TW201344361A - Colored photosensitive resin composition - Google Patents

Colored photosensitive resin composition Download PDF

Info

Publication number
TW201344361A
TW201344361A TW102111109A TW102111109A TW201344361A TW 201344361 A TW201344361 A TW 201344361A TW 102111109 A TW102111109 A TW 102111109A TW 102111109 A TW102111109 A TW 102111109A TW 201344361 A TW201344361 A TW 201344361A
Authority
TW
Taiwan
Prior art keywords
pigment
meth
resin
group
mass
Prior art date
Application number
TW102111109A
Other languages
Chinese (zh)
Other versions
TWI617885B (en
Inventor
Masako Yoshida
Ryuichi Matsuura
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201344361A publication Critical patent/TW201344361A/en
Application granted granted Critical
Publication of TWI617885B publication Critical patent/TWI617885B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Abstract

The present invention provides a colored photosensitive resin composition comprising a colorant, a resin, a polymerization compound, a polymerization initiator and a solvent; wherein the colorant comprises C.I. pigment green 58 and at least one selected from the group consisting of a yellow pigment, a blue pigment, a red pigment, a violet pigment and an orange pigment, and the percentage of the colorant is 20 % by mass or more and 50% by mass or less relative to the total amount of the solid content.

Description

著色光敏性樹脂組成物 Colored photosensitive resin composition

本發明是關於著色光敏性樹脂組成物。 The present invention relates to a colored photosensitive resin composition.

著色光敏性樹脂組成物,使用於用以製造液晶顯示面板,電激發光面板,電漿顯示面板等顯示裝置所使用的彩色濾光片。就這種著色光敏性樹脂組成物而言,已知有一種組成物,其做為著色劑而含有C.I.顏料綠58與C.I.顏料黃138與C.I.顏料紅177,著色劑的含量相對於著色光敏性樹脂組成物的固形分為14質量%。 (JP2011-118051-A)。 The colored photosensitive resin composition is used for producing a color filter used for a display device such as a liquid crystal display panel, an electroluminescence panel, or a plasma display panel. In the case of such a colored photosensitive resin composition, a composition is known which contains CI Pigment Green 58 and CI Pigment Yellow 138 and CI Pigment Red 177 as a colorant, and the content of the colorant is relative to the coloring photosensitivity. The solid content of the resin composition was 14% by mass. (JP2011-118051-A).

以往所知的上述著色光敏性樹脂組成物,以微影蝕刻法形成著色圖案化塗膜時,顯影不能充分除去未曝光部分,有產生殘渣或有殘留膜的情況。 When the coloring photosensitive resin composition known in the prior art is formed into a colored patterned coating film by a photolithography method, the unexposed portion may not be sufficiently removed by development, and a residue may be generated or a residual film may be formed.

本發明含有以下的發明。 The present invention contains the following invention.

[1] 一種著色光敏性樹脂組成物,係含有著色劑、樹脂、聚合性化合物、聚合起始劑及溶劑,著色劑含有C.I.顏料綠58,由黃色顏料、藍色顏料、紅色顏料、紫色顏料及橙色顏料所成之群中所選的至少1種, 著色劑的含有率相對於固形分的總量為20質量%以上50質量%以下。 [1] A colored photosensitive resin composition comprising a colorant, a resin, a polymerizable compound, a polymerization initiator, and a solvent, the colorant comprising CI Pigment Green 58, from a yellow pigment, a blue pigment, a red pigment, a purple pigment And at least one selected from the group consisting of orange pigments, The content of the colorant is 20% by mass or more and 50% by mass or less based on the total amount of the solid content.

[2] 如[1]所述的著色光敏性樹脂組成物,其中,樹脂是具有源自由不飽和羧酸及不飽和羧酸酐所成之群中選擇的至少一種的結構單元的加成聚合物。 [2] The colored photosensitive resin composition according to [1], wherein the resin is an addition polymer having a structural unit of at least one selected from the group consisting of a source of a free unsaturated carboxylic acid and an unsaturated carboxylic anhydride; .

[3] 如[1]或[2]所述的著色光敏性樹脂組成物,其中,樹脂的含量與聚合性化合物的含量之比,以質量基準,為20:80至80:20。 [3] The colored photosensitive resin composition according to [1] or [2] wherein the ratio of the content of the resin to the content of the polymerizable compound is from 20:80 to 80:20 on a mass basis.

[4] 由如[1]至[3]的任一項所述的著色光敏性樹脂組成物所形成的彩色濾光片。 [4] A color filter formed of the colored photosensitive resin composition according to any one of [1] to [3].

[5] 含有如[4]所述的彩色濾光片的顯示裝置。 [5] A display device comprising the color filter according to [4].

若依本發明的著色光敏性樹脂組成物,則在以微影蝕刻法形成著色圖案化塗膜時有優異的顯影性。 According to the colored photosensitive resin composition of the present invention, excellent developability is obtained when the colored patterned coating film is formed by the photolithography method.

本發明的著色光敏性樹脂組成物,含有著色劑(A),樹脂(B),聚合性化合物(C),聚合起始劑(D)及溶劑(E)。 The colored photosensitive resin composition of the present invention contains a colorant (A), a resin (B), a polymerizable compound (C), a polymerization initiator (D), and a solvent (E).

本發明的著色光敏性樹脂組成物,以再含有硫醇化合物(T),調平劑(F)及密著促進劑(G)所成之群中所選擇的至 少一種為理想。 The colored photosensitive resin composition of the present invention is selected from the group consisting of a thiol compound (T), a leveling agent (F) and a adhesion promoter (G). One less is ideal.

本發明的著色光敏性樹脂組成物,可再含聚合起始助劑(D1)。 The colored photosensitive resin composition of the present invention may further contain a polymerization initiation aid (D1).

<著色劑(A)> <Colorant (A)>

著色劑(A),含有C.I.顏料綠58,由黃色顏料,藍色顏料,紅色顏料,紫色顏料及橙色顏料所成之群所選擇的至少1種, 著色劑的含有率,相對於固形分的總量為20質量%以上50質量%以下,理想是25至45質量%。在本說明書中,「固形分的總量」就是指由本發明的著色光敏性樹脂組成物的總量除去溶劑(E)的含量之量。 The coloring agent (A) contains at least one selected from the group consisting of yellow pigment, blue pigment, red pigment, purple pigment and orange pigment, and C.I. Pigment Green 58, The content of the colorant is 20% by mass or more and 50% by mass or less, and preferably 25 to 45% by mass based on the total amount of the solid content. In the present specification, the "total amount of solid content" means the amount of the solvent (E) removed from the total amount of the colored photosensitive resin composition of the present invention.

就黃色顏料而言,例如,可列舉C.I.顏料黃1,3,12,13,14,15,16,17,20,24,31,53,83,86,93,94,109,110,117,125,128,137,138,139,147,148,150,153,154,166,173,194,214等,理想是C.I.顏料黃138,150。 As the yellow pigment, for example, CI Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117 can be cited. , 125, 128, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214, etc., ideally CI Pigment Yellow 138,150.

就藍色顏料而言,例如,可列舉C.I.顏料藍15,15:3,15:4,15:6,60,80等。 As the blue pigment, for example, C.I. Pigment Blue 15, 15:3, 15:4, 15:6, 60, 80 and the like can be cited.

就紅色顏料而言,例如,可列舉C.I.顏料紅9,97,105,122,123,144,149,166,168,175,176,177,180,192,209,215,216,224,242,254,255,264,265等,理想是C.I.顏料紅177。 As the red pigment, for example, CI Pigment Red 9,97,105,122,123,144,149,166,168,175,176,177,180,192,209,215,216,224,242 , 254, 255, 264, 265, etc., ideally CI Pigment Red 177.

就紫色原料而言,例如,可列舉C.I.顏料紫1,19,23,29,32,36,38等,理想是C.I.顏料紫23。 As the purple raw material, for example, C.I. Pigment Violet 1, 19, 23, 29, 32, 36, 38, etc., and C.I. Pigment Violet 23 are preferable.

就橙色顏料而言,例如,可列舉C.I.顏料橙13,31,36,38,40,42,43,51,55,59,61,64,65,71,73等,理想是C.I.顏料橙38。 As the orange pigment, for example, CI Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 and the like are exemplified, and CI Pigment Orange 38 is desirable. .

這些顏料,可以因應需要施加松香處理,使用導入有酸性基或鹼性基的顏料衍生物等的表面處理,以高分子化合物等對顏料表面的接枝處理,硫酸微粒化法等微粒化處理,或用以除去不純物而以有機溶劑或水等的清洗處理,將離子性不純物以離子交換法等而除去的處理等。顏料的粒徑,以各分別均勻為理想。 These pigments may be subjected to a rosin treatment as needed, a surface treatment such as a pigment derivative into which an acidic group or a basic group is introduced, a graft treatment of a pigment surface by a polymer compound or the like, and a micronization treatment such as a sulfuric acid micronization method. Or a treatment for removing an impurity, washing with an organic solvent or water, or the like, and removing the ionic impurities by an ion exchange method or the like. The particle size of the pigment is preferably uniform for each.

這些顏料,藉由含有顏料分散劑並進行分散處理,而可成為在顏料分散劑溶液中分散均勻的狀態的顏料分散液。顏料,可各分別單獨分散處理,也可混合複數種而做分散處理。 These pigments can be a pigment dispersion liquid in a state in which the pigment dispersant is uniformly dispersed in the pigment dispersant solution by containing a pigment dispersant and performing a dispersion treatment. The pigments may be separately dispersed and treated separately, or a plurality of kinds may be mixed and dispersed.

就前述顏料分散劑而言,例如,可列舉陽離子系,陰離子系,非離子系,兩性,聚酯系,聚胺系,丙烯酸系等顏料分散劑等。這些顏料分散劑,可單獨使用或2種以上組合使用。就顏料分散劑而言,可列舉商品名KP(信越化學工業(股)製),Flowlen(共榮公司化學(股)製),Solsperse(Zeneca(股)製),EFKA(CIBA公司製),Ajisper(味之素Fine-Techno(股)製),Disperbyk(BYK Chemie公司製)等。 Examples of the pigment dispersant include a cationic dispersant, an anionic, a nonionic, an amphoteric, a polyester-based, a polyamine-based, and an acrylic-based pigment dispersant. These pigment dispersants may be used singly or in combination of two or more. The pigment dispersing agent is exemplified by trade name KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Flowlen (manufactured by Kyoei Chemical Co., Ltd.), Solsperse (manufactured by Zeneca Co., Ltd.), and EFKA (manufactured by CIBA Co., Ltd.). Ajisper (Ajinomoto Fine-Techno Co., Ltd.), Disperbyk (manufactured by BYK Chemie Co., Ltd.), and the like.

使用顏料分散劑時,其使用量,相對於顏料100質量份,理想是100質量份以下,更理想是5質量份以上50質量份以下。顏料分散劑的使用量在前述範圍時,有可得均勻分散狀態的顏料分散液的傾向。 When the pigment dispersant is used, the amount thereof is preferably 100 parts by mass or less, more preferably 5 parts by mass or more and 50 parts by mass or less based on 100 parts by mass of the pigment. When the amount of the pigment dispersant used is in the above range, there is a tendency that a pigment dispersion liquid in a uniformly dispersed state can be obtained.

C.I.顏料綠58的含量,相對於著色劑(A)的總量,以20至99質量%為理想,以30至95質量%更理想。 The content of C.I. Pigment Green 58 is preferably from 20 to 99% by mass, more preferably from 30 to 95% by mass, based on the total amount of the colorant (A).

黃色額料的含量,相對於著色劑(A)的總量,以O.1至80質量%為理想,以15至60質量%更理想。 The content of the yellow raw material is preferably from 0.1 to 80% by mass, more preferably from 15 to 60% by mass, based on the total amount of the colorant (A).

由藍色顏料,紅色顏料,紫色顏料及橙色顏料所成之群所選擇的至少一種的含量,相對於著色劑(A)的總量,以0.1至5質量%為理想,以0.1至3質量%更理想。 The content of at least one selected from the group consisting of a blue pigment, a red pigment, a purple pigment, and an orange pigment is preferably 0.1 to 5% by mass, and 0.1 to 3 by mass based on the total amount of the colorant (A). % is more ideal.

<樹脂(B)> <Resin (B)>

樹脂(B),沒有特別的限定,但以鹼可溶性樹脂為理想,以具有源自由不飽和羧酸及不飽和羧酸酐所成之群所選擇的至少一種的結構單元的加成聚合物更理想。就這種樹脂而言,可列舉以下的樹脂[K1]至[K6]等。 The resin (B) is not particularly limited, but an alkali-soluble resin is preferred, and an addition polymer having at least one structural unit selected from the group consisting of a source of a free unsaturated carboxylic acid and an unsaturated carboxylic anhydride is more preferable. . Examples of such a resin include the following resins [K1] to [K6].

樹脂[K1]由不飽和羧酸及不飽和羧酸酐所成之群所選擇的至少一種(a)(以下有時稱為「(a)」),及有碳數2至4的環狀醚結構及乙烯性不飽和鍵結的單體(b)(以下有時稱為「(b)」)的共聚物;樹指[K2](a)與(b),及可與(a)共聚合的單體(c)(但,與(a)及(b)不相同。)(以下有時稱為「(c)」)的共聚物;樹脂[K3](a)與(c)的共聚物;樹脂[K4]將(a)與(c)的共聚物與(b)反應的樹脂;樹脂[K5]將(b)與(c)的共聚物與(a)反應的樹脂;樹脂[K6](b)與(c)的共聚物與(a)反應,再與羧酸酐反應的樹脂。 The resin [K1] is at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides (a) (hereinafter sometimes referred to as "(a)"), and a cyclic ether having 2 to 4 carbon atoms. a copolymer of a structure and an ethylenically unsaturatedly bonded monomer (b) (hereinafter sometimes referred to as "(b)"); a tree means [K2] (a) and (b), and may be shared with (a) Polymerized monomer (c) (however, it is different from (a) and (b).) (hereinafter sometimes referred to as "(c)") copolymer; resin [K3] (a) and (c) Copolymer; resin [K4] a copolymer of (a) and (c) with (b) a resin; a resin [K5] a copolymer of (b) and (c) with (a) a resin; [K6] A resin obtained by reacting the copolymer of (b) with (c) with (a) and then with a carboxylic anhydride.

就(a)而言,具體上,例如,可列舉丙烯酸, 甲基丙烯酸,2-丁烯酸,鄰-、間-、對-乙烯安息香酸等不飽和單羧酸類;馬來酸,富馬酸,檸康酸(citraconic acid),中康酸(mesaconic acid),伊康酸(itaconic acid),3-乙烯酞酸,4-乙烯酞酸,3,4,5,6-四氫酞酸,1,2,3,6-四氫酞酸,二甲基四氫酞酸,1,4-環己烯二羧酸等不飽和二羧酸類;甲基-5-降莰烯-2,3-二羧酸,5-羧基雙環[2.2.1]庚-2-烯,5,6-二羧基雙環[2.2.1]庚-2-烯,5-羧基-5-甲基雙環[2.2.1]庚-2-烯,5-羧基-5-乙基雙環[2.2.1]庚-2-烯,5-羧基-6-甲基雙環[2.2.1]庚-2-烯,5-羧基-6-乙基雙環[2.2.1]庚-2-烯等含有羧基的雙環不飽和化合物類;馬來酸酐,檸康酸酐,伊康酸酐,3-乙烯酞酸酐,4-乙烯酞酸酐,3,4,5,6-四氫酞酸酐,1,2,3,6-四氫酞酸酐,二甲基四氫酞酸酐,5,6-二羧基雙環[2.2.1]庚-2-烯無水物等不飽和二羧酸類酐;琥珀酸單[2-(甲基)丙烯醯氧基乙基],酞酸單[2-(甲基)丙烯醯氧基乙基]等2價以上的多元羧酸的不飽和單[(甲基)丙烯醯氧基烷基]酯類;如α-(羥甲基)丙烯酸般的在同一分子中含有羥基及羧基的不飽和丙烯酸酯類等。 In terms of (a), specifically, for example, acrylic acid can be cited. Unsaturated monocarboxylic acids such as methacrylic acid, 2-butenoic acid, o-, m-, p-ethylene benzoic acid; maleic acid, fumaric acid, citraconic acid, mesaconic acid ), itaconic acid, 3-vinyl phthalic acid, 4-vinyl phthalic acid, 3,4,5,6-tetrahydrofurfuric acid, 1,2,3,6-tetrahydrofurfuric acid, dimethyl An unsaturated dicarboxylic acid such as tetrahydrofurfuric acid or 1,4-cyclohexene dicarboxylic acid; methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]g 2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-5-B Bicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-ethylbicyclo[2.2.1]hept-2 - a bicyclic unsaturated compound containing a carboxyl group such as an alkene; maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1 , 2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydrate, etc., unsaturated dicarboxylic acid anhydride; succinic acid [2-(Methyl)acryloxyethyl), decanoic acid [2-(methyl) propylene oxy ethoxylate An unsaturated mono[(meth)acryloxyalkylalkyl] ester of a divalent or higher polyvalent carboxylic acid; an unsaturated group containing a hydroxyl group and a carboxyl group in the same molecule as α-(hydroxymethyl)acrylic acid Acrylates, etc.

這些之中,由共聚合反應性之觀點及所得的樹脂對鹼水溶液的溶解性之觀點來看,以丙烯酸,甲基丙烯酸及馬來酸酐為理想。 Among these, acrylic acid, methacrylic acid, and maleic anhydride are preferable from the viewpoint of copolymerization reactivity and the solubility of the obtained resin in an aqueous alkali solution.

(b),例如,係指具有碳數2至4的環狀醚 結構(例如,由環氧乙烷(oxirane)環,環氧丙烷(oxetane)環及四氫呋喃環所成之群所選擇的至少1種)與乙烯性不飽和鍵結的聚合性化合物。(b)以具有碳數2至4的環狀醚與(甲基)丙烯醯氧基的單體為理想。 (b), for example, means a cyclic ether having a carbon number of 2 to 4. A structure (for example, at least one selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring) and a polymerizable compound bonded to an ethylenic unsaturated group. (b) It is preferred to use a monomer having a cyclic ether having 2 to 4 carbon atoms and a (meth)acryloxy group.

又,在本說明書中,「(甲基)丙烯酸」表示丙烯酸及甲基丙烯酸所成之群所選擇的至少1種。「(甲基)丙烯醯基」及「(甲基)丙烯酸酯」等的表現,也有同樣的意思。 In the present specification, "(meth)acrylic acid" means at least one selected from the group consisting of acrylic acid and methacrylic acid. The expressions of "(meth)acrylonitrile" and "(meth)acrylate" have the same meaning.

就(b)而言,例如,可列舉具有環氧乙烷基(oxiranyl)及乙烯性不飽和鍵結的單體(b1)(以下有時稱為「(b1)」),具有環氧丙烷基(oxetanyl)及乙烯性不飽和鍵結的單體(b2)(以下有時稱為「(b2)」),具有四氫呋喃基及乙烯性不飽和鍵結的單體(b3)(以下有時稱為「(b3)」)等。 (b), for example, a monomer (b1) having an oxiranyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b1)"), having propylene oxide Oxetanyl and ethylenically unsaturated bonded monomer (b2) (hereinafter sometimes referred to as "(b2)"), a tetrahydrofuranyl group and an ethylenically unsaturated bonded monomer (b3) (hereinafter sometimes It is called "(b3)").

就(b1)而言,例如,可列舉具有直鏈狀或支鏈狀的脂肪族不飽和烴經環氧化的結構的單體(b1-1)(以下有時稱為「(b1-1)」),具有脂環式不飽和烴經環氧化的結構的單體(b1-2)(以下有時稱為「(b1-2)」)。 (b1), for example, a monomer (b1-1) having a structure in which a linear or branched aliphatic unsaturated hydrocarbon is epoxidized (hereinafter sometimes referred to as "(b1-1)" The monomer (b1-2) having a structure in which an alicyclic unsaturated hydrocarbon is epoxidized (hereinafter sometimes referred to as "(b1-2)").

就(b1-1)而言,可列舉(甲基)丙烯酸環氧丙酯(glycidyl(meta)acrylate),(甲基)丙烯酸β-甲基環氧丙酯,(甲基)丙烯酸β-乙基環氧丙酯,環氧丙基乙烯基醚,鄰-乙烯基苄基環氧丙基醚,間-乙烯基苄基環氧丙基醚,對-乙烯基苄基環氧丙基醚,α-甲基-鄰-乙烯基苄基環氧丙基醚,α-甲基-間-乙烯基苄基環氧丙基醚,α-甲基-對-乙烯基苄基環氧丙基醚,2,3-雙(環氧丙基氧基甲基)苯乙烯,2,4-雙(環氧丙基氧基甲基)苯乙烯,2,5-雙(環氧丙基氧基甲 基)苯乙烯,2,6-雙(環氧丙基氧基甲基)苯乙烯,2,3,4-三(環氧丙基氧基甲基)苯乙烯,2,3,5-三(環氧丙基氧基甲基)苯乙烯,2,3,6-三(環氧丙基氧基甲基)苯乙烯,3,4,5-三(環氧丙基氧基甲基)苯乙烯,2,4,6-三(環氧丙基氧基甲基)苯乙烯等。 Examples of (b1-1) include glycidyl (meth)acrylate, β-methylglycidyl (meth)acrylate, and β-B (meth)acrylate. Glycidylpropyl ester, epoxypropyl vinyl ether, o-vinylbenzyl epoxypropyl ether, m-vinylbenzyl epoxypropyl ether, p-vinylbenzyl epoxypropyl ether, α-Methyl-o-vinylbenzyl epoxypropyl ether, α-methyl-m-vinylbenzyl epoxypropyl ether, α-methyl-p-vinylbenzyl epoxypropyl ether , 2,3-bis(glycidoxymethyl)styrene, 2,4-bis(glycidoxymethyl)styrene, 2,5-bis(epoxypropyloxymethyl) Styrene, 2,6-bis(glycidoxymethyl)styrene, 2,3,4-tris(epoxypropyloxymethyl)styrene, 2,3,5-three (glyoxypropyloxymethyl)styrene, 2,3,6-tris(epoxypropyloxymethyl)styrene, 3,4,5-tris(epoxypropyloxymethyl) Styrene, 2,4,6-tris(epoxypropyloxymethyl)styrene, and the like.

就(b1-2)而言,可列舉乙烯基環己烯單氧化物,1,2-環氧基-4-乙烯基環己烷(例如,Celoxide2000;Daicel(股)製),(甲基)丙烯酸3,4-環氧基環己基甲酯(例如,Cyclomer A400;Daicel(股)製),(甲基)丙烯酸3,4-環氧基環己基甲酯(例如,Cyclomer M100;Daicel(股)製),式(I)表示的化合物,式(II)表示的化合物等。 (b1-2), vinylcyclohexene monooxide, 1,2-epoxy-4-vinylcyclohexane (for example, Celoxide 2000; manufactured by Daicel Co., Ltd.), (methyl) 3,4-Epoxycyclohexylmethyl acrylate (for example, Cyclomer A400; manufactured by Daicel), 3,4-epoxycyclohexylmethyl (meth)acrylate (for example, Cyclomer M100; Daicel ( The compound represented by the formula (I), the compound represented by the formula (II), and the like.

[式(I)及式(II)中,Ra及Rb表示氫原子,或碳數1至4的烷基,該烷基所含的氫原子可經羥基取代。 [In the formulae (I) and (II), R a and R b represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and a hydrogen atom contained in the alkyl group may be substituted with a hydroxyl group.

Xa及Xb表示單鍵結,-Rc-,*-Rc-O-,*-Rc-S-或*-Rc-NH-。 X a and X b represents a single bond junction, -R c -, * - R c -O -, * - R c -S- or * -R c -NH-.

Rc表示碳數1至6的烷二基。 R c represents an alkanediyl group having 1 to 6 carbon atoms.

*表示與O的鍵結鍵]。 * indicates the bond key with O].

就碳數1至4的烷基而言,可列舉甲基,乙基,正丙基,異丙基,正丁基,二級丁基,三級丁基等。 Examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a secondary butyl group, a tertiary butyl group and the like.

就氫原子經羥基取代的烷基而言,可列舉羥甲基,1-羥乙基,2-羥乙基,1-羥丙基,2-羥丙基,3-羥丙基,1-羥 基-1-甲基乙基,2-羥基-1-甲基乙基,1-羥丁基,2-羥丁基,3-羥丁基,4-羥丁基等。 Examples of the alkyl group in which a hydrogen atom is substituted with a hydroxyl group include a methylol group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1-hydroxypropyl group, a 2-hydroxypropyl group, a 3-hydroxypropyl group, and a 1-hydroxypropyl group. hydroxyl 1-methylethyl, 2-hydroxy-1-methylethyl, 1-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 4-hydroxybutyl and the like.

就Ra及Rb而言,理想可列舉氫原子,甲基,羥甲基,1-羥乙基及2-羥乙基,更理想可列舉氫原子及甲基。 The R a and R b are preferably a hydrogen atom, a methyl group, a methylol group, a 1-hydroxyethyl group or a 2-hydroxyethyl group, and more preferably a hydrogen atom or a methyl group.

就烷二基而言,可列舉亞甲基,伸乙基,丙烷-1,2-二基,丙烷-1,3-二基,丁烷-1,4-二基,戊烷-1,5-二基,己烷-1,6-二基等。 Examples of the alkanediyl group include a methylene group, an ethyl group, a propane-1,2-diyl group, a propane-1,3-diyl group, a butane-1,4-diyl group, and a pentane-1 group. 5-diyl, hexane-1,6-diyl and the like.

就Xa及Xb而言,理想可列舉單鍵結,亞甲基,伸乙基,*-CH2-O-及*-CH2CH2-O-,更理想可列舉單鍵結及*-CH2CH2-O-(*表示與O的鍵結鍵)。 The X a and X b are preferably a single bond, a methylene group, an ethyl group, a *-CH 2 -O- group, and a *CH 2 CH 2 -O- group, and more preferably a single bond. *-CH 2 CH 2 -O- (* indicates a bond with O).

就式(I)表示的化合物而言,可列舉式(I-1)至式(I-15)表示的任一種化合物等。其中,尤以式(I-1),式(I-3),式(I-5),式(I-7),式(I-9)或式(I-11)至式(I-15)表示的化合物為理想,以式(I-1),式(I-7),式(I-9)或式(I-15)表示的化合物為更理想。 The compound represented by the formula (I) may, for example, be a compound represented by the formula (I-1) to the formula (I-15). Wherein, in particular, the formula (I-1), the formula (I-3), the formula (I-5), the formula (I-7), the formula (I-9) or the formula (I-11) to the formula (I- The compound represented by 15) is preferably a compound represented by the formula (I-1), the formula (I-7), the formula (I-9) or the formula (I-15).

就式(II)表示的化合物而言,可列舉式(II-1)至式(II-15)的任一式表示的化合物。其中,尤以式(II-1),式(II-3),式(II-5),式(II-7),式(II-9)或式(II-11)至式(II-15)表示的化合物為理想,以式(II-1),式(II-7),式(II-9)或式(11-15)表示的化合物更理想。 The compound represented by the formula (II) may, for example, be a compound represented by any one of the formulae (II-1) to (II-15). Wherein, in particular, the formula (II-1), the formula (II-3), the formula (II-5), the formula (II-7), the formula (II-9) or the formula (II-11) to the formula (II- The compound represented by 15) is ideal, and the compound represented by the formula (II-1), the formula (II-7), the formula (II-9) or the formula (11-15) is more preferable.

式(I)表示的化合物及式(II)表示的化合物可分別單獨使用,也可將式(I)表示的化合物與式(II)表示的化合物併用。要將這些併用時,式(I)表示的化合物及式(II)表示的化合物的含有比率以莫耳基準,理想是5:95至95:5,更理想是10:90至90:10,再更理想是20:80至80:20。 The compound represented by the formula (I) and the compound represented by the formula (II) may be used singly or in combination with the compound represented by the formula (II). When these are used in combination, the content ratio of the compound represented by the formula (I) and the compound represented by the formula (II) is on a molar basis, preferably from 5:95 to 95:5, more preferably from 10:90 to 90:10. More ideally, it is 20:80 to 80:20.

就(b2)而言,以具有環氧丙烷基及(甲基)丙烯醯氧基的單體更理想。就(b2)而言,可列舉3-甲基-3-甲基丙烯醯氧基甲基環氧丙烷,3-甲基-3-丙烯醯氧基甲基環氧丙烷,3-乙基-3-甲基丙烯醯氧基甲基環氧丙烷,3-乙基-3-丙烯醯氧基甲基環氧丙烷,3-甲基-3-甲基丙烯醯氧基乙基環氧丙烷,3-甲基-3-丙烯醯氧基乙基環氧丙烷,3-乙基-3-甲基丙烯醯氧基乙基環氧丙烷,3-乙基-3-丙烯醯氧基乙基環氧丙烷等。 In the case of (b2), a monomer having an oxypropylene group and a (meth)acryloxy group is more preferable. In the case of (b2), 3-methyl-3-methylpropenyloxymethyl propylene oxide, 3-methyl-3-propenyloxymethyl propylene oxide, 3-ethyl- 3-methylpropenyloxymethyl propylene oxide, 3-ethyl-3-propenyloxymethyl propylene oxide, 3-methyl-3-methylpropenyloxyethyl propylene oxide, 3-methyl-3-propenyloxyethyl propylene oxide, 3-ethyl-3-methylpropenyloxyethyl propylene oxide, 3-ethyl-3-propenyloxyethyl ring Oxypropane and the like.

就(b3)而言,以具有四氫呋喃基及(甲基)丙 烯醯氧基的單體更理想。就(b3)而言,具體而言,可列舉丙烯酸四氫呋喃甲酯(例如,Biscoat V#150,大阪有機化學工業(股)製),甲基丙烯酸四氫呋喃甲酯等。 For (b3), with tetrahydrofuranyl and (methyl) propyl The monomer of the oxiranyloxy group is more desirable. Specific examples of (b3) include tetrahydrofuran methyl acrylate (for example, Biscoat V#150, manufactured by Osaka Organic Chemical Industry Co., Ltd.), tetrahydrofuran methyl methacrylate, and the like.

就(b)而言,由能更提高所得的彩色濾光片的耐熱性、耐藥品性等信頼性之觀點來看,以(b1)為理想。再者,由著色光敏性樹脂組成物的保存安定性優異之觀點來看,以(b1-2)更理想。 In the case of (b), (b1) is preferable from the viewpoint of further improving the heat resistance and chemical resistance of the obtained color filter. Further, from the viewpoint of excellent storage stability of the colored photosensitive resin composition, (b1-2) is more preferable.

就(c)而言,例如,可列舉(甲基)丙烯酸甲酯,(甲基)丙烯酸乙酯,(甲基)丙烯酸正丁酯,(甲基)丙烯酸二級丁酯,(甲基)丙烯酸三級丁酯,(甲基)丙烯酸2-乙基己酯,(甲基)丙烯酸十二烷酯,(甲基)丙烯酸月桂酯,(甲基)丙烯酸硬脂酯,(甲基)丙烯酸環戊酯,(甲基)丙烯酸環己酯,(甲基)丙烯酸2-甲基環己酯,(甲基)丙烯酸三環[5.2.1.02.6]癸烷-8-酯(在本技術領域,慣用名稱是「(甲基)丙烯酸二環戊酯」。又,有時稱為「(甲基)丙烯酸三環癸酯」),(甲基)丙烯酸三環[5.2.1.02.6]癸烯-8-酯(在本技術領域,慣用名稱為「(甲基)丙烯酸二環戊烯酯」。),(甲基)丙烯酸二環戊基氧基乙酯,(甲基)丙烯酸異莰酯,(甲基)丙烯酸全剛烷酯,(甲基)丙烯酸烯丙酯,(甲基)丙烯酸炔丙酯,(甲基)丙烯酸苯酯,(甲基)丙烯酸萘酯,(甲基)丙烯酸苄酯等(甲基)丙烯酸酯類;(甲基)丙烯酸2-羥乙酯,(甲基)丙烯酸2-羥丙酯等含有羥基的(甲基)丙烯酸酯類;馬來酸二乙酯,富馬酸二乙酯,伊康酸二乙酯等二羧 酸二酯;雙環[2.2.1]庚-2-烯,5-甲基雙環[2.2.1]庚-2-烯,5-乙基雙環[2.2.1]庚-2-烯,5-羥基雙環[2.2.1]庚-2-烯,5-羥甲基雙環[2.2.1]庚-2-烯,5-(2’-羥乙基)雙環[2.2.1]庚-2-烯,5-甲氧基雙環[2.2.1]庚-2-烯,5-乙氧基雙環[2.2.1]庚-2-烯,5,6-二羥基雙環[2.2.1]庚-2-烯,5,6-二(羥甲基)雙環[2.2.1]庚-2-烯,5,6-二(2’-羥乙基)雙環[2.2.1]庚-2-烯,5,6-二甲氧基雙環[2.2.1]庚-2-烯,5,6-二乙氧基雙環[2.2.1]庚-2-烯,5-羥基-5-甲基雙環[2.2.1]庚-2-烯,5-羥基-5-乙基雙環[2.2.1]庚-2-烯,5-羥甲基-5-甲基雙環[2.2.1]庚-2-烯,5-三級丁氧基羰基雙環[2.2.1]庚-2-烯,5-環己基氧基羰基雙環[2.2.1]庚-2-烯,5-苯氧基羰基雙環[2.2.1]庚-2-烯,5,6-雙(三級丁氧基羰基)雙環[2.2.1]庚-2-烯,5,6-雙(環己氧基羰基)雙環[2.2.1]庚-2-烯等雙環不飽和化合物類;N-苯基馬來醯亞胺,N-環己基馬來醯亞胺,N-苄基馬來醯亞胺,3-馬來醯亞胺安息酸N-琥珀醯亞胺酯,4-馬來醯亞胺丁酸N-琥珀醯亞胺酯,6-馬來醯亞胺己酸N-琥珀醯亞胺酯,3-馬來醯亞胺丙酸N-琥珀醯亞胺酯,N-(9-吖啶基)馬來醯亞胺(N-(9-acridinyl)maleimide)等二羰基醯亞胺衍生物類;苯乙烯,α-甲基苯乙烯,間-甲基苯乙烯,對-甲基苯乙烯,乙烯基甲苯,對-甲氧基苯乙烯,丙烯腈,甲基丙烯腈,氯化乙烯,氯化亞乙烯,丙烯醯胺,甲基丙烯醯胺,乙酸乙烯酯,1,3-丁二烯,異戊二烯(isoprene),2,3-二甲基 -1,3-丁二烯等。 (c), for example, methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, n-butyl (meth)acrylate, (methyl) Tertiary butyl acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, (meth)acrylic acid Cyclopentyl ester, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo[5.2.1.0 2.6 ]decane-8-ester (in the technical field) The customary name is "dicyclopentanyl (meth) acrylate." Also, sometimes referred to as "tricyclodecyl (meth) acrylate), trimethyl [meth) acrylate [5.2.1.0 2.6 ] decene -8-ester (commonly known in the art as "dicyclopentenyl (meth)acrylate".), dicyclopentyloxyethyl (meth)acrylate, isodecyl (meth)acrylate , (cyclo) (meth) acrylate, allyl (meth) acrylate, propargyl (meth) acrylate, phenyl (meth) acrylate, naphthyl (meth) acrylate, (meth) acrylate (meth) acrylate such as benzyl ester; 2-hydroxy (meth) acrylate a hydroxy group-containing (meth) acrylate such as 2-hydroxypropyl (meth) acrylate; a dicarboxylic acid diester such as diethyl maleate, diethyl fumarate or diethyl itaconate. Bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxybicyclo[ 2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5 -Methoxybicyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2.1]hept-2-ene ,5,6-bis(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5, 6-Dimethoxybicyclo[2.2.1]hept-2-ene, 5,6-diethoxybicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-methylbicyclo[2.2. 1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1]hept-2-ene, 5-tertiary butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonylbicyclo[2.2.1 Hept-2-ene, 5,6-bis(tertiary butoxycarbonyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(cyclohexyloxycarbonyl)bicyclo[2. 2.1] Bicyclic unsaturated compounds such as hept-2-ene; N-phenyl maleimine, N-cyclohexylmaleimide, N-benzyl maleimide, 3-Malaysia Amine benzoic acid N-succinimide, 4-maleimide butyric acid N-succinimide, 6-maleimide caproic acid N-succinimide, 3-male N-succinimide, iminopropionate, dicarbonyl quinone imine derivatives such as N-(9-acridinyl)maleimide; styrene, alpha -methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, propylene Guanidine, methacrylamide, vinyl acetate, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, and the like.

這些之中,由共聚合反應性及耐熱性之觀點來看,以苯乙烯,乙烯基甲苯,(甲基)丙烯酸苄酯,(甲基)丙烯酸三環[5.2.1.02.6]癸烷-8-酯,N-苯基馬來醯亞胺,N-環己基馬來醯亞胺,N-苄基馬來醯亞胺及雙環[2.2.1]庚-2-烯為理想。 Among these, from the viewpoints of copolymerization reactivity and heat resistance, styrene, vinyl toluene, benzyl (meth) acrylate, trimethyl [meth) acrylate [5.2.1.0 2.6 ] decane-8 - ester, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide and bicyclo [2.2.1]hept-2-ene are ideal.

樹脂[K1]中,源自各別之結構單元的比率,在構成樹脂[K1]的全結構單元中,以源自(a)的結構單元:2至60莫耳%,源自(b)的結構單元:40至98莫耳%為理想,以源自(a)的結構單元:10至50莫耳%源自(b)的結構單元:50至90莫耳%為更理想。 In the resin [K1], the ratio derived from the respective structural unit is, in the entire structural unit constituting the resin [K1], the structural unit derived from (a): 2 to 60 mol%, derived from (b) The structural unit: 40 to 98 mol% is ideal, and the structural unit derived from (a): 10 to 50 mol% of the structural unit derived from (b): 50 to 90 mol% is more desirable.

樹脂[K1]的結構單元的比率,在上述的範圍時,著色光敏性樹脂組成物的保存安定性,形成著色圖案化塗膜時的顯影性,及所得的彩色濾光片之耐溶劑性有優異的傾向。 When the ratio of the structural unit of the resin [K1] is in the above range, the storage stability of the colored photosensitive resin composition, the developability when the colored patterned coating film is formed, and the solvent resistance of the obtained color filter are Excellent tendency.

樹脂[K1],例如,可參考文獻「高分子合成的實驗法」(大津隆行著 發行所(股)化學同人 第1版第1刷1972年3月1日發行)所述的方法及該文獻所述的引用文獻而製造。 Resin [K1], for example, can refer to the method described in the "Experimental Method for Polymer Synthesis" (Dazu Takashi, Institute of Chemicals, 1st Edition, 1st, 1st, March 1, 1972) and the literature. Manufactured by the cited documents.

具體而言,可列舉將(a)及(b)的規定量、聚合起始劑、溶劑等放入於反應容器中,例如,藉由以氮氣取代氧氣而成為脫氧環境,一邊攪拌一邊加熱及保溫的方法。這時,這裏所用的聚合起始劑及溶劑,沒有特別的限定,可使用在本領域通常使用的聚合起始劑及溶劑。例如, 就聚合起始劑而言,可列舉偶氮化合物(2,2’-偶氮雙異丁腈,2,2'-偶氮雙(2,4-二甲基戊腈)等)及有機過氧化物(過氧化苄醯基等),就溶劑而言,只要能將各單體溶解即可,可列舉做為本發明的著色光敏性樹脂組成物的溶劑(E)之後述溶劑等。 Specifically, a predetermined amount of (a) and (b), a polymerization initiator, a solvent, and the like are placed in a reaction container, and for example, by replacing oxygen with nitrogen to form a deoxidizing environment, heating is performed while stirring. The method of insulation. In this case, the polymerization initiator and the solvent used herein are not particularly limited, and a polymerization initiator and a solvent which are generally used in the art can be used. E.g, Examples of the polymerization initiator include an azo compound (2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), etc.) and organic The solvent (such as a benzamidine peroxide) may be a solvent (E) which will be described later as a solvent of the colored photosensitive resin composition of the present invention, as long as it can dissolve each monomer.

又,所得的共聚物,可將反應後的溶液直接使用,也可使用濃縮或稀釋的溶液,也可使用以再沈澱等方法成為固體(粉體)並取出者。特別是,聚合時做為溶劑而使用本發明的著色光敏性樹脂組成物所含的溶劑,可將反應後的溶液直接使用於本發明著色光敏性樹脂組成物的調製,而可簡化本發明的著色光敏性樹脂組成物之製造步驟。 Further, the obtained copolymer may be used as it is, or a concentrated or diluted solution may be used, or a solid (powder) may be obtained by a method such as reprecipitation. In particular, by using a solvent contained in the colored photosensitive resin composition of the present invention as a solvent during polymerization, the solution after the reaction can be directly used for the preparation of the colored photosensitive resin composition of the present invention, and the present invention can be simplified. A manufacturing step of coloring the photosensitive resin composition.

在樹脂[K2]中,源自各別的結構單元的比率,在構成樹脂[K2]的全結構單元中,以源自(a)的結構單元:2至45莫耳%源自(b)的結構單元:2至95莫耳%源自(c)的結構單元:1至65莫耳%為理想,以源自(a)的結構單元:5至40莫耳%源自(b)的結構單元:5至80莫耳%源自(c)的結構單元:5至6O莫耳%為更理想。 In the resin [K2], the ratio derived from the respective structural unit is, in the entire structural unit constituting the resin [K2], the structural unit derived from (a): 2 to 45 mol% derived from (b) The structural unit: 2 to 95 mol% of the structural unit derived from (c): 1 to 65 mol% is ideal, and the structural unit derived from (a): 5 to 40 mol% derived from (b) Structural unit: 5 to 80 mol% of the structural unit derived from (c): 5 to 60% by mole is more desirable.

樹脂[K2]的結構單元的比率,在上述的範圍時,著色光敏性樹脂組成物的保存安定性,形成著色圖案化塗膜時 的顯影性,以及,所得的彩色濾光片的耐溶劑性,耐熱性及機械強度有優異的傾向。 When the ratio of the structural unit of the resin [K2] is in the above range, the storage stability of the photosensitive resin composition is colored, and when the colored patterned coating film is formed The developability and the obtained color filter tend to have excellent solvent resistance, heat resistance and mechanical strength.

樹脂[K2],例如,可依照做為樹脂[K1]的製造方法所說明的方法同樣地製造。 The resin [K2] can be produced in the same manner as the method described in the production method of the resin [K1], for example.

在樹脂[K3]中,源自各別之結構單元的比率,在構成樹脂[K3]的全結構單元中,以源自(a)的結構單元:2至60莫耳%源自(c)的結構單元:40至98莫耳%為理想,以源自(a)的結構單元:10至50莫耳%源自(c)的結構單元:50至90莫耳%更理想。樹脂[K3],例如,可依照做為樹脂[K1]的製造方法所說明的方法同樣地製造。 In the resin [K3], the ratio derived from the respective structural unit is, in the entire structural unit constituting the resin [K3], the structural unit derived from (a): 2 to 60 mol% derived from (c) The structural unit: 40 to 98 mol% is ideal, with the structural unit derived from (a): 10 to 50 mol% of the structural unit derived from (c): 50 to 90 mol% is more desirable. The resin [K3] can be produced in the same manner as the method described in the production method of the resin [K1], for example.

樹脂[K4],可藉由獲得(a)與(c)的共聚物後,將(b)所具有的碳數2至4的環狀醚與(a)所具有的羧酸及/或羧酸酐加成而製造。 The resin [K4], after obtaining the copolymer of (a) and (c), (b) having a cyclic ether having 2 to 4 carbon atoms and (a) having a carboxylic acid and/or a carboxyl group Manufactured by addition of an acid anhydride.

首先,將(a)與(c)的共聚物,依照做為樹脂[K1]的製造方法所說明的方法同樣地製造。這時,源自各別之結構單元的比率,以與在樹脂[K3]所列舉者同樣的比率為理想。 First, the copolymer of (a) and (c) is produced in the same manner as the method described as the method for producing the resin [K1]. In this case, the ratio derived from the respective structural units is preferably the same as the ratio of those listed in the resin [K3].

其次,將前述共聚物中的源自(a)之羧酸及/或羧酸酐的一部分,與(b)所具有的碳數2至4的環狀醚反應。 Next, a part of the carboxylic acid and/or carboxylic anhydride derived from (a) in the copolymer is reacted with a cyclic ether having 2 to 4 carbon atoms which (b) has.

接在(a)與(c)的共聚物的製造之後,將燒瓶內環境以空氣取代氮氣,將(b)、羧酸或羧酸酐與環狀醚的反應觸媒(例 如三(二甲基胺基甲基)酚等)、及聚合抑制劑(例如氫醌等)等放入於燒瓶中,例如在60至130℃反應1至10小時而可製造樹脂[K4]。 After the production of the copolymer of (a) and (c), the reaction environment of (b), carboxylic acid or carboxylic anhydride and cyclic ether is replaced by air in the atmosphere of the flask. A resin such as tris(dimethylaminomethyl)phenol or the like, and a polymerization inhibitor (for example, hydroquinone) may be placed in a flask, for example, at 60 to 130 ° C for 1 to 10 hours to produce a resin [K4]. .

(b)的使用量相對於(a)100莫耳以5至80莫耳為理想,更理想是10至75莫耳。在這個範圍時,著色光敏性樹脂組成物的保存安定性,形成圖案化塗膜時的顯影性,以及,所得的圖案化塗膜的耐溶劑性,耐熱性,機械強度及敏度的平衡有變良好的傾向。由於環狀醚的反應性高,未反應的(b)不容易殘留,因此用於樹脂[K4]的(b)以(b1)為理想,以(b1-1)更為理想。 The amount of use of (b) is preferably 5 to 80 moles per 100 moles, more preferably 10 to 75 moles. In this range, the storage stability of the colored photosensitive resin composition, the developability at the time of forming the patterned coating film, and the balance of solvent resistance, heat resistance, mechanical strength and sensitivity of the obtained patterned coating film are A tendency to become good. Since the reactivity of the cyclic ether is high and the unreacted (b) does not easily remain, the (b) for the resin [K4] is preferably (b1), and more preferably (b1-1).

前述反應觸媒的使用量,相對於(a)、(b)及(c)合計量100質量份以0.001至5質量份為理想。前述聚合抑制劑的使用量,相對於(a)、(b)及(c)的合計量100質量份以0.001至5質量份為理想。 The amount of the reaction catalyst to be used is preferably 0.001 to 5 parts by mass based on 100 parts by mass of the total of (a), (b) and (c). The amount of the polymerization inhibitor to be used is preferably 0.001 to 5 parts by mass based on 100 parts by mass of the total of (a), (b) and (c).

裝填方法、反應溫度及時間等反應條件,可考慮製造設備及聚合所致的發熱量等而適宜調整。又,與聚合條件同樣,可考慮製造設備及聚合所致的發熱量等,而適宜調整裝填方法及反應溫度。 The reaction conditions such as the charging method, the reaction temperature, and the time can be appropriately adjusted in consideration of the production equipment and the calorific value due to polymerization. Further, similarly to the polymerization conditions, the charging method and the reaction temperature can be appropriately adjusted in consideration of the production equipment and the calorific value due to the polymerization.

樹脂[K5],第一段階,以與上述的樹脂[K1]的製造方法同樣方式而獲得(b)與(c)的共聚物。以與上述同樣方式,所得的共聚物,可將反應後的溶液直接使用,也可使用濃縮或稀釋過的溶液,也可使用以再沈澱等方法取出的固體(粉體)。 Resin [K5], in the first stage, a copolymer of (b) and (c) was obtained in the same manner as in the above-described method for producing the resin [K1]. In the same manner as described above, the obtained copolymer may be used as it is, or a concentrated or diluted solution may be used, or a solid (powder) taken out by a method such as reprecipitation may be used.

源自(b)及(c)的結構單元的比率,相對於構成前述的共 聚物的全結構單元的合計莫耳數,分別以源自(b)的結構單元:5至95莫耳%源自(c)的結構單元:5至95莫耳%為理想,以源自(b)的結構單元:10至90莫耳%源自(c)的結構單元:10至90莫耳%為更理想。 The ratio of the structural units derived from (b) and (c) with respect to the constituents The total number of moles of the total structural unit of the polymer, respectively, from the structural unit derived from (b): 5 to 95 mol% of the structural unit derived from (c): 5 to 95 mol% is ideal, derived from The structural unit of (b): 10 to 90 mol% of the structural unit derived from (c): 10 to 90 mol% is more desirable.

再者,以與樹脂[K4]之製造方法同樣的條件,將(b)與(c)的共聚物所具有的源自(b)的環狀醚,與(a)所具有的羧酸或羧酸酐反應,而可得樹脂[K5]。 Further, the cyclic ether derived from (b) and the carboxylic acid (a) possessed by the copolymer of (b) and (c) are the same conditions as in the method for producing the resin [K4]. The carboxylic anhydride is reacted to obtain a resin [K5].

與前述共聚物反應的(a)的使用量,相對於(b)100莫耳以5至80莫耳為理想。由於環狀醚的反應性高,未反應的(b)不容易殘留,因此用於樹脂[K5]的(b)以(b1)為理想,以(b1-1)更理想。 The amount of (a) used in the reaction with the aforementioned copolymer is preferably 5 to 80 moles per 100 moles of (b). Since the reactivity of the cyclic ether is high and the unreacted (b) does not easily remain, the (b) for the resin [K5] is preferably (b1), more preferably (b1-1).

樹脂[K6]是將樹脂[K5]再與羧酸酐反應的樹脂。 The resin [K6] is a resin which reacts the resin [K5] with a carboxylic acid anhydride.

將環狀醚與羧酸或羧酸酐的反應而產生的羥基,與羧酸酐反應。 The hydroxyl group produced by the reaction of a cyclic ether with a carboxylic acid or a carboxylic anhydride is reacted with a carboxylic acid anhydride.

就羧酸酐而言,可列舉馬來酸酐,檸康酸酐,伊康酸酐,3-乙烯酞酸酐,4-乙烯酞酸酐,3,4,5,6-四氫酞酸酐,1,2,3,6-四氫酞酸酐,二甲基四氫酞酸酐,5,6-二羧基雙環[2.2.1]庚-2-烯無水物等。羧酸酐的使用量,相對於(a)的使用量1莫耳以0.5至1莫耳為理想。 As the carboxylic anhydride, there may be mentioned maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1, 2, 3 6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydrate, and the like. The amount of the carboxylic anhydride to be used is preferably from 0.5 to 1 mol per mol of the amount of (a).

就樹脂(B)而言,具體而言,可列舉(甲基) 丙烯酸3,4-環氧基環己基甲酯/(甲基)丙烯酸共聚物,(甲基)丙烯酸3,4-環氧基三環[5.2.1.02.6]癸酯/(甲基)丙烯酸共聚物等樹脂[K1];(甲基)丙烯酸環氧丙酯/(甲基)丙烯酸苄酯/(甲基)丙烯酸共聚物,(甲基)丙烯酸環氧丙酯/苯乙烯/(甲基)丙烯酸共聚物,(甲基)丙烯酸3,4-環氧基三環[5.2.1.02.6]癸酯/(甲基)丙烯酸/N-環己基馬來醯亞胺共聚物,(甲基)丙烯酸3,4-環氧基三環[5.2.1.02.6]癸酯/(甲基)丙烯酸/乙烯基甲苯共聚物,3-甲基-3-(甲基)丙烯醯氧基甲基環氧丙烷/(甲基)丙烯酸/苯乙烯共聚物等樹脂[K2];(甲基)丙烯酸苄酯/(甲基)丙烯酸共聚物,苯乙烯/(甲基)丙烯酸共聚物,(甲基)丙烯酸苄酯/(甲基)丙烯酸三環癸酯/(甲基)丙烯酸共聚物等樹脂[K3];將(甲基)丙烯酸苄酯/(甲基)丙烯酸共聚物加成(甲基)丙烯酸環氧丙酯的樹脂,將(甲基)丙烯酸三環癸酯/苯乙烯/(甲基)丙烯酸共聚物加成(甲基)丙烯酸環氧丙酯的樹脂,將(甲基)丙烯酸三環癸酯/(甲基)丙烯酸苄酯/(甲基)丙烯酸共聚物加成(甲基)丙烯酸環氧丙基酯的樹脂等樹脂[K4];將(甲基)丙烯酸三環癸酯/(甲基)丙烯酸環氧丙酯的共聚物與(甲基)丙烯酸反應的樹脂,將(甲基)丙烯酸三環癸酯/苯乙烯/(甲基)丙烯酸環氧丙酯的共聚物與(甲基)丙烯酸反應的樹脂等樹脂[K5];將使(甲基)丙烯酸三環癸酯/(甲基)丙烯酸環氧丙酯的共聚物與(甲基)丙烯酸反應的樹脂再與四氫酞酸酐反應的樹脂等樹脂[K6]等。 Specific examples of the resin (B) include 3,4-epoxycyclohexylmethyl (meth)acrylic acid (meth)acrylic acid copolymer and 3,4-epoxy (meth)acrylic acid. Resin such as bis-ring [5.2.1.0 2.6 ] decyl ester/(meth)acrylic acid copolymer [K1]; glycidyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylate copolymer , (meth)acrylic acid propylene acrylate / styrene / (meth) acrylic acid copolymer, (meth)acrylic acid 3,4-epoxytricyclo[5.2.1.0 2.6 ] decyl ester / (meth)acrylic acid /N-cyclohexylmaleimide copolymer, 3,4-epoxytricyclo(5.2.1.0 2.6 ]decyl (meth)acrylic/vinyltoluene copolymer (3-) (meth)acrylate, 3- Resin such as methyl-3-(meth)acryloxymethyl propylene oxide/(meth)acrylic acid/styrene copolymer [K2]; benzyl (meth)acrylate/(meth)acrylic acid copolymer , styrene/(meth)acrylic acid copolymer, benzyl (meth) acrylate / tricyclodecyl (meth) acrylate / (meth) acrylate copolymer [K3]; benzyl (meth) acrylate Ester/(meth)acrylic acid copolymer addition of (meth)acrylic acid propyl acrylate resin, (meth)acrylic acid Tricyclodecyl methacrylate / styrene / (meth) acrylate copolymer addition of (meth) acrylate propyl acrylate resin, trimethyl decyl (meth) acrylate / benzyl (meth) acrylate / (A a resin such as a resin obtained by adding an acrylic acid copolymer to a glycidyl (meth)acrylate [K4]; a copolymer of tricyclodecyl (meth)acrylate/glycidyl (meth)acrylate and a resin reactive with methyl methacrylate, a resin such as a resin obtained by reacting a copolymer of tricyclodecyl (meth) acrylate/styrene/glycidyl methacrylate with (meth)acrylic acid [K5]; A resin such as a resin obtained by reacting a copolymer of tricyclodecyl methacrylate/glycidyl methacrylate with (meth)acrylic acid and a resin which is reacted with tetrahydrophthalic anhydride, etc. [K6].

樹脂(B),理想是由樹脂[K1],樹脂[K2]及樹脂[K3]所成的群所選擇的一種,更理想是由樹脂[K2]及 樹脂[K3]所成的群所選擇的一種。若為這些樹脂時,則著色光敏性樹脂組成物有優異的顯影性。 The resin (B) is preferably one selected from the group consisting of the resin [K1], the resin [K2] and the resin [K3], and more preferably the resin [K2] and One selected from the group formed by the resin [K3]. In the case of these resins, the colored photosensitive resin composition has excellent developability.

由著色圖案化塗膜與基板的密著性的觀點上,以樹脂[K2]為更理想。 From the viewpoint of coloring the adhesion between the coating film and the substrate, the resin [K2] is more preferable.

樹脂(B)的聚苯乙烯換算的重量平均分子量,理想是3,000至100,000,更理想是5,OOO至50,000,再更理想是5,000至30,000。分子量在前述的範圍時,塗膜硬度提高,殘膜率也高,未曝光部分對顯影液的溶解性良好,著色圖案化塗膜的解像度有提高的傾向。 The polystyrene-equivalent weight average molecular weight of the resin (B) is desirably 3,000 to 100,000, more desirably 5,000 to 50,000, still more preferably 5,000 to 30,000. When the molecular weight is in the above range, the hardness of the coating film is increased, the residual film ratio is also high, the solubility of the unexposed portion to the developer is good, and the resolution of the colored patterned coating film tends to be improved.

樹脂(B)的分子量分佈[重量平均分子量(Mw)/數量平均分子量(Mn)],理想是1.1至6,更理想是1.2至4。 The molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the resin (B) is desirably 1.1 to 6, more preferably 1.2 to 4.

樹脂(B)的酸價,理想是50至170mg-KOH/g,更理想是60至150mg-KOH/g,再更理想是70至135mg-KOH/g。這裏的酸價是當做中和樹脂(B)1g所需要的氫氧化鉀的量(mg)而測定的值,例如可使用氫氧化鉀水溶液滴定而求得。 The acid value of the resin (B) is desirably 50 to 170 mg-KOH/g, more desirably 60 to 150 mg-KOH/g, still more preferably 70 to 135 mg-KOH/g. The acid value here is a value measured by neutralizing the amount (mg) of potassium hydroxide required for 1 g of the resin (B), and can be obtained, for example, by titration with an aqueous potassium hydroxide solution.

樹脂(B)的含量,相對於固形分的總量,理想是7至65質量%,更理想是13至60質量%,再理想是17至55質量%。樹脂(B)的含量在前述的範圍時,可形成著色圖案化塗膜,又著色圖案化塗膜的解像度及殘膜率有提高的傾向。 The content of the resin (B) is desirably from 7 to 65 mass%, more desirably from 13 to 60 mass%, and still more preferably from 17 to 55 mass%, based on the total amount of the solid component. When the content of the resin (B) is within the above range, a colored patterned coating film can be formed, and the resolution and residual film ratio of the colored patterned coating film tend to be improved.

<聚合性化合物(C)> <Polymerizable compound (C)>

聚合性化合物(C)是可藉由從聚合起始劑(D)產生的活性自由基及/或酸而聚合的化合物,例如,可列舉具有聚合 性的乙烯性不飽和鍵結的化合物等,理想是(甲基)丙烯酸酯化合物。 The polymerizable compound (C) is a compound which can be polymerized by an active radical and/or an acid generated from the polymerization initiator (D), and for example, it can be exemplified A compound of an ethylenically unsaturated bond or the like is preferably a (meth) acrylate compound.

其中,聚合性化合物(C),以具有3個以上的乙烯性不飽和鍵結的聚合性化合物為理想。就這種聚合性化合物而言,例如,可列舉三(甲基)丙烯酸三羥甲基丙烷酯,三(甲基)丙烯酸新戊四醇酯,四(甲基)丙烯酸新戊四醇酯,五(甲基)丙烯酸二新戊四醇酯,六(甲基)丙烯酸二新戊四醇酯,八(甲基)丙烯酸三新戊四醇酯,七(甲基)丙烯酸三新戊四醇酯,十(甲基)丙烯酸四新戊四醇酯,九(甲基)丙烯酸四新戊四醇酯,三聚異氰酸三(2-(甲基)丙烯醯基氧基乙酯),乙二醇改質四(甲基)丙烯酸新戊四醇酯,乙二醇改質六(甲基)丙烯酸二新戊四醇酯,丙二醇改質四(甲基)丙烯酸新戊四醇酯,丙二醇改質六(甲基)丙烯酸二新戊四醇酯,己內酯改質四(甲基)丙烯酸新戊四醇酯,己內酯改質六(甲基)丙烯酸二新戊四醇酯等。 Among them, the polymerizable compound (C) is preferably a polymerizable compound having three or more ethylenically unsaturated bonds. Examples of such a polymerizable compound include trimethylolpropane tris(meth)acrylate, neopentyl glycol tri(meth)acrylate, and neopentyl glycol tetra(meth)acrylate. Dipentaerythritol penta(meth)acrylate, dineopentaerythritol hexa(meth)acrylate, tricrostitol octa(meth)acrylate, tricrostitol heptyl (meth)acrylate Ester, tetrapentaerythritol decamethacrylate, tetrapentaerythritol penta(meth)acrylate, tris(2-(methyl)propenyloxyethyl) isocyanurate, Ethylene glycol modified with neopentyl glycol tetra(meth)acrylate, ethylene glycol modified dipentaerythritol hexa(meth)acrylate, propylene glycol modified neopentyl glycol tetra(meth)acrylate, Propylene glycol modified dipentaerythritol hexa(meth)acrylate, caprolactone modified pentaerythritol tetrakis(meth)acrylate, caprolactone modified dipentaerythritol hexa(meth)acrylate Wait.

其中,尤以五(甲基)丙烯酸二新戊四醇酯及六(甲基)丙烯酸二新戊四醇酯為理想。 Among them, dipentaerythritol penta(meth)acrylate and dineopentaerythritol hexa(meth)acrylate are preferred.

聚合性化合物(C)的重量平均分子量,理想是150以上2,900以下,更理想是250至1,500以下。 The weight average molecular weight of the polymerizable compound (C) is preferably 150 or more and 2,900 or less, more preferably 250 to 1,500 or less.

聚合性化合物(C)的含量,相對於固形分的總量以7至65質量%為理想,更理想是13至60質量%,再理想是17至55質量%。 The content of the polymerizable compound (C) is preferably from 7 to 65% by mass, more preferably from 13 to 60% by mass, still more preferably from 17 to 55% by mass, based on the total amount of the solid content.

又,樹脂(B)與聚合性化合物(C)的含量比[樹脂(B):聚合性化合物(C)]以質量基準,理想是20:80至80:20,更 理想是35:65至80:20,再更理想是50:50至75:25,尤其理想是55:45至70:30。 Further, the content ratio of the resin (B) to the polymerizable compound (C) [resin (B): polymerizable compound (C)] is preferably 20:80 to 80:20 on a mass basis, more preferably The ideal is 35:65 to 80:20, and more preferably 50:50 to 75:25, especially ideally 55:45 to 70:30.

聚合性化合物(C)的含量,在前述的範圍內時,形成著色圖案化塗膜時的殘膜率及彩色濾光片的耐藥品性有提高的傾向。 When the content of the polymerizable compound (C) is within the above range, the residual film ratio at the time of forming the colored patterned coating film and the chemical resistance of the color filter tend to be improved.

<聚合起始劑(D)> <Polymerization initiator (D)>

聚合起始劑(D),只要是由光或熱的作用而產生活性自由基、酸等,而能開始聚合的化合物則沒有特別的限定,可使用公知的聚合起始劑。 The polymerization initiator (D) is not particularly limited as long as it can generate a living radical, an acid or the like by the action of light or heat, and a known polymerization initiator can be used.

就聚合起始劑(D)而言,可列舉苯烷酮(alkylphenone)化合物,三化合物,醯基膦氧化物化合物,O-醯基肟化合物,聯咪唑化合物等。 As the polymerization initiator (D), an alkylphenone compound can be cited, three A compound, a mercaptophosphine oxide compound, an O-mercaptopurine compound, a biimidazole compound or the like.

前述O-醯基肟化合物是具有式(d1)表示的部分結構的化合物。以下,*表示鍵結鍵。 The aforementioned O-indenyl ruthenium compound is a compound having a partial structure represented by the formula (d1). Hereinafter, * indicates a keying key.

就前述O-醯基肟化合物而言,例如,可列舉N-苄醯基氧基-1-(4-苯基硫基苯基)丁烷-1-酮-2-亞胺,N-苄醯基氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺,N-苄醯基氧基-1-(4-苯基硫基苯基)-3-環戊基丙烷-1-酮-2-亞胺,N-乙醯氧基-1-[9-乙基-6-(2-甲基苄醯基)-9H-咔唑-3-基]乙烷-1-亞胺,N-乙醯氧基-1-[9-乙基-6-{2-甲基-4-(3,3-二甲基-2,4-二氧雜環戊基甲基氧基)苄醯基}-9H-咔唑-3-基]乙烷-1-亞胺,N- 乙醯氧基-1-[9-乙基-6-(2-甲基苄醯基)-9H-咔唑)-3-基]-3-環戊基丙烷-1-亞胺,N-苄醯基氧基-1-[9-乙基-6-(2-甲基苄醯基)-9H-咔唑-3-基]-3-環戊基丙烷-1-酮-2-亞胺等。也可使用Irgacure OXE01,OXE02(以上,BASF公司製),N-1919(ADEKA公司製)等市售品。 With respect to the aforementioned O-indenyl ruthenium compound, for example, N-benzyl decyloxy-1-(4-phenylthiophenyl)butan-1-one-2-imine, N-benzyl Mercaptooxy-1-(4-phenylthiophenyl)octane-1-one-2-imine, N-benzylidenyloxy-1-(4-phenylthiophenyl)- 3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzyl)-9H-indazole-3- Ethyl]imine-1-imine, N-acetoxy-1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl-2,4-dioxo Heterocyclic pentylmethyloxy)benzylhydrazinyl}-9H-indazol-3-yl]ethane-1-imine, N- Ethyloxy-1-[9-ethyl-6-(2-methylbenzyl)-9H-indazole)-3-yl]-3-cyclopentylpropane-1-imine, N- Benzyl methoxy-l-[9-ethyl-6-(2-methylbenzyl)-9H-indazol-3-yl]-3-cyclopentylpropan-1-one-2-a Amines, etc. Commercial products such as Irgacure OXE01, OXE02 (above, BASF Corporation, N-1919 (made by ADEKA)) can also be used.

其中,O-醯基肟化合物,以由N-苄醯基氧基-1-(4-苯基硫基苯基)丁烷-1-酮-2-亞胺,N-苄醯基氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺及N-苄醯基氧基-1-(4-苯基硫基苯基)-3-環戊基丙烷-1.-酮-2-亞胺所成之群所選擇的至少1種為理想,N-苄醯基氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺更理想。 Wherein, the O-indenyl hydrazine compound is derived from N-benzyl hydrazino oxy-1-(4-phenylthiophenyl)butan-1-one-2-imide, N-benzyl fluorenyloxy 1-(4-phenylthiophenyl)octane-1-one-2-imine and N-benzylhydrazinooxy-1-(4-phenylthiophenyl)-3-cyclopentyl At least one selected from the group consisting of propane-1.-keto-2-imine is preferred, N-benzylidenyloxy-1-(4-phenylthiophenyl)octane-1- Keto-2-imine is more desirable.

前述苯烷酮化合物係具有式(d2)表示的部分結構或具有式(d3)表示的部分結構的化合物。這些的部分結構中,苯環可具有取代基。 The phenylalkanone compound has a partial structure represented by the formula (d2) or a compound having a partial structure represented by the formula (d3). In some of these structures, the benzene ring may have a substituent.

就具有式(d2)表示的部分結構的化合物而言,例如,可列舉2-甲基-2-(N-嗎啉基)-1-(4-甲基硫基苯基)丙烷-1-酮,2-二甲基胺基-1-(4-(N-嗎啉基)苯基)-2-苄基丁烷-1-酮,2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]丁烷-1-酮等。也可使用Irgacure 369、907、379(以上,BASF公司製)等市售品。 With respect to the compound having a partial structure represented by the formula (d2), for example, 2-methyl-2-(N-morpholinyl)-1-(4-methylthiophenyl)propane-1- Ketone, 2-dimethylamino-1-(4-(N-morpholinyl)phenyl)-2-benzylbutan-1-one, 2-(dimethylamino)-2-[ (4-Methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]butan-1-one. Commercial products such as Irgacure 369, 907, and 379 (above, manufactured by BASF Corporation) can also be used.

就具有式(d3)表示的部分結構的化合物而言,例如, 可列舉2-羥基-2-甲基-1-苯基丙烷-1-酮,2-羥基-2-甲基-1-(4-(2-羥基乙氧基)苯基]丙烷-1-酮,1-羥基環己基苯基酮,2-羥基-2-甲基-1-(4-異丙烯基苯基)丙烷-1-酮的寡聚物,α,α-二乙氧基苯乙酮,苄基二甲基縮酮等。 In the case of a compound having a partial structure represented by the formula (d3), for example, Either 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-hydroxy-2-methyl-1-(4-(2-hydroxyethoxy)phenyl]propane-1- Oligomeric ketone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propan-1-one, α,α-diethoxybenzene Ethyl ketone, benzyl dimethyl ketal, and the like.

由敏度之觀點上,就苯烷酮化合物而言,以具有式(d2)表示的部分結構的化合物為理想。 From the viewpoint of sensitivity, a compound having a partial structure represented by the formula (d2) is preferred for the phenylalkanone compound.

前述聯咪唑化合物,例如,式(d5)表示的化合物。 The biimidazole compound is, for example, a compound represented by the formula (d5).

[式(d5)中,R3至R8表示可以具有取代基的碳數6至10的芳基]。 [In the formula (d5), R 3 to R 8 represent an aryl group having 6 to 10 carbon atoms which may have a substituent].

就碳數6至10的芳基而言,例如,可列舉苯基,甲苯基,二甲苯基,乙基苯基及萘基等,理想是苯基。 Examples of the aryl group having 6 to 10 carbon atoms include a phenyl group, a tolyl group, a xylyl group, an ethylphenyl group, a naphthyl group and the like, and a phenyl group is preferable.

就取代基而言,例如,可列舉鹵原子,碳數1至4的烷氧基等。就鹵原子而言,例如,可列舉氟原子,氯原子,溴原子,碘原子等,理想是氯原子。就碳數1至4的烷氧基而言,例如,可列舉甲氧基,乙氧基,丙氧基,丁氧基等,理想是甲氧基。 Examples of the substituent include a halogen atom, an alkoxy group having 1 to 4 carbon atoms, and the like. The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and is preferably a chlorine atom. Examples of the alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and the like, and a methoxy group is preferable.

就聯咪唑化合物而言,例如,可列舉2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑,2,2'-雙(2,3-二氯苯 基)-4,4',5,5'-四苯基聯咪唑(例如,參照JPH06-75372-A,JPH06-75373-A等),2,2'-雙(2-氯苯基)-4,4’,5,5'-四苯基聯咪唑,2,2'-雙(2-氯苯基)-4,4’,5,5'-四(烷氧基苯基)聯咪唑,2,2'-雙(2-氯苯基)-4,4’,5,5'-四(二烷氧基苯基)聯咪唑,2,2'-雙(2-氯苯基)-4,4’,5,5'-四(三烷氧基苯基)聯咪唑,(例如,參照JPS48-38403-B,JPS62-174204-A等。),4,4'5,5'-位的苯基經烷氧羰基取代的咪唑化合物(例如,參照JPH07-10913-A等)等。其中,尤以下述式表示的化合物及這些的混合物為理想。 As the biimidazole compound, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis (2, 3-dichlorobenzene -4,4',5,5'-tetraphenylbiimidazole (for example, refer to JPH06-75372-A, JPH06-75373-A, etc.), 2,2'-bis(2-chlorophenyl)- 4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(alkoxyphenyl)biimidazole , 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(dialkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl) -4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole (for example, refer to JPS48-38403-B, JPS62-174204-A, etc.), 4, 4'5, 5' An imidazole compound in which a phenyl group at the - position is substituted with an alkoxycarbonyl group (for example, refer to JPH07-10913-A, etc.) and the like. Among them, a compound represented by the following formula and a mixture of these are preferable.

就前述三化合物而言,例如,2,4-雙(三氯甲基)-6-(4-甲氧基苯基)-1,3,5-三,2,4-雙(三氯甲基)-6-(4-甲氧基萘基)-1,3,5-三,2,4-雙(三氯甲基)-6-向日葵基-1,3,5-三,2,4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)-1,3,5-三,2,4-雙(三氯甲基)-6-[2-(5-甲基呋喃-2-基)乙烯基]-1,3,5-三,2,4-雙(三氯甲基)-6-[2-(呋喃-2-基)乙烯基]-1,3,5-三,2,4-雙(三氯甲基)-6-[2-(4-二乙基胺基-2-甲基苯基)乙烯基]-1,3,5-三,2,4-雙(三氯甲基)-6-[2-(3,4-二甲氧基苯基)乙烯基)-1,3,5-三等。 As mentioned above For the compound, for example, 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-three , 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-three , 2,4-bis(trichloromethyl)-6-sunflower-1,3,5-three , 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-three , 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl)vinyl]-1,3,5-three , 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)vinyl]-1,3,5-three , 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)vinyl]-1,3,5-three , 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl)-1,3,5-three Wait.

就前述醯基膦氧化物化合物而言,可列舉2,4,6-三甲基苄醯基二苯基膦氧化物等。 The above-mentioned mercaptophosphine oxide compound may, for example, be 2,4,6-trimethylbenzylidenediphenylphosphine oxide.

再以聚合起始劑(D)而言,可列舉安息香,安息香甲基醚,安息香乙基醚,安息香異丙醚,安息香異丁醚等安息香化合物;二苯酮,鄰-苄醯基安息香酸甲酯,4-苯基二苯酮,4-苄醯基-4'-甲基二苯硫醚,3,3',4,4'-四(過氧化三級丁基羰基)二苯酮,2,4,6-三甲基二苯酮等二苯酮化合物;9,10-菲醌,2-乙基蒽醌,樟腦醌等醌化合物;10-丁基-2-氯吖啶酮,二苯乙二酮(benzil),苄醯甲酸甲酯(methyl phenylglyoxylalte),二茂鈦(titanocene)化合物等。這些是以與後述的聚合起始助劑(D1)(特別是胺類)組合使用為理想。 Further, as the polymerization initiator (D), benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether and other benzoin compounds; benzophenone, o-benzhydryl benzoic acid Methyl ester, 4-phenylbenzophenone, 4-benzylindolyl-4'-methyldiphenyl sulfide, 3,3',4,4'-tetra(tris-butylcarbonyl)benzophenone a benzophenone compound such as 2,4,6-trimethylbenzophenone; an anthraquinone compound such as 9,10-phenanthrenequinone, 2-ethylhydrazine, camphorquinone; 10-butyl-2-chloroacridone , benzil, methyl phenylglyoxylalte, titanium oxide (titanocene) compound, and the like. These are preferably used in combination with a polymerization initiation aid (D1) (particularly an amine) to be described later.

聚合起始劑(D)的含量,相對於固形分的總量,理想是1至30質量%,更理想是5至20質量%。 The content of the polymerization initiator (D) is desirably 1 to 30% by mass, and more desirably 5 to 20% by mass based on the total amount of the solid content.

又,聚合起始劑(D)的含量,相對於樹脂(B)及聚合性化合物(C)的合計量100質量份,理想是1至50質量份,更理想是10至45質量份,再更理想是20至40質量份。 In addition, the content of the polymerization initiator (D) is preferably from 1 to 50 parts by mass, more preferably from 10 to 45 parts by mass, based on 100 parts by mass of the total of the resin (B) and the polymerizable compound (C). More preferably, it is 20 to 40 parts by mass.

<聚合起始助劑(D1)> <Polymerization starter (D1)>

聚合起始助劑(D1)是用於促進藉由聚合起始劑開始聚合的聚合性化合物的聚合的化合物,或增敏劑。含聚合起始助劑(D1)時,通常,可與聚合起始劑(D)組合使用。 The polymerization initiation aid (D1) is a compound for promoting polymerization of a polymerizable compound which starts polymerization by a polymerization initiator, or a sensitizer. When the polymerization initiator (D1) is contained, it is usually used in combination with the polymerization initiator (D).

就聚合起始助劑(D1)而言,可列舉胺化合物,烷氧基蒽化合物,噻吨酮(thioxanthone)化合物,羧酸化合物等。 The polymerization starting aid (D1) may, for example, be an amine compound, an alkoxy fluorene compound, a thioxanthone compound, a carboxylic acid compound or the like.

就前述胺化合物而言,可列舉三乙醇胺,甲基二乙醇胺,三異丙醇胺,4-二甲基胺基安息香酸甲酯,4-二甲基胺基安息香酸乙酯,4-二甲基胺基安息香酸異戊 酯,安息香酸2-二甲基胺基乙酯,4-二甲基胺基安息香酸2-乙基己酯,N,N-二甲基對甲苯胺,4,4'-雙(二甲基胺基)二苯酮(通稱米其勒酮[Michler’s ketone]),4,4’-雙(二乙基胺基)二苯酮,4,4'-雙(乙基甲基胺基)二苯酮等,其中尤以4,4-雙(二乙基胺基)二苯酮為理想。也可使用EAB-F(保土谷化學工業(股)製)等市售品。 As the aforementioned amine compound, there may be mentioned triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4-di Methylamino benzoic acid isoflavone Ester, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl-p-toluidine, 4,4'-bis (dimethyl Amino) benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(ethylmethylamino) Benzophenone and the like, among which 4,4-bis(diethylamino)benzophenone is particularly preferred. Commercial products such as EAB-F (manufactured by Hodogaya Chemical Industry Co., Ltd.) can also be used.

就前述烷氧基蒽化合物而言,可列舉9,10-二甲氧基蒽,2-乙基-9,10-二甲氧基蒽,9,10-二乙基蒽,2-乙基-9,10-二乙氧基蒽,9,10-二丁氧基蒽,2-乙基-9,10-二丁氧基蒽等。 The alkoxy hydrazine compound may, for example, be 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethylanthracene or 2-ethyl -9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, 2-ethyl-9,10-dibutoxyanthracene, and the like.

就前述噻吨酮化合物而言,可列舉2-異丙基噻吨酮,4-異丙基噻吨酮,2,4-二乙基噻吨酮,2,4-二氯噻吨酮,1-氯-4-丙氧基噻吨酮等。 Examples of the aforementioned thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, and 2,4-dichlorothioxanthone. 1-Chloro-4-propoxythioxanthone and the like.

就前述羧酸化合物而言,可列舉苯基硫基乙酸,甲基苯基硫基乙酸,乙基苯基硫基乙酸,甲基乙基苯基硫基乙酸,二甲基苯基硫基乙酸,甲氧基苯基硫基乙酸,二甲氧基苯基硫基乙酸,氯苯基硫基乙酸,二氯苯基硫基乙酸,N-苯基甘胺酸,苯氧基乙酸,萘基硫乙酸,N-萘基甘胺酸,萘氧基乙酸等。 Examples of the aforementioned carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, and dimethylphenylthioacetic acid. , methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthyl Sulfuric acid, N-naphthylglycine, naphthoxyacetic acid, and the like.

使用這些聚合起始助劑(D1)時,其含量,相對於樹脂(B)及聚合性化合物(C)的合計量100質量份,理想是0.1至30質量份,更理想是1至20質量份。聚合起始助劑(D1)之量在此範圍內時,可更高敏度形成著色圖案化塗膜,彩色濾光片的生產性有提高的傾向。 When the polymerization initiator (D1) is used, the content thereof is preferably 0.1 to 30 parts by mass, more preferably 1 to 20 parts by mass based on 100 parts by mass of the total of the resin (B) and the polymerizable compound (C). Share. When the amount of the polymerization initiation aid (D1) is within this range, a colored patterning coating film can be formed with higher sensitivity, and the productivity of the color filter tends to be improved.

<硫醇化合物(T)> <thiol compound (T)>

硫醇化合物(T)是分子內有-SH的化合物。 The thiol compound (T) is a compound having -SH in the molecule.

就分子內有1個-SH的化合物而言,例如,可列舉2-硫基唑,2-硫基噻唑,2-硫基苯并咪唑,2-硫基苯并噻唑,2-硫基苯并唑,2-硫基菸鹼酸,2-硫基吡啶,2-硫基吡啶-3-醇,2-硫基吡啶-N-氧化物,4-胺基-6-羥基-2-硫基嘧啶,4-胺基-6-羥基-2-硫基硫基嘧啶,4-胺基-2-硫基嘧啶,6-胺基-5-亞硝基-2-硫脲嘧啶,4,5-二胺基-6-羥基-2-硫基嘧啶,4,6-二胺基-2-硫基嘧啶,2,4-二胺基-6-硫基嘧啶,4,6-二羥基-2-硫基嘧啶,4,6-二甲基-2-硫基嘧啶,4-羥基-2-硫基-6-甲基嘧啶,4-羥基-2-硫基-6-丙基嘧啶,2-硫基-4-甲基嘧啶,2-硫基嘧啶,2-硫脲嘧啶,3,4,5,6-四氫嘧啶-2-硫醇,4,5-二苯基嘧唑-2-硫醇,2-硫基嘧唑,2-硫基-1-甲基嘧唑,4-胺基-3-肼基-5-硫基-1,2,4-三唑,3-胺基-5-硫基-1,2,4-三唑,2-甲基-4H-1,2,4-三唑-3-硫醇,4-甲基-4H-1,2,4-三唑-3-硫醇,3-硫基1H-1,2,4-三唑-3-硫醇,2-胺基-5-硫基-1,3,4-噻二唑,5-胺基-1,3,4-噻二唑-2-硫醇,2,5-二硫基-1,3,4-噻二唑,(呋喃-2-基)甲烷硫醇,2-硫基-5-四氫噻唑酮(2-sulfanyl-5-thiazolidone),2-硫基噻唑啉(2-sulfanyl thiazoline),2-硫基-4(3H)-喹唑啉酮(2-sulfanyl-4(3H)-quinazolinone),1-苯基-1H-四唑-5-硫醇,2-喹啉硫醇,2-硫基-5-甲基苯并咪唑,2-硫基-5-硝基苯并咪唑,6-胺基-2-硫基苯并噻唑,5-氯-2-硫基苯并噻唑,6-乙氧基-2-硫基苯并噻唑,6-硝基-2-硫基苯并噻唑,2-硫基 萘并咪唑,2-硫基萘并唑,3-硫基-1,2,4-三唑,4-胺基-6-硫基吡唑并[2,4-d]吡啶,2-胺基-6-嘌呤硫醇,6-硫基嘌呤,4-硫基-1H-吡唑并[2,4-d]嘧啶等。 For a compound having one -SH in the molecule, for example, a 2-thio group can be cited. Oxazole, 2-thiothiazole, 2-thiobenzimidazole, 2-thiobenzothiazole, 2-thiobenzophenone Oxazole, 2-thionicotinic acid, 2-thiopyridine, 2-thiopyridin-3-ol, 2-thiopyridine-N-oxide, 4-amino-6-hydroxy-2-thio Pyrimidine, 4-amino-6-hydroxy-2-thiothiopyrimidine, 4-amino-2-thiopyrimidine, 6-amino-5-nitroso-2-thiouracil, 4,5 -diamino-6-hydroxy-2-thiopyrimidine, 4,6-diamino-2-thiopyrimidine, 2,4-diamino-6-thiopyrimidine, 4,6-dihydroxy- 2-thiopyrimidine, 4,6-dimethyl-2-thiopyrimidine, 4-hydroxy-2-thio-6-methylpyrimidine, 4-hydroxy-2-thio-6-propylpyrimidine, 2-thio-4-methylpyrimidine, 2-thiopyrimidine, 2-thiouracil, 3,4,5,6-tetrahydropyrimidin-2-thiol, 4,5-diphenylpyrazole- 2-thiol, 2-thiopyrazole, 2-thio-1-methylpyrazole, 4-amino-3-indolyl-5-thio-1,2,4-triazole, 3- Amino-5-thio-1,2,4-triazole, 2-methyl-4H-1,2,4-triazole-3-thiol, 4-methyl-4H-1,2,4 Triazole-3-thiol, 3-thiol 1H-1,2,4-triazole-3-thiol, 2-amino-5-thio-1,3,4-thiadiazole, 5 -Amino-1,3,4-thiadiazole-2-thiol, 2,5-dithio-1,3,4-thiadiazole, (furan-2-yl)methanethiol, 2- Thio-5-thiazolidine (2-sulfanyl-5-thiazolido) Ne), 2-sulfanyl thiazoline, 2-sulfanyl-4(3H)-quinazolinone, 1-phenyl-1H- Tetrazolium-5-thiol, 2-quinoline thiol, 2-thio-5-methylbenzimidazole, 2-thio-5-nitrobenzimidazole, 6-amino-2-thio Benzothiazole, 5-chloro-2-thiobenzothiazole, 6-ethoxy-2-thiobenzothiazole, 6-nitro-2-thiobenzothiazole, 2-thionaphthyl imidazole 2-thionaphthyl Oxazole, 3-thio-1,2,4-triazole, 4-amino-6-thiopyrazolo[2,4-d]pyridine, 2-amino-6-anthracenethiol, 6- Thioquinone, 4-thio-1H-pyrazolo[2,4-d]pyrimidine, and the like.

就分子內有2個以上-SH的化合物而言,可列舉己烷二硫醇,癸烷二硫醇,1,4-雙(甲基硫基)苯,丁烷二醇雙(3-硫基丙酸酯),丁烷二醇雙(3-硫基乙酸酯),乙二醇雙(3-硫基乙酸酯),三羥甲基丙烷三(3-硫基乙酸酯),丁烷二醇雙(3-硫基丙酸酯),三羥甲基丙烷三(3-硫基丙酸酯),三羥甲基丙烷三(3-硫基乙酸酯),新戊四醇四(3-硫基丙酸酯),新戊四醇四(3-硫基乙酸酯),三羥乙基三(3-硫基丙酸酯),新戊四醇四(3-硫基丁酸酯),1,4-雙(3-硫基丁氧基)丁烷等。 Examples of the compound having two or more -SH in the molecule include hexane dithiol, decane dithiol, 1,4-bis(methylthio)benzene, butanediol bis (3-sulfuric acid). Propionate), butanediol bis(3-thioacetate), ethylene glycol bis(3-thioacetate), trimethylolpropane tris(3-thioacetate) , butanediol bis(3-thiopropionate), trimethylolpropane tris(3-thiopropionate), trimethylolpropane tris(3-thioacetate), neopentyl Tetraol tetrakis(3-thiopropionate), pentaerythritol tetrakis(3-thioacetate), trishydroxyethyltris(3-thiopropionate), pentaerythritol tetra(3) -thiobutyrate), 1,4-bis(3-thiobutyloxy)butane, and the like.

就硫醇化合物(T)而言,以分子內有1個-SH的化合物為理想。 In the case of the thiol compound (T), a compound having one -SH in the molecule is preferred.

硫醇化合物(T)的含量,相對於聚合起始劑(D)100質量份,理想是0.5至20質量份,更理想是1至15質量份。硫醇化合物(T)的含量在此範圍內時,有敏度變高,顯影性變良好的傾向。 The content of the thiol compound (T) is preferably from 0.5 to 20 parts by mass, more preferably from 1 to 15 parts by mass, per 100 parts by mass of the polymerization initiator (D). When the content of the thiol compound (T) is within this range, the sensitivity is high and the developability tends to be good.

<溶劑(E)> <Solvent (E)>

溶劑(E),沒有特別的限定,可使用本領域通常使用的溶劑。例如,可列舉酯溶劑(分子內含-COO-,不含-O-的溶劑),醚溶劑(分子內含-O-,不含-COO-的溶劑),醚酯溶劑(分子內含-COO-及-O-的溶劑),酮溶劑(分子內含-CO-,不含-COO-的溶劑),醇溶劑(分子內含OH,不含-O-,-CO-及 -COO-的溶劑),芳香族烴溶劑,醯胺溶劑,二甲基亞碸等。 The solvent (E) is not particularly limited, and a solvent which is generally used in the art can be used. For example, an ester solvent (a solvent containing -COO- in the molecule, a solvent containing no -O-), an ether solvent (a solvent containing -O- in the molecule, a solvent containing no -COO-), an ether ester solvent (molecular inclusion - Solvent for COO- and -O-), ketone solvent (-CO-, solvent without -COO-), alcohol solvent (OH in the molecule, -O-, -CO- and - a solvent of COO-), an aromatic hydrocarbon solvent, a guanamine solvent, dimethyl hydrazine or the like.

就酯溶劑而言,可列舉乳酸甲酯,乳酸乙酯,乳酸丁酯,2-羥異丁酸甲酯,乙酸乙酯,乙酸正丁酯,乙酸異丁酯,甲酸戊酯,乙酸異戊酯,丙酸丁酯,丁酸異丙酯,丁酸乙酯,丁酸丁酯,丙酮酸甲酯,丙酮酸乙酯,丙酮酸丙酯,乙醯乙酸甲酯,乙醯乙酸乙酯,乙酸環己醇酯,γ-丁內酯等。 Examples of the ester solvent include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutyrate, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, and isoamyl acetate. Ester, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate Cyclohexanol acetate, γ-butyrolactone, and the like.

就醚溶劑而言,可列舉乙二醇單甲基醚,乙二醇單乙基醚,乙二醇單丙基醚,乙二醇單丁基醚,二乙二醇單甲基醚,二乙二醇單乙基醚,二乙二醇單丁基醚,丙二醇單甲基醚,丙二醇單乙基醚,丙二醇單丙基醚,丙二醇單丁基醚,3-甲氧基-1-丁醇,3-甲氧基-3-甲基丁醇,四氫呋喃,四氫吡喃,1,4-二烷,二乙二醇二甲基醚,二乙二醇二乙基醚,二乙二醇甲基乙基醚,二乙二醇二丙基醚,二乙二醇二丁基醚,甲氧苯(anisole),苯乙醚(phenetole),甲基甲氧苯等。 As the ether solvent, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, and the like are mentioned. Ethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butyl Alcohol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-two Alkane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, methoxy Anisole, phenetole, methylmethoxybenzene, and the like.

就醚酯溶劑而言,可列舉甲氧基乙酸甲酯,甲氧基乙酸乙酯,甲氧基乙酸丁酯,乙氧基乙酸甲酯,乙氧基乙酸乙酯,3-甲氧基丙酸甲酯,3-甲氧基丙酸乙酯,3-乙氧基丙酸甲酯,3-乙氧基丙酸乙酯,2-甲氧基丙酸甲酯,2-甲氧基丙酸乙酯,2-甲氧基丙酸丙酯,2-乙氧基丙酸甲酯,2-乙氧基丙酸乙酯,2-甲氧基-2-甲基丙酸甲酯,2-乙氧基-2-甲基丙酸乙酯,乙酸3-甲氧基丁酯,乙酸3-甲基-3-甲氧基丁酯,丙二醇單甲基醚乙酸酯,丙二醇單乙基醚 乙酸酯,丙二醇單丙醚乙酸酯,乙二醇單甲基醚乙酸酯,乙二醇單乙基醚乙酸酯,二乙二醇單乙基醚乙酸酯,二乙二醇單丁基醚乙酸酯,二丙二醇甲基醚乙酸酯等。 Examples of the ether ester solvent include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and 3-methoxypropene. Methyl ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, 2-methoxypropane Ethyl acetate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropanoate, 2 - Ethoxy-2-methylpropionic acid ethyl ester, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether Acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol Monobutyl ether acetate, dipropylene glycol methyl ether acetate, and the like.

就酮溶劑而言,可列舉4-羥基-4-甲基-2-戊酮,丙酮,2-丁酮,2-庚酮,3-庚酮,4-庚酮,4-甲基-2-戊酮,環戊酮,環己酮,異佛爾酮(isophorone)等。 As the ketone solvent, there may be mentioned 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2. - Pentanone, cyclopentanone, cyclohexanone, isophorone, and the like.

就醇溶劑而言,可列舉甲醇,乙醇,丙醇,丁醇,己醇,環己醇,乙二醇,丙二醇,甘油等。 Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, glycerin and the like.

就芳香族烴溶劑而言,可列舉苯,甲苯,二甲苯,1,3,5-三甲苯等。 Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, 1,3,5-trimethylbenzene and the like.

就醯胺溶劑而言,可列舉N,N-二甲基甲醯胺,N,N-二甲基乙醯胺,N-甲基吡咯啶酮等。 Examples of the guanamine solvent include N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone and the like.

這些溶劑,可單獨使用或2種以上併用。 These solvents may be used singly or in combination of two or more.

上述的溶劑之中,由塗佈性、乾燥性之觀點上,以在1大氣壓的沸點係120℃以上180℃以下的有機溶劑為理想。其中,尤以丙二醇單甲基醚乙酸酯,乳酸乙酯,丙二醇單甲基醚,3-乙氧基丙酸乙酯,乙二醇單甲基醚,乙二醇單丁基醚,二乙二醇單甲基醚,二乙二醇單乙基醚,乙酸3-甲氧基丁酯,3-甲氧基-1-丁醇,4-羥基-4-甲基-2-戊酮及N,N-二甲基甲醯胺為理想,並以丙二醇單甲基醚乙酸酯,丙二醇單甲基醚,乙二醇單丁基醚,二丙二醇甲基醚乙酸酯,乳酸乙酯,乙酸3-甲氧基丁酯,3-甲氧基-1-丁醇及3-乙氧基丙酸乙酯更理想。 Among the above-mentioned solvents, an organic solvent having a boiling point of from 120 ° C to 180 ° C at a boiling point of 1 atm is preferred from the viewpoint of coatability and drying property. Among them, especially propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, ethyl 3-ethoxypropionate, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, two Ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, 3-methoxybutyl acetate, 3-methoxy-1-butanol, 4-hydroxy-4-methyl-2-pentanone And N,N-dimethylformamide is ideal, and propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, ethylene glycol monobutyl ether, dipropylene glycol methyl ether acetate, lactate B The ester, 3-methoxybutyl acetate, 3-methoxy-1-butanol and ethyl 3-ethoxypropionate are more preferred.

溶劑(E)的含量,相對於著色光敏性樹脂組 成物的總量,理想是70至95質量%,更理想是75至92質量%。換言之,著色光敏性樹脂組成物的固形分,理想是5至30質量%,更理想是8至25質量%。 The content of the solvent (E) relative to the colored photosensitive resin group The total amount of the product is desirably 70 to 95% by mass, more desirably 75 to 92% by mass. In other words, the solid content of the colored photosensitive resin composition is desirably 5 to 30% by mass, more desirably 8 to 25% by mass.

溶劑(E)的含量在前述的範圍時,在塗佈時的平坦性良好,在形成彩色濾光片時色濃度足夠,所以有顯示特性良好的傾向。 When the content of the solvent (E) is in the above range, the flatness at the time of coating is good, and when the color filter is formed, the color density is sufficient, so that the display property tends to be good.

<調平劑(F)> <Leveling agent (F)>

就調平劑(F)而言,可列舉聚矽氧系界面活性劑,氟系界面活性劑及具有氟原子的聚矽氧系界面活性劑等。這些,可在支鏈具有聚合性基。 Examples of the leveling agent (F) include a polyfluorene-based surfactant, a fluorine-based surfactant, and a polyfluorene-based surfactant having a fluorine atom. These may have a polymerizable group in the branch.

就聚矽氧系界面活性劑而言,可列舉分子內有矽氧烷鍵結的界面活性劑等。具體而言,Toray Silicone DC3PA,同SH7PA,同DC11PA,同SH21PA,同SH28PA,同SH29PA,同SH30PA,同SH8400(商品名;東麗.道康寧(Toray DOW Corning)(股)製);KP321,KP322,KP323,KP324,KP326,KP340,KP341(信越化學工業(股)製);TSF400,TSF401,TSF410,TSF4300,TSF4440,TSF4445,TSF-4446,TSF4452及TSF4460(Momentive Performance Materials Japan合同公司製)等。 The polyoxo-based surfactant may, for example, be a surfactant having a siloxane coupling in the molecule. Specifically, Toray Silicone DC3PA, same as SH7PA, with DC11PA, with SH21PA, with SH28PA, with SH29PA, with SH30PA, with SH8400 (trade name; Toray DOW Corning (share) system); KP321, KP322 , KP323, KP324, KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.); TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452 and TSF4460 (manufactured by Momentive Performance Materials Japan Co., Ltd.).

就前述的氟系界面活性劑而言,可列舉在分子內具有氟碳鏈的界面活性劑等。具體而言,可列舉Fluorad(註冊商標)FC430,同FC431(住友3M(股)製);Megafac(註冊商標)F142D,同F171,同F172,同F173,同F177,同F183,同F554,同R30,同RS-718-K(DIC(股)製); Eftop(註冊商標)EF301,同EF303,同EF351,同EF352(三菱材料電子化成(股)製);Surflon(註冊商標)S381,同S382,同SC101,同SC105(旭玻璃(股)製)及同E5844(Daikin Fine Chemicals研究所(股)製)等。 The above-mentioned fluorine-based surfactant may, for example, be a surfactant having a fluorocarbon chain in the molecule. Specifically, Fluorad (registered trademark) FC430, FC431 (Sumitomo 3M (share) system); Megafac (registered trademark) F142D, F171, F172, F173, F177, F183, F554, and the same R30, same as RS-718-K (DIC system); Eftop (registered trademark) EF301, same as EF303, with EF351, with EF352 (Mitsubishi Materials Electronics Co., Ltd.); Surflon (registered trademark) S381, same as S382, with SC101, with SC105 (asahi Glass) Same as E5844 (Daikin Fine Chemicals Research Institute Co., Ltd.).

就前述的具有氟原子的聚矽氧系界面活性劑而言,可列舉分子內具有矽氧烷鍵結及氟碳鏈的界面活性劑等。具體而言,可列舉Megafac(註冊商標)R08,同BL20,同F475,同F477及同F443(DIC(股)製)等。 Examples of the polyfluorene-based surfactant having a fluorine atom include a surfactant having a siloxane chain and a fluorocarbon chain in the molecule. Specific examples include Megafac (registered trademark) R08, BL30, F475, F477, and F443 (DIC).

調平劑(F)的含量,相對於著色光敏性樹脂組成物的總量,理想是0.001質量%以上0.2質量%以下,理想是0.002質量%以上0.1質量%以下,更理想是0.005質量%以上0.05質量%以下。調平劑(F)的含量在前述的範圍內時,可使彩色濾光片的平坦性良好。 The content of the leveling agent (F) is preferably 0.001% by mass or more and 0.2% by mass or less, more preferably 0.002% by mass or more and 0.1% by mass or less, and more preferably 0.005% by mass or more, based on the total amount of the coloring photosensitive resin composition. 0.05% by mass or less. When the content of the leveling agent (F) is within the above range, the flatness of the color filter can be improved.

<密著促進劑(G)> <Adhesion Promoter (G)>

就密著促進劑(G)而言,例如,可列舉乙烯三甲氧基矽烷,乙烯三乙氧基矽烷,乙烯三(2-甲氧基乙氧基)矽烷,3-環氧丙氧基丙基三甲氧基矽烷,3-環氧丙氧基丙基甲基二甲氧基矽烷,3-環氧丙氧基丙基甲基二甲氧基矽烷,3-環氧丙氧基丙基甲基二乙氧基矽烷,2-(3,4-環氧基環己基)乙基三甲氧基矽烷,3-氯丙基甲基二甲氧基矽烷,3-氯丙基三甲氧基矽烷,3-甲基丙烯醯氧基丙基三甲氧基矽烷,3-巰基丙基三甲氧基矽烷,3-硫基丙基三甲氧基矽烷,3-異氰酸酯丙基三乙氧基矽烷,N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷,N-2-(胺基乙基)-3-胺基丙基甲基二乙 氧基矽烷,N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷,N-2-(胺基乙基)-3-胺基丙基甲基二乙氧基矽烷,3-胺基丙基三甲氧基矽烷,3-胺基丙基三乙氧基矽烷,N-苯基-3-胺基丙基三甲氧基矽烷,N-苯基-3-胺基丙基三乙氧基矽烷等。 Examples of the adhesion promoter (G) include ethylene trimethoxy decane, ethylene triethoxy decane, ethylene tris(2-methoxyethoxy) decane, and 3-epoxypropoxy propyl acrylate. Trimethoxymethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropyl Diethoxy decane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropylmethyldimethoxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 3-mercaptopropyltrimethoxydecane, 3-thiopropyltrimethoxydecane, 3-isocyanatepropyltriethoxydecane, N-2 -(Aminoethyl)-3-aminopropylmethyldimethoxydecane, N-2-(aminoethyl)-3-aminopropylmethyldiethyl Oxydecane, N-2-(aminoethyl)-3-aminopropyltrimethoxydecane, N-2-(aminoethyl)-3-aminopropylmethyldiethoxydecane , 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, N-phenyl-3-aminopropyltrimethoxydecane, N-phenyl-3-aminopropyl Triethoxy decane and the like.

密著促進劑(G)的含量,相對於固形分的總量,理想是0.1質量%以上5質量%以下,理想是0.2質量%以上2質量%以下。密著促進劑(G)的含量在前述的範圍內時,可使與基板的密著性良好。 The content of the adhesion promoter (G) is preferably 0.1% by mass or more and 5% by mass or less based on the total amount of the solid content, and is preferably 0.2% by mass or more and 2% by mass or less. When the content of the adhesion promoter (G) is within the above range, the adhesion to the substrate can be improved.

<其他的成分> <Other ingredients>

本發明著色光敏性樹脂組成物,可因應需要含有填充劑,其他的高分子化合物,密著促進劑,抗氧化劑,光安定劑,鏈轉移劑等,本技術領域公知的添加劑。 The colored photosensitive resin composition of the present invention may contain a filler, other polymer compound, adhesion promoter, antioxidant, light stabilizer, chain transfer agent, etc., which are known in the art, as needed.

<著色光敏性樹脂組成物的製造方法> <Method for Producing Colored Photosensitive Resin Composition>

本發明的著色光敏性樹脂組成物,例如,可藉由將著色劑(A),樹脂(B),聚合性化合物(C),聚合起始劑(D),溶劑(E),以及有必要時所用的硫醇化合物(T),調平劑(F),聚合起始助劑(D1),密著促進劑(G)及其他的成分混合而調製。 The colored photosensitive resin composition of the present invention can be, for example, a coloring agent (A), a resin (B), a polymerizable compound (C), a polymerization initiator (D), a solvent (E), and the like. The thiol compound (T), the leveling agent (F), the polymerization starting aid (D1), the adhesion promoter (G) and other components used in the preparation are mixed.

顏料,以預先與溶劑(E)的一部分或全部混合,並使用珠磨機等進行分散直到顏料的平均粒子徑達0.2μm以下程度為止為理想。這時,可因應需要調配前述顏料分散劑、樹脂(B)的一部分或全部。將如此所得的顏料分散液,與其餘的成分混合成為所規定的濃度,而可調製目的之著色光 敏性樹脂組成物。 The pigment is preferably mixed with a part or all of the solvent (E) in advance and dispersed by using a bead mill or the like until the average particle diameter of the pigment is about 0.2 μm or less. At this time, a part or all of the above-mentioned pigment dispersant and resin (B) may be blended as needed. The pigment dispersion liquid thus obtained is mixed with the remaining components to a predetermined concentration, and the color light of the purpose can be modulated. Sensitive resin composition.

以將混合後的著色光敏性樹脂組成物使用孔徑0.1至10μm左右的過濾膜過濾為理想。 It is preferable to filter the mixed color-sensitive photosensitive resin composition using a filtration membrane having a pore diameter of about 0.1 to 10 μm.

<彩色濾光片的製造方法> <Method of Manufacturing Color Filter>

就由本發明的著色光敏性樹脂組成物而製造著色圖案化塗膜的方法而言,可列舉微影蝕刻法,印墨噴射法,印刷法等。其中,以微影蝕刻法為理想。微影蝕刻法是將前述著色光敏性樹脂組成物在基板上塗佈、乾燥而形成著色組成物層,並隔著光罩將該著色組成物層曝光、顯影的方法。在微影蝕刻法中,藉由曝光時不用光罩及/或不顯影,而可形成上述著色組成物層的硬化物的著色塗膜。如此形成的著色圖案化塗膜或著色塗膜為本發明的彩色濾光片。 The method of producing the colored patterned coating film from the colored photosensitive resin composition of the present invention includes a micro-etching method, an ink jet method, a printing method, and the like. Among them, the lithography method is ideal. The lithography method is a method in which the colored photosensitive resin composition is applied onto a substrate and dried to form a colored composition layer, and the colored composition layer is exposed and developed through a photomask. In the lithography method, a colored coating film of a cured product of the colored composition layer can be formed by using a mask without exposure and/or no development. The colored patterned coating film or colored coating film thus formed is the color filter of the present invention.

製作的彩色濾光片的膜厚,沒有特別的限定,視目的及用途等而可適宜調整,例如,0.1至30μm,理想是0.1至20μm,更理想是0.5至6μm。 The film thickness of the produced color filter is not particularly limited, and can be appropriately adjusted depending on the purpose, use, and the like, and is, for example, 0.1 to 30 μm, preferably 0.1 to 20 μm, and more desirably 0.5 to 6 μm.

就基板而言,可使用石英玻璃,硼矽酸玻璃,矽酸鋁玻璃,將表面被覆氧化矽的鈉鈣玻璃(soda-lime glass)等玻璃板;聚碳酸酯,聚甲基丙烯酸甲酯,聚對苯二甲酸乙二酯等樹脂板;矽,在前述基板上形成有鋁、銀、銀/銅/鈀合金薄膜等基板。在這些基板上,可形成別的彩色濾光片層,樹脂層,電晶體,電路等。 As the substrate, quartz glass, borosilicate glass, aluminum silicate glass, a glass plate such as soda-lime glass coated with cerium oxide; polycarbonate, polymethyl methacrylate, A resin plate such as polyethylene terephthalate; and a substrate such as an aluminum, silver, silver/copper/palladium alloy film formed on the substrate. On these substrates, other color filter layers, resin layers, transistors, circuits, and the like can be formed.

藉由微影蝕刻法而形成各色畫素,可以公知或慣用的裝置及條件進行。例如,可如下述的方法製作。 The formation of the respective color pixels by the lithography method can be carried out by known or conventional devices and conditions. For example, it can be produced by the method described below.

首先,將著色光敏性樹脂組成物在基板上塗佈,藉由加熱乾燥(預焙烤)及/或減壓乾燥而將溶劑等揮發成分除去並乾燥,得平滑的著色組成物層。 First, the colored photosensitive resin composition is applied onto a substrate, and dried by heating (prebaking) and/or drying under reduced pressure to remove volatile components such as a solvent and drying to obtain a smooth colored composition layer.

就塗佈方法而言,可列舉旋轉塗佈法,狹縫塗佈法,狹縫及旋轉式塗佈(slit and spin coating)法等。 Examples of the coating method include a spin coating method, a slit coating method, a slit, and a slit and spin coating method.

進行加熱乾燥時的溫度,以30至120℃為理想,以50至110℃更理想。又,就加熱時間而言,以10秒鐘至60分鐘為理想,以30秒鐘至30分鐘為更理想。 The temperature at the time of heat drying is preferably 30 to 120 ° C, more preferably 50 to 110 ° C. Further, in terms of heating time, it is preferably from 10 seconds to 60 minutes, and more preferably from 30 seconds to 30 minutes.

進行減壓乾燥時,以在50至150Pa的壓力下,20至25℃的溫度範圍進行為理想。 When drying under reduced pressure, it is preferably carried out at a temperature of from 20 to 25 ° C under a pressure of 50 to 150 Pa.

著色組成物層的膜厚,沒有特別的限定,視目的之彩色濾光片的膜厚而適宜選擇即可。 The film thickness of the coloring composition layer is not particularly limited, and may be appropriately selected depending on the film thickness of the intended color filter.

其次,著色組成物層,隔著用於形成目的之著色圖案化塗膜的光罩而曝光。該光罩上的圖案是沒有特別的限定,可使用適合於目的之用途的圖案。 Next, the colored composition layer is exposed through a photomask for forming a color-patterned coating film for the purpose of formation. The pattern on the photomask is not particularly limited, and a pattern suitable for the purpose of use can be used.

就用於曝光的光源而言,以產生250至450nm波長的光的光源為理想。例如,可列舉將未達350nm的光使用攔截(cut)此波長區域的濾片攔截,或將436nm左右、408nm左右、365nm左右的光使用取出這些波長區域的通帶濾片(band-pass filter)而選擇性地取出。 As the light source for exposure, a light source which generates light of a wavelength of 250 to 450 nm is desirable. For example, a filter that intercepts light in a wavelength range of less than 350 nm may be used, or a light of about 436 nm, about 408 nm, or about 365 nm may be used to take out a band-pass filter of these wavelength regions. ) and selectively removed.

具體而言,可列舉水銀燈,發光二極體,金屬鹵素燈,鹵素燈等。 Specifically, a mercury lamp, a light-emitting diode, a metal halide lamp, a halogen lamp, etc. are mentioned.

為了對曝光面全體均勻照射平行光線,或使形成有光罩及著色組成物層的基板能正確調整位置,而以使用光罩 對準器及步進器等曝光裝置為理想。 In order to uniformly illuminate the entire surface of the exposed surface, or to make the substrate on which the mask and the coloring composition layer are formed, the position can be correctly adjusted to use the mask. Exposure devices such as aligners and steppers are ideal.

藉由將曝光後的著色組成物層與顯影液接觸進行顯影,而在基板上形成著色圖案化塗膜。經由顯影,將著色組成物層的未曝光部分溶解於顯影液中而除去。 The colored patterned coating layer is formed on the substrate by developing the exposed colored composition layer in contact with the developing solution. The unexposed portion of the colored composition layer was dissolved in a developing solution to be removed by development.

就顯影液而言,例如,以氫氧化鉀,碳酸氫鈉,碳酸鈉,氫氧化四甲基銨等鹼性化合物的水溶液為理想。這些鹼性化合物的水溶液中的濃度,理想是0.01至10質量%,更理想是0.03至5質量%。再者,顯影液可含界面活性劑。 As the developer, for example, an aqueous solution of a basic compound such as potassium hydroxide, sodium hydrogencarbonate, sodium carbonate or tetramethylammonium hydroxide is preferred. The concentration in the aqueous solution of these basic compounds is desirably 0.01 to 10% by mass, more desirably 0.03 to 5% by mass. Further, the developer may contain a surfactant.

顯影方法可以是覆液(puddle)法、浸漬法及噴灑法等任一種。再者,顯影時可將基板以任意角度傾斜。 The developing method may be any one of a puddle method, a dipping method, and a spraying method. Further, the substrate can be tilted at an arbitrary angle during development.

顯影後,以水清洗為理想。 After development, it is ideal to wash with water.

再者,以將所得的著色圖案化塗膜,進行後焙烤為理想。後焙烤溫度,以150至250℃為理想,以160至235℃更理想。後焙烤時間,以1至120分鐘為理想,以10至60分鐘更理想。 Further, it is preferable to pattern the obtained colored coating film and perform post-baking. The post-baking temperature is preferably 150 to 250 ° C, more preferably 160 to 235 ° C. The post-baking time is ideal from 1 to 120 minutes, and more preferably from 10 to 60 minutes.

若依本發明的著色光敏性樹脂組成物,特別是殘渣或殘留膜的產生少,因而可製造缺陷少的彩色濾光片。該彩色濾光片,有用在做為顯示裝置(例如,液晶顯示裝置,有機EL裝置,電子紙張等)及固體影像感測器所用的彩色濾光片。 According to the colored photosensitive resin composition of the present invention, in particular, the generation of the residue or the residual film is small, and thus a color filter having few defects can be produced. The color filter is useful as a color filter for use as a display device (for example, a liquid crystal display device, an organic EL device, an electronic paper, etc.) and a solid image sensor.

實施例 Example

其次列舉實施例,更具體說明本發明。例中「%」及「份」,如無特別說明時,表示質量%及質量份。 Next, the present invention will be described more specifically by way of examples. In the examples, "%" and "parts" indicate the mass % and mass parts unless otherwise stated.

合成例1 Synthesis Example 1

在配備有攪拌機、溫度計、回流冷凝器及滴下漏斗的燒瓶內,將氮氣以0.02L/分鐘流通而成為氮環境,裝入丙二醇單甲基醚乙酸酯257質量份,邊攪拌邊加熱至70℃。繼而,將丙烯酸8份、N-環己基馬來醯亞胺70份、丙烯酸3,4-環氧基三環[5.2.1.02.6]癸烷-8-酯及丙烯酸3,4-環氧基三環[5.2.1.02.6]癸烷-9-酯的混合物(含有比是莫耳比50:50)32質量份,溶解於丙二醇單甲基醚乙酸酯140質量份中而調製溶液,將該溶液使用滴下漏斗花費4小時滴入於保溫在70℃的燒瓶內。 In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, nitrogen gas was passed through at 0.02 L/min to form a nitrogen atmosphere, and 257 parts by mass of propylene glycol monomethyl ether acetate was charged, and heated to 70 with stirring. °C. Then, 8 parts of acrylic acid, 70 parts of N-cyclohexylmaleimide, 3,4-epoxytricyclo[5.2.1.0 2.6 ]decane-8-acrylate and 3,4-epoxy acrylate 32 parts by mass of a mixture of tricyclo [5.2.1.0 2.6 ]decane-9-ester (containing a molar ratio of 50:50), dissolved in 140 parts by mass of propylene glycol monomethyl ether acetate to prepare a solution, This solution was dropped into a flask kept at 70 ° C for 4 hours using a dropping funnel.

另一方面,將聚合起始劑2,2’-偶氮雙(2,4-二甲基戊腈)15質量份溶解於丙二醇單甲基醚乙酸酯225質量份中的溶液,使用另外的滴下漏斗花費4小時滴入於燒瓶內。聚合起始劑的溶液的滴入結束後,在70℃保持4小時,之後冷卻至室溫,獲得固形分26.7質量%的樹脂B1溶液。樹脂B1的重量平均分子量是6.8×103,分子量分佈是2.23,固形分換算的酸價是114mg-KOH/g。樹脂B1具有以下的結構單元。 On the other hand, 15 parts by mass of a polymerization initiator 2,2'-azobis(2,4-dimethylvaleronitrile) was dissolved in a solution of 225 parts by mass of propylene glycol monomethyl ether acetate, and another The dropping funnel took 4 hours to drip into the flask. After completion of the dropwise addition of the solution of the polymerization initiator, the mixture was kept at 70 ° C for 4 hours, and then cooled to room temperature to obtain a resin B1 solution having a solid content of 26.7% by mass. The weight average molecular weight of the resin B1 was 6.8 × 10 3 , the molecular weight distribution was 2.23, and the acid value in terms of solid content was 114 mg-KOH/g. The resin B1 has the following structural unit.

合成例2 Synthesis Example 2

在配備有回流冷凝器、滴下漏斗及攪拌機的燒瓶內,流通適量的氮氣以取代為氮氣環境,裝入丙二醇單甲基醚 乙酸酯371份,邊攪拌邊加熱至85℃。其次,將丙烯酸54份、丙烯酸3,4-環氧基三環[5.2.1.02.6]癸烷-8-酯及丙烯酸3,4-環氧基三環[5.2.1.02.6]癸烷-9-酯的混合物(含有比以莫耳比為50:50)225份、乙烯基甲苯(異構物混合物)81份,溶解於丙二醇單甲基醚乙酸酯80份而調製的混合溶液,花費4小時滴入於燒瓶內。 In a flask equipped with a reflux condenser, a dropping funnel and a stirrer, an appropriate amount of nitrogen gas was passed in place of a nitrogen atmosphere, and 371 parts of propylene glycol monomethyl ether acetate was placed, and the mixture was heated to 85 ° C while stirring. Next, 54 parts of acrylic acid, 3,4-epoxytricyclo[5.2.1.0 2.6 ]decane-8-acrylate and 3,4-epoxytricyclo[5.2.1.0 2.6 ]decane-9 a mixed solution prepared by dissolving 225 parts of a mixture of esters (containing 50:50 by molar ratio), 81 parts of vinyl toluene (mixture of isomers), and 80 parts of propylene glycol monomethyl ether acetate. It was dropped into the flask over 4 hours.

另一方面,將聚合起始劑2,2-偶氮雙(2,4-二甲基戊腈)30份溶解於丙二醇單甲基醚乙酸酯160份中的溶液,花費5小時滴入。起始劑溶液滴入結束後,在85℃保持4時間後,冷卻至室溫,獲得共聚物溶液。將此共聚物做為樹脂B2。樹脂B2溶液的固形分是37.5%,B型黏度計(23℃)測定的黏度是246mPa.s。樹脂B2的重量平均分子量是1.06×104,分子量分佈是2.01,固形分換算的酸價是115mg-KOH/g。樹脂B2具有以下的結構單元。 On the other hand, 30 parts of the polymerization initiator 2,2-azobis(2,4-dimethylvaleronitrile) was dissolved in 160 parts of propylene glycol monomethyl ether acetate, and it took 5 hours to drip in. . After the completion of the dropwise addition of the initiator solution, the mixture was kept at 85 ° C for 4 hours, and then cooled to room temperature to obtain a copolymer solution. This copolymer was used as the resin B2. The solid content of the resin B2 solution was 37.5%, and the viscosity measured by the B-type viscometer (23 ° C) was 246 mPa. s. The weight average molecular weight of the resin B2 was 1.06 × 10 4 , the molecular weight distribution was 2.01, and the acid value in terms of solid content was 115 mg-KOH/g. The resin B2 has the following structural unit.

合成例3 Synthesis Example 3

在配備有攪拌機、溫度計、回流冷凝器、滴下漏斗及氣體導入管的燒瓶內,導入丙二醇單甲基醚乙酸酯200份。之後,經由氣體導入管將氮氣導入於燒瓶內,將燒瓶內環境取代為氮氣。將燒瓶內的溶液升溫至70℃後,將甲基丙烯酸苄酯144份、甲基丙烯酸三環[5.2.1.02.6]癸酯30 份、甲基丙烯酸35份,偶氮雙異丁腈5.2份及丙二醇單甲基醚乙酸酯213份所成的混合物,使用滴下漏斗花費2小時滴入於燒瓶內,滴入結束後再在100℃攪拌5小時。聚合起始劑的溶液的滴入結束後,在70℃保持4小時,之後冷卻至室溫,獲得固形分33.6%的樹脂B3溶液。樹脂B3的重量平均分子量是1.03×104,分子量分佈是2.16,固形分換算的酸價是110.4mg-KOH/g。樹脂B3具有以下的結構單元。 In a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a gas introduction tube, 200 parts of propylene glycol monomethyl ether acetate was introduced. Thereafter, nitrogen gas was introduced into the flask through a gas introduction tube, and the atmosphere inside the flask was replaced with nitrogen. After the solution in the flask was heated to 70 ° C, 144 parts of benzyl methacrylate, 30 parts of tricyclo [5.2.1.0 2.6 ] decyl methacrylate, 35 parts of methacrylic acid, and 5.2 parts of azobisisobutyronitrile were added. A mixture of 213 parts of propylene glycol monomethyl ether acetate was added dropwise to the flask over a period of 2 hours using a dropping funnel, and the mixture was stirred at 100 ° C for 5 hours after the completion of the dropwise addition. After completion of the dropwise addition of the solution of the polymerization initiator, it was kept at 70 ° C for 4 hours, and then cooled to room temperature to obtain a 33.6% solution of the resin B3 in a solid form. The weight average molecular weight of the resin B3 was 1.03 × 10 4 , the molecular weight distribution was 2.16, and the acid value in terms of solid content was 110.4 mg-KOH/g. The resin B3 has the following structural unit.

合成例4 Synthesis Example 4

在配備有攪拌機、溫度計、回流冷凝器、滴下漏斗及氣體導入管的燒瓶內,導入丙二醇單甲基醚乙酸酯200份。之後,經由氣體導入管將氮氣導入於燒瓶內,將燒瓶內環境取代為氮氣。將燒瓶內的溶液升溫至70℃後,將甲基丙烯酸苄酯144份、甲基丙烯酸三環[5.2.1.02.6]癸酯30份、丙烯酸42份、偶氮雙異丁腈5.2份及丙二醇單甲基醚乙酸酯213份所成的混合物,使用滴下漏斗花費2小時滴入於燒瓶內,滴入結束後再在100℃攪拌5小時。聚合起始劑的溶液的滴入結束後,在70℃保持4小時,之後冷卻至室溫,獲得固形分34.1%的樹脂B4溶液。樹脂B4的重量平均分子量是1.13×104,分子量分佈是2.18,固形分換算的酸價是108.5mg-KOH/g。樹脂B4具有以下的結構單元。 In a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a gas introduction tube, 200 parts of propylene glycol monomethyl ether acetate was introduced. Thereafter, nitrogen gas was introduced into the flask through a gas introduction tube, and the atmosphere inside the flask was replaced with nitrogen. After the solution in the flask was heated to 70 ° C, 144 parts of benzyl methacrylate, 30 parts of tricyclo [5.2.1.0 2.6 ] decyl methacrylate, 42 parts of acrylic acid, 5.2 parts of azobisisobutyronitrile and propylene glycol were added. A mixture of 213 parts of monomethyl ether acetate was dropped into the flask over 2 hours using a dropping funnel, and after the completion of the dropwise addition, the mixture was stirred at 100 ° C for 5 hours. After completion of the dropwise addition of the solution of the polymerization initiator, it was kept at 70 ° C for 4 hours, and then cooled to room temperature to obtain a 34.1% solution of the resin B4 in a solid form. The weight average molecular weight of the resin B4 was 1.13 × 10 4 , the molecular weight distribution was 2.18, and the acid value in terms of solid content was 108.5 mg-KOH/g. The resin B4 has the following structural unit.

樹脂的聚苯乙烯換算的重量平均分子量(Mw)及數量平均分子量(Mn)的測定是以GPC法依以下的條件進行。 The measurement of the polystyrene-equivalent weight average molecular weight (Mw) and the number average molecular weight (Mn) of the resin was carried out under the following conditions by the GPC method.

裝置:HLC-8120GPC(東曹(股)製) Device: HLC-8120GPC (Tosoh Co., Ltd.)

管柱:TSK-GELG2000HXL Column: TSK-GELG2000HXL

管柱溫度:40℃ Column temperature: 40 ° C

溶媒:THF Solvent: THF

流速:1.0ml/min Flow rate: 1.0ml/min

受檢液固形分濃度:0.001至0.01質量% Solid concentration of test liquid: 0.001 to 0.01% by mass

注入量:50μL Injection volume: 50μL

檢測器:RI Detector: RI

校正用標準物質:TSK STANDARD POLYSTYRENE F-40,F-4,F-288,A-2500,A-500(東曹(股)製) Standard materials for calibration: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (made by Tosoh Corporation)

將上述所得的聚苯乙烯換算的重量平均分子量及數量平均分子量的比(Mw/Mn)做為分子量分佈。 The ratio (Mw/Mn) of the weight average molecular weight and the number average molecular weight in terms of polystyrene obtained above was defined as a molecular weight distribution.

[顏料分散液A1的調製] [Modulation of Pigment Dispersion A1]

丙二醇單甲基醚乙酸酯 78.3份 Propylene glycol monomethyl ether acetate 78.3 parts

將上述者混合,使用珠磨機將顏料充分分散,而得顏料分散液A1。 The above was mixed, and the pigment was sufficiently dispersed using a bead mill to obtain a pigment dispersion A1.

[顏料分散液A2的調製] [Modulation of Pigment Dispersion A2]

將上述者混合,使用珠磨機將顏料充分分散,而得顏料分散液A2。 The above was mixed, and the pigment was sufficiently dispersed using a bead mill to obtain a pigment dispersion A2.

[顏料分散液A3的調製] [Modulation of Pigment Dispersion A3]

將上述者混合,使用珠磨機將顏料充分分散,而得顏料分散液A3。 The above was mixed, and the pigment was sufficiently dispersed using a bead mill to obtain a pigment dispersion A3.

[顏料分散液A4的調製] [Modulation of Pigment Dispersion A4]

將上述者混合,使用珠磨機將顏料充分分散,而得顏料分散液A4。 The above was mixed, and the pigment was sufficiently dispersed using a bead mill to obtain a pigment dispersion A4.

(顏料分散液A5的調製) (Modulation of Pigment Dispersion A5)

將上述者混合,使用珠磨機將顏料充分分散,而得顏料分散液A5。 The above was mixed, and the pigment was sufficiently dispersed using a bead mill to obtain a pigment dispersion A5.

實施例1至8及比較例1 Examples 1 to 8 and Comparative Example 1

[著色光敏性樹脂組成物的調製] [Preparation of coloring photosensitive resin composition]

將第1表記載的成分混合而得到著色感光性樹脂組成物。 The components described in the first table were mixed to obtain a colored photosensitive resin composition.

在第1表中,「樹脂(B)」欄表示固形分換算的含量(份)。 In the first table, the column of "resin (B)" indicates the content (parts) of the solid content conversion.

著色劑(A)是預先製作顏料分散液A1至A5,而用於混合。第1表中的「著色劑(A)」欄表示所用顏料分散液中所含的著色劑的含量(份)。 The coloring agent (A) is prepared by mixing the pigment dispersions A1 to A5 in advance. The "colorant (A)" column in the first table indicates the content (parts) of the coloring agent contained in the pigment dispersion liquid used.

「丙烯酸系分散劑」欄表示所用顏料分散液所含的丙烯酸系分散劑的合計量(份)。 The column of "acrylic dispersant" shows the total amount (parts) of the acrylic dispersing agent contained in the pigment dispersion liquid used.

「溶劑(E)」欄表示著色光敏性樹脂組成物所含的各溶劑的合計量(份)。 The column of "solvent (E)" indicates the total amount (parts) of each solvent contained in the coloring photosensitive resin composition.

在第1表中,各成分如下。 In the first table, the respective components are as follows.

著色劑(A):A1:C.I.顏料綠58(額料分散液A1) Colorant (A): A1: C.I. Pigment Green 58 (Forehead Dispersion A1)

著色劑(A):A2:C.I.顏料黃138(顏料分散液A2) Colorant (A): A2: C.I. Pigment Yellow 138 (Pigment Dispersion A2)

著色劑(A):A3:C.I.顏料黃150(顏料分散液A3) Colorant (A): A3: C.I. Pigment Yellow 150 (Pigment Dispersion A3)

著色劑(A):A4:C.I.顏料紅177(顏料分散液A4) Colorant (A): A4: C.I. Pigment Red 177 (Pigment Dispersion A4)

著色劑(A):A5:C.I.顏料藍15:6(顏料分散液A5) Colorant (A): A5: C.I. Pigment Blue 15:6 (Pigment Dispersion A5)

樹脂(B):B1:樹脂B1 Resin (B): B1: Resin B1

樹脂(B):B2:樹脂B2 Resin (B): B2: Resin B2

樹脂(B):B3:樹脂B3 Resin (B): B3: Resin B3

樹脂(B):B4:樹脂84 Resin (B): B4: Resin 84

樹脂(B):B5:將甲基丙烯酸21份與甲基丙烯酸苄酯70份共聚合,再將甲基丙烯酸環氧丙基酯9份在三乙醇胺觸媒的存在下加成的樹脂(重量平均分子量:1.2×104,固形分換算的酸價:80mg-KOH/g) Resin (B): B5: a resin obtained by copolymerizing 21 parts of methacrylic acid with 70 parts of benzyl methacrylate, and then adding 9 parts of glycidyl methacrylate to the presence of a triethanolamine catalyst (weight) Average molecular weight: 1.2 × 10 4 , acid value converted by solid content: 80 mg-KOH / g)

聚合性化合物(C):C1:六丙烯酸二新戊四醇酯 (KAYARAD(註冊商標);DPHA:日本化藥(股)製) Polymerizable compound (C): C1: dineopentaerythritol hexaacrylate (KAYARAD (registered trademark); DPHA: Nippon Chemical Co., Ltd.)

聚合性化合物(C):C2:五丙烯酸二新戊四醇酯 Polymerizable compound (C): C2: dipentaerythritol pentaacrylate

聚合起始劑(D):D1:N-苄醯基氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺(Irgacure(註冊商標)OXE01;BASF公司製;O-醯基肟化合物) Polymerization initiator (D): D1: N-benzylidenyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine (Irgacure (registered trademark) OXE01; BASF Company system; O-mercaptopurine compound)

聚合起始劑(D):D2:2-甲基-2-(N-嗎啉基)-1-(4-甲基硫基苯基)丙烷-1-酮(Irgacure(註冊商標)907;BASF公司製;苯烷酮化合物) Polymerization initiator (D): D2: 2-methyl-2-(N-morpholinyl)-1-(4-methylthiophenyl)propan-1-one (Irgacure (registered trademark) 907; BASF company; phenyl ketene compound)

聚合起始劑(D):D3:下述式表示的化合物的混合物(CHEMCURE-TCDM;Chembridge公司製;聯咪唑化合物) Polymerization initiator (D): D3: a mixture of compounds represented by the following formula (CHEMCURE-TCDM; manufactured by Chembridge; biimidazole compound)

聚合起始助劑(D1):4,4’-雙(二乙基胺基)二苯酮(EAB-F;保土谷化學工業(股)製) Polymerization initiation aid (D1): 4,4'-bis(diethylamino)benzophenone (EAB-F; manufactured by Hodogaya Chemical Industry Co., Ltd.)

硫醇化合物(T):D1a:2-硫基苯并噻唑(SOXINOL(註冊商標)M:住友化學(股)製:下述式表示的化合物) Thiol compound (T): D1a: 2-thiobenzothiazole (SOXINOL (registered trademark) M: Sumitomo Chemical Co., Ltd.: a compound represented by the following formula)

密著促進劑(G):D1b:3-甲基丙烯醯氧基丙基三甲氧基矽烷(KBM-503:信越化學工業(股)製) Adhesion promoter (G): D1b: 3-methacryloxypropyltrimethoxydecane (KBM-503: Shin-Etsu Chemical Co., Ltd.)

溶劑(E):E1:丙二醇單甲基醚乙酸酯 Solvent (E): E1: propylene glycol monomethyl ether acetate

溶劑(E):E2:乳酸乙酯 Solvent (E): E2: ethyl lactate

溶劑(E):E3:乙二醇單丁基醚 Solvent (E): E3: ethylene glycol monobutyl ether

界面活性劑(F):聚醚改質矽油(東麗.道康寧(股)製;SH8400) Surfactant (F): Polyether modified oyster sauce (Dongli. Dow Corning (stock) system; SH8400)

[圖案化塗膜的製作] [Production of patterned coating film]

在2英吋見方的玻璃基板(Eagle XG;康寧公司製)上,將著色光敏性樹脂組成物以旋轉塗佈法塗佈後,在100℃預焙烤3分鐘而形成著色組成物層。放冷後,將此形成有著色組成物層的基板與石英玻璃製光罩的間隔設定為100μm,使用曝光機(TME-150RSK;Topcon(股)製),在大氣環境下,以30mJ/cm2的曝光量(365nm基準)照射光。就光罩而言,使用形成有50μm之線及間隔(line-and-space)圖案的光罩。照射光後,將上述塗膜,於含非離子系界面活性劑0.12%及碳酸鈉2%的水系顯影液中,在24℃浸漬60秒鐘而顯影,以水清洗後,在烤箱中,在230℃後焙烤30分鐘,獲得著色圖案化塗膜。 The colored photosensitive resin composition was applied by a spin coating method on a glass substrate (Eagle XG; manufactured by Corning Incorporated) of 2 inches square, and then prebaked at 100 ° C for 3 minutes to form a colored composition layer. After cooling, the interval between the substrate on which the colored composition layer was formed and the mask made of quartz glass was set to 100 μm, and an exposure machine (TME-150RSK; manufactured by Topcon Co., Ltd.) was used, and in an atmosphere, 30 mJ/cm. The exposure amount of 2 (365 nm reference) irradiated light. As for the photomask, a photomask formed with a line and a line-and-space pattern of 50 μm was used. After the light was irradiated, the coating film was immersed in an aqueous developing solution containing 0.12% of a nonionic surfactant and 2% of sodium carbonate at 24 ° C for development, and after washing with water, in an oven, After baking at 230 ° C for 30 minutes, a colored patterned coating film was obtained.

[顯影性評估] [developability evaluation]

將形成有著色圖案化塗膜的玻璃基板以光學顯微鏡觀察,在未曝光部分沒看到有殘渣或殘留膜時做為○,看到時為×。結果示於第2表。 The glass substrate on which the colored patterned coating film was formed was observed by an optical microscope, and when no residue or residual film was observed in the unexposed portion, it was ○, and when it was seen, it was ×. The results are shown in Table 2.

[密著性評估] [Adhesion evaluation]

將著色圖案化塗膜以光學顯微鏡觀察,沒有看到有剝離時做為○,在著色圖案化塗膜的一部分看到有剝離時則做為△,著色圖案化塗膜全部剝離時做為×。結果示於第2表。 The colored patterned coating film was observed by an optical microscope, and when it was not observed that peeling was observed as ○, when a part of the colored patterned coating film was peeled off, it was regarded as Δ, and when the colored patterned coating film was completely peeled off, it was ×. . The results are shown in Table 2.

[膜厚測定] [Measurement of film thickness]

針對所得的著色圖案化塗膜,使用膜厚測定裝置(DEKTAK3;日本真空技術(股)製)測定膜厚。結果示於第2表。 With respect to the obtained colored patterned coating film, the film thickness was measured using a film thickness measuring device (DEKTAK3; manufactured by Nippon Vacuum Technology Co., Ltd.). The results are shown in Table 2.

[色度評估] [Colorimetric evaluation]

針對所得的著色圖案化塗膜,使用測色機(OSP-SP-200;Olympus(股)製)測定分光,使用C光源的特性函數測定CIE的XYZ表色系的xy色度座標(x,y)及三刺激值Y。Y值越大表示明度越高。結果示於第2表。 With respect to the obtained colored patterned coating film, the color separation was measured using a color measuring machine (OSP-SP-200; manufactured by Olympus Co., Ltd.), and the xy chromaticity coordinate of the XYZ color system of the CIE was measured using the characteristic function of the C light source (x, y) and tristimulus value Y. A larger Y value indicates a higher brightness. The results are shown in Table 2.

若依本發明的著色光敏性樹脂組成物,則著色圖案化塗膜形成時有優異的顯影性 According to the colored photosensitive resin composition of the present invention, the coloring patterned coating film has excellent developability when formed.

Claims (5)

一種著色光敏性樹脂組成物,係含有著色劑、樹脂、聚合性化合物、聚合起始劑及溶劑,著色劑含有C.I.顏料綠58,由黃色顏料、藍色顏料、紅色顏料、紫色顏料及橙色顏料所成之群所選擇的至少1種,著色劑的含有率相對於固形分的總量為20質量%以上50質量%以下。 A colored photosensitive resin composition containing a colorant, a resin, a polymerizable compound, a polymerization initiator, and a solvent, and the colorant contains CI Pigment Green 58, which is composed of a yellow pigment, a blue pigment, a red pigment, a purple pigment, and an orange pigment. At least one selected from the group formed, the content of the colorant is 20% by mass or more and 50% by mass or less based on the total amount of the solid content. 如申請專利範圍第1項所述的著色光敏性樹脂組成物,其中,樹脂是具有源自由不飽和羧酸及不飽和羧酸酐所成之群所選的至少1種的結構單元的加成聚合物。 The colored photosensitive resin composition according to claim 1, wherein the resin is an addition polymerization of at least one structural unit selected from the group consisting of a source of a free unsaturated carboxylic acid and an unsaturated carboxylic anhydride. Things. 如申請專利範圍第1項或第2項所述的著色光敏性樹脂組成物,其中,樹脂的含量與聚合性化合物的含量的比,以質量基準,為20:80至80:20。 The colored photosensitive resin composition according to the first or second aspect of the invention, wherein the ratio of the content of the resin to the content of the polymerizable compound is from 20:80 to 80:20 on a mass basis. 一種彩色濾光片,係由申請專利範圍第1項至第3項中任一項所述的著色光敏性樹脂組成物所形成。 A color filter formed of the colored photosensitive resin composition according to any one of claims 1 to 3. 一種顯示裝置,係含有申請專利範圍第4項所述的彩色濾光片。 A display device comprising the color filter of claim 4 of the patent application.
TW102111109A 2012-03-30 2013-03-28 Colored photosensitive resin composition TWI617885B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012-079318 2012-03-30
JP2012079318A JP6078970B2 (en) 2012-03-30 2012-03-30 Colored photosensitive resin composition

Publications (2)

Publication Number Publication Date
TW201344361A true TW201344361A (en) 2013-11-01
TWI617885B TWI617885B (en) 2018-03-11

Family

ID=49366738

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102111109A TWI617885B (en) 2012-03-30 2013-03-28 Colored photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP6078970B2 (en)
KR (1) KR102021617B1 (en)
CN (1) CN103365080B (en)
TW (1) TWI617885B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI734680B (en) * 2015-01-30 2021-08-01 日商住友化學股份有限公司 Colored photosensitive resin composition
US11401468B2 (en) 2016-11-22 2022-08-02 Samsung Electronics Co., Ltd. Photosensitive resin composition, complex, laminated structure and display device, and electronic device including the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105842985B (en) * 2015-01-30 2021-01-26 住友化学株式会社 Colored photosensitive resin composition
TWI737597B (en) * 2015-03-30 2021-09-01 日商住友化學股份有限公司 Colored photosensitive resin composition, coating film, color filter, and display device
KR101981373B1 (en) * 2015-09-24 2019-05-22 동우 화인켐 주식회사 A green photosensitive resin composition, color filter and display device comprising the same
JP6704337B2 (en) * 2015-12-28 2020-06-03 住友化学株式会社 Colored photosensitive resin composition, color filter and display device including the same
TWI721087B (en) * 2016-01-27 2021-03-11 日商住友化學股份有限公司 Colored curable resin composition, color filter and display device including same
CN109212899A (en) * 2017-06-30 2019-01-15 住友化学株式会社 Colored curable resin composition, colour filter and display device
KR101869205B1 (en) * 2017-10-13 2018-07-19 동우 화인켐 주식회사 Photosensitive resin composition, and pattern formed therefrom, color filter comprising thereof and liquid crystal display device comprigin the color filter
JPWO2019159950A1 (en) * 2018-02-16 2021-02-04 富士フイルム株式会社 Photosensitive composition

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4573256B2 (en) * 2003-06-13 2010-11-04 ダイセル・サイテック株式会社 Multifunctional (meth) acrylic acid ester, method for producing the same, active energy ray-curable (meth) acrylic acid ester resin composition, and cured product thereof
TWI396042B (en) * 2004-09-29 2013-05-11 Sumitomo Chemical Co Colored photosensitive resin composition
JP4946748B2 (en) * 2007-09-14 2012-06-06 Jsr株式会社 Radiation-sensitive resin composition for forming colored layer and color filter
JP5187159B2 (en) * 2008-11-26 2013-04-24 凸版印刷株式会社 Color filter
JP5593637B2 (en) * 2009-06-05 2014-09-24 凸版印刷株式会社 Color filter
KR20110045528A (en) * 2009-10-27 2011-05-04 동우 화인켐 주식회사 A colored photo sensitive resin composition, color filter and liquid crystal display device having the same
JP5683095B2 (en) * 2009-12-01 2015-03-11 株式会社Dnpファインケミカル Green composition for color filter and photosensitive green composition
WO2011108496A1 (en) * 2010-03-03 2011-09-09 大日本印刷株式会社 Pigment dispersion, negative resist composition for color filter, color filter, liquid crystal display device, and organic light-emitting display device
JP5604968B2 (en) * 2010-05-14 2014-10-15 東レ株式会社 Green colorant composition for color filter, color filter substrate and liquid crystal display device
JP5853673B2 (en) * 2010-12-27 2016-02-09 東レ株式会社 Color filter substrate and liquid crystal display device
JP2012247539A (en) * 2011-05-26 2012-12-13 Toppan Printing Co Ltd Green photosensitive resin composition and color filter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI734680B (en) * 2015-01-30 2021-08-01 日商住友化學股份有限公司 Colored photosensitive resin composition
US11401468B2 (en) 2016-11-22 2022-08-02 Samsung Electronics Co., Ltd. Photosensitive resin composition, complex, laminated structure and display device, and electronic device including the same

Also Published As

Publication number Publication date
KR102021617B1 (en) 2019-09-16
TWI617885B (en) 2018-03-11
JP6078970B2 (en) 2017-02-15
CN103365080B (en) 2019-04-26
JP2013210444A (en) 2013-10-10
CN103365080A (en) 2013-10-23
KR20130111372A (en) 2013-10-10

Similar Documents

Publication Publication Date Title
JP6713517B2 (en) Red colored curable resin composition
TWI617885B (en) Colored photosensitive resin composition
TWI774657B (en) Colored curable resin composition, color filter and display device containing the same
TWI565759B (en) Colored curable resin composition
TW201331711A (en) Colored curable resin composition
TW201403230A (en) Colored photosensitive resin composition
JP6019596B2 (en) Colored photosensitive resin composition
JP6019597B2 (en) Colored photosensitive resin composition
TW201701061A (en) Colored photosensitive resin composition capable of manufacturing a color filter useful as a thin film and having clear pattern shape and higher brightness
JP5825961B2 (en) Colored photosensitive composition
TW201635024A (en) Photosensitive coloring resin composition
TWI748947B (en) Coloring curable resin composition
TWI705302B (en) Colored photosensitive resin composition
TW201631050A (en) Colored photosensitive resin composition
TWI570507B (en) Colored photosensitive resin composition
TWI541600B (en) Hardened resin composition
JP6115005B2 (en) Colored photosensitive resin composition
JP2013122583A (en) Colored curable resin composition
JP6047885B2 (en) Colored photosensitive resin composition
JP6414826B2 (en) Colored photosensitive resin composition
TWI754008B (en) Red colored composition
JP2012173550A (en) Color filter
TWI738809B (en) Colored curable resin composition, color filter and display device
JP2019147947A (en) Compound and coloring resin composition