CN102628969B - Sheet having uneven pattern formed thereon and method for production thereof - Google Patents

Sheet having uneven pattern formed thereon and method for production thereof Download PDF

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Publication number
CN102628969B
CN102628969B CN201210109843.6A CN201210109843A CN102628969B CN 102628969 B CN102628969 B CN 102628969B CN 201210109843 A CN201210109843 A CN 201210109843A CN 102628969 B CN102628969 B CN 102628969B
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China
Prior art keywords
sheet
peak
light
μ
relief pattern
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CN201210109843.6A
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Chinese (zh)
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CN102628969A (en
Inventor
冈安俊树
森幸惠
藤木保武
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王子控股株式会社
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Filing date
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Priority to JP2007040694A priority Critical patent/JP5211506B2/en
Priority to JP2007-040694 priority
Priority to JP2007151676A priority patent/JP5391529B2/en
Priority to JP2007-151677 priority
Priority to JP2007-151795 priority
Priority to JP2007151795A priority patent/JP4683011B2/en
Priority to JP2007151677A priority patent/JP5135539B2/en
Priority to JP2007-151676 priority
Priority to JP2007-261176 priority
Priority to JP2007261176A priority patent/JP5391539B2/en
Application filed by 王子控股株式会社 filed Critical 王子控股株式会社
Priority to CN200780051495.92007.11.07 priority
Publication of CN102628969A publication Critical patent/CN102628969A/en
Application granted granted Critical
Publication of CN102628969B publication Critical patent/CN102628969B/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/005Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0043Inhomogeneous or irregular arrays, e.g. varying shape, size, height

Abstract

Disclosed is a sheet having an uneven pattern formed thereon, which comprises a base material comprising a resin and a hard layer formed on one surface of the base material and comprising a resin, wherein an uneven pattern is formed on the surface of the hard layer. In the sheet, the difference between the glass transition temperature (Tg2) of the resin constituting the hard layer and the glass transition temperature (Tg1) of the resin constituting the base material (Tg2 - Tg1) is 10 DEG C or more, and the average depth of the bottoms of the uneven pattern is 10% or more when the modal pitch is set as 100%. Also disclosed is a method for producing the sheet.

Description

The manufacture method of peak-valley pattern formed sheet

The application is to be dividing an application of on November 7th, 2007 (priority date is on February 21st, 2007 the earliest), application number are 200780051495.9, denomination of invention is " peak-valley pattern formed sheet and manufacture method thereof " application the applying date.

Technical field

The present invention relates to be disposed at peak-valley pattern formed sheet and the manufacture method thereof of light diffusion body.In addition, also relate to the light diffusion body that uses peak-valley pattern formed sheet.In addition, also relate to light diffusion system and make with operation sheet master, it is used as manufactures the surperficial mould use that is formed with the light diffusion body of relief pattern.Further, the manufacture method that also relates to light diffusion body.

The present invention relates to optical sheet and light diffusing patch as uses such as light diffusing patch.

The present invention relates to the light diffusing diffusion light conductor that light source is sent.In addition, also relate to the back light unit that is disposed at liquid crystal indicator.

The present invention relates to be provided to peak-valley pattern formed sheet and the manufacture method thereof of the optical elements such as antireflection object, polarizer.In addition, relate to antireflection object, the polarizer that uses peak-valley pattern formed sheet.In addition, relate to Optical element manufacturing operation sheet, it is used as the mould use of manufacturing the optical element with relief pattern.

The present invention requires the right of priority of following invention: on February 21st, 2007 in Patent on June 7th, No. 2007-040694 1 of Japanese publication in Patent on June 7th, No. 2007-151676 1 of Japanese publication in Patent on June 7th, No. 2007-151677 1 of Japanese publication in No. 2007-151795, the Patent of Japanese publication and on October 4th, 2007 in the Patent 2007-261176 of Japanese publication patent, quote its content here.

Background technology

Conventionally utilize the surperficial peak-valley pattern formed sheet that is formed with wavy relief pattern as light diffusion body.

For example, in patent documentation 1, disclose as the material that is formed with the light diffusion body of relief pattern, it is formed with a plurality of projection bodies at least one face of light transmission base material, the height of projection body is 2~20 μ m, between projection body summit, be spaced apart 1~10 μ m, the length breadth ratio of projection body is more than 1.In addition, in patent documentation 1, also disclose as the method that forms projection body, the method for processing by the surface irradiation KrF excimer laser homenergic bundle to light transmission base material.

In patent documentation 2, disclose and on a face, be formed with the light diffusion body by the wavy concavo-convex anisotropic diffusion pattern forming.In addition, in patent documentation 2, disclose as the method that forms anisotropy pattern, by the film of photoresist is carried out to Ear Mucosa Treated by He Ne Laser Irradiation, expose, develop, form on a face and form irregular main hologram, this main hologram is transferred to mould, utilizes this mould to carry out the method for shaping resin.

Patent documentation 1: Japanese kokai publication hei 10-123307 communique

Patent documentation 2: TOHKEMY 2006-261064 communique

As the optical sheet with optical diffuse etc., known have surface to form irregular.For example, in patent documentation 3, the light diffusing patch that is formed with a plurality of point-like protuberances at substrate surface is disclosed.Optical sheet described in patent documentation 3 sprays ink on substrate by ink-jet, by making ink set form the protuberance of point-like.

Patent documentation 3: TOHKEMY 2004-157430 communique

The mode spacing (modal pitch) that known surface is formed with by the fine wavy concavo-convex relief pattern forming, relief pattern is the peak-valley pattern formed sheet below visible light wavelength, can be used as the optical elements such as antireflection object, polarizer and uses (with reference to non-patent literature 1).

Peak-valley pattern formed sheet can be used as antireflection object utilization, is due to following reason.

When sheet surface does not arrange relief pattern, at the interface of sheet and air, because sharply changing, refractive index causes producing reflection.But on the surface of sheet, be that the interface of sheet and air is while being provided with wavy relief pattern, in relief pattern part, the value that refractive index is shown as between air refraction and the refractive index of peak-valley pattern formed sheet is (following, be called middle refractive index), and this middle refractive index changes continuously along the depth direction of relief pattern.Particularly, position is darker, more approaches the refractive index of peak-valley pattern formed sheet.Because middle refractive index changes like this continuously, the refractive index at above-mentioned such interface can not occur sharply to change, and can suppress reflection of light.In addition, the spacing of relief pattern is visible light wavelength when following, at relief pattern, is partly difficult for visible diffraction of light occurs, and what by visible interference of light, caused is painted.

In addition, peak-valley pattern formed sheet can be used as polarizer utilization be due to, in the part of relief pattern, the mutually different air of refractive index and peak-valley pattern formed sheet configure alternately, result is to the existing optical anisotropy of light display.Further, the spacing of relief pattern identical with visible light wavelength or be its when following, appear at the phenomenon that wide visible wavelength region shows equal phase differential.

Instantiation as such peak-valley pattern formed sheet, for example, in non-patent literature 2, proposition on a face of the warmed-up sheet being formed by dimethyl silicone polymer gold evaporation to form metal level, then the cooling sheet consisting of dimethyl silicone polymer that makes shrinks, and obtains having formed at layer on surface of metal the sheet of wavy relief pattern.

In addition, in patent documentation 4, propose on the surface of heat-shrinkable film of synthetic resin, form successively basalis and metal level, then make the thermal shrinkage of heat-shrinkable film of synthetic resin, obtain being formed with at layer on surface of metal the sheet of wavy relief pattern.

In patent documentation 5, propose to form by meeting because the layer that exposure-processed causes the material of volumetric contraction to form, by this layer is carried out to exposure-processed, obtains forming irregular on surface.

Yet the peak-valley pattern formed sheet that patent documentation 4,5 and non-patent literature 2 are recorded, does not show excellent properties as optical element.Particularly, while using as antireflection object, cannot fully reduce reflectivity, in addition, while using as polarizer, cannot fully increase phase differential, can not produce in wide wavelength region may equal phase differential in addition.

In addition, as the method for manufacturing peak-valley pattern formed sheet, the known photoetching process of utilizing visible light that has use pattern mask.Yet the method cannot be manufactured the peak-valley pattern formed sheet with the spacing below light wavelength that can be used as optical element.Therefore, need utilization can carry out more ultraviolet laser interferometric method, the electron ray photoetching process of microfabrication.These methods are to utilize ultraviolet laser interference light, electron ray to make resist layer exposure, the development forming on substrate, form corrosion-resisting pattern layer, using this corrosion-resisting pattern layer as mask, by formation concaveconvex shapes such as dry etching methods.Yet, when applicable ultraviolet laser interferometric method, electron ray photoetching process, be difficult to process surpassing the wide region of 10cm, there is the mass-produced problem that is not suitable for.

In addition, in patent documentation 6, propose on substrate, to configure stratum granulosum, using stratum granulosum as etching mask, substrate surface is carried out to the method for dry etching.Yet this method is also difficult to process surpassing the wide region of 30cm, has the mass-produced problem that is not suitable for.

Patent documentation 4: Japanese kokai publication sho 63-301988 communique

Patent documentation 5: TOHKEMY 2003-187503 communique

Patent documentation 6: TOHKEMY 2005-279807 communique

Non-patent literature 1: chrysanthemum Tian Jiuxiong, rock Tagayasu Den one work, " optics ", Japanese optics can be issued, the 27th volume, No. 1,, p.12~17 in 1998

The work such as non-patent literature 2:Ned Bowden, " Nature ", No. 393,1998, p.146

Summary of the invention

the problem that invention will solve

The light diffusion body that patent documentation 1,2 is recorded has enough optical diffuse.Yet, the method for irradiating by energy beam that patent documentation 1 is recorded, patent documentation 2 is recorded passes through the problem that method that laser exposes, develops the film of photoresist exists method more complicated.In addition, the anisotropy of the diffusion of the light diffusion body of patent documentation 1,2 is insufficient.

In view of the foregoing, the object of the present invention is to provide can easy manufacture the peak-valley pattern formed sheet that light diffusion body utilizes that can be used as.In addition, the object of the present invention is to provide the manufacture method of the peak-valley pattern formed sheet peak-valley pattern formed sheet can easy manufacture utilizing as light diffusion body.In addition, the object of the present invention is to provide the light diffusion body of the anisotropy excellence of diffusion.Further, the object of the present invention is to provide the light diffusion system that can manufacture easy and in a large number light diffusion body to make the manufacture method with operation sheet and light diffusion body, described light diffusion body is formed with the mode spacing equal with peak-valley pattern formed sheet and the relief pattern of mean depth.

Attempting by concavo-convex diffusion of light, the reflex time controlled, when if being spaced apart between jog is suitable with light wavelength degree, can produce because interference causes painted problem, in addition, during this interval exceedance 10 μ m, may produce can visual identification bright line etc., therefore expect being spaced apart below 20 μ m between jog.Yet the optical sheet that patent documentation 3 is recorded, if be spaced apart several 10 μ m~several 100 μ m between jog, can form stable interval, but want to obtain the interval below 20 desired μ m, more difficult.

In addition, for optical sheet, make sometimes the optical characteristics such as optical diffuse inhomogeneous, thereby its position in regulation is uprised or step-down becomes inhomogeneous.For example, the light guide plate of using in the back light unit of liquid crystal indicator, in order to prevent from mirroring on light guide plate surface the image of the linear light source that is configured in its side end face, improves near the optical diffuse of the bright dipping side surface this linear light source of light guide plate.In addition, in liquid crystal indicator, use have a plurality of linear light sources, point source of light under during type back light unit, make it from improving gradually to the optical diffuse directly over it between linear light source, point source of light.

For surface, form irregular optical sheet, for its optical characteristics is adjusted into inhomogeneous, consideration changes the interval between jog according to position, but the optical sheet of recording in patent documentation 3, interval between jog is made as below 20 μ m, be difficult to interval to change, therefore, thereby the optical sheet that patent documentation 3 is recorded is difficult to make optical characteristics to uprise or step-down becomes inhomogeneous at assigned position.

Therefore, the object of the present invention is to provide objective optics characteristic (optical diffuse etc.) excellence, and be easy to the optical sheet that makes optical characteristics inhomogeneous.In addition, the object of the present invention is to provide target light diffusive excellent, and be easy to the light diffusing patch that makes optical diffuse inhomogeneous.

The light diffusion anisotropy of the diffusion light conductor of recording due to patent documentation 1,2 is insufficient, can not be by anisotropic diffusion fully from possessing light that the light source of the back light unit of these diffusion light conductors sends.Therefore, the brightness of the emergent light penetrating from diffusion light conductor is according to position and difference, and the brightness meeting of the image of liquid crystal indicator is inhomogeneous.

The object of the present invention is to provide and can make the light that sends from light source diffusion light conductor and the back light unit of anisotropic diffusion fully.

The object of the present invention is to provide the peak-valley pattern formed sheet that shows excellent properties while using as optical elements such as antireflection object, polarizers.In addition, the manufacture method that the object of the present invention is to provide can be easy, manufacture the peak-valley pattern formed sheet of this peak-valley pattern formed sheet in large area and in large quantities.In addition, the object of the present invention is to provide antiradar reflectivity antireflection object, in wide wavelength region may, produce the polarizer of equal phase differential.Further, the object of the present invention is to provide the Optical element manufacturing operation sheet of can be easy and manufacturing in large quantities, described optical element is formed with and the mode spacing of peak-valley pattern formed sheet and the equal relief pattern of mean depth.

for the scheme of dealing with problems

The present invention comprises following scheme.

[1] a kind of peak-valley pattern formed sheet, it is characterized in that, described peak-valley pattern formed sheet has resin base material and is arranged on the resin hard layer on a face of described base material, on described hard layer surface, be formed with along the relief pattern of a direction, form the glass transition temperature Tg of the resin of hard layer 2with the glass transition temperature Tg that forms the resin of base material 1poor (Tg 2-Tg 1) be more than 10 ℃, the mode spacing of relief pattern is for surpassing 1 μ m and below 20 μ m, take described mode spacing as 100% time, and the mean depth of relief pattern bottom is more than 10%.

[2] a kind of manufacture method of peak-valley pattern formed sheet, it is characterized in that, have operation surface smoothing, that thickness forms the operation of laminate and makes at least hard layer folded deformation of described laminate for surpassing 0.05 μ m and the resin hard layer below 5.0 μ m is set on a face of resin base material, hard layer consists of than the high 10 ℃ of above resins of the resin that forms base material glass transition temperature.

[3], according to the manufacture method of [2] described peak-valley pattern formed sheet, it uses single shaft direction heat shrink film as resin base material, in making the operation of hard layer folded deformation, and zone of heating compressing tablet and single shaft direction heat shrink film is shunk.

[4] a light diffusion body, it possesses [1] described peak-valley pattern formed sheet, and the base material of described peak-valley pattern formed sheet and hard layer are transparent.

[5] a kind of peak-valley pattern formed sheet, it is characterized in that, described has resin base material and is arranged on the hard layer on a face of described base material, on described hard layer surface, be formed with along the relief pattern of a direction, hard layer consists of metal or metallic compound, the mode spacing of relief pattern is for surpassing 1 μ m and below 20 μ m, usining described mode spacing as 100% time, and the mean depth of relief pattern bottom is more than 10%.

[6] according to the peak-valley pattern formed sheet [5] described, its hard layer consists of metal.

[7], according to the peak-valley pattern formed sheet [5] described, described metal is at least a kind of metal in the choosing group that freely gold, aluminium, silver, carbon, copper, germanium, indium, magnesium, niobium, palladium, lead, platinum, silicon, tin, titanium, vanadium, zinc, bismuth form.

[8] a kind of peak-valley pattern formed sheet, it is characterized in that, have operation surface smoothing, that thickness forms the operation of laminate and makes at least hard layer folded deformation of described laminate for surpassing 0.01 μ m and the metal system below 0.2 μ m or metallic compound hard layer processed is set on a face of resin base material, hard layer consists of metal or metallic compound.

[9] manufacture method of [8] described peak-valley pattern formed sheet, it uses single shaft direction heat shrink film as resin base material, in making the operation of hard layer folded deformation, zone of heating compressing tablet and single shaft direction heat shrink film is shunk.

[10] a kind of light diffusion system is made with operation sheet master, it uses as the mould of manufacturing light diffusion body, it possesses [1], [5], [8] described peak-valley pattern formed sheet, and described light diffusion body is formed with the mode spacing equal with described relief pattern and the relief pattern of mean depth on surface.

[11] manufacture method for light diffusion body, it has following operation: in the light diffusion system [10] Suo Shu, make on the face that is formed with relief pattern with operation sheet master, be coated with the operation of uncured curable resin; After described curable resin is solidified, by the operation of filming and peeling off from operation sheet master after solidifying.

[12] manufacture method for light diffusion body, it has following operation: make sheet thermoplastic resin and light diffusion system claimed in claim 10 make the operation that the face that is formed with relief pattern with operation sheet master contacts; Described sheet thermoplastic resin is pressed on operation sheet master, and heating makes it softening, then cooling operation; With the operation that cooled sheet thermoplasticity resin is peeled off from operation sheet master.

[13] manufacture method for light diffusion body, it has following operation: in light diffusion system claimed in claim 10, make on the face that is formed with relief pattern with operation sheet master the operation of material for the transfer printing of lamination relief pattern; Thereby the relief pattern transfer printing being laminated on relief pattern is peeled off to the operation of molding for 2 operations made from material from aforementioned operation sheet master; In described 2 operations, with the relief pattern with described operation sheet master of molding, contact on the face of a side, be coated with the operation of uncured curable resin; After described curable resin is solidified, the operation that filming of solidifying peeled off with molding from 2 operations.

[14] manufacture method for light diffusion body, is characterized in that, it comprises following operation: in the light diffusion system [10] Suo Shu, make the operation of using material with the face upper strata indentation convex pattern transfer printing that is formed with relief pattern of operation sheet master; Thereby the relief pattern transfer printing being laminated on relief pattern is peeled off to the operation of molding for 2 operations made from material from aforementioned operation sheet master; Make sheet heat-curing resin with the relief pattern with aforementioned operation sheet master of molding, contact the operation of the face contact of a side with described 2 operations; Described sheet thermoplastic resin is pressed on to 2 operations with on molding, and heating makes it softening, then cooling operation; With the operation that cooled sheet thermoplastic resin is peeled off with molding from 2 operations.

[15] optical sheet, is characterized in that, on smooth one side or two sides, decentralized configuration has the irregular relief region of tool.

[16] according to the optical sheet [15] described, it is characterized in that, its relief region is configured unevenly.

[17] light diffusing patch, it possesses [15] described optical sheet.

[18], according to the light diffusing patch [17] described, the concavo-convex mode spacing A in its relief region is over 1 μ m and below 20 μ m, with respect to mode spacing A, the ratio (B/A) of concavo-convex mean depth B is 0.1~3.0.

[19] according to the light diffusing patch [18] described, it is characterized in that, its relief region is point-like and disperses.

[20] a kind of diffusion light conductor, it is characterized in that, this diffusion light conductor consists of the transparent resin layer that is formed with the wavy relief pattern that crawls on a face, the mode spacing of its relief pattern is over 1.0 μ m and below 20 μ m, with respect to mode spacing A, the ratio (B/A) of concavo-convex mean depth B is 0.1~3.0.

[21] a kind of back light unit, it is characterized in that, it has [20] described diffusion light conductor, reflecting plate and light source, described reflecting plate sets in opposite directions with the face of the contrary side of the face with being formed with relief pattern of this diffusion light conductor, and described light source is equipped between described diffusion light conductor and described reflecting plate.

[22] a kind of back light unit, it is characterized in that, it has [20] described diffusion light conductor, reflecting plate and light source, and described reflecting plate sets in opposite directions with the face of the contrary side of the face with being formed with relief pattern of this diffusion light conductor, and described light source is adjacent with any one side of described diffusion light conductor.

[23] a kind of peak-valley pattern formed sheet, it is characterized in that, described resin hard layer that there is resin base material and be arranged at least a portion of described base material outside surface, described hard layer is that the relief pattern with wavy relief pattern forms in replacement page, forms the glass transition temperature Tg of the resin of hard layer 2with the glass transition temperature Tg that forms the resin of base material 1poor (Tg 2-Tg 1) be more than 10 ℃, the mode spacing of relief pattern is below 1 μ m, take described mode spacing as 100% time, the mean depth of relief pattern bottom is more than 10%.

[24] a kind of manufacture method of peak-valley pattern formed sheet, it is characterized in that, have at least one part at resin base material outside surface and the resin hard layer of surface smoothing is set and forms the operation of laminate and make the crawl operation of distortion of at least hard layer of aforementioned layers compressing tablet, hard layer consists of than the high 10 ℃ of above resins of the resin that forms base material glass transition temperature.

[25] antireflection object, it possesses [23] described peak-valley pattern formed sheet.

[26] polarizer, it possesses [23] described peak-valley pattern formed sheet.

[27] an Optical element manufacturing sheet, it uses as the mould of manufacturing optical element, and it possesses the feature of [23] described peak-valley pattern formed sheet, and described optical element has the mode spacing equal with described relief pattern and the relief pattern of mean depth.

invention effect

Concavo-convex of formation of the present invention can be used as light diffusion body and uses, and can manufacture easily.

By the manufacture method of peak-valley pattern formed sheet of the present invention, can manufacture easily the peak-valley pattern formed sheet using as light diffusion body.

The diffusion anisotropy of light diffusion body of the present invention is excellent.

By light diffusion system of the present invention, make the manufacture method with operation sheet and light diffusion body, can manufacture easy and in large quantities light diffusion body, it is formed with the mode spacing equal with relief pattern sheet and the relief pattern of mean depth.

The objective optics excellent of optical sheet of the present invention, and be easy to make its optical characteristics inhomogeneous.

The target light diffusive of light diffusing patch of the present invention is excellent, and is easy to make its optical diffuse inhomogeneous.

By diffusion light conductor of the present invention and back light unit, can make the light that sends from light source anisotropic diffusion fully.

Peak-valley pattern formed sheet of the present invention, suitable to optical element uses such as antireflection object, polarizers.In addition, peak-valley pattern formed sheet of the present invention also suitable work is learned element manufacture operation sheet, for the manufacture of the mould with the optical element of wavy relief pattern.

Therefore the manufacture method of peak-valley pattern formed sheet of the present invention can easily form fine relief pattern in large area on surface, can manufacture easy and in large quantities the suitable peak-valley pattern formed sheet as optical element etc.

Antireflection object reflectivity of the present invention is low, excellent performance.

Polarizer of the present invention, can produce in wide wavelength coverage equal phase differential, excellent performance.

The Optical element manufacturing of the application of the invention operation sheet, can manufacture optical element easy and in large quantities, and it has the mode spacing equal with peak-valley pattern formed sheet and the relief pattern of mean depth.

Accompanying drawing explanation

Fig. 1 shows the amplification stereogram that the part of an embodiment of peak-valley pattern formed sheet of the present invention has been amplified.

Fig. 2 is the sectional view after the peak-valley pattern formed sheet of Fig. 1 is cut off along the vertical direction of the formation direction with relief pattern.

Fig. 3 is to the take a picture greyscale transformation image of the image that obtains of the surface of relief pattern by surface optics microscope.

Fig. 4 carries out by the image of Fig. 3 the image obtaining after Fourier transform.

Fig. 5 is the chart obtaining with respect to the distance mapping from circle ring center with brightness in the image of Fig. 4.

Fig. 6 is to the boost line L in the image of Fig. 4 3on the chart that obtains of brightness mapping.

Fig. 7 represents the sectional view of laminate of an embodiment of the manufacture method of peak-valley pattern formed sheet of the present invention.

Fig. 8 is to using the figure that example describes of manufacture method of the light diffusion body of peak-valley pattern formed sheet of the present invention.

Fig. 9 is to the take a picture greyscale transformation image of the image that obtains of the surface of the relief pattern of comparative example 4 by surface optics microscope.

Figure 10 carries out by the image of Fig. 9 the image obtaining after Fourier transform.

Figure 11 is the figure obtaining with respect to the distance mapping from circle ring center with brightness in the image of Figure 10.

Figure 12 is to the boost line L in the image of Figure 10 5on the chart that obtains of brightness mapping.

Figure 13 means the stereographic map of the 1st embodiment of optical sheet of the present invention.

The sectional view of the printed sheet that Figure 14 is used while meaning the optical sheet of manufacturing shown in Figure 13.

Figure 15 is the transmission electron microscope photo on printed sheet surface.

Figure 16 is the transmission electron microscope photo on optical sheet surface.

Figure 17 means the stereographic map of the 2nd embodiment of optical sheet of the present invention.

Figure 18 means the stereographic map of the 3rd embodiment of optical sheet of the present invention.

Figure 19 means the stereographic map of the 4th embodiment of optical sheet of the present invention.

Figure 20 means the sectional view of other embodiments of diffusion light conductor of the present invention.

Figure 21 means the sectional view of the 1st embodiment of back light unit of the present invention.

Figure 22 means the sectional view of the 2nd embodiment of back light unit of the present invention.

Figure 23 means the amplification stereogram after a part for an embodiment of peak-valley pattern formed sheet of the present invention is amplified.

Figure 24 is the greyscale transformation image of the image that obtains not taking a picture along the surface of the relief pattern of specific direction by atomic force microscope.

Figure 25 carries out to the image of Figure 24 the image obtaining after Fourier transform.

Figure 26 is the figure that in the image of Figure 25, brightness obtains with respect to the distance mapping from circle ring center.

reference numeral

10 peak-valley pattern formed sheets; 10a laminate; 11 base materials (transparent resin layer); 11a heat shrink film; 12 hard layers; 12a relief pattern; 12b bottom; The resin hard layer of 13 surface smoothings (surface smoothing hard layer); 210a, 210b, 210c, 210d optical sheet; 211 smooth one sides; 212,215,216,217 relief region; 213 heat shrink films; 214 relief region formation protuberances; 100,200 back light units; 310 diffusion light conductors; 315 surfaces; 316 the insides; 320 reflecting plates; 330 light sources; 340 diffusion films; 350 prismatic lenses; 360 brightness rising films

Embodiment

1. peak-valley pattern formed sheet

(peak-valley pattern formed sheet-1)

Peak-valley pattern formed sheet of the present invention embodiment is described.

Fig. 1 and Fig. 2 show the peak-valley pattern formed sheet of present embodiment.The peak-valley pattern formed sheet 10 of present embodiment has base material 11 and is arranged at the hard layer 12 on a face of base material 11, and hard layer 12 has relief pattern 12a.

The relief pattern 12a of peak-valley pattern formed sheet 10 has along roughly unidirectional wavy concavo-convex, and this is wavy concavo-convex for crawling.In addition, the top of the protuberance of the relief pattern 12a of present embodiment is with round and smooth.

Form the resin of hard layer 12 (hereinafter referred to as the 2nd resin.) glass transition temperature Tg 2with the resin that forms base material 11 (hereinafter referred to as the 1st resin.) glass transition temperature Tg 1poor (Tg 2-Tg 1) be 10 ℃ above, be preferably 20 ℃ above, more preferably more than 30 ℃.By making (Tg 2-Tg 1) difference be more than 10 ℃, can be at Tg 2with Tg 1between temperature under easily process.By Tg 2with Tg 1between temperature during as processing temperature, can process under than the high condition of the Young modulus of hard layer 12 in the Young modulus that makes base material 11, result easily forms relief pattern 12a on hard layer 12.

In addition, due to from the viewpoint of economy, there is no need to use Tg 2surpass the resin of 400 ℃, do not have Tg 1lower than the resin of-150 ℃, therefore, preferred (Tg 2-Tg 1) be below 550 ℃, more preferably below 200 ℃.

From can easily forming relief pattern 12a, consider, under the processing temperature when manufacturing peak-valley pattern formed sheet 10, the difference of the Young modulus of base material 11 and hard layer 12 is preferably 0.01~300GPa, more preferably 0.1~10GPa.

Here said processing temperature refers to, for example, and the heating-up temperature while carrying out thermal shrinkage in the manufacture method of peak-valley pattern formed sheet described later.In addition, Young modulus is the value recording based on JIS K 7113-1995.

The glass transition temperature Tg of the 1st resin 1be preferably-150~300 ℃, more preferably-120~200 ℃.Because there is not glass transition temperature Tg 1lower than the resin of-150 ℃, the glass transition temperature Tg of the 1st resin 1be 300 ℃ when following, processing temperature (Tg that can be when manufacturing peak-valley pattern formed sheet 10 2with Tg 1between temperature) under easily heat.

Under processing temperature when manufacturing peak-valley pattern formed sheet 10, the Young modulus of the 1st resin is preferably 0.01~100MPa, more preferably 0.1~10MPa.The Young modulus of the 1st resin is 0.01MPa when above, has and can be used as the hardness that base material 11 is used, and for 100MPa is when following, has and can when hard layer 12 deforms, follow the pliability that it deforms.

As the 1st resin, for example can enumerate, the polyester such as polyethylene terephthalate, the polyolefin such as tygon, polypropylene, the resins such as the organic siliconresins such as the polystyrene resins such as styrene-butadiene block copolymer, Polyvinylchloride, polyvinylidene chloride, dimethyl silicone polymer, fluororesin, ABS resin, polyamide, acrylic resin, polycarbonate, poly-cycloolefin.

The glass transition temperature Tg of the 2nd resin 2be preferably 40~400 ℃, more preferably 80~250 ℃.Because, the glass transition temperature Tg of the 2nd resin 2be 40 ℃ when above, can the processing temperature when manufacturing peak-valley pattern formed sheet 10 be made as room temperature or more than room temperature, thus useful, from the viewpoint of economy, there is no need to use glass transition temperature Tg 2surpass the resin of 400 ℃ as the 2nd resin.

Under processing temperature when manufacturing peak-valley pattern formed sheet 10, the Young modulus of the 2nd resin is preferably 0.01~300GPa, 0.1~10GPa more preferably.Because, the Young modulus of the 2nd resin is that 0.01GPa is when above, can obtain than the hardness more fully of the Young modulus under the processing temperature of the 1st resin, after forming relief pattern 12a, have for maintaining the enough hardness of relief pattern, from the viewpoint of economy, the resin that there is no need to use Young modulus to surpass 300GPa is as the 2nd resin.

As the 2nd resin, although also the difference with the kind of the 1st resin, can be used such as polyvinyl alcohol (PVA), polystyrene, acrylic resin, styrene-propene acid copolymer, styrene-acrylonitrile copolymer, polyethylene terephthalate, polybutylene terephthalate, Polyethylene Naphthalate, polycarbonate, polyethersulfone, fluororesin etc.Wherein, from having antifouling property concurrently, consider, preferably fluororesin.

The thickness of base material 11 is preferably 0.3~500 μ m.The thickness of base material 11 is 0.3 μ m when above, and peak-valley pattern formed sheet 10 is difficult for broken, is 500 μ m when following, easily slimming of peak-valley pattern formed sheet 10.

In addition, thickness also can be set is that the resin supporter of 5~500 μ m is for support base material 11.In addition, when as light diffusion body, in order to make optical diffuse higher, can on base material 11, attach the film that contains micro air bubble.

While using peak-valley pattern formed sheet 10 as light diffusion body, take and further improve light diffusion effect as object, can can not have in the scope of large infringement optical characteristics such as light transmissions, in base material 11, contain the light diffusing agent being formed by mineral compound, the organic light diffusing agent being formed by organic compound.

As inorganic light diffuser, can enumerate monox, white carbon, talcum, magnesium oxide, zinc paste, titanium dioxide, calcium carbonate, aluminium hydroxide, barium sulphate, glass, mica etc.

As organic light diffusing agent, can enumerate styrenic particle, acrylic acid series polymeric compounds particle, siloxane-based polymers particle etc.These light diffusing agents can be used singly or in combination of two or more thereof.

Never easily damage light transmission and consider, with respect to 100 mass parts the 1st resin, the content of light diffusing agent is preferably below 10 mass parts.

In addition, when peak-valley pattern formed sheet 10 is used as to light diffusion body, take and further improve diffusion effect as object, can, not having in the scope of large infringement optical characteristics such as light transmissions, in base material 11, contain micro air bubble.Micro air bubble is difficult for reducing light transmission less to the absorption of light.

As the formation method of micro air bubble, be useful in the method (for example, Japanese kokai publication hei 5-212811 communique, the disclosed method of Japanese kokai publication hei 6-107842 communique) of sneaking into gas-development agent in base material 11; Acrylic acid series Foamex is foamed and processes its method that contains micro air bubble (for example, the disclosed method of TOHKEMY 2004-2812 communique) etc. that makes.Further, from carrying out more uniform face, irradiate and consider, preferably make foam unevenly in the specific position method of (for example, the disclosed method of TOHKEMY 2006-124499 communique) of micro air bubble.

In addition, can be used in combination aforementioned light diffusing agent and micro air bubble.

The thickness of hard layer 12 is preferably over 0.05 μ m and below 5 μ m, more preferably 0.1~2 μ m.The thickness of hard layer is for surpassing 0.05 μ m and when following, easily manufacturing as described later peak-valley pattern formed sheet at 5 μ m.

In addition, take that to improve adaptation, form finer structure be object, can between base material 11 and hard layer 12, form prime coat.

The mode spacing A of the relief pattern 12a of peak-valley pattern formed sheet 10 is for surpassing 1 μ m and below 20 μ m, being preferably over 1 μ m and below 10 μ m.Mode spacing A is during lower than 1 μ m, light transmission, and while surpassing 20 μ m, optical diffuse variation.

Take mode spacing A as 100% time, and the mean depth B of the bottom 12b of relief pattern 12a is more than 10% (that is, length breadth ratio is more than 0.1), is preferably more than 30% (that is, length breadth ratio is more than 0.3).The mode spacing A of take is 100%, and mean depth B lower than 10% time, is used even if make peak-valley pattern formed sheet 10 as light diffusion system with operation sheet master, is also difficult to obtain the light diffusion body that optical diffuse is high.

In addition, from the viewpoint of easy formation relief pattern 12a, consider, take mode spacing A as 100% time, mean depth B is preferably (that is, length breadth ratio is below 3.0) below 300%, more preferably (that is, length breadth ratio is below 2.0) below 200%.

Here said bottom 12b refers to the minimum value of the recess of relief pattern 12a, mean depth B refers to, when the cross section (with reference to Fig. 2) of observing after along its length peak-valley pattern formed sheet 10 being cut off, from the parallel datum line L of the face direction with peak-valley pattern formed sheet 10 integral body 1length B to each protuberance top 1, B 2, B 3... mean value (B aV), and from datum line L 1arrive the length b of the bottom of each recess 1, b 2, b 3... mean value (b aV) poor (b aV-B aV).

The top of aforementioned protuberance and the bottom of aforementioned recess are the parts that the opposition side with base material 11 sides at hard layer 12 joins.

As the method for measuring mean depth B, adopt by the takes a picture image in cross section of the relief pattern that obtains of atomic force microscope and measure the degree of depth bottom each, try to achieve the method for their mean value.

From obtaining the viewpoint of the light diffusion body that light diffusing anisotropy is high, preferably relief pattern 12a is crawling to a certain degree, and the spacing between adjacent protuberance is disperseed along the direction of relief pattern 12a.Here, the dispersion of the orientation of relief pattern 12a is called the degree of orientation.The degree of orientation is larger, is orientated overstepping the bounds of propriety loose.This degree of orientation is tried to achieve by the following method.

First, by surface optics microscope, to the taking a picture above of relief pattern, this image is transformed to gray scale file (for example, tiff form etc.).In the image (with reference to Fig. 3) of gray scale file, whiteness is lower, represents that the bottom of recess is darker (whiteness is higher, represents that the top of protuberance is higher).Then, the image of gray scale file is carried out to Fourier transform.Fig. 4 shows the image after Fourier transform.From the center of the image of Fig. 4, expand to spacing that the white portion of both sides comprised relief pattern 12a and towards information.

Then, from the picture centre along continuous straight runs of Fig. 4, draw boost line L 2, to the brightness mapping (with reference to Fig. 5) in this boost line.The transverse axis of the figure of Fig. 5 represents the inverse of spacing, and the longitudinal axis represents frequency, and the 1/X reciprocal of the value X of frequency maximum represents the mode spacing of relief pattern 12a.

Then,, in Fig. 4, draw and boost line L 2boost line L perpendicular to value X part 3, to this boost line L 3on brightness mapping (with reference to Fig. 6).Wherein, for can more various concaveconvex structures, the transverse axis of Fig. 6 be divided by the numerical value after the value of X.The transverse axis of Fig. 6 means that the longitudinal axis represents frequency with respect to the index (orientation) of the inclined degree of concavo-convex formation direction (above-below direction in Fig. 3).In the mapping of Fig. 6, the half breadth W of peak value 1(frequency is the peak width on the height of a peaked half) represents the degree of orientation of relief pattern.Half value broadband W 1larger, represent that the spacing of crawling is overstepping the bounds of propriety loose.

The above-mentioned degree of orientation is preferably 0.3~1.0.Because the degree of orientation is 0.3~1.0 o'clock, the spacing of relief pattern 12a is disperseed larger, and this peak-valley pattern formed sheet and the optical diffuse of the light diffusion body that uses this peak-valley pattern formed sheet to use as operation sheet master are become to higher.Because the degree of orientation surpasses at 1.0 o'clock, it is unordered that the direction of relief pattern becomes to a certain extent, although therefore optical diffuse can uprise, anisotropy has the tendency of step-down.

In order to make the degree of orientation, be 0.3~1.0, when manufacturing peak-valley pattern formed sheet, select suitable method, make it be subject to the effect of necessary compression stress.

Form the glass transition temperature Tg of the 2nd resin of hard layer 12 2with the glass transition temperature Tg that forms the 1st resin of base material 11 1poor (Tg 2-Tg 1) be 10 ℃ of above peak-valley pattern formed sheets of the present invention 10, can make by the manufacture method of peak-valley pattern formed sheet described later, therefore can manufacture easily.

In addition, after the researchs such as the inventor, found that, when base material 11 and hard layer 12 are all transparent, the mode spacing A of the relief pattern 12a of peak-valley pattern formed sheet 10 of the present invention is over 1 μ m and below 20 μ m, take aforementioned mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%, and it has sufficient optical diffuse, therefore can be used as light diffusion body and uses.

But peak-valley pattern formed sheet of the present invention is not subject to the restriction of above-mentioned embodiment.For example, the top of the protuberance of the relief pattern of peak-valley pattern formed sheet of the present invention can be also sharp.Yet from the viewpoint that the anisotropy of diffusion becomes higher is considered, the shape of the protuberance of relief pattern is preferably top with round and smooth.

(peak-valley pattern formed sheet-2)

Further, after the researchs such as the inventor, found that, by making the mode spacing A of relief pattern 12a, be below 1 μ m, below 0.04 μ m, take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%, when above in particular for 100%, as optical element, can bring into play excellent performance.Particularly, while finding to use peak-valley pattern formed sheet 10 as antireflection object, reflectivity can be lower, in addition, while using as polarizer, can produce in wide scope equal phase differential.

This be because, the mode spacing A of relief pattern 12a is that 1 μ m is short so below, and take mode spacing A as 100% time, mean depth B is more than 10% dark like this.That is, A is short for mode spacing, identical with visible light wavelength or be below it, is difficult for producing due to concavo-convex visible diffraction of light, the diffusion causing.And B is dark due to mean depth, the middle refractive index continually varying part of through-thickness is elongated, can significantly bring into play the effect that suppresses light reflection.In addition, due to mode spacing, A is short, and mean depth B is dark, through-thickness, and the part that the mutually different air of refractive index and peak-valley pattern formed sheet configure is mutually elongated, and the anisotropic part of display optical is elongated, therefore can produce phase differential.Further, the phase differential being produced by such relief pattern 12a is roughly the same in wide scope.

At this moment, with respect to base material 11, the refractive index of hard layer 12 is low, but because can obtain high preventing reflection characteristic, so preferably.

Further, the thickness of hard layer 12 is preferably 1~100nm.The thickness of hard layer 12 is 1nm when above, and hard layer 12 is difficult for producing defect, and thickness is 100nm when following, can fully guarantee the light transmission of hard layer 12.

In addition, the thickness of hard layer 12 more preferably, below 50nm, is particularly preferably below 20nm.The thickness of hard layer 12 is 50nm when following, easily manufactures the such peak-valley pattern formed sheet of aftermentioned.

In addition, take that to improve adaptation, form finer structure be object, can between base material 11 and hard layer 12, form prime coat.

Further, also can on hard layer 12, resin bed be set.

The mode spacing A of the relief pattern 12a of peak-valley pattern formed sheet 10 is below 1 μ m, is preferably below 0.4 μ m.In addition, from can easily forming the viewpoint of relief pattern 12a, consider, more than mode spacing A is preferably 0.05 μ m.

Each spacing A of relief pattern 12a 1, A 2, A 3... be all preferably mode spacing A ± 60% scope, in more preferably ± 30% scope.Each spacing be mode spacing A's ± 60% scope in time, spacing becomes evenly, as optical element, can bring into play more excellent performance.

In addition, meeting mode spacing A, be under the condition below 1 μ m, each spacing A 1, A 2, A 3... can change continuously.

Each depth B of relief pattern 12a 1, B 2, B 3... be all preferably mean depth B ± 60% scope in, in more preferably ± 30% scope.Each spacing be mean depth B's ± 60% scope in time, the degree of depth becomes evenly, as optical element, can bring into play more excellent performance.

In addition, take mode spacing A as 100% time mean depth B under more than 10% condition, each depth B 1, B 2, B 3... can change continuously.

As described later, peak-valley pattern formed sheet 10, can also be as utilizations such as super-hydrophobic or super hydrophilic sheet except going for the optical elements such as antireflection object, polarizer, Optical element manufacturing with operation sheet.

In addition, peak-valley pattern formed sheet is not subject to the restriction of above-mentioned embodiment.For example, in above-mentioned embodiment, hard layer has periodic wavy relief pattern along the Width of this peak-valley pattern formed sheet, but except this relief pattern, also can have along the periodic wavy relief pattern of the length direction of peak-valley pattern formed sheet.Further, in most cases, hard layer also can have not the wavy relief pattern along specific direction.Under these situations, because the mode spacing of relief pattern is below 1 μ m, former when stating mode spacing and being 100%, the mean depth of relief pattern bottom is more than 10%, as optical element, shows excellent performance.

From the viewpoint of refractive index, consider, the top of protuberance is preferably sharp, but top also can be with round and smooth.

Relief pattern when not along specific direction, is tried to achieve mode spacing by following method.First, by atomic force microscope, to the taking a picture above of relief pattern, this image is transformed to gray scale file (for example, tiff form etc.).

In the image (with reference to Figure 24) of gray scale file, whiteness is lower, represents that the bottom of recess is darker (whiteness is higher, represents that the top of protuberance is higher).Then, the image of gray scale file is carried out to Fourier transform.Figure 25 shows the image after Fourier transform.In image after Fourier transform, the directivity of the direction indication gray scale of observing from the center of white portion, in addition, the inverse of the distance from center to white portion represents the cycle of gray level image.Relief pattern during not along specific direction, becomes the image of white annulus as shown in figure 25.Then, the image Shang Cong circle ring center after Fourier transform draws the boost line L of linearity laterally 2, with brightness (Y-axis) with respect to excentric distance (X-axis) mapping (with reference to Figure 26).Then, read the value r that shows peaked X-axis in this figure.The inverse of this r (1/r) is mode spacing.

(peak-valley pattern formed sheet-3)

The viewpoint of peak-valley pattern formed sheet 10 of being easy to get calmly considers, when hard layer 12 consists of metal or metallic compound, and preferable alloy.

From Young modulus, do not become too high, the viewpoint that more easily forms relief pattern 12a is considered, as metal, be preferably at least a kind of metal in the choosing group that freely gold, aluminium, silver, carbon, copper, germanium, indium, magnesium, niobium, palladium, lead, platinum, silicon, tin, titanium, vanadium, zinc, bismuth form.Here said metal also comprises semimetal.

Because same reason, as metallic compound, be preferably at least a kind of metallic compound selecting in the group that free titanium dioxide, aluminium oxide, zinc paste, magnesium oxide, tin oxide, cupric oxide, indium oxide, cadmium oxide, massicot, monox, barium fluoride, calcium fluoride, magnesium fluoride, zinc sulphide, gallium arsenide form.

In addition, when hard layer 12 consists of metal, layer surface can oxidation by air form air oxidation film, but in the present invention, the layer after such layer on surface of metal oxidation by air is also regarded the layer consisting of metal as.

The thickness of hard layer 12 be preferably surpass 0.01 μ m and below 0.2 μ m, 0.02~0.1 μ m more preferably.The thickness of hard layer is for surpassing 0.01 μ m and when following, as described later, easily manufacturing peak-valley pattern formed sheet at 0.2 μ m.

In addition, take that to improve adaptation, form finer structure be object, can between base material 11 and hard layer 12, form prime coat.

The mode spacing A of the relief pattern 12a of peak-valley pattern formed sheet 10 is for surpassing 1 μ m and below 20 μ m, being preferably over 1 μ m and below 10 μ m.Mode spacing A is during lower than 1 μ m, and while surpassing 20 μ m, even if make peak-valley pattern formed sheet 10 as light diffusion system with operation sheet master, uses, and is also difficult to obtain the light diffusion body that optical diffuse is high.

2. the manufacture method of peak-valley pattern formed sheet

The manufacture method of peak-valley pattern formed sheet of the present invention embodiment is described.

The manufacture method of the peak-valley pattern formed sheet of present embodiment comprises following operation: as shown in Figure 7, the hard layer 13 that surface smoothing is set on a face of the heat shrink film 11a as resin base material (is called surface smoothing hard layer 13 below.), the operation that forms laminate 10a (is called the 1st operation below.) and make heat shrink film 11a heat shrink, make the operation of at least surface smoothing hard layer 13 folded deformations of laminate 10a (below, be called the 2nd operation.)。

Here, surface smoothing hard layer 13 refers to, the center line average roughness described in JIS BO601 is the layer below 0.1 μ m.

The 1st operation-1

In the 1st operation, resinous surface smoothing hard layer 13 is set on a face of heat shrink film 11a and the method for formation laminate 10a, for example can enumerate, by spin coater, excellent painting machine etc., at a face of heat shrink film 11a, be coated with solution or the dispersion liquid of the 2nd resin, then make the method for solvent seasoning; At a surface layer of heat shrink film 11a, press the method for the surface smoothing hard layer 13 of making in advance etc.

As heat shrink film 11a, can use such as polyethylene terephthalate is shrinkable film, polystyrene shrinkable film, polyolefin shrinkable film, polyvinyl chloride shrinkable film etc.

In shrinkable film, preferably shrink 50~70% film.While using the shrinkable film that shrinks 50~70%, deformation rate can be for more than 50%, can easily manufacture peak-valley pattern formed sheet 10, the mode spacing A that makes its relief pattern 12a is over 1 μ m and below 20 μ m, take mode spacing A as 100% time, and the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.Further, also can easily manufacture peak-valley pattern formed sheet 10, make it take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 100%.

The deformation rate here refers to, (the rear length of length-distortion before distortion)/(length before distortion) * 100 (%).Or, (length after distortion)/(length before distortion) * 100 (%).

In addition, by following operation, can make take mode spacing A as 100% time, the mean depth B of relief pattern 12a is 300%.

On heat shrink film 11a, coated glass transition temperature, lower than the primer resin layer of heat shrink film 11a, is formed on the laminate that is provided with surface hard smooth layer 13 on this primer resin layer.Thereby make this laminate heat shrink form peak-valley pattern formed sheet.

Heat shrink film 11a after heat shrink is peeled off from laminate, then other the heat shrink film of fitting, laminate formed.With make 1 heat shrink film heating contraction phase ratio, by making this laminate heat shrink, can make mean depth B become large.By repeatedly repeating this operation, can take mode spacing A as 100% time, the mean depth B of relief pattern 12a is 300%.

The thickness of surface smoothing hard layer 13 of the present invention is for surpassing 0.05 μ m and below 5.0 μ m, being preferably 0.1~1.0 μ m.By making the thickness of surface smoothing hard layer 13, be in aforementioned range, can guarantee that the mode spacing A of relief pattern 12a is really in surpassing 1 μ m and the scope below 20 μ m.

Yet the thickness of surface smoothing hard layer 13 is 0.05 μ m when following, mode spacing A may become below 1 μ m, and while surpassing 5 μ m, mode spacing A may surpass 20 μ m.

In addition, surface smoothing hard layer 13 of the present invention consists of than the high 10 ℃ of above resins (the 2nd resin) of the resin (the 1st resin) that forms heat shrink film glass transition temperature.By making the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, be aforementioned relation, can make the mode spacing A of relief pattern 12a really in surpassing 1 μ m and the scope below 20 μ m.

The thickness of surface smoothing hard layer 13 also can change continuously.When the thickness of surface smoothing hard layer 13 is variation continuously, the spacing of the relief pattern 12a forming after compression and the degree of depth are variation continuously.

In order more easily to form relief pattern 12a, the Young modulus of the surface smoothing hard layer 13 of this manufacture method is preferably 0.01~300GPa, more preferably 0.1~10GPa.

While making laminate 10a distortion, preferably with more than 5% deformation rate, make 13 distortion of surface smoothing hard layer.While making surface smoothing hard layer 13 distortion with more than 5% deformation rate, can be easily take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.

Further, more preferably with more than 50% deformation rate, make 13 distortion of surface smoothing hard layer.While making surface smoothing hard layer 13 distortion with more than 50% deformation rate, can be easily take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 100%.

The 1st operation-2

In addition, when hard layer 12 consists of metal or metallic compound, as the method that forms laminate 10a, for example can enumerate the method for evaporation metal, metallic compound on a face of heat shrink film 11a; At a surface layer of heat shrink film 11a, press the method for the surface smoothing hard layer 13 of making in advance etc.

In order to make this manufacture method can more easily form relief pattern 12a, the Young modulus of surface smoothing hard layer 13 is preferably 0.1~500GPa, more preferably 1~150GPa.

In order to make the Young modulus of surface smoothing hard layer 13 in aforementioned range, surface smoothing hard layer 13 preferably consists of at least a kind of metal being selected from the group that gold, aluminium, silver, carbon, copper, germanium, indium, magnesium, niobium, palladium, lead, platinum, silicon, tin, titanium, vanadium, zinc, bismuth form.Or surface smoothing hard layer 13 preferably consists of at least a kind of metallic compound being selected from the group that titanium dioxide, aluminium oxide, zinc paste, magnesium oxide, tin oxide, cupric oxide, indium oxide, cadmium oxide, massicot, monox, barium fluoride, calcium fluoride, magnesium fluoride, zinc sulphide, gallium arsenide form.

Here, Young modulus, based on JIS Z 2280-1993 " the high temperature Young modulus test method of metal material ", is the value recording at 23 ℃ by temperature change.When hard layer consists of metallic compound too.

The thickness of surface smoothing hard layer 13 is for surpassing 0.01 μ m and below 0.2 μ m, being preferably 0.02~0.1 μ m.By making the thickness of surface smoothing hard layer 13, be in aforementioned range, can guarantee that the mode spacing A of relief pattern 12a is really in surpassing 1 μ m and the scope below 20 μ m.Yet the thickness of surface smoothing hard layer 13 is during lower than 0.01 μ m, mode spacing A becomes below 1 μ m, and while surpassing 0.2 μ m, mode spacing A surpasses 20 μ m.

In addition, the thickness of surface smoothing hard layer 13 also can change continuously.When the thickness of surface smoothing hard layer 13 is variation continuously, the spacing of the relief pattern 12a forming after compression and the degree of depth are variation continuously.

While making laminate 10a distortion, preferably with more than 5% deformation rate, make 13 distortion of surface smoothing hard layer.While making surface smoothing hard layer 13 distortion with more than 5% deformation rate, can be easily take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.

Further, more preferably with more than 50% deformation rate, make 13 distortion of surface smoothing hard layer.While making surface smoothing hard layer 13 distortion with more than 50% deformation rate, can be easily take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 100%.

The 2nd operation-1

In the 2nd operation, by making heat shrink film 11a thermal shrinkage, on surface smoothing hard layer 13, along the direction vertical with shrinkage direction, form wavy relief pattern 12a, obtain hard layer 12.

Heating means while making heat shrink film 11a heat shrink can be enumerated hot blast, steam or the method passed through in hot water etc., wherein, from making the viewpoint that film evenly shrinks consider, the method for preferably passing through in hot water.

Heating-up temperature while making heat shrink film 11a thermal shrinkage is preferably according to the kind of the heat shrink film using and the spacing of target relief pattern 12a and the selection of the appropriate depth of bottom 12b.

In this manufacture method, the thickness of surface smoothing hard layer 13 is thinner, and the Young modulus of surface smoothing hard layer 13 is lower, and the mode spacing A of relief pattern 12a becomes less, and the deformation rate of base material is higher, and it is darker that mean depth B becomes.Therefore,, in order to make relief pattern 12a for mode spacing A, the mean depth B of regulation, need suitable selection aforementioned condition.

The manufacture method of peak-valley pattern formed sheet described above, higher more than 10 ℃ than the 1st resin that forms heat shrink film 11a owing to forming the glass transition temperature of the 2nd resin of surface smoothing hard layer 13, at the temperature between the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, it is higher than heat shrink film 11a that the Young modulus of surface smoothing hard layer 13 becomes.And, because the thickness of surface smoothing hard layer 13 is for surpassing 0.05 μ m and below 5.0 μ m, at the temperature between the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, add man-hour, along with the increase of thickness, surface smoothing hard layer 13 also occurs folding.Further, due to surface smoothing hard layer 13, to be laminated to heat shrink film 11a upper, thus the stress equilibrium that produces of the contraction of heat shrink film 11a be distributed in whole.Therefore, by the present invention, surface smoothing hard layer 13 folded deformations can be made, the peak-valley pattern formed sheet 10 as the excellent performance of light diffusion body can be manufactured easy and in large area.

And by this manufacture method, the mode spacing A that can easily make relief pattern 12a is for surpassing 1 μ m and below 20 μ m, make take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.

In addition, as the manufacture method of peak-valley pattern formed sheet, the method for following (1)~(4) also can be suitable for.

(1) whole at base material 11 arranges surface smoothing hard layer 13, forms laminate 10a, makes the method for a laminate 10a integral body direction compression surfacewise.

The glass transition temperature of base material 11 is during lower than room temperature, the compression of laminate 10a is at room temperature carried out, the glass transition temperature of base material 11 is room temperature when above, and laminate 10a is compressed in higher than carrying out at the glass transition temperature of base material 11 and the temperature lower than the glass transition temperature of surface smoothing hard layer 13.

(2) whole at base material 11 arranges surface smoothing hard layer 13, form laminate 10a, along a direction tensile layer compressing tablet 10a, its vertical direction along draw direction is shunk, thereby make the method for a surface smoothing hard layer 13 direction compression surfacewise.

The glass transition temperature of base material 11 is during lower than room temperature, the stretching of laminate 10a is at room temperature carried out, the glass transition temperature of base material 11 is room temperature when above, and laminate 10a is stretching in higher than carrying out at the glass transition temperature of base material 11 and the temperature lower than the glass transition temperature of surface smoothing hard layer 13.

(3) lamination surface smoothing hard layer 13 on the base material 11 forming at the ionization radial line curable resin by uncured, form laminate 10a, by irradiating ionization radial line, carry out curing substrate 11, base material 11 is shunk, thus the method for the surface smoothing hard layer 13 that makes lamination on base material 11 at least one direction compression surfacewise.

(4) by solvent swell and on dilated base material 11, the level and smooth hard layer 13 of laminating surface, form laminate 10a, by the dry solvent of removing in base material 11, laminate 10a is shunk, thereby make to be laminated at least one direction compression surfacewise of surface smoothing hard layer 13 on base material 11.

In method (1), as the method that forms laminate 10a, for example can enumerate, by solution or the dispersion liquid of the coating resin on a face of base material 11 such as spin coater, excellent painting machine, then make the method for solvent seasoning; The method of the surface smoothing hard layer 13 that lamination is made in advance on a face of base material 11 etc.

As the method that makes direction compression surfacewise of laminate 10a integral body, for example can enumerate, with end of the holding sheet compressing tablet 10a such as vice and with the end of its opposition side, make the method for its compression etc.

In method (2), as the method along a direction tensile layer compressing tablet 10a, for example, use the method for an end of drawing machine tensile layer compressing tablet 10a and the end of its opposition side etc.

In method (3), as ionization radial line curable resin, can enumerate ultraviolet curing resin, electron ray curing type resin etc.

In method (4), solvent is according to the suitable selection of the kind of the 1st resin.According to the kind of solvent, select suitable solvent seasoning temperature.

Surface smoothing hard layer 13 in method (2)~(4) can be used the composition identical with the material using in method (1), can be identical thickness.In addition, the formation method of laminate 10a can be the same with method (1), is useful in face coating resin solution or the dispersion liquid of base material 11, then make the method for solvent seasoning; The method of the surface smoothing hard layer 13 that lamination is made in advance on a face of base material 11.

The 2nd operation-2

The mode spacing A of relief pattern 12a is 1 μ m when following, and for method (1), the thickness of surface smoothing hard layer 13 is preferably below 50nm, more preferably below 20nm.The thickness of surface smoothing hard layer 13 is 50mm when following, and the mode spacing A of relief pattern 12a can be below 1 μ m really.

In addition, the hard layer 12 from compression is difficult for producing the viewpoint consideration of defect, more than surface smoothing hard layer 13 is preferably 1nm.

At this moment, surface smoothing hard layer 13 consists of than high 10 ℃ of the 2nd above resins of the 1st resin glass transition temperature.By surface smoothing hard layer 13 is consisted of than high 10 ℃ of the 2nd above resins of the 1st resin glass transition temperature, when compression, make base material 11 distortion, and make surface smoothing hard layer 13 form the distortion of crawling of wavy bending, can easily form relief pattern 12a.

In the manufacture method of peak-valley pattern formed sheet described above, higher more than 10 ℃ than the 1st resin that forms base material 11 owing to forming the glass transition temperature of the 2nd resin of surface smoothing hard layer 13, at the temperature between the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, the Young modulus of surface smoothing hard layer 13 becomes than base material 11 height.Therefore, at the temperature between the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, add man-hour, along with the increase of thickness, surface smoothing hard layer 13 also occurs folding.Further, because surface smoothing hard layer 13 is laminated on base material 11, due to compression, the stress equilibrium that shrink to produce be distributed in integral body.Therefore, by the present invention, can easily make its distortion of crawling, manufacture peak-valley pattern formed sheet 10, can manufacture the peak-valley pattern formed sheet 10 as the excellent performance of optical element easy and in large area.

And, by this manufacture method, can easily make the mode spacing A of relief pattern 12a shorten, and mean depth B is deepened.Particularly, the mode spacing A that can easily make relief pattern 12a is below 1 μ m, take mode spacing A as 100% time, and the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.

Further, by this manufacture method, can easily make each spacing A in relief pattern 12a 1, A 2, A 3... and each depth B 1, B 2, B 3... evenly.

The 2nd operation-3

As manufacturing surface smoothing hard layer, while using metal or metallic compound to manufacture, in the 2nd operation, by making heat shrink film 11a thermal shrinkage, in the direction vertical with shrinkage direction of surface smoothing hard layer 13, form wavy relief pattern 12a, obtain hard layer 12.

Heating means when making heat shrink film 11a heat shrink, can enumerate hot blast, steam or the method passed through in hot water etc., wherein, from making its viewpoint of evenly shrinking consider, the method for preferably passing through in hot water.

Heating-up temperature while making heat shrink film 11a thermal shrinkage is preferably according to the kind of the heat shrink film using and the spacing of target relief pattern 12a and the selection of the appropriate depth of bottom 12b.

In this manufacture method, the thickness of surface smoothing hard layer 13 is thinner, and the Young modulus of surface smoothing hard layer 13 is lower, and the mode spacing A of relief pattern 12a becomes less, and the deformation rate of base material is higher, and mean depth B becomes darker.Therefore,, in order to make relief pattern 12a for mode spacing A, the mean depth B of regulation, need suitable selection aforementioned condition.

In the manufacture method of peak-valley pattern formed sheet described above, because the Young modulus of the surface smoothing hard layer 13 consisting of metal or metallic compound is much larger than heat shrink film 11a, hot compression is during than the hard surface smoothing hard layer 13 of heat shrink film 11a, it also occurs folding when thickness increases.Further, because surface smoothing hard layer 13 is laminated to heat shrink film 11a above, be distributed in integral body the stress equilibrium that heat shrink film 11a contraction produces.Therefore, by the present invention, surface smoothing hard layer 13 folded deformations can be made, the peak-valley pattern formed sheet 10 for the manufacture of the excellent performance of the engineering sheet of light diffusion body can be manufactured easy and in large area.

And by this manufacture method, the mode spacing A that can easily make relief pattern 12a is for surpassing 1 μ m and below 20 μ m, make take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.

In addition, all the time, as manufacturing relief pattern, form the method with sheet, known have nano impression with the relief pattern of mould by after being pressed on thermoplastic sheet thermoplastic resin, makes its cooling hot nano impression method; On relief pattern at nano impression with mould, be covered with after uncured ionization radial line curable resin constituent, irradiate ionization radial line and make its curing light nano impression method.

Hot nano impression method need to apply uniform pressure to mold integral, presses the mould with relief pattern on thermoplastic resin, in such method, when the area of mould becomes large, mould applied pressure is become to inhomogeneous, and result, can cause the transfer printing of relief pattern to become inhomogeneous.Therefore, be unsuitable for the production of the large-area peak-valley pattern formed sheet that uses in the display screen etc. of LCD TV.

In addition, in light nano impression method, because the release property of mould and cured resin is inadequate, cause the transfer printing of relief pattern to become incomplete.And the reusable number of times of mould is more, this tendency is more obvious.

With respect to these nano impression methods, the manufacture method of above-mentioned peak-valley pattern formed sheet, owing to can omitting the transfer printing of relief pattern, therefore can solve the problems referred to above that nano impression method exists.

In addition, although above-mentioned embodiment is whole at base material, hard layer is set, but also can hard layer be set in a part for a face of base material, can hard layer be all set at the whole face on the two sides of base material, can also hard layer be set in the part on the two sides of base material.

3. light diffusion body

Light diffusion body of the present invention has mode spacing A for surpassing 1 μ m and the above-mentioned peak-valley pattern formed sheet 10 below 20 μ m.

For light diffusion body of the present invention, the layer that also can there are other on face or the two sides of peak-valley pattern formed sheet 10.For example, on the face that is formed with relief pattern 12a mono-side of peak-valley pattern formed sheet 10, in order to prevent that this face is contaminated, contain that to take the thickness that fluororesin or organic siliconresin be principal ingredient be the stain-proofing layer of 1~5nm left and right.

In addition, also can, on the face of base material 11 1 sides of light diffusion body, possess formed of transparent resin or glass supporter processed.

Further, also can on the face of base material 11 1 sides, form bond layer, suitable functional in order to make it have, also can contain pigment.

Above-mentioned have the light diffusion body of the present invention that surface is formed with the peak-valley pattern formed sheet 10 of relief pattern and have sufficient optical diffuse.

4. light diffusion system is made the manufacture method with operation sheet master and light diffusion body

Light diffusion system of the present invention is made with operation sheet master and (below, is called operation sheet master.) possess above-mentioned peak-valley pattern formed sheet 10, by method shown below, relief pattern 12a is transferred to other materials, as can be for large area and manufacture in large quantities the mould of light diffusion body, this light diffusion body be formed with the mode spacing equal with this operation sheet master and the relief pattern of mean depth on surface.

Operation sheet master can further possess for supporting resin or the metal supporter processed of peak-valley pattern formed sheet 10.

As using operation sheet master to manufacture the concrete grammar of light diffusion body, for example can enumerate the method for following (a)~(c).

(a) there is the method for following operation: on the face that is formed with relief pattern of operation sheet master, be coated with the operation of uncured ionization radial line curable resin, and irradiation ionization radial line, aforementioned curable resin is solidified, then by the operation of filming and peeling off from operation sheet master of solidifying.Here, ionization radial line typically refers to ultraviolet ray or electron ray, but the present invention also comprises luminous ray, X ray, ion irradiation etc.

(b) there is the method for following operation: on the face that is formed with relief pattern of operation sheet master, be coated with the operation of uncured liquid thermosetting resin, and heating makes aforementioned liquid thermosetting resin solidification, then by the operation of filming and peeling off from operation sheet master of solidifying.

(c) there is the method for following operation: the operation that the face that is formed with relief pattern of operation sheet master is contacted with sheet thermoplastic resin; With this sheet thermoplastic resin is pressed on to operation sheet master, and heating makes it softening, then cooling operation; And the operation that this cooling sheet thermoplastic resin is peeled off from operation sheet master.

In addition, also can use operation sheet master to make 2 operation moldings, re-use these 2 operations and manufacture light diffusion body with molding.As 2 operation moldings, for example can enumerate 2 operation sheets.In addition, as 2 operation moldings, can enumerate: operation sheet master is reeled, be attached at the inner side of cylinder, in this cylinder inner side, be inserted with under the state of roller and carry out plating, roller is taken out from cylinder, obtain plating roller.

As the concrete grammar that uses 2 operations with moldings, can enumerate following (d)~method (f).

(d) there is the method for following operation: on the face that is formed with relief pattern of operation sheet master, thereby carry out the operation of the metal deposition lamination coating layers (relief pattern transfer printing material) such as nickel; Thereby this coating layer is peeled off to the operation of moldings for 2 operations of the metal system of making from operation sheet master, then, on the face 2 operations by the side contacting with relief pattern of moldings, be coated with the operation of uncured ionization radial line curable resin; Irradiate ionization radial line aforementioned curable resin is solidified, then by the operation of filming and peeling off with molding from 2 operations after solidifying.

(e) there is the method for following operation: on the face that is formed with relief pattern of operation sheet master, the operation of lamination coating layer (relief pattern transfer printing material); Thereby this coating layer is peeled off to the operation of molding for 2 operations of the metal system of making from operation sheet master; And on the face of these 2 operations by the side contacting with relief pattern of molding, be coated with the operation of uncured liquid thermosetting resin; By heating, make after this resin solidification, by the operation of filming and peeling off with molding from 2 operations after solidifying.

(f) there is the method for following operation: on the face that is formed with relief pattern of operation sheet master, the operation of lamination coating layer (relief pattern transfer printing material); Thereby this coating layer is peeled off to the operation of molding for 2 operations of the metal system of making from operation sheet master; The operation of using the face of the side contacting with relief pattern of molding to contact with sheet thermoplastic resin these 2 operations; This sheet thermoplastic resin is pressed on to 2 operations with on molding, and heating makes it softening, then cooling operation; And the operation that this cooling sheet thermoplastic resin is peeled off with molding from 2 operations.

Instantiation to method (a) describes.As shown in Figure 8, first, on the face that is formed with relief pattern 112a of netted operation sheet master 110, by the uncured aqueous ionization radial line curable resin 112c of spreader 120 coating.Then, roller 130 is pressed by being coated with the operation sheet master 110 of this curable resin, made aforementioned curable resin be filled into the inside of the relief pattern 112a of operation sheet master 110.Afterwards, by ionising radiation beam irradiating apparatus 140, irradiate ionization radial line, make curable resin crosslinked, curing.Then, the ionization radial line curable resin after solidifying is peeled off from operation sheet master 110, thereby can be manufactured network diaphragm diffuser 150.

For method (a), take and give release property as object, can be before the uncured ionization radial line curable resin of coating, it is the layer of 1~10nm left and right that the thickness consisting of organic siliconresin, fluororesin etc. is set on the face that is formed with relief pattern of operation sheet master.

As being coated with the spreader of uncured ionization radial line curable resin on the face that is formed with relief pattern at operation sheet master, can enumerate T die head spreader, roll coater, rod painting device etc.

As uncured ionization radial line curable resin, can enumerate the material that contains the a kind of above composition being selected from following monomer: epoxy acrylate, epoxidized oil acrylate, acrylic acid urethane ester, unsaturated polyester (UP), polyester acrylate, polyether acrylate, ethene/acrylic ester, polyene/acrylate, organic silicon acrylic ester, polybutadiene, the prepolymers such as polystyrene-based methyl acrylate, aliphatic acrylate, ester ring type acrylate, aromatic series acrylate, the acrylate of hydroxyl, containing allylic acrylate, acrylate containing glycidyl ether, carboxylic acrylate, the monomers such as halogen-containing acrylate.Uncured ionization radial line curable resin preferably dilutes with solvent etc.

In addition, in uncured ionization radial line curable resin, also can add fluororesin, organic siliconresin etc.

When uncured ionization radial line curable resin is cured by ultraviolet ray, preferably in uncured ionization radial line curable resin, add acetophenones, the Photoepolymerizationinitiater initiaters such as benzophenone.

After the uncured aqueous ionization radial line curable resin of coating, after the base material being formed by resin, glass etc. of can fitting, irradiate again ionization radial line.The irradiation of ionization radial line can be irradiated from any one party with ionization radial line permeability of base material, operation sheet master.

The thickness of the sheet of the ionization radial line curable resin after solidifying is preferably 0.1~100 μ m left and right.The thickness of the sheet of the ionization radial line curable resin after solidifying is 0.1 μ m when above, can guarantee to obtain sufficient intensity, is 100 μ m when following, can guarantee to obtain flexible fully.

In the method shown in above-mentioned Fig. 8, operation sheet master is netted, but also can be thin slice.While using thin slice, the stamped method that is suitable for using thin slice as tabular mould, rolls of sheets is invested to roller stamped method that roller uses as cylindric mould etc.In addition, also can configure in the mould inner side of injection (mo(u)lding) machine the operation sheet master of thin slice.

Yet, for a large amount of production light diffusion bodies, for the method for using these thin slices, need to repeatedly repeat to form the operation of relief pattern.When the release property of ionization radial line curable resin and operation sheet master is low, after repeatedly repeating, has to produce and block relief pattern, the incomplete tendency of relief pattern transfer printing.

With respect to this, as shown in Figure 8, because operation sheet master is netted, can form large-area continuous relief pattern, even peak-valley pattern formed sheet to reuse number of times few, also can manufacture in the short time light diffusion body of requirement.

In method (b), (e), as liquid thermosetting resin, for example can enumerate uncured melamine resin, urethane resin, epoxy resin etc.

In addition, the solidification temperature in method (b) is preferably lower than the glass transition temperature of operation sheet master.Because solidification temperature is when to be the glass transition temperature of operation sheet master above, while solidifying, the relief pattern of operation sheet master is likely out of shape.

As the thermoplastic resin in method (c), (f), can enumerate such as acrylic resin, polyolefin, polyester etc.

Pressure when sheet thermoplastic resin is pressed on to 2 operations with molding is preferably 1~100MPa.Pressure while pressing is 1MPa when above, and transfer printing relief pattern accurately, for 100MPa is when following, can prevent excessive pressurization.

In addition, in method (c), the heating-up temperature of thermoplastic resin is preferably lower than the glass transition temperature of operation sheet master.Heating-up temperature is the glass transition temperature of operation sheet master when above, and during heating, the relief pattern of operation sheet master is likely out of shape.

From the viewpoint consideration of transfer printing relief pattern accurately, the chilling temperature after heating is preferably the glass transition temperature lower than thermoplastic resin.

In method (a)~(c), from preventing that the viewpoint of the relief pattern distortion of operation sheet master from considering, preferably can omit heating, use the method (a) of ionization radial line curable resin.

In method (d)~(f), 2 operations of metal system are preferably 50~500 μ m left and right with the thickness of molding.2 operations of metal system are 50 μ m when above with the thickness of molding, and 2 times operation has enough intensity with molding, are 500 μ m when following, can guarantee to obtain enough flexible.

In method (d)~(f), owing to having used the less metal film-making of the hot distortion causing as operation sheet, the material of using as peak-valley pattern formed sheet, can be used any one of ionization radial line curable resin, heat-curing resin, thermoplastic resin.

In method (a)~(f), while using the peak-valley pattern formed sheet making as light diffusion body, take and further improve light diffusion effect as object, can contain the light diffusing agent being formed by aforementioned mineral compound, the organic light diffusing agent or the micro air bubble that by organic compound, are formed.

In addition, in (d)~(f), although the relief pattern of operation sheet master is transferred to and on metal, has obtained 2 times operation molding,, also can be transferred to resin and obtain operation molding 2 times.At this moment, as operable resin, can enumerate such as ionization radial line curable resin using in polycarbonate, polyacetal, polysulfones, method (a) etc.While using ionization radial line curable resin, the same with method (a), carry out successively ionization radial line curable resin coating, solidify, peel off, obtain operation molding 2 times.

Also can bond layer be set at the face of the contrary side of the face that is formed with relief pattern of the above-mentioned light diffusion body obtaining like this.In addition, also can, at the face of the contrary side of the face that is formed with relief pattern, further form relief pattern.

In addition, also can not peel off as peak-valley pattern formed sheet or 2 operations of operation sheet master and with molding, it be used as protective seam, can before using light diffusion body, peel off immediately protective seam.

Due to the light diffusion body making by above-mentioned manufacture method, be formed with the relief pattern identical with above-mentioned peak-valley pattern formed sheet 10, thereby the dispersion of concavo-convex orientation, the anisotropy of diffusion is excellent.

For light diffusion body, the layer that also can other be set on face or the two sides of peak-valley pattern formed sheet.For example, can be at peak-valley pattern formed sheet, be formed with on the face of relief pattern one side, in order to prevent that this face is contaminated, arrange and contain that to take the thickness that fluororesin or organic siliconresin be principal ingredient be the stain-proofing layer of 1~5nm left and right.

In addition, also can, at the face that does not form relief pattern one side of light diffusion body, formed of transparent resin or glass supporter processed be set.

5. optical sheet

5-1. the 1st embodiment

The 1st embodiment to optical sheet of the present invention describes.

Figure 13 shows the optical sheet of present embodiment.In addition, for ease of explanation, the relief region of Figure 13 212 is amplified, and, this configuration sparsely represented.

The optical sheet 210a of present embodiment is used as the light diffusing patch use of disposing light source 330 at one end of length direction α, in smooth one side 11, it is the pattern of the relief region 212 of elliptical shape that point-like decentralized configuration has profile, and its length direction along optical sheet 210a becomes close gradually from one end α to other end β.In addition, in the present invention, the center line average roughness that the smooth JIS of referring to BO601 records is below 0.1 μ m.In addition, relief region refers to that the center line average roughness that JIS BO601 records is over 0.1 μ m, particularly surpasses more than 0.5 μ m.

Relief region

Relief region 12 is the regions with relief pattern.In the present embodiment, as shown in Figure 1, on the surface of relief region 12, be formed with the wavy relief pattern 12a crawling.

For the optical sheet 210a of the present embodiment for light diffusing patch, the mode spacing A of its relief pattern 12a is preferably over 1 μ m and below 20 μ m, more preferably over 1 μ m and below 10 μ m.Mode spacing A is during lower than 1 μ m, and below visible light wavelength, visible ray refraction does not occur and see through light at relief pattern 12a, and while surpassing aforementioned higher limit, the anisotropy step-down of diffusion, has the unbalanced tendency of easy generation brightness.

With respect to the ratio of the mean depth B of the relief pattern of the mode spacing A of relief pattern 12a (B/A, below, be called length breadth ratio.) be preferably 0.1~3.0.Length breadth ratio, lower than 0.1 o'clock, can not obtain objective optics characteristic.On the contrary, length breadth ratio is greater than at 3.0 o'clock, in the manufacture of optical sheet 210a, has the tendency that is difficult to form relief pattern 12a.

Here, mean depth B refers to, the mean depth of the bottom 12b of relief pattern 12a.

In addition, bottom 12b is the minimum point of the recess of relief pattern 12a, and mean depth B is following value: while observing the cross section (with reference to Fig. 2) after relief region 12 being cut off along short-axis direction, from the datum line L parallel with whole direction of optical sheet 10a 1length B to each protuberance top 1, B 2, B 3... mean value (B aV), and from datum line L 1arrive the length b of the bottom of each recess 1, b 2, b 3... mean value (b aV) poor (b aV-B aV).

As the method for measuring mean depth B, adopt by the takes a picture image in cross section of the relief pattern 12a that obtains of atomic force microscope and measure the degree of depth of 12b bottom each, try to achieve the method etc. of their mean value.

As in this embodiment, relief pattern 12a refers to along crawling of a direction, and the degree of orientation of the relief pattern of trying to achieve by following method is more than 0.3.This degree of orientation is the index of dispersion of the orientation of relief pattern, and this value is larger, represents that orientation is overstepping the bounds of propriety loose.

The above-mentioned degree of orientation is lower than 0.3 o'clock, and because the dispersion of the orientation of relief pattern 12a diminishes, so diffusion of light diminishes.

In addition, the degree of orientation is preferably below 1.0.The degree of orientation surpasses at 1.0 o'clock, and because the direction of relief pattern 12a becomes unordered to a certain extent, although optical diffuse uprises, anisotropy has the tendency of step-down.

In order to make the degree of orientation, be more than 0.3, for example, in manufacture described later, can suitable selection heat shrink film and relief region formation protuberance.

In addition, can be also the shaped method of transparent resin of the mould of more than 0.3 relief pattern be formed with the degree of orientation on a surface.

With respect to the area of a face of optical sheet 210a, the ratio of the area of relief region 212, although according to target light diffusive and difference is preferably 30~100%.The area ratio of relief region 212 is 30% when above, can bring into play sufficient optical diffuse.

The constituent material of optical sheet

Optical sheet 210a consists of the transparent resin of the transmissivity to visible ray high (specifically, the full light transmittance of visible ray is more than 85%).

In addition, take improve thermotolerance, photostability is object, in can not be to the hurtful scope of the optical characteristics such as light transmission, can in optical sheet 10a, contain adjuvant.As adjuvant, can enumerate light stabilizer, ultraviolet light absorber, antioxidant, lubricant, light diffusing agent etc.Wherein, preferably add light stabilizer, with respect to 100 mass parts transparent resins, its addition is preferably 0.03~2.0 mass parts.The addition of light stabilizer is 0.03 mass parts when above, can give full play to its additive effect, but while surpassing 2.0 mass parts, becomes excessive, causes unnecessary cost to increase.

In addition, take and further improve light diffusion effect as object, in can not be to the hurtful scope of the optical characteristics such as light transmission, can in optical sheet 210a, contain the inorganic light diffuser being formed by mineral compound, the organic light diffusing agent being formed by organic compound.

As inorganic light diffuser, can enumerate silicon dioxide, white carbon, talcum, magnesium oxide, zinc paste, titanium dioxide, calcium carbonate, aluminium hydroxide, barium sulphate, calcium silicate, magnesium silicate, alumina silicate, lagoriolite, zinc silicate, glass, mica etc.

As organic light diffusing agent, can enumerate polystyrene aggregated particles, acrylic acid series aggregated particles, siloxane-based aggregated particles, polyamide-based aggregated particles etc.These light diffusing agents can be used singly or in combination of two or more thereof respectively.

In addition, in order to obtain excellent light diffusion characteristic, these light diffusing agents can be the porous structures such as petal-shaped or spherocrystal shape.

Never easily damage the viewpoint of light transmission and consider, with respect to 100 mass parts transparent resins, the content of light diffusing agent is preferably below 10 mass parts.

Further, take and further improve light diffusion effect as object, can not have in the scope of large infringement optical characteristics such as light transmissions, can in optical sheet 210a, contain micro air bubble.Because micro air bubble is few to the absorption of light, be therefore difficult to cause that light transmission reduces.

Formation method as micro air bubble, can be useful in optical sheet 210a, sneak into gas-development agent method (for example, Japanese kokai publication hei 5-212811 communique, the disclosed method of Japanese kokai publication hei 6-107842 communique), acrylic acid series Foamex is seted out and steeped processing, make its method that contains micro air bubble (for example, the disclosed method of TOHKEMY 2004-2812 communique) etc.Further, from carrying out more uniform face, irradiate consideration, the method (for example, the disclosed method of TOHKEMY 2006-124499 communique) that preferably makes micro air bubble foam unevenly in specific position.

In addition, aforementioned light diffusing agent and fine foaming can be used in combination.

The thickness of optical sheet

The thickness of optical sheet 10a be preferably 0.02~3.0mm, more preferably 0.05~2.5mm, be particularly preferably 0.1~2.0mm.The thickness of optical sheet 10a is during lower than 0.02mm, because its degree of depth than relief pattern 12a is also little, thus improper, when thicker than 3.0mm, because the quality of optical sheet 10a becomes large, there is the tendency that is difficult for processing.

Optical sheet 210a also can consist of 2 layers of above resin bed.When optical sheet 10a consists of 2 layers of above layer, the thickness of optical sheet 210a is also preferably 0.02~3.0mm.

Using method

Above-mentioned optical sheet 210a, can be used as light diffusing patch and uses.Specifically, make use adjacent with light source 330 of one end α of optical sheet 210a.One end α configuration light source 330 by optical sheet 210a, can make light propagate in optical sheet 210a.In addition, can make the light of propagating in optical sheet 210a be diffused in relief region 212, then from being formed with the face outgoing of relief region 212 1 sides.Further, because relief region 212 is to become successively close pattern from one end α to other end β to be configured, can make at the exit dose of the light of other end β outgoing more.Conventionally, from light source 330 more away from, the light intensity of propagating in optical sheet 210a becomes more weak, but owing to more approaching other end β, the exit dose of light becomes more, can make from the light intensity of optical sheet 210a outgoing even.

While using optical sheet 120a, in order to improve the light utilization ratio of light source 330, preferably do not having the face of relief region 212 that reflecting plate is set.

The relief pattern 12a that the optical sheet 210a of the 1st embodiment described above forms by the surface in relief region 212 brings into play optical diffuse.In addition, configuration relief region 212, make to become close along the pattern of other end β mono-side of the length direction of optical sheet 210a, thereby the optical diffuse of other end β mono-side making at length direction uprises.Like this, can by the interval between adjustment relief region 212, adjust the optical diffuse of optical sheet 210a, easily in the position of expectation, obtain the optical diffuse of expectation.

Manufacture method

To manufacturing the example of the method for optical sheet 210a, describe.

(the 1st manufacture method)

The 1st manufacture method is to use the method for heat shrink thin film fabrication optical sheet 210a.

; the 1st manufacture method is to manufacture the method for the peak-valley pattern formed sheet that forms optical sheet 210a; it possesses following operation: on a face of heat shrink film; thereby the resin relief region that print surface is level and smooth forms by the operation of protuberance formation printed sheet and (below, is called the 1st operation.); Thereby being shunk, heat shrink film heating make at least relief region formation of printed sheet (below, be called the 2nd operation by the operation of protuberance folded deformation.)。

The 1st operation

As shown in Figure 14 and Figure 15, in the 1st operation, as print relief region on a face of heat shrink film 13, form the method with protuberance 14, can Application Example as serigraphy, intaglio printing, offset lithography, ink jet printing etc.

As heat shrink film 13, can use such as polyethylene terephthalate is shrinkable film, polystyrene shrinkable film, polyolefin shrinkable film, polyvinyl chloride shrinkable film etc.

In heat shrink film 213, preferably shrink 50~70% film.While use shrinking 50~70% shrinkable film, deformation rate can be for more than 50%, the mode spacing A that can easily manufacture relief pattern 12a for surpass 1 μ m and below 20 μ m and length breadth ratio be more than 0.1 peak-valley pattern formed sheet.

Here, deformation rate refers to, (the rear length of length-distortion before distortion)/(length before distortion) * 100 (%).Or refer to (length after distortion)/(length before distortion) * 100 (%).

From being easy to form the wavy relief pattern 12a consideration of crawling, relief region forms with protuberance 214 and consists of than the high 10 ℃ of above resins (the 2nd resin) of the resin (the 1st resin) that forms heat shrink film 213 glass transition temperature.

As the 2nd resin, can use such as polyvinyl alcohol (PVA), polystyrene, acrylic resin, styrene-propene acid copolymer, styrene-acrylonitrile copolymer, polyethylene terephthalate, polybutylene terephthalate, Polyethylene Naphthalate, polycarbonate, polyethersulfone, fluororesin etc.

From the relief pattern 12a of easy formation expectation, consider, in relief region, form the surface with protuberance 214, the center line average roughness described in JIS BO601 is below 0.1 μ m.

In addition, relief region forms and is preferably 0.05~5.0 μ m with the thickness of protuberance 214, more preferably 0.1~1.0 μ m.When relief region forms thickness with protuberance 214 and is aforementioned range, the mode spacing A of relief pattern 12a can be really for over 1 μ m and below 20 μ m.And when relief region forms thickness with protuberance 214 lower than 0.05 μ m, mode spacing A is below 1 μ m, while surpassing 5.0 μ m, mode spacing A surpasses 20 μ m.

Further, it can not be also certain value that relief region forms with the thickness of protuberance 214, for example, can along a continuous thickening of direction, also can attenuation.

In addition, from more easily forming the wavy relief pattern 12a that crawls, consider, relief region forms and is preferably 0.01~300GPa by the Young modulus of protuberance 214, more preferably 0.1~10GPa.

The 2nd operation

In the 2nd operation, by making 213 thermal shrinkages of heat shrink film, in relief region, form in the direction vertical with shrinkage direction with protuberance 214 and form wavy relief pattern 12a, obtain relief region 212 (with reference to Figure 16).

Heating means when making heat shrink film 213 heat shrink, can be set forth in hot blast, steam or the method passed through in hot water etc., wherein, from making its viewpoint of evenly shrinking consider, the method for preferably passing through in hot water.

In this manufacture method, relief region forms with the thickness of protuberance 214 thinner, and relief region forms by the Young modulus of protuberance 214 lower, and the mode spacing A of relief pattern 12a becomes less, the deformation rate of heat shrink film is higher, and mean depth B becomes darker.

In above-mentioned the 1st manufacture method, at the temperature between the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, relief region forms and becomes than heat shrink film 213 height by the Young modulus of protuberance 214.Therefore, at the temperature between the glass transition temperature of the 1st resin and the glass transition temperature of the 2nd resin, add man-hour, relief region forms and folds more than thickness increase with protuberance 214.Further, because relief region forms, with protuberance 214, be laminated on heat shrink film 213, therefore, due to the stress equilibrium of the contraction generation of heat shrink film 213 be distributed in integral body.Therefore, by heat shrink film 213 is shunk, relief region is formed with protuberance 214 folded deformations, can form relief region 212.Therefore,, by above-mentioned manufacture method, can obtain forming the peak-valley pattern formed sheet of optical sheet 210a.

The above-mentioned peak-valley pattern formed sheet obtaining like this can directly be used as optical sheet 210a.At this moment, by heat shrink film 213 and relief region, form and formed optical sheet 210a with protuberance 214.

(the 2nd manufacture method)

The 2nd manufacture method be peak-valley pattern formed sheet that the 1st manufacture method is obtained as operation sheet master, manufacture the method for optical sheet 210a.

Operation sheet master can be also laminar, can also be the netted of continuous sheet.

As the concrete grammar of the 2nd manufacture method, for example can enumerate the method for following (a)~(c).

(a) there is the method for following operation: on the face that is formed with relief region of operation sheet master, be coated with the operation of uncured ionization radial line curable resin; And irradiation ionization radial line, aforementioned curable resin is solidified, then by the operation of filming and peeling off from operation sheet master of solidifying.Here, ionization radial line generally refers to ultraviolet ray or electron ray, but the present invention also comprises luminous ray, X ray, ion irradiation etc.

(b) there is the method for following operation: on the face that is formed with relief region of operation sheet master, be coated with the operation of uncured liquid thermosetting resin; And heating makes aforementioned liquid thermosetting resin solidification, then by the operation of filming and peeling off from operation sheet master of solidifying.

(c) there is the method for following operation: the operation that the face that is formed with relief region of operation sheet master is contacted with sheet transparent thermoplastic resin; This sheet transparent thermoplastic resin is pressed on to operation sheet master, and heating makes it softening, then cooling operation; And the operation that this cooling sheet transparent thermoplastic resin is peeled off from operation sheet master.

In addition, can use operation sheet master to make 2 operation moldings, re-use these 2 operations and manufacture optical sheet 10a with molding.As the concrete grammar that uses 2 operations with moldings, can enumerate following (d)~method (f).

(d) there is the method for following operation: on the face that is formed with relief region of operation sheet master, thereby carry out the operation of the metal deposition lamination coating layers such as nickel; Thereby coating layer is peeled off to the operation of molding for 2 operations of the metal system of making from operation sheet master; Then, 2 operations, with the contacting on the face of a side with relief region of molding, be coated with the operation of uncured ionization radial line curable resin; And irradiate ionization radial line aforementioned curable resin is solidified, the operation of then filming of solidifying being peeled off with molding from 2 operations.

(e) there is the method for following operation: the operation of lamination coating layer on the face that is formed with relief region of operation sheet master; Thereby this coating layer is peeled off to the operation of molding for 2 operations of the metal system of making from operation sheet master; In these 2 operations, with the contacting on the face of a side with relief region of molding, be coated with the operation of uncured liquid thermosetting resin; And by heating, make this resin solidification, the operation of then filming of solidifying being peeled off with molding from 2 operations.

(f) there is the method for following operation: the operation of lamination coating layer on the face that is formed with relief region of operation sheet master; Thereby this coating layer is peeled off to the operation of molding for 2 operations of the metal system of making from operation sheet master; The operation that these 2 operations are contacted with sheet transparent thermoplastic resin with the face that contacts a side with relief region of molding; This sheet transparent thermoplastic resin is pressed on to operation molding 2 times, and heating makes it softening, then cooling operation; And the operation that this cooling sheet transparent thermoplastic resin is peeled off with molding from 2 operations.

Instantiation to method (a) describes.As shown in Figure 8, first, on the face that is formed with netted relief region 112a of operation sheet master 110, by the uncured aqueous ionization radial line curable resin 112c of spreader 120 coating.Then, roller 130 is pressed by being coated with the operation sheet master 110 of this curable resin, made aforementioned curable resin be filled into the inside of the relief pattern 112a of operation sheet master 110.Afterwards, by ionising radiation beam irradiating apparatus 140, irradiate ionization radial line, make curable resin crosslinked, curing.Then, the ionization radial line curable resin after solidifying is peeled off from operation sheet master 110, can be manufactured netted optical sheet 210a.

For method (a), take and give release property as object, can be before the uncured ionization radial line curable resin of coating, it is the layer of 1~10nm degree that the thickness consisting of organic siliconresin, fluororesin etc. is set on the face that is formed with relief region of operation sheet master.

As being coated with the spreader of uncured ionization radial line curable resin on the face that is formed with relief region at operation sheet master, can enumerate T die head spreader, roll coater, rod painting device etc.

As uncured ionization radial line curable resin, can enumerate the material that contains the a kind of above composition being selected from following monomer: epoxy acrylate, epoxidized oil acrylate, urethane acrylate, unsaturated polyester (UP), polyester acrylate, polyether acrylate, ethene/acrylic ester, polyene/acrylate, organic silicon acrylic ester, polybutadiene, the prepolymers such as polystyrene-based methyl acrylate, aliphatic acrylate, ester ring type acrylate, aromatic series acrylate, the acrylate of hydroxyl, containing allylic acrylate, acrylate containing glycidyl ether, carboxylic acrylate, the monomers such as halogen-containing acrylate.Uncured ionization radial line curable resin preferably dilutes with solvent etc.

In addition, uncured ionization radial line curable resin also can add fluororesin, organic siliconresin etc.

When uncured ionization radial line curable resin is cured by ultraviolet ray, preferably in uncured ionization radial line curable resin, add acetophenones, the Photoepolymerizationinitiater initiater of benzophenone etc.

As the concrete grammar of (d), except being become, the operation sheet master in method (a) use 2 operations of this operation sheet master making with molding, and the same with said method (a).

As the liquid thermosetting resin in method (b), (e), can enumerate for example uncured, melamine resin, urethane resin, epoxy resin etc.

In addition, the solidification temperature in method (b) is preferably lower than the glass transition temperature of operation sheet master.Because solidification temperature is when to be the glass transition temperature of operation sheet master above, while solidifying, the relief pattern of operation sheet master is likely out of shape.

As the transparent thermoplastic resin in method (c), (f), for example can enumerate the resins such as styrene-methylmethacrylate copolymer (MS), polymethylmethacrylate (PMMA), polystyrene (PS), cyclic olefin polymer (COP), polycarbonate (PC), polypropylene (PP), polyethylene terephthalate (PET), PET-G, polyethersulfone (PES), Polyvinylchloride (PVC), polyethylene terephthalate (PET) etc.Wherein, from the viewpoint of the processing that is shaped, consider, preferably MS, PMMA, PS, COP, PC, consider from the viewpoint of hydroscopicity and cost, and more preferably styrene containing ratio is the MS of 30~90 quality %.

These transparent thermoplastic resins can be individual layer or sandwich construction.For example, can use the transparent thermoplastic resin etc. of the 3-tier architecture that is all provided with PMMA layer on the two sides of PS layer.

Further, also can use the resin that is provided with high refractive index resins on aforementioned transparent thermoplastic resin's surface.As the resin of high index of refraction, can enumerate such as fluorenes is that epoxy compound, fluorenes are that acrylate compounds, fluorenes are polyester (OKP), Polymethylphenylsilane (PMPS), polydiphenylsilane (PDPS) etc.

In method (c), pressure when sheet thermoplastic resin is pressed on to operation sheet master and in method (f), pressure when sheet thermoplastic resin is pressed on to 2 operations with molding is all preferably 1~100MPa.Pressure while pressing is 1MPa when above, and transfer printing relief pattern accurately, for 100MPa is when following, can prevent excessive pressurization.

In addition, in method (c), the heating-up temperature of thermoplastic resin is preferably lower than the glass transition temperature of operation sheet master.Heating-up temperature is the glass transition temperature of operation sheet master when above, and during heating, the relief pattern of operation sheet master is likely out of shape.

From transfer printing relief pattern consideration accurately, the chilling temperature after heating is preferably the glass transition temperature lower than thermoplastic resin.

(the 3rd manufacture method)

To be the peak-valley pattern formed sheet that the surface of resinous layer is provided with to metal system or metallic compound relief region processed manufacture the method for optical sheet 210a as operation sheet master to the 3rd manufacture method.

The peak-valley pattern formed sheet of the metal system of being provided with or metallic compound relief region processed, except forming with protuberance and replace resin relief region formation protuberance by metal system or metallic compound relief region processed, with evaporation, replace printing to form relief region and form with beyond protuberance, can obtain by the method identical with the 1st manufacture.

That is the manufacture method that, is provided with the peak-valley pattern formed sheet of metal system or metallic compound relief region processed has following operation: thus thereby in face vacuum evaporation metal system of heat shrink film or metallic compound relief region processed, forming to form the operation of evaporation sheet and heat shrink film heating is shunk with protuberance makes at least relief region of evaporation sheet form the operation of using protuberance folded deformation.

In the manufacture method of this peak-valley pattern formed sheet, because the relief region formation of metal system or metallic compound system uses the Young modulus of protuberance much larger than the Young modulus of heat shrink film, when hot compression, it folds more than thickness increase.As a result, can obtain being provided with the peak-valley pattern formed sheet of relief region.In addition, the relief region of this peak-valley pattern formed sheet is the same with optical sheet 210a.

From more easily forming relief pattern 12a, consider, as forming relief region in the 3rd manufacture method, form the metal with protuberance, be preferably at least a kind of metal in the choosing group that freely gold, aluminium, silver, carbon, copper, germanium, indium, magnesium, niobium, palladium, lead, platinum, silicon, tin, titanium, vanadium, zinc, bismuth form.Here said metal, also comprises semimetal.

Due to same reason, as metallic compound, be preferably at least a kind of metallic compound selecting in the group that free titanium dioxide, aluminium oxide, zinc paste, magnesium oxide, tin oxide, cupric oxide, indium oxide, cadmium oxide, massicot, monox, barium fluoride, calcium fluoride, magnesium fluoride, zinc sulphide, gallium arsenide form.

From the relief pattern 12a of easy formation expectation, consider, in relief region, form the surface with protuberance, the center line average roughness of recording in JIS BO601 is below 0.1 μ m.

Metal system or metallic compound relief region processed forms and is preferably 0.01~0.2 μ m with the thickness of protuberance, more preferably 0.05~0.1 μ m.When relief region forms thickness with protuberance and is aforementioned range, the mode spacing A of relief pattern 12a, can be really for over 1 μ m and below 20 μ m.Yet when relief region forms thickness with protuberance lower than 0.01 μ m, mode spacing A becomes below 1 μ m, when surpassing 0.2 μ m, mode spacing A surpasses 20 μ m.

Further, it can not be also certain value that relief region forms with the thickness of protuberance, for example, can along a continuous thickening of direction, also can attenuation.

On heat shrink film, evaporation metal or metallic compound relief region processed forms while using protuberance, can, on the surface of heat shrink film, put with the relief region with forming and form the mask by the identical pattern openings of protuberance.

Heating means when heat shrink film heating is shunk, can be set forth in the method passed through in hot blast, steam or hot water etc., wherein, from making it evenly shrink, consider the method for preferably passing through in hot water.

As the concrete grammar of the 3rd manufacture method, can be set forth in what use in the method for the 2nd manufacture method (a)~(f) and with the peak-valley pattern formed sheet that is provided with relief region of metal system or metallic compound system, replace the 2nd resinous method that is provided with the peak-valley pattern formed sheet of relief region as operation sheet master.

(the 4th manufacture method)

The 4th manufacture method is that use possesses mould, heats heating cooling unit and the building mortion to the presser unit of this mould pressurizing of cooling this mould, is manufactured the method for optical sheet 10a by unfashioned transparent thermoplastic resin.The transparent thermoplastic resin who uses as the 4th manufacture method, can enumerate and use the identical resin of transparent thermoplastic resin using with the 2nd manufacture method.

Particularly, in the 4th manufacture method, first, in mould, fill transparent thermoplastic resin's bead or powder, by heating cooling unit to mold heated, and by presser unit to pressurizeing in mould.Then, by heating cooling unit make in mould cooling, stop pressurization, obtain optical sheet 210a.

In this manufacture method, as mould, use and on the face contacting with exit facet of optical sheet 210a, be formed with the mould of the wavy relief pattern that crawls.For example, as mould, can use the mould that is attached with peak-valley pattern formed sheet on a face in the 1st~3rd manufacture method, by Ear Mucosa Treated by He Ne Laser Irradiation etc., at a face, form the mould of the wavy relief pattern that crawls.

As the manufacturing process of the 4th manufacture method, can Application Example as, compressing method, injection molding method.

The optical sheet 210a obtaining by above-mentioned the 1st~4th manufacture method can directly be used, and also can fit in formed of transparent resin or glass system by bonding agent and strengthen with using as final optical sheet on substrate.

The manufacture method of optical sheet 210a described above, can be easily in smooth one side, and configuration relief region 212 makes its other end β side pattern along the length direction of optical sheet 210a become gradually close.Therefore, can easily obtain the high optical sheet 210a of optical diffuse of the other end β side of length direction.

5-2. the 2nd embodiment

The 2nd embodiment to optical sheet of the present invention describes.

Figure 17 shows the optical sheet of present embodiment.In addition, for ease of explanation, in Figure 17, relief region 215 is amplified, and, this configuration sparsely represented.

The optical sheet 210b of present embodiment is used as the light diffusing patch use of disposing light source 330 at one end of length direction α, in smooth one side 211, decentralized configuration has along the Width of optical sheet 210b and forms banded relief region 215, makes its length direction along optical sheet 210b to other end β pattern, become gradually close from one end α.

The same with the optical sheet 210a of the 1st embodiment, by configuring such relief region 215, can be so that the optical diffuse of the other end β side of optical sheet 210b be high.

The relief pattern of the relief region 215 of the 2nd embodiment is identical with the relief pattern 12a of the relief region 12 of the 1st embodiment.Area ratio with respect to the relief region 215 of the area of a face of optical sheet 210b is also identical with the area ratio of the 1st embodiment.

The optical sheet 210b of the 2nd embodiment can be identical by the manufacture method of the optical sheet 210a with the 1st embodiment manufacture method manufacture.

5-3. the 3rd embodiment

The 3rd embodiment to optical sheet of the present invention describes.

Figure 18 shows the optical sheet of present embodiment.In addition, for ease of explanation, in Figure 18, also relief region 216 is amplified, and, this configuration sparsely represented.

The optical sheet 210c of present embodiment is used as the light diffusing patch use of disposing light source 330 at one end of length direction α, in smooth one side 211, decentralized configuration has netted relief region 216, and it forms by the band-like portions 216a along optical sheet 210c length direction with along the band-like portions 216b of Width.The part 216b along optical sheet 210c Width of relief region 216, is become thickly configuration gradually from one end α to other end β by the length direction along optical sheet 210c.

The relief pattern of the relief region 216 of the 3rd embodiment is identical with the relief pattern 12a of the relief region 212 of the 1st embodiment.With respect to the area ratio of the relief region 216 of the area of a face of optical sheet 210c, also identical with the area ratio of the 1st embodiment.

The optical sheet 210c of the 3rd embodiment can be identical by the manufacture method of the optical sheet 210a with the 1st embodiment manufacture method manufacture.

5-4. the 4th embodiment

The 4th embodiment to optical sheet of the present invention describes.

Figure 19 shows the optical sheet of present embodiment.In addition, for ease of explanation, in Figure 19, relief region 217 is amplified, and, this configuration sparsely represented.

The optical sheet 210d of present embodiment is used as the light diffusing patch use of disposing linear light source 330 at the face C that is not formed with relief region 217 sides.In addition, in the smooth one side 211 of this optical sheet 210d, from light source 330 more close to, the relief region of elliptical shape 217 is by decentralized configuration more thickly.

In the present embodiment, the light sending from light source 330 incides optical sheet 210d unevenly, but the part arriving due to stronger light, relief region 217, by more thickly configuration, can make light be diffused also outgoing.Therefore, can make from the light intensity homogenising of optical sheet 210d outgoing.

The relief pattern of the relief region 217 of the 4th embodiment is identical with the relief pattern 12a of the relief region 212 of the 1st embodiment.Area ratio with respect to the relief region 217 of the area of a face of optical sheet 210d is also identical with the area ratio of the 1st embodiment.

The optical sheet 210d of the 4th embodiment, manufacture method that can be identical by the manufacture method of the optical sheet 210a with the 1st embodiment is manufactured.

Other embodiments of 5-5.

In addition, optical sheet of the present invention is not subject to the restriction of above-mentioned embodiment.

For example, for above-mentioned the 1st embodiment, the 4th embodiment, the profile of relief region is elliptical shape, but also can be circle, rectangle etc.

In addition, for optical sheet of the present invention, relief region also can randomly form.

In addition, the relief pattern of relief region also can be for crawling, for straight line also can.

In addition, also can form relief region on the two sides of optical sheet.

In addition, also can with base material, strengthen optical sheet with strengthening.

6. diffusion light conductor

Embodiment to diffusion light conductor of the present invention describes.

Fig. 1 shows the diffusion light conductor of present embodiment.The diffusion light conductor 10 of present embodiment is to consist of the transparent resin layer 11 that is formed with the wavy relief pattern 12a that crawls in one side.Other face (the inside) of the transparent resin layer 11 of present embodiment is not for forming the level and smooth face of relief pattern.

The mode spacing A of relief pattern 12a is for surpassing 1 μ m and below 20 μ m, being preferably over 1 μ m and below 10 μ m.Mode spacing A is during lower than 1 μ m, and below visible light wavelength, visible ray refraction does not occur at concavo-convex place and sees through light, and while surpassing 20 μ m, the anisotropy step-down of diffusion, easily produces brightness irregularities.

With respect to the ratio of the concavo-convex mean depth B of the mode spacing A of relief pattern 12a (B/A, below, be called length breadth ratio.) be 0.1~3.0.Length breadth ratio was lower than 0.1 o'clock, and the anisotropy step-down of diffusion, easily produces brightness irregularities.On the contrary, length breadth ratio is greater than at 3.0 o'clock, in the manufacture of diffusion light conductor 10, is difficult to form relief pattern 12a.

Here, mean depth B is the mean depth of the bottom 12b of relief pattern 12a.In addition, bottom 12b is the minimum value of the recess of relief pattern 12a, and mean depth B refers to, while observing the cross section (with reference to Fig. 2) after along its length diffusion light conductor 10 being cut off, from the datum line L parallel with 10 whole directions of diffusion light conductor 1length B to each protuberance top 1, B 2, B 3... mean value (B aV), and from datum line L 1arrive the length b of the bottom of each recess 1, b 2, b 3... mean value (b aV) poor (b aV-B aV).

As the method for measuring mean depth B, adopt by the takes a picture image in cross section of the relief pattern 12a that obtains of atomic force microscope and measure the degree of depth of 12b bottom each, try to achieve the method etc. of their mean value.

Of the present invention crawling refer to, the degree of orientation of the relief pattern of trying to achieve by following method is more than 0.3.This degree of orientation is the index of dispersion of the orientation of relief pattern, and this value is larger, represents that orientation is overstepping the bounds of propriety loose.

In order to try to achieve the degree of orientation, first, by surface optics microscope, to the taking a picture above of relief pattern, this image is transformed to gray scale file (for example, tiff form etc.).In the image (with reference to Fig. 3) of gray scale file, whiteness is lower, represents that the bottom of recess is darker (whiteness is higher, represents that the top of protuberance is higher).Then, the image of gray scale file is carried out to Fourier transform.Fig. 4 shows the image after Fourier transform.From the center of the image of Fig. 4, expand to spacing that the white portion on both sides comprised relief pattern 12a and towards information.

Then, from the center along continuous straight runs of the image of Fig. 4, draw boost line L2, to the brightness mapping (with reference to Fig. 5) in this boost line.In Fig. 5, the transverse axis of figure means the inverse of spacing, and the longitudinal axis represents frequency, and the 1/X reciprocal of value X when frequency is maximum represents the mode spacing of relief pattern 12a.

Then,, in Fig. 4, draw and boost line L 2boost line L perpendicular to value X part 3, to this boost line L 3on brightness mapping (with reference to Fig. 6).But, for can more various concaveconvex structures, the numerical value after the transverse axis of Fig. 6 is removed by the value of X.The transverse axis of Fig. 6 is the index (orientation) showing with respect to the inclined degree of concavo-convex formation direction (above-below direction in Fig. 3), and the longitudinal axis represents frequency.In the mapping of Fig. 6, the half breadth W of peak value 1(frequency is the peak width on the height of a peaked half) represents the degree of orientation of relief pattern.Half value broadband W 1larger, represent that the spacing of crawling is overstepping the bounds of propriety loose.

Because the above-mentioned degree of orientation was lower than 0.3 o'clock, the dispersion of the orientation of relief pattern 12a diminishes, so diffusion of light diminishes.

In addition, the degree of orientation is preferably below 1.0.The degree of orientation surpasses at 1.0 o'clock, and because the direction of relief pattern 12a becomes unordered to a certain extent, although optical diffuse uprises, anisotropy has the tendency of step-down.

In order to make the degree of orientation, be more than 0.3, for example, in aftermentioned is manufactured, suitable selection heat shrink film and surface smoothing hard layer.For example, the shrinkage factor of heat shrink film is higher, or the Young modulus of surface smoothing hard layer is less, and it is larger that orientation becomes.The diffusion light conductor 10 obtaining by this manufacture method consists of 2 layers of resin bed.

In addition, can be also the shaped method of transparent resin of the mould of more than 0.3 relief pattern be formed with the degree of orientation on a surface.The diffusion light conductor 10 obtaining by this manufacture method consists of 1 layer of resin bed.

In addition, above-mentioned mode spacing and the average headway of the relief pattern that Fourier transform tries to achieve of utilizing is like that equal.

Transparent resin layer 11 consists of the transparent resin of the transmissivity to visible ray high (specifically, the full light transmittance of visible ray is more than 85%).

In addition, take improve thermotolerance, photostability is object, can, in can not be to the hurtful scope of the optical characteristics such as light transmission, in transparent resin layer 11, contain adjuvant.As adjuvant, can enumerate light stabilizer, ultraviolet light absorber, antioxidant, lubricant, light diffusing agent etc.Wherein, preferably add light stabilizer, with respect to 100 mass parts transparent resins, its addition is preferably 0.03~2.0 mass parts.The addition of light stabilizer is 0.03 mass parts when above, can give full play to its additive effect, but while surpassing 2.0 mass parts, becomes excessive, causes unnecessary cost to increase.

In addition, take and further improve light diffusion effect as object, can can not cause in the scope of large infringement optical characteristics such as light transmissions, in transparent resin layer 11, contain the inorganic light diffuser being formed by mineral compound, the organic light diffusing agent being formed by organic compound.

As inorganic light diffuser, can enumerate silicon, white carbon, talcum, magnesium oxide, zinc paste, titanium dioxide, calcium carbonate, aluminium hydroxide, barium sulphate, calcium silicate, magnesium silicate, alumina silicate, lagoriolite, zinc silicate, glass, mica etc.

As organic light diffusing agent, can enumerate polystyrene aggregated particles, acrylic acid series aggregated particles, siloxane-based aggregated particles, polyamide-based aggregated particles etc.These light diffusing agents can be used singly or in combination of two or more thereof respectively.

In addition, in order to obtain excellent light diffusion characteristic, these light diffusing agents can be the porous structure of petal-shaped or spherocrystal shape etc.

Never easily damage light transmission and consider, with respect to 100 mass parts transparent resins, the content of light diffusing agent is preferably below 10 mass parts.

Further, take and further improve light diffusion effect as object, can, not causing in the scope of large infringement optical characteristics such as light transmissions, in transparent resin layer 11, contain micro air bubble.Micro air bubble is few to the absorption of light, is therefore difficult to cause that light transmission reduces.

As the formation method of micro air bubble, can be useful in the method (for example, Japanese kokai publication hei 5-212811 communique, the disclosed method of Japanese kokai publication hei 6-107842 communique) of sneaking into gas-development agent in transparent resin layer 11; Acrylic acid series Foamex is seted out to steep and process, make its method that contains micro air bubble (for example, the disclosed method of TOHKEMY 2004-2812 communique) etc.Further, the viewpoint consideration of irradiating from carrying out more uniform face, the method (for example, the disclosed method of TOHKEMY 2006-124499 communique) that preferably makes micro air bubble foam unevenly in specific position.

In addition, aforementioned light diffusing agent and fine foaming can be used in combination.

The thickness of transparent resin layer 11 be preferably 0.02~3.0mm, more preferably 0.05~2.5mm, be particularly preferably 0.1~2.0mm.The thickness of transparent resin layer 11 is during lower than 0.02mm, because its degree of depth than relief pattern is also little, thus improper, while being thicker than 3.0mm, because the quality of diffusion light conductor 10 becomes large, there is the tendency that is difficult for processing.

Transparent resin layer 11 also can consist of 2 layers of above resin bed.When transparent resin layer 11 consists of 2 layers of above layer, the thickness of transparent resin layer 11 is also preferably 0.02~3.0mm.

Manufacture method

Manufacture method that can be identical by the manufacture method with aforementioned optical sheet is manufactured.

Function

Above-mentioned diffusion light conductor 10 has the anisotropic diffusion of light.Particularly, when the face that does not form relief pattern 12a mono-side (the inside) of diffusion light conductor 10 arranges light source, the light sending from light source incides diffusion light conductor 10 by the inside, interior by then arriving male and fomale(M&F) from diffusion light conductor 10.Here, above and reflect lower than the light that the incident angle of the angle of critical angle arrives with 0 degree, and shine the outside surface of diffusion light conductor 10.Because the direction of light of passing through in diffusion light conductor 10 is not a direction, the male and fomale(M&F) of diffusion light conductor 10 and the angle of light are not definite value, and light reflects at wide angular range.And for disperseing orientation, the anisotropy of diffusion uprises with crawling due to concavo-convex.

In addition, with respect to male and fomale(M&F), after the light generation total reflection arriving with more than critical angle angle again by diffusion light conductor, afterwards, outgoing during with angle arrival male and fomale(M&F) lower than critical angle.In addition, the light arriving with the incident angle of the angle of 0 degree does not reflect, and directly shines the outside surface of diffusion light conductor.

In addition, when a side of diffusion light conductor 10 arranges light source, also, with above-mentioned the same, in diffusion light conductor 10, pass through, above and lower than the light that the incident angle of the angle of critical angle arrives with 0 degree, there is to reflect and shine the outside surface of diffusion light conductor.Here, concavo-convex for disperseing orientation with crawling, thereby the anisotropy of diffusion uprises.

In addition, diffusion light conductor of the present invention is not subject to the restriction of above-mentioned embodiment.For example, when the inside of transparent resin layer side configuration light source, in order to improve the incident efficiency of light, preferably in the inside of transparent resin layer, form and there is the fine wavy concavo-convex of anti-reflective function.Here, fine wavy concavo-convex mode spacing is preferably below 1 μ m, and length breadth ratio is preferably more than 0.1.This is because when mode spacing surpasses 1 μ m, or length breadth ratio was over 0.1 o'clock, can not obtain anti-reflective function.

Aforementioned fine wavy concavo-convex, also can be formed at the inside of transparent resin layer together with forming the relief pattern that light diffusion use.For example, while manufacturing diffusion light conductor by compressing, injection moulding, as mould, can use the face joining in the exit facet with transparent resin layer (surface) side to be formed with the relief pattern that light diffusion is used, and the face joining in the plane of incidence with transparent resin layer (the inside) side is formed with the method for the mould of fine wavy relief pattern.

In addition, aforementioned fine wavy concavo-convex, the relief pattern different terrain that also can use with light diffusion is formed in the inside of transparent resin layer.For example, can the film that be formed with fine wavy relief pattern be attached to by bonding agent to the inside side of transparent resin layer.

In addition, in order further to improve light diffusing anisotropy, the film that can contain micro air bubble in plane of incidence side or exit facet side apposition.As shown in figure 20, during the film 317 that contains micro air bubble in plane of incidence side apposition, in order effectively to utilize the light sending from light source 330, preferably, at the part 317a of the light acute irradiation of light source 330, the content of micro air bubble is many, at other parts 317b, the content of micro air bubble is few, or, do not contain.

Diffusion light conductor of the present invention can be also the thickness wedge shape of attenuation gradually that passes through, and light source is disposed at a thick side of the diffusion light conductor of wedge shape.

Diffusion light conductor of the present invention must be formed with the wavy relief pattern that crawls on a face, but is not limited to only at a face, be formed with relief pattern.That is, on the another side of transparent resin layer, also can be formed with the wavy relief pattern that crawls.

7. back light unit

7-1. the 1st embodiment

The 1st embodiment for back light unit of the present invention describes.

Figure 21 shows the back light unit of present embodiment.The back light unit 100 of present embodiment be so-called under type, possess diffusion light conductor 310, reflecting plate 320 and a plurality of light source 330,330......, wherein, the opposing face (the inside 316) of the face that is formed with relief pattern of diffusion light conductor 310 (surface 315) sets in opposite directions with reflecting plate 320, and a plurality of light sources 330 are equipped between diffusion light conductor 310 and reflecting plate 320.In addition, in the surface of diffusion light conductor 310 315 1 sides successively lamination, there are diffusion film 340, prismatic lens 350, brightness rising film 360.

As light source 330, for example can enumerate cold-cathode tube, light emitting diode etc.

As reflecting plate 320, for example can enumerate, surface is the sheet metal of mirror-like, or possesses laminate of such sheet metal etc.

As diffusion film 340, for example can enumerate the resin molding that contains transparent grain etc.Diffusion film 340 makes the further diffusion of light by the outgoing of diffusion light conductor.

As prismatic lens 350, for example can enumerate, at a mask, there is the resin sheet (for example, Sumitomo 3M Limited manufactures, and commodity are called Vikuiti BEFIII) of the coniform or pyramidal projection of a plurality of rules etc.It is the vertical direction with respect to face that prismatic lens 350 makes from the working direction of the light of diffusion film 340 outgoing.

As brightness rising film 360, for example can enumerate, only make the compressional wave (P ripple) of light pass through, and make the sheet (for example, Sumitomo 3M Limited manufactures, trade name Vikuiti DBEF-D400) etc. of shear wave (S ripple) reflection.

7-2. the 2nd embodiment

The 2nd embodiment to back light unit of the present invention describes.

Figure 22 shows the back light unit of present embodiment.The back light unit 200 of present embodiment, it is so-called edge-light type, possess diffusion light conductor 310, reflecting plate 320 and a plurality of light source 330, the opposing face (the inside 316) of the face that is formed with relief pattern of diffusion light conductor 310 (surface 315) sets in opposite directions with reflecting plate 320, and a plurality of light sources 330 are equipped on a side of diffusion light conductor 310.In addition, in the surface of diffusion light conductor 310 315 1 sides successively lamination, there are diffusion film 340, prismatic lens 350, brightness rising film 360.

The diffusion light conductor 310 that present embodiment is used, reflecting plate 320, light source 330, diffusion film 340, prismatic lens 350 and brightness rising film 360 are identical with the 1st embodiment.

The back light unit 100 that possesses the above-mentioned embodiment of the diffusion light conductor 310 that is formed with the wavy relief pattern that crawls, the light sending from light source 330 at the male and fomale(M&F) of diffusion light conductor 310 with high anisotropic diffusion.Therefore the difficult brightness irregularities that image occurs of liquid crystal indicator that, possesses back light unit 100,200.

8. antireflection object

Antireflection object of the present invention possesses the peak-valley pattern formed sheet 10 that above-mentioned mode spacing A is the relief pattern 12a below 1 μ m.

For antireflection object of the present invention, also can there is other layers on face or the two sides of peak-valley pattern formed sheet 10.For example, can be on the face that is formed with relief pattern 12a mono-side of peak-valley pattern formed sheet 10, having containing of arranging in order to prevent that this face is contaminated, to take the thickness that fluororesin or silicones be principal ingredient be the stain-proofing layer of 1~5nm left and right.

The wavy relief pattern 12a part of the peak-valley pattern formed sheet 10 of antireflection object of the present invention, shows the middle refractive index between air refraction and the refractive index (refractive index of base material 11) of peak-valley pattern formed sheet 10, and this middle refractive index changes continuously.And the mode spacing A of relief pattern 12a is below 1 μ m, and take mode spacing A as 100% time, the mean depth B of the bottom 12b of relief pattern 12a is more than 10%.Due to these reasons, reflection of light rate can be low especially, and particularly, reflectivity can be almost 0%.This be because, as mentioned above, the mode spacing A of the relief pattern 12a of peak-valley pattern formed sheet 10 is that 1 μ m is so short below, take mode spacing A as 100% time, mean depth B is more than 10% so dark, the continuous changing unit of middle refractive index along thickness direction is elongated, can significantly bring into play the effect that suppresses light reflection.

Such antireflection object for example can be arranged on, the image display devices such as LCD panel, plasma display panel (PDP), the illuminating part top of light emitting diode, the surface of solar panel etc.

While being installed on image display device, owing to can preventing the reflection of illumination, thereby can improve the visuality of image.While being installed on the illuminating part top of light emitting diode, can improve the outgoing efficiency of light.While being installed on solar panel surperficial, owing to making the incident quantitative change of light many, thereby can improve the generating efficiency of solar cell.

9. polarizer

Polarizer of the present invention possesses the above-mentioned peak-valley pattern formed sheet 10 that mode spacing A is the relief pattern 12a below 1 μ m.But, concavo-convex direction is not random, but along a direction.

The same with above-mentioned antireflection object, for polarizer of the present invention, also can possess other layers on face or the two sides of peak-valley pattern formed sheet 10, for example, can possess stain-proofing layer at the face that is formed with relief pattern 12a mono-side of peak-valley pattern formed sheet 10.

Polarizer of the present invention can significantly be brought into play the effect that produces phase differential.This be because, as mentioned above, the mode spacing A of the relief pattern 12a of peak-valley pattern formed sheet 10 is that 1 μ m is so short below, and take mode spacing A as 100% time, mean depth B is more than 10% so dark, along thickness direction, the mutually different air of refractive index and the mutual configuration section of peak-valley pattern formed sheet 10 are elongated, and the anisotropic part of display optical is elongated.Further, the spacing of relief pattern is with visible light wavelength same degree or for it is when following, can in wide visible wavelength range, produce equal phase differential.

(Optical element manufacturing operation sheet)

Operation sheet for Optical element manufacturing of the present invention is (following, referred to as operation sheet), possesses the peak-valley pattern formed sheet 10 that above-mentioned mode spacing A is the relief pattern 12a below 1 μ m, by method shown below, relief pattern is transferred on other materials, can be used as mould uses, the peak-valley pattern formed sheet using for manufacturing in large quantities optical elements such as can be used as antireflection object, polarizer in large area, this peak-valley pattern formed sheet has the mode spacing equal with this operation sheet and the relief pattern of mean depth.

Use operation sheet to manufacture the concrete grammar of optical element identical with the method for aforementioned optical sheet.

Embodiment 1

The Young modulus of following example is the value of using tension test instrument (TESTER SANGYO CO., the TE-7001 that LTD. manufactures) and recording based on JIS K 7113-1995.When temperature not being recorded especially, it is the value at 23 ℃.

(embodiment 1)

Thickness along the thermal shrinkage of single shaft direction is polyethylene terephthalate heat shrink film (the Mitsubishi Plastic processed that 50 μ m, Young modulus are 3GPa, Inc. the HISHIPET LX-60S manufacturing, glass transition temperature is 70 ℃) a face on, use rod to be coated with polymethylmethacrylate (Port リ マ mono-P4831-MMA processed of ソYi ス Co., Ltd. of dilution with toluene for device coating, glass transition temperature is 100 ℃), making its thickness is 200nm, thereby form hard layer, obtains laminate.

Then, this laminate is heated 1 minute at 80 ℃, make its thermal shrinkage to length before heating 40% (, the deformation rate that makes its distortion is 60%), obtain hard layer and along the direction vertical with respect to shrinkage direction, there is the peak-valley pattern formed sheet (light diffusion body) of periodic wavy relief pattern.

In addition, polyethylene terephthalate heat shrink film processed and the Young modulus of this polymethylmethacrylate at 80 ℃ are respectively 50Mpa, lGPa.

(embodiment 2)

Except coating in addition, in the same manner as in Example 1, obtains peak-valley pattern formed sheet (light diffusion body) with the polystyrene (Port リ マ mono-PS processed of ソYi ス Co., Ltd., glass transition temperature is 100 ℃) of dilution with toluene.

In addition, polyethylene terephthalate heat shrink film processed and the Young modulus of this polystyrene at 80 ℃ are respectively 50Mpa, 1GPa.

(embodiment 3)

Except the coating thickness of polystyrene is 1 μ m, in the same manner as in Example 2, obtain peak-valley pattern formed sheet (light diffusion body).

(embodiment 4)

Except laminate is heated 1 minute at 70 ℃, make its thermal shrinkage to heating before length 90% (that is, the deformation rate that makes its distortion is 10%) in addition, in the same manner as in Example 2, obtain peak-valley pattern formed sheet (light diffusion body).

(embodiment 5)

The peak-valley pattern formed sheet that use is obtained by embodiment 1 (light diffusion body) is used as operation sheet master, in accordance with the following methods, obtains light diffusion body.

That is, the face coating that is formed with relief pattern at the operation sheet master being obtained by embodiment 1 contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face not joining with operation sheet master of filming of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, and presses.

Then, irradiation ultraviolet radiation above cellulose triacetate film, solidifies uncured ultra-violet solidified resin composition, and this solidfied material is peeled off from operation sheet master, obtains light diffusion body.

(embodiment 6)

The peak-valley pattern formed sheet that use is obtained by embodiment 1 (light diffusion body) is used as operation sheet master, obtains in accordance with the following methods optical element.

That is, on the face that is formed with relief pattern of the operation sheet master being obtained by embodiment 1, implement nickel plating, this nickel coating is peeled off, obtaining thickness is 2 operation sheets of 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face that film, that do not join with 2 operation sheets of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, and presses.

Then, irradiation ultraviolet radiation above cellulose triacetate film, solidifies uncured ultra-violet solidified resin composition, and this solidfied material is peeled off from 2 operation sheets, obtains light diffusion body.

(embodiment 7)

Except using heat-curable epoxy resin to replace ultra-violet solidified resin composition, use heating to replace ultraviolet ray to irradiate to make beyond this heat-curing resin solidifies, in the same manner as in Example 6, obtain light diffusion body.

(embodiment 8)

In the same manner as in Example 6, obtain 2 operation sheets that thickness is 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, superimposed thickness is the polymethyl methacrylate film of 50 μ m, and heating.From both sides, press thermoplastic polymethyl methacrylate film and 2 operation sheets, then make its cooling curing, then it is peeled off from 2 operation sheets, obtain light diffusion body.

(comparative example 1)

Except the coating thickness of polystyrene is 6 μ m, in the same manner as in Example 2, obtain peak-valley pattern formed sheet (light diffusion body).

(comparative example 2)

Except the coating thickness of polystyrene is 40nm, in the same manner as in Example 2, obtain peak-valley pattern formed sheet (light diffusion body).

(comparative example 3)

Except by Mitsubishi Plastic, Inc. the same HI SHIPET LX-10S of HISHIPET LX-60S (Young modulus is 3GPa) manufacturing replaces, and this laminate is heated 1 minute at 70 ℃, make its be punctured into length before heating 97% (, the deformation rate that makes its distortion is 3%) in addition, in the same manner as in Example 1, obtain peak-valley pattern formed sheet (light diffusion body).

(comparative example 4)

Use the manufacture method of the anisotropic diffusion pattern shown in patent documentation 2 to obtain peak-valley pattern formed sheet.

; shield and photosensitive film plate are arranged in parallel to each other; and make the 1m that is spaced apart each other; it is 1mm that described shield has width; length is the slit of 10cm; in slit, embed and have the such diffusing panel of ground glass make laser diffusion and see through, described photosensitive film plate is coated with the commercially available photoresist of thickness 100 μ m.

Then, the argon laser that is 514nm with wavelength irradiates from aforementioned shield side, by aforementioned slots, then by the argon laser of ground glass diffusion, makes the photoresist exposure on photosensitive film plate.

Repeat aforementioned shown in exposure, make the photoresist exposure of whole of photosensitive film plate.Then, the photosensitive film after exposure is developed, obtain peak-valley pattern formed sheet (light diffusion body).

In addition, the gray scale file changing image of comparative example 4 is shown in Fig. 9, and the Fourier transform image of gray scale document image is shown in Figure 10.In addition, from the picture centre of Figure 10, along horizontal direction, draw boost line L4, the Figure 11 that is illustrated in that maps and obtain with the brightness in this boost line.Further, in Figure 10, draw the boost line L5 perpendicular to value Y part with boost line L4, the Figure 12 that is illustrated in that maps and obtain with the brightness on this boost line L5.

(comparative example 5)

Except used thickness is that 50 μ m, the Young modulus 2 axle stretching polyethylene terephthalate thin film (G2 processed of Teijin Ltd) that are 5GPa replace heat shrink film, in the same manner as in Example 1, attempt to obtain peak-valley pattern formed sheet (light diffusion body).Yet, fail to form wavy relief pattern, do not obtain peak-valley pattern formed sheet (light diffusion body).

(comparative example 6)

At the thickness along the thermal shrinkage of single shaft direction, be 50 μ m, Young modulus is the polyethylene terephthalate of 3GPa heat shrink shrinkable film (Mitsubishi Plastic processed, Inc. the HISHIPET LX-10S manufacturing, glass transition temperature is 70 ℃) a face on, adopt excellent rubbing method, coating is diluted in dimethyl silicone polymer (the KS 847T of Shin-Etsu Chemial Co., Ltd that the Young modulus of toluene is 2MPa, glass transition temperature is-120 ℃) and the dispersion liquid of platinum catalyst (CAT-PL-50T of Shin-Etsu Chemial Co., Ltd), making its thickness is 200mm, form hard layer, thereby obtain laminate.

Then, this laminate is heated 1 minute at 100 ℃, make its thermal shrinkage, attempt to obtain peak-valley pattern formed sheet, but fail to make hard layer folded deformation, do not form wavy relief pattern.

Photograph above by atomic force microscope (Veeco Instruments manufacture NanoScopeIII) from the light diffusion body of the peak-valley pattern formed sheet of embodiment 1~8 and comparative example 1~6.

Utilize the image of atomic force microscope to measure the degree of depth of relief pattern at 10 places of the peak-valley pattern formed sheet of embodiment 1~8 and comparative example 1~4, these values are average, try to achieve mean depth.

In addition, the degree of orientation of relief pattern is tried to achieve by the following method.

First, the photograph above by surface optics microscope to relief pattern, is transformed to gray scale file (with reference to Fig. 3) by this image.Then, the image of gray scale file is carried out to Fourier transform.Fig. 4 shows the image after Fourier transform.Then, from the picture centre of Fig. 4, along horizontal direction, draw boost line L 2, with the brightness mapping (with reference to Fig. 5) in this boost line.Then,, in Fig. 5, draw and boost line L 2boost line L perpendicular to value X part (inverse of mode spacing) 3, with this boost line L 3on brightness mapping (with reference to Fig. 6).Then, the half breadth W of the peak value in mapping by Fig. 6 1try to achieve the degree of orientation of relief pattern.These values are shown in table 1.

In addition, based on following benchmark, by the mode spacing of relief pattern and the mean depth of bottom, evaluate the well-formedness as light diffusion body.This evaluation result is shown in table 1.

Zero: the mode spacing of relief pattern is for surpassing 1 μ m and below 20 μ m, take mode spacing as 100% time, mean depth is more than 10%, the degree of orientation is 0.3~1.0, suitable to light diffusion body.

△: the mode spacing of relief pattern is that 1 μ m is following or surpass 20 μ m, or, take mode spacing as 100% time, mean depth is lower than 10%, or the degree of orientation is lower than 0.3, as light diffusion body, is not necessarily applicable to.

*: can not form relief pattern

Table 1:

The embodiment 1~8 that makes the surface smoothing hard layer folded deformation of laminate, can easily manufacture peak-valley pattern formed sheet.

Further, the mode spacing of the relief pattern of the peak-valley pattern formed sheet of embodiment 1~8 is for surpassing 1 μ m and below 20 μ m, take aforementioned mode spacing as 100% time, and the mean depth of bottom is more than 10%, is suitable as light diffusion body.Embodiment 1~4 can obtain mode spacing as described above and mean depth be because the thickness of surface smoothing hard layer for surpass 0.05 μ m and below 5 μ m, deformation rate is more than 10%.

In addition, by the peak-valley pattern formed sheet (light diffusion body) that embodiment 1 is obtained, be used as the manufacture method of the embodiment 5~8 of operation sheet, light diffusion body be can manufacture easily, the mode spacing equal with peak-valley pattern formed sheet (light diffusion body) and the relief pattern of mean depth made it have.

With respect to this, in comparative example 1 and 2, because the thickness of surface hard smooth layer is that 0.05 μ m is following or surpass 5 μ m, the mode spacing of the relief pattern of the peak-valley pattern formed sheet obtaining (light diffusion body) is that 1 μ m is following or surpass 20 μ m.In addition, because the deformation rate of comparative example 3 is 3%, the peak-valley pattern formed sheet obtaining, take mode spacing as 100% time, and the mean depth of relief pattern bottom is lower than 10%.In addition, the degree of orientation of comparative example 4 is lower than 0.3.These comparative examples 1~4, are not necessarily applicable to as light diffusion body.

In addition, use 2 axle stretching polyethylene terephthalate thin film as the comparative example 5 of resin bed, and the manufacture method of the comparative example 6 of the glass transition temperature that uses the 2nd resin laminate lower than the 1st resin, due to surface smoothing hard layer, fail folded deformation, do not form relief pattern.

Young modulus in following examples, to use tension test instrument (ORIENTEC Co., LTD. the TENSILON RT C-1210 manufacturing), adopt " the high temperature Young modulus test method of metal material " of JIS Z2280-1993, temperature is changed into the value recording after 23 ℃.When hard layer consists of metallic compound too.

(embodiment 9)

At the thickness along the thermal shrinkage of single shaft direction, be polyethylene terephthalate heat shrink film (the Mitsubishi Plastic processed that 50 μ m, Young modulus are 3GPa, Inc. on the face HISHIPET LX-10S manufacturing), vacuum evaporation Young modulus is the aluminium of 70GPa, making its thickness is 0.05 μ m, has obtained forming the laminate of surface smoothing hard layer.

Then, this laminate is heated 1 minute at 100 ℃, 40% (that is, the deformation rate of distortion is 60%) of length before making its thermal shrinkage for heating, obtains hard layer for have the peak-valley pattern formed sheet of periodic wavy relief pattern along the direction vertical with respect to shrinkage direction.

Then,, using peak-valley pattern formed sheet as operation sheet master, in accordance with the following methods, obtain light diffusion body.

That is,, on the face that is formed with relief pattern of operation sheet master, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then, on the face not joining with operation sheet master of filming of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, irradiation ultraviolet radiation above cellulose triacetate film, solidifies uncured uv curing resin, and this solidfied material is peeled off from operation sheet master, obtains light diffusion body.

(embodiment 10)

The peak-valley pattern formed sheet that method by embodiment 9 is obtained is used as operation sheet master, according to following method, obtains light diffusion body.

That is, on the face that is formed with relief pattern of the operation sheet master obtaining at embodiment 9, implement nickel plating, this nickel coating is peeled off, obtaining thickness is 2 operation sheets of 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face that film, that do not join with 2 operation sheets of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, irradiation ultraviolet radiation above cellulose triacetate film, solidifies uncured curable resin, and this solidfied material is peeled off from 2 operation sheets, obtains light diffusion body.

(embodiment 11)

Except using heat-curable epoxy resin to replace ultra-violet solidified resin composition, by heating replaces ultraviolet ray irradiation make this heat-curable epoxy resin curing beyond, in the same manner as in Example 10, obtain light diffusion body.

(embodiment 12)

In the same manner as in Example 10, obtain 2 operation sheets that thickness is 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, superimposed thickness is the polymethyl methacrylate film of 50 μ m, then heating.From both sides, press thermoplastic polymethyl methacrylate film and 2 operation sheets, then make its cooling curing, the polymethyl methacrylate film after solidifying is peeled off from 2 operation sheets, obtain light diffusion body.

(comparative example 7)

Except the thickness of the aluminium of vacuum evaporation is 0.3 μ m, in the same manner as in Example 9, obtain light diffusion body.

(comparative example 8)

Except the thickness of the aluminium of vacuum evaporation is 0.01 μ m, in the same manner as in Example 9, obtain light diffusion body.

(comparative example 9)

At the thickness along the thermal shrinkage of single shaft direction, be polyethylene terephthalate heat shrink film (the Mitsubishi Plastic processed that 50 μ m, Young modulus are 3GPa, Inc. on face HISHIPET LX-10S processed), vacuum evaporation Young modulus is the aluminium of 70GPa, making its thickness is 0.05 μ m, has obtained forming the laminate of surface smoothing hard layer.

Then, except this laminate is heated 1 minute at 70 ℃, make its 97% (that is, the deformation rate of distortion is 3%) that is retracted to the front length of heating in addition, in the same manner as in Example 9, obtain light diffusion body.

Photograph above by atomic force microscope (Veeco Instruments manufacture NanoScopeIII) from the light diffusion body of the peak-valley pattern formed sheet of embodiment 9~12 and comparative example 7~9.

Utilize the image of atomic force microscope to measure the degree of depth of relief pattern at 10 places of the peak-valley pattern formed sheet of embodiment 9~12 and comparative example 7~9, these values are average, try to achieve mean depth.

In addition, the degree of orientation of relief pattern is tried to achieve by the following method.

First, the photograph above by surface optics microscope to relief pattern, is transformed to gray scale file (with reference to Fig. 3) by this image.Then, the image of gray scale file is carried out to Fourier transform.Fig. 4 shows the image after Fourier transform.Then, from the picture centre of Fig. 4, along horizontal direction, draw boost line L 2, with the brightness mapping (with reference to Fig. 5) in this boost line.In Fig. 5, draw and boost line L 2boost line L perpendicular to value X part (inverse of mode spacing) 3, with this boost line L 3on brightness mapping (with reference to Fig. 6).Then, by the half breadth W of the peak value in the pattern of Fig. 6 1try to achieve the degree of orientation of relief pattern.

These values are shown in table 2.

In addition, based on following benchmark, by the mode spacing of relief pattern and the mean depth of bottom, evaluate the well-formedness as light diffusion body.This evaluation result is shown in table 2.

Zero: the mode spacing of relief pattern is for surpassing 1 μ m and below 20 μ m, take mode spacing as 100% time, mean depth is more than 10%, the degree of orientation is 0.3~1.0, suitable to light diffusion body.

△: the mode spacing of relief pattern is that 1 μ m is following or surpass 20 μ m, or, take mode spacing as 100% time, mean depth is lower than 10%, or the degree of orientation is lower than 0.3, is not necessarily suitable as light diffusion body.

*: can not form relief pattern

Table 2

The embodiment 9~12 that the peak-valley pattern formed sheet that the surface smoothing hard layer folded deformation that makes laminate is obtained is used as operation sheet master, can easily manufacture the light diffusion body with relief pattern.Especially, the mode spacing of the relief pattern of the light diffusion body being obtained by embodiment 9~12 is for surpassing 1 μ m and below 20 μ m, take aforementioned mode spacing as 100% time, and the mean depth of bottom is more than 10%, suitable to light diffusion body.In embodiment 9~12, can access mode spacing as described above and mean depth, this is because the thickness of surface smoothing hard layer is over 0.01 μ m and below 0.2 μ m, deformation rate is more than 10%.

With respect to this, in comparative example 7 and 8, because the thickness of surface hard smooth layer is that 0.01 μ m is following or surpass 0.2 μ m, the mode spacing of the relief pattern of the light diffusion body obtaining is that 1 μ m is following or surpass 20 μ m.In addition, in comparative example 9, because deformation rate is 3%, the mean depth of the relief pattern bottom of the light diffusion body that the mode spacing of take obtains as 100% time is lower than 10%.In addition, the degree of orientation of comparative example 10 is lower than 0.3.They are not necessarily suitable as light diffusion body.

(embodiment 13)

Thickness in the thermal shrinkage of single shaft direction is polyethylene terephthalate heat shrink film (the Mitsubishi Plastic processed that 50 μ m, Young modulus are 3GPa, Inc. HISHIPET LX-60S processed, glass transition temperature is 70 ℃) a face on, polystyrene (Port リ マ mono-PS processed of ソYi ス Co., Ltd. of dilution with toluene for coating, glass transition temperature is 100 ℃), utilizing intaglio press (the K プ リ Application テ イ Application グ Block Le one Off ア mono-that Matsuo Sangyo Co., Ltd. manufactures) printing diameter is the point-like that 50 μ m, thickness are 500mm, obtains printed sheet.

Dot pattern refers to, in width 5cm * length 10cm scope, from the end to end of this length direction, some area ratio is in 0~100% scope, and every 1cm increases by 10% gradient pattern.In addition, some area ratio 0% represents not printing completely, and 100% represents whole printing.

Then, by this printed sheet is heated 1 minute at 80 ℃, make its thermal shrinkage for 40% (that is, the deformation rate of distortion is 60%) of the front length of heating.At 80 ℃, the Young modulus of polystyrene (1GPa) is than the Young modulus of polyethylene terephthalate heat shrink film processed (50MPa) height.Therefore,, at thermal shrinkage time point folded deformation, along the direction vertical with respect to shrinkage direction, form and there is periodic wavy relief pattern.Thus, obtain being formed with the peak-valley pattern formed sheet of relief region in smooth one side.

Mode spacing at the relief pattern of the relief region of this peak-valley pattern formed sheet is 5 μ m, and length breadth ratio is 1, and the degree of orientation is 0.3.

The optical diffuse of the peak-valley pattern formed sheet obtaining is studied to discovery, and the direction vertical with respect to shrinkage direction, has and makes the light anisotropic diffusion of diffusion more consumingly in parallel direction.In addition, optical diffuse also becomes large direction along the area ratio of relief region increases gradually.The peak-valley pattern formed sheet of such embodiment 13 can be used as light diffusing patch.

(embodiment 14)

Except using along two direction of principal axis heat shrink, thickness is polyethylene terephthalate shrinkable film (the Mitsubishi Plastic that 25 μ m, Young modulus are 3GPa, Inc. the HISHIPET PX-40S manufacturing) replace Mitsubishi Plastic, Inc. beyond the HI SHIPET PX-60S manufacturing, the same with embodiment 13, obtain peak-valley pattern formed sheet.On a face of this peak-valley pattern formed sheet, form the not wavy relief pattern of the specific direction in edge.

The mode spacing of the relief pattern of the relief region of this peak-valley pattern formed sheet is 5 μ m, and length breadth ratio is 1.

Optical characteristics to the peak-valley pattern formed sheet of embodiment 14 is studied, and it has isotropic optical diffuse.Therefore, the peak-valley pattern formed sheet of embodiment 14 can be used as light diffusing patch utilization.

(embodiment 15)

Except utilizing ink-jet printer (the Dimatix Materials Printer DMP-2831 of FUJIFILM Corporation) printing points, the same with embodiment 13, obtain peak-valley pattern formed sheet.The mode spacing of the relief pattern of the relief region of this peak-valley pattern formed sheet is 5 μ m, and length breadth ratio is 1, and the degree of orientation is 0.3.

Optical characteristics to the peak-valley pattern formed sheet obtaining is studied, and it has the anisotropic diffusion identical with embodiment 13.Therefore, the peak-valley pattern formed sheet of embodiment 15 can be used as light diffusing patch.

(embodiment 16)

The peak-valley pattern formed sheet that the method for use by embodiment 13 obtains, as operation sheet master, obtains light diffusing patch in accordance with the following methods.

; on the face that is formed with relief pattern of the operation sheet master being obtained by embodiment 13, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then, in the one side that film, that do not join with operation sheet master of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, above cellulose triacetate film, carry out ultraviolet ray and irradiate, uncured uv curing resin is solidified, this solidfied material is peeled off from operation sheet master, obtain light diffusing patch.

The light diffusing patch obtaining, has identical relief region, identical optical diffuse with the light diffusing patch of embodiment 13.

(embodiment 17)

The peak-valley pattern formed sheet that the method for use by embodiment 13 obtains, as operation sheet master, obtains light diffusing patch in accordance with the following methods.

That is, on the face that is formed with relief pattern of the operation sheet master obtaining by embodiment 13, implement nickel plating, this nickel coating is peeled off, obtaining thickness is 2 operation sheets of 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face not joining with 2 operation sheets of filming at uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, above cellulose triacetate film, carry out ultraviolet ray and irradiate, uncured curable resin is solidified, this solidfied material is peeled off from 2 operation sheets, obtain light diffusing patch.

The light diffusing patch obtaining, has identical relief region, identical optical diffuse with the light diffusing patch of embodiment 13.

(embodiment 18)

Except using heat-curable epoxy resin to replace ultra-violet solidified resin composition, utilize heating to replace ultraviolet ray to irradiate to make beyond this heat-curable epoxy resin solidifies, the same with embodiment 17, obtain light diffusing patch.

The light diffusing patch obtaining, has identical relief region, identical optical diffuse with the light diffusing patch of embodiment 13.

(embodiment 19)

The same with embodiment 17, obtaining thickness is 2 operation sheets of 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, superimposed thickness is the polymethyl methacrylate film of 50 μ m, then heating.From both sides, press thermoplastic polymethyl methacrylate film and 2 operation sheets, then make its cooling curing, the polymethyl methacrylate film after solidifying is peeled off from 2 operation sheets, obtain light diffusing patch.

The light diffusing patch obtaining, has identical relief region, identical optical diffuse with the light diffusing patch of embodiment 13.

(embodiment 20)

Thickness in the thermal shrinkage of single shaft direction is polyethylene terephthalate heat shrink film (the Mitsubishi Plastic processed that 50 μ m, Young modulus are 3GPa, Inc. the HI SHIPET LX-10S manufacturing, glass transition temperature is 70 ℃) a face on, place the mask be formed with a plurality of point-like peristomes (aperture 50 μ m).

The pattern of mask open portion is in width 5cm * length 10cm scope, and from the end to end of this length direction, peristome area ratio is in 0~100% scope, and every 1cm increases by 10% gradient pattern.In addition, peristome area ratio is that 0% expression does not have opening, is whole opening of 100% expression.

Then, on a face of heat shrink film, be placed with under the state of mask, the aluminium that vacuum evaporation Young modulus is 70GPa, making its thickness is 0.05 μ m, obtains evaporation sheet.

At this moment, on a face of heat shrink film, form aluminium point.This dot pattern is, in width 5cm * length 10cm scope, from the end to end of this length direction, some area ratio is in 0~100% scope, and every 1cm increases by 10% gradient pattern.In addition, some area ratio 0% represents not have completely evaporation.100% represents whole evaporation.

Then, by this evaporation sheet is heated 1 minute at 100 ℃, make its thermal shrinkage for 40% (that is, the deformation rate of distortion is 60%) of the front length of heating.At thermal shrinkage time point folded deformation, along the direction vertical with respect to shrinkage direction, form and there is periodic wavy relief pattern.Thus, obtain being formed with the peak-valley pattern formed sheet of relief region on a face.

Mode spacing at the relief pattern of the relief region of this peak-valley pattern formed sheet is 3 μ m, and length breadth ratio is 1, and the degree of orientation is 0.3.

Then, using the peak-valley pattern formed sheet obtaining as operation sheet master, use, obtain in accordance with the following methods light diffusing patch.

That is,, on the face that is formed with relief pattern of the operation sheet master obtaining, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then, in the one side of not joining with operation sheet master of filming of uncured ultra-violet solidified resin composition, superimposed thickness is then to press after the cellulose triacetate film of 50 μ m.

Then, above cellulose triacetate film, carry out ultraviolet ray and irradiate, uncured uv curing resin is solidified, this solidfied material is peeled off from operation sheet master, obtain light diffusing patch.

The light diffusing patch obtaining is studied to discovery, and it has the anisotropy optical diffuse identical with embodiment 13.

(embodiment 21)

Except using along the thickness of two direction of principal axis heat shrink, be polyethylene terephthalate shrinkable film (the Mitsubishi Plastic that 25 μ m, Young modulus are 3GPa, Inc. the HISHIPET PX-40S manufacturing) replace Mitsubishi Plastic, Inc. beyond the HISHIPET LX-60S manufacturing, the same with embodiment 20, obtain peak-valley pattern formed sheet.Mode spacing at the relief pattern of the relief region of this peak-valley pattern formed sheet is 3 μ m, and length breadth ratio is 1.

Then, use this peak-valley pattern formed sheet, the same with embodiment 20, obtain light diffusing patch.The optical characteristics of the light diffusing patch of embodiment 21 is studied to discovery, and it has isotropic optical diffuse.

(embodiment 22)

The peak-valley pattern formed sheet that method by embodiment 20 is obtained is used as operation sheet master, obtains in accordance with the following methods light diffusing patch.

That is, on the face that is formed with relief pattern of the operation sheet master obtaining by embodiment 20, implement nickel plating, this nickel coating is peeled off, obtaining thickness is 2 operation sheets of 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face that film, that do not join with 2 operation sheets of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, above cellulose triacetate film, carry out ultraviolet ray and irradiate, uncured curable resin is solidified, this solidfied material is peeled off from 2 operation sheets, obtain light diffusing patch.

The light diffusing patch obtaining, has identical relief region, identical optical diffuse with the light diffusing patch of embodiment 20.

(embodiment 23)

Except using heat-curable epoxy resin to replace ultra-violet solidified resin composition, use heating to replace ultraviolet ray to irradiate to make beyond this heat-curable epoxy resin solidifies, the same with embodiment 22, obtain light diffusing patch.

The light diffusing patch obtaining, has identical relief region, identical optical diffuse with the light diffusing patch of embodiment 20.

(embodiment 24)

The same with embodiment 22, obtaining thickness is 2 operation sheets of 200 μ m.On the face that is formed with relief pattern of these 2 operation sheets, superimposed thickness is the polymethyl methacrylate film of 50 μ m, then heating.From both sides, press thermoplastic polymethyl methacrylate film and 2 operation sheets, then make its cooling curing, curing polymethyl methacrylate film is peeled off from 2 operation sheets, obtain light diffusing patch.

The light diffusing patch obtaining, has the relief region identical with the light diffusing patch of embodiment 20, has identical optical diffuse.

For a face, be mixed with the optical sheet of the embodiment 13~24 of relief region, because the relief pattern of relief region makes light generation diffusion, so optical diffuse is excellent.In addition, due to the relief region of above-mentioned optical sheet at the other end of length direction by compact configuration, the optical diffuse of the other end of length direction is high.

The Young modulus of following examples is to use tension test instrument (TESTER SANGYO CO., the TE-7001 that LTD manufactures), the value recording based on JIS K 7113-1995 benchmark.When temperature not being recorded especially, it is the value at 23 ℃.

(embodiment 25)

Thickness in the thermal shrinkage of single shaft direction is polyethylene terephthalate shrinkable film (the Mitsubishi Plastic that 50 μ m, Young modulus are 3GPa, Inc. the HISHIPET LX-60S manufacturing, glass transition temperature is 70 ℃) a face on, by spin-coating method, be coated with polymethylmethacrylate (Port リ マ mono-P4831-MMA processed of ソYi ス Co., Ltd. by dilution with toluene, glass transition temperature is 100 ℃), making its thickness is 12nm, has obtained forming the laminate of hard layer.

Then, this laminate is heated 1 minute at 80 ℃, make it be punctured into 40% (that is, the deformation rate of distortion is 60%) of the front length of heating, obtain hard layer and in the direction vertical with respect to shrinkage direction, there is the peak-valley pattern formed sheet of periodic wavy relief pattern.

In addition, polyethylene terephthalate shrinkable film and the Young modulus of this polymethylmethacrylate at 80 ℃ are respectively 50Mpa, 1GPa.

(embodiment 26)

Thickness in the thermal shrinkage of single shaft direction is polyethylene terephthalate shrinkable film (the Mitsubishi Plastic that 50 μ m, Young modulus are 3GPa, Inc. HISHIPETLX-61S processed, glass transition temperature is 70 ℃) a face on, polyvinyl alcohol (PVA) (the KURARAY CO. of coating dilute with water, the PVA 105 that L TD. manufactures, glass transition temperature is 85 ℃), making its thickness is 12nm, has obtained forming the laminate of hard layer.

Then, this laminate is heated 1 minute at 75 ℃, make it be punctured into 50% (that is, the deformation rate of distortion is 50%) of the front length of heating, obtain hard layer and in the direction vertical with respect to shrinkage direction, there is the peak-valley pattern formed sheet of periodic wavy relief pattern.

In addition, polyethylene terephthalate shrinkable film and the Young modulus of this polymethylmethacrylate at 75 ℃ are respectively 50Mpa, 1GPa.

(embodiment 27)

Thickness in the thermal shrinkage of single shaft direction is polyethylene terephthalate shrinkable film (the Mitsubishi Plastic that 50 μ m, Young modulus are 3GPa, Inc. the HISHIPET LX-61S manufacturing, glass transition temperature is 70 ℃) a face on, evaporation fluororesin (the NANOS B that T & K Inc. manufactures) also solidifies, making its thickness is 12 μ m, obtains forming the laminate of hard layer.

Then, this laminate is heated 1 minute at 75 ℃, thereby make it be punctured into 50% (that is, the deformation rate of distortion is 50%) of the front length of heating, obtain hard layer and there is the peak-valley pattern formed sheet in the direction vertical with respect to shrinkage direction with periodic wavy relief pattern.

(embodiment 28)

Utilizing stretching device, is that the sheet that 2MPa, thickness are 5mm stretches by the Young modulus consisting of dimethyl silicone polymer, makes its length become 2 times, is then fixed under this state.Then, under this state, on a face of this sheet, polymethylmethacrylate (Port リ マ mono-P4831-MMA processed of ソYi ス Co., Ltd. of dilution with toluene for coating, glass transition temperature is 100 ℃), making its thickness is 12nm, has obtained forming the laminate of hard layer.

Then, stop stretching, make this laminate be returned to the length before stretching, make hard layer with deformation rate 50% compression, obtain hard layer and there is the peak-valley pattern formed sheet in the direction vertical with respect to compression direction with periodic wavy relief pattern.

(embodiment 29)

On a face of the sheet of the Young modulus 2MPa being formed by dimethyl silicone polymer, thickness 5mm, polymethylmethacrylate (Port リ マ mono-P4831-MMA processed of ソYi ス Co., Ltd. of dilution with toluene for coating, glass transition temperature is 100 ℃), making its thickness is 12nm, obtains forming the laminate of hard layer.

Then, by stretching device, the length of laminate is stretched to the length of 5 times, along the Length Contraction 50% of the normal direction of draw direction (, the deformation rate of distortion is 50%), obtain hard layer and there is the peak-valley pattern formed sheet along draw direction with periodic wavy relief pattern.

(comparative example 10)

Except coating polymethylmethacrylate, making its thickness is beyond 60nm, the same with embodiment 25, obtains peak-valley pattern formed sheet.

(comparative example 11)

Except used thickness is that 50 μ m, the Young modulus 2 axle stretching polyethylene terephthalate thin film (G2 processed of Teijin Ltd) that are 5GPa replace shrinkable film, the same with embodiment 25, attempt to obtain relief pattern operation sheet.Yet, fail to form wavy relief pattern, do not obtain relief pattern operation sheet.

(comparative example 12)

Thickness in the thermal shrinkage of single shaft direction is polyethylene terephthalate shrinkable film (the Mitsubishi Plastic that 50 μ m, Young modulus are 3GPa, Inc. the HISHIPET LX-10S manufacturing, 70 ℃ of glass transition temperatures) on a face, polymethylmethacrylate (Port リ マ mono-P4831-MMA processed of ソYi ス Co., Ltd. of dilution with toluene for coating, glass transition temperature is 100 ℃), making its thickness is 12nm, has obtained forming the laminate of surface smoothing hard layer.

Then, this laminate is heated 1 minute at 70 ℃, make it be retracted to 97% (that is, the deformation rate of distortion is 3%) of the front length of heating, obtain relief pattern operation with beyond sheet, the same with embodiment 25, obtain peak-valley pattern formed sheet.

(comparative example 13)

Thickness in the thermal shrinkage of single shaft direction is 50 μ m, Young modulus is polyethylene terephthalate shrinkable film (the Mitsubishi Plastic of 3GPa, Inc. the HISHIPET LX-10S manufacturing, glass transition temperature is 70 ℃) a face on, adopt spin-coating method, dimethyl silicone polymer (the KS 847T of Shin-Etsu Chemial Co., Ltd that coating is 2MPa by the Young modulus of dilution with toluene, glass transition temperature is-120 ℃) and the dispersion liquid of platinum catalyst (PS-1 of Shin-Etsu Chemial Co., Ltd), making its thickness is 12nm, obtained forming the laminate of hard layer.

Then, this laminate is heated 1 minute at 100 ℃, attempt is by making its heat shrink obtain peak-valley pattern formed sheet, but fails to make the hard layer distortion of crawling, and fails to form wavy relief pattern.

(embodiment 30)

The peak-valley pattern formed sheet being obtained by embodiment 25 is used as operation sheet, obtain in accordance with the following methods optical element.

That is,, on the face that is formed with relief pattern of the operation sheet being obtained by embodiment 25, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face that film, that do not join with operation sheet of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, above cellulose triacetate film, carry out ultraviolet ray and irradiate, uncured curable resin is solidified, this solidfied material is peeled off from operation sheet, obtain optical element.

(embodiment 31)

The peak-valley pattern formed sheet being obtained by embodiment 25, as operation sheet, is obtained to optical element in accordance with the following methods.

That is, on the face that is formed with relief pattern of the operation sheet being obtained by embodiment 25, implement nickel plating, this nickel coating is peeled off, obtaining thickness is the nickel plating sheet of 200 μ m.On the face that is formed with relief pattern of this nickel plating sheet, coating contains the uncured ultra-violet solidified resin composition that epoxy acrylate is prepolymer, 2-ethylhexyl acrylate and benzophenone series Photoepolymerizationinitiater initiater.

Then,, on the face that film, that do not join with operation sheet of uncured ultra-violet solidified resin composition, superimposed thickness is the cellulose triacetate film of 50 μ m, then presses.

Then, above cellulose triacetate film, carry out ultraviolet ray and irradiate, uncured curable resin is solidified, this solidfied material is peeled off from operation sheet, obtain optical element.

(embodiment 32)

Except using heat-curable epoxy resin to replace ultra-violet solidified resin composition, use heating to replace ultraviolet ray to irradiate to make beyond this heat-curing resin solidifies, the same with embodiment 31, obtain optical element.

(embodiment 33)

The same with embodiment 11, obtaining thickness is the nickel plating sheet of 200 μ m.On the face that is formed with relief pattern of this nickel plating sheet, superimposed thickness is the polymethyl methacrylate film of 50 μ m, and heating.From both sides, press thermoplastic polymethyl methacrylate film and nickel plating sheet, then make its cooling curing, it is peeled off from nickel plating sheet, obtain peak-valley pattern formed sheet.

By atomic force microscope (Veeco Instruments manufacture NanoScopeIII), from the photograph above of the optical element of the peak-valley pattern formed sheet of embodiment 25~33, comparative example 10~13.

Utilize the image of atomic force microscope to measure the degree of depth of relief pattern at 10 places of optical element of the peak-valley pattern formed sheet of embodiment 25~33, comparative example 10~13, these values are average, try to achieve mean depth.

These values are shown in table 3.

In addition, based on following benchmark, by the mode spacing of relief pattern and the mean depth of bottom, evaluate the well-formedness as light diffusion body.This evaluation result is shown in table 3.

Zero: the mode spacing of relief pattern is below 1 μ m, take mode spacing as 100% time, mean depth is more than 10%, suitable to optical element.

*: the mode spacing of relief pattern surpasses below 1 μ m, or, take mode spacing as 100% time, mean depth, lower than 10%, is not suitable as optical element.

Table 3

The laminate that makes to be provided with the hard layer consisting of than high the 2nd more than 10 ℃ resin of the 1st resin glass transition temperature on a face of the 1st resinous base material the crawl embodiment 25~29 of distortion, the manufacture method of comparative example 10,12, can easily manufacture peak-valley pattern formed sheet.In addition, the mode spacing of the relief pattern of the peak-valley pattern formed sheet being obtained by embodiment 25~29 is below 1 μ m, and when aforementioned mode spacing is 100%, the mean depth of bottom is more than 10%, suitable to optical element.In embodiment 25~29, can obtain mode spacing as described above and mean depth, this is that deformation rate is more than 50% because the thickness of surface smoothing hard layer is below 50nm.

In addition, by the manufacture method of the embodiment 30~33 using the peak-valley pattern formed sheet being obtained by embodiment 25 as operation sheet, can manufacture easily optical element, make it have the mode spacing equal with peak-valley pattern formed sheet and the relief pattern of mean depth.

In addition, in comparative example 10, because the thickness of surface hard smooth layer surpasses 50nm, the mode spacing of the relief pattern of the peak-valley pattern formed sheet therefore obtaining surpasses 1 μ m.In addition, because the deformation rate of comparative example 12 is 3%, take mode spacing as 100% time, the mean depth of the relief pattern bottom of the peak-valley pattern formed sheet obtaining is lower than 10%.Therefore, they are not necessarily suitable for use as optical element.

With respect to this, as resin bed, use the manufacture method of the comparative example 13 of the laminate that the comparative example 11 of 2 axle stretching polyethylene terephthalate thin film and the glass transition temperature of use the 2nd resin are lower than the 1st resin, due to the distortion of not crawling of surface smoothing hard layer, therefore do not form relief pattern.

utilizability in industry

Peak-valley pattern formed sheet of the present invention can be used as light diffusion body, can manufacture easily.By the manufacture method of peak-valley pattern formed sheet of the present invention, can manufacture easily the peak-valley pattern formed sheet as light diffusion body.

The anisotropy of the diffusion of light diffusion body of the present invention is excellent.By light diffusion system of the present invention, make the manufacture method with operation sheet and light diffusion body, can manufacture easy and in large quantities light diffusion body, it is formed with and there is the mode spacing equal with peak-valley pattern formed sheet and the relief pattern of mean depth.

The objective optics excellent of optical sheet of the present invention, and can easily make optical characteristics inhomogeneous.The target light diffusive of light diffusing patch of the present invention is excellent, and can easily make optical diffuse inhomogeneous.

By diffusion light conductor of the present invention and back light unit, can make the light that sends from light source anisotropic diffusion fully.

Peak-valley pattern formed sheet of the present invention, suitable to optical element uses such as antireflection object, polarizers.In addition, peak-valley pattern formed sheet of the present invention is also suitable to be used with operation sheet as Optical element manufacturing, and it is reserved as the mould of manufacturing the optical element with wavy relief pattern.

Claims (2)

1. the manufacture method of a peak-valley pattern formed sheet, it is characterized in that, have on resin base material is a face of heat shrink film, arrange surface smoothing, thickness forms the operation of laminate for surpassing 0.05 μ m and the resin hard layer below 5.0 μ m, with by heating described laminate, make described heat shrink film shrink to make the operation of at least described hard layer folded deformation of described laminate
Described hard layer is that the high 10 ℃ of above resins of the resin of heat shrink film form by glass transition temperature than forming described base material.
2. the manufacture method of peak-valley pattern formed sheet according to claim 1, wherein said resin base material is that heat shrink film is single shaft direction heat shrink film.
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