TW201235298A - Fine mesoporous silica particles, method for producing fine mesoporous silica particles and molded article containing fine mesoporous silica particles - Google Patents

Fine mesoporous silica particles, method for producing fine mesoporous silica particles and molded article containing fine mesoporous silica particles Download PDF

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Publication number
TW201235298A
TW201235298A TW100149783A TW100149783A TW201235298A TW 201235298 A TW201235298 A TW 201235298A TW 100149783 A TW100149783 A TW 100149783A TW 100149783 A TW100149783 A TW 100149783A TW 201235298 A TW201235298 A TW 201235298A
Authority
TW
Taiwan
Prior art keywords
particles
mesoporous
cerium oxide
surfactant
dioxide
Prior art date
Application number
TW100149783A
Other languages
English (en)
Chinese (zh)
Inventor
Ayumu Fukuoka
Hiroki Yabe
Tatsuya Okubo
Atsushi Shimojima
Hirotaka Ishii
Original Assignee
Panasonic Corp
Univ Tokyo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Univ Tokyo filed Critical Panasonic Corp
Publication of TW201235298A publication Critical patent/TW201235298A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/10—Encapsulated ingredients
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
TW100149783A 2011-02-21 2011-12-30 Fine mesoporous silica particles, method for producing fine mesoporous silica particles and molded article containing fine mesoporous silica particles TW201235298A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011035160A JP5706712B2 (ja) 2011-02-21 2011-02-21 メソポーラスシリカ微粒子、メソポーラスシリカ微粒子の製造方法、及びメソポーラスシリカ微粒子含有成型物

Publications (1)

Publication Number Publication Date
TW201235298A true TW201235298A (en) 2012-09-01

Family

ID=46720436

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100149783A TW201235298A (en) 2011-02-21 2011-12-30 Fine mesoporous silica particles, method for producing fine mesoporous silica particles and molded article containing fine mesoporous silica particles

Country Status (6)

Country Link
US (1) US20130267629A1 (https=)
JP (1) JP5706712B2 (https=)
CN (1) CN103298740B (https=)
DE (1) DE112011104931T5 (https=)
TW (1) TW201235298A (https=)
WO (1) WO2012114636A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10189954B2 (en) * 2013-08-16 2019-01-29 Kimmerling Holdings Group, Llc Synthesis of antimicrobial silsesquioxane-silica hybrids
DE102013113486B4 (de) 2013-12-04 2022-03-17 Pictiva Displays International Limited Organisches Licht emittierendes Bauelement
JP6357051B2 (ja) * 2014-08-21 2018-07-11 学校法人早稲田大学 無孔質シリカで被覆されたメソポーラスシリカ粒子及びその製造方法
WO2017141821A1 (ja) 2016-02-19 2017-08-24 国立大学法人東北大学 コアシェル型多孔質シリカ粒子の製造方法
US10434496B2 (en) 2016-03-29 2019-10-08 Agilent Technologies, Inc. Superficially porous particles with dual pore structure and methods for making the same
WO2019240294A1 (ja) 2018-06-15 2019-12-19 国立大学法人東北大学 コアシェル型多孔質シリカ粒子の製造方法
CN112585089B (zh) 2018-08-28 2023-06-20 国立大学法人东北大学 核壳型多孔质二氧化硅粒子的制造方法
CN116750771A (zh) * 2023-07-07 2023-09-15 安徽晨光新材料有限公司 一种单分散中空二氧化硅微球的制备方法及应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4046921B2 (ja) 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
JP2004083307A (ja) 2002-08-23 2004-03-18 Sumitomo Osaka Cement Co Ltd シリカ微粒子と低屈折率膜形成用塗料、及び低屈折率膜とその製造方法、並びに反射防止膜
JP2007161518A (ja) 2005-12-13 2007-06-28 Sumitomo Osaka Cement Co Ltd 低誘電率フィラーと、これを用いた低誘電率組成物および低誘電率膜
JP5179115B2 (ja) 2007-08-10 2013-04-10 パナソニック株式会社 低屈折率被膜形成用樹脂組成物、低屈折率被膜、反射防止基材
JP2009040965A (ja) 2007-08-10 2009-02-26 Panasonic Electric Works Co Ltd 低誘電率被膜形成用樹脂組成物、低誘電率被膜、低誘電率被膜の製造方法
JP2009040966A (ja) 2007-08-10 2009-02-26 Panasonic Electric Works Co Ltd 低熱伝導率被膜形成用樹脂組成物、低熱伝導率被膜、低熱伝導率被膜の製造方法
JP5021395B2 (ja) * 2007-08-24 2012-09-05 花王株式会社 複合シリカ粒子
JP5426869B2 (ja) * 2008-11-19 2014-02-26 パナソニック株式会社 メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物
CN101514001B (zh) * 2009-03-10 2012-05-30 中国科学院上海硅酸盐研究所 一种棒状有序介孔二氧化硅纳米材料及其制备方法

Also Published As

Publication number Publication date
JP2012171833A (ja) 2012-09-10
WO2012114636A1 (ja) 2012-08-30
JP5706712B2 (ja) 2015-04-22
CN103298740B (zh) 2015-07-29
CN103298740A (zh) 2013-09-11
DE112011104931T5 (de) 2013-11-21
US20130267629A1 (en) 2013-10-10

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