TW201300337A - Method for producing glass plate - Google Patents

Method for producing glass plate Download PDF

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TW201300337A
TW201300337A TW101111634A TW101111634A TW201300337A TW 201300337 A TW201300337 A TW 201300337A TW 101111634 A TW101111634 A TW 101111634A TW 101111634 A TW101111634 A TW 101111634A TW 201300337 A TW201300337 A TW 201300337A
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molten glass
glass
glass substrate
tube
producing
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TW101111634A
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Chinese (zh)
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TWI567036B (en
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Tsugunobu Murakami
Noriyuki Hioki
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Avanstrate Inc
Avanstrate Korea Inc
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/04Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in tank furnaces
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18Stirring devices; Homogenisation
    • C03B5/182Stirring devices; Homogenisation by moving the molten glass along fixed elements, e.g. deflectors, weirs, baffle plates
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18Stirring devices; Homogenisation
    • C03B5/187Stirring devices; Homogenisation with moving elements
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/42Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
    • C03B5/43Use of materials for furnace walls, e.g. fire-bricks

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

This method for producing a glass substrate involves a fining step of fining a molten glass while making the molten glass flow through a pipe of which the outer peripheral wall made of platinum or a platinum alloy is heated. The fining step involves a bubble removal step of releasing bubbles contained in the molten glass from the liquid surface of the molten glass toward the gas phase inside the pipe. In the bubble removal step, the temperature distribution of the molten glass along the radial direction of the pipe is made uniform by stirring the molten glass.

Description

玻璃板之製造方法 Glass plate manufacturing method

本發明係關於一種製造玻璃板的玻璃板之製造方法。 The present invention relates to a method of manufacturing a glass sheet for producing a glass sheet.

液晶顯示器或電漿顯示器等平板顯示器(以下稱為FPD(Flat Panel Display))所使用之玻璃基板中,例如厚度為0.5~0.7 mm且尺寸為300×400 mm~2850×3050 mm者為主流。 In a glass substrate used for a flat panel display such as a liquid crystal display or a plasma display (hereinafter referred to as FPD (Flat Panel Display)), for example, a thickness of 0.5 to 0.7 mm and a size of 300 × 400 mm to 2850 × 3050 mm are mainstream.

作為FPD用玻璃基板之製造方法,已知溢流下拉法。溢流下拉法係藉由在成形爐中使熔融玻璃自成形體之上部溢出而成形為板狀玻璃,並對成形之板狀玻璃進行緩冷卻、切割。其後,經切割之板狀玻璃係進而配合顧客之規格而切割成特定之尺寸,並進行洗淨、端面研磨等而出貨。 As a method of producing a glass substrate for FPD, an overflow down-draw method is known. The overflow down-draw method is formed into a sheet glass by overflowing molten glass from the upper part of the molded object in a forming furnace, and the formed sheet glass is slowly cooled and cut. Thereafter, the cut sheet glass system is cut into a specific size in accordance with the specifications of the customer, and is shipped by washing, end surface polishing, or the like.

於FPD用玻璃基板中,尤其是液晶顯示裝置用玻璃基板由於在其表面形成有半導體元件,故而較佳為完全不含鹼金屬成分、或即便含有亦為不對半導體元件等產生影響之程度之微量。 In the glass substrate for FPD, in particular, a glass substrate for a liquid crystal display device has a semiconductor element formed on its surface. Therefore, it is preferable that the glass substrate is completely free of an alkali metal component, or that it does not affect the semiconductor element or the like even if it is contained. .

又,由於若於玻璃基板中存在泡則成為顯示缺陷之原因,故而存在泡之玻璃基板不可用作FPD用玻璃基板。因此,要求於玻璃基板中不殘留泡。於玻璃基板之製造中,將去除熔融玻璃之泡稱為澄清,於該澄清中係藉由As2O3等澄清劑之氧化還原反應而去除泡。更具體而言,進一步提高經粗熔解之熔融玻璃之溫度,使澄清劑發揮作用而使泡浮起脫泡,其後藉由降低溫度而使未完全脫泡而殘留之 小泡溶解吸收於玻璃內。作為澄清劑,除As2O3以外,就近年來之環境負荷之觀點而言,可使用SnO2或Fe2O3等代替As2O3。如上所述完全不含鹼金屬成分或微量含有鹼金屬成分之玻璃基板之情形與鈉鈣玻璃等大量含有鹼金屬之玻璃基板相比,高溫黏性較高且泡不易自製造中之熔融玻璃脫離,故而需要更高之澄清效果。 Further, since the presence of bubbles in the glass substrate causes display defects, the glass substrate in which the bubbles are present cannot be used as the glass substrate for FPD. Therefore, it is required that no bubbles remain in the glass substrate. In the production of a glass substrate, the bubble from which the molten glass is removed is referred to as clarification, and in the clarification, the bubble is removed by a redox reaction of a clarifying agent such as As 2 O 3 . More specifically, the temperature of the molten glass which is coarsely melted is further increased, the clarifying agent acts to defoam the bubbles, and then the vesicles remaining in the incomplete defoaming are dissolved and absorbed in the glass by lowering the temperature. Inside. As a fining agent in addition to As 2 O 3, the viewpoint of the environmental load of recent years, the use SnO 2 or Fe 2 O 3 and the like instead of As 2 O 3. As described above, in the case where the alkali metal component or the glass substrate containing a small amount of the alkali metal component is completely absent, the high-temperature viscosity is higher than that of the glass substrate containing a large amount of alkali metal such as soda-lime glass, and the bubble is not easily detached from the molten glass in the production. Therefore, a higher clarification effect is required.

另一方面,已知如下技術:藉由使電流於由鉑或鉑合金所構成之管之澄清槽中流通而加熱澄清槽(通電加熱),並使熔融玻璃於該經加熱之澄清槽中流通,藉此提昇熔融玻璃之溫度並進行澄清(專利文獻1)。 On the other hand, a technique is known in which a clarification tank (heating heating) is heated by circulating an electric current in a clarification tank of a tube made of platinum or a platinum alloy, and molten glass is circulated in the heated clarification tank. Thereby, the temperature of the molten glass is raised and clarified (Patent Document 1).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特表2011-502934號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-502934

於加熱由鉑或鉑合金之管所構成之澄清槽而提昇熔融玻璃之溫度時,有熔融玻璃之溫度未均勻加熱之情況。例如如圖5中所示,於通過管之熔融玻璃中,由於在管路之中心附近流動之熔融玻璃之流速快於在壁面阻力較大之管之壁面附近流動之熔融玻璃之流速,進而,由於距離進行加熱之管之壁面較遠,故而有於管路之中心附近流動之熔融玻璃之溫度低於在管之壁面附近流動之熔融玻璃,無法提昇至澄清所需之溫度而使澄清變得不充分的問題。該問題亦為使電流於由鉑或鉑合金之管所構成之澄清槽中流通之 情形時所產生之問題。 When the clarification tank composed of a tube of platinum or a platinum alloy is heated to raise the temperature of the molten glass, the temperature of the molten glass is not uniformly heated. For example, as shown in FIG. 5, in the molten glass passing through the tube, since the flow rate of the molten glass flowing near the center of the pipe is faster than the flow rate of the molten glass flowing near the wall surface of the pipe having a large wall resistance, Since the wall surface of the tube to be heated is farther away, the temperature of the molten glass flowing near the center of the tube is lower than that of the molten glass flowing near the wall surface of the tube, and the temperature required for clarification cannot be raised to make the clarification become Insufficient problem. The problem is also to circulate current in a clarification tank composed of a tube of platinum or platinum alloy. The problem that arises in the situation.

又,若為了提昇管之中心附近之溫度而增加包含鉑或鉑合金之澄清槽之加熱量,則有促進鉑或鉑合金之揮發而縮短澄清槽之壽命之問題。尤其是近年來就環境負荷之觀點而言,於將SnO2代替As2O3用作澄清劑之情形時,與As2O3相比更為使熔融玻璃成為高溫,故而鉑或鉑合金之揮發更加成為問題。因此,對由鉑或鉑合金所構成之管進行過剩之加熱係不佳之狀況。 Further, if the heating amount of the clarification tank containing platinum or platinum alloy is increased in order to raise the temperature near the center of the tube, there is a problem that the volatilization of platinum or a platinum alloy is promoted to shorten the life of the clarification tank. In particular, in the case of environmental load in recent years, when SnO 2 is used as a clarifying agent instead of As 2 O 3 , the molten glass is made higher than As 2 O 3 , so platinum or platinum alloy Volatilization is even more of a problem. Therefore, excessive heating of the tube composed of platinum or a platinum alloy is not preferable.

又,於澄清槽中,可藉由設為泡容易浮起之黏度而促進脫泡,但例如於液晶顯示裝置用玻璃基板等中所較佳使用之無鹼玻璃中,由於高溫黏性較高,與鹼玻璃相比,更必需將熔融玻璃之溫度設為高溫,故而鉑或鉑合金之揮發更加成為問題。因此,對由鉑或鉑合金所構成之管進行過剩之加熱係不佳之狀況。 Further, in the clarification tank, defoaming can be promoted by making the viscosity of the bubble easy to float, but in the alkali-free glass which is preferably used in a glass substrate for a liquid crystal display device or the like, the viscosity is high due to high temperature. Compared with alkali glass, it is necessary to set the temperature of the molten glass to a high temperature, so that volatilization of platinum or a platinum alloy is more problematic. Therefore, excessive heating of the tube composed of platinum or a platinum alloy is not preferable.

因此,本發明之目的在於提供一種與先前相比可於熔融玻璃之澄清時防止構成澄清槽之管之鉑或鉑合金之揮發、並且提高熔融玻璃之澄清效果的玻璃基板之製造方法。 Accordingly, an object of the present invention is to provide a method for producing a glass substrate which can prevent the volatilization of platinum or a platinum alloy which constitutes a tube of a clarification tank and enhance the clarification effect of the molten glass when the molten glass is clarified.

本發明之一態樣係一種玻璃基板之製造方法, 其包括一面使熔融玻璃於包含鉑或鉑合金之外周壁受加熱之管中流動一面進行澄清之澄清步驟。 One aspect of the present invention is a method of manufacturing a glass substrate, It comprises a clarification step of clarifying one side of the molten glass while flowing in a heated tube other than the platinum or platinum alloy.

上述澄清步驟包括使上述熔融玻璃中之氣泡自熔融玻璃之液面朝向上述管內之氣相釋放之脫泡步驟。 The clarification step includes a defoaming step of releasing bubbles in the molten glass from a liquid surface of the molten glass toward a gas phase in the tube.

於上述脫泡步驟中,藉由攪拌上述熔融玻璃而使上述熔 融玻璃沿上述管之徑向之溫度分佈均勻化。 In the above defoaming step, the above melting is performed by stirring the molten glass The temperature distribution of the molten glass in the radial direction of the tube is uniformized.

於上述形態之玻璃基板之製造方法中,可於熔融玻璃之澄清時防止鉑或鉑合金之揮發、並且提高熔融玻璃之澄清效果。 In the method for producing a glass substrate according to the above aspect, volatilization of platinum or a platinum alloy can be prevented at the time of clarification of the molten glass, and the clarifying effect of the molten glass can be improved.

以下,對本實施形態之玻璃板之製造方法進行說明。 Hereinafter, a method of producing the glass sheet of the present embodiment will be described.

(玻璃基板之製造方法之整體概要) (Overall outline of the manufacturing method of the glass substrate)

圖1係本實施形態之玻璃基板之製造方法之步驟圖。 Fig. 1 is a step diagram showing a method of manufacturing a glass substrate of the embodiment.

玻璃板之製造方法主要具有:熔解步驟(ST1)、澄清步驟(ST2)、均質化步驟(ST3)、供給步驟(ST4)、成形步驟(ST5)、緩冷卻步驟(ST6)、及切割步驟(ST7)。此外具有:磨削步驟、研磨步驟、洗淨步驟、檢查步驟、捆包步驟等,將捆包步驟所堆疊之複數之玻璃基板運送至訂貨方之業者。 The manufacturing method of the glass plate mainly has a melting step (ST1), a clarification step (ST2), a homogenization step (ST3), a supply step (ST4), a molding step (ST5), a slow cooling step (ST6), and a cutting step ( ST7). Further, there are: a grinding step, a grinding step, a washing step, an inspection step, a packing step, and the like, and the plurality of glass substrates stacked in the packing step are transported to the ordering party.

圖2係示意性地表示進行熔解步驟(ST1)~切割步驟(ST7)之裝置之圖。該裝置如圖2所示,主要具有:熔解裝置200、成形裝置300、及切割裝置400。熔解裝置200主要具有:熔解槽201,澄清槽202,攪拌槽203,及玻璃供給管204、205、206。再者,將熔解槽201以後至成形裝置300為止之各槽間連接之玻璃供給管204、205、206及澄清槽202與攪拌槽203含有包含鉑或鉑銠合金等鉑合金之金屬管。 Fig. 2 is a view schematically showing an apparatus for performing a melting step (ST1) to a cutting step (ST7). As shown in FIG. 2, the apparatus mainly has a melting device 200, a forming device 300, and a cutting device 400. The melting apparatus 200 mainly has a melting tank 201, a clarification tank 202, a stirring tank 203, and glass supply pipes 204, 205, and 206. Further, the glass supply pipes 204, 205, and 206 and the clarification tank 202 and the agitation vessel 203 which are connected between the grooves after the melting tank 201 and the molding apparatus 300 contain a metal pipe containing a platinum alloy such as platinum or a platinum-rhodium alloy.

於熔解步驟(ST1)中,例如藉由將添加有SnO2等澄清劑 並供給至熔解槽201內之玻璃原料利用未圖示之火焰及電加熱器加熱而熔解,從而獲得熔融玻璃。具體而言,玻璃原料M係使用未圖示之原料投入裝置而供給至熔融玻璃G之液面。玻璃原料係藉由利用火焰成為高溫之氣相而進行加熱並緩緩熔解,熔於熔融玻璃MG中。熔融玻璃MG係利用藉由電加熱器之通電加熱而進行升溫。 In the melting step (ST1), for example, a glass frit which is supplied with a clarifying agent such as SnO 2 and supplied into the melting tank 201 is melted by a flame and an electric heater (not shown) to obtain molten glass. Specifically, the glass raw material M is supplied to the liquid surface of the molten glass G using a raw material input device (not shown). The glass raw material is heated and slowly melted by using a flame in a high-temperature gas phase, and is melted in the molten glass MG. The molten glass MG is heated by electric heating by an electric heater.

澄清步驟(ST2)係至少於玻璃供給管204、澄清槽202及玻璃供給管205中進行。於澄清步驟中,藉由使澄清槽202內之熔融玻璃MG升溫,從而使熔融玻璃MG中所含之包含O2、CO2或SO2之泡吸收例如由SnO2等澄清劑之還原反應所產生之O2而成長,並浮起至熔融玻璃MG之液面而釋放(脫泡步驟)。又,於澄清步驟中,藉由於脫泡後降低熔融玻璃MG之溫度,從而使例如由SnO2等澄清劑之還原反應所獲得之SnO等澄清劑進行氧化反應,藉此將殘留於熔融玻璃MG中之泡中之O2等氣體成分吸收於熔融玻璃MG中而使泡消失(吸收步驟)。利用澄清劑之氧化反應及還原反應係藉由控制熔融玻璃MG之溫度而進行。關於熔融玻璃MG之溫度,使電流於設置於玻璃供給管204之未圖示之加熱電極與設置於澄清槽202之下述加熱電極202a(參照圖3)間流通,進而使電流於加熱電極202a與較加熱電極202a設置於熔融玻璃MG之下游側之澄清槽202上之加熱電極202b(參照圖3(a))間流通,藉此加熱澄清槽202而使熔融玻璃MG升溫。進而,使電流於加熱電極202b與較加熱電極202b設置於熔融玻璃MG之下游側之澄清槽202上之加熱電 極202c(參照圖3)間流通,藉此一面加熱澄清槽202一面使熔融玻璃MG降溫。該通電加熱並不限定於利用3個區域之通電加熱之溫度控制,亦可進行1個或2個區域之通電加熱而進行熔融玻璃MG之溫度控制。關於澄清槽202中之澄清步驟之詳細內容於下文進行說明。 The clarification step (ST2) is performed at least in the glass supply pipe 204, the clarification tank 202, and the glass supply pipe 205. In the clarification step, by heating the molten glass MG in the clarification tank 202, the bubbles containing O 2 , CO 2 or SO 2 contained in the molten glass MG are absorbed by a reducing reaction such as a clarifying agent such as SnO 2 . The generated O 2 grows and floats to the liquid surface of the molten glass MG to be released (defoaming step). In the clarification step, the clarification agent such as SnO obtained by a reduction reaction of a clarifying agent such as SnO 2 is subjected to an oxidation reaction by lowering the temperature of the molten glass MG after defoaming, thereby remaining in the molten glass MG. The gas component such as O 2 in the bubble in the middle is absorbed in the molten glass MG to cause the bubble to disappear (absorption step). The oxidation reaction and the reduction reaction using the clarifying agent are carried out by controlling the temperature of the molten glass MG. The temperature of the molten glass MG is caused to flow between a heating electrode (not shown) provided in the glass supply pipe 204 and a heating electrode 202a (see FIG. 3) provided in the clarification tank 202, and a current is applied to the heating electrode 202a. The heating electrode 202b (see FIG. 3(a)), which is disposed on the clarification tank 202 on the downstream side of the molten glass MG, is heated to evaporate the clarification tank 202 to raise the temperature of the molten glass MG. Further, a current is passed between the heating electrode 202b and the heating electrode 202c (see FIG. 3) provided on the clarification tank 202 on the downstream side of the molten glass MG, and the molten glass MG is heated while the clarification tank 202 is heated. Cool down. This electric heating is not limited to temperature control by electric conduction heating in three regions, and electric heating of one or two regions may be performed to control the temperature of the molten glass MG. The details of the clarification step in the clarification tank 202 are explained below.

於均質化步驟(ST3)中,藉由使用攪拌器203a攪拌通過玻璃供給管205而供給之攪拌槽203內之熔融玻璃MG,從而進行玻璃成分之均質化。攪拌槽203係使用1個攪拌器203a攪拌熔融玻璃MG,但亦可使用2個以上之攪拌器203a攪拌熔融玻璃MG。 In the homogenization step (ST3), the molten glass MG in the stirring tank 203 supplied through the glass supply pipe 205 is stirred by the agitator 203a to homogenize the glass component. In the stirring tank 203, the molten glass MG is stirred by one stirrer 203a, but the molten glass MG may be stirred by using two or more stirrers 203a.

於供給步驟(ST4)中,熔融玻璃MG通過玻璃供給管206而供給至成形裝置300。 In the supply step (ST4), the molten glass MG is supplied to the molding apparatus 300 through the glass supply tube 206.

於成形裝置300中進行成形步驟(ST5)及緩冷卻步驟(ST6)。 The forming step (ST5) and the slow cooling step (ST6) are performed in the molding apparatus 300.

於成形步驟(ST5)中,將熔融玻璃MG成形為片材狀玻璃G,並製作片材狀玻璃G之連續體。本實施形態係利用使用下述成形體310之溢流下拉法。於緩冷卻步驟(ST6)中,成形且連續之片材狀玻璃G係以成為所期望之厚度且不產生內部應變之方式進行冷卻。 In the molding step (ST5), the molten glass MG is formed into a sheet-like glass G, and a continuous body of the sheet-like glass G is produced. In the present embodiment, an overflow down-draw method using the molded body 310 described below is used. In the slow cooling step (ST6), the formed and continuous sheet-like glass G is cooled so as to have a desired thickness without generating internal strain.

於切割步驟(ST7)中,於切割裝置400中,藉由將自成形裝置300所供給之片材狀玻璃G切割為特定之長度而獲得板狀之玻璃基板。將經切割之玻璃基板進而切割成特定之尺寸而製作目標尺寸之玻璃基板。其後,進行玻璃基板之端面之磨削、研磨及玻璃基板之洗淨,進而檢查泡或條紋等 缺陷之有無後,將檢查合格品之璃基板作為最終製品而進行捆包。 In the cutting step (ST7), in the cutting device 400, a sheet-shaped glass substrate is obtained by cutting the sheet-like glass G supplied from the forming device 300 to a specific length. The cut glass substrate is further cut into a specific size to produce a glass substrate of a target size. Thereafter, the end surface of the glass substrate is ground, polished, and the glass substrate is washed, and the bubbles or stripes are inspected. After the presence or absence of the defect, the glass substrate of the qualified product is packaged as a final product.

(澄清步驟) (clarification step)

如上所述,至少於玻璃供給管204、澄清槽202及玻璃供給管205中進行澄清步驟(ST2)之脫泡步驟及吸收步驟。脫泡步驟主要於供給管204及澄清槽202之前半中進行。又,吸收步驟主要於澄清槽202之後半中進行。再者,亦有時於澄清槽202之後半中進行脫泡步驟。於該情形時,吸收步驟係於澄清槽202之後半中或其以後之供給管205中進行。 As described above, the defoaming step and the absorbing step of the clarification step (ST2) are performed at least in the glass supply tube 204, the clarification tank 202, and the glass supply tube 205. The defoaming step is performed primarily in the first half of the supply tube 204 and the clarification tank 202. Again, the absorption step is performed primarily in the second half of the clarification tank 202. Further, the defoaming step is sometimes performed in the second half of the clarification tank 202. In this case, the absorption step is carried out in the supply tube 205 in the latter half of the clarification tank 202 or later.

以下自脫泡步驟起說明澄清步驟。 The clarification step is illustrated below from the defoaming step.

自熔解槽201供給至玻璃供給管204之熔融玻璃MG於玻璃供給管204中及澄清槽202之前半中,於供給至澄清槽202前進行加熱,以便促進SnO2等澄清劑之氧氣之釋放反應,並且以便於澄清槽202之前半中成為容易使泡浮起之黏度(較佳為120[泊]~400[泊],1泊=0.1 Pa.s)。例如於無鹼玻璃或僅含微量之鹼之微量含鹼之玻璃(高溫黏性玻璃)、例如相當於102.5[泊]之黏度之溫度為1500℃以上之玻璃之情形時,於例如1580℃~1620℃下、更佳為1600℃~1620℃下供給至玻璃供給管204,並以於澄清槽202之入口成為例如1610℃~1650℃、更佳為1630℃~1650℃之方式加熱。進而,於澄清槽202中,藉由使電流於下述加熱電極202a與加熱電極202b間流通而加熱澄清槽202並將熔融玻璃MG升溫至例如1670℃~1710℃,較佳為1690℃~1710℃。 即,必需將澄清槽202之溫度提昇至構成澄清槽202之金屬管之鉑或鉑合金之耐熱溫度附近。 The molten glass MG supplied from the melting tank 201 to the glass supply pipe 204 is heated in the glass supply pipe 204 and the first half of the clarification tank 202 before being supplied to the clarification tank 202 to promote the oxygen release reaction of the clarifying agent such as SnO 2 . And in order to clarify the viscosity of the bubble in the first half of the groove 202 (preferably 120 [po] to 400 [poise], 1 poise = 0.1 Pa.s). For example, in the case of an alkali-free glass or a trace amount of alkali-containing glass (high-temperature viscous glass), for example, a glass having a viscosity corresponding to a viscosity of 10 2.5 [poise] of 1500 ° C or more, for example, 1580 ° C It is supplied to the glass supply pipe 204 at 1600 ° C to 1620 ° C at ~1620 ° C, and is heated so that the inlet of the clarification tank 202 is, for example, 1610 ° C to 1650 ° C, more preferably 1630 ° C to 1650 ° C. Further, in the clarification tank 202, the clarification tank 202 is heated by flowing a current between the heating electrode 202a and the heating electrode 202b described below, and the molten glass MG is heated to, for example, 1670 ° C to 1710 ° C, preferably 1690 ° C to 1710. °C. That is, it is necessary to raise the temperature of the clarification tank 202 to the vicinity of the heat-resistant temperature of the platinum or platinum alloy of the metal pipe constituting the clarification tank 202.

即,於脫泡步驟中,為了加熱熔融玻璃MG,必需一定以上之長度之管。又,澄清槽202之內徑係以大於玻璃供給管204之內徑、且於熔融玻璃MG之液面與管間具有氣相空間之方式構成。藉由設為此種構成,於玻璃供給管204中開始之脫泡可於澄清槽202中成為容易使泡浮起之黏度時急遽地釋放,可促進有效之澄清效果。此處,澄清槽202之管如上所述內徑較大,故而管之徑向之溫度分佈容易不均勻。再者,該問題於內徑相對較小之玻璃供給管204中不易產生。 That is, in the defoaming step, in order to heat the molten glass MG, a tube having a length of a certain length or more is required. Further, the inner diameter of the clarification tank 202 is configured to be larger than the inner diameter of the glass supply pipe 204 and to have a gas phase space between the liquid surface of the molten glass MG and the tube. With such a configuration, the defoaming started in the glass supply tube 204 can be quickly released when the viscosity of the bubble is easily released in the clarification tank 202, and an effective clarifying effect can be promoted. Here, since the tube of the clarification tank 202 has a large inner diameter as described above, the temperature distribution in the radial direction of the tube is likely to be uneven. Moreover, this problem is less likely to occur in the glass supply tube 204 having a relatively small inner diameter.

繼而說明吸收步驟。 The absorption step is then explained.

於吸收步驟中,藉由使電流於加熱電極202b與加熱電極202c(參照圖3)間流通,從而一面加熱澄清槽202一面使熔融玻璃MG降溫,於將SnO2用作澄清劑之情形時,使SnO2之還原反應所獲得之SnO進行氧化反應,藉此將殘留於熔融玻璃MG中之泡中之O2等氣體成分吸收於熔融玻璃MG中而使泡消失。 In the absorption step, when a current is passed between the heating electrode 202b and the heating electrode 202c (see FIG. 3), the molten glass MG is cooled while the clarification tank 202 is heated, and when SnO 2 is used as a clarifying agent, The SnO obtained by the reduction reaction of SnO 2 is subjected to an oxidation reaction, whereby a gas component such as O 2 remaining in the bubbles in the molten glass MG is absorbed in the molten glass MG to cause the bubbles to disappear.

(澄清槽) (clarification tank)

圖3(a)係具體地表示主要進行上述之澄清步驟之澄清槽202之構成之圖。澄清槽202具體而言具有:加熱電極202a、202b、202c及金屬管202d。金屬管202d係鉑或鉑合金製之管。熔融玻璃MG將金屬管202d之管路作為流路而於金屬管202d之內部流動。加熱電極202a、202b、202c使 電流自金屬管202d之外周壁面流至金屬管202d中,使用藉由金屬管202d之電阻所產生之焦耳熱加熱金屬管202d而將熔融玻璃MG之溫度提昇至特定之溫度,並使用熔融玻璃MG中之澄清劑而進行熔融玻璃MG之脫泡。即,金屬管202d包含鉑或鉑合金之外周壁,且該外周壁受到加熱。 Fig. 3(a) is a view specifically showing the configuration of the clarification tank 202 mainly performing the above-described clarification step. The clarification tank 202 specifically has heating electrodes 202a, 202b, and 202c and a metal pipe 202d. The metal tube 202d is a tube made of platinum or a platinum alloy. The molten glass MG flows into the inside of the metal pipe 202d by using the pipe of the metal pipe 202d as a flow path. Heating electrodes 202a, 202b, 202c The current flows from the outer peripheral wall surface of the metal pipe 202d to the metal pipe 202d, and the temperature of the molten glass MG is raised to a specific temperature by using the Joule heat generated by the electric resistance of the metal pipe 202d to heat the metal pipe 202d, and the molten glass MG is used. The defoaming of the molten glass MG is carried out in the clarifying agent. That is, the metal pipe 202d contains a peripheral wall other than platinum or a platinum alloy, and the outer peripheral wall is heated.

關於加熱電極202a、202b、202c,自作為金屬管202d之長度方向的X方向之上游側依序設置有加熱電極202a、加熱電極202b、加熱電極202c,且加熱電極202a及加熱電極202c位於金屬管202d之兩端。加熱電極202b位於加熱電極202a與加熱電極202c間之大致中間。即,加熱電極202a與加熱電極202b間之區域成為第1加熱區域,加熱電極202b與加熱電極202c間之區域成為第2加熱區域。 The heating electrodes 202a, 202b, and 202c are provided with a heating electrode 202a, a heating electrode 202b, and a heating electrode 202c in this order from the upstream side in the X direction as the longitudinal direction of the metal pipe 202d, and the heating electrode 202a and the heating electrode 202c are located in the metal pipe. Both ends of 202d. The heating electrode 202b is located substantially in the middle between the heating electrode 202a and the heating electrode 202c. That is, the region between the heating electrode 202a and the heating electrode 202b becomes the first heating region, and the region between the heating electrode 202b and the heating electrode 202c becomes the second heating region.

於本實施形態中設置有3個加熱電極202a~202c,但亦可為2個加熱電極。即,加熱金屬管202d之區域亦可為1個。 In the present embodiment, three heating electrodes 202a to 202c are provided, but two heating electrodes may be used. That is, the area in which the metal pipe 202d is heated may be one.

進而,於金屬管202d之內部中,熔融玻璃MG並非於金屬管202d之流路剖面整體中流動而於上方設置有氣相之空間。為了使熔融玻璃MG之應進行脫泡之泡於熔融玻璃MG之液體表面破裂而將泡中之氣體成分釋放至大氣中,於金屬管202d之上部設置有用以將氣體成分自金屬管202d之氣相釋放至大氣中之未圖示之氣體排氣孔。 Further, in the inside of the metal pipe 202d, the molten glass MG does not flow through the entire flow path section of the metal pipe 202d, and a space in which the gas phase is provided above. In order to cause the surface of the molten glass MG to be defoamed to rupture on the surface of the molten glass MG to release the gas component in the bubble to the atmosphere, a gas is provided on the upper portion of the metal pipe 202d to separate the gas component from the metal pipe 202d. The phase is released to a gas vent hole (not shown) in the atmosphere.

金屬管202d較佳為圓筒狀之形狀。金屬管202d之厚度例如較佳為1 mm~1.5 mm。金屬管202d之內徑大於玻璃供給管204、205之內徑,較佳為大於玻璃供給管204、205之內徑30%以上,更佳為大於40%以上。金屬管202d之內徑例 如為300 mm以上。藉由將金屬管202d之內徑設為例如300 mm以上之內徑,可使於金屬管202d內流動之熔融玻璃MG之流速降低而延長熔融玻璃MG停留於金屬管202d中之時間,可高效地進行熔融玻璃MG之澄清。 The metal pipe 202d preferably has a cylindrical shape. The thickness of the metal pipe 202d is preferably, for example, 1 mm to 1.5 mm. The inner diameter of the metal pipe 202d is larger than the inner diameter of the glass supply pipes 204, 205, preferably larger than the inner diameter of the glass supply pipes 204, 205 by more than 30%, more preferably more than 40%. Example of the inner diameter of the metal pipe 202d If it is more than 300 mm. By setting the inner diameter of the metal pipe 202d to an inner diameter of, for example, 300 mm or more, the flow rate of the molten glass MG flowing in the metal pipe 202d can be lowered to extend the time during which the molten glass MG stays in the metal pipe 202d, which is highly efficient. The clarification of the molten glass MG was carried out.

於澄清槽202中,藉由使電流於加熱電極202a、202b、202c中流通而使熔融玻璃MG之溫度成為如圖3(b)中所示之沿X方向之分佈。自熔解槽201送出之熔融玻璃MG於玻璃供給管204中加熱而緩慢升溫,進而於加熱電極202a與加熱電極202b間以熔融玻璃MG之溫度成為最大之方式加熱熔融玻璃MG,於加熱電極202b與加熱電極202c間以熔融玻璃MG之溫度緩慢降低之方式加熱熔融玻璃MG。即,於加熱電極202a與加熱電極202b間之區域中使熔融玻璃MG升溫,以便藉由熔融玻璃MG中所含之澄清劑例如SnO2(氧化錫)之還原作用而使例如SnO2釋放氧氣。另一方面,於加熱電極202b與加熱電極202c間之區域中使熔融玻璃MG降溫,以便藉由熔融玻璃MG中所含之澄清劑例如SnO(還原SnO2而得之澄清劑)之氧化作用而使SnO吸收氧氣。進而,於玻璃供給管205中使熔融玻璃MG緩慢降溫。 In the clarification tank 202, the temperature of the molten glass MG is distributed in the X direction as shown in Fig. 3(b) by circulating current through the heating electrodes 202a, 202b, and 202c. The molten glass MG sent from the melting tank 201 is heated by the glass supply pipe 204 to gradually increase the temperature, and the molten glass MG is heated between the heating electrode 202a and the heating electrode 202b so that the temperature of the molten glass MG becomes maximum, and the heating electrode 202b is heated. The molten glass MG is heated between the heating electrodes 202c so that the temperature of the molten glass MG gradually decreases. That is, the molten glass MG is heated in a region between the heating electrode 202a and the heating electrode 202b to release oxygen, for example, by SnO 2 by reduction of a clarifying agent such as SnO 2 (tin oxide) contained in the molten glass MG. On the other hand, the molten glass MG is cooled in a region between the heating electrode 202b and the heating electrode 202c so as to be oxidized by a clarifying agent such as SnO (a clarifying agent obtained by reducing SnO 2 ) contained in the molten glass MG. Allow SnO to absorb oxygen. Further, the molten glass MG is gradually cooled in the glass supply tube 205.

圖4(a)係於X方向切割澄清槽202之金屬管202d而得之剖面圖。金屬管202d於成為熔融玻璃MG之流路之金屬管202d之內壁面上交替設置有複數之成為與X方向正交之壁之板材202e、202f。板材202e、202f係於金屬管202d內由固定於金屬管202d之包含鉑或鉑合金等材質之構件所構成之靜態攪拌機構。即,板材202e、202f係藉由攪拌於金屬 管202d內流動之熔融玻璃MG而使熔融玻璃MG沿管之徑向之溫度分佈均勻化。此處,所謂熔融玻璃MG沿徑向之溫度之均勻化,係指溫度分佈中之溫度差為20℃以內,更佳為10℃以內,進而較佳為5℃以內。 Fig. 4 (a) is a cross-sectional view showing the metal pipe 202d which cuts the clarification tank 202 in the X direction. The metal pipe 202d is alternately provided with a plurality of plate members 202e and 202f which are walls which are orthogonal to the X direction on the inner wall surface of the metal pipe 202d which is the flow path of the molten glass MG. The plate members 202e and 202f are static stirring mechanisms composed of members made of a material such as platinum or platinum alloy fixed to the metal pipe 202d in the metal pipe 202d. That is, the plates 202e, 202f are stirred by the metal The molten glass MG flowing in the tube 202d makes the temperature distribution of the molten glass MG in the radial direction of the tube uniform. Here, the homogenization of the temperature of the molten glass MG in the radial direction means that the temperature difference in the temperature distribution is within 20 ° C, more preferably within 10 ° C, and even more preferably within 5 ° C.

板材202e、202f較佳為以金屬管202d之垂直於X方向之截面積成為金屬管202d之垂直於X方向之截面積的3分之1以上且3分之2以下之方式,即以限制熔融玻璃MG之流動之方式設置。若限制熔融玻璃MG之流動之板材202e、202f之截面積(阻斷面積)過小,則攪拌效果較小,若阻斷面積過大,則妨礙熔融玻璃MG之流動之要素變得過大。上述阻斷面積較佳為金屬管202d之垂直於X方向之截面積之2分之1左右。如圖4(b)中所示,板材202e係以通過金屬管202d之包含流路剖面中心之中央區域、且於水平方向(圖4(b)之左右方向)橫切金屬管202d之方式設置,限制流路剖面之上述中央區域上之熔融玻璃MG之流動,並且可使熔融玻璃MG通過流路之上部及下部。另一方面,如圖4(c)中所示,板材202f與板材202e之配置不同,以夾著金屬管202d之包含流路剖面中心之中央區域、且於水平方向(圖4(c)之左右方向)分別橫切流路剖面之上部及下部之方式設置,限制流路剖面之上部及下部上之熔融玻璃MG之流動,並且可使熔融玻璃MG通過金屬管202d之包含流路剖面中心之中央區域。即,以限制金屬管202d之管路之熔融玻璃MG之流路剖面之方式利用設置於管路之流路方向之不同位置上之複數之板材202e、202f予以構成。於鄰接 之板材202e、202f之組中,限制流路剖面之部分相互不同。再者,板材202f係以夾著中央區域、且於水平方向(圖4(c)之左右方向)分別橫切流路剖面之上部及下部之方式設置,但亦可將板材202f設置為於流路剖面之面內旋轉90度而得之形狀,即,亦可以夾著管路之包含流路剖面中心之中央區域、且於垂直方向(圖4(c)之上下方向)分別橫切流路剖面之左右兩側之部分之方式設置。於該情形時,較佳為使用圖4(b)所示之形狀者作為板材202e。又,亦可使用圖4(c)所示之形狀者作為板材202f,另一方面設置將圖4(b)所示之板材202e於流路剖面之面內旋轉90度而得之形狀。 It is preferable that the plate members 202e and 202f have a cross-sectional area perpendicular to the X direction of the metal pipe 202d to be one-third or more and two-thirds or less of the cross-sectional area of the metal pipe 202d perpendicular to the X direction, that is, to limit the melting. The way the glass MG flows is set. When the cross-sectional area (blocking area) of the sheets 202e and 202f that restrict the flow of the molten glass MG is too small, the stirring effect is small, and if the blocking area is too large, the element that hinders the flow of the molten glass MG becomes excessive. The blocking area is preferably about one-half of the cross-sectional area of the metal pipe 202d perpendicular to the X direction. As shown in Fig. 4 (b), the plate member 202e is disposed so as to cross the metal pipe 202d in the horizontal direction (the horizontal direction in Fig. 4(b)) through the central portion including the center of the flow path section of the metal pipe 202d. The flow of the molten glass MG on the central portion of the flow path section is restricted, and the molten glass MG can be passed through the upper portion and the lower portion of the flow path. On the other hand, as shown in Fig. 4(c), the plate member 202f and the plate member 202e are arranged differently so as to sandwich the central portion of the metal pipe 202d including the center of the flow path section and in the horizontal direction (Fig. 4(c) The horizontal direction is provided so as to cross the upper portion and the lower portion of the flow path section, and restrict the flow of the molten glass MG on the upper portion and the lower portion of the flow path section, and the molten glass MG can pass through the center of the flow path section of the metal pipe 202d. Central area. In other words, a plurality of plate members 202e and 202f which are disposed at different positions in the flow path direction of the pipe are formed so as to restrict the flow path cross section of the molten glass MG of the pipe of the metal pipe 202d. Adjacent In the group of the plates 202e and 202f, the portions of the restriction flow path are different from each other. Further, the plate member 202f is provided so as to traverse the upper portion and the lower portion of the flow path cross section in the horizontal direction (the horizontal direction in FIG. 4(c)), but the plate member 202f may be disposed in the flow. The shape obtained by rotating the surface of the road section by 90 degrees, that is, the flow path may be cross-cut in the vertical direction (the downward direction of FIG. 4(c)), respectively, in the middle of the pipe including the center of the flow path profile center. Set the part of the left and right sides of the section. In this case, it is preferable to use the shape shown in Fig. 4 (b) as the plate member 202e. Further, the shape shown in Fig. 4(c) may be used as the plate member 202f, and the plate member 202e shown in Fig. 4(b) may be rotated by 90 degrees in the plane of the flow path cross section.

於本實施形態中,板材202e、202f之限制流路剖面之部分相互不同,但限制流路剖面之部分亦可相同。然而,就防止熔融玻璃MG自上游側至下游側直線流動,而一面於上下方向攪拌熔融玻璃MG一面使其流動之方面而言,較佳為板材202e、202f之限制流路剖面之部分相互不同。又,於本實施形態中,雖然設置有2個板材202e、202f,但亦可僅設置1個板材而限制熔融玻璃MG之流路剖面。 In the present embodiment, the portions of the plate members 202e and 202f that restrict the flow path are different from each other, but the portions of the flow path cross-section may be the same. However, in order to prevent the molten glass MG from flowing straight from the upstream side to the downstream side while stirring the molten glass MG in the vertical direction, it is preferable that the portions of the restricting flow paths of the plates 202e and 202f are different from each other. . Further, in the present embodiment, although two plate members 202e and 202f are provided, only one plate member may be provided to restrict the flow path cross section of the molten glass MG.

於澄清槽202中,一面使自玻璃供給管204供給之熔融玻璃MG於包含鉑或鉑合金之外周壁經通電加熱之金屬管202中流動一面進行脫泡。於該情形時,於加熱之金屬管202d之壁附近流動之熔融玻璃MG容易隨著金屬管202d之通電加熱而升溫,但熔融玻璃MG中之流路剖面中心之部分由於遠離加熱之金屬壁202d故而難以升溫。即,容易沿金屬 管202d之徑向而產生熔融玻璃MG之溫度分佈。因此,於未設置板材202e、202f之先前之澄清槽中,流動之熔融玻璃沿管之徑向之溫度分佈不均勻,此外距離金屬管之壁較遠之流路剖面中心之部分之熔融玻璃之流速快於在金屬管之壁附近流動之熔融玻璃之流速。因此,於流路剖面中心流動之熔融玻璃MG容易於未加熱之狀態下直接通過澄清槽。若因上述原因而沿金屬管202d之徑向產生熔融玻璃MG之溫度分佈,則必需較高地設定金屬管202之加熱溫度,以使於溫度分佈中溫度最低之部分之溫度成為適於進行使澄清劑發揮還原作用而釋放氧氣之脫泡,並且使熔融玻璃MG具有容易使泡浮起之黏度的溫度。然而,若設定為如上所述之加熱溫度,則構成金屬管202d之鉑或鉑合金等金屬成分之揮發變得劇烈,金屬管202d之消耗變得劇烈。因此,於本實施形態中,為了使熔融玻璃MG於金屬管202d之徑向之溫度分佈接近均勻(為了均勻化),而於金屬管202d之流路上設置作為攪拌熔融玻璃MG之機構之板材202e、202f。藉此,可與先前相比防止構成金屬管202d之鉑或鉑合金之揮發,並且提高熔融玻璃MG之澄清效果。 In the clarification tank 202, the molten glass MG supplied from the glass supply pipe 204 is defoamed while flowing through the metal pipe 202 which is electrically heated by a peripheral wall including platinum or a platinum alloy. In this case, the molten glass MG flowing near the wall of the heated metal pipe 202d is easily heated by the electric heating of the metal pipe 202d, but the portion of the center of the flow path in the molten glass MG is away from the heated metal wall 202d. Therefore, it is difficult to heat up. That is, easy to follow the metal The temperature distribution of the molten glass MG is generated in the radial direction of the tube 202d. Therefore, in the previous clarification tank in which the plates 202e, 202f are not provided, the temperature distribution of the molten glass flowing in the radial direction of the tube is not uniform, and in addition, the portion of the center of the flow path which is far from the wall of the metal pipe is molten glass. The flow rate is faster than the flow rate of the molten glass flowing near the wall of the metal tube. Therefore, the molten glass MG flowing in the center of the flow path section is easily passed through the clarification tank without being heated. If the temperature distribution of the molten glass MG is generated in the radial direction of the metal pipe 202d for the above reason, it is necessary to set the heating temperature of the metal pipe 202 to be high so that the temperature at the lowest temperature portion in the temperature distribution is suitable for clarification. The agent exerts a reducing action to release defoaming of oxygen, and the molten glass MG has a temperature at which the viscosity of the bubble is easily floated. However, when the heating temperature is set as described above, volatilization of a metal component such as platinum or a platinum alloy constituting the metal pipe 202d becomes severe, and the consumption of the metal pipe 202d becomes severe. Therefore, in the present embodiment, in order to make the temperature distribution of the molten glass MG in the radial direction of the metal pipe 202d nearly uniform (for uniformity), the plate 202e as a mechanism for stirring the molten glass MG is provided on the flow path of the metal pipe 202d. 202f. Thereby, the volatilization of the platinum or platinum alloy constituting the metal pipe 202d can be prevented as compared with the prior, and the clarifying effect of the molten glass MG can be improved.

本實施形態之使用板材202e、202f之熔融玻璃MG之攪拌係於澄清槽202之自金屬管202d內之熔融玻璃MG之入口起至熔融玻璃MG之藉由加熱所形成之最高溫度(參照圖3(b))附近為止之區間之至少一部分中進行。由於在上述區間中進行熔融玻璃MG之脫泡步驟,故而藉由於該脫泡步 驟中使熔融玻璃MG沿金屬管202d之徑向之溫度分佈均勻化,可抑制金屬管202d之多餘之加熱,可防止構成金屬管202d之鉑或鉑合金之揮發,並且提高熔融玻璃MG之澄清效果。此處所謂「最高溫度附近」之「附近」,係指相對於最高溫度例如為10℃以內之範圍,較佳為5℃以內之範圍。因此,所謂上述區間,係指自金屬管202d內之熔融玻璃MG之入口起至超過熔融玻璃MG之藉由加熱所形成之最高溫度之位置而溫度降低10℃之上述「附近」之邊緣為止之區間。 The agitation of the molten glass MG using the plate materials 202e and 202f in the present embodiment is the highest temperature formed by heating from the inlet of the molten glass MG in the metal pipe 202d to the molten glass MG in the clarification tank 202 (refer to FIG. 3). (b)) Perform at least part of the interval up to the vicinity. Since the defoaming step of the molten glass MG is performed in the above section, the defoaming step is The temperature distribution of the molten glass MG in the radial direction of the metal pipe 202d is made uniform, the excess heating of the metal pipe 202d can be suppressed, the volatilization of the platinum or platinum alloy constituting the metal pipe 202d can be prevented, and the clarification of the molten glass MG can be improved. effect. Here, "near" in the vicinity of "the highest temperature" means a range of, for example, 10 ° C or less with respect to the maximum temperature, and preferably a range of 5 ° C or less. Therefore, the above-mentioned section means the distance from the entrance of the molten glass MG in the metal pipe 202d to the edge of the above-mentioned "near" where the temperature is lowered by 10 ° C beyond the position of the highest temperature formed by heating of the molten glass MG. Interval.

於澄清槽202中,於使熔融玻璃MG升溫而進行脫泡後,藉由對加熱電極202b、202c間之金屬管202d進行通電加熱,而使熔融玻璃MG之溫度降低至低於澄清槽202之前半中之熔融玻璃MG之溫度的適於吸收步驟之溫度。此處,所謂澄清槽202之前半中之熔融玻璃MG之溫度,係指促進澄清劑之氧氣之釋放反應、並且成為容易使熔融玻璃MG中之泡浮起之黏度(較佳為120[泊]~400[泊])的溫度,例如於無鹼玻璃或僅含微量之鹼之微量含鹼之玻璃(高溫黏性玻璃)、例如相當於102.5[泊]之溫度為1500℃以上之玻璃中,於將SnO2用作澄清劑之情形時,該溫度例如於1610℃~1710℃之範圍內。於在上述無鹼玻璃中或微量含鹼之玻璃中使用SnO2作為澄清劑之情形時,適於吸收步驟之溫度於1200℃~1650℃之範圍內。其結果,所形成之澄清槽202內之熔融玻璃MG之最高溫度為1670℃~1710℃、或者1690℃~1710℃。又,於該情形時,圖3(b)所示之最 高溫度之上限例如為1700度~1710度。 In the clarification tank 202, after the molten glass MG is heated and defoamed, the temperature of the molten glass MG is lowered to be lower than the clarification tank 202 by heating and heating the metal pipe 202d between the heating electrodes 202b and 202c. The temperature of the molten glass MG in the first half is suitable for the temperature of the absorption step. Here, the temperature of the molten glass MG in the first half of the clarification tank 202 is a viscosity which promotes the release reaction of oxygen of the clarifying agent and which is easy to float the bubble in the molten glass MG (preferably 120 [po] a temperature of ~400 [poise], for example, in an alkali-free glass or a trace amount of alkali-containing glass (high-temperature viscous glass), for example, in a glass having a temperature of 1500 ° C or higher corresponding to 10 2.5 [poise] In the case where SnO 2 is used as a clarifying agent, the temperature is, for example, in the range of 1610 ° C to 1710 ° C. In the case where SnO 2 is used as the clarifying agent in the above alkali-free glass or a trace amount of alkali-containing glass, the temperature suitable for the absorption step is in the range of 1200 ° C to 1650 ° C. As a result, the maximum temperature of the molten glass MG in the formed clarification tank 202 is 1670 ° C to 1710 ° C or 1690 ° C to 1710 ° C. Moreover, in this case, the upper limit of the maximum temperature shown in FIG. 3(b) is, for example, 1700 to 1710 degrees.

如此,使熔融玻璃MG中所含之澄清劑發揮氧化作用,使殘留於熔融玻璃MG中之泡所含之氧氣吸收於澄清劑中而進行澄清。此時,由於熔融玻璃MG之溫度高於管之壁面之溫度,故而於未在澄清槽202中進行攪拌之情形時,在管路之中心附近流動之熔融玻璃MG之溫度變得高於在管之壁面附近流動之熔融玻璃的溫度。即,存在無法完全降低至適於吸收步驟之溫度而使澄清變得不充分之問題。此時,澄清槽202可將板材202e、202f用作熔融玻璃MG之攪拌機構而攪拌熔融玻璃MG。於泡之吸收時,若熔融玻璃MG存在上述溫度分佈,則由於上述原因而難以高效地吸收殘留於熔融玻璃MG中之泡。因此,於本實施形態中,如圖4(a)中所示,不僅於熔融玻璃MG之脫泡時,於泡之吸收時亦可將板材202e、202f用作熔融玻璃MG之攪拌機構。藉由於熔融玻璃MG之脫泡時攪拌熔融玻璃,或者藉由除於熔融玻璃MG之脫泡時以外亦於泡之吸收時攪拌熔融玻璃,可使管之壁面之溫度低於未攪拌熔融玻璃之情形例如數℃~10數℃。即,即便使管之壁面之溫度降低例如數℃~10數℃,亦可成為與未攪拌熔融玻璃之情形之熔融玻璃之溫度相同之溫度。 In this manner, the clarifying agent contained in the molten glass MG is oxidized, and the oxygen contained in the bubbles remaining in the molten glass MG is absorbed in the clarifying agent to be clarified. At this time, since the temperature of the molten glass MG is higher than the temperature of the wall surface of the tube, when the stirring is not performed in the clarification tank 202, the temperature of the molten glass MG flowing near the center of the piping becomes higher than that in the tube. The temperature of the molten glass flowing near the wall surface. That is, there is a problem that the temperature cannot be completely lowered to the temperature suitable for the absorption step, and the clarification is insufficient. At this time, the clarification tank 202 can use the plate members 202e and 202f as a stirring mechanism of the molten glass MG to stir the molten glass MG. When the molten glass MG has the above temperature distribution at the time of absorption of the bubbles, it is difficult to efficiently absorb the bubbles remaining in the molten glass MG due to the above reasons. Therefore, in the present embodiment, as shown in Fig. 4(a), not only the defoaming of the molten glass MG but also the plate members 202e and 202f can be used as the stirring mechanism of the molten glass MG during the absorption of the bubbles. The temperature of the wall surface of the tube can be made lower than that of the unstirred molten glass by stirring the molten glass during defoaming of the molten glass MG or by stirring the molten glass during the absorption of the bubbles in addition to the defoaming of the molten glass MG. The situation is, for example, a few ° C ~ 10 ° ° C. That is, even if the temperature of the wall surface of the tube is lowered by, for example, several ° C to 10 ° C, the temperature may be the same as the temperature of the molten glass in the case where the molten glass is not stirred.

於本實施形態之澄清步驟中不僅於進行熔融玻璃MG之脫泡時,亦於進行泡之吸收時將板材202e、202f用作熔融玻璃MG之攪拌機構,但只要至少於使熔融玻璃MG升溫而進行脫泡之部分中以上述溫度分佈均勻化之方式攪拌熔融 玻璃MG即可。 In the clarification step of the present embodiment, not only the defoaming of the molten glass MG but also the plate members 202e and 202f are used as the stirring mechanism of the molten glass MG when the bubble is absorbed, but the molten glass MG is heated at least. Stirring and melting in a portion where defoaming is performed in such a manner that the above temperature distribution is uniformized Glass MG can be used.

本實施形態之進行脫泡之金屬管202d係相對於玻璃供給管204階梯地擴大之擴大管,但亦可為連續地擴徑之擴大管。由於至少金屬管202d為相對於玻璃供給管204擴大之管,故而於金屬管202d內於熔融玻璃MG之上方存在氣相空間,可使熔融玻璃MG具有液面,並且由於流路擴大,故而熔融玻璃MG之流速降低而延長於金屬管202d內之停留時間,此外由於熔融玻璃MG之液面之面積擴大,故而可高效率地進行脫泡。 The metal pipe 202d for defoaming in the present embodiment is an enlarged pipe which is stepwise enlarged with respect to the glass supply pipe 204, but may be an enlarged pipe which is continuously expanded in diameter. Since at least the metal pipe 202d is a pipe that is enlarged with respect to the glass supply pipe 204, a gas phase space exists in the metal pipe 202d above the molten glass MG, so that the molten glass MG has a liquid surface, and is melted due to an enlarged flow path. The flow rate of the glass MG is lowered to extend the residence time in the metal pipe 202d, and since the area of the liquid surface of the molten glass MG is enlarged, defoaming can be performed efficiently.

(玻璃組成) (glass composition)

藉由本實施形態之玻璃基板之製造方法而製造之玻璃基板可較佳用於平板顯示器用玻璃基板。就高效地發揮本實施形態之效果方面而言,例如較佳為具有不含Li、Na、及K中之任一成分、或者即便含有Li、Na、及K中之至少任一成分,內部含有Li、Na、及K之成分之合計量亦為0.5質量%以下的玻璃組成。玻璃組成可較佳例示如下所示者。 The glass substrate produced by the method for producing a glass substrate of the present embodiment can be preferably used for a glass substrate for a flat panel display. In order to effectively exhibit the effects of the present embodiment, for example, it is preferable to contain any one of Li, Na, and K, or to contain at least one of Li, Na, and K, and to contain the inside. The total amount of the components of Li, Na, and K is also a glass composition of 0.5% by mass or less. The glass composition can be preferably exemplified as follows.

玻璃基板之玻璃組成例如可列舉如下者。 The glass composition of a glass substrate is mentioned, for example.

以下所示之組成之含有率表達係質量%。 The content rate of the composition shown below is expressed as % by mass.

較佳為含有如下組成之無鹼玻璃:SiO2:50~70%、B2O3:5~18%、Al2O3:0~25%、MgO:0~10%、CaO:0~20%、 SrO:0~20%、BaO:0~10%、RO:5~20%(其中,R係選自Mg、Ca、Sr及Ba中之至少一種、且為玻璃板所含有者)。 Preferably, the alkali-free glass contains the following composition: SiO 2 : 50 to 70%, B 2 O 3 : 5 to 18%, Al 2 O 3 : 0 to 25%, MgO: 0 to 10%, CaO: 0~ 20%, SrO: 0 to 20%, BaO: 0 to 10%, and RO: 5 to 20% (wherein R is selected from at least one of Mg, Ca, Sr, and Ba, and is contained in a glass plate) .

又,玻璃基板之玻璃可列舉以下之玻璃組成:SiO2:50~70%、B2O3:1~10%、Al2O3:0~25%、MgO:0~10%、CaO:0~20%、SrO:0~20%、BaO:0~10%、RO:5~30%(其中,R為Mg、Ca、Sr及Ba之合量),含有如上組成之無鹼玻璃亦同樣較佳。 Further, the glass of the glass substrate may be exemplified by the following glass compositions: SiO 2 : 50 to 70%, B 2 O 3 : 1 to 10%, Al 2 O 3 : 0 to 25%, MgO: 0 to 10%, and CaO: 0~20%, SrO: 0~20%, BaO: 0~10%, RO: 5~30% (where R is the sum of Mg, Ca, Sr and Ba), and the alkali-free glass containing the above composition is also It is also better.

又,玻璃基板之玻璃可列舉以下之玻璃組成:SiO2:50~70%、B2O3:3~15%、Al2O3:8~25%、MgO:0~10%、CaO:0~20%、SrO:0~20%、BaO:0~10%、RO:5~30%(其中,R為Mg、Ca、Sr及Ba之合量),含有如上組成之無鹼玻璃亦同樣較佳。 Further, the glass of the glass substrate may be exemplified by the following glass compositions: SiO 2 : 50 to 70%, B 2 O 3 : 3 to 15%, Al 2 O 3 : 8 to 25%, MgO: 0 to 10%, and CaO: 0~20%, SrO: 0~20%, BaO: 0~10%, RO: 5~30% (where R is the sum of Mg, Ca, Sr and Ba), and the alkali-free glass containing the above composition is also It is also better.

再者,於本實施形態中採用無鹼玻璃,但玻璃基板亦可為微量含有鹼金屬(鹼金屬之合計含有率大於0質量%)之微量含鹼之玻璃。於含有鹼金屬之情形時,較佳為含有合計0.10質量%以上且0.5質量%以下之R'2O(其中,R'係選自Li、Na及K中之至少一種,且為玻璃基板G所含有者)。又,為了使玻璃之熔解變容易,就降低比電阻之觀點而言,玻璃中之氧化鐵之含量換算為Fe2O3較佳為0.01~0.2質量%,更佳為0.01~0.15質量%,進而較佳為0.01~0.10質量%。又,於添加SnO2作為澄清劑之情形時,SnO2之含量進而較佳為0.01~0.5質量%。又,於本實施形態中,由於SnO2為容易使玻璃失透之成分,故而為了提高澄清性且不引起失透,其含有率較佳為0.01~0.5質量%,更佳為0.05~0.4質量%,進而較佳為0.1~0.3質量%。又,較佳為實質上不含As2O3、Sb2O3、PbO。 Further, in the present embodiment, the alkali-free glass is used, but the glass substrate may be a trace amount of alkali-containing glass containing a small amount of an alkali metal (the total content of the alkali metal is more than 0% by mass). In the case of containing an alkali metal, it is preferable to contain R0 2 O in a total amount of 0.10% by mass or more and 0.5% by mass or less (wherein R' is at least one selected from the group consisting of Li, Na, and K, and is a glass substrate G Included). Further, in order to make the melting glass becomes easy to reduce the specific resistance of the viewpoint, the content of iron oxide in the glass in terms of Fe 2 O 3 is preferably 0.01 to 0.2% by mass, more preferably 0.01 to 0.15% by mass, Further, it is preferably 0.01 to 0.10% by mass. Further, when SnO 2 is added as a clarifying agent, the content of SnO 2 is more preferably 0.01 to 0.5% by mass. Further, in the present embodiment, since SnO 2 is a component which tends to devitrify the glass, the content thereof is preferably 0.01 to 0.5% by mass, more preferably 0.05 to 0.4 by mass in order to improve the clarity and prevent devitrification. % is further preferably 0.1 to 0.3% by mass. Further, it is preferable that substantially no As 2 O 3 , Sb 2 O 3 or PbO is contained.

除上述成分以外,為了調節玻璃之各種物理、熔融、澄清、及成形之特性,本實施形態之玻璃基板亦可含有各種其他氧化物。作為此種其他氧化物,並不限定於如下,可列舉:TiO2、MnO、ZnO、Nb2O5、MoO3、Ta2O5、WO3、Y2O3、及La2O3In addition to the above components, the glass substrate of the present embodiment may contain various other oxides in order to adjust various physical, melting, clarifying, and forming properties of the glass. The other oxide is not limited to the following, and examples thereof include TiO 2 , MnO, ZnO, Nb 2 O 5 , MoO 3 , Ta 2 O 5 , WO 3 , Y 2 O 3 , and La 2 O 3 .

於本實施形態之製造方法中,藉由攪拌熔融玻璃MG而使熔融玻璃MG沿金屬管202d之徑向之溫度分佈均勻化。因此,即便於視玻璃組成而使用熔解性較低、熔融玻璃之黏性較高之熔融玻璃之情形時,只要將熔融玻璃加熱至使熔融玻璃之黏度適於脫泡之程度即可,無需如先前般為了 提高於金屬管之中心附近流動之熔融玻璃之溫度而更進一步加熱熔融玻璃。因此,可抑制由鉑或鉑合金所構成之金屬管202d之揮發,並且有效地進行澄清步驟。 In the manufacturing method of the present embodiment, the molten glass MG is stirred to uniformize the temperature distribution in the radial direction of the metal pipe 202d. Therefore, even when a molten glass having a low meltability and a high viscosity of molten glass is used depending on the glass composition, the molten glass may be heated to a degree that the viscosity of the molten glass is suitable for defoaming, and it is not necessary. Previously The molten glass is further heated by raising the temperature of the molten glass flowing near the center of the metal pipe. Therefore, the volatilization of the metal pipe 202d composed of platinum or a platinum alloy can be suppressed, and the clarification step can be efficiently performed.

即,即便為對應於102.5[泊]之溫度為1500℃以上(例如1500℃以上且1650℃以下)之黏性較高之玻璃,亦可於本實施形態之製造方法中較佳用作構成玻璃基板之玻璃,可抑制由鉑或鉑合金所構成之金屬管202d之揮發,並且有效地進行澄清步驟。 In other words, even a glass having a high viscosity corresponding to a temperature of 102.5 [poise] of 1500 ° C or higher (for example, 1500 ° C or higher and 1650 ° C or lower) can be preferably used as a constituent glass in the production method of the present embodiment. The glass of the substrate suppresses the volatilization of the metal tube 202d composed of platinum or a platinum alloy, and the clarification step is effectively performed.

又,即便並非黏性較高之玻璃,就近年來環境負荷之觀點而言,於將SnO2代替As2O3用作澄清劑之情形時,與將As2O3用作澄清劑之情形相比更為使熔融玻璃成為高溫,故而鉑或鉑合金之揮發亦更加成為問題。然而,於本實施形態之製造方法中,無需如先前般為了提高於金屬管之中心附近流動之熔融玻璃之溫度而更進一步加熱熔融玻璃。因此,可抑制由鉑或鉑合金所構成之金屬管202d之揮發,並有效地進行澄清步驟。 Moreover, even in the case of glass which is not highly viscous, in the case of using environmentally important load in recent years, when SnO 2 is used as a clarifying agent instead of As 2 O 3 , it is the case where As 2 O 3 is used as a clarifying agent. The ratio of the molten glass to a higher temperature makes the volatilization of platinum or a platinum alloy more problematic. However, in the manufacturing method of the present embodiment, it is not necessary to further heat the molten glass in order to increase the temperature of the molten glass flowing near the center of the metal pipe as before. Therefore, volatilization of the metal pipe 202d composed of platinum or a platinum alloy can be suppressed, and the clarification step can be efficiently performed.

(變形例) (Modification)

於本實施形態中,如圖4(a)所示,交替地配置有複數之設置於金屬管202d內之板材202e、202f,但亦可配置1組板材202e、202f。 In the present embodiment, as shown in FIG. 4(a), a plurality of plate members 202e and 202f provided in the metal pipe 202d are alternately arranged, but one set of plate members 202e and 202f may be disposed.

又,如圖6(a)所示,亦可於金屬管202d內交替地設置自金屬管202d之壁朝向管路之內側延伸,但延伸高度不同之板材202e、202f。即,由於鄰接之板材202e、202f之高度不同,故而板材202e、202f之組之限制流路剖面之部分相 互不同。於該情形時,藉由利用板材202e、202f之攪拌,熔融玻璃MG如圖中所示之虛線般起伏而流動。即,圖6(a)所示之板材202e、202f係用作攪拌熔融玻璃MG之攪拌機構。 Further, as shown in Fig. 6(a), the metal plates 202d may be alternately provided with the plates 202e and 202f extending from the wall of the metal pipe 202d toward the inside of the pipe but having different extension heights. That is, since the heights of the adjacent plates 202e, 202f are different, a portion of the plates 202e, 202f restricts the flow path profile. Different from each other. In this case, by the agitation of the sheets 202e, 202f, the molten glass MG flows in a undulating manner as shown in the dotted line. That is, the plate members 202e and 202f shown in Fig. 6(a) are used as a stirring mechanism for stirring the molten glass MG.

進而,亦可如圖6(b)所示於金屬管202d內交替設置開有複數之圓形狀或半圓形狀之孔之板材202e、及設置有與該孔之配置不同之孔之板材202f代替本實施形態之圖4(a)、(b)所示之板材202e、202f。 Further, as shown in FIG. 6(b), a plate member 202e having a plurality of holes having a circular or semicircular shape and a plate member 202f provided with a hole different from the arrangement of the holes may be alternately arranged in the metal pipe 202d. The plates 202e and 202f shown in Figs. 4(a) and 4(b) of the embodiment.

又,亦可如圖6(c)所示於金屬管202d內交替設置於一方向上開有複數之狹縫孔之板材202e、及設置有與該狹縫孔之朝向不同之狹縫孔之板材202f代替本實施形態之圖4(a)、(b)所示板材202e、202f。於圖6(b)、(c)之情形時,板材202e、202f之組之限制流路剖面之部分亦相互不同。因此,熔融玻璃MG可藉由板材202e、202f而高效地攪拌。 Further, as shown in FIG. 6(c), a plate member 202e having a plurality of slit holes in one direction and a slit plate provided with a slit hole different from the direction of the slit hole may be alternately provided in the metal pipe 202d. 202f replaces the plates 202e and 202f shown in Figs. 4(a) and 4(b) of the present embodiment. In the case of Figs. 6(b) and (c), the portions of the restricting flow path sections of the groups of the plates 202e, 202f are also different from each other. Therefore, the molten glass MG can be efficiently stirred by the sheets 202e, 202f.

進而,亦可如圖7所示,藉由於金屬管202d內設置旋轉軸202g上設置有葉片202h,並使旋轉軸202g旋轉之攪拌機202i作為動態攪拌機構而代替如本實施形態般使用板材202e、202f作為用以攪拌熔融玻璃MG之機構(靜態攪拌機構)攪拌熔融玻璃MG。 Further, as shown in FIG. 7, the metal plate 202d may be provided with a blade 202h provided on the rotating shaft 202g, and the agitator 202i for rotating the rotating shaft 202g as a dynamic stirring mechanism instead of using the plate member 202e as in the present embodiment. 202f agitates the molten glass MG as a mechanism (static stirring mechanism) for stirring the molten glass MG.

以上,對本發明之玻璃基板之製造方法詳細地進行說明,但本發明並不限定於上述實施形態,當然亦可於不脫離本發明之主旨之範圍內進行各種改良或變更。 In the above, the method of manufacturing the glass substrate of the present invention is described in detail, but the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention.

200‧‧‧熔解裝置 200‧‧‧melting device

201‧‧‧熔解槽 201‧‧‧melting tank

202‧‧‧澄清槽 202‧‧‧Clarification tank

202a、202b、202c‧‧‧加熱電極 202a, 202b, 202c‧‧‧ heating electrodes

202d‧‧‧金屬管 202d‧‧‧Metal tube

202e、202f‧‧‧板材 202e, 202f‧‧‧ plates

202g‧‧‧旋轉軸 202g‧‧‧Rotary axis

202h‧‧‧葉片 202h‧‧‧ leaves

202i‧‧‧攪拌機 202i‧‧‧Mixer

203‧‧‧攪拌槽 203‧‧‧Stirring tank

203a‧‧‧攪拌器 203a‧‧‧Agitator

204、205、206‧‧‧玻璃供給管 204, 205, 206‧‧‧ glass supply tube

300‧‧‧成形裝置 300‧‧‧Forming device

310‧‧‧成形體 310‧‧‧Formed body

400‧‧‧切割裝置 400‧‧‧ cutting device

圖1係本實施形態之玻璃基板之製造方法之步驟圖。 Fig. 1 is a step diagram showing a method of manufacturing a glass substrate of the embodiment.

圖2係示意性地表示進行圖1所示之熔解步驟~切割步驟之裝置之圖。 Fig. 2 is a view schematically showing an apparatus for performing the melting step to the cutting step shown in Fig. 1.

圖3中(a)係主要表示進行圖1所示之澄清步驟之澄清槽之圖,(b)係表示澄清槽之外周壁之溫度之圖。 Fig. 3(a) is a view mainly showing a clarification tank for carrying out the clarification step shown in Fig. 1, and Fig. 3(b) is a view showing the temperature of the outer peripheral wall of the clarification tank.

圖4(a)~(c)係說明澄清槽所使用之板材之圖。 4(a) to (c) are diagrams showing the plates used in the clarification tank.

圖5係說明先前之澄清槽中之熔融玻璃之流速及溫度之圖。 Figure 5 is a graph showing the flow rate and temperature of the molten glass in the previous clarification tank.

圖6(a)~(c)係表示與圖4(a)~(c)所示之板材不同形態之板材之例的圖。 6(a) to 6(c) are views showing an example of a plate material different from the plate material shown in Figs. 4(a) to 4(c).

圖7係表示與圖4(a)~(c)所示之板材所構成之攪拌機構不同形態之攪拌機構之例的圖。 Fig. 7 is a view showing an example of a stirring mechanism different from the stirring mechanism constituted by the plate material shown in Figs. 4(a) to 4(c).

202‧‧‧澄清槽 202‧‧‧Clarification tank

202e、202f‧‧‧板材 202e, 202f‧‧‧ plates

204、205‧‧‧玻璃供給管 204, 205‧‧‧ glass supply tube

Claims (13)

一種玻璃基板之製造方法,其特徵在於:其包括一面使熔融玻璃於包含鉑或鉑合金之外周壁受加熱之管中流動一面進行澄清之澄清步驟;上述澄清步驟包括使上述熔融玻璃中之氣泡自熔融玻璃之液面朝向上述管內之氣相釋放之脫泡步驟;並且於上述脫泡步驟中,藉由攪拌上述熔融玻璃而使上述熔融玻璃沿上述管之徑向之溫度分佈均勻化。 A method for producing a glass substrate, comprising: a clarification step of clarifying a molten glass while flowing in a tube containing a peripheral wall other than platinum or a platinum alloy; and the clarifying step includes causing bubbles in the molten glass a defoaming step of releasing the liquid surface of the molten glass toward the gas phase in the tube; and in the defoaming step, the temperature distribution of the molten glass in the radial direction of the tube is made uniform by stirring the molten glass. 如請求項1之玻璃基板之製造方法,其於上述管內之自上述熔融玻璃之入口起至上述熔融玻璃之藉由加熱所形成之最高溫度附近為止之區間之至少一部分中攪拌上述熔融玻璃。 The method for producing a glass substrate according to claim 1, wherein the molten glass is stirred in at least a part of a section from the inlet of the molten glass to a vicinity of a highest temperature at which the molten glass is heated by the heating. 如請求項1或2之玻璃基板之製造方法,其中上述管包含階梯地或者連續地擴徑之擴大管;且上述脫泡步驟係於上述擴大管中進行。 The method for producing a glass substrate according to claim 1 or 2, wherein the tube comprises an enlarged tube which is expanded stepwise or continuously; and the defoaming step is carried out in the enlarged tube. 如請求項1或2之玻璃基板之製造方法,其中於上述熔融玻璃中含有SnO2作為澄清劑。 The method for producing a glass substrate according to claim 1 or 2, wherein the molten glass contains SnO 2 as a clarifying agent. 如請求項1或2之玻璃基板之製造方法,其中上述所製造之玻璃基板對應於102.5[泊]之黏度之溫度為1500℃以上。 The method for producing a glass substrate according to claim 1 or 2, wherein the glass substrate produced by the above-mentioned glass substrate has a viscosity corresponding to a viscosity of 10 2.5 [poise] of 1500 ° C or higher. 如請求項1或2之玻璃基板之製造方法,其中於上述脫泡步驟中所攪拌之上述熔融玻璃之黏度為120~400[泊]。 The method for producing a glass substrate according to claim 1 or 2, wherein the viscosity of the molten glass stirred in the defoaming step is 120 to 400 [poise]. 如請求項1或2之玻璃基板之製造方法,其中於上述管內之上方具有氣相之空間。 A method of producing a glass substrate according to claim 1 or 2, wherein a space of a gas phase is provided above the inside of the tube. 如請求項1或2之玻璃基板之製造方法,其中所製造之上述玻璃基板係由無鹼玻璃或者微量含鹼之玻璃所構成。 The method for producing a glass substrate according to claim 1 or 2, wherein the glass substrate produced is composed of an alkali-free glass or a trace amount of alkali-containing glass. 如請求項1或2之玻璃基板之製造方法,其中上述熔融玻璃之攪拌係使用由固定於上述管之板構件而構成之靜態攪拌機構進行。 The method for producing a glass substrate according to claim 1 or 2, wherein the stirring of the molten glass is carried out using a static stirring mechanism constituted by a plate member fixed to the tube. 如請求項9之玻璃基板之製造方法,其中上述靜態攪拌機構為以限制上述管內之熔融玻璃之流路剖面之方式而設置之板構件。 The method for producing a glass substrate according to claim 9, wherein the static stirring mechanism is a plate member provided to restrict a cross section of the flow path of the molten glass in the tube. 如請求項10之玻璃基板之製造方法,其中上述靜態攪拌機構係由以限制上述管內之熔融玻璃之流路剖面之方式而設置於上述管內之流路方向之不同位置上之複數之板構件所構成,且於鄰接之板構件之組中之至少1組中,限制上述流路剖面之部分相互不同。 The method for producing a glass substrate according to claim 10, wherein the static stirring mechanism is a plurality of plates which are disposed at different positions in a flow path direction in the tube so as to restrict a flow path of the molten glass in the tube. The member is configured to restrict the portions of the flow path cross-section from being different from each other in at least one of the group of adjacent plate members. 如請求項1或2之玻璃基板之製造方法,其中上述熔融玻璃之攪拌係使用動態攪拌機構而進行。 The method for producing a glass substrate according to claim 1 or 2, wherein the stirring of the molten glass is carried out using a dynamic stirring mechanism. 如請求項1或2之玻璃基板之製造方法,其中上述澄清步驟於上述脫泡步驟後,更包含使熔融玻璃中之氣泡吸收於上述熔融玻璃中之吸收步驟;且於上述吸收步驟中,攪拌上述熔融玻璃。 The method for producing a glass substrate according to claim 1 or 2, wherein the clarifying step further comprises an absorption step of absorbing bubbles in the molten glass in the molten glass after the defoaming step; and stirring in the absorbing step The above molten glass.
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