).

The transparent substrate 21 is formed of any one of transparent resin, optical glass, sapphire, and transparent ceramic. In this embodiment, the transparent substrate 21 is formed of a transparent resin such as polycarbonate or acrylic which is more durable than optical glass.

As a modification of this embodiment, it is also possible to form the front surface 21a of the transparent substrate 21 by attaching the mask 2 to the front surface 21a of the transparent substrate 21 and then performing sandblasting, as shown in FIG. 2 (C). The triangular depression 5 or the rectangular depression 5A shown in FIG. 2 (D) or the circular depression 5B shown in FIG. 2 (E).

The laser processing device can also be used to form a plurality of depressions corresponding to the LED circuit 19 on the front surface 21 a of the transparent substrate 21. In the embodiment performed by laser processing, as shown in FIG. 3 (A), a laser beam having a wavelength (for example, 266 nm) having an absorptivity to the transparent substrate 21 is intermittently removed from the condenser (laser) (Head) 24 irradiates the front surface 21a of the transparent substrate 21, and feeds a work clamp (not shown) holding the transparent substrate 21 in the direction of arrow X1, thereby ablating the transparent substrate 21 by ablation. The front surface 21 a forms a plurality of depressions 9 corresponding to the LED circuits 19 of the wafer 11.

The transparent substrate 21 is fed in the direction orthogonal to the direction of the arrow X1 at each pitch of the planned division line 17 of the wafer 11, and the front surface 21a of the transparent substrate 21 is subjected to ablation processing to sequentially form a plurality of numbers. Of depression 9. The cross-sectional shape of the depression 9 is generally a circle as shown in FIG. 3 (B) corresponding to the spot shape of the laser beam.

After the transparent substrate processing step is performed, an integration step is performed. The integration step is to attach the front surface 21 a of the transparent substrate 21 to the back surface 11 b of the wafer 11 to form an integrated wafer 25. In this integration step, as shown in FIG. 4 (A), the back surface 11b of the wafer 11 is adhered to the front surface 21a with a plurality of depressions corresponding to the LED circuit 19 of the wafer 11 by a transparent adhesive. As shown in FIG. 4 (B), the front surface 21 a of the transparent substrate 21 of 9 is integrated with the transparent substrate 21 to form an integrated wafer 25.

After the integration step is performed, a support step is performed. The support step is formed by attaching the transparent substrate 21 of the integrated wafer 25 to the dicing tape T whose outer periphery has been attached to the ring frame F as shown in FIG. 5. The frame unit supports the integrated wafer 25 with the ring-shaped frame F through the dicing tape T.

After the supporting step is performed, a dividing step is performed, in which the frame unit is put into a cutting device, and the integrated wafer 25 is cut by the cutting device to be divided into individual light emitting diode wafers. This division step will be described with reference to FIG. 6.

As shown in FIG. 6, the cutting unit 10 of the cutting device includes a main shaft housing 12, a main shaft (not shown) rotatably inserted into the main shaft housing 12, and a cutting blade 14 installed at a front end of the main shaft.

The cutting edge of the cutting blade 14 is formed by, for example, an electroformed grindstone in which diamond abrasive particles are fixed by nickel plating, and the shape of the tip thereof is triangular, quadrangular, or semicircular.

A substantially upper part of the cutting blade 14 is covered with a blade cover (wheel cover) 16. The blade cover 16 is provided with a horizontally elongated one on the back side and the front side of the cutting blade 14. Pairs (only one is shown) of cooling nozzles 18.

In the dividing step, the integrated wafer 25 is attracted and held on the work clamp table 20 of the cutting device via the dicing tape T of the frame unit, and the ring frame F is clamped and fixed by a clamp (not shown).

Then, while cutting the cutter 14 at a high speed in the direction of the arrow R, it cuts into the planned division line 17 of the wafer 11 until the tip of the cutter 14 reaches the dicing tape T, and processes from the cooling nozzle 18 toward the cutter 14 and the wafer 11 Cutting fluid is supplied at a point to process and feed the integrated wafer 25 in the direction of the arrow X1, thereby forming a cutting groove 27 that cuts the wafer 11 and the transparent substrate 21 along the planned division line 17 of the wafer 11.

The cutting unit 10 is fed in increments in the Y-axis direction, and the same cutting groove 27 is successively formed along a predetermined division line 17 extending in the first direction. Next, after the work clamp 20 is rotated by 90 °, the same cut grooves 27 are formed along all the planned division lines 17 that are extended in the second direction orthogonal to the first direction to form the state shown in FIG. 7. Thus, the integrated wafer 25 is divided into the light-emitting diode wafer 31 as shown in FIG. 8.

In the above-mentioned embodiment, the cutting device is used for the light-emitting diode wafer 31 that divides the integrated wafer 25 into individual wafers. However, it is also possible to make the wafer 11 and the transparent substrate 21 transparent. Laser beams of a characteristic wavelength are irradiated toward the wafer 11 along the planned division line 13, and a plurality of modified layers are formed in the thickness direction inside the wafer 11 and the transparent substrate 21, and then the integrated wafer 25 is formed. An external force is applied to divide the integrated wafer 25 into individual light-emitting diode wafers 31 with the reforming layer as a division starting point.

In the light-emitting diode wafer 31 shown in FIG. 8, a transparent member 21A is attached to the back surface of the LED 13A having the LED circuit 19 on the front surface. In addition, depressions 5, 5A, 5B, or depressions 9 are formed on the front surface of the transparent member 21A.

Therefore, in the light-emitting diode wafer 31 shown in FIG. 8, since a recess is formed on the front surface of the transparent member 21A, the surface area of the transparent member 21A is increased. In addition, a part of the light emitted from the LED circuit 19 of the light-emitting diode wafer 31 and incident on the transparent member 21A is refracted into the transparent member 21A after being refracted.

Therefore, when the light is refracted and emitted from the transparent member 21A, the proportion of light whose incident angle at the interface between the transparent member 21A and the air layer is equal to or greater than the critical angle is reduced, and the light emitted from the transparent member 21A is reduced. The amount of light is increased, and the brightness of the light-emitting diode wafer 31 is increased.

2‧‧‧Mask

4‧‧‧ hole

5, 5A, 5B, 9‧‧‧ depression

10‧‧‧ cutting unit

11‧‧‧Optical element wafer (wafer)

11a, 21a‧‧‧ Front

11b‧‧‧Back

12‧‧‧ Spindle housing

13‧‧‧Sapphire substrate

13A‧‧‧LED

14‧‧‧ Cutter

15‧‧‧ Stratified body

16‧‧‧Blade cover

17‧‧‧ divided scheduled line

18‧‧‧ cooling nozzle

19‧‧‧LED circuit

20‧‧‧Work clamp table

21‧‧‧ transparent substrate

21A‧‧‧Transparent member

24‧‧‧ Condenser (laser head)

25‧‧‧Integrated wafer

27‧‧‧ cut off the trench

31‧‧‧light-emitting diode chip

R, X1‧‧‧ arrows

T‧‧‧Cutting Tape

F‧‧‧ ring frame

X, Y, Z‧‧‧ directions

FIG. 1 is a front perspective view of an optical element wafer. FIG. 2 (A) is a perspective view showing a state where a mask having a plurality of holes corresponding to each LED circuit of an optical element wafer is attached to the front surface of a transparent substrate, and FIG. 2 (B) is a mask having been attached FIG. 2 (C) to FIG. 2 (E) are perspective views of the state of the front surface of the transparent substrate, and are partial perspective views showing the shapes of the depressions formed on the front surface of the transparent substrate. FIG. 3 (A) is a perspective view showing a state where a plurality of depressions corresponding to the LED circuits of the optical element wafer are formed on the front surface of the transparent substrate by irradiation of a laser beam, and FIG. 3 (B) is a diagram showing the shape of the depressions Partial perspective view. FIG. 4 (A) is a perspective view showing an integration step of attaching a transparent substrate having a plurality of depressions on the front surface to the back surface of the wafer to form an integration, and FIG. 4 (B) is a perspective view of the integrated wafer. FIG. 5 is a perspective view showing a supporting step of supporting an integrated wafer with a ring frame through a dicing tape. FIG. 6 is a perspective view showing a step of dividing an integrated wafer into light emitting diode wafers. FIG. 7 is a perspective view of the integrated wafer after the dividing step. FIG. 8 is a perspective view of a light emitting diode wafer according to an embodiment of the present invention.

Claims (5)

A method for manufacturing a light-emitting diode wafer. The method for manufacturing a light-emitting diode wafer is characterized by comprising: a wafer preparation step, preparing a wafer, the wafer having a laminated body layer on a transparent substrate for crystal growth, LED circuits are respectively formed in the areas defined by the plurality of predetermined division lines crossing each other on the front side of the multilayer body layer, and the multilayer body layer is formed with a plurality of semiconductor layers including a light-emitting layer; The front surface of the transparent substrate corresponds to each LED circuit of the wafer to form a plurality of depressions; in the integration step, after implementing the transparent substrate processing step, the front surface of the transparent substrate is attached to the back surface of the wafer to form an integration A wafer; and a dividing step, cutting the wafer along with the transparent substrate along the predetermined dividing line to divide the integrated wafer into individual light emitting diode wafers. The method for manufacturing a light-emitting diode wafer according to claim 1, wherein a cross-sectional shape of the depression formed in the transparent substrate processing step is any one of a triangle, a quadrangle, and a circle. The method for manufacturing a light emitting diode wafer according to claim 1, wherein in the transparent substrate processing step, the depression is formed by any one of etching, sandblasting, and laser. The method for manufacturing a light-emitting diode wafer according to claim 1, wherein the transparent substrate is formed of any one of transparent ceramic, optical glass, sapphire, and transparent resin, and in the integration step, the transparent substrate is made of transparent adhesive. Agent to attach to the wafer. A light-emitting diode wafer includes: a light-emitting diode in which an LED circuit is formed on a front surface; and a transparent member attached to a back surface of the light-emitting diode; and the transparent member is attached to the light-emitting diode. A depression is formed on the surface.