TW201100184A - Composite copper particle - Google Patents

Composite copper particle Download PDF

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Publication number
TW201100184A
TW201100184A TW099105183A TW99105183A TW201100184A TW 201100184 A TW201100184 A TW 201100184A TW 099105183 A TW099105183 A TW 099105183A TW 99105183 A TW99105183 A TW 99105183A TW 201100184 A TW201100184 A TW 201100184A
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Taiwan
Prior art keywords
particles
copper
inorganic oxide
mother
particle
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TW099105183A
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Chinese (zh)
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TWI519364B (en
Inventor
Yoshinori Shimizu
Keita Furumoto
Hikaru Minowa
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Mitsui Mining & Smelting Co Ltd
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Publication of TW201100184A publication Critical patent/TW201100184A/en
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Publication of TWI519364B publication Critical patent/TWI519364B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/04Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)

Abstract

The present invention relates to a composite copper particle, comprising a parent particle of copper having an average particle diameter of 0.2-10 μm, which contains therein a plurality of inorganic oxide particles having an average particle diameter of 5-50 nm. The inorganic oxide particles include particles that are completely embedded in the parent particle near the surface thereof and particles that are embedded in the parent particle in a condition of being partially exposed on the surface of the parent particle. The content of the inorganic particles is 0.1-5wt% relative to the total weight of the composite copper particle.

Description

201100184 六、發明說明: 【發明所屬之技術領域】 本發明係關於-種於含有銅之母粒子中含有複數個 氧化物粒子而成的複合銅粒子。 【先前技術】 導電膠係於包含樹脂系黏合劑與溶劑之媒劑中分散 電填料之流動性組合物’目前廣泛用於形成電子二 形成陶瓷電容器之外部電極等。 s[Technical Field] The present invention relates to a composite copper particle in which a plurality of oxide particles are contained in a mother particle containing copper. [Prior Art] A fluidity composition in which a conductive paste is dispersed in a medium containing a resin-based binder and a solvent, and is widely used for forming an external electrode for forming an electron capacitor or the like. s

作為上述導電膠之-種,有藉由高溫锻燒使有機成分揮 發並燒結導電填料而確保導通的高溫煅燒型導電膠。 該高溫燉燒型導電膠一般係將以金屬粒子為代表之導電 填料與玻璃料分散至有機媒财而成的糊狀組合物,且係 藉由於柳〜_°c左右之相對較高之高溫下進行烺燒使有 機媒劑揮發’進而藉由燒結導電填料而確保導通者。此 時’玻璃料具有使該導電膜接著於之作用,而有機 媒劑係作為用於使金屬粉末及玻璃料變得可進行印刷之有 機:體介質而發揮作用。高溫煅燒型導電膠由於煅燒溫度 較高,故而無法用於印刷配線基板或樹脂材料,但其可藉 由進行燒結使金屬一體化而實現低電阻化,目前例如用於 積層陶瓷電容器之外部電極等。 另外,作為導電膠所使用之金屬粒子,目前提出有各種 使成為母材之金屬粒子與無機氧化物複合化而成的粒子。 例如專利文獻丨及2中記載有於銅粒子之表面披覆Μ%而成 之銅粒子。據该等文獻記載,含有包含該銅粒子之銅粉的 146549.doc 201100184 導電膠係耐氧化性與燒結性優異者。但是,針對燒結時之 耐熱收縮性之改善尚無研究。 有別於上述技術,本申請人為了提高金屬粉之耐熱收縮 性,獲得尺寸穩定性優異之導電電路,而提出於金屬粉之 粉粒表面形成無機氧化物層而成的塗有無機氧化物之金屬 粉(參照專利文獻3)。無機氧化物層係由氧化矽或氧化鋁所 構成。金屬粉為銅粉或銀粉。無機氧化物層係藉由利用機 械化學方法使無機氧化物固著在金屬粉之粉粒表面而形 成0 但是,業界對於導電膠用、特別是高溫煅燒型導電膠用 之金屬粒子之要求特性日益嚴格,對於耐熱收縮性亦謀求 進一步之提昇。 [專利文獻1]日本專利特開2005-129424號公報 [專利文獻2]曰本專利特開2008-101276號公報 [專利文獻3]日本專利特開2004-84069號公報 【發明内容】 本發明之目的在於提供-種各種性能較上述先前技術之 粒子進一步提昇的複合金屬粒子。 本發明係提供一種複合銅粒子,其特徵在於:其係於平 均粒徑為0.2〜H)叫之含有鋼之母粒子中含有複數個平均 粒徑為5〜50 nm之無機氧化物粒子的複合銅粒子, 無機氧化物粒子包含:完全包埋 於母拉子之表面附近 者、與於一部分露出母粒子之表面 丁又表面的狀態下包埋於母粒子 T者, 146549.doc 201100184 無機氧化物粒子 0· 1〜5重量%。 之含量相對於複合铜 板子整體而為 發明係提供一種複合金屬粒子之製 徵在於:其係上述複合銅粒子之製造方法,> ,/、特 其具有向含有銅離子·或者含有銅之離子 銅氮氧化物及無機氧化物粒子之水性液敢中添::::: 進行銅之還原的步驟, 、As the above-mentioned conductive paste, there is a high-temperature calcined conductive paste which is ensured to conduct by high-temperature calcination by volatilizing an organic component and sintering a conductive filler. The high-temperature stewed conductive adhesive is generally a paste-like composition in which a conductive filler represented by metal particles and a glass frit are dispersed to an organic medium, and is relatively high in temperature due to about ~_°c. The calcination is carried out to volatilize the organic vehicle, and the conductive material is ensured by sintering the conductive filler. At this time, the glass frit has a function of causing the conductive film to follow, and the organic solvent functions as an organic medium for making the metal powder and the glass frit printable. The high-temperature calcined conductive paste cannot be used for a printed wiring board or a resin material because of its high calcination temperature. However, it can be integrated by magnetization to achieve low resistance, and is currently used, for example, for external electrodes of laminated ceramic capacitors. . Further, as the metal particles used for the conductive paste, various particles obtained by combining metal particles to be a base material and inorganic oxide have been proposed. For example, Patent Documents 丨 and 2 describe copper particles in which the surface of the copper particles is covered with Μ%. According to these documents, 146549.doc 201100184 conductive paste containing copper powder containing the copper particles is excellent in oxidation resistance and sinterability. However, there has been no research on the improvement of the heat shrinkage resistance at the time of sintering. In addition to the above-mentioned technique, the present applicant has obtained an inorganic oxide layer formed by forming an inorganic oxide layer on the surface of the powder of the metal powder in order to improve the heat shrinkage resistance of the metal powder and obtain a conductive circuit excellent in dimensional stability. Metal powder (refer to Patent Document 3). The inorganic oxide layer is composed of cerium oxide or aluminum oxide. The metal powder is copper powder or silver powder. The inorganic oxide layer is formed by fixing the inorganic oxide to the surface of the powder of the metal powder by mechanochemical method. However, the required properties of the metal particles for the conductive paste, particularly the high-temperature calcined conductive paste, are increasingly required. Strictly, the heat shrinkage resistance is also sought to be further improved. [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. 2008-101276 (Patent Document 3) Japanese Patent Laid-Open Publication No. Hei No. Hei. No. 2004-84069. The object is to provide a composite metal particle having various properties which are further improved than those of the prior art described above. The present invention provides a composite copper particle characterized in that it is a composite of inorganic oxide particles having an average particle diameter of 5 to 50 nm in a mother particle containing steel having an average particle diameter of 0.2 to H. The copper particles and the inorganic oxide particles include those which are completely embedded in the vicinity of the surface of the female puller and are embedded in the mother particle T in a state in which a part of the surface of the mother particle is exposed and exposed, 146549.doc 201100184 inorganic oxide The particles are 0·1 to 5 wt%. The content of the composite metal particles is the same as that of the composite copper plate as a whole, and is a method for producing the composite copper particles described above, and/or a copper ion-containing or copper-containing ion. Water-based liquid of copper oxynitride and inorganic oxide particles dare to add::::: The step of reducing copper,

G Ο 於銅之還原中’在最初水性液體中所存在者以外 添加無機氧化物粒子, 或將銅之還原中之液體的ΡΗ值調節為7.5〜12之範圍 【實施方式】 以下,基於本發明之較佳實施形態對其進行說明。本發 明之複合銅粒子係由包含銅之母粒子與無機氧化物粒子之 複合體所構成。無機氧化物粒子係粒徑小於母粒子者。無 機氧化物粒子於丨個母粒子中含有複數個。複合銅粒子二 母粒子中之無機氧化物粒子之存在位置方面具有一個特 徵。詳細而言’無機氧化物粒子包括如下至少2種:(甲)完 全包埋於母粒子之表面附近者、與(乙)於一部分露出母粒 子之表面之狀態下包埋於母粒子令者。藉由使無機氧化物 粒子存在於如此位置,例如對包含含有複合銅粒子之漿料 等的導體進行燒結時,變得可控制複合銅粒子之熱收縮開 始溫度及熱收縮速度。其原因如下。 藉由存在(乙)之無機氧化物粒子,於燒結時複合銅粒子 彼此之融著會受到阻礙,熱收縮開始溫度會提高。關於熱 146549.doc 201100184 ί縮速度’通f於開始銅之融著後,熱收縮速度會瞬間提 门而於本發明中,(曱)之無機氧化物粒子之存在會使炉 結收縮之瞬間准γ A z„ 70 ^ τ又到阻礙。藉此抑制熱收縮速度。基於 X等原□根據本發明之複合銅粒子,可於燒結時容易地 控制熱收縮。關於上文所述之專利文獻认?中所記栽的技 1由於係僅於鋼粒子表面存在si〇2的狀態,故而開始融 著後不會阻礙熱收縮,因而會瞬間進行熱收縮。該現象於 將粒子用於電極之形成時’將成為龜裂或剝落之原因。 關於專利文獻3所記載之技術,其與專利文獻1及2同 樣地有開始融著後瞬間進行熱收縮的情況。又於形成粒 子之塗膜後,若不進行熱處理使粒子高結晶化,則有時無 法獲得充分之耐熱收縮效果。 複合銅粒子中之無機氧化物粒子如上述所述,包括(曱) 完全包埋於母粒子之表面附近者、與(乙)於一部分露出母 粒子之表面之狀態下包埋於母粒子中者之至少2種,關於 (甲)之無機氧化物粒子,所謂「完全包埋於母粒子之表面 附近」係指無機氧化物粒子主要存在於如下區域,即··將 母粒子之半徑設為r時以母粒子之中心位置為基準之r/3以 上之外側區域,且自母粒子之表面至無機氧化物粒子直徑 以上之内側區域。該樣態可藉由如下方式確認:藉由fib 處理使複合銅粒子之剖面露出,並利用TEM進行觀察後, 利用EDS進行元素分析。另一方面,關於(乙)之無機氧化 物粒子’所謂「一部分露出母粒子之表面的狀態」係指以 無機氧化物粒子之直徑為基準,較好的是55〜90%被包埋 146549.doc 201100184 的狀態。藉由以該程度线度使錢氧化物粒子包埋於母 粒子中,於將複合鋼粒子例如製成㈣而使用之情形時, 於施加⑽步驟時之剪切力時,可發揮出難以使無機^ 物粒子自母粒子脫落之有利效果。又,藉由不使全部無機 氧化物粒子完全包埋於母粒子内,可防止銅之表面完全露 出,而提高耐熱收縮性。 〇 〇 就耐熱收縮性、熱收縮迷度方面而言,複合鋼粒子中之 (甲)之無機氧化物粒子與(乙)之無機氧化物粒子的比率, =重量比表示較好的是(甲):(乙)=1 : 9〜8: 2,尤其好的 是4 : 6〜6 : 4。該比率可藉由如下方法求得。 首先,製備不溶解鋼、可溶解無機氧化物粒子之液體。 於無機氧化物粒子為例如Si〇2之粒子之情形時,可使用濃 為mol/L以上之氫氧化納水溶液。於無機氧化物粒子 為乂2〇3之粒子之情形時,藉由使用濃度為9 m0l/L以上之 2氧化納水溶液,並加熱至帆以上,可使Al2〇3之粒子 /合解。於無機氧化物粒子為Ti〇2之粒子之情形_,可使用 入又為2.7 mol/L以上之氫氟酸水溶液。向該液體中投入複 合銅粒子,使露出該粒子之表面的無機氧化物粒子溶解。 :如相對於液體5GG mL而投人複合銅粒子2g 無機氧化 粒子之溶解例如係於溫度25〜3〇t下進行約⑼分鐘(其中 A1 办粒子除外藉由 lcp(inductively_c(>upled pi_,感 ,藕合電衆)測定溶解於液體中之無機氧化物粒子的量, 猎此求出S出複合銅粒子之表面的無機氧化物粒子之量。 ''、而自液體中分離複合銅粒子,將其投入可溶解銅之液 146549.doc 201100184 體(例如硝等礦酸之水溶液)而使銅完全溶解。繼而向該 液體中添加可溶解無機氧化物粒子之劑(例如無機氧化物 粒子亡Sl°2之情形時’為氫氟酸水溶液)’使無機氧化物 粒子广全溶解。將如此而獲得线體作為敎對象進行 ICP刀析’而求出完全包埋於母粒子中之無機氧化物 的量。 由本發明者等人之研究結果可判明:複合銅粒子之執收 縮f絲溫度的控制係由無機氧化物粒子之大小所決定。詳 細而言,粒徑較大之無機氧化物粒子與粒徑較小者相比, 表面晶格能較大,因此不易發生融著。並且,無機氧化物 拉子自+身之融著溫度越高,母粒子之融著溫度越提高。因 此,藉由控制無機氧化物粒子之粒徑,可控制複合銅粒子 之熱收縮開始溫度。就該觀點而言,無機氧化物粒子之一 -人粒子之平均粒徑宜設為5〜5G nm,較好的是設為1〇〜 。上述平均粒徑可利用㈣或粒度分布測定器而求出。 無機氡化物粒子之粒徑為上述情形時,在與母粒子之 徑之相對關係中,無機氧化物粒子之粒徑較好的是母粒子 〜細’尤其好的是1/2(Μ/ι⑼即使益 ::物粒子與母粒子相tb較小,亦有助於控制複合銅粒 收縮性。與此相關’母粒子之—次粒子之平均粒徑 且-為0.2〜10 μιη,較好的是設為〇 3〜5 _。若母 平^徑未滿0.2 _,則母粒子之大小與無機氧化物粒子 ^^過於接近,而導致產生複合銅粒子之導電性降低等 不良情况。另一方面’於母粒子之平均粒徑超過〜之 146549.doc 201100184 情形時,母粒子自身夕植 之燒結溫度會提高,因此變得無需使 用無機氧化物粒子。該平均粒徑可與無機氧化物粒子之一 次粒子之平均粒徑的測定法同樣地進行測定。 • 上述微粒之無機氧化物粒子可藉較可水解之無機化合 ㈣解或聚縮合來製造無機氧化物溶膠而獲得。例如鄉 得叫之溶膠之情形時,可採用如下方法:以水_^ 料並=酸之中和法或者離子交換法;藉由四氯化石夕之熱 Ο A解獲得Sl〇2溶膠之方法;或曰本專利特開平6-316407號 公報中所記載之方法。於獲得Al2〇3之溶膠之情形時,可 採用如下方法:藉由於無機酸或有機酸等-般之酸之存在 下使金屬紹直接與水反應來進行製造的方法;或日本專利 ㈣平5_24824號公報中所記載之方法。於獲得叫之溶 膠之情形時,可採用如下方法:使鈦鹽水溶液與陰離子交 換體接觸之方法;添加氨水等驗來進行中和之方法;添加 奴酸錢等錢水溶液之方法;或日本專利特開平8摘⑽號 〇 純中所記载之方法。於獲得⑽之溶膠之情形時,可採 用如下方法.於惰性氣體環境下於水性介質中使飾鹽與驗 性物質以規定莫耳比進行反應而生成氫氧化飾懸浮液後, '於大氣麼下於10〜95。(:下吹入含氧氣體使其氧化的方法; 或曰本專利特開2002_326812號公報中所記載之方法。於 獲得心〇2之溶膠之情形時,可採用如下方法··向含有水溶 性鍅鹽之水溶液中添加鹼而獲得氳氧化锆,再使該氫氧化 錯水解之方法;於幾酸或經基缓酸之存在下,向錯化合物 水溶液中添加鹼水溶液而獲得氫氧化錘凝膠分散液,對該 I46549.doc 201100184 '刀放液進订超m及利用離子交換樹脂進行脫離子 而進行水熱處理的方法;或日本專利㈣2_·29_6號 公報中所記载之方法。 已判明複合銅粒子之熱收縮速度之控制係由複合銅粒子 中所含之無機氧化物粒子的量所決定。如上文所述,一般 銅粒子於開始融著後,熱收縮速度會瞬間提高,由於藉由 使其含有適量之無機氧化物粒子可抑制熱收縮速度之增 加,故而可使收縮緩慢地進行。就該觀點而言,無機氧化 物粒子之含量相對於複合銅粒子整體,宜為〇1〜5重量%, 較=的是0.2〜3重量%。若無機氧化物粒子之含量未滿 里%貝!於母粒子之表面上,變得無法利用無機氧化物 粒子完全覆蓋作為易燒結部位之階梯或扭結部。相反,若 無機氧化物粒子之暑相播^舌旦〇/ 丁及3里超過5重置%,則作為絕緣體之盔 機氧化物的量會增加’導致複合鋼粒子之導電性降低,因 此變得不適合用於電子材料用途。複合銅粒子中之無機氧 化物粒子的含量可藉由使複合銅粒子溶解並利用上文所述 之1CP分析法而求出。再者’若複合銅粒子之燒結瞬間進 行’則燒結體會變得容易產生龜裂,χ,存在容易自基材 上剝離之不良情況。進而,亦存在如下不良情況:燒結溫 度之幅度狹窄、操作性差、同時锻燒基㈣得困難、製造 經費提高。 如上所述’ &了控制複合銅粒子於燒結時之熱收縮,重 要的是露出t玄粒子之表面的無機氧化物粒子、&完全包埋 於複合銅粒子之表面附近的無機氧化物粒子。反而言之, U6549.doc -10- 201100184 即使母粒子之令心區域存在盔 廿牡熟機礼化物粒子,亦Μ 複 合銅粒子之耐熱收縮性之提名。稷 网就该觀點而言,較好的是 母粒子之中心區域管蜇{_ π I , ^ 貫質上不存在無機氧化物粒h此處所 明「辛心區域」大致為自母趣 邛粒子之中心至半徑1/3以内的 區域。 另-方面’複合鋼粒子之表面較好的是由銅與無機氧化 物粒子所構成。換而言之,複合銅粒子之表面較好的是並 ΟG 添加 In the reduction of copper, 'incorporating inorganic oxide particles other than those present in the initial aqueous liquid, or adjusting the enthalpy value of the liquid in the reduction of copper to a range of 7.5 to 12 [Embodiment] Hereinafter, based on the present invention The preferred embodiment will be described. The composite copper particles of the present invention are composed of a composite comprising copper mother particles and inorganic oxide particles. The inorganic oxide particles are smaller in particle diameter than the mother particles. The inorganic oxide particles contain a plurality of particles in the mother particles. The presence of the inorganic oxide particles in the composite copper particles has a characteristic. Specifically, the inorganic oxide particles include at least two types: (a) completely embedded in the vicinity of the surface of the mother particle, and (b) embedded in the mother particle in a state in which a part of the surface of the mother particle is exposed. When the inorganic oxide particles are present at such a position, for example, when a conductor containing a slurry containing composite copper particles or the like is sintered, it is possible to control the heat shrinkage start temperature and the heat shrinkage speed of the composite copper particles. The reason is as follows. By the presence of the inorganic oxide particles of (B), the composite copper particles are prevented from being fused to each other during sintering, and the heat shrinkage starting temperature is increased. About heat 146549.doc 201100184 ίShrinking speed 'passing f After the beginning of copper melting, the heat shrinking speed will instantly pick up the door. In the present invention, the presence of (曱) inorganic oxide particles will cause the furnace knot to shrink. The quasi-γ A z„ 70 ^ τ is again hindered, thereby suppressing the heat shrinkage rate. Based on the composite copper particles according to the present invention such as X, the heat shrinkage can be easily controlled at the time of sintering. In the technique 1 described in the recognition, since the state of si〇2 exists only on the surface of the steel particles, the heat shrinkage is not inhibited after the start of the fusion, and thus the heat shrinkage is instantaneously performed. This phenomenon is used for the electrode. When it is formed, it is a cause of cracking or peeling. The technique described in Patent Document 3 is similar to Patent Documents 1 and 2, in which heat shrinkage is instantaneously started after melting. If the particles are not crystallized by high heat treatment, sufficient heat shrinkage resistance may not be obtained. The inorganic oxide particles in the composite copper particles, as described above, include (曱) fully embedded in the mother particles. At least two types of the inorganic oxide particles of (a) are embedded in the surface of the parent particle in the vicinity of (b) a part of the surface of the mother particle is exposed, and the inorganic oxide particle of (a) is completely embedded in the vicinity of the surface of the mother particle. "Inorganic oxide particles are mainly present in the following regions, that is, when the radius of the mother particles is r, the outer region of r/3 or more based on the center position of the mother particles, and from the surface of the parent particles to the inorganic The inner region above the oxide particle diameter. This state can be confirmed by exposing the cross section of the composite copper particles by fib treatment, and observing it by TEM, and performing elemental analysis using EDS. On the other hand, the inorganic oxide particles of (B) "the state in which a part of the surface of the mother particles is exposed" means that the diameter of the inorganic oxide particles is based on the diameter of the inorganic oxide particles, preferably 55 to 90%. The status of doc 201100184. By embedding the money oxide particles in the mother particles to such a degree, when the composite steel particles are used, for example, as (4), it is difficult to apply the shear force at the time of the step (10). The beneficial effect of the inorganic particles falling off from the parent particles. Further, by not completely embedding all of the inorganic oxide particles in the mother particles, the surface of the copper can be prevented from being completely exposed, and the heat shrinkage resistance can be improved. 〇〇 In terms of heat shrinkage and heat shrinkage, the ratio of the inorganic oxide particles of (a) to the inorganic oxide particles of (b) in the composite steel particles, the weight ratio is preferably (A) ): (B) = 1: 9~8: 2, especially good 4: 6~6: 4. This ratio can be obtained by the following method. First, a liquid which does not dissolve steel and dissolves inorganic oxide particles is prepared. In the case where the inorganic oxide particles are particles of, for example, Si 2 , an aqueous solution of sodium hydroxide having a concentration of mol/L or more can be used. In the case where the inorganic oxide particles are particles of 乂2〇3, the particles of Al2〇3 can be recombined by using an aqueous solution of 2 nm in a concentration of 9 mOl/L or more and heating to a sail or more. In the case where the inorganic oxide particles are particles of Ti 2 , a hydrofluoric acid aqueous solution of 2.7 mol/L or more can be used. The composite copper particles are introduced into the liquid to dissolve the inorganic oxide particles exposing the surface of the particles. : Injecting composite copper particles with respect to liquid 5GG mL 2g The dissolution of inorganic oxidized particles is carried out, for example, at a temperature of 25 to 3 〇t for about (9) minutes (except for A1 particles except for lcp (inductively_c(>upled pi_, The amount of the inorganic oxide particles dissolved in the liquid is measured, and the amount of the inorganic oxide particles on the surface of the composite copper particles is determined. '', and the composite copper particles are separated from the liquid. And put it into the soluble copper solution 146549.doc 201100184 body (for example, an aqueous solution of mineral acid such as nitrate) to completely dissolve the copper. Then add an agent capable of dissolving the inorganic oxide particles to the liquid (for example, inorganic oxide particles are dead) In the case of Sl° 2, 'is a hydrofluoric acid aqueous solution', the inorganic oxide particles are widely dissolved. Thus, the linear body is obtained as a target for ICP analysis, and the inorganic oxidation completely embedded in the mother particles is obtained. From the results of the study by the inventors of the present invention, it has been found that the control of the shrinkage of the composite copper particles is determined by the size of the inorganic oxide particles. In detail, the inorganic oxide having a larger particle diameter The particle size of the particles is larger than that of the smaller particle size, so that the melting is less likely to occur, and the higher the melting temperature of the inorganic oxide puller from the body, the higher the melting temperature of the mother particle. Therefore, by controlling the particle diameter of the inorganic oxide particles, the heat shrinkage initiation temperature of the composite copper particles can be controlled. From this point of view, the average particle diameter of one of the inorganic oxide particles-human particles is preferably set to 5 to 5 G nm. Preferably, the average particle diameter is determined by (4) or a particle size distribution measuring device. When the particle size of the inorganic telluride particles is as described above, in the relative relationship with the diameter of the parent particles, The particle size of the inorganic oxide particles is preferably such that the mother particles are finer than 1/2 (Μ/ι(9), even if the material particles and the mother particles are smaller in tb, which also helps to control the shrinkage of the composite copper particles. Corresponding to this, the average particle diameter of the parent particle - the secondary particle is -0.2 to 10 μιη, preferably 〇3 to 5 _. If the mother is less than 0.2 _, the mother particle The size is too close to the inorganic oxide particles ^^, resulting in the conductive of the composite copper particles On the other hand, when the average particle size of the mother particles exceeds 146549.doc 201100184, the sintering temperature of the mother particles increases, so it becomes unnecessary to use inorganic oxide particles. The diameter can be measured in the same manner as the method for measuring the average particle diameter of the primary particles of the inorganic oxide particles. • The inorganic oxide particles of the above-mentioned fine particles can be produced by the hydrolyzable inorganic compound (tetra) solution or polycondensation to produce an inorganic oxide sol. For example, in the case of a sol that is called a township, the following method may be employed: water-based and acid-neutralization or ion exchange; and S1〇2 sol is obtained by the solution of tetrachlorite The method described in Japanese Laid-Open Patent Publication No. Hei 6-316407. In the case of obtaining a sol of Al2〇3, the following method may be employed: a method of producing a metal directly by reacting with water in the presence of a general acid such as an inorganic acid or an organic acid; or Japanese Patent (4) Ping 5_24824 The method described in the bulletin. In the case of obtaining a sol, the following method may be employed: a method of contacting an aqueous solution of a titanium salt with an anion exchanger; a method of neutralizing by adding an ammonia water; a method of adding an aqueous solution of niacin or the like; or a Japanese patent The method described in JP-A No. 8 (10). In the case of obtaining the sol of (10), the following method can be employed: after the reaction salt is reacted with the test substance in a predetermined molar ratio in an aqueous medium to form a hydroxide suspension, Under 10~95. (: A method of oxidizing an oxygen-containing gas to be oxidized; or a method described in JP-A-2002-326812. In the case of obtaining a sol of palpitations 2, the following method can be employed. Adding a base to an aqueous solution of a cerium salt to obtain cerium zirconium oxide, and then hydrolyzing the oxidized water; adding an aqueous alkali solution to the aqueous solution of the wrong compound in the presence of a few acids or a base acid to obtain a oxidized hammer gel The dispersion liquid, the method of hydrothermal treatment of the I46549.doc 201100184 'knife discharge liquid super m and deionization by ion exchange resin; or the method described in Japanese Patent No. 2_.29_6. The control of the heat shrinkage rate of the copper particles is determined by the amount of inorganic oxide particles contained in the composite copper particles. As described above, generally, the heat shrinkage rate of the copper particles immediately increases after the start of melting, due to By including an appropriate amount of the inorganic oxide particles, the increase in the heat shrinkage rate can be suppressed, so that the shrinkage can be progressed slowly. From this point of view, the content of the inorganic oxide particles is relatively high. The composite copper particles as a whole are preferably 〜1 to 5% by weight, and more than 0.2 to 3% by weight. If the content of the inorganic oxide particles is less than 5%, the inorganic particles are not available on the surface of the mother particles. The oxide particles completely cover the step or the kinking portion as the easily sintered portion. Conversely, if the inorganic oxide particles are transferred to the heat of the tongue and the cerium is more than 5%, the helmet oxide is used as the insulator. The amount of increase will cause the conductivity of the composite steel particles to decrease, and thus become unsuitable for use in electronic materials. The content of inorganic oxide particles in the composite copper particles can be obtained by dissolving the composite copper particles and utilizing the 1CP described above. In addition, when the sintering of the composite copper particles is instantaneously performed, the sintered body is likely to be cracked, and there is a problem that it is easily peeled off from the substrate. Further, there is a problem that sintering The temperature is narrow, the operability is poor, and the calcining base (4) is difficult, and the manufacturing cost is increased. As described above, the thermal shrinkage of the composite copper particles during sintering is important. The inorganic oxide particles on the surface of the t-shaped particles, & inorganic oxide particles completely embedded in the vicinity of the surface of the composite copper particles. In other words, U6549.doc -10- 201100184 even if the core region of the mother particles exists in the helmet The nourishment of the ceremonial particles and the nomination of the heat-resistant shrinkage of the composite copper particles. For this point of view, it is better that the central region of the parent particle is 蜇{_ π I , ^ there is no inorganic Oxide grain h Here, the "heart area" is roughly the area from the center of the mother particle to within 1/3 of the radius. The surface of the composite steel particle is preferably composed of copper and inorganic oxide particles. In other words, the surface of the composite copper particles is preferably Ο

非僅由無機氧化物粒子所構成。藉由該構成,可切實地進 行複合銅粒子彼此之間的電性接觸,從而可抑制燒結體之 導電性之降低。 作為無機氧化物粒子,可使用金屬元素或非金屬元素之 氧化物。無機氧化物粒子較好的是於例如pH值主要為 7.5〜12之驗性水溶液中會在表面生成⑽基者(其原因於下 文進行說^換而言之’較好的是至少一部分可溶於鹼 性水溶液中,且藉由其溶解可於表面產生經基者。作為無 機氧化物粒子之較佳具體例,金屬元素之氧化物之粒子可 列舉:氧化鋁(Al2〇3)、氧化鈦(Ti〇2)、氧化鈽(Ce〇2)、氧 化鍅(Zr02)等;非金屬元素之氧化物之粒子可列舉氧化矽 (Si02)等。 無機氧化物粒子之形狀於本發明中並無特別限制。例如 可使用球狀、多面體狀、針狀、紡錘狀、扁平狀、金平糖 狀等形狀之無機氧化物粒子。一般而言,藉由使用具有等 向性之形狀的無機氡化物粒子、例如球狀無機氧化物粒 子,可獲得令人滿意之耐熱收縮性。 146549.doc -11· 201100184 另:方面’母粒子之形狀於本發明中亦無特別限制,與 無機氧化物粒子同樣地可使用例如球狀、多面體狀、針 狀、紡錘狀、扁平狀、金平糖狀等形狀者。一般而士,、 好的是使用球狀或扁平狀者。母粒子係包含銅者。或者, 母粒子亦可為銅合金。 於複合銅粒子中,母粒子與無機氧化物粒子相比充分 大,因此複合銅粒子之形狀實質上與母粒子之形狀相同: 又’關於粒徑,複合銅粒子之粒徑亦實質上與母粒子 徑相同。 # 其次,對複合銅粒子之較佳製造方法進行說明。複合鋼 粒子可藉由如下方法適宜地製造:該方法具有向含有:離 子或者含有銅之離子種、銅氧化物或銅氯氧化物及無機氧 化物粒子之水溶液中添加還原劑來進行銅之還原的步驟。 即,可藉由銅之濕式還原而適宜地製造。 作為濕式還原所使狀液體,例如可制:硫酸鋼、氣 化銅、乙酸銅、硝酸銅等水溶性銅鹽之水溶液等。或者可 使用氧化銅等銅氧化物、或氫氧化銅(Cu(〇h)2)等 化物之水性漿料。於為水溶液及水性衆料之任一者之情步 時’液中所含之銅的濃度均較好的是G」〜5 mGi/L,尤= 的是1〜3 mol/L。將該液體與無機氧化物粒子混合。就= 易使無機氧化物粒子均勻地分布於母粒子内之方面而言令 尤其好的是以溶膠狀態混合無機氧化物粒子。 於如此而獲得之混合液卜無機氧化物粒子之含量相對 於銅1 g’較好的是卜⑽mg,尤其好的是卜5〇叫。向該 146549.doc 201100184 T合液中添加還原劑進行銅之還原。作為還原劑,例如可 糖等。還原d W、四棚酸鉀、二甲胺㈣、還原 .控制母粒子之粒徑及形狀’上述混合液中亦可添加 f職料之㈣。作為如此之㈣,例如可㈣水溶性 破系化合物等。 氧ΙίΓ方法係於銅之還原前使反應體系中預先存在無機 〇 物粒子’並於無機氧化物之存在下進行銅之還㈣ 由採用如此之條件,可使無機氧化物粒子特異性吸附在^ 之母粒子之成長過程中有時會產生的扭結(表面出現角之 部分)或階梯(表面之單原子層形成台階的部分)等富於反應 性之部位。其結果為,母粒子中之不穩定部位被無機氧化 物粒子選擇性地保護’而使燒結時之熱收縮受到控制。 《其是作為無機氧化物粒子,若使用於驗性水溶液中表 面會生成ΟΗ基者,則無機氧化物粒子與吸附在母粒子之 〇 =的〇Η基藉由水解反應而鍵結,使無機氧化物粒子變 得容易進入母粒子内部,故而較好。 藉由還原所生成之母粒子的粒徑(該粒徑實質上等於複 U銅粒子之粒徑)及形狀,例如可藉由適當調節上述混合 ⑨之ΡΗ值或溫度、還原劑之添加速度或濃度等而容易地二 行控制。 於本製造方法中,作為使無機氧化物粒子完全包埋於包 含銅之母粒子之表面附近,且使無機氧化物粒子於一部分 露出之狀態下包埋於母粒子之表面的方法,較好的是採: 146549.doc -13- 201100184 如下操作⑴或⑺。⑴及⑺之操作可分別 將兩者組合。 j早獨進仃,亦可 操作(1) 於無機氧化物粒子之共存下, fCu2 + v» ^ 添加還原劑將銅離子 原而生成CU2〇後’再次添加還原劑將該CM進一 而生成Cu’此時於最初水性液體中所存在者以外另 膠)y無機氧化物粒子(較好的是無機氧化物粒子之溶It is not composed only of inorganic oxide particles. According to this configuration, the electrical contact between the composite copper particles can be reliably performed, and the decrease in the electrical conductivity of the sintered body can be suppressed. As the inorganic oxide particles, an oxide of a metal element or a non-metal element can be used. The inorganic oxide particles are preferably those which form a (10) base on the surface in an aqueous test solution having a pH of mainly 7.5 to 12 (the reason is that it is preferably at least a part of the soluble in the following description) In the alkaline aqueous solution, and by the dissolution thereof, a base can be generated on the surface. As a preferred specific example of the inorganic oxide particles, the particles of the oxide of the metal element may be exemplified by alumina (Al 2 〇 3 ), titanium oxide. (Ti〇2), cerium oxide (Ce〇2), cerium oxide (ZrO 2 ), etc.; the particles of the oxide of the non-metal element include cerium oxide (SiO 2 ), etc. The shape of the inorganic oxide particles is not in the present invention. In particular, inorganic oxide particles having a spherical shape, a polyhedral shape, a needle shape, a spindle shape, a flat shape, or a ginkgoose shape can be used. In general, by using an inorganic telluride particle having an isotropic shape, For example, the spherical inorganic oxide particles can obtain satisfactory heat shrinkage resistance. 146549.doc -11· 201100184 Further, the shape of the mother particles is not particularly limited in the present invention, and can be similar to the inorganic oxide particles. For example, a spherical shape, a polyhedral shape, a needle shape, a spindle shape, a flat shape, a gold flat sugar shape, etc., generally, a spherical or flat shape is used, and the mother particle contains copper. Alternatively, the mother particle It can also be a copper alloy. In the composite copper particles, the mother particles are sufficiently larger than the inorganic oxide particles, so the shape of the composite copper particles is substantially the same as the shape of the mother particles: The diameter is also substantially the same as the diameter of the parent particle. # Next, a description will be given of a preferred method for producing composite copper particles. The composite steel particles can be suitably produced by the following method: the method has an ion species containing: ions or containing copper And a step of adding a reducing agent to the aqueous solution of copper oxide or copper oxychloride and inorganic oxide particles to carry out reduction of copper. That is, it can be suitably produced by wet reduction of copper. The liquid can be, for example, an aqueous solution of a water-soluble copper salt such as sulfuric acid steel, vaporized copper, copper acetate or copper nitrate, or copper oxide such as copper oxide or copper hydroxide (Cu ( h) 2) An aqueous slurry of the equivalent compound. In the case of either aqueous solution or water-based material, the concentration of copper contained in the liquid is preferably G"~5 mGi/L, especially = It is 1 to 3 mol/L. The liquid is mixed with the inorganic oxide particles. It is particularly preferable to mix the inorganic oxides in the sol state in terms of the uniform distribution of the inorganic oxide particles in the mother particles. The content of the inorganic oxide particles obtained in this manner is preferably (10) mg relative to copper 1 g', and particularly preferably is 5 〇. Adding reduction to the 146549.doc 201100184 T mixture The agent is used for reduction of copper. As a reducing agent, for example, sugar can be used, etc. Reduction d W, potassium quaternary acid, dimethylamine (IV), reduction, control of particle size and shape of the mother particles, (4). As such (4), for example, (4) a water-soluble breaking compound or the like can be used. The oxygen oxime method is to pre-exist the inorganic cerium particles in the reaction system before the reduction of copper and to carry out the copper in the presence of the inorganic oxide. (4) By using such conditions, the inorganic oxide particles can be specifically adsorbed in the ^ In the process of the growth of the mother particles, kinks (portions of the surface appearing) or steps (portions where the monoatomic layer of the surface forms a step) are sometimes generated. As a result, the unstable portion in the mother particles is selectively protected by the inorganic oxide particles, and the heat shrinkage at the time of sintering is controlled. "It is used as an inorganic oxide particle. If it is used in the surface of an aqueous solution, a sulfhydryl group is formed, and the inorganic oxide particle and the sulfhydryl group adsorbed on the mother particle are bonded by a hydrolysis reaction to cause inorganic It is preferable that the oxide particles easily enter the inside of the mother particles. By reducing the particle diameter of the mother particle formed (the particle diameter is substantially equal to the particle diameter of the complex U copper particles) and the shape, for example, the enthalpy value or temperature of the above-mentioned mixture 9 or the addition rate of the reducing agent or Concentration and the like are easily controlled by two lines. In the present production method, a method in which the inorganic oxide particles are completely embedded in the vicinity of the surface of the mother particle containing copper and the inorganic oxide particles are partially exposed to the surface of the mother particle is preferably used. Yes: 146549.doc -13- 201100184 Do as follows (1) or (7). The operations of (1) and (7) can be combined separately. j can be operated as early as possible, (1) in the coexistence of inorganic oxide particles, fCu2 + v» ^ Adding a reducing agent to form copper ions to form CU2 〇, then adding a reducing agent to regenerate the CM to form Cu 'At this time, other than the one existing in the aqueous liquid) y inorganic oxide particles (preferably dissolved in inorganic oxide particles)

基於圖1模式性表示之圖像,對藉由操作⑴製造本發明 之複合銅粒子之過程進行說明。再者,於圖^,雖秋I 機氧化物粒子係使用Si〇2,但於使 ·’、' .^ 仏便用其以外之無機氧化物 粒子之情形時,反應亦會同樣地進行。又,以下說明中存 在尚未完全闡明之部分,—部分係本發明者等人之推測。 首先’如圖Ua)所示,於含有銅源(未圖示)之水性液體 中共存Si〇2粒子。於該狀態下添加還原劑後,如圖吵)所 示,銅離子(Cf)被還原而生成Cu2〇粒子。於生成¥粒 子之過程中,液體中所存在之Si〇2粒子進入Cu2〇粒子内。The process of producing the composite copper particles of the present invention by the operation (1) will be described based on the image schematically represented in Fig. 1. Further, in Fig. 2, although Si 2 is used as the oxide particles of the autumn I machine, the reaction proceeds in the same manner when the inorganic oxide particles other than the above are used. Further, in the following description, there is a part which has not been fully elucidated, and a part is speculated by the inventors and the like. First, as shown in Fig. Ua, Si 2 particles are coexisted in an aqueous liquid containing a copper source (not shown). After the addition of the reducing agent in this state, as shown in the figure, copper ions (Cf) are reduced to form Cu2 ruthenium particles. During the generation of the particles, the Si 〇 2 particles present in the liquid enter the Cu 2 〇 particles.

Si〇2粒子亦存在於液體卜又,此時尚未生成^之核粒 子0 其次,於最初體系中所存在者以外另外向體系中添加 Si〇2粒子,繼而再次向體系中添加還原劑。藉由再次添加 還原劑,如圖1(C)所示,Cu2〇粒子會發生溶解而變小,同 時於體系内生成Cu之核粒子。Cu之核粒子由於結晶密度 較问,故而與CuW粒子不同,Si〇2粒子不會進入Cu之核粒 146549.doc • 14- 201100184 子内。於還原劑之作用下進行Cue粒子之還原後,如圖 1(d)所示,ChO粒子進一步溶解,其粒徑減小,同時以之 核粒子成長。此時,若ChO粒子之粒徑減小,則其比表面 . 積增大,溶解速度亦隨之提高。其結果為:由於體系内所 溶解之Cu離子的量增加,故而(^之核粒子之成長速度亦 增加。由於Cu之核粒子之成長速度增加,故而Cu之核粒 子之結晶化密度降低,Si〇2粒子開始進入cu粒子内。 ❹ 若Si〇2粒子進入Cu粒子内,則如圖1(e)所示,液體中之-The Si〇2 particles are also present in the liquid, and no nuclear particles have been formed at this time. Next, Si〇2 particles are additionally added to the system in addition to those present in the initial system, and then a reducing agent is added to the system again. By adding a reducing agent again, as shown in Fig. 1(C), Cu2 ruthenium particles are dissolved and become small, and Cu core particles are formed in the system. Since the nucleus of Cu is relatively different in crystal density, unlike the CuW particles, the Si 〇 2 particles do not enter the nucleus of Cu 146549.doc • 14- 201100184. After the reduction of the Cue particles by the action of the reducing agent, as shown in Fig. 1(d), the ChO particles are further dissolved, the particle diameter thereof is decreased, and the core particles are grown. At this time, if the particle diameter of the ChO particles is decreased, the specific surface area is increased, and the dissolution rate is also increased. As a result, since the amount of Cu ions dissolved in the system increases, the growth rate of the core particles increases. Since the growth rate of the core particles of Cu increases, the crystal density of the core particles of Cu decreases. 〇2 particles begin to enter the cu particles. ❹ If the Si〇2 particles enter the Cu particles, as shown in Figure 1(e), in the liquid -

Si〇2粒子的量逐漸減少。但是與此同時,Cu2〇粒子之溶解 亦在進行’因此溶解之進行使Si〇2粒子補充至液體中。由 此月確,進入Cu粒子之Si〇2粒子於進入之初期階段主要為 液體中所存在之Si〇2粒子,此Si〇2粒子主要完全包埋於複 合銅粒子中。又,隨著Si〇2粒子不斷進入,自Cu20粒子釋 放之Si〇2粒子開始進入Cu粒子,此粒子於複合銅粒子中以 分露出之狀態包埋於Cu粒子中。於進入之初期階段, Q 液體中所存在之以〇2粒子主要為第2次添加之Si02粒子。 另一方面,自ChO粒子釋放之Si〇2粒子主要為於製造初期 添加至液體中之Si〇2粒子。因此,藉由使於製造最初添加 •至液體中之Si〇2粒子的量、與第2此添加之Si〇2粒子的量 達到平衡,可控制完全包埋之Si〇2粒子與一部分露出之The amount of Si〇2 particles is gradually reduced. At the same time, however, the dissolution of the Cu2 ruthenium particles is also carried out, so that the dissolution is carried out to replenish the Si 〇 2 particles into the liquid. From this, it is confirmed that the Si 〇 2 particles entering the Cu particles are mainly Si 〇 2 particles existing in the liquid at the initial stage of entry, and the Si 〇 2 particles are mainly completely embedded in the composite copper particles. Further, as the Si 〇 2 particles continuously enter, the Si 〇 2 particles released from the Cu 20 particles start to enter the Cu particles, and the particles are embedded in the Cu particles in a state in which the composite copper particles are partially exposed. At the initial stage of entry, the 〇2 particles present in the Q liquid are mainly the SiO 2 particles added for the second time. On the other hand, the Si〇2 particles released from the ChO particles are mainly Si〇2 particles added to the liquid at the initial stage of production. Therefore, by completely balancing the amount of Si〇2 particles initially added to the liquid and the amount of the Si〇2 particles added to the second, the fully embedded Si〇2 particles can be controlled to be partially exposed.

Si〇2粒子的量。如此,如圖丨(£)所示,可獲得目標之複合 銅粒子。 操作(2) 於無機氧化物粒子之共存下,將銅離子(Cu2+)之還原中 146549.doc -15- 201100184 之液體的pH值§周卽為驗性。具體而言’較好的是將pH值 調郎為7.5〜12’更好的是將pH值調節為8〜11。並且,於將 液體之p Η值调郎至该範圍後’添加還原劑。於還原反應 中,:¾•反應體系之pH值開始降低,則進一步添加驗性物質 而將pH值維持在上述範圍内。藉由使反應體系之pH值維 持在上述範圍内,於藉由還原所生成之銅粒子之核的表面 會存在OH基,此〇H基會吸引無機氧化物粒子。銅之粒子 的核係於吸引無機氧化物粒子之情況下進行粒成長,因此 無機氧化物粒子會進入銅之母粒子内。當然,母粒子之表 ◎ 面亦會吸附無機氧化物粒子。此時,體系之?11值越高, OH基之存在數量越多,因此無機氧化物粒子容易進入母 粒子内部。即,藉由控制?11值,可控制所進入之無機氧化 物粒子的量。 基於圖2模式性表示之圖像,對藉由操作(2)製造本發明 之複合銅粒子的過程進行說明。再者,於圖2中,雖然無 機氧化物粒子係使用Si〇2,但於使用其以外之無機氧化物 粒子之情形時,反應亦會同樣地進行。又,以下說明存在❹ 尚未元全闡明之部分’一部分為本發明者等人之推測。 首先,於含有銅源(未圖示)之水性液體中使8丨〇2粒子共 存:於該狀態下添加還原劑後,如圖2⑷所示,銅離子‘ (u )被還原而生成CU2〇粒子。於以2〇粒子之生成過程 中液體中所存在之Si〇2粒子進入CU2〇粒子内。叫粒子 亦:在於液體中…此時尚未生成Cu之核粒子。 藉由追加添加還原劑使還原繼續進行後,如圖2(b)所 146549.doc •16- 201100184 不暫日寸生成之Cu2〇粒子溶解而變小,同時於體系内生成 cu之核粒子。^之核粒子由於結晶密度較高,因此與 wo粒子不同,si〇2粒子不會進入Cu之核粒子内。cu2〇 粒子之還原進一步進行後,如圖2(c)所示,Cu2〇粒子進一 步溶解,其粒徑減小,同時Cu之核粒子成長。此時,若 ChO粒子之粒徑減小,則其比表面積會增大,溶解速度亦 隨之提高。其結果為:由於液體中所溶解之Cu+離子的量 增加,故而Cu之核粒子之成長速度亦增加。由於Cu之核 粒子之成長速度增加,使Cui核粒子之結晶化密度降低, Si〇2粒子開始進入Cu粒子内。 本發明者等人認為,使Si〇2粒子進入Cu粒子内之機制如 下。即,如圖2(d)所示’處於成長過程之以粒子於其表面 具有OH基。另一方面,由於在液體中為鹼性,故而Si〇2 粒子之表面亦存在OH基。因此’ Cu粒子表面之oh基、與 Si〇2粒子表面之〇H基發生水解,使兩粒子相互吸引。藉 此’使Si〇2粒子進入Cu粒子内。因此,si〇2粒子表面之 OH基的數量越多,Si〇2粒子越容易進入Cu粒子内。 隨著Cu粒子之成長’液體之pH值逐漸降低,如圖2(e)所 示’藉由添加驗性物質使液體之pH值維持在7_5〜12之範 圍’藉此可維持Si〇2粒子表面之OH基的數量。藉此,可 防止Si〇2粒子之進入程度的降低。即,藉由調節液體之pH 值,可控制SiCh粒子之進入程度,從而可控制完全包埋之 Si〇2粒子與一部露出之Si〇2粒子的量。如此,如圖2(f)所 示可獲得目標之複合銅粒子。 146549.doc -17- 201100184 藉由以上之各操作,可精密地控制完全 物粒子與-部分露出之無機氧化物粒子的量,因 精密地控制所獲得之複合銅粒子之燒結行為的優點Γ又, 於如此而獲得之複合銅粒子中,—部分露出其表面之益機 氧化物粒子會藉由固著效果等而切實地保持在母粒子上, 因此即使料複合練子絲外力,請Μ起無機氧化 物粒子之脫洛。因此,即使對所獲得之複合銅粒子施加例 如壓力而將其加工成扁平狀’亦可防止加工中無機氧化物 粒子之脫落。 所獲得之複合銅粒子例如可將其與玻㈣末及有機媒劑 混合而料導«。該導電㈣如可詩製作制陶甍電 容器等積層陶£電子零件之外部電極。尤其可用於形成與 以錄為主成分之内部電極電性連接的外部電極。於外部電 極之形成中,係於由陶瓷構成之積層陶瓷電子零件本體之 外表面上塗佈導電膠後’藉由高溫下之熱處理(例如 400〜lOOOt:)進行燒結。此時,若使用含有本發明之複合 銅粒子之導電膠,則可控制燒結時塗佈體之熱收縮,因此 可有效地防止因燒結而產生之燒結體自零件本體上剝離, 或於燒結體上產生龜裂。 [實施例] 以下,藉由實施例更加詳細地說明本發明。然而本發明 之範圍並不限定於相關實施例。若無特別規定,則「%」 係指「重量%」。 [實施例1] 146549.doc -18- 201100184 首先,將3_6 Μ之硫酸銅水溶液9 L加熱保持在50°c,向 該硫酸銅水溶液中添加Si02溶膠(溶膠濃度20%、平均粒徑 5 nm)50 g。其後,逐次添加濃度25%之氨水溶液13〇〇 ml、與濃度25°/。之氫氧化鈉水溶液425〇 g。在此,連續添 加一水合肼(肼系還原劑)450 g與作為pH值調節劑之氨水溶 液(濃度25%) 591 m卜一邊將液體之pH值維持在丨丨一邊獲 得氧化亞銅漿料(第1還原處理)。接著,為使還原反應完全 進行’進而繼續攪拌30分鐘。 Ο ❹ 向該氧化亞銅漿料中添加一水合肼(肼系還原劑)3 〇〇 g。 進而攪拌60分鐘,使還原反應完全進行,而使目標之複合 銅粒子還原析出(第2還原處理^第二次添加一水合肼(肼 系還原劑)後,體系之pH值緩慢降低。此時,為了使“… 溶膠穩定地進入,添加5%之氫氧化鈉水溶液而將體系之 pH值調節為11。 過濾清洗(此時添加癸酸作為表面處理劑)所獲得之複合 銅粒子並將其回收。其後,進行㈣、5小時之加熱乾 燥’進而實施磨碎處理。所獲得之複合銅粒子之平均粒徑 為0.3㈣,其中含有0.5%之叫粒子。藉由上述方法調: Si02粒子之存在部位,結果確認存在有完全包埋於母粒子 之表面附近者、與於-部分露出母粒子之表面之狀態下包 埋於母粒子中者。又,母粒子之中 域不存在Si02粒 子。藉由上述方法測定完全包埋於 • 々、可桠千之表面附近之The amount of Si〇2 particles. Thus, as shown in Fig. £ (£), the target composite copper particles can be obtained. Operation (2) Under the coexistence of inorganic oxide particles, the pH value of the liquid of 146549.doc -15- 201100184 in the reduction of copper ions (Cu2+) is checked. Specifically, it is preferable to adjust the pH to 7.5 to 12', and it is more preferable to adjust the pH to 8 to 11. Further, the reducing agent is added after the pH of the liquid is adjusted to the range. In the reduction reaction, the pH of the reaction system starts to decrease, and the test substance is further added to maintain the pH within the above range. By maintaining the pH of the reaction system within the above range, an OH group is present on the surface of the core of the copper particles formed by the reduction, and the 〇H group attracts the inorganic oxide particles. The nucleus of the copper particles undergoes grain growth while attracting the inorganic oxide particles, so that the inorganic oxide particles enter the mother particles of copper. Of course, the surface of the mother particle ◎ will also adsorb inorganic oxide particles. At this time, the system? The higher the value of 11 is, the more the OH group is present, so that the inorganic oxide particles easily enter the interior of the mother particle. That is, by control? A value of 11 controls the amount of inorganic oxide particles that are introduced. The process of producing the composite copper particles of the present invention by the operation (2) will be described based on the image schematically represented in Fig. 2. Further, in Fig. 2, Si 2 is used as the inorganic oxide particles, but in the case of using inorganic oxide particles other than the above, the reaction proceeds in the same manner. In addition, the following description of the part that has not been fully explained is a part of the speculation of the inventors and the like. First, 8 丨〇 2 particles are coexisted in an aqueous liquid containing a copper source (not shown): After the reducing agent is added in this state, as shown in Fig. 2 (4), the copper ion ' (u ) is reduced to generate CU2 〇 particle. The Si〇2 particles present in the liquid during the formation of the 2〇 particles enter the CU2〇 particles. It is called a particle: it is in a liquid... At this time, no nuclear particles of Cu have been formed. After the reduction is continued by the addition of a reducing agent, as shown in Fig. 2(b), 146549.doc •16-201100184, the Cu2 cerium particles which are not formed in the daytime are dissolved and become smaller, and nuclear particles of cu are generated in the system. Since the nucleus particles have a high crystal density, unlike the wo particles, the si 〇 2 particles do not enter the core particles of Cu. After the reduction of the cu2 粒子 particles is further carried out, as shown in Fig. 2(c), the Cu 2 ruthenium particles are further dissolved, the particle diameter thereof is decreased, and the core particles of Cu are grown. At this time, if the particle diameter of the ChO particles is decreased, the specific surface area is increased and the dissolution rate is also increased. As a result, since the amount of Cu+ ions dissolved in the liquid increases, the growth rate of the core particles of Cu also increases. As the growth rate of the Cu nucleus particles increases, the crystallization density of the Cui core particles decreases, and the Si 〇 2 particles begin to enter the Cu particles. The inventors of the present invention considered that the mechanism for causing Si 2 particles to enter the Cu particles is as follows. That is, as shown in Fig. 2(d), the particles are in a growth process in which the particles have an OH group on the surface thereof. On the other hand, since it is alkaline in the liquid, OH groups are also present on the surface of the Si 2 particles. Therefore, the oh group on the surface of the Cu particles and the 〇H group on the surface of the Si 2 particles are hydrolyzed to attract the two particles to each other. By this, the Si 〇 2 particles are allowed to enter the Cu particles. Therefore, the more the number of OH groups on the surface of the si 〇 2 particles, the easier the Si 〇 2 particles enter the Cu particles. As the growth of Cu particles, the pH value of the liquid gradually decreases, as shown in Fig. 2(e), the pH of the liquid is maintained in the range of 7_5 to 12 by adding an inert substance, thereby maintaining the Si〇2 particle. The number of OH groups on the surface. Thereby, the degree of entry of the Si 〇 2 particles can be prevented from being lowered. That is, by adjusting the pH of the liquid, the degree of entry of the SiCh particles can be controlled, and the amount of the completely embedded Si 2 particles and one of the exposed Si 2 particles can be controlled. Thus, the target composite copper particles can be obtained as shown in Fig. 2(f). 146549.doc -17- 201100184 By the above operations, the amount of the complete particles and the partially exposed inorganic oxide particles can be precisely controlled, and the advantages of the sintering behavior of the obtained composite copper particles are precisely controlled. In the composite copper particles obtained in this way, the pro-ceramic oxide particles partially exposed on the surface thereof are reliably held on the mother particles by the anchoring effect or the like, so even if the composite is to be mechanically stretched, please pick up De-alloying of inorganic oxide particles. Therefore, even if the composite copper particles obtained are subjected to, for example, pressure, they are processed into a flat shape, and the fall of the inorganic oxide particles during processing can be prevented. The composite copper particles obtained can be mixed, for example, with a glass (tetra) end and an organic vehicle. The conductive (4) is an external electrode of a laminated ceramic electronic component such as a ceramic pot. In particular, it can be used to form an external electrode that is electrically connected to an internal electrode that is recorded as a main component. In the formation of the external electrode, the conductive paste is applied to the outer surface of the laminated ceramic electronic component body made of ceramic, and then sintered by heat treatment at a high temperature (for example, 400 to 1000 t:). In this case, when the conductive paste containing the composite copper particles of the present invention is used, the heat shrinkage of the coated body during sintering can be controlled, so that the sintered body generated by sintering can be effectively prevented from being peeled off from the body of the part, or in the sintered body. Cracks appear on it. [Examples] Hereinafter, the present invention will be described in more detail by way of examples. However, the scope of the invention is not limited to the related embodiments. If there is no special provision, "%" means "% by weight". [Example 1] 146549.doc -18- 201100184 First, 9 L of a copper sulfate aqueous solution of 3_6 Torr was heated at 50 ° C, and a SiO 2 sol was added to the copper sulfate aqueous solution (sol concentration 20%, average particle diameter 5 nm) ) 50 g. Thereafter, 13% of an aqueous ammonia solution having a concentration of 25% was successively added, and the concentration was 25°/. The aqueous sodium hydroxide solution was 425 〇 g. Here, 450 g of hydrazine monohydrate (lanthanide reducing agent) and an aqueous ammonia solution (concentration: 25%) as a pH adjuster were continuously added at 591 m, while maintaining the pH of the liquid at the side of the crucible to obtain a cuprous oxide slurry. (first reduction treatment). Then, in order to complete the reduction reaction, the stirring was continued for further 30 minutes. Ο 添加 To the cuprous oxide slurry, hydrazine monohydrate (lanthanide reducing agent) 3 〇〇 g is added. Further, the mixture was stirred for 60 minutes to completely carry out the reduction reaction, and the target composite copper particles were reduced and precipitated (the second reduction treatment was carried out for the second time, and the pH of the system was gradually lowered after the second addition of the hydrazine monohydrate (lanthanide reducing agent). In order to make "... the sol enters stably, add 5% aqueous sodium hydroxide solution to adjust the pH of the system to 11. The composite copper particles obtained by filtration cleaning (in this case, adding citric acid as a surface treatment agent) After that, it is subjected to (four), heating and drying for 5 hours, and then subjected to grinding treatment. The obtained composite copper particles have an average particle diameter of 0.3 (four), and 0.5% of the particles are contained. The above method is used to adjust: SiO 2 particles As a result, it was confirmed that there was a case where it was completely embedded in the vicinity of the surface of the mother particle, and it was embedded in the mother particle in a state where the surface of the mother particle was partially exposed. Further, there was no SiO 2 particle in the domain of the parent particle. By the above method, it is completely embedded in the vicinity of the surface of the 々 桠 桠 桠

Si02粒子、與處於一部分露出母 卞之表面之狀態的Si02 粒子之重量比,結果為前者:後者=6 : 4。 146549.doc -19- 201100184 [實施例2] 百先’將3.6 M之硫酸鋼水溶液9 L加熱保持在贼,向 該硫酸銅水溶液巾添加叫轉(溶料度鳩、平均粒後 曲)g其後,逐次添加濃度25%氨水溶液13〇〇 ml 與濃度25%之氫氧化鈉水溶液425〇 g。在此,連續添加— 水合肼450 g與作為pH.值調節劑之氨水溶液591 士而獲 得氧化亞銅激料(第1還原處理)。接著,為進行還原反應, 進而繼續攪拌3 0分鐘。 向該氧化亞銅漿料中,在最初液中所存在者以外另外添 加si〇2溶膠(溶膠濃度20%、平均粒徑3〇 nm)25〇 §,其後添 加水α肼300 g。進而授拌6〇分鐘,使還原反應完全進 行’而使目標之複合銅粒子還原析出(第2還原處理)。 其後,以與實施例丨相同之方式獲得複合銅粒子。所獲 得之複合銅粒子之平均粒徑為Q3轉,纟中含有5%之叫 粒子。藉由上述方法調查叫粒子之存在部位,結果確認 存在有完全包埋於母粒子之表面附近I、與於—部分露出 母粒子之表面之狀態下包埋於母粒子中者。又,母粒子之 中心區域不存在Si〇2粒子。藉由上述方法測定完全包埋於 母粒子之表面附近之Si〇2粒子、與處於一部分露出母粒子 之表面之狀態的si〇2粒子之重量比,結果前者:後者=6 : 4 〇 [實施例3] 首先,將3.6 Μ之硫酸銅水溶液9 L加熱保持在5〇t,向 該硫酸銅水溶液中添加Si〇2溶膠(溶膠濃度2〇%、平均粒徑 I46549.doc -20· 201100184 20 nm)34 g。其後,逐次添加甘胺酸45爪卜濃度25%之氳 氧化納水溶液1743 g。在此,添加㈣糖525 g,獲得氧化 亞銅衆料(第1還原處理)。接著,為使還原反應完全進行, 進而繼續攪拌3 〇分鐘。 向該氧化亞銅漿料中,在最初液中所存在者以外另外添 加sih溶膠(溶膠濃度20%、平均粒徑2〇 nm)i6 §,其後添 加一水合肼(肼系還原劑)375 g。進而攪拌3〇分鐘,使還 &應完全進行,而使目標之複合銅粒子還原析出(第2還原 處理)。 過濾清洗(此時添加油酸作為表面處理劑)所獲得之複合 銅粒子並將其回收。其後,進行7Gt、5小時之加熱乾 燥。所獲得之複合銅粒子之平均粒徑為2 μηι,其中包含 〇.5%之Si〇2粒子。藉由上述方法調查Si〇2粒子之存在部 位,結果確認存在有完全包埋於母粒子之表面附近者、與 於一部分露出母粒子之表面之狀態下包埋於母粒子中者。 〇 又,母粒子之中心區域不存在Si〇2粒子。藉由上述方法測 定完全包埋於母粒子之表面附近之Si02粒子、與處於一部 分露出母粒子之表面之狀態的Si02粒子之重量比,結果前 •者:後者=3 : 7。 [實施例4] 首先,將3.6 Μ之硫酸銅水溶液9 L加熱保持在,向 該硫酸銅水溶液中添加si〇2溶膠(溶膠濃度2〇%、平均粒徑 30 nm)166 g。繼而添加磷酸三鈉u. g。其後,添加氨水 溶液(濃度25%)2537 m卜而獲得銅氣化合物漿料。接著, 146549.doc -21 - 201100184 將銅氯化合物漿料靜置30分鐘使其熟化。i 八人 逆續添加 -水合肼(肼系還原劑)45〇g與作為pH值調節劑之氨水溶液 (濃度25%)591 „U,一邊將液體之阳值、维持在8—邊^氧 化亞銅漿料(第丨還原處理)。接著,為使還原反應=進 行,進而繼續攪拌3 〇分鐘。 向該氧化亞銅浆料中,在最初液令所存在者以外另外添 加si〇2溶膠(溶膠濃度20%、平均粒徑3〇 nm)334呂,其後= 加一水合肼(肼系還原劑)6〇〇 g。進而攪拌i8〇分鐘,The weight ratio of the SiO 2 particles to the SiO 2 particles in a state in which a part of the surface of the mother is exposed is the former: the latter = 6 : 4. 146549.doc -19- 201100184 [Example 2] Hundreds of 'heating 9 L of 3.6 M aqueous solution of sulfuric acid steel in a thief, adding a twist to the copper sulfate aqueous solution towel (solvent 鸠, average grain rear curve) g Thereafter, 13 〇〇ml of a 25% aqueous ammonia solution and 425 〇g of a 25% aqueous sodium hydroxide solution were successively added. Here, 450 g of hydrazine hydrate and 591 g of an aqueous ammonia solution as a pH value adjuster were continuously added to obtain a cuprous oxide mass (first reduction treatment). Next, in order to carry out the reduction reaction, stirring was further continued for 30 minutes. To the cuprous oxide slurry, an additional Si 2 sol (sol concentration 20%, average particle diameter 3 〇 nm) 25 〇 § was added in addition to the presence of the initial liquid, and then water α 肼 300 g was added. Further, the mixture was mixed for 6 minutes, and the reduction reaction was completely carried out, and the target composite copper particles were reduced and precipitated (second reduction treatment). Thereafter, composite copper particles were obtained in the same manner as in Example 。. The obtained composite copper particles have an average particle diameter of Q3 rotation, and the ruthenium contains 5% of the particles. The presence of the particles was investigated by the above method. As a result, it was confirmed that the particles were completely embedded in the vicinity of the surface of the mother particles and embedded in the mother particles in a state where the surface of the mother particles was partially exposed. Further, Si〇2 particles are not present in the central region of the mother particles. The weight ratio of the Si〇2 particles completely embedded in the vicinity of the surface of the mother particle to the si〇2 particle in a state in which a part of the surface of the mother particle is exposed is measured by the above method, and the former: the latter = 6 : 4 〇 [Implementation Example 3] First, 9 L of a 3.6 Μ copper sulfate aqueous solution was heated and maintained at 5 Torr, and a Si 〇 2 sol was added to the copper sulphate aqueous solution (sol concentration: 2% by weight, average particle diameter I46549.doc -20·201100184 20 Nm) 34 g. Thereafter, 1743 g of an aqueous solution of ruthenium oxide having a concentration of 25% of glycine acid 45 was added successively. Here, 525 g of (tetra) sugar was added to obtain a cuprous oxide bulk material (first reduction treatment). Next, in order to complete the reduction reaction, stirring was continued for 3 minutes. To the cuprous oxide slurry, a sih sol (sol concentration: 20%, average particle diameter: 2 〇 nm) i6 § is additionally added to the presence of the initial solution, and then hydrazine monohydrate (lanthanide reducing agent) 375 is added. g. Further, the mixture was stirred for 3 minutes, and the &> was completely carried out to reduce the precipitation of the target composite copper particles (second reduction treatment). The composite copper particles obtained by filtration washing (in this case, oleic acid was added as a surface treating agent) were recovered and recovered. Thereafter, 7 Gt and 5 hours of heating and drying were carried out. The composite copper particles obtained had an average particle diameter of 2 μηι, which contained 5%.5% of Si〇2 particles. When the presence of the Si 〇 2 particles was investigated by the above method, it was confirmed that the particles were completely embedded in the vicinity of the surface of the mother particles, and were partially embedded in the mother particles in a state where the surface of the mother particles was partially exposed. 〇 Also, there are no Si〇2 particles in the central region of the mother particles. The weight ratio of the SiO 2 particles completely embedded in the vicinity of the surface of the mother particles to the SiO 2 particles in a state in which a part of the surface of the mother particles was exposed was measured by the above method, and the result was as follows: the latter = 3 : 7. [Example 4] First, 9 L of a 3.6 Torr copper sulfate aqueous solution was heated and held, and 166 g of a Si 〇 2 sol (sol concentration: 2% by weight, average particle diameter: 30 nm) was added to the copper sulfate aqueous solution. Then add trisodium phosphate u. g. Thereafter, an aqueous ammonia solution (concentration: 25%) of 2,537 m was added to obtain a copper gas compound slurry. Next, 146549.doc -21 - 201100184 The copper chloride compound slurry was allowed to stand for 30 minutes to be aged. i Eight people are successively added - hydrazine hydrate (lanthanide reducing agent) 45 〇 g and ammonia solution (concentration 25%) as a pH adjuster 591 „U, while the liquid yang value is maintained at 8 边The cuprous slurry (the second reduction treatment). Next, in order to carry out the reduction reaction, the stirring is continued for 3 minutes. To the cuprous oxide slurry, an additional Si 2 sol is added in addition to the first liquid. (sol concentration 20%, average particle diameter 3 〇 nm) 334 LV, followed by adding hydrazine monohydrate (lanthanide reducing agent) 6 〇〇 g. Further stirring i8 〇,

原反應完全進行,而使目標之複合銅粒子還原析出⑷還 原處理)。第二次添加一水合肼(肼系還原劑)後體系之 pH值緩慢降低。此時,& 了使叫轉穩定地進人,添加 5 %之氫氧化鈉水溶液而將體系之p H值調節為8。 J 過遽清洗(此時添加油酸作為表面處理劑)所獲得之複合 銅粒子並將其回收。其後,進行听、5小時之加敎: 燥。所獲得之複合銅粒子之平均粒徑為2叫,其中*包^ 5%之SiC)2粒子。藉由上述方法調查叫粒子之存在部位: 結果破認存在如下者:完全包埋於母粒子之表面附近者、 與於-部分露出母粒子之表面之狀態下包埋於母粒子中 者。又,母粒子之中心區域不存在Si〇2粒子。藉由上述方 法測定S全包㈣母粒子之表面附近之叫粒子、與處於 -部分露出母粒子之表面之狀態的叫粒子之重量比,結 果前者·後者=6: 4。 [實施例5] 首先將3_6 Μ之硫酸銅水溶液9 [加熱保持在別。〔,向 146549.doc -22· 201100184 該硫酸銅水溶液中添加81〇2溶膠(溶膠濃度2〇%、平均粒徑 20 nm)16 g。其後逐次添加濃度25%之氫氧化鈉水溶液6 L。在此,添加葡萄糖17〇〇 g,獲得氧化亞銅漿料(第!還 原處理)。接著,為使還原反應完全進行,進而繼續攪拌 3 0分鐘。 向該氧化亞銅漿料中,在最初液中所存在者以外另外添 加Si〇2溶膠(溶膠濃度20%、平均粒徑20 nm)34 g、阿拉伯 0 膠1 〇 g,其後逐次添加甘胺酸160 g、一水合肼(肼系還原 劑)3000 g。進而攪拌3〇分鐘,使還原反應完全進行,而使 目標之複合銅粒子還原析出(第2還原處理)。 過濾清洗所獲得之複合銅粒子並將其回收。其後,進行 70°C、5小時之加熱乾燥。所獲得之複合銅粒子之平均粒 私為4 μηι,其中包含〇 5%之Sl〇2粒子。藉由上述方法調查 2 ί子之存在。卩位,結果確認存在有完全包埋於母粒子 之表面附近者、與於一部分露出母粒子之表面之狀態下包 〇 埋於:粒子中者。又,母粒子之中心區域不存在⑽粒 子。藉由上述方法測定完全包埋於母粒子之表面附近之 Si〇2粒子、與處於—部分露出母粒子之表面之狀態的叫 •粒子之重量比’結果前者:後者=7 : 3。 [實施例6] 於實施例4中,使用A12〇3溶膠(溶膠濃度2〇%、平均粒徑 _代替Si〇2溶膠,以總量達到5〇 g之方式添加該a叫 :轉。,〇3溶膠並非分批添加,而是一次性添加至銅被 還原之月ί的水♦液中。以第二次添加一水合肼(肼系還原 146549.doc • 23· 201100184 劑)後之pH值達到9的方式,調整體系之?11值。又,表面處 理劑係使用硬脂酸。除此以外,藉由與實施例4相同之= 作來獲得複合銅粒子。所獲得之複合鋼粒子之平均粒徑為 2叫,其中包含〇.5%之入】2〇3粒子。藉由上述方法調查 Al2〇3粒子之存在部位,結果確認存在有完全包埋於母粒 子之表面附近者、與於一部分露出母粒子之表面之狀態下 包埋於母粒子中者。又’母粒子之中心區域不存在Α:办 粒子。藉由上述方法測定完全包埋於母粒子之表面附近之 AW3粒子、與處於一部分露出母粒子之表面之狀態的 Al2〇3粒子之重量比,結果前者:後者=4 : 6。 [實施例7] 於貫施例4中,使用Αι2〇3溶膠(溶膠濃度㈣、平均粒和 代替Si〇2溶膠,以總量達到_g之方式添加ς Ah〇3溶膠。Α12〇3溶膠係分兩次每次添加25〇 但於第二 次添加一水合肼(肼系還原劑)後未調節PH值。又,表面處 理劑係使用硬脂酸。除此以外,藉由與實施制目同之操 作來獲得複合銅粒子。所獲得之複合鋼粒子之平均粒和為 2叫,其中包含5%之Al2〇3粒子。藉由上述方法調查A叫 粒子之存在部位’結果確認存在有完全包埋於母粒子之表 面附近者、與於-部分露出母粒子之表面之狀態下包埋於 母粒子中者。又’母粒子之中心區域不存在Μ办粒子。 猎由上述方法測定完全包埋於母粒子之表面附近之AW〗 粒子、與處於一部分露出母粒子之表面之狀態的A叫粒 子之重量比’結果前者:後者=6 : 4。 146549.doc •24. 201100184 [實施例8] 於貫施例6中,使用Tl〇2溶膠(溶膠濃度2〇%、平均粒秤 4〇㈣代替Al2〇3轉,以總量達到% g之彳式添加該呢 >«°又’表面處理劑係使用月桂酸。除此以外,藉由與 &例6相同之操作來獲得複合銅粒子。所獲得之複合銅 粒子之平均粒徑為2 _,其中包含0.5%之丁丨〇2粒子。藉由 上述方法調查加2粒子之存在部位,結果確認存在有完全 〇 &埋於母粒子之表面附近者、與於-部分露出母粒子之表 面之狀態下包埋於母粒子中者。又,母粒子之中心區域不 存在TiO2粒子。藉由上述方法測定完全包埋於母粒子之表 面附近之Ti〇2粒子、與處於一部分露出母粒子之表面之狀 態的Τι〇2粒子之重量比,結果前者:後者=4 : 6。 .[實施例9] 於實施例7中,使用Ti〇2溶膠(溶膠濃度2〇%、平均粒徑 5〇 nm)代替Al2〇3溶膠,以總量達到5〇〇 g之方式添加該 〇 Ti〇2溶膠,並且分兩次每次添加250 g。又,表面處理劑係 使用月桂酸。除此以外,藉由與實施例7相同之操作來獲 知複合銅粒子。所獲得之複合銅粒子之平均粒徑為2 pm, 其中包含5%之Τι〇2粒子。藉由上述方法調查Ti〇2粒子之存 在部位,結果確認存在有完全包埋於母粒子之表面附近 者、與於一部分露出母粒子之表面之狀態下包埋於母粒子 中者。又,母粒子之中心區域不存在Ti〇2粒子。藉由上述 方法測定完全包埋於母粒子之表面附近之Ti〇2粒子、與處 於一部分露出母粒子之表面之狀態的丁1〇2粒子之重量比, 146549.doc 25- 201100184 結果前者··後者=6 : 4。 [評價1] 針對各實施例所獲得之複合銅粒子、及不含無機氧化物 粒子且粒徑與複合銅粒子相同之銅粒子,使用TMA (thermomechanical analysis,熱機械分析儀)測定熱收縮行 為。將其結果示於圖3至圖7。測定條件設為:升溫速度 l〇°C/min、環境氣體1體積%氫氣氮氣(流量15〇 ml/min)。 由圖3至圖7所示之結果明確可知:本發明之複合銅粒子 與銅單質粒子相比,熱收縮之開始溫度向高溫側偏移,耐 熱收縮性提高。又,可知無機氧化物粒子之量越多,熱收 縮進行越緩慢。 [評價2] 針對實施例4所獲得之複合銅粒子,藉由以下方法評價 無機氧化物粒子之密著性。將複合銅粒子25 g添加至純水 2〇〇 mL中,於功率400 w之超音波浴中超音波處理”分 鐘。將超音波處理後之複合銅粒子自液體中過遽分離並回 收。其後,將銅投人可溶解其之液體(14 _1/;1之頌酸水The original reaction is completely carried out, and the target composite copper particles are reduced and precipitated (4). After the second addition of hydrazine monohydrate (lanthanide reducing agent), the pH of the system slowly decreased. At this time, &> was stabilized, and a 5 % aqueous solution of sodium hydroxide was added to adjust the p H value of the system to 8. J Composite copper particles obtained by over-cleaning (adding oleic acid as a surface treatment agent at this time) and recovering them. After that, listen and 5 hours of sputum: dry. The obtained composite copper particles have an average particle diameter of 2, wherein * 5% of SiC) 2 particles. The presence of the particles is investigated by the above method: The result is that the particles are completely embedded in the vicinity of the surface of the mother particles, and are embedded in the mother particles in a state in which the surface of the mother particles is partially exposed. Further, Si〇2 particles are not present in the central region of the mother particles. By the above method, the weight ratio of the particles in the vicinity of the surface of the S-inclusive (four) mother particle to the particle in the state in which the mother particle is partially exposed is measured, and the former is the latter = 6: 4. [Example 5] First, a 3-6 bismuth copper sulfate aqueous solution 9 [heating was maintained. [, 146549.doc -22· 201100184 This copper sulfate aqueous solution was added with 81 〇 2 sol (sol concentration 2% by weight, average particle diameter 20 nm) 16 g. Thereafter, 6 L of a 25% aqueous sodium hydroxide solution was successively added. Here, 17 〇〇 g of glucose was added to obtain a cuprous oxide slurry (the first treatment of reduction). Next, in order to complete the reduction reaction, stirring was continued for 30 minutes. To the cuprous oxide slurry, an additional Si 2 sol (sol concentration 20%, average particle diameter 20 nm) 34 g, arabic 0 gel 1 〇g, and then added sugar were added to the cuprous oxide slurry. Amino acid 160 g, hydrazine monohydrate (lanthanide reducing agent) 3000 g. Further, the mixture was stirred for 3 minutes to complete the reduction reaction, and the target composite copper particles were reduced and precipitated (second reduction treatment). The composite copper particles obtained by the cleaning are filtered and recovered. Thereafter, it was dried by heating at 70 ° C for 5 hours. The obtained composite copper particles had an average particle size of 4 μηι, which contained 5% of S 〇 2 粒子 2 particles. Investigate the existence of 2 ί子 by the above method. As a result, it was confirmed that there was a case where it was completely embedded in the vicinity of the surface of the mother particle, and it was buried in the particle in a state where a part of the surface of the mother particle was exposed. Also, there is no (10) particle in the central region of the mother particle. By the above method, the weight ratio of the Si 〇 2 particles completely embedded in the vicinity of the surface of the mother particle to the state in which the surface of the mother particle is partially exposed is measured. The former: the latter = 7 : 3. [Example 6] In Example 4, the A12〇3 sol (sol concentration: 2% by weight, average particle diameter_ instead of Si〇2 sol was used, and the a call was added in such a manner that the total amount reached 5 〇g. The 〇3 sol is not added in batches, but is added to the water ♦ solution of the copper reduced by one time. The pH after the second addition of hydrazine monohydrate (lanthanide reduction 146549.doc • 23·201100184) The value of the system was adjusted to a value of 9. The system was adjusted to have a value of 11. In addition, the surface treatment agent used stearic acid, and the composite copper particles obtained by the same procedure as in Example 4 were obtained. The average particle diameter is 2, which contains 〇.5% of the 2】3 particles. The presence of the Al2〇3 particles was investigated by the above method, and it was confirmed that there was a completely embedded surface near the surface of the mother particle. And a part of the surface of the mother particle is exposed to the mother particle. In the central region of the mother particle, there is no Α: the particle is processed. The AW3 particle completely embedded in the vicinity of the surface of the mother particle is determined by the above method. And Al2 in a state in which a part of the surface of the mother particle is exposed 3 particle weight ratio, the result: the latter = 4: 6. [Example 7] In Example 4, using Αι 2 〇 3 sol (sol concentration (four), average granules and instead of Si 〇 2 sol, in total amount Σg method added ς Ah〇3 sol. Α12〇3 sol system was added twice each time 25 〇 but after the second addition of hydrazine monohydrate (lanthanide reducing agent), the pH value was not adjusted. In addition to stearic acid, composite copper particles were obtained by the same operation as in the practice. The obtained composite steel particles had an average particle size of 2, which contained 5% of Al2〇3 particles. The above-mentioned method was used to investigate the presence of a part of the particle A. As a result, it was confirmed that there was a case where it was completely embedded in the vicinity of the surface of the mother particle, and it was embedded in the mother particle in a state where the surface of the parent particle was partially exposed. There is no particle in the center area. The AW of the particle completely embedded in the vicinity of the surface of the parent particle is measured by the above method, and the weight ratio of the particle called A in a state in which a part of the surface of the parent particle is exposed is the result of the former: the latter =6 : 4. 146549.doc •24. 20 1100184 [Example 8] In Example 6, using Tl〇2 sol (sol concentration 2〇%, average particle size 4〇(4) instead of Al2〇3 rotation, add the total amount to % g) And the surface treatment agent used lauric acid. In addition, the composite copper particles were obtained by the same operation as in & Example 6. The obtained composite copper particles had an average particle diameter of 2 _, which contained 0.5. % of the 丨〇 2 particles. The presence of the 2 particles was investigated by the above method, and it was confirmed that there was a complete 〇 & immersed in the vicinity of the surface of the mother particle, and the state in which the surface of the mother particle was partially exposed Buried in the mother particle. Further, TiO2 particles are not present in the central region of the mother particles. By the above method, the weight ratio of the Ti〇2 particles completely embedded in the vicinity of the surface of the mother particle to the Τι2 particles in a state in which a part of the surface of the mother particle was exposed was measured, and the former: the latter = 4:6. [Example 9] In Example 7, Ti〇2 sol (sol concentration: 2% by weight, average particle diameter: 5 〇 nm) was used instead of Al2〇3 sol, and the ruthenium was added in such a manner that the total amount reached 5 〇〇g. Ti〇2 sol, and 250 g was added twice in two portions. Further, the surface treatment agent uses lauric acid. Except for this, composite copper particles were obtained by the same operation as in Example 7. The composite copper particles obtained had an average particle diameter of 2 pm, and contained 5% of Τι〇2 particles. When the presence of the Ti〇2 particles was investigated by the above method, it was confirmed that the particles were completely embedded in the vicinity of the surface of the mother particles, and were embedded in the mother particles in a state in which the surface of the mother particles was partially exposed. Further, Ti〇2 particles are not present in the central region of the mother particles. The weight ratio of the Ti 2 particles completely embedded in the vicinity of the surface of the mother particle to the D 1 2 particle in a state in which a part of the surface of the mother particle is exposed is measured by the above method, 146549.doc 25-201100184 Result The former ·· The latter = 6: 4. [Evaluation 1] The composite copper particles obtained in the respective examples and the copper particles having no inorganic oxide particles and having the same particle diameter as the composite copper particles were subjected to TMA (thermomechanical analysis) to measure the heat shrinkage behavior. The results are shown in Figures 3 to 7. The measurement conditions were as follows: temperature increase rate l 〇 ° C / min, ambient gas 1 vol% hydrogen gas (flow rate 15 〇 ml / min). As is clear from the results shown in Fig. 3 to Fig. 7, the composite copper particles of the present invention have a temperature at which the onset of heat shrinkage is shifted toward the high temperature side and the heat shrinkage resistance is improved as compared with the copper single particles. Further, it is understood that the more the amount of the inorganic oxide particles, the slower the heat shrinkage progresses. [Evaluation 2] With respect to the composite copper particles obtained in Example 4, the adhesion of the inorganic oxide particles was evaluated by the following method. 25 g of composite copper particles were added to 2 mL of pure water, and ultrasonically treated for "minutes" in an ultrasonic bath of 400 W. The composite copper particles after ultrasonic treatment were separated from the liquid and recovered. , the copper can be dissolved in the liquid (14 _1 /; 1 of tannic acid water

溶液)中,使銅完全溶解。、繼而向該液體中添加U 之氫氟酸水溶液,使Si〇2完全溶解。將如此而獲得之液體 作為測定對象進行1㈣析。以進行超音波處理之前的複 t銅粒子中所含之叫值作為基準,纟出超音波處理後所 f留之Sl02量之比率。針對專利文獻1之實施⑷之粒子及 =讀3^落_4]〜[衝]所記載之粒子亦進行相同 Μ疋將該等之結果示於以下之表}。 146549.doc •26· 201100184In solution), copper is completely dissolved. Then, a hydrofluoric acid aqueous solution of U was added to the liquid to completely dissolve Si〇2. The liquid thus obtained was subjected to 1 (four) analysis as a measurement target. Based on the value contained in the complex t-copper particles before the ultrasonic treatment, the ratio of the amount of S102 remaining after the ultrasonic processing is extracted. The particles described in the embodiment (4) of Patent Document 1 and the particles described in the following paragraphs are also the same. The results of the above are shown in the following table}. 146549.doc •26· 201100184

Si02之殘留率(%) 實施例 94 專利文獻1(比較) 53 專利文獻3(比較) 45 由表1所示之結果明確可知:實施例4之複合銅粒子與專 利文獻1及專利文獻3之粒子相比,Si〇2之密著性更高。 [產業上之可利用性] 如以上所詳述,本發明之複合銅粒子係用作高溫锻燒型 導電膠時容易控制熱收縮性者。 〇 【圖式簡單說明】 圖1 (a)〜(f)是模式性表示本發明之複合銅粒子之製造過 程的圖像。 圖2(a)〜(f)是模式性表示本發明之複合銅粒子之另一製 造過程的圖像。 圖3是表示實施例1及2所獲得之複合銅粒子(Si〇2/Cu)之 TMA測定結果的圖表。 圖4是表示實施例3及4所獲得之複合銅粒子(si〇2/Cu)之 TMA測定結果的圖表。 圖5是實施例5所獲得之複合銅粒子(Si〇2/Cu)之TMA測定 結果的圖表。 ,圖6是表示實施例6及7所獲得之複合銅粒子(Al2〇3/Cu)之 TMA測定結果的圖表。 圖7是表示實施例8及9所獲得之複合銅粒子(Ti〇2/Cu)之 TMA測定結果的圖表。 146549.doc -27-Residual rate (%) of Si02 Example 94 Patent Document 1 (Comparative) 53 Patent Document 3 (Comparative) 45 From the results shown in Table 1, it is clear that the composite copper particles of Example 4 and Patent Document 1 and Patent Document 3 Compared to particles, the adhesion of Si〇2 is higher. [Industrial Applicability] As described in detail above, the composite copper particles of the present invention are used as a high-temperature calcined conductive paste to easily control heat shrinkability. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 (a) to (f) are views schematically showing an image of a process for producing composite copper particles of the present invention. 2(a) to (f) are images schematically showing another manufacturing process of the composite copper particles of the present invention. Fig. 3 is a graph showing the results of TMA measurement of the composite copper particles (Si〇2/Cu) obtained in Examples 1 and 2. Fig. 4 is a graph showing the results of TMA measurement of composite copper particles (si〇2/Cu) obtained in Examples 3 and 4. Fig. 5 is a graph showing the results of TMA measurement of composite copper particles (Si〇2/Cu) obtained in Example 5. Fig. 6 is a graph showing the results of TMA measurement of the composite copper particles (Al2?3/Cu) obtained in Examples 6 and 7. Fig. 7 is a graph showing the results of TMA measurement of composite copper particles (Ti〇2/Cu) obtained in Examples 8 and 9. 146549.doc -27-

Claims (1)

201100184 七、申請專利範圍: 物粒子者,其特徵在於: 〇nm之無機氧化 無機氧化物粒子包合.—人a 者、說仇红于匕3 .元全包埋於母粒子之表面附近 ❹ ❹ 子中者於-卿出母教子之表面之狀態下包埋於母粒 。·二::::物粒子之含量相對於複合銅粒子整體而為 心之複合銅粒子,其中於母粒子之中心區域, …'機乳化物粒子實質上處於非存在狀態。 石夕、氧二之1°鋼粒子’其中無機氧化物粒子為氧化 氧化鋁、氧化鈦、氧化鈽或氧化鍅。 4·广求項1之複合銅粒子,其中無機氧化物 5. ㈣為母粒子之平均粒徑之1/10〜1/200。 之千均 一種複合金屬粒子之製造方法’其係如請求項i之複人 銅粒子之製造方法,其特徵在於: σ =有向含有鋼離子或者含有銅之離子種、銅氧化物 =銅風乳化物及無機氧化物粒子之水性液體令添加還原 ^而進行鋼之還原的步驟, ’、 於銅之還原巾’在最初水性液射所存在者 外添加無機氧化物粒子, 力 或將鋼之還原中之液體的阳值調節為7·5〜 6. t請求項5之複合金屬粒子之製造方法,其中以,容圍狀 態使用無機氧化物粒子。 合膠狀 146549.doc201100184 VII. Scope of application for patents: Particles are characterized by: Inorganic oxidized inorganic oxide particles of 〇nm are included. - Person a, said Qiu Hong Yu 匕 3. Yuan is fully embedded near the surface of the mother particle ❹ The scorpion is embedded in the masterbatch in the state of the mother's mother. • Two:::: composite copper particles in which the content of the particles is a core of the composite copper particles, wherein in the central region of the mother particles, the organic emulsion particles are substantially in a non-existent state. Shi Xi, oxygen 1 ° steel particles 'where the inorganic oxide particles are alumina, titania, yttria or yttria. 4. The composite copper particles of the broad item 1, wherein the inorganic oxide is 5. (4) is 1/10 to 1/200 of the average particle diameter of the mother particles. A method for producing a composite metal particle according to claim i, which is characterized in that: σ = directional ion species containing copper ions or containing copper, copper oxide = copper wind The aqueous liquid of the emulsion and the inorganic oxide particles is subjected to a reduction and reduction of the steel, and the 'reducing towel of copper' is added with inorganic oxide particles in addition to the presence of the first aqueous liquid spray, force or steel The positive value of the liquid in the reduction is adjusted to 7. 5 to 6. The method for producing the composite metal particles of claim 5, wherein the inorganic oxide particles are used in a state of being contained. Gelatinous 146549.doc
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