201121702 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種奈米平台系統，尤指_種兩段式長 行程奈米級精密定位系統者。 【先前技術】 按，隨著現今產業的導向，近年來隨著工具機、各種 產業機械與量測儀器的高精度化，因此，不論是在精密機 械、半導體產業、微（奈）米科技皆 打议&朝臧小化與精密化發展 :。再加上超精密的加工機、半導體製程裝置、電子 ^原子力顯微鏡等皆需要高精密的定位技術與儀器進行 =1吏得半導體技術慑然已進入到奈米的領域和技術， 進而成為目前的主流之一； 八目則現有的長行程定位平台所使用的傳動方式大致可 ^兩種形式’―種為利用線性滑執與滾珠螺桿，另一種 則疋利用空氣墊與空氣軸承，苴 JLe ..^ ，、利用線性滑轨與滾珠螺 成的平台，具備剛性較佳與穩定性佳的優點，" 此#、高人田 午〆貝有^間^月油’所以會有油氣產生，因 ^用於精度等級要求較低(微米級)的環境，而利用 空t執盥+々4 ^，而利用 /、二矾軸承所組成的平台，具備低摩擦力、可 次微等的優點，適合利於精料級要求較高又( 多產平:::授量測系統是目前許 反應時間良好*铲卢 /、驅’原必須具備體積小、 [S3 生高量的叙两的制動器，且在動作時必須不會產 …b或摩擦問題以避免降低推動的效率，因此目 3 201121702201121702 VI. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a nano-platform system, and more particularly to a two-stage long-stroke nano-precision positioning system. [Prior Art] According to the current industry, in recent years, with the high precision of machine tools, various industrial machinery and measuring instruments, it is in the precision machinery, semiconductor industry, and micro (Nai) technology. Discussion and development of Chaoyang miniaturization and precision: In addition, ultra-precision processing machines, semiconductor process equipment, electronic atomic force microscopes, etc. all require high-precision positioning technology and instruments. 吏 吏 半导体 半导体 semiconductor technology has entered the field and technology of nano, and has become the current One of the mainstream; Eight-eye is the existing long-stroke positioning platform used in the transmission mode can be roughly two forms '- kinds of linear sliding and ball screw, the other is the use of air cushions and air bearings, 苴JLe. .^ , , using a linear slide and a ball screw to form a platform with good rigidity and good stability, " This #, 高人田午〆贝有^间^月油', there will be oil and gas, Because it is used in an environment where the accuracy level is required to be low (micron level), and the use of the empty t stub + 々 4 ^, and the platform composed of /, two bearings, has the advantages of low friction, sub-dimension, etc. It is suitable for the fine material grade requirements and high (multi-production flat::: the measurement system is currently the reaction time is good * shovel / drive) must have a small volume, [S3 high-volume two brakes And must not produce during the action ...b or friction problems to avoid reducing the efficiency of the push, so the target 3 201121702
前現有奈米定位平台的M 口的，不"備…i “備大部分需仰賴國外廠商進 的不仁》又備相虽昂貴且維修也相當不易進 現有奈米定位平台皆屬於小範圍的位移行裎，目前 約在厘米（mm)等級以内，且現有的回授=的限制 用光學尺與光學讀頭進行量測，然而，光學二=使 者長度的增加而產生越大的誤差，其中當光學月^隨 尺（m)時會累積相當大的加工誤 起、1 a 重複性佳但是不準確的現象，進而造成:::: =有 :rr尺運用在長行程的機台上則會造二 =程=響加工精度或檢驗精度，所以如何同時 達到長订％作動與奈米級的精密定位的要求是 亟於解決的問題。 、1 【發明内容】 因此纟發明人有鑑於現有長行程定位平台與奈米定 位平台’無法同時達到長行程作動與奈米級的精密定位的 要求的不足與問題，特經過不斷的研究與試驗，終於發展 出一種能改進現有缺失之本發明。 本發明之目的係在於提供一種兩段式長行程奈米級精 贫定位系統，其係透過線性馬達運動機構搭配塵電運動平 台的兩段式控制方法，藉以提供一大範圍的奈米級定位效 果’且利用-雷射干涉儀定位系統作為回授系統，有別與 現有回授量測機台利用光學尺提供回授訊號，可有效提高 準確生進而提供—方便組裝、成本低且具高精度長行程 定位效果之目的者。 為達到上$目#，本#明係提供一種兩段式長行程奈 [S】 4 201121702 一量測回授組 米級精密定位系統，其係包含有一平台組 及一控制組，其t : 該平台組係設有一底座、一長行程氣浮式平台及一微 動壓電平台’該底座設有一平台’該長行程氣浮式平台係 可移動地設於底座平台上且設有一基準座及一驅動组，该 基準座係設有兩縱向座及一橫向座，其中兩縱向座係转 且間隔地固設於底座的平台上，該橫向座係設於兩縱向座 之間而排列成一 Η形的基準座，該驅動組係設於基準座上 且設1三個線性馬達，其中各線性馬達係分別設於兩縱向 座及橫向座之頂面，且各線性馬達係朝外延伸有一可滑動 的結合板’而該微動壓電平台係與橫向座上的線性馬達相 結合而介於兩縱向座之間，該微動壓電平台係設有一承載 台、一微動調整組及-加工平台，其中該承載台的底部係 與橫向座上線性馬達的結合板相固設結合，該微動調整組 係與承載台相結合且設有一撓性座及兩壓電致動器，該撓 性座係設於承載台頂面，而兩壓電致動器係設於承載台頂 面且與撓性座相貼靠’該加工平台係與連接塊相結合而位 於承載台上方； 6亥置測回授組係與平台組相結合且設有一雷射干涉儀 反射裝置及一訊號接收裝置，其中該雷射干涉儀係固 »又於底座的平台上且設有一雷射光束、複數個分光鏡及複 平面干涉鏡，5亥反射裝置係與平台組的加工平台相結 合且用以反射經過各平面干涉鏡反射出的雷射光束，該訊 號接收裝置係固設於底座的平台上且用以接收各平面干涉 鏡經平面反射鏡反射之雷射光束；以及 201121702 該控制，组係與平台組與量測回授組相電性連接且設有 -工作站’該卫作站設有—電腦及—控制器，該電腦^ 建有-用以接收各接收器訊號的處理軟體，而該控 與電腦、長行程氣浮式平台的驅動組及微動遷電平、 動調整組相電性連接’透過處理軟體所發出的訊號：使驅 動組的各線性馬達進行作動進而達到長行程移動與 位控制的效果，且透過各壓電致_ 、、 翌％致動器的作動而達到對於加 工平台產生微量的x方向位移與微量的θζ角度變化，進 而補正長行程氣浮式平台移動時所產生之χ方向位移誤差 與θ ζ角度誤差。 進步。玄長行私氣浮式平台係設有兩與縱向座、橫 向座及底座平台相結合的空氣抽承組’其中兩空氣轴承组 :分別設：兩縱向座間且與平台與兩縱向座的内側面相貼 * ’各空氣軸承組係設有複數個空氣塾及一轴承座，其中 各空氣塾係分別與平台及縱向座内側面相貼靠，該轴承座 係與各空氣塾相結合而懸空於縱向座與平台之間，而該橫 向座係設於兩軸承座之間’且兩設於縱向座上線性馬達的 結合板係分別與兩軸承座相結合。 再進一步，該撓性座係設有兩固定塊、一連接塊及兩 撓性體’其中兩固定塊係固設於承載台上且與兩縱向座相 平行’該連接塊係橫向設於承載台上且介於兩固定塊之間 ，而各撓性體係與其中一固定塊及連接塊相連接，而兩壓 電致動器係分別與連接塊的側邊相貼靠。 較佳地’該雷射干涉儀係m分光鏡、—第二 分光鏡、-度反射鏡、一第一平面干涉鏡、一第二平 201121702 面干涉鏡及一第二平面干涉鏡，其中兩分光鏡係間隔設於 底座平台上且位於雷射光束射出的路徑上，該9〇度反射 鏡係设於底座平台上且與兩分光鏡呈一直線配置，而各平 面干涉鏡係設於底座的平台上用以接收經分光鏡分光或90 度反射鏡反射之雷射光束，該反射裝置係設有一第一平面 反射鏡及一第二平面反射鏡，兩平面反射鏡係分別設於微 動壓電平台的加工平台上且呈一直角配置之空間關係，用 以反射經過各平面干涉鏡反射出的雷射光束，而該訊號接 收裝置係設有一第一接受器、一第二接收器及一第三接收 器，各接收器係用以接收各平面干涉鏡經平面反射鏡反射 之雷射光束。 較佳地，各線性馬達係設有複數個定子與一動子，其 中各定子係固設於線性馬達内表面的上、下端面而形成一 磁力導執，而該動子係可滑動地設於該磁力導軌内且與結 合板相結合。 較佳地，該微動壓電平台設有複數個設於承載台上且 與加工平台相結合的交又滾子導軌軸承組。 較佳地，該第一分光鏡係為一 33%與67%的分光鏡， 而第二分光鏡係為一 50%與50%的分光鏡。 較佳地，該承載台在異於兩縱向座的兩側邊底部係設 有複數個與橫向座側面及平台相貼靠的空氣墊。 較佳地，該底座係設有複數個與平台相結合的支柱及 〇架，忒長行程氣浮式平台係可移動地設於底座平台 上而位於結合架下方，且該平台與各支柱間係設有一隔震 墊’而該結合架係橫向架設於平台i，藉以架言史機械加工 7 201121702 時所需之刀具。 較佳地，兩縱向座及該橫向座分別一— 藉由上述的技術手段，本發明兩段化崗石塊體。 密定位系統係至少具有以下的優點及功二仃程奈米級精 一、 長行程作動：本發明兩段式長 位系統’主要係透過Η形的長行程氣浮式二精= 墊搭配的方式及其利用線性馬達做為驅動 ’、Υ用工孔 有摩擦阻力小、能大範圍高速移— 八'、 M , m 染及可承齑會 負何的效果。由於長行程氣浮式平台其χ血 πτ /、丫移動轴均再 同一平面上，進而降低機台高度及減 〜·•饵C3移動時所產+ 的直度及角度誤差。 才汀度生 二、 奈米微調作動：本發明兩段式長 — 、贫仃私奈米級精密 疋位系統所提供的微動壓電平台，係藉由壓電致動器具 可控制性、頻響應特性、電能與機械能之間的高轉換率 、微小化及不易發熱的特點，因具有較高位移分辨率 及高定位精度和重複精度’ $而提奈米等級的 角度調整。 ' 三、回授效果佳：本發明兩段式長行程奈米級精密定 位系統所提供的量測回授組，其最大量測範圍為χ ·· 2 = 尺（m) Υ . 2公尺（m);㊀ζ : 3〇〇秒，而量測解析度：直 線線位移解析度為1奈米（nm)，角位移解析度為〇〇1秒 ，不僅可提供一長距離量測範圍（數公尺等級）、高解析^ (0.04〜10nm)、高穩定性、反應快速（大於ιΜΗζ)與排除二 境因素干擾等的特性，進而可同時量測χ、γ盥 〃 w <的變 化並即時控制補償使其精度達到奈米等級。 201121702 【實施方式】 為能詳細瞭解本發明的技術特徵及實用功效，並可依 照說明書的内容來實施，玆進一步以圖式（如第—至三圖所 示）所示的較佳實施例，詳細說明如后： /本發明提供一兩段式長行程奈米級精密定位系統，其 係包含有-平台組（1 Q)、-量測回授組（2Q)及—控制組⑽) ，其中： 該平台組（10)係設有一底座（11)、一長行程氣浮式平 台(12)及一微動壓電平台(13)，其中該底座⑴)係設有複數 個支柱（111〉、一平台（112)及一結合架（113)，該平台（112) 係與各支柱（111)頂面相結合，較佳地，該平台（彳12)與各 支柱（111)間係設有-隔震塾⑴4)，而該結合架⑴3)係橫 向架設於平台（112)上，藉以架設機械加工時所需之刀具；The M port of the former existing nano-positioning platform, not "prepared...i "Most of the need to rely on foreign manufacturers to enter the inconvenience" is also expensive and maintenance is not easy to enter the existing nano-positioning platform is a small range The displacement behavior is currently within about the centimeter (mm) level, and the existing feedback of the feedback = is measured by the optical scale and the optical read head. However, the optical 2 = the increase in the length of the messenger causes a larger error. Among them, when the optical moon ^ with the ruler (m) will accumulate a considerable processing error, 1 a repeatability is good but inaccurate, resulting in:::: = There are: rr rule on the long-stroke machine It will create two = Cheng = ring processing accuracy or inspection accuracy, so how to achieve long-term % operation and nano-level precision positioning requirements is a problem that is solved. 1 [Summary of the invention] Therefore, the inventor has The existing long-stroke positioning platform and the nano-positioning platform can not simultaneously meet the requirements of the long-stroke actuation and the precise positioning of the nano-level. With continuous research and experimentation, a new type of defect can be improved. The invention aims to provide a two-stage long-stroke nano-level lean positioning system, which is a two-stage control method of a linear motor moving mechanism and a dust electric motion platform, thereby providing a large range of nanometers. The level positioning effect' and the use-laser interferometer positioning system as the feedback system, and the existing feedback measuring machine using the optical scale to provide the feedback signal, can effectively improve the accuracy and provide - easy assembly, low cost and For the purpose of high-precision long-stroke positioning effect. In order to achieve the upper #目#, this #明系 provides a two-stage long-stroke Nai [S] 4 201121702 a measurement and feedback group of meters-level precision positioning system, which includes There is a platform group and a control group, wherein: the platform group is provided with a base, a long-stroke air floating platform and a micro-motion piezoelectric platform. The base is provided with a platform. The long-range air-floating platform is movably The utility model is disposed on the base platform and is provided with a reference seat and a driving group. The reference base is provided with two longitudinal seats and a lateral seat, wherein the two longitudinal seats are fixedly and spacedly fixed on the platform of the base. The transverse seat is disposed between the two longitudinal seats and arranged in a circular reference frame. The driving group is disposed on the reference base and has three linear motors, wherein each linear motor is respectively disposed on the two longitudinal seats. a top surface of the transverse seat, and each of the linear motors extends outwardly with a slidable coupling plate', and the micro-motion piezoelectric platform is combined with a linear motor on the lateral seat between the two longitudinal seats, the micro-motion piezoelectric The platform is provided with a loading platform, a micro-motion adjustment group and a processing platform, wherein the bottom of the loading platform is fixedly coupled with the binding plate of the linear motor on the lateral seat, and the micro-motion adjustment group is combined with the loading platform and is provided with a a flexible base and a two-piezoelectric actuator, the flexible seat is disposed on a top surface of the carrier, and the two piezoelectric actuators are disposed on the top surface of the carrier and abut the flexible seat. Combined with the connecting block and located above the carrying platform; the 6-well measuring feedback system is combined with the platform group and is provided with a laser interferometer reflecting device and a signal receiving device, wherein the laser interferometer is fixed a laser on the platform of the base The light beam, the plurality of beam splitters and the complex plane interference mirror, the 5 hai reflection device is combined with the processing platform of the platform group and is used for reflecting the laser beam reflected by the plane interference mirrors, and the signal receiving device is fixed on the base And a laser beam for receiving the reflection of each plane interference mirror through the plane mirror; and 201121702, the control, the group and the platform group and the measurement feedback group are electrically connected and provided with a workstation The station is provided with a computer and a controller, and the computer has a processing software for receiving the signals of the receivers, and the control group and the driving group of the long-stroke air-floating platform and the micro-relocation level and dynamic adjustment The group phase electrical connection 'transmits the signal sent by the processing software: the linear motor of the driving group is actuated to achieve the effect of long-stroke movement and position control, and the operation of each piezoelectric _, 翌% actuator It achieves a slight x-direction displacement and a slight θζ angle change for the processing platform, and then corrects the χ-direction displacement error and θ ζ angle error generated when the long-stroke air-floating platform moves. . progress. The Xuanchangxing private air floating platform is provided with two air pumping groups combined with a longitudinal seat, a lateral seat and a base platform. Two of the air bearing groups are respectively provided: two longitudinal seats and the inner side of the platform and the two longitudinal seats Face-to-face* Each air bearing unit is provided with a plurality of air rafts and a bearing seat, wherein each air raft is respectively abutted against the platform and the inner side of the longitudinal seat, and the bearing seat is suspended in the longitudinal direction in combination with each air raft. Between the seat and the platform, the transverse seat is disposed between the two bearing housings, and the two combined shafts of the linear motor disposed on the longitudinal seat are respectively combined with the two bearing housings. Further, the flexible seat is provided with two fixing blocks, a connecting block and two flexible bodies, wherein two fixing blocks are fixed on the carrying platform and parallel with the two longitudinal seats. The connecting block is laterally disposed on the carrying frame. The stage is between the two fixed blocks, and each flexible system is connected to one of the fixed blocks and the connecting block, and the two piezoelectric actuators respectively abut the side edges of the connecting block. Preferably, the laser interferometer is a m-splitter, a second beam splitter, a -degree mirror, a first plane interferometer, a second flat 201121702 plane interferometer and a second plane interferometer, two of which The beam splitter is disposed on the base platform and located on the path of the laser beam. The 9-degree mirror is disposed on the base platform and arranged in line with the two beamsplitters, and the plane interference mirrors are disposed on the base. a laser beam for receiving the spectroscopic splitting or 90 degree mirror reflection on the platform, the reflecting device is provided with a first planar mirror and a second planar mirror, and the two planar mirrors are respectively arranged on the micro-motion piezoelectric a spatial relationship between the processing platform of the platform and the right angle configuration for reflecting the laser beam reflected by the interferometric mirrors, and the signal receiving device is provided with a first receiver, a second receiver and a first A three receiver, each receiver is configured to receive a laser beam reflected by each plane interference mirror through a plane mirror. Preferably, each linear motor is provided with a plurality of stators and a mover, wherein each stator is fixed on the upper and lower end faces of the inner surface of the linear motor to form a magnetic guide, and the mover is slidably disposed on The magnetic rail is combined with the bonding plate. Preferably, the micro-motion piezoelectric platform is provided with a plurality of cross-roller guide bearing sets disposed on the carrying platform and combined with the processing platform. Preferably, the first beam splitter is a 33% and 67% beam splitter, and the second beam splitter is a 50% and 50% beam splitter. Preferably, the carrying platform is provided with a plurality of air cushions on the bottom sides of the two longitudinal seats opposite to the lateral seat sides and the platform. Preferably, the base is provided with a plurality of pillars and trusses combined with the platform, and the long-stroke air-floating platform is movably disposed on the base platform below the binding frame, and between the platform and the pillars The system is provided with a vibration isolation pad', and the combination frame is horizontally mounted on the platform i, thereby arranging the tools required for mechanical machining 7 201121702. Preferably, the two longitudinal seats and the lateral seat are respectively - the two-staged granite block of the present invention by the above technical means. The dense positioning system has at least the following advantages and advantages: the two-stage long position system of the present invention is mainly used by a long-stroke air-floating two-precision pad with a cymbal shape. The method and the use of the linear motor as the driving ', the working hole has a small frictional resistance, can move in a wide range of high speed - eight ', M, m dyeing and can bear the effect. Due to the long-stroke air-floating platform, the blood πτ /, 丫 moving axes are all on the same plane, which reduces the height of the machine and reduces the straightness and angular error of the + produced by the movement of the bait C3.才汀生生2, Nano-fine-tuning actuation: The two-stage long--, poor-negative nano-precision clamping system provided by the present invention provides a micro-motion piezoelectric platform that is controllable and frequency-controlled by piezoelectric actuators. Responsive characteristics, high conversion rate between power and mechanical energy, miniaturization and non-heating characteristics, due to higher displacement resolution and high positioning accuracy and repeatability '$ and the angle adjustment of the nanometer level. 3. Good feedback effect: The measurement and feedback group provided by the two-stage long-stroke nano-precision positioning system of the present invention has a maximum measurement range of χ ·· 2 = ruler (m) Υ . 2 meters (m); one ζ : 3 〇〇 seconds, and the measurement resolution: linear line displacement resolution is 1 nanometer (nm), angular displacement resolution is 〇〇 1 second, not only provides a long distance measurement range ( Measured χ, γ盥〃 w < changes in the range of several meters), high resolution ^ (0.04~10nm), high stability, fast response (greater than ιΜΗζ) and exclusion of interference from the two factors And immediately control the compensation to make its accuracy reach the nanometer level. 201121702 [Embodiment] In order to understand the technical features and practical effects of the present invention in detail, and in accordance with the contents of the specification, the preferred embodiment shown in the drawings (as shown in the first to third figures) is further described. DETAILED DESCRIPTION As follows: / The present invention provides a two-stage long-stroke nano-precision positioning system comprising a - platform group (1 Q), a measurement feedback group (2Q) and a control group (10), Wherein: the platform group (10) is provided with a base (11), a long-stroke air floating platform (12) and a micro-motion piezoelectric platform (13), wherein the base (1) is provided with a plurality of pillars (111) a platform (112) and a combination frame (113), the platform (112) is coupled to the top surface of each of the pillars (111), preferably, the platform (彳12) and the pillars (111) are provided - Isolation 塾 (1) 4), and the yoke (1) 3) is erected transversely on the platform (112), thereby erecting the tools required for machining;
請配合參看如第五至七圖所示，該長行程氣浮式平台 (12)係可移動地設於底座（1彳）平台（112)上而位於結合架 (11 3)下方，該長行程氣浮式平台（12)係設有—基準座（Μ) 及:驅動組（15)，該基準座（14)係設有兩縱向座（141)、兩 空氣軸承組（142)及一橫向座（143)，其中兩縱向座（141)係 平行且間隔地固設於底座（11)的平台（112)上而兩空氣軸 承組(142)係分別設於兩縱向座(14”間且與平台⑴2)與兩 縱向座（141)的内側面相貼靠，各空氣軸承組（142)係設有 複數個空氣塾（144)及—軸承座（145)，其中各空氣塾⑽) 係刀別與平台⑴2)及縱向座（141).内側面相貝占冑而該轴 承座（145)係與各线塾（144)相結合而懸空於縱向座⑽） 與平台⑴2)之間，該橫向座（143)係設於兩轴承座（145)之 201121702 間’進而使兩縱向座（141)與橫向座（143)排列成一 “h”形 的基準座（14)當作一基準面，較佳 住地，兩縱向座（141)及該 橫向座（143)分別為一花岗岩塊體，由於花崗岩材料穩定， 熱膨服係數低，因此⑻等級的研磨平面精度可達“ m/m ，各空氣軸承組（142)於使用係尨田古〜 用係知用真空預載的形式，並需 在最佳氣膜間隙下進行操作，藉以保證最佳剛度和理想的 承載能力； 該驅動組⑽係設於基準座（14)上且設有三個線性馬 達051)，其中各線性馬達（151)係分別設於兩縱向座⑽） 及橫向座（143)之頂面4各線性馬達（151)係設有複數個 足子（152).、動子（153),其十各定子〇 52〉係固設於線性 馬達(151)内表面的上、下端面而形成一磁力導軌，而該動 子（153)係、可滑動地設於該磁力導執内且朝外延伸有—結合 板(154) ’其中兩設於縱向座(14”上線性馬達。5”的結合 板（154)係分別與兩轴承座（145)相結合，其中利用線性馬 達（151)為直線傳動方式，可消除中間環節帶來的各種定位 誤差’且各磁力導執導向的精度係可達到Q 4"m/2〇〇_ 的直線導向精度，因此’其定位精度高且反應速度快，且 該動子（153)與各定子（152)之間始終保持—定的空氣間隙 而不接觸，由磁力糸蜞古授，ι .士 λ 刀尔、·此又保，可涓除定子52)盥動子 (153)間的接觸摩擦阻力’大大提高系統靈敏度與快速性， 因為無接觸傳遞、幾乎無機械磨差損耗'工作安全可靠且 奸命長利用線性馬達（151)驅動的磁力導軌來精密導向 ，可避免儀器高速移動時產生慣性傾斜的趨勢，所以，利 [S3 用線性馬達（151)直線的直接驅動方式可使系統本身結構大 201121702 為簡化且重量與體積也可大大的降低； 請再配合參看如第八至十圖所示，該微動壓電平台 (13)係與橫向座（143)上的線性馬達（151)相結合而介於兩 縱向座（141)之間，該微動壓電平台（13)係設有一承載台 (16)、一微動調整組（17)、複數個交又滾子導軌軸承組（18) 及一加工平台（19),其中該承載台（16)的底部係與橫向座 (143)上線性馬達（151)的結合板（154)相固設結合使承載 。（16)可透過長行程氣浮式平台（12)而相對底座（11)產生X 方向與Y方向的移動，較佳地，該承載台（16)在異於兩縱 向座041)的兩側邊底部係設有複數個與橫向座（143)側面 及平台（112)相貼靠的空氣墊（161); 該微動調整組（彳7)係與承載台（16)相結合且設有一撓 f生座（1 71 )及兩壓電致動器（172)，纟中該撓性座（171)係設 於承載台（16)頂面上且設有兩固定塊（173)、一連接塊 (1 74)及兩撓性體（1 75)，其中兩固定塊（1 73)係固設於承載 φ D (16)上且與兩縱向座（141)相平行，該連接塊（174)係橫 向叹於承載台（16)上且介於兩固定塊（173)之間，而各撓性 體（175)係與其中一固定塊（173)及連接塊（174)相連接，兩 壓電致動器（172)係設於承載台（16)頂面且分別與連接塊 (1 74)的側邊相貼靠； 乂又滾子導執軸承組（18)係分別設於承載台（16)上 該加工平台（19)係與連接塊（1 74)及各交叉滾子導軌軸承 組（1 8)相 *士 a t 。 位於承載台（16)上方，該微動壓電平台（13) 於作動時俜备1 年如弟十一圖所示，主要利用兩壓電致動器（172) 作為動为飯;、tt 動源’對於連接塊（1 74)進行同時推動或—推一 201121702 拉的作動’使撓性體（175)產生彈性變形，進而使連接塊 (174)產生微量的X方向位移與微量的㊀z角度變化，進而 讓微動壓電平台（13)具有雙軸（X、θζ)微調整的功效，並 且利用的各交叉滾子導執軸承組（18)做為辅助支撐加工平 台（19)重量用，由於各交叉滾子導軌軸承組（18)的χ軸與 Υ軸垂直相交以及有一旋轉軸的結構特性（其作動方式屬於 一習知技術，故不闡述），當連接塊（彳74)產生微量的χ方 向位移與微置的θζ角度變化時，且加工平台（IQ)係與連 籲接塊（1 74)及各交叉滾子導軌軸承組（1 8)相結合，使得加工 平台（19)能精確的產生χ方向位移與θζ角度變化，且能 在高負載下仍可保持良好的精度，因此，透過撓性體（175) 具有材料變形的特性設計一體積小的微動壓電平台，並配 合壓電致動器（172)具有體積小、反應速度快、解析度高及 機電轉換效率尚的特性’達到奈米級微動的能力； 請配合參看如第四圖所示，該量測回授組（2〇)係與平 台組（1 0)相結合且設有一雷射干涉儀（21 )、一反射裝置（22) •及一訊號接收裝置（23),其中該雷射干涉儀（21)係固設於 底座（11)的平台（112)上且設有一雷射光束（211)、一第一 分光鏡（212)、一第二分光鏡（213)、一 g〇度反射鏡（214) 、一第一平面干涉鏡（215)、一第二平面干涉鏡（216)及一 第三平面干涉鏡（217)，其中兩分光鏡（212，21 3)係間隔設 於底座（11)平台（112)上且位於雷射光束（211)射出的路徑 上’較佳地’該第一分光鏡（21 2)係為一 33%與67%的分 光鏡，而第二分光鏡（213)係為一 50%與50%的分光鏡； 該90度反射鏡（214)係設於底座（11)平台（112)上且與 12 201121702 兩分光鏡（212，213)呈一直線配置，而各平面干涉鏡（215 ’ 216 ’ 21 7)係設於底座（11)的平台（]12)上用以接收經分 光鏡（212，213)分光或90度反射鏡（214)反射之雷射光束 ’較佳地，該第一平面干涉鏡（2 1 5)係用以接收第一分光鏡 (212)所反射的雷射光束，而第二平面干涉鏡（216)係用以 接收第二分光鏡（213)所反射的雷射光束，而該第三平面干 涉鏡（217)係用以接收經90度反射鏡（214)所反射之雷射光 束； 該反射裝置（22)係與平台組（1〇)的加工平台〇 9)相結合 且設有一第一平面反射鏡（221)及一第二平面反射鏡（222) ’兩平面反射鏡（221 ’ 222)係分別設於微動壓電平台〇 3) 的加工平台（1 9)上且呈一直角配置之空間關係，用以反射 經過各平面干涉鏡（215，216，21 7)反射出的雷射光束， 較佳地，該第一平面反射鏡（221)係用以反射第一平面干涉 鏡（215)與第二平面干涉鏡（216)之雷射光束，而第二平面 反射鏡（222)係用以反射第三平面干涉鏡（217)之雷射光束 該訊號接收裝置（23)係固設於底座的平台上且設有— 第一接受器（231)、一第二接收器（232)及一第三接收器 (233)，各接收器（231，232，233)係用以接收各平面干涉 鏡（215 ’ 216，21 7)經平面反射鏡（221，222)反射之雷射 光束，較佳地，該第一接收器（231)係用以接收第一平面干 涉鏡（21 5)所反射的雷射光束，藉以量測出加工平台（1 9)的 X軸的位移量，該第二接收器（232)係用以接收第二平面干 涉鏡（216)所反射的雷射光束，藉以量測出加工平台（1 9)的 13 201121702 x軸的位移量，藉由第一接收器（231)與第二接收器（232) 個別量測出的X軸位移量的差值計算而得加工平台（19)旋 轉角度誤差量（θζ)，該第三接收器（233)係用以接收第三 平面干涉鏡（21 7)所反射的雷射光束，藉以量測出加工平台 (19)的Υ軸的位移量； 该量測回授組（2〇)於操作時，該雷射干涉儀（2彳）的雷 射光束（211)經過第一分光鏡（212)後’其雷射光束的強度 被为成一 33 %的雷射光束（|_1)與一 67。/。的雷射光束（L2)， 其中反射的33 %雷射光束（L1)直接射入第一平面干涉鏡 (215)上’該雷射光線直接穿透第一平面干涉鏡（215)並打 在一第一平面反射鏡（221)上再反射回到第一平面干涉鏡 (21 5)由第一接收器（2 31)接收，進而量測出加工平台（1 9) 的X轴的位移量，而另一道穿透過第一分光鏡（212)的雷 射光又經過第二分光鏡（213)分成兩道雷射光源（L2與L3) ’其中一道雷射光源（L2)直接穿透過第二分光鏡（213)後直 接打在90度反射鏡（214)並射入一第三平面干涉鏡（217)上 ，其雷射光束經由第三平面干涉鏡（217)反射打在第二平面 反射鏡（222)上並反射回到第三平面干涉鏡（217)，其反射 回來的雷射光束由第三接收器（2 33)接收以得知Υ轴的位 移量’同理經過第二分光鏡（213)的另一道雷射光源（L3)， 被第"二分光鏡（213)直接反射射入第二平面干涉鏡（216)上 ’其雷射光源直接穿透第二平面干涉鏡（216)打在第一平面. 反射鏡（221)上並反射回到第二平面干涉鏡（216)，其反射 回來的雷射光束由第二接收器（232)接收以得知X軸的位 移量，故藉由第一接收器（231)與第二接收器（232)個別量 [S] 201121702 測出的x軸的位移量的I值_笪；p 置扪圭徂。卞异而侍加工平台（19)旋轉角 度誤差量（0z);以及Please refer to the fifth to seventh figures. The long-stroke air-floating platform (12) is movably disposed on the base (1彳) platform (112) and below the binding frame (11 3). The stroke air floating platform (12) is provided with a reference seat (Μ) and a drive group (15), the reference seat (14) is provided with two longitudinal seats (141), two air bearing groups (142) and one a transverse seat (143), wherein the two longitudinal seats (141) are fixed in parallel and spaced apart on the platform (112) of the base (11) and the two air bearing sets (142) are respectively disposed between the two longitudinal seats (14" And the platform (1) 2) and the inner side of the two longitudinal seats (141) are abutted, each air bearing group (142) is provided with a plurality of air 塾 (144) and a bearing housing (145), wherein each air 塾 (10)) The knife and the platform (1) 2) and the longitudinal seat (141). The inner side is opposite to each other and the bearing seat (145) is combined with each of the turns (144) and suspended between the longitudinal seat (10)) and the platform (1) 2). The transverse seat (143) is disposed between the two bearing seats (145) 201121702', and the two longitudinal seats (141) and the lateral seat (143) are arranged in an "h" shaped reference seat (14) as a The reference plane, the preferred residence, the two longitudinal seats (141) and the transverse seat (143) are respectively a granite block. Since the granite material is stable and the thermal expansion coefficient is low, the polishing plane accuracy of the (8) grade can reach “m/ m, each air bearing group (142) is used in the form of vacuum preloading, and needs to be operated under the optimal air gap to ensure the best stiffness and ideal bearing capacity; The driving group (10) is disposed on the reference seat (14) and is provided with three linear motors 051), wherein each linear motor (151) is respectively disposed on the two longitudinal seats (10)) and the top surface of the lateral seat (143) 4 linear motors (151) is provided with a plurality of feet (152)., movers (153), and ten stators 52> are fixed on the upper and lower end faces of the inner surface of the linear motor (151) to form a magnetic guide rail. The mover (153) is slidably disposed in the magnetic guide and extends outwardly with a coupling plate (154) 'two of which are disposed on the longitudinal seat (14" on the linear motor. 5" 154) is combined with two bearing housings (145), wherein the linear motor (151) is used for straight transmission The method can eliminate various positioning errors brought by the intermediate links' and the precision of each magnetic guide guiding can achieve the linear guiding precision of Q 4"m/2〇〇_, so the positioning precision is high and the reaction speed is fast, and The mover (153) and the stator (152) always maintain a constant air gap without contact, which is taught by the magnetic force, and the ι. 士 刀 , , , , , , , , , , , , , , The contact frictional resistance between the tweezer (153) greatly improves the sensitivity and speed of the system, because there is no contact transmission, almost no mechanical wear and tear loss. 'Work safe and reliable and long-lasting using the magnetic motor driven by the linear motor (151) Precision guiding can avoid the tendency of inertial tilt when the instrument moves at high speed. Therefore, the direct driving method of S3 with linear motor (151) can make the structure of the system itself large 201121702 simplified and the weight and volume can be greatly reduced; Please refer to the eighth embodiment as shown in the eighth to tenth drawings. The micro-motion piezoelectric platform (13) is combined with the linear motor (151) on the lateral seat (143) between the two longitudinal seats (141). Micro-motion piezoelectric The table (13) is provided with a carrying platform (16), a jog adjustment group (17), a plurality of roller and roller guide bearing sets (18) and a processing platform (19), wherein the bottom of the carrying platform (16) The binding plate (154) of the linear motor (151) on the lateral seat (143) is fixedly coupled to carry the load. (16) The X-direction and the Y-direction movement can be generated relative to the base (11) through the long-stroke air-floating platform (12). Preferably, the carrier (16) is on opposite sides of the two longitudinal seats 041) The bottom bottom is provided with a plurality of air cushions (161) abutting the lateral seat (143) side and the platform (112); the micro-motion adjustment group (彳7) is combined with the carrying platform (16) and provided with a deflection And a two-piezoelectric actuator (172), wherein the flexible seat (171) is disposed on the top surface of the carrying platform (16) and is provided with two fixing blocks (173) and a connection. Block (1 74) and two flexible bodies (1 75), wherein two fixed blocks (1 73) are fixed on the bearing φ D (16) and parallel with the two longitudinal seats (141), the connecting block (174) ) laterally sighed on the carrying platform (16) and between the two fixed blocks (173), and each flexible body (175) is connected to one of the fixed blocks (173) and the connecting block (174), two The piezoelectric actuators (172) are disposed on the top surface of the carrying platform (16) and respectively abut the side edges of the connecting block (1 74); the roller bearing roller bearing sets (18) are respectively disposed on the bearing The processing platform (19) and the connection block on the table (16) 174) and each cross roller guide bearing set (18) * persons with a t. Located above the carrying platform (16), the micro-actuating piezoelectric platform (13) is prepared for one year as shown in the eleventh figure, and mainly uses two piezoelectric actuators (172) as the moving rice; The source 'simultaneously pushes or pushes a connection of the connection block (1 74) to make the flexible body (175) elastically deform, thereby causing the connecting block (174) to generate a slight X-direction displacement and a slight z-angle. The change, in turn, allows the micro-motion piezoelectric platform (13) to have the dual-axis (X, θ ζ) fine adjustment effect, and utilizes each of the crossed roller guide bearing sets (18) as an auxiliary support processing platform (19) weight, Since the χ axis of each of the crossed roller guide bearing sets (18) intersects perpendicularly with the Υ axis and the structural characteristics of a rotating shaft (the operation mode is a conventional technique, it is not explained), when the connecting block (彳74) generates a trace amount When the χ direction displacement and the micro θ angle change, and the processing platform (IQ) is combined with the continuation joint block (1 74) and each cross roller guide bearing group (18), the processing platform (19) Accurately produces χ-direction displacement and θζ angle change, and can Good precision can be maintained under load. Therefore, a small-sized micro-motion piezoelectric platform is designed through the flexible material (175) with material deformation characteristics, and the piezoelectric actuator (172) has a small volume and fast response speed. High resolution and electromechanical conversion efficiency's ability to achieve nano-level micro-motion; please refer to the figure shown in Figure 4, the measurement feedback group (2〇) is combined with the platform group (10) And a laser interferometer (21), a reflecting device (22), and a signal receiving device (23), wherein the laser interferometer (21) is fixed on the platform (112) of the base (11) And a laser beam (211), a first beam splitter (212), a second beam splitter (213), a g-mirror mirror (214), a first plane interference mirror (215), a first a two-plane interferometer (216) and a third interferometric mirror (217), wherein the two beamsplitters (212, 21 3) are spaced apart from the base (11) platform (112) and are located at the laser beam (211) On the path, 'the preferred first beam splitter (21 2) is a 33% and 67% beam splitter, and the second beam splitter (21) 3) is a 50% and 50% beam splitter; the 90 degree mirror (214) is disposed on the base (11) platform (112) and is in line with the 12 201121702 two-beam splitter (212, 213). And each plane interference mirror (215 '216 ' 21 7) is disposed on the platform (] 12) of the base (11) for receiving the beam reflected by the beam splitter (212, 213) or the 90 degree mirror (214) Preferably, the first planar interferometer (2 15) is for receiving a laser beam reflected by the first beam splitter (212), and the second plane interferometer (216) is for receiving the first beam. a laser beam reflected by a dichroic mirror (213), and the third plane interferometer (217) is configured to receive a laser beam reflected by a 90 degree mirror (214); the reflecting device (22) is coupled to The processing platform of the platform group (1〇) is combined with a first plane mirror (221) and a second plane mirror (222). The two plane mirrors (221 '222) are respectively arranged in the micro motion. Piezoelectric platform 〇3) on the processing platform (1 9) and in a spatial relationship of the right angle configuration for reflection through the various plane interference mirrors (215, 216, 21 7) Preferably, the first planar mirror (221) is configured to reflect the laser beam of the first planar interference mirror (215) and the second planar interference mirror (216), and the second planar reflection The mirror (222) is used to reflect the laser beam of the third plane interferometer (217). The signal receiving device (23) is fixed on the platform of the base and is provided with a first receiver (231) and a second a receiver (232) and a third receiver (233), each receiver (231, 232, 233) for receiving each plane interference mirror (215 '216, 21 7) through a plane mirror (221, 222) The reflected laser beam, preferably, the first receiver (231) is configured to receive the laser beam reflected by the first plane interference mirror (21 5), thereby measuring the X of the processing platform (19) The amount of displacement of the shaft, the second receiver (232) is configured to receive the laser beam reflected by the second plane interferometer (216), thereby measuring the displacement of the 13 201121702 x-axis of the processing platform (19) The processing platform (19) is calculated by calculating the difference between the X-axis displacements of the first receiver (231) and the second receiver (232) The rotation angle error amount (θζ), the third receiver (233) is configured to receive the laser beam reflected by the third plane interference mirror (21 7), thereby measuring the displacement of the boring axis of the processing platform (19) The measurement feedback group (2〇) is operated, the laser beam (211) of the laser interferometer (2彳) passes through the first beam splitter (212), and the intensity of the laser beam is A 33% laser beam (|_1) with a 67. /. a laser beam (L2), wherein the reflected 33% of the laser beam (L1) is directly incident on the first plane interferometer (215). The laser beam directly penetrates the first plane interferometer (215) and is struck A first planar mirror (221) is reflected back to the first plane interferometer (21 5) and received by the first receiver (2 31), thereby measuring the displacement of the X-axis of the processing platform (1 9). And another laser light that has penetrated the first beam splitter (212) is split into two laser light sources (L2 and L3) through the second beam splitter (213). One of the laser light sources (L2) directly penetrates the second light source. The beam splitter (213) is directly struck on the 90 degree mirror (214) and is incident on a third plane interferometer (217). The laser beam is reflected by the third plane interferometer (217) and reflected in the second plane. The mirror (222) is reflected back to the third plane interferometer (217), and the reflected laser beam is received by the third receiver (2 33) to know the displacement of the x-axis. Another laser source (L3) of the mirror (213) is directly reflected by the second "division mirror (213) into the second plane interferometer (216) The laser light source directly penetrates the second plane interferometer (216) to strike the first plane. The mirror (221) is reflected back to the second plane interferometer (216), and the reflected laser beam is second. The receiver (232) receives the amount of displacement of the x-axis, so that the value of the displacement of the x-axis measured by the first receiver (231) and the second receiver (232) is [S] 201121702 _笪;p is set to 扪. Amazing processing platform (19) rotation angle error (0z);
該控制組（30)係與平台組（1 〇)與量測回授组（2G)相電性 連接且設有一卫作站（31)，該卫作站（31)係設有—電腦⑻） 及-控制器（33)，其中該電腦（32)係内建有—用以接收各 接收器(231，232’ 233)訊號的處理軟體(圖未示），而該控 制器⑻）係與電腦（32)、長行程氣浮式平台（12)的驅動組 (15)及微動壓電平台（13)的微動調整組（17)相電性連接，透 過處理軟體所發出的訊號而使驅動組(15)的各線性馬達 (151)進行作動進而㈣長行程移動與快速定位控制的效果 ，且透過各壓電致動器（172)的料而達到料加工平台 (19)產生微量& X方向位移與微量的^角度變化進： 補正長行程氣浮式平台（12)移動時所產生u方向位移誤 差與Θ“度誤差。本發明的兩段式長行程奈米級精密定 位系統’其作動原理主要係採用兩段式的定位控制來達到 長行程與奈米級的定位操作’其中第一階段係利用Η形長 行程氣浮式平台(12)來進行步進位移，其步進位移的最大 範圍可達200公厘（mm)x200公厘（_)，而第二階段則是 利用微動壓電平台⑽進行微小位移的補、賞，其定位精度 可以達到奈米等級，而該量測回授組（2〇)由於雷射光源在 經過-段距離之後仍會維持細小的光束，不會像一般光 源會散開’同時具有極高的亮度、穩定性與精確性良好的 波長，再加上干涉現象容易觀測，因此，該量測回授租 (2〇)係可準確地對於長行程移動平台進行χ軸、丫轴盘偏 擺角度誤差Θ:的定位誤差量測與回授訊號控制補償。、 tS3 15 201121702The control group (30) is electrically connected to the platform group (1 〇) and the measurement feedback group (2G) and has a guard station (31), and the guard station (31) is provided with a computer (8) And a controller (33), wherein the computer (32) is internally provided with processing software (not shown) for receiving the signals of the respective receivers (231, 232' 233), and the controller (8) is It is electrically connected to the computer (32), the drive group (15) of the long-stroke air-floating platform (12), and the jog adjustment group (17) of the micro-motion piezoelectric platform (13), and is transmitted through the signal sent by the processing software. Each linear motor (151) of the driving group (15) performs the action of (4) long stroke movement and rapid positioning control, and the material processing platform (19) is generated by the material of each piezoelectric actuator (172) to generate a trace &; X-direction displacement and a small amount of ^ angle change: Correction of the u-direction displacement error and Θ"degree error caused by the movement of the long-stroke air-floating platform (12). The two-stage long-stroke nano-precision positioning system of the present invention 'The principle of its operation mainly uses two-stage positioning control to achieve long-stroke and nano-level positioning operations. The first stage uses a long-stroke air-floating platform (12) to perform step displacement. The maximum range of step displacement can reach 200 mm (mm) x 200 mm (_), while the second stage is utilized. The micro-motion piezoelectric platform (10) compensates for small displacements, and its positioning accuracy can reach the nanometer level, and the measurement feedback group (2〇) maintains a small beam after the laser beam passes the segment distance. It doesn't spread like a general light source', and it has a very high brightness, stability and accuracy. The interference is easy to observe. Therefore, the measurement back rent (2〇) can be accurate for long The travel moving platform performs the positioning error measurement and the feedback signal control compensation of the yaw axis and the yaw axis yaw angle error: tS3 15 201121702
藉由上述的技術手段，本發明的兩段式長行程奈米級 精密定位系統係以線性馬達（1 5”配合微動壓電平台（13)完 成奈米級定位，並且搭配量測回授組（2〇)針對於運動長行 程移動平台進行Χ#、γ轴與偏擺角度誤差θζ的定位誤 差量測與回授訊號控制補償，再透過電腦（32)的處理軟體 對於各接收器（231，232，233)訊號進行計算後，經由控 制器（33)控制驅動組（15)各線性馬達（151)進行作動進而達 到長行程移動與快速定位控制的效果，並透邁各壓電致動 器（172)的作動而達到對於加工平台（19)產生微量的χ方向 位移與微量的θζ角度變化，進而補正長行程氣浮式平台 (12)移動時所產生之X方向位移誤差與θζ角度誤差，因 此，藉由本發明兩段式長行程奈米級精密定位系統，不僅 可有效降低成本以提升競爭力，且可透過模組化的組合方 式，有效減少未來修護上和生產上的時間，進而提供一方 便組裝、成本低且具高精度長行較位效果之檢測方法及 裝置者。 以上所述，僅是本發明的較佳實施例，並非對本發明 作任何形式上的限制，任何所屬技術領域中具有通常知識 者’若在不脫離本發明所提技術方案的範圍内，利用本發 明所揭示技術内容所作出局部更動或修飾的等效實施例， 並且未脫離本發明的技術方案内卜均仍屬於本發明技術 方案的範圍内。 【圖式簡單說明】 第-圖係本發明兩段式長行程奈米級精密定位系統之 立體外觀示意圖。 t S1 16 201121702 第二圖係本發明平台組與 圖。 、則回授組之立體外觀示意 第三圖係本發明+台 圖。 興里測回授組之外觀側視示意 示意圖 :四圖係本發明平台組與#剛回授組 之放大立體外觀According to the above technical means, the two-stage long-stroke nano-precision positioning system of the present invention completes the nano-level positioning with a linear motor (1 5" and a micro-actuated piezoelectric platform (13), and is matched with the measurement feedback group. (2〇) For the long-stroke moving platform of the motion, the positioning error measurement and feedback signal control compensation of the Χ#, γ-axis and yaw angle error θζ are performed, and then the processing software of the computer (32) is used for each receiver (231). , 232, 233) After the signal is calculated, the linear motor (151) of the driving group (15) is controlled by the controller (33) to perform the action of long-stroke movement and rapid positioning control, and the piezoelectric actuation is performed. The action of the device (172) achieves a slight χ-direction displacement and a slight θζ angle change for the processing platform (19), thereby correcting the X-direction displacement error and the θζ angle generated when the long-stroke air-floating platform (12) moves. The error, therefore, the two-stage long-stroke nano-precision positioning system of the present invention not only can effectively reduce the cost to enhance the competitiveness, but also can effectively reduce the future repair through a modular combination. And the time of production, thereby providing a convenient assembly, low cost and high precision long-line effect detection method and device. The above description is only a preferred embodiment of the present invention, and does not form any form of the present invention. </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; The technical solutions of the present invention are still within the scope of the technical solution of the present invention. [Simplified Description of the Drawings] The first drawing is a schematic perspective view of the two-stage long-stroke nano-precision positioning system of the present invention. t S1 16 201121702 The second figure is the platform group and the diagram of the present invention. The three-dimensional appearance of the feedback group is shown in the third figure is the invention + the table diagram. The schematic view of the appearance of the Xingli test feedback group: four pictures are the platform group of the present invention Magnified stereoscopic appearance with the # just returned group
第五圖係本發明孚A 第六圖係本發明平二::部放大立體外觀示意圖。 外觀示意圖。 刀加工平台之局部放大立體 第七圖係本發明平台 觀示意圖。 、刀承載台之局部放大立體外 組之局部放大俯視示意 組分離承載台之局部放大俯視示 第八圖係本發明平台 第九圖係本發明平 I〜圖 意圖 第十圖係本發明微動 M 調1，·且之局部放大俯視示意圖。 第十一圖係本發明彡料h 意圖 動調正組局部放大之操作俯視示 (11)底座 (112)平台 (114)隔震墊 (13)微動壓電平台 (141)縱向座 (143)橫向座 i S] 【主要元件符號說明】 (1〇)平台組 (U1)支柱 (113)結合架 (12)長行程氣浮式平台 (14)基準座 (14 2)空氣軸承組 17 201121702The fifth drawing is a sixth embodiment of the present invention. Schematic diagram of the appearance. Partially enlarged solid view of the knife processing platform The seventh figure is a schematic view of the platform of the present invention. Partial enlarged top view of the partially enlarged stereo outer group of the knife carrier table. Partial enlarged plan view of the separation carrier. The eighth diagram of the platform of the present invention is the ninth diagram of the present invention. The first embodiment of the present invention is a micro-motion M of the present invention. Adjusted to 1, and the partial enlargement of the top view. The eleventh figure is the operation of the present invention h intended to adjust the positive group partial enlargement operation (11) base (112) platform (114) isolation pad (13) micro-motion piezoelectric platform (141) longitudinal seat (143) Lateral seat i S] [Main component symbol description] (1〇) platform group (U1) pillar (113) combined frame (12) long stroke air floating platform (14) reference seat (14 2) air bearing group 17 201121702
(144)空氣墊 (1 5)驅動組 (151)線性馬達 (153)動子 (16) 承載台 (17) 微動調整組 (172)壓電致動器 (174)連接塊 (1 8)交叉滾子導軌軸承組 (2 0)量測回授組 (21) 雷射干涉儀 (212)第一分光鏡 (214)90度反射鏡 (216)第二平面干涉鏡 (22) 反射裝置 (221)第一平面反射鏡 (23) 訊號接收裝置 (232)第二接收器 (30)控制組 (32)電腦 (14 5)軸承座 (152)定子 (154)結合板 (161)空氣墊 (171)撓性座 (173)固定塊 (175)撓性體 (1 9)加工平台 (211)雷射光束 (213)第二分光鏡 (215)第一平面干涉鏡 (217)第三平面干涉鏡 (222)第二平面反射鏡 (231)第一接受器 (233)第三接收器 (31)工作站 (33)控制器 [S] 18(144) Air cushion (15) Drive group (151) Linear motor (153) Mover (16) Carrier (17) Jog adjustment group (172) Piezo actuator (174) Connection block (18) Cross Roller guide bearing set (20) measuring feedback group (21) laser interferometer (212) first beam splitter (214) 90 degree mirror (216) second plane interferometer (22) reflecting device (221 ) First plane mirror (23) Signal receiving device (232) Second receiver (30) Control group (32) Computer (14 5) Bearing housing (152) Stator (154) Bonding plate (161) Air cushion (171 Flexible seat (173) fixed block (175) flexible body (19) processing platform (211) laser beam (213) second beam splitter (215) first plane interferometer (217) third plane interferometer (222) Second Plane Mirror (231) First Receiver (233) Third Receiver (31) Workstation (33) Controller [S] 18