JP5825961B2 - Colored photosensitive composition - Google Patents

Description

  The present invention relates to a colored photosensitive composition suitable for forming a colored image constituting a color filter used in a liquid crystal display device or a solid-state imaging device.

 A color filter used in a display device such as a liquid crystal display panel, an electroluminescence panel, or a plasma display panel is manufactured using a colored photosensitive composition. Such a colored photosensitive composition includes a colorant, a resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent. I. Pigment green 36 and C.I. I. A composition that is CI Pigment Yellow 150 is known (Patent Document 1).

Japanese Patent Laying-Open No. 2005-157311

  The green color filter formed using the colored photosensitive composition is not always satisfactory in terms of color separation ability with respect to the red filter.

The present invention provides the following [1] to [8].
[1] A colored photosensitive composition comprising a colorant, a polymerizable compound, a polymerization initiator, and a solvent, wherein the colorant is a colorant comprising a halogenated copper phthalocyanine pigment, a halogenated zinc phthalocyanine pigment, and a quinophthalone pigment. .
[2] The colored photosensitive composition according to [1], wherein the content of the halogenated copper phthalocyanine pigment is 20 parts by mass or more and 150 parts by mass or less with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.
[3] The colored photosensitive composition according to [1], wherein the content of the quinophthalone pigment is 50 parts by mass or more and 200 parts by mass or less with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.
[4] The content of the halogenated copper phthalocyanine pigment is 20 parts by mass or more and 150 parts by mass or less with respect to the content of the halogenated zinc phthalocyanine pigment of 100 parts by mass, and the content of the quinophthalone pigment is zinc halide. The colored photosensitive composition according to [1], wherein the content is 50 parts by mass or more and 200 parts by mass or less with respect to 100 parts by mass of the content of the phthalocyanine pigment.
[5] A copper halide phthalocyanine pigment is C.I. I. The colored photosensitive composition according to any one of [1] to [4], which is CI Pigment Green 7.
[6] The quinophthalone pigment is C.I. I. The colored photosensitive composition according to any one of [1] to [5], which is CI Pigment Yellow 138.
[7] The colored photosensitive composition according to any one of [1] to [6], comprising a colorant, a polymerizable compound, a polymerization initiator, a solvent, and a resin.
[8] A color filter formed of the colored photosensitive composition according to any one of [1] to [7].

  According to the colored photosensitive composition of the present invention, it is possible to obtain a green color filter excellent in color separation ability from the red filter.

The colored photosensitive composition of the present invention comprises a colorant (A), a polymerizable compound (C), a polymerization initiator (D) and a solvent (E), and the colorant comprises a halogenated copper phthalocyanine pigment, A colored photosensitive composition comprising a zinc phthalocyanine pigment and a quinophthalone pigment. The colored photosensitive composition of the present invention preferably contains a resin (B).
In addition, in this specification, the compound illustrated as each component can be used individually or in combination unless there is particular notice.

The colorant (A) used in the colored photosensitive composition of the present invention contains a halogenated copper phthalocyanine pigment, a halogenated zinc phthalocyanine pigment, and a quinophthalone pigment.
As the halogenated copper phthalocyanine pigment, a chlorinated copper phthalocyanine pigment is preferable. I. Pigment Green 7 is more preferable. When the halogenated copper phthalocyanine pigment is the above-mentioned pigment, the transmittance near 600 nm can be lowered, and the color separation ability with the red filter is excellent.
Examples of the halogenated zinc phthalocyanine pigment include C.I. I. Pigment Green 58 is preferable.

  The content of the halogenated copper phthalocyanine pigment is preferably 20 parts by mass or more and 150 parts by mass or less, and preferably 80 parts by mass or more and 120 parts by mass or less with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment. Is more preferable. When the content of the halogenated copper phthalocyanine pigment is in the above range, the transmittance near 600 nm can be lowered while keeping the transmittance at 520 nm high, and thus the color separation with the red filter is excellent, and A high brightness green filter can be obtained. When such a green filter is used as a color filter provided in a green pixel of a display device such as a liquid crystal display device, the color reproducibility of the display device can be improved.

  The colorant (A) further contains a quinophthalone pigment. The content of the quinophthalone pigment is preferably 50 parts by mass or more and 200 parts by mass or less, and more preferably 120 parts by mass or more and 200 parts by mass or less with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment. . Examples of the quinophthalone pigment include C.I. I. Pigment Yellow 138 is preferable. By including the quinophthalone pigment as described above, there is a tendency that the color separation ability with the blue filter is excellent.

  The pigment is optionally treated with rosin, surface treatment using a pigment derivative or pigment dispersant introduced with an acidic group or basic group, graft treatment on the pigment surface with a polymer compound, etc., sulfuric acid atomization Atomization treatment by a method or the like, cleaning treatment with an organic solvent or water for removing impurities, removal treatment by ion exchange method of ionic impurities, or the like may be performed. The pigment preferably has a uniform particle size. By carrying out a dispersion treatment by containing a pigment dispersant, a pigment dispersion in which the pigment is uniformly dispersed in the solution can be obtained.

A commercially available surfactant can be used as the pigment dispersant. Examples of the surfactant include silicone-based, fluorine-based, ester-based, cationic-based, anionic-based, nonionic-based, amphoteric, polyester-based, polyamine-based, acrylic-based, and urethane-based surfactants. Examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid-modified polyesters, tertiary amine-modified polyurethanes, and polyethyleneimines. , KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Floren (manufactured by Kyoeisha Chemical Co., Ltd.), Solsperse (manufactured by Geneca Co., Ltd.), EFKA (manufactured by CIBA), Ajisper (manufactured by Ajinomoto Fine Techno Co., Ltd.) ), Disperbyk (manufactured by Big Chemie) and the like. These can be used alone or in combination of two or more.
When a pigment dispersant is used, the amount used is preferably 100% by mass or less, more preferably 5 to 50% by mass, based on the total mass of the pigment. When the amount of the pigment dispersant used is in the above range, a pigment dispersion in a uniform dispersion state tends to be obtained.

  Content of a coloring agent (A) becomes like this. Preferably it is 5-60 mass% with respect to solid content of a coloring photosensitive composition, More preferably, it is 5-45 mass%. When it is within the above range, a desired spectrum and color density can be obtained. Here, solid content means the sum total of the quantity remove | excluding the solvent from the coloring photosensitive composition.

The colored photosensitive composition of the present invention preferably contains a resin (B).
The resin (B) used in the colored photosensitive composition of the present invention is preferably a resin exhibiting alkali solubility. Here, alkali solubility refers to the property of being dissolved in a developer which is an aqueous solution of an alkali compound.

As the resin showing alkali solubility,
Resin (B-1): at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides (a) (hereinafter sometimes referred to as “(a)”) and cyclic having 2 to 4 carbon atoms A copolymer obtained by polymerizing a compound (b) having ether (hereinafter sometimes referred to as “(b)”);
Resin (B-2): Monomer (c) copolymerizable with (a) and (b) (however, no cyclic ether having 2 to 4 carbon atoms is included) (hereinafter referred to as “(c)”) A copolymer obtained by polymerizing (a) and (b),
Resin (B-3): a copolymer obtained by polymerizing (a) and (c),
Resin (B-4): A resin obtained by reacting (b) with a copolymer obtained by polymerizing (a) and (c) Resin (B-5): (b) and (c) Examples thereof include a resin obtained by reacting (a) with a copolymer obtained by polymerization.

Specific examples of (a) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-vinylbenzoic acid, m-vinylbenzoic acid, and p-vinylbenzoic acid;
Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyl Unsaturated dicarboxylic acids such as tetrahydrophthalic acid and 1,4-cyclohexene dicarboxylic acid;
Methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene, 5-carboxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-methylbicyclo Bicyclounsaturated compounds containing a carboxy group such as [2.2.1] hept-2-ene, 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene;
Maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6- Unsaturated dicarboxylic acid anhydrides such as tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene anhydride (hymic acid anhydride);

Unsaturated mono [(meth) acryloyloxyalkyl] esters of polyvalent carboxylic acids such as succinic acid mono [2- (meth) acryloyloxyethyl] and phthalic acid mono [2- (meth) acryloyloxyethyl] Kind;
Examples thereof include unsaturated acrylates containing a hydroxy group and a carboxy group in the same molecule, such as α- (hydroxymethyl) acrylic acid.
Of these, acrylic acid, methacrylic acid, maleic anhydride and the like are preferably used from the viewpoint of copolymerization reactivity and alkali solubility.
Here, in this specification, “(meth) acrylic acid” represents at least one selected from the group consisting of acrylic acid and methacrylic acid. Notations such as “(meth) acryloyl” and “(meth) acrylate” have the same meaning.

  (B) is a polymerizable compound having a cyclic ether having 2 to 4 carbon atoms (for example, at least one selected from the group consisting of an oxirane ring, an oxetane ring and a tetrahydrofuran ring (oxolane ring)). (B) is preferably a monomer having a cyclic ether having 2 to 4 carbon atoms and an ethylenically unsaturated bond, and is a single monomer having a cyclic ether having 2 to 4 carbon atoms and a (meth) acryloyloxy group. A monomer is more preferable.

  Examples of (b) include a monomer (b1) having an oxiranyl group (hereinafter sometimes referred to as “(b1)”), a monomer (b2) having an oxetanyl group (hereinafter referred to as “(b2)”) And a monomer (b3) having a tetrahydrofuryl group (hereinafter sometimes referred to as “(b3)”).

The monomer (b1) having an oxiranyl group refers to a polymerizable compound having an oxiranyl group. Examples of (b1) include a monomer (b1-1) (hereinafter sometimes referred to as “(b1-1)”) having a structure obtained by epoxidizing a chain olefin and an ethylenically unsaturated bond, and cyclo And a monomer (b1-2) having an alkene epoxidized structure and an ethylenically unsaturated bond (hereinafter sometimes referred to as “(b1-2)”).
(B1) is preferably a monomer having an oxiranyl group and an ethylenically unsaturated bond, more preferably a monomer having an oxiranyl group and a (meth) acryloyloxy group, and (meth) acryloyloxy. (B1-2) having a group is more preferable.

  Specific examples of (b1-1) include glycidyl (meth) acrylate, β-methylglycidyl (meth) acrylate, β-ethylglycidyl (meth) acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl ether, m-vinyl. Benzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-vinylbenzyl glycidyl ether, 2,3-bis ( Glycidyloxymethyl) styrene, 2,4-bis (glycidyloxymethyl) styrene, 2,5-bis (glycidyloxymethyl) styrene, 2,6-bis (glycidyloxymethyl) styrene, 2,3,4-tris ( Glycidyl oxime Chill) styrene, 2,3,5-tris (glycidyloxymethyl) styrene, 2,3,6-tris (glycidyloxymethyl) styrene, 3,4,5-tris (glycidyloxymethyl) styrene, 2,4, Examples thereof include 6-tris (glycidyloxymethyl) styrene and compounds described in JP-A-7-248625.

  Examples of (b1-2) include vinylcyclohexene monooxide, 1,2-epoxy-4-vinylcyclohexane (for example, Celoxide 2000; manufactured by Daicel Chemical Industries, Ltd.), 3,4-epoxycyclohexylmethyl acrylate (for example, cyclone). Mer A400; manufactured by Daicel Chemical Industries, Ltd.), 3,4-epoxycyclohexylmethyl methacrylate (for example, Cyclomer M100; manufactured by Daicel Chemical Industries, Ltd.), a compound represented by formula (I), formula (II) ) And the like.

[In Formula (I) and Formula (II), R ¹ and R ² each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group is a hydroxy group. May be substituted.
X ¹ and X ² each independently represent a single bond, —R ³ —, * —R ³ —O—, * —R ³ —S—, or * —R ³ —NH—.
R ³ represents an alkanediyl group having 1 to 6 carbon atoms.
* Represents a bond with O. ]

Specific examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert-butyl group.
As the hydroxyalkyl group, a hydroxymethyl group, 1-hydroxyethyl group, 2-hydroxyethyl group, 1-hydroxypropyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 1-hydroxy-1-methylethyl group, Examples include 2-hydroxy-1-methylethyl group, 1-hydroxybutyl group, 2-hydroxybutyl group, 3-hydroxybutyl group, 4-hydroxybutyl group and the like.
R ¹ and R ² are preferably a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group, and a 2-hydroxyethyl group, and more preferably a hydrogen atom and a methyl group.

Examples of the alkanediyl group include methylene group, ethylene group, propane-1,2-diyl group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane- Examples include 1,6-diyl group.
X ¹ and X ² are preferably a single bond, a methylene group, an ethylene group, * —CH ₂ —O— (* represents a bond to O), or * —CH ₂ CH ₂ —O— group. More preferably, a single bond and a * —CH ₂ CH ₂ —O— group are mentioned.

  Examples of the compound represented by the formula (I) include compounds represented by the formula (I-1) to the formula (I-15). Preferably Formula (I-1), Formula (I-3), Formula (I-5), Formula (I-7), Formula (I-9), Formula (I-11) to Formula (I-15) Is mentioned. More preferably, Formula (I-1), Formula (I-7), Formula (I-9), and Formula (I-15) are mentioned.

Examples of the compound represented by the formula (II) include compounds represented by the formula (II-1) to the formula (II-15). Preferably Formula (II-1), Formula (II-3), Formula (II-5), Formula (II-7), Formula (II-9), Formula (II-11) to Formula (II-15) Is mentioned.
More preferably, Formula (II-1), Formula (II-7), Formula (II-9), and Formula (II-15) are mentioned.

  The compound represented by the formula (I) and the compound represented by the formula (II) can be used alone. They can also be mixed in any ratio. In the case of mixing, the mixing ratio is a molar ratio, preferably 5:95 to 95: 5, more preferably 10:90 to 90:10, particularly preferably 20:80 in the formula (I): formula (II). ~ 80: 20.

  The monomer (b2) having an oxetanyl group refers to a polymerizable compound having an oxetanyl group. (B2) is preferably a monomer having an oxetanyl group and an ethylenically unsaturated bond, and more preferably a monomer having an oxetanyl group and a (meth) acryloyloxy group. Examples of (b2) include 3-methyl-3- (meth) acryloyloxymethyl oxetane, 3-ethyl-3- (meth) acryloyloxymethyl oxetane, 3-methyl-3- (meth) acryloyloxyethyl oxetane, And 3-ethyl-3- (meth) acryloyloxyethyl oxetane.

The monomer (b3) having a tetrahydrofuryl group refers to a polymerizable compound having a tetrahydrofuryl group. (B3) is preferably a monomer having a tetrahydrofuryl group and an ethylenically unsaturated double bond, and more preferably a monomer having a tetrahydrofuryl group and a (meth) acryloyloxy group.
Specific examples of (b3) include tetrahydrofurfuryl acrylate (for example, Biscoat V # 150, manufactured by Osaka Organic Chemical Industry Co., Ltd.), tetrahydrofurfuryl methacrylate, and the like.

Examples of (c) include (meth) acrylic acid such as methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, and tert-butyl (meth) acrylate. Alkyl esters;
Cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2.1.0 ^2,6 ] decan-8-yl (meth) acrylate (in this technical field, dicyclopenta It is said to be nyl (meth) acrylate.
), (Meth) acrylic acid cyclic alkyl esters such as dicyclopentanyloxyethyl (meth) acrylate and isobornyl (meth) acrylate;

Aryl (meth) acrylates or aralkyl esters such as phenyl (meth) acrylate and benzyl (meth) acrylate;
Dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate, diethyl itaconate;
Hydroxyalkyl esters such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate;

  Bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1] hept-2-ene, 5- Hydroxybicyclo [2.2.1] hept-2-ene, 5-hydroxymethylbicyclo [2.2.1] hept-2-ene, 5- (2′-hydroxyethyl) bicyclo [2.2.1] Hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dihydroxybicyclo [2.2 .1] Hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di (2′-hydroxyethyl) bicyclo [2.2. 1] hept-2-ene, 5,6-dimethoxybicyclo [2. .1] hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] hept-2-ene, 5-tert-butoxycarbonylbicyclo [2.2.1] hept-2-ene, 5-cyclohexyloxycarbonylbicyclo [2.2.1] hept-2-ene, 5-phenoxycarbonylbicyclo [2.2.1] hept-2-ene, 5,6-bis (tert-butoxycarbonyl) bicyclo [2.2.1] hept-2-ene, 5,6-bis (cyclohexyloxycarbonyl) bicyclo [2.2.1] hept-2-ene Bicyclo unsaturated compounds;

  N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimidobenzoate, N-succinimidyl-4-maleimidobutyrate, N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3 -Dicarbonylimide derivatives such as maleimide propionate, N- (9-acridinyl) maleimide;

Styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyl toluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 1,3-butadiene , Isoprene, and 2,3-dimethyl-1,3-butadiene.
Of these, styrene, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, bicyclo [2.2.1] hept-2-ene and the like are preferable from the viewpoint of copolymerization reactivity and alkali solubility.

In the resin (B-1), the ratio of the structural units derived from the respective monomers is preferably in the following range with respect to the total number of moles of the structural units constituting the resin (B-1).
Structural unit derived from (a); 5 to 60 mol% (more preferably 10 to 50 mol%)
Structural unit derived from (b); 40 to 95 mol% (more preferably 50 to 90 mol%)
When the ratio of the structural unit of the resin (B-1) is in the above range, storage stability, developability, solvent resistance, heat resistance and mechanical strength tend to be good.
As the resin (B-1), a resin in which (b) is (b1) is preferable, and a resin in which (b) is (b1-2) is more preferable.

  Resin (B-1) is, for example, a method described in the document “Experimental Method for Polymer Synthesis” (Takayuki Otsu, published by Kagaku Dojin Co., Ltd., First Edition, First Edition, issued March 1, 1972) and It can manufacture with reference to the cited reference described in the said literature.

  Specifically, a method in which a predetermined amount of (a) and (b), a polymerization initiator, a solvent, and the like are charged into a reaction vessel, and oxygen is substituted with nitrogen, thereby deoxidizing, stirring, heating, and keeping warm. Is exemplified. In addition, the polymerization initiator, the solvent, and the like used here are not particularly limited, and any of those usually used in the field can be used. Examples of the polymerization initiator include azo compounds (2,2′-azobisisobutyronitrile, 2,2′-azobis (2,4-dimethylvaleronitrile), etc.) and organic peroxides (benzoyl peroxide, etc.). Any solvent may be used as long as it dissolves each monomer, and a solvent described later can be used as a solvent for the colored photosensitive composition.

  In addition, the obtained copolymer may use the solution after reaction as it is, a concentrated or diluted solution may be used, and it took out as solid (powder) by methods, such as reprecipitation. Things may be used. In particular, by using the same solvent as the solvent (E) described later as the solvent during the polymerization, the solution after the reaction can be used as it is, and the production process can be simplified.

In the resin (B-2), the ratio of the structural units derived from the respective monomers is preferably in the following range with respect to the total number of moles of all the structural units constituting the resin (B-2).
Structural unit derived from (a); 2 to 40 mol% (more preferably 5 to 35 mol%)
Structural unit derived from (b); 2-95 mol% (more preferably 5-80 mol%)
Structural unit derived from (c): 1 to 65 mol% (more preferably 1 to 60 mol%)
When the ratio of the structural unit of the resin (B-2) is in the above range, storage stability, developability, solvent resistance, heat resistance and mechanical strength tend to be good.
As the resin (B-2), a resin in which (b) is (b1) is preferable, and a resin in which (b) is (b1-2) is more preferable.
Resin (B-2) can be manufactured by the same method as resin (B-1).

In resin (B-3), it is preferable that the ratio of the structural unit derived from each monomer exists in the following ranges with respect to the total number of moles of all structural units constituting resin (B-3).
Structural unit derived from (a); 2 to 40 mol% (more preferably 5 to 35 mol%)
Structural unit derived from (c); 60 to 98 mol% (more preferably 65 to 95 mol%)
When the ratio of the structural unit of the resin (B-3) is in the above range, storage stability, developability and solvent resistance tend to be good.
Resin (B-3) can be manufactured by the same method as resin (B-1).

  Resin (B-4) and resin (B-5) can be manufactured through a two-step process, for example. In this case as well, the method described in the above-mentioned document “Experimental Methods for Polymer Synthesis” (Takayuki Otsu Publishing Co., Ltd., Chemical Dojin Co., Ltd., 1st edition, 1st edition, published on March 1, 1972), JP-A-2001-2001 It can be produced with reference to the method described in JP 89533.

First, the resin (B-4) is obtained as a first step to obtain a copolymer of (a) and (c) in the same manner as in the method for producing the resin (B-1) described above.
In this case, in the same manner as described above, the obtained copolymer may be used as it is as the solution after the reaction, or may be a concentrated or diluted solution, or a solid ( You may use what was taken out as a powder.
The ratio of the structural units derived from (a) and (c) is preferably in the following range with respect to the total number of moles of all the structural units constituting the copolymer.
Structural unit derived from (a); 5-50 mol% (more preferably 10-45 mol%)
Structural unit derived from (c); 50 to 95 mol% (more preferably 55 to 90 mol%)

Next, as a second step, the carboxylic acid (a) and a part of the carboxylic anhydride derived from the obtained copolymer are reacted with the cyclic ether (b). Since the reactivity of the cyclic ether is high and unreacted (b) hardly remains, (b1) is preferable as (b), and (b1-1) is more preferable.
Specifically, following the above, the atmosphere in the flask was replaced from nitrogen to air, and 5 to 80 mol% (b) of a reaction catalyst of a carboxy group and a cyclic ether with respect to the number of moles of (a) ( For example, tris (dimethylaminomethyl) phenol) is 0.001 to 5% by mass with respect to the total amount of (a), (b) and (c), and a polymerization inhibitor (for example, hydroquinone) is (a), (b ) And (c), 0.001 to 5 mass% is put in the flask and reacted at 60 to 130 ° C. for 1 to 10 hours to obtain the resin (A-4). In addition, like the polymerization conditions, the charging method and the reaction temperature can be appropriately adjusted in consideration of the production equipment, the amount of heat generated by the polymerization, and the like.
In this case, the number of moles of (b) is preferably 10 to 75 mole%, more preferably 15 to 70 mole%, with respect to the number of moles of (a). By setting the number of moles of (b) within this range, the balance between storage stability, solvent resistance and heat resistance tends to be good.

  Specific examples of the resin (B-4) include a resin obtained by reacting a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate with glycidyl (meth) acrylate, (meth) acrylic acid / benzyl ( Resin in which glycidyl (meth) acrylate is reacted with a copolymer of (meth) acrylate, resin in which glycidyl (meth) acrylate is reacted with a copolymer of (meth) acrylic acid / cyclohexyl (meth) acrylate, (meth) acrylic Resin obtained by reacting acid / styrene copolymer with glycidyl (meth) acrylate, resin obtained by reacting (meth) acrylic acid / methyl (meth) acrylate copolymer with glycidyl (meth) acrylate, (meth) Glycidyl (meth) acrylate was reacted with an acrylic acid / N-cyclohexylmaleimide copolymer. Fat, resin made by reacting (meth) acrylic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer with glycidyl (meth) acrylate, (meth) acrylic acid / dicyclopentanyl (meta ) Resin prepared by reacting acrylate / cyclohexyl (meth) acrylate copolymer with glycidyl (meth) acrylate, and (meth) acrylic acid / dicyclopentanyl (meth) acrylate / styrene copolymer glycidyl (meth) acrylate , A resin obtained by reacting (meth) acrylic acid / dicyclopentanyl (meth) acrylate / methyl (meth) acrylate copolymer with glycidyl (meth) acrylate, (meth) acrylic acid / di Cyclopentanyl (meth) acrylate / N-cyclohexylmaleimi Copolymer glycidyl (meth) resins obtained by reacting an acrylate, glycidyl on copolymers of crotonic acid / dicyclopentanyl (meth) acrylate (meth) resins obtained by reacting acrylate;

  Crotonic acid / benzyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, crotonic acid / cyclohexyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, crotonic acid / Styrene copolymer reacted with glycidyl (meth) acrylate, Crotonic acid / Methyl crotonic acid copolymer reacted with glycidyl (meth) acrylate, Crotonic acid / N-cyclohexylmaleimide copolymer Resin in which glycidyl (meth) acrylate was reacted with the polymer, resin in which glycidyl (meth) acrylate was reacted with the copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate, crotonic acid / di Cyclopentanyl (meth) acrylate / cycle A resin obtained by reacting a copolymer of hexyl (meth) acrylate with glycidyl (meth) acrylate, a resin obtained by reacting a copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / styrene with glycidyl (meth) acrylate, Crotonic acid / dicyclopentanyl (meth) acrylate / methyl crotonic acid copolymer reacted with glycidyl (meth) acrylate, copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide Resin obtained by reacting glycidyl (meth) acrylate with the coalescence;

  Resin obtained by reacting maleic acid / dicyclopentanyl (meth) acrylate copolymer with glycidyl (meth) acrylate, and resin obtained by reacting maleic acid / benzyl (meth) acrylate copolymer with glycidyl (meth) acrylate , A resin obtained by reacting maleic acid / cyclohexyl (meth) acrylate copolymer with glycidyl (meth) acrylate, a resin obtained by reacting maleic acid / styrene copolymer with glycidyl (meth) acrylate, maleic acid / maleic acid Resin prepared by reacting glycidyl (meth) acrylate with a copolymer of methyl, resin obtained by reacting glycidyl (meth) acrylate with a copolymer of maleic acid / N-cyclohexylmaleimide, maleic acid / dicyclopentanyl (meth) Acrylate / benzyl (meth) acrylate copolymer Resin obtained by reacting ricidyl (meth) acrylate, resin obtained by reacting maleic acid / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate copolymer with glycidyl (meth) acrylate, maleic acid / dicyclopenta Nyl (meth) acrylate / styrene copolymer reacted with glycidyl (meth) acrylate, maleic acid / dicyclopentanyl (meth) acrylate / methyl maleate copolymer reacted with glycidyl (meth) acrylate A resin obtained by reacting glycidyl (meth) acrylate with a copolymer of maleic acid / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide;

  Resin obtained by reacting (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate copolymer with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / benzyl (meth) Resin obtained by reacting glycidyl (meth) acrylate with a copolymer of acrylate, resin obtained by reacting glycidyl (meth) acrylate with a copolymer of (meth) acrylic acid / maleic anhydride / cyclohexyl (meth) acrylate, Resin obtained by reacting a meth) acrylic acid / maleic anhydride / styrene copolymer with glycidyl (meth) acrylate, and a glycidyl (meth) acrylic acid / maleic anhydride / methyl (meth) acrylate copolymer Resin reacted with (meth) acrylate, (meth) acrylic acid / maleic anhydride / N-cyclohexylmale Resin prepared by reacting imide copolymer with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer with glycidyl (meth) ) Acrylate-reacted resin, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate copolymer, and glycidyl (meth) acrylate resin ( Resin made by reacting glycidyl (meth) acrylate with a copolymer of (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / styrene, (meth) acrylic acid / maleic anhydride / dicyclopenta Nyl (meth) acrylate / methyl (meth) acrylate copolymer with glycidyl (meth) Resins obtained by reacting acrylate, (meth) resin obtained by reacting a copolymer glycidyl (meth) acrylate acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / N- cyclohexyl maleimide;

  Resin obtained by reacting (meth) acrylic acid / dicyclopentanyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate, and (meth) acrylic acid / benzyl (meth) acrylate copolymer 3 , 4-Epoxycyclohexylmethyl methacrylate resin, (Meth) acrylic acid / cyclohexyl (meth) acrylate copolymer and 3,4-epoxycyclohexylmethyl methacrylate reaction resin, (Meth) acrylic acid / styrene A resin prepared by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of (4), a resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of (meth) acrylic acid / methyl (meth) acrylate, (Meth) acrylic acid / N-cyclohexyl male Resin prepared by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of imide, and 3,4-epoxy with a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate A resin obtained by reacting cyclohexylmethyl methacrylate, a resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate, (meth ) A resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of acrylic acid / dicyclopentanyl (meth) acrylate / styrene, (meth) acrylic acid / dicyclopentanyl (meth) acrylate / (meta ) 3, 4 in methyl acrylate copolymer A resin obtained by reacting epoxycyclohexylmethyl methacrylate, a resin obtained by reacting a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide with 3,4-epoxycyclohexylmethyl methacrylate;

  Crotonic acid / dicyclopentanyl (meth) acrylate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate; Crotonic acid / benzyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl Resin in which methacrylate is reacted, Resin in which crotonic acid / cyclohexyl (meth) acrylate copolymer is reacted with 3,4-epoxycyclohexylmethyl methacrylate, Crotonic acid / styrene copolymer in 3,4-epoxycyclohexylmethyl Resin reacted with methacrylate, Crotonic acid / methyl crotonate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, Crotonic acid / N-cyclohexylmaleimide copolymer, 3,4-epoxycyclohexyl Methylme Resin in which acrylate was reacted, Crotonic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer and 3,4-epoxycyclohexylmethyl methacrylate reacted in resin, crotonic acid / dicyclopentanyl A resin obtained by reacting a copolymer of (meth) acrylate / cyclohexyl (meth) acrylate with 3,4-epoxycyclohexylmethyl methacrylate, and a copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / styrene, 3,4 -Resin reacted with epoxycyclohexylmethyl methacrylate, Resin obtained by reacting crotonic acid / dicyclopentanyl (meth) acrylate / methyl crotonic acid copolymer with 3,4-epoxycyclohexylmethyl methacrylate, crotonic acid / dicyclo Pentanyl (Me ) Acrylate / N- cyclohexyl maleimide copolymer resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate;

  A resin obtained by reacting a maleic acid / dicyclopentanyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate, and a maleic acid / benzyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl Resin reacted with methacrylate, Resin reacted with 3,4-epoxycyclohexylmethyl methacrylate on maleic acid / cyclohexyl (meth) acrylate copolymer, 3,4-epoxycyclohexylmethyl on maleic acid / styrene copolymer Resin reacted with methacrylate, Resin reacted with 3,4-epoxycyclohexylmethyl methacrylate on copolymer of maleic acid / methyl maleate, 3,4-epoxycyclohexyl on copolymer of maleic acid / N-cyclohexylmaleimide Methylme Resin in which acrylate is reacted, Resin in which 3,4-epoxycyclohexylmethyl methacrylate is reacted with a copolymer of maleic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate, maleic acid / dicyclopentanyl Resin obtained by reacting (meth) acrylate / cyclohexyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate; 3,4 for maleic acid / dicyclopentanyl (meth) acrylate / styrene copolymer -Resin obtained by reacting epoxycyclohexylmethyl methacrylate, resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of maleic acid / dicyclopentanyl (meth) acrylate / methyl maleate, maleic acid / dicyclohexane Pentanyl (Me ) Acrylate / N- cyclohexyl maleimide copolymer resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate;

  (Meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / maleic anhydride / benzyl Resin obtained by reacting (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate; (meth) acrylic acid / maleic anhydride / cyclohexyl (meth) acrylate copolymer with 3,4-epoxycyclohexyl Resin in which methyl methacrylate is reacted, Resin in which 3,4-epoxycyclohexylmethyl methacrylate is reacted with a copolymer of (meth) acrylic acid / maleic anhydride / styrene, (meth) acrylic acid / maleic anhydride / Copolymer of methyl (meth) acrylate with 3,4-epoxycyclohexene Resin reacted with silmethyl methacrylate, (meth) acrylic acid / maleic anhydride / N-cyclohexylmaleimide copolymer, resin reacted with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / maleic Resin prepared by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of acid anhydride / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / dicyclo Resin prepared by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of pentanyl (meth) acrylate / cyclohexyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate 3,4-epoxy on styrene / styrene copolymer 3,4-epoxycyclohexylmethyl methacrylate was added to a resin obtained by reacting cyclohexylmethyl methacrylate with a copolymer of (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / methyl (meth) acrylate. Examples include a resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide. It is done.

Resin (B-5) obtains a copolymer of (b) and (c) as a first step in the same manner as in the method for producing resin (B-1) described above.
In this case, in the same manner as described above, the obtained copolymer may be used as it is as the solution after the reaction, or may be a concentrated or diluted solution, or a solid ( You may use what was taken out as a powder.
The ratio of the structural units derived from (b) and (c) is preferably in the following range with respect to the total number of moles of all the structural units constituting the copolymer.
Structural unit derived from (b); 5-95 mol% (more preferably 10-90 mol%)
Structural unit derived from (c); 5-95 mol% (more preferably 10-90 mol%)

Further, in the same manner as in the production method of the resin (B-4), the cyclic ether derived from (b) in the copolymer of (b) and (c) is added to the carboxylic acid or carboxylic acid that (a) has. It can be obtained by reacting an anhydride. A carboxylic acid anhydride may be further reacted with a hydroxy group generated by the reaction of a cyclic ether with a carboxylic acid or a carboxylic acid anhydride.
The amount of (a) used to react with the copolymer is preferably 5 to 80 mol% with respect to the number of moles of (b). Since the reactivity of the cyclic ether is high and unreacted (b) hardly remains, (b1) is preferable as (b), and (b1-1) is more preferable.

  Specific examples of the resin (B-5) include a resin obtained by reacting a copolymer of dicyclopentanyl (meth) acrylate / glycidyl (meth) acrylate with (meth) acrylic acid, benzyl (meth) acrylate / glycidyl ( Resin in which (meth) acrylic acid is reacted with a copolymer of (meth) acrylate, resin in which (meth) acrylic acid is reacted with a copolymer of cyclohexyl (meth) acrylate / glycidyl (meth) acrylate, styrene / glycidyl ( Resin obtained by reacting (meth) acrylic acid with a copolymer of (meth) acrylate, resin obtained by reacting (meth) acrylic acid with a copolymer of methyl (meth) acrylate / glycidyl (meth) acrylate, N-cyclohexyl A resin obtained by reacting (meth) acrylic acid with a maleimide / glycidyl (meth) acrylate copolymer Resin obtained by reacting clopentanyl (meth) acrylate / benzyl (meth) acrylate / glycidyl (meth) acrylate copolymer with (meth) acrylic acid, dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate / glycidyl ( Resin in which (meth) acrylic acid is reacted with a copolymer of (meth) acrylate, and (meth) acrylic acid is reacted with a copolymer of dicyclopentanyl (meth) acrylate / styrene / glycidyl (meth) acrylate , (Dicyclopentanyl (meth) acrylate / Methyl (meth) acrylate / Glycidyl (meth) acrylate copolymer) Resin obtained by reacting (meth) acrylic acid, Dicyclopentanyl (meth) acrylate / N- Copolymerization of cyclohexylmaleimide / glycidyl (meth) acrylate Body (meth) resins obtained by reacting an acrylic acid;

  Resin obtained by reacting crotonic acid with dicyclopentanyl (meth) acrylate / glycidyl (meth) acrylate copolymer, resin obtained by reacting crotonic acid with benzyl (meth) acrylate / glycidyl (meth) acrylate copolymer , A resin obtained by reacting crotonic acid with a copolymer of cyclohexyl (meth) acrylate / glycidyl (meth) acrylate, a resin obtained by reacting styrene / glycidyl (meth) acrylate copolymer with crotonic acid, methyl crotonate / glycidyl Resin obtained by reacting crotonic acid with copolymer of (meth) acrylate, resin obtained by reacting crotonic acid with copolymer of N-cyclohexylmaleimide / glycidyl (meth) acrylate, dicyclopentanyl (meth) acrylate / benzyl (Meth) acrylate / Glycidyl (Meth) Ac Resin obtained by reacting crotonic acid with a copolymer of a rate, resin obtained by reacting crotonic acid with a copolymer of dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate / glycidyl (meth) acrylate, dicyclopenta Resin obtained by reacting crotonic acid with a copolymer of nyl (meth) acrylate / styrene / glycidyl (meth) acrylate, croton into a copolymer of dicyclopentanyl (meth) acrylate / methyl crotonic acid / glycidyl (meth) acrylate A resin obtained by reacting an acid, a resin obtained by reacting crotonic acid with a copolymer of dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide / glycidyl (meth) acrylate;

  Resin made by reacting maleic acid with dicyclopentanyl (meth) acrylate / glycidyl (meth) acrylate copolymer, resin made by reacting maleic acid with benzyl (meth) acrylate / glycidyl (meth) acrylate copolymer , A resin in which maleic acid is reacted with a copolymer of cyclohexyl (meth) acrylate / glycidyl (meth) acrylate, a resin in which maleic acid is reacted with a copolymer of styrene / glycidyl (meth) acrylate, methyl maleate / glycidyl Resin in which maleic acid is reacted with copolymer of (meth) acrylate, resin in which maleic acid is reacted with copolymer of N-cyclohexylmaleimide / glycidyl (meth) acrylate, dicyclopentanyl (meth) acrylate / benzyl (Meth) acrylate / Glycidyl (Meth) Ac Resin in which maleic acid is reacted with a copolymer of a rate, resin in which maleic acid is reacted with a copolymer of dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate / glycidyl (meth) acrylate, dicyclopenta Nyl (meth) acrylate / styrene / glycidyl (meth) acrylate copolymer maleic resin, dicyclopentanyl (meth) acrylate / methyl maleate / glycidyl (meth) acrylate copolymer A resin obtained by reacting an acid, a resin obtained by reacting a dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide / glycidyl (meth) acrylate copolymer with maleic acid;

  Resin obtained by reacting dicyclopentanyl (meth) acrylate / glycidyl (meth) acrylate copolymer with (meth) acrylic acid and maleic anhydride, benzyl (meth) acrylate / glycidyl (meth) acrylate copolymer Resin in which (meth) acrylic acid and maleic anhydride are reacted with, cyclohexyl (meth) acrylate / glycidyl (meth) acrylate copolymer in which (meth) acrylic acid and maleic anhydride are reacted, styrene Resin prepared by reacting (meth) acrylic acid and maleic anhydride with a copolymer of glycidyl / glycidyl (meth) acrylate, and (meth) acrylic acid and a copolymer of methyl (meth) acrylate / glycidyl (meth) acrylate Resin reacted with maleic anhydride, (N-cyclohexylmaleimide / glycidyl A resin obtained by reacting a (meth) acrylate copolymer with (meth) acrylic acid and maleic anhydride, a dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate / glycidyl (meth) acrylate copolymer ( Resin obtained by reacting meth) acrylic acid and maleic anhydride, (meth) acrylic acid and maleic anhydride into dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate / glycidyl (meth) acrylate copolymer , A resin obtained by reacting (meth) acrylic acid and maleic anhydride with a copolymer of dicyclopentanyl (meth) acrylate / styrene / glycidyl (meth) acrylate, dicyclopentanyl (meth) Acrylate / methyl (meth) acrylate / glycidyl (meth) acrylate Resin obtained by reacting polymer with (meth) acrylic acid and maleic anhydride, dimethypentanyl (meth) acrylate / N-cyclohexylmaleimide / glycidyl (meth) acrylate copolymer with (meth) acrylic acid and maleic A resin reacted with an acid anhydride;

  Resin obtained by reacting (meth) acrylic acid with a copolymer of dicyclopentanyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, copolymer of benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate Resin in which (meth) acrylic acid is reacted with the polymer, Resin in which (meth) acrylic acid is reacted with the copolymer of cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, styrene / 3,4-epoxy A resin obtained by reacting (meth) acrylic acid with a copolymer of cyclohexylmethyl methacrylate, a resin obtained by reacting (meth) acrylic acid with a copolymer of methyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, N-cyclohexylmaleimide / 3,4-epo A resin obtained by reacting a copolymer of cyclocyclohexylmethyl methacrylate with (meth) acrylic acid, a copolymer of dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate (meta ) A resin obtained by reacting acrylic acid, a resin obtained by reacting (meth) acrylic acid with a copolymer of dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, Resin prepared by reacting a copolymer of pentanyl (meth) acrylate / styrene / 3,4-epoxycyclohexylmethyl methacrylate with (meth) acrylic acid, dicyclopentanyl (meth) acrylate / methyl (meth) acrylate / 3 , 4-Epoxycyclohexylmethyl Resin of (meth) acrylic acid reacted with a copolymer of methacrylate, (meth) acrylic acid to a copolymer of dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate Reacted resin;

  A resin obtained by reacting a copolymer of dicyclopentanyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate with crotonic acid, a copolymer of benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate and croton Acid-reacted resin, cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer, crotonic acid-reacted resin, styrene / 3,4-epoxycyclohexylmethyl methacrylate copolymer, croton Acid-reacted resin, Crotonic acid methyl / 3,4-epoxycyclohexylmethyl methacrylate copolymer, Crotonic acid-reacted resin, N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate copolymer A resin obtained by reacting crotonic acid, a resin obtained by reacting crotonic acid with a copolymer of dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, dicyclopentanyl (meta ) A resin obtained by reacting crotonic acid with a copolymer of acrylate / cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, dicyclopentanyl (meth) acrylate / styrene / 3,4-epoxycyclohexylmethyl methacrylate Resin obtained by reacting crotonic acid with copolymer, resin obtained by reacting crotonic acid with copolymer of dicyclopentanyl (meth) acrylate / methyl crotonic acid / 3,4-epoxycyclohexylmethyl methacrylate, dicyclopentanyl (Meta) acryle Resin obtained by reacting crotonic acid with a copolymer of carbonate / N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate;

  Dicyclopentanyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer with maleic acid reacted, benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer with maleic acid Acid-reacted resin, cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer, maleic acid-reacted resin, styrene / 3,4-epoxycyclohexylmethyl methacrylate copolymer Resin in which acid is reacted, Resin in which maleic acid is reacted with copolymer of methyl maleate / 3,4-epoxycyclohexylmethyl methacrylate, Copolymer of N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate A resin reacted with maleic acid, a resin obtained by reacting maleic acid with a copolymer of dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, dicyclopentanyl (meta ) Resin prepared by reacting maleic acid with a copolymer of acrylate / cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, dicyclopentanyl (meth) acrylate / styrene / 3,4-epoxycyclohexylmethyl methacrylate Resin obtained by reacting maleic acid with copolymer, resin obtained by reacting maleic acid with copolymer of dicyclopentanyl (meth) acrylate / methyl maleate / 3,4-epoxycyclohexylmethyl methacrylate, dicyclopentanyl (Meta) acryle A resin obtained by reacting maleic acid with a copolymer of carbonate / N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate;

  Resin obtained by reacting (meth) acrylic acid and maleic anhydride with a copolymer of dicyclopentanyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate, benzyl (meth) acrylate / 3,4-epoxycyclohexyl Resin obtained by reacting (meth) acrylic acid and maleic anhydride with a copolymer of methyl methacrylate, (meth) acrylic acid and maleic acid with a copolymer of cyclohexyl (meth) acrylate / 3,4-epoxycyclohexyl methyl methacrylate Resin in which anhydride is reacted, Resin in which (meth) acrylic acid and maleic anhydride are reacted with a copolymer of styrene / 3,4-epoxycyclohexylmethyl methacrylate, methyl (meth) acrylate / 3,4- Copolymerization of epoxycyclohexylmethyl methacrylate. A resin obtained by reacting (meth) acrylic acid and maleic anhydride, and a copolymer obtained by reacting a copolymer of N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate with (meth) acrylic acid and maleic anhydride. , A resin obtained by reacting a copolymer of dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate with (meth) acrylic acid and maleic anhydride, dicyclopentanyl ( Resin of (meth) acrylate / cyclohexyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer reacted with (meth) acrylic acid and maleic anhydride, dicyclopentanyl (meth) acrylate / styrene / 3,4-epoxycyclohexylmethyl Resin obtained by reacting (meth) acrylic acid and maleic anhydride with a copolymer of tacrylate, copolymer of dicyclopentanyl (meth) acrylate / methyl (meth) acrylate / 3,4-epoxycyclohexylmethyl methacrylate (Meth) acrylic acid and maleic anhydride, and a copolymer of dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide / 3,4-epoxycyclohexylmethyl methacrylate to (meth) acrylic acid and Examples include resins reacted with maleic anhydride.

  The polystyrene equivalent weight average molecular weight of the resin (B) is preferably 3,000 to 100,000, more preferably 5,000 to 50,000. When the weight average molecular weight of the resin (B) is in the above range, the coating property tends to be good, the film is not easily reduced during development, and the non-exposed part is easily removed during development. It is in.

  The molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the resin (B) is preferably 1.1 to 6.0, and more preferably 1.2 to 4.0. When the molecular weight distribution is in the above range, the developability tends to be excellent.

  The acid value of the resin (B) is preferably 20 to 150 mg / g-KOH, more preferably 50 to 135 mg / g-KOH, and particularly preferably 70 to 135 mg / g-KOH. Here, the acid value is a value measured as the amount (mg) of potassium hydroxide necessary to neutralize 1 g of the resin (B), and can be determined by titrating with an aqueous potassium hydroxide solution.

  When the colored photosensitive composition of this invention contains resin (B), content of resin (B) is 5-95 mass% normally with respect to the total amount of resin (B) and polymeric compound (C). , Preferably, it is 20-80 mass%, More preferably, it is 40-60 mass%. When the content of the resin (B) is in the above range, the developability, adhesion, solvent resistance of the cured pattern, and mechanical properties tend to be improved.

The colored photosensitive composition of the present invention contains a polymerizable compound (C).
The polymerizable compound (C) is a compound that can be polymerized by an active radical, an acid, or the like generated from the polymerization initiator (D), and examples thereof include a compound having a polymerizable ethylenically unsaturated bond, preferably A (meth) acrylic acid ester compound is mentioned.

  Examples of the polymerizable compound (C) having one polymerizable ethylenically unsaturated bond include the same compounds as those described above as (a), (b) and (c). Acid esters are preferred.

  Examples of the polymerizable compound (C) having two polymerizable ethylenically unsaturated bonds include 1,3-butanediol di (meth) acrylate, 1,3-butanediol (meth) acrylate, and 1,6-hexanediol. Di (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, polyethylene glycol Diacrylate, bis (acryloyloxyethyl) ether of bisphenol A, ethoxylated bisphenol A di (meth) acrylate, propoxylated neopentyl glycol di (meth) acrylate, ethoxylated neopentylglycol Di (meth) acrylate, 3-methyl-pentanediol di (meth) acrylate.

Examples of the polymerizable compound (C) having three or more polymerizable ethylenically unsaturated bonds include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri ( (Meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) Acrylate, tripentaerythritol tetra (meth) acrylate, tripentaerythritol penta (meth) acrylate, tripentaerythritol hexa (meth) acrylate, tripe Taerythritol hepta (meth) acrylate, tripentaerythritol octa (meth) acrylate, reaction product of pentaerythritol tri (meth) acrylate and acid anhydride, reaction product of dipentaerythritol penta (meth) acrylate and acid anhydride, Reaction product of tripentaerythritol hepta (meth) acrylate and acid anhydride, caprolactone-modified trimethylolpropane tri (meth) acrylate, caprolactone-modified pentaerythritol tri (meth) acrylate, caprolactone-modified tris (2-hydroxyethyl) isocyanurate tri (Meth) acrylate, caprolactone-modified pentaerythritol tetra (meth) acrylate, caprolactone-modified dipentaerythritol penta (meth) acrylate, capro Kuton-modified dipentaerythritol hexa (meth) acrylate, caprolactone-modified tripentaerythritol tetra (meth) acrylate, caprolactone-modified tripentaerythritol penta (meth) acrylate, caprolactone-modified tripentaerythritol hexa (meth) acrylate, caprolactone-modified tripentaerythritol hepta (Meth) acrylate, caprolactone modified tripentaerythritol octa (meth) acrylate, reaction product of caprolactone modified pentaerythritol tri (meth) acrylate and acid anhydride, caprolactone modified dipentaerythritol penta (meth) acrylate and acid anhydride Reaction of reaction product, caprolactone-modified tripentaerythritol hepta (meth) acrylate with acid anhydride And the like.
Among these, a tri- or higher functional monomer is preferable, and dipentaerythritol hexa (meth) acrylate is more preferable.

  The content of the polymerizable compound (C) is preferably 5 to 95% by mass and more preferably 20 to 80% by mass with respect to the total amount of the resin (B) and the polymerizable compound (C). When the content of the polymerizable compound (C) is in the above range, the sensitivity, the smoothness of the pattern obtained, the reliability, and the mechanical strength tend to be good.

The colored photosensitive composition of the present invention contains a polymerization initiator (D).
The polymerization initiator (D) is not particularly limited as long as it is a compound that generates an active radical, an acid or the like by the action of light and initiates polymerization, and a known polymerization initiator can be used.
As the polymerization initiator (D), a biimidazole compound, an alkylphenone compound, a triazine compound, an acylphosphine oxide compound, and an oxime compound are preferable. Moreover, you may use the photocationic polymerization initiator (For example, what is comprised from the onium cation and the anion derived from a Lewis acid) described in Unexamined-Japanese-Patent No. 2008-181087.

  Examples of the biimidazole compound include 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole and 2,2′-bis (2,3-dichlorophenyl) -4. , 4 ′, 5,5′-tetraphenylbiimidazole (see, for example, JP-A-6-75372 and JP-A-6-75373), 2,2′-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole, 2,2'-bis (2 -Chlorophenyl) -4,4 ', 5,5'-tetra (dialkoxyphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (trialkoxy) Enyl) biimidazole (see, for example, JP-B-48-38403 and JP-A-62-174204), an imidazole in which the phenyl group at the 4,4′5,5′-position is substituted with a carboalkoxy group Compounds (for example, see JP-A-7-10913) and the like. Preferably, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,3-dichlorophenyl) -4,4 ′, 5 Examples include 5'-tetraphenylbiimidazole and 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole.

  Examples of the alkylphenone compound include diethoxyacetophenone, 2-methyl-2-morpholino-1- (4-methylsulfanylphenyl) propan-1-one, 2-dimethylamino-1- (4-morpholinophenyl) -2. -Benzylbutan-1-one, 2-dimethylamino-1- (4-morpholinophenyl) -2- (4-methylphenylmethyl) butan-1-one, 2-hydroxy-2-methyl-1-phenylpropane- 1-one, benzyldimethyl ketal, 2-hydroxy-2-methyl-1- [4- (2-hydroxyethoxy) phenyl] propan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl- 1- (4-isopropenylphenyl) propan-1-one oligomers and the like Examples thereof include 2-methyl-2-morpholino-1- (4-methylsulfanylphenyl) propan-1-one and 2-dimethylamino-1- (4-morpholinophenyl) -2-benzylbutan-1-one. It is done. Commercial products such as Irgacure 369, 907 (above, manufactured by BASF Japan Ltd.) may be used.

  Examples of the triazine compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxy Naphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl) ) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4- Bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2) -Methylphenyl) Sulfonyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.

  Examples of the acylphosphine oxide compound include 2,4,6-trimethylbenzoyldiphenylphosphine oxide. Commercial products such as Irgacure 819 (manufactured by BASF Japan) may be used.

  Examples of the oxime compound include N-benzoyloxy-1- (4-phenylsulfanylphenyl) butan-1-one-2-imine and N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one. 2-imine, N-acetoxy-1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethane-1-imine, N-acetoxy-1- [9-ethyl- 6- {2-methyl-4- (3,3-dimethyl-2,4-dioxacyclopentanylmethyloxy) benzoyl} -9H-carbazol-3-yl] ethane-1-imine and the like. Commercial products such as Irgacure OXE-01, OXE-02 (manufactured by BASF Japan), N-1919 (manufactured by ADEKA) may be used.

  Furthermore, as the polymerization initiator (D), benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether; benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl- Benzophenone compounds such as 4′-methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone; 9,10-phenanthrenequinone, Examples include quinone compounds such as 2-ethylanthraquinone and camphorquinone; 10-butyl-2-chloroacridone, benzyl, methyl phenylglyoxylate, and titanocene compounds. These are preferably used in combination with a polymerization initiation assistant (D1) described below (particularly an amine compound described below).

The colored photosensitive composition of the present invention may contain a polymerization initiation assistant (D1). The polymerization initiation assistant (D1) is a compound or sensitizer that is used in combination with the polymerization initiator (D) and is used to accelerate the polymerization of the polymerizable compound that has been polymerized by the polymerization initiator. .
Examples of the polymerization initiation assistant (D1) include amine compounds, thiazoline compounds, alkoxyanthracene compounds, thioxanthone compounds, and carboxylic acid compounds.

  Examples of amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 4- 2-ethylhexyl dimethylaminobenzoate, N, N-dimethylparatoluidine, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4,4′-bis (ethylmethylamino) Benzophenone and the like can be mentioned, among which 4,4′-bis (diethylamino) benzophenone is preferable. Commercial products such as EAB-F (Hodogaya Chemical Co., Ltd.) may be used.

  Examples of the thiazoline compound include compounds represented by formula (III-1) to formula (III-3).

  Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, and 9,10-dibutoxy. Anthracene, 2-ethyl-9,10-dibutoxyanthracene, etc. are mentioned.

  Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone and the like.

  Carboxylic acid compounds include phenylsulfanylacetic acid, methylphenylsulfanylacetic acid, ethylphenylsulfanylacetic acid, methylethylphenylsulfanylacetic acid, dimethylphenylsulfanylacetic acid, methoxyphenylsulfanylacetic acid, dimethoxyphenylsulfanylacetic acid, chlorophenylsulfanylacetic acid, dichlorophenylsulfanylacetic acid, N -Phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid and the like.

The content of the polymerization initiator (D) is preferably 0.1 to 40% by mass, more preferably 1 to 30% by mass with respect to the total amount of the resin (B) and the polymerizable compound (C).
When the total amount of the polymerization initiator (D) is within this range, the colored photosensitive composition has high sensitivity, and the resulting pattern tends to have good chemical resistance, mechanical strength, and surface smoothness.

When the polymerization initiation assistant (D1) is used, the amount used is preferably 0.01 to 50% by mass, more preferably 0.1%, based on the total amount of the resin (B) and the polymerizable compound (C). -40 mass%. Moreover, it is preferably 0.01 to 10 mol, more preferably 0.01 to 5 mol, per 1 mol of the polymerization initiator (D).
When the amount of the polymerization initiation assistant (D1) is within this range, the sensitivity of the colored photosensitive composition to be obtained further increases, and the productivity of the resulting pattern tends to be improved.

  Moreover, the colored photosensitive composition of this invention may contain the polyfunctional thiol compound (T) further. This polyfunctional thiol compound (T) is a compound having two or more sulfanyl groups in the molecule. Of these, the use of a compound having two or more sulfanyl groups adjacent to an aliphatic hydrocarbon group is preferred because the sensitivity of the colored photosensitive composition of the present invention is increased.

As the polyfunctional thiol compound (T), hexanedithiol, decanedithiol, 1,4-bis (methylsulfanyl) benzene, butanediol bis (3-sulfanylpropionate), butanediol bis (3-sulfanyl acetate), ethylene Glycol bis (3-sulfanyl acetate), trimethylolpropane tris (3-sulfanyl acetate), butanediol bis (3-sulfanylpropionate), trimethylolpropane tris (3-sulfanylpropionate), trimethylolpropane tris ( 3-sulfanyl acetate), pentaerythritol tetrakis (3-sulfanylpropionate), pentaerythritol tetrakis (3-sulfanyl acetate), trishydroxyethylate Scan (3-sulfanyl propionate), pentaerythritol tetrakis (3-sulfanyl butyrate), 1,4-bis (3-sulfanyl-butyloxy) include butane and the like.
The content of the polyfunctional thiol compound (T) is preferably 0.5 to 20% by mass, more preferably 1 to 15% by mass with respect to the polymerization initiator (D). When the content of the polyfunctional thiol compound (T) is in this range, sensitivity tends to be high and developability tends to be good.

  The colored photosensitive composition of the present invention contains a solvent (E). It does not specifically limit as a solvent (E), The solvent normally used in the said field | area can be used. For example, ester solvents (solvents containing -COO- and not containing -O-), ether solvents other than ester solvents (solvents containing -O- and not containing -COO-), ether esters Solvents (solvents containing -COO- and -O- in the molecule), ketone solvents other than ester solvents (solvents containing -CO- in the molecule but not -COO-), alcohol solvents, aromatic hydrocarbons A solvent, an amide solvent, and dimethyl sulfoxide can be selected and used.

  As ester solvents, methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate Methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, γ-butyrolactone and the like.

  Ether solvents include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether , Propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethyl Glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenetole, and the like methyl anisole.

  Examples of ether ester solvents include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxy Ethyl propionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, Ethyl 2-ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether Acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, and the like diethylene glycol monobutyl ether acetate.

  Examples of ketone solvents include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone, and isophorone. Etc.

  Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerin.

  Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, mesitylene and the like.

Examples of the amide solvent include N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone and the like.
These solvents may be used alone or in combination of two or more.

  Among the above-mentioned solvents, an organic solvent having a boiling point at 1 atm of 120 ° C. or higher and 180 ° C. or lower is preferable from the viewpoints of coating properties and drying properties. Of these, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol methyl ethyl ether, 3-methoxybutyl acetate, 3-methoxy-1-butanol and the like are preferable.

  Content of the solvent (E) in a colored photosensitive composition becomes like this. Preferably it is 60-95 mass% with respect to a colored photosensitive composition, More preferably, it is 70-90 mass%. In other words, the solid content of the colored photosensitive composition is preferably 5 to 40% by mass, more preferably 10 to 30% by mass. When content of a solvent (E) exists in the said range, there exists a tendency for the flatness at the time of application | coating to become favorable.

  The colored photosensitive composition of the present invention preferably contains a surfactant (F). Examples of the surfactant include a silicone-based surfactant, a fluorine-based surfactant, and a silicone-based surfactant having a fluorine atom. By including the surfactant, the flatness during application tends to be good.

Examples of the silicone surfactant include surfactants having a siloxane bond.
Specifically, Torre Silicone DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH29PA, SH30PA, polyether-modified silicone oil SH8400 (trade name: manufactured by Toray Dow Corning Co., Ltd.), KP321, KP322 , KP323, KP324, KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (Momentive Performance Materials Japan GK) Manufactured) and the like.

Examples of the fluorosurfactant include surfactants having a fluorocarbon chain.
Specifically, Florinart (registered trademark) FC430, FC431 (manufactured by Sumitomo 3M Co., Ltd.), MegaFac (registered trademark) F142D, F171, F172, F173, F177, F183, R183 (DIC) ), Ftop (registered trademark) EF301, EF303, EF351, EF351, EF352 (manufactured by Mitsubishi Materials Denkasei), Surflon (registered trademark) S381, S382, SC101, SC105 (Asahi Glass) And E5844 (manufactured by Daikin Fine Chemical Laboratory Co., Ltd.).

  Examples of the silicone-based surfactant having a fluorine atom include surfactants having a siloxane bond and a fluorocarbon chain. Specifically, Megafac (registered trademark) R08, BL20, F475, F477, F443 (manufactured by DIC Corporation) and the like can be mentioned. Preferably, MegaFac (registered trademark) F475 is used.

  The surfactant (F) is 0.001% by mass or more and 0.2% by mass or less, preferably 0.002% by mass or more and 0.1% by mass or less, more preferably, based on the colored photosensitive composition. It is 0.01 mass% or more and 0.05 mass% or less. By containing the surfactant in this range, the flatness of the coating film can be improved.

  The colored photosensitive composition of the present invention contains various additives such as fillers, other polymer compounds, adhesion promoters, antioxidants, ultraviolet absorbers, light stabilizers, chain transfer agents, etc., as necessary. May be included.

The colored photosensitive composition of the present invention can be prepared, for example, as follows.
First, the pigment of the colorant (A) is mixed with the solvent (E) and dispersed using a bead mill or the like until the average particle size of the pigment is about 0.2 μm or less. Under the present circumstances, you may mix | blend a pigment dispersant and some or all of resin (B) as needed. In the obtained pigment dispersion, the polymerizable compound (C) and the polymerization initiator (D), the remainder of the resin (B) contained as necessary, other components, and further an additional solvent (E) as necessary. The desired colored photosensitive composition can be obtained by adding to a predetermined concentration.

The colored photosensitive composition of the present invention is processed into a color filter, for example, through the steps shown in the following (1) to (4).
(1) Step of obtaining a coating film by applying the colored photosensitive composition of the present invention to a substrate (2) Step of obtaining a coating film after exposure by exposing the coating film through a mask (3) After exposure A step of obtaining a pattern by developing the coating film with an alkaline developer (4) A step of obtaining a cured pattern by baking the pattern

Examples of the method for obtaining the pattern include a photolithography method, an ink jet method, and a printing method. Of these, the photolithography method is preferable.
The photolithography method is a method for obtaining a pattern by applying the colored photosensitive composition onto a substrate, drying, exposing through a photomask, and developing.

Examples of the substrate include glass, metal, and plastic, and may be plate-shaped or film-shaped.
Examples of plastics include polyolefins such as polyethylene, polypropylene and norbornene polymers, polyvinyl alcohol, polyethylene terephthalate, polyethylene naphthalate, poly (meth) acrylic acid ester, cellulose ester, polycarbonate, polysulfone, polyethersulfone, polyetherketone, Examples include polyphenylene sulfide and polyphenylene oxide. Here, (meth) acrylic acid means at least one selected from the group consisting of acrylic acid and methacrylic acid.
Structures such as a color filter, various insulating or conductive films, and a drive circuit may be formed on these substrates.
According to the colored photosensitive composition of the present invention, a pattern cured at a lower temperature can be formed, which is particularly useful when forming a pattern on a plastic substrate.

  Examples of the coating method on the substrate include an extrusion coating method, a direct gravure coating method, a reverse gravure coating method, a CAP coating method, and a die coating method. Also, use a coating device such as a dip coater, roll coater, bar coater, spin coater, slit & spin coater, slit coater (sometimes called a die coater, curtain flow coater, or spinless coater) or inkjet. Also good. Especially, it is preferable to apply using a slit coater, a spin coater, a roll coater or the like.

Examples of the method for drying the film applied to the substrate include methods such as heat drying, natural drying, ventilation drying, and vacuum drying. A plurality of methods may be combined.
As drying temperature, 10-120 degreeC is preferable and 25-100 degreeC is more preferable. In addition, the heating time is preferably 10 seconds to 60 minutes, and more preferably 30 seconds to 30 minutes.
The vacuum drying is preferably performed at a temperature of 20 to 25 ° C. under a pressure of 50 to 150 Pa.
The film thickness of the coating film after drying is not particularly limited and can be appropriately adjusted depending on the material used, the use, etc., and is usually 0.1 to 20 μm, preferably 1 to 6 μm.

The dried coating film is exposed through a photomask for forming a target pattern.
The pattern shape on the photomask at this time is not particularly limited, and a pattern shape corresponding to the intended application is used.
The light source used for exposure is preferably a light source that generates light having a wavelength of 250 to 450 nm. For example, light less than 350 nm can be cut using a filter that cuts this wavelength range, or light near 436 nm, 408 nm, and 365 nm can be selectively extracted using a bandpass filter that extracts these wavelength ranges. Or you may. Specific examples include mercury lamps, light emitting diodes, metal halide lamps, halogen lamps, and the like.
It is preferable to use an apparatus such as a mask aligner or a stepper because the entire exposed surface can be irradiated with parallel rays uniformly and accurate alignment between the mask and the substrate can be performed.

After exposure, a pattern can be obtained by contacting a developing solution to dissolve a predetermined portion, for example, an unexposed portion, and developing. The developer may be an organic solvent, but an aqueous solution of a basic compound is preferable because the exposed portion of the coating film is hardly dissolved or swollen by the developer and a pattern having a good shape is obtained.
The developing method may be any of paddle method, dipping method, spray method and the like. Further, the substrate may be tilted at an arbitrary angle during development.
After development, it is preferable to wash with water.

Examples of the basic compound include sodium hydroxide, potassium hydroxide, disodium hydrogen phosphate, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium silicate, potassium silicate, and sodium carbonate. Inorganic basic compounds such as potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium borate, potassium borate, ammonia; tetramethylammonium hydroxide, 2-hydroxyethyltrimethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine Organic basic compounds such as monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, and ethanolamine. Of these, potassium hydroxide, sodium hydrogen carbonate and tetramethylammonium hydroxide are preferable.
The density | concentration in the aqueous solution of these inorganic and organic basic compounds becomes like this. Preferably it is 0.01-10 mass%, More preferably, it is 0.03-5 mass%.

The aqueous solution of the basic compound may contain a surfactant.
Surfactants include polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkyl aryl ether, other polyoxyethylene derivatives, oxyethylene / oxypropylene block copolymers, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters , Nonionic surfactants such as polyoxyethylene sorbitol fatty acid ester, glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine;
Anionic surfactants such as sodium lauryl alcohol sulfate, sodium oleyl alcohol sulfate, sodium lauryl sulfate, ammonium lauryl sulfate, sodium dodecylbenzenesulfonate, sodium dodecylnaphthalenesulfonate;
And cationic surfactants such as stearylamine hydrochloride and lauryltrimethylammonium chloride.
The concentration of the surfactant in the aqueous solution of the basic compound is preferably 0.01 to 10% by mass, more preferably 0.05 to 8% by mass, and particularly preferably 0.1 to 5% by mass.

  Furthermore, you may post-bake as needed. The post-baking is preferably performed, for example, in the range of 50 to 230 ° C. and 2 to 240 minutes.

  The colored photosensitive composition of the present invention can provide a good pattern and color filter such as color density, brightness, contrast, sensitivity, resolution, and heat resistance. Also, display devices including these color filters or patterns as part of their components, such as known liquid crystal display devices, organic EL devices, solid-state imaging devices, electronic paper, and other devices related to colored images, are known. In an embodiment, it can be utilized.

  Hereinafter, the present invention will be described in more detail with reference to examples. Unless otherwise specified, “%” and “parts” in the examples are% by mass and parts by mass.

Synthesis example 1
After introducing 182 g of propylene glycol monomethyl ether acetate into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen introduction tube, and changing the atmosphere in the flask from air to nitrogen, the temperature was raised to 100 ° C., 70.5 g (0.40 mol) of benzyl methacrylate, 43.0 g (0.5 mol) of methacrylic acid, 22.0 g (0.10 mol) of monomethacrylate having a tricyclodecane skeleton (FA-513M manufactured by Hitachi Chemical Co., Ltd.) ) And 136 g of propylene glycol monomethyl ether acetate, a solution obtained by adding 3.6 g of azobisisobutyronitrile to the flask was dropped from the dropping funnel over 2 hours, and stirring was continued at 100 ° C. for 5 hours. Next, the atmosphere in the flask was changed from nitrogen to air, and 35.5 g of glycidyl methacrylate [0.25 mol, (50 mol% with respect to the carboxyl group of methacrylic acid used in this reaction)], trisdimethylaminomethylphenol, 0.5%. 9 g and 0.145 g of hydroquinone were charged into the flask, and the reaction was continued at 110 ° C. for 6 hours to obtain a resin solution B1 having a solid content acid value of 79 mgKOH / g. The weight average molecular weight in terms of polystyrene measured by GPC was 13,000, and the molecular weight distribution (Mw / Mn) was 2.1.

Synthesis example 2
250 parts of propylene glycol monomethyl ether acetate was introduced into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a gas introduction tube. Thereafter, nitrogen gas was introduced into the flask using a gas introduction tube, and the atmosphere in the flask was replaced with nitrogen gas. Thereafter, the temperature of the solution in the flask was raised to 100 ° C., and then a mixture comprising 152.6 parts of benzyl methacrylate, 41.7 parts of methacrylic acid, 1.5 parts of azobisisobutyronitrile and 150 parts of propylene glycol monomethyl ether acetate. Was added dropwise to the flask using a dropping funnel over 2 hours. After completion of the addition, stirring was further continued at 100 ° C. for 2.5 hours. The weight average molecular weight Mw was 2.3 × 10 ⁴ and the solid content was 34% by mass. A resin solution B2 having a solution acid value of 47 mg-KOH / g was obtained.

The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the resin obtained in the synthesis example were measured under the following conditions using the GPC method.
Apparatus; K2479 (manufactured by Shimadzu Corporation)
Column; SHIMADZU Shim-pack GPC-80M
Column temperature: 40 ° C
Solvent; THF (tetrahydrofuran)
Flow rate: 1.0 mL / min
Detector; RI
The polystyrene-converted weight average molecular weight and number average molecular weight ratio (Mw / Mn) obtained above was defined as molecular weight distribution.

Example 1
[Preparation of colored photosensitive composition]
Pigment: C.I. I. Pigment Green 58 51 parts Acrylic pigment dispersant 10 parts Resin solution B2 (solid content conversion) 20 parts Propylene glycol monomethyl ether acetate 267 parts are mixed, and pigment dispersion A in which the pigment is sufficiently dispersed using a bead mill,
Pigment: C.I. I. Pigment Yellow 138 81 parts Acrylic Pigment Dispersant 12 parts Resin Solution B2 (solid content conversion) 28 parts Propylene Glycol Monomethyl Ether Acetate 402 parts Pigment Dispersion Liquid B in which pigment is sufficiently dispersed using a bead mill,
Pigment: C.I. I. Pigment Green 7 29 parts Acrylic pigment dispersant 5.7 parts Resin solution B2 (solid content conversion) 11 parts Propylene glycol monomethyl ether acetate 173 parts are mixed, and pigment dispersion C in which pigment is sufficiently dispersed using a bead mill ,
Resin: 66 parts of resin solution B1 (solid content conversion),
Polymerizable compound: Dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.) 57 parts,
Polymerization initiator: 2-dimethylamino-1- (4-morpholinophenyl) -2-benzylbutan-1-one (Irgacure 369; manufactured by BASF Japan Ltd.) 15 parts,
Polymerization initiation aid: 4,4'-bis (diethylamino) benzophenone
(EAB-F; manufactured by Hodogaya Chemical Co., Ltd.) 4.9 parts,
Solvent: 450 parts of propylene glycol monomethyl ether acetate, and additive: Sumitomo Epoxy ESCN-195XL (manufactured by Sumitomo Chemical Co., Ltd.) 6.1 parts were mixed to obtain a colored photosensitive composition.

Comparative Example [Preparation of colored photosensitive composition]
Pigment: C.I. I. Pigment Green 36 5.5 parts Pigment: C.I. I. Pigment Yellow 150 2.4 parts Polyester pigment dispersant 1.2 parts Propylene glycol monomethyl ether acetate 38 parts are mixed, followed by a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill.
Resin: Resin solution B1 (solid content conversion) 6.6 parts Polymerizable compound: Dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.) 5.7 parts Polymerization initiator: 2-dimethylamino-1- (4- Morpholinophenyl) -2-benzylbutan-1-one (Irgacure 369; manufactured by BASF Japan Ltd.) 1.5 parts Polymerization initiation aid: 4,4′-bis (diethylamino) benzophenone
(EAB-F Hodogaya Chemical Co., Ltd.) 0.49 parts Additive: Sumiepoxy ESCN-195XL (Sumitomo Chemical Co., Ltd.) 0.61 parts Solvent: Propylene glycol monomethyl ether acetate 38 parts is mixed and colored A photosensitive composition was obtained.

<Pattern preparation>
A PET film (Toray Lumirror 75-T60) was bonded onto a 2-inch square glass plate to prepare a substrate. The colored photosensitive composition was applied on the PET film side of the substrate by spin coating, and prebaked at 80 ° C. for 2 minutes on a hot plate. After standing to cool, the distance between the substrate coated with the colored photosensitive composition and the quartz glass photomask was set to 10 μm, and an exposure machine (TME-150RSK; manufactured by Topcon Co., Ltd.) was used in an air atmosphere at 200 mJ / Light was irradiated with an exposure dose of cm ² (365 nm reference). In addition, irradiation to the colored photosensitive composition at this time was performed by passing the radiated light from the ultrahigh pressure mercury lamp through an optical filter (UV-35; manufactured by Asahi Spectroscopic Co., Ltd.). As the photomask, one having a 10 to 100 μm line and space pattern was used. After irradiation with light, the film was immersed in a 0.1% tetramethylammonium aqueous solution at 23 ° C. for 80 seconds for development, and washed with pure water to form a pattern. When the film thickness of the obtained pattern was measured using a film thickness measuring device (DEKTAK3; manufactured by Nippon Vacuum Technology Co., Ltd.), it was 2 μm.
The pattern formed in the same manner as described above was further heated (post-baked) at 50 ° C. for 5 minutes to obtain a cured pattern. Further, the pattern formed in the same manner as described above was further heated (post-baked) at 100 ° C. for 5 minutes to obtain a cured pattern. When the film thickness of the obtained cured pattern was measured in the same manner as described above, all were 2 μm.

<Color performance evaluation>
The spectrum of the obtained pattern was measured for transmittance (T1) at 600 nm and transmittance (T2) at 520 nm using a microspectrophotometer (OSP-SP200 manufactured by OLYMPUS). The smaller the ratio of T1 to T2 (T1 / T2), the higher the color separation ability with the red filter, which is preferable. The results are shown in Table 1.

<Solvent resistance evaluation>
1 ml of propylene glycol monomethyl ether acetate was dropped on the pattern formed on the substrate, and after standing still for 30 seconds, the spin coater was used to rotate at 1000 rpm for 10 seconds, and the propylene glycol monomethyl ether acetate on the pattern was shaken off. .
The film thickness retention was calculated by the following formula from the film thickness values measured before and after contact with propylene glycol monomethyl ether acetate. The higher the film thickness retention, the better the curability, and the elution into the solvent contained in the colored photosensitive composition is suppressed when the colored photosensitive composition other than green is overcoated. When manufacturing, color mixing (mixing) can be prevented. The results are shown in Table 2.

(Thickness retention) (%) = (film thickness after contact) / (film thickness before contact)

<Resolution evaluation>
The obtained pattern was observed with a laser microscope (manufactured by Axio Imager MAT Carl Zeiss), and the minimum dimension resolved was taken as the resolution. The higher the resolution, the higher definition color filter can be produced. The results are shown in Table 2.

  According to the colored photosensitive composition of the present invention, a green color filter excellent in color separation ability with a red filter can be obtained.

Claims (5)

Colorants, polymerizable compounds, include a polymerization initiator and a solvent, colorant, and halogenated copper phthalocyanine pigment, a halogenated zinc phthalocyanine pigment, a colored photosensitive composition is a colorant and a quinophthalone pigment A copper halide phthalocyanine pigment is C.I. I. Pigment Green 7 and the quinophthalone pigment is C.I. I. Pigment Yellow 138, wherein the content of the quinophthalone pigment is 50 parts by mass or more and 200 parts by mass or less with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment .   The colored photosensitive composition according to claim 1, wherein the content of the halogenated copper phthalocyanine pigment is 20 parts by mass or more and 150 parts by mass or less with respect to 100 parts by mass of the content of the halogenated zinc phthalocyanine pigment.   The content of the halogenated copper phthalocyanine pigment is 20 parts by mass or more and 150 parts by mass or less with respect to the content of the halogenated zinc phthalocyanine pigment of 100 parts by mass, and the content of the quinophthalone pigment is that of the zinc halide phthalocyanine pigment. The colored photosensitive composition according to claim 1, wherein the content is from 50 parts by mass to 200 parts by mass with respect to 100 parts by mass of the content. The colored photosensitive composition according to any one of claims 1 to 3 , comprising a colorant, a polymerizable compound, a polymerization initiator, a solvent and a resin. The color filter formed with the coloring photosensitive composition in any one of Claims 1-4 .