TW201220168A - Touch panel and conductive sheet - Google Patents

Abstract

The present invention provides a touch panel which can have a low-resistance conductive pattern on a substrate and can exhibit an improved visibility, and which is capable of preventing occurrence of moire. In the present invention, as viewed from above, in a first conductive part (16A) and a second conductive part (16B), first conductive patterns (18A) and second conductive patterns (18B) are in cross configuration. The first conductive part (16A) and the second conductive part (16B) are arranged so as to be shifted from each other from a reference position at least along a third direction by a distance ranging from a half of the shorter one of the line widths of a first auxiliary wire (36A) and a second auxiliary wire (36B) to 100 μ m wherein the third direction (m direction) bisects the angle between a first direction (x direction) and a second direction (y direction), and a fourth direction is perpendicular to the third direction.

Description

201220168 37739pif VI. Description of the Invention: [Technical Field] The present invention relates to a touch panel and a conductive sheet, and relates to a touch panel and a conductive panel which are preferably used for, for example, a projected electrostatic capacitance type touch panel. sheet. [Prior Art] In general, a capacitive touch panel is a position input device that detects a change in electrostatic capacitance between a fingertip and a conductive film of a person and detects a position of a fingertip as a capacitive method. The touch panel has a surface type touch panel and a projection type touch panel. The surface type touch panel has a simple structure, but it cannot detect 2 or more points (multitouch, multi-touch) at the same time. On the other hand, the projection type touch panel is configured such that a plurality of electrodes are arranged in a matrix as in a pixel configuration of a liquid crystal display device. More specifically, the projection type touch panel is a plurality of electrodes arranged in a vertical direction in series. The plurality of connected first electrode groups are arranged in the horizontal direction and the plurality of second electrode groups connected in series in the horizontal direction are arranged in the vertical direction, and the plurality of first electrode groups and the plurality of second The electrode group sequentially detects the change in capacitance, thereby detecting multi-touch. As a prior art of the above-described projection type capacitive touch panel, for example, a touch switch described in the specification of International Publication No. 2010/013679 can be cited. The touch switch is mounted on the front surface of the display and includes: a substrate; a plurality of first electrodes formed on one side of the substrate and arranged at a fixed interval; and a plurality of second electrodes formed on the other side of the substrate a fixed interval #column, which is formed in a lattice shape together with the plurality of 4 201220168 37739pif first electrodes, and the first electrode is formed into a mesh shape by a plurality of wires; the second electrode is divided into 1 wire in a direction relative to The black moment barrier of the display is oblique. Further, on the above-mentioned surface, there is a line formed between the first electrodes:: line auxiliary: the other surface has a wire formed by the first auxiliary wire formed between the first and second wires, and the first electrode The auxiliary line, the wire of the second electrode, and the second lion line (4) are equally spaced apart from each other, and the first electrode, the first auxiliary line, or both of the first electrode formed on the surface of the substrate The wire of the second electrode formed on the other surface of the substrate, the second auxiliary wire, or both of them are formed in a line shape. In addition, when the first electrode and the first auxiliary layer are formed on one surface of the substrate, and the second electrode and the second auxiliary line are formed on the other surface of the substrate, manufacturing variations (uneven film formation) may occur. When the lattice shape becomes uneven, and the 畲 offset is about 1/2 of the length of the first auxiliary line or the second auxiliary line, the first electrode is straight along, for example, the first direction (or the second direction), And subdividing with a straight line portion of the second electrode along the first direction, or a first auxiliary line extending along the first direction and a straight portion of the second electrode along the first direction. Conversely, a straight portion of the second electrode along, for example, the first direction (or the second direction) is overlapped with the first portion of the first electrode in the first direction or a second auxiliary line extending along the second direction It overlaps with a straight line of the first electrode along the first direction. As a result, the width of the portion where the straight portions overlap each other becomes large (the line becomes thick), thereby causing a problem that the position of the first electrode or the second electrode is conspicuous and the visibility is poor. 201220168 37739pif SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object thereof is to provide a touch panel which can realize low resistance of a conductive pattern formed on a substrate and also improve visibility It is also possible to cope with, for example, a large size of a projection type capacitive touch panel, and it is possible to suppress generation of moiré. Further, another object of the present invention is to provide a conductive sheet which can achieve low resistance of a conductive pattern formed on a substrate, and can also improve visibility, and is used for, for example, a projected electrostatic capacitance type touch. The panel is preferred. [1] The touch panel of the first aspect of the present invention is a touch panel having a conductive sheet, wherein the conductive sheet comprises: a base; a first conductive portion formed on a main surface of the base; and The second conductive portion is formed on the other main surface of the substrate, and the first conductive portion includes two or two or more first conductive ugly and first auxiliary patterns, and the first conductive patterns extend respectively And arranging in a second direction orthogonal to the first _ direction, comprising a plurality of lattices, the first lion pattern comprising a plurality of first auxiliary lines fresh in the periphery of each of the first conductive patterns, wherein the second driving y includes 2 Or two or more second conductive patterns and a second auxiliary pattern 'grasping-conducting patterns respectively extending in the second direction, and having a plurality of lattices along the plurality, the second auxiliary pattern comprising a plurality of a second auxiliary line, in a plan view, in which the first electro-optic portion is formed in a configuration in which the first conductive pattern is arranged in the first conductive pattern of the first conductive pattern, and the s 6 201220168 37739 pif - direction is halved, the above The direction of the two directions is set to the third direction. When the direction orthogonal to the third direction is the fourth direction, the line width of the first auxiliary line and the line width of the second auxiliary line are shifted from at least the reference position to the third direction. It is disposed 1/2 or more of the line width and 1 〇〇哗 or 1 〇〇 μηη or less. [1] In the first aspect of the invention, the first conductive portion and the second conductive portion are disposed offset by 50 (four) or 50 μm or less. [3] In the present invention, the first conductive portion and the second conductive portion are disposed offset by 3 〇 μη or 3 μmη or less. [4] The invention of the present invention is characterized in that the reference position indicates that the first axis of the first auxiliary line coincides with the second axis of the second auxiliary line, and the first auxiliary line and the second auxiliary line are not And overlapping positions of the first auxiliary line and one end of the second auxiliary line. The invention of the present invention is characterized in that a combination pattern of the first auxiliary pattern and the first auxiliary pattern is formed between the first conductive pattern and the first conductive pattern, and the combined pattern has the above The first auxiliary line is orthogonal to the second auxiliary line described above and does not have a shape of 4. [6] The present invention is characterized in that, in the combination pattern, the first axis of the upper-first auxiliary line and the second axis of the second auxiliary line are the first axis and the second axis The distance between the line width of the first auxiliary line and the line width of the second auxiliary line is 1/2 or 1/2 or more.瓦见T任孕乂第第: The invention is characterized in that the distance between the above-mentioned first axis and the above two axes is the line width of the above __ line and the second aid of 201220168 37739pif The total of 1/2 of the line width of the line. According to a first aspect of the invention, a distance between the first axis and the line is less than a total of 1/2 of a line width of the first auxiliary line and a line width of the second auxiliary line. The present invention is characterized in that the combination pattern has a form in which the first auxiliary line and the second auxiliary line partially overlap each other. [1] The present invention is characterized in that the distance between the first axis and the upper line is longer than the line width of the first auxiliary line, and the line width of the first auxiliary line is 1/2. total. [11] In the first invention, characterized in that two or more first large lattice early, eight μ, +ι conductive patterns g ^ first-direction are connected in series, and t-shirts ίίί patterns are composed of two or two The plurality of second large lattices are connected in series along the Jth:: series to form 'the first large lattice and each upper': the first is composed of a combination of two or more small lattices, and the first large lattice is described. The first auxiliary pattern that is connected to the first large lattice is formed around the side of the side, and the second auxiliary surface that is not connected to the second large lattice is formed in the above-mentioned side. In the present day and the circumstance, the first-spot-first conductive portion is arranged to be offset by 1/2 or "2 or less of the arrangement pitch of the small lattice. The invention of the invention is characterized in that the length of one side of the small lattice is 50 μm to 500 μm. [4] In the first invention, wherein the length of the first large lattice and the second 8 201220168 37739pif large lattice is 3 mm to 10 mm « the conductive portion and the second [15] in the first invention, The wire width of the first conductive portion is 1 μm to 3 〇μηηβ. The device according to the present invention is characterized in that: the base body and the first conductive portion are formed on one main surface and the electric portion of the base body. Formed on the other main surface of the substrate, and the first portion includes two or more „_ conductive patterns and a first auxiliary pattern, and the second conductive patterns respectively extend along the first direction, and along Arranging in a second direction orthogonal to the first direction, comprising a plurality of grids, wherein the first auxiliary pattern comprises a plurality of first auxiliary lines arranged around each of the first conductive patterns (four), and the second conductive portion comprises two or two Each of the second conductive patterns and the second auxiliary patterns respectively extending in the second direction and arranged along the first direction to include a plurality of lattices, the second auxiliary patterns comprising the second conductive patterns Multiple around the pattern a second auxiliary line, wherein the first conductive portion and the second conductive portion are formed such that the first conductive pattern and the first conductive pattern intersect with each other, and the first direction and the first portion are halved When the direction of the two directions is the third direction and the direction orthogonal to the third direction is the fourth direction, the line width of the first auxiliary line and the second auxiliary are shifted from the reference position to the third direction at least Any one of the line widths of the lines is U2 or 1/2 or more and 1〇〇μηη4 1〇〇μηη or less. As described above, the touch panel according to the present invention can be formed on The conductive pattern on the substrate has a low resistance and can also improve the visibility. It can also cope with, for example, a large-size touch panel of a projection type electrostatic capacitance type, and can suppress the generation of moiré. The conductive sheet according to the present invention can achieve low resistance of the conductive pattern formed on the substrate, and can also improve visibility, and is preferably used for, for example, a projection type capacitive touch panel. The above-described objects, features, and advantages will become more apparent from the following description of the preferred embodiments of the accompanying drawings. FIG. 1 to FIG. The embodiment of the capacitive touch panel will be described. In the present specification, the "~" of the numerical range is used to include the numerical values described before and after the lower limit and the upper limit. The laminated electrically conductive sheet 1 according to the present embodiment is formed by laminating the first conductive sheet 12A and the second conductive sheet 12B as shown in Figs. 1 and 2 . As shown in Figs. 1 and 3, the first conductive sheet 12A includes a first conductive portion 16 formed on one main surface of the first transparent substrate 14A (see Fig. 2A). The first conductive portion 16A includes: two or more first conductive patterns 18A extending in a first direction (x direction) and arranged in a second direction (y direction) intersecting the first direction, including A plurality of lattices; and a first auxiliary pattern 20A are arranged around the periphery of each of the first conductive patterns 18A. The first conductive pattern 18A is formed by connecting two or more first-large grids 24a / σ in the first direction in series, and each of the first large grids is composed of two or more small grids 26 combined. Further, around the side of the first large 24A, a first auxiliary pattern 20A which is non-described in the first large lattice 24 is formed. The upper part of the money 201220168 j / /jypif is formed between the adjacent first-large grid 24, and the first connecting portion 28A is formed to electrically connect the first large lattice. When the direction of the second direction and the direction of the two directions is the third direction, and the third direction is set to the fourth direction (n direction), the first connecting portion 28A is in the fourth direction. There are 0 (n is a real number greater than i) and a medium lattice % of the size of 6 small cells. The first defect portion 32A having one side of the defect 26 is formed in a portion of the disk of the first-large lattice phoenix == positive (four) side adjacent to the middle lattice 3G. Here, the small lattice % ^ is the smallest square shape, and the middle dice 3 〇 has the size of the three small lattices 26 arranged in the fourth direction. The first insulating portion 34A is provided with insulating properties between the adjacent first conductive patterns 18A. Here, the first auxiliary _ 2GA includes: along the first large grid 24A (the plurality of first auxiliary lines 36A arranged in the direction orthogonal to the square) is in the axial direction; along the first large lattice In the middle of the ^ ^ ^ 四 四 正 正 正 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ l 2 characters of the word -

_ configured in opposite directions. The length of the axial direction of the case 38A has a small lattice % open; Further, each of the first-auxiliary lines 36Aj is located in the position of "the length of one-half of the inner circumference of the predetermined distance 26 from the 4-large lattice 24A", and is in the above manner. As shown in FIG. 1, the first conductive sheet 12A is formed in the shape of the opening pattern 18A of the first large lattice 24A on the one end side of 201220168 3//3ypif. The end of the first large lattice which is present on the end side of each of the first terminals - 4GA^ is electrically connected to the first external wiring 42A via the first braid 40A. On the other hand, the second conductive sheet 12B includes a main surface guide::?, which is reported in the second transparent substrate 14B (refer to FIG. 2A) as shown in FIGS. 1 and 4, and the conductive portion 16B includes: 2 or 2 The above = 1 ^ knife extends in the second direction (y direction) and is arranged in the 2nd direction), and includes a plurality of lattices; and the second auxiliary pattern Β is arranged in the periphery of each of the second conductive patterns 18Β^ The second conductive pattern 18Β is composed of two or more second large lattices 2 connected in series in one direction, and each of the second large lattices 24β is composed of a combination of 2 24 Β and small lattice %. Further, in the second large lattice, the first auxiliary pattern 20B which is disconnected from the second large lattice 2 is formed. A second connecting portion 28B electrically connected to the second π flute-4B is formed between the second large lattice 24B of the large grid. The second connecting portion 28B is configured by arranging (10) (n is a real number greater than i) small lattice % 2 small square lattice 3G in the second direction. In the second large lattice 24B and the third; the portion of the square where the square is 3 _ _, the shaft has a second defect portion 32b which is short of one side of the small grid 卞6. A second insulating portion 34]B electrically insulating is disposed between the adjacent second guides 1 and 18B. The second auxiliary pattern 2GB includes: a plurality of second auxiliary lines arranged along the side of the second large lattice and 12 sides of the 12 201220168 37739pif; the four directions are considered to be the axial direction); Multiple @边中. Third-party start ^ first - auxiliary line 36B (set the third direction 36 = ^ and two insulation Zou Di +, two second auxiliary line to match two: two - two (four) pattern - mutual + + > thin line 36B The length in the axial direction has a length of 1/2 of a small grid of 6 Γ 1 side. Further, each second auxiliary line 36B = ^ 24B is a fine unicorn (the money is a small lattice 26 > „ inner week! The position of the second conductive sheet 12B of each of the sides described in FIG. 1 is present at the open end of the second end of the second second conductive pattern 18B as shown in FIG. The second connection portion 28B is formed in a shape in which the second connection portion 28B is not present. The end portion of the second large lattice 24B on the other end side of the case 18B is electrically connected to the second external wiring 42B via the first electrode 40B. The length of one side of the first large lattice 24A and the second large lattice 24B is preferably 3 mm to 1 mm, more preferably 4 mm to 6 mn^, if the length of one side does not reach the above lower limit, the detection is performed. The electrostatic capacitance of the first large lattice 24A and the second large lattice 24B is reduced, so that the possibility of detection failure is improved. On the other hand, if the upper limit value is exceeded, There is a concern that the position detection accuracy is lowered. From the same viewpoint, the length of one side of the small lattice 26 constituting the first large lattice 24A and the second large lattice 24B is preferably 50 μm or more, more preferably 50 μm to 500 μηι. Further, it is preferably 150 μm to 300 μm. When the small lattice 26 is in the above range, transparency can be further ensured, and when the front surface of the display device is mounted on 13 201220168 377iypif, it can be visually displayed without discomfort. The line width of the first conductive pattern 18A (the first large lattice 24A and the middle lattice 3〇) and the line width of the second conductive pattern 18B (the second large lattice 24B and the lattice 30) are 1 μm to 30 μm, respectively. The line widths of the first auxiliary patterns 20 Α (the first auxiliary line 36 Α) and the second auxiliary pattern 20 Β (the second auxiliary line 36 Β) are respectively 1 μm to 3 μm μη. In this case, the first conductive pattern 18 may be the same as the first conductive pattern 18 The line width or the line width of the second conductive pattern 18A is the same or different, but it is preferable that the line widths of the first conductive pattern 18Α, the second conductive pattern 18Β, the first auxiliary pattern 20Α, and the second auxiliary pattern 20Β are the same. And 'when When the first conductive sheet 12A is formed by laminating the first conductive sheet 12A on the second conductive sheet 12, as shown in FIG. 5, the first conductive pattern 18A and the second conductive pattern 18 are arranged in an intersecting manner, specifically In other words, the first connecting portion 28 of the first conductive pattern 18A and the second connecting portion 28 of the second conductive pattern 18Β align the first transparent substrate 14Α (refer to FIG. 2Α) in the middle, and the first conductive portion The 16-inch first insulating portion 34A and the second insulating portion 34'' of the second conductive portion (10) are opposed to each other with the 14th pinch therebetween. When the moon-shaped substrate is in a plan view of the first conductive sheet 12Α and the second conductive sheet 12Β, it is formed as a first-large lattice 24Α formed on the first conductive sheet 12Α: a second conductive layer The second and second grids 24 of the 12 Β sheet are formed into a large lattice. At this time, a combination pattern 44 which is opposed to the first auxiliary pattern 〆 and the auxiliary pattern 20B is formed between the first large lattices 24B. 201220168 37739pif = The pattern 44 has a form in which the first auxiliary 4 steals and the second auxiliary line are aligned without overlapping. The Ί pattern 排列 is arranged along the side of the first large lattice 24A. The first combined pattern of the starting auxiliary line 3 6A and the side along the second large lattice 24B is as shown in FIGS. 6A to 6C, and the first auxiliary

The St axis 46A is parallel to the second axis 46B j2 of the second auxiliary line 36B, and the distance between the first axis 46A and the second axis 46B is the line width Wa and the second of the first auxiliary line 36A. Any of the line widths Wb of the auxiliary ^6B is 1/2 or ι/2 or more of the shorter line width and is 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattice %). Here, the arrangement pitch of the small lattice % is substantially the same as the length of one side of the small lattice 26. Figure 6 shows the case where the distance between the first axis stealing and the second axis lake is less than the sum of the line width w_i/2 of the first auxiliary line 36Α and the line width ^ of the second auxiliary line 36β. In this case, the first auxiliary line 36A and the auxiliary line 36' are partially overlapped. Tunu indicates that the distance between the line 46Α and the second axis 46Β of the first vehicle is the sum of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width of the second auxiliary line 36b. Happening. Fig. 6C shows a case where the distance ha between the first axis stealing and the second axis 46B is longer than the total of the line width ι/2 of the first auxiliary line 36a and the line width Wb of the second auxiliary line 36B. Each of the second auxiliary line 36A of the two first L-shaped patterns 38A of the first insulating portion 34A and the second auxiliary one of the two second first one-shaped patterns 38B of the second insulating portion The combined pattern of the line 36B, 15 201220168 37739pif f has a pattern of four B-shaped patterns (the first-L-shaped pattern 38A, the --L-shaped pattern 38A, the second L-shaped pattern 38B, and the second L-shaped pattern 38B The form of the small lattice 26 is formed. That is, as shown in Fig. 7, the following forms are obtained: two first [character patterns are located near the sin-second [the position of the word pattern 38b, and the other second one-character pattern 38B is located from the second-[ The shape of the word pattern 38b and the two first L-shaped patterns 38A are separated. The second axis of the second auxiliary line 36B of the second auxiliary line 36B constituting the second L-shaped pattern 38B in the second ^-shaped pattern 38B and the two first-shaped pattern marks 38B 46B. The first axis of the first auxiliary line 36A, which is the first auxiliary line 36A of the two first auxiliary lines 36A sprinkled in the shape of the first pattern, is substantially parallel, and the first axis 46A and the second axis 46B are substantially parallel. The distance ha between the line width wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B is 1/2 or 1/2 or more of any shorter line width, and is 1 〇〇 μιη or 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26). Similarly, the second axis 46Β of the other second auxiliary line 36Β of the two second auxiliary lines 36Β constituting the second L-shaped pattern 38Β and the two first frames constituting the other first L-shaped pattern 38Α The first axis 46 of one of the auxiliary lines 36A is substantially parallel, and the distance ha between the first axis 46A and the second axis 46A becomes the line width Wa of the first auxiliary line 36A and The line width Wb of the first auxiliary line 36B is 1/2 or more and 1/2 or more of any shorter line width, and is 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26). Further, the positional relationship between the second L-shaped pattern 38A and the second auxiliary line 201220168 37739pif 36B and the first auxiliary line 36A among the two first L-shaped patterns 38A is the same as that of Figs. 6A to 6c. That is, the first conductive portion 16A and the second conductive portion 16B are shifted from the reference position by at least the line width of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B at least in the second direction. The width is 1/2 & 1/2 or more and 100 μm or 1 μm or less (or 1/2 or less of the arrangement pitch of the small lattice %). In particular, in the third embodiment, in the third direction and the fourth direction, only the line width of the first auxiliary line 36Α and the line width Wb of the second auxiliary line 36B are shifted by 1/2 or 1/2 or more and 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26) are arranged. Here, as shown in FIG. 8, the reference position is that the first axis line Α of the first auxiliary line pass coincides with the second axis line Β of the second auxiliary line 36Β, and the first auxiliary line 36Α and the second auxiliary line 36Β In the laminated conductive sheet 1〇 according to the present embodiment, as shown in FIG. 5, the first auxiliary grid 36Α and the first auxiliary grid 36Α do not overlap each other. A combination pattern 44 of the first auxiliary pattern 20Α and the second auxiliary pattern is disposed between the two large lattices 24β, so that there is no space between the first large lattice 24Α or the second large lattice 24β (the width is equivalent, the lattice is 26(4) becomes conspicuous. The boundary with the second large lattice 24Β is not the same, and the Τ combination pattern 44 becomes the first auxiliary line 36Α having a length of 1/2 along the side of the small lattice _ inner circumference. The second auxiliary 17 201220168 3773ypif The form of the large weight f' The length of the overlapping portion is very short compared to the length of the first large lattice 24A, and the length (four) or 1/20? The 36B partially overlapping lion line 36A and the second auxiliary line of the length of each side of 24B =:==:r- The second two = the 妓 of the overlapping portion is very short compared to the length of the t-th mm, which is again = not large: significant, from a first-bias j 4 Α and a second large lattice 24 Β In the side, the auxiliary 蝮A/A or the second auxiliary line overlaps orthogonally, but since the first fiscal direction (fourth degree) is small along, the first connection is therefore almost insignificant. However, -^"8λΤ+ ;; 6 Chuan Xing - the connection part 28 Β 谂Μ〇 的 的 中 中 正交 正交 正交 正交 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 The number of the lattices 26 is relatively small (about 5% or so), so that the unevenness of the small lattices 26 is hardly significant. Moreover, the first large lattices 24A and the second large lattices 24B are formed adjacent to the intermediate lattices 3 Since the first defect portion 32A and the second cutout portion 32B of the () are not overlapped with the straight portion of the straight portion of the first large lattice 24A or the second large lattice 2, the visibility is hardly observed. In the case where the laminated conductive sheet 10 is used as a touch panel, the first conductive layer is used. A protective layer is formed on 12A, and the first external wiring 42A from the plurality of first conductive patterns 18A$ of the first conductive sheet 12A and the second external wiring derived from the plurality of second conductive patterns 18B of the second conductive sheet 12B are formed. 42B is connected to, for example, an ic (integrated circuit) circuit for controlling scanning. In this case, it is preferable that the laminated conductive sheet 1 is offset from the outer peripheral region of the display surface of the liquid crystal display device (edge) In a manner in which the area of the region is extremely small, the connection portions of the first conductive pattern 18A and the first external wiring 42A are linearly arranged, and the connection portions of the second conductive pattern 18B and the second external wiring 42B are connected. The form is arranged in a straight line. The electrostatic capacitance between the first conductive pattern 18A and the second conductive pattern 18B opposed to the fingertip is changed by bringing the fingertip into contact with the protective layer. The 1C circuit detects the amount of change 'and calculates the position of the fingertip based on the amount of change. This operation is performed between the respective first conductive patterns 18A/second conductive patterns 18B. Therefore, even if the fingertip is in contact with two or more positions at the same time, the position of each fingertip can be detected. 19 201220168. j / /^vpif In the case of the laminated conductive sheet 10, in the case where the laminated conductive sheet 10 is applied to, for example, a projection type capacitive touch panel, the surface of the laminated conductive sheet 10 The resistance is small, so that the response speed can be increased, and the size of the touch panel can be promoted. Further, even if the first conductive portion 16A and the second conductive portion 16B are disposed offset, the boundary between the first large lattice 24A of the first conductive sheet 12A and the second large lattice 24B of the first conductive sheet 12B becomes as described above. It is not significant, and the defects such as thickening of the line are not locally generated, and the overall visibility is good. Further, the arrangement of the plurality of regular small lattices 26 formed by the first large lattice 24A and the second large lattice 24B adjacent to each other and the first auxiliary formed between the first large lattice 24A and the second large lattice 24B The arrangement in which the line 36A and the second auxiliary line 36B are arranged in an offset manner and which is different from the arrangement of the small lattice % is mixed, whereby a plurality of spatial frequencies are mixed, and as a result, the liquid crystal display device can be suppressed. The interference of the pixel arrangement can effectively reduce the generation of moiré. μ In the laminated conductive sheet 10, the shape of the small lattice 26 is a positive shape, and may be a polygonal shape. Further, in addition to the side (four) shape being a straight line shape, the shape of one side may be a curved shape. In the case of being formed in an arc shape, for example, the opposing 2 is an arc shape that protrudes outward, and the other two sides of the opposite direction are slanted in an arc shape. Further, the shape of each side may be a wave shape in which the arc of the side and the arc which protrudes inward are continuous. The shape of each side is set to the positive (four) line. ^# In the above-described first conductive sheet 12A and second conductive sheet UB, the structure of the first connecting portion 28A and the second connecting portion 28B of the second connecting portion 28A and the second connecting portion 28B can be set to be equivalent to 3 In addition to the size of the small lattices 26, ... is equivalent to 1.5, 2, and 2.5 small lattices 26, and the size is long. ^=', and if the t-grid 30 is too large, it is difficult to arrange the first large lattice 2 from Or the first: large ^ 24B, the change in the electrostatic capacitance of the intersection portion that cannot be detected becomes large, and the maximum is equivalent to the size of the five small lattices 26 . The number of the sub-% (the length of one phase or the length of the ride), or the number of the small lattices 26 constituting the first large grid 24A, and the number of the small lattices 26 constituting the first large grid 24B can be determined according to the meaning The size or resolution (number of wirings) of the touch panel is appropriately set. In the laminated conductive sheet, as shown in FIG. 1 and FIG. 2, the first conductive portion 1 is formed on the main surface of the transparent substrate HA, and the second conductive portion 16 is formed on the main surface of the transparent substrate 14A. In addition, as shown in FIG. 2A, the first conductive portion 16Α is formed on one main surface of the first transparent substrate Α, and the other main surface of the first transparent substrate 14Α is formed as the second conductive portion 16Β. In addition, there may be no other layers between the first conductive sheet Μ and the second conductive sheet 12 ,. If the first conductive pattern 18 and the first conductive pattern 18 绝缘 are insulated, they may also be aligned. . Next, a method of manufacturing the first conductive sheet 12A and the second conductive sheet 12A will be described. In the case of producing the first conductive layer 1212 and the second conductive sheet 12A, for example, a photosensitive material having an emulsion layer containing photosensitive silver can be exposed on the first transparent substrate 14A and the second transparent substrate 14A. The developing portion is formed so that the metal silver portion is formed in the exposed portion and the light is transmitted through the unexposed portion to form the first conductive portion 16A and the second conductive portion 16B. Further, it is also possible to carry out a physical coating treatment on the metallic silver portion. The silver portion carries the conductive metal. The photoresist or the photoresist on the copper foil formed on the first transparent substrate 14A and the second transparent substrate 14B may be exposed to light to form a resist pattern. The copper foil exposed from the anti-money pattern is etched, thereby forming the first conductive portion 16A and the second conductive portion 16B. Alternatively, a paste containing metal microparticles may be printed on the first transparent substrate 14a and the second transparent substrate ι4Β, and the slurry may be metal-charged to form the first conductive portion 16A and the second conductive portion. 16B. The first transparent portion 14A and the second transparent substrate 14B may be printed on the first transparent portion 14A and the second conductive portion by a ''screen printing plate or a gravure printing plate> . Next, the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment will be described with reference to a method of using a toothed silver photographic light-sensitive material in a particularly preferable manner. The manufacturing method of the first conductive sheet 12A and the second conductive material 12B according to the present embodiment includes the following three aspects depending on the form of the photosensitive material and the development treatment. (1) A chemical silver halide black-and-white photosensitive material not containing a physical developing core is subjected to chemical development or thermal development to form a metallic silver portion on the photosensitive material. (2) A method of dissolving physical development of a photoreceptor silver black-and-white photosensitive material in which a physical developing core is contained in a silver-tin silver emulsion layer, and forming a metallic silver portion on the photosensitive material. (3) A photosensitive _ silver black-and-white photosensitive material not including a physical development nucleus is superposed on a display sheet having a non-photosensitive layer containing a physical development nucleus to perform diffusion transfer development, and the metal silver portion is made. A pattern formed on a non-photosensitive display. The aspect of the above (1) is a body type black-and-white development type in which a light-transmitting conductive film is formed on the photosensitive material. The obtained axil silver is chemically developed silver or thermally developed silver, which is highly active in subsequent plating or physical development in terms of a high-surfaced filament. In the aspect of the above (2), the light-transmissive conductive film such as a light-transmitting conductive film is formed by depositing on the visible photosensitive material by the i-rays associated with the physical development nuclei in the exposed portion. This form is also an integrated black type. The developing action is the precipitation onto the physical developing nucleus, so it is toward the tongue, but the developing silver is spherical smaller than the surface. In the aspect of the above (3), an eight-port transparent conductive film is formed on the developing sheet by the silver halide particles in the unexposed portion on the developing core on the developing sheet. This is a so-called: Tian Ligang coffee and coffee, and is used to peel off the image from the photosensitive material. (4), the secret can select any development of the negative type development treatment and the reverse rotation (in the case of the diffusion transfer method, by using the 妾 positive film (am〇P〇sitlve) type photosensitive material as the photosensitive material) May 23 201220168 j//iypif for negative development processing). The chemical development, thermal development, dissolved physical development, and diffusion transfer development described herein are the meanings commonly used in the industry. In general textbooks for photographic chemistry, such as Kikuchi, "Photography Chemistry" (Kyoritsu Press, 1955) (published annually) 'CEKMees edited "The Theory of Photographic Processes, 4thed." (Mcmillan, published in 1977) has a commentary. This case is an invention relating to liquid treatment, and as another development method, reference may also be made to a technique using a thermal development method. For example, Japanese Patent Application Laid-Open No. 2004-184693, Japanese Patent Laid-Open No. Hei No. 2004-334077, and Japanese Patent Laid-Open No. Hei No. 2005-010752, Japanese Patent Application No. 2004-244080 The technique described in each specification of 2〇〇4_〇85655. Here, the respective layer configurations of the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment will be described in detail below. [First transparent substrate 14A and second transparent substrate 14B] Examples of the first transparent substrate 14A and the second transparent substrate 14B include a plastic film, a plastic plate, and a glass plate. As a raw material of the plastic film and the plastic sheet, for example, polyester such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN) can be used. Polyolefins such as polyethylene (PE, polyethylene), polypropylene (PP, polypropylene), polystyrene, EVA (ethylene vinyl acetate copolymer), vinyl (Vinyi) ) resin; in addition, poly carbon 24 201220168 37739pif vinegar (PC ' polycarbonate), polyamide (p〇iyamide), polyimide (polyimide), acrylic (acryl) resin, triacetyl cellulose (TAC) , triacetylcellulose) and the like. As the first transparent substrate 14A and the second transparent substrate 14B, PET (melting point: 258 ° C), PEN (melting point: 269 ° C), PE (melting point: 135 ° C), PP (melting point: 163 °) are preferable. C), polystyrene (melting point: 23 (rc), polyvinyl chloride (melting point: i80 ° C), polyvinylidene chloride (melting point: 212 ° C) or TAC (melting point · 290 C) The plastic film is a plastic film of about 290 C or less, which is preferably about 290 C or less. In particular, it is preferably PET from the viewpoint of light transmittance or workability. The first used in the laminated conductive sheet 1 The conductive film such as the conductive sheet UA and the second conductive sheet 12B needs transparency, so that the transparency of the first transparent substrate 14A and the second transparent substrate 146 is preferably high. The soil [silver salt emulsion layer] becomes the first The first conductive portion 16A of the conductive sheet 12A (the first large lattice 24A, the first connecting portion 28A, the first auxiliary pattern 2A, etc.) and the second conductive portion 16B of the second electric sheet 12B (the second large lattice 2) The silver salt emulsion layer of the guilty, the second ^ second auxiliary pattern 2, etc., in addition to the silver | and the binder, also contains the melt Or an additive such as a dye. ^ The silver salt used in the present invention can be exemplified by (iv) silver or other organic silver salt such as silver acetate. In the fourth embodiment, it is preferred to use the earth sensor as a sensor. The silver content of the silver salt emulsion layer (the coating amount of the silver salt) and the silver color is preferably 1 to 3 G coffee 2, more preferably 1 to 25 g/m 2 . ^ 佳 25 201220168 3//3ypif is 5 to 20 g/m 2. By setting the coated silver amount to the above range, the desired surface resistance can be obtained in the case where the laminated conductive sheet 10 is formed. Examples of the binder used in the gel include gelatin, polyvinyl alcohol (PVA), polyvinylpyrrolidone (PVP, polyvinylpyrrolidone), polysaccharides such as starch, cellulose, and derivatives thereof. P〇lyethylene oxide, p〇lyVinyiamine, cMtosan, p〇lyiysine, polyacrylic acid, polyalghi acid, poly-transparent Acidic acid (p〇lyhyalur〇nic acid) carboxycellulose (Carboxylcell Ulose), etc. These materials have neutral, anionic, and cationic properties depending on the ionicity of the functional group. The content of the binder contained in the silver-wet agent layer towel of the present embodiment is not particularly limited. The range in which the dispersibility and the adhesion are exhibited can be appropriately determined. The yttrium of the binder in the silver salt emulsion layer is preferably 1/4 or more, more preferably 1/2 or 1/2, in terms of volume ratio of silver/binder. The volume of the adhesive is preferably 100/1 or 100/1 to · ^ * silver /

50/1 .T 〇 J is 1/1 to 3A. Hunting from the silver salt in the silver salt emulsion layer, even if the coating silver amount is adjusted = the product ratio is the average, so that the average surface resistance can be obtained without the silver / binder volume The ratio of the raw material can be reduced. In addition, the amount ratio is converted into the amount of silver/adhesive weight (weight ratio), and the viscosity of 5 doses (weight ratio (weight ratio: 4) is converted into silver amount/binder amount (solvent> sister ratio). 26 201220168 37739pif The solvent to be used for the formation of the silver salt emulsion layer is not particularly limited, and examples thereof include an organic organic refrigerant (for example, an alcohol such as methanol (methan) or a ketone (acetone) such as acetone. , amides such as amide, dimethylsulfoxime, etc. sulfoxides (esters (1)^), ethyl acetates, etc. (ether), etc.), ionic liquids, and mixed solvents thereof. The content of the solvent to be used in the silver salt emulsion layer of the present embodiment is preferably in the range of 30% by mass to 90% by mass based on the total mass of the silver salt or the binder contained in the silver salt emulsion layer. 5 〇 mass percentage ~ 80 mass percent range. <Other Additives> The various additives used in the present embodiment are not particularly limited. A well-known additive can be preferably used. [Other Layer Configuration] A protective layer (not shown) may be provided on the silver salt emulsion layer. The "protective layer" in the present embodiment means a layer of a binder containing a gelatin or a polymer which is formed on a photosensitive silver salt emulsion layer to prevent scratching or to exhibit an effect of improving mechanical properties. The thickness of the protective layer is preferably 0.5 μm or less. The coating method and the formation method of the protective layer are not particularly limited, and a known coating method and formation method can be appropriately selected. Further, for example, an undercoat layer may be provided under the silver salt emulsion layer. Next, each step of the method of producing the first conductive sheet 12A and the second conductive sheet 12A will be described. [Exposure] 27 201220168 ^//jypif In the present embodiment, the first conductive portion 16A and the second conductive portion 16B are formed by printing. However, in addition to the printing method, exposure and development can be performed. A conductive portion 16A and a second conductive portion 16B. That is, the photosensitive material having the silver salt-containing layer or the photosensitive material coated with the photolithography photopolymer (photop〇lymer) disposed on the first transparent substrate 14A and the second transparent substrate 14B is exposed. . Electromagnetic waves can be used for exposure. Examples of the electromagnetic wave include light such as visible light, ultraviolet light, and the like, and radiation such as X-ray. Further, in the exposure, a light source having a wavelength distribution or a light source having a specific wavelength can be used. As for the exposure method, the tongue is preferably a method of separating a glass mask or a pattern exposure using a laser drawing. [Development treatment] In the present embodiment, after the emulsion layer is exposed, development processing is further performed. For the development treatment, a technique of usual development treatment used in a silver salt photographic film or a photocopying paper, a film for printing plate, an emulsion mask for a photomask, or the like can be used. The developer is not particularly limited. It is also possible to use PQ (phenidone-quinol), MQ (metol-quino) and MAA (methacrylic acid). For mercaptoic acid) developer, etc., for example, CM E-6, RA of CN-16, CR-56, CP45X, FD-3, PAHTOL, and KODAK formulations of Fujifilm Co., Ltd. can be used. -4, developer solution such as D-19, D-72, etc., or a developer solution thereof contained in a kit. Further, a lith developer can also be used. 28 201220168 j / /jypif The more obvious the reduction may include the processing of removing the silver of the unexposed portion. The fixing treatment in the present invention: 1, a technique of fixing treatment used in a salt photographic film or a photocopying paper, a film for printing plate making, a latex mask for a photomask, and the like. . The fixing temperature in the above fixing step is preferably from about 20 t to about = ' more preferably from 25 Å to 45 ° c. The x' solid time is preferably 5 seconds to 1 : the inner 3 is: seconds to 50 seconds. The amount of the fixing liquid to be added is preferably _ml/m2 or _ml/m2 or less 5 (^/m2 or leak ml/m2 or less, particularly preferably __fine ml/m or less with respect to the treatment I of the photosensitive material. = For the photosensitive material that has been subjected to development and fixation treatment, the water washing is performed or stabilized. The above-mentioned money or chemical treatment can be used for every 1 m of normal photosensitive material, and the amount of water washed is 20 liters or 2 liters. The liter or the amount of replenishment of 3 liters or less (including 0', that is, water-washing) is carried out. The quality of the metallic silver contained in the exposed portion after the development treatment is preferably _ mass for the exposed silk (four) light portion. The content ratio of t or more than the mass percentage of the brother is more preferably 280 mass% or more of the 8G mass. The mass of the silver contained in the exposed portion is 5 相对 with respect to the mass of the silver contained in the exposed portion of the exposure 刖. The gradation after the development treatment in the present embodiment in which the mass percentage or the 50 mass% is high is = a special mosquito, preferably a super object. If the layer after the development treatment: owes 2 〇, : The light-transmitting portion of the light transmissive portion improves the conductivity 29

201220168 . m* t Conductivity of the I-metal part. As a layer having a level of 4.0 or 4 〇 (rh〇di-(ind; um ion), the conductive sheet is obtained by obstructing the step, and the surface of the conductive sheet obtained is electrically 0 0 fo -1, Ohm) 峋. or _. below, and preferably m is called ~ (4). The range is more preferably the axis of =. Borrowing (4) the surface resistance is in Weiwei, even if the large-area touch panel on the area ί2=〇(1) can also be placed in the position detection. Moreover, the conductive sheet after development can be further processed. The house light (calende O treatment can be used to obtain the desired surface resistance by calendering. [Physical development and plating treatment] In the present embodiment, the metallic silver formed by the above exposure and development treatment can also be improved. For the purpose of conductivity of the portion, the physical appearance and/or weaving treatment for the metal silver portion of the metal-clad metal particles is performed. In the present invention, only one of physical development or plating treatment may be used. The metallic silver portion carries the conductive metal particles, and the metal silver portion may be carried by the physical development and the forging treatment to carry the conductive metal particles. Further, the metal silver portion may be subjected to physical development and/or plating treatment. The "physical development" in the present embodiment can be described as a process in which a metal particle such as a silver ion is reduced by a reducing agent to precipitate a metal particle on a core of a metal or a metal compound. This physical phenomenon is utilized in the instant B&w film, instant slide film (instantslidefihn), and printing plate manufacturing, etc. 201220168 J/oypif, which can be used in the present invention. Also, physical development can be combined with development processing after exposure. Simultaneously, it may be carried out separately after the development treatment. In the present embodiment, the plating treatment may use electroless plating (chemical or f plating or substitution plating), electroplating, or electroless plating and electroplating. The electroless plating in the present embodiment can be a known electroless plating technique. For example, an electroless plating technique used in a printed wiring board or the like can be used. The electroless plating is preferably electroless plating. [Oxidation treatment] - In the present embodiment, it is preferred that the metal silver portion after the development treatment and the conductive metal portion formed by physical development and/or plating treatment are subjected to oxidation treatment. In the case where, for example, a metal is slightly deposited on the light-transmitting portion, the metal can be removed to make the light-transmitting portion have a permeability of approximately 100%. [Electrically conductive metal portion] The conductive metal portion has a line width of 1 μm or more and 30 μm or less, preferably 1 μm or more and 15 μm or less, more preferably 5 μm or more. And μηι or 10 μηη or less, preferably 5 μηι or 5 μπ1 or more and 9 μηι or 9 μιη or less. When the line width is less than the above lower limit value, the conductivity is insufficient, and thus it is used for touch. In the case of a panel, the detection sensitivity is insufficient. On the other hand, if the line width exceeds the above upper limit value, the moiré caused by the conductive metal portion becomes conspicuous' or the visibility is deteriorated when used for a touch panel. Further, by being in the above range, the moiré of the conductive metal portion can be improved, and it is possible that 31 201220168. ο / /jypif Vision becomes particularly good. The line spacing is preferably 3〇μηη or more, and 5〇〇μηι or less than 500 μιη, more preferably 5〇μιη or 5〇μηη and 4〇〇μιη or 1 or less 'best 100 μιη or 100 μηη or more and 350 μιη or less than 350 μιη. Further, the conductive metal portion may have a portion having a line width wider than 30 μm for the purpose of grounding or the like. The conductive metal portion in the present embodiment preferably has an aperture ratio (transmittance) of 85% or more, more preferably 90% or more, and most preferably 95% or 95, from the viewpoint of visible light transmittance. %the above. The aperture ratio is a ratio of the light-transmitting portions other than the conductive portion of the first conductive portion 16A and the second conductive portion 16A to the whole, for example, a square lattice-like aperture ratio of a line width of 15 μm and a pitch μιη. [Light-transmitting portion] The "light-transmitting portion" in the present embodiment refers to a portion having a light-transmitting property other than the conductive metal portion of the first conductive sheet 12A and the second conductive sheet 12A. The transmittance of the light-transmitting portion is the minimum value of the transmittance in the wavelength region of 380 nm to 780 nm other than the light absorption and reflection of the first transparent substrate 14 and the second transparent substrate 14 as described above. The transmittance is 90% or more, preferably 95% or more, more preferably 97% or more, and further preferably 98% or 98%, and most preferably 99% or 99%. the above. [First conductive sheet 12A and second conductive sheet 12B] The thickness of the first transparent substrate 14A and the second transparent substrate 14B in the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment is preferably 5 μm. ~350 μηη 'More preferably 30 μιη~150 μιη. If the thickness is in the range of 32 201220168 J / / jypif 5 μιη to 350 μιη, the desired transmittance of visible light can be obtained, and it is easy to handle. 5, the thickness of the metal silver portion placed on the first transparent substrate 14A and the second transparent substrate mb, according to the coating of the silver-containing salt layer coated on the first transparent substrate 14 and the second transparent substrate MB The thickness of the coating is appropriately determined. The thickness of the metal silver portion may be selected from 0.001 mm to 0.2 mm, preferably 30 μm or less, more preferably 20 μm or less, and further preferably 〇.〇1 μιη~9 μιη 'best for 〇 · 〇 5 ~ 5 handsome. Further, the metallic silver portion is preferably in the form of a pattern. The metal silver portion may be a tantalum layer, or may be composed of two or more layers of fe. In the case where the metallic silver portion is patterned and has a laminated structure of two or more layers, different color sensitivities are imparted so that light can be applied at different wavelengths. Thus, when the exposure wavelength is changed and exposure is performed, different patterns can be formed in each layer. * As for the thickness of the conductive metal portion, the thinner the viewing angle of the display panel is, the thinner the viewing angle of the display panel is, the thinner the thickness is, and the thinner the film. From this viewpoint, the thickness of the conductive metal layer contained by the conductive metal portion is preferably less than 9 divisions, more preferably (u μιη or 〇"μπχ or more and less than 5 qing, and 0.1 μηι or 0.1 μϊη In the present embodiment, the metal silver portion having a desired thickness can be formed by controlling the coating thickness of the silver salt-containing layer described above, and can be freely formed by physical development or plating treatment. Controlling the severity of the layer 7 containing the conductive metal particles 'so that even if it has a thickness of less than 5 μm, the first conductive sheet has a thickness of 3,000 and the second conductive sheet can be easily 33 201220168. Further, in the first conductive sheet 12A or the second conductive sheet UB # manufacturing method according to the present embodiment, it is not necessary to perform a step such as plating. In the method for manufacturing the conductive sheet 12a or the second conductive sheet 12B, the desired surface resistance can be obtained by adjusting the amount of silver applied to the silver salt emulsion layer and the silver/adhesive body. Further, it can be pressed as needed. Light treatment, etc. (hard after development) Treatment 卞 After the silver layer is treated, it is preferably impregnated in a hard coating agent for hard treatment. Examples of the hardener include glutaric acid, hexamethylene, 2,3- A dialdehyde such as dihydroxy-winter-dioxane and a boric acid are described in JP-A No. 2-141279. Further, the present invention can be disclosed in Tables 1 and 2 below. The technique of the international publication specification is used in an appropriate combination, and the notes such as "special opening", "number bulletin", and "number manual" are omitted. 34 201220168 :)/ Mypif [Table 1] 2004-221564 2007-235115 2006- 332459 2007 - 102200 2006-228478 2006- 348351 2007- 134439 2007- 310091 2005- 302508 2008- 267814 2008- 283029 2009- 4213 2008-147507 2008-218096 2008-241987 2004-221565 2007-207987 2009-21153 2006-228473 2006- 228836 2007- 270321 2007-149760 2007- 116137 2008- 218784 2008-270405 2008- 288305 2009-10001 2008-159770 2008-218264 2008-251274 2007-200922 2006- 012935 2007- 226215 2006- 269795 2007- 009326 2007-270322 2007- 208133 2007- 088219 2008- 22735 0 2008-277675 2008- 288419 2009- 16526 2008-159771 2008-224916 2008-251275 2006-352073 2006-010795 2006-261315 2006-269795 2006- 336090 2007- 201378 2007-178915 2007- 207883 2008- 227351 2008-277676 2008 - 300720 2009- 21334 2008-171568 2008-235224 2008-252046 2007-129205 2006- 228469 2007- 072171 2006-324203 2006- 336099 2007- 335729 2007-334325 2007- 013130 2008- 244067 2008-282840 2008- 300721 2009- 26933 2008-198388 2008-235467 2008-277428 [Table 2] 2006/001461 2006/088059 2006/098333 2006/098336 2006/098338 2006/098335 2006/098334 2007/001008 In the above example, 'two or more are indicated The first large lattice 24A is connected in series in the first direction to form the first conductive pattern 18A, and two or more second large lattices 24B are connected in series in the second direction to form the second conductive pattern 18B. Further, It is also possible to connect two or more transparent electrodes 35, such as diamonds, containing an IT〇 (indium oxide) film, in the shape of a diamond, and to form a first conductive pattern in series in the first direction. i8A, and will contain IT The two or more transparent electrodes of the O film, for example, rhombic, are connected in series in the second direction to constitute the second conductive pattern 18B. In this case, the arrangement of a plurality of regular transparent electrodes arranged adjacent to each other by the transparent electrode including the IT0 film, and the offset arrangement of the first auxiliary line 36A and the second auxiliary line 36B formed between the transparent electrodes The arrangement in which the arrangement of the transparent electrodes is different is mixed, whereby a plurality of spatial frequencies are mixed, and as a result, interference with the pixel arrangement of the liquid crystal display device can be suppressed, and the moiré can be effectively reduced. produce. Further, a functional layer such as an antireflection layer or a hard coat layer may be applied to the conductive sheet. Hereinafter, the present invention will be more specifically described by way of examples of the invention. Further, the materials, the amounts of use, the ratios, the treatment of the inner cells, the treatment order, and the like, which are shown in the following examples, may be appropriately changed within the scope of the gist of the invention. Therefore, the scope of the present invention should not be construed as being limited by the specific examples shown below. In these examples, the moiré and visibility of the touch panel according to Comparative Example 1 to Comparative Example 3 and Examples 1 to 2 were evaluated. Table 3 below describes the details and evaluation results of Comparative Example 1 to Comparative Example 3 and Examples 1 to 20. [Example 1] (silver halide photosensitive material) An emulsion containing cerium bromide gas-vaporized particles (1 = 0.2 mol%, Br = 40 mol%) having an average spherical equivalent diameter of ο. 1 was prepared, the aforementioned 36 201220168 ο / / Jypif moth desert silver chloride particle phase aqueous medium (aqu_medium) Ag contains 10.0 g gelatin. g (4) The twist becomes 1 () · 7 (material / moir silver added K3Rh2B4 Κ 2 ΙΚ: 16, _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ J, the coating amount of the sense is ~ square, the second through, the body 14 - this is on the poly-ply (PETf). At this time, the Ag / gelatin volume ratio is set to 2 / 1. PET(10) The PET slab body is coated with a width of 2S cm for 20m/min, so that the center of the coating is left with 24 coffee, and both ends are cut off by 3 em to obtain 槌(五)υ-like silver-reducing sensitization. (Exposure) In the case of the exposure pattern, the first conductive sheet 12 of the laminated conductive sheet 1A is patterned as shown in FIGS. 1 and 3, and the second conductive sheet 12 is patterned as shown in FIG. The first transparent substrate 14A and the second transparent substrate 14B having a size of Α4 (210 mm×297 mm) were exposed to each other by using a mask having the above-described pattern and exposure using a parallel light using a high-pressure mercury lamp as a light source. 20 g 50 g • Developer 1 L formulation Hydroquinone sodium sulfite 37 201220168 40 g 2g 3g 1 g 4g Adjusted to 10.3 300 ml 25 g 8g 5 g 1 g Adjusted to 6.2 Carbonated B Amine. Tetraacetate Bromination _ Polyethylene glycol 2000 Argon Oxide PH value• Fixative solution 1 L Formulation Ammonium thiosulfate solution (75%) Sulfuric acid money. Monohydrate 13-diaminopropane·Tetraacetic acid acetic acid Ammonia water (27%) PH value For the sensitized material which has been exposed using the above treatment agent, the automatic developing machine FG-710PTS manufactured by Fujifilm Co., Ltd. was used to treat the conditions: development 35 ° C for 30 seconds, fixing 34 ° C 23 seconds, washing water (5 L / min (minutes)) for 20 seconds. (Touch panel) After the first conductive sheet 12A is laminated on the second conductive sheet 12B to obtain a laminated conductive sheet, the laminated conductive sheet is attached. The touch panel according to Example 1 is formed on the display surface of the liquid crystal display device. In the first example, as shown in Table 3, which will be described later, the conductive portion (the first conductive pattern 18A, the first auxiliary pattern 20A, the second) The line width of the conductive pattern 18B and the second auxiliary pattern 2〇B) is 5 μηι, and the length of one side of the small lattice 26 is 50 μπι 'large lattice (the 38th 201220168. j / /jypif large grid 24A and the second large lattice The length of one side of 24B) is 3, let the third direction and the The offset of the direction (hereinafter, referred to as the offset) is 2.5 μm. [Examples 2 to 4] The touch panels involved in Example 2, Example 3, and Example 4 have an offset 畺 of 5 μηη, 10, respectively. The production was carried out in the same manner as in the above Example i except for 25 μm. [Example 5] In the touch panel according to Example 5, the line width of the conductive portion was 7 μm, the length of one side of the small lattice 26 was 25 μm, and the large lattice (the second large grid 24Α and the second large lattice 24Β) The production was carried out in the same manner as in the above Example except that the length of one side was 5 mm and the offset was 50 μm. [Example 6] The touch panel according to Example 6 except that the line width of the conductive portion was 8 μm, the length of one side of the small lattice 26 was 250 μm, and the large lattice (the second large grid 24Α and the second large lattice 24Β) The same procedure as in the above Example 1 was carried out except that the length of one side was 5 mm. [Examples 7 to 12] The touch panels involved in Example 7, Example 8, Example 9, Example 10, Example u, and Example 12 have offsets of 4 μm, 1 Q μπ1, 30 μm, and 50 μm, respectively. Production was carried out in the same manner as in Example 6 except that 100 μm and 125 μm. [Example 13] The touch panel according to Example 13 was produced in the same manner as in Example 7 except that the line width of the conductive portion was 9 39 201220168.j / /j^pif μηι, and the offset was 50 μηι. [Example 14] The touch panel according to Example 14 except that the line width of the conductive portion was 1 〇 μη, the length of one side of the small lattice 26 was 300 μm, and the large lattice (the first large lattice 24 Α and the second large lattice 24 Β) The production was carried out in the same manner as in the above Example 1 except that the length of one side was 6 mm. [Example 15 to Example 20] The touch panels of Example 15, Example 16, Example 实例, Example 18, Example 19, and Example 20 were offset by 4 μηι, 10 μηη, 30 μηη, 50 μηι, 100, respectively. The production was carried out in the same manner as in the above Example 14 except for μηη and 150 μηη. [Comparative Example 1 to Comparative Example 3] The touch panel according to Comparative Example 1 was produced in the same manner as in the above Example 1 except that the offset amount was 0 μm. The touch panel according to Comparative Example 2 was produced in the same manner as in the above Example 6, except that the offset amount was 0 μm. The touch panel according to Comparative Example 3 was produced in the same manner as in the above Example 14 except that the offset amount was 0 μm. 201220168 D / / J^pif [Table 3] Line width of conductive part (μη〇 Length of one side of small grid (μηι) Length of one side of large grid (mm) Offset (μιη) Comparison of visibility evaluation of moiré evaluation Example 1 5 50 3 0 X 〇 Example 1 5 50 3 2.5 Δ 〇 Example 2 5 50 3 5 △ ~ 〇〇 Example 3 5 50 3 10 〇〇 Example 4 5 50 3 25 〇〇 Example 5 7 250 5 50 〇〇 Comparative Example 2 8 250 5 0 X 〇 Example 6 8 250 5 2.5 △ 〇 Example 7 8 250 5 4 △ ~ 〇〇 Example 8 8 250 5 10 〇〇 Example 9 8 250 5 30 〇〇 Example 10 8 250 5 50 〇 〇 Example 11 8 250 5 100 〇〇 Example 12 8 250 5 125 △ ~ 〇 Δ Example 13 9 250 5 50 〇〇 Comparative Example 3 10 300 6 0 X 〇 Example 14 10 300 6 2.5 Δ 〇 Example 15 10 300 6 4 △~〇〇Example 16 10 300 6 10 〇〇ExampleΠ 10 300 6 30 〇〇Example 18 10 300 6 50 〇〇Example 19 10 300 6 100 〇〇Example 20 10 300 6 150 △~〇Δ [Evaluation] 41 201220168. (Evaluation of moiré) The touch panel is placed on the turntable to drive the liquid crystal display device to display white. In this state, the turntable was rotated at a bias angle of _2 〇 to +/- 20° to visually observe and evaluate the moiré. The moiré was observed at a viewing distance of 1.5 m from the display surface of the liquid crystal display device. In the evaluation, the case where the moiré is not noticeable is set to 〇, the case where a very small amount of moiré is observed at a level of no problem is Δ, and the case where the moiré is marked is set to X. π ( Evaluation of Visibility) When the touch panel is placed on the turntable and the liquid crystal display device is driven to be self-colored before the evaluation of the moiré, whether the surface of the touch panel is wirelessly thick or black Spot. (Evaluation results) In Example I2 and Example 2, only a small number of points were confirmed, and the overall visibility was good. I. In particular, in the comparative example! ~ Comparative Example 3, cloud_display_ 'Example 1 to Example 20 were evaluated as a whole, and Examples 3 to 5, Example 8 to Example u, Example 13, and Example μ were not significant. Examples: Example 6, Example 14 Cloud: The level was observed to have Very small degree '',,,,,,:, 15, example 20 Moire; ": With Example 7, the actual level between the two. "1" between "^"" even if the first conductive portion is formed on the flute side as shown in Fig. 2A, the second conductive portion 16B is formed on the surface of the flute, and the comparative example 1 to the comparative example are formed. 3. When the touch panel is produced in the same manner as in the example 1 to the example 20, the same evaluation results as described above may be obtained. The touch panel and the conductive sheet according to the present invention are not limited to the above-described embodiments. Of course, various configurations can be employed without departing from the gist of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an exploded perspective view showing a part of a laminated conductive sheet. Fig. 2A is a view showing a part of an example in which a laminated conductive sheet is omitted. Fig. 2B is a plan view showing a part of another example in which the laminated conductive sheet is omitted. Fig. 3 is a plan view showing an example of a pattern of a first conductive portion formed on a first conductive sheet in a laminated conductive sheet. Fig. 4 is a plan view showing an example of a pattern of a conductive portion formed on a second conductive sheet in a laminated conductive sheet. A loyalty is a partial omitting of the example of the layered conductive sheet which is formed by combining the first conductive sheet and the second conductive sheet. An explanatory diagram of an example of a combination pattern on the eve. The first auxiliary line in the side pattern 7 is a group of the second auxiliary lines in the _ pattern of the first portion in the combined pattern: 2 sets of the second auxiliary lines. An explanatory diagram of an example of a σ pattern. 43 201220168. j / / 〇y\)\f FIG. 8 is an explanatory diagram showing an example of the reference position. [Main component symbol description] 10: laminated conductive sheet 12A: first conductive sheet 12B: second conductive sheet 14A: first transparent substrate 14B: second transparent substrate 16A: first conductive portion 16B: second conductive portion 18A: One conductive pattern 18B: second conductive pattern 20A: first auxiliary pattern 20B: second auxiliary pattern 22A: 24A: first large lattice 24B: second large lattice 26: small lattice 28A: first connecting portion 28B: second connection Part 30: middle lattice 32A: first cutout portion 32B: second cutout portion 34A: first insulating portion 34B: second insulating portion 44 201220168.f / / 36A: first auxiliary line 36B: second auxiliary line 38A: An L-shaped pattern 38B: a second L-shaped pattern 40A: a first terminal 40B: a second terminal 42A: a first external wiring 42B: a second external wiring 44: a combined pattern 46A: a first drawing line 46B: a second axis Wa, Wb: line width ha: distance 45

Claims (1)

201220168, VII. Patent application scope: 1. A touch panel having a laminated conductive sheet (10), which is characterized in that, the main laminated conductive sheet (10) comprises: a base body (14A); a first conductive portion ( 16A) formed on one side of the base body (14A); and a second conductive portion (16B) formed on the other main surface of the base body (14), and the first conductive portion U6A) includes: 2 or 2 And more than one first conductive patterns (18A) extending in the first direction and arranged in a second direction orthogonal to the first direction, comprising a plurality of lattices; and a first auxiliary pattern (20A) including a plurality of first auxiliary lines (36A) arranged at a periphery of a conductive pattern (18A), the first conductive portion (16B) comprising: 2 or more second conductive patterns (18B) 'extending in the second direction respectively And arranged along the first direction, comprising a plurality of lattices; and a second auxiliary pattern (2〇B) comprising a plurality of second auxiliary lines (36B) arranged along the periphery of each of the second conductive patterns (18B), 'the first conductive portion (16A) and the second portion above when viewed from above The conductive portion (16B) is formed in a state in which the first conductive pattern (18a) and the second conductive pattern (18B) are disposed to each other, and the direction in which the first direction and the second direction are halved is set to In the three directions, when the direction orthogonal to the third direction is the fourth direction, at least from the reference position to the third 46 201220168 j (/ j^pif side = offset from the line of the first auxiliary line (36A) The line width (June) of the width () and the above-mentioned == auxiliary line (36B) is configured as the shorter line width of ι/2 or 1/2 or more and 100 μm or 1 〇〇. The touch panel of the first aspect of the invention, wherein the above-mentioned 邛 (邛) is disposed offset from the second conductive portion by 5 〇哗 or 50 μπι or less. The touch panel is configured such that the above-mentioned 5邛16A) and the second conductive portion are at least 30 μm or less. 4. If the scope of the patent application is the same! The reference position surface is described as the following: the first axis of the above-mentioned disk/subsidy line (36A) (46A) and the second axis of the auxiliary line (36B): Γ: Ι36Α) The second auxiliary line (10) is not coincident with the end of the second auxiliary line (U). The second auxiliary line (36Β) of the second auxiliary line (36Β) is as described in the first section of the patent application. Forming the above-described ith auxiliary pattern on the ith image; (^), the combination pattern (44) between the _ and the second auxiliary pattern (the state has the above-mentioned The second auxiliary line (36B) is orthogonal to the auxiliary line (36A) and ., and is in a non-overlapping configuration. 6. In the fifth aspect of the patent application, the fifth control pattern (44), the first control panel, wherein The second axis (46B) of the above (then with the first axis β of the second auxiliary two) is set to 47 201220168, _ . . . ριτ is substantially parallel 'the first axis (46A) and the second axis (46B) The distance (ha) between the line width (Wa) of the first auxiliary line (36A) and the line width (Wb) of the second auxiliary line (36B) The touch panel of claim 6, wherein the first axis (46A) and the second axis (46B) are The distance (ha) is the sum of 1/2 of the line width (Wa) of the first auxiliary line (36A) and 1/2 of the line width (Wb) of the second auxiliary line (36B). The touch panel of claim 6, wherein a distance (ha) between the first axis (46A) and the second axis (46B) does not reach a line width of the first auxiliary line (36A) ( 1/2 of the line width (Wb) of the second auxiliary line (36B) of the second auxiliary line (36B). The touch panel of the sixth aspect of the invention, wherein the combination pattern (44) The first auxiliary line (36A) and the second auxiliary line (36B) are partially overlapped with each other. The touch panel of claim 6, wherein the first axis (46A) and the above The distance (ha) between the second axis (46B) is longer than 1⁄2 of the line width (Wa) of the first auxiliary line (36A) and 1/2 of the line width (Wb) of the second auxiliary line (36B) 2 total. 1 1. The touch panel of claim 1, wherein the upper conductive pattern (18A) is formed by connecting two or more first large lattices (24A) in series along the first direction, The first conductive pattern (18B) is composed of two or more second large lattices (2 just connected in series along the second direction, 48 201220168, UI t -/-/pll eight different iif - A grid (24A) And each of the second large lattices (2) is formed by combining two or more small lattices (26), and the tenth is formed around the sides of the first large lattice (24A). The upper U0A;) the large lattice (24A) is non-connected, the first auxiliary pattern is formed around the side of the second A grid (24B), and the second is non-connected with the upper H) large lattice (24B) Auxiliary pattern, XI, Chu 12: / ° The touch panel of claim 11 wherein the upper electro-mechanical portion (16A) and the second conductive portion (16B) are offset by a small grid (2)) Configured for 1/2 or less. The touch panel of claim 5, wherein the length of one side of the upper ... and the sub-piece (26) is 5 〇 μηη to 5 〇〇 μπι. = The touch panel of claim 5, wherein the length of one side of the upper _, the large lattice (24A) and the second large lattice (24B) is 3 mm to 1 mm. , +, goods 15 ·, · as claimed in the patent scope of the first touch of sulfur, wherein the upper "quote" (16A) and the second conductive portion (16B) line width is 1 μηι ~ 30 μηι . 16. A conductive sheet, comprising: a substrate (14A); a surface first conductive portion (16A) formed on a main body and a first conductive portion (16A) of the substrate (14A), formed on the substrate ( 1449) another 49 pif 201220168 main surface, and the first conductive portion (16A) includes: 2 or more first conductive patterns (18A) 'extending in the first direction, respectively, and along the upper-direction The second direction of the intersection is arranged to include a plurality of lattices. The i-auxiliary pattern (20A) includes a plurality of first-secondary two-parts of the first-conducting ηβΑ, and the periphery of the case (Α) is arranged. The second conductive portion (16Β) includes: two or two conductive patterns (18Β) extending in the second direction, and three rows of lattices along the direction of the first row; and a second auxiliary pattern, including Two wide conductive patterns. a plurality of second auxiliary lines arranged in the periphery of the top view, wherein the first conductive portion (16Α) and the second conductive portion (16Β) are formed as the first conductive pattern (18α) and the first pattern (then In the form of the arrangement, the direction of the second to the second direction is set to the third direction, and the direction 2 of the third direction is the fourth direction, and the distance from the reference position is at least to the third direction.移 or 1/2 or more and 100 μm or less of the shorter line width of the line width (Wa) of the above-mentioned auxiliary line (36Α) and the line width (Wb) of the upper line (10) And configuration. 50