TW201623665A - Film forming apparatus - Google Patents

Film forming apparatus Download PDF

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Publication number
TW201623665A
TW201623665A TW104131820A TW104131820A TW201623665A TW 201623665 A TW201623665 A TW 201623665A TW 104131820 A TW104131820 A TW 104131820A TW 104131820 A TW104131820 A TW 104131820A TW 201623665 A TW201623665 A TW 201623665A
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Taiwan
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jig
self
revolving
rotation
jigs
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TW104131820A
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Chinese (zh)
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永谷浩治
本田優治
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愛發科股份有限公司
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Publication of TW201623665A publication Critical patent/TW201623665A/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Abstract

The present invention provides a film deposition system that has high productivity. A plurality of rotational and revolutionary jigs (211) to (215) are tilted greatly, and a front side and a rear side of each pair of adjacent ones of (211) to (215) are overlapped. When the rotational and revolutionary jigs (211) to (215) are rotated around a main rotational axis (12) while each of the rotational and revolutionary jigs (211) to (215) is rotated around a jig rotational axis (29), film deposition material particles ejected from a film deposition source (15) reach substrates (26) held by the rotational and revolutionary jigs (211) to (215) to form thin films. Since the spaces between the rotational and revolutionary jigs (211) to (215) are small, the efficiency of use of the film deposition material (15b) is improved.

Description

成膜裝置 Film forming device

本發明,是有關在真空氣氛中形成薄膜的成膜裝置的技術領域,尤其是,有關於使用自公轉治具的成膜裝置的技術領域。 The present invention relates to the technical field of a film forming apparatus for forming a film in a vacuum atmosphere, and more particularly to the technical field of a film forming apparatus using a self-revolving jig.

在真空氣氛中形成薄膜的情況時,具有:每次一枚地在基板成膜的單片式的成膜裝置、及將複數枚數的基板一起成膜的批次式的成膜裝置,批次式的成膜裝置,已知是在自公轉治具裝設複數枚的基板,一邊將自公轉治具旋轉一邊形成薄膜。 When a thin film is formed in a vacuum atmosphere, there is a one-piece film forming apparatus that forms a film on a substrate one at a time, and a batch type film forming apparatus that forms a plurality of substrates together, and batches In the film forming apparatus of the secondary type, it is known that a plurality of substrates are mounted on the transfer jig, and a film is formed while rotating from the revolving jig.

第10圖的符號102,是該習知技術的真空成膜裝置,在真空槽111的內部,被配置有:被固定於真空槽111的圓形軌道116、及複數(在此為3台)的自公轉治具1211~1213、及成膜源115。 The reference numeral 102 in Fig. 10 is a vacuum film forming apparatus of the prior art, and a circular rail 116 fixed to the vacuum chamber 111 and a plurality (here, three units) are disposed inside the vacuum chamber 111. The self-revolving jigs 121 1 to 121 3 and the film forming source 115.

自公轉治具1211~1213是平坦的圓盤狀,或是如球體的一部分彎曲的圓頂形狀,如第11圖所示,在一面(彎曲的情況時為凹面),安裝有複數枚成膜對象也就 是基板126。 The self-revolving jigs 121 1 to 121 3 are flat disc-shaped or dome-shaped shapes that are curved like a part of a sphere, as shown in Fig. 11, on one side (concave in the case of bending), a plurality of pieces are mounted The film formation object is also the substrate 126.

在各自公轉治具1211~1213的相反側的面(彎曲的情況時為凸面)側配置旋轉軸,在該面中,旋轉軸127的一端是被固定在中心位置,在另一端中,設有行走車輪122。 A rotating shaft is disposed on a side of the opposite side of the respective turning jigs 121 1 to 121 3 (a convex surface in the case of bending), in which one end of the rotating shaft 127 is fixed at the center position, and in the other end, A walking wheel 122 is provided.

行走車輪122,是被配置於圓形軌道116上,藉由未圖示的移動裝置,在旋轉軸127,以圓形軌道116的中心點為中心,沿著圓形軌道116的彎曲的方向的力是被外加的話,行走車輪122,是一邊在圓形軌道116上滾動,一邊旋轉行走。 The traveling wheel 122 is disposed on the circular orbit 116, and is rotated along the center of the circular orbit 116 around the center of the circular orbit 116 by a moving device (not shown). When the force is applied, the traveling wheel 122 is rotated while rolling on the circular rail 116.

行走車輪122旋轉的話,旋轉軸127及自公轉治具1211~1213,是以其中心軸線為中心旋轉。 When the traveling wheel 122 rotates, the rotating shaft 127 and the self-propelling jigs 121 1 to 121 3 rotate around the central axis thereof.

行走車輪122行走時,自公轉治具1211~1213,是以行走車輪122的行走的中心點為中心繞轉。 When the traveling wheel 122 is traveling, the self-revolving jigs 121 1 to 121 3 are rotated around the center point of the traveling wheel 122.

將此繞轉稱為公轉,將自公轉治具1211~1213的旋轉稱為自轉的話,各自公轉治具1211~1213,是一邊自轉一邊公轉。 When the rotation of the revolving jigs 121 1 to 121 3 is referred to as a rotation, the revolving jigs 121 1 to 121 3 are revolved while rotating.

成膜源115,是被配置於自公轉治具1211~1213的下方,具有:容器115a、及被配置於容器115a的內部的成膜材料115b。 The film formation source 115 is disposed below the rotation jigs 121 1 to 121 3 and has a container 115a and a film formation material 115b disposed inside the container 115a.

真空排氣裝置117是被連接在真空槽111中,藉由真空排氣裝置117將真空槽111的內部真空排氣成為真空氣氛之後,藉由未圖示的加熱裝置將成膜材料115b加熱,成膜材料115b的蒸氣若發生的話,該蒸氣, 是從成膜源115朝真空槽111的內部被放出。 The vacuum evacuation device 117 is connected to the vacuum chamber 111, and after evacuating the inside of the vacuum chamber 111 to a vacuum atmosphere by the vacuum exhaust device 117, the film forming material 115b is heated by a heating device (not shown). If the vapor of the film forming material 115b occurs, the vapor, It is discharged from the film formation source 115 toward the inside of the vacuum chamber 111.

複數基板126,是各別朝向成膜源115被配置在各自公轉治具1211~1213中。 The plurality of substrates 126 are disposed in the respective revolution detecting jigs 121 1 to 121 3 so as to face the film forming source 115.

自公轉治具1211~1213,是各別規定距離分離地被配置,基板126,是一邊與自公轉治具1211~1213一起旋轉及繞轉,一邊使從成膜源115被放出的蒸氣到達基板126的表面,使均一的薄膜成長。 The revolving jigs 121 1 to 121 3 are disposed separately from each other, and the substrate 126 is rotated from the film forming source 115 while being rotated and rotated together with the revolving jigs 121 1 to 121 3 . The vapor reaches the surface of the substrate 126 to grow a uniform film.

自公轉治具1211~1213是平坦的圓盤或是彎曲的圓盤,假設,如第12圖所示,即使將相鄰接的自公轉治具1211~1213的外周彼此接觸,在自公轉治具1211~1213的外周、及相鄰接的自公轉治具1211~1213的外周之間,仍會形成間隙。 The self-revolving jigs 121 1 to 121 3 are flat disks or curved disks, and it is assumed that, as shown in Fig. 12, even if the outer circumferences of the adjacent self-revolving jigs 121 1 to 121 3 are in contact with each other, between the outer periphery of the outer periphery of the revolution from 1211 to 121 jig 3, and the revolution from the adjoining jig 121 1 to 1213, and will form a gap.

在此間隙中,複數自公轉治具1211~1213之中,具有:由各自公轉治具1211~1213的頂點附近的外周被包圍形成的間隙部分100a、及形成於相鄰接的二個的自公轉治具1211~1213的外周間的間隙部分100b1~100b3,從成膜源115被放出的蒸氣的一部分,是通過這些間隙部分100a、100b1~100b3,無助於成膜地被消耗。 In the gap, the plurality of the self-revolving jigs 121 1 to 121 3 have a gap portion 100a surrounded by the outer circumference of the vicinity of the apex of each of the revolving jigs 121 1 to 121 3 , and are formed adjacent to each other. The gap portions 100b1 to 100b3 between the outer circumferences of the two self-propelling jigs 121 1 to 121 3 are partially discharged from the film formation source 115 through the gap portions 100a, 100b1 to 100b3, and do not contribute to film formation. The ground is consumed.

又,對於使用自公轉治具的成膜裝置,是例如日本特開昭57-70274號公報、日本特開2002-164303號公報,對於無間隙的方式成膜的技術,是例如日本特開2012-224878號公報,改良了使用自公轉治具的裝置的技術,是例如日本專利第2762948號公報,但是未見有具有 減少間隙部分的自公轉治具的成膜裝置。 In the film forming apparatus using the self-propelling jig, for example, JP-A-57-70274 and JP-A-2002-164303, a technique for forming a film without a gap is, for example, JP-A-2012 Japanese Patent No. 224878, which is a technique for improving a device using a self-reducing jig, and is, for example, Japanese Patent No. 2762948, but has not been found. A film forming device for reducing the gap portion of the self-revolving jig.

[專利文獻] [Patent Literature]

[專利文獻1]日本特開昭57-70274號公報 [Patent Document 1] Japanese Laid-Open Patent Publication No. SHO 57-70274

[專利文獻2]日本特開2002-164303號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2002-164303

[專利文獻3]日本特開2012-224878號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2012-224878

[專利文獻4]日本專利第2762948號公報 [Patent Document 4] Japanese Patent No. 2762948

本發明是為了解決上述習知技術的問題而被創作者,其目的提供一種成膜裝置,可減少間隙部分,將成膜材料有效地活用。 The present invention has been made in an effort to solve the above problems of the prior art, and an object thereof is to provide a film forming apparatus which can reduce a gap portion and effectively utilize a film forming material.

為了解決上述課題,本發明,是具有:真空槽、及被配置於前述真空槽內的圓形軌道、及將成膜材料粒子朝前述真空槽的內部放出的成膜源、及配置有複數個基板的複數個自公轉治具、及被配置於前述圓形軌道上的複數行走車輪、及將複數前述自公轉治具保持的治具安裝裝置、及將前述治具安裝裝置繞主旋轉軸線的周圍旋轉的馬達,複數個前述自公轉治具,是在前述圓形軌道的內側,沿著前述圓形軌道一台一台地呈圓形並列配置,前述自公轉治具是各別與別的前述行走車輪連接,前述治具安 裝裝置是藉由前述馬達被旋轉的話,前述自公轉治具,是藉由前述治具安裝裝置的旋轉繞前述主旋轉軸線的周圍被繞轉移動,並且各別與前述自公轉治具連接的前述行走車輪,是一邊以車輪旋轉軸線為中心旋轉一邊行走於前述圓形軌道上,藉由前述行走車輪的旋轉,前述自公轉治具,是以治具旋轉軸線為中心被旋轉,被配置於前述自公轉治具的前述基板,是一邊與前述自公轉治具一起進行旋轉及繞轉移動,一邊使前述成膜材料粒子附著在表面,而形成薄膜,其中,前述自公轉治具,是各別由前述繞轉移動的方向的先頭側及後尾側,與相鄰接的其他的前述自公轉治具重疊地配置,前述自公轉治具之由前述先頭側重疊的部分及由前述後尾側重疊的部分的其中任一方側,是位於比重疊的其他的前述自公轉治具更接近前述主旋轉軸線的位置,另一方側,是位於比重疊的其他的前述自公轉治具更遠離前述主旋轉軸線。 In order to solve the above problems, the present invention includes a vacuum chamber, a circular orbit disposed in the vacuum chamber, and a film formation source for discharging the film forming material particles into the vacuum chamber, and a plurality of film formation sources. a plurality of self-revolving jigs of the substrate, a plurality of traveling wheels disposed on the circular orbit, and a jig mounting device for holding the plurality of self-revolving jigs, and the jig mounting device about the main axis of rotation a motor that rotates around, and a plurality of the self-revolving jigs are arranged in a circular shape along the circular orbit along the circular orbit, and the self-revolving jig is different from the other Walking wheel connection, the aforementioned fixture When the mounting device is rotated by the motor, the self-revolving jig is rotated around the main rotation axis by the rotation of the jig mounting device, and is separately connected to the self-revolving jig. The traveling wheel travels on the circular orbit while rotating around the axis of rotation of the wheel. The self-revolving jig is rotated about the rotation axis of the jig by the rotation of the traveling wheel, and is disposed on the traveling wheel. The substrate of the self-revolving jig is formed by adhering the film-forming material particles to the surface while rotating and rotating together with the self-revolving jig, wherein the self-revolving jig is each The first head side and the rear side side of the direction of the revolving movement are disposed so as to overlap with the adjacent other self-revolving jigs, and the portion of the self-revolving jig that overlaps the front side and the rear end side overlap Any one of the sides is located closer to the aforementioned main axis of rotation than the other overlapping self-revolving jigs of the overlap, and the other side is The other from the revolution in the fixture than the overlapping farther from the main axis of rotation.

且本發明的成膜裝置,是前述車輪旋轉軸線及前述治具旋轉軸線是非平行。 Further, in the film forming apparatus of the present invention, the wheel rotation axis and the jig rotation axis are non-parallel.

且本發明的成膜裝置,是藉由前述行走車輪的旋轉以前述車輪旋轉軸線為中心旋轉的車輪軸是被固定在前述行走車輪中,以前述治具旋轉軸線為中心旋轉的治具軸是被固定在前述自公轉治具中,設在前述車輪軸的能動齒輪、及設在前述治具軸的受動齒輪是嚙合,前述能動齒輪的旋轉是朝前述受動齒輪被傳達,藉由前述受動齒輪使前述治具軸及前述自公轉治具被旋轉。 Further, in the film forming apparatus of the present invention, the wheel shaft that is rotated about the wheel rotation axis by the rotation of the traveling wheel is fixed to the traveling wheel, and the jig shaft that rotates around the rotation axis of the jig is In the self-revolving jig, the driven gear provided on the wheel axle and the driven gear provided on the jig shaft are meshed, and the rotation of the movable gear is transmitted to the driven gear, and the driven gear is The jig shaft and the self-revolving jig are rotated.

且本發明的成膜裝置,是前述自公轉治具是設置5個以上。 Further, in the film forming apparatus of the present invention, the self-revolving jig is provided in five or more.

成膜材料的使用效率可提高。 The use efficiency of the film forming material can be improved.

即使未將裝置大型化,仍可以增加可由一次的成膜處理工程形成薄膜基板的枚數。 Even if the apparatus is not enlarged, the number of film substrates that can be formed by one film forming process can be increased.

即使未加大圓形軌道的直徑,仍可以加大自公轉治具的傾斜並減小成膜材料粒子的入射角度。 Even if the diameter of the circular orbit is not increased, the inclination of the self-propelling jig can be increased and the incident angle of the particles of the film forming material can be reduced.

入射角度因為小,所以成膜材料粒子可以到達形成於基板表面的深孔和溝的底面。 Since the incident angle is small, the film-forming material particles can reach the deep holes and the bottom surface of the groove formed on the surface of the substrate.

2‧‧‧成膜裝置 2‧‧‧ film forming device

5‧‧‧成膜源 5‧‧‧film source

11‧‧‧真空槽 11‧‧‧vacuum tank

12‧‧‧主旋轉軸線 12‧‧‧ main axis of rotation

13‧‧‧馬達 13‧‧‧Motor

15‧‧‧成膜源 15‧‧‧film source

15a‧‧‧加熱容器 15a‧‧‧heating container

15b‧‧‧成膜材料 15b‧‧‧film forming materials

16‧‧‧圓形軌道 16‧‧‧round track

20‧‧‧治具安裝裝置 20‧‧‧ fixture mounting device

21、211~216‧‧‧自公轉治具 21, 21 1 ~ 21 6 ‧ ‧ self-revolution fixture

22‧‧‧行走車輪 22‧‧‧Walking wheels

25‧‧‧基板保持部 25‧‧‧Substrate retention department

26‧‧‧基板 26‧‧‧Substrate

27‧‧‧車輪軸 27‧‧‧ Wheel axle

28‧‧‧車輪旋轉軸線 28‧‧‧ Wheel rotation axis

29‧‧‧治具旋轉軸線 29‧‧‧ Fixture rotation axis

30‧‧‧天板 30‧‧‧天板

31‧‧‧腕 31‧‧‧ wrist

32‧‧‧框體 32‧‧‧ frame

33‧‧‧橋板 33‧‧‧ Bridge

34‧‧‧主旋轉軸 34‧‧‧Main rotation axis

36‧‧‧能動齒輪 36‧‧‧Active gear

37‧‧‧受動齒輪 37‧‧‧Activity gear

38‧‧‧治具軸 38‧‧‧ fixture shaft

100a,100b1~100b3‧‧‧間隙部分 100a, 100b1~100b3‧‧‧ gap part

111‧‧‧真空槽 111‧‧‧vacuum tank

115‧‧‧成膜源 115‧‧‧film source

115a‧‧‧容器 115a‧‧‧ Container

115b‧‧‧成膜材料 115b‧‧‧film forming materials

116‧‧‧圓形軌道 116‧‧‧round track

117‧‧‧真空排氣裝置 117‧‧‧Vacuum exhaust

1211~1213‧‧‧自公轉治具 121 1 ~121 3 ‧‧‧From the revolutionary fixture

122‧‧‧行走車輪 122‧‧‧Walking wheels

126‧‧‧基板 126‧‧‧Substrate

127‧‧‧旋轉軸 127‧‧‧Rotary axis

[第1圖]本發明的一例的成膜裝置 [Fig. 1] A film forming apparatus of an example of the present invention

[第2圖]治具安裝裝置的立體圖 [Fig. 2] A perspective view of the fixture mounting device

[第3圖](a)、(b):說明框體的內部用的圖;(a):圓盤的自公轉治具的情況,(b):圓頂型的自公轉治具的情況 [Fig. 3] (a) and (b): a diagram for explaining the inside of the casing; (a): the case of the self-revolving jig of the disk, and (b) the case of the dome-shaped self-revolving jig.

[第4圖]說明被配置於自公轉治具的基板的位置用的圖 [Fig. 4] A diagram for explaining the position of the substrate placed on the self-propelled jig

[第5圖]說明6枚的自公轉治具的配置用的圖 [Fig. 5] A diagram for explaining the arrangement of six self-revolving jigs

[第6圖](a)、(b):說明將4英吋基板配置於自公轉治具的狀態用的圖,(a):俯視圖,(b):立體圖 [Fig. 6] (a) and (b): A diagram for explaining a state in which a 4-inch substrate is placed on a self-propelled jig, (a): a plan view, and (b) a perspective view.

[第7圖](a)、(b):說明將5英吋基板配置於自 公轉治具的狀態用的圖,(a):俯視圖,(b):立體圖 [Fig. 7] (a), (b): Description of the placement of a 5-inch substrate in self Diagram for the state of the revolutionary fixture, (a): top view, (b): perspective view

[第8圖](a)、(b):說明將6英吋基板配置於自公轉治具的狀態用的圖,(a):俯視圖,(b):立體圖 [Fig. 8] (a) and (b): A diagram for explaining a state in which a 6-inch substrate is placed on a self-propelled jig, (a): a plan view, and (b) a perspective view.

[第9圖](a)、(b):說明將8英吋基板配置於自公轉治具的狀態用的圖,(a):俯視圖,(b):立體圖 [Fig. 9] (a) and (b): A diagram for explaining a state in which an 8-inch substrate is placed on a self-propelled jig, (a): a plan view, and (b) a perspective view.

[第10圖]習知技術的成膜裝置 [Fig. 10] A film forming apparatus of the prior art

[第11圖]說明將基板配置在自公轉治具的狀態用的圖 [Fig. 11] A diagram for explaining the state in which the substrate is placed in the state of the self-revolving jig

[第12圖]顯示將自公轉治具密合時的狀態的圖 [Fig. 12] A diagram showing the state when the self-revolving jig is in close contact

<實施例> <Example>

第1圖,是顯示本發明的成膜裝置2。 Fig. 1 is a view showing a film forming apparatus 2 of the present invention.

此成膜裝置2,是具有真空槽11,在真空槽11的內部,配置有圓形軌道16,被固定於真空槽11。 The film forming apparatus 2 has a vacuum chamber 11, and a circular rail 16 is disposed inside the vacuum chamber 11, and is fixed to the vacuum chamber 11.

在真空槽11的內部,被配置有:5個以上也就是複數個(在第1圖中為5個)的自公轉治具211~215、及將各自公轉治具211~215保持的治具安裝裝置20。 Inside the vacuum chamber 11, five or more, that is, a plurality of (in the first figure, five) self-propelling jigs 21 1 to 21 5 are disposed, and each of the revolving jigs 21 1 to 21 5 The jig mounting device 20 is held.

治具安裝裝置20如第2圖所示。治具安裝裝置20,是具有:氣密地插通真空槽11的頂板的主旋轉軸34、及被配置於真空槽11的內部且被安裝於主旋轉軸34下端的天板30、及上部是設在天板30的腕31、及設在腕31下部的框體32。 The jig mounting device 20 is as shown in Fig. 2. The jig attachment device 20 is a main rotating shaft 34 having a top plate that is airtightly inserted into the vacuum chamber 11, and a top plate 30 and an upper portion that are disposed inside the vacuum chamber 11 and are attached to the lower end of the main rotating shaft 34. It is a wrist 31 provided on the top plate 30 and a frame 32 provided on the lower portion of the wrist 31.

在此例中,腕31,是與自公轉治具211~215同數者被固定於天板30。 In this example, the wrist 31 is fixed to the top 30 by the same number as the self-revolving jigs 21 1 to 21 5 .

天板30是具有從圓盤狀的部分朝圓盤的中心延伸的橋板33,主旋轉軸34的下端是在圓盤的中心位置被固定於橋板33。 The top plate 30 has a bridge plate 33 extending from the disk-shaped portion toward the center of the disk, and the lower end of the main rotating shaft 34 is fixed to the bridge plate 33 at the center of the disk.

治具安裝裝置20,是藉由主旋轉軸34,被懸吊於真空槽11的內部。 The jig attachment device 20 is suspended inside the vacuum chamber 11 by the main rotating shaft 34.

自公轉治具211~215,是位於天板30的下方,如第3圖(a)的剖面圖,雖是圓盤狀的形狀,或是如第3圖(b)的剖面圖,成為球體的一部分之中央部被彎曲的圓頂型的形狀。 The self-propelling jig 21 1 ~ 21 5 is a cross-sectional view located below the sky plate 30, as shown in Fig. 3 (a), although it is a disk-shaped shape or a sectional view as shown in Fig. 3 (b). The dome-shaped shape in which the central portion of the sphere is curved.

在各自公轉治具211~215中,在自公轉治具211~215的中心位置,設有棒狀的治具軸38的一端。 In each of the revolving jigs 21 1 to 21 5 , one end of a rod-shaped jig shaft 38 is provided at a center position of the revolving jigs 21 1 to 21 5 .

治具軸38的中心軸線也就是治具旋轉軸線29,是各別通過自公轉治具211~215的中心位置,治具軸38,是以治具旋轉軸線29為中心旋轉的話,自公轉治具211~215,也以治具旋轉軸線29為中心旋轉。 The central axis of the jig 38 is also the jig axis 29, which is the center position of the self-propelling jigs 21 1 to 21 5 , and the jig axis 38 is rotated about the jig axis 29 of the jig. The turning jig 21 1 ~ 21 5 also rotates around the jig axis 29 of the jig.

在此例中,治具軸38的治具旋轉軸線29,是成為對於自公轉治具211~215的設有治具軸38的部分垂直,在各自公轉治具211~215上的任一位置,皆在與治具旋轉軸線29垂直的平面內旋轉。 In this example, the jig axis 29 of the jig shaft 38 is perpendicular to the portion of the revolving jig 21 1 to 21 5 where the jig axis 38 is provided, and on the respective revolving jigs 21 1 to 21 5 Any position is rotated in a plane perpendicular to the axis of rotation 29 of the jig.

治具軸38的另一端,是被插通框體32的內部,各自公轉治具211~215的重量,是透過治具軸38及框體32,藉由治具安裝裝置20被支撐。 The other end of the jig 38 is inserted into the inside of the frame 32, and the weight of each of the revolving jigs 21 1 to 21 5 is supported by the jig 38 and the frame 32 by the jig mounting device 20. .

在圓形軌道16上,被配置有一端被安裝於車輪軸27的行走車輪22。 On the circular rail 16, a traveling wheel 22 whose one end is attached to the wheel axle 27 is disposed.

車輪軸27的另一端,是被插入框體32,行走車輪22,是透過車輪軸27及框體32,藉由治具安裝裝置20被按壓在圓形軌道16上。 The other end of the wheel axle 27 is inserted into the frame 32, and the traveling wheel 22 is transmitted through the wheel axle 27 and the frame 32, and is pressed against the circular rail 16 by the jig attachment device 20.

治具軸38及車輪軸27,是對於框體32可旋轉,行走車輪22,是在圓形軌道16上一邊滾動一邊行走的話,車輪軸27就可以旋轉。 The jig shaft 38 and the wheel axle 27 are rotatable with respect to the frame body 32, and the traveling wheel 22 is rotatable while being rolled while rolling on the circular rail 16.

在真空槽11的外部,配置有馬達13。 A motor 13 is disposed outside the vacuum chamber 11.

馬達13,是被安裝於主旋轉軸34的上部,將主旋轉軸34,以主旋轉軸34的中心軸線也就是主旋轉軸線12為中心旋轉。 The motor 13 is attached to the upper portion of the main rotating shaft 34, and rotates the main rotating shaft 34 around the central axis of the main rotating shaft 34, that is, the main rotating shaft 12.

圓形軌道16是被舖設成圓狀,主旋轉軸線12,是將圓形軌道16的中心點,對於圓形軌道16位置的平面垂直地通過。 The circular track 16 is laid in a circular shape, and the main axis of rotation 12 is a center point of the circular track 16 that passes perpendicularly to the plane of the circular track 16 position.

車輪軸27及行走車輪22,是以同一且共通的中心軸線也就是車輪旋轉軸線28為中心旋轉,車輪旋轉軸線28是與主旋轉軸線12交叉。 The wheel axle 27 and the traveling wheel 22 rotate about the same and common central axis, that is, the wheel axis of rotation 28, and the wheel axis of rotation 28 intersects the main axis of rotation 12.

因此,使馬達13動作,將主旋轉軸34以主旋轉軸線12為中心旋轉的話,各自公轉治具211~215,是以主旋轉軸線12為中心繞轉移動。 Therefore, when the motor 13 is operated and the main rotating shaft 34 is rotated about the main rotation axis 12, the respective rotation jigs 21 1 to 21 5 are rotated around the main rotation axis 12 .

此時,行走車輪22是與圓形軌道16接觸,被按壓在圓形軌道16,藉由各自公轉治具211~215的繞轉移動,使行走車輪22,在圓形軌道16上不滑動地滾 動。即,各行走車輪22,是一邊以車輪旋轉軸線28為中心旋轉,一邊沿著圓形軌道16,以主旋轉軸線12為中心繞轉移動。 At this time, the traveling wheel 22 is in contact with the circular orbit 16 and is pressed against the circular orbit 16 by the revolving movement of the respective revolving jigs 21 1 to 21 5 so that the traveling wheels 22 are not on the circular orbit 16 Sliding scrolling. In other words, each of the traveling wheels 22 rotates around the main axis of rotation 12 along the circular orbit 16 while rotating around the wheel rotation axis 28 .

又,行走車輪22,可以進行:以主旋轉軸線12為中心的繞轉移動、及以車輪軸27的車輪旋轉軸線28為中心的旋轉的話,對於圓形軌道16垂直也可以,傾斜配置也可以。 Further, the traveling wheel 22 may be rotated about the main rotation axis 12 and rotated about the wheel rotation axis 28 of the wheel axle 27, and the circular rail 16 may be vertical or inclined. .

在位於車輪軸27的框體32的內部的部分中設有能動齒輪36,在位於治具軸38的框體32的內部的部分中設有受動齒輪37。 The movable gear 36 is provided in a portion located inside the casing 32 of the wheel axle 27, and a driven gear 37 is provided in a portion of the casing 32 located inside the jig shaft 38.

能動齒輪36,是以行走車輪22及車輪軸27的車輪旋轉軸線28為中心旋轉,受動齒輪37,是以治具軸38的治具旋轉軸線29為中心旋轉。 The active gear 36 rotates around the wheel rotation axis 28 of the traveling wheel 22 and the wheel axle 27, and the driven gear 37 rotates around the jig rotation axis 29 of the jig shaft 38.

能動齒輪36及受動齒輪37是齒合,一方旋轉的話朝另一方使其旋轉力被傳達,使另一方旋轉。 The movable gear 36 and the driven gear 37 are engaged, and when one rotates, the rotational force is transmitted to the other and the other is rotated.

因此,治具安裝裝置20,是將複數自公轉治具211~215,朝右轉(順時針)或是左轉(逆時針)的其中任一的相同方向,以主旋轉軸線12為中心一起繞轉移動,與自公轉治具211~215一起使行走車輪22以主旋轉軸線12為中心繞轉移動的話,行走車輪22是以車輪旋轉軸線28為中心旋轉,藉由其旋轉力,使車輪軸27及能動齒輪36旋轉,藉由能動齒輪36的旋轉,使受動齒輪37及治具軸38、及自公轉治具211~215以治具旋轉軸線29為中心旋轉。 Therefore, the jig mounting device 20 is the same direction of any one of the plurality of self-revolving jigs 21 1 to 21 5 , turning right (clockwise) or left (counterclockwise), with the main axis of rotation 12 being The center moves around together, and when the traveling wheel 22 is rotated about the main rotation axis 12 together with the self-propelling jigs 21 1 to 21 5 , the traveling wheel 22 rotates around the wheel rotation axis 28 by rotating The rotation of the wheel shaft 27 and the active gear 36 causes the driven gear 37, the jig shaft 38, and the self-propelling jigs 21 1 to 21 5 to rotate about the jig rotation axis 29 by the rotation of the movable gear 36.

在真空槽11內部的比自公轉治具211~215更下方的位置中,配置有成膜源15。 A film formation source 15 is disposed in a position inside the vacuum chamber 11 from below the revolving jigs 21 1 to 21 5 .

各自公轉治具211~215,其一面是朝向傾斜下方,與成膜源15相面對,相反側,是朝向斜上方。 Each of the revolving jigs 21 1 to 21 5 has one side facing downward obliquely, facing the film forming source 15, and the opposite side facing obliquely upward.

治具軸38,是被安裝於朝向斜上方的面,在朝向傾斜下方的面中,如第4圖所示,設有複數基板保持部25。 The jig shaft 38 is attached to a surface that faces obliquely upward, and as shown in FIG. 4, a plurality of substrate holding portions 25 are provided on the surface that faces obliquely downward.

圓頂形狀的情況時,如第3圖(b)所示,在彎曲的凹面,設有基板保持部25,與成膜源15相面對地傾斜。 In the case of the dome shape, as shown in Fig. 3(b), the substrate holding portion 25 is provided on the curved concave surface, and is inclined to face the film formation source 15.

第4圖,是顯示自公轉治具211~215的朝向成膜源15的面,符號25,是保持基板26的基板保持部。 4 is a surface showing the film formation source 15 from the rotation jigs 21 1 to 21 5 , and reference numeral 25 is a substrate holding portion holding the substrate 26.

被保持在基板保持部25的基板26,不會從自公轉治具211~215脫落,成為與自公轉治具211~215一起旋轉及繞轉。 Is held by the substrate holding portion 25, substrate 26, not from the revolving jig 21 1 to 21 5 from coming off, it becomes self-revolving jig 211 ~ 215 revolves and rotates together.

如後述,從成膜源15被放出的成膜材料粒子若到達基板26的表面的話,薄膜會在該基板表面成長。 As will be described later, when the film-forming material particles discharged from the film formation source 15 reach the surface of the substrate 26, the film grows on the surface of the substrate.

安裝有各自公轉治具211~215的治具軸38的中心位置,是位於同一的圓周上,自公轉治具211~215及治具軸38,是治具旋轉軸線29,是朝向不與主旋轉軸線12交叉的方向,其結果,各自公轉治具211~215,是以主旋轉軸線12為中心,一起繞轉移動時,各自公轉治具211~215的先頭側及主旋轉軸線12之間的距離、及後尾 側及主旋轉軸線12之間的距離成為不同。 The center position of the jig shaft 38 to which the respective revolving jigs 21 1 to 21 5 are mounted is located on the same circumference, and the revolving jigs 21 1 to 21 5 and the jig axis 38 are the jig axis 29 of the jig. The direction is not to intersect with the main axis of rotation 12, and as a result, the respective revolving jigs 21 1 to 21 5 are centered on the main axis of rotation 12, and when they are rotated together, the heads of the respective revolving jigs 21 1 to 21 5 The distance between the side and the main axis of rotation 12 and the distance between the rear tail side and the main axis of rotation 12 are different.

因此,在本發明中,將各自公轉治具211~215呈圓形並列配置時,可以將各自公轉治具211~215的先頭側的部分及後尾側的部分,與相鄰接的其他的自公轉治具211~215的後尾側的部分及先頭側的部分重疊地配置,依據此配置的話,各自公轉治具211~215不會相互衝撞,相鄰接的自公轉治具211~215的中心位置之間的距離,是比自公轉治具211~215的直徑更短地接近。 Therefore, in the present invention, when the respective rotation jigs 21 1 to 21 5 are arranged in a circular shape, the portions on the head side and the rear side of the respective rotation jigs 21 1 to 21 5 can be adjacent to each other. The other rear end portions of the self-propelling jigs 21 1 to 21 5 and the front end side portions are arranged to overlap each other. According to this configuration, the respective revolving jigs 21 1 to 21 5 do not collide with each other. revolving jig distance between the center positions 21 1 to 21 5, a diameter of 211 - 215 is shorter than that from the revolution close fixture.

對於重疊,各自公轉治具211~215,是使先頭側及後尾側之中的一方的側,比另一方側更接近主旋轉軸線12地配置。 In the overlap, the respective jigs 21 1 to 21 5 are disposed such that one of the leading side and the trailing side is closer to the main rotation axis 12 than the other side.

沿著圓形軌道16被配置的全部的自公轉治具211~215,是使先頭側及後尾側之中的相同側接近主旋轉軸線12。 All of the self-revolving jigs 21 1 to 21 5 disposed along the circular rail 16 are such that the same side of the leading end side and the rear tail side are close to the main rotation axis 12 .

例如,在第1圖的成膜裝置中,將各自公轉治具211~215從真空槽11的頂板側所見,朝順時針旋轉的情況時,各自公轉治具211~215的先頭側是比後尾側更遠離主旋轉軸線12,朝逆時針旋轉的情況時,先頭側是比後尾側更接近主旋轉軸線12。 For example, in the film forming apparatus of Fig. 1, when the respective rotation jigs 21 1 to 21 5 are seen from the top plate side of the vacuum chamber 11 and rotated clockwise, the heads of the respective rotation jigs 21 1 to 21 5 are advanced. The side is closer to the main axis of rotation 12 than the rear end side, and in the case of counterclockwise rotation, the leading side is closer to the main axis of rotation 12 than the trailing side.

成膜源15,是被配置於與主旋轉軸線12交叉的位置,因此,在各自公轉治具211~215的重疊部分中,先頭側及後尾側之中,其中任一方的側,是比相鄰接的自公轉治具211~215更接近成膜源15,另一方側是被配置成比相鄰接的自公轉治具211~215更遠離成膜源15,在 該被遠離配置的部分中,與相鄰接的自公轉治具211~215重疊的部分,是對於成膜源15成為背後。從成膜源15被放出的成膜材料粒子,是到達成為背後的部分以外的部分,不會到達成為背後的部分。 The film formation source 15 is disposed at a position intersecting with the main rotation axis 12. Therefore, among the overlapping portions of the respective rotation jigs 21 1 to 21 5 , one of the leading side and the rear tail side is It is closer to the film forming source 15 than the adjacent self-revolving jigs 21 1 to 21 5 , and the other side is configured to be farther away from the film forming source 15 than the adjacent self-revolving jigs 21 1 to 21 5 . In the portion that is away from the arrangement, the portion overlapping the adjacent self-revolving jigs 21 1 to 21 5 is behind the film formation source 15 . The film-forming material particles discharged from the film formation source 15 are portions other than the portion that becomes the back portion, and do not reach the portion that becomes the back.

第1圖的成膜裝置2的重疊的情況時,從上方所見時,順時針的先頭側因為是遠離主旋轉軸線12,所以先頭側是從成膜源15所見成為背後,後尾側不會成為背後。 In the case where the film forming apparatus 2 of the first embodiment overlaps, when viewed from above, the clockwise leading side is away from the main rotation axis 12, so that the leading side is seen from the film forming source 15 and the rear side does not become. behind.

在本發明中,一枚的自公轉治具211~215,是先頭側的部分及後尾側的部分之中一方的部分是成為背後,另一方的部分不會成為背後。 In the present invention, one of the self-revolving jigs 21 1 to 21 5 is one of the first-side portion and the rear-end portion, and the other portion is not behind.

在此實施例中,各自公轉治具211~215,其配置有基板26的面的中心位置,是不會成為背後的方式被重疊,因此,在配置有自公轉治具211~215的基板26的面中,無論任一位置,在自公轉治具211~215以治具旋轉軸線29為中心轉一圈期間,因為是通過不會成為背後的部分,所以無論被配置於自公轉治具211~215的基板26的表面的任一位置,從成膜源5被放出的成膜材料粒子皆可到達。 In this embodiment, each of the revolving jigs 21 1 to 21 5 is disposed at the center of the surface of the substrate 26 so as not to be overlapped. Therefore, the self-revolving jigs 21 1 to 21 are disposed. In any of the positions of the substrate 26 of the fifth substrate, the rotation of the rotation jigs 21 1 to 21 5 with respect to the jig rotation axis 29 is a part of the surface of the substrate 26. At any position on the surface of the substrate 26 from the transfer fixtures 21 1 to 21 5 , the film-forming material particles discharged from the film formation source 5 can be reached.

又,因為車輪旋轉軸線28是與主旋轉軸線12交叉,治具旋轉軸線29不與主旋轉軸線12交叉,所以車輪旋轉軸線28及治具旋轉軸線29不會成為平行(也包含一致)。 Moreover, since the wheel axis of rotation 28 intersects the main axis of rotation 12 and the jig axis of rotation 29 does not intersect the main axis of rotation 12, the wheel axis of rotation 28 and the jig axis of rotation 29 do not become parallel (and also coincide).

<成膜方法> <film formation method>

接著,說明使用此成膜裝置2的成膜方法。 Next, a film forming method using this film forming apparatus 2 will be described.

在此成膜裝置2中,自公轉治具211~215是從治具軸38可裝卸自如地構成,藉由此成膜裝置2,形成薄膜的情況時,首先,將真空槽11的門打開,將各自公轉治具211~215從治具安裝裝置20取下,朝真空槽11的外部取出,在基板保持部25安裝了基板26後,裝設在治具安裝裝置20,將門關閉。 In the film forming apparatus 2, since the revolving jigs 21 1 to 21 5 are detachably formed from the jig shaft 38, and the film forming apparatus 2 forms a film, first, the vacuum tank 11 is used. When the door is opened, the respective jigs 21 1 to 21 5 are removed from the jig attachment device 20, taken out to the outside of the vacuum chamber 11, and the substrate 26 is attached to the substrate holding portion 25, and then mounted on the jig attachment device 20, Close the door.

在真空槽11中,連接有真空排氣裝置17,將真空排氣裝置17動作,就可將真空槽11的內部真空排氣成為真空氣氛,使馬達13動作,將各自公轉治具211~215,繞主旋轉軸線12的周圍旋轉(將此稱為公轉),且,繞治具旋轉軸線29的周圍旋轉(將此稱為自轉)。 In the vacuum chamber 11, a vacuum exhaust device 17 is connected, and when the vacuum exhaust device 17 is operated, the vacuum inside the vacuum chamber 11 is evacuated to a vacuum atmosphere, and the motor 13 is operated to rotate the respective jig 21 1 ~ 21 5 , rotates around the circumference of the main axis of rotation 12 (this is referred to as revolution), and rotates around the axis of rotation 29 of the jig (this is referred to as rotation).

成膜源15,是具有:容器15a、及被配置於容器15a的成膜材料15b,藉由加熱裝置(未圖示)將容器15a及成膜材料15b加熱,將成膜材料15b昇溫的話,成膜材料15b的蒸發就會開始,成膜材料15b的蒸氣也就是成膜材料粒子會從成膜源15朝真空槽11的內部被放出。又,不加熱加熱容器15a,而直接加熱成膜材料15b也可以。 The film formation source 15 has a container 15a and a film forming material 15b disposed in the container 15a, and the container 15a and the film forming material 15b are heated by a heating device (not shown) to heat the film forming material 15b. The evaporation of the film forming material 15b is started, and the vapor of the film forming material 15b, that is, the film forming material particles, is discharged from the film forming source 15 toward the inside of the vacuum chamber 11. Further, the film forming material 15b may be directly heated without heating the heating container 15a.

朝真空槽11的內部被放出的成膜材料粒子,是在真空槽11的內部進行,到達基板26的表面的話,薄膜會在基板26的成膜材料粒子到達的部分成長。 The film-forming material particles discharged to the inside of the vacuum chamber 11 are formed inside the vacuum chamber 11, and when reaching the surface of the substrate 26, the film grows at a portion where the film-forming material particles of the substrate 26 reach.

如上述,本發明的成膜裝置2,各自公轉治具211~215,是由真空槽11的內部先頭側及後尾側重疊的 方式被配置,形成於相鄰接的二個自公轉治具211~215的外周之間的間隙,會比將各自公轉治具的外周間不重疊地分離配置的成膜裝置的自公轉治具間的間隙更小。 As described above, in the film forming apparatus 2 of the present invention, each of the revolving jigs 21 1 to 21 5 is disposed such that the inner first side and the rear side of the vacuum chamber 11 are overlapped, and two adjacent self-transfers are formed. The gap between the outer circumferences of the film forming apparatuses 21 1 to 21 5 is smaller than the gap between the self-revolving jigs of the film forming apparatus in which the outer circumferences of the respective revolving jigs are not overlapped.

且因為將先頭側及後尾側重疊,所以即使未加大圓形軌道16的直徑,各自公轉治具211~215的朝向下方的傾斜是比未重疊的成膜裝置的情況更大,該情況,藉由各自公轉治具211~215的外周的頂點位置的附近被包圍形成的間隙,也比未重疊的成膜裝置更小。 Further, since the leading side and the trailing side are overlapped, even if the diameter of the circular rail 16 is not increased, the inclination of the respective turning jigs 21 1 to 21 5 downward is larger than that of the non-overlapping film forming apparatus. In other cases, the gap formed by the vicinity of the vertex position of the outer circumference of each of the revolving jigs 21 1 to 21 5 is smaller than that of the non-overlapping film forming apparatus.

相對於間隙大的情況,因為間隙小的情況,通過間隙的成膜材料粒子的量變少,所以被配置於容器15a的成膜材料15b的使用效率可提高。 In the case where the gap is large, since the amount of the film-forming material particles passing through the gap is small because the gap is small, the use efficiency of the film-forming material 15b disposed in the container 15a can be improved.

薄膜是在基板26的表面形成規定膜厚之後,真空槽11的內部是成為大氣壓,門被打開使自公轉治具211~215從真空槽11的內部被取出,將成膜完成的基板26,交換成未成膜的基板26,裝設於真空槽11的內部,進行成膜處理。 After the film has a predetermined thickness on the surface of the substrate 26, the inside of the vacuum chamber 11 is at atmospheric pressure, and the door is opened, and the substrate is taken out from the inside of the vacuum chamber 11 by the revolving jigs 21 1 to 21 5 to complete the film formation. 26, the substrate 26 that has not been formed into a film is exchanged, and is placed inside the vacuum chamber 11, and a film forming process is performed.

<其他的成膜裝置> <Other film forming devices>

第5圖,是顯示將6枚的自公轉治具211~216的先頭側及後尾側重疊地配置於成膜裝置的真空槽時的自公轉治具211~216的重疊,自公轉治具211~216的枚數若增加的話,各自公轉治具211~216的外周之中,由頂點附近的部分包圍的間隙會變小。 FIG 5, is a self-overlapping revolving jig 21 1 to 21 6 when the six self-revolving jig to the head side 21 1 to 21 6 and the rear trailing side is disposed to overlap the vacuum chamber deposition apparatus, from When the number of the revolving jigs 21 1 to 21 6 is increased, the gap surrounded by the portion near the vertex of each of the outer circumferences 21 1 to 21 6 becomes small.

<基板的直徑及自公轉治具的關係> <The diameter of the substrate and the relationship between the revolving jig>

下述表1、2是在被設在成膜裝置的自公轉治具,將4、5、6、8英吋的圓盤狀的基板裝設並形成薄膜時的數值,求得每1單位時間可以成膜的基板枚數(處理枚數/時間)。 Tables 1 and 2 below are numerical values obtained when a disc-shaped substrate of 4, 5, 6, or 8 inches is mounted on a self-revolving jig provided in a film forming apparatus to form a film, and each unit is obtained. The number of substrates that can be filmed at the time (number of processed/time).

表1,是將3枚的自公轉治具未重疊地配置的習知技術的成膜裝置的數值。 Table 1 is a numerical value of a conventional film forming apparatus in which three self-propelled jigs are arranged without overlapping.

表2,是將5枚的自公轉治具重疊配置的本發明的成膜裝置的數值,此裝置的真空槽的大小,是與表1的成膜裝置的真空槽相同大小。 Table 2 shows the numerical values of the film forming apparatus of the present invention in which five self-propelled jigs are arranged to overlap each other. The size of the vacuum chamber of this apparatus is the same as that of the vacuum forming apparatus of the film forming apparatus of Table 1.

在表1、2中,「處理枚數/時間」的項目的數值,是顯示成膜裝置在1小時可以處理的基板的枚數。 In Tables 1 and 2, the numerical value of the item of "processing number/time" is the number of substrates which can be processed by the film forming apparatus in one hour.

「排氣時間」、「成膜時間」、「昇壓時間」、「合計時間」的項目,是求得「處理枚數/時間」用的數值,單位是「分鐘」。 The items of "exhaust time", "filming time", "boost time", and "total time" are the values for "processing number/time", and the unit is "minutes".

「基板總數」的項目,是將基板滿載在配置於真空槽內的全部的自公轉治具時的合計枚數,「合計時間」的項目,是「基板總數」的項目中的枚數的基板的處理所需要的時間。 The total number of "substrates" is the total number of the total number of self-propelled jigs placed in the vacuum chamber, and the "total time" item is the number of substrates in the "total number of substrates" item. The time required for processing.

表2中的「基板總數比率」的項目,是將對於相同大小的基板之表2的成膜裝置的「基板總數」中的數值,除以表1的成膜裝置的「基板總數」的數值所得的值,從其可了解,表2的成膜裝置是比表1的成膜裝置更增加11%以上的枚數。 The item of "total number of substrates" in Table 2 is the value of "the total number of substrates" of the film forming apparatus of Table 2 for the same size of the substrate, and the value of the "total number of substrates" of the film forming apparatus of Table 1 From the obtained values, it is understood that the film forming apparatus of Table 2 is 11% or more larger than the film forming apparatus of Table 1.

表2中的「重疊損失」的項目,是自公轉治具的面積之中,對於成為背後的部分的整體的面積的比率,與「成膜時間」的項目的數值相關連,對於相同大小的基板,在表1的「成膜時間」,乘算了在「重疊損失」的項目的數值加算了"1"的數值的值,揭示於表2的「成膜時間」的項目。 The item of the "overlap loss" in Table 2 is the ratio of the area of the entire part to the back of the revolving jig, and the value of the item of the "film formation time" is related to the same size. In the "film formation time" of Table 1, the value of the value of "1" is added to the value of the item of "overlap loss", and the item of "film formation time" of Table 2 is disclosed.

表2的「生產性比率」,是表2的成膜裝置 的1小時可以處理的基板的枚數對於表1的成膜裝置的1小時可以處理的基板的枚數的比,其數值,是將表2的相同大小的基板的「處理枚數/時間」的數值,除以表1的「處理枚數/時間」的項目的數值所得的值。 The "productivity ratio" in Table 2 is the film forming apparatus of Table 2. The ratio of the number of substrates that can be processed in one hour to the number of substrates that can be processed in one hour of the film forming apparatus of Table 1, and the numerical value is the "number of processed/times" of the substrate of the same size as in Table 2. The value is divided by the value of the item of "Processing the number/time" in Table 1.

從「基板總數比率」及「生產性比率」將"1"減去的值,是表2的本發明的成膜裝置比表1的成膜裝置更增加的裝設基板的比率及可以處理的基板的比率,從表2可了解,基板的直徑愈大生產性比率愈增加。 The value obtained by subtracting "1" from the "total substrate ratio" and the "productivity ratio" is the ratio of the mounting substrate of the present invention in Table 2 to the film forming apparatus of Table 1, and the ratio of the mounting substrate can be processed. The ratio of the substrates, as can be seen from Table 2, the larger the diameter of the substrate, the more the productivity ratio increases.

下述表3,對於自公轉治具數為3枚,在每1枚裝設了10枚的基板的習知技術的成膜裝置,在相同大小的真空槽內,與自公轉治具數為6枚,在每1枚裝設了8枚的基板的本發明的成膜裝置相比較,生產性是提高1.5倍。 In the following Table 3, the number of the self-propelled jigs is three, and the film forming apparatus of the prior art is equipped with 10 substrates per one piece, and the number of self-reducing jigs in the vacuum tank of the same size is Sixth, the productivity of the film forming apparatus of the present invention in which eight substrates are mounted per one piece is improved by 1.5 times.

又,第6圖(a)、(b)~第9圖(a)、(b),是顯示將表2所揭示的4、5、6、8英吋的基板26配置於自公轉治具21時基板26及自公轉治具21的關係的圖,第6圖(a)~第9圖(a),是與朝向成膜源15的面相反側的面的俯視圖,第6圖(b)~第9圖(b)是立體圖。 Further, Fig. 6 (a), (b) to Fig. 9 (a) and (b) show the arrangement of the 4, 5, 6, and 8 inch substrates 26 disclosed in Table 2 in the self-revolving jig. FIG. 6( a ) to FIG. 9( a ) are plan views of a surface opposite to the surface facing the film formation source 15 , and FIG. 6 is a view showing a relationship between the substrate 26 and the revolving jig 21 . ) ~ Figure 9 (b) is a perspective view.

在此使用彎曲的自公轉治具21。 A curved self-propelling jig 21 is used here.

<其他> <Other>

以上,雖說明了自公轉治具211~215是5枚的情況,但是不限定於5枚,將先頭側及後尾側的一部分重疊將自公轉治具設置4枚以上成膜裝置也被包含於本發明。但是,為了提高成膜材料15b的使用效率是5枚以上較佳。 In the above, the case where the number of the revolving jigs 21 1 to 21 5 is five is not limited to five, and a part of the leading end side and the rear side side are overlapped, and four or more film forming apparatuses are provided from the revolving jig. It is included in the present invention. However, it is preferable to increase the use efficiency of the film forming material 15b by five or more.

且在上述例中,成膜源15,雖是使發生由成膜材料15b的蒸氣所構成的成膜材料粒子的真空蒸鍍裝置的成膜源,但是本發明,是將濺鍍源作為成膜源,成膜材料是使用配置於電極上的濺射靶材,朝電極外加電壓在真空氣氛中將濺射靶材濺鍍,將從濺射靶材被放出的濺鍍粒子作為成膜材料粒子使用也可以。 Further, in the above example, the film formation source 15 is a film formation source of a vacuum vapor deposition device that causes particles of the film formation material composed of the vapor of the film formation material 15b. However, in the present invention, the sputtering source is formed. The film source is a sputtering target which is disposed on the electrode, and a sputtering target is sputtered in a vacuum atmosphere by applying a voltage to the electrode, and the sputtered particles discharged from the sputtering target are used as a film forming material. Particles can also be used.

在上述例中,雖使用能動齒輪及受動齒輪,但是使用將能動齒輪及受動齒輪由皮帶連結的裝置或其他的裝置,藉由行走車輪的旋轉將重疊的自公轉治具,以中心軸為中心旋轉的話就被包含於本發明。 In the above example, the active gear and the driven gear are used, but a device in which the active gear and the driven gear are coupled by a belt or another device is used, and the self-revolving jig of the overlap is centered on the central axis by the rotation of the traveling wheel. Rotation is included in the present invention.

2‧‧‧成膜裝置 2‧‧‧ film forming device

11‧‧‧真空槽 11‧‧‧vacuum tank

13‧‧‧馬達 13‧‧‧Motor

15‧‧‧成膜源 15‧‧‧film source

15a‧‧‧加熱容器 15a‧‧‧heating container

15b‧‧‧成膜材料 15b‧‧‧film forming materials

16‧‧‧圓形軌道 16‧‧‧round track

17‧‧‧真空排氣裝置 17‧‧‧Vacuum exhaust

20‧‧‧治具安裝裝置 20‧‧‧ fixture mounting device

211~215‧‧‧自公轉治具 21 1 ~ 21 5 ‧‧‧From the revolutionary fixture

22‧‧‧行走車輪 22‧‧‧Walking wheels

26‧‧‧基板 26‧‧‧Substrate

27‧‧‧車輪軸 27‧‧‧ Wheel axle

30‧‧‧天板 30‧‧‧天板

31‧‧‧腕 31‧‧‧ wrist

32‧‧‧框體 32‧‧‧ frame

33‧‧‧橋板 33‧‧‧ Bridge

34‧‧‧主旋轉軸 34‧‧‧Main rotation axis

Claims (4)

一種成膜裝置,具有:真空槽、及被配置於前述真空槽內的圓形軌道、及將成膜材料粒子朝前述真空槽的內部放出的成膜源、及配置有複數個基板的複數個自公轉治具、及被配置於前述圓形軌道上的複數行走車輪、及將複數前述自公轉治具保持的治具安裝裝置、及將前述治具安裝裝置繞主旋轉軸線的周圍旋轉的馬達,複數個前述自公轉治具,是在前述圓形軌道的內側,沿著前述圓形軌道一台一台地呈圓形並列配置,前述自公轉治具是各別與別的前述行走車輪連接,前述治具安裝裝置是藉由前述馬達被旋轉的話,前述自公轉治具,是藉由前述治具安裝裝置的旋轉繞前述主旋轉軸線的周圍被繞轉移動,並且各別與前述自公轉治具連接的前述行走車輪,是一邊以車輪旋轉軸線為中心旋轉一邊行走於前述圓形軌道上,藉由前述行走車輪的旋轉,前述自公轉治具,是以治具旋轉軸線為中心被旋轉,被配置於前述自公轉治具的前述基板,是一邊與前述自公轉治具一起進行旋轉及繞轉移動,一邊使前述成膜材料粒子附著在表面,而形成薄膜, 其中,前述自公轉治具,是各別由前述繞轉移動的方向的先頭側及後尾側,與相鄰接的其他的前述自公轉治具重疊地配置,前述自公轉治具之由前述先頭側重疊的部分及由前述後尾側重疊的部分的其中任一方側,是位於比重疊的其他的前述自公轉治具更接近前述主旋轉軸線的位置,另一方側,是位於比重疊的其他的前述自公轉治具更遠離前述主旋轉軸線。 A film forming apparatus comprising: a vacuum chamber; a circular orbit disposed in the vacuum chamber; and a film forming source for discharging the film forming material particles into the vacuum chamber; and a plurality of substrates in which a plurality of substrates are disposed a self-propelling jig, a plurality of traveling wheels disposed on the circular orbit, and a jig attachment device for holding the plurality of self-revolving jigs, and a motor for rotating the jig attachment device around a main axis of rotation a plurality of the self-revolving jigs are disposed on the inner side of the circular orbit along the circular orbits in a circular shape, and the self-revolving jigs are respectively connected to the other traveling wheels. When the jig attachment device is rotated by the motor, the self-revolving jig is rotated around the circumference of the main rotation axis by the rotation of the jig attachment device, and the respective self-transfer The traveling wheel having the connection travels on the circular orbit while rotating around the axis of rotation of the wheel, and the self-revolution is performed by the rotation of the traveling wheel. The substrate is rotated around the axis of rotation of the jig, and the substrate disposed on the self-revolving jig is rotated and rotated together with the self-revolving jig, and the film-forming material particles are adhered thereto. Surface, forming a film, The self-revolving jig is disposed on the leading side and the trailing side of the direction of the revolving movement, and is disposed to overlap with another adjacent self-propelling jig, and the self-revolving jig is provided by the foregoing One of the side overlapping portions and the portion overlapping the rear end side is located closer to the main rotation axis than the other overlapping self-revolving jigs that overlap, and the other side is located at another ratio The aforementioned self-propelling jig is further away from the aforementioned main axis of rotation. 如申請專利範圍第1項的成膜裝置,其中,前述車輪旋轉軸線及前述治具旋轉軸線是非平行。 The film forming apparatus of claim 1, wherein the wheel rotation axis and the jig rotation axis are non-parallel. 如申請專利範圍第1項的成膜裝置,其中,藉由前述行走車輪的旋轉以前述車輪旋轉軸線為中心旋轉的車輪軸是被固定在前述行走車輪中,以前述治具旋轉軸線為中心旋轉的治具軸是被固定在前述自公轉治具中,設在前述車輪軸的能動齒輪、及設在前述治具軸的受動齒輪是嚙合,前述能動齒輪的旋轉是朝前述受動齒輪被傳達,藉由前述受動齒輪使前述治具軸及前述自公轉治具被旋轉。 The film forming apparatus of claim 1, wherein the wheel shaft that is rotated about the wheel rotation axis by the rotation of the traveling wheel is fixed in the traveling wheel and rotates around the rotation axis of the jig The jig shaft is fixed to the self-propelling jig, and the active gear provided on the wheel axle and the driven gear provided on the jig shaft are meshed, and the rotation of the movable gear is transmitted to the driven gear. The jig shaft and the self-revolving jig are rotated by the driven gear. 如申請專利範圍第1至3項中任一項的成膜裝置,其中,前述自公轉治具是設置5個以上。 The film forming apparatus according to any one of claims 1 to 3, wherein the self-revolving jig is provided in five or more.
TW104131820A 2014-09-29 2015-09-25 Film forming apparatus TW201623665A (en)

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