TW201606916A - Conveying apparatus - Google Patents

Conveying apparatus Download PDF

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Publication number
TW201606916A
TW201606916A TW104113056A TW104113056A TW201606916A TW 201606916 A TW201606916 A TW 201606916A TW 104113056 A TW104113056 A TW 104113056A TW 104113056 A TW104113056 A TW 104113056A TW 201606916 A TW201606916 A TW 201606916A
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TW
Taiwan
Prior art keywords
frame
conveying
attracting
adsorption
annular frame
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Application number
TW104113056A
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Chinese (zh)
Inventor
Minoru Suzuki
Original Assignee
Disco Corp
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Publication of TW201606916A publication Critical patent/TW201606916A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices

Abstract

The subject of the present invention is to provide a conveying apparatus capable of increasing operation performance. The solution means is a conveying apparatus conveying a processed object installed on a ring-like frame through a glue tape adhered to the backside. It is characterized by comprising a conveying arm, a conveying pickup installed on the conveying arm and a moving means operable to move the conveying pickup. The conveying pickup includes a supporting component installed on the conveying arm, at least a pair of first attracting pads having first attracting-holding faces for attracting and holding a first ring-like frame while the pair of first attracting pads is installed on the supporting component and separated by a distance of a first diameter of the first ring-like frame, and at least a pair of second attracting pads having second attracting-holding faces for attracting and holding a second ring-like frame while the pair of second attracting pads is installed on the supporting component and separated by a distance of a second diameter of the second ring-like frame longer than the first diameter, wherein the first attracting-holding faces are positioned above the second attracting-holding faces.

Description

搬送裝置 Transport device 發明領域 Field of invention

本發明是有關於一種用以搬送透過膠帶而被裝設在環狀框架上之被加工物的搬送裝置。 The present invention relates to a conveying apparatus for conveying a workpiece to be attached to an annular frame through a tape.

發明背景 Background of the invention

對於切削裝置、雷射加工裝置等之加工裝置,為了能完整地實施目的之加工或是為了容易進行操作處理,會將晶圓的背面黏貼在將外周部黏貼於環狀框架上的作為黏貼膠帶的切割膠帶上而形成框架單元,並以框架單元的形態對晶圓盒搬入搬出框架單元,或是進行在加工裝置內的搬送。 For processing devices such as cutting devices and laser processing devices, in order to be able to perform the processing for the entire purpose or to facilitate the handling, the back side of the wafer is adhered to the adhesive tape which adheres the outer peripheral portion to the annular frame. The frame unit is formed on the dicing tape, and the cassette is carried into and out of the frame unit in the form of a frame unit, or transported in the processing apparatus.

在以往的切削裝置中,是將搬送裝置的搬送頭,因應φ 6英吋用、φ 8英吋用等的環狀框架的尺寸,而在支撐構件上安裝成可以將吸附保持環狀框架的吸附墊的位置予以變更。 In the conventional cutting device, the transfer head of the transport device is attached to the support member so as to be capable of holding and holding the annular frame in accordance with the size of the annular frame for φ 6 inches and φ 8 inches. The position of the adsorption pad is changed.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本專利特開2003-086543號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2003-086543

發明概要 Summary of invention

在以往的切削裝置、雷射加工裝置等之加工裝置上所搭載的搬送裝置上,是被設計成能夠因應環狀框架的尺寸而變更吸附墊之安裝位置。然而,每次都要因應框架單元的環狀框架之尺寸來變更吸附墊之安裝位置的作法存有費工耗時的問題。 In the transport apparatus mounted on a processing apparatus such as a conventional cutting apparatus or a laser processing apparatus, the mounting position of the adsorption pad can be changed in accordance with the size of the annular frame. However, it is time-consuming and labor-intensive to change the mounting position of the adsorption pad in response to the size of the annular frame of the frame unit.

本發明是有鑒於此問題點而作成的發明,其目的在於提供一種可以提升作業性之搬送裝置。 The present invention has been made in view of the above problems, and an object thereof is to provide a conveying apparatus capable of improving workability.

依照本發明所提供的搬送裝置,是用於搬送透過黏貼於背面之膠帶而被裝設在環狀框架上之被加工物的搬送裝置。特徵在於其包括搬送臂、裝設於該搬送臂上的搬送頭,以及使該搬送頭移動的移動手段,該搬送頭具備安裝在該搬送臂上的支撐構件、以對應具有第一直徑的第一環狀框架的該第一直徑之距離分開,而被安裝於該支撐構件上之具有吸附保持該第一環狀框架的第一吸附保持面的至少一對第一吸附墊,以及以對應具有大於第一直徑的第二直徑之第二環狀框架的該第二直徑之距離分開,而被安裝於該支撐構件上之具有吸附保持該第二環狀框架的第二吸附保持面的至少一對第二吸附墊,且該第一吸附保持面位在比第二吸附保持面更上方之處。 The conveying device according to the present invention is a conveying device for conveying a workpiece to be attached to an annular frame through an adhesive tape adhered to the back surface. It is characterized in that it includes a transfer arm, a transfer head mounted on the transfer arm, and a moving means for moving the transfer head, the transfer head including a support member attached to the transfer arm to correspond to a first diameter The first diameter of the annular frame is separated by a distance, and the at least one pair of first adsorption pads having the first adsorption holding surface that adsorbs and holds the first annular frame are mounted on the support member, and correspondingly have The second diameter of the second annular frame of the second diameter larger than the first diameter is separated by a distance, and at least one of the second adsorption holding surfaces of the second annular frame that is attached to the support member is adsorbed and held by the second annular frame For the second adsorption pad, and the first adsorption retention surface is located above the second adsorption retention surface.

根據本發明所提供之搬送裝置,由於可不需要每 次因應框架單元的框架尺寸而變更吸附墊的位置之作業,因此可以提升作業性。 According to the conveying device provided by the present invention, since it is not necessary to The work of changing the position of the adsorption pad in response to the frame size of the frame unit can improve the workability.

2‧‧‧切削裝置 2‧‧‧Cutting device

4‧‧‧操作面板 4‧‧‧Operator panel

6‧‧‧顯示螢幕 6‧‧‧Display screen

8‧‧‧晶圓盒 8‧‧‧wafer box

9‧‧‧晶圓盒升降機 9‧‧‧Facsimile lifts

10‧‧‧搬出入單元 10‧‧‧ Moving in and out of the unit

11‧‧‧半導體晶圓 11‧‧‧Semiconductor wafer

11a‧‧‧晶圓表面 11a‧‧‧ wafer surface

12‧‧‧暫置區域 12‧‧‧ temporary area

13‧‧‧切割道 13‧‧‧ cutting road

14‧‧‧定位機構 14‧‧‧ Positioning agency

15‧‧‧元件 15‧‧‧ components

16‧‧‧旋繞式搬送裝置 16‧‧‧Rolling conveyor

17‧‧‧框架單元 17‧‧‧Frame unit

18‧‧‧工作夾台 18‧‧‧Working table

20‧‧‧夾具 20‧‧‧ fixture

22‧‧‧校準單元 22‧‧‧ calibration unit

24‧‧‧攝像單元 24‧‧‧ camera unit

26‧‧‧切削單元 26‧‧‧Cutting unit

28‧‧‧主軸 28‧‧‧ Spindle

30‧‧‧切削刀 30‧‧‧Cutter

32‧‧‧搬送裝置 32‧‧‧Transporting device

34‧‧‧旋轉洗淨單元 34‧‧‧Rotary cleaning unit

36‧‧‧搬送臂 36‧‧‧Transport arm

38‧‧‧搬送頭 38‧‧‧Removing head

40‧‧‧氣缸 40‧‧‧ cylinder

41‧‧‧活塞桿 41‧‧‧ piston rod

42‧‧‧塊體 42‧‧‧ Block

44‧‧‧支撐構件 44‧‧‧Support members

46‧‧‧第一支撐臂 46‧‧‧First support arm

48‧‧‧第二支撐臂 48‧‧‧second support arm

50‧‧‧第一吸附墊 50‧‧‧First adsorption pad

50a‧‧‧第一吸附保持面 50a‧‧‧First adsorption holding surface

50b、52b‧‧‧吸附高度 50b, 52b‧‧‧Adsorption height

52‧‧‧第二吸附墊 52‧‧‧Second adsorption pad

52a‧‧‧第二吸附保持面 52a‧‧‧Second adsorption holding surface

54、58‧‧‧電磁切換閥 54, 58‧‧‧Electromagnetic switching valve

56‧‧‧吸引源 56‧‧‧Attraction source

60‧‧‧移動手段 60‧‧‧moving means

F‧‧‧環狀框架 F‧‧‧Ring frame

F1‧‧‧第一環狀框架 F1‧‧‧ first ring frame

F2‧‧‧第二環狀框架 F2‧‧‧second ring frame

T‧‧‧切割膠帶 T‧‧‧ cutting tape

圖1是具備本發明之搬送裝置的切削裝置之立體圖。 Fig. 1 is a perspective view of a cutting device including a conveying device of the present invention.

圖2是半導體晶圓的表面側立體圖。 2 is a front side perspective view of a semiconductor wafer.

圖3是透過切割膠帶而以環狀框架支撐晶圓之框架單元的立體圖。 3 is a perspective view of a frame unit that supports a wafer in an annular frame through a dicing tape.

圖4是本發明實施形態之搬送裝置的立體圖。 Fig. 4 is a perspective view of the conveying device according to the embodiment of the present invention.

圖5是搬送裝置的局部剖面側視圖。 Fig. 5 is a partial cross-sectional side view of the conveying device.

圖6(A)為搬送φ 6英吋用框架時的局部剖面側視圖,圖6(B)是搬送φ 8英吋用框架時的局部剖面側視圖。 Fig. 6(A) is a partial cross-sectional side view showing a frame for transporting φ 6 inches, and Fig. 6(B) is a partial cross-sectional side view showing a frame for transporting φ 8 inches.

用以實施發明之形態 Form for implementing the invention

以下,參照圖式詳細地說明本發明之實施形態。參照圖1,所示為具備本發明實施形態之搬送裝置的切削裝置之立體圖。在切削裝置2之前面側設有用於供操作人員輸入加工條件等對裝置進行之指示的操作面板4。在裝置上部設有CRT等之顯示螢幕6,能夠顯示對操作人員之導引畫面與由後述之攝像單元所拍攝到的影像。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Referring to Fig. 1, there is shown a perspective view of a cutting apparatus including a conveying apparatus according to an embodiment of the present invention. An operation panel 4 for instructing an operator to input a processing condition or the like to the apparatus is provided on the front side of the cutting device 2. A display screen 6 such as a CRT is provided on the upper portion of the apparatus, and a guidance screen for the operator and an image captured by an imaging unit to be described later can be displayed.

作為切削裝置2之切削對象的半導體晶圓(以下,有時會簡稱為晶圓)11,如圖2所示,是由例如厚度為700μm的矽晶圓所構成,並在表面11a上使複數條切割道(分割預定線)13形成為格子狀,並且在以複數條切割道13所劃分出 的各區域中形成有IC、LSI等的元件15。 As a semiconductor wafer to be cut by the cutting device 2 (hereinafter, simply referred to as a wafer) 11, as shown in FIG. 2, for example, a silicon wafer having a thickness of 700 μm is formed, and plural numbers are formed on the surface 11a. The strip cutting lane (divided line) 13 is formed in a lattice shape and is divided by a plurality of cutting lanes 13 An element 15 such as an IC or an LSI is formed in each of the areas.

晶圓11,如圖3所示,是在將背面黏貼在外周部被黏貼於環狀框架F上之作為黏著膠帶之切割膠帶T上而被做成框架單元17的形態後,再以複數片的形式將框架單元17收容於圖1所示之晶圓盒8之中。晶圓盒8是載置於可以上下移動的晶圓盒升降機9之上。 As shown in FIG. 3, the wafer 11 is formed by the frame unit 17 in a state in which the back surface is adhered to the dicing tape T as an adhesive tape which is adhered to the annular frame F at the outer peripheral portion, and then the plurality of sheets are formed. The frame unit 17 is housed in the wafer cassette 8 shown in FIG. The wafer cassette 8 is placed on a wafer cassette elevator 9 that can be moved up and down.

在載置於晶圓盒升降機9上的晶圓盒8之後方,設置有用於將切削前的框架單元17從晶圓盒8搬出,並且將切削後的框架單元17搬入晶圓盒8的搬出入單元10。 After the wafer cassette 8 placed on the wafer cassette elevator 9, the frame unit 17 before cutting is carried out from the wafer cassette 8, and the frame unit 17 after the cutting is carried into the wafer cassette 8 is carried out. Enter unit 10.

在晶圓盒8與搬出入單元10之間,設置有作為暫時載置搬出入對象之框架單元17的區域的暫置區域12,在暫置區域12中配置有使框架單元17定位在固定位置的定位機構14。 Between the wafer cassette 8 and the carry-in/out unit 10, a temporary area 12 as a region for temporarily loading and unloading the frame unit 17 for loading and unloading is provided, and in the temporary area 12, the frame unit 17 is placed at a fixed position. Positioning mechanism 14.

暫置區域12的附近,配置有用以吸附並搬送框架單元17之旋繞式搬送裝置16,且被搬出而定位至暫置區域12的框架單元17,是藉由搬送裝置16而被吸附以被搬送至已定位在起始位置的工作夾台18上,並被工作夾台18吸引保持。 In the vicinity of the temporary area 12, the bobbin type conveying device 16 that adsorbs and transports the frame unit 17 is disposed, and the frame unit 17 that is carried out and positioned to the temporary area 12 is adsorbed by the conveying device 16 to be conveyed. It is positioned on the work chuck 18 that has been positioned at the home position and is held by the work chuck 18.

工作夾台18是構成為可旋轉且藉由圖未示之加工進給機構在X軸方向上來回移動,在工作夾台18之X軸方向的移動路徑的上方配置有用以檢測晶圓11之用來切削之區域的校準單元22。20是夾持框架單元17之環狀框架F的夾具。 The work chuck 18 is configured to be rotatable and moved back and forth in the X-axis direction by a machining feed mechanism (not shown), and is disposed above the movement path of the work chuck 18 in the X-axis direction to detect the wafer 11 The calibration unit 22. 20 for the area to be cut is a jig that clamps the annular frame F of the frame unit 17.

校準單元22具備有用以拍攝晶圓11之表面的攝 像單元24,並可根據拍攝所取得的影像,藉由型樣匹配等影像處理來檢測用來切削之區域。藉由攝像單元24所取得之影像可被顯示在顯示螢幕6上。 The calibration unit 22 is provided to take a picture of the surface of the wafer 11 Like the unit 24, the area for cutting can be detected by image processing such as pattern matching based on the image taken by the shooting. The image obtained by the camera unit 24 can be displayed on the display screen 6.

在校準單元22的左側,配置有對被保持於工作夾台18上的晶圓11施行切削加工的切削單元26。切削單元26是與校準單元22一體地被構成,並將兩者連動而在Y軸方向及Z軸方向上移動。 On the left side of the calibration unit 22, a cutting unit 26 that performs cutting processing on the wafer 11 held on the working chuck 18 is disposed. The cutting unit 26 is configured integrally with the calibration unit 22, and moves the two in the Y-axis direction and the Z-axis direction in conjunction with each other.

切削單元26是將外周具有刀刃之切削刀30裝設於藉由馬達而被旋轉驅動之主軸28之前端部而構成,且可在Y軸方向及Z軸方向上移動。切削刀30是在攝像單元24的X軸方向的延長線上。切削單元26之Y軸方向的移動是透過圖未示之分度進給機構來達成。 The cutting unit 26 is configured by attaching a cutting blade 30 having a cutting edge on the outer circumference to a front end portion of the main shaft 28 that is rotationally driven by a motor, and is movable in the Y-axis direction and the Z-axis direction. The cutter 30 is an extension line in the X-axis direction of the imaging unit 24. The movement of the cutting unit 26 in the Y-axis direction is achieved by an indexing feed mechanism not shown.

34是用以洗淨已結束切削加工之晶圓11的旋轉洗淨單元,當晶圓11的切削加工結束後,工作夾台18會回到起始位置,且在解除工作夾台18的吸引保持及夾具20後,可透過搬送裝置32將框架單元17搬送至旋轉洗淨單元34,並在旋轉洗淨單元34進行旋轉洗淨及旋轉乾燥。 34 is a spin cleaning unit for washing the wafer 11 that has finished the cutting process. When the cutting process of the wafer 11 is completed, the work chuck 18 returns to the home position, and the suction of the work chuck 18 is released. After holding and the jig 20, the frame unit 17 can be conveyed to the spin cleaning unit 34 through the transport device 32, and the spin cleaning unit 34 performs spin cleaning and spin drying.

接著,參照圖4至圖6,將針對本發明實施形態之搬送裝置32詳細地進行說明。參照圖4,所示為搬送裝置32之立體圖。搬送裝置32之搬送臂36是透過移動手段60而在Y軸方向上移動。 Next, a conveying device 32 according to an embodiment of the present invention will be described in detail with reference to Figs. 4 to 6 . Referring to Figure 4, a perspective view of the transport device 32 is shown. The transfer arm 36 of the transport device 32 is moved in the Y-axis direction by the moving means 60.

搬送臂36之前端部上,安裝有可在上下方向上移動的搬送頭38。亦即,如最清楚地顯示在圖5上的,在搬送臂36之前端部的下表面安裝有氣缸40,並將氣缸40之活塞 桿41之前端連結到被固定在支撐構件44的塊體42上,其中該支撐構件44是在搬送頭38之Y軸方向上伸長。當作動氣缸40時,會使活塞桿41伸長或收縮,並使支撐構件44因應於此而在上下方向上移動。 A transfer head 38 that is movable in the vertical direction is attached to the front end portion of the transfer arm 36. That is, as shown most clearly in Fig. 5, the cylinder 40 is mounted on the lower surface of the front end of the transfer arm 36, and the piston of the cylinder 40 is mounted. The front end of the rod 41 is coupled to a block 42 that is fixed to the support member 44, wherein the support member 44 is elongated in the Y-axis direction of the transfer head 38. When the cylinder 40 is actuated, the piston rod 41 is extended or contracted, and the support member 44 is moved in the vertical direction in response to this.

在支撐構件44上,是將以對應於φ 6英吋用之環狀框架F1之直徑(第一直徑)之距離分開的一對支撐臂46一體地連結,此外,還將以對應於φ 8英吋用之環狀框架F2之直徑(比第一直徑更大的第二直徑)之距離分開的一對支撐臂48一體地連結。在此,環狀框架F之直徑,是指環狀框架F之寬度方向中央部分的直徑。 On the support member 44, a pair of support arms 46 separated by a distance corresponding to the diameter (first diameter) of the annular frame F1 for φ 6 inches are integrally joined, and further, corresponding to φ 8 A pair of support arms 48 separated by a distance of a diameter (a second diameter larger than the first diameter) of the annular frame F2 for the inch is integrally coupled. Here, the diameter of the annular frame F refers to the diameter of the central portion of the annular frame F in the width direction.

於各支撐臂46的兩端部安裝有具有第一吸附保持面50a之第一吸附墊50,且於各支撐臂48的兩端部安裝有具有第二吸附保持面52a之第二吸附墊52。 A first adsorption pad 50 having a first adsorption holding surface 50a is attached to both end portions of each support arm 46, and a second adsorption pad 52 having a second adsorption holding surface 52a is attached to both end portions of each support arm 48. .

如圖5所示,是以使第一吸附墊50之吸附保持面50a之高度位置50b位於比第二吸附墊52之吸附保持面52a之高度位置52b更上方的形式,來將吸附墊50、52各自安裝在第一支撐臂46、第二支撐臂48上。 As shown in FIG. 5, the adsorption pad 50 is placed in such a manner that the height position 50b of the adsorption holding surface 50a of the first adsorption pad 50 is located above the height position 52b of the adsorption holding surface 52a of the second adsorption pad 52. 52 are each mounted on the first support arm 46 and the second support arm 48.

如圖4所示,4個第一吸附墊50是透過電磁切換閥54連接到吸引源56,且4個第二吸附墊52是透過電磁切換閥58連接到吸引源56。 As shown in FIG. 4, the four first adsorption pads 50 are connected to the suction source 56 through the electromagnetic switching valve 54, and the four second adsorption pads 52 are connected to the suction source 56 through the electromagnetic switching valve 58.

其次,參照圖6,說明搬送裝置32的使用方法。在搬送用以支撐φ 6英吋之晶圓11之第一環狀框架F1時,如圖6(A)所示,是將電磁切換閥54切換至導通位置而使第一吸附墊50連接到吸引源56,並以第一吸附墊50將第一環狀 框架F1吸附保持,且藉由以移動手段60移動搬送臂36之方式,來搬送透過切割膠帶T而被支撐在第一環狀框架F1上之φ 6英吋晶圓11。 Next, a method of using the transport device 32 will be described with reference to Fig. 6 . When the first annular frame F1 for supporting the wafer 11 of φ 6 inches is transported, as shown in FIG. 6(A), the electromagnetic switching valve 54 is switched to the conductive position to connect the first adsorption pad 50 to The source 56 is attracted and the first ring is taken by the first adsorption pad 50 The frame F1 is adsorbed and held, and the φ 6 inch wafer 11 supported by the dicing tape T on the first annular frame F1 is conveyed by moving the transfer arm 36 by the moving means 60.

此時,由於第一環狀框架F1的外徑比在Y軸方向上分開之第二吸附墊52與52之間的距離小,因此可以在不會發生第二吸附墊52干涉到第一環狀框架F1之情況下,以第一吸附墊50吸附保持第一環狀框架F1。 At this time, since the outer diameter of the first annular frame F1 is smaller than the distance between the second adsorption pads 52 and 52 which are separated in the Y-axis direction, the second adsorption pad 52 can be prevented from interfering with the first ring. In the case of the frame F1, the first annular frame F1 is sucked and held by the first adsorption pad 50.

另一方面,在搬送用以支撐φ 8英吋之晶圓11之第二環狀框架F2時,是將電磁切換閥54切換至斷開位置,並且將電磁切換閥58切換至導通位置,以使第二吸附墊52連接到吸引源56。 On the other hand, when the second annular frame F2 for supporting the wafer 11 of φ 8 inches is transported, the electromagnetic switching valve 54 is switched to the off position, and the electromagnetic switching valve 58 is switched to the on position. The second adsorption pad 52 is coupled to the attraction source 56.

藉此,如圖6(B)所示,能夠以第二吸附墊52將支撐φ 8英吋之晶圓11的第二環狀框架F2予以吸附保持並搬送。此時,由於第一吸附墊50之吸附保持面50a位於比第二吸附墊52之吸附保持面52a更上方之處,因此當以第二吸附墊52吸附保持第二環狀框架F2時,第一吸附墊50並不會造成干涉。 Thereby, as shown in FIG. 6(B), the second annular frame F2 supporting the wafer 11 of φ 8 inches can be adsorbed and held by the second adsorption pad 52. At this time, since the adsorption holding surface 50a of the first adsorption pad 50 is located above the adsorption holding surface 52a of the second adsorption pad 52, when the second annular frame F2 is adsorbed and held by the second adsorption pad 52, An adsorption pad 50 does not cause interference.

在上述的說明中,雖然是以將搬送頭38應用於搬送裝置32之例來說明,但旋繞式的搬送裝置16也可具有與搬送頭38同樣的機構,而可以選擇性地將支撐φ 6英吋晶圓11的第一環狀框架F1及支撐φ 8英吋晶圓11的第二環狀框架F2予以吸附保持。 In the above description, the transfer head 38 is applied to the conveying device 32. However, the winding type conveying device 16 may have the same mechanism as the conveying head 38, and the support φ 6 may be selectively supported. The first annular frame F1 of the inch wafer 11 and the second annular frame F2 supporting the φ 8 inch wafer 11 are adsorbed and held.

在上述之實施形態的搬送裝置中,雖然是以對φ 6英吋用之環狀框架F1及φ 8英吋之環狀框架F2進行吸附保 持之例來說明,但本發明並不限定於用以支撐φ 6英吋用及φ 8英吋用之環狀框架,在對直徑不同之兩種環狀框架選擇性地予以吸附保持的情況中皆可使用。 In the conveying apparatus of the above-described embodiment, the annular frame F1 for φ 6 inches and the annular frame F2 of φ 8 inches are adsorbed and protected. The present invention is not limited to the case of a ring frame for supporting φ 6 inches and φ 8 inches, and selectively adsorbing and holding two annular frames having different diameters. Can be used in all.

此外,上述的實施形態中,雖然是針對將本發明之搬送措施應用於切削裝置之例作說明,但本發明並不限定於此,在透過切割膠帶以環狀框架支撐被加工物之雷射加工裝置等其他的加工裝置上也可同樣地適用。 Further, in the above-described embodiment, the case where the conveying means of the present invention is applied to the cutting device will be described. However, the present invention is not limited thereto, and the laser beam of the workpiece is supported by the annular frame through the dicing tape. The same can be applied to other processing apparatuses such as processing apparatuses.

11‧‧‧半導體晶圓 11‧‧‧Semiconductor wafer

32‧‧‧搬送裝置 32‧‧‧Transporting device

36‧‧‧搬送臂 36‧‧‧Transport arm

38‧‧‧搬送頭 38‧‧‧Removing head

44‧‧‧支撐構件 44‧‧‧Support members

50‧‧‧第一吸附墊 50‧‧‧First adsorption pad

52‧‧‧第二吸附墊 52‧‧‧Second adsorption pad

F1‧‧‧第一環狀框架 F1‧‧‧ first ring frame

F2‧‧‧第二環狀框架 F2‧‧‧second ring frame

T‧‧‧切割膠帶 T‧‧‧ cutting tape

Claims (1)

一種搬送裝置,是用於搬送透過黏貼於背面之膠帶而被裝設在環狀框架上之被加工物的搬送裝置,特徵在於其包括:搬送臂;裝設於該搬送臂之搬送頭;以及使該搬送頭移動之移動手段,該搬送頭具備:安裝在該搬送臂上的支撐構件;以對應具有第一直徑的第一環狀框架的該第一直徑之距離分開,而被安裝於該支撐構件上之具有吸附保持該第一環狀框架的第一吸附保持面的至少一對第一吸附墊;以及以對應具有大於第一直徑的第二直徑之第二環狀框架的該第二直徑之距離分開,而被安裝於該支撐構件上之具有吸附保持該第二環狀框架的第二吸附保持面的至少一對第二吸附墊,且該第一吸附保持面是位在比第二吸附保持面更上方之處。 A conveying device for conveying a workpiece to be attached to an annular frame through a tape adhered to the back surface, characterized in that it includes: a transfer arm; and a transfer head mounted on the transfer arm; a moving means for moving the transfer head, the transfer head having: a support member attached to the transfer arm; and being attached to the first diameter of the first annular frame having the first diameter At least one pair of first adsorption pads on the support member having a first adsorption retention surface that adsorbs and holds the first annular frame; and the second second corresponding annular frame having a second diameter greater than the first diameter The distance between the diameters is separated, and the at least one pair of second adsorption pads having the second adsorption holding surface that adsorbs and holds the second annular frame are mounted on the support member, and the first adsorption holding surface is located at a ratio The second adsorption retains the surface above.
TW104113056A 2014-06-09 2015-04-23 Conveying apparatus TW201606916A (en)

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