JP5476237B2 - Touch panel and conductive sheet - Google Patents

Description

  The present invention relates to a touch panel and a conductive sheet, for example, a touch panel and a conductive sheet suitable for use in a projected capacitive touch panel.

  In general, a capacitive touch panel is a position input device that detects a fingertip position by detecting a change in capacitance between a human fingertip and a conductive film. There are surface type and projection type. The surface type has a simple structure, but cannot detect two or more contacts (multi-touch) at the same time. On the other hand, the projection type has a configuration in which a large number of electrodes are arranged in a matrix, for example, like a pixel configuration of a liquid crystal display device. The first electrode group is arranged in the horizontal direction, and a plurality of second electrode groups in which a plurality of electrodes arranged in the horizontal direction are connected in series are arranged in the vertical direction. Multi-touch can be detected by sequentially detecting capacitance changes with the second electrode group.

  As a prior art of this projected capacitive touch panel, for example, a touch switch described in Patent Document 1 can be cited. The touch switch includes a substrate, a plurality of first electrodes formed on one surface of the substrate and arranged at regular intervals, and formed on the other surface of the substrate and arranged at regular intervals, and the plurality of first electrodes. And a plurality of second electrodes that are arranged in a lattice shape, and are attached to the front surface of the display, wherein the first electrodes and the second electrodes each form a mesh with a plurality of conductor lines, Is oblique to the black matrix of the display. Furthermore, the touch switch includes a first auxiliary line formed between the first electrodes on the one surface and a second auxiliary line formed between the second electrodes on the other surface, A lattice shape having a uniform line interval is formed by the conductor line of the first electrode, the first auxiliary line, the conductor line of the second electrode, and the second auxiliary line. Also, the conductor line of the first electrode, the first auxiliary line, or both formed on one surface of the substrate is the conductor line, the second auxiliary line, or both of the second electrode formed on the other surface of the substrate. And form a single line.

International Publication No. 2010/013679 Pamphlet

  By the way, when the first electrode and the first auxiliary line are formed on one surface of the substrate and the second electrode and the second auxiliary line are formed on the other surface of the substrate, the lattice shape becomes uniform due to manufacturing variations (film formation variations). When the shift amount becomes about ½ of the length of the first auxiliary line or the second auxiliary line, for example, the straight portion of the first electrode along the first direction (or the second direction) is the second electrode. The first auxiliary line extending along the first direction overlaps with the straight line portion along the first direction, or overlaps with the straight line portion along the first direction of the second electrode. On the other hand, for example, a straight line portion along the first direction (or second direction) of the second electrode overlaps with a straight line portion along the first direction of the first electrode, or extends along the second direction. However, it overlaps with the straight portion along the first direction of the first electrode. If it does so, the width | variety of the part which the linear parts overlapped will become large (line-thickness), and, thereby, the position of a 1st electrode or a 2nd electrode will become conspicuous, and the problem that visibility deteriorates will arise.

The present invention has been made in consideration of such problems, and can reduce the resistance of the transparent conductive pattern formed on the substrate and improve the visibility. An object of the present invention is to provide a touch panel that can cope with an increase in the size of a capacitive touch panel and can suppress the occurrence of moire.
Another object of the present invention is to reduce the resistance of the transparent conductive pattern formed on the substrate and improve the visibility. For example, it can be used for a projected capacitive touch panel. It is an object to provide a suitable conductive sheet.

[1] A touch panel according to a first aspect of the present invention is a touch panel having a conductive sheet for touch panel, wherein the conductive sheet for touch panel includes a base, a first conductive portion formed on one main surface of the base, A second conductive portion formed on the other main surface of the base body, and each of the first conductive portions extends in a first direction and is arranged in a second direction orthogonal to the first direction. , Two or more first transparent conductive patterns configured by a large number of lattices, and a first auxiliary pattern comprising a plurality of first auxiliary lines arranged around each first transparent conductive pattern, The two conductive parts each extend in the second direction and are arranged in the first direction and are composed of a plurality of grids, and the periphery of each second transparent conductive pattern A plurality of second auxiliary lines arranged in The first conductive portion and the second conductive portion are arranged such that the first transparent conductive pattern and the second transparent conductive pattern intersect with each other when viewed from above. In addition, when the direction that bisects the first direction and the second direction is the third direction and the direction orthogonal to the third direction is the fourth direction, at least the third direction from the reference position Further, the line width of the first auxiliary line and the line width of the second auxiliary line are shifted by not less than ½ and 100 μm or less of the shorter line width.
[2] In the first aspect of the present invention, the first conductive portion and the second conductive portion are arranged so as to be shifted by 50 μm or less.
[3] In the first aspect of the present invention, the first conductive portion and the second conductive portion are arranged so as to be shifted by 30 μm or less.
[4] In the first aspect of the present invention, the reference position corresponds to a first axis of the first auxiliary line and a second axis of the second auxiliary line, and the first auxiliary line and the second auxiliary line. A line is not overlapped, and one end of the first auxiliary line and one end of the second auxiliary line coincide with each other.
[5] In the first aspect of the present invention, a combination pattern is formed between the first transparent conductive pattern and the second transparent conductive pattern by the first auxiliary pattern and the second auxiliary pattern facing each other. The combination pattern is characterized in that the first auxiliary line and the second auxiliary line do not overlap at right angles.
[6] In the first aspect of the present invention, in the combination pattern, the first axis of the first auxiliary line and the second axis of the second auxiliary line are substantially parallel, and the first axis and the second axis The distance between them is ½ or more of the shorter one of the line width of the first auxiliary line and the line width of the second auxiliary line.
[7] In the first aspect of the present invention, the distance between the first axis and the second axis is set to 1/2 of the line width of the first auxiliary line and 1/2 of the line width of the second auxiliary line. It is characterized by being the sum of.
[8] In the first aspect of the present invention, the distance between the first axis and the second axis is set to 1/2 of the line width of the first auxiliary line and 1/2 of the line width of the second auxiliary line. It is characterized by being less than the sum of.
[9] In the first aspect of the present invention, the combination pattern has a form in which the first auxiliary line and the second auxiliary line partially overlap.
[10] In the first aspect of the present invention, the distance between the first axis and the second axis is set to 1/2 of the line width of the first auxiliary line and 1/2 of the line width of the second auxiliary line. It is characterized by being longer than the sum of.
[11] In the first aspect of the present invention, the first transparent conductive pattern includes two or more first large lattices connected in series in the first direction, and the second transparent conductive pattern includes two or more A second large lattice is configured to be connected in series in the second direction, and each of the first large lattice and each of the second large lattices is configured by combining two or more small lattices, and the first large lattice The first auxiliary pattern that is disconnected from the first large lattice is formed around a side of the lattice, and the second auxiliary lattice is disconnected from the periphery of the second large lattice. A second auxiliary pattern is formed.
[12] In the first aspect of the present invention, the first conductive portion and the second conductive portion are arranged so as to be shifted by 1/2 or less of an arrangement pitch of small lattices.
[13] In the first aspect of the present invention, the length of one side of the small lattice is 50 to 500 μm.
[14] In the first aspect of the present invention, a length of one side of the first large lattice and the second large lattice is 3 to 10 mm.
[15] In the first aspect of the present invention, a line width of the first conductive portion and the second conductive portion is 1 to 30 μm.
[16] A conductive sheet according to a second aspect of the present invention includes a base, a first conductive portion formed on one main surface of the base, and a second conductive portion formed on the other main surface of the base. The first conductive portions each extend in a first direction and are arranged in a second direction orthogonal to the first direction, and two or more first transparent portions configured by a large number of lattices. A conductive pattern and a first auxiliary pattern comprising a plurality of first auxiliary lines arranged around each of the first transparent conductive patterns, wherein the second conductive parts extend in the second direction, and , A second auxiliary comprising two or more second transparent conductive patterns arranged in the first direction and configured by a plurality of lattices, and a plurality of second auxiliary lines arranged around each second transparent conductive pattern When viewed from above, the first conductive portion and the second conductive portion have the first transparent portion. The third direction is a direction in which the bright conductive pattern and the second transparent conductive pattern are arranged so as to intersect with each other, and a direction bisecting the first direction and the second direction is a third direction. When the direction perpendicular to the fourth direction is the fourth direction, at least one of the line width of the first auxiliary line and the line width of the second auxiliary line in the third direction from the reference position, whichever is shorter / 2 or more and 100 μm or less.

As described above, according to the touch panel according to the present invention, the resistance of the transparent conductive pattern formed on the substrate can be reduced and the visibility can be improved. Therefore, it is possible to cope with an increase in the size of the touch panel of the system, and it is possible to suppress the occurrence of moire.
According to the conductive sheet of the present invention, the resistance of the transparent conductive pattern formed on the substrate can be reduced and the visibility can be improved. For example, the conductive sheet is used for a projected capacitive touch panel. It becomes suitable.

It is a disassembled perspective view which abbreviate | omits and shows the electrically conductive sheet for touchscreens partially. FIG. 2A is a cross-sectional view showing a part of the conductive sheet for a touch panel omitted, and FIG. 2B is a cross-sectional view showing a part of another example of the conductive sheet for touch panel. It is a top view which shows the example of a pattern of the 1st electroconductive part formed in the 1st electroconductive sheet in the electroconductive sheet for touchscreens. It is a top view which shows the example of a pattern of the 2nd electroconductive part formed in the 2nd electroconductive sheet in the electroconductive sheet for touchscreens. It is a top view which abbreviate | omits and shows the example which combined the 1st conductive sheet and the 2nd conductive sheet, and was set as the conductive sheet for touchscreens. FIG. 6A to FIG. 6C are examples of combination patterns of the first auxiliary lines arranged along the sides of the first large lattice and the second auxiliary lines arranged along the sides of the second large lattice among the combination patterns. It is explanatory drawing which shows. Among the combination patterns, an example of a combination pattern by each first auxiliary line in the two first L-shaped patterns of the first insulating portion and each second auxiliary line in the two second L-shaped patterns of the second insulating portion is shown. It is explanatory drawing. It is explanatory drawing which shows the example of a reference | standard position.

  Hereinafter, embodiments of the conductive sheet and the capacitive touch panel according to the present invention will be described with reference to FIGS. In the present specification, “˜” indicating a numerical range is used as a meaning including numerical values described before and after the numerical value as a lower limit value and an upper limit value.

  As shown in FIGS. 1 and 2A, a conductive sheet for a touch panel according to the present embodiment (hereinafter referred to as a conductive sheet 10 for a touch panel) is formed by laminating a first conductive sheet 12A and a second conductive sheet 12B. It is configured.

  As shown in FIGS. 1 and 3, the first conductive sheet 12 </ b> A includes a first conductive portion 16 </ b> A formed on one main surface of the first transparent base 14 </ b> A (see FIG. 2A). Each of the first conductive portions 16A extends in the first direction (x direction) and is arranged in a second direction (y direction) orthogonal to the first direction, and is composed of two or more lattices. First transparent conductive patterns 18A and first auxiliary patterns 20A arranged around each first transparent conductive pattern 18A.

  The first transparent conductive pattern 18A is configured by connecting two or more first large lattices 24A in series in the first direction, and each first large lattice 24A is configured by combining two or more small lattices 26. ing. Further, the above-described first auxiliary pattern 20A that is not connected to the first large lattice 24A is formed around the side of the first large lattice 24A.

  Between the adjacent first large lattices 24A, a first connection portion 28A that electrically connects the first large lattices 24A is formed. When the direction that bisects the first direction and the second direction is the third direction (m direction) and the direction orthogonal to the third direction is the fourth direction (n direction), the first connection portion 28A is: A medium lattice 30 having a size in which n (n is a real number larger than 1) small lattices 26 are arranged in the fourth direction is arranged. Of the sides orthogonal to the fourth direction of the first large lattice 24A, a portion adjacent to the middle lattice 30 is formed with a first notched portion 32A in which one side of the small lattice 26 is removed. Here, the small lattice 26 has the smallest square shape. In the example of FIG. 3, the medium lattice 30 has a size in which three small lattices 26 are arranged in the fourth direction.

  In addition, a first insulating portion 34A that is electrically insulated is disposed between adjacent first transparent conductive patterns 18A.

  Here, the first auxiliary pattern 20A has a plurality of first auxiliary lines 36A arranged along a side orthogonal to the third direction among the sides of the first large lattice 24A (the third direction is taken as the axial direction). A plurality of first auxiliary lines 36A (the fourth direction is an axial direction) arranged along a side orthogonal to the fourth direction among the sides of the first large lattice 24A, and the first insulating portion 34A , Each of the two first L-shaped patterns 38A in which the two first auxiliary lines 36A are combined in an L-shape.

  The length of each first auxiliary line 36 </ b> A in the axial direction has a length that is ½ of one side along the inner periphery of the small lattice 26. Each first auxiliary line 36A is formed at a position separated from the first large lattice 24A by a predetermined distance (in this example, a length that is ½ of one side along the inner periphery of the small lattice 26). ing.

  As shown in FIG. 1, the first conductive sheet 12 </ b> A configured as described above is configured such that the open end of the first large lattice 24 </ b> A existing on one end side of each first transparent conductive pattern 18 </ b> A is a first connection. The portion 28A does not exist. The end of the first large lattice 24A existing on the other end side of each first transparent conductive pattern 18A is electrically connected to the first external wiring 42A via the first terminal 40A.

  On the other hand, as shown in FIGS. 1 and 4, the second conductive sheet 12 </ b> B includes a second conductive portion 16 </ b> B formed on one main surface of the second transparent base 14 </ b> B (see FIG. 2A). Each of the second conductive portions 16B extends in the second direction (y direction) and is arranged in the first direction (x direction), and two or more second transparent conductive patterns configured by a large number of lattices. 18B and second auxiliary patterns 20B arranged around each second transparent conductive pattern 18B.

  The second transparent conductive pattern 18B is configured by connecting two or more second large lattices 24B in series in the second direction, and each second large lattice 24B is configured by combining two or more small lattices 26, respectively. ing. Further, the above-described second auxiliary pattern 20B that is not connected to the second large lattice 24B is formed around the side of the second large lattice 24B.

  Between the adjacent second large lattices 24B, second connection portions 28B that electrically connect the second large lattices 24B are formed. The second connection portion 28B is configured by arranging a medium lattice 30 having a size in which n (n is a real number larger than 1) small lattices 26 are arranged in the third direction. Of the sides perpendicular to the third direction of the second large lattice 24B, a portion adjacent to the middle lattice 30 is formed with a second notched portion 32B from which one side of the small lattice 26 is missing.

  Further, a second insulating portion 34B that is electrically insulated is disposed between the adjacent second transparent conductive patterns 18B.

  The second auxiliary pattern 20B includes a plurality of second auxiliary lines 36B (the fourth direction is defined as an axial direction) arranged along a side orthogonal to the fourth direction among the sides of the second large lattice 24B. Among the sides of the two large lattices 24B, each of the second auxiliary lines 36B (the third direction is the axial direction) arranged along the side orthogonal to the third direction and the second insulating portion 34B are 2 There are two second L-shaped patterns 38B in which two second auxiliary lines 36B are combined in an L shape, and are arranged opposite to each other.

  The length of each second auxiliary line 36 </ b> B in the axial direction has a length that is ½ of one side along the inner periphery of the small lattice 26. Each of the second auxiliary lines 36B is formed at a position separated from the second large lattice 24B by a predetermined distance (in this example, a length that is ½ of one side along the inner periphery of the small lattice 26). ing.

  As shown in FIG. 1, the second conductive sheet 12 </ b> B configured as described above is configured such that the open end of the second large lattice 24 </ b> B existing on one end side of each second transparent conductive pattern 18 </ b> B is a second connection. The portion 28B does not exist. The end of the second large lattice 24B existing on the other end side of each second transparent conductive pattern 18B is electrically connected to the second external wiring 42B via the second terminal 40B.

  The length of one side of the first large lattice 24A and the second large lattice 24B is preferably 3 to 10 mm, and more preferably 4 to 6 mm. If the length of one side is less than the lower limit value, the capacitance of the first large grid 24A and the second large grid 24B at the time of detection is reduced, so that the possibility of detection failure increases. On the other hand, if the upper limit is exceeded, the position detection accuracy may be reduced. From the same viewpoint, the length of one side of the small lattice 26 constituting the first large lattice 24A and the second large lattice 24B is preferably 50 to 500 μm, and more preferably 150 to 300 μm. When the small lattice 26 is in the above range, it is possible to keep the transparency even better, and when it is attached to the front surface of the display device, the display can be visually recognized without a sense of incongruity.

  The line width of the first transparent conductive pattern 18A (first large lattice 24A, medium lattice 30) and the line width of the second transparent conductive pattern 18B (second large lattice 24B, medium lattice 30) are 1 to 30 μm, respectively. It is.

  The line widths of the first auxiliary pattern 20A (first auxiliary line 36A) and the second auxiliary pattern 20B (second auxiliary line 36B) are 1 to 30 μm, respectively. In this case, the line width of the first transparent conductive pattern 18A and the line width of the second transparent conductive pattern 18B may be the same or different. However, it is preferable that the first transparent conductive pattern 18A, the second transparent conductive pattern 18B, the first auxiliary pattern 20A, and the second auxiliary pattern 20B have the same line width.

  For example, when the first conductive sheet 12A is laminated on the second conductive sheet 12B to form the first touch panel conductive sheet 10, as shown in FIG. 5, the first transparent conductive pattern 18A and the second transparent conductive pattern 18B. Specifically, the first connection portion 28A of the first transparent conductive pattern 18A and the second connection portion 28B of the second transparent conductive pattern 18B are connected to the first transparent base 14A ( 2A), the first insulating portion 34A of the first conductive portion 16A and the second insulating portion 34B of the second conductive portion 16B are opposed to each other with the first transparent base 14A interposed therebetween. It becomes.

  When the stacked first conductive sheet 12A and second conductive sheet 12B are viewed from above, the second large size of the second conductive sheet 12B is filled so as to fill the gaps of the first large lattice 24A formed in the first conductive sheet 12A. The lattice 24B is arranged. In other words, a large lattice is spread. At this time, a combination pattern 44 is formed between the first large lattice 24A and the second large lattice 24B so that the first auxiliary pattern 20A and the second auxiliary pattern 20B face each other.

  The combination pattern 44 has a form in which the first auxiliary line 36A and the second auxiliary line 36B do not overlap perpendicularly.

  That is, in the combination pattern 44, the combination pattern by the first auxiliary line 36A arranged along the side of the first large lattice 24A and the second auxiliary line 36B arranged along the side of the second large lattice 24B is 6A to 6C, the first axis 46A of the first auxiliary line 36A and the second axis 46B of the second auxiliary line 36B are substantially parallel to each other, and between the first axis 46A and the second axis 46B. The distance ha seen from the plane is ½ to 100 μm of the shorter one of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B (or the small lattice 26) Or less than 1/2 of the arrangement pitch). Here, the arrangement pitch of the small lattices 26 is substantially the same as the length of one side of the small lattices 26.

  In FIG. 6A, the distance ha between the first axis 46A and the second axis 46B is less than the sum of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. In this case, the first auxiliary line 36A and the second auxiliary line 36B partially overlap each other. In FIG. 6B, the distance ha between the first axis 46A and the second axis 46B is the sum of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. Indicates a case. FIG. 6C shows that the distance ha between the first axis 46A and the second axis 46B is the sum of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. It also shows a long case.

  Among the combination patterns 44, the first auxiliary lines 36A in the two first L-shaped patterns 38A of the first insulating portion 34A and the second auxiliary lines 36B in the two second L-shaped patterns 38B of the second insulating portion 34B, The combination pattern by has a form in which the small lattice 26 is not formed by four L-shaped patterns (38A, 38A, 38B, and 38B).

  That is, as shown in FIG. 7, two first L-shaped patterns 38A are positioned near one second L-shaped pattern 38B, and the other second L-shaped pattern 38B is one of these second L-shaped patterns 38B. And it becomes the form located away from two 1st L-shaped patterns 38A. Among these, one second L-shaped pattern 38B and two first L-shaped patterns 38A are one second auxiliary line 36B of two second auxiliary lines 36B constituting one second L-shaped pattern 38B. Of the first auxiliary line 36A of the two first auxiliary lines 36A constituting one of the first L-shaped patterns 38A are substantially parallel to each other. The distance ha between the axis 46A and the second axis 46B is ½ or more and 100 μm or less of the shorter one of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B ( Alternatively, it is 1/2 or less of the arrangement pitch of the small lattices 26).

  Similarly, of the two second auxiliary lines 36B constituting one second L-shaped pattern 38B, the second axis 46B of the other second auxiliary line 36B and 2 constituting the other first L-shaped pattern 38A. One first auxiliary line 36A of the first auxiliary lines 36A is substantially parallel to the first axis 46A, and the distance ha between the first axis 46A and the second axis 46B is equal to the first auxiliary line 36A. The line width Wa and the line width Wb of the second auxiliary line 36B are ½ to 100 μm of the shorter line width (or ½ or less of the arrangement pitch of the small lattices 26). The positional relationship between the second auxiliary line 36B and the first auxiliary line 36A in one second L-shaped pattern 38B and two first L-shaped patterns 38A is the same as that in FIGS. 6A to 6C.

  That is, the first conductive portion 16A and the second conductive portion 16B have the shorter one of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B in at least the third direction from the reference position. The line width is shifted by not less than 1/2 and not more than 100 μm (or not more than 1/2 of the arrangement pitch of the small lattices 26). In particular, in the present embodiment, one of the shorter line widths of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B in the third direction and the fourth direction, respectively, is ½. They are displaced by 100 μm or less (or ½ or less of the arrangement pitch of the small lattices 26).

  Here, as shown in FIG. 8, the first axis 46A of the first auxiliary line 36A coincides with the second axis 46B of the second auxiliary line 36B, and the reference position is the second auxiliary line 36A and the second auxiliary line 36A. A position where the auxiliary line 36B does not overlap and one end of the first auxiliary line 36A coincides with one end of the second auxiliary line 36B is shown.

  Thus, in the conductive sheet 10 for a touch panel according to the present embodiment, as shown in FIG. 5, the first auxiliary pattern 20A and the second auxiliary pattern 20B are interposed between the first large lattice 24A and the second large lattice 24B. Since the combination pattern 44 with the auxiliary pattern 20B is arranged, a space (the width corresponds to the length of the side of the small lattice 26 and the length is between the first large lattice 24A and the second large lattice 24B. (A blank corresponding to the length of the side of the first large lattice 24A or the second large lattice 24B) is not disposed, and the boundary between the first large lattice 24A and the second large lattice 24B is not conspicuous. .

  Moreover, in the combination pattern 44, the first auxiliary line 36A and the second auxiliary line 36B having a length that is ½ of one side along the inner periphery of the small lattice 26 are partially overlapped with each other. The length of the portion is very short compared with the length of each side of the first large lattice 24A and the second large lattice 24B, and is shorter than 1/20. Therefore, the part where the first auxiliary line 36A and the second auxiliary line 36B partially overlap is not noticeable, and the visibility is hardly deteriorated. This is the same in the combination of the first L-shaped pattern 38A and the second L-shaped pattern 38B. As shown in FIG. 7, in one of the second L-shaped pattern 38B and the two first L-shaped patterns 38A. The first auxiliary line 36 </ b> A and the second auxiliary line 36 </ b> B having a length that is ½ of one side along the inner periphery of the small lattice 26 are partially overlapped, and the length of the overlapped portion is Is very short compared to the length of each side of the first large lattice 24A and the second large lattice 24B, and is shorter than 1/20. Therefore, the part where the first auxiliary line 36A and the second auxiliary line 36B partially overlap is not noticeable, and the visibility is hardly deteriorated.

  Further, the first auxiliary line 36A and the second auxiliary line 36B are orthogonally overlapped on each side of the first large lattice 24A and the second large lattice 24B, but the first auxiliary line 36A and the second auxiliary line 36B are overlapped. Since the length in the axial direction is half the length of one side along the inner circumference of the small lattice 26, it is hardly noticeable.

  In addition, the middle lattice 30 of the first connection portion 28A and the middle lattice 30 of the second connection portion 28B are orthogonally overlapped. In this case, the first conductive portion 16A and the second conductive portion 16B are in the third direction. Therefore, there is a portion where the shape of the small lattice 26 is not uniform. However, the number of portions where the small lattices 26 are non-uniform is the first large number that exists in the four directions where the medium lattice 30 of the first connection portion 28A and the medium lattice 30 of the second connection portion 28B are orthogonally overlapped. Since the number of the small lattices 26 of the lattice 24A is smaller than the number of the small lattices 26 of the second large lattice 24B (about 5%), the nonuniformity of the small lattices 26 is hardly noticeable. In addition, since the first missing portion 32A and the second missing portion 32B are formed adjacent to the middle lattice 30 in the first larger lattice 24A and the second larger lattice 24B, the straight portion of the middle lattice 30 is the first portion. The straight line portion of the first large lattice 24A and the straight line portion of the second large lattice 24B do not overlap, and the visibility is hardly deteriorated.

  And when using this conductive sheet 10 for touch panels as a touch panel, a protective layer is formed on the first conductive sheet 12A, and the first external part derived from the many first transparent conductive patterns 18A of the first conductive sheet 12A. The wiring 42A and the second external wiring 42B derived from the multiple second transparent conductive patterns 18B of the second conductive sheet 12B are connected to, for example, an IC circuit that controls scanning. At this time, each of the first transparent conductive pattern 18A and the first external wiring 42A is reduced so that the area of the outer peripheral region (frame region) out of the display screen of the liquid crystal display device of the conductive sheet for touch panel 10 becomes as small as possible. It is preferable that the connection portions are arranged in a straight line, and the connection portions between the second transparent conductive pattern 18B and the second external wiring 42B are arranged in a straight line.

  By bringing the fingertip into contact with the protective layer, the capacitance between the first transparent conductive pattern 18A and the second transparent conductive pattern 18B facing the fingertip changes. The IC circuit detects the amount of change and calculates the position of the fingertip based on the amount of change. This calculation is performed between each first transparent conductive pattern 18A / second transparent conductive pattern 18B. Therefore, even if two or more fingertips are brought into contact with each other at the same time, the position of each fingertip can be detected.

  Thus, in the conductive sheet 10 for a touch panel, when the conductive sheet 10 for a touch panel is applied to, for example, a projected capacitive touch panel, the response speed can be increased because the surface resistance is small. The touch panel can be increased in size.

  In addition, even if the first conductive portion 16A and the second conductive portion 16B are shifted from each other, as described above, the first large lattice 24A of the first conductive sheet 12A and the second large lattice of the second conductive sheet 12B. The boundary with 24B becomes inconspicuous, and there is no inconvenience such as local thickening of the line, and the visibility is improved as a whole. Further, the first large lattice 24A and the second large lattice 24B are arranged adjacent to each other, and a large number of regular small lattices 26 are arranged between the first large lattice 24A and the second large lattice 24B. An arrangement different from the above-described arrangement of the small lattices 26 due to the shifted arrangement of the first auxiliary line 36A and the second auxiliary line 36B is mixed, so that a large number of spatial frequencies are combined. As a result, interference with the pixel arrangement of the liquid crystal display device is suppressed, and the occurrence of moire can be effectively reduced.

  In the above-described conductive sheet 10 for a touch panel, the shape of the small lattice 26 is a square shape, but may be a polygonal shape. Further, the shape of one side may be a curved shape or a circular arc shape in addition to a linear shape. In the case of an arc shape, for example, two opposing sides may be outwardly convex arc shapes, and the other two opposing sides may be inwardly convex arc shapes. The shape of each side may be a wavy shape in which an outwardly convex arc and an inwardly convex arc are continuous. Of course, the shape of each side may be a sine curve.

  In the first conductive sheet 12A and the second conductive sheet 12B described above, the size of the middle lattice 30 constituting the first connection portion 28A and the second connection portion 28B is set to the size of three small lattices 26. However, other combinations such as 1.5, 2 and 2.5 can be set. If the medium lattice 30 is too large, it becomes difficult to arrange the first large lattice 24A and the second large lattice 24B, and the capacitance change at the intersection that should not be detected becomes large. The size of the small lattice 26 is preferable.

  The size of the small lattice 26 (the length of one side, the length of the diagonal line, etc.), the number of small lattices 26 constituting the first large lattice 24A, and the number of small lattices 26 constituting the second large lattice 24B are also as follows. It can be set as appropriate according to the size and resolution (number of wires) of the applied touch panel.

  In the conductive sheet 10 for a touch panel described above, as shown in FIGS. 1 and 2A, the first conductive portion 16A is formed on one main surface of the first transparent base 14A, and the second main surface of the second transparent base 14B is second. The conductive portion 16B is formed and laminated. In addition, as shown in FIG. 2B, the first conductive portion 16A is formed on one main surface of the first transparent base 14A, and other than the first transparent base 14A. The second conductive portion 16B may be formed on the main surface. In addition, there may be another layer between the first conductive sheet 12A and the second conductive sheet 12B, and if the first transparent conductive pattern 18A and the second transparent conductive pattern 18B are in an insulating state, they are You may arrange | position facing.

Next, a method for manufacturing the first conductive sheet 12A and the second conductive sheet 12B will be described.
When manufacturing the first conductive sheet 12A and the second conductive sheet 12B, for example, a photosensitive material having an emulsion layer containing a photosensitive silver halide salt on the first transparent substrate 14A and the second transparent substrate 14B is exposed. By performing development processing, the first conductive portion 16A and the second conductive portion 16B may be formed by forming a metal silver portion and a light transmissive portion in the exposed portion and the unexposed portion, respectively. In addition, you may make it carry | support a conductive metal to a metal silver part by giving a physical development and / or a plating process to a metal silver part further.

  Alternatively, the photoresist film on the copper foil formed on the first transparent substrate 14A and the second transparent substrate 14B is exposed and developed to form a resist pattern, and the copper foil exposed from the resist pattern is etched. The first conductive portion 16A and the second conductive portion 16B may be formed.

  Alternatively, the first conductive portion 16A and the second conductive portion 16B are formed by printing a paste containing metal fine particles on the first transparent substrate 14A and the second transparent substrate 14B and performing metal plating on the paste. Also good.

  The first conductive portion 16A and the second conductive portion 16B may be printed and formed on the first transparent substrate 14A and the second transparent substrate 14B by a screen printing plate or a gravure printing plate.

  Next, in the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment, a method using a silver halide photographic light-sensitive material that is a particularly preferable aspect will be mainly described.

The manufacturing method of the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment includes the following three modes depending on the mode of the photosensitive material and the development process.
(1) A mode in which a photosensitive silver halide black-and-white photosensitive material not containing physical development nuclei is chemically developed or thermally developed to form a metallic silver portion on the photosensitive material.
(2) An embodiment in which a photosensitive silver halide black-and-white photosensitive material containing physical development nuclei in a silver halide emulsion layer is dissolved and physically developed to form a metallic silver portion on the photosensitive material.
(3) A photosensitive silver halide black-and-white photosensitive material containing no physical development nuclei and an image receiving sheet having a non-photosensitive layer containing physical development nuclei are overlapped and developed by diffusion transfer, and the metallic silver portion is non-photosensitive image-receiving sheet. Form formed on top.

The aspect (1) is an integrated black-and-white development type, and a light-transmitting conductive film is formed on a photosensitive material. The resulting developed silver is chemically developed silver or heat developed silver, and is highly active in the subsequent plating or physical development process in that it is a filament with a high specific surface.
In the above aspect (2), the light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material by dissolving silver halide grains close to the physical development nucleus and depositing on the development nucleus in the exposed portion. A characteristic film is formed. This is also an integrated black-and-white development type. Although the development action is precipitation on the physical development nuclei, it is highly active, but developed silver is a sphere with a small specific surface.
In the above aspect (3), the silver halide grains are dissolved and diffused in the unexposed area and deposited on the development nuclei on the image receiving sheet, whereby a light transmitting conductive film or the like is formed on the image receiving sheet. A conductive film is formed. This is a so-called separate type in which the image receiving sheet is peeled off from the photosensitive material.

  In either embodiment, either negative development processing or reversal development processing can be selected (in the case of the diffusion transfer method, negative development processing is possible by using an auto-positive type photosensitive material as the photosensitive material). .

  The chemical development, thermal development, dissolution physical development, and diffusion transfer development mentioned here have the same meanings as are commonly used in the industry, and are general textbooks of photographic chemistry such as Shinichi Kikuchi, “Photochemistry” (Kyoritsu Publishing) (Published in 1955), C.I. E. K. It is described in "The Theory of Photographic Processes, 4th ed." Edited by Mees (Mcmillan, 1977). Although this case is an invention related to liquid processing, a technique of applying a thermal development system as another development system can also be referred to. For example, the techniques described in Japanese Patent Application Laid-Open Nos. 2004-184893, 2004-334077, and 2005-010752, and Japanese Patent Application Nos. 2004-244080 and 2004-085655 can be applied. it can.

Here, the configuration of each layer of the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment will be described in detail below.
[First Transparent Base 14A, Second Transparent Base 14B]
Examples of the first transparent substrate 14A and the second transparent substrate 14B include a plastic film, a plastic plate, and a glass plate.
Examples of the raw material for the plastic film and the plastic plate include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); polyolefins such as polyethylene (PE), polypropylene (PP), polystyrene, and EVA; Resin; In addition, polycarbonate (PC), polyamide, polyimide, acrylic resin, triacetyl cellulose (TAC) and the like can be used.
As the first transparent substrate 14A and the second transparent substrate 14B, PET (melting point: 258 ° C.), PEN (melting point: 269 ° C.), PE (melting point: 135 ° C.), PP (melting point: 163 ° C.), polystyrene (melting point: 230 ° C.), polyvinyl chloride (melting point: 180 ° C.), polyvinylidene chloride (melting point: 212 ° C.), TAC (melting point: 290 ° C.) or the like, preferably a plastic film having a melting point of about 290 ° C. or less, or a plastic plate, In particular, PET is preferable from the viewpoints of light transmittance and processability. Since the transparent conductive films such as the first conductive sheet 12A and the second conductive sheet 12B used in the touch panel conductive sheet 10 are required to be transparent, the transparency of the first transparent base 14A and the second transparent base 14B is as follows. High is preferred.

[Silver salt emulsion layer]
First conductive portion 16A (first large lattice 24A, first connection portion 28A, first auxiliary pattern 20A, etc.) of first conductive sheet 12A and second conductive portion 16B (second large lattice 24B, second conductive sheet 12B). The silver salt emulsion layer to be the second connection portion 28B, the second auxiliary pattern 20B, etc.) contains additives such as a solvent and a dye in addition to the silver salt and the binder.
Examples of the silver salt used in the present embodiment include inorganic silver salts such as silver halide and organic silver salts such as silver acetate. In the present embodiment, it is preferable to use silver halide having excellent characteristics as an optical sensor.
Silver coating amount of silver salt emulsion layer (coating amount of silver salt) is preferably from 1 to 30 g / ^{m 2} in terms of silver, more preferably 1 to 25 g / ^{m 2,} more preferably 5 to 20 g / ^{m 2} . By setting the amount of coated silver in the above range, a desired surface resistance can be obtained when the conductive sheet 10 for a touch panel is used.
Examples of the binder used in this embodiment include gelatin, polyvinyl alcohol (PVA), polyvinyl pyrrolidone (PVP), starch and other polysaccharides, cellulose and derivatives thereof, polyethylene oxide, polyvinyl amine, chitosan, polylysine, and polyacryl. Examples include acid, polyalginic acid, polyhyaluronic acid, carboxycellulose and the like. These have neutral, anionic, and cationic properties depending on the ionicity of the functional group.
The content of the binder contained in the silver salt emulsion layer of the present embodiment is not particularly limited, and can be appropriately determined as long as dispersibility and adhesion can be exhibited. The binder content in the silver salt emulsion layer is preferably ¼ or more, more preferably ½ or more in terms of the silver / binder volume ratio. The silver / binder volume ratio is preferably 100/1 or less, and more preferably 50/1 or less. The silver / binder volume ratio is more preferably 1/1 to 4/1. Most preferably, it is 1/1 to 3/1. By setting the silver / binder volume ratio in the silver salt emulsion layer within this range, even when the amount of coated silver is adjusted, variation in resistance value can be suppressed, and a conductive sheet for touch panel having uniform surface resistance can be obtained. . The silver / binder volume ratio is converted from the amount of silver halide / binder amount (weight ratio) of the raw material to the amount of silver / binder amount (weight ratio), and the amount of silver / binder amount (weight ratio) is further converted to the amount of silver. / It can obtain | require by converting into binder amount (volume ratio).

<Solvent>
The solvent used for forming the silver salt emulsion layer is not particularly limited. For example, water, organic solvents (for example, alcohols such as methanol, ketones such as acetone, amides such as formamide, dimethyl sulfoxide, etc. Sulphoxides such as, esters such as ethyl acetate, ethers, etc.), ionic liquids, and mixed solvents thereof.
The content of the solvent used in the silver salt emulsion layer of the present embodiment is in the range of 30 to 90% by mass with respect to the total mass of the silver salt and binder contained in the silver salt emulsion layer, and 50 to 80 It is preferably in the range of mass%.

<Other additives>
There are no particular restrictions on the various additives used in the present embodiment, and known ones can be preferably used.

[Other layer structure]
A protective layer (not shown) may be provided on the silver salt emulsion layer. In the present embodiment, the “protective layer” means a layer made of a binder such as gelatin or a high molecular polymer, and is formed on a silver salt emulsion layer having photosensitivity in order to exhibit an effect of preventing scratches and improving mechanical properties. It is formed. The thickness is preferably 0.5 μm or less. The coating method and forming method of the protective layer are not particularly limited, and a known coating method and forming method can be appropriately selected. An undercoat layer, for example, can be provided below the silver salt emulsion layer.

Next, each step of the manufacturing method of the first conductive sheet 12A and the second conductive sheet 12B will be described.
[exposure]
In the present embodiment, the case where the first conductive portion 16A and the second conductive portion 16B are applied by a printing method is included, but the first conductive portion 16A and the second conductive portion 16B are formed by exposure and development, etc., except for the printing method. To do. That is, exposure is performed on a photosensitive material having a silver salt-containing layer provided on the first transparent substrate 14A and the second transparent substrate 14B or a photosensitive material coated with a photolithography photopolymer. The exposure can be performed using electromagnetic waves. Examples of the electromagnetic wave include light such as visible light and ultraviolet light, and radiation such as X-rays. Furthermore, a light source having a wavelength distribution may be used for exposure, or a light source having a specific wavelength may be used.
Regarding the exposure method, a method through a glass mask or a pattern exposure method by laser drawing is preferable.

[Development processing]
In this embodiment, after the emulsion layer is exposed, development processing is further performed. The development processing can be performed by a normal development processing technique used for silver salt photographic film, photographic paper, printing plate-making film, photomask emulsion mask, and the like. The developer is not particularly limited, but a PQ developer, MQ developer, MAA developer and the like can also be used. Commercially available products include, for example, CN-16, CR-56, CP45X, and FD prescribed by FUJIFILM Corporation. -3, Papitol, a developer such as C-41, E-6, RA-4, D-19, D-72, etc. formulated by KODAK, or a developer included in the kit can be used. A lith developer can also be used.
The development processing in the present invention can include a fixing processing performed for the purpose of removing and stabilizing the silver salt in the unexposed portion. For the fixing process in the present invention, a fixing process technique used for silver salt photographic film, photographic paper, film for printing plate making, emulsion mask for photomask, and the like can be used.
The fixing temperature in the fixing step is preferably about 20 ° C. to about 50 ° C., more preferably 25 to 45 ° C. The fixing time is preferably 5 seconds to 1 minute, more preferably 7 seconds to 50 seconds. The replenishing amount of the fixing solution is preferably 600 ml / ^{m 2} or less with respect to the processing of the photosensitive material, more preferably 500 ml / ^{m 2} or less, 300 ml / ^{m 2} or less is particularly preferred.
The light-sensitive material that has been subjected to development and fixing processing is preferably subjected to water washing treatment or stabilization treatment. In the water washing treatment or the stabilization treatment, the washing water amount is usually 20 liters or less per 1 m ^{2 of the} light-sensitive material, and can be replenished in 3 liters or less (including 0, ie, rinsing with water).
The mass of the metallic silver contained in the exposed portion after the development treatment is preferably a content of 50% by mass or more, and 80% by mass or more with respect to the mass of silver contained in the exposed portion before exposure. More preferably. If the mass of silver contained in the exposed portion is 50% by mass or more based on the mass of silver contained in the exposed portion before exposure, it is preferable because high conductivity can be obtained.
The gradation after the development processing in the present embodiment is not particularly limited, but is preferably more than 4.0. When the gradation after the development processing exceeds 4.0, the conductivity of the conductive metal portion can be increased while keeping the light transmissive property of the light transmissive portion high. Examples of means for setting the gradation to 4.0 or higher include the aforementioned doping of rhodium ions and iridium ions.
Although the conductive sheet is obtained through the above steps, the surface resistance of the obtained conductive sheet is 100 ohm / sq. The following is preferable, 0.1-100 ohm / sq. Is preferably in the range of 1 to 10 ohm / sq. It is more preferable that it is in the range. By adjusting the surface resistance within such a range, position detection can be performed even with a large touch panel having an area of 10 cm × 10 cm or more. Further, the conductive sheet after the development treatment may be further subjected to a calendar treatment, and can be adjusted to a desired surface resistance by the calendar treatment.

[Physical development and plating]
In the present embodiment, for the purpose of improving the conductivity of the metallic silver portion formed by the exposure and development processing, physical development and / or plating treatment for supporting the conductive metal particles on the metallic silver portion is performed. May be. In the present invention, the conductive metal particles may be supported on the metallic silver portion by only one of physical development and plating treatment, or the conductive metal particles are supported on the metallic silver portion by combining physical development and plating treatment. May be. In addition, the thing which performed the physical development and / or the plating process to the metal silver part is called "conductive metal part".
“Physical development” in the present embodiment means that metal particles such as silver ions are reduced by a reducing agent on metal or metal compound nuclei to deposit metal particles. This physical phenomenon is used for instant B & W film, instant slide film, printing plate manufacturing, and the like, and the technology can be used in the present invention.
Further, the physical development may be performed simultaneously with the development processing after exposure or separately after the development processing.
In the present embodiment, the plating treatment can use electroless plating (chemical reduction plating or displacement plating), electrolytic plating, or both electroless plating and electrolytic plating. For the electroless plating in the present embodiment, a known electroless plating technique can be used, for example, an electroless plating technique used in a printed wiring board or the like can be used. Plating is preferred.

[Oxidation treatment]
In the present embodiment, it is preferable to subject the metallic silver portion after the development treatment and the conductive metal portion formed by physical development and / or plating treatment to oxidation treatment. By performing the oxidation treatment, for example, when a metal is slightly deposited on the light transmissive portion, the metal can be removed and the light transmissive portion can be made almost 100% transparent.

[Conductive metal part]
The line width of the conductive metal portion of the present embodiment is preferably 1 μm or more and 30 μm or less, but preferably 1 μm or more and 15 μm or less. More preferably, they are 5 micrometers or more and 10 micrometers or less, Most preferably, they are 5 micrometers or more and 9 micrometers or less. When the line width is less than the above lower limit value, the conductivity becomes insufficient, so that when used for a touch panel, the detection sensitivity becomes insufficient. On the other hand, when the above upper limit is exceeded, moire caused by the conductive metal portion becomes noticeable, or visibility is deteriorated when used for a touch panel. In addition, by being in the said range, the moire of an electroconductive metal part is improved and visibility becomes especially good. The line spacing is preferably 30 μm or more and 500 μm or less, more preferably 50 μm or more and 400 μm or less, and most preferably 100 μm or more and 350 μm or less. The conductive metal portion may have a portion whose line width is wider than 30 μm for the purpose of ground connection or the like.
The conductive metal portion in the present embodiment has an aperture ratio (transmittance) of preferably 85% or higher, more preferably 90% or higher, and 95% or higher in terms of visible light transmittance. Is most preferred. The aperture ratio is the ratio of the entire light-transmitting portion excluding the conductive portions of the first conductive portion 16A and the second conductive portion 16B. For example, the aperture ratio is a square lattice shape with a line width of 15 μm and a pitch of 300 μm. Is 90%.

[Light transmissive part]
The “light transmissive part” in the present embodiment means a part having translucency other than the conductive metal part in the first conductive sheet 12A and the second conductive sheet 12B. As described above, the transmittance in the light transmissive portion is the transmission indicated by the minimum value of the transmittance in the wavelength region of 380 to 780 nm excluding contributions of light absorption and reflection of the first transparent substrate 14A and the second transparent substrate 14B. The rate is 90% or more, preferably 95% or more, more preferably 97% or more, even more preferably 98% or more, and most preferably 99% or more.

[First conductive sheet 12A and second conductive sheet 12B]
The thickness of the first transparent substrate 14A and the second transparent substrate 14B in the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment is preferably 5 to 350 μm, and more preferably 30 to 150 μm. Further preferred. If it is the range of 5-350 micrometers, the transmittance | permeability of a desired visible light will be obtained and handling will also be easy.
The thickness of the metallic silver portion provided on the first transparent substrate 14A and the second transparent substrate 14B depends on the coating thickness of the silver salt-containing layer coating applied on the first transparent substrate 14A and the second transparent substrate 14B. Can be determined as appropriate. The thickness of the metallic silver portion can be selected from 0.001 mm to 0.2 mm, but is preferably 30 μm or less, more preferably 20 μm or less, and further preferably 0.01 to 9 μm. And most preferably 0.05 to 5 μm. Moreover, it is preferable that a metal silver part is pattern shape. The metallic silver part may be a single layer or a multilayer structure of two or more layers. When the metallic silver portion is patterned and has a multilayer structure of two or more layers, different color sensitivities can be imparted so as to be sensitive to different wavelengths. Thereby, when the exposure wavelength is changed and exposed, a different pattern can be formed in each layer.
As the thickness of the conductive metal part, the thinner the display panel, the wider the viewing angle of the display panel, and the thinner the display is required for improving the visibility. From such a viewpoint, the thickness of the layer made of the conductive metal carried on the conductive metal part is preferably less than 9 μm, more preferably 0.1 μm or more and less than 5 μm, and more preferably 0.1 μm or more. More preferably, it is less than 3 μm.
In the present embodiment, the thickness of the layer made of conductive metal particles is formed by controlling the coating thickness of the silver salt-containing layer described above to form a metallic silver portion having a desired thickness, and further by physical development and / or plating treatment. Therefore, even the first conductive sheet 12A and the second conductive sheet 12B having a thickness of less than 5 μm, preferably less than 3 μm can be easily formed.
In addition, in the manufacturing method of the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment, steps such as plating are not necessarily performed. In the manufacturing method of the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment, a desired surface resistance can be obtained by adjusting the coating silver amount of the silver salt emulsion layer and the silver / binder volume ratio. It is. In addition, you may perform a calendar process etc. as needed.

(Hardening after development)
It is preferable to perform a film hardening process by immersing the film in a hardener after the silver salt emulsion layer is developed. Examples of the hardener include dialdehydes such as glutaraldehyde, adipaldehyde, 2,3-dihydroxy-1,4-dioxane, and those described in JP-A-2-141279 such as boric acid. it can.

  In addition, this invention can be used in combination with the technique of the publication gazette and international publication pamphlet which are described in following Table 1 and Table 2. FIG. Notations such as “JP,” “Gazette” and “No. Pamphlet” are omitted.

In the above-described example, the first transparent conductive pattern 18A is configured by connecting two or more first large lattices 24A in series in the first direction, and the second transparent conductive pattern 18B is formed by two or more second large lattices 24B. In this example, the first transparent conductive pattern 18A is made of, for example, two or more diamond-shaped transparent electrodes made of an ITO (indium tin oxide) film in the first direction. For example, the second transparent conductive pattern 18B may be configured by connecting, for example, two or more diamond-shaped transparent electrodes made of an ITO film in series in the second direction.
In this case as well, a large number of regular transparent electrode arrangements due to the transparent electrodes made of ITO films being arranged adjacent to each other, and a shift between the first auxiliary line 36A and the second auxiliary line 36B formed between the transparent electrodes. The arrangement of the transparent electrodes different from the arrangement of the transparent electrodes described above is mixed, so that a large number of spatial frequencies are combined. As a result, interference with the pixel arrangement of the liquid crystal display device is suppressed, and moiré is generated. Can be effectively reduced.
Moreover, you may provide functional layers, such as an antireflection layer and a hard-coat layer, to a conductive sheet.

Hereinafter, the present invention will be described more specifically with reference to examples of the present invention. In addition, the material, usage-amount, ratio, processing content, processing procedure, etc. which are shown in the following Examples can be changed suitably unless it deviates from the meaning of this invention. Accordingly, the scope of the present invention should not be construed as being limited by the specific examples shown below.
In this example, moiré and visibility of the touch panels according to Comparative Examples 1 to 3 and Examples 1 to 20 were evaluated. The breakdown and evaluation results of Comparative Examples 1 to 3 and Examples 1 to 20 are shown in Table 3 described later.

[Example 1]
(Silver halide photosensitive material)
An emulsion containing 10.0 g of gelatin per 150 g of Ag in an aqueous medium and containing silver iodobromochloride grains having an average equivalent sphere diameter of 0.1 μm (I = 0.2 mol%, Br = 40 mol%) was prepared. .
In this emulsion, K ₃ Rh ₂ Br ₉ and K ₂ IrCl ₆ were added so as to have a concentration of 10 ⁻⁷ (mol / mol silver), and silver bromide grains were doped with Rh ions and Ir ions. . After adding Na ₂ PdCl ₄ to this emulsion and further performing gold-sulfur sensitization using chloroauric acid and sodium thiosulfate, together with the gelatin hardener, the coating amount of silver was 10 g / m ^2. The first transparent substrate 14A and the second transparent substrate 14B (here, both polyethylene terephthalate (PET)) were applied. At this time, the volume ratio of Ag / gelatin was 2/1.
Coating was performed for 20 m with a width of 25 cm on a PET support having a width of 30 cm, and both ends were cut off by 3 cm so as to leave a central portion of the coating, thereby obtaining a roll-shaped silver halide photosensitive material.

(exposure)
The pattern of exposure is the pattern shown in FIGS. 1 and 3 for the first conductive sheet 12A of the conductive sheet 10 for the touch panel, and the pattern shown in FIGS. 1 and 4 for the second conductive sheet 12B. 297 mm) of the first transparent substrate 14A and the second transparent substrate 14B were exposed . The exposure was performed using parallel light using a high-pressure mercury lamp as a light source through the photomask having the above pattern.

(Development processing)
・ Developer 1L formulation Hydroquinone 20 g
Sodium sulfite 50 g
Potassium carbonate 40 g
Ethylenediamine tetraacetic acid 2 g
Potassium bromide 3 g
Polyethylene glycol 2000 1 g
Potassium hydroxide 4 g
Adjusted to pH 10.3 and formulated 1L fixer ammonium thiosulfate solution (75%) 300 ml
Ammonium sulfite monohydrate 25 g
1,3-diaminopropane tetraacetic acid 8 g
Acetic acid 5 g
Ammonia water (27%) 1 g
Adjusted to pH 6.2 Processed photosensitive material using the above processing agent using Fujifilm's automatic processor FG-710PTS Processing conditions: development 35 ° C. for 30 seconds, fixing 34 ° C. for 23 seconds, washed water (5 L / Min) for 20 seconds.

(Touch panel)
After the first conductive sheet 12A was laminated on the second conductive sheet 12B to obtain a conductive sheet for touch panel, the touch panel conductive sheet was pasted on the display screen of the liquid crystal display device to configure the touch panel according to Example 1. In Example 1, as shown in Table 3 described later, the line width of the conductive portion (the first transparent conductive pattern 18A, the first auxiliary pattern 20A, the second transparent conductive pattern 18B, and the second auxiliary pattern 20B) is 5 μm. The length of one side of the small lattice 26 is 50 μm, the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 3 mm, and the amount of deviation in the third direction and the fourth direction (hereinafter, (Denoted as the amount of deviation) is 2.5 μm.

[Examples 2 to 4]
The touch panels according to Examples 2, 3, and 4 were manufactured in the same manner as in Example 1 described above except that the amounts of displacement were 5 μm, 10 μm, and 25 μm, respectively.
[Example 5]
In the touch panel according to Example 5, the line width of the conductive portion is 7 μm, the length of one side of the small lattice 26 is 250 μm, the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 5 mm, It was produced in the same manner as in Example 1 except that the amount of deviation was 50 μm.
[Example 6]
In the touch panel according to Example 6, the line width of the conductive portion is 8 μm, the length of one side of the small lattice 26 is 250 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 5 mm. Except for the above, it was fabricated in the same manner as in Example 1 described above.
[Examples 7 to 12]
The touch panels according to Examples 7, 8, 9, 10, 11, and 12 were produced in the same manner as Example 6 described above, except that the shift amounts were 4 μm, 10 μm, 30 μm, 50 μm, 100 μm, and 125 μm, respectively. .
[Example 13]
The touch panel according to Example 13 was manufactured in the same manner as in Example 7 described above except that the line width of the conductive portion was 9 μm and the shift amount was 50 μm.
[Example 14]
In the touch panel according to Example 14, the line width of the conductive portion is 10 μm, the length of one side of the small lattice 26 is 300 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 6 mm. Except for the above, it was fabricated in the same manner as in Example 1 described above.
[Examples 15 to 20]
The touch panels according to Examples 15, 16, 17, 18, 19, and 20 were produced in the same manner as in Example 14 described above, except that the shift amounts were 4 μm, 10 μm, 30 μm, 50 μm, 100 μm, and 150 μm, respectively. .

[Comparative Examples 1-3]
The touch panel according to Comparative Example 1 was manufactured in the same manner as Example 1 described above except that the shift amount was 0 μm.
The touch panel according to Comparative Example 2 was manufactured in the same manner as in Example 6 described above, except that the shift amount was 0 μm.
The touch panel according to Comparative Example 3 was manufactured in the same manner as Example 14 described above except that the shift amount was 0 μm.

[Evaluation]
(Evaluation of moire)
A touch panel is installed on the turntable and the liquid crystal display device is driven to display white. In this state, the rotating disk was rotated between a bias angle of −20 ° and + 20 °, and the moire was visually observed and evaluated.
Moire is evaluated at an observation distance of 1.5 m from the display screen of the liquid crystal display device. If moire does not appear, ○, if moire is seen only slightly at a level where there is no problem, moiré becomes apparent. The case where it did is made x.
(Visibility evaluation)
Prior to the above moire evaluation, when the touch panel was installed on a turntable and the liquid crystal display device was driven to display white, it was visually confirmed that there were no thick lines or black spots on the surface of the touch panel. .
(Evaluation results)
In Examples 12 and 20, only a few thick lines and black spots were confirmed, and the visibility was good overall.
About moire, the moire became obvious in Comparative Examples 1-3. On the other hand, Examples 1-20 were generally good in evaluation, and no moire was evident in Examples 3-5, 8-11, 13, 16-19. In Examples 1, 6, and 14, moiré was only slightly observed at a level where there was no problem. Examples 2, 7, 12, 15, and 20 were intermediate levels between “Δ” and “◯”.

  As shown in FIG. 2B, the first conductive portion 16A is formed on one main surface of the first transparent base 14A, and the second conductive portion 16B is formed on the other main surface of the first transparent base 14A. In the case where the touch panel was produced in the same manner as in 3 and Examples 1 to 20, the same evaluation results as described above were obtained.

  Of course, the touch panel and the conductive sheet according to the present invention are not limited to the above-described embodiments, and various configurations can be adopted without departing from the gist of the present invention.

DESCRIPTION OF SYMBOLS 10 ... Conductive sheet for touchscreens 12A ... 1st conductive sheet 12B ... 2nd conductive sheet 14A ... 1st transparent base | substrate 14B ... 2nd transparent base | substrate 16A ... 1st conductive part 16B ... 2nd conductive part 18A ... 1st transparent conductive pattern 18B ... 2nd transparent conductive pattern 20A ... 1st auxiliary pattern 20B ... 2nd auxiliary pattern 24A ... 1st large lattice 24B ... 2nd large lattice 26 ... Small lattice 28A ... 1st connection part 28B ... 2nd connection part 30 ... Medium lattice 32A ... 1st missing part 32B ... 2nd missing part 34A ... 1st insulating part 34B ... 2nd insulating part 36A ... 1st auxiliary line 36B ... 2nd auxiliary line 44 ... Combination pattern 46A ... 1st axis 46B ... 1st 2 axis

Claims (16)

In a touch panel having a conductive sheet for a touch panel,
The conductive sheet for touch panel is
A substrate;
A first conductive portion formed on one main surface of the substrate;
A second conductive portion formed on the other main surface of the base body,
The first conductive portions each extend in a first direction and are arranged in a second direction orthogonal to the first direction, and two or more first transparent conductive patterns configured by a number of lattices; A first auxiliary pattern comprising a plurality of first auxiliary lines arranged around each first transparent conductive pattern,
Each of the second conductive parts extends in the second direction and is arranged in the first direction, and includes two or more second transparent conductive patterns configured by a number of lattices, and each second transparent conductive pattern. And a second auxiliary pattern consisting of a plurality of second auxiliary lines arranged around
When viewed from above, the first conductive portion and the second conductive portion are configured such that the first transparent conductive pattern and the second transparent conductive pattern intersect with each other, and the first direction. When the direction that bisects the second direction and the second direction is the third direction, and the direction orthogonal to the third direction is the fourth direction, the first auxiliary line extends from the reference position at least in the third direction. A touch panel, wherein the touch panel is arranged so as to be shifted by not less than ½ and not more than 100 μm of the shorter one of the width and the line width of the second auxiliary line. The touch panel according to claim 1.
The touch panel according to claim 1, wherein the first conductive portion and the second conductive portion are arranged with a deviation of 50 μm or less. The touch panel according to claim 1.
The touch panel according to claim 1, wherein the first conductive portion and the second conductive portion are arranged with a deviation of 30 μm or less. The touch panel according to claim 1.
The reference position is
The first axis of the first auxiliary line and the second axis of the second auxiliary line coincide with each other, the first auxiliary line and the second auxiliary line do not overlap, and the first auxiliary line A touch panel characterized by showing a position where one end and one end of the second auxiliary line coincide. In the touch panel of any one of Claims 1-4,
A combination pattern is formed between the first transparent conductive pattern and the second transparent conductive pattern by the first auxiliary pattern and the second auxiliary pattern facing each other,
The touch panel according to claim 1, wherein the combination pattern has a form in which the first auxiliary line and the second auxiliary line do not overlap at right angles. The touch panel according to claim 5,
In the combination pattern, the first axis of the first auxiliary line and the second axis of the second auxiliary line are substantially parallel, and the distance between the first axis and the second axis is the first auxiliary line. A touch panel having a line width of ½ of the shorter one of the line width of the second auxiliary line and the line width of the second auxiliary line. The touch panel according to claim 6.
The touch panel is characterized in that the distance between the first axis and the second axis is the sum of 1/2 of the line width of the first auxiliary line and 1/2 of the line width of the second auxiliary line. . The touch panel according to claim 6.
The distance between the first axis and the second axis is less than the sum of 1/2 of the line width of the first auxiliary line and 1/2 of the line width of the second auxiliary line. Touch panel. In the touch panel according to any one of claims 6 to 8,
The touch panel, wherein the combination pattern has a form in which the first auxiliary line and the second auxiliary line partially overlap. The touch panel according to claim 6.
The distance between the first axis and the second axis is longer than the sum of 1/2 of the line width of the first auxiliary line and 1/2 of the line width of the second auxiliary line. Touch panel. The touch panel according to any one of claims 1 to 10,
The first transparent conductive pattern includes two or more first large lattices connected in series in the first direction,
The second transparent conductive pattern includes two or more second large lattices connected in series in the second direction,
Each of the first large lattice and each of the second large lattices is configured by combining two or more small lattices,
The first auxiliary pattern disconnected from the first large lattice is formed around a side of the first large lattice,
The touch panel, wherein the second auxiliary pattern that is not connected to the second large lattice is formed around a side of the second large lattice. The touch panel according to claim 11,
The touch panel, wherein the first conductive portion and the second conductive portion are arranged with a shift of ½ or less of an arrangement pitch of small lattices. The touch panel according to claim 11 or 12,
A length of one side of the small lattice is 50 to 500 μm. The touch panel according to any one of claims 11 to 13,
A length of one side of the first large lattice and the second large lattice is 3 to 10 mm. In the touch panel of any one of Claims 1-14,
The line width of the said 1st electroconductive part and the said 2nd electroconductive part is 1-30 micrometers, The touch panel characterized by the above-mentioned. A substrate;
A first conductive portion formed on one main surface of the substrate;
A second conductive portion formed on the other main surface of the base body,
The first conductive portions each extend in a first direction and are arranged in a second direction orthogonal to the first direction, and two or more first transparent conductive patterns configured by a number of lattices; A first auxiliary pattern comprising a plurality of first auxiliary lines arranged around each first transparent conductive pattern,
Each of the second conductive parts extends in the second direction and is arranged in the first direction, and includes two or more second transparent conductive patterns configured by a number of lattices, and each second transparent conductive pattern. And a second auxiliary pattern consisting of a plurality of second auxiliary lines arranged around
When viewed from above, the first conductive portion and the second conductive portion are configured such that the first transparent conductive pattern and the second transparent conductive pattern intersect with each other, and the first direction. When the direction that bisects the second direction and the second direction is the third direction, and the direction orthogonal to the third direction is the fourth direction, the first auxiliary line extends from the reference position at least in the third direction. A conductive sheet, wherein the conductive sheet is arranged with a deviation of ½ or more and 100 μm or less of the shorter one of the width and the line width of the second auxiliary line.

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