TW201634179A - Processing jig and method for producing sputtering target material - Google Patents

Abstract

A question of this invention is to suppress the generation of damages or cracks on the circumference surface of tube-like ceramics. To solve the question, an embodiment of processing jig (31, 131) contains a rotation body (34, 134). The rotation body (34, 134) is rotated to follow the rotation of a tube-like ceramics (10). The length of the rotation body (34, 134) in a rotation axis direction is 15mm or more, and the material of at least a circumference surface (39, 139) of the rotation body (34, 134) is a resin with a Rockwell hardness of 80 or more and 125 or less, or a rubber with a rubber hardness of 80 or more and 95 or less.

Description

Processing aid and method for manufacturing sputtering target

The disclosed embodiments relate to a processing aid and a method of manufacturing a sputtering target.

Conventionally, it has been known that a magnetic field generating device is disposed inside a cylindrical target, and the target is cooled from the inside, and sputtering is performed while rotating, thereby forming a thin film sputtering on the substrate. Device.

The cylindrical target is produced, for example, by grinding a cylindrical ceramic as a sintered body. Specifically, for example, while rotating the cylindrical ceramic, the inner peripheral surface or the outer peripheral surface is polished with a grindstone, and the inner diameter or the outer diameter is adjusted to produce a cylindrical target.

In the above prior art, for example, when the inner peripheral surface of the cylindrical ceramic is polished, one end side of the cylindrical ceramic is rotated by the rotation mechanism. On the other hand, the other end side of the cylindrical ceramic is rotatably held by the processing aid, thereby suppressing the vibration of the cylindrical ceramic generated by the rotation, thereby improving the grinding precision (for example, refer to the patent document) 1).

Prior technical literature Patent literature

Patent Document 1: Japanese Laid-Open Patent Publication No. 2014-148026

However, in the above-mentioned processing aid, there is still room for further improvement from the viewpoint of suppressing the occurrence of damage or cracking of the cylindrical ceramic.

That is, since the cylindrical ceramic is a material having a relatively low mechanical strength and is brittle, when the outer peripheral surface is held by the processing aid as described above, a contact with the processing aid causes a deeper outer peripheral surface. Suspicion of damage or rupture.

The cylindrical ceramic which is damaged or broken in this manner cannot be used as a sputtering target, and thus there is a problem that the yield of the cylindrical ceramic for sputtering target is lowered.

The same is true in view of the above circumstances, and an object of the invention is to provide a processing aid and a method of manufacturing a sputtering target which can suppress the occurrence of damage or cracking of a cylindrical ceramic.

The processing aid of the embodiment has a rotating body that rotates in accordance with the rotation of the cylindrical ceramic. Further, the length of the rotating body in the direction of the rotation axis is 15 mm or more, and the material of at least the outer peripheral portion of the rotating body is a resin having a Rockwell Hardness of 80 or more and 125 or less, or a rubber hardness of 80 or more and 95 or less. rubber.

According to the embodiment, the occurrence of damage or cracking of the cylindrical ceramic can be suppressed.

1‧‧‧Processing device

10‧‧‧Cylindrical ceramics

10a‧‧‧ inner circumference

10b‧‧‧ outer perimeter

10c‧‧‧ one end

10d‧‧‧The other end

11‧‧‧ Hollow

20‧‧‧Rotating mechanism

21‧‧‧ Body Department

22‧‧‧Rotating Department

23‧‧‧ Keep hook

30‧‧‧Vibration suppression mechanism

31, 131‧‧‧ processing aids

34, 34a, 34b, 134‧‧ ‧ rolls

35‧‧‧Support

36, 136‧‧‧ core material

37, 137‧ ‧ bearing

38, 138‧‧‧ Inner Week

39, 139‧‧‧ peripherals

40‧‧‧磨石

A, B‧‧‧ rotating shaft

C1, C2‧‧‧ position

G‧‧‧ center of gravity

I‧‧‧ hatching

Fig. 1 is a cross-sectional view showing a configuration example of a processing apparatus including the processing aid of the first embodiment.

Fig. 2 is a cross-sectional view showing the vicinity of the processing aid shown in Fig. 1 as seen from the longitudinal direction side of the cylindrical ceramic.

Fig. 3 is an enlarged cross-sectional view showing the processing aid shown in Fig. 1.

Figure 4 is a flow chart showing the processing steps for making a sputter target.

Fig. 5 is an enlarged cross-sectional view showing the processing aid of the second embodiment.

Hereinafter, the processing aid and the method of manufacturing the sputtering target disclosed in the present application will be described in detail with reference to additional drawings. However, the present invention is not limited to the embodiments shown below.

(First embodiment)

Fig. 1 is a cross-sectional view showing a configuration example of a processing apparatus including the processing aid of the first embodiment. In addition, FIG. 2 is a cross-sectional view of the vicinity of the processing aid shown in FIG. 1 when viewed from the longitudinal direction side of the cylindrical ceramic.

Correctly, Figure 1 shows the I-I line in Figure 2. A cross-sectional view of the cutting device. In addition, in the second drawing, in order to facilitate understanding of the description, the X-axis direction, the Y-axis direction, and the Z-axis direction orthogonal to each other are defined, and the Z-axis positive direction is shown as a three-dimensional orthogonal coordinate system in the vertical upward direction. It.

In addition, in the first drawing, the second drawing, and the third and fifth drawings to be described later, only the constituent elements required for the description are shown, and the description of the general constituent elements may be omitted. In addition, the first drawing, the second drawing, the third drawing, and the fifth drawing are schematic views.

The processing apparatus 1 shown in Fig. 1 is a device for processing a long cylindrical ceramic 10 to produce a sputtering target. The target material manufactured by the processing apparatus 1 is mounted on a sputtering apparatus (not shown) to perform sputtering of a thin film on a substrate not shown.

As shown in FIGS. 1 and 2, the cylindrical ceramic 10 is formed in a tubular shape having a hollow portion 11. The cylindrical ceramic 10 is produced through a granulation step, a molding step, and a sintering step.

Specifically, in the granulation step, a slurry containing, for example, a ceramic raw material powder and an organic additive is prepared, and the granules are produced by subjecting the slurry to a spray drying treatment. In the molding step, for example, CIP (Cold Isostatic Pressing) molding is performed on the granules to prepare a cylindrical molded body. Then, in the sintering step, the formed body is sintered in a sintering furnace to prepare a sintered body.

The sintered system produced in this manner is a cylindrical ceramic 10 which is subjected to polishing processing of the inner peripheral surface 10a while the processing apparatus 1 rotates. Manufacture of cylindrical ceramic 10 as a sintered body The method is not limited to the above, and may be any method.

That is, for example, although CIP molding is used in the above-described molding step, the present invention is not limited thereto, and other molding methods such as extrusion molding, injection molding, or die casting molding may be used.

Further, examples of the ceramic material of the cylindrical ceramic 10 include IGZO (In ₂ O ₃ -Ga ₂ O ₃ -ZnO), ITO (In ₂ O ₃ -SnO ₂ ), and AZO (Al ₂ O ₃ -ZnO). However, it is not limited to this. In other words, the cylindrical ceramics 10 may contain, for example, one or more of In, Zn, Al, Ga, Zr, Ti, Sn, Mg, and Si.

The cylindrical ceramic 10 produced in this manner has a longer overall length, and the force applied to the contact portion between the processing aid and the cylindrical ceramic 10 is larger, for example, the total length is 500 mm or more, preferably 750 mm or more. When it is 1000 mm or more, the processing aid mentioned later can be suitably used suitably. However, it is also possible to use a processing aid for the cylindrical ceramic 10 having a total length of 500 mm.

As shown in FIG. 1, the processing apparatus 1 is equipped with the rotation mechanism 20 and the vibration suppression mechanism 30. The rotating mechanism 20 holds one end 10c of the cylindrical ceramic 10 and rotates the cylindrical ceramic 10.

Specifically, the rotation mechanism 20 includes a main body portion 21 , a rotating portion 22 , and a holding hook 23 . A drive source (not shown) of a motor or the like that rotationally drives the four rotating portions 22 is housed in the main body portion 21.

The rotating portion 22 is coupled to the output shaft of the above-described driving source, and rotates around the rotating shaft A when the rotational force is transmitted from the driving source. The retaining hook 23 is coupled to the rotating portion 22 and is provided with a plurality of cylindrical ceramics The outer peripheral side of one end 10c of the porcelain 10 is used to hold the cylindrical ceramic 10.

Specifically, for example, there are three holding hooks 23 (one less in the first drawing), and are arranged at intervals of 120 degrees around the rotation axis A. Further, the three holding hooks 23 are respectively configured to be independently movable in the radial direction of the cylindrical ceramic 10 when viewed in the X-axis direction.

Therefore, for example, when the cylindrical ceramic 10 is held by the holding hook 23, the space held by the three holding hooks 23 is set to be larger than the outer diameter of the cylindrical ceramic 10 when viewed first in the X-axis direction. . Then, one end 10c of the cylindrical ceramic 10 is placed in a space held by the three holding hooks 23, and the three holding hooks 23 are respectively moved radially inward.

Then, the holding hook 23 is abutted against the outer peripheral surface 10b of the cylindrical ceramic 10 at a predetermined pressure, and the one end 10c of the cylindrical ceramic 10 is held by the three holding hooks 23. Thereby, the rotation mechanism 20 can rotate the cylindrical ceramic 10 held by the holding hook 23 around the rotation axis A with the rotation of the rotating portion 22.

The rotation axis of the cylindrical ceramic 10 is substantially coaxial with the rotation axis A of the rotation mechanism 20. Therefore, in the first diagram and the like, the rotation axis of the cylindrical ceramic 10 is also shown as "rotation axis A" for simplification of illustration.

In the above, the number of the holding hooks 23 of the rotating mechanism 20 is three, but the number is not limited to this. Further, in the above-described rotating mechanism 20, the cylindrical ceramics 10 are held by the holding hooks 23, but this is merely an example and is not limited thereto. For example, the rotation mechanism 20 may include a holding portion formed in an annular shape instead of the holding hook 23, and one end 10c of the cylindrical ceramic 10 may be inserted and fixed to the holding portion or the like, and the cylindrical ceramic 10 may be held by another configuration. .

The vibration suppression mechanism 30 rotatably holds the vicinity of the other end 10d of the cylindrical ceramic 10 and suppresses vibration of the cylindrical ceramic 10 due to the rotation. Thereby, the rotation axis A of the cylindrical ceramic 10 in rotation can be stabilized, so that the polishing precision at the time of polishing processing mentioned later can be improved.

Specifically, the vibration suppression mechanism 30 includes a main body portion (not shown) and a processing aid 31. The processing aid 31 is provided in the main body portion, and rotatably holds the vicinity of the other end 10d of the cylindrical ceramic 10 from the outer peripheral surface 10b side.

The cylindrical ceramic 10 is a material which is relatively low in mechanical strength and brittle. Therefore, for example, when the portion of the processing aid 31 that is in contact with the cylindrical ceramic 10 is made of a metal such as stainless steel, there is a fear that the outer peripheral surface 10b is damaged or broken due to contact with the processing aid 31. .

Therefore, the processing aid 31 of the present embodiment is configured to suppress the occurrence of damage or cracking of the cylindrical ceramic 10. The configuration of the processing aid 31 will be described in more detail below.

Fig. 3 is an enlarged cross-sectional view showing the processing aid 31 shown in Fig. 1. As shown in FIG. 2 and the like, the processing aid 31 includes a plurality of rollers 34 and support portions 35 that support a plurality of rollers 34, respectively. In the first to third figures, the support portion 35 is displayed by a virtual line for simplification of illustration.

The roller 34 is as shown in Figs. 1 to 3 and can be formed, for example, in a cylindrical shape. Further, the roller 34 is an example of a rotating body.

A plurality of rollers 34 are disposed on the outer peripheral side of the other end 10d of the cylindrical ceramic 10. For example, there are 3 rollers 34 (see less in Figure 1). Up to one) is arranged at intervals of 120 degrees around the rotation axis A. In the above-described manner, the rollers 34 are disposed at equal intervals (for example, at intervals of 120 degrees). However, the present invention is not limited thereto, and the interval between the plurality of rollers 34 may be arbitrarily set.

Further, since the plurality of rollers 34 are respectively provided in contact with the outer peripheral surface 10b of the cylindrical ceramic 10 that rotates in the circumferential direction, the plurality of rollers 34 are configured to follow the rotation of the cylindrical ceramic 10 and rotate around the rotation axis B. .

Specifically, as shown in detail in FIGS. 2 and 3 , the roller 34 includes a core member 36 , a bearing 37 , an inner peripheral portion 38 , and an outer peripheral portion 39 .

The core material 36 is formed, for example, in a cylindrical shape, and is fixed at an appropriate position of the support portion 35. Further, as the core material 36, for example, a metal material such as iron, stainless steel, titanium or titanium alloy, or a hard rubber or a resin may be used, but it is not limited thereto.

The inner peripheral portion 38 is formed, for example, in a cylindrical shape, and is disposed at a position surrounding the core member 36 when viewed in the direction of the rotation axis B. Further, the bearing 37 is disposed radially outward of the core member 36 and radially inward of the inner peripheral portion 38. Therefore, the bearing 37 rotatably supports the inner peripheral portion 38 and the outer peripheral portion 39 to the core member 36.

In the example shown in Fig. 1 and Fig. 3, the bearings 37 are disposed in the vicinity of both ends of the core member 36. However, the present invention is not limited thereto, and the arrangement place or the number of the bearings 37 can be arbitrarily set.

For the inner peripheral portion 38, for example, a metal material such as iron, stainless steel, titanium or titanium alloy, or a hard rubber or a resin may be used, but it is not limited. This is the case.

The outer peripheral portion 39 is formed to cover the radially outer surface of the inner peripheral portion 38, and is formed in a cylindrical shape. Further, the outer peripheral portion 39 is disposed to abut against the outer peripheral surface 10b of the cylindrical ceramic 10.

The material that abuts against the outer peripheral portion 39 of the cylindrical ceramic 10 is resin or rubber. The resin may be one or more resin materials containing a polyamide resin, an ABS resin, a polycarbonate resin, a polypropylene resin, etc., but is not limited thereto. Further, the rubber may be one or more rubber materials including chloroprene rubber, nitrile rubber, natural rubber, isoprene rubber, butadiene rubber, urethane rubber, etc., but is not limited thereto. This is the case.

In the present embodiment, since the material of the outer peripheral portion 39 is made of resin or rubber, the load acting on the cylindrical ceramic 10 from the roller 34 can be reduced at the time of contact as compared with the case where the outer peripheral portion 39 is made of metal. . By this means, for example, when the cylindrical ceramic 10 as a brittle material is rotated to machine the inner circumferential surface 10a, the outer circumferential surface 10b of the cylindrical ceramic 10 can be prevented from being damaged or broken by contact with the roller 34.

The length L1 of the roller 34 in the above-described configuration in the direction of the rotation axis B (refer to Fig. 1) is preferably 15 mm or more, more preferably 30 mm or more, and still more preferably 50 mm or more. That is, the total length L1 of the roller 34 is set so as to increase the contact area between the roller 34 and the cylindrical ceramic 10, and the surface pressure acting on the cylindrical ceramic 10 from the roller 34 can be reduced at the time of contact. Thereby, damage or cracking of the outer peripheral surface 10b of the cylindrical ceramic 10 can be effectively suppressed.

Further, the length of the roller 34 in the direction of the rotation axis B is L1 The upper limit is not particularly limited, and is preferably 5000 mm or less from the viewpoint of handling property in the step of using the roller 34.

Further, the ratio of the total length L1 of the roller 34 in the direction of the rotation axis B to the total length L2 of the cylindrical ceramic 10 in the direction of the rotation axis A (refer to Fig. 1) is preferably 3% or more, and particularly preferably 5% or more. Thereby, the surface pressure acting on the cylindrical ceramic 10 from the roller 34 can be reduced at the time of contact, so that damage or cracking of the outer peripheral surface 10b of the cylindrical ceramic 10 can be more effectively suppressed.

Further, when the material of the outer peripheral portion 39 is a resin, the Rockwell hardness (ASTM standard, D785, R scale) is preferably, for example, 80 or more and 125 or less, and more preferably 80 or more and 120 or less. Further, when the material of the outer peripheral portion 39 is rubber, the rubber hardness (JIS standard, K6253-3: 2012) is preferably 80 or more and 95 or less, and more preferably 80 or more and 90 or less.

Thereby, the load acting on the cylindrical ceramic 10 from the roller 34 can be further reduced at the time of contact, and the outer peripheral surface 10b of the cylindrical ceramic 10 can be prevented from being damaged or broken as compared with the case where the outer peripheral portion 39 is made of metal. . When the hardness is higher than the above range, the outer peripheral surface 10b of the cylindrical ceramic 10 may be damaged or broken. When the hardness is less than the above range, vibration may not be suppressed, and the processing accuracy may be deteriorated.

Further, the roller 34 abuts on the position of the cylindrical ceramic 10, preferably, for example, from the one end 10c of the cylindrical ceramic 10 held by the rotating mechanism 20, and at a position C1 which is 1/2 of the full length L2 (refer to the first Figure) is located on the other side 10d side. As a more preferable example, the position of the roller 34 is started from the one end 10c of the cylindrical ceramic 10, and is located on the other end 10d side from the position C2 (refer to Fig. 1) which is 2/3 of the total length L2.

Thereby, the vibration suppression mechanism 30 can stably hold the cylindrical ceramic 10, and the vibration of the cylindrical ceramic 10 can be further suppressed. Furthermore, since the rotation axis A of the rotating cylindrical ceramic 10 is stabilized, the polishing precision can be further improved.

The support portion 35 supports the three rollers 34 as described above. The three support portions 35 are respectively attached to the main body portion not shown in the figure of the vibration suppression mechanism 30, and are configured to be cylindrical when viewed in the X-axis direction. The ceramics 10 move independently in the radial direction.

Therefore, for example, when the cylindrical ceramic 10 is held by the support portion 35 and the roller 34 before processing, the space held by the three rollers 34 is previously set to be larger than that of the cylindrical ceramic 10 when viewed in the X-axis direction. The outer diameter is larger. Then, the vicinity of one end 10c of the cylindrical ceramic 10 is placed in a space held by the three rollers 34, and then the three support portions 35 and the rollers 34 are moved radially inward.

Then, the roller 34 is brought into contact with the outer peripheral surface 10b of the cylindrical ceramic 10 at a predetermined pressure, and the other end 10d of the cylindrical ceramic 10 is rotatably held by the three rollers 34.

The processing apparatus 1 is provided with a grindstone 40 (refer to FIGS. 1 and 2). The grindstone 40 moves while the inner portion of the hollow portion 11 of the cylindrical ceramic 10 abuts against the inner peripheral surface 10a by a moving mechanism (not shown). That is, in the processing apparatus 1, the inner peripheral surface 10a of the cylindrical ceramic 10 is traversed. The polishing method of the inner circumferential surface 10a of the cylindrical ceramic 10 is not limited to the traverse polishing, and any method may be used.

In the above embodiment, the number of the rollers 34 is three, but one The number is not limited to this. Further, in the above-described example, the plurality of rollers 34 are all formed in the same configuration. However, the present invention is not limited thereto. For example, a part or all of the plurality of rollers 34 may be formed in a different configuration.

In this regard, the example shown in FIG. 2 will be described. Here, when viewed in the direction of the rotation axis A, the two rolls which are located on the lower side of the Z-axis than the center of gravity G of the cylindrical ceramic 10 are denoted by reference numeral 34a, and the rolls whose center of gravity G is located on the upper side of the Z-axis are denoted as Symbol 34b.

In the above-mentioned roller 34a, due to the weight of the cylindrical ceramic 10 itself, the load on the cylindrical ceramic 10 in contact with the roller 34a is higher than that of the portion in contact with the roller 34b, and damage or cracking is likely to occur. .

Therefore, for example, the material of only the outer peripheral portion 39 of the two rolls 34a can be configured as a resin or a rubber. Further, for example, the entire length L1 of the two rollers 34a may be configured to be longer than the entire length L1 of the roller 34b.

As described above, even if the material of the outer peripheral portion 39 is made of resin or rubber or the entire length L1 is increased, the outer peripheral surface 10b of the cylindrical ceramic 10 can be prevented from being damaged or broken.

Next, a method of manufacturing the sputtering target using the processing aid 31 of the present embodiment will be described with reference to Fig. 4 . Figure 4 is a flow chart showing the processing steps for making a sputter target.

As shown in Fig. 4, first, the one end 10c of the cylindrical ceramic 10 is held by the holding hook 23 of the rotating mechanism 20, and the cylindrical ceramic 10 is attached to the rotating mechanism 20 (step S1).

Rotatingly by the roller 34 of the processing aid 31 The other end 10d of the cylindrical ceramic 10 is held (step S2). The processing procedure of steps S1 and S2 is not limited to the above. For example, the processing of step S1 may be performed after the processing of step S2, or the processing of steps S1 and S2 may be performed at the same timing.

Then, the cylindrical ceramic 10 is rotated in the circumferential direction by the rotation mechanism 20 to polish the inner circumferential surface 10a (step S3). By the above steps, the processing of the inner circumferential surface 10a of the series of cylindrical ceramics 10 is finished.

When the sputtering target is produced, the processes other than the above steps S1 to S3 can be performed. For example, the outer peripheral surface 10b of the cylindrical ceramic 10 can be subjected to a polishing process.

As described above, the processing aid 31 of the first embodiment includes a roller (rotating body) 34 that rotates in accordance with the rotation of the cylindrical ceramic 10. The length of the roller 34 in the direction of the rotation axis is 15 mm or more, and the material of at least the outer peripheral portion 39 of the roller 34 is a resin having a Rockwell hardness of 80 or more and 125 or less, or a rubber having a rubber hardness of 80 or more and 95 or less. Thereby, the occurrence of damage or cracking of the outer peripheral surface 10b of the cylindrical ceramic 10 can be suppressed.

Further, since the cylindrical ceramic 10 in which the occurrence of damage or cracking is suppressed as described above can be used as a sputtering target, in the present embodiment, the yield of the cylindrical ceramic for the sputtering target can be suppressed. reduce.

(Example) [Example 1]

The In ₂ O ₃ powder 44.2 mass of ZnO powder having a specific surface area (BET specific surface area) of 4 m ² /g as measured by the BET (Brunauer-Emmett-Teller) method of 25.9% by mass and a BET specific surface area of 7 m ² /g was formulated. % and a Ga ₂ O ₃ powder having a BET specific surface area of 10 m ² /g of 29.9 mass% were ball-milled by a zircon ball in a pot to prepare a raw material powder.

In the pot, 0.3% by mass of polyvinyl alcohol, 0.4% by mass of ammonium polycarboxylate, 1.0% by mass of polyethylene glycol, and 50% by mass of water were added to 100% by mass of the raw material powder to perform ball milling. Mix to prepare a slurry.

Next, the slurry was supplied to a spray drying apparatus, and spray-dried under conditions of an atomization revolution of 14,000 rpm, an inlet temperature of 200 ° C, and an outlet temperature of 80 ° C to prepare granules.

The granules were filled with a cylindrical urethane rubber mold having an inner diameter of 220 mm (wall thickness: 10 mm) and a length of 1300 mm having a cylindrical core (core rod) having an outer diameter of 150 mm while being softened, and the rubber was closed. After the mold, CIP molding was carried out at a pressure of 800 kgf/cm ² to prepare a cylindrical molded body.

The molded body was heated from a normal temperature to 1400 ° C at a temperature increase rate of 300 ° C / h, and after cooling for 12 hours, the molded body was sintered at a cooling rate of 50 ° C / h to produce a sintered body. Then, the sintered body produced by the above method was cut so that the total length L2 became 500 mm, and the cylindrical ceramic 10 of IGZO was obtained.

Then, after the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, a processing aid having a material of the outer peripheral portion 39 as a polyamide resin, a roll having a total length L1 of 15 mm, and a Rockwell hardness of 120 is used. 31. Grinding processing of the inner peripheral surface 10a is performed. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.4 mm.

In the present specification, when the depth of the damage after the processing is less than 0.5 mm, it is judged that the processing is satisfactory and satisfies the quality standard of the cylindrical ceramics 10. On the other hand, when the thickness is 0.5 mm or more, it is determined that the processing is poor and Meet the quality benchmark.

[Embodiment 2]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a polyamide resin, a full length L1 of 60 mm, and a Rockwell hardness of 120 is used. Grinding processing of the inner peripheral surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.2 mm.

[Example 3]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a polypropylene resin, a full length L1 of 60 mm, and a Rockwell hardness of 81 is used. Grinding of the circumferential surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after processing, The occurrence of cracks or cracks was confirmed, and the depth of the damage after the processing was 0.3 mm.

[Example 4]

10% by mass of SnO ₂ powder having a specific surface area (BET specific surface area) of 5 m ² /g as measured by the BET method, and 90% by mass of In ₂ O ₃ powder having a BET specific surface area of 5 m ² /g, in a pot The raw material powder was prepared by ball milling mixing with zircon balls.

In the pot, 0.3% by mass of polyvinyl alcohol, 0.2% by mass of ammonium polycarboxylate, 0.5% by mass of polyethylene glycol, and 50% by mass of water were added to 100% by mass of the raw material powder to perform ball milling. Mix to prepare a slurry.

The subsequent steps from the spray drying to the forming were carried out in the same manner as in Example 1. The obtained molded body was heated from a normal temperature to 1600 ° C at a heating rate of 300 ° C / h, and after cooling for 12 hours, the molded body was sintered at a cooling rate of 50 ° C / h to produce a sintered body. Then, the cylindrical ceramic 10 of ITO was obtained by cutting the entire length L2 to 1000 mm.

Then, after the cylindrical ceramic 10 obtained by the above method is subjected to the polishing process of the outer peripheral surface 10b, the material having the outer peripheral portion 39 is a polyamide resin, and the roll 34 having a total length L1 of 60 mm and a Rockwell hardness of 120 is used. The auxiliary tool 31 performs a polishing process of the inner circumferential surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.1 mm.

[Example 5]

The sintered body produced by the same method as in Example 4 was cut so as to have a total length L2 of 1000 mm to obtain a cylindrical ceramic 10. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a polycarbonate resin, a roll having a total length L1 of 60 mm, and a Rockwell hardness of 125 is used. Grinding processing of the inner peripheral surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.2 mm.

[Embodiment 6]

The sintered body produced by the same method as in Example 1 was cut so as to have a total length L2 of 500 mm to obtain a cylindrical ceramic 10. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a chloroprene rubber, a full length L1 of 15 mm, and a rubber hardness of 90 is used. Grinding processing of the inner peripheral surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.4 mm.

[Embodiment 7]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the material having the outer peripheral portion 39 is made of chloroprene rubber, and the total length L1 is The processing aid 31 of the roller 34 of 60 mm and having a rubber hardness of 90 is subjected to polishing processing of the inner circumferential surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.2 mm.

[Embodiment 8]

The sintered body produced by the same method as in Example 4 was cut so as to have a total length L2 of 1000 mm to obtain a cylindrical ceramic 10. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a butadiene rubber, a full length L1 of 60 mm, and a rubber hardness of 82 is used. Grinding of the circumferential surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.2 mm.

[Comparative Example 1]

The sintered body produced by the same method as in Example 1 was cut so as to have a total length L2 of 500 mm to obtain a cylindrical ceramic 10. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 of the SUS 304 and the roll 34 having the total length L1 of 15 mm is used, and the inner peripheral surface 10a is polished. SUS304 is extremely hard compared to the resin or rubber used in the present invention. Although the occurrence of cracks or cracks was not observed in the outer peripheral surface 10b of the cylindrical ceramic 10 after the processing, the depth of the damage after the processing was 0.9 mm.

[Comparative Example 2]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 of the material SUS304 and the roll 34 having the total length L1 of 10 mm is used, and the inner peripheral surface 10a is polished. In Comparative Example 2, cracking occurred in the outer peripheral surface 10b of the cylindrical ceramic 10 during processing, and processing was impossible. Therefore, the depth of damage after processing cannot be measured.

[Comparative Example 3]

The sintered body produced by the same method as in Example 4 was cut so as to have a total length L2 of 1000 mm to obtain a cylindrical ceramic 10. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 of the material SUS304 and the roll 34 having the total length L1 of 10 mm is used, and the inner peripheral surface 10a is polished. Although the occurrence of cracks or cracks was not observed on the outer peripheral surface 10b of the cylindrical ceramic 10 after the processing, the depth of the damage after the processing was 0.6 mm.

[Comparative Example 4]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 of the SUS 304 and the roll 34 having the total length L1 of 60 mm is used, and the inner peripheral surface 10a is polished. Processing Although the outer peripheral surface 10b of the cylindrical ceramic 10 was not confirmed to have cracks or cracks, the depth of the damage after the processing was 0.9 mm.

[Comparative Example 5]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a polyamide resin, a roll having a total length L1 of 10 mm and a Rockwell hardness of 120 is used. Grinding processing of the inner peripheral surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 after the processing was not confirmed to have cracks or cracks, and the depth of the damage after the processing was 0.6 mm.

[Comparative Example 6]

The sintered body produced by the same method as in Example 1 was cut so that the total length L2 became 1000 mm, and the cylindrical ceramic 10 was obtained. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the processing aid 31 having the outer peripheral portion 39 made of a fluororesin, a roll having a total length L1 of 60 mm and a Rockwell hardness of 50 is used, and the inner periphery is used. Grinding of the surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 during processing does not cause cracking or cracking, but vibration cannot be suppressed, so that processing cannot be performed.

[Comparative Example 7]

A sintered body produced by the same method as in Example 1 was used so that The cylindrical ceramic 10 was obtained by cutting the entire length L2 to 1000 mm. After the cylindrical ceramic 10 is subjected to the polishing process of the outer peripheral surface 10b, the material having the outer peripheral portion 39 is made of chloroprene rubber, the total length L1 is 60 mm, and the rubber hardness is 60 (more soft than the user of the embodiment). The processing aid 31 of the roller 34 of the chloroprene rubber is subjected to polishing processing of the inner circumferential surface 10a. The outer peripheral surface 10b of the cylindrical ceramic 10 during processing does not cause cracking or cracking, but vibration cannot be suppressed, so that processing cannot be performed.

In the examples and the comparative examples, the depth of damage formed on the outer peripheral surface 10b of the cylindrical ceramic 10 after the polishing process of the inner peripheral surface 10a is the outer periphery of the cylindrical ceramic 10 after the polishing process of the inner peripheral surface 10a. Face 10b was evaluated with the depth of grinding required until the damage disappeared. In the above examples and comparative examples, only the cylindrical sputtering targets of IGZO and ITO which are particularly effective in the present invention are exemplified. However, the present invention does not only achieve an effect on the cylindrical sputtering target of IGZO and ITO.

(Second embodiment)

Next, the processing aid 131 of the second embodiment will be described with reference to Fig. 5 . Fig. 5 is a view showing the processing aid 131 of the second embodiment, and the Figure 3 is also an enlarged cross-sectional view.

As shown in Fig. 5, in the second embodiment, the bearing 37 disposed inside the roller 34 in the first embodiment is removed, and the bearing 137 is interposed between the support portion 35 and the core member 136.

Specifically, in the roller 134 of the processing aid 131, the core material 136 is formed so as to protrude from both ends. The core member 36 of the first embodiment is fixed to the support portion 35. However, the core member 136 of the second embodiment is not fixed to the support portion 35 but is fixed to the inner peripheral portion 138.

Further, a bearing 137 is inserted between the both ends of the protruding core member 136 and the appropriate position of the support portion 35. In this manner, the bearing 137 is disposed on the radially outer side of the core member 136. Further, the bearing 137 rotatably supports the core member 136, the inner peripheral portion 138, and the outer peripheral portion 139 to the support portion 35.

As a result, in the processing aid 131 of the second embodiment, the diameter of the roller 134 can be made smaller than the configuration in which the bearing is housed, so that the processing aid 131 can be downsized.

In the second embodiment, the above-described contents show an example in which the core member 136 and the inner peripheral portion 138 are different from each other, but these may be integrally formed.

In the above embodiment, the shapes of the rolls 34 and 134 are formed into a cylindrical shape, and any shape such as a spherical shape may be used as long as the outer peripheral side is in contact with the cylindrical ceramic 10.

In the above, the vibration suppression mechanism 30 holds one of the vicinity of the other end 10d of the cylindrical ceramic 10, but it is also possible to hold two or more places by the vibration suppression mechanism 30.

Further, in the example shown in Fig. 1 and the like, the rotation axis B of the display roller 34 is parallel or substantially parallel to the rotation axis A of the cylindrical ceramic 10, but the invention is not limited thereto. For example, the rotation axis B is opposed to The axis of rotation A can be located at the intersection or torsion.

Further effects or modifications can be easily derived by those of ordinary skill in the art. Therefore, the invention in its broader aspects is not limited to the specific details and representative embodiments shown and described. Therefore, various modifications may be made without departing from the spirit and scope of the inventions.

10‧‧‧Cylindrical ceramics

10a‧‧‧ inner circumference

10b‧‧‧ outer perimeter

11‧‧‧ Hollow

31‧‧‧Processing aids

34, 34a, 34b‧‧‧ Roll

35‧‧‧Support

36‧‧‧ core material

37‧‧‧ bearing

38‧‧‧ Inner Week

39‧‧‧The outer part

40‧‧‧磨石

A, B‧‧‧ rotating shaft

G‧‧‧ center of gravity

I‧‧‧ hatching

Claims (11)

A processing aid, which is a processing aid for a cylindrical ceramic, comprising a rotating body that rotates in accordance with rotation of the cylindrical ceramic, wherein a length of the rotating body in a direction of a rotation axis is 15 mm or more, and the rotating body The material of at least the outer peripheral portion is a resin having a Rockwell hardness of 80 or more and 125 or less, or a rubber having a rubber hardness of 80 or more and 95 or less. The processing aid according to the first aspect of the invention, wherein the resin contains one or more of a polyamide resin, an ABS resin, a polycarbonate resin, and a polypropylene resin. The processing aid according to claim 1, wherein the rubber contains one of chloroprene rubber, nitrile rubber, natural rubber, isoprene rubber, butadiene rubber, and urethane rubber. the above. The processing aid according to claim 1, wherein a bearing that can rotate the rotating body is disposed outside the core material of the rotating body. The processing aid according to the first aspect of the invention, wherein, when the inner peripheral surface of the cylindrical ceramic that is rotated in the circumferential direction is processed, the rotating system abuts against the outer peripheral surface of the cylindrical ceramic To maintain the aforementioned cylindrical ceramic. A method for producing a sputtering target, comprising: a holding step of rotatably holding the cylindrical ceramic using the processing aid according to any one of claims 1 to 5; And a processing step of processing the inner circumferential surface of the cylindrical ceramic held and rotated by the processing aid. The method for producing a sputtering target according to claim 6, wherein the cylindrical ceramic has a total length of 500 mm or more. The method for producing a sputtering target according to claim 6, wherein the cylindrical ceramic has a total length of 750 mm or more. The method for producing a sputtering target according to claim 6, wherein the cylindrical ceramic has a total length of 1000 mm or more. The method of producing a sputtering target according to claim 6, wherein the cylindrical ceramic contains one or more of In, Zn, Al, Ga, Zr, Ti, Sn, Mg, and Si. The method for producing a sputtering target according to claim 6, wherein the holding step is to hold the cylindrical ceramic by a plurality of the rotating bodies.