TW201340240A - Substrate processing device and method - Google Patents

Abstract

The present invention provides a substrate processing device and a method capable of providing a film of processing liquid with uniform thickness on the whole area of a substrate. The device of the present invention provides processing liquid to a substrate for forming a film of the processing liquid on the substrate. The device includes a processing chamber for processing the substrate. The processing chamber includes a casing formed along an opening for movement in the substrate, and a door assembly accessory for adjusting an opening width along a horizontal direction of the opening. The door assembly accessory includes a row of doors arranged along the horizontal direction of the opening, wherein the doors are driven respectively.

Description

Substrate processing apparatus and method

The present invention relates to a substrate processing apparatus and method, and more particularly to an apparatus and method for processing a substrate by supplying a processing liquid to a substrate.

In general, flat panel display manufacturing engineering requires various projects such as evaporation engineering, photographic engineering, etching engineering, and cleaning engineering. Among these, the photographic engineering is a process of forming a pattern on a substrate with a photosensitive film before etching. Photographic engineering is a coating process in which a photosensitive film is coated on a substrate, an exposure process in which a pattern formed by a mask is transferred onto a photosensitive film, and a light-irradiated region or an opposite region is selectively removed by a photosensitive film. The development project consists of. Among these, it is important to form a film of the developer on the substrate in a uniform thickness in the development process.

In general, the substrate processing apparatus is connected in series to a plurality of processing chambers having a transfer unit therein, and the substrate is sequentially moved to the processing chamber, and a series of processes such as development engineering and cleaning work are sequentially performed. In the processing chambers of the processing chambers, the processing chamber for supplying the developing solution on the substrate is internally provided with a nozzle having a length corresponding to the width of the substrate perpendicular to the conveying direction of the substrate (200 of FIG. 2). The developer is supplied to the entire area of the substrate by the substrate moving in the processing chamber. Fig. 1 is a schematic view showing a processing chamber 100 for performing a development process. In the front wall 102 and the rear wall (not shown) of the processing chamber 100, an opening 120 as a passage function for the entry and exit of each substrate 10 is provided. Generally, the opening 120 is provided in a rectangular shape.

However, in the case where the development process is performed in the processing chamber 100 of FIG. 1, the side regions 122 of the opening 120 of FIG. 2 and the edge regions 12 of the adjacent substrate 10 are formed with a relatively thin developing solution as compared with other regions. Film 300. Therefore, the development uniformity in the edge region 12 of the substrate 10 is lowered.

[Advanced technical literature]

[Patent Literature]

[Patent Document 1] Japanese National Patent Publication No. 2010-520621

Embodiments of the present invention provide a substrate processing apparatus and method for providing a film of a processing liquid in a uniform thickness over the entire area of the substrate.

Further, an embodiment of the present invention provides a substrate processing apparatus and method capable of controlling the velocity of a gas stream flowing in through an opening and exit of a substrate in a region in the processing chamber.

The problem to be solved by the present invention is not limited thereto, and other problems that are not mentioned may be clearly understood from the following description.

According to an embodiment of the present invention, a substrate processing apparatus can be provided. The substrate processing apparatus includes: an outer casing having an opening for loading into the substrate; a nozzle provided by the outer casing to supply the processing liquid to the substrate; and a door fitting for adjusting an opening width of the opening; the door fitting A plurality of doors provided side by side in the lateral direction of the opening, and a driver that moves at least one of the doors in the up and down direction.

The opening has a rectangular shape, and each of the doors has a rectangular shape. Further, the substrate has a rectangular plate shape, and the nozzle corresponds to a lateral direction and a parallel side of the opening in the side of the substrate, or further has a long length, and a lateral direction of the nozzle is transverse to the opening The directions are provided in parallel. A transfer unit that transports the substrate is provided in the processing chamber.

The plurality of doors are individually coupled to the actuators on the respective doors in an independently driveable manner. The plurality of doors have a central door located in a central region in a lateral direction of the opening, a first side portion located at a side of the opening, and a second side portion located at the The side of the opening.

According to an embodiment of the present invention, the driver includes a central driver that drives the center door, a first side driver that drives the first side, and a second side driver that drives the second side.

According to another embodiment of the present invention, the driver includes a central driver that drives the center door and simultaneously drives the side driver of the first side unit and the second side unit.

According to another embodiment of the present invention, a substrate processing apparatus can be provided, comprising: an outer casing having an opening for loading into the substrate; a nozzle provided by the outer casing to supply the processing liquid to the substrate; and adjusting the opening of the opening a door assembly for width; the door assembly includes: a door having a length corresponding to a length of the opening, and a driver for driving the door to move up and down; the door having the above The door moves in the up-down direction, and the opening width of the opening along the lateral direction of the opening is different.

According to an embodiment of the invention, the opening is substantially rectangular, and the door is provided with a height of a lower end of the both side portions being higher than a height of a lower end of the central portion thereof.

According to another embodiment of the present invention, a substrate processing apparatus including: an outer casing having an opening into which a substrate is loaded; and a nozzle provided in the outer casing to supply a processing liquid to the substrate; The lateral direction is provided in such a manner that the width in the vertical direction is different.

The opening is provided by the height of the upper end of the both side regions being higher than the height of the upper end of the central portion.

Further, the present invention provides a substrate processing method. According to the above method, the processing liquid is supplied to the substrate in the case having the opening into which the substrate is loaded, and the substrate is processed, and the substrate is processed in a state in which the opening width of the upper and lower openings in the lateral direction of the opening is different.

According to an embodiment of the invention, the opening is provided in such a manner that the lateral portion thereof has a larger opening width than the central portion thereof in the lateral direction. On both sides of the above opening The opening width of the area is provided in a different way.

According to an embodiment of the invention, a plurality of doors are provided along the lateral direction of the opening, the height of at least one of the doors is adjusted, and the opening width of the opening is adjusted.

The above treatment liquid developer.

The substrate has a rectangular plate shape, and the nozzle has a length longer than a side parallel to a lateral direction of the opening among the sides of the substrate, and a lateral direction of the nozzle is parallel to a lateral direction of the opening.

According to an embodiment of the present invention, a film of the treatment liquid can be provided in a uniform thickness over the entire area of the substrate.

Further, according to an embodiment of the present invention, it is possible to adjust the speed of the airflow flowing in through the opening and exit of the substrate in the area of the processing chamber.

Further, according to the embodiment of the present invention, the development uniformity can be improved over the entire area of the substrate.

10‧‧‧Substrate

12‧‧‧Edge area

14‧‧‧Central area

16‧‧‧Horizontal

18‧‧‧ longitudinal

20‧‧‧Substrate processing unit

100‧‧‧Processing room

102‧‧‧ front wall

120‧‧‧ openings

122‧‧‧Side areas

300‧‧‧ nozzle

700‧‧‧ Controller

500‧‧‧Transport unit

520‧‧‧ mechanical shaft

540‧‧‧roll

560‧‧‧ Drive Department

562‧‧‧ round

564‧‧‧Land

566‧‧‧Motor

1000‧‧‧Processing room

1001‧‧‧Processing Room

1002‧‧‧Battery room

1200‧‧‧ Shell

1202‧‧‧ front wall

1204‧‧‧ Rear wall

1205‧‧‧ side wall

1206‧‧‧ side wall

1207‧‧‧ upper wall

1208‧‧‧ lower wall

1212‧‧‧Exhaust port

1220‧‧‧ openings

1222‧‧‧Broadside

1223‧‧‧Long side

1224‧‧‧Central area

1230‧‧‧ openings

1400‧‧‧ nozzle

1600‧‧‧door fittings

1620‧‧‧

1624‧‧‧1st outside door

1622‧‧‧ inside door

1626‧‧‧2nd outer door

1627‧‧‧Broadside

1628‧‧‧Long side

1640‧‧‧ drive

1644‧‧‧ drive

1642‧‧‧ drive

1646‧‧‧ drive

1901‧‧‧Exhaust line

1903‧‧‧ pump

2000‧‧‧Processing room

2600‧‧‧door fittings

2620‧‧‧

3000‧‧‧Processing room

3600‧‧‧door fittings

3622‧‧‧ inside door

3624‧‧‧Inside drive

3626‧‧‧2nd outer door

3640‧‧‧ drive

3642‧‧‧Inside drive

3644‧‧‧Outside drive

4000‧‧‧Processing room

4200‧‧‧ Shell

4220‧‧‧ openings

4600‧‧‧door fittings

4620‧‧‧

4622‧‧‧Fixed door

4624‧‧‧Drive door

5000‧‧‧Processing room

5220‧‧‧ openings

5600‧‧‧door fittings

5620‧‧‧

5622‧‧‧ inside door

5624‧‧‧1st outside door

5626‧‧‧2nd outer door

6000‧‧‧Processing room

6220‧‧‧ openings

6600‧‧‧door fittings

6620‧‧‧

6640‧‧‧ drive

7000‧‧‧Processing room

7600‧‧‧door fittings

7620‧‧‧

8000‧‧‧Processing room

8220‧‧‧ openings

8600‧‧‧door fittings

9000‧‧ ‧ processing room

9220‧‧‧ openings

9600‧‧‧door fittings

10000‧‧ ‧ processing room

10220‧‧‧ openings

Fig. 1 is a perspective view showing an example of a general processing chamber.

Fig. 2 is a view showing a state of a film thickness of a treatment liquid formed on a substrate at the time of performing a development process in the processing chamber of Fig. 1.

Fig. 3 is a side view and a plan view showing a substrate processing apparatus according to an embodiment of the present invention.

Fig. 4 is a side view and a plan view showing a substrate processing apparatus according to an embodiment of the present invention.

Figure 5 is a perspective view of the nozzle of Figure 4.

Figure 6 is a perspective view of the processing chamber of Figure 3 performing the development process.

Fig. 7 is a view showing an example of an opening width of an opening in the lateral direction of the opening in the processing chamber of Fig. 6.

Figure 8 is a view showing the opening width of the opening in the lateral direction of the opening of the processing chamber of Figure 6 The schema of the example of degree.

Fig. 9 is a view showing a modification of the door fitting of Fig. 6.

Fig. 10 is a view showing a modification of the door fitting of Fig. 6.

Fig. 11 is a view showing a modification of the door fitting of Fig. 6.

Fig. 12 is a view showing a modification of the door fitting of Fig. 6.

Fig. 13 is a view showing another embodiment of the processing chamber of Fig. 6.

Fig. 14 is a view showing another embodiment of the processing chamber of Fig. 6.

Fig. 15 is a view showing another embodiment of the processing chamber of Fig. 6.

Fig. 16 is a view showing another embodiment of the processing chamber of Fig. 6.

Fig. 17 is a view showing another embodiment of the processing chamber of Fig. 6.

Hereinafter, a substrate processing apparatus according to a preferred embodiment of the present invention will be described in detail with reference to the attached drawings. In the course of the present invention, a detailed description of the related well-known components or functions will be omitted when it is determined that the gist of the present invention is not clear.

In the present embodiment, the substrate processing apparatus performs development processing on the substrate 10. However, the technical idea of the present invention is not limited to this, and can be applied to various kinds of processes for supplying a film of a treatment liquid forming treatment liquid onto the substrate 10.

Further, in the present embodiment, the substrate 10 is described as an example of a rectangular substrate 10 used for manufacturing a display device. However, the type of the substrate 10 is not limited thereto, and the substrate 10 is a substrate 10 having a variety of plate shapes such as a semiconductor wafer.

3 and 4 are views showing a substrate processing apparatus 20 according to an embodiment of the present invention. 3 is a view showing a side surface of the substrate processing apparatus 20, and FIG. 4 is a view showing a plane of the processing chamber 1000 in which the development process is performed in the processing chamber 1000 of FIG.

Referring to FIGS. 3 and 4, the substrate processing apparatus has a plurality of processing chambers 1000 and a transport unit 500. A plurality of processing chambers 1000 and 1001 perform a designated project even for each of the substrates 10. For example, one of the processing chambers is a processing chamber that performs development engineering. 1000, another one of the processing chambers is a processing chamber 1001 that performs a cleaning process. The cleaning process can be performed even for the substrate 10 which is completed by the development process. Further, the processing chamber 1000 can provide the carrier chamber 1002 that transports the substrate 10 from the outside and transports the substrate 10 to the processing chamber 1000.

In the present embodiment, the substrate 10 has a lateral side 16 and a longitudinal side 18. The lateral side 16 of the substrate 10 is a side parallel to the transport direction of the substrate 10, and the vertical side 18 is a side perpendicular to the transport direction of the substrate 10.

The transport unit 500 transports the substrate 10 between the carrier chamber 1002 and the processing chamber 1000 and between the processing chambers 1000 and 1001. For example, the transport unit 500 has a plurality of mechanical shafts 520, rollers 540, and drive portions 560. The mechanical shaft 520 is provided into the carrier chamber 1002 and the processing chambers 1000, 1001. The mechanical shafts 520 are parallel to each other and are disposed at the same height. The mechanical shaft 520 in the processing chambers 1000 and 1001 is provided from a position adjacent to the substrate 10 into the opening 1220 to a position adjacent to the substrate 10 carrying-out opening 1230. Each of the mechanical shafts 520 is fixedly coupled with a plurality of rollers 540 along its lateral direction. The mechanical shaft 520 is rotated by the drive unit 560 with reference to its central axis. The drive unit 560 has a wheel 562, a belt 564, and a motor 566. The wheel 562 is coupled to both ends of each of the mechanical shafts 520. The wheels 562, which are coupled to the mutually different mechanical shafts 520 and disposed adjacent to each other, are connected to each other by a belt 564. Any one of the wheels 562 incorporates a motor 566 that causes it to rotate. The mechanical shaft 520 and the roller 540 are rotated by the three-dimensional group of the wheel 562, the belt 564, and the motor 566, and the substrate 10 is linearly moved by the mechanical shaft 520 while the lower surface thereof is in contact with the roller 540. Each of the mechanical shafts 520 horizontally disposes the substrate 10 in a horizontal state.

The transport unit 500 is not limited to the above configuration. For example, the drive unit in the transport unit is provided in a structure that drives the mechanical shaft by magnetic force. Further, the transport unit may include a conveyor belt and transport the substrate 10. Further, the transport unit can carry out magnetic levitation of the substrate 10 on the track.

Next, the structure of the processing chamber 1000 on which the development process is performed will be described with respect to the substrate 10. Referring again to FIGS. 3 and 4, the processing chamber 1000 has a housing 1200 and a nozzle. 1400 and door fittings 1600.

The outer casing 1200 has a front wall 1202, a rear wall 1204, two side walls 1205, 1206, an upper wall 1207, and a lower wall 1208. The front wall 1202 and the rear wall 1204 are provided separately from each other along the conveying direction of the substrate 10. Two side walls 1205, 1206 can also be provided perpendicular to each front wall 1202. The front wall 1202, the rear wall 1204, the two side walls 1205 and 1206, and the lower wall 1208 are provided in a shape in which a substantially upper open rectangular parallelepiped is combined with each other. The upper wall 1207 has two inclined walls as shown in Fig. 6 with the central portion projecting from the upper portion. That is, the upper wall 1207 is provided in a triangular shape when viewed in a direction perpendicular to the front wall 1202. In this case, the outer casing 1200 has a substantially pentagonal shape when viewed in a direction perpendicular to the front wall 1202. In contrast, the upper wall 1207 is provided as a flat wall, and the outer casing 1200 has a substantially rectangular shape when viewed in a direction perpendicular to the front wall 1202.

Openings 1220 and 1230 are formed in the front wall 1202 and the rear wall 1204. The opening 1220 formed in the front wall 1202 is provided as a passage for carrying the substrate 10 into the outer casing 1200, and the opening 1230 formed in the rear wall 1204 is provided as a passage for carrying out the substrate 10 from the outer casing 1200. The opening 1220 formed in the front wall 1202 is provided in substantially the same size and shape as the opening 1230 formed in the rear wall 1204. For example, the opening 1220 is provided in a generally rectangular shape. The opening 1220 has a width side (1222 of FIG. 6) and a length side (1223 of FIG. 6). The wide side 1222 of the opening 1220 is the side in the up and down direction, and the long side 1223 of the opening 1220 is the side perpendicular to the direction in which the substrate 10 is transported.

An exhaust port 1212 is formed in the outer casing 1200. The exhaust port 1212 exhausts the smoke occurring within the outer casing 1200 and the atmosphere within the outer casing 1200 to the exterior of the outer casing 1200. An exhaust line 1901 is connected to the exhaust port 1212, and a pump 1903 for forcibly exhausting the smoke in the outer casing 1200 is disposed on the exhaust line 1901. For example, the exhaust port 1212 is formed in any one of the side walls 1205, 1206 of the outer casing 1200. The selective vent 1212 is provided to each of the two side walls 1205, 1206 of the outer casing 1200, or to the upper wall 1207 or the lower wall 1208.

The nozzle 1400 supplies the developer onto the substrate 10. FIG. 5 is a perspective view showing an example of the nozzle 1400. Referring to FIG. 5, the nozzle 1400 has a body 1420 and a supply developing solution 1440.

The body 1420 has a length that corresponds to the lateral side 16 of the substrate 10 or is only slightly longer than this. The main body 1420 is disposed such that its lateral direction is perpendicular to the conveying direction of the substrate 10. The upper region 1422 of the main body 1420 has a substantially rectangular parallelepiped shape, and the lower region 1424 has a shape that is elongated from the upper region 1422 in the downward direction, and the width gradually becomes narrower as it goes downward. A discharge port 1460 is formed at a lower end of the body 1420. The discharge port 1460 is provided long along the lateral direction of the body 1420. For example, the spout 1460 is provided with a crack. The length of the spout 1460 corresponds to the lateral side 16 of the substrate 10 or is only slightly longer than this.

The supply developing solution 1440 is provided to the inside of the body 1420. The supply developing solution 1440 has a damper 1444, an outflow passage 1446, and an inflow passage 1448. A bumper 1444 is provided to the interior of the body 1420. The bumper 1444 is provided long along the lateral direction of the body 1420. The inflow passage 1448 is extended from the damper 1444 to the crucible 1472 connected to the developer supply tube 1482. The outflow passage 1446 is formed in a direction below the buffer 1444 and extends from the buffer 1444 to the discharge port 1460. The length of the outflow passage 1446 is provided in a manner corresponding to the length of the discharge port 1460.

The nozzle 1400 is disposed substantially perpendicular to the substrate 10. The nozzle 1400 is selectively disposed to be inclined to the substrate 10. Two nozzles are selectively provided, one of which is disposed to be inclined with respect to the substrate 10, and the other of which is disposed perpendicular to the substrate 10.

The structure of the above-described nozzle 1400 is shown as an example, and the nozzle 1400 provides various shapes and configurations in a different manner.

The door fitting 1600 switches the opening 1220 of the loading substrate 10. The door fitting 1600 is provided in a configuration that can adjust the opening width of the opening 1220 in a lateral direction along the opening 1220. The opening width of the opening 1220 in the present embodiment means the extent to which the opening 1220 is opened in the vertical direction. For example, door fittings The side portion 1222 and the central portion 1224 of the 1600-type opening 1220 are provided to be adjusted so that the opening widths of the openings 1220 are different from each other.

FIG. 6 is a perspective view showing an example of the door fitting 1600 provided in the process chamber 1000. Referring to Figure 6, the door fitting 1600 has a plurality of doors 1620 and a plurality of drivers 1640. Doors 1620 are provided in a row along the transverse direction of opening 1220. Therefore, the opening 1220 adjusts the opening ratio by the door 1620 which is different from each other in the lateral direction. Each of the doors 1620 has a width side (1627) and a length side (1628). The wide side 1627 of the door 1620 is the side parallel to the wide side 1222 of the opening 1220, and the long side of the door 1620 is the side parallel to the long side 1623 of the opening 1220 of the 1628.

For example, the door 1620 provides three. Hereinafter, the door located at the center is referred to as an inner door 1622, and the door at the outer side is referred to as a first outer door 1624 and a second outer door 1626, respectively. The inner door 1622 adjusts the opening width of the central region 1224 of the opening 1220, and the first outer door 1624 and the second outer door 1626 adjust the opening width of the side portions 1222 of the respective openings 1220. The side region 1222 of the opening 1220 is the edge region of the opening 1220 when viewed in the lateral direction of the opening 1220. The open width in the side region 1222 of the opening 1220 affects the velocity of the airflow in the edge region 12 of the substrate 10 within the outer casing 1200.

The first outer door 1624 and the second outer door 1626 are provided in the same size in a mutually symmetrical manner. The inner door 1622 and the first outer door 1624 each have a rectangular shape. The inner door 1622 is provided to have a longer long side 1627 than the first outer door 1624. Further, the inner door 1622 is provided to be the same wide side 1228 as the first outer door 1624. However, the sizes of the long side 1227 and the wide side 1228 of the inner door 1622, the first outer door 1624, and the second outer door 1626 are not limited thereto, and may be changed in order to variously control the airflow in the processing chamber 1000. For example, the first outer door 1624 and the second outer door 1626 are provided to have long sides 1227 having different sizes from each other. Further, the inner door 1622, the first outer door 1624, and the second outer door 1626 are provided in such a manner as to have wide sides 1228 of different sizes from each other. for.

The driver 1640 moves the door 1620 in the up and down direction. Drivers 1640 in each of the doors 1620 are individually provided in a manner that the movement of the doors 1620 can be performed independently of each other. Thus, the side regions 1222 of the opening 1220 are provided in a different manner from the central region 1224 in terms of the open width. For example, the driver 1640 can have a motor or a cylinder. As described above, when three doors 1622, 1624, and 1626 are provided, three drivers 1642, 1644, and 1646 can be provided. Hereinafter, the driver 1640 that drives the inner door 1622, the first outer door 1624, and the second outer door 1626 will be referred to as an inner driver 1642, a first outer driver 1644, and a second outer driver 1646, respectively.

The controller 700 controls the transport unit 500, the nozzle 1400, and the driver 1640. Specifically, the controller 700 adjusts the rotational speed of the mechanical shaft 520 in order to adjust the transfer speed of the substrate 10. Further, the controller 700 can control the nozzle 1400 in order to adjust the discharge timing and the discharge amount of the developer. In addition, the controller 700 controls the driver 1640 that moves the door 1620 in order to adjust the open width of the opening 1220.

As shown in FIG. 1, when the opening 1220 is opened at the same height in the lateral direction, the film thickness of the developer in the edge region of the substrate 10 carried in the processing chamber 1000 through the side portion of the opening 1220 is as shown in FIG. The figure is relatively thin compared to other areas. One of the reasons is that the velocity of the airflow flowing into the processing chamber 1000 through the side region 1222 of the opening 1220 is faster than the velocity of the airflow flowing into the processing chamber 1000 through the central region 1224 of the opening 1220, whereby the substrate 10 is The developer in the edge region 12 is relatively more scattered than the central region 14.

According to the experiment, if the central region 1224 of the opening 1220 is opened at a certain width or more, the airflow in the central region 14 of the substrate 10 has a small influence on the thickness of the film of the developer. On the contrary, when the width of the opening 1220 opened in the side portion 1222 of the opening 1220 becomes larger, the velocity of the airflow in the edge region 12 of the substrate 10 becomes slow, and the problem that the thickness of the film of the developer becomes thin becomes large. Reduced.

FIG. 7 is an illustration showing the opening width of the opening 1220 when the developer is supplied to the substrate 10. example.

According to Fig. 7, the controller (700 of Fig. 3) faces the inner driver 1642, the first outer driver 1644, and the second outer side such that the opening width h1 of the both side portions of the opening 1220 is larger than the opening width H2 of the central portion. The drive 1646 performs control. Further, the controller 700 controls the first outer driver 1644 and the second outer driver 1646 such that the opening widths h1 of the both side regions of the opening 1220 are identical to each other.

The controller (700 of FIG. 3) selectively controls the first outer driver 1644 and the second outer driver 1646 so that the opening widths h3 and h4 of the both side regions of the opening 1220 are different from each other as shown in FIG. 8. For example, when the exhaust port 1212 is provided in any of the side walls of the outer casing 1200, the speeds of the airflows in the side edge regions 12 of the substrate 10 sometimes differ from each other. In this case, the controller 700 adjusts the opening widths h3 and h4 of the both side portions of the opening 1220 so as to be different from each other in the edge region 12 of the substrate 10 so that the film thickness of the developer is the same.

Further, various other components may be provided in the processing chamber 1000 in addition to the transfer unit 500 and the nozzle 1400. With these components or other factors, the airflow inside the processing chamber 1000 may vary depending on the area. Therefore, the controller 700 can variously adjust the opening widths of the inner door 1622, the first outer door 1624, and the second outer door 1626 in accordance with the thickness of the film of the developer in each region of the substrate 10.

Next, various modifications of the door fitting will be described with reference to Figs. 9 to 12 . The processing chamber of Figures 9 through 12 excludes the door assembly substantially having a configuration similar to the processing chamber 1000 of Figure 6.

As with the processing chamber 2000 of FIG. 9, a plurality of numbers of doors 2620 can be provided in the door fitting 2600. For example, the door 2620 can provide two or more different from the embodiment of FIG. For example, the door fitting 2600 can have five doors 2620.

Further, as in the processing chamber 3000 of Fig. 10, a part of the door is simultaneously driven by one driver. For example, the driver 3640 in the door fitting 3600 has a drive inside The inner driver 3642 of the door 3622 drives the first outer door 3624 and the second outer door 3626 to the outer side driver 3644 at the same time.

Further, in the process chamber 4000 of FIG. 11, in the door fitting 4600, the door 4620 has a fixed door 4622 and a drive door 4624. The fixed door 4622 is fixed to a certain area of the opening 4220 and is also fixedly provided with a casing 4200 so as to cover only one of the widths of the opening 4220. The driver 4640 is only coupled to the driving door 4624. The drive door 4624 is moved up and down by the driver 4640. For example, the central portion of the opening 4220 is provided with a fixed door 4622, and the drive door 4624 is disposed at both side portions of the opening 4220. The fixed door 4622 is disposed in the opening 4220 so as to block one of the upper regions thereof. The portion of the fixed door 4622 illustrated in Fig. 11 is provided with a driver 4640, and the two fixed doors 4622 are driven by a single driver.

Further, as shown in the process chamber 5000 of Fig. 12, a part of the door 5620 in the door fitting 5600 is provided in such a manner that the lower end is inclined. For example, the lower end of the inner door 5622 is horizontally provided, and the first outer door 5624 and the lower end of the second outer door 5626 are provided in an inclined manner. In this case, the first outer door 5624 and the lower end of the second outer door 5626 are provided farther from the inner door 5622, and are inclined upward. The opening 5220 is provided in such a manner that the farther the central region is, the more the opening width gradually becomes larger.

In the case of using the door fitting of FIG. 6 and FIG. 9 to FIG. 12, in different manners, the opening width of the opening can be varied, and depending on the area of the substrate 10, the different areas are opened according to the state of the thickness of the film of the developing solution. The opening width is varied in various ways.

Fig. 13 and Fig. 14 are views showing other embodiments of the respective processing chambers. The processing chambers 6000, 7000 of Figures 13 and 14 have a configuration substantially similar to that of the processing chamber 1000 of Figure 6, in addition to the door fittings 6600, 7600. The opening 6220 of the outer casing 6200 in the processing chamber 6000 of Fig. 13 is provided in a substantially rectangular shape. The door fitting 6600 has a door 6620 and a driver 6640. The door 6620 is provided in a manner that is different in width in the lateral direction thereof. For example, the upper end of the door 6620 is provided at the same height along its lateral direction, and the lower end of the door 6620 is provided in a stepped manner. For example, the height of the lower end of the door 6620 in the two side regions is higher than the height of the lower end of the central region And provide. The door 6620 is provided with the same height at the lower end of the both side regions. Unlike this, the door 6620 is provided in such a manner that the heights of the lower ends of the both side regions are different from each other. Alternatively, as in the processing chamber 7000 of Fig. 14, the door 7620 is provided in such a manner that the higher the height of the lower end of the both side regions is from the central region, the progressively higher.

Fig. 15 and Fig. 16 are perspective views showing other embodiments of the respective processing chambers. The processing chambers 8000, 9000 of Figures 15 and 16 have a configuration substantially similar to the processing chamber 1000 of Figure 6 except for the shape of the openings 8220, 9220 and the door fittings 8600, 9600. The opening 8220 in the processing chamber 8000 of Fig. 15 is provided along the width of the lateral direction to be different. For example, the lower end of the opening 8220 is provided at the same height along its lateral direction, and the upper end of the opening 8220 is provided in a stepped manner. For example, the opening 8220 is provided at a height above the upper end of the both side regions that is higher than the height of the upper end of the central region. Further, the opening 8220 is provided in such a manner that the heights of the upper ends of the both side regions are different from each other. Alternatively, as in the processing chamber 9000 of FIG. 16, the door 9620 is provided as the height of the upper end in the both side regions becomes higher in the central region, gradually becoming higher.

The processing chamber of Figs. 13 to 16 utilizes only one door and can change the opening width of the opening, so that the apparatus is simpler in construction than the processing chambers of other embodiments. In Figs. 13 to 16, the opening width in the central portion of the opening is smaller than the opening width in the region on both sides of the opening as an example. However, depending on the flow direction of the airflow in the processing chamber and the film thickness of the developer in different regions of the substrate 10, the shape of the door and the opening can be variously changed by providing various opening widths depending on the region in the lateral direction of the opening.

Fig. 17 is a view showing another embodiment of the processing chamber. In the processing chamber 10000 of Fig. 17, the opening 10220 has other opening widths in the vertical direction as shown in Fig. 15 along the lateral direction thereof. However, the door fitting is not provided in the processing chamber 10000 of Fig. 17, and the opening 10220 can be constantly maintained in an open state.

In the above example, the opening of the substrate 10 and the door fitting for adjusting the opening width of the opening have been described. The door fitting for adjusting the opening width of the opening of the substrate and the opening thereof can also provide the same configuration.

The above description does not depart from the scope of exemplifying the technical idea of the present invention, and therefore, various modifications can be made without departing from the nature of the invention. And deformation. Therefore, the embodiments of the present invention are not intended to limit the scope of the technical idea of the present invention. The scope of the present invention is to be construed as being limited by the scope of the appended claims.

10‧‧‧Substrate

12‧‧‧Edge area

14‧‧‧Central area

1000‧‧‧Processing room

1205‧‧‧ side wall

1206‧‧‧ side wall

1220‧‧‧ openings

1222‧‧‧Broadside

1223‧‧‧Long side

1224‧‧‧Central area

1620‧‧‧

1624‧‧‧1st outside door

1622‧‧‧ inside door

1626‧‧‧2nd outer door

1627‧‧‧Broadside

1628‧‧‧Long side

1640‧‧‧ drive

1644‧‧‧ drive

1642‧‧‧ drive

1646‧‧‧ drive

Claims (19)

A substrate processing apparatus for processing a substrate, comprising: an outer casing having an opening for loading into the substrate; a nozzle provided by the outer casing to supply the processing liquid to the substrate; and a door fitting for adjusting the above The opening width of the opening; the door fitting has a plurality of doors provided side by side in the lateral direction of the opening, and a driver for moving at least one of the doors upward and downward. The substrate processing apparatus according to claim 1, wherein the opening has a rectangular shape, and each of the doors has a rectangular shape. The substrate processing apparatus according to claim 1, wherein the substrate has a rectangular plate shape, and the nozzle corresponds to a lateral direction and a parallel side of the opening in a side of the substrate, or further has a length The length of the nozzle is provided in parallel with the lateral direction of the opening. The substrate processing apparatus according to claim 1, further comprising: a transport unit that transports the substrate in the processing chamber. The substrate processing apparatus according to any one of claims 1 to 4, wherein the plurality of gates individually drive the actuators on the respective doors so as to be independently driveable. The substrate processing apparatus according to any one of claims 1 to 4, wherein the plurality of doors have a central door which is located in a central portion of the opening in a lateral direction, a first side The department is located at a side of one of the openings and a second side of the door, which is located on the side of the opening. The substrate processing apparatus according to claim 6, wherein the driver includes: a central driver that drives the central door; A first side driver for driving the first side unit and a second side driver for driving the second side unit. The substrate processing apparatus according to claim 6, wherein the driver includes a central driver that drives the center door, and a side driver that simultaneously drives the first side unit and the second side unit. A substrate processing apparatus for processing a substrate, comprising: an outer casing having an opening for loading the substrate; a nozzle provided by the outer casing to supply the processing liquid to the substrate; and a door for adjusting an open width of the opening The door fitting includes: a door having a door having a length corresponding to the length of the opening, and a driver for driving the door to move up and down; wherein the door has The door moves in the up-and-down direction, and the opening width of the opening along the lateral direction of the opening is different. The substrate processing apparatus according to claim 9, wherein the opening is substantially rectangular, and the door is provided with a height of a lower end of the both side regions being higher than a height of a lower end of the central portion. A substrate processing apparatus for processing a substrate, comprising: an outer casing having an opening for loading into the substrate; and a nozzle provided by the outer casing to supply a processing liquid to the substrate; wherein the opening is along the horizontal direction thereof The direction is provided in a manner that the width is different in the up and down direction. The substrate processing apparatus according to claim 11, further comprising a door assembly for adjusting an opening width of the opening. The substrate processing apparatus according to claim 11 or 12, The opening is provided by the height of the upper end of the both side regions being higher than the height of the upper end of the central portion. A substrate processing method is a method of processing a substrate by supplying a processing liquid to a substrate in an outer casing having an opening into which the substrate is loaded, and processing the substrate in a state in which an opening width of the upper and lower openings in the lateral direction of the opening is different. The substrate processing method according to claim 14, wherein the opening is provided in such a manner that a side portion thereof in the lateral direction is larger than an opening width of the central portion thereof. The substrate processing method according to claim 15, wherein the opening widths of the both side portions of the opening are provided differently from each other. The substrate processing method according to any one of claims 14 to 16, wherein a plurality of doors are provided along a lateral direction of the opening, and a height of at least one of the doors is adjusted and adjusted The open width of the above opening. The substrate processing method according to any one of claims 14 to 16, wherein the processing liquid is a developing solution. The substrate processing method according to claim 16, wherein the substrate has a rectangular plate shape, and the nozzle has a length longer than a side parallel to a lateral direction of the opening among the sides of the substrate, and the nozzle The lateral direction is parallel to the lateral direction of the opening.