TW201418784A - Peak-valley pattern formed sheet and method for producing the same - Google Patents
Peak-valley pattern formed sheet and method for producing the same Download PDFInfo
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Abstract
Description
本發明係關於一種於光擴散體中所具備之凹凸圖案形成片及其製造方法。又,本發明係關於一種使用有凹凸圖案形成片之光擴散體。且本發明係關於一種作為用以製造於表面上形成有凹凸圖案之光擴散體之模具而使用的光擴散體製造用工程片原版。進而,本發明係關於一種光擴散體之製造方法。 The present invention relates to a concave-convex pattern forming sheet provided in a light diffusing body and a method of manufacturing the same. Further, the present invention relates to a light diffusing body using a concave-convex pattern forming sheet. Further, the present invention relates to an engineering sheet original for optical diffuser production which is used as a mold for producing a light diffuser having a concave-convex pattern formed on its surface. Further, the present invention relates to a method of producing a light diffuser.
本發明係關於一種用作光擴散片等之光學片及光擴散片。 The present invention relates to an optical sheet and a light diffusing sheet which are used as a light diffusion sheet or the like.
本發明係關於一種使來自光源之光擴散之擴散導光體。又,本發明係關於一種於液晶顯示裝置中所具備之背光單元。 The present invention relates to a diffusing light guide that diffuses light from a light source. Moreover, the present invention relates to a backlight unit provided in a liquid crystal display device.
本發明係關於一種於防反射體或相位差板等光學元件中所具備之凹凸圖案形成片及其製造方法。又,本發明係關於一種使用有凹凸圖案形成片之防反射體、相位差板。又,本發明係關於一種作為用以製造具有凹凸圖案之光學元件之模具而使用的光學元件製造用工程片。 The present invention relates to a concave-convex pattern forming sheet provided in an optical element such as an antireflection body or a phase difference plate, and a method of manufacturing the same. Moreover, the present invention relates to an antireflection body and a phase difference plate using a concave-convex pattern forming sheet. Moreover, the present invention relates to an engineering sheet for optical element manufacturing which is used as a mold for manufacturing an optical element having a concave-convex pattern.
本申請案根據2007年2月21日於日本申請之日本專利特願第2007-040694號、2007年6月7日於日本申請之日本專利特願第2007-151676號、2007年6月7日於日本申請之日本專利特願第2007-151677號、2007年6月7日於日本申請之日本專利特願第2007-151795號、以及2007年10月4日於日本申請之日本專利特願第2007-261176號而主張優先權,此處引用其中之內容。 The present application is based on Japanese Patent Application No. 2007-040694, filed on Feb. 21, 2007, and Japanese Patent Application No. 2007-151676, filed on Jun. 7, 2007, and on June 7, 2007. Japanese Patent Application No. 2007-151677, filed in Japan, Japanese Patent Application No. 2007-151795, filed on June 7, 2007, and Japanese Patent Application No. Priority is claimed on 2007-261176, the contents of which are incorporated herein by reference.
一般而言,於表面上形成有波狀凹凸圖案之凹凸圖案形成片被用作光擴散體。 In general, a concavo-convex pattern forming sheet having a corrugated concavo-convex pattern formed on a surface thereof is used as a light diffusing body.
例如,於專利文獻1中,揭示有如下光擴散體作為形成有凹凸圖案之光擴散體,亦即,於透光性基材之至少一面上形成有複數個突起體,突起體之高度為2~20μm,突起體之頂點之間隔為1~10μm,突起體之縱橫比為1以上。又,於專利文獻1中,揭示有如下方法作為突起體之形成方法,亦即,藉由KrF準分子雷射等能量束之照射來對透光性基材之表面進行加工。 For example, Patent Document 1 discloses a light diffuser as a light diffuser in which a concave-convex pattern is formed, that is, a plurality of protrusions are formed on at least one surface of a light-transmitting substrate, and the height of the protrusions is 2 ~20 μm, the interval between the apexes of the protrusions is 1 to 10 μm, and the aspect ratio of the protrusions is 1 or more. Further, Patent Document 1 discloses a method of forming a protrusion, that is, a surface of a light-transmitting substrate by irradiation with an energy beam such as a KrF excimer laser.
於專利文獻2中,揭示有於一面上形成有由波狀凹凸而構成之異向性擴散圖案之光擴散體。又,於專利文獻2中,揭示有如下方法作為形成異向性擴散圖案之方法,亦即,對感光性樹脂之薄膜照射雷射光而進行曝光、顯影,以形成在一面上形成有凹凸之主全息圖,將該主全息圖轉印至金屬模具上,並使用該金屬模具來使樹脂成形。 Patent Document 2 discloses a light diffusing body in which an anisotropic diffusion pattern composed of corrugated irregularities is formed on one surface. Further, Patent Document 2 discloses a method of forming an anisotropic diffusion pattern in which a film of a photosensitive resin is irradiated with laser light to be exposed and developed to form a main surface on which irregularities are formed. A hologram, the master hologram is transferred onto a metal mold, and the metal mold is used to shape the resin.
[專利文獻1]日本專利特開平10-123307號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 10-123307
[專利文獻2]日本專利特開2006-261064號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2006-261064
作為具有光擴散性等之光學片,已知於表面上形成有凹凸之片材。例如,於專利文獻3中,揭示有於基板表面上形成有大量點狀凸部之光擴散片。於專利文獻3所揭示之光學片中,藉由噴墨法將油墨噴出至基板上並使其固著,以形成點狀之凸部。 As an optical sheet having light diffusibility or the like, a sheet having irregularities formed on its surface is known. For example, Patent Document 3 discloses a light diffusion sheet in which a large number of dot-like convex portions are formed on a surface of a substrate. In the optical sheet disclosed in Patent Document 3, ink is ejected onto a substrate by an inkjet method and fixed to form a dot-like convex portion.
[專利文獻3]日本專利特開2004-157430號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2004-157430
已知由微細之波狀凹凸所組成之凹凸圖案形成於表面,且凹凸圖案之最頻間距為可見光之波長以下之凹凸圖案形成片可用作防反射體或相位差板等光學元件(參照非專利文獻1)。 It is known that a concavo-convex pattern composed of fine wavy irregularities is formed on the surface, and the concavo-convex pattern forming sheet having the most frequent pitch of the concave-convex pattern at a wavelength equal to or less than the wavelength of visible light can be used as an optical element such as an antireflection body or a phase difference plate (refer to Patent Document 1).
凹凸圖案形成片可用作防反射體之理由如下:當片表面上未設置有凹凸圖案時,會因片與空氣之界面上的折 射率之急遽變化而產生反射。然而,當在片表面,亦即片與空氣之界面上設置有波狀之凹凸圖案時,於凹凸圖案之部分,折射率之值呈現為空氣之折射率與凹凸圖案形成片之折射率之間的值(以下,稱為中間折射率),並且,該中間折射率向凹凸圖案之深度方向連續地變化。具體而言,位置越深,則越接近凹凸圖案形成片之折射率。因中間折射率如此般連續地變化,故不會引起如上所述之界面上之折射率的急遽變化,從而可抑制光之反射。又,若凹凸圖案之間距為可見光之波長以下,則於凹凸圖案部分,難以引起由可見光之繞射亦即可見光之干涉所產生之著色。 The reason why the concave-convex pattern forming sheet can be used as an anti-reflection body is as follows: when the concave-convex pattern is not provided on the surface of the sheet, the fold at the interface between the sheet and the air is obtained. The sudden change in the rate of incidence produces a reflection. However, when a wavy concave-convex pattern is provided on the surface of the sheet, that is, at the interface between the sheet and the air, the refractive index value is between the refractive index of the air and the refractive index of the concave-convex pattern forming sheet in the portion of the concave-convex pattern. The value (hereinafter referred to as an intermediate refractive index), and the intermediate refractive index continuously changes in the depth direction of the concave-convex pattern. Specifically, the deeper the position, the closer to the refractive index of the uneven pattern forming sheet. Since the intermediate refractive index changes continuously as described above, the sharp change in the refractive index at the interface as described above is not caused, and the reflection of light can be suppressed. Further, when the distance between the concave-convex patterns is equal to or less than the wavelength of visible light, it is difficult to cause coloring due to interference of visible light, that is, visible light, in the concave-convex pattern portion.
又,凹凸圖案形成片可用作相位差板之原因在於,於凹凸圖案之部分,折射率互不相同之空氣與凹凸圖案形成片交替配置,結果對光表現出光學異向性。進而,當凹凸圖案之間距與可見光之波長為相同程度或者為可見光之波長以下時,會呈現出在較廣之可見光波長區域內顯示相同相位差之現象。 Moreover, the reason why the uneven pattern forming sheet can be used as the phase difference plate is that the air having the refractive indices different from each other is alternately arranged in the concave-convex pattern, and as a result, the optical anisotropy is exhibited to the light. Further, when the distance between the concave-convex patterns is the same as the wavelength of visible light or below the wavelength of visible light, the phenomenon of displaying the same phase difference in a wide visible light wavelength region appears.
作為上述凹凸圖案形成片之具體例,例如於非專利文獻2中提出一種片,對已加熱之由聚二甲基矽氧烷構成之片之一面蒸鍍金而形成金屬層,其後進行冷卻,藉此使由聚二甲基矽氧烷構成之片收縮,以於金屬層之表面上形成波狀之凹凸圖案。 As a specific example of the uneven pattern forming sheet, for example, Non-Patent Document 2 proposes a sheet in which a metal layer is formed by vapor-depositing a surface of a piece of heated polydimethyl siloxane to be cooled, and then cooled. Thereby, the sheet composed of polydimethyl siloxane is shrunk to form a wavy concave-convex pattern on the surface of the metal layer.
又,於專利文獻4中提出一種片,於熱收縮性合成樹脂薄膜之表面上,依次形成基底層及金屬層,其後使熱收縮性合成樹脂薄膜熱收縮,以於金屬層之表面上形成波狀之凹凸圖案。 Further, Patent Document 4 proposes a sheet in which a base layer and a metal layer are sequentially formed on the surface of a heat-shrinkable synthetic resin film, and then the heat-shrinkable synthetic resin film is heat-shrinked to form on the surface of the metal layer. Wavy embossed pattern.
於專利文獻5中提出一種片,形成由因曝光處理而體積收縮之材料所構成之層,並對該層進行曝光處理,以使表面形成凹凸。 Patent Document 5 proposes a sheet in which a layer composed of a material which is volume-contracted by exposure processing is formed, and the layer is subjected to exposure treatment to form irregularities on the surface.
然而,專利文獻4、5及非專利文獻2中揭示之凹凸圖案形成片之任一者,均未顯示出作為光學元件之優異性能。具體而言,當用作防反射體時,無法使反射率充分地低,又,當用作相位差板時,無法使 相位差充分地大,且無法遍及較廣之波長區域而產生相同之相位差。 However, none of the uneven pattern forming sheets disclosed in Patent Documents 4 and 5 and Non-Patent Document 2 shows excellent performance as an optical element. Specifically, when used as an antireflection body, the reflectance cannot be sufficiently lowered, and when used as a phase difference plate, it cannot be made. The phase difference is sufficiently large and cannot produce the same phase difference over a wide range of wavelengths.
又,作為製造凹凸圖案形成片之方法,已知使用圖案遮罩之可見光之光微影法。然而,該方法無法製造可用作光學元件且具有光之波長以下之間距的凹凸圖案形成片。因此,必須應用可進行更微細之加工之紫外線雷射干涉法或電子射線微影法。該等方法係利用紫外線雷射干涉光或電子射線對形成於基板上之光阻層進行曝光、顯影,以形成光阻圖案層,並將該光阻圖案層作為遮罩,利用乾式蝕刻法等形成凹凸形狀。然而,當應用紫外線雷射干涉法或電子射線微影法時,存在如下問題,亦即,難以在超過10cm之較廣區域內進行加工,因而不適宜大量生產。 Further, as a method of producing a concave-convex pattern forming sheet, a visible light photolithography method using a pattern mask is known. However, this method cannot produce a concavo-convex pattern forming sheet which can be used as an optical element and has a distance between wavelengths below the wavelength of light. Therefore, it is necessary to apply an ultraviolet laser interference method or an electron ray lithography method which can perform finer processing. In these methods, the photoresist layer formed on the substrate is exposed and developed by ultraviolet laser interference light or electron ray to form a photoresist pattern layer, and the photoresist pattern layer is used as a mask, and dry etching is used. A concave and convex shape is formed. However, when the ultraviolet laser interference method or the electron beam lithography method is applied, there is a problem that it is difficult to perform processing in a wide area of more than 10 cm, and thus it is not suitable for mass production.
又,於專利文獻6中提出一方法,將粒子層配置於基板上,並將粒子層作為蝕刻遮罩而對基板表面進行乾式蝕刻。然而,於此情形時,亦存在難以在超過30cm之較廣區域內進行加工,因而不適宜大量生產之問題。 Further, in Patent Document 6, a method is proposed in which a particle layer is placed on a substrate, and the particle layer is used as an etching mask to dry-etch the surface of the substrate. However, in this case, there is also a problem that it is difficult to perform processing in a wide area of more than 30 cm, and thus it is not suitable for mass production.
[專利文獻4]日本專利特開昭63-301988號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. SHO 63-301988
[專利文獻5]日本專利特開2003-187503號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2003-187503
[專利文獻6]日本專利特開2005-279807號公報 [Patent Document 6] Japanese Patent Laid-Open Publication No. 2005-279807
[非專利文獻1]菊田久雄、岩田耕一著「光學」,日本光學會發行,第27卷,第1號,1998年,p.12-17 [Non-Patent Document 1] Kikuda Kyuo and Iwata Tatsuh, "Optics", Japan Optical Society, Vol. 27, No. 1, 1998, p. 12-17
[非專利文獻2]內德.鮑頓(Ned Bowden)等著「自然(Nature)」,第393號,1998年,p.146 [Non-Patent Document 2] Ned. Ned Bowden waits for Nature, No. 393, 1998, p.146
專利文獻1、2中揭示之光擴散體係具有充分之光擴散性者。然而,存在的問題是,專利文獻1中揭示之能量束照射之加工方法、專利文獻2中揭示之利用雷射對感光性樹脂薄膜進行曝光、顯影之方法 較為繁雜。又,並不能說專利文獻1、2之光擴散體的擴散之異向性充分。 The light diffusion system disclosed in Patent Documents 1 and 2 has sufficient light diffusibility. However, there is a problem in the method of processing energy beam irradiation disclosed in Patent Document 1, and the method of exposing and developing a photosensitive resin film by laser using the laser disclosed in Patent Document 2. More complicated. Further, it cannot be said that the diffusion of the light diffusing bodies of Patent Documents 1 and 2 is sufficient.
本發明係鑒於上述狀況而研製者,其目的在於提供一種可用作光擴散體且可簡便地製造之凹凸圖案形成片。又,本發明之目的在於提供一種可簡便地製造用作光擴散體之凹凸圖案形成片的凹凸圖案形成片之製造方法。又,本發明之目的在於提供一種擴散之異向性優異的光擴散體。進而,本發明之目的在於提供一種光擴散體製造用工程片及光擴散體之製造方法,該光擴散體製造用工程片可簡便且大量地製造形成有與凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光擴散體。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a concave-convex pattern forming sheet which can be used as a light diffusing body and which can be easily manufactured. Moreover, an object of the present invention is to provide a method for producing a concave-convex pattern forming sheet which can easily produce a concave-convex pattern forming sheet used as a light diffusing body. Further, an object of the present invention is to provide a light diffuser excellent in diffusion anisotropy. Further, an object of the present invention is to provide an engineering sheet for manufacturing a light-diffusing body and a method for producing a light-diffusing body, which can be manufactured in a simple and large-scale manner, and which has a maximum pitch and a pitch between the concave-convex pattern-forming sheet and A light diffuser having a concave-convex pattern having the same average depth.
當欲藉由凹凸來控制光之擴散及反射時,若凹凸部彼此之間隔為光之波長左右,則會產生因干涉而引起之著色問題,又,若該間隔超過數10μm,則有可能會被辨認為亮線等,因此要求將凹凸部彼此之間隔設為20μm以下。然而,對於專利文獻3中揭示之光學片,若凹凸部彼此之間隔為數十微米~數百微米,則可穩定地形成間隔,但當凹凸部彼此之間隔為20μm以下時,則難以獲得所需之間隔。 When it is desired to control the diffusion and reflection of light by the concavities and convexities, if the distance between the concavo-convex portions is about the wavelength of light, coloring problems due to interference may occur, and if the interval exceeds several tens of μm, there is a possibility that Since it is recognized as a bright line or the like, it is required to set the interval between the uneven portions to 20 μm or less. However, in the optical sheet disclosed in Patent Document 3, when the distance between the uneven portions is several tens of micrometers to several hundreds of micrometers, the interval can be stably formed. However, when the distance between the uneven portions is 20 μm or less, it is difficult to obtain the space. The interval between needs.
又,於光學片中,有時並不使光擴散性等光學特性均勻,而是使光學特性不均勻,於特定位置處或高或低。例如,對於液晶顯示器之背光單元中所使用之導光板而言,為了防止配置於其側端面上之線狀光源之影像於導光板表面映出,有時需提高該線狀光源附近之出光側表面之光擴散性。又,當液晶顯示器中使用具備複數個線狀光源或點狀光源之直下型背光單元時,隨著自線狀光源或點狀光源彼此之間靠近其正上方,有時需提高光擴散性。 Further, in the optical sheet, optical characteristics such as light diffusibility are not uniform, and optical characteristics are not uniform, and may be high or low at a specific position. For example, in the light guide plate used in the backlight unit of the liquid crystal display, in order to prevent the image of the linear light source disposed on the side end surface thereof from being reflected on the surface of the light guide plate, it is sometimes necessary to increase the light exit side near the linear light source. The light diffusibility of the surface. Further, when a direct type backlight unit including a plurality of linear light sources or point light sources is used in a liquid crystal display, light diffusing property may be required as the linear light source or the point light source is placed directly above the linear light source.
為了對表面形成有凹凸之光學片進行調整以使光學特性不均勻,考慮使凹凸部彼此之間隔隨位置而變化,但就專利文獻3中揭示之光學片而言,在將凹凸部彼此之間隔設為20μm以下之後,難以使 間隔變化。由此,專利文獻3中揭示之光學片難以使光學特性於特定位置處或高或低而不均勻。 In order to adjust the optical characteristics in which the unevenness is formed on the surface to make the optical characteristics uneven, it is considered that the distance between the uneven portions varies depending on the position. However, in the optical sheet disclosed in Patent Document 3, the uneven portions are spaced apart from each other. After setting it to 20 μm or less, it is difficult to make The interval changes. Thus, the optical sheet disclosed in Patent Document 3 is difficult to make the optical characteristics uneven or uneven at a specific position.
因此,本發明之目的在於提供一種目標光學特性(光擴散性等)優異且可使光學特性容易不均勻之光學片。又,本發明之目的在於提供一種目標光擴散性優異且可使光擴散性容易不均勻之光擴散片。 Therefore, an object of the present invention is to provide an optical sheet which is excellent in target optical characteristics (light diffusibility, etc.) and which can easily make optical characteristics uneven. Moreover, an object of the present invention is to provide a light-diffusing sheet which is excellent in target light diffusibility and which is easy to make light diffusibility uneven.
關於專利文獻1、2中揭示之擴散導光體,由於光之擴散之異向性不充分,故具備該等擴散導光體之背光單元無法使來自光源之光充分地異向性擴散。因此,來自擴散導光體之出射光之亮度會根據部位而不同,從而於液晶顯示裝置之圖像亮度中產生不均。 In the diffused light guide disclosed in Patent Documents 1 and 2, since the anisotropy of light diffusion is insufficient, the backlight unit including the diffused light guides cannot sufficiently diffuse the light from the light source. Therefore, the brightness of the light emitted from the diffused light guide differs depending on the location, resulting in unevenness in the image brightness of the liquid crystal display device.
本發明之目的在於提供一種可使來自光源之光充分地異向性擴散之擴散導光體及背光單元。 It is an object of the present invention to provide a diffused light guide and a backlight unit that can sufficiently diffuse light from a light source.
本發明之目的在於提供一種在用作防反射體或相位差板等光學元件時顯示出優異性能之凹凸圖案形成片。又,本發明之目的在於提供一種可簡便、大面積、且大量地製造上述凹凸圖案形成片之凹凸圖案形成片製造方法。又,本發明之目的在於提供一種反射率較低之防反射體、遍及較廣波長區域而產生相同相位差之相位差板。進而,本發明之目的在於提供一種光學元件製造用工程片,其可簡便且大量地製造具有與凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光學元件。 An object of the present invention is to provide a concavo-convex pattern forming sheet which exhibits excellent performance when used as an optical element such as an antireflection body or a phase difference plate. Moreover, an object of the present invention is to provide a method for producing a concave-convex pattern forming sheet which can easily and widely produce a large number of large and large-area patterns. Further, an object of the present invention is to provide an antireflection body having a low reflectance and a phase difference plate which generates the same phase difference over a wide wavelength region. Further, an object of the present invention is to provide an optical element for producing an optical element, which is capable of easily and in large quantities producing an optical element having a concave-convex pattern having the same pitch width and average depth as that of the uneven pattern forming sheet.
本發明包含以下態樣: The invention includes the following aspects:
[1]一種凹凸圖案形成片,其特徵在於:具備樹脂製基材、及設置於該基材之一面上之樹脂製硬質層,且於該硬質層之表面上形成有沿著一方向之凹凸圖案,構成硬質層之樹脂的玻璃轉移溫度Tg2與構成基材之樹脂的玻璃轉移溫度Tg1之差(Tg2-Tg1)為10℃以上,凹凸圖案之最頻間距超過1μm且為20μm以下,凹凸圖案之底部之平均深度 為將上述最頻間距設為100%時之10%以上。 [1] A concave-convex pattern forming sheet comprising a resin substrate and a resin hard layer provided on one surface of the substrate, and a bump along one direction is formed on a surface of the hard layer The pattern, the difference between the glass transition temperature Tg 2 of the resin constituting the hard layer and the glass transition temperature Tg 1 of the resin constituting the substrate (Tg 2 -Tg 1 ) is 10° C. or more, and the most frequent pitch of the concave-convex pattern is more than 1 μm and 20 μm. Hereinafter, the average depth of the bottom of the concave-convex pattern is 10% or more when the above-described maximum frequency spacing is 100%.
[2]一種凹凸圖案形成片之製造方法,其特徵在於:包括以下步驟,亦即,於樹脂製基材之一面上,設置表面平滑、厚度超過0.05μm且為5.0μm以下之樹脂製硬質層,以形成積層片;以及使上述積層片之至少硬質層以摺疊之方式而變形;且硬質層藉由玻璃轉移溫度相較於構成基材之樹脂高出10℃以上之樹脂所構成。 [2] A method for producing a concave-convex pattern forming sheet, comprising the step of providing a resin hard layer having a smooth surface and a thickness of more than 0.05 μm and 5.0 μm or less on one surface of a resin substrate; And forming the laminated sheet; and deforming at least the hard layer of the laminated sheet by folding; and the hard layer is formed by a resin having a glass transition temperature higher than 10° C. of the resin constituting the substrate.
[3]如[2]之凹凸圖案形成片之製造方法,其中使用單軸方向加熱收縮性薄膜作為樹脂製基材,且於使硬質層以摺疊之方式而變形之步驟中,對積層片進行加熱以使單軸方向加熱收縮性薄膜收縮。 [3] The method for producing a concave-convex pattern forming sheet according to [2], wherein a uniaxial direction heat shrinkable film is used as a resin substrate, and in the step of deforming the hard layer in a folded manner, the laminated sheet is subjected to a step of deforming the hard layer in a folded manner. Heating to shrink the heat shrinkable film in the uniaxial direction.
[4]一種光擴散體,其具備[1]之凹凸圖案形成片,且該凹凸圖案形成片之基材及硬質層為透明。 [4] A light diffusing body comprising the uneven pattern forming sheet of [1], wherein the base material and the hard layer of the uneven pattern forming sheet are transparent.
[5]一種凹凸圖案形成片,其特徵在於:具備樹脂製基材、及設置於該基材之一面上之樹脂製硬質層,於該硬質層之表面上形成有沿著一方向之凹凸圖案,硬質層由金屬或金屬化合物構成,凹凸圖案之最頻間距超過1μm且為20μm以下,凹凸圖案之底部之平均深度為將上述最頻間距設為100%時之10%以上。 [5] A concave-convex pattern forming sheet comprising a resin base material and a resin hard layer provided on one surface of the base material, and a concave-convex pattern along one direction is formed on a surface of the hard layer The hard layer is made of a metal or a metal compound, and the most frequent pitch of the concave-convex pattern is more than 1 μm and 20 μm or less, and the average depth of the bottom of the concave-convex pattern is 10% or more when the above-mentioned maximum frequency pitch is 100%.
[6]如[5]之凹凸圖案形成片,其中硬質層由金屬構成。 [6] The uneven pattern forming sheet of [5], wherein the hard layer is composed of metal.
[7]如[5]之凹凸圖案形成片,其中金屬係選自由金、鋁、銀、碳、銅、鍺、銦、鎂、鈮、鈀、鉛、鉑、矽、錫、鈦、釩、鋅、鉍所組成之群中之至少一種金屬。 [7] The uneven pattern forming sheet according to [5], wherein the metal is selected from the group consisting of gold, aluminum, silver, carbon, copper, bismuth, indium, magnesium, bismuth, palladium, lead, platinum, rhodium, tin, titanium, vanadium, At least one metal of the group consisting of zinc and strontium.
[8]一種凹凸圖案形成片,其特徵在於:包括以下步驟,亦即,於樹脂製基材之一面上,設置表面平滑、厚度超過0.01μm且為0.2μm以下之金屬製或金屬化合物製硬質層,以形成積層片;以及使上述積層片之至少硬質層以摺疊之方式而變形;且硬質層由金屬或金屬化合物所構成。 [8] A concave-convex pattern-forming sheet comprising a step of providing a metal or a metal compound having a smooth surface and having a thickness of more than 0.01 μm and a thickness of 0.2 μm or less on one surface of a resin substrate. a layer to form a laminated sheet; and deforming at least the hard layer of the laminated sheet by folding; and the hard layer is composed of a metal or a metal compound.
[9]如[8]之凹凸圖案形成片之製造方法,其中使用單軸方向加熱 收縮性薄膜作為樹脂製基材,且於使硬質層以摺疊之方式而變形之步驟中,對積層片進行加熱以使單軸方向加熱收縮性薄膜收縮。 [9] The method for producing a concave-convex pattern forming sheet according to [8], wherein uniaxial heating is used The shrinkable film is a resin substrate, and in the step of deforming the hard layer in a folded manner, the laminated sheet is heated to shrink the heat shrinkable film in the uniaxial direction.
[10]一種光擴散體製造用工程片原版,其具備[1]、[5]或[8]之凹凸圖案形成片,且其作為用以製造於表面上形成有與該凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光擴散體之模具而使用。 [10] An engineering sheet precursor for producing a light diffuser, comprising the concave-convex pattern forming sheet of [1], [5] or [8], which is formed on the surface and formed with the concave-convex pattern. The mold of the light diffuser having the same pitch and the same depth and the same average depth is used.
[11]一種光擴散體之製造方法,其包括以下步驟:於[10]之光擴散體製造用工程片原版之形成有凹凸圖案的面上,塗佈未硬化之硬化性樹脂;以及在使該硬化性樹脂硬化,之後自工程片原版上剝離已硬化之塗膜。 [11] A method for producing a light-diffusing body, comprising: coating an unhardened curable resin on a surface on which a concave-convex pattern is formed on an original sheet for producing a light-diffusing body of [10]; The curable resin is cured, and then the cured coating film is peeled off from the original sheet of the engineering sheet.
[12]一種光擴散體之製造方法,其包括以下步驟:使片狀之熱可塑性樹脂接觸到[10]之光擴散體製造用工程片原版之形成有凹凸圖案的面;將該片狀之熱可塑性樹脂按壓於工程片原版上,且於此狀態下進行加熱而使其軟化,其後進行冷卻;以及自工程片原版上剝離已冷卻之片狀之熱可塑性樹脂。 [12] A method of producing a light-diffusing body, comprising: bringing a sheet-shaped thermoplastic resin into contact with a surface on which a concave-convex pattern is formed on an original sheet for producing a light-diffusing body of [10]; The thermoplastic resin is pressed against the original sheet of the engineering sheet, heated in this state to soften it, and then cooled, and the cooled sheet-shaped thermoplastic resin is peeled off from the original sheet of the engineering sheet.
[13]一種光擴散體之製造方法,其包括以下步驟:於[10]之光擴散體製造用工程片原版之形成有凹凸圖案的面上,積層凹凸圖案轉印用材料;自上述工程片原版上剝離積層於凹凸圖案上之凹凸圖案轉印用材料,以製作二次工程用成形物;於該二次工程用成形物之已與上述工程片原版之凹凸圖案接觸之一側之面上,塗佈未硬化之硬化性樹脂;以及在使該硬化性樹脂硬化,之後自二次工程用成形物上剝離已硬化之塗膜。 [13] A method for producing a light-diffusing body, comprising the step of: laminating a concave-convex pattern-transferring material on a surface on which a concave-convex pattern is formed on an original sheet for producing a light-diffusing body of [10]; The original pattern is obtained by peeling off the uneven pattern transfer material laminated on the uneven pattern to produce a secondary engineering molded product; and the surface of the secondary engineering molded article is in contact with the concave-convex pattern of the original sheet of the engineering sheet The uncured curable resin is applied; and after the curable resin is cured, the cured coating film is peeled off from the secondary engineering molded article.
[14]一種光擴散體之製造方法,其包括以下步驟:於如[10]之光擴散體製造用工程片原版之形成有凹凸圖案的面上,積層凹凸圖案轉印用材料;自上述工程片原版上剝離積層於凹凸圖案上之凹凸圖案轉印用材料,以製作二次工程用成形物;使片狀之熱可塑性樹脂接觸到該二次工程用成形物之已與上述工程片原版之凹凸圖案接觸之一側之 面;將該片狀之熱可塑性樹脂按壓於二次工程用成形物上,且於此狀態下進行加熱而使其軟化,其後進行冷卻;以及自二次工程用成形物上剝離已冷卻之片狀之熱可塑性樹脂。 [14] A method for producing a light-diffusing body, comprising the steps of: laminating a concave-convex pattern-transferring material on a surface on which a concave-convex pattern is formed on an original sheet for producing a light-diffusing body according to [10]; The sheet original plate is peeled off from the concave-convex pattern transfer material laminated on the concave-convex pattern to produce a secondary engineering molded product; and the sheet-shaped thermoplastic resin is brought into contact with the secondary engineering molded article and the above-mentioned engineering sheet original Concave-convex pattern contact one side The sheet-shaped thermoplastic resin is pressed against the molded article for secondary engineering, and heated in this state to be softened, and then cooled; and the cooled product is peeled off from the molded article for secondary engineering. A sheet of thermoplastic resin.
[15]一種光學片,其特徵在於:於平坦之一面或兩面上,分散配置有具有凹凸之凹凸區域。 [15] An optical sheet characterized in that a concave-convex region having irregularities is dispersedly disposed on one surface or both surfaces of a flat surface.
[16]如[15]之光學片,其中凹凸區域不均勻地配置著。 [16] The optical sheet of [15], wherein the uneven regions are unevenly arranged.
[17]一種光擴散片,其具備[15]之光學片。 [17] A light diffusing sheet comprising the optical sheet of [15].
[18]如[17]之光擴散片,其中凹凸區域內之凹凸之最頻間距A超過1μm且為20μm以下,凹凸之平均深度B相對於最頻間距A之比(B/A)為0.1~3.0。 [18] The light-diffusing sheet according to [17], wherein the most frequent pitch A of the unevenness in the uneven region exceeds 1 μm and is 20 μm or less, and the ratio (B/A) of the average depth B of the unevenness to the most frequent pitch A is 0.1. ~3.0.
[19]如[18]之光擴散片,其中凹凸區域呈點狀分散。 [19] The light-diffusing sheet of [18], wherein the uneven portion is dispersed in a dot shape.
[20]一種擴散導光體,其特徵在於:其係由在一面上形成有蛇行之波狀凹凸圖案之透明樹脂層而構成,凹凸圖案之最頻間距超過1.0μm且為20μm以下,凹凸之平均深度B相對於最頻間距A之比(B/A)為0.1~3.0。 [20] A diffusing light guide comprising a transparent resin layer in which a meandering corrugated pattern is formed on one surface, and a pitch of a concave-convex pattern is more than 1.0 μm and 20 μm or less. The ratio of the average depth B to the most frequent spacing A (B/A) is 0.1 to 3.0.
[21]一種背光單元,其特徵在於具備:[20]之擴散導光體;反射板,其對向於該擴散導光體之與形成有上述凹凸圖案之面相反側的面而配設;以及光源,其配設於上述擴散導光體及上述反射板之間。 [21] A backlight unit comprising: the diffusing light guide of [20]; and a reflecting plate disposed opposite to a surface of the diffusing light guide opposite to a surface on which the uneven pattern is formed; And a light source disposed between the diffusion light guide and the reflector.
[22]一種背光單元,其特徵在於具備:[20]之擴散導光體;反射板,其對向於該擴散導光體之與形成有上述凹凸圖案之面相反側的面而配設;以及光源,其鄰接於上述擴散導光體之任一個側面。 [22] A backlight unit comprising: the diffusing light guide of [20]; and a reflecting plate disposed to face a surface of the diffusing light guide opposite to a surface on which the uneven pattern is formed; And a light source adjacent to either side of the diffused light guide.
[23]一種凹凸圖案形成片,其特徵在於:具備樹脂製基材、及設置於該基材外表面之至少一部分上之樹脂製硬質層,且該硬質層具有波狀之凹凸圖案,構成硬質層之樹脂的玻璃轉移溫度Tg2與構成基材之樹脂的玻璃轉移溫度Tg1之差(Tg2-Tg1)為10℃以上,凹凸圖案之最頻間距為1μm以下,凹凸圖案之底部之平均深度為將上述最頻間距設 為100%時之10%以上。 [23] A concave-convex pattern forming sheet comprising: a resin base material; and a resin hard layer provided on at least a part of an outer surface of the base material, wherein the hard layer has a corrugated concave-convex pattern to constitute a hard material The difference between the glass transition temperature Tg 2 of the resin of the layer and the glass transition temperature Tg 1 of the resin constituting the substrate (Tg 2 -Tg 1 ) is 10° C. or more, and the pitch of the concave-convex pattern is 1 μm or less, and the bottom of the concave-convex pattern is The average depth is 10% or more when the above-described maximum frequency spacing is set to 100%.
[24]一種凹凸圖案形成片之製造方法,其特徵在於:包括以下步驟,亦即,於樹脂製基材外表面之至少一部分上,設置表面平滑之樹脂製硬質層,以形成積層片;以及使該積層片之至少硬質層蛇行變形;且硬質層藉由玻璃轉移溫度相較於構成基材之樹脂高出10℃以上之樹脂所構成。 [24] A method for producing a concave-convex pattern forming sheet, comprising: providing a resin-made hard layer having a smooth surface on at least a part of an outer surface of a resin substrate to form a laminated sheet; At least the hard layer of the laminated sheet is serpentinely deformed; and the hard layer is composed of a resin having a glass transition temperature higher than that of the resin constituting the substrate by 10 ° C or more.
[25]一種防反射體,其具備[23]之凹凸圖案形成片。 [25] An antireflection body comprising the concavo-convex pattern forming sheet of [23].
[26]一種相位差板,其具備[23]之凹凸圖案形成片。 [26] A phase difference plate comprising the concavo-convex pattern forming sheet of [23].
[27]一種光學元件製造用工程片,其具備[23]之凹凸圖案形成片之特徵,且其作為用以製造具有與該凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光學元件之模具而使用。 [27] An engineering sheet for producing an optical element, comprising the feature of the concavo-convex pattern forming sheet of [23], and the optical material for producing a concavo-convex pattern having the same frequency-to-frequency spacing and average depth as the concavo-convex pattern forming sheet. Use the mold of the component.
本發明之凹凸圖案形成片係可用作光擴散體、且可簡便地製造者。 The uneven pattern forming sheet of the present invention can be used as a light diffuser and can be easily produced.
根據本發明之凹凸圖案形成片之製造方法,可簡便地製造用作光擴散體之凹凸圖案形成片。 According to the method for producing a concave-convex pattern forming sheet of the present invention, the concave-convex pattern forming sheet used as the light diffusing body can be easily produced.
本發明之光擴散體在擴散之異向性方面優異。 The light diffuser of the present invention is excellent in the anisotropy of diffusion.
根據本發明之光擴散體製造用工程片及光擴散體之製造方法,可簡便且大量地製造形成有與凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光擴散體。 According to the method for producing a light-diffusing body and the method for producing a light-diffusing body of the present invention, a light-diffusing body in which a concave-convex pattern having the same maximum pitch and average depth as that of the uneven pattern-forming sheet can be easily and largely produced.
本發明之光學片之目標光學特性優異,且可使使光學特性易不均勻。 The optical sheet of the present invention is excellent in the target optical characteristics, and can make the optical characteristics easy to be uneven.
本發明之光擴散片之目標光擴散性優異,且可使光擴散性易不均勻。 The light-diffusing sheet of the present invention is excellent in target light diffusibility, and is easy to be uneven in light diffusibility.
根據本發明之擴散導光體及背光單元,可使來自光源之光充分地異向性擴散。 According to the diffusing light guide and the backlight unit of the present invention, light from the light source can be sufficiently anisotropically diffused.
本發明之凹凸圖案形成片可較好地用作防反射體或相位差板等光學元件。又,本發明之凹凸圖案形成片亦可較好地用作光學元件製造用工程片,該光學元件製造用工程片作為用以製造具有波狀凹凸圖案之光學元件的模具而使用。 The uneven pattern forming sheet of the present invention can be preferably used as an optical element such as an antireflection body or a phase difference plate. Moreover, the uneven pattern forming sheet of the present invention can also be preferably used as an engineering sheet for producing an optical element, and the engineering sheet for producing an optical element is used as a mold for producing an optical element having a corrugated concave-convex pattern.
於本發明之凹凸圖案形成片之製造方法中,可於表面容易大面積地形成微細之凹凸圖案,因此可簡便且大量地製造能夠較好地利用於光學元件等之凹凸圖案形成片。 In the method for producing a concave-convex pattern-forming sheet of the present invention, the fine uneven pattern can be easily formed on a large surface. Therefore, the uneven pattern-forming sheet which can be preferably used for an optical element or the like can be easily and widely produced.
本發明之防反射體係反射率低、性能優異者。 The antireflection system of the present invention has low reflectance and excellent performance.
本發明之相位差板係可遍及較廣之波長區域而產生相同之相位差且性能優異者。 The phase difference plate of the present invention can produce the same phase difference over a wide wavelength region and has excellent performance.
藉由使用本發明之光學元件製造用工程片,可簡便且大量地製造具有與凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光學元件。 By using the engineering sheet for producing an optical element of the present invention, an optical element having a concave-convex pattern having the same pitch and average depth as the groove pattern forming sheet can be easily and in a large amount.
10‧‧‧凹凸圖案形成片 10‧‧‧ concave pattern forming sheet
10a‧‧‧積層片 10a‧‧‧Layered film
11‧‧‧基材(透明樹脂層) 11‧‧‧Substrate (transparent resin layer)
11a‧‧‧加熱收縮性薄膜 11a‧‧‧heat shrinkable film
12‧‧‧硬質層 12‧‧‧ Hard layer
12a‧‧‧凹凸圖案 12a‧‧‧ concave pattern
12b‧‧‧底部 12b‧‧‧ bottom
13‧‧‧表面平滑之樹脂製硬質層(表面平滑硬質層) 13‧‧‧Smooth layer made of smooth resin (smooth hard surface)
210a、210b、210c、210d‧‧‧光學片 210a, 210b, 210c, 210d‧‧‧ optical sheets
211‧‧‧平坦之一面 211‧‧‧flat one side
212、215、216、217‧‧‧凹凸區域 212, 215, 216, 217‧‧ ‧ concave and convex areas
213‧‧‧加熱收縮性薄膜 213‧‧‧heat shrinkable film
214‧‧‧凹凸區域形成用凸部 214‧‧‧ convex parts for forming concave and convex areas
100、200‧‧‧背光單元 100, 200‧‧‧ backlight unit
310‧‧‧擴散導光體 310‧‧‧Diffuse Light Guide
315‧‧‧表面 315‧‧‧ surface
316‧‧‧背面 316‧‧‧ back
320‧‧‧反射板 320‧‧‧reflector
330‧‧‧光源 330‧‧‧Light source
340‧‧‧擴散薄膜 340‧‧‧Diffuser film
350‧‧‧稜鏡片 350‧‧‧ Picture
360‧‧‧亮度上升薄膜 360‧‧‧Brightness rising film
圖1係將本發明之凹凸圖案形成片之一實施形態之一部分進行放大表示的放大立體圖。 Fig. 1 is an enlarged perspective view showing a part of an embodiment of a concave-convex pattern forming sheet of the present invention in an enlarged manner.
圖2係在與凹凸圖案之形成方向正交之方向上將圖1之凹凸圖案形成片截斷後之剖面圖。 2 is a cross-sectional view showing the concavo-convex pattern forming sheet of FIG. 1 cut in a direction orthogonal to the direction in which the concavo-convex pattern is formed.
圖3係藉由表面光學顯微鏡對凹凸圖案之表面進行拍攝所得之圖像之灰度轉換圖像。 Fig. 3 is a gradation conversion image of an image obtained by photographing the surface of the concave-convex pattern by a surface optical microscope.
圖4係對圖3之圖像進行傅立葉轉換後所得之圖像。 Fig. 4 is an image obtained by performing Fourier transform on the image of Fig. 3.
圖5係對與圖4之圖像中的圓環中心之距離上的亮度所描繪之圖表。 Figure 5 is a graph depicting the brightness over the distance from the center of the circle in the image of Figure 4.
圖6係對圖4圖像中的輔助線L3上之亮度所描繪之圖表。 Figure 6 is a graph depicting the brightness on the auxiliary line L3 in the image of Figure 4.
圖7係表示本發明之凹凸圖案形成片之製造方法之一實施形態的積層片之剖面圖。 Fig. 7 is a cross-sectional view showing a laminated sheet according to an embodiment of the method for producing a concave-convex pattern forming sheet of the present invention.
圖8係使用有本發明之凹凸圖案形成片之光擴散體之製造方法之一例的說明圖。 Fig. 8 is an explanatory view showing an example of a method of producing a light diffuser having the uneven pattern forming sheet of the present invention.
圖9係藉由表面光學顯微鏡對比較例4中的凹凸圖案之表面進行拍攝所得之圖像之灰度轉換圖像。 Fig. 9 is a gradation conversion image of an image obtained by photographing the surface of the concave-convex pattern in Comparative Example 4 by a surface optical microscope.
圖10係對圖9之圖像進行傅立葉轉換後所得之圖像。 Fig. 10 is an image obtained by performing Fourier transform on the image of Fig. 9.
圖11係對與圖10之圖像中的圓環中心之距離上的亮度所描繪之圖表。 Figure 11 is a graph depicting the brightness over the distance from the center of the circle in the image of Figure 10.
圖12係對圖10之圖像中的輔助線L5上之亮度所描繪之圖表。 Figure 12 is a graph depicting the brightness on the auxiliary line L 5 in the image of Figure 10.
圖13係表示本發明之光學片之第1實施形態的立體圖。 Fig. 13 is a perspective view showing a first embodiment of the optical sheet of the present invention.
圖14係表示製造圖13所示之光學片時所使用之印刷片的剖面圖。 Fig. 14 is a cross-sectional view showing a printing sheet used in the production of the optical sheet shown in Fig. 13.
圖15係印刷片表面之透射型電子顯微鏡照片。 Figure 15 is a transmission electron micrograph of the surface of the printed sheet.
圖16係光學片表面之透射型電子顯微鏡照片。 Figure 16 is a transmission electron micrograph of the surface of the optical sheet.
圖17係表示本發明之光學片之第2實施形態的立體圖。 Fig. 17 is a perspective view showing a second embodiment of the optical sheet of the present invention.
圖18係表示本發明之光學片之第3實施形態的立體圖。 Fig. 18 is a perspective view showing a third embodiment of the optical sheet of the present invention.
圖19係表示本發明之光學片之第4實施形態的立體圖。 Fig. 19 is a perspective view showing a fourth embodiment of the optical sheet of the present invention.
圖20係表示本發明之擴散導光體之其他實施形態的剖面圖。 Fig. 20 is a cross-sectional view showing another embodiment of the diffused light guide of the present invention.
圖21係表示本發明之背光單元之第1實施形態的剖面圖。 Figure 21 is a cross-sectional view showing a first embodiment of a backlight unit of the present invention.
圖22係表示本發明之背光單元之第2實施形態的剖面圖。 Figure 22 is a cross-sectional view showing a second embodiment of the backlight unit of the present invention.
圖23係將本發明之凹凸圖案形成片之一實施形態之一部分進行放大表示的放大立體圖。 Fig. 23 is an enlarged perspective view showing an enlarged view of an embodiment of the concave-convex pattern forming sheet of the present invention.
圖24係藉由原子間力顯微鏡對並未沿著特定方向之凹凸圖案之表面進行拍攝所得的圖像之灰度轉換圖像。 Fig. 24 is a gradation conversion image of an image obtained by photographing a surface of a concave-convex pattern which is not along a specific direction by an atomic force microscope.
圖25係對圖24之圖像進行傅立葉轉換後所得之圖像。 Fig. 25 is an image obtained by performing Fourier transform on the image of Fig. 24.
圖26係對與圖25之圖像中的圓環中心之距離上的亮度所描繪之圖表。 Figure 26 is a graph depicting the brightness over the distance from the center of the circle in the image of Figure 25.
以下對本發明之凹凸圖案形成片之一實施形態進行說明。 Hereinafter, an embodiment of the uneven pattern forming sheet of the present invention will be described.
圖1及圖2表示本實施形態之凹凸圖案形成片。本實施形態之凹凸圖案形成片10具備基材11、及設置於基材11之一面上之硬質層12,硬質層12係具有凹凸圖案12a者。 Fig. 1 and Fig. 2 show a concave-convex pattern forming sheet of this embodiment. The uneven pattern forming sheet 10 of the present embodiment includes a base material 11 and a hard layer 12 provided on one surface of the base material 11, and the hard layer 12 has a concave-convex pattern 12a.
凹凸圖案形成片10上之凹凸圖案12a具有沿著大致一方向之波狀凹凸,該波狀凹凸呈蛇行。又,本實施形態之凹凸圖案12a之凸部之頂端帶有弧度。 The concavo-convex pattern 12a on the concavo-convex pattern forming sheet 10 has corrugated irregularities along substantially one direction, and the corrugated irregularities are meandering. Further, the tip end of the convex portion of the uneven pattern 12a of the present embodiment has a curvature.
構成硬質層12之樹脂(以下,稱為第2樹脂)的玻璃轉移溫度Tg2與構成基材11之樹脂(以下,稱為第1樹脂)的玻璃轉移溫度Tg1之差(Tg2-Tg1)為10℃以上,較好的是20℃以上,更好的是30℃以上。因(Tg2-Tg1)之差為10℃以上,故可在Tg2與Tg1之間的溫度情況下容易加工。若將Tg2與Tg1之間的溫度作為加工溫度,則可在基材11之楊氏模量高於硬質層12之楊氏模量之條件下進行加工,其結果可於硬質層12上容易形成凹凸圖案12a。 Glass transition temperature of the resin constituting the hard layer 12 (hereinafter referred to as the second resin) with a Tg 2 is the glass transition temperature of the resin constituting the base material 11 (hereinafter referred to as the first resin) of a difference between the Tg (Tg 2 -Tg 1 ) is 10 ° C or more, preferably 20 ° C or more, more preferably 30 ° C or more. Since the difference between (Tg 2 - Tg 1 ) is 10 ° C or more, it can be easily processed at a temperature between Tg 2 and Tg 1 . If the temperature between Tg 2 and Tg 1 is taken as the processing temperature, the Young's modulus of the substrate 11 can be processed under the condition that the Young's modulus of the hard layer 12 is higher, and the result can be applied to the hard layer 12. It is easy to form the uneven pattern 12a.
又,從經濟性方面而言,缺乏使用Tg2超過400℃之樹脂之必要性,且不存在Tg1低於-150℃之樹脂,因此(Tg2-Tg1)較好的是550℃以下,更好的是200℃以下。 Further, from the viewpoint of economy, the necessity of using a resin having a Tg 2 of more than 400 ° C is not required, and a resin having a Tg 1 of less than -150 ° C is not present, so (Tg 2 - Tg 1 ) is preferably 550 ° C or less. More preferably, it is below 200 °C.
從可容易形成凹凸圖案12a之角度而言,製造凹凸圖案形成片10時之加工溫度中的基材11與硬質層12之楊氏模量之差較好的是0.01~300GPa,更好的是0.1~10GPa。 The difference between the Young's modulus of the substrate 11 and the hard layer 12 in the processing temperature at the time of manufacturing the uneven pattern forming sheet 10 is preferably 0.01 to 300 GPa, more preferably from the viewpoint that the uneven pattern 12a can be easily formed. 0.1~10GPa.
此處所言之加工溫度,例如係指下述之凹凸圖案形成片之製造方法中的熱收縮時之加熱溫度。又,楊氏模量係根據JIS K 7113-1995所測定出之值。 The processing temperature as used herein means, for example, the heating temperature at the time of heat shrinkage in the production method of the uneven pattern forming sheet described below. Further, the Young's modulus is a value measured in accordance with JIS K 7113-1995.
第1樹脂之玻璃轉移溫度Tg1較好的是-150~300℃,更好的是-120~200℃。其原因在於,不存在玻璃轉移溫度Tg1低於-150℃之樹脂,若第1樹脂之玻璃轉移溫度Tg1為300℃以下,則可將其容易加熱至製造凹凸圖案形成片10時之加工溫度(Tg2與Tg1之間的溫度)。 The glass transition temperature Tg 1 of the first resin is preferably -150 to 300 ° C, more preferably -120 to 200 ° C. The reason for this is that there is no resin having a glass transition temperature Tg 1 of less than -150 ° C. When the glass transition temperature Tg 1 of the first resin is 300 ° C or less, it can be easily heated to the processing for producing the uneven pattern forming sheet 10 . Temperature (temperature between Tg 2 and Tg 1 ).
製造凹凸圖案形成片10時之加工溫度中的第1樹脂之楊氏模量較好的是0.01~100MPa,更好的是0.1~10MPa。若第1樹脂之楊氏模量為0.01MPa以上,則其具有可用作基材11之硬度,若第1樹脂之楊氏模量為100MPa以下,則其具有於硬質層12變形時可同時隨從而變形之柔軟度。 The Young's modulus of the first resin in the processing temperature at the time of producing the uneven pattern forming sheet 10 is preferably 0.01 to 100 MPa, more preferably 0.1 to 10 MPa. When the Young's modulus of the first resin is 0.01 MPa or more, the hardness of the first resin 11 can be used. When the Young resin modulus of the first resin is 100 MPa or less, the hardness of the hard layer 12 can be simultaneously changed. The softness of the deformation.
作為第1樹脂,可列舉例如:聚對苯二甲酸乙二酯等聚酯;聚乙烯或聚丙烯等聚烯烴;苯乙烯-丁二烯嵌段共聚物等聚苯乙烯系樹脂;聚氯乙烯、聚偏二氯乙烯、聚二甲基矽氧烷等聚矽氧樹脂;氟樹脂、ABS樹脂、聚醯胺、丙烯酸系樹脂、聚碳酸酯、聚環烯烴等樹脂。 Examples of the first resin include polyesters such as polyethylene terephthalate; polyolefins such as polyethylene and polypropylene; and polystyrene resins such as styrene-butadiene block copolymer; and polyvinyl chloride. Polyoxymethylene resin such as polyvinylidene chloride or polydimethyl siloxane; fluororesin, ABS resin, polyamine, acrylic resin, polycarbonate, polycycloolefin and the like.
第2樹脂之玻璃轉移溫度Tg2較好的是40~400℃,更好的是80~250℃。其原因在於,若第2樹脂之玻璃轉移溫度Tg2為40℃以上,則可使製造凹凸圖案形成片10時之加工溫度為室溫或室溫以上而有用,且從經濟性方面而言,缺乏使用玻璃轉移溫度Tg2超過400℃之樹脂作為第2樹脂之必要性。 The glass transition temperature Tg 2 of the second resin is preferably from 40 to 400 ° C, more preferably from 80 to 250 ° C. When the glass transition temperature Tg 2 of the second resin is 40° C. or higher, the processing temperature at the time of producing the uneven pattern forming sheet 10 can be useful at room temperature or above, and economically, There is a lack of the use of a resin having a glass transition temperature Tg 2 exceeding 400 ° C as the second resin.
製造凹凸圖案形成片10時之加工溫度中的第2樹脂之楊氏模量較好的是0.01~300GPa,更好的是0.1~10GPa。其原因在於,若第2樹脂之楊氏模量為0.01GPa以上,則可獲得較第1樹脂之加工溫度中的楊氏模量更為充分之硬度,該硬度係在形成有凹凸圖案12a之後可用以維持凹凸圖案的充分硬度,且從經濟性方面而言,缺乏使用楊氏模量超過300GPa之樹脂作為第2樹脂之必要性。 The Young's modulus of the second resin in the processing temperature at the time of producing the uneven pattern forming sheet 10 is preferably from 0.01 to 300 GPa, more preferably from 0.1 to 10 GPa. The reason for this is that when the Young's modulus of the second resin is 0.01 GPa or more, a hardness more than the Young's modulus in the processing temperature of the first resin can be obtained, and the hardness is after the uneven pattern 12a is formed. It is possible to maintain sufficient hardness of the uneven pattern, and from the viewpoint of economy, it is not necessary to use a resin having a Young's modulus of more than 300 GPa as the second resin.
以上為第1樹脂之種類,作為第2樹脂,可使用例如聚乙烯醇、 聚苯乙烯、丙烯酸系樹脂、苯乙烯-丙烯酸共聚物、苯乙烯-丙烯腈共聚物、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二醇酯、聚奈二甲酸乙二醇酯、聚碳酸酯、聚醚碸、氟樹脂等。該等之中,在兼具防汙功能之方面,尤其好的是氟樹脂。 The above is the type of the first resin, and as the second resin, for example, polyvinyl alcohol can be used. Polystyrene, acrylic resin, styrene-acrylic acid copolymer, styrene-acrylonitrile copolymer, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate , polycarbonate, polyether oxime, fluororesin, etc. Among these, a fluorine resin is particularly preferable in terms of having an antifouling function.
基材11之厚度較好的是0.3~500μm。若基材11之厚度為0.3μm以上,則凹凸圖案形成片10難以破裂,若基材11之厚度為500μm以下,則可使凹凸圖案形成片10容易薄型化。 The thickness of the substrate 11 is preferably from 0.3 to 500 μm. When the thickness of the base material 11 is 0.3 μm or more, the uneven pattern forming sheet 10 is less likely to be broken, and when the thickness of the base material 11 is 500 μm or less, the uneven pattern forming sheet 10 can be easily reduced in thickness.
又,為了支持基材11,亦可設置厚度為5~500μm之樹脂製支持體。又,當將該基板11用作光擴散體時,為了進一步提高光擴散性,亦可使含有微細氣泡之薄膜貼附於基材11上。 Further, in order to support the substrate 11, a resin support having a thickness of 5 to 500 μm may be provided. Further, when the substrate 11 is used as a light diffuser, a film containing fine bubbles may be attached to the substrate 11 in order to further improve light diffusibility.
當將凹凸圖案形成片10用作光擴散體時,為了進一步提高光擴散效果,可在不會對透光率等光學特性造成較大損害之範圍內,使基材11中含有由無機化合物構成之光擴散劑、由有機化合物構成之有機光擴散劑。 When the uneven pattern forming sheet 10 is used as a light diffusing body, in order to further enhance the light diffusing effect, the substrate 11 may be made of an inorganic compound in a range that does not cause a large damage to optical characteristics such as light transmittance. A light diffusing agent or an organic light diffusing agent composed of an organic compound.
作為無機光擴散劑,可列舉二氧化矽、白碳、滑石、氧化鎂、氧化鋅、氧化鈦、碳酸鈣、氫氧化鋁、硫酸鋇、玻璃、雲母等。 Examples of the inorganic light diffusing agent include cerium oxide, white carbon, talc, magnesium oxide, zinc oxide, titanium oxide, calcium carbonate, aluminum hydroxide, barium sulfate, glass, and mica.
作為有機光擴散劑,可列舉苯乙烯系聚合物粒子、丙烯酸系聚合物粒子、矽氧烷系聚合物粒子等。該等光擴散劑可分別單獨使用,或者亦可將兩種以上組合使用。 Examples of the organic light diffusing agent include styrene polymer particles, acrylic polymer particles, and siloxane polymer particles. These light diffusing agents may be used singly or in combination of two or more.
從難以損害透光性之角度而言,光擴散劑之含量較好的是相對於第1樹脂100質量份為10質量份以下。 The content of the light diffusing agent is preferably 10 parts by mass or less based on 100 parts by mass of the first resin, from the viewpoint of being less likely to impair the light transmittance.
又,當將凹凸圖案形成片10用作光擴散體時,為了進一步提高擴散效果,可在不會對透光率等光學特性造成較大損害之範圍內,使基材11中含有微細氣泡。微細氣泡對光之吸收較少,難以使透光率降低。 Further, when the uneven pattern forming sheet 10 is used as a light diffusing body, in order to further improve the diffusion effect, the substrate 11 may contain fine bubbles in a range that does not greatly impair the optical characteristics such as light transmittance. The fine bubbles absorb less light and it is difficult to lower the light transmittance.
作為微細氣泡之形成方法,可應用向基材11中混入發泡劑之方法 (例如,日本專利特開平5-212811號公報、日本專利特開平6-107842號公報中所揭示之方法)、對丙烯酸系發泡樹脂進行發泡處理以使其含有微細氣泡之方法(例如,日本專利特開2004-2812號公報中所揭示之方法)等。進而,就可實現更加均勻之面照射而言,微細氣泡之形成方法較好的是使特定位置不均勻地發泡之方法(例如,日本專利特開2006-124499號公報中所揭示之方法)。 As a method of forming fine bubbles, a method of mixing a foaming agent into the substrate 11 can be applied. (methods disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The method disclosed in Japanese Laid-Open Patent Publication No. 2004-2812, and the like. Further, in order to achieve more uniform surface irradiation, the method of forming the fine bubbles is preferably a method of uniformly foaming a specific position (for example, the method disclosed in Japanese Laid-Open Patent Publication No. 2006-124499) .
再者,亦可併用上述光擴散劑與微細發泡。 Further, the above light diffusing agent may be used in combination with fine foaming.
硬質層12之厚度較好的是超過0.05μm且為5μm以下,更好的是0.1~2μm。若硬質層之厚度超過0.05μm且為5μm以下,則如下所述可容易製造凹凸圖案形成片。 The thickness of the hard layer 12 is preferably more than 0.05 μm and 5 μm or less, more preferably 0.1 to 2 μm. When the thickness of the hard layer exceeds 0.05 μm and is 5 μm or less, the uneven pattern forming sheet can be easily produced as follows.
又,為了提高密著性及形成更微細之構造,亦可在基材11與硬質層12之間形成底塗層。 Further, in order to improve adhesion and form a finer structure, an undercoat layer may be formed between the substrate 11 and the hard layer 12.
凹凸圖案形成片10之凹凸圖案12a之最頻間距A超過1μm且為20μm以下,較好的是超過1μm且為10μm以下。若最頻間距A小於1μm,則光會透過,若最頻間距A超過20μm,則光擴散性會變低。 The most frequent pitch A of the uneven pattern 12a of the uneven pattern forming sheet 10 is more than 1 μm and is 20 μm or less, preferably more than 1 μm and not more than 10 μm. When the most frequent pitch A is less than 1 μm, light is transmitted, and if the most frequent pitch A exceeds 20 μm, the light diffusibility is lowered.
凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上(即,縱橫比0.1以上),較好的是30%以上(亦即,縱橫比0.3以上)。若平均深度B不足將最頻間距A設為100%時之10%,則即便將凹凸圖案形成片10用作光擴散體製造用工程片原版,亦難以獲得光擴散性較高之光擴散體。 The average depth B of the bottom portion 12b of the uneven pattern 12a is 10% or more (i.e., an aspect ratio of 0.1 or more) when the most frequent pitch A is 100%, and preferably 30% or more (that is, an aspect ratio of 0.3 or more). . When the average depth B is less than 10% of the case where the most frequent pitch A is 100%, it is difficult to obtain a light-diffusing body having high light diffusibility even when the concave-convex pattern forming sheet 10 is used as an original for producing a light-diffusing body.
又,從可容易形成凹凸圖案12a之角度而言,平均深度B較好的是將最頻間距A設為100%時之300%以下(亦即,縱橫比3.0以下),更好的是200%以下(亦即,縱橫比2.0以下)。 Further, from the viewpoint that the uneven pattern 12a can be easily formed, the average depth B is preferably 300% or less when the most frequent pitch A is 100% (that is, the aspect ratio is 3.0 or less), and more preferably 200. % or less (that is, an aspect ratio of 2.0 or less).
此處,底部12b係指凹凸圖案12a之凹部之極小值,平均深度B係指對將凹凸圖案形成片10沿長度方向截斷所得之剖面(參照圖2)進行觀察時,自與整個凹凸圖案形成片10之面方向平行的基準線L1至各凸 部之頂部為止的長度B1、B2、B3...之平均值(BAV)、與自基準線L1至各凹部之底部為止的長度b1、b2、b3...之平均值(bAV)之差(bAV-BAV)。 Here, the bottom portion 12b refers to a minimum value of the concave portion of the concave-convex pattern 12a, and the average depth B refers to a cross-section (see FIG. 2) obtained by cutting the concave-convex pattern forming sheet 10 in the longitudinal direction, and is formed from the entire concave-convex pattern. , to the bottom surface direction of the sheet 10 parallel to the reference line L 1 until the top of each protrusion length B 1, B 2, B 3 ... the average value (B AV) from the reference line L 1 and the concave portion of each of The difference (b AV -B AV ) between the averages (b AV ) of the lengths b 1 , b 2 , and b 3 .
上述凸部之頂部及上述凹部之底部係與硬質層12之與基材11側相反側之面鄰接者。 The top of the convex portion and the bottom of the concave portion are adjacent to the surface of the hard layer 12 opposite to the side of the substrate 11.
作為測定平均深度B之方法,可採用下述方法等:測定由原子間力顯微鏡所拍攝之凹凸圖案之剖面之圖像中的各底部之深度,並求出該等之平均值。 As a method of measuring the average depth B, a method of measuring the depth of each bottom portion in the image of the cross section of the concave-convex pattern captured by the atomic force microscope and measuring the average value of the bottom portions can be employed.
為了獲得光擴散之異向性較高之光擴散體,較好的是凹凸圖案12a以某程度蛇行,相鄰之凸部彼此之間距沿著凹凸圖案12a之方向而不均勻。此處,將凹凸圖案12a之配向之不均勻稱為配向度。配向度越大,配向越不均勻。該配向度係以下述方法而求出。 In order to obtain a light diffuser having a high anisotropy of light diffusion, it is preferable that the uneven pattern 12a is meandered to some extent, and the adjacent convex portions are not uniform with each other in the direction along the concave-convex pattern 12a. Here, the unevenness of the alignment of the concavo-convex pattern 12a is referred to as an alignment degree. The greater the degree of alignment, the more uneven the alignment. This degree of alignment was determined by the following method.
首先,藉由表面光學顯微鏡來拍攝凹凸圖案之上表面,並將該圖像轉換成灰度文檔(例如,tiff格式等)。於灰度文檔之圖像(參照圖3)中,白度越低之處,則表示凹部之底部越深(白度越高之處,則凸部之頂部越高)。繼而,對灰度文檔之圖像進行傅立葉轉換。圖4中顯示傅立葉轉換後之圖像。自圖4之圖像之中心向兩側擴展之白色部分中包含凹凸圖案12a之間距及朝向之資訊。 First, the surface above the concave-convex pattern is photographed by a surface optical microscope, and the image is converted into a grayscale document (for example, a tiff format or the like). In the image of the grayscale document (refer to FIG. 3), the lower the whiteness, the deeper the bottom of the concave portion (the higher the whiteness, the higher the top of the convex portion). Then, Fourier transform is performed on the image of the grayscale document. The Fourier transformed image is shown in FIG. The white portion extending from the center of the image of Fig. 4 to the sides includes information on the distance between the concave and convex patterns 12a and the orientation.
其次,自圖4之圖像之中心沿水平方向引輔助線L2,並對該輔助線上之亮度進行描繪(參照圖5)。圖5之描繪中橫軸表示間距之倒數,縱軸表示頻率,頻率為最大之值X的倒數1/X表示凹凸圖案12a之最頻間距。 Next, the auxiliary line L 2 is drawn in the horizontal direction from the center of the image of Fig. 4, and the brightness on the auxiliary line is drawn (refer to Fig. 5). In the depiction of Fig. 5, the horizontal axis represents the reciprocal of the pitch, the vertical axis represents the frequency, and the frequency is the maximum value X. The reciprocal 1/X represents the most frequent pitch of the concavo-convex pattern 12a.
繼而,於圖4中,引輔助線L3,其在值X之部分與輔助線L2正交,並對該輔助線L3上之亮度進行描繪(參照圖6)。其中,為了可與各種凹凸構造進行比較,圖6之橫軸設為除以X值後所得之數值。圖6之橫軸表示體現相對於凹凸之形成方向(圖3中的上下方向)的傾斜程度的指標(配向性),縱軸表示頻率。圖6之描繪中的波峰之半值寬度 W1(頻率為最大值之一半的高度上的波峰之寬度)表示凹凸圖案之配向度。半值寬度W1越大,則表示蛇行使得間距越不均勻。 Next, in Fig. 4, the auxiliary line L 3 is orthogonal to the auxiliary line L 2 at the portion of the value X, and the luminance on the auxiliary line L 3 is drawn (see Fig. 6). In order to compare with various concavo-convex structures, the horizontal axis of Fig. 6 is a value obtained by dividing the X value. The horizontal axis of Fig. 6 indicates an index (orientation) indicating the degree of inclination with respect to the direction in which the unevenness is formed (the vertical direction in Fig. 3), and the vertical axis indicates the frequency. The half value width W 1 of the peak in the depiction of Fig. 6 (the width of the peak at a height of one half of the maximum value) indicates the degree of alignment of the concave and convex pattern. The larger the half value width W 1 , the more random the pitch is.
上述配向度較好的是0.3~1.0。若配向度為0.3~1.0,則凹凸圖案12a之間距之不均勻較大,因此該凹凸圖案形成片及將該凹凸圖案形成片用作工程片原版而獲得之光擴散體之光擴散性更高。若配向度超過1.0,則凹凸圖案之方向會於某程度變得隨機,因此光擴散性變高,但異向性變低。 The above alignment is preferably from 0.3 to 1.0. When the degree of alignment is 0.3 to 1.0, the unevenness between the uneven patterns 12a is large. Therefore, the uneven pattern forming sheet and the light diffusing body obtained by using the concave-convex pattern forming sheet as the original sheet of the engineering sheet have higher light diffusibility. . When the degree of alignment exceeds 1.0, the direction of the concavo-convex pattern becomes random to some extent, and thus the light diffusibility becomes high, but the anisotropy becomes low.
為了使配向度為0.3~1.0,可適當選擇凹凸圖案形成片製造時所必要的壓縮應力之作用對象。 In order to adjust the degree of alignment to 0.3 to 1.0, the target of the compressive stress necessary for the production of the uneven pattern forming sheet can be appropriately selected.
構成硬質層12之第2樹脂的玻璃轉移溫度Tg2與構成基材11之第1樹脂的玻璃轉移溫度Tg1之差(Tg2-Tg1)為10℃以上的本發明之凹凸圖案形成片10,可藉由下述之凹凸圖案形成片之製造方法而獲得,因此可簡便地製造。 The uneven pattern forming sheet of the present invention having a difference between the glass transition temperature Tg 2 of the second resin constituting the hard layer 12 and the glass transition temperature Tg 1 of the first resin constituting the substrate 11 (Tg 2 -Tg 1 ) of 10 ° C or more 10. Since it can be obtained by the following manufacturing method of the uneven pattern forming sheet, it can be easily manufactured.
又,本發明者調查後之結果判明,當基材11及硬質層12均為透明時,凹凸圖案12a之最頻間距A超過1μm且為20μm以下,凹凸圖案12a之底部12b之平均深度B為將上述最頻間距A設為100%時之10%以上,亦即本發明之凹凸圖案形成片10具有充分之光擴散性,因此可用作光擴散體。 Further, as a result of investigation by the inventors, it has been found that when both the substrate 11 and the hard layer 12 are transparent, the most frequent pitch A of the uneven pattern 12a is more than 1 μm and 20 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a is When the above-mentioned maximum frequency spacing A is 10% or more, that is, the concave-convex pattern forming sheet 10 of the present invention has sufficient light diffusibility, it can be used as a light diffusing body.
再者,本發明之凹凸圖案形成片並非限定於上述實施形態。例如,本發明之凹凸圖案形成片的凹凸圖案之凸部之頂端亦可為尖頂。然而,就進一步提高擴散之異向性而言,凹凸圖案之凸部較好的是頂端帶有弧度之形狀。 Further, the uneven pattern forming sheet of the present invention is not limited to the above embodiment. For example, the tip end of the convex portion of the concave-convex pattern of the concave-convex pattern forming sheet of the present invention may be a pointed top. However, in terms of further improving the anisotropy of diffusion, the convex portion of the concave-convex pattern is preferably a shape having a curvature at the tip end.
進而,本發明者調查後之結果判明,使凹凸圖案12a之最頻間距A為1μm以下,尤其為0.04μm以下,且凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上,尤其為100%以上,藉 此可發揮作為光學元件之優異之性能。具體而言,在將凹凸圖案形成片10用作防反射體時,可降低反射率,又,在將凹凸圖案形成片10用作相位差板時,可遍及較廣之波長區域而產生相同之相位差。 Further, as a result of investigation by the inventors, it has been found that the most frequent pitch A of the uneven pattern 12a is 1 μm or less, particularly 0.04 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a is set to 100. 10% or more of %, especially 100% or more, borrowed This can serve as an excellent performance as an optical component. Specifically, when the concave-convex pattern forming sheet 10 is used as an antireflection body, the reflectance can be lowered, and when the concave-convex pattern forming sheet 10 is used as a phase difference plate, the same can be generated over a wide wavelength region. Phase difference.
其原因在於,當凹凸圖案12a之最頻間距A較短,為1μm以下時,平均深度B較深,為將最頻間距A設為100%時之10%以上。亦即,最頻間距A較短,與可見光之波長相同或者在可見光之波長以下,因而可見光難以因凹凸而產生繞射或散射。而且,因平均深度B較深,故中間折射率連續地變化之部分在厚度方向上變長,因此可顯著發揮抑制光反射之效果。又,因最頻間距A較短、平均深度B較深,故折射率彼此不同之空氣與凹凸圖案形成片交替地配置之部分在厚度方向上變長,呈現出光學異向性之部分變長,因此可產生相位差。進而,由上述凹凸圖案12a所產生之相位差遍及較廣之波長區域而大致相同。 This is because when the pitch A of the concave-convex pattern 12a is short and 1 μm or less, the average depth B is deep, and is 10% or more when the most frequent pitch A is 100%. That is, the minimum frequency spacing A is short, the same as the wavelength of visible light or below the wavelength of visible light, so that visible light is less likely to be diffracted or scattered by the unevenness. Further, since the average depth B is deep, the portion in which the intermediate refractive index continuously changes becomes longer in the thickness direction, so that the effect of suppressing light reflection can be remarkably exhibited. Further, since the most frequent pitch A is short and the average depth B is deep, the portion in which the air having different refractive indices and the concave-convex pattern forming sheet are alternately arranged becomes longer in the thickness direction, and the portion exhibiting optical anisotropy becomes longer. Therefore, a phase difference can be generated. Further, the phase difference generated by the uneven pattern 12a is substantially the same over a wide wavelength region.
此時之硬質層12相對於基材11而言折射率較低,但可獲得較高之防反射特性,因此較好。 At this time, the hard layer 12 has a relatively low refractive index with respect to the substrate 11, but is excellent in antireflection characteristics.
進而,硬質層12之厚度較好的是1~100nm。若硬質層12之厚度為1nm以上,則硬質層12難以產生缺陷,若硬質層12之厚度為100nm以下,則硬質層12可充分確保透光性。 Further, the thickness of the hard layer 12 is preferably from 1 to 100 nm. When the thickness of the hard layer 12 is 1 nm or more, the hard layer 12 is less likely to cause defects, and when the thickness of the hard layer 12 is 100 nm or less, the hard layer 12 can sufficiently ensure light transmittance.
又,硬質層12之厚度更好的是50nm以下,尤其好的是20nm以下。若硬質層12之厚度為50nm以下,則如下所述可容易製造凹凸圖案形成片。 Further, the thickness of the hard layer 12 is more preferably 50 nm or less, and particularly preferably 20 nm or less. When the thickness of the hard layer 12 is 50 nm or less, the uneven pattern forming sheet can be easily produced as follows.
又,為了提高密著性及形成更微細之構造,亦可在基材11與硬質層12之間形成底塗層。 Further, in order to improve adhesion and form a finer structure, an undercoat layer may be formed between the substrate 11 and the hard layer 12.
進而,亦可於硬質層12上設置樹脂層。 Further, a resin layer may be provided on the hard layer 12.
凹凸圖案形成片10之凹凸圖案12a之最頻間距A為1μm以下,較好的是0.4μm以下。又,從可容易形成凹凸圖案12a之角度而言,最 頻間距A較好的是0.05μm以上。 The most frequent pitch A of the uneven pattern 12a of the uneven pattern forming sheet 10 is 1 μm or less, preferably 0.4 μm or less. Moreover, from the viewpoint that the uneven pattern 12a can be easily formed, the most The frequency spacing A is preferably 0.05 μm or more.
較好的是,凹凸圖案12a之各間距A1、A2、A3...均為最頻間距A之±60%之範圍內,更好的是±30%之範圍內。若各間距為最頻間距A之±60%之範圍內,則間距均勻,可發揮作為光學元件之更優異之性能。 It is preferable that the pitches A 1 , A 2 , and A 3 of the uneven pattern 12a are within ±60% of the most frequent pitch A, and more preferably within ±30%. When the pitch is within ±60% of the most frequent pitch A, the pitch is uniform and the performance as an optical element can be exhibited.
又,在滿足最頻間距A為1μm以下之後,各間距A1、A2、A3...均亦可連續地變化。 Further, after satisfying the most frequent pitch A of 1 μm or less, each of the pitches A 1 , A 2 , and A 3 ... may be continuously changed.
較好的是,凹凸圖案12a之各深度B1、B2、B3...均均為平均深度B之±60%之範圍內,更好的是±30%之範圍內。若各深度為平均深度B之±60%之範圍內,則深度均勻,可發揮作為光學元件之更優異之性能。 It is preferable that each of the depths B 1 , B 2 , B 3 ... of the concavo-convex pattern 12a is within ±60% of the average depth B, and more preferably within ±30%. When each depth is within ±60% of the average depth B, the depth is uniform and the performance as an optical element can be exhibited.
又,在滿足平均深度B為將最頻間距A設為100%時的10%以上之後,各深度B1、B2、B3...均亦可連續地變化。 Further, when the average depth B is satisfied to be 10% or more when the most frequent pitch A is 100%, each of the depths B 1 , B 2 , and B 3 can be continuously changed.
如下所述,凹凸圖案形成片10除了可應用於防反射體、相位差板等光學元件及光學元件製造用工程片以外,亦可利用於超潑水片或超親水片等。 As described below, the concave-convex pattern forming sheet 10 can be applied to an optical element such as an antireflection body or a retardation film and an engineering sheet for optical element production, and can be used for an ultra-water-repellent sheet or a super-hydrophilic sheet.
再者,凹凸圖案形成片並非限定於上述實施形態。例如,於上述實施形態中,硬質層具有沿著該凹凸圖案形成片之寬度方向的週期性之波狀凹凸圖案,但除了該凹凸圖案以外,亦可具有沿著凹凸圖案形成片之長度方向的週期性之波狀凹凸圖案。進而,硬質層亦可具有大量沿著特定方向之波狀凹凸圖案。於該等情形時,使凹凸圖案之最頻間距為1μm以下,且凹凸圖案之底部之平均深度為將上述最頻間距設為100%時之10%以上,藉此呈現出作為光學元件之優異之性能。 Further, the uneven pattern forming sheet is not limited to the above embodiment. For example, in the above embodiment, the hard layer has a periodic corrugated concavo-convex pattern along the width direction of the concavo-convex pattern forming sheet. However, in addition to the concavo-convex pattern, the hard layer may have a longitudinal direction along the concavo-convex pattern forming sheet. Periodic undulating pattern. Further, the hard layer may have a large number of undulating concave and convex patterns along a specific direction. In such a case, the pitch of the concave-convex pattern is 1 μm or less, and the average depth of the bottom of the concave-convex pattern is 10% or more when the above-mentioned worst-frequency pitch is 100%, thereby exhibiting excellent as an optical element. Performance.
從折射率角度而言,凸部之形狀較好的是頂端為尖頂,但頂端亦可帶有弧度。 From the viewpoint of the refractive index, the shape of the convex portion is preferably that the tip is a apex, but the tip may also have a curvature.
當凹凸圖案並未非著特定方向時,可以下述方式求出最頻間 距。首先,藉由原子間力顯微鏡來拍攝凹凸圖案之上表面,將該圖像轉換成灰度文檔(例如,tiff格式等)。於灰度文檔之圖像(參照圖24)中,白度越低之處,則表示凹部之底部越深(白度越高之處,則凸部之頂部越高)。繼而,對灰度文檔之圖像進行傅立葉轉換。圖25中顯示傅立葉轉換後之圖像。傅立葉轉換後之圖像中,自白色部分之中心而觀察之方向表示灰度之方向性,又,自中心至白色部分為止之距離之倒數表示灰度圖像之週期。當凹凸圖案並非沿著特定方向時,成為如圖26所示之顯示有圓環之圖像。其次,自傅立葉轉換後之圖像中的圓環中心引朝向外側的直線狀之輔助線L2,並對與中心之距離(X軸)上之亮度(Y軸)進行描繪(參照圖24)。繼而,讀取表示該描繪中之極大值的X軸之值r。該r值之倒數(1/r)為最頻間距。 When the concave-convex pattern is not in a specific direction, the most frequent pitch can be obtained in the following manner. First, the upper surface of the concave-convex pattern is photographed by an atomic force microscope, and the image is converted into a grayscale document (for example, a tiff format or the like). In the image of the grayscale document (refer to FIG. 24), the lower the whiteness, the deeper the bottom of the concave portion (the higher the whiteness, the higher the top of the convex portion). Then, Fourier transform is performed on the image of the grayscale document. The Fourier transformed image is shown in FIG. In the Fourier-transformed image, the direction observed from the center of the white portion indicates the directionality of the gradation, and the reciprocal of the distance from the center to the white portion indicates the period of the gradation image. When the concave-convex pattern is not along a specific direction, it becomes an image in which a ring is displayed as shown in FIG. Next, the center of the circle in the image after the Fourier transform is directed to the linear auxiliary line L 2 on the outer side, and the brightness (Y axis) on the distance from the center (X axis) is drawn (refer to FIG. 24). . Then, the value r of the X-axis indicating the maximum value in the depiction is read. The reciprocal of the r value (1/r) is the most frequent spacing.
當硬質層12係由金屬或金屬化合物構成時,容易獲得凹凸圖案形成片10,因此金屬較好。 When the hard layer 12 is composed of a metal or a metal compound, the uneven pattern forming sheet 10 is easily obtained, and therefore the metal is preferable.
作為金屬,楊氏模量不會過高,可更容易形成凹凸圖案12a,因此較好的是選自由金、鋁、銀、碳、銅、鍺、銦、鎂、鈮、鈀、鉛、鉑、矽、錫、鈦、釩、鋅、鉍所組成之群中之至少一種金屬。此處所言之金屬亦包含半金屬。 As the metal, the Young's modulus is not too high, and the uneven pattern 12a can be formed more easily, so it is preferably selected from the group consisting of gold, aluminum, silver, carbon, copper, bismuth, indium, magnesium, bismuth, palladium, lead, and platinum. At least one metal selected from the group consisting of bismuth, tin, titanium, vanadium, zinc, and antimony. The metal referred to herein also contains a semimetal.
作為金屬化合物,因同樣之理由,故較好的是選自由氧化鈦、氧化鋁、氧化鋅、氧化鎂、氧化錫、氧化銅、氧化銦、氧化鎘、氧化鉛、氧化矽、氟化鋇、氟化鉀、氟化鎂、硫化鋅、砷化鎵所組成之群中之至少一種金屬化合物。 The metal compound is preferably selected from the group consisting of titanium oxide, aluminum oxide, zinc oxide, magnesium oxide, tin oxide, copper oxide, indium oxide, cadmium oxide, lead oxide, antimony oxide, antimony fluoride, and the like. At least one metal compound of the group consisting of potassium fluoride, magnesium fluoride, zinc sulfide, and gallium arsenide.
再者,當硬質層12由金屬構成時,有時層表面會受到空氣氧化而形成空氣氧化膜,但本發明中,如此之金屬層之表面被空氣氧化後的層亦看作由金屬所構成之層。 Further, when the hard layer 12 is made of a metal, the surface of the layer may be oxidized by air to form an air oxide film. However, in the present invention, the layer of such a metal layer which is oxidized by air is also regarded as composed of metal. Layer.
硬質層12之厚度較好的是超過0.01μm且為0.2μm以下,更好的 是0.02~0.1μm。若硬質層之厚度超過0.01μm且為0.2μm以下,則如下所述可容易製造凹凸圖案形成片。 The thickness of the hard layer 12 is preferably more than 0.01 μm and less than 0.2 μm, more preferably It is 0.02~0.1μm. When the thickness of the hard layer exceeds 0.01 μm and is 0.2 μm or less, the uneven pattern forming sheet can be easily produced as follows.
又,為了提高密著性及形成更微細之構造,亦可在基材11與硬質層12之間形成底塗層。 Further, in order to improve adhesion and form a finer structure, an undercoat layer may be formed between the substrate 11 and the hard layer 12.
凹凸圖案形成片10之凹凸圖案12a之最頻間距A超過1μm且為20μm以下,較好的是超過1μm且為10μm以下。當最頻間距A不足1μm時以及超過20μm時,即便將凹凸圖案形成片10用作光擴散體製造用工程片原版,亦難以獲得光擴散性較高之光擴散體。 The most frequent pitch A of the uneven pattern 12a of the uneven pattern forming sheet 10 is more than 1 μm and is 20 μm or less, preferably more than 1 μm and not more than 10 μm. When the most frequent pitch A is less than 1 μm and exceeds 20 μm, even if the uneven pattern forming sheet 10 is used as an original for producing a light diffusing body, it is difficult to obtain a light diffusing body having high light diffusibility.
以下對本發明之凹凸圖案形成片之製造方法之一實施形態進行說明。 Hereinafter, an embodiment of a method for producing a concave-convex pattern forming sheet of the present invention will be described.
如圖7所示,本實施形態之凹凸圖案形成片之製造方法包括以下步驟:於作為樹脂製基材之加熱收縮性薄膜11a之一面上,設置表面平滑之硬質層13(以下,稱為表面平滑硬質層13),以形成積層片10a(以下,稱為第1步驟);以及使加熱收縮性薄膜11a加熱收縮,並使積層片10a之至少表面平滑硬質層13以摺疊之方式而變形(以下,稱為第2步驟)。 As shown in Fig. 7, the method for producing a concave-convex pattern forming sheet according to the present embodiment includes a step of providing a hard layer 13 having a smooth surface (hereinafter referred to as a surface) on one surface of a heat shrinkable film 11a as a resin substrate. The hard layer 13) is smoothed to form a laminated sheet 10a (hereinafter referred to as a first step); and the heat shrinkable film 11a is heated and shrunk, and at least the surface smoothing layer 13 of the laminated sheet 10a is deformed by folding ( Hereinafter, it is called a 2nd step).
此處,表面平滑硬質層13係指JIS B0601中記載之中心線平均粗糙度為0.1μm以下之層。 Here, the surface smooth hard layer 13 is a layer having a center line average roughness of 0.1 μm or less described in JIS B0601.
於第1步驟中,作為於加熱收縮性薄膜11a之一面上設置樹脂製表面平滑硬質層13以形成積層片10a之方法,可列舉例如:於加熱收縮性薄膜11a之一面上,利用旋轉塗佈機或刮棒塗佈機等來塗佈第2樹脂之溶液或分散液,並使溶劑乾燥之方法;於加熱收縮性薄膜11a之一面上,積層預先製作之表面平滑硬質層13之方法等。 In the first step, a method of forming the smooth surface layer 13 made of resin on one surface of the heat shrinkable film 11a to form the laminated sheet 10a is exemplified by spin coating on one surface of the heat shrinkable film 11a. A method of applying a solution or dispersion of the second resin by a machine or a bar coater to dry the solvent, and a method of laminating a surface smoothing hard layer 13 prepared in advance on one surface of the heat shrinkable film 11a.
作為加熱收縮性薄膜11a,可使用例如聚對苯二甲酸乙二酯系收 縮薄膜、聚苯乙烯系收縮薄膜、聚烯烴系收縮薄膜、聚氯乙烯系收縮薄膜等。 As the heat shrinkable film 11a, for example, polyethylene terephthalate can be used. A shrink film, a polystyrene shrink film, a polyolefin shrink film, a polyvinyl chloride shrink film, or the like.
於收縮薄膜之中,尤其好的是收縮50~70%之收縮薄膜。若使用收縮50~70%之收縮薄膜,則可使變形率為50%以上,從而可容易製造凹凸圖案12a之最頻間距A超過1μm且為20μm以下、凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上的凹凸圖案形成片10。進而,亦可容易製造凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之100%以上的凹凸圖案形成片10。 Among the shrink films, it is particularly preferred to shrink the shrink film of 50 to 70%. When a shrink film having a shrinkage of 50 to 70% is used, the deformation ratio can be 50% or more, and the most frequent pitch A of the uneven pattern 12a can be easily made more than 1 μm and 20 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily obtained. The sheet 10 is formed in a concave-convex pattern of 10% or more when the most frequent pitch A is 100%. Further, the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily produced as the uneven pattern forming sheet 10 having 100% or more when the most frequent pitch A is 100%.
此處,變形率係指(變形前之長度-變形後之長度)/(變形前之長度)×100(%),或者係指(變形後之長度)/(變形前之長度)×100(%)。 Here, the deformation rate means (length before deformation - length after deformation) / (length before deformation) × 100 (%), or means (length after deformation) / (length before deformation) × 100 ( %).
又,利用以下步驟可使凹凸圖案12a之平均深度B為將最頻間距A設為100%時之300%。 Further, the average depth B of the uneven pattern 12a can be made 300% when the most frequent pitch A is set to 100% by the following procedure.
於加熱收縮性薄膜11a上,塗佈玻璃轉移溫度低於加熱收縮性薄膜11a之底塗樹脂層,並於該底塗樹脂層上形成設置有表面硬質平滑層13之積層片。使該積層片加熱收縮,藉此形成凹凸圖案形成片。 On the heat-shrinkable film 11a, a primer resin layer having a glass transition temperature lower than that of the heat shrinkable film 11a is applied, and a laminate sheet provided with the surface hard smooth layer 13 is formed on the primer resin layer. The laminated sheet is heat-shrinked, whereby a concave-convex pattern forming sheet is formed.
自積層片上剝離加熱收縮後之加熱收縮性薄膜11a,並貼合其他之加熱收縮性薄膜,形成積層片。使該積層片加熱收縮,藉此可使平均深度B大於使1片加熱收縮性薄膜加熱收縮後之情形。反覆進行複數次該步驟後,可使凹凸圖案12a之平均深度B為將最頻間距A設為100%時之300%。 The heat shrinkable film 11a after heat shrinkage is peeled off from the laminated sheet, and another heat shrinkable film is bonded to form a laminated sheet. The laminated sheet is heated and shrunk, whereby the average depth B can be made larger than the case where one sheet of the heat shrinkable film is heated and shrunk. After repeating this step a plurality of times, the average depth B of the uneven pattern 12a can be set to 300% when the most frequent pitch A is set to 100%.
本發明中,使表面平滑硬質層13之厚度超過0.05μm且為5.0μm以下,較好的是0.1~1.0μm。將表面平滑硬質層13之厚度設為上述範圍,藉此可使凹凸圖案12a之最頻間距A可靠地超過1μm且為20μm以下。 In the present invention, the thickness of the surface smoothing hard layer 13 is more than 0.05 μm and 5.0 μm or less, preferably 0.1 to 1.0 μm. By setting the thickness of the surface smoothing hard layer 13 to the above range, the most frequent pitch A of the uneven pattern 12a can be reliably more than 1 μm and 20 μm or less.
然而,若表面平滑硬質層13之厚度為0.05μm以下,則最頻間距A有時會在1μm以下,若表面平滑硬質層13之厚度超過5.0μm,則最 頻間距A有時會超過20μm。 However, if the thickness of the surface smooth hard layer 13 is 0.05 μm or less, the most frequent pitch A may be 1 μm or less, and if the thickness of the surface smooth hard layer 13 exceeds 5.0 μm, the most The frequency spacing A sometimes exceeds 20 μm.
又,本發明中,將表面平滑硬質層13藉由玻璃轉移溫度相較於構成加熱收縮性薄膜之樹脂(第1樹脂)高出10℃以上之樹脂(第2樹脂)所構成。由於第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度滿足上述關係,故可使凹凸圖案12a之最頻間距A可靠地超過1μm且為20μm以下。 In the present invention, the surface smoothing hard layer 13 is composed of a resin (second resin) having a glass transition temperature higher than that of the resin (first resin) constituting the heat shrinkable film by 10 ° C or more. Since the glass transition temperature of the first resin and the glass transition temperature of the second resin satisfy the above relationship, the most frequent pitch A of the uneven pattern 12a can be reliably more than 1 μm and 20 μm or less.
表面平滑硬質層13之厚度亦可連續地變化。當表面平滑硬質層13之厚度連續地變化時,壓縮後所形成之凹凸圖案12a之間距及深度會連續地變化。 The thickness of the surface smooth hard layer 13 may also vary continuously. When the thickness of the surface smooth hard layer 13 is continuously changed, the distance and depth between the concavo-convex patterns 12a formed after compression are continuously changed.
該製造方法中,從可更容易形成凹凸圖案12a之角度而言,較好的是將表面平滑硬質層13之楊氏模量設為0.01~300GPa,更好的是將其設為0.1~10GPa。 In the manufacturing method, from the viewpoint that the uneven pattern 12a can be more easily formed, it is preferable to set the Young's modulus of the surface smooth hard layer 13 to 0.01 to 300 GPa, and more preferably to 0.1 to 10 GPa. .
在使積層片10a變形時,較好的是使表面平滑硬質層13以5%以上之變形率而變形。若使表面平滑硬質層13以5%以上之變形率而變形,則可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上。 When the laminated sheet 10a is deformed, it is preferred that the surface smoothing hard layer 13 is deformed at a deformation ratio of 5% or more. When the surface smooth hard layer 13 is deformed by a deformation ratio of 5% or more, the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made 10% or more when the most frequent pitch A is 100%.
進而,更好的是使表面平滑硬質層13以50%以上之變形率而變形。若使表面平滑硬質層13以50%以上之變形率而變形,則可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之100%以上。 Further, it is more preferable to deform the surface smooth hard layer 13 by a deformation ratio of 50% or more. When the surface smooth hard layer 13 is deformed by a deformation ratio of 50% or more, the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made 100% or more when the most frequent pitch A is 100%.
又,當硬質層12係由金屬或金屬化合物構成時,作為形成積層片10a之方法,可列舉例如:於加熱收縮性薄膜11a之一面上蒸鍍金屬或金屬化合物之方法;於加熱收縮性薄膜11a之一面上,積層預先製作之表面平滑硬質層13之方法等。 Further, when the hard layer 12 is made of a metal or a metal compound, as a method of forming the laminated sheet 10a, for example, a method of vapor-depositing a metal or a metal compound on one side of the heat shrinkable film 11a; and a heat shrinkable film may be mentioned. On one of the faces of 11a, a method of laminating a pre-made surface smoothing hard layer 13 or the like.
於該製造方法中,從可更容易形成凹凸圖案12a之角度而言,較 好的是將表面平滑硬質層13之楊氏模量設為0.1~500GPa,更好的是設為1~150GPa。 In the manufacturing method, from the viewpoint that the uneven pattern 12a can be more easily formed, Preferably, the Young's modulus of the surface smooth hard layer 13 is set to 0.1 to 500 GPa, and more preferably 1 to 150 GPa.
為了將表面平滑硬質層13之楊氏模量設為上述範圍,較好的是將表面平滑硬質層13藉由選自由金、鋁、銀、碳、銅、鍺、銦、鎂、鈮、鈀、鉛、鉑、矽、錫、鈦、釩、鋅、鉍所組成之群中之至少一種金屬所構成。或者,較好的是將表面平滑硬質層13藉由選自由氧化鈦、氧化鋁、氧化鋅、氧化鎂、氧化錫、氧化銅、氧化銦、氧化鎘、氧化鉛、氧化矽、氟化鋇、氟化鈣、氟化鎂、硫化鋅、砷化鎵所組成之群中之至少一種金屬化合物所構成。 In order to set the Young's modulus of the surface smooth hard layer 13 to the above range, it is preferred that the surface smooth hard layer 13 is selected from the group consisting of gold, aluminum, silver, carbon, copper, bismuth, indium, magnesium, bismuth, palladium. And at least one metal selected from the group consisting of lead, platinum, rhodium, tin, titanium, vanadium, zinc, and antimony. Alternatively, it is preferred that the surface smoothing hard layer 13 is selected from the group consisting of titanium oxide, aluminum oxide, zinc oxide, magnesium oxide, tin oxide, copper oxide, indium oxide, cadmium oxide, lead oxide, antimony oxide, antimony fluoride, It is composed of at least one metal compound of a group consisting of calcium fluoride, magnesium fluoride, zinc sulfide, and gallium arsenide.
此處,楊氏模量係根據JIS Z 2280-1993之「金屬材料之高溫楊氏模量測試方法」,將溫度變更為23℃而測定出之值。當硬質層由金屬化合物構成時亦相同。 Here, the Young's modulus is a value measured by changing the temperature to 23 ° C according to "Test Method for High Temperature Young's Modulus of Metallic Materials" of JIS Z 2280-1993. The same is true when the hard layer is composed of a metal compound.
表面平滑硬質層13之厚度超過0.01μm且為0.2μm以下,較好的是0.02~0.1μm。將表面平滑硬質層13之厚度設為上述範圍,藉此可使凹凸圖案12a之最頻間距A可靠地超過1μm且為20μm以下。然而,若表面平滑硬質層13之厚度不足0.01μm,則最頻間距A有時會成為1μm以下,若表面平滑硬質層13之厚度超過0.2μm,則最頻間距A有時會超過20μm。 The thickness of the surface smooth hard layer 13 is more than 0.01 μm and is 0.2 μm or less, preferably 0.02 to 0.1 μm. By setting the thickness of the surface smoothing hard layer 13 to the above range, the most frequent pitch A of the uneven pattern 12a can be reliably more than 1 μm and 20 μm or less. However, when the thickness of the surface smooth hard layer 13 is less than 0.01 μm, the most frequent pitch A may be 1 μm or less, and when the thickness of the surface smooth hard layer 13 exceeds 0.2 μm, the most frequent pitch A may exceed 20 μm.
又,表面平滑硬質層13之厚度亦可連續地變化。當表面平滑硬質層13之厚度連續地變化時,壓縮後所形成之凹凸圖案12a之間距及深度會連續地變化。 Further, the thickness of the surface smooth hard layer 13 may be continuously changed. When the thickness of the surface smooth hard layer 13 is continuously changed, the distance and depth between the concavo-convex patterns 12a formed after compression are continuously changed.
當使積層片10a變形時,較好的是使表面平滑硬質層13以5%以上之變形率而變形。若使表面平滑硬質層13以5%以上之變形率而變形,則可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上。 When the laminated sheet 10a is deformed, it is preferred that the surface smoothing hard layer 13 is deformed at a deformation ratio of 5% or more. When the surface smooth hard layer 13 is deformed by a deformation ratio of 5% or more, the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made 10% or more when the most frequent pitch A is 100%.
進而,更好的是使表面平滑硬質層13以50%以上之變形率而變 形。若使表面平滑硬質層13以50%以上之變形率而變形,則可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之100%以上。 Further, it is more preferable to make the surface smooth hard layer 13 change at a deformation rate of 50% or more. shape. When the surface smooth hard layer 13 is deformed by a deformation ratio of 50% or more, the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made 100% or more when the most frequent pitch A is 100%.
於第2步驟中,使加熱收縮性薄膜11a熱收縮,藉此於表面平滑硬質層13上,在相對於收縮方向之垂直方向上形成波狀之凹凸圖案12a,由此獲得硬質層12。 In the second step, the heat shrinkable film 11a is heat-shrinked, whereby the corrugated concave-convex pattern 12a is formed on the surface smooth hard layer 13 in the vertical direction with respect to the contraction direction, whereby the hard layer 12 is obtained.
作為使加熱收縮性薄膜11a加熱收縮時之加熱方法,可列舉於熱風、蒸氣或熱水中通過之方法等,其中,從可使加熱收縮性薄膜11a均勻地收縮之角度而言,尤其好的是於熱水中通過之方法。 The heating method for heating and shrinking the heat-shrinkable film 11a is, for example, a method of passing through hot air, steam or hot water, and the like, which is particularly preferable from the viewpoint of uniformly shrinking the heat-shrinkable film 11a. It is a method of passing in hot water.
使加熱收縮性薄膜11a熱收縮時之加熱溫度較好的是,根據所使用之加熱收縮性薄膜之種類、及目標凹凸圖案12a之間距與底部12b之深度而適當選擇。 The heating temperature at the time of thermally shrinking the heat shrinkable film 11a is preferably selected depending on the type of the heat shrinkable film to be used and the distance between the target uneven pattern 12a and the depth of the bottom portion 12b.
於該製造方法中,若表面平滑硬質層13之厚度越薄、表面平滑硬質層13之楊氏模量越低,則凹凸圖案12a之最頻間距A越小,若基材之變形率越高,則平均深度B越深。因此,為了將凹凸圖案12a設為特定之最頻間距A及平均深度B,必須適當選擇上述條件。 In the manufacturing method, if the thickness of the surface smooth hard layer 13 is thinner and the Young's modulus of the surface smooth hard layer 13 is lower, the smaller the frequency spacing A of the concave-convex pattern 12a is, the higher the deformation rate of the substrate is. , the deeper the average depth B is. Therefore, in order to set the concave-convex pattern 12a to the specific frequency spacing A and the average depth B, it is necessary to appropriately select the above conditions.
於以上所說明之凹凸圖案形成片之製造方法中,由於構成表面平滑硬質層13之第2樹脂相較於構成加熱收縮性薄膜11a之第1樹脂而言,玻璃轉移溫度高出10℃以上,因此在第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度之間的溫度時,表面平滑硬質層13之楊氏模量高於加熱收縮性薄膜11a。而且,由於將表面平滑硬質層13之厚度設為超過0.05μm且為5.0μm以下,因此在第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度之間的溫度進行加工時,表面平滑硬質層13於其說厚度增加,不如說被摺疊。進而,因表面平滑硬質層13積層於加熱收縮性薄膜11a上,故加熱收縮性薄膜11a之收縮所產生的應力整 體上均勻。因此,根據本發明,使表面平滑硬質層13以摺疊之方式而變形,可簡便且大面積地製造光擴散體之性能優異之凹凸圖案形成片10。 In the method for producing a concavo-convex pattern forming sheet, the glass transition temperature is higher than 10 ° C or higher in the second resin constituting the surface smooth hard layer 13 compared to the first resin constituting the heat shrinkable film 11 a. Therefore, when the temperature between the glass transition temperature of the first resin and the glass transition temperature of the second resin is higher, the Young's modulus of the surface smooth hard layer 13 is higher than that of the heat shrinkable film 11a. Further, since the thickness of the surface smoothing hard layer 13 is more than 0.05 μm and 5.0 μm or less, the surface is smooth and hard when processed at a temperature between the glass transition temperature of the first resin and the glass transition temperature of the second resin. The layer 13 is said to be thicker as it is said to be folded. Further, since the surface smooth hard layer 13 is laminated on the heat shrinkable film 11a, the stress caused by shrinkage of the heat shrinkable film 11a is integrated. Evenly on the body. Therefore, according to the present invention, the surface smoothing hard layer 13 is deformed by folding, and the uneven pattern forming sheet 10 excellent in the performance of the light diffusing body can be easily and widely produced.
並且,根據該製造方法,可容易使凹凸圖案12a之最頻間距A超過1μm且為20μm以下,並可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上。 According to this manufacturing method, the most frequent pitch A of the uneven pattern 12a can be easily more than 1 μm and 20 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made to be 100% when the most frequent pitch A is set to 100%. More than 10%.
又,作為凹凸圖案形成片之製造方法,亦可應用下述方法(1)~(4): Moreover, as a manufacturing method of the uneven pattern forming sheet, the following methods (1) to (4) can also be applied:
方法(1) method 1)
於基材11之整個一面上,設置表面平滑硬質層13以形成積層片10a,並在沿著表面之一方向上對整個積層片10a進行壓縮。 On the entire surface of the substrate 11, a smooth surface hard layer 13 is provided to form the laminated sheet 10a, and the entire laminated sheet 10a is compressed in one direction along the surface.
當基材11之玻璃轉移溫度低於室溫時,積層片10a之壓縮係於室溫中進行,當基材11之玻璃轉移溫度為室溫以上時,積層片10a之壓縮係於基材11之玻璃轉移溫度以上且低於表面平滑硬質層13之玻璃轉移溫度的溫度中進行。 When the glass transition temperature of the substrate 11 is lower than room temperature, the compression of the laminated sheet 10a is performed at room temperature, and when the glass transition temperature of the substrate 11 is above room temperature, the compression of the laminated sheet 10a is applied to the substrate 11 It is carried out at a temperature above the glass transition temperature and below the glass transition temperature of the surface smooth hard layer 13.
方法(2) Method (2)
於基材11之整個一面上,設置表面平滑硬質層13以形成積層片10a,使積層片10a向一方向延伸,並使與延伸方向正交之方向收縮,且在沿著表面之一方向上對表面平滑硬質層13進行壓縮。 On the entire surface of the substrate 11, a smooth surface hard layer 13 is provided to form the laminated sheet 10a, the laminated sheet 10a is extended in one direction, and the direction orthogonal to the extending direction is contracted, and in the direction along one of the surfaces The surface smoothing hard layer 13 is compressed.
當基材11之玻璃轉移溫度低於室溫時,積層片10a之延伸係於室溫中進行,當基材11之玻璃轉移溫度為室溫以上時,積層片10a之延伸係於基材11之玻璃轉移溫度以上且低於表面平滑硬質層13之玻璃轉移溫度的溫度中進行。 When the glass transition temperature of the substrate 11 is lower than room temperature, the extension of the laminated sheet 10a is performed at room temperature, and when the glass transition temperature of the substrate 11 is above room temperature, the extension of the laminated sheet 10a is applied to the substrate 11 It is carried out at a temperature above the glass transition temperature and below the glass transition temperature of the surface smooth hard layer 13.
方法(3) Method (3)
於由未硬化之電離放射線硬化性樹脂所形成之基材11上,積層表面平滑硬質層13以形成積層片10a,並照射電離放射線而使基材11硬 化,藉此使其收縮,並在沿著表面之至少一方向對積層於基材11上之表面平滑硬質層13進行壓縮。 On the substrate 11 formed of the uncured ionizing radiation curable resin, the hard surface layer 13 is smoothed to form the laminated sheet 10a, and the ionizing radiation is irradiated to make the substrate 11 hard. Thereby, it shrinks and compresses the surface smooth hard layer 13 laminated on the substrate 11 in at least one direction along the surface.
方法(4) Method (4)
於使溶劑膨潤而膨脹之基材11上,積層表面平滑硬質層13以形成積層片10a,將基材11中之溶劑乾燥、去除,藉此使其收縮,並在沿著表面之至少一方向對積層於基材11上之表面平滑硬質層13進行壓縮。 On the substrate 11 which swells and expands the solvent, the hard surface layer 13 is smoothed to form a laminated sheet 10a, and the solvent in the substrate 11 is dried and removed, thereby shrinking and at least one direction along the surface. The surface smooth hard layer 13 laminated on the substrate 11 is compressed.
於方法(1)中,作為形成積層片10a之方法,可列舉例如:於基材11之一面上,藉由旋轉塗佈機或刮棒塗佈機等來塗佈樹脂之溶液或分散液,並使溶劑乾燥之方法;於基材11之一面上,積層預先製作之表面平滑硬質層13之方法等。 In the method (1), as a method of forming the laminated sheet 10a, for example, a solution or dispersion of a resin is applied to one surface of the substrate 11 by a spin coater or a bar coater. A method of drying the solvent; a method of laminating a previously prepared surface smoothing hard layer 13 on one side of the substrate 11.
作為在沿著表面之一方向上對整個積層片10a進行壓縮之方法,可列舉例如:以老虎鉗等夾住積層片10a之一端部及其相反側之端部而進行壓縮之方法等。 As a method of compressing the entire laminated sheet 10a in one direction along the surface, for example, a method of compressing the end portion of one end portion of the laminated sheet 10a and the opposite side thereof by a vise or the like is performed.
於方法(2)中,作為使積層片10a向一方向延伸之方法,可列舉例如:拉伸積層片10a之一端部及其相反側之端部而使其延伸之方法等。 In the method (2), as a method of extending the laminated sheet 10a in one direction, for example, a method of stretching one end portion of the laminated sheet 10a and an end portion on the opposite side thereof to extend it may be mentioned.
於方法(3)中,作為電離放射線硬化性樹脂,可列舉紫外線硬化型樹脂或電子射線硬化型樹脂等。 In the method (3), examples of the ionizing radiation curable resin include an ultraviolet curable resin or an electron beam curable resin.
於方法(4)中,溶劑可根據第1樹脂之種類而適當選擇。溶劑之乾燥溫度可根據溶劑之種類而適當選擇。 In the method (4), the solvent can be appropriately selected depending on the type of the first resin. The drying temperature of the solvent can be appropriately selected depending on the kind of the solvent.
對於方法(2)~(4)中之表面平滑硬質層13,均可使用與方法(1)中相同之成分,且可使用相同之厚度。又,積層片10a之形成方法與方法(1)同樣地可應用以下方法:於基材11之一面上塗佈樹脂之溶液或分散液,並使溶劑乾燥之方法;於基材11之一面上積層預先製作之表面平滑硬質層13之方法。 For the surface smooth hard layer 13 in the methods (2) to (4), the same components as in the method (1) can be used, and the same thickness can be used. Further, in the method of forming the laminated sheet 10a, similarly to the method (1), a method of applying a solution or dispersion of a resin onto one surface of the substrate 11 and drying the solvent may be applied to one side of the substrate 11. A method of laminating a pre-made surface smoothing hard layer 13.
當將凹凸圖案12a之最頻間距A設為1μm以下時,於方法(1)中,表面平滑硬質層13之厚度較好的是50nm以下,更好的是20nm以下。若表面平滑硬質層13之厚度為50nm以下,則能夠可靠地使凹凸圖案12a之最頻間距A為1μm以下。 When the mode gap A of the uneven pattern 12a is 1 μm or less, in the method (1), the thickness of the surface smooth hard layer 13 is preferably 50 nm or less, more preferably 20 nm or less. When the thickness of the surface smooth hard layer 13 is 50 nm or less, the most frequent pitch A of the uneven pattern 12a can be reliably made 1 μm or less.
又,從壓縮後之硬質層12難以產生缺陷之角度而言,表面平滑硬質層13較好的是1nm以上。 Further, the surface smooth hard layer 13 is preferably 1 nm or more from the viewpoint that the hard layer 12 after compression is less likely to cause defects.
於此情形時,使表面平滑硬質層13藉由玻璃轉移溫度相較於第1樹脂高出10℃以上之第2樹脂而構成。使表面平滑硬質層13藉由玻璃轉移溫度相較於第1樹脂高出10℃以上之第2樹脂所構成時,可於壓縮時使基材11變形之狀態下使表面平滑硬質層13呈波狀彎曲而蛇行變形,由此可容易形成凹凸圖案12a。 In this case, the surface smoothing hard layer 13 is formed by a second resin having a glass transition temperature higher than the first resin by 10 ° C or more. When the surface smoothing hard layer 13 is composed of a second resin having a glass transition temperature higher than 10 ° C or higher than the first resin, the surface smoothing layer 13 can be waved in a state where the substrate 11 is deformed during compression. The shape is curved and the meandering is deformed, whereby the uneven pattern 12a can be easily formed.
於以上所說明之凹凸圖案形成片之製造方法中,由於構成表面平滑硬質層13之第2樹脂相較於構成基材11之第1樹脂而言,玻璃轉移溫度高出10℃以上,因此在第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度之間的溫度時,表面平滑硬質層13之楊氏模量高於基材11。因而,當在第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度之間的溫度進行加工時,表面平滑硬質層13與其說厚度增加,不如說被摺疊。進而,因表面平滑硬質層13積層於基材11上,故壓縮或收縮所產生的應力整體上均勻。因此,根據本發明,可容易使表面平滑硬質層13蛇行變形而製造凹凸圖案形成片10,從而可簡便且大面積地製造性能優異之凹凸圖案形成片10作為光學元件。 In the method for producing a concave-convex pattern forming sheet described above, the second resin phase constituting the smooth surface of the hard layer 13 has a glass transition temperature higher than 10 ° C or higher than the first resin constituting the substrate 11 . When the temperature between the glass transition temperature of the first resin and the glass transition temperature of the second resin is higher, the Young's modulus of the surface smooth hard layer 13 is higher than that of the substrate 11. Therefore, when the temperature is between the glass transition temperature of the first resin and the glass transition temperature of the second resin, the surface smooth hard layer 13 is not so thick as it is folded. Further, since the surface smooth hard layer 13 is laminated on the substrate 11, the stress generated by compression or contraction is uniform as a whole. Therefore, according to the present invention, the surface smoothing hard layer 13 can be easily deformed to produce the uneven pattern forming sheet 10, and the uneven pattern forming sheet 10 excellent in performance can be easily produced and printed as an optical element.
並且,根據該製造方法,可容易縮短凹凸圖案12a之最頻間距A,因此可使平均深度B變深。具體而言,可容易使凹凸圖案12a之最頻間距A為1μm以下,且可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上。 Further, according to this manufacturing method, the most frequent pitch A of the uneven pattern 12a can be easily shortened, so that the average depth B can be made deeper. Specifically, the most frequent pitch A of the uneven pattern 12a can be easily made 1 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made 10% or more when the maximum pitch A is 100%.
進而,根據該製造方法,可容易使凹凸圖案12a中的各間距A1、A2、A3...及各深度B1、B2、B3...均勻。 Further, according to this manufacturing method, it is possible to easily make the pitches A 1 , A 2 , A 3 ... and the respective depths B 1 , B 2 , B 3 ... in the uneven pattern 12a uniform.
當使用金屬或金屬化合物作為表面平滑硬質層而進行製造時,於第2步驟中,加熱收縮性薄膜11a產生熱收縮,藉此於表面平滑硬質層13上,在與收縮方向垂直之方向上形成波狀之凹凸圖案12a,從而成為硬質層12。 When a metal or a metal compound is used as the surface smooth hard layer for production, in the second step, the heat shrinkable film 11a is thermally contracted, whereby the surface smoothing hard layer 13 is formed in a direction perpendicular to the shrinking direction. The corrugated concave-convex pattern 12a becomes the hard layer 12.
作為使加熱收縮性薄膜11a加熱收縮時之加熱方法,可列舉於熱風、蒸氣或熱水中通過之方法等,其中,從可使加熱收縮性薄膜11a均勻地收縮之角度而言,尤其好的是於熱水中通過之方法。 The heating method for heating and shrinking the heat-shrinkable film 11a is, for example, a method of passing through hot air, steam or hot water, and the like, which is particularly preferable from the viewpoint of uniformly shrinking the heat-shrinkable film 11a. It is a method of passing in hot water.
使加熱收縮性薄膜11a熱收縮時之加熱溫度較好的是,根據所使用之加熱收縮性薄膜之種類、及目標凹凸圖案12a之間距與底部12b之深度而適當選擇。 The heating temperature at the time of thermally shrinking the heat shrinkable film 11a is preferably selected depending on the type of the heat shrinkable film to be used and the distance between the target uneven pattern 12a and the depth of the bottom portion 12b.
於該製造方法中,若表面平滑硬質層13之厚度越薄、表面平滑硬質層13之楊氏模量越低,則凹凸圖案12a之最頻間距A越小,若基材之變形率越高,則平均深度B越深。因此,為了將凹凸圖案12a設為特定之最頻間距A及平均深度B,必須適當選擇上述條件。 In the manufacturing method, if the thickness of the surface smooth hard layer 13 is thinner and the Young's modulus of the surface smooth hard layer 13 is lower, the smaller the frequency spacing A of the concave-convex pattern 12a is, the higher the deformation rate of the substrate is. , the deeper the average depth B is. Therefore, in order to set the concave-convex pattern 12a to the specific frequency spacing A and the average depth B, it is necessary to appropriately select the above conditions.
於以上所說明之凹凸圖案形成片之製造方法中,由金屬或金屬化合物構成之表面平滑硬質層13之楊氏模量遠大於加熱收縮性薄膜11a之楊氏模量,因此在對相較於加熱收縮性薄膜11a更硬之表面平滑硬質層13進行熱壓縮時,表面平滑硬質層13與其說厚度增加,不如說被摺疊。進而,由於表面平滑硬質層13積層於加熱收縮性薄膜11a上,故加熱收縮性薄膜11a之收縮所產生的應力整體上均勻。因此,根據本發明,使表面平滑硬質層13以摺疊之方式而變形,可簡便且大面積地製造性能優異之凹凸圖案形成片10作為光擴散體。 In the manufacturing method of the uneven pattern forming sheet described above, the Young's modulus of the surface smooth hard layer 13 composed of a metal or a metal compound is much larger than the Young's modulus of the heat shrinkable film 11a, and therefore When the surface of the heat-shrinkable film 11a is harder and the hard layer 13 is thermally compressed, the surface smoothing hard layer 13 is not so thick as it is folded. Further, since the surface smooth hard layer 13 is laminated on the heat shrinkable film 11a, the stress generated by the shrinkage of the heat shrinkable film 11a is uniform as a whole. Therefore, according to the present invention, the surface smoothing hard layer 13 is deformed by folding, and the uneven pattern forming sheet 10 excellent in performance can be easily produced in a large area as a light diffusing body.
並且,根據該製造方法,可容易使凹凸圖案12a之最頻間距A超 過1μm且為20μm以下,並且可容易使凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上。 Moreover, according to the manufacturing method, the maximum frequency spacing A of the concave-convex pattern 12a can be easily exceeded. It is 1 μm or less and 20 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a can be easily made 10% or more when the most frequent pitch A is 100%.
然而,先前,作為製造凹凸圖案形成用片之方法,已知有:熱奈米壓印法,將奈米壓印用模具之凹凸圖案按壓於經加熱而軟化之片狀熱可塑性樹脂後進行冷卻;以及光奈米壓印法,使未硬化之電離放射線硬化性樹脂組成物包覆於奈米壓印用模具之凹凸圖案上,之後照射電離放射線而使其硬化。 However, as a method of producing a sheet for forming a concave-convex pattern, a hot nano-imprint method is known, and a concave-convex pattern of a mold for nanoimprinting is pressed against a sheet-shaped thermoplastic resin which is softened by heating and then cooled. And a photon imprint method in which an uncured ionizing radiation curable resin composition is coated on a concave-convex pattern of a nanoimprint mold, and then irradiated with ionizing radiation to be hardened.
於熱奈米壓印法中,必須對模具整體施加均勻之壓力,以將具有凹凸圖案之模具按壓於熱可塑性樹脂上,但該方法中,若模具之面積較大,則施加於模具上之壓力容易不均勻,其結果會導致凹凸圖案之轉印變得不均勻。因此,不能說其適合於液晶電視之顯示器等中所使用之大面積的凹凸圖案形成片之生產。 In the hot nanoimprint method, a uniform pressure must be applied to the entire mold to press the mold having the concave-convex pattern on the thermoplastic resin, but in the method, if the area of the mold is large, it is applied to the mold. The pressure is easily uneven, and as a result, the transfer of the uneven pattern becomes uneven. Therefore, it cannot be said that it is suitable for the production of a large-area concavo-convex pattern forming sheet used in a display of a liquid crystal television or the like.
又,於光奈米壓印法中,由於模具與已硬化之樹脂之脫模性不充分,因此有時凹凸圖案之轉印會變得不完全。並且,模具之反覆使用次數越多,該傾向越顯著。 Further, in the photon imprint method, since the mold release property between the mold and the cured resin is insufficient, the transfer of the uneven pattern may be incomplete. Moreover, the more the number of times the mold is repeatedly used, the more significant this tendency is.
相對於該等奈米壓印法,上述凹凸圖案形成片之製造方法可省略凹凸圖案之轉印,因此可消除奈米壓印法中之上述問題點。 With respect to these nanoimprint methods, the method for producing the concavo-convex pattern forming sheet can omit the transfer of the concavo-convex pattern, so that the above problems in the nanoimprint method can be eliminated.
再者,於上述實施形態中,係於基材之整個一面上設置硬質層,但亦可於基材之一面之一部分上設置硬質層,或於基材之兩面上全部設置硬質層,或者亦可於基材之兩面之一部分上設置硬質層。 Furthermore, in the above embodiment, the hard layer is provided on the entire surface of the substrate, but a hard layer may be provided on one of the surfaces of the substrate, or a hard layer may be provided on both sides of the substrate, or A hard layer may be provided on one of the two sides of the substrate.
本發明之光擴散體具備最頻間距A超過1μm且為20μm以下之上述凹凸圖案形成片10。 The light diffuser of the present invention includes the uneven pattern forming sheet 10 having a most frequent pitch A of more than 1 μm and 20 μm or less.
於本發明之光擴散體中,亦可於凹凸圖案形成片10之一面或兩面上具備其他層。例如,於凹凸圖案形成片10之形成有凹凸圖案12a之一側之面上,為了防止污染該面,亦可具備含有氟樹脂或聚矽氧樹 脂作為主成分之厚度為1~5nm左右之防汙層。 In the light diffuser of the present invention, other layers may be provided on one surface or both surfaces of the uneven pattern forming sheet 10. For example, in the surface of the concave-convex pattern forming sheet 10 on which one side of the uneven pattern 12a is formed, in order to prevent contamination of the surface, a fluororesin or a polyoxygen tree may be provided. The lipid as a main component has an antifouling layer having a thickness of about 1 to 5 nm.
又,於光擴散體之基材11側之面上,亦可具備透明樹脂製或玻璃製的支持體。 Further, a support made of a transparent resin or a glass may be provided on the surface of the light-diffusing body on the side of the base material 11 side.
進而,可於基材11側之面上形成黏著劑層,亦可含有色素以便適當具有功能性。 Further, an adhesive layer may be formed on the surface of the substrate 11 side, or may contain a dye to have appropriate functionality.
具備上述於表面上形成有凹凸圖案之凹凸圖案形成片10的本發明之光擴散體具有充分之光擴散性。 The light diffusing body of the present invention having the above-described uneven pattern forming sheet 10 having a concave-convex pattern formed on its surface has sufficient light diffusibility.
本發明之光擴散體製造用工程片原版(以下,稱為工程片原版)係具備上述凹凸圖案形成片10者,且係用於以如下所示之方法將凹凸圖案12a轉印至其他素材來大面積且大量地製造凹凸圖案形成片之模具者,上述凹凸圖案形成片可用作在表面上形成有與該工程片原版具有相同之最頻間距及平均深度之凹凸圖案的光擴散體。 The original sheet for producing a light-diffusing body of the present invention (hereinafter referred to as an original sheet) is provided with the uneven pattern forming sheet 10, and is used to transfer the uneven pattern 12a to another material by the method described below. A mold for producing a concave-convex pattern forming sheet in a large area and in a large amount, the concave-convex pattern forming sheet can be used as a light-diffusing body in which a concave-convex pattern having the same frequency-to-frequency pitch and average depth as the original sheet of the engineering sheet is formed on the surface.
於工程片原版上,亦可更具備用以支持凹凸圖案形成片10之樹脂製或金屬製的支持體。 On the original sheet of the engineering sheet, a resin or metal support for supporting the uneven pattern forming sheet 10 may be further provided.
作為使用工程片原版來製造光擴散體之具體方法,可列舉例如下述方法(a)~(c): Specific examples of the method for producing a light diffuser using the original sheet of the engineering sheet include, for example, the following methods (a) to (c):
方法(a) Method (a)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,塗佈未硬化之電離放射線硬化性樹脂;以及照射電離放射線而使上述硬化性樹脂硬化,之後自工程片原版上剝離已硬化之塗膜。此處,所謂電離放射線,通常係指紫外線或電子射線,本發明中亦包含可見光線、X射線、離子射線等。 The method includes the steps of: coating an uncured ionizing radiation curable resin on a surface on which a concave-convex pattern is formed on an original sheet of an engineering sheet; and irradiating the ionizing radiation to harden the curable resin, and then peeling off the original sheet from the engineering sheet Hardened coating film. Here, the ionizing radiation generally means ultraviolet rays or electron rays, and the present invention also includes visible light rays, X-rays, ion rays, and the like.
方法(b) Method (b)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,塗佈未硬化之液狀熱硬化性樹脂;以及加熱而使上述液狀熱硬化 性樹脂硬化,之後自工程片原版上剝離已硬化之塗膜。 The method comprises the steps of: coating an unhardened liquid thermosetting resin on a surface of the original sheet on which the concave-convex pattern is formed; and heating to cause the liquid heat hardening The resin is hardened, and then the hardened coating film is peeled off from the original sheet of the engineering sheet.
方法(c) Method (c)
本方法包括以下步驟:使片狀之熱可塑性樹脂接觸到工程片原版之形成有凹凸圖案之面;將該片狀之熱可塑性樹脂按壓於工程片原版上,且於此狀態下進行加熱而使其軟化,其後進行冷卻;以及自工程片原版上剝離上述已冷卻之片狀熱可塑性樹脂。 The method comprises the steps of: contacting a sheet-shaped thermoplastic resin to a surface of the original sheet of the engineering sheet on which the concave-convex pattern is formed; pressing the sheet-shaped thermoplastic resin on the original sheet of the engineering sheet, and heating in the state of the sheet It is softened and then cooled; and the cooled sheet-like thermoplastic resin is peeled off from the original sheet.
又,亦可使用工程片原版來製作二次工程用成形物,並使用該二次工程用成形物來製造光擴散體。作為二次工程用成形物,可列舉例如二次工程片。又,作為二次工程用成形物,可列舉如下電鍍輥:將工程片原版弄圓並貼附於圓筒之內側,並在將輥插入至該圓筒內側之狀態下進行電鍍,再自圓筒中取出輥,由此而獲得之電鍍輥。 Moreover, it is also possible to produce a molded article for secondary engineering using the original sheet of the engineering sheet, and to manufacture a light diffuser using the molded article for secondary engineering. Examples of the molded article for secondary engineering include secondary engineering sheets. In addition, as a molded article for secondary engineering, a plating roll is used in which the original sheet of the engineering sheet is rounded and attached to the inside of the cylinder, and the sheet is inserted into the inside of the cylinder to be plated, and then rounded. The roll was taken out of the cylinder, and the plating roll thus obtained was obtained.
作為使用二次工程用成形物之具體方法,可列舉下述方法(d)~(f): Specific methods of using the molded article for secondary engineering include the following methods (d) to (f):
方法(d) Method (d)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,進行鎳等之金屬電鍍,以積層電鍍層(凹凸圖案轉印用材料);自工程片原版上剝離該電鍍層,以製作金屬製之二次工程用成形物;繼而,於二次工程用成形物之與凹凸圖案相接觸之一側之面上,塗佈未硬化之電離放射線硬化性樹脂;以及在照射電離放射線而使上述硬化性樹脂硬化,之後自二次工程用成形物上剝離已硬化之塗膜。 The method includes the steps of: performing metal plating such as nickel on a surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet, and depositing a plating layer (material for concave-convex pattern transfer); and peeling the plating layer from the original sheet of the engineering sheet to a metal-made secondary engineering molded article is produced; and then, an unhardened ionizing radiation curable resin is applied to a surface of the second engineering molded article in contact with the concave-convex pattern; and the ionizing radiation is irradiated The curable resin is cured, and then the cured coating film is peeled off from the secondary engineering molded article.
方法(e) Method (e)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,積層電鍍層(凹凸圖案轉印用材料);自工程片原版上剝離該電鍍層,以製作金屬製之二次工程用成形物;於該二次工程用成形物之與凹凸圖案相接觸之一側之面上,塗佈未硬化之液狀熱硬化性樹脂;以及加熱而使該樹脂硬化,之後自二次工程用成形物上剝離已硬化之塗 膜。 The method comprises the steps of: laminating a plating layer (a material for concave-convex pattern transfer) on a surface on which a concave-convex pattern is formed on an original sheet of an engineering sheet; and peeling the plating layer from the original sheet of the engineering sheet to prepare a second metal for engineering a molded article; a non-hardened liquid thermosetting resin is applied to one surface of the molded article for secondary engineering in contact with the uneven pattern; and the resin is cured by heating, and then used for secondary engineering. Peeling hardened coating on the formed article membrane.
方法(f) Method (f)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,積層電鍍層(凹凸圖案轉印用材料);自工程片原版上剝離該電鍍層,以製作金屬製之二次工程用成形物;使片狀之熱可塑性樹脂接觸到該二次工程用成形物之與凹凸圖案相接觸之一側之面;將該片狀之熱可塑性樹脂按壓於二次工程用成形物上,且於此狀態下進行加熱而使其軟化,其後進行冷卻;以及自二次工程用成形物剝離上述已冷卻之片狀之熱可塑性樹脂。 The method comprises the steps of: laminating a plating layer (a material for concave-convex pattern transfer) on a surface on which a concave-convex pattern is formed on an original sheet of an engineering sheet; and peeling the plating layer from the original sheet of the engineering sheet to prepare a second metal for engineering a molded article; a sheet-shaped thermoplastic resin is brought into contact with a surface of the secondary engineering molded article in contact with the concave-convex pattern; and the sheet-shaped thermoplastic resin is pressed against the secondary engineering molded article, and In this state, heating is performed to soften it, and then cooling is performed; and the cooled sheet-shaped thermoplastic resin is peeled off from the secondary engineering molded article.
以下對方法(a)之具體例進行說明。如圖8所示,首先,於網狀之工程片原版110之形成有凹凸圖案112a之面上,藉由塗佈機120來塗佈未硬化之液狀電離放射線硬化性樹脂112c。繼而,將塗佈有該硬化性樹脂之工程片原版110通過輥130而進行按壓,使上述硬化性樹脂填充於工程片原版110之凹凸圖案112a內部。其後,藉由電離放射線照射裝置140而照射電離放射線,使硬化性樹脂交聯.硬化。繼而,自工程片原版110上剝離硬化後之電離放射線硬化性樹脂,藉此可製造網狀之光擴散體150。 Specific examples of the method (a) will be described below. As shown in FIG. 8, first, the unhardened liquid ionizing radiation curable resin 112c is applied onto the surface of the mesh-shaped engineering sheet master 110 on which the uneven pattern 112a is formed. Then, the engineering sheet precursor 110 coated with the curable resin is pressed by the roll 130, and the curable resin is filled in the inside of the uneven pattern 112a of the original sheet 110. Thereafter, the ionizing radiation is irradiated by the ionizing radiation irradiation device 140 to crosslink the curable resin. hardening. Then, the hardened ionizing radiation curable resin is peeled off from the original sheet 110, whereby the web-shaped light diffusing body 150 can be produced.
於方法(a)中,為了賦予脫模性,在塗佈未硬化之電離放射線硬化性樹脂之前,亦可於工程片原版之形成有凹凸圖案之面上設置厚度為1~10nm左右之由聚矽氧樹脂、氟樹脂等構成之層。 In the method (a), in order to impart releasability, before the application of the uncured ionizing radiation curable resin, a layer having a thickness of about 1 to 10 nm may be provided on the surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet. A layer composed of a silicone resin, a fluororesin, or the like.
作為於工程片原版之形成有凹凸圖案之面上塗佈未硬化之電離放射線硬化性樹脂的塗佈機,可列舉T模塗佈機、輥塗佈機、刮棒塗佈機等。 A coater for applying an uncured ionizing radiation curable resin to a surface on which a concave-convex pattern is formed on an original sheet of an engineering sheet includes a T-die coater, a roll coater, a bar coater, and the like.
作為未硬化之電離放射線硬化性樹脂,可列舉含有選自以下物質中之一種以上之成分者:環氧丙烯酸酯、環氧化油丙烯酸酯、丙烯酸胺基甲酸酯、不飽和聚酯、聚酯丙烯酸酯、聚醚丙烯酸酯、乙烯/ 丙烯酸酯、多烯/丙烯酸酯、矽酮丙烯酸酯、聚丁二烯、聚苯乙烯甲基丙烯酸甲酯等之預聚物、脂肪族丙烯酸酯、脂環式丙烯酸酯、芳香族丙烯酸酯、含氫氧基之丙烯酸酯、含烯丙基之丙烯酸酯、含縮水甘油基之丙烯酸酯、含羧基之丙烯酸酯、含鹵基之丙烯酸酯等單體。未硬化之電離放射線硬化性樹脂較好的是以溶劑等進行稀釋。 Examples of the uncured ionizing radiation curable resin include one or more selected from the group consisting of epoxy acrylate, epoxidized oil acrylate, urethane acrylate, unsaturated polyester, and polyester. Acrylate, polyether acrylate, ethylene / Prepolymers of acrylates, polyenes/acrylates, fluorenone acrylates, polybutadienes, polystyrene methyl methacrylates, etc., aliphatic acrylates, alicyclic acrylates, aromatic acrylates, A monomer such as a hydroxyl group acrylate, an allyl group-containing acrylate, a glycidyl group-containing acrylate, a carboxyl group-containing acrylate, or a halogen group-containing acrylate. The uncured ionizing radiation curable resin is preferably diluted with a solvent or the like.
又,亦可於未硬化之電離放射線硬化性樹脂中添加氟樹脂、聚矽氧樹脂等。 Further, a fluororesin, a polyoxymethylene resin or the like may be added to the uncured ionizing radiation curable resin.
當使未硬化之電離放射線硬化性樹脂藉由紫外線而硬化時,較好的是,於未硬化之電離放射線硬化性樹脂中添加苯乙酮類、二苯甲酮類等之光聚合起始劑。 When the uncured ionizing radiation curable resin is cured by ultraviolet rays, it is preferred to add a photopolymerization initiator such as acetophenone or benzophenone to the uncured ionizing radiation curable resin. .
於塗佈未硬化之液狀電離放射線硬化性樹脂之後,亦可將由樹脂、玻璃等構成之基材貼合後照射電離放射線。電離放射線之照射由基材、工程片原版之具有電離放射線透過性之任一者進行即可。 After coating the uncured liquid ionizing radiation-curable resin, a substrate made of resin, glass, or the like may be bonded and irradiated with ionizing radiation. The irradiation of the ionizing radiation may be performed by either the substrate or the original sheet having the ionizing radiation permeability.
硬化後之電離放射線硬化性樹脂片之厚度較好的是0.1~100μm左右。若硬化後之電離放射線硬化性樹脂片之厚度為0.1μm以上,則可確保充分之強度,若為100μm以上,則可確保充分之可撓性。 The thickness of the ionized radiation curable resin sheet after hardening is preferably about 0.1 to 100 μm. When the thickness of the ionizing radiation-curable resin sheet after hardening is 0.1 μm or more, sufficient strength can be secured, and when it is 100 μm or more, sufficient flexibility can be ensured.
於上述圖8所示之方法中,工程片原版為網狀,但亦可為單葉片。當使用單葉片之工程片時,可應用將單葉片之工程片用作平板狀之模具之標記法、將單葉片之工程片捲繞於輥上以用作圓筒狀模具之輥壓印法等。又,亦可將單葉片之工程片原版配置於射出成形機之模具之內側。 In the method shown in FIG. 8 above, the original piece of the engineering piece is a mesh shape, but may also be a single blade. When a single-blade work piece is used, a single-blade work piece can be used as a flat-plate mold marking method, and a single-blade work piece can be wound on a roll to be used as a roll-shaped embossing method for a cylindrical mold. Wait. Further, the original blade of the single blade may be disposed inside the mold of the injection molding machine.
然而,於該等使用單葉片之工程片之方法中,為了大量生產光擴散體,必須多次反覆地進行形成凹凸圖案之步驟。當電離放射線硬化性樹脂與工程片原版之脫模性較低時,於多次反覆後凹凸圖案會產生堵塞,因而具有凹凸圖案之轉印不完全之傾向。 However, in such a method of using a single-blade engineering sheet, in order to mass-produce a light-diffusing body, it is necessary to repeatedly perform the step of forming a concave-convex pattern. When the release property of the ionizing radiation curable resin and the original sheet of the engineering sheet is low, the uneven pattern is clogged after repeated times, and thus the transfer of the uneven pattern tends to be incomplete.
與此相對,於圖8所示之方法中,由於工程片原版為網狀,故可 大面積且連續地形成凹凸圖案,因此即便凹凸圖案形成片之反覆使用次數較少,亦可於短時間內製造所需數量之光擴散體。 On the other hand, in the method shown in FIG. 8, since the original piece of the engineering piece is a mesh shape, it can be Since the uneven pattern is formed over a large area and continuously, even if the number of times of use of the uneven pattern forming sheet is small, a desired number of light diffusers can be produced in a short time.
於方法(b)、(e)中,作為液狀熱硬化性樹脂,可列舉例如未硬化之三聚氰胺樹脂、聚氨酯樹脂、環氧樹脂等。 In the methods (b) and (e), examples of the liquid thermosetting resin include uncured melamine resin, urethane resin, and epoxy resin.
又,方法(b)中的硬化溫度較好的是低於工程片原版之玻璃轉移溫度。若硬化溫度為工程片原版之玻璃轉移溫度以上,則在硬化時工程片原版之凹凸圖案可能會產生變形。 Further, the hardening temperature in the method (b) is preferably lower than the glass transition temperature of the original sheet of the engineering sheet. If the hardening temperature is higher than the glass transition temperature of the original sheet of the engineering sheet, the concave-convex pattern of the original sheet of the engineering sheet may be deformed at the time of hardening.
於方法(c)、(f)中,作為熱可塑性樹脂,可列舉例如丙烯酸系樹脂、聚烯烴、聚酯等。 In the methods (c) and (f), examples of the thermoplastic resin include an acrylic resin, a polyolefin, and a polyester.
將片狀之熱可塑性樹脂按壓於二次工程用成形物上時之壓力較好的是1~100MPa。若按壓時之壓力為1MPa以上,則可高精度地轉印凹凸圖案,若按壓時之壓力為100MPa以下,則可防止加壓過剩。 The pressure at which the sheet-like thermoplastic resin is pressed against the secondary engineering molded article is preferably from 1 to 100 MPa. When the pressure at the time of pressing is 1 MPa or more, the uneven pattern can be transferred with high precision, and when the pressure at the time of pressing is 100 MPa or less, excessive pressurization can be prevented.
又,方法(c)中的熱可塑性樹脂之加熱溫度較好的是低於工程片原版之玻璃轉移溫度。其原因在於,若加熱溫度為工程片原版之玻璃轉移溫度以上,則在加熱時工程片原版之凹凸圖案可能會產生變形。 Further, the heating temperature of the thermoplastic resin in the method (c) is preferably lower than the glass transition temperature of the original sheet of the engineering sheet. The reason for this is that if the heating temperature is equal to or higher than the glass transition temperature of the original sheet of the engineering sheet, the uneven pattern of the original sheet of the engineering sheet may be deformed during heating.
作為加熱後之冷卻溫度,從可高精度地轉印凹凸圖案之角度而言,較好的是小於熱可塑性樹脂之玻璃轉移溫度。 The cooling temperature after heating is preferably smaller than the glass transition temperature of the thermoplastic resin from the viewpoint of accurately transferring the uneven pattern.
於方法(a)~(c)中,亦可省略加熱步驟,從防止工程片原版之凹凸圖案之變形的角度而言,較好的是使用電離放射線硬化性樹脂之方法(a)。 In the methods (a) to (c), the heating step may be omitted, and from the viewpoint of preventing deformation of the concave-convex pattern of the original sheet of the engineering sheet, the method (a) of ionizing radiation curable resin is preferably used.
於方法(d)~(f)中,較好的是將金屬製之二次工程用成形物之厚度設為50~500μm左右。若金屬製之二次工程用成形物之厚度為50μm以上,則二次工程用成形物具有充分之強度,若上述厚度為500μm以下,則可確保充分之可撓性。 In the methods (d) to (f), it is preferred that the thickness of the molded article for secondary engineering made of metal is about 50 to 500 μm. When the thickness of the molded article for secondary engineering made of metal is 50 μm or more, the molded article for secondary engineering has sufficient strength, and when the thickness is 500 μm or less, sufficient flexibility can be ensured.
於方法(d)~(f)中,由於使用熱導致之變形較小之金屬製片作為工程片,因此電離放射線硬化性樹脂、熱硬化性樹脂、熱可塑性樹脂之 任一者均可用作凹凸圖案形成片用材料。 In the methods (d) to (f), since a metal sheet having a small deformation due to heat is used as an engineering sheet, the ionizing radiation curable resin, the thermosetting resin, and the thermoplastic resin are used. Either one can be used as a material for a concave-convex pattern forming sheet.
當將由方法(a)~(f)所製造之凹凸圖案形成片用作光擴散體時,為了進一步提高光擴散效果,可使凹凸圖案形成片含有由上述無機化合物構成之光擴散劑、由有機化合物構成之有機光擴散劑或者微細氣泡。 When the uneven pattern forming sheet produced by the methods (a) to (f) is used as a light diffusing body, in order to further enhance the light diffusing effect, the uneven pattern forming sheet may contain a light diffusing agent composed of the above inorganic compound, and may be organic. An organic light diffusing agent or fine bubbles composed of a compound.
再者,於方法(d)~(f)中,將工程片原版之凹凸圖案轉印至金屬上而獲得二次工程用成形物,但亦可轉印至樹脂上而獲得二次工程用成形物。作為此時可使用之樹脂,列舉例如聚碳酸酯、聚縮醛、聚碸、方法(a)中使用之電離放射線硬化性樹脂等。當使用電離放射線硬化性樹脂時,與方法(a)同樣地依次進行電離放射線硬化性樹脂之塗佈、硬化、剝離,由此獲得二次工程用成形物。 Further, in the methods (d) to (f), the concave-convex pattern of the original sheet of the engineering sheet is transferred onto a metal to obtain a molded article for secondary engineering, but may be transferred onto a resin to obtain a secondary engineering molding. Things. Examples of the resin that can be used at this time include polycarbonate, polyacetal, polyfluorene, and ionizing radiation curable resin used in the method (a). When the ionizing radiation-curable resin is used, the coating, hardening, and peeling of the ionizing radiation-curable resin are sequentially performed in the same manner as in the method (a), whereby a molded article for secondary engineering is obtained.
於以上述方式獲得之光擴散體上,亦可在與形成有凹凸圖案之面相反之面上設置黏著劑層。又,在與形成有凹凸圖案之面相反側之面上,亦可進而形成凹凸圖案。 In the light diffuser obtained as described above, an adhesive layer may be provided on the surface opposite to the surface on which the uneven pattern is formed. Further, a concave-convex pattern may be further formed on the surface opposite to the surface on which the uneven pattern is formed.
又,亦可不剝離用作工程片原版之凹凸圖案形成片或二次工程用成形物,而將其作為保護層來使用,在即將使用光擴散體之前剝離該保護層。 Moreover, it is also possible to use it as a protective layer without peeling off the uneven pattern forming sheet used for the original sheet of the engineering sheet or the molded article for secondary engineering, and peeling off the protective layer immediately before using the light diffusing body.
藉由上述製造方法所製造之光擴散體上,形成有與上述凹凸圖案形成片10相同之凹凸圖案,因此凹凸之配向不均勻,擴散之異向性優異。 In the light-diffusing body manufactured by the above-described production method, the same concave-convex pattern as that of the uneven pattern-forming sheet 10 is formed. Therefore, the alignment of the unevenness is uneven, and the diffusion is excellent in the anisotropy.
於光擴散體中,亦可於凹凸圖案形成片之一面或兩面上具備其他層。例如,於凹凸圖案形成片之形成有凹凸圖案之一側之面上,為了防止污染該面,亦可具備含有氟樹脂或聚矽氧樹脂作為主成分之厚度為1~5nm左右之防汙層。 In the light diffusing body, other layers may be provided on one or both sides of the uneven pattern forming sheet. For example, in the surface on which the concave-convex pattern forming sheet is formed on one side of the uneven pattern, in order to prevent contamination of the surface, an anti-fouling layer having a thickness of about 1 to 5 nm containing a fluororesin or a polyoxynoxy resin as a main component may be provided. .
又,於光擴散體之未形成有凹凸圖案之一側之面上,亦可具備透明樹脂製或玻璃製的支持體。 Moreover, a support made of a transparent resin or a glass may be provided on the surface of the light diffuser on the side where the concave-convex pattern is not formed.
以下對本發明之光學片之第1實施形態進行說明。 Hereinafter, a first embodiment of the optical sheet of the present invention will be described.
圖13表示本實施形態之光學片。再者,於圖13中,為了易於說明,將凹凸區域212放大,且將其配置零散顯示。 Fig. 13 shows an optical sheet of this embodiment. Further, in Fig. 13, for the sake of convenience of explanation, the uneven portion 212 is enlarged, and the arrangement thereof is displayed in a scattered manner.
本實施形態之光學片210a係用作於長度方向之一端α上配置有光源330之光擴散片者,且係於平坦之一面11上,藉由如下圖案以點狀而分散配置有外形為橢圓形狀之凹凸區域212,亦即,隨著自光學片210a之長度方向之一端α朝向另一端β而逐漸變密之圖案。再者,於本發明中,所謂平坦,係指JIS B0601中記載之中心線平均粗糙度為0.1μm以下。又,凹凸區域係指JIS B0601中記載之中心線平均粗糙度超過0.1μm,尤其為0.5μm以上。 The optical sheet 210a of the present embodiment is used as a light diffusing sheet in which the light source 330 is disposed at one end α of the longitudinal direction, and is attached to the flat one surface 11, and the outer shape is dispersed in a dot shape by the following pattern. The concave-convex region 212 of the shape, that is, the pattern gradually densified as the one end α from the longitudinal direction of the optical sheet 210a faces the other end β. In the present invention, the flatness means that the center line average roughness described in JIS B0601 is 0.1 μm or less. Further, the uneven region means that the center line average roughness described in JIS B0601 exceeds 0.1 μm, particularly 0.5 μm or more.
凹凸區域12係具有凹凸圖案之區域。於本實施形態中,如圖1所示,於凹凸區域12之表面上,形成有蛇行之波狀凹凸圖案12a。 The uneven region 12 is a region having a concave-convex pattern. In the present embodiment, as shown in FIG. 1, a meandering corrugated pattern 12a is formed on the surface of the uneven portion 12.
在用於光擴散片之本實施形態之光學片210a中,較好的是凹凸圖案12a之最頻間距A超過1μm且為20μm以下,更好的是超過1μm且為10μm以下。若最頻間距A不足1μm,則該最頻間距A為可見光之波長以下,因而可見光不會因凹凸圖案12a而折射,而是光會透過,若最頻間距A超過上述上限值,則擴散之異向性會變低,因而具有亮度易產生不均之傾向。 In the optical sheet 210a of the present embodiment used for the light-diffusing sheet, it is preferable that the pitch A of the uneven pattern 12a exceeds 1 μm and is 20 μm or less, more preferably more than 1 μm and 10 μm or less. When the most frequent pitch A is less than 1 μm, the most frequent pitch A is equal to or less than the wavelength of visible light, so that visible light is not refracted by the concave-convex pattern 12a, but light is transmitted. If the maximum-frequency spacing A exceeds the upper limit, diffusion occurs. The anisotropy becomes lower, and thus the brightness tends to be uneven.
凹凸圖案12a之凹凸之平均深度B相對於凹凸圖案12a之最頻間距A之比(B/A,以下稱為縱橫比)較好的是0.1~3.0。若縱橫比不足0.1,則有時會無法獲得目標光學特性。另一方面,若縱橫比大於3.0,則會具有在製造光學片210a時難以形成凹凸圖案12a之傾向。 The ratio (B/A, hereinafter referred to as the aspect ratio) of the average depth B of the unevenness of the uneven pattern 12a to the most frequent pitch A of the uneven pattern 12a is preferably 0.1 to 3.0. If the aspect ratio is less than 0.1, the target optical characteristics may not be obtained. On the other hand, when the aspect ratio is more than 3.0, it tends to be difficult to form the uneven pattern 12a when the optical sheet 210a is produced.
此處,所謂平均深度B,係指凹凸圖案12a之底部12b之平均深 度。 Here, the average depth B refers to the average depth of the bottom portion 12b of the concave-convex pattern 12a. degree.
又,底部12b係指凹凸圖案12a之凹部之極小點,平均深度B係指對將凹凸區域12沿短徑方向截斷所得之剖面(參照圖2)進行觀察時,自與整個光學片10a之面方向平行的基準線L1至各凸部之頂部為止的長度B1、B2、B3...之平均值(BAV)、與自基準線L1至各凹部之底部為止的長度b1、b2、b3...之平均值(bAV)之差(bAV-BAV)。 Further, the bottom portion 12b refers to the minimum point of the concave portion of the concave-convex pattern 12a, and the average depth B refers to the surface of the entire optical sheet 10a when the cross section obtained by cutting the uneven portion 12 in the short-diameter direction (see Fig. 2) is observed. The average value (B AV ) of the lengths B 1 , B 2 , B 3 ... from the reference line L 1 parallel to the direction to the top of each convex portion, and the length b from the reference line L 1 to the bottom of each concave portion The difference between the average value (b AV ) of 1 , b 2 , b 3 ... (b AV -B AV ).
作為測定平均深度B之方法,可採用下述方法等:測定由原子間力顯微鏡所拍攝之凹凸圖案12a之剖面之圖像中的各底部12b之深度,並求出該等之平均值。 As a method of measuring the average depth B, a method of measuring the depth of each of the bottom portions 12b in the image of the cross section of the concave-convex pattern 12a taken by the atomic force microscope, and determining the average value thereof may be employed.
如本實施形態所示,所謂凹凸圖案12a沿著一方向之蛇行,係指以下述方法求得之凹凸圖案之配向度為0.3以上。該配向度係凹凸圖案之配向不均勻之指標,該值越大,則表示配向越不均勻。 As described in the present embodiment, the meandering of the uneven pattern 12a in one direction means that the degree of alignment of the uneven pattern obtained by the following method is 0.3 or more. The alignment degree is an index of uneven alignment of the concave-convex pattern, and the larger the value, the more uneven the alignment.
若上述配向度不足0.3,則凹凸圖案12a之配向之不均勻較小,因此光之擴散性較小。 When the degree of alignment is less than 0.3, the unevenness of the alignment of the concavo-convex pattern 12a is small, and therefore the diffusibility of light is small.
又,配向度較好的是1.0以下。若配向度超過1.0,則凹凸圖案12a之方向會於某程度變得隨機,因此光擴散性變高,但異向性具有變低之傾向。 Further, the degree of alignment is preferably 1.0 or less. When the degree of alignment exceeds 1.0, the direction of the uneven pattern 12a becomes random to some extent, and thus the light diffusibility becomes high, but the anisotropy tends to be low.
為了使配向度為0.3以上,例如於下述製造中,可適當選擇加熱收縮性薄膜與凹凸區域形成用凸部。 In order to achieve an alignment degree of 0.3 or more, for example, in the following production, the heat shrinkable film and the uneven portion forming convex portion can be appropriately selected.
又,亦可採用下述方法,亦即,使用在一表面上形成有配向度為0.3以上之凹凸圖案的金屬模具來使透明樹脂成形。 Further, a method may be employed in which a transparent resin is molded by using a metal mold having a concave-convex pattern having an orientation of 0.3 or more on one surface.
凹凸區域212之面積相對於光學片210a之一面之面積的面積比例取決於目標光擴散性,但較好的是30~100%。若凹凸區域212之面積比例為30%以上,則可發揮充分之光擴散性。 The area ratio of the area of the uneven portion 212 to the area of one surface of the optical sheet 210a depends on the target light diffusibility, but is preferably 30 to 100%. When the area ratio of the uneven region 212 is 30% or more, sufficient light diffusibility can be exhibited.
光學片210a係由可見光之透過率較高(具體而言,可見光之全光 線透過率為85%以上)之透明樹脂所構成。 The optical sheet 210a has a high transmittance from visible light (specifically, the full light of visible light) A transparent resin having a linear transmittance of 85% or more.
又,為了使耐熱性、耐光性提高,可在不損害透光率等光學特性之範圍內,於光學片10a中含有添加劑。作為添加劑,可列舉光穩定劑、紫外線吸收劑、抗氧化劑、潤滑劑、光擴散劑等。其中尤其好的是添加光穩定劑,其添加量較好的是,相對於透明樹脂100質量份為0.03~2.0質量份。若光穩定劑之添加量為0.03質量份以上,則可充分發揮其添加效果,但若光穩定劑之添加量超過2.0質量份,則光穩定劑之量過剩,從而具有不必要之成本上漲之傾向。 Moreover, in order to improve heat resistance and light resistance, an additive can be contained in the optical sheet 10a within the range which does not impair optical characteristics, such as a light transmittance. Examples of the additive include a light stabilizer, an ultraviolet absorber, an antioxidant, a lubricant, and a light diffusing agent. Among them, it is particularly preferable to add a light stabilizer in an amount of preferably 0.03 to 2.0 parts by mass based on 100 parts by mass of the transparent resin. When the amount of the light stabilizer added is 0.03 parts by mass or more, the effect of the addition can be sufficiently exhibited. However, when the amount of the light stabilizer added exceeds 2.0 parts by mass, the amount of the light stabilizer is excessive, and the unnecessary cost rises. tendency.
又,為了進一步提高光擴散效果,可在不會較大地損害透光率等光學特性之範圍內,使光學片210a中含有由無機化合物構成之無機光擴散劑、由有機化合物構成之有機光擴散劑。 Further, in order to further enhance the light-diffusing effect, the optical sheet 210a may contain an inorganic light diffusing agent composed of an inorganic compound and organic light composed of an organic compound in a range that does not greatly impair optical characteristics such as light transmittance. Agent.
作為無機光擴散劑,可列舉二氧化矽、白碳、滑石、氧化鎂、氧化鋅、氧化鈦、碳酸鈣、氫氧化鋁、硫酸鋇、矽酸鈣、矽酸鎂、矽酸鋁、矽酸鋁化鈉、矽酸鋅、玻璃、雲母等。 Examples of the inorganic light diffusing agent include cerium oxide, white carbon, talc, magnesium oxide, zinc oxide, titanium oxide, calcium carbonate, aluminum hydroxide, barium sulfate, calcium citrate, magnesium citrate, aluminum citrate, and citric acid. Sodium aluminide, zinc antimonate, glass, mica, and the like.
作為有機光擴散劑,可列舉苯乙烯系聚合粒子、丙烯酸系聚合粒子、矽氧烷系聚合粒子、聚醯胺系聚合粒子等。該等光擴散劑可分別單獨使用,或者亦可將兩種以上組合而使用。 Examples of the organic light-diffusing agent include styrene-based polymer particles, acrylic polymer particles, siloxane-based polymer particles, and polyamid-based polymer particles. These light diffusing agents may be used singly or in combination of two or more.
又,為了獲得優異之光散射特性,該等光擴散劑亦可設為花瓣狀或球晶狀等多孔質構造。 Further, in order to obtain excellent light scattering characteristics, the light diffusing agents may be formed into a porous structure such as a petal shape or a spherical crystal.
從難以損害透光性之角度而言,光擴散劑之含量較好的是相對於透明樹脂100質量份為10質量份以下。 The content of the light diffusing agent is preferably 10 parts by mass or less based on 100 parts by mass of the transparent resin, from the viewpoint of being difficult to impair the light transmittance.
進而,為了進一步提高光擴散效果,可在不會較大地損害透光率等光學特性之範圍內,使光學片210a中含有微細氣泡。微細氣泡對光之吸收較少,難以使透光率降低。 Further, in order to further enhance the light diffusion effect, the optical sheet 210a may contain fine bubbles in a range that does not greatly impair optical characteristics such as light transmittance. The fine bubbles absorb less light and it is difficult to lower the light transmittance.
作為微細氣泡之形成方法,可應用向光學片210a中混入發泡劑之方法(例如,日本專利特開平5-212811號公報、日本專利特開平6- 107842號公報中揭示之方法)、對丙烯酸系發泡樹脂進行發泡處理以使其含有微細氣泡之方法(例如,日本專利特開2004-2812號公報中揭示之方法)等。進而,就可實現更加均勻之面照射而言,微細氣泡之形成方法較好的是使特定位置不均勻地發泡之方法(例如,日本專利特開2006-124499號公報中揭示之方法)。 As a method of forming the fine bubbles, a method of mixing a foaming agent into the optical sheet 210a can be applied (for example, Japanese Patent Laid-Open No. Hei 5-212811, Japanese Patent Laid-Open No. Hei 6-- The method disclosed in the publication No. 107842), the method of foaming the acrylic foamed resin to contain fine bubbles (for example, the method disclosed in Japanese Laid-Open Patent Publication No. 2004-2812), and the like. Further, in order to achieve more uniform surface irradiation, the method of forming fine bubbles is preferably a method of uniformly foaming a specific position (for example, the method disclosed in Japanese Laid-Open Patent Publication No. 2006-124499).
再者,亦可併用上述光擴散劑與微細發泡。 Further, the above light diffusing agent may be used in combination with fine foaming.
光學片10a之厚度較好的是0.02~3.0mm,更好的是0.05~2.5mm,尤其好的是0.1~2.0mm。若光學片10a之厚度不足0.02mm,則因其厚度會小於凹凸圖案12a之深度而不適當,若其厚度厚於3.0mm,則因光學片10a之質量較大而可能難以操作。 The thickness of the optical sheet 10a is preferably 0.02 to 3.0 mm, more preferably 0.05 to 2.5 mm, and particularly preferably 0.1 to 2.0 mm. If the thickness of the optical sheet 10a is less than 0.02 mm, the thickness thereof is less than the depth of the concave-convex pattern 12a. If the thickness is thicker than 3.0 mm, the optical sheet 10a may be difficult to handle because of its large mass.
光學片210a亦可由兩層以上之樹脂層所構成。即使當光學片10a係由兩層以上之層所構成時,光學片210a之厚度亦較好的是0.02~3.0mm。 The optical sheet 210a may also be composed of two or more resin layers. Even when the optical sheet 10a is composed of two or more layers, the thickness of the optical sheet 210a is preferably 0.02 to 3.0 mm.
上述光學片210a被用作光擴散片。具體而言,光學片210a係使光源330鄰接於光學片210a之一端α而使用的。於光學片210a之一端α配置光源330,藉此可使光於光學片210a內傳播。又,使傳播於光學片210a內之光在凹凸區域212擴散,由此可使光自形成有凹凸區域212之一側之面出射。進而,由於凹凸區域212係藉由隨著自一端α朝向另一端β而逐漸變密之圖案而配置的,因此可使光之出射量隨著朝向另一端β而變多。一般而言,於光學片210a內傳播之光之強度隨著遠離光源330而變弱,但由於光之出射量隨著朝向另一端β而變多,故可使自光學片210a出射之光之強度均勻。 The above optical sheet 210a is used as a light diffusion sheet. Specifically, the optical sheet 210a is used such that the light source 330 is adjacent to one end α of the optical sheet 210a. The light source 330 is disposed at one end α of the optical sheet 210a, whereby light can be propagated in the optical sheet 210a. Further, the light propagating in the optical sheet 210a is diffused in the uneven portion 212, whereby light can be emitted from the surface on which one side of the uneven portion 212 is formed. Further, since the uneven region 212 is disposed by being gradually densified from the one end α toward the other end β, the amount of light emitted can be increased toward the other end β. In general, the intensity of the light propagating in the optical sheet 210a becomes weaker as it goes away from the light source 330, but since the amount of light emitted increases toward the other end β, the light emitted from the optical sheet 210a can be made. The intensity is even.
當使用光學片210a時,為了提高光源330之光之利用效率,較好的是於不具有凹凸區域212之面上設置反射板。 When the optical sheet 210a is used, in order to improve the light use efficiency of the light source 330, it is preferable to provide a reflecting plate on the surface having no uneven portion 212.
以上所說明之第1實施形態之光學片210a中,藉由形成於凹凸區域212表面之凹凸圖案12a而發揮光擴散性。又,將凹凸區域212以於光學片210a之長度方向之另一端β側變密之圖案而配置,使得光擴散性於長度方向之另一端β側變高。如上所述,由於可藉由凹凸區域212彼此之間隔來調整光擴散性,因此光學片210a可於所需之位置容易獲得所需之光擴散性。 In the optical sheet 210a of the first embodiment described above, the light diffusing property is exhibited by the uneven pattern 12a formed on the surface of the uneven region 212. In addition, the uneven region 212 is disposed in a pattern in which the other end β side of the longitudinal direction of the optical sheet 210a is dense, so that the light diffusibility becomes higher on the other end β side in the longitudinal direction. As described above, since the light diffusibility can be adjusted by the unevenness of the uneven regions 212, the optical sheet 210a can easily obtain the desired light diffusibility at a desired position.
以下對製造光學片210a之方法之例進行說明。 An example of a method of manufacturing the optical sheet 210a will be described below.
第1製造方法係使用加熱收縮性薄膜來製造光學片210a之方法。 The first production method is a method of producing the optical sheet 210a using a heat shrinkable film.
亦即,第1製造方法係具有以下製造步驟來製造成為光學片210a之凹凸圖案形成片的方法,上述製造步驟指:於加熱收縮性薄膜之一面上,印刷表面平滑之樹脂製凹凸區域形成用凸部以形成印刷片(以下,稱為第1步驟);以及使加熱收縮性薄膜加熱收縮,以使印刷片之至少凹凸區域形成用凸部以摺疊之方式而變形(以下,稱為第2步驟)。 In other words, the first manufacturing method has a method of manufacturing the concave-convex pattern forming sheet of the optical sheet 210a by the following manufacturing steps, and the manufacturing step refers to forming a concave-convex region of a resin having a smooth printing surface on one surface of the heat-shrinkable film. The convex portion is formed to form a printed sheet (hereinafter referred to as a first step); and the heat shrinkable film is heated and shrunk so that at least the concave-convex region forming convex portion of the printed sheet is deformed by folding (hereinafter referred to as second step).
於第1步驟中,如圖14及圖15所示,作為於加熱收縮性薄膜13之一面上印刷凹凸區域形成用凸部14之方法,例如可應用絲網印刷、凹板印刷、平版印刷、及噴墨印刷等。 In the first step, as shown in FIG. 14 and FIG. 15 , as a method of printing the uneven portion 14 on one surface of the heat shrinkable film 13 , for example, screen printing, gravure printing, lithography, or the like can be applied. And inkjet printing.
作為加熱收縮性薄膜13,可使用例如聚對苯二甲酸乙二酯系收縮薄膜、聚苯乙烯系收縮薄膜、聚烯烴系收縮薄膜、聚氯乙烯系收縮薄膜等。 As the heat shrinkable film 13, for example, a polyethylene terephthalate type shrink film, a polystyrene type shrink film, a polyolefin type shrink film, a polyvinyl chloride type shrink film, or the like can be used.
於加熱收縮性薄膜213之中,尤其好的是收縮50~70%之收縮薄膜。若使用收縮50~70%之收縮薄膜,則可使變形率為50%以上,從而可容易製造凹凸圖案12a之最頻間距A超過1μm且為20μm以下、縱橫 比為0.1以上之凹凸圖案形成片。 Among the heat shrinkable films 213, a shrink film of 50 to 70% shrinkage is particularly preferable. When a shrink film having a shrinkage of 50 to 70% is used, the deformation ratio can be 50% or more, and the groove width A of the uneven pattern 12a can be easily manufactured to be more than 1 μm and 20 μm or less. The uneven pattern is formed into a sheet having a ratio of 0.1 or more.
此處,變形率係指(變形前之長度-變形後之長度)/(變形前之長度)×100(%),或者係指(變形後之長度)/(變形前之長度)×100(%)。 Here, the deformation rate means (length before deformation - length after deformation) / (length before deformation) × 100 (%), or means (length after deformation) / (length before deformation) × 100 ( %).
從容易形成蛇行之波狀凹凸圖案12a之角度而言,凹凸區域形成用凸部214係由玻璃轉移溫度相較於構成加熱收縮性薄膜213之樹脂(第1樹脂)高出10℃以上之樹脂(第2樹脂)所構成。 The uneven portion forming convex portion 214 is a resin having a glass transition temperature higher than a resin (first resin) constituting the heat shrinkable film 213 by 10 ° C or more from the viewpoint of the formation of the meandering corrugated concave-convex pattern 12a. (Second resin).
作為第2樹脂,可使用例如聚乙烯醇、聚苯乙烯、丙烯酸系樹脂、苯乙烯-丙烯酸共聚物、苯乙烯-丙烯腈共聚物、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二醇酯、聚奈二甲酸乙二醇酯、聚碳酸酯、聚醚碸、氟樹脂等。 As the second resin, for example, polyvinyl alcohol, polystyrene, acrylic resin, styrene-acrylic copolymer, styrene-acrylonitrile copolymer, polyethylene terephthalate, polybutylene terephthalate can be used. Glycol ester, polyethylene naphthalate, polycarbonate, polyether oxime, fluororesin, and the like.
從可容易形成所需之凹凸圖案12a之角度而言,凹凸區域形成用凸部214之表面係指JIS B0601中記載之中心線平均粗糙度為0.1μm以下。 The surface of the uneven portion forming convex portion 214 is referred to as a center line average roughness of JIS B0601 of 0.1 μm or less from the viewpoint of easily forming the desired uneven pattern 12a.
又,凹凸區域形成用凸部214之厚度較好的是0.05~5.0μm,更好的是0.1~1.0μm。若凹凸區域形成用凸部214之厚度為上述範圍,則能夠可靠地使凹凸圖案12a之最頻間距A超過1μm且為20μm以下。然而,若凹凸區域形成用凸部214之厚度不足0.05μm,則最頻間距A有時會成為1μm以下,若凹凸區域形成用凸部214之厚度超過5.0μm,則最頻間距A有時會超過20μm。 Further, the thickness of the uneven portion forming convex portion 214 is preferably 0.05 to 5.0 μm, more preferably 0.1 to 1.0 μm. When the thickness of the uneven portion forming convex portion 214 is in the above range, the most frequent pitch A of the uneven pattern 12a can be reliably more than 1 μm and 20 μm or less. However, when the thickness of the uneven portion forming convex portion 214 is less than 0.05 μm, the most frequent pitch A may be 1 μm or less, and when the thickness of the uneven portion forming convex portion 214 exceeds 5.0 μm, the worst-frequency pitch A may be More than 20μm.
進而,凹凸區域形成用凸部214之厚度亦可不固定,例如,其可沿著一方向而連續地變厚,亦可沿著一方向而連續地變薄。 Further, the thickness of the uneven portion forming convex portion 214 may not be constant, and for example, it may be continuously thickened in one direction or continuously thinned in one direction.
又,從可更容易形成蛇行之波狀凹凸圖案12a之角度而言,凹凸區域形成用凸部214之楊氏模量較好的是0.01~300GPa,更好的是0.1~10GPa。 Moreover, the Young's modulus of the uneven portion forming convex portion 214 is preferably from 0.01 to 300 GPa, more preferably from 0.1 to 10 GPa, from the viewpoint that the meandering corrugated concave-convex pattern 12a can be more easily formed.
於第2步驟中,使加熱收縮性薄膜213熱收縮,藉此於凹凸區域 形成用凸部214上,在與收縮方向垂直之方向上形成波狀之凹凸圖案12a,以獲得凹凸區域212(參照圖16)。 In the second step, the heat shrinkable film 213 is heat-shrinked, thereby being used in the uneven region. On the convex portion 214 for forming, a corrugated concave-convex pattern 12a is formed in a direction perpendicular to the contraction direction to obtain a concave-convex region 212 (see FIG. 16).
作為使加熱收縮性薄膜213加熱收縮時之加熱方法,可列舉於熱風、蒸氣或熱水中通過之方法等,其中,從可使加熱收縮性薄膜213均勻地收縮之角度而言,尤其好的是於熱水中通過之方法。 The heating method for heating and shrinking the heat shrinkable film 213 is exemplified by a method of passing through hot air, steam, or hot water, and the like, which is particularly preferable from the viewpoint of uniformly shrinking the heat shrinkable film 213. It is a method of passing in hot water.
於該製造方法中,若凹凸區域形成用凸部214之厚度越薄、凹凸區域形成用凸部214之楊氏模量越低,則凹凸圖案12a之最頻間距A越小,若加熱收縮性薄膜之變形率越高,則平均深度B越深。 In the manufacturing method, the thinner the thickness of the uneven portion forming convex portion 214 and the lower the Young's modulus of the uneven portion forming convex portion 214, the smaller the minimum pitch A of the uneven pattern 12a, and the heat shrinkage property. The higher the deformation rate of the film, the deeper the average depth B.
於上述第1製造方法中,在第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度之間的溫度情況下,凹凸區域形成用凸部214之楊氏模量高於加熱收縮性薄膜213之楊氏模量。因此,當在第1樹脂之玻璃轉移溫度與第2樹脂之玻璃轉移溫度之間的溫度進行加工時,凹凸區域形成用凸部214與其說厚度增加,不如說被摺疊。進而,由於凹凸區域形成用凸部214積層於加熱收縮性薄膜213上,故加熱收縮性薄膜213之收縮所產生的應力整體上均勻。因此,使加熱收縮性薄膜213收縮,使得凹凸區域形成用凸部214以摺疊之方式而變形,藉此可形成凹凸區域212。因而,根據上述製造方法,可獲得成為光學片210a之凹凸圖案形成片。 In the first manufacturing method, in the case of the temperature between the glass transition temperature of the first resin and the glass transition temperature of the second resin, the Young's modulus of the uneven portion forming convex portion 214 is higher than that of the heat shrinkable film 213. Young's modulus. Therefore, when the temperature is processed between the glass transition temperature of the first resin and the glass transition temperature of the second resin, the uneven portion forming convex portion 214 is not so thick as to be folded. Further, since the uneven portion forming convex portion 214 is laminated on the heat shrinkable film 213, the stress generated by the shrinkage of the heat shrinkable film 213 is uniform as a whole. Therefore, the heat shrinkable film 213 is shrunk, so that the uneven portion forming convex portion 214 is deformed in a folded manner, whereby the uneven portion 212 can be formed. Therefore, according to the above manufacturing method, the uneven pattern forming sheet which becomes the optical sheet 210a can be obtained.
以上述方式獲得之凹凸圖案形成片可直接用作光學片210a。於此情形時,藉由加熱收縮性薄膜213及凹凸區域形成用凸部214而形成光學片210a。 The uneven pattern forming sheet obtained in the above manner can be directly used as the optical sheet 210a. In this case, the optical sheet 210a is formed by heating the shrinkable film 213 and the uneven portion forming convex portion 214.
第2製造方法係將由第1製造方法而獲得之凹凸圖案形成片作為工程片原版來製造光學片210a之方法。 The second manufacturing method is a method of manufacturing the optical sheet 210a by using the uneven pattern forming sheet obtained by the first manufacturing method as the original sheet of the engineering sheet.
工程片原版可為單葉片狀,亦可為連續之片狀即網狀。 The original piece of the engineering piece may be a single blade shape, or may be a continuous sheet shape or a mesh shape.
作為第2製造方法之具體方法,可列舉例如下述方法(a)~(c): Specific examples of the second production method include the following methods (a) to (c):
方法(a) Method (a)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,塗佈未硬化之電離放射線硬化性樹脂;以及照射電離放射線以使上述硬化性樹脂硬化,之後自工程片原版上剝離已硬化之塗膜。此處,電離放射線通常係指紫外線或電子射線,而本發明中亦包含可見光線、X射線、離子射線等。 The method includes the steps of: applying an uncured ionizing radiation curable resin on a surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet; and irradiating the ionizing radiation to harden the curable resin, and then peeling off from the original sheet of the engineering sheet Hardened coating film. Here, the ionizing radiation generally means ultraviolet rays or electron rays, and the present invention also includes visible light rays, X-rays, ion rays, and the like.
方法(b) Method (b)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,塗佈未硬化之液狀熱硬化性樹脂;以及加熱而使上述液狀熱硬化性樹脂硬化,之後自工程片原版上剝離已硬化之塗膜。 The method includes the steps of: coating an uncured liquid thermosetting resin on a surface on which a concave-convex pattern is formed on an original sheet of an engineering sheet; and heating the liquid thermosetting resin to be cured, and then on the original sheet of the engineering sheet The hardened coating film is peeled off.
方法(c) Method (c)
本方法包括以下步驟:使片狀之熱可塑性樹脂接觸到工程片原版之形成有凹凸圖案之面;將該片狀之熱可塑性樹脂按壓於工程片原版上,且於此狀態下進行加熱而使其軟化,其後進行冷卻;以及自工程片原版上剝離上述已冷卻之片狀熱可塑性樹脂。 The method comprises the steps of: contacting a sheet-shaped thermoplastic resin to a surface of the original sheet of the engineering sheet on which the concave-convex pattern is formed; pressing the sheet-shaped thermoplastic resin on the original sheet of the engineering sheet, and heating in the state of the sheet It is softened and then cooled; and the cooled sheet-like thermoplastic resin is peeled off from the original sheet.
又,亦可使用工程片原版來製作二次工程用成形物,並使用該二次工程用成形物來製造光學片10a。作為使用二次工程用成形物之具體方法,可列舉下述方法(d)~(f): Moreover, the molded article for secondary engineering can be produced using the original sheet of the engineering sheet, and the optical sheet 10a can be produced using the molded article for secondary engineering. Specific methods of using the molded article for secondary engineering include the following methods (d) to (f):
方法(d) Method (d)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,進行鎳等之金屬電鍍,以積層電鍍層;自工程片原版上剝離該電鍍層,以製作金屬製之二次工程用成形物;繼而,於二次工程用成形物之與凹凸圖案相接觸之一側之面上,塗佈未硬化之電離放射線硬化性樹脂;以及照射電離放射線以使上述硬化性樹脂硬化,之後自二次工程用成形物上剝離已硬化之塗膜。 The method comprises the steps of: performing metal plating on nickel on a surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet, and laminating the plating layer; peeling the plating layer from the original sheet of the engineering sheet to prepare a metal for secondary engineering a molded article; then, applying an uncured ionizing radiation curable resin to a surface of the second engineering molded article in contact with the concave-convex pattern; and irradiating the ionizing radiation to cure the curable resin, and thereafter The hardened coating film is peeled off from the molded article for secondary engineering.
方法(e) Method (e)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,積層電鍍層;自工程片原版上剝離該電鍍層,以製作金屬製之二次工程用成形物;於該二次工程用成形物之與凹凸圖案相接觸之一側之面上,塗佈未硬化之液狀熱硬化性樹脂;以及加熱而使該樹脂硬化,之後自二次工程用成形物上剝離已硬化之塗膜。 The method comprises the steps of: laminating a plating layer on a surface of the original sheet on which the concave-convex pattern is formed; peeling the plating layer from the original sheet of the engineering sheet to prepare a metal-made secondary engineering forming product; Applying an unhardened liquid thermosetting resin to the surface on one side of the molded article in contact with the concave-convex pattern; and curing the resin by heating, and then peeling off the hardened coating from the secondary engineering molded article membrane.
方法(f) Method (f)
本方法包括以下步驟:於工程片原版之形成有凹凸圖案之面上,積層電鍍層;自工程片原版上剝離該電鍍層,以製作金屬製之二次工程用成形物;使片狀之熱可塑性樹脂接觸到該二次工程用成形物之與凹凸圖案相接觸之一側之面;將該片狀之熱可塑性樹脂按壓於二次工程用成形物上,且於此狀態下進行加熱而使其軟化,其後進行冷卻;以及自二次工程用成形物上剝離上述已冷卻之片狀熱可塑性樹脂。 The method comprises the steps of: laminating a plating layer on a surface of the original sheet on which the concave-convex pattern is formed; peeling the plating layer from the original sheet of the engineering sheet to prepare a metal-made secondary engineering forming product; and making the sheet-like heat The plastic resin is in contact with the surface on the side in contact with the concave-convex pattern of the secondary engineering molded article; the sheet-shaped thermoplastic resin is pressed against the secondary engineering molded article, and heated in this state. It is softened and then cooled; and the cooled sheet-like thermoplastic resin is peeled off from the secondary engineering molded article.
以下對方法(a)之具體例進行說明。如圖8所示,首先,於網狀之工程片原版110之形成有凹凸圖案112a之面上,藉由塗佈機120來塗佈未硬化之液狀電離放射線硬化性樹脂112c。繼而,將塗佈有該硬化性樹脂之工程片原版110通過輥130而進行按壓,使上述硬化性樹脂填充於工程片原版110之凹凸圖案112a內部。其後,藉由電離放射線照射裝置140而照射電離放射線,使硬化性樹脂交聯.硬化。繼而,自工程片原版110上剝離硬化後之電離放射線硬化性樹脂,藉此可製造網狀之光學片210a。 Specific examples of the method (a) will be described below. As shown in FIG. 8, first, the unhardened liquid ionizing radiation curable resin 112c is applied onto the surface of the mesh-shaped engineering sheet master 110 on which the uneven pattern 112a is formed. Then, the engineering sheet precursor 110 coated with the curable resin is pressed by the roll 130, and the curable resin is filled in the inside of the uneven pattern 112a of the original sheet 110. Thereafter, the ionizing radiation is irradiated by the ionizing radiation irradiation device 140 to crosslink the curable resin. hardening. Then, the hardened ionizing radiation curable resin is peeled off from the original sheet 110, whereby the web-shaped optical sheet 210a can be produced.
於方法(a)中,為了賦予脫模性,在塗佈未硬化之電離放射線硬化性樹脂之前,亦可於工程片原版之形成有凹凸圖案之面上設置厚度為1~10nm左右之由聚矽氧樹脂、氟樹脂等構成之層。 In the method (a), in order to impart releasability, before the application of the uncured ionizing radiation curable resin, a layer having a thickness of about 1 to 10 nm may be provided on the surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet. A layer composed of a silicone resin, a fluororesin, or the like.
作為於工程片原版之形成有凹凸圖案之面上塗佈未硬化之電離放射線硬化性樹脂的塗佈機,可列舉T模塗佈機、輥塗佈機、刮棒塗 佈機等。 A coater for applying an uncured ionizing radiation curable resin to a surface on which a concave-convex pattern is formed on an original sheet of an engineering sheet includes a T-die coater, a roll coater, and a bar coating. Cloth machine, etc.
作為未硬化之電離放射線硬化性樹脂,可列舉含有選自以下物質中之一種以上之成分者:環氧丙烯酸酯、環氧化油丙烯酸酯、丙烯酸胺基甲酸酯、不飽和聚酯、聚酯丙烯酸酯、聚醚丙烯酸酯、乙烯/丙烯酸酯、多烯/丙烯酸酯、矽酮丙烯酸酯、聚丁二烯、聚苯乙烯甲基丙烯酸甲酯等之預聚物、脂肪族丙烯酸酯、脂環式丙烯酸酯、芳香族丙烯酸酯、含氫氧基之丙烯酸酯、含烯丙基之丙烯酸酯、含縮水甘油基之丙烯酸酯、含羧基之丙烯酸酯、含鹵基之丙烯酸酯等單體。未硬化之電離放射線硬化性樹脂較好的是以溶劑等進行稀釋。 Examples of the uncured ionizing radiation curable resin include one or more selected from the group consisting of epoxy acrylate, epoxidized oil acrylate, urethane acrylate, unsaturated polyester, and polyester. Prepolymers of acrylate, polyether acrylate, ethylene/acrylate, polyene/acrylate, fluorenone acrylate, polybutadiene, polystyrene methyl methacrylate, etc., aliphatic acrylate, alicyclic Monomers such as acrylates, aromatic acrylates, hydroxy-containing acrylates, allyl-containing acrylates, glycidyl-containing acrylates, carboxyl-containing acrylates, and halogen-containing acrylates. The uncured ionizing radiation curable resin is preferably diluted with a solvent or the like.
又,亦可於未硬化之電離放射線硬化性樹脂中添加氟樹脂、聚矽氧樹脂等。 Further, a fluororesin, a polyoxymethylene resin or the like may be added to the uncured ionizing radiation curable resin.
當使未硬化之電離放射線硬化性樹脂藉由紫外線而硬化時,較好的是,於未硬化之電離放射線硬化性樹脂中添加苯乙酮類、二苯甲酮類等之光聚合起始劑。 When the uncured ionizing radiation curable resin is cured by ultraviolet rays, it is preferred to add a photopolymerization initiator such as acetophenone or benzophenone to the uncured ionizing radiation curable resin. .
方法(d)具體而言係將方法(a)中之工程片原版變更為使用該工程片原版而製作之二次工程用成形物,除此之外與上述方法(a)相同。 The method (d) is specifically the same as the above method (a) except that the original sheet of the method (a) is changed to a molded article for secondary engineering produced using the original sheet of the sheet.
於方法(b)、(e)中,作為液狀熱硬化性樹脂,可列舉例如未硬化之三聚氰胺樹脂、聚氨酯樹脂、環氧樹脂等。 In the methods (b) and (e), examples of the liquid thermosetting resin include uncured melamine resin, urethane resin, and epoxy resin.
又,方法(b)中之硬化溫度較好的是低於工程片原版之玻璃轉移溫度。若硬化溫度為工程片原版之玻璃轉移溫度以上,則在硬化時工程片原版之凹凸圖案可能會產生變形。 Further, the hardening temperature in the method (b) is preferably lower than the glass transition temperature of the original sheet of the engineering sheet. If the hardening temperature is higher than the glass transition temperature of the original sheet of the engineering sheet, the concave-convex pattern of the original sheet of the engineering sheet may be deformed at the time of hardening.
作為方法(c)、(f)中之透明熱可塑性樹脂,可列舉例如苯乙烯-甲基丙烯酸甲酯共聚物(MS)、聚甲基丙烯酸甲酯(PMMA)、聚苯乙烯(PS)、環烯聚合物(COP)、聚碳酸酯(PC)、聚丙烯(PP)、聚對苯二甲酸乙二酯(PET)、PET-G、聚醚碸(PES)、聚氯乙烯(PVC)、聚對苯二甲酸乙二酯(PET)等樹脂等。於該等之中,從成形加工之觀點而言,尤 其好的是MS、PMMA、PS、COP、PC,從吸濕性及成本之觀點而言,更好的是MS中之苯乙烯含有率為30~90質量%者。 Examples of the transparent thermoplastic resin in the methods (c) and (f) include styrene-methyl methacrylate copolymer (MS), polymethyl methacrylate (PMMA), and polystyrene (PS). Cycloolefin polymer (COP), polycarbonate (PC), polypropylene (PP), polyethylene terephthalate (PET), PET-G, polyether oxime (PES), polyvinyl chloride (PVC) , resin such as polyethylene terephthalate (PET). Among these, from the viewpoint of forming processing, It is preferably MS, PMMA, PS, COP, and PC. From the viewpoint of hygroscopicity and cost, it is more preferable that the styrene content in MS is 30 to 90% by mass.
該等透明熱可塑性樹脂可設為單層或多層構造。例如,可使用於PS層之兩面上設置有PMMA層之三層構造之透明熱可塑性樹脂等。 These transparent thermoplastic resins can be configured in a single layer or a multilayer structure. For example, a transparent thermoplastic resin or the like having a three-layer structure in which PMMA layers are provided on both sides of the PS layer can be used.
進而,亦可使用於上述透明熱可塑性樹脂之表面上設置有高折射率之樹脂者。作為高折射率之樹脂,可列舉例如芴系環氧化合物、芴系丙烯酸酯化合物、芴系聚酯(OKP)、聚甲基苯基矽烷(PMPS)、聚二苯基矽烷(PDPS)等。 Further, a resin having a high refractive index provided on the surface of the above transparent thermoplastic resin may be used. Examples of the resin having a high refractive index include a fluorene-based epoxy compound, a fluorene-based acrylate compound, an anthracene-based polyester (OKP), polymethylphenylnonane (PMPS), and polydiphenyl decane (PDPS).
於方法(c)中將片狀之熱可塑性樹脂按壓於工程片原版時之壓力、及於方法(f)中將片狀之熱可塑性樹脂按壓於二次工程用成形物時之壓力較好的是1~100MPa。若按壓時之壓力為1MPa以上,則可使凹凸圖案高精度地轉印,若按壓時之壓力為100MPa以下,則可防止過剩之加壓。 In the method (c), the pressure at which the sheet-like thermoplastic resin is pressed against the original sheet of the engineering sheet and the pressure at which the sheet-shaped thermoplastic resin is pressed against the molded article for secondary engineering in the method (f) are good. It is 1~100MPa. When the pressure at the time of pressing is 1 MPa or more, the uneven pattern can be transferred with high precision, and when the pressure at the time of pressing is 100 MPa or less, excessive pressurization can be prevented.
又,方法(c)中之熱可塑性樹脂之加熱溫度較好的是低於工程片原版之玻璃轉移溫度。其原因在於,若加熱溫度為工程片原版之玻璃轉移溫度以上,則在加熱時工程片原版之凹凸圖案可能會產生變形。 Further, the heating temperature of the thermoplastic resin in the method (c) is preferably lower than the glass transition temperature of the original sheet of the engineering sheet. The reason for this is that if the heating temperature is equal to or higher than the glass transition temperature of the original sheet of the engineering sheet, the uneven pattern of the original sheet of the engineering sheet may be deformed during heating.
從可使凹凸圖案高精度地轉印之角度而言,作為加熱後之冷卻溫度,較好的是小於熱可塑性樹脂之玻璃轉移溫度。 From the viewpoint of allowing the uneven pattern to be transferred with high precision, the cooling temperature after heating is preferably smaller than the glass transition temperature of the thermoplastic resin.
第3製造方法係將於樹脂製的層之表面上設置有金屬製或金屬化合物製之凹凸區域的凹凸圖案形成片作為工程片原版來製造光學片210a之方法。 In the third manufacturing method, a method of manufacturing the optical sheet 210a by forming a concave-convex pattern forming sheet of a concave-convex region made of a metal or a metal compound on the surface of a resin layer is used.
設置有金屬製或金屬化合物製之凹凸區域之凹凸圖案形成片可藉由以下方法而獲得:將樹脂製之凹凸區域形成用凸部替換為金屬製或金屬化合物製之凹凸區域形成用凸部,藉由蒸鍍來取代印刷而形成凹凸區域形成用凸部,除此之外,以與第1製造方法相同之方法而獲 得。 The concave-convex pattern forming sheet provided with the uneven portion made of a metal or a metal compound can be obtained by replacing the convex portion for forming a concave-convex region made of a resin with a convex portion for forming a concave-convex region made of a metal or a metal compound. In the same manner as the first manufacturing method, the convex portion for forming the uneven portion is formed by vapor deposition instead of printing. Got it.
亦即,設置有金屬製或金屬化合物製之凹凸區域的凹凸圖案形成片之製造方法包括以下步驟:於加熱收縮性薄膜之一面上真空蒸鍍金屬製或金屬化合物製之凹凸區域形成用凸部,以形成蒸鍍片;以及使加熱收縮性薄膜加熱收縮,使得蒸鍍片之至少凹凸區域形成用凸部以摺疊之方式而變形。 In other words, the method for producing a concave-convex pattern forming sheet provided with a concave-convex region made of a metal or a metal compound includes the steps of vacuum-depositing a convex portion for forming a concave-convex region made of a metal or a metal compound on one surface of the heat-shrinkable film. To form a vapor-deposited sheet; and to heat-shrink the heat-shrinkable film so that at least the uneven portion forming convex portion of the vapor-deposited sheet is deformed by folding.
於該凹凸圖案形成片之製造方法中,金屬製或金屬化合物製之凹凸區域形成用凸部之楊氏模量遠大於加熱收縮性薄膜之楊氏模量,因此熱壓縮時,凹凸區域形成用凸部與其說厚度增加,不如說被摺疊。其結果可獲得設置有凹凸區域之凹凸圖案形成片。再者,該凹凸圖案形成片之凹凸區域與光學片210a之凹凸區域相同。 In the method for producing a concave-convex pattern forming sheet, the Young's modulus of the convex portion for forming a concave-convex region made of a metal or a metal compound is much larger than the Young's modulus of the heat-shrinkable film, so that the uneven portion is formed during thermal compression. The convex portion is not so thick as it is folded. As a result, a concave-convex pattern forming sheet provided with uneven portions can be obtained. Further, the uneven portion of the uneven pattern forming sheet is the same as the uneven portion of the optical sheet 210a.
作為第3製造方法中之構成凹凸區域形成用凸部之金屬,從可更容易形成凹凸圖案12a之角度而言,較好的是選自由金、鋁、銀、碳、銅、鍺、銦、鎂、鈮、鈀、鉛、鉑、矽、錫、鈦、釩、鋅、鉍所組成之群中之至少一種金屬。此處所言之金屬亦包含半金屬。 The metal constituting the convex portion for forming an uneven portion in the third manufacturing method is preferably selected from the group consisting of gold, aluminum, silver, carbon, copper, bismuth, and indium from the viewpoint that the uneven pattern 12a can be more easily formed. At least one metal selected from the group consisting of magnesium, strontium, palladium, lead, platinum, rhodium, tin, titanium, vanadium, zinc, and antimony. The metal referred to herein also contains a semimetal.
作為金屬化合物,因同樣之理由,故較好的是選自由氧化鈦、氧化鋁、氧化鋅、氧化鎂、氧化錫、氧化銅、氧化銦、氧化鎘、氧化鉛、氧化矽、氟化鋇、氟化鉀、氟化鎂、硫化鋅、砷化鎵所組成之群中之至少一種金屬化合物。 The metal compound is preferably selected from the group consisting of titanium oxide, aluminum oxide, zinc oxide, magnesium oxide, tin oxide, copper oxide, indium oxide, cadmium oxide, lead oxide, antimony oxide, antimony fluoride, and the like. At least one metal compound of the group consisting of potassium fluoride, magnesium fluoride, zinc sulfide, and gallium arsenide.
從可容易形成所需之凹凸圖案12a之角度而言,凹凸區域形成用凸部之表面係指JIS B0601中記載之中心線平均粗糙度為0.1μm以下。 The surface of the uneven portion forming convex portion means that the center line average roughness described in JIS B0601 is 0.1 μm or less from the viewpoint of easily forming the desired uneven pattern 12a.
金屬製或金屬化合物製的凹凸區域形成用凸部之厚度較好的是0.01~0.2μm,更好的是0.05~0.1μm。若凹凸區域形成用凸部之厚度為上述範圍,則能夠可靠地使凹凸圖案12a之最頻間距A超過1μm且為20μm以下。然而,若凹凸區域形成用凸部之厚度不足0.01μm,則最頻間距A有時會成為1μm以下,若超過0.2μm,則最頻間距A有時 會超過20μm。 The thickness of the convex portion for forming the uneven portion made of a metal or a metal compound is preferably 0.01 to 0.2 μm, more preferably 0.05 to 0.1 μm. When the thickness of the uneven portion forming convex portion is within the above range, the most frequent pitch A of the uneven pattern 12a can be reliably more than 1 μm and 20 μm or less. However, when the thickness of the uneven portion forming convex portion is less than 0.01 μm, the most frequent pitch A may be 1 μm or less, and if it exceeds 0.2 μm, the worst pitch A may be Will exceed 20μm.
進而,凹凸區域形成用凸部之厚度亦可不固定,例如,其可沿著一方向而連續地變厚,亦可沿著一方向而連續地變薄。 Further, the thickness of the uneven portion forming convex portion may not be constant, and for example, it may be continuously thickened in one direction or continuously thinned in one direction.
當於加熱收縮性薄膜上蒸鍍金屬或金屬化合物製之凹凸區域形成用凸部時,於加熱收縮性薄膜之表面上,載置藉由與欲形成之凹凸區域形成用凸部相同之圖案而開口之遮罩。 When a convex portion for forming a concave-convex region made of a metal or a metal compound is deposited on the heat shrinkable film, the same pattern as the convex portion for forming the uneven region to be formed is placed on the surface of the heat shrinkable film. The mask of the opening.
作為使加熱收縮性薄膜加熱收縮時之加熱方法,可列舉於熱風、蒸氣或熱水中通過之方法等,其中,從可使加熱收縮性薄膜均勻地收縮之角度而言,尤其好的是於熱水中通過之方法。 The heating method for heating and shrinking the heat shrinkable film may be, for example, a method of passing through hot air, steam or hot water, and the like, in particular, from the viewpoint of uniformly shrinking the heat shrinkable film, The method of passing through hot water.
作為第3製造方法,具體而言可列舉下述方法:於第2製造方法中之方法(a)~(f)中,使用設置有金屬製或金屬化合物製之凹凸區域的凹凸圖案形成片作為工程片原版,以取代設置有第2樹脂製之凹凸區域的凹凸圖案形成片。 Specifically, in the method (a) to (f) in the second production method, a concave-convex pattern forming sheet provided with a concave-convex region made of a metal or a metal compound is used as the third method. The original sheet of the engineering sheet is formed into a sheet instead of the uneven pattern provided with the uneven portion of the second resin.
第4製造方法係使用成形裝置,由未成形之透明熱可塑性樹脂來製造光學片10a之方法,上述成形裝置具備金屬模具、對該金屬模具進行加熱冷卻之加熱冷卻機構、以及對該金屬模具進行加壓之加壓機構。作為第4製造方法中使用之透明熱可塑性樹脂,可列舉與第2製造方法中所使用之透明熱可塑性樹脂相同者。 The fourth manufacturing method is a method of manufacturing an optical sheet 10a from an unformed transparent thermoplastic resin using a molding apparatus, the molding apparatus including a metal mold, a heating and cooling mechanism for heating and cooling the metal mold, and the metal mold Pressurized pressurizing mechanism. The transparent thermoplastic resin used in the fourth production method is the same as the transparent thermoplastic resin used in the second production method.
具體而言,於第4製造方法中,首先,將透明熱可塑性樹脂之顆粒或粉體填充於金屬模具內,藉由加熱冷卻機構對金屬模具進行加熱,並且藉由加壓機構對金屬模具內進行加壓。其次,藉由加熱冷卻機構對金屬模具內進行冷卻,並停止加壓,以獲得光學片210a。 Specifically, in the fourth manufacturing method, first, a pellet or a powder of a transparent thermoplastic resin is filled in a metal mold, the metal mold is heated by a heating and cooling mechanism, and the metal mold is pressed by a pressurizing mechanism. Pressurize. Next, the inside of the mold is cooled by a heating and cooling mechanism, and the pressurization is stopped to obtain an optical sheet 210a.
於該製造方法中,使用在與光學片210a之出射面相接觸之面上形成有蛇行之波狀凹凸圖案者作為金屬模具。例如,作為金屬模具,可使用在一面上安裝有第1~第3製造方法中之凹凸圖案形成片者、藉由 雷射照射等而於一面上形成有蛇行之波狀凹凸圖案者。 In the manufacturing method, a wavy concave-convex pattern in which a meandering is formed on a surface in contact with the exit surface of the optical sheet 210a is used as the metal mold. For example, as a metal mold, a concave-convex pattern forming sheet in the first to third manufacturing methods can be mounted on one surface, A wavy concave-convex pattern of a meandering is formed on one surface by laser irradiation or the like.
作為第4製造方法中之成形方法,可應用例如壓製成形法、射出成形法。 As a molding method in the fourth production method, for example, a press molding method or an injection molding method can be applied.
藉由上述第1~第4製造方法而獲得之光學片210a可直接使用,亦可經由接著劑而貼合於透明樹脂製或玻璃製的增強用基板上而形成最終之光學片。 The optical sheet 210a obtained by the above-described first to fourth manufacturing methods can be used as it is, or can be bonded to a reinforcing substrate made of a transparent resin or glass via an adhesive to form a final optical sheet.
於以上所說明之光學片210a之製造方法中,容易於平坦之一面上,以於光學片210a之長度方向之另一端β側變密之圖案而配置凹凸區域212。因此,可容易獲得於長度方向之另一端β側光擴散性較高之光學片210a。 In the method of manufacturing the optical sheet 210a described above, it is easy to arrange the uneven region 212 on the flat surface, and to form a pattern in which the other end β side in the longitudinal direction of the optical sheet 210a is dense. Therefore, the optical sheet 210a having high light diffusibility on the other side of the β side in the longitudinal direction can be easily obtained.
以下對本發明之光學片之第2實施形態進行說明。 Next, a second embodiment of the optical sheet of the present invention will be described.
圖17表示本實施形態之光學片。再者,於圖17中,為了易於說明,將凹凸區域215放大,且將其配置零散顯示。 Fig. 17 shows an optical sheet of this embodiment. Further, in Fig. 17, for the sake of convenience of explanation, the uneven portion 215 is enlarged, and the arrangement thereof is displayed in a scattered manner.
本實施形態之光學片210b係用作於長度方向之一端α上配置有光源330之光擴散片者,且係於平坦之一面211上,藉由以下圖案而分散配置有沿著光學片210b之寬度方向所形成的帶狀之凹凸區域215,亦即,隨著自光學片210b之長度方向之一端α朝向另一端β而逐漸變密之圖案。 The optical sheet 210b of the present embodiment is used as a light diffusing sheet in which the light source 330 is disposed at one end α of the longitudinal direction, and is attached to the flat one surface 211, and is disposed along the optical sheet 210b by the following pattern. The strip-shaped uneven region 215 formed in the width direction, that is, a pattern which gradually becomes denser as one end α from the longitudinal direction of the optical sheet 210b faces the other end β.
以上述方式配置凹凸區域215後,可與第1實施形態之光學片210a同樣地在光學片210b之另一端β側提高光擴散性。 When the uneven portion 215 is disposed as described above, the light diffusibility can be improved on the other end β side of the optical sheet 210b in the same manner as the optical sheet 210a of the first embodiment.
第2實施形態之凹凸區域215之凹凸圖案係與第1實施形態之凹凸區域212之凹凸圖案12a相同。凹凸區域215之面積相對於光學片210b之一面之面積的面積比例亦與第1實施形態中之面積比例相同。 The uneven pattern of the uneven portion 215 of the second embodiment is the same as the uneven pattern 12a of the uneven portion 212 of the first embodiment. The area ratio of the area of the uneven portion 215 to the area of one surface of the optical sheet 210b is also the same as the area ratio in the first embodiment.
第2實施形態之光學片210b可藉由與第1實施形態之光學片210a之製造方法相同的製造方法而製造。 The optical sheet 210b of the second embodiment can be produced by the same manufacturing method as the method of manufacturing the optical sheet 210a of the first embodiment.
以下對本發明之光學片之第3實施形態進行說明。 Next, a third embodiment of the optical sheet of the present invention will be described.
圖18表示本實施形態之光學片。再者,於圖18中,為了易於說明,將凹凸區域216放大,且將其配置零散顯示。 Fig. 18 shows an optical sheet of this embodiment. Further, in Fig. 18, for the sake of convenience of explanation, the uneven portion 216 is enlarged, and the arrangement thereof is displayed in a scattered manner.
本實施形態之光學片210c係用作於長度方向之一端α上配置光源330之光擴散片者,且係於平坦之一面211上,分散配置有由光學片210c的沿著長度方向之帶狀部分216a及沿著寬度方向之帶狀部分16b所構成之網狀凹凸區域216。凹凸區域216的沿著光學片210c之寬度方向之部分216b配置為,隨著自光學片210c之長度方向之一端α朝向另一端β而逐漸變密。 The optical sheet 210c of the present embodiment is used as a light diffusing sheet in which the light source 330 is disposed at one end α of the longitudinal direction, and is attached to the flat one surface 211, and is disposed in a strip shape along the longitudinal direction of the optical sheet 210c. The portion 216a and the mesh-like uneven portion 216 formed along the strip portion 16b in the width direction. The portion 216b of the uneven portion 216 along the width direction of the optical sheet 210c is disposed to be gradually densified as the one end α from the longitudinal direction of the optical sheet 210c faces the other end β.
第3實施形態之凹凸區域216之凹凸圖案係與第1實施形態之凹凸區域212之凹凸圖案12a相同。凹凸區域216之面積相對於光學片210c之一面之面積的面積比例亦與第1實施形態中之面積比例相同。 The uneven pattern of the uneven portion 216 of the third embodiment is the same as the uneven pattern 12a of the uneven portion 212 of the first embodiment. The area ratio of the area of the uneven portion 216 to the area of one surface of the optical sheet 210c is also the same as the area ratio in the first embodiment.
第3實施形態之光學片210c可藉由與第1實施形態之光學片210a之製造方法相同的製造方法而製造。 The optical sheet 210c of the third embodiment can be produced by the same manufacturing method as the method of manufacturing the optical sheet 210a of the first embodiment.
以下對本發明之光學片之第4實施形態進行說明。 Next, a fourth embodiment of the optical sheet of the present invention will be described.
圖19表示本實施形態之光學片。再者,於圖19中,為了易於說明,將凹凸區域217放大,且將其配置零散顯示。 Fig. 19 shows an optical sheet of this embodiment. Further, in Fig. 19, for the sake of convenience of explanation, the uneven portion 217 is enlarged, and the arrangement thereof is displayed in a scattered manner.
本實施形態之光學片210d係用作於未形成有凹凸區域217之一側之面C上配置有線狀之光源330的光擴散片者。又,該光學片210d中,於平坦之一面211上分散配置有橢圓形狀之凹凸區域217,該凹凸區域217越靠近光源330則越密。 The optical sheet 210d of the present embodiment is used as a light diffuser in which a linear light source 330 is disposed on a surface C on which one side of the uneven portion 217 is not formed. Further, in the optical sheet 210d, an elliptical concave-convex region 217 is disposed on the flat surface 211, and the concave-convex region 217 is denser as it is closer to the light source 330.
於本實施形態中,來自光源330之光不均勻地入射至光學片210d,但由於越強的光所到達之部分,凹凸區域217之配置會越密,故可使光在擴散之狀態下出射。因此,可使自光學片210d出射之光之 強度均勻化。 In the present embodiment, the light from the light source 330 is unevenly incident on the optical sheet 210d. However, since the portion where the stronger the light reaches, the arrangement of the uneven portion 217 becomes denser, so that the light can be emitted in a diffused state. . Therefore, the light emitted from the optical sheet 210d can be made The intensity is uniformized.
第4實施形態之凹凸區域217之凹凸圖案係與第1實施形態之凹凸區域212之凹凸圖案12a相同。凹凸區域217之面積相對於光學片210d之一面之面積的面積比例亦與第1實施形態中之面積比例相同。 The uneven pattern of the uneven portion 217 of the fourth embodiment is the same as the uneven pattern 12a of the uneven portion 212 of the first embodiment. The area ratio of the area of the uneven portion 217 to the area of one surface of the optical sheet 210d is also the same as the area ratio in the first embodiment.
第4實施形態之光學片210d可藉由與第1實施形態之光學片210a之製造方法相同的製造方法而製造。 The optical sheet 210d of the fourth embodiment can be produced by the same manufacturing method as the method of manufacturing the optical sheet 210a of the first embodiment.
再者,本發明之光學片並未限定於上述實施形態。 Furthermore, the optical sheet of the present invention is not limited to the above embodiment.
例如,於上述第1實施形態、第4實施形態中,凹凸區域之外形為橢圓形,但亦可為圓形、矩形等。 For example, in the first embodiment and the fourth embodiment, the concave and convex regions are formed in an elliptical shape, but may be circular, rectangular or the like.
又,於本發明之光學片中,凹凸區域亦可隨機地形成。 Further, in the optical sheet of the present invention, the uneven regions may be formed at random.
又,凹凸區域之凹凸圖案亦可不呈蛇行,而呈直線形。 Further, the concave-convex pattern of the uneven portion may not be meandering but may be linear.
又,凹凸區域亦可形成於光學片之兩面上。 Further, the uneven regions may be formed on both surfaces of the optical sheet.
又,光學片亦可藉由增強用基材而增強。 Further, the optical sheet can also be reinforced by the reinforcing substrate.
以下對本發明之擴散導光體之一實施形態進行說明。 Hereinafter, an embodiment of the diffused light guide of the present invention will be described.
圖1表示本實施形態之擴散導光體。本實施形態之擴散導光體10係由在其中之一面上形成有蛇行之波狀凹凸圖案12a的透明樹脂層11所構成。本實施形態中之透明樹脂層11之另一面(背面)係並未形成有凹凸圖案的平滑之面。 Fig. 1 shows a diffused light guide of this embodiment. The diffused light guide 10 of the present embodiment is composed of a transparent resin layer 11 in which a meandering corrugated pattern 12a is formed on one of the surfaces. The other surface (back surface) of the transparent resin layer 11 in the present embodiment is not formed with a smooth surface of the uneven pattern.
凹凸圖案12a之最頻間距A超過1μm且為20μm以下,較好的是超過1μm且為10μm以下。若最頻間距A不足1μm,則該最頻間距A為可見光之波長以下,因而可見光不會因凹凸而折射,而是光會透過,若最頻間距A超過20μm,則擴散之異向性會變低,從而易產生亮度不均。 The most frequent pitch A of the uneven pattern 12a is more than 1 μm and is 20 μm or less, preferably more than 1 μm and not more than 10 μm. When the most frequent pitch A is less than 1 μm, the most frequent pitch A is equal to or less than the wavelength of visible light, so that visible light is not refracted by irregularities, but light is transmitted. If the most frequent spacing A exceeds 20 μm, the diffusion anisotropy is It becomes low, which tends to cause uneven brightness.
凹凸圖案12a之凹凸之平均深度B相對於凹凸圖案12a之最頻間距 A之比(B/A,以下稱為縱橫比)較好的是0.1~3.0。若縱橫比不足0.1,則擴散之異向性變低,易產生亮度不均。另一方面,若縱橫比大於3.0,則在製造擴散導光體10時難以形成凹凸圖案12a。 The average depth B of the unevenness of the concave-convex pattern 12a with respect to the most frequent pitch of the concave-convex pattern 12a The ratio A (B/A, hereinafter referred to as the aspect ratio) is preferably 0.1 to 3.0. When the aspect ratio is less than 0.1, the anisotropy of diffusion becomes low, and uneven brightness is likely to occur. On the other hand, when the aspect ratio is more than 3.0, it is difficult to form the uneven pattern 12a when the diffusing light guide 10 is manufactured.
此處,所謂平均深度B,係指凹凸圖案12a之底部12b之平均深度。又,底部12b係指凹凸圖案12a之凹部之極小值,平均深度B係指對將擴散導光體10沿長度方向截斷所得之剖面(參照圖2)進行觀察時,自與整個擴散導光體10之面方向平行的基準線L1至各凸部之頂部為止的長度B1、B2、B3...平均值(BAV)、與自基準線L1至各凹部之底部為止的長度b1、b2、b3...之平均值(bAV)之差(bAV-BAV)。 Here, the average depth B refers to the average depth of the bottom portion 12b of the concavo-convex pattern 12a. Further, the bottom portion 12b refers to the minimum value of the concave portion of the concave-convex pattern 12a, and the average depth B refers to the entire diffused light guide body when the cross-section obtained by cutting the diffusion light guide 10 in the longitudinal direction (see FIG. 2) is observed. a direction parallel to the surface 10 of the reference line L 1 until the top of each protrusion length B up, the bottom 1, B 2, B 3 ... average value (the AV B) and L 1 from the reference line to each of the recessed portions The difference between the average values (b AV ) of the lengths b 1 , b 2 , b 3 ... (b AV -B AV ).
作為測定平均深度B之方法,可採用下述方法等:測定由原子間力顯微鏡所拍攝之凹凸圖案12a之剖面之圖像中的各底部12b之深度,並求出該等之平均值。 As a method of measuring the average depth B, a method of measuring the depth of each of the bottom portions 12b in the image of the cross section of the concave-convex pattern 12a taken by the atomic force microscope, and determining the average value thereof may be employed.
本發明中之蛇行係指以下述方法求得之凹凸之配向度為0.3以上。該配向度係凹凸之配向之不均勻的指標,該值越大,則表示配向越不均勻。 The meandering in the present invention means that the degree of alignment of the irregularities obtained by the following method is 0.3 or more. The alignment degree is an index of the unevenness of the alignment of the unevenness, and the larger the value, the more uneven the alignment.
為了求出配向度,首先,藉由表面光學顯微鏡來拍攝凹凸圖案之上表面,並將該圖像轉換成灰度文檔(例如,tiff格式等)。於灰度文檔之圖像(參照圖3)中,白度越低之處,則表示凹部之底部越深(白度越高之處,則凸部之頂部越高)。繼而,對灰度文檔之圖像進行傅立葉轉換。圖4中顯示傅立葉轉換後之圖像。自圖4之圖像之中心向兩側擴展之白色部分中包含凹凸圖案12a之間距及朝向之資訊。 In order to determine the degree of alignment, first, the surface of the concave-convex pattern is photographed by a surface optical microscope, and the image is converted into a grayscale document (for example, a tiff format or the like). In the image of the grayscale document (refer to FIG. 3), the lower the whiteness, the deeper the bottom of the concave portion (the higher the whiteness, the higher the top of the convex portion). Then, Fourier transform is performed on the image of the grayscale document. The Fourier transformed image is shown in FIG. The white portion extending from the center of the image of Fig. 4 to the sides includes information on the distance between the concave and convex patterns 12a and the orientation.
其次,自圖4之圖像之中心沿水平方向引輔助線L2,並對該輔助線上之亮度進行描繪(參照圖5)。圖5之描繪中橫軸表示間距,縱軸表示頻率,頻率為最大之值X表示凹凸圖案12a之最頻間距。 Next, the auxiliary line L 2 is drawn in the horizontal direction from the center of the image of Fig. 4, and the brightness on the auxiliary line is drawn (refer to Fig. 5). In the drawing of Fig. 5, the horizontal axis represents the pitch, the vertical axis represents the frequency, and the frequency is the maximum value X represents the most frequent pitch of the concave-convex pattern 12a.
繼而,於圖4中,引輔助線L3,其在值X之部分與輔助線L2正交,並對該輔助線L3上之亮度進行描繪(參照圖6)。其中,為了可與 各種凹凸構造進行比較,圖6之橫軸設為除以X值後所得之數值。圖6之橫軸表示體現相對於凹凸之形成方向(圖3中的上下方向)的傾斜程度之指標(配向性),縱軸表示頻率。圖6之描繪中的波峰之半值寬度W1(頻率為最大值之一半的高度上的波峰之寬度)表示凹凸圖案之配向度。半值寬度W1越大,則表示蛇行使得間距越不均勻。 Next, in Fig. 4, the auxiliary line L 3 is orthogonal to the auxiliary line L 2 at the portion of the value X, and the luminance on the auxiliary line L 3 is drawn (see Fig. 6). In order to compare with various concavo-convex structures, the horizontal axis of Fig. 6 is a value obtained by dividing the X value. The horizontal axis of Fig. 6 indicates an index (orientation) indicating the degree of inclination with respect to the direction in which the unevenness is formed (the vertical direction in Fig. 3), and the vertical axis indicates the frequency. The half value width W 1 of the peak in the depiction of Fig. 6 (the width of the peak at a height of one half of the maximum value) indicates the degree of alignment of the concave and convex pattern. The larger the half value width W 1 , the more random the pitch is.
若上述配向度不足0.3,則凹凸圖案12a之配向之不均勻較小,故光之擴散之異向性變小。 When the degree of alignment is less than 0.3, the unevenness of the alignment of the uneven pattern 12a is small, and the anisotropy of diffusion of light is small.
又,配向度較好的是1.0以下。若配向度超過1.0,則凹凸圖案之方向會於某程度變得隨機,因此光擴散性變高,但異向性具有變低之傾向。 Further, the degree of alignment is preferably 1.0 or less. When the degree of alignment exceeds 1.0, the direction of the concavo-convex pattern becomes random to some extent, and thus the light diffusibility becomes high, but the anisotropy tends to be low.
為了使配向度為0.3以上,例如於下述製造中,可適當選擇加熱收縮性薄膜與表面平滑之硬質層。例如,加熱收縮性薄膜之收縮率越高,或者表面平滑之硬質層之楊氏模量越小,則配向性越大。藉由該製造方法而獲得之擴散導光體10係由兩層樹脂層所構成者。 In order to make the degree of alignment 0.3 or more, for example, in the following production, a heat shrinkable film and a hard layer having a smooth surface can be appropriately selected. For example, the higher the shrinkage ratio of the heat shrinkable film or the smaller the Young's modulus of the hard layer having a smooth surface, the greater the alignment. The diffusing light guiding body 10 obtained by the manufacturing method is composed of two resin layers.
又,亦可採用如下方法,亦即,使用在一表面上形成有配向度為0.3以上之凹凸圖案的金屬模具來使透明樹脂成形。藉由該製造方法而獲得之擴散導光體10係由一層樹脂層所構成者。 Further, a method may be employed in which a transparent resin is formed by using a metal mold having a concave-convex pattern having an orientation of 0.3 or more on one surface. The diffusing light guiding body 10 obtained by the manufacturing method is composed of a resin layer.
再者,以上述方式利用傅立葉轉換而求得之凹凸圖案之最頻間距係與平均間距相同。 Further, the most frequent pitch of the concave-convex pattern obtained by Fourier transform in the above manner is the same as the average pitch.
透明樹脂層11係由可見光之透過率較高(具體而言,可見光之全光線透過率為85%)之透明樹脂所構成。 The transparent resin layer 11 is composed of a transparent resin having a high transmittance of visible light (specifically, a total light transmittance of visible light of 85%).
又,為了使耐熱性、耐光性提高,可在不損害透光率等光學特性之範圍內,於透明樹脂層11中含有添加劑。作為添加劑,可列舉光穩定劑、紫外線吸收劑、抗氧化劑、潤滑劑、光擴散劑等。其中尤其好的是添加光穩定劑,其添加量較好的是,相對於透明樹脂100質量份為0.03~2.0質量份。若光穩定劑之添加量為0.03質量份以上,則可 充分發揮其添加效果,但若光穩定劑之添加量超過2.0質量份,則光穩定劑之量過剩,從而具有不必要之成本上漲之傾向。 Moreover, in order to improve heat resistance and light resistance, an additive may be contained in the transparent resin layer 11 in the range which does not impair optical characteristics, such as a light transmittance. Examples of the additive include a light stabilizer, an ultraviolet absorber, an antioxidant, a lubricant, and a light diffusing agent. Among them, it is particularly preferable to add a light stabilizer in an amount of preferably 0.03 to 2.0 parts by mass based on 100 parts by mass of the transparent resin. If the amount of the light stabilizer added is 0.03 parts by mass or more, When the addition amount of the light stabilizer exceeds 2.0 parts by mass, the amount of the light stabilizer is excessive, and there is a tendency that unnecessary cost rises.
又,為不進一步提高光擴散效果,可在不會較大地損害透光率等光學特性之範圍內,使透明樹脂層11中含有由無機化合物構成之無機光擴散劑、由有機化合物構成之有機光擴散劑。 Further, in order to further improve the light-diffusing effect, the transparent resin layer 11 may contain an inorganic light-diffusing agent composed of an inorganic compound and an organic compound composed of an organic compound in a range that does not greatly impair optical characteristics such as light transmittance. Light diffusing agent.
作為無機光擴散劑,可列舉二氧化矽、白碳、滑石、氧化鎂、氧化鋅、氧化鈦、碳酸鈣、氫氧化鋁、硫酸鋇、矽酸鈣、矽酸鎂、矽酸鋁、矽酸鋁化鈉、矽酸鋅、玻璃、雲母等。 Examples of the inorganic light diffusing agent include cerium oxide, white carbon, talc, magnesium oxide, zinc oxide, titanium oxide, calcium carbonate, aluminum hydroxide, barium sulfate, calcium citrate, magnesium citrate, aluminum citrate, and citric acid. Sodium aluminide, zinc antimonate, glass, mica, and the like.
作為有機光擴散劑,可列舉苯乙烯系聚合粒子、丙烯酸系聚合粒子、矽氧烷系聚合粒子、聚醯胺系聚合粒子等。該等光擴散劑可分別單獨使用,或者亦可將兩種以上組合而使用。 Examples of the organic light-diffusing agent include styrene-based polymer particles, acrylic polymer particles, siloxane-based polymer particles, and polyamid-based polymer particles. These light diffusing agents may be used singly or in combination of two or more.
又,為了獲得優異之光散射特性,該等光擴散劑亦可設為花瓣狀或球晶狀等多孔質構造。 Further, in order to obtain excellent light scattering characteristics, the light diffusing agents may be formed into a porous structure such as a petal shape or a spherical crystal.
從難以損害透光性之角度而言,光擴散劑之含量較好的是相對於透明樹脂100質量份為10質量份以下。 The content of the light diffusing agent is preferably 10 parts by mass or less based on 100 parts by mass of the transparent resin, from the viewpoint of being difficult to impair the light transmittance.
進而,為了進一步提高光擴散效果,可在不會較大地損害透光率等光學特性之範圍內,使透明樹脂層11中含有微細氣泡。微細氣泡對光之吸收較少,難以使透光率降低。 Further, in order to further enhance the light diffusion effect, the transparent resin layer 11 may contain fine bubbles in a range that does not greatly impair optical characteristics such as light transmittance. The fine bubbles absorb less light and it is difficult to lower the light transmittance.
作為微細氣泡之形成方法,可應用向透明樹脂層11中混入發泡劑之方法(例如,日本專利特開平5-212811號公報、日本專利特開平6-107842號公報中揭示之方法)、對丙烯酸系發泡樹脂進行發泡處理以使其含有微細氣泡之方法(例如,日本專利特開2004-2812號公報中揭示之方法)等。進而,就可實現更加均勻的面照射而言,微細氣泡之形成方法較好的是使特定位置不均勻地發泡之方法(例如,日本專利特開2006-124499號公報中揭示之方法)。 As a method of forming the fine bubbles, a method of mixing a foaming agent into the transparent resin layer 11 can be applied (for example, the method disclosed in Japanese Laid-Open Patent Publication No. Hei 5-212811, No. Hei. A method in which an acrylic foamed resin is subjected to a foaming treatment to contain fine air bubbles (for example, a method disclosed in Japanese Laid-Open Patent Publication No. 2004-2812). Further, in order to achieve more uniform surface irradiation, the method of forming fine bubbles is preferably a method of uniformly foaming a specific position (for example, the method disclosed in Japanese Laid-Open Patent Publication No. 2006-124499).
再者,亦可併用上述光擴散劑與微細發泡。 Further, the above light diffusing agent may be used in combination with fine foaming.
透明樹脂層11之厚度較好的是0.02~3.0mm,更好的是0.05~2.5mm,尤其好的是0.1~2.0mm。若透明樹脂層11之厚度不足0.02mm,則因其厚度會小於凹凸圖案之深度而不適當,若其厚度厚於3.0mm,則因擴散導光體10之質量較大而可能難以操作。 The thickness of the transparent resin layer 11 is preferably 0.02 to 3.0 mm, more preferably 0.05 to 2.5 mm, and particularly preferably 0.1 to 2.0 mm. When the thickness of the transparent resin layer 11 is less than 0.02 mm, the thickness thereof is less than the depth of the uneven pattern, and if the thickness is thicker than 3.0 mm, the quality of the diffused light guide 10 may be difficult to handle due to the large mass.
透明樹脂層11亦可由兩層以上之樹脂層所構成。即使當透明樹脂層11係由兩層以上之層所構成時,透明樹脂層11之厚度亦較好的是0.02~3.0mm。 The transparent resin layer 11 may also be composed of two or more resin layers. Even when the transparent resin layer 11 is composed of two or more layers, the thickness of the transparent resin layer 11 is preferably from 0.02 to 3.0 mm.
可利用與上述光學片之製造方法相同之製造方法來製造。 It can be manufactured by the manufacturing method similar to the manufacturing method of the above-mentioned optical sheet.
上述擴散導光體10具有光之異向擴散性。具體而言,當在擴散導光體10之未形成有凹凸圖案12a之一側之面(背面)側上設置有光源時,從光源發出之光自背面入射至擴散導光體10,並通過擴散導光體10內而到達凹凸面。此處,入射角為0度以上且以不足臨界角之角度到達之光在折射之狀態下出射至擴散導光體10之外。由於通過擴散導光體10內之光之方向並非為一方向,因此擴散導光體10之凹凸面與光之角度並非固定,故光以寬泛之角度折射。並且,由於凹凸呈蛇行且配向不均,因此擴散之異向性較高。 The diffused light guide 10 has an anisotropic diffusibility of light. Specifically, when a light source is provided on the side (back surface) side of the diffusing light guide 10 on the side where the concave-convex pattern 12a is not formed, light emitted from the light source is incident from the back surface to the diffusion light guide 10, and passes through The inside of the light guide 10 is diffused to reach the uneven surface. Here, the light having an incident angle of 0 or more and reaching at an angle less than the critical angle is emitted to the outside of the diffused light guide 10 in a state of being refracted. Since the direction of the light passing through the diffused light guide 10 is not one direction, the angle between the uneven surface of the diffused light guide 10 and the light is not fixed, so the light is refracted at a wide angle. Further, since the irregularities are meandering and the alignment is uneven, the anisotropy of diffusion is high.
再者,以臨界角以上之角度到達凹凸面之光經全反射後再次於擴散導光體內行進,但隨後在以不足臨界角之角度到達凹凸面時出射。又,以入射角為0度之角度到達之光並不折射,而是直接出射至擴散導光體之外。 Further, the light reaching the concave-convex surface at an angle equal to or higher than the critical angle is totally reflected and then travels again in the diffused light guide body, but then exits when reaching the concave-convex surface at an angle less than the critical angle. Further, the light that arrives at an angle of incidence of 0 degrees is not refracted, but is directly emitted outside the diffused light guide.
又,當於擴散導光體10之一側面側設置有光源時,亦與上述情形相同,通過擴散導光體10內後入射角為0度以上且以不足臨界角之角度到達之光在折射的狀態下出射至擴散導光體之外。此處,由於凹凸呈蛇行且配向不均,因此擴散之異向性較高。 Further, when a light source is provided on one side surface side of the diffused light guide body 10, as in the case described above, the light incident in the light guide body 10 after the incident angle is 0 degrees or more and reaches the angle of the critical angle is refraction. Out of the diffused light guide. Here, since the unevenness is meandering and the alignment is uneven, the anisotropy of diffusion is high.
再者,本發明之擴散導光體並非限定於上述實施形態。例如,當於透明樹脂層之背面側配置光源時,為了使光之入射效率提高,較好的是於透明樹脂層之背面形成有具有防反射功能之微細之波狀凹凸。此處,較好的是,微細之波狀凹凸之最頻間距為1μm以下,且縱橫比為0.1以上。其原因在於,若最頻間距超過1μm,或者若縱橫比超過0.1,則無法獲得防反射功能。 Furthermore, the diffusing light guide of the present invention is not limited to the above embodiment. For example, when a light source is disposed on the back side of the transparent resin layer, in order to improve the light incident efficiency, it is preferable to form fine undulations having an antireflection function on the back surface of the transparent resin layer. Here, it is preferable that the fine pitch of the fine undulations is 1 μm or less and the aspect ratio is 0.1 or more. The reason for this is that if the most frequent pitch exceeds 1 μm, or if the aspect ratio exceeds 0.1, the antireflection function cannot be obtained.
上述微細之波狀凹凸可與光擴散用凹凸圖案一起形成於透明樹脂層之背面。例如,當藉由壓製成形或射出成形來製造擴散導光體時,可應用如下方法,亦即,作為金屬模具,使用在與透明樹脂層之出射面(表面)側相鄰接之面上形成有光擴散用凹凸圖案、且在與透明樹脂層之入射面(背面)側相鄰接之面上形成有微細之波狀凹凸圖案者。 The fine wavy irregularities may be formed on the back surface of the transparent resin layer together with the uneven pattern for light diffusion. For example, when the diffusion light guide is manufactured by press molding or injection molding, the following method can be applied, that is, as a metal mold, which is formed on the surface adjacent to the exit surface (surface) side of the transparent resin layer. The light-diffusing concave-convex pattern is formed on the surface adjacent to the incident surface (back surface) side of the transparent resin layer, and a fine wavy concave-convex pattern is formed.
又,上述微細之波狀凹凸亦可與光擴散用凹凸圖案不同地另外形成於透明樹脂層之背面。例如,亦可將形成有微細之波狀凹凸圖案之薄膜經由接著劑而貼附於透明樹脂層之背面側。 Further, the fine wavy irregularities may be formed separately on the back surface of the transparent resin layer unlike the uneven pattern for light diffusion. For example, a film on which a fine wavy concave-convex pattern is formed may be attached to the back side of the transparent resin layer via an adhesive.
又,為了進一步提高光擴散之異向性,亦可將含有微細氣泡之薄膜貼附於入射面側或出射面側。如圖20所示,當將含有微細氣泡之薄膜317貼附於入射面側時,為了有效地利用來自光源330之光,較好的是,使光源330之光較強地照射到的部分317a中之微細氣泡之含量較多,且使除此之外之部分317b中之微細氣泡之含量較少或者不含有。 Moreover, in order to further improve the anisotropy of light diffusion, a film containing fine bubbles may be attached to the incident surface side or the emission surface side. As shown in Fig. 20, when the film 317 containing fine bubbles is attached to the incident surface side, in order to effectively utilize the light from the light source 330, it is preferable that the portion 317a of the light of the light source 330 is strongly irradiated. The content of the fine bubbles in the middle is large, and the content of the fine bubbles in the other portion 317b is small or not.
本發明之擴散導光體亦可為厚度自一端朝向另一端逐漸變薄之楔形。楔形擴散導光體中係於較厚之側面配置光源。 The diffusing light guiding body of the present invention may also have a wedge shape in which the thickness is gradually thinned from one end toward the other end. The light source is disposed on the thicker side of the wedge-shaped diffused light guide.
本發明之擴散導光體係必須於一面上形成有蛇行之波狀凹凸圖案者,但並非限定於僅於一面上形成有凹凸圖案者。即,亦可於透明樹脂層之另一面上亦形成有蛇行之波狀凹凸圖案。 In the diffused light guiding system of the present invention, it is necessary to form a meandering corrugated pattern on one surface, but it is not limited to those in which a concave-convex pattern is formed only on one surface. That is, a meandering corrugated pattern may be formed on the other surface of the transparent resin layer.
以下對本發明之背光單元之第1實施形態進行說明。 Hereinafter, a first embodiment of the backlight unit of the present invention will be described.
圖21表示本實施形態之背光單元。本實施形態之背光單元100係所謂之直下型背光單元,其具備:擴散導光體310;反射板320,其與擴散導光體310之形成有凹凸圖案之面(表面315)的相反側之面(背面316)對向而配設;以及複數個光源330、330...,其等配設於擴散導光體310及反射板320之間。又,於擴散導光體310之表面315側,依次積層有擴散薄膜340、稜鏡片350、及亮度上升薄膜360。 Fig. 21 shows a backlight unit of this embodiment. The backlight unit 100 of the present embodiment is a so-called direct type backlight unit including a diffusing light guide 310 and a reflecting plate 320 opposite to the surface (surface 315) of the diffusing light guide 310 on which the uneven pattern is formed. The surface (back surface 316) is disposed opposite to each other; and a plurality of light sources 330, 330, ... are disposed between the diffusion light guide 310 and the reflection plate 320. Further, on the surface 315 side of the diffusion light guide 310, a diffusion film 340, a ruthenium sheet 350, and a brightness rising film 360 are laminated in this order.
作為光源330,可列舉例如冷陰極管、發光二極體等。 Examples of the light source 330 include a cold cathode tube, a light emitting diode, and the like.
作為反射板320,可列舉例如表面為鏡面狀之金屬板、或者具備此種金屬板之積層板等。 The reflector 320 may be, for example, a metal plate having a mirror surface or a laminate having such a metal plate.
作為擴散薄膜340,可列舉例如含有透明粒子之樹脂薄膜等。擴散薄膜340係使自擴散導光體出射之光進一步擴散者。 The diffusion film 340 may, for example, be a resin film containing transparent particles. The diffusion film 340 is configured to further diffuse light emitted from the diffusion light guide.
作為稜鏡片350,可列舉例如於一面上規則地具有大量圓錐狀或角錐狀突起之樹脂片(例如,Sumitomo 3M Limited製商品名Vikuiti BEF III)等。稜鏡片350係用以使自擴散薄膜340出射之光之行進方向與垂直於面之方向一致者。 For example, a resin sheet having a large number of conical or pyramidal protrusions on one surface (for example, trade name Vikuiti BEF III manufactured by Sumitomo 3M Limited) or the like can be cited. The cymbal sheet 350 is used to make the traveling direction of the light emitted from the diffusion film 340 coincide with the direction perpendicular to the surface.
作為亮度上升薄膜360,可列舉例如僅使光之主波(P波)通過而使次波(S波)反射之片(例如,Sumitomo 3M Limited製商品名Vikuiti DBEF-D400)等。 The brightness rising film 360 may be, for example, a sheet in which only the main wave (P wave) of light passes through and the second wave (S wave) is reflected (for example, the product name Vikuiti DBEF-D400 manufactured by Sumitomo 3M Limited).
以下對本發明之背光單元之第2實施形態進行說明。 Next, a second embodiment of the backlight unit of the present invention will be described.
圖22表示本實施形態之背光單元。本實施形態之背光單元200係所謂端面照光型背光單元,其具備:擴散導光體310;反射板320,其與擴散導光體310之形成有凹凸圖案之面(表面315)的相反側之面(背面 316)對向而配設;以及複數個光源330,其等配設於擴散導光體310之一側面上。又,於擴散導光體310之表面315側,依次積層有擴散薄膜340、稜鏡片350、及亮度上升薄膜360。 Fig. 22 shows a backlight unit of this embodiment. The backlight unit 200 of the present embodiment is a so-called end face illumination type backlight unit, and includes a diffusion light guide 310 and a reflection plate 320 opposite to the surface (surface 315) of the diffusion light guide 310 on which the uneven pattern is formed. Face 316) is disposed opposite to each other; and a plurality of light sources 330 are disposed on one side of the diffusion light guide 310. Further, on the surface 315 side of the diffusion light guide 310, a diffusion film 340, a ruthenium sheet 350, and a brightness rising film 360 are laminated in this order.
本實施形態中所用之擴散導光體310、反射板320、光源330、擴散薄膜340、稜鏡片350以及亮度上升薄膜360係與第1實施形態相同。 The diffusing light guide 310, the reflecting plate 320, the light source 330, the diffusing film 340, the cymbal 350, and the brightness increasing film 360 used in the present embodiment are the same as those in the first embodiment.
具備形成有蛇行之波狀凹凸圖案之擴散導光體310的上述實施形態之背光單元100中,自光源330發出之光於擴散導光體310之凹凸面上以較高之異向性而擴散。因此,具備背光單元100、200之液晶顯示裝置中,難以產生圖像亮度之不均。 In the backlight unit 100 of the above-described embodiment including the diffusing light guide 310 in which the meandering wave-like concave-convex pattern is formed, the light emitted from the light source 330 is diffused on the uneven surface of the diffused light guide 310 by a high anisotropy. . Therefore, in the liquid crystal display device including the backlight units 100 and 200, unevenness in image brightness is less likely to occur.
本發明之防反射體係具備上述凹凸圖案形成片10者,上述凹凸圖案亦即最頻間距A為1μm以下之凹凸圖案12a。 In the anti-reflection system of the present invention, the concave-convex pattern forming sheet 10 is provided, and the uneven pattern, that is, the concave-convex pattern 12a having the most frequent pitch A of 1 μm or less.
於本發明之防反射體中,亦可於凹凸圖案形成片10之一面或兩面上具備其他層。例如,於凹凸圖案形成片10之形成有凹凸圖案12a之一側之面上,為了防止污染該面,亦可具備含有氟樹脂或聚矽氧樹脂作為主成分之厚度為1~5nm左右之防汙層。 In the antireflection body of the present invention, other layers may be provided on one surface or both surfaces of the uneven pattern forming sheet 10. For example, in the surface of the concave-convex pattern forming sheet 10 on which one side of the uneven pattern 12a is formed, in order to prevent contamination of the surface, a thickness of 1 to 5 nm including a fluororesin or a polyoxymethylene resin as a main component may be provided. Stained layer.
本發明之防反射體中,於凹凸圖案形成片10之波狀凹凸圖案12a之部分,呈現出空氣之折射率與凹凸圖案形成片10之折射率(基材11之折射率)之間的中間折射率,該中間折射率連續地變化。並且,凹凸圖案12a之最頻間距A為1μm以下,凹凸圖案12a之底部12b之平均深度B為將最頻間距A設為100%時之10%以上。由此,可使光之反射率特別低,具體而言,可使反射率為大致0%。其原因在於,如上所述,當凹凸圖案形成片10之凹凸圖案12a之最頻間距A較短,為1μm以下時,平均深度B較深,為將最頻間距A設為100%時之10%以上,因此中間折射率連續地變化之部分於厚度方向上變長,從而可顯著地發揮抑制光反射之效果。 In the antireflection body of the present invention, the portion of the corrugated concavo-convex pattern 12a of the concavo-convex pattern forming sheet 10 exhibits an intermediate between the refractive index of the air and the refractive index of the concavo-convex pattern forming sheet 10 (the refractive index of the substrate 11). The refractive index, which varies continuously. Further, the most frequent pitch A of the uneven pattern 12a is 1 μm or less, and the average depth B of the bottom portion 12b of the uneven pattern 12a is 10% or more when the maximum pitch A is 100%. Thereby, the reflectance of light can be made particularly low, and specifically, the reflectance can be made approximately 0%. The reason is that, as described above, when the most frequent pitch A of the concave-convex pattern 12a of the concave-convex pattern forming sheet 10 is short, when the thickness is 1 μm or less, the average depth B is deep, and 10 is when the maximum-frequency spacing A is 100%. When the amount is more than %, the portion in which the intermediate refractive index continuously changes becomes longer in the thickness direction, so that the effect of suppressing light reflection can be remarkably exhibited.
上述防反射體可安裝於例如液晶顯示面板或電漿顯示器等圖像顯示裝置、發光二極體之發光部頂端、及太陽能電池面板之表面等。 The antireflection body can be attached to, for example, an image display device such as a liquid crystal display panel or a plasma display, a light emitting portion tip of a light emitting diode, and a surface of a solar cell panel.
當上述防反射體安裝於圖像顯示裝置中時,由於可防止照明光之映入,故可提高圖像之辨認性。當上述防反射體安裝於發光二極體之發光部頂端時,可提高光之取出效率。當上述防反射體安裝於太陽能電池面板之表面時,由於可使光之擷取量變多,故可提高太陽能電池之發電效率。 When the antireflection body is mounted on the image display device, since the illumination light can be prevented from being reflected, the visibility of the image can be improved. When the antireflection body is attached to the tip end of the light emitting portion of the light emitting diode, the light extraction efficiency can be improved. When the above-mentioned antireflection body is mounted on the surface of the solar cell panel, since the amount of light extraction can be increased, the power generation efficiency of the solar cell can be improved.
本發明之相位差板係具備上述凹凸圖案形成片10者,上述凹凸圖案亦即最頻間距A為1μm以下之凹凸圖案12a。其中,凹凸之方向並非隨機,而是沿著一方向。 The retardation film of the present invention includes the concave-convex pattern forming sheet 10, and the uneven pattern, that is, the concave-convex pattern 12a having the most frequent pitch A of 1 μm or less. Among them, the direction of the concave and convex is not random, but along one direction.
於本發明之相位差板中,亦與上述防反射體同樣,亦可於凹凸圖案形成片10之一面或兩面上具備其他層,例如,亦可於凹凸圖案形成片10之形成有凹凸圖案12a之一側的面上具備防汙層。 In the retardation film of the present invention, similarly to the above-described antireflection film, another layer may be provided on one surface or both surfaces of the uneven pattern forming sheet 10. For example, the uneven pattern 12a may be formed on the concave-convex pattern forming sheet 10. An anti-fouling layer is provided on one of the sides.
本發明之相位差板可顯著地發揮產生相位差之效果。其原因在於,如上所述,當凹凸圖案形成片10之凹凸圖案12a之最頻間距A較短,為1μm以下時,平均深度B較深,為將最頻間距A設為100%時之10%以上,因此,折射率互不相同之空氣與凹凸圖案形成片10交替配置之部分於厚度方向上變長,從而呈現出光學異向性之部分變長。進而,當凹凸圖案之間距與可見光之波長為同程度或為可見光之波長以下時,可遍及較廣之可見光波長區域而產生相同相位差。 The phase difference plate of the present invention can remarkably exert the effect of generating a phase difference. The reason is that, as described above, when the most frequent pitch A of the concave-convex pattern 12a of the concave-convex pattern forming sheet 10 is short, when the thickness is 1 μm or less, the average depth B is deep, and 10 is when the maximum-frequency spacing A is 100%. When the amount of the air having the refractive indices different from each other and the uneven pattern forming sheet 10 are alternately arranged in the thickness direction, the portion exhibiting the optical anisotropy becomes longer. Further, when the distance between the concave-convex patterns is equal to or lower than the wavelength of visible light or the wavelength of visible light, the same phase difference can be generated over a wide range of visible light wavelengths.
本發明之光學元件製造用工程片(以下,簡稱為工程片)係具備上述凹凸圖案形成片10者,上述凹凸圖案亦即最頻間距A為1μm以下之凹凸圖案12a,且本發明之光學元件製造用工程片係作為用以藉由如下所示之方法將凹凸圖案12a轉印至其他素材來大面積且大量地製造 凹凸圖案形成片之模具而使用的,該凹凸圖案形成片具有與該工程片之最頻間距及平均深度相同之凹凸圖案,且可用作防反射體或相位差板等光學元件。 In the optical element manufacturing sheet (hereinafter, simply referred to as an engineering sheet) of the present invention, the concave-convex pattern forming sheet 10 is provided, and the concave-convex pattern, that is, the concave-convex pattern 12a having the most frequent pitch A of 1 μm or less, and the optical element of the present invention The engineering sheet for manufacturing is used as a large-area and large-scale manufacturing by transferring the uneven pattern 12a to other materials by the method shown below. The concave-convex pattern is used to form a mold for a sheet having a concave-convex pattern having the same frequency-to-average pitch and average depth as the engineered sheet, and can be used as an optical element such as an antireflection body or a phase difference plate.
使用工程片來製造光學元件之具體方法係與上述光學片之方法相同。 The specific method of manufacturing an optical component using an engineering sheet is the same as the method of the above optical sheet.
下述例中之楊氏模量係使用拉伸測試機(Tester產業公司製TE-7001)並根據JIS K 7113-1995而測定之值。當未特別記載溫度時,則為23℃時之值。 The Young's modulus in the following examples was a value measured by a tensile tester (TE-7001, manufactured by Tester Industries, Ltd.) in accordance with JIS K 7113-1995. When the temperature is not specifically described, it is a value at 23 °C.
於單軸方向熱收縮之厚度為50μm且楊氏模量為3GPa之聚對苯二甲酸乙二酯製加熱收縮性薄膜(三菱樹脂股份有限公司製HISHIPET LX-60S,玻璃轉移溫度為70℃)之一面上,藉由刮棒塗佈機來塗佈於甲苯中稀釋的聚甲基丙烯酸甲酯(POLYMER SOURCE股份有限公司製P4831-MMA,玻璃轉移溫度為100℃),使其厚度為200nm,以形成硬質層而獲得積層片。 A heat shrinkable film made of polyethylene terephthalate having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-60S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature: 70 ° C) On one surface, polymethyl methacrylate (P4831-MMA, manufactured by POLYMER SOURCE Co., Ltd., glass transition temperature: 100 ° C) diluted in toluene was applied by a bar coater to have a thickness of 200 nm. A laminate is obtained by forming a hard layer.
繼而,於80℃對該積層片加熱1分鐘,藉此使其熱收縮為加熱前之長度之40%(亦即,使其以60%之變形率而變形),以獲得硬質層具有波狀凹凸圖案之凹凸圖案形成片(光擴散體),該波狀凹凸圖案沿著與收縮方向正交之方向具有週期。 Then, the laminated sheet was heated at 80 ° C for 1 minute, whereby it was heat-shrinked to 40% of the length before heating (that is, it was deformed at a deformation rate of 60%) to obtain a hard layer having a wavy shape. The concavo-convex pattern of the concavo-convex pattern forms a sheet (light diffuser) having a period along a direction orthogonal to the contraction direction.
再者,聚對苯二甲酸乙二酯製加熱收縮性薄膜及該聚甲基丙烯酸甲酯於80℃時的楊氏模量分別為50MPa、1GPa。 Further, the heat shrinkable film made of polyethylene terephthalate and the Young's modulus of the polymethyl methacrylate at 80 ° C were 50 MPa and 1 GPa, respectively.
塗佈於甲苯中稀釋的聚苯乙烯(POLYMER SOURCE股份有限公司製PS,玻璃轉移溫度為100℃),除此之外,以與實施例1相同之方式獲得凹凸圖案形成片(光擴散體)。 A concavo-convex pattern-forming sheet (light diffuser) was obtained in the same manner as in Example 1 except that polystyrene (PS manufactured by POLYMER SOURCE Co., Ltd., glass transition temperature: 100 ° C) diluted with toluene was applied. .
再者,聚對苯二甲酸乙二酯製加熱收縮性薄膜及該聚苯乙烯於80℃時的楊氏模量分別為50MPa、1GPa。 Further, the heat shrinkable film made of polyethylene terephthalate and the Young's modulus of the polystyrene at 80 ° C were 50 MPa and 1 GPa, respectively.
將聚苯乙烯之塗佈厚度設為1μm,除此之外,以與實施例2相同之方式獲得凹凸圖案形成片(光擴散體)。 A concave-convex pattern forming sheet (light diffusing body) was obtained in the same manner as in Example 2 except that the coating thickness of the polystyrene was changed to 1 μm.
於70℃時對積層片加熱1分鐘,藉此使其熱收縮為加熱前之長度之90%(亦即,使其以10%之變形率而變形),除此之外,以與實施例2相同之方式獲得凹凸圖案形成片(光擴散體)。 The laminated sheet was heated at 70 ° C for 1 minute, whereby it was heat-shrinked to 90% of the length before heating (that is, it was deformed at a deformation rate of 10%), in addition to the examples. 2 A concavo-convex pattern forming sheet (light diffuser) was obtained in the same manner.
將藉由實施例1所獲得之凹凸圖案形成片(光擴散體)用作工程片原版,按如下所述之方式獲得光擴散體。 The concave-convex pattern forming sheet (light diffusing body) obtained in Example 1 was used as an original for an engineering sheet, and a light diffusing body was obtained in the following manner.
亦即,於藉由實施例1所獲得之工程片原版之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the epoxy acrylate-based prepolymer, the 2-ethylhexyl acrylate, and the benzophenone-based prepolymer were coated on the surface of the original sheet of the engineering sheet obtained in Example 1 on which the uneven pattern was formed. An uncured ultraviolet curable resin composition of a photopolymerization initiator.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜的與工程片原版未相接觸之面上,將厚度為50μm之三乙醯纖維素薄膜重疊並按壓。 Then, on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the original sheet of the engineering sheet, a triacetonitrile cellulose film having a thickness of 50 μm was superposed and pressed.
其次,自三乙醯纖維素薄膜上方照射紫外線,使未硬化之紫外線硬化性樹脂組成物硬化,並自工程片原版上剝離該硬化物,藉此獲得光擴散體。 Next, ultraviolet rays are irradiated from the top of the triacetone cellulose film to harden the uncured ultraviolet curable resin composition, and the cured product is peeled off from the original sheet of the engineering sheet, thereby obtaining a light diffuser.
將藉由實施例1所獲得之凹凸圖案形成片(光擴散體)用作工程片原版,按如下所述之方式獲得光學元件。 The concave-convex pattern forming sheet (light diffusing body) obtained in Example 1 was used as an original sheet of an engineering sheet, and an optical element was obtained in the following manner.
亦即,於藉由實施例1所獲得之工程片原版之形成有凹凸圖案的面上進行鍍鎳處理,其後剝離該鍍鎳,藉此獲得厚度為200μm之二次 工程片。於該二次工程片之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the surface on which the uneven pattern was formed on the original sheet obtained in Example 1 was subjected to nickel plating treatment, and thereafter the nickel plating was peeled off, thereby obtaining a thickness of 200 μm. Engineering film. Applying an epoxidized acrylate-based prepolymer, a 2-ethylhexyl acrylate, and a benzophenone-based photopolymerization initiator to the surface on which the uneven pattern is formed on the secondary work piece An ultraviolet curable resin composition.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜的與二次工程片未相接觸之面上,將厚度為50μm之三乙醯纖維素薄膜重疊並按壓。 Then, on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the secondary work piece, a triacetonitrile cellulose film having a thickness of 50 μm was superposed and pressed.
其後,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之紫外線硬化性樹脂組成物硬化,並自二次工程片剝離該硬化物,藉此獲得光擴散體。 Thereafter, the uncured ultraviolet curable resin composition is cured by irradiating ultraviolet rays from the top of the triacetone cellulose film, and the cured product is peeled off from the secondary work piece, thereby obtaining a light diffuser.
使用熱硬化性環氧樹脂以取代紫外線硬化性樹脂組成物,並通過加熱使該熱硬化性樹脂硬化以取代紫外線照射,除此之外,以與實施例6相同之方式獲得光擴散體。 A light diffuser was obtained in the same manner as in Example 6 except that the thermosetting epoxy resin was used instead of the ultraviolet curable resin composition, and the thermosetting resin was cured by heating instead of ultraviolet irradiation.
以與實施例6相同之方式,獲得厚度200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,將厚度50μm之聚甲基丙烯酸甲酯薄膜重疊並加熱。自兩側按壓對經加熱而軟化之聚甲基丙烯酸甲酯薄膜與二次工程片,之後使其冷卻.固化,並自二次工程片上剝離,藉此獲得光擴散體。 In the same manner as in Example 6, a secondary work piece having a thickness of 200 μm was obtained. On the surface on which the uneven pattern was formed on the secondary work piece, a polymethyl methacrylate film having a thickness of 50 μm was superposed and heated. Pressing the heated and softened polymethyl methacrylate film and secondary engineering sheet from both sides, and then cooling it. It is cured and peeled off from the secondary work piece, whereby a light diffuser is obtained.
將聚苯乙烯之塗佈厚度設為6μm,除此之外,以與實施例2相同之方式獲得凹凸圖案形成片(光擴散體)。 A concave-convex pattern forming sheet (light diffusing body) was obtained in the same manner as in Example 2 except that the coating thickness of the polystyrene was changed to 6 μm.
將聚苯乙烯之塗佈厚度設為40nm,除此之外,以與實施例2相同之方式獲得凹凸圖案形成片(光擴散體)。 A concave-convex pattern forming sheet (light diffusing body) was obtained in the same manner as in Example 2 except that the coating thickness of the polystyrene was changed to 40 nm.
使用三菱樹脂股份有限公司製HISHIPET LX-10S(楊氏模量為3GPa)以取代三菱樹脂股份有限公司製HISHIPET LX-60S,以及於70℃時對該積層片加熱1分鐘,使其熱收縮為加熱前之長度之97%(亦即,使其以3%之變形率而變形),除此之外,以與實施例1相同之方式獲得凹凸圖案形成片(光擴散體)。 HISHIPET LX-10S (3 mils) was used to replace HISHIPET LX-60S manufactured by Mitsubishi Plastics Co., Ltd., and the laminated sheet was heated at 70 ° C for 1 minute to thermally shrink to A concave-convex pattern forming sheet (light diffusing body) was obtained in the same manner as in Example 1 except that 97% of the length before heating (that is, it was deformed by a deformation ratio of 3%).
使用專利文獻2中揭示之異向性擴散圖案之製造方法而獲得凹凸圖案形成片。 The uneven pattern forming sheet is obtained by the method for producing an anisotropic diffusion pattern disclosed in Patent Document 2.
亦即,設置如下兩板:嵌入有使雷射光擴散並透過之磨砂玻璃等擴散板且具有寬度1mm、長度10cm之狹縫的遮蔽板、及塗佈有100μm厚度之市售之感光性樹脂的感光性薄膜板,使兩板彼此之間隔為1m,且使兩板彼此平行。 In other words, two plates are provided: a shielding plate having a diffusion plate such as frosted glass that diffuses and transmits laser light and having a slit having a width of 1 mm and a length of 10 cm, and a commercially available photosensitive resin coated with a thickness of 100 μm. The photosensitive film sheet was such that the two sheets were spaced apart from each other by 1 m, and the two sheets were made parallel to each other.
繼而,自上述遮蔽板側照射波長為514nm之氬雷射後,穿過上述狹縫而經磨砂玻璃擴散之氬雷射光使得感光性薄膜板上之感光性樹脂曝光。 Then, after irradiating the argon laser having a wavelength of 514 nm from the side of the shielding plate, the argon laser light diffused through the slit through the frosted glass exposes the photosensitive resin on the photosensitive film.
反覆進行如上所述之曝光,使感光性薄膜板整個面上之感光性樹脂曝光。並且,對經曝光之感光性薄膜進行顯影,以獲得凹凸圖案形成片(光擴散體)。 The exposure as described above is repeated to expose the photosensitive resin on the entire surface of the photosensitive film sheet. Further, the exposed photosensitive film is developed to obtain a concavo-convex pattern forming sheet (light diffusing body).
再者,將比較例4之灰度文檔轉換圖像顯示於圖9中,將灰度文檔圖像之傅立葉轉換圖像顯示於圖10。又,自圖10之圖像之中心沿水平方向引輔助線L4,將對該輔助線上之亮度描繪所得之圖顯示於圖11。進而,於圖10中,引輔助線L5,其於值Y之部分與輔助線L4正交,並將對該輔助線L5上之亮度描繪所得之圖顯示於圖12。 Further, the grayscale document converted image of Comparative Example 4 is displayed in Fig. 9, and the Fourier transform image of the grayscale document image is displayed in Fig. 10. Further, the guide line L 4 is drawn in the horizontal direction from the center of the image of Fig. 10, and the graph obtained by drawing the brightness on the auxiliary line is shown in Fig. 11. Further, in Fig. 10, the auxiliary line L 5 is orthogonal to the auxiliary line L 4 at the portion of the value Y, and the graph obtained by drawing the brightness on the auxiliary line L 5 is shown in Fig. 12 .
嘗試使用厚度為50μm、楊氏模量為5GPa之二軸延伸聚對苯二甲酸乙二酯薄膜(帝人股份有限公司製G2)以取代加熱收縮性薄膜,除 此之外,以與實施例1相同之方式獲得凹凸圖案形成片(光擴散體)。然而,並未形成有波狀之凹凸圖案,故並未獲得凹凸圖案形成片(光擴散體)。 Try to use a biaxially oriented polyethylene terephthalate film (G2 made by Teijin Co., Ltd.) with a thickness of 50 μm and a Young's modulus of 5 GPa instead of the heat shrinkable film. Further, a concavo-convex pattern forming sheet (light diffusing body) was obtained in the same manner as in Example 1. However, since the wavy concave-convex pattern was not formed, the uneven pattern forming sheet (light diffusing body) was not obtained.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯製加熱收縮性收縮薄膜(三菱樹脂股份有限公司製HISHIPET LX-10S,玻璃轉移溫度為70℃)之一面上,藉由刮棒塗佈法來塗佈將楊氏模量為2MPa之聚二甲基矽氧烷(信越化學工業股份有限公司KS847T,玻璃轉移溫度為-120℃)及鉑觸媒(信越化學工業股份有限公司CAT-PL-50T)稀釋於甲苯中所得之分散液,使其厚度為200nm,以形成硬質層而獲得積層片。 Heat shrinkable shrink film made of polyethylene terephthalate having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-10S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature of 70 ° C On one side, a polydimethyl methoxyoxane having a Young's modulus of 2 MPa (Shin-Etsu Chemical Co., Ltd. KS847T, glass transition temperature of -120 ° C) and a platinum touch were coated by a bar coating method. The medium (Shin-Etsu Chemical Co., Ltd. CAT-PL-50T) was diluted in toluene to have a thickness of 200 nm to form a hard layer to obtain a laminated sheet.
其次,於100℃時對該積層片加熱1分鐘,使其熱收縮,藉此欲獲得凹凸圖案形成片,但無法使硬質層以摺疊之方式而變形,故波狀之凹凸圖案並未形成。 Next, the laminated sheet was heated at 100 ° C for 1 minute to be heat-shrinked, whereby the uneven pattern forming sheet was obtained, but the hard layer could not be deformed by folding, so that the wavy concave-convex pattern was not formed.
藉由原子間力顯微鏡(日本Veeco公司製NanoScope III),對實施例1~8及比較例1~6之凹凸圖案形成片之光擴散體的上表面進行拍攝。 The upper surface of the light diffusing body of the concave-convex pattern forming sheets of Examples 1 to 8 and Comparative Examples 1 to 6 was imaged by an atomic force microscope (NanoScope III manufactured by Veeco Co., Ltd., Japan).
對於實施例1~8及比較例1~4之凹凸圖案形成片,於原子間力顯微鏡之圖像中測定10處凹凸圖案之深度,將該等深度平均而求出平均深度。 With respect to the concavo-convex pattern forming sheets of Examples 1 to 8 and Comparative Examples 1 to 4, the depths of the ten concavo-convex patterns were measured in an image of an atomic force microscope, and the depths were averaged to obtain an average depth.
又,以如下所述之方式求出凹凸圖案之配向度。 Further, the degree of alignment of the concavo-convex pattern was obtained as follows.
首先,藉由表面光學顯微鏡來拍攝凹凸圖案之上表面,將該圖像轉換成灰度文檔(參照圖3)。繼而,對灰度文檔之圖像進行傅立葉轉換。圖4表示傅立葉轉換後之圖像。其次,自圖4之圖像之中心沿水平方向引輔助線L2,並對該輔助線上之亮度進行描繪(參照圖5)。其後,於圖5中,引輔助線L3,其在值X(最頻間距之倒數)之部分與輔助線L2正交,並對該輔助線L3上之亮度進行描繪(參照圖6)。並且,根據 圖6之描繪中的波峰之半值寬度W1而求出凹凸圖案之配向度。將該等值顯示於表1。 First, the upper surface of the concave-convex pattern is photographed by a surface optical microscope, and the image is converted into a grayscale document (refer to FIG. 3). Then, Fourier transform is performed on the image of the grayscale document. Figure 4 shows the image after Fourier transform. Next, the auxiliary line L 2 is drawn in the horizontal direction from the center of the image of Fig. 4, and the brightness on the auxiliary line is drawn (refer to Fig. 5). Thereafter, in FIG. 5, the auxiliary line L 3 is introduced , and the portion of the value X (reciprocal of the most frequent pitch) is orthogonal to the auxiliary line L 2 , and the brightness on the auxiliary line L 3 is drawn (refer to the figure). 6). Then, the degree of alignment of the concavo-convex pattern is obtained from the half value width W 1 of the peak in the drawing of FIG. The values are shown in Table 1.
又,根據凹凸圖案之最頻間距及底部之平均深度,按以下基準來評價作為光擴散體之適應性。將該評價結果顯示於表1。 Further, the suitability as a light diffuser was evaluated based on the following pitches based on the most frequent pitch of the uneven pattern and the average depth of the bottom. The evaluation results are shown in Table 1.
○:凹凸圖案之最頻間距超過1μm且為20μm以下,平均深度為將最頻間距設為100%時之10%以上,配向度為0.3~1.0,適宜作為光擴散體。 ○: The most frequent pitch of the uneven pattern is more than 1 μm and 20 μm or less, and the average depth is 10% or more when the most frequent pitch is 100%, and the degree of alignment is 0.3 to 1.0, which is suitable as a light diffuser.
△:凹凸圖案之最頻間距為1μm以下或超過20μm,或平均深度小於將最頻間距設為100%時之10%,或者配向度不足0.3,未必適宜作為光擴散體。 △: The most frequent pitch of the concave-convex pattern is 1 μm or less or more than 20 μm, or the average depth is less than 10% when the most frequent pitch is 100%, or the degree of alignment is less than 0.3, which is not necessarily suitable as a light diffuser.
×:無法形成凹凸圖案。 ×: The uneven pattern could not be formed.
於使積層片之表面平滑硬質層以摺疊之方式而變形之實施例1~8中,可容易製造凹凸圖案形成片。 In Examples 1 to 8 in which the surface of the laminated sheet was smooth and the hard layer was deformed by folding, the uneven pattern forming sheet can be easily produced.
進而,實施例1~8之凹凸圖案形成片係凹凸圖案之最頻間距超過 1μm且為20μm以下、底部之平均深度為將上述最頻間距設為100%時之10%以上,故適宜作為光擴散體。於實施例1~4中,之所以有獲得如上所述之最頻間距及平均深度,係由於表面平滑硬質層之厚度超過0.05μm且為5μm以下,且變形率為10%以上。 Further, the groove spacing of the concave-convex pattern forming sheets of Examples 1 to 8 is more than the most frequent pitch 1 μm and 20 μm or less, and the average depth of the bottom is 10% or more when the above-mentioned mode spacing is 100%, and therefore it is suitable as a light diffuser. In Examples 1 to 4, the above-mentioned maximum frequency pitch and average depth were obtained because the thickness of the surface smooth hard layer exceeded 0.05 μm and was 5 μm or less, and the deformation ratio was 10% or more.
又,根據將實施例1中獲得之凹凸圖案形成片(光擴散體)用作工程片之實施例5~8之製造方法,可簡便地製造具有與凹凸圖案形成片(光擴散體)之最頻間距及平均深度相同之凹凸圖案的光擴散體。 Moreover, according to the manufacturing method of Examples 5 to 8 in which the uneven pattern forming sheet (light diffusing body) obtained in Example 1 is used as an engineering sheet, it is possible to easily produce the most formed sheet (light diffusing body) with the uneven pattern. A light diffuser having a concave-convex pattern having the same frequency pitch and average depth.
與此相對,於比較例1及2中,由於表面硬質平滑層之厚度為0.05μm以下或超過5μm,因此所獲得之凹凸圖案形成片(光擴散體)之凹凸圖案之最頻間距為1μm以下或超過20μm。 On the other hand, in Comparative Examples 1 and 2, since the thickness of the surface hard smoothing layer is 0.05 μm or less or more than 5 μm, the groove width of the concave-convex pattern forming sheet (light diffusing body) obtained is 1 μm or less. Or more than 20μm.
又,比較例3中,由於將變形率設為3%,因此所獲得之凹凸圖案形成片之凹凸圖案之底部的平均深度不足將最頻間距設為100%時之10%。又,比較例4中配向度不足0.3。該等比較例1~4未必適宜作為作光擴散體。 Further, in Comparative Example 3, since the deformation ratio was 3%, the average depth of the bottom portion of the uneven pattern of the obtained concave-convex pattern forming sheet was less than 10% when the most frequent pitch was 100%. Further, in Comparative Example 4, the degree of alignment was less than 0.3. These Comparative Examples 1 to 4 are not necessarily suitable as a light diffuser.
又,於將二軸延伸聚對苯二甲酸乙二酯薄膜用作樹脂層之比較例5、以及使用有第2樹脂之玻璃轉移溫度低於第1樹脂的積層片之比較例6之製造方法中,由於表面平滑硬質層無法以摺疊之方式而變形,因此凹凸圖案並未形成。 Further, in Comparative Example 5 in which a biaxially stretched polyethylene terephthalate film was used as a resin layer, and a production method in Comparative Example 6 in which a laminated sheet using a second resin having a glass transition temperature lower than that of the first resin was used In the case, since the smooth surface of the hard layer cannot be deformed by folding, the concave-convex pattern is not formed.
下述例中之楊氏模量係使用拉伸測試機(Orientec股份有限公司製TENSILON RTC-1210),並根據JIS Z 2280-1993之「金屬材料之高溫楊氏模量測試方法」,將溫度變更為23℃而測定出之值。硬質層由金屬化合物構成之情形亦同樣。 The Young's modulus in the following examples is a tensile tester (TENSILON RTC-1210 manufactured by Orientec Co., Ltd.), and the temperature is measured according to JIS Z 2280-1993 "High Temperature Young's Modulus Test Method for Metallic Materials". Changed to 23 ° C and measured. The same applies to the case where the hard layer is composed of a metal compound.
於單軸方向熱收縮之厚度為50μm且楊氏模量為3GPa之聚對苯二甲酸乙二酯製加熱收縮性薄膜(三菱樹脂股份有限公司製HISHIPET LX-10S)之一面上,真空蒸鍍楊氏模量為70GPa之鋁,使其厚度為 0.05μm,以形成表面平滑硬質層而獲得積層片。 Vacuum-evaporation on one side of a heat shrinkable film made of polyethylene terephthalate having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-10S manufactured by Mitsubishi Plastics Co., Ltd.) Young's modulus is 70GPa of aluminum, making it thicker 0.05 μm to form a smooth hard layer on the surface to obtain a laminated sheet.
其次,於100℃時對該積層片加熱1分鐘,藉此使其熱收縮為加熱前之長度之40%(亦即,使其以60%之變形率而變形),從而獲得硬質層具有波狀凹凸圖案的凹凸圖案形成片,該波狀凹凸圖案沿著與收縮方向正交之方向具有週期。 Next, the laminated sheet was heated at 100 ° C for 1 minute, whereby it was heat-shrinked to 40% of the length before heating (that is, it was deformed at a deformation rate of 60%), thereby obtaining a hard layer having a wave. The uneven pattern of the uneven pattern forms a sheet having a period along a direction orthogonal to the contraction direction.
繼而,將凹凸圖案形成片用作工程片原版,按如下所述之方式獲得光擴散體。 Then, the uneven pattern forming sheet was used as an original sheet of the engineering sheet, and a light diffuser was obtained in the following manner.
亦即,於工程片原版之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the unhardened coating containing the epoxy acrylate prepolymer, the 2-ethylhexyl acrylate, and the benzophenone photopolymerization initiator is applied to the surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet. The ultraviolet curable resin composition.
其後,於未硬化之紫外線硬化性樹脂組成物之塗膜的與工程片原版不相接觸之面上,將厚度50μm之三乙醯纖維素薄膜重疊並按壓。 Thereafter, a film of a thickness of 50 μm of triacetyl cellulose film was superposed and pressed on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the original sheet of the engineering sheet.
繼而,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之紫外線硬化性樹脂硬化,並自工程片原版上剝離該硬化物,藉此獲得光擴散體。 Then, ultraviolet rays are irradiated from the upper surface of the triacetone cellulose film to harden the uncured ultraviolet curable resin, and the cured product is peeled off from the original sheet of the engineering sheet, thereby obtaining a light diffuser.
將藉由實施例9之方法所獲得之凹凸圖案形成片用作工程片原版,按如下所述之方式獲得光擴散體。 The concave-convex pattern forming sheet obtained by the method of Example 9 was used as an original for an engineering sheet, and a light diffusing body was obtained in the following manner.
亦即,於藉由實施例9所獲得之工程片原版之形成有凹凸圖案之面上進行鍍鎳處理,其後剝離該鍍鎳,藉此獲得厚度為200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the surface on which the uneven pattern was formed on the original sheet obtained in Example 9 was subjected to nickel plating treatment, and thereafter the nickel plating was peeled off, whereby a secondary work sheet having a thickness of 200 μm was obtained. Applying an epoxidized acrylate-based prepolymer, a 2-ethylhexyl acrylate, and a benzophenone-based photopolymerization initiator to the surface on which the uneven pattern is formed on the secondary work piece An ultraviolet curable resin composition.
其次,於未硬化之紫外線硬化性樹脂組成物之塗膜的與二次工程片不相接觸之面上,將厚度50μm之三乙醯纖維素薄膜重疊並按 壓。 Next, on the surface of the coating film of the uncured ultraviolet curable resin composition which is not in contact with the secondary engineering sheet, a film of a thickness of 50 μm is laminated and pressed. Pressure.
繼而,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之硬化性樹脂硬化,並自二次工程片上剝離該硬化物,藉此獲得光擴散體。 Then, ultraviolet rays are irradiated from the upper surface of the triacetone cellulose film to harden the uncured curable resin, and the cured product is peeled off from the secondary work piece, thereby obtaining a light diffuser.
使用熱硬化性環氧樹脂以取代紫外線硬化性樹脂組成物,並通過加熱使該熱硬化性環氧樹脂硬化以取代紫外線照射,除此之外,以與實施例10相同之方式獲得光擴散體。 A light diffuser was obtained in the same manner as in Example 10 except that the thermosetting epoxy resin was used in place of the ultraviolet curable resin composition, and the thermosetting epoxy resin was cured by heating instead of ultraviolet irradiation. .
以與實施例10相同之方式,獲得厚度200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,將厚度為50μm之聚甲基丙烯酸甲酯薄膜重疊並加熱。對經加熱而軟化之聚甲基丙烯酸甲酯薄膜與二次工程片自其等之兩側進行按壓,之後使其冷卻.固化,並自二次工程片上剝離已固化之聚甲基丙烯酸甲酯薄膜,藉此獲得光擴散體。 In the same manner as in Example 10, a secondary work piece having a thickness of 200 μm was obtained. On the surface on which the uneven pattern was formed on the secondary work piece, a polymethyl methacrylate film having a thickness of 50 μm was superposed and heated. The heated and softened polymethyl methacrylate film and the secondary engineering sheet are pressed from both sides thereof, and then cooled. The film was cured, and the cured polymethyl methacrylate film was peeled off from the secondary work piece, whereby a light diffuser was obtained.
真空蒸鍍鋁,使其厚度為0.3μm,除此之外,以與實施例9相同之方式獲得光擴散體。 A light diffuser was obtained in the same manner as in Example 9 except that aluminum was vacuum-deposited to have a thickness of 0.3 μm.
真空蒸鍍鋁,使其厚度為0.01μm,除此之外,以與實施例9相同之方式獲得光擴散體。 A light diffuser was obtained in the same manner as in Example 9 except that aluminum was vacuum-deposited to have a thickness of 0.01 μm.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯製加熱收縮性薄膜(三菱樹脂股份有限公司製HISHIPET LX-10S)之一面上,真空蒸鍍楊氏模量為70GPa之鋁,使其厚度為0.05μm,以形成表面平滑硬質層而獲得積層片。 One side of a heat shrinkable film of a polyethylene terephthalate having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-10S manufactured by Mitsubishi Plastics Co., Ltd.), vacuum evaporation The Young's modulus is 70 GPa of aluminum to a thickness of 0.05 μm to form a smooth hard surface layer to obtain a laminated sheet.
繼而,於70℃時對該積層片加熱1分鐘,使其收縮為加熱前之長度之97%(亦即,使其以3%之變形率而變形),除此之外,以與實施例9相同之方式獲得光擴散體。 Then, the laminated sheet was heated at 70 ° C for 1 minute to shrink to 97% of the length before heating (that is, deformed at a deformation rate of 3%), and in addition, 9 A light diffuser is obtained in the same manner.
藉由原子間力顯微鏡(日本Veeco公司製NanoScope III),對實施例9~12及比較例7~9之凹凸圖案形成片之光擴散體之上表面進行拍攝。 The upper surface of the light diffusing body of the uneven pattern forming sheets of Examples 9 to 12 and Comparative Examples 7 to 9 was imaged by an atomic force microscope (NanoScope III manufactured by Veeco Co., Ltd., Japan).
對於實施例9~12及比較例7~9之凹凸圖案形成片,於原子間力顯微鏡之圖像中測定10處凹凸圖案之深度,將該等深度平均而求出平均深度。 With respect to the concavo-convex pattern forming sheets of Examples 9 to 12 and Comparative Examples 7 to 9, the depths of the ten concavo-convex patterns were measured in an image of an atomic force microscope, and the depths were averaged to obtain an average depth.
又,以如下所述之方式求出凹凸圖案之配向度。 Further, the degree of alignment of the concavo-convex pattern was obtained as follows.
首先,藉由表面光學顯微鏡來拍攝凹凸圖案之上表面,將該圖像轉換成灰度文檔(參照圖3)。繼而,對灰度文檔之圖像進行傅立葉轉換。圖4表示傅立葉轉換後之圖像。其次,自圖4之圖像之中心沿水平方向引輔助線L2,並對該輔助線上之亮度進行描繪(參照圖5)。其後,於圖5中,引輔助線L3,其在值X(最頻間距之倒數)之部分與輔助線L2正交,並對該輔助線L3上之亮度進行描繪(參照圖6)。並且,根據圖6之描繪中的波峰之半值寬度W1而求出凹凸圖案之配向度。 First, the upper surface of the concave-convex pattern is photographed by a surface optical microscope, and the image is converted into a grayscale document (refer to FIG. 3). Then, Fourier transform is performed on the image of the grayscale document. Figure 4 shows the image after Fourier transform. Next, the auxiliary line L 2 is drawn in the horizontal direction from the center of the image of Fig. 4, and the brightness on the auxiliary line is drawn (refer to Fig. 5). Thereafter, in FIG. 5, the auxiliary line L 3 is introduced , and the portion of the value X (reciprocal of the most frequent pitch) is orthogonal to the auxiliary line L 2 , and the brightness on the auxiliary line L 3 is drawn (refer to the figure). 6). Then, the degree of alignment of the concavo-convex pattern is obtained from the half value width W 1 of the peak in the drawing of FIG.
將該等值顯示於表2。 The values are shown in Table 2.
又,根據凹凸圖案之最頻間距及底部之平均深度,按以下基準來評價光擴散體之適應性。將該評價結果顯示於表2。 Further, the adaptability of the light diffuser was evaluated based on the following criteria based on the most frequent pitch of the concave-convex pattern and the average depth of the bottom. The evaluation results are shown in Table 2.
○:凹凸圖案之最頻間距超過1μm且為20μm以下,平均深度為將最頻間距設為100%時之10%以上,配向度為0.3~1.0,適宜作為光擴散體。 ○: The most frequent pitch of the uneven pattern is more than 1 μm and 20 μm or less, and the average depth is 10% or more when the most frequent pitch is 100%, and the degree of alignment is 0.3 to 1.0, which is suitable as a light diffuser.
△:凹凸圖案之最頻間距為1μm以下或超過20μm,或平均深度小於將最頻間距設為100%時之10%,或者配向度不足0.3,未必適宜作為光擴散體。 △: The most frequent pitch of the concave-convex pattern is 1 μm or less or more than 20 μm, or the average depth is less than 10% when the most frequent pitch is 100%, or the degree of alignment is less than 0.3, which is not necessarily suitable as a light diffuser.
×:無法形成凹凸圖案。 ×: The uneven pattern could not be formed.
於將使積層片之表面平滑硬質層以摺疊之方式變形而獲得之凹凸圖案形成片用作工程片原版之實施例9~12中,可容易製造具有凹凸圖案之光擴散體。尤其對於實施例9~12中獲得之光擴散體而言,凹凸圖案的最頻間距超過1μm且為20μm以下,底部之平均深度為將上述最頻間距設為100%時之10%以上,故適宜作為光擴散體。於實施例9~12中,之所以有獲得如上所述之最頻間距及平均深度,係由於表面平滑硬質層之厚度超過0.01μm且為0.2μm以下,且變形率為10%以上。 In the examples 9 to 12 in which the uneven pattern forming sheet obtained by deforming the surface of the laminated sheet by the folding of the hard layer in a folded manner is used as the original sheet of the engineering sheet, the light diffusing body having the uneven pattern can be easily produced. In particular, in the light-diffusing bodies obtained in Examples 9 to 12, the most frequent pitch of the uneven pattern is more than 1 μm and 20 μm or less, and the average depth of the bottom is 10% or more when the above-mentioned worst-frequency pitch is 100%. Suitable as a light diffuser. In Examples 9 to 12, the above-mentioned maximum frequency pitch and average depth were obtained because the thickness of the surface smooth hard layer exceeded 0.01 μm and was 0.2 μm or less, and the deformation ratio was 10% or more.
與此相對,於比較例7及8中,由於表面硬質平滑層之厚度為0.01μm以下或超過0.2μm,因此所獲得之光擴散體之凹凸圖案之最頻間距為1μm以下或超過20μm。又,比較例9中,由於將變形率設為3%,因此所獲得之光擴散體之凹凸圖案之底部的平均深度不足將最頻間距設為100%時之10%。又,比較例10中配向度不足0.3。該等比較例未必適宜作為光擴散體。 On the other hand, in Comparative Examples 7 and 8, since the thickness of the surface hard smoothing layer was 0.01 μm or less or more than 0.2 μm, the pitch of the concave-convex pattern of the obtained light-diffusing body was 1 μm or less or more than 20 μm. Further, in Comparative Example 9, since the deformation ratio was 3%, the average depth of the bottom portion of the uneven pattern of the obtained light diffuser was less than 10% when the most frequent pitch was 100%. Further, in Comparative Example 10, the degree of alignment was less than 0.3. These comparative examples are not necessarily suitable as light diffusers.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯製加熱收縮性薄膜(三菱樹脂股份有限公司製HISHIPET LX-60S,玻璃轉移溫度為70℃)之一面上,藉由凹板印刷機(松尾產業股份有限公司製K Printing Proofer),將於甲苯中稀釋的聚苯乙烯(POLYMER SOURCE股份有限公司製PS,玻璃轉移溫度為100℃)印刷成直徑為50μm、厚度為500nm之點狀,以獲得印刷片。 Heat shrinkable film made of polyethylene terephthalate having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET manufactured by Mitsubishi Plastics Co., Ltd.) Polystyrene (Polymer SOURCE Co., Ltd.) diluted in toluene by a gravure printing machine (K Printing Proofer manufactured by Matsuo Co., Ltd.) on one side of LX-60S, a glass transition temperature of 70 ° C) The glass transition temperature was 100 ° C) and printed into dots having a diameter of 50 μm and a thickness of 500 nm to obtain a printed sheet.
點之圖案係如下所述之灰度圖案,亦即,於寬5cm×長10cm之範圍內,自其長度方向之一端朝向另一端,點面積比例於0~100%之範圍內每1cm增加10%。再者,點面積比例0%表示完全未印刷,100%表示全面印刷。 The pattern of the dots is a gray scale pattern as described below, that is, in the range of 5 cm in width × 10 cm in length, from one end to the other end in the length direction, the dot area ratio is increased from 10 to 100% per 1 cm. %. Furthermore, a dot area ratio of 0% indicates complete printing, and 100% indicates full printing.
繼而,於80℃時對該印刷片加熱1分鐘,藉此使其熱收縮為加熱前之長度之40%(亦即,使其以60%之變形率而變形)。於80℃時,聚苯乙烯之楊氏模量(1GPa)高於聚對苯二甲酸乙二酯製加熱收縮性薄膜之楊氏模量(50MPa)。因此,於熱收縮時,點以摺疊之方式而變形,從而形成沿著與收縮方向正交之方向而具有週期之波狀凹凸圖案。藉此,獲得於平坦之一面上形成有凹凸區域之凹凸圖案形成片。 Then, the printed sheet was heated at 80 ° C for 1 minute, whereby it was heat-shrinked to 40% of the length before heating (that is, it was deformed at a deformation rate of 60%). At 80 ° C, the Young's modulus (1 GPa) of polystyrene is higher than the Young's modulus (50 MPa) of the heat shrinkable film made of polyethylene terephthalate. Therefore, at the time of heat shrinkage, the dots are deformed in a folded manner to form a corrugated concave-convex pattern having a period along a direction orthogonal to the contraction direction. Thereby, the uneven pattern forming sheet in which the uneven surface is formed on one surface of the flat surface is obtained.
該凹凸圖案形成片之凹凸區域之凹凸圖案的最頻間距為5μm,縱橫比為1,配向度為0.3。 The concave-convex pattern of the uneven pattern of the uneven pattern forming sheet had a mode-to-average pitch of 5 μm, an aspect ratio of 1, and an alignment degree of 0.3.
檢查所獲得之凹凸圖案形成片之光擴散性後得知,相較於與收縮方向垂直之方向,與收縮方向平行之方向上具有更強的使光擴散之異向擴散性。又,光擴散性沿著凹凸區域之面積比例變大之方向而逐漸增加。如此之實施例13之凹凸圖案形成片係可用作光擴散片者。 When the light diffusing property of the obtained concave-convex pattern forming sheet was examined, it was found that the direction perpendicular to the shrinking direction has a stronger anisotropic diffusing property for diffusing light in a direction parallel to the shrinking direction. Further, the light diffusibility gradually increases along the direction in which the area ratio of the uneven region becomes large. The concave-convex pattern forming sheet of Example 13 as such can be used as a light diffusing sheet.
使用於二軸方向上加熱收縮之厚度為25μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET PX-40S),以取代三菱樹脂股份有限公司製HISHIPET LX-60S,除此之外,以與實施例13相同之方式獲得凹凸圖案形成片。於該凹凸圖案形成片之一面上,形成有並未沿著特定方向之波狀凹凸圖案。 A polyethylene terephthalate shrink film (HISHIPET PX-40S manufactured by Mitsubishi Plastics Co., Ltd.) having a thickness of 25 μm and a Young's modulus of 3 GPa in a biaxial direction was used to replace Mitsubishi Resin Co., Ltd. A concave-convex pattern forming sheet was obtained in the same manner as in Example 13 except that HISHIPET LX-60S was produced. A corrugated concavo-convex pattern that does not follow a specific direction is formed on one surface of the concavo-convex pattern forming sheet.
該凹凸圖案形成片之凹凸區域之凹凸圖案的最頻間距為5μm,縱橫比為1。 The concave-convex pattern of the uneven pattern of the uneven pattern forming sheet had a pitch of 5 μm and an aspect ratio of 1.
檢查實施例14之凹凸圖案形成片之光學特性後得知,其具有等向光擴散性。因此,實施例14之凹凸圖案形成片係可用作光擴散片者。 The optical characteristics of the uneven pattern forming sheet of Example 14 were examined, and it was found that it had an isotropic light diffusibility. Therefore, the uneven pattern forming sheet of Example 14 can be used as a light diffusing sheet.
藉由噴墨印表機(FUJI FILM股份有限公司Dimatix Materials Printer DMP-2831)來印刷點,除此之外,以與實施例13相同之方式獲得凹凸圖案形成片。該凹凸圖案形成片之凹凸區域之凹凸圖案的最頻間距為5μm,縱橫比為1,配向度為0.3。 A concave-convex pattern forming sheet was obtained in the same manner as in Example 13 except that dots were printed by an ink jet printer (FUJI FILM Co., Ltd. Dimatix Materials Printer DMP-2831). The concave-convex pattern of the uneven pattern of the uneven pattern forming sheet had a mode-to-average pitch of 5 μm, an aspect ratio of 1, and an alignment degree of 0.3.
檢查所獲得之凹凸圖案形成片之光學特性後可知,其具有與實施例13相同之異向擴散性。因此,實施例15之凹凸圖案形成片係可用作光擴散片者。 The optical characteristics of the obtained concavo-convex pattern forming sheet were examined, and it was found to have the same anisotropic diffusing property as in Example 13. Therefore, the uneven pattern forming sheet of Example 15 can be used as a light diffusing sheet.
將藉由實施例13之方法所獲得之凹凸圖案形成片用作工程片原版,按如下所述之方式獲得光擴散片。 The concave-convex pattern forming sheet obtained by the method of Example 13 was used as an original for an engineering sheet, and a light-diffusing sheet was obtained in the following manner.
亦即,於藉由實施例13所獲得之工程片原版之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the epoxy acrylate-based prepolymer, the 2-ethylhexyl acrylate and the benzophenone were coated on the surface of the original sheet of the engineering sheet obtained in Example 13 on which the uneven pattern was formed. An uncured ultraviolet curable resin composition of a photopolymerization initiator.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜的與工程片原版不相接觸之面上,將厚度為50μm之三乙醯纖維素薄膜重疊並按壓。 Then, on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the original sheet of the engineering sheet, a triacetonitrile cellulose film having a thickness of 50 μm was superposed and pressed.
其次,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之紫外線硬化性樹脂硬化,並自工程片原版上剝離該硬化物,藉此獲得光擴散片。 Next, ultraviolet rays are irradiated from the upper surface of the triacetone cellulose film to harden the uncured ultraviolet curable resin, and the cured product is peeled off from the original sheet of the engineering sheet, thereby obtaining a light-diffusing sheet.
所獲得之光擴散片具有與實施例13之光擴散片相同之凹凸區 域,係具有相同之光擴散性。 The obtained light-diffusing sheet has the same unevenness as that of the light-diffusing sheet of Example 13. Domains have the same light diffusivity.
將藉由實施例13之方法所獲得之凹凸圖案形成片用作工程片原版,按如下所述之方式獲得光擴散片。 The concave-convex pattern forming sheet obtained by the method of Example 13 was used as an original for an engineering sheet, and a light-diffusing sheet was obtained in the following manner.
亦即,於藉由實施例13所獲得之工程片原版的形成有凹凸圖案之面上進行鍍鎳處理,其後剝離該鍍鎳,藉此獲得厚度為200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the surface on which the uneven pattern was formed on the original sheet obtained in Example 13 was subjected to nickel plating treatment, and thereafter the nickel plating was peeled off, whereby a secondary work sheet having a thickness of 200 μm was obtained. Applying an epoxidized acrylate-based prepolymer, a 2-ethylhexyl acrylate, and a benzophenone-based photopolymerization initiator to the surface on which the uneven pattern is formed on the secondary work piece An ultraviolet curable resin composition.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜的與二次工程片不相接觸之面上,將厚度為50μm之三乙醯纖維素薄膜重疊並按壓。 Then, on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the secondary engineering sheet, a triacetonitrile cellulose film having a thickness of 50 μm was superposed and pressed.
繼而,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之硬化性樹脂硬化,並自二次工程片上剝離該硬化物,藉此獲得光擴散片。 Then, ultraviolet rays were irradiated from the upper surface of the triacetone cellulose film to harden the uncured curable resin, and the cured product was peeled off from the secondary work piece, thereby obtaining a light-diffusing sheet.
所獲得之光擴散片具有與實施例13之光擴散片相同之凹凸區域,且具有相同之光擴散性。 The obtained light-diffusing sheet had the same unevenness as that of the light-diffusing sheet of Example 13, and had the same light diffusibility.
使用熱硬化性環氧樹脂以取代紫外線硬化性樹脂組成物,並通過加熱使該熱硬化性環氧樹脂硬化以取代紫外線照射,除此之外,以與實施例17相同之方式獲得光擴散片。 A light-diffusing sheet was obtained in the same manner as in Example 17 except that the thermosetting epoxy resin was used in place of the ultraviolet curable resin composition, and the thermosetting epoxy resin was cured by heating instead of ultraviolet irradiation. .
所獲得之光擴散片具有與實施例13之光擴散片相同之凹凸區域,且具有相同之光擴散性。 The obtained light-diffusing sheet had the same unevenness as that of the light-diffusing sheet of Example 13, and had the same light diffusibility.
以與實施例17相同之方式,獲得厚度為200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,將厚度為50μm之聚甲基 丙烯酸甲酯薄膜重疊並加熱。對經加熱而軟化之聚甲基丙烯酸甲酯薄膜與二次工程片自該等之兩側進行按壓,之後使其冷卻.固化,並自二次工程片上剝離已固化之聚甲基丙烯酸甲酯薄膜,藉此獲得光擴散片。 In the same manner as in Example 17, a secondary work piece having a thickness of 200 μm was obtained. On the surface of the secondary work piece on which the concave-convex pattern is formed, a polymethyl group having a thickness of 50 μm is used. The methyl acrylate film is overlapped and heated. The heated and softened polymethyl methacrylate film and the secondary engineering sheet are pressed from both sides, and then cooled. The film was cured, and the cured polymethyl methacrylate film was peeled off from the secondary work piece, thereby obtaining a light-diffusing sheet.
所獲得之光擴散片具有與實施例13之光擴散片相同之凹凸區域,且具有相同之光擴散性。 The obtained light-diffusing sheet had the same unevenness as that of the light-diffusing sheet of Example 13, and had the same light diffusibility.
於單軸方向熱收縮之厚度為50μm且楊氏模量為3GPa之聚對苯二甲酸乙二酯製加熱收縮性薄膜(三菱樹脂股份有限公司製HISHIPET LX-10S,玻璃轉移溫度為70℃)之一面,載置形成有大量點狀之開口部(孔徑50μm)之遮罩。 Heat shrinkable film made of polyethylene terephthalate having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-10S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature: 70 ° C) On one of the faces, a mask having a large number of dot-shaped openings (aperture 50 μm) was placed.
遮罩之開口部之圖案係如下所述之灰度圖案,即:於寬度5cm×長度10cm之範圍內,自其長度方向之一端朝向另一端,開口部面積比例於0~100%之範圍內每1cm增加10%。再者,開口部面積比例0%表示未開口,100%表示全面開口。 The pattern of the opening portion of the mask is a gray scale pattern as follows, that is, in a range of a width of 5 cm × a length of 10 cm, from one end of the length direction to the other end, the area ratio of the opening portion is in the range of 0 to 100%. 10% increase per 1cm. Further, the opening area ratio of 0% means no opening, and 100% means full opening.
繼而,在將遮罩載置於加熱收縮性薄膜之一面之狀態下,真空蒸鍍楊氏模量為70GPa之鋁,使其厚度為0.05μm,以獲得蒸鍍片。 Then, aluminum was placed in a state of one surface of the heat-shrinkable film, and aluminum having a Young's modulus of 70 GPa was vacuum-deposited to have a thickness of 0.05 μm to obtain a vapor-deposited sheet.
此時,於加熱收縮性薄膜之一面形成鋁點。該點之圖案係如下所述之灰度圖案,即:於寬度5cm×長度10cm之範圍內,自其長度方向之一端朝向另一端,開口部面積比例於0~100%之範圍內每1cm增加10%。再者,點面積比例0%表示完全未蒸鍍,100%表示全面蒸鍍。 At this time, an aluminum dot is formed on one surface of the heat shrinkable film. The pattern of the point is a gray scale pattern as described below, that is, in the range of 5 cm in width × 10 cm in length, from one end in the longitudinal direction toward the other end, the ratio of the area of the opening portion increases from 1 to 100% per 1 cm. 10%. Further, a dot area ratio of 0% means that it is not completely vapor-deposited, and 100% means that it is fully vapor-deposited.
繼而,於100℃時對該蒸鍍片加熱1分鐘,藉此使其熱收縮為加熱前之長度之40%(即,使其以變形率60%變形)。於熱收縮時,點以摺疊之方式變形,從而形成沿著與收縮方向正交之方向而具有週期之波狀凹凸圖案。藉此,獲得於一面形成有凹凸區域之凹凸圖案形成 片。 Then, the vapor-deposited sheet was heated at 100 ° C for 1 minute, whereby it was heat-shrinked to 40% of the length before heating (that is, it was deformed at a deformation rate of 60%). At the time of heat shrinkage, the dots are deformed in a folded manner to form a corrugated concave-convex pattern having a period along a direction orthogonal to the contraction direction. Thereby, the concave-convex pattern formed on one side of the concave-convex region is formed sheet.
該凹凸圖案形成片之凹凸區域之凹凸圖案之最頻間距為3μm,縱橫比為1,配向度為0.3。 The concave-convex pattern of the uneven pattern of the concave-convex pattern forming sheet had a mode-to-average pitch of 3 μm, an aspect ratio of 1, and an alignment degree of 0.3.
繼而,將所獲得之凹凸圖案形成片用作工程片原版,按如下所述之方式獲得光擴散片。 Then, the obtained concave-convex pattern forming sheet was used as an original sheet of the engineering sheet, and a light-diffusing sheet was obtained in the following manner.
即,於工程片原版之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, an unhardened layer containing an epoxy acrylate-based prepolymer, a 2-ethylhexyl acrylate, and a benzophenone-based photopolymerization initiator is applied to the surface on which the concave-convex pattern is formed on the original sheet of the engineering sheet. An ultraviolet curable resin composition.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜之與工程片原版不相接觸之面上,重疊厚度50μm之三乙醯纖維素薄膜,並進行按壓。 Then, a film of a triacetyl cellulose film having a thickness of 50 μm was placed on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the original sheet of the engineering sheet, and pressed.
繼而,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之紫外線硬化性樹脂硬化,並自工程片原版上剝離該硬化物,藉此獲得光擴散片。 Then, ultraviolet rays are irradiated from the upper surface of the triacetone cellulose film to harden the uncured ultraviolet curable resin, and the cured product is peeled off from the original sheet of the engineering sheet, thereby obtaining a light-diffusing sheet.
檢驗所獲得之光擴散片之光學特性得知,其具有與實施例13相同之異向擴散性。 The optical characteristics of the light-diffusing sheet obtained by the inspection were found to have the same anisotropy as that of Example 13.
使用於二軸方向上加熱收縮之厚度為25μm且楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET PX-40S),以取代三菱樹脂股份有限公司製HISHIPET LX-60S,除此之外,以與實施例20相同之方式獲得凹凸圖案形成片。該凹凸圖案形成片之凹凸區域之凹凸圖案之最頻間距為3μm,縱橫比為1。 A polyethylene terephthalate shrink film (HISHIPET PX-40S manufactured by Mitsubishi Plastics Co., Ltd.) having a thickness of 25 μm and a Young's modulus of 3 GPa in a biaxial direction was used to replace Mitsubishi Resin Co., Ltd. A concave-convex pattern forming sheet was obtained in the same manner as in Example 20 except that HISHIPET LX-60S was produced. The concave-convex pattern of the uneven pattern of the concave-convex pattern forming sheet has a mode width of 3 μm and an aspect ratio of 1.
繼而,使用該凹凸圖案形成片,以與實施例20相同之方式獲得光擴散片。檢驗實施例21之光擴散片之光學特性得知,其具有等向之光擴散性。 Then, using this concave-convex pattern to form a sheet, a light-diffusing sheet was obtained in the same manner as in Example 20. The optical characteristics of the light-diffusing sheet of Example 21 were examined and found to have an isotropic light diffusibility.
將藉由實施例20之方法所獲得之凹凸圖案形成片用作工程片原版,按如下所述之方式獲得光擴散片。 The concave-convex pattern forming sheet obtained by the method of Example 20 was used as an original for an engineering sheet, and a light-diffusing sheet was obtained in the following manner.
即,於藉由實施例20所獲得之工程片原版之形成有凹凸圖案之面上進行鍍鎳處理,其後剝離該鍍鎳,藉此獲得厚度200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 Namely, the surface on which the uneven pattern was formed on the original sheet obtained in Example 20 was subjected to a nickel plating treatment, and thereafter the nickel plating was peeled off, whereby a secondary work sheet having a thickness of 200 μm was obtained. Applying an epoxidized acrylate-based prepolymer, a 2-ethylhexyl acrylate, and a benzophenone-based photopolymerization initiator to the surface on which the uneven pattern is formed on the secondary work piece An ultraviolet curable resin composition.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜之與二次工程片不相接觸之面上,重疊厚度50μm之三乙醯纖維素薄膜,並進行按壓。 Then, a film of a triacetyl cellulose film having a thickness of 50 μm was placed on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the secondary work piece, and pressed.
繼而,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之硬化性樹脂硬化,並自二次工程片剝離該硬化物,藉此獲得光擴散片。 Then, ultraviolet rays were irradiated from the upper surface of the triacetone cellulose film to harden the uncured curable resin, and the cured product was peeled off from the secondary work piece, thereby obtaining a light-diffusing sheet.
所獲得之光擴散片具有與實施例20之光擴散片相同之凹凸區域,且具有相同之光擴散性。 The obtained light-diffusing sheet had the same unevenness as that of the light-diffusing sheet of Example 20, and had the same light diffusibility.
使用熱硬化性環氧樹脂以取代紫外線硬化性樹脂組成物,並通過加熱使該熱硬化性環氧樹脂硬化以取代紫外線照射,除此之外,以與實施例22相同之方式獲得光擴散片。 A light-diffusing sheet was obtained in the same manner as in Example 22 except that the thermosetting epoxy resin was used in place of the ultraviolet curable resin composition, and the thermosetting epoxy resin was cured by heating instead of ultraviolet irradiation. .
所獲得之光擴散片具有與實施例20之光擴散片相同之凹凸區域,且具有相同之光擴散性。 The obtained light-diffusing sheet had the same unevenness as that of the light-diffusing sheet of Example 20, and had the same light diffusibility.
以與實施例22相同之方式,獲得厚度200μm之二次工程片。於該二次工程片之形成有凹凸圖案之面上,重疊厚度50μm之聚甲基丙烯酸甲酯薄膜,並進行加熱。自該等之兩側按壓經加熱而軟化之聚甲基丙烯酸甲酯薄膜與二次工程片之後,使其冷卻.固化,自二次工程片剝離已固化之聚甲基丙烯酸甲酯薄膜,藉此獲得光擴散片。 In the same manner as in Example 22, a secondary work piece having a thickness of 200 μm was obtained. On the surface of the secondary work piece on which the uneven pattern was formed, a polymethyl methacrylate film having a thickness of 50 μm was laminated and heated. The heated and softened polymethyl methacrylate film and the secondary engineering sheet are pressed from both sides to be cooled. After curing, the cured polymethyl methacrylate film was peeled off from the secondary work piece, thereby obtaining a light-diffusing sheet.
所獲得之光擴散片具有與實施例20之光擴散片相同之凹凸區域,且具有相同之光擴散性。 The obtained light-diffusing sheet had the same unevenness as that of the light-diffusing sheet of Example 20, and had the same light diffusibility.
於一面上混合存在有凹凸區域之實施例13~24之光學片中,藉由凹凸區域之凹凸圖案而使光擴散,因此光擴散性優異。又,上述光學片中,凹凸區域於長度方向之另一端側配置得較密,因此於長度方向之另一端側光擴散性較高。 In the optical sheets of Examples 13 to 24 in which the uneven portions were mixed on one surface, light was diffused by the uneven pattern of the uneven portions, and thus the light diffusibility was excellent. Further, in the optical sheet, since the uneven portion is disposed densely on the other end side in the longitudinal direction, the light diffusing property is higher at the other end side in the longitudinal direction.
下述例中之楊氏模量係使用拉伸測試機(Tester產業公司製TE-7001),並根據JIS K 7113-1995而測定出之值。當未特別記載溫度時,則為23℃時之值。 The Young's modulus in the following examples was measured using a tensile tester (TE-7001, manufactured by Tester Industries, Inc.) in accordance with JIS K 7113-1995. When the temperature is not specifically described, it is a value at 23 °C.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET LX-60S,玻璃轉移溫度為70℃)之一面上,藉由旋轉塗佈法而塗佈於甲苯中稀釋的聚甲基丙烯酸甲酯(POLYMER SOURCE股份有限公司製P4831-MMA,玻璃轉移溫度為100℃),使其厚度為12nm,以形成硬質層而獲得積層片。 A polyethylene terephthalate shrink film having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-60S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature: 70 ° C) The polymethyl methacrylate (P4831-MMA, manufactured by POLYMER SOURCE Co., Ltd., glass transition temperature: 100 ° C) diluted with toluene was applied by a spin coating method to have a thickness of 12 nm to form a hard layer. And get a layer of film.
繼而,於80℃時對該積層片加熱1分鐘,藉此使其熱收縮為加熱前之長度之40%(亦即,使其以60%之變形率而變形),從而獲得硬質層具有波狀凹凸圖案的凹凸圖案形成片,上述波狀凹凸圖案沿著與收縮方向正交之方向具有週期。 Then, the laminated sheet was heated at 80 ° C for 1 minute, whereby the heat was shrunk to 40% of the length before heating (that is, it was deformed at a deformation rate of 60%), thereby obtaining a hard layer having a wave. The uneven pattern of the uneven pattern forms a sheet, and the corrugated pattern has a period along a direction orthogonal to the contraction direction.
再者,聚對苯二甲酸乙二酯收縮薄膜及該聚甲基丙烯酸甲酯於80℃時的楊氏模量分別為50MPa、1GPa。 Further, the polyethylene terephthalate shrink film and the polymethyl methacrylate have a Young's modulus at 80 ° C of 50 MPa and 1 GPa, respectively.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET LX-61S,玻璃轉移溫度為70℃)之一面上,塗佈於水中稀釋的聚乙烯醇 (KURARAY股份有限公司製PVA105,玻璃轉移溫度85℃),使其厚度為12nm,以形成硬質層而獲得積層片。 On the side of a polyethylene terephthalate shrink film having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-61S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature: 70 ° C) , coated with polyvinyl alcohol diluted in water (PVA105 manufactured by KURARAY Co., Ltd., glass transition temperature: 85 ° C), and having a thickness of 12 nm to form a hard layer to obtain a laminated sheet.
繼而,於75℃時對該積層片加熱1分鐘,藉此使其熱收縮為加熱前之長度之50%(亦即,使其以50%之變形率而變形),從而獲得硬質層具有波狀凹凸圖案之凹凸圖案形成片,上述波狀凹凸圖案沿著與收縮方向正交之方向具有週期。 Then, the laminated sheet was heated at 75 ° C for 1 minute, whereby it was heat-shrinked to 50% of the length before heating (that is, it was deformed at a deformation rate of 50%), thereby obtaining a hard layer having a wave. The concave-convex pattern forming sheet of the uneven pattern has a period in a direction orthogonal to the contraction direction.
再者,聚對苯二甲酸乙二酯收縮薄膜及該聚乙烯醇於75℃時的楊氏模量分別為50MPa、1GPa。 Further, the polyethylene terephthalate shrink film and the Young's modulus of the polyvinyl alcohol at 75 ° C were 50 MPa and 1 GPa, respectively.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET LX-61S,玻璃轉移溫度為70℃)之一面上,蒸鍍並固化氟樹脂(Tandk股份有限公司製NANOS B),使其厚度為12μm,以形成硬質層而獲得積層片。 On the side of a polyethylene terephthalate shrink film having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-61S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature: 70 ° C) A fluororesin (NANOS B manufactured by Tandk Co., Ltd.) was vapor-deposited and cured to have a thickness of 12 μm to form a hard layer to obtain a laminated sheet.
繼而,於75℃時對該積層片加熱1分鐘,藉此使其熱收縮為加熱前之長度之50%(亦即,使其以50%之變形率而變形),從而獲得硬質層具有波狀凹凸圖案的凹凸圖案形成片,上述波狀凹凸圖案沿著與收縮方向正交之方向而具有週期。 Then, the laminated sheet was heated at 75 ° C for 1 minute, whereby it was heat-shrinked to 50% of the length before heating (that is, it was deformed at a deformation rate of 50%), thereby obtaining a hard layer having a wave. The concave-convex pattern forming sheet of the uneven pattern has a period in which the corrugated concave-convex pattern has a direction orthogonal to the contraction direction.
將由楊氏模量為2MPa之由聚二甲基矽氧烷構成的厚度5mm之片,藉由拉伸裝置而拉伸至兩倍長度,於該狀態下將其固定。其次,於該狀態下,於該片之一面上,塗佈於甲苯中稀釋之聚甲基丙烯酸甲酯(POLYMER SOURCE股份有限公司製P4831-MMA,玻璃轉移溫度為100℃),使其厚度為12nm,以形成硬質層而獲得積層片。 A sheet having a thickness of 5 mm composed of polydimethyl siloxane having a Young's modulus of 2 MPa was stretched to twice the length by a stretching device, and fixed in this state. Next, in this state, polymethyl methacrylate (P4831-MMA, manufactured by POLYMER SOURCE Co., Ltd., glass transition temperature: 100 ° C) diluted in toluene was applied to one side of the sheet to have a thickness of 12 nm to form a hard layer to obtain a laminated sheet.
繼而,停止拉伸,使該積層片恢復至拉伸前之長度,藉此使硬質層以50%之變形率而壓縮,以獲得硬質層具有波狀凹凸圖案之凹凸 圖案形成片,上述波狀凹凸圖案沿著與收縮方向正交之方向而具有週期。 Then, the stretching is stopped, and the laminated sheet is returned to the length before stretching, whereby the hard layer is compressed at a deformation rate of 50% to obtain a concave layer having a wavy concave-convex pattern. The pattern forming sheet has a period along a direction orthogonal to the contraction direction.
於由楊氏模量為2MPa之由聚二甲基矽氧烷構成的厚度5mm之片之一面上,塗佈於甲苯中稀釋之聚甲基丙烯酸甲酯(POLYMER SOURCE股份有限公司製P4831-MMA,玻璃轉移溫度為100℃),使其厚度為12nm,以形成硬質層而獲得積層片。 Polymethyl methacrylate diluted in toluene (P4831-MMA manufactured by POLYMER SOURCE Co., Ltd.) on one side of a sheet having a thickness of 5 mm composed of polydimethyl methoxy hydride having a Young's modulus of 2 MPa The glass transition temperature was 100 ° C) to a thickness of 12 nm to form a hard layer to obtain a laminated sheet.
繼而,藉由拉伸裝置將積層片拉伸至五倍長度,藉此使拉伸方向之法線方向之長度收縮50%(亦即,使其以50%之變形率而變形),從而獲得硬質層具有波狀凹凸圖案之凹凸圖案形成片,上述波狀凹凸圖案沿著拉伸方向而具有週期。 Then, the laminated sheet is stretched to a length of five times by a stretching device, whereby the length of the normal direction of the stretching direction is contracted by 50% (that is, it is deformed by a deformation ratio of 50%), thereby obtaining The hard layer has a concave-convex pattern forming sheet having a corrugated concave-convex pattern, and the corrugated concave-convex pattern has a period along the stretching direction.
以使厚度為60nm之方式塗佈聚甲基丙烯酸甲酯,除此之外,以與實施例25相同之方式獲得凹凸圖案形成片。 A concavo-convex pattern-forming sheet was obtained in the same manner as in Example 25 except that polymethyl methacrylate was applied in such a manner that the thickness was 60 nm.
嘗試使用厚度為50μm、楊氏模量為5GPa之二軸延伸聚對苯二甲酸乙二酯薄膜(帝人股份有限公司製G2)以取代收縮薄膜,除此之外,以與實施例25相同之方式獲得凹凸圖案工程用片。然而,並未形成有波狀之凹凸圖案,故並未獲得凹凸圖案工程用片。 An attempt was made to use a biaxially-oriented polyethylene terephthalate film (G2 manufactured by Teijin Co., Ltd.) having a thickness of 50 μm and a Young's modulus of 5 GPa to replace the shrink film, and the same as in Example 25. In a manner, a sheet for concave and convex pattern engineering is obtained. However, since the wavy concave-convex pattern was not formed, the uneven pattern engineering sheet was not obtained.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET LX-10S)之一面上,塗佈於甲苯中稀釋之聚甲基丙烯酸甲酯(POLYMER SOURCE股份有限公司製P4831-MMA,玻璃轉移溫度為100℃),使其厚度為12nm,以形成表面平滑硬質層而獲得積層片。 One side of a polyethylene terephthalate shrink film (HISHIPET LX-10S manufactured by Mitsubishi Plastics Co., Ltd.) having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction was diluted with toluene. Polymethyl methacrylate (P4831-MMA, manufactured by POLYMER SOURCE Co., Ltd., glass transition temperature: 100 ° C) was used to have a thickness of 12 nm to form a smooth hard surface layer to obtain a laminated sheet.
繼而,於70℃時對該積層片加熱1分鐘,使其收縮為加熱前之長 度之97%(亦即,使其以3%之變形率而變形),從而獲得凹凸圖案工程用片,除此之外,以與實施例27相同之方式獲得凹凸圖案形成片。 Then, the laminated sheet was heated at 70 ° C for 1 minute to shrink it to the length before heating. A concave-convex pattern forming sheet was obtained in the same manner as in Example 27 except that 97% of the degree (that is, it was deformed by a deformation ratio of 3%) to obtain a sheet for uneven patterning.
於單軸方向熱收縮之厚度為50μm、楊氏模量為3GPa之聚對苯二甲酸乙二酯收縮薄膜(三菱樹脂股份有限公司製HISHIPET LX-10S,玻璃轉移溫度為70℃)之一面上,藉由旋轉塗佈法塗佈將楊氏模量為2MPa之聚二甲基矽氧烷(信越化學工業股份有限公司KS847T,玻璃轉移溫度為-120℃)及鉑觸媒(信越化學工業股份有限公司PS-1)稀釋於甲苯中所得之分散液,使其厚度為12nm,以形成硬質層而獲得積層片。 On the surface of a polyethylene terephthalate shrink film having a thickness of 50 μm and a Young's modulus of 3 GPa in a uniaxial direction (HISHIPET LX-10S manufactured by Mitsubishi Plastics Co., Ltd., glass transition temperature: 70 ° C) Coating polydimethyl methoxyoxane with a Young's modulus of 2 MPa (Shin-Etsu Chemical Co., Ltd. KS847T, glass transition temperature -120 °C) and platinum catalyst (Shin-Etsu Chemical Industry Co., Ltd.) by spin coating The dispersion obtained by diluting in toluene of PS-1) was made to have a thickness of 12 nm to form a hard layer to obtain a laminated sheet.
繼而,於100℃時對該積層片加熱1分鐘,使其熱收縮,藉此欲獲得凹凸圖案形成片,但因無法使硬質層蛇行變形,故波狀之凹凸圖案並未形成。 Then, the laminated sheet was heated at 100 ° C for 1 minute to be heat-shrinked, whereby the uneven pattern forming sheet was obtained. However, since the hard layer was not deformed by the meandering, the wavy concave-convex pattern was not formed.
將藉由實施例25所獲得之凹凸圖案形成片用作工程片,按如下所述之方式獲得光學元件。 The concave-convex pattern forming sheet obtained by Example 25 was used as an engineering sheet, and an optical element was obtained in the following manner.
亦即,於藉由實施例25所獲得之工程片的形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the epoxy acrylate-based prepolymer, 2-ethylhexyl acrylate, and benzophenone-based light were applied to the surface of the engineering sheet obtained in Example 25 on which the uneven pattern was formed. An uncured ultraviolet curable resin composition of a polymerization initiator.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜的與工程片不相接觸之面上,將厚度50μm之三乙醯纖維素薄膜重疊並按壓。 Then, on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the engineering sheet, a triethylene glycol film having a thickness of 50 μm was superposed and pressed.
其次,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之紫外線硬化性樹脂組成物硬化,並自工程片上剝離該硬化物,藉此獲得光學元件。 Next, ultraviolet rays are irradiated from the top of the triacetone cellulose film to harden the uncured ultraviolet curable resin composition, and the cured product is peeled off from the engineering sheet, thereby obtaining an optical element.
將藉由實施例25所獲得之凹凸圖案形成片用作工程片,按如下 所述之方式獲得光學元件。 The concave-convex pattern forming sheet obtained by Example 25 was used as an engineering sheet as follows The optical element is obtained in the manner described.
亦即,於藉由實施例25所獲得之工程片的形成有凹凸圖案之面上進行鍍鎳處理,其後剝離該鍍鎳,藉此獲得厚度200μm之鍍鎳片。於該鍍鎳片之形成有凹凸圖案之面上,塗佈包含環氧丙烯酸酯系預聚物、丙烯酸-2-乙基己酯及二苯甲酮系光聚合起始劑的未硬化之紫外線硬化性樹脂組成物。 That is, the surface on which the uneven pattern was formed on the engineering sheet obtained in Example 25 was subjected to nickel plating treatment, and thereafter the nickel plating was peeled off, whereby a nickel-plated sheet having a thickness of 200 μm was obtained. Applying an uncured ultraviolet light containing an epoxy acrylate prepolymer, a 2-ethylhexyl acrylate, and a benzophenone photopolymerization initiator to the surface on which the uneven pattern is formed on the nickel-plated sheet A curable resin composition.
繼而,於未硬化之紫外線硬化性樹脂組成物之塗膜的與鍍鎳片不相接觸之面上,將厚度為50μm之三乙醯纖維素薄膜重疊並按壓。 Then, on the surface of the coating film of the uncured ultraviolet curable resin composition which was not in contact with the nickel-plated sheet, a triacetonitrile cellulose film having a thickness of 50 μm was superposed and pressed.
其次,自三乙醯纖維素薄膜之上方照射紫外線,使未硬化之紫外線硬化性樹脂組成物硬化,並自鍍鎳片上剝離該硬化物,藉此獲得光學元件。 Next, ultraviolet rays are irradiated from the upper surface of the triacetone cellulose film to harden the uncured ultraviolet curable resin composition, and the cured product is peeled off from the nickel-plated sheet, whereby an optical element is obtained.
使用熱硬化性環氧樹脂以取代紫外線硬化性樹脂組成物,並通過加熱使該熱硬化性樹脂硬化以取代紫外線照射,除此之外,以與實施例31相同之方式獲得光學元件。 An optical element was obtained in the same manner as in Example 31 except that the thermosetting epoxy resin was used instead of the ultraviolet curable resin composition, and the thermosetting resin was cured by heating instead of ultraviolet irradiation.
以與實施例11相同之方式,獲得厚度200μm之鍍鎳片。於該鍍鎳片之形成有凹凸圖案之面上,將厚度為50μm之聚甲基丙烯酸甲酯薄膜重疊並加熱。對經加熱而軟化之聚甲基丙烯酸甲酯薄膜與鍍鎳片自該等兩側進行按壓,之後使其冷卻.固化,並自鍍鎳片上剝離,由此獲得凹凸圖案形成片。 In the same manner as in Example 11, a nickel-plated sheet having a thickness of 200 μm was obtained. On the surface of the nickel-plated sheet on which the uneven pattern was formed, a polymethyl methacrylate film having a thickness of 50 μm was superposed and heated. The heated and softened polymethyl methacrylate film and the nickel-plated sheet are pressed from the two sides, and then cooled. It was cured and peeled off from the nickel-plated sheet, whereby a concave-convex pattern-forming sheet was obtained.
藉由原子間力顯微鏡(日本Veeco公司製NanoScope III),對實施例25~33及比較例10~13之凹凸圖案形成片之光學元件之上表面進行拍攝。 The upper surfaces of the optical elements of the concave-convex pattern forming sheets of Examples 25 to 33 and Comparative Examples 10 to 13 were imaged by an atomic force microscope (NanoScope III manufactured by Veeco Co., Ltd., Japan).
對於實施例25~33、比較例10~13之凹凸圖案形成片之光學元件,於原子間力顯微鏡之圖像中測定10處凹凸圖案之深度,將該等深 度平均而求出平均深度。 For the optical elements of the concave-convex pattern forming sheets of Examples 25 to 33 and Comparative Examples 10 to 13, the depths of the ten concave-convex patterns were measured in an image of an atomic force microscope, and the depth was the same. The average depth is obtained by averaging.
將該等之值顯示於表3。 The values of these are shown in Table 3.
又,根據凹凸圖案之最頻間距及底部之平均深度,按以下基準來評價光學元件之適用性。將該評價結果顯示於表3。 Further, the applicability of the optical element was evaluated on the basis of the following criteria based on the most frequent pitch of the concave-convex pattern and the average depth of the bottom. The evaluation results are shown in Table 3.
○:凹凸圖案之最頻間距為1μm以下,平均深度為將最頻間距設為100%時之10%以上,適宜作為光學元件。 ○: The most frequent pitch of the uneven pattern is 1 μm or less, and the average depth is 10% or more when the most frequent pitch is 100%, and is suitable as an optical element.
×:凹凸圖案之最頻間距超過1μm,或者平均深度不足將最頻間距設為100%時之10%,不適宜作為光學元件。 X: The most frequent pitch of the concave-convex pattern is more than 1 μm, or the average depth is less than 10% when the maximum-frequency pitch is 100%, which is not suitable as an optical element.
實施例25~29、比較例10、12中,使於第1樹脂製基材之一面上,設置有硬質層之積層片蛇行變形,上述硬質層由玻璃轉移溫度相較於第1樹脂之玻璃轉移溫度高出10℃以上的第2樹脂所構成,於此製造方法中,可容易製造凹凸圖案形成片。又,對於實施例25~29中獲得之凹凸圖案形成片而言,凹凸圖案之最頻間距為1μm以下,底部之平均深度為將上述最頻間距設為100%時之10%以上,故適宜作為光學元件。於實施例25~29中,之所以有獲得如上所述之最頻間距及平均 深度,係由於表面平滑硬質層之厚度為50μm以下,且變形率為50%以上。 In Examples 25 to 29 and Comparative Examples 10 and 12, the laminated sheet provided with the hard layer on one surface of the first resin substrate was subjected to serpentine deformation, and the hard layer was transferred from the glass to the glass of the first resin. The second resin having a transition temperature higher than 10 ° C is formed, and in this production method, the uneven pattern forming sheet can be easily produced. Further, in the concave-convex pattern forming sheets obtained in Examples 25 to 29, the groove width of the concave-convex pattern is 1 μm or less, and the average depth of the bottom portion is 10% or more when the above-mentioned maximum frequency pitch is 100%, which is suitable. As an optical component. In Examples 25-29, the most frequent spacing and average are obtained as described above. The depth is such that the thickness of the surface smooth hard layer is 50 μm or less and the deformation ratio is 50% or more.
又,根據將實施例25中獲得之凹凸圖案形成片用作工程片之實施例30~33之製造方法,可簡便地製造具有與凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光學元件。 Further, according to the manufacturing method of Examples 30 to 33 in which the uneven pattern forming sheet obtained in Example 25 is used as an engineering sheet, it is possible to easily produce a concave-convex pattern having the same frequency-to-frequency spacing and average depth as that of the concave-convex pattern forming sheet. Optical element.
再者,比較例10中,由於表面硬質平滑層厚度超過50nm,因此所獲得之凹凸圖案形成片之凹凸圖案之最頻間距超過1μm。又,比較例12中,由於將變形率設為3%,故所獲得之凹凸圖案形成片之凹凸圖案之底部的平均深度不足將最頻間距設為100%時之10%。該等比較例未必適宜作為光學元件。 Further, in Comparative Example 10, since the thickness of the surface hard smooth layer exceeded 50 nm, the pitch of the concave-convex pattern of the obtained concave-convex pattern forming sheet was more than 1 μm. Further, in Comparative Example 12, since the deformation ratio was 3%, the average depth of the bottom portion of the uneven pattern of the obtained concave-convex pattern forming sheet was less than 10% when the most frequent pitch was 100%. These comparative examples are not necessarily suitable as optical elements.
與此相對,於將二軸延伸聚對苯二甲酸乙二酯薄膜用作樹脂層之比較例11、及使用有第2樹脂之玻璃轉移溫度低於第1樹脂之玻璃轉移溫度的積層片之比較例13之製造方法中,由於表面平滑硬質層未蛇行變形,因此凹凸圖案並未形成。 On the other hand, Comparative Example 11 in which a biaxially-oriented polyethylene terephthalate film was used as a resin layer, and a laminated sheet in which a glass transition temperature of the second resin was lower than a glass transition temperature of the first resin was used. In the manufacturing method of Comparative Example 13, since the smooth surface of the hard layer was not meandered, the uneven pattern was not formed.
本發明之凹凸圖案形成片可用作光擴散體,且可簡便地製造。根據本發明之凹凸圖案形成片之製造方法,可簡便地製造用作光擴散體之凹凸圖案形成片。 The uneven pattern forming sheet of the present invention can be used as a light diffuser, and can be easily produced. According to the method for producing a concave-convex pattern forming sheet of the present invention, the concave-convex pattern forming sheet used as the light diffusing body can be easily produced.
本發明之光擴散體之擴散之異向性優異。根據本發明之光擴散體製造用工程片及光擴散體之製造方法,可簡便且大量地製造形成有與凹凸圖案形成片之最頻間距及平均深度相同之凹凸圖案的光擴散體。 The light diffusing body of the present invention is excellent in the anisotropy of diffusion. According to the method for producing a light-diffusing body and the method for producing a light-diffusing body of the present invention, a light-diffusing body in which a concave-convex pattern having the same maximum pitch and average depth as that of the uneven pattern-forming sheet can be easily and largely produced.
本發明之光學片之目標光學特性優異,並且可容易使光學特性不均勻。本發明之光擴散片之目標光擴散性優異,並且可容易使光擴散性不均勻。 The optical sheet of the present invention is excellent in target optical characteristics and can easily make optical characteristics uneven. The light-diffusing sheet of the present invention is excellent in target light diffusibility, and can easily make the light diffusibility uneven.
根據本發明之擴散導光體及背光單元,可使來自光源之光充分 地異向性擴散。 According to the diffused light guiding body and the backlight unit of the present invention, the light from the light source can be sufficiently Anisotropic spread.
本發明之凹凸圖案形成片可較好地用作防反射體或相位差板等光學元件。又,本發明之凹凸圖案形成片亦可較好地用作光學元件製造用工程片,該光學元件製造用工程片作為用以製造具有波狀凹凸圖案之光學元件的模具而使用。 The uneven pattern forming sheet of the present invention can be preferably used as an optical element such as an antireflection body or a phase difference plate. Moreover, the uneven pattern forming sheet of the present invention can also be preferably used as an engineering sheet for producing an optical element, and the engineering sheet for producing an optical element is used as a mold for producing an optical element having a corrugated concave-convex pattern.
10‧‧‧凹凸圖案形成片 10‧‧‧ concave pattern forming sheet
11‧‧‧基材(透明樹脂層) 11‧‧‧Substrate (transparent resin layer)
12‧‧‧硬質層 12‧‧‧ Hard layer
12a‧‧‧凹凸圖案 12a‧‧‧ concave pattern
12b‧‧‧底部 12b‧‧‧ bottom
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JP2007151795A JP4683011B2 (en) | 2007-06-07 | 2007-06-07 | Uneven pattern forming sheet and method for producing the same, light diffuser, process sheet original plate for producing light diffuser, and method for producing light diffuser |
JP2007151677A JP5135539B2 (en) | 2007-06-07 | 2007-06-07 | Diffuse light guide and backlight unit |
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2007
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- 2007-11-07 KR KR1020157003702A patent/KR101541288B1/en active IP Right Grant
- 2007-11-07 KR KR1020097017337A patent/KR101193615B1/en active IP Right Grant
- 2007-11-07 TW TW103125350A patent/TWI518376B/en active
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- 2007-11-07 CN CN 201110020355 patent/CN102176079B/en not_active Expired - Fee Related
- 2007-11-07 CN CN201410354369.2A patent/CN104122612B/en not_active Expired - Fee Related
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- 2007-11-07 CN CN201210109843.6A patent/CN102628969B/en not_active Expired - Fee Related
- 2007-11-07 WO PCT/JP2007/071635 patent/WO2008102487A1/en active Application Filing
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- 2007-11-07 KR KR1020127017847A patent/KR101414004B1/en active IP Right Grant
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Also Published As
Publication number | Publication date |
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TWI530713B (en) | 2016-04-21 |
KR20140027529A (en) | 2014-03-06 |
KR20120085940A (en) | 2012-08-01 |
TW201631332A (en) | 2016-09-01 |
CN104122612B (en) | 2017-04-12 |
TWI518376B (en) | 2016-01-21 |
TWI598638B (en) | 2017-09-11 |
TWI545351B (en) | 2016-08-11 |
CN104122612A (en) | 2014-10-29 |
TW201418783A (en) | 2014-05-16 |
TW201418785A (en) | 2014-05-16 |
KR101414004B1 (en) | 2014-08-05 |
KR20140027530A (en) | 2014-03-06 |
KR101541288B1 (en) | 2015-08-03 |
CN102176079B (en) | 2013-01-23 |
CN102628969A (en) | 2012-08-08 |
TW201418786A (en) | 2014-05-16 |
TW200912388A (en) | 2009-03-16 |
WO2008102487A1 (en) | 2008-08-28 |
KR20150027304A (en) | 2015-03-11 |
KR101193615B1 (en) | 2012-10-26 |
KR101541287B1 (en) | 2015-08-03 |
KR20090125061A (en) | 2009-12-03 |
TWI536048B (en) | 2016-06-01 |
CN102176079A (en) | 2011-09-07 |
KR101456522B1 (en) | 2014-11-04 |
TWI536047B (en) | 2016-06-01 |
TWI448736B (en) | 2014-08-11 |
TW201447389A (en) | 2014-12-16 |
CN102628969B (en) | 2014-10-08 |
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