TW201738005A - 洗淨方法及洗淨液、以及洗淨裝置 - Google Patents

洗淨方法及洗淨液、以及洗淨裝置 Download PDF

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Publication number
TW201738005A
TW201738005A TW106110356A TW106110356A TW201738005A TW 201738005 A TW201738005 A TW 201738005A TW 106110356 A TW106110356 A TW 106110356A TW 106110356 A TW106110356 A TW 106110356A TW 201738005 A TW201738005 A TW 201738005A
Authority
TW
Taiwan
Prior art keywords
detergent
side wall
cleaned
cleaning
light source
Prior art date
Application number
TW106110356A
Other languages
English (en)
Chinese (zh)
Inventor
松井新吾
Original Assignee
德山股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2016064488A external-priority patent/JP6266680B2/ja
Priority claimed from JP2016160431A external-priority patent/JP6316887B2/ja
Application filed by 德山股份有限公司 filed Critical 德山股份有限公司
Publication of TW201738005A publication Critical patent/TW201738005A/zh

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW106110356A 2016-03-28 2017-03-28 洗淨方法及洗淨液、以及洗淨裝置 TW201738005A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016064488A JP6266680B2 (ja) 2016-03-28 2016-03-28 洗浄方法および洗浄液
JP2016160431A JP6316887B2 (ja) 2016-08-18 2016-08-18 洗浄装置

Publications (1)

Publication Number Publication Date
TW201738005A true TW201738005A (zh) 2017-11-01

Family

ID=59965797

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106110356A TW201738005A (zh) 2016-03-28 2017-03-28 洗淨方法及洗淨液、以及洗淨裝置

Country Status (2)

Country Link
TW (1) TW201738005A (ja)
WO (1) WO2017170595A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12017257B2 (en) 2021-06-23 2024-06-25 SCREEN Holdings Co., Ltd. Substrate cleaning device and substrate cleaning method

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7095613B2 (ja) * 2019-01-31 2022-07-05 株式会社Jvcケンウッド 洗浄装置及び洗浄方法
JP7120067B2 (ja) * 2019-02-13 2022-08-17 株式会社Jvcケンウッド 洗浄装置及び洗浄方法
US11798799B2 (en) 2021-08-09 2023-10-24 Applied Materials, Inc. Ultraviolet and ozone clean system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07114191B2 (ja) * 1990-11-14 1995-12-06 株式会社荏原総合研究所 洗浄方法
JP2001300455A (ja) * 2000-02-15 2001-10-30 Mejiro Precision:Kk 被洗浄体の洗浄方法及び装置
JP2003337432A (ja) * 2002-05-20 2003-11-28 Tsukuba Semi Technology:Kk 機能水を使ったレジスト除去方法、およびその装置
JP5354643B2 (ja) * 2008-05-20 2013-11-27 サムコ株式会社 ドライ洗浄装置及びドライ洗浄方法
KR101046335B1 (ko) * 2008-07-29 2011-07-05 피에스케이 주식회사 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법
JP2010129837A (ja) * 2008-11-28 2010-06-10 Espec Corp レジストの除去方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12017257B2 (en) 2021-06-23 2024-06-25 SCREEN Holdings Co., Ltd. Substrate cleaning device and substrate cleaning method

Also Published As

Publication number Publication date
WO2017170595A1 (ja) 2017-10-05

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