201033101 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種用來讓基板輸送路徑所輸^：之例如用於 面顯示器（FPD)的玻璃基板暫時從基板輸送路徑^避g 美 缓衝單元，制是_-種能_緩衝裝置内部空間的 苹序有效率地進行的基板緩衝單元。 ’ 【先前技術】 在FPD的製造過程中，係使用微影技術在啦用的玻璃基板 上形成電路圖案。微影形成電路圖案，係先在_基板上塗佈光 巧以形成光阻膜’再輯應電路_的方式將光賴曝光，然 後實施顯影處理4路圖案的形成，係使⑽實施光阻液塗布或 顯影等處理的各處理單it沿著輸送路線（基板輸送路徑）設置的 製造生產線。_基板沿著輸祕雜送，縣各處理單元接 既定處理。 ^外’該製造生產線為了調整在各處理單元之間的基板接 以及傳遞的時序，通常會設置讓玻璃基板暫時從輸送路線退避離 開並保管玻璃基板的緩衝裝置。關於該等緩衝裝置， 在專利文獻1巾揭種雜細多段方式較 ^二 退避，作。圖7⑷〜圖7 (c)所示之升降緩衝裝置2〇〇， 棚σ邛205，其設置在輸送路線途中，並設有以 板載，施〜黯;升降機構施，其以可升降移:以= 該棚二部205。當需要將基板退避到升降緩衝裝置2 停 止驅動X方向下游侧的輔助輸送機構21〇。再圖^ ^二 Ξίΐπ Gi ^ ^ 的送入口▲ 2〇la ’而基板整體載置於載置部2伽上時 250a便停止。藉此基板G1形絲置於載置部紙上的狀態。 201033101 接著’當下一片基板G2接著從x方向上游側輪 便解除輸送機構250a與其驅動源的連接。 …來寺’ 然後’載置部202b〜202f的其中任一個，例如圖 的’升降機構206讓棚台部205上升以使載置部鳩 = 的高度-致，並讓載置部腿的輸送機構2雜與其 而受到驅動。在此’基板G1域置部2Q2a那獅紐輸送路 退避離開的狀ϋ。紐，冑基板G2紐載置於載 昧 便停止驅動輸送機構250b。 丨wo上時’ 藉由重複該等步驟，到基板輸送的待機狀態解除為止 路線所輸送過來的後續基板G3、G4··.會分別載置於載 ^送 202d…上並受到保管[參照圖7 (c)]。 科以Wc 另外’該升降緩婦置，與其他單元—起設置在 内。無塵室的頂部設有稱為FFU (風4過濾單元）的清淨空 給裝置’藉此，空氣向下方流動形麵直層流（降流）。…、 以往，係·該降流確齡㈣清淨度，進而雜 之棚台部205内部的清淨度。 亦即，如圖8所示的，作為外裝面板的框體2〇1的頂面，為 了將上方往下方流動的清淨空氣吸入框體内2〇1而形成開放構 造。因此，無塵室内的降流，形成從框體201的頂面流入框體2〇1 内部並從基板送入送出口 201a、201b流出的清淨空氣流。 [先行技術文獻] 、 [專利文獻] [專利文獻1]日本特開2007-250671號公報 【發明内容】 [發明所欲解決的問題] 然而’在該構造中若藉由升降機構2〇6讓棚台部2〇5在框體 201内升降移動’則如圖9所示的棚台部205下方的空間207的容 積會產生變化，形成於框體201内的空氣流會被打亂，可能會造 成不良的影響。 4 .201033101 六彻^ ’在棚台部2G5的每次升降移動中，其下方空間207的 ΐ检攻知而產生壓縮膨脹’將升降機構206所產生的塵埃捲起，、 置的^把進入棚台部205内部，可能會附著到棚台部205内所载 元，上制題’本發明之目的在於提供-種基板緩衝單 程序輸送之基板暫時退避’讓緩衝空間的空氣清淨 [解決問題之技術手段] 1解決上述問題，本發明提供一種基板緩衝單元，其將基 硪輸送之基板暫時收納’使基板從該基板輸送路徑退 3:箱狀的框體，其頂面為開放；載置部，其載置從 輸送路徑送人該框體_基板；箱狀的棚台部，其以能夠 讓3亥部移動到離開該基板輸送路徑的既定位置上的方式設 置，二氣導入口，其設置在該棚台部的一侧面上，將清淨空氣導 入，，置邛，排氣機構，其連接該棚台部，將該棚台部内的空氣 =雜體外’以及排氣窗，其設置在比該棚台部更下方的該框 體側面上，將該框體内的蒙氣排出。 m 藉由像這樣设置排氣機構，在框體内，便能夠從棚台部的侧 面將清淨空氣強制導入，使其朝單一方向流動排出。再者，藉由 在框體的下部側面上^置排驗，便能夠將未被導人棚台部内部 而流到棚台部下方的清淨空氣有效率地為纟出。 又，在框體内，能夠·讓上部空間相較於下部空間經常形成正 壓，並抑制下部空間發生氣流捲起的情況。 又，該排氣窗，宜藉由分別以隨意開閉方式設置的複數開閉 構件，使其開口面積能夠以複數階段方式改變。 又，更設置：氣壓檢測機構，其檢測該框體内的上部空間與 了部空間的氣壓或是其中任—方的氣壓；開閉驅動機構，其驅動 各開閉構件開啟關閉；以及控纖構，其控制至少關閉驅動機 ΐί該ί氣機構的其中任—方；該控制機構’宜根據該氣壓檢測 機構之檢測結果無定氣壓値_較結果，決定至少該排氣窗的 5 201033101 開口面積與該排氣機構的排氣輸出的其中任一方，並控制至少該 開閉驅動機構與該排氣機構的其中任一方。 工 藉由該等構造，便能夠對應棚台部的升降移動而改變排氣窗 的開口面積以及排氣機構的排氣輸出，在框體内形成穩糾降流。 如是’便能夠抑制在框體内發生空氣逆流或捲起^情況，防 止馬達等驅動系統所產生的塵埃流入棚台部。 下夕的棚台部的侧面上宜設置將從該棚台部侧邊流 下之b淨空氣引導至該排氣窗的第一整流板。 又’在該箱狀的棚台部的頂面上宜設置將從 空氣引導至該棚台部侧邊的第二整流板。da下之/月淨 置匕第二整流板，便能夠對從上方導入之 流向棚台部侧邊以及排氣窗的空氣流。 攻丄過鳘 [對照先前技術之功效] 本發明提供一種基板緩衝單元，i使單一 時退避離開，讓緩衝空間的空氣清淨步驟有效率之基板暫 【實施方式】 態。=明單元的實施形 案的製造生產線射，將作為被微影步驟形成電路圖 收納，使其從製造生產線退^離開。&下Z用破璃基板暫時 用於升降緩衝裝置的實_進行·。下的實施_巾，就應 圖1係本發明之基板緩衝單元的 A-A線段的端視圖，圖3係沿 ^於沾圖2係沿圖1之 沿圖2之C-C線段的端視圖。 β綠段的端視圖，圖4係 圖示之基板緩解元⑽，具備在 基板的玻璃基板G以多段（圖申為v C體1内將作為被處理 2，·以及從下方支持言亥棚台部2Θ並二載置的箱狀棚台部 對該基域衝單元跡麵基鱗機構3。 團1所示之單元框體1 201033101 的送入口 la送入，收納於棚台部2之後，適時從相反侧的送出口 lb送出。 該框體1的送入口 la以及送出口 lb，設置在緩衝單元1〇〇的 上游以及下游，配合所謂平流式基板輸送路線（基板輸送路徑） 的高度位置而設置。 >如圖1所示的棚台部2設有箱狀的殼體2〇，在該殼體2〇 内设置例如5段的基板G的載置部6。在殼體20面臨該框體1之 送入送出口 la、lb的侧面上，對應各段載置部6設置複數個基板 送入口 2a與送出口 2b。 由於棚台部2 (殼體20)在框體1内可藉由升降機構3升降 移動，在對既定段之載置部6實施玻璃基板G的送入送出時，升 降機構3讓棚台部2升降移動，使該既定段之載置部6移到該送 入口 la以及送出口 lb的高度。 又，在將基板G載置於既定的載置部6之後，升降機構3讓 棚台部2升降移動到離開基板輸送路線的既定位置上，藉此讓該 基板G從基板輸送路線退避離開。 又，如圖2所示的，各載置部6以並排方式設置複數個用來 實行基板輸送的輥子輸送軸13,在各軸13的一端上設有軸旋轉驅 動機構14，其由馬達等構件所構成，用來旋轉驅動各轴13。 參 又’如圖卜圖2所示的框體1的頂面形成開放構造。因此， 當該緩衝單元1〇〇设置在無塵室内，從其頂部以降流方式供給清 淨空氣時’便能夠如圖所示從框體1的上方對框體丨内部供給清 淨空氣。 在此，於棚台部2的頂面’設置中央部凸出成圓頂狀的整流 板45 (第二整流板）’將上方的降流引導至棚台部2的侧邊。 在棚台部2的一側面上設有用來將清淨空氣導入各載置部6 的空氣導入口 6a從上方流到棚台部2侧邊的降流的一部份，從 該空氣導人口 6a流人各載置部6，如圖2箭號所示的形成清淨空 氣流。 由於各載置部6的該軸旋轉驅動機構14設置在下游側，故驅 7 201033101 動機構的塵埃不會流入各戴置部6。 明 驅動機構14，被蓋部15所覆蓋，1 私之’該複數軸旋轉 I6，該排氣管I6連接框體外部的排^月"^延伸的排氣管 亦即，藉由設置排氣裝置30，以^兩m)。 便不會逆流而必定會被排出到外部。、 驅動機構14之後， 又’排氣裝置30宜設置成排氣輸出可以 便可對應例如供給到框體i内的降* f的構& ’此時’ 排氣輸出。 態相素，設定最適當的 的左==3 ’非框體1之基板送人出面的框體1 =右兩_ ’在各_下部，關如横向 用來將框體i内的蒙氣排出而能夠開閉的排氣窗4〇個的方式叹置 各排氣窗40，分別設有複數開閉構件 式設置4片開閉板41a、41b、41c、41d，U ίίΐ排 各自獨立_。 彻，該等_板41卜41(1可 馬達等的二驅動機二如S = 意=分別由電動 峨轉屋感2二：ΪίΪΐ部1 壓檢測機構)，並根據•檢測結果 定的S1、幻的檢測結果分別超過預先設 =的既^壓力糾，或域應n 8卜S2之間_力差在 r^〇t^ .在此，控制開閉板41a〜41d的開閉，使框體1内的氣壓不會 ^到棚台部2升降移動的影響而經常在上部形成正壓，藉此對框 1内的下部空間的空氣流進行整流，抑制空氣發生縣的情況。 201033101 情況^抑伽體1在下部空間發生空氣捲起的 階段的方式改變排氣窗40的開口面積。例如， 41b 能的狀態’圖6(a)顙示打開開閉板41a) 圖6 (c)顯示打開全部關板似〜侃的狀態、仙的狀態 行整^在開閉板41a〜41d的背面侧設·網構件44，對排氣進 • ‘ .... ，宜根據該氣壓感應器S1、S2的檢測結果，由部4 ! 嶋，此時，觸更進—步對框體 ^ ’如圖:2所示的在棚台部2的侧面設置整流板48 (第一整 Ϊί^)魅娜降流分未流賴跡6的清淨空制導至該排 出之ί，ΐϊ棚台部2的下方的请淨空氣，除了從該排氣窗4〇排 升降機構3的殼體46内。亦即，咖 給下古47連接该排氣褒置30 ’特別在棚台部2下降時（壓 入味丨=二）將僅靠排氣窗4〇無法完全排出的捲起空氣強制吸 % %排，外部。藉由該構造，便能夠防止升降 產生的塵埃因為空軋捲起而流到棚台部2。 述’若利用本發明之實施形態，藉由設置排氣裂置3〇, 一^向棚^ IT面將清淨空氣強制導人，使其朝單 脾去、* 1動排出。再者’在框體1的下部侧面設置排氣窗40，其 排屮被^棚台部2内而流到棚台部2下方的清淨空氣有效率地 出丄且其開口面積（排氣量）可隨意改變。 構棚台部2内’清淨空氣通過軸旋轉驅動機 稱μ之後，不會逆流，而必定會被排出到外部。 體1内’讓上部空間相較於下部空間經常形成正塵， 產生氣流捲起的情況。尤其，對應棚台部2 的升降移動而改變設置在該框體i下部側面之排氣窗⑽的開^面 201033101 積，藉此便能夠在框體1内形成穩定的降流。 如是，便能夠抑雜體丨内部產生空氣的逆鼓捲起的情況， 防止馬達等驅動系統所產生的塵埃流到棚台部2 (載置部6)。 哭以又:實施形態中’設置檢測上部空間之氣壓的氣壓感應 部㈣錢翻氣賊應11S2作為檢測框體1 構，當其所檢測之氣壓値超過既定値時， 丨值ί過既定値時，便對排氣窗40的開閉板4ia 框，。摘’本發日__鱗構造為限，亦可在 ^ ’ °卩二間或下部空間的其中一方設置氣壓感應器作為 構，4,^檢測到的氣壓値超過既定値時對“窗40 的開閉板41a〜41d實施開閉控制。 由栌二在I，係根據氣壓感應器S1、％的娜 S2的明亥等構造為限，亦可根據氣壓感應器. 果，由控制部43控制開仙 裝置30的魏輸_至少其性—方。 _閉與排私 眘二i在Ϊ實施雜巾，仙應躲纽式的升降緩衝裝置的 ，惟本發明並非以該形態為限。= 部2 的基板緩衝裝置，又，亦可不使用棚台 的緩應用於以機械臂等構件將複數基板送入送出 【圖式簡單說明】 本發明之基板緩衝單元的侧剖面圖。 圖2係沿圖1之Α-Α線段的端視圖。 圖3係沿圖2之Β-Β線段的端視圖。 圖4係沿圖2之C-C線段的端視圖。 窗的塊圖，用來說明圖1之基板緩衝單元所具備之排氣 201033101 圖6係排氣窗的開口面積的階段變化圖。 圖7係升降缓衝裝置的基板退避動作的説明圖。 圖8係表示習知升降緩衝裝置内部空氣流的剖面圖。 圖9係表示習知升降缓衝裝置内部的其他空氣流的剖面圖。 【主要元件符號說明】 1框體 la基板送入口 lb基板送出口 2棚台部 ❿ 2a基板送入口 2b基板送出口 3升降機構 6載置部 6a空氣導入口 13輥子輸送軸 14軸旋轉驅動機構 15蓋部 16排氣管 ❹ 20殽體 -—— 30排氣裝置（排氣機構） 40排氣窗 41a、41b、41c、41d開閉板（開閉構件） 42a、42b、42c、42d開閉驅動機構 43控制部（控制機構） 44篩網構件 45整流板（第二整流板） .46殼體 47排氣管 48整流板（第一整流板） 11 201033101 100基板緩衝單元 200升降緩衝裝置 201框體 201a基板送入口 201b基板送出口 202a〜202f基板載置部 205棚台部 206升降機構 207空間 210輔助輸送機構 250a輸送機構 250b輸送機構 S1氣壓感應器（氣壓檢測機構) S2氣壓感應器（氣壓檢測機構) G1〜G5玻璃基板（基板） A-A、B-B、C-C 剖面線 X軸201033101 VI. Description of the Invention: [Technical Field] The present invention relates to a glass substrate for use in a substrate transport path, for example, for a surface display (FPD), temporarily transporting a substrate from a substrate to avoid The punching unit is a substrate buffering unit that efficiently performs the internal space of the buffering device. [Prior Art] In the manufacturing process of the FPD, a circuit pattern is formed on a glass substrate for use by lithography. The lithography forms a circuit pattern by first coating the light on the _ substrate to form a photoresist film 're-complexing circuit _, and then performing photo-development of the four-way pattern, and (10) implementing the photoresist Each processing unit of the processing such as liquid coating or development is along the manufacturing line provided by the transport path (substrate transport path). The _substrate is sent along with the secrets, and the processing units of the county are connected to the scheduled processing. In order to adjust the timing of substrate connection and transfer between the respective processing units, the manufacturing line usually has a buffer device for temporarily evacuating the glass substrate from the transport path and storing the glass substrate. Regarding such a buffer device, the patent document 1 discloses a multi-segment multi-segment method. 7(4) to 7(c), the lifting buffer device 2〇〇, the shed 邛 205, which is disposed on the way of the conveying route, and is provided with an onboard load, a lifting mechanism, which can be moved up and down :== The shed two 205. When it is necessary to retract the substrate to the lift buffer device 2, the auxiliary transport mechanism 21A on the downstream side of the drive X direction is stopped. Further, when the substrate is placed on the mounting portion 2, the wafer is stopped when the substrate is placed on the mounting portion 2 by ▲ 2〇la ’. Thereby, the substrate G1 shaped wire is placed on the placing portion paper. 201033101 Next, the current one substrate G2 is then released from the upstream side of the x direction to release the connection of the transport mechanism 250a from its drive source. ...to the temple 'and then' any of the placing portions 202b to 202f, for example, the 'lifting mechanism 206 of the figure allows the shed portion 205 to rise so that the height of the placing portion 鸠 = and the delivery of the legs of the placing portion The organization 2 is driven by it. Here, the state in which the lion-new conveying path of the substrate G1 region 2Q2a is retracted is removed. The button substrate G2 is placed on the carrier and the drive mechanism 250b is stopped. By repeating these steps, the subsequent substrates G3 and G4··. which are transported by the route until the standby state of the substrate conveyance is released are placed on the carrier 202d... and stored. 7 (c)]. The branch is set up with Wc and other units. The top of the clean room is provided with a clean air supply device called FFU (Wind 4 Filtration Unit), whereby the air flows downwardly in a straight laminar flow (downflow). ..., in the past, the degree of cleanliness of the down-flowing (4), and the cleanliness inside the miscellaneous shed 205. In other words, as shown in Fig. 8, the top surface of the casing 2〇1 as the exterior panel is opened to the inside of the casing 2 by the clean air flowing downward from the upper side to form an open structure. Therefore, the downflow in the clean room forms a flow of clean air that flows into the inside of the casing 2〇1 from the top surface of the casing 201 and flows out from the substrate feed/discharge ports 201a and 201b. [PRIOR ART DOCUMENT] [Patent Document 1] [Patent Document 1] JP-A-2007-250671 SUMMARY OF INVENTION [Problems to be Solved by the Invention] However, in this configuration, if the lifting mechanism 2〇6 is used When the shed portion 2〇5 moves up and down in the casing 201, the volume of the space 207 below the shed portion 205 shown in FIG. 9 changes, and the air flow formed in the casing 201 is disturbed. Will cause adverse effects. 4 .201033101 六彻^ 'In each lifting movement of the shed portion 2G5, the space under the space 207 is compressed and activated, and the dust generated by the lifting mechanism 206 is rolled up, and the dust is placed. The inside of the shed portion 205 may be attached to the gantry portion 205. The object of the present invention is to provide a substrate for a single buffer to transport the substrate temporarily to evacuate the air in the buffer space. Technical Solution] 1 To solve the above problems, the present invention provides a substrate buffer unit that temporarily stores a substrate that is transported by a substrate. The substrate is retracted from the substrate transport path by a box-shaped frame, and the top surface thereof is open. And a box-shaped shed portion that is disposed to be moved from a predetermined position away from the substrate transport path to the second gas inlet port; Provided on one side of the shed portion, the clean air is introduced, and the venting mechanism is connected to the shed portion, and the air in the shed portion is replaced by an exhaust body and an exhaust window. Set in the shed section On the side of the frame below, the air in the frame is exhausted. By providing the exhaust mechanism in this way, the clean air can be forcibly introduced from the side of the shed portion in the casing, and can be discharged and discharged in a single direction. Further, by performing the inspection on the lower side surface of the casing, the clean air that flows into the lower portion of the shed portion without being guided can be efficiently extracted. Further, in the casing, the upper space can be constantly formed with a positive pressure in comparison with the lower space, and the airflow in the lower space can be suppressed from being rolled up. Further, it is preferable that the louver is opened and closed by a plurality of opening and closing members which are respectively opened and closed, so that the opening area can be changed in a plurality of stages. Further, an air pressure detecting mechanism is provided, which detects the air pressure of the upper space and the space in the frame or the air pressure of any of the spaces; the opening and closing drive mechanism drives the opening and closing members to open and close; and the control structure, The control device at least closes the drive unit 其中 其中 ί ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί 根据 根据One of the exhaust output of the exhaust mechanism and controlling at least one of the open/close drive mechanism and the exhaust mechanism. According to these structures, the opening area of the exhaust window and the exhaust gas output of the exhaust mechanism can be changed in accordance with the lifting movement of the shed portion, and a steady flow of the downflow can be formed in the casing. If it is, it is possible to suppress the occurrence of air backflow or rolling up in the casing, and prevent dust generated by a drive system such as a motor from flowing into the shed portion. On the side of the shed portion on the eve of the eve, it is preferable to provide the first rectifying plate that guides the net air flowing from the side of the shed portion to the louver. Further, it is preferable to provide a second rectifying plate that guides air from the air to the side of the trough portion on the top surface of the box-shaped shed portion. The lower rectification/month is placed on the second rectifying plate, so that the air flow from the upper side to the side of the shed portion and the exhaust window can be introduced. The present invention provides a substrate buffer unit that allows a substrate to be evacuated at a single time, and the substrate in which the air cleaning step of the buffer space is efficient. The manufacturing line of the embodiment of the bright cell is stored as a circuit diagram by the lithography step, and is removed from the manufacturing line. &Z Lower Z-ray substrate is temporarily used for the lifting buffer device. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an end view of the A-A line segment of the substrate buffer unit of the present invention, and Fig. 3 is an end view along line C-C of Fig. 2 taken along line 2 of Fig. 1. The end view of the β green segment, FIG. 4 is a substrate mitigation element (10) shown in the figure, and has a plurality of segments on the glass substrate G of the substrate (the figure is to be treated 2 in the v C body 1 and to support the shed from below) The box-shaped shed portion that is placed on the pedestal 2 is placed in the base area of the unit frame 1 201033101, and is placed in the shed unit 2 The delivery port 1b and the delivery port 1b of the housing 1 are disposed at the upstream and downstream of the buffer unit 1A, and the height of the so-called flat flow substrate transport path (substrate transport path) is matched. The gantry portion 2 shown in Fig. 1 is provided with a box-shaped casing 2, and the mounting portion 6 of the substrate G of, for example, five stages is provided in the casing 2〇. A plurality of substrate feed ports 2a and a feed port 2b are provided on the side faces of the feed/discharge ports 1a and 1b of the frame body 1 corresponding to the respective segment mounting portions 6. Since the land portion 2 (housing 20) is in the frame 1 When the glass substrate G is fed and ejected to the mounting portion 6 of the predetermined stage, the lifting mechanism 3 can be moved up and down. The lowering mechanism 3 moves the gantry portion 2 up and down, and moves the placing portion 6 of the predetermined segment to the heights of the delivery port 1a and the delivery port 1b. Further, after the substrate G is placed on the predetermined placement portion 6, The elevating mechanism 3 moves the gantry portion 2 up and down to a predetermined position away from the substrate transport path, thereby retracting the substrate G from the substrate transport path. Further, as shown in FIG. 2, each of the placing portions 6 is arranged side by side. A plurality of roller conveying shafts 13 for carrying out substrate conveyance are provided, and one end of each shaft 13 is provided with a shaft rotation driving mechanism 14 which is constituted by a motor or the like for rotationally driving the respective shafts 13. The top surface of the frame 1 shown in Fig. 2 forms an open structure. Therefore, when the buffer unit 1 is disposed in the clean room and the clean air is supplied from the top thereof in a downflow manner, the frame can be as shown in the figure. The upper part of the body 1 is supplied with clean air to the inside of the frame body. Here, the top surface of the shed portion 2 is provided with a rectifying plate 45 (second rectifying plate) that protrudes in a dome shape at the center portion to lower the upper side. Guided to the side of the shed portion 2. On one side of the shed portion 2 A part of the downflow of the air introduction port 6a for introducing the clean air into the respective mounting portions 6 from the upper side to the side of the booth portion 2 flows from the air guiding population 6a to each of the placing portions 6, as shown in the figure The clean air flow is formed by the two arrows. Since the shaft rotation drive mechanism 14 of each of the mounting portions 6 is provided on the downstream side, the dust of the drive mechanism of the drive 7 201033101 does not flow into the respective wear portions 6. The drive mechanism 14 Covered by the cover portion 15 and 1 privately rotating the plurality of shafts I6, the exhaust pipe I6 is connected to the exhaust pipe outside the frame, that is, by extending the exhaust pipe, that is, by providing the exhaust device 30, Take ^ two m). It will not be reversed and will be discharged to the outside. After the drive mechanism 14, the exhaust unit 30 is preferably arranged such that the exhaust gas output can correspond to, for example, the configuration of the drop *f supplied to the frame i. State phase, set the most appropriate left == 3 'the frame of the non-frame 1 to give the face out of the frame 1 = the right two _ 'in the lower part of each _, close to the horizontal to use the inside of the frame i Each of the exhaust windows 40 that can be opened and closed is slid, and each of the exhaust windows 40 is slanted, and four opening and closing members 41a, 41b, 41c, and 41d are provided in a plurality of opening and closing members, and the U ΐ 各自 。 。 。 。 。 Too, the _ board 41 卜 41 (1 motor can be the second driver 2 such as S = meaning = respectively, by the electric twirling house 2 2: ΪίΪΐ 1 pressure detection mechanism), and according to the test results S1 The phantom detection result exceeds the pressure correction of the pre-set = respectively, or the domain should be between n 8 and S2 _ the force difference is r^〇t^. Here, the opening and closing of the opening and closing plates 41a to 41d is controlled to make the frame The air pressure in 1 does not affect the movement of the gantry portion 2, and a positive pressure is often formed in the upper portion, thereby rectifying the air flow in the lower space in the frame 1 and suppressing the situation of the air generation county. 201033101 The case where the gamma body 1 is in the stage where the air is rolled up in the lower space changes the opening area of the exhaust window 40. For example, the state of 41b can be 'Fig. 6(a) shows the opening and closing plate 41a.) Fig. 6(c) shows the state in which all the closing plates are turned on, and the state of the fairy is arranged on the back side of the opening and closing plates 41a to 41d. The net member 44 is arranged for the exhaust gas to be '...., according to the detection result of the air pressure sensor S1, S2, by the portion 4! 嶋, at this time, the touch is further advanced to the frame body ^ ' Fig. 2 shows a rectifying plate 48 (the first whole Ϊ^) on the side of the shed portion 2, and the clear air of the genre descending flow is guided to the discharge ί, the shed shed 2 The clean air below is arranged in the casing 46 of the lifting mechanism 3 from the exhaust window 4. That is, the coffee is given to the lower 47 to connect the exhaust device 30', especially when the shed portion 2 is lowered (pressing the miso = two), and only the exhaust window 4 〇 can not be completely discharged, the air is forced to suck %% Row, outside. According to this configuration, it is possible to prevent the dust generated by the lifting and lowering from flowing up to the shed portion 2 due to the rolling up. As described in the embodiment of the present invention, by providing the exhaust rupture 3 〇, the clean air is forcibly guided to the spleen, and is discharged toward the single spleen. Further, an exhaust window 40 is provided on the lower side surface of the casing 1, and the clean air that flows into the shed portion 2 and flows under the shed portion 2 efficiently exits and has an opening area (discharge amount) ) can be changed at will. In the shed 2, the clean air is driven by the shaft to rotate the machine so that it does not flow backwards, but must be discharged to the outside. The inside of the body 1 causes the upper space to form positive dust in comparison with the lower space, causing a situation in which the airflow is rolled up. In particular, the opening/closing surface 201033101 of the exhaust window (10) provided on the lower side of the frame i is changed in accordance with the lifting movement of the gantry portion 2, whereby a stable downflow can be formed in the casing 1. In this case, it is possible to prevent the counter-drum of the air generated inside the body from being rolled up, and to prevent the dust generated by the drive system such as the motor from flowing to the shed portion 2 (the mounting portion 6). Cry again: In the implementation form, 'the air pressure sensing unit that detects the air pressure in the upper space. (4) The money thief should use 11S2 as the detection frame. When the detected air pressure exceeds the predetermined threshold, the value is over 既At this time, the opening and closing plate 4ia of the exhaust window 40 is framed. Picking the 'this day's __ scale structure is limited, you can also set the air pressure sensor as one of the two sides of the ^ ' ° 或 or the lower space, 4, ^ detected the pressure 値 exceeds the established 値 when the window 40 The opening and closing plates 41a to 41d are subjected to opening and closing control. The second is in accordance with the structure of the air pressure sensor S1, the Na, and the like, and may be controlled by the control unit 43 according to the air pressure sensor. The fascination of the fascinating device 30 is at least its nature--the _closed and the smuggling stipulations are implemented in the sputum, and the sacred escaping can be used as the lifting buffer device, but the invention is not limited to this form. The substrate buffering device of 2 can also be used for feeding and feeding a plurality of substrates by means of a robot arm or the like without using a shed. [Schematic Description] A side cross-sectional view of the substrate buffer unit of the present invention. Figure 1 is an end view of the Β-Β line segment along Figure 2. Figure 4 is an end view of the CC line segment along Figure 2. A block diagram of the window for illustrating the substrate of Figure 1. Exhaust gas provided in the buffer unit 201033101 Fig. 6 is a phase change diagram of the opening area of the exhaust window. Fig. 8 is a cross-sectional view showing the air flow inside the conventional lifting cushion device. Fig. 9 is a cross-sectional view showing another air flow inside the conventional lifting cushion device. DESCRIPTION OF REFERENCE NUMERALS 1 frame la substrate feeding port lb substrate feeding port 2 shed portion ❿ 2a substrate feeding port 2b substrate feeding port 3 elevating mechanism 6 placing portion 6a air introducing port 13 roller conveying shaft 14 shaft rotation driving mechanism 15 cover portion 16 exhaust pipe ❹ 20 confusing body - 30 exhaust device (exhaust mechanism) 40 exhaust windows 41a, 41b, 41c, 41d opening and closing plate (opening and closing member) 42a, 42b, 42c, 42d opening and closing drive mechanism 43 control portion (Control mechanism) 44 screen member 45 rectifying plate (second rectifying plate) .46 housing 47 exhaust pipe 48 rectifying plate (first rectifying plate) 11 201033101 100 substrate buffer unit 200 lifting buffer device 201 frame 201a substrate feeding Entrance 201b substrate delivery outlets 202a to 202f substrate mounting portion 205 shed portion 206 lifting mechanism 207 space 210 auxiliary conveying mechanism 250a conveying mechanism 250b conveying mechanism S1 air pressure sensor (air pressure detecting mechanism) S2 pressure feeling Device (air pressure detecting mechanism) G1 to G5 glass substrate (substrate) A-A, B-B, C-C section line X-axis
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