TW201511110A - Method for manufacturing semiconductor chips - Google Patents

Abstract

To provide a method for manufacturing semiconductor chips wherein, when applying a die-bonding adhesive film to a circuit surface of a semiconductor wafer, the ability of said adhesive film to follow the shapes of bumps is improved. This method for manufacturing semiconductor chips is characterized by including the following steps: a step in which a die-bonding adhesive film is applied, under reduced pressure, to the circuit surface of a semiconductor wafer that has circuits formed on the surface thereof; and a step in which the semiconductor wafer and the die-bonding adhesive film are diced into individual circuits, yielding chips that have die-bonding adhesive films on the circuit surfaces thereof.

Description

Semiconductor wafer manufacturing method

The present invention relates to a method of manufacturing a semiconductor wafer, and more particularly to a method of manufacturing a semiconductor wafer in which a so-called blade dicing method, a dicing method, and a flip chip bonding process are continuously performed.

In recent years, there has been a fabrication of a semiconductor device using a so-called flip chip bonding or a face-down mode. In this mode, a semiconductor wafer having a convex electrode such as a bump on a circuit surface (hereinafter, simply referred to as a "wafer") is used, and the electrode is bonded to the substrate.

The semiconductor wafer is obtained by singulating a semiconductor wafer, and a liquid epoxy resin or the like is used for bonding the wafer to the substrate. However, from the viewpoint of the simplification of the process and the uniformity of the quality, a film-like die bonding agent (a film for die bonding (hereinafter, referred to as a "supplement film") is used. When such an adhesive film is used in a face-down mode, a film is provided on the circuit surface of the wafer in advance, which is simple in the process.

There is a method of forming a film for bonding a die on a circuit surface of a wafer, and the film is completely cut on the circuit surface of the wafer. And after the laminate of the film and the wafer is formed into a groove having a shallow depth of cut from the surface of the wafer, the sheet is adhered to the surface of the adhesive film, by performing A method in which the back side of the wafer is ground and the wafer is sliced.

Further, Patent Document 2 (JP-A-2009-152424) discloses a protective sheet mainly for bonding to a circuit surface of a semiconductor wafer, or a sheet adhered to a back surface of a die bonding film. Device. However, Patent Document 2 does not intend to adhere a film for bonding a die to a circuit surface of a semiconductor wafer.

[Previous Technical Literature] [Patent Literature]

Patent Document 1: Japanese Laid-Open Patent Publication No. 2008-98427

Patent Document 2: Japanese Laid-Open Patent Publication No. 2009-152424

In recent years, the shape of the convex electrodes (also referred to as bumps) formed on the surface of the circuit has a variety of distribution densities, and it has become difficult to adhere the bumps following the film surface. When the bump is relatively low and the distribution density is low, even if the adhesive film is sufficiently adhered to the bump, the height of the bump changes, and when the distribution density is different, the same adhesive film is adhered, and the bump cannot be sufficiently followed. situation. As a result, when the semiconductor wafer having the adhesive film obtained is joined, the adhesion between the wafer and the wafer mounting substrate may be insufficient, or voids (voids) may be formed around the bump without the film. It is related to the reliability after the structure is lowered, and the bumps cannot penetrate the film and become a cause of connection failure at the time of die bonding.

The present invention has been accomplished in view of the above circumstances. That is, to provide When a film is attached to the film, a method of manufacturing a semiconductor wafer which improves the followability of the film to the bump is targeted.

The present invention includes the following points.

(1) A method of manufacturing a semiconductor wafer, comprising: a step of bonding a die-bonding film for die bonding under a reduced pressure on a circuit surface of a semiconductor wafer having a circuit formed thereon; and bonding the semiconductor wafer and the die The film is formed into individual circuits to obtain a wafer having a wafer for bonding a film on the circuit surface.

(2) The method for producing a semiconductor wafer according to the above aspect, comprising the die bonding of the supporting sheet and the bonding sheet formed of the die bonding film which is detachably supported thereon The film is bonded to the circuit surface of the semiconductor wafer on which the circuit is formed under pressure on the adhesive film, and then the support sheet is peeled off by the die bonding film.

(3) The method for producing a semiconductor wafer according to the above aspect, wherein the support sheet of the sheet has a step absorbing layer, and the film for bonding die is detachably supported on the step absorbing layer.

(4) The method for producing a semiconductor wafer according to any one of (1) to (3) wherein a convex electrode is provided on a circuit surface of the semiconductor wafer.

(5) The method for producing a semiconductor wafer according to any one of (1) to (4), wherein the step of bonding the die-bonding film for die bonding is performed under a reduced pressure of 50 to 400 Pa.

According to the invention, the so-called blade cutting method is used continuously Or a method of manufacturing a semiconductor wafer by a dicing method and a flip chip bonding process, which can improve the followability of the film to the bump when the film is attached to the film. Therefore, the process with the subsequent film semiconductor wafer can be stabilized. In addition, it can improve product quality.

10‧‧‧Semiconductor wafer

11‧‧‧Semiconductor wafer

12‧‧‧ convex electrode (bump)

20‧‧‧Next film for die bonding

21‧‧‧Support board

22‧‧ ‧ differential absorption layer

23‧‧‧Substrate

24‧‧‧Adhesive layer

25‧‧‧Surface protection sheet

26‧‧‧Adhesive sheets

27‧‧‧Adhesive substrate

28‧‧‧Adhesive layer of adhesive sheet

29‧‧‧ ring box

30‧‧‧Cutting knife

31‧‧‧ditch

Fig. 1 is a view showing a state in which an additional sheet of the succeeding film 20 for die bonding is included.

Fig. 2 is a view showing a state in which an adhesive sheet including a film for bonding the bonding film 20 is included.

Fig. 3 is a view showing a state in which an adhesive sheet including a film for bonding the bonding film 20 is included.

Fig. 4 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 5 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 6 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 7 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 8 shows a step of a method of manufacturing a semiconductor wafer.

Fig. 9 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 10 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 11 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 12 is a view showing a step of a method of manufacturing a semiconductor wafer.

Fig. 13 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 14 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 15 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 16 is a view showing one step of a method of manufacturing a semiconductor wafer.

Fig. 17 is a view showing a step of a method of manufacturing a semiconductor wafer.

Figure 18 is a diagram showing one step of a method of manufacturing a semiconductor wafer.

Fig. 19 is a view showing a step of a method of manufacturing a semiconductor wafer.

Fig. 20 is a view showing an example of the type of the sequence of each step of an example of the method of manufacturing a semiconductor wafer.

Fig. 21 is a view showing one step of a method of manufacturing a semiconductor wafer.

Hereinafter, the present invention will be further described in detail with reference to the drawings.

The method for manufacturing a semiconductor wafer according to the present invention includes bonding a semiconductor wafer 10 and a die after bonding a die-bonding film 20 for a die bonding under a reduced pressure on a circuit surface of a semiconductor wafer 10 having a circuit formed thereon. Each of the circuits is formed by the subsequent film 20 to obtain a wafer 11 having a die bonding film 20 for die bonding on the circuit surface. The method of forming the wafer 10 and the film 20 is not particularly limited as described later, and various methods can be employed.

The present invention is characterized in that a wafer circuit surface is adhered to a film under reduced pressure. The method of adhering the die bonding film 20 to the circuit surface of the wafer 10 is not particularly limited as long as it is a pressure-reduced state between the wafer circuit surface and the succeeding surface of the film. An example of a non-limiting method is to prepare a single-die film which is formed into a film having the same shape as the wafer 10, and the single-film film and the wafer are overlapped in the decompression chamber to decompress the cavity. A method of crimping or thermocompression bonding a single piece of film to a wafer. Further, by using the sheet sticking described in the above Patent Document 2 The affixing device can provide the following film in a long state, and can further optimize and automate the adhesive process under reduced pressure.

Here, "under reduced pressure" means a pressure environment in which the space between the wafer circuit surface and the succeeding surface of the film is below atmospheric pressure, and the pressure environment is preferably 400 Pa or less, more preferably 50 to 400 Pa. Further, the pressure reduction of 80 to 350 Pa is preferred. As long as the pressure environment is in such a range, the following film can be sufficiently obtained to follow the unevenness of the surface of the object. Further, the film is usually composed of a large amount of low molecular weight components, and degassing occurs depending on the degree of decompression environment. However, as long as the pressure environment is within such a range, degassing can be suppressed. The pressure environment may be a dry atmosphere or an inert gas atmosphere such as nitrogen. By adhering the adhesive film to the wafer circuit surface under reduced pressure, air can be mixed between the circuit surface and the bonding film, and the followability of the bump formed on the surface of the circuit of the wafer can be improved.

Further, in addition to the decompression chamber, a pressure-applying device may be provided for pressing the film through the separator or the like to press the pressure-sensitive cavity to be adhered to the object. The pressure environment in the pressurized chamber is preferably from 0.1 MPa to 0.4 MPa.

Then, the film 20 may be pre-cut into a pre-cut form substantially the same shape as the semiconductor wafer 10 to adhere to the surface of the wafer, or may be adhered to the outer surface of the wafer after being pasted with a large planar shape of the wafer. Next, the outer peripheral portion of the film.

The film 20 may be a single layer film or a multi-layer film composed of two or more different layers. Further, the film 20 is then supplied to the semiconductor wafer 10 in a state of being detachably supported on the support sheet 21. Hereinafter, a laminate of the adhesive film 20 and the support sheet is referred to as a laminate. "The next piece" situation. The adhesion between the bonding sheet and the semiconductor wafer 10 is performed under reduced pressure as described above, and the supporting sheet is peeled off at any subsequent stage. Furthermore, the support sheet 21 may have a step difference absorbing layer 22 for absorbing the height difference of the circuit surface of the wafer and adhering the adhesive film to the surface of the wafer. Non-limiting aspects of the subsequent film, support sheet, and step absorption layer are described.

(Film bonding bonding film 20)

At least the functions required for the die bonding film 20 are (1) sheet shape maintenance, (2) initial adhesion, and (3) hardenability.

For the adhesive film 20, the (1) sheet shape dimensional property and (3) hardenability and the binder component can be imparted by adding a binder component, and the polymer component (A) and the curable component (B) can be used. 1 a binder component or a second binder component containing a curable polymer component (AB) having both the properties of (A) and (B).

The (2) initial adhesion which is temporarily followed by the function of the object (semiconductor wafer 20 or semiconductor wafer 21) until the bonding film 20 is hardened may be pressure-sensitive adhesion or may be followed by thermal softening. Nature. (2) The initial adhesion property can be controlled by the characteristics of the binder component or the adjustment of the blending amount of the inorganic filler (C) to be described later.

(1st binder component)

The first binder component contains the polymer component (A) and the curable component (B) to impart film forming properties and hardenability to the film. Further, the curable polymer component (AB) is not contained in the case where it is convenient to distinguish the first binder component from the second binder.

(A) polymer component

The polymer component (A) is mainly used to impart shape and dimensional properties to the film sheet. It is added to the adhesive film for the purpose.

In order to achieve the above object, the weight average molecular weight (Mw) of the polymer component (A) is usually 20,000 or more, preferably 20,000 to 3,000,000. The value of the weight average molecular weight (Mw) is a value measured by gel permeation chromatography (GPC) (polystyrene standard). For the measurement by such a method, for example, the high-speed GPC device "HLC-8120GPC" manufactured by TOSO Corporation is used, and the high-speed column "TSK gurd column H _XL -H", "TSK Gel GMH _XL ", and "TSK Gel G2000" are used. H _XL ” (above, all manufactured by TOSO Corporation), in this order, the column temperature: 40 ° C, the infusion rate: 1.0 mL / min, using a differential refractometer as a detector.

Further, in order to facilitate the distinction from the curable polymer (AB) to be described later, the polymer component (A) does not have a curing functional group to be described later.

As the polymer component (A), an acrylic polymer, a polyester, or a phenoxy resin can be used (in order to facilitate the distinction from the curable polymer (AB) described later, it is limited to those having no epoxy group). , polyether, polyurethane, polyoxyalkylene, rubber-based polymers, and the like. Further, it may be an acrylic urethane resin obtained by reacting an acrylic polyol having a propylene polymer having a hydroxyl group with a urethane prepolymer having an isocyanate group at a molecular terminal, etc., for example, such as two or more kinds of bonds. . In addition, a polymer containing two or more types of bonds may be used in combination of two or more kinds.

(A1) acrylic polymer

As the polymer component (A), the acrylic polymer (A1) can be preferably used. The glass transition temperature (Tg) of the acrylic polymer (A1) is preferably -60 to 50 ° C, more preferably -50 to 40 ° C, and further preferably in the range of -40 to 30 ° C. Acrylic polymerization When the glass transition temperature of the material (A1) is too low, the peeling force of the film 20 and the support sheet 21 becomes large, and the transfer failure of the film may occur. If the film is too high, the adhesion of the film may be lowered. There is an abnormality that cannot be transferred to the subject or the film is peeled off from the subject after the transfer.

The weight average molecular weight of the acrylic polymer (A1) is preferably from 100,000 to 1,500,000. When the weight average molecular weight of the acrylic polymer (A1) is too low, the adhesion between the film 20 and the support sheet 21 becomes high, and the transfer failure of the film is caused to occur. If the film is too high, the film is subsequently attached. The property is lowered, and there is an abnormality that the film cannot be transferred to the object, or the film is peeled off from the object after the transfer.

The acrylic polymer (A1) contains at least a (meth) acrylate, at least a constituent monomer.

The (meth) acrylate may, for example, be a (meth) acrylate having an alkyl group having an alkyl group having 1 to 18 carbon atoms, and specific examples thereof include methyl (meth)acrylate and ethyl (meth)acrylate. Methyl) propyl acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, etc.; (meth) acrylate having a cyclic skeleton, specifically, a (meth) acrylate ring Alkyl ester, benzyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentyl (meth) acrylate Ethyloxyethyl ester, quinone imine (meth) acrylate, and the like. In addition, among the monomers having a hydroxyl group, a monomer having a carboxyl group, and a monomer having an amine group, which will be described later, may be exemplified as (meth)acrylate.

Further, in the present specification, (meth)acrylic acid is used in the sense of containing both acrylic acid and methacrylic acid.

A monomer constituting the acrylic polymer (A1) can have a hydroxyl group Monomer. By using such a monomer, a hydroxyl group can be introduced into the acrylic polymer (A1), and when the film further contains the energy ray-curable component (B2), the compatibility with the acrylic polymer (A1) can be improved. The monomer having a hydroxyl group may be a (meth) acrylate having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate; N-hydroxymethyl (methyl) Acrylamide and the like.

As the monomer constituting the acrylic polymer (A1), a monomer having a carboxyl group can also be used. By using such a monomer, a carboxyl group can be introduced into the acrylic polymer (A1), and when the film further contains the energy ray-curable component (B2), the compatibility with the acrylic polymer (A1) can be improved. The monomer having a carboxyl group may, for example, be (meth)acrylic acid, maleic acid, fumaric acid or itaconic acid. When the epoxy-based thermosetting component is used as the curable component (B) to be described later, since the carboxyl group reacts with the epoxy group in the epoxy-based thermosetting component, the amount of the monomer having a carboxyl group is preferably small.

As the monomer constituting the acrylic polymer (A1), a monomer having an amine group can also be used. Examples of such a monomer include an amino group-containing (meth) acrylate such as monoethylamino group (meth) acrylate.

As the monomer constituting the acrylic polymer (A1), other vinyl acetate, styrene, ethylene, α-olefin or the like can be used.

The acrylic polymer (A1) can also be bridged. When the acrylic polymer (A1) is bridged, the acrylic polymer (A1) before bridging has a bridging functional group such as a hydroxyl group. Further, a bridging agent is added to the composition for forming the adhesive film 20. Bridging is carried out by reacting a bridging functional group with a functional group possessed by a bridging agent. By bridging the acrylic polymer (A1), the initial adhesion force and cohesive force of the adhesive film can be adjusted.

The bridging agent may, for example, be an organic polyvalent isocyanate compound or an organic polyvalent quinone imine compound.

The organic polyvalent isocyanate compound may, for example, be an aromatic polyvalent isocyanate compound, an aliphatic polyvalent isocyanate compound, an alicyclic polyvalent isocyanate compound, a terpolymer of the organic polyvalent isocyanate compound, and the organic polyvalent isocyanate. A terminal isocyanate prepolymer obtained by reacting a compound with a polyol compound or the like.

The organic polyvalent isocyanate compound may specifically be 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 1,3-xylene diisocyanate, 1,4-dimethylbenzene diisocyanate or diphenylmethane-4. , 4'-diisocyanate, diphenylmethane-2,4'-diisocyanate, 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, dicyclohexylmethane- 4,4'-diisocyanate, dicyclohexylmethane-2,4'-diisocyanate, lysine isocyanate, and such polyol adducts.

An organic polyvalent quinone imine compound, specifically, N,N'-diphenylmethane-4,4'-bis(1-aziridine carboxamide), trimethylolpropane-tri-beta-nitrogen Propidyl propionate, tetramethylolmethane-tri-β-aziridine propionate and N,N'-toluene-2,4-bis(1-aziridine carboxamide) triethylene melamine Wait.

The bridging agent, 100 parts of the acrylic polymer (A1) before bridging, is usually 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, and more preferably 0.5 to 5 parts by mass.

In the present invention, when the content of the component constituting the film is determined based on the content of the polymer component (A), and the polymer component (A) is a bridging acrylic polymer, the content as a reference is used. , bridging The content of the former acrylic polymer.

(A2) non-acrylic resin

Further, the polymer component (A) may be selected in combination from a polyester or a phenoxy resin (for the purpose of distinguishing the curable polymer (AB) described later, it is limited to those having no epoxy group), polycarbonate, poly One type or a combination of two or more types of the ether, the urethane, the polysiloxane, the rubber-based polymer, or the non-acrylic resin (A2) to which the two or more types are bonded. Such a resin is preferably a weight average molecular weight of 20,000 to 100,000, more preferably 20,000 to 80,000.

The glass transition temperature of the non-acrylic resin (A2) is preferably -30 to 150 ° C, more preferably -20 to 120 ° C. When the glass transition temperature of the non-acrylic resin is too low, the peeling force of the film and the support sheet is increased, and the transfer failure of the film may occur. If the glass transition temperature is too high, there is a problem that the adhesion between the film and the object is insufficient.

When the non-acrylic resin (A2) is used in combination with the above-mentioned acrylic polymer (A1), a composite sheet for forming a perforated film which will be described later is used, and when the film is transferred to the substrate, the support sheet can be easily obtained. 21 is peeled off between the layers of the film 20. Further, the film tends to easily follow the unevenness of the bumps on the transfer surface.

When the non-acrylic resin (A2) is used in combination with the acrylic polymer (A1), the content of the non-acrylic resin (A2) is the mass ratio of the non-acrylic resin (A2) to the acrylic polymer (A1). (A2: A1), usually 1:99~60:40, preferably in the range of 1:99~30:70. By setting the content of the non-acrylic resin (A2) in this range, a higher degree of the above effects can be obtained.

(B) hardening ingredients

The curable component (B) is added to the adhesive film for the main purpose of imparting curability to the adhesive film 20. As the curable component (B), a thermosetting component (B1) or an energy ray-curable component (B2) can be used. In addition, these uses can also be combined. The thermosetting component (B1) contains at least a compound which can be reacted by heating. In addition, the energy ray-curable component (B2) is a compound (B21) containing a functional group reactive by irradiation with an energy ray, and is polymerized and cured by irradiation with an energy ray such as an ultraviolet ray or an electron beam. The functional groups based on the curable components react with each other to form a three-dimensional network structure to achieve hardening. Since the curable component (B) is used in combination with the polymer component (A), the weight average molecular weight is generally suppressed from the viewpoint of suppressing the increase in viscosity of the coating composition for forming the adhesive film, the lift treatment, and the like. Mw) is 10,000 or less, preferably 100 to 10,000.

(B1) thermosetting component

When the adhesive film is cured, it is difficult to apply energy ray to the adhesive film which is sandwiched between the wafer mounting portion and the wafer. Therefore, it is preferable to use the thermosetting component (B1). The thermosetting component is preferably an epoxy thermosetting component, for example.

The epoxy-based thermosetting component is preferably a compound (B11) having an epoxy group and a compound (B11) having an epoxy group and a thermosetting agent (B12).

(B11) a compound having an epoxy group

The compound (B11) having an epoxy group (hereinafter referred to as "epoxy compound (B11)") can be used. Specifically, a polyfunctional epoxy resin, bisphenol A diglycidyl ether or a hydrogenated product thereof, an o-cresol novolac epoxy resin, a dicyclopentadiene type epoxy resin, a biphenyl type epoxy resin, and a double Phenol A ring An oxygen resin, a bisphenol F type epoxy resin, a phenylene skeleton type epoxy resin, etc. have a bifunctional or more epoxy compound in a molecule.

These may be used alone or in combination of two or more.

When the epoxy compound (B11) is used, the epoxy resin (B11) is preferably contained in an amount of from 1 to 1,500 parts by mass, and more preferably from 3 to 1200 parts by mass, per 100 parts by mass of the polymer component (A). When the epoxy compound (B11) is less than 1 mass, sufficient adhesion cannot be obtained. When the amount exceeds 1,500 parts by mass, the peeling force of the film 20 and the support sheet 21 becomes high, and the transfer of the film is followed. Bad situation. From the viewpoint of further improving the followability of the film to the bump, it is preferable that the film is composed of 100 parts by mass of the epoxy resin compound (B11) in the mass portion of the polymer component (A).

(B12) Thermal hardener

The heat hardener (B12) is a hardener which acts on the epoxy compound (B11). A preferred thermosetting agent is a compound having two or more functional groups reactive with an epoxy group in one molecule. The functional group may, for example, be a phenolic hydroxyl group, an alcoholic hydroxyl group, an amine group, a carboxyl group or an acid anhydride. Among these, a phenolic hydroxyl group, an amine group, an acid anhydride, etc. are preferable, and a phenolic hydroxyl group and an amine group are more preferable.

Specific examples of the phenolic curing agent include a polyfunctional phenol resin, a bisphenol, a novolac phenol resin, a dicyclopentadiene phenol resin, a neophenolic phenol resin, and an aralkyl phenol resin. Specific examples of the amine-based curing agent include DICY (dicyandiamide). These may be used alone or in combination of two or more.

The content of the thermosetting agent (B12) is preferably 0.1 to 500 parts by mass, more preferably 1 to 200 parts by mass, per 100 parts by mass of the epoxy compound (B11). If the content of the heat hardener is small, there is a case where the hardening is insufficient and the adhesion cannot be obtained, and the excess is There is a case where the moisture absorption rate of the film is increased and the reliability of the semiconductor device is lowered.

(B13) hardening accelerator

A hardening accelerator (B13) may also be used to adjust the rate of thermal hardening of the film. The curing accelerator (B13) can be particularly preferably used in the case where an epoxy-based thermosetting component is used as the thermosetting component (B1).

Preferred hardening accelerators include tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, and tris(dimethylaminomethyl)phenol; 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl4-methyl 5-hydroxymethyl Imidazoles such as imidazole; organophosphines such as tributylphosphine, diphenylphosphine, triphenylphosphine; tetraphenylboric acid such as tetraphenylphosphonium tetraphenylborate or triphenylphosphine tetraphenylborate Ester and the like. These may be used alone or in combination of two or more.

The curing accelerator (B13) is preferably contained in an amount of 0.01 to 10 parts by mass in total of 100 parts by mass of the epoxy compound (B11) and the thermosetting agent (B12), and more preferably in an amount of 0.1 to 1 part by mass. By containing the hardening accelerator (B13) in an amount within the above range, it has excellent adhesion even when exposed to high temperature and high humidity, and high reliability can be achieved even when exposed to severe tempering conditions. When the content of the hardening accelerator (B13) is small, the curing is insufficient and sufficient adhesion cannot be obtained, and if the excess is high, the curing accelerator having high polarity moves the film to the subsequent interface side under high temperature and high humidity, and segregation occurs. The situation of reducing the reliability of the semiconductor device.

(B2) energy line hardening component

By requiring the film to contain an energy ray hardening component, it is not necessary to carry out a large amount of The energy and the long-term thermal hardening step are followed by hardening of the film. Thereby, the manufacturing cost can be reduced. Further, in the case where a film-like bonding agent for die bonding is used, when the film contains the thermosetting component (B1) and the energy ray-curable component (B2), it can be irradiated by the energy ray before the thermal curing step. The film is then pre-cured. Thereby, the adhesion of the interface between the film 20 and the support sheet 21 can be controlled, or the step of the film-like adhesive which is performed in the step of the wire bonding step or the like before the hot-hardening step can be improved.

As the energy ray-curable component, a compound (B21) having a functional group reactive by irradiation with an energy ray can be used alone, but a compound (B21) having a functional group reactive by irradiation with an energy ray is used and photopolymerization is used. The initiator (B22) is preferred.

(B21) a compound having a functional group reactive by irradiation of an energy ray

A compound (B21) having a functional group which is reacted by irradiation with an energy ray (hereinafter referred to as "energy ray-reactive compound (B21)"), specifically, trimethylolpropane triacrylate , pentaerythritol triacrylate, isoamyl alcohol tetraacrylate, diisopentaerythritol monohydroxy pentaacrylate, diisopentaerythritol hexaacrylate or 1,4-butanediol diacrylate, 1, An acrylate-based compound such as 6-hexanediol diacrylate, and examples thereof include oligoester acrylate, urethane acrylate oligomer, epoxy acrylate, polyether acrylate, and itaconic acid oligomerization. An acrylate compound having a polymer structure such as an acrylate compound or the like, and having a relatively low molecular weight. Such a compound has at least one polymerizable double bond bond in the molecule.

When the energy ray-reactive compound (B21) is used, in the film, The polymer component (A) is preferably contained in an amount of from 1 to 1,500 parts by mass of the energy ray-reactive compound (B21), and more preferably from 3 to 1200 parts by mass.

(B22) Photopolymerization initiator

By combining the photopolymerization initiator (B21) with the photopolymerization-reactive compound (B21), the polymerization hardening time can be shortened, and the amount of light irradiation can be reduced.

Such a photopolymerization initiator (B22), specifically, benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin benzoic acid Methyl ester, benzoin dimethyl ketal, 2,4-diethyl thioxanthone, α-hydroxycyclohexyl benzophenone, benzyl diphenyl sulfide, tetramethylthiuram sulfide, azobisisobutyronitrile, Benzene oxime, diphenyl oxime, diacetyl hydrazine, 1,2-diphenylmethane. 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]acetone, 2,4,6-trimethylbenzoin diphenylphosphine oxide and β-chloropurine Wait. The photopolymerization initiator (B22) may be used alone or in combination of two or more.

The blending ratio of the photopolymerization initiator (B22) is preferably 0.1 to 10 parts by mass, and more preferably 1 to 5 parts by mass, based on 100 parts by mass of the energy ray-reactive compound (B21).

When the blending ratio of the photopolymerization initiator (B22) is less than 0.1 parts by mass, the photopolymerization is insufficient to obtain satisfactory curability, and if it exceeds 10 parts by mass, it is a residue which contributes to photopolymerization. There are reasons for becoming abnormal.

(2nd adhesive component)

The second binder component is provided with a curable polymer component (AB) to impart film forming properties (sheet formation properties) and curability to the film.

(AB) hardenable polymer component

The curable polymer component is a polymer having a functional group of a hardening function. The hardening functional group is a functional group which can react with each other to form a three-dimensional network structure, and may be a functional group which is reacted by heating or a functional group which is reacted by an energy ray.

The hardening functional group may be added to the unit of continuous structure which becomes the skeleton of the curable polymer (AB), and may be added to the terminal. When the functional group of the curing function is added to a unit of a continuous structure which becomes a skeleton of the curable polymer component (AB), the functional group of the curing function may be added to the side chain or may be directly added to the main chain. The weight average molecular weight (Mw) of the curable polymer component (AB) is usually 20,000 or more from the viewpoint of achieving the purpose of imparting shape-dimensional properties to the film sheet.

The epoxy group can be mentioned by heating the functional group of the reaction. The epoxy group-containing phenolic resin component (AB) may be a phenoxy resin having an epoxy group. Specific product names include jER1256 and jER4250 manufactured by Mitsubishi Chemical Corporation.

Further, the curable polymer component is the same polymer as the above acrylic polymer (A1), and the monomer may be a monomer-polymerized (epoxy-containing acrylic polymer) having an epoxy group. As such a monomer, a (meth) acrylate having a glycidyl group such as glycidyl (meth)acrylate can be mentioned.

When an acrylic polymer containing an epoxy group is used, the preferred embodiment is the same as that of the acrylic polymer (A1).

When a curable polymer component (AB) having an epoxy group is used, a thermosetting agent (B12) or a hardening accelerator may be used in combination as in the case of using an epoxy-based thermosetting component as the curable component (B). (B13).

The functional group based on the energy ray reaction may, for example, be a (meth) acrylonitrile group. The curable polymer component (AB) having a functional group reactive by an energy ray is an acrylate-based compound having a polymerization structure such as polyether acrylate, and the like, and a high molecular weight can be used.

Further, for example, a base polymer having a functional group X having a hydroxyl group or the like in a side chain and a functional group Y capable of reacting with the functional group X (for example, when the functional group X is a hydroxyl group, an isocyanate group or the like) may be used. And a polymer prepared by reacting a low molecular compound of a functional group irradiated with an energy ray.

In this case, when the base polymer is the acrylic polymer (A), the preferred aspect of the base polymer is the same as that of the acrylic polymer (A).

When the curable polymer component (AB) having a functional group reactive by an energy ray is used, a photopolymerization initiator (B22) may be used in the same manner as in the case of using the energy ray-curable component (B2).

The second binder component may contain the polymer component (A) or the curable component (B) together with the curable polymer component (AB).

The following film may contain the following components in addition to the binder component.

(C) inorganic filler

The film may then also contain an inorganic filler (C). By blending the inorganic filler (C) with the bonding film, the coefficient of thermal expansion of the film after curing can be adjusted, and the thermal expansion coefficient of the cured film after the curing can be optimized for the semiconductor wafer 11 to be cured. It is the reliability of a semiconductor device. In addition, the moisture absorption rate of the adhesive film after hardening can also be reduced.

Preferred inorganic fillers include powders of cerium oxide, aluminum oxide, talc, calcium carbonate, titanium oxide, iron oxide, cerium carbide, boron nitride, etc., and spheroidized beads, single crystal fibers, and the like. Glass fiber, etc. Among these, a cerium oxide filler and an alumina filler are preferred. The inorganic filler (C) may be used singly or in combination of two or more. In order to obtain the above effect more reliably, the range of the content of the inorganic filler (C) is preferably from 1 to 80% by mass, more preferably from 5 to 75% by mass, based on the ratio of the mass constituting the total solid content of the film. 15~60% by mass is particularly good.

(D) coupling agent

The coupling agent (D) having a functional group reactive with an inorganic substance and a functional group reactive with an organic functional group can be used to enhance the adhesion of the adhesive film to the adherend, the adhesion, and/or the cohesiveness of the film. Further, by using the coupling agent (D), the heat resistance of the adhesive film obtained by hardening the film can be improved without impairing the water resistance. Examples of such a coupling agent include a titanate coupling agent, an aluminate coupling agent, and a decane coupling agent. Among these, a decane coupling agent is preferred.

The decane coupling agent can be suitably used, and the functional group reactive with the organic functional group can react with the functional group of the polymer (A), the curable component (B) or the curable polymer component (AB). Base decane coupling agent.

Examples of the decane coupling agent include γ-glycidylpropyltrimethoxydecane, γ-glycidylpropylmethyldiethoxydecane, and β-(3,4-epoxycyclohexyl)ethyl. Trimethoxydecane, γ-(methacryloxypropyl)trimethoxydecane, γ-aminopropyltrimethoxydecane, N-6-(aminoethyl)-γ-aminopropyltrimethyl Oxydecane, N-6-(aminoethyl)-γ-aminopropylmethyldiethoxydecane, N-phenyl-γ-aminopropyltrimethoxydecane, γ-urethane Triethoxy decane, γ-胇 Propyltrimethoxydecane, γ-mercaptopropylmethyldimethoxydecane, bis(3-triethoxydecylpropyl)tetrasulfide, methyltrimethoxydecane, methyltriethyl Oxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, imidazolium, and the like. These may be used alone or in combination of two or more.

The decane coupling agent has a total mass of 100 parts by mass of the polymer (A), the curable component (B), and the curable polymer component (AB) having a weight average molecular weight of 10,000 or more, and is usually 0.1 to 20 parts by mass, and 0.2 to 10 parts by mass. The quality department is better, and it is better to include the ratio of 0.3 to 5 mass parts. When the content of the decane coupling agent is less than 0.1 part by mass, the above effect may not be obtained, and if it exceeds 20 parts by mass, it may cause degassing.

(E) general purpose additives

Next, in addition to the above, various additives may be blended as necessary. Examples of the various additives include a smoothing agent, a plasticizer, a charge preventing agent, an oxidation preventing agent, an ion trapping agent, a gas trapping agent, and a chain shifting agent.

Next, the film 20 may be a film of a single composition, or may be a laminated film of two or more films having different compositions. When two or more types of thin films are used, for example, a large amount of the adhesive component can be blended on the film on the side of the semiconductor wafer, and the blending amount of the curable component can be increased in the film next to the wafer mounting portion.

Next, the thickness of the film 20 is usually 3 to 100 μm, preferably 3 to 95 μm, and particularly preferably 5 to 85 μm. Further, when a convex electrode (bump) 12 is formed on the surface of the wafer to which the film is pasted, the circuit surface is covered without voids, and the bump penetrates the film, and the average height (H _B ) of the bump 12 is obtained. The ratio (H _B /T _A ) to the subsequent degree (T _A ) of the film 20 is preferably 1.0/0.3 to 1.0/0.95, more preferably 1.0/0.5 to 1.0/0.9, and further 1.0/0.6 to 1.0. /0.85 is better, especially in the range of 1.0/0.7~1.0/0.8. The average height (H _B ) of the bumps 12 is determined by the arithmetic mean of the wafer surface (the circuit surface from which the bumps are removed) to the top of the bumps, and when there are many bumps.

When the height of the film is too high, the height of the bump is too high, and there is a space between the wafer surface (the circuit surface on which the bump is removed) and the wafer mounting substrate, and the void is formed. On the other hand, if the film is too thick, the bump does not penetrate the adhesive layer, which causes a conduction failure.

(Support plate 21)

Next, the film 20 is attached to the semiconductor wafer by a state in which the film 20 is detachably supported on the support sheet 21 and adhered to the semiconductor wafer. Furthermore, the support sheet 21 may have a step difference absorbing layer 22 for absorbing the height difference of the circuit surface of the wafer and adhering the adhesive film to the surface of the wafer.

Next, the film 20 is formed by being detachably laminated on the support sheet 21. The support sheet 21 may be a single layer or a plurality of layers of a resin film (refer to FIG. 1), and may be formed on the resin film to form an adhesive sheet 24 (refer to the second sheet). Figure).

(substrate 23)

The substrate 23 is not particularly limited, and for example, low density polyethylene (LDPE), linear low density polyethylene (LLDPE), ethylene can be used. Propylene copolymer, polypropylene, polybutene, polybutadiene, polymethylpentene, ethylene. Vinyl acetate copolymer, ethylene. (Meth)acrylic copolymer, ethylene. Methyl (meth) acrylate copolymer, ethylene. Resin composed of ethyl (meth)acrylate copolymer, polyvinyl chloride, vinyl chloride, vinyl acetate copolymer, polyurethane film, ionomer resin, etc. Film and the like. Further, a step absorption layer to be described later may be used as the substrate.

These resin films may be used in combination of two or more kinds. Further, one can use the resin film to be colored, or apply to a printer or the like. Further, the resin film may be formed by extruding a thermoplastic resin into a sheet, or may be an extension, or may be formed by thinning a curable resin by a predetermined means and hardening it to form a sheet.

The thickness of the substrate 23 is not particularly limited, and is preferably 30 to 300 μm, more preferably 50 to 200 μm. By making the thickness of the base material 23 in the above range, it is possible to impart sufficient flexibility to the base sheet including the base material and the adhesive film, and thus exhibit good adhesion to the semiconductor wafer.

As shown in Fig. 1, when the adhesive film 20 is directly formed on the substrate 23, the surface tension of the substrate 23 to the surface of the adhesive film 20 is preferably 40 mN/m or less, more preferably 37 mN/m or less. It is particularly good below 35mN/m. The lower limit is usually about 25 mN/m. Such a substrate having a low surface tension can be obtained by appropriately selecting a material, or can be obtained by applying a release agent to the surface of the substrate by a release treatment.

The release agent used for the release treatment may be an alkyd type, an anthrone type, a fluorine type, an unsaturated polyester type, a polyolefin type, a wax type or the like, and particularly an alkyd type, an anthrone type, or a fluorine type stripping. The agent has good heat resistance.

The surface of the substrate is subjected to a release treatment using the above-mentioned release agent, and the release agent may be directly solvent-free or diluted with a solvent or latex, by a gravure coater, a metering bar coater, an air knife coater, and a roll. Coating by a wheel coater or the like, supplying the substrate coated with the release agent to normal temperature or under heating, or by electron beam hardening, wet lamination or dry lamination, hot melt lamination, melt extrusion lamination Coextrusion It is sufficient to form a laminate.

(adhesive layer 24)

As shown in Fig. 2, the support sheet 21 may be attached to the substrate sheet having the adhesive layer 24 on the substrate 23. At this time, the above-mentioned adhesive film 20 is detachably laminated on the adhesive layer 24. Therefore, as the adhesive layer 24, a weak adhesive property can be used, and an energy ray hardening property which reduces the adhesive force by energy ray irradiation can also be used. Further, the energy ray-curable adhesive may be hardened in advance to form the adhesive layer 24. The weakly adhesive layer can be embossed on the surface by various conventional adhesives (for example, general-purpose adhesives such as rubber, acrylic, ketone, urethane, vinyl ether, etc.). It is formed by an adhesive, an energy ray-curable adhesive, an adhesive containing a thermal expansion component, and the like.

Acrylic and anthrone can be used well as an adhesive. In addition, considering the peeling property of the film, the adhesion of the adhesive layer 24 to the SUS plate at 23 ° C is preferably 30 to 120 mN / 25 mm, more preferably 50 to 100 mN / 25 mm, and further preferably 60 to 90 mN / 25 mm. . When the adhesive force is too low, the adhesion between the film 20 and the adhesive layer 24 is insufficient, and the film and the adhesive layer are peeled off. Further, if the adhesive force is too high, the film 20 and the adhesive layer 24 are excessively adhered to each other, which causes a pickup failure.

Further, in the configuration of Fig. 2, in order to strengthen the base material 23 and the adhesive layer 24, the surface of the base material 23 on which the adhesive layer 24 is provided may be subjected to sand blasting or solvent treatment as desired. Concavo-convex treatment, or corona discharge treatment, electron beam irradiation, plasma treatment, ozone. Oxidation treatment such as ultraviolet irradiation treatment, flame treatment, chromic acid treatment, hot air treatment, and the like. In addition, the underlying treatment can also be applied.

The thickness of the adhesive layer 24 is not particularly limited, and is preferably 1 to 100 μm, more preferably 2 to 80 μm, and particularly preferably 3 to 50 μm.

(step difference absorption layer 22)

When the height difference of the surface of the semiconductor wafer to which the film 20 is pasted is large, the support sheet 21 preferably has the step difference absorption layer 22. A film 20 (not shown) may be directly laminated on the step absorption layer 22. Further, as shown in FIG. 3, when the support sheet has the step absorbing layer 22 and the adhesive layer 24 on the substrate 23, the adhesive layer 24 is formed on the uppermost layer of the support sheet 21 on the adhesive layer 24. It is preferable to provide the adhesive film 20 thereon. Thereby, the peelability of the support sheet 21 of the adhesive film 20 can be easily controlled by the adhesive layer 24.

The thickness of the step absorption layer 22 is not particularly limited, and is preferably 10 to 400 μm, and the storage elastic modulus at 23 ° C is preferably 0.2 to 6.0 MPa.

The step absorption layer 22 exhibits a specific viscoelasticity when it is attached to a device region having a bump formed on the surface of the wafer, and can be quickly deformed according to the shape of the device to alleviate the stress caused by the height difference (step difference) of the device. Even if the device is paid, it is easy to prevent the device from being crushed. When the thickness of the step-absorbing layer 22 is less than 100 μm or the storage modulus of the step-absorbing layer 22 at 23° C. exceeds 6.0 MPa, the stress caused by the height difference of the device cannot be sufficiently alleviated. On the other hand, when the thickness of the step difference absorption layer 22 exceeds 400 μm or the storage elastic modulus of the step difference absorption layer 22 at 23 ° C is less than 0.2 MPa, the step absorption layer 22 is crushed by the end surface when the sheet is wound up. Extrusion exceptions and so on.

The thickness of the step absorption layer 22 is preferably from 30 to 350 μm, particularly preferably from 50 to 250 μm. In addition, the storage flexibility of the step absorption layer 22 at 23 ° C The modulus is preferably 0.2 to 2.5 MPa, and particularly preferably 0.5 to 1.5 MPa. By making the thickness of the step difference absorbing layer 22 and the storage elastic modulus at 23 ° C in the above range, the step difference of the wafer surface can be buried in the step absorbing layer 22, and the step difference can be easily absorbed.

The step-absorbing layer 22 preferably satisfies the above-described thickness and storage elastic modulus, and the material thereof is not particularly limited, and it is preferable to include a cured product obtained by curing a urethane-containing curable composition. The urethane-containing curable resin composition may be one in which an energy ray-curable monomer is blended as necessary for a urethane (meth) acrylate oligomer, or an energy ray-curable monomer is blended in a non-reactive polyurethane. As an example, a case will be described in which a cured product comprising a polyether polyol-based polyurethane and an energy ray-curable monomer and an energy ray-hardened product is used.

The polyether polyol-based polyurethane may be obtained by polycondensation of a polyether polyol and a polyvalent isocyanate compound, and may be a high molecular weight body or an oligomer. In the case of an oligomer, a polymerizable functional group is preferred, and a polymerizable functional group may, for example, be a (meth)acryl fluorenyl group. Such a polyether polyol-based polyurethane may, for example, be a polyether polyol-based urethane (meth)acrylate oligomer.

A polyether polyol-based urethane (meth) acrylate oligomer having a constituent unit derived from a polyether polyol in a molecule, and an energy ray-polymerizable (meth) acrylonitrile group, and having urethane Bonded compound. a polyether polyol-based urethane (meth) acrylate oligomer, for example, a terminal isocyanate urethane prepolymer obtained by reacting a polyether polyol compound with a polyvalent isocyanate compound, and a methyl group having a hydroxyl group ) Acrylate reaction derived. By using a polyether polyol-based urethane (meth) acrylate oligomer having two or more (meth) acrylonitrile groups, the adhesion of the step absorbing layer 22 can be suppressed, and it is not easy to follow the operator or Equipment is better.

The polyether polyol compound is not particularly limited, and is a bifunctional diol, a trifunctional triol, or a tetrafunctional or higher polyhydric alcohol, and is used from the viewpoints of easiness of acquisition, versatility, reactivity, and the like. The diol is particularly preferred. Therefore, a polyether diol can be preferably used.

The polyether diol is generally represented by HO-(-RO-) _n -H. Here, the R-based divalent hydrocarbon group is preferably an alkylene group, more preferably an alkylene group having 1 to 6 carbon atoms, and particularly preferably an alkylene group having 2 or 3 carbon atoms. Further, among the alkylene groups having 1 to 6 carbon atoms, ethylene, propylene, butylene or tetramethylene is preferred, and ethylene or propylene is particularly preferred. Such an ether bond may be a structure derived from a ring-opening reaction of a cyclic ether such as ethylene oxide, propylene oxide or tetrahydrofuran. By using such a polyether polyol compound, the urethane (meth) acrylate oligomer contains a constituent unit derived from the polyether polyol compound. The number of N-series (-R-0-) is preferably about 10 to 250, preferably about 25 to 205, and particularly preferably from about 40 to 185. When N is less than 10, the urethane bond density of the urethane (meth) acrylate oligomer becomes high, and the storage elastic modulus of the step absorbing layer 22 at 23 ° C becomes high. On the other hand, since the polyether chains interact with each other, n is larger than 250, and the storage elastic modulus at 23 ° C is lowered.

The molecular weight of the polyether polyol compound is preferably from 1,000 to 10,000, more preferably from about 2,000 to 8,000. When the molecular weight is lower than 1,000, the bridging density of the urethane (meth) acrylate oligomer becomes high, and the storage elastic modulus of the step absorbing layer 22 at 23 ° C tends to increase. When the weight average molecular weight is too high, the storage modulus at 23 ° C is lowered due to the polymer interaction of the polyether chains.

Furthermore, the molecular weight of the polyether polyol compound is a polyether type. The number of polyol functional groups × 56.11 × 1000 / hydroxyl value [mgKOH / g], which is calculated from the hydroxyl value of the polyether polyol compound.

The polyether polyol compound is introduced into an ether bond portion (-(-RO-) _n -) by a urethane reaction of a polyvalent isocyanate compound to form a terminal isocyanate urethane prepolymer.

Examples of the polyvalent isocyanate compound include aliphatic polyisocyanates such as tetramethylene isocyanate, hexamethylene isocyanate, and trimethylhexamethylene isocyanate; isophorone diisocyanate, norbornene diisocyanate, and An alicyclic diisocyanate such as cyclohexylmethane-4,4'-diisocyanate, dicyclohexylmethane-2,4'-diisocyanate, ω,ω'-diisocyanate dimethylcyclohexane; Aromatic diisocyanates such as 4'-diphenylmethane diisocyanate, toluene diisocyanate, xylene diisocyanate, tolidine diisocyanate, tetramethylene xylylene diisocyanate, naphthalene-1,5-diisocyanate Classes, etc. Among these, isophorone diisocyanate, hexamethylene isocyanate, and xylene diisocyanate are used, and the viscosity of the urethane (meth) acrylate oligomer can be kept low, and the workability is good.

Further, in the urethane reaction, various conventional catalysts may be used as necessary. The catalyst may, for example, be a tin compound such as dibutyltin oxide or stannous octoate or a titanium alkoxide such as tetrabutyl titanate or tetrapropyl titanate. When the catalyst is used, the amount thereof is not particularly limited, and is preferably from 10 to 500 ppm depending on the reaction rate or the reaction control surface. The reaction temperature of the esterification reaction is not particularly limited, and is preferably from 150 to 300 ° C depending on the reaction rate or the reaction control surface.

a polyether polyol compound as described above, a terminal isocyanate urethane prepolymer obtained by reacting a polyvalent isocyanate compound, and having a hydroxyl group The (meth) acrylate is reacted to obtain a polyether polyol-based urethane (meth) acrylate oligomer.

The (meth) acrylate having a hydroxyl group is not particularly limited as long as it has a hydroxyl group and a (meth) acrylonitrile group in one molecule, and a conventional one can be used. Specific examples thereof include α-hydroxymethacrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl acrylate, and 4-hydroxyl ring. Hexyl (meth) acrylate, 5-hydroxycyclooctyl (meth) acrylate, 2-hydroxy-3-phenyl oxypropyl (meth) acrylate, pentaerythritol tri (meth) acrylate An alkylene ether group-containing (meth) acrylate such as polyethylene glycol mono(meth)acrylate or polypropylene glycol mono(meth)acrylate; N-hydroxymethyl(meth)acrylamide A hydroxyl group-containing (meth) acrylamide, a reaction product obtained by reacting vinyl alcohol, vinyl phenol, bisphenol A diglycidyl ether (methyl) with acrylic acid, and the like.

The reaction of the terminal isocyanate urethane prepolymer and the (meth) acrylate having a hydroxyl group is a terminal isocyanate urethane prepolymer and a (meth) acrylate having a hydroxyl group, as necessary in a solvent or a catalyst. In the presence of 60 to 100 ° C, the reaction can be about 1 to 4 hours.

The amount of the terminal isocyanate urethane prepolymer and the (meth) acrylate having a hydroxyl group is not particularly limited, and is usually (the equivalent of the isocyanate group of the terminal isocyanurate urethane prepolymer) / (having a hydroxyl group (methyl group) The equivalent of the hydroxyl group of the acrylate is preferably from 0.5 to 1.0.

The weight average molecular weight Mw of the polyether polyol-based urethane (meth) acrylate oligomer thus obtained (referred to as a polystyrene equivalent value by gel permeation chromatography, the same applies hereinafter), and is not particularly limited. Usually, it is preferably 35,000~100000, more preferably 40,000~80000, and 45,000~70000. Don't be good. By setting the weight average molecular weight Mw within such a range, it is easy to adjust the storage elastic modulus of the step difference absorption layer 22 at 23 ° C to the above satisfactory range. By making it 100,000 or less, the resin viscosity of a urethane (meth)acrylate oligomer can be made low, and the handleability of the coating liquid for film formation can be improved.

The obtained polyether polyol-based urethane (meth) acrylate oligomer is a photopolymerizable double bond bond in a molecule, and has a property of being polymerized and hardened by irradiation with an energy ray to form a film. Such a polyether polyol-based urethane (meth) acrylate oligomer is a polyether polyol site having a relatively long chain length in a molecule, and the propylene group having a polymerization point has a relatively small molecular weight. The step absorption layer 22 containing a cured product of a urethane (meth) acrylate oligomer exhibits specific viscoelasticity.

The polyether polyol-based urethane (meth) acrylate oligomer may be used alone or in combination of two or more. Since the urethane (meth) acrylate oligomer as described above has a large amount of film formation, it is difficult to form a film, and after the film is mixed with the energy ray-curable monomer, the step absorbing layer 22 is obtained by hardening. The energy ray-curable monomer is a double bond bond having energy ray polymerizability in a molecule, and can be favorably used for an acrylate-based compound having a large volume.

Specific examples of the energy ray-curable monomer include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, and (methyl). N-butyl acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, n-amyl (meth)acrylate, n-hexyl (meth)acrylate, 2-ethyl (meth)acrylate Hexyl ester, n-octyl (meth)acrylate, isooctyl (meth)acrylate, decyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, (methyl) Decyl acrylate, dodecyl (meth)acrylate, (meth) propylene The carbon number of the alkyl group such as acid tridecyl ester, tetradecyl (meth)acrylate, hexadecyl (meth)acrylate, octadecyl (meth)acrylate or stearyl (meth)acrylate is 1~ 30 (meth) acrylate; isobornyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentyl (meth) acrylate, dicyclopentenyl oxy acrylate, (meth) acrylate having an alicyclic structure such as cyclohexyl (meth) acrylate or adamantane (meth) acrylate; phenoxyethyl (meth) acrylate, phenyl hydroxy propyl ( (Meth) acrylate having an aromatic structure such as methyl acrylate, benzyl (meth) acrylate or 2-hydroxy-3-phenoxypropyl (meth) acrylate; or tetrahydroanthracene a (meth) acrylate having a heterocyclic structure such as a (meth) acrylate, (meth) propylene morpholine, N-vinyl pyrrolidone or N-vinyl caprolactam; styrene, hydroxy group B A vinyl compound such as a vinyl ether, hydroxybutyl vinyl ether or N-vinylformamide. Further, a polyfunctional acrylate can also be used as necessary.

Among these, in terms of compatibility with urethane (meth) acrylate oligomer, (meth) acrylate having an alicyclic structure having a large volume, and having an aromatic structure (A) Acrylates, acrylates having a heterocyclic structure are preferred.

The amount of the energy ray-curable monomer to be used is preferably from 10 to 500 parts by mass, and more preferably from 30 to 400 parts by mass, based on 100 parts by mass of the urethane (meth) acrylate oligomer (solid content).

As a film forming method, a method called cast film forming (casting film forming) can be suitably employed. Specifically, a liquid blend (a mixture of the above components, which is diluted with a solvent as necessary), for example, a film is cast on a work sheet, and then the coating film is irradiated with an energy ray to be polymerized and cured to form a film. According to such a manufacturing method, the resin is less stressed when the film is formed, and no fish eyes are formed. In addition, the uniformity after the film is high, and the thickness accuracy is usually within 2%. The energy line, specifically, ultraviolet rays, electronic wires, or the like can be used. Further, the amount of irradiation may be various depending on the type of the energy ray. For example, when ultraviolet rays are used, the ultraviolet ray intensity is 50 to 300 mW/cm ² , and the ultraviolet ray irradiation amount is preferably 100 to 1200 mJ/cm ² .

In the case of film formation, when ultraviolet rays are used as the energy ray, the photopolymerization initiator can be blended with the conjugate to efficiently react. Such a photopolymerization initiator may, for example, be a photopolymerization initiator such as a benzoin compound, an acetophenone compound, a mercaptophosphine oxide compound, a titanocene compound, a thioxanthone compound or a peroxide compound, an amine or a hydrazine, etc. Specific examples of the photosensitizer, 1-hydroxycyclohexyl benzophenone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin Propyl ether and the like.

The amount of the photopolymerization initiator to be used is preferably 0.05 to 15 parts by mass, and 0.1 to 10 parts by mass in total of 100 parts by mass of the urethane (meth) acrylate oligomer and the energy ray-curable monomer. Good, especially good at 0.3~5 quality.

Further, an inorganic filler such as calcium carbonate, cerium oxide or mica; a metal filler such as iron or lead may be added to the above-mentioned blend. Further, in addition to the above components, the step difference absorbing layer 22 may contain an additive such as a coloring agent such as a pigment or a dye.

The stepped absorption layer 22 containing the cured product obtained by curing the urethane-curable composition may be laminated on the substrate 23 after forming a film on the engineered sheet, or may directly form a film on the substrate 23. Absorbing layer 22.

Further, the step difference absorption layer 22 may be one containing an olefin-based copolymer as a main component. The olefin-based copolymer can be exemplified by Mitsui Chemicals Co., Ltd. TAFMER (registered trademark) of ethylene. Alpha-olefin copolymer. The olefin-based copolymer forming the step-absorbing layer 22 of the present invention is preferably an α-olefin copolymer containing at least two kinds of α-olefins having an α-olefin having 2 to 12 carbon atoms as a main component.

The α-olefin having 2 to 12 carbon atoms may, for example, be ethylene, propylene, 1-butene, 1-pentene, 3-methyl-1-butene, 1-hexene or 4-methyl-1- Pentene, 3-methyl-1-pentene, 1-heptene, 1-octene, 1-decene, 1-dodecene, and the like. Adhesive combination of excellent adhesion, can be ethylene. Propylene copolymer, ethylene. 1-butene copolymer, propylene. 1-butene. a terpolymer of an α-olefin having 5 to 12 carbon atoms, ethylene. Propylene. a terpolymer of α-olefin having 4 to 12 carbon atoms, propylene. 1-butene. A three-component copolymer of an α-olefin having 5 to 12 carbon atoms. Further, the olefin-based copolymer may be used singly or in combination of two or more kinds.

The step absorbing layer 22 preferably contains the olefin-based copolymer as a main component, and the content thereof is usually from 60 to 100% by mass, preferably from 70 to 100% by mass.

A method in which the olefin-based copolymer is contained as a main component and the step-absorbing layer 22 is formed on the substrate 23 is, for example, an extrusion molding method.

(Method of manufacturing semiconductor wafer)

Next, a method of manufacturing a semiconductor wafer with a bonding film using the above-described bonding film will be described as a non-limiting specific example. In the following, an example in which the adhesive sheet 20 is supported on the support sheet 21 is used, but the support sheet 21 may not be used, and the film 20 may be unsupported. Peeling of the support sheet 21 can be performed at any stage after the adhesion of the film 20. Then, the film may be partially hardened. In this case, the film may be partially hardened before being adhered to the surface of the wafer circuit, or may be adhered after the film is adhered to the film. The line is partially hardened. Subsequently, the film 20 is partially cured, and for example, the film may be heated to form a semi-cured state, and when the film contains an energy ray-curable component, it may be irradiated with energy rays. In addition, in the figure, the supporting sheet 21 is described as a single layer, but the supporting sheet 21 may be a single-layer resin sheet of the substrate 23, or may be a multi-layer resin sheet, which may be the substrate 23 and adhered thereto. The subsequent sheet composed of the agent layer 24 may be configured to have the step difference absorbing layer 22.

(method 1)

The manufacturing method 1 of the semiconductor device includes the following steps (1a) to (1f) in the manufacturing method 1 of the semiconductor device, and the step (1b) is performed after the step (1a) or the step (1a).

(1a) The film-bonding bonding film 20 is detachably supported on the support sheet 21 and then formed on the film surface of the bonding sheet 21, and is adhered to the surface of the semiconductor wafer 10 on which the circuit is formed under reduced pressure. a step of circuit surface; (1b) a step of adhering the surface protection sheet 25 to the semiconductor wafer 10 via the subsequent sheet 21 or the film 20; (1c) a step of grinding the back surface of the semiconductor wafer 10; (1d) a step of adhering the back surface of the semiconductor wafer 10 to the adhesive sheet 26; (1e) a step of peeling off the surface protection sheet 25; (1f) a step of peeling off the support sheet 21; and (1g) bonding the semiconductor wafer 10 and the die The step of forming each of the circuits by 20 sheets of the film is carried out.

Hereinafter, each step will be explained

(1a) steps

In the step (1a), the die bonding film 20 for the die bonding is detachably supported by the support The film surface of the subsequent sheet formed on the sheet 21 is adhered to the circuit surface of the semiconductor wafer 10 on which the circuit is formed under reduced pressure (see Fig. 4). The specific method of adhering the film to the film under reduced pressure is as described above.

Furthermore, in the methods 1 to 3, the die bonding film 20 and the supporting plate 21 may be previously cut into a pre-cut shape substantially the same shape as the semiconductor wafer 10, and may be attached to the wafer surface. After the large planar shape of the adhesive film is pasted, the outer peripheral portion is cut along the outer diameter of the wafer. The support sheet 21 may be peeled off after the adhesive sheet is attached ((1f) step), or the support sheet may be left.

The semiconductor wafer 10 may be a conventionally used semiconductor wafer or a gallium arsenide semiconductor wafer, but is not limited thereto, and various semiconductor wafers can be used. The circuit formation on the wafer surface can be carried out by various methods including the etching method, the lift method, and the like, which have been conventionally used. In the circuit forming step of the wafer, a predetermined circuit is formed. Further, it is preferable that a bump electrode (bump) 12 for conducting electricity to the wafer mounting substrate is formed on the circuit surface. The height and the diameter of the bumps 12 are various in accordance with the design of the semiconductor device. Generally, the height is about 10 to 100 μm and the diameter is about 20 to 100 μm. Such bumps 12 are often formed of a metal such as gold, copper, or solder. The shape of the bump 12 is not particularly limited. In addition to the cylindrical shape or the spherical shape, the shape of the hemisphere may be placed on the tip end of the cylinder as shown in FIG. 4 .

(1b) steps

In the step (1b), the surface protection sheet 25 is adhered to the side of the support sheet 21 side of the sheet (see Fig. 5). Further, when the support sheet 21 is peeled off, the surface protection sheet 25 is adhered to the adhesive film 20. Surface protection plate 25, tied The back grinding step (step (1c)), which will be described later, is used to hold the wafer 10 and protect the circuit surface.

The surface protection sheet 25 can be used without any particular limitation for various adhesive sheets for such use. Further, in the methods 1 to 3, when the surface protection sheet 25 is adhered to the support sheet 21, it is preferable to perform the peeling of the surface protection sheet in a state of being integrated with the support sheet in the subsequent steps. A strong adhesion surface protection sheet is preferred. Further, when the surface protective sheet 25 is adhered to the adhesive film 20, in the subsequent step, the interface between the surface protective sheet 25 and the adhesive film 20 is peeled off, and the surface protective sheet is used with a weakly adhesive or re-peelable surface. The protective sheet is preferred.

The surface protection sheet 25 is preferably substantially equal in shape to the wafer 10. At this time, the surface protection sheet 25 may be cut into a shape substantially the same as the wafer 10, or the surface protection sheet 25 may be adhered to the wafer 10 via the subsequent sheet, and the excess sheet may be along the wafer. The outer circumference of 10 is cut to remove excess sheets. Further, the thickness of the surface protective sheet 25 is usually 20 to 1000 μm, preferably 50 to 250 μm. When the surface protective sheet 25 has an adhesive layer, the thickness of the adhesive layer in the above thickness is 5 to 500 μm, preferably 10 to 100 μm. Further, the method of adhering the surface protection sheet is not particularly limited, and it can be carried out by a method such as a film coater.

Further, an adhesive sheet composed of the adhesive film 20 and the support sheet 21 may be laminated on the surface protective sheet 25 in advance, and the above steps (1a) and (1b) may be simultaneously performed. Further, the film 20 may be laminated directly on the surface protective sheet 25. At this time, the support sheet 21 does not exist in the drawing surface, and the surface protection sheet 25 also serves as the support sheet 21.

(1c) steps

In the step (1c), the back surface of the semiconductor wafer is ground to make the thickness of the wafer 10 thin (see Fig. 6). The back surface grinding of the wafer 10 is performed by a method using a grinder or the like. The thickness of the wafer 10 after the back grinding is not particularly limited, and is usually about 50 to 300 μm. In addition, the thickness of the wafer here means the thickness of the part which does not form a bump.

(1d) step

In the step (1d), the adhesive sheet 26 is adhered to the back surface of the semiconductor wafer 10 (see Fig. 7). The adhesive sheet 26 can be used as long as it is used for a conventional cutting sheet. The method of adhering the adhesive sheet 26 is not particularly limited, and it can be carried out by a method such as a film coater. The adhesive sheet represented by the dicing sheet, for example, the adhesive sheet 26 having the adhesive layer 28 is generally used for the substrate 27, but is not limited thereto, and various adhesive sheets can be used.

(1e) steps

In the step (1e), the surface protective sheet 25 is peeled off.

(1f) steps

In the step (1f), the support sheet 21 is peeled off. As described above, the step (1f) can be carried out before the step (1b). Further, when the support sheet 21 remains, it is preferable to peel off the support sheet 21 simultaneously with the surface protection sheet 25 (see Fig. 8), and the support sheet 21 may be peeled off after the surface protection sheet 25 is peeled off.

(1g) step

In the step (1g), the semiconductor wafer 10 and the die-bonding bonding film 20 are formed into a single chip, and the semiconductor wafer 11 having the die bonding film 20 on the circuit surface is obtained (see FIG. 9). That is, in the (1g) step, the semiconductor crystal The laminate of the circle 10 and the film 20 is cut by each circuit formed on the surface of the wafer.

The cutting is performed by cutting the wafer 10 together with the film 20. The dicing method is not particularly limited. For example, as shown in FIG. 9, when the outer peripheral portion of the adhesive sheet 26 is fixed by the annular frame 29 at the time of dicing the wafer, the rotation of the dicing blade 30 or the like is used. A method of wafer formation of a wafer by a conventional method such as a circular blade. The cutting depth of the adhesive sheet 26 can be cut as long as the adhesive film 20 and the wafer 10 can be completely cut, and the interface between the wafer 10 and the adhesive sheet 26 is preferably 0 to 30 μm. By making the cutting of the base material 27 small, it is possible to suppress the melting of the base material 27 by the friction of the dicing blade 30 or the occurrence of burrs or the like on the base material 27. In addition, the wafer 10 and the bonding film 20 may be cut using a laser. In this case, it is possible to use a laser full cut, or to irradiate the laser light to form a modified region layer inside the wafer, and use the modified region layer as a starting point. In the latter method, the film may not be cut. In this case, the adhesive sheet 26 is expanded, and the film is cut by the spreading force.

Thereafter, the semiconductor wafer 11 to which the film is attached is cut and picked up by a general purpose such as a chuck, and the adhesive film 26 is peeled off from the semiconductor wafer 11. As a result, as shown in Fig. 10, a semiconductor wafer 11 having a film bonding bonding film 20 (a semiconductor wafer 11 with a film attached thereto) was obtained. Furthermore, the advancement of the adhesive sheet 26 is carried out prior to picking up, and the inter-wafer isolation can be more easily picked up.

(Method 2)

The manufacturing method 2 of the semiconductor device includes the following steps (2a) to (2f) in the manufacturing method 2 of the semiconductor device, and the step (2e) is performed after the step (2d).

(2a) a step of bonding the surface protection sheet 25 to the circuit surface of the semiconductor wafer 10 on which the circuit is formed, (2b) a step of grinding the back surface of the semiconductor wafer 10, and (2c) pasting the back surface of the semiconductor wafer 10. a step of adhering the sheet 26; (2d) a step of peeling off the surface protection sheet 25 from the circuit surface of the semiconductor wafer 10; (2e) detachably holding the die bonding film 20 on the support sheet 21 The film surface of the succeeding sheet is adhered to the circuit surface of the semiconductor wafer 10 on which the circuit is formed under pressure, and (2f) the semiconductor wafer 10 and the die bonding film are formed into 20 pieces. The steps of each circuit.

Hereinafter, each step will be explained

(2a) steps

In the step (2a), the surface protective sheet 25 is adhered to the circuit surface of the semiconductor wafer 10 on which the circuit is formed (see FIG. 11). The semiconductor wafer 10 and the surface protection sheet 25 are the same as described above. The surface protection sheet 25 may be pre-cut into a pre-cut form substantially the same shape as the semiconductor wafer 10 and adhered to the surface of the wafer, or may be adhered to the wafer after the wafer has a larger planar shape. The diameter is cut off the outer circumference.

(2b) steps

In the step (2b), the back surface of the semiconductor wafer is ground to make the thickness of the wafer 10 thin (see Fig. 12). The specific method is the same as the above step (1c).

(2c) steps

In step (2c), the adhesive sheet 26 is adhered to the back surface of the semiconductor wafer 10. The adhesive sheet 26 is the same as described above. For the stabilization of the process, the adhesive layer 28 may be adhered to the ring frame 29 at its outer peripheral portion (refer to Fig. 13).

(2d) step

In the step (2d), the surface protection sheet 25 is peeled off from the circuit surface of the semiconductor wafer 10. As a result, the semiconductor wafer 10 having the bumps 12 laminated on the adhesive sheet 26 can be obtained (refer to Fig. 14).

(2e) steps

In the step (2e), the die bonding bonding film 20 is detachably supported on the supporting film sheet 21 to form a film surface of the bonding sheet, and is adhered to the surface of the semiconductor wafer on which the circuit is formed under reduced pressure. Steps of the circuit surface of 10 (refer to Figure 15). The specific method of adhering the film to the film under reduced pressure is as described above.

(2f) steps

In the step (2f), the semiconductor wafer 10 and the die bonding bonding film 20 are each formed into a single chip, and the semiconductor wafer 11 having the die bonding bonding film 20 on the circuit surface is obtained. The method is not particularly limited, and a film for fixing a wafer for holding a die-bonding film 20 on a support sheet 21 by peeling off a sheet is used as a film for wafer fixing at the time of dicing. It is better. That is, it is preferable to perform the cutting after transferring the wafer onto the subsequent sheet. The method of singulating the wafer may be a method using a dicing blade or a method using a laser beam.

After the step (2f), when the obtained wafer 11 is transferred to another subsequent sheet, it is the same as the ninth drawing referred to in the above (1f) step. The subsequent pickup steps are the same as described above, and the specific aspects thereof are also the same as those in FIG.

(Method 3)

The manufacturing method 3 of the semiconductor device includes the following steps (3a) to (3f).

(3a) The film-bonding bonding film 20 is detachably supported on the supporting film sheet 21, and then the film surface of the bonding sheet is adhered to the surface of the semiconductor wafer 10 on which the circuit is formed under reduced pressure. a step of circuit surface; (3b) a step of forming a trench 31 having a shallower depth than the thickness of the wafer of the semiconductor wafer 10; (3c) being applied to the semiconductor wafer 10 directly, or via the bonding sheet 21 or the film 20, a step of adhering the surface protection sheet 25; (3d) a step of finally dividing into individual wafers 11 by grinding the back surface of the semiconductor wafer 10, and thinning the thickness of the wafer; (3e) dividing the group of wafers 11 The back side is adhered to the step of adhering the sheet 26; (3f) the step of peeling off the surface protection sheet 25.

(3g) The step of peeling off the support sheet 21.

Hereinafter, each step will be explained

(3a) steps

The step (3a) is the same as the above step (1a) (see Fig. 4).

(3b) steps

In the step (3b), a groove 31 having a depth shallower than the wafer thickness is formed on the circuit surface of the semiconductor wafer 10 on which the circuit is formed (see FIG. 16). At this time, when the surface of the semiconductor wafer 10 is pasted to the subsequent sheet, that is, after the step (3a), and before the step (3g), when the step (3b) is performed, the sheet will be attached (following the film 20 and the support sheet). Sheet 21) is completely cut (refer to Fig. 16). Further, when the film 20 is adhered, that is, when the step (3b) is carried out after the step (3a) and the step (3g), the film is completely cut. When the step (3b) is performed before the step (3a), the bonding sheet or the bonding film 20 is not present on the surface of the semiconductor wafer 10.

The method of forming the groove 31 is not particularly limited. For example, the wafer is adhered to the dicing film, the peripheral portion of the dicing film is fixed by a ring frame, or the circuit surface side of the wafer 10 is fixed to the chuck, and a dicing blade is used. A conventional method such as rotating a circular knife or the like cuts the sheet completely to form a groove 31 having a shallow depth of the wafer.

(3c) steps

In the step (3c), the surface protection sheet 25 is adhered to the surface on which the groove is formed (on the surface of the semiconductor wafer 10 to which the bonding sheet or the film 20 is adhered, on the side of the supporting sheet 21 or the film 20 side). (For the case where the surface of the semiconductor wafer 1 is pasted and attached to the sheet, refer to Fig. 17). Specific examples of the surface protective sheet 25 and the bonding method thereof are the same as described above.

(3d) step

In the step (3d), the back surface of the semiconductor wafer 10 is ground to reduce the thickness of the wafer, and the wafer 11 is divided into individual wafers 11 (the case where the surface of the semiconductor wafer 10 is adhered to the sheet) is referred to 18)). The back surface grinding of the wafer is performed by a method such as a grinder. The thickness of the wafer is thinned by back grinding, and the wafer is divided into individual wafers 11 by the thickness of the wafer reaching the bottom of the groove 31 formed in the step (3b).

(3e) steps

In the step (3e), the adhesive sheet 26 is adhered to the back surface (grinding surface side) of the divided group wafer 11 (see FIG. 19 for the case where the bonding sheet is adhered to the surface of the semiconductor wafer 10). Specific examples of the adhesive sheet 26 and a bonding method thereof are the same as described above. Further, in order to ensure operability, it is easy to expand, and it is preferable to fix the peripheral portion of the adhesive sheet 26 with the ring frame 29.

(3f) step

In the step (3f), the surface protective sheet 25 is peeled off.

(3g) step

In the (3g) step, the support sheet 21 is peeled off. In the step (3f), the (3g) step and the (3f) step may be simultaneously performed by simultaneously peeling the surface protective sheet 25 and the supporting sheet 21. At this time, when the step (3b) is performed after the step (3a), the step (3b) is cut and the individual sheet sheets 21 are peeled off.

Here, the order in which the steps (3a) to (3g) are performed will be described.

The step (3a) is preceded by the step (3c) or the step (3c), but the steps (3a) and (3b) are arbitrary. The steps (3b) to (3f) must be carried out in the order of (3b), (3c), (3d), (3e), and (3f).

As described in Method 1, the (3g) step can be carried out between steps (3a) and (3c). When the (3g) step is not performed before the step (3c), the support sheet 21 is sandwiched between the semiconductor wafer 10 and the surface protection sheet 25 until the step (3f), and the support sheet cannot be peeled off only. twenty one. Therefore, the (3g) step at this time is performed simultaneously with the step (3f) or after the step (3f).

Several types of sequences for these steps are shown in the graph of Figure 20.

When the step (3a) is carried out simultaneously with the step (3c), the subsequent sheet composed of the adhesive film 20 and the support sheet 21 may be laminated on the surface protective sheet 25 in advance, as in the case of the method 1 or directly. Next, the film 20 is laminated on the surface protection sheet 25 which also serves as the support sheet 21. At this time, since the step (3c) is performed after the step (3b), the step (3a) is also performed after the step (3b). Therefore, it is preferable to carry out the (3h) step of the second description.

When the step (3a) is carried out after the step (3b), the film (20b) does not cut the film 20 while forming the groove. Therefore, after the steps (3a) to (3g) are carried out, the film 20 is not singulated (see Fig. 21). Therefore, it is preferable to carry out (3h) the step of forming the bonding die 20 for die bonding corresponding to the portion between the wafers in plan view, and cutting the film into the same shape as the wafer. When the (3h) step is carried out, the (3h) step is carried out after the (3d) step.

(3h) step

In the step (3h), the film bonding bonding film 20 corresponding to the portion between the wafers is cut in plan view and cut into the same shape as the wafer 11 (see FIG. 21). The method of cutting the film 20 is not particularly limited, and for example, by expanding the surface protective sheet 25 or the adhesive sheet 26, the die bonding film 20 is cut into the same shape as the wafer 11 ( Method A). In addition, a method of irradiating the film bonding bonding film 20 which corresponds to a portion between wafers in plan view, and cutting the die bonding bonding film 20 into the same shape as the wafer 11 (method B) ).

In the method A, the film bonding bonding film 20 is maintained at 15 ° C or lower, preferably -10 to 10 ° C during expansion, because the stress (expansion force) generated by the expansion becomes easy. The tendency of the subsequent film 20 to propagate between the wafers facilitates the formation of the subsequent film into each wafer. The adhesive film adhering to the wafer 10 is not restricted by the wafer because its deformation is restricted, and the deformation of the adhesive film between the wafers is not limited, so that it is cut to have substantially the same shape as the wafer by the extension. Expansion, preferably at a speed of 5 to 600 mm/min. In the case of the method A, since the spreading force of the surface protective sheet 25 or the adhesive sheet 26 can be propagated to the adhesive film 20, the supporting sheet 21 is peeled off in advance (step (3g)). It is better. When the surface protection sheet 25 is expanded, it is preferred to complete the step (3g) prior to the step (3c).

By peeling the support sheet 21 and the surface protection sheet 25, the (3h) step required according to the case is performed in the same condition as the ninth drawing referred to in the above (1g) step (but the cutter 30 is not present). ). The subsequent pickup step is the same as described above, and the specific aspect thereof is the same as that of Fig. 10.

The semiconductor wafer with the adhesive film obtained by the above methods 1 to 3 is then picked up. The pick-up of the semiconductor wafer with the adhesive film may be directly performed by the adhesive sheet 26, or the semiconductor wafer 11 with the adhesive film may be transferred from the adhesive sheet 26 to the other adhesive sheet, and the other The film is then picked up to pick up a semiconductor wafer with a film attached thereto. Such other adhesive sheets are preferably those having an appropriate pressure-sensitive adhesiveness and re-peelability, and in particular, an ultraviolet-curable adhesive sheet previously used as a cut sheet can be preferably used.

The picking up of the semiconductor wafer with the film attached can be carried out by a conventional method using a vacuum chuck. Further, when necessary, the semiconductor wafer to which the film is attached is lifted from the back side of the other adhesive sheet of the adhesive sheet 26 by the tip.

The semiconductor wafer with the adhesive film may be subjected to the next step directly or through the inversion step of the wafer, or may be used in the next step if it is stored in the transfer film or in the storage container.

Then, the semiconductor wafer 11 with the adhesive film is placed on a predetermined position such as an electrode portion of the wafer mounting substrate via the adhesive film 20. Specifically, on the side of the circuit surface, the wafer having the film 20 is placed in a face down mode. It is placed on a predetermined wafer mounting substrate. In the wafer having the bumps, the bumps are placed facing the terminal portions on the corresponding wafer mounting substrate.

Thereafter, the semiconductor wafer to which the film is bonded and the film is bonded is heated and fixed to the substrate for wafer mounting. Next, the film 20 is formed by heating to form an adhesive semi-hardening resin, an adhesive, a thermoplastic resin or the like as described above. By heating these conditions under predetermined conditions, if it is a semi-hardening resin, adhesiveness is formed by hardening of a resin, or if it is an adhesive, it is adhesive-hardening by the hardening resin containing the thermosetting resin. Further, in the case of a thermosetting plastic resin, the adhesion force is expressed by heat sealing.

After the die bonding (flip chip bonding) as described above, a semiconductor device is obtained through a usual procedure such as resin encapsulation, if necessary.

As described above, the method for manufacturing a semiconductor wafer of the present invention will be described with reference to the drawings, but the present invention is not limited to the method for manufacturing a semiconductor wafer having the above configuration, and can be applied to a method for manufacturing a semiconductor wafer having various configurations.

20‧‧‧Next film for die bonding

21‧‧‧Support board

23‧‧‧Substrate

Claims (5)

A method of manufacturing a semiconductor wafer, comprising: a step of bonding a die-bonding film for die bonding under a reduced pressure on a circuit surface of a semiconductor wafer having a circuit formed thereon; and a bonding film for bonding a semiconductor wafer and a die Each of the circuits is formed into a chip having a wafer having a die for bonding a die on the circuit surface. A method of manufacturing a semiconductor wafer according to the first aspect of the invention, comprising: a support sheet, and a die bond of the succeeding sheet formed of the die-bonding film for peelingly supported thereon; The film is bonded to the circuit surface of the semiconductor wafer on which the circuit is formed under pressure on the adhesive film, and then the support sheet is peeled off by the die bonding film. The method of manufacturing a semiconductor wafer according to the second aspect of the invention, wherein the support sheet of the sheet has a step absorption layer, and the film for bonding the die is carried by the film on the step absorption layer. The method of manufacturing a semiconductor wafer according to any one of claims 1 to 3, wherein a convex electrode is provided on a circuit surface of the semiconductor wafer. The method for producing a semiconductor wafer according to any one of claims 1 to 4, wherein the step of adhering the film for die bonding is carried out under reduced pressure in a pressure environment of 50 to 400 Pa.