TW201310531A - Methods and devices for processing passivation layer - Google Patents

Methods and devices for processing passivation layer Download PDF

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Publication number
TW201310531A
TW201310531A TW101105824A TW101105824A TW201310531A TW 201310531 A TW201310531 A TW 201310531A TW 101105824 A TW101105824 A TW 101105824A TW 101105824 A TW101105824 A TW 101105824A TW 201310531 A TW201310531 A TW 201310531A
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Taiwan
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protective layer
etchant
syringe
layer processing
pressure
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TW101105824A
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Chinese (zh)
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TWI446444B (en
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Yu-Jen Chen
Kun-Rung Lin
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Tpk Touch Solutions Xiamen Inc
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/13338Input devices, e.g. touch panels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/16Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length only at particular parts of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Abstract

The present disclosure generally relates to methods and devices for processing passivation layer of a touch panel. A method for processing the passivation layer comprises the following steps: forming a passivation layer on a substrate; setting a predetermined pattern through an orientation system; coating an etching agent on surface of the passivation layer based on the predetermined pattern through a coating device so as to form multiple patterns required in the passivation layer. The present disclosure adopts the method of single-step pattern formation and coats the etching agent on the passivation layer for forming the required pattern through a single step, wherein the method simplifies the process and reduces the production cost. The present disclosure sets the required pattern through a precise orientation system and eliminates the requirement of fabricating screen patterns everytime. When a patterns change, required patterns can be switched rapidly thereby reducing the production cost.

Description

保護層處理方法及其裝置Protective layer processing method and device thereof

本發明涉及表面加工技術,具體地說是一種保護層處理方法及其裝置,尤其涉及觸控面板保護層處理方法及其裝置。The present invention relates to a surface processing technology, and more particularly to a protective layer processing method and apparatus thereof, and more particularly to a touch panel protective layer processing method and apparatus therefor.

近年來,隨著觸控技術的不斷發展,觸控面板已廣泛應用於諸如手機、個人數位助理(PDA)、遊戲機輸入接口、電腦觸控屏等各種電子產品中。觸控面板與顯示面板集成一體,通常包括透明基板及布設於其上的電極層,導電邊緣電極及導電線路形成於面板週邊的電極層上。所述保護層敷設於電極層及透明基板上。因邊緣電極和導電線路的厚度造成保護層的不平坦,在面板邊緣高出,造成美感缺陷。而且,觸控面板在使用時需與外接電路相貼合,需要將邊緣電極和週邊的導電線路上的保護層蝕穿,使外接電路與面板上保護層下方的電極層建立電接觸。In recent years, with the continuous development of touch technology, touch panels have been widely used in various electronic products such as mobile phones, personal digital assistants (PDAs), game console input interfaces, and computer touch screens. The touch panel is integrated with the display panel, and generally includes a transparent substrate and an electrode layer disposed thereon. The conductive edge electrode and the conductive line are formed on the electrode layer around the panel. The protective layer is laid on the electrode layer and the transparent substrate. The unevenness of the protective layer due to the thickness of the edge electrode and the conductive line is higher at the edge of the panel, causing an aesthetic defect. Moreover, the touch panel needs to be attached to the external circuit during use, and the protective layer on the edge electrode and the surrounding conductive line needs to be etched, so that the external circuit establishes electrical contact with the electrode layer under the protective layer on the panel.

現有的去除導電邊緣電極及導電線路上方的保護層的方法有兩種:光蝕刻微影和網印。光蝕刻微影,即光刻,是一種圖形複印和化學腐蝕相結合的精密表面加工技術,其目的就是在二氧化矽或金屬薄膜上面蝕刻出與掩膜版完全對應的幾何圖形。光刻是一個複雜的製作流程,通過一系列生產步驟將表面薄膜的特定部分去除,最終形成一定的圖案。如圖1所示,一般的光刻製作的生產步驟包括清洗、塗布光阻層、曝光、顯影、烘乾、蝕刻及剝膜的過程,其設備所需投資較大、維護費用高,同時還需要大量的化學藥劑,導致生產成本高,生產工時長。尤其是,對於大尺寸的觸控面板,這些問題就顯得尤為嚴峻,而且容易導致生產良率下降。There are two methods for removing the conductive edge electrode and the protective layer above the conductive line: photoetching lithography and screen printing. Photoetching lithography, or lithography, is a precision surface processing technique that combines pattern copying and chemical etching to etch a geometric pattern corresponding to a mask over a cerium oxide or metal film. Lithography is a complex process in which a specific portion of a surface film is removed through a series of production steps to form a pattern. As shown in FIG. 1 , the general production steps of photolithography include a process of cleaning, coating a photoresist layer, exposing, developing, drying, etching, and stripping, and the equipment requires large investment and high maintenance cost. A large amount of chemical is required, resulting in high production costs and long production hours. In particular, for large-sized touch panels, these problems are particularly severe and are likely to cause a drop in production yield.

網印是孔版印刷的一種主要印刷方法。網版面一般包括通孔與實體兩部分。印刷時,將蝕刻膏放置於預設的網版上,蝕刻膏在刮墨刀的擠壓下從網版面通孔處漏印至保護層上而形成圖案,如圖2所示。網印的製作比較簡單,所需設備費用少,製作費用低。然而,所採用的網版不能通用,不同的產品需要不同的圖案,針對不同圖案需要設計相對應的網版。當所需圖案發生改變時,需要更換相應圖案的網版。另外,對於中、大尺寸的觸控面板,其所印刷的保護層尺寸變大時,所使用的網版的尺寸亦變大,印刷時不易控制整個大尺寸網版的張力的一致性,從而也較難保證漏印在承印物上的蝕刻膏的一致性。Screen printing is one of the main printing methods for stencil printing. The screen layout generally includes two parts: a through hole and an entity. During printing, the etching paste is placed on a preset screen, and the etching paste is printed on the protective layer from the screen through-hole by the squeegee to form a pattern, as shown in FIG. The production of screen printing is relatively simple, the equipment cost is low, and the production cost is low. However, the screens used cannot be universal, different products require different patterns, and corresponding screens need to be designed for different patterns. When the desired pattern changes, the screen of the corresponding pattern needs to be replaced. In addition, for a medium-sized and large-sized touch panel, when the size of the printed protective layer is increased, the size of the screen used is also increased, and it is difficult to control the uniformity of the tension of the entire large-sized screen during printing. It is also difficult to ensure the consistency of the etch paste that is printed on the substrate.

為了解决上述現有技術的問題,本發明的目的在於提供一種保護層處理方法,用於觸控面板保護層的蝕刻,簡化操作步驟,降低成本。In order to solve the above problems in the prior art, an object of the present invention is to provide a protective layer processing method for etching a touch panel protective layer, simplifying operation steps, and reducing cost.

本發明所採用的技術方案是:The technical solution adopted by the invention is:

一種保護層處理方法,包括以下步驟:A protective layer processing method includes the following steps:

S1:在基體上形成一保護層;S1: forming a protective layer on the substrate;

S2:通過一定位系統預先設定一預定圖案;及S2: presetting a predetermined pattern through a positioning system; and

S3:通過一塗布裝置在該保護層的表面按所述預定圖案塗布蝕刻劑,以形成該保護層所需的圖案。S3: applying an etchant in the predetermined pattern on the surface of the protective layer by a coating device to form a pattern required for the protective layer.

其中,步驟S3進一步包括以下步驟:Wherein, step S3 further comprises the following steps:

S301:提供一塗布裝置,收納有蝕刻劑;及S301: providing a coating device, which contains an etchant;

S302:該塗布裝置按照所述預定圖案在所述保護層上塗布蝕刻劑,以形成與預定圖案一致的蝕刻劑塗布區域。S302: The coating device applies an etchant on the protective layer according to the predetermined pattern to form an etchant-coated region that is consistent with a predetermined pattern.

在保護層表面塗布蝕刻劑之後,該保護層處理方法還包括步驟S4:清洗,去除塗布區域內的保護層材料及蝕刻劑。After the etchant is applied on the surface of the protective layer, the protective layer processing method further includes a step S4: cleaning to remove the protective layer material and the etchant in the coated region.

所述保護層以二氧化矽製成。所述蝕刻劑是膏狀蝕刻劑,即為蝕刻膏。The protective layer is made of cerium oxide. The etchant is a paste etchant, that is, an etch paste.

所述蝕刻膏為氟化氫銨,化學式為NH4HF2,經由所述塗布裝置塗布於所述保護層上。The etching paste is ammonium hydrogen fluoride and has a chemical formula of NH 4 HF 2 and is applied onto the protective layer via the coating device.

所述塗布裝置包括至少一個注射器,所述注射器內裝納蝕刻劑;壓力裝置,提供壓力給所述注射器,用以擠出所述注射器內的蝕刻劑;及控制單元,控制所述壓力裝置的工作狀態及調整壓力大小。The coating device includes at least one syringe containing an etchant; a pressure device providing pressure to the syringe for extruding an etchant in the syringe; and a control unit for controlling the pressure device Working status and adjustment pressure.

本發明的目的還在於提供一種保護層處理裝置,採用壓力塗布的方法將蝕刻膏塗布於保護層表面進行蝕刻,可精確定位和形成所要蝕刻的圖案,簡化生產步驟。Another object of the present invention is to provide a protective layer processing apparatus which applies an etching paste to a surface of a protective layer for etching by a pressure coating method, and can accurately position and form a pattern to be etched, thereby simplifying the production steps.

本發明所採用的技術方案是:一種保護層處理裝置,包括塗布裝置,提供蝕刻劑塗布於保護層表面;定位系統,與所述塗布裝置相接,並按一預定圖案控制所述塗布裝置的運動速度和移動方向,以在保護層表面塗布蝕刻劑來形成保護層所需的圖案。The technical solution adopted by the present invention is: a protective layer processing device, comprising a coating device, providing an etchant applied to a surface of a protective layer; a positioning system, being connected to the coating device, and controlling the coating device in a predetermined pattern The speed of movement and the direction of movement are such that an etchant is applied to the surface of the protective layer to form a pattern required for the protective layer.

至少一個注射器,所述注射器內裝納蝕刻劑,並按照所述定位系統設定的預定圖案在保護層表面塗布蝕刻劑以形成保護層所需的圖案;壓力裝置,提供壓力給所述注射器,用以擠出所述注射器內的蝕刻劑;及控制單元,控制所述壓力裝置的工作狀態及調整壓力大小。At least one syringe containing an etchant and applying an etchant to the surface of the protective layer in accordance with a predetermined pattern set by the positioning system to form a pattern required for the protective layer; a pressure device providing pressure to the syringe for use The etchant in the syringe is extruded; and the control unit controls the working state of the pressure device and adjusts the pressure.

所述定位系統是精密定位系統,其定位精度(偏移)20μm,所述定位系統包括位移傳感器、控制器、驅動電機、機械手臂和攝像機,所述位移傳感器連接於所述控制器,用於感測所述機械手臂的位置,並將機械手臂的位置信息傳輸至所述控制器;所述控制器連接於外部計算機,並接收所述位移傳感器所傳輸的位置信息,並按照計算機預設的預定圖案控制所述驅動電機的運作;所述驅動電機接收所述控制器的控制信號,驅動所述機械手臂執行位移動作;所述攝像機連接並受控於所述控制器,用於辨識保護層的初始位置。其中,所述攝像機為CCD攝像機。所述機械手臂採用線性導軌和滾珠螺桿所構成,並由X-Y-Z三軸方向的驅動電機驅動所述機械手臂的運動。所述壓力裝置包括高壓裝置及多個壓力開關。The positioning system is a precision positioning system, and its positioning accuracy (offset) 20 μm, the positioning system comprises a displacement sensor, a controller, a driving motor, a robot arm and a camera, the displacement sensor is connected to the controller for sensing the position of the robot arm and positioning information of the robot arm Transmitting to the controller; the controller is connected to an external computer, and receives position information transmitted by the displacement sensor, and controls operation of the driving motor according to a predetermined pattern preset by a computer; The control signal of the controller drives the robot arm to perform a displacement action; the camera is connected and controlled by the controller for identifying an initial position of the protective layer. Wherein, the camera is a CCD camera. The robot arm is composed of a linear guide rail and a ball screw, and the movement of the robot arm is driven by a XYZ three-axis drive motor. The pressure device includes a high pressure device and a plurality of pressure switches.

所述保護層處理裝置還設有用於存放蝕刻劑的貯藏箱,所述注射器設有進料口,所述進料口與所述貯藏箱相連通。The protective layer processing apparatus is further provided with a storage tank for storing an etchant, the syringe being provided with a feed port, and the feed port is in communication with the storage tank.

本發明採用單步圖案形成方法,在保護層上塗布蝕刻劑,通過單一步驟形成所需圖案,可簡化步驟,降低製造成本。另外,本發明通過精密定位系統設定所需要的圖案,不需要特別製作成相應的絲網圖案,當圖案發生改變時亦能快速地切換所需的圖案,降低生產成本。The invention adopts a single-step pattern forming method, and applies an etchant on the protective layer to form a desired pattern through a single step, which can simplify the steps and reduce the manufacturing cost. In addition, the present invention sets the required pattern by the precise positioning system, and does not need to be specially formed into a corresponding screen pattern, and can quickly switch the desired pattern when the pattern is changed, thereby reducing the production cost.

下面結合附圖與具體實施方式對本發明作進一步詳細描述。The present invention will be further described in detail below in conjunction with the drawings and specific embodiments.

如圖3所示,一種觸控面板10,包括基板11、電極層12以及覆蓋於電極層12之上的保護層13。電極層12具有圖案化的電極結構(圖未示),電極層12通過導電線路121連接至外部,以與導電線路121上方保護層13的蝕刻區域131相對應。如圖4所示,多個觸控面板10分布於同一個加工件100上,待完成保護層13的圖案處理之後,再切割得到單個觸控面板10。在生產時,根據所製作的觸控面板10的尺寸大小,確定在同一加工件100上排布的觸控面板10的數量。在所述的加工件100上設有至少兩個定位標101,通常採用“十字星”設於所述加工件100兩端的對角位置。As shown in FIG. 3 , a touch panel 10 includes a substrate 11 , an electrode layer 12 , and a protective layer 13 overlying the electrode layer 12 . The electrode layer 12 has a patterned electrode structure (not shown), and the electrode layer 12 is connected to the outside through the conductive line 121 to correspond to the etched region 131 of the protective layer 13 above the conductive line 121. As shown in FIG. 4, a plurality of touch panels 10 are distributed on the same workpiece 100. After the pattern processing of the protective layer 13 is completed, a single touch panel 10 is cut. At the time of production, the number of the touch panels 10 arranged on the same workpiece 100 is determined according to the size of the manufactured touch panel 10. At least two positioning marks 101 are disposed on the workpiece 100, and generally a "cross star" is disposed at a diagonal position of the workpiece 100.

如圖5所示,所述保護層13的處理方法包括以下步驟:As shown in FIG. 5, the processing method of the protective layer 13 includes the following steps:

S1:在基板11上設有電極層12,該電極層12以透明導電材料製成,再在所述電極層12上形成一保護層13,如圖3所示;S1: an electrode layer 12 is disposed on the substrate 11, the electrode layer 12 is made of a transparent conductive material, and a protective layer 13 is formed on the electrode layer 12, as shown in FIG.

S2:通過一精密定位系統20(如圖6所示)預先設定一預定圖案,該預定圖案形狀如圖4所示,由加工件100上每一觸控面板10的導電線路121上方的蝕刻區域131構成;S2: a predetermined pattern is preset through a precision positioning system 20 (shown in FIG. 6). The predetermined pattern shape is as shown in FIG. 4, and the etching area above the conductive line 121 of each touch panel 10 on the workpiece 100 is performed. 131 composition;

S3:通過一塗布裝置30(如圖7所示)在該保護層13的表面按所述預定圖案塗布蝕刻劑,以形成該保護層13所需的圖案。本實施例中採用以下步驟:S3: An etchant is applied to the surface of the protective layer 13 in the predetermined pattern by a coating device 30 (shown in FIG. 7) to form a pattern required for the protective layer 13. In this embodiment, the following steps are taken:

S301:提供一塗布裝置30(如圖7所示),收納有蝕刻膏;S301: providing a coating device 30 (shown in Figure 7), containing an etching paste;

S302:塗布裝置30按照預定圖案在所述保護層13上塗布蝕刻膏,以形成與預定圖案一致的蝕刻劑塗布區域,即該塗布區域對應於保護層13的蝕刻區域131。S302: The coating device 30 applies an etching paste on the protective layer 13 in a predetermined pattern to form an etchant coating region conforming to a predetermined pattern, that is, the coating region corresponds to the etching region 131 of the protective layer 13.

其中,所述保護層13以二氧化矽製成,所述蝕刻膏採用氟化氫銨(NH4HF2)經由所述塗布裝置30塗布於所述保護層13上,發生化學反應,其反應的化學方程式為:Wherein, the protective layer 13 is made of cerium oxide, and the etching paste is applied to the protective layer 13 via the coating device 30 by ammonium hydrogen fluoride (NH 4 HF 2 ), and a chemical reaction occurs, and the reaction chemistry The equation is:

SiO2+6NH4HF2→H2(SiF6)+6NH4F+2H2OSiO 2 +6NH 4 HF 2 →H 2 (SiF 6 )+6NH 4 F+2H 2 O

在保護層13表面塗布蝕刻劑之後,該保護層處理方法還包括步驟S4:清洗,去除塗布區域內的保護層材料及蝕刻劑,待上述化學反應完全後,將蝕刻膏塗布區域內的氟化銨等材料去除。After the etchant is applied on the surface of the protective layer 13, the protective layer processing method further includes the step S4: cleaning, removing the protective layer material and the etchant in the coating region, and after the chemical reaction is completed, the fluorination in the coating region of the etching paste is performed. Removal of materials such as ammonium.

所述精密定位系統20,如圖6所示,包括控制器201、驅動電機202、CCD攝像機203、位移傳感器204和機械手臂205。其中,所述位移傳感器204連接於所述控制器201,用於感測所述機械手臂205的位置,並將機械手臂205的位置信息傳輸至所述控制器201;所述控制器201連接於外部PC機200,並接收所述位移傳感器204所傳輸的位置信息,並按照PC機200預設的預定圖案控制所述驅動電機202的運作;所述驅動電機202接收所述控制器201的控制信號,驅動所述機械手臂205執行位移動作;所述CCD攝像機203連接並受控於所述控制器201,可辨識加工件100上的定位圖案,以確定保護層13的起始位置。該精密定位系統20的精度(偏移)20μm。The precision positioning system 20, as shown in FIG. 6, includes a controller 201, a drive motor 202, a CCD camera 203, a displacement sensor 204, and a robot arm 205. The displacement sensor 204 is connected to the controller 201 for sensing the position of the robot arm 205 and transmitting position information of the robot arm 205 to the controller 201; the controller 201 is connected to The external PC 200 receives the position information transmitted by the displacement sensor 204, and controls the operation of the driving motor 202 according to a predetermined pattern preset by the PC 200; the driving motor 202 receives the control of the controller 201. The signal drives the robot arm 205 to perform a displacement action; the CCD camera 203 is coupled to and controlled by the controller 201 to identify a positioning pattern on the workpiece 100 to determine a starting position of the protective layer 13. Accuracy (offset) of the precision positioning system 20 20μm.

所述機械手臂205採用高剛性的線性導軌和滾珠螺桿所構成,並由X-Y-Z三軸方向的驅動電機202共同驅動所述機械手臂205的運動,在本實施例中所述機械手臂205採用Class100或1000無塵手臂,無塵手臂可移動至PC機200所設定的圖案位置。The robot arm 205 is formed by a high-rigidity linear guide rail and a ball screw, and the movement of the robot arm 205 is driven by the XYZ three-axis direction driving motor 202. In the embodiment, the robot arm 205 adopts Class 100 or 1000 dust-free arm, the dust-free arm can be moved to the pattern position set by the PC 200.

一種保護層處理裝置,如圖7所示,將精密定位系統20和塗布裝置30結合成一體,用於觸控面板10的保護層13處理,以在其表面去除一部分材料形成一定圖案。其中,所述的塗布裝置30,包括多個注射器301及其配套的注射頭302。每個注射器301內裝有蝕刻劑膏,注射器301和注射頭302的數量根據加工件100上的觸控面板10數量而定。所述精密定位系統20與注射器301相接,並控制所述注射器301和注射頭302的運動速度和移動方向;壓力裝置,包括高壓裝置303及多個壓力開關304,高壓裝置303通過壓力開關304提供壓力給注射器301,注射器301內的蝕刻膏在高壓裝置303的壓力作用下從所述注射頭302被擠出;控制單元305,與所述壓力裝置的高壓裝置303相接,控制所述高壓裝置303的工作狀態及調整壓力大小。A protective layer processing device, as shown in FIG. 7, combines the precision positioning system 20 and the coating device 30 for processing by the protective layer 13 of the touch panel 10 to remove a portion of the material on the surface to form a pattern. Wherein, the coating device 30 includes a plurality of syringes 301 and their associated injection heads 302. Each of the syringes 301 is filled with an etchant paste, and the number of the syringes 301 and the injection heads 302 depends on the number of the touch panels 10 on the workpiece 100. The precision positioning system 20 is connected to the syringe 301 and controls the movement speed and moving direction of the injector 301 and the injection head 302. The pressure device includes a high pressure device 303 and a plurality of pressure switches 304, and the high pressure device 303 passes through the pressure switch 304. Pressure is supplied to the syringe 301, and the etching paste in the syringe 301 is extruded from the injection head 302 under the pressure of the high pressure device 303; the control unit 305 is connected to the high pressure device 303 of the pressure device to control the high pressure. The operating state of the device 303 and the magnitude of the adjustment pressure.

其中,所述壓力開關304可採用電磁閥。所述電磁閥連接所述高壓裝置303並受控於所述控制單元305的控制。電磁閥包括電磁線圈及閥門,通過電磁線圈產生電磁力來驅動閥門的開閉動作,以進行流體控制。所述塗布裝置30還設有用於存放蝕刻膏的貯藏箱306。所述注射器301設有進料口,並與所述貯藏箱306相連通。Wherein, the pressure switch 304 can adopt a solenoid valve. The solenoid valve is coupled to the high pressure device 303 and controlled by the control of the control unit 305. The solenoid valve includes an electromagnetic coil and a valve, and an electromagnetic force is generated by the electromagnetic coil to drive the opening and closing action of the valve to perform fluid control. The coating device 30 is also provided with a storage bin 306 for storing the etching paste. The syringe 301 is provided with a feed port and is in communication with the storage tank 306.

所述注射器301及注射頭302的運動速度為300-450 mm/sec,所述蝕刻膏的粘度為11-28 Pa*s,壓力裝置的壓力範圍(以壓强表示)為4-7Kgf/cm2(60-100psi)。其中,所述注射器301及注射頭302的運動速度與所述壓力裝置的壓力成正比關係,壓力越大,運動速度越大。從而通過運動速度和壓力的設定來保證蝕刻膏塗布的一致性。The speed of movement of the syringe 301 and the injection head 302 is 300-450 mm/sec, the viscosity of the etching paste is 11-28 Pa*s, and the pressure range of the pressure device (in terms of pressure) is 4-7 Kgf/cm. 2 (60-100psi). The movement speed of the syringe 301 and the injection head 302 is proportional to the pressure of the pressure device, and the greater the pressure, the greater the movement speed. Thereby, the consistency of the etching paste coating is ensured by the setting of the moving speed and the pressure.

在生產時,可製作不同尺寸大小的觸控面板10,往往根據其尺寸大小在同一加工件100上排布多個觸控面板10同時加工。加工時,在所述的加工件100上設有至少兩個定位標101,通常採用“十字星”如圖4所示,設於所述加工件100兩端的對角位置。所述CCD攝像機203通過該定位標101來確定初始位置和所要在加工件100上加工的圖案位置。所述精密定位系統20先藉由CCD攝像機203辨識出加工件100的定位標101(即十字星)影像後,通過機械手臂205帶動注射器301移動至PC機200所設定的圖案位置。At the time of production, the touch panels 10 of different sizes can be fabricated, and the plurality of touch panels 10 are often processed on the same workpiece 100 according to their sizes. At the time of processing, at least two positioning marks 101 are provided on the workpiece 100, and generally, a "cross star" is used as shown in FIG. 4, and is disposed at a diagonal position of both ends of the workpiece 100. The CCD camera 203 determines the initial position and the position of the pattern to be processed on the workpiece 100 by the positioning mark 101. The precision positioning system 20 first recognizes the positioning target 101 (ie, the cross star) image of the workpiece 100 by the CCD camera 203, and then moves the syringe 301 to the pattern position set by the PC 200 through the robot arm 205.

所述精密定位系統20通過機械手臂205帶動注射器301移動,而所要蝕刻的加工件100通過真空系統固定不動吸附在精密定位系統20的操作平臺上。當然,另一種方式還可以是精密定位系統20帶動加工件100移動,而裝有蝕刻膏的注射器301位置固定不動,其內蝕刻膏以一定速度被擠出,塗布於運動的加工件100上。The precision positioning system 20 drives the syringe 301 to move by the robot arm 205, and the workpiece 100 to be etched is fixedly adsorbed on the operation platform of the precision positioning system 20 by the vacuum system. Of course, another manner may be that the precision positioning system 20 drives the workpiece 100 to move, and the syringe 301 equipped with the etching paste is fixed in position, and the etching paste is extruded at a certain speed and coated on the moving workpiece 100.

本發明的保護層處理裝置中的塗布裝置30,因其注射器301、注射頭302、貯藏箱306以及連接貯藏箱306與注射器301之間的管道均會直接接觸蝕刻膏,因而都需要採用防蝕刻材料,使其對蝕刻膏具有抗腐蝕作用。The coating device 30 in the protective layer processing apparatus of the present invention directly contacts the etching paste because the syringe 301, the injection head 302, the storage box 306, and the pipe connecting the storage box 306 and the syringe 301 are in contact with each other. The material has an anti-corrosion effect on the etching paste.

本發明通過精密定位系統20可以在保護層13表面按照預定圖案塗布蝕刻劑,蝕刻劑對保護層13有蝕刻作用,並形成一定的圖案。通過採用塗布裝置30選擇性地去除部分目標層,不需要通過塗布、曝光、顯影和去除步驟而進行蝕刻保護層13,簡化了生產步驟,提高生產效率,降低了生產成本。同時,本發明可通過精密定位系統20設定和改變所需要的圖案,不需要特別製作成相應的絲網圖案,當圖案發生改變時亦能快速地切換所需的圖案,無需更換任何裝置或部件,降低生產成本。The present invention can apply an etchant in a predetermined pattern on the surface of the protective layer 13 by the precision positioning system 20, and the etchant has an etching effect on the protective layer 13 and forms a certain pattern. By selectively removing a portion of the target layer by using the coating device 30, it is not necessary to etch the protective layer 13 by the coating, exposing, developing, and removing steps, which simplifies the production steps, improves production efficiency, and reduces production costs. At the same time, the present invention can set and change the required pattern through the precision positioning system 20, without special preparation of the corresponding screen pattern, and can quickly switch the desired pattern when the pattern is changed, without replacing any device or component. ,reduce manufacturing cost.

以上所述僅為本發明的較佳實施例而已,並不用以限制本發明,凡在本發明的精神和原則之內,所做的任何修改、等同替換、改進等,均應包含在本發明保護的範圍之內。The above are only the preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalents, improvements, etc., which are made within the spirit and principles of the present invention, should be included in the present invention. Within the scope of protection.

10...觸控面板10. . . Touch panel

11...基板11. . . Substrate

12...電極層12. . . Electrode layer

13...保護層13. . . The protective layer

121...導電線路121. . . Conductive line

131...蝕刻區域131. . . Etched area

100...加工件100. . . Machined parts

101...定位標101. . . Positioning mark

20...精密定位系統20. . . Precision positioning system

200...PC機200. . . PC

201...控制器201. . . Controller

202...驅動電機202. . . motor

203...CCD攝像機203. . . CCD camera

204...位移傳感器204. . . Motion detector

205...機械手臂205. . . Mechanical arm

30...塗布裝置30. . . Coating device

301...注射器301. . . syringe

302...注射頭302. . . Injection head

303...高壓裝置303. . . High pressure device

304...壓力開關304. . . Pressure Switch

305...控制單元305. . . control unit

306...貯藏箱306. . . Storage box

S1-S4,S301,S302...保護層處理方法的步驟S1-S4, S301, S302. . . Steps of the protective layer processing method

圖1是現有的光蝕刻微影的流程圖;1 is a flow chart of a conventional photoetching lithography;

圖2是現有的絲網印刷的裝置結構示意圖;2 is a schematic structural view of a conventional screen printing apparatus;

圖3是一種觸控面板的截面示意圖;3 is a schematic cross-sectional view of a touch panel;

圖4是本發明應用於觸控面板的加工平面示意圖;4 is a schematic plan view showing the processing of the present invention applied to a touch panel;

圖5是本發明保護層處理方法的流程圖;Figure 5 is a flow chart of a method for processing a protective layer of the present invention;

圖6是本發明精密定位系統的原理框圖;Figure 6 is a schematic block diagram of the precision positioning system of the present invention;

圖7是本發明保護層處理裝置的原理框圖。Figure 7 is a schematic block diagram of a protective layer processing apparatus of the present invention.

S1-S4,S301,S302...保護層處理方法的步驟S1-S4, S301, S302. . . Steps of the protective layer processing method

Claims (17)

一種保護層處理方法,其中:包括以下步驟:S1:在基體上形成一保護層;S2:通過一定位系統預先設定一預定圖案,存儲於該定位系統中;及S3:通過一塗布裝置在該保護層的表面按所述預定圖案塗布蝕刻劑,以形成該保護層所需的圖案。A protective layer processing method, comprising: the following steps: S1: forming a protective layer on the substrate; S2: presetting a predetermined pattern through a positioning system, storing in the positioning system; and S3: passing the coating device The surface of the protective layer is coated with an etchant in the predetermined pattern to form a pattern required for the protective layer. 如申請專利範圍第1項所述的保護層處理方法,其中:所述定位系統是精密定位系統,其定位精度20μm。The protective layer processing method according to claim 1, wherein: the positioning system is a precise positioning system, and the positioning accuracy thereof 20μm. 如申請專利範圍第1項所述的保護層處理方法,其中:所述保護層以二氧化矽製成。The protective layer processing method according to claim 1, wherein the protective layer is made of cerium oxide. 如申請專利範圍第1項所述的保護層處理方法,其中:在保護層表面塗布蝕刻劑之後,還包括步驟S4:清洗,去除預定圖案內的保護層材料及蝕刻劑。The protective layer processing method according to claim 1, wherein after the etchant is applied on the surface of the protective layer, the method further includes the step S4: cleaning to remove the protective layer material and the etchant in the predetermined pattern. 如申請專利範圍第1項所述的保護層處理方法,其中:所述蝕刻劑為膏狀蝕刻劑,即為蝕刻膏。The protective layer processing method according to claim 1, wherein the etchant is a paste etchant, that is, an etch paste. 如申請專利範圍第5項所述的保護層處理方法,其中:所述蝕刻膏為氟化氫銨(NH4HF2)。The protective layer processing method according to claim 5, wherein the etching paste is ammonium hydrogen fluoride (NH 4 HF 2 ). 如申請專利範圍第1項所述的保護層處理方法,其中:所述塗布裝置包括:至少一個注射器,所述注射器中裝蝕刻劑,所述注射器的運動速度和移動方向由所述定位系統控制;壓力裝置,提供壓力給所述注射器,用以擠出所述注射器內的蝕刻劑;及控制單元,控制所述壓力裝置的工作狀態及調整壓力大小。The protective layer processing method according to claim 1, wherein the coating device comprises: at least one syringe, wherein the syringe is filled with an etchant, and the moving speed and moving direction of the syringe are controlled by the positioning system a pressure device for supplying pressure to the syringe for extruding an etchant in the syringe; and a control unit for controlling the working state of the pressure device and adjusting the pressure. 如申請專利範圍第7項所述的保護層處理方法,其中:所述注射器的運動速度為300-450 mm/sec,所述蝕刻劑的粘度為11-28 Pa*s,壓力裝置的壓力範圍為4-7Kgf/cm2The protective layer processing method according to claim 7, wherein: the moving speed of the syringe is 300-450 mm/sec, the viscosity of the etchant is 11-28 Pa*s, and the pressure range of the pressure device. It is 4-7 Kgf/cm 2 . 如申請專利範圍第1項所述的保護層處理方法,其中:所述基板上設有電極層,所述保護層形成於該電極層上。The protective layer processing method according to claim 1, wherein the substrate is provided with an electrode layer, and the protective layer is formed on the electrode layer. 一種保護層處理裝置,其中:包括:塗布裝置,以在保護層表面塗布蝕刻劑;定位系統,與所述塗布裝置相接,並按一預定圖案控制所述塗布裝置的運動速度和移動方向,以在保護層表面塗布蝕刻劑來形成保護層所需的圖案。A protective layer processing apparatus, comprising: a coating device to apply an etchant on a surface of a protective layer; a positioning system that is in contact with the coating device and controls a moving speed and a moving direction of the coating device in a predetermined pattern, The pattern required to form the protective layer is formed by applying an etchant to the surface of the protective layer. 如申請專利範圍第10項所述的保護層處理裝置,其中:所述塗布裝置包括至少一個注射器,所述注射器內裝納蝕刻劑,並按照所述定位系統設定的預定圖案在保護層表面塗布蝕刻劑以形成保護層所需的圖案;壓力裝置,提供壓力給所述注射器,用以擠出所述注射器內的蝕刻劑;及控制單元,控制所述壓力裝置的工作狀態及調整壓力大小。The protective layer processing apparatus according to claim 10, wherein the coating device comprises at least one syringe, the etchant is contained in the syringe, and is coated on the surface of the protective layer according to a predetermined pattern set by the positioning system. An etchant to form a pattern required for the protective layer; a pressure device providing pressure to the injector for extruding an etchant in the syringe; and a control unit for controlling the operating state of the pressure device and adjusting the pressure. 如申請專利範圍第11項所述的保護層處理裝置,其中:所述注射器還包括注射頭,所述蝕刻劑在壓力裝置的作用下從注射頭擠出。The protective layer processing apparatus of claim 11, wherein the syringe further comprises an injection head, and the etchant is extruded from the injection head by a pressure device. 如申請專利範圍第11項所述的保護層處理裝置,其中:所述壓力裝置包括高壓裝置及多個壓力開關。The protective layer processing apparatus according to claim 11, wherein the pressure device comprises a high pressure device and a plurality of pressure switches. 如申請專利範圍第13項所述的保護層處理裝置,其中:所述高壓裝置的壓力範圍是4-7Kg f/cm2The protective layer processing apparatus according to claim 13, wherein the pressure of the high pressure device ranges from 4 to 7 kgf/cm 2 . 如申請專利範圍第11項所述的保護層處理裝置,其中:所述塗布裝置還設有用於存放蝕刻劑的貯藏箱,所述注射器設有進料口,所述進料口與所述貯藏箱相連通。The protective layer processing apparatus according to claim 11, wherein the coating device is further provided with a storage tank for storing an etchant, the syringe is provided with a feed port, the feed port and the storage port The boxes are connected. 如申請專利範圍第10項所述的保護層處理裝置,其中:所述定位系統包括位移傳感器、控制器、驅動電機、機械手臂和攝像機,所述位移傳感器連接於所述控制器,用於感測所述機械手臂的位置,並將機械手臂的位置信息傳輸至所述控制器;所述控制器連接於外部計算機,並接收所述位移傳感器所傳輸的位置信息,並按照計算機中的圖案設定一預定圖案,從而控制所述驅動電機的運作;所述驅動電機接收所述控制器的控制信號,驅動所述機械手臂執行位移動作;所述攝像機連接並受控於所述控制器,用於確定保護層的起始位置。The protective layer processing apparatus according to claim 10, wherein: the positioning system comprises a displacement sensor, a controller, a driving motor, a robot arm and a camera, and the displacement sensor is connected to the controller for sensing Measuring a position of the robot arm and transmitting position information of the robot arm to the controller; the controller is connected to an external computer, and receives position information transmitted by the displacement sensor, and is set according to a pattern in the computer a predetermined pattern to control operation of the drive motor; the drive motor receives a control signal of the controller to drive the robot arm to perform a displacement action; the camera is coupled and controlled by the controller for Determine the starting position of the protective layer. 如申請專利範圍第16項所述的保護層處理裝置,其中:所述機械手臂採用線性導軌和滾珠螺桿所構成,並由X-Y-Z三軸方向的驅動電機驅動所述機械手臂的運動。The protective layer processing apparatus according to claim 16, wherein the mechanical arm is constituted by a linear guide and a ball screw, and the movement of the mechanical arm is driven by a driving motor of an X-Y-Z three-axis direction.
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CN1155911C (en) * 2000-09-26 2004-06-30 洋华光电股份有限公司 Manufacture of touching control panel
US20030154908A1 (en) * 2002-11-19 2003-08-21 Webber Dominic George Manufacturing method and apparatus
KR20100102950A (en) * 2009-03-12 2010-09-27 삼성전자주식회사 Fabricating method of touch screen panel and touch screen panel fabricated tereby
CN101923412A (en) * 2009-06-16 2010-12-22 时纬科技股份有限公司 Touch screen and manufacture method thereof
US20110005662A1 (en) * 2009-07-10 2011-01-13 Kuo-Hua Sung Method for Fabricating Multilayer Panels
CN102063232A (en) * 2009-11-16 2011-05-18 祥闳科技股份有限公司 Structure of capacitance type multi-point touch-control panel and manufacturing method thereof
CN201655182U (en) * 2010-01-28 2010-11-24 深圳莱宝高科技股份有限公司 Panel
CN202189224U (en) * 2011-08-20 2012-04-11 宸鸿科技(厦门)有限公司 Protection layer processing device

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TWM434303U (en) 2012-07-21
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KR20130020754A (en) 2013-02-28
CN102955596B (en) 2016-04-06
TWI446444B (en) 2014-07-21

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