TW201334875A - Coating method, coating device and manufacturing method and manufacturing device for components of a display - Google Patents

Coating method, coating device and manufacturing method and manufacturing device for components of a display Download PDF

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Publication number
TW201334875A
TW201334875A TW102105236A TW102105236A TW201334875A TW 201334875 A TW201334875 A TW 201334875A TW 102105236 A TW102105236 A TW 102105236A TW 102105236 A TW102105236 A TW 102105236A TW 201334875 A TW201334875 A TW 201334875A
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Taiwan
Prior art keywords
gas
coating
applicator
gas discharge
supply
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TW102105236A
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Chinese (zh)
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TWI561312B (en
Inventor
Keiji Hayashida
Hiroshi Kawatake
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Toray Industries
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Priority claimed from JP2006165631A external-priority patent/JP5023565B2/en
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Publication of TWI561312B publication Critical patent/TWI561312B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells

Abstract

This invention is related to a coating method and a coating device for efficiently exhausting the gas which invades into a coating device of a die coator for coating a surface of a glass substrate. And this invention is also related to a manufacturing method and a manufacturing device of a material for a display using the coating method and the coating device. By utilizing the coating method and the coating device of this invention, a gas exhaust route connected to a gas outlet of the coating device is placed at approximately the same as the gas outlet or lower than the gas outlet. Furthermore, an exit of a gas supply route is lower than the gas outlet. Furthermore, an exit of the gas exhaust route is placed lower than the outlet. By supplying liquid from a liquid supply means, opening a switching valve of the gas supply route and exhausting coating liquid mixed with that gas from the gas outlet, the hydraulic pressure of height difference from an uppermost part and a lowermost part would not be resistance, and the siphon principle could be used for promoting the gas exhaust, so that the gas can be efficiently exhausted in a short time. Moreover, after supplying the gas whose capacity is more than a constant amount from the gas supply route connected with either of the coating device, the liquid supply route or the gas exhaust route to the manifold of the coating device, integrating minute gas into gas area formed internally and erasing the minute gas, the supplied gas is exhausted outside of the coating device with a small amount of coating liquid, so that the minute gas which is hard to exhaust is efficiently and surely exhausted outside in a short time. In addition, by utilizing the coating device wherein the sectional area of the manifold in the direction of the coating width is being decreased from an intake to the gas outlet and an upper edge of the manifold is parallel with an outlet plane including the outlet or tilts upward from the intake to the gas outlet on a basis of the outlet plane, the flow velocity of the coating liquid in the manifold from the intake to the gas outlet is high even if the coating device enlarges, the gas in the manifold moves rapidly toward the gas outlet and the movement of the gas is not disturbed by the tilt of the upper edge of the manifold, so that the gas could be efficiently and surely exhausted outside in a short time.

Description

塗布方法與塗布裝置以及顯示用構件之製造方法與製造裝置 Coating method and coating device, and manufacturing method and manufacturing device for display member

本發明係使用於例如彩色液晶顯示器用濾色器及陣列基板、電漿顯示器用面板、及光學濾片等之製造領域。更詳言之,本發明係有關一種可將侵入於用在玻璃基板等之被塗布構件表面塗布塗布液的塗布模具(die coater)之塗布器內部的氣體有效率地排出之塗布方法及塗布裝置、以及使用利用此等之顯示器用構件的製造方法及製造裝置。 The present invention is used in, for example, a color filter for color liquid crystal displays, an array substrate, a panel for a plasma display panel, and an optical filter. More specifically, the present invention relates to a coating method and a coating apparatus capable of efficiently discharging gas inside an applicator of a die coater which is applied to a surface of a member to be coated such as a glass substrate or the like. And a manufacturing method and manufacturing apparatus using the display member using these.

由濾色器、陣列基板等所構成之彩色液晶顯示器,大多包含有於屬被塗布構件的玻璃基板之表面塗布低黏度的液體材料並使乾燥之所謂形成塗布膜的製造工程。例如,在濾色器之製造工程中,於玻璃基板上形成黑色之光阻材的塗布膜,利用微影術(photolithography)將塗布膜加工成格子狀,並於此格子間利用同樣的微影術而依序形成紅色、藍色、綠色之光阻材的塗布膜。除了濾色器的製造工程以外,還有塗布用以形成注入於濾色器和陣列基板之間的液晶之空間的間隔件用的光阻材、形成將用以使濾色器上之表面凹凸平滑化用的頂塗塗布膜之製造工程等等。 A color liquid crystal display comprising a color filter, an array substrate, or the like often includes a manufacturing process in which a liquid material having a low viscosity is applied to the surface of a glass substrate to be coated, and the coating film is dried. For example, in the manufacturing process of a color filter, a coating film of a black photo-resist material is formed on a glass substrate, and the coating film is processed into a lattice shape by photolithography, and the same lithography is used between the grids. A coating film of red, blue, and green light-resistance materials is sequentially formed. In addition to the manufacturing process of the color filter, there is also a photoresist for coating a spacer for forming a space of the liquid crystal injected between the color filter and the array substrate, which is formed to emboss the surface on the color filter. The manufacturing process of the top coat film for smoothing and the like.

在用以形成此等塗布膜的塗布裝置方面,以往就使用了旋轉塗布機、棒型塗布器等等。但是,近來,因為塗布液的消耗量削減、消耗電量削減、伴隨著玻璃基板大型化而容易使裝置大型化等原因,專利文獻1所揭示那種塗布模具係被廣範使用。 In terms of a coating device for forming such a coating film, a spin coater, a bar coater, or the like has been conventionally used. However, recently, the coating die disclosed in Patent Document 1 is widely used because of the reduction in the amount of the coating liquid, the reduction in the amount of power consumption, and the increase in the size of the device due to the increase in the size of the glass substrate.

然而,使用這樣的塗布模具來對玻璃基板等之薄片狀的被塗布構件進行塗布的情況,有時在塗布器的內部有氣體亦即會有氣泡侵入的情形。有關氣體侵入之主要原因係可舉出:1)經由流通有塗布液的配管連接部或泵的滑動部之氣體侵入;2)溶存於塗布液內之氣體在塗布器內部發泡;3)基於用以塗布液供給之閥的開閉動作而將氣體吸入、或是因塗布液的容積變化而發泡;4)從塗布器的吐出口吸入氣體、等等。依以上的原因,在氣體一侵入塗布器內部時,塗布開始時之吐出壓力產生延遲而使塗布開始部分的膜厚變薄、氣體自塗布器的吐出口直接吐出於被塗布構件上而產生所謂的針孔或直紋之塗布缺點。 However, when such a coating die is used to apply a sheet-shaped member to be coated such as a glass substrate, there may be a case where a gas is trapped inside the applicator. The main cause of gas intrusion is: 1) gas intrusion through a pipe connection portion through which a coating liquid flows or a sliding portion of a pump; 2) gas dissolved in a coating liquid is foamed inside the applicator; 3) based on The gas is sucked by the opening and closing operation of the valve for supplying the liquid supply, or is foamed by the change in the volume of the coating liquid; 4) the gas is sucked from the discharge port of the applicator, and the like. For the above reasons, when the gas enters the inside of the applicator, the discharge pressure at the start of coating is delayed, and the film thickness at the start of coating is reduced, and the gas is directly discharged from the discharge port of the applicator to the member to be coated. Disadvantages of pinhole or straight line coating.

為此,係完成了一種發明,其係在氣體既侵入塗布器內部的情況,於發生上述問題之前,以吐出口朝上的方式使塗布器旋轉之後,從吐出口排出氣體、或於塗布器設置氣體排出口而自氣體排出口將塗布液連同氣體一起排出之技術。但是,如專利文獻2所揭示使塗布器旋轉並從朝上的吐出口將氣體排出的方法為,必需一時中斷塗布生產而使塗布器旋轉,而且使塗布器旋轉的旋轉機構或是在氣體排出後附著於塗布器上的塗布液是需要由作業者以手工方式進行擦拭。 To this end, an invention has been completed in which the gas is intruded into the interior of the applicator, and before the above problem occurs, the applicator is rotated with the discharge port facing upward, and the gas is discharged from the discharge port or the applicator. A technique in which a gas discharge port is provided and a coating liquid is discharged together with a gas from a gas discharge port. However, as disclosed in Patent Document 2, the method of rotating the applicator and discharging the gas from the upward discharge port is such that it is necessary to temporarily interrupt the coating production to rotate the applicator, and the rotating mechanism for rotating the applicator or the gas is discharged. The coating liquid attached to the applicator afterwards is required to be manually wiped by an operator.

然而,因應大型基板而大型化的塗布器要由作業者以手工方式來進行清掃是需要花費很大的時間和勞力。其結果為,塗布生產長時間中斷而使塗布生產用的塗布裝置之運轉率或生產性顯著降低。又,要使大型化的塗布器進行旋轉是需要高精度且高輸出的旋轉裝置,故裝置的成本變高。 However, it takes a lot of time and labor for the applicator to be large in size in response to a large substrate to be cleaned by an operator manually. As a result, the coating production is interrupted for a long period of time, and the operation rate or productivity of the coating device for coating production is remarkably lowered. Further, in order to rotate the large-sized applicator, it is necessary to rotate the device with high precision and high output, so that the cost of the device is increased.

另一方面,從設置在塗布器上的氣體排出口將氣體排出的手段因為是在吐出口朝下的狀態下可於塗布生產中將氣體排出,而在未使塗布器旋轉之下可回避上述的問題。 On the other hand, the means for discharging the gas from the gas discharge port provided on the applicator can discharge the gas in the coating production in a state where the discharge port is directed downward, and can avoid the above without rotating the applicator. The problem.

在此,專利文獻3所揭示的方法為,使被連接在氣體排出口的氣體排出配管配置在比氣體排出口還高的位置上,使得氣體得以利用浮力而自氣體排出口排出。但是,在該位置,因為依氣體排出配管之上部與最下部的高低差所產生的液壓係成為阻力,故將氣體排出所要消耗之塗布液的量多或氣體排出時間長。因此,氣體排出能力顯著降低。 Here, in the method disclosed in Patent Document 3, the gas discharge pipe connected to the gas discharge port is disposed at a position higher than the gas discharge port so that the gas is discharged from the gas discharge port by buoyancy. However, at this position, since the hydraulic pressure generated by the difference between the upper portion and the lowermost portion of the gas discharge pipe becomes a resistance, the amount of the coating liquid to be consumed for discharging the gas is large or the gas discharge time is long. Therefore, the gas discharge capacity is remarkably lowered.

又,在專利文獻4所揭示的方法中,係於氣體排出配管的中途設置有大氣開放部。但是,該方法亦為,位在吐出口還上部的排出路徑之最上部係被開放於大氣中,所以為了排出氣體,則必需將與液晶顯示器製造用塗布液大致相同黏度為5cp的塗布液供給1000cc以上,故氣體排出效率非常低。而要將無端地消耗浪費塗布液這樣的系統適用於非常高價的液晶顯示器製造用之塗布液,在成本面的考量是有困難的。 Further, in the method disclosed in Patent Document 4, an atmosphere opening portion is provided in the middle of the gas discharge pipe. However, in this method, the uppermost portion of the discharge path at the upper portion of the discharge port is opened to the atmosphere. Therefore, in order to discharge the gas, it is necessary to supply the coating liquid having a viscosity of 5 cp substantially the same as that of the liquid crystal display production coating liquid. Above 1000 cc, the gas discharge efficiency is very low. On the other hand, it is difficult to consider the cost of the system for the use of a coating liquid for the production of a very high-priced liquid crystal display.

又,專利文獻5之發明亦揭示具有從供給口朝氣體排出口並使歧管上緣朝上傾斜而使氣體可容易流至氣體排出口的構造。但是,僅使歧管上緣朝上傾斜並無法充分利用氣體的浮力,而難以將附著在歧管上緣的氣體排出。又,在專利文獻6或專利文獻7所揭示的發明中,因為是把在設置有氣體排出口的位置之歧管的剖面積作成大於位在設置有供給口的位置之歧管的剖面積,故會造成歧管內部的流速越是接近氣體排出口越是減少。其結果為,用以移動氣體的能力降 低,特別是在塗布器一被大型化時,氣體排出效率也會顯著地降低。 Further, the invention of Patent Document 5 also discloses a structure in which the gas is discharged from the supply port toward the gas discharge port and the upper edge of the manifold is inclined upward to allow the gas to easily flow to the gas discharge port. However, it is difficult to fully utilize the buoyancy of the gas by tilting the upper edge of the manifold upward, and it is difficult to discharge the gas adhering to the upper edge of the manifold. Further, in the invention disclosed in Patent Document 6 or Patent Document 7, the sectional area of the manifold at the position where the gas discharge port is provided is made larger than the sectional area of the manifold which is located at the position where the supply port is provided, Therefore, the flow velocity inside the manifold is reduced as the gas discharge port is closer. As a result, the ability to move the gas is reduced. Low, especially when the applicator is enlarged, the gas discharge efficiency is also remarkably lowered.

再者,直徑未滿1mm的微小氣體也就是在微小的氣泡一侵入塗布器內部時,作用於微小氣體的浮力或來自塗布液的推壓力因為非常小,故朝向氣體排出口移動之氣體的移動速度變得極小,而有在移動中途氣體附著於歧管壁面而變得無法移動的情況。特別是在塗布器一大型化時,因為微小氣體的移動路徑也變長,所以微小氣體要從氣體排出口排出係變得極為困難。但是,在上述任一發明皆無針對將此微小氣體有效率地從塗布器排出的方法未有任何記載。在微小氣體侵入於內部之際,只有增加氣體排出時之塗布液的供給速度或供給時間而將微小氣體排出的手段。因此,假設就算可將微小氣體排出也是需要大量塗布液以及較長的時間。因此,為了將直徑未滿1mm的微小氣體排出,而將一既有的系統適用於非常高價的液晶顯示器製造用塗布液,在成本面上是極為困難的。再者,以既有的上述手段中,也有微小氣體無法完全排出的情況,所以也會有微小氣體自吐出口吐出於被塗布構件上而發生所謂的針孔或直紋之塗布缺點。 Further, when the minute gas having a diameter of less than 1 mm enters the applicator, the buoyancy acting on the minute gas or the pressing force from the coating liquid is very small, so the movement of the gas moving toward the gas discharge port is small. The speed is extremely small, and there is a case where the gas adheres to the wall surface of the manifold during moving and becomes unable to move. In particular, when the applicator is enlarged, since the movement path of the minute gas is also long, it is extremely difficult to discharge the minute gas from the gas discharge port. However, in any of the above inventions, there is no description of the method for efficiently discharging the fine gas from the applicator. When the minute gas intrudes into the inside, the means for discharging the minute gas is increased only by increasing the supply rate or the supply time of the coating liquid at the time of gas discharge. Therefore, it is assumed that even if a small gas can be discharged, a large amount of coating liquid is required and a long time is required. Therefore, in order to discharge a minute gas having a diameter of less than 1 mm, it is extremely difficult to apply a conventional system to a coating liquid for liquid crystal display production which is very expensive. In addition, in the above-mentioned means, there is a case where the minute gas cannot be completely discharged. Therefore, there is a disadvantage that the minute gas is discharged from the discharge port to the member to be coated, so that the so-called pinhole or straight line coating is caused.

【專利文獻1】日本國專利JP06-339656A [Patent Document 1] Japanese Patent JP06-339656A

【專利文獻2】日本國專利JP09-253556A [Patent Document 2] Japanese Patent JP09-253556A

【專利文獻3】日本國專利JP-2557582B [Patent Document 3] Japanese Patent JP-2557582B

【專利文獻4】日本國專利JP2000-176351A [Patent Document 4] Japanese Patent JP2000-176351A

【專利文獻5】日本國專利JP2001-334197A [Patent Document 5] Japanese Patent JP2001-334197A

【專利文獻6】日本國專利JP2005-144376A [Patent Document 6] Japanese Patent JP2005-144376A

【專利文獻7】日本國專利JP2006-95459A [Patent Document 7] Japanese Patent JP2006-95459A

本發明係為解決上述問題點而完成者。本發明之目的在於提供一種藉由實現將侵入到塗布器內部的任何氣體能利用少量的塗布液量予以短時間加以排出的手段,而能以短的節拍時間(tact time)且生產性高地形成高品質的塗布膜之塗布裝置及塗布方法,以及利用該等裝置及方法之顯示器用構件的製造裝置及製造方法。本發明之目的係由以下所述及的手段來達成。 The present invention has been accomplished to solve the above problems. An object of the present invention is to provide a means for discharging any gas that has entered the inside of the applicator with a small amount of coating liquid for a short period of time, and can be formed with a short tact time and high productivity. A coating device and a coating method for a high-quality coating film, and a manufacturing device and a manufacturing method for a member for a display using the devices and methods. The object of the present invention is achieved by the means described below.

本發明的塗布方法係使用具備如下所構成的塗布裝置而從吐出口對被塗布構件一邊供給塗布液,一邊使塗布器和被塗布構件相對移動而在被塗布構件的表面形成塗膜之塗布方法,該塗布裝置具備有:對塗布器供給塗布液之液體供給機構;具有吐出塗布液之吐出口及連同塗布液一起將氣體排出之氣體排出口的塗布器;與氣體排出口連接且位在與氣體排出口大致同一高度或是比氣體排出口還低的位置且中途具有開閉閥所構成的氣體排出路徑;積存從氣體排出路徑之出口所排出的廢液之廢液槽;保持被塗布構件的保持機構;以及使塗布器和保持機構相對移動之移動機構;該塗布方法之特徵為,在被塗布構件的表面形成塗膜之前、及/或形成之後,從液體供給機構一邊供給液體一邊將氣體排出路徑的開閉閥開啟並從氣體排出口將塗布液和氣體排出。本發明的 塗布方法中,氣體排出路徑之出口,係以在大氣開放的狀態下將開閉閥開啟而從氣體排出口將塗布液和氣體排出者為宜。 The coating method of the present invention is a coating method in which a coating film is formed on the surface of the member to be coated by moving the applicator and the member to be coated while the coating liquid is supplied from the discharge port to the member to be coated, using a coating device having the following configuration. The coating apparatus includes: a liquid supply mechanism that supplies a coating liquid to the applicator; an applicator that has a discharge port for discharging the coating liquid and a gas discharge port that discharges the gas together with the coating liquid; and is connected to the gas discharge port and is located at a gas discharge port having substantially the same height or a position lower than the gas discharge port and having a gas discharge path formed by an opening and closing valve in the middle; a waste liquid tank storing the waste liquid discharged from the outlet of the gas discharge path; and holding the member to be coated a holding mechanism; and a moving mechanism for relatively moving the applicator and the holding mechanism; the coating method is characterized in that the gas is supplied from the liquid supply mechanism before and/or after the coating film is formed on the surface of the member to be coated The opening and closing valve of the discharge path is opened and the coating liquid and the gas are discharged from the gas discharge port. The invention In the coating method, the outlet of the gas discharge path is preferably such that the opening and closing valve is opened while the atmosphere is open, and the coating liquid and the gas are discharged from the gas discharge port.

又,本發明之別的塗布方法,係使用具備如下所構成的塗布裝置而從吐出口對被塗布構件一邊供給塗布液,一邊使塗布器和被塗布構件相對移動而在被塗布構件的表面形成塗膜之塗布方法,該塗布裝置具備有:對塗布器供給塗布液之液體供給機構;具有吐出塗布液之吐出口及連同塗布液一起將氣體排出之氣體排出口的塗布器;與氣體排出口連接且出口位在比吐出口還低的位置且中途具有開閉閥所構成的氣體排出路徑;積存從氣體排出路徑之出口所排出的廢液之廢液槽;用以保持被塗布構件的保持機構;使塗布器和保持機構相對移動之移動機構,該塗布方法之特徵為,於被塗布構件的表面形成塗膜之前、及/或形成之後,一邊從液體供給機構供給液體一邊開啟氣體排出路徑的開閉閥而從氣體排出口將塗布液和氣體排出。本發明之塗布方法中,氣體排出路徑之出口係以在大氣開放的狀態下將開閉閥開啟而自氣體排出口將塗布液和氣體排出者為宜。本發明的塗布方法,係以廢液槽的液體儲存部被開放於大氣中,積存於廢液槽之廢液的液面係位在比塗布器的吐出口還低的位置,且在氣體排出路徑之出口被浸於廢液槽內的廢液中之狀態下,將開閉閥開啟並從氣體排出口將塗布液和氣體排出者為宜。 In addition, in the coating method of the present invention, the coating liquid is supplied to the member to be coated from the discharge port, and the applicator and the member to be coated are relatively moved to form a surface of the member to be coated. In the coating method of the coating film, the coating device includes: a liquid supply mechanism that supplies a coating liquid to the applicator; an applicator that has a discharge port for discharging the coating liquid and a gas discharge port that discharges the gas together with the coating liquid; and a gas discharge port a gas discharge path including an opening and closing valve at a position lower than the discharge port and having a discharge port; a waste liquid tank for storing the waste liquid discharged from the outlet of the gas discharge path; and a holding mechanism for holding the member to be coated a moving mechanism for relatively moving the applicator and the holding mechanism, wherein the coating method is characterized in that the gas discharge path is opened while the liquid is supplied from the liquid supply mechanism before and/or after the coating film is formed on the surface of the member to be coated. The valve is opened and closed to discharge the coating liquid and the gas from the gas discharge port. In the coating method of the present invention, the outlet of the gas discharge path is preferably such that the opening and closing valve is opened while the atmosphere is open, and the coating liquid and the gas are discharged from the gas discharge port. In the coating method of the present invention, the liquid storage portion of the waste liquid tank is opened to the atmosphere, and the liquid level of the waste liquid accumulated in the waste liquid tank is lower than the discharge port of the applicator, and the gas is discharged. In the state where the outlet of the path is immersed in the waste liquid in the waste liquid tank, it is preferable to open the opening and closing valve and discharge the coating liquid and the gas from the gas discharge port.

本發明之又一塗布方法為,係使用具有如下所構成之塗布器而一邊從塗布器的吐出口將塗布液吐出一邊使被塗布構 件和塗布器相對移動而將塗布液塗布於被塗布構件的表面,該塗布器具有用以將塗布液擴展於塗布寬度方向的歧管、和吐出塗布液的吐出口、及連同塗布液一起將氣體排出之氣體排出口,該塗布方法之特徵為,對充填有塗布液的歧管供給氣體,接著對歧管供給塗布液,且將氣體和塗布液的一部分從氣體排出口排出,之後再對被塗布構件的表面塗布塗布液。 According to still another application method of the present invention, the coating liquid is discharged from the discharge port of the applicator while being coated with the applicator having the following configuration. The coating and the applicator are relatively moved to apply a coating liquid to the surface of the member to be coated, the applicator having a manifold for expanding the coating liquid in the coating width direction, a discharge port for discharging the coating liquid, and a gas together with the coating liquid The discharged gas discharge port is characterized in that the gas is supplied to the manifold filled with the coating liquid, and then the coating liquid is supplied to the manifold, and a part of the gas and the coating liquid is discharged from the gas discharge port, and then the mixture is discharged. A coating liquid is applied to the surface of the coating member.

本發明所涉及的顯示器用構件之製造方法,其特徵在於是使用上述任一所記載的塗布方法者。 A method of producing a member for a display according to the present invention is characterized in that the coating method described in any of the above is used.

本發明之塗布裝置係具備:具有對塗布器供給塗布液的液體供給路徑之液體供給機構;具有將塗布液擴展於塗布寬度方向用的歧管和吐出塗布液之吐出口及連同塗布液一起將氣體排出之氣體排出口的塗布器;與氣體排出口連接且中途具有開閉閥所構成的氣體排出路徑;保持被塗布構件的保持機構;使塗布器和保持機構相對移動之移動機構,該塗布裝置之特徵為,氣體排出路徑係位在與氣體排出口大致同一高度或是比氣體排出口還低的位置。 The coating apparatus of the present invention includes: a liquid supply mechanism having a liquid supply path for supplying a coating liquid to the applicator; and a discharge port for expanding the coating liquid in the application width direction and a discharge port for discharging the coating liquid together with the coating liquid An applicator for discharging the gas from the gas discharge port; a gas discharge path connected to the gas discharge port and having an opening and closing valve in the middle; a holding mechanism for holding the member to be coated; and a moving mechanism for relatively moving the applicator and the holding mechanism, the coating device It is characterized in that the gas discharge path is at a position substantially at the same height as the gas discharge port or lower than the gas discharge port.

又,本發明之其他的塗布裝置係具備:具有對塗布器供給塗布液的液體供給路徑之液體供給機構;具有將塗布液擴展於塗布寬度方向用的歧管和吐出塗布液之吐出口及連同塗布液一起將氣體排出之氣體排出口的塗布器;與氣體排出口連接且中途具有開閉閥所構成的氣體排出路徑;保持被塗布構件的保持機構;使塗布器和保持機構相對移動之移動機構,該塗布裝置之特徵為,氣體排出路徑之出口位在比吐出 口還低的位置。 Further, another coating apparatus according to the present invention includes: a liquid supply mechanism having a liquid supply path for supplying a coating liquid to the applicator; and a discharge port for expanding the coating liquid in a coating width direction and a discharge port for discharging the coating liquid, and An applicator for discharging a gas from a gas discharge port; a gas discharge path connected to the gas discharge port and having an opening and closing valve in the middle; a holding mechanism for holding the member to be coated; and a moving mechanism for relatively moving the applicator and the holding mechanism The coating device is characterized in that the outlet of the gas discharge path is at a higher ratio than the discharge The mouth is still low.

本發明之又其他的塗布裝置係具備:具有對塗布器供給塗布液的液體供給路徑之液體供給機構;具有將塗布液擴展於塗布寬度方向用的歧管和吐出塗布液之吐出口及連同塗布液一起將氣體排出之氣體排出口的塗布器;與氣體排出口連接且中途具有開閉閥所構成的氣體排出路徑;保持被塗布構件的保持機構;使塗布器和保持機構相對移動之移動機構,該塗布裝置之特徵為,對塗布器供給氣體用的氣體供給路徑係至少與塗布器、液體供給路徑、或氣體排出路徑當中任一者連接。於本發明的塗布裝置中,氣體供給路徑之入口係以大氣開放者為宜。 Still another coating apparatus of the present invention includes: a liquid supply mechanism having a liquid supply path for supplying a coating liquid to the applicator; and a discharge port for expanding the coating liquid in a coating width direction and a discharge port for discharging the coating liquid, and coating together An applicator for discharging a gas discharge gas together with a gas; a gas discharge path connected to the gas discharge port and having an opening and closing valve in the middle; a holding mechanism for holding the member to be coated; and a moving mechanism for relatively moving the applicator and the holding mechanism, The coating apparatus is characterized in that a gas supply path for supplying gas to the applicator is connected to at least one of an applicator, a liquid supply path, or a gas discharge path. In the coating apparatus of the present invention, the inlet of the gas supply path is preferably an open atmosphere.

在本發明的塗布裝置中,係以塗布器具有從液體供給路徑對塗布器供給塗布液之供給口,歧管之塗布寬度方向的剖面積係從供給口朝向氣體排出口減少,且歧管上緣係與吐出口面平行或是以吐出口面為基準而從供給口朝向氣體排出口並朝上傾斜者為宜。又、在本發明之塗布裝置中,係以塗布器之狹縫的島塊長度,係從塗布寬度方向之中央部朝向兩端部減少者為宜。 In the coating apparatus of the present invention, the applicator has a supply port for supplying the coating liquid to the applicator from the liquid supply path, and the cross-sectional area of the manifold in the coating width direction is reduced from the supply port toward the gas discharge port, and on the manifold It is preferable that the edge is parallel to the discharge surface or is inclined upward from the supply port toward the gas discharge port with respect to the discharge port surface. Further, in the coating apparatus of the present invention, it is preferable that the length of the island block of the slit of the applicator is reduced from the central portion in the application width direction toward both end portions.

本發明所涉及的顯示器用構件之製造裝置,其特徵為使用上述任一所記載的塗布裝置。 A device for manufacturing a member for a display according to the present invention is characterized in that the coating device described in any of the above is used.

若使用本發明所涉及的塗布方法及塗布裝置的話,則與塗布器的氣體排出口連接的氣體排出路徑係位在與氣體排出口大致同一高度或是比氣體排出口還低的位置,而且,在氣 體排出路徑之出口是比吐出口還低的位置之狀態,從液體供給手段一邊供給液體一邊將氣體排出路徑的開閉閥開啟,藉此而從氣體排出口將混有氣體的塗布液排出。因此,基於氣體排出路徑的最上部和最下部之高低差的液壓並不會成為阻力,因為能利用虹吸管原理促進氣體之排出,故能短時間將氣體排出。 When the coating method and the coating apparatus according to the present invention are used, the gas discharge path connected to the gas discharge port of the applicator is at substantially the same height as the gas discharge port or lower than the gas discharge port, and In gas In the state in which the outlet of the body discharge path is lower than the discharge port, the liquid supply means supplies the liquid, and opens the opening and closing valve of the gas discharge path, thereby discharging the coating liquid containing the gas from the gas discharge port. Therefore, the hydraulic pressure based on the difference between the uppermost portion and the lowermost portion of the gas discharge path does not become a resistance, because the discharge of the gas can be promoted by the siphon principle, so that the gas can be discharged in a short time.

又,從與塗布器、液體供給路徑或氣體排出路徑任一相連接的氣體供給路徑,將一定容積以上的氣體供給至塗布器的歧管,藉此而於內部所形成的氣體領域將微小氣體合併,並在將微小氣體消除之後,將所供給的氣體連同少量的塗布液一起朝塗布器外部排出,所以即使是排出困難的微小氣體也能短時間且確實地朝外部排出。 Further, a gas having a predetermined volume or more is supplied to the manifold of the applicator from a gas supply path connected to any one of the applicator, the liquid supply path, or the gas discharge path, whereby the gas is formed in the gas field formed inside. After the micro gas is removed, the supplied gas is discharged to the outside of the applicator together with a small amount of the coating liquid, so that even a minute gas that is difficult to discharge can be discharged to the outside in a short time and reliably.

再者,歧管之塗布寬度方向的剖面積係從供給口朝向氣體排出口減少,且歧管上緣係與含有吐出口的吐出口面呈平行,或是以吐出口面為基準而從供給口朝向氣體排出口並朝上傾斜,因為是使用這樣的塗布器,所以即使是塗布器大型化,因為從供給口朝向氣體排出口的歧管內部之塗布液的流速快,所以氣體朝向氣體排出口快速地移動,且氣體之移動亦不因歧管上緣的傾斜而受到妨礙,所以能更短時間且確實地將氣體朝外部排出。 Further, the cross-sectional area of the manifold in the application width direction is reduced from the supply port toward the gas discharge port, and the upper edge of the manifold is parallel to the discharge port surface including the discharge port, or is supplied from the discharge port surface. The port faces the gas discharge port and is inclined upward. Since such an applicator is used, even if the applicator is enlarged, since the flow rate of the coating liquid inside the manifold from the supply port toward the gas discharge port is fast, the gas is directed toward the gas row. The outlet moves quickly, and the movement of the gas is not hindered by the inclination of the upper edge of the manifold, so that the gas can be discharged to the outside in a shorter time and with certainty.

依據上述的塗布方法及塗布裝置,因為在塗布生產中能執行氣體的排出作業,故沒有因為氣體排出作業而長時間中斷塗布生產的情形。因此,提高塗布裝置之運轉率同時容易縮短節拍時間,故可大幅提升生產性。而且,無需為了將氣體 排出而無端浪費非常高價的液晶顯示器製造用塗布液,故在削減成本上大有貢獻。又,依優越的氣體排出性能可將塗布器內部的氣體完全地朝外部排出,所以也可完全解消所謂因塗布器內部氣體的原因產生在塗布開始時之吐出壓力延遲而使塗布開始部分的膜厚變薄、或發生氣體從吐出口對被塗布構件直接吐出而產生針孔或直紋之塗布缺點等問題。而且不需要塗布器的旋轉裝置,所以也容易因應基板的大型化。 According to the coating method and the coating apparatus described above, since the gas discharge operation can be performed in the coating production, there is no case where the coating production is interrupted for a long time due to the gas discharge operation. Therefore, the operation rate of the coating device is increased and the tact time is easily shortened, so that the productivity can be greatly improved. Moreover, there is no need to Since the coating liquid for liquid crystal display manufacturing, which is very expensive, is wasted and discharged, it contributes greatly to cost reduction. Further, since the gas inside the applicator can be completely discharged to the outside according to the superior gas discharge performance, it is possible to completely eliminate the film which is caused by the gas inside the applicator due to the delay in the discharge pressure at the start of coating. The thickness is reduced, and there is a problem that the gas is directly discharged from the discharge port to the member to be coated, and the pinhole or the straight line is coated. Further, since the rotating device of the applicator is not required, it is easy to increase the size of the substrate.

依據本發明所涉及的顯示器用構件之製造方法及製造裝置,因為是使用上述優良的塗布方法及塗布裝置來製造顯示器用構件,故能以低成本且高良率來製造具優越塗布品質的顯示器用構件。 According to the method and apparatus for manufacturing a member for a display according to the present invention, since the member for display is manufactured by using the above-described excellent coating method and coating device, it is possible to manufacture a display having superior coating quality at low cost and high yield. member.

【發明最佳實施形態】 BEST MODE FOR CARRYING OUT THE INVENTION

以下,依據圖面來說明本發明之較佳實施形態。參照第1圖所示本發明所涉及的塗布模具1。塗布模具1備有基台30,而基台30上設置有一對導軌31。在此導軌31上設置有平台(stage)32。平台32係由線性馬達33所驅動而可在第1圖所示的X方向自由地往復運動。又、平台32的上面形成具有未圖示的複數個吸附孔之真空吸附面而可吸附保持屬被塗布構件之基板3。又,基台30設置有門型的支柱34。在此支柱34兩側具備有可在上下方向往復運動的一對昇降裝置單元40。進行塗布的塗布器10係在此昇降裝置單元40被安裝成吐出口15朝下。昇降裝置單元40係由使保持塗布器10的塗布器保持台22昇降的昇降台41、和將昇降台41 引導於上下方向的引導件42、馬達43、以及將馬達43的旋轉運動變換成昇降台41的直線運動之螺桿44所構成。此昇降裝置單元40因為可在塗布器10的塗布寬度方向之兩端(左右)各自獨立地動作,故可將塗布器10的塗布寬度方向對水平方向之傾角作任意設定。藉此,可將塗布器10之吐出口面21與屬被塗布構件的基板3作成平行於塗布器10的塗布寬度方向,而且基板3的表面與吐出口面21之間的距離-餘隙(clearance)可設定成任意的大小。 Hereinafter, preferred embodiments of the present invention will be described based on the drawings. The coating die 1 according to the present invention shown in Fig. 1 is referred to. The coating die 1 is provided with a base 30, and the base 30 is provided with a pair of guide rails 31. A stage 32 is provided on the guide rail 31. The platform 32 is driven by the linear motor 33 to be freely reciprocable in the X direction shown in Fig. 1. Further, a vacuum adsorption surface having a plurality of adsorption holes (not shown) is formed on the upper surface of the stage 32, and the substrate 3 belonging to the member to be coated can be adsorbed and held. Further, the base 30 is provided with a gate-shaped stay 34. A pair of lifting device units 40 that are reciprocable in the vertical direction are provided on both sides of the column 34. The applicator 10 that performs coating is such that the lifting device unit 40 is mounted with the discharge port 15 facing downward. The lifting device unit 40 is a lifting table 41 for lifting and lowering the applicator holding table 22 holding the applicator 10, and the lifting table 41 The guide 42 that guides the vertical direction, the motor 43, and a screw 44 that converts the rotational motion of the motor 43 into a linear motion of the lift table 41 is formed. Since the lifting device unit 40 can independently operate at both ends (left and right) of the applicator 10 in the application width direction, the application width direction of the applicator 10 can be arbitrarily set in the horizontal direction. Thereby, the discharge surface 21 of the applicator 10 and the substrate 3 belonging to the member to be coated can be made parallel to the coating width direction of the applicator 10, and the distance between the surface of the substrate 3 and the discharge opening surface 21 - clearance ( Clearance) can be set to any size.

再者,在基台30上設置有擦拭單元50。此擦拭單元50係與平台32同樣地可在導軌31上於屬塗布方向的X方向自由地往復運動。擦拭單元50係由擦拭頭51、擦拭頭驅動裝置52、擦拭頭保持器53、托架54、及擦拭單元保持台55所構成。此外,擦拭頭51係作成與塗布器10的下端部形狀嵌合的形狀,且宜為合成樹脂等之彈性體。 Further, a wiping unit 50 is provided on the base 30. This wiping unit 50 is freely reciprocable on the guide rail 31 in the X direction of the coating direction, similarly to the stage 32. The wiping unit 50 is composed of a wiping head 51, a wiping head driving device 52, a wiping head holder 53, a carriage 54, and a wiping unit holding table 55. Further, the wiping head 51 is formed into a shape that fits into the shape of the lower end portion of the applicator 10, and is preferably an elastic body such as synthetic resin.

在利用擦拭單元50擦拭塗布器10下端部的情況,使擦拭單元50在X方向移動於塗布器10的下部,利用昇降裝置單元40使塗布器10下降,使擦拭頭51與塗布器10的下端部接觸。接著,以與塗布器10的下端部接觸的狀態,藉擦拭頭驅動裝置52使擦拭頭51移動於與塗布器10的X方向正交的塗布寬度方向,藉此而將附著在塗布器10下端部的殘留塗布液及粒子等予以除去。被塗布器10所除去的殘留塗布液及粒子等係由設置在擦拭頭51下部的托架54所接取並經由未圖示的廢液路徑而回收到未圖示的容器。此外,此托架54也可使用在回收自吐出口15吐出之用以進行塗布液2 之種類交換或是為防止塗布器10下端的吐出口面21乾燥用的塗布液2、溶劑等等。 When the lower end portion of the applicator 10 is wiped by the wiping unit 50, the wiping unit 50 is moved in the X direction to the lower portion of the applicator 10, and the applicator 10 is lowered by the elevating device unit 40 so that the wiping head 51 and the lower end of the applicator 10 are lowered. Contact. Next, in a state of being in contact with the lower end portion of the applicator 10, the wiping head 51 is moved by the wiping head driving device 52 in the coating width direction orthogonal to the X direction of the applicator 10, thereby adhering to the lower end of the applicator 10. The residual coating liquid, particles, and the like of the portion are removed. The residual coating liquid, particles, and the like removed by the applicator 10 are picked up by a bracket 54 provided at a lower portion of the wiping head 51, and are collected in a container (not shown) via a waste liquid path (not shown). In addition, the bracket 54 can also be used to discharge the self-discharging outlet 15 for the coating liquid 2 The type is exchanged or a coating liquid 2 for preventing drying of the discharge port 21 at the lower end of the applicator 10, a solvent, and the like.

又,塗布模具1也備有對塗布器10供給塗布液2的塗布液供給裝置單元60。在此,經詳細參照第4圖所示與塗布器10連接的供給路徑與排出路徑可知,塗布液供給裝置單元60具備儲存塗布液2之塗布液槽61。由塗布液槽61所儲存之塗布液2係經過被連接至塗布液槽61下游的泵供給路62、吸引用開閉閥63而供給至注射泵64。被供給到注射泵64的塗布液2係經由吐出用開閉閥65、模具供給路66而自塗布器10的供給口16被送入歧管13。在此,注射泵64係由注射唧筒67、活塞68、保持活塞68的活塞保持台69、將活塞保持台69引導於上下方向的活塞昇降引導件70、成為使活塞保持台69移動於上下方向的驅動源之注射泵用馬達71、以及將注射泵用馬達71的旋轉運動變換成活塞保持台69的直線運動並使活塞保持台69實際地移動的注射泵用螺桿72所構成。此注射泵64係定容量型,藉由活塞68擠出被充填在注射唧筒67內部的塗布液2,可將塗布膜形成所要的容量之塗布液2對塗布器10作供給。在要對注射唧筒67的內部充填塗布液2的情況,係以令安裝在注射唧筒67上游的吸引用開閉閥63為「開啟」、而令安裝在注射唧筒67下游的吐出用開閉閥65為「關閉」的狀態下使活塞68下降。又,在將注射唧筒67的內部之塗布液2朝塗布器10供給的情況,係以令吸引用開閉閥63為「關閉」、而吐出用開閉閥65為「開啟」的狀態下使活塞68上昇。 Further, the coating die 1 is also provided with a coating liquid supply device unit 60 that supplies the coating liquid 2 to the applicator 10. Here, as described in detail with reference to the supply path and the discharge path connected to the applicator 10 shown in FIG. 4, the coating liquid supply device unit 60 includes the coating liquid tank 61 that stores the coating liquid 2. The coating liquid 2 stored in the coating liquid tank 61 is supplied to the syringe pump 64 via the pump supply path 62 connected to the downstream of the coating liquid tank 61 and the suction opening and closing valve 63. The coating liquid 2 supplied to the syringe pump 64 is sent to the manifold 13 from the supply port 16 of the applicator 10 via the discharge opening and closing valve 65 and the mold supply path 66. Here, the syringe pump 64 is a piston holding base 69 that holds the injection cylinder 67, the piston 68, and the holding piston 68, and the piston lifting and lowering guide 70 that guides the piston holding base 69 in the vertical direction, and moves the piston holding base 69 in the vertical direction. The syringe pump motor 71 of the drive source and the syringe pump screw 72 that converts the rotational motion of the syringe pump motor 71 into a linear motion of the piston holding base 69 and actually moves the piston holding base 69. The syringe pump 64 is of a fixed capacity type, and the coating liquid 2 filled in the inside of the injection cylinder 67 is extruded by the piston 68, and the coating liquid 2 having a desired volume of the coating film can be supplied to the applicator 10. When the application liquid 2 is to be filled in the inside of the injection cylinder 67, the suction opening/closing valve 63 attached to the upstream side of the injection cylinder 67 is "opened", and the discharge opening and closing valve 65 attached to the downstream of the injection cylinder 67 is used. The piston 68 is lowered in the "closed" state. In the case where the coating liquid 2 inside the injection cylinder 67 is supplied to the applicator 10, the suction opening/closing valve 63 is "closed" and the discharge opening/closing valve 65 is "open". rise.

再參照第1圖可知,被搭載於塗布模具1的塗布器10係使延伸於塗布寬度方向(與紙面垂直的方向)的前唇部11和後唇部12疊合於塗布方向並利用未圖示的複數個組裝螺栓來結合所構成。此外,塗布方向係與第1圖的X方向一致。又,塗布器10形成有歧管13,用以將既供給至塗布器10內部的塗布液2擴展於塗布寬度方向。此歧管13係與前唇部11和後唇部12同樣是在塗布寬度方向延伸的形狀。在此,塗布寬度方向係與塗布器10的長邊方向一致。在歧管13之下方形成有屬前唇部11與後唇部12之間隙的狹縫14,此狹縫14也在塗布寬度方向延伸。而且,狹縫14的下端部成為塗布器10的吐出口15。 Referring to Fig. 1, the applicator 10 mounted on the coating die 1 is formed by superimposing the front lip portion 11 and the rear lip portion 12 extending in the coating width direction (direction perpendicular to the paper surface) in the coating direction. A plurality of assembly bolts are shown to be combined. Further, the coating direction is identical to the X direction of Fig. 1 . Further, the applicator 10 is formed with a manifold 13 for expanding the coating liquid 2 supplied to the inside of the applicator 10 in the coating width direction. This manifold 13 has a shape extending in the coating width direction similarly to the front lip portion 11 and the rear lip portion 12. Here, the coating width direction coincides with the longitudinal direction of the applicator 10. A slit 14 which is a gap between the front lip portion 11 and the rear lip portion 12 is formed below the manifold 13, and the slit 14 also extends in the coating width direction. Further, the lower end portion of the slit 14 serves as the discharge port 15 of the applicator 10.

第2圖係塗布器10的概略正剖面圖,係從正交於塗布寬度方向的塗布方向所見塗布器10的內部。參照第2(a)圖可知,塗布器10設置有被供給塗布液2的供給口16、以及將侵入第4圖所示之塗布器10的內部之氣體100連同塗布液2一起排出的氣體排出口17A、17B。 Fig. 2 is a schematic front cross-sectional view of the applicator 10, showing the inside of the applicator 10 as seen from the direction of application orthogonal to the application width direction. Referring to Fig. 2(a), the applicator 10 is provided with a supply port 16 to which the coating liquid 2 is supplied, and a gas row for discharging the gas 100 invading the inside of the applicator 10 shown in Fig. 4 together with the coating liquid 2. Exits 17A, 17B.

在此,供給口16的數量、位置並未特別限定。如第2圖所示,在供給口16是1個的時候,在將供給口16設置於歧管13之塗布寬度方向的中央時,因為在塗布寬度方向將塗布液2擴展用的流路長度成為最短故最適宜。配置這樣的供給口16特別是在塗布器10為長條狀的情況非常有用。 Here, the number and position of the supply ports 16 are not particularly limited. As shown in Fig. 2, when the supply port 16 is provided in the center in the application width direction of the manifold 13, the flow path length for expanding the coating liquid 2 in the application width direction is shown in Fig. 2 It is best to be the shortest. It is very useful to arrange such a supply port 16 particularly in the case where the applicator 10 is elongated.

在將供給口16設置於歧管13之塗布寬度方向的中央之情況,氣體排出口17B宜於歧管13的塗布寬度方向之兩端位置設置一對。依此,從供給口16流入的氣體、在塗布器10 之內部發泡的氣體、以及自吐出口15吸入的氣體即使是成為積存在第4圖所示的歧管13中的氣體100,也可將氣體100順著歧管13內之塗布液2的流動而自氣體排出口17B排出。又,為了使蓄積在供給口16上部的氣體或自供給口16侵入的氣體在到達歧管13之前就予以排出,所以氣體排出口17A宜設置在供給口16上方。 When the supply port 16 is provided in the center of the application width direction of the manifold 13, the gas discharge port 17B is preferably provided in a pair at both ends in the application width direction of the manifold 13. Accordingly, the gas flowing in from the supply port 16 is at the applicator 10 The gas which is internally foamed and the gas sucked from the discharge port 15 may be the gas 100 which is accumulated in the manifold 13 shown in Fig. 4, and the gas 100 may be applied to the coating liquid 2 in the manifold 13. The flow is discharged from the gas discharge port 17B. Further, in order to discharge the gas accumulated in the upper portion of the supply port 16 or the gas intruding from the supply port 16 before reaching the manifold 13, the gas discharge port 17A is preferably provided above the supply port 16.

其次,參照第3圖之正交於塗布器10塗布寬度方向的概略側剖面圖,第3(a)圖顯示供給口16之位置的剖面圖,第3(b)圖顯示氣體排出口17B之位置的剖面圖。如同第3(a)圖所示般地,供給口16宜經由供給內部流路18而與歧管13的上部作連接,另一方面、氣體排出口17A宜與容易集氣的供給內部流路18之上部連接。 Next, referring to Fig. 3, a schematic side cross-sectional view orthogonal to the application width direction of the applicator 10, a third (a) view showing a position of the supply port 16, and a third (b) view showing a gas discharge port 17B. A section view of the location. As shown in Fig. 3(a), the supply port 16 is preferably connected to the upper portion of the manifold 13 via the supply internal flow path 18, and the gas discharge port 17A is preferably provided to the internal flow path for easy gas collection. 18 is connected above.

又,如在第3(b)圖所示般,氣體排出口17B宜透過氣體排出內部流路19B而與容易集氣的歧管13上部連接。在此,氣體排出內部流路19A、19B雖然亦可部分地具有在鉛直方向延伸的路徑,但是在氣體排出口17A、17B附近係以在水平方向延伸的路徑為宜,避免因基於氣體排出內部流路19A、19B之最上部與最下部的高低差之液壓的影響而造成在氣體排出內部流路19A、19B流動的塗布液2之流量降低。因此,氣體排出口17A、17B並非在塗布器10的上面而是以設置在正面、側面、及背面當中任一處者為宜。 Further, as shown in Fig. 3(b), the gas discharge port 17B is preferably connected to the upper portion of the manifold 13 which is easily collected by the gas discharge internal flow path 19B. Here, although the gas discharge internal passages 19A and 19B may partially have a path extending in the vertical direction, it is preferable to extend the path extending in the horizontal direction in the vicinity of the gas discharge ports 17A and 17B, thereby avoiding the internal discharge due to the gas. The flow rate of the coating liquid 2 flowing through the gas discharge internal passages 19A and 19B is lowered by the influence of the hydraulic pressure of the difference between the uppermost portion and the lowermost portion of the flow passages 19A and 19B. Therefore, it is preferable that the gas discharge ports 17A, 17B are not provided on the upper surface of the applicator 10 but in any of the front surface, the side surface, and the back surface.

再參照第2圖可知,為了在歧管13內使氣體順著塗布液2的流動而有效率地排出,歧管13的上緣20乃如第2(a)圖所示般、與吐出口面21平行,或是如第2(b)圖所示以吐 出口面21為基準而從供給口16朝氣體排出口17B並朝上傾斜者為宜。在是這樣的構成時,在欲使氣體連同塗布液2一起移動於氣體排出口17B時,因為作用於氣體上的浮力促進氣體的移動,故氣體可容易排出而可獲得高的氣體排出效率。另一方面,在歧管13的上緣20是以吐出口面21為基準而從供給口16朝向氣體排出口17B並朝下傾斜的情況,在欲使氣體連同塗布液2一起朝氣體排出口17B移動時,成為有需要對抗作用在氣體上的浮力而朝向重力方向的回推力,故氣體變得難以排出,氣體排出效率係顯著降低。 Referring to Fig. 2, in order to efficiently discharge the gas in the manifold 13 along the flow of the coating liquid 2, the upper edge 20 of the manifold 13 is as shown in Fig. 2(a) and the discharge port. Face 21 is parallel, or as shown in Figure 2(b) It is preferable that the outlet surface 21 is inclined from the supply port 16 toward the gas discharge port 17B as a reference. In such a configuration, when the gas is to be moved together with the coating liquid 2 to the gas discharge port 17B, since the buoyancy acting on the gas promotes the movement of the gas, the gas can be easily discharged, and high gas discharge efficiency can be obtained. On the other hand, in the case where the upper edge 20 of the manifold 13 is inclined downward from the supply port 16 toward the gas discharge port 17B with respect to the discharge port surface 21, the gas is supplied together with the coating liquid 2 toward the gas discharge port. When the 17B moves, there is a need to counteract the buoyancy acting on the gas and the returning force in the direction of gravity. Therefore, the gas becomes difficult to discharge, and the gas discharge efficiency is remarkably lowered.

在歧管13的上緣20是從供給口16往氣體排出口17B並朝上傾斜的情況,因為可將作用於氣體的浮力利用在推出上,故歧管13的上緣20對吐出口面21的傾斜角度α係可為任意大小,但是較好為5°以內,更好為3°以內。而在傾斜角度α過大時,伴隨的是塗布器10的全高(從第1圖的吐出口面21到塗布器保持台22為止的距離)增加而使得塗布器10大型化。依此會發生所謂的製作成本增加、管理性降低的問題。再者,因為變得難以使在將前唇部11和後唇部12鎖緊時的兩唇部間的鎖緊面壓在塗布寬度方向形成均一,所以狹縫14的間隙在塗布方向變得不均一且在吐出精度上也造成不良的影響。 The upper edge 20 of the manifold 13 is inclined upward from the supply port 16 to the gas discharge port 17B. Since the buoyancy acting on the gas can be utilized for pushing out, the upper edge 20 of the manifold 13 faces the discharge port. The inclination angle α of 21 may be any size, but is preferably within 5°, more preferably within 3°. On the other hand, when the inclination angle α is excessively large, the total height of the applicator 10 (the distance from the discharge port surface 21 of the first drawing to the coater holding table 22) increases, and the size of the applicator 10 increases. As a result, so-called production costs increase and management problems decrease. Further, since it becomes difficult to form the locking surface between the lips when the front lip portion 11 and the rear lip portion 12 are locked in the coating width direction, the gap of the slit 14 becomes in the coating direction. It is not uniform and also has an adverse effect on the accuracy of the discharge.

此外,歧管13的上緣20所有部分係以與吐出口面21平行,或是以吐出口面21為基準而從供給口16朝氣體排出口17B並直線地朝上傾斜者為宜,但是也可在中途具有朝下傾斜的部分。 Further, it is preferable that all the upper edges 20 of the manifold 13 are parallel to the discharge port surface 21 or are inclined upward from the supply port 16 toward the gas discharge port 17B with respect to the discharge port surface 21, but It is also possible to have a portion that is inclined downward in the middle.

在此,具體而言、傾斜角度α乃如第2(b)圖所示,係以平行於吐出口面21的破線與歧管13的上緣20所成的角度來表示。所謂的歧管13之上緣20係指由第2圖的20所表示的直線部分,更具體來說係指將第3圖之歧管13的最上部連結於塗布寬度方向的線或面。 Here, specifically, the inclination angle α is expressed by an angle formed by a broken line parallel to the discharge port surface 21 and the upper edge 20 of the manifold 13 as shown in the second (b) diagram. The upper edge 20 of the manifold 13 is a straight line portion indicated by 20 in Fig. 2, and more specifically, a line or surface that connects the uppermost portion of the manifold 13 in Fig. 3 to the coating width direction.

又,如第2(a)圖所示,從吐出口15到歧管13的下部為止的長度亦是狹縫14的島塊長度,係以Ha(中央部島塊長度)>Hb(端部島塊長度)為宜。在第2(a)圖中,島塊長度係從歧管13的中央部朝向兩端部減少。若是Ha(中央部島塊長度)=Hb(端部島塊長度)的話,則因為在狹縫14之兩端部的壓損變得比中央部還高,所以兩端部的吐出量雖然變得比中央部還少,但是藉由作成Ha(中央部島塊長度)>Hb(端部島塊長度),因為在狹縫14之兩端部的壓損變得比中央部還低,所以形成可從兩端部吐出與中央部略同一量的塗布液2。其結果,可在塗布寬度方向均一地將塗布液2從吐出口15予以吐出。 Further, as shown in Fig. 2(a), the length from the discharge port 15 to the lower portion of the manifold 13 is also the length of the island block of the slit 14, and is Ha (the central portion of the island block length) > Hb (end portion) The length of the island block is appropriate. In the second (a) diagram, the length of the island block decreases from the central portion of the manifold 13 toward both end portions. If Ha (central island block length) = Hb (end island block length), since the pressure loss at both end portions of the slit 14 is higher than the central portion, the discharge amount at both end portions is changed. It is smaller than the central portion, but by making Ha (central island block length)>Hb (end island length), since the pressure loss at both ends of the slit 14 is lower than the central portion, The coating liquid 2 which discharges the same amount as the center part from the both ends is formed. As a result, the coating liquid 2 can be uniformly discharged from the discharge port 15 in the coating width direction.

再參照第3圖,歧管13的塗布寬度方向之剖面積,亦即在與塗布寬度方向正交之剖面的面積係從供給口16朝向氣體排出口17B逐次減少而係Sa(供給口部歧管剖面積)>Sb(氣體排出口部歧管剖面積)。藉由將氣體排出口部歧管剖面積Sb作成比供給口部歧管剖面積Sa還小,因為朝向氣體排出口17B的塗布液2之流速變高,所以能使歧管13內部的氣體連同塗布液2一起朝向氣體排出口17B快速移動,並短時間將氣體排出,而且變得難以在歧管13內產生滯留 部分。其結果,長條狀的塗布器10之氣體排出亦能在短時間內進行,而且也能解決因塗布液2的滯留所造成之劣化問題。 Referring to Fig. 3 again, the cross-sectional area of the manifold 13 in the application width direction, that is, the area of the cross section orthogonal to the application width direction is gradually decreased from the supply port 16 toward the gas discharge port 17B to be Sa (supply port portion) Tube sectional area)>Sb (distribution area of gas discharge port manifold). By making the gas discharge port manifold sectional area Sb smaller than the supply port manifold sectional area Sa, since the flow rate of the coating liquid 2 toward the gas discharge port 17B becomes high, the gas inside the manifold 13 can be made together with The coating liquid 2 quickly moves toward the gas discharge port 17B, and discharges the gas for a short time, and becomes difficult to cause retention in the manifold 13. section. As a result, the gas discharge of the elongated applicator 10 can be performed in a short time, and the problem of deterioration due to the retention of the coating liquid 2 can also be solved.

相對的,在氣體排出口部歧管剖面積Sb是比供給口部歧管剖面積Sa還大的情況,因為在歧管13內朝向氣體排出口17B的塗布液2之流速變低,故將氣體排出的時間變長。而且,氣體排出效率降低,同時也變得容易發生因滯留而造成塗布液2劣化的問題。此外,針對歧管13之塗布寬度方向的剖面積,若是從供給口部歧管剖面積Sa朝向氣體排出口部歧管剖面積Sb是逐漸減少的話,則也可適用任意的面積之變化圖案。又,也可適用在中途會暫時地增加面積的變化圖案。為了更有效率地使氣體移動到氣體排出口17B、Sb(氣體排出口部歧管剖面積)/Sa(供給口部歧管剖面積)宜為1/2以下。 On the other hand, the manifold cross-sectional area Sb in the gas discharge port portion is larger than the supply port manifold cross-sectional area Sa, because the flow rate of the coating liquid 2 toward the gas discharge port 17B in the manifold 13 becomes low, so The time for gas discharge becomes longer. Further, the gas discharge efficiency is lowered, and at the same time, the problem that the coating liquid 2 is deteriorated due to the retention is likely to occur. In addition, if the cross-sectional area of the manifold 13 in the application width direction is gradually decreased from the supply port manifold sectional area Sa toward the gas discharge port manifold sectional area Sb, an arbitrary area change pattern can be applied. Further, it is also possible to apply a pattern of change in which the area is temporarily increased in the middle. In order to more efficiently move the gas to the gas discharge ports 17B and Sb (the gas discharge port portion manifold sectional area) / Sa (the supply port manifold sectional area) is preferably 1/2 or less.

再參照第4圖可知,氣體排出口17A、17B各自連接有氣體排出路徑80A、80B及排出用開閉閥81A、81B。由氣體排出口17A、17B所排出之氣體100及塗布液2係通過排出用開閉閥81A、81B及氣體排出路徑80A、80B而排出到廢液槽82A、82B。在此,為了使從氣體排出口17A、17B所排出的氣體100不返回塗布器10的內部,排出用開閉閥81A、81B係以設置在最接近氣體排出口17A、17B者為宜。排出用開閉閥81A、81B宜設置在至少與氣體排出口17A、17B距離100mm以內的位置。氣體排出路徑80A、80B也可適用金屬製配管或合成樹脂製配管等之任何材質的配管。氣體排出路 徑80A、80B因為與執行昇降動作的塗布器10連接,所以宜使用彎曲自如的合成樹脂製配管。 Referring to Fig. 4, the gas discharge ports 17A and 17B are connected to the gas discharge paths 80A and 80B and the discharge opening and closing valves 81A and 81B, respectively. The gas 100 and the coating liquid 2 discharged from the gas discharge ports 17A and 17B are discharged to the waste liquid tanks 82A and 82B through the discharge opening and closing valves 81A and 81B and the gas discharge paths 80A and 80B. Here, in order to prevent the gas 100 discharged from the gas discharge ports 17A and 17B from returning to the inside of the applicator 10, it is preferable that the discharge opening and closing valves 81A and 81B are provided closest to the gas discharge ports 17A and 17B. The discharge opening and closing valves 81A and 81B are preferably provided at positions at least within 100 mm from the gas discharge ports 17A and 17B. For the gas discharge paths 80A and 80B, piping of any material such as a metal pipe or a synthetic resin pipe can be applied. Gas discharge road Since the diameters 80A and 80B are connected to the applicator 10 that performs the lifting operation, it is preferable to use a flexible synthetic resin pipe.

又,在廢液83積存於廢液槽82A、82B呈一定量以上時,廢液83係藉吸引泵86A、86B而經過廢液排出路徑84A、84B及廢液用開閉閥85A、85B而被排出外部。廢液槽82A、82B設置有高側感測器87A、87B及低側感測器88A、88B。高側感測器87A、87B係檢知吸引泵86A、86B開始吸引動作的廢液83之容量。低側感測器88A、88B係檢知吸引泵86A、86B開始吸引動作的廢液83之容量。高側感測器87A、87B與低側感測器88A、88B之高低差宜為200mm以下,更好為100mm以下。 When the waste liquid 83 is stored in the waste liquid tanks 82A and 82B in a certain amount or more, the waste liquid 83 is passed through the waste liquid discharge paths 84A and 84B and the waste liquid opening and closing valves 85A and 85B by the suction pumps 86A and 86B. Drain the outside. The waste liquid tanks 82A, 82B are provided with high side sensors 87A, 87B and low side sensors 88A, 88B. The high side sensors 87A and 87B detect the capacity of the waste liquid 83 in which the suction pumps 86A and 86B start the suction operation. The low side sensors 88A and 88B detect the capacity of the waste liquid 83 in which the suction pumps 86A and 86B start the suction operation. The height difference between the high side sensors 87A, 87B and the low side sensors 88A, 88B is preferably 200 mm or less, more preferably 100 mm or less.

在此,有關廢液83之排出方法,也可以適用是使用高側感測器87A、87B或低側感測器88A、88B而間歇地將廢液83排出的方法、或是在積存一定量的廢液83之後由廢液槽82A、82B使廢液83的多餘的份量流出而使廢液槽82A、82B的液面89設為一定等等之方法。又,第4圖中係設置有2個廢液槽82A、82B,但也可將廢液槽82A、82B作成1個來共用,也可僅設置與氣體排出路徑80A、80B相同數量。 Here, the method of discharging the waste liquid 83 may be applied to a method of intermittently discharging the waste liquid 83 using the high side sensors 87A, 87B or the low side sensors 88A, 88B, or by accumulating a certain amount. After the waste liquid 83, the excess amount of the waste liquid 83 is discharged from the waste liquid tanks 82A and 82B, and the liquid level 89 of the waste liquid tanks 82A and 82B is set to be constant. Further, in the fourth drawing, two waste liquid tanks 82A and 82B are provided. However, the waste liquid tanks 82A and 82B may be shared by one, or may be provided in the same number as the gas discharge paths 80A and 80B.

在此,為了以更短時間將氣體100排出,是有必要在氣體排出路徑80A、80B設置吸引機構。吸引機構可以是使用吸引泵等,但是吸引泵之泵內部係塗布液2固接而無法長期間使用,具有所謂的難以進行排出量微調整之問題。於是、宜使用可獲得與吸引泵同等作用之運用虹吸管原理的吸引機構。此吸引機構為,將氣體排出路徑80A、80B之出口90A、 90B配置在比吐出口15還低的位置,同時以液體充滿從氣體排出口17A、17B到出口90A、90B的氣體排出路徑80A、80B之內部,藉此而產生吸引作用者。亦即,係利用吐出口15與氣體排出路徑80A、80B之出口90A、90B間的高低差所產生的液壓而產生吸引作用者。若使用運用此虹吸管原理的吸引機構,則僅調整吐出口15與氣體排出路徑80A、80B之出口90A、90B的高低差H′就可進行排出量之微調整。再者,因為未使用像吸引泵那樣的驅動裝置,故維修保養容易。 Here, in order to discharge the gas 100 in a shorter time, it is necessary to provide a suction mechanism in the gas discharge paths 80A and 80B. The suction mechanism may be a suction pump or the like. However, the pump internal coating liquid 2 of the suction pump is fixed and cannot be used for a long period of time, and there is a problem that it is difficult to finely adjust the discharge amount. Therefore, it is preferable to use an attraction mechanism that can obtain the same function as the suction pump and that uses the principle of the siphon. The attraction mechanism is an outlet 90A of the gas discharge paths 80A, 80B, The 90B is disposed at a position lower than the discharge port 15, and simultaneously fills the inside of the gas discharge paths 80A, 80B from the gas discharge ports 17A, 17B to the outlets 90A, 90B with liquid, thereby generating a suction effect. In other words, the suction force is generated by the hydraulic pressure generated by the difference between the discharge port 15 and the outlets 90A and 90B of the gas discharge paths 80A and 80B. When the suction mechanism using the principle of the siphon is used, only the height difference H' between the discharge port 15 and the outlets 90A and 90B of the gas discharge paths 80A and 80B can be adjusted to finely adjust the discharge amount. Furthermore, since a driving device such as a suction pump is not used, maintenance is easy.

又,氣體排出路徑80A、80B與氣體排出口17A、17B係配置在鉛直方向上的大致同一高度,或是配置在較其為低的位置。依該配置可最有效率地發揮依虹吸管原理的吸引作用。在此,氣體排出路徑80A、80B與氣體排出口17A、17B配置在鉛直方向上大致同一高度,或是配置在較其為低的位置,乃係意味著氣體排出路徑80A、80B是從氣體排出口17A、17B中心相對於水平線是θ=±30°範圍以內的方向延伸,且係配置在從氣體排出口17A、17B的中心於鉛直方向上方50mm還低的位置上。而在是比θ=-30°還小的情況,基於氣體100的浮力之阻力變大,變得難以從氣體排出口17A、17B將氣體100對氣體排出路徑80A、80B排出。在是比θ=+30°還大、氣體排出路徑80A、80B被配置於距離氣體排出口17A、17B中心50mm的上方還高的位置之情況,因為基於氣體排出路徑80A、80B的最上部和最下部之高低差的液壓成為阻力,所以由氣體排出路徑80A、80B所排出的塗布液2的量降低,其結果,因為氣體100的排出量會降低所以並不 佳。 Further, the gas discharge paths 80A and 80B and the gas discharge ports 17A and 17B are disposed at substantially the same height in the vertical direction or at a position lower than the gas discharge ports 17A and 17B. According to this configuration, the attraction of the siphon principle can be utilized most efficiently. Here, the gas discharge paths 80A and 80B and the gas discharge ports 17A and 17B are disposed at substantially the same height in the vertical direction or at a position lower than the gas discharge ports 80A and 80B, which means that the gas discharge paths 80A and 80B are from the gas discharge line. The centers of the outlets 17A and 17B extend in a direction within a range of θ=±30° with respect to the horizontal line, and are disposed at positions lower than 50 mm above the center of the gas discharge ports 17A and 17B in the vertical direction. On the other hand, when the ratio is smaller than θ = -30°, the resistance due to the buoyancy of the gas 100 becomes large, and it becomes difficult to discharge the gas 100 to the gas discharge paths 80A and 80B from the gas discharge ports 17A and 17B. In the case where the gas discharge paths 80A and 80B are disposed at a position higher than 50 mm from the center of the gas discharge ports 17A and 17B, the uppermost portion of the gas discharge paths 80A and 80B is larger than θ=+30°. Since the hydraulic pressure at the lowest level is the resistance, the amount of the coating liquid 2 discharged from the gas discharge paths 80A and 80B is lowered. As a result, the discharge amount of the gas 100 is lowered, so good.

又,氣體排出路徑80A、80B之出口90A、90B係以被開放於大氣中者較好,而且,氣體排出路徑80A、80B之最下部宜被開放於大氣中。但是,依塗布液2的特性,在既停止氣體排出動作之際,從氣體排出路徑80A、80B之出口90A、90B吸入外氣,依此,也會引發產生乾燥固化物而造成阻塞。因此,為防止因乾燥固化物造成之阻塞,氣體排出路徑80A、80B之出口90A、90B宜被浸泡於內部是一大氣壓的廢液槽82A、82B中所儲存的廢液83中。 Further, it is preferable that the outlets 90A and 90B of the gas discharge paths 80A and 80B are opened to the atmosphere, and the lowermost portions of the gas discharge paths 80A and 80B are preferably opened to the atmosphere. However, depending on the characteristics of the coating liquid 2, when the gas discharge operation is stopped, the outside air is taken in from the outlets 90A and 90B of the gas discharge paths 80A and 80B, whereby the dry solidified material is caused to cause clogging. Therefore, in order to prevent clogging due to dry solidified matter, the outlets 90A, 90B of the gas discharge paths 80A, 80B are preferably immersed in the waste liquid 83 stored in the waste liquid tanks 82A, 82B which are inside the atmospheric pressure.

在此,被儲存在廢液槽82A、82B內的廢液83之液面89係以位在比吐出口15還低的位置為宜。但是,在吐出口15與儲存在廢液槽82A、82B內的廢液83的液面89之間的高低差H、及吐出口15與氣體排出路徑80A、80B的出口90A、90B之間的高低差H′過大時,依高低差H或高低差H′所產生的液壓,會造成從氣體排出口17A、17B所排出之塗布液2的量變得相對於供給到塗布器10內部的量還超過更多。因而,歧管13的一部分成為負壓並發生從吐出口15吸入外氣的現象。為此,有必要藉由調整流路阻力、在氣體排出路徑80A、80B之任意位置上設置流量調整閥,以調整對塗布器10內部之供給量與來自於氣體排出口17A、17B的排出量之比率。流路阻力係由高低差H或高低差H′的大小、氣體排出口17A、17B的口徑、氣體排出路徑80A、80B的配管徑或配管長度所決定。 Here, the liquid level 89 of the waste liquid 83 stored in the waste liquid tanks 82A and 82B is preferably at a position lower than the discharge port 15. However, between the discharge port 15 and the level H between the liquid surface 89 of the waste liquid 83 stored in the waste liquid tanks 82A and 82B, and between the discharge port 15 and the outlets 90A and 90B of the gas discharge paths 80A and 80B. When the height difference H' is too large, the hydraulic pressure generated by the height difference H or the height difference H' causes the amount of the coating liquid 2 discharged from the gas discharge ports 17A, 17B to become smaller than the amount supplied to the inside of the applicator 10. More than more. Therefore, a part of the manifold 13 becomes a negative pressure and a phenomenon in which the outside air is taken in from the discharge port 15 occurs. Therefore, it is necessary to adjust the flow path resistance and the flow rate adjustment valve at any position of the gas discharge paths 80A, 80B to adjust the supply amount to the inside of the applicator 10 and the discharge amount from the gas discharge ports 17A, 17B. The ratio. The flow path resistance is determined by the height difference H or the height difference H', the diameter of the gas discharge ports 17A and 17B, the pipe diameter of the gas discharge paths 80A and 80B, or the pipe length.

在此,來自氣體排出口17A、17B的排出量Q2對朝向塗布 器10內部的供給量Q1之比率Q2/Q1,較佳為0.5~0.95,而設為0.7~0.9更好。當比該範圍還大時,變得容易從吐出口15吸入外氣,而比該範圍小時,為將氣體100排出而使應供給的塗布液2之量變多,而無法將氣體100有效率地排出。又,氣體排出路徑80A、80B的內徑係設定為使氣體100不滯留在配管內部者為宜。為了將比率Q2/Q1設為較佳範圍而使氣體100不滯留在配管內部,高低差H或高低差H′係設成800mm以下者為佳,而氣體排出口17A、17B的內徑為10mm以下、氣體排出路徑80A、80B的配管徑設定為內徑是10mm以下。再者,高低差H或高低差H′係設成500mm以下,氣體排出口17A、17B的內徑為6mm以下,氣體排出路徑80A、80B之配管徑係設定為內徑是6mm以下。 Here, the discharge amount Q2 from the gas discharge ports 17A, 17B is applied toward the coating side. The ratio Q2/Q1 of the supply amount Q1 inside the device 10 is preferably 0.5 to 0.95, and more preferably 0.7 to 0.9. When it is larger than this range, it is easy to take in the outside air from the discharge port 15, and when it is smaller than this range, the amount of the coating liquid 2 to be supplied is increased in order to discharge the gas 100, and the gas 100 cannot be efficiently used. discharge. Moreover, it is preferable that the inner diameters of the gas discharge paths 80A and 80B are such that the gas 100 does not remain inside the pipe. In order to set the ratio Q2/Q1 to a preferable range, the gas 100 is not retained in the inside of the pipe, and the height difference H or the height difference H' is preferably 800 mm or less, and the gas discharge ports 17A and 17B have an inner diameter of 10 mm. Hereinafter, the pipe diameters of the gas discharge paths 80A and 80B are set to have an inner diameter of 10 mm or less. In addition, the height difference H or the height difference H' is set to 500 mm or less, the inner diameters of the gas discharge ports 17A and 17B are 6 mm or less, and the pipe diameters of the gas discharge paths 80A and 80B are set to have an inner diameter of 6 mm or less.

又,位在塗布器10內部之直徑未滿1mm的微小氣體101並不容易從氣體排出口17A、17B排出。為消除此微小氣體101,係朝位在塗布器10內部的歧管13供給大容量的氣體,而使其氣體合併微小氣體101。若以前述的方法使此大容量的氣體朝歧管13的外部排出的話,結果,微小氣體101係消失。 Further, the minute gas 101 having a diameter of less than 1 mm inside the applicator 10 is not easily discharged from the gas discharge ports 17A and 17B. In order to eliminate the minute gas 101, a large-capacity gas is supplied to the manifold 13 inside the applicator 10, and the gas is combined with the fine gas 101. When the large-volume gas is discharged to the outside of the manifold 13 by the above-described method, the minute gas 101 disappears.

為了此目的,在本實施形態之塗布模具1,如第4圖所示,係於連接至氣體排出路徑80A的排出用開閉閥81A之下游側的位置,連接有用以對塗布器10內部供給氣體之氣體供給路徑91。此氣體供給路徑91係具有氣體供給用開閉閥92、及在氣體供給用開閉閥92之上游側被開放於大氣中之氣體供給路徑91的入口93。在此氣體供給路徑91,氣體供給用 開閉閥92和入口93係作為氣體供給機構發揮作用。在令氣體供給用開閉閥92為「開啟」時,成為可從入口93將大氣壓的氣體對塗布器10內部作供給。在此,為了在開啟氣體供給用開閉閥92之際,使氣體排出路徑80A的塗布液2不會朝向氣體供給路徑91側逆流,氣體供給路徑91的至少一部分宜配置在比氣體排出路徑80A還高的位置。 For this purpose, the coating die 1 of the present embodiment is connected to the downstream side of the discharge opening and closing valve 81A connected to the gas discharge path 80A, as shown in Fig. 4, and is connected to supply gas to the inside of the applicator 10. The gas supply path 91. The gas supply path 91 has a gas supply on-off valve 92 and an inlet 93 that is opened to the atmosphere in the gas supply path 91 on the upstream side of the gas supply on-off valve 92. In this gas supply path 91, gas supply The on-off valve 92 and the inlet 93 function as a gas supply mechanism. When the gas supply on-off valve 92 is "opened", the atmospheric pressure gas can be supplied from the inlet 93 to the inside of the applicator 10. Here, in order to open the gas supply opening/closing valve 92, the coating liquid 2 of the gas discharge path 80A does not flow backward toward the gas supply path 91 side, and at least a part of the gas supply path 91 is preferably disposed more than the gas discharge path 80A. High position.

又,除了從入口93供給大氣壓的氣體以外,再加上由泵或空壓源等所加壓的氣體從入口93作供給亦可。在供給加壓氣體的情況,在氣體供給速度過快時,則到達塗布器10內部的氣體與塗布液2混合而產生氣泡,反而有產生微小氣體101之虞。在此情況,宜藉由在氣體供給路徑91上設置流量調整閥等而得以慢慢地供給氣體。此外,在供給由泵或壓空源等所加壓的氣體之情況,在氣體供給路徑91之配置上並沒有限制。而要作為氣體供給路徑91來使用的配管之材質,可以使用金屬或合成樹脂等任一者,但因合成樹脂容易處理故較佳。 Further, in addition to the gas supplied from the inlet 93 to the atmospheric pressure, a gas pressurized by a pump or an air pressure source may be supplied from the inlet 93. When the pressurized gas is supplied, when the gas supply rate is too fast, the gas that has reached the inside of the applicator 10 mixes with the coating liquid 2 to generate bubbles, and conversely, the minute gas 101 is generated. In this case, it is preferable to supply the gas slowly by providing a flow rate adjusting valve or the like on the gas supply path 91. Further, in the case of supplying a gas pressurized by a pump or a pressure source or the like, there is no limitation on the arrangement of the gas supply path 91. The material of the pipe to be used as the gas supply path 91 may be any metal or synthetic resin, but it is preferable because the synthetic resin is easy to handle.

再者,本實施形態中,氣體供給路徑91被連接於與氣體排出口17A連繋的氣體排出路徑80A,但是也可以連接到與位在歧管13端部之氣體排出口17B連繋的氣體排出經由80B、或是與位在塗布器10之供給口16連繋的模具供給路66相連接。亦即,只要氣體供給路徑91可對歧管13內部供給氣體,則也可連接到任何場所。除了供給口16、氣體排出口17A、17B以外,將連接於歧管13的孔設置於前唇部11或後唇部12,對此等的孔連接氣體供給路徑91亦可。又, 氣體供給路徑91也可與能朝塗布器10供給氣體的部分進行複數個連接。 Further, in the present embodiment, the gas supply path 91 is connected to the gas discharge path 80A connected to the gas discharge port 17A, but may be connected to the gas discharge connected to the gas discharge port 17B located at the end of the manifold 13 via 80B or connected to a mold supply path 66 that is connected to the supply port 16 of the applicator 10. That is, as long as the gas supply path 91 can supply the gas to the inside of the manifold 13, it can be connected to any place. In addition to the supply port 16 and the gas discharge ports 17A and 17B, the hole connected to the manifold 13 is provided in the front lip portion 11 or the rear lip portion 12, and the holes may be connected to the gas supply path 91. also, The gas supply path 91 may also be connected in plurality to a portion that can supply gas to the applicator 10.

此外,用以在排出氣體100之際進行開閉的排出用開閉閥81A、81B、在消除微小氣體101之際進行開閉的氣體供給用開閉閥92、線性馬達33、馬達43、以及含有驅動注射泵64的活塞68之注射泵用馬達71的塗布液供給裝置單元60、等之塗布模具1的可動部全部是依控制裝置95的控制信號而動作。接著,控制指令信號係按照安裝於控制裝置95內的自動運轉程式而被傳送到各裝置,而執行預先決定的動作。又,在有必要變更各動作條件之情況,若對操作盤96適宜地輸入變更參數的話,其係被傳達到控制裝置95而變更運轉動作。 In addition, the discharge opening and closing valves 81A and 81B for opening and closing the gas 100 and the gas supply opening and closing valve 92 for opening and closing the micro gas 101, the linear motor 33, the motor 43, and the drive pump are provided. All of the movable portions of the coating liquid supply device unit 60 of the syringe pump motor 71 of the piston 68 of the 64, and the like, are operated by the control signal of the control device 95. Next, the control command signal is transmitted to each device in accordance with the automatic operation program installed in the control device 95, and a predetermined operation is performed. Further, when it is necessary to change the respective operating conditions, if the change parameter is appropriately input to the operation panel 96, it is transmitted to the control device 95 to change the operation operation.

其次,茲針對使用此塗布模具1將塗布器10內部的氣體排出的方法之一例作說明。在一開始,參照第4圖和第5圖來針對從塗布器10的內部完全沒有塗布液2而僅充填著氣體的狀態將氣體100排出並充填塗布液2之塗布生產前的氣體100之排出方法進行說明。首先,在第4圖使塗布液槽61到注射唧筒67的內部充滿塗布液2。其次,在使排出用開閉閥81A、81B及氣體供給用開閉閥92全部設為「關閉」的狀態下,使注射泵64的活塞68上昇,將充填到注射唧筒67內部的塗布液2朝塗布器10側沖走。藉此,如第5(a)圖所示、塗布液2從供給口16被送往歧管13。在注射泵64持續地供給塗布液2之後,如第5(b)圖所示,塗布液2在歧管13及狹縫14的塗布寬度方向擴展,塗布液2的一部分通 過狹縫14並由吐出口15吐出。再者,在利用注射泵64持續供給塗布液2時,如第5(c)圖所示,塗布液2被充填於狹縫14全區域並由吐出口15吐出,但是因為在歧管13長邊方向的兩端部,氣體100被關閉在上側,所以氣體100難以自吐出口15排出。此時,僅於自注射泵64供給塗布液2的期間,將氣體供給用開閉閥92維持「關閉」而將排出用開閉閥81A、81B設定為「開啟」。依此,歧管13會產生塗布液2從供給口16朝向氣體排出口17A、17B流動。依該流動,可將被關閉在塗布器10內部的氣體100連同塗布液2一起自氣體排出口17A、17B排出。在塗布器10內部的氣體100被完全排出之前,若反複此氣體排出動作的話,則如第5(d)圖所示,塗布器10的內部僅充滿塗布液2,而結束對塗布器10充填塗布液的作業。這樣的塗布生產前之氣體排出動作,可以在進行從注射泵64朝塗布器10供給塗布液2的供給動作之期間使其結束,也可以在反複進行塗布液2供給動作的期間,執行複數次再使其結束。 Next, an example of a method of discharging the gas inside the applicator 10 using the coating die 1 will be described. At the outset, with reference to Figs. 4 and 5, the gas 100 is discharged from the state in which the coating liquid 2 is completely removed from the inside of the applicator 10, and the gas 100 is discharged and the coating liquid 2 is filled. The method is explained. First, in the fourth drawing, the coating liquid tank 61 is filled into the inside of the injection cylinder 67 to fill the coating liquid 2. When all of the discharge opening and closing valves 81A and 81B and the gas supply on-off valve 92 are "closed", the piston 68 of the syringe pump 64 is raised, and the coating liquid 2 filled in the inside of the injection cylinder 67 is applied. The side of the device 10 is washed away. Thereby, as shown in Fig. 5(a), the coating liquid 2 is sent from the supply port 16 to the manifold 13. After the application of the coating liquid 2 by the syringe pump 64, as shown in Fig. 5(b), the coating liquid 2 spreads in the application width direction of the manifold 13 and the slit 14, and a part of the coating liquid 2 passes. The slit 14 is passed through the discharge port 15 and discharged. When the coating liquid 2 is continuously supplied by the syringe pump 64, as shown in Fig. 5(c), the coating liquid 2 is filled in the entire area of the slit 14 and discharged from the discharge port 15, but since it is long in the manifold 13 Since the gas 100 is closed on the upper side at both end portions in the side direction, it is difficult for the gas 100 to be discharged from the discharge port 15. At this time, the gas supply opening/closing valve 92 is kept "closed" and the discharge opening and closing valves 81A, 81B are set to "open" only during the period from the supply of the coating liquid 2 by the syringe pump 64. Accordingly, the manifold 13 generates the coating liquid 2 to flow from the supply port 16 toward the gas discharge ports 17A, 17B. According to this flow, the gas 100 closed inside the applicator 10 can be discharged together with the coating liquid 2 from the gas discharge ports 17A, 17B. When the gas discharge operation is repeated until the gas 100 inside the applicator 10 is completely discharged, as shown in the fifth (d), the inside of the applicator 10 is only filled with the coating liquid 2, and the filling of the applicator 10 is completed. The operation of the coating liquid. The gas discharge operation before the application of the coating may be completed during the supply operation of supplying the coating liquid 2 from the syringe pump 64 to the applicator 10, or may be performed plural times while the supply operation of the coating liquid 2 is repeated. Let it end.

其次,參照第4圖和第6圖來針對在氣體100侵入於充填有塗布液2的塗布器10內部時所實施之塗布生產中的氣體排出方法進行說明。 Next, a gas discharge method in the coating production performed when the gas 100 intrudes into the inside of the applicator 10 filled with the coating liquid 2 will be described with reference to FIGS. 4 and 6 .

首先,如第6(a)圖所示,在塗布生產中侵入到塗布器10內部的氣體100係積存在歧管13或供給口16的上部。 First, as shown in Fig. 6(a), the gas 100 that has entered the inside of the applicator 10 during coating production is accumulated in the upper portion of the manifold 13 or the supply port 16.

為了將此氣體100排出,係在將氣體供給用開閉閥92「關閉」的狀態下,僅於自注射泵64供給塗布液2的期間,將排出用開閉閥81A、81B設為「開啟」。依此,而在歧管13 產生從供給口16朝向氣體排出口17A、17B流動之塗布液2。歧管13的上緣20係與吐出口面21平行,或是以吐出口面21為基準而在從供給口16到氣體排出口17B之間朝上傾斜。因此,朝向氣體排出口17B之氣體100的流動在歧管13的上緣20不受到妨礙。又,因為歧管13之塗布寬度方向的剖面積係從供給口16朝氣體排出口17B減少且為Sa(供給口部歧管剖面積)>Sb(氣體排出口部歧管剖面積),所以朝向氣體排出口17B的塗布液2之流速亦高。因此,如第6(b)圖所示,積存於塗布器10內部的氣體100係快速地集合於位在供給口16上部的氣體排出口17A附近及位在歧管13兩端部的氣體排出口17B附近。在此,在令氣體供給用開閉閥92為「關閉」的狀態,僅於自注射泵64對塗布器10供給塗布液2的期間,反複令排出用開閉閥81A、81B為「開啟」的氣體排出動作。其結果,如第6(c)圖所示,氣體100自塗布器10內部被完全地排出,而在歧管13等之流路上僅充滿塗布液2,而結束了侵入到塗布器10內部之氣體100的排出作業。這樣的塗布生產中之氣體排出動作可以僅執行1次,也可反複執行。 In the state in which the gas supply opening/closing valve 92 is "closed", the discharge opening and closing valves 81A and 81B are set to "on" only while the application liquid 2 is supplied from the syringe pump 64. Accordingly, in the manifold 13 The coating liquid 2 flowing from the supply port 16 toward the gas discharge ports 17A, 17B is generated. The upper edge 20 of the manifold 13 is parallel to the discharge port surface 21, or is inclined upward from the supply port 16 to the gas discharge port 17B with respect to the discharge port surface 21. Therefore, the flow of the gas 100 toward the gas discharge port 17B is not hindered at the upper edge 20 of the manifold 13. In addition, since the cross-sectional area of the manifold 13 in the application width direction is reduced from the supply port 16 toward the gas discharge port 17B and is Sa (supply port manifold sectional area) > Sb (gas discharge port portion manifold sectional area), The flow rate of the coating liquid 2 toward the gas discharge port 17B is also high. Therefore, as shown in Fig. 6(b), the gas 100 accumulated inside the applicator 10 is rapidly collected in the vicinity of the gas discharge port 17A located at the upper portion of the supply port 16 and the gas row at the both ends of the manifold 13. Exit near 17B. In the state in which the gas supply opening/closing valve 92 is "closed", the discharge opening/closing valves 81A and 81B are repeatedly "opened" while the application liquid 2 is being supplied from the syringe pump 64. Discharge action. As a result, as shown in Fig. 6(c), the gas 100 is completely discharged from the inside of the applicator 10, and only the coating liquid 2 is filled in the flow path of the manifold 13 or the like, and the intrusion into the inside of the applicator 10 is completed. The discharge operation of the gas 100. The gas discharge operation in such coating production may be performed only once or repeatedly.

但是,如第7(a)圖所示,在既充填有塗布液2的塗布器10內部,有時會有直徑未滿1mm的微小氣體101侵入的情況。因為此微小氣體101非常小,所以對微小氣體101作用的浮力很小。又,在附著於歧管13的壁面之後,光靠被供給的塗布液2之流動係難以移動。因此,在上述之塗布生產中的氣體排出方法中有無法將微小氣體101排出的情況。有 關將微小氣體101排出的塗布生產中之微小氣體排出方法,茲使用第4圖和第7圖進行以下的說明。 However, as shown in Fig. 7(a), in the inside of the applicator 10 in which the coating liquid 2 is filled, the micro gas 101 having a diameter of less than 1 mm may enter. Since this minute gas 101 is very small, the buoyancy acting on the minute gas 101 is small. Moreover, after adhering to the wall surface of the manifold 13, the flow of the coating liquid 2 to be supplied is hard to move. Therefore, in the gas discharge method in the above-described coating production, there is a case where the minute gas 101 cannot be discharged. Have The method of discharging the minute gas in the coating production in which the fine gas 101 is discharged will be described below using FIGS. 4 and 7.

首先,停止從注射泵64朝塗布器10供給塗布液2並令氣體供給用開閉閥92及排出用開閉閥81A、81B全部為「開啟」。依此,塗布液2係自吐出口15及氣體排出口17A、17B被排出,並與塗布液2的排出量對應而如第7(b)圖所示,供給氣體102係通過氣體供給路徑91、氣體排出路徑80A、並通過氣體排出口17A而被供給至供給口16、歧管13。藉由歧管13內的塗布液2被置換成此供給氣體102,使得由供給氣體102所形成的空間係從氣體排出口17A朝塗布寬度方向一邊膨脹一邊形成在歧管13的上部。 First, the application of the coating liquid 2 to the applicator 10 from the syringe pump 64 is stopped, and all of the gas supply opening and closing valve 92 and the discharge opening and closing valves 81A and 81B are "opened". As a result, the coating liquid 2 is discharged from the discharge port 15 and the gas discharge ports 17A and 17B, and corresponds to the discharge amount of the coating liquid 2, and as shown in the seventh (b) diagram, the supply gas 102 passes through the gas supply path 91. The gas discharge path 80A is supplied to the supply port 16 and the manifold 13 through the gas discharge port 17A. The coating liquid 2 in the manifold 13 is replaced with the supply gas 102, so that the space formed by the supply gas 102 is formed on the upper portion of the manifold 13 while being expanded from the gas discharge port 17A toward the coating width direction.

接著,在供給氣體102的空間形成到微小氣體101所存在的位置時,如第7(c)圖所示,微小氣體101在基於供給氣體102所形成的空間被合併或是吸收,所以微小氣體101係消失。如第7(d)圖所示,當供給氣體102的空間至少於歧管13上部遍及長邊方向的全寬形成之後,令氣體供給用開閉閥92、排出用開閉閥81A、81B全部為「關閉」以停止供給氣體102之供給。之後,在實施了上述之通常的塗布生產中之氣體排出作業之後,位在塗布器10內部的供給氣體102被全部排出而在塗布器10內部僅充滿著塗布液2。結果,原本既有的微小氣體101係被排出於外部。在以上的實施形態中,為了快速地將供給氣體102對歧管13作供給,係令氣體供給用開閉閥92、排出用開閉閥81A、81B全部為「開啟」。但是,使未連接有氣體供給路徑91的氣體排出路徑80B之 排出用開閉閥81B維持「關閉」的狀態下而令氣體供給用開閉閥92和排出用開閉閥81A為「開啟」的狀態,也可將供給氣體102對歧管13作供給。 Next, when the space in which the gas 102 is supplied is formed at a position where the minute gas 101 exists, as shown in FIG. 7(c), the minute gas 101 is combined or absorbed in the space formed by the supply gas 102, so the minute gas The 101 series disappeared. As shown in Fig. 7(d), after the space for supplying the gas 102 is formed at least over the entire width of the upper portion of the manifold 13 in the longitudinal direction, the gas supply opening and closing valve 92 and the discharge opening and closing valves 81A and 81B are all " "Close" to stop the supply of the supply gas 102. Thereafter, after the gas discharge operation in the above-described normal coating production is performed, the supply gas 102 located inside the applicator 10 is completely discharged, and only the coating liquid 2 is filled inside the applicator 10. As a result, the originally existing minute gas 101 is discharged to the outside. In the above embodiment, in order to quickly supply the supply gas 102 to the manifold 13, the gas supply opening and closing valve 92 and the discharge opening and closing valves 81A and 81B are all "on". However, the gas discharge path 80B to which the gas supply path 91 is not connected is made When the discharge opening/closing valve 81B is maintained in the "closed" state, the gas supply opening and closing valve 92 and the discharge opening and closing valve 81A are "opened", and the supply gas 102 can be supplied to the manifold 13.

在以上任一個氣體排出方法中,有關排出用開閉閥81A、81B之開閉操作,為了防止從吐出口15吸入氣體100或來自氣體排出口17A、17B的逆流,係以在注射泵64進行塗布液2的供給當中進行者為宜。為此,有必要在令排出用開閉閥81A、81B為「關閉」之後,使基於注射泵64的供給停止。又,在上述的實施樣態例中,排出用開閉閥81A、81B係全部同時設為「開啟」,但也可以是各自單獨地依序動作,或是按預先的組合形式來動作。在此情況,開閉順序並未特別限制,但是為了不使積存在供給口16附近的氣體100流入歧管13而可進行有效率地排出,係以將供給口16連繋的排出用開閉閥81A設成先「開啟」者為宜。在以上的實施形態中,為了將塗布器10之內部氣體100、微小氣體101、供給氣體102及塗布液2從氣體排出口17A、17B進行排出,係使用注射泵64作為塗布液2的供給機構。但是,供給機構不受此所限,也可以是對塗布液槽61加壓而供給塗布液2,或是使用其他的公知的泵以進行塗布液2的供給。 In any of the above-described gas discharge methods, the opening and closing operations of the discharge opening and closing valves 81A and 81B are performed by the injection pump 64 in order to prevent the gas 100 from being sucked from the discharge port 15 or the reverse flow from the gas discharge ports 17A and 17B. It is advisable to carry out the supply of 2 . Therefore, it is necessary to stop the supply by the syringe pump 64 after the discharge opening and closing valves 81A and 81B are "closed". Further, in the above-described embodiment, the discharge opening and closing valves 81A and 81B are all set to "on" at the same time. However, they may be operated individually or sequentially in a combined manner. In this case, the opening and closing sequence is not particularly limited. However, in order to prevent the gas 100 in the vicinity of the supply port 16 from flowing into the manifold 13 and efficiently discharging it, the discharge opening and closing valve 81A that connects the supply port 16 is provided. It is advisable to "open" first. In the above embodiment, in order to discharge the internal gas 100, the micro gas 101, the supply gas 102, and the coating liquid 2 of the applicator 10 from the gas discharge ports 17A and 17B, the syringe pump 64 is used as the supply mechanism of the coating liquid 2. . However, the supply mechanism is not limited thereto, and the coating liquid 2 may be supplied by pressurizing the coating liquid tank 61 or by using another known pump.

此外,利用上述的氣體排出方法從塗布器10內部排出的氣體100、微小氣體101、供給氣體102及塗布液2係經由氣體排出路徑80A、80B而排出於廢液槽82A、82B,塗布液2被當作廢液83而儲存。在此,如第4圖所示,在利用設置在廢液槽82A、82B的高側感測器87A、87B檢知廢液83的 液面89變得比Q4還高時,係使吸引泵86A、86B運轉。接著,令廢液用開閉閥85A、85B為「開啟」,再利用吸引泵86A、86B自廢液排出路徑84A、84B吸引廢液83,而使廢液83排出於未圖示的廢液路徑。此後,在利用低側感測器88A、88B檢知廢液83的液面89是變得比Q3還低時,令廢液用開閉閥85A、85B為「關閉」而停止吸引泵86A、86B並使廢液83的排出動作終了。 In addition, the gas 100, the fine gas 101, the supply gas 102, and the coating liquid 2 discharged from the inside of the applicator 10 by the above-described gas discharge method are discharged to the waste liquid tanks 82A and 82B via the gas discharge paths 80A and 80B, and the coating liquid 2 It is stored as waste liquid 83. Here, as shown in FIG. 4, the waste liquid 83 is detected by the high side sensors 87A, 87B provided in the waste liquid tanks 82A, 82B. When the liquid level 89 becomes higher than Q4, the suction pumps 86A and 86B are operated. Then, the waste liquid opening and closing valves 85A and 85B are "opened", and the waste liquid 83 is sucked from the waste liquid discharge paths 84A and 84B by the suction pumps 86A and 86B, and the waste liquid 83 is discharged to a waste liquid path (not shown). . Thereafter, when it is detected by the low-side sensors 88A and 88B that the liquid level 89 of the waste liquid 83 is lower than Q3, the waste liquid opening and closing valves 85A and 85B are "closed", and the suction pumps 86A, 86B are stopped. The discharge operation of the waste liquid 83 is finished.

在此,在來自塗布器10之氣體排出動作中使吸引泵86A、86B運轉之後,有時來自氣體排出口17A、17B的塗布液2之排出量會產生變化而變得無法控制氣體排出量。因此,吸引泵86A、86B宜於氣體排出動作未被進行時,亦即在排出用開閉閥81A、81B為「關閉」時進行運轉者為宜。 Here, after the suction pumps 86A and 86B are operated in the gas discharge operation from the applicator 10, the discharge amount of the coating liquid 2 from the gas discharge ports 17A and 17B may change and the gas discharge amount may not be controlled. Therefore, it is preferable that the suction pumps 86A and 86B are operated when the gas discharge operation is not performed, that is, when the discharge opening and closing valves 81A and 81B are "closed".

此外,以上所述乃係將利用供給氣體102消除微小氣體101的方法與利用塗布液2的流動力而排出氣體100的方法作組合運用的一個例子。但是,有關與利用供給氣體102消除微小氣體101的方法作組合之氣體100的排出方法,也可以適用如下之方法,亦即、於氣體排出路徑80A、80B連接泵等之機械式吸引機構而進行吸引的方法、以及將氣體排出口17A、17B設置於塗布器10的上面並將氣體排出內部流路19A、19B作成在鉛直方向延伸的路徑而利用浮力將氣體100排出的方法。 Further, the above is an example of a combination of a method of eliminating the minute gas 101 by the supply gas 102 and a method of discharging the gas 100 by the flow force of the coating liquid 2. However, the method of discharging the gas 100 in combination with the method of eliminating the minute gas 101 by the supply gas 102 may be carried out by connecting a mechanical suction mechanism such as a pump to the gas discharge paths 80A and 80B. The method of suction and the method in which the gas discharge ports 17A and 17B are provided on the upper surface of the applicator 10 and the gas is discharged from the internal flow paths 19A and 19B to form a path extending in the vertical direction, and the gas 100 is discharged by buoyancy.

其次,針對使用搭載著本發明所涉及的塗布器10之塗布模具1來對基板3進行塗布的方法之一例子作說明。 Next, an example of a method of applying the substrate 3 by using the coating die 1 on which the applicator 10 of the present invention is mounted will be described.

首先,在實施使塗布模具1所具備的各可動部返回原點之 後,各可動部移動至預先所設定的待機位置。此外,截至此時,用以實現設為目標的塗布條件之參數既完成對操作盤96之輸入。再者,將塗布器10內部的氣體100排出並充填塗布液2之作業亦藉上述之塗布生產前的氣體排出方法完成。從塗布液槽61到塗布器10內部充滿著塗布液2。此時,排出用開閉閥81A、81B及氣體供給用開閉閥92全部係「關閉」的狀態,擦拭單元50係位在離開塗布器10的位置上。 First, the moving parts provided in the coating die 1 are returned to the origin. Thereafter, each movable portion moves to a standby position set in advance. Further, as of this time, the parameters for realizing the coating conditions set as the target complete the input to the operation panel 96. Further, the operation of discharging the gas 100 inside the applicator 10 and filling the coating liquid 2 is also completed by the above-described gas discharge method before coating production. The coating liquid 2 is filled from the coating liquid tank 61 to the inside of the applicator 10. At this time, all of the discharge opening and closing valves 81A and 81B and the gas supply on-off valve 92 are "closed", and the wiping unit 50 is positioned away from the applicator 10.

在既結束以上的準備動作之時間點,使擦拭單元50移動至塗布器10正下方。接著,使未圖示的複數個升降銷於平台32的表面上昇,而從未圖示的載置器使基板3積載於升降銷上部。然後使升降銷下降,並使基板3放置在平台32上,再以未圖示的調心裝置進行基板3的定位,利用未圖示的複數個吸附孔對基板3進行吸附保持。而與此並行地使塗布液供給裝置單元60進行運轉而從塗布器10使少量的塗布液2朝向托架54吐出。接著,利用昇降裝置單元40使塗布器10下降並使塗布器10的下端一邊與擦拭頭51接觸一邊使擦拭頭51移動於塗布器10的長邊方向。在塗布器10的吐出口面21之周邊依擦拭頭51的擦拭而被清掃之後,利用昇降裝置單元40使塗布器10上昇,使擦拭單元50返回遠離塗布器10下部的塗布方向之原點位置。 At the time when the above preparation operation is completed, the wiping unit 50 is moved right below the applicator 10. Next, a plurality of lift pins (not shown) are raised on the surface of the stage 32, and the substrate 3 is placed on the upper portion of the lift pins from a mount (not shown). Then, the lift pins are lowered, the substrate 3 is placed on the stage 32, and the substrate 3 is positioned by a aligning device (not shown), and the substrate 3 is suction-held by a plurality of adsorption holes (not shown). In parallel with this, the coating liquid supply device unit 60 is operated to discharge a small amount of the coating liquid 2 from the applicator 10 toward the tray 54. Next, the applicator 10 is lowered by the elevating device unit 40, and the wiping head 51 is moved in the longitudinal direction of the applicator 10 while the lower end of the applicator 10 is in contact with the wiping head 51. After the periphery of the discharge surface 21 of the applicator 10 is cleaned by wiping by the wiping head 51, the applicator 10 is raised by the elevating device unit 40, and the wiping unit 50 is returned to the origin position away from the coating direction of the lower portion of the applicator 10. .

其次,吸附保持著基板3的平台32開始移動,利用未圖示的感測器對基板3的厚度進行計測。之後,基板3的塗布開始位置移動到塗布器10的吐出口面21正下方,平台32係停止。接著,利用由未圖示的感測器所計測的基板3之厚 度,以自塗布器10的吐出口面21到基板3表面為止的距離-餘隙會成為所設定的值般地利用昇降裝置單元40使塗布器10下降。 Next, the stage 32 on which the substrate 3 is adsorbed and held starts to move, and the thickness of the substrate 3 is measured by a sensor (not shown). Thereafter, the application start position of the substrate 3 is moved right below the discharge port surface 21 of the applicator 10, and the stage 32 is stopped. Next, the thickness of the substrate 3 measured by a sensor (not shown) is used. The applicator 10 is lowered by the elevating device unit 40 in such a manner that the distance from the discharge port surface 21 of the applicator 10 to the surface of the substrate 3 is the set value.

在塗布器10結束下降之後,驅動塗布液供給裝置單元60並利用活塞68僅押出被充填在注射唧筒67內部的塗布液2。依此,可在塗布器10的吐出口15與基板3之間形成塗布液2的殘留物(Bead)97。在形成殘留物97之後的一定時間,利用線性馬達33使正吸附保持著基板3的平台32以一定速度移動,而且,若從吐出口15對移動的基板3之表面持續地吐出塗布液2的話,則會在基板3上形成塗布膜。 After the applicator 10 has finished descending, the coating liquid supply device unit 60 is driven and only the coating liquid 2 filled inside the injection cylinder 67 is pushed out by the piston 68. Accordingly, a residue (Bead) 97 of the coating liquid 2 can be formed between the discharge port 15 of the applicator 10 and the substrate 3. In a certain period of time after the formation of the residue 97, the stage 32 which is positively adsorbed and held by the substrate 3 is moved by the linear motor 33 at a constant speed, and when the coating liquid 2 is continuously discharged from the surface of the moving substrate 3 from the discharge port 15, Then, a coating film is formed on the substrate 3.

之後,基板3的塗布結束部來到塗布器10的吐出口15的位置之後,使活塞68停止以停止塗布液2的供給,接著驅動昇降裝置單元40使塗布器10上昇。藉該動作,被形成於基板3與塗布器10之間的殘留物97係被完全截斷而使塗布結束。之後,持續移動平台32並在將基板3搬出的位置停止。而與此並行地,塗布器10係返回上下方向的原點位置。而且,平台32上對基板3之吸附被解除,且基板3係藉由使未圖示的升降銷上昇而被抬起。此時,未圖示的卸載器係將基板3保持並將基板3搬運往下一個工程。接著,平台32返回原點位置,注射泵64的活塞68係下降並使注射唧筒67的內部充填新的塗布液2。之後,使擦拭單元50移動到塗布器10的下部並在下一個基板3被移載之前進行待機,在此後係反覆相同的動作。 Thereafter, after the application end portion of the substrate 3 comes to the position of the discharge port 15 of the applicator 10, the piston 68 is stopped to stop the supply of the coating liquid 2, and then the elevating device unit 40 is driven to raise the applicator 10. By this operation, the residue 97 formed between the substrate 3 and the applicator 10 is completely cut off to complete the coating. Thereafter, the stage 32 is continuously moved and stopped at the position where the substrate 3 is carried out. In parallel with this, the applicator 10 returns to the origin position in the vertical direction. Further, the adsorption of the substrate 3 on the stage 32 is released, and the substrate 3 is lifted by raising a lift pin (not shown). At this time, an unloader (not shown) holds the substrate 3 and transports the substrate 3 to the next project. Next, the platform 32 returns to the home position, and the piston 68 of the syringe pump 64 is lowered and the inside of the injection cylinder 67 is filled with the new coating liquid 2. Thereafter, the wiping unit 50 is moved to the lower portion of the applicator 10 and stands by until the next substrate 3 is transferred, and thereafter the same operation is repeated.

在此,於塗布動作中,依如下(1)-(4)的情況有時會有氣體 侵入塗布器10內部,亦即(1)氣體從塗布液供給裝置單元60侵入;(2)既溶存於塗布液2中的氣體之發泡;(3)依吸引用開閉閥63或吐出用開閉閥65之開閉動作而吸入氣體;以及(4)從塗布器10的吐出口15吸入氣體等之情況。於氣體侵入塗布器10內部時,在塗布開始時發生吐出壓力上升延遲,塗布開始部分的膜厚變薄使得塗布方向之膜厚精度惡化、或是因氣體自吐出口15被吐出至基板3而發生所謂針孔或直紋的塗布缺點。在此,若利用上述之塗布生產中的氣體排出方法而僅於事前設定的條件下反複氣體排出動作的話,則此氣體100被完全地排出,在該狀態下再開始對基板3L進行塗布時,可避免在開始塗布部分的薄膜化或發生塗布缺點。 Here, in the coating operation, there may be a gas depending on the following (1) to (4). Intrusion into the inside of the applicator 10, that is, (1) gas intrusion from the coating liquid supply device unit 60; (2) foaming of the gas dissolved in the coating liquid 2; (3) opening and closing of the suction opening/closing valve 63 or discharge The valve 65 is opened and closed to suck in gas; and (4) a gas or the like is taken in from the discharge port 15 of the applicator 10. When the gas intrudes into the inside of the applicator 10, a delay in the discharge pressure rise occurs at the start of coating, and the film thickness at the start of coating is reduced, so that the film thickness accuracy in the coating direction is deteriorated or the gas is discharged from the discharge port 15 to the substrate 3. A coating disadvantage of so-called pinholes or straight lines occurs. When the gas discharge operation is repeated under the conditions set in advance by the gas discharge method in the above-described coating production, the gas 100 is completely discharged, and when the substrate 3L is applied again in this state, It is possible to avoid filming at the beginning of the coating portion or to cause coating defects.

然而,也有利用此塗布生產中之氣體排出方法而無法消除塗布開始部分之薄膜化或發生塗布缺點的情形。那是在塗布器10的內部有微小氣體101侵入的情況。在此情況,若執行上述之塗布生產中的微小氣體排出方法的話,則能將塗布器10內部的微小氣體101排出,可完全排除發生塗布開始部分之薄膜化或塗布缺點之情況。此外,此等之氣體排出作業可以在膜厚不穩定而發生塗布缺點之後再實施,也可以是在對每一定片數的基板3進行塗布作業之後再實施,再者、係於以任何理由將塗布作業一時中斷並再度進行塗布作業之前實施者也可以。 However, there is also a case where the gas discharge method in the coating production is used, and the film formation at the start of coating or the occurrence of coating defects cannot be eliminated. That is the case where the minute gas 101 intrudes inside the applicator 10. In this case, when the micro gas discharge method in the above-described coating production is performed, the fine gas 101 inside the applicator 10 can be discharged, and the occurrence of film formation or coating defects at the start of coating can be completely eliminated. Further, these gas discharge operations may be performed after the film thickness is unstable and the coating defect occurs, or may be performed after applying a predetermined number of substrates 3, and further, for any reason. The coating operation may be interrupted once and the coating operation may be performed again before the application.

在此,作為可適用本發明的塗布液2之黏度,係以1~1000mPa.S較好,而1~50mPa.S更好。塗布液2係以塗布 性而言係以具牛頓式流動者為宜,但也可以具有搖變性。本發明特別是在使用揮發性高的溶劑,例如是丙二醇甲醚醋酸酯(Propylene Glycol Monomethyl Ether Acetate)、乙酸丁酯、乳酸乙酯等的塗布液時具有效果。在可具體適用的塗布液2的例子方面,係有濾色器用的RGB光阻液、黑色矩陣用光阻液、光阻間隙材用光阻液、陣列基板用正型光阻液、及頂塗材等等。又,作為屬基板3的被塗布構件,除了玻璃以外也可使用鋁等之金屬板、陶瓷板、矽晶圓等。再者,在塗布生產中要於每一定塗布片數進行時,係以每5~100片較好,而於每15~50片進行者更好。有關在塗布作業中之微小氣體排出作業也要在每一定塗布片數進行時,係以每50~5000片較好,而於每100~1000片進行者更好。又,在微小氣體排出作業,有關要對塗布器10內部供給的氣體量、供給時間,為了將積存於歧管13的微小氣體101確實消除,至少在歧管13的上部若能以供給氣體102形成空間的話,則也適用任何的供給氣體量或供給時間。 Here, the viscosity of the coating liquid 2 to which the present invention is applicable is 1 to 1000 mPa. S is better, and 1~50mPa. S is better. Coating liquid 2 is coated Sexually, it is suitable for a Newtonian flow, but it can also have a shake. The present invention has an effect particularly when a solvent having a high volatility, for example, a coating liquid of Propylene Glycol Monomethyl Ether Acetate, butyl acetate or ethyl lactate, is used. Examples of the coating liquid 2 that can be specifically applied include an RGB photoresist liquid for a color filter, a photoresist liquid for a black matrix, a photoresist liquid for a photoresist spacer, a positive photoresist liquid for an array substrate, and a top. Coating materials and so on. Further, as the member to be coated of the substrate 3, a metal plate such as aluminum, a ceramic plate, a tantalum wafer or the like may be used in addition to glass. Further, in the coating production, it is preferably from 5 to 100 sheets per 1 to 100 sheets, and more preferably from 15 to 50 sheets. The minute gas discharge operation in the coating operation is preferably performed every 50 to 5,000 sheets per a certain number of coatings, and is preferably performed per 100 to 1,000 sheets. Further, in the micro gas discharge operation, the amount of gas to be supplied to the inside of the applicator 10 and the supply time are required to supply the gas 102 at least in the upper portion of the manifold 13 in order to reliably eliminate the minute gas 101 accumulated in the manifold 13. If a space is formed, any supply gas amount or supply time is also applied.

【實施例】 [Examples]

以下,茲例示實施例以針對本發明進行更具體的說明。 Hereinafter, the embodiments are exemplified to more specifically explain the present invention.

實施例1 Example 1

係使用按第1圖、第4圖所示的塗布模具其原樣來製造濾色器。在此,作為塗布器,係使用吐出口的間隙為100 μm、長邊方向的長度為1300mm、塗布寬度為1100mm、「中央部島塊長度Ha=40mm」>「端部島塊長度Hb=38 mm」、直徑4mm的氣體排出口係設置在供給口之上部及歧管的兩端部 合計有3個部位,歧管上緣與吐出口面平行且Sa(供給口部歧管剖面積)=34mm2、Sb(兩端部之氣體排出口部歧管剖面積)=8.5mm2、Sb(氣體排出口部歧管剖面積)/Sa(供給口部歧管剖面積)=1/4者。又,於塗布器所連接的各氣體排出路徑上使用內徑4mm的鐵弗龍(登錄商標)製的管,以水平方向連接於塗布器的各氣體排出口,同時比連接部還下游處的各氣體排出路徑之水平部分係以可通過低於各氣體排出口的中心20mm的位置般地作設置。再者,以各氣體排出路徑之出口變得比塗布器的吐出口還低450mm的方式來配置各氣體排出路徑,各氣體排出路徑之出口係浸在被開放於大氣中之廢液槽內所儲存的廢液中。在此,廢液槽內之廢液的液面與塗布器之吐出口的高低差H為,以廢液的液面比塗布器的吐出口還低400mm的方式來配置廢液槽。又,排出用開閉閥係設置在距離各氣體排出口50mm的位置。具有氣體供給用開閉閥的氣體供給路徑係使用內徑6mm的鐵弗龍(登錄商標)配管,連接在與供給口連繋的氣體排出路徑之出口與排出用開閉閥之間,使氣體供給路徑之入口開放於大氣中並設置在比塗布器的吐出口還高的位置。此外,作為塗布液,係準備了黑色矩陣、紅色、綠色、藍色之各塗布液。黑色矩陣用塗布液係各自使用以碳黑為遮光材、以丙烯酸樹脂為黏結劑、及以丙二醇甲醚醋酸酯(Propylene Glycol Monomethyl Ether Acetate)為溶媒,並調整成固體成分濃度10%、黏度10mPa.S。同樣地,紅色用塗布液係為,以丙烯酸樹脂為黏結劑、以PGMEA為溶媒、將色素紅177作為 顏料使用,並調整成固體成分濃度15%、黏度5mPa.S者。綠色用塗布液是將顏料以紅色用塗布液替換色素綠36,並調整成固體成分濃度15%、黏度5mPa.S者。藍色用塗布液是將顏料以紅色用塗布液替換色素藍15,並調整成固體成分濃度15%、黏度5mPa.S者。此等之塗布液皆具有感光性特性。 The color filter was produced as it is using the coating die shown in Figs. 1 and 4 . Here, as the applicator, the gap between the discharge port is 100 μm, the length in the longitudinal direction is 1300 mm, the coating width is 1100 mm, and the length of the central island block is Ha=40 mm.>"End island length Hb=38 "mm" and a gas discharge port having a diameter of 4 mm are provided in the upper part of the supply port and the both ends of the manifold in three places. The upper edge of the manifold is parallel to the discharge port surface and Sa (supply port manifold sectional area) = 34mm 2 , Sb (sectional area of manifold at the gas discharge port at both ends) = 8.5mm 2 , Sb (sectional area of manifold at gas discharge port) / Sa (sectional area of manifold for supply port) = 1/4 . Further, a tube made of Teflon (registered trademark) having an inner diameter of 4 mm is used for each gas discharge path to which the applicator is connected, and is connected to each gas discharge port of the applicator in the horizontal direction while being downstream of the connection portion. The horizontal portion of each gas discharge path is set so as to be 20 mm lower than the center of each gas discharge port. In addition, each gas discharge path is disposed such that the outlet of each gas discharge path is 450 mm lower than the discharge port of the applicator, and the outlet of each gas discharge path is immersed in a waste liquid tank opened to the atmosphere. Stored in waste liquid. Here, the difference H between the liquid level of the waste liquid in the waste liquid tank and the discharge port of the applicator is such that the waste liquid tank is disposed such that the liquid level of the waste liquid is 400 mm lower than the discharge port of the applicator. Further, the discharge opening and closing valve is provided at a position 50 mm from each gas discharge port. The gas supply path having the gas supply opening and closing valve is connected to the Teflon (registered trademark) pipe having an inner diameter of 6 mm, and is connected between the outlet of the gas discharge path connected to the supply port and the discharge opening and closing valve to allow the gas supply path to be The inlet is open to the atmosphere and is placed at a higher position than the spout of the applicator. Further, as the coating liquid, each of the black matrix, red, green, and blue coating liquids was prepared. For the black matrix coating liquid, carbon black was used as a light shielding material, acrylic resin was used as a binder, and Propylene Glycol Monomethyl Ether Acetate was used as a solvent, and the solid concentration was 10%, and the viscosity was 10 mPa. . S. Similarly, the red coating liquid was obtained by using acrylic resin as a binder, PGMEA as a solvent, and pigment red 177 as a pigment, and adjusting the solid concentration to 15% and the viscosity to 5 mPa. S. The green coating solution replaces the pigment green 36 with the coating solution for red, and adjusts the solid concentration to 15% and the viscosity to 5 mPa. S. The blue coating solution is to replace the pigment blue 15 with the red coating solution, and adjust the solid concentration to 15% and the viscosity to 5 mPa. S. These coating liquids all have photosensitive characteristics.

首先,為了進行黑色矩陣用塗布液之塗布,係於塗布液槽充滿塗布液而朝塗布器內部執行塗布液充填作業。在此,為了進行塗布液充填作業用之塗布生產前的氣體排出作業,注射泵之供給條件為,供給速度5000 μl/秒、供給量40000 μl、供給時間為8秒。以此供給條件,在泵開始供給1秒之後將排出用開閉閥全部設為「開啟」狀態,7秒後全部設為「關閉」狀態,而這樣的氣體排出作業循環反複3次以將塗布器內部的氣體完全地排出。此外,在該氣體排出作業中,氣體供給用開閉閥始終保持在「關閉」的狀態。 First, in order to apply the coating liquid for a black matrix, the coating liquid tank is filled with the coating liquid, and the coating liquid filling operation is performed inside the applicator. Here, in order to perform the gas discharge operation before the coating production for the coating liquid filling operation, the supply conditions of the syringe pump are a supply speed of 5000 μl/sec, a supply amount of 40,000 μl, and a supply time of 8 seconds. With this supply condition, all of the discharge opening and closing valves are set to the "on" state after the pump is started for one second, and all of the discharge opening and closing valves are set to the "closed" state after 7 seconds, and the gas discharge operation cycle is repeated three times to apply the applicator. The internal gas is completely discharged. Further, in the gas discharge operation, the gas supply opening and closing valve is always kept in the "closed" state.

在以上的塗布液充填作業之後,在1100×1300mm且厚度0.7mm的無鹼玻璃之基板上,以塗布器與基板之距離-餘隙為100 μm且塗布速度為3m/分來塗布厚度10 μm的塗布膜。在此,係對300片的基板進行塗布。在塗布動作中,為防止因氣體自供給系侵入、溶存於塗布液的氣體之發泡、以及從塗布器的吐出口吸入氣體等所引發之氣體起因的膜厚精度之惡化或塗布缺點之發生,在塗布生產中之氣體排出作業方面,係以供給速度為5000 μl/秒、供給量為40000 μl、及供給時間為8秒的條件,每塗布20片就進行1次將從供給開 始1秒之後使排出用開閉閥全部設為「開啟」的狀態、而7秒後全部設為「關閉」的狀態之氣體排出作業循環。在實施此氣體排出作業循環當中,氣體供給用開閉閥始終保持為「關閉」的狀態。又,在上述氣體排出作業中為使排出困難的微小氣體能排出,係每塗布100片就暫時停止塗布生產,而在微小氣體排出作業方面,係將氣體供給用開閉閥及排出用開閉閥在30秒期間全部「開啟」,並在對塗布器內部供給氣體且將微小氣體消除之後,進行塗布生產前之氣體排出作業。 After the above coating liquid filling operation, a coating thickness of 10 μm was applied on a substrate of 1100×1300 mm and a thickness of 0.7 mm on an alkali-free glass with a distance of a coater and a substrate of 100 μm and a coating speed of 3 m/min. Coating film. Here, 300 sheets of the substrate were coated. In the coating operation, in order to prevent the deterioration of the film thickness due to the intrusion of gas from the supply system, the foaming of the gas dissolved in the coating liquid, and the gas inhalation from the discharge port of the applicator, or the coating defect In the gas discharge operation in the coating production, the feed rate is 5000 μl/sec, the supply amount is 40,000 μl, and the supply time is 8 seconds, and the coating is performed once for every 20 sheets. After the first one second, the discharge opening and closing valves are all set to "on" state, and after seven seconds, all of the gas discharge operation cycles are set to "closed". In the gas discharge operation cycle, the gas supply opening and closing valve is always kept "closed". In the above-described gas discharge operation, in order to discharge the fine gas which is difficult to discharge, the coating production is temporarily stopped every 100 sheets are applied, and the gas supply opening and closing valve and the discharge opening and closing valve are used for the minute gas discharge operation. All of the "open" was performed for 30 seconds, and after the gas was supplied to the inside of the applicator and the minute gas was removed, the gas discharge operation before the coating production was performed.

塗布後的基板係以加熱到100℃的熱板進行10分鐘的乾燥,並於曝光、顯影、剝離之後,再以260度的熱板執行30分鐘的硫化(cure),而獲得厚度1 μm的黑色矩陣圖案。 The coated substrate was dried by a hot plate heated to 100 ° C for 10 minutes, and after exposure, development, and peeling, a vulcanization was performed for 30 minutes on a hot plate of 260 degrees to obtain a thickness of 1 μm. Black matrix pattern.

其次,除了作成厚度13 μm的塗布膜以外,其他是以與黑色矩陣用塗布液完全相同條件下,將紅色用塗布液對形成有黑色矩陣的100片基板作連續塗布。被塗布的基板係在被加熱成90℃的熱板進行10分鐘的乾燥後,執行曝光、顯影、剝離且僅於紅色畫素部殘留厚度2 μm的紅色塗布膜,再以260度的熱板進行30分鐘的硫化。 Next, in addition to the coating film having a thickness of 13 μm, the red coating liquid was continuously applied to 100 substrates on which the black matrix was formed under the same conditions as the black matrix coating liquid. The coated substrate was dried on a hot plate heated to 90° C. for 10 minutes, and then exposed, developed, and peeled off, and only a red coating film having a thickness of 2 μm remained in the red pixel portion, and a hot plate of 260 degrees was used. The vulcanization was carried out for 30 minutes.

其次,除了厚度作成20 μm的塗布膜以外,其他是以與紅色用塗布液完全相同條件,將綠色用塗布液對形成有黑色矩陣、紅色畫素部的100片基板作連續塗布。被塗布的基板係在被加熱成100℃的熱板進行10分鐘的乾燥後,執行曝光、顯影、剝離且僅於綠色畫素部殘留厚度2 μm的綠色塗布膜,再以260度的熱板進行30分鐘的硫化。 Next, except for the coating film having a thickness of 20 μm, the green coating liquid was applied continuously to 100 substrates on which the black matrix and the red pixel portion were formed under the same conditions as the red coating liquid. The coated substrate was dried on a hot plate heated to 100 ° C for 10 minutes, and then exposed, developed, and peeled off, and only a green coating film having a thickness of 2 μm remained in the green pixel portion, and a hot plate of 260 degrees was applied. The vulcanization was carried out for 30 minutes.

再者,以與綠色用塗布液完全相同條件,將藍色用塗布液對形成有黑色矩陣、紅色畫素部、綠色畫素部的100片基板作連續塗布。被塗布的基板也是以與綠色用塗布液完全相同條件下執行乾燥、曝光、顯影、剝離、硫化,且僅於藍色畫素部殘留厚度2 μm的藍色塗布膜。此外,於各色塗布液的塗布中,在乾燥後的圖案形成前之狀態測定膜厚後發現,針對所有的塗布基板,除了端部的10mm以外,塗布方向及塗布寬度方向皆為目標值±3%以下的膜厚精度。且亦一併地進行塗布不均一性的檢查,有關所有的塗布基板,塗布品質是非常的良好。完全沒有因塗布器內部的氣體被吐出口於被塗布構件而產生針孔或直紋之起因於氣體的塗布缺點。接著、最後利用濺鍍使ITO附著而製作出300片的濾色器。既完成的濾色器不但全部滿足膜厚精度,而且也沒有塗布缺點,在品質上無可挑剔。又,因為在塗布生產前或塗布生產中迅速地執行氣體排出作業,故生產效率也非常地高。 Furthermore, the blue coating liquid was continuously applied to 100 substrates on which the black matrix, the red pixel portion, and the green pixel portion were formed under the same conditions as the green coating liquid. The coated substrate was also subjected to drying, exposure, development, peeling, and vulcanization under the same conditions as the green coating liquid, and the blue coating film having a thickness of 2 μm remained only in the blue pixel portion. In addition, in the application of the coating liquid of each color, the film thickness was measured in the state before the pattern formation after the drying, and it was found that the coating direction and the coating width direction were all target values of ±3 for all the coated substrates except for the end portion of 10 mm. Film thickness accuracy below %. Moreover, the inspection of coating unevenness was also performed collectively, and the coating quality was excellent with respect to all coated substrates. There is no such a disadvantage that the gas inside the applicator is discharged into the member to be coated to cause pinholes or straight lines due to the coating of the gas. Next, finally, ITO was adhered by sputtering to produce 300 color filters. The completed color filter not only satisfies the film thickness accuracy, but also has no coating defects, and is impeccable in quality. Moreover, since the gas discharge operation is performed promptly before the coating production or in the coating production, the production efficiency is also extremely high.

比較例1 Comparative example 1

係以除了各氣體排出路徑之出口配置成比塗布器的吐出口高50mm、且浸泡著各氣體排出路徑之出口的廢液槽所儲存的廢液的液面會位在比塗布器的吐出口還高200mm的位置般地配置廢液槽以外、其他是以與實施例1相同的條件下而進行濾色器之製作。此結果為,在塗布液充填作業中及塗布生產中之氣體排出作業任一中,從各氣體排出口被排出之塗布液的流量降低且塗布器內部之氣體變成未被短時間從各氣體排出口排出。那是因為依據廢液槽所儲存之廢液的液 面與塗布器的吐出口面之高低差的液壓會成為阻力的緣故。其結果為,除了氣體排出作業時間增加且生產效率顯著降低以外,塗布器內部還會殘存氣體。依塗布方向之膜厚精度的惡化、塗布缺點等情形,發生了在300片中有60片是不良品而無法獲得良好品質的濾色器。又,在結束了300片的塗布之後,為探求不使塗布器內部殘存氣體的條件,係檢討了可將氣體完全排出之供給條件。其結果係了解到,在供給速度5000 μl/秒、供給量100000 μl,供給時間為20秒的條件下,在供給開始的1秒後使供給口部及連接至兩端部的排出用開閉閥全部呈「開啟」狀態,而19秒後全部設定為「關閉」狀態,而這樣的氣體排出作業循環,在塗布液充填作業時要4次、而在塗布生產中需要2次。依此,可了解到與實施例1比較之下,氣體排出所要的時間及供給量皆有增加、氣體排出效率降低。此乃係基於開放在大氣的廢液槽所儲存之廢液的液面被配置在比塗布器的吐出口還高200mm的位置所致。 The liquid level of the waste liquid stored in the waste liquid tank which is disposed 50 mm higher than the discharge port of the applicator and is immersed in the outlet of each gas discharge path at the outlet of each gas discharge path is located at the discharge port of the applicator The color filter was produced under the same conditions as in Example 1 except that the waste liquid tank was placed at a position as high as 200 mm. As a result, in any of the gas discharge operations in the coating liquid filling operation and the coating production, the flow rate of the coating liquid discharged from each gas discharge port is lowered and the gas inside the applicator is not discharged from each gas in a short time. The outlet is discharged. That is because the liquid of the waste liquid stored in the waste tank The hydraulic pressure difference between the surface and the discharge surface of the applicator may become a resistance. As a result, in addition to the increase in gas discharge operation time and a significant decrease in production efficiency, gas remains inside the applicator. In the case where the film thickness accuracy of the coating direction is deteriorated or the coating defect is caused, 60 pieces of 300 sheets are defective products, and a color filter which cannot obtain good quality is generated. Moreover, after the application of 300 sheets was completed, in order to find out the conditions in which the gas inside the applicator was not left, the supply conditions for completely discharging the gas were examined. As a result, it was found that, at a supply speed of 5000 μl/sec, a supply amount of 100,000 μl, and a supply time of 20 seconds, the supply port and the discharge opening and closing valve connected to both end portions were supplied one second after the start of the supply. All of them are in the "on" state, and all of them are set to the "off" state after 19 seconds, and such a gas discharge operation cycle is required four times in the coating liquid filling operation and two times in the coating production. Accordingly, it can be understood that, in comparison with Example 1, the time and supply amount of gas discharge are increased, and the gas discharge efficiency is lowered. This is because the liquid level of the waste liquid stored in the waste liquid tank opened in the atmosphere is disposed at a position 200 mm higher than the discharge port of the applicator.

比較例2 Comparative example 2

係以除了各氣體排出路徑以可通過高於各氣體排出口的中心100mm的位置般地作設置以外、其他是與實施例1相同條件下而進行濾色器之製作。此結果為,塗布液充填作業中及塗布生產中之氣體排出作業任一從各氣體排出口排出的塗布液之流量皆會降低,塗布器內部的氣體無法短時間自各氣體排出口被排出。那是因為基於各氣體排出路徑和氣體排出口之高低差的液壓成為阻力的緣故。依此、除了氣體排出 作業時間增加且生產效率降低以外,還會在塗布器內部殘留有氣體。而且,依塗布方向之膜厚精度的惡化、塗布缺點等情形,發生了在300片中有28片是不良品而無法獲得良好品質的濾色器。 The color filter was produced under the same conditions as in Example 1 except that the gas discharge paths were set to be higher than the center of each gas discharge port by 100 mm. As a result, the flow rate of the coating liquid discharged from each gas discharge port in any of the gas discharge operations during the coating liquid filling operation and the coating production is lowered, and the gas inside the applicator cannot be discharged from each gas discharge port in a short time. That is because the hydraulic pressure based on the difference between the gas discharge path and the gas discharge port becomes a resistance. In accordance with this, in addition to gas discharge In addition to an increase in working time and a decrease in production efficiency, gas remains inside the applicator. Further, in the case where the film thickness accuracy in the coating direction is deteriorated or the coating defect is caused, 28 pieces of 300 sheets are defective products, and a color filter in which good quality cannot be obtained is generated.

又,在結束300片的塗布之後,為探求塗布器內部不殘留氣體的條件,檢討了可將氣體完全排出的供給條件。其結果為,在供給速度為5000 μl/秒、供給量為70000 μl、以及供給時間為14秒的條件下,從開始供給的1秒後,把被連接到供給口部及兩端部之排出用開閉閥全部設定為「開啟」狀態、13秒後設定為全部「關閉」的狀態,而了解到像這樣的氣體排出作業循環,在塗布液充填作業時是需要3次,而在塗布生產中是需要2次。依此,與實施例1比較之下,了解到氣體排出所要的時間及供給量皆有增加,氣體排出效率降低。這也就是為何氣體排出路徑要通過高於氣體排出口100mm的位置之緣故。 Further, after the application of 300 sheets was completed, in order to find out the condition that no gas remained inside the applicator, the supply conditions for completely discharging the gas were examined. As a result, after the supply speed was 5000 μl/sec, the supply amount was 70,000 μl, and the supply time was 14 seconds, the discharge was connected to the supply port and the both end portions one second after the start of the supply. When all the on-off valves are set to the "on" state and the "off" state is set after 13 seconds, it is known that such a gas discharge operation cycle is required three times in the coating liquid filling operation, and in the coating production. It takes 2 times. Accordingly, in comparison with Example 1, it is understood that the time required for gas discharge and the amount of supply are increased, and the gas discharge efficiency is lowered. This is why the gas discharge path passes through a position 100 mm higher than the gas discharge port.

比較例3 Comparative example 3

係以除了是在未設置氣體供給路徑及氣體供給用開閉閥且未按每100片進行微小氣體的排出作業以外,其他是與實施例1完全相同條件下而進行濾色器的製作。此結果為,膜厚精度在塗布方向、塗布寬度方向都是在目標±3%。但是,因為塗布器內部的微小氣體未被充分排出,所以發生了塗布缺點,形成在300片中有8片是不良品而無法獲得良好品質的濾色器。 The color filter was produced under the same conditions as in the first embodiment except that the gas supply path and the gas supply on-off valve were not provided and the micro gas was not discharged every 100 sheets. As a result, the film thickness accuracy was within the target of ±3% in both the application direction and the coating width direction. However, since the minute gas inside the applicator is not sufficiently discharged, a coating defect occurs, and eight of the 300 sheets are defective products, and a color filter that does not have good quality cannot be obtained.

又,在結束300片的塗布之後,為探求用以排出塗布器內 部微小氣體之條件,係檢討了可將微小氣體完全排出的供給條件,但了解到以什麼條件都無法將微小氣體排出。 Moreover, after the end of 300 sheets of coating, it is sought to be discharged into the applicator. The conditions of the small gas are reviewed for the supply conditions in which the micro gas can be completely discharged, but it is understood that the micro gas cannot be discharged under any conditions.

比較例4 Comparative example 4

係以除了設成Sa(供給口部歧管剖面積)=34mm2、Sb(氣體排出口部歧管剖面積)=51mm2,且Sb(氣體排出口部歧管剖面積)/Sa(供給口部歧管剖面積)=3/2以外、其他是與實施例1相同條件下而進行濾色器之製作。此結果為,在塗布生產前及塗布生產中之氣體排出作業任一者在朝向歧管內及兩端部之氣體排出口的塗布液之流速皆變低,塗布器內部的氣體未在短時間內從兩端部的氣體排出口排出。因此,造成在塗布器內部有氣體殘留,而依塗布方向之膜厚精度的惡化、塗布缺點等情形,發生了在300片中有72片是不良品而無法獲得良好品質的濾色器。 In addition to Sa (supply port manifold sectional area) = 34 mm 2 , Sb (gas discharge port manifold sectional area) = 51 mm 2 , and Sb (gas discharge port manifold sectional area) / Sa (supply The color filter was produced under the same conditions as in Example 1 except that the cross-sectional area of the mouth manifold was changed to 3/2. As a result, the flow rate of the coating liquid at the gas discharge ports toward the inside and both ends of the manifold becomes lower in any of the gas discharge operations before the coating production and in the coating production, and the gas inside the applicator is not in a short time. The inside is discharged from the gas discharge ports at both ends. Therefore, there is a gas residue in the applicator, and the film thickness deterioration in the coating direction, the coating defect, and the like occur, and 72 of the 300 sheets are defective products, and a good color quality cannot be obtained.

又,在結束了300片的塗布之後,為探求塗布器內部不殘存氣體的條件,係檢討了可將氣體完全排出的供給條件。其結果,在供給速度5000 μl/秒、供給量70000 μl、供給時間為14秒的條件下,從供給開始1秒後設供給口部及兩端部所連接的排出用開閉閥全部為「開啟」的狀態,13秒後全部設為「關閉」狀態,了解到這樣的氣體排出作業循環,在塗布生產前需要3次、在塗布生產中是需要2次。依此,光是Sb(氣體排出口部歧管剖面積)/Sa(供給口部歧管剖面積)=3/2,與實施例1比較之下,了解到氣體排出所要的時間及供給量皆有增加,氣體排出效率降低。 Moreover, after the application of 300 sheets was completed, in order to find out the conditions in which no gas remained in the applicator, the supply conditions for completely discharging the gas were examined. As a result, under the condition that the supply speed is 5000 μl/sec, the supply amount is 70,000 μl, and the supply time is 14 seconds, the discharge opening and closing valves connected to the supply port and the both end portions are all set to "open" one second after the start of the supply. In the state of "OFF" after 13 seconds, it is known that such a gas discharge operation cycle requires three times before coating production and two times in coating production. Accordingly, the light is Sb (the gas discharge port portion manifold sectional area) / Sa (the supply port manifold sectional area) = 3/2, and compared with the first embodiment, the time and supply amount of the gas discharge are known. Both increase and the gas discharge efficiency decreases.

比較例5 Comparative Example 5

係以除了歧管上緣是以吐出口面為基準而從供給口朝向兩端部的氣體排出口並朝下傾斜2度以外、其他是與實施例1相同條件下而進行濾色器之製作。此結果為,在塗布生產前及塗布生產中之氣體排出作業任一者,歧管上緣係妨礙移動至兩端部之氣體排出口的氣體之流動,故塗布器內部的氣體變得無法從兩端部的氣體排出口短時間排出。依此,而造成在塗布器內部殘留有氣體,而依塗布方向之膜厚精度的惡化、塗布缺點等而產生在300片中有60片不良品,而無法獲得良好的品質之濾色器。 The color filter was produced under the same conditions as in the first embodiment except that the upper edge of the manifold was inclined from the supply port toward the gas discharge ports at both end portions with respect to the discharge port surface by 2 degrees. . As a result, in any of the gas discharge operations before the coating production and in the coating production, the upper edge of the manifold hinders the flow of the gas moving to the gas discharge ports at both ends, so that the gas inside the applicator becomes impossible. The gas discharge ports at both ends are discharged for a short time. As a result, gas remains in the inside of the applicator, and there are 60 defective products in 300 sheets due to deterioration in film thickness accuracy in the coating direction, coating defects, and the like, and a color filter having good quality cannot be obtained.

又,在結束了300片的塗布之後,為探求塗布器內部不殘存氣體的條件,係檢討了可將氣體完全排出的供給條件。其結果,在供給速度5000 μl/秒、供給量70000 μl、供給時間為14秒的條件下,從供給開始1秒後設供給口部及兩端部所連接的排出用開閉閥全部為「開啟」狀態,13秒後全部設為「關閉」狀態,而了解到這樣的氣體排出作業循環,在塗布生產前是需要3次,在塗布生產中是需要2次。依此,光是歧管上緣以吐出口面為基準從供給口朝向兩端部的氣體排出口並朝下傾斜2度,與實施例1比較之下,了解到氣體排出所要的時間及供給量皆有增加,氣體排出效率降低。 Moreover, after the application of 300 sheets was completed, in order to find out the conditions in which no gas remained in the applicator, the supply conditions for completely discharging the gas were examined. As a result, under the condition that the supply speed is 5000 μl/sec, the supply amount is 70,000 μl, and the supply time is 14 seconds, the discharge opening and closing valves connected to the supply port and the both end portions are all set to "open" one second after the start of the supply. The state is set to the "off" state after 13 seconds, and it is known that such a gas discharge operation cycle requires three times before coating production and two times in coating production. Accordingly, the upper edge of the manifold is inclined by 2 degrees downward from the supply port toward the gas discharge ports at both end portions with respect to the discharge port surface, and the time and supply of the gas discharge are known in comparison with the first embodiment. The amount is increased, and the gas discharge efficiency is lowered.

比較例6 Comparative Example 6

係以除了歧管上緣是以吐出口面為基準而從供給口朝向兩端部的氣體排出口並朝下傾斜2度,且作成Sb(氣體排出口部歧管剖面積)/Sa(供給口部歧管剖面積)=3/2以外、其他是與實施例1相同條件下而進行濾色器之製作。此結 果,塗布生產前及塗布生產中之氣體排出作業皆為,朝向兩端部的氣體排出口之塗布液的流速變低,而且歧管上緣係妨礙朝向兩端部之氣體排出口移動的氣體之流動,故塗布器內部的氣體變得無法自氣體排出口短時間排出。因此,係造成氣體殘存於塗布器內部,而依塗布方向之膜厚精度的惡化或塗布缺點等因素,發生了300片中有122片是不良品而無法獲得良好品質之濾色器。 In addition to the upper edge of the manifold, the gas discharge port from the supply port to the both end portions is inclined by 2 degrees from the supply port to the both end portions, and Sb (gas discharge port portion manifold sectional area) / Sa (supply) The color filter was produced under the same conditions as in Example 1 except that the cross-sectional area of the mouth manifold was changed to 3/2. This knot In the gas discharge operation before the coating production and in the coating production, the flow rate of the coating liquid toward the gas discharge ports at both end portions becomes low, and the upper edge of the manifold hinders the gas moving toward the gas discharge ports at both end portions. Since the flow occurs, the gas inside the applicator cannot be discharged from the gas discharge port for a short time. Therefore, the gas remains in the inside of the applicator, and depending on factors such as deterioration in film thickness accuracy in the coating direction or coating defects, 122 of the 300 sheets are defective and cannot obtain good quality.

又,在結束了300片的塗布之後,為探求塗布器內部不殘存氣體的條件,係檢討了可將氣體完全排出的供給條件。其結果係了解到,在供給速度為5000 μl/秒、供給量為100000 μl、供給時間為20秒的條件下,從供給開始的1秒後將供給口部及連接至兩端部的排出用開閉閥全部設為「開啟」的狀態,19秒後全部設為「關閉」的狀態,而了解到這樣的氣體排出作業循環,在塗布生產前是需要4次,而於塗布生產中是需要3次。依此,歧管上緣係以吐出口面為基準而從供給口朝向兩端部的氣體排出口並朝下傾斜2度,而就算是作成氣體排出口部歧管剖面積Sb/供給口部歧管剖面積Sa=3/2,與實施例1比較之下,了解到氣體排出所要的時間及供給量皆有增加,氣體排出效率降低。 Moreover, after the application of 300 sheets was completed, in order to find out the conditions in which no gas remained in the applicator, the supply conditions for completely discharging the gas were examined. As a result, it was found that, at a supply speed of 5000 μl/sec, a supply amount of 100,000 μl, and a supply time of 20 seconds, the supply port and the connection to both ends were discharged one second after the supply was started. All the on-off valves are set to "on" state, and all of them are "off" after 19 seconds. It is known that such a gas discharge operation cycle requires four times before coating production, and is required for coating production. Times. According to this, the upper edge of the manifold is inclined downward by 2 degrees from the supply port toward the gas discharge ports at both end portions with respect to the discharge port surface, and even if the gas discharge port portion is formed as the manifold sectional area Sb/supply port portion The cross-sectional area of the manifold is Sa=3/2. Compared with the first embodiment, it is understood that the time required for gas discharge and the amount of supply are increased, and the gas discharge efficiency is lowered.

比較例7 Comparative Example 7

係以除了「中央部島塊長度Ha=40mm」=「端部島塊長度Hb=40mm」以外、其餘是與實施例1相同條件下而進行濾色器的製作。結果,因為沒有在塗布生產前及塗布生產中之氣體排出作業的問題,故並無塗布上之缺點。但是,藉由 作成「中央部島塊長度Ha=端部島塊長度Hb」,在狹縫兩端部之壓損增加而使得來自兩端部的吐出量減少。其結果,係造成塗布寬度方向之膜厚精度超過目標的±3%使得全數成為不良,而無法獲得良好品質之濾色器。 The color filter was produced under the same conditions as in Example 1 except that "the central portion of the island block length Ha = 40 mm" = "the end island block length Hb = 40 mm". As a result, since there is no problem in the gas discharge operation before the coating production and in the coating production, there is no disadvantage in coating. But by The "central island block length Ha = end island block length Hb" is created, and the pressure loss at both end portions of the slit is increased to reduce the amount of discharge from both end portions. As a result, the film thickness accuracy in the coating width direction exceeds ±3% of the target, so that the total number is defective, and a good color filter cannot be obtained.

【產業上可利用價值】 [Industrial value]

依據本發明,因為也能以少量的供給量且短時間地將侵入塗布器內部的任何形態之氣體進行排出,故能以短的節拍時間且生產性高地形成高品質的塗布膜。 According to the present invention, since any gas that has entered the inside of the applicator can be discharged with a small amount of supply and for a short period of time, a high-quality coating film can be formed with high cycle time and high productivity.

依據本發明,係可提供一種塗布模具的氣體排出能力獲改善且在不損及塗布模具的優點之下能以高膜厚精度形成無塗布缺點的塗布膜之塗布方法與塗布裝置以及顯示器用構件之製造方法與製造裝置。 According to the present invention, it is possible to provide a coating method and a coating device and a member for a display which are capable of improving a gas discharge capability of a coating die and capable of forming a coating film having no coating defects with high film thickness precision without impairing the advantages of a coating die. Manufacturing method and manufacturing device.

本發明係適用於在被塗布構件上形成塗膜者,特別是可好好地利用於彩色液晶顯示器用濾色器以及陣列基板、電漿顯示器用面板、光學濾片等之製造領域上。 The present invention is suitable for forming a coating film on a member to be coated, and in particular, it can be suitably used in the field of manufacturing color filters for color liquid crystal displays, array substrates, panels for plasma displays, optical filters, and the like.

1‧‧‧塗布模具 1‧‧‧Application mould

2‧‧‧塗布液 2‧‧‧ Coating solution

3‧‧‧基板 3‧‧‧Substrate

10‧‧‧塗布器 10‧‧‧applicator

11‧‧‧前唇部 11‧‧‧ front lip

12‧‧‧後唇部 12‧‧‧After the lip

13‧‧‧歧管 13‧‧‧Management

14‧‧‧狹縫 14‧‧‧Slit

15‧‧‧吐出口 15‧‧‧Exporting

16‧‧‧供給口 16‧‧‧ supply port

17A、17B‧‧‧氣體排出口 17A, 17B‧‧‧ gas discharge

18‧‧‧供給內部流路 18‧‧‧Supply internal flow

19A、19B‧‧‧氣體排出內部流路 19A, 19B‧‧‧ gas discharge internal flow path

20‧‧‧歧管上緣 20‧‧‧Management upper edge

21‧‧‧吐出口面 21‧‧‧Exhaust face

22‧‧‧塗布器保持台 22‧‧‧Applicator Holder

30‧‧‧基台 30‧‧‧Abutment

31‧‧‧導軌 31‧‧‧ rails

32‧‧‧平台 32‧‧‧ platform

33‧‧‧線性馬達 33‧‧‧Linear motor

34‧‧‧支柱 34‧‧‧ pillar

40‧‧‧昇降裝置單元 40‧‧‧ Lifting unit

41‧‧‧昇降台 41‧‧‧ Lifting table

42‧‧‧引導件 42‧‧‧Guide

43‧‧‧馬達 43‧‧‧Motor

44‧‧‧螺桿 44‧‧‧ screw

50‧‧‧擦拭單元 50‧‧‧Wiping unit

51‧‧‧擦拭頭 51‧‧‧ Wipe head

52‧‧‧擦拭頭驅動裝置 52‧‧‧Wiping head drive

53‧‧‧擦拭頭保持器 53‧‧‧Wiping head holder

54‧‧‧托架 54‧‧‧ bracket

55‧‧‧擦拭單元保持台 55‧‧‧ Wiping unit holding table

60‧‧‧塗布液供給裝置單元 60‧‧‧ Coating liquid supply unit

61‧‧‧塗布液槽 61‧‧‧ coating tank

62‧‧‧泵供給路 62‧‧‧ pump supply road

63‧‧‧吸引用開閉閥 63‧‧‧Attraction opening and closing valve

64‧‧‧注射泵(syringe pump) 64‧‧‧Syringe pump

65‧‧‧吐出用開閉閥 65‧‧‧Opening and closing valve for spitting

66‧‧‧模具供給路 66‧‧‧Mold supply road

67‧‧‧注射唧筒 67‧‧‧Injection tube

68‧‧‧活塞 68‧‧‧Piston

69‧‧‧活塞保持台 69‧‧‧Piston holding table

70‧‧‧活塞昇降引導件 70‧‧‧Piston lifting guide

71‧‧‧注射泵用馬達 71‧‧‧Spump pump motor

72‧‧‧注射泵用螺桿 72‧‧‧Spin pump screw

80A、80B‧‧‧氣體排出路徑 80A, 80B‧‧‧ gas discharge path

81A、81B‧‧‧排出用開閉閥 81A, 81B‧‧‧ Discharge opening and closing valve

82A、82B‧‧‧廢液槽 82A, 82B‧‧‧ waste tank

83‧‧‧廢液 83‧‧‧ Waste

84A、84B‧‧‧廢液排出路徑 84A, 84B‧‧‧ Waste liquid discharge path

85A、85B‧‧‧廢液用開閉閥 85A, 85B‧‧‧Opening and closing valve for waste liquid

86A、86B‧‧‧吸引泵 86A, 86B‧‧‧ suction pump

87A、87B‧‧‧高側感測器 87A, 87B‧‧‧ high side sensor

88A、88B‧‧‧低側感測器 88A, 88B‧‧‧ low side sensor

89‧‧‧液面 89‧‧‧ liquid level

90A、90B‧‧‧氣體排出路徑之出口 90A, 90B‧‧‧Export of gas discharge path

91‧‧‧氣體供給路徑 91‧‧‧ gas supply path

92‧‧‧氣體供給用開閉閥 92‧‧‧ gas supply opening and closing valve

93‧‧‧氣體供給路徑之入口 93‧‧‧ Entrance to the gas supply path

95‧‧‧控制裝置 95‧‧‧Control device

96‧‧‧操作盤 96‧‧‧Operation panel

97‧‧‧殘留物(Bead) 97‧‧‧Residues (Bead)

100‧‧‧氣體 100‧‧‧ gas

101‧‧‧微小氣體 101‧‧‧Small gas

102‧‧‧供給氣體 102‧‧‧Supply gas

X‧‧‧塗布方向(基板進行方向) X‧‧‧ Coating direction (substrate orientation)

Ha‧‧‧中央部島塊長度 Ha‧‧‧Central Island length

Hb‧‧‧端部島塊長度 Hb‧‧‧ end island length

α‧‧‧歧管上緣的傾斜角度 Angle of inclination of the upper edge of the α‧‧‧ manifold

Sa‧‧‧供給口部歧管剖面積 Sa‧‧‧ supply mouth manifold sectional area

Sb‧‧‧氣體排出口部歧管剖面積 Sectional area of manifold for Sb‧‧‧ gas discharge

θ‧‧‧氣體排出路徑的傾斜角度 Angle of inclination of the θ‧‧‧ gas discharge path

H‧‧‧吐出口與積存於廢液槽的廢液液面之高低差 H‧‧‧The difference between the discharge and the level of waste liquid accumulated in the waste tank

H′‧‧‧吐出口與氣體排出路徑之出口的高低差H H'‧‧‧ Height difference between the outlet of the spout and the exit of the gas discharge path H

Q3‧‧‧低側感測器高度 Q3‧‧‧Low side sensor height

Q4‧‧‧高側感測器高度 Q4‧‧‧High side sensor height

第1圖係搭載有塗布器10之屬塗布裝置的塗布模具1之概略構成圖。 Fig. 1 is a schematic configuration diagram of a coating die 1 on which a coating device of a coater 10 is mounted.

第2(a)(b)圖係從塗布方向觀看塗布器10內部之塗布器10的概略正剖面圖。 The second (a) and (b) drawings are schematic front cross-sectional views of the applicator 10 inside the applicator 10 viewed from the coating direction.

第3(a)(b)圖係與塗布器10之塗布寬度方向正交的概略側剖面圖。 The third (a) and (b) drawings are schematic side cross-sectional views orthogonal to the application width direction of the applicator 10.

第4圖係附加有塗布液2的供給部和排出部之塗布器10的概略前視圖。 Fig. 4 is a schematic front view of the applicator 10 to which the supply portion and the discharge portion of the coating liquid 2 are added.

第5(a)~(d)圖係顯示在塗布液充填作業時之氣體100被排出的狀況之塗布器10的概略正剖面圖。 The fifth (a) to (d) are schematic cross-sectional views showing the applicator 10 in a state in which the gas 100 is discharged during the coating liquid filling operation.

第6(a)~(c)圖係顯示在塗布動作中侵入的氣體100被排出的狀況之塗布器10的概略正剖面圖。 The sixth (a) to (c) are schematic cross-sectional views showing the applicator 10 in a state in which the gas 100 invaded during the coating operation is discharged.

第7(a)~(d)圖係顯示塗布器10內部的微小氣體101藉供給至塗布器10的氣體而被消除的狀況之概略正剖面圖。 The seventh (a) to (d) diagrams are schematic cross-sectional views showing a state in which the minute gas 101 inside the applicator 10 is removed by the gas supplied to the applicator 10.

此外、圖面中的記號及數字所代表的意義係如下所示者。 In addition, the meanings represented by the symbols and numbers in the drawing are as follows.

10‧‧‧塗布器 10‧‧‧applicator

13‧‧‧歧管 13‧‧‧Management

14‧‧‧狹縫 14‧‧‧Slit

15‧‧‧吐出口 15‧‧‧Exporting

16‧‧‧供給口 16‧‧‧ supply port

17A、17B‧‧‧氣體排出口 17A, 17B‧‧‧ gas discharge

60‧‧‧塗布液供給裝置單元 60‧‧‧ Coating liquid supply unit

61‧‧‧塗布液槽 61‧‧‧ coating tank

62‧‧‧泵供給路 62‧‧‧ pump supply road

63‧‧‧吸引用開閉閥 63‧‧‧Attraction opening and closing valve

64‧‧‧注射泵 64‧‧‧Syringe pump

65‧‧‧吐出用開閉閥 65‧‧‧Opening and closing valve for spitting

66‧‧‧模具供給路 66‧‧‧Mold supply road

67‧‧‧注射唧筒 67‧‧‧Injection tube

68‧‧‧活塞 68‧‧‧Piston

69‧‧‧活塞保持台 69‧‧‧Piston holding table

70‧‧‧活塞昇降引導件 70‧‧‧Piston lifting guide

71‧‧‧注射泵用馬達 71‧‧‧Spump pump motor

72‧‧‧注射泵用螺桿 72‧‧‧Spin pump screw

80A、80B‧‧‧氣體排出路徑 80A, 80B‧‧‧ gas discharge path

81A、81B‧‧‧排出用開閉閥 81A, 81B‧‧‧ Discharge opening and closing valve

82A、82B‧‧‧廢液槽 82A, 82B‧‧‧ waste tank

83‧‧‧廢液 83‧‧‧ Waste

84A、84B‧‧‧廢液排出路徑 84A, 84B‧‧‧ Waste liquid discharge path

85A、85B‧‧‧廢液用開閉閥 85A, 85B‧‧‧Opening and closing valve for waste liquid

86A、86B‧‧‧吸引泵 86A, 86B‧‧‧ suction pump

87A、87B‧‧‧高側感測器 87A, 87B‧‧‧ high side sensor

88A、88B‧‧‧低側感測器 88A, 88B‧‧‧ low side sensor

89‧‧‧液面 89‧‧‧ liquid level

90A、90B‧‧‧氣體排出路徑之出口 90A, 90B‧‧‧Export of gas discharge path

91‧‧‧氣體供給路徑 91‧‧‧ gas supply path

92‧‧‧氣體供給用開閉閥 92‧‧‧ gas supply opening and closing valve

93‧‧‧氣體供給路徑之入口 93‧‧‧ Entrance to the gas supply path

95‧‧‧控制裝置 95‧‧‧Control device

96‧‧‧操作盤 96‧‧‧Operation panel

100‧‧‧氣體 100‧‧‧ gas

101‧‧‧微小氣體 101‧‧‧Small gas

Claims (7)

一種塗布方法,係使用具有如下所構成之塗布器而一邊從塗布器的吐出口將塗布液吐出一邊使被塗布構件和塗布器相對移動而將塗布液塗布於被塗布構件的表面,該塗布器具有用以將塗布液擴展於塗布寬度方向的歧管、和吐出塗布液的吐出口、及連同塗布液一起將氣體排出之氣體排出口,該塗布方法之特徵為對充填有塗布液的歧管供給氣體,接著對歧管供給塗布液,且將氣體和塗布液的一部分從氣體排出口排出,之後再對被塗布構件的表面塗布塗布液。 In a coating method, the coating liquid is applied to the surface of the member to be coated while the coating material is discharged from the discharge port of the applicator while the coating liquid is discharged from the applicator, and the coating liquid is applied to the surface of the member to be coated. There is a manifold for expanding the coating liquid in the coating width direction, a discharge port for discharging the coating liquid, and a gas discharge port for discharging the gas together with the coating liquid, and the coating method is characterized in that the manifold is filled with the coating liquid. The gas is then supplied to the manifold, and a part of the gas and the coating liquid is discharged from the gas discharge port, and then the coating liquid is applied to the surface of the member to be coated. 一種利用如申請專利範圍第1項之塗布方法的顯示器用構件的製造方法。 A method of producing a member for a display using the coating method of claim 1 of the patent application. 一種塗布裝置,係具備:具有對塗布器供給塗布液的液體供給路徑之液體供給機構;具有將塗布液擴展於塗布寬度方向用的歧管和吐出塗布液之吐出口及連同塗布液一起將氣體排出之氣體排出口的塗布器;與氣體排出口連接且中途具有開閉閥所構成的氣體排出路徑;保持被塗布構件的保持機構;使塗布器和保持機構相對移動之移動機構,該塗布裝置之特徵為對塗布器供給氣體用的氣體供給路徑係至少與塗布器、液體供給路徑、或氣體排出路徑當中任一者連接。 A coating apparatus comprising: a liquid supply mechanism having a liquid supply path for supplying a coating liquid to an applicator; a discharge pipe for expanding a coating liquid in a coating width direction; and a discharge port for discharging the coating liquid; and a gas together with the coating liquid An applicator for discharging the gas discharge port; a gas discharge path connected to the gas discharge port and having an opening and closing valve in the middle; a holding mechanism for holding the member to be coated; and a moving mechanism for relatively moving the applicator and the holding mechanism, the coating device A gas supply path for supplying gas to the applicator is connected to at least one of an applicator, a liquid supply path, or a gas discharge path. 如申請專利範圍第3項之塗布裝置,其中氣體供給路徑之入口被開放於大氣中。 A coating apparatus according to claim 3, wherein the inlet of the gas supply path is opened to the atmosphere. 如申請專利範圍第3或4項之塗布裝置,其中 塗布器具有從液體供給路徑對塗布器供給塗布液之供給口,歧管之塗布寬度方向的剖面積係從供給口朝向氣體排出口減少,且歧管上緣係與含有吐出口的吐出口面平行,或以吐出口面為基準而自供給口朝向氣體排出口並朝上傾斜。 Such as the coating device of claim 3 or 4, wherein The applicator has a supply port for supplying the coating liquid to the applicator from the liquid supply path, and the cross-sectional area of the manifold in the coating width direction is reduced from the supply port toward the gas discharge port, and the upper edge of the manifold and the discharge port surface including the discharge port Parallel or inclined upward from the supply port toward the gas discharge port with reference to the discharge port surface. 如申請專利範圍第5項之塗布裝置,其中塗布器之狹縫的島塊長度,係從塗布寬度方向之中央部朝向兩端部減少。 A coating apparatus according to claim 5, wherein the length of the island block of the slit of the applicator decreases from a central portion toward both end portions in the coating width direction. 一種顯示器用構件之製造裝置,其特徵為利用申請專利範圍第3至6項中任一項的塗布裝置來製造顯示器用構件。 A manufacturing apparatus for a member for a display, which is characterized in that the member for display is manufactured by the coating device according to any one of claims 3 to 6.
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US11823921B2 (en) 2017-06-30 2023-11-21 SCREEN Holdings Co., Ltd. Substrate processing device and substrate processing method
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CN113198686B (en) * 2021-04-07 2022-08-16 深圳市鑫龙邦科技有限公司 Special point gum machine in COB lamp area

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TWI396593B (en) 2013-05-21

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