TW201000884A - Defect inspection device and method - Google Patents

Abstract

Problem to be solved: To provide a defect inspection device capable of detecting a height direction position of a defect. Solution: A glass substrate 99 moves at a fixed speed v, and the position d of a platform 2 is detected by a platform position detection device 4. Oblique incident light is illuminated from an illumination device 1 to the glass substrate 99 via an optical mask 10 at a predetermined angle. An image detection device 3 detects reflected light reflected underneath the glass substrate 99. According to the incident light and the reflected light, a defect can therefore be determined, and a time interval can be measured. A controller 5 calculates the height direction position of the defect according to the abovementioned predetermined angle, fixed speed v and time interval.

Description

201000884 VI. Description of the Invention: [Technical Field to Which the Invention Is Ascribed] The present invention relates to a defect detecting device. [Prior Art] In an exposure apparatus for manufacturing a printed circuit board, a mask in which an exposure pattern is drawn is supported by a glass through which exposure light passes. r In the exposure apparatus, the glass for the contact exposure apparatus for making the photomask and the substrate close to each other is large and thick, so there are sometimes bubbles or foreign matter inside. The effect of these bubbles or foreign matter on the exposure varies with the position of the same thickness in the thickness direction of the glass. For example, at the time of exposure, the resistive surface of the substrate to be exposed is located on the lower surface side of the glass, and in the case where bubbles or foreign matter are near the underside of the glass, i.e., close to the photoresist surface, the negative influence on the exposure becomes large. . In the case of a defect close to the glass, the negative effect becomes small. In order to detect defects or foreign matter inside such a glass, there have been various proposals shown in the following Patent Documents 1 to 5. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Patent Document 5: JP-A-2006-1-12955 [Summary of the Invention]

The problem to be solved by the invention is 2099-10296-PF 201000884 Fang Dan can't detect the position of the ▲d direction of the defect, and the foreign body in the helmet is taken to the shoulder... The law is known to be defective or privately difficult. problem. The purpose of the right/thing, the influence of the object on the exposure is to solve the problem of solving the problem, and the problem of knowing the technology. In order to achieve the above-mentioned purpose, _ consists of: illuminating device:, 'defect detection device, whose characteristic light penetrates the μ grid to tilt the inspection light at an angle of inspection, and the inspection object, the illuminating light, and the m light The reflected light reflected from the under-injection under the incident inspection object; the moving device makes the 哕 哕 inspection object and 日·日日 aB strong, the speed is relatively shifted:: (4) is placed in the oblique direction of the light to determine the inspection According to the incident light and the reflected light, a defect of the ten-image is detected; a time interval detecting device detects a time interval at which the defect is detected by the incident and the defect is detected by the reflected light; the computing device' The height direction position of the defect is calculated based on the predetermined angle, the predetermined speed, and the predetermined speed. ^ °10 According to the above configuration, the defect of the inspection object can be detected, and the bit i in the height direction of the defect can be detected. Further, since the reflected light reflected from the underside of the inspected object is used, the dirt adhering to the underside of the inspection object is not detected as a defect. Further, the & measuring apparatus may be configured to include an imaging lens that images the inspection object below, and a CCD provided on an imaging surface of the imaging lens. By this configuration, the inspection sensitivity on the upper side of the inspection object is relatively low, and the influence of dirt or the like adhering to the inspection target can be reduced. Furthermore, it may be configured to include adjusting the focal length of the imaging lens.

2099-10296-PF 4 201000884 and the defect detection device inside the inspection object is adjusted by the adjustment of the focal length. The effect of the invention "" The clothing 1 Hanshi method can prepare a defect of the object" and detects the defect, and measures the test: It is also possible to suppress adhesion to the object to be examined. The direction of the direction. Moreover, the influence of dirt on the surface of the object. [Embodiment]

Hereinafter, the embodiment of the present invention will be described with reference to the embodiment. The speed at which the platform 2 is placed is set in FIG. 1 as the inspection object glass plate 9 by the moving device 20 in the γ direction indicated by the arrow. mobile. The position d of '2' is configured to be detected by the platform position detecting device*. An illumination device 1 is disposed above the glass plate 99, and the light is obliquely incident on the glass plate 99 through the mask 10. At a position opposite to the illumination skirt 1, an image detecting device 3 is provided which is configured to detect reflected light reflected from the underside of the glass plate 99. The illumination device 41 is a linear diffused illumination that illuminates the width direction of the glass 99 (direction perpendicular to the direction of movement), that is, the light in the x-direction, as shown in Fig. 2, and is provided with a mask. The linear diffused illumination light is irradiated with an incident angle of 0 to the moving direction of the glass plate 9 9 . With this configuration, the illumination of the illumination device 1 is obliquely incident on the incident angle 0 of the glass plate 99, and only the light reflected from the glass plate 99 is detected. Furthermore, the glass plate 99 is moved to the illumination device, but only the glass

2099-10296-PF 5 201000884 The board 99 and the makeup device i may move relative to each other, and the mobile lighting device 1 or the moving glass plate 99 and the lighting device 1 may be used. In the figure, the illumination of the illumination device j passes through the incident light path and the reflected light path 16, and the light is received by the line CCD 31. That is, from the lighting installation 1 and the first cover 10 to the incident incident glass plate 99L, the glass top surface 97 is refracted at the refraction angle 0 and reflected at the lower surface 98 of the glass. Shoot. The imaging lens 30, which has a focal point position on the underside of the glass 98, collects the reflected light, receives the light with the line CCD 31, and detects it. The image detected by the line CCD 31 is subjected to a predetermined process by the image processing device 33 via the image input device μ, and is displayed on the display device 50 via the controller 5. The detection of the case where the bubble defect 80 is present in the glass plate 99 having the refractive index η will be described based on Fig. 3 . The glass plate 99 is placed on the platform 2' to move at a speed ν in the right direction in Fig. 3. As shown in Fig. 3(A), the first incident light path 15 passes the defect 80' and the detected value of the line CCD 31 is lowered to be the i-th detection of the defect 8 。. Then, as shown in Fig. 3(B), the reflected light path is passed through the defect 80, and the defect 〇 is detected for the second time by the line CCD 31. The controller 5 calculates the height h of the defect (4) from the lower surface 98 of the glass in accordance with the pick-up effect by the following method. Further, the size of the defect (10) can be calculated by the time at which the output of the line CCD 31 is lowered and the moving speed v.

The position of the defect 8G detected for the first time and the defect of the second detection 8〇 2099-10296-PF 6 201000884 "t is the distance 缺陷 in the γ direction of the position of the controller 廿 is represented by d=tv. Here, the time interval between the first detection and the second detection of the defect 80 is calculated in 5. Here, the incident angle (observation angle) 0 and the refractive index η of the glass plate 99 are expressed by the following equation according to the Snell's rule according to the Snell's law. Sin 61 =nsin0

At this time, the relationship between the height h of the defect 80 and the distance d is 2htar^=d, and therefore, the height h of the defect 80 is expressed by the following equation. From the following formula, it can be seen that the height h of the defect 8 is proportional to the occurrence interval of seven. That is, the closer the defect 8 is to the lower surface 98 of the glass, the shorter the time ^, and the closer to the upper surface of the glass 97, the longer the time t. [Equation 1] h = _ In Fig. 4, the position of the defect 8 和 and the image obtained by the controller 5 and displayed on the display 50 are displayed. As described above, when the defect 80 exists, the signal intensity obtained from the line CCD 31 becomes small, and therefore, the defect 8 is indicated by a dark portion in the display 5A. The defect 80abcde from the lower side of the glass 98, hi, h2, h3, is shown in the display is 50 as a dark portion having a distance of dl, d2, d3, d4. As described above, the higher the height h, the larger the interval d of the dark portion. The height h and size of the defect 80 and the allowable/unallowable relationship of the defect are as shown in Fig. 5. The defect of the bubble (foreign matter) or the like is closer to the lower side of the glass, and the position h is lower than the degree h, which is not acceptable because it adversely affects the exposure 2099-10296-PF 7 201000884. In addition, the larger the size of the defect 8〇, the better. If the height h of the defect 80d is greater than or equal to the thickness of the glass plate 99, the defect 80d is judged to be the dirt on the glass top surface 97. That is, when the thickness of the glass plate 99 is τ, when the interval d4 of the detection pattern is a subtype, it is regarded as a pattern caused by the dirt adhering to the glass upper surface 97, and is determined to be normal. 1 [Formula 2] dA > 2T tan|sin_l(^^)| Further, if the defect 80c or the defect 80e is near the position of the lower surface 98 of the glass, there may be a case where the pattern of the double is not formed. For example, as shown in Fig. 4, the defect 8Ge is a bubble of a circular shape whose size (diameter) is Sx'. When the interval of the detection pattern is d3, s and two images are not separated. When the above pattern is produced, it indicates that the defect 8 〇 # is close to the underside of the glass. Therefore, there is a high possibility that the exposure is adversely affected. Therefore, it is considered that the direction perpendicular to the moving direction (γ direction) of the substrate is the size & the height h is 〇, and its allowable/unallowable is judged according to Fig. 5. The operation will be described in accordance with the flowchart of Fig. 6. In the image processing device qq, < + , in the center of the clothes, the binary pattern of the shaded shirt 1 detected by the threading device 32 is set (step S1), and the binarization is performed on the pair to obtain the leaf judgment. The leveling pattern performs leveling (step S2). (Step S3), for each figure, the size (Sx, Sy) valley pattern 纟 substrate moving direction (y direction)

2099-10296-PF 201000884 Explore ‘Find patterns of the same size or size (step S4). The search area is within a distance ^ corresponding to the thickness of the glass sheet 99. When there is a pattern of the same size (step S5), the interval d in the y direction is obtained, and the height h is calculated (step S6). The obtained degree h and magnitude (for example, the average value in the Xy direction) are compared with the judgment criteria shown in Fig. 5, and the allowable/unallowable (steps s7, 8, 9) ° ί is judged.

U does not have the same pattern in step S5, but in the case of a single pattern, the size in the X direction is equal to its size, and 〇 is its height h (step S10), similarly to that shown in Fig. 5. The reference comparison is judged, and the permission/non-permission is judged (steps S7, 8, and 9). Furthermore, the more you go to the underside of the broken glass, the smaller the light meter is. Even if the same 80' goes to the bottom of the glass, the light quantity changes more. Therefore, even if the top surface of the glass is attached with dirt, it is mistaken for defects. 80 and the risk of being detected is small. In addition, the dirt underneath the broken glass, $德,% can be detected because the yuan does not cause the reflection of the light, so it will not be detected. BRIEF DESCRIPTION OF THE DRAWINGS The present invention is shown in Fig. 2 - Fig. 2 shows a third embodiment of the present invention. Fig. 4 is a schematic view showing an embodiment of the present invention. Description of the operation of the embodiment mode Description of the operation mode of the embodiment mode

2099-10296-PF 9 201000884 Fig. 5 is an explanatory view showing an operation of an embodiment of the present invention. Fig. 6 is a flow chart showing the operation of an embodiment of the present invention. [Main component symbol description] 1 Illumination device 2 Platform 3 Image detection device 4 Platform position detection device 5 Controller 10 Mask 15 Incident light path 1 6 Reflected light path 20 Moving device 30 Imaging lens CCD 31 Line 32 Image input device 33 Image processing Device 50 display 80 defect 97 glass above 98 glass under 9 9 glass plate 2099-10296-PF 10

Claims (1)

201000884 VII. Patent application scope: 1. A defect detecting device, comprising: ',, and a device for inspecting an inspection object by obliquely illuminating the inspection light at a predetermined angle, the inspection light having an incident inspection object underneath The incident light and the reflected light reflected from the underside of the object to be inspected, and the moving device moves the object to be inspected and the illuminating device at a predetermined speed in the oblique direction of the detecting; — Depending on the incident light and the reflection Light detecting the defect of the inspection object; the time interval detecting device detects a time interval at which the defect is detected by the incident light and the defect is detected by the reflected light; the computing device' is based on the degree, the predetermined speed, and This time interval 'calculates the height direction position of the defect. 2. The defect detecting device according to claim 1, wherein the detecting device comprises: an imaging lens that images the underlying inspection object; and a CCD provided on an imaging surface of the imaging lens. 3. A defect detecting method, comprising: a step of causing an inspection light emitted from an illumination device to obliquely illuminate an inspection object through which the inspection light penetrates to be incident on the inspection object or reflected under the inspection object; a step of relatively moving the inspection object and the illumination device at a predetermined speed in an oblique direction of the inspection light; and detecting a defect of the inspection object 2099-10296-PF 11 201000884 based on the incident light and the reflected light And a step of detecting a time interval at which the defect is detected by the incident light and detecting the defect by the reflected light; and calculating a height direction position of the defect based on the predetermined angle, the predetermined speed, and the time interval. 2099-10296-PF 12