TW201712512A - Transparent conductive film and touch panel comprising same - Google Patents

Transparent conductive film and touch panel comprising same Download PDF

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Publication number
TW201712512A
TW201712512A TW105129768A TW105129768A TW201712512A TW 201712512 A TW201712512 A TW 201712512A TW 105129768 A TW105129768 A TW 105129768A TW 105129768 A TW105129768 A TW 105129768A TW 201712512 A TW201712512 A TW 201712512A
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Taiwan
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transparent conductive
film
conductive film
transparent
resin
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TW105129768A
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Chinese (zh)
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Keisuke Matsumoto
Hidehiko Andou
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Nitto Denko Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/10Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial
    • B29C55/12Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial biaxial
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/255Polyesters
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

The purpose of the present invention is to provide: a transparent conductive film which has a sufficient material strength by using, as the base, a polyester having a low retardation, and which achieves sufficient iridescent irregularity suppression effect, while being produced with high productivity from low-cost starting materials; and a touch panel which comprises this transparent conductive film. The present invention is a transparent conductive film which comprises a transparent resin film and a transparent conductive film, and which is characterized in that the transparent resin film is a biaxially stretched polyester resin film having an in-plane retardation of 150 nm or less and a retardation in the thickness direction of 1,000 nm or less.

Description

透明導電性薄膜及含有其之觸控面板Transparent conductive film and touch panel containing the same

本發明係關於具有透明樹脂薄膜及透明導電膜之透明導電性薄膜及含有該透明導電性薄膜之觸控面板。The present invention relates to a transparent conductive film having a transparent resin film and a transparent conductive film, and a touch panel including the transparent conductive film.

背景技術   近年來,隨著平板電腦、智慧型手機、具觸控面板之PC的普及,於戶外操作電子機器之機會大增。於戶外觀看顯示器時以戴著偏光太陽眼鏡之狀態觀看之情形亦增多,此時若使用利用聚對苯二甲酸乙二酯(PET)薄膜之透明導電性薄膜,則有因PET薄膜本身之面內相位差(一般為1000~2000nm)產生彩虹紋,使顯示器之視認性大幅降低之問題。Background Art In recent years, with the spread of tablets, smart phones, and PCs with touch panels, the opportunities for operating electronic devices outdoors have increased dramatically. When viewing the display outdoors, the situation of wearing polarized sunglasses is also increased. In this case, if a transparent conductive film using a polyethylene terephthalate (PET) film is used, there is a face of the PET film itself. The internal phase difference (generally 1000~2000nm) produces rainbow lines, which greatly reduces the visibility of the display.

因此,進行開發使用相位差值較小之基材(環狀烯烴樹脂等)之透明導電膜。然而,環狀烯烴樹脂等具有材料強度較弱、材料本身高價等缺點,故研究使用低價且強度較高之材料。Therefore, development of a transparent conductive film using a substrate having a small retardation value (a cyclic olefin resin or the like) has been developed. However, cyclic olefin resins and the like have disadvantages such as weak material strength and high price of the material itself, so studies have been conducted on materials having low cost and high strength.

由上述理由,於專利文獻1中提出有以由面內相位差值4000nm以上之經延伸之聚酯等形成之透明樹脂薄膜作為基材之透明導電性薄膜。藉由此透明導電性薄膜,即使於通過偏光太陽眼鏡進行視認時亦不會產生彩虹紋。For the above reasons, Patent Document 1 proposes a transparent conductive film having a transparent resin film formed of an extended polyester or the like having an in-plane retardation of 4000 nm or more as a base material. With this transparent conductive film, rainbow stripes are not generated even when viewed by polarized sunglasses.

先行技術文獻 專利文獻 專利文獻1:日本特開2004-214069號公報Advance Technical Literature Patent Literature Patent Document 1: Japanese Patent Laid-Open Publication No. 2004-214069

發明概要   發明欲解決之課題 然而,如此之面內相位差值較大之聚酯薄膜等,為進行單軸延伸而材料強度較弱,且為提高相位差而薄膜較厚,故有材料成本上升、生產性亦不佳等缺點,作為通用材料上有難以處理之問題。SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, such a polyester film or the like having a large in-plane retardation value has a weak material strength for uniaxial stretching, and a thick film for increasing a phase difference, so that material cost increases. Disadvantages such as poor productivity, as a general material, there are problems that are difficult to deal with.

因此,本發明之目的在於提供一種藉由使用低相位差之聚酯作為基材而具有充分材料強度且材料費便宜、生產性亦良好並可獲得充分抑制彩虹紋之效果的透明導電性薄膜及含有其之觸控面板。Accordingly, an object of the present invention is to provide a transparent conductive film which has sufficient material strength by using a polyester having a low phase difference as a substrate, is inexpensive in material cost, is excellent in productivity, and can sufficiently suppress the effect of rainbow lines. A touch panel containing it.

用以解決課題之方法   本發明人等為解決上述問題而專心進行研究,結果發現,藉由使用面內相位差值與厚度方向相位差值在特定範圍之經雙軸延伸之聚酯系樹脂薄膜作為基材,可達成上述目的,終完成本發明。The present inventors have intensively studied to solve the above problems, and as a result, found that a biaxially stretched polyester resin film is used in a specific range by using an in-plane phase difference value and a thickness direction retardation value. The above object can be attained as a substrate, and the present invention has been completed.

即,本發明之透明導電性薄膜之特徵在於:具有透明樹脂薄膜及透明導電膜,前述透明樹脂薄膜為經雙軸延伸之聚酯系樹脂薄膜,其面內相位差值為150nm以下且厚度方向相位差值為1000nm以下。再者,本發明中之各種物性值為利用實施例等中所採用之方法測定之值。In other words, the transparent conductive film of the present invention has a transparent resin film and a transparent conductive film, and the transparent resin film is a biaxially stretched polyester resin film having an in-plane retardation value of 150 nm or less and a thickness direction. The phase difference is 1000 nm or less. Further, various physical properties in the present invention are values measured by the methods used in the examples and the like.

一般而言,經雙軸延伸之聚酯系樹脂薄膜具有充分的材料強度且價格低廉,但面內相位差為1000~2000nm左右,若將其用於透明導電性薄膜之基材,則利用波長分散將偏光非偏光化之效果不夠,導致產生彩虹紋。相對於此,如本發明所示,若使用面內相位差值為150nm以下且厚度方向相位差值為1000nm以下之聚酯系樹脂薄膜,如實施例之結果所示,可獲得充分之彩虹紋之抑制效果。In general, the biaxially stretched polyester resin film has sufficient material strength and is inexpensive, but the in-plane retardation is about 1000 to 2000 nm, and if it is used for a substrate of a transparent conductive film, wavelength is utilized. Dispersion has insufficient effect of polarizing non-polarization, resulting in rainbow lines. On the other hand, as shown in the present invention, when a polyester resin film having an in-plane retardation value of 150 nm or less and a thickness direction retardation of 1000 nm or less is used, as shown by the results of the examples, a sufficient rainbow pattern can be obtained. The suppression effect.

其詳細原因並不清楚,但認為如下。即,吾人認為若使用面內相位差值為150nm以下之聚酯系樹脂薄膜,會產生將直線偏光圓偏光化(包含橢圓偏光化)之作用,此作用在輔以厚度方向相位差值為1000nm以下,便能抑制色調相對視認方向之擴展而變化,故可獲得充分之彩虹紋抑制效果。The detailed reasons are not clear, but they are considered as follows. In other words, when a polyester resin film having an in-plane retardation of 150 nm or less is used, it is effective to polarize a linearly polarized circle (including elliptically polarized light), and the effect is that the thickness difference in the thickness direction is 1000 nm. In the following, it is possible to suppress the change in the color tone from the viewing direction, so that a sufficient rainbow pattern suppressing effect can be obtained.

其結果,若利用本發明之透明導電性薄膜,藉由使用低相位差之聚酯作為基材,可提供一種具有充分材料強度且材料費便宜、生產性亦良好並可獲得充分抑制彩虹紋之效果的透明導電性薄膜。As a result, when the transparent conductive film of the present invention is used, by using a polyester having a low phase difference as a substrate, it is possible to provide a material having sufficient material strength, a low material cost, good productivity, and sufficient suppression of rainbow stripes. The effect of a transparent conductive film.

於上述中,在前述透明樹脂薄膜與前述透明導電膜之間宜具有至少一層光學調整層。由於藉由光學調整層可控制折射率,故可減低將透明導電膜圖案化時之圖案形成部與圖案開口部之反射率差,不易看到透明導電膜圖案,於觸控面板等顯示裝置中視認性變得良好。In the above, it is preferable that at least one optical adjustment layer is provided between the transparent resin film and the transparent conductive film. Since the refractive index can be controlled by the optical adjustment layer, the difference in reflectance between the pattern forming portion and the pattern opening portion when the transparent conductive film is patterned can be reduced, and the transparent conductive film pattern is less likely to be seen, and is displayed in a display device such as a touch panel. Visual recognition has become good.

又,前述透明樹脂薄膜之厚度宜為5~50μm。若為如此範圍之厚度,則可容易低價地製造面內相位差值為150nm以下且厚度方向相位差值為1000nm以下之經雙軸延伸之聚酯系樹脂薄膜。Further, the thickness of the transparent resin film is preferably 5 to 50 μm. When the thickness is in this range, a biaxially stretched polyester resin film having an in-plane retardation of 150 nm or less and a thickness direction retardation of 1000 nm or less can be easily produced at low cost.

又,前述透明樹脂薄膜宜為長條體或矩形之單片體,且配向軸相對於長邊或短邊具有10~45°之角度。透明導電性薄膜大多積層於液晶元件等矩形光學顯示裝置來使用,且來自前述光學顯示裝置之光大多為平行或垂直於其長邊之偏光。因此,於本發明中,藉由使配向軸相對於長邊或短邊具有10~45°之角度,便容易以相對於偏光為10~45°之角度配置遲相軸,藉由透明樹脂薄膜將偏光圓偏光化之作用變大,可容易獲得充分之抑制彩虹紋之效果。Further, the transparent resin film is preferably an elongated body or a rectangular monolith, and the alignment axis has an angle of 10 to 45 with respect to the long side or the short side. The transparent conductive film is often laminated on a rectangular optical display device such as a liquid crystal element, and the light from the optical display device is mostly polarized in parallel or perpendicular to the long side thereof. Therefore, in the present invention, by having the alignment axis at an angle of 10 to 45° with respect to the long side or the short side, it is easy to arrange the slow phase axis at an angle of 10 to 45° with respect to the polarized light, by the transparent resin film. The effect of polarizing the polarizing circle becomes large, and the effect of suppressing the rainbow pattern can be easily obtained.

於前述透明樹脂薄膜之至少一表面宜具有硬化樹脂層。硬化樹脂層可作為用以防止搬送時之受傷等之硬塗層而發揮功能,亦可藉由使表面產生凹凸而作為抗黏著層而發揮功能。It is preferable that at least one surface of the transparent resin film has a hardened resin layer. The hardened resin layer functions as a hard coat layer for preventing injury or the like during transportation, and functions as an anti-adhesion layer by causing irregularities on the surface.

於前述透明樹脂薄膜之未設有前述透明導電膜之面側,宜依序具有黏著劑層與保護薄膜。藉由保護薄膜提高操作性,且將保護薄膜作為分隔件而構成,可使本發明之透明導電性薄膜成為黏著型。In the surface of the transparent resin film on which the transparent conductive film is not provided, it is preferable to have an adhesive layer and a protective film in this order. The transparent conductive film of the present invention can be made into an adhesive type by improving the handleability of the protective film and forming the protective film as a separator.

另一方面,本發明之觸控面板之特徵在於其係使用本發明之透明導電性薄膜而獲得。藉由使用本發明之透明導電性薄膜,可提供一種具有充分材料強度且材料費便宜、生產性亦良好並可獲得充分抑制彩虹紋之效果的觸控面板。On the other hand, the touch panel of the present invention is characterized in that it is obtained by using the transparent conductive film of the present invention. By using the transparent conductive film of the present invention, it is possible to provide a touch panel having sufficient material strength, low material cost, good productivity, and sufficient effect of suppressing rainbow lines.

用以實施發明之形態   <透明導電性薄膜之積層構造>   如圖1~圖3所示,本發明之透明導電性薄膜20具有透明樹脂薄膜4與透明導電膜6,且於透明樹脂薄膜4與透明導電膜6之間宜具有至少一層光學調整層7。又,如圖2~圖3所示,於透明樹脂薄膜4之至少一表面亦可具有抗黏著層3或硬塗層5等之硬化樹脂層。進而,如圖4~6所示,透明導電性薄膜20亦可於透明樹脂薄膜4之未設有透明導電膜6之面側,依序具有黏著劑層2與保護薄膜1,此時由黏著劑層2與保護薄膜1構成載體薄膜10。In the form of the invention, the laminated structure of the transparent conductive film is as shown in FIGS. 1 to 3, and the transparent conductive film 20 of the present invention has the transparent resin film 4 and the transparent conductive film 6, and is formed in the transparent resin film 4 and Preferably, at least one optical adjustment layer 7 is provided between the transparent conductive films 6. Further, as shown in FIGS. 2 to 3, at least one surface of the transparent resin film 4 may have a cured resin layer such as the anti-adhesion layer 3 or the hard coat layer 5. Further, as shown in FIGS. 4 to 6, the transparent conductive film 20 may be provided on the side of the transparent resin film 4 on which the transparent conductive film 6 is not provided, and the adhesive layer 2 and the protective film 1 are sequentially provided. The agent layer 2 and the protective film 1 constitute a carrier film 10.

(透明樹脂薄膜)   作為透明樹脂薄膜可使用經雙軸延伸之聚酯系樹脂薄膜。所謂「經雙軸延伸」是指於至少二個方向進行薄膜之延伸,二個方向可同時或依序進行。(Transparent Resin Film) As the transparent resin film, a biaxially stretched polyester resin film can be used. The term "biaxially extending" means that the film is stretched in at least two directions, and the two directions can be simultaneously or sequentially performed.

作為聚酯系樹脂,可列舉選自聚酯、改性聚酯及其等之摻合物之聚酯系樹脂。作為聚酯樹脂,例如可使用藉由羧酸成分與多元酯成分之縮合聚合而獲得者。The polyester-based resin may, for example, be a polyester-based resin selected from the group consisting of polyesters, modified polyesters, and the like. As the polyester resin, for example, a condensation polymerization of a carboxylic acid component and a polyvalent ester component can be used.

作為羧酸成分,可列舉芳香族二羧酸、脂肪族二羧酸、脂環族二羧酸。作為芳香族二羧酸,例如可列舉:對苯二甲酸、間苯二甲酸、苄基丙二酸、1,4-萘二甲酸、二苯酸、4,4’-氧基苯甲酸、2,5-萘二羧酸。作為脂肪族二羧酸,例如可列舉:丙二酸、二甲基丙二酸、琥珀酸、戊二酸、己二酸、三甲基己二酸、庚二酸、2,2-二甲基戊二酸、壬二酸、癸二酸、反丁烯二酸、順丁烯二酸、衣康酸、硫代二丙酸、二甘醇酸。作為脂環族二羧酸,例如可列舉:1,3-環戊烷二羧酸、1,2-環己烷二羧酸、1,3-環戊烷二羧酸、1,4-環己烷二羧酸、2,5-降冰片烷二羧酸、金剛烷二羧酸。羧酸成分可為酯、氯化物、酸酐等衍生物,例如包含1,4-環己烷二羧酸二甲酯、2,6-萘二羧酸二甲酯、間苯二甲酸二甲酯、對苯二甲酸二甲酯及對苯二甲酸二苯酯。羧酸成分可單獨使用亦可併用二種以上。Examples of the carboxylic acid component include an aromatic dicarboxylic acid, an aliphatic dicarboxylic acid, and an alicyclic dicarboxylic acid. Examples of the aromatic dicarboxylic acid include terephthalic acid, isophthalic acid, benzylmalonic acid, 1,4-naphthalene dicarboxylic acid, dibenzoic acid, 4,4'-oxybenzoic acid, and 2 , 5-naphthalenedicarboxylic acid. Examples of the aliphatic dicarboxylic acid include malonic acid, dimethylmalonic acid, succinic acid, glutaric acid, adipic acid, trimethyl adipate, pimelic acid, and 2,2-dimethyl A glutaric acid, azelaic acid, azelaic acid, fumaric acid, maleic acid, itaconic acid, thiodipropionic acid, diglycolic acid. Examples of the alicyclic dicarboxylic acid include 1,3-cyclopentanedicarboxylic acid, 1,2-cyclohexanedicarboxylic acid, 1,3-cyclopentanedicarboxylic acid, and 1,4-ring. Hexanedicarboxylic acid, 2,5-norbornane dicarboxylic acid, adamantane dicarboxylic acid. The carboxylic acid component may be a derivative such as an ester, a chloride or an acid anhydride, and includes, for example, dimethyl 1,4-cyclohexanedicarboxylate, dimethyl 2,6-naphthalene dicarboxylate, and dimethyl isophthalate. , dimethyl terephthalate and diphenyl terephthalate. The carboxylic acid component may be used singly or in combination of two or more.

作為多元醇,代表性者可列舉二元醇。作為二元醇可列舉脂肪族二醇、脂環族二醇、芳香族二醇。作為脂肪族二元醇,例如可列舉:乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、1,3-丙二醇、2,4-二甲基-2-乙基己烷-1,3-二醇、2,2-二甲基-1,3-丙二醇(新戊二醇)、2-乙基-2-丁基-1,3-丙二醇、2-乙基-2-異丁基-1,3-丙二醇、1,3-丁二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、3-甲基-1,5-戊二醇、2,2,4-三甲基-1,6-己二醇。作為脂環族二醇,例如可列舉:1,2-環己烷二甲醇、1,3-環己烷二甲醇、1,4-環己烷二甲醇、螺環乙二醇、三環癸二甲醇、金剛烷二醇、2,2,4,4-四甲基-1,3-環丁二醇。作為芳香族二醇,例如可列舉:4,4’-硫二苯酚、4,4’-亞甲基二苯酚、4,4’-(2-亞降冰片基)二苯酚、4,4’-二羥基雙苯酚、鄰、間及對苯二酚、4,4’-亞異丙基苯酚、4,4’-亞異丙基雙(2,6-二氯苯酚)2,5-萘二醇及對苯二甲醇。多元醇成分可單獨使用亦可併用二種以上。As a polyhydric alcohol, a diol is mentioned typically. Examples of the glycol include an aliphatic diol, an alicyclic diol, and an aromatic diol. Examples of the aliphatic diol include ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, 1,3-propanediol, and 2,4-dimethyl-2-ethylhexane. -1,3-diol, 2,2-dimethyl-1,3-propanediol (neopentyl glycol), 2-ethyl-2-butyl-1,3-propanediol, 2-ethyl-2 -isobutyl-1,3-propanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 3-methyl-1, 5-pentanediol, 2,2,4-trimethyl-1,6-hexanediol. Examples of the alicyclic diol include 1,2-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanedimethanol, spiroethylene glycol, and tricyclic guanidine. Dimethanol, adamantanediol, 2,2,4,4-tetramethyl-1,3-cyclobutanediol. Examples of the aromatic diol include 4,4'-thiodiphenol, 4,4'-methylene diphenol, 4,4'-(2-norbornyl) diphenol, and 4,4'. -dihydroxybisphenol, o-, m- and hydroquinone, 4,4'-isopropylidene phenol, 4,4'-isopropylidene bis(2,6-dichlorophenol) 2,5-naphthalene Glycol and terephthalic acid. The polyol component may be used singly or in combination of two or more.

作為較佳之羧酸成分,可列舉:對苯二甲酸、間苯二甲酸、2,5-萘二羧酸。作為較佳之多元醇成分,可列舉:乙二醇、二乙二醇、三乙二醇、1,4-丁二醇、1,3-環己烷二甲醇、1,4-環己烷二甲醇。Preferred examples of the carboxylic acid component include terephthalic acid, isophthalic acid, and 2,5-naphthalene dicarboxylic acid. Preferred examples of the polyol component include ethylene glycol, diethylene glycol, triethylene glycol, 1,4-butanediol, 1,3-cyclohexanedimethanol, and 1,4-cyclohexane. Methanol.

聚酯之結構根據如上述之單體之組合而決定。因此,作為較佳之聚酯系樹脂例如可列舉:聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯(PBT)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸環己酯以及其等之共聚物、摻合物及改性體。The structure of the polyester is determined according to the combination of the monomers as described above. Therefore, preferred examples of the polyester-based resin include polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), and polypair. Copolymers, blends and modified bodies of cyclohexyl phthalate and the like.

藉由應用如此使用聚酯系樹脂且包含斜向延伸之製造方法,而可獲得具有較佳之面內相位差與配向軸之方向、且具有更優異之軸精度之透明樹脂薄膜。By applying the polyester resin as described above and including the obliquely extending manufacturing method, a transparent resin film having a preferable in-plane retardation and the direction of the alignment axis and having more excellent axial precision can be obtained.

於本發明中,聚酯系樹脂可為包含來自環己烷二甲醇之重複單元之改性PET。此時,多元醇成分中之環己烷二甲醇之比率,較佳為超過0莫耳%、10莫耳%以下,更佳為超過0莫耳%、3莫耳%以下。又,聚酯系樹脂可為包含來自間苯二甲酸之重複單元之改性PET。此時,羧酸成分中之間苯二甲酸之比率,較佳為超過0莫耳%、20莫耳%以下,更佳為超過0莫耳%、10莫耳%以下。又,當然亦可將此等實施形態進行組合。In the present invention, the polyester resin may be a modified PET containing a repeating unit derived from cyclohexanedimethanol. In this case, the ratio of the cyclohexanedimethanol in the polyol component is preferably more than 0 mol% and 10 mol% or less, more preferably more than 0 mol% and 3 mol% or less. Further, the polyester resin may be a modified PET containing a repeating unit derived from isophthalic acid. In this case, the ratio of the phthalic acid in the carboxylic acid component is preferably more than 0 mol% and 20 mol% or less, more preferably more than 0 mol% and 10 mol% or less. Further, of course, these embodiments can be combined.

透明樹脂薄膜是以經雙軸延伸之長條狀之薄膜(長條體)之形式被製造。於本說明書中所謂「長條狀」是指長度相對於寬度之比為10以上之細長形狀。透明樹脂薄膜之長度相對於寬度之比,較佳為30以上、更佳為100以上。於一個實施形態中,透明樹脂薄膜為捲繞成捲筒狀之長條體,又於另一個實施形態中,透明樹脂薄膜為矩形之單片體。The transparent resin film is produced in the form of a strip-shaped film (long strip) which is biaxially stretched. In the present specification, the term "long strip" means an elongated shape having a ratio of length to width of 10 or more. The ratio of the length of the transparent resin film to the width is preferably 30 or more, more preferably 100 or more. In one embodiment, the transparent resin film is an elongated body wound in a roll shape, and in another embodiment, the transparent resin film is a rectangular single piece.

透明樹脂薄膜較佳的是其配向軸相對於長邊或短邊具有10~45°之角度,更佳為20~45°之角度,最佳為30~45°之角度。再者,本發明之透明導電性薄膜,其透明樹脂薄膜之配向軸宜以相對於自顯示裝置出射之直線偏光之振動方向為10~80°之角度配置,較佳為以20~70°之角度配置,更佳為以30~60°之角度配置。The transparent resin film preferably has an alignment axis having an angle of 10 to 45° with respect to the long side or the short side, more preferably an angle of 20 to 45°, and most preferably an angle of 30 to 45°. Further, in the transparent conductive film of the present invention, the alignment axis of the transparent resin film is preferably disposed at an angle of 10 to 80° with respect to the direction of the linearly polarized light emitted from the display device, preferably 20 to 70°. The angle configuration is preferably configured at an angle of 30 to 60 degrees.

因此,跨薄膜之寬度方向之整個區域,長條狀之薄膜之遲相軸之方向相對於長度方向位於30°~60°之範圍、較佳為38°~52°之範圍、更佳為43°~47°之範圍、最佳為遲相軸方向相對於長度方向成45°左右之角度。透明樹脂薄膜藉由應用包含斜向延伸之製造方法,可獲得優異之軸精度且於斜向方向具有遲相軸之透明樹脂薄膜。Therefore, the direction of the slow axis of the elongated film is in the range of 30° to 60°, preferably 38° to 52°, and more preferably 43 in the entire width direction of the film. The range of °~47° is preferably an angle of about 45° with respect to the longitudinal direction of the slow axis direction. The transparent resin film can obtain a transparent resin film having excellent axial precision and a retardation axis in the oblique direction by applying a manufacturing method including oblique stretching.

透明樹脂薄膜之面內相位差R0為0~150nm,由更提高抑制彩虹紋之效果之觀點而言,較佳為10~130nm,更佳為20~110nm。The in-plane retardation R0 of the transparent resin film is from 0 to 150 nm, and from the viewpoint of further enhancing the effect of suppressing rainbow stripes, it is preferably from 10 to 130 nm, more preferably from 20 to 110 nm.

此處,面內相位差R0為由23℃下波長590nm之光進行測定之薄膜之面內相位差。將薄膜之厚度設為d(nm)時,藉由公式:R0=(nx-ny)×d而求出R0。其中,nx為面內之折射率成為最大之方向(即遲相軸方向)之折射率,ny為於面內與遲相軸正交之方向之折射率。Here, the in-plane phase difference R0 is an in-plane phase difference of a film measured by light having a wavelength of 590 nm at 23 ° C. When the thickness of the film is d (nm), R0 is obtained by the formula: R0 = (nx - ny) × d. Here, nx is a refractive index in which the refractive index in the plane becomes the largest (ie, the direction of the slow axis), and ny is the refractive index in the direction orthogonal to the axis of the late phase.

透明樹脂薄膜之厚度方向相位差Rth為1000nm以下,由更提高抑制彩虹紋之效果且獲得充分之強度之觀點而言,較佳為350~950nm,更佳為400~900nm。The thickness direction Rth of the transparent resin film is 1000 nm or less, and is preferably from 350 to 950 nm, more preferably from 400 to 900 nm, from the viewpoint of further improving the effect of suppressing rainbow lines and obtaining sufficient strength.

此處,厚度方向相位差Rth為由23℃下波長590nm之光進行測定之薄膜之厚度方向相位差。將薄膜之厚度設為d(nm)時,藉由公式:Rth=(nx-nz)×d而求出Rth。其中,nx為面內之折射率成為最大之方向(即遲相軸方向)之折射率,nz為厚度方向之折射率。Here, the thickness direction phase difference Rth is a phase difference in the thickness direction of the film measured by light having a wavelength of 590 nm at 23 ° C. When the thickness of the film is d (nm), Rth is obtained by the formula: Rth = (nx - nz) × d. Here, nx is a refractive index in which the refractive index in the plane becomes the largest (ie, the direction of the slow axis), and nz is the refractive index in the thickness direction.

於本發明中,相位差之比R0/Rth亦為重要,由更提高抑制彩虹紋之效果且獲得充分之強度之觀點而言,相位差之比R0/Rth宜為0.01~0.5,較佳為0.02~0.47,更佳為0.04~0.45。In the present invention, the phase difference ratio R0/Rth is also important, and the phase difference ratio R0/Rth is preferably 0.01 to 0.5, from the viewpoint of further improving the effect of suppressing rainbow lines and obtaining sufficient strength. 0.02~0.47, more preferably 0.04~0.45.

透明樹脂薄膜於80℃下加熱240小時後之尺寸收縮率,較佳為2.0%以下,更佳為1.0%以下。The dimensional shrinkage ratio of the transparent resin film after heating at 80 ° C for 240 hours is preferably 2.0% or less, more preferably 1.0% or less.

透明樹脂薄膜以X射線繞射法(XRD)測得之結晶度宜為25%以上,較佳為30%以上。結晶度之上限例如70%。若結晶度於此範圍,則具有加熱延伸後之薄膜時薄膜不收縮、且相位差及配向角等光學特性不易變化之優點。The crystallinity of the transparent resin film measured by X-ray diffraction (XRD) is preferably 25% or more, preferably 30% or more. The upper limit of crystallinity is, for example, 70%. When the degree of crystallinity is in this range, there is an advantage that the film does not shrink when the film is stretched and the optical characteristics such as the phase difference and the alignment angle are not easily changed.

由獲得上述般之面內相位差與厚度方向相位差且提高操作性之觀點而言,透明樹脂薄膜之厚度宜為5~50μm,較佳為7μm ~40μm,更佳為10~30μm。The thickness of the transparent resin film is preferably from 5 to 50 μm, preferably from 7 μm to 40 μm, more preferably from 10 to 30 μm, from the viewpoint of obtaining the above-described in-plane retardation and thickness direction retardation and improving workability.

聚酯系樹脂之玻璃轉移溫度較佳為65℃~80℃,更佳為70℃~75℃。若玻璃轉移溫度過低,有無法獲得所期望之尺寸收縮率之情形。若玻璃轉移溫度過高,則有薄膜成形時之成形穩定性變差之情形,且有損及薄膜透明性之情形。再者,玻璃轉移溫度是根據JIS K 7121(1987)而求出。The glass transition temperature of the polyester resin is preferably from 65 ° C to 80 ° C, more preferably from 70 ° C to 75 ° C. If the glass transition temperature is too low, there is a case where the desired dimensional shrinkage cannot be obtained. If the glass transition temperature is too high, the molding stability at the time of film formation may be deteriorated, and the transparency of the film may be impaired. Further, the glass transition temperature was determined in accordance with JIS K 7121 (1987).

聚酯系樹脂之重量平均分子量宜為10000~100000,較佳為15000~50000。若為此重量平均分子量,可獲得成形時之操作為容易且具有優異之機械強度之薄膜。The weight average molecular weight of the polyester resin is preferably from 10,000 to 100,000, preferably from 15,000 to 50,000. If the weight average molecular weight is used for this purpose, a film which is easy to handle and has excellent mechanical strength at the time of molding can be obtained.

聚酯系樹脂可利用任意之適當的方法成形為薄膜。所獲得之聚酯系樹脂薄膜可利用於縱及橫之雙軸延伸之方法而成為雙軸延伸薄膜。此時,如日本特開2015-72376號公報所揭示般,藉由提供給包含斜向延伸之製造方法,可適當地獲得於斜向方向具有配向軸之透明樹脂薄膜。The polyester resin can be formed into a film by any appropriate method. The obtained polyester-based resin film can be used as a biaxially stretched film by a method of extending the longitudinal and transverse directions. In this case, as disclosed in Japanese Laid-Open Patent Publication No. 2015-72376, a transparent resin film having an alignment axis in the oblique direction can be suitably obtained by providing a manufacturing method including oblique stretching.

即,藉由包含如下步驟之含有斜向延伸之製造方法,可適當地製造於本發明使用之透明樹脂薄膜,即:分別藉由縱向之夾具間距可改變之可變間距型之左右夾具夾持延伸對象之薄膜之左右端部(步驟A:夾持步驟);將該薄膜進行預熱(步驟B:預熱步驟);使該左右之夾具之夾具間距各自獨立地變化,將該薄膜進行斜向延伸(步驟C:延伸步驟);視需要,於使該左右之夾具之夾具間距成為固定之狀態下,將該薄膜熱處理使之結晶化(步驟D:結晶化步驟);及解除夾持該薄膜之夾具(步驟E:解除步驟)。That is, the transparent resin film used in the present invention can be suitably produced by a manufacturing method including oblique stretching, which comprises the following steps: the left and right jig clamping of the variable pitch type which can be changed by the longitudinal jig pitch Extending the left and right ends of the film of the object (step A: holding step); preheating the film (step B: preheating step); changing the jig spacing of the left and right jigs independently, and tilting the film Extension (step C: extension step); heat-treating the film to be crystallized in a state where the jig pitch of the left and right jigs is fixed as needed (step D: crystallization step); Film clamp (step E: release step).

於透明樹脂薄膜,亦可於表面預先實施濺鍍、電暈放電、噴火、紫外線照射、電子束照射、化學變化、氧化等蝕刻處理或底層塗佈處理,使透明樹脂薄膜與形成於其上之光學調整層、硬化樹脂層、透明導電膜等之密接性提高。又,於形成光學調整層等之前,亦可視需要藉由溶劑洗淨或超音波洗淨等將透明樹脂薄膜表面除塵、清淨化。In the transparent resin film, an etching treatment such as sputtering, corona discharge, fire spraying, ultraviolet irradiation, electron beam irradiation, chemical change, oxidation, or a primer coating treatment may be performed on the surface to form a transparent resin film thereon. The adhesion between the optical adjustment layer, the cured resin layer, and the transparent conductive film is improved. Further, before the formation of the optical adjustment layer or the like, the surface of the transparent resin film may be degreased and cleaned by solvent washing or ultrasonic cleaning.

(硬化樹脂層)   硬化樹脂層包含設置於透明樹脂薄膜之一第1主面側之第1硬化樹脂層、及設置於相反側之第2主面側之第2硬化樹脂層。透明樹脂薄膜因為容易在透明導電膜之形成及透明導電膜之圖案化、或朝電子機器搭載等各步驟中受傷,故如上述般宜於透明樹脂薄膜之兩面形成第1硬化樹脂層與第2硬化樹脂層。(Cured Resin Layer) The cured resin layer includes a first cured resin layer provided on one of the first main surface sides of the transparent resin film, and a second cured resin layer provided on the second main surface side on the opposite side. Since the transparent resin film is easily damaged in the formation of the transparent conductive film, the patterning of the transparent conductive film, or the mounting of the electronic device, it is preferable to form the first cured resin layer and the second surface on both surfaces of the transparent resin film as described above. Hardened resin layer.

硬化樹脂層是藉由使硬化型樹脂硬化而獲得之層。作為所使用之樹脂並無特別限制,可使用製成硬化樹脂層形成後之皮膜具有充分之強度、具有透明性者,可列舉:熱硬化型樹脂、紫外線硬化型樹脂、電子束硬化型樹脂、二液混合型樹脂等。其等中,又以藉由紫外線照射之硬化處理,以簡單的加工操作即可有效率地形成硬化樹脂層之紫外線硬化型樹脂為佳。The hardened resin layer is a layer obtained by hardening a hardening type resin. The resin to be used is not particularly limited, and the film obtained by forming the cured resin layer may have sufficient strength and transparency, and examples thereof include a thermosetting resin, an ultraviolet curable resin, and an electron beam curing resin. Two-liquid mixed resin and the like. Among them, it is preferable to form an ultraviolet curable resin which can efficiently form a cured resin layer by a simple processing operation by a hardening treatment by ultraviolet irradiation.

作為紫外線硬化型樹脂,可列舉:聚酯系、丙烯酸系、胺基甲酸酯系、醯胺系、聚矽氧系、環氧系等各種樹脂,包含紫外線硬化型單體、低聚物、聚合物等。較佳使用之紫外線硬化型樹脂為丙烯酸系樹脂或環氧系樹脂,更佳為丙烯酸系樹脂。Examples of the ultraviolet curable resin include various resins such as polyester-based, acrylic-based, urethane-based, guanamine-based, polyfluorene-based, and epoxy-based resins, and include ultraviolet curable monomers and oligomers. Polymers, etc. The ultraviolet curable resin to be preferably used is an acrylic resin or an epoxy resin, and more preferably an acrylic resin.

硬化樹脂層亦可包含粒子。藉由於硬化樹脂層中調配粒子,可於硬化樹脂層之表面形成隆起,可對透明導電性薄膜適當地賦與抗黏著性。The hardened resin layer may also contain particles. By arranging the particles in the cured resin layer, ridges can be formed on the surface of the cured resin layer, and the transparent conductive film can be appropriately provided with anti-adhesion.

作為上述粒子,可無特別限制地使用各種金屬氧化物、玻璃、塑膠等具有透明性者。例如可列舉:氧化矽、氧化鋁、氧化鈦、氧化鋯、氧化鈣等無機系粒子、由聚甲基丙烯酸甲酯、聚苯乙烯、聚胺基甲酸酯、丙烯酸系樹脂、丙烯酸-苯乙烯共聚物、苯代三聚氰胺、三聚氰胺、聚碳酸酯等各種聚合物所形成之交聯或未交聯之有機系粒子、或聚矽氧系粒子等。前述粒子可適當選擇一種或二種以上使用,但以有機系粒子為佳。由折射率之觀點,作為有機系粒子宜為丙烯酸系樹脂。As the particles, any of metal oxides, glass, plastics, and the like having transparency can be used without particular limitation. Examples thereof include inorganic particles such as cerium oxide, aluminum oxide, titanium oxide, zirconium oxide, and calcium oxide, and polymethyl methacrylate, polystyrene, polyurethane, acrylic resin, and acrylic acid-styrene. Crosslinked or uncrosslinked organic particles or polyoxynoid particles formed by various polymers such as copolymers, benzoguanamine, melamine, and polycarbonate. The particles may be used singly or in combination of two or more kinds, but organic particles are preferred. From the viewpoint of the refractive index, the organic particles are preferably an acrylic resin.

粒子之眾數粒徑可考慮與硬化樹脂層之隆起突起度或隆起以外之平坦區域之厚度之關係等而適當設定,並無特別限定。再者,由對透明導電性薄膜充分地賦與抗黏著性且充分地抑制霧度之上升之觀點而言,粒子之眾數粒徑宜為0.1~3μm、較佳為0.5~2.5μm。再者,於本說明書中,所謂「眾數粒徑」指表示粒子分布之極大值之粒徑,藉由使用流動式粒子像分析裝置(Sysmex公司製、製品名「FPTA-3000S」)於特定條件下(Sheath液:乙酸乙酯、測定模式:HPF測定、測定方式:總計數)進行測定而求得。測定試料使用將粒子以乙酸乙酯稀釋成1.0重量%,使用超音波洗淨機均勻地分散後之試料。The particle size of the particles is appropriately set in consideration of the relationship between the protrusion degree of the cured resin layer and the thickness of the flat region other than the ridge, and is not particularly limited. In addition, from the viewpoint of sufficiently imparting anti-adhesion to the transparent conductive film and sufficiently suppressing an increase in haze, the particle size of the particles is preferably 0.1 to 3 μm, preferably 0.5 to 2.5 μm. In the present specification, the "quantity particle diameter" is a particle diameter indicating the maximum value of the particle distribution, and is specified by using a flow type particle image analyzer (product name "FPTA-3000S", manufactured by Sysmex Corporation). The conditions were determined by measuring (Sheath solution: ethyl acetate, measurement mode: HPF measurement, measurement method: total count). For the measurement sample, a sample obtained by diluting the particles with ethyl acetate to 1.0% by weight and uniformly dispersing the mixture using an ultrasonic cleaner was used.

粒子之含量宜相對於樹脂組成物之固體成分100重量份為0.05~1.0重量份,較佳為0.1~0.5重量份,更佳為0.1~0.2重量份。若硬化樹脂層中之粒子之含量較小,有難以形成對硬化樹脂層之表面賦與抗黏著性及易滑性之充分的隆起之傾向。另一方面,若粒子之含量過大,則有起因於粒子所致之光散射而使透明導電性薄膜之霧度變高、視認性降低之傾向。又,若粒子之含量過大,有於硬化樹脂層之形成時(溶液之塗佈時)產生線條、損及視認性或透明導電膜之電性特性變得不均一之情形。The content of the particles is preferably 0.05 to 1.0 part by weight, preferably 0.1 to 0.5 part by weight, more preferably 0.1 to 0.2 part by weight, per 100 parts by weight of the solid content of the resin composition. When the content of the particles in the cured resin layer is small, it is difficult to form a sufficient ridge to impart anti-adhesion and slipperiness to the surface of the cured resin layer. On the other hand, when the content of the particles is too large, the haze of the transparent conductive film is increased due to light scattering by the particles, and the visibility is lowered. In addition, when the content of the particles is too large, there are cases where lines are formed during the formation of the cured resin layer (during application of the solution), and the visibility or the electrical properties of the transparent conductive film are not uniform.

硬化樹脂層可藉由如下方式而獲得,即:將包含各硬化型樹脂與視需要添加之粒子、交聯劑、起啟劑、增感劑等之樹脂組成物塗佈於透明樹脂薄膜上,於樹脂組成物包含溶劑時,進行溶劑之乾燥,藉由應用熱、活性能量線或該兩者中之任一者使之硬化。熱可使用空氣循環式烘箱或IR加熱器等周知機構,但並不限定於此等方法。作為活性能量線之例,有紫外線、電子束、伽瑪射線等,但並無特別限定。The cured resin layer can be obtained by coating a resin composition containing each of the curable resin and optionally added particles, a crosslinking agent, a starter, a sensitizer, or the like on the transparent resin film. When the resin composition contains a solvent, the solvent is dried and hardened by applying heat, an active energy ray or both. As the heat, an well-known mechanism such as an air circulation type oven or an IR heater can be used, but the method is not limited thereto. Examples of the active energy ray include ultraviolet rays, electron beams, gamma rays, and the like, but are not particularly limited.

硬化樹脂層可使用上述材料,藉由溼式塗佈法(塗覆法)等而製膜。例如,作為透明導電膜形成含有氧化錫之氧化銦(ITO)時,若作為底層之硬化樹脂層之表面為平滑,亦可縮短透明導電膜之結晶化時間。由此觀點,硬化樹脂層宜藉由溼式塗佈法而製膜。The hardened resin layer can be formed into a film by a wet coating method (coating method) or the like using the above materials. For example, when indium oxide (ITO) containing tin oxide is formed as a transparent conductive film, the surface of the cured resin layer as the underlayer is smooth, and the crystallization time of the transparent conductive film can be shortened. From this point of view, the cured resin layer is preferably formed by a wet coating method.

硬化樹脂層之厚度宜為0.5μm~5μm、較佳為0.7μm~3μm、最佳為0.8μm~2μm。若硬化樹脂層之厚度為前述範圍,可防止受傷或防止硬化樹脂層之硬化收縮中之薄膜皺褶,可防止觸控面板等之視認性惡化。The thickness of the cured resin layer is preferably from 0.5 μm to 5 μm, preferably from 0.7 μm to 3 μm, and most preferably from 0.8 μm to 2 μm. When the thickness of the cured resin layer is within the above range, it is possible to prevent damage or prevent film wrinkles in hardening and shrinkage of the cured resin layer, and it is possible to prevent deterioration of visibility of a touch panel or the like.

(透明導電膜)   透明導電膜可設置於透明樹脂薄膜上,較佳為設置於透明樹脂薄膜之一第1主面側所設置之第1硬化樹脂層上。透明導電膜之構成材料只要包含無機物即可,並無特別限定,可適當地使用選自由銦、錫、鋅、鎵、銻、鈦、矽、鋯、鎂、鋁、金、銀、銅、鈀、鎢所組成之群中之至少一種金屬之金屬氧化物。於該金屬氧化物中,亦可視需要進一步包含上述群所示之金屬原子。例如宜使用含有氧化錫之氧化銦(ITO)、含有銻之氧化錫(ATO)等。使用含有氧化錫之氧化銦時,氧化錫之含量於透明導電膜中宜為1~20重量%、較佳為3~15重量%。(Transparent Conductive Film) The transparent conductive film may be provided on the transparent resin film, and is preferably provided on the first hardened resin layer provided on one of the first main surface sides of the transparent resin film. The constituent material of the transparent conductive film is not particularly limited as long as it contains an inorganic substance, and may be suitably selected from the group consisting of indium, tin, zinc, gallium, antimony, titanium, cerium, zirconium, magnesium, aluminum, gold, silver, copper, and palladium. a metal oxide of at least one metal of the group consisting of tungsten. Further, in the metal oxide, a metal atom represented by the above group may be further contained as needed. For example, indium oxide (ITO) containing tin oxide, tin oxide containing bismuth (ATO), or the like is preferably used. When indium oxide containing tin oxide is used, the content of tin oxide is preferably 1 to 20% by weight, preferably 3 to 15% by weight, based on the transparent conductive film.

透明導電膜之厚度並無特別限定,但為形成其表面電阻為1×103 Ω/□以下之具有良好導電性之連續被膜,宜將厚度設為10nm以上。膜厚若過厚由於會造成透明性降低等,故宜為15~35nm、較佳為20~30nm之範圍內。若透明導電膜之厚度未達10nm,則膜表面之電阻變高且難以形成連續被膜。又,若透明導電膜之厚度超過35nm,則有造成透明性降低等情形。The thickness of the transparent conductive film is not particularly limited, but a continuous film having a surface resistance of 1 × 10 3 Ω/□ or less and having good conductivity is preferably 10 nm or more. If the film thickness is too large, the transparency is lowered, and the like, and it is preferably in the range of 15 to 35 nm, preferably 20 to 30 nm. When the thickness of the transparent conductive film is less than 10 nm, the electric resistance of the surface of the film becomes high and it is difficult to form a continuous film. Further, when the thickness of the transparent conductive film exceeds 35 nm, the transparency may be lowered.

透明導電膜之形成方法並無特別限定,可採用先前周知之方法。具體而言,例如可例示真空蒸鍍法、濺鍍法、離子鍍法等乾式製程。又,亦可根據需要之膜厚採用適當的方法。再者,於第1硬化樹脂層上形成透明導電膜之情形,若藉由濺鍍法等乾式製程形成透明導電膜,則透明導電膜之表面大致維持作為其底層之第1硬化樹脂層表面形狀。因此,於第1硬化樹脂層存在隆起之情形,對透明導電膜表面亦適當地賦與抗接著性及易滑性。The method for forming the transparent conductive film is not particularly limited, and a conventionally known method can be employed. Specifically, for example, a dry process such as a vacuum deposition method, a sputtering method, or an ion plating method can be exemplified. Further, an appropriate method can be employed depending on the film thickness required. In the case where the transparent conductive film is formed on the first cured resin layer, the surface of the transparent conductive film substantially maintains the surface shape of the first hardened resin layer as the underlayer thereof by forming a transparent conductive film by a dry process such as sputtering. . Therefore, in the case where the first cured resin layer is embossed, the surface of the transparent conductive film is appropriately imparted with adhesion resistance and smoothness.

透明導電膜可視需要實施加熱退火處理(例如大氣環境下於80~150℃進行30~90分鐘左右)而結晶化。藉由使透明導電膜結晶化,除了將透明導電膜低電阻化外,亦提高透明性及耐久性。使非晶質之透明導電膜轉化為結晶質之方法並無特別限定,可使用空氣循環式烘箱或IR加熱器等。The transparent conductive film may be crystallized by heat annealing treatment (for example, at 80 to 150 ° C for 30 to 90 minutes in an atmosphere). By crystallizing the transparent conductive film, in addition to lowering the resistance of the transparent conductive film, transparency and durability are also improved. The method of converting the amorphous transparent conductive film into a crystalline substance is not particularly limited, and an air circulating oven, an IR heater, or the like can be used.

關於「結晶質」之定義,是將於透明樹脂薄膜上形成有透明導電膜之透明導電性薄膜於20℃、濃度5重量%之鹽酸中浸漬15分鐘後,水洗及乾燥,以測量儀對15mm間之端子間電阻進行測定,當端子間電阻不超過10kΩ時,表示ITO膜朝結晶質之轉化完成。The definition of "crystalline" is a transparent conductive film in which a transparent conductive film is formed on a transparent resin film, and immersed in hydrochloric acid at a concentration of 5 wt% for 15 minutes at 20 ° C, and then washed with water and dried to measure 15 mm. The resistance between the terminals was measured. When the resistance between the terminals did not exceed 10 kΩ, the conversion of the ITO film toward the crystal was completed.

又,透明導電膜亦可藉由蝕刻等而圖案化。關於透明導電膜之圖案化,可使用先前周知之光微影法之技術進行。作為蝕刻液,宜使用酸。作為酸,例如可列舉:氯化氫、溴化氫、硫酸、硝酸、磷酸等無機酸、醋酸等有機酸及此等之混合物、以及其等之水溶液。例如於電容式之觸控面板或矩陣式之電阻膜式之觸控面板所使用之透明導電性薄膜中,宜將透明導電膜圖案化成條紋狀。再者,藉由蝕刻將透明導電膜圖案化時,若先進行透明導電膜之結晶化,則有難以藉由蝕刻進行圖案化之情形。因此,透明導電膜之退火處理宜於將透明導電膜圖案化之後進行。Further, the transparent conductive film may be patterned by etching or the like. The patterning of the transparent conductive film can be carried out using a technique known from the conventional photolithography method. As the etching solution, an acid is preferably used. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid; organic acids such as acetic acid; and mixtures thereof; and aqueous solutions thereof. For example, in a transparent conductive film used for a capacitive touch panel or a matrix resistive touch panel, the transparent conductive film is preferably patterned into stripes. Further, when the transparent conductive film is patterned by etching, if the crystallization of the transparent conductive film is performed first, it may be difficult to pattern by etching. Therefore, the annealing treatment of the transparent conductive film is preferably performed after patterning the transparent conductive film.

透明導電膜於積層後述之載體薄膜時可為非晶質、亦可為結晶質。例如,可於透明導電膜為非晶質狀態之透明導電性薄膜經由黏著劑層貼合保護薄膜後,進行退火處理轉化為結晶質。The transparent conductive film may be amorphous or crystalline when the carrier film described later is laminated. For example, the transparent conductive film in which the transparent conductive film is in an amorphous state can be bonded to the crystalline film after being bonded to the protective film via the adhesive layer.

前述透明導電膜可包含金屬奈米線。所謂金屬奈米線是指材質為金屬、形狀為針狀或線狀且直徑為奈米尺寸之導電性物質。金屬奈米線可為直線狀、亦可為曲線狀。若使用以金屬奈米線構成之透明導電層,藉由金屬奈米線成為網眼狀,即使為少量之金屬奈米線亦可形成良好之電性傳導路徑,可獲得電阻較小之透明導電性薄膜。進而,藉由金屬奈米線成為網眼狀,可於網眼之間隙形成開口部,可獲得光穿透率較高之透明導電性薄膜。The aforementioned transparent conductive film may comprise a metal nanowire. The metal nanowire refers to a conductive material whose material is a metal, has a needle shape or a linear shape, and has a diameter of a nanometer. The metal nanowires may be linear or curved. If a transparent conductive layer made of a metal nanowire is used, the metal nanowire becomes a mesh shape, and even a small amount of the metal nanowire can form a good electrical conduction path, and a transparent conductive having a small electrical resistance can be obtained. Film. Further, by forming the metal nanowire into a mesh shape, an opening can be formed in the gap of the mesh, and a transparent conductive film having a high light transmittance can be obtained.

作為構成前述金屬奈米線之金屬,只要為導電性較高之金屬即可,可使用任意之適當的金屬。作為構成前述金屬奈米線之金屬,例如可列舉:銀、金、銅、鎳等。又,亦可使用對此等金屬進行鍍覆(例如鍍金處理)之材料。其中,由導電性之觀點,較好的是銀、銅或金,更好的是銀。As the metal constituting the metal nanowire, any metal having a high conductivity may be used, and any appropriate metal may be used. Examples of the metal constituting the metal nanowire include silver, gold, copper, nickel, and the like. Further, a material which is plated with such a metal (for example, gold plating treatment) may also be used. Among them, from the viewpoint of conductivity, silver, copper or gold is preferred, and silver is more preferred.

(光學調整層)   於本發明中,可於透明樹脂薄膜或第1硬化樹脂層與透明導電膜之間,進而包含一層以上之光學調整層。於透明導電性薄膜之穿透率上升或將透明導電膜圖案化時,光學調整層可減低圖案殘留之圖案部與圖案未殘留之開口部之間的穿透率差或反射率差,用以獲得視認性優異之透明導電性薄膜。(Optical Adjustment Layer) In the present invention, one or more optical adjustment layers may be further included between the transparent resin film or the first cured resin layer and the transparent conductive film. When the transmittance of the transparent conductive film is increased or the transparent conductive film is patterned, the optical adjustment layer can reduce the difference in transmittance or the difference in reflectance between the pattern portion where the pattern remains and the opening portion where the pattern is not left. A transparent conductive film excellent in visibility is obtained.

光學調整層之折射率宜為1.5~1.8,較佳為1.51~1.78,更佳為1.52~1.75。藉此,可減低穿透率差或反射率差,獲得視認性優異之透明導電性薄膜。The refractive index of the optical adjustment layer is preferably from 1.5 to 1.8, preferably from 1.51 to 1.78, more preferably from 1.52 to 1.75. Thereby, the difference in transmittance or the difference in reflectance can be reduced, and a transparent conductive film excellent in visibility can be obtained.

光學調整層藉由無機物、有機物、或無機物與有機物之混合物形成。作為形成光學調整層之材料,可列舉:NaF、Na3 AlF6 、LiF、MgF2 、CaF2 、SiO2 、LaF3 、CeF3 、Al2 O3 、TiO2 、Ta2 O5 、ZrO2 、ZnO、ZnS、SiOx (x為1.5以上、未達2)等無機物、或丙烯酸樹脂、環氧樹脂、胺基甲酸酯樹脂、三聚氰胺樹脂、醇酸樹脂、矽氧烷系聚合物等有機物。特別是作為有機物,宜使用包含三聚氰胺樹脂、醇酸樹脂與有機矽烷縮合物之混合物之熱硬化型樹脂。光學調整層可使用上述材料藉由溼式法、凹版塗佈法或棒塗佈法等塗佈法、真空蒸鍍法、濺鍍法、離子鍍法等而形成。The optical adjustment layer is formed by an inorganic substance, an organic substance, or a mixture of an inorganic substance and an organic substance. Examples of the material for forming the optical adjustment layer include NaF, Na 3 AlF 6 , LiF, MgF 2 , CaF 2 , SiO 2 , LaF 3 , CeF 3 , Al 2 O 3 , TiO 2 , Ta 2 O 5 , and ZrO 2 . , inorganic substances such as ZnO, ZnS, SiO x (x is 1.5 or more, less than 2), or organic substances such as acrylic resin, epoxy resin, urethane resin, melamine resin, alkyd resin, and decane-based polymer. . In particular, as the organic substance, a thermosetting resin containing a mixture of a melamine resin, an alkyd resin and an organic decane condensate is preferably used. The optical adjustment layer can be formed by a coating method such as a wet method, a gravure coating method, or a bar coating method, a vacuum deposition method, a sputtering method, an ion plating method, or the like using the above materials.

光學調整層亦可具有平均粒徑為1nm~500nm之奈米微粒子。光學調整層中之奈米微粒子之含量宜為0.1重量%~90重量%。用於光學調整層中之奈米微粒子之平均粒徑如上所述宜為1nm~500nm之範圍,較佳為5nm~300nm。又,光學調整層中之奈米微粒子之含量較佳為10重量%~80重量%,更佳為20重量%~70重量%。藉由於光學調整層中含有奈米微粒子,可容易地進行光學調整層本身之折射率之調整。The optical adjustment layer may also have nano fine particles having an average particle diameter of 1 nm to 500 nm. The content of the nanoparticles in the optical adjustment layer is preferably from 0.1% by weight to 90% by weight. The average particle diameter of the nanoparticles used in the optical adjustment layer is preferably in the range of 1 nm to 500 nm, preferably 5 nm to 300 nm, as described above. Further, the content of the nanoparticles in the optical adjustment layer is preferably from 10% by weight to 80% by weight, more preferably from 20% by weight to 70% by weight. The adjustment of the refractive index of the optical adjustment layer itself can be easily performed by containing the nanoparticles in the optical adjustment layer.

作為形成奈米微粒子之無機氧化物,例如可列舉:氧化矽(二氧化矽)、中空奈米二氧化矽、氧化鈦、氧化鋁、氧化鋅、氧化錫、氧化鋯、氧化鈮等微粒子。此等中,較佳為氧化矽(二氧化矽)、氧化鈦、氧化鋁、氧化鋅、氧化錫、氧化鋯、氧化鈮之微粒子。此等可單獨使用一種,亦可併用二種以上。Examples of the inorganic oxide forming the nanoparticles include fine particles such as cerium oxide (cerium oxide), hollow nano cerium oxide, titanium oxide, aluminum oxide, zinc oxide, tin oxide, zirconium oxide, and cerium oxide. Among these, fine particles of cerium oxide (cerium oxide), titanium oxide, aluminum oxide, zinc oxide, tin oxide, zirconium oxide, and cerium oxide are preferable. These may be used alone or in combination of two or more.

光學調整層之厚度宜為10nm~200nm,較佳為20nm~150nm,更佳為30nm~130nm。若光學調整層之厚度過小,難以成為連續被膜。又,若光學調整層之厚度過大,有透明導電性薄膜之透明性降低或容易產生裂紋之傾向。The thickness of the optical adjustment layer is preferably from 10 nm to 200 nm, preferably from 20 nm to 150 nm, more preferably from 30 nm to 130 nm. If the thickness of the optical adjustment layer is too small, it is difficult to form a continuous film. Further, when the thickness of the optical adjustment layer is too large, the transparency of the transparent conductive film is lowered or cracking tends to occur.

(金屬層、金屬佈線)   於本發明中,亦可於透明導電膜上設置金屬層或金屬佈線。金屬佈線雖然亦可於透明導電膜上形成金屬層後,藉由蝕刻而形成,但較好的是如下所述使用感光性金屬糊而形成。即,金屬佈線是於將透明導電膜圖案化後,將後述之感光性導電糊塗佈於前述透明樹脂薄膜上或前述透明導電膜上,形成感光性金屬糊層,使光罩積層或接近,經由光罩對感光性金屬糊層進行曝光,接著進行顯影、形成圖案後,經由乾燥步驟而獲得。即,可藉由周知之光微影法等形成金屬佈線之圖案。(Metal Layer, Metal Wiring) In the present invention, a metal layer or a metal wiring may be provided on the transparent conductive film. Although the metal wiring may be formed by etching after forming a metal layer on the transparent conductive film, it is preferably formed by using a photosensitive metal paste as follows. In other words, after patterning the transparent conductive film, a metal conductive paste is applied onto the transparent resin film or the transparent conductive film to form a photosensitive metal paste layer, and the mask is laminated or close thereto. The photoreceptor exposes the photosensitive metal paste layer, and then develops and forms a pattern, which is obtained through a drying step. That is, the pattern of the metal wiring can be formed by a well-known photolithography method or the like.

前述感光性導電糊宜包含金屬粉末等導電性粒子與感光性有機成分。作為金屬粉末之導電性粒子之材料,宜為包含選自Ag、Au、Pd、Ni、Cu、Al及Pt之群之至少一種之材料,更佳為Ag。金屬粉末之導電性粒子之體積平均粒徑宜為0.1μm~2.5μm。The photosensitive conductive paste preferably contains conductive particles such as metal powder and a photosensitive organic component. The material of the conductive particles of the metal powder is preferably a material containing at least one selected from the group consisting of Ag, Au, Pd, Ni, Cu, Al, and Pt, and more preferably Ag. The volume average particle diameter of the conductive particles of the metal powder is preferably from 0.1 μm to 2.5 μm.

作為金屬粉末以外之導電性粒子,可為將樹脂粒子表面以金屬被覆之金屬被覆樹脂粒子。作為樹脂粒子之材料,可包含前述之粒子,但以丙烯酸系樹脂為佳。金屬被覆樹脂粒子可藉由使矽烷偶合劑與樹脂粒子之表面反應,進而以金屬被覆於該表面而獲得。藉由使用矽烷偶合劑,可使樹脂成分之分散穩定化,形成均勻的金屬被覆樹脂粒子。The conductive particles other than the metal powder may be metal-coated resin particles coated with metal on the surface of the resin particles. The material of the resin particles may include the above-mentioned particles, but an acrylic resin is preferred. The metal-coated resin particles can be obtained by reacting a decane coupling agent with the surface of the resin particles and further coating the surface with a metal. By using a decane coupling agent, the dispersion of the resin component can be stabilized to form uniform metal-coated resin particles.

感光性導電糊亦可進而包含玻璃料。玻璃料其體積平均粒徑宜為0.1μm~1.4μm,90%粒徑宜為1~2μm及最大尺寸為4.5μm以下。作為玻璃料之組成並無特別限定,但宜以相對於整體為30重量%~70重量%之範圍來調配Bi2 O3 。作為Bi2 O3 以外可包含之氧化物,可包含SiO2 、B2 O3 、ZrO2 、Al2 O3 。較好的是Na2 O、K2 O、Li2 O實質上不包含之無鹼之玻璃料。The photosensitive conductive paste may further contain a glass frit. The glass frit preferably has a volume average particle diameter of 0.1 μm to 1.4 μm, a 90% particle diameter of preferably 1 to 2 μm, and a maximum size of 4.5 μm or less. The composition of the glass frit is not particularly limited, but it is preferable to mix Bi 2 O 3 in a range of 30% by weight to 70% by weight based on the whole. The oxide which may be contained other than Bi 2 O 3 may include SiO 2 , B 2 O 3 , ZrO 2 , and Al 2 O 3 . Preferably, the alkali-free glass frit is substantially not contained in Na 2 O, K 2 O, and Li 2 O.

感光性有機成分宜包含感光性聚合物及/或感光性單體。作為感光性聚合物,宜使用包含選自(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯等具有碳-碳雙鍵之化合物之成分之聚合物或此等共聚物之於丙烯酸樹脂之側鏈或分子末端加成有光反應性基者等。作為較佳為光反應性基,可列舉乙烯基、烯丙基、丙烯酸基、甲基丙烯酸基等乙烯性不飽和基。感光性聚合物之含量宜為1~30重量%、2~30重量%。The photosensitive organic component preferably contains a photosensitive polymer and/or a photosensitive monomer. As the photosensitive polymer, a polymer containing a component selected from a compound having a carbon-carbon double bond such as methyl (meth)acrylate or ethyl (meth)acrylate or a copolymer thereof is preferably used for the acrylic resin. A photoreactive group or the like is added to a side chain or a molecular end. The photoreactive group is preferably an ethylenically unsaturated group such as a vinyl group, an allyl group, an acryl group or a methacryl group. The content of the photosensitive polymer is preferably from 1 to 30% by weight and from 2 to 30% by weight.

作為感光性單體,可列舉甲基丙烯丙烯酸酯、丙烯酸乙酯等(甲基)丙烯酸酯系單體、或γ-甲基丙烯醯氧基丙基三甲氧基矽烷、1-乙烯基-2-吡咯啶酮等,可使用一種或二種以上。Examples of the photosensitive monomer include (meth)acrylate monomers such as methacryl acrylate and ethyl acrylate, or γ-methacryloxypropyltrimethoxydecane and 1-vinyl-2. - Pyrrolidone or the like may be used alone or in combination of two or more.

於感光性導電糊中,就光感度方面而言,宜相對於金屬粉末100重量份包含5~40重量%感光性有機成分,較佳為10重量份~30重量份。又,本發明之感光性導電糊宜視需要使用光聚合起始劑、增感劑、聚合抑制劑、有機溶劑。In the photosensitive conductive paste, the photosensitive organic component is preferably contained in an amount of 5 to 40% by weight based on 100 parts by weight of the metal powder, and preferably 10 parts by weight to 30 parts by weight. Moreover, it is preferable to use a photopolymerization initiator, a sensitizer, a polymerization inhibitor, and an organic solvent as the photosensitive conductive paste of this invention.

金屬層之厚度並無特別限制。例如以藉由蝕刻等去除金屬層面內之一部分而形成圖案佈線時,形成後之圖案佈線具有期望之電阻值之方式適當地設定金屬層之厚度。因此,金屬層之厚度宜為0.01~200μm,較佳為0.05~100μm。若金屬層之厚度為上述範圍,圖案佈線之電阻不會變過高、裝置之消耗電力不會過大。又,金屬層之成膜之生產效率提高,成膜時之累積熱量變小,於薄膜不易產生熱皺褶。The thickness of the metal layer is not particularly limited. For example, when a pattern wiring is formed by removing one portion of the metal layer by etching or the like, the thickness of the metal layer is appropriately set so that the pattern wiring after formation has a desired resistance value. Therefore, the thickness of the metal layer is preferably from 0.01 to 200 μm, preferably from 0.05 to 100 μm. If the thickness of the metal layer is within the above range, the resistance of the pattern wiring does not become too high, and the power consumption of the device is not excessively large. Further, the production efficiency of the film formation of the metal layer is improved, and the accumulated heat at the time of film formation becomes small, and heat wrinkles are less likely to occur in the film.

透明導電性薄膜為與顯示器組合使用之觸控面板用之透明導電性薄膜時,與顯示部分對應之部分藉由經圖案化之透明導電膜形成,由感光性導電糊製作之金屬佈線使用於非顯示部(例如周緣部)之佈線部份。透明導電膜亦可用於非顯示部,此時金屬佈線可形成於透明導電膜上。When the transparent conductive film is a transparent conductive film for a touch panel used in combination with a display, a portion corresponding to the display portion is formed by a patterned transparent conductive film, and a metal wiring made of a photosensitive conductive paste is used for non- The wiring portion of the display portion (for example, the peripheral portion). The transparent conductive film can also be used for the non-display portion, in which case the metal wiring can be formed on the transparent conductive film.

<載體薄膜>   於本發明中,透明導電性薄膜亦可具有載體薄膜。載體薄膜於保護薄膜之至少一面側具有黏著劑層。載體薄膜經由黏著劑層與透明導電性薄膜於透明導電性薄膜之第2主面側以可剝離方式做貼合,而形成透明導電性薄膜。將載體薄膜自透明導電性薄膜剝離時,黏著劑層可與保護薄膜一同被剝離,亦可僅保護薄膜被剝離。<Carrier Film> In the present invention, the transparent conductive film may have a carrier film. The carrier film has an adhesive layer on at least one side of the protective film. The carrier film is peelably bonded to the second main surface side of the transparent conductive film via the adhesive layer and the transparent conductive film to form a transparent conductive film. When the carrier film is peeled off from the transparent conductive film, the adhesive layer may be peeled off together with the protective film, or only the protective film may be peeled off.

(保護薄膜)   作為形成保護薄膜之材料,較佳為透明性、機械強度、熱穩定性、水分阻斷性、等方性等優異之材料。作為保護薄膜可使用由結晶性樹脂或非晶性樹脂形成之薄膜。(Protective Film) As the material for forming the protective film, a material excellent in transparency, mechanical strength, thermal stability, moisture barrier property, and isotropic properties is preferable. As the protective film, a film formed of a crystalline resin or an amorphous resin can be used.

作為結晶性樹脂,可列舉聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂、聚乙烯、聚丙烯等聚烯烴系樹脂等,較佳為聚酯系樹脂。The crystalline resin may, for example, be a polyester resin such as polyethylene terephthalate or polyethylene naphthalate, or a polyolefin resin such as polyethylene or polypropylene, and is preferably a polyester resin.

作為非晶性樹脂,可列舉環烯烴系樹脂或聚碳酸酯系樹脂等,由具有優異之光穿透性、耐傷性、耐水性且良好之機械性質之觀點而言,較佳為聚碳酸酯系樹脂。於聚碳酸酯系樹脂中,例如可列舉:脂肪族聚碳酸酯、芳香族聚碳酸酯、脂肪族-芳香族聚碳酸酯等。The amorphous resin may, for example, be a cycloolefin resin or a polycarbonate resin. From the viewpoint of having excellent light transmittance, scratch resistance, water resistance and good mechanical properties, polycarbonate is preferred. Resin. Examples of the polycarbonate resin include an aliphatic polycarbonate, an aromatic polycarbonate, and an aliphatic-aromatic polycarbonate.

保護薄膜與透明樹脂薄膜相同,亦可於表面預先實施濺鍍、電暈放電、噴火、紫外線照射、電子束照射、化學變化、氧化等蝕刻處理或底層塗佈處理,使與保護薄膜上之黏著劑層等之密接性提高。又,於形成黏著劑層之前,亦可視需要藉由溶劑洗淨或超音波洗淨等將保護薄膜表面除塵、清淨化。The protective film is the same as the transparent resin film, and may be previously subjected to etching, corona discharge, fire blasting, ultraviolet ray irradiation, electron beam irradiation, chemical change, oxidation, or the like on the surface to adhere to the protective film. The adhesion of the agent layer or the like is improved. Further, before the formation of the adhesive layer, the surface of the protective film may be dedusted and purified by solvent washing or ultrasonic cleaning.

由提升作業性等觀點,保護薄膜之厚度宜為20~150μm,較佳為30~100μm,更佳為40~80μm。The thickness of the protective film is preferably from 20 to 150 μm, preferably from 30 to 100 μm, more preferably from 40 to 80 μm, from the viewpoint of improving workability and the like.

(黏著劑層)   作為黏著劑層,只要為具有透明性者即可,可無特別限制地使用。具體而言,例如可適當地選擇使用以如下聚合物作為基礎聚合物之材料,即:丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺基甲酸酯、聚醯胺、聚乙烯醚、乙酸乙烯/氯乙烯共聚物、改性聚烯烴、環氧系、氟系、天然橡膠、合成橡膠等橡膠系等之聚合物。尤其是由光學透明性優異、顯示適度之潤溼性、凝聚性及接著性等黏著特性、耐候性及耐熱性等亦優異之方面來看,較佳為使用丙烯酸系黏著劑。(Adhesive Layer) The adhesive layer may be any one as long as it has transparency, and can be used without particular limitation. Specifically, for example, a material using a polymer as a base polymer, that is, an acrylic polymer, a polyoxymethylene polymer, a polyester, a polyurethane, a polyamide, a poly A polymer such as a vinyl ether, a vinyl acetate/vinyl chloride copolymer, a modified polyolefin, an epoxy-based, a fluorine-based, a natural rubber, or a synthetic rubber. In particular, an acrylic pressure-sensitive adhesive is preferably used because it is excellent in optical transparency, moisture permeability, cohesiveness and adhesion, and weather resistance and heat resistance.

黏著劑層之形成方法並無特別限制,可列舉於剝離襯墊塗佈黏著劑組成物,乾燥後轉印於基材薄膜之方法(轉印法),於保護薄膜直接塗佈黏著劑組成物並使之乾燥之方法(直印法)或藉由共擠出之方法等。再者,於黏著劑中,亦可視需要適當地使用黏著賦與劑、塑化物、填充劑、抗氧化劑、紫外線吸收劑、矽烷偶合劑等。黏著劑層之較佳厚度為5μm~100μm,較佳為10μm~50μm,更佳為15μm~35μm。The method for forming the adhesive layer is not particularly limited, and examples thereof include a method in which a release liner is applied to an adhesive composition, and after drying, transfer to a base film (transfer method), and an adhesive composition is directly applied to the protective film. A method of drying it (direct printing method) or a method of co-extrusion. Further, in the adhesive, an adhesive agent, a plasticizer, a filler, an antioxidant, an ultraviolet absorber, a decane coupling agent, or the like may be appropriately used as needed. The thickness of the adhesive layer is preferably from 5 μm to 100 μm, preferably from 10 μm to 50 μm, more preferably from 15 μm to 35 μm.

<透明導電性薄膜之特性>   本發明之透明導電性薄膜,作為實施例中之彩虹紋之評價之xy表色中之偏差,較佳為Δx為0.15以下、Δy為0.20以下,更佳為Δx為0.13以下、Δy為0.17以下。<Characteristics of Transparent Conductive Film> The transparent conductive film of the present invention preferably has a Δx of 0.15 or less and a Δy of 0.20 or less, more preferably Δx, as a variation in the xy color of the rainbow pattern in the examples. It is 0.13 or less, and Δy is 0.17 or less.

又,於達成上述特性時,以單體使用透明樹脂薄膜之情形,作為xy表色中之偏差,較佳為Δx為0.15以下、Δy為0.20以下,更佳為Δx為0.13以下、Δy為0.17以下。In the case where the above-mentioned characteristics are used, when the transparent resin film is used alone, the variation in the xy color is preferably Δx of 0.15 or less, Δy of 0.20 or less, more preferably Δx of 0.13 or less, and Δy of 0.17. the following.

<觸控面板>   由透明導電性薄膜剝離載體薄膜或保護薄膜後之透明導電性薄膜,例如可適用作為電容式、電阻膜式等之觸控面板等電子機器之透明電極。<Touch Panel> A transparent conductive film obtained by peeling a carrier film or a protective film from a transparent conductive film can be suitably used as a transparent electrode of an electronic device such as a touch panel such as a capacitive or resistive film.

於形成觸控面板時,可於前述透明導電性薄膜之一個或二個主面經由透明之黏著劑層貼合玻璃或高分子薄膜等其他基材等。例如,亦可形成於透明導電性薄膜之未形成有透明導電膜之側之面經由透明之黏著劑層貼合有透明基體之積層體。透明基體可由一片基體薄膜形成,亦可為二片以上之基體薄膜之積層體(例如經由透明之黏著劑層積層而成者)。又,亦可於貼合於透明導電性薄膜之透明基體之外表面設置硬塗層。作為用於透明導電性薄膜與基材之貼合之黏著劑層,如前所述,只要為具有透明性者即可,可無特別限制地使用。When the touch panel is formed, another substrate such as glass or polymer film may be bonded to one or both main surfaces of the transparent conductive film via a transparent adhesive layer. For example, a laminate in which a transparent substrate is bonded to a surface of the transparent conductive film on the side where the transparent conductive film is not formed via a transparent adhesive layer may be formed. The transparent substrate may be formed of a single base film, or may be a laminate of two or more base films (for example, laminated via a transparent adhesive). Further, a hard coat layer may be provided on the outer surface of the transparent substrate bonded to the transparent conductive film. As the adhesive layer for bonding the transparent conductive film and the substrate, as long as it has transparency, it can be used without particular limitation.

將本發明之透明導電性薄膜用於形成觸控面板時,藉由將低相位差之聚酯作為基材使用,可提供一種具有充分材料強度且材料費便宜、生產性亦良好並可獲得充分抑制彩虹紋之效果的具有透明導電性薄膜之觸控面板。若為觸控面板以外用途,可用於屏蔽自電子機器發出之電磁波或雜訊之屏蔽用途。   [實施例]When the transparent conductive film of the present invention is used for forming a touch panel, by using a polyester having a low phase difference as a substrate, it is possible to provide a material having sufficient material strength, a low material cost, good productivity, and sufficient availability. A touch panel having a transparent conductive film that suppresses the effect of rainbow lines. For applications other than touch panels, it can be used to shield electromagnetic waves or noise from electronic devices. [Examples]

以下,使用實施例就本發明詳細地說明,但本發明並不限定於以下實施例。再者,實施例等中之物性等如下所述地進行測定。Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited to the following examples. In addition, the physical properties and the like in the examples and the like were measured as described below.

(相位差)   使用偏光/相位差測定系統(Axometrics製 製品名「AxoScan」),於23℃之環境下以測定波長590nm進行透明樹脂薄膜之面內相位差之測定。又,藉由相同方法,測定以遲相軸方向及進相軸方向為旋轉中心將薄膜傾斜40°時之相位差。再者,相位差之測定值之次數,以與預先求得之透明樹脂薄膜之相位差之波長分散一致之方式進行決定。由此等之測定值算出透明樹脂薄膜之面內相位差值(R0)與厚度方向相位差值(Rth)。(Phase Difference) The in-plane retardation of the transparent resin film was measured at a measurement wavelength of 590 nm in an environment of 23 ° C using a polarization/phase difference measurement system (product name "AxoScan"). Further, by the same method, the phase difference when the film was tilted by 40° with the slow axis direction and the phase axis direction as the center of rotation was measured. In addition, the number of times of the measured value of the phase difference is determined so as to be dispersed in accordance with the wavelength difference of the phase difference of the transparent resin film obtained in advance. From the measured values, the in-plane retardation value (R0) of the transparent resin film and the thickness direction retardation value (Rth) were calculated.

(厚度之測定)   關於具有1μm以上厚度者,以測微(microgauge)式厚度計(Mitutoyo公司製)進行厚度之測定。又,未達1μm之厚度或光學調整層之厚度,以瞬間多重測光系統(大塚電子公司製 MCPD2000)進行測定。如ITO膜等厚度般之奈米尺寸之厚度,以FB-2000A(日立High-Technologies股份有限公司製)製作剖面觀察用樣品,剖面TEM觀察使用HF-2000(日立High-Technologies股份有限公司製)測定膜厚。將評價結果顯示於表1。(Measurement of Thickness) For the thickness of 1 μm or more, the thickness was measured by a microgauge type thickness meter (manufactured by Mitutoyo Co., Ltd.). Further, the thickness was less than 1 μm or the thickness of the optical adjustment layer was measured by an instantaneous multi-time measuring system (MCPD2000 manufactured by Otsuka Electronics Co., Ltd.). For the thickness of the nanometer, such as the thickness of the ITO film, a sample for cross-section observation was prepared by FB-2000A (manufactured by Hitachi High-Technologies Co., Ltd.), and HF-2000 (manufactured by Hitachi High-Technologies Co., Ltd.) was used for the cross-sectional TEM observation. The film thickness was measured. The evaluation results are shown in Table 1.

(彩虹紋之評價)   彩虹紋之評價方法,係以xy表色進行偏差評價及目視進行四階段評價(◎~×)。   xy表色之偏差評價使用錐光偏振儀(Autronic-Melchers公司製、Conoscope)實施,使用於高亮度背光上配置有市售之偏光板者。以基材之遲相軸(即配向軸)之方向相對於該第一偏光板之吸收軸成為45°之方式載置透明導電性薄膜,進而於前述透明導電性薄膜之上,以吸收軸相對於第一偏光板之吸收軸成正交之方式進而載置第二偏光板,利用錐光偏振儀從全方位(極角0°~80°、方位角0°~360°)測定x值與y值,評價此時之xy表色之偏差。Δx、Δy越小,越抑制彩虹紋,Δx為0.15以下、Δy為0.20以下成為良好的抑制彩虹紋之標準。(Evaluation of Rainbow Pattern) The evaluation method of the rainbow pattern is based on the xy color and the four-stage evaluation (◎~×). The evaluation of the deviation of the xy color was carried out using a conopolar polarimeter (Conoscope manufactured by Autronic-Melchers Co., Ltd.), and was used for a high-intensity backlight in which a commercially available polarizing plate was disposed. The transparent conductive film is placed on the slow axis of the substrate (ie, the alignment axis) so as to be 45° with respect to the absorption axis of the first polarizing plate, and the absorption axis is opposite to the transparent conductive film. The second polarizing plate is further placed on the absorption axis of the first polarizing plate in an orthogonal manner, and the x value is measured from the omnidirectional (polar angle 0° to 80°, azimuth angle 0° to 360°) by a cone polarizer. The value of y is used to evaluate the deviation of the xy color at this time. The smaller the Δx and Δy, the more the rainbow pattern is suppressed, and Δx is 0.15 or less, and Δy is 0.20 or less, which is a good standard for suppressing rainbow stripes.

又,目視進行之四階段評價,×:相對於角度變化,色相明顯變化,△:色相明顯變化之角度範圍大約為極角40~60°之範圍,比上述1窄,○:色相明顯變化之角度範圍大約為極角40~50°之範圍,比上述2更窄,◎:相對於角度變化,幾乎沒有確認到色相變化。Moreover, the four-stage evaluation by visual observation, ×: the hue changes significantly with respect to the angle change, Δ: the angle range in which the hue changes significantly is approximately the range of the polar angle of 40 to 60°, which is narrower than the above 1, ○: the hue changes significantly. The angular range is approximately in the range of the polar angle of 40 to 50°, which is narrower than the above 2, and ◎: almost no change in hue is observed with respect to the change in angle.

[實施例1~7]   藉由改變雙軸延伸之條件,準備具有表1所示之面內相位差值(R0)、厚度方向相位差值(Rth)與厚度之各種聚對苯二甲酸乙二酯(PET)作為透明樹脂薄膜。[Examples 1 to 7] Various polyethylene terephthalate having an in-plane retardation value (R0), a thickness direction retardation value (Rth), and a thickness shown in Table 1 were prepared by changing the conditions of the biaxial stretching. A diester (PET) is used as a transparent resin film.

將上述透明樹脂薄膜作為基材,於其單面塗佈折射率1.62之含有氧化鋯粒子之紫外線硬化型組成物(JSR公司製、商品名「OPSTAR Z7412」)作為光學調整層,形成塗佈層。接著,自形成有塗佈層之側對塗佈層照射紫外線,以厚度成為100nm之方式形成光學調整層。The transparent resin film was used as a substrate, and an ultraviolet curable composition containing a zirconia particle having a refractive index of 1.62 (manufactured by JSR Corporation, trade name "OPSTAR Z7412") was applied as an optical adjustment layer on one surface thereof to form a coating layer. . Next, the coating layer was irradiated with ultraviolet rays from the side on which the coating layer was formed, and the optical adjustment layer was formed so as to have a thickness of 100 nm.

接著,將形成有光學調整層之PET薄膜投入捲取式濺鍍裝置,於光學調整層之表面形成厚度27nm之非晶質之銦錫氧化物層(組成:SnO2 :10wt%),形成透明導電膜。如此製作透明導電性薄膜。Next, the PET film on which the optical adjustment layer was formed was placed in a take-up sputtering apparatus, and an amorphous indium tin oxide layer (composition: SnO 2 : 10 wt%) having a thickness of 27 nm was formed on the surface of the optical adjustment layer to form a transparent film. Conductive film. A transparent conductive film was produced in this manner.

[比較例1~11]   於實施例1中,除了使用具有表1所示之面內相位差值(R0)、厚度方向相位差值(Rth)與厚度之各種聚對苯二甲酸乙二酯(PET)作為基材外,其餘以與實施例1完全相同之條件,製作透明導電性薄膜。[Comparative Examples 1 to 11] In Example 1, except for using various in-plane retardation (R0), thickness direction retardation (Rth) and thickness of various polyethylene terephthalate shown in Table 1, A transparent conductive film was produced under the same conditions as in Example 1 except that (PET) was used as the substrate.

將以上之透明導電性薄膜之評價結果顯示於表1。The evaluation results of the above transparent conductive film are shown in Table 1.

[表1] [Table 1]

如表1之結果所示,實施例1~7之透明導電性薄膜由於面內相位差值為150nm以下且厚度方向相位差值為1000nm以下,故Δx為0.15以下、Δy為0.20以下,且目視評價亦為良好之結果,可充分抑制彩虹紋。此表示可抑制經由偏光太陽眼鏡觀看顯示器時之彩虹紋。相對於此,於面內相位差值超過150nm、或厚度方向相位差值超過1000nm之比較例1~11中,Δx與Δy之至少一者較大,黙視評價之結果亦差,抑制彩虹紋之效果不足。As shown in the results of Table 1, the transparent conductive films of Examples 1 to 7 had an in-plane retardation value of 150 nm or less and a thickness direction retardation of 1000 nm or less. Therefore, Δx was 0.15 or less and Δy was 0.20 or less, and visual observation was carried out. The evaluation is also a good result, and the rainbow pattern can be sufficiently suppressed. This means that the rainbow pattern when the display is viewed through the polarized sunglasses can be suppressed. On the other hand, in Comparative Examples 1 to 11 in which the in-plane retardation value exceeded 150 nm or the thickness direction retardation value exceeded 1000 nm, at least one of Δx and Δy was large, and the result of the squint evaluation was also poor, and the rainbow pattern was suppressed. Insufficient effect.

[實施例8]   於實施例1中,除了如下所述使用於PET薄膜形成有硬化樹脂層者外,其餘以與實施例1完全相同之條件,製作透明導電性薄膜。[Example 8] A transparent conductive film was produced in the same manner as in Example 1 except that the PET film was formed with a cured resin layer as described below.

首先,準備含有球狀粒子之硬化性樹脂組成物,該硬化性樹脂組成物包含100重量份之紫外線硬化性樹脂組成物(DIC公司製 商品名「UNIDIC(註冊商標)RS29-120」)、與0.2重量份之眾數粒徑為1.9μm之丙烯酸系球狀粒子(綜研化學公司製、商品名「MX-180TA」)。First, a curable resin composition containing spherical particles is contained, and the curable resin composition contains 100 parts by weight of an ultraviolet curable resin composition (trade name "UNIDIC (registered trademark) RS29-120" manufactured by DIC Corporation), and 0.2 parts by weight of acrylic spherical particles having a mode diameter of 1.9 μm (manufactured by Soken Chemical Co., Ltd., trade name "MX-180TA").

將準備好之含有球狀粒子之硬化性樹脂組成物以厚度50μm塗佈於PET基材之一面,形成塗佈層。接著,自形成有塗佈層之側對塗佈層照射紫外線,以厚度成為1.0μm之方式形成第2硬化樹脂層。除了與上述不同未添加球狀粒子以外,於PET基材之另一面利用相同之方法以厚度成為1.0μm之方式形成第1硬化樹脂層。再者,光學調整層與透明導電膜之形成於第1硬化樹脂層之表面進行。The prepared curable resin composition containing spherical particles was applied to one surface of a PET substrate at a thickness of 50 μm to form a coating layer. Next, the coating layer was irradiated with ultraviolet rays from the side on which the coating layer was formed, and the second cured resin layer was formed so as to have a thickness of 1.0 μm. The first cured resin layer was formed on the other surface of the PET substrate so that the thickness became 1.0 μm by the same method except that the spherical particles were not added. Further, the optical adjustment layer and the transparent conductive film are formed on the surface of the first cured resin layer.

將所獲得之透明導電性薄膜進行彩虹紋之評價,其結果具有與實施例1實質相同之Δx及Δy,且目視評價亦為良好之結果,可充分抑制彩虹紋。The obtained transparent conductive film was evaluated for rainbow pattern, and as a result, Δx and Δy which were substantially the same as those of Example 1 were obtained, and the visual evaluation was also good, and the rainbow pattern was sufficiently suppressed.

1‧‧‧保護薄膜
2‧‧‧黏著劑層
3‧‧‧第2硬化樹脂層(抗黏著層)
4‧‧‧透明樹脂薄膜
5‧‧‧第1硬化樹脂層(硬塗層)
6‧‧‧透明導電膜
7‧‧‧光學調整層
10‧‧‧載體薄膜
20‧‧‧透明導電性薄膜
1‧‧‧Protective film
2‧‧‧Adhesive layer
3‧‧‧2nd hardened resin layer (anti-adhesive layer)
4‧‧‧Transparent resin film
5‧‧‧1st hardened resin layer (hard coating)
6‧‧‧Transparent conductive film
7‧‧‧Optical adjustment layer
10‧‧‧ Carrier film
20‧‧‧Transparent conductive film

圖1是本發明之一實施形態之透明導電性薄膜的示意性截面圖。   圖2是本發明之一實施形態之透明導電性薄膜的示意性截面圖。   圖3是本發明之一實施形態之透明導電性薄膜的示意性截面圖。   圖4是本發明之一實施形態之透明導電性薄膜的示意性截面圖。   圖5是本發明之一實施形態之透明導電性薄膜的示意性截面圖。   圖6是本發明之一實施形態之透明導電性薄膜的示意性截面圖。Fig. 1 is a schematic cross-sectional view showing a transparent conductive film according to an embodiment of the present invention. Fig. 2 is a schematic cross-sectional view showing a transparent conductive film according to an embodiment of the present invention. Fig. 3 is a schematic cross-sectional view showing a transparent conductive film according to an embodiment of the present invention. Fig. 4 is a schematic cross-sectional view showing a transparent conductive film according to an embodiment of the present invention. Fig. 5 is a schematic cross-sectional view showing a transparent conductive film according to an embodiment of the present invention. Fig. 6 is a schematic cross-sectional view showing a transparent conductive film according to an embodiment of the present invention.

4‧‧‧透明樹脂薄膜 4‧‧‧Transparent resin film

6‧‧‧透明導電膜 6‧‧‧Transparent conductive film

7‧‧‧光學調整層 7‧‧‧Optical adjustment layer

20‧‧‧透明導電性薄膜 20‧‧‧Transparent conductive film

Claims (7)

一種透明導電性薄膜,係具有透明樹脂薄膜及透明導電膜; 前述透明樹脂薄膜為經雙軸延伸之聚酯系樹脂薄膜,其面內相位差值為150nm以下且厚度方向相位差值為1000nm以下。A transparent conductive film having a transparent resin film and a transparent conductive film; wherein the transparent resin film is a biaxially stretched polyester resin film having an in-plane retardation value of 150 nm or less and a thickness direction retardation of 1000 nm or less . 如請求項1之透明導電性薄膜,其中前述透明樹脂薄膜與前述透明導電膜之間具有至少一層光學調整層。The transparent conductive film of claim 1, wherein the transparent resin film and the transparent conductive film have at least one optical adjustment layer. 如請求項1之透明導電性薄膜,其中前述透明樹脂薄膜之厚度為5~50μm。The transparent conductive film of claim 1, wherein the transparent resin film has a thickness of 5 to 50 μm. 如請求項1之透明導電性薄膜,其中前述透明樹脂薄膜為長條體或矩形之單片體,且配向軸相對於長邊或短邊具有10~45°之角度。The transparent conductive film of claim 1, wherein the transparent resin film is an elongated body or a rectangular monolith, and the alignment axis has an angle of 10 to 45 with respect to the long side or the short side. 如請求項1之透明導電性薄膜,其中於前述透明樹脂薄膜之至少一表面具有硬化樹脂層。The transparent conductive film of claim 1, wherein at least one surface of the transparent resin film has a hardened resin layer. 如請求項1至5中任一項之透明導電性薄膜,其中於前述透明樹脂薄膜之未設有前述透明導電膜之面側,依序具有黏著劑層與保護薄膜。The transparent conductive film according to any one of claims 1 to 5, wherein an adhesive layer and a protective film are sequentially provided on a side of the transparent resin film on which the transparent conductive film is not provided. 一種觸控面板,係使用如請求項1至6中任一項之透明導電性薄膜而獲得。A touch panel obtained by using the transparent conductive film according to any one of claims 1 to 6.
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* Cited by examiner, † Cited by third party
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TWI779026B (en) * 2017-04-25 2022-10-01 南韓商東友精細化工有限公司 Touch sensor panel
CN108733270B (en) * 2017-04-25 2024-02-27 东友精细化工有限公司 Touch sensor panel

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