TW201231430A - Conductive paste and solar battery cell using said conductive paste - Google Patents

Conductive paste and solar battery cell using said conductive paste Download PDF

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TW201231430A
TW201231430A TW101100208A TW101100208A TW201231430A TW 201231430 A TW201231430 A TW 201231430A TW 101100208 A TW101100208 A TW 101100208A TW 101100208 A TW101100208 A TW 101100208A TW 201231430 A TW201231430 A TW 201231430A
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conductive paste
glass
solar cell
layer
softening point
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TWI422547B (zh
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Kouji Tominaga
Jun Hamada
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Central Glass Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/16Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
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  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Sustainable Energy (AREA)
  • Glass Compositions (AREA)
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Description

201231430 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種可用作形成於矽半導體太陽電池中之 電極的不含錯之導電性膏。 【先前技術】 作為使用半導體矽基板之電子零件,已知有圖1所示之 太陽電池元件。如圖1所示’太陽電池元件係於厚度為2〇〇 μιη左右之p型半導體矽基板丨之受光面側形成η型半導體石夕 層2’且於受光面側表面形成有用以提昇受光效率之氮化 矽膜等防反射獏3’進而於該防反射臈3上形成有與半導體 連接之表面電極4。 又’於ρ型半導體矽基板1之背側均勻地形成有鋁電極層 5。該鋁電極層5—般而言藉由使用網版印刷等塗佈鋁膏材 料,且於600〜900°C左右之溫度下短時間煅燒而形成,上 述铭膏材料矽含有包含鋁粉末、玻璃料、乙基纖維素或丙 烯酸系樹脂等黏合劑之有機媒劑。 於該銘膏材料之锻燒中,藉由銘擴散至P型半導體石夕基 板1,而於鋁電極層5與ρ型半導體矽基板丨之間,形成稱作 BSF(Back Surface Field,背面電場)層6之以_八丨共晶層,進 而形成鋁擴散之雜質層p+層7。該p+層7係發揮抑制因pn接 面之光電動勢效應而生成之載子之復合造成之損失之效 果,從而有助於太陽電池元件之轉換效率提昇。關於該 BSF效果,揭示有例如專利文獻!或專利文獻2等所揭示, 作為包含於鋁膏材料中之玻璃料,可藉由使用含鉛之玻璃 161407.doc 201231430 而獲得較高之效果。 先前技術文獻 專利文獻 專利文獻1:曰本專利特開2007-59380號公報 專利文獻2:曰本專利特開2003-165744號公報 【發明内容】 發明所欲解決之問題 一般而言,p +層之表面電阻與BSF效果存在相關性,p + 層之表面電阻越低BSF效果越高,且作為太陽電池元件之 轉換效率越高。 上述含船成分之玻璃料可藉由使用於如鋁膏材料之導電 性膏中而獲得較高之BSF效果,進而於使上述導電性膏成 為低溶點之方面為重要之成分’但對人體或環境會造成較 大危害。上述專利文獻1及專利文獻2存在於導電性膏中包 含鉛成分之問題。 因此,本發明之目的在於獲得一種可用作形成於矽半導 體太陽電池之電極之不含船之導電性膏。 解決問題之技術手段 本發明之導電性膏之特徵在於:其係使用半導體矽基板 之太陽電池用導電性膏’且該導電性f中所含之玻璃料之 組成實質上不含鉛成分,且以質量%計包含5〜15之“〇2、 20〜40之82〇3、〇〜1〇之_3、3()〜45之211〇、5〜觀奶(選 自由Mg〇、Ca0、Sr〇 '及Ba〇所組成之群中之至少i種之 合計)、及(M〜6之R2〇(選自由Li2〇、、及K2〇所組成 161407.doc 201231430 之群中之至少1種之合計)。 於利用使用含鉛玻璃料之導電性膏情形時,由於p+層之 表面電阻呈現20〜3 0 Ω/□左右,故使用本發明之導電性膏 時之P +層之表面電阻較佳為30 Ω/□下。該表面電阻越 低’則用作太陽電池元件之情形時,轉換效率越高。 於本發明中’可藉由使玻璃料中含有之r2〇量增加,而 使P+層之表面電阻變為低於30 Ω/□值,但於包含超過6質 量%之該R2〇情形時,由於存在因該尺…之鹼性成分變多而 呈現潮解性之情形,故於本發明中使該心〇為6質量%以 下。 又,本發明之上述玻璃料之特徵在於:3〇<>c〜3〇〇„c下之 熱膨脹係數為(55〜85)x1(r7/t,且軟化點為55(rc以上 65(TC以下。又,於本發明中,上述熱膨脹係數係指線性 膨脹係數》 發明之效果 可藉由本發明,而獲得包含不含鉛之玻璃料之導電性 。可藉由將本發明之導電性f用作太陽電池元件,而獲 膏 得較向之BSF效果。又,可猫^曰也,杜 双禾又了獲彳讀半導㈣基板良好之密 接性。進而,由於實質上不句冬 匕3起成分,故不會對人體或 環境造成危害。 【實施方式】 本發明之導電性膏係不僅句人人+ 尔不僅包含含有鋁粉末與乙基纖維素 或丙烯酸系樹脂等黏合劑之有機 ’賤嫖劑’而且包含玻璃料, 且該玻璃料實質上不含鉛成分,曰丨、,麻β 取η 且以質量%計包含5〜15之 I61407.doc 201231430
Si02、20〜40之 B2〇3、0〜10之 a1203、30〜45之 Zn〇、5〜30之 R〇(選自由MgO、CaO、SrO、及BaO所組成之群中之至少 1種之合計)、及0.1〜6之尺2〇(選自由Li20、Na2〇、及尺2〇所 組成之群中之至少1種之合計)。 於本發明之玻璃料中,Si〇2為玻璃形成成分,且可藉由 使其與作為其他之玻璃形成成分之B2〇3共存而形成穩定之 玻璃’並使其含有5〜15%(質量%,以下亦相同卜若超過 1 5°/。’則玻璃之軟化點上升,難以用作導電性膏。更佳為 7〜13%之範圍。 B2〇3係玻璃形成成分,且使玻璃熔融變得容易,抑制玻 璃之熱膨脹係數之過度上升,且於鍛燒時對玻璃賦予流動 性,使玻璃之介電係數降低,且使其於玻璃中含有 20〜40%。若未達20%,則會因玻璃之流動性變得不充分而 損及燒結性,另一方面若超過40❶/。,則玻璃之穩定性下 降。又,更佳為25〜35%之範圍。
AhO3係抑制玻璃結晶化之成分。使其於玻璃中含有 〇〜10% ’但若超過10%,則會導致玻璃之軟化點上升,難 以用作導電性膏。
ZnO係使玻璃之軟化點降低之成分,且使其於玻璃中含 有3 0〜4 5 %。若未達3 0 %則無法發揮上述作用,若超過4 5 % 則玻璃變得不穩定,易產生結晶。又,更佳為35〜42%之 範圍。 R〇(選自由MgO、CaO、SrO、及BaO所組成之群中之至 少1種之合計)係使玻璃之軟化點降低者,且使其於玻璃中 161407.doc 201231430 含有5〜30% ^若未達5%則玻璃之軟化點之下降變得不充 分,使燒結性受損《另一方面,若超過3〇%則存在玻璃之 熱膨脹係數變得過高之情形。更佳為】〇〜27%之範圍内。 1〇(選自由LhO、Na2〇、及κ:2〇所組成之群中之至少j 種之合計)係使玻璃之軟化點降低,將熱膨脹係數調整於 適當範圍者,並使其包含於範圍内。若未達〇 1% 則玻璃之軟化點之下降變得不充分,使燒結性受損。另一 方面,若超過6%則存在導致熱膨脹係數過度地上升之情 形。更佳為2〜6%之範圍。再者,較佳為至少包含κ2〇作為 R>2〇 〇 其他亦可添加由普通之氧化物表示之Cu〇、Ti〇2、
In203、Bi203、Sn02、及 Te〇2等。 可藉由實質上不含鉛(以下亦存在記載為pb〇之情形), 而消除對人體或環境造成之影響。此處,所謂實質上不包 含PbO係指Pb0作為雜質混入至玻璃原料中之程度的量。 例如,若為低熔點玻璃中之〇.3%以下之範圍,則上述之危 害、即對人體、環境之料、以及對絕緣特性等造成之影 響幾乎不存在’從而實質上不會受到pb〇之影響。 可藉由使用上述玻璃料,而獲得3Gt〜3⑽。c下之熱膨服 係數為(55〜80)x urYc且軟化點為55〇t以上65〇。〇以下之 導電性膏。若熱膨脹係數偏離(55〜85)xl0_7/t>c,則於電極 形成時會產生剝離、基板之翹曲等問題。較佳為(60〜75> …/。。之範圍❶又’若軟化點超過峨^锻燒時未充 分地流動,故而會產生與半導體石夕基板之密接性變差等問 161407.doc 201231430 題。較佳為上述軟化點為58〇°C以上63〇t以下。 本發明之導電性膏可以上述方式用於太陽電池元件。 又,進而該導電性膏可以低溫煅燒,故亦可用作使用銀或 鋁等之配線圖案之形成材料或各種電極等電子材料用基 板。 實施例 以下’基於實施例進行說明。 (導電性膏) 首先,玻璃料末係以達到實施例中記載之特定組成之方 式,將各種無機原料秤量後進行混合,製作原料配料。將 該原料配料投入至鉑坩堝,於電加熱爐内以1〇〇〇〜13〇〇t: 加熱熔融1〜2小時,獲得表}之實施例卜5、表2之比較例 1〜4所示組成之玻璃》使玻璃之一部分流入模具中,成為 塊狀,供熱物性(熱膨脹係數、軟化點)測定用。利用驟冷 雙輥成形機,使剩餘之玻璃成為薄片狀,並使用粉碎裝 置,整粒為平均粒徑丨〜4 μιη、最大粒徑未達1〇 之粉末 狀。 再者’上述軟化點係使用熱分析裝置TG-DTA(Rigaku股 伤有限公司製造)進行測定。又,上述熱膨脹係數係使用 熱膨服什’根據以5°C /分鐘進行升溫時30〜300。(:下之伸長 量求出線性膨脹係數。 繼而’以特定比例將作為黏合劑之乙基纖維素與上述玻 璃叙、又作為導電性粉末之鋁粉末混合於包含α松脂醇與 丁基卡必醇醋酸酯之膏油中,製備黏度為500±50泊左右之 161407.doc 201231430 導電性膏。 其"人’準備Ρ型半導 述製作Μ# 板且對其上部網版印刷上 a取作之導電性膏 0 使該等试驗片於140C之烘箱内乾燥 刀鐘,繼而,伸用 電爐於800 C條件下進行1分鐘煅燒, 獲得於p型丰t 夕基板1上形成有鋁電極層5與BSF層6之 構造。 繼之,為分析鋁電極層5之與p型半導體矽基板〗之密接 性’而將背膠牽條(NICHIBAN公司製造)黏貼於銘電極層 5 ’以目視觀察評價剝離時鋁電極層5之剝落狀態。 其後,將形成有鋁電極層5之?型半導體矽基板丨浸潰於 氫氧化鈉水溶液中,藉由蝕刻鋁電極層5及BSF層ό而使p + 層7露出於表面,利用4探針式表面電阻測定器測定ρ+層7 之表面電阻。 (結果) 無紹低熔點玻璃組成及各試驗結果示於表中。 [表1] 實施例 1 2 3 4 5 玻璃組成(wt%) Si02 7.3 9.2 8.5 10.0 8.5 B2〇3 27.9 30.2 28.0 32.9 26.8 Ab〇3 1.2 ZnO 35.6 38.4 37.6 41.8 32.7 MgO 3.4 CaO 4.7 10.1 SrO 2.1 BaO 20.2 12.7 23.6 23.4 Li20 0.3 1.0 Na20 1.2 K20 4.4 4.8 1.9 4.0 5.5 161407.doc • 9- 201231430 熱膨脹係數(xl(T7/°C) 75 70 67 60 8? 軟化點ΓΟ 600 598 605 618 S80 P+層表面電阻值(Ω/口 20 18 26 17 14 接著強度 1 A A A A A [表2] 比較例 1 2 3 4 玻璃組成(wt%) Si02 12.4 4.6 8.5 4.0 B2O3 31.2 38.9 31.2 32.3 AI2O3 1.0 ZnO 45.5 37.3 32.8 38.9 MgO CaO 22.3 SrO BaO 6.5 6.0 Li20 ~~~1 Na20 1 6.4 7.5 3.8 K20 4.5 4.2 5 7 ις 〇 熱膨脹係數(xl(T7/°C) 78 86 85 X ^ *\J 軟化點(°c) 545 534 58〇 P+層表面電阻值(Ω/口 40 45 38 接著強度 B A c • 再者,於表1及2之接著強度之攔中,A表示接著強度良 好’ B表示接著強度尚且良好’ c表示接著強度不充分。 如表1中之實施例1〜5所示,於本發明之組成範圍内,軟 化點為550°C〜650。(:,且具有較佳之熱膨脹係數(55〜85)χ HT7厂C,與ρ型半導體矽基板1之密接性亦良好。進而,與 太陽電池元件之轉換效率相關之^層7之電阻值亦達到26 Ω/□下,可用作矽半導體太陽電池用導電性膏。 另一方面’偏離本發明之組成範圍之表2中之比較例1〜4 無法獲得與Ρ型半導體矽基板1良好之密接性,且p+層7之 161407.doc •10· 201231430 電阻值高,或者溶解後玻璃呈現潮解性等,而無法應用作 矽半導體太陽電池用導電性膏。 【圖式簡單說明】 圖1係普通之矽半導體太陽電池組電池之概略剖面圖。 【主要元件符號說明】 1 P型半導體矽基板 2 η型半導體矽層 3 防反射膜 4 表面電極 5 鋁電極層 6 BSF 層 7 Ρ+層 161407.doc

Claims (1)

  1. 201231430 七、申請專利範圍· 1. 一種導電性膏,其特徵在於:其係使用半導體矽基板之 太陽電池用f電性膏,且該導電性膏中所含之玻璃料之 組成實質上不包含船成分,且以質量%計包含: . 5〜15之 Si〇2、 20〜40之B2〇3 、 0〜10之 AI2O3、 30〜45之ZnO、 5~30之RO(選自由MgO、CaO、SrO、及BaO所組成之 群中之至少1種之合計)、及 0.1〜6之R20(選自由Li2〇、Na2〇、及κ2〇所組成之群中 之至少1種之合計)。 2. 如請求項1之導電性膏,其中上述玻璃料係3(rc〜3〇〇力 下之熱膨脹係數為(55〜85)χ1〇-7/°(:,且軟化點為550。(:以 上650°C以下。 3. 一種太陽電池元件’其特徵在於使用如請求項1或2之導 電性膏。 4. 一種電子材料用基板,其特徵在於使用如請求項1或2之 導電性膏。 161407.doc
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