201241588 六、發明說明： 【發明所屬之技術領域】 本發明是有關流體供給量調節裝置，特別是有關於供 半導體製造裝置的各種藥液的混合時的供給流量的控制所 使用的流體供給量調節裝置。 【先前技術】 在半導體的製造等，供給矽晶圓的洗淨和蝕刻處理用 的藥液等的流體的情況時，會要求流體有較高的清淨度。 在國際半導體技術發展藍圖（iTRS)中從2010年正式（真 正）地開始32nm的配線間距的製造，預定今後將進一步 縮窄配線寬度。因此’極力抑制灰塵從流體的流通路徑混 入，是非常重要。 現在，矽晶圓洗淨的主流是由單片方式進行洗淨。因 此’有需要將極少量的氫氟酸等的藥液由正確的精度供給 並與純水及混合地供給。爲了可進行這種微少流量域的調 節，例如使用如滾針閥的調節閥（專利文獻1等參照）和 其他的調節閥（專利文獻2等參照）。專利文獻1等的調節 閥’是主要是在藥液及純水的混合部的上流位置，與各藥 液的供給配管內連接（專利文獻3等參照）。 既有的微少流量用的調節閥，具有供調節設有隔膜開 度用的閥體及閥座。因此，該調節閥的閥室內的流體會受 到在調節閥的下流側發生的壓力變動（也包含流體的供給 、供給停止等）的影響。調節閥的構造上因爲隔膜是面向 -5- 201241588 閥室，即使是些微的壓力變動，施加於隔膜的壓力就會變 化，與隔膜連結的閥體的位置也會變化。即，閥座的開度 會變化。 隨著這種壓力變動所導致的閥座的開度的變化的對應 方法，已被提案一種調節閥，其具有在閥室將2枚的隔膜 相面對配置並將兩隔膜軸部連接的構造（專利文獻4參照 )。但是，專利文獻4的調節閥的情況，在閥室內前述的 軸部因爲是被插通，所以欲減小閥室孔徑是困難的。因此 ，不適合於微少流量域的調節。且，如軸部的加工、組裝 、動作時的位置的晃動等，也有可能在動作時使軸部與閥 室孔接觸而產生灰塵。 [先行技術文獻] [專利文獻] [專利文獻1]日本特開2004-68935號公報 [專利文獻2]日本專利第4365477號公報 [專利文獻3]日本特開2008-258437號公報 [專利文獻4]日本特開2007-24069號公報 【發明內容】 (本發明所欲解決的課題） 本發明’是鑑於前述的問題點，提供一種使具備隔膜 的流量調節閥部可抑制因受到被控制流體的壓力變動而使 該流量調節閥部內的閥座的開度變化，並且可極力抑制灰 -6- 201241588 塵產生且適合微少流量域的流量調節之流體供給量調節裝 置0 (用以解決課題的手段） 即’申請專利範圍第1項的發明，是一種流體供給量 調節裝置’是用來調節150mL/min以下的微少流量域的被 控制流體的供給流量之流量調節裝置，具備：流量調節閥 部’是與被控制流體的供給部及流體混合部之間的流體配 管連接，進行被控制流體的流量調節；及壓力控制閥部， 是抑制在被控制流體發生的壓力變動；及流量感測器，是 設在前述流體配管中；及計算裝置；且前述計算裝置，是 進行依據前述流量感測器的流量測量値的反饋控制，其特 徵爲：前述流量調節閥部，具備：閥室殻體部，形成有： 讓被控制流體通過的第1流路部及第2流路部、及將前述第 1流路部及前述第2流路部連接並讓被控制流體流通的閥室 ;及閥座，呈平坦狀形成有閥室開口部，且在前述閥室殼 體部中使前述第1流路部對於前述閥室成爲直徑爲1mm以 下；及平坦閥體，具備將前述閥座可進退自如地密封的密 封部並且使該密封部呈平坦狀形成；及閥機構體，是形成 於前述密封部側相反側且具備被裝設於前述閥室側的隔膜 部：及進退手段，是藉由受到由前述計算裝置所進行的反 饋控制使前述閥機構體進退來調節前述平坦閥部及前述閥 座的距離，且在前述第2流路部側設置前述壓力控制閥部 ，抑制當被控制流體施加於前述隔膜部時所發生的壓力變 201241588 動。 申請專利範圍第2項的發明，是如申請專利範圍第1項 的流體供給量調節裝置，其中，前述·第2流路部側是前述 流量調節閥部中的下流側，前述壓力控制閥部是可一定地 保持該壓力控制閥部的上流側的被控制流體的流體壓力用 的壓力控制閥。 申請專利範圍第3項的發明，是如申請專利範圍第1項 的流體供給量調節裝置，其中，前述第2流路部側是前述 流量調節閥部中的下流側，前述壓力控制閥部是可一定地 保持該壓力控制閥部的上流側的被控制流體的流體壓力用 的壓力控制閥，前述壓力控制閥部是形成於前述流量調節 閥部內。 申請專利範圍第4項的發明，是如申請專利範圍第1項 的流體供給量調節裝置，其中，前述第2流路部側是前述 流量調節閥部中的上流側，前述壓力控制閥部是可一定地 保持該壓力控制閥部的下流側的被控制流體的流體壓力用 的壓力控制閥。 申請專利範圍第5項的發明，是如申請專利範圍第1項 的流體供給量調節裝置，其中，前述進退手段是使用依據 前述計算裝置的反饋控制藉由電動氣動轉換器作出的調壓 氣體。 申請專利範圍第6項的發明，是如申請專利範圍第1項 的流體供給量調節裝置，其中，前述進退手段是受到前述 計算裝置的反饋控制之後依據馬達控制基板被控制的步進 201241588 馬達β [發明的效果] 依據申請專利範圔第1項的發明的流體供給量調節裝 置，因爲是一種流體供給量調節裝置’是用來調節 1 5 0m L/mi η以下的微少流量域的被控制流體的供給流量之 流量調節裝置，具備：流量調節閥部’是與被控制流體的 供給部及流體混合部之間的流體配管連接，進行被控制流 體的流量調節；及壓力控制閥部’是抑制在被控制流體發 生的壓力變動；及流量感測器，是設在前述流體配管中； 及計算裝置；且前述計算裝置’是進行依據前述流量感測 器的流量測量値的反饋控制，其特徵爲：前述流量調節閥 部，具備：閥室殼體部，形成有：讓被控制流體通過的第 1流路部及第2流路部、及將前述第1流路部及前述第2流路 部連接並讓被控制流體流通的閥室：及閥座，呈平坦狀形 成有閥室開口部，且在前述閥室殼體部中使前述第1流路 部對於前述閥室成爲直徑爲1mm以下；及平坦閥體，具備 將前述閥座可進退自如地密封的密封部並且使該密封部呈 平坦狀形成；及閥機構體，是形成於前述密封部側相反側 且具備被裝設於前述閥室側的隔膜部：及進退手段，是藉 由受到由前述計算裝置所進行的反饋控制使前述閥機構體 進退來調節前述平坦閥部及前述閥座的距離；且在前述第 2流路部側設置前述壓力控制閥部，使抑制當被控制流體 施加於前述隔膜部時的所發生的壓力變動，所以可抑制具 201241588 備隔膜的流量調節閥部因受到被控制流體的壓力變動而使 該流量調節閥部內的閥座的開度的變化。且，可以極力抑 制從閥體的構造產生灰塵，可以獲得適合於微少流量域的 流量調節且可抑制灰塵產生的流體供給量調節裝置。 特別是，本發明的流體供給量調節裝置，因爲是以調 節微少流量域的被控制流體的供給流量爲目的，所以藉由 抑制被控制流體的流體壓力的變動影響流量調節閥部，就 可以確保控制流體的供給量的正確性。 依據申請專利範圍第2項的發明的流體供給量調節裝 置，因爲是如申請專利範圍第1項的發明，其中，前述第2 流路部側是前述流量調節閥部中的下流側，前述壓力控制 閥部是可一定地保持該壓力控制閥部的上流側的被控制流 體的流體壓力用的壓力控制閥，所以可以減少流量調節閥 部受到在流體供給量調節裝置的流量調節閥部的下流側發 生的被控制流體的流體壓力的變動的影響。 依據申請專利範圍第3項的發明的流體供給量調節裝 置’因爲是如申請專利範圍第1項的發明，其中，前述第2 流路部側是前述流量調節閥部中的下流側，前述壓力控制 閥部是可一定地保持該壓力控制閥部的上流側的被控制流 體的流體壓力用的壓力控制閥，前述壓力控制閥部是形成 於前述流量調節閥部內，所以可以減少流量調節閥部受到 來自流體供給量調節裝置內的流量調節閥部的下流側的被 控制流體的流體壓力的變動的影響。進一步，可以抑制裝 置本身的容積並可以減少設置場所。 -10- 201241588 依據申請專利範圍第4項的發明的流體供給量調節裝 置’因爲是如申請專利範圍第1項的發明，其中，前述第2 流路部側是前述流量調節閥部中的上流側，前述壓力控制 閥部是可一定地保持該壓力控制閥部的下流側的被控制流 體的流體壓力用的壓力控制閥，所以可以減少流量調節閥 部受到在流體供給量調節裝置的流量調節閥部的上流側發 生的被控制流體的流體壓力的變動的影響。 依據申請專利範圍第5項的發明的流體供給量調節裝 置，因爲是如申請專利範圍第1項的發明，其中，前述進 退手段是使用依據前述計算裝置的反饋控制藉由電動氣動 轉換器作出的調壓氣體，所以朝電動氣動轉換器的電源供 給若停止時可以將閥座的狀態維持在安全的位置。 依據申請專利範圍第6項的發明的流體供給量調節裝 置，因爲是如申請專利範圍第1項的發明，其中，前述進 退手段是受到前述計算裝置的反饋控制之後依據馬達控制 基板被控制的步進馬達，所以是絕對或相對位置的控制容 易。且，即使無壓縮空氣設備的情況時也可進行開度的調 節。 【實施方式】 第1圖的槪略圖是顯示將矽晶圓W1枚1枚地處理的單 片方式的基板處理裝置。本發明的流體供給量調節裝置 5A、5B、5C主要是被組入所揭示的基板處理裝置內。矽 晶圓W是被載置在自旋挾盤1的旋轉盤。在矽晶圓W的正上 -11 - 201241588 具備將處理液放出的處理液噴嘴2。矽晶圓的洗淨等的處 理液是通過流體配管3被供給至處理液噴嘴2。被控制流體 可例示：氫氟酸、鹽酸、氨水等的藥液。在圖示中依據藥 液的種類分別儲存於供給部9A、9B、9C，並依序流通於 流體配管3a、3b、3c。各藥液，是被貯留在供給部14並與 從流體配管1 5被供給的純水（包含溫純水）在流體混合部 4依據預定比率被混合調製之後，被供給至流體配管3。 如圖示，對於成爲被控制流體的各藥液皆具備流體供 給量調節裝置，用來控制該藥液的流量的調節、供給停止 或供給再開。在各流體配管3 a、3 b、3 c中的流體供給量調 節裝置因爲是相同構成，所以只以流體供給量調節裝置 5 A爲代表，依序說明裝置的構成。流體供給量調節裝置 5 A是與被控制流體（藥液）的供給部9A及流體混合部4之 間的流體配管3a連接。進行該被控制流體的流量調節用的 流量調節閥部10A是與流體供給量調節裝置5A連接。抑制 在流體配管3a內的被控制流體發生的流體壓力的變動用的 壓力控制閥部20A也與同流體配管3a連接。且，也具備供 檢出流體配管3a內的被控制流體（藥液）的流量用的流量 感測器6A (流量計）。 來自流量感測器6A的檢出訊號是通過訊號線s朝計算 裝置7A ( PLC :可設計程式的邏輯控制器）被發訊。在計 算裝置7A，是進行對應前述的流量感測器6A的檢出結果 的反饋控制的計算。依據反饋控制的控制計算的結果進行 流量調節閥部10A的流量調節。在流量調節因爲採用反饋 -12- 201241588 控制，所以將流量切換時反應速度快速，進一步可以進行 精度佳且穩定的流量調節。 在流量調節閥部10A等，其閥部的開度調節是採用藉 由調壓氣體進行的機構（第2圖等參照）的情況時，具備 將藉由計算裝置7A被控制的調壓氣體作出用的電動氣動 轉換器8A (電動氣動調節器）。在流體供給量調節裝置 5B以及5C中，流體配管3b、3c中的流量調節閥部i〇B、 10C、壓力控制閥部20B、20C、流量感測器6B、6C的配置 、這些與計算裝置7B、7C、電動氣動轉換器8B、8C的連 接也是同樣。且，如第3圖的流量調節閥部10K具備將朝 馬達各相的驅動電流作出用的馬達控制基板8R。第6圖也 同樣。第1圖中，符號1 1是在純水（包含溫純水）的流體 配管15中的流量感測器，12是流量控制閥部，13是壓力控 制閥部。 特別是，流體供給量調節裝置5A’是被使用於 150mL/min以下，進一步是5〜20mL/min的微少流量域的 被控制流體（藥液）的供給流量的精密的調節。且’從圖 示的5B、5C開始，在以下的圖示的實施例所揭示的流體 供給量調節裝置也同樣被使用於微少流量域的被控制流體 (藥液）的供給流量的調節° 對於將微少流量域的被控制流體的供給流量調節的流 體供給量調節裝置5A (第1實施例）’使用第2圖的剖面 圖說明同裝置5A中的流量調節閥部10八及壓力控制閥部 20A的構造。 -13- 201241588 流量調節閥部10A，主要是由：閥室殼體部101、及 外殼殼體部102、及將閥室殻體部1〇1及外殼殼體部102連 接的中間殼體部103的3部位所構成。 在閥室殼體部101中，具備讓被控制流體（藥液）通 過的第1流路部111及第2流路部112。形成有同時與第1流 路部1 1 1及第2流路部1 12連接並使被控制流體流通的閥室 110。在第2圖的流體供給量調節裝置5 A的流量調節閥部 1 〇 A中，第1流路部1 1 1側是上流側（供給部側），第2流 路部1 12側是下流側（流體混合部側）》圖中的符號1 13是 第1流路連接部，11 4是第2流路連接部。 在閥室殼體部101中，第1流路部111是對於閥室11〇將 直徑形成1 mm ( φ 1 mm )以下的閥室開口部1 1 6。朝閥室 開口部1 1 6的閥室1 1 0側的開口末端是成爲呈平坦狀形成的 閥座115。具備在閥座115的正上將該閥座115可進退自如 地密封的密封部1 2 1。密封部1 2 1是形成平坦狀，密封部 121是被配置於平坦閥體122。習知的滾針閥的情況，因爲 構件本身的公差、製造和組裝時的軸的偏離等的要因而使 閥體與閥座側接觸，閥座、閥體等被切削而使閥座的開口 量會變化，所以有容易隨此流量會變化的問題。此點，在 平坦閥體122的密封部121及閥座115的關係中，軸偏離的 影響被減輕，其結果可以抑制隨著平坦閥體122的進退動 作而發生灰塵》 隔膜部1 23是朝向閥室11 〇側的方式形成於平坦閥體 122的密封部121側相反側。實施例，是將平坦閥體122及 -14- 201241588 隔膜部123 —體形成的方式形成閥機構體120。與圖示相異 ，將平坦閥體及隔膜部由各別的零件構成也可以。在隔膜 部123的周圍形成有隔膜緣部124。隔膜緣部124因爲被閥 室殼體部101及中間殼體部103挾持，所以閥機構體120被 配置於閥室110的預定位置。在中間殼體部103也形成呼吸 路105，被使用於隔膜部124的背面側的空氣的流出入。 閥機構體120,是透過其上部的閥體連接部125與活塞 部131的活塞下部132連接。如從圖示被把握的方式，在中 間殻體部103中形成有活塞部131可滑動的貫通部。在中間 殼體部103的上部的外殼殼體部102內，收容有活塞部131 及彈簧135。彈簧135是透過活塞部131的活塞頭部133將該 活塞部131朝壓下方向推迫。 且在外殻殻體部102形成有空氣通口 104，使藉由電動 氣動轉換器8A作出的調壓氣體朝外殻殼體部102內的空氣 室134流出入。調壓氣體的流出入量，是計算裝置7A是依 據對應流量感測器6 A的檢出結果的反饋控制的計算結果 來控制調節電動氣動轉換器8A。且，也會受到作業者所 進行的被控制流體的供給停止或供給再開的控制。 如圖示，外殻殻體部102內的空間是藉由活塞頭部133 被區劃成空氣室134及彈簧室136。因此，空氣室134的內 部壓力若上昇的話，可以抵抗彈簧135的推迫力將活塞部 131及與此連接的閥機構體120擧升，將平坦閥體122的密 封部121及閥座115的距離擴大來加大閥座115的開度。 相反地，空氣室134的內部壓力若下降的情況時，彈 -15- 201241588 簧135的推迫力較強而使活塞部131及與其連接的閥機構體 1 2 0降下。即’平坦閥體1 2 2的密封部1 2 1及閥座1 1 5的距離 會變窄’進—步，平坦閥體122會與閥座n5接觸。 從圖示及其說明明顯可知，在流量調節閥部10A中， 藉由受到由計算裝置7A進行的反饋控制使閥機構體120進 退使平坦閥部122及閥座115的距離的調節，是由··藉由電 動氣動轉換器8A作出的調壓氣體、活塞部131、及彈簧 135擔任。在此，在實施例的流量調節閥部10A中，調壓 氣體、活塞部131、及彈簧135是成爲進退手段130。使用 調壓氣體的進退驅動的情況時，例如，即使朝電動氣動轉 換器8 A的電源供給停止而沒有調壓氣體的供給的情況， 也可以將閥座1 1 5的狀態維持在安全的位置。 在活塞部131中，套設有由尿烷橡膠、NBR、HNBR、 矽橡膠、氟樹脂橡膠等的耐久性素材形成的0形環137。 因此，空氣室134的氣密性被確保，活塞部131的進退動作 穩定化。彈簧室136的空氣是通過外殼呼吸路106流出入。 如第1、2圖，流量調節閥部10A的第2流路部1 12側是 下流側。在此，從成爲流量調節閥部1 〇 A的下流側的第2 流路部1 1 2側發生的被控制流體的壓力變動的影響，會朝 流量調節閥部10A的閥室110及面對隔膜部123傳遞。即， 閥機構體120的隔膜部123會受到來自第2流路部1 12側的被 控制流體的壓力變動。隔膜部1 23因爲是由與密封部1 2 1相 比較寬的面積受到壓力變動，所以平坦閥體1 22的密封部 1 2 1及閥座1 1 5的距離會變化，閥座1 1 5的開度有可能變化 -16- 201241588 爲了對應此點，在流體供給量調節裝置5A中，爲了 抑制在流量調節閥部1 〇 A的第2流路部1 1 2側施加於前述的 隔膜部123的被控制流體的發生的壓力變動，而設置壓力 控制閥部20A。第2圖所揭示的壓力控制閥部20A，是如負 壓閥等的壓力控制閥，具有可將該壓力控制閥部20 A的上 流側的被控制流體的流體壓力一定地保持的功能。 在壓力控制閥部20A中，在閥室殼體部201中，具備 讓被控制流體（藥液）通過的第1流路部211及第2流路部 212。同時形成有將第1流路部211及第2流路部212連接並 使被控制流體流通的閥室210。圖中的符號213是第1流路 連接部，214是第2流路連接部》在流量調節閥部10八的第 2'流路連接部114連接有第1流路連接部213。又，雙方的連 接形態，連接方法等可適宜地變更。且，將流量調節閥部 10A的閥室殻體部1〇1及壓力控制閥部20A的閥室殼體部 201由一體化的封裝品構成也可以。 第2流路部212及閥室210的連接部位是閥座215。在閥 座215的正上配置有閥體222。在閥體222中具備將閥座215 可進退自如地密封的密封部221。 在閥體222的密封部221側相反側，隔膜部223是朝向 閥室210側形成。實施例的壓力控制閥部2〇a，是將閥體 222及隔膜部223—體形成而形成閥機構體22〇。與圖示相 異’將平坦閥體及隔膜部由各別的零件構成也可以。在隔 膜部223的周圍形成有隔膜緣部224。隔膜緣部224因爲是 -17- 201241588 被閥室殻體部101及外殼殼體部202挾持，所以閥機構體 220會被配置於閥室210的預定位置。 在外殻殼體部202內，形成有收容室22 8，且具備彈簧 225及承受同彈簧225的推迫力的推迫塊體226。推迫塊體 226是與閥機構體220連接。通常，閥機構體220的密封部 221，是受到彈簧225的推迫力而與閥座215接觸。藉由從 壓力控制閥部20A的上流側的流量調節閥部10A使預定流 量的被控制流體被供給，使由被控制流體的流體壓力所產 生的負荷抵抗彈簧225的推迫力時，密封部221及閥座215 的接觸狀態就會被解除。因此，成爲可送通預定的流體壓 力的被控制流體。在外殻殻體部202中也形成呼吸路227， 被使用於隔膜部223 (推迫塊體226 )的背面側的空氣的流 出入。 在此，在壓力控制閥部20 A的下流側中，被控制流體 的流體壓力若急速上昇或降下的情況，其流體壓力的變動 ，會朝壓力控制閥部20 A的閥室210及面對隔膜部223傳遞 。受到彈簧225的推迫力閥機構體22 0，可以透過隔膜部 223，使閥體222的密封部121及閥座215的距離變化。在此 ，壓力控制閥部20A的下流側的壓力變動，藉由閥機構體 220控制與閥座21 5的開度變化而被調整。即，流量調節閥 部10A就成爲不會受到壓力控制閥部20A的下流側的壓力 變動的影響。 第3圖的剖面圖，是顯示可以替代第1圖的各流體供給 量調節裝置5A、5B、5C內的流量調節閥部l〇A、10B、 -18- 201241588 10C的流量調節閥部10K (第2實施例）。在第3圖的流量 調節閥部10K中，第1流路部、第2流路部、閥室、閥座、 及閥機構體等的構成，進一步作用，本質上是與前述的流 量調節閥部10A同樣。因此，對於共通的部位附加與第2 圖的流量調節閥部10 A相同的符號》 在流量調節閥部10K，藉由將閥機構體120進退來調 節平坦閥部122的密封部121及閥座115的距離用的進退手 段130K，是被組裝於受到計算裝置7R的反饋控制並依據 馬達控制基板8R被控制的步進馬達140。圖示的步進馬達 140是被收容於中間殼體部1〇3的上方。使成爲這些的蓋的 方式外殼殼體部102被覆蓋，步進馬達140是藉由螺栓146 被固定於中間殻體部103。 在步進馬達140中，具備：成爲固定側的定子144 (電 磁鐵）及成爲旋轉側的轉子141 (永久磁鐵），依據旋轉 角度的正確地控制來進行轉子141的旋轉》在轉子141的進 一步內部具備中空圓筒狀的馬達軸142 (旋轉軸）。昇降 軸151是被插通馬達軸142內。在昇降軸151的表面形成有 昇降軸溝152，昇降軸溝152是與形成於馬達軸142內的內 軸螺紋山143螺合。在昇降軸151的下端具備推壓部153。 由計算裝置7R所產生的反饋控制的訊號是朝馬達控制 基板8R被發訊，在同馬達控制基板8R使脈衝被輸出。在 此，步進馬達140內的轉子141是隨著預定角度的旋轉使馬 達軸142也旋轉預定角度。馬達軸142的旋轉量，是被變換 成與同馬達軸142螺合的昇降軸151的上下方向的移動量。 -19- 201241588 此結果，推壓部153的上下方向的移動量會變化。符號147 是配線。 推壓部153若降下的情況時，被放置於活塞部131的上 部的彈簧135因爲是藉由推壓部153朝下方壓下所以活塞部 131會降下。在此，與活塞部131連接的閥機構體120的平 坦閥體122的密封部121是接近閥座115 ’進一歩成爲相互 接觸。相反地，推壓部1 5 3若上昇的情況時’對於彈簧1 3 5 的推壓部153的朝下方壓下力被減輕。在此’與活塞部131 連接的閥機構體120的平坦閥體122的密封部121會從閥座 1 15脫離。 在步進馬達140中，藉由電動氣動訊號與轉子141連動 的馬達軸142被旋轉。其結果，成爲也可透過與馬達軸142 螺合的昇降軸151、推壓部153使彈簧135的彈簧負荷細微 地變化。圖中，符號145是原點感測器。藉由使用步進馬 達，使成爲容易進行絕對或相對的位置控制，也成爲可進 行彈簧負荷的細微調節。且，即使無壓縮空氣設備的情況 時也可進行開度的調節。 第4圖的流體供給量調節裝置5D (第3實施例），是 在與流量調節閥部10A的第2流路部112的下流側連接的壓 力控制閥部20D適用如負壓控制閥等的壓力控制閥的裝置 。該流體供給量調節裝置5D中的流量調節閥部，是既述 的10A或10K的其中任一也可以。在圖示中爲i〇A。流量調 節閥部1 0 A的構造、作用等，因爲是如第2圖說明，所以 省略詳細說明。 -20- 201241588 對於壓力控制閥部20D的構造，請參照日本專利第 3467438號、US6386509B等。壓力控制閥部20D，主要是 由上部殼體部301a、中間殼體部301b、下部殼體部301c所 組合，在中間殼體部301b內形成有流路部3 02。 被控制流體是從第1流路連接部3 0 3朝壓力控制閥部 2 0D內的第1閥室306流入。在面向第1閥室306的位置配置 有第1隔膜部321。設在第1隔膜部321的周圍的隔膜緣部 323是藉由上部殼體部30 la及中間殼體部301b被挾持，使 第1隔膜部3 2 1被固定。在第1隔膜部3 2 1的背後側形成有第 1力D壓室308。在此，第1隔膜部321是受到從給氣通口 312 流入第1加壓室308內並被保持在同第1加壓室的調壓氣體 的加壓力。符號314是調壓氣體用的排氣通口。 在中間殼體部301b的中央部分形成有上下的貫通路， 在其途中具備閥座3 05。被控制流體是從第1閥室3 0 6經由 閥座3 05到達第2閥室307。且，從第2流路連接部304流出 。從第4圖的流量調節閥部10A及壓力控制閥部20D的配置 可知，第1流路連接部3 03是上流側，第2流路連接部304是 下流側。 在面向第2閥室307的位置配置有第2隔膜部322。設在 第2隔膜部322的周圍的隔膜緣部324是藉由中間殼體部 301b及下部殼體部301c被挾持，使第2隔膜部322也被固定 。在第2隔膜部3 22的背後側形成有第2加壓室3 09。在此， 第2隔膜部3 22是受到第2彈簧311的推迫。符號31 3是第2加 壓室3 09內的空氣用的呼吸路，325是保持構件。 -21 - 201241588 第1隔膜部321及第2隔膜部322是藉由閥部320被連結 且形成閥機構體C1。閥機構體㈠的閥部320及閥座305的 距離（接近、隔離 '接觸），是藉由從給氣通口 312朝第1 加壓室3 08內流入的調壓氣體的加壓力被調整。在此實施 例中’可對應流量感測器·的檢出流量、設定變更後的流量 ’進行閥部3 20及閥座3 05的最適合的開度調節。在壓力控 制閥部20D中’第1隔膜部32丨雖是受到調壓氣體的加壓力 ’第2隔膜部322雖是受到第2彈簧311的推迫的構成，但不 限定這些’任一的隔膜部，皆可以適宜地選擇由彈簧所產 生的推迫或由彈簧及調壓氣體的雙方所產生的推迫和加壓 〇 對於成爲壓力控制閥部20D的下流側的被控制流體的 壓力變動’首先第2隔膜部3 22會受到作用。因爲具備第1 隔膜部321及第2隔膜部322，且彼此連結，所以第1隔膜部 32 1也隨著第2隔膜部3 22側的變化與閥部3 20—起移動。其 結果’兩隔膜部是各別受到被控制流體的流體壓力而使閥 部320移動至雙方均衡的位置，壓力控制閥部20D的閥座 3 〇 5的開度就會變化。如此的話，在壓力控制閥部2 〇 D被 控制流體的壓力變動的影響是被吸收，被配置於其結果， 使壓力控制閥部的上流的流量調節閥部10 A所覆蓋的被控 制流體的壓力變動被抑制。 第5圖的流體供給量調節裝置5E (第4實施例），是將 安全閥等的壓力控制閥部本身組裝至如第2圖等所揭示的 流量調節閥部的內部而形成的裝置。即，可以稱爲將流量 -22- 201241588 調節閥部及壓力控制閥部組合的複合調節閥部（5 E )。在 第5圖的流體供給量調節裝置5E中，在上部側形成有擔任 被控制流體的流量調節用的流量調節閥部10E。且，在下 部側也形成可將被控制流體的壓力變動一定地保持的壓力 控制閥部20E。流體供給量調節裝置5E的流量調節閥部 10E及壓力控制閥部20E，是可以直接與如第2圖所揭示的 流體供給量調節裝置5A中的流量調節閥部10A及壓力控制 閥部20A交換。流量調節閥部10E，因爲本質上是採用與 前述的流量調節閥部10A同樣的構成，所以對於共通的構 造部位使用同一符號。 流體供給量調節裝置（複合調節閥部）5E，具備：將 被控制流體用的流路形成於內部的閥室殻體部101、及將 前述的進退手段130 (活塞部131)等可進退自如地收容的 外殻殻體部102、及將閥室殼體部101及外殼殼體部1〇2連 接的中間殻體部103，進一步，在閥室殼體部1〇1的正下具 備底部外殻殼體部107。 在流體供給量調節裝置5E的整體中，第1流路連接部 113是成爲上流側，讓被控制流體流入，第2流路連接部 1 14是成爲下流側，讓被控制流體流出。在閥室殼體部101 中’形成有：被控制流體通過的第1流路部111及第2流路 部1 72 (控制側流路部）、及使被控制流體從第1流路部 111流入的第1閥室110、及使被控制流體朝第2流路部172 流出的第2閥室170。 在閥室殼體部101中，第1流路部111是對於第1閥室 -23- 201241588 1 10將直徑形成1mm ( Φ lmm )以下的閥室開口部1 16。朝 閥室開口部1 1 6的閥室1 1 〇側的開口末端是成爲呈平坦狀形 成的閥座115。進一步在閥室殻體部101中，也形成於：使 第2流路部172朝第2閥室170開口的第2閥座175、及將第1 閥室110及第2閥室170連接的內部流路部171。在流量調節 閥部10E的構成中，內部流路部171是相當於第2圖參照的 第2流路部112。且，在壓力控制閥部20E的構成中，內部 流路部171是相當於第2圖的第1流路部211。 在第1閥座115的正上配置有第1平坦閥體122。在第1 平坦閥體122中具備將第1閥座115可進退自如地密封的第1 密封部1 2 1 ’該第1密封部1 2 1也形成平坦狀。第_ 1隔膜部 123是朝向第1閥室110側的方式被設在第1平坦閥體122的 第1密封部1 2 1側相反側。實施例，是將第丨平坦閥體1 2 2及 第1隔膜部123 —體形成而形成第1閥機構體丨2〇。在第1隔 膜部123的周圍形成第1隔膜緣部124。第1隔膜緣部124因 爲是被閥室殼體部101及中間殼體部103挾持，所以第1閥 機構體120是被配置於閥室π〇的預定位置。在中間殼體部 103中也形成呼吸路1〇5，被使用於第1隔膜部124的背面側 的空氣的流出入。 第1閥機構體120’是與活塞部131的活塞下部132連接 。在中間殼體部103中形成有活塞部131可滑動的貫通部。 在中間殻體部103的上部的外殼殼體部ι〇2內，收容有活塞 部131及該活塞部131及第1彈簧135。第1彈簧135是透過活 塞部131的活塞頭部133將該活塞部m朝壓下方向推迫。 -24- 201241588 在外殼殼體部102中形成有空氣通口 104，使藉由電動 氣動轉換器8A作出的調壓氣體朝外殼殼體部1〇2內的空氣 室134流入。調壓氣體的流入量，是由計算裝置7A依據對 應流量感測器6A的檢出結果的反饋控制的計算結果來控 制調節電動氣動轉換器8A。且，也會受到作業者所進行 的被控制流體的供給停止或供給再開的控制。在流體供給 量調節裝置5Ε的流量調節閥部10Ε中，也受到藉由計算裝 置7Α所進行的反饋控制藉由將第1閥機構體120進退來進 行的第1平坦閥部122及第1閥座115的距離的調節，是藉著 由電動氣動轉換器8 Α作出的調壓氣體、活塞部131、及第 1彈簧135擔任。在此，實施例的流量調節閥部10E,也是 由調壓氣體、活塞部131、及第1彈簧135構成進退手段130 〇 在壓力控制閥部2 0E中，也在第2閥座175的正下配置 有第2平坦閥體182。在第2平坦閥體182中具備將第2閥座 175可進退自如地密封的第2密封部181，該第2密封部181 也形成平坦狀。在第2平坦閥體182的第2密封部181側相反 側第2隔膜部183是朝向第2閥室170側形成。在實施例中， 第2平坦閥體182及第2隔膜部183也一體形成而形成第2閥 機構體180。在第2隔膜部183的周圍形成有第2隔膜緣部 184。第2隔膜緣部184因爲被閥室殼體部ι〇1及底部外殼殻 體部107挾持’所以第2閥機構體180也被配置於第2閥室 170的預定位置。在實施例將中，第2平坦閥體182雖圖示 爲平坦狀，但不限定於此形態。 -25- 201241588 在底部外殻殼體部107內，形成有收容室176’具備第 2彈簧185及承受該第2彈簧185的推迫力的第2推迫塊體186 。第2推迫塊體186是與第2閥機構體180連接。第2閥機構 體180的第2密封部181，是時常受到彈簧185的推迫力而與 第2閥座175接觸。預定流量的被控制流體是藉由從成爲壓 力控制閥部20E的上流側的流量調節閥部10E的內部流路 部1 7 1被供給，使被控制流體的流體壓力抵抗第2彈簧1 85 的推迫力的話，第2密封部181及第2閥座175的接觸狀態會 被解除。因此，成爲可送通預定的流體壓力的被控制流體 。在底部外殼殼體部107形成有呼吸路108，被使用於第2 隔膜部1 83 (推迫塊體1 86 )的背面側的空氣的流出入。 在流體供給量調節裝置5E中，因爲未採用滾針閥形狀 ，所以與前述同樣，軸偏離的影響被減輕，可以抑制隨著 第1平坦閥體122和第2平坦閥體182的進退動作而發生灰塵 。如實施例的流體供給量調節裝置5E，藉由將具有不同的 功能的流量調節閥部10E及壓力控制閥部20E組合在一個 裝置，就可以抑制裝置本身的容積，減少設置場所。 第6圖的流體供給量調節裝置5F (第5實施例）也是將 安全閥等的壓力控制閥部本身組裝在第2圖等所揭示的流 量調節閥部的內部而形成的裝置。同樣地，可以稱爲將流 量調節閥部及壓力控制閥部組合的複合調節閥部（5 F )。 在第6圖的流體供給量調節裝置5F中，在上部側中形成有 擔任被控制流體的流量調節用的流量調節閥部1 0F。且， 在下部側也形成有可將被控制流體的壓力變動一定地保持 -26- 201241588 用的壓力控制閥部20F。因此，流量調節閥部10F以及壓力 控制閥部20F是採用與前述的流量調節閥部10 E以及壓力控 制閥部20E同樣的構成。因此，對於共通的構造部位使用 同一符號，並省略說明。 在第6圖的流體供給量調節裝置5F中，在前述的第5圖 所揭示的流體供給量調節裝置5E中的進退手段（調壓氣體 、活塞部及第1彈簧），是被變更成爲受到計算裝置7R的 反饋控制而依據馬達控制基板8R被控制的步進馬達1 40的 進退手段13 0L的構成。圖中的步進馬達140中的內部構成 、動作因爲是如前述的第3圖說明，所以對於共通的構造 部位使用同一符號，並省略說明。 第7圖，是部分地顯示將本發明的其他的流體供給量 調節裝置組入的基板處理裝置的槪略圖。在同圖中，被控 制流體，是從供給部9G依：流量感測器6G、壓力控制閥 部20G、流量調節閥部10G的順序流通流體配管3g，在流 體混合部4中依據預定比率純水（溫純水）等混合、調製 ，並被供給至流體配管3。圖示的流體供給量調節裝置5G ，與前述的第1圖的裝置的情況相比，是將流量調節閥部 及壓力控制閥部對調的構成。 與流體配管連接的流量調節閥部和壓力控制閥部的配 置，可對應管路構成柔軟地設定。將被控制流體的壓力變 動由隔膜部承受的情況時，與密封部受到被控制流體的壓 力變動的情況相比，因爲受壓面積較寬，所以會大大地受 到壓力變動的影響，藉此使開度變化。因爲有需要抑制這 -27- 201241588 種開度變化’所以第7圖的流體供給量調節裝置5g的構成 也被考慮。又’計算裝置7G、電動氣動轉換器8g (電動 氣動調節器）的構成、作用是與前述的第1圖的裝置同樣 0 第8圖’是將成爲第7圖的流體供給量調節裝置5(3的 詳細的壓力控制閥部2 0G及流量調節閥部10G揭示的剖面 圖（第6實施例）。在流體供給量調節裝置5G中的流量調 節閥部10G，其第1流路部、第2流路部、閥室、閥座、及 閥機構體等的構成、甚至作用，本質上與前述的流量調節 閥部10A同樣。因此’在共通的部位中附加與第2圖的流 量調節閥部10A相同的符號省略詳細。前述的第3圖的流 量調節閥部10K (第2實施例）也可以適用倣照圖示的流 量調節閥部10G的流路部的方向。 但是，從圖示的裝置配置可知，在第1流路部111中形 成閥座115，其是平坦狀地形成對於流量調節閥部10〇的 閥室1 10將直徑形成lmm以下的閥室開口部1 16。如此，形 成閥座115的第1流路部111，因爲是位於被控制流體從閥 室1 1 〇流出的側，所以爲下流側。被控制流體因爲是通過 第2流路部1 1 2流入閥室1 1 0內，所以在此實施例中第2流路 部Π 2側是成爲流量調節閥部1 0G的上流側。在此，從流 量調節閥部10G的成爲上流側的第2流路部1 12側發生的被 控制流體的壓力變動的影響，會傳到流量調節閥部10G的 與閥室110相面對的隔膜部123，使閥機構體120的隔膜部 1 23受到來自第2流路部Π 2側的被控制流體的壓力變動。 -28- 201241588 與前述同樣地，隔膜部123因爲是由與密封部121相比較寬 的面積受到壓力變動，所以平坦閥體122的密封部121及閥 座1 15的距離會變化，閥座1 15的開度有可能變化。 在此，如流體供給量調節裝置5 G，在流量調節閥部 10G的上流側具備壓力控制閥部20G。壓力控制閥部20G， 具有可將其下流側的被控制流體的流體壓力一定地保持的 功能。第8圖的流體供給量調節裝置5G (第6實施例）， 是將減壓閥等的控制閥適用於與流量調節閥部10G的第1 流路部1 1 1的上流側連接的壓力控制閥部20 G的裝置。 與流量調節閥部1 0 G的上流側連接的壓力控制閥部 20G的構造，是例如日本專利第2671183號、日本專利第 3 3 73 1 44 號（US5983926B)、日本專利第 3276936 號（ US6199582B、 EP1014244B、 DE69921434.3B)等所揭示 的壓力控制閥。壓力控制閥部20 G，主要是由上部殼體部 4〇la、中間殼體部4〇lb、下部殼體部4〇lc組合，且在中間 殼體部401b內形成有流路部402。 被控制流體是從第1流路連接部403朝壓力控制閥部 20G內的第1閥室406流入。在面向第1閥室406的位置配置 有第1隔膜部421。設在第1隔膜部421的周圍的隔膜緣部 423是藉由中間殼體部401b及下部殼體部401c被挾持，使 第1隔膜部421被固定。在第1隔膜部421的背後側形成有第 1加壓室408。在此，第1隔膜部421是受到第1彈簧410的推 迫。符號413是第1加壓室408內的空氣用的呼吸路。 在中間殼體部40 lb的中央部分形成有上下的貫通路， -29- 201241588 在其途中具備閥座405。被控制流體是從第1閥室406經由 閥座405到達第2閥室407。且，從第2流路連接部404流出 。從第8圖的壓力控制閥部20G及流量調節閥部10G的配置 可知，第1流路連接部403是上流側，第2流路連接部404是 下流側。 在面向第2閥室407的位置配置有第2隔膜部422。設在 第2隔膜部422的周圍的隔膜緣部424是藉由上部殼體部 401a及中間殻體部401b被挾持，第2隔膜部422也被固定。 在第2隔膜部422的背後側中形成有第2加壓室409。在此， 第2隔膜部422會受到從給氣通口 412流入第2加壓室409內 且被保持在同第2加壓室內調壓氣體的加壓力。符號41 4是 調壓氣體用的排氣通口。 第1隔膜部421及第2隔膜部422是藉由閥部420被連結 而形成閥機構體C2。閥機構體C2的閥部420及閥座405的 距離（接近、隔離、接觸），是藉由從給氣通口 412朝第2 加壓室4 09內流入的調壓氣體的加壓力被調整。在此實施 例中，可對應流量感測器的檢出流量、設定變更後的流量 ’進行閥部420及閥座405的最適合的開度調節。在壓力控 制閥部20G中’第1隔膜部421雖是受到第1彈簧410的推迫 ’第2隔膜部422雖是受到調壓氣體的加壓力構成，但不限 定於這些，任一的隔膜部，皆可以適宜地選擇由彈簧所產 生的推迫或由彈簧及調壓氣體的雙方所產生的推迫和加壓 〇 對於成爲壓力控制閥部20G的上流側的被控制流體的 -30- 201241588 壓力變動，首先第1隔膜部4 2 1會受到作用。在壓力控制閥 部20G具備第1隔膜部421及第2隔膜部422，因爲兩隔膜部 是彼此被連結，所以第1隔膜部4 2 1也隨著第2隔膜部4 2 2側 的變化與閥部420—起移動。兩隔膜部因爲是各別受到被 控制流體的流體壓力而使閥部420朝雙方均衡的位置移動 ，所以壓力控制閥部20G的閥座405的開度會變化。如此 的話’在壓力控制閥部20G中被控制流體的壓力變動的影 響會被吸收，其結果被配置於壓力控制閥部的下流的流量 調節閥部10G所蒙受的被控制流體的壓力變動的影響可被 抑制。 至此爲止，在圖示詳述的流量調節閥部以及壓力控制 閥部中，在其內部流通的被控制流體因爲主要是藥液所以 腐蝕性較高。因此，如各圖的閥室殼體部的各種的殼體部 、各圖的隔膜部和閥部（閥機構體），是由如耐腐鈾性、 耐藥品性優異的PTFE的各種氟樹脂等形成，並藉由切削 等被加工。 【圖式簡單說明】 [第1圖]將本發明的流體供給量調節裝置組入的基板 處理裝置的槪略圖。 j [第2圖]第1實施例的流體供給量調節裝置的剖面圖。 [第3圖]第2實施例的流體供給量調節裝置的流量調節 閥部的剖面圖。 [第4圖]第3實施例的流體供給量調節裝置的剖面圖。 -31 - 201241588 [第5圖]第4實施例的流體供給量調節裝置的流量調節 閥部的剖面圖。 [第6圖]第5實施例的流體供給量調節裝置的流量調節 閥部的剖面圖。 [第7圖]將本發明的其他的流體供給量調節裝置組入 的基板處理裝置的一部分槪略圖。 [第8圖]第6實施例的流體供給量調節裝置的剖面圖。 【主要元件符號說明】 1 :自旋挾盤 2 :處理液噴嘴 3 :流體配管 3 a，3 b，3 c :流體配管 3 g :流體配管 4 :流體混合部 5A，5B，5C :流體供給量調節裝置 5 D :流體供給量調節裝置 5 E :流體供給量調節裝置 5F :流體供給量調節裝置 5 G :流體供給量調節裝置 6A :流量感測器 6B，6C :流量感測器 6G :流量感測器 7A :計算裝置 -32- 201241588 7B，7C :計算裝置. 7G :計算裝置 7R :計算裝置 8A :電動氣動轉換器 8B，8C:電動氣動轉換器 8G :電動氣動轉換器 8R :馬達控制基板 9 A，9 B，9 C :供給部 9G :供給部 10A，10B，10C :流量調節閥部 10E :流量調節閥部 1 0 F :流量調節閥部 10G :流量調節閥部 10K :流量調節閥部 1 3 :活塞部 1 4 =供給部 1 5 :流體配管 18 :推迫塊體 20A :壓力控制閥部 20B，20C :壓力控制閥部 20D :壓力控制閥部 20E :壓力控制閥部 20F :壓力控制閥部 20G :壓力控制閥部 -33- 201241588 22 :推迫塊體 101 :閥室殻體部 102 :外殼殼體部 103 :中間殼體部 104 :空氣通口 1 0 5 :呼吸路 106 :外殼呼吸路 107 :底部外殼殼體部 1 08 :呼吸路 1 1 0 :閥室 1 1 1 :第1流路部 1 12 :第2流路部 1 13 :第1流路連接部 1 14 :第2流路連接部 1 1 5 :閥座 1 1 6 :閥室開口部 120 :閥機構體 1 2 1 :密封部 1 2 2 :平坦閥體 1 2 3 :隔膜部 124 :隔膜緣部 125 :閥體連接部 1 3 0 :進退手段 130K :進退手段 201241588 130L :進退手段 1 3 1 :活塞部 132 :活塞下部 133 :活塞頭部 134 :空氣室 1 3 5 :彈簧 1 3 6 :彈簧室 1 3 7 : Ο形環 1 4 0 :步進馬達 1 4 1 :轉子 1 4 2 :馬達軸 1 4 3 :內軸螺紋山 144 :定子 1 4 6 :螺栓 1 5 1 :昇降軸 152 :昇降軸溝 1 5 3 :推壓部 1 70 :第2閥室 1 7 1 :內部流路部 172 :第2流路部 175 :第2閥座 1 7 6 :收容室 180 :第2閥機構體 1 8 1 :第2密封部 -35- 201241588 1 82 :第2平坦閥體 183 :第2隔膜部 184 :第2隔膜緣部 1 85 :第2彈簧 186 :第2推迫塊體 201 :閥室殼體部 202 :外殼殼體部 2 1 0 :閥室 2 1 1 :第1流路部 2 1 2 :第2流路部 2 1 3 :第1流路連接部 214:第2流路連接部 215 :閥座 220 :閥機構體 2 2 1 :密封部 2 2 2 :閥體 223 :隔膜部 224 :隔膜緣部 2 2 5 :彈簧 226 :推迫塊體 2 2 7 :呼吸路 228 :收容室 301a :上部殼體部 3 0 1 b :中間殼體部 -36- 201241588 3 0 1 c :下部殼體部 3 02 :流路部 3 03 :第1流路連接部 3 04 :第2流路連接部 3 05 :閥座 3 06 :第1閥室 3 07 :第2閥室 3 08 :第1加壓室 3 09 :第2加壓室 3 1 1 :第2彈簧 3 1 2 :給氣通口 3 2 0 :閥部 321 :第1隔膜部 322 :第2隔膜部 3 23 :隔膜緣部 3 24 :隔膜緣部 401a :上部殼體部 401b :中間殼體部 401c :下部殼體部 402 :流路部 403 :第1流路連接部 404 :第2流路連接部 405 :閥座 406 :第1閥室 201241588 407 :第2閥室 40 8 :第1加壓室 409:第2加壓室 4 1 0 :第1彈簧 4 1 2 :給氣通口 420 :閥部 421 :第1隔膜部 4 2 2 :第2隔膜部 423 :隔膜緣部 424 :隔膜緣部201241588 VI. Description of the invention: TECHNICAL FIELD The present invention relates to a fluid supply amount adjusting device. In particular, there is a fluid supply amount adjusting device used for controlling supply flow rate during mixing of various chemical liquids in a semiconductor manufacturing apparatus. [Prior Art] In the manufacture of semiconductors, etc. When a fluid such as a chemical solution for cleaning and etching a wafer is supplied, The fluid will be required to have a higher degree of cleanliness. In the international semiconductor technology development blueprint (iTRS), the manufacturing of 32nm wiring pitch was officially (true) from 2010. It is scheduled to further narrow the wiring width in the future. Therefore, it is extremely difficult to suppress the intrusion of dust from the flow path of the fluid. It is very important. just now, The main reason for wafer cleaning is to clean it in a single piece. Therefore, it is necessary to supply a very small amount of a chemical solution such as hydrofluoric acid with a correct precision and supply it with pure water and a mixture. In order to make adjustments for such a small traffic domain, For example, a regulating valve such as a needle valve (refer to Patent Document 1 or the like) and other regulating valves (refer to Patent Document 2 and the like) are used. The regulating valve of Patent Document 1 or the like is mainly an upstream position of a mixed portion of a chemical liquid and pure water. It is connected to the supply pipe of each of the chemical liquids (refer to Patent Document 3 and the like). Existing regulating valves for small flow, It has a valve body and a valve seat for adjusting the diaphragm opening. therefore, The fluid in the valve chamber of the regulating valve is subjected to pressure fluctuations occurring on the downstream side of the regulating valve (including the supply of fluid, The impact of supply stop, etc.). The construction of the regulating valve is because the diaphragm is facing the -5- 201241588 valve chamber, Even a slight pressure change, The pressure applied to the diaphragm changes. The position of the valve body connected to the diaphragm also changes. which is, The seat opening will vary. A corresponding method of changing the opening degree of the valve seat caused by such a pressure change, A regulating valve has been proposed, It has a structure in which two diaphragms are disposed facing each other in the valve chamber, and the two diaphragm shaft portions are connected (refer to Patent Document 4). but, In the case of the regulating valve of Patent Document 4, The aforementioned shaft portion in the valve chamber is inserted, Therefore, it is difficult to reduce the valve chamber aperture. Therefore, Not suitable for the adjustment of the small traffic domain. And, Such as the processing of the shaft, Assembly, Shaking of the position during the action, etc. It is also possible to cause the shaft portion to come into contact with the valve chamber hole during operation to generate dust. [Patent Document 1] [Patent Document 1] JP-A-2004-68935 [Patent Document 2] Japanese Patent No. 4365477 (Patent Document 3) Japanese Laid-Open Patent Publication No. 2008-258437 (Patent Document 4) Japanese Laid-Open Patent Publication No. 2007-24069 (Description of the Invention) The present invention is based on the aforementioned problems. Provided that the flow rate adjusting valve portion including the diaphragm can suppress a change in the opening degree of the valve seat in the flow rate adjusting valve portion due to a pressure fluctuation of the fluid to be controlled. And the fluid supply amount adjusting device 0 (a means for solving the problem) which is capable of suppressing the generation of ash -6-201241588 dust and suitable for flow regulation in a small flow field, that is, the invention of the first application of the patent scope, It is a fluid supply amount adjusting device' which is a flow rate adjusting device for adjusting the supply flow rate of the controlled fluid in a minute flow range of 150 mL/min or less. have: The flow regulating valve portion ' is connected to a fluid pipe between the supply portion of the fluid to be controlled and the fluid mixing portion. Perform flow regulation of the controlled fluid; And pressure control valve, Is to suppress the pressure fluctuations occurring in the controlled fluid; And flow sensor, Is provided in the aforementioned fluid piping; And computing device; And the aforementioned computing device, Is a feedback control based on the flow measurement of the aforementioned flow sensor, Its characteristics are: The aforementioned flow regulating valve portion, have: Valve chamber housing part, Formed with: a first flow path portion and a second flow path portion through which the controlled fluid passes, And a valve chamber that connects the first flow path portion and the second flow path portion to allow the controlled fluid to flow; And the valve seat, a valve chamber opening is formed in a flat shape. Further, in the valve chamber casing portion, the first flow path portion has a diameter of 1 mm or less with respect to the valve chamber; And a flat valve body, Providing a sealing portion that can seal the valve seat in a releasable manner and to form the sealing portion in a flat shape; And the valve body, The diaphragm portion is provided on the side opposite to the sealing portion side and is provided on the valve chamber side: And advance and retreat means, The distance between the flat valve portion and the valve seat is adjusted by advancing and retracting the valve mechanism body by feedback control by the computing device. And providing the pressure control valve unit on the second flow path portion side, The pressure change that occurs when the controlled fluid is applied to the diaphragm portion is suppressed. Applying for the invention of the second item of the patent scope, It is a fluid supply amount adjusting device as in the first application of the patent scope, among them, The second flow path portion side is the downstream side of the flow rate adjusting valve portion, The pressure control valve portion is a pressure control valve for constantly maintaining the fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion. Applying for the invention of the third item of the patent scope, It is a fluid supply amount adjusting device as in the first application of the patent scope, among them, The second flow path portion side is a downstream side of the flow rate adjusting valve portion, The pressure control valve portion is a pressure control valve for constantly maintaining the fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion. The pressure control valve portion is formed in the flow rate adjusting valve portion. Applying for the invention of the fourth item of the patent scope, It is a fluid supply amount adjusting device as in the first application of the patent scope, among them, The second flow path portion side is an upstream side of the flow rate adjusting valve portion, The pressure control valve portion is a pressure control valve for constantly maintaining the fluid pressure of the fluid to be controlled on the downstream side of the pressure control valve portion. Applying for the invention of the fifth item of the patent scope, It is a fluid supply amount adjusting device as in the first application of the patent scope, among them, The aforementioned advance and retreat means is to control the pressure-regulating gas by the electro-pneumatic converter using feedback according to the aforementioned computing means. Applying for the invention of the sixth item of the patent scope, It is a fluid supply amount adjusting device as in the first application of the patent scope, among them, The forward/backward means is a stepping device that is controlled by the motor control substrate after being subjected to feedback control by the aforementioned computing device. 201241588 Motor β [Effects of the Invention] The fluid supply amount adjusting device according to the invention of claim 1 is Since it is a fluid supply amount adjusting device, the flow rate adjusting device for adjusting the supply flow rate of the controlled fluid in the minute flow region below 150 m L/mi η, have: The flow rate adjusting valve portion ' is connected to a fluid pipe between the supply portion of the fluid to be controlled and the fluid mixing portion. Perform flow regulation of the controlled fluid; And the pressure control valve portion ' is to suppress a pressure fluctuation occurring in the fluid to be controlled; And flow sensor, Is provided in the aforementioned fluid piping; And computing device; And the foregoing computing device 'is performing feedback control according to the flow rate measurement of the flow sensor, Its characteristics are: The aforementioned flow regulating valve, have: Valve chamber housing part, Formed with: a first flow path portion and a second flow path portion through which the controlled fluid passes, And a valve chamber that connects the first flow path portion and the second flow path portion to allow the controlled fluid to flow: And the valve seat, It has a flat shape and has a valve chamber opening. Further, in the valve chamber casing portion, the first flow path portion has a diameter of 1 mm or less with respect to the valve chamber; And a flat valve body, Providing a sealing portion that can seal the valve seat forward and backward and form the sealing portion in a flat shape; And the valve body, The diaphragm portion is provided on the side opposite to the seal portion side and is provided on the valve chamber side: And advance and retreat means, Adjusting the distance between the flat valve portion and the valve seat by the forward and backward movement of the valve mechanism body by feedback control by the computing device; And providing the pressure control valve unit on the second flow path portion side, Suppressing the pressure fluctuation that occurs when the controlled fluid is applied to the diaphragm portion, Therefore, it is possible to suppress a change in the opening degree of the valve seat in the flow rate adjusting valve portion due to the pressure fluctuation of the fluid to be controlled by the flow regulating valve portion of the 201241588 diaphragm. And, It is possible to suppress the generation of dust from the structure of the valve body as much as possible. It is possible to obtain a fluid supply amount adjusting device suitable for flow regulation in a small flow field and suppressing generation of dust. especially, The fluid supply amount adjusting device of the present invention, Because it is to adjust the supply flow of the controlled fluid in the small flow domain, Therefore, by suppressing the fluctuation of the fluid pressure of the controlled fluid, the flow regulating valve portion is affected. It is possible to ensure the correctness of the supply amount of the control fluid. According to the fluid supply amount adjusting device of the invention of claim 2, Because it is the invention of the first item of the patent application, among them, The second flow path portion side is a downstream side of the flow rate adjusting valve portion, The pressure control valve portion is a pressure control valve for maintaining the fluid pressure of the controlled fluid on the upstream side of the pressure control valve portion. Therefore, it is possible to reduce the influence of the fluctuation of the fluid pressure of the fluid to be controlled which is generated on the downstream side of the flow rate adjusting valve portion of the fluid supply amount adjusting device by the flow rate adjusting valve portion. The fluid supply amount adjusting device according to the invention of claim 3 is the invention of the first aspect of the patent application, among them, The second flow path portion side is a downstream side of the flow rate adjusting valve portion, The pressure control valve portion is a pressure control valve for maintaining the fluid pressure of the controlled fluid on the upstream side of the pressure control valve portion. The pressure control valve portion is formed in the flow regulating valve portion. Therefore, it is possible to reduce the influence of the fluctuation of the fluid pressure of the controlled fluid from the downstream side of the flow rate adjusting valve portion in the fluid supply amount adjusting device by the flow rate adjusting valve portion. further, It is possible to suppress the volume of the device itself and to reduce the installation place. -10- 201241588 The fluid supply amount adjusting device according to the invention of claim 4 is the invention of the first item of the patent application, among them, The second flow path portion side is an upstream side of the flow rate adjusting valve portion, The pressure control valve portion is a pressure control valve for maintaining the fluid pressure of the controlled fluid on the downstream side of the pressure control valve portion. Therefore, it is possible to reduce the influence of the fluctuation of the fluid pressure of the fluid to be controlled which is generated on the upstream side of the flow rate adjusting valve portion of the fluid supply amount adjusting device by the flow rate adjusting valve portion. The fluid supply amount adjusting device according to the invention of claim 5, Because it is the invention of the first item of the patent application, among them, The foregoing means for advancing and retreating is to control the pressure regulating gas by the electropneumatic converter according to the feedback of the aforementioned computing device, Therefore, the power supply to the electropneumatic converter can maintain the state of the valve seat in a safe position if it is stopped. According to the fluid supply amount adjusting device of the invention of claim 6 of the patent application, Because it is the invention of the first item of the patent application, among them, The foregoing advance and retreat means is a stepping motor controlled according to a motor control substrate after being subjected to feedback control of the aforementioned computing device, Therefore, the control of absolute or relative position is easy. And, The adjustment of the opening can be carried out even in the absence of compressed air equipment. [Embodiment] The schematic diagram of Fig. 1 is a single-chip substrate processing apparatus that displays a single wafer W1. The fluid supply amount adjusting device 5A of the present invention, 5B, 5C is mainly incorporated into the disclosed substrate processing apparatus. 晶圆 The wafer W is a rotating disk placed on the spin disk 1. In the upper side of the wafer W -11 - 201241588, the processing liquid nozzle 2 for discharging the processing liquid is provided. The treatment liquid such as the cleaning of the crucible wafer is supplied to the treatment liquid nozzle 2 through the fluid pipe 3. The fluid to be controlled can be exemplified: Hydrofluoric acid, hydrochloric acid, A liquid such as ammonia. In the illustration, the types of the liquid medicine are respectively stored in the supply unit 9A, 9B, 9C, And sequentially flows through the fluid piping 3a, 3b, 3c. Various liquid medicines, After being stored in the supply unit 14 and mixed with pure water (including warm pure water) supplied from the fluid pipe 15 in the fluid mixing unit 4 in accordance with a predetermined ratio, It is supplied to the fluid pipe 3. As shown, A fluid supply amount adjusting device is provided for each of the chemical liquids to be controlled fluids, Used to control the regulation of the flow rate of the drug solution, The supply is stopped or the supply is reopened. In each fluid pipe 3 a, 3 b, The fluid supply adjustment device in 3 c is the same composition, Therefore, only the fluid supply amount adjusting device 5 A is representative. The configuration of the device will be described in order. The fluid supply amount adjusting device 5A is connected to the fluid pipe 3a between the supply portion 9A of the controlled fluid (chemical liquid) and the fluid mixing portion 4. The flow rate adjusting valve portion 10A for adjusting the flow rate of the controlled fluid is connected to the fluid supply amount adjusting device 5A. The pressure control valve portion 20A for suppressing the fluctuation of the fluid pressure generated by the controlled fluid in the fluid pipe 3a is also connected to the same fluid pipe 3a. And, A flow rate sensor 6A (flow meter) for detecting the flow rate of the controlled fluid (chemical liquid) in the fluid pipe 3a is also provided. The detection signal from the flow sensor 6A is passed through the signal line s toward the computing device 7A (PLC: The logic controller that can design the program is sent. In the calculation device 7A, It is a calculation for performing feedback control corresponding to the detection result of the aforementioned flow sensor 6A. The flow rate adjustment of the flow rate adjusting valve portion 10A is performed in accordance with the result of the control calculation of the feedback control. In the flow regulation because of the feedback -12- 201241588 control, Therefore, the reaction speed is fast when the flow is switched. Further accurate and stable flow regulation is possible. In the flow regulating valve portion 10A, etc. When the opening degree of the valve portion is adjusted by a mechanism that is controlled by a pressure-regulating gas (see Fig. 2 and the like), An electropneumatic converter 8A (electropneumatic regulator) for making a pressure regulating gas controlled by the computing device 7A is provided. In the fluid supply amount adjusting devices 5B and 5C, Fluid piping 3b, Flow regulating valve part i〇B in 3c, 10C, Pressure control valve portion 20B, 20C, Flow sensor 6B, 6C configuration, These and computing devices 7B, 7C, Electro-pneumatic converter 8B, The connection of 8C is the same. And, The flow rate adjusting valve portion 10K of Fig. 3 includes a motor control board 8R for making a drive current for each phase of the motor. The same is true in Figure 6. In Figure 1, Symbol 1 1 is a flow sensor in a fluid pipe 15 of pure water (containing warm pure water), 12 is the flow control valve department, 13 is a pressure control valve unit. especially, The fluid supply amount adjusting device 5A' is used at 150 mL/min or less. Further, it is a fine adjustment of the supply flow rate of the controlled fluid (chemical liquid) in the micro flow range of 5 to 20 mL/min. And 'from the 5B shown, Starting at 5C, The fluid supply amount adjusting device disclosed in the following illustrated embodiment is also used for the adjustment of the supply flow rate of the controlled fluid (chemical liquid) in the minute flow range. For the supply flow rate of the controlled fluid in the slightly small flow range. The adjusted fluid supply amount adjusting device 5A (first embodiment) 'The structure of the flow rate adjusting valve portion 10 and the pressure control valve portion 20A in the same device 5A will be described using the cross-sectional view of Fig. 2 . -13- 201241588 Flow regulating valve unit 10A, Mainly by: Valve chamber housing portion 101, And the outer casing portion 102, The three parts of the intermediate casing portion 103 that connect the valve chamber casing portion 1〇1 and the casing casing portion 102 are formed. In the valve chamber housing portion 101, The first flow path portion 111 and the second flow path portion 112 through which the controlled fluid (medicine solution) passes are provided. A valve chamber 110 is also formed which is connected to the first flow path portion 1 1 1 and the second flow path portion 1 12 and allows the controlled fluid to flow. In the flow rate adjusting valve portion 1 〇 A of the fluid supply amount adjusting device 5 A of Fig. 2, The first flow path portion 1 1 1 side is the upstream side (supply portion side), The second flow path portion 1 12 side is the downstream side (fluid mixing portion side). The reference numeral 13 in the figure is the first flow path connecting portion. 11 4 is a second flow path connecting portion. In the valve chamber housing portion 101, The first flow path portion 111 is a valve chamber opening portion 1 16 which is formed to have a diameter of 1 mm (φ 1 mm) or less with respect to the valve chamber 11A. The opening end of the valve chamber 1 1 0 side toward the valve chamber opening portion 1 16 is a valve seat 115 which is formed in a flat shape. A sealing portion 1 21 that can seal the valve seat 115 forward and backward on the valve seat 115 is provided. The sealing portion 1 2 1 is formed into a flat shape, The sealing portion 121 is disposed on the flat valve body 122. The case of a conventional needle valve, Because of the tolerances of the components themselves, The deviation of the shaft during manufacturing and assembly, etc., thus causes the valve body to come into contact with the valve seat side, Seat, The valve body or the like is cut so that the opening amount of the valve seat changes. So there is a problem that it is easy to change with this traffic. At this point, In the relationship between the sealing portion 121 of the flat valve body 122 and the valve seat 115, The effect of the axis deviation is alleviated, As a result, dust can be suppressed from occurring due to the forward and backward movement of the flat valve body 122. The diaphragm portion 1 23 is formed on the side opposite to the seal portion 121 side of the flat valve body 122 so as to face the side of the valve chamber 11. Embodiment, The valve body 120 is formed such that the flat valve body 122 and the -14-201241588 diaphragm portion 123 are integrally formed. Different from the illustration, The flat valve body and the diaphragm portion may be formed of separate parts. A diaphragm edge portion 124 is formed around the diaphragm portion 123. The diaphragm edge portion 124 is held by the valve housing portion 101 and the intermediate housing portion 103, Therefore, the valve mechanism body 120 is disposed at a predetermined position of the valve chamber 110. A breathing path 105 is also formed in the intermediate housing portion 103, The air used for the back side of the diaphragm portion 124 flows in. Valve mechanism body 120, It is connected to the piston lower portion 132 of the piston portion 131 through the valve body connecting portion 125 at the upper portion thereof. As the figure is grasped from the diagram, A through portion in which the piston portion 131 is slidable is formed in the intermediate casing portion 103. In the outer casing portion 102 of the upper portion of the intermediate casing portion 103, The piston portion 131 and the spring 135 are housed. The spring 135 urges the piston portion 131 in the pressing direction through the piston head portion 133 of the piston portion 131. And an air port 104 is formed in the outer casing portion 102, The pressure-regulating gas by the electro-pneumatic converter 8A flows into the air chamber 134 in the outer casing portion 102. The outflow of the pressure regulating gas, It is the calculation means 7A that controls the adjustment electropneumatic converter 8A based on the calculation result of the feedback control of the detection result of the corresponding flow sensor 6A. And, It is also controlled by the operator to stop the supply of the controlled fluid or to supply the reopening. As shown, The space inside the outer casing portion 102 is partitioned into an air chamber 134 and a spring chamber 136 by the piston head portion 133. therefore, If the internal pressure of the air chamber 134 rises, The piston portion 131 and the valve mechanism body 120 connected thereto can be lifted against the biasing force of the spring 135, The distance between the sealing portion 121 of the flat valve body 122 and the valve seat 115 is enlarged to increase the opening degree of the valve seat 115. Conversely, If the internal pressure of the air chamber 134 is lowered, The -15-201241588 spring 135 has a strong pushing force to lower the piston portion 131 and the valve mechanism body 1 2 0 connected thereto. That is, the distance between the sealing portion 1 2 1 of the flat valve body 1 2 2 and the valve seat 1 1 5 is narrowed. The flat valve body 122 will come into contact with the valve seat n5. It is obvious from the illustration and its description that In the flow regulating valve portion 10A, The valve mechanism body 120 is retracted by the feedback control by the computing device 7A to adjust the distance between the flat valve portion 122 and the valve seat 115, It is a pressure regulating gas made by the electric pneumatic converter 8A, Piston portion 131, And the spring 135 served. here, In the flow regulating valve portion 10A of the embodiment, Regulating gas, Piston portion 131, The spring 135 is a forward/backward means 130. When using the forward and reverse drive of the pressure regulating gas, E.g, Even if the power supply to the electropneumatic converter 8 A is stopped and there is no supply of the pressure regulating gas, It is also possible to maintain the state of the valve seat 115 in a safe position. In the piston portion 131, Set with urethane rubber, NBR, HNBR, Rubber, An O-ring 137 formed of a durable material such as fluororesin rubber. therefore, The airtightness of the air chamber 134 is ensured, The forward and backward movement of the piston portion 131 is stabilized. The air in the spring chamber 136 flows in through the outer casing breathing path 106. As the first 2 pictures, The second flow path portion 1 12 side of the flow rate adjusting valve portion 10A is a downstream side. here, The influence of the pressure fluctuation of the fluid to be controlled which is generated on the side of the second flow path portion 1 1 2 on the downstream side of the flow rate adjusting valve portion 1 〇 A, It is transmitted to the valve chamber 110 of the flow regulating valve portion 10A and to the diaphragm portion 123. which is, The diaphragm portion 123 of the valve mechanism body 120 receives a pressure fluctuation of the controlled fluid from the second flow path portion 12 side. Since the diaphragm portion 1 23 is subjected to pressure fluctuation by a relatively wide area from the sealing portion 1 2 1 , Therefore, the distance between the sealing portion 1 2 1 of the flat valve body 1 22 and the valve seat 1 1 5 changes. The opening of the seat 1 1 5 may change -16- 201241588 To correspond to this, In the fluid supply amount adjusting device 5A, In order to suppress the pressure fluctuation of the controlled fluid applied to the diaphragm portion 123 on the second flow path portion 1 1 2 side of the flow rate adjusting valve portion 1 〇 A, The pressure control valve portion 20A is provided. The pressure control valve portion 20A disclosed in Fig. 2, It is a pressure control valve such as a pressure valve. The function of holding the fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion 20A is fixed. In the pressure control valve portion 20A, In the valve chamber housing portion 201, The first flow path portion 211 and the second flow path portion 212 through which the controlled fluid (medicine solution) passes are provided. At the same time, a valve chamber 210 that connects the first flow path portion 211 and the second flow path portion 212 and allows the controlled fluid to flow is formed. Reference numeral 213 in the figure is the first flow path connecting portion. In the second flow path connecting portion 214, the first flow path connecting portion 213 is connected to the second 'flow path connecting portion 114 of the flow rate adjusting valve portion 10. also, The connection form of both parties, The connection method and the like can be appropriately changed. And, The valve chamber housing portion 1A1 of the flow rate adjusting valve portion 10A and the valve chamber housing portion 201 of the pressure control valve portion 20A may be formed of an integrated package. The connection portion between the second flow path portion 212 and the valve chamber 210 is a valve seat 215. A valve body 222 is disposed directly above the valve seat 215. The valve body 222 is provided with a sealing portion 221 that can seal the valve seat 215 in a releasable manner. On the opposite side of the sealing portion 221 side of the valve body 222, The diaphragm portion 223 is formed toward the valve chamber 210 side. The pressure control valve portion 2〇a of the embodiment, The valve body 222 and the diaphragm portion 223 are integrally formed to form a valve mechanism body 22A. Different from the illustration, the flat valve body and the diaphragm portion may be composed of separate components. A diaphragm edge portion 224 is formed around the diaphragm portion 223. The diaphragm edge portion 224 is held by the valve chamber housing portion 101 and the outer casing portion 202 because it is -17-201241588. Therefore, the valve mechanism body 220 is disposed at a predetermined position of the valve chamber 210. In the outer casing portion 202, Forming a containment chamber 22 8 It is provided with a spring 225 and a pushing block 226 that receives the pressing force of the spring 225. The pushing block 226 is coupled to the valve mechanism body 220. usually, a sealing portion 221 of the valve mechanism body 220, It is in contact with the valve seat 215 by the biasing force of the spring 225. The predetermined amount of the controlled fluid is supplied from the flow regulating valve portion 10A on the upstream side of the pressure control valve portion 20A. When the load generated by the fluid pressure of the fluid to be controlled is resisted by the biasing force of the spring 225, The contact state of the sealing portion 221 and the valve seat 215 is released. therefore, It becomes a controlled fluid that can deliver a predetermined fluid pressure. A breathing path 227 is also formed in the outer casing portion 202, The air used for the back side of the diaphragm portion 223 (the pushing block 226) flows in and out. here, In the downstream side of the pressure control valve portion 20 A, If the fluid pressure of the fluid being controlled rises or falls rapidly, The change in fluid pressure, It is transmitted to the valve chamber 210 of the pressure control valve portion 20A and the diaphragm portion 223. Pressed by the spring 225 to force the valve mechanism body 22 0, It can pass through the diaphragm portion 223, The distance between the sealing portion 121 of the valve body 222 and the valve seat 215 is changed. here , Pressure fluctuation on the downstream side of the pressure control valve portion 20A, It is adjusted by controlling the opening degree of the valve seat 215 by the valve mechanism body 220. which is, The flow rate adjusting valve portion 10A is not affected by the pressure fluctuation on the downstream side of the pressure control valve portion 20A. Sectional view of Figure 3, It is a display that can replace the fluid supply amount adjusting device 5A of Fig. 1, 5B, Flow regulating valve section l〇A in 5C, 10B, -18- 201241588 Flow regulating valve unit 10K of 10C (second embodiment). In the flow regulating valve portion 10K of Fig. 3, The first flow path, Second flow path, Valve room, Seat, And the structure of the valve body, etc. Further role, Essentially, it is the same as the above-described flow rate adjusting valve unit 10A. therefore, The same reference numeral as the flow regulating valve portion 10 A of Fig. 2 is added to the common portion. In the flow regulating valve portion 10K, The advancing and retracting means 130K for adjusting the distance between the sealing portion 121 of the flat valve portion 122 and the valve seat 115 by advancing and retracting the valve mechanism body 120, It is a stepping motor 140 that is assembled to feedback control by the computing device 7R and controlled in accordance with the motor control substrate 8R. The illustrated stepping motor 140 is housed above the intermediate casing portion 1〇3. The outer casing portion 102 is covered by the manner in which the cover is made. The stepping motor 140 is fixed to the intermediate casing portion 103 by bolts 146. In the stepping motor 140, have: The stator 144 (electromagnet) on the fixed side and the rotor 141 (permanent magnet) on the rotating side are formed. The rotation of the rotor 141 is performed according to the correct control of the rotation angle. A motor shaft 142 (rotation shaft) having a hollow cylindrical shape is provided inside the rotor 141. The lift shaft 151 is inserted into the motor shaft 142. A lifting shaft groove 152 is formed on a surface of the lifting shaft 151, The lift shaft groove 152 is screwed to the inner shaft threaded mountain 143 formed in the motor shaft 142. A pressing portion 153 is provided at a lower end of the lifting shaft 151. The feedback control signal generated by the computing device 7R is signaled toward the motor control substrate 8R. The pulse is outputted on the same motor control board 8R. here, The rotor 141 in the stepping motor 140 rotates the motor shaft 142 by a predetermined angle as the predetermined angle is rotated. The amount of rotation of the motor shaft 142, It is converted into the amount of movement in the vertical direction of the lift shaft 151 screwed to the motor shaft 142. -19- 201241588 This result, The amount of movement of the pressing portion 153 in the vertical direction changes. Symbol 147 is wiring. When the pressing portion 153 is lowered, Since the spring 135 placed on the upper portion of the piston portion 131 is pressed downward by the pressing portion 153, the piston portion 131 is lowered. here, The sealing portion 121 of the flat valve body 122 of the valve mechanism body 120 connected to the piston portion 131 is brought into contact with each other in proximity to the valve seat 115'. Conversely, When the pressing portion 1 5 3 is raised, the downward pressing force of the pressing portion 153 of the spring 1 3 5 is reduced. Here, the sealing portion 121 of the flat valve body 122 of the valve mechanism body 120 connected to the piston portion 131 is detached from the valve seat 115. In the stepping motor 140, The motor shaft 142 that is coupled to the rotor 141 by the electro-pneumatic signal is rotated. the result, It is also possible to pass through the lifting shaft 151 which is screwed to the motor shaft 142, The pressing portion 153 slightly changes the spring load of the spring 135. In the picture, Symbol 145 is the origin sensor. By using a stepper motor, Make it easy to perform absolute or relative position control, It also becomes a fine adjustment of the spring load. And, The opening can be adjusted even in the absence of compressed air equipment. Fluid supply amount adjusting device 5D of Fig. 4 (third embodiment), In the pressure control valve unit 20D connected to the downstream side of the second flow path portion 112 of the flow rate adjusting valve portion 10A, a pressure control valve such as a negative pressure control valve is applied. a flow regulating valve portion in the fluid supply amount adjusting device 5D, It is also possible to use either 10A or 10K. In the illustration, it is i〇A. The flow regulating valve unit 10 A is constructed, Function, etc. Because it is as illustrated in Figure 2, Therefore, the detailed description is omitted. -20- 201241588 For the construction of the pressure control valve portion 20D, Please refer to Japanese Patent No. 3467438. US6386509B and so on. Pressure control valve portion 20D, Mainly by the upper housing portion 301a, Intermediate housing portion 301b, The lower housing portion 301c is combined, A flow path portion 312 is formed in the intermediate casing portion 301b. The controlled fluid flows from the first flow path connecting portion 3 0 3 to the first valve chamber 306 in the pressure control valve portion 20D. The first diaphragm portion 321 is disposed at a position facing the first valve chamber 306. The diaphragm edge portion 323 provided around the first diaphragm portion 321 is held by the upper housing portion 30 la and the intermediate housing portion 301b. The first diaphragm portion 3 2 1 is fixed. A first force D pressure chamber 308 is formed on the back side of the first diaphragm portion 321. here, The first diaphragm portion 321 is a pressing force that receives a pressure-regulating gas that flows into the first pressurizing chamber 308 from the air supply port 312 and is held in the same first pressurizing chamber. Symbol 314 is an exhaust port for a pressure regulating gas. A vertical through-hole is formed in a central portion of the intermediate casing portion 301b. A valve seat 3 05 is provided on the way. The controlled fluid reaches the second valve chamber 307 from the first valve chamber 306 via the valve seat 305. And, The second flow path connecting portion 304 flows out. As can be seen from the arrangement of the flow rate adjusting valve portion 10A and the pressure control valve portion 20D in Fig. 4, The first flow path connecting portion 303 is the upstream side, The second flow path connecting portion 304 is a downstream side. The second diaphragm portion 322 is disposed at a position facing the second valve chamber 307. The diaphragm edge portion 324 provided around the second diaphragm portion 322 is held by the intermediate housing portion 301b and the lower housing portion 301c. The second diaphragm portion 322 is also fixed. A second pressurizing chamber 309 is formed on the back side of the second diaphragm portion 3 22 . here, The second diaphragm portion 3 22 is urged by the second spring 311. Reference numeral 31 3 is a breathing path for air in the second pressure increasing chamber 3 09, 325 is a holding member. -21 - 201241588 The first diaphragm portion 321 and the second diaphragm portion 322 are coupled by the valve portion 320 to form the valve mechanism body C1. The distance between the valve portion 320 of the valve mechanism body (1) and the valve seat 305 (close, Isolation 'contact', The pressing force of the pressure-regulating gas flowing into the first pressurizing chamber 308 from the air supply port 312 is adjusted. In this embodiment, the detected flow rate corresponding to the flow sensor can be Setting the flow rate after the change 'The most appropriate opening degree adjustment of the valve portion 3 20 and the valve seat 305 is performed. In the pressure control valve portion 20D, the first diaphragm portion 32 is pressurized by the pressure-regulating gas. The second diaphragm portion 322 is biased by the second spring 311. However, these are not limited to any of the diaphragm portions. It is possible to appropriately select the pressing force generated by the spring or the pressing and pressing force generated by both the spring and the pressure regulating gas, and the pressure fluctuation of the controlled fluid which becomes the downstream side of the pressure control valve portion 20D' 2 The diaphragm portion 3 22 is affected. Since the first diaphragm portion 321 and the second diaphragm portion 322 are provided, And connected to each other, Therefore, the first diaphragm portion 32 1 also moves along with the valve portion 306 as the second diaphragm portion 32 22 changes. As a result, the two diaphragm portions are respectively subjected to the fluid pressure of the fluid to be controlled, and the valve portion 320 is moved to a position where both sides are equalized. The opening degree of the valve seat 3 〇 5 of the pressure control valve portion 20D changes. In this case, The influence of the pressure fluctuation of the controlled fluid in the pressure control valve portion 2 〇 D is absorbed, Configured in its results, The pressure fluctuation of the controlled fluid covered by the flow rate adjusting valve portion 10A which is upflowed by the pressure control valve portion is suppressed. Fluid supply amount adjusting device 5E of Fig. 5 (fourth embodiment), The pressure control valve unit itself such as a safety valve is assembled to the inside of the flow rate adjusting valve unit as disclosed in Fig. 2 and the like. which is, It can be called a compound regulating valve unit (5 E ) that combines the flow rate -22- 201241588 regulating valve unit and pressure control valve unit. In the fluid supply amount adjusting device 5E of Fig. 5, A flow rate adjusting valve portion 10E serving as a flow rate adjustment of the controlled fluid is formed on the upper side. And, A pressure control valve portion 20E that can hold the pressure fluctuation of the controlled fluid at a constant level is also formed on the lower side. The flow rate adjusting valve portion 10E and the pressure control valve portion 20E of the fluid supply amount adjusting device 5E, It is possible to directly exchange with the flow rate adjusting valve portion 10A and the pressure control valve portion 20A in the fluid supply amount adjusting device 5A as disclosed in Fig. 2 . Flow regulating valve portion 10E, Since it is essentially the same configuration as the flow regulating valve portion 10A described above, Therefore, the same symbol is used for common construction parts. Fluid supply amount adjusting device (combination regulating valve portion) 5E, have: a flow path for controlling the fluid is formed in the inner valve chamber housing portion 101, And the outer casing portion 102 that can be removably accommodated, such as the advancing and retracting means 130 (the piston portion 131), And an intermediate casing portion 103 that connects the valve chamber casing portion 101 and the casing casing portion 1〇2, further, A bottom outer casing portion 107 is provided directly below the valve chamber casing portion 1'1. In the entirety of the fluid supply amount adjusting device 5E, The first flow path connecting portion 113 is on the upstream side. Let the controlled fluid flow in, The second flow path connecting portion 1 14 is a downstream side, Let the controlled fluid flow out. Formed in the valve chamber housing portion 101 is: The first flow path portion 111 and the second flow path portion 1 72 (control side flow path portion) through which the controlled fluid passes, And the first valve chamber 110 that allows the controlled fluid to flow from the first flow path portion 111, And the second valve chamber 170 that allows the controlled fluid to flow out of the second flow path portion 172. In the valve chamber housing portion 101, The first flow path portion 111 is a valve chamber opening portion 1 16 having a diameter of 1 mm (Φ 1 mm) or less with respect to the first valve chamber -23 - 201241588 1 10 . The opening end of the valve chamber 1 1 on the side of the valve chamber opening portion 1 16 is a valve seat 115 which is formed in a flat shape. Further in the valve chamber housing portion 101, Also formed in: The second valve seat 175 that opens the second flow path portion 172 toward the second valve chamber 170, The internal flow path portion 171 that connects the first valve chamber 110 and the second valve chamber 170. In the configuration of the flow rate adjusting valve portion 10E, The internal flow path portion 171 is a second flow path portion 112 corresponding to the second drawing. And, In the configuration of the pressure control valve portion 20E, The internal flow path portion 171 is the first flow path portion 211 corresponding to Fig. 2 . The first flat valve body 122 is disposed directly above the first valve seat 115. The first flat valve body 122 is provided with a first seal portion 1 2 1 ' in which the first valve seat 115 can be removably sealed, and the first seal portion 1 2 1 is also formed in a flat shape. The first _1 diaphragm portion 123 is provided on the side opposite to the first seal portion 221 side of the first flat valve body 122 so as to face the first valve chamber 110 side. Embodiment, The first flat valve body 1 22 and the first diaphragm portion 123 are integrally formed to form a first valve mechanism body 2丨. The first diaphragm edge portion 124 is formed around the first diaphragm portion 123. The first diaphragm edge portion 124 is held by the valve chamber housing portion 101 and the intermediate housing portion 103. Therefore, the first valve mechanism body 120 is disposed at a predetermined position of the valve chamber π〇. A breathing path 1〇5 is also formed in the intermediate casing portion 103, The air used on the back side of the first diaphragm portion 124 flows in. The first valve mechanism body 120' is connected to the piston lower portion 132 of the piston portion 131. A through portion in which the piston portion 131 is slidable is formed in the intermediate casing portion 103. In the outer casing portion ι 2 of the upper portion of the intermediate casing portion 103, The piston portion 131, the piston portion 131, and the first spring 135 are housed. The first spring 135 urges the piston portion m in the pressing direction through the piston head portion 133 of the piston portion 131. -24- 201241588 An air port 104 is formed in the outer casing portion 102, The pressure-regulating gas by the electro-pneumatic converter 8A flows into the air chamber 134 in the outer casing portion 1A2. The inflow of the pressure regulating gas, The adjustment electropneumatic converter 8A is controlled by the calculation means 7A based on the calculation result of the feedback control corresponding to the detection result of the flow sensor 6A. And, It is also controlled by the operator to stop the supply of the controlled fluid or to supply the reopening. In the flow rate adjusting valve portion 10 of the fluid supply amount adjusting device 5, The feedback control of the calculation device 7 is also performed by adjusting the distance between the first flat valve portion 122 and the first valve seat 115 by advancing and retracting the first valve mechanism body 120. It is a regulated gas made by an electropneumatic converter 8 、 Piston portion 131, And the first spring 135 is used. here, The flow regulating valve portion 10E of the embodiment, Also by regulating gas, Piston portion 131, And the first spring 135 constitutes the advancing and retracting means 130 〇 in the pressure control valve unit 20E, A second flat valve body 182 is also disposed directly below the second valve seat 175. The second flat valve body 182 includes a second seal portion 181 that can seal the second valve seat 175 in a releasable manner. The second sealing portion 181 is also formed in a flat shape. The second diaphragm portion 183 is formed toward the second valve chamber 170 side on the side opposite to the second seal portion 181 side of the second flat valve body 182. In an embodiment, The second flat valve body 182 and the second diaphragm portion 183 are also integrally formed to form the second valve mechanism body 180. A second diaphragm edge portion 184 is formed around the second diaphragm portion 183. Since the second diaphragm edge portion 184 is held by the valve chamber housing portion ι1 and the bottom housing casing portion 107, the second valve mechanism body 180 is also disposed at a predetermined position of the second valve chamber 170. In the embodiment, The second flat valve body 182 is shown as being flat. However, it is not limited to this form. -25- 201241588 in the bottom outer casing portion 107, The storage chamber 176' is formed with a second spring 185 and a second urging block 186 that receives the urging force of the second spring 185. The second pressing block 186 is connected to the second valve mechanism body 180. The second sealing portion 181 of the second valve mechanism body 180, It is always in contact with the second valve seat 175 by the biasing force of the spring 185. The controlled flow rate of the controlled flow is supplied from the internal flow path portion 171 of the flow rate adjusting valve portion 10E which is the upstream side of the pressure control valve portion 20E. When the fluid pressure of the controlled fluid is resisted by the pushing force of the second spring 1 85, The contact state of the second seal portion 181 and the second valve seat 175 is released. therefore, It becomes a controlled fluid that can deliver a predetermined fluid pressure. A breathing path 108 is formed in the bottom outer casing portion 107, The air used for the back side of the second diaphragm portion 1 83 (the pushing block 1 86) flows in. In the fluid supply amount adjusting device 5E, Because the needle valve shape is not used, So as before, The effect of the axis deviation is alleviated, It is possible to suppress dust from occurring as the first flat valve body 122 and the second flat valve body 182 move forward and backward. The fluid supply amount adjusting device 5E as in the embodiment, By combining the flow regulating valve portion 10E and the pressure control valve portion 20E having different functions in one device, It is possible to suppress the volume of the device itself. Reduce the setting place. The fluid supply amount adjusting device 5F of the sixth embodiment (the fifth embodiment) is also a device in which the pressure control valve portion itself such as the safety valve is incorporated in the flow regulating valve portion disclosed in Fig. 2 and the like. Similarly, It may be referred to as a composite regulating valve portion (5 F ) that combines the flow regulating valve portion and the pressure control valve portion. In the fluid supply amount adjusting device 5F of Fig. 6, A flow rate adjusting valve portion 10F serving as a flow rate adjustment of the controlled fluid is formed in the upper side. And, A pressure control valve portion 20F for maintaining the pressure fluctuation of the fluid to be controlled -26-201241588 is also formed on the lower side. therefore, The flow rate adjusting valve portion 10F and the pressure control valve portion 20F have the same configuration as the above-described flow rate adjusting valve portion 10E and pressure control valve portion 20E. therefore, Use the same symbol for common construction parts, The description is omitted. In the fluid supply amount adjusting device 5F of Fig. 6, The advancing and retracting means (regulating gas, Piston part and first spring), It is configured to be changed to the forward/backward means 110L of the stepping motor 140 controlled by the motor control board 8R by the feedback control of the computing device 7R. The internal structure of the stepping motor 140 in the figure, The action is explained as shown in the third figure above. So use the same symbol for common structural parts, The description is omitted. Figure 7, A schematic view of a substrate processing apparatus in which another fluid supply amount adjusting device of the present invention is incorporated is partially shown. In the same picture, Controlled fluid, It is from the supply department 9G: Flow sensor 6G, Pressure control valve 20G, The flow regulating valve unit 10G sequentially flows the fluid pipe 3g, In the fluid mixing section 4, it is mixed according to a predetermined ratio of pure water (warm pure water) or the like. Modulation It is supplied to the fluid piping 3. The illustrated fluid supply amount adjusting device 5G, Compared with the case of the device of Fig. 1 described above, It is a configuration in which the flow regulating valve unit and the pressure control valve unit are reversed. a flow regulating valve portion and a pressure control valve portion connected to the fluid piping, The line configuration can be flexibly set. When the pressure of the fluid to be controlled is changed by the diaphragm portion, Compared with the case where the sealing portion is subjected to the pressure fluctuation of the fluid to be controlled, Because of the wide pressure area, So it will be greatly affected by the pressure changes, Thereby the opening degree is changed. Since it is necessary to suppress the change of the opening degree of the -27-201241588, the configuration of the fluid supply amount adjusting device 5g of Fig. 7 is also considered. Further, the computing device 7G, The structure of the electro-pneumatic converter 8g (electric pneumatic regulator), The function is the same as that of the apparatus of Fig. 1 described above. Fig. 8 is a cross-sectional view showing the fluid supply amount adjusting device 5 of Fig. 7 (the detailed pressure control valve unit 20G and the flow rate adjusting valve unit 10G of Fig. 3). (Sixth embodiment). The flow rate adjusting valve portion 10G in the fluid supply amount adjusting device 5G, Its first flow path, Second flow path, Valve room, Seat, And the structure of the valve body, etc. Even function, Essentially, it is the same as the above-described flow rate adjusting valve portion 10A. Therefore, the same reference numerals are given to the common portion of the flow rate adjusting valve portion 10A of Fig. 2, and the details are omitted. The flow rate adjusting valve portion 10K (second embodiment) of Fig. 3 described above can also be applied to the direction of the flow path portion of the flow rate adjusting valve portion 10G as shown. but, As can be seen from the device configuration shown, The valve seat 115 is formed in the first flow path portion 111, It is formed in a flat shape to form a valve chamber opening portion 1 16 having a diameter of 1 mm or less for the valve chamber 110 of the flow rate adjusting valve portion 10A. in this way, Forming the first flow path portion 111 of the valve seat 115, Because it is located on the side of the controlled fluid flowing out of the valve chamber 1 1 , So for the downstream side. The controlled fluid flows into the valve chamber 1 1 0 through the second flow path portion 1 1 2, Therefore, in this embodiment, the second flow path portion 2 side is the upstream side of the flow rate adjusting valve portion 10G. here, The influence of the pressure fluctuation of the controlled fluid generated on the side of the second flow path portion 1 12 on the upstream side of the flow rate adjusting valve portion 10G, It is transmitted to the diaphragm portion 123 of the flow regulating valve portion 10G facing the valve chamber 110, The diaphragm portion 213 of the valve mechanism body 120 is subjected to pressure fluctuation of the controlled fluid from the second flow path portion Π 2 side. -28- 201241588 As in the previous section, Since the diaphragm portion 123 is subjected to pressure fluctuation by a relatively wide area from the sealing portion 121, Therefore, the distance between the sealing portion 121 of the flat valve body 122 and the valve seat 1 15 changes. The opening of the valve seat 1 15 may vary. here, Such as the fluid supply amount adjusting device 5 G, The pressure control valve portion 20G is provided on the upstream side of the flow rate adjusting valve portion 10G. Pressure control valve unit 20G, It has a function of holding the fluid pressure of the fluid to be controlled on the downstream side thereof constant. Fluid supply amount adjusting device 5G of Fig. 8 (sixth embodiment), A control valve such as a pressure reducing valve is applied to the pressure control valve portion 20G that is connected to the upstream side of the first flow path portion 1 1 1 of the flow rate adjusting valve portion 10G. The structure of the pressure control valve portion 20G connected to the upstream side of the flow regulating valve portion 10 G, For example, Japanese Patent No. 2671831, Japanese Patent No. 3 3 73 1 44 (US5983926B), Japanese Patent No. 3276936 (US6199582B, EP1014244B, DE69921434. 3B) The pressure control valve disclosed in the above. The pressure control valve portion 20G is mainly composed of an upper casing portion 4〇1a, an intermediate casing portion 4〇1b, and a lower casing portion 4〇lc, and a flow path portion 402 is formed in the intermediate casing portion 401b. The controlled fluid flows from the first flow path connecting portion 403 toward the first valve chamber 406 in the pressure control valve portion 20G. The first diaphragm portion 421 is disposed at a position facing the first valve chamber 406. The diaphragm edge portion 423 provided around the first diaphragm portion 421 is held by the intermediate housing portion 401b and the lower housing portion 401c, and the first diaphragm portion 421 is fixed. A first pressurizing chamber 408 is formed on the back side of the first diaphragm portion 421. Here, the first diaphragm portion 421 is pushed by the first spring 410. Reference numeral 413 is a breathing path for air in the first pressurizing chamber 408. A vertical through-hole is formed in a central portion of the intermediate casing portion 40 lb, and -29-201241588 includes a valve seat 405 in the middle thereof. The controlled fluid reaches the second valve chamber 407 from the first valve chamber 406 via the valve seat 405. Further, the second flow path connecting portion 404 flows out. It is understood from the arrangement of the pressure control valve portion 20G and the flow rate adjusting valve portion 10G in Fig. 8 that the first flow path connecting portion 403 is the upstream side and the second flow path connecting portion 404 is the downstream side. The second diaphragm portion 422 is disposed at a position facing the second valve chamber 407. The diaphragm edge portion 424 provided around the second diaphragm portion 422 is held by the upper casing portion 401a and the intermediate casing portion 401b, and the second diaphragm portion 422 is also fixed. A second pressurizing chamber 409 is formed in the back side of the second diaphragm portion 422. Here, the second diaphragm portion 422 receives a pressing force that flows into the second pressurizing chamber 409 from the air supply port 412 and is held in the same pressure chamber as the second pressurized chamber. Reference numeral 41 4 is an exhaust port for a pressure regulating gas. The first diaphragm portion 421 and the second diaphragm portion 422 are connected to each other by the valve portion 420 to form the valve mechanism body C2. The distance (proximity, isolation, and contact) between the valve portion 420 of the valve mechanism body C2 and the valve seat 405 is adjusted by the pressure applied from the air supply port 412 to the pressure regulating gas flowing into the second pressurizing chamber 4 09. . In this embodiment, the optimum opening degree adjustment of the valve portion 420 and the valve seat 405 can be performed in accordance with the detected flow rate of the flow rate sensor and the flow rate after the setting change. In the pressure control valve portion 20G, the first diaphragm portion 421 is urged by the first spring 410. The second diaphragm portion 422 is configured to be pressurized by a pressure-regulating gas, but is not limited thereto. For the portion, the pressing force generated by the spring or the pushing and pressing force generated by both the spring and the regulating gas can be appropriately selected for the controlled fluid which becomes the upstream side of the pressure control valve portion 20G. 201241588 Pressure fluctuation, first the first diaphragm portion 4 2 1 will be affected. In the pressure control valve portion 20G, the first diaphragm portion 421 and the second diaphragm portion 422 are provided, and since the two diaphragm portions are connected to each other, the first diaphragm portion 4 2 1 also changes with the second diaphragm portion 4 2 2 side. The valve portion 420 moves up. Since the two diaphragm portions are moved by the fluid pressure of the fluid to be controlled and the valve portion 420 is moved to the both sides, the opening degree of the valve seat 405 of the pressure control valve portion 20G changes. In this case, the influence of the pressure fluctuation of the controlled fluid in the pressure control valve unit 20G is absorbed, and as a result, the pressure fluctuation of the fluid to be controlled which is disposed in the downstream flow rate adjusting valve unit 10G of the pressure control valve unit is affected. Can be suppressed. Up to this point, in the flow rate adjusting valve portion and the pressure control valve portion which are described in detail, the controlled fluid flowing inside is highly corrosive because it is mainly a chemical liquid. Therefore, the various casing portions of the valve chamber casing portion of each of the drawings, the diaphragm portion and the valve portion (valve mechanism body) of each of the drawings are various fluororesins of PTFE such as uranium-resistant and chemical-resistant. It is formed and processed by cutting or the like. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] A schematic diagram of a substrate processing apparatus in which a fluid supply amount adjusting device of the present invention is incorporated. j [Fig. 2] A cross-sectional view of the fluid supply amount adjusting device of the first embodiment. [Fig. 3] A cross-sectional view of a flow rate adjusting valve portion of the fluid supply amount adjusting device of the second embodiment. Fig. 4 is a cross-sectional view showing the fluid supply amount adjusting device of the third embodiment. -31 - 201241588 [Fig. 5] A cross-sectional view of a flow rate adjusting valve portion of the fluid supply amount adjusting device of the fourth embodiment. [Fig. 6] A cross-sectional view of a flow rate adjusting valve portion of the fluid supply amount adjusting device of the fifth embodiment. [Fig. 7] A schematic partial view of a substrate processing apparatus in which another fluid supply amount adjusting device of the present invention is incorporated. Fig. 8 is a cross-sectional view showing a fluid supply amount adjusting device of a sixth embodiment. [Description of main component symbols] 1 : Spin disk 2 : Process liquid nozzle 3 : Fluid pipe 3 a, 3 b, 3 c : Fluid pipe 3 g : Fluid pipe 4 : Fluid mixing section 5A, 5B, 5C : Fluid supply Volume adjustment device 5 D : Fluid supply amount adjustment device 5 E : Fluid supply amount adjustment device 5F : Fluid supply amount adjustment device 5 G : Fluid supply amount adjustment device 6A : Flow sensor 6B, 6C : Flow sensor 6G: Flow sensor 7A: computing device -32- 201241588 7B, 7C: computing device. 7G: calculation device 7R: calculation device 8A: electropneumatic converter 8B, 8C: electropneumatic converter 8G: electropneumatic converter 8R: motor control substrate 9 A, 9 B, 9 C: supply portion 9G: supply portion 10A, 10B, 10C : flow rate adjusting valve unit 10E : flow rate adjusting valve unit 1 0 F : flow rate adjusting valve unit 10G : flow rate adjusting valve unit 10K : flow rate adjusting valve unit 1 3 : piston unit 1 4 = supply unit 1 5 : fluid piping 18 : Pushing block 20A: Pressure control valve portion 20B, 20C: Pressure control valve portion 20D: Pressure control valve portion 20E: Pressure control valve portion 20F: Pressure control valve portion 20G: Pressure control valve portion - 33 - 201241588 22 : Push Forced block 101: valve chamber housing portion 102: housing housing portion 103: intermediate housing portion 104: air port 1 0 5 : breathing path 106: housing breathing path 107: bottom housing housing portion 1 08 : breathing path 1 1 0 : valve chamber 1 1 1 : first flow path portion 1 12 : second flow path portion 1 13 : first flow path connecting portion 1 14 : second flow path connecting portion 1 1 5 : valve seat 1 1 6 : valve chamber opening portion 120 : valve mechanism body 1 2 1 : sealing portion 1 2 2 : flat valve body 1 2 3 : diaphragm portion 124 : diaphragm edge portion 125 : valve body connecting portion 1 3 0 : advancing and retracting means 13 0K: Advance and retreat means 201241588 130L: Advance and retreat means 1 3 1 : Piston part 132: Piston lower part 133: Piston head 134: Air chamber 1 3 5 : Spring 1 3 6 : Spring chamber 1 3 7 : Cylinder ring 1 4 0 : Stepping motor 1 4 1 : rotor 1 4 2 : motor shaft 1 4 3 : inner shaft threaded mountain 144 : stator 1 4 6 : bolt 1 5 1 : lifting shaft 152 : lifting shaft groove 1 5 3 : pressing portion 1 70 : 2nd valve chamber 1 7 1 : Internal flow path portion 172 : Second flow path portion 175 : Second valve seat 1 7 6 : Storage chamber 180 : Second valve mechanism body 1 8 1 : Second sealing portion - 35 - 201241588 1 82 : Second flat valve body 183 : Second diaphragm portion 184 : Second diaphragm edge portion 1 85 : Second spring 186 : Second pressing block 201 : Valve chamber housing portion 202 : Housing case portion 2 1 0 : valve chamber 2 1 1 : first flow path portion 2 1 2 : second flow path portion 2 1 3 : first flow path connecting portion 214 : second flow path connecting portion 215 : valve seat 220 : valve mechanism body 2 2 1 : sealing portion 2 2 2 : valve body 223 : diaphragm portion 224 : diaphragm edge portion 2 2 5 : spring 226 : pushing block 2 2 7 : breathing path 228 : receiving chamber 301 a : upper housing portion 3 0 1 b : intermediate case portion -36- 201241588 3 0 1 c : lower case portion 3 02 : flow path portion 3 03 : first flow path connection 3 04 : second flow path connecting portion 3 05 : valve seat 3 06 : first valve chamber 3 07 : second valve chamber 3 08 : first pressurizing chamber 3 09 : second pressurizing chamber 3 1 1 : 2nd Spring 3 1 2 : air supply port 3 2 0 : valve portion 321 : first diaphragm portion 322 : second diaphragm portion 3 23 : diaphragm edge portion 3 24 : diaphragm edge portion 401 a : upper case portion 401 b : intermediate case 401c: lower casing portion 402: flow path portion 403: first flow path connecting portion 404: second flow path connecting portion 405: valve seat 406: first valve chamber 201241588 407: second valve chamber 40 8 : first Pressurizing chamber 409: second pressurizing chamber 4 1 0 : first spring 4 1 2 : air supply port 420 : valve portion 421 : first diaphragm portion 4 2 2 : second diaphragm portion 423 : diaphragm edge portion 424 : Diaphragm edge