TW201716155A - Liquid collection apparatus for spin etcher - Google Patents

Liquid collection apparatus for spin etcher Download PDF

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TW201716155A
TW201716155A TW104136751A TW104136751A TW201716155A TW 201716155 A TW201716155 A TW 201716155A TW 104136751 A TW104136751 A TW 104136751A TW 104136751 A TW104136751 A TW 104136751A TW 201716155 A TW201716155 A TW 201716155A
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collection
contact
collecting
fluid
ring
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TW104136751A
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TWI559990B (en
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許明哲
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弘塑科技股份有限公司
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Abstract

The present invention provides a liquid collection apparatus for a spin etcher, which is utilized to collect fluid splashing from a surface of a substrate. The liquid collection apparatus includes a plurality of collection units and driving devices. The collection units are disposed around the substrate. The driving devices are respectively coupled to the collection units and utilized to independently control the lifting of each collection unit so that the collection units can collect different fluid respectively for overcoming the problem of non-synchronization in lifting devices employing a plurality of pneumatic cylinders in the prior art.

Description

旋轉蝕刻清洗機台之流體收集裝置 Rotary etching cleaning machine fluid collecting device

本發明係關於一種流體收集裝置,尤指一種適用於基板之旋轉蝕刻清洗機台之流體收集裝置。 The present invention relates to a fluid collection device, and more particularly to a fluid collection device suitable for use in a rotary etch cleaning machine of a substrate.

在半導體晶圓、顯示器基板、太陽能基板、LED基板等的製程中,都需要對基板進行處理,例如對基板的表面供給處理液(例如化學品或去離子水等)進行蝕刻、清洗等處理程序,而在該基板處理中,則必須藉由一流體處理裝置來針對使用過之處理液進行收集、排液、回收等後續處理。然而,蝕刻過程產生的廢液多為有毒液體,必須謹慎處理。因此,如何收集甚至回收再利用不同之廢液為一重要課題。 In a semiconductor wafer, a display substrate, a solar substrate, an LED substrate, or the like, it is necessary to process the substrate, for example, a process of supplying a processing liquid (for example, a chemical or deionized water) to the surface of the substrate, and cleaning. In the substrate processing, subsequent processing such as collection, drainage, and recovery of the used treatment liquid must be performed by a fluid processing device. However, the waste liquid generated by the etching process is mostly a toxic liquid and must be handled with care. Therefore, how to collect and even recycle and reuse different waste liquids is an important issue.

習知的旋轉蝕刻清洗機台可參考台灣新型專利號M505052U,其揭露在旋轉蝕刻槽中設有一載台用以承載及固定晶圓,載台下方之轉軸可高速旋轉,蝕刻液則由上方的液體供給單元流下。流體收集裝置其採用包括多個收集環的收集環模組以收集不同的液體,當轉軸高速旋轉時,可將廢液離心拋向收集環。該些收集環必須利用外部升降機構(例如升降氣壓缸)驅動以相對進行升降作動。在進行不同液體收集時,可事先升降特定收集環,使液體順著各該收集環的引導由各該收集環下方的排液管排出。 The conventional rotary etching cleaning machine can refer to Taiwan's new patent No. M505052U, which discloses that a stage is provided in the rotary etching tank for carrying and fixing the wafer, and the rotating shaft below the stage can be rotated at a high speed, and the etching liquid is from above. The liquid supply unit flows down. The fluid collection device employs a collection ring module including a plurality of collection rings to collect different liquids, and when the shaft rotates at a high speed, the waste liquid can be centrifugally thrown toward the collection ring. The collection rings must be driven by an external lifting mechanism (such as a lifting pneumatic cylinder) to move relative to each other. In the case of different liquid collections, a particular collection ring can be raised and lowered in advance so that the liquid is discharged through the discharge tubes below each collection ring along the guidance of each collection ring.

然而,為了帶動一個收集環升降,一般在收集環周圍設置多個升降氣壓缸以平穩的控制收集環的升降,但也因採用多個氣壓缸,如有某一氣壓缸的做動不同步,系統即可能產生警報而停機,進而導致蝕刻液可能對基板過度侵蝕而需報廢掉該基板,或因停機修護降低設備產能,導致生產成本提高及產品良率下降。 However, in order to drive a lifting and lowering of the collecting ring, a plurality of lifting pneumatic cylinders are generally arranged around the collecting ring to smoothly control the lifting and lowering of the collecting ring, but also because a plurality of pneumatic cylinders are used, if a certain pneumatic cylinder is not synchronized, The system may generate an alarm and stop, which may cause the etching liquid to excessively erode the substrate and need to scrap the substrate, or reduce the equipment capacity due to the shutdown repair, resulting in an increase in production cost and a decrease in product yield.

有鑑於此,為了提升流體收集裝置的可靠度,本發明之目的在於提供一種旋轉蝕刻清洗機台之流體收集裝置,其透過每一收集環對應一個驅動裝置,克服了習知技術中採用多個氣壓缸來升降一個收集環而容易造成昇降構件不同步的問題。 In view of the above, in order to improve the reliability of the fluid collection device, it is an object of the present invention to provide a fluid collection device for a rotary etching cleaning machine that overcomes the use of multiple devices in the prior art by transmitting a drive device corresponding to each collection ring. The pneumatic cylinder lifts a collecting ring and easily causes the lifting members to be out of synchronization.

為達成上述目的,本發明提供之旋轉蝕刻清洗機台之流體收集裝置用於收集由一基板表面飛濺之流體,該流體收集裝置包括複數個收集單元及複數個驅動裝置。該些收集單元環設於該基板之周圍。該些驅動裝置分別連接於該些收集單元,用於獨立控制各個收集單元之升降,使得該些收集單元可各自收集不同之流體,其中該些驅動裝置的數量等於該些收集單元的數量。 To achieve the above object, the present invention provides a fluid collection device for a rotary etch cleaning machine for collecting fluid splashed by a substrate surface, the fluid collection device comprising a plurality of collection units and a plurality of driving devices. The collection unit rings are disposed around the substrate. The driving devices are respectively connected to the collecting units for independently controlling the lifting and lowering of the respective collecting units, so that the collecting units can respectively collect different fluids, wherein the number of the driving devices is equal to the number of the collecting units.

在一較佳實施例中,該些收集單元包括複數個收集環,該些收集環依序徑向設置。 In a preferred embodiment, the collection units include a plurality of collection rings that are radially disposed.

在一較佳實施例中,每一驅動裝置包括一連結機構,該連接機構用於穩定地帶動該收集環的升降,避免昇降構件不同步。具體地,該連結機構耦接於該收集環之外週緣上之一第一觸點及一第二觸點。 In a preferred embodiment, each of the driving devices includes a coupling mechanism for stably driving the lifting and lowering of the collecting ring to prevent the lifting members from being out of synchronization. Specifically, the connecting mechanism is coupled to one of the first contact and the second contact on the outer circumference of the collecting ring.

在此較佳實施例中,該第一觸點及該第二觸點於該收集環 之該外週緣上定義出一弧度,該弧度介於π/2至π。 In the preferred embodiment, the first contact and the second contact are in the collecting ring An arc is defined on the outer circumference, and the arc is between π/2 and π.

在此較佳實施例中,該收集環包括位於該外週緣上之連接於該第一觸點及該第二觸點之補強件。 In the preferred embodiment, the collecting ring includes a reinforcing member connected to the first contact and the second contact on the outer periphery.

在另一較佳實施例中,該連結機構包括連接於該第一觸點及該第二觸點的支撐件,該支撐件設置於該收集環之該外週緣之底部。 In another preferred embodiment, the coupling mechanism includes a support member coupled to the first contact and the second contact, the support member being disposed at a bottom of the outer circumference of the collection ring.

在一較佳實施例中,該驅動裝置包括一滑軌,該連接機構包括連接於該滑軌上做線性移動之一環抱臂,該環抱臂具有一第一端點及一第二端點。 In a preferred embodiment, the driving device includes a slide rail, and the connecting mechanism includes a loop arm connected to the slide rail for linear movement, the loop arm having a first end point and a second end point.

在此較佳實施例中,該連結機構還包括:一第一頂柱,耦接於該環抱臂之該第一端點;一第二頂柱,耦接於該環抱臂之該第二端點;一第一吊柱,耦接於該收集環之該第一觸點;一第二吊柱,耦接於該收集環之該第二觸點;一第一鎖合件,用於鎖合該第一頂柱以及該第一吊柱;以及一第二鎖合件,用於鎖合該第二頂柱以及該第二吊柱。 In the preferred embodiment, the connecting mechanism further includes: a first top post coupled to the first end of the hoop arm; and a second top post coupled to the second end of the hoop arm a first suspension post coupled to the first contact of the collection ring; a second suspension post coupled to the second contact of the collection ring; a first locking member for locking And the first top post and the first hanging post; and a second locking member for locking the second top post and the second hanging post.

在此較佳實施例中,該第一鎖合件以及該第二鎖合件具有至少一水平調整螺絲,用於微調該收集環的水平。 In the preferred embodiment, the first locking member and the second locking member have at least one horizontal adjusting screw for finely adjusting the level of the collecting ring.

相較於習知技術,本發明之流體收集裝置,其透過驅動裝置一對一地連接該些收集環,而克服了習知採用多個氣壓缸而有不同步的問題。另外,為了強化升降時收集環的水平穩定性,透過本發明的連結機構之環抱臂對該收集環外週緣上之第一觸點及第二觸點作為抬升的支點,而可順利平穩的進行升降。 Compared with the prior art, the fluid collecting device of the present invention connects the collecting rings one-to-one through the driving device, thereby overcoming the conventional problem of using a plurality of pneumatic cylinders to be out of synchronization. In addition, in order to enhance the horizontal stability of the collecting ring during lifting, the first contact and the second contact on the outer circumference of the collecting ring are used as the lifting fulcrum of the lifting arm of the connecting mechanism of the present invention, and can be smoothly and smoothly performed. Lifting.

為讓本發明之上述和其他目的、特徵、和優點能更明顯易懂,配合所附圖式,作詳細說明如下: The above and other objects, features, and advantages of the present invention will become more apparent and understood.

10‧‧‧基板 10‧‧‧Substrate

11‧‧‧載台 11‧‧‧ stage

12‧‧‧轉軸 12‧‧‧ shaft

20‧‧‧收集單元 20‧‧‧Collection unit

21‧‧‧洩液管 21‧‧‧Draining tube

22‧‧‧收集環 22‧‧‧Collection ring

23‧‧‧外週緣 23‧‧‧ outer periphery

24‧‧‧第一觸點 24‧‧‧First contact

25‧‧‧第二觸點 25‧‧‧second contact

30‧‧‧驅動裝置 30‧‧‧ drive

31‧‧‧滑軌 31‧‧‧Slide rails

32‧‧‧連結機構 32‧‧‧Linked institutions

33‧‧‧環抱臂 33‧‧‧ hoop arm

34‧‧‧驅動源 34‧‧‧ drive source

37‧‧‧支撐件 37‧‧‧Support

50‧‧‧支柱 50‧‧‧ pillar

100‧‧‧旋轉蝕刻清洗機台 100‧‧‧Rotary Etching Washing Machine

120‧‧‧流體收集裝置 120‧‧‧Fluid collecting device

222‧‧‧第一收集環 222‧‧‧First collection ring

224‧‧‧第二收集環 224‧‧‧Second collection ring

225‧‧‧補強件 225‧‧‧Reinforcement

332‧‧‧第一端點 332‧‧‧ first endpoint

333‧‧‧第二端點 333‧‧‧second endpoint

334‧‧‧第一頂柱 334‧‧‧First pillar

335‧‧‧第二頂柱 335‧‧‧second top pillar

336‧‧‧第一吊柱 336‧‧‧The first hanging column

337‧‧‧第二吊柱 337‧‧‧Second hanging column

338‧‧‧第一鎖合件 338‧‧‧First lock

339‧‧‧第二鎖合件 339‧‧‧Second locks

340‧‧‧水平調整螺絲 340‧‧‧Horizontal adjustment screw

342‧‧‧第一鎖合塊 342‧‧‧First lock block

344‧‧‧第二鎖合塊 344‧‧‧Second lock

第1圖為本發明之一較佳實施例之旋轉蝕刻清洗機台之剖面示意圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing a rotary etching cleaning machine in accordance with a preferred embodiment of the present invention.

第2圖為此較佳實施例之流體收集裝置之立體示意圖。 Figure 2 is a perspective view of the fluid collection device of the preferred embodiment.

第3圖為本實施例之流體收集裝置收集第一流體時之剖面示意圖。 Figure 3 is a schematic cross-sectional view showing the first fluid collected by the fluid collection device of the present embodiment.

第4圖為本實施例之流體收集裝置收集第二流體時之剖面示意圖。 Figure 4 is a schematic cross-sectional view of the fluid collection device of the present embodiment when the second fluid is collected.

第5圖為對應第3圖之流體收集裝置之立體視圖。 Figure 5 is a perspective view of the fluid collection device corresponding to Figure 3.

第6圖為本實施例之流體收集裝置之俯視示意圖。 Figure 6 is a top plan view of the fluid collection device of the present embodiment.

本發明之數個較佳實施例藉由所附圖式與下面之說明作詳細描述,在不同的圖式中,相同的元件符號表示相同或相似的元件。 The present invention has been described in detail with reference to the preferred embodiments in the

請參照第1圖及第2圖,第1圖為本發明之一較佳實施例之旋轉蝕刻清洗機台之剖面示意圖,第2圖為此較佳實施例之流體收集裝置之立體示意圖。如圖所示,本實施例之旋轉蝕刻清洗機台100之流體收集裝置120用於收集由一基板10表面飛濺之流體。詳細而言,旋轉蝕刻清洗機台100設有一載台11,載台11下方則連設一轉軸12,可承載及旋轉基板10,其中該基板10可為半導體晶圓、顯示器基板、太陽能基板、LED基板等。該流體收集裝置120包括複數個收集單元20及複數個驅動裝置30。 Referring to FIG. 1 and FIG. 2, FIG. 1 is a schematic cross-sectional view of a rotary etching cleaning machine according to a preferred embodiment of the present invention, and FIG. 2 is a perspective view of the fluid collecting device of the preferred embodiment. As shown, the fluid collection device 120 of the rotary etch cleaning machine 100 of the present embodiment is used to collect fluid splashed by the surface of a substrate 10. In detail, the rotary etch cleaning machine 100 is provided with a stage 11 , and a rotating shaft 12 is disposed under the stage 11 to carry and rotate the substrate 10 , wherein the substrate 10 can be a semiconductor wafer, a display substrate, a solar substrate, LED substrate, etc. The fluid collection device 120 includes a plurality of collection units 20 and a plurality of drive devices 30.

該些收集單元20環設於該基板10之周圍,詳細而言,該些收集單元20包括複數個收集環22連設於收集環22底部的洩液管21,該些收集環22依序徑向設置,在此實施例中,該些收集環22包括第一收集環222及第二收集環224,第一收集環222及第二收集環224為同心環狀,其中位於外 側的第一收集環222亦可稱為門環。本實施例之流體收集裝置120在第1圖之狀態時,該基板10露出於整個收集單元20外,此時可加載或卸載基板10。。值得一提的是,本發明之收集單元20可為環狀或管狀等形式,且可視所收集流體種類向外增設,如三個收集環或四個收集環等。 The collecting unit 20 is disposed around the substrate 10. In detail, the collecting unit 20 includes a plurality of collecting rings 22 connected to the bottom of the collecting ring 22, and the collecting rings 22 are sequentially arranged. In the embodiment, the collecting ring 22 includes a first collecting ring 222 and a second collecting ring 224. The first collecting ring 222 and the second collecting ring 224 are concentric rings, wherein the outer collecting ring 224 is located outside. The first collection ring 222 on the side may also be referred to as a door ring. When the fluid collection device 120 of the present embodiment is in the state of FIG. 1, the substrate 10 is exposed outside the collection unit 20, and the substrate 10 can be loaded or unloaded at this time. . It is worth mentioning that the collecting unit 20 of the present invention may be in the form of a ring or a tube, and may be outwardly added depending on the type of fluid collected, such as three collecting rings or four collecting rings.

請參照第3圖至第4圖,第3圖為本實施例之流體收集裝置120收集第一流體時之剖面示意圖,第4圖為本實施例之流體收集裝置120收集第二流體時之剖面示意圖。如第3圖所示,第一收集環222上升,而由第一收集環222收集第一流體。如第4圖所示,當第二收集環224也上升時,而由第二收集環224收集第二流體。以下將詳細說明驅動收集單元20之驅動裝置30。 Please refer to FIG. 3 to FIG. 4 . FIG. 3 is a schematic cross-sectional view of the fluid collection device 120 of the present embodiment when collecting the first fluid, and FIG. 4 is a cross section of the fluid collection device 120 of the present embodiment when the second fluid is collected. schematic diagram. As shown in FIG. 3, the first collection ring 222 rises and the first collection ring 222 collects the first fluid. As shown in FIG. 4, when the second collection ring 224 also rises, the second collection ring 224 collects the second fluid. The drive unit 30 that drives the collection unit 20 will be described in detail below.

如第2圖所示,該些驅動裝置30分別連接於該些收集單元20(即第一收集環222及第二收集環224),用於獨立控制各個收集單元20之升降,使得該些收集單元20可各自收集不同之流體,其中該些驅動裝置30的數量等於該些收集單元20的數量。在此實施例中,收集單元20的數量為兩個,驅動裝置30的數量也為兩個。以下將詳細說明驅動裝置30的做動原理。 As shown in FIG. 2, the driving devices 30 are respectively connected to the collecting units 20 (ie, the first collecting ring 222 and the second collecting ring 224) for independently controlling the lifting of each collecting unit 20, so that the collecting is performed. Units 20 can each collect different fluids, wherein the number of such drive devices 30 is equal to the number of collection units 20. In this embodiment, the number of collection units 20 is two, and the number of drive units 30 is also two. The principle of operation of the drive unit 30 will be described in detail below.

如第5圖所示,第5圖為對應第3圖之流體收集裝置120之立體視圖,在第5圖中,驅動裝置30驅動第一收集環222上升。如圖所示,每一驅動裝置30包括一連結機構32及驅動源34,驅動源34與用於驅動連結機構32。舉例而言,驅動源34包括氣壓缸、油壓缸、線性馬達等線性往返驅動源,本實施例中以氣壓缸為例,惟本發明不限於此。該連接機構32用於穩定地帶動該收集環22的升降。 As shown in Fig. 5, Fig. 5 is a perspective view of the fluid collecting device 120 corresponding to Fig. 3. In Fig. 5, the driving device 30 drives the first collecting ring 222 to rise. As shown, each drive unit 30 includes a linkage mechanism 32 and a drive source 34 for driving the linkage mechanism 32. For example, the driving source 34 includes a linear reciprocating driving source such as a pneumatic cylinder, a hydraulic cylinder, a linear motor, etc. In the present embodiment, a pneumatic cylinder is taken as an example, but the invention is not limited thereto. The connecting mechanism 32 is used to stably lift the lifting and lowering of the collecting ring 22.

請參照第6圖,第6圖為本實施例之流體收集裝置120之俯視 示意圖。具體地,該連結機構32耦接於該收集環22之外週緣23上之一第一觸點24及一第二觸點25。圖式中,分別繪示出第一收集環222及第二收集環224之第一觸點24及第二觸點25。需注意的是,第一觸點24及第二觸點25並非如圖式中位於螺栓上,圖式僅繪示出外週緣23上的相對位置。具體而言,該第一觸點24及該第二觸點25於該收集環22之該外週緣23上定義出一弧度,該弧度介於π/2至π,也就是90度至180度。在此實施例中,如圖所示,第一收集環222之第一觸點24及第二觸點25定義出弧度r1,第二收集環224之第一觸點24及第二觸點25定義出弧度r2,第一收集環222之弧度r1大於第二收集環224的弧度r2。 Please refer to FIG. 6. FIG. 6 is a plan view of the fluid collection device 120 of the present embodiment. schematic diagram. Specifically, the connecting mechanism 32 is coupled to one of the first contact 24 and the second contact 25 on the outer periphery 23 of the collecting ring 22 . In the drawing, the first contact 24 and the second contact 25 of the first collecting ring 222 and the second collecting ring 224 are respectively illustrated. It should be noted that the first contact 24 and the second contact 25 are not located on the bolt in the figure, and the drawing only shows the relative position on the outer circumference 23. Specifically, the first contact 24 and the second contact 25 define an arc on the outer circumference 23 of the collecting ring 22, and the arc is between π/2 and π, that is, 90 degrees to 180 degrees. . In this embodiment, as shown, the first contact 24 and the second contact 25 of the first collection ring 222 define a curvature r1, and the first contact 24 and the second contact 25 of the second collection ring 224 The arc r2 is defined, and the arc r1 of the first collecting ring 222 is greater than the arc r2 of the second collecting ring 224.

如第2圖及第6圖所示,為了強化收集環22升降的穩定性,該收集環22還包括位於該外週緣23上之連接於該第一觸點24及該第二觸點25之補強件225。在此實施例中,補強件225設於第一收集環222之外週緣23上。如第2圖及第5圖所示,除此之外,該連結機構32還可包括連接於該第一觸點24及該第二觸點25的支撐件37,該支撐件37設置於該收集環22之該外週緣23之底部。在此實施例中,支撐件37用於支撐第二收集環224,以穩固第二收集環224的升降。 As shown in FIG. 2 and FIG. 6, in order to enhance the stability of the lifting and lowering of the collecting ring 22, the collecting ring 22 further includes a first connecting portion 24 and a second contact 25 on the outer peripheral edge 23. Reinforcing member 225. In this embodiment, the reinforcing member 225 is disposed on the outer periphery 23 of the first collecting ring 222. As shown in FIG. 2 and FIG. 5, the connection mechanism 32 may further include a support member 37 connected to the first contact 24 and the second contact 25, and the support member 37 is disposed on the support member 37. The bottom of the outer periphery 23 of the ring 22 is collected. In this embodiment, the support member 37 is used to support the second collection ring 224 to stabilize the lifting of the second collection ring 224.

以下說明此實施例之連接機構32之具體結構。如第5圖所示,該驅動裝置30包括一滑軌31,該連接機構32包括連接於該滑軌31上做線性移動之一環抱臂33,該環抱臂33具有一第一端點332及一第二端點333。在此實施例中,驅動第一收集環222的滑軌31與驅動第二收集環224的滑軌31兩者設置在一支柱50的兩側,其對應的驅動源34也設置在支柱50的兩側,以節省收集單元20底下的空間。請一併參照第2圖,在此以連接第一 收集環222之連結機構32為例,連結機構32還包括第一頂柱334、第二頂柱335、第一吊柱336、第二吊柱337、第一鎖合件338及第二鎖合件339。具體地,第一頂柱334耦接於該環抱臂33之該第一端點332;第二頂柱335耦接於該環抱臂33之該第二端點333;第一吊柱336耦接於該收集環22之該第一觸點24;第二吊柱337耦接於該收集環22之該第二觸點25;第一鎖合件338用於鎖合該第一頂柱334以及該第一吊柱336;第二鎖合件339用於鎖合該第二頂柱335以及該第二吊柱337。需注意的是,連接第二收集環224之連結機構32為與上述相同,此不予以贅述。 The specific structure of the connecting mechanism 32 of this embodiment will be described below. As shown in FIG. 5, the driving device 30 includes a sliding rail 31. The connecting mechanism 32 includes a circular arm 33 connected to the sliding rail 31 for linear movement. The embracing arm 33 has a first end point 332 and A second endpoint 333. In this embodiment, both the slide rail 31 driving the first collecting ring 222 and the sliding rail 31 driving the second collecting ring 224 are disposed on both sides of a strut 50, and the corresponding driving source 34 is also disposed on the strut 50. On both sides, to save space under the collection unit 20. Please refer to Figure 2 together, here to connect first For example, the connecting mechanism 32 of the collecting ring 222 further includes a first top post 334, a second top post 335, a first hanging post 336, a second hanging post 337, a first locking member 338 and a second locking. Piece 339. Specifically, the first top post 334 is coupled to the first end point 332 of the hoop arm 33; the second top post 335 is coupled to the second end point 333 of the hoop arm 33; the first suspension post 336 is coupled The first contact 24 of the collecting ring 22; the second suspension post 337 is coupled to the second contact 25 of the collecting ring 22; the first locking member 338 is used for locking the first top post 334 and The first suspension post 336 is configured to lock the second top post 335 and the second suspension post 337. It should be noted that the connection mechanism 32 connecting the second collection ring 224 is the same as the above, and details are not described herein.

如第2圖及第5圖所示,該第一鎖合件338以及該第二鎖合件339具有至少一水平調整螺絲340,水平調整螺絲340用於微調該收集環22的水平。詳細來說,第一鎖合件338以及該第二鎖合件339各具有交錯的第一鎖合塊342及第二鎖合塊344。第一鎖合塊342及第二鎖合塊344分別透過螺栓鎖合在第一/第二頂柱334、335及第一/第二吊柱336、337,待水平調整螺絲340調整水平後,才由螺栓結合兩交錯的第一鎖合塊342及第二鎖合塊344,進而完成連結機構32的固定。需注意的是,上述連結機構32的具體結構僅為一個實施例,在其他實施例中,連結機構也可設置在收集單元20的上方而不佔用收集單元20下方的空間。 As shown in FIGS. 2 and 5, the first locking member 338 and the second locking member 339 have at least one horizontal adjusting screw 340 for finely adjusting the level of the collecting ring 22. In detail, the first locking member 338 and the second locking member 339 each have a staggered first locking block 342 and a second locking block 344. The first locking block 342 and the second locking block 344 are respectively bolted to the first/second top posts 334 and 335 and the first/second hanging posts 336 and 337, and after the horizontal adjusting screw 340 is adjusted horizontally, The two interlocking first locking blocks 342 and the second locking block 344 are combined by bolts to complete the fixing of the connecting mechanism 32. It should be noted that the specific structure of the above-mentioned connecting mechanism 32 is only one embodiment. In other embodiments, the connecting mechanism may also be disposed above the collecting unit 20 without occupying the space below the collecting unit 20.

綜上所述,本發明之流體收集裝置120透過驅動裝置30一對一地連接該些收集環22,而克服了習知採用多個氣壓缸而有昇降構件不同步的問題。另外,為了強化單一驅動裝置30驅動收集環22升降時的水平性,透過本發明的連結機構32之環抱臂33對該收集環22外週緣23上之第一觸點24及第二觸點25作為抬升的支點,而可順利平穩的進行升降。由上可知, 本發明之可大幅改善流體收集裝置運作的可靠度,進而減少設備停機及產生廢料的機率。 In summary, the fluid collection device 120 of the present invention connects the collection rings 22 one-to-one through the drive device 30, thereby overcoming the conventional problem of using a plurality of pneumatic cylinders to have the lifting members out of synchronization. In addition, in order to enhance the horizontality of the single driving device 30 for driving the collecting ring 22 to rise and lower, the first contact 24 and the second contact 25 on the outer peripheral edge 23 of the collecting ring 22 are passed through the embracing arm 33 of the connecting mechanism 32 of the present invention. As a lifting point, it can be lifted smoothly and smoothly. As can be seen from the above, The invention can greatly improve the reliability of the operation of the fluid collection device, thereby reducing the probability of equipment shutdown and waste generation.

雖然本發明以已較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之變更和潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed above in the preferred embodiments, it is not intended to limit the invention. Various changes and modifications may be made without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

21‧‧‧洩液管 21‧‧‧Draining tube

30‧‧‧驅動裝置 30‧‧‧ drive

33‧‧‧環抱臂 33‧‧‧ hoop arm

37‧‧‧支撐件 37‧‧‧Support

120‧‧‧流體收集裝置 120‧‧‧Fluid collecting device

222‧‧‧第一收集環 222‧‧‧First collection ring

224‧‧‧第二收集環 224‧‧‧Second collection ring

225‧‧‧補強件 225‧‧‧Reinforcement

332‧‧‧第一端點 332‧‧‧ first endpoint

333‧‧‧第二端點 333‧‧‧second endpoint

334‧‧‧第一頂柱 334‧‧‧First pillar

335‧‧‧第二頂柱 335‧‧‧second top pillar

340‧‧‧水平調整螺絲 340‧‧‧Horizontal adjustment screw

342‧‧‧第一鎖合塊 342‧‧‧First lock block

344‧‧‧第二鎖合塊 344‧‧‧Second lock

Claims (10)

一種旋轉蝕刻清洗機台之流體收集裝置,用於收集由一基板表面飛濺之流體,包括:複數個收集單元,環設於該基板之周圍;以及複數個驅動裝置,分別連接於該些收集單元,用於獨立控制各個收集單元之升降,使得該些收集單元可各自收集不同之流體,其中該些驅動裝置的數量等於該些收集單元的數量。 A fluid collecting device for rotating a etch cleaning machine for collecting fluid splashed by a surface of a substrate, comprising: a plurality of collecting units disposed around the substrate; and a plurality of driving devices respectively connected to the collecting units For independently controlling the lifting and lowering of each collecting unit, so that the collecting units can each collect different fluids, wherein the number of the driving devices is equal to the number of the collecting units. 如申請專利範圍第1項所述之流體收集裝置,其中該些收集單元包括複數個收集環,該些收集環依序徑向設置。 The fluid collection device of claim 1, wherein the collection units comprise a plurality of collection rings, the collection rings being radially disposed. 如申請專利範圍第2項所述之流體收集裝置,其中每一驅動裝置包括一連結機構,該連接機構用於帶動該收集環的升降。 The fluid collection device of claim 2, wherein each of the driving devices comprises a coupling mechanism for driving the lifting and lowering of the collecting ring. 如申請專利範圍第3項所述之流體收集裝置,其中該連結機構耦接於該收集環之外週緣上之一第一觸點及一第二觸點。 The fluid collection device of claim 3, wherein the coupling mechanism is coupled to one of the first contact and the second contact on the outer circumference of the collection ring. 如申請專利範圍第4項所述之流體收集裝置,其中該第一觸點及該第二觸點於該收集環之該外週緣上定義出一弧度,該弧度介於π/2至π。 The fluid collection device of claim 4, wherein the first contact and the second contact define an arc on the outer circumference of the collection ring, the curvature being between π/2 and π. 如申請專利範圍第4項所述之流體收集裝置,其中該收集環包括位於該外週緣上之連接於該第一觸點及該第二觸點之補強件。 The fluid collection device of claim 4, wherein the collection ring comprises a reinforcement member on the outer periphery that is coupled to the first contact and the second contact. 如申請專利範圍第4項所述之流體收集裝置,其中該連結機構包括連接於該第一觸點及該第二觸點的支撐件,該支撐件設置於該收集環之該外週緣之底部。 The fluid collection device of claim 4, wherein the coupling mechanism comprises a support member coupled to the first contact and the second contact, the support member being disposed at a bottom of the outer circumference of the collection ring . 如申請專利範圍第4項所述之流體收集裝置,其中該驅動裝置包括一滑軌,該連接機構包括連接於該滑軌上做線性移動之一環抱臂,該環抱臂具有一第一端點及一第二端點。 The fluid collection device of claim 4, wherein the driving device comprises a slide rail, the connection mechanism comprising a loop arm connected to the slide rail for linear movement, the loop arm having a first end point And a second endpoint. 如申請專利範圍第8項所述之流體收集裝置,其中該連結機構還包括:一第一頂柱,耦接於該環抱臂之該第一端點;一第二頂柱,耦接於該環抱臂之該第二端點;一第一吊柱,耦接於該收集環之該第一觸點;一第二吊柱,耦接於該收集環之該第二觸點;一第一鎖合件,用於鎖合該第一頂柱以及該第一吊柱;以及一第二鎖合件,用於鎖合該第二頂柱以及該第二吊柱。 The fluid collecting device of claim 8, wherein the connecting mechanism further comprises: a first top post coupled to the first end of the hoop arm; and a second top post coupled to the a second end of the circumscribing arm; a first suspension post coupled to the first contact of the collection ring; a second suspension post coupled to the second contact of the collection ring; a locking member for locking the first top post and the first hanging post; and a second locking member for locking the second top post and the second hanging post. 如申請專利範圍第8項所述之流體收集裝置,其中該第一鎖合件以及該第二鎖合件具有至少一水平調整螺絲,用於微調該收集環的水平。 The fluid collection device of claim 8, wherein the first closure member and the second closure member have at least one horizontal adjustment screw for fine-tuning the level of the collection ring.
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