TW201808841A - Method for breaking brittle substrate applicable to manufacturing process of flat panel display panels or solar panels by precisely controlling the angle of a breaking section with respect to the surface of a brittle substrate - Google Patents

Method for breaking brittle substrate applicable to manufacturing process of flat panel display panels or solar panels by precisely controlling the angle of a breaking section with respect to the surface of a brittle substrate Download PDF

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TW201808841A
TW201808841A TW106125546A TW106125546A TW201808841A TW 201808841 A TW201808841 A TW 201808841A TW 106125546 A TW106125546 A TW 106125546A TW 106125546 A TW106125546 A TW 106125546A TW 201808841 A TW201808841 A TW 201808841A
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line
crack line
crack
brittle substrate
forming
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TW106125546A
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Chinese (zh)
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曽山浩
佐島徳武
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日商三星鑽石工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222Scoring using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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Abstract

The present invention controls with high precision the angle of a breaking section with respect to the surface of a brittle substrate. A brittle substrate 4 having a first surface SF1 and a second surface SF2 opposite to the first surface SF1 are prepared. By irradiating a laser light having an optical axis LA on the first surface SF1 of the brittle substrate 4, the property of the brittle substrate 4 is partially modified, thereby forming a modified area RA. By moving the front edge of a blade on any one of the first surface SF1 and the second surface SF2 of the brittle substrate 4, a crack line CL is thus formed. The crack line CL is extended through the modified area RA of the brittle substrate 4, so as to form a partitioning surface PS on the brittle substrate 4. The step of forming the modified area RA and the step of forming the crack line CL are performed in a manner that the crack line CL is disposed offset from the optical axis LA of the laser light.

Description

脆性基板之分斷方法 Breaking method of brittle substrate

本發明係關於一種脆性基板之分斷方法。 The invention relates to a method for breaking a brittle substrate.

於平板顯示器面板或太陽電池板等電氣設備之製造中,經常需要對脆性基板進行分斷。於典型之分斷方法中,首先,於脆性基板上形成裂痕線。本說明書中,所謂「裂痕線」,係指於脆性基板之表面上,呈線狀地延伸有已部分深入脆性基板厚度方向之裂痕者。繼而,進行所謂之斷裂步驟。具體而言,藉由對脆性基板施加應力,使裂痕線之裂痕完全深入厚度方向。藉此,脆性基板沿裂痕線而分斷。 In the manufacture of electrical equipment such as flat panel display panels or solar panels, it is often necessary to break the fragile substrate. In a typical breaking method, first, a crack line is formed on a brittle substrate. In the present specification, the "crack line" refers to a person who has a crack extending partially in the thickness direction of the brittle substrate in a linear manner on the surface of the brittle substrate. Then, a so-called breaking step is performed. Specifically, by applying stress to the fragile substrate, the crack of the crack line is completely penetrated into the thickness direction. Thereby, the fragile substrate is broken along the crack line.

根據專利文獻1,於劃線時產生位於玻璃板上表面之凹部。於該專利文獻1中,該凹部被稱為「刻劃線」。又,於刻設該刻劃線之同時,產生自刻劃線向下方最近處延伸之裂痕。如該專利文獻1之技術所見般,於習知之典型技術中,係於形成刻劃線之同時形成裂痕線。 According to Patent Document 1, a recessed portion on the upper surface of a glass plate is generated when scribing. In this patent document 1, this recessed part is called "engraved line". In addition, at the same time as the scribe line is engraved, a crack extending from the scribe line downward to the nearest place is generated. As can be seen from the technique of Patent Document 1, in the conventional typical technique, a scribe line is formed while a crack line is formed.

根據專利文獻2,提出有與上述典型分斷技術顯著不同之分斷技術。根據該技術,首先,藉由刃前緣於脆性基板上之滑動而使其產生塑性變形,從而形成於該專利文獻2中被稱為「刻劃線」之槽形狀。於本說明書中,以下,將該槽形狀者稱作「槽線」。於形成槽線之時刻,未在其 下方形成裂痕。隨後,沿槽線使裂痕伸展,藉此形成裂痕線。即,與典型技術不同,先形成未伴隨裂痕之槽線,隨後再沿槽線形成裂痕線。隨後,沿裂痕線進行通常之斷裂步驟。 According to Patent Document 2, a breaking technique that is significantly different from the typical breaking technique described above is proposed. According to this technique, first, the edge of a blade slides on a brittle substrate to plastically deform it, thereby forming a groove shape called a "engraved line" in Patent Document 2. In this specification, the groove shape is hereinafter referred to as a "groove line". At the time the slot line was formed, A crack formed below. Subsequently, the crack is stretched along the groove line, thereby forming the crack line. That is, unlike the typical technique, a groove line without accompanying cracks is formed first, and then a crack line is formed along the groove line. Subsequently, the usual breaking step is performed along the crack line.

上述專利文獻2之技術中所用之、未伴隨裂痕之槽線,與伴隨裂痕之同時形成的典型之刻劃線相比,可藉由更低負載之刃前緣滑動而形成。因負載小,對刃前緣造成之損傷變小。因而,根據該分斷技術,可延長刃前緣壽命。 The groove line not accompanied by a crack used in the technique of the aforementioned Patent Document 2 can be formed by sliding the leading edge of the blade with a lower load than a typical scribe line formed simultaneously with the crack. Because the load is small, the damage to the leading edge of the blade is reduced. Therefore, according to this breaking technology, the leading edge life can be extended.

多數情形時,於使用裂痕線之脆性基板之分斷中,期望裂痕線於脆性基板中相對於其表面而垂直地伸展。藉此,可獲得垂直於基板表面之分斷面。另一方面,根據所分斷之脆性基板之用途或形狀,有可能期望形成相對於基板表面而傾斜之分斷面。例如,於脆性基板沿閉曲線而分斷之情形時,假設藉由斷裂步驟而形成垂直於基板表面之分斷面,則於斷裂步驟後,易導致難以將閉曲線之內側部分自外側部分抽出。為使其變得容易,必須使分斷面傾斜於基板表面,換言之,必須設置拔模斜度。 In many cases, in the breaking of a brittle substrate using a crack line, it is desirable that the crack line extends vertically in the brittle substrate with respect to its surface. Thereby, a divided surface perpendicular to the substrate surface can be obtained. On the other hand, depending on the use or shape of the divided brittle substrate, it may be desirable to form a divided surface that is inclined with respect to the substrate surface. For example, in the case where the fragile substrate is broken along a closed curve, assuming that a broken surface perpendicular to the substrate surface is formed by the breaking step, it is easy to make it difficult to extract the inner portion of the closed curve from the outer portion after the breaking step. In order to make it easy, it is necessary to incline the cutting surface to the surface of the substrate, in other words, it is necessary to set a draft angle.

根據專利文獻3,為意圖設置拔模斜度,而於玻璃板之一面側,藉由作為切割器之金剛石圓盤鋸,以描繪閉曲線之方式,形成相對於玻璃板之厚度方向而傾斜之切紋。作為使切紋變得傾斜之方法,例示有2種方法。作為第1方法,以傾斜之狀態使用金剛石圓盤鋸。作為第2方法,使用具有非對稱形狀之金剛石圓盤鋸。 According to Patent Document 3, in order to set the draft slope, a diamond disc saw as a cutter is used to draw a closed curve on one side of the glass plate to form a cut inclined to the thickness direction of the glass plate. Pattern. Two methods are exemplified as methods for making the cut lines be inclined. As a first method, a diamond disc saw was used in an inclined state. As a second method, a diamond disc saw having an asymmetric shape is used.

現有技術文獻 Prior art literature

專利文獻 Patent literature

專利文獻1:日本特開平9-188534號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 9-188534

專利文獻2:國際公開第2015/151755號 Patent Document 2: International Publication No. 2015/151755

專利文獻3:日本特開平7-223828號公報 Patent Document 3: Japanese Patent Application Laid-Open No. 7-223828

根據上述專利文獻3之方法,於脆性基板之其中一表面上形成裂痕線時,於該表面附近,可使裂痕線沿所期望之傾斜方向延伸。然而,為對基板進行分斷,必須使裂痕線伸展至基板之相反表面,在此過程中,伸展方向有可能因某些難控制因素而發生變化。因而,有時得不到向所期望之方向傾斜之分斷面。 According to the method of the aforementioned Patent Document 3, when a crack line is formed on one surface of a brittle substrate, the crack line can be extended in a desired inclined direction near the surface. However, in order to break the substrate, the crack line must be stretched to the opposite surface of the substrate. In the process, the stretching direction may change due to some difficult to control factors. Therefore, a sectional surface inclined in a desired direction may not be obtained in some cases.

本發明係為解決如上所述之問題而完成,其目的在於提供一種脆性基板之分斷方法,可精度良好地控制分斷面相對於脆性基板表面之角度。 The present invention is made to solve the problems described above, and an object thereof is to provide a method for breaking a brittle substrate, which can accurately control the angle of the breaking surface with respect to the surface of the brittle substrate.

本發明之脆性基板之分斷方法包含下述步驟:準備具有第1面及與第1面相反之第2面之脆性基板;藉由將具有光軸之雷射光照射至脆性基板之第1面上,使脆性基板局部地變質,藉此形成變質區域;使刃前緣於脆性基板之第1面及第2面之任一者上移動,藉此形成裂痕線;以及使裂痕線經由脆性基板之變質區域而伸展,藉此於脆性基板形成分斷面。形成變質區域之步驟及形成裂痕線之步驟,係以裂痕線自雷射光之光軸偏移地配置之方式而進行。 The method for cutting a fragile substrate of the present invention includes the steps of preparing a fragile substrate having a first surface and a second surface opposite to the first surface; and irradiating laser light having an optical axis to the first surface of the fragile substrate. On the other hand, the brittle substrate is locally deteriorated, thereby forming a deteriorated region; the leading edge of the blade is moved on any of the first surface and the second surface of the brittle substrate, thereby forming a crack line; and the crack line is passed through the brittle substrate. The deformed area is stretched, thereby forming a section on the brittle substrate. The step of forming a deteriorated region and the step of forming a crack line are performed in such a manner that the crack line is offset from the optical axis of the laser light.

根據本發明,藉由將具有光軸之雷射光照射至脆性基板之第1面上,使脆性基板局部地變質,藉此形成變質區域。裂痕線係自雷射光之光軸偏移地配置。藉此,可對脆性基板之第1面微調裂痕線之伸展方向。因而,可控制分斷面相對於脆性基板之第1面之角度。 According to the present invention, a laser light having an optical axis is irradiated onto the first surface of the fragile substrate to locally deteriorate the fragile substrate, thereby forming a deteriorated region. The crack lines are arranged offset from the optical axis of the laser light. Thereby, the extending direction of the crack line can be fine-tuned on the first surface of the brittle substrate. Therefore, the angle of the divided surface with respect to the first surface of the fragile substrate can be controlled.

AL‧‧‧輔助線 AL‧‧‧Auxiliary line

CL‧‧‧裂痕線 CL‧‧‧ Rift Line

LA‧‧‧光軸 LA‧‧‧ Optical axis

PS‧‧‧分斷面 PS‧‧‧ Section

RA‧‧‧變質區域 RA‧‧‧ Metamorphic area

SC‧‧‧掃描方向 SC‧‧‧Scanning direction

SF1‧‧‧上表面(第1面) SF1‧‧‧upper surface (first side)

SF2‧‧‧下表面(第2面) SF2‧‧‧ lower surface (second side)

SP‧‧‧光點 SP‧‧‧ Light Spot

TL‧‧‧槽線 TL‧‧‧Slot

4‧‧‧玻璃基板(脆性基板) 4‧‧‧ glass substrate (brittle substrate)

4i‧‧‧內側部分 4i‧‧‧ inside part

4o‧‧‧外側部分 4o‧‧‧outer part

圖1係概略地表示本發明實施形態1中的脆性基板之分斷方法之構成之流程圖。 FIG. 1 is a flowchart schematically showing the configuration of a method for cutting a fragile substrate in Embodiment 1 of the present invention.

圖2係概略地表示本發明實施形態1中的脆性基板之分斷方法之第1步驟之俯視圖。 FIG. 2 is a plan view schematically showing a first step of a method for cutting a fragile substrate in Embodiment 1 of the present invention.

圖3係沿著圖2之線III-III之概略剖面圖。 FIG. 3 is a schematic cross-sectional view taken along the line III-III of FIG. 2.

圖4係表示為形成圖2之變質區域而使用之雷射光之光點及光軸之例之俯視圖。 FIG. 4 is a plan view showing an example of a light point and an optical axis of laser light used to form the deteriorated region of FIG. 2.

圖5係表示使用圖4之光點之掃描之情形之俯視圖。 FIG. 5 is a plan view showing a case of scanning using the light spot of FIG. 4. FIG.

圖6係表示圖4之光點之、垂直於掃描方向之方向上的強度分佈之例之曲線圖。 FIG. 6 is a graph showing an example of the intensity distribution of the light spot in FIG. 4 in a direction perpendicular to the scanning direction.

圖7係概略地表示本發明之實施形態1中的脆性基板之分斷方法之第2步驟之俯視圖。 FIG. 7 is a plan view schematically showing a second step of the method for cutting a fragile substrate in Embodiment 1 of the present invention.

圖8係沿著圖7之線VIII-VIII之概略剖面圖。 FIG. 8 is a schematic cross-sectional view taken along the line VIII-VIII of FIG. 7.

圖9係概略地表示本發明實施形態1中的脆性基板之分斷方法之第3步驟之俯視圖。 FIG. 9 is a plan view schematically showing the third step of the method for cutting a fragile substrate in Embodiment 1 of the present invention.

圖10係沿著圖9之線X-X之概略剖面圖。 Fig. 10 is a schematic cross-sectional view taken along the line X-X in Fig. 9.

圖11係概略地表示本發明實施形態2中的脆性基板之分斷方法之一步驟之俯視圖。 FIG. 11 is a plan view schematically showing one step of a method for breaking a fragile substrate in Embodiment 2 of the present invention.

圖12係沿著圖11之線XII-XII之概略剖面圖。 FIG. 12 is a schematic cross-sectional view taken along the line XII-XII of FIG. 11.

圖13係概略地表示本發明實施形態2中的脆性基板之分斷方法之一步驟之俯視圖。 FIG. 13 is a plan view schematically showing one step of a method for breaking a fragile substrate in Embodiment 2 of the present invention.

圖14係沿著圖13之線XIV-XIV之概略剖面圖。 FIG. 14 is a schematic cross-sectional view taken along the line XIV-XIV in FIG. 13.

圖15係概略地表示本發明實施形態3中的脆性基板之分斷方法之結構之流程圖。 FIG. 15 is a flowchart schematically showing a configuration of a method for cutting a fragile substrate in Embodiment 3 of the present invention.

圖16係概略地表示本發明實施形態3中的脆性基板之分斷方法之一步驟之俯視圖。 FIG. 16 is a plan view schematically showing one step of a method for breaking a fragile substrate in Embodiment 3 of the present invention.

圖17係沿著圖16之線XVII-XVII之概略剖面圖。 FIG. 17 is a schematic cross-sectional view taken along the line XVII-XVII of FIG. 16.

圖18係概略地表示本發明實施形態2中的脆性基板之分斷方法之一步驟之俯視圖。 FIG. 18 is a plan view schematically showing a step of a method for breaking a fragile substrate in Embodiment 2 of the present invention.

圖19係沿著圖18之線XIX-XIX之概略剖面圖。 FIG. 19 is a schematic cross-sectional view taken along the line XIX-XIX of FIG. 18.

圖20係概略地表示本發明實施形態3之變形例中的脆性基板之分斷方法之第2步驟之俯視圖。 FIG. 20 is a plan view schematically showing a second step of a method for cutting a fragile substrate in a modified example of Embodiment 3 of the present invention.

圖21係概略地表示本發明實施形態3之變形例中的脆性基板之分斷方法之第3步驟之俯視圖。 FIG. 21 is a plan view schematically showing a third step of the method for cutting a fragile substrate in a modification of the third embodiment of the present invention.

圖22係概略地表示本發明實施形態4中的脆性基板之分斷方法之第1步驟之俯視圖。 Fig. 22 is a plan view schematically showing a first step of a method for cutting a fragile substrate in Embodiment 4 of the present invention.

圖23係沿著圖22之線XXIII-XXIII之概略剖面圖。 FIG. 23 is a schematic cross-sectional view taken along the line XXIII-XXIII of FIG. 22.

圖24係概略地表示本發明實施形態4中的脆性基板之分斷方法之第2步驟之俯視圖。 FIG. 24 is a plan view schematically showing a second step of the method for cutting a fragile substrate in Embodiment 4 of the present invention.

圖25係沿著圖24之線XXV-XXV之概略剖面圖。 FIG. 25 is a schematic cross-sectional view taken along the line XXV-XXV in FIG. 24.

圖26係概略地表示本發明實施形態4之變形例中的脆性基板之分斷方法之第1步驟之俯視圖。 Fig. 26 is a plan view schematically showing a first step of a method for cutting a fragile substrate in a modification of the fourth embodiment of the present invention.

圖27係概略地表示本發明實施形態4之變形例中的脆性基板之分斷方法之第2步驟之俯視圖。 Fig. 27 is a plan view schematically showing a second step of the method for cutting a fragile substrate in a modification of the fourth embodiment of the present invention.

圖28係概略地表示本發明實施形態5中的脆性基板之分斷方法之第1步驟之俯視圖。 FIG. 28 is a plan view schematically showing a first step of a method for cutting a fragile substrate in Embodiment 5 of the present invention.

圖29係沿著圖28之線XXIX-XXIX之概略剖面圖。 FIG. 29 is a schematic cross-sectional view taken along the line XXIX-XXIX of FIG. 28.

圖30係表示為形成圖28之變質區域而使用之雷射光之光點及光軸進行掃描之情形之俯視圖。 FIG. 30 is a plan view showing a case where a light spot and an optical axis of laser light used for forming a deteriorated region of FIG. 28 are scanned.

圖31係概略地表示本發明實施形態5中的脆性基板之分斷方法之第2步驟之俯視圖。 Fig. 31 is a plan view schematically showing a second step of the method for cutting a fragile substrate in Embodiment 5 of the present invention.

圖32係沿著圖31之線XXXII-XXXII之概略剖面圖。 FIG. 32 is a schematic cross-sectional view taken along the line XXXII-XXXII of FIG. 31.

圖33係概略地表示本發明實施形態5中的脆性基板之分斷方法之第3步驟之俯視圖。 FIG. 33 is a plan view schematically showing a third step of the method for cutting a fragile substrate in Embodiment 5 of the present invention.

圖34係沿著圖33之線XXXIV-XXXIV之概略剖面圖。 FIG. 34 is a schematic cross-sectional view taken along the line XXXIV-XXXIV of FIG. 33.

圖35係概略地表示本發明實施形態5之變形例中的脆性基板之分斷方法之一步驟之俯視圖。 FIG. 35 is a plan view schematically showing one step of a method for cutting a fragile substrate in a modification of the fifth embodiment of the present invention.

圖36係沿著圖35之線XXXVI-XXXVI之概略剖面圖。 FIG. 36 is a schematic cross-sectional view taken along the line XXXVI-XXXVI of FIG. 35.

圖37係概略地表示本發明實施形態5之變形例中的脆性基板之分斷方 法之一步驟之俯視圖。 Fig. 37 is a schematic view showing a breaking direction of a brittle substrate in a modification of the fifth embodiment of the present invention; Top view of one step of the method.

圖38係沿著圖37之線XXXVIII-XXXVIII之概略剖面圖。 FIG. 38 is a schematic cross-sectional view taken along the line XXXVIII-XXXVIII of FIG. 37.

圖39係概略地表示發明實施形態5中的形成裂痕線之方法之例中之第1步驟之俯視圖。 39 is a plan view schematically showing a first step in an example of a method for forming a crack line in Embodiment 5 of the present invention.

圖40係沿著圖39之線XL-XL之概略剖面圖。 FIG. 40 is a schematic cross-sectional view taken along the line XL-XL of FIG. 39. FIG.

圖41係概略地表示發明實施形態5中的形成裂痕線之方法之例中之第2步驟之俯視圖。 41 is a plan view schematically showing a second step in the example of the method for forming a crack line in Embodiment 5 of the invention.

圖42係沿著圖41之線XLII-XLII之概略剖面圖。 FIG. 42 is a schematic cross-sectional view taken along the line XLII-XLII of FIG. 41. FIG.

圖43係表示形成於玻璃基板上表面上之裂痕線與光軸之間之間隔DS、與裂痕線之伸展路徑之引導量DI各自之定義之剖面圖。 FIG. 43 is a cross-sectional view showing the respective definitions of the interval DS between the crack line and the optical axis formed on the upper surface of the glass substrate, and the guide amount DI of the extension path of the crack line.

圖44係表示形成於玻璃基板下表面上之裂痕線與光軸之間之間隔DS、與裂痕線之伸展路徑之引導量DI各自之定義之剖面圖。 FIG. 44 is a cross-sectional view showing the definitions of the interval DS between the crack line and the optical axis formed on the lower surface of the glass substrate, and the guide amount DI of the extension path of the crack line.

圖45係表示圖43及圖44各自之情形時的、間隔DS與引導量DI之間之關係之實驗結果之曲線圖。 Fig. 45 is a graph showing the experimental results of the relationship between the interval DS and the guide amount DI in the respective cases of Figs. 43 and 44;

以下,基於圖式說明本發明之實施形態。再者,於以下圖式中,對於相同或相當之部分標註相同之參照編號,並不再重複其說明。 Hereinafter, embodiments of the present invention will be described based on the drawings. Moreover, in the following drawings, the same or equivalent parts are marked with the same reference numerals, and the description will not be repeated.

<實施形態1> <Embodiment 1>

以下,對本實施形態中的脆性基板之分斷方法(圖1)進行說明。 Hereinafter, a method for dividing a brittle substrate in this embodiment (FIG. 1) will be described.

參照圖2及圖3,於步驟S20(圖1)中,準備玻璃基板4(脆性基板),該玻璃基板4(脆性基板)具有上表面SF1(第1面)及下 表面SF2(與第1面相反之第2面),且具有垂直於上表面SF1之厚度方向。玻璃基板4例如為無鹼玻璃。玻璃基板4之厚度較佳為0.7mm以下,更佳為0.5mm以下。 2 and FIG. 3, in step S20 (FIG. 1), a glass substrate 4 (brittle substrate) is prepared. The glass substrate 4 (brittle substrate) has an upper surface SF1 (first surface) and a lower surface. The surface SF2 (the second surface opposite to the first surface) has a thickness direction perpendicular to the upper surface SF1. The glass substrate 4 is, for example, an alkali-free glass. The thickness of the glass substrate 4 is preferably 0.7 mm or less, and more preferably 0.5 mm or less.

繼而,於步驟S40(圖1)中,藉由將具有光軸LA之雷射光照射至玻璃基板4之上表面SF1上,從而使玻璃基板4局部地變質。藉此,形成變質區域RA。變質區域RA係於玻璃基板4中,藉由雷射光之瞬間加熱而內部應力有所變化之區域。再者,形成變質區域RA之範圍既可如圖3所示般為玻璃基板4之厚度方向之一部分,或者亦可為遍及玻璃基板4之整個厚度方向。形成變質區域RA之範圍根據玻璃基板4之厚度、雷射光之強度及焦點位置等而變化。 Then, in step S40 (FIG. 1), the laser light having the optical axis LA is irradiated onto the upper surface SF1 of the glass substrate 4, so that the glass substrate 4 is partially deteriorated. Thereby, a deteriorated area RA is formed. The deteriorated area RA is an area in the glass substrate 4 where internal stress changes due to instantaneous heating by laser light. In addition, the range in which the modified region RA is formed may be a part of the thickness direction of the glass substrate 4 as shown in FIG. 3, or may be the entire thickness direction of the glass substrate 4. The range in which the deterioration region RA is formed varies depending on the thickness of the glass substrate 4, the intensity of the laser light, the focal position, and the like.

典型的是,雷射光之照射係藉由使具有光軸LA之光點SP(圖4)如圖5所示般於上表面SF1上沿掃描方向SC進行掃描而進行。此時,最終獲得之變質區域RA之形成中所用之光軸LA(圖2)係瞬間光軸LA(圖4)之集合(換言之,為光軸LA之軌跡)。光點SP例如具有直徑數毫米之圓形形狀。雷射光之掃描例如係藉由使以數kHz之脈衝產生之光點SP,沿掃描方向SC以數十mm/秒之速度移動而進行。參照圖6,典型的是,光軸LA係垂直於掃描方向SC之方向X上的光點SP之強度I之分佈之中心軸。雷射光之輸出例如為數十W左右。若輸出過低,則無法對玻璃基板4給予充分之變質。若輸出過高,則對玻璃基板4造成之損傷將變得過度,亦有時會導致玻璃基板4產生破裂。雷射光例如係由CO2雷射所生成。 Typically, the laser light is irradiated by scanning a light spot SP (FIG. 4) having an optical axis LA on the upper surface SF1 in the scanning direction SC as shown in FIG. 5. At this time, the optical axis LA (FIG. 2) used in the formation of the finally deteriorated region RA is a collection of the instantaneous optical axis LA (FIG. 4) (in other words, the trajectory of the optical axis LA). The light spot SP has, for example, a circular shape with a diameter of several millimeters. The scanning of the laser light is performed, for example, by moving a light spot SP generated by a pulse of several kHz in the scanning direction SC at a speed of several tens of mm / second. Referring to FIG. 6, typically, the optical axis LA is the central axis of the distribution of the intensity I of the light spot SP in the direction X perpendicular to the scanning direction SC. The output of the laser light is, for example, about several tens of W. If the output is too low, the glass substrate 4 cannot be sufficiently modified. If the output is too high, the damage to the glass substrate 4 will become excessive, and the glass substrate 4 may be cracked in some cases. The laser light is generated by, for example, a CO 2 laser.

參照圖7及圖8,於步驟S60(圖1)中,使刃前緣(未圖示)於玻璃基板4之上表面SF1上移動。利用藉由刃前緣移動之機械加工, 形成裂痕線CL。裂痕線CL之形成自身可藉由通常之刻劃方法來進行。前述形成變質區域RA之步驟與形成裂痕線CL之步驟,係以裂痕線CL自雷射光之光軸LA偏移地配置之方式進行。 7 and 8, in step S60 (FIG. 1), the leading edge (not shown) of the blade is moved on the upper surface SF1 of the glass substrate 4. Utilizing machining that moves by the leading edge of the blade, A crack line CL is formed. The formation of the crack line CL itself can be performed by a general scoring method. The aforementioned step of forming the deterioration region RA and the step of forming the crack line CL are performed in such a manner that the crack line CL is offset from the optical axis LA of the laser light.

參照圖9及圖10,於步驟S80(圖1)中,使裂痕線CL經由玻璃基板4之變質區域RA而伸展,藉此,於玻璃基板4形成分斷面PS。即,進行沿裂痕線CL對玻璃基板4進行分斷之斷裂步驟。斷裂步驟可藉由對玻璃基板4施加外力而進行。例如,朝向玻璃基板4之上表面SF1上之裂痕線CL(圖8),將應力施加構件(例如被稱為「斷裂桿」之構件)按壓至下表面SF2上,藉此,對玻璃基板4施加使裂痕線CL之裂痕裂開之應力。再者,於裂痕線CL在該形成時刻(圖8)完全深入厚度方向之情形時,同時產生裂痕線CL之形成與玻璃基板4之分斷。 Referring to FIGS. 9 and 10, in step S80 (FIG. 1), the crack line CL is extended through the modified region RA of the glass substrate 4, thereby forming a split surface PS on the glass substrate 4. That is, a breaking step of breaking the glass substrate 4 along the crack line CL is performed. The breaking step can be performed by applying an external force to the glass substrate 4. For example, toward the crack line CL (FIG. 8) on the upper surface SF1 of the glass substrate 4, a stress-applying member (for example, a member called a “breaking rod”) is pressed onto the lower surface SF2, and the glass substrate 4 is thereby pressed. A stress is applied to crack the crack of the crack line CL. Moreover, when the crack line CL is completely penetrated into the thickness direction at the time of formation (FIG. 8), the formation of the crack line CL and the disconnection of the glass substrate 4 occur at the same time.

根據本發明者之實驗觀察到:裂痕線CL之伸展路徑(圖10之虛線箭頭)受到引導而向光軸LA靠近之現象(參照圖10之實線箭頭)。該現象被認為係起因於變質區域RA之形成時在玻璃基板4中產生之內部應力之分佈而產生者。藉由利用該現象,可對裂痕線CL相對於上表面SF1而伸展之方向(圖10中之伸展方向)進行微調。即,可控制分斷面PS相對於上表面SF1之角度。 According to experiments by the inventors, a phenomenon in which the extension path of the crack line CL (the dotted arrow in FIG. 10) is guided toward the optical axis LA is observed (see the solid arrow in FIG. 10). This phenomenon is considered to be caused by the distribution of the internal stress generated in the glass substrate 4 when the deteriorated region RA is formed. By utilizing this phenomenon, the direction in which the crack line CL extends with respect to the upper surface SF1 (the direction of extension in FIG. 10) can be fine-tuned. That is, the angle of the divided surface PS with respect to the upper surface SF1 can be controlled.

根據後述之實驗結果,裂痕線CL之伸展路徑之引導量係於上表面SF1上的光軸LA與裂痕線CL之間之偏置量(圖7中之光軸LA與裂痕線CL之間之間隔)為最佳值之情形時得到最大化。即,不論偏置量過小抑或是過大,變質區域RA帶來之引導效果皆變小。偏置量之最佳值例如為數百μm左右。裂痕線CL之伸展路徑之引導量可用圖10之實線箭頭方 向上的分斷面PS之尺寸表示,例如為10μm~數十μm左右。 According to the experimental results described below, the guide amount of the extension path of the crack line CL is the offset between the optical axis LA and the crack line CL on the upper surface SF1 (the distance between the optical axis LA and the crack line CL in FIG. 7). The interval is maximized. That is, regardless of whether the offset amount is too small or too large, the guidance effect brought by the deteriorated area RA becomes small. The optimum value of the offset amount is, for example, about several hundred μm. The guide amount of the extension path of the crack line CL can be determined by the solid arrow in FIG. 10 The size of the upward section PS is, for example, about 10 μm to several tens μm.

又,根據本實施形態,變質區域RA及裂痕線CL該兩者係形成於上表面SF1上。藉此,與如後述之實施形態2般,變質區域RA形成於上表面SF1上而裂痕線CL形成於下表面SF2上之情形相比,易使步驟變得容易。 In addition, according to the present embodiment, both the modified region RA and the crack line CL are formed on the upper surface SF1. Thereby, compared with the case where the modified region RA is formed on the upper surface SF1 and the crack line CL is formed on the lower surface SF2 as in the second embodiment described later, steps can be facilitated.

又,根據本實施形態,於形成變質區域RA之後,形成裂痕線CL。藉此,於裂痕線CL之起點附近,換言之,於上表面SF1附近,亦可對裂痕線CL之伸展方向給予變質區域RA帶來之影響。 Moreover, according to this embodiment, a crack line CL is formed after the modified region RA is formed. Thereby, in the vicinity of the starting point of the crack line CL, in other words, near the upper surface SF1, the extension direction of the crack line CL can also influence the deterioration region RA.

再者,作為變形例,亦可於形成裂痕線CL之後,形成變質區域RA,繼而,使裂痕線CL伸展至下表面SF2為止。然而,為使變質區域RA更確實且充分地對裂痕線CL發揮作用,如上所述,較佳為於裂痕線CL之形成前,預先形成變質區域RA。 Furthermore, as a modification, after the crack line CL is formed, a modified region RA is formed, and then the crack line CL is extended to the lower surface SF2. However, in order for the deteriorated region RA to act more reliably and sufficiently on the crack line CL, as described above, it is preferable to form the deteriorated region RA before the formation of the crack line CL.

<實施形態2> <Embodiment 2>

於上述實施形態1中,裂痕線CL係形成於上表面SF1上,但於本實施形態中,係形成於下表面SF2上。以下,對本實施形態中之玻璃基板4之分斷方法進行具體說明。 In the first embodiment, the crack line CL is formed on the upper surface SF1, but in the present embodiment, the crack line CL is formed on the lower surface SF2. Hereinafter, a method for cutting the glass substrate 4 in this embodiment will be specifically described.

首先,與實施形態1同樣地,於玻璃基板4上形成變質區域RA(圖2及圖3)。參照圖11及圖12,繼而,於本實施形態中,藉由使刃前緣於玻璃基板4之下表面SF2上移動而形成裂痕線CL。 First, as in the first embodiment, a modified region RA is formed on the glass substrate 4 (FIGS. 2 and 3). Referring to FIGS. 11 and 12, in this embodiment, the leading edge of the blade is moved on the lower surface SF2 of the glass substrate 4 to form a crack line CL.

參照圖13及圖14,藉由使裂痕線CL經由玻璃基板4之變質區域RA而伸展,從而於玻璃基板4形成分斷面PS。即,進行沿裂痕線CL對玻璃基板4進行分斷之斷裂步驟。斷裂步驟可藉由對玻璃基板4施加 外力而進行。例如,朝向玻璃基板4之下表面SF2上之裂痕線CL(圖12),將應力施加構件(例如被稱為「斷裂桿」之構件)按壓至上表面SF1上,藉此,對玻璃基板4施加使裂痕線CL之裂痕裂開之應力。再者,於裂痕線CL在該形成時刻(圖12之時刻)完全深入厚度方向之情形時,同時產生裂痕線CL之形成與玻璃基板4之分斷。 Referring to FIGS. 13 and 14, the crack line CL is extended through the modified region RA of the glass substrate 4, thereby forming a split surface PS on the glass substrate 4. That is, a breaking step of breaking the glass substrate 4 along the crack line CL is performed. The breaking step can be performed by applying to the glass substrate 4 External force. For example, toward the crack line CL (FIG. 12) on the lower surface SF2 of the glass substrate 4, a stress-applying member (for example, a member called a “break bar”) is pressed onto the upper surface SF1, thereby applying the glass substrate 4 to the glass substrate 4. The stress that cracks the crack of the crack line CL. Furthermore, when the crack line CL completely penetrates the thickness direction at the time of formation (the time in FIG. 12), the formation of the crack line CL and the disconnection of the glass substrate 4 occur at the same time.

根據本發明者之實驗觀察到:裂痕線CL之伸展路徑(圖14之虛線箭頭)欲向光軸LA靠近之現象(參照圖14之實線箭頭)。該現象被認為係起因於變質區域RA之形成時在玻璃基板4中產生之內部應力之分佈而產生。藉由利用該現象,可對裂痕線CL相對於上表面SF1而伸展之方向(圖14中之伸展方向)進行微調。即,可控制分斷面PS相對於上表面SF1之角度。 According to experiments by the present inventors, it is observed that the extension path of the crack line CL (the dotted arrow in FIG. 14) is intended to approach the optical axis LA (refer to the solid arrow in FIG. 14). This phenomenon is considered to be caused by the distribution of the internal stress generated in the glass substrate 4 when the deterioration region RA is formed. By utilizing this phenomenon, the direction in which the crack line CL extends with respect to the upper surface SF1 (the extending direction in FIG. 14) can be fine-tuned. That is, the angle of the divided surface PS with respect to the upper surface SF1 can be controlled.

根據後述之實驗結果,裂痕線CL之伸展路徑之引導量係於下表面SF2上的光軸LA與裂痕線CL之間之偏置量(圖11中之光軸LA與裂痕線CL之間之間隔)為最佳值之情形時得到最大化。即,不論偏置量過小抑或是過大,變質區域RA帶來之引導效果皆變小。偏置量之最佳值例如為數百μm左右。裂痕線CL之伸展路徑之引導量可用圖14之實線箭頭方向上的分斷面PS之尺寸表示,例如為10μm~數十μm左右。 According to the experimental results described later, the amount of guidance of the extension path of the crack line CL is the offset between the optical axis LA and the crack line CL on the lower surface SF2 (the distance between the optical axis LA and the crack line CL in FIG. 11). The interval is maximized. That is, regardless of whether the offset amount is too small or too large, the guidance effect brought by the deteriorated area RA becomes small. The optimum value of the offset amount is, for example, about several hundred μm. The guide amount of the extension path of the crack line CL can be represented by the size of the section PS in the direction of the solid line arrow in FIG. 14, and is, for example, about 10 μm to several tens μm.

又,根據本實施形態,形成變質區域RA之後,形成裂痕線CL。藉此,於裂痕線CL之起點附近,換言之,於下表面SF2附近,亦可對裂痕線CL之伸展方向給予變質區域RA帶來之影響。進而,根據本實施形態,藉由刃前緣於未形成有變質區域RA之下表面SF2上之移動而形成裂痕線CL。藉此,避免因雷射光造成之損傷導致裂痕線CL之品質下降。 Moreover, according to this embodiment, after the modified region RA is formed, a crack line CL is formed. Thereby, in the vicinity of the starting point of the crack line CL, in other words, near the lower surface SF2, the extension direction of the crack line CL can also influence the deterioration region RA. Furthermore, according to the present embodiment, the crack line CL is formed by the movement of the leading edge of the blade on the lower surface SF2 where the deterioration region RA is not formed. Thereby, the degradation of the crack line CL due to the damage caused by the laser light is avoided.

再者,作為變形例,亦可於形成裂痕線CL後,形成變質區域RA,繼而,使裂痕線CL伸展至上表面SF1為止。然而,為使變質區域RA更確實且充分地對裂痕線CL發揮作用,如上所述,較佳為於裂痕線CL之形成前,預先形成變質區域RA。 Furthermore, as a modification, after the crack line CL is formed, a modified region RA is formed, and then the crack line CL is extended to the upper surface SF1. However, in order for the deteriorated region RA to act more reliably and sufficiently on the crack line CL, as described above, it is preferable to form the deteriorated region RA before the formation of the crack line CL.

<實施形態3> <Embodiment 3>

本實施形態中,形成裂痕線CL(圖7及圖8)之方法不同於實施形態1中者。以下,對本實施形態中之玻璃基板4之分斷方法進行具體說明。 In this embodiment, the method of forming the crack line CL (FIGS. 7 and 8) is different from that in the first embodiment. Hereinafter, a method for cutting the glass substrate 4 in this embodiment will be specifically described.

首先,與實施形態1同樣,於步驟S20及S40(圖15)中,準備玻璃基板4,並形成變質區域RA。再者,步驟S40(圖15)亦可於後述之步驟S60(圖15)之後進行。 First, as in the first embodiment, in steps S20 and S40 (FIG. 15), a glass substrate 4 is prepared and a modified region RA is formed. Furthermore, step S40 (FIG. 15) may be performed after step S60 (FIG. 15) described later.

參照圖16及圖17,繼而,於步驟S50(圖15)中,如箭頭(圖16)所示般,使刃前緣於玻璃基板4之上表面SF1(圖17)上移動,藉此使上表面SF1上產生塑性變形。藉此,形成具有槽形狀之槽線TL。該形成步驟係以可獲得無裂痕狀態之方式而進行,該無裂痕狀態係指於槽線TL之下方最近處,玻璃基板4在與槽線TL交叉之方向RT(圖17)上連續地相連之狀態。於無裂痕狀態下,雖藉由塑性變形形成有槽線TL,但未形成沿其之裂痕。為獲得無裂痕狀態,只要避免對刃前緣之過大負載即可。 16 and 17, in step S50 (FIG. 15), as shown by an arrow (FIG. 16), the leading edge of the blade is moved on the upper surface SF1 (FIG. 17) of the glass substrate 4, thereby making Plastic deformation occurs on the upper surface SF1. Thereby, a groove line TL having a groove shape is formed. This forming step is performed in such a manner that a crack-free state can be obtained. The crack-free state refers to the nearest position below the slot line TL, and the glass substrate 4 is continuously connected in the direction RT (FIG. 17) crossing the slot line TL. Of the state. In the crack-free state, although the groove line TL is formed by plastic deformation, no crack is formed along it. In order to obtain a crack-free state, it is only necessary to avoid excessive load on the leading edge of the blade.

槽線TL較佳為僅藉由玻璃基板4之塑性變形而產生,於此情形時,不會產生玻璃基板4上之刨削。為避免刨削,只要不使刃前緣之負載過高即可。藉由無刨削,從而避免於玻璃基板4上產生不想要之微細碎片。然而,通常可容許少許之刨削。 The groove line TL is preferably generated only by plastic deformation of the glass substrate 4. In this case, no planing on the glass substrate 4 occurs. In order to avoid planing, the load on the leading edge of the blade should not be too high. By avoiding planing, unwanted fine fragments are prevented from being generated on the glass substrate 4. However, a small amount of gouging is usually tolerated.

參照圖18及圖19,繼而,於步驟S60(圖15)中,形成裂 痕線CL。該形成步驟係藉由使裂痕自槽線TL伸展而進行。本實施形態中,如圖16所示,係以刃前緣於位置NP處下切玻璃基板4之邊緣而產生的微細破壞作為起點,而如圖18之箭頭所示般開始形成裂痕線CL。 18 and 19, in step S60 (FIG. 15), cracks are formed. Trace CL. This forming step is performed by extending a crack from the groove line TL. In this embodiment, as shown in FIG. 16, the micro-fracture caused by cutting down the edge of the glass substrate 4 at the leading edge of the blade at the position NP is used as a starting point, and as shown by the arrow in FIG.

繼而,於步驟S80(圖15)中,與實施形態1同樣地形成分斷面PS(圖10)。即,玻璃基板4被分斷。 Next, in step S80 (FIG. 15), the terrain component cross section PS (FIG. 10) is the same as that of the first embodiment. That is, the glass substrate 4 is divided.

本實施形態中,亦可獲得與實施形態1同樣之效果。進而,於本實施形態中,如圖17所示般以無裂痕狀態而形成有槽線TL後,如圖19所示,於槽線TL之下方最近處形成裂痕線CL。根據本發明者之研討,藉由該方法,可使沿裂痕線CL之分斷面比實施形態1者更為平滑。 In this embodiment, the same effects as those of the first embodiment can be obtained. Furthermore, in this embodiment, after the slot line TL is formed in a crack-free state as shown in FIG. 17, as shown in FIG. 19, a crack line CL is formed immediately below the slot line TL. According to the study by the present inventors, by this method, the sectional surface along the crack line CL can be made smoother than that in the first embodiment.

再者,本實施形態中之裂痕線CL之形成,考慮係以釋放槽線TL之形成時所產生之內部應力之方式而產生者。該應力釋放之契機並不限定於如上所述之玻璃基板4之邊緣之下切(圖16)。以下,對該觀點下之變形例進行說明。 In addition, the formation of the crack line CL in this embodiment is considered to be generated by releasing internal stress generated when the groove line TL is formed. This opportunity for stress relief is not limited to cutting under the edge of the glass substrate 4 as described above (Fig. 16). Hereinafter, a modified example from this viewpoint will be described.

首先,與實施形態1同樣地,於步驟S20及S40(圖15)中,準備玻璃基板4,形成變質區域RA。再者,步驟S40(圖15)亦可於後述之步驟S60(圖15)之後進行。繼而,參照圖20,於步驟S50(圖15)中,形成槽線TL。不同於前述圖16之步驟,於本變形例中,刃前緣不下切玻璃基板4之邊緣。 First, as in the first embodiment, in steps S20 and S40 (FIG. 15), a glass substrate 4 is prepared to form a modified region RA. Furthermore, step S40 (FIG. 15) may be performed after step S60 (FIG. 15) described later. 20, in step S50 (FIG. 15), a slot line TL is formed. Unlike the aforementioned step of FIG. 16, in this modification, the leading edge of the blade does not cut the edge of the glass substrate 4.

參照圖21,於步驟S60(圖15)中,於玻璃基板4之上表面SF1(圖21所示之面)上,形成與槽線TL交叉之輔助線AL。以此為契機,如圖中箭頭所示,開始形成裂痕線CL。 Referring to FIG. 21, in step S60 (FIG. 15), an auxiliary line AL crossing the groove line TL is formed on the upper surface SF1 (the surface shown in FIG. 21) of the glass substrate 4. Taking this as an opportunity, as shown by the arrow in the figure, a crack line CL starts to form.

於步驟S80(圖15)中,繼而,與實施形態1同樣地,形成 分斷面PS。即,玻璃基板4被分斷。 In step S80 (FIG. 15), it is then formed in the same manner as in the first embodiment. Sectional PS. That is, the glass substrate 4 is divided.

再者,刃前緣於玻璃基板4上之上述移動亦可為滑動及轉動中之任一種。於滑動之情形時,使用被固定於支架之刃前緣(例如鑽石尖)。於轉動之情形時,使用繞支架之軸可旋轉地受到保持之刃前緣(所謂之劃線輪)。在精度良好地管理槽線TL與光軸LA之相對位置之方面,滑動之刃前緣優於轉動之刃前緣。 Moreover, the aforementioned movement of the leading edge of the blade on the glass substrate 4 may be any of sliding and rotating. In the case of sliding, use the front edge of the blade fixed to the bracket (such as a diamond tip). In the case of rotation, a leading edge (so-called scribing wheel) which is rotatably held about the axis of the bracket is used. In terms of accurately managing the relative position of the groove line TL and the optical axis LA, the leading edge of the sliding blade is superior to the leading edge of the rotating blade.

亦可於槽線TL及裂痕線CL之形成後(換言之,於輔助線AL之形成後),形成變質區域RA。藉此,可不受雷射光造成之損傷影響地形成槽線TL,進而,於裂痕線CL之起點附近,亦可對裂痕線CL之伸展方向給予變質區域RA帶來之影響。 After the formation of the groove line TL and the crack line CL (in other words, after the formation of the auxiliary line AL), a modified region RA may be formed. Thereby, the slot line TL can be formed without being affected by the damage caused by the laser light, and further, the vicinity of the starting point of the crack line CL can also influence the extension direction of the crack line CL to bring about the deterioration region RA.

<實施形態4> <Embodiment 4>

於實施形態3(圖16~圖19)及其變形例(圖20及圖21)之各者中,槽線TL及裂痕線CL係形成於上表面SF1上。與此相對,於本實施形態(圖22~圖25)及其變形例(圖26及圖27)中,槽線TL及裂痕線CL係形成於下表面SF2上。 In each of the third embodiment (FIGS. 16 to 19) and its modification (FIGS. 20 and 21), the groove line TL and the crack line CL are formed on the upper surface SF1. On the other hand, in this embodiment (FIGS. 22 to 25) and its modifications (FIGS. 26 and 27), the groove line TL and the crack line CL are formed on the lower surface SF2.

再者,上述以外之結構係與上述實施形態3或其變形例之結構大致相同,因此對於相同或對應之要素標註相同之符號,並不再重複其說明。 In addition, the structure other than the above is substantially the same as that of the third embodiment or its modification, and therefore the same or corresponding elements are denoted by the same symbols, and the description thereof will not be repeated.

<實施形態5> <Embodiment 5>

參照圖28及圖29,於本實施形態中,形成變質區域RA之步驟係以光軸LA於玻璃基板4之上表面SF1上具有曲線部之方式而進行。更具體而言,形成變質區域RA之步驟,係以光軸LA於玻璃基板4之上表面SF1上 呈閉曲線之方式而進行。典型的是,雷射光之照射係如圖30所示,藉由具有光軸LA的光點SP於上表面SF1上沿掃描方向SC進行掃描而進行。此時,最終獲得之變質區域RA之形成中所用之光軸LA(圖28)係瞬間之光軸LA(圖30)之集合(換言之,為光軸LA之軌跡)。 Referring to FIGS. 28 and 29, in the present embodiment, the step of forming a modified region RA is performed in such a manner that the optical axis LA has a curved portion on the upper surface SF1 of the glass substrate 4. More specifically, the step of forming the deterioration region RA is based on the optical axis LA on the upper surface SF1 of the glass substrate 4. This is done in a closed curve. Typically, the laser light is irradiated as shown in FIG. 30 by scanning the light spot SP having the optical axis LA on the upper surface SF1 in the scanning direction SC. At this time, the optical axis LA (FIG. 28) used in the formation of the metamorphic region RA finally obtained is a set of instantaneous optical axis LA (FIG. 30) (in other words, the trajectory of the optical axis LA).

參照圖31及圖32,於本實施形態中,形成裂痕線CL之步驟,係以裂痕線CL於玻璃基板4之上表面SF1上具有曲線部之方式而進行。更具體而言,形成裂痕線CL之步驟,係以裂痕線CL於玻璃基板4之上表面SF1上呈閉曲線之方式而進行。 Referring to FIGS. 31 and 32, in this embodiment, the step of forming the crack line CL is performed in such a manner that the crack line CL has a curved portion on the upper surface SF1 of the glass substrate 4. More specifically, the step of forming the crack line CL is performed so that the crack line CL forms a closed curve on the upper surface SF1 of the glass substrate 4.

本實施形態中,形成變質區域RA之步驟及形成裂痕線CL之步驟,係以於俯視(圖31)時,光軸LA較裂痕線CL之閉曲線配置於外側之方式而進行。光軸LA可如圖31所示,具有將裂痕線CL之閉曲線放大之形狀。再者,如實施形態1中所說明般,變質區域RA及裂痕線CL之形成順序為任意。 In this embodiment, the step of forming the metamorphic region RA and the step of forming the crack line CL are performed such that the optical axis LA is disposed outside the closed curve of the crack line CL in a plan view (FIG. 31). The optical axis LA may have a shape in which the closed curve of the crack line CL is enlarged as shown in FIG. 31. In addition, as described in the first embodiment, the formation order of the modified region RA and the crack line CL is arbitrary.

參照圖33及圖34,藉由使裂痕線CL伸展,從而於玻璃基板4形成分斷面PS。即,進行沿裂痕線CL對玻璃基板4進行分斷之斷裂步驟。所形成之分斷面PS如圖34所示,藉由變質區域RA之作用,自下表面SF2朝向上表面SF1而具有錐形形狀。 Referring to FIGS. 33 and 34, the crack line CL is extended to form a split surface PS on the glass substrate 4. That is, a breaking step of breaking the glass substrate 4 along the crack line CL is performed. As shown in FIG. 34, the formed section PS has a tapered shape from the lower surface SF2 toward the upper surface SF1 by the action of the altered region RA.

再者,上述以外之結構係與上述實施形態1之結構大致相同,因此對於相同或對應之要素標註相同之符號,並不再重複其說明。 In addition, the structure other than the above is substantially the same as that of the first embodiment, so the same or corresponding elements are denoted by the same symbols, and the description thereof will not be repeated.

根據本實施形態,於分斷面PS(圖34)之形成後,使外側部分4o與內側部分4i彼此分離時,錐形形狀(圖34)作為拔模斜度發揮作用。藉此,可自外側部分4o容易地取出內側部分4i。 According to this embodiment, when the outer portion 4o and the inner portion 4i are separated from each other after the formation of the sectional surface PS (FIG. 34), the tapered shape (FIG. 34) functions as the draft angle. Thereby, the inner portion 4i can be easily taken out from the outer portion 4o.

又,與後述之變形例相比,可抑制變質區域RA於內側部分4i中所占之比例。此於欲抑制雷射光對內側部分4i造成之損傷之影響之情形時有用。 In addition, compared with the modification described later, the proportion of the deteriorated area RA in the inner portion 4i can be suppressed. This is useful when it is desired to suppress the influence of the laser light on the damage caused by the inner portion 4i.

繼而,以下對變形例進行說明。 Next, modifications will be described below.

參照圖35及圖36,本變形例中,形成變質區域RA之步驟及形成裂痕線CL之步驟,係以於俯視(圖35)時,光軸LA較裂痕線CL之閉曲線配置於內側之方式而進行。光軸LA可如圖35所示,具有將裂痕線CL之閉曲線縮小之形狀。 Referring to FIG. 35 and FIG. 36, in this modification, the step of forming a modified region RA and the step of forming a crack line CL are such that the optical axis LA is disposed inside the closed curve of the crack line CL in a plan view (FIG. 35). And proceed. The optical axis LA may have a shape that reduces the closed curve of the crack line CL as shown in FIG. 35.

參照圖37及圖38,藉由使裂痕線CL伸展,從而於玻璃基板4形成分斷面PS。即,進行沿裂痕線CL對玻璃基板4進行分斷之斷裂步驟。所形成之分斷面PS如圖38所示,藉由變質區域RA之作用,自上表面SF1朝向下表面SF2具有錐形形狀。 Referring to FIGS. 37 and 38, the crack line CL is extended to form a split surface PS on the glass substrate 4. That is, a breaking step of breaking the glass substrate 4 along the crack line CL is performed. As shown in FIG. 38, the formed sectional surface PS has a tapered shape from the upper surface SF1 to the lower surface SF2 by the action of the metamorphic region RA.

根據本變形例,藉由錐形形狀作為拔模斜度發揮作用,亦可自外側部分4o容易地取出內側部分4i。進而,與前述之本實施形態相比,可抑制變質區域RA於外側部分4o中所占之比例。此於欲抑制雷射光對外側部分4o造成之損傷之影響之情形時有用。 According to this modification, the tapered shape functions as the draft slope, and the inner portion 4i can be easily taken out from the outer portion 4o. Furthermore, compared with this embodiment described above, the proportion of the deteriorated area RA in the outer portion 4o can be suppressed. This is useful when it is desired to suppress the influence of the laser light on the damage caused by the outer portion 4o.

本實施形態及其變形例中之裂痕線CL之形成方法為任意,但亦可如實施形態3中所說明般,於形成槽線TL後,使用其形成裂痕線CL。以下,對該方法之一例進行說明。 The method for forming the crack line CL in this embodiment and its modification is arbitrary, but as described in the third embodiment, after forming the groove line TL, the crack line CL may be formed using it. An example of this method will be described below.

參照圖39及圖40,如圖中箭頭所示,藉由使刃前緣(未圖示)於上表面SF1上移動,從而以位置NQ作為起點及終點而形成槽線TL。當刃前緣返回位置NQ時,藉由刃前緣對已形成之槽線TL施加力。 Referring to FIG. 39 and FIG. 40, as shown by the arrows in the figure, the slot line TL is formed by moving the leading edge (not shown) of the blade on the upper surface SF1 with the position NQ as a starting point and an ending point. When the leading edge of the blade returns to the position NQ, a force is applied to the formed groove line TL by the leading edge of the blade.

參照圖41及圖42,以上述力之施加為契機,於槽線TL之形成時產生之內部應力被釋放。藉此,如圖中箭頭所示,沿與槽線TL之形成方向相反之方向形成裂痕線CL。 Referring to FIG. 41 and FIG. 42, with the application of the above-mentioned force as an opportunity, the internal stress generated when the slot line TL is formed is released. Thereby, as shown by an arrow in the figure, a crack line CL is formed in a direction opposite to the formation direction of the groove line TL.

再者,本實施形態中,與實施形態1同樣地,於上表面SF1上形成裂痕線CL,但裂痕線CL亦可與實施形態2同樣地形成於下表面SF2上。 Moreover, in this embodiment, the crack line CL is formed in the upper surface SF1 similarly to Embodiment 1, but the crack line CL may be formed in the lower surface SF2 similarly to Embodiment 2.

[實施例] [Example]

參照圖43,作為第1實驗,藉由實施形態1中說明之方法,形成分斷面PS。上表面SF1上之光軸LA與裂痕線CL之間之間隔DS係設為0mm、0.3mm、0.5mm及0.7mm。藉由對所獲得之分斷面PS之表面分佈進行測定,調查裂痕線CL之伸展路徑之引導量DI。 Referring to Fig. 43, as a first experiment, a split PS is formed by the method described in the first embodiment. The intervals DS between the optical axis LA and the crack line CL on the upper surface SF1 are set to 0 mm, 0.3 mm, 0.5 mm, and 0.7 mm. By measuring the surface distribution of the obtained sectional plane PS, the guide amount DI of the extension path of the crack line CL is investigated.

參照圖44,作為第2實驗,藉由實施形態2中說明之方法,形成分斷面PS。下表面SF2上之光軸LA與裂痕線CL之間之間隔DS係設為0mm、0.3mm、0.5mm及0.7mm。藉由對所獲得之分斷面PS之表面分佈進行測定,調查裂痕線CL之伸展路徑之引導量DI。 Referring to FIG. 44, as a second experiment, the split surface PS is formed by the method described in the second embodiment. The interval DS between the optical axis LA and the crack line CL on the lower surface SF2 is set to 0 mm, 0.3 mm, 0.5 mm, and 0.7 mm. By measuring the surface distribution of the obtained sectional plane PS, the guide amount DI of the extension path of the crack line CL is investigated.

再者,於第1及第2實驗之兩者中,作為玻璃基板4,使用厚度0.3mm之無鹼玻璃。作為用於形成變質區域RA之雷射,使用輸出71W、脈衝頻率5kHz之CO2雷射。雷射光之光點係設為直徑4mm之圓形形狀。光點於玻璃基板4上之掃描速度係設為60mm/秒。 In both of the first and second experiments, as the glass substrate 4, an alkali-free glass having a thickness of 0.3 mm was used. As the laser for forming the deterioration region RA, a CO2 laser having an output of 71 W and a pulse frequency of 5 kHz was used. The laser light spot is a circular shape with a diameter of 4 mm. The scanning speed of the light spot on the glass substrate 4 was set to 60 mm / second.

參照圖45,將第1及第2實驗各自之結果示於曲線圖E1及E2。與間隔DS為零之情況相比,間隔DS大於零之情形者,引導量DI變大。引導量DI之最大值係於間隔DS=0.5mm時獲得。 The results of each of the first and second experiments are shown in graphs E1 and E2 with reference to FIG. 45. Compared with the case where the interval DS is zero, when the interval DS is larger than zero, the guide amount DI becomes larger. The maximum value of the guide amount DI is obtained at an interval DS = 0.5 mm.

再者,於使掃描速度更慢之情形時,玻璃基板4有時會發生破裂。推測其理由係因為:因雷射光之照射而入射至玻璃基板4之每單位面積之總能量變得過剩。又,於使掃描速度更快之情形時,所獲得之引導量DI之最大值變得更小。推測其理由係因為:因雷射光之照射而產生之玻璃基板4中之內部應力變化變小。 When the scanning speed is made slower, the glass substrate 4 may be cracked. The reason is presumably because the total energy per unit area incident on the glass substrate 4 due to the irradiation of the laser light becomes excessive. When the scanning speed is made faster, the maximum value of the obtained guide amount DI becomes smaller. The reason is presumably because the internal stress change in the glass substrate 4 caused by the irradiation of the laser light is small.

再者,於上述各實施形態中,對使用玻璃基板4作為脆性基板之情形進行了說明,但脆性基板亦可由玻璃以外之脆性材料所製作,例如可由陶瓷、矽、化合物半導體、藍寶石或石英所製作。 Furthermore, in each of the embodiments described above, the case where the glass substrate 4 is used as a brittle substrate has been described. However, the brittle substrate may be made of a brittle material other than glass, for example, ceramic, silicon, compound semiconductor, sapphire, or quartz Production.

4‧‧‧玻璃基板 4‧‧‧ glass substrate

CL‧‧‧裂痕線 CL‧‧‧ Rift Line

LA‧‧‧光軸 LA‧‧‧ Optical axis

PS‧‧‧分斷面 PS‧‧‧ Section

RA‧‧‧變質區域 RA‧‧‧ Metamorphic area

SF1‧‧‧上表面 SF1‧‧‧upper surface

SF2‧‧‧下表面 SF2‧‧‧ lower surface

Claims (6)

一種脆性基板之分斷方法,具備下述步驟:準備具有第1面、及與上述第1面相反之第2面之脆性基板之步驟;藉由將具有光軸之雷射光照射至上述脆性基板之上述第1面上,使上述脆性基板局部地變質,藉此形成變質區域之步驟;使刃前緣於上述脆性基板之上述第1面及上述第2面之任一者上移動,藉此形成裂痕線之步驟;以及使上述裂痕線經由上述脆性基板之上述變質區域而伸展,藉此於上述脆性基板形成分斷面之步驟,上述形成變質區域之步驟及上述形成裂痕線之步驟,係以上述裂痕線自上述雷射光之光軸偏移地配置之方式而進行。 A method for breaking a fragile substrate includes the steps of preparing a fragile substrate having a first surface and a second surface opposite to the first surface; and irradiating laser light having an optical axis to the fragile substrate. On the first surface, partially deforming the fragile substrate to form a deteriorated region; and moving a leading edge of the blade on any of the first surface and the second surface of the fragile substrate, thereby The step of forming a crack line; and the step of extending the crack line through the deformed region of the brittle substrate, thereby forming a section on the brittle substrate, the step of forming a deformed region, and the step of forming a crack line, are This is performed so that the crack line is offset from the optical axis of the laser light. 如申請專利範圍第1項之脆性基板之分斷方法,其中,上述形成裂痕線之步驟係藉由使刃前緣於上述脆性基板之上述第1面上移動而進行。 For example, the method for breaking a brittle substrate according to item 1 of the application, wherein the step of forming a crack line is performed by moving a leading edge of the blade on the first surface of the brittle substrate. 如申請專利範圍第1項之脆性基板之分斷方法,其中,上述形成裂痕線之步驟係藉由使刃前緣於上述脆性基板之上述第2面上移動而進行。 For example, the method for breaking a brittle substrate according to the first patent application range, wherein the step of forming a crack line is performed by moving a leading edge of the blade on the second surface of the brittle substrate. 如申請專利範圍第1至3項中任一項之脆性基板之分斷方法,其中,於上述形成裂痕線之步驟之前,具備藉由使刃前緣於上述脆性基板上移動而使其產生塑性變形,藉此形成具有槽形狀之槽線之步驟,上述形成槽線之步驟係以可獲得於上述槽線之下方最近處,上述脆性基板在與上述槽線交叉之方向上連續地相連之狀態之無裂痕狀態之方式而進 行,上述形成裂痕線之步驟,係藉由自上述槽線使裂痕伸展而進行。 According to the method for breaking a brittle substrate according to any one of claims 1 to 3, before the step of forming a crack line, it is provided that the edge of the blade is moved to the brittle substrate to make it plastic. Deformation, thereby forming a groove-shaped groove line. The above-mentioned step of forming the groove line is obtained in a state where the fragile substrate is continuously connected in a direction intersecting the groove line. Advance in a crack-free manner Yes, the step of forming a crack line is performed by extending the crack from the groove line. 如申請專利範圍第1至4項中任一項之脆性基板之分斷方法,其中,上述形成裂痕線之步驟係以上述裂痕線於上述脆性基板上具有曲線部之方式而進行。 For example, the method for breaking a brittle substrate according to any one of claims 1 to 4, wherein the step of forming a crack line is performed in such a manner that the crack line has a curved portion on the brittle substrate. 如申請專利範圍第1至5項中任一項之脆性基板之分斷方法,其中,上述形成裂痕線之步驟係以上述裂痕線於上述脆性基板上呈閉曲線之方式而進行。 For example, the method for breaking a brittle substrate according to any one of claims 1 to 5, wherein the step of forming a crack line is performed in such a manner that the crack line forms a closed curve on the brittle substrate.
TW106125546A 2016-07-28 2017-07-28 Method for breaking brittle substrate applicable to manufacturing process of flat panel display panels or solar panels by precisely controlling the angle of a breaking section with respect to the surface of a brittle substrate TW201808841A (en)

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