TWI463385B - Touch panel and conductive sheet - Google Patents

Description

Touch panel and conductive sheet

The present invention relates to a touch panel and a conductive sheet, and is, for example, a preferred touch panel and a conductive sheet for use as a projection type capacitive touch panel.

In general, a capacitive touch panel is a position input device that detects a change in capacitance between a fingertip of a person and a conductive film to detect the position of the fingertip. The capacitive touch panel has a surface touch. Panel and projection type touch panel. The surface type touch panel has a simple structure, but it is not possible to detect more than two points of contact (multi touch) at the same time. On the other hand, the projection type touch panel is configured by, for example, a pixel structure of a liquid crystal display device, in which a plurality of electrodes are arranged in a matrix, and more specifically, a plurality of electrodes arranged in parallel in the vertical direction are connected in series. The plurality of first electrode groups are arranged in the horizontal direction, and a plurality of second electrode groups in which a plurality of electrodes arranged in the horizontal direction are connected in series are arranged in a vertical direction. The projection type touch panel uses a plurality of first electrode groups. And the plurality of second electrode groups sequentially detect the change in capacity, thereby detecting multi-touch.

As a prior art of the above-described projection type capacitive touch panel, for example, a touch switch disclosed in the pamphlet of International Publication No. 2010/013679 can be cited. The touch switch includes: a substrate; a plurality of first electrodes formed on one surface of the substrate and arranged at a fixed interval; and a plurality of second electrodes formed on the other surface of the substrate at a fixed interval, and Forming a lattice shape with the plurality of first electrodes, the touch opening The front surface of the display is mounted on the front surface of the display, and the first electrode and the second electrode are respectively formed by a plurality of conductor lines, and the direction of the conductor line is inclined in a direction oblique to the black matrix of the display. Further, the touch switch includes a first auxiliary line formed between the first electrodes on the one surface, and a second auxiliary line formed between the second electrodes on the other surface. The conductor line of the first electrode, the first auxiliary line, the conductor line of the second electrode, and the second auxiliary line form a lattice shape in which the intervals of the lines are uniform. Further, the conductor line of the first electrode formed on one surface of the substrate, the first auxiliary line, or the two lines, the conductor line of the second electrode formed on the other surface of the substrate, and the second auxiliary line, Or the two wires form a line shape.

However, when the first electrode and the first auxiliary line are formed on one surface of the substrate, and the second electrode and the second auxiliary line are formed on the other surface of the substrate, the lattice shape is changed due to manufacturing unevenness (uneven film formation). If the offset is about 1/2 of the length of the first auxiliary line or the second auxiliary line, for example, the straight line portion of the first electrode along the first direction (or the second direction) and the second portion will be different from the second line. A straight line portion of the electrode along the first direction overlaps, or a first auxiliary line extending along the first direction overlaps with a straight line portion of the second electrode along the first direction. Conversely, for example, the linear portion of the second electrode along the first direction (or the second direction) overlaps with the straight portion of the first electrode along the first direction or the second auxiliary line that extends along the second direction. It overlaps with the straight line portion of the first electrode along the first direction. As a result, the width of the portion where the straight portions overlap each other is increased (thick line), whereby the position of the first electrode or the second electrode is conspicuous, and the visibility is deteriorated.

The present invention has been made in view of the above problems, and an object of the invention is to provide a touch panel which can achieve low resistance of a conductive pattern formed on a substrate and can also improve visibility. For example, it is also possible to reduce the size of the touch panel of the projection type capacitive type and suppress the generation of moiré.

Further, another object of the present invention is to provide a conductive sheet which can achieve low resistance of a conductive pattern formed on a substrate, and can also improve visibility, and is suitable, for example, for use in a projection type capacitive touch. Control panel.

[1] The touch panel of the first invention is a touch panel including a conductive sheet, wherein the conductive sheet includes: a base; a first conductive portion formed on one main surface of the base; and a base formed on the base a second conductive portion on the other main surface, wherein the first conductive portion includes two or more first conductive patterns, and the two or more first conductive patterns extend in the first direction and are arranged in the first direction In the second orthogonal direction, the second conductive portion includes two or more second conductive patterns, and the two or more second conductive patterns extend in the second direction and are arranged in the first direction. When the surface is observed, the first conductive pattern and the second conductive pattern are arranged to intersect each other, and are shifted in directions different from the first direction and the second direction.

[2] The touch panel of the second invention is a touch panel including a conductive sheet, wherein the conductive sheet includes: a base; a first conductive portion formed on one main surface of the base; and a base formed on the base Another master The second conductive portion of the surface, the first conductive portion includes: two or more first conductive patterns extending in the first direction and arranged in a second direction orthogonal to the first direction; and including a first auxiliary pattern of the plurality of first auxiliary lines around the first conductive patterns, wherein the second conductive portion includes two or more second conductive patterns extending in the second direction and arranged in the first And a second auxiliary pattern including a plurality of second auxiliary lines arranged around the second conductive patterns, wherein the first conductive patterns and the second conductive patterns are arranged to intersect each other when viewed from the upper surface a state in which a combination pattern is formed between the first conductive pattern and the second conductive pattern so that the first auxiliary pattern and the second auxiliary pattern face each other, and the combination pattern has no first auxiliary The line overlaps with the second auxiliary line described above.

[3] According to a second aspect of the invention, in the combination pattern, a first axis of the first auxiliary line is substantially parallel to a second axis of the second auxiliary line, and a distance between the first axis and the second axis One of the line width of the first auxiliary line and the line width of the second auxiliary line is 1/2 or more and 100 μm or less of the shorter line width.

[4] According to a second aspect of the invention, the combination pattern has a configuration in which the first auxiliary line and the second auxiliary line partially overlap each other.

[5] According to a second aspect of the invention, the distance between the first axis and the second axis is 1/2 of a line width of the first auxiliary line and 1/2 of a line width of the second auxiliary line The total width is longer.

[6] The second invention is characterized in that a direction in which the first direction and the second direction are halved is referred to as a third direction, and the third When the direction orthogonal to the direction is the fourth direction, the first conductive portion and the second conductive portion are disposed at least shifted from the reference position by at least the third direction, and the distance is the first auxiliary line. One of the line width of the second auxiliary line and the line width of the second auxiliary line is 1/2 or more and 100 μm or less.

[7] The second aspect of the invention is characterized in that the reference position indicates a position in which the first axis of the first auxiliary line coincides with the second axis of the second auxiliary line, and the first auxiliary line and the second line The auxiliary lines do not overlap, and one end of the first auxiliary line coincides with one end of the second auxiliary line.

[8] According to a second aspect of the invention, the first conductive pattern and the second conductive pattern are each formed of a plurality of squares.

[9] The second invention is characterized in that two or more first large lattices are connected in series along the first direction to form the first conductive pattern, and two or more of the first conductive patterns are formed along the second direction. The two large lattices are connected in series to form the second conductive pattern, and each of the first large lattice and each of the second large lattices are formed by combining two or more small lattices, and are formed on the side of the first large lattice. The first auxiliary pattern that is not connected to the first large lattice is formed around the second auxiliary pattern, and the second auxiliary pattern that is not connected to the second large lattice is formed around the side of the second large lattice.

According to a second aspect of the invention, in the combination pattern, a first axis of the first auxiliary line is substantially parallel to a second axis of the second auxiliary line, and a distance between the first axis and the second axis One of the line width of the first auxiliary line and the line width of the second auxiliary line is shorter The line width is 1/2 or more and is 1/2 or less of the arrangement pitch of the small lattice.

[11] According to a second aspect of the invention, the length of one side of the first large lattice and the second large lattice is 3 mm to 10 mm, and the length of one side of the small lattice is 50 μm to 500 μm.

[12] According to a second aspect of the invention, the first conductive pattern and the second conductive pattern are formed of thin lines having a line width of 3 μm to 30 μm.

[13] The conductive sheet according to the third aspect of the invention, comprising: a base; a first conductive portion formed on one main surface of the base; and a second conductive portion formed on the other main surface of the base, the first conductive The unit includes: two or more first conductive patterns extending in the first direction and arranged in a second direction orthogonal to the first direction; and a plurality of lines arranged in a periphery of each of the first conductive patterns a first auxiliary pattern of the auxiliary line, wherein the second conductive portion includes: two or more second conductive patterns extending in the second direction and arranged in the first direction; and the second conductive pattern is arranged in each of the second conductive patterns a second auxiliary pattern of the plurality of second auxiliary lines in a state in which the first conductive pattern and the second conductive pattern are arranged to intersect each other when viewed from the upper surface, and the first conductive pattern and the first conductive pattern are A combination pattern in which the first auxiliary pattern and the second auxiliary pattern are opposed to each other is formed between the second conductive patterns, and the combination pattern has a line that does not overlap the first auxiliary line and the second auxiliary line. Shape.

[14] The conductive sheet of the fourth invention, comprising: a base; a first conductive portion formed on one main surface of the base; and a base formed on the base a second conductive portion on the other main surface of the body, wherein the first conductive portion includes two or more first conductive patterns, and the two or more first conductive patterns extend along the first direction and are arranged in the first direction In the second direction orthogonal to the one direction, the second conductive portion includes two or more second conductive patterns, and the two or more second conductive patterns extend in the second direction and are arranged in the first direction. When viewed from the upper surface, the first conductive pattern and the second conductive pattern are arranged to intersect each other, and are shifted in directions different from the first direction and the second direction.

As described above, according to the touch panel of the present invention, the conductive pattern formed on the substrate can be reduced in resistance, and the visibility can be improved. For example, the touch panel can also be corresponding to the projected capacitive type. The size is large, and the generation of ripples can be suppressed.

According to the conductive sheet of the present invention, the conductive pattern formed on the substrate can be made low-resistance, and the visibility can be improved, for example, it is suitable for a projection type capacitive touch panel.

The above objects, features and advantages will become more apparent from the following description of the example of the preferred embodiments of the invention.

The above and other objects, features and advantages of the present invention will become more <RTIgt;

Hereinafter, an example of an embodiment of the conductive sheet and the capacitive touch panel of the present invention will be described with reference to FIGS. 1 to 8. In addition, in the present specification, the "~" indicating the numerical range is as described before and after the inclusion thereof. The numerical value is used as the lower limit value and the upper limit value.

As shown in FIG. 1 and FIG. 2A, the laminated conductive sheet (hereinafter referred to as the laminated conductive sheet 10) of the present embodiment is formed by laminating the first conductive sheet 12A and the second conductive sheet 12B.

As shown in FIGS. 1 and 3, the first conductive sheet 12A includes a first conductive portion 16A formed on one main surface of the first transparent substrate 14A (see FIG. 2A). The first conductive portion 16A includes two or more first conductive patterns 18A extending in the first direction (x direction) and arranged in the second direction (y direction) orthogonal to the first direction. Each of the lattice structures and the first auxiliary patterns 20A arranged around the first conductive patterns 18A.

The first conductive pattern 18A is configured by connecting two or more first large lattices 24A in series along the first direction, and each of the first large lattices 24A is formed by combining two or more small lattices 26 . Further, the first auxiliary pattern 20A that is not connected to the first large lattice 24A is formed around the side of the first large lattice 24A.

A first connecting portion 28A that electrically connects the first large lattices 24A is formed between the adjacent first large lattices 24A. The middle lattice 30 is disposed to constitute a first connecting portion 28A which is a size in which n (n is a real number greater than 1) small lattices 26 are arranged in the fourth direction. The first notch portion 32A formed by cutting one side of the small lattice 26 is formed in a portion of the first large lattice 24A that is adjacent to the intermediate lattice 30 among the sides orthogonal to the fourth direction. Here, the small lattice 26 is set to the smallest square shape. In the example of FIG. 3, the intermediate lattice 30 has a size in which three small lattices 26 are arranged in the fourth direction.

Further, an electrically insulating first insulating portion 34A is arranged between the adjacent first conductive patterns 18A.

Here, when the direction in which the first direction and the second direction are halved is the third direction (m direction), and the direction orthogonal to the third direction is the fourth direction (n direction), 1Auxiliary pattern 20A includes a plurality of first auxiliary lines 36A (in the axial direction in the third direction) along the side orthogonal to the third direction among the sides of the first large lattice 24A, along the first large lattice Among the sides of 24A, a plurality of first auxiliary lines 36A arranged in a side orthogonal to the fourth direction (in the axial direction in the fourth direction) and two first L-shaped patterns 38A are arranged to face each other. The two first L-shaped patterns 38A are formed by combining the two first auxiliary lines 36A into an L shape in the first insulating portion 34A.

The length of each of the first auxiliary lines 36A in the axial direction is a length of 1/2 along one side of the inner circumference of the small lattices 26. Further, each of the first auxiliary lines 36A is formed at a position spaced apart from the first large lattice 24A by a predetermined distance (in this example, a length of 1/2 of one side of the inner circumference of the small lattice 26).

As shown in FIG. 1, the first conductive sheet 12A configured as described above has a shape in which the first connection portion 28A is not present at the open end of the first large lattice 24A on the one end side of each of the first conductive patterns 18A. The end of the first large lattice 24A existing on the other end side of each of the first conductive patterns 18A is electrically connected to the first external wiring 42A via the first terminal 40A.

On the other hand, as shown in FIGS. 1 and 4, the second conductive sheet 12B includes a second conductive portion 16B formed on one main surface of the second transparent substrate 14B (see FIG. 2A). The second conductive portion 16B includes: two or more The second conductive pattern 18B extends in the second direction (y direction) and is arranged in the first direction (x direction), and is composed of a plurality of lattices; and the second auxiliary pattern arranged around the second conductive patterns 18B. 20B.

The second conductive pattern 18B is configured by connecting two or more second large lattices 24B in series along the second direction, and each of the second large lattices 24B is formed by combining two or more small lattices 26 . Further, the second auxiliary pattern 20B that is not connected to the second large lattice 24B is formed around the side of the second large lattice 24B.

A second connecting portion 28B that electrically connects the second large lattices 24B is formed between the adjacent second large lattices 24B. The middle lattice 30 is disposed to constitute a second connecting portion 28B which is a size in which n (n is a real number greater than 1) small lattices 26 are arranged in the third direction. A second notch portion 32B formed by cutting one side of the small lattice 26 is formed in a portion of the second large lattice 24B that is adjacent to the intermediate lattice 30 among the sides orthogonal to the third direction.

Further, an electrically insulating second insulating portion 34B is arranged between the adjacent second conductive patterns 18B.

The second auxiliary pattern 20B includes a plurality of second auxiliary lines 36B (the fourth direction is the axial direction) arranged along the side orthogonal to the fourth direction among the sides of the second large lattice 24B, and the second largest Among the sides of the lattice 24B, a plurality of second auxiliary lines 36B (the third direction is the axial direction) in which the sides orthogonal to the third direction are arranged, and two patterns of the second L-shaped patterns 38B are disposed to face each other. The two second L-shaped patterns 38B are combined in the L-shaped shape by the two second auxiliary lines 36B in the second insulating portion 34B.

The length of each of the second auxiliary lines 36B in the axial direction is a length of 1/2 along one side of the inner circumference of the small lattices 26. Further, each of the second auxiliary lines 36B is formed at a position spaced apart from the second large lattice 24B by a predetermined distance (in this example, a length of 1/2 of one side of the inner circumference of the small lattice 26).

As shown in FIG. 1, the second conductive sheet 12B having the above-described configuration has a shape in which the second connecting portion 28B is not present at the open end of the second large lattice 24B on the one end side of each of the second conductive patterns 18B. The end of the second large lattice 24B existing on the other end side of each of the second conductive patterns 18B is electrically connected to the second external wiring 42B via the second terminal 40B.

The length of one side of the first large lattice 24A and the second large lattice 24B is preferably 3 mm to 10 mm, and more preferably 4 mm to 6 mm. When the length of one side is less than the above lower limit value, the capacitance of the first large lattice 24A and the second large lattice 24B at the time of detection is reduced, and thus the possibility of detection failure increases. On the other hand, if the length of the one side exceeds the above upper limit value, the position detection accuracy may deteriorate. From the same viewpoint, the length of one side of the small lattice 26 constituting the first large lattice 24A and the second large lattice 24B is preferably 50 μm or more, more preferably 50 μm to 500 μm, still more preferably 150 μm to 300 μm.

Moreover, the line width of the first conductive pattern 18A (the first large lattice 24A and the intermediate lattice 30) and the line width of the second conductive pattern 18B (the second large lattice 24B and the intermediate lattice 30) are each 1 μm to 30 μm.

The line widths of the first auxiliary pattern 20A (first auxiliary line 36A) and the second auxiliary pattern 20B (second auxiliary line 36B) are each 1 μm to 30 μm. In this case, the line width or the second conductive pattern of the first conductive pattern 18A can be used. The line width of the case 18B is the same, and may be different from the line width of the first conductive pattern 18A or the line width of the second conductive pattern 18B. However, it is preferable that the respective line widths of the first conductive pattern 18A, the second conductive pattern 18B, the first auxiliary pattern 20A, and the second auxiliary pattern 20B are the same.

Further, for example, when the first conductive sheet 12A is laminated on the second conductive sheet 12B to form the first laminated conductive sheet 10, as shown in FIG. 5, the first conductive pattern 18A and the second conductive pattern 18B are arranged to intersect each other. Specifically, the first connection portion 28A of the first conductive pattern 18A and the second connection portion 28B of the second conductive pattern 18B are opposed to each other via the first transparent substrate 14A (see FIG. 2A). The first insulating portion 34A of the first conductive portion 16A and the second insulating portion 34B of the second conductive portion 16B face each other with the first transparent substrate 14A interposed therebetween.

When the laminated first conductive sheet 12A and the second conductive sheet 12B are observed from the upper surface, the gap between the first large lattice 24A formed in the first conductive sheet 12A is filled. In the manner, the second large lattice 24B of the second conductive sheet 12B is arranged. That is, the large grid is in a filled form. At this time, a combination pattern 44 in which the first auxiliary pattern 20A and the second auxiliary pattern 20B face each other is formed between the first large lattice 24A and the second large lattice 24B.

The combination pattern 44 has a form in which the first auxiliary line 36A and the second auxiliary line 36B are not overlapped orthogonally.

That is, as shown in FIG. 6A to FIG. 6C, in the combined pattern 44, the first auxiliary line 36A arranged along the side of the first large lattice 24A and the second auxiliary line arranged along the side of the second large lattice 24B are arranged. Combination diagram formed by 36B The first axis 46A of the first auxiliary line 36A is substantially parallel to the second axis 46B of the second auxiliary line 36B, and the distance ha seen from the plane between the first axis 46A and the second axis 46B is the first auxiliary line 36A. One or more of the shorter line widths of the line width Wa and the line width Wb of the second auxiliary line 36B are 1/2 or more and 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26).

6A shows a case where the distance ha between the first axis line 46A and the second axis line 46B is less than the total width of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. In this case, the first auxiliary line 36A and the second auxiliary line 36B partially overlap each other. 6B shows a case where the distance ha between the first axis line 46A and the second axis line 46B is the total width of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. . 6C shows that the distance ha between the first axis line 46A and the second axis line 46B is longer than the total width of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. The situation.

In the combined pattern 44, each of the two second L-shaped patterns 38B of the first auxiliary line 36A and the second insulating portion 34B of the two first L-shaped patterns 38A of the first insulating portion 34A The combination pattern formed by 36B has a form in which the small lattices 26 are not formed in the four L-shaped patterns (38A, 38A, 38B, and 38B).

That is, as shown in FIG. 7, the two first L-shaped patterns 38A are located close to one second L-shaped pattern 38B, and the other second L-shaped pattern 38B is located far from the one second LL. Font map The position of the case 38B and the two first L-shaped patterns 38A. In the second L-shaped pattern 38B and the two first L-shaped patterns 38A, the second axis of one of the two second auxiliary lines 36B constituting the second L-shaped pattern 38B is the second axis. 46B is substantially parallel to the first axis line 46A of one of the first auxiliary lines 36A of the two first auxiliary lines 36A constituting the first L-shaped pattern 38A, and the distance between the first axis 46A and the second axis 46B is ha. It is 1/2 or more of the line width of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B, and is 100 μm or less (or 1/1 of the arrangement pitch of the small lattices 26). 2 below).

Similarly, the second axis 46B of the other second auxiliary line 36B among the two second auxiliary lines 36B constituting one second L-shaped pattern 38B and the two first auxiliary members constituting the other first L-shaped pattern 38A The first axis line 46A of the first auxiliary line 36A of the line 36A is substantially parallel, and the distance ha between the first axis line 46A and the second axis line 46B is the line width Wa of the first auxiliary line 36A and the line of the second auxiliary line 36B. Any one of the wide Wbs has a shorter line width of 1/2 or more and 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26). Further, the positional relationship between the second auxiliary line 36B and the first auxiliary line 36B of the two second L-shaped patterns 38B and the two first L-shaped patterns 38A is the same as that of FIGS. 6A to 6C.

In other words, the first conductive portion 16A and the second conductive portion 16B are disposed at least in a distance from the reference position in the third direction, and the distance is the line width Wa of the first auxiliary line 36A and the second auxiliary line 36B. Any one of the shorter line widths of the line width Wb is 1/2 or more and 100 μm or less (or small) 1/2 or less of the arrangement pitch of the lattices 26). In particular, in the present embodiment, the third direction and the fourth direction are respectively shifted by a distance which is one of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B. The shorter line width is 1/2 or more and 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26).

Here, as shown in FIG. 8, the reference position indicates a position in which the first axis line 46A of the first auxiliary line 36A coincides with the second axis line 46B of the second auxiliary line 36B, and the first auxiliary line 36A and the second line The auxiliary line 36B does not overlap, and one end of the first auxiliary line 36A coincides with one end of the second auxiliary line 36B.

As described above, in the multilayer electrically conductive sheet 10 of the present embodiment, a combination pattern 44 of the first auxiliary pattern 20A and the second auxiliary pattern 20B is disposed between the first large lattice 24A and the second large lattice 24B. Therefore, the blank (the width corresponding to the length of the side of the small lattice 26 and the length corresponding to the length of the side of the first large lattice 24A or the second large lattice 24B) is not disposed in the first large lattice 24A and the second largest. Between the lattices 24B, the boundary between the first large lattice 24A and the second large lattice 24B is inconspicuous.

Further, in the combined pattern 44, the first auxiliary line 36A and the second auxiliary line 36B having a length of 1/2 of one side of the inner circumference of the small lattice 26 partially overlap each other, and the first large lattice 24A Or the length of each of the overlapping sides of the second large lattice 24B is very short and is 1/20 or less. Therefore, the portion where the first auxiliary line 36A and the second auxiliary line 36B partially overlap is inconspicuous, and the visibility is hardly deteriorated. This is also true for the combination of the first L-shaped pattern 38A and the second L-shaped pattern 38B. Similarly, as shown in FIG. 7, the first auxiliary line having a length of 1/2 of one side of the inner circumference of the small lattice 26 is formed in one second L-shaped pattern 38B and two first L-shaped patterns 38A. The 36A and the second auxiliary line 36B are also partially overlapped, and the length of the overlapping portion is extremely short and 1/20 or less as compared with the length of each side of the first large lattice 24A or the second large lattice 24B. Therefore, the portion where the first auxiliary line 36A and the second auxiliary line 36B partially overlap is inconspicuous, and the visibility is hardly deteriorated.

Further, in each of the first large lattice 24A and the second large lattice 24B, the first auxiliary line 36A or the second auxiliary line 36B overlaps orthogonally, but the axis of the first auxiliary line 36A or the second auxiliary line 36B The length of the direction is 1/2 of the length of one side of the inner circumference of the small lattice 26, and therefore, it is hardly conspicuous.

Further, the intermediate lattice 30 of the first connecting portion 28A and the intermediate lattice 30 of the second connecting portion 28B are orthogonal to each other. However, in this case, the first conductive portion 16A and the second conductive portion 16B are in the third direction and the third direction. The four directions are shifted, and therefore, a portion of the small lattice 26 having a non-uniform shape is generated in a part. However, the number of the small lattices 26 of the first large lattice 24A around the portion where the intermediate lattice 30 of the first connecting portion 28A and the intermediate lattice 30 of the second connecting portion 28B are orthogonal to each other, and the second large lattice 24B In comparison with the number of small lattices 26, the number of non-uniform portions of the small lattices 26 is small (about 5%), and therefore, the unevenness of the small lattices 26 is hardly conspicuous. Further, since the first notch portion 32A and the second notch portion 32B are formed adjacent to the intermediate lattice 30 in the first large lattice 24A and the second large lattice 24B, the straight portion of the intermediate lattice 30 does not overlap with the first large lattice. The straight line portion of 24A or the straight line portion of the second large lattice 24B overlaps, and the visibility is hardly deteriorated.

In the case where the laminated conductive sheet 10 is used as a touch panel, a protective layer is formed on the first conductive sheet 12A, and the first external wiring is led out from the plurality of first conductive patterns 18A of the first conductive sheet 12A. 42A and the second external wiring 42B derived from the plurality of second conductive patterns 18B of the second conductive sheet 12B are connected to, for example, an integrated circuit (IC) circuit that controls scanning. In this case, the first conductive pattern 18A and the first conductive pattern 18A are formed such that the area of the outer peripheral region (frontal region) of the display conductive screen of the liquid crystal display device is made smaller as much as possible. Each of the connection portions of the external wiring 42A is linearly arranged, and it is preferable that the connection portions of the second conductive pattern 18B and the second external wiring 42B are linearly arranged.

By bringing the fingertip into contact with the protective layer, the capacitance between the first conductive pattern 18A and the second conductive pattern 18B toward the fingertip changes. The amount of change is detected by the IC circuit, and the position of the fingertip is calculated based on the amount of change. The above calculation is performed between each of the first conductive patterns 18A and the second conductive patterns 18B. Therefore, even if two or more fingertips are brought into contact with the protective layer at the same time, the position of each fingertip can be detected.

In the laminated conductive sheet 10, when the laminated conductive sheet 10 is applied to, for example, a projection type capacitive touch panel, since the surface resistance of the laminated conductive sheet is small, the response speed can be increased, thereby facilitating the promotion. The size of the touch panel is large.

Further, even if the first conductive portion 16A and the second conductive portion 16B are disposed in a staggered manner, as described above, the first large lattice 24A of the first conductive sheet 12A and the first 2 The boundary of the second large lattice 24B of the conductive sheet 12B is also inconspicuous, and there is no problem that a thick line or the like is locally generated, and the visibility is good as a whole. Further, an arrangement of a plurality of regular small lattices 26 formed by the first large lattice 24A and the second large lattice 24B adjacent to each other is arranged, and is formed between the first large lattice 24A and the second large lattice 24B. The first auxiliary line 36A and the second auxiliary line 36B are arranged to be shifted from each other, and are arranged differently from the arrangement of the small lattices 26, whereby a plurality of spatial frequencies are phase-tuned, and as a result, the pixels of the liquid crystal display device are combined. The interference between the arrays is suppressed, so that the generation of ripples can be effectively reduced.

In the laminated conductive sheet 10, the shape of the small lattice 26 is a square shape, and may be a polygonal shape. Further, the shape of one side may be a curved shape, or may be a circular shape. When it is set to an arc shape, for example, the two opposing sides may be an arc shape that protrudes outward, and the other two opposite sides may be an arc shape that protrudes inward. . Further, the shape of each side may be a wave shape formed by an arc which is convex toward the outside and an arc which is convex toward the inside. Of course, the shape of each side can also be set to a sinusoidal curve.

In the first conductive sheet 12A and the second conductive sheet 12B, the size of the intermediate lattice 30 constituting the first connecting portion 28A and the second connecting portion 28B is set to the size of three small squares 26, and may be set to 1.5. Various combinations of the size of the small lattice 26, the size of the two small lattices 26, and the size of the 2.5 small lattices 26. If the middle lattice 30 is too large, it is difficult to arrange the first large lattice 24A or the second large lattice 24B, and the change in capacitance of the intersection portion which should not be detected becomes large. Therefore, it is preferable that the size of the middle lattice 30 is at most 5 small cells. The size of child 26.

Further, the size of the small lattice 26 (the length of one side or the length of the diagonal line, etc.), or the number of the small lattices 26 constituting the first large lattice 24A, and the number of the small lattices 26 constituting the second large lattice 24B are also It can be appropriately set depending on the size or resolution (number of wirings) of the touch panel to be applied.

As shown in FIG. 1 and FIG. 2A, in the laminated conductive sheet 10, the first conductive portion 16A is formed on one main surface of the first transparent substrate 14A, and the second conductive portion is formed on one main surface of the second transparent substrate 14B. 16B, and then laminated, and as shown in FIG. 2B, the first conductive portion 16A may be formed on one main surface of the first transparent substrate 14A, and the second conductive portion 16B may be formed on the other main surface of the first transparent substrate 14A. Further, another layer may be present between the first conductive sheet 12A and the second conductive sheet 12B. When the first conductive pattern 18A and the second conductive pattern 18B are insulated, the first conductive layer may be disposed to face each other. The pattern 18A and the second conductive pattern 18B.

Next, a method of manufacturing the first conductive sheet 12A or the second conductive sheet 12B will be described.

In the case of producing the first conductive sheet 12A or the second conductive sheet 12B, for example, the photosensitive material including the emulsion layer containing the photosensitive silver halide salt may be applied to the first transparent substrate 14A and the second transparent substrate 14B. Exposure is carried out, and a metal silver portion and a light-transmitting portion are formed in each of the exposed portion and the unexposed portion, thereby forming the first conductive portion 16A and the second conductive portion 16B. Further, the metal silver portion may be further subjected to physical development and/or plating treatment to thereby carry the conductive metal on the metallic silver portion.

Alternatively, a photoresist film (photoresist film) formed on the copper foil on the first transparent substrate 14A and the second transparent substrate 14B may be exposed and developed to form a photoresist pattern, and the copper exposed from the photoresist pattern may be exposed. The foil is etched to form the first conductive portion 16A and the second conductive portion 16B.

Alternatively, a paste containing metal fine particles may be printed on the first transparent substrate 14A and the second transparent substrate 14B, and the slurry may be metal-plated to form the first conductive portion 16A and the second conductive portion. Part 16B.

The first conductive portion 16A and the second conductive portion 16B may be printed on the first transparent substrate 14A and the second transparent substrate 14B by a screen printing plate or a gravure printing plate.

Next, a description will be given focusing on the first conductive sheet 12A and the second conductive sheet 12B of the present embodiment as a silver halide photo-sensitive material of a preferred embodiment.

The method of manufacturing the first conductive sheet 12A and the second conductive sheet 12B of the present embodiment includes the following three aspects depending on the form of the photosensitive material and the development processing.

(1) The form is a chemical development or thermal development of a photosensitive silver halide black-and-white photosensitive material not containing a physical development core to form a metal silver portion on the photosensitive material.

(2) The form is a physical solidification of a photosensitive silver halide black-and-white photosensitive material containing a physical development core in a silver halide emulsion layer, and a metal silver portion is formed on the photosensitive material.

(3) The form is obtained by superposing a photosensitive silver halide black-and-white photosensitive material not including a physical developing core and a developing sheet having a non-photosensitive layer containing a physical developing core, and performing diffusion transfer development to form a metal silver portion. On non-photosensitive imaging.

The form of the above (1) is an integrated black-and-white development type, and a light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material. The developed silver obtained is chemically developed silver or thermally developed silver, and is a filament having a high specific surface, and therefore, the development silver has high activity during subsequent plating or physical development.

In the aspect of the above (2), in the exposed portion, silver halide grains having a physical development core close to the edge are dissolved and deposited on the developing core, thereby forming a light transmissive conductive film or the like on the photosensitive material. Conductive film. This is also an integrated black and white development type. The development is a precipitation on the physical development nucleus, and therefore, the activity is high, but the developed silver is spherical smaller than the surface.

In the form of the above (3), the silver halide particles are dissolved and diffused in the unexposed portion, and then deposited on the developing core on the developing sheet, whereby a light-transmitting conductive film or the like is formed on the developing sheet. A light-transmitting conductive film. The form of the above (3) is a so-called separation type, and is a form in which a developing sheet is peeled off from a photosensitive material.

In either case, any of the negative development processing and the reverse development processing may be selected (in the case of the diffusion transfer method, a direct positive photosensitive material is used as the photosensitive material, whereby Negative development processing).

Chemical development, thermal development, dissolved physical development, and Diffusion transfer development refers to the meaning as used in the term commonly used in the art, and has been explained in general textbooks of photochemistry, such as "Photo Chemistry" edited by Kikuchi Shinji (Kyoritsu Press, 1955) Released, "The Theory of Photographic Processes, 4th ed." by CEK Mees (Mcmillan, 1977). This case is an invention related to liquid processing, but other techniques using a thermal development method as a development method can also be referred to. For example, Japanese Patent Laid-Open No. 2004-184693, Japanese Patent Laid-Open No. Hei No. 2004-334077, Japanese Patent Laid-Open No. Hei No. 2005-010752, Japanese Patent Application No. 2004-244080, and Japanese Patent Application No. 2004- The technique disclosed in the specification of No. 085655.

Here, the configuration of each layer of the first conductive sheet 12A and the second conductive sheet 12B of the present embodiment will be described in detail below.

[First transparent substrate 14A, second transparent substrate 14B]

Examples of the first transparent substrate 14A and the second transparent substrate 14B include a plastic film, a plastic plate, and a glass plate.

As a raw material of the plastic film and the plastic sheet, for example, a polyester such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN) can be used; Polyolefin (PE), Polypropylene (PP), Polystyrene, Ethylene Vinyl Acetate (EVA), and the like; and a vinyl resin; in addition, polycarbonate (Polycarbonate, PC) Amine, polyimine, acrylic resin, and Triacetyl Cellulose (TAC).

As the first transparent substrate 14A and the second transparent substrate 14B, PET (melting point: 258 ° C), PEN (melting point: 269 ° C), PE (melting point: 135 ° C), PP (melting point: 163 ° C), polystyrene (melting point) : 230 ° C), polyvinyl chloride (melting point: 180 ° C), polyvinylidene chloride (melting point: 212 ° C) or TAC (melting point: 290 ° C) and other plastic film or plastic plate melting point of about 290 ° C or less is preferred From the viewpoint of light transmittance or workability, PET is particularly preferable. The conductive film such as the first conductive sheet 12A and the second conductive sheet 12B used for the laminated conductive sheet 10 needs to have transparency. Therefore, it is preferable that the first transparent substrate 14A and the second transparent substrate 14B have high transparency.

[Silver Salt Emulsion Layer]

The first conductive portion 16A (the first large lattice 24A, the first connecting portion 28A, and the first auxiliary pattern 20A) of the first conductive sheet 12A and the second conductive portion 16B of the second conductive sheet 12B (the second large lattice) The silver salt emulsion layer of 24B, the second connecting portion 28B, and the second auxiliary pattern 20B) contains an additive such as a solvent or a dye in addition to a silver salt and a binder.

The silver salt used in the present embodiment may, for example, be an inorganic silver salt such as silver halide or an organic silver salt such as silver acetate. In the present embodiment, it is preferable to use silver halide which is excellent in characteristics as an optical sensor.

The coating amount of silver (coating amount of silver) of the silver salt emulsion layer in terms of silver, preferably ^{1g / m 2 ~ 30g / m} 2, more preferably ^{1g / m 2 ~ 25g / m} 2, and further more preferably It is 5 g/m ² to 20 g/m ² . By setting the amount of coated silver to the above range, when the laminated conductive sheet 10 is formed, a desired surface resistance can be obtained.

Examples of the binder used in the present embodiment include gelatin, polyvinyl Alcohol (PVA), polyvinyl pyrrolidone (PVP), polysaccharides such as starch, and cellulose. Derivatives, polyethylene oxide, polyvinylamine, chitosan, polylysine, polyacrylic acid, polyalginic acid, polyhyaluronic acid, and carboxy cellulose. The above binder has neutral, anionic, and cationic properties depending on the ionicity of the functional group.

The content of the binder contained in the silver salt emulsion layer of the present embodiment is not particularly limited, and the content of the binder can be appropriately determined within a range in which dispersibility and adhesion can be exhibited. The content of the binder in the silver salt emulsion layer is preferably 1/4 or more, more preferably 1/2 or more, in terms of a silver/binder volume ratio. The volume of the silver/binder is preferably 100/1 or less, more preferably 50/1 or less. Further, the silver/binder volume ratio is further preferably from 1/1 to 4/1. The best is 1/1~3/1. By setting the silver/binder volume ratio in the silver salt emulsion layer to the above range, even when the amount of coated silver is adjusted, unevenness in resistance value can be suppressed, and uniform surface resistance can be obtained. Laminated conductive sheet. Furthermore, the amount of silver halide/binder (weight ratio) of the raw material is converted into a silver amount/binder amount (weight ratio), and then the amount of silver/binder (weight ratio) is converted into a silver amount/binder amount (volume ratio). Therefore, the silver/binder volume ratio can be obtained.

<solvent>

The solvent for forming the silver salt emulsion layer is not particularly limited, and for example, Examples of water and an organic solvent (for example, alcohols such as methanol, ketones such as acetone, guanamines such as formamide, sulfoniums such as dimethyl hydrazine, esters such as ethyl acetate, and ethers; Classes, etc.), ionic liquids, and mixed solvents of these solvents.

The content of the solvent used in the silver salt emulsion layer of the present embodiment is in the range of 30% by weight to 90% by weight, preferably 50% by weight based on the total weight of the silver salt, the binder, and the like contained in the silver salt emulsion layer. %~80wt% range.

<Other additives>

The various additives used in the present embodiment are not particularly limited, and a well-known additive can be preferably used.

[other layer composition]

A protective layer (not shown) may be provided on the silver salt emulsion layer. In the present embodiment, the term "protective layer" means a layer containing a binder such as gelatin or a polymer, and the protective layer is formed to have an effect of preventing scratches or improving mechanical properties. Photosensitive silver salt emulsion layer. The thickness of the protective layer is preferably 0.5 μm or less. The coating method and the formation method of the protective layer are not particularly limited, and a well-known coating method and formation method can be appropriately selected. Further, for example, an undercoat layer may be provided below the silver salt emulsion layer.

Next, each step of the method of manufacturing the first conductive sheet 12A and the second conductive sheet 12B will be described.

[exposure]

In this embodiment, the first conductive layer is formed by printing. In the case of the second conductive portion, the first conductive portion and the second conductive portion are formed by exposure, development, or the like in addition to the printing method. That is, the photosensitive material including the silver salt layer provided on the first transparent substrate 14A and the second transparent substrate 14B or the photosensitive material coated with the photopolymer for photolithography is exposed. Electromagnetic waves can be used for exposure. Examples of the electromagnetic wave include light such as visible light rays and ultraviolet rays, and radiation such as X-rays. Further, exposure may be performed using a light source having a wavelength distribution, or may be performed using a light source having a specific wavelength.

The exposure method is preferably a method performed by a glass mask or a pattern exposure method using a laser.

[development processing]

In the present embodiment, after the emulsion layer is exposed, development processing is subsequently performed. For the development treatment, a technique for usual development processing for silver salt photographic film or photographic paper, film for printing plate, emulsion mask for photomask, or the like can be used. The developer is not particularly limited, and a Phenidone Quinol (PQ) developer, a metholol (Metol Quinol, MQ) developer, and Methacrylic Acid may also be used. , MAA) developer, etc., for commercial products, for example, CN-16, CR-56, CP45X, FD-3, and PAPITOL, which are prescribed by Fujifilm, can be used; as a prescription of KODAK, C- 41. A developing solution such as E-6, RA-4, D-19, and D-72; or a developer contained in a kit of the above developing solution. Further, a lithographic developer can also be used.

The development treatment in the present invention may include a silver salt for the unexposed portion The fusion treatment is carried out to remove the stabilization. The fusion treatment in the present invention can be carried out by a fusion treatment technique for silver salt photographic film or photographic paper, film for printing stencil, latex mask for reticle, and the like.

The fusion temperature in the above fusion step is preferably from about 20 ° C to about 50 ° C, more preferably from 25 ° C to 45 ° C. Further, the fusion time is preferably from 5 seconds to 1 minute, and more preferably from 7 seconds to 50 seconds. Supplemental amount of fused liquid processing amount with respect to the photosensitive material, it is preferably 600ml / m ² or less, and further preferably 500ml / m ² or less, and particularly preferably 300ml / m ² or less.

Preferably, the developed or fused photosensitive material is subjected to a water washing treatment or a stabilization treatment. In the above-described water washing treatment or stabilization treatment, water is usually washed with a water washing amount of 20 liters or less per 1 m ² of the photosensitive material, or may be a supplementary amount of 3 liters or less (including 0, that is, accumulated water washing). Come to wash.

The content of the weight of the metallic silver contained in the exposed portion after the development treatment with respect to the weight of the silver contained in the exposed portion before the exposure is preferably 50% by weight or more, and more preferably 80% by weight or more. When the weight of the silver contained in the exposed portion is 50% by weight based on the weight of the silver contained in the exposed portion before the exposure, high conductivity can be obtained, which is preferable.

The gray scale after the development treatment in the present embodiment is not particularly limited, but is preferably more than 4.0. When the gray scale after the development treatment exceeds 4.0, the high light transmittance of the light transmissive portion can be maintained, and the conductivity of the conductive metal portion can be improved. Examples of the method of setting the gradation to 4.0 or more include doping of the above-mentioned cerium ions and cerium ions.

The conductive sheet is obtained through the above steps, but the obtained conductive sheet The surface resistance is preferably 100 ohm/sq. or less, and is preferably in the range of 0.1 ohm/sq. to 100 ohm/sq., more preferably in the range of 1 ohm/sq. to 10 ohm/sq. By adjusting the surface resistance to the above range, position detection can be performed even in a large touch panel having an area of 10 cm × 10 cm or more. Further, the conductive sheet after the development treatment may be further subjected to calender treatment, and may be adjusted to a desired surface resistance by the calender treatment.

[Physical development and plating treatment]

In the present embodiment, in order to improve the conductivity of the metal silver portion formed by the exposure and development processes, physical development and/or plating treatment for supporting the conductive metal particles on the metal silver portion may be performed. In the present invention, the conductive metal particles may be carried on the metallic silver portion by only one of the physical development or the plating treatment, or the physical development and the plating treatment may be combined to carry the conductive metal particles. In the metal silver department. Further, a portion obtained by subjecting the metal silver portion to physical development and/or plating treatment is collectively referred to as a "conductive metal portion".

The term "physical development" in the present embodiment means that metal ions such as silver ions are reduced by a reducing agent to precipitate metal particles onto the core of the metal or metal compound. This physical phenomenon is utilized in instant B & W film, i.e., instant slide film or printing plate manufacturing, etc., in the present invention, this technique can be used.

Further, the physical development may be performed simultaneously with the development processing after the exposure, or may be additionally performed after the development processing.

In the present embodiment, electroless plating (chemical) can be used for the plating treatment. The plating is performed by reduction plating or substitution plating, electrolytic plating, or electroless plating and electrolytic plating. In the electroless plating in the present embodiment, a well-known electroless plating technique can be used. For example, an electroless plating technique used in a printed wiring board or the like can be used, and electroless plating is preferably electroless copper plating.

[Oxidation treatment]

In the present embodiment, it is preferable that the conductive metal portion formed by the metal silver portion after the development treatment and the physical development and/or plating treatment is subjected to an oxidation treatment. When the oxidation treatment is performed, for example, when the metal is slightly deposited on the light-transmitting portion, the metal can be removed to make the transmittance of the light-transmitting portion substantially 100%.

[Electrically conductive metal part]

The line width of the conductive metal portion of the present embodiment may be selected from a width of 5 μm or more and 200 μm (0.2 mm) or less. However, when the conductive metal portion is used as a material of a touch panel, the line width is preferably 3 μm or more. And it is 50 μm or less. It is more preferably 3 μm or more and 30 μm or less, further preferably 5 μm or more and 20 μm or less, and most preferably 5 μm or more and 10 μm or less. The line interval is preferably 30 μm or more and 500 μm or less, more preferably 50 μm or more and 400 μm or less, and most preferably 100 μm or more and 350 μm or less. Moreover, in order to ground or the like, the conductive metal portion may include a portion having a line width wider than 200 μm.

In the conductive metal portion of the present embodiment, the aperture ratio is preferably 85% or more, more preferably 90% or more, and most preferably 95% or more from the viewpoint of visible light transmittance. The aperture ratio refers to a translucent portion of the first conductive portion and the second conductive portion excluding the conductive portion in the entirety. The proportion occupied, for example, a square lattice-like aperture ratio of a line width of 15 μm and a pitch of 300 μm is 90%.

[Light Transmissive Department]

The "light-transmitting portion" in the present embodiment refers to a portion having light transmissivity other than the conductive metal portion of the first conductive sheet 12A and the second conductive sheet 12B. As for the transmittance of the light-transmitting portion, as described above, the first transparent substrate 14A and the second transparent substrate 14B are transmitted in a wavelength region of 380 nm to 780 nm in addition to the effects of light absorption and light reflection. The transmittance shown by the minimum value of the rate is 90% or more, preferably 95% or more, more preferably 97% or more, still more preferably 98% or more, and most preferably 99% or more.

[First conductive sheet 12A and second conductive sheet 12B]

The thickness of the first transparent substrate 14A and the second transparent substrate 14B in the first conductive sheet 12A and the second conductive sheet 12B of the present embodiment is preferably 5 μm to 350 μm, and more preferably 30 μm to 150 μm. If it is in the range of 5 μm to 350 μm, the desired transmittance of visible light can be obtained and it is easy to handle.

The metal silver provided on the first transparent substrate 14A and the second transparent substrate 14B can be appropriately determined according to the coating thickness of the coating material for the silver salt-containing layer applied to the first transparent substrate 14A and the second transparent substrate 14B. The thickness of the part. The thickness of the metallic silver portion may be selected from 0.001 mm to 0.2 mm, preferably 30 μm or less, more preferably 20 μm or less, still more preferably 0.01 μm to 9 μm, and most preferably 0.05 μm to 5 μm. Further, the metal silver portion is preferably in the form of a pattern. The metal silver portion may be one layer or a laminate of two or more layers. When the metal silver portion is in the form of a pattern and is composed of a laminate of two or more layers, different color sensitivities can be produced, making it possible to sensitize light at different wavelengths. Thereby, if the exposure wavelength is changed and exposed, a different pattern can be formed in each layer.

In the use of the touch panel, the thinner the thickness of the conductive metal portion, the wider the viewing angle of the display panel. Therefore, it is preferable that the thickness of the conductive metal portion is thin, and it is required to improve the visibility. Achieve thin film. From this viewpoint, the thickness of the layer containing the conductive metal carried on the conductive metal portion is preferably less than 9 μm, more preferably 0.1 μm or more and less than 5 μm, still more preferably 0.1 μm or more and less than 3 μm.

In the present embodiment, the metal silver portion having a desired thickness is formed by controlling the coating thickness of the silver salt-containing layer, and the conductive property can be derived from the ground by physical development and/or plating treatment. Since the thickness of the layer of the metal particles is controlled, it is also possible to easily form the first conductive sheet 12A and the second conductive sheet 12B having a thickness of less than 5 μm, preferably having a thickness of less than 3 μm.

Further, in the method of manufacturing the first conductive sheet 12A or the second conductive sheet 12B of the present embodiment, it is not always necessary to perform a step such as plating. The reason is that in the method for producing the first conductive sheet 12A or the second conductive sheet 12B of the present embodiment, the silver amount and the silver/binder volume ratio of the silver salt emulsion layer can be adjusted to obtain desired. Surface resistance. Further, calendering treatment or the like may be performed as needed.

(hard film treatment after development treatment)

Preferably, after the silver salt emulsion layer is subjected to development treatment, the silver salt emulsion layer is immersed in a hard coating agent to perform a hard film treatment. As a hard film agent, for example The dialdehydes such as glutaraldehyde, adipaldehyde, 2,3-dihydroxy-1,4-dioxane, and the hardeners disclosed in Japanese Laid-Open Patent Publication No. Hei-2-141279.

Furthermore, the present invention can be suitably used in combination with the techniques disclosed in Tables 1 and 2 below and the technology of the international publication booklet. The expressions such as "special opening", "number bulletin", and "number booklet" are omitted.

In the above example, the first conductive pattern 18A is formed by connecting two or more first large lattices 24A in series along the first direction, and two or more are arranged along the second direction. The second large lattice 24B is connected in series to form the second conductive pattern 18B, and may be The first conductive pattern 18A is formed by connecting two or more transparent electrodes of, for example, a rhombic indium tin oxide (ITO) film in series in the first direction, and is used in the second direction. For example, two or more transparent electrodes having a rhombic shape of the ITO film are connected in series to form the second conductive pattern 18B.

In this case, an arrangement of a plurality of regular transparent electrodes formed by arranging transparent electrodes of the ITO film adjacent to each other and a first auxiliary line 36A and a second auxiliary line formed between the transparent electrodes are also mixed. 36B is arranged in a staggered manner and is arranged differently from the arrangement of the transparent electrodes, whereby a plurality of spatial frequencies are phase-tuned, and as a result, interference with the pixel arrangement of the liquid crystal display device is suppressed, which is effective. Ground reduces the generation of ripples.

Further, a functional layer such as an antireflection layer or a hard coat layer may be formed on the conductive sheet.

Hereinafter, the invention will be more specifically described by exemplifying the examples of the invention. Further, the materials, the amounts used, the ratios, the processing contents, the processing order, and the like shown in the following examples can be appropriately changed without departing from the gist of the invention. Therefore, the scope of the invention should not be construed as being limited by the specific examples shown below.

In this example, the corrugations and visibility of the touch panels of Comparative Examples 1 to 3 and Examples 1 to 16 were evaluated. The details and evaluation results of Comparative Example 1 to Comparative Example 3 and Examples 1 to 16 are shown in Table 3 to be described later.

[Example 1]

(silver halide photosensitive material)

An emulsion was prepared which contained 10.0 g of gelatin with respect to 150 g of Ag in an aqueous medium and contained silver iodobromide particles having an average sphere-equivalent diameter of 0.1 μm (I = 0.2 mol%). , Br = 40 mol%).

Further, K ₃ Rh ₂ Br ₉ and K ₂ IrCl ₆ were added to the emulsion so that the concentration reached 10 ^-7 (mole/mole silver), and Rh ions and Ir ions were doped to the silver-smelling particles. Na ₂ PdCl ₄ was added to the emulsion, followed by gold sulphur sensitization using chloroauric acid and sodium thiosulfate, and then the gel coating amount was 10 g/m ² together with the gelatin hard film. It is applied to the first transparent substrate 14A and the second transparent substrate 14B (here, polyethylene terephthalate (PET)). At this time, the Ag/gelatin volume ratio was set to 2/1.

A coating having a width of 25 cm and a length of 20 m was applied to a PET support having a width of 30 cm, and both ends were respectively cut by 3 cm in such a manner that the center portion of the coating of 24 cm was retained, thereby obtaining a roll-shaped silver halide photosensitive material.

(exposure)

The pattern of the first conductive sheet 12A of the laminated conductive sheet 10 is the pattern shown in FIGS. 1 and 3, and the pattern of the second conductive sheet 12B is the pattern shown in FIGS. 1 and 4, and the size of the A4 is The first transparent substrate 14A and the second transparent substrate 14B (210 mm × 297 mm) were exposed. For the exposure, exposure is performed using the photomask of the above pattern using parallel light using a high pressure mercury lamp as a light source.

(development processing)

‧1L developer prescription

‧1L fusion solution formula

Using the automatic developing machine FG-710PTS manufactured by Fujifilm Co., Ltd., the photosensitive material which had been exposed using the above-mentioned treating agent was treated under the following processing conditions, that is, development at 35 ° C for 30 seconds, and at 34 ° C. The fusion of seconds was carried out for 20 seconds of washing water (5 L/min).

(touch panel)

After the first conductive sheet 12A is laminated on the second conductive sheet 12B to obtain a laminated conductive sheet, the laminated conductive sheet is attached to the display screen of the liquid crystal display device to constitute the touch panel of Example 1. In the first example, as shown in Table 3 to be described later, the conductive portion (the first conductive pattern 18A and the first auxiliary pattern) The line width of the 20A, the second conductive pattern 18B, and the second auxiliary pattern 20B) is 5 μm, the length of one side of the small lattice 26 is 50 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) The displacement amount in the third direction and the fourth direction (hereinafter referred to as an offset amount) was 3 μm, which was 3 μm.

[Example 2 to Example 4]

The touch panels of Example 2, Example 3, and Example 4 were produced in the same manner as in Example 1 except that the offset amounts were 5 μm, 10 μm, and 25 μm, respectively.

[Example 5]

The line width of the conductive portion is set to 8 μm, the length of one side of the small lattice 26 is 250 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 5 mm. The touch panel of Example 5 was produced in the same manner as in the above Example 1.

[Example 6 to Example 10]

The touch panels of Example 6, Example 7, Example 8, Example 9, and Example 10 were produced in the same manner as in Example 5 except that the offsets were set to 4 μm, 10 μm, 50 μm, 100 μm, and 125 μm, respectively.

[Example 11]

The line width of the conductive portion is set to 10 μm, the length of one side of the small lattice 26 is 300 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is set to 6 mm. The touch panel of Example 11 was produced in the same manner as in the above Example 1.

[Example 12 to Example 16]

The touch panels of Example 12, Example 13, Example 14, Example 15, and Example 16 were produced in the same manner as in Example 11 except that the offsets were set to 4 μm, 10 μm, 50 μm, 100 μm, and 150 μm, respectively.

[Comparative Example 1 to Comparative Example 3]

A touch panel of Comparative Example 1 was produced in the same manner as in Example 1 except that the offset amount was changed to 0 μm.

A touch panel of Comparative Example 2 was produced in the same manner as in Example 5 except that the offset amount was changed to 0 μm.

A touch panel of Comparative Example 3 was produced in the same manner as in Example 11 except that the offset amount was changed to 0 μm.

[Evaluation]

(evaluation of ripples)

The touch panel is placed on the rotating disk, and the liquid crystal display device is driven to display white. In this state, the rotating disk was rotated between a bias angle of -45° to +45°, and the corrugations were visually observed and evaluated.

The corrugation was evaluated by an observation distance of 1.5 m from the display screen of the liquid crystal display device, and the case where the corrugation was not conspicuous was set to ○, and the case where the corrugation was at a level of no problem and the case where the ripple was extremely small was set to Δ. wave The case where the grain is obvious is set to ×.

(evaluation of visibility)

Before the evaluation of the corrugation, the touch panel is placed on the rotating disk, and when the liquid crystal display device is driven to display white, it is visually confirmed whether there is a thick line or a black spot on the surface of the touch panel.

(Evaluation results)

In Example 10 and Example 16, only a few thick lines or black spots were confirmed, and overall, the visibility was good.

Regarding the corrugations, the corrugations in Comparative Examples 1 to 3 were all remarkable. On the other hand, Examples 1 to 16 as a whole, the evaluation was good, and for Example 3, Example 4, Example 7 to Example 9, Example 13 to Example 15, the ripple was not obvious. Example 1, Example 5, and Example 11 are to the extent that the corrugations are at a level of no problem and very little ripple is seen. Example 2, Example 6, Example 10, Example 12, and Example 16 are at intermediate levels of "△" and "○".

Further, as shown in FIG. 2B, the first conductive portion 16A is formed on one main surface of the first transparent substrate 14A, and the second conductive portion 16B is formed on the other main surface of the first transparent substrate 14A, and compared with Comparative Example 1 In the example 3 and the example 1 to the example 16, the touch panel was produced in the same manner, and even in this case, the evaluation result was the same as the above evaluation result.

The touch panel and the conductive sheet of the present invention are not limited to the above-described embodiments, and various configurations can be employed without departing from the gist of the present invention.

Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and those skilled in the art, without departing from the spirit of the invention And the scope of protection of the present invention is defined by the scope of the appended claims.

10‧‧‧Laminated conductive sheets

12A‧‧‧1st conductive sheet

12B‧‧‧2nd conductive sheet

14A‧‧‧1st transparent substrate

14B‧‧‧2nd transparent substrate

16A‧‧‧1st Conductive Department

16B‧‧‧2nd Conductive Department

18A‧‧‧1st conductive pattern

18B‧‧‧2nd conductive pattern

20A‧‧‧1st auxiliary pattern

20B‧‧‧2nd auxiliary pattern

24A‧‧‧1st large grid

24B‧‧‧2nd plaid

26‧‧‧Small lattice

28A‧‧‧1st connection

28B‧‧‧2nd connection

30‧‧‧ Medium lattice

32A‧‧‧1st gap

32B‧‧‧2nd notch

34A‧‧‧1st insulation

34B‧‧‧2nd insulation

36A‧‧‧1st line

36B‧‧‧2nd auxiliary line

38A‧‧‧1L pattern

38B‧‧‧2L pattern

40A‧‧‧1st terminal

40B‧‧‧2nd terminal

42A‧‧‧1st external wiring

42B‧‧‧2nd external wiring

44‧‧‧Combination pattern

46A‧‧‧1st axis

46B‧‧‧2nd axis

Ha‧‧‧distance

Wa, Wb‧‧‧ line width

x, y, m, n‧‧‧ directions

Fig. 1 is an exploded perspective view showing a laminated electrically conductive sheet, partially omitted.

2A is a cross-sectional view showing an example of a laminated electrically conductive sheet, partially omitted.

Fig. 2B is a cross-sectional view showing another example of the laminated electrically conductive sheet, in which a part is omitted.

3 is a plan view showing a pattern example of a first conductive portion of a first conductive sheet formed in a laminated conductive sheet.

4 is a plan view showing a pattern example of a second conductive portion of a second conductive sheet formed in the laminated conductive sheet.

FIG. 5 is a plan view showing an example in which a first conductive sheet and a second conductive sheet are combined to form a laminated conductive sheet, a part of which is omitted.

6A to 6C are views showing an example of a combined pattern formed by a first auxiliary line arranged along the side of the first large lattice and a second auxiliary line arranged along the side of the second large lattice in the combined pattern. Figure.

7 is a view showing a second auxiliary line among two second L-shaped patterns of each of the first auxiliary line and the second insulating portion in the two first L-shaped patterns of the first insulating portion in the combined pattern. An illustration of an example of a combined pattern.

8 is an explanatory view showing a state in which one line is formed by the first auxiliary line and the second auxiliary line.

10‧‧‧Laminated conductive sheets

12A‧‧‧1st conductive sheet

12B‧‧‧2nd conductive sheet

14A‧‧‧1st transparent substrate

14B‧‧‧2nd transparent substrate

16A‧‧‧1st Conductive Department

16B‧‧‧2nd Conductive Department

18A‧‧‧1st conductive pattern

18B‧‧‧2nd conductive pattern

20A‧‧‧1st auxiliary pattern

20B‧‧‧2nd auxiliary pattern

24A‧‧‧1st large grid

24B‧‧‧2nd plaid

26‧‧‧Small lattice

28A‧‧‧1st connection

28B‧‧‧2nd connection

36A‧‧‧1st line

36B‧‧‧2nd auxiliary line

40A‧‧‧1st terminal

40B‧‧‧2nd terminal

42A‧‧‧1st external wiring

42B‧‧‧2nd external wiring

x, y‧‧‧ direction

Claims (14)

A touch panel includes a conductive sheet, the conductive sheet includes: a first transparent substrate; a first conductive portion formed on one main surface of the first transparent substrate; and a second transparent substrate; The second conductive portion is formed on one main surface of the second transparent substrate, the first transparent substrate and the second transparent base volume layer, and the first conductive portion includes two or more first conductive patterns, and the two or more Each of the first conductive patterns extends along the first direction and is arranged in a second direction orthogonal to the first direction; and a first auxiliary pattern including a plurality of first auxiliary lines arranged around the respective first conductive patterns The second conductive portion includes two or more second conductive patterns, and the two or more second conductive patterns extend in the second direction and are arranged in the first direction, and include the second conductive layers. The second auxiliary pattern of the plurality of second auxiliary lines around the pattern is in a state in which the first conductive pattern and the second conductive pattern are arranged to intersect each other when viewed from the upper surface, and the first conductive pattern and the first conductive pattern are The second above A combination pattern in which the first auxiliary pattern and the second auxiliary pattern are opposed to each other is formed between the electric patterns, and the combination pattern has a form in which the first auxiliary line and the second auxiliary line are not orthogonal to each other. , The first conductive pattern and the second conductive pattern include a plurality of lattices including metal thin wires having a line width of 1 μm to 30 μm. A touch panel includes a conductive sheet, the conductive panel includes: a base; a first conductive portion formed on one main surface of the base; and a second conductive portion formed on the base The first conductive portion includes: two or more first conductive patterns extending in the first direction and arranged in a second direction orthogonal to the first direction; and including the first conductive layer a first auxiliary pattern of the plurality of first auxiliary lines around the conductive pattern, wherein the second conductive portion includes: two or more second conductive patterns extending in the second direction and arranged in the first direction And a second auxiliary pattern including a plurality of second auxiliary lines arranged around the respective second conductive patterns, wherein the first conductive patterns and the second conductive patterns are arranged to intersect each other when viewed from the upper surface a state in which the first auxiliary pattern and the second auxiliary pattern are opposed to each other between the first conductive pattern and the second conductive pattern, and the combination pattern does not have the first Help line and the second auxiliary line coinciding with orthogonal patterns, the first conductive pattern and the second conductive pattern includes a line width comprising A plurality of lattices of metal thin wires of 1 μm to 30 μm. The touch panel according to claim 2, wherein the first axis of the first auxiliary line is substantially parallel to the second axis of the second auxiliary line, and the first axis and the second axis are The distance between the axes is one of 1/2 or more of the line width of the first auxiliary line and the line width of the second auxiliary line, and is 100 μm or less. The touch panel according to claim 3, wherein the combination pattern has a form in which the first auxiliary line and the second auxiliary line partially overlap each other. The touch panel according to claim 3, wherein a distance between the first axis and the second axis is 1/2 of a line width of the first auxiliary line and a line width of the second auxiliary line The total width of 1/2 is longer. The touch panel according to claim 2, wherein a direction in which the first direction and the second direction are equally divided into a third direction is set, and a direction orthogonal to the third direction is set In the fourth direction, the first conductive portion and the second conductive portion are disposed at least offset from the reference position by at least a distance from the reference direction, wherein the distance is the line width of the first auxiliary line and the first Among the line widths of the 2 auxiliary lines, any one of the shorter line widths is 1/2 or more and 100 μm or less. The touch panel of claim 6, wherein the reference position represents a position, ie, The first axis of the first auxiliary line coincides with the second axis of the second auxiliary line, the first auxiliary line does not overlap with the second auxiliary line, and one end of the first auxiliary line and the second line One end of the auxiliary line is consistent. The touch panel according to claim 2, wherein the first conductive pattern and the second conductive pattern are each formed of a plurality of squares. The touch panel according to claim 2, wherein the first conductive pattern is formed by connecting two or more first large lattices in series in the first direction, and the two conductive patterns are formed in the second direction. The second large lattice is connected in series to form the second conductive pattern, and each of the first large lattice and each of the second large lattices is formed by combining two or more small squares, and the first large lattice is formed. The first auxiliary pattern that is not connected to the first large lattice is formed around the side, and the second auxiliary pattern that is not connected to the second large lattice is formed around the side of the second large lattice. The touch panel according to claim 9, wherein in the combination pattern, the first axis of the first auxiliary line is substantially parallel to the second axis of the second auxiliary line, and the first axis and the first axis The distance between the second axis is 1/2 or more of the line width of the first auxiliary line and the line width of the second auxiliary line, and is 1/2 of the arrangement pitch of the small lattice. the following. The touch panel according to claim 9, wherein a length of one side of the first large lattice and the second large lattice is 3 mm to 10 mm, and a length of one side of the small lattice is 50 μm to 500 μm. The touch panel according to claim 2, wherein the first conductive pattern and the second conductive pattern include a plurality of lattices including metal thin lines having a line width of 3 μm to 30 μm. A conductive sheet comprising: a base; a first conductive portion formed on one main surface of the base; and a second conductive portion formed on the other main surface of the base, wherein the first conductive portion includes: Each of the first conductive patterns extends in the first direction and is arranged in a second direction orthogonal to the first direction, and includes a plurality of first auxiliary lines arranged around the first conductive patterns. In the first auxiliary pattern, the second conductive portion includes: two or more second conductive patterns extending in the second direction and arranged in the first direction; and including the periphery of each of the second conductive patterns a second auxiliary pattern of the plurality of second auxiliary lines, in a state in which the first conductive pattern and the second conductive pattern are arranged to intersect each other when viewed from the upper surface, in the first conductive pattern and the second conductive A combination pattern in which the first auxiliary pattern and the second auxiliary pattern are opposed to each other is formed between the patterns. The combination pattern has a form in which the first auxiliary line and the second auxiliary line are not overlapped orthogonally, and the first conductive pattern and the second conductive pattern include a plurality of lattices including metal thin lines having a line width of 1 μm to 30 μm. . A conductive sheet comprising: a first transparent substrate; a first conductive portion formed on one main surface of the first transparent substrate; a second transparent substrate; and a second conductive portion formed on the second transparent substrate a main surface, the first transparent substrate and the second transparent base volume layer, wherein the first conductive portion includes two or more first conductive patterns, and the two or more first conductive patterns respectively extend along the first direction, and a second auxiliary direction orthogonal to the first direction; and a first auxiliary pattern including a plurality of first auxiliary lines arranged around each of the first conductive patterns, wherein the second conductive portion includes two or more second patterns In the conductive pattern, the two or more second conductive patterns extend in the second direction and are arranged in the first direction; and the second plurality of second auxiliary lines arranged in the periphery of each of the second conductive patterns The auxiliary pattern is formed such that the first conductive pattern and the second conductive pattern are arranged to intersect each other when viewed from the upper surface, and the first conductive pattern and the second conductive pattern are formed between the first conductive pattern and the second conductive pattern. 1 auxiliary pattern a combination pattern that faces the second auxiliary pattern, the combination pattern having the first auxiliary line and the second auxiliary In a form in which the auxiliary lines are orthogonally overlapped, the first conductive pattern and the second conductive pattern include a plurality of lattices including metal thin lines having a line width of 1 μm to 30 μm.