TW201610458A - 基於一維操縱光學相位陣列之三維映射二維掃描光達及其使用方法 - Google Patents
基於一維操縱光學相位陣列之三維映射二維掃描光達及其使用方法 Download PDFInfo
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- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/481—Constructional features, e.g. arrangements of optical elements
- G01S7/4814—Constructional features, e.g. arrangements of optical elements of transmitters alone
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- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/06—Systems determining position data of a target
- G01S17/08—Systems determining position data of a target for measuring distance only
- G01S17/10—Systems determining position data of a target for measuring distance only using transmission of interrupted, pulse-modulated waves
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- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/06—Systems determining position data of a target
- G01S17/42—Simultaneous measurement of distance and other co-ordinates
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/88—Lidar systems specially adapted for specific applications
- G01S17/89—Lidar systems specially adapted for specific applications for mapping or imaging
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/481—Constructional features, e.g. arrangements of optical elements
- G01S7/4817—Constructional features, e.g. arrangements of optical elements relating to scanning
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/481—Constructional features, e.g. arrangements of optical elements
- G01S7/4814—Constructional features, e.g. arrangements of optical elements of transmitters alone
- G01S7/4815—Constructional features, e.g. arrangements of optical elements of transmitters alone using multiple transmitters
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
- H01S5/0071—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for beam steering, e.g. using a mirror outside the cavity to change the beam direction
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Abstract
複數個一維平面光束形成及操縱光學相位陣列晶片形成一二維掃描固態光達,使得因為該一維光學相位陣列晶片的簡單性而能以高產率與低成本來製造三維映射時差測距光達。
Description
本申請案主張2014年8月15日申請之美國專利申請案第14/460,369號之優先權,該案之內容以引用之方式併入本文中。
本發明大體上係關於環境感測之領域,且更具體言之,本發明係關於用於即時三維映射及物件偵測、追蹤、識別及/或分類之時差測距(ToF)光達感測器之使用。
一光達感測器係一光偵測及測距感測器。一光學遠端感測模組可藉著使用來自一雷射之脈衝(或替代地一經調變之信號),用光來照射目標或場景,及量測光子行至該目標或地景且在反射後返回至光達模組中之一接收器所花的時間來量測至一目標或一場景中之物件的距離。偵測經反射的脈衝(或經調變的信號),其中時差測距及脈衝(或經調變之信號)的強度分別係所感測之物件之距離與反射率的量測值。
習知光達感測器使用機械移動部件來掃描雷射光束。在包含用於汽車應用中之特定系統的一些系統中(諸如先進駕駛輔助系統(ADAS)及自主駕駛系統),最好使用固態感測器,此係因為其具有各
種潛在優勢,包含(但不限於)更高的感測器可靠性、更長的感測器壽命、更小的感測器尺寸、更小的感測器重量及更低的感測器成本。
數十年前,將用於產生雷達相位陣列的射頻(RF)延遲線用於固態操縱雷達信號。二十年前,將與偵測器及RF天線陣列組合之基於光子積體電路(PIC)的延遲線用於改良固態操縱雷達信號中之延遲的精確性。具有微尺度及奈米尺度裝置之PIC可用於產生用於固態操縱雷射光束的光學相位陣列(OPA),包括可調諧光學延遲線及光學天線。
當前所生產之光域中的相位陣列係複雜、價格昂貴,及/或具有不同於光束形成及光束操縱之一目的;其中一些結合空間濾波器、光學放大器及環形雷射(US 7,339,727)、一些涉及複數個光學輸入光束(US 7,406,220)、一些涉及體積繞射光柵及複數個輸入方向(US 7,428,100)、一些結合複數個波長之光束(US 7,436,588)、一些具有光學相位參考源及增益元件(US 7,489,870)、一些具有視域中之預定區域及複數個光束形成元件(US 7,532,311),且一些具有多頻率及多光學相位參考源(US 7,555,217)。
當前生產之光學領域中的二維光束形成及操縱相位陣列具有低產率且價格昂貴,此係因為其等係在具有一複雜二維像素陣列的二維中操作。
形成且操縱光學相位陣列(OPA)晶片之複數個一維(1D)平面光束形成一二維(2D)掃描固態光達,使得可因為該1D OPA晶片的簡單性而以高產率且低成本來製造三維(3D)映射時差測距光達。
10‧‧‧1D平面光束形成及操縱光學相位陣列晶片
20‧‧‧雙頭箭頭
30‧‧‧漸變折射率(GRIN)透鏡
40‧‧‧晶片上光柵40
以下圖式繪示本發明之實施例且不意欲限制本發明,本發明由形成本申請案之部分得申請專利範圍所涵蓋。
圖1之示意圖描繪形成及操縱光學相位陣列晶片10之複數個1D平
面光束。雙頭箭頭20位於視域內之操縱平面中。一漸變折射率(GRIN)透鏡30係與各晶片一起使用,以減小垂直於操縱方向之維度中的光點尺寸。替代地,可使用一幾何折射透鏡、一繞射光學元件(DOE)或一全像光學元件(HOE)以獲致該光點尺寸的減小。
圖2之示意圖描繪複數個1D平面光束形成及操縱光學相位陣列晶片10。雙頭箭頭20位於視域內之操縱平面中。利用一晶片上光柵40來減小垂直於操縱方向之維度中的光點尺寸。
一基於光達之設備及方法使用光子積體電路(PIC)來固態操縱雷射光束。使用積體光學設計及製造微技術及奈米技術來生產晶片尺度的光學分光器,該等光學分光器分配來自一雷射之基本上與像素之一陣列一致的光學信號,該等像素包括可調諧光學延遲線及光學天線。該等天線實現光之面外耦合。
當調諧該陣列中之該等含有天線之像素的延遲線時,各天線發射一特定相位之光以透過此等發射之干涉來形成一所需之遠場輻射場型。該陣列充當固態光學相位陣列(OPA)之功能。
藉由併入大量天線,可由一OPA來實現高解析度遠場場型,從而支援固態光達中所需之輻射場型光束形成及操縱,以及產生在三維全像、光學記憶體、用於光學空間分割多工化、自由空間通信及生物醫學科學之模式匹配中所需的任意輻射場型。儘管從一陣列來成像傳統上係透過像素的強度來傳達,OPA允許透過控制從一單一源接收同調光波之像素的光學相位來成像。
複數個一維(1D)平面光束形成及操縱光學相位陣列晶片係一固態光達中之傳輸器的簡單建構區塊,使得能以高產率及低成本來製造光達。
利用至少一晶片外透鏡或至少一晶片上光柵來減小各該晶片之
光點尺寸的垂直維度(即,垂直於操縱方向的維度)。
該等晶片外透鏡之類型包含(但不限於):折射透鏡
漸變折射率(GRIN)透鏡
繞射光學元件(DOE)
全像光學元件(HOE)
含有一OPA PIC之各晶片宜與一互補金屬氧化物半導體(CMOS)程序相容。
經耦合至複數個晶片中之光學能力可源自於一單一雷射或複數個雷射。
10‧‧‧1D平面光束形成及操縱光學相位陣列晶片
20‧‧‧雙頭箭頭
30‧‧‧漸變折射率(GRIN)透鏡
Claims (10)
- 一種三維映射二維掃描時差測距光達測距設備,其包括複數個基於一維光學相位陣列之雷射光束形成及操縱光子積體電路晶片。
- 如請求項1之設備,其中該等複數個光子積體電路晶片使用一系列元件之至少一子集作為沿垂直於該一維光學相位陣列之該操縱平面之該方向控制光束尺寸的手段來形成且操縱雷射光束,該系列元件之至少一子集包括:至少一晶片外透鏡;及至少一晶片上光柵。
- 如請求項2之設備,其中該至少一晶片外透鏡包括一系列元件之一子集,其包含但不限於:至少一折射透鏡;至少一漸變折射率透鏡;至少一繞射光學元件;及至少一全像光學元件。
- 如請求項1之設備,其中經耦合至該等複數個光子積體電路晶片內之該等光信號係從一單一雷射中產生。
- 如請求項1之設備,其中經耦合至該等複數個光子積體電路晶片內之該等光信號係從複數個雷射中產生。
- 一種使用二維掃描時差測距光達測距設備來形成三維映射之方法,該設備包括複數個基於一維光學相位陣列之雷射光束形成及操縱光子積體電路晶片。
- 如請求項6之方法,其中該等複數個光子積體電路晶片使用一系列元件之至少一子集作為沿垂直於該一維光學相位陣列之該操 縱平面之該方向控制光束尺寸的手段來形成且操縱雷射光束,該系列元件之至少一子集包括:至少一晶片外透鏡;及至少一晶片上光柵。
- 如請求項7之方法,其中該至少一晶片外透鏡包括一系列元件之一子集,其包含但不限於:至少一折射透鏡;至少一漸變折射率透鏡;至少一繞射光學元件;及至少一全像光學元件。
- 如請求項6之方法,其中經耦合至該等複數個光子積體電路晶片內之該等光信號係從一單一雷射產生。
- 如請求項6之方法,其中經耦合至該等複數個光子積體電路晶片內之該等光信號係從複數個雷射產生。
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US14/460,369 US9869753B2 (en) | 2014-08-15 | 2014-08-15 | Three-dimensional-mapping two-dimensional-scanning lidar based on one-dimensional-steering optical phased arrays and method of using same |
US14/460,369 | 2014-08-15 |
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TWI658286B (zh) | 2019-05-01 |
EP3180655B1 (en) | 2021-12-08 |
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JP2017525963A (ja) | 2017-09-07 |
CN106716240B (zh) | 2020-01-14 |
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