TW201511840A - Coating apparatus - Google Patents

Abstract

A technique related to a coating apparatus is provided, wherein the coating apparatus reduces abandoned coating solution and increases coating efficiency. A plurality of nozzles includes: a first nozzle group arranged along a main scanning direction with predetermined intervals therebetween; and a second nozzle group being parallel to a main surface of a substrate relative to the first nozzle group and arranged along a sub-scanning direction with predetermined intervals intervening therebetween. An interval adjusting device includes: a sliding frame supporting nozzles of the first nozzle group; a sliding frame supporting nozzles of the second nozzle group; a rod abutting the sliding frame from one side of the sub-scanning direction; a nozzle energizing device energizing the sliding frame to the rod from another side of the sub-scanning direction; and a driving device adjusting a position of the rod along the sub-scanning direction.

Description

Coating device

The present invention relates to a technique of applying a coating liquid to a coating device of a substrate.

In recent years, an organic EL display device using an organic electroluminescence (EL) material has been developed. For example, in the production of an active matrix driving type organic EL display device using a polymer organic EL material, a thin film transistor (Thin Film Transistor) is sequentially formed on a glass substrate (hereinafter simply referred to as a "substrate"). a TFT) circuit, an indium tin oxide (ITO) electrode to be an anode, a spacer formed, and a fluid material (hereinafter referred to as a “hole transport liquid”) containing a hole transport material; The hole transport layer is formed by heat treatment, a fluid material containing an organic EL material (hereinafter referred to as "organic EL liquid") is applied, an organic EL layer is formed by heat treatment, a cathode is formed, and an insulating film is formed to perform sealing.

In the production of an organic EL display device, a device disclosed in Patent Document 1 is known as a device for applying a hole transport liquid or an organic EL liquid to a substrate. In such a coating device, a plurality of nozzles of a fluid material are continuously ejected, relative to the base The plate is relatively moved in the main scanning direction and the sub-scanning direction, whereby the fluid material is applied to the substrate in a stripe shape.

In the coating apparatus of Patent Document 1, three kinds of organic EL liquids are ejected from three nozzles and applied to three grooves between the partition walls of the application region formed in advance on the substrate, and the three kinds of organic EL liquids are respectively contained. An organic EL material in which three colors of red (R), green (G), and blue (G) are different from each other.

In this device, the three nozzles are held integrally by the holding member. Further, by rotating the holding member around the support shaft perpendicular to the substrate, the pitch of the three nozzles in the sub-scanning direction can be changed. Thereby, the coating pitch of the organic EL liquid is adjusted.

Further, in the coating apparatus of Patent Document 2, when the nozzle pitch is uneven due to a mounting error or a manufacturing error of the nozzle to which the coating liquid is applied, a pitch adjusting mechanism for making the pitch between the nozzles uniform is provided.

In this device, each nozzle is mounted on a slider that is movable in the sub-scanning direction. Further, the pitch adjusting mechanism can move the respective nozzles individually by moving the respective sliders in the sub-scanning direction. Thereby, the adjustment of the pitch between the nozzles in the sub-scanning direction of each nozzle is performed.

[Prior Art Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-010755

[Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-155138

Further, by increasing the number of nozzles, a plurality of stripe lines can be formed by one movement in the main scanning direction, so that the coating time can be shortened. However, when a plurality of nozzles move in the main scanning direction, since the coating liquid is continuously ejected from before the application target region reaching the substrate, if the number of nozzles is increased in the main scanning direction, the nozzle reaches the coating region of the substrate. The distance becomes longer, and the discarded coating liquid increases.

In order to cope with the problem, it is considered to shorten the interval of the nozzles arranged in the main scanning direction. However, when the pitch adjustment mechanism as described in Patent Document 2 is provided, there is a limit in reducing the size of the mechanism itself, so there is a problem that it is not easy to reduce the nozzle interval in the main scanning direction.

The present invention has been made in view of the above problems, and an object thereof is to provide a technique capable of reducing the amount of a coating liquid to be discarded and improving coating efficiency.

In order to solve the above-described problems, the first aspect is a coating apparatus that applies a coating liquid onto a substrate, and includes a substrate holding portion that holds the substrate, a plurality of nozzles that continuously discharge the coating liquid toward the substrate, and a nozzle mounting portion. Mounting the plurality of nozzles; the main scanning mechanism relatively moves the plurality of nozzles together with the nozzle mounting portion relative to the substrate in a main scanning direction parallel to a main surface of the substrate; a scanning mechanism that mounts the plurality of nozzles and the nozzles in a sub-scanning direction parallel to the main surface of the substrate and intersecting the main scanning direction a portion that moves relative to the substrate; and a pitch adjustment mechanism that moves the plurality of nozzles adjacent to each other in the sub-scanning direction by moving the plurality of nozzles in the sub-scanning direction Adjusting, and the plurality of nozzles include: a first nozzle group arranged at a predetermined interval in the main scanning direction, and spaced apart in the sub-scanning direction with respect to the first nozzle group A second nozzle group arranged at a predetermined interval.

Further, in the coating device according to the first aspect, the pitch adjusting mechanism includes: a nozzle holding portion that is movable in a sub-scanning direction; and a nozzle abutting portion from the sub-scanning direction One side abuts against the nozzle holding portion; a nozzle energizing mechanism energizes the nozzle holding portion toward the nozzle abutting portion from the other side in the sub-scanning direction; and a driving mechanism that faces the nozzle The position of the abutting portion in the sub-scanning direction is adjusted.

Further, in the third aspect of the coating apparatus of the second aspect, the nozzle abutting structure The member is disposed between two adjacent nozzle holding portions that hold the nozzles of the second nozzle group, and the nozzle abutting members abut against each of the nozzles that hold the nozzles of the first nozzle group unit.

Further, in the fourth aspect of the coating apparatus of the second aspect, the nozzle is provided The energy mechanism includes an elastic member that connects the two nozzle holding portions that hold the nozzles of the first nozzle group and the second nozzle group.

Further, in a fifth aspect of the coating apparatus of the second aspect, the nozzle is provided The energy mechanism includes: a wedge-shaped abutting member that abuts against the first spray in a clamped state Two nozzle holding portions held by the nozzles of the nozzle group and the two nozzles of the second nozzle group, and a moving mechanism that faces the wedge abutting members toward the two nozzle holding portions Move between.

Further, in a sixth aspect of the coating apparatus of the second aspect, the nozzle is provided The energy mechanism includes a magnet disposed between the nozzles of the nozzle group of the first nozzle group and the nozzles of the second nozzle group, wherein the two nozzle holding portions are respectively Each of the nozzle holding portions includes a magnetic portion having a magnetic pole repelled with respect to the magnet.

According to the first aspect, in the sub-scanning direction, relative to the first nozzle group The second nozzle group is arranged at intervals, whereby the distance between the nozzles at both ends in the main scanning direction can be shortened. Therefore, the coating liquid can be continuously discharged, and the amount of the coating liquid discarded before the nozzle reaches the coating area of the substrate can be reduced. Also, the coating efficiency can be improved by increasing the number of nozzles.

According to the second aspect, the adjustment of the nozzle interval in the sub-scanning direction can be performed The whole can thus improve the coating precision.

According to the third aspect, the nozzle holding portion that passes through the second nozzle group can be utilized. The nozzle holding portion between the nozzle holders adjusts the position of the nozzle holding portion of the first nozzle group located at a position away from the driving mechanism.

According to the fourth aspect, one elastic member can be used to protect two nozzles The holding portion is energized toward the nozzle abutting portion that abuts against each of the nozzle holding portions.

According to the fifth aspect, one wedge member can be used to protect two nozzles The holding portion is energized toward the nozzle abutting portion that abuts against each of the nozzle holding portions.

According to the sixth aspect, the two nozzle holding portions can be energized toward the nozzle abutting portions that abut against the respective nozzle holding portions by one magnet.

1‧‧‧ Coating device

2‧‧‧Control Department

3, 3A, 3B, 3C, 3D, 3E‧‧‧ spacing adjustment mechanism

9‧‧‧Substrate

10‧‧‧ platform

11‧‧‧Photography Department

12‧‧‧Liquid Department

20‧‧‧ platform moving mechanism

21‧‧‧Abutment

22‧‧‧Sub Scanning Mechanism

23‧‧‧Support board

24‧‧‧Rotating mechanism

30, 30A, 30B, 30C, 30D, 30E‧‧ ‧ coating head

31‧‧‧Nozzles

31A‧‧‧First nozzle group

31B‧‧‧Second nozzle group

32A, 32B‧‧‧Sliding grid (nozzle holding part)

33, 33B, 33C‧‧‧ nozzle energizing mechanism

33A, 33D, 33E‧‧‧ Elastic members (nozzle energizing mechanism)

33SA, 33SB‧‧‧ abutment

221‧‧‧Linear motor

222‧‧‧rails

34, 34A, 34B, 34C‧‧‧ nozzle installation

3421, 3421A‧‧‧ guiding slot

3422‧‧‧ openings

3425, 3427‧‧‧through holes

35, 35A, 35B‧‧‧ position adjustment mechanism

40‧‧‧ Coating liquid supply mechanism

41‧‧‧ Coating Liquid Accumulation Department

42‧‧‧Supply tube

50‧‧‧ head moving mechanism

51‧‧‧Guiding components

52‧‧‧ Slider

53‧‧‧ pulley

54‧‧‧Synchronous conveyor belt

91‧‧‧ coated area

331‧‧‧ rod

332‧‧‧Enable actuator

333‧‧‧Wedge abutment members

334‧‧‧ rod

335‧‧‧ cylinder

351, 351A, 351B‧‧‧ actuator (drive mechanism)

352, 352A, 352B‧‧‧ rod (nozzle abutment)

336‧‧‧ magnet

337‧‧‧Magnetic body (magnetic part)

X, Y, Z‧‧ Direction

Fig. 1 is a plan view of a coating device of a first embodiment.

Fig. 2 is a front elevational view of the coating device of the first embodiment.

3 is a schematic plan view of a nozzle mounting portion provided in a coating head.

4 is a schematic plan view of a nozzle mounting portion provided in the coating head of the second embodiment.

Fig. 5 is a schematic plan view of a nozzle mounting portion provided in the coating head of the third embodiment.

Fig. 6 is a schematic side view of the nozzle energizing mechanism of the third embodiment.

FIG. 7 is a schematic plan view of a nozzle mounting portion provided in the coating head of the fourth embodiment.

8 is a schematic plan view of a nozzle mounting portion provided in the coating head of the fifth embodiment.

FIG. 9 is a schematic plan view of a nozzle mounting portion provided in the coating head of the sixth embodiment.

Hereinafter, a coating apparatus 1 according to an embodiment of the present invention will be described with reference to the drawings. In addition, in the drawings, the size or the number of each part may be exaggerated or simplified as needed, for the sake of easy understanding. In addition, in each of FIG. 1 and subsequent figures, the XYZ orthogonal coordinate system in which the X-axis direction and the Y-axis direction orthogonal thereto are the horizontal direction and the vertical direction is the Z-axis direction is shown for convenience of description. However, the respective directions are not intended to define the arrangement relationship of the respective elements.

<1. First embodiment>

<1.1. Composition and function>

FIG. 1 is a plan view of a coating device 1 of a first embodiment. 2 is a front view of the coating device 1 of the first embodiment.

The coating device 1 is configured as a device for manufacturing an organic EL display device using a fluid material such as an organic EL liquid, a hole transporting material, or a hole injecting material as a coating liquid. Further, in the coating device 1, a plurality of coating liquids such as an organic EL liquid, a hole transporting material, and a hole injecting material can be used.

The coating apparatus 1 mainly includes a stage 10 for holding the substrate 9 horizontally, and a stage moving mechanism 20 for moving the stage 10 for applying the coating liquid to the coating head 30 held on the upper surface of the substrate 9 of the stage 10, The coating head 30 supplies the coating liquid supply mechanism 40 of the coating liquid, and the head moving mechanism 50 that moves the coating head 30. Further, the coating device 1 includes a control unit 2 that is electrically connected to each unit included in the coating device 1 and controls the operation of these respective units.

The stage 10 has a flat outer shape, and the substrate 9 is placed on the upper surface in a horizontal posture and held. Moreover, the size of the platform 10 is smaller than that of the substrate 9. On the platform A plurality of suction holes (not shown) are formed on the upper surface of 10. These suction holes are connected to a vacuum pump or the like, and by operating the vacuum pump, when the substrate 9 is placed on the stage 10, the substrate 9 is adsorbed and fixedly held on the upper surface of the stage 10 by the suction pressure of the suction holes. Further, the stage 10 has a heating mechanism (not shown) composed of a heater therein. Moreover, the substrate 9 placed on the stage 10 can be heated to a predetermined temperature.

The platform moving mechanism 20 causes the platform 10 to be opposite to the main surface of the substrate 9 The predetermined direction (that is, the Y-axis direction in FIG. 1 , hereinafter referred to as the “sub-scanning direction”) that is parallel to the surface parallel to the longitudinal direction and the width direction of the substrate 9 is horizontally moved. The platform moving mechanism 20 includes a rotating mechanism 24 that rotates the platform 10, a support plate 23 that rotatably supports the platform 10, a base 21 that horizontally supports the support plate 23, and a base 21 that moves in the sub-scanning direction. Sub-scanning mechanism 22. The rotation mechanism 24 and the sub-scanning mechanism 22 are electrically connected to the control unit 2, and the stage 10 is moved in accordance with an instruction from the control unit 2.

The rotating mechanism 24 includes an electric motor including a rotor mounted inside the platform 10 motivation. Further, a rotary bearing mechanism is provided between the lower surface side of the central portion of the stage 10 and the support plate 23. Therefore, if the motor is operated, the rotor is driven in the rotation direction about the Z-axis, and the stage 10 is rotated within a predetermined angle around the rotation axis of the rotary bearing mechanism.

The sub-scanning mechanism 22 includes: mounted on the support plate 23 from below A linear motor 221 on the lower surface of the base 21 is held, and a pair of guide rails 222 extending in the sub-scanning direction. Therefore, if the linear motor 221 is driven, the base 21 and the stage 10 move in the sub-scanning direction along the guide rail 222.

The coating head 30 includes a plurality of nozzles 31. The coating head 30 is oriented to remain on the platform A coating liquid containing an organic EL material is continuously discharged from the upper surface of the substrate 9 of 10. In other words, the coating head 30 is a discharge mechanism for ejecting the coating liquid in a state of a liquid column (also referred to as a continuous fluid).

In the present embodiment, the plurality of nozzles 31 are arranged in two rows on the coating head 30. More specifically, the plurality of nozzles 31 are arranged in such a manner that a row of the first nozzle group 31A is formed in a direction parallel to the main surface of the substrate 9 and perpendicular to the sub-scanning direction (ie, with FIG. 1 The X-axis direction perpendicular to the Y-axis direction, hereinafter referred to as "main scanning direction" is arranged at a predetermined interval; and the row of the second nozzle group 31B is opposed to each nozzle 31 of the first nozzle group 31A. They are arranged at a predetermined interval in the sub-scanning direction.

In the present embodiment, in the first nozzle group 31A and the second nozzle group 31B In each of the two nozzles 31 and 31 adjacent to each other in the main scanning direction, the distance in the sub-scanning direction is adjusted to be equal to the coating area 91 previously formed on the substrate 9 (the dotted line is surrounded by FIG. 1). The pitch between the partition walls extending in the main scanning direction (hereinafter referred to as "partition wall pitch") is three times. The pitch adjustment mechanism 3 for adjusting the pitch will be described in detail in the description of the coating head 30 to be described later.

The coating liquid supply mechanism 40 mainly includes a coating liquid storage unit 41 that accumulates a coating liquid containing an organic EL material, a supply tube 42 that supplies the coating liquid to the coating head 30, and a coating liquid that is sent from the coating liquid storage unit 41. Pump (not shown). One end of the supply pipe 42 is connected to the coating liquid accumulating portion 41, and the other end is connected to each nozzle. 31 is branched and connected to each nozzle 31 in a one-to-one correspondence.

The head moving mechanism 50 includes a pair of guiding members 51, a slider 52 slidably disposed with respect to the guiding member 51, and a pair of pulleys 53 disposed adjacent to both end portions of the pair of guiding members 51 and capable of being disposed The rotation is centered on the axis toward the Z-axis direction; and a ring-shaped synchronous belt 54 is wound around the pulley 53.

The slider 52 is supplied with a fixed pressure gas from a gas supply source (not shown), and is engaged with the guide member 51 in a non-contact state and is movably supported in the main scanning direction. Further, one end of the slider 52 is fixed to the synchronous transfer belt 54. On the other hand, the coating head 30 is fixed to the other end of the slider 52. Therefore, the synchronous transfer belt 54 is rotated clockwise or counterclockwise by the driving of the motor (not shown), whereby the coating head 30 can be moved back and forth in the (-X) direction or the (+X) direction. At this time, the slider 52 is supported in a non-contact state with respect to the guiding member 51, so that the coating head 30 can be moved back and forth at high speed and smoothly.

The head moving mechanism 50 serves as a main scanning mechanism that moves the coating head 30 in the main scanning direction. Further, the head moving mechanism 50 is electrically connected to the control unit 2, and the coating head 30 is moved in accordance with an instruction from the control unit 2.

Further, each time the movement of the coating head 30 in the main scanning direction is completed, the stage 10 holding the substrate 9 is moved in the sub-scanning direction, whereby the application of the coating liquid to the coating region 91 on the surface of the substrate 9 is performed. Further, at the time of main scanning of the coating head 30, acceleration or deceleration is completed in the vicinity of the liquid receiving portion 12, and the coating head 30 is moved at a fixed speed of, for example, about 3 m to 5 m per second above the substrate 9.

The control unit 2 performs various arithmetic processing and controls the coating device 1 to be provided. The operation of the various departments. The control unit 2 includes a computer having, for example, a central processing unit (CPU) that performs various types of arithmetic processing, and a read-only memory (ROM) that stores a boot program or the like. A random access memory (RAM) in the work area of the arithmetic processing, a storage unit such as a hard disk in which a program or various data files are stored, a display for displaying various types, an input unit such as a keyboard and a mouse, and a local area network. A data communication unit having a data communication function or the like (local area network, LAN) or the like. The computer operates in accordance with a program installed on the computer, whereby the computer functions as the control unit 2 of the coating device 1. Further, each functional unit realized by the control unit 2 may be realized by executing a predetermined program by a computer, or may be realized by dedicated hardware. Further, each functional unit realized by the control unit 2 can also be realized by a plurality of computers.

Moreover, the coating device 1 includes alignment for formation on the substrate 9. A pair of left and right imaging units 11 that perform imaging by marking (not shown). A charge coupled device (CCD) camera is disposed on each of the pair of imaging units 11. Further, the positional alignment of the substrate 9 is performed based on the position of the alignment mark detected by the imaging unit 11.

Moreover, in the direction of the back and forth movement (X-axis direction) of the coating head 30 A pair of liquid receiving portions 12 that receive the coating liquid from the nozzles 31 of the coating head 30 are disposed on both sides of the stage 10. The coating head 30 continuously ejects the coating liquid while the coating process is not performed on the substrate 9 (in the standby period). The liquid receiving portion 12 is a mechanism for receiving the coating liquid discharged during the period, and has a porous member inside. Therefore, it can be prevented The coating liquid sprayed from the coating head 30 splashes around.

The configuration of the coating head 30 will be described in detail with reference to Fig. 3 . FIG. 3 is a schematic plan view of the nozzle attachment portion 34 included in the coating head 30. The coating head 30 includes a nozzle mounting portion 34 to which a plurality of nozzles 31 that continuously discharge the coating liquid toward the substrate 9 are attached.

The plurality of nozzles 31 are respectively held in a sliding lattice having a substantially rectangular parallelepiped shape 32A, sliding compartment 32B (nozzle holding portion). The slide grid 32A holds the nozzle 31 of the first nozzle group 31A, and the slide grid 32B holds the nozzle 31 of the second nozzle group 31B. In the sliding compartment 32A and the sliding compartment 32B, an insertion hole for inserting and holding the nozzle 31 is formed to penetrate in the Z-axis direction. Each of the sliding compartments 32A and the sliding compartments 32B is fitted into a plurality of guide grooves 3421 formed in the nozzle mounting portion 34. Each of the guide grooves 3421 extends linearly in the Y-axis direction. The sliding frame 32A and the sliding frame 32B are linearly movable along the extending direction of the guiding groove 3421.

In the nozzle mounting portion 34, the plurality of guiding grooves 3421 are spaced apart in the X-axis direction They are arranged in two columns at a fixed interval. The slide grooves 32A are accommodated in one row of the plurality of guide grooves 3421 on the -Y side, and the slide cells 32B are accommodated in the other plurality of guide grooves 3421 on the +Y side. In the example shown in FIG. 3, the guide groove 3421 in which the slide frame 32A is accommodated is disposed in the intermediate position between the two adjacent guide grooves 3421 and the guide groove 3421 in which the slide groove 32B is accommodated in the X-axis direction.

An opening extending in the Y-axis direction is formed on the bottom surface of the guide groove 3421. 3422. The opening portion 3422 functions as an opening for projecting the front end portion of the nozzle 31 toward the substrate 9 . Moreover, it is formed on the inner wall surface of the +Y side of the guide groove 3421. A through hole 3425 that penetrates in the +Y direction is formed. A rod 352 (nozzle abutting portion) of a position adjusting mechanism 35 to be described later is inserted into the through hole 3425.

A position adjustment mechanism 35 is provided on the +Y side of the nozzle mounting portion 34. The position adjustment mechanism 35 adjusts the position along the guide groove 3421 (that is, the position in the Y-axis direction) of each of the slide grooves 32A and the slide grooves 32B accommodated in the guide groove 3421. The position adjustment mechanism 35 includes an actuator 351 (drive mechanism), and a plurality of rods 352 extending from the actuator 351.

Each of the rods 352 is inserted into a through hole 3425 formed in the inner wall surface on the +Y side of the guide groove 3421. The front end portion of each of the rods 352 is fixed to the side surface portion on the +Y side of the sliding compartment 32A and the sliding compartment 32B. The rear end portion of the rod 352 is coupled to the actuator 351. The actuator 351 is driven in accordance with an instruction from the control unit 2 to move the lever 352 forward or backward in the Y-axis direction, thereby adjusting the positions of the slide grid 32A and the slide grid 32B. Since the slide grid 32A and the slide grid 32B hold the nozzle 31, the position of the slide grid 32A and the slide grid 32B is adjusted by the position adjustment mechanism 35, and the position of each nozzle 31 is adjusted.

As shown in FIG. 3, the rod 352 connected to the sliding grid 32A is disposed between the sliding compartment 32B and the sliding compartment 32B, and the sliding compartment 32B and the sliding compartment 32B are in the X-axis direction of the second nozzle group 31B. The two adjacent nozzles 31 and 31 are held. In order to reduce the size of the coating head 30, the distance between the adjacent sliding compartments 32B and the sliding compartments 32B (in other words, the spacing between the guide grooves 3421 and the guide grooves 3421 in which the sliding compartments 32B and the sliding compartments 32B are accommodated) is compared. The width of one of the sliding cells 32A held by the nozzle group 31A is narrow. In this embodiment, the adjacent sliding A lever 352 thinner than the sliding compartment 32A is disposed between the movable frame 32B and the sliding compartment 32B to transmit the power of the actuator 351. Thereby, the positional adjustment of each slide compartment 32A which hold|maintained the nozzle 31 of the 1st nozzle group 31A arrange|positioned in the position away from the actuator 351 can be performed efficiently.

A nozzle energizing mechanism 33 is provided on the -Y side of the nozzle mounting portion 34. The nozzle energizing mechanism 33 includes a plurality of rods 331 and an energizing actuator 332 that energizes each of the rods 331 toward the +Y side. The energizing actuator 332 may include a plurality of air cylinders corresponding to the respective rods 331, a regulator that controls the pressure of the plurality of cylinders, and the like.

With the nozzle energizing mechanism 33, each of the nozzles 31 receives a force that moves toward the +Y side. On the contrary, the position adjusting mechanism 35 pushes each of the nozzles 31 toward the -Y side, whereby the pitch of the adjacent nozzles 31 and 31 in the Y-axis direction is adjusted. As described above, in the present embodiment, the nozzle energizing mechanism 33, the nozzle attaching portion 34, and the position adjusting mechanism 35 constitute the pitch adjusting mechanism 3.

Further, although not shown, the application head 30 is provided with a lock mechanism for fixing the slide grooves 32A and the slide cells 32B in which the pitch adjustment mechanism 3 adjusts the position in the Y-axis direction. For the lock mechanism, for example, the mechanism described in Patent Document 2 can be employed. In other words, as the lock mechanism, a mechanism that presses each of the slide grills 32A and the slide grille 32B toward the side portions of the respective slide grills 32A and 32B to be pressed to the nozzle attachment portion 34 can be employed. Further, Patent Document 2 also describes a lock release mechanism for releasing the lock, and the technique can be applied to the present application. Needless to say, the lock mechanism and the lock release mechanism are not limited to those described in Patent Document 2, and the like can be employed. Similar technology.

As in the above, in the present embodiment, the position in the sub-scanning direction can be The plurality of adjusted nozzles 31 are arranged in two rows, and the distance between the nozzles 31 and the nozzles 31 at both ends in the main scanning direction can be shortened when arranged in one row. Thereby, before the application head 30 reaches the application region 91 of the substrate 9 from the liquid receiving portion 12, the amount of the coating liquid that is discarded by continuously discharging the coating liquid from the plurality of nozzles 31 can be effectively reduced. Therefore, the cost of manufacturing the substrate can be reduced. Further, by increasing the nozzle 31, the number of movements in the main scanning direction can be reduced. Therefore, the coating efficiency can be improved.

Further, in the present embodiment, by moving the slide grid 32A and the slide grid 32B along the guide groove 3421, the nozzle 31 is linearly moved in the sub-scanning direction. However, this configuration is only an example. That is, any configuration can be employed as long as the nozzle 31 can be stably moved in the sub-scanning direction. Further, not only the nozzle 31 is moved in the direction along the sub-scanning direction but also in the direction of the component having the main scanning direction.

<2. Second embodiment>

Next, the second embodiment will be described. In the following description, elements having the same functions as those already described will be denoted by the same reference numerals or signs of additional letters, and detailed description thereof will be omitted.

FIG. 4 is a schematic plan view of the nozzle attachment portion 34A included in the coating head 30A of the second embodiment. In the nozzle mounting portion 34A of the present embodiment, the guide grooves 3421A extending in the Y-axis direction are formed at a predetermined interval in the X-axis direction at equal intervals. Moreover, inside each of the guide grooves 3421A, The sliding compartment 32A held by the first nozzle group 31A and the sliding compartment 32B holding the second nozzle group 31B are housed in a state of being coupled by an elastic member 33A (for example, a coil spring). The elastic member 33A is in a compressed state and functions as a nozzle energizing mechanism that energizes the sliding compartment 32A and the sliding compartment 32B in a direction away from each other.

Further, a position adjustment mechanism is provided on the -Y side of the nozzle mounting portion 34A. 35A, the position adjusting mechanism 35A is for adjusting the position of the slide grid 32A of the nozzle 31 holding the first nozzle group 31A in the sub-scanning direction. The position adjustment mechanism 35A has substantially the same configuration as the position adjustment mechanism 35. In detail, the position adjustment mechanism 35A includes an actuator 351A and a plurality of rods 352A whose one end is connected to the actuator 351A and whose other end is connected to the slide grid 32A.

Further, a position adjustment mechanism is provided on the +Y side of the nozzle mounting portion 34A. 35B, the position adjusting mechanism 35B adjusts the position of the slide grid 32B of the nozzle 31 holding the second nozzle group 31B in the sub-scanning direction. The position adjustment mechanism 35B has substantially the same configuration as the position adjustment mechanism 35. In detail, the position adjustment mechanism 35B includes an actuator 351B and a plurality of rods 352B whose one ends are connected to the actuator 351B and the other end thereof is connected to the slide grid 32B.

Similarly to the actuator 351, each of the actuator 351A and the actuator 351B moves the slide bar 32A and the slide grid 32B in the sub-scanning direction by moving the plurality of levers 352A and 352B forward or backward.

Thus, in the present embodiment, the elastic member 33A is used instead of the nozzle energizing mechanism 33 of the first embodiment, thereby aligning the sliding grid 32A and the sliding grid 32B. The lever 352A and the lever 352B of the adjustment mechanism 35 are energized. In the present embodiment, the elastic member 33A, the nozzle attachment portion 34, the position adjustment mechanism 35A, and the position adjustment mechanism 35B constitute a pitch adjustment mechanism 3A that adjusts the pitch between the adjacent nozzles 31 and 31. In the case of the coating head 30A having such a configuration, similarly to the coating head 30 of the first embodiment, the amount of the coating liquid to be discarded during coating can be reduced, and the number of the nozzles 31 can be increased to improve the coating efficiency.

<3. Third embodiment>

5 is a nozzle mounting portion of the coating head 30B of the third embodiment. A schematic top view of the 34A. 6 is a schematic side view of the nozzle energizing mechanism 33B of the third embodiment. The pitch adjusting mechanism 3B of the coating head 30B of the present embodiment has a configuration substantially similar to that of the pitch adjusting mechanism 3A. However, the pitch adjusting mechanism 3A is different from the pitch adjusting mechanism 3A in that the nozzle energizing mechanism 33B is provided instead of the elastic member 33A.

The nozzle energizing mechanism 33B includes: a wedge-shaped abutting member 333 for sandwiching the sweep a state between the sliding grid 32A and the sliding compartment 32B arranged in the drawing direction abuts against the sliding compartment 32A and the sliding compartment 32B; the rod 334 has a front end connected to the wedge abutting member 333; and a cylinder 335, and The base end of the rod 334 is connected. In addition, in the figure shown in FIG. 5, only the wedge-shaped contact member 333 in the nozzle enabling mechanism 33B is shown, and the illustration of the rod 334 and the cylinder 335 is abbreviate|omitted.

The cylinder 335 can be disposed at a position fixed to the nozzle attachment portion 34A by a fixing unit (not shown). Further, the rod 334 extends from the cylinder 335 toward the -Z direction of the nozzle mounting portion 34A. The cylinder 335 is in accordance with an instruction from, for example, the control unit 2 While running, thereby transmitting its power to the rod 334, the wedge abutment member 333 is pushed downward or pulled upward. Thereby, the wedge-shaped abutting member 333 moves toward the position between the sliding compartment 32A and the sliding compartment 32B. Further, although not shown, the nozzle enabling mechanism 33B includes a moving mechanism that integrally moves the wedge abutting member 333, the rod 334, and the cylinder 335 in the Y-axis direction.

The wedge abutment member 333 is formed to have a substantially triangular shape in cross section. More specifically, as shown in FIG. 6 , the wedge-shaped abutting member 333 is gradually reduced in width toward the -Z direction by the abutting surface 33SA of the sliding lattice 32A and the sliding lattice 32B and the abutting surface 33SB. Therefore, the power of the cylinder 335 is transmitted, and the wedge-shaped abutting member 333 is pressed in the -Z direction, whereby the sliding lattice 32A and the sliding lattice 32B are energized in directions away from each other. By energizing the slide grid 32A and the slide grid 32B in this manner, the position adjustment mechanism 35A and the position adjustment mechanism 35B can be used to adjust the position of the slide grid 32A and the slide grid 32B in the sub-scanning direction.

The pitch adjustment mechanism 3B having such a nozzle energizing mechanism 33B is used for When the coating head 30B is applied, similarly to the coating head 30 of the first embodiment and the coating head 30A of the second embodiment, the amount of the coating liquid discarded can be reduced, and the number of the nozzles 31 can be increased to improve the coating efficiency.

Further, the wedge-shaped abutting member 333 may not have a triangular shape in cross section. The wedge-shaped abutting member 333 may have at least a portion in which the width of the W-axis direction (sub-scanning direction) is changed in a decreasing manner as the wedge-shaped abutting member 333 faces the sliding grid 32A and the sliding grid 32B.

<4. Fourth embodiment>

FIG. 7 is a nozzle mounting portion of the coating head 30C of the fourth embodiment. A schematic top view of the 34A. The coating head 30C has substantially the same configuration as the coating head 30A of the second embodiment, and the magnet 336 can be used as the nozzle enabling mechanism 33C.

More specifically, the nozzle 31 and the second nozzle of the first nozzle group 31A The magnet 336 is disposed between the two sliding compartments 32A and the sliding compartments 32B held by the nozzles 31 of the group 31B. Further, a magnetic body 337 having a magnetic pole repellent with respect to the magnet 336 is attached to a surface of the sliding grid 32A and the sliding compartment 32B opposed to the magnet 336. The magnetic body 337 is used to energize the sliding compartment 32A and the sliding compartment 32B in the direction away from each other. Therefore, the position adjustment mechanism 35A and the position adjustment mechanism 35B can be used to satisfactorily adjust the position of the slide grid 32A and the slide grid 32B in the sub-scanning direction.

In order to adopt the pitch adjustment mechanism 3C having such a nozzle energizing mechanism 33C In the case of the coating head 30C, similarly to the coating head 30 of the first embodiment, the coating head 30A of the second embodiment, and the coating head 30B of the third embodiment, the amount of the coating liquid discarded can be reduced, and the nozzle 31 can be increased. Increase the coating efficiency by the amount.

<5. Fifth embodiment>

In the coating head 30A of the second embodiment, each of the sliding grids 32A and the sliding grids 32B is subjected to the energizing force from the energizing actuator 332, thereby being energized toward the rod 352 and subjected to the pressing force from the actuator 351. And get the adjustment position. However, it is also contemplated that a mechanism that produces a capability can be implemented by a different mechanism than the energizing actuator 332.

FIG. 8 is a schematic plan view of the nozzle attachment portion 34B included in the coating head 30D of the fifth embodiment. In the nozzle attachment portion 34B, two rows of guide grooves 3421 extending in the Y-axis direction are formed in the same manner as the nozzle attachment portion 34A, and a plurality of guides are arranged in one row. The sliding frame 32A is accommodated in the groove 3421, and the sliding frame 32B is accommodated in the other plurality of guiding grooves 3421. However, in the coating head 30D, the nozzle energizing mechanism that energizes the sliding grid 32A and the sliding grid 32B includes the elastic member 33D instead of the energizing actuator 332.

In more detail, the sliding compartment 32A is from the -Y provided to the nozzle mounting portion 34B. The actuator 351A of the side position adjusting mechanism 35A receives a pressing force for adjusting the position in the sub-scanning direction via the lever 352A. Further, the elastic member 33D whose both ends are fixed to the +Y side surface of the slide lattice 32A and the +Y side inner wall surface of the guide groove 3421 is energized toward the slider 352A. Further, the slide compartment 32B receives a pressing force for adjusting the position in the sub-scanning direction from the actuator 351B of the position adjusting mechanism 35B provided on the +Y side of the nozzle mounting portion 34B via the lever 352B. Further, the elastic member 33D which is fixed to both the -Y side surface of the slide lattice 32B and the -Y side surface of the guide groove 3421 is energized toward the slider 352B. In the present embodiment, the elastic member 33D, the nozzle attachment portion 34B, the position adjustment mechanism 35A, and the position adjustment mechanism 35B constitute a pitch adjustment mechanism 3D that adjusts the pitch of the plurality of nozzles 31 in the sub-scanning direction.

Thus, the coating head 30D of the present embodiment can also be shortened to be located at the main The distance between the nozzle 31 and the nozzle 31 at both ends in the scanning direction can reduce the amount of the coating liquid that is discarded when the coating liquid is continuously discharged, and increase the number of the nozzles 31. Further, in the case of the coating head 30D of the present embodiment, the rod 352A and the rod 352B that transmit the power of the actuator 351A and the actuator 351B are disposed in the X as in the application head 30A shown in Fig. 4 . Sliding grid 32A adjacent to the axial direction, between sliding grids 32A or Sliding grid 32B and sliding grid 32B. Therefore, the distance between the adjacent sliding grid 32A, the sliding grid 32A or the sliding grid 32B, and the sliding grid can be further shortened.

In addition, it is also considered to use a wedge abutment like the nozzle energizing mechanism 33B. The member 333 or a mechanism formed by replacing the elastic member 33D with the magnet 336 as in the nozzle energizing mechanism 33C.

Further, in the present embodiment, the plurality of sliding compartments 32A and the plurality of sliding compartments 32B are pressed by the independent actuators 351A and 351B. However, it is also considered to use only one of the actuator 351A and the actuator 351B to press the slide grid 32A and the slide grid 32B. For example, when the configuration is such that only the actuator 351A is used to press the slide grid 32A and the slide grid 32B, the lever is moved from the actuator 351A toward the slide grid 32B, and passes through the X. The sliding groove 32A and the sliding groove 32A adjacent to each other in the axial direction may be extended. Further, both ends of the elastic member 33D that energizes the sliding compartment 32B may be attached to the +Y side surface of the sliding compartment 32B and the +Y side inner wall surface of the guiding groove 3421.

6. Sixth Embodiment>

FIG. 9 is a schematic plan view of the nozzle attachment portion 34C included in the coating head 30E of the sixth embodiment. In the coating head 30D of the fifth embodiment, the elastic member 33D as the nozzle energizing means is fixed to the inner wall surface of the guide groove 3421 and the side surface of the sliding compartment 32A or the sliding compartment 32B. On the other hand, in the coating head 30E of the sixth embodiment, the elastic member 33E that connects the sliding compartment 32A, the actuator 351B, the sliding compartment 32B, and the actuator 351A is used.

More specifically, the +Y of the guide groove 3421 in which the sliding grid 32A is housed The side inner wall surface has a through hole 3427 penetrating in the +Y direction. Among these through holes 3427, an elastic member 33E whose one end is connected to the slide lattice 32A and whose other end is connected to the actuator 351B is inserted.

Further, a through hole 3427 penetrating in the -Y direction is formed on the -Y side inner wall surface of the guide groove 3421 in which the slide lattice 32B is housed. Among these through holes 3427, an elastic member 33E whose one end is connected to the slide grill 32B and whose other end is connected to the actuator 351A is inserted.

In the present embodiment, the sliding frame 32A and the sliding frame 32B are respectively biased toward the rod 342A and the rod 342B by the elastic force accumulated in the elastic member 33E. In this state, the slide grid 32A and the slide grid 32B receive the pressing force from the actuator 351A and the actuator 351B, respectively, thereby performing position adjustment (pitch adjustment) in the sub-scanning direction. In the present embodiment, the elastic member 33E, the nozzle attachment portion 34C, the position adjustment mechanism 35A, and the position adjustment mechanism 35B constitute a pitch adjustment mechanism 3E that adjusts the pitch of the plurality of nozzles 31 in the sub-scanning direction.

In addition, each of the elastic members 33E is capable of energizing the slide grid 32A and the slide grid 32B until it abuts against the +Y side end portion (inner wall surface) and the -Y side end portion (inner wall surface) of the guide groove 3421. There is a sufficient length in the sub-scanning direction.

The connection between the elastic member 33E and the sliding compartment 32A or the sliding compartment 32B can also be released. In this case, after the pitch adjustment is performed, the position of the slide grid 32A and the slide grid 32B with respect to each guide groove 3421 is fixed by a lock mechanism (not shown), and then the actuator 351A and the actuator 351B are respectively oriented toward - Move in the Y direction and the +Y direction. Thereby, the elastic member 33E is separated from each of the sliding compartments 32A and the sliding compartments 32B. Therefore, the ability to impart to each of the sliding grids 32A and the sliding grids 32B is released. Thereby, the position of the nozzle 31 can be made more stable.

The present invention has been described in detail, but the description is exemplified in all aspects, and the present invention is not limited thereto. It should be understood that numerous modifications, not illustrated, are contemplated as long as the scope of the invention is not exceeded. Further, the respective elements described in the respective embodiments may be appropriately combined or omitted as long as they do not contradict each other.

3‧‧‧pitch adjustment mechanism

30‧‧‧Coating head

31‧‧‧Nozzles

31A‧‧‧First nozzle group

31B‧‧‧Second nozzle group

32A, 32B‧‧‧Sliding grid (nozzle holding part)

33‧‧‧Nozzle energizing mechanism

34‧‧‧Nozzle installation

3421‧‧‧ Guide slot

3422‧‧‧ openings

3425‧‧‧through hole

35‧‧‧Location adjustment mechanism

331‧‧‧ rod

332‧‧‧Enable actuator

351‧‧‧Actuator (drive mechanism)

352‧‧‧ rod (nozzle abutment)

X, Y, Z‧‧ Direction

Claims (6)

A coating device for applying a coating liquid on a substrate, the coating device comprising: a substrate holding portion that holds the substrate; a plurality of nozzles continuously ejecting a coating liquid toward the substrate; and a nozzle mounting portion that mounts the plurality of a nozzle; the main scanning mechanism moves the plurality of nozzles together with the nozzle mounting portion relative to the substrate in a main scanning direction parallel to a main surface of the substrate; the sub-scanning mechanism is a plurality of nozzles and the nozzle mounting portion are relatively moved relative to the substrate in a sub-scanning direction in which the main surfaces of the substrate are parallel and intersect with the main scanning direction; and a pitch adjusting mechanism, Adjusting a distance between two nozzles adjacent to each other in the sub-scanning direction by moving the plurality of nozzles in the sub-scanning direction, and the plurality of nozzles include: a first nozzle group arranged at a predetermined interval in the scanning direction, and a second nozzle group arranged at a predetermined interval in the sub-scanning direction with respect to the first nozzle group . The coating apparatus according to claim 1, wherein the pitch adjusting mechanism includes: a nozzle holding portion that is movably held in the sub-scanning direction; and a nozzle abutting portion from the sub-scanning One side of the direction abuts against the nozzle to maintain a nozzle energizing mechanism that energizes the nozzle holding portion toward the nozzle abutting portion from the other side in the sub-scanning direction; and a driving mechanism that faces the sub-scanning direction of the nozzle abutting portion The position is adjusted. The coating device according to claim 2, wherein the nozzle abutting member is disposed between two adjacent nozzle holding portions that hold the nozzles of the second nozzle group, and the nozzle abutting member abuts Each of the nozzle holding portions that holds the nozzles of the first nozzle group. The coating device of claim 2, wherein: the nozzle energizing mechanism includes an elastic member that holds the nozzles of the first nozzle group and the second nozzle group The two nozzle holding portions are connected to each other. The coating device of claim 2, wherein the nozzle energizing mechanism comprises: a wedge-shaped abutting member that abuts against the nozzle of the first nozzle group and the Two nozzle holding portions that are held by the two nozzles of the second nozzle group, and a moving mechanism that moves the wedge abutting member toward the two nozzle holding portions. The coating device of claim 2, wherein: the nozzle energizing mechanism comprises a magnet, and the magnet is disposed on the first spray Between the nozzles of the nozzle group and the nozzle holding portions of the nozzles of the second nozzle group, the two nozzle holding portions include a magnetic portion, and the magnetic portion has A magnetic pole that is repelled relative to the magnet.