TW201440936A - Laser beam irradiation apparatus and apparatus for manufacturing optical member affixed body - Google Patents

Laser beam irradiation apparatus and apparatus for manufacturing optical member affixed body Download PDF

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Publication number
TW201440936A
TW201440936A TW103104253A TW103104253A TW201440936A TW 201440936 A TW201440936 A TW 201440936A TW 103104253 A TW103104253 A TW 103104253A TW 103104253 A TW103104253 A TW 103104253A TW 201440936 A TW201440936 A TW 201440936A
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laser light
optical component
scanner
layer
bonding
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TW103104253A
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Chinese (zh)
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TWI607815B (en
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Mikio Fujii
Hiromitsu Tanaka
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Sumitomo Chemical Co
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0665Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0838Devices involving movement of the workpiece in at least one axial direction by using an endless conveyor belt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0853Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • G02B27/0988Diaphragms, spatial filters, masks for removing or filtering a part of the beam

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)

Abstract

A laser beam irradiation apparatus includes, a table that has a supporting surface which supports an object, a laser beam oscillator configured to oscillate a laser beam, a scanner configured to scan the laser beam two-dimensionally in a plane parallel to the supporting surface, moving device configured to move the table and the scanner relatively with each other, and a controller configured to control the scanner and the moving device, wherein the controller is capable of forming an overlapping portion on a laser processing line by relatively moving the scanner and the table with each other along the laser processing line while deflecting the laser beam by using the scanner, the overlapping portion being a portion where the laser beam is irradiated for plurality of times.

Description

雷射光照射裝置及光學組件貼合體之製造裝置Laser light irradiation device and optical component bonding body manufacturing device

本發明係關於一種雷射光照射裝置及光學組件貼合體之製造裝置。 本發明係根據2013年2月13日所提出之日本專利申請第2013-026099號而主張其優先權,並於此引用其內容。The present invention relates to a laser light irradiation device and a manufacturing device for an optical component bonding body. The present invention claims priority from Japanese Patent Application No. 2013-026099, filed on Feb. 13, 2013, the content of which is incorporated herein.

傳統上,已知有朝對象物體照射雷射光而進行特定加工的雷射光照射裝置。雷射光照射裝置係能對薄膜切斷加工等加以利用,例如,期望應用於專利文獻1所記載之偏光薄膜製造方法等。Conventionally, a laser light irradiation device that irradiates laser light to a target object and performs specific processing is known. The laser light irradiation device can be used for the film cutting process and the like, and is preferably applied to, for example, the method for producing a polarizing film described in Patent Document 1.

專利文獻1:日本專利特開第2003-255132號。Patent Document 1: Japanese Patent Laid-Open No. 2003-255132.

一般而言,將雷射光照射至對象物體以進行切斷加工時,為了確實地將對象物體切斷,會將雷射光之輸出加大,或切斷速度減慢。然而,如此,對象物體之切斷面會產生破碎或破裂等缺陷,造成切割品質低落的情況。In general, when laser light is irradiated onto a target object to perform cutting processing, in order to reliably cut the target object, the output of the laser light is increased, or the cutting speed is slowed down. However, in this case, the cut surface of the object object may cause defects such as breakage or cracking, resulting in a low quality of the cut.

本發明之態樣係有鑑於此種事項,目的為提供一種可抑制在對象物體之切斷面所產生之破碎或破裂等缺陷,可切割品質低落的雷射光照射裝置及光學組件貼合體之製造裝置。In view of such matters, the object of the present invention is to provide a laser light irradiation device and an optical component bonding body which can suppress defects such as breakage or cracking which are generated on a cut surface of a target object, and which can be cut in a low quality. Device.

為達成上述目的,本發明係採用以下手段。 (1)本發明第一態樣係一種雷射光照射裝置,係包含:台座,係具有保持對象物體之保持面;雷射光震盪器,係震盪出雷射光;掃瞄器,係以該雷射光在該保持面之平行平面內進行二維掃瞄;移動裝置,係讓該台座與該掃瞄器進行相對移動;以及控制裝置,係控制該掃瞄器與該移動裝置;其中,該控制裝置係一邊由該掃瞄器使該雷射光偏向,並沿著雷射加工線讓該掃瞄器與該台座進行相對移動,藉以於該雷射加工線上,複數次地重疊該雷射光而形成受照射之重疊部分。In order to achieve the above object, the present invention employs the following means. (1) A first aspect of the present invention is a laser light irradiation apparatus comprising: a pedestal having a holding surface for holding a target object; a laser light oscillating device for oscillating the laser light; and a scanner for illuminating the laser light. Performing a two-dimensional scan in a parallel plane of the holding surface; moving the device to move the pedestal relative to the scanner; and controlling the device to control the scanner and the moving device; wherein the control device The laser light is deflected by the scanner, and the scanner is moved relative to the pedestal along the laser processing line, whereby the laser beam is superimposed on the laser processing line to form a subject. The overlapping portion of the illumination.

(2)如上述(1)之態樣,其中該控制裝置係一邊由該掃瞄器使該雷射光迴轉,並沿著該雷射加工線讓該掃瞄器與該台座進行相對移動。(2) The aspect of (1) above, wherein the control device rotates the laser light by the scanner while moving the scanner relative to the pedestal along the laser processing line.

(3)如上述(2)之態樣,其中該掃瞄器係朝向該雷射加工線外側之剩餘部分而使該雷射光偏向。(3) The aspect of (2) above, wherein the scanner deflects the laser light toward a remaining portion outside the laser processing line.

(4)如上述(1)之態樣,其中該控制裝置係一邊由該掃瞄器使該雷射光沿該雷射加工線而直線振動,並沿著該雷射加工線讓該掃瞄器與該台座進行相對移動。(4) The aspect of (1) above, wherein the control device linearly vibrates the laser light along the laser processing line by the scanner, and causes the scanner along the laser processing line Move relative to the pedestal.

(5)如上述(1)至(4)中任一項之態樣,其中更包含有聚光透鏡,係使得從該掃瞄器射出之雷射光朝向該保持面而聚光。(5) The aspect of any of (1) to (4) above, further comprising a collecting lens such that the laser light emitted from the scanner is concentrated toward the holding surface.

(6)本發明另一態樣係一種光學組件貼合體之製造裝置,係為將光學組件貼合至光學顯示部件以形成光學組件貼合體之製造裝置,該製造裝置係包含:貼合裝置,係將較該光學顯示部件之顯示區域更大之光學組件層貼合至該光學顯示部件以形成貼合層片;以及切斷裝置,係將該光學組件層中的顯示區域之對向部分與該對向部分外側之剩餘部分切斷,從該光學組件層切割出對應於該顯示區域大小之光學組件,藉以從該貼合層片切割出包含有該光學顯示部件及重疊於該光學顯示部件之光學組件的光學組件貼合體;其中,該切斷裝置係由上述(1)至(5)中任一項記載之雷射光照射裝置所構成,藉由從該雷射光照射裝置所照射之雷射光來將作為對象物體之光學組件層切斷。(6) Another aspect of the present invention is an apparatus for manufacturing an optical component bonding body, which is a manufacturing apparatus for bonding an optical component to an optical display component to form an optical component bonding body, the manufacturing apparatus comprising: a bonding device, Attaching an optical component layer larger than a display area of the optical display component to the optical display component to form a bonding layer; and a cutting device for opposing portions of the display region in the optical component layer The remaining portion of the opposite portion is cut off, and an optical component corresponding to the size of the display region is cut out from the optical component layer, thereby cutting and including the optical display component from the bonding layer The optical component bonding body of the optical component, wherein the cutting device is configured by the laser light irradiation device according to any one of (1) to (5), wherein the laser beam is irradiated from the laser beam irradiation device The light is emitted to cut off the optical component layer as the target object.

根據本發明之態樣,可抑制在對象物體之切斷面所產生之破碎或破裂等缺陷,可抑制切割品質之低落問題。According to the aspect of the invention, it is possible to suppress defects such as breakage or cracking which are generated on the cut surface of the target object, and it is possible to suppress the problem of the deterioration of the cutting quality.

以下,參考圖式並說明本發明之實施形態,但本發明並不限定於以下之實施形態。Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments.

另外,以下所有圖式中,為了圖式清楚起見,各結構元件之尺寸或比例等係加以適當變更。又,以下之說明及圖式中,相同或相對應之元件則賦予相同元件符號,省略重複說明。In addition, in the following drawings, the dimensions, ratios, and the like of the respective structural elements are appropriately changed for the sake of clarity of the drawings. In the following description and the drawings, the same or corresponding elements are given the same reference numerals, and the repeated description is omitted.

(雷射光照射裝置) 第1圖係顯示使用來作為切斷裝置之雷射光照射裝置100一例的立體圖。(Laser Light Irradiation Device) Fig. 1 is a perspective view showing an example of a laser beam irradiation device 100 used as a cutting device.

於以下說明中,係對應需求並設定XYZ正交座標系,參考該XYZ正交座標系並說明各組件之位置關係。於本實施形態中,X方向係作為與保持對象物體之保持面平行的第一方向,Y方向係在保持面內側與X方向正交之方向,Z方向則為與X方向及Y方向正交之方向。In the following description, the XYZ orthogonal coordinate system is set according to the requirements, and the positional relationship of each component is described with reference to the XYZ orthogonal coordinate system. In the present embodiment, the X direction is a first direction parallel to the holding surface of the holding target object, the Y direction is orthogonal to the X direction inside the holding surface, and the Z direction is orthogonal to the X direction and the Y direction. The direction.

如第1圖所示,雷射光照射裝置100係具備:台座101;雷射振盪器102;構成電子束成型130(EBS, Electrical Beam Shaping:參考第2圖)之聲光元件103;成像光學滑軌104(IOR,  Imaging Optics Rail);掃瞄器105;移動裝置106;以及對前述裝置進行整體控制之控制裝置107。As shown in Fig. 1, the laser beam irradiation apparatus 100 includes a pedestal 101, a laser oscillator 102, and an acousto-optic element 103 constituting an electron beam shaping 130 (EBS, Electrical Beam Shaping: see Fig. 2); Rail 104 (IOR, Imaging Optics Rail); scanner 105; mobile device 106; and control device 107 for overall control of the aforementioned devices.

台座101具有保持對象物體110的保持面101s。從保持面101s之法線方向觀察,台座101為矩形。保持面101s具備:於第一方向(X方向)為長邊的長方形之第一保持面101s1、以及鄰接配置於第一保持面101s1且與第一保持面101s1呈相同形狀的第二保持面101s2。The pedestal 101 has a holding surface 101s that holds the target object 110. The pedestal 101 is rectangular when viewed from the normal direction of the holding surface 101s. The holding surface 101s includes a rectangular first holding surface 101s1 having a long side in the first direction (X direction), and a second holding surface 101s2 disposed adjacent to the first holding surface 101s1 and having the same shape as the first holding surface 101s1. .

雷射振盪器102係振盪出雷射光L的組件。例如,雷射振盪器102可使用CO2雷射振盪器(二氧化碳雷射振盪器)、紫外線(UV)雷射振盪器,半導體雷射振盪器、釔鋁石榴石(YAG)雷射振盪器、準分子雷射振盪器等振盪器,但具體結構並無特殊限制。更佳地,於該例示之振盪器中的CO2雷射振盪器係可振盪出例如適用於偏光薄膜等光學組件之切斷加工的高輸出雷射光。The laser oscillator 102 is a component that oscillates the laser light L. For example, the laser oscillator 102 can use a CO 2 laser oscillator (carbon dioxide laser oscillator), an ultraviolet (UV) laser oscillator, a semiconductor laser oscillator, a yttrium aluminum garnet (YAG) laser oscillator, An oscillator such as an excimer laser oscillator, but the specific structure is not particularly limited. More preferably, the CO 2 laser oscillator in the illustrated oscillator can oscillate, for example, high output laser light suitable for cutting processing of optical components such as a polarizing film.

第2圖係顯示電子束成型130之結構的示意圖。 如第2圖所示,電子束成型130具有:配置於雷射振盪器102所振盪出之雷射光光學路徑上的聲光元件103、與聲光元件103電性連接的驅動器131、以及控制雷射光通過聲光元件103之時機的控制裝置107(相當於後述雷射控制部171)。 電子束成型130係遮蔽雷射光直到雷射光  之輸出達安定狀態為止。Fig. 2 is a schematic view showing the structure of electron beam forming 130. As shown in FIG. 2, the electron beam forming 130 has an acousto-optic element 103 disposed on the optical path of the laser light oscillated by the laser oscillator 102, a driver 131 electrically connected to the acousto-optic element 103, and a control ray. The control device 107 (corresponding to the laser control unit 171 described later) that emits light through the timing of the acousto-optic element 103. The electron beam shaping 130 shields the laser light until the output of the laser light reaches a stable state.

聲光元件103係用於遮蔽雷射振盪器102所振盪出之雷射光的光學元件。The acousto-optic element 103 is an optical element for shielding the laser light oscillated by the laser oscillator 102.

聲光元件103係例如將壓電元件黏著於由二氧化碲(TeO2)或鉬酸鉛(PbMoO4)等單結晶或玻璃所組成之聲光媒體者。將電子信號施加至壓電元件會產生超音波,將該超音波傳播至聲光媒體中,可藉以控制雷射光的通過與不通過(遮蔽)。The acousto-optic element 103 is, for example, a piezoelectric element bonded to an acousto-optic medium composed of a single crystal such as cerium oxide (TeO 2 ) or lead molybdate (PbMoO 4 ) or glass. Applying an electrical signal to the piezoelectric element produces an ultrasonic wave that propagates into the acousto-optic medium to control the passage and non-passing (shadowing) of the laser light.

另外,本實施形態中,雖使用聲光元件103作為電子束成型130之結構組件,但不限定於此。只要可遮蔽雷射振盪器102所振盪出之雷射光,亦可使用其它光學元件。Further, in the present embodiment, the acousto-optic element 103 is used as the structural component of the electron beam shaping 130, but the invention is not limited thereto. Other optical components can be used as long as the laser light oscillated by the laser oscillator 102 can be shielded.

驅動器131係根據控制裝置107之控制,將產生超音波用之電子信號(控制信號)供給至聲光元件103,以聲光元件103來調整雷射光之遮蔽時間。The driver 131 supplies an electronic signal (control signal) for generating ultrasonic waves to the acousto-optic element 103 under the control of the control device 107, and adjusts the shielding time of the laser light by the acousto-optic element 103.

控制裝置107係例如去除雷射振盪器102所振盪出之雷射光上升部分與下降部份,來控制雷射光通過聲光元件103的時機。The control device 107 removes, for example, the rising portion and the falling portion of the laser light oscillated by the laser oscillator 102 to control the timing at which the laser light passes through the acousto-optic element 103.

另外,以控制裝置107進行時機控制之方式並不限定於此。例如,控制裝置107可選擇性地去除雷射振盪器102所振盪出之雷射光上升部分,來控制雷射光通過聲光元件103的時機。 尤其是,在雷射振盪器102所振盪出之雷射光下降部分寬度(時間)比雷射光上升部分寬度(時間)更短的情況中,去除雷射光下降部分的實際效益較小。因此,在此種情況中,亦可僅選擇性地去除雷射振盪器102所振盪出之雷射光上升部分。Further, the manner in which the timing is controlled by the control device 107 is not limited to this. For example, the control device 107 can selectively remove the rising portion of the laser light oscillated by the laser oscillator 102 to control the timing of the passage of the laser light through the acousto-optic element 103. In particular, in the case where the width (time) of the laser light falling portion oscillated by the laser oscillator 102 is shorter than the width (time) of the rising portion of the laser light, the actual benefit of removing the laser light falling portion is small. Therefore, in this case, only the portion of the laser light that is oscillated by the laser oscillator 102 can be selectively removed.

藉由此種結構,電子束成型130係根據控制裝置107之控制,將雷射振盪器102所振盪出之雷射光在輸出穩定的狀態下射出。With such a configuration, the electron beam forming 130 emits the laser light oscillated by the laser oscillator 102 in a state where the output is stable, according to the control of the control device 107.

成像光學滑軌104係去除雷射光強度分佈中對切斷對象物體110沒有幫助的邊緣部份。The imaging optical slide 104 removes an edge portion of the laser light intensity distribution that does not contribute to the cutting of the object 110.

第3圖係顯示成像光學滑軌104之內部結構的立體圖。 如第3圖所示,成像光學滑軌104具有:使電子束成型130所射出之雷射光聚焦的第一聚光透鏡141;保持第一聚光透鏡141的第一保持框142;集中由第一聚光透鏡141所聚焦之雷射光的光圈組件143;保持光圈組件143的保持組件144;使得由光圈組件143所集中之雷射光呈準直化的準直透鏡145;保持準直透鏡145的第二保持框146;以及使得第一保持框142、保持組件144和第二保持框146能相對移動的移動機構147。Figure 3 is a perspective view showing the internal structure of the imaging optical slide 104. As shown in FIG. 3, the imaging optical slide 104 has a first condensing lens 141 that focuses the laser light emitted by the electron beam shaping 130, and a first holding frame 142 that holds the first condensing lens 141; a diaphragm assembly 143 for focusing laser light focused by the condenser lens 141; a holding assembly 144 for holding the aperture assembly 143; a collimating lens 145 for collimating the laser light concentrated by the aperture assembly 143; and maintaining the collimating lens 145 a second holding frame 146; and a moving mechanism 147 that enables the first holding frame 142, the holding assembly 144, and the second holding frame 146 to move relative to each other.

第4圖係顯示第一聚光透鏡141、光圈組件143及準直透鏡145之配置結構的剖面圖。4 is a cross-sectional view showing an arrangement structure of the first collecting lens 141, the diaphragm assembly 143, and the collimator lens 145.

如第4圖所示,光圈組件143處形成有將第一聚光透鏡141所聚焦之雷射光集中用的針孔143h。第一聚光透鏡141、針孔143h及準直透鏡145的各中心係配置在與電子束成型130所射出之雷射光的光軸C重疊的位置。As shown in FIG. 4, a pinhole 143h for concentrating the laser light focused by the first condensing lens 141 is formed in the aperture unit 143. The center of each of the first condenser lens 141, the pinhole 143h, and the collimator lens 145 is disposed at a position overlapping the optical axis C of the laser beam emitted from the electron beam shaping 130.

較佳地,光圈組件143係配置在第一聚光透鏡141之後側焦點的附近。Preferably, the aperture assembly 143 is disposed in the vicinity of the rear focus of the first condenser lens 141.

此處,「第一聚光透鏡141之後側焦點的附近」係指,在光圈組件143之配置位置距第一聚光透鏡141之後側焦點無較大位置偏差的範圍內,配置位置可略具有差異。例如,如果第一聚光透鏡141中心距第一聚光透鏡141之後側焦點的距離K1,第一聚光透鏡141中心距光圈組件143之針孔143h中心的距離K2,距離K1與距離K2的比例為:K1/K2=0.9/1以上且1.1/1以下範圍內,便可稱作光圈組件143配置於第一聚光透鏡141之後側焦點的附近。只要在此範圍內,便可有效率地集中第一聚光透鏡141所聚焦之雷射光。Here, "the vicinity of the focus of the rear side of the first condensing lens 141" means that the arrangement position may be slightly in a range in which the position of the aperture unit 143 is not greatly displaced from the position of the back focus of the first condensing lens 141. difference. For example, if after the first condenser lens 141 from the center 141 of the first condensing lens focal point distance K 1 side, a first condensing lens 141 away from the center 143 of the pinhole aperture unit 143h center K 2, K 1 and the distance The ratio of the distance K 2 is K 1 /K 2 = 0.9/1 or more and 1.1/1 or less, and the aperture assembly 143 can be referred to as being disposed in the vicinity of the rear focus of the first condensing lens 141. As long as it is within this range, the laser light focused by the first collecting lens 141 can be efficiently concentrated.

另外,光圈組件143配置於第一聚光透鏡141之後側焦點的附近者為佳,但光圈組件143之配置位置並不一定要限定於該位置。只要光圈組件143之配置位置位於第一聚光透鏡141與準直透鏡145之間的光學路徑上即可,並不限定於第一聚光透鏡141之後側焦點的附近。Further, it is preferable that the diaphragm unit 143 is disposed in the vicinity of the focus of the rear side of the first condensing lens 141, but the arrangement position of the diaphragm unit 143 is not necessarily limited to this position. As long as the arrangement position of the aperture unit 143 is located on the optical path between the first condensing lens 141 and the collimator lens 145, it is not limited to the vicinity of the focus of the rear side of the first condensing lens 141.

回到第3圖,移動機構147具有:使第一保持框142、保持組件144及第二保持框146各自都能在雷射光進行方向之平行方向上移動的滑件機構148;以及保持滑件機構148的保持台149。Returning to Fig. 3, the moving mechanism 147 has a slider mechanism 148 that allows each of the first holding frame 142, the holding unit 144, and the second holding frame 146 to move in a direction parallel to the direction in which the laser light is directed; and the holding slider The holding station 149 of the mechanism 148.

例如,將保持組件144配置於固定位置的狀態下,可藉由使第一保持框142及第二保持框146在雷射光進行方向之平行方向上移動,來決定第一保持框142、保持組件144及第二保持框146的相互位置。具體而言,光圈組件143係配置於準直透鏡145之前側焦點的位置處且配置於第一聚光透鏡141之後側焦點的位置處。For example, in a state where the holding unit 144 is disposed at a fixed position, the first holding frame 142 and the second holding frame 146 can be moved in the parallel direction of the direction in which the laser light is directed to determine the first holding frame 142 and the holding assembly. The mutual position of 144 and second holding frame 146. Specifically, the aperture unit 143 is disposed at a position of the front side focus of the collimator lens 145 and at a position of the rear side focus of the first condensing lens 141.

回到第1圖,掃瞄器105以雷射光在保持面101s之平行平面內(XY平面內)進行二維掃瞄。即,掃瞄器105係相對台座101讓雷射光在X方向與Y方向上獨立相對地進行移動。藉此,可讓雷射光以良好精度照射到保持於台座101上之對象物體110的任意位置處。Returning to Fig. 1, the scanner 105 performs two-dimensional scanning with laser light in a parallel plane (in the XY plane) of the holding surface 101s. That is, the scanner 105 moves the laser light independently of the pedestal 101 in the X direction and the Y direction. Thereby, the laser light can be irradiated to any position of the object 110 held on the pedestal 101 with good precision.

掃瞄器105具備第一照射位置調整裝置151與第二照射位置調整裝置154。The scanner 105 includes a first irradiation position adjusting device 151 and a second irradiation position adjusting device 154.

第一照射位置調整裝置151及第二照射位置調整裝置154係由讓成像光學滑軌104所射出之雷射光在保持面101s之平行平面內進行二維掃瞄的掃瞄元件所構成。可使用例如電流掃瞄器作為第一照射位置調整裝置151及第二照射位置調整裝置154。另外,掃瞄元件不限於使用電流掃瞄器,亦可使用萬向支架。The first irradiation position adjusting device 151 and the second irradiation position adjusting device 154 are constituted by scanning elements that perform two-dimensional scanning of the laser light emitted from the imaging optical slide 104 in parallel planes of the holding surface 101s. For example, a current scanner can be used as the first irradiation position adjusting device 151 and the second irradiation position adjusting device 154. In addition, the scanning element is not limited to the use of a current scanner, and a gimbal can also be used.

第一照射位置調整裝置151具備鏡152與調整鏡152之設置角度的致動器153。致動器153具有平行Z方向之迴轉軸。致動器153係根據控制裝置107之控制,使鏡152繞Z軸迴轉。The first irradiation position adjusting device 151 is provided with an actuator 153 that sets the angle between the mirror 152 and the adjusting mirror 152. The actuator 153 has a rotary axis parallel to the Z direction. The actuator 153 rotates the mirror 152 about the Z axis in accordance with the control of the control unit 107.

第二照射位置調整裝置154具備鏡155與調整鏡155之設置角度的致動器156。致動器156具有平行Y方向之迴轉軸。致動器156係根據控制裝置107之控制,使鏡155繞Y軸迴轉。The second irradiation position adjusting device 154 is provided with an actuator 156 that sets the angle between the mirror 155 and the adjusting mirror 155. The actuator 156 has a rotary axis parallel to the Y direction. The actuator 156 rotates the mirror 155 about the Y axis in accordance with the control of the control unit 107.

於掃瞄器105與台座101之間的光學路徑上,係配置有使經由掃瞄器105之雷射光朝向保持面101s聚焦的第二聚光透鏡108。On the optical path between the scanner 105 and the pedestal 101, a second condensing lens 108 that focuses the laser light passing through the scanner 105 toward the holding surface 101s is disposed.

例如,可使用fθ透鏡作為第二聚光透鏡108。藉此,使得來自鏡155而於第二聚光透鏡108平行射出之雷射光可平行地聚焦在對象物體110處。For example, an fθ lens can be used as the second collecting lens 108. Thereby, the laser light from the mirror 155 and parallel to the second condensing lens 108 can be focused in parallel on the object object 110.

另外,於掃瞄器105與台座101之間的光學路徑上,亦可為不配置有第二聚光透鏡108的結構。Further, the optical path between the scanner 105 and the pedestal 101 may be a structure in which the second condensing lens 108 is not disposed.

雷射振盪器102所振盪出之雷射光L係經由聲光元件103、成像光學滑軌104、鏡152、鏡155、第二聚光透鏡108而照射在保持於台座101的對象物體110處。第一照射位置調整裝置151、第二照射位置調整裝置154係根據控制裝置107之控制,來調整自雷射振盪器102朝向保持於台座101之對象物體110進行照射的雷射光照射位置。The laser light L oscillated by the laser oscillator 102 is irradiated onto the object object 110 held by the pedestal 101 via the acousto-optic element 103, the imaging optical slide 104, the mirror 152, the mirror 155, and the second condensing lens 108. The first irradiation position adjusting device 151 and the second irradiation position adjusting device 154 adjust the laser light irradiation position from the laser oscillator 102 toward the target object 110 held by the pedestal 101 in accordance with the control of the control device 107.

以掃瞄器105控制之雷射光加工區域 (以下,稱為掃瞄區域105s)從保持面101s法線方向觀察時係呈矩形。本實施形態中,掃瞄區域105s之面積較第一保持面101s1及第二保持面101s2之各面積更小。The laser beam processing region (hereinafter referred to as the scanning region 105s) controlled by the scanner 105 has a rectangular shape when viewed from the normal direction of the holding surface 101s. In the present embodiment, the area of the scanning area 105s is smaller than the area of the first holding surface 101s1 and the second holding surface 101s2.

移動裝置106可使台座101與掃瞄器105相對移動。移動裝置106具有:第一滑件機構161,讓台座101在平行於保持面101s之第一方向(X方向)上移動;以及第二滑件機構162,讓第一滑件機構161在平行於保持面101s且正交於第一方向之第二方向(Y方向)上移動(以下,將第一滑件機構161和第二滑件機構162總稱為滑件機構)。移動裝置106可藉由第一滑件機構161及第二滑件機構162各個內藏的線性馬達來進行作動,並讓台座101朝XY各方向進行移動。The mobile device 106 can move the pedestal 101 relative to the scanner 105. The moving device 106 has a first slider mechanism 161 that moves the pedestal 101 in a first direction (X direction) parallel to the holding surface 101s; and a second slider mechanism 162 that allows the first slider mechanism 161 to be parallel to The holding surface 101s moves in a second direction (Y direction) orthogonal to the first direction (hereinafter, the first slider mechanism 161 and the second slider mechanism 162 are collectively referred to as a slider mechanism). The moving device 106 can be actuated by a linear motor built in each of the first slider mechanism 161 and the second slider mechanism 162, and moves the pedestal 101 in all directions of XY.

於滑件機構(第一滑件機構161及第二滑件機構162)內脈衝驅動的線性馬達可透過供給至該線性馬達之脈衝信號來精細地進行輸出軸之迴轉角度控制。因此,可以較高精度控制滑件機構(第一滑件機構161及第二滑件機構162)所支撐之台座101在XY各方向上的位置。另外,台座101之位置控制並不限於使用脈衝馬達之位置控制,亦可透過使用伺服馬達之反饋控制,或其它任意控制方法來實現。The linear motor that is pulse-driven in the slider mechanism (the first slider mechanism 161 and the second slider mechanism 162) can finely control the rotation angle of the output shaft through the pulse signal supplied to the linear motor. Therefore, the position of the pedestal 101 supported by the slider mechanism (the first slider mechanism 161 and the second slider mechanism 162) in the XY directions can be controlled with higher precision. Further, the position control of the pedestal 101 is not limited to the position control using a pulse motor, and may be realized by feedback control using a servo motor or any other control method.

控制裝置107具有:控制雷射振盪器102及聲光元件103(驅動器131)的雷射控制部171、控制掃瞄器105的掃瞄器控制部172、以及控制移動裝置106的滑件控制部173。The control device 107 includes a laser control unit 171 that controls the laser oscillator 102 and the acousto-optic element 103 (driver 131), a scanner control unit 172 that controls the scanner 105, and a slider control unit that controls the mobile device 106. 173.

具體而言,雷射控制部171係進行:雷射振盪器102之ON/OFF;雷射振盪器102所振盪出之雷射光的輸出;讓雷射振盪器102所振盪出之雷射光L通過聲光元件103的時機;以及驅動器131之控制。 掃瞄器控制部172係進行:第一照射位置調整裝置151之致動器153與第二照射位置調整裝置154之致動器156各別驅動控制。 滑件控制部173係進行:第一滑件機構161及第二滑件機構162各自內藏的線性馬達之作動控制。Specifically, the laser control unit 171 performs: ON/OFF of the laser oscillator 102; output of the laser light oscillated by the laser oscillator 102; and passage of the laser light L oscillated by the laser oscillator 102 The timing of the acousto-optic element 103; and the control of the driver 131. The scanner control unit 172 performs drive control of the actuator 153 of the first irradiation position adjusting device 151 and the actuator 156 of the second irradiation position adjusting device 154. The slider control unit 173 performs actuation control of a linear motor incorporated in each of the first slider mechanism 161 and the second slider mechanism 162.

第5圖係顯示雷射光照射裝置100之控制系統之結構的示意圖。 如第5圖所示,控制裝置107處連接有可進行輸入信號之輸入的輸入裝置109。輸入裝置109具有鍵盤、滑鼠等輸入機器,或者可從外部裝置進行資料輸入用的通訊裝置等。控制裝置107可包含有顯示雷射光照射裝置100之各部位動作狀況的液晶顯示器等顯示裝置,亦可與顯示裝置進行連接。Fig. 5 is a view showing the structure of a control system of the laser light irradiation device 100. As shown in Fig. 5, an input device 109 capable of inputting an input signal is connected to the control device 107. The input device 109 has an input device such as a keyboard or a mouse, or a communication device for inputting data from an external device. The control device 107 may include a display device such as a liquid crystal display that displays an operation state of each portion of the laser light irradiation device 100, and may be connected to the display device.

當使用者將加工資訊輸入至輸入裝置109以完成初期設定時,根據控制裝置107之雷射控制部171的控制,從雷射振盪器102振盪出雷射光。此時,根據控制裝置107之掃瞄器控制部172的控制,開始讓構成掃瞄器105的鏡進行迴轉驅動。於此同時,根據控制裝置107之滑件控制部173的控制,透過旋轉編碼器等感測器來檢測出設置於滑件機構(第一滑件機構161及第二滑件機構162)之馬達等驅動軸的轉速。When the user inputs the processing information to the input device 109 to complete the initial setting, the laser light is oscillated from the laser oscillator 102 in accordance with the control of the laser control unit 171 of the control device 107. At this time, the mirror constituting the scanner 105 is started to be rotationally driven by the control of the scanner control unit 172 of the control device 107. At the same time, the motor provided in the slider mechanism (the first slider mechanism 161 and the second slider mechanism 162) is detected by a sensor such as a rotary encoder under the control of the slider control unit 173 of the control device 107. The speed of the drive shaft.

控制裝置107係即時修正各座標值並將雷射光射出至與加工資訊一致的座標,即,讓雷射光能於對象物體110(參考第1圖)處描繪出特定軌跡地,控制移動裝置106與掃瞄器105。例如,主要透過移動裝置106來進行雷射光之掃瞄,並以掃瞄器105來調整移動裝置106所無法良好控制精度之雷射光照射位置的區域。The control device 107 immediately corrects each coordinate value and emits the laser light to a coordinate consistent with the processing information, that is, allows the laser light to trace a specific trajectory at the target object 110 (refer to FIG. 1), and controls the mobile device 106 and Scanner 105. For example, the scanning of the laser light is mainly performed by the mobile device 106, and the area of the laser light irradiation position where the mobile device 106 cannot control the accuracy is adjusted by the scanner 105.

第6(a)圖至第6(d)圖係電子束成型130之作用的說明用圖。 第6(a)圖係顯示雷射振盪器102所振盪出之雷射光的控制信號。 第6(b)圖係顯示雷射振盪器102所振盪出之雷射光自身輸出特性,即,雷射振盪器102所振盪出之雷射光通過聲光元件103前的雷射光輸出特性。 第6(c)圖係顯示聲光元件103的控制信號。 第6(d)圖係顯示雷射振盪器102所振盪出之雷射光通過聲光元件103後的雷射光輸出特性。 於第6(b)圖與第6(d)圖各圖中,橫軸係時間,縱軸係雷射光強度。 第7(a)圖與第7(d)圖係針對第6(a)圖與第6(d)圖中雷射光一個脈衝的示意圖。 另外,以下說明中,將「雷射振盪器102所振盪出之雷射光的控制信號」稱作「雷射光控制信號」。將「雷射振盪器102所振盪出之雷射光通過聲光元件103前的雷射光輸出特性」稱作「通過聲光元件103前的雷射光輸出特性」。將「雷射振盪器102所振盪出之雷射光通過聲光元件103後的雷射光輸出特性」稱作「通過聲光元件103後的雷射光輸出特性」。6(a) to 6(d) are diagrams for explaining the action of the electron beam forming 130. Fig. 6(a) shows a control signal of the laser light oscillated by the laser oscillator 102. The sixth (b) diagram shows the output characteristics of the laser light oscillated by the laser oscillator 102, that is, the laser light output characteristics of the laser light oscillated by the laser oscillator 102 before passing through the acousto-optic element 103. The sixth (c) diagram shows the control signal of the acousto-optic element 103. The sixth (d) diagram shows the laser light output characteristics of the laser light oscillated by the laser oscillator 102 after passing through the acousto-optic element 103. In each of Figs. 6(b) and 6(d), the horizontal axis is time and the vertical axis is laser light intensity. Figures 7(a) and 7(d) are schematic diagrams of one pulse of laser light in Figures 6(a) and 6(d). In the following description, the "control signal of the laser light oscillated by the laser oscillator 102" is referred to as a "laser light control signal". The "laser light output characteristic before the laser light oscillated by the laser oscillator 102 passes through the acousto-optic element 103" is referred to as "the laser light output characteristic before passing through the acousto-optic element 103". The laser light output characteristic after the laser light oscillated by the laser oscillator 102 passes through the acousto-optic element 103 is referred to as "the laser light output characteristic after passing through the acousto-optic element 103".

如第6(a)圖、第7(a)圖所示,雷射光控制信號的脈衝Ps1係矩形脈衝。如第6(a)圖所示,雷射光控制信號係周期性地切換朝雷射振盪器102之ON/OFF信號以產生複數個脈衝Ps1,即所謂的時序脈衝。As shown in Fig. 6(a) and Fig. 7(a), the pulse Ps1 of the laser light control signal is a rectangular pulse. As shown in Fig. 6(a), the laser light control signal periodically switches the ON/OFF signal toward the laser oscillator 102 to generate a plurality of pulses Ps1, so-called timing pulses.

於第6(a)圖、第7(a)圖中,脈衝Ps1之峰部係朝雷射振盪器102傳送ON信號的狀態,即,從雷射振盪器102振盪出雷射光的ON狀態。脈衝Ps1之谷部係朝雷射振盪器102傳送OFF信號的狀態,即,不從雷射振盪器102振盪出雷射光的OFF狀態。In the sixth (a)th and seventh (a)th drawings, the peak of the pulse Ps1 is in a state in which the ON signal is transmitted to the laser oscillator 102, that is, the ON state of the laser light is oscillated from the laser oscillator 102. The valley of the pulse Ps1 is in a state in which the OFF signal is transmitted to the laser oscillator 102, that is, the OFF state of the laser light is not oscillated from the laser oscillator 102.

如第6(a)圖所示,以較短間隔配置有3個脈衝Ps1,藉以形成一個集合脈衝PL1。以較3個脈衝Ps1之配置間隔更長間隔地配置有3個集合脈衝PL1。例如,相鄰二個脈衝Ps1之間的間隔為1ms,相鄰二個集合脈衝PL1之間的間隔為10ms。As shown in Fig. 6(a), three pulses Ps1 are arranged at a short interval to form one collective pulse PL1. Three collective pulses PL1 are arranged at a longer interval than the arrangement interval of the three pulses Ps1. For example, the interval between adjacent two pulses Ps1 is 1 ms, and the interval between adjacent two collective pulses PL1 is 10 ms.

另外,本實施形態中,雖舉例以較短間隔配置有3個脈衝Ps1,藉以形成一個集合脈衝PL1來說明,但並不限定於此。例如,亦可以較短間隔配置有2個或4個以上的複數個脈衝,藉以形成一個集合脈衝。 又,並不限於周期性地形成有複數個脈衝,亦可以較長寬度形成有一個脈衝。即,亦可僅在對雷射振盪器之ON信號至OFF信號的指定時間內振盪出特定強度雷射光。Further, in the present embodiment, the three pulses Ps1 are arranged at a short interval, and one set pulse PL1 is formed, but the present invention is not limited thereto. For example, two or more than a plurality of pulses may be arranged at a short interval to form one set pulse. Further, it is not limited to the periodic formation of a plurality of pulses, and one pulse may be formed with a long width. That is, the specific intensity laser light may be oscillated only for a predetermined time from the ON signal to the OFF signal of the laser oscillator.

如第6(b)圖、第7(b)圖所示,聲光元件103通過前的雷射光輸出特性之脈衝Ps2係具有上升部分G1與下降部分G2的脈衝波形。As shown in FIGS. 6(b) and 7(b), the pulse Ps2 of the laser light output characteristic before the acousto-optic element 103 has a pulse waveform of the rising portion G1 and the falling portion G2.

此處,上升部分G1係指,脈衝Ps2中雷射光強度從零達到能切斷對象物體之強度為止期間的部分。下降部分G2係指,雷射光輸出特性之脈衝Ps2中雷射光強度從能切斷對象物體之強度達到零為止期間的部分。所謂能切斷對象物體之強度會因對象物體之材質或厚度、雷射光輸出值而異,舉例,如第7(b)圖所示,係雷射光峰值強度(100%)的50%強度。Here, the rising portion G1 is a portion during which the intensity of the laser light in the pulse Ps2 is from zero to the strength at which the object can be cut. The descending portion G2 is a portion during which the intensity of the laser light in the pulse Ps2 of the laser light output characteristic is from the time when the strength of the object to be cut reaches zero. The intensity of the object to be cut may vary depending on the material or thickness of the object and the laser light output value. For example, as shown in Fig. 7(b), the intensity of the peak intensity of the laser light (100%) is 50%.

如第6(b)圖、第7(b)圖所示,脈衝Ps2之上升部分G1寬度較下降部分G2寬度更長。換言之,雷射振盪器102所振盪出之雷射光上升部分G1時間較雷射光下降部分G2時間更長。 例如,上升部分G1寬度為45μs,下降部分G2寬度為25μs。As shown in Fig. 6(b) and Fig. 7(b), the width of the rising portion G1 of the pulse Ps2 is longer than the width of the falling portion G2. In other words, the laser light rising portion G1 oscillated by the laser oscillator 102 takes a longer time than the laser light falling portion G2. For example, the rising portion G1 has a width of 45 μs and the falling portion G2 has a width of 25 μs.

另外,本實施形態中,雖舉例脈衝Ps2之上升部分G1寬度較下降部分G2寬度更長之例來說明,但並不限定於此。例如,脈衝Ps2之上升部分G1寬度與下降部分G2寬度概略相等的情況、脈衝Ps2之上升部分G1寬度較下降部分G2寬度更短的情況等,亦可適用於本發明。Further, in the present embodiment, an example in which the width of the rising portion G1 of the pulse Ps2 is longer than the width of the decreasing portion G2 is described, but the present invention is not limited thereto. For example, the case where the width of the rising portion G1 of the pulse Ps2 is substantially equal to the width of the falling portion G2, and the case where the width of the rising portion G1 of the pulse Ps2 is shorter than the width of the falling portion G2 can be applied to the present invention.

如第6(b)圖所示,3個脈衝Ps2係配置在對應於第6(a)圖所示之3個脈衝Ps1的位置,藉以形成一個集合脈衝PL2。3個集合脈衝PL2係配置在對應於第6(a)圖所示之3個集合脈衝PL1的位置。As shown in Fig. 6(b), the three pulses Ps2 are arranged at positions corresponding to the three pulses Ps1 shown in Fig. 6(a), thereby forming one collective pulse PL2. The three collective pulses PL2 are arranged in Corresponds to the position of the three collective pulses PL1 shown in Fig. 6(a).

如第6(c)圖、第7(c)圖所示,聲光元件103控制信號之脈衝Ps3係矩形脈衝。如第6(c)圖所示,聲光元件103控制信號係周期性地切換朝驅動器131之控制信號地,以周期性地切換雷射光通過聲光元件103的時機,藉以產生複數個脈衝Ps3,即所謂的時序脈衝。As shown in Fig. 6(c) and Fig. 7(c), the pulse Ps3 of the control signal of the acousto-optic element 103 is a rectangular pulse. As shown in FIG. 6(c), the acousto-optic element 103 control signal periodically switches the control signal toward the driver 131 to periodically switch the timing of the laser light passing through the acousto-optic element 103, thereby generating a plurality of pulses Ps3. , the so-called timing pulse.

於第5(c)圖、第6(c)圖中,脈衝Ps3之峰部係讓雷射光通過的狀態,即,讓雷射光穿透的透光狀態。脈衝Ps3之谷部係不讓雷射光通過的狀態,即,遮蔽雷射光的遮光狀態。In the fifth (c)th and sixth (c)th views, the peak of the pulse Ps3 is a state in which the laser light passes, that is, a light transmitting state in which the laser light is transmitted. The valley of the pulse Ps3 is a state in which the laser light is not allowed to pass, that is, a light blocking state in which the laser light is blocked.

如第6(c)圖所示,各脈衝Ps3之谷部係使得第6圖(b)所示之各脈衝Ps2之上升部分G1及下降部分G2兩者重疊地配置。As shown in Fig. 6(c), the valley portion of each pulse Ps3 is arranged such that both the rising portion G1 and the falling portion G2 of the respective pulses Ps2 shown in Fig. 6(b) are overlapped.

如第7(c)圖所示,針對一個脈衝Ps3觀察時,脈衝Ps3前側之谷部V1寬度較脈衝Ps2之上升部分G1寬度更大,且,脈衝Ps3後側之谷部V2寬度與脈衝Ps2下降部分寬度概略相等。例如,脈衝Ps3前側之谷部V1寬度為45μs,脈衝Ps3後側之谷部V2寬度為25μs。如此一來,電子束成型130具備有快速回應特性之切換功能。As shown in Fig. 7(c), for the observation of one pulse Ps3, the width of the valley V1 on the front side of the pulse Ps3 is larger than the width of the rising portion G1 of the pulse Ps2, and the width of the valley V2 on the rear side of the pulse Ps3 and the pulse Ps2. The width of the descending portion is roughly equal. For example, the width of the valley portion V1 on the front side of the pulse Ps3 is 45 μs, and the width of the valley portion V2 on the rear side of the pulse Ps3 is 25 μs. As a result, the electron beam forming 130 has a switching function with a fast response characteristic.

藉此,可去除雷射光上升部分G1與下降部分G2,選擇性地取出雷射光輸出特性之脈衝Ps2中能切斷對象物體之雷射光強度部分。Thereby, the laser light rising portion G1 and the falling portion G2 can be removed, and the laser light intensity portion of the target object can be selectively cut out in the pulse Ps2 of the laser light output characteristic.

其結果,第5(d)圖,第6(d)圖所示,聲光元件103通過後的雷射光輸出特性之脈衝Ps4不具有上升部分G1與下降部分G2,為陡峭突出地的脈衝。As a result, in the fifth (d) and sixth (d) diagrams, the pulse Ps4 of the laser light output characteristic after the acousto-optic element 103 passes does not have the rising portion G1 and the falling portion G2, and is a sharply protruding pulse.

另外,本實施形態中,雖舉例脈衝Ps3前側之谷部V1寬度較脈衝Ps2之上升部分G1寬度更大,且,脈衝Ps3後側之谷部V2寬度與脈衝Ps2下降部分寬度概略相等之例來說明,但並不限定於此。 例如,可依據需求適當調整成:脈衝Ps3前側之谷部V1寬度可與脈衝Ps2之上升部分G1寬度概略相等,或脈衝Ps3後側之谷部V2寬度較脈衝Ps2下降部分寬度更大等等。Further, in the present embodiment, the width of the valley portion V1 on the front side of the pulse Ps3 is larger than the width of the rising portion G1 of the pulse Ps2, and the width of the valley portion V2 on the rear side of the pulse Ps3 is substantially equal to the width of the falling portion of the pulse Ps2. Description, but is not limited to this. For example, it can be appropriately adjusted according to requirements such that the width of the valley portion V1 on the front side of the pulse Ps3 is substantially equal to the width of the rising portion G1 of the pulse Ps2, or the width of the valley portion V2 on the rear side of the pulse Ps3 is larger than the width of the falling portion of the pulse Ps2.

第8圖係成像光學滑軌104之作用的說明用圖。 第8圖左側之圖係顯示通過針孔143h前的雷射光之強度分佈圖。第8圖左側上方之圖係平面圖,第8圖左側中間之圖係立體圖,第8圖左側下方之圖係顯示以橫軸表示位置,以縱軸表示強度的圖式。 第8圖右側之圖係通過針孔143h後的雷射光之強度分佈圖。第8圖右側上方之圖係平面圖,第8圖右側中間之圖係立體圖,第8圖右側下方之圖係顯示以橫軸表示位置,以縱軸表示強度的圖式。Fig. 8 is a diagram for explaining the action of the imaging optical slide 104. The graph on the left side of Fig. 8 shows the intensity distribution of the laser light before passing through the pinhole 143h. The figure on the upper left side of Fig. 8 is a plan view, and the figure on the left side in the left side of Fig. 8 is a perspective view, and the figure on the lower left side of Fig. 8 shows a position on the horizontal axis and the intensity on the vertical axis. The graph on the right side of Fig. 8 is an intensity distribution diagram of the laser light after passing through the pinhole 143h. The figure on the upper right side of Fig. 8 is a plan view, the middle view on the right side of Fig. 8 is a perspective view, and the figure on the lower right side of Fig. 8 shows a position on the horizontal axis and the intensity on the vertical axis.

如第8圖左側之圖所示,通過針孔143h前的雷射光之強度分佈係光束中心部處強度較強,光束外周部處強度較弱的強度分佈。As shown in the diagram on the left side of Fig. 8, the intensity distribution of the laser light passing through the pinhole 143h is a strong intensity at the center portion of the beam and a weak intensity at the outer peripheral portion of the beam.

對此,如第8圖右側之圖所示,通過針孔143h後的雷射光之強度分佈係去除雷射光之強度分佈中對偏光板之切斷沒有幫助的邊緣部份,雷射光之強度分佈為理想的高斯分佈。通過針孔143h後的雷射光之強度分佈半寬度會較通過針孔143h前的雷射光之強度分佈半寬度更狹窄。In this regard, as shown in the figure on the right side of Fig. 8, the intensity distribution of the laser light after passing through the pinhole 143h is to remove the edge portion of the intensity distribution of the laser light which does not contribute to the cutting of the polarizing plate, and the intensity distribution of the laser light. For an ideal Gaussian distribution. The half-width of the intensity distribution of the laser light after passing through the pinhole 143h is narrower than the half-width of the intensity distribution of the laser light passing through the pinhole 143h.

本實施形態之控制裝置107係進行讓掃瞄器105從成像光學滑軌104所射出之雷射光迴轉並沿著雷射光加工線WCL(參考第9圖)使掃瞄器105與台座101移動之控制。The control device 107 of the present embodiment rotates the laser light emitted from the imaging optical slide 104 by the scanner 105 and moves the scanner 105 and the pedestal 101 along the laser beam processing line WCL (refer to FIG. 9). control.

第9圖係雷射光加工線的示意圖。 本實施形態中,如第9圖所示,以雷射光加工線WCL之平面視圖呈矩形框狀的情況為一例,具體而言,舉例針對平面視圖呈矩形之對象物體110沿該對象物體110之4個邊繞順時針迴轉進行矩形框狀之雷射加工的情況來說明。 例如,朝對象物體110進行雷射加工後之雷射光加工線WCL內側的矩形部分為使用於製品等的使用部分AR1。雷射光加工線WCL外側的矩形框狀部分則為不使用的剩餘部分AR2。Figure 9 is a schematic diagram of a laser light processing line. In the present embodiment, as shown in FIG. 9, a case where the plan view of the laser beam processing line WCL has a rectangular frame shape is taken as an example. Specifically, for example, a target object 110 having a rectangular shape in plan view is disposed along the object object 110. The case where four sides are rotated clockwise to perform laser processing in a rectangular frame shape will be described. For example, the rectangular portion inside the laser light processing line WCL after the laser processing of the target object 110 is the use portion AR1 used for the product or the like. The rectangular frame portion outside the laser light processing line WCL is the remaining portion AR2 that is not used.

第10圖係使用比較例之雷射光照射裝置,切斷對象物體時之雷射光移動軌跡的示意圖。 此處,比較例之雷射光照射裝置係沿著雷射光加工線WCL直接使掃瞄器與台座進行相對移動的雷射光照射裝置,即,雷射光之移動軌跡(以下,稱為雷射光移動軌跡UrX)係沿著雷射光加工線WCL之直線狀的雷射光照射裝置。 第11圖係使用本實施形態之雷射光照射裝置,切斷對象物體時之雷射光移動軌跡的示意圖。 於第11圖中,符號Ur係雷射光移動軌跡,符號Us為掃瞄器105與台座101進行相對移動時之移動軌跡投影於對象物體處的軌跡(以下,稱為相對移動軌跡),符號Up為雷射光移動軌跡Ur與相對移動軌跡Us的重疊部分(以下,稱為重疊部分)。 另外,第10圖及第11圖係第9圖中雷射光加工線WCL之鏈線包圍部分K的放大圖。Fig. 10 is a view showing a trajectory of laser light movement when a target object is cut using a laser light irradiation device of a comparative example. Here, the laser light irradiation device of the comparative example directly irradiates the scanner with the pedestal along the laser beam processing line WCL, that is, the movement trajectory of the laser light (hereinafter, referred to as a laser light trajectory) UrX) is a linear laser light irradiation device along the laser light processing line WCL. Fig. 11 is a schematic view showing a trajectory of laser light movement when a target object is cut by using the laser light irradiation device of the present embodiment. In Fig. 11, the symbol Ur is a laser light moving trajectory, and the symbol Us is a trajectory (hereinafter referred to as a relative moving trajectory) at which a moving trajectory is projected at a target object when the scanner 105 and the pedestal 101 are relatively moved, and the symbol is Up. It is an overlapping portion (hereinafter, referred to as an overlapping portion) of the laser light moving track Ur and the relative moving track Us. Further, Fig. 10 and Fig. 11 are enlarged views of the chain line surrounding portion K of the laser light processing line WCL in Fig. 9.

如第10圖所示,比較例之雷射光照射裝置中,雷射光移動軌跡UrX係直線狀。 該情況中,為了確實地切斷對象物體,而增加雷射光之輸出或減慢切斷速度時,於對象物體之切斷面會有產生破裂或缺損等缺陷的情況。As shown in Fig. 10, in the laser light irradiation apparatus of the comparative example, the laser light trajectory UrX is linear. In this case, in order to surely cut the target object and increase the output of the laser light or slow down the cutting speed, defects such as cracks or defects may occur on the cut surface of the target object.

對此,如第11圖所示,具備本實施形態之控制裝置107的雷射光照射裝置100中,雷射光移動軌跡Ur係於雷射光加工線WCL之正交方向上進行振動,複數次地重疊雷射光而沿著雷射光加工線WCL複數地形成受照射之重疊部分Up。On the other hand, as shown in Fig. 11, in the laser beam irradiation apparatus 100 including the control device 107 of the present embodiment, the laser beam trajectory Ur is vibrated in the orthogonal direction of the laser beam processing line WCL, and is overlapped plural times. The irradiated light forms a plurality of irradiated overlapping portions Up along the laser light processing line WCL.

第11圖之例中,雷射光移動軌跡Ur係具有橢圓形環狀部分的螺旋狀。例如,雷射光移動軌跡Ur之環狀部分在雷射光加工線WCL之正交方向上具有長軸,其長軸方向之寬度Uw約為100μm。In the example of Fig. 11, the laser light trajectory Ur has a spiral shape having an elliptical annular portion. For example, the annular portion of the laser light moving path Ur has a long axis in the orthogonal direction of the laser beam processing line WCL, and the width Uw in the long axis direction is about 100 μm.

雷射光移動軌跡Ur之環狀部分的長軸方向端部(相對移動軌跡Us側之端部)係與相對移動軌跡Us之一部分重疊。重疊部分Up實質上為雷射光照射2次的部分。The end portion of the annular portion of the laser light moving locus Ur (the end portion on the side of the relative movement trajectory Us) partially overlaps with one of the relative movement trajectories Us. The overlapping portion Up is substantially a portion that is irradiated twice by the laser light.

重疊部分Up係沿著雷射光加工線WCL上間隔有特定間隔般配置。 於雷射光加工線WCL上,係交互配置有雷射光僅照射1次的部分與雷射光重複照射2次的部分(重疊部分Up)。重疊部分Up係沿著雷射光加工線WCL形成為折線狀。The overlapping portions Up are arranged along the laser light processing line WCL at a specific interval. On the laser light processing line WCL, a portion where the laser light is irradiated only once and a portion where the laser light is repeatedly irradiated twice (overlap portion Up) are alternately arranged. The overlapping portion Up is formed in a line shape along the laser light processing line WCL.

本實施形態之雷射光照射區域係朝剩餘部分AR2側擴張。相對移動軌跡Us係沿使用部分AR1最外緣線進行配置。雷射光移動軌跡Ur係於剩餘部分AR2呈間隔地進行配置。The laser light irradiation region of the present embodiment is expanded toward the remaining portion AR2 side. The relative movement track Us is configured along the outermost edge line of the use portion AR1. The laser light moving trajectory Ur is arranged at intervals in the remaining portion AR2.

於本實施形態中,使雷射光實質上複數次地(本實施形態中例如為2次)照射至重疊部分Up。因此,雷射光之輸出可較以1次雷射照射切斷對象物體時的輸出(以下,稱為切斷輸出)更小。In the present embodiment, the laser beam is irradiated to the overlapping portion Up substantially at a plurality of times (for example, twice in the present embodiment). Therefore, the output of the laser light can be made smaller than the output (hereinafter referred to as the cutoff output) when the target object is cut by one laser irradiation.

雷射光之輸出只要是能以2次雷射照射來切斷對象物體的輸出即可。例如,將雷射光之輸出設定為切斷輸出之60%。本實施形態中,由於重疊部分Up之配置間隔非常小,此種輸出就能確實地切斷對象物體。The output of the laser light may be an output that can cut off the object by two laser irradiations. For example, the output of the laser light is set to 60% of the cut output. In the present embodiment, since the arrangement interval of the overlapping portions Up is extremely small, such an output can reliably cut the target object.

如以上說明,根據本實施形態之雷射光照射裝置100,控制裝置107係一邊由掃瞄器105使雷射光偏向,並沿著雷射光加工線WCL讓掃瞄器105與台座101進行相對移動,藉以於雷射光加工線WCL上,複數次地重疊雷射光而形成受照射之重疊部分Up。因此,可抑制對象物體110之切斷面的破碎或破裂等缺陷產生,可抑制切割品質之低落問題。As described above, according to the laser beam irradiation apparatus 100 of the present embodiment, the control device 107 deflects the laser light by the scanner 105 and relatively moves the scanner 105 and the pedestal 101 along the laser beam processing line WCL. The laser beam is superimposed on the laser beam processing line WCL to form an irradiated overlapping portion Up. Therefore, it is possible to suppress the occurrence of defects such as breakage or cracking of the cut surface of the target object 110, and it is possible to suppress the problem of the deterioration of the cutting quality.

又,掃瞄器105係朝雷射光加工線WCL外側之剩餘部分AR2而使雷射光偏向。因此,不會帶給作為製品等所使用之使用部分AR1造成影響,而可獲得上述效果。又,雷射光加工線WCL係往剩餘部分AR2側擴張,故對象物體110之剩餘部分AR2於大範圍內會變薄。因此,對象物體110之剩餘部分AR2能易於從使用部分AR1進行剝離。Further, the scanner 105 biases the laser light toward the remaining portion AR2 outside the laser beam processing line WCL. Therefore, the above effects can be obtained without affecting the use portion AR1 used as a product or the like. Further, since the laser beam processing line WCL is expanded toward the remaining portion AR2 side, the remaining portion AR2 of the target object 110 is thinned in a wide range. Therefore, the remaining portion AR2 of the object object 110 can be easily peeled off from the use portion AR1.

又,雷射光移動軌跡Ur之環狀部分係在雷射光加工線WCL之平行方向上具有短軸的橢圓形。因此,將橢圓之短軸長度控制為較短,可藉以沿著雷射光加工線WCL使重疊部分Up變得密集。因此,可易於縮小重疊部分Up之配置間隔,可更加確實地切斷對象物體110。Further, the annular portion of the laser light moving locus Ur is an elliptical shape having a short axis in the parallel direction of the laser beam processing line WCL. Therefore, the length of the minor axis of the ellipse is controlled to be short, whereby the overlapping portion Up can be made dense along the laser light processing line WCL. Therefore, the arrangement interval of the overlapping portion Up can be easily reduced, and the object object 110 can be cut more surely.

又,第二聚光透鏡108配置在掃瞄器105與台座101之間的光學路徑上,故經由掃瞄器105之雷射光可平行地聚焦於對象物體110上。因此,可以較佳精度切斷對象物體110。Further, since the second condensing lens 108 is disposed on the optical path between the scanner 105 and the pedestal 101, the laser light passing through the scanner 105 can be focused on the object 110 in parallel. Therefore, the object 110 can be cut with better precision.

又,本實施形態之雷射光照射裝置100中,主要透過移動裝置106來進行雷射光之掃瞄,並以掃瞄器105來調整移動裝置106所無法良好控制精度之雷射光照射位置的區域。因此,與只以移動裝置106或只以掃瞄器105進行雷射光掃瞄的情況相比,能於大範圍內以良好精度控制雷射光照射位置。Further, in the laser beam irradiation apparatus 100 of the present embodiment, the laser beam is mainly scanned by the mobile device 106, and the area of the laser beam irradiation position where the mobile device 106 cannot control the accuracy is adjusted by the scanner 105. Therefore, the laser light irradiation position can be controlled with good precision over a wide range as compared with the case where the laser beam scanning is performed only by the moving device 106 or only the scanner 105.

不過,本實施形態中,雖然舉例有控制裝置107進行控制,一邊由掃瞄器105使成像光學滑軌104所射出之雷射光迴轉,並沿著雷射光加工線WCL讓掃瞄器105與台座101進行移動之例來說明,但並不限定於此。可採用各種構成,如控制裝置107一邊由掃瞄器105讓成像光學滑軌104所射出之雷射光偏向,並沿著雷射光加工線WCL讓掃瞄器105與台座101進行移動,藉以於雷射光加工線WCL上,複數次地重疊雷射光而形成受照射之重疊部分。However, in the present embodiment, the control device 107 performs control, and the laser light emitted from the imaging optical slide 104 is rotated by the scanner 105, and the scanner 105 and the pedestal are placed along the laser beam processing line WCL. 101 is described as an example of moving, but is not limited thereto. Various configurations may be employed. For example, the control device 107 deflects the laser light emitted from the imaging optical slide 104 by the scanner 105, and moves the scanner 105 and the pedestal 101 along the laser light processing line WCL. On the light-emitting processing line WCL, the laser light is superimposed a plurality of times to form an overlapped portion to be irradiated.

又,本實施形態中,雷射光移動軌跡Ur係具有橢圓形環狀的螺旋狀,但並不限定於此。亦可適當地採用各種形狀作為雷射光移動軌跡。Further, in the present embodiment, the laser light trajectory Ur has an elliptical annular spiral shape, but is not limited thereto. Various shapes can also be suitably employed as the laser light trajectory.

(雷射光移動軌跡之第一變形例) 第12圖係顯示本實施形態之雷射光移動軌跡之第一變形例的示意圖。(First Modification of Least Light Movement Trajectory) Fig. 12 is a schematic view showing a first modification of the laser light movement locus of the present embodiment.

上述實施形態中,如第11圖所示,已舉出雷射光移動軌跡Ur之環狀部分為橢圓形狀之例來說明。對此,本變形例之雷射光移動軌跡Ur1中,如第12圖所示之環狀部分係圓形。In the above-described embodiment, as shown in Fig. 11, an example in which the annular portion of the laser light trajectory Ur is an elliptical shape has been described. On the other hand, in the laser beam trajectory Ur1 of the present modification, the annular portion as shown in Fig. 12 is circular.

本變形例之雷射光移動軌跡Ur1,亦可抑制對象物體110之切斷面的破碎或破裂等缺陷產生,可抑制切割品質之低落問題。本實施形態之情況中,係藉由將圓的直徑控制為較短,而可沿著雷射光加工線WCL使重疊部分Up1變得密集。所以,可更加確實地切斷對象物體110。The laser light trajectory Ur1 of the present modification can also suppress the occurrence of defects such as breakage or cracking of the cut surface of the target object 110, and can suppress the problem of low cutting quality. In the case of the present embodiment, the overlapping portion Up1 can be densely distributed along the laser beam processing line WCL by controlling the diameter of the circle to be short. Therefore, the object 110 can be cut more surely.

(雷射光移動軌跡之第二變形例) 第13圖係顯示本實施形態之雷射光移動軌跡之第二變形例的示意圖。 第13圖中,為方便起見,雷射光移動軌跡Ur2與相對移動軌跡Us係顯示為分開。但是,實際上,雷射光移動軌跡Ur2與相對移動軌跡Us之一部分係重疊。(Second Modification of Least Light Movement Trajectory) Fig. 13 is a view showing a second modification of the laser light movement locus of the present embodiment. In Fig. 13, for the sake of convenience, the laser light moving path Ur2 and the relative moving track Us are shown as being separated. However, actually, the laser light moving trajectory Ur2 overlaps with one of the relative moving trajectories Us.

如第13圖所示,本變形例之雷射光移動軌跡Ur2的環狀部分為矩形外形。As shown in Fig. 13, the annular portion of the laser light moving locus Ur2 of the present modification has a rectangular outer shape.

根據本變形例之雷射光移動軌跡Ur2,由於重疊部分Up2不是點狀而是線狀,所以可更加確實地切斷對象物體。According to the laser light trajectory Ur2 of the present modification, since the overlapping portion Up2 is not a dot shape but a line shape, the target object can be cut more reliably.

(雷射光移動軌跡之第三變形例) 第14圖係顯示本實施形態之雷射光移動軌跡之第三變形例的示意圖。 第14圖中,為方便起見,雷射光移動軌跡Ur3與相對移動軌跡Us係分開顯示為2條直線。但是,實際上,雷射光移動軌跡Ur3與相對移動軌跡Us之一部分係重疊。(Third Modification of Least Light Movement Trajectory) Fig. 14 is a view showing a third modification of the laser light movement locus of the present embodiment. In Fig. 14, for the sake of convenience, the laser light moving path Ur3 is displayed as two straight lines separately from the relative moving track Us. However, actually, the laser light moving trajectory Ur3 overlaps with one of the relative moving trajectories Us.

上述實施形態之控制裝置107係進行控制,一邊由掃瞄器105使成像光學滑軌104所射出之雷射光迴轉,並沿著雷射光加工線WCL讓掃瞄器105與台座101進行移動。 對此,本變形例之控制裝置係進行控制,一邊由掃瞄器105使成像光學滑軌104所射出之雷射光直線振動,並沿著雷射光加工線WCL讓掃瞄器105與台座101進行移動。The control device 107 of the above-described embodiment controls the laser light emitted from the imaging optical slide 104 by the scanner 105, and moves the scanner 105 and the pedestal 101 along the laser beam processing line WCL. On the other hand, the control device of the present modification controls the laser light emitted from the imaging optical slide 104 by the scanner 105, and causes the scanner 105 and the pedestal 101 to proceed along the laser beam processing line WCL. mobile.

如第14圖所示,本變形例之雷射光移動軌跡Ur3為直線狀。雷射光移動軌跡Ur3係上下振動(來回移動)。As shown in Fig. 14, the laser light trajectory Ur3 of the present modification is linear. The laser light trajectory Ur3 vibrates up and down (moving back and forth).

本實施形態之雷射光照射區域係沿著雷射光加工線WCL的直線狀。具體而言,相對移動軌跡Us係沿使用部分AR1最外緣線進行配置。雷射光移動軌跡Ur3係沿使用部分AR1最外緣之線呈間隔地進行配置。The laser light irradiation region of the present embodiment is linear along the laser light processing line WCL. Specifically, the relative movement trajectory Us is arranged along the outermost edge line of the use portion AR1. The laser light moving trajectory Ur3 is arranged at intervals along the line connecting the outermost edges of the portion AR1.

根據本變形例之雷射光移動軌跡Ur3,由於重疊部分Up3不是點狀而是線狀,且,於重疊部分Up3處,實質上照射3次雷射光,故可更加確實地切斷對象物體110。According to the laser beam trajectory Ur3 of the present modification, since the overlapping portion Up3 is not a dot shape but a line shape, the laser beam is substantially irradiated three times at the overlapping portion Up3, so that the target object 110 can be more reliably cut.

(光學組件貼合體之製造裝置) 以下,參考圖式並說明本發明一實施形態中光學組件貼合體之製造裝置的薄膜貼合系統1。本實施形態之薄膜貼合系統1中係由上述雷射光照射裝置100來構成切斷裝置。(Manufacturing Apparatus of Optical Component Bonding Body) Hereinafter, a film bonding system 1 for manufacturing an optical component bonding body according to an embodiment of the present invention will be described with reference to the drawings. In the film bonding system 1 of the present embodiment, the laser light irradiation device 100 constitutes a cutting device.

第15圖係顯示本實施形態之薄膜貼合系統1的概略結構之示意圖。 薄膜貼合系統1係例如將偏光薄膜或抗反射薄膜、光擴散薄膜等薄膜狀光學組件貼合至液晶面板或有機電致發光(OEL, Organic Electro-Luminescence)面板等面板狀光學顯示部件。Fig. 15 is a schematic view showing a schematic configuration of a film bonding system 1 of the present embodiment. In the film bonding system 1 , for example, a film-shaped optical component such as a polarizing film, an antireflection film, or a light diffusing film is bonded to a panel-shaped optical display member such as a liquid crystal panel or an organic electroluminescence (OEL) panel.

以下說明中,係依據需求並設定XYZ正交座標系,參考該XYZ正交座標系並說明各組件之位置關係。於本實施形態中,X方向係光學顯示部件的液晶面板之搬送方向,Y方向係液晶面板內側與X方向正交之方向(液晶面板之寬度方向),Z方向則為與X方向與Y方向正交之方向。In the following description, the XYZ orthogonal coordinate system is set according to requirements, and the positional relationship of each component is described with reference to the XYZ orthogonal coordinate system. In the present embodiment, the X direction is the transport direction of the liquid crystal panel of the optical display member, and the Y direction is the direction in which the inside of the liquid crystal panel is orthogonal to the X direction (the width direction of the liquid crystal panel), and the Z direction is the X direction and the Y direction. Orthogonal direction.

如第15圖所示,係設置有本實施形態之薄膜貼合系統1,以作為液晶面板P之製造生產線的一製程。薄膜貼合系統1之各部位係透過電子控制裝置的控制部40進行整體控制。As shown in Fig. 15, the film bonding system 1 of the present embodiment is provided as a process for manufacturing a production line of the liquid crystal panel P. Each part of the film bonding system 1 is integrally controlled by the control unit 40 of the electronic control unit.

第16圖係從液晶面板P之液晶層P3的厚度方向觀察液晶面板P的平面圖。液晶面板P具備有:第一基板P1,平面視圖呈長方形;第二基板P2,係對向第一基板P1地配置的較小長方形;以及液晶層P3,係封入第一基板P1與第二基板P2之間。液晶面板P於平面視圖沿第一基板P1外形呈長方形,平面視圖中位於液晶層P3外周之內側的區域為顯示區域P4。Fig. 16 is a plan view of the liquid crystal panel P as viewed from the thickness direction of the liquid crystal layer P3 of the liquid crystal panel P. The liquid crystal panel P includes a first substrate P1 having a rectangular shape in plan view, a second substrate P2 having a small rectangular shape disposed opposite to the first substrate P1, and a liquid crystal layer P3 enclosing the first substrate P1 and the second substrate. Between P2. The liquid crystal panel P has a rectangular shape along the outer shape of the first substrate P1 in plan view, and a region located inside the outer periphery of the liquid crystal layer P3 in plan view is the display region P4.

第17圖係第16圖中A-A線的剖面圖。於液晶面板P之正/反面,適當地貼合有從長條形之第一光學組件層F1及第二光學組件層F2(參考第15圖,以下總稱為光學組件層FX)各自切割出的第一光學組件F11及第二光學組件F12(以下,總稱為光學組件F1X)。本實施形態中,液晶面板P之背光側及顯示面側的雙面係各自貼合有作為偏光薄膜的第一光學組件F11及第二光學組件F12。Figure 17 is a cross-sectional view taken along line A-A of Figure 16. On the front/rear side of the liquid crystal panel P, the first optical component layer F1 and the second optical component layer F2 (refer to FIG. 15, hereinafter collectively referred to as the optical component layer FX) are respectively bonded to each other. The first optical component F11 and the second optical component F12 (hereinafter, collectively referred to as optical component F1X). In the present embodiment, the first optical unit F11 and the second optical unit F12 which are polarizing films are bonded to each other on both the backlight side and the display surface side of the liquid crystal panel P.

顯示區域P4之外側處設置有配置接合液晶面板P之第一基板及第二基板的密封劑等特定寬度之邊框部G。A frame portion G having a specific width such as a sealant that bonds the first substrate and the second substrate of the liquid crystal panel P is disposed on the outer side of the display region P4.

另外,從後述之第一層片F1m及第二層片F2m(以下,總稱為光學組件層),藉由各自切斷其貼合面外側之剩餘部分,以形成第一光學組件F11及第二光學組件F12。關於貼合面係於後述。Further, the first layer F1m and the second layer sheet F2m (hereinafter collectively referred to as an optical component layer) which will be described later are formed by cutting the remaining portions on the outer side of the bonding surface to form the first optical component F11 and the second. Optical component F12. The bonding surface is described later.

第18圖係貼合至液晶面板P之光學組件層FX的部分剖面圖。光學組件層FX係具有:薄膜狀光學組件本體F1a;設置於光學組件本體F1a之一側之面(第18圖的上側面)的黏著層F2a;隔著黏著層F2a而能分離地層積於光學組件本體F1a之一側之面的分離層片F3a;以及層積於光學組件本體F1a之另一側之面(第18圖的下側面)的表面保護薄膜F4a。光學組件本體F1a具有偏光板之功能,橫跨貼合於液晶面板P之顯示區域P4全區及其周邊區域。另外,為了圖式方便起見,省略第18圖中各層之剖面線。Fig. 18 is a partial cross-sectional view of the optical component layer FX attached to the liquid crystal panel P. The optical component layer FX has a film-like optical module body F1a, an adhesive layer F2a provided on one side of the optical component body F1a (upper side of FIG. 18), and can be separately laminated to the optical layer via the adhesive layer F2a. A separation layer F3a on the one side of the module body F1a; and a surface protection film F4a laminated on the other side (the lower side of FIG. 18) of the optical unit body F1a. The optical module body F1a has a function of a polarizing plate across the entire area of the display area P4 of the liquid crystal panel P and its peripheral area. In addition, the hatching of each layer in Fig. 18 is omitted for the sake of convenience of the drawings.

光學組件本體F1a係於其一側之面殘留有黏著層F2a且與分離層片F3a分離之狀態下,隔著黏著層F2a貼合至液晶面板P。以下,將從光學組件層FX去除分離層片F3a後的部分稱作貼合層片F5。The optical module main body F1a is bonded to the liquid crystal panel P via the adhesive layer F2a in a state where the adhesive layer F2a remains on the one surface and is separated from the separation layer F3a. Hereinafter, a portion from which the separation layer sheet F3a is removed from the optical module layer FX is referred to as a bonding layer sheet F5.

從黏著層F2a處分離前之期間,分離層片F3a係可保護黏著層F2a及光學組件本體F1a。表面保護薄膜F4a係與光學組件本體F1a一同貼合至液晶面板P。表面保護薄膜F4a係相對光學組件本體F1a而配置於液晶面板P之相反側,以保護光學組件本體F1a。表面保護薄膜F4a會在特定時點從光學組件本體F1a處分離。另外,光學組件層FX亦可為不包含表面保護薄膜F4a之結構,表面保護薄膜F4a亦可為無法從光學組件本體F1a處分離之結構。The separation layer F3a protects the adhesive layer F2a and the optical module body F1a before being separated from the adhesive layer F2a. The surface protective film F4a is bonded to the liquid crystal panel P together with the optical module body F1a. The surface protective film F4a is disposed on the opposite side of the liquid crystal panel P with respect to the optical module body F1a to protect the optical module body F1a. The surface protective film F4a is separated from the optical module body F1a at a specific time point. Further, the optical component layer FX may be a structure that does not include the surface protective film F4a, and the surface protective film F4a may be a structure that cannot be separated from the optical component body F1a.

光學組件本體F1a具有:層片狀之偏光鏡F6;於偏光鏡F6之一側之面以接著劑等接合的第一薄膜F7;以及於偏光鏡F6之另一側之面以接著劑等接合的第二薄膜F8。第一薄膜F7及第二薄膜F8係保護例如偏光鏡F6的保護薄膜。The optical module body F1a has a sheet-like polarizing mirror F6, a first film F7 joined by an adhesive or the like on one side of the polarizing mirror F6, and a bonding agent or the like on the other side of the polarizing mirror F6. The second film F8. The first film F7 and the second film F8 protect the protective film such as the polarizer F6.

另外,光學組件本體F1a可由一層之光學層所構成的單層構造,亦可為由複數個光學層相互層積的層積構造。除了偏光鏡F6之外,光學層亦可為相位差薄膜或輝度增加薄膜等。第一薄膜F7與第二薄膜F8中至少任一者亦可施以表面處理,以獲得包含保護液晶顯示單元最外層之硬塗層處理或防眩光處理之防眩等效果。光學組件本體F1a亦可不包含有第一薄膜F7與第二薄膜F8中至少任一者。例如省略第一薄膜F7之情況,亦可將分離層片F3a隔著黏著層F2a而貼合至光學組件本體F1a之一側之面。Further, the optical module body F1a may have a single layer structure composed of one optical layer, or may be a laminated structure in which a plurality of optical layers are laminated to each other. In addition to the polarizer F6, the optical layer may be a retardation film or a luminance increasing film. At least one of the first film F7 and the second film F8 may be subjected to a surface treatment to obtain an anti-glare effect including a hard coat treatment or an anti-glare treatment for protecting the outermost layer of the liquid crystal display unit. The optical module body F1a may not include at least one of the first film F7 and the second film F8. For example, when the first film F7 is omitted, the separation layer sheet F3a may be bonded to the surface on one side of the optical module body F1a via the adhesive layer F2a.

其次,詳細說明本實施形態之薄膜貼合系統1。 如第15圖所示,本實施形態之薄膜貼合系統1具備有從圖中右側的液晶面板P之搬送方向上游側(+X方向側)到圖中左側的液晶面板P之搬送方向下游側(-X方向側)為止,將液晶面板P以水平狀態進行搬送的驅動式滾筒輸送機5。Next, the film bonding system 1 of the present embodiment will be described in detail. As shown in Fig. 15, the film bonding system 1 of the present embodiment includes a downstream side (+X direction side) in the transport direction of the liquid crystal panel P on the right side in the drawing, and a downstream side in the transport direction of the liquid crystal panel P on the left side in the drawing ( In the -X direction side, the drive type roller conveyor 5 which conveys the liquid crystal panel P in the horizontal state is carried out.

滾筒輸送機5以後述之反轉裝置15為邊界,分為上游側輸送機6與下游側輸送機7。上游側輸送機6中,液晶面板P係沿顯示區域P4之短邊作為搬送方向來進行搬送。另一方面,下游側輸送機7中,液晶面板P係沿顯示區域P4之長邊作為搬送方向來進行搬送。相對該液晶面板P之正/反面,將從條狀光學組件層FX切割出特定長度的貼合層片F5之層片FXm(相當於光學組件F1X)進行貼合。The reversing device 15 described later on the roller conveyor 5 is divided into an upstream conveyor 6 and a downstream conveyor 7. In the upstream conveyor 6, the liquid crystal panel P is conveyed along the short side of the display area P4 as a conveyance direction. On the other hand, in the downstream conveyor 7, the liquid crystal panel P is conveyed along the long side of the display area P4 as a conveyance direction. The layer FXm (corresponding to the optical component F1X) of the bonding layer sheet F5 of a specific length cut out from the strip-shaped optical component layer FX is bonded to the front/rear surface of the liquid crystal panel P.

另外,上游側輸送機6係於後述之第一吸附裝置11中,具備有獨立於下游側的自由滾筒輸送機24。另一方面,下游側輸送機7係於後述之第二吸附裝置20中,具備有獨立於下游側的自由滾筒輸送機24。Further, the upstream conveyor 6 is provided in a first adsorption device 11 to be described later, and includes a free roller conveyor 24 that is independent of the downstream side. On the other hand, the downstream conveyor 7 is attached to the second adsorption device 20, which will be described later, and includes a free roller conveyor 24 that is independent of the downstream side.

本實施形態之薄膜貼合系統1,係具備︰第一吸附裝置11、第一集塵裝置12、第一貼合裝置13、第一檢測裝置41、第一切斷裝置31、反轉裝置15、第二集塵裝置16,第二貼合裝置17,第二檢測裝置42,第二切斷裝置32及控制部40。The film bonding system 1 of the present embodiment includes a first adsorption device 11, a first dust collecting device 12, a first bonding device 13, a first detecting device 41, a first cutting device 31, and a reversing device 15. The second dust collecting device 16, the second bonding device 17, the second detecting device 42, the second cutting device 32, and the control unit 40.

第一吸附裝置11係對液晶面板P進行吸附並搬送至上游側輸送機6,且進行液晶面板P之校準(決定位置)。第一吸附裝置11係具備︰面板保持部11a、校準攝影機11b及軌道R。The first adsorption device 11 adsorbs the liquid crystal panel P and transports it to the upstream conveyor 6, and performs calibration (determination of position) of the liquid crystal panel P. The first adsorption device 11 includes a panel holding portion 11a, a calibration camera 11b, and a rail R.

面板保持部11a係可朝垂直方向及水平方向移動地,保持著藉由上游側輸送機6抵接至下游側之止動器S的液晶面板P,並進行液晶面板P之校準。面板保持部11a係藉由真空吸附對抵接於止動器S的液晶面板P上側面進行吸附保持。面板保持部11a係在液晶面板P吸附保持狀態下,在軌道R上移動並搬送液晶面板P。面板保持部11a於搬送完成時解除吸附保持並將液晶面板P傳遞至自由滾筒輸送機24。The panel holding portion 11a is movable in the vertical direction and the horizontal direction, and holds the liquid crystal panel P of the stopper S on the downstream side by the upstream conveyor 6, and aligns the liquid crystal panel P. The panel holding portion 11a sucks and holds the upper surface of the liquid crystal panel P that is in contact with the stopper S by vacuum suction. The panel holding portion 11a moves on the rail R while the liquid crystal panel P is in the state of being sucked and held, and conveys the liquid crystal panel P. The panel holding portion 11a releases the suction holding when the conveyance is completed, and transmits the liquid crystal panel P to the free roller conveyor 24.

校準攝影機11b係當面板保持部11a保持著抵接至止動器S的液晶面板P而上升狀態下拍攝液晶面板P之校準標記或前端形狀等。校準攝影機11b之攝影資料係傳送至控制部40,根據該攝影資料,使面板保持部11a作動,而對目的地之自由滾筒輸送機24進行液晶面板P之校準。換言之,液晶面板P係相對自由滾筒輸送機24,在調整了搬送方向上、搬送方向之正交方向上,及繞液晶面板P垂直軸之旋轉方向上的偏差量之狀態下,搬送至自由滾筒輸送機24。 此處,由面板保持部11a而沿軌道R上搬送的液晶面板P係在被吸附於吸附盤26之狀態下,與層片FXm一同地使前端部夾持於夾壓滾筒23處。The calibration camera 11b captures a calibration mark or a front end shape of the liquid crystal panel P when the panel holding portion 11a is held in contact with the liquid crystal panel P of the stopper S. The photographic data of the calibration camera 11b is transmitted to the control unit 40, and the panel holding unit 11a is activated based on the photographic data, and the liquid crystal panel P is calibrated to the destination free roller conveyor 24. In other words, the liquid crystal panel P is transported to the free roller in a state in which the amount of deviation in the direction orthogonal to the transport direction, the transport direction, and the direction perpendicular to the vertical axis of the liquid crystal panel P is adjusted in the transport direction. Conveyor 24. Here, the liquid crystal panel P conveyed along the rail R by the panel holding portion 11a is attached to the nip roller 23 together with the layer FXm in a state of being adsorbed to the suction tray 26.

第一集塵裝置12係設置於第一貼合裝置13之貼合位置之夾壓滾筒23的液晶面板P之搬送上游側。第一集塵裝置12係進行靜電消除及集塵,以去除引導至貼合位置之前的液晶面板P周邊灰塵,尤其是液晶面板P下面側之灰塵。The first dust collecting device 12 is disposed on the upstream side of the liquid crystal panel P of the nip roller 23 at the bonding position of the first bonding device 13. The first dust collecting device 12 performs static elimination and dust collection to remove dust around the liquid crystal panel P before being guided to the bonding position, in particular, dust on the lower side of the liquid crystal panel P.

第一貼合裝置13係設置於第一吸附裝置11的面板搬送下游側。第一貼合裝置13係相對引導至貼合位置之液晶面板P下側面,進行切斷成特定尺寸之貼合層片F5(相當於第一層片F1m)的貼合。The first bonding apparatus 13 is provided on the downstream side of the panel conveyance of the first adsorption device 11. The first bonding apparatus 13 is bonded to the lower side surface of the liquid crystal panel P that is guided to the bonding position, and is bonded to the bonding layer sheet F5 (corresponding to the first layer sheet F1m) of a specific size.

第一貼合裝置13係具備:搬送裝置22與夾壓滾筒23。The first bonding apparatus 13 includes a conveying device 22 and a nip roller 23 .

搬送裝置22係從捲繞有光學組件層FX之料捲滾筒R1將光學組件層FX捲出,並沿光學組件層FX之長邊方向搬送光學組件層FX。搬送裝置22係以分離層片F3a作為載體來搬送貼合層片F5。搬送裝置22具有:滾筒保持部22a、複數個導引滾筒22b、切斷裝置22c、刀刃22d及捲取部22e。The transport device 22 winds up the optical component layer FX from the roll drum R1 around which the optical component layer FX is wound, and conveys the optical component layer FX along the longitudinal direction of the optical component layer FX. The conveying device 22 conveys the bonding layer sheet F5 with the separation layer sheet F3a as a carrier. The conveying device 22 has a drum holding portion 22a, a plurality of guide rollers 22b, a cutting device 22c, a blade 22d, and a winding portion 22e.

滾筒保持部22a係保持捲繞有條狀光學組件層FX之料捲滾筒R1,並沿光學組件層FX之長邊方向捲出光學組件層FX。 複數個導引滾筒22b係沿特定搬送路線引導從料捲滾筒R1捲出之光學組件層FX,以捲繞光學組件層FX。 切斷裝置22c對搬送路線上之光學組件層FX施以半切斷。 刀刃22d使得施以半切斷後之光學組件層FX呈銳角地捲繞,以使貼合層片F5從分離層片F3a處分離並將該貼合層片F5供給至貼合位置。 捲取部22e係保持捲取通過刀刃22d後獨自存在之分離層片F3a的分離滾筒R2。The roller holding portion 22a holds the roll drum R1 around which the strip-shaped optical component layer FX is wound, and winds up the optical component layer FX in the longitudinal direction of the optical component layer FX. The plurality of guide rollers 22b guide the optical component layer FX unwound from the take-up reel R1 along a specific conveyance path to wind the optical component layer FX. The cutting device 22c applies a half cut to the optical component layer FX on the transport path. The blade 22d winds the half-cut optical component layer FX at an acute angle so that the bonding layer sheet F5 is separated from the separation layer sheet F3a and the bonding layer sheet F5 is supplied to the bonding position. The take-up portion 22e holds the separation roller R2 that winds up the separation layer sheet F3a that is uniquely passed after passing through the blade edge 22d.

位於搬送裝置22起點之滾筒保持部22a與位於搬送裝置22終點之捲取部22e例如為相互同步驅動。藉此,滾筒保持部22a係朝光學組件層FX之搬送方向捲出光學組件層FX,且捲取部22e則捲取通過刀刃22d後的分離層片F3a。以下,於搬送裝置22中,光學組件層FX(分離層片F3a)之搬送方向上游側稱作層片搬送上游側,搬送方向下游側稱作層片搬送下游側。The roller holding portion 22a located at the beginning of the conveying device 22 and the winding portion 22e located at the end of the conveying device 22 are driven in synchronization with each other, for example. Thereby, the roller holding portion 22a winds up the optical component layer FX in the conveyance direction of the optical component layer FX, and the winding portion 22e winds up the separation layer sheet F3a which passes through the blade edge 22d. In the conveyance device 22, the upstream side in the conveyance direction of the optical component layer FX (separation layer sheet F3a) is referred to as the layer conveyance upstream side, and the downstream side in the conveyance direction is referred to as the layer conveyance downstream side.

各導引滾筒22b係沿搬送路線改變搬送中光學組件層FX之行進方向,且複數個導引滾筒22b之至少一部分為可動式,以調整搬送中光學組件層FX之張力。Each of the guide rollers 22b changes the traveling direction of the optical component layer FX during transport along the transport path, and at least a part of the plurality of guide rollers 22b is movable to adjust the tension of the optical component layer FX during transport.

另外,在滾筒保持部22a與切斷裝置22c之間處,可配置圖中未顯示之張力滾筒。張力滾筒係在以切斷裝置22c切斷光學組件層FX期間,吸收滾筒保持部22a所搬送之光學組件層FX的捲出量。Further, a tension roller (not shown) may be disposed between the roller holding portion 22a and the cutting device 22c. The tension roller absorbs the amount of winding of the optical component layer FX conveyed by the roller holding portion 22a while the optical device layer FX is being cut by the cutting device 22c.

第19圖係顯示本實施形態之切斷裝置22c動作的示意圖。 如第19圖所示,切斷裝置22c在捲出特定長度之光學組件層FX時,橫跨與光學組件層FX長邊方向正交之寬度方向上的整體寬度,進行將光學組件層FX厚度方向之一部分切斷的半切斷。本實施形態之切斷裝置22c係相對光學組件層FX從分離層片F3a之相反側朝光學組件層FX可進刀/退刀地設置。Fig. 19 is a schematic view showing the operation of the cutting device 22c of the present embodiment. As shown in Fig. 19, when the optical device layer FX of a specific length is wound up, the cutting device 22c performs the thickness of the optical component layer FX across the entire width in the width direction orthogonal to the longitudinal direction of the optical component layer FX. One half of the direction is cut off by a half cut. The cutting device 22c of the present embodiment is provided for feeding/retracting from the opposite side of the separation layer sheet F3a to the optical module layer FX with respect to the optical module layer FX.

切斷裝置22c係施以半切斷,即藉由光學組件層FX搬送中的張力,在不使得光學組件層FX(分離層片F3a)斷裂壞損(殘留有特定厚度分離層片F3a)的情況下,調整切斷刀片的前後位置,切入達黏著層F2與分離層片F3a交界面附近位置為止。另外,亦可使用雷射裝置代替切斷刀片。The cutting device 22c is half-cut, that is, the tension in the optical component layer FX is conveyed, and the optical component layer FX (separation layer sheet F3a) is not broken (the specific thickness separation layer F3a remains). Next, the front and rear positions of the cutting blade are adjusted, and the cutting is performed until the position near the interface between the adhesive layer F2 and the separation layer F3a. Alternatively, a laser device can be used instead of cutting the blade.

於半切斷後之光學組件層FX中,依其厚度方向切斷光學組件本體F1a及表面保護薄膜F4a,以形成橫跨光學組件層FX之寬度方向上之整體寬度的切割線L1, L2。切割線L1, L2在條狀光學組件層FX之長邊方向上形成有複數條並排。例如在搬送相同尺寸之液晶面板P的貼合步驟情況下,複數個切割線L1, L2係於光學組件層FX之長邊方向上以等間隔地形成。光學組件層FX係藉由複數個切割線L1, L2,在長邊方向上劃分出複數個分區。於光學組件層FX之長邊方向上,由相鄰的一對切割線L1, L2所夾分區係各自為貼合層片F5中的一個層片FXm。層片FXm係尺寸超出液晶面板P外側的光學組件層FX之層片。In the half-cut optical component layer FX, the optical module body F1a and the surface protective film F4a are cut in the thickness direction to form cutting lines L1, L2 across the entire width in the width direction of the optical component layer FX. The cutting lines L1, L2 are formed in a plurality of side by side in the longitudinal direction of the strip-shaped optical component layer FX. For example, in the case of a bonding step of transporting the liquid crystal panel P of the same size, a plurality of cutting lines L1, L2 are formed at equal intervals in the longitudinal direction of the optical component layer FX. The optical component layer FX divides a plurality of partitions in the longitudinal direction by a plurality of cutting lines L1, L2. In the longitudinal direction of the optical component layer FX, the partitions sandwiched by the adjacent pair of cutting lines L1, L2 are each one of the laminated layers F5. The layer FXm is a layer that is larger than the layer of the optical component layer FX outside the liquid crystal panel P.

回到第15圖,刀刃22d係配置於上游側輸送機6下方,於光學組件層FX之寬度方向上至少延伸其整體寬度地形成。半切斷後之光學組件層FX的分離層片F3a側會呈滑動接觸般地捲繞過刀刃22d。Returning to Fig. 15, the blade 22d is disposed below the upstream conveyor 6, and is formed to extend at least the entire width of the optical module layer FX in the width direction. The side of the separation layer sheet F3a of the optical component layer FX after the half cutting is wound around the blade edge 22d in a sliding contact manner.

刀刃22d具有:第一面,係配置成自光學組件層FX之寬度方向(上游側輸送機6之寬度方向)觀察呈面朝下的狀態;第二面,係在第一面上方從光學組件層FX之寬度方向觀察呈相對第一面夾銳角地配置;及前端部,位於第一面及第二面相交處。The blade 22d has a first surface configured to face downward in a width direction of the optical module layer FX (width direction of the upstream conveyor 6); and a second surface from the optical component above the first surface The width direction of the layer FX is arranged at an acute angle with respect to the first surface; and the front end portion is located at the intersection of the first surface and the second surface.

於第一貼合裝置13中,刀刃22d係於其前端部使第一光學組件層F1呈銳角般捲繞經過。第一光學組件層F1因刀刃22d之前端部而呈銳角般折返時,使貼合層片F5之層片(第一層片F1m)從分離層片F3a處分離。刀刃22d之前端部係配置於接近夾壓滾筒23之面板搬送下游側。藉由刀刃22d而從分離層片F3a分離的第一層片F1m係重疊至吸附於第一吸附裝置11之狀態的液晶面板P下側面,且被引導至夾壓滾筒23的一對貼合滾筒23a之間。第一層片F1m係尺寸超出液晶面板P外側的第一光學組件層F1之層片。In the first bonding apparatus 13, the blade 22d is wound around the front end portion so that the first optical component layer F1 is wound at an acute angle. When the first optical component layer F1 is folded back at an acute angle due to the front end portion of the blade 22d, the layer sheet (the first layer sheet F1m) of the bonded layer sheet F5 is separated from the separation layer sheet F3a. The front end portion of the blade 22d is disposed on the downstream side of the panel conveyance close to the nip roller 23. The first layer sheet F1m separated from the separation layer sheet F3a by the blade edge 22d is superposed on the lower side surface of the liquid crystal panel P adsorbed to the first adsorption device 11, and guided to the pair of bonding rollers of the nip roller 23. Between 23a. The first layer F1m is a layer which is larger in size than the first optical component layer F1 outside the liquid crystal panel P.

另一方面,藉由刀刃22d而與貼合層片F5分離之分離層片F3a係朝向捲取部22e。捲取部22e則捲取與貼合層片F5分離之分離層片F3a,進行回收。On the other hand, the separation layer sheet F3a separated from the bonding layer sheet F5 by the blade edge 22d faces the winding portion 22e. The winding unit 22e winds up the separated layer sheet F3a separated from the bonding layer sheet F5 and collects it.

夾壓滾筒23使搬送裝置22將從第一光學組件層F1分離之第一層片F1m貼合至上游側輸送機6所搬送的液晶面板P下側面。此處,夾壓滾筒23相當於專利申請範圍中所記載的貼合裝置。The nip roller 23 causes the conveying device 22 to bond the first layer sheet F1m separated from the first optical unit layer F1 to the lower side surface of the liquid crystal panel P conveyed by the upstream side conveyor 6. Here, the nip roller 23 corresponds to the bonding apparatus described in the patent application scope.

夾壓滾筒23有於軸線方向相互平行地配置的一對貼合滾筒23a, 23a(上方之貼合滾筒23a可上下移動)。一對貼合滾筒23a, 23a之間形成有指定間隙,該間隙內即為第一貼合裝置13的貼合位置。The nip roller 23 has a pair of bonding rolls 23a and 23a which are arranged in parallel with each other in the axial direction (the upper bonding roll 23a can move up and down). A predetermined gap is formed between the pair of bonding rolls 23a, 23a, and the gap is the bonding position of the first bonding apparatus 13.

將液晶面板P及第一層片F1m重合導入間隙內。該等液晶面板P及第一層片F1m係於各貼合滾筒23a之間受夾壓,並送往上游側輸送機6之面板搬送下游側。本實施形態中,藉由夾壓滾筒23,便可將第一層片F1m貼合至液晶面板P之背光側之面,以形成第一光學組件貼合體PA1。The liquid crystal panel P and the first layer sheet F1m are superposed and introduced into the gap. The liquid crystal panel P and the first layer sheet F1m are pinched between the respective bonding drums 23a, and are sent to the downstream side of the panel conveyance of the upstream conveyor 6. In the present embodiment, the first layer sheet F1m can be bonded to the surface on the backlight side of the liquid crystal panel P by the nip roller 23 to form the first optical component bonding body PA1.

第一檢測裝置41係設置於第一貼合裝置13的面板搬送下游側。第一檢測裝置41係檢測出液晶面板P與第一層片F1m之貼合面(以下,稱為第一貼合面)的端緣。The first detecting device 41 is provided on the downstream side of the panel conveyance of the first bonding device 13. The first detecting device 41 detects the edge of the bonding surface of the liquid crystal panel P and the first layer sheet F1m (hereinafter referred to as the first bonding surface).

第20圖係顯示第一貼合面SA1之端緣ED之檢測步驟的平面圖。 例如第20圖所示,第一檢測裝置41係對設置於上游側輸送機6之搬送路線上的4個檢查區域CA中檢測出第一貼合面SA1之端緣ED。各檢查區域CA係配置於對應具有矩形外形之第一貼合面SA1的4個角部之位置。端緣ED係針對生產線上所搬送之每個液晶面板P而進行檢測。第一檢測裝置41檢測出的端緣ED資料係儲存於圖中未顯示的記憶部。Fig. 20 is a plan view showing the detecting step of the edge ED of the first bonding surface SA1. For example, as shown in FIG. 20, the first detecting device 41 detects the edge ED of the first bonding surface SA1 among the four inspection areas CA provided on the transport path of the upstream conveyor 6. Each of the inspection regions CA is disposed at a position corresponding to the four corner portions of the first bonding surface SA1 having a rectangular outer shape. The edge ED is detected for each liquid crystal panel P conveyed on the production line. The edge ED data detected by the first detecting device 41 is stored in a memory portion not shown in the drawing.

另外,檢查區域CA之配置位置不限定於此。例如,各檢查區域CA亦可配置於對應第一貼合面SA1之各側邊一部分(例如各側邊之中央部)的位置。In addition, the arrangement position of the inspection area CA is not limited to this. For example, each inspection area CA may be disposed at a position corresponding to a part of each side of the first bonding surface SA1 (for example, a central portion of each side).

第21圖係第一檢測裝置41的示意圖。 於第21圖中,為方便起見,以貼合有第一光學組件貼合體PA1之第一層片F1m之側為上側,第一檢測裝置41之結構係顯示為上下相反。Figure 21 is a schematic view of the first detecting device 41. In Fig. 21, for the sake of convenience, the side of the first layer sheet F1m to which the first optical component bonding body PA1 is bonded is the upper side, and the structure of the first detecting device 41 is shown as being vertically opposite.

如第21圖所示,第一檢測裝置41係具備:照明光源44,係照亮端緣ED;以及攝影裝置43,係配置成基於第一貼合面SA1之法線方向較端緣ED朝第一貼合面SA1內側傾斜的狀態,從貼合有第一光學組件貼合體PA1之第一層片F1m之側拍攝端緣ED的畫面。As shown in Fig. 21, the first detecting device 41 includes an illumination light source 44 that illuminates the bright edge ED, and an imaging device 43 that is disposed such that the normal direction of the first bonding surface SA1 is closer to the edge ED. In a state in which the inside of the first bonding surface SA1 is inclined, a screen on which the edge ED is imaged from the side of the first layer sheet F1m to which the first optical component bonding body PA1 is bonded is attached.

照明光源44與攝影裝置43係各自配置於第20圖中所示之4個檢查區域CA(對應第一貼合面SA1之4個角部的位置)。The illumination light source 44 and the imaging device 43 are disposed in each of the four inspection areas CA (corresponding to the four corners of the first bonding surface SA1) shown in Fig. 20 .

第一貼合面SA1的法線與攝影裝置43之拍攝面43a的法線所夾角度(以下,稱為攝影裝置43之傾斜角度θ) 較佳地可設定為讓面板分斷時之偏差或毛邊等不會進入攝影裝置43之拍攝視野內。例如,第二基板P2之端面偏移至第一基板P1之端面外側的情況中,攝影裝置43之傾斜角度θ可設定為不讓第二基板P2之端緣進入攝影裝置43之拍攝視野內。The angle between the normal line of the first bonding surface SA1 and the normal line of the imaging surface 43a of the imaging device 43 (hereinafter referred to as the inclination angle θ of the imaging device 43) can preferably be set to a deviation when the panel is broken or The burrs or the like do not enter the field of view of the photographing device 43. For example, in a case where the end surface of the second substrate P2 is shifted to the outside of the end surface of the first substrate P1, the inclination angle θ of the photographing device 43 can be set so as not to enter the end edge of the second substrate P2 into the photographing field of view of the photographing device 43.

攝影裝置43之傾斜角度θ較佳地可配合第一貼合面SA1與攝影裝置43之拍攝面43a中心之間的距離(以下,稱為攝影裝置43之高度H)來進行設定。例如,攝影裝置43之高度H為50mm以上,100mm以下的情況中,攝影裝置43之傾斜角度θ較佳地可設定於5°以上,20°以下之範圍的角度。但是,依經驗已知偏差量的情況中,可根據其偏差量求得攝影裝置43之高度H及攝影裝置43之傾斜角度θ。本實施形態中,攝影裝置43之高度H設定為78mm,攝影裝置43之傾斜角度θ設定10°。The inclination angle θ of the photographing device 43 is preferably set to match the distance between the first bonding surface SA1 and the center of the imaging surface 43a of the imaging device 43 (hereinafter referred to as the height H of the imaging device 43). For example, when the height H of the imaging device 43 is 50 mm or more and 100 mm or less, the inclination angle θ of the imaging device 43 can be preferably set to an angle of 5° or more and 20° or less. However, in the case where the amount of deviation is known empirically, the height H of the photographing device 43 and the tilt angle θ of the photographing device 43 can be obtained from the amount of deviation. In the present embodiment, the height H of the imaging device 43 is set to 78 mm, and the inclination angle θ of the imaging device 43 is set to 10°.

照明光源44與攝影裝置43係固定並配置於各檢查區域CA。The illumination light source 44 is fixed to the imaging device 43 and disposed in each of the inspection areas CA.

另外,照明光源44與攝影裝置43亦可配置成可沿第一貼合面SA1之端緣ED移動。該情況中,照明光源44與攝影裝置43可各設置一組即可。又,藉此,照明光源44與攝影裝置43可在易於拍攝第一貼合面SA1之端緣ED的位置處進行移動。Further, the illumination light source 44 and the imaging device 43 may be arranged to be movable along the edge ED of the first bonding surface SA1. In this case, one set of the illumination light source 44 and the photographing device 43 may be provided. Further, by this, the illumination light source 44 and the imaging device 43 can move at a position where the edge ED of the first bonding surface SA1 can be easily photographed.

照明光源44係配置於貼合有第一光學組件貼合體PA1之第一層片F1m之側的相反側。照明光源44係配置成基於第一貼合面SA1之法線方向較端緣ED朝第一貼合面SA1外側傾斜的狀態。於本實施形態中,照明光源44之光軸與攝影裝置43之拍攝面43a的法線係呈平行。The illumination light source 44 is disposed on the opposite side to the side of the first layer sheet F1m to which the first optical component bonding body PA1 is bonded. The illumination light source 44 is disposed in a state in which the normal direction of the first bonding surface SA1 is inclined toward the outside of the first bonding surface SA1 from the edge ED. In the present embodiment, the optical axis of the illumination light source 44 is parallel to the normal line of the imaging surface 43a of the imaging device 43.

另外,照明光源44亦可配置於第一光學組件貼合體PA1之貼合有第一層片F1m之側。In addition, the illumination light source 44 may be disposed on the side of the first optical component bonding body PA1 to which the first layer sheet F1m is bonded.

又,照明光源44之光軸與攝影裝置43之拍攝面43a的法線亦可略為傾斜地相互交叉。Further, the optical axis of the illumination light source 44 and the normal line of the imaging surface 43a of the imaging device 43 may also intersect each other with a slight inclination.

第一層片F1m之切斷位置係根據第一貼合面SA1之端緣ED檢測結果來調整。控制部40(參考第15圖)係取得儲存於記憶部的第一貼合面SA1之端緣ED資料,以決定第一層片F1m之切斷位置,使第一光學組件F11不會超出液晶面板P外側(第一貼合面SA1外側)的大小。第一切斷裝置31係於控制部40所決定之切斷位置處將第一層片F1m切斷。The cutting position of the first layer sheet F1m is adjusted based on the detection result of the edge ED of the first bonding surface SA1. The control unit 40 (refer to FIG. 15) acquires the edge ED data stored in the first bonding surface SA1 of the memory unit to determine the cutting position of the first layer F1m so that the first optical component F11 does not exceed the liquid crystal. The size of the outer side of the panel P (outside of the first bonding surface SA1). The first cutting device 31 cuts the first layer sheet F1m at the cutting position determined by the control unit 40.

回到第15圖,第一切斷裝置31係設置於第一檢測裝置41的面板搬送下游側。第一切斷裝置31係沿端緣ED進行雷射切斷,以將從第一光學組件貼合體PA1超出第一貼合面SA1外側部分的第一層片F1m(第一層片F1m的剩餘部分)切斷,以形成對應於第一貼合面SA1大小的光學組件(第一光學組件F11)。此處,第一切斷裝置31係相當於申請專利範圍中所記載的切斷裝置。Returning to Fig. 15, the first cutting device 31 is provided on the downstream side of the panel conveyance of the first detecting device 41. The first cutting device 31 performs laser cutting along the edge ED so as to extend the first layer F1m from the first optical component bonding body PA1 beyond the outer portion of the first bonding surface SA1 (the remaining of the first layer F1m) Partially, the cutting is performed to form an optical component (first optical component F11) corresponding to the size of the first bonding surface SA1. Here, the first cutting device 31 corresponds to the cutting device described in the patent application.

此處,「對應於第一貼合面SA1大小」係顯示第一基板P1外形之大小。但是,為較顯示區域P4大並較液晶面板P外形小的區域,且為電子部件安裝部等功能部分的區域。Here, "corresponding to the size of the first bonding surface SA1" indicates the size of the outer shape of the first substrate P1. However, it is a region which is larger than the display region P4 and smaller than the outer shape of the liquid crystal panel P, and is a region of a functional portion such as an electronic component mounting portion.

藉由第一切斷裝置31,從第一光學組件貼合體PA1將第一層片F1m之剩餘部分切斷,將第一光學組件F11貼合至液晶面板P之背光側之面而形成第二光學組件貼合體PA2。從第一層片F1m切斷之剩餘部分係透過圖式中省略之剝離裝置,從液晶面板P進行剝離回收。By the first cutting device 31, the remaining portion of the first layer sheet F1m is cut from the first optical unit bonding body PA1, and the first optical unit F11 is bonded to the surface of the backlight side of the liquid crystal panel P to form a second portion. The optical component is bonded to the body PA2. The remaining portion cut from the first layer sheet F1m is peeled off from the liquid crystal panel P through a peeling device omitted in the drawings.

反轉裝置15係針對液晶面板P之顯示面側朝向上側面之第二光學組件貼合體PA2進行正/反面反轉,使液晶面板P之背光側朝向上側面,並對第二貼合裝置17進行液晶面板P之校準。The inversion device 15 reverses the front/back surface of the second optical component bonding body PA2 facing the upper side on the display surface side of the liquid crystal panel P, and causes the backlight side of the liquid crystal panel P to face the upper side, and the second bonding device 17 Perform calibration of the liquid crystal panel P.

反轉裝置15具有與第一吸附裝置11之面板保持部11a相同的校準功能。反轉裝置15處設置有與第一吸附裝置11之校準攝影機11b相同的校準攝影機15c。The inverting device 15 has the same calibration function as the panel holding portion 11a of the first adsorption device 11. The reversing device 15 is provided with the same calibration camera 15c as the calibration camera 11b of the first adsorption device 11.

反轉裝置15係根據儲存於控制部40的光軸方向檢查資料及校準攝影機15c的攝影資料,以決定相對第二貼合裝置17的第二光學組件貼合體PA2之部件寬度方向及迴轉方向上的位置。在該狀態中,第二光學組件貼合體PA2被引導至第二貼合裝置17之貼合位置。The inverting device 15 determines the width direction and the direction of rotation of the second optical component bonding body PA2 of the second bonding device 17 based on the optical axis direction inspection data stored in the control unit 40 and the imaging data of the calibration camera 15c. s position. In this state, the second optical component bonding body PA2 is guided to the bonding position of the second bonding device 17.

由於第二吸附裝置20具備與第一吸附裝置11相同的結構,因此相同部分賦予相同元件符號加以說明。第二吸附裝置20係對第二光學組件貼合體PA2進行吸附並搬送至下游側輸送機7,且進行第二光學組件貼合體PA2之校準(決定位置)。第二吸附裝置20係具備︰面板保持部11a、校準攝影機11b及軌道R。Since the second adsorption device 20 has the same configuration as that of the first adsorption device 11, the same components are denoted by the same reference numerals. The second adsorption device 20 adsorbs the second optical component bonding body PA2 and conveys it to the downstream conveyor 7, and performs calibration (determination of position) of the second optical component bonding body PA2. The second adsorption device 20 includes a panel holding portion 11a, a calibration camera 11b, and a rail R.

面板保持部11a係可朝垂直方向及水平方向移動地,保持著藉由下游側輸送機7抵接至下游側之止動器S的第二光學組件貼合體PA2,並進行第二光學組件貼合體PA2之校準。面板保持部11a係藉由真空吸附對抵接於止動器S的第二光學組件貼合體PA2上側面進行吸附保持。面板保持部11a係在第二光學組件貼合體PA2吸附保持狀態下,在軌道R上移動並搬送第二光學組件貼合體PA2。面板保持部11a於該搬送完成時解除該吸附保持,並將第二光學組件貼合體PA2傳遞至自由滾筒輸送機24。The panel holding portion 11a is movable in the vertical direction and the horizontal direction, and holds the second optical component bonding body PA2 that is in contact with the downstream side stopper S by the downstream conveyor 7, and performs the second optical component bonding. Calibration of the fitted PA2. The panel holding portion 11a sucks and holds the upper surface of the second optical component bonding body PA2 that abuts against the stopper S by vacuum suction. The panel holding portion 11a moves on the rail R while the second optical unit bonding body PA2 is being sucked and held, and conveys the second optical unit bonding body PA2. The panel holding portion 11a releases the suction holding when the conveyance is completed, and transmits the second optical component bonding body PA2 to the free roller conveyor 24.

校準攝影機11b係當面板保持部11a保持著抵接至止動器S的第二光學組件貼合體PA2而上升狀態下,拍攝第二光學組件貼合體PA2之校準標記或前端形狀等。校準攝影機11b之攝影資料係傳送至控制部40,根據該攝影資料,使面板保持部11a作動,而對目的地之自由滾筒輸送機24進行第二光學組件貼合體PA2之校準。換言之,第二光學組件貼合體PA2係相對自由滾筒輸送機24,在調整了搬送方向上、搬送方向之正交方向上,及繞第二光學組件貼合體PA2垂直軸之旋轉方向上的偏差量之狀態下,搬送至自由滾筒輸送機24。The calibration camera 11b picks up a calibration mark or a front end shape of the second optical component bonding body PA2 when the panel holding portion 11a is held in contact with the second optical component bonding body PA2 that abuts against the stopper S. The photographic data of the calibration camera 11b is transmitted to the control unit 40, and the panel holding unit 11a is actuated based on the photographic data, and the second optical unit bonding body PA2 is calibrated to the destination free roller conveyor 24. In other words, the second optical component bonding body PA2 is opposed to the free roller conveyor 24 in the direction in which the conveying direction is adjusted, the direction in which the conveying direction is orthogonal, and the amount of deviation in the direction of rotation about the vertical axis of the second optical component bonding body PA2. In this state, it is conveyed to the free roller conveyor 24.

第二集塵裝置16係相對於第二貼合裝置17之貼合位置的夾壓滾筒23而設置於液晶面板P之搬送方向上游側。第二集塵裝置16係進行靜電消除及集塵,以去除引導至貼合位置之前的第二光學組件貼合體PA2周邊灰塵,尤其是下面側之灰塵。The second dust collecting device 16 is provided on the upstream side in the conveying direction of the liquid crystal panel P with respect to the nip roller 23 at the bonding position of the second bonding device 17 . The second dust collecting device 16 performs static elimination and dust collection to remove dust around the second optical component bonding body PA2 before the bonding position, particularly the dust on the lower side.

第二貼合裝置17係設置於第二集塵裝置16的面板搬送下游側。第二貼合裝置17係相對引導至貼合位置之第二光學組件貼合體PA2下側面,進行切斷成特定尺寸之貼合層片F5(相當於第二層片F2m)的貼合。第二貼合裝置17係具備與第一貼合裝置13相同的搬送裝置22及夾壓滾筒23。The second bonding apparatus 17 is provided on the downstream side of the panel conveyance of the second dust collecting device 16. The second bonding apparatus 17 is bonded to the lower side surface of the second optical component bonding body PA2 that is guided to the bonding position, and is bonded to the bonding layer sheet F5 (corresponding to the second layer sheet F2m) of a specific size. The second bonding apparatus 17 includes the same conveying device 22 and the nip roller 23 as the first bonding device 13 .

將第二光學組件貼合體PA2及第二層片F2m重合導入夾壓滾筒23之一對貼合滾筒23a之間隙內(第二貼合裝置17之貼合位置)。第二層片F2m係較液晶面板P之顯示區域P4更大尺寸的第二光學組件層F2之層片。The second optical component bonding body PA2 and the second layer sheet F2m are superposed and introduced into the gap between one of the nip rollers 23 and the bonding roller 23a (the bonding position of the second bonding device 17). The second layer F2m is a layer of the second optical component layer F2 that is larger in size than the display region P4 of the liquid crystal panel P.

該等第二光學組件貼合體PA2及第二層片F2m係於各貼合滾筒23a之間受夾壓,並送往下游側輸送機7之面板搬送下游側。本實施形態中,藉由夾壓滾筒23,便可將第二層片F2m貼合至液晶面板P之顯示面側之面(貼合有第二光學組件貼合體PA2之第一光學組件F11之面的相反側之面),以形成第三光學組件貼合體PA3。The second optical component bonding body PA2 and the second layer sheet F2m are pinched between the bonding rollers 23a, and are sent to the downstream side of the panel conveyance of the downstream conveyor 7. In the present embodiment, the second layer sheet F2m can be bonded to the surface on the display surface side of the liquid crystal panel P by the nip roller 23 (the first optical component F11 to which the second optical component bonding body PA2 is bonded) The opposite side of the face) to form the third optical component bonding body PA3.

第二檢測裝置42係設置於第二貼合裝置17的面板搬送下游側。第二檢測裝置42係檢測出液晶面板P與第二層片F2m之貼合面(以下,稱為第二貼合面)的端緣。第二檢測裝置42所檢測出的端緣資料係儲存於圖中未顯示之記憶部。The second detecting device 42 is provided on the downstream side of the panel conveyance of the second bonding device 17. The second detecting device 42 detects the edge of the bonding surface of the liquid crystal panel P and the second layer sheet F2m (hereinafter referred to as the second bonding surface). The edge data detected by the second detecting device 42 is stored in a memory portion not shown in the drawing.

第二層片F2m之切斷位置係根據第二貼合面端緣之檢測結果來調整。控制部40(參考第15圖)係取得儲存於記憶部的第二貼合面端緣之資料,以決定第二層片F2m之切斷位置,使第二光學組件F12不會超出液晶面板P外側(第二貼合面外側)的大小。第二切斷裝置32係於控制部40所決定之切斷位置將第二層片F2m切斷。The cutting position of the second layer F2m is adjusted according to the detection result of the edge of the second bonding surface. The control unit 40 (refer to FIG. 15) acquires the data of the edge of the second bonding surface stored in the memory unit to determine the cutting position of the second layer F2m so that the second optical component F12 does not exceed the liquid crystal panel P. The size of the outer side (outside of the second bonding surface). The second cutting device 32 cuts the second layer sheet F2m at the cutting position determined by the control unit 40.

第二切斷裝置32係設置於第二檢測裝置42的面板搬送下游側。第二切斷裝置32係沿第二貼合面端緣進行雷射切斷,以將從第三光學組件貼合體PA3超出第二貼合面外側部分的第二層片F2m(第二層片F2m的剩餘部分)切斷,以形成對應於第二貼合面大小的光學組件(第二光學組件F12)。The second cutting device 32 is provided on the downstream side of the panel conveyance of the second detecting device 42. The second cutting device 32 performs laser cutting along the edge of the second bonding surface to extend the second layer F2m from the third optical component bonding body PA3 beyond the outer portion of the second bonding surface (second layer film) The remaining portion of F2m is cut to form an optical component (second optical component F12) corresponding to the size of the second bonding surface.

藉由第二切斷裝置32,從第三光學組件貼合體PA3將第二層片F2m之剩餘部分切斷,將第二光學組件F12貼合至液晶面板P之顯示面側之面,且將第一光學組件F11貼合至液晶面板P之背光側之面,以形成第四光學組件貼合體PA4(光學組件貼合體)。從第二層片F2m切斷後之剩餘部分係藉由圖式中省略之剝離裝置從液晶面板P剝離並進行回收。By the second cutting device 32, the remaining portion of the second layer F2m is cut from the third optical component bonding body PA3, and the second optical component F12 is bonded to the surface of the display surface side of the liquid crystal panel P, and The first optical component F11 is bonded to the surface of the backlight side of the liquid crystal panel P to form a fourth optical component bonding body PA4 (optical component bonding body). The remaining portion cut from the second layer sheet F2m is peeled off from the liquid crystal panel P by the peeling device omitted in the drawing and recovered.

此處,第一切斷裝置31及第二切斷裝置32係由上述雷射光照射裝置100所構成。第一切斷裝置31及第二切斷裝置32係沿貼合面之外周緣不間斷地切斷貼合至液晶面板P的層片FXm。Here, the first cutting device 31 and the second cutting device 32 are constituted by the above-described laser light irradiation device 100. The first cutting device 31 and the second cutting device 32 cut the layer sheet FXm bonded to the liquid crystal panel P without interruption along the outer periphery of the bonding surface.

於第二貼合裝置17的面板搬送下游側處,設置有圖式中省略的貼合檢查裝置。貼合檢查裝置係對貼合有薄膜之加工件(液晶面板P)以圖式中省略之檢查裝置進行檢查(判斷光學組件F1X之位置是否適當(位置偏差是否在公差範圍內)等檢查)。相對液晶面板P之光學組件F1X的位置被判斷為不正確的加工件,便透過圖中未顯示之排除部而送出系統外。A bonding inspection device omitted in the drawings is provided on the downstream side of the panel conveyance of the second bonding apparatus 17. The bonding inspection device inspects the workpiece to which the film is bonded (the liquid crystal panel P) by an inspection device omitted in the drawing (determines whether the position of the optical component F1X is appropriate (whether the positional deviation is within the tolerance range) or the like). When the position of the optical module F1X of the liquid crystal panel P is judged to be an incorrect workpiece, it is sent out of the system through the exclusion portion not shown in the drawing.

另外,於本實施形態中,作為對薄膜貼合系統1之各部位進行整體控制的電子控制裝置之控制部40係包含於電腦系統。該電腦系統具備CPU等運算處理部、與記憶體或硬碟等記憶部。Further, in the present embodiment, the control unit 40 as an electronic control unit that integrally controls each part of the film bonding system 1 is included in a computer system. The computer system includes an arithmetic processing unit such as a CPU, and a memory unit such as a memory or a hard disk.

本實施形態之控制部40係包含可與電腦系統外部裝置進行通訊的介面。於控制部40處,可連接有能輸入輸入訊號的輸入裝置。上述之輸入裝置係包含:鍵盤、滑鼠等輸入機器,或者可從電腦系統外部裝置輸入資料之通訊裝置等。控制部40亦可包含顯示薄膜貼合系統1之各部位動作狀況的液晶顯示器等顯示裝置,亦可與顯示裝置相連接。The control unit 40 of the present embodiment includes an interface that can communicate with an external device of the computer system. An input device capable of inputting an input signal can be connected to the control unit 40. The above input device includes an input device such as a keyboard or a mouse, or a communication device that can input data from an external device of the computer system. The control unit 40 may include a display device such as a liquid crystal display that displays the operation state of each part of the film bonding system 1, and may be connected to the display device.

控制部40之記憶部處安裝有控制電腦系統的操作系統(OS)。於控制部40之記憶部處,透過於運算處理部控制薄膜貼合系統1之各部位,儲存有執行將光學組件層FX精確地搬送至薄膜貼合系統1之各部位用之處理的程式。包含儲存於記憶部之程式的各種資訊可由控制部40之運算處理部進行讀取。控制部40亦可包含執行薄膜貼合系統1之各部位控制所需之各種處理的特定應用積體電路(ASIC)等邏輯迴路。An operating system (OS) for controlling the computer system is installed in the memory unit of the control unit 40. At the memory unit of the control unit 40, the arithmetic processing unit controls each part of the film bonding system 1 to store a program for executing the process of accurately transporting the optical unit layer FX to each part of the film bonding system 1. Various pieces of information including a program stored in the memory unit can be read by the arithmetic processing unit of the control unit 40. The control unit 40 may include a logic circuit such as an application specific integrated circuit (ASIC) that performs various processes required for controlling the respective parts of the film bonding system 1.

記憶部係包含:隨機存取記憶體(RAM, Random Access Memory)、唯讀記憶體(ROM, Read Only Memory)等半導體記憶體,或硬碟、CD-ROM讀取裝置、圓盤型記憶媒體等外部儲存裝置等的概念。就功能性而言,記憶部設定有:儲存可寫入有第一吸附裝置11、第一集塵裝置12、第一貼合裝置13、第一檢測裝置41、第一切斷裝置31、反轉裝置15、第二吸附裝置20、第二集塵裝置16、第二貼合裝置17、第二檢測裝置42動作之控制順序之程式軟體的記憶區域;及其它各種記憶區域。The memory unit includes a semiconductor memory such as a random access memory (RAM), a read only memory (ROM), or a hard disk, a CD-ROM reading device, or a disk type memory medium. The concept of an external storage device, etc. In terms of functionality, the memory unit is configured to: store the first adsorption device 11, the first dust collection device 12, the first bonding device 13, the first detection device 41, the first cutting device 31, and the reverse The memory area of the program software of the control sequence of the operation of the rotating device 15, the second adsorption device 20, the second dust collecting device 16, the second bonding device 17, and the second detecting device 42; and other various memory regions.

以下,參考第22圖,說明相對液晶面板P之層片FXm的貼合位置(相對貼合位置)決定方法之一例。Hereinafter, an example of a method of determining the bonding position (relative bonding position) of the layer sheet FXm of the liquid crystal panel P will be described with reference to FIG.

首先,如第22(a)圖所示,於光學組件層FX之寬度方向上設定有複數個檢查點CP,於各檢查點CP處檢測出光學組件層FX之光軸方向。檢測光軸的時點可為料捲滾筒R1製造時,亦可為從料捲滾筒R1捲出光學組件層FX進行半切斷前之期間。光學組件層FX之光軸方向的資料係與光學組件層FX位置(光學組件層FX之長邊方向位置及寬度方向位置)資料連結般地儲存於圖式中省略之記憶裝置。First, as shown in Fig. 22(a), a plurality of checkpoints CP are set in the width direction of the optical component layer FX, and the optical axis direction of the optical component layer FX is detected at each checkpoint CP. The time at which the optical axis is detected may be the time when the roll drum R1 is manufactured, or may be the period before the half of the optical unit layer FX is unwound from the roll drum R1. The data in the optical axis direction of the optical component layer FX is stored in a memory device omitted from the drawing, in the same manner as the position of the optical component layer FX (the position in the longitudinal direction and the width direction of the optical component layer FX).

控制部40係從記憶裝置取得各檢查點CP之光軸資料(光軸面內分佈之檢查資料),以檢測出切割出層片FXm之部分的光學組件層FX(以橫切線CL所劃分之區域)之平均光軸方向。The control unit 40 acquires the optical axis data (inspection data distributed in the in-plane of the optical axis) of each of the inspection points CP from the memory device to detect the optical component layer FX (which is divided by the transverse line CL) of the portion in which the slice FXm is cut out. The average optical axis direction of the area).

例如第22(b)圖所示,每次於檢查點CP檢測出光軸方向與光學組件層FX之邊緣線EL所夾角度(偏移角),以偏移角中最大角度(最大偏移角)作為θmax,最小角度(最小偏移角)作為θmin時,檢測出最大偏移角θmax與最小偏移角θmin的平均值θmid(=(θmax+θmin)/2)作為平均偏移角。且,檢測出相對光學組件層FX之邊緣線EL的平均偏移角θmid方向作為光學組件層FX之平均光軸方向。另外,偏移角係例如以相對光學組件層FX之邊緣線EL,逆時針方向為正角度,順時針方向為負角度而加以算出。For example, as shown in FIG. 22(b), the angle (offset angle) between the optical axis direction and the edge line EL of the optical component layer FX is detected at the checkpoint CP each time, and the maximum angle (maximum offset angle) among the offset angles is obtained. When θmax and the minimum angle (minimum offset angle) are θmin, the average value θmid (=(θmax+θmin)/2) of the maximum offset angle θmax and the minimum offset angle θmin is detected as the average offset angle. Further, the average offset angle θmid direction of the edge line EL with respect to the optical component layer FX is detected as the average optical axis direction of the optical component layer FX. Further, the offset angle is calculated, for example, by the edge line EL of the optical component layer FX, the counterclockwise direction being a positive angle, and the clockwise direction being a negative angle.

且,依上述方法所檢測出之光學組件層FX的平均光軸方向係相對液晶面板P之顯示區域P4的長邊或短邊呈期望角度地,決定相對液晶面板P之層片FXm的貼合位置(相對貼合位置)。例如,根據設計規格將光學組件F1X之光軸方向設定為相對顯示區域P4的長邊或短邊呈90°之方向的情況中,光學組件層FX之平均光軸方向係相對顯示區域P4的長邊或短邊呈90°地,將層片FXm貼合液晶面板P。Further, the average optical axis direction of the optical component layer FX detected by the above method is at a desired angle with respect to the long side or the short side of the display region P4 of the liquid crystal panel P, and the bonding of the layer FXm with respect to the liquid crystal panel P is determined. Position (relative fit position). For example, in the case where the optical axis direction of the optical component F1X is set to be 90° with respect to the long side or the short side of the display region P4 according to the design specification, the average optical axis direction of the optical component layer FX is longer than the display region P4. The layer FXm is bonded to the liquid crystal panel P with the side or the short side at 90°.

前述之切斷裝置(第一切斷裝置31及第二切斷裝置32)係以攝影機等檢測機構檢測出液晶面板P之顯示區域P4外周緣,沿貼合面外周緣不間斷地切斷貼合至液晶面板P之層片FXm。透過拍攝貼合面之端緣,以檢測出貼合面外周緣。 本實施形態中,係沿貼合面外周緣以各切斷裝置(第一切斷裝置31及第二切斷裝置32)進行雷射切斷。The cutting device (the first cutting device 31 and the second cutting device 32) detects the outer peripheral edge of the display region P4 of the liquid crystal panel P by a detecting mechanism such as a camera, and cuts the patch continuously along the outer periphery of the bonding surface. The layer FXm of the liquid crystal panel P is joined. The outer edge of the bonding surface is detected by photographing the edge of the bonding surface. In the present embodiment, the laser cutting is performed by the respective cutting devices (the first cutting device 31 and the second cutting device 32) along the outer periphery of the bonding surface.

雷射加工機之切斷線的振動幅度(公差)較切斷刀片的振動幅度(公差)更小。因此,於本實施形態中,與使用切斷刀片切斷光學組件層FX的情況相比,可更容易沿貼合面外周緣進行切斷,可達成液晶面板P之小型化及(或)顯示區域P4之大型化。這可有效地適用於近年來之智慧型手機或平板型終端機等,需要在機殼尺寸之限制下將顯示畫面放大的高機能行動裝置。The vibration amplitude (tolerance) of the cutting line of the laser processing machine is smaller than the vibration amplitude (tolerance) of the cutting blade. Therefore, in the present embodiment, it is easier to cut along the outer periphery of the bonding surface than in the case where the optical module layer FX is cut by the cutting blade, and the liquid crystal panel P can be downsized and/or displayed. The size of the area P4 is large. This can be effectively applied to a high-performance mobile device that requires a display screen to be enlarged under the limitation of the size of the casing, such as a smart phone or a tablet terminal in recent years.

又,對將光學組件層FX整合至液晶面板P之顯示區域P4的層片進行切斷後,再貼合至液晶面板P的情況中,層片及液晶面板P各自的尺寸公差、以及該等之相對貼合位置的尺寸公差會疊加。因此,使得液晶面板P之邊框部G的寬度難以變窄(使得顯示區域難以擴大)。Moreover, in the case where the layer on which the optical component layer FX is integrated in the display region P4 of the liquid crystal panel P is cut and then bonded to the liquid crystal panel P, the dimensional tolerances of the layer and the liquid crystal panel P, and the like The dimensional tolerances of the relative fit positions are superimposed. Therefore, it is difficult to narrow the width of the frame portion G of the liquid crystal panel P (so that the display region is difficult to expand).

另一方面,從光學組件層FX切割出尺寸超出液晶面板P外側的光學組件層FX之層片FXm,將該切割出之層片FXm貼合至液晶面板P之後,依據貼合面進行切割的情況中,僅須考慮切斷線之振動公差,而可縮小邊框部G之寬度的公差(±0.1mm以下)。此點亦可使得液晶面板P之邊框部G的寬度變窄(可使得顯示區域擴大)。On the other hand, the layer FXm of the optical component layer FX having a size exceeding the outer side of the liquid crystal panel P is cut out from the optical component layer FX, and the cut layer FXm is bonded to the liquid crystal panel P, and then cut according to the bonding surface. In this case, it is only necessary to consider the vibration tolerance of the cutting line, and it is possible to reduce the tolerance of the width of the frame portion G (±0.1 mm or less). This also makes it possible to narrow the width of the frame portion G of the liquid crystal panel P (which can enlarge the display area).

再者,以非利刃之雷射來切斷層片FXm,故於切斷時不會對液晶面板P施加應力,使得液晶面板P之基板端緣處不易產生裂痕或破裂,可提高對於熱循環等的耐久性。同樣地,與液晶面板P為非接觸加工,故對電子部件安裝部P5之損傷亦較小。Further, since the layer FXm is cut by the laser of the non-profit blade, stress is not applied to the liquid crystal panel P at the time of cutting, so that cracks or cracks are less likely to occur at the edge of the substrate of the liquid crystal panel P, and the heat cycle and the like can be improved. Durability. Similarly, since the liquid crystal panel P is non-contact-processed, damage to the electronic component mounting portion P5 is also small.

第23圖係顯示使用第1圖所示之雷射光照射裝置100作為切斷裝置對層片FXm切斷成特定尺寸之光學組件F1X時,在層片FXm上以雷射光進行矩形掃瞄用之控制方法的示意圖。Fig. 23 is a view showing a rectangular scanning using laser light on the layer FXm when the laser light emitting device 100 shown in Fig. 1 is used as the cutting device to cut the layer FXm into a specific size optical module F1X. Schematic diagram of the control method.

另外,於第23圖中,符號Tr係表示雷射光之移動軌跡(特定軌跡。以下,稱為雷射光移動軌跡)。符號Tr1為台座101與掃瞄器105進行相對移動時之移動軌跡投影於層片FXm處的軌跡(以下,稱為光源移動軌跡)。光源移動軌跡Tr1為使得具矩形外形之雷射光移動軌跡Tr的4個角部呈彎曲的外形。符號K1係角部以外之直線區間,符號K2係角部之彎曲區間。符號Tr2係顯示掃瞄器105使光源移動軌跡Tr1上相對移動時,藉由第一照射位置調整裝置151及第二照射位置調整裝置154使雷射光照射位置於光源移動軌跡Tr1之正交方向的偏移程度(是否已經過調整)曲線(以下,稱為調整曲線)。雷射照射位置之偏差量(調整量)表示為光源移動軌跡Tr1之正交方向的調整曲線Tr2與雷射光移動軌跡Tr之間的距離。Further, in Fig. 23, the symbol Tr indicates the movement trajectory of the laser light (a specific trajectory. Hereinafter, it is referred to as a laser light trajectory). The symbol Tr1 is a trajectory (hereinafter, referred to as a light source movement trajectory) in which the movement trajectory when the pedestal 101 and the scanner 105 are relatively moved is projected on the layer FXm. The light source movement trajectory Tr1 is a curved shape in which four corner portions of the laser light trajectory Tr having a rectangular shape are curved. The symbol K1 is a straight section other than the corner, and the symbol K2 is a curved section of the corner. When the scanner Tr2 displays the scanner 105 to relatively move the light source movement trajectory Tr1, the first irradiation position adjusting means 151 and the second irradiation position adjusting means 154 cause the laser light irradiation position to be orthogonal to the light source movement trajectory Tr1. The degree of offset (whether it has been adjusted) curve (hereinafter referred to as the adjustment curve). The amount of deviation (adjustment amount) of the laser irradiation position is expressed as the distance between the adjustment curve Tr2 of the orthogonal direction of the light source movement trajectory Tr1 and the laser light movement trajectory Tr.

如第23圖所示,光源移動軌跡Tr1係讓角部呈彎曲的矩形之移動軌跡。光源移動軌跡Tr1與雷射光移動軌跡Tr係概略一致,僅角部狹窄區域處的兩者外形相異。光源移動軌跡Tr1為矩形外形時,矩形角部處的掃瞄器105移動速度會變緩,角部可能因雷射光熱量而呈膨脹或波浪形。因此,第23圖中,讓光源移動軌跡Tr1之角部呈彎曲,並使掃瞄器105之移動速度於光源移動軌跡Tr1整體約略為常數。As shown in Fig. 23, the light source moving locus Tr1 is a moving locus of a rectangular shape in which the corner portion is curved. The light source movement trajectory Tr1 and the laser light movement trajectory Tr are substantially identical, and only the shape of the narrow portion at the corner portion is different. When the light source movement trajectory Tr1 has a rectangular outer shape, the scanning speed of the scanner 105 at the rectangular corner portion becomes slow, and the corner portion may be expanded or undulated due to the heat of the laser light. Therefore, in Fig. 23, the corner portion of the light source moving locus Tr1 is curved, and the moving speed of the scanner 105 is approximately constant as a whole of the light source moving locus Tr1.

控制裝置107使掃瞄器105在直線區間K1移動時,由於光源移動軌跡Tr1與雷射光移動軌跡Tr係一致,所以不藉由第一照射位置調整裝置151及第二照射位置調整裝置154來調整雷射光照射位置,而直接將雷射光從掃瞄器105照射至層片FXm。另一方面,掃瞄器105在彎曲區間K2移動時,由於光源移動軌跡Tr1與雷射光移動軌跡Tr不一致,所以係藉由第一照射位置調整裝置151及第二照射位置調整裝置154來控制雷射光照射位置,而使雷射光照射位置會落於雷射光移動軌跡Tr上。例如,掃瞄器105移動到以符號M1表示之位置時,係藉由第一照射位置調整裝置151及第二照射位置調整裝置154,使雷射光照射位置於光源移動軌跡Tr1之正交方向N1上偏移了距離W1處。距離W1係與光源移動軌跡Tr1之正交方向N1上調整曲線Tr2和雷射光移動軌跡Tr之距離W2相同。光源移動軌跡Tr1雖配置於雷射光移動軌跡Tr內側,但可藉由第一照射位置調整裝置151及第二照射位置調整裝置154使雷射光照射位置偏移至雷射光移動軌跡Tr外側,故抵銷該等偏差而使雷射光照射位置配置於雷射光移動軌跡Tr上。When the scanner 105 moves the scanner 105 in the linear section K1, since the light source movement trajectory Tr1 and the laser light movement trajectory Tr are identical, the control unit 107 does not adjust by the first irradiation position adjustment device 151 and the second irradiation position adjustment device 154. The laser light illuminates the position and directly irradiates the laser light from the scanner 105 to the layer FXm. On the other hand, when the scanner 105 moves in the bending section K2, since the light source movement trajectory Tr1 does not coincide with the laser light movement trajectory Tr, the first irradiation position adjusting means 151 and the second irradiation position adjusting means 154 are used to control the lightning. The light irradiation position is such that the laser light irradiation position falls on the laser light moving track Tr. For example, when the scanner 105 moves to the position indicated by the symbol M1, the first irradiation position adjusting device 151 and the second irradiation position adjusting device 154 cause the laser light to be irradiated in the orthogonal direction N1 of the light source moving locus Tr1. The upper side is offset by the distance W1. The distance W2 between the adjustment curve Tr2 and the laser light moving locus Tr in the orthogonal direction N1 of the W1 system and the light source movement locus Tr1 is the same. The light source movement trajectory Tr1 is disposed inside the laser light movement trajectory Tr, but the first irradiation position adjustment device 151 and the second irradiation position adjustment device 154 can shift the laser light irradiation position to the outside of the laser light movement trajectory Tr, so that These deviations are pinned so that the laser light irradiation position is placed on the laser light trajectory Tr.

如上述,控制裝置107係一邊由掃瞄器105使雷射光偏向,並沿著雷射光加工線WCL讓掃瞄器105與台座101進行相對移動,藉以於雷射光加工線WCL上,複數次地重疊雷射光而形成受照射之重疊部分Up。控制裝置107使掃瞄器105在直線區間K1移動時,掃瞄器105係朝向雷射光移動軌跡TR外側而使雷射光偏向。另一方面,掃瞄器105在彎曲區間K2移動時,掃瞄器105係朝向調整曲線TR2外側而使雷射光偏向。As described above, the control device 107 deflects the laser light by the scanner 105, and causes the scanner 105 to move relative to the pedestal 101 along the laser beam processing line WCL, whereby the laser light processing line WCL is applied plural times. The laser beam is superimposed to form an illuminated overlapping portion Up. When the control device 107 moves the scanner 105 in the linear section K1, the scanner 105 deflects the laser light toward the outside of the laser light trajectory TR. On the other hand, when the scanner 105 moves in the bending section K2, the scanner 105 is directed outward of the adjustment curve TR2 to deflect the laser light.

如以上說明,根據本實施形態之薄膜貼合系統1,第一切斷裝置31及第二切斷裝置32係由上述雷射光照射裝置所構成。因此,可銳利地切斷層片(第一層片F1m及第二層片F2m),可抑制切割品質低落問題。As described above, according to the film bonding system 1 of the present embodiment, the first cutting device 31 and the second cutting device 32 are constituted by the above-described laser beam irradiation device. Therefore, the layer sheets (the first layer sheet F1m and the second layer sheet F2m) can be sharply cut, and the problem of low cutting quality can be suppressed.

又,透過控制裝置107之控制,可控制移動裝置106與掃瞄器105,用以在層片FXm處描繪出所需雷射光移動軌跡Tr。於該結構中,藉由第一照射位置調整裝置151及第二照射位置調整裝置154所調整之雷射光照射區間係僅在狹窄之彎曲區間K2處。此外較寬的直線區間K1則利用移動裝置106藉由台座101之移動,以雷射光在層片FXm上進行掃瞄。本實施形態中,主要藉由移動裝置106來進行雷射光掃瞄,第一照射位置調整裝置151及第二照射位置調整裝置154僅用於調整移動裝置106所無法良好控制精度之雷射光照射位置的區域。因此,與只以移動裝置106或只以掃瞄器105進行雷射光掃瞄的情況相比,能於廣範圍內以良好精度控制雷射光照射位置。Further, by the control of the control device 107, the mobile device 106 and the scanner 105 can be controlled to draw the desired laser light trajectory Tr at the layer FXm. In this configuration, the laser light irradiation section adjusted by the first irradiation position adjusting device 151 and the second irradiation position adjusting device 154 is only at the narrow bending section K2. In addition, the wider linear section K1 is scanned by the moving device 106 by the pedestal 101 to scan the layer FXm with laser light. In the present embodiment, the laser beam scanning is mainly performed by the mobile device 106, and the first irradiation position adjusting device 151 and the second irradiation position adjusting device 154 are only used to adjust the laser light irradiation position at which the mobile device 106 cannot control the precision. Area. Therefore, the laser light irradiation position can be controlled with good precision over a wide range as compared with the case where the laser scanning is performed only by the mobile device 106 or only the scanner 105.

又,攝影裝置43之攝影方向相對第一貼合面SA1法線方向呈傾斜交叉。即,攝影裝置43之攝影方向設定為使第二基板P2之端緣不會進入攝影裝置43之拍攝視野內。因此,當穿透第一層片F1m,而對第一貼合面SA1之端緣ED進行檢測時,將不會誤檢測到第二基板P2之端緣,可只檢測出第一貼合面SA1之端緣ED。所以,可精確地檢測出第一貼合面SA1之端緣ED。Further, the photographing direction of the photographing device 43 is obliquely intersected with respect to the normal direction of the first bonding surface SA1. That is, the photographing direction of the photographing device 43 is set such that the end edge of the second substrate P2 does not enter the photographing field of view of the photographing device 43. Therefore, when the first layer F1m is penetrated and the edge ED of the first bonding surface SA1 is detected, the edge of the second substrate P2 is not erroneously detected, and only the first bonding surface can be detected. The edge ED of SA1. Therefore, the edge ED of the first bonding surface SA1 can be accurately detected.

又,將尺寸超出液晶面板P外側之層片(第一層片F1m及第二層片F2m)各自貼合至液晶面板P後,切斷層片(第一層片F1m及第二層片F2m)的剩餘部分,可藉以在液晶面板P之面上形成對應於貼合面尺寸的光學組件(第一光學組件F11及第二光學組件F12)。藉此,可以良好精度設置光學組件(第一光學組件F11及第二光學組件F12)直至貼合面邊緣,可縮小顯示區域P4外側之邊框部G,並達成顯示區域之擴大及機器之小型化目的。Moreover, the layer sheets (the first layer sheet F1m and the second layer sheet F2m) having a size beyond the outer side of the liquid crystal panel P are bonded to the liquid crystal panel P, respectively, and the layer sheets are cut (the first layer sheet F1m and the second layer sheet F2m). The remaining portion can be formed on the surface of the liquid crystal panel P by optical components (the first optical component F11 and the second optical component F12) corresponding to the size of the bonding surface. Thereby, the optical components (the first optical component F11 and the second optical component F12) can be provided with good precision up to the edge of the bonding surface, and the frame portion G outside the display region P4 can be reduced, and the display region can be enlarged and the machine can be miniaturized. purpose.

又,將尺寸超出顯示區域P4外側的層片(第一層片F1m及第二層片F2m)貼合至液晶面板P,即使是其光軸方向因層片(第一層片F1m及第二層片F2m)的位置而改變的情況,可配合該光軸方向來校準液晶面板P並進行貼合。藉此,可改善相對液晶面板P之光學組件(第一光學組件F11及第二光學組件F12)的光軸方向之精度,可提高光學顯示設備之色彩度及對比。Further, the layer sheets (the first layer sheet F1m and the second layer sheet F2m) having a size beyond the outside of the display region P4 are bonded to the liquid crystal panel P, even if the optical axis direction is due to the layer sheet (the first layer sheet F1m and the second layer) When the position of the layer F2m) is changed, the liquid crystal panel P can be aligned and bonded in accordance with the direction of the optical axis. Thereby, the accuracy of the optical axis direction of the optical components (the first optical component F11 and the second optical component F12) with respect to the liquid crystal panel P can be improved, and the color degree and contrast of the optical display device can be improved.

又,切斷裝置(第一切斷裝置31及第二切斷裝置32)以雷射切斷層片(第一層片F1m及第二層片F2m)的情況,與使用利刃來切斷層片(第一層片F1m及第二層片F2m)的情況相比,不會對液晶面板P施加應力,因此難以產生裂痕或破裂,可獲得液晶面板P的安定性和耐久性。Further, in the case where the cutting device (the first cutting device 31 and the second cutting device 32) cuts the layer sheets (the first layer sheet F1m and the second layer sheet F2m) by laser, the layer is cut by using a sharp edge ( In the case of the first layer sheet F1m and the second layer sheet F2m), stress is not applied to the liquid crystal panel P, so that cracks or cracks are less likely to occur, and the stability and durability of the liquid crystal panel P can be obtained.

另外,於本實施形態中,將雷射光照射至對象物體並進行特定加工之結構,雖例舉有將層片切斷之結構來說明,但並不限定於此。亦可例如為,將層片分割成至少二個、以裂口貫穿層片、或於層片形成指定深度之溝部(切割)等的結構。更具體而言,有例如層片端部之切斷(切削)、半切斷、標示加工等。Further, in the present embodiment, the configuration in which the laser beam is irradiated onto the target object and the specific processing is performed is described as a configuration in which the layer sheet is cut, but the invention is not limited thereto. For example, the layer may be divided into at least two layers, a layer that penetrates the layer by a slit, or a groove portion (cut) formed at a predetermined depth in the layer. More specifically, there are, for example, cutting (cutting), half cutting, marking processing, and the like of the end portions of the plies.

又,於本實施形態中,雖例舉有雷射光照射裝置所照射之雷射光描繪軌跡在平面視圖中呈矩形外形(正方形)的情況來說明,但並不限定於此。例如,雷射光照射裝置所照射之雷射光描繪軌跡在平面視圖中可呈三角形外形,在平面視圖中亦可呈五角形以上之多角形外形。又,不限定於此,平面視圖中亦可為星型外形、幾何外形等。該等描繪軌跡均可適用於本發明。Further, in the present embodiment, the case where the laser light drawing trajectory irradiated by the laser beam irradiation device has a rectangular outer shape (square shape) in plan view is described, but the present invention is not limited thereto. For example, the laser light trajectory illuminated by the laser light irradiation device may have a triangular shape in plan view, and may also have a polygonal shape above a pentagon shape in plan view. Further, the present invention is not limited thereto, and the star shape, the geometric shape, and the like may be used in the plan view. These depicted traces can be adapted to the present invention.

又,於本實施形態中,雖例舉出從料捲滾筒將光學組件層FX捲出,將尺寸超出液晶面板P外側之層片FXm貼合至液晶面板P後,從層片FXm切割出對應於液晶面板P之貼合面大小的光學組件F1X情況來說明,但並不限定於此。例如,不使用料捲滾筒,而將切割出超出液晶面板P外側尺寸的單片狀光學薄膜切片貼合至液晶面板的情況亦可適用於本發明。Further, in the present embodiment, the optical component layer FX is unwound from the roll drum, and the layer FXm having a size beyond the outer side of the liquid crystal panel P is bonded to the liquid crystal panel P, and the corresponding layer is cut out from the layer FXm. The optical module F1X of the size of the bonding surface of the liquid crystal panel P is described, but is not limited thereto. For example, a case where a single-piece optical film slice cut out beyond the outer dimension of the liquid crystal panel P is bonded to the liquid crystal panel without using a roll cylinder can also be applied to the present invention.

以上,參考所添附之圖式說明了本實施形態之適當實施形態例,但本發明並不限定於該等範例。上述範例所顯示之各構成組件的各外形或組合等僅為一例,在不脫離本發明主旨之範圍中,可根據設計要求等來進行各種變更。Although the preferred embodiments of the present embodiment have been described above with reference to the attached drawings, the present invention is not limited to the examples. The respective shapes, combinations, and the like of the respective components shown in the above examples are merely examples, and various modifications can be made according to design requirements and the like without departing from the gist of the invention.

1...薄膜貼合系統1. . . Film bonding system

5...滾筒輸送機5. . . Roller conveyor

6...上游側輸送機6. . . Upstream conveyor

7...下游側輸送機7. . . Downstream conveyor

11...第一吸附裝置11. . . First adsorption device

11a...面板保持部11a. . . Panel holding unit

11b...校準攝影機11b. . . Calibration camera

12...第一集塵裝置12. . . First dust collecting device

13...第一貼合裝置13. . . First bonding device

15...反轉裝置15. . . Reversing device

15c...校準攝影機15c. . . Calibration camera

16...第二集塵裝置16. . . Second dust collecting device

17...第二貼合裝置17. . . Second bonding device

20...第二吸附裝置20. . . Second adsorption device

22...搬送裝置twenty two. . . Transport device

22a...滾筒保持部22a. . . Roller holder

22b...導引滾筒22b. . . Guide roller

22c...切斷裝置22c. . . Cutting device

22d...刀刃22d. . . Blade

22e...捲取部22e. . . Coiling department

23...夾壓滾筒twenty three. . . Clamping roller

23a...貼合滾筒23a. . . Fitting roller

24...自由滾筒輸送機twenty four. . . Free roller conveyor

26...吸附盤26. . . Adsorption plate

31...第一切斷裝置31. . . First cutting device

32...第二切斷裝置32. . . Second cutting device

40...控制部40. . . Control department

41...第一檢測裝置41. . . First detecting device

42...第二檢測裝置42. . . Second detecting device

43...攝影裝置43. . . Photography device

43a...拍攝面43a. . . Shooting surface

44...照明光源44. . . Illumination source

100...雷射光照射裝置100. . . Laser light irradiation device

101...台座101. . . Pedestal

101s...保持面101s. . . Keep face

101s1...第一保持面101s1. . . First holding surface

101s2...第二保持面101s2. . . Second holding surface

102...雷射振盪器102. . . Laser oscillator

103...聲光元件103. . . Acousto-optic component

104...成像光學滑軌104. . . Imaging optical slide

105...掃瞄器105. . . Scanner

105s...掃瞄區域105s. . . Scanning area

106...移動裝置106. . . Mobile device

107...控制裝置107. . . Control device

108...第二聚光透鏡108. . . Second concentrating lens

109...輸入裝置109. . . Input device

110...對象物體110. . . Object object

130...電子束成型130. . . Electron beam forming

131...驅動器131. . . driver

141...第一聚光透鏡141. . . First collecting lens

142...第一保持框142. . . First holding frame

143...光圈組件143. . . Aperture assembly

143h...針孔143h. . . Pinhole

144...保持組件144. . . Holding component

145...準直透鏡145. . . Collimating lens

146...第二保持框146. . . Second holding frame

147...移動機構147. . . Mobile agency

148...滑件機構148. . . Sliding mechanism

149...保持台149. . . Keep the table

151...第一照射位置調整裝置151. . . First illumination position adjusting device

152,155...鏡152,155. . . mirror

153,156...致動器153,156. . . Actuator

154...第二照射位置調整裝置154. . . Second irradiation position adjusting device

161...第一滑件機構161. . . First slider mechanism

162...第二滑件機構162. . . Second slider mechanism

171...雷射控制部171. . . Laser control department

172...掃瞄器控制部172. . . Scanner control unit

173...滑件控制部173. . . Slider control unit

AR1...使用部分AR1. . . Use part

AR2...剩餘部分AR2. . . The remaining part

CA...檢查區域CA. . . Inspection area

C...光軸C. . . Optical axis

CL...橫切線CL. . . Transverse line

CP...檢查點CP. . . checking point

ED...端緣ED. . . End edge

EL...邊緣線EL. . . Edge line

F1X...光學組件F1X. . . Optical component

F1...第一光學組件層F1. . . First optical component layer

F11...第一光學組件F11. . . First optical component

F12...第二光學組件F12. . . Second optical component

F1a...光學組件本體F1a. . . Optical component body

F1m...第一層片F1m. . . First layer

F2...第二光學組件層F2. . . Second optical component layer

F2a...黏著層F2a. . . Adhesive layer

F2m...第二層片F2m. . . Second layer

F3a...分離層片F3a. . . Separation layer

F4a...表面保護薄膜F4a. . . Surface protection film

F5...貼合層片F5. . . Fitting layer

F6...偏光鏡F6. . . Polarizer

F7...第一薄膜F7. . . First film

F8...第二薄膜F8. . . Second film

FX...光學組件層FX. . . Optical component layer

FXm...層片FXm. . . Layer

G...邊框部G. . . Border part

G1...上升部分G1. . . Rising part

G2...下降部分G2. . . Falling part

H...高度H. . . height

K...鏈線包圍部分K. . . Chain line surrounding part

K1...直線區間K1. . . Straight line interval

K2...彎曲區間K2. . . Bending interval

L...雷射光L. . . laser

L1,L2...切割線L1, L2. . . Cutting line

M1...符號M1. . . symbol

N1...正交方向N1. . . Orthogonal direction

P...液晶面板P. . . LCD panel

P1...第一基板P1. . . First substrate

P2...第二基板P2. . . Second substrate

P3...液晶層P3. . . Liquid crystal layer

P4...顯示區域P4. . . Display area

PA1...第一光學組件貼合體PA1. . . First optical component bonding body

PA2...第二光學組件貼合體PA2. . . Second optical component bonding body

PA3...第三光學組件貼合體PA3. . . Third optical component bonding body

PA4...第四光學組件貼合體PA4. . . Fourth optical component bonding body

PL1,PL2...集合脈衝PL1, PL2. . . Collection pulse

Ps1,Ps2,Ps3,Ps4...脈衝Ps1, Ps2, Ps3, Ps4. . . pulse

R...軌道R. . . track

R1...料捲滾筒R1. . . Roll roller

R2...分離滾筒R2. . . Separation roller

S...止動器S. . . Stopper

SA1...第一貼合面SA1. . . First fit surface

Tr...雷射光移動軌跡Tr. . . Laser light trajectory

Tr1...光源移動軌跡Tr1. . . Light source movement track

Tr2...調整曲線Tr2. . . Adjustment curve

Ur,Ur1,Ur2...雷射光移動軌跡Ur, Ur1, Ur2. . . Laser light trajectory

Ur3,UrX...雷射光移動軌跡Ur3, UrX. . . Laser light trajectory

Us...相對移動軌跡Us. . . Relative movement track

Up,Up1,Up2,Up3...重疊部分Up, Up1, Up2, Up3. . . Overlapping part

Uw...寬度Uw. . . width

V1...谷部V1. . . Valley

V2...谷部V2. . . Valley

W1,W2...距離W1, W2. . . distance

WCL...雷射光加工線WCL. . . Laser light processing line

θ...傾斜角度θ. . . slope

θmax...最大偏移角Θmax. . . Maximum offset angle

θmin...最小偏移角Θmin. . . Minimum offset angle

θmid...平均偏移角Θmid. . . Average offset angle

第1圖係顯示本發明一實施形態之雷射光照射裝置的立體圖。 第2圖係顯示電子束成型(EBS, Electrical Beam Shaping)之結構的示意圖。 第3圖係顯示成像光學滑軌(IOR, Imaging Optics Rail)之內部結構的立體圖。 第4圖係顯示第一聚光透鏡,光圈組件及準直透鏡之配置結構的剖面圖。 第5圖係顯示雷射光照射裝置控制系統之結構的示意圖。 第6圖係EBS之作用的說明用圖。 第7圖係第6圖中針對雷射光之一個脈衝的示意圖。 第8圖係IOR之作用的說明用圖。 第9圖係雷射光加工線的示意圖。 第10圖係使用比較例之雷射光照射裝置,切斷對象物體時之雷射光移動軌跡的示意圖。 第11圖係使用本實施形態之雷射光照射裝置,切斷對象物體時之雷射光移動軌跡的示意圖。 第12圖係顯示本實施形態之雷射光移動軌跡之第一變形例的示意圖。 第13圖係顯示本實施形態之雷射光移動軌跡之第二變形例的示意圖。 第14圖係顯示本實施形態之雷射光移動軌跡之第三變形例的示意圖。 第15圖係顯示本發明一實施形態之光學組件貼合體之製造裝置的示意圖。 第16圖係液晶面板的平面圖。 第17圖係第16圖中A-A線的剖面圖。 第18圖係光學組件層的剖面圖。 第19圖係顯示切斷裝置之動作的示意圖。 第20圖係顯示貼合面端緣之檢測步驟的平面圖。 第21圖係檢測裝置的示意圖。 第22圖係顯示相對液晶面板之層片的貼合位置決定方法一例的示意圖。 第23圖係顯示以雷射光描來繪特定軌跡之控制方法的示意圖。Fig. 1 is a perspective view showing a laser beam irradiation apparatus according to an embodiment of the present invention. Fig. 2 is a schematic view showing the structure of an electron beam forming (EBS). Fig. 3 is a perspective view showing the internal structure of an imaging optical track (IOR, Imaging Optics Rail). Fig. 4 is a cross-sectional view showing the arrangement of the first collecting lens, the diaphragm assembly, and the collimator lens. Fig. 5 is a view showing the structure of a control system of a laser light irradiation device. Fig. 6 is a diagram for explaining the function of EBS. Figure 7 is a schematic diagram of a pulse for laser light in Figure 6. Fig. 8 is a diagram for explaining the action of the IOR. Figure 9 is a schematic diagram of a laser light processing line. Fig. 10 is a view showing a trajectory of laser light movement when a target object is cut using a laser light irradiation device of a comparative example. Fig. 11 is a schematic view showing a trajectory of laser light movement when a target object is cut by using the laser light irradiation device of the present embodiment. Fig. 12 is a view showing a first modification of the laser light trajectory of the embodiment. Fig. 13 is a view showing a second modification of the laser light trajectory of the embodiment. Fig. 14 is a view showing a third modification of the laser light trajectory of the embodiment. Fig. 15 is a schematic view showing a manufacturing apparatus of an optical component bonding body according to an embodiment of the present invention. Figure 16 is a plan view of a liquid crystal panel. Figure 17 is a cross-sectional view taken along line A-A of Figure 16. Figure 18 is a cross-sectional view of the optical component layer. Fig. 19 is a schematic view showing the operation of the cutting device. Figure 20 is a plan view showing the detecting step of the edge of the bonding surface. Figure 21 is a schematic view of the detecting device. Fig. 22 is a view showing an example of a method of determining the bonding position of the layer of the liquid crystal panel. Figure 23 is a schematic diagram showing a control method for drawing a specific trajectory by laser light.

100...雷射光照射裝置100. . . Laser light irradiation device

101...台座101. . . Pedestal

101s...保持面101s. . . Keep face

101s1...第一保持面101s1. . . First holding surface

101s2...第二保持面101s2. . . Second holding surface

102...雷射振盪器102. . . Laser oscillator

103...聲光元件103. . . Acousto-optic component

104...成像光學滑軌104. . . Imaging optical slide

105...掃瞄器105. . . Scanner

105s...掃瞄區域105s. . . Scanning area

106...移動裝置106. . . Mobile device

107...控制裝置107. . . Control device

108...第二聚光透鏡108. . . Second concentrating lens

110...對象物體110. . . Object object

151...第一照射位置調整裝置151. . . First illumination position adjusting device

152,155...鏡152,155. . . mirror

153,156...致動器153,156. . . Actuator

154...第二照射位置詷整裝置154. . . Second irradiation position adjusting device

161...第一滑件機構161. . . First slider mechanism

162...第二滑件機構162. . . Second slider mechanism

171...雷射控制部171. . . Laser control department

172...掃瞄器控制部172. . . Scanner control unit

173...滑件控制部173. . . Slider control unit

L...雷射光L. . . laser

Claims (6)

一種雷射光照射裝置,係包含: 台座,係具有保持對象物體之保持面; 雷射光震盪器,係震盪出雷射光; 掃瞄器,係以該雷射光在該保持面之平行平面內進行二維掃瞄; 移動裝置,係讓該台座與該掃瞄器進行相對移動;以及 控制裝置,係控制該掃瞄器與該移動裝置; 其中,該控制裝置係一邊由該掃瞄器使該雷射光偏向,並沿著雷射加工線讓該掃瞄器與該台座進行相對移動,藉以於該雷射加工線上,複數次地重疊該雷射光而形成受照射之重疊部分。A laser light irradiation device comprises: a pedestal having a holding surface for holding a target object; a laser light oscillating device for oscillating the laser light; and a scanner for performing the laser light in a parallel plane of the holding surface a scanning device; a moving device that moves the pedestal relative to the scanner; and a control device that controls the scanner and the mobile device; wherein the control device causes the ray to be caused by the scanner The light is deflected and the scanner is moved relative to the pedestal along the laser processing line, whereby the laser beam is superimposed on the laser processing line to form an illuminated overlapping portion. 如請求項1所述之雷射光照射裝置,其中該控制裝置係一邊由該掃瞄器使該雷射光迴轉,並沿著該雷射加工線讓該掃瞄器與該台座進行相對移動。The laser light irradiation device of claim 1, wherein the control device rotates the laser light by the scanner and moves the scanner relative to the pedestal along the laser processing line. 如請求項2所述之雷射光照射裝置,其中該掃瞄器係朝向該雷射加工線外側之剩餘部分而使該雷射光偏向。The laser light irradiation device of claim 2, wherein the scanner deflects the laser light toward a remaining portion of the outer side of the laser processing line. 如請求項1所述之雷射光照射裝置,其中該控制裝置係一邊由該掃瞄器使該雷射光沿該雷射加工線而直線振動,並沿著該雷射加工線讓該掃瞄器與該台座進行相對移動。The laser light irradiation device of claim 1, wherein the control device linearly vibrates the laser light along the laser processing line by the scanner, and causes the scanner along the laser processing line. Move relative to the pedestal. 如請求項1所述之雷射光照射裝置,其中更包含有聚光透鏡,係使得從該掃瞄器射出之雷射光朝向該保持面而聚光。The laser light irradiation device of claim 1, further comprising a collecting lens such that the laser light emitted from the scanner is concentrated toward the holding surface. 一種光學組件貼合體之製造裝置,係為將光學組件貼合至光學顯示部件以形成光學組件貼合體之製造裝置,該製造裝置係包含: 貼合裝置,係將較該光學顯示部件之顯示區域更大之光學組件層貼合至該光學顯示部件以形成貼合層片;以及 切斷裝置,係將該光學組件層中的顯示區域之對向部分與該對向部分外側之剩餘部分切斷,從該光學組件層切割出對應於該顯示區域大小之光學組件,藉以從該貼合層片切割出包含有該光學顯示部件及重疊於該光學顯示部件之光學組件的光學組件貼合體; 其中,該切斷裝置係由請求項1所述之雷射光照射裝置所構成,藉由從該雷射光照射裝置所照射之雷射光來將作為對象物體之光學組件層切斷。A manufacturing device for an optical component bonding body is a manufacturing device for bonding an optical component to an optical display component to form an optical component bonding body, the manufacturing device comprising: a bonding device for displaying a display area of the optical display component a larger optical component layer is attached to the optical display component to form a conforming layer; and a cutting device is used to cut the opposing portion of the display region in the optical component layer from the remaining portion of the opposite portion of the opposing portion Cutting an optical component corresponding to the size of the display area from the optical component layer, thereby cutting an optical component bonding body including the optical display component and the optical component overlapping the optical display component from the bonding layer; The cutting device is constituted by the laser beam irradiation device described in claim 1, and the optical component layer as the target object is cut by the laser light irradiated from the laser beam irradiation device.
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Family Cites Families (14)

* Cited by examiner, † Cited by third party
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TW436639B (en) * 1998-06-08 2001-05-28 Sanyo Electric Co Laser beam producing device
JP2003071581A (en) * 2001-08-30 2003-03-11 Central Glass Co Ltd Positioning method for resin film
JP2003107452A (en) * 2001-09-17 2003-04-09 Internatl Business Mach Corp <Ibm> Method of manufacturing liquid crystal display panel, method of manufacturing liquid crystal display device, and device for manufacturing the liquid crystal display device
US6706998B2 (en) * 2002-01-11 2004-03-16 Electro Scientific Industries, Inc. Simulated laser spot enlargement
CN1299873C (en) * 2002-01-11 2007-02-14 电子科学工业公司 Method for laser machining a workpiece with laser spot enlargement
JP2003255132A (en) 2002-03-05 2003-09-10 Sumitomo Chem Co Ltd Manufacturing method for optical film chip
JP4324340B2 (en) * 2002-03-20 2009-09-02 株式会社安川電機 Laser processing equipment
JP2004145544A (en) * 2002-10-23 2004-05-20 Sumitomo Heavy Ind Ltd Working planing method and device
KR100462358B1 (en) * 2004-03-31 2004-12-17 주식회사 이오테크닉스 Laser Processing Apparatus with Polygon Mirror
JP5553397B2 (en) * 2007-07-19 2014-07-16 日東電工株式会社 Laser processing method
JP2010194560A (en) * 2009-02-23 2010-09-09 Nisshinbo Holdings Inc Laser machining method of solar battery panel
KR101186245B1 (en) * 2010-05-26 2012-09-27 한국기계연구원 Laser processing system and laser processing method using the same
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