TW201401354A - Sheet cutting apparatus, chip manufacturing apparatus, sheet cutting method, chip manufacturing method, and sheet cutting program - Google Patents
Sheet cutting apparatus, chip manufacturing apparatus, sheet cutting method, chip manufacturing method, and sheet cutting program Download PDFInfo
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- TW201401354A TW201401354A TW102111682A TW102111682A TW201401354A TW 201401354 A TW201401354 A TW 201401354A TW 102111682 A TW102111682 A TW 102111682A TW 102111682 A TW102111682 A TW 102111682A TW 201401354 A TW201401354 A TW 201401354A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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Abstract
Description
根據專利法,本案主張於2012年4月20日提出申請之日本專利申請案第2012-96494號之優先權,其揭露內容藉由參照全部於此併入。 According to the patent law, the present application claims priority to Japanese Patent Application No. 2012-96494, filed on Apr. 20, 2012, the disclosure of which is hereby incorporated by reference.
本發明係關於一種片材切割設備、晶片製造設備、片材切割方法、晶片製造方法及片材切割程式。 The present invention relates to a sheet cutting apparatus, a wafer manufacturing apparatus, a sheet cutting method, a wafer manufacturing method, and a sheet cutting program.
晶片製造包括研磨半導體晶圓(以下簡稱為晶圓)之程序及切割晶圓之程序。當將該晶圓研磨時,將用以保護該晶圓之前表面(電路表面)的保護膠帶(例如背面研磨(BG)膠帶)、及用以保護該晶圓之後表面之晶片內面保護膠帶(LC tape)黏附,以防止該晶圓表面為研磨液所污染。再者,當該晶圓於研磨後切割時,將切割膠帶黏附於該晶圓之後表面以防止個片化之晶片散落。該保護膠帶、晶片內面保護膠帶、切割膠帶及類似者在以下集體稱為片材。 Wafer manufacturing includes a process of polishing a semiconductor wafer (hereinafter referred to as a wafer) and a process of cutting a wafer. When the wafer is polished, a protective tape (such as a backside grinding (BG) tape) for protecting the front surface (circuit surface) of the wafer, and a wafer inner protective tape for protecting the back surface of the wafer ( LC tape) adheres to prevent the wafer surface from being contaminated by the slurry. Furthermore, when the wafer is cut after grinding, a dicing tape is adhered to the back surface of the wafer to prevent the singulated wafer from scattering. The protective tape, the wafer inner surface protective tape, the dicing tape, and the like are collectively referred to as sheets in the following.
當將晶圓研磨時,保護晶圓表面之片材沿著晶圓周邊切割以防止該片材移動與剝離的狀況,此狀況可導致該晶圓表面的污染或如發生於晶圓和片材的黏附端之破損。此時,將該片材較佳地於十分靠近該晶圓之周邊的位置切割。 When the wafer is ground, the sheet protecting the surface of the wafer is cut along the periphery of the wafer to prevent the sheet from moving and peeling, which may result in contamination of the surface of the wafer or as occurs in wafers and sheets. The damage of the adhesive end. At this time, the sheet is preferably cut at a position very close to the periphery of the wafer.
例如,根據日本公開專利公報第2007-288010號所揭露之片材切割方法,其擷取晶圓周邊形狀之影像,且控制切割器刀片根據該影像 化資料切割該片材。 For example, according to the sheet cutting method disclosed in Japanese Laid-Open Patent Publication No. 2007-288010, an image of the shape of the periphery of the wafer is taken, and the cutter blade is controlled according to the image. The material is cut into the sheet.
由於以日本公開專利公報第2007-288010號中揭露之片材切割方法藉切割器刀片切割片材,該切割刀片可能接觸晶圓而可能造成晶圓的損傷。 Since the sheet cutting method by the cutter blade is used to cut the sheet by the sheet cutting method disclosed in Japanese Laid-Open Patent Publication No. 2007-288010, the cutting blade may contact the wafer and may cause damage to the wafer.
本發明旨在解決前述之問題,且致力於提供片材切割設備、晶片製造設備、片材切割方法、晶片製造方法、及片材切割程式,使其能夠抑制對片材所黏附之黏附件的損傷。 The present invention is directed to solving the aforementioned problems, and is directed to providing a sheet cutting apparatus, a wafer manufacturing apparatus, a sheet cutting method, a wafer manufacturing method, and a sheet cutting program, which are capable of suppressing adhesion of an adhesive attached to a sheet. damage.
根據本發明之一示例性之實施樣態,片材切割設備藉雷射光束沿著黏附件之周邊將黏附於該黏附件之片材切割。 According to an exemplary embodiment of the present invention, the sheet cutting apparatus cuts the sheet adhered to the adhesive attachment by a laser beam along the periphery of the adhesive attachment.
根據本發明之一示例性之實施樣態,片材切割方法藉雷射光束沿著黏附件之周邊將黏附於該黏附件之片材切割。 According to an exemplary embodiment of the present invention, a sheet cutting method cuts a sheet adhered to the adhesive attachment by a laser beam along a periphery of the adhesive attachment.
根據本發明之一示例性之實施樣態,片材切割程式造成電腦執行下列程序:獲取形成於黏附件中對準標記之位置資訊;控制雷射光束輸出裝置、及支撐裝置之一,該支撐裝置根據獲取之對準記號的位置資訊支撐黏附件;及藉自雷射光束輸出裝置之雷射光束沿著黏附件之周邊切割黏附於該黏附件之片材。 According to an exemplary embodiment of the present invention, the sheet cutting program causes the computer to execute the following program: acquiring position information of the alignment mark formed in the adhesive attachment; controlling the laser beam output device, and one of the supporting devices, the support The device supports the adhesive attachment according to the position information of the acquired alignment mark; and the laser beam borrowed from the laser beam output device cuts the sheet adhered to the adhesive attachment along the periphery of the adhesive attachment.
1‧‧‧片材切割設備 1‧‧‧Sheet cutting equipment
2‧‧‧支撐部 2‧‧‧Support
3‧‧‧雷射光束輸出部 3‧‧‧Laser beam output
4‧‧‧控制器 4‧‧‧ Controller
5‧‧‧片材 5‧‧‧Sheet
6‧‧‧晶圓 6‧‧‧ Wafer
7‧‧‧框 7‧‧‧ box
10‧‧‧片材切割設備 10‧‧‧Sheet cutting equipment
11‧‧‧影像擷取部 11‧‧‧Image Capture Department
12‧‧‧晶圓 12‧‧‧ wafer
13‧‧‧對準標記 13‧‧‧ alignment mark
20‧‧‧片材切割設備 20‧‧‧Sheet cutting equipment
21‧‧‧片材 21‧‧‧Sheet
22‧‧‧支撐部 22‧‧‧Support
23‧‧‧影像擷取部 23‧‧‧Image Capture Department
L‧‧‧雷射光束 L‧‧‧Laser beam
本發明上述及其他之目標、特徵、及優點將於下由詳細之敘述及隨附之圖式變得更易於完整了解,提供該圖示以單作為說明性用因而非用以限制本發明。 The above and other objects, features and advantages of the present invention will become more fully understood from the description of the appended claims.
根據本發明之第一示例性實施例,圖1係一示意圖,其顯示片材切割設備;根據本發明之第一示例性實施例,圖2係一示意圖,其顯示在該片材切割設備中之支撐部;根據本發明之第一示例性實施例,圖3係一示意圖,其顯示在該片材切割設備中之另一雷射光束切割部;根據本發明之第一示例性實施例,圖4係一流程圖,其顯示該片材切割設備之操作; 圖5係一示意圖,顯示切割片材時一較佳的切割位置;根據本發明之第二示例性實施例,圖6係一示意圖,其顯示一片材切割設備;根據本發明之第二示例性實施例,圖7係一示意圖,其顯示使用於該片材切割設備中之晶圓;圖8係一線圖,顯示形成於該晶圓之對準標記;根據本發明之第二示例性實施例,圖9係一流程圖,其顯示該片材切割設備之操作;及根據本發明之第三示例性實施例,圖10係一示意圖,其顯示一片材切割設備。 1 is a schematic view showing a sheet cutting apparatus according to a first exemplary embodiment of the present invention; FIG. 2 is a schematic view showing the sheet cutting apparatus according to the first exemplary embodiment of the present invention. a support portion; according to a first exemplary embodiment of the present invention, FIG. 3 is a schematic view showing another laser beam cutting portion in the sheet cutting device; according to the first exemplary embodiment of the present invention, Figure 4 is a flow chart showing the operation of the sheet cutting apparatus; Figure 5 is a schematic view showing a preferred cutting position when cutting a sheet; Figure 6 is a schematic view showing a sheet cutting device according to a second exemplary embodiment of the present invention; a second example according to the present invention 7 is a schematic view showing a wafer used in the sheet cutting apparatus; FIG. 8 is a line diagram showing an alignment mark formed on the wafer; a second exemplary embodiment according to the present invention For example, FIG. 9 is a flow chart showing the operation of the sheet cutting apparatus; and FIG. 10 is a schematic view showing a sheet cutting apparatus according to a third exemplary embodiment of the present invention.
根據本發明示例性實施例每一者之一種片材切割設備、晶片製造設備、片材切割方法、晶片製造方法、及片材切割程式將在以下加以敘述。然而吾人應當注意,本發明並不為以下之示例性實施例所限制。為使敘述清晰之緣故,將以下之敘述與圖示適當地簡化。 A sheet cutting device, a wafer manufacturing apparatus, a sheet cutting method, a wafer manufacturing method, and a sheet cutting program according to each of the exemplary embodiments of the present invention will be described below. However, it should be noted that the present invention is not limited by the following exemplary embodiments. For the sake of clarity of the description, the following description and illustration are appropriately simplified.
<第一示例性實施例> <First Exemplary Embodiment>
雖然圖示並未顯示,根據此示例性實施例之晶片製造設備將片材黏附於晶圓之前表面以研磨該晶圓之後表面,而在該片材剝離之後將片材黏附於該晶圓之該後表面以切割該晶圓。雖然該晶圓如一般的晶圓具有一圓盤之形狀,但該形狀並不特定地為此所限制。 Although not shown in the drawings, the wafer manufacturing apparatus according to this exemplary embodiment adheres a sheet to a front surface of the wafer to polish the surface of the wafer, and adheres the sheet to the wafer after the sheet is peeled off. The back surface is to cut the wafer. Although the wafer has a shape of a disk such as a general wafer, the shape is not specifically limited thereto.
總之,此示例性實施例之主要特徵係一種設備,該設備切割在晶片製造設備中黏附於晶圓之片材(特別是表面保護片材)。因此,在以下的敘述中,將詳細地敘述片材切割設備,而將省略其他構件的敘述。 In summary, the main feature of this exemplary embodiment is an apparatus that cuts a sheet (particularly a surface protection sheet) adhered to a wafer in a wafer manufacturing apparatus. Therefore, in the following description, the sheet cutting device will be described in detail, and the description of other members will be omitted.
更具體而言,如圖1所顯示,片材切割設備1包括支撐部2、雷射光束輸出部3、及控制器4。 More specifically, as shown in FIG. 1, the sheet cutting apparatus 1 includes a support portion 2, a laser beam output portion 3, and a controller 4.
支撐部2支撐晶圓6,片材5黏附至晶圓6之前表面。根據此示例性實施例的支撐部2支撐該晶圓6,以將該晶圓6之前表面面朝上地配置。該片材5係可為一般使用之片材。具體而言,該片材5為例如由合成樹脂構成之片材件,且以熱壓合至該晶圓6之表面。 The support portion 2 supports the wafer 6, and the sheet 5 is adhered to the front surface of the wafer 6. The support portion 2 according to this exemplary embodiment supports the wafer 6 to arrange the front surface of the wafer 6 face up. The sheet 5 can be a sheet generally used. Specifically, the sheet 5 is, for example, a sheet member made of a synthetic resin, and is thermally bonded to the surface of the wafer 6.
較佳地,支撐部2可移動於例如X軸方向、Y軸方向及Z軸方向,如圖2顯示,並且在包含X軸及Y軸之平面上以晶圓6之實質上的中心為軸(轉動角度θ)而轉動。 Preferably, the support portion 2 is movable in, for example, the X-axis direction, the Y-axis direction, and the Z-axis direction, as shown in FIG. 2, and is centered on the substantially center of the wafer 6 on a plane including the X-axis and the Y-axis. (rotation angle θ) and rotate.
雷射光束輸出部3係配置於支撐部2之上方。該雷射光束輸出部3,與典型之雷射光束輸出部類似地,包括:雷射震盪器、反射鏡、聚光透鏡及類似者。該雷射光束輸出部3可具有任何之結構。例如,雷射光束輸出部3可按照如圖1顯示之該雷射光束輸出部3之移動軌跡移動雷射光束L的照射位置,或者如圖3所顯示地,可將該雷射光束輸出部3固定而移動雷射光束L的照射位置本身。 The laser beam output unit 3 is disposed above the support unit 2. The laser beam output portion 3, similar to a typical laser beam output portion, includes a laser oscillator, a mirror, a collecting lens, and the like. The laser beam output portion 3 can have any structure. For example, the laser beam output portion 3 can move the irradiation position of the laser beam L according to the movement trajectory of the laser beam output portion 3 as shown in FIG. 1, or can be the laser beam output portion as shown in FIG. 3 Fixing and moving the irradiation position of the laser beam L itself.
雷射光束輸出部3發射出雷射光束L以沿著晶圓6的周緣切割黏附於晶圓6表面的片材5。總之,雷射光束輸出部3以雷射光束L照射晶圓6之周邊附近。如圖3所顯示,該片材5係黏附於一框7,以使當該片材5以該雷射光束L切割時,將該片材5保持於拉緊狀態。該晶圓6係配置於該框7之中空部之中。 The laser beam output portion 3 emits a laser beam L to cut the sheet 5 adhering to the surface of the wafer 6 along the circumference of the wafer 6. In short, the laser beam output portion 3 illuminates the vicinity of the periphery of the wafer 6 with the laser beam L. As shown in Fig. 3, the sheet 5 is adhered to a frame 7 so that when the sheet 5 is cut by the laser beam L, the sheet 5 is held in a tensioned state. The wafer 6 is disposed in the hollow portion of the frame 7.
此時,可藉由固定支撐部2及以控制器4控制在雷射光束輸出部3之中發出雷射光束L的位置,控制在片材5之上受雷射光束L照射的位置。另外,可藉由固定在雷射光束輸出部3之中發出雷射光束L的位置及以控制器4控制該支撐部2之位置,控制在片材5之上受雷射光束L照射的位置。 At this time, the position at which the laser beam L is irradiated on the sheet 5 can be controlled by the fixed support portion 2 and the position at which the laser beam L is emitted from the laser beam output portion 3 by the controller 4. Further, the position on the sheet 5 irradiated with the laser beam L can be controlled by fixing the position at which the laser beam L is emitted in the laser beam output portion 3 and controlling the position of the support portion 2 by the controller 4. .
雷射光束L的輸出係受控於控制器4。考量例如片材5之材料、厚度、或類似者,將該雷射光束L的輸出適當地設定。例如,當該雷射光束L的輸出係大的時候,該片材5之熔融速率高且切斷部分再凝固,這造成難以切割該片材5。此外,當該雷射光束的輸出係小的時候,該片材5之熔融速率低而不可能快速地切割該片材5。因此,將該雷射光束之輸出設定以達成適當的熔融速率。 The output of the laser beam L is controlled by the controller 4. The output of the laser beam L is appropriately set in consideration of, for example, the material, thickness, or the like of the sheet 5. For example, when the output of the laser beam L is large, the sheet 5 has a high melting rate and the cut portion resolidifies, which makes it difficult to cut the sheet 5. Further, when the output of the laser beam is small, the sheet 5 has a low melting rate and it is impossible to cut the sheet 5 quickly. Therefore, the output of the laser beam is set to achieve an appropriate melting rate.
較佳地,甚至當雷射光束L透射通過片材5且晶圓6受該雷射光束L所照射時,該雷射光束L在該晶圓6並不會造成不良效應。例如,由於晶圓6一般由矽構成,因此較佳使用CO2雷射光束、綠色雷射光束或類似者以作為該雷射光束L。 Preferably, even when the laser beam L is transmitted through the sheet 5 and the wafer 6 is illuminated by the laser beam L, the laser beam L does not cause an adverse effect on the wafer 6. For example, since the wafer 6 is generally composed of tantalum, it is preferable to use a CO 2 laser beam, a green laser beam or the like as the laser beam L.
如上述,控制器4控制支撐部2或雷射光束輸出部3。該控 制器4可根據儲存在該控制器4中之程式執行該支撐部2或雷射光束輸出部3之控制,或可使用硬體資源以執行控制。 As described above, the controller 4 controls the support portion 2 or the laser beam output portion 3. The control The controller 4 can perform control of the support portion 2 or the laser beam output portion 3 in accordance with a program stored in the controller 4, or can use hardware resources to perform control.
以上所述之片材切割設備1如圖4顯示般地操作。首先,運輸機構(未顯出)將具有前表面之晶圓6放置於支撐部2上,該晶圓以片材5黏附於晶圓6的該前表面(S1)。 The sheet cutting device 1 described above operates as shown in Fig. 4. First, the transport mechanism (not shown) places the wafer 6 having the front surface on the support portion 2, which is adhered to the front surface (S1) of the wafer 6 with the sheet 5.
其次,控制器4控制雷射光束輸出部3以使發射之雷射光束L具有預定之輸出(S2)。同時,支撐部2或雷射光束輸出部3之位置受到控制以使晶圓6之周邊周圍受該雷射光束L照射(S3)。因此,該晶圓6之該周邊周圍係以自雷射光束輸出部3發射出之雷射光束L加以照射。 Next, the controller 4 controls the laser beam output portion 3 so that the emitted laser beam L has a predetermined output (S2). At the same time, the position of the support portion 2 or the laser beam output portion 3 is controlled so that the periphery of the wafer 6 is irradiated with the laser beam L (S3). Therefore, the periphery of the wafer 6 is irradiated with the laser beam L emitted from the laser beam output portion 3.
其後,控制器4控制支撐部2或雷射光束輸出部3,使得以該雷射光束L照射之位置沿著晶圓6之周邊周圍移動(即該晶圓6之周向方向)(S4)。因此,將在片材5上以雷射光束L照射之位置熔化,且將以該雷射光束L照射於該片材5之位置的外圍(即該片材5自該晶圓6周邊往外突出之部分)與配置於自該晶圓6周邊往內之部分切開。 Thereafter, the controller 4 controls the support portion 2 or the laser beam output portion 3 such that the position irradiated with the laser beam L moves around the periphery of the wafer 6 (i.e., the circumferential direction of the wafer 6) (S4) ). Therefore, the position on the sheet 5 irradiated with the laser beam L is melted, and the laser beam L is irradiated to the periphery of the position of the sheet 5 (i.e., the sheet 5 protrudes outward from the periphery of the wafer 6). The portion is cut away from a portion disposed inward from the periphery of the wafer 6.
當晶圓6之整個周邊周圍經過雷射光束L加以照射,控制器4停止自雷射光束輸出部3發射雷射光束L,且終止支撐部2或雷射光束輸出部3之控制(S5)。因此,將片材5自該晶圓6周邊往外突出之部分移除。 When the entire periphery of the wafer 6 is irradiated by the laser beam L, the controller 4 stops emitting the laser beam L from the laser beam output portion 3, and terminates the control of the support portion 2 or the laser beam output portion 3 (S5) . Therefore, the portion of the sheet 5 that protrudes outward from the periphery of the wafer 6 is removed.
如上述地將片材5以雷射光束L切割,從而在切割該片材5之時能夠防止損傷晶圓6。 The sheet 5 is cut by the laser beam L as described above, so that the wafer 6 can be prevented from being damaged when the sheet 5 is cut.
如圖5顯示,一般晶圓6之側表面具有彎曲表面,且當晶圓6進行研磨時,片材5與該晶圓6之黏附端周圍產生應力集中。為了減少片材5自與該晶圓6的黏附端突出之部分,較佳將該片材5於該黏附端周圍切割。例如當以垂直的方向觀看時,較佳將該片材5於晶圓6之中的彎曲區域R處切割。在這情況下,不像一般之片材切割設備,該晶圓6並不具有切割器刀片造成之損傷,因此能夠以良好的狀態將該片材5於極靠近與該晶圓6之接觸端的位置加以切割。因此,當該晶圓6進行研磨時,可抑制對該晶圓6的損傷。可替代性地,可將該片材5在該片材5與該晶圓6之黏附端內側加以切割。 As shown in FIG. 5, the side surface of the general wafer 6 has a curved surface, and when the wafer 6 is polished, stress concentration occurs around the adhesion end of the sheet 5 and the wafer 6. In order to reduce the portion of the sheet 5 that protrudes from the adhesion end of the wafer 6, the sheet 5 is preferably cut around the adhesion end. For example, when viewed in a vertical direction, the sheet 5 is preferably cut at a curved region R in the wafer 6. In this case, unlike the conventional sheet cutting apparatus, the wafer 6 does not have the damage caused by the cutter blade, so that the sheet 5 can be brought into close contact with the wafer 6 in a good state. The position is cut. Therefore, when the wafer 6 is polished, damage to the wafer 6 can be suppressed. Alternatively, the sheet 5 can be cut inside the adhesion end of the sheet 5 and the wafer 6.
<第二示例性實施例> <Second exemplary embodiment>
根據此示例性實施例的晶片製造設備,與根據第一示例性實 施例中之晶片製造設備實質上具有相似之結構。根據此示例性實施例的晶片製造設備具有一結構,其中片材切割設備係能夠以高度精確度切割片材5。在以下之敘述中,將省略重複之敘述,且相同之構件係以相同之參考符號代表。 A wafer manufacturing apparatus according to this exemplary embodiment, and according to the first exemplary embodiment The wafer manufacturing apparatus in the embodiment has substantially the same structure. The wafer manufacturing apparatus according to this exemplary embodiment has a structure in which the sheet cutting apparatus is capable of cutting the sheet 5 with high precision. In the following description, the repeated description is omitted, and the same components are denoted by the same reference numerals.
如圖6顯示,根據本示例性實施例,片材切割設備10除了支撐部2、雷射光束輸出部3、及控制器4之外還包括一影像擷取部11。 As shown in FIG. 6, according to the present exemplary embodiment, the sheet cutting device 10 includes an image capturing portion 11 in addition to the support portion 2, the laser beam output portion 3, and the controller 4.
如圖7顯示,根據本示例性實施例,將一或複數個對準標記13形成於晶圓12之表面上。形成該對準標記13以使其能以影像擷取部11擷取影像,且如圖8所顯示之實例中對準標記13係以十字形形成。然而,該對準標記不為此所限制。 As shown in FIG. 7, one or a plurality of alignment marks 13 are formed on the surface of the wafer 12 according to the present exemplary embodiment. The alignment mark 13 is formed so that it can capture an image by the image capturing portion 11, and the alignment mark 13 is formed in a cross shape as in the example shown in FIG. However, the alignment mark is not limited by this.
舉例來說,較佳地,將對準標記13形成於未商品化(例如,用以測試之晶片部)之晶片部。再者,例如可使用用於切割之標記以作為該對準標記13。 For example, preferably, the alignment mark 13 is formed on a wafer portion that is not commercially available (for example, a wafer portion to be tested). Further, for example, a mark for cutting may be used as the alignment mark 13.
由於對準標記13係透過片材5而加以擷取影像,較佳使用透明或半透明之片材以作為片材5。 Since the alignment mark 13 is imaged by the sheet 5, a transparent or translucent sheet is preferably used as the sheet 5.
將影像擷取部11排列於支撐部2之上方。配置該影像擷取部11以使其能夠擷取晶圓12之對準標記13的至少一影像。與一般影像擷取元件相似地,該影像擷取部11包括一影像擷取元件,例如互補式金氧半導體(CMOS)或電荷耦合元件(CCD)影像感應器,並且輸出獲得之影像至控制器4。 The image capturing unit 11 is arranged above the support unit 2. The image capturing unit 11 is configured to be capable of capturing at least one image of the alignment mark 13 of the wafer 12. Similar to the general image capturing component, the image capturing portion 11 includes an image capturing component, such as a complementary metal oxide semiconductor (CMOS) or charge coupled device (CCD) image sensor, and outputs the obtained image to the controller. 4.
控制器4根據輸入影像控制支撐部2之位置。具體而言,該控制器4自該輸入影像確定對準標記13之位置,且控制該支撐部2之位置,以將該對準標記13定位於預定之位置上。 The controller 4 controls the position of the support portion 2 based on the input image. Specifically, the controller 4 determines the position of the alignment mark 13 from the input image, and controls the position of the support portion 2 to position the alignment mark 13 at a predetermined position.
如圖9所顯示地操作片材切割設備10。具體而言,以下程序係執行於根據第一示例性實施例的片材切割設備1之操作中的程序S1及程序S2之間。 The sheet cutting device 10 is operated as shown in FIG. Specifically, the following procedure is executed between the program S1 and the program S2 in the operation of the sheet cutting apparatus 1 according to the first exemplary embodiment.
首先,與根據第一示例性實施例之該片材切割設備1相似,執行S1程序。其次控制器4控制影像擷取部11且造成該影像擷取部11透過片材5擷取晶圓6之對準標記13的影像(S11)。該影像擷取部11將獲得之影像輸出至該控制器4(S12)。 First, similar to the sheet cutting apparatus 1 according to the first exemplary embodiment, the S1 program is executed. Next, the controller 4 controls the image capturing unit 11 and causes the image capturing unit 11 to capture the image of the alignment mark 13 of the wafer 6 through the sheet 5 (S11). The image capturing unit 11 outputs the obtained image to the controller 4 (S12).
其次,控制器4執行例如二元化處理於輸入之影像上,而後取得多個特徵點以獲取對準標記13之位置資訊(S13)。 Next, the controller 4 performs, for example, binarization processing on the input image, and then acquires a plurality of feature points to acquire position information of the alignment mark 13 (S13).
其次,控制器4預先地包含對準標記13之正規位置資訊。該控制器4比較該對準標記13的正規位置資訊及經影像擷取之對準標記13之位置資訊,且控制如圖2所顯示的支撐部2之X軸方向、Y軸方向、與旋轉角度θ,以將經擷取影像之該對準標記13定位至正規位置(S14)。 Second, the controller 4 previously contains the normal position information of the alignment mark 13. The controller 4 compares the normal position information of the alignment mark 13 with the position information of the alignment mark 13 captured by the image, and controls the X-axis direction, the Y-axis direction, and the rotation of the support portion 2 as shown in FIG. The angle θ is used to position the alignment mark 13 of the captured image to a normal position (S14).
以下之程序包括程序S2至程序S5,其與根據第一示例性實施例之該片材切割設備1之中者相似。當注意的是可將用以控制支撐部2之位置的對準標記13的擷取影像程序與切割片材5之程序執行於同一處。另外,如圖6所顯示,在擷取對準標記13之影像及控制支撐部2的位置之後,該支撐部2可藉運輸機構(未顯出)移動以切割該片材5。 The following program includes the program S2 to the program S5, which is similar to the one in the sheet cutting device 1 according to the first exemplary embodiment. It is to be noted that the captured image program of the alignment mark 13 for controlling the position of the support portion 2 can be executed at the same place as the program for cutting the sheet 5. Further, as shown in FIG. 6, after capturing the image of the alignment mark 13 and controlling the position of the support portion 2, the support portion 2 can be moved by a transport mechanism (not shown) to cut the sheet 5.
以如此的方式,片材5待切割的位置係根據晶圓6上形成之對準標記13的位置資訊而加以控制。因此,如圖5所顯示,可以雷射光束L精確地沿著該晶圓6及片材5的黏附端之周邊周圍切割該片材5。 In this manner, the position at which the sheet 5 is to be cut is controlled in accordance with the positional information of the alignment mark 13 formed on the wafer 6. Therefore, as shown in FIG. 5, the laser beam L can be cut along the periphery of the periphery of the adhesion end of the wafer 6 and the sheet 5 accurately.
<第三示例性實施例> <Third Exemplary Embodiment>
根據第二示例性實施例的片材切割設備10切割黏附於晶圓6前表面之片材5,而根據此示例性實施例之片材切割設備20切割黏附於該晶圓6後表面之片材21。在以下的敘述,將省略重複之敘述,且相同之構件係以相同之參考符號代表。 The sheet cutting device 10 according to the second exemplary embodiment cuts the sheet 5 adhered to the front surface of the wafer 6, and the sheet cutting device 20 according to this exemplary embodiment cuts the sheet adhered to the rear surface of the wafer 6. Material 21. In the following description, the repeated description is omitted, and the same components are denoted by the same reference numerals.
如圖10所顯示,根據此示例性實施例,片材切割設備20包括支撐部22、雷射光束輸出部3、控制器4、及影像擷取部23,其與根據第二示例性實施例之片材切割設備10實質上相似。 As shown in FIG. 10, according to this exemplary embodiment, the sheet cutting apparatus 20 includes a support portion 22, a laser beam output portion 3, a controller 4, and an image capturing portion 23, which according to the second exemplary embodiment The sheet cutting apparatus 10 is substantially similar.
支撐部22支撐晶圓6,以使片材21所黏附之該晶圓6的後表面側朝上配置。此時,將形成於該晶圓6前表面的對準標記係配置於該支撐部22之側。根據本示例性實施例,該支撐部22具有如此一結構,該結構藉由設置於該支撐部22下方的影像擷取部23能夠透過該支撐部22擷取對準標記之影像。例如該支撐部22係以例如可讓光穿透之玻璃的構件形成。可替代性地,該支撐部22可具有一中空部,使對準標記之影像可自該中空部擷取。 The support portion 22 supports the wafer 6 such that the rear surface side of the wafer 6 to which the sheet 21 is adhered is disposed upward. At this time, the alignment mark formed on the front surface of the wafer 6 is disposed on the side of the support portion 22. According to the present exemplary embodiment, the support portion 22 has a structure through which the image capturing portion 23 disposed under the support portion 22 can capture an image of the alignment mark through the support portion 22. For example, the support portion 22 is formed of, for example, a member that allows light to pass through the glass. Alternatively, the support portion 22 can have a hollow portion from which an image of the alignment mark can be drawn.
因此,根據此示例性實施例,片材切割設備20能夠以與根 據第二示例性實施例之片材切割設備10同樣之程序,切割黏附於晶圓6後表面之片材21。 Therefore, according to this exemplary embodiment, the sheet cutting device 20 can be rooted According to the same procedure of the sheet cutting device 10 of the second exemplary embodiment, the sheet 21 adhered to the rear surface of the wafer 6 is cut.
雖然根據本示例性實施例黏附於晶圓6的後表面之片材21於片材切割設備20中切割,但相似的操作亦可執行於如下情況:黏附於晶圓6的前表面之片材係不透明且對準標記形成於晶圓6的後表面上。 Although the sheet 21 adhered to the rear surface of the wafer 6 according to the present exemplary embodiment is cut in the sheet cutting device 20, a similar operation can be performed in the case where the sheet adhered to the front surface of the wafer 6 The opaque and alignment marks are formed on the rear surface of the wafer 6.
<第四示例性實施例> <Fourth Exemplary Embodiment>
雖然支撐部2(22)的位置在第二及第三示例性實施例中係依據對準標記控制之位置資訊而加以控制,亦可將雷射光束輸出部3之雷射光束L照射在片材5(21)的位置加以控制。 Although the position of the support portion 2 (22) is controlled in accordance with the position information of the alignment mark control in the second and third exemplary embodiments, the laser beam L of the laser beam output portion 3 may be irradiated on the sheet. The position of the material 5 (21) is controlled.
在這個情況下,控制器4預先包含與對準標記相關之雷射光束輸出部3之位置資訊,且控制該雷射光束輸出部3之位置以使該位置資訊與受到影像擷取之對準標記的位置資訊一致。 In this case, the controller 4 previously includes the position information of the laser beam output portion 3 associated with the alignment mark, and controls the position of the laser beam output portion 3 to align the position information with the image capture. The location information of the tag is consistent.
本發明並不為前述之實施例所限制,但也可在不背離本發明之精神的情況下依適用情況改變。 The present invention is not limited by the foregoing embodiments, but may be modified as appropriate without departing from the spirit of the invention.
雖然實施例中所敘述之片材5由合成樹脂構成,但只要能夠黏附於晶圓6之前表面或後表面,不特定地限制於此。例如,其中一體地形成用以塑造晶圓6表面之樹脂層的材料係可同樣地加以切割。 Although the sheet 5 described in the embodiment is composed of a synthetic resin, it is not particularly limited as long as it can adhere to the front surface or the rear surface of the wafer 6. For example, a material in which a resin layer for integrally molding the surface of the wafer 6 is integrally formed can be similarly cut.
根據示例性實施例,雖將CO2雷射光束、或綠雷射光束使用作雷射光束L,但仍可使用其他之雷射光束。 According to an exemplary embodiment, although a CO 2 laser beam or a green laser beam is used as the laser beam L, other laser beams may be used.
根據示例性實施例,雖將黏附於晶圓之片材切割,該片材所黏附之構件並未特定地加以限制。 According to an exemplary embodiment, although the sheet adhered to the wafer is cut, the member to which the sheet is attached is not specifically limited.
雖然本發明參考示例性實施例特定地顯示及敘述,但本發明並未為這些實施例所限制。對熟知此技藝者可了解在不背離由申請專利範圍所界定的本發之精神與範圍的情況下可以在形式上及細節上作各種改變。 While the present invention has been particularly shown and described with respect to the exemplary embodiments, the invention is not limited by the embodiments. Various changes in form and detail may be made without departing from the spirit and scope of the invention as defined by the appended claims.
可將程式儲存且提供至電腦,該電腦使用任何種類之非暫時性電腦可讀取媒體。非暫時性電腦包括任何種類有形之儲存媒體。非暫時性電腦可讀取媒體之示例包括磁性儲存媒體(如軟碟、磁帶、硬碟機等)、光學磁性儲存媒體(例如磁光碟)、CD-ROM(唯讀光碟)、CD-R(可錄式光碟)、CD-R/W(可覆寫光碟)、及半導體記憶體(如遮罩唯讀記憶體(mask ROM)、可 程式唯讀記憶體(PROM)、可抹除可程式唯讀記憶體(EPROM)、快閃唯讀記憶體(flash ROM)、動態隨機存取記憶體(RAM)等)。可將該程式提供至電腦,該電腦使用任何種類之暫時性電腦可讀取媒體。暫時性電腦可讀取媒體之實施例包括電子信號、光學信號、及電磁波。暫時性電腦可讀取媒體可藉由有線之通信線路(例如電線、及光纖)或無線通信提供該程式至一電腦。 The program can be stored and provided to a computer that uses any type of non-transitory computer readable media. Non-transitory computers include any kind of tangible storage media. Examples of non-transitory computer readable media include magnetic storage media (such as floppy disks, tapes, hard drives, etc.), optical magnetic storage media (such as magneto-optical disks), CD-ROM (CD-ROM only), CD-R ( Recordable disc), CD-R/W (rewritable disc), and semiconductor memory (such as mask read-only memory (mask ROM), Program-read only memory (PROM), erasable programmable read-only memory (EPROM), flash-only read-only memory (flash ROM), dynamic random access memory (RAM), etc. The program can be provided to a computer that can read media using any kind of temporary computer. Examples of transitory computer readable media include electronic signals, optical signals, and electromagnetic waves. Temporary computer readable media can be provided to a computer via wired communication lines (eg, wires, and fiber optics) or wireless communication.
2‧‧‧支撐部 2‧‧‧Support
3‧‧‧雷射光束輸出部 3‧‧‧Laser beam output
4‧‧‧控制器 4‧‧‧ Controller
5‧‧‧片材 5‧‧‧Sheet
10‧‧‧片材切割設備 10‧‧‧Sheet cutting equipment
11‧‧‧影像擷取部 11‧‧‧Image Capture Department
12‧‧‧晶圓 12‧‧‧ wafer
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JP2666788B2 (en) * | 1995-10-19 | 1997-10-22 | 日本電気株式会社 | Manufacturing method of chip size semiconductor device |
JPH1027836A (en) * | 1996-07-11 | 1998-01-27 | Sony Corp | Manufacture of semiconductor device and semiconductor manufacturing device |
JPH1032179A (en) * | 1996-07-15 | 1998-02-03 | Teikoku T-Pingu Syst Kk | Cutting of masking sheet for silicon wafer processing use |
JP3447518B2 (en) * | 1996-08-09 | 2003-09-16 | リンテック株式会社 | Adhesive sheet sticking apparatus and method |
KR19990039352U (en) * | 1998-04-09 | 1999-11-05 | 김영환 | Cutting device of semiconductor equipment |
JP3303294B2 (en) * | 1999-06-11 | 2002-07-15 | 株式会社東京精密 | Cutting method of semiconductor protective tape |
JP4475772B2 (en) * | 2000-08-08 | 2010-06-09 | 日東電工株式会社 | Protective tape application method and protective tape application device |
JP3938655B2 (en) * | 2000-08-25 | 2007-06-27 | 東レエンジニアリング株式会社 | Alignment device |
JP4618859B2 (en) * | 2000-10-10 | 2011-01-26 | 東レエンジニアリング株式会社 | Laminated wafer alignment method |
JP2006351599A (en) * | 2005-06-13 | 2006-12-28 | Tokyo Seimitsu Co Ltd | Dicing method |
JP5167089B2 (en) * | 2008-11-20 | 2013-03-21 | リンテック株式会社 | Support apparatus, support method, dicing apparatus, and dicing method |
US8680430B2 (en) * | 2008-12-08 | 2014-03-25 | Electro Scientific Industries, Inc. | Controlling dynamic and thermal loads on laser beam positioning system to achieve high-throughput laser processing of workpiece features |
JP2010165881A (en) * | 2009-01-16 | 2010-07-29 | Lintec Corp | Holding device for semiconductor wafer, and holding methodtherefor |
JP5572045B2 (en) * | 2010-09-09 | 2014-08-13 | リンテック株式会社 | Sheet sticking device and sticking method |
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2012
- 2012-04-20 JP JP2012096494A patent/JP5557352B2/en active Active
-
2013
- 2013-04-01 TW TW102111682A patent/TWI501306B/en active
- 2013-04-09 CN CN201310121336.9A patent/CN103372722B/en active Active
- 2013-04-15 KR KR20130040968A patent/KR101484726B1/en active IP Right Grant
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KR101484726B1 (en) | 2015-01-20 |
TWI501306B (en) | 2015-09-21 |
JP2013225562A (en) | 2013-10-31 |
KR20130118777A (en) | 2013-10-30 |
JP5557352B2 (en) | 2014-07-23 |
CN103372722A (en) | 2013-10-30 |
CN103372722B (en) | 2016-01-20 |
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