TWI654046B - Cutting device - Google Patents

Cutting device

Info

Publication number
TWI654046B
TWI654046B TW104107939A TW104107939A TWI654046B TW I654046 B TWI654046 B TW I654046B TW 104107939 A TW104107939 A TW 104107939A TW 104107939 A TW104107939 A TW 104107939A TW I654046 B TWI654046 B TW I654046B
Authority
TW
Taiwan
Prior art keywords
cutting
insulating base
working
clamping table
working clamping
Prior art date
Application number
TW104107939A
Other languages
Chinese (zh)
Other versions
TW201544248A (en
Inventor
松山敏文
楊云峰
Original Assignee
日商迪思科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW201544248A publication Critical patent/TW201544248A/en
Application granted granted Critical
Publication of TWI654046B publication Critical patent/TWI654046B/en

Links

Abstract

本發明之課題是提供一種具備有低價且高剛性之絕緣基座之切削裝置。解決手段是一種切削裝置,其包括有:具有保持被加工物之保持面之工作夾台、以切削刀切削被該工作夾台所保持之被加工物之切削組件、使該切削組件相對該工作夾台相對地在切入方向上移動之切入進給組件、使該切削刀接觸於該工作夾台之表面以透過電導通檢測切入方向之基準位置之設置組件。其特徵在於,該工作夾台包含:具有與該保持面齊平之設置部之導電性的本體部,及支撐該本體部之絕緣基座。該絕緣基座是透過陶瓷塗膜將表面進行絕緣處理。 An object of the present invention is to provide a cutting apparatus including an insulating base having low cost and high rigidity. The solution is a cutting device comprising: a working clamping table having a holding surface for holding a workpiece; and a cutting assembly for cutting a workpiece held by the working clamping table with a cutting cutter, the cutting assembly is opposed to the working clamp The table is moved relative to the cutting member in the cutting direction, and the cutting blade is brought into contact with the surface of the working table to transmit the electrical conduction to the setting component of the reference position in the cutting direction. The working clamp includes a body portion having conductivity of a portion that is flush with the holding surface, and an insulating base that supports the body portion. The insulating base is insulated by a ceramic coating film.

Description

切削裝置 Cutting device 發明領域 Field of invention

本發明是有關於一般之切削裝置,尤其是有關於在切削刀的設置時用以支撐工作夾台之本體部的支撐構造。 The present invention relates to a general cutting apparatus, and more particularly to a support structure for supporting a body portion of a work chuck when the cutter is disposed.

發明背景 Background of the invention

將IC、LSI等大量之元件形成於表面,且藉由分割預定線(切割道(street))將一個個元件劃分之半導體晶圓(以下,有時只簡稱為晶圓),被磨削裝置磨削背面並加工至預定之厚度後,會透過切削裝置(切割裝置)切削分割預定線而被分割成一個個元件,並將分割好的元件廣泛地應用在行動電話、個人電腦等各種電子機器上。 A semiconductor wafer (hereinafter, simply referred to as a wafer) in which a large number of components such as an IC and an LSI are formed on a surface and divided into a predetermined line (street) is used as a grinding device After grinding the back surface and processing it to a predetermined thickness, it is divided into individual components by cutting a predetermined dividing line by a cutting device (cutting device), and the divided components are widely used in various electronic devices such as mobile phones and personal computers. on.

切削裝置包括有工作夾台、切削組件與切入進給組件。該工作夾台用以保持晶圓,該切削組件將裝設有切削刀的主軸支撐成可旋轉,且該切削刀是用以切削被該工作夾台所保持之晶圓,該切入進給組件可使切削組件相對工作夾台相對地在切入方向上移動。 The cutting device includes a working clamping table, a cutting assembly and a cut-in feed assembly. The working clamping table is used for holding a wafer, the cutting assembly supports a spindle equipped with a cutting cutter to be rotatable, and the cutting cutter is used for cutting a wafer held by the working clamping table, and the cutting feed component can be The cutting assembly is moved relative to the working carriage in the direction of the cut.

在這種切削裝置上,將新的切削刀裝設至主軸上時,需要進行檢測切削刀之原點位置(基準位置)之設置作業。 切削刀之設置是使切削刀與工作夾台之上表面(與保持面齊平之導電性部分)相接觸,透過形成電導通以檢測工作夾台上表面之高度位置與切削刀之原點位置。 In this type of cutting device, when a new cutter is attached to the spindle, it is necessary to perform the setting operation for detecting the origin position (reference position) of the cutter. The cutter is arranged to make the cutting blade contact the upper surface of the working clamping table (the conductive portion flush with the holding surface), and form electrical conduction to detect the height position of the upper surface of the working clamping table and the origin position of the cutting blade. .

由於透過電導通能形成連結切削刀、主軸、工作夾台之閉合電路,所以在設置時必須使上作夾台與其他導電性零件形成絕緣。因此,以往的工作夾台之本體部(框體)是以由氧化鋁陶瓷等所形成之絕緣基座所支撐。 Since the closed circuit connecting the cutter, the main shaft, and the work chuck is formed by the electrical conduction, the upper clamp must be insulated from other conductive parts during installation. Therefore, the main body portion (frame body) of the conventional work chuck is supported by an insulating base formed of alumina ceramic or the like.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本專利特開2009-238928號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2009-238928

發明概要 Summary of invention

由於支撐工作夾台之本體部之以往的絕緣基座是由氧化鋁陶瓷所形成,所以有著具充分的絕緣性、且因溫度變化所造成之變形少的特徵。然而,由氧化鋁陶瓷所形成之絕緣基座是相對較高價之零件,又有因衝擊而破損的疑慮。 Since the conventional insulating base that supports the body portion of the work chuck is formed of alumina ceramics, it has a feature of sufficient insulation and little deformation due to temperature changes. However, the insulating base formed of alumina ceramics is a relatively expensive part and has a fear of being damaged by impact.

本發明是有鑑於此種問題點而作成的發明,其目的在於提供一種具備有低價且高剛性之絕緣基座之切削裝置。 The present invention has been made in view of such problems, and an object of the invention is to provide a cutting apparatus including an insulating base having low cost and high rigidity.

依據本發明所提供的切削裝置,其包括有:具有保持被加工物之保持面之工作夾台、以切削刀切削被該工 作夾台所保持之被加工物之切削組件、使該切削組件相對該工作夾台相對地在切入方向上移動之切入進給組件、使該切削刀接觸於該工作夾台之表面以透過電導通檢測切入方向之基準位置之設置組件。該切削裝置之特徵在於,該工作夾台包含:具有與該保持面齊平之設置部之導電性的本體部,以及支撐該本體部之絕緣基座。該絕緣基座是透過陶瓷塗膜將表面進行絕緣處理。 A cutting apparatus according to the present invention includes: a working chuck having a holding surface for holding a workpiece, and cutting by a cutter a cutting assembly for the workpiece to be held by the clamping table, a cutting feed assembly for moving the cutting assembly relative to the working clamping frame in a cutting direction, and contacting the cutting blade with the surface of the working clamping table to conduct electrical conduction A setting component that detects the reference position of the cutting direction. The cutting device is characterized in that the working chuck includes a body portion having an electrical conductivity of a portion that is flush with the holding surface, and an insulating base that supports the body portion. The insulating base is insulated by a ceramic coating film.

較理想的是,絕緣基座是將不鏽鋼施以陶瓷塗覆所形成。較理想的是,工作夾台是由修整台所構成,該修整台用以保持可修整切削刀之修整板。 Preferably, the insulating base is formed by applying a stainless steel coating to the stainless steel. Preferably, the working table is formed by a dressing table for holding the trimming plate of the dressing cutter.

本發明之切削裝置,作為支撐工作夾台之絕緣基座,採用的是對不鏽鋼之表面進行陶瓷塗覆而將表面處理成具絕緣性的基座,所以可獲得能提供低價且高剛性之絕緣基座的效果。 The cutting device of the present invention is used as an insulating base for supporting the working clamp, and the surface of the stainless steel is ceramic coated to treat the surface into an insulating base, so that low cost and high rigidity can be obtained. The effect of the insulating base.

2‧‧‧切削裝置 2‧‧‧Cutting device

4‧‧‧操作面板 4‧‧‧Operator panel

6‧‧‧顯示螢幕 6‧‧‧Display screen

8‧‧‧晶圓匣 8‧‧‧ Wafer

9‧‧‧晶圓匣升降機 9‧‧‧Wrape lifts

10‧‧‧搬出入單元 10‧‧‧ Moving in and out of the unit

11‧‧‧半導體晶圓(晶圓) 11‧‧‧Semiconductor wafer (wafer)

12‧‧‧暫置區域 12‧‧‧ temporary area

14‧‧‧對位機構 14‧‧‧ aligning agencies

16‧‧‧搬送單元 16‧‧‧Transport unit

18‧‧‧工作夾台 18‧‧‧Working table

20‧‧‧夾具 20‧‧‧ fixture

22‧‧‧校準單元 22‧‧‧ calibration unit

24‧‧‧攝像單元 24‧‧‧ camera unit

26‧‧‧切削單元 26‧‧‧Cutting unit

28‧‧‧主軸 28‧‧‧ Spindle

30‧‧‧切削刀 30‧‧‧Cutter

32‧‧‧搬送單元 32‧‧‧Transport unit

34‧‧‧旋轉洗淨單元 34‧‧‧Rotary cleaning unit

36‧‧‧修整台 36‧‧‧Renovation

38‧‧‧本體部(框體) 38‧‧‧ body part (frame)

38a‧‧‧設置部 38a‧‧‧Setting Department

40‧‧‧吸引保持部 40‧‧‧Attraction and Maintenance Department

42‧‧‧基座 42‧‧‧Base

44‧‧‧馬達 44‧‧‧Motor

46‧‧‧絕緣基座 46‧‧‧Insulated base

50、58‧‧‧陶瓷塗膜 50, 58‧‧‧ ceramic coating

52‧‧‧支柱 52‧‧‧ pillar

54‧‧‧絕緣基座 54‧‧‧Insulated base

60、70‧‧‧設置組件 60, 70‧‧‧Set components

62‧‧‧開關 62‧‧‧ switch

64、72‧‧‧閉合電路 64, 72‧‧‧ Closed circuit

66‧‧‧電源 66‧‧‧Power supply

68‧‧‧電流表 68‧‧‧Ammonia

A、B‧‧‧接點 A, B‧‧‧ contacts

F‧‧‧環狀框架 F‧‧‧Ring frame

T‧‧‧切割膠帶 T‧‧‧ cutting tape

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

圖1是本發明實施形態之切削裝置的立體圖。 Fig. 1 is a perspective view of a cutting device according to an embodiment of the present invention.

圖2是說明工作夾台之設置之局部剖面側視圖。 Figure 2 is a partial cross-sectional side view showing the arrangement of the work chuck.

用以實施發明之形態 Form for implementing the invention

以下,參照圖式詳細地說明本發明之實施形態。參照圖1,所示為本發明實施形態之包括有絕緣基座之切削裝置的立體圖。在切削裝置2之前面側設有用於供操作人員輸入加工條件等對裝置之指示的操作面板4。在裝置上部設 有CRT等之顯示螢幕6,能夠顯示對操作人員之導引畫面與由後述之攝像單元所拍攝到的影像。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Referring to Fig. 1, there is shown a perspective view of a cutting apparatus including an insulating base according to an embodiment of the present invention. An operation panel 4 for an operator to input an instruction to the apparatus such as a processing condition is provided on the front side of the cutting device 2. On the top of the device There is a display screen 6 such as a CRT, and it is possible to display a guidance screen for the operator and an image captured by an imaging unit to be described later.

在將半導體晶圓(以下,有時只簡稱為晶圓)11貼附於被裝設在環狀框架F上之切割膠帶T上後,將複數片收納到晶圓匣8中。並將晶圓匣8載置於可上下移動之晶圓匣升降機9上。 A semiconductor wafer (hereinafter sometimes simply referred to as a wafer) 11 is attached to the dicing tape T mounted on the annular frame F, and then the plurality of sheets are stored in the wafer cassette 8. The wafer cassette 8 is placed on the wafer cassette elevator 9 which can be moved up and down.

在晶圓匣8之後方配置有可在從晶圓匣8搬出切削前之晶圓11的同時,將切削後之晶圓搬入晶圓匣8之搬出入單元10。 After the wafer cassette 8 is placed, the wafer 11 before the cutting is carried out from the wafer cassette 8 and the wafer after cutting is carried into the loading/unloading unit 10 of the wafer cassette 8.

在晶圓匣8與搬出入單元10間設置有作為使搬出入對象之晶圓11暫時載置之區域的暫置區域12,在暫置區域12中配置有將晶圓11對準固定之位置之對位機構14。 A temporary region 12 is provided between the wafer cassette 8 and the loading/unloading unit 10 as a region in which the wafer 11 to be loaded and discharged is temporarily placed, and the wafer 11 is aligned and fixed in the temporary region 12. Alignment mechanism 14.

在暫置區域12之附近,配置有其備旋轉臂之搬送單元16,該旋轉臂可將晶圓11吸附以進行搬送,被搬出至暫置區域12而進行過位置對準之晶圓11,被搬送單元16吸附而被搬送至工作夾台18上,並被此工作夾台18吸引保持。 In the vicinity of the temporary area 12, a transfer unit 16 having a rotating arm that can be sucked by the wafer 11 for transport and transported to the temporary area 12 to perform the aligned wafer 11 is disposed. The conveyance unit 16 is sucked and conveyed to the work chuck 18, and is sucked and held by the work chuck 18.

工作夾台18是透過可旋轉且圖未示之加工進給機構而構成為可在X軸方向上往返移動,在工作夾台18之X軸方向之移動路徑的上方,配置有檢測晶圓11之用來切削之區域的校準單元22。20是用來夾持環狀框架F之夾具。 The work chuck 18 is configured to be reciprocally movable in the X-axis direction by a rotary feed mechanism (not shown), and the detection wafer 11 is disposed above the movement path of the work chuck 18 in the X-axis direction. The calibration unit 22 for cutting the area is a jig for holding the annular frame F.

校準單元22具備有可拍攝晶圓11之表面之攝像單元24,並可根據藉由拍攝所取得之影像,透過型樣匹配等處理以檢測用來切削之區域。可將藉由攝像單元24所取 得之影像顯示在顯示螢幕6上。 The calibration unit 22 is provided with an imaging unit 24 that can capture the surface of the wafer 11, and can process the area for cutting based on the image obtained by the imaging, through pattern matching or the like. Can be taken by the camera unit 24 The resulting image is displayed on the display screen 6.

在校準單元22之左側,配置有能對被工作夾台18所保持之晶圓11施行切削加工之切削單元26。切削單元26是與校準單元22一體地被構成,並將兩者連動而在Y軸方向及Z軸方向上移動。 On the left side of the calibration unit 22, a cutting unit 26 capable of cutting the wafer 11 held by the working chuck 18 is disposed. The cutting unit 26 is configured integrally with the calibration unit 22, and moves the two in the Y-axis direction and the Z-axis direction in conjunction with each other.

切削單元26是在可旋轉之主軸28之前端裝設外周具有刀刃之切削刀30而被構成,且可在Y軸方向及Z軸方向上移動。切削刀30位於攝像單元24之X軸方向的延長線上。切削單元26之Y軸方向的移動是透過圖未示之分度進給機構所達成。 The cutting unit 26 is configured by attaching a cutter 30 having a blade on the outer circumference to the front end of the rotatable main shaft 28, and is movable in the Y-axis direction and the Z-axis direction. The cutter 30 is located on an extension line of the imaging unit 24 in the X-axis direction. The movement of the cutting unit 26 in the Y-axis direction is achieved by an indexing feed mechanism not shown.

34是用以洗淨已結束切削加工之晶圓11之旋轉洗淨單元,已結束切削加工之晶圓11可透過搬送單元32搬送至旋轉洗淨單元34,並在旋轉洗淨單元34被旋轉洗淨及旋轉乾燥。 34 is a spin cleaning unit for washing the wafer 11 that has been subjected to the cutting process, and the wafer 11 that has been subjected to the cutting process is transported to the spin cleaning unit 34 through the transport unit 32, and is rotated by the spin cleaning unit 34. Wash and spin dry.

鄰接於工作夾台18,配置有修整台36,該修整台36是用以吸引保持可修整切削刀30之修整板。修整台36是由不鏽鋼等金屬所形成,其表面形成有吸引保持修整板之吸引溝。 Adjacent to the work chuck 18, a dressing table 36 is provided, which is used to attract the trimming plate holding the dressable cutter 30. The dressing table 36 is formed of a metal such as stainless steel, and has a suction groove formed on the surface thereof to attract and hold the trimming plate.

接著,參照圖2,說明工作夾台18及修整台36之設置。工作夾台18是由SUS所形成之本體部(框體)38,及由多孔陶瓷等之多孔性構件所形成之吸引保持部40所構成。並將吸引保持部40之表面與本體部38之作為設置部之表面38a齊平地形成。 Next, the arrangement of the work chuck 18 and the dressing table 36 will be described with reference to Fig. 2 . The work chuck 18 is a main body portion (frame body) 38 formed of SUS, and a suction holding portion 40 formed of a porous member such as porous ceramic. The surface of the suction holding portion 40 is formed flush with the surface 38a of the body portion 38 as a setting portion.

工作夾台18是透過搭載於基座42上之馬達44而 被旋轉驅動。且是將工作夾台18搭載於配置在馬達44上之絕緣基座46上。絕緣基座46是由SUS等金屬所形成,並如符號50所示地利用陶瓷塗膜將其表面進行絕緣處理。 The working clamp 18 is transmitted through a motor 44 mounted on the base 42. Driven by rotation. Further, the work chuck 18 is mounted on an insulating base 46 disposed on the motor 44. The insulating base 46 is made of a metal such as SUS, and the surface of the insulating base 46 is insulated by a ceramic coating film as indicated by reference numeral 50.

另一方面,是將修整台36搭載於絕緣基座54上,並將絕緣基座54固定在直立設置於基座42之支柱52的上端部。絕緣基座54是由SUS等金屬所形成,並如符號58所示地利用陶瓷塗膜將其表面進行絕緣處理。 On the other hand, the dressing table 36 is mounted on the insulating base 54, and the insulating base 54 is fixed to the upper end portion of the stay 52 that is erected on the base 42. The insulating base 54 is made of a metal such as SUS, and the surface of the insulating base 54 is insulated by a ceramic coating film as indicated by reference numeral 58.

支撐工作夾台18之絕緣基座46的陶瓷塗覆是透過陶瓷之熱噴塗而實施的。同樣地,支撐修整台36之絕緣基座54之陶瓷塗覆也是透過陶瓷之熱噴塗而實施的。 The ceramic coating of the insulating base 46 supporting the working chuck 18 is carried out by thermal spraying of ceramic. Similarly, the ceramic coating of the insulating pedestal 54 supporting the conditioning station 36 is also performed by thermal spraying of ceramic.

接著,說明切削刀30之相對於工作夾台18的設置作業。進行此設置時,會將開關62切換到接點A側。並且,將用以使切削單元26在Z軸方向上移動之切入進給組件作動,並使旋轉中之切削刀30下降以使其接觸於工作夾台18之設置部38a。 Next, the setting operation of the cutter 30 with respect to the work chuck 18 will be described. When this setting is made, the switch 62 is switched to the contact A side. Further, the cutting feed assembly for moving the cutting unit 26 in the Z-axis direction is actuated, and the rotating cutter 30 is lowered to contact the setting portion 38a of the work chuck 18.

藉此,便形成連結切削刀30、主軸28及工作夾台18之本體部38的閉合電路64。由於在此閉合電路64中將電源66及電流表68以串聯方式連接著,因此操作人員藉由以電流表68觀察電流流經閉合電路64之情形,即可確認切削刀30及工作夾台18間已形成電導通。並將已形成電導通時之切削刀30之高度檢測出而作為Z方向之原點位置(基準位置),且可將此原點位置儲存在切削裝置2之控制器的記憶體中。 Thereby, a closing circuit 64 that connects the cutting blade 30, the main shaft 28, and the body portion 38 of the working chuck 18 is formed. Since the power source 66 and the ammeter 68 are connected in series in the closed circuit 64, the operator can confirm that the current between the cutter 30 and the working chuck 18 has been observed by the ammeter 68 observing the current flowing through the closed circuit 64. Electrical conduction is formed. The height of the cutting blade 30 when the electrical conduction is formed is detected as the origin position (reference position) in the Z direction, and the origin position can be stored in the memory of the controller of the cutting device 2.

切削刀30之相對工作夾台18的設置組件60,是藉 由使切削刀30接觸於工作夾台18之設置部38a所形成之閉合電路64所構成。 The setting assembly 60 of the cutter 30 is opposite to the working clamp 18 The closing circuit 64 formed by the cutting blade 30 contacting the setting portion 38a of the working chuck 18 is formed.

另一方面,在切削刀30之相對於修整台36進行的設置時,會將開關62切換至接點B側。然後,作動切入進給組件使切削單元26下降,並使旋轉中之切削刀30接觸於修整台36之表面。 On the other hand, at the time of setting of the cutting blade 30 with respect to the dressing table 36, the switch 62 is switched to the contact B side. Then, the cutting feed assembly is actuated to lower the cutting unit 26, and the rotating cutter 30 is brought into contact with the surface of the dressing table 36.

藉此,便形成連結切削刀30、主軸28及修整台36的閉合電路72,並可透過觀察電流表68以檢測已有電流流經閉合電路72之情形,且可以確認切削刀30及修整台36間已形成電導通。可將此時之切削刀30的Z方向之高度位置作為切削刀30相對於修整台36的原點位置而儲存在控制器之記憶體中。 Thereby, the closed circuit 72 connecting the cutting blade 30, the main shaft 28 and the dressing table 36 is formed, and the current meter 68 can be observed to detect the current flowing through the closing circuit 72, and the cutting blade 30 and the dressing table 36 can be confirmed. Electrical conduction has been established. The height position of the cutting blade 30 in the Z direction at this time can be stored in the memory of the controller as the origin position of the cutting blade 30 with respect to the dressing table 36.

切削刀30之相對修整台36之設置組件70,是藉由使切削刀30接觸於修整台36而形成之閉合電路72所構成。 The setting unit 70 of the cutter 30 opposite to the dressing table 36 is constituted by a closing circuit 72 formed by bringing the cutting blade 30 into contact with the dressing table 36.

依據上述之實施形態,即可由SUS等之金屬形成支撐工作夾台18之絕緣基座46及支撐修整台36之絕緣基座54,並利用陶瓷塗膜將其表面進行絕緣處理,因此能夠實現低價且高剛性之絕緣基座46、54。 According to the above-described embodiment, the insulating base 46 supporting the work chuck 18 and the insulating base 54 supporting the dressing table 36 can be formed of a metal such as SUS, and the surface thereof can be insulated by a ceramic coating film, thereby achieving low Insulating bases 46, 54 that are priced and highly rigid.

Claims (3)

一種切削裝置,其包括有:具有保持被加工物之保持面之工作夾台、以切削刀切削被該工作夾台所保持之被加工物之切削組件、使該切削組件相對該工作夾台相對地在切入方向上移動之切入進給組件、及使該切削刀接觸於該工作夾台之表面以透過電導通檢測切入方向之基準位置之設置組件,該切削裝置之特徵在於:該工作夾台包含:具有與該保持面齊平之設置部之導電性的本體部;以及支撐該本體部之第1絕緣基座;該第1絕緣基座是利用陶瓷塗膜將金屬的表面進行絕緣處理而構成。 A cutting device comprising: a working clamping table having a holding surface for holding a workpiece; and a cutting assembly for cutting a workpiece held by the working clamping table with a cutting cutter, the cutting assembly is opposite to the working clamping table a cutting-in feeding assembly moving in the cutting direction and a setting assembly for contacting the cutting blade to a surface of the working clamping table to transmit a reference position in the cutting direction through electrical conduction, the cutting device being characterized in that the working clamping frame comprises a main body portion having conductivity of the installation portion flush with the holding surface; and a first insulating base supporting the main body portion; the first insulating base is formed by insulating a surface of the metal with a ceramic coating film . 如請求項1之切削裝置,其中,該第1絕緣基座是將不鏽鋼的表面施以陶瓷塗覆所形成。 The cutting device of claim 1, wherein the first insulating base is formed by applying a ceramic coating to a surface of the stainless steel. 如請求項1或2之切削裝置,其更具備:與前述工作夾台鄰接而配置的第2絕緣基座、及裝載於該第2絕緣基座上的修整台,且該第2絕緣基座是利用陶瓷塗膜將金屬的表面進行絕緣處理而構成。 The cutting device according to claim 1 or 2, further comprising: a second insulating base disposed adjacent to the working clamping table; and a finishing station mounted on the second insulating base, wherein the second insulating base The surface of the metal is insulated by a ceramic coating film.
TW104107939A 2014-04-25 2015-03-12 Cutting device TWI654046B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014091572A JP6230477B2 (en) 2014-04-25 2014-04-25 Cutting equipment
JP2014-091572 2014-04-25

Publications (2)

Publication Number Publication Date
TW201544248A TW201544248A (en) 2015-12-01
TWI654046B true TWI654046B (en) 2019-03-21

Family

ID=54454002

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104107939A TWI654046B (en) 2014-04-25 2015-03-12 Cutting device

Country Status (4)

Country Link
JP (1) JP6230477B2 (en)
KR (1) KR102243424B1 (en)
CN (1) CN105047554B (en)
TW (1) TWI654046B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6624385B2 (en) * 2016-02-08 2019-12-25 株式会社東京精密 Dicing apparatus and dressing method for dicing blade
JP6270921B2 (en) * 2016-06-28 2018-01-31 株式会社リード Cutting device with blade dressing mechanism
JP6909598B2 (en) * 2017-03-13 2021-07-28 光洋機械工業株式会社 Surface grinding method and surface grinding equipment
JP2019014000A (en) * 2017-07-05 2019-01-31 株式会社ディスコ Setup method for cutting blade
JP6968501B2 (en) * 2018-01-26 2021-11-17 株式会社ディスコ How to set up the cutting equipment

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04280956A (en) * 1991-03-06 1992-10-06 Nippon Steel Corp Electrical insulating planer material
JPH08319582A (en) * 1995-05-19 1996-12-03 Isuzu Ceramics Kenkyusho:Kk Insulating ceramics film on surface of metal and its formation
JP4129152B2 (en) * 2002-08-06 2008-08-06 東京エレクトロン株式会社 Substrate mounting member and substrate processing apparatus using the same
JP4542959B2 (en) * 2005-07-14 2010-09-15 東京エレクトロン株式会社 Electrostatic chucking electrode, substrate processing apparatus, and method of manufacturing electrostatic chucking electrode
JP4994121B2 (en) * 2006-08-10 2012-08-08 東京エレクトロン株式会社 Electrostatic chucking electrode, substrate processing apparatus, and method of manufacturing electrostatic chucking electrode
JP4728306B2 (en) * 2007-09-18 2011-07-20 トーカロ株式会社 Electrostatic chuck member and manufacturing method thereof
JP5122341B2 (en) * 2008-03-26 2013-01-16 株式会社ディスコ Cutting equipment
JP5199812B2 (en) * 2008-09-30 2013-05-15 株式会社ディスコ Cutting equipment
JP5335532B2 (en) * 2009-04-21 2013-11-06 株式会社ディスコ Cutting equipment
JP5350908B2 (en) * 2009-06-24 2013-11-27 株式会社ディスコ Dressboard holding table and cutting device
JP2011014568A (en) * 2009-06-30 2011-01-20 Disco Abrasive Syst Ltd Cutting device
JP5340841B2 (en) * 2009-07-21 2013-11-13 株式会社ディスコ Cutting equipment
KR20110135274A (en) * 2010-06-10 2011-12-16 에스티에스반도체통신 주식회사 Dicing device and dicing method of semiconductor wafer
JP5764031B2 (en) * 2011-10-06 2015-08-12 株式会社ディスコ Cutting equipment
JP2013258204A (en) * 2012-06-11 2013-12-26 Disco Abrasive Syst Ltd Cutting device

Also Published As

Publication number Publication date
CN105047554A (en) 2015-11-11
KR102243424B1 (en) 2021-04-21
CN105047554B (en) 2019-05-31
JP6230477B2 (en) 2017-11-15
TW201544248A (en) 2015-12-01
JP2015211120A (en) 2015-11-24
KR20150123705A (en) 2015-11-04

Similar Documents

Publication Publication Date Title
TWI654046B (en) Cutting device
JP6335596B2 (en) Grinding equipment
TWI719055B (en) Transport mechanism of processing device
JP6887260B2 (en) Processing equipment
TWI587427B (en) Wafer leveling device
JP5340841B2 (en) Cutting equipment
US20150298283A1 (en) Substrate treatment device
US20200185239A1 (en) Cutting apparatus
TW201606916A (en) Conveying apparatus
KR102551970B1 (en) Setup method of cutting apparatus
JP2014223708A (en) Processing device
JP6689543B2 (en) Workpiece alignment method
KR20160035977A (en) Method for grinding workpiece
TWI782033B (en) How to install the cutting blade
JP6474233B2 (en) Frame unit
TW202128349A (en) Processing device capable of reducing the number of transferring and holding a workpiece when transporting the workpiece to a chuck table
JP2011125988A (en) Grinding device
JP2009076773A (en) Chuck table mechanism
JP2020151795A (en) Processing device
CN110707017A (en) Method for drying workpiece and cutting device
JP2015201561A (en) Washing equipment
TWI830833B (en) cutting device
JP5653183B2 (en) Processing equipment
JP5512314B2 (en) Grinding equipment
JP2017069488A (en) Transfer mechanism