TW201710634A - Decompression drying device and decompression drying method capable of providing a stable decompression drying process for simultaneously performing decompression and heating in a short period of time - Google Patents

Decompression drying device and decompression drying method capable of providing a stable decompression drying process for simultaneously performing decompression and heating in a short period of time Download PDF

Info

Publication number
TW201710634A
TW201710634A TW105118471A TW105118471A TW201710634A TW 201710634 A TW201710634 A TW 201710634A TW 105118471 A TW105118471 A TW 105118471A TW 105118471 A TW105118471 A TW 105118471A TW 201710634 A TW201710634 A TW 201710634A
Authority
TW
Taiwan
Prior art keywords
exhaust pipe
substrate
internal space
chamber
temperature
Prior art date
Application number
TW105118471A
Other languages
Chinese (zh)
Other versions
TWI613410B (en
Inventor
Daisuke Tokieda
Yuji Abe
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Publication of TW201710634A publication Critical patent/TW201710634A/en
Application granted granted Critical
Publication of TWI613410B publication Critical patent/TWI613410B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment

Abstract

The subject of the present invention is to provide a stable decompression drying process for simultaneously performing the decompression and heating in a short period of time. The decompression drying device of the present invention receives the substrate in the internal space of a chamber and, at the same time, the ambient gas of the internal space is discharged through an exhaust pipe connected with the chamber, so as to decompress and heat the internal space. Thus, the solvent component contained in the coating film on the substrate is vaporized to dry the coating film. Moreover, there is a pipe heating portion provided for heating the exhaust pipe. The present invention also provides a decompression drying method.

Description

減壓乾燥裝置及減壓乾燥方法Vacuum drying device and vacuum drying method

本發明涉及一種使形成於液晶顯示裝置用玻璃基板、半導體晶片、電漿顯示面板(plasma display panel,PDP)用玻璃基板、光罩幕用玻璃基板、彩色濾光片用基板、記錄磁碟用基板、太陽能電池用基板、電子紙(electronic paper)用基板等精密電子裝置用基板(以下簡稱作“基板”)上的塗佈膜乾燥的減壓乾燥裝置及減壓乾燥方法。The present invention relates to a glass substrate for a liquid crystal display device, a semiconductor wafer, a glass substrate for a plasma display panel (PDP), a glass substrate for a mask, a substrate for a color filter, and a recording disk. A vacuum drying apparatus and a vacuum drying method for drying a coating film on a substrate for a precision electronic device such as a substrate for a solar cell or a substrate for an electronic paper (hereinafter simply referred to as "substrate").

先前,在所述精密電子裝置用基板的製造步驟中,為了使形成於基板的表面上的塗佈膜乾燥,是使用通過減壓處理而使塗佈膜中所含的溶劑成分氣化而乾燥的減壓乾燥技術。然而,隨著塗佈膜變厚,減壓乾燥所需要的時間延長,從而期望更有效率的減壓乾燥技術。為了滿足所述要求,已提出有與減壓處理同時進行加熱處理的減壓乾燥裝置(例如參照專利文獻1)。In the manufacturing step of the substrate for a precision electronic device, in order to dry the coating film formed on the surface of the substrate, the solvent component contained in the coating film is vaporized by a reduced pressure treatment to be dried. Decompression drying technology. However, as the coating film becomes thicker, the time required for drying under reduced pressure is prolonged, so that a more efficient vacuum drying technique is desired. In order to satisfy the above-mentioned requirements, a vacuum drying apparatus which performs heat treatment simultaneously with a pressure reduction process has been proposed (for example, refer patent document 1).

所述減壓乾燥裝置具有在其內部空間收納形成有塗佈膜的基板的腔室(chamber)。並且,減壓乾燥裝置具備對內部空間進行減壓的功能、以及對內部空間進行加熱的功能,通過同時進行減壓處理及加熱處理而使塗佈膜的減壓乾燥時間縮短。 [現有技術文獻][專利文獻]The vacuum drying apparatus has a chamber in which a substrate on which a coating film is formed is housed in an internal space thereof. Further, the vacuum drying apparatus has a function of decompressing the internal space and a function of heating the internal space, and the pressure reduction drying time of the coating film is shortened by simultaneously performing the pressure reduction treatment and the heat treatment. [Prior Art Document] [Patent Literature]

[專利文獻1]日本專利特開2008-202930號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-202930

[發明所要解決的問題] 然而,如果同時進行減壓處理及加熱處理,則塗佈膜中所含的溶劑成分會在短時間內大量氣化,經由與腔室連接的排氣配管來從所述內部空間排出。在專利文獻1中排氣配管是置於常溫狀態下,如在下述實驗及分析中所說明,有時會產生各種問題。例如難以縮短減壓乾燥處理所需要的時間即所謂的節拍時間(tact time)。並且,每當減壓乾燥處理時節拍時間會發生變動,減壓乾燥處理變得不穩定。[Problems to be Solved by the Invention] However, when the pressure reduction treatment and the heat treatment are simultaneously performed, the solvent component contained in the coating film is vaporized in a large amount in a short time, and the gas is connected to the chamber through the exhaust pipe. The internal space is discharged. In Patent Document 1, the exhaust pipe is placed at a normal temperature, and various problems may occur as described in the following experiments and analyses. For example, it is difficult to shorten the time required for the decompression drying process, that is, a so-called tact time. Further, the tact time fluctuates every time the vacuum drying treatment is performed, and the decompression drying treatment becomes unstable.

本發明是鑒於所述問題而完成的,目的在於提供一種可在短時間內並且穩定地進行同時進行減壓及加熱的減壓乾燥處理的減壓乾燥裝置及減壓乾燥方法。 [解決問題的技術手段]The present invention has been made in view of the above problems, and it is an object of the invention to provide a vacuum drying apparatus and a vacuum drying method which can perform a vacuum drying treatment in which a reduced pressure and a heating are simultaneously performed in a short time and stably. [Technical means to solve the problem]

本發明的一個形態是一種減壓乾燥裝置,一邊將基板收納於腔室的內部空間,一邊通過經由與腔室連接的排氣配管來排出內部空間的環境氣體而對內部空間進行減壓並且對內部空間進行加熱,由此使基板上的塗佈膜中所含的溶劑成分氣化而使塗佈膜乾燥,所述減壓乾燥裝置的特徵在於包括:配管加熱部,對排氣配管進行加熱。According to one aspect of the present invention, in a vacuum drying apparatus, while accommodating a substrate in an internal space of a chamber, the internal space is decompressed by discharging an ambient gas in the internal space through an exhaust pipe connected to the chamber, and The inside space is heated to vaporize the solvent component contained in the coating film on the substrate to dry the coating film. The vacuum drying apparatus includes a piping heating unit that heats the exhaust pipe. .

並且,本發明的另一個形態是一種減壓乾燥方法,其特徵在於包括:收納步驟,將形成有塗佈膜的基板收納於腔室的內部空間;乾燥步驟,經由與腔室連接的排氣配管來排出內部空間的環境氣體而對內部空間進行減壓並且對內部空間進行加熱,由此使基板上的塗佈膜中所含的溶劑成分氣化而使塗佈膜乾燥;以及配管加熱步驟,與乾燥步驟同時進行而對排氣配管進行加熱。 [發明的效果]Furthermore, another aspect of the present invention provides a vacuum drying method, comprising: a housing step of housing a substrate on which a coating film is formed in an internal space of a chamber; and a drying step of exhausting the chamber The piping discharges the ambient gas in the internal space, decompresses the internal space, and heats the internal space, thereby vaporizing the solvent component contained in the coating film on the substrate to dry the coating film; and piping heating step The exhaust pipe is heated simultaneously with the drying step. [Effects of the Invention]

當在腔室的內部空間內不僅進行減壓處理而且同時進行加熱處理時,使溶劑成分從基板上的塗佈膜有效率地氣化,並經由排氣配管從腔室排出。只要在所述排出時排氣配管為常溫程度,經氣化的溶劑成分便會產生液化而附著於排氣配管上。但是,在本發明中,由於排氣配管經加熱,所以溶劑成分的液化受到抑制,從而可以在短時間內並且穩定地使塗佈膜乾燥。When not only the pressure reduction treatment but also the heat treatment is performed in the internal space of the chamber, the solvent component is efficiently vaporized from the coating film on the substrate, and is discharged from the chamber through the exhaust pipe. When the exhaust pipe is at a normal temperature level at the time of discharge, the vaporized solvent component is liquefied and adheres to the exhaust pipe. However, in the present invention, since the exhaust pipe is heated, the liquefaction of the solvent component is suppressed, so that the coating film can be dried in a short time and stably.

圖1是表示本發明的減壓乾燥裝置的一實施方式的構成的縱剖面圖。並且,圖2是表示圖1所示的減壓乾燥裝置的構成的方塊圖。所述減壓乾燥裝置1是使將塗佈液塗佈於基板9的上表面91上而成的塗佈膜92中所含的溶劑成分氣化而使塗佈膜92乾燥的裝置。例如在基板9的上表面91上形成聚醯亞胺膜時,將利用有機溶劑,例如N-甲基-2-吡咯烷酮(N-Methyl-2-Pyrrolidone,NMB)使聚醯亞胺的前驅物(precursor)即聚醯胺酸(polyamic acid)溶解而成的聚醯胺酸溶液用作塗佈液。塗佈所述塗佈液,形成所需厚度的10倍左右(例如當形成5[μm]~10[μm]左右的聚醯亞胺膜時,為50[μm]~100[μm]左右)的比較厚的塗佈膜。接著,利用減壓乾燥裝置1使所述塗佈膜中所含的溶劑成分氣化而加以去除,然後利用與減壓乾燥裝置1不同的加熱裝置進行高溫加熱而使其醯亞胺化,由此在基板9的上表面91上形成聚醯亞胺膜。如上所述,本發明的減壓乾燥裝置1可以使比較厚的塗佈膜92減壓乾燥,特別適用於在減壓乾燥處理時大量溶劑成分產生氣化的情況。Fig. 1 is a longitudinal cross-sectional view showing a configuration of an embodiment of a reduced-pressure drying apparatus according to the present invention. 2 is a block diagram showing the configuration of the reduced-pressure drying device shown in FIG. 1. The vacuum drying apparatus 1 is a device that vaporizes a solvent component contained in a coating film 92 obtained by applying a coating liquid onto the upper surface 91 of the substrate 9 to dry the coating film 92. For example, when a polyimide film is formed on the upper surface 91 of the substrate 9, a precursor of polyimine will be made using an organic solvent such as N-methyl-2-pyrrolidone (NMB). (precursor) A polyamic acid solution in which polyamic acid is dissolved is used as a coating liquid. The coating liquid is applied to form about 10 times of a desired thickness (for example, when a polyimide film having a thickness of about 5 [μm] to 10 [μm] is formed, it is about 50 [μm] to 100 [μm]) A relatively thick coating film. Then, the solvent component contained in the coating film is vaporized and removed by the vacuum drying apparatus 1, and then heated at a high temperature by a heating device different from the vacuum drying apparatus 1 to imidize the yttrium. This forms a polyimide film on the upper surface 91 of the substrate 9. As described above, the vacuum drying apparatus 1 of the present invention can dry the relatively thick coating film 92 under reduced pressure, and is particularly suitable for the case where a large amount of solvent components are vaporized during the vacuum drying treatment.

減壓乾燥裝置1如圖1所示,包括腔室10、基板保持部20、基板加熱部30、排氣部40、配管加熱部50及對整個裝置進行控制的控制部60(圖2)。As shown in FIG. 1, the vacuum drying apparatus 1 includes a chamber 10, a substrate holding unit 20, a substrate heating unit 30, an exhaust unit 40, a piping heating unit 50, and a control unit 60 (FIG. 2) that controls the entire apparatus.

腔室10是包含用於對基板9進行減壓乾燥處理(=減壓處理+加熱處理)的內部空間SP的耐壓容器。腔室10包括可相互分離的底座部11及蓋部12。底座部11固定設置於裝置框架(省略圖示)上。並且,在蓋部12上,連接有圖1中概念性所示的腔室升降機構12a。因此,腔室升降機構12a根據來自控制部60的升降命令而運行,由此蓋部12相對於底座部11而上下地升降移動。當使蓋部12下降時,底座部11與蓋部12抵接而形成為一體,在其內部形成內部空間SP(基板9的處理空間)。在本實施方式中,在底座部11的上表面的周緣部,設置有包含矽橡膠等的O形環13。因此,當蓋部12下降時,在底座部11的上表面與蓋部12的下表面之間介在有O形環13,腔室10的內部空間SP成為氣密狀態。另一方面,當使蓋部12上升時腔室10被打開,從而可以向腔室10搬入基板9以及從腔室10搬出基板9。The chamber 10 is a pressure-resistant container including an internal space SP for performing a vacuum drying treatment (=pressure reduction treatment + heat treatment) on the substrate 9. The chamber 10 includes a base portion 11 and a lid portion 12 that are separable from each other. The base portion 11 is fixedly disposed on a device frame (not shown). Further, a chamber elevating mechanism 12a conceptually shown in Fig. 1 is connected to the lid portion 12. Therefore, the chamber elevating mechanism 12a operates in accordance with the lifting command from the control unit 60, whereby the lid portion 12 moves up and down with respect to the base portion 11. When the lid portion 12 is lowered, the base portion 11 is formed integrally with the lid portion 12, and an internal space SP (processing space of the substrate 9) is formed inside. In the present embodiment, an O-ring 13 including a rubber or the like is provided on the peripheral portion of the upper surface of the base portion 11. Therefore, when the lid portion 12 is lowered, an O-ring 13 is interposed between the upper surface of the base portion 11 and the lower surface of the lid portion 12, and the internal space SP of the chamber 10 is in an airtight state. On the other hand, when the lid portion 12 is raised, the chamber 10 is opened, so that the substrate 9 can be carried into the chamber 10 and the substrate 9 can be carried out from the chamber 10.

基板保持部20是用於在腔室10的內部空間SP中保持基板9的機構。基板保持部20包含多個基板保持銷21,使各基板保持銷21的頭部抵接於基板9的下表面,由此以水平姿勢支撐基板9。多個基板保持銷21豎立設置於配置在腔室10的外部的一個支撐構件22上,分別貫通底座部11及基板加熱部30而突出設置於腔室10的內部空間SP。The substrate holding portion 20 is a mechanism for holding the substrate 9 in the internal space SP of the chamber 10. The substrate holding portion 20 includes a plurality of substrate holding pins 21, and the head portions of the respective substrate holding pins 21 abut against the lower surface of the substrate 9, thereby supporting the substrate 9 in a horizontal posture. The plurality of substrate holding pins 21 are erected on one of the support members 22 disposed outside the chamber 10, and are respectively protruded through the base portion 11 and the substrate heating portion 30 to be protruded from the internal space SP of the chamber 10.

在所述支撐構件22上,如圖1所示,連接有銷升降機構22a。因此,銷升降機構22a根據來自控制部60的升降命令而運行,由此支撐構件22及多個基板保持銷21作為一體而上下地升降移動。在減壓乾燥裝置1中,一邊將基板9保持於多個基板保持銷21上,一邊使銷升降機構22a運行,由此可調整基板9相對於基板加熱部30的高度位置。On the support member 22, as shown in Fig. 1, a pin lifting mechanism 22a is connected. Therefore, the pin lifting mechanism 22a operates in accordance with the lifting command from the control unit 60, whereby the support member 22 and the plurality of substrate holding pins 21 move up and down as a whole. In the vacuum drying apparatus 1, while the substrate 9 is held by the plurality of substrate holding pins 21, the pin lifting mechanism 22a is operated, whereby the height position of the substrate 9 with respect to the substrate heating portion 30 can be adjusted.

基板加熱部30配置於底座部11的上表面中央部。在所述基板加熱部30中,設置有多根成為加熱源的棒狀加熱器。並且,當將基板9搬入至多個基板保持銷21之前根據來自控制部60的加熱命令預先使棒狀加熱器運行時,在搬入基板9之前對內部空間SP進行加熱,並且對所搬入的基板9從其下表面側進行加熱。如上所述,在環境溫度經上升的內部空間SP內對基板9進行加熱而使溶劑成分從塗佈膜92氣化。The substrate heating unit 30 is disposed at a central portion of the upper surface of the base portion 11 . In the substrate heating unit 30, a plurality of rod heaters serving as heating sources are provided. When the rod heater is operated in advance based on the heating command from the control unit 60 before the substrate 9 is carried into the plurality of substrate holding pins 21, the internal space SP is heated before the substrate 9 is loaded, and the loaded substrate 9 is loaded. Heating is performed from the lower surface side thereof. As described above, the substrate 9 is heated in the internal space SP where the ambient temperature rises to vaporize the solvent component from the coating film 92.

並且,在本實施方式中,為了與加熱處理同時地實施減壓處理,設置有排氣部40。所述排氣部40包括:排氣配管41,用於從腔室10的內部空間SP抽吸排出包含溶劑成分的氣體(以下稱作“排出氣體”);蝶形閥(butterfly valve)42、蝶形閥43,用於對經由排氣配管41從腔室10排出的排出氣體的排氣量進行控制;開閉閥44;以及排氣泵45。在本實施方式中,在底座部11的周緣部設置有兩個排氣口111、112。並且,對應於如上所述設置有兩個排氣口,排氣配管41的一個端部分支成兩個,分支端部411、分支端部412分別與排氣口111、排氣口112連接。此外,在排氣口111、排氣口112的附近位置,蝶形閥42、蝶形閥43分別介插於分支端部411、分支端部412。另一方面,排氣配管41的另一端部經由開閉閥44及排氣泵45而與省略圖示的排氣線路連接。因此,當開閉閥44根據來自控制部60的開閉命令而打開,並且排氣泵45根據來自控制部60的動作命令而運行時,以與蝶形閥42、蝶形閥43的開度相對應的排氣量將排出氣體經由排氣配管41排出至排氣線路。Further, in the present embodiment, the exhaust unit 40 is provided in order to perform the pressure reduction process simultaneously with the heat treatment. The exhaust unit 40 includes an exhaust pipe 41 for sucking and discharging a gas containing a solvent component (hereinafter referred to as “exhaust gas”) from the internal space SP of the chamber 10; a butterfly valve 42; The butterfly valve 43 is for controlling the amount of exhaust gas discharged from the chamber 10 via the exhaust pipe 41; the opening and closing valve 44; and the exhaust pump 45. In the present embodiment, two exhaust ports 111 and 112 are provided in the peripheral portion of the base portion 11. Further, in correspondence with the provision of the two exhaust ports as described above, one end portion of the exhaust pipe 41 is branched, and the branch end portion 411 and the branch end portion 412 are connected to the exhaust port 111 and the exhaust port 112, respectively. Further, the butterfly valve 42 and the butterfly valve 43 are interposed between the branch end portion 411 and the branch end portion 412 at positions near the exhaust port 111 and the exhaust port 112, respectively. On the other hand, the other end portion of the exhaust pipe 41 is connected to an exhaust line (not shown) via the opening and closing valve 44 and the exhaust pump 45. Therefore, when the opening and closing valve 44 is opened in accordance with the opening and closing command from the control unit 60, and the exhaust pump 45 is operated in accordance with the operation command from the control unit 60, it corresponds to the opening degree of the butterfly valve 42 and the butterfly valve 43. The amount of exhaust gas discharges the exhaust gas to the exhaust line via the exhaust pipe 41.

在本實施方式中,在排氣配管41上設置有配管加熱部50。配管加熱部50是在排氣配管41的外周面上纏繞橡膠加熱器(rubber heater)作為配管加熱器51而成。配管加熱器51根據來自控制部60的加熱命令而發熱,由此對排氣配管41進行加熱。再者,作為配管加熱器51,除了所述橡膠加熱器以外,也可以使用帶式加熱器(ribbon heater)、電纜式加熱器(cable heater)、薄板式加熱器(sheet heater)等。In the present embodiment, the pipe heating portion 50 is provided in the exhaust pipe 41. In the pipe heating unit 50, a rubber heater is wound around the outer circumferential surface of the exhaust pipe 41 as the pipe heater 51. The pipe heater 51 generates heat based on a heating command from the control unit 60, thereby heating the exhaust pipe 41. Further, as the pipe heater 51, in addition to the rubber heater, a ribbon heater, a cable heater, a sheet heater, or the like may be used.

並且,為了高精度地調整排氣配管41,在本實施方式中,如圖2所示,設置有對排氣配管41的溫度進行檢測的配管溫度感測器41a,將與檢測到的溫度相關聯的檢測信號輸出至控制部60。然後,與減壓乾燥處理同時地,控制部60基於排氣配管41的溫度對配管加熱部50進行反饋控制而對排氣配管41的溫度進行調整,從而抑制排出氣體中所含的溶劑成分接觸至排氣配管41而產生液化。如上所述,在本實施方式中,控制部60是作為本發明的“配管溫度控制部”而發揮作用。以下,在說明如上所述而構成的減壓乾燥裝置1的動作之前,一邊參照圖3及圖4,一邊說明利用配管加熱部50對排氣配管41進行加熱而進行溫度調整的技術意義。Further, in order to adjust the exhaust pipe 41 with high precision, in the present embodiment, as shown in FIG. 2, a pipe temperature sensor 41a that detects the temperature of the exhaust pipe 41 is provided, which is related to the detected temperature. The detected detection signal is output to the control unit 60. Then, the control unit 60 performs feedback control of the piping heating unit 50 based on the temperature of the exhaust pipe 41, and adjusts the temperature of the exhaust pipe 41 to suppress the contact of the solvent components contained in the exhaust gas. Liquefaction occurs to the exhaust pipe 41. As described above, in the present embodiment, the control unit 60 functions as the "pipe temperature control unit" of the present invention. In the following, the technical significance of temperature adjustment by heating the exhaust pipe 41 by the pipe heating unit 50 will be described with reference to FIGS. 3 and 4 before the operation of the vacuum drying apparatus 1 configured as described above.

圖3是表示圖1所示的減壓乾燥裝置中的減壓特性的曲線圖,通過以下的實驗而求出減壓特性。在減壓乾燥處理的初始階段,溶劑成分從塗佈膜92急劇氣化,以與之相平衡的排氣量執行減壓動作。因此,腔室10內的壓力下降,伴隨著減壓乾燥處理的推進,所述壓力逐漸減少,塗佈膜92的減壓乾燥處理完成。因此,在本實驗中,除了將配管加熱器51設為接通(ON)/斷開(OFF)的條件以外全部同樣地設定,並且對三塊基板9連續地進行減壓乾燥處理,分別測量從固定值Ps(在所述實驗中為大氣壓(100000 Pa))到塗佈膜92的減壓乾燥處理完成為止的腔室10內的壓力的變化。所述圖3中的上段波形表示不使配管加熱器51運轉時(OFF時)的減壓特性,下段波形表示使配管加熱器51運轉時(ON時)的減壓特性。Fig. 3 is a graph showing the pressure reduction characteristics in the vacuum drying apparatus shown in Fig. 1, and the pressure reduction characteristics were obtained by the following experiment. In the initial stage of the vacuum drying treatment, the solvent component is rapidly vaporized from the coating film 92, and the pressure reduction operation is performed with the amount of exhaust gas balanced therewith. Therefore, the pressure in the chamber 10 is lowered, and the pressure is gradually reduced with the advancement of the reduced-pressure drying treatment, and the vacuum drying treatment of the coating film 92 is completed. Therefore, in the present experiment, all the conditions except the conditions in which the pipe heater 51 is turned "ON"/OFF (OFF) are set in the same manner, and the three substrates 9 are continuously subjected to a reduced-pressure drying process, and each measurement is performed. The change in pressure in the chamber 10 from the fixed value Ps (at atmospheric pressure (100000 Pa) in the experiment) to the completion of the vacuum drying treatment of the coating film 92 was completed. The upper waveform in FIG. 3 shows the decompression characteristics when the pipe heater 51 is not operated (OFF), and the lower waveform shows the decompression characteristics when the pipe heater 51 is operated (at the time of ON).

在減壓乾燥裝置1中,由於在腔室10內產生的包含溶劑成分的排出氣體經由排氣配管41從腔室10排出,所以隨著時間經過,腔室10內的壓力下降。在這裡,在圖3所示的減壓特性中存在三點應關注的方面。In the vacuum drying apparatus 1, since the exhaust gas containing the solvent component generated in the chamber 10 is discharged from the chamber 10 through the exhaust pipe 41, the pressure in the chamber 10 decreases as time passes. Here, there are three points that should be of interest in the decompression characteristics shown in FIG.

首先第1點是在壓力減少的初期,將配管加熱器51保持在OFF狀態的實例(case)(實質上相當於現有裝置,以下稱作“現有例”)的壓力下降率大於將配管加熱器51保持在ON狀態的實例(相當於本實施方式,以下稱作“實施例”)。本申請創作人分析其原因在於進行如下製程(process),即,排出氣體中所含的溶劑成分在排氣配管41內經急劇冷卻而液化,所述經液化的溶劑成分再次產生氣化而被排出。即,可考察出原因在於:在實施例中通過將配管加熱器51設為ON狀態,而使得在現有例中經液化而附著於排氣配管41內的部分在實施例中也維持著氣化狀態,因此與之相應地,應排出的量也增多。即,實施例的應排出的排出氣體的量多於現有例,因此可認為在壓力減少的初期,排氣速度變慢。如上所述壓力特性與排氣配管41的溫度密切相關。First, the first point is that in the initial stage of pressure reduction, the case where the pipe heater 51 is kept in the OFF state (substantially equivalent to the conventional device, hereinafter referred to as "conventional example") has a pressure drop rate higher than that of the pipe heater. An example in which the 51 is maintained in the ON state (corresponding to the present embodiment, hereinafter referred to as "the embodiment"). The creator of the present application analyzes the reason that the solvent component contained in the exhaust gas is liquefied by rapid cooling in the exhaust gas pipe 41, and the liquefied solvent component is again vaporized and discharged. . In other words, in the embodiment, the pipe heater 51 is turned on, and the portion that has been liquefied and adhered to the exhaust pipe 41 in the conventional example is also vaporized in the embodiment. The state, and accordingly, the amount that should be discharged is also increased. That is, in the embodiment, the amount of the exhaust gas to be discharged is larger than that of the conventional example, and therefore it is considered that the exhaust gas velocity is slow at the initial stage of the pressure decrease. The pressure characteristics as described above are closely related to the temperature of the exhaust pipe 41.

第2個關注點是如下方面:如上所述,雖然伴隨著排氣配管41的溫度上升,排氣速度下降,但是在現有例中壓力減少的中期以後,減壓速度下降,減壓乾燥處理完成之前的時間長於實施例。在這裡,關於現有例中的減壓速度下降的主要因素,本申請創作人分析如下。即,當觀察圖3的上段波形時,腔室10內的壓力在即將抵達至特定的壓力Pv之前大幅下降,僅經固定時間在所述壓力Pv下減壓速度大致變為零之後,壓力再次下降。本申請創作人分析其原因在於與上述同樣地進行如下製程:排出氣體中所含的溶劑成分在排氣配管41內經急劇冷卻而液化,所述經液化的溶劑成分再次產生氣化而被排出。並且,可分析出,通過對排氣配管41進行加熱,可以抑制溶劑成分在排氣配管41中液化,從而防止減壓速度的下降,所述分析結果與實驗結果相一致。即,通過對排氣配管41進行加熱,可以防止排出氣體中的溶劑成分在排氣配管41中液化而縮短減壓乾燥處理所需要的時間,即所謂的節拍時間。The second point of interest is that, as described above, the exhaust gas velocity decreases as the temperature of the exhaust pipe 41 rises. However, in the conventional example, the pressure reduction speed decreases after the middle of the pressure decrease, and the vacuum drying process is completed. The previous time is longer than the embodiment. Here, regarding the main factor of the decrease in the decompression speed in the prior art, the creator of the present application analyzes as follows. That is, when observing the waveform of the upper stage of Fig. 3, the pressure in the chamber 10 drops sharply just before reaching a certain pressure Pv, and only after a fixed time at the pressure Pv, the decompression speed becomes substantially zero, and the pressure is again decline. The creator of the present application analyzes the reason that the solvent component contained in the exhaust gas is rapidly cooled and liquefied in the exhaust pipe 41 in the same manner as described above, and the liquefied solvent component is again vaporized and discharged. Further, it can be analyzed that by heating the exhaust pipe 41, it is possible to suppress liquefaction of the solvent component in the exhaust pipe 41, thereby preventing a decrease in the decompression speed, and the analysis results are in agreement with the experimental results. In other words, by heating the exhaust pipe 41, it is possible to prevent the solvent component in the exhaust gas from being liquefied in the exhaust pipe 41, thereby shortening the time required for the vacuum drying process, that is, the so-called tact time.

進而,第3關注點是減壓乾燥處理的穩定性。如所述圖3所示,在現有例中每當減壓乾燥處理時減壓乾燥的結束時序Toff不同。即,節拍時間發生變動。關於其理由,可分析如下。如上所述在排氣配管41內一度經液化的溶劑再次氣化,因此可認為如果所述經再次氣化的部分也全部被排出,那麼在第1塊、第2塊、第3塊中結束時序Toff便不會產生差。但是,當使配管加熱器51維持在OFF狀態時,在壓力變為壓力Pv的時點,有時大量經氣化的溶劑會再次液化而附著於排氣配管41上,由此減壓速度變得緩慢。並且,壓力下降至低於壓力Pv也可以認為經再次液化的溶劑被完全氣化,但是在壓力下降至低於壓力Pv的期間,也繼續進行乾燥處理,從而也繼續產生再次液化附著。其結果可認為,每當塊數增加時附著量增加,與其相應地,結束時序Toff不斷產生偏差。與此相對,在實施例中結束時序Ton大致相同,即節拍時間大致為固定。可認為其原因在於,配管加熱器51成為ON狀態,在經加熱的排氣配管41內不會產生液化。事實上,在實施例中只要觀察圖3的下段波形便知,未看見溶劑成分的液化,節拍時間穩定。如上所述,排氣配管41的加熱對減壓乾燥處理的穩定化也大有幫助。Further, the third concern is the stability of the vacuum drying treatment. As shown in FIG. 3, in the conventional example, the end timing Toff of the reduced-pressure drying is different each time the vacuum drying treatment is performed. That is, the tact time changes. The reason for this can be analyzed as follows. As described above, the solvent that has once been liquefied in the exhaust pipe 41 is vaporized again. Therefore, it is considered that if the partially vaporized portion is also discharged, it is ended in the first block, the second block, and the third block. The timing Toff does not produce a difference. However, when the pipe heater 51 is maintained in the OFF state, when the pressure is changed to the pressure Pv, a large amount of the vaporized solvent may be liquefied again and adhered to the exhaust pipe 41, whereby the decompression speed becomes slow. Further, when the pressure is lowered below the pressure Pv, it is considered that the solvent which is reliquefied is completely vaporized, but the drying process is continued while the pressure is lowered below the pressure Pv, so that re-liquefaction adhesion continues to occur. As a result, it is considered that the amount of adhesion increases each time the number of blocks increases, and accordingly, the end timing Toff constantly deviates. On the other hand, in the embodiment, the end timing Ton is substantially the same, that is, the tact time is substantially constant. This is considered to be because the pipe heater 51 is in an ON state, and liquefaction does not occur in the heated exhaust pipe 41. In fact, in the examples, as long as the lower waveform of Fig. 3 was observed, the liquefaction of the solvent component was not observed, and the tact time was stable. As described above, the heating of the exhaust pipe 41 is also helpful for stabilizing the vacuum drying process.

根據所述三個關注點及分析結果,本申請創作人得出如下結論:在減壓乾燥處理中對排氣配管41進行加熱這一情況在實現節拍時間的縮短及減壓乾燥處理的穩定化方面發揮著重要的作用。再者,從防止溶劑成分在排氣配管41中液化的角度而言,理想的是將排氣配管41調整為高於排出氣體的露點溫度的溫度。在這裡,所謂“露點溫度(或者有時也簡稱作“露點”)”,是指將排出氣體的溫度設為所述露點溫度以下時溶劑成分容易產生液化,通過使配管溫度維持在露點溫度以上,可以防止排出氣體中所含的溶劑成分的液化。並且,如果排氣配管41的加熱溫度過高,那麼在排氣配管41內排出氣體會產生膨脹而導致排氣速度下降,因此排氣配管41的溫度理想的是設定為低於腔室10的內部空間SP。Based on the three points of interest and the analysis results, the creator of the present application has reached a conclusion that the heating of the exhaust pipe 41 in the vacuum drying process achieves a shortening of the tact time and stabilization of the decompression drying process. The aspect plays an important role. Further, from the viewpoint of preventing the solvent component from being liquefied in the exhaust pipe 41, it is preferable to adjust the exhaust pipe 41 to a temperature higher than the dew point temperature of the exhaust gas. Here, the "dew point temperature (or simply referred to as "dew point") means that the solvent component is easily liquefied when the temperature of the exhaust gas is equal to or lower than the dew point temperature, and the temperature of the pipe is maintained above the dew point temperature. It is possible to prevent liquefaction of the solvent component contained in the exhaust gas. When the heating temperature of the exhaust pipe 41 is too high, the exhaust gas in the exhaust pipe 41 expands and the exhaust speed decreases. Therefore, the temperature of the exhaust pipe 41 is desirably set lower than that of the chamber 10. Internal space SP.

在這裡,在圖1所示的減壓乾燥裝置1中難以直接檢測露點溫度,因此在本實施方式中基於所述壓力Pv(認為產生液化時的腔室10內的壓力)及圖4所示的溶劑的蒸氣壓曲線來設定排氣配管41的溫度。即,基於蒸氣壓曲線求出與所述壓力Pv相對應的溫度TPv,控制部60對配管加熱器51進行驅動而在所述溫度TPv的±20[℃]的範圍內對排氣配管41進行加熱。具體而言,將減壓乾燥處理中的排氣配管41的溫度作為目標配管溫度而預先記憶於控制部60中,控制部60按照減壓乾燥處理用的程式對減壓乾燥裝置1的各部進行控制,由此執行以下的動作。Here, in the vacuum drying apparatus 1 shown in FIG. 1, it is difficult to directly detect the dew point temperature. Therefore, in the present embodiment, the pressure Pv (the pressure in the chamber 10 at the time of liquefaction is considered to be generated) and FIG. 4 are shown in FIG. The vapor pressure curve of the solvent sets the temperature of the exhaust pipe 41. In other words, the temperature TPv corresponding to the pressure Pv is obtained based on the vapor pressure curve, and the control unit 60 drives the pipe heater 51 to perform the exhaust pipe 41 within a range of ±20 [° C.] of the temperature TPv. heating. Specifically, the temperature of the exhaust pipe 41 in the vacuum drying process is previously stored in the control unit 60 as the target pipe temperature, and the control unit 60 performs the various parts of the vacuum drying apparatus 1 in accordance with the program for the vacuum drying process. Control, thereby performing the following actions.

圖5是表示圖1所示的減壓乾燥裝置的動作的流程圖。當利用所述減壓乾燥裝置1對基板9進行處理時,基板加熱部30預先接收來自控制部60的加熱命令來使棒狀加熱器運轉而使內部空間SP內的環境溫度上升(步驟S1:加熱準備步驟)。並且,對排氣配管41的加熱處理也預先開始(步驟S2:配管加熱步驟),即,配管加熱部50預先接收來自控制部60的加熱命令來使配管加熱器51運轉而從排氣配管41的外周面側進行加熱,使排氣配管41的溫度上升。在這裡,控制部60對由配管溫度感測器41a所檢測的排氣配管41的溫度進行監控,基於所述溫度進行反饋控制以使排氣配管41達到目標配管溫度。由此,使減壓乾燥處理中的排氣配管41的溫度維持在目標配管溫度。 如上所述執行步驟S1、步驟S2之後,將在上表面91塗佈有塗佈膜92的基板9搬入至腔室10內,並收納於內部空間SP(步驟S3:搬入步驟)。具體而言,通過腔室升降機構12a使腔室10的蓋部12上升。然後,通過省略圖示的搬運機器人將基板9搬入至腔室10的內部,並載置於多個基板保持銷21上。當基板9的搬入完成時,搬運機器人退避至腔室10的外部,通過腔室升降機構12a而使腔室10的蓋部12下降。由此內部空間SP成為密閉空間。Fig. 5 is a flow chart showing the operation of the vacuum drying apparatus shown in Fig. 1 . When the substrate 9 is processed by the vacuum drying apparatus 1, the substrate heating unit 30 receives a heating command from the control unit 60 in advance to operate the rod heater to increase the ambient temperature in the internal space SP (step S1: Heating preparation step). In addition, the heating process of the exhaust pipe 41 is started in advance (step S2: pipe heating step), that is, the pipe heating unit 50 receives the heating command from the control unit 60 in advance to operate the pipe heater 51 from the exhaust pipe 41. The outer peripheral surface side is heated to raise the temperature of the exhaust pipe 41. Here, the control unit 60 monitors the temperature of the exhaust pipe 41 detected by the pipe temperature sensor 41a, and performs feedback control based on the temperature to bring the exhaust pipe 41 to the target pipe temperature. Thereby, the temperature of the exhaust pipe 41 in the vacuum drying process is maintained at the target pipe temperature. After the steps S1 and S2 are performed as described above, the substrate 9 coated with the coating film 92 on the upper surface 91 is carried into the chamber 10 and stored in the internal space SP (step S3: carrying in step). Specifically, the lid portion 12 of the chamber 10 is raised by the chamber elevating mechanism 12a. Then, the substrate 9 is carried into the inside of the chamber 10 by a transfer robot (not shown), and placed on the plurality of substrate holding pins 21. When the loading of the substrate 9 is completed, the transfer robot retreats to the outside of the chamber 10, and the lid portion 12 of the chamber 10 is lowered by the chamber elevating mechanism 12a. Thereby, the internal space SP becomes a sealed space.

在下一個步驟S4中,開閉閥44打開,並且蝶形閥42、蝶形閥43打開至規定的開度為止。並且,排氣泵45運行,將腔室10的內部的氣體經由排氣口111、排氣口112加以強制排出。由此,內部空間SP內的環境氣體經由排氣口111、排氣口112,蝶形閥42、蝶形閥43,排氣配管41及開閉閥44排出至排氣線路,從而對腔室10的內部空間SP進行減壓。對應於所述內部空間SP的減壓,塗佈於基板9的表面上的塗佈膜92中所含的溶劑成分產生氣化。由此,開始對基板9上的塗佈膜92進行減壓處理。In the next step S4, the opening and closing valve 44 is opened, and the butterfly valve 42 and the butterfly valve 43 are opened to a predetermined opening degree. Further, the exhaust pump 45 is operated to forcibly discharge the gas inside the chamber 10 through the exhaust port 111 and the exhaust port 112. Thereby, the ambient gas in the internal space SP is discharged to the exhaust line via the exhaust port 111, the exhaust port 112, the butterfly valve 42, the butterfly valve 43, the exhaust pipe 41, and the opening and closing valve 44, thereby the chamber 10 The internal space SP is decompressed. The solvent component contained in the coating film 92 applied to the surface of the substrate 9 is vaporized in accordance with the pressure reduction of the internal space SP. Thereby, the pressure reduction treatment of the coating film 92 on the substrate 9 is started.

在所述減壓處理時,通過步驟S1,棒狀加熱器已在運轉,因此也開始對基板9進行加熱處理(步驟S4)。即,在環境溫度上升的內部空間SP內利用棒狀加熱器對基板9從其下表面側進行加熱。通過所述加熱處理,使基板9上的塗佈膜92中所含的溶劑成分升溫,而進一步促進溶劑成分的氣化。如上所述,減壓乾燥裝置1通過執行併用內部空間SP的減壓及加熱的減壓乾燥處理,而使塗佈膜92的乾燥效率提高(乾燥步驟)。At the time of the pressure reduction treatment, since the rod heater is already operating in step S1, the substrate 9 is also subjected to heat treatment (step S4). That is, the substrate 9 is heated from the lower surface side by the rod heater in the internal space SP where the ambient temperature rises. By the heat treatment, the solvent component contained in the coating film 92 on the substrate 9 is heated to further promote vaporization of the solvent component. As described above, the vacuum drying apparatus 1 improves the drying efficiency of the coating film 92 by performing the pressure reduction and the drying under reduced pressure in the internal space SP (drying step).

如上所述一邊將排氣配管41加熱至目標配管溫度一邊同時進行減壓處理及乾燥處理,當塗佈膜92的乾燥完成時,使排氣泵45停止,並且打開未圖示的開閥(open valve),由此使腔室10的內部空間SP恢復至大氣壓為止。然後,腔室升降機構12a使腔室10的蓋部12上升,搬運機器人的手(hand)進入至腔室10的內部來接收基板保持銷21上的基板9而搬出至腔室10的外部(步驟S5:搬出步驟)。通過以上所述,對一塊基板9的減壓乾燥處理結束。再者,繼續執行基板加熱部30對內部空間SP的加熱及配管加熱部50對排氣配管41的加熱。When the exhaust pipe 41 is heated to the target pipe temperature, the pressure reduction process and the drying process are simultaneously performed, and when the drying of the coating film 92 is completed, the exhaust pump 45 is stopped, and the valve opening (not shown) is opened ( The open valve) thereby restores the internal space SP of the chamber 10 to atmospheric pressure. Then, the chamber elevating mechanism 12a raises the lid portion 12 of the chamber 10, and the hand of the transfer robot enters the inside of the chamber 10 to receive the substrate 9 on the substrate holding pin 21 and carry it out to the outside of the chamber 10 ( Step S5: Carry out the step). By the above, the vacuum drying treatment of one of the substrates 9 is completed. In addition, heating of the internal space SP by the substrate heating unit 30 and heating of the exhaust pipe 41 by the pipe heating unit 50 are continued.

如以上所述,在所述減壓乾燥裝置1中,一邊對排氣配管41進行加熱,一邊進行減壓乾燥處理,因此可以防止在減壓乾燥處理中排出氣體中所含的溶劑成分液化而附著於排氣配管41。其結果為,可以在短時間內利用減壓乾燥裝置1進行減壓乾燥處理。並且,每當進行減壓乾燥處理時,可以抑制殘留於排氣配管41上的溶劑成分而穩定地進行減壓乾燥處理。特別是即使在連續處理多個基板9的情況下,也可以使各基板9以固定的節拍時間進行減壓乾燥。As described above, in the vacuum drying apparatus 1 , while the exhaust pipe 41 is heated, the vacuum drying process is performed, so that the solvent component contained in the exhaust gas in the vacuum drying process can be prevented from being liquefied. Adhered to the exhaust pipe 41. As a result, the reduced-pressure drying process can be performed by the vacuum drying apparatus 1 in a short time. Further, each time the vacuum drying treatment is performed, the solvent component remaining on the exhaust pipe 41 can be suppressed, and the reduced-pressure drying treatment can be stably performed. In particular, even when a plurality of substrates 9 are continuously processed, each of the substrates 9 can be dried under reduced pressure at a fixed tact time.

再者,本發明並不限定於所述實施方式,只要不脫離其主旨除所述情況以外,便可進行各種變更。例如,在所述實施方式中,是在減壓乾燥處理中對排氣配管41整體進行均勻加熱而調整為目標配管溫度,但是也可以構成為使配管溫度不同。其原因在於當排氣配管41延長時,在排氣配管41中的與腔室10接近的區域及與腔室10遠離的區域內通過各區域的排出氣體的溫度不同。即,越遠離腔室10,排氣配管41內的排出氣體的溫度越低,越容易產生液化現象。因此,優選的是以越遠離腔室10,排氣配管41的溫度越高的方式進行加熱。It is to be noted that the present invention is not limited to the embodiments described above, and various modifications can be made without departing from the spirit and scope of the invention. For example, in the above-described embodiment, the entire exhaust pipe 41 is uniformly heated in the reduced-pressure drying process to be adjusted to the target pipe temperature. However, the pipe temperature may be different. This is because when the exhaust pipe 41 is extended, the temperature of the exhaust gas passing through each region in the region close to the chamber 10 and the region away from the chamber 10 in the exhaust pipe 41 are different. That is, the further away from the chamber 10, the lower the temperature of the exhaust gas in the exhaust pipe 41, and the more likely the liquefaction phenomenon occurs. Therefore, it is preferable to perform heating so that the temperature of the exhaust pipe 41 is higher as it goes away from the chamber 10.

並且,在所述實施方式中,是將本發明應用於使在基板9的上表面91上塗佈聚醯胺酸溶液而形成的塗佈膜92減壓乾燥的減壓乾燥裝置1,但是本發明的應用範圍並不限定於此,也可以應用於使包含抗蝕液、層間絕緣材料、低介電質材料、強介電質材料、配線材料、有機金屬材料、金屬糊劑等的塗佈膜減壓乾燥的裝置。並且,也可以將本發明應用於使形成於基板9的下表面或基板9的兩面上的塗佈膜減壓乾燥的減壓乾燥裝置。Further, in the above-described embodiment, the present invention is applied to a vacuum drying apparatus 1 for drying a coating film 92 formed by coating a polyamic acid solution on the upper surface 91 of the substrate 9, and drying it under reduced pressure. The scope of application of the invention is not limited thereto, and may be applied to coating including a resist liquid, an interlayer insulating material, a low dielectric material, a ferroelectric material, a wiring material, an organic metal material, a metal paste, or the like. A device for drying a membrane under reduced pressure. Further, the present invention can also be applied to a vacuum drying apparatus which reduces the coating film formed on the lower surface of the substrate 9 or both surfaces of the substrate 9 under reduced pressure.

如以上例示具體的實施方式所說明般,本發明也可以構成為例如通過配管溫度控制部,將排氣配管的溫度調整為高於經由排氣配管而排出的包含溶劑成分的排出氣體的露點溫度的溫度。即,為了抑制針對排氣配管的溶劑成分的液化,優選的是採用如上所述的構成。As described above, as described in the specific embodiment, the present invention may be configured such that the temperature of the exhaust pipe is adjusted to be higher than the dew point temperature of the exhaust gas containing the solvent component discharged through the exhaust pipe by the pipe temperature control unit. temperature. That is, in order to suppress liquefaction of the solvent component of the exhaust pipe, it is preferable to adopt the configuration as described above.

並且,如果設為通過配管溫度控制部而將排氣配管的溫度調整為低於內部空間的溫度,可以防止排氣速度下降,從而優選。In addition, it is preferable to adjust the temperature of the exhaust pipe to a temperature lower than the internal space by the piping temperature control unit, thereby preventing the exhaust speed from decreasing.

此外,配管加熱部理想的是構成為以越遠離腔室,排氣配管的溫度越高的方式進行加熱,由此即使在排氣配管延長的情況下,也可以有效地防止溶劑成分的液化,從而優選。 [工業上的可利用性]In addition, it is preferable that the heating portion of the pipe is configured to be heated so that the temperature of the exhaust pipe is higher as it is farther away from the chamber, whereby the liquefaction of the solvent component can be effectively prevented even when the exhaust pipe is extended. It is thus preferred. [Industrial availability]

本發明可應用於通過併用減壓處理及加熱處理來使形成於基板上的塗佈膜乾燥的所有減壓乾燥技術。The present invention can be applied to all vacuum drying techniques for drying a coating film formed on a substrate by using a reduced pressure treatment and a heat treatment in combination.

1‧‧‧減壓乾燥裝置
9‧‧‧基板
10‧‧‧腔室
11‧‧‧底座部
12‧‧‧蓋部
12a‧‧‧腔室升降機構
13‧‧‧O形環
20‧‧‧基板保持部
21‧‧‧基板保持銷
22‧‧‧支撐構件
22a‧‧‧銷升降機構
30‧‧‧基板加熱部
40‧‧‧排氣部
41‧‧‧排氣配管
41a‧‧‧配管溫度感測器
42、43‧‧‧蝶形閥
44‧‧‧開閉閥
45‧‧‧排氣泵
50‧‧‧配管加熱部
51‧‧‧配管加熱器
60‧‧‧控制部(配管溫度控制部)
91‧‧‧(基板的)上表面
92‧‧‧塗佈膜
111、112‧‧‧排氣口
411、412‧‧‧分支端部
S1~S5‧‧‧步驟
SP‧‧‧(腔室的)內部空間
1‧‧‧Decompression drying device
9‧‧‧Substrate
10‧‧‧ chamber
11‧‧‧Base section
12‧‧‧ 盖部
12a‧‧‧Case lift mechanism
13‧‧‧O-ring
20‧‧‧Substrate retention department
21‧‧‧Substrate retention pin
22‧‧‧Support members
22a‧‧‧ Pin lifting mechanism
30‧‧‧Substrate heating department
40‧‧‧Exhaust Department
41‧‧‧Exhaust piping
41a‧‧‧Pipe temperature sensor
42, 43‧‧‧ butterfly valve
44‧‧‧Opening valve
45‧‧‧Exhaust pump
50‧‧‧Pipe heating department
51‧‧‧Pipe heater
60‧‧‧Control Department (Pipe Temperature Control Department)
Upper surface of 91‧‧‧ (substrate)
92‧‧‧Coating film
111, 112‧‧ vents
411, 412‧‧‧ branch end
S1 ~ S5‧‧‧ steps
SP‧‧‧(room) interior space

圖1是表示本發明的減壓乾燥裝置的一實施方式的構成的縱剖面圖。圖2是表示圖1所示的減壓乾燥裝置的構成的方塊圖。圖3是表示圖1所示的減壓乾燥裝置中的減壓特性的曲線圖。圖4是表示溶劑的蒸氣壓曲線的一例的曲線圖。 圖5是表示圖1所示的減壓乾燥裝置的動作的流程圖。Fig. 1 is a longitudinal cross-sectional view showing a configuration of an embodiment of a reduced-pressure drying apparatus according to the present invention. Fig. 2 is a block diagram showing the configuration of the reduced-pressure drying apparatus shown in Fig. 1; Fig. 3 is a graph showing the pressure reduction characteristics in the vacuum drying apparatus shown in Fig. 1; 4 is a graph showing an example of a vapor pressure curve of a solvent. Fig. 5 is a flow chart showing the operation of the vacuum drying apparatus shown in Fig. 1 .

1‧‧‧減壓乾燥裝置 1‧‧‧Decompression drying device

9‧‧‧基板 9‧‧‧Substrate

10‧‧‧腔室 10‧‧‧ chamber

11‧‧‧底座部 11‧‧‧Base section

12‧‧‧蓋部 12‧‧‧ 盖部

12a‧‧‧腔室升降機構 12a‧‧‧Case lift mechanism

13‧‧‧O形環 13‧‧‧O-ring

20‧‧‧基板保持部 20‧‧‧Substrate retention department

21‧‧‧基板保持銷 21‧‧‧Substrate retention pin

22‧‧‧支撐構件 22‧‧‧Support members

22a‧‧‧銷升降機構 22a‧‧‧ Pin lifting mechanism

30‧‧‧基板加熱部 30‧‧‧Substrate heating department

40‧‧‧排氣部 40‧‧‧Exhaust Department

41‧‧‧排氣配管 41‧‧‧Exhaust piping

42、43‧‧‧蝶形閥 42, 43‧‧‧ butterfly valve

44‧‧‧開閉閥 44‧‧‧Opening valve

45‧‧‧排氣泵 45‧‧‧Exhaust pump

50‧‧‧配管加熱部 50‧‧‧Pipe heating department

51‧‧‧配管加熱器 51‧‧‧Pipe heater

91‧‧‧(基板的)上表面 Upper surface of 91‧‧‧ (substrate)

92‧‧‧塗佈膜 92‧‧‧Coating film

111、112‧‧‧排氣口 111, 112‧‧ vents

411、412‧‧‧分支端部 411, 412‧‧‧ branch end

SP‧‧‧(腔室的)內部空間 SP‧‧‧(room) interior space

Claims (6)

一種減壓乾燥裝置,一邊將基板收納於腔室的內部空間,一邊通過經由與所述腔室連接的排氣配管來排出所述內部空間的環境氣體而對所述內部空間進行減壓並且對所述內部空間進行加熱,由此使所述基板上的塗佈膜中所含的溶劑成分氣化而使所述塗佈膜乾燥,所述減壓乾燥裝置的特徵在於包括: 配管加熱部,對所述排氣配管進行加熱。A vacuum drying apparatus that decompresses an internal space by discharging an environmental gas in the internal space through an exhaust pipe connected to the chamber while accommodating the substrate in an internal space of the chamber The internal space is heated to vaporize a solvent component contained in the coating film on the substrate to dry the coating film, and the vacuum drying apparatus is characterized by comprising: a piping heating portion, The exhaust pipe is heated. 如申請專利範圍第1項所述的減壓乾燥裝置,其更包括: 配管溫度控制部,通過對所述配管加熱部進行控制而對所述排氣配管的溫度進行調整。The vacuum drying apparatus according to claim 1, further comprising: a piping temperature control unit that adjusts a temperature of the exhaust pipe by controlling the pipe heating unit. 如申請專利範圍第2項所述的減壓乾燥裝置,其中, 所述配管溫度控制部將所述排氣配管的溫度調整為高於經由所述排氣配管排出的包含所述溶劑成分的排出氣體的露點溫度的溫度。The decompression drying apparatus according to the second aspect of the invention, wherein the piping temperature control unit adjusts a temperature of the exhaust pipe to be higher than a discharge including the solvent component discharged through the exhaust pipe. The temperature of the dew point temperature of the gas. 如申請專利範圍第2項所述的減壓乾燥裝置,其中, 所述配管溫度控制部將所述排氣配管的溫度調整為低於所述內部空間的溫度。The reduced-pressure drying apparatus according to the second aspect of the invention, wherein the piping temperature control unit adjusts a temperature of the exhaust pipe to be lower than a temperature of the internal space. 如申請專利範圍第1項至第4項中任一項所述的減壓乾燥裝置,其中, 所述配管加熱部是以越遠離所述腔室而所述排氣配管的溫度越高的方式進行加熱。The vacuum drying apparatus according to any one of the first to fourth aspect, wherein the pipe heating unit is a method in which a temperature of the exhaust pipe is higher as it is farther from the chamber Heat up. 一種減壓乾燥方法,其特徵在於包括: 收納步驟,將形成有塗佈膜的基板收納於腔室的內部空間;乾燥步驟,經由與所述腔室連接的排氣配管來排出所述內部空間的環境氣體而對所述內部空間進行減壓並且對所述內部空間進行加熱,由此使所述基板上的塗佈膜中所含的溶劑成分氣化而使所述塗佈膜乾燥;以及配管加熱步驟,與所述乾燥步驟同時進行而對所述排氣配管進行加熱。A method of drying under reduced pressure, comprising: a housing step of accommodating a substrate on which a coating film is formed in an internal space of a chamber; and a drying step of discharging the internal space via an exhaust pipe connected to the chamber The internal space is depressurized by the ambient gas, and the internal space is heated, thereby vaporizing the solvent component contained in the coating film on the substrate to dry the coating film; The piping heating step is performed simultaneously with the drying step to heat the exhaust pipe.
TW105118471A 2015-09-11 2016-06-14 Vacuum drying device and vacuum drying method TWI613410B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015179832A JP6560072B2 (en) 2015-09-11 2015-09-11 Vacuum drying apparatus and vacuum drying method

Publications (2)

Publication Number Publication Date
TW201710634A true TW201710634A (en) 2017-03-16
TWI613410B TWI613410B (en) 2018-02-01

Family

ID=58320616

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105118471A TWI613410B (en) 2015-09-11 2016-06-14 Vacuum drying device and vacuum drying method

Country Status (3)

Country Link
JP (1) JP6560072B2 (en)
CN (1) CN106513273B (en)
TW (1) TWI613410B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7018713B2 (en) * 2017-03-29 2022-02-14 東京応化工業株式会社 Substrate heating device, substrate processing system and substrate heating method
KR102226624B1 (en) * 2018-03-30 2021-03-12 시바우라 메카트로닉스 가부시끼가이샤 Apparatus for forming organic film and method for producing organic film
JP7381526B2 (en) * 2021-08-20 2023-11-15 株式会社Screenホールディングス Vacuum drying equipment, vacuum drying method and program

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08298234A (en) * 1995-04-25 1996-11-12 Tokyo Electron Ltd Vacuum treatment device and its operating method
JPH09152154A (en) * 1995-11-30 1997-06-10 Hitachi Ltd Exhaust method and device and semiconductor device formed based on the device
JP2001225326A (en) * 2000-02-17 2001-08-21 Kawata Mfg Co Ltd Drying device and drying method
US7255899B2 (en) * 2001-11-12 2007-08-14 Dainippon Screen Mfg. Co., Ltd. Heat treatment apparatus and heat treatment method of substrate
JP3990927B2 (en) * 2002-03-11 2007-10-17 東京エレクトロン株式会社 Vacuum drying apparatus and method
JP2007245125A (en) * 2006-03-20 2007-09-27 Seiko Epson Corp Functional droplet applying apparatus, functional film forming method and display device, and electronic equipment
JP5089288B2 (en) * 2007-01-26 2012-12-05 大日本スクリーン製造株式会社 Vacuum dryer
JP5144299B2 (en) * 2008-02-12 2013-02-13 光洋サーモシステム株式会社 Vacuum dryer
JP5371605B2 (en) * 2008-09-25 2013-12-18 東京エレクトロン株式会社 Vacuum drying apparatus and vacuum drying method
JP5337099B2 (en) * 2010-05-17 2013-11-06 アクトファイブ株式会社 Vacuum drying equipment
CN103578928A (en) * 2013-10-21 2014-02-12 上海和辉光电有限公司 Substrate drying method, substrate manufacturing method, and low-temperature heating drying device thereof
CN204620350U (en) * 2015-03-03 2015-09-09 昆山龙腾光电有限公司 Dry drying device is carried out to substrate

Also Published As

Publication number Publication date
JP2017053607A (en) 2017-03-16
TWI613410B (en) 2018-02-01
JP6560072B2 (en) 2019-08-14
CN106513273A (en) 2017-03-22
CN106513273B (en) 2020-03-13

Similar Documents

Publication Publication Date Title
TWI571948B (en) Substrate freeze dry apparatus and method
JP5089288B2 (en) Vacuum dryer
US20080223825A1 (en) Substrate processing apparatus, substrate processing method and storage medium
US20080223399A1 (en) Substrate processing apparatus, substrate processing method and storage medium
KR101867194B1 (en) Etching device, etching method, and substrate-mounting mechanism
US20080223400A1 (en) Substrate processing apparatus, substrate processing method and storage medium
TW201710634A (en) Decompression drying device and decompression drying method capable of providing a stable decompression drying process for simultaneously performing decompression and heating in a short period of time
WO2016151684A1 (en) Method for manufacturing semiconductor device, recording medium and substrate processing apparatus
US20190003047A1 (en) Vaporizer and Substrate Processing Apparatus
US20120031266A1 (en) Exhausting method and gas processing apparatus
JP5203986B2 (en) Focus ring heating method, plasma etching method, plasma etching apparatus and computer storage medium
TW201200830A (en) Decompression drying method and decompression drying apparatus
JP2017166802A (en) Decompression drying method and decompression drying device
TWI785168B (en) Substrate processing method
TWI682481B (en) Vacuum drying device, substrate processing device and vacuum drying method
JP2010225847A (en) Vacuum processing apparatus, pressure reduction processing method, and substrate processing method
KR20150097397A (en) Method for forming transparent conductive film, and device for heating and drying thin-film
JP2006324559A (en) Substrate dryer and substrate drying method
JP2004079682A (en) Substrate processing apparatus
WO2017135018A1 (en) Reduced-pressure drying device and reduced-pressure drying method
JP7381526B2 (en) Vacuum drying equipment, vacuum drying method and program
US20240055277A1 (en) Substrate processing apparatus and substrate processing method
JP2023124794A (en) Substrate processing apparatus, substrate processing method, and method for producing article
KR102653253B1 (en) Substrate processing method and substrate processing apparatus
JP2024057845A (en) Reduced pressure drying apparatus and reduced pressure drying method