TW201612257A - Infrared ray shielding composition, infrared ray cut filter, solid state image sensor - Google Patents
Infrared ray shielding composition, infrared ray cut filter, solid state image sensorInfo
- Publication number
- TW201612257A TW201612257A TW104128238A TW104128238A TW201612257A TW 201612257 A TW201612257 A TW 201612257A TW 104128238 A TW104128238 A TW 104128238A TW 104128238 A TW104128238 A TW 104128238A TW 201612257 A TW201612257 A TW 201612257A
- Authority
- TW
- Taiwan
- Prior art keywords
- infrared ray
- shielding composition
- ray shielding
- cut filter
- image sensor
- Prior art date
Links
- 239000007787 solid Substances 0.000 title abstract 2
- 239000002904 solvent Substances 0.000 abstract 4
- 239000011230 binding agent Substances 0.000 abstract 1
- 238000009835 boiling Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 229910001930 tungsten oxide Inorganic materials 0.000 abstract 1
Classifications
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
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US (1) | US10975250B2 (zh) |
JP (1) | JP6326142B2 (zh) |
KR (1) | KR101925820B1 (zh) |
TW (1) | TWI693264B (zh) |
WO (1) | WO2016035633A1 (zh) |
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TWI743304B (zh) * | 2017-02-03 | 2021-10-21 | 日商三菱綜合材料股份有限公司 | 紅外線遮蔽膜形成用塗料、附有紅外線遮蔽膜之透明基體、及其製造方法 |
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JP2013151675A (ja) * | 2011-12-27 | 2013-08-08 | Fujifilm Corp | 赤外線吸収性組成物、これを用いた赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
CN108292662B (zh) * | 2015-12-03 | 2023-06-16 | 索尼半导体解决方案公司 | 半导体芯片和电子装置 |
KR102241230B1 (ko) | 2016-06-09 | 2021-04-16 | 후지필름 가부시키가이샤 | 착색 조성물 및 막의 제조 방법 |
JP7009806B2 (ja) * | 2017-07-18 | 2022-01-26 | 住友金属鉱山株式会社 | 複合タングステン酸化物粒子含有樹脂、複合タングステン酸化物粒子分散液および複合タングステン酸化物粒子分散粉 |
US10192915B1 (en) * | 2017-07-18 | 2019-01-29 | Visera Technologies Company Limited | Optical sensor and manufacturing method thereof |
JP7176229B2 (ja) * | 2018-05-25 | 2022-11-22 | 昭和電工マテリアルズ株式会社 | 樹脂組成物、硬化物、半導体装置及びその製造方法 |
JP7283993B2 (ja) * | 2019-06-20 | 2023-05-30 | アイカ工業株式会社 | 赤外線カットハードコート樹脂、及びそれを用いたハードコートフィルム |
JP7463677B2 (ja) * | 2019-09-17 | 2024-04-09 | Toppanホールディングス株式会社 | 赤外光カットフィルター、固体撮像素子用フィルター、固体撮像素子、および、固体撮像素子用フィルターの製造方法 |
JP7463678B2 (ja) * | 2019-09-17 | 2024-04-09 | Toppanホールディングス株式会社 | 赤外光カットフィルター、固体撮像素子用フィルター、固体撮像素子、および、固体撮像素子用フィルターの製造方法 |
US20220102409A1 (en) * | 2020-09-25 | 2022-03-31 | Visera Technologies Company Limited | Semiconductor device |
WO2024070672A1 (ja) * | 2022-09-30 | 2024-04-04 | 日本ゼオン株式会社 | レジスト組成物及びレジストパターン形成方法 |
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KR101167868B1 (ko) | 2006-03-10 | 2012-07-23 | 미쓰비시 가가꾸 가부시키가이샤 | 경화성 조성물, 컬러 필터, 및 액정 표시 장치 |
JP2007279676A (ja) | 2006-03-15 | 2007-10-25 | Nippon Shokubai Co Ltd | 近赤外線吸収性組成物及び近赤外線吸収材 |
JP5176492B2 (ja) * | 2007-11-06 | 2013-04-03 | 住友金属鉱山株式会社 | 近赤外線吸収粘着体、プラズマディスプレイパネル用近赤外線吸収フィルターおよびプラズマディスプレイパネル |
KR101691898B1 (ko) * | 2008-10-23 | 2017-01-02 | 데이터레이즈 리미티드 | 열 흡수 첨가제 |
US8901225B2 (en) | 2009-12-04 | 2014-12-02 | Toray Industries, Inc. | Photosensitive resin composition, laminate utilizing same and solid-state imaging device |
SG181620A1 (en) | 2009-12-11 | 2012-07-30 | Fujifilm Corp | Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device |
KR101655094B1 (ko) | 2009-12-15 | 2016-09-07 | 삼성전자 주식회사 | 휴대 단말기의 사용자 인터페이스 운용 방법 및 장치 |
JP5757749B2 (ja) * | 2010-05-19 | 2015-07-29 | 富士フイルム株式会社 | 重合性組成物 |
JP5240532B2 (ja) * | 2010-06-08 | 2013-07-17 | 住友金属鉱山株式会社 | 金属酸化物膜の製造方法 |
JP6113078B2 (ja) * | 2011-01-18 | 2017-04-12 | エルジー・ケム・リミテッド | 感光性樹脂組成物、感光材及び感光材の製造方法 |
JP5723699B2 (ja) | 2011-02-25 | 2015-05-27 | 富士フイルム株式会社 | 遮光性組成物、遮光性組成物の製造方法、ソルダレジスト、パターン形成方法、及び固体撮像素子 |
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TWI743304B (zh) * | 2017-02-03 | 2021-10-21 | 日商三菱綜合材料股份有限公司 | 紅外線遮蔽膜形成用塗料、附有紅外線遮蔽膜之透明基體、及其製造方法 |
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US20170166762A1 (en) | 2017-06-15 |
JPWO2016035633A1 (ja) | 2017-06-29 |
TWI693264B (zh) | 2020-05-11 |
WO2016035633A1 (ja) | 2016-03-10 |
KR20170038049A (ko) | 2017-04-05 |
KR101925820B1 (ko) | 2018-12-06 |
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