TWI417256B - Manufacture of glass plates - Google Patents

Manufacture of glass plates Download PDF

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Publication number
TWI417256B
TWI417256B TW101137573A TW101137573A TWI417256B TW I417256 B TWI417256 B TW I417256B TW 101137573 A TW101137573 A TW 101137573A TW 101137573 A TW101137573 A TW 101137573A TW I417256 B TWI417256 B TW I417256B
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Taiwan
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glass
temperature
molten glass
mass
clarification tank
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TW101137573A
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Chinese (zh)
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TW201323357A (en
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Tetsuo Kimijima
Hitoshi Gekko
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Avanstrate Inc
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18Stirring devices; Homogenisation
    • C03B5/187Stirring devices; Homogenisation with moving elements
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/235Heating the glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/42Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
    • C03B5/43Use of materials for furnace walls, e.g. fire-bricks
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)

Description

玻璃板之製造方法Glass plate manufacturing method

本發明係關於一種利用下拉法之玻璃板之製造方法。The present invention relates to a method of manufacturing a glass sheet using a down-draw method.

於液晶顯示器或電漿顯示器等平板顯示器(以下記為「FPD」)所使用之玻璃基板中,使用有厚度例如為0.5~0.7 mm之較薄之玻璃板。該FPD用玻璃基板例如於第1代中為300×400 mm之尺寸,但於第10代中變為2850×3050 mm之尺寸。In a glass substrate used for a flat panel display such as a liquid crystal display or a plasma display (hereinafter referred to as "FPD"), a thin glass plate having a thickness of, for example, 0.5 to 0.7 mm is used. The glass substrate for FPD has a size of, for example, 300 × 400 mm in the first generation, but has a size of 2,850 × 3050 mm in the 10th generation.

為了製造此種第8代以後之較大尺寸之FPD用玻璃基板,最經常使用溢流下拉(overflow down draw)法。溢流下拉法包括於成形爐中藉由使熔融玻璃自成形體之上部溢出而於成形體之下方成形板狀玻璃之步驟,及於徐冷爐中對板狀玻璃進行緩冷卻之步驟。徐冷爐於藉由將板狀玻璃引入成為一對之輥間而拉伸為所需之厚度之後,以降低板狀玻璃之內部應變或熱縮之方式而對板狀玻璃進行緩冷卻。之後,將板狀玻璃切割為特定之尺寸並作為玻璃板而積層於其他之玻璃板上而保管。或者將玻璃板搬送至下一步驟。In order to manufacture such a glass substrate for FPD of a larger size after the eighth generation, an overflow down draw method is most often used. The overflow down-draw method includes a step of forming a sheet glass under the molded body by overflowing the molten glass from the upper portion of the molded body in the forming furnace, and a step of slowly cooling the sheet glass in the quenching furnace. The cold furnace is cooled to a desired thickness by introducing the sheet glass into a pair of rolls, and then slowly cooling the sheet glass by reducing internal strain or heat shrinkage of the sheet glass. Thereafter, the sheet glass is cut into a specific size and stored as a glass plate on another glass plate and stored. Or transport the glass plate to the next step.

將藉由此種成形而製造之玻璃板用作於玻璃表面形成半導體元件之液晶顯示器之玻璃基板,但為了不使於該玻璃表面形成之半導體元件之特性因玻璃基板之玻璃組成而劣化,而較佳地使用完全不含有鹼金屬成分,或即便含有其含量亦較少之玻璃板。A glass plate manufactured by such molding is used as a glass substrate of a liquid crystal display in which a semiconductor element is formed on a glass surface, but in order not to deteriorate the characteristics of the semiconductor element formed on the surface of the glass due to the glass composition of the glass substrate, It is preferred to use a glass plate which does not contain an alkali metal component at all or even contains a small amount.

然而,若玻璃板中存在氣泡則成為顯示缺陷之原因,因此,存在氣泡之玻璃板作為平板顯示器用玻璃基板並不合適。因此,要求氣泡不殘留於玻璃板中。尤其是,於液晶顯示器用玻璃基板或有機EL(Electro Luminescent,電致發光)顯示器用玻璃基板中,對氣泡之要求較嚴格。However, if bubbles are present in the glass plate, the defects are caused. Therefore, the glass plate in which the bubbles are present is not suitable as a glass substrate for a flat panel display. Therefore, it is required that the bubbles do not remain in the glass plate. In particular, in glass substrates for liquid crystal displays or glass substrates for organic EL (Electro Luminescent) displays, the requirements for bubbles are strict.

然而,為了抑制半導體元件之特性之劣化,不含有鹼金屬成分,或即便含有其含量亦為少量之玻璃板存在如下問題:與含有多量之鈉鈣玻璃等鹼金屬之玻璃板相比高溫黏性較高,氣泡難以自製造中之熔融玻璃脫離。However, in order to suppress the deterioration of the characteristics of the semiconductor element, the alkali metal component is not contained, or even a glass plate having a small amount thereof has a problem that high temperature viscosity is higher than that of a glass plate containing an alkali metal such as a large amount of soda lime glass. Higher, the bubbles are difficult to detach from the molten glass in the manufacturing.

就降低環境負載之觀點而言,要求限制先前所使用之毒性較高之As2 O3 之使用。因此,近年來代替As2 O3 而將與As2 O3 相比澄清功能較差之SnO2 或Fe2 O3 作為澄清劑而使用。由於SnO2 或Fe2 O3 成為玻璃之失透或著色之原因,故而為了確保與As2 O3 同等之澄清功能而不可多量地添加於玻璃中。因此,於作為最終產品之玻璃板中氣泡變得更容易殘留。From the standpoint of reducing environmental load, it is required to limit the use of As 2 O 3 which is previously used with higher toxicity. Therefore, in recent years, in place of As 2 O 3 , SnO 2 or Fe 2 O 3 having a poorer clarification function than As 2 O 3 has been used as a clarifying agent. Since SnO 2 or Fe 2 O 3 is a cause of devitrification or coloration of the glass, it is not possible to add a large amount to the glass in order to secure a clarifying function equivalent to As 2 O 3 . Therefore, bubbles become more likely to remain in the glass plate as the final product.

對此,揭示有一種技術,其於使玻璃化反應於1300~1500℃下產生之無鹼玻璃溫度上升至例如1650℃而進行脫泡之玻璃基板之製造方法中,為了改善脫泡效果,而使熔融玻璃所具有之β-OH值為0.485/mm以上(專利文獻1)。In order to improve the defoaming effect, a technique for producing a glass substrate in which the temperature of the alkali-free glass produced by the vitrification reaction at 1300 to 1500 ° C is raised to, for example, 1650 ° C, is disclosed. The β-OH value of the molten glass is 0.485/mm or more (Patent Document 1).

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利特開2005-97090號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-97090

此處,例如於不含有鹼金屬、或即便含有其含量亦為少量之玻璃組成中,可熔解於熔融玻璃中之SO2 之熔解度較小,因此一旦SO2 之氣泡產生,則於作為最終產品之玻璃板中作為氣泡之缺陷變得容易殘留。Here, for example, in the glass composition which does not contain an alkali metal or contains a small amount, the degree of melting of SO 2 which can be melted in the molten glass is small, and therefore, once the bubble of SO 2 is generated, it is finally The defects in the glass sheet of the product are easily left as bubbles.

然而,於上述專利文獻1所記載之技術中,存在無法充分抑制澄清步驟後之SO2 氣泡之產生之問題。However, in the technique described in Patent Document 1, there is a problem that the generation of SO 2 bubbles after the clarification step cannot be sufficiently suppressed.

因此,本發明之目的在於提供一種於製造玻璃板之時,可有效率地降低殘留於玻璃板中之氣泡的玻璃板之製造方法。Accordingly, an object of the present invention is to provide a method for producing a glass sheet which can efficiently reduce bubbles remaining in a glass sheet when a glass sheet is produced.

本發明之第1樣態係玻璃板之製造方法。The first aspect of the present invention is a method for producing a glass sheet.

該製造方法包括:熔解步驟,其將含有SnO2 作為澄清劑之玻璃原料至少藉由通電加熱而熔解,從而製作熔融玻璃;澄清步驟,其包括:脫泡處理,其於上述熔解步驟之後,以2℃/分鐘以上之升溫速度使上述熔融玻璃之溫度升溫至1630℃以上,藉此使上述熔融玻璃中生成氣泡並進行脫泡;及吸收處理,其於上述脫泡處理之後,使上述熔融玻璃降溫,藉此將上述熔融玻璃中之氣泡吸收於上述熔融玻璃中;及成形步驟,其使上述澄清步驟後之上述熔融玻璃成形為板狀玻璃。The manufacturing method includes a melting step of melting a glass raw material containing SnO 2 as a fining agent by at least electric heating to prepare a molten glass, and a clarifying step comprising: a defoaming treatment, after the melting step, a temperature increase rate of 2° C./min or more to raise the temperature of the molten glass to 1630° C. or higher, thereby generating bubbles in the molten glass and performing defoaming; and an absorption treatment, after the defoaming treatment, the molten glass is formed Cooling, thereby absorbing bubbles in the molten glass in the molten glass; and a forming step of forming the molten glass after the clarification step into a sheet glass.

此時,較佳為所製造之玻璃板之SnO2 含有0.01~0.5質量%。進而,較佳為所製造之玻璃板組合含有SnO2 及Fe2 O3 ,於此情形時,較佳為含有0.01~0.5質量%之SnO2 ,且含有0.01~0.1質量%之Fe2 O3In this case, it is preferred that the SnO 2 of the glass plate to be produced contains 0.01 to 0.5% by mass. Further, it is preferable that the glass plate to be produced contains SnO 2 and Fe 2 O 3 in combination , and in this case, it is preferable to contain 0.01 to 0.5% by mass of SnO 2 and 0.01 to 0.1% by mass of Fe 2 O 3 . .

本發明之第2態樣如本發明之第1樣態之玻璃板之製造方法,其中於上述成形步驟中,藉由溢流下拉法而由上述熔融玻璃形成板狀玻璃。According to a second aspect of the invention, in the method of producing a glass sheet according to the first aspect of the invention, in the forming step, the sheet glass is formed from the molten glass by an overflow down-draw method.

本發明之第3態樣如本發明之第1或第2樣態之玻璃板之製造方法,其中上述澄清步驟中之上述熔融玻璃之升溫至少利用連接進行上述熔解步驟之熔解槽與進行上述澄清步驟之澄清槽之間之金屬管,並藉由控制流入上述金屬管之電流而進行。According to a third aspect of the present invention, in the method for producing a glass sheet according to the first or second aspect of the present invention, in the clarifying step, the temperature of the molten glass is increased by at least a melting tank for performing the melting step and the clarification. The step of clarifying the metal tube between the grooves is performed by controlling the current flowing into the metal tube.

本發明之第4態樣如本發明之第1至第3樣態中任一項之玻璃板之製造方法,其中1630℃之溫度中之上述熔融玻璃之黏度為130~350泊。A method of producing a glass sheet according to any one of the first to third aspects of the present invention, wherein the viscosity of the molten glass in the temperature of 1630 ° C is 130 to 350 poise.

本發明之第5態樣如本發明之第1至第4樣態中任一項之玻璃板之製造方法,其中上述玻璃板之R'2 O之含量為0~2.0質量%(R'2 O為Li2 O、Na2 O及K2 O之中所含有之成分之合計)。A method of producing a glass sheet according to any one of the first to fourth aspects of the present invention, wherein the glass sheet has a R' 2 O content of 0 to 2.0% by mass (R' 2 O is the total of the components contained in Li 2 O, Na 2 O, and K 2 O).

本發明之第6態樣如本發明之第1至第5樣態中任一項之玻璃板之製造方法,其中上述玻璃板含有:SiO2 :50~70質量%、B2 O3 :5~18質量%、Al2 O3 :10~25質量%、MgO:0~10質量%、CaO:0~20質量%、SrO:0~20質量%、BaO:0~10質量%、RO:5~20質量%(其中R係選自 Mg、Ca、Sr及Ba中至少1種,且RO為MgO、CaO、SrO及BaO之中所含有之成分的合計)。A method of producing a glass sheet according to any one of the first to fifth aspects of the present invention, wherein the glass sheet contains: SiO 2 : 50 to 70% by mass, B 2 O 3 : 5 ~18% by mass, Al 2 O 3 : 10 to 25% by mass, MgO: 0 to 10% by mass, CaO: 0 to 20% by mass, SrO: 0 to 20% by mass, BaO: 0 to 10% by mass, RO: 5 to 20% by mass (wherein R is at least one selected from the group consisting of Mg, Ca, Sr, and Ba, and RO is a total of components contained in MgO, CaO, SrO, and BaO).

本發明之第7態樣如本發明之第1至第6樣態中任一項之玻璃板之製造方法,其中於上述吸收處理中,使上述熔融玻璃於1600℃至1500℃之範圍內以2℃/分鐘以上之降溫速度降溫。A method of producing a glass sheet according to any one of the first to sixth aspects of the present invention, wherein, in the absorbing treatment, the molten glass is in a range of from 1600 ° C to 1500 ° C Cooling at a cooling rate of 2 ° C / min or more.

本發明之第8態樣如本發明之第1至第7樣態中任一項之玻璃板之製造方法,其中於上述澄清步驟與上述成形步驟之間,包括將熔融玻璃之成分均質地攪拌之攪拌步驟,且 於上述熔解步驟中,以比上述熔融玻璃之熔解開始時之溫度更高之溫度將上述熔融玻璃供給至上述澄清步驟,且 於上述澄清步驟中,以比上述吸收處理後之溫度更低之溫度將上述熔融玻璃供給至上述攪拌步驟, 於上述成形步驟中,以關於上述熔融玻璃之黏度η(泊)成為logη=4.3~5.7之溫度供給上述熔融玻璃,而成形為板狀玻璃。A method of producing a glass sheet according to any one of the first to seventh aspects of the invention, wherein the clarifying step and the forming step comprise uniformly stirring the components of the molten glass. Stirring step, and In the melting step, the molten glass is supplied to the clarification step at a temperature higher than a temperature at which the melting of the molten glass is started, and In the clarification step, the molten glass is supplied to the stirring step at a temperature lower than the temperature after the absorption treatment. In the above-described forming step, the molten glass is supplied to the molten glass in a viscosity η (poise) of the molten glass to a temperature of log η = 4.3 to 5.7, and is formed into a sheet glass.

上述態樣之玻璃板之製造方法可有效率地降低殘留於玻璃板中之氣泡。The method for producing a glass plate of the above aspect can efficiently reduce bubbles remaining in the glass plate.

以下,對本實施形態之玻璃板之製造方法進行說明。Hereinafter, a method of producing the glass sheet of the present embodiment will be described.

(玻璃板之製造方法之整體概要)(Overall summary of the manufacturing method of glass plate)

圖1係本實施形態之玻璃板之製造方法之步驟圖。Fig. 1 is a view showing the steps of a method for producing a glass sheet of the embodiment.

玻璃板之製造方法主要包括熔解步驟(ST1)、澄清步驟 (ST2)、均質化步驟(ST3)、供給步驟(ST4)、成形步驟(ST5)、緩冷卻步驟(ST6)、及切割步驟(ST7)。除此之外,包括研削步驟、研磨步驟、清洗步驟、檢查步驟、捆包步驟等,且將於捆包步驟中所積層之複數個玻璃板搬送至訂貨方之業者。The manufacturing method of the glass plate mainly includes a melting step (ST1) and a clarification step (ST2), homogenization step (ST3), supply step (ST4), molding step (ST5), slow cooling step (ST6), and cutting step (ST7). In addition to this, a grinding step, a grinding step, a washing step, an inspection step, a packing step, and the like are included, and a plurality of glass sheets stacked in the packing step are transported to the ordering party.

圖2係模式地表示進行熔解步驟(ST1)~切割步驟(ST7)之玻璃基板製造裝置之圖。該裝置如圖2所示,主要包括熔解裝置200、成形裝置300、及切割裝置400。熔解裝置200主要包括熔解槽201、澄清槽202、攪拌槽203、及玻璃供給管204、205、206。再者,玻璃供給管204、205如下所述係流動熔融玻璃MG之金屬管並且具有澄清功能,因此實質上亦為澄清槽。以下,將玻璃供給管204稱為第1澄清槽204,將澄清槽202稱為第2澄清槽202,將玻璃供給管205稱為第3澄清槽205。再者,連接熔解槽201以後至成形裝置300之各槽間之第1澄清槽204、第3澄清槽205、玻璃供給管206及第2澄清槽202及攪拌槽203之本體部分包括鉑或鉑合金管。第1澄清槽204及第3澄清槽205形成圓筒狀或槽狀。Fig. 2 is a view schematically showing a glass substrate manufacturing apparatus that performs a melting step (ST1) to a cutting step (ST7). As shown in FIG. 2, the apparatus mainly includes a melting device 200, a forming device 300, and a cutting device 400. The melting device 200 mainly includes a melting tank 201, a clarification tank 202, a stirring tank 203, and glass supply pipes 204, 205, and 206. Further, since the glass supply pipes 204 and 205 are metal pipes for flowing the molten glass MG as described below and have a clarifying function, they are also substantially clarification grooves. Hereinafter, the glass supply pipe 204 is referred to as a first clarification tank 204, the clarification tank 202 is referred to as a second clarification tank 202, and the glass supply pipe 205 is referred to as a third clarification tank 205. Further, after the melting tank 201 is connected, the first clarification tank 204, the third clarification tank 205, the glass supply pipe 206, the second clarification tank 202, and the stirring tank 203 between the respective grooves of the molding apparatus 300 include platinum or platinum. Alloy tube. The first clarification tank 204 and the third clarification tank 205 are formed in a cylindrical shape or a groove shape.

於熔解步驟(ST1)中,將添加有SnO2 作為澄清劑並供給至熔解槽201內之玻璃原料,即,含有SnO2 作為澄清劑之玻璃原料至少藉由利用電極之通電加熱而熔解,藉此獲得熔融玻璃。進而,除利用電極之通電加熱以外,亦可利用未圖示之火焰熔解玻璃原料從而獲得熔融玻璃。於進行利用通電加熱及火焰之玻璃原料之熔解之情形時,具體而 言,利用未圖示之原料投入裝置使玻璃原料分散於熔融玻璃MG之液面而供給。玻璃原料藉由於火焰中變為高溫之氣相而得以加熱並緩慢熔解,而熔解於熔融玻璃MG中。熔融玻璃MG藉由通電加熱而升溫。再者,於熔解步驟或熔解步驟與澄清步驟之間,亦可於熔融玻璃中進行利用氧氣之起泡。再者,較佳為於熔解步驟之初期不進行起泡。其原因在於,於熔解步驟之初期(例如熔融玻璃未達1540℃之溫度),於熔解槽201中對熔融玻璃MG進行通電加熱時,較構成熔解槽201之磚等構件之電阻,玻璃之電阻更大,因此電流變得容易流入磚等構件中,而利用電極之向熔融玻璃MG之通電加熱變得困難。In the melting step (ST1), the glass raw material to which the SnO 2 is added as a clarifying agent and supplied to the melting tank 201, that is, the glass raw material containing SnO 2 as a clarifying agent is melted by at least electric heating using an electrode, This obtains molten glass. Further, in addition to the electric heating by the electrodes, the glass frit may be melted by a flame (not shown) to obtain molten glass. In the case of performing the melting of the glass raw material by the electric heating and the flame, specifically, the glass raw material is dispersed and supplied to the liquid surface of the molten glass MG by a raw material input device (not shown). The glass raw material is heated and slowly melted by a gas phase which becomes a high temperature in the flame, and is melted in the molten glass MG. The molten glass MG is heated by electric heating. Further, foaming with oxygen may be performed in the molten glass between the melting step or the melting step and the clarifying step. Further, it is preferred that no foaming is performed at the beginning of the melting step. This is because, in the initial stage of the melting step (for example, the temperature at which the molten glass is less than 1540 ° C), when the molten glass MG is electrically heated in the melting tank 201, the resistance of the member such as the brick constituting the melting tank 201, the resistance of the glass Since it is larger, the electric current easily flows into a member such as a brick, and it is difficult to heat the electric power to the molten glass MG by the electrode.

澄清步驟(ST2)至少於第1澄清槽204、第2澄清槽202及第3澄清槽205中進行。於澄清步驟中,藉由使第1澄清槽204內之熔融玻璃MG升溫,包含於熔融玻璃MG中之含有O2 、CO2 或SO2 等氣體成分之氣泡吸收藉由作為澄清劑之SnO2 之還原反應而產生之O2 而生長,並浮起至熔融玻璃MG之液面而釋出。又,於澄清步驟中,由於熔融玻璃MG之溫度之降低而導致之氣泡中之氣體成分之內壓降低,及藉由SnO2 之還原反應而獲得之SnO由於熔融玻璃MG之溫度之降低而產生氧化反應,藉此將殘留於熔融玻璃MG中之氣泡中之O2 等氣體成分再吸收至熔融玻璃MG中,氣泡消失。利用澄清劑之氧化反應及還原反應係藉由調整熔融玻璃MG之溫度而進行。熔融玻璃MG之溫度之調整係藉由調整第1澄清槽204、第2澄清槽202、及第3澄清槽205之溫 度而進行。各澄清槽之溫度之調整係藉由以下任一種加熱、冷卻方法,或該等方法之組合而進行:向管本身通電之直接通電加熱,或利用配置於第1澄清槽204、第2澄清槽202、第3澄清槽205之周圍之加熱器而加熱各槽之間接加熱,進而利用空冷、水冷之冷卻機之間接冷卻,向第1澄清槽204、第2澄清槽202、第3澄清槽205吹氣、或水噴霧等。又,於圖2中,進行澄清之槽分為第1澄清槽204、第2澄清槽202、第3澄清槽205之3個部分,當然亦可進一步進行細化。The clarification step (ST2) is performed at least in the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205. In the clarification step, by heating the molten glass MG in the first clarification tank 204, the bubbles contained in the molten glass MG containing gas components such as O 2 , CO 2 or SO 2 are absorbed by SnO 2 as a fining agent. The O 2 produced by the reduction reaction grows and floats up to the liquid surface of the molten glass MG to be released. Further, in the clarification step, the internal pressure of the gas component in the bubble is lowered due to the decrease in the temperature of the molten glass MG, and the SnO obtained by the reduction reaction of SnO 2 is generated due to the decrease in the temperature of the molten glass MG. By the oxidation reaction, the gas component such as O 2 remaining in the bubbles in the molten glass MG is reabsorbed into the molten glass MG, and the bubbles disappear. The oxidation reaction and the reduction reaction using the clarifying agent are carried out by adjusting the temperature of the molten glass MG. The temperature adjustment of the molten glass MG is performed by adjusting the temperatures of the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205. The temperature of each of the clarification tanks is adjusted by any one of the following heating and cooling methods, or a combination of the methods: direct electric heating to energize the tube itself, or use in the first clarification tank 204 and the second clarification tank 202. The heaters around the third clarification tank 205 are heated by heating between the respective tanks, and further cooled by air-cooled and water-cooled coolers to the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205. Blowing, or water spray, etc. In addition, in FIG. 2, the tank which clarified is divided into the three parts of the 1st clarification tank 204, the 2nd clarification tank 202, and the 3rd clarification tank 205, and it can carry out further refinement.

於本實施形態之熔融玻璃MG之溫度之調整中,使用作為上述之方法之一的直接通電加熱。具體而言,於設置於向第2澄清槽202供給熔融玻璃MG之第1澄清槽204中之未圖示之金屬製凸緣,與設置於第2澄清槽202中之未圖示之金屬製凸緣之間流動電流(圖3中之箭頭),進而,於設置於第2澄清槽202中之未圖示之金屬製凸緣,與相對於該金屬凸緣而設置於熔融玻璃MG之下游側之第2澄清槽202中之未圖示之金屬製凸緣之間流動電流(圖3中之箭頭),藉此,調整熔融玻璃MG之溫度。於本實施形態中,於金屬製凸緣間之第一個區域、及金屬製凸緣間之第2個區域分別流動一定之電流而對第1澄清槽204及第2澄清槽202進行通電加熱,藉此調整熔融玻璃MG之溫度,但該通電加熱並不限定於利用2個區域之通電加熱之溫度調整,亦可進行1個區域之通電加熱,或於3個以上之區域進行通電加熱,從而進行熔融玻璃MG之溫度調整。In the adjustment of the temperature of the molten glass MG of the present embodiment, direct electric heating as one of the above methods is used. Specifically, the metal flange (not shown) provided in the first clarification tank 204 for supplying the molten glass MG to the second clarification tank 202 is made of metal (not shown) provided in the second clarification tank 202. A current flows between the flanges (arrows in FIG. 3), and a metal flange (not shown) provided in the second clarification tank 202 is provided downstream of the molten glass MG with respect to the metal flange. An electric current (arrow in FIG. 3) flows between metal flanges (not shown) in the second clarification tank 202 on the side, whereby the temperature of the molten glass MG is adjusted. In the present embodiment, the first clarification tank 204 and the second clarification tank 202 are electrically heated by flowing a constant current in the first region between the metal flanges and the second region between the metal flanges. Therefore, the temperature of the molten glass MG is adjusted, but the electric heating is not limited to the temperature adjustment by the electric heating of the two regions, and the electric heating may be performed in one region or the electric heating may be performed in three or more regions. Thereby, the temperature adjustment of the molten glass MG is performed.

於均質化步驟(ST3)中,將通過第3澄清槽205而供給之攪拌槽203內之熔融玻璃MG利用攪拌器203a進行攪拌,藉此,進行玻璃成分之均質化。亦可設置2個以上之攪拌槽203。In the homogenization step (ST3), the molten glass MG in the stirring tank 203 supplied through the third clarification tank 205 is stirred by the agitator 203a, whereby the glass component is homogenized. Two or more stirring tanks 203 may be provided.

於供給步驟(ST4)中,通過玻璃供給管206而將熔融玻璃供給至成形裝置300。In the supply step (ST4), the molten glass is supplied to the molding apparatus 300 through the glass supply tube 206.

於成形裝置300中,進行成形步驟(ST5)及緩冷卻步驟(ST6)。In the molding apparatus 300, a molding step (ST5) and a slow cooling step (ST6) are performed.

於成形步驟(ST5)中,將熔融玻璃成形為板狀玻璃G,並製作板狀玻璃G之流向。於本實施形態中,使用利用下述之成形體310之溢流下拉法。於緩冷卻步驟(ST6)中,將經成形而流動之板狀玻璃G以不產生內部應變之方式冷卻。In the molding step (ST5), the molten glass is formed into a sheet glass G, and the flow direction of the sheet glass G is produced. In the present embodiment, an overflow down-draw method using the molded body 310 described below is used. In the slow cooling step (ST6), the sheet glass G which has been formed to flow is cooled so as not to generate internal strain.

於切割步驟(ST7)中,於切割裝置400中,將由成形裝置300供給之板狀玻璃G切割為特定之長度,藉此獲得玻璃板。將經切割之玻璃板進而切割為特定之尺寸,而製作目標尺寸之玻璃板。之後,進行玻璃之端面之研削、研磨及玻璃板之清洗,進而,檢查有無氣泡或條紋等缺陷之後,將檢查合格品之玻璃板作為最終產品而進行捆包。In the cutting step (ST7), in the cutting device 400, the sheet glass G supplied from the forming device 300 is cut to a specific length, thereby obtaining a glass plate. The cut glass sheet is further cut into a specific size to produce a glass sheet of a target size. Thereafter, the end surface of the glass is ground, polished, and cleaned with a glass plate. Further, after checking for defects such as bubbles or streaks, the glass plate of the inspected product is packaged as a final product.

(澄清步驟)(clarification step)

圖3係主要表示進行澄清步驟之裝置構成之圖。澄清步驟包括脫泡步驟及吸收步驟。於脫泡步驟中,使熔融玻璃MG升溫至1630℃以上,並使作為澄清劑之SnO2 釋出氧,將該氧吸收至熔融玻璃MG之既存之氣泡B中,使既存之氣泡B之泡徑擴大。藉此,藉由起因於熔融玻璃MG之溫度上 升之氣泡B內氣體成分之內壓上升所導致的泡徑之擴大,與起因於熔融玻璃MG之溫度上升之熔融玻璃MG黏性之降低的協同效果,氣泡B之浮起速度提高,而促進脫泡。Fig. 3 is a view mainly showing the configuration of a device for performing a clarification step. The clarification step includes a defoaming step and an absorbing step. In the defoaming step, the molten glass MG is heated to 1630 ° C or higher, and the SnO 2 as a clarifying agent releases oxygen, and the oxygen is absorbed into the existing bubble B of the molten glass MG to cause the bubble of the existing bubble B. The diameter is enlarged. In this way, the expansion of the bubble diameter caused by the increase in the internal pressure of the gas component in the bubble B due to the increase in the temperature of the molten glass MG is synergistic with the decrease in the viscosity of the molten glass MG due to the increase in the temperature of the molten glass MG. The effect is that the floating speed of the bubble B is increased to promote defoaming.

於吸收處理中,藉由與脫泡處理相反而藉由使熔融玻璃MG之溫度降低,將熔融玻璃MG中之氣泡B內之氧再次吸收至熔融玻璃MG中,與藉由熔融玻璃MG之溫度降低而使氣泡B內之氣體成分之內壓降低之協同效果,使泡徑縮小,並於熔融玻璃MG中使氣泡B消失。In the absorption treatment, by lowering the temperature of the molten glass MG as opposed to the defoaming treatment, the oxygen in the bubble B in the molten glass MG is again absorbed into the molten glass MG, and the temperature by the molten glass MG The synergistic effect of lowering the internal pressure of the gas component in the bubble B is reduced, the bubble diameter is reduced, and the bubble B is eliminated in the molten glass MG.

再者,於脫泡步驟中,以2℃/分鐘以上之升溫速度使熔融玻璃MG之溫度升溫至1630℃以上。所謂2℃/分鐘以上之升溫速度係指熔融玻璃MG之溫度自熔解步驟後之熔融玻璃MG之溫度(例如為1580℃,且為1560~1620℃之範圍)到達澄清溫度(例如1630~1700℃)之範圍中之熔融玻璃MG之平均升溫速度為2℃/分鐘以上。例如,於第1澄清槽204內,於熔融玻璃MG之溫度成為1630℃以上之情形時,所謂升溫速度係表示自熔解槽200之出口至所連接之第1澄清槽204內之熔融玻璃MG之自流入至流出的平均升溫速度。Further, in the defoaming step, the temperature of the molten glass MG is raised to 1630 ° C or higher at a temperature increase rate of 2 ° C / min or more. The temperature increase rate of 2 ° C / min or more means that the temperature of the molten glass MG reaches the clarification temperature (for example, 1630 to 1700 ° C) from the temperature of the molten glass MG (for example, 1580 ° C and in the range of 1560 to 1620 ° C) after the melting step. The average temperature increase rate of the molten glass MG in the range of 2 ° C / min or more. For example, when the temperature of the molten glass MG is 1630 ° C or higher in the first clarification tank 204, the temperature increase rate is expressed from the outlet of the melting tank 200 to the molten glass MG in the connected first clarification tank 204. The average rate of temperature increase from inflow to outflow.

第1澄清槽204、第2澄清槽202及第3澄清槽205係藉由將上述之溫度歷程賦予熔融玻璃MG而進行熔融玻璃MG之脫泡及氣泡B之吸收的裝置。因此,具有可將第1澄清槽204、第2澄清槽202及第3澄清槽205加熱、或冷卻至目標溫度之溫度調節功能。The first clarification tank 204, the second clarification tank 202, and the third clarification tank 205 are means for performing defoaming of the molten glass MG and absorption of the bubbles B by applying the above-described temperature history to the molten glass MG. Therefore, there is a temperature adjustment function capable of heating or cooling the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205 to a target temperature.

第1澄清槽204、第2澄清槽202及第3澄清槽205各自之溫度調整係利用以下任一種方法或該等方法之組合而進行: 對各澄清槽本身進行通電之直接通電加熱,或利用配置於各槽周圍之未圖示之加熱器之澄清槽之間接加熱,進而,利用空冷、水冷之冷卻器之間接冷卻,向各澄清槽之吹氣、水噴霧等。The temperature adjustment of each of the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205 is performed by any one of the following methods or a combination of the methods: Directly energizing and heating the respective clarification tanks themselves, or heating them by clarification tanks of heaters (not shown) disposed around the respective tanks, and further cooling them by air-cooling and water-cooling coolers to each clarification tank Blowing, water spray, etc.

根據圖3,更詳細地說明澄清。According to Figure 3, the clarification is explained in more detail.

將於熔解槽201中熔解、且含有較多藉由玻璃原料之分解反應而生成之氣泡B的液狀之熔解玻璃MG導入至第1澄清槽204中。The liquid molten glass MG which is melted in the melting tank 201 and contains a large number of bubbles B formed by the decomposition reaction of the glass raw material is introduced into the first clarification tank 204.

於第1澄清槽204中,藉由作為第1澄清槽204之本體之鉑或鉑合金管之加熱而將熔融玻璃MG加熱至1630℃以上,藉由促進澄清劑之還原反應,而將多量之氧釋出至熔融玻璃MG中。熔融玻璃MG內之固有之氣泡B藉由起因於熔融玻璃MG之溫度上升之氣泡B內之氣體成分之壓力的上升效果之泡徑之擴大,加之藉由澄清劑之還原反應而釋出之氧擴散並進入氣泡B內,藉由該協同效果而固有之氣泡B之泡徑擴大。此時,以2℃/分鐘以上之升溫速度將熔融玻璃MG加熱至達到1630℃以上之溫度為止。再者,第1澄清槽204比第2澄清槽202管剖面更小,且與第2澄清槽202不同上部開空間不具有氣相環境空間,因此,換言之,於第1澄清槽204中,熔融玻璃MG於第1澄清槽204之內側剖面整體中填充並流動,因此與第2澄清槽202相比可有效率地使熔融玻璃MG之溫度上升。即,於第1澄清槽204內將熔融玻璃MG之溫度升溫至1630℃以上與於第2澄清槽202內將熔融玻璃MG之溫度升溫至1630℃以上相比,可降低第2澄 清槽202之加熱溫度,因此,就抑制構成第2澄清槽202之鉑合金之揮發或熔損之觀點而言較佳。In the first clarification tank 204, the molten glass MG is heated to 1630 ° C or higher by heating of the platinum or platinum alloy tube as the main body of the first clarification tank 204, and a large amount of the clarifying agent is promoted by a reduction reaction. Oxygen is released into the molten glass MG. The bubble B inherent in the molten glass MG is expanded by the bubble diameter of the effect of increasing the pressure of the gas component in the bubble B due to the temperature rise of the molten glass MG, and the oxygen released by the reduction reaction of the clarifying agent The bubble B is diffused and enters the bubble B, and the bubble diameter of the bubble B inherent to the synergistic effect is enlarged. At this time, the molten glass MG is heated to a temperature of 1630 ° C or higher at a temperature increase rate of 2 ° C /min or more. Further, the first clarification tank 204 has a smaller cross section than the second clarification tank 202, and the upper cleavage space does not have a gas phase environment space unlike the second clarification tank 202. Therefore, in other words, the first clarification tank 204 is melted. Since the glass MG is filled and flows through the entire inner cross section of the first clarification tank 204, the temperature of the molten glass MG can be efficiently increased as compared with the second clarification tank 202. In other words, in the first clarification tank 204, the temperature of the molten glass MG is raised to 1630 ° C or higher, and the temperature of the molten glass MG is raised to 1630 ° C or higher in the second clarification tank 202. Since the heating temperature of the cleaning tank 202 is suppressed, it is preferable from the viewpoint of suppressing volatilization or melt loss of the platinum alloy constituting the second clarification tank 202.

繼而,將該熔融玻璃MG導入至第2澄清槽202中。Then, the molten glass MG is introduced into the second clarification tank 202.

第2澄清槽202與第1澄清槽204不同,第2澄清槽202內部之上部開空間為氣相之環境空間,熔融玻璃MG中之氣泡B可浮起至熔融玻璃MG之液面並釋出至熔融玻璃MG之外。The second clarification tank 202 is different from the first clarification tank 204 in that the upper open space inside the second clarification tank 202 is an environmental space in the gas phase, and the bubbles B in the molten glass MG can be floated to the liquid surface of the molten glass MG and released. To the outside of the molten glass MG.

於第2澄清槽202中,藉由作為第2澄清槽202之本體之鉑或鉑合金管之加熱而將熔融玻璃MG持續維持在1630℃以上之高溫,熔融玻璃MG中之氣泡B向第2澄清槽202之上方浮起,於熔融玻璃MG之液表面破泡,藉此熔融玻璃MG得以脫泡。尤其是,若將熔融玻璃MG加熱至1630℃以上(例如變為1630~1700℃),則SnO2 加速產生還原反應。此時,例如於製造液晶顯示器等平板顯示器用玻璃板之情形時,玻璃之黏度由於熔融玻璃MG之溫度之上升變為適合氣泡B之浮起、脫泡之黏度(200~800泊)。In the second clarification tank 202, the molten glass MG is maintained at a high temperature of 1630 ° C or higher by heating of the platinum or platinum alloy tube as the main body of the second clarification tank 202, and the bubble B in the molten glass MG is second. The clarification tank 202 floats upward to break the surface of the molten glass MG, whereby the molten glass MG is defoamed. In particular, when the molten glass MG is heated to 1630 ° C or higher (for example, 1630 to 1700 ° C), the SnO 2 accelerates the reduction reaction. In this case, for example, in the case of producing a glass plate for a flat panel display such as a liquid crystal display, the viscosity of the glass is changed to a viscosity (200 to 800 poise) suitable for floating and defoaming of the bubble B due to an increase in the temperature of the molten glass MG.

此處,於第2澄清槽202之上方之上部開空間破泡並釋出之氣體成分自未圖示之氣體釋出口而釋出至第2澄清槽202外。於第2澄清槽202中,將藉由氣泡B之浮起、脫泡而得以除去浮起速度較快之泡徑較大之氣泡B的熔融玻璃MG導入至第3澄清槽205中。Here, the gas component which is bubbled in the upper portion above the second clarification tank 202 and released is released from the gas discharge port (not shown) to the outside of the second clarification tank 202. In the second clarification tank 202, the molten glass MG in which the bubble B having a large bubble diameter with a high floating speed is removed by the floating and defoaming of the bubble B is introduced into the third clarification tank 205.

於本實施形態中,例如,如圖3所示,於第2澄清槽202至第3澄清槽205中,亦可藉由控制於沿構成本體之鉑或鉑合金管之長度方向延伸之2個不同之區域中分別流動之電流而進行熔融玻璃MG之升溫。又,亦可藉由控制於沿構 成澄清槽之本體之鉑或鉑合金管之長度方向延伸之3個以上之不同區域中分別流動之電流而進行熔融玻璃MG之升溫。In the present embodiment, for example, as shown in FIG. 3, the second clarification tank 202 to the third clarification tank 205 may be controlled by two along the length direction of the platinum or platinum alloy tube constituting the main body. The temperature of the molten glass MG is raised by the current flowing in each of the different regions. By controlling The temperature of the molten glass MG is raised by a current flowing in each of three or more different regions extending in the longitudinal direction of the platinum or platinum alloy tube which is the body of the clarification tank.

如此,熔融玻璃MG之升溫藉由控制於澄清槽之不同之至少2個區域中分別流動之電流而進行,就使脫泡處理有效率地進行之方面而言較佳。As described above, the temperature rise of the molten glass MG is preferably performed by controlling the current flowing in at least two regions different from each other in the clarification tank, and the defoaming treatment is preferably carried out efficiently.

於第3澄清槽205中,藉由作為第3澄清槽205之本體之鉑或鉑合金管之冷卻,或藉由抑制第3澄清槽205之加熱之程度,而冷卻熔融玻璃MG。藉由該冷卻而熔融玻璃MG之溫度降低,因此,不進行氣泡B之浮起、脫泡,殘留之較小之氣泡B內之氣體成分之壓力降低,且泡徑緩慢變小。進而,若熔融玻璃MG之溫度變為1600℃以下,則於脫泡處理中藉由SnO2 之還原反應而獲得之SnO之一部分吸收氧,而將復原為SnO2 。因此,作為氣泡B內之氣體成分之氧被再吸收至熔融玻璃MG中,氣泡B越來越小,被吸收至熔融玻璃MG中而最終消失。此時,熔融玻璃MG於1600℃至1500℃之溫度範圍內以平均2℃/分鐘以上、更佳為平均3℃/分鐘以上之速度冷卻。再者,第3澄清槽205比第2澄清槽202剖面更小,因此,與第2澄清槽202相比可更有效率地使熔融玻璃MG冷卻。即,與於第2澄清槽202內冷卻熔融玻璃MG之溫度相比,於第3澄清槽205內冷卻熔融玻璃MG之溫度可加速降溫速度,就此觀點而言較佳。In the third clarification tank 205, the molten glass MG is cooled by cooling the platinum or platinum alloy tube as the main body of the third clarification tank 205 or by suppressing the heating of the third clarification tank 205. Since the temperature of the molten glass MG is lowered by the cooling, the floating and defoaming of the bubbles B are not performed, and the pressure of the gas component in the small remaining bubbles B is lowered, and the bubble diameter is gradually reduced. Further, when the temperature of the molten glass MG is 1600 ° C or lower, one part of SnO obtained by the reduction reaction of SnO 2 in the defoaming treatment absorbs oxygen, and is restored to SnO 2 . Therefore, oxygen which is a gas component in the bubble B is reabsorbed into the molten glass MG, and the bubble B becomes smaller and smaller, and is absorbed into the molten glass MG and eventually disappears. At this time, the molten glass MG is cooled at a temperature of 1600 ° C to 1500 ° C at an average temperature of 2 ° C / min or more, more preferably 3 ° C / min or more. Further, since the third clarification tank 205 has a smaller cross section than the second clarification tank 202, the molten glass MG can be cooled more efficiently than the second clarification tank 202. In other words, it is preferable that the temperature of the molten glass MG is cooled in the third clarification tank 205 to accelerate the temperature drop rate as compared with the temperature at which the molten glass MG is cooled in the second clarification tank 202.

於圖3所示之例中,進行澄清步驟之澄清槽分為第1澄清槽204、第2澄清槽202、及第3澄清槽205之3個部分,當然 澄清槽亦可進一步細化。細化澄清槽可更細緻地進行熔融玻璃MG之溫度調整。尤其是,細化澄清槽於變更熔融玻璃MG之種類或熔解量之情形時,更容易進行溫度調整之方面而言較有利。In the example shown in FIG. 3, the clarification tank for performing the clarification step is divided into three parts of the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205, of course. The clarification tank can be further refined. The refining and clarifying tank can perform temperature adjustment of the molten glass MG in more detail. In particular, it is advantageous to refine the clarification tank in the case where the type or the amount of melting of the molten glass MG is changed, and it is easier to adjust the temperature.

又,於上述說明中為了簡化,以於第1澄清槽204中使熔融玻璃MG升溫至1630℃,於第2澄清槽202中進行熔融玻璃MG之氣泡B之浮起、脫泡,於第3澄清槽205中熔融玻璃MG藉由熔融玻璃MG之降溫進行氣泡B之吸收之方式將功能分於澄清槽之各者而進行說明,但亦可不將功能完全分於澄清槽之各者。可將至第2澄清槽202之長度方向之中途之部分作為使熔融玻璃MG升溫之構成,亦可將第2澄清槽202之長度方向之中途至第3澄清槽205之間以作為使熔融玻璃MG之降溫開始之部分之方式而構成。In the above description, the molten glass MG is heated to 1630 ° C in the first clarification tank 204, and the bubble B of the molten glass MG is floated and defoamed in the second clarification tank 202. In the clarification tank 205, the molten glass MG is described as being divided into the clarification tank so that the function of the bubble B is absorbed by the cooling of the molten glass MG. However, the function may not be completely divided into the clarification tank. The portion to the middle of the longitudinal direction of the second clarification tank 202 may be configured to increase the temperature of the molten glass MG, or may be used to make the molten glass halfway between the longitudinal direction of the second clarification tank 202 and the third clarification tank 205. The MG's cooling begins with a part of the way.

於本實施形態中,測定第1澄清槽204、第2澄清槽202、第3澄清槽205之表面溫度,即熔融玻璃MG未流動之澄清槽之外側之表面溫度而進行溫度控制,藉此可管理溶融玻璃MG之升溫速度、降溫速度。可藉由電腦模擬,利用供給至澄清槽之熔融玻璃MG之流速及溫度之條件,預先計算出第1澄清槽204、第2澄清槽202及第3澄清槽205之表面溫度與於第1澄清槽204、第2澄清槽202及第3澄清槽205中流動之熔融玻璃MG之平均溫度(澄清槽內具有溫度分佈之熔融玻璃MG之溫度的平均值)之關係。因此,可根據澄清槽之外側之所測定之表面溫度,利用上述關係計算出升溫速度、降溫速度從而管理升溫速度、降溫速度。再者,熔 融玻璃MG之流速可根據各裝置之容積,及流入至成形裝置300之每單位時間之熔融玻璃MG之量而計算出。又,熔融玻璃MG之溫度可根據玻璃之黏性及導熱率計算出。In the present embodiment, the surface temperature of the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205, that is, the surface temperature of the outer side of the clarification tank to which the molten glass MG does not flow is measured, and temperature control is performed. Manage the heating rate and cooling rate of the molten glass MG. The surface temperature of the first clarification tank 204, the second clarification tank 202, and the third clarification tank 205 can be calculated in advance by the computer simulation using the flow rate and temperature conditions of the molten glass MG supplied to the clarification tank. The relationship between the average temperature of the molten glass MG flowing in the groove 204, the second clarification tank 202, and the third clarification tank 205 (the average value of the temperature of the molten glass MG having a temperature distribution in the clarification tank). Therefore, the temperature increase rate and the temperature decrease rate can be calculated from the measured surface temperature on the outer side of the clarification tank, and the temperature increase rate and the temperature decrease rate can be managed. Again, melting The flow rate of the molten glass MG can be calculated from the volume of each device and the amount of molten glass MG per unit time flowing into the forming device 300. Further, the temperature of the molten glass MG can be calculated from the viscosity and thermal conductivity of the glass.

如此,於脫泡處理之後,使熔融玻璃MG之溫度於1600℃至1500℃之溫度範圍內以例如2℃/分鐘以上之降溫速度進行降溫係為了如下所述,使殘留於作為最終產品之玻璃板內之每單位質量之氣泡數降低。此處所謂氣泡係指具有與預先設定之氣泡之體積,例如直徑20 μm之氣泡之體積同等以上之體積的氣泡。After the defoaming treatment, the temperature of the molten glass MG is lowered in a temperature range of 1600 ° C to 1500 ° C at a temperature decreasing rate of, for example, 2 ° C / min or more, so as to remain in the glass as a final product as described below. The number of bubbles per unit mass in the panel is reduced. The term "bubble" as used herein means a bubble having a volume equal to or larger than the volume of a predetermined bubble, for example, a volume of a bubble having a diameter of 20 μm.

再者,上述降溫速度越快越可降低殘留於玻璃板內之氣泡數,但該降低效果隨著上述降溫速度之上升而變小。上述降溫速度較佳為3℃/分鐘以上。再者,上述降溫速度之上限並無特別設定,但於工業上製造玻璃板之情形時,根據以下之理由,50℃/分鐘成為上限。Further, the faster the temperature drop rate is, the lower the number of bubbles remaining in the glass sheet can be reduced, but the reduction effect becomes smaller as the temperature drop rate increases. The above cooling rate is preferably 3 ° C / min or more. Further, the upper limit of the above-described cooling rate is not particularly set. However, in the case of manufacturing a glass plate industrially, the upper limit is 50 ° C / min for the following reasons.

即,若熔融玻璃MG之降溫速度變得過快,則阻礙熔融玻璃MG之氣泡B內之氧被再吸收至熔融玻璃MG之現象,結果,熔融玻璃MG中之氣泡B本身可能不會減少。又,玻璃之導熱率即便於高溫下亦為較小之20~50 W/(m.K)左右,因此,熔融玻璃MG之急遽之冷卻只要不進而採取特別之手段,則只能自第3澄清槽205之外側冷卻,因此,於加快上述降溫速度之情形時,僅第3澄清槽205之外表面附近之熔融玻璃MG冷卻,第3澄清槽205之中心部之熔融玻璃MG維持高溫。即,於第3澄清槽205內,於熔融玻璃MG之外表面部分與中心部之間溫度差變大。於此情形時,產 生自外表面部分之熔融玻璃MG之中析出結晶之問題。又,於第3澄清槽205內,若於熔融玻璃MG之外表面部分與中心部之間熔融玻璃MG之溫度差變大之狀態下攪拌熔融玻璃MG,則溫度差較大之玻璃混合,因此除產生氣泡B以外,於玻璃之組成上變得容易阻礙均質性。又,為了加快熔融玻璃MG之降溫速度,需要增加來自第3澄清槽205之散熱,因此,需要使支持第3澄清槽205之鉑或鉑合金管之本體的支撐磚等支持構件之厚度變薄。然而,僅使支持構件之厚度變薄,設備之強度降低。因此,於工業上製造玻璃板之情形時,一味地加速熔融玻璃MG之降溫速度僅會引起上述之問題,並不妥當。In other words, when the temperature drop rate of the molten glass MG is too fast, the oxygen in the bubble B of the molten glass MG is prevented from being reabsorbed to the molten glass MG, and as a result, the bubble B itself in the molten glass MG may not be reduced. Moreover, the thermal conductivity of the glass is as small as 20 to 50 W/(m.K) even at high temperatures. Therefore, the rapid cooling of the molten glass MG can only be performed from the third place as long as it does not take special measures. When the outer side of the clarification tank 205 is cooled, the molten glass MG near the outer surface of the third clarification tank 205 is cooled, and the molten glass MG at the center of the third clarification tank 205 is maintained at a high temperature. In other words, in the third clarification tank 205, the temperature difference between the outer surface portion and the center portion of the molten glass MG is increased. In this case, production The problem of precipitation of crystals from the molten glass MG of the outer surface portion. In the third clarification tank 205, when the molten glass MG is stirred while the temperature difference between the surface portion and the center portion of the molten glass MG is increased, the glass having a large temperature difference is mixed. In addition to the generation of the bubble B, the composition of the glass tends to hinder the homogeneity. Further, in order to increase the temperature drop rate of the molten glass MG, it is necessary to increase the heat dissipation from the third clarification tank 205. Therefore, it is necessary to make the thickness of the support member such as the support brick supporting the body of the platinum or platinum alloy tube of the third clarification tank 205 thin. . However, only the thickness of the support member is made thin, and the strength of the device is lowered. Therefore, in the case of manufacturing a glass plate industrially, it is not appropriate to accelerate the cooling rate of the molten glass MG only to cause the above problems.

由以上情況可知,熔融玻璃MG之自1600℃至1500℃之降溫速度之上限較佳為50℃/分鐘,更佳為35℃/分鐘。即,於本實施形態中,上述降溫速度較佳為2℃/分鐘~50℃/分鐘,更佳為2.5℃/分鐘~50℃/分鐘,進而較佳為3℃/分鐘~35℃/分鐘。From the above, it is understood that the upper limit of the temperature drop rate of the molten glass MG from 1600 ° C to 1500 ° C is preferably 50 ° C / min, more preferably 35 ° C / min. That is, in the present embodiment, the temperature drop rate is preferably 2 ° C / min to 50 ° C / min, more preferably 2.5 ° C / min to 50 ° C / min, and still more preferably 3 ° C / min ~ 35 ° C / min. .

(成形步驟)(forming step)

圖4係主要表示進行成形步驟及切割步驟之裝置構成之圖。成形裝置300包括成形爐340及徐冷爐350。Fig. 4 is a view mainly showing the configuration of a device for performing a forming step and a cutting step. The forming apparatus 300 includes a forming furnace 340 and a quenching furnace 350.

成形爐340及徐冷爐350係由包含耐火磚等耐火物之未圖示之爐壁圍繞而成。成形爐340相對於徐冷爐350而設置於鉛垂上方。於由成形爐340及徐冷爐350之爐壁圍繞之爐內部空間中,設置有成形體310、環境間隔構件320、冷卻輥330、冷卻單元335、及搬送輥350a~350d。The forming furnace 340 and the quenching furnace 350 are surrounded by a furnace wall (not shown) including a refractory such as refractory brick. The forming furnace 340 is disposed vertically above the quenching furnace 350. The molded body 310, the environmental spacing member 320, the cooling roller 330, the cooling unit 335, and the conveying rollers 350a to 350d are provided in the furnace internal space surrounded by the furnace walls of the forming furnace 340 and the quenching furnace 350.

成形體310使通過圖2所示之玻璃供給管206而自熔解裝置200流入之熔融玻璃MG成形為板狀玻璃G。供給至成形體310時之熔融玻璃成為關於黏度η(泊)成為logη=4.3~5.7之溫度。該熔融玻璃MG之溫度因玻璃之種類而不同,例如若為液晶顯示器用玻璃,則為1200~1300℃。藉此,於成形裝置300內,製作鉛垂下方之板狀玻璃G之流向。於成形體310中,係由耐火磚等構成之細長之構造體,如圖4所示,剖面形成為楔形。於成形體310之上部,設置有作為引導熔融玻璃之流路之供給溝槽312。供給溝槽312於設置於成形裝置300中之供給口中與第3澄清槽205連接,通過第3澄清槽205而流入之熔融玻璃MG沿供給溝槽312流動。以熔融玻璃MG自供給溝槽312溢出之方式構成供給溝槽312。In the molded body 310, the molten glass MG that has flowed in from the melting device 200 through the glass supply pipe 206 shown in FIG. 2 is formed into a sheet glass G. The molten glass supplied to the molded body 310 becomes a temperature at which the viscosity η (poise) becomes log η = 4.3 to 5.7. The temperature of the molten glass MG differs depending on the type of glass, and is, for example, 1200 to 1300 ° C in the case of glass for liquid crystal display. Thereby, the flow direction of the plate glass G under the vertical direction is produced in the molding apparatus 300. In the formed body 310, an elongated structure composed of refractory bricks or the like is formed into a wedge shape as shown in FIG. A supply groove 312 as a flow path for guiding the molten glass is provided on the upper portion of the molded body 310. The supply groove 312 is connected to the third clarification tank 205 in the supply port provided in the molding apparatus 300, and the molten glass MG flowing in through the third clarification tank 205 flows along the supply groove 312. The supply groove 312 is configured such that the molten glass MG overflows from the supply groove 312.

自供給溝槽312溢出之熔融玻璃MG沿成形體310之兩側之側壁之垂直壁面及傾斜壁面流下。流過側壁之熔融玻璃於圖4所示之成形體310之下方端部313合流,而成形1塊板狀玻璃G。The molten glass MG overflowing from the supply groove 312 flows down along the vertical wall surface and the inclined wall surface of the side walls on both sides of the molded body 310. The molten glass flowing through the side walls merges at the lower end portion 313 of the formed body 310 shown in Fig. 4 to form one sheet glass G.

(玻璃組成)(glass composition)

利用本實施形態之玻璃板之製造方法而製造之玻璃板較佳地用於平板顯示器用玻璃基板。例如,具有實質上不含有Li2 O、Na2 O、及K2 O之任一種,或即便含有Li2 O、Na2 O、及K2 O之至少任一種,Li2 O、Na2 O、及K2 O之中所含有之成分之合計量亦為2質量%以下之玻璃組成之情況就有效率地發揮本實施形態之效果之方面而言較佳。關於 玻璃組成較佳地列舉以下所示者。The glass plate produced by the method for producing a glass plate of the present embodiment is preferably used for a glass substrate for a flat panel display. For example, it has substantially no Li 2 O, Na 2 O, and K 2 O, or contains at least one of Li 2 O, Na 2 O, and K 2 O, Li 2 O, Na 2 O. In the case where the total amount of the components contained in the K 2 O is also 2% by mass or less, the effect of the embodiment can be effectively exhibited. The glass composition is preferably exemplified below.

(a)SiO2 :50~70質量%、(b)B2 O3 :5~18質量%、(c)Al2 O3 :10~25質量%、(d)MgO:0~10質量%、(e)CaO:0~20質量%、(f)SrO:0~20質量%、(g)BaO:0~10質量%、(h)RO:5~20質量%(其中R係選自Mg、Ca、Sr及Ba中至少1種,且RO係MgO、CaO、SrO及BaO之中所含有之成分之合計)、(i)R'2 O:超過0.1質量%且為2.0質量%以下(其中R'係選自Li、Na及K中至少1種,且R'2 O係Li2 O、Na2 O及K2 O之中所含有之成分之合計)、(j)將選自SnO2 、Fe2 O3 及氧化鈰等中之至少1種之金屬氧化物合計為0.05~1.5質量%。(a) SiO 2 : 50 to 70% by mass, (b) B 2 O 3 : 5 to 18% by mass, (c) Al 2 O 3 : 10 to 25% by mass, (d) MgO: 0 to 10% by mass (e) CaO: 0 to 20% by mass, (f) SrO: 0 to 20% by mass, (g) BaO: 0 to 10% by mass, (h) RO: 5 to 20% by mass (where R is selected from At least one of Mg, Ca, Sr, and Ba, and a total of components contained in the RO-based MgO, CaO, SrO, and BaO, and (i) R' 2 O: more than 0.1% by mass and not more than 2.0% by mass. (wherein R' is selected from at least one of Li, Na, and K, and R' 2 O is a total of components contained in Li 2 O, Na 2 O, and K 2 O), and (j) is selected from The total amount of the metal oxides of at least one of SnO 2 , Fe 2 O 3 , and cerium oxide is 0.05 to 1.5% by mass.

再者,上述(i)、(j)之組成雖並非必需,但可含有(i)、(j)之組成。於上述之玻璃中,實質上並不含有As2 O3 及PbO,而含有SnO2 。再者,就環境問題之觀點而言,較佳為實質上亦並不含有Sb2 O3Further, the compositions of the above (i) and (j) are not essential, but may have the composition of (i) and (j). In the above glass, substantially no As 2 O 3 and PbO are contained, and SnO 2 is contained. Further, from the viewpoint of environmental problems, it is preferred that substantially no Sb 2 O 3 is contained.

又,(i)之R'2 O之含量亦可為0質量%。Further, the content of R' 2 O of (i) may be 0% by mass.

除上述之成分以外,本實施形態之玻璃板為了調節玻璃之各種之物理性、熔融、澄清、及成形之特性,亦可含有各種之其他之氧化物。作為該種其他之氧化物之例,雖並 不限於以下,但可列舉TiO2 、MnO、ZnO、Nb2 O5 、MoO3 、Ta2 O5 、WO3 、Y2 O3 、及La2 O3In addition to the above components, the glass plate of the present embodiment may contain various other oxides in order to adjust various physical properties, melting, clarification, and molding properties of the glass. Examples of such other oxides are not limited to the following, but examples thereof include TiO 2 , MnO, ZnO, Nb 2 O 5 , MoO 3 , Ta 2 O 5 , WO 3 , Y 2 O 3 , and La 2 . O 3 .

又,於本實施形態中,SnO2 係容易使玻璃失透之成分,因此,為了提高澄清性且不引起失透,其含有率較佳為0.01~0.5質量%,更佳為0.05~0.3質量%,進而較佳為0.1~0.3質量%。Further, in the present embodiment, SnO 2 is a component which tends to devitrify the glass. Therefore, in order to improve the clarity and prevent devitrification, the content is preferably 0.01 to 0.5% by mass, more preferably 0.05 to 0.3% by mass. % is further preferably 0.1 to 0.3% by mass.

Fe2 O3 係提高玻璃之紅外線吸收之成分,且藉由含有Fe2 O3 可促進脫泡。然而,Fe2 O3 係降低玻璃之透過率之成分。因此,若Fe2 O3 之含量過多,則變得不適合於顯示器用玻璃基板。由以上情況可知,於上述金屬氧化物中含有Fe2 O3 之情形時,就提高澄清性且抑制玻璃之透過率的降低之觀點而言,上述Fe2 O3 之含量較佳為0.01~0.1質量%,更佳為0.01~0.08質量%。又,就提高澄清性並以較短時間完成脫泡步驟,且亦抑制吸收步驟中之SO2 泡之產生之觀點而言,較佳為組合0.01~0.5質量%之SnO2 及0.01~0.1質量%之Fe2 O3 而使用。Fe 2 O 3 is a component that enhances infrared absorption of glass, and defoaming is promoted by containing Fe 2 O 3 . However, Fe 2 O 3 is a component that lowers the transmittance of glass. Therefore, when the content of Fe 2 O 3 is too large, it becomes unsuitable for a glass substrate for a display. As seen from the above, the case containing the Fe 2 O 3 in the metal oxide on the improvement of clarification and to suppress decrease in transmittance of the glass viewpoint of the Fe 2 O 3 content of preferably 0.01 to 0.1 The mass % is more preferably 0.01 to 0.08 mass%. Further, in terms of improving the clarification property and completing the defoaming step in a shorter period of time, and also suppressing the generation of the SO 2 bubble in the absorption step, it is preferred to combine 0.01 to 0.5% by mass of SnO 2 and 0.01 to 0.1 mass. % of Fe 2 O 3 is used.

又,上述(i)之R'2 O係有自玻璃溶出而使TFT(Thin Film Transistor,薄膜電晶體)之特性劣化,又,使玻璃之熱膨脹係數增大而於熱處理時破壞基板之虞的成分,因此,於用作液晶顯示器用玻璃基板或有機EL顯示器用玻璃基板之情形時,較佳為實質上並不含有。然而,藉由於玻璃中勉強含有特定量之上述成分,可在不招致TFT之特性劣化的情況下,將玻璃之熱膨脹抑制於一定範圍內,且提高玻璃之鹼性度,使價數變動之金屬的氧化變得容易,而發揮澄 清性。又,R'2 O可降低玻璃之比電阻,並使熔解性提昇。因此,R'2 O較佳為0~2.0質量%,更佳為超過0.1質量%且為1.0質量%以下,進而較佳為0.2~0.5質量%。再者,較佳為不含有Li2 O、Na2 O,而含有於上述成分中最難以自玻璃溶出而使TFT之特性劣化產生之K2 O。K2 O之含有率較佳為0~2.0質量%,更佳為0.1~1.0質量%,進而較佳為0.2~0.5質量%。Further, the R' 2 O of the above (i) is characterized in that the characteristics of the TFT (Thin Film Transistor) are deteriorated by elution from the glass, and the thermal expansion coefficient of the glass is increased to break the substrate during the heat treatment. When it is used as a glass substrate for a liquid crystal display or a glass substrate for an organic EL display, it is preferable that it is not substantially contained. However, since the glass contains a certain amount of the above-mentioned components, the thermal expansion of the glass can be suppressed to a certain range without deteriorating the characteristics of the TFT, and the alkalinity of the glass can be increased, and the metal having a valence change can be obtained. The oxidation becomes easy and clarifies. Further, R' 2 O lowers the specific resistance of the glass and improves the meltability. Therefore, R' 2 O is preferably 0 to 2.0% by mass, more preferably more than 0.1% by mass and 1.0% by mass or less, and still more preferably 0.2 to 0.5% by mass. Further, preferably not contain Li 2 O, Na 2 O, and containing the above components in the most difficult since the dissolution of the glass of the TFT characteristics deterioration arising K 2 O. The content of K 2 O is preferably 0 to 2.0% by mass, more preferably 0.1 to 1.0% by mass, still more preferably 0.2 to 0.5% by mass.

本實施形態之玻璃板為了獲得較好地用作用於液晶顯示器或有機EL顯示器等之玻璃基板之特性,熔融玻璃MG之澄清溫度中之黏度與大量地含有鹼之玻璃板等相比變高,因此,於脫泡處理中氣泡之浮起速度容易變慢。尤其是,於玻璃表面形成低溫多晶矽.TFT之玻璃基板要求應變點較高,因此高溫黏性容易變高,熔融玻璃MG之澄清溫度中之黏度進而變高。因此,例如,於製造應變點為680℃以上,尤其是應變點為690℃以上之玻璃之情形時,於脫泡處理中氣泡之浮起速度容易進而變慢。於本實施形態之玻璃板為構成液晶顯示器或有機EL顯示器等之玻璃基板之情形時,例如1630℃之溫度中之熔融玻璃MG之黏度較佳為130~350泊。又,構成玻璃基板之玻璃之玻璃黏度為logη=2.5時之玻璃溫度若為1550℃~1680℃,則本實施形態變得較佳,若為1570℃~1680℃之範圍則本實施形態之效果變得顯著,若為1590℃~1680℃之範圍則本實施形態之效果變得更顯著。In order to obtain characteristics of a glass substrate which is preferably used for a liquid crystal display or an organic EL display, the glass plate of the present embodiment has a higher viscosity in a clarification temperature of the molten glass MG than a glass plate containing a large amount of alkali, and the like. Therefore, the floating speed of the bubbles in the defoaming treatment tends to be slow. In particular, low temperature polycrystalline germanium is formed on the surface of the glass. Since the glass substrate of the TFT requires a high strain point, the high-temperature viscosity is liable to become high, and the viscosity in the clarification temperature of the molten glass MG is further increased. Therefore, for example, in the case of producing a glass having a strain point of 680 ° C or higher, particularly a glass having a strain point of 690 ° C or higher, the floating speed of the bubbles in the defoaming treatment is likely to be further slowed down. In the case where the glass plate of the present embodiment is a glass substrate such as a liquid crystal display or an organic EL display, for example, the viscosity of the molten glass MG at a temperature of 1630 ° C is preferably 130 to 350 poise. Further, in the case where the glass viscosity of the glass constituting the glass substrate is 1550 ° C to 1680 ° C when the glass temperature is log η = 2.5, the present embodiment is preferable, and the effect of the embodiment is in the range of 1570 ° C to 1680 ° C. It becomes remarkable, and the effect of this embodiment becomes more remarkable in the range of 1590 ° C - 1680 °C.

(熔融玻璃之溫度歷程)(temperature history of molten glass)

圖5係說明本實施形態中之熔解步驟至成形步驟之溫度歷程之一例的圖。Fig. 5 is a view showing an example of the temperature history of the melting step to the forming step in the embodiment.

本實施形態之玻璃板之製造中所使用之玻璃原料,為了成為作為目標之化學組成,對各種之原料進行稱量,較好地混合而製成玻璃原料。此時,將特定量之SnO2 作為澄清劑而添加入玻璃原料中。將如此製作之添加有SnO2 之玻璃原料投入熔解槽201中並至少藉由通電加熱而進行熔解,藉此製作熔融玻璃MG。投入至熔解槽201中之玻璃原料於達到其成分之分解溫度時進行分解,並藉由玻璃化反應而變成熔融玻璃MG。熔融玻璃MG於流過熔解槽201之期間緩慢地提高溫度,且自熔解槽201之底部附近向第1澄清槽204(玻璃供給管204)前進。In order to obtain a target chemical composition, the glass raw materials used in the production of the glass sheet of the present embodiment are weighed and mixed well to form a glass raw material. At this time, a specific amount of SnO 2 was added as a clarifying agent to the glass raw material. The glass raw material to which SnO 2 is added, which has been produced in this manner, is placed in the melting tank 201 and melted by at least electric heating to produce molten glass MG. The glass raw material charged into the melting tank 201 is decomposed when it reaches the decomposition temperature of its components, and becomes molten glass MG by a vitrification reaction. The molten glass MG gradually increases in temperature while flowing through the melting tank 201, and advances toward the first clarification tank 204 (glass supply pipe 204) from the vicinity of the bottom of the melting tank 201.

因此,於熔解槽201中,自投入玻璃原料之時刻之溫度T1至進入第1澄清槽204(玻璃供給管204)之時刻之溫度T3,熔融玻璃MG之溫度具有平緩地上升之溫度歷程。再者,圖5中為T1<T2<T3,但亦可為T2=T3或T2>T3,至少可為T1<T3。Therefore, in the melting tank 201, the temperature of the molten glass MG has a temperature history which rises gently from the temperature T1 at the time of input of the glass raw material to the temperature T3 at the time of entering the first clarification tank 204 (glass supply pipe 204). Furthermore, in FIG. 5, T1 < T2 < T3, but it may be T2 = T3 or T2 > T3, and at least T1 < T3.

藉由於第1澄清槽204之未圖示之金屬製凸緣與第2澄清槽202之未圖示之金屬製凸緣之間流動一定之電流而對第1澄清槽204之鉑或鉑合金管進行通電加熱,進而藉由於第2澄清槽202之未圖示之金屬製凸緣與第2澄清槽202之未圖示之另外之金屬製凸緣之間流動一定之電流而對第2澄清槽202之鉑或鉑合金進行通電加熱,使進入至第1澄清槽204之熔融玻璃MG自溫度T3至SnO2 急遽地釋出氧之溫度 T4(例如為1630℃以上,更佳為1630~1700℃,進而較佳為1650~1700℃)以2℃/分鐘以上之升溫速度升溫。使升溫速度為2℃/分鐘以上係由於如下所述,於升溫速度為2℃/分鐘以上之情形時,O2 氣體之釋出量急遽地變大。再者,溫度T3與溫度T4之差越大,熔融玻璃MG中之SnO2 釋出之O2 之量變多,而促進脫泡。因此,較佳為溫度T4與溫度T3相比高例如50℃左右。Platinum or platinum alloy tube of the first clarification tank 204 by a constant current flowing between a metal flange (not shown) of the first clarification tank 204 and a metal flange (not shown) of the second clarification tank 202 The electric heating is performed, and the second clarifying tank is flowed between the metal flange (not shown) of the second clarification tank 202 and the other metal flange of the second clarification tank 202 (not shown). The platinum or platinum alloy of 202 is electrically heated, and the molten glass MG entering the first clarification tank 204 is rapidly released from the temperature T3 to the SnO 2 by a temperature T4 (for example, 1630 ° C or higher, more preferably 1630 to 1700 ° C). Further, it is preferably 1650 to 1700 ° C) and is heated at a temperature increase rate of 2 ° C /min or more. When the temperature increase rate is 2° C./min or more, as described below, when the temperature increase rate is 2° C./min or more, the amount of O 2 gas released is rapidly increased. Further, the larger the difference between the temperature T3 and the temperature T4, the larger the amount of O 2 released by the SnO 2 in the molten glass MG, and the more the defoaming is promoted. Therefore, it is preferable that the temperature T4 is higher than the temperature T3 by, for example, about 50 °C.

進而,將進入至第2澄清槽202之熔融玻璃MG維持在溫度T4至與溫度T4大致相同之溫度T5。再者,溫度T3~溫度T5中之溫度調節於本實施形態中係利用對各澄清槽進行通電加熱之方式,但並不限定於該方式。例如,亦可利用藉由配置於各澄清槽周圍之未圖示之加熱器之間接加熱而進行上述溫度調節。Further, the molten glass MG entering the second clarification tank 202 is maintained at a temperature T4 to a temperature T5 substantially equal to the temperature T4. Further, the temperature adjustment in the temperature T3 to the temperature T5 is a method in which the respective clarification tanks are electrically heated by the present embodiment, but the method is not limited thereto. For example, the temperature adjustment may be performed by heating between heaters (not shown) disposed around the respective clarification tanks.

此時,藉由將熔融玻璃MG加熱至1630℃以上,而促進作為澄清劑之SnO2 之還原反應。藉此,大量之氧釋出至熔融玻璃MG中。熔融玻璃MG中之固有之氣泡B由於起因於熔融玻璃MG之溫度上升之氣泡B內之氣體成分之壓力的上升效果而導致之泡徑之擴大,加之藉由上述澄清劑之還原反應而釋出之氧擴散並進入至氣泡B內,藉由該協同效果泡徑擴大。At this time, the reduction reaction of SnO 2 as a fining agent is promoted by heating the molten glass MG to 1630 ° C or higher. Thereby, a large amount of oxygen is released into the molten glass MG. The bubble B inherent in the molten glass MG is expanded by the effect of increasing the pressure of the gas component in the bubble B due to the temperature rise of the molten glass MG, and is released by the reduction reaction of the clarifying agent. The oxygen diffuses and enters into the bubble B, and the bubble diameter is enlarged by the synergistic effect.

泡徑擴大後之氣泡B遵循史托克斯定律而氣泡B之浮起速度變快,從而促進氣泡B之浮起、破泡。The bubble B after the bubble diameter is enlarged follows the Stokes law, and the floating speed of the bubble B is increased, thereby promoting the floating and breaking of the bubble B.

於第2澄清槽202中,熔融玻璃MG亦繼續維持於1630℃以上之高溫,因此,熔融玻璃MG中之氣泡B浮起至熔融玻 璃MG之液表面,並於液表面破泡,藉此,進行熔融玻璃MG之脫泡。In the second clarification tank 202, the molten glass MG is also maintained at a high temperature of 1630 ° C or higher, and therefore, the bubbles B in the molten glass MG float to the molten glass. The surface of the liquid of the glass MG is broken on the surface of the liquid, whereby defoaming of the molten glass MG is performed.

脫泡處理於圖5中,於使熔融玻璃MG之溫度自溫度T3上升至溫度T4,之後,維持於與溫度T4大致相同之溫度T5之期間進行。圖5中,T4與T5大致相同,但可為T4<T5,亦可為T4>T5。The defoaming treatment is carried out in FIG. 5, and the temperature of the molten glass MG is raised from the temperature T3 to the temperature T4, and then maintained at a temperature T5 substantially the same as the temperature T4. In Fig. 5, T4 and T5 are substantially the same, but may be T4 < T5 or T4 > T5.

再者,列舉熔融玻璃MG之溫度達到溫度T4係於第1澄清槽204內之例進行了說明,但亦可為第2澄清槽202內。Further, although the example in which the temperature of the molten glass MG reaches the temperature T4 in the first clarification tank 204 has been described, the inside of the second clarification tank 202 may be used.

又,較佳為熔融玻璃MG流過第1澄清槽204時之熔融玻璃之第1最高溫度與流過第2澄清槽202內時之熔融玻璃MG的第2最高溫度相等,或比其更高。藉此,於熔融玻璃自第1澄清槽204向第2澄清槽202移動時,熔融玻璃MG之溫度相當高,且維持在澄清劑產生還原反應之溫度以上,因此,第2澄清槽202不需要用於進而對熔融玻璃進行升溫之加熱。因此,可將第2澄清槽202之加熱溫度抑制地比先前更低。因此,可抑制鉑自包含鉑或鉑合金之第2澄清槽202揮發,且可製造由於鉑之揮發附著於第2澄清槽202內之內壁面之鉑結晶物等雜質混入熔融玻璃MG而產生之缺陷,即起因於上述雜質之缺陷較少之玻璃板。於熔融玻璃MG流過第1澄清槽204之中途,熔融玻璃MG之溫度較佳為達到第1最高溫度。於此情形時,與於第1澄清槽204與第2澄清槽202之連接位置熔融玻璃達到第1最高溫度及第2最高溫度之情形相比,第2澄清槽202之加熱溫度變低,因此,可更容易地抑制鉑自包含鉑或鉑合金之第2澄清槽202揮 發。Moreover, it is preferable that the first maximum temperature of the molten glass when the molten glass MG flows through the first clarification tank 204 is equal to or higher than the second highest temperature of the molten glass MG when flowing through the second clarification tank 202. . Therefore, when the molten glass moves from the first clarification tank 204 to the second clarification tank 202, the temperature of the molten glass MG is relatively high and is maintained at a temperature higher than the temperature at which the clarifying agent generates a reduction reaction. Therefore, the second clarification tank 202 does not need to be used. It is used to further heat the molten glass. Therefore, the heating temperature of the second clarification tank 202 can be suppressed lower than before. Therefore, it is possible to suppress the volatilization of platinum from the second clarification tank 202 containing platinum or a platinum alloy, and it is possible to produce impurities such as platinum crystals adhered to the inner wall surface of the second clarification tank 202 due to the volatilization of platinum, which are mixed into the molten glass MG. A defect, that is, a glass plate resulting from less defects of the above impurities. When the molten glass MG flows through the first clarification tank 204, the temperature of the molten glass MG preferably reaches the first maximum temperature. In this case, the heating temperature of the second clarification tank 202 is lower than the case where the molten glass reaches the first highest temperature and the second highest temperature at the connection position between the first clarification tank 204 and the second clarification tank 202. , it is easier to inhibit the platinum from the second clarification tank 202 containing platinum or platinum alloy hair.

其次,由於自第2澄清槽202進入至第3澄清槽205之熔融玻璃MG吸收殘留之氣泡B,故而自溫度T5,經由溫度T6(例如1600℃)而冷卻至溫度T7(適合攪拌步驟之溫度,且因玻璃硝種及攪拌裝置之類型而不同,例如為1500℃)。Then, since the molten glass MG entering the third clarification tank 205 from the second clarification tank 202 absorbs the remaining bubbles B, it is cooled from the temperature T5 to the temperature T7 via the temperature T6 (for example, 1600 ° C) (the temperature suitable for the stirring step) And depending on the type of glass nitrate and the type of stirring device, for example, 1500 ° C).

藉由熔融玻璃MG之溫度降低,未產生氣泡B之浮起、脫泡,且殘留於熔融玻璃MG中之小泡中之氣體成分之壓力亦下降,泡徑逐漸變小。進而,若熔融玻璃MG之溫度變為1600℃以下,則SnO(藉由SnO2 之還原而獲得者)之一部分吸收氧,而將變回SnO2 。因此,熔融玻璃MG中之殘留之氣泡B內之氧被再吸收至熔融玻璃MG中,小泡進一步變小。熔融玻璃MG吸收該小泡,小泡最終消失。When the temperature of the molten glass MG is lowered, the floating and defoaming of the bubbles B are not generated, and the pressure of the gas component remaining in the small bubbles in the molten glass MG is also lowered, and the bubble diameter is gradually reduced. Further, when the temperature of the molten glass MG is 1600 ° C or lower, oxygen is partially absorbed by one of SnO (which is obtained by reduction of SnO 2 ), and is returned to SnO 2 . Therefore, the oxygen in the remaining bubbles B in the molten glass MG is reabsorbed into the molten glass MG, and the vesicles are further reduced. The molten glass MG absorbs the vesicles, and the vesicles eventually disappear.

藉由該SnO之氧化反應而吸收作為氣泡B內之氣體成分之O2 的處理為吸收處理,於自溫度T5經由溫度T6而降低至溫度T7之期間進行。於圖5中,溫度T5~T6之降溫速度比溫度T6~T7之降溫速度快,但溫度T5~T6之降溫速度亦可比溫度T6~T7降溫速度慢,亦可相等。較佳為至少於該吸收處理期間,熔融玻璃MG之溫度於1600℃至1500℃之溫度範圍內以2℃/分鐘以上之降溫速度降溫。然而,就增大熔融玻璃MG於更高溫狀態時之降溫速度,而較早地抑制下述之SO2 之擴散,使被吸收至氣泡B內之SO2 減少之方面而言,較佳為溫度T5~T6之降溫速度比溫度T6~T7之降溫速度快。即,於吸收處理中,較佳為熔融玻璃MG於 1500℃以下(具體而言,係自1500℃至供給至成形步驟時之熔融玻璃溫度之範圍,例如1500℃~1300℃)之溫度範圍中之降溫速度,比於1600℃至1500℃之溫度範圍中之降溫速度慢。The treatment of absorbing O 2 as a gas component in the bubble B by the oxidation reaction of SnO is an absorption treatment, and is performed while the temperature T5 is lowered to a temperature T7 via the temperature T6. In FIG. 5, the temperature drop rate of the temperature T5~T6 is faster than the temperature T6~T7, but the temperature drop rate of the temperature T5~T6 may be slower than the temperature T6~T7, and may be equal. Preferably, at least during the absorption treatment, the temperature of the molten glass MG is lowered in a temperature range of 1600 ° C to 1500 ° C at a temperature drop rate of 2 ° C / min or more. However, the molten glass MG is increased at a higher temperature of the cooling rate during the state, and the following early suppress the diffusion of SO 2 of the aspect of the terms to be absorbed within the bubble B 2 SO reduction, the temperature is preferably The cooling rate of T5~T6 is faster than the temperature drop of temperature T6~T7. That is, in the absorption treatment, it is preferred that the molten glass MG is in a temperature range of 1500 ° C or lower (specifically, from 1500 ° C to the range of the molten glass temperature supplied to the forming step, for example, 1500 ° C to 1300 ° C). The cooling rate is slower than the temperature drop in the temperature range of 1600 ° C to 1500 ° C.

又,藉由使溫度T6~T7之降溫速度比溫度T5~T6之降溫速度更慢,可使被吸收至氣泡B內之SO2 減少,且使流入至攪拌槽203之熔融玻璃MG之第3澄清槽205(玻璃供給管205)內之外側表面部分與中心部之間的溫度差變小。Further, by making the temperature drop rate of the temperature T6 to T7 slower than the temperature drop rate of the temperature T5 to T6, the SO 2 absorbed into the bubble B can be reduced, and the third portion of the molten glass MG flowing into the stirring tank 203 can be reduced. The temperature difference between the outer side surface portion and the center portion in the clarification tank 205 (glass supply tube 205) becomes small.

再者,就玻璃板之生產性之提昇與設備成本削減之方面而言,於吸收處理中,較佳為熔融玻璃MG於1500℃以下(具體而言,係自1500℃至供給至成形步驟時之熔融玻璃溫度之範圍,例如1500℃~1300℃)之溫度範圍中之降溫速度比1600℃至1500℃之溫度範圍中之降溫速度快。再者,於進行此種熔融玻璃MG之溫度控制之情形時,較佳為設置調整供給至成形步驟之熔融玻璃MG之量的流量調整裝置。Further, in terms of improvement in productivity of the glass sheet and reduction in equipment cost, in the absorption treatment, it is preferred that the molten glass MG is 1500 ° C or lower (specifically, from 1500 ° C to supply to the forming step). The temperature range in the range of the molten glass temperature, for example, 1500 ° C to 1300 ° C, is faster than the temperature drop in the temperature range of 1600 ° C to 1500 ° C. Further, in the case of performing temperature control of the molten glass MG, it is preferable to provide a flow rate adjusting device for adjusting the amount of the molten glass MG supplied to the molding step.

又,就可減少被吸收至氣泡B內之SO2 ,且藉由玻璃供給管206內之熔融玻璃MG之溫度管理而調整供給至成形步驟之熔融玻璃MG之量之方面而言,於吸收處理中,較佳為熔融玻璃MG於1500℃以下之溫度範圍中之降溫速度比1600℃至1500℃之溫度範圍中之降溫速度更慢。藉此,無需將玻璃供給管206加工成特別之形狀,或除玻璃供給管206以外而設置流量調整裝置,而流入至成形步驟之熔融玻璃MG之量變得容易調整。又,可使流入至成形步驟之 熔融玻璃MG之玻璃供給管206內之外側表面部分與中心部之間的溫度差變小。Further, the SO 2 absorbed into the bubble B can be reduced, and the amount of the molten glass MG supplied to the forming step can be adjusted by the temperature management of the molten glass MG in the glass supply pipe 206. Preferably, the temperature drop rate of the molten glass MG in a temperature range of 1500 ° C or lower is slower than the temperature drop rate in a temperature range of 1600 ° C to 1500 ° C. Thereby, it is not necessary to process the glass supply pipe 206 into a special shape, or to provide a flow rate adjustment device other than the glass supply pipe 206, and the amount of the molten glass MG which flows into a shaping|molding process can be adjusted easily. Further, the temperature difference between the outer surface portion and the center portion of the glass supply tube 206 flowing into the molten glass MG of the molding step can be made small.

於上述吸收處理後,或吸收處理之中途,熔融玻璃MG進入至攪拌槽203。攪拌槽203減小熔融玻璃MG中之組成不均而使熔融玻璃MG均質化。再者,於攪拌槽203中,亦可繼續進行上述吸收處理。此後,對熔融玻璃MG進行降溫直至變為適合成形步驟中之成形之溫度T8,例如1200~1300℃為止。After the above-described absorption treatment or during the absorption treatment, the molten glass MG enters the stirring tank 203. The agitation vessel 203 reduces the composition unevenness in the molten glass MG to homogenize the molten glass MG. Further, in the stirring tank 203, the above-described absorption treatment may be continued. Thereafter, the molten glass MG is cooled until it becomes a temperature T8 suitable for molding in the forming step, for example, 1200 to 1300 °C.

如上所述,於澄清步驟與成形步驟之間包括對熔融玻璃MG之成分進行均質地攪拌之攪拌步驟。所謂於澄清步驟與成形步驟之間係指攪拌步驟開始之時序在澄清步驟開始之時序與成形步驟開始之時序之間。熔融玻璃MG之攪拌步驟可於澄清步驟之中途開始,亦可於澄清步驟後開始。再者,於圖1中,澄清步驟(ST2)及均質化步驟(ST3)按開始之時序之早晚之順序表示。於熔解步驟中,以比熔融玻璃MG之熔解開始時之溫度T1更高之溫度T3將熔融玻璃MG供給至澄清步驟。於澄清步驟中,以比溫度T7更低之溫度將熔融玻璃MG供給至攪拌步驟。於攪拌步驟中,以關於黏度η(泊)成為logη=4.3~5.7之溫度將熔融玻璃MG供給至成形步驟。於成形步驟中,於熔融玻璃MG之溫度例如為1200~1300℃之狀態下,使熔融玻璃MG成形為板狀玻璃。再者,玻璃板之液相黏度較佳為logη=4以上,玻璃板之液相溫度較佳為1050℃~1270℃。藉由設為此種液相黏度及液相溫度,可應用溢流下拉法作為成形方法。As described above, a stirring step of uniformly agitating the components of the molten glass MG is included between the clarification step and the forming step. The term between the clarification step and the forming step means that the timing of the start of the stirring step is between the timing at which the clarification step starts and the timing at which the forming step starts. The stirring step of the molten glass MG may be started halfway through the clarification step or after the clarification step. Further, in Fig. 1, the clarification step (ST2) and the homogenization step (ST3) are expressed in the order of the start timing. In the melting step, the molten glass MG is supplied to the clarification step at a temperature T3 higher than the temperature T1 at the start of melting of the molten glass MG. In the clarification step, the molten glass MG is supplied to the stirring step at a temperature lower than the temperature T7. In the stirring step, the molten glass MG is supplied to the forming step at a temperature at which the viscosity η (poise) becomes log η = 4.3 to 5.7. In the molding step, the molten glass MG is formed into a sheet glass in a state where the temperature of the molten glass MG is, for example, 1200 to 1300 °C. Further, the liquid phase viscosity of the glass plate is preferably log η = 4 or more, and the liquidus temperature of the glass plate is preferably 1050 ° C to 1270 ° C. By setting such a liquid phase viscosity and a liquidus temperature, an overflow down-draw method can be applied as a forming method.

圖6係於實驗爐中進行之測定結果,且係表示進行脫泡處理時之包含於熔融玻璃中之O2 之排出量與升溫速度之關係的圖。升溫速度係自1550℃至1640℃之溫度範圍中之平均速度。用於該測定之玻璃板具有與鹼金屬之含量較少之液晶用顯示器用玻璃基板相同之玻璃組成,且使用SnO2 作為澄清劑。具體而言,使用具有以下所示之玻璃組成之液晶用顯示器用玻璃基板,獲得了圖6所示之測定結果。Fig. 6 is a graph showing the relationship between the amount of emission of O 2 contained in the molten glass and the temperature increase rate when the defoaming treatment is performed. The rate of temperature rise is the average speed in the temperature range from 1550 ° C to 1640 ° C. The glass plate used for the measurement has the same glass composition as the glass substrate for liquid crystal display having a small content of alkali metal, and uses SnO 2 as a clarifying agent. Specifically, the measurement results shown in FIG. 6 were obtained by using a glass substrate for a liquid crystal display having the glass composition shown below.

SiO2 :60質量%SiO 2 : 60% by mass

Al2 O3 :19.5質量%Al 2 O 3 : 19.5% by mass

B2 O3 :10質量%B 2 O 3 : 10% by mass

CaO:5.3質量%CaO: 5.3% by mass

SrO:5質量%SrO: 5 mass%

SnO2 :0.2質量%SnO 2 : 0.2% by mass

根據圖6可知,為了提高O2 之排出量,可使熔融玻璃MG之升溫速度為2℃/分鐘以上。再者,於圖6之測定結果中,CO2 係藉由於形成有空腔之玻璃基板上積層其他之玻璃基板而密封空腔內之氣體(CO2 ),於此狀態下加熱各玻璃基板並使其融合,藉此而使其於熔融玻璃MG內作為氣泡而存在。As can be seen from Fig. 6, in order to increase the discharge amount of O 2 , the temperature increase rate of the molten glass MG can be 2 ° C / min or more. Further, in the measurement result of FIG. 6, the CO 2 seals the gas (CO 2 ) in the cavity by laminating another glass substrate on the glass substrate on which the cavity is formed, and heats each of the glass substrates in this state. This is fused, whereby it exists as a bubble in the molten glass MG.

於本實施形態中,並無升溫速度之實質之上限,例如,可為10℃/分鐘以下。由於玻璃導熱率較小,因此為了使升溫速度上升,需要增加熱傳遞面積。為了增加熱傳遞面積,可列舉減小作為金屬管之第1澄清槽204或第2澄清槽202等之內徑,進而於長度方向較長地形成第1澄清槽204 或第2澄清槽202等。又,為了增加熱傳遞面積,亦可列舉使第1澄清槽204或第2澄清槽202等溫度上升至顯著地高於熔融玻璃MG之溫度的溫度。然而,若減小第1澄清槽204或第2澄清槽202等之內徑,進而於長度方向較長地形成第1澄清槽204或第2澄清槽202等,則導致玻璃板製造裝置大型化,並不佳。又,若使第1澄清槽204或第2澄清槽202等之溫度上升至顯著地高於熔融玻璃MG之溫度的溫度,則有由於高溫而玻璃板製造裝置破損之虞。因此,升溫速度之實質上之上限較佳為10℃/分鐘以下。由以上情況可知,升溫速度較佳為2℃/分鐘~10℃/分鐘,更佳為3℃/分鐘~8℃/分鐘,進而較佳為3℃~6.5℃/分鐘。於此範圍內,可有效率地進行脫泡處理,並有效率地降低殘留於玻璃板之氣泡。In the present embodiment, there is no substantial upper limit of the temperature increase rate, and for example, it may be 10 ° C / min or less. Since the thermal conductivity of the glass is small, in order to increase the temperature increase rate, it is necessary to increase the heat transfer area. In order to increase the heat transfer area, the inner diameter of the first clarification tank 204 or the second clarification tank 202 as a metal pipe is reduced, and the first clarification tank 204 is formed long in the longitudinal direction. Or the second clarification tank 202 or the like. Moreover, in order to increase the heat transfer area, the temperature of the first clarification tank 204 or the second clarification tank 202 may be raised to a temperature significantly higher than the temperature of the molten glass MG. However, when the inner diameter of the first clarification tank 204 or the second clarification tank 202 is reduced, and the first clarification tank 204 or the second clarification tank 202 is formed in the longitudinal direction, the glass plate manufacturing apparatus is enlarged. Not good. When the temperature of the first clarification tank 204 or the second clarification tank 202 is raised to a temperature which is significantly higher than the temperature of the molten glass MG, the glass sheet manufacturing apparatus is damaged due to high temperature. Therefore, the upper limit of the substantial temperature rise rate is preferably 10 ° C / min or less. From the above, it is understood that the temperature increase rate is preferably from 2 ° C / min to 10 ° C / min, more preferably from 3 ° C / min to 8 ° C / min, and still more preferably from 3 ° C to 6.5 ° C / min. Within this range, the defoaming treatment can be efficiently performed, and the bubbles remaining in the glass plate can be efficiently reduced.

又,如上所述,於脫泡處理後進行之氣泡之吸收處理中,熔融玻璃MG於1600℃至1500℃之溫度範圍內以2℃/分鐘以上之降溫速度降溫。其藉由以下說明之理由而進行。Further, as described above, in the bubble absorption treatment performed after the defoaming treatment, the molten glass MG is cooled at a temperature decreasing rate of 2 ° C / min or more in a temperature range of 1600 ° C to 1500 ° C. This is done for the reasons described below.

於使熔融玻璃MG自溫度T3升溫至溫度T4並至於溫度T5之期間,SnO2 釋出氧且熔融玻璃MG升溫至作為還原之溫度之1600~1630℃以上,因此除促進熔融玻璃MG內之氣泡吸收SnO2 釋出之氧以外,且促進變為高溫而溶存於熔融玻璃MG內之O2 、CO2 、SO2 之擴散,溶存於熔融玻璃MG內之O2 、CO2 、SO2 亦被上述氣泡B吸收。再者,向熔融玻璃MG中之氣體成分之熔解度根據玻璃成分而變化,但於為 SO2 之情形時,於鹼金屬之含量較多之玻璃中熔解度較高,但於不含有鹼金屬,或即便含有亦為少量之如本實施形態之液晶顯示器用玻璃基板所使用之玻璃板中可熔解於熔融玻璃MG中之熔解度較低。於液晶顯示器用玻璃基板所使用之玻璃板中,本來,作為玻璃原料不會人為地添加S(硫磺)成分,但作為原料中之雜質,或於熔解槽201中所使用之燃燒氣體(天然氣、都市氣體、丙烷氣體等)中作為雜質而微量地含有。因此,作為該等之雜質而含有之S成分經氧化而成為SO2 ,擴散並進入至包含於熔融玻璃MG中之氣泡B內。由於SO2 難以被再吸收故而作為氣泡B而殘留。該現象與先前之將As2 O3 用作澄清劑時相比,非常顯著地出現。When the molten glass MG is heated from the temperature T3 to the temperature T4 and the temperature T5, the SnO 2 releases oxygen and the molten glass MG is heated to a temperature of 1600 to 1630 ° C or more as the reduction temperature, so that bubbles in the molten glass MG are promoted. other than the release of absorbed oxygen SnO 2, and promote a high temperature becomes dissolved in the molten glass within the O MG 2, CO 2, SO 2 diffusion of the dissolved O in the molten glass within the MG 2, CO 2, SO 2 was also The above bubble B is absorbed. Further, the degree of melting of the gas component in the molten glass MG varies depending on the glass component. However, in the case of SO 2 , the degree of melting in the glass having a large content of the alkali metal is high, but the alkali metal is not contained. Even if it contains a glass plate used for the glass substrate for liquid crystal displays of this embodiment, it is melt|dissolved in the molten glass MG, and the melting degree is low. In the glass plate used for the glass substrate for liquid crystal display, the S (sulfur) component is not artificially added as a glass raw material, but the impurity in the raw material or the combustion gas used in the melting tank 201 (natural gas, In a city gas, a propane gas, or the like, it is contained in a trace amount as an impurity. Therefore, the S component contained as the impurities is oxidized to become SO 2 and diffused into the bubbles B contained in the molten glass MG. Since SO 2 is hard to be reabsorbed, it remains as bubbles B. This phenomenon occurs very significantly compared to the previous use of As 2 O 3 as a fining agent.

於將SnO2 用作澄清劑之玻璃組成之情形時,熔融玻璃MG之高溫中之保持時間越變長,越促進SO2 向熔融玻璃MG內之固有之氣泡B內擴散。可認為其原因在於變為高溫而SO2 之熔融玻璃MG中之擴散速度加快,變得容易進入至氣泡B內。In the case where SnO 2 is used as the glass composition of the clarifying agent, the holding time in the high temperature of the molten glass MG becomes longer, and the SO 2 is promoted to diffuse into the bubble B inherent in the molten glass MG. This is considered to be because the diffusion rate in the molten glass MG of SO 2 is increased at a high temperature, and it is easy to enter the bubble B.

再者,若熔融玻璃MG之溫度保持於1630℃以上之高溫之時間較長,則導致熔融玻璃MG被過度還原,於進行熔融玻璃MG之降溫時,下述SO2 之氣泡變得容易產生。另一方面,若保持於1630℃以上之時間過短則脫泡步驟中之脫泡變得不充分。因此,將熔融玻璃MG之溫度保持於1630℃以上之時間較佳為15分鐘~90分鐘,更佳為30分鐘~60分鐘。In addition, when the temperature of the molten glass MG is maintained at a high temperature of 1630 ° C or higher for a long period of time, the molten glass MG is excessively reduced, and when the molten glass MG is cooled, the following SO 2 bubbles are likely to be generated. On the other hand, if the time kept at 1630 ° C or more is too short, defoaming in the defoaming step becomes insufficient. Therefore, the time for maintaining the temperature of the molten glass MG at 1630 ° C or higher is preferably 15 minutes to 90 minutes, more preferably 30 minutes to 60 minutes.

此後,於溫度T5至溫度T7進行熔融玻璃MG之降溫時,藉由SnO2 之還原而獲得之SnO藉由氧化反應吸收O2 而氧化。因此,存在於殘留於熔融玻璃MG內之氣泡B中之O2 由SnO吸收。然而,熔融玻璃MG中之SO2 或CO2 之向固有之氣泡B內之擴散依然維持。因此,溫度T5至溫度T7之期間中之氣泡B內之氣體成分與溫度T3至溫度T5之期間中相比SO2 、CO2 之濃度較高。尤其是,於本實施形態所使用之熔融玻璃MG中,係鹼金屬之含量較少之組成,因此,SO2 之熔融玻璃MG中之熔解度較小。因此,若SO2 作為氣體一旦被氣泡B吸收,則該SO2 於吸收處理中難以被吸收至熔融玻璃MG內。Thereafter, when the temperature T5 to T7 to cool to a temperature of the molten glass MG, SnO 2 by reduction of SnO is obtained by the oxidation reaction of O 2 and oxygen absorption. Therefore, O 2 present in the bubble B remaining in the molten glass MG is absorbed by SnO. However, the diffusion into the inherent bubble B of SO 2 or CO 2 in the molten glass MG is maintained. Therefore, the concentration of SO 2 and CO 2 in the gas component in the bubble B during the period from the temperature T5 to the temperature T7 is higher than the concentration of the SO 2 and CO 2 in the period from the temperature T3 to the temperature T5. In particular, in the molten glass MG used in the present embodiment, since the composition of the alkali metal is small, the degree of melting in the molten glass MG of SO 2 is small. Therefore, when SO 2 is absorbed as a gas by the bubble B, the SO 2 is hardly absorbed into the molten glass MG in the absorption process.

以上,於溫度T5至溫度T7之期間,氣泡B內之O2 藉由SnO之氧化反應而被SnO吸收,但SO2 、CO2 之向固有之氣泡B內之擴散依然維持,因此,藉由使該期間成為短期間,可減少SO2 、CO2 之向固有之氣泡B內之擴散,且可抑制氣泡B之生長。因此,於溫度T5至溫度T7之吸收處理之期間中,熔融玻璃MG於1600℃至1500℃之溫度範圍內以2℃/分鐘以上之降溫速度降溫,藉此,可如下所述抑制玻璃板中之氣泡數。As described above, during the period from the temperature T5 to the temperature T7, the O 2 in the bubble B is absorbed by the SnO by the oxidation reaction of SnO, but the diffusion into the inherent bubble B of SO 2 and CO 2 is maintained. When this period is short, the diffusion into the bubble B inherent to the SO 2 and CO 2 can be reduced, and the growth of the bubble B can be suppressed. Therefore, during the absorption process from the temperature T5 to the temperature T7, the molten glass MG is cooled at a temperature drop rate of 2 ° C/min or more in a temperature range of 1600 ° C to 1500 ° C, whereby the glass plate can be suppressed as described below. The number of bubbles.

圖7係表示再現玻璃中之氣泡B後之孔內所含有之SO2 之含量的測定結果之圖,且表示相對於玻璃之溫度條件及溫度維持時間之SO2 之含量的依存性。圖7中之黑圓點之大小表示氣泡B之大小,且表示SO2 之含量。Fig. 7 is a graph showing the measurement results of the content of SO 2 contained in the pores after the bubble B in the glass is reproduced, and shows the dependence on the content of SO 2 with respect to the temperature condition of the glass and the temperature maintenance time. The size of the black dot in Fig. 7 indicates the size of the bubble B and indicates the content of SO 2 .

玻璃板具有與鹼金屬之含量較少之上述之液晶用顯示器 用玻璃基板相同之玻璃組成,且含有SnO2 作為澄清劑。具體而言,使用具有與於獲得圖6之測定結果時所製作之玻璃板相同之玻璃組成的液晶顯示器用玻璃基板。The glass plate has the same glass composition as the above-described glass substrate for liquid crystal display having a small content of alkali metal, and contains SnO 2 as a clarifying agent. Specifically, a glass substrate for a liquid crystal display having the same glass composition as that of the glass plate produced when the measurement results of FIG. 6 were obtained was used.

於將該玻璃組成之熔融玻璃成形為板狀之玻璃板中人工地開孔,並於開孔後之玻璃板之兩側於氧環境中夾持同種之玻璃組成之玻璃板,藉此使填充有O2 之孔作為氣泡而再現。對1200℃以上之溫度及溫度維持時間進行各種變化而對具有該孔之玻璃板進行熱處理,並藉由氣體分析而測定孔內之SO2 之含量。由於將玻璃板加熱至1200℃以上,故而玻璃板變為熔融狀態,可再現殘留於熔融玻璃內之氣泡B。Forming the glass into a plate-shaped glass plate by artificially opening the glass, and clamping the glass plate of the same kind of glass in an oxygen environment on both sides of the glass plate after the opening, thereby filling A hole having O 2 is reproduced as a bubble. The glass plate having the pores was heat-treated at various temperatures and temperature maintenance times of 1200 ° C or higher, and the content of SO 2 in the pores was measured by gas analysis. Since the glass plate is heated to 1200 ° C or higher, the glass plate is in a molten state, and the bubbles B remaining in the molten glass can be reproduced.

根據圖7可知於大致1500℃以上之溫度下於填充有O2 之孔中含有SO2 。尤其是,越為高溫,進而溫度維持時間越長,SO2 之含量越增加。其表示溶存於成為熔融狀態之玻璃內之SO2 之擴散藉由高溫而得以促進,並被吸收至孔內。According to Fig. 7, it is understood that SO 2 is contained in the pores filled with O 2 at a temperature of approximately 1500 ° C or higher. In particular, the higher the temperature, and the longer the temperature maintenance time, the more the content of SO 2 increases. It means that the diffusion of SO 2 dissolved in the glass in a molten state is promoted by high temperature and absorbed into the pores.

因此,熔融玻璃MG於脫泡處理後之吸收處理中,較佳為迅速降溫至未達1500℃,於本實施形態中,較佳為熔融玻璃MG於1600℃至1500℃之溫度範圍內以2℃/分鐘以上之降溫速度降溫。Therefore, in the absorption treatment of the molten glass MG after the defoaming treatment, it is preferred to rapidly cool down to less than 1500 ° C. In the present embodiment, it is preferred that the molten glass MG is in the temperature range of 1600 ° C to 1500 ° C to 2 Cooling down at a temperature above °C/min.

圖8係表示如下測定結果之圖,該測定結果表示於模擬圖5所示之熔融玻璃MG之溫度歷程之實驗爐中製作玻璃板時之產生之氣泡級別與降溫速度之關係。降溫速度係1600℃至1500℃之溫度範圍中之平均速度。所製作之玻璃 板具有與鹼金屬之含量較少之液晶用顯示器用玻璃基板相同之玻璃組成,且使用SnO2 作為澄清劑。具體而言,使用具有與於獲得圖6之測定結果時所製作之玻璃板相同之玻璃組成的液晶顯示器用玻璃基板。Fig. 8 is a graph showing the results of measurement of the relationship between the bubble level and the temperature drop rate when the glass plate was produced in the experimental furnace simulating the temperature history of the molten glass MG shown in Fig. 5. The cooling rate is an average speed in a temperature range of 1600 ° C to 1500 ° C. The glass plate produced had the same glass composition as the glass substrate for liquid crystal display having a small content of alkali metal, and SnO 2 was used as a clarifying agent. Specifically, a glass substrate for a liquid crystal display having the same glass composition as that of the glass plate produced when the measurement results of FIG. 6 were obtained was used.

可知若降溫速度為未達2℃/分鐘,則氣泡級別急遽地上升。再者,所謂氣泡級別係表示將降溫速度設為10℃/分鐘時之每單位玻璃質量之氣泡數為標準,氣泡數變差至何種程度。例如,氣泡級別3表示相對於將降溫速度設為10℃/分鐘時之氣泡數3倍之氣泡數。因此,可知若降溫速度為未達2℃/分鐘,則氣泡數急遽地上升。It can be seen that if the cooling rate is less than 2 ° C / min, the bubble level rises sharply. In addition, the bubble level means that the number of bubbles per unit glass mass when the temperature drop rate is 10 ° C /min is a standard, and the number of bubbles is deteriorated to what extent. For example, the bubble level 3 indicates the number of bubbles three times the number of bubbles when the temperature drop rate is set to 10 ° C / minute. Therefore, it can be seen that if the temperature drop rate is less than 2 ° C / min, the number of bubbles rises sharply.

根據圖8,為了降低氣泡數,較佳為使降溫速度為2℃/分鐘以上。According to Fig. 8, in order to reduce the number of bubbles, it is preferable to set the temperature drop rate to 2 ° C / min or more.

(實施例1)(Example 1)

圖9係表示如下測定結果之圖,該測定結果表示於利用圖2所示之製造玻璃板之裝置製造玻璃板時之存在於玻璃板內之氣泡數與降溫速度之關係。於經過熔解步驟、澄清步驟、攪拌步驟之後,藉由溢流下拉法而製造玻璃板。此時,熔融玻璃MG之溫度歷程除降溫速度以外採用圖5所示之歷程。所謂降溫速度係1600℃至1500℃之溫度範圍中之平均速度。所製作之玻璃板具有與鹼金屬之含量較少之液晶用顯示器用玻璃基板相同之玻璃組成,且使用SnO2 作為澄清劑。具體而言,使用具有與於獲得圖6之測定結果時所製作之玻璃板相同之玻璃組成的液晶顯示器用玻璃基板。圖9所示之氣泡級別表示以將降溫速度設為8.4℃/分鐘 時之每單位質量之氣泡數為標準,氣泡數變差至何種程度。例如氣泡級別5表示相對於將降溫速度設為8.4℃/分鐘時之氣泡數含有5倍之氣泡數。降溫速度為7.9℃/分鐘之氣泡級別為1.1,降溫速度為4.9℃/分鐘之氣泡級別為1.6,降溫速度為4.2℃/分鐘之氣泡級別為1.8,降溫速度為3.0℃/分鐘之氣泡級別為1.8。另一方面,降溫速度為1.8℃/分鐘之氣泡級別為3.0,降溫速度為0.5℃/分鐘之氣泡級別為83,相對於將降溫速度設為8.4℃/分鐘時之氣泡數含有3倍以上之氣泡。Fig. 9 is a view showing the results of measurement of the relationship between the number of bubbles existing in the glass plate and the temperature drop rate when the glass plate is produced by the apparatus for producing a glass plate shown in Fig. 2 . After the melting step, the clarification step, and the stirring step, the glass plate is produced by an overflow down-draw method. At this time, the temperature history of the molten glass MG adopts the history shown in FIG. 5 in addition to the temperature drop rate. The so-called cooling rate is an average speed in a temperature range of 1600 ° C to 1500 ° C. The glass plate produced had the same glass composition as the glass substrate for liquid crystal display having a small content of alkali metal, and SnO 2 was used as a clarifying agent. Specifically, a glass substrate for a liquid crystal display having the same glass composition as that of the glass plate produced when the measurement results of FIG. 6 were obtained was used. The bubble level shown in Fig. 9 indicates how much the number of bubbles is deteriorated by the number of bubbles per unit mass when the temperature drop rate is set to 8.4 ° C / minute. For example, the bubble level 5 indicates the number of bubbles which are five times as large as the number of bubbles when the temperature drop rate is 8.4 ° C /min. The bubble level of the cooling rate of 7.9 ° C / min is 1.1, the bubble level of the cooling rate of 4.9 ° C / min is 1.6, the bubble level of the cooling rate of 4.2 ° C / min is 1.8, and the bubble level of the cooling rate of 3.0 ° C / min is 1.8. On the other hand, the bubble level of the cooling rate of 1.8 ° C / min is 3.0, the bubble level of the cooling rate of 0.5 ° C / min is 83, and the number of bubbles when the cooling rate is set to 8.4 ° C / min is more than 3 times. bubble.

根據圖9可知若降溫速度為未達2℃/分鐘,則氣泡級別急遽地上升,因此氣泡數急遽地上升。因此可知,若使熔融玻璃MG於1600℃至1500℃之溫度範圍內以2℃/分鐘以上,更佳為2.5℃/分鐘以上之降溫速度降溫,則氣泡數降低。根據圖9可知,例如於降溫速度為3℃/分鐘~8℃/分鐘中就降低氣泡數之方面而言更有效。再者,於具有SiO2 :60質量%、Al2 O3 :19.5質量%、B2 O3 :10質量%、CaO:5.3質量%、SrO:5質量%、SnO2 :0.15質量%、Fe2 O3 :0.05質量%之玻璃板中氣泡數雖然整體地少量減少,但獲得了大致相同之結果。又,於具有SiO2 :61質量%、Al2 O3 :19.5質量%、B2 O3 :10質量%、CaO:9質量%、SnO2 :0.3質量%、R2 O(R係Li、Na、K之中之玻璃板中所含有之總成分):0.2質量%之玻璃板(應變點700℃)之製造中,亦獲得了與上述相同之結果。As can be seen from Fig. 9, when the temperature drop rate is less than 2 ° C / min, the bubble level rises sharply, so the number of bubbles rises sharply. Therefore, when the molten glass MG is cooled in a temperature range of 1600 ° C to 1500 ° C at a temperature drop rate of 2 ° C / min or more, more preferably 2.5 ° C / min or more, the number of bubbles is lowered. As can be seen from Fig. 9, for example, it is more effective in reducing the number of bubbles in the cooling rate of 3 ° C / min to 8 ° C / min. Further, it has SiO 2 : 60% by mass, Al 2 O 3 : 19.5% by mass, B 2 O 3 : 10% by mass, CaO: 5.3% by mass, SrO: 5% by mass, SnO 2 : 0.15% by mass, Fe The number of bubbles in the glass plate of 2 O 3 : 0.05% by mass was substantially reduced by a small amount, but substantially the same result was obtained. Further, it has SiO 2 : 61% by mass, Al 2 O 3 : 19.5% by mass, B 2 O 3 : 10% by mass, CaO: 9% by mass, SnO 2 : 0.3% by mass, and R 2 O (R-based Li, In the production of a 0.2% by mass glass plate (strain point: 700 ° C), the same results as described above were also obtained in the case of the total composition contained in the glass plate among Na and K.

(實施例2)(Example 2)

圖10係表示存在於玻璃板內之氣泡數與升溫速度之關係的圖。所製作之玻璃板具有與鹼金屬之含量較少之液晶用顯示器用玻璃基板相同之玻璃組成,且使用SnO2 作為澄清劑。具體而言,使用具有與於獲得圖6之測定結果時所製作之玻璃板相同之玻璃組成之液晶顯示器用玻璃基板。將以成為上述玻璃組成之方式而經調和之玻璃原料於1580℃(=T3)下熔融之後,升溫至1640℃(=T4)。於1640℃下保持一定時間之後,以10℃/分鐘之速度降溫至1600℃(=T6),進而,以5℃/分鐘之速度降溫至1500℃(=T5)。此時,將升溫速度變為0.5℃/分鐘、1℃/分鐘、1.5℃/分鐘、2℃/分鐘、3℃/分鐘、4℃/分鐘、5℃/分鐘、6℃/分鐘,並觀察氣泡數之變化。圖10中所示之氣泡級別表示以使升溫速度為2℃/分鐘時之每單位質量之氣泡數為標準,氣泡數變差至何種程度。例如氣泡級別5表示相對於將升溫速度設為2℃/分鐘時之氣泡數含有5倍之氣泡數。升溫速度為2℃/分鐘之氣泡級別為1,升溫速度為3℃/分鐘之氣泡級別為0.8,升溫速度為4℃/分鐘之氣泡級別為0.7,升溫速度為5℃/分鐘之氣泡級別泡為0.7,升溫速度為6℃/分鐘之氣泡級別為0.6。另一方面,升溫速度為0.5℃/分鐘之氣泡級別為4.8,升溫速度為1℃/分鐘之氣泡級別為2.3,升溫速度為1.5℃/分鐘之氣泡級別為1.6,相對於使升溫速度為2℃/分鐘時之氣泡數含有1.5倍以上之氣泡。Fig. 10 is a graph showing the relationship between the number of bubbles existing in the glass plate and the temperature increase rate. The glass plate produced had the same glass composition as the glass substrate for liquid crystal display having a small content of alkali metal, and SnO 2 was used as a clarifying agent. Specifically, a glass substrate for a liquid crystal display having the same glass composition as that of the glass plate produced when the measurement results of FIG. 6 were obtained was used. The glass raw material which was blended so as to have the above-described glass composition was melted at 1,580 ° C (= T3), and then heated to 1,640 ° C (= T4). After maintaining at 1640 ° C for a certain period of time, the temperature was lowered to 1600 ° C (= T6) at a rate of 10 ° C / min, and further, the temperature was lowered to 1500 ° C (= T5) at a rate of 5 ° C / min. At this time, the temperature increase rate was changed to 0.5 ° C / min, 1 ° C / min, 1.5 ° C / min, 2 ° C / min, 3 ° C / min, 4 ° C / min, 5 ° C / min, 6 ° C / min, and observed The number of bubbles changes. The bubble level shown in Fig. 10 indicates how much the number of bubbles is deteriorated by the number of bubbles per unit mass at a temperature increase rate of 2 ° C / minute. For example, the bubble level 5 indicates the number of bubbles which are five times the number of bubbles when the temperature increase rate is 2 ° C / minute. The bubble level of the temperature increase rate of 2 ° C / min is 1, the bubble rate of the temperature increase rate of 3 ° C / min is 0.8, the bubble rate of the temperature increase rate of 4 ° C / min is 0.7, and the bubble rate bubble of the temperature increase rate of 5 ° C / min. At 0.7, the bubble level at a rate of 6 ° C/min was 0.6. On the other hand, the bubble level of the temperature increase rate of 0.5 ° C / min was 4.8, the bubble rate of the temperature increase rate of 1 ° C / min was 2.3, the bubble rate of the temperature increase rate of 1.5 ° C / min was 1.6, and the temperature increase rate was 2 The number of bubbles at ° C/min contains 1.5 times or more of bubbles.

根據圖10可知,若升溫速度為未達2℃/分鐘,則氣泡級 別急遽地上升,且氣泡數急遽地上升。因此可知,於熔解步驟之後,若以2℃/分鐘以上,更佳為2.5℃/分鐘以上之升溫速度使熔融玻璃MG升溫至1630℃以上,則氣泡數降低。因此可說較佳為2℃/分鐘~10℃/分鐘,更佳為3℃/分鐘~8℃/分鐘,進而較佳為3℃~6.5℃/分鐘。又,根據圖10可知,例如於升溫速度為3℃/分鐘~8℃/分鐘、3℃/分鐘~6℃/分鐘、4℃/分鐘~6℃/分鐘或4℃/分鐘~10℃/分鐘時就降低氣泡數之方面而言較有效。再者,於具有SiO2 :60質量%、Al2 O3 :19.5質量%、B2 O3 :10質量%、CaO:5.3質量%、SrO:5質量%、SnO2 :0.15質量%、Fe2 O3 :0.05質量%之玻璃板中氣泡數雖然整體地少量減少,但獲得了大致相同之結果。又,於具有SiO2 :61質量%、Al2 O3 :19.5質量%、B2 O3 :10質量%、CaO:9質量%、SnO2 :0.3質量%、R2 O(R係Li、Na、K之中之玻璃板中所含有之總成分):0.2質量%之玻璃板(應變點700℃)之製造中,亦獲得了與上述相同之結果。As can be seen from Fig. 10, when the temperature increase rate is less than 2 ° C /min, the bubble level rises sharply and the number of bubbles rises sharply. Therefore, after the melting step, when the molten glass MG is heated to 1630 ° C or higher at a temperature increase rate of 2 ° C / min or more, more preferably 2.5 ° C / min or more, the number of bubbles is lowered. Therefore, it is preferably from 2 ° C / min to 10 ° C / min, more preferably from 3 ° C / min to 8 ° C / min, and further preferably from 3 ° C to 6.5 ° C / min. Further, as can be seen from Fig. 10, for example, the temperature increase rate is 3 ° C / min to 8 ° C / min, 3 ° C / min to 6 ° C / min, 4 ° C / min ~ 6 ° C / min or 4 ° C / min ~ 10 ° C / It is more effective in terms of reducing the number of bubbles in minutes. Further, it has SiO 2 : 60% by mass, Al 2 O 3 : 19.5% by mass, B 2 O 3 : 10% by mass, CaO: 5.3% by mass, SrO: 5% by mass, SnO 2 : 0.15% by mass, Fe The number of bubbles in the glass plate of 2 O 3 : 0.05% by mass was substantially reduced by a small amount, but substantially the same result was obtained. Further, it has SiO 2 : 61% by mass, Al 2 O 3 : 19.5% by mass, B 2 O 3 : 10% by mass, CaO: 9% by mass, SnO 2 : 0.3% by mass, and R 2 O (R-based Li, In the production of a 0.2% by mass glass plate (strain point: 700 ° C), the same results as described above were also obtained in the case of the total composition contained in the glass plate among Na and K.

如上所述,根據本實施形態可降低熔融玻璃中之SO2 之氣泡數,因此,亦可降低由於攪拌步驟中之攪拌翼旋轉而產生之成為空蝕之核之氣泡,結果可降低玻璃板中之氣泡數。該效果於作為玻璃組成BaO或SrO之含量較少之玻璃基板之製造方法中,變得更顯著。As described above, according to the present embodiment, the number of bubbles of SO 2 in the molten glass can be reduced, and therefore, the bubbles which become the core of cavitation due to the rotation of the stirring blade in the stirring step can be reduced, and as a result, the glass plate can be lowered. The number of bubbles. This effect is more remarkable in the method of producing a glass substrate having a small glass composition of BaO or SrO.

更詳細而言,作為玻璃組成而含有之MgO、CaO、SrO、BaO作為碳酸鹽而被添加於原料中之情況較多,關於其分解溫度,MgO最低,並依CaO、SrO、BaO之順序變 高。即,分解溫度越高,開始釋出CO2 之溫度越高。由上述情況可知,若熔融玻璃MG於脫泡處理之後降溫,則分解溫度越高越以較高之溫度開始吸收CO2 。例如BaO於1300℃附近開始吸收CO2More specifically, MgO, CaO, SrO, and BaO contained as a glass composition are often added as a carbonate to a raw material, and MgO is the lowest in the decomposition temperature, and is changed in the order of CaO, SrO, and BaO. high. That is, the higher the decomposition temperature, the higher the temperature at which CO 2 is released. From the above, it is understood that if the molten glass MG is cooled after the defoaming treatment, the higher the decomposition temperature, the higher the temperature starts to absorb CO 2 . For example, BaO begins to absorb CO 2 at around 1300 °C.

然而,於作為玻璃組成於較高之溫度區域開始吸收CO2 之BaO或SrO之含量較少之玻璃板之製造中,CO2 之吸收於熔融玻璃MG之溫度降低之後,即熔融玻璃MG之黏度變高之後開始。此處,CO2 於熔融玻璃MG之黏度較低時向熔融玻璃MG中迅速擴散。因此,於熔融玻璃MG之黏度變高之後(溫度變低之後)開始CO2 之吸收之玻璃板的製造方法中,CO2 變得容易作為氣泡而殘留於熔融玻璃MG中。However, in the manufacture of a glass sheet having a glass composition which is low in the amount of BaO or SrO which starts to absorb CO 2 in a relatively high temperature region, the viscosity of the molten glass MG after the temperature of the molten glass MG is lowered by the absorption of the CO 2 . Start after getting higher. Here, CO 2 rapidly diffuses into the molten glass MG when the viscosity of the molten glass MG is low. Therefore, in the method for producing a glass sheet in which the absorption of CO 2 is started after the viscosity of the molten glass MG is increased (after the temperature is lowered), the CO 2 is likely to remain as bubbles in the molten glass MG.

如本實施形態所述,若可降低於熔融玻璃中作為氣泡之氣體成分而存在之SO2 ,則即便為如上所述容易殘留CO2 之玻璃板之製造,亦可抑制成為空蝕之核之氣泡之產生,結果亦可降低作為最終產品之玻璃板中之氣泡數。由以上情況可知,本實施形態適合BaO之含量為0~1.0質量%之玻璃基板之製造,進而適合實質上不含有BaO之玻璃基板之製造方法。又,本實施形態適合SrO之含量為0~3.0質量%之玻璃基板之製造,且進而適合實質上不含有SrO之玻璃基板之製造方法。According to the present embodiment, if the SO 2 which is present as a gas component of the bubble in the molten glass can be reduced, even if it is a glass plate which is likely to remain CO 2 as described above, the core which becomes cavitation can be suppressed. The generation of bubbles, as a result, also reduces the number of bubbles in the glass sheet as the final product. From the above, it is understood that the present embodiment is suitable for the production of a glass substrate having a BaO content of 0 to 1.0% by mass, and further suitable for a method for producing a glass substrate substantially free of BaO. Further, this embodiment is suitable for the production of a glass substrate having a content of SrO of 0 to 3.0% by mass, and is further suitable for a method for producing a glass substrate which does not substantially contain SrO.

以上,對本發明之玻璃板之製造方法進行了詳細地說明,但本發明並不限於上述之實施形態,於不脫離本發明之主旨之範圍內,當然可進行各種之改良或變更。The method of producing the glass sheet of the present invention has been described in detail above, but the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention.

200‧‧‧熔解裝置200‧‧‧melting device

201‧‧‧熔解槽201‧‧‧melting tank

202‧‧‧澄清槽202‧‧‧Clarification tank

203‧‧‧攪拌槽203‧‧‧Stirring tank

203a‧‧‧攪拌器203a‧‧‧Agitator

204、205、206‧‧‧玻璃供給管204, 205, 206‧‧‧ glass supply tube

300‧‧‧成形裝置300‧‧‧Forming device

310‧‧‧成形體310‧‧‧Formed body

312‧‧‧供給溝槽312‧‧‧ supply trench

313‧‧‧下方端部313‧‧‧ bottom end

320‧‧‧環境間隔構件320‧‧‧Environmental spacers

330‧‧‧冷卻輥330‧‧‧Cooling roller

335‧‧‧冷卻單元335‧‧‧Cooling unit

350a~350d‧‧‧搬送輥350a~350d‧‧‧Transport roller

340‧‧‧成形爐340‧‧‧Forming furnace

350‧‧‧徐冷爐350‧‧‧Xu cold furnace

400‧‧‧切割裝置400‧‧‧ cutting device

圖1係本實施形態之玻璃板之製造方法之步驟圖。Fig. 1 is a view showing the steps of a method for producing a glass sheet of the embodiment.

圖2係模式地表示本實施形態之玻璃板之製造方法中進行熔解步驟~切割步驟之裝置的圖。Fig. 2 is a view schematically showing an apparatus for performing a melting step to a cutting step in the method for producing a glass sheet of the embodiment.

圖3係主要表示本實施形態之進行澄清步驟之裝置構成的圖。Fig. 3 is a view mainly showing the configuration of a device for performing a clarification step in the embodiment.

圖4係主要表示本實施形態之進行成形步驟及切割步驟之裝置構成的圖。Fig. 4 is a view mainly showing the configuration of a device for performing a forming step and a cutting step in the embodiment.

圖5係說明本實施形態之自熔解步驟至成形步驟之溫度歷程之一例的圖。Fig. 5 is a view showing an example of a temperature history from the melting step to the forming step in the embodiment.

圖6係表示本實施形態之進行脫泡處理時之包含於熔融玻璃中之O2 之排出量與升溫速度之關係的圖。Fig. 6 is a graph showing the relationship between the discharge amount of O 2 contained in the molten glass and the temperature increase rate when the defoaming treatment is performed in the present embodiment.

圖7係表示再現殘留於玻璃板中之氣泡後之玻璃中之孔內所含有之SO2 之含量之測定結果的圖。Fig. 7 is a graph showing the measurement results of the content of SO 2 contained in the pores in the glass after the bubbles remaining in the glass plate are reproduced.

圖8係表示於模擬圖5所示之熔融玻璃之溫度歷程之實驗爐中製作玻璃板時之氣泡級別與降溫速度之關係的圖。Fig. 8 is a graph showing the relationship between the bubble level and the temperature drop rate when a glass plate is produced in a laboratory furnace simulating the temperature history of the molten glass shown in Fig. 5.

圖9係表示利用圖2所示之製造玻璃板之裝置製造玻璃板時之存在於玻璃板內之氣泡級別與降溫速度之關係的圖。Fig. 9 is a view showing the relationship between the bubble level and the temperature drop rate existing in the glass sheet when the glass sheet is produced by the apparatus for producing a glass sheet shown in Fig. 2;

圖10係表示利用圖2所示之製造玻璃板之裝置製造玻璃板時之存在於玻璃板內之氣泡級別與升溫速度之關係的圖。Fig. 10 is a view showing the relationship between the bubble level and the temperature increase rate which are present in the glass sheet when the glass sheet is produced by the apparatus for producing a glass sheet shown in Fig. 2;

Claims (7)

一種玻璃板之製造方法,其特徵在於包括:熔解步驟,其將含有SnO2 作為澄清劑之玻璃原料至少藉由通電加熱而熔解而製作熔融玻璃;澄清步驟,其包括:脫泡處理,其於上述熔解步驟之後,以2℃/分鐘以上之升溫速度使上述熔融玻璃之溫度升溫至1630℃以上,藉此使上述熔融玻璃中生成氣泡並進行脫泡;及吸收處理,其於上述脫泡處理之後,使上述熔融玻璃降溫,藉此將上述熔融玻璃中之氣泡吸收至上述熔融玻璃中;及成形步驟,其使上述澄清步驟後之上述熔融玻璃成形為板狀玻璃;其中於上述吸收處理中,使上述熔融玻璃於1600℃至1500℃之範圍內以2.5℃/分鐘以上之降溫速度降溫。A method for producing a glass sheet, comprising: a melting step of melting a glass raw material containing SnO 2 as a fining agent by at least electric heating to form a molten glass; and a clarifying step comprising: a defoaming treatment, wherein After the melting step, the temperature of the molten glass is raised to 1630 ° C or higher at a temperature increase rate of 2 ° C /min or more, whereby bubbles are formed in the molten glass to perform defoaming; and an absorption treatment is performed in the above defoaming treatment. Thereafter, the molten glass is cooled to absorb bubbles in the molten glass into the molten glass, and a forming step of forming the molten glass after the clarification step into a sheet glass; wherein in the absorbing treatment The molten glass is cooled at a temperature drop rate of 2.5 ° C / min or more in the range of 1600 ° C to 1500 ° C. 如請求項1之玻璃板之製造方法,其中於上述成形步驟中,藉由溢流下拉法由上述熔融玻璃形成板狀玻璃。 The method for producing a glass sheet according to claim 1, wherein in the forming step, the sheet glass is formed from the molten glass by an overflow down-draw method. 如請求項1或2之玻璃板之製造方法,其中上述澄清步驟中之上述熔融玻璃之升溫至少使用連接進行上述熔解步驟之熔解槽與進行上述澄清步驟之澄清槽之間的金屬管,並藉由控制流入上述金屬管之電流而進行。 The method for producing a glass sheet according to claim 1 or 2, wherein the temperature rise of the molten glass in the clarification step is at least a metal tube between the melting tank for performing the melting step and the clarifying tank for performing the clarification step, and It is carried out by controlling the current flowing into the metal tube. 如請求項1或2之玻璃板之製造方法,其中1630℃之溫度中之上述熔融玻璃之黏度為130~350泊。 The method for producing a glass sheet according to claim 1 or 2, wherein the viscosity of the molten glass in the temperature of 1630 ° C is 130 to 350 poise. 如請求項1或2之玻璃板之製造方法,其中上述玻璃板之R'2 O之含量為0~2.0質量%(R'2 O為Li2 O、Na2 O及K2 O之中 所含有之成分的合計)。The method for producing a glass plate according to claim 1 or 2, wherein the content of R' 2 O of the glass plate is 0 to 2.0% by mass (R' 2 O is among Li 2 O, Na 2 O and K 2 O) The total of the ingredients contained). 如請求項1或2之玻璃板之製造方法,其中上述玻璃板含有:SiO2 :50~70質量%、B2 O3 :5~18質量%、Al2 O3 :10~25質量%、MgO:0~10質量%、CaO:0~20質量%、SrO:0~20質量%、BaO:0~10質量%、RO:5~20質量%(其中R係選自Mg、Ca、Sr及Ba中至少1種,且RO為MgO、CaO、SrO及BaO中含有之成分之合計)。The method for producing a glass plate according to claim 1 or 2, wherein the glass plate contains: SiO 2 : 50 to 70% by mass, B 2 O 3 : 5 to 18% by mass, and Al 2 O 3 : 10 to 25% by mass, MgO: 0 to 10% by mass, CaO: 0 to 20% by mass, SrO: 0 to 20% by mass, BaO: 0 to 10% by mass, and RO: 5 to 20% by mass (wherein R is selected from Mg, Ca, Sr) And at least one of Ba, and RO is a total of components contained in MgO, CaO, SrO, and BaO). 如請求項1或2之玻璃板之製造方法,其中於上述澄清步驟與上述成形步驟之間包括將熔融玻璃之成分均質地攪拌之攪拌步驟;於上述熔解步驟中,以比上述熔融玻璃之熔解開始時之溫度更高之溫度將上述熔融玻璃供給至上述澄清步驟;於上述澄清步驟中,以比上述吸收處理後之溫度更低之溫度將上述熔融玻璃供給至上述攪拌步驟;於上述成形步驟中,以關於上述熔融玻璃之黏度η(泊)成為logη=4.3~5.7之溫度供給上述熔融玻璃,而成形為板狀玻璃。The method for producing a glass plate according to claim 1 or 2, wherein a stirring step of uniformly stirring the components of the molten glass is included between the clarifying step and the forming step; and melting in the molten glass is performed in the melting step The molten glass is supplied to the clarification step at a temperature higher at the beginning; in the clarification step, the molten glass is supplied to the stirring step at a temperature lower than the temperature after the absorbing treatment; In the above, the molten glass is supplied to the molten glass by the viscosity η (poise) of the molten glass to a temperature of log η = 4.3 to 5.7, and is formed into a sheet glass.
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