TW201737397A - Bonding apparatus, bonding system and bonding method wherein the adhering device includes a lamination room and an adhering device of an adhering room - Google Patents
Bonding apparatus, bonding system and bonding method wherein the adhering device includes a lamination room and an adhering device of an adhering room Download PDFInfo
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- TW201737397A TW201737397A TW105142287A TW105142287A TW201737397A TW 201737397 A TW201737397 A TW 201737397A TW 105142287 A TW105142287 A TW 105142287A TW 105142287 A TW105142287 A TW 105142287A TW 201737397 A TW201737397 A TW 201737397A
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- 238000003475 lamination Methods 0.000 title claims abstract description 6
- 238000000034 method Methods 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims abstract description 196
- 239000000853 adhesive Substances 0.000 claims description 63
- 230000001070 adhesive effect Effects 0.000 claims description 63
- 238000012546 transfer Methods 0.000 claims description 37
- 239000012790 adhesive layer Substances 0.000 claims description 26
- 238000003825 pressing Methods 0.000 claims description 24
- 230000002093 peripheral effect Effects 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000002344 surface layer Substances 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 19
- 125000006850 spacer group Chemical group 0.000 description 35
- 235000012431 wafers Nutrition 0.000 description 21
- 238000003384 imaging method Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 12
- 238000012545 processing Methods 0.000 description 8
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- 238000010030 laminating Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
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- 230000001678 irradiating effect Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
本發明係關於黏貼裝置、黏貼系統、及黏貼方法。 The present invention relates to an adhesive device, an adhesive system, and a pasting method.
伴隨行動電話、數位AV機器及IC卡等的高功能化,因將所裝載的半導體矽晶片(以下為晶片)小型化及薄板化,在封裝體內將晶片高集積化的要求日益增高。為了實現封裝體內的晶片的高集積化,必須將晶片的厚度減薄至25~150μm的範圍。 With the increase in the functionality of mobile phones, digital AV devices, and IC cards, the semiconductor wafers (hereinafter referred to as wafers) are miniaturized and thinned, and the demand for high-concentration of wafers in the package is increasing. In order to achieve high integration of the wafer in the package, the thickness of the wafer must be reduced to a range of 25 to 150 μm.
但是,成為晶片基座的半導體晶圓(以下為晶圓)係藉由研削而被薄化,其強度變弱,容易在晶圓產生裂痕或翹曲。此外,由於難以自動搬送因薄板化而強度變弱的晶圓,因此必須藉由人力搬送,其處理較為繁雜。 However, the semiconductor wafer (hereinafter referred to as a wafer) which becomes a wafer pedestal is thinned by grinding, and the strength thereof is weak, and it is easy to cause cracks or warpage in the wafer. Further, since it is difficult to automatically transfer a wafer whose strength is weakened by thinning, it is necessary to carry out manpower transportation, and the processing thereof is complicated.
因此,開發出一種晶圓支承系統,其係在進行研削的晶圓貼合被稱為支承板之由玻璃或硬質塑膠等所成之板件,藉此保持晶圓的強度,防止裂痕發生及晶圓翹曲。由於可藉由晶圓支承系統來維持晶圓的強度,因此可 將經薄板化的半導體晶圓的搬送自動化。 Therefore, a wafer support system has been developed in which a wafer to be ground is bonded to a plate made of glass or hard plastic called a support plate, thereby maintaining the strength of the wafer and preventing cracks from occurring. Wafer warpage. Since the wafer support system can maintain the strength of the wafer, The transfer of the thinned semiconductor wafer is automated.
晶圓與支承板係使用黏著帶、含有熱可塑性樹脂的接著劑等而相貼合。在將黏貼有支承板的晶圓薄板化之後,在將晶圓切割之前,將支承板由基板剝離。 The wafer and the support plate are bonded together using an adhesive tape, an adhesive containing a thermoplastic resin, or the like. After the wafer to which the support plate is pasted is thinned, the support plate is peeled off from the substrate before the wafer is cut.
在此,圖求一種可使支持體與基板貼合的貼合精度提升的黏貼裝置等。 Here, an adhesive device or the like which can improve the bonding precision of the support body and the substrate can be obtained.
在專利文獻1係記載一種接合裝置,其係將基板彼此接合的接合裝置,其特徵為:具有:在下面保持第1基板的第1保持部;被設在前述第1保持部的下方,在上面保持第2基板的第2保持部;使前述第1保持部或前述第2保持部相對地朝水平方向及鉛直方向移動的移動機構;設在前述第1保持部,對被保持在前述第2保持部的第2基板進行攝像的第1攝像部;及設在前述第2保持部,對被保持在前述第1保持部的第1基板進行攝像的第2攝像部,至少前述第1攝像部或前述第2攝像部係具備有紅外線攝影機。 Patent Document 1 discloses a bonding apparatus that is a bonding apparatus that bonds substrates to each other, and has a first holding portion that holds a first substrate on a lower surface, and is provided below the first holding portion. a second holding portion that holds the second substrate; a moving mechanism that moves the first holding portion or the second holding portion in a horizontal direction and a vertical direction; and the first holding portion is held in the first a first imaging unit that captures the second substrate of the holding unit, and a second imaging unit that images the first substrate held by the first holding unit, and at least the first imaging unit. The second camera unit or the second imaging unit is provided with an infrared camera.
在專利文獻2係記載一種接合裝置,其係將基板彼此接合的接合裝置,其特徵為:具有:用以收容第1基板與第2基板且相接合的處理容器;在前述處理容器的內部,被固定設在該處理容器,在下面保持第1基板的第1保持部;在前述處理容器的內部,被設在前述第1保持部的下方,在上面保持第2基板的第2保持部;使前述第2保持部朝水平方向及鉛直方向移動的移動機構;被設在前述第1保持部,對被保持在前述第2保持部的第2基 板的表面進行攝像的第1攝像部;及被設在前述第2保持部,對被保持在前述第1保持部的第1基板的表面進行攝像的第2攝像部。 Patent Document 2 discloses a bonding apparatus that is a bonding apparatus that bonds substrates to each other, and has a processing container for accommodating a first substrate and a second substrate, and a processing container that is joined to the processing container. The first holding portion of the first substrate is fixed to the processing container, and the first holding portion of the first substrate is provided below the first holding portion, and the second holding portion of the second substrate is held on the upper surface; a moving mechanism that moves the second holding portion in the horizontal direction and the vertical direction; the first holding portion is provided to the second base held by the second holding portion A first imaging unit that images the surface of the plate; and a second imaging unit that is provided in the second holding unit and that images the surface of the first substrate held by the first holding unit.
[專利文獻1]日本特開2015-18920號公報(2015年1月29日公開) [Patent Document 1] Japanese Laid-Open Patent Publication No. 2015-18920 (published on January 29, 2015)
[專利文獻2]日本特開2015-18919號公報(2015年1月29日公開) [Patent Document 2] Japanese Laid-Open Patent Publication No. 2015-18919 (published on January 29, 2015)
但是,在專利文獻1及2所記載之黏貼裝置中,對基板及支持體的各個,藉由2個攝像部個別進行攝像,藉此特定基板及支持體的位置且進行黏貼。因此,因每個攝像部的位置特定精度的不同,有基板及支持體的對位精度降低之虞。 However, in the pasting apparatus described in the patent documents 1 and 2, each of the substrate and the support is imaged by the two imaging units, and the position of the substrate and the support is specified and adhered. Therefore, the alignment accuracy of the substrate and the support is lowered due to the difference in position specific accuracy of each imaging unit.
此外,在將基板與支持體相黏貼的黏貼裝置之疊合部中,可以高精度將基板與支持體相疊合的新穎的黏貼裝置係有用於用以以高精度連續製造積層體。 Further, in the overlapping portion of the pasting device which adheres the substrate to the support, a novel pasting device which can superimpose the substrate and the support with high precision is used for continuously manufacturing the laminated body with high precision.
本發明係鑑於前述問題點而完成者,其目的在提供可將基板及支持體以高精度相疊合、黏貼的新穎的 黏貼裝置及其關連技術。 The present invention has been made in view of the above problems, and an object thereof is to provide a novel one in which a substrate and a support can be superimposed and adhered with high precision. Adhesive devices and their associated technology.
為解決上述課題,本發明之黏貼裝置係具備有:將基板、與支持上述基板的支持體相疊合的疊合部;及黏貼相疊合的上述基板與上述支持體的黏貼部,該黏貼裝置之特徵為:上述疊合部係具備有:複數位置偵測部,其係偵測上述基板及上述支持體的各個中的外周端部的位置,求出上述基板及上述支持體的各個中的中心點;及位置調整部,其係根據上述中心點的位置,調整上述基板及上述支持體的各個的平面方向中的位置,將經位置調整的上述基板與上述支持體相疊合。 In order to solve the above problems, the pasting device of the present invention includes: a stacking portion that overlaps a substrate and a support that supports the substrate; and an adhesive portion of the substrate and the support that are pasted and adhered to each other. The apparatus is characterized in that the overlapping portion includes a plurality of position detecting portions that detect positions of outer peripheral ends of the substrate and the support, and determine the respective substrates and the support. And a position adjustment unit that adjusts a position in a planar direction of each of the substrate and the support according to a position of the center point, and superimposes the position-adjusted substrate on the support.
此外,本發明之黏貼方法係具備有:將基板、及支持上述基板的支持體,在疊合部內相疊合的疊合工程;及將相疊合的上述基板與上述支持體,在黏貼部內進行黏貼的黏貼工程的黏貼方法,其特徵為:上述疊合工程係包含:位置偵測階段,其係偵測上述基板及上述支持體的各個中的外周端部的位置,求出上述基板及上述支持體的各個中的中心點;位置調整階段,其係根據所求出的中心點的位置,調整上述基板及上述支持體的各個的平面方向中的位置;及疊合階段,其係將經調整位置的上述基板與上述支持體相疊合。 Further, the pasting method of the present invention includes: a superimposing process in which a substrate and a support supporting the substrate are stacked in a stacked portion; and the stacked substrate and the support are in the adhesive portion The pasting method includes: a position detecting stage for detecting a position of an outer peripheral end portion of each of the substrate and the support body, and determining the substrate and the substrate a center point in each of the support bodies; a position adjustment phase that adjusts a position in a planar direction of each of the substrate and the support according to a position of the obtained center point; and a superposition stage The substrate in the adjusted position is superposed on the support.
藉由本發明,可提供可將基板及支持體以高精度疊合、黏貼之新穎的黏貼裝置及其關連技術。 According to the present invention, it is possible to provide a novel adhesive device capable of superimposing and adhering a substrate and a support with high precision and a related art thereof.
1‧‧‧黏貼系統 1‧‧‧adhesive system
2‧‧‧黏貼裝置 2‧‧‧Adhesive device
3‧‧‧保持室 3‧‧‧Holding room
4‧‧‧第一外部搬送部(搬送部) 4‧‧‧First external transfer unit (transport unit)
5‧‧‧第一外部搬送部行走路 5‧‧‧First external transport section walking road
6‧‧‧疊合室(疊合部) 6‧‧‧Positioning room (stacking part)
7‧‧‧黏貼室(黏貼部) 7‧‧‧Adhesive room (adhesive part)
8‧‧‧閘門 8‧‧‧ gate
9‧‧‧收授窗 9‧‧‧ Receiving window
10‧‧‧內部搬送部 10‧‧‧Internal Transport Department
11‧‧‧內部搬送臂 11‧‧‧Internal transfer arm
12‧‧‧臂旋動軸 12‧‧‧ Arm rotation axis
17a‧‧‧第一攝像手段 17a‧‧‧First camera
17b‧‧‧第二攝像手段 17b‧‧‧second camera
18a、18b‧‧‧區域 18a, 18b‧‧‧ area
19‧‧‧位置特定部 19‧‧‧ Location Specific Department
21‧‧‧位置偵測部 21‧‧‧Location Detection Department
21a‧‧‧雷射照射部(位置偵測部) 21a‧‧‧Laser illumination unit (position detection unit)
21'a‧‧‧背屏(位置偵測部) 21'a‧‧‧Back screen (position detection department)
21b‧‧‧受光部(位置偵測部) 21b‧‧‧Lighting Department (Position Detection Department)
21'b‧‧‧CCD攝影機(位置偵測部) 21'b‧‧‧CCD camera (position detection department)
21c‧‧‧窗部(位置偵測部) 21c‧‧‧Window (Location Detection Department)
22‧‧‧位置調整部(位置調整部) 22‧‧‧ Position adjustment unit (position adjustment unit)
22a‧‧‧可動載台(位置調整部) 22a‧‧‧Moving stage (position adjustment unit)
23‧‧‧間隔件(保持部) 23‧‧‧ Spacer (holding section)
24‧‧‧載台部(加熱部) 24‧‧‧Moving station (heating department)
24a‧‧‧載置面 24a‧‧‧Loading surface
25‧‧‧第一支持銷(暫時固止部) 25‧‧‧First Support Pin (Temporary Fixing Department)
26‧‧‧按壓銷(暫時固止部) 26‧‧‧Pushing pin (temporary fixing)
26a‧‧‧彈簧(暫時固止部) 26a‧‧‧Spring (temporary restraint)
26b‧‧‧支持軸(暫時固止部) 26b‧‧‧Support shaft (temporary restraint)
31‧‧‧第二支持銷 31‧‧‧second support pin
32、33‧‧‧加壓板 32, 33‧‧‧ Pressurized plate
40‧‧‧積層體 40‧‧‧Layered body
41‧‧‧支承板 41‧‧‧support plate
41a‧‧‧切口部 41a‧‧‧cutting section
42‧‧‧基板 42‧‧‧Substrate
50‧‧‧FOUP開啟器 50‧‧‧FOUP opener
51‧‧‧烤板 51‧‧‧ baking sheet
52‧‧‧旋轉器 52‧‧‧Rotator
53‧‧‧通過線 53‧‧‧pass line
54‧‧‧第二外部搬送部 54‧‧‧Second External Transport Department
55‧‧‧第二外部搬送部行走路 55‧‧‧Second external transport section walking path
d3‧‧‧重疊寬幅 d 3 ‧‧‧Overlap wide
d4‧‧‧橫寬 d 4 ‧‧‧width
O‧‧‧中心點 O‧‧‧ Center Point
B‧‧‧內部搬送臂11的待機位置 B‧‧‧Standby position of the internal transfer arm 11
C‧‧‧黏貼部收授位置 C‧‧‧Adhesive Department Recruitment Location
圖1係說明本發明之一實施形態之黏貼裝置2的概略的圖。 Fig. 1 is a view showing the outline of an adhering device 2 according to an embodiment of the present invention.
圖2係說明具備有本發明之一實施形態之黏貼裝置2的黏貼系統1的概略的圖。 Fig. 2 is a view showing the outline of the pasting system 1 including the sticking device 2 according to the embodiment of the present invention.
圖3係顯示本發明之一實施形態之黏貼系統1中之保持室3的概略的構成的圖。 Fig. 3 is a view showing a schematic configuration of a holding chamber 3 in the pasting system 1 according to the embodiment of the present invention.
圖4係說明在本發明之一實施形態中的黏貼系統1中所使用之相對於支承板41的雷射照射部21a及位置調整部22的配置的圖。 Fig. 4 is a view for explaining the arrangement of the laser irradiation portion 21a and the position adjusting portion 22 with respect to the support plate 41 used in the pasting system 1 according to the embodiment of the present invention.
圖5係說明在本發明之一實施形態中的黏貼系統1中所使用之相對於支承板41的間隔件23的配置的圖。 Fig. 5 is a view for explaining the arrangement of the spacers 23 with respect to the support plate 41 used in the pasting system 1 in the embodiment of the present invention.
圖6係由上方觀看包含有本發明之一實施形態之內部搬送部10的黏貼裝置2的內部構成的構成圖。 Fig. 6 is a view showing the internal configuration of the sticking device 2 including the internal transport unit 10 according to the embodiment of the present invention as seen from above.
圖7係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 7 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖8係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 8 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖9係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 9 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖10係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 10 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖11係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 11 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖12係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 12 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖13係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 13 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖14係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 14 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖15係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 15 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖16係針對本發明之一實施形態之黏貼裝置2中的疊合室6的動作加以說明的圖。 Fig. 16 is a view for explaining the operation of the stacking chamber 6 in the pasting device 2 according to the embodiment of the present invention.
圖17係針對本發明之一實施形態之黏貼裝置2中的黏貼室7的動作加以說明的圖。 Fig. 17 is a view for explaining the operation of the pasting chamber 7 in the pasting device 2 according to the embodiment of the present invention.
圖18係針對本發明之一實施形態之黏貼裝置2中的黏貼室7的動作加以說明的圖。 Fig. 18 is a view for explaining the operation of the pasting chamber 7 in the pasting device 2 according to the embodiment of the present invention.
<黏貼裝置> <Adhesive device>
本發明之黏貼裝置之構成為:具備有:將基板、與支持上述基板的支持體,透過被積層在上述基板及上述支持 體之至少任一者的接著層而相疊合的疊合部;及黏貼相疊合的上述基板與上述支持體的黏貼部的該黏貼裝置,上述疊合部係具備有:複數位置偵測部,其係偵測上述基板及上述支持體的各個中的外周端部的位置,求出上述基板及上述支持體的各個中的中心點;及位置調整部,其係根據上述中心點的位置,調整上述基板及上述支持體的各個的平面方向中的位置,且將經位置調整的上述基板與上述支持體相疊合。 The adhesive device of the present invention is configured to: provide a substrate, and a support supporting the substrate, and laminate the substrate on the substrate and the support a superimposed portion in which at least one of the layers of the body is superimposed; and the pasting device in which the substrate and the bonding portion of the support are pasted and adhered, the overlapping portion is provided with: a plurality of position detection a portion that detects a position of an outer peripheral end portion of each of the substrate and the support, and obtains a center point of each of the substrate and the support; and a position adjustment unit that is based on the position of the center point And adjusting a position in a planar direction of each of the substrate and the support, and superposing the position-adjusted substrate on the support.
〔積層體〕 [layered body]
首先,說明藉由黏貼裝置進行黏貼的積層體。積層體係藉由將基板、及支持上述基板的支持體,透過被積層在上述基板及上述支持體之至少任一者的接著層相疊合而形成。其中,在本實施形態中,接著層係形成在基板側。 First, a laminated body to be adhered by an adhesive device will be described. The laminated system is formed by laminating a substrate and a support supporting the substrate through an adhesive layer laminated on at least one of the substrate and the support. However, in the present embodiment, the subsequent layer is formed on the substrate side.
(基板) (substrate)
基板係在被支持(黏貼)在支承板的狀態下,被供在薄化、搬送、構裝等製程。基板並非限定於晶圓基板,亦可為例如藉由支承板所為之支持所需之陶瓷基板、薄型薄膜基板、可撓性基板等任意基板。 The substrate is supplied in a state of being thinned, conveyed, and mounted while being supported (adhered) on the support plate. The substrate is not limited to the wafer substrate, and may be any substrate such as a ceramic substrate, a thin film substrate, or a flexible substrate that is supported by a support plate.
(支承板) (support plate)
支承板(支持體)係支持基板的支持體,透過接著層而被黏貼在基板。因此,支承板係在基板的薄化、搬送、 構裝等製程時,若具有用以防止基板破損或變形所需強度即可,以更為輕量為宜。由以上觀點來看,支承板係由玻璃、矽、丙烯酸系樹脂、陶瓷等所構成為較佳。 The support plate (support) is a support for the support substrate, and is adhered to the substrate through the adhesive layer. Therefore, the support plate is thinned and conveyed on the substrate, In the process of manufacturing, etc., if it has the strength required to prevent damage or deformation of the substrate, it is preferable to be lighter. From the above viewpoints, the support plate is preferably made of glass, iridium, acrylic resin, ceramics or the like.
(接著層) (following layer)
接著層係將基板與支承板進行接著之層,藉由在基板及支持體的至少任一者塗佈接著劑而形成。構成接著層的接著劑係若含有例如藉由加熱而熱流動性提升的熱可塑性樹脂作為接著材料即可。以熱可塑性樹脂而言,係列舉例如:丙烯酸系樹脂、苯乙烯系樹脂、馬來亞醯胺系樹脂、烴系樹脂、熱可塑性彈性體、及聚碸系樹脂等。 Next, the layer is formed by laminating the substrate and the support sheet, and is formed by applying an adhesive to at least one of the substrate and the support. The adhesive constituting the adhesive layer may contain, for example, a thermoplastic resin having improved thermal fluidity by heating as a bonding material. Examples of the thermoplastic resin include an acrylic resin, a styrene resin, a maleimide resin, a hydrocarbon resin, a thermoplastic elastomer, and a polyfluorene-based resin.
接著層的形成方法,亦即在基板或支承板塗佈接著劑的塗佈方法、或在基材塗佈接著劑而形成接著帶的形成方法並非為特別限定者,以接著劑的塗佈方法而言,係列舉例如:藉由旋塗法、浸泡法、滾刀法、噴霧法、狹縫噴嘴法所為之塗佈法等。 The method of forming the layer, that is, the method of applying the adhesive to the substrate or the support sheet, or the method of forming the adhesive tape by applying the adhesive to the substrate is not particularly limited, and the method of applying the adhesive is For the series, for example, a coating method such as a spin coating method, a dipping method, a hob method, a spray method, or a slit nozzle method.
接著層的厚度係若按照成為黏貼對象的基板及支承板的種類、被施行在黏貼後的基板的處理等來適當設定即可,以10~150μm的範圍內為佳,以15~100μm的範圍內為較佳。 The thickness of the layer may be appropriately set in accordance with the type of the substrate and the support plate to be pasted, the treatment of the substrate to be adhered, and the like, preferably in the range of 10 to 150 μm, and in the range of 15 to 100 μm. The inside is better.
其中,當將支承板由基板剝離時,若對接著層供給溶劑而將接著層溶解即可。藉此,可將基板與支承板分離。此時,若在支承板形成有以其厚度方向貫穿的貫穿孔即可,由於可輕易地透過該貫穿孔而對接著層供給溶 劑,因此較為理想。 However, when the support plate is peeled off from the substrate, the adhesive layer may be supplied to the adhesive layer to dissolve the adhesive layer. Thereby, the substrate can be separated from the support plate. In this case, if the support plate is formed with a through hole penetrating in the thickness direction, the through layer can be easily passed through the through hole. The agent is therefore ideal.
此外,在基板與支承板之間,只要不妨礙兩者的黏貼,亦可另外形成有接著層以外的其他層。例如,亦可在支承板與接著層之間形成有藉由照射光而變質的分離層。藉由形成有分離層,在基板的薄化、搬送、構裝等製程後照射光,藉此可將基板與支承板輕易地分離。 Further, another layer other than the adhesive layer may be separately formed between the substrate and the support plate as long as the adhesion between the two is not hindered. For example, a separation layer which is deteriorated by irradiation with light may be formed between the support plate and the adhesive layer. By forming the separation layer, the substrate is irradiated with light after the substrate is thinned, transported, or assembled, whereby the substrate and the support plate can be easily separated.
<黏貼系統1> <Adhesive system 1>
圖1係說明本發明之一實施形態中的黏貼裝置2的概略的圖,圖2係說明具備有黏貼裝置2的黏貼系統1的概略的圖。 Fig. 1 is a schematic view showing an adhesive device 2 according to an embodiment of the present invention, and Fig. 2 is a view showing an outline of an adhesive system 1 including the adhesive device 2.
圖1所示之本發明之一實施形態之黏貼裝置2係具備有:疊合室(疊合部)6、及黏貼室(黏貼部)7,如圖2所示,在一實施形態中,可組入至黏貼基板42與支承板41的黏貼系統1。 The sticking device 2 according to the embodiment of the present invention shown in Fig. 1 includes a stacking chamber (overlap portion) 6 and an adhesive chamber (adhesive portion) 7, as shown in Fig. 2, in one embodiment, It can be incorporated into the pasting system 1 of the bonding substrate 42 and the support plate 41.
此外,如圖2所示,黏貼系統1係除了黏貼裝置2以外,具備有:保持室3、第一外部搬送部4、及第一外部搬送部行走路5的構成。黏貼裝置2係構成為包含有可減壓的疊合室6、及可減壓的黏貼室7。 Moreover, as shown in FIG. 2, the pasting system 1 is comprised with the structure of the holding chamber 3, the 1st external conveyance part 4, and the 1st external conveyance part travel path 5 except the adhesive apparatus 2. The pasting device 2 is configured to include a stacking chamber 6 that can be decompressed, and an adhesive chamber 7 that can be decompressed.
在圖2中係另外圖示出:黏貼系統1所具備的FOUP開啟器50、在基板42塗佈接著層的旋轉器52、使塗佈後的接著層硬化的烤板51、第二外部搬送部54、第二外部搬送部行走路55、及用以將基板42交給第一外部搬送部4的通過線53。 In Fig. 2, the FOUP opener 50 provided in the pasting system 1 , the rotator 52 on which the adhesive layer 52 is applied to the substrate 42 , the baking sheet 51 which hardens the applied adhesive layer, and the second external transfer are additionally shown. The portion 54, the second external transfer portion traveling path 55, and the passage line 53 for delivering the substrate 42 to the first external transfer portion 4.
〔保持室3〕 [holding room 3]
圖3係顯示保持室3的概略的構成的圖。如圖3所示,保持室3係具備有:攝像部(第一攝像手段、第二攝像手段)17a、17b、及位置特定部19,保持相疊合之前的支承板41或基板42(其中,在圖3中係顯示保持有支承板41的情形)。 FIG. 3 is a view showing a schematic configuration of the holding chamber 3. As shown in FIG. 3, the holding chamber 3 is provided with an imaging unit (first imaging means, second imaging means) 17a, 17b, and a position specifying portion 19, and supports the support plate 41 or the substrate 42 before being stacked. In Fig. 3, the case where the support plate 41 is held is shown).
攝像部17a、17b係分別對包含被保持在保持室3的支承板41的互相不同的端面(第一端面、第二端面)的區域18a、18b進行攝像。區域18a、18b係以例如設定在被保持在保持室3的支承板41的大約對角線上為佳。攝像部17a、17b可為例如CCD攝影機。其中,在圖3中,支承板41的上面視的形狀為圓形,在攝像部17b所攝像的支承板41的區域18b係設有用以特定支承板41的方向的切口部(notch)41a。如上所示,在攝像部17a、17b的任一者中,特定支承板41中的切口部41a的位置。 The imaging units 17a and 17b image the regions 18a and 18b including the mutually different end faces (the first end face and the second end face) of the support plate 41 held by the holding chamber 3, respectively. The regions 18a, 18b are preferably set, for example, on the approximately diagonal of the support plate 41 held in the holding chamber 3. The imaging units 17a and 17b may be, for example, a CCD camera. In FIG. 3, the upper surface of the support plate 41 has a circular shape, and a notch 41a for specifying the direction of the support plate 41 is provided in the region 18b of the support plate 41 imaged by the imaging unit 17b. As described above, in any of the imaging units 17a and 17b, the position of the notch portion 41a in the support plate 41 is specified.
位置特定部19係根據攝像部17a、17b所攝像到的複數畫像,檢測被保持在保持室3的支承板41的中心點O,及特定切口部41a的方向。關於基板42,亦與支承板41同樣地,檢測中心點的位置,且特定切口部的位置。位置特定部19係若根據圓板的端面的畫像,算出假想圓,且檢測中心點O即可。根據端面的畫像的中心點O的檢測技術係若使用周知之畫像處理即可,並未特別限 定。 The position specifying unit 19 detects the direction of the center point O of the support plate 41 held by the holding chamber 3 and the specific notch portion 41a based on the plurality of images captured by the imaging units 17a and 17b. Similarly to the support plate 41, the substrate 42 detects the position of the center point and specifies the position of the notch portion. The position specifying unit 19 calculates a virtual circle based on the image of the end surface of the circular plate, and detects the center point O. According to the detection technique of the center point O of the image of the end face, it is not necessary to use a well-known image processing. set.
其中,在本實施形態之黏貼系統1中,保持室3中的位置特定部19係藉由2個攝像部17a、17b,檢測基板42、及支承板41的中心點的構成,但是例如在保持室3中所進行之特定支承板41及基板42的中心點的方法亦可藉由與後述之疊合部中之位置調整部同樣的構成來進行。 In the pasting system 1 of the present embodiment, the position specifying unit 19 in the holding chamber 3 detects the center point of the substrate 42 and the support plate 41 by the two imaging units 17a and 17b, but for example, it is maintained. The method of the specific support plate 41 and the center point of the substrate 42 performed in the chamber 3 can also be performed by the same configuration as the position adjustment portion in the overlapping portion to be described later.
〔第一外部搬送部4〕 [First external transfer unit 4]
第一外部搬送部4係具有可搬運支承板41、基板42、及積層體40的構成,形成為可在與黏貼裝置2之間收授支承板41、基板42、及積層體40的構成。第一外部搬送部4係在第一外部搬送部行走路5上移動。發揮如上所示之功能的第一外部搬送部4及第一外部搬送部行走路5係可藉由以往周知之技術來準備。 The first external transfer unit 4 has a configuration in which the support plate 41 , the substrate 42 , and the laminated body 40 are transported, and is configured such that the support plate 41 , the substrate 42 , and the laminated body 40 can be accommodated between the bonding device 2 . The first external transfer unit 4 moves on the first external transfer unit travel path 5. The first external transfer unit 4 and the first external transfer unit travel path 5 that function as described above can be prepared by a conventionally known technique.
其中,第一外部搬送部4係將在保持室3中特定出中心點及切口部的位置之支承板41及基板42的各個,載置於圖4(a)所示之4個1組的位置調整部22上。 In the first external transfer unit 4, each of the support plate 41 and the substrate 42 at the position where the center point and the notch portion are specified in the holding chamber 3 are placed in the four groups shown in FIG. 4(a). The position adjustment unit 22 is provided.
〔疊合室6〕 [stacking chamber 6]
如圖1所示,黏貼裝置2所具備的疊合室6係具備有:位置偵測部21、位置調整部22、間隔件(保持部)23、載台部(加熱部)24、第一支持銷(暫時固止部) 25、按壓銷(暫時固止部)26、及內部搬送部10。此外,疊合室6係具備有減壓部(未圖示),在將支承板41及基板42搬入至疊合室6之後,可將疊合室6的內部置放在減壓氣體環境下。 As shown in FIG. 1 , the stacking chamber 6 provided in the pasting device 2 includes a position detecting unit 21, a position adjusting unit 22, a spacer (holding unit) 23, a stage unit (heating unit) 24, and a first Support pin (temporary fixing) 25. A pressing pin (temporary fixing portion) 26 and an internal conveying portion 10. Further, the stacking chamber 6 is provided with a pressure reducing portion (not shown), and after the support plate 41 and the substrate 42 are carried into the stacking chamber 6, the inside of the stacking chamber 6 can be placed in a reduced-pressure atmosphere. .
〔位置偵測部21〕 [Position detection unit 21]
圖1所示之位置偵測部21係根據藉由雷射照射部21a及受光部21b被特定出的支承板41的外周端部的位置座標,特定被載置在1組位置調整部22上的支承板41的中心點O的偏移。其中,位置偵測部21係設在疊合室6的外部。 The position detecting unit 21 shown in FIG. 1 is specifically placed on the set of position adjusting units 22 based on the position coordinates of the outer peripheral end portion of the support plate 41 specified by the laser irradiation unit 21a and the light receiving unit 21b. The offset of the center point O of the support plate 41. The position detecting unit 21 is provided outside the stacking chamber 6.
更具體而言,如圖4(a)所示,疊合室6內係具備有2組夾著成為應配置支承板41及基板42之基準的中心點而相對向的一對雷射照射部21a。亦即,位置偵測部21係將4個雷射照射部21a的中心點作為疊合室6內的基準的中心點來作設定。 More specifically, as shown in FIG. 4( a ), the inside of the stacking chamber 6 includes a pair of laser irradiation units that face each other with a center point on which the support plate 41 and the substrate 42 are to be placed. 21a. In other words, the position detecting unit 21 sets the center point of the four laser irradiation units 21a as the center point of the reference in the superposition chamber 6.
此外,如圖1所示,雷射照射部21a的各個中朝向Z方向的下側係配置有受光部21b。在此,若在1組位置調整部22上載置支承板41,在雷射照射部21a與受光部21b之間配置有支承板41的外周端部(圖4(a))。因此,由雷射照射部21a朝向受光部21b被照射的光係由Z方向,亦即相對支承板41的平面方向呈垂直的方向被照射至X-Y平面上的支承板41的外周端部。 Further, as shown in FIG. 1, the light receiving portion 21b is disposed on the lower side of the laser irradiation portion 21a in the Z direction. When the support plate 41 is placed on the one set of position adjustment unit 22, the outer peripheral end portion of the support plate 41 is disposed between the laser irradiation unit 21a and the light receiving unit 21b (Fig. 4(a)). Therefore, the light irradiated by the laser irradiation unit 21a toward the light receiving unit 21b is irradiated to the outer peripheral end portion of the support plate 41 on the X-Y plane in the Z direction, that is, in a direction perpendicular to the planar direction of the support plate 41.
藉此,特定被載置在該位置調整部22上的支 承板41的外周端部的位置座標,可偵測被載置在1組位置調整部22的支承板41的中心點O與成為基準的中心點的偏移。在此,位置偵測部21係可根據藉由相對支承板的平面方向呈垂直地照射光所求出的位置座標,來特定各中心點的偏移,因此可以高精度特定支承板41的中心點O、與成為基準的中心點的偏移。此外,如上所示,藉由特定支承板41的外周端部的位置座標,不僅可偵測因藉由第一外部搬送部4被搬送而可能產生的支承板41的位置偏移,亦可偵測因支承板41的個別差異所致之0.05μm~0.5μm左右的直徑的不均而引起的位置偏移。 Thereby, the branch that is placed on the position adjusting portion 22 is specified. The position coordinates of the outer peripheral end portion of the carrier 41 can detect the offset of the center point O of the support plate 41 placed on the set of position adjusting portions 22 from the center point of the reference. Here, the position detecting unit 21 can specify the offset of each center point based on the position coordinates obtained by irradiating the light perpendicularly to the plane direction of the support plate, so that the center of the support plate 41 can be specified with high precision. Point O, the offset from the center point that becomes the reference. Further, as described above, by the positional coordinates of the outer peripheral end portion of the specific support plate 41, it is possible to detect not only the positional deviation of the support plate 41 which may be generated by being transported by the first outer transfer portion 4, but also the detection The positional deviation due to the unevenness of the diameter of about 0.05 μm to 0.5 μm due to the individual difference of the support plates 41 is measured.
此外,如圖4(a)所示,4個雷射照射部21a之中的1個係對支承板41的切口部41a照射光。藉此,亦偵測切口部41a的位置偏移。其中,在基板42中亦同樣地,偵測中心點的位置偏移、及切口部的位置偏移,自不待言。 Further, as shown in FIG. 4(a), one of the four laser irradiation portions 21a irradiates light to the notch portion 41a of the support plate 41. Thereby, the positional deviation of the notch portion 41a is also detected. In the same manner, in the substrate 42, the positional deviation of the center point and the positional deviation of the notch portion are detected.
其中,受光部21b係透過可由外部確認疊合室6的內部的窗部21c,偵測雷射照射部21a的光。在此,被配置在窗部21c的窗部玻璃板係以疊合室6的內部被密封的方式被接合在疊合室6。藉此,可一邊藉由被設在疊合室6的外部的受光部21b接受光,一邊將疊合室6的內部置放在減壓環境下。 The light-receiving portion 21b transmits the window portion 21c that can externally confirm the inside of the superposed chamber 6, and detects the light of the laser irradiation portion 21a. Here, the window glass plate disposed in the window portion 21c is joined to the stacking chamber 6 so that the inside of the stacking chamber 6 is sealed. Thereby, the inside of the superposition chamber 6 can be placed in a reduced pressure environment while receiving light by the light receiving portion 21b provided outside the superposed chamber 6.
(一變形例之位置偵測部) (Position detection unit of a modification)
黏貼裝置2所具備的位置偵測部21並非限定為具備 有光照射部、及受光部的雷射感測器。如圖4(b)所示,在一變形例之黏貼裝置中,位置偵測部21亦可為例如藉由至少3個CCD(Charge Coupled Device,電荷耦合元件)攝影機21'b、及與該等CCD攝影機21'b相對應的背屏21'a,特定1組位置調整部22的中心點、與支承板41的外周端端部的位置座標的構成。 The position detecting unit 21 included in the pasting device 2 is not limited to being provided A laser sensor having a light irradiation unit and a light receiving unit. As shown in FIG. 4(b), in the pasting device of the modification, the position detecting unit 21 may be, for example, at least three CCD (Charge Coupled Device) cameras 21'b, and the like. The back screen 21'a corresponding to the CCD camera 21'b is configured to specify the center point of the one set of position adjusting portions 22 and the position coordinates of the outer peripheral end portions of the support plate 41.
其中,CCD攝影機21'b係由圖1所示之窗部21c的外部,以被配置在Z方向的上側的背屏21'a為背景,對支承板41的外周端部的畫像進行攝影。其中,如圖4(b)所示,CCD攝影機21'b的1個係對切口部41a的畫像進行攝影。 In addition, the CCD camera 21'b photographs an image of the outer peripheral end portion of the support plate 41 with the back screen 21'a disposed on the upper side in the Z direction as the background from the outside of the window portion 21c shown in FIG. Here, as shown in FIG. 4(b), one of the CCD cameras 21'b captures an image of the notch portion 41a.
位置偵測部21係根據3個CCD攝影機21'b所攝影到的複數畫像,特定支承板41的外周端部的位置座標。此外,檢測中心點O。位置偵測部21係可根據支承板41的外周端部的畫像,特定該外周端部的位置座標,且偵測支承板41的中心點O、與成為基準的中心點的位置偏移。此外,可偵測被配置在位置調整部22上時的切口部41a的位置、與應配置該切口部41a之預定的位置的偏移。 The position detecting unit 21 specifies the position coordinates of the outer peripheral end portion of the support plate 41 based on the plurality of images captured by the three CCD cameras 21'b. In addition, the center point O is detected. The position detecting unit 21 specifies the position coordinates of the outer peripheral end portion based on the image of the outer peripheral end portion of the support plate 41, and detects the position of the center point O of the support plate 41 from the center point of the reference. Further, it is possible to detect the displacement of the position of the notch portion 41a when placed on the position adjusting portion 22 and the predetermined position at which the notch portion 41a should be disposed.
〔位置調整部22〕 [Position adjustment unit 22]
位置調整部22係支持成為對位對象的支承板41及基板42者,藉由使可動載台22a可動,來調整支承板41及基板42的位置。 The position adjusting unit 22 supports the support plate 41 and the substrate 42 to be aligned, and adjusts the positions of the support plate 41 and the substrate 42 by moving the movable stage 22a.
可動載台22a係可在X-Y平面中平行移動,藉此,與支承板41及基板42的平面方向呈平行地使1組位置調整部22移動(圖8及圖9)。藉此,根據位置偵測部21所偵測到的位置偏移,藉由1組位置調整部22,使支承板41的中心點O移動至成為基準的4個雷射照射部21a的中心點。 The movable stage 22a is movable in parallel in the X-Y plane, whereby one set of position adjustment sections 22 is moved in parallel with the plane directions of the support plates 41 and 42 (FIGS. 8 and 9). As a result, the center point O of the support plate 41 is moved to the center point of the four laser irradiation units 21a serving as the reference by the one position adjustment unit 22 based on the positional deviation detected by the position detecting unit 21. .
此外,可動載台22a係可旋動,以中心點O為中心而使載置於位置調整部22的支承板41旋動。藉此,調整支承板41的切口部41a的位置,且調整支承板41的方向。 Further, the movable stage 22a is rotatable, and the support plate 41 placed on the position adjusting portion 22 is rotated about the center point O. Thereby, the position of the notch portion 41a of the support plate 41 is adjusted, and the direction of the support plate 41 is adjusted.
其中,基板42的中心點的位置及方向亦與調整上述支承板41的中心點O的位置的偏移的動作同樣地進行調整。 The position and direction of the center point of the substrate 42 are also adjusted in the same manner as the operation of adjusting the offset of the position of the center point O of the support plate 41.
此外,可動載台22a係在Z方向以上下使1組位置調整部22移動。藉此,1組位置調整部22係使經調整中心點的位置的支承板41(若先進行基板42的對位時,為基板42),上升至可藉由間隔件23來支持的位置(圖10)。亦即,1組位置調整部22係維持將支承板41在X-Y平面中進行對位後的狀態,在Z方向移動,且直接將支承板41交給間隔件23。 Further, the movable stage 22a moves the one set of position adjusting sections 22 in the Z direction or more. Thereby, the one set of position adjustment sections 22 raises the support plate 41 (the substrate 42 when the alignment of the substrate 42 is first performed) to the position where the center point is adjusted, and raises the position which can be supported by the spacer 23 ( Figure 10). In other words, the one set of position adjusting sections 22 maintains the state in which the support plate 41 is aligned in the X-Y plane, moves in the Z direction, and directly feeds the support plate 41 to the spacer 23.
〔間隔件23〕 [spacer 23]
間隔件23係將已進行對位的支承板41(若先進行基板42的對位時,為基板42),使該水平位置不會改變地 保持至進行疊合為止的構件。圖5係由上面側觀看間隔件23的圖。間隔件23係藉由從其下側支持支承板41的周緣部的一部分,安定地保持支承板41。間隔件23係可朝X-Y方向,亦即水平方向移動。當支承板41載置於載台部24而被運送至間隔件23的上部為止時,係使間隔件23移動至完全不會與支承板41相重疊的位置。在本說明書中,在該狀態之時,稱間隔件23位於「抽出位置」。在支承板41被運入至比間隔件23更為上方之後,以可藉由間隔件23支持支承板41的方式,送回至將間隔件23與支承板41相重疊的位置。在本說明書中,在該狀態之時,稱間隔件23位於「插入位置」。圖5係顯示間隔件23位於「插入位置」的狀態。間隔件23位於插入位置時之間隔件23之支持支承板41的各構件與支承板41的重疊寬幅d3係非限定性地由支承板41的周緣至內側可為1~5mm左右。較適為5mm。此外,間隔件23的大小係可為例如橫寬d4為5mm,但是並非為限定於此者。 The spacer 23 is a member that holds the aligned support plate 41 (when the substrate 42 is aligned first, the substrate 42) so that the horizontal position is maintained without being changed. Fig. 5 is a view of the spacer 23 viewed from the upper side. The spacer 23 securely holds the support plate 41 by supporting a part of the peripheral edge portion of the support plate 41 from the lower side thereof. The spacer 23 is movable in the XY direction, that is, in the horizontal direction. When the support plate 41 is placed on the stage portion 24 and transported to the upper portion of the spacer 23, the spacer 23 is moved to a position where it does not overlap the support plate 41 at all. In the present specification, at this state, the spacer 23 is referred to as being "extracted position". After the support plate 41 is carried over above the spacer 23, it is returned to a position where the spacer 23 and the support plate 41 are overlapped so that the support plate 41 can be supported by the spacer 23. In the present specification, at this state, the spacer 23 is referred to as the "insertion position". Fig. 5 shows a state in which the spacer 23 is located at the "insertion position". The overlapping width d 3 of each member of the spacer 23 supporting the support plate 41 and the support plate 41 when the spacer 23 is at the insertion position may be about 1 to 5 mm from the periphery to the inner side of the support plate 41 without limitation. More suitable for 5mm. Further, the size of the spacer 23 may be, for example, a lateral width d 4 of 5 mm, but is not limited thereto.
間隔件23的材質並非為特別限定者,例如,可將不銹鋼(SUS)進行倒角,使用以聚四氟乙烯等進行樹脂塗敷者。 The material of the spacer 23 is not particularly limited. For example, stainless steel (SUS) may be chamfered, and a resin coated with polytetrafluoroethylene or the like may be used.
〔載台部24〕 [stage portion 24]
載台部(加熱部)24係載置支承板41或基板42、或將該等疊合的積層體40。 The stage unit (heating unit) 24 mounts the support plate 41 or the substrate 42 or the laminated body 40 which is superposed on each other.
載台部24中的支承板41等的載置面較佳為 以不會對載置物造成損傷的方式,藉由例如聚四氟乙烯、PEEK等樹脂所形成。此外,在載置面係以形成溝槽為佳。藉由在載置面形成溝槽,當將疊合室6的內部減壓時,可防止氣體殘留在支承板41、基板42及積層體40、與載置面24a之間的情形。 The mounting surface of the support plate 41 and the like in the stage portion 24 is preferably It is formed by a resin such as polytetrafluoroethylene or PEEK in such a manner as not to damage the substrate. Further, it is preferable to form a groove on the mounting surface. When the groove is formed in the mounting surface, when the inside of the superposed chamber 6 is decompressed, it is possible to prevent gas from remaining between the support plate 41, the substrate 42 and the laminated body 40, and the mounting surface 24a.
此外,在載台部24內置有加熱器(未圖示),將基板42與載台部24的接觸面加熱。藉此,使被塗佈在基板42的接著層作熱流動。 Further, a heater (not shown) is built in the stage portion 24, and the contact surface between the substrate 42 and the stage portion 24 is heated. Thereby, the adhesive layer applied to the substrate 42 is made to flow.
其中,載置面24a的溫度較佳為例如藉由作為接著層的接著材料的熱可塑性樹脂的低溫黏著性(黏性(Stickiness))被加熱至至少室溫以上的溫度,以被加熱至玻璃轉移點(Tg)以上的溫度為更佳。藉由將接著層加熱至熱可塑性樹脂的玻璃轉移點以上的溫度,接著層的熱流動性提升,且容易變形。雖然亦取決於接著層,亦即作為接著材料的熱可塑性樹脂的材質,但是接觸面的溫度係以23~220℃為佳,加熱時間,亦即按壓時間係以3~300秒鐘為佳,以5~180秒鐘為較佳。 The temperature of the mounting surface 24a is preferably heated to a temperature of at least room temperature or higher by, for example, low temperature adhesion (stickiness) of a thermoplastic resin as a bonding material of the adhesive layer to be heated to the glass. The temperature above the transfer point (Tg) is more preferable. By heating the adhesive layer to a temperature above the glass transition point of the thermoplastic resin, the thermal mobility of the layer is improved and the deformation is easy. Although it depends on the adhesive layer, that is, the material of the thermoplastic resin as the adhesive material, the temperature of the contact surface is preferably 23 to 220 ° C, and the heating time, that is, the pressing time is preferably 3 to 300 seconds. It is preferably 5 to 180 seconds.
其中,載台部24亦可在一實施形態中,一邊近接但未接觸載台部24的載置面24a地支持在第一支持銷25,一邊將在上面形成有接著層的基板42、或支承板41加熱。 In the embodiment, the stage portion 24 may be supported by the mounting surface 24a of the stage portion 24 without being in contact with the mounting surface 24a of the stage portion 24, and the substrate 42 having the adhesive layer formed thereon may be formed, or The support plate 41 is heated.
〔暫時固止部〕 [temporary fixation]
暫時固止部係藉由第一支持銷25與按壓銷26,來著 支承板41與基板42來進行按壓,藉此進行暫時固止。 The temporary fixing portion is provided by the first support pin 25 and the pressing pin 26 The support plate 41 and the substrate 42 are pressed to perform temporary fixation.
(第一支持銷25) (first support pin 25)
第一支持銷25係將支承板41及基板42之中之後被搬入至疊合室6者,由其底面進行支持。第一支持銷25係在位置偵測部21作為基準之以4個雷射照射部21a的中心點為中心的圓上,以等間隔配置有至少3個。此外,第一支持銷25的素材並未特別限定,可藉由熱傳導性佳的鋁等構成,惟並未限定於此,亦可使用不銹鋼等。 The first support pin 25 is supported by the bottom surface of the support plate 41 and the substrate 42 and then carried into the stacking chamber 6. The first support pin 25 is arranged on the circle centered on the center point of the four laser irradiation units 21a as the reference, and at least three are arranged at equal intervals. Further, the material of the first support pin 25 is not particularly limited, and may be formed of aluminum or the like having excellent thermal conductivity, but is not limited thereto, and stainless steel or the like may be used.
(按壓銷26) (press pin 26)
按壓銷26係先被搬送至疊合室6內的支承板41或將基板42在Z方向朝向下側按壓者,與第一支持銷25同樣地,按壓銷26係在位置偵測部21作為基準之以4個雷射照射部21a的中心點為中心的圓上,以等間隔配置有至少3個。此外,按壓銷26的前端部係以與第一支持銷25的各個的前端部相對向的方式作配置。如上所示,藉由配置第一支持銷25與按壓銷26,可將經調整位置後的支承板41的區域、與經調整位置後的基板42的一部分區域疊合、夾入,藉此進行按壓。因此,可將經位置調整的支承板41及基板42的中心點作為中心而均等地施加按壓力。因此,可防止支承板41與基板42發生位置偏移,順利地進行暫時固止。 The pressing pin 26 is first conveyed to the support plate 41 in the stacking chamber 6 or the substrate 42 is pressed toward the lower side in the Z direction. Similarly to the first support pin 25, the pressing pin 26 is attached to the position detecting portion 21 as At least three of the reference points are arranged on a circle centered on the center point of the four laser irradiation units 21a at equal intervals. Further, the front end portion of the pressing pin 26 is disposed to face the front end portion of each of the first support pins 25. As described above, by arranging the first support pin 25 and the pressing pin 26, the region of the support plate 41 after the adjusted position and the partial region of the substrate 42 after the adjusted position can be overlapped and sandwiched. Press. Therefore, the pressing force can be equally applied to the center point of the position-adjusted support plate 41 and the substrate 42 as a center. Therefore, it is possible to prevent the support plate 41 from being displaced from the substrate 42 and to smoothly perform the temporary fixing.
其中,按壓銷26係當被抵接於支承板41(或 基板42)的上面之時,藉由彈簧(彈壓構件)26a,朝向Z方向被彈壓至下側。此外,複數按壓銷26係可藉由支持軸26b,在Z方向同時以上下移動。在此,按壓銷26未朝下方移動,因此將位於與被保持在間隔件23的支承板41並未接觸的位置,在本說明書中稱按壓銷26位於「待機位置」。相對於此,按壓銷26朝下方移動,結果,將處於可藉由彈簧26a來彈壓被保持在間隔件23的支承板41的位置,在本說明書中稱按壓銷26位於「按壓位置」。 Wherein, the pressing pin 26 is abutted against the support plate 41 (or At the time of the upper surface of the substrate 42), it is biased to the lower side in the Z direction by a spring (elastic member) 26a. Further, the plurality of pressing pins 26 can be simultaneously moved up and down in the Z direction by the support shaft 26b. Here, since the pressing pin 26 does not move downward, the pressing pin 26 is located at the "standby position" in the present position at a position that is not in contact with the support plate 41 held by the spacer 23. On the other hand, the pressing pin 26 is moved downward, and as a result, the position of the support plate 41 held by the spacer 23 can be held by the spring 26a. In the present specification, the pressing pin 26 is referred to as the "pressing position".
〔內部搬送部10〕 [Internal transport unit 10]
在疊合室6係設有藉由第一支持銷25及按壓銷26夾入,藉此將暫時固止的支承板41及基板42在與黏貼室7之間進行積層體40之收授的內部搬送部(圖6中的10)。 The stacking chamber 6 is provided with the first support pin 25 and the press pin 26, whereby the temporarily supported support plate 41 and the substrate 42 are disposed between the adhesive chamber 7 and the laminate 40. Internal transfer unit (10 in Fig. 6).
疊合室6及黏貼室7係可形成為設有將一個處理室的內部分隔成二個處理室的壁部的構造。此外疊合室6及黏貼室7亦可為疊合室6與黏貼室7在各自的側面無間隙地彼此相接的構造。在疊合室6及黏貼室7的交界,係設有用以在疊合室6及黏貼室7間進行積層體40之收授的閘門8。閘門8係藉由擋門被控制開閉。此外,在疊合室6,係設有用以在黏貼裝置2與第一外部搬送部4之間進行支承板41、基板42及積層體40之收授之可開閉的收授窗9。在疊合室6及黏貼室7係分別設有周知之 減壓手段(未圖示),可獨立控制各室的內部壓的狀態。 The stacking chamber 6 and the pasting chamber 7 may be formed to have a structure in which the inside of one processing chamber is partitioned into the wall portions of the two processing chambers. Further, the overlapping chamber 6 and the adhesive chamber 7 may have a configuration in which the overlapping chamber 6 and the adhesive chamber 7 are in contact with each other without a gap on the respective side faces. At the boundary between the stacking chamber 6 and the pasting chamber 7, a gate 8 for receiving the laminated body 40 between the stacking chamber 6 and the pasting chamber 7 is provided. The gate 8 is controlled to open and close by means of a shutter. Further, in the stacking chamber 6, an openable and closable receiving window 9 for receiving the support plate 41, the substrate 42 and the laminated body 40 between the bonding device 2 and the first external transfer portion 4 is provided. The overlapping chamber 6 and the adhesive chamber 7 are respectively provided with well-known The decompression means (not shown) can independently control the state of the internal pressure of each chamber.
由於黏貼室7為可減壓的構成,因此可在減壓氣體環境下,將基板42與支承板41透過接著層而相貼合。在減壓氣體環境下,使基板42壓接在接著層,藉此可在空氣不存在於基板42表面的凹凸圖案的凹陷的狀態下,使接著層進入至該凹陷,因此可更加確實地防止接著層與基板42之間發生氣泡。 Since the adhesive chamber 7 has a decompressible configuration, the substrate 42 and the support plate 41 can be bonded to each other through the adhesive layer in a reduced-pressure atmosphere. The substrate 42 is pressure-bonded to the adhesive layer in a reduced-pressure atmosphere, whereby the adhesive layer can be prevented from entering the recess in a state where the air is not present in the recessed pattern of the surface of the substrate 42, so that it can be more reliably prevented. Air bubbles then form between the layer and the substrate 42.
閘門8係在擋門打開的狀態下,以可使已被進行對位的積層體40由疊合室6移動至黏貼室7的方式,此外,以可使接合後的積層體40由黏貼室7移動至疊合室6的方式形成。疊合室6及黏貼室7的任一者亦在減壓的狀態下打開擋門,藉此形成為可使接合前的積層體40由疊合室6在減壓下移動至黏貼室7的構造。 The gate 8 is in a state in which the shutter is opened, so that the laminated body 40 that has been aligned can be moved from the stacking chamber 6 to the pasting chamber 7, and further, the laminated body 40 after joining can be made of the pasting chamber. 7 is formed by moving to the stacking chamber 6. Any one of the stacking chamber 6 and the pasting chamber 7 is also opened in a decompressed state, whereby the laminated body 40 before joining can be moved from the stacking chamber 6 to the pasting chamber 7 under reduced pressure. structure.
圖6係由上方觀看包含有內部搬送部10的黏貼裝置2的內部構成的構成圖。內部搬送部10係只要是可使積層體40在疊合室6與黏貼室7之間移動的構成,在具體的機構並無特別限制。在本實施形態中,如圖6所示,內部搬送部10係藉由內部搬送臂11及臂旋動軸12所構成。內部搬送部10係形成為藉由以可由其下面支持積層體40的內部搬送臂11的臂旋動軸12為旋轉中心的旋動,使積層體40移動的機構。詳如後述,在本實施形態中,係設有旋動的旋動軸為共通的2個內部搬送部10。臂旋動軸12係被設在疊合室6側,但是亦可為被設在黏貼室7側的構成。由可縮短在疊合室6與第一外部搬 送部4之間的收授的行程(stroke)的觀點來看,臂旋動軸12係以形成在接近形成有收授窗9之側面之側為佳。在圖6中,以「B」所示之二點鏈線係表示內部搬送臂11的待機位置,以「C」所示之二點鏈線係表示內部搬送臂11在黏貼室7的位置(黏貼部收授位置)。 Fig. 6 is a configuration diagram showing the internal structure of the sticking device 2 including the internal transport unit 10 as viewed from above. The internal conveying unit 10 is not particularly limited as long as it can move the laminated body 40 between the overlapping chamber 6 and the bonding chamber 7. In the present embodiment, as shown in FIG. 6, the internal conveying unit 10 is constituted by the internal transfer arm 11 and the arm rotation shaft 12. The internal transfer unit 10 is formed by a mechanism that moves the laminated body 40 by the rotation of the arm rotating shaft 12 that supports the internal transfer arm 11 of the laminated body 40. As will be described in detail later, in the present embodiment, the two internal conveying portions 10 in which the rotating rotary shafts are common are provided. The arm rotation shaft 12 is provided on the side of the stacking chamber 6, but may be provided on the side of the adhesion chamber 7. Can be shortened in the stacking chamber 6 and the first external moving From the viewpoint of the stroke of the conveyance between the feeding portions 4, it is preferable that the arm rotating shaft 12 is formed on the side close to the side on which the receiving window 9 is formed. In FIG. 6, the two-point chain line indicated by "B" indicates the standby position of the internal transfer arm 11, and the two-point chain line indicated by "C" indicates the position of the internal transfer arm 11 at the pasting chamber 7 ( Adhesive part of the location).
內部搬送臂11的旋動速度係可視狀況而設定速度。因此,內部搬送臂11保持有積層體40時,係可使內部搬送臂11以低速旋動,在未保持有積層體40時,係可使內部搬送臂11以高速旋動。此外,可以內部搬送臂11的旋動的開始與停止成為平順的方式控制加減速。 The rotational speed of the internal transfer arm 11 sets the speed depending on the situation. Therefore, when the internal transfer arm 11 holds the laminated body 40, the internal transfer arm 11 can be rotated at a low speed, and when the laminated body 40 is not held, the internal transfer arm 11 can be rotated at a high speed. Further, the acceleration and deceleration can be controlled such that the start and stop of the rotation of the internal transfer arm 11 become smooth.
如圖6所示,閘門8係形成為在擋門打開的狀態下,進行旋動的內部搬送臂11通過閘門8而將積層體40運至黏貼部收授位置C的寬幅的開口。在閘門8的開閉係可使用以往周知之手段,可適用例如閘閥構造。 As shown in Fig. 6, the shutter 8 is formed such that the inner transfer arm 11 that rotates in the state in which the shutter is opened is transported to the wide portion of the adhesive portion receiving position C through the shutter 8. In the opening and closing of the shutter 8, a conventionally known means can be used, and for example, a gate valve structure can be applied.
〔黏貼室7〕 [Adhesive chamber 7]
黏貼室(黏貼部)7係藉由黏貼在疊合室中相疊合的支承板41及基板42,形成積層體40。黏貼室7係具備有:第二支持銷31、加壓板32及33。 The adhesive chamber (adhesive portion) 7 is formed by laminating the support plate 41 and the substrate 42 which are laminated in the stacking chamber to form the laminated body 40. The adhesive chamber 7 is provided with a second support pin 31 and pressure plates 32 and 33.
第二支持銷31係由內部搬送部10,接受支持在疊合室6中相疊合的支承板41與基板42。其中,第二支持銷31亦與第一支持銷25同樣地,構成為在以支承板41及基板42的中心點為中心的圓上以等間隔作配置。 The second support pin 31 receives the support plate 41 and the substrate 42 which are superposed on each other in the stacking chamber 6 by the internal transfer unit 10. Similarly to the first support pin 25, the second support pin 31 is disposed at equal intervals on a circle centered on the center points of the support plate 41 and the substrate 42.
在被設在黏貼室7內的加壓板32及33係內 置有加熱器(未圖示)。藉此,可在被支持在第二支持銷31的支承板41與基板42與加壓板32及33之間,一邊將支承板41與基板42加熱,一邊夾入來進行按壓。 In the pressure plates 32 and 33 provided in the adhesive chamber 7 A heater (not shown) is provided. Thereby, the support plate 41 and the substrate 42 can be sandwiched between the support plate 41 supported by the second support pin 31 and the substrate 42 and the pressure plates 32 and 33, and pressed.
〔黏貼裝置2的動作〕 [Operation of Adhesive Device 2]
接著,說明用以黏貼本實施形態之黏貼裝置2(疊合室6及黏貼室7)中的支承板41與基板42的概略動作。 Next, a schematic operation of attaching the support plate 41 and the substrate 42 in the pasting device 2 (the overlap chamber 6 and the pasting chamber 7) of the present embodiment will be described.
圖7~18係藉由疊合室6及黏貼室7的內部的狀態,說明本實施形態中的黏貼裝置2的動作的圖。其中為方便說明,關於用以支持及控制雷射照射部21a、間隔件23、及按壓銷26的各個的構件,係省略其圖示。 7 to 18 are views showing the operation of the pasting device 2 in the present embodiment by the state of the inside of the stacking chamber 6 and the pasting chamber 7. For convenience of explanation, the members for supporting and controlling each of the laser irradiation portion 21a, the spacer 23, and the pressing pin 26 are omitted.
(1.支承板41搬入至疊合室6) (1. The support plate 41 is moved into the stacking chamber 6)
在初期階段,搬入支承板41之前的疊合室6中的位置調整部22的中心點係被配置成在X-Y平面中,與4個雷射照射部21a的中心點相一致(參照圖7)。在該狀態下,使用第一外部搬送部4,透過疊合室6的收授窗9,搬入支承板41。在此,支承板41係以在保持室3中被特定的中心點O及切口部41a的方向為基準,藉由第一外部搬送部4,被載置於1組位置調整部22上的預定的位置。其中,在該階段,較佳為間隔件23係先形成為抽出位置,且按壓銷26先形成為待機位置。 In the initial stage, the center point of the position adjusting portion 22 in the stacking chamber 6 before being carried into the support plate 41 is arranged to coincide with the center point of the four laser irradiation portions 21a in the XY plane (refer to FIG. 7). . In this state, the first external transfer unit 4 is used to pass through the receiving window 9 of the stacking chamber 6, and the support plate 41 is carried. Here, the support plate 41 is placed on the set of position adjustment units 22 by the first external transfer unit 4 with respect to the direction of the center point O and the notch portion 41a which are specified in the holding chamber 3, with reference to the direction of the center point O and the notch portion 41a. s position. In this stage, it is preferable that the spacer 23 is formed as the extraction position first, and the pressing pin 26 is first formed as the standby position.
(2.支承板41的位置偵測) (2. Position detection of the support plate 41)
接著,藉由4個雷射照射部21a,對被載置於位置調整部22的支承板41的外周端部照射光,藉此偵測4個雷射照射部21a的中心點、與支承板41的中心點O的偏移(參照圖8)。此外,藉由4個雷射照射部21a之中的1個,偵測支承板41的切口部41a的方向。 Then, the four laser irradiation units 21a irradiate light to the outer peripheral end portion of the support plate 41 placed on the position adjustment unit 22, thereby detecting the center point of the four laser irradiation portions 21a and the support plate. The offset of the center point O of 41 (refer to Fig. 8). Further, the direction of the notch portion 41a of the support plate 41 is detected by one of the four laser irradiation portions 21a.
(3.支承板41的位置調整) (3. Position adjustment of the support plate 41)
接著,藉由使可動載台22a與X-Y平面呈平行地移動,以被載置於位置調整部22的支承板41的中心點O與4個雷射照射部21a的中心點(成為疊合基準的中心點)相重疊的方式調整位置(參照圖9)。其中,在此,藉由使可動載台22a旋動,以支承板41的切口部41a朝向預定的方向的方式進行調整。 Then, the movable stage 22a is moved in parallel with the XY plane, and is placed at the center point O of the support plate 41 of the position adjustment unit 22 and the center point of the four laser irradiation units 21a (the superimposed reference The center point) adjusts the position in an overlapping manner (refer to Figure 9). Here, by rotating the movable stage 22a, the notch portion 41a of the support plate 41 is adjusted so as to face the predetermined direction.
(4.對間隔件23之支承板41收授) (4. Receiving the support plate 41 of the spacer 23)
接著,可動載台22a係使載置於位置調整部22的支承板41移動至在Z方向比間隔件23更為上側且未接觸按壓銷26的位置。接著,在使間隔件23移動至插入位置之後,可動載台22a係移動至在Z方向比間隔件23更為一側。藉此,未改變結束對位的支承板41的水平方向的位置地藉由間隔件23使其支持(參照圖10)。其中,在Z方向使支承板41移動之前的階段,雷射照射部21a的各個係移動至未與支承板41相接觸的位置。 Next, the movable stage 22a moves the support plate 41 placed on the position adjustment unit 22 to a position above the spacer 23 in the Z direction and does not contact the pressing pin 26. Next, after the spacer 23 is moved to the insertion position, the movable stage 22a is moved to the side in the Z direction more than the spacer 23. Thereby, the position in the horizontal direction of the end support plate 41 is not changed by the spacer 23 (see FIG. 10). However, in the stage before the support plate 41 is moved in the Z direction, the respective portions of the laser irradiation portion 21a are moved to a position where they are not in contact with the support plate 41.
(5.基板42搬入至疊合室6) (5. The substrate 42 is moved into the stacking chamber 6)
接著,與支承板41的情形同樣地,在該狀態下,使用第一外部搬送部4,透過疊合室6的收授窗9,搬入基板42。在此,基板42係以在保持室3中被特定的中心點及切口部的方向為基準,藉由第一外部搬送部4被載置於1組位置調整部22上的預定位置(參照圖11)。之後,在關閉收授窗9之後,開始疊合室6的減壓。疊合室6的減壓若以暫時固止結束的時點的疊合室6的減壓狀態及黏貼室7的減壓狀態形成為彼此大致相同的狀態的方式進行即可。較適為10Pa以下。 Next, similarly to the case of the support plate 41, in this state, the first external transfer unit 4 is used, and the substrate 42 is carried through the receiving window 9 of the overlap chamber 6. Here, the substrate 42 is placed at a predetermined position on the one set of position adjustment portions 22 by the first external transfer unit 4 with respect to the direction of the center point and the notch portion which are specified in the holding chamber 3 (refer to the figure). 11). Thereafter, after the receiving window 9 is closed, the decompression of the overlapping chamber 6 is started. The decompression of the superposed chamber 6 may be performed in such a manner that the decompressed state of the superposed chamber 6 at the time when the temporary fixation is completed and the decompressed state of the adhesive chamber 7 are formed in substantially the same state. More suitable for 10Pa or less.
(6.基板42的加熱) (6. Heating of the substrate 42)
接著,藉由使1組位置調整部22朝Z方向的下側移動,將基板42載置於載台部24進行加熱。藉此,使形成在基板42的上面的接著層作熱流動(參照圖12)。 Then, by moving the one set of position adjusting sections 22 toward the lower side in the Z direction, the substrate 42 is placed on the stage portion 24 and heated. Thereby, the adhesive layer formed on the upper surface of the substrate 42 is made to flow (see FIG. 12).
(7.基板42的位置偵測) (7. Position detection of the substrate 42)
接著,與支承板41的情形同樣地,藉由4個雷射照射部21a,對被載置於位置調整部22的基板42的外周端部照射光,藉此偵測4個雷射照射部21a的中心點、與基板42的中心點的偏移(參照圖13)。此外,藉由4個雷射照射部21a之中的1個,偵測基板42的切口部的方向。 Then, in the same manner as in the case of the support plate 41, the four laser irradiation portions 21a irradiate light to the outer peripheral end portion of the substrate 42 placed on the position adjusting portion 22, thereby detecting four laser irradiation portions. The center point of 21a is offset from the center point of the substrate 42 (see Fig. 13). Further, the direction of the notch portion of the substrate 42 is detected by one of the four laser irradiation portions 21a.
(8.基板42的位置調整) (8. Position adjustment of the substrate 42)
接著,藉由使可動載台22a以與X-Y平面呈平行地移動,以被載置於位置調整部22的基板42的中心點與4個雷射照射部21a的中心點(成為疊合基準的中心點)相重疊的方式調整位置(參照圖14)。其中,在此藉由使可動載台22a旋動,基板42的切口部以朝向與支承板41相同的預定的方向的方式進行調整。 Then, by moving the movable stage 22a in parallel with the XY plane, the center point of the substrate 42 placed on the position adjusting unit 22 and the center point of the four laser irradiation units 21a (the superimposed reference line) The center point is adjusted in a superimposed manner (see Fig. 14). Here, by rotating the movable stage 22a, the notch portion of the substrate 42 is adjusted so as to face the same predetermined direction as the support plate 41.
(9.暫時固止) (9. Temporarily fixed)
接著,使按壓銷26藉由支持軸26b由待機位置移動至按壓位置,藉此藉由間隔件23被支持的支承板41以藉由彈簧26a而朝向Z方向的下側被彈壓的方式施加力。接著,將被載置於1組位置調整部22的基板42,使第一支持銷25朝Z方向的上側移動。藉此,使形成在基板42的上面的接著層,移動至被支持在間隔件23的支承板41的底面的近傍。之後,使間隔件23移動至抽出位置,藉此藉由因按壓銷26的彈簧26a被施加的力,藉由第一支持銷25與按壓銷26夾入,來按壓支承板41與基板42(參照圖15)。藉此,將支承板41與基板42相疊合且暫時固止。 Then, the pressing pin 26 is moved from the standby position to the pressing position by the support shaft 26b, whereby the support plate 41 supported by the spacer 23 is biased toward the lower side in the Z direction by the spring 26a. . Next, the substrate 42 placed on the one set of position adjusting portions 22 is moved to move the first support pin 25 toward the upper side in the Z direction. Thereby, the adhesive layer formed on the upper surface of the substrate 42 is moved to the near side of the bottom surface of the support plate 41 supported by the spacer 23. Thereafter, the spacer 23 is moved to the extraction position, whereby the support plate 41 and the substrate 42 are pressed by the first support pin 25 and the pressing pin 26 by the force applied by the spring 26a of the pressing pin 26 ( Refer to Figure 15). Thereby, the support plate 41 and the substrate 42 are superposed and temporarily fixed.
(10.疊合結束) (10. End of stacking)
在將支承板41與基板42相疊合之後,將按壓銷26送回至待機位置。此外,使第一支持銷25朝Z方向的下 側移動。藉此,將相疊合的支承板41與基板42在內部搬送部10進行收授(參照圖16)。 After the support plate 41 and the substrate 42 are overlapped, the pressing pin 26 is returned to the standby position. In addition, the first support pin 25 is placed in the Z direction Side movement. Thereby, the superposed support plate 41 and the board|substrate 42 are received in the internal conveyance part 10 (refer FIG. 16).
(11.積層體40搬送至黏貼室7) (11. The laminated body 40 is transferred to the pasting chamber 7)
接著,打開閘門8的擋門,藉由內部搬送部10,將相疊合的支承板41與基板42由疊合室6搬送至黏貼室7。在此,相疊合的支承板41與基板42係在黏貼室7中,藉由第二支持銷31上予以支持(參照圖17)。 Next, the shutter of the shutter 8 is opened, and the inner support portion 10 and the substrate 42 are transferred from the stacking chamber 6 to the pasting chamber 7 by the inner transfer portion 10. Here, the overlapping support plates 41 and 42 are attached to the bonding chamber 7, and are supported by the second support pins 31 (see Fig. 17).
(12.支承板41與基板42的黏貼) (12. Adhesion of the support plate 41 and the substrate 42)
接著,在支持在第二支持銷31的狀態下,使加壓板33在Z方向下降,藉此使其接觸支承板41的上面。接著,使第二支持銷31、與加壓板33以相同速度下降。藉此,在加壓板32及33之間,夾入支承板41與基板42,一邊按壓一邊加熱(參照圖18)。藉此,黏貼支承板41與基板42,形成積層體40。 Next, in a state where the second support pin 31 is supported, the pressure plate 33 is lowered in the Z direction, thereby bringing it into contact with the upper surface of the support plate 41. Next, the second support pin 31 is lowered at the same speed as the pressure plate 33. Thereby, the support plate 41 and the substrate 42 are sandwiched between the pressure plates 32 and 33, and heated while being pressed (see FIG. 18). Thereby, the support plate 41 and the substrate 42 are adhered to form the laminated body 40.
<黏貼方法> <Paste method>
本發明之一實施形態之黏貼方法係具備有:將基板42、及支持基板42的支承板41,在疊合室6內相疊合的疊合工程;及將相疊合的基板42與支承板41,在黏貼室7內進行黏貼的黏貼工程的黏貼方法,疊合工程係包含:偵測基板42及支承板41的各個中的外周端部的位置,求出基板42及支承板41的各個中的中心點的位置偵測階 段;及根據所求出的中心點的位置,調整基板42及支承板O的各個的平面方向中的位置的位置調整階段;及將經調整位置的基板42與支承板41相疊合的疊合階段。 The pasting method of the embodiment of the present invention includes a superimposing process of superimposing the substrate 42 and the support plate 41 of the support substrate 42 in the stacking chamber 6; and supporting the substrates 42 and the substrates The bonding method of the bonding process of the bonding process in the bonding chamber 7 includes: detecting the position of the outer peripheral end of each of the substrate 42 and the supporting plate 41, and determining the position of the substrate 42 and the supporting plate 41. Position detection order of the center point in each And a position adjustment phase for adjusting a position in a planar direction of each of the substrate 42 and the support plate O according to the obtained position of the center point; and a stack of the substrate 42 and the support plate 41 of the adjusted position In phase.
此外,一實施形態之黏貼方法較佳為在基板42及支承板41彼此相對向的二面之中的至少任一面,積層有接著層,在疊合階段係在將形成有接著層的基板42或支承板41進行加熱之後,將經調整位置的基板42及支承板41之中的任一者的一部分區域、與經調整位置的基板42及支承板41之中的另一者的一部分區域相疊合、夾入,藉此進行按壓。 Further, in the attaching method of the embodiment, it is preferable that at least one of the two faces of the substrate 42 and the support plate 41 facing each other is laminated with an adhesive layer, and in the overlapping step, the substrate 42 on which the adhesive layer is to be formed is formed. After the support plate 41 is heated, a part of the area of the substrate 42 and the support plate 41 at the adjusted position, and a part of the other of the substrate 42 and the support plate 41 at the adjusted position are The film is superposed, sandwiched, and pressed.
此外,一實施形態之黏貼方法若在位置偵測階段,由與平面方向(X-Y方向)呈垂直的一方向,偵測基板42及支承板41的各個的外周端部的位置即可。 Further, in the pasting method of the embodiment, the position of the outer peripheral end portion of each of the substrate 42 and the support plate 41 may be detected in a direction perpendicular to the plane direction (X-Y direction) in the position detecting stage.
此外,一實施形態之黏貼方法較佳為在上述位置調整階段,在與平面方向呈平行的二方向移動,藉此調整支承板41及基板42的各個中的中心點的位置,且以該中心點為中心進行旋動,藉此調整基板42及支承板41的各個的方向。 Further, in the above-described position adjustment step, the pasting step of the embodiment preferably moves in two directions parallel to the plane direction, thereby adjusting the position of the center point of each of the support plate 41 and the substrate 42 with the center The point is rotated centrally, thereby adjusting the respective directions of the substrate 42 and the support plate 41.
亦即,在一實施形態中,黏貼方法的疊合工程及黏貼工程係可使用上述之本發明之黏貼系統1、及黏貼裝置2來實施。此外,本發明之黏貼方法之一實施形態係依據上述之黏貼系統1、及黏貼裝置2之說明者,因此省略其詳細說明。 That is, in one embodiment, the lamination process and the pasting process of the pasting method can be carried out using the above-described pasting system 1 and adhesive device 2 of the present invention. Further, one embodiment of the pasting method of the present invention is based on the above-described pasting system 1 and the pasting device 2, and thus detailed description thereof will be omitted.
本發明並非為限定於上述實施形態者,可在 請求項所示之範圍內作各種變更。亦即,關於將在請求項所示範圍內作適當變更的技術手段組合所得之實施形態,亦包含在本發明之技術範圍內。 The present invention is not limited to the above embodiment, and Various changes are made within the scope of the claims. In other words, the embodiment obtained by combining the technical means that is appropriately changed within the scope of the claims is also included in the technical scope of the present invention.
[產業上可利用性] [Industrial availability]
本發明係可使真空下的基板及支持體的貼合精度提升,因此可廣泛利用在工業製品的製造領域。 The present invention can improve the bonding precision of the substrate and the support under vacuum, and thus can be widely utilized in the field of manufacturing industrial products.
2‧‧‧黏貼裝置 2‧‧‧Adhesive device
6‧‧‧疊合室(疊合部) 6‧‧‧Positioning room (stacking part)
7‧‧‧黏貼室(黏貼部) 7‧‧‧Adhesive room (adhesive part)
8‧‧‧閘門 8‧‧‧ gate
10‧‧‧內部搬送部 10‧‧‧Internal Transport Department
21‧‧‧位置偵測部 21‧‧‧Location Detection Department
21a‧‧‧雷射照射部(位置偵測部) 21a‧‧‧Laser illumination unit (position detection unit)
21b‧‧‧受光部(位置偵測部) 21b‧‧‧Lighting Department (Position Detection Department)
21c‧‧‧窗部(位置偵測部) 21c‧‧‧Window (Location Detection Department)
22‧‧‧位置調整部(位置調整部) 22‧‧‧ Position adjustment unit (position adjustment unit)
22a‧‧‧可動載台(位置調整部) 22a‧‧‧Moving stage (position adjustment unit)
23‧‧‧間隔件(保持部) 23‧‧‧ Spacer (holding section)
24a‧‧‧載置面 24a‧‧‧Loading surface
25‧‧‧第一支持銷(暫時固止部) 25‧‧‧First Support Pin (Temporary Fixing Department)
26‧‧‧按壓銷(暫時固止部) 26‧‧‧Pushing pin (temporary fixing)
26a‧‧‧彈簧(暫時固止部) 26a‧‧‧Spring (temporary restraint)
26b‧‧‧支持軸(暫時固止部) 26b‧‧‧Support shaft (temporary restraint)
31‧‧‧第二支持銷 31‧‧‧second support pin
32、33‧‧‧加壓板 32, 33‧‧‧ Pressurized plate
Claims (13)
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JP2016-028401 | 2016-02-17 | ||
JP2016028401A JP6596353B2 (en) | 2016-02-17 | 2016-02-17 | Pasting device, pasting system, and pasting method |
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TW201737397A true TW201737397A (en) | 2017-10-16 |
TWI701755B TWI701755B (en) | 2020-08-11 |
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TW105142287A TWI701755B (en) | 2016-02-17 | 2016-12-20 | Bonding system and bonding method |
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JP (1) | JP6596353B2 (en) |
TW (1) | TWI701755B (en) |
Cited By (1)
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CN110729217A (en) * | 2019-10-22 | 2020-01-24 | 江苏佳晟精密设备科技有限公司 | Device for mounting semiconductor chip |
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CN110660723B (en) * | 2018-06-29 | 2022-05-10 | 上海微电子装备(集团)股份有限公司 | Manipulator, bonding cavity, wafer bonding system and bonding method |
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CN102209621B (en) * | 2008-11-06 | 2014-09-03 | 芝浦机械电子装置股份有限公司 | Bonding apparatus and bonding method |
JP5895332B2 (en) * | 2010-04-01 | 2016-03-30 | 株式会社ニコン | Position detection apparatus, overlay apparatus, position detection method, and device manufacturing method |
JP6001941B2 (en) * | 2012-07-11 | 2016-10-05 | 東京応化工業株式会社 | Laminate forming method and laminate forming system |
JP5589045B2 (en) * | 2012-10-23 | 2014-09-10 | 日東電工株式会社 | Semiconductor wafer mounting method and semiconductor wafer mounting apparatus |
JP6188123B2 (en) * | 2012-12-28 | 2017-08-30 | 芝浦メカトロニクス株式会社 | Bonding device and bonding processing method |
JP5759086B2 (en) * | 2013-03-29 | 2015-08-05 | 東京応化工業株式会社 | Pasting method |
KR101708143B1 (en) * | 2013-06-17 | 2017-02-17 | 에베 그룹 에. 탈너 게엠베하 | Device and method for aligning substrates |
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CN110729217A (en) * | 2019-10-22 | 2020-01-24 | 江苏佳晟精密设备科技有限公司 | Device for mounting semiconductor chip |
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TWI701755B (en) | 2020-08-11 |
JP2017147346A (en) | 2017-08-24 |
JP6596353B2 (en) | 2019-10-23 |
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