TW201626480A - Substrate transferring system - Google Patents

Substrate transferring system Download PDF

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Publication number
TW201626480A
TW201626480A TW104100700A TW104100700A TW201626480A TW 201626480 A TW201626480 A TW 201626480A TW 104100700 A TW104100700 A TW 104100700A TW 104100700 A TW104100700 A TW 104100700A TW 201626480 A TW201626480 A TW 201626480A
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TW
Taiwan
Prior art keywords
transfer system
cleaner
substrate transfer
cleaning box
holder
Prior art date
Application number
TW104100700A
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Chinese (zh)
Inventor
劉政和
鄭博倫
楊子億
陳伍佑
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聯華電子股份有限公司
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Application filed by 聯華電子股份有限公司 filed Critical 聯華電子股份有限公司
Priority to TW104100700A priority Critical patent/TW201626480A/en
Publication of TW201626480A publication Critical patent/TW201626480A/en

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Abstract

A substrate transferring system comprises a robot arm, a clamper, a purge box and a purging element. The clamper is disposed on an end of the robot arm and used for clamping a substrate. The purging element is disposed within the purge box and used for purging the clamper entering the purge box.

Description

基板傳輸系統 Substrate transfer system

本發明是有關於一種基板傳輸系統,且特別是有關於一種具有清潔功能的基板傳輸系統。 The present invention relates to a substrate transfer system, and more particularly to a substrate transfer system having a cleaning function.

基板可在被機械手臂夾持後,由機械手臂傳輸於二位置之間。然而,基板被機械手臂夾持後,基板的材料(如顆粒)會殘留在機械手臂上。此些殘留的材料會負面地影響下一次傳輸的基板品質,如刮傷下一次傳輸之基板的表面。 The substrate can be transported by the robot arm between the two positions after being clamped by the robot arm. However, after the substrate is held by the robot arm, the material of the substrate (such as particles) remains on the robot arm. These residual materials can negatively affect the quality of the substrate that is transferred next, such as scratching the surface of the substrate that is transferred next time.

本發明係有關於一種基板傳輸系統,可去除機械手臂的殘留基板材料。 The present invention relates to a substrate transfer system that removes residual substrate material from a robotic arm.

根據本發明之一實施例,提出一種基板傳輸系統。基板傳輸系統包括一機械手臂、一夾持器、一清潔箱及一清潔器。夾持器設於機械手臂的一端,且用以夾持一基板。清潔器設於清潔箱內,用以清潔進入清潔箱內的夾持器。 According to an embodiment of the invention, a substrate transfer system is proposed. The substrate transfer system includes a robot arm, a holder, a cleaning box, and a cleaner. The holder is disposed at one end of the robot arm and is used for holding a substrate. The cleaner is located in the cleaning box to clean the holder entering the cleaning box.

為了對本發明之上述及其他方面有更佳的瞭解,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下: In order to better understand the above and other aspects of the present invention, the preferred embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

10‧‧‧基板 10‧‧‧Substrate

100、200、300‧‧‧基板傳輸系統 100, 200, 300‧‧‧ substrate transmission system

110‧‧‧機械手臂 110‧‧‧ Robotic arm

120‧‧‧片狀耙 120‧‧‧Piece

130‧‧‧夾持器 130‧‧‧Clamps

130r‧‧‧夾槽 130r‧‧‧ slot

140‧‧‧清潔箱 140‧‧‧Clean box

141‧‧‧底壁 141‧‧‧ bottom wall

141b‧‧‧底面 141b‧‧‧ bottom

142‧‧‧側壁 142‧‧‧ side wall

140a‧‧‧入口 140a‧‧‧ entrance

150‧‧‧清潔器 150‧‧‧cleaner

150a‧‧‧噴氣孔 150a‧‧‧jet hole

160‧‧‧供氣源 160‧‧‧ gas supply

170‧‧‧排氣元件 170‧‧‧Exhaust components

180‧‧‧滑軌 180‧‧‧rails

D1‧‧‧間距 D1‧‧‧ spacing

G‧‧‧清潔氣體 G‧‧‧cleaning gas

H1‧‧‧長度 H1‧‧‧ length

S1‧‧‧行程 S1‧‧‧ itinerary

第1圖繪示依照本發明一實施例之基板傳輸系統的示意圖。 FIG. 1 is a schematic diagram of a substrate transfer system in accordance with an embodiment of the present invention.

第2圖繪示第1圖之依照本發明一實施例之夾持器及片狀耙的剖視圖。 2 is a cross-sectional view of the holder and the sheet-like crucible according to an embodiment of the present invention in a first embodiment.

第3圖繪示第1圖之清潔器的外觀圖。 Fig. 3 is a view showing the appearance of the cleaner of Fig. 1.

第4圖繪示依照本發明另一實施例之基板傳輸系統的示意圖。 4 is a schematic diagram of a substrate transfer system in accordance with another embodiment of the present invention.

第5圖繪示依照本發明另一實施例之基板傳輸系統的示意圖。 FIG. 5 is a schematic diagram of a substrate transfer system in accordance with another embodiment of the present invention.

請參照第1及2圖,第1圖繪示依照本發明一實施例之基板傳輸系統的示意圖,而第2圖繪示第1圖之依照本發明一實施例之夾持器及片狀耙的剖視圖。基板傳輸系統100包括機械手臂110、數個片狀耙120、數個夾持器130(繪示於第2圖)、清潔箱140、數個清潔器150、供氣源160及排氣元件170。 Please refer to FIGS. 1 and 2 . FIG. 1 is a schematic diagram of a substrate transfer system according to an embodiment of the present invention, and FIG. 2 is a view showing a holder and a sheet 耙 according to an embodiment of the present invention. Cutaway view. The substrate transfer system 100 includes a robot arm 110, a plurality of sheet fins 120, a plurality of grippers 130 (shown in FIG. 2), a cleaning tank 140, a plurality of cleaners 150, a gas supply source 160, and an exhausting member 170. .

片狀耙120及夾持器130設於機械手臂110的一端,其中各夾持器130位於相鄰二片狀耙120之間。各夾持器130具有一夾槽130r,基板10可被夾持於夾槽130r內。透過機械手臂110的運動,可將被夾持器130夾持的基板10傳輸於二不同位置之間。上述基板10例如是矽晶圓(wafer)。 The sheet-like crucible 120 and the holder 130 are disposed at one end of the robot arm 110, wherein each of the holders 130 is located between the adjacent two-piece crucibles 120. Each of the holders 130 has a clamping groove 130r, and the substrate 10 can be clamped in the clamping groove 130r. Through the movement of the robot arm 110, the substrate 10 held by the holder 130 can be transported between two different positions. The substrate 10 is, for example, a wafer.

由於基板10與夾槽130r的槽壁是緊配地接觸,使基板10在被夾持及分離過程中,基板10的材料(如顆粒)容易殘留在夾持器130,甚至是殘留在片狀耙120。雖此,夾持器130 在釋放基板10後,機械手臂110可帶動片狀耙120及夾持器130進入清潔箱140內,可去除殘留在片狀耙120及/或夾持器130上的殘留基板材料。此外,清潔箱140具有入口140a,機械手臂110帶動片狀耙120及夾持器130透過入口140a進入清潔箱140內。入口140a可以是清潔箱140的唯一入口,當機械手臂110停留於或堵住入口140a時,清潔箱140內的殘留基板材料無從被吹出清潔箱140外(除了被排氣元件170吸出外)。如此,可保持清潔箱140外環境的清潔度。 Since the substrate 10 and the groove wall of the clip groove 130r are in tight contact, the material (such as particles) of the substrate 10 is likely to remain in the holder 130 during the process of being clamped and separated, and even remains in the sheet shape.耙120. Although this, the holder 130 After the substrate 10 is released, the robot arm 110 can drive the sheet-like crucible 120 and the holder 130 into the cleaning box 140 to remove residual substrate material remaining on the sheet-like crucible 120 and/or the holder 130. In addition, the cleaning box 140 has an inlet 140a, and the robot arm 110 drives the sheet-like crucible 120 and the holder 130 into the cleaning box 140 through the inlet 140a. The inlet 140a can be the only inlet to the cleaning tank 140. When the robotic arm 110 rests or blocks the inlet 140a, the residual substrate material in the cleaning tank 140 is not blown out of the cleaning tank 140 (except for being sucked out by the venting element 170). In this way, the cleanliness of the environment outside the cleaning box 140 can be maintained.

如第1圖所示,清潔箱140包括底壁141及側壁142。側壁142呈封閉環形並連接於底壁141,使從片狀耙120及/或夾持器130上去除的殘留基板材料不容易被吹至清潔箱140外。 As shown in FIG. 1, the cleaning box 140 includes a bottom wall 141 and side walls 142. The side wall 142 is closed and connected to the bottom wall 141 so that the residual substrate material removed from the sheet-like crucible 120 and/or the holder 130 is not easily blown out of the cleaning box 140.

清潔器150設於清潔箱140內。各清潔器150具有一噴氣孔150a。當夾持器130進入清潔箱140內,噴氣孔150a可對準夾持器130,以去除夾持器130上的殘留基板材料。於實施例中,各清潔器150的位置可對應於相鄰二片狀耙120之間的空間。如此一來,清潔器150噴出的清潔氣體G不會直接噴到片狀耙120而降低其噴力。由於各清潔器150的位置對應於相鄰二片狀耙120之間的空間,因此清潔器150噴出的清潔氣體G除了可作用於夾持器130外,也可作用在相鄰二片狀耙120之相對二面,進而可去除此相對二面的殘留基板材料(若有的話)。 The cleaner 150 is disposed in the cleaning box 140. Each cleaner 150 has a gas injection hole 150a. When the holder 130 enters the cleaning box 140, the gas injection holes 150a can be aligned with the holder 130 to remove residual substrate material on the holder 130. In an embodiment, the position of each cleaner 150 may correspond to a space between adjacent two sheets 120. As a result, the cleaning gas G ejected from the cleaner 150 is not directly sprayed onto the sheet crucible 120 to reduce the ejection force. Since the position of each cleaner 150 corresponds to the space between the adjacent two sheets 120, the cleaning gas G sprayed by the cleaner 150 can act on the adjacent two sheets in addition to the holder 130. The opposite sides of 120, in turn, can remove the residual substrate material (if any) on the opposite sides.

此外,供氣源160連通清潔器150,可提供清潔器 150一清潔氣體G且提供清潔氣體G足以去除殘留基板材料的壓力。清潔氣體G可以是惰性氣體,如氮氣、氦氣等。由於清潔氣體G的惰性,可避免殘留基板材料發生化學變化。 In addition, the air supply source 160 communicates with the cleaner 150 to provide a cleaner 150 a cleaning gas G and providing a cleaning gas G sufficient to remove residual substrate material pressure. The cleaning gas G may be an inert gas such as nitrogen, helium or the like. Due to the inertness of the cleaning gas G, chemical changes in the residual substrate material can be avoided.

如第1圖所示,此些清潔器150可排列成至少一排,本實施例係以單排為例說明。單排的清潔器150可動地設於清潔箱140內,例如,單排的清潔器150可沿片狀耙120的延伸方向移動。清潔器150的移動行程S1實質上等於或大於片狀耙120的長度H1。如此一來,清潔器150噴出的清潔氣體G可充分地作用在整個片狀耙120,進而能去除整個片狀耙120上的可能殘留基板材料。 As shown in FIG. 1, the cleaners 150 can be arranged in at least one row. This embodiment is illustrated by a single row. A single row of cleaners 150 are movably disposed within the cleaning bin 140. For example, a single row of cleaners 150 can be moved in the direction in which the tabs 120 extend. The moving stroke S1 of the cleaner 150 is substantially equal to or greater than the length H1 of the sheet-like crucible 120. As a result, the cleaning gas G ejected from the cleaner 150 can sufficiently act on the entire sheet-like crucible 120, thereby removing the possible residual substrate material on the entire sheet-like crucible 120.

如第1圖所示,排氣元件170與清潔箱140連通,可快速排出清潔箱140內從片狀耙120及/或夾持器130脫離的殘留基板材料。於實施例中,排氣元件170可設於清潔箱140的底壁141。此外,排氣元件170與清潔箱140的入口140a係相對配置。另一實施例中,排氣元件170可設於清潔箱140的側壁142,較佳但非限定地可設於側壁142中靠近清潔器150之處。 As shown in FIG. 1, the venting element 170 is in communication with the cleaning tank 140 to quickly discharge residual substrate material from the retort 120 and/or the holder 130 in the cleaning tank 140. In an embodiment, the venting element 170 can be disposed on the bottom wall 141 of the cleaning tank 140. Further, the exhaust member 170 is disposed opposite to the inlet 140a of the cleaning tank 140. In another embodiment, the venting element 170 can be disposed on the sidewall 142 of the cleaning bin 140, preferably but not limited to, in the sidewall 142 adjacent the cleaner 150.

請參照第3圖,其繪示第1圖之清潔器的外觀圖。基板傳輸系統100更包括滑軌180。滑軌180延伸於入口140a與底面141b(如第1圖所示)之間。滑軌180設於清潔箱140內,例如是設於側壁142的內面。清潔器150可滑動地設於滑軌180,可使清潔器150在移動中噴出清潔氣體G。如此一來,只要單個或單排清潔器150的移動範圍涵蓋片狀耙120及夾持器130的區 域,便能充分去除片狀耙120及/或夾持器130上的殘留基板材料。另一實施例中,基板傳輸系統100更包括一驅動元件(未繪示),如馬達,其可驅動清潔器150滑動。 Please refer to FIG. 3, which shows an external view of the cleaner of FIG. 1. The substrate transport system 100 further includes a slide rail 180. The slide rail 180 extends between the inlet 140a and the bottom surface 141b (as shown in Figure 1). The slide rail 180 is disposed in the cleaning box 140, for example, on the inner surface of the side wall 142. The cleaner 150 is slidably provided on the slide rail 180 to allow the cleaner 150 to eject the cleaning gas G while moving. As such, as long as the range of movement of the single or single row of cleaners 150 covers the area of the sheet-like crucible 120 and the holder 130 The residual substrate material on the sheet crucible 120 and/or the holder 130 can be sufficiently removed. In another embodiment, the substrate transfer system 100 further includes a drive component (not shown), such as a motor, that can drive the cleaner 150 to slide.

請參照第4圖,其繪示依照本發明另一實施例之基板傳輸系統的示意圖。基板傳輸系統200包括機械手臂110、數個片狀耙120、數個夾持器130(未繪示)、清潔箱140、數個清潔器150、供氣源160、排氣元件170及滑軌180(未繪示)。 Please refer to FIG. 4, which is a schematic diagram of a substrate transfer system in accordance with another embodiment of the present invention. The substrate transport system 200 includes a robot arm 110, a plurality of sheet-like crucibles 120, a plurality of grippers 130 (not shown), a cleaning tank 140, a plurality of cleaners 150, a gas supply source 160, an exhausting member 170, and a slide rail. 180 (not shown).

本實施例中,數個清潔器150排列成數排,例如是二排。二排清潔器150可移動地設於清潔器150內的滑軌180。二排清潔器150之間距D1可實質上等於或小於片狀耙120的長度H1;在此設計下,在機械手臂110帶動片狀耙120及夾持器130透過入口140a進入清潔箱140內時,二排清潔器150的移動範圍可涵蓋片狀耙120及夾持器130的整個區域,以充分去除片狀耙120及/或夾持器130上的殘留基板材料。另一實施例中,二排清潔器150之間距D1也可大於片狀耙120的長度H1。 In this embodiment, the plurality of cleaners 150 are arranged in a plurality of rows, for example, two rows. The second row of cleaners 150 are movably disposed on the slide rails 180 within the cleaner 150. The distance D1 between the two rows of cleaners 150 may be substantially equal to or smaller than the length H1 of the sheet-like crucible 120; in this design, when the robot arm 110 drives the sheet-like crucible 120 and the holder 130 through the inlet 140a into the cleaning box 140 The range of movement of the second row of cleaners 150 may encompass the entire area of the sheet-like crucible 120 and the holder 130 to substantially remove the residual substrate material on the sheet-like crucible 120 and/or the holder 130. In another embodiment, the distance D1 between the two rows of cleaners 150 may also be greater than the length H1 of the sheet-like crucible 120.

請參照第5圖,其繪示依照本發明另一實施例之基板傳輸系統的示意圖。基板傳輸系統300包括機械手臂110、數個片狀耙120、數個夾持器130(未繪示)、清潔箱140、數個清潔器150、供氣源160及排氣元件170。數個清潔器150排列成數排,例如是二排。本實施例中,二排清潔器150的其中一排可靠近清潔箱140的入口140a,其位置大致上對應夾持器130的位置,且二排清潔器150的間距D1實質上等於或大於片狀耙120 的長度H1。如此一來,二排清潔器150可在不移動情況下涵蓋片狀耙120及夾持器130的整個區域,以充分地去除片狀耙120及/或夾持器130上的殘留基板材料。在此設計下,基板傳輸系統300可選擇性地省略滑軌180。 Referring to FIG. 5, a schematic diagram of a substrate transfer system in accordance with another embodiment of the present invention is shown. The substrate transfer system 300 includes a robot arm 110, a plurality of sheet fins 120, a plurality of grippers 130 (not shown), a cleaning tank 140, a plurality of cleaners 150, a supply source 160, and a venting element 170. The plurality of cleaners 150 are arranged in a plurality of rows, for example, two rows. In this embodiment, one of the rows of the two rows of cleaners 150 can be adjacent to the inlet 140a of the cleaning tank 140, the position of which corresponds substantially to the position of the holder 130, and the spacing D1 of the two rows of cleaners 150 is substantially equal to or greater than the sheet. Shape 120 The length of H1. In this way, the second row of cleaners 150 can cover the entire area of the sheet-like crucible 120 and the holder 130 without moving to sufficiently remove the residual substrate material on the sheet-like crucible 120 and/or the holder 130. Under this design, the substrate transport system 300 can selectively omit the slide rails 180.

綜合上述,本發明實施例之基板傳輸系統的機械手臂可在釋放基板後,進入清潔箱,以去除夾持器及/或片狀耙上的殘留基板材料。如此,可避免下一次夾持製程時過度破壞所夾持的基板。此外,基板傳輸系統可包括一個或多個清潔器,其可動或固定地設於清潔箱內,可去除夾持器及/或片狀耙上的殘留基板材料。另外,多個清潔器的一個或一些係可動地設置,而另一個或另一些係固定地設置。可動的多個清潔器中的至少一些可連動,或個別進行不同的運動。只要是可去除夾持器及/或片狀耙上的殘留基板材料,本發明實施例不限定清潔器的數量、設置方式及/或彼此間的運動關係。 In summary, the robot arm of the substrate transfer system of the embodiment of the present invention can enter the cleaning box after the substrate is released to remove the residual substrate material on the holder and/or the sheet. In this way, it is possible to avoid excessive damage to the held substrate during the next clamping process. Additionally, the substrate transport system can include one or more cleaners that are movably or fixedly disposed within the cleaning chamber to remove residual substrate material from the holder and/or sheet. In addition, one or some of the plurality of cleaners are movably disposed while the other or others are fixedly disposed. At least some of the plurality of movable cleaners may be linked or individually operated differently. The embodiments of the present invention do not limit the number, arrangement, and/or motion relationship of the cleaners as long as the residual substrate material on the holder and/or the sheet-like crucible can be removed.

綜上所述,雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100‧‧‧基板傳輸系統 100‧‧‧Substrate transmission system

110‧‧‧機械手臂 110‧‧‧ Robotic arm

120‧‧‧片狀耙 120‧‧‧Piece

140‧‧‧清潔箱 140‧‧‧Clean box

141‧‧‧底壁 141‧‧‧ bottom wall

141b‧‧‧底面 141b‧‧‧ bottom

142‧‧‧側壁 142‧‧‧ side wall

140a‧‧‧入口 140a‧‧‧ entrance

150‧‧‧清潔器 150‧‧‧cleaner

150a‧‧‧噴氣孔 150a‧‧‧jet hole

160‧‧‧供氣源 160‧‧‧ gas supply

170‧‧‧排氣元件 170‧‧‧Exhaust components

G‧‧‧清潔氣體 G‧‧‧cleaning gas

H1‧‧‧長度 H1‧‧‧ length

S1‧‧‧行程 S1‧‧‧ itinerary

Claims (11)

一種基板傳輸系統,包括:一機械手臂;一夾持器,設於該機械手臂的一端,該夾持器用以夾持一基板;一清潔箱;以及一清潔器,設於該清潔箱內,用以清潔進入該清潔箱內的該夾持器。 A substrate transfer system comprising: a robot arm; a holder disposed at one end of the robot arm, the holder for holding a substrate; a cleaning box; and a cleaner disposed in the cleaning box Used to clean the holder into the cleaning box. 如申請專利範圍第1項所述之基板傳輸系統,其中該清潔器具有一噴氣孔;當該夾持器進入該清潔箱內,該噴氣孔對準該夾持器。 The substrate transfer system of claim 1, wherein the cleaner has a gas vent; the gas vent is aligned with the holder when the holder enters the cleaning box. 如申請專利範圍第1項所述之基板傳輸系統,更包括:一排氣元件,與該清潔箱連通,且用以排出該清潔箱內的雜質。 The substrate transfer system of claim 1, further comprising: a venting element communicating with the cleaning box and for discharging impurities in the cleaning box. 如申請專利範圍第3項所述之基板傳輸系統,其中該清潔箱具有一入口,該基板傳輸系統更包括一排氣元件,該排氣元件與該入口係相對配置。 The substrate transfer system of claim 3, wherein the cleaning box has an inlet, the substrate transfer system further comprising a venting element, the venting element being disposed opposite the inlet system. 如申請專利範圍第1項所述之基板傳輸系統,包括複數 個該清潔器,該些清潔器排列成至少一排。 The substrate transfer system as described in claim 1 of the patent application, including plural The cleaners are arranged in at least one row. 如申請專利範圍第1項所述之基板傳輸系統,更包括:複數個片狀耙,該夾持器位於相鄰二片狀耙之間;其中,該清潔器可動地位於該清潔箱內,且該清潔器的移動行程實質上等於或大於該片狀耙的長度。 The substrate transfer system of claim 1, further comprising: a plurality of sheet-like crucibles, the holder being located between adjacent two sheets of crucibles; wherein the cleaner is movably located in the cleaning box, And the movement stroke of the cleaner is substantially equal to or greater than the length of the sheet-like crucible. 如申請專利範圍第1項所述之基板傳輸系統,更包括:一供氣源,連通該清潔器,用以提供該清潔器一清潔氣體。 The substrate transfer system of claim 1, further comprising: a gas supply source connected to the cleaner for providing the cleaner-cleaning gas. 如申請專利範圍第7項所述之基板傳輸系統,其中該清潔氣體係惰性氣體。 The substrate transport system of claim 7, wherein the clean gas system is an inert gas. 如申請專利範圍第1項所述之基板傳輸系統,其中該清潔器可滑動地設於該清潔箱內。 The substrate transfer system of claim 1, wherein the cleaner is slidably disposed in the cleaning box. 如申請專利範圍第9項所述之基板傳輸系統,更包括:一滑軌,設於該清潔箱內;其中,該清潔器可滑動地設於該滑軌。 The substrate transfer system of claim 9, further comprising: a slide rail disposed in the cleaning box; wherein the cleaner is slidably disposed on the slide rail. 如申請專利範圍第10項所述之基板傳輸系統,其中該清潔箱具有一入口及一底面,該滑軌延伸於該入口與該底面之 間。 The substrate transfer system of claim 10, wherein the cleaning box has an inlet and a bottom surface, the sliding rail extending from the inlet and the bottom surface between.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622429B (en) * 2017-03-31 2018-05-01 中國鋼鐵股份有限公司 Jet stirring system and method for stirring precipitation in liquid

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622429B (en) * 2017-03-31 2018-05-01 中國鋼鐵股份有限公司 Jet stirring system and method for stirring precipitation in liquid

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