TWI622429B - Jet stirring system and method for stirring precipitation in liquid - Google Patents
Jet stirring system and method for stirring precipitation in liquid Download PDFInfo
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- TWI622429B TWI622429B TW106111241A TW106111241A TWI622429B TW I622429 B TWI622429 B TW I622429B TW 106111241 A TW106111241 A TW 106111241A TW 106111241 A TW106111241 A TW 106111241A TW I622429 B TWI622429 B TW I622429B
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Abstract
本發明提出一種氣體噴射攪拌系統以及液體中沉積物的攪拌方法,其中氣體噴射攪拌系統可包含容置槽以及氣體噴射攪拌裝置。所述氣體噴射攪拌裝置可包含驅動單元、固定架、至少一噴氣單元以及撥水板。所述攪拌方法係利用驅動單元驅動噴氣單元及撥水板來回移動於容置槽中,以進行噴氣步驟以及收集步驟。 The invention provides a gas jet stirring system and a stirring method for deposits in a liquid, wherein the gas jet stirring system can comprise a receiving tank and a gas jet stirring device. The gas jet agitation device may include a drive unit, a mount, at least one jet unit, and a water deflector. The agitation method utilizes a driving unit to drive the jet unit and the water deflector to move back and forth in the accommodating groove to perform the jetting step and the collecting step.
Description
本發明是有關於一種氣體噴射攪拌系統以及攪拌方法,且特別是有關於一種應用於攪拌液體中沉積物的氣體噴射攪拌系統以及攪拌方法,藉以改善沉積物於液體中的分佈均勻性、延長設備使用壽命,並減少人力成本。 The invention relates to a gas jet stirring system and a stirring method, and particularly relates to a gas jet stirring system and a stirring method applied to agitating a liquid in a liquid, thereby improving the uniformity of distribution of the deposit in the liquid and extending the device. Service life and reduce labor costs.
鋼鐵材料為確認表面有無裂縫,一般會施以非破壞性之磁粉探傷檢驗。上述探傷檢驗係利用於鋼鐵材料表面淋灑含有螢光磁粉之液體並配合交直流電,使螢光磁粉因磁力線作用聚集於裂縫中,並以人工在暗室中利用紫外線燈探照而顯現裂縫。使用後剩餘的含有螢光磁粉之液體經回流系統回收並可再使用。 In order to confirm the presence or absence of cracks on the surface of the steel material, non-destructive magnetic particle inspection is generally applied. The above-mentioned flaw detection test utilizes the surface of the steel material to sprinkle the liquid containing the fluorescent magnetic powder and cooperates with the AC and DC power, so that the fluorescent magnetic powder is concentrated in the crack due to the magnetic force line, and the crack is revealed by artificially searching in the dark room by using the ultraviolet lamp. The remaining phosphor-containing liquid remaining after use is recovered by a reflux system and can be reused.
然而,上述淋灑於鋼鐵材料表面的含螢光磁粉之液體因長期儲存於容置槽中,而易發生螢光磁粉沉澱於容置槽底部、黏著於槽體側壁或是互相沾黏而聚集等情況,使得液體中的螢光磁粉分佈不均,造成淋灑於鋼鐵材料表面的 螢光磁粉濃度過高或過低,而有無法完全顯現裂縫外型之缺點。上述情況即使透過抽吸幫浦的循環抽吸,也無法有效地改善。 However, the above-mentioned liquid containing the fluorescent magnetic powder sprayed on the surface of the steel material is stored in the accommodating tank for a long period of time, and the fluorescent magnetic powder is likely to precipitate at the bottom of the accommodating groove, adhere to the side wall of the tank or adhere to each other and aggregate. In other cases, the phosphor powder in the liquid is unevenly distributed, causing it to spill on the surface of the steel material. The concentration of the fluorescent magnetic powder is too high or too low, and there is a disadvantage that the appearance of the crack cannot be completely exhibited. The above situation cannot be effectively improved even by the circulation suction of the suction pump.
此外,在一般常見的水處理過程中,長期利用自然沉降法使水中的泥沙堆積於沉降槽的底部,但長時間堆積的泥沙不易清理,造成沉降槽容積減少的缺點。 In addition, in the common water treatment process, the natural sedimentation method is used to accumulate the sediment in the water at the bottom of the sedimentation tank, but the sediment accumulated for a long time is not easy to be cleaned, which causes the volume of the sedimentation tank to be reduced.
鑒於上述的問題,一般利用人工以刷子攪拌容置槽中的沉積物(螢光磁粉或泥沙等),以均勻化液體中的沉積物或是清理槽體。然而,刷子上的刷毛在使用時容易脫落,造成設備的管線阻塞或損壞等缺點,進而減少設備的使用壽命,且使用人工也增加人力成本。 In view of the above problems, it is common to manually use a brush to agitate the deposit (fluorescent magnetic powder or sediment, etc.) in the receiving tank to homogenize the deposit in the liquid or to clean the tank. However, the bristles on the brush are easily detached during use, which causes defects such as blockage or damage of the pipeline of the device, thereby reducing the service life of the device, and labor is also increased by using labor.
尚有一些常見的方法係使用定點式的氣體攪拌,其係將氣體噴孔固設於容置槽的側壁或是中央,以提供攪拌氣體。然而定點式的氣體無法攪拌邊緣或角落的沉積物,因此攪拌效果不佳。 There are some common methods for using fixed-point gas agitation, which is to fix the gas orifice to the side wall or the center of the accommodating tank to provide a stirring gas. However, the fixed-point gas cannot stir the deposits on the edges or corners, so the stirring effect is not good.
因此,目前亟需提出一種攪拌系統以及攪拌方法,其可以達到良好的攪拌效果,並改善習知攪拌系統以及攪拌方法所產生的刷毛阻塞、管線破壞、高人力成本以及低設備使用壽命的缺點。 Therefore, there is an urgent need to provide a stirring system and a stirring method which can achieve a good stirring effect and improve the disadvantages of the conventional stirring system and the stirring method, such as bristle blockage, pipeline damage, high labor cost, and low equipment service life.
因此,本發明之一態樣在於提供一種氣體噴射攪拌系統,其係利用密集設置的噴孔提供噴射氣體,以攪拌容置槽底部的沉積物。 Accordingly, it is an aspect of the present invention to provide a gas jet agitation system that utilizes a densely disposed orifice to provide a jet of gas to agitate deposits at the bottom of the containment tank.
本發明之另一態樣在於提供一種液體中沉積物的攪拌方法,其係應用上述氣體噴射攪拌系統進行。 Another aspect of the present invention provides a method of agitating a deposit in a liquid by using the above gas jet agitation system.
根據本發明之上述態樣,提出一種氣體噴射攪拌系統。在一實施例中,上述氣體噴射攪拌系統可包含容置槽以及氣體噴射攪拌裝置。容置槽的底部具有排液口。上述氣體噴射攪拌裝置係設於容置槽中,且所述氣體噴射攪拌裝置可包含驅動單元、固定架、至少一噴氣單元以及撥水板。驅動單元係設於前述排液口的正上方,且驅動單元可包含驅動件、滑軌以及L型滑動件,其中驅動件可包含伸縮桿,L型滑動件係設於所述滑軌上,L型滑動件具有相互垂直的第一部分以及第二部分,且第一部分固接伸縮桿。固定架具有相對的第一端以及第二端,其中第一端連接前述第二部份。每個噴氣單元係固設於固定架上,且每個噴氣單元可包含噴氣管路組以及輸氣管。噴氣管路組可包含至少一噴氣管,且每一個至少一噴氣管彼此連通。每一個噴氣管的兩末端分別係封閉的或連通另一個噴氣管。每一個噴氣管具有複數個第一噴孔,且複數個第一噴孔係朝向底部。輸氣管係連通打氣幫浦與噴氣管路組。前述撥水板係設於固定架的第二端。 According to the above aspect of the invention, a gas jet stirring system is proposed. In an embodiment, the gas jet stirring system may include a receiving tank and a gas jet stirring device. The bottom of the accommodating groove has a liquid discharge port. The gas jet stirring device is disposed in the accommodating tank, and the gas jet stirring device may include a driving unit, a fixing frame, at least one jet unit, and a water deflector. The driving unit is disposed directly above the liquid discharge port, and the driving unit may include a driving member, a sliding rail and an L-shaped sliding member, wherein the driving member may include a telescopic rod, and the L-shaped sliding member is disposed on the sliding rail. The L-shaped slider has a first portion and a second portion that are perpendicular to each other, and the first portion is fixed to the telescopic rod. The mounting bracket has opposite first ends and second ends, wherein the first ends are coupled to the second portion. Each jet unit is fixed to the mount, and each jet unit may include a jet line set and a gas line. The jet line set can include at least one jet tube, and each of the at least one jet tubes is in communication with each other. The ends of each of the lances are closed or connected to another lance. Each of the gas injection tubes has a plurality of first orifices, and the plurality of first orifices are oriented toward the bottom. The gas pipeline is connected to the pumping pump and the jet line group. The water-repellent board is disposed at the second end of the fixing frame.
依據本發明之一實施例,噴氣管路組可具有複數個第二噴孔,其係設於每一個噴氣管上,且每個第二噴孔係面對容置槽的側壁或底部。 In accordance with an embodiment of the present invention, the jet line set can have a plurality of second orifices that are threaded onto each of the jet tubes and each of the second orifices faces the side or bottom of the receiving trough.
依據本發明之一實施例,前述第一噴孔與底部之間的距離係大於0至1公分。 According to an embodiment of the invention, the distance between the first nozzle hole and the bottom portion is greater than 0 to 1 cm.
依據本發明之一實施例,前述排液口係與抽吸 幫浦連通。 According to an embodiment of the invention, the liquid discharge port and the suction The pump is connected.
依據本發明之一實施例,前述噴氣管路組可包含複數個噴氣管,噴氣管係相互連通而構成三維立體架構,且三維立體架構符合容置槽之底部的形狀。 According to an embodiment of the present invention, the jet pipe group may include a plurality of jet pipes, and the jet pipes are connected to each other to form a three-dimensional structure, and the three-dimensional structure conforms to the shape of the bottom of the receiving groove.
依據本發明之一實施例,三維立體架構包含長方體、正方體或梯形體。 According to an embodiment of the invention, the three-dimensional framework comprises a cuboid, a cube or a trapezoid.
依據本發明之一實施例,撥水板係電性連接至控制單元,以控制撥水板之板面與底部之夾角為0度或大於0度至90度。 According to an embodiment of the invention, the water-repellent plate is electrically connected to the control unit to control the angle between the plate surface and the bottom of the water-repellent plate to be 0 degrees or greater than 0 degrees to 90 degrees.
根據本發明之上述態樣,提出一種液體中沉積物的攪拌方法。在一實施例中,所述攪拌方法係應用前述之氣體噴射攪拌系統進行,且攪拌方法係首先利用驅動單元驅動噴氣單元以及撥水板,於容置槽中來回移動。接著,利用所述噴氣單元對沉積物進行噴氣步驟。然後,利用撥水板進行收集步驟,其中所述收集步驟可包含:當撥水板朝遠離驅動單元的方向移動時,使撥水板的板面平行於容置槽的底部;以及,當撥水板朝向接近驅動單元的方向移動時,使撥水板的板面與底部之夾角為大於0至90度。 According to the above aspect of the invention, a method of agitating a deposit in a liquid is proposed. In one embodiment, the agitation method is performed by using the gas jet agitation system described above, and the agitation method firstly drives the jet unit and the water-repellent plate by the drive unit to move back and forth in the accommodating groove. Next, the deposit is subjected to a jetting step using the jet unit. Then, the collecting step is performed by using a water-repellent board, wherein the collecting step may include: when the water-repellent board moves away from the driving unit, the board surface of the water-repellent board is parallel to the bottom of the accommodating groove; and, when dialing When the water plate moves toward the driving unit, the angle between the plate surface and the bottom of the water-repellent plate is greater than 0 to 90 degrees.
依據本發明之一實施例,所述攪拌方法在前述收集步驟後,更包含利用抽吸幫浦,從容置槽之底部的排液口抽取含有沉積物之液體。 According to an embodiment of the present invention, after the collecting step, the agitation method further comprises extracting a liquid containing a deposit from a liquid discharge port at the bottom of the accommodating groove by using a suction pump.
依據本發明之一實施例,所述沉積物包含磁粉或泥沙。 According to an embodiment of the invention, the deposit comprises magnetic powder or sediment.
應用本發明之氣體噴射攪拌系統及攪拌方法, 可自動化地攪拌容置槽中的液體以及底部的沉積物,而有減少人力成本、有效地使沉積物均勻分佈於容置槽中,並可避免習知攪拌方法因刷毛阻塞或捲入設備管線中,從而增加設備的使用壽命等之優點。 Applying the gas jet stirring system and the stirring method of the present invention, The liquid in the accommodating tank and the sediment in the bottom can be automatically stirred, the labor cost is reduced, the deposit is evenly distributed in the accommodating tank, and the conventional stirring method can be avoided due to clogging of the bristles or being involved in the equipment pipeline. Medium, thereby increasing the life of the device and the like.
100‧‧‧氣體噴射攪拌系統 100‧‧‧ gas jet mixing system
110、510‧‧‧容置槽 110, 510‧‧‧ accommodating slots
111、511‧‧‧底部 111, 511‧‧‧ bottom
113‧‧‧排液口 113‧‧‧Draining port
115‧‧‧側壁 115‧‧‧ side wall
120、200、300‧‧‧氣體噴射裝置 120, 200, 300‧‧‧ gas injection device
121、210、310‧‧‧驅動單元 121, 210, 310‧‧‧ drive units
123、220、320‧‧‧固定架 123, 220, 320‧‧‧ fixed frame
125、230、330‧‧‧噴氣單元 125, 230, 330‧‧‧ jet units
127、240、340‧‧‧撥水板 127, 240, 340‧‧ ‧ water board
211、311‧‧‧驅動件 211, 311‧‧‧ drive parts
213、313‧‧‧伸縮桿 213, 313‧‧‧ Telescopic rod
215、315‧‧‧滑軌 215, 315‧‧ ‧ slide rails
217、317‧‧‧L型滑動件 217, 317‧‧‧L type slides
217A、317A‧‧‧第一部份 217A, 317A‧‧‧ first part
217B、317B‧‧‧第二部份 217B, 317B‧‧‧ second part
221、321‧‧‧第一端 221, 321‧‧‧ first end
223、323‧‧‧第二端 223, 323‧‧‧ second end
231、331、431‧‧‧噴氣管路組 231, 331, 431 ‧ ‧ jet line group
232、332、532‧‧‧第一噴孔 232, 332, 532‧‧‧ first orifice
233、333‧‧‧輸氣管 233, 333‧‧‧ gas pipeline
235、335、335A、335B、335C、335D、435、535‧‧‧噴氣管 235, 335, 335A, 335B, 335C, 335D, 435, 535‧‧ ‧ jet tube
237、337‧‧‧末端 End of 237, 337‧‧
241‧‧‧板面 241‧‧‧ board
334‧‧‧第二噴孔 334‧‧‧Second orifice
550‧‧‧噴射氣體 550‧‧‧Injection gas
600‧‧‧方法 600‧‧‧ method
610‧‧‧利用驅動單元驅動噴氣單元以及撥水板,來回移動於容置槽中 610‧‧‧Using the drive unit to drive the jet unit and the water deflector, moving back and forth in the receiving slot
620‧‧‧利用噴氣單元對沉積物進行噴氣步驟 620‧‧‧Using a jet unit to jet the sediment
630‧‧‧利用該撥水板進行收集步驟 630‧‧‧Use the water deflector for collection steps
A-A’‧‧‧剖線 A-A’‧‧‧ cut line
為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之詳細說明如下: The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood.
[圖1]係繪示根據本發明之一實施例所述之氣體噴射攪拌系統之立體示意圖。 1 is a schematic perspective view of a gas jet stirring system according to an embodiment of the present invention.
[圖2]係繪示根據本發明之一實施例所述之氣體噴射攪拌裝置的立體示意圖。 Fig. 2 is a schematic perspective view showing a gas jet stirring apparatus according to an embodiment of the present invention.
[圖3A]係繪示根據本發明之另一實施例所述之氣體噴射裝置的立體示意圖。 Fig. 3A is a perspective view showing a gas injection device according to another embodiment of the present invention.
[圖3B]係繪示本發明之圖3A之氣體噴射裝置的噴氣管路組的立體示意圖。 Fig. 3B is a perspective view showing a jet line group of the gas injection device of Fig. 3A of the present invention.
[圖3C]係繪示本發明之圖3A之氣體噴射裝置容置於容置槽中時,沿剖線A-A’的剖面示意圖。 Fig. 3C is a schematic cross-sectional view along the line A-A' when the gas injection device of Fig. 3A of the present invention is housed in a accommodating groove.
[圖4]係繪示根據本發明之一實施例所述之噴氣管路組的立體示意圖。 Fig. 4 is a perspective view showing a jet pipe group according to an embodiment of the present invention.
[圖5]係繪示根據本發明之一實施例所示之設有第一噴孔之噴氣管的側視圖。 Fig. 5 is a side view showing a gas injection tube provided with a first orifice according to an embodiment of the present invention.
[圖6]係繪示根據本發明之一實施例所述之液體中沉積物的攪拌方法的示意流程圖。 Fig. 6 is a schematic flow chart showing a method of stirring a deposit in a liquid according to an embodiment of the present invention.
本發明之一態樣在於提供一種氣體噴射攪拌系統,其可自動化地利用氣體噴射攪拌容置於容置槽中的液體及槽體底部的沉積物,並利用所設置的撥水板進一步均勻化沉積物於液體中的分佈。 An aspect of the present invention provides a gas jet agitation system that can automatically use a gas jet to agitate a liquid contained in a accommodating tank and a sediment at a bottom of the tank body, and further homogenize using the set water deflector. The distribution of sediments in the liquid.
本發明之另一態樣在於提供一種攪拌方法,其係應用上述氣體噴射攪拌系統,來回移動噴氣單元及撥水板、進行噴氣步驟以及收集步驟,從而可有效地使容置槽之液體中的沉積物均勻地分佈。 Another aspect of the present invention provides a stirring method for applying the above-described gas jet stirring system, moving a jet unit and a water deflecting plate back and forth, performing a jetting step, and a collecting step, thereby effectively making a liquid in the receiving tank The deposits are evenly distributed.
首先請先參考圖1,其係繪示本發明之一實施例所述之氣體噴射攪拌系統之立體示意圖。如圖1所示,氣體噴射攪拌系統100包含容置槽110以及設於容置槽110中的氣體噴射攪拌裝置120,其中容置槽110的底部111具有排液口113,氣體噴射攪拌裝置120包含驅動單元121、固定架123、至少一噴氣單元125以及撥水板127,且驅動單元121係設於排液口113的正上方。 First, please refer to FIG. 1 , which is a schematic perspective view of a gas jet stirring system according to an embodiment of the present invention. As shown in FIG. 1 , the gas jet stirring system 100 includes a accommodating tank 110 and a gas jet stirring device 120 disposed in the accommodating tank 110 . The bottom portion 111 of the accommodating tank 110 has a liquid discharge port 113 and a gas jet stirring device 120 . The driving unit 121, the fixing frame 123, the at least one air blowing unit 125, and the water-repellent plate 127 are included, and the driving unit 121 is disposed directly above the liquid discharge port 113.
接下來,請參考圖2,其係繪示本發明之一實施例所述之氣體噴射攪拌裝置的立體示意圖。如圖2所示,氣體噴射攪拌裝置200包含驅動單元210、固定架220、噴氣單元230以及撥水板240。驅動單元210包含驅動件211、滑軌215以及L型滑動件217,其中驅動件211更包含伸縮桿213,且L型滑動件217係設於滑軌215上。L型滑動件217具有相互垂直的第一部份217A和第二部份217B,且第一部 份217A與伸縮桿213固接。 Next, please refer to FIG. 2, which is a perspective view of a gas jet stirring device according to an embodiment of the present invention. As shown in FIG. 2, the gas jet stirring device 200 includes a driving unit 210, a holder 220, a jet unit 230, and a water pad 240. The driving unit 210 includes a driving member 211, a sliding rail 215 and an L-shaped sliding member 217. The driving member 211 further includes a telescopic rod 213, and the L-shaped sliding member 217 is disposed on the sliding rail 215. The L-shaped slider 217 has a first portion 217A and a second portion 217B that are perpendicular to each other, and the first portion The portion 217A is fixed to the telescopic rod 213.
固定架220具有相對之第一端221和第二端223,其中第一端221與L型滑動件217的第二部份217B連接。 The holder 220 has opposite first and second ends 221, 223, wherein the first end 221 is coupled to the second portion 217B of the L-shaped slider 217.
噴氣單元230包含噴氣管路組231以及輸氣管233。噴氣管路組231包含至少一噴氣管235,在此實施例中,噴氣管路組231包含一個噴氣管235,其中噴氣管235的兩末端237分別係封閉的。每一個噴氣管235具有密集設置的複數個第一噴孔232,且每個第一噴孔232係朝向如圖1所示之容置槽110的底部111。在一實施例中,第一噴孔232與底部111的距離為大於0至1公分。特別說明的是,上述距離係為使噴射氣體可有效攪拌容置槽110底部的沉積物,倘若上述距離過大,會造成噴射氣體的攪拌效果不佳,無法使沉積物均勻分佈於容置槽110的液體中。輸氣管233係連通打氣幫浦(未繪示)以及噴氣管路組231,以提供噴射氣體攪拌容置槽底部的沉積物。 The air injection unit 230 includes a jet line group 231 and a gas delivery pipe 233. The jet line set 231 includes at least one lance tube 235. In this embodiment, the lance line set 231 includes a lance tube 235, wherein the ends 237 of the lance tube 235 are each closed. Each of the gas injection tubes 235 has a plurality of first injection holes 232 arranged in a dense manner, and each of the first injection holes 232 faces the bottom portion 111 of the accommodation groove 110 as shown in FIG. In one embodiment, the distance between the first orifice 232 and the bottom 111 is greater than 0 to 1 centimeter. Specifically, the distance is such that the spray gas can effectively stir the deposit at the bottom of the accommodating groove 110. If the distance is too large, the stirring effect of the spray gas is not good, and the deposit cannot be uniformly distributed in the accommodating groove 110. In the liquid. The gas pipe 233 is connected to a pumping pump (not shown) and a jet line group 231 to provide a deposit of the gas at the bottom of the accommodating tank.
撥水板240係活設於固定架220的第二端223。在一實施例中,活設的撥水板240可與控制單元(未繪示)電性連接,以控制撥水板240的板面241與如圖1所示之容置槽110的底部111之夾角。在一實施例中,板面241與底部111的夾角可為0度,意即板面241與底部111平行。在另一實施例中,板面241與底部111的夾角可為大於0度至90度,較佳的,所述夾角可為90度,意即板面241垂直底部111。 The water deflector 240 is operatively disposed on the second end 223 of the fixing frame 220. In an embodiment, the water-repellent water-repellent plate 240 can be electrically connected to a control unit (not shown) to control the surface 241 of the water-repellent plate 240 and the bottom portion 111 of the accommodating groove 110 as shown in FIG. The angle between them. In an embodiment, the angle between the plate surface 241 and the bottom portion 111 may be 0 degrees, that is, the plate surface 241 is parallel to the bottom portion 111. In another embodiment, the angle between the plate surface 241 and the bottom portion 111 may be greater than 0 degrees to 90 degrees. Preferably, the angle may be 90 degrees, that is, the plate surface 241 is perpendicular to the bottom portion 111.
接下來,請參考圖3A,其係繪示根據本發明之另一實施例所述之氣體噴射裝置。如圖3A所示,氣體噴射裝置300包含驅動單元310、固定架320、噴氣單元330以及撥水板340,其中驅動單元310、固定架320以及撥水板340係與圖2之氣體噴射裝置200的驅動單元210、固定架220以及撥水板240相似,故此處不另贅述。 Next, please refer to FIG. 3A, which illustrates a gas injection device according to another embodiment of the present invention. As shown in FIG. 3A, the gas injection device 300 includes a driving unit 310, a fixing frame 320, a jet unit 330, and a water-repellent plate 340, wherein the driving unit 310, the fixing frame 320, and the water-repellent plate 340 are coupled to the gas injection device 200 of FIG. The driving unit 210, the fixing frame 220 and the water-repellent plate 240 are similar, so no further details are provided here.
氣體噴射裝置300之噴氣單元330包含噴氣管路組331以及輸氣管333。噴氣管路組331包含複數個噴氣管335,每個噴氣管335的二末端337為分別封閉的或連通另一個噴氣管335,且每一個噴氣管335係彼此連通。 The jet unit 330 of the gas injection device 300 includes a jet line group 331 and a gas line 333. The jet line set 331 includes a plurality of gas tubes 335, the two ends 337 of each of the gas tubes 335 being respectively closed or communicating with another gas tube 335, and each of the gas tubes 335 is in communication with each other.
請參考圖3B,其係繪示本發明圖3A之氣體噴射裝置的噴氣管路組331的立體示意圖。如圖3B所示,噴氣管路組331包含複數個噴氣管(例如噴氣管335A、噴氣管335B、噴氣管335C以及335D),其係分別架構為一梯形體之三維立體架構,以符合如圖1所示之容置槽110的U型底部111的形狀。請一併參考圖3B和圖3C,其中圖3C係繪示圖3A之氣體噴射裝置容置於容置槽中時,沿剖線A-A’的剖面示意圖。具體而言,噴氣管335A係設置以鄰近如圖1所示之容置槽110的底部111,而噴氣管335B和噴氣管335C係依序朝遠離底部111的方向疊置架構,並以噴氣管335D作為連接。為符合底部111的形狀,噴氣管335A與噴氣管335C具有不同長度。本發明之噴氣管的長度並無特別限制,惟以噴氣管上的噴孔(第一噴孔332或第二噴孔334)距離容置槽的底部或側壁越近越佳,例如可距離大於0至1公分。 Please refer to FIG. 3B, which is a perspective view of the air jet line set 331 of the gas injection device of FIG. 3A of the present invention. As shown in FIG. 3B, the jet line set 331 includes a plurality of jet tubes (for example, a jet tube 335A, a jet tube 335B, a jet tube 335C, and a 335D), which are respectively constructed as a trapezoidal three-dimensional structure to conform to the figure. 1 shows the shape of the U-shaped bottom 111 of the receiving groove 110. Referring to FIG. 3B and FIG. 3C together, FIG. 3C is a cross-sectional view along the line A-A' when the gas injection device of FIG. 3A is accommodated in the accommodating groove. Specifically, the lance tube 335A is disposed adjacent to the bottom portion 111 of the accommodating groove 110 as shown in FIG. 1, and the lance tube 335B and the lance tube 335C are sequentially stacked in a direction away from the bottom portion 111, and the lance tube is used. 335D as a connection. To conform to the shape of the bottom portion 111, the lance tube 335A has a different length from the lance tube 335C. The length of the lance tube of the present invention is not particularly limited, but the closer the nozzle hole (the first nozzle hole 332 or the second nozzle hole 334) on the lance tube is to the bottom or the side wall of the accommodating groove, for example, the distance may be greater than 0 to 1 cm.
在一實施例中,噴氣管335A上設有複數個第一噴孔332,每一個第一噴孔332係朝向容置槽110的底部111,以提供噴射氣體至容置槽底部,並攪拌沉積物,且第一噴孔332與底部111的距離為大於0至1公分。在另一實施例中,複數個第一噴孔332可設於噴氣管335A上,每一個第一噴孔332係朝向容置槽110的底部111,且第一噴孔332與底部111的距離為大於0至1公分,且噴氣管335A、噴氣管335B、噴氣管335C及/或335D上選擇性地設有複數個第二噴孔334,以提供更多層次的攪拌,其中每個第二噴孔334係面對如圖1之容置槽110的側壁115或底部111。 In one embodiment, the plurality of first injection holes 332 are disposed on the vent tube 335A, and each of the first injection holes 332 is directed toward the bottom portion 111 of the accommodating groove 110 to provide a jet of gas to the bottom of the accommodating groove, and is stirred and deposited. And the distance between the first injection hole 332 and the bottom portion 111 is greater than 0 to 1 cm. In another embodiment, a plurality of first nozzle holes 332 may be disposed on the air nozzle 335A, each of the first nozzle holes 332 is directed toward the bottom portion 111 of the accommodating groove 110, and the distance between the first nozzle hole 332 and the bottom portion 111 is More than 0 to 1 cm, and a plurality of second orifices 334 are selectively provided on the gas pipe 335A, the gas pipe 335B, the gas pipe 335C and/or 335D to provide more levels of agitation, wherein each second The nozzle hole 334 faces the side wall 115 or the bottom portion 111 of the receiving groove 110 of FIG.
接著請參考圖4,其係繪示根據本發明之一實施例所述之噴氣管路組的立體示意圖。如圖4所示,噴氣管路組431之複數個噴氣管435可構成長方體之三維立體架構,以符合方型槽(未繪示)底部之形狀。特別說明的是,本發明圖2至圖4雖以特定形狀之噴氣管路組進行說明,然而其並非用以限制本發明之範圍,本發明之噴氣管路組可為噴氣管相互連通而構成的三維立體架構,且以所述三維立體架構符合容置槽之底部形狀為限。在一些實施例中,所述三圍立體架構包含長方體、正方體或梯形體。 Next, please refer to FIG. 4, which is a perspective view of a jet line set according to an embodiment of the invention. As shown in FIG. 4, the plurality of jet tubes 435 of the jet line set 431 can form a three-dimensional structure of the rectangular parallelepiped to conform to the shape of the bottom of the square groove (not shown). Specifically, the present invention is illustrated in FIG. 2 to FIG. 4 in a specific shape of a jet line group. However, it is not intended to limit the scope of the present invention. The jet line group of the present invention may be configured such that the gas tubes are connected to each other. The three-dimensional structure is limited to the shape of the bottom of the accommodating groove. In some embodiments, the three-dimensional structure comprises a cuboid, a cube or a trapezoid.
圖5係繪示根據本發明之一實施例所示之設有第一噴孔532之噴氣管535的側視圖。如圖5所示,噴氣管535上的第一噴孔532係密集地設置。本發明此處所稱之「密集設置」係指當噴射氣體550噴出並接觸到容置槽510之底部511時,二相鄰之第一噴孔532的噴射氣體550可互相重 疊。 Figure 5 is a side elevational view of a gas jet tube 535 having a first orifice 532 shown in accordance with one embodiment of the present invention. As shown in FIG. 5, the first injection holes 532 on the gas injection pipe 535 are densely arranged. The term "dense setting" as used herein means that when the injection gas 550 is ejected and contacts the bottom 511 of the accommodating groove 510, the ejection gas 550 of the two adjacent first injection holes 532 may be heavy with each other. Stack.
特別說明的是,雖然在上述實施例中,氣體噴射裝置僅繪示一個噴氣單元(例如噴氣單元125、噴氣單元230或噴氣單元330),然而在其他實施例中,可根據使用需求而使用2個或更多的噴氣單元,本發明並不以圖式所繪示的數量為限。 In particular, although in the above embodiment, the gas injection device only shows one jet unit (for example, the jet unit 125, the jet unit 230 or the jet unit 330), in other embodiments, it can be used according to the use requirement. The present invention is not limited to the number shown in the drawings.
接著請參考圖6,其係繪示根據本發明之一實施例所述之液體中沉積物的攪拌方法的示意流程圖。方法600係應用如前述圖1之氣體噴射攪拌系統100來進行。在一實施例中,如步驟610所示,首先利用驅動單元121驅動固定架123上的噴氣單元125和撥水板127,來回移動於容置槽110中,其中固定架123之移動距離可利用滑軌(如圖2所示之滑軌215)根據容置槽110之尺寸進行調整,本發明此處並無特別限制。 Next, please refer to FIG. 6, which is a schematic flow chart of a method for agitating a deposit in a liquid according to an embodiment of the present invention. The method 600 is performed using the gas jet agitation system 100 of Figure 1 above. In an embodiment, as shown in step 610, the air blowing unit 125 and the water-repellent plate 127 on the mounting frame 123 are first driven by the driving unit 121 to move back and forth in the receiving slot 110, wherein the moving distance of the fixing frame 123 can be utilized. The slide rails (the slide rails 215 shown in FIG. 2) are adjusted according to the size of the accommodating slots 110, and the present invention is not particularly limited herein.
接著,如步驟620所示,利用噴氣單元125對容置槽110底部111的沉積物(未繪示)進行噴氣步驟。在一實施例中,沉積物可例如為磁粉或泥沙等比重大於水之易產生沉積的沉積物。上述噴氣步驟可包含由第一噴孔(例如圖3B之第一噴孔332)提供噴射氣體,以攪拌沉積於底部111的沉積物。在另一實施例中,上述噴氣步驟可更包含由第二噴孔(例如圖3B之第二噴孔334)攪拌液體中層以及容置槽110之側壁115上的沉積物。 Next, as shown in step 620, a deposition step (not shown) of the bottom portion 111 of the accommodating groove 110 is performed by the air blowing unit 125. In one embodiment, the deposit may be, for example, a deposit such as magnetic powder or sediment that has a specific gravity greater than that of water. The above-described jetting step may include providing a jet of gas from a first orifice (e.g., the first orifice 332 of FIG. 3B) to agitate the deposit deposited on the bottom 111. In another embodiment, the step of blowing may further comprise agitating the liquid intermediate layer and the deposit on the sidewall 115 of the receiving groove 110 by a second orifice (eg, the second orifice 334 of FIG. 3B).
然後,如步驟630所示,利用撥水板127進行收集步驟,其包含:當撥水板127朝遠離驅動單元121的方向 移動時,使撥水板的板面平行於底部111;以及,當撥水板127朝接近驅動單元121的方向移動時,使撥水板的板面與底部111的夾角為大於0至90度。利用步驟630,可在遠離排液口113的沉積物被噴射氣體攪拌並混合於液體中時,利用與底部111具有大於0至90度夾角的撥水板127,將沉積物收集至排液口113的附近,以加強液體中沉積物的均勻分佈,並使自排液口113抽取的液體中的沉積物濃度固定,利於如前述之磁粉探傷檢驗的進行。 Then, as shown in step 630, the water collecting plate 127 is used to perform a collecting step including: when the water deflecting plate 127 is away from the driving unit 121 When moving, the plate surface of the water-repellent plate is parallel to the bottom portion 111; and when the water-repellent plate 127 is moved toward the driving unit 121, the angle between the plate surface of the water-repellent plate and the bottom portion 111 is greater than 0 to 90 degrees. . With step 630, the deposit can be collected to the drain port by using a water-repellent plate 127 having an angle of more than 0 to 90 degrees from the bottom portion 111 when the deposit away from the liquid discharge port 113 is stirred and mixed in the liquid by the spray gas. In the vicinity of 113, the uniform distribution of the deposit in the liquid is enhanced, and the concentration of the deposit in the liquid extracted from the liquid discharge port 113 is fixed, which facilitates the progress of the magnetic particle flaw detection as described above.
在一實施例中,方法600更包含利用抽吸幫浦(未繪示)從容置槽110的底部111之排液口113抽取含有沉積物的液體。在一實施例中,當沉積物為磁粉時,被抽取出之含有沉積物的液體可應用於鋼鐵材料之表面裂縫探傷檢驗。在另一實施例中,當沉積物為泥沙時,可藉由攪拌沉積物以及抽取出含有沉積物的液體而清洗容置槽。因此,本發明之氣體噴射攪拌系統及液體中沉積物的攪拌方法,可應用於鋼鐵材料之表面裂縫探傷檢驗、水處理之沉降槽的清理等處。 In an embodiment, the method 600 further includes extracting the liquid containing the deposit from the liquid discharge port 113 of the bottom portion 111 of the accommodating groove 110 by using a suction pump (not shown). In one embodiment, when the deposit is magnetic powder, the extracted liquid containing the deposit can be applied to the surface crack inspection test of the steel material. In another embodiment, when the deposit is sediment, the accommodating tank can be cleaned by agitating the deposit and extracting the liquid containing the deposit. Therefore, the gas jet stirring system of the present invention and the stirring method of the deposit in the liquid can be applied to the surface crack flaw detection of the steel material, the cleaning of the settling tank of the water treatment, and the like.
在一些實施例中,可於容置槽中容置乾淨液體,重複上述攪拌方法,以達到進一步清洗容置槽的目的。上述乾淨的液體可包括自來水、清洗用溶劑或上述之組合等。 In some embodiments, the cleaning liquid can be accommodated in the accommodating tank, and the stirring method is repeated to achieve the purpose of further cleaning the accommodating tank. The above clean liquid may include tap water, a solvent for washing, a combination thereof, or the like.
應用本發明之氣體噴射攪拌系統及液體中沉積物的攪拌方法,藉由噴射氣體做為攪拌的媒介,可自動化地攪拌容置槽中的液體以及底部的沉積物,因此可減少人力成 本並避免因刷毛阻塞或捲入設備管線中,以延長設備的使用壽命。此外,藉由密集並貼近容置槽底部設置的噴孔,沉積物可被均勻地攪拌,再藉由撥水板的設置,可進一步加強沉積物的分佈均勻性。 By using the gas jet stirring system of the present invention and the stirring method of the deposit in the liquid, by spraying the gas as a stirring medium, the liquid in the accommodating tank and the sediment at the bottom can be automatically stirred, thereby reducing the manpower This should avoid clogging or getting caught in the equipment pipeline to extend the life of the equipment. In addition, the deposit can be evenly stirred by the nozzle hole which is densely disposed close to the bottom of the accommodating groove, and the distribution uniformity of the deposit can be further enhanced by the setting of the water-repellent plate.
雖然本發明已以數個實施例揭露如上,然其並非用以限定本發明,在本發明所屬技術領域中任何具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of several embodiments, it is not intended to limit the scope of the invention, and the invention may be practiced in various embodiments without departing from the spirit and scope of the invention. The scope of protection of the present invention is defined by the scope of the appended claims.
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TWM278492U (en) * | 2005-04-22 | 2005-10-21 | Shi-Kai Chien | Building offal treatment device |
TWM299746U (en) * | 2006-03-14 | 2006-10-21 | Taiwan Water Corp | Improvement on earth scraping device |
TW201626480A (en) * | 2015-01-09 | 2016-07-16 | 聯華電子股份有限公司 | Substrate transferring system |
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TWM278492U (en) * | 2005-04-22 | 2005-10-21 | Shi-Kai Chien | Building offal treatment device |
TWM299746U (en) * | 2006-03-14 | 2006-10-21 | Taiwan Water Corp | Improvement on earth scraping device |
TW201626480A (en) * | 2015-01-09 | 2016-07-16 | 聯華電子股份有限公司 | Substrate transferring system |
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